TWI880496B - Vapor deposition device - Google Patents
Vapor deposition device Download PDFInfo
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- TWI880496B TWI880496B TW112146761A TW112146761A TWI880496B TW I880496 B TWI880496 B TW I880496B TW 112146761 A TW112146761 A TW 112146761A TW 112146761 A TW112146761 A TW 112146761A TW I880496 B TWI880496 B TW I880496B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- H10P72/0402—
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- H10P72/7604—
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- H10P72/7624—
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
本發明係關於一種蒸鍍裝置,尤指一種藉由鎖固件固定放置晶圓的載體且載體具有凹陷空間之蒸鍍裝置。The present invention relates to an evaporation device, in particular to an evaporation device in which a carrier for placing a wafer is fixed by a locking device and the carrier has a recessed space.
蒸鍍製程是一種半導體製程技術,用於在晶圓表面沉積薄膜材料。其中,蒸鍍製程中主要需使用蒸鍍裝置例如蒸鍍鍍鍋,其功能為容納由固體金屬或其他蒸鍍用的蒸鍍材料。蒸鍍製程通常在真空環境中進行,蒸鍍鍍鍋被加熱以使其內部的蒸鍍材料蒸發,並搭配使用化學氣相沉積(CVD)或物理氣相沉積(PVD)的方法,藉由蒸鍍材料的蒸發產生蒸氣,使得薄膜材料能夠以原子或分子的形式在晶圓或其他基板表面沉積,形成所需的薄膜層。然而,隨著眾多產業對於矽晶圓晶片的需求不斷增長,如何提升晶片於製程中的穩定性與產品良率已成為當前最重要的研究課題之一。Evaporation process is a semiconductor process technology used to deposit thin film materials on the surface of wafers. Among them, the evaporation process mainly requires the use of evaporation equipment such as evaporation pots, whose function is to contain evaporation materials made of solid metal or other evaporation. The evaporation process is usually carried out in a vacuum environment. The evaporation pot is heated to evaporate the evaporation material inside it, and chemical vapor deposition (CVD) or physical vapor deposition (PVD) methods are used in combination. The evaporation of the evaporation material generates vapor, so that the thin film material can be deposited on the surface of the wafer or other substrate in the form of atoms or molecules to form the required thin film layer. However, as the demand for silicon wafers in many industries continues to grow, how to improve the stability of chips in the manufacturing process and the product yield has become one of the most important research topics at present.
目前常見的蒸鍍裝置中通常使用特定的載片及轉盤座體。轉盤座體上設有多個載片,這些載片主要用於固定支撐晶圓,並放置在蒸鍍裝置中。然而,此類傳統蒸鍍裝置存在一些不容忽視的缺點。首先,在傳統蒸鍍製程中,蒸鍍裝置上所使用的彈性元件因需同時夾取載片及晶圓,而具有較大的彈性係數。因此,容易對薄化後的晶圓產生外力,導致晶圓表面出現裂痕。此外,隨著鍍膜過程的進行,轉盤座體震動可能導致晶圓與載片之間的摩擦,進而造成晶圓表面刮傷,影響元件的外觀良率損失。Currently common evaporation devices usually use specific carriers and turntable bodies. There are multiple carriers on the turntable body, which are mainly used to fix and support wafers and place them in the evaporation device. However, this type of traditional evaporation device has some disadvantages that cannot be ignored. First, in the traditional evaporation process, the elastic components used in the evaporation device have a large elastic coefficient because they need to clamp the carrier and the wafer at the same time. Therefore, it is easy to generate external force on the thinned wafer, causing cracks on the wafer surface. In addition, as the coating process proceeds, the vibration of the turntable body may cause friction between the wafer and the carrier, which in turn causes scratches on the wafer surface, affecting the appearance yield loss of the component.
有鑑於此,本發明提出一種蒸鍍裝置,以解決先前技術中所面臨彈性元件因彈性係數過大易造成晶圓破片的問題。In view of this, the present invention proposes an evaporation device to solve the problem in the prior art that the elastic element is prone to wafer breakage due to the excessive elastic modulus.
本發明之目的在於提供一種蒸鍍裝置,旨在提供一種可降低晶圓於蒸鍍製程中破片的程度,且減少與載體接觸的蒸鍍裝置。本發明特別使用鎖固件將放置晶圓的載體鎖固於座體上,透過鎖固件固定載體可使彈性元件不需太高的彈性係數,即可夾取住晶圓,此結構較不易造成晶圓因外力而導致裂痕,尤其是針對薄化後的晶圓。另一方面,於載體中間具有一凹陷空間,以及載體的外周緣上具有多個凸部,透過上述設計可大幅縮小晶圓與載體的接觸面積,連帶使晶圓於鍍膜過程中減少與載體的摩擦,降低晶圓表面刮傷進一步提高晶圓外觀良率。The purpose of the present invention is to provide an evaporation device, aiming to provide an evaporation device that can reduce the degree of wafer breakage during the evaporation process and reduce the contact with the carrier. The present invention particularly uses a locking fixture to lock the carrier on which the wafer is placed on the base. Fixing the carrier with the locking fixture allows the elastic element to clamp the wafer without a too high elastic coefficient. This structure is less likely to cause the wafer to crack due to external force, especially for thinned wafers. On the other hand, there is a recessed space in the middle of the carrier, and there are multiple protrusions on the outer periphery of the carrier. The above design can greatly reduce the contact area between the wafer and the carrier, which in turn reduces the friction between the wafer and the carrier during the coating process, reduces scratches on the wafer surface, and further improves the appearance yield of the wafer.
為達上述目的,本發明揭露一種蒸鍍裝置,包括一座體、複數個載體、複數個鎖固件及複數個夾持模組。所述載體可拆卸地設置於該座體上。各所述鎖固件對應地設置於各所述載體的一中心位置,所述鎖固件貫穿該座體鎖固所述載體。所述夾持模組設置於所述載體。其中,當各所述載體承載一晶圓且各所述夾持模組夾持該晶圓時,該晶圓夾設於局部各所述載體及所述夾持模組之間。To achieve the above-mentioned purpose, the present invention discloses an evaporation device, comprising a base, a plurality of carriers, a plurality of locking pieces and a plurality of clamping modules. The carrier is detachably arranged on the base. Each of the locking pieces is correspondingly arranged at a central position of each of the carriers, and the locking piece penetrates the base to lock the carrier. The clamping module is arranged on the carrier. When each of the carriers carries a wafer and each of the clamping modules clamps the wafer, the wafer is clamped between each of the carriers and the clamping module.
於一實施例中,各所述載體更具有一本體及複數個凸部,所述凸部形成於該本體之外周緣,用以接觸該晶圓。In one embodiment, each of the carriers further has a main body and a plurality of protrusions, wherein the protrusions are formed on the outer periphery of the main body for contacting the wafer.
於一實施例中,該本體更包含一第一表面及一第二表面,所述凸部與該第一表面形成一第一高低差,該第一表面與該第二表面形成一第二高低差。In one embodiment, the body further includes a first surface and a second surface, the protrusion and the first surface form a first height difference, and the first surface and the second surface form a second height difference.
於一實施例中,該第一表面及該第二表面共同定義一凹陷空間。In one embodiment, the first surface and the second surface together define a recessed space.
於一實施例中,所述夾持模組具有彈性,垂直設置於所述本體相對於所述凸部的位置。In one embodiment, the clamping module is elastic and vertically arranged at a position of the main body relative to the protrusion.
於一實施例中,所述夾持模組具有至少一第一彈性件及至少一第二彈性件,所述第一彈性件固設於該本體,所述第二彈性件可拆卸地設置於該本體。In one embodiment, the clamping module has at least one first elastic member and at least one second elastic member, the first elastic member is fixed to the body, and the second elastic member is detachably disposed on the body.
於一實施例中,各所述夾持模組中的所述第一彈性件與所述第二彈性件的數量分別為至少二個。In one embodiment, the number of the first elastic member and the second elastic member in each of the clamping modules is at least two.
於一實施例中,該座體更包含複數個個中空孔洞及複數個支撐片,所述中空孔洞形成於各所述支撐片對應地兩側,所述支撐片與所述載體藉由所述鎖固件相連接。In one embodiment, the base further includes a plurality of hollow holes and a plurality of supporting sheets, wherein the hollow holes are formed on two corresponding sides of each of the supporting sheets, and the supporting sheets are connected to the carrier via the locking member.
於一實施例中,當該晶圓夾設於局部各所述載體與所述夾持模組時,該晶圓同時與所述凸部及所述夾持模組接觸,且該晶圓與該第一表面及該第二表面互不接觸。In one embodiment, when the wafer is clamped between the carrier and the clamping module, the wafer contacts the protrusion and the clamping module at the same time, and the wafer does not contact the first surface and the second surface.
於一實施例中,該座體為可旋轉的。In one embodiment, the base is rotatable.
在參閱圖式及隨後描述之實施方式後,此技術領域具有通常知識者便可瞭解本發明之其他目的,以及本發明之技術手段及實施態樣。After referring to the drawings and the implementation methods described subsequently, a person having ordinary knowledge in this technical field will understand other purposes of the present invention, as well as the technical means and implementation aspects of the present invention.
以下將透過實施例來解釋本發明內容,本發明的實施例並非用以限制本發明須在如實施例所述之任何特定的環境、應用或特殊方式方能實施。因此,關於實施例之說明僅為闡釋本發明之目的,而非用以限制本發明。需說明者,以下實施例及圖式中,與本發明非直接相關之元件已省略而未繪示,且圖式中各元件間之尺寸關係僅為求容易瞭解,並非用以限制實際比例。The content of the present invention will be explained below through embodiments. The embodiments of the present invention are not intended to limit the present invention to any specific environment, application or special method as described in the embodiments. Therefore, the description of the embodiments is only for the purpose of explaining the present invention, and is not intended to limit the present invention. It should be noted that in the following embodiments and drawings, components that are not directly related to the present invention have been omitted and not shown, and the size relationship between the components in the drawings is only for easy understanding and is not intended to limit the actual proportion.
請一併參閱圖1至圖3。圖1及圖2所示分別為本發明提供之蒸鍍裝置1000之各個載體2的正面與背面示意圖。圖3所示為本發明之蒸鍍裝置1000的局部剖面圖。蒸鍍裝置1000可用於夾取複數個晶圓2000,使所述晶圓2000進行後續的蒸鍍製程。其中,如圖6所示,在本發明之一實施例中,蒸鍍裝置1000包括一座體1、複數個載體2、複數個鎖固件3、以及複數個夾持模組4。所述載體2可拆卸地設置於座體1上,且所述載體2用於放置所述晶圓2000。所述鎖固件3及所述夾持模組4對應地設置於各個載體2上。Please refer to Figures 1 to 3. Figures 1 and 2 are schematic diagrams of the front and back of each
進一步說明座體1,請一併參閱圖4及圖5。圖4為本發明之一實施例之蒸鍍裝置1000的正面示意圖,圖5為本發明之一實施例之蒸鍍裝置1000的反面示意圖。座體1包含複數個中空孔洞11及複數個支撐片12,所述中空孔洞11形成於各所述支撐片12對應地兩側,各所述支撐片12上具有一鎖孔,可供各所述鎖固件3將各所述載體2鎖固於各所述支撐片12上。於本實施例中,當晶圓2000放置於載體2時,使用者可透過所述中空孔洞11的空間,將所述夾持模組4設置於所述載體2上,使得晶圓2000能夠夾持且固定於所述載體2上。相反地,使用者也可從所述中空孔洞11將部分所述夾持模組4鬆開,接著取下設置於所述載體2的晶圓2000。須說明的是,本發明的蒸鍍裝置1000的座體1為可旋轉的,供使用者方便地裝設及拆卸晶圓2000。For further explanation of the
請再次參閱圖1及圖2。所述載體2包含一本體21及四個凸部22。所述凸部22形成於本體21之外周緣,可用以接觸晶圓2000。詳細而言,本體21更包含一第一表面211及一第二表面212。其中,如圖3所示,所述凸部22設置於第一表面211上,並與第一表面211形成一第一高低差H1。另一方面,第一表面211與第二表面212形成一第二高低差H2。此外,第一表面211與第二表面212共同定義一凹陷空間S。須說明的是,當各所述載體2承載晶圓2000且各所述夾持模組4夾持晶圓2000時,晶圓2000夾設於局部各所述載體2及所述夾持模組4之間,如圖3所示。接著,透過形成所述凸部22及此凹陷空間S,使晶圓2000夾設於凸部22及所述夾持模組4之間。換言之,晶圓2000僅同時與凸部22及所述夾持模組4接觸,且晶圓2000與第一表面211及第二表面212互不接觸。與傳統蒸鍍裝置結構不同,此設計可供晶圓2000縮小與載體2的表面所接觸的面積,進一步避免蒸鍍製程中可能造成的刮損。須說明的是,圖4及圖5所示為本發明之一實施例之蒸鍍裝置1000,圖6及圖7所示為本發明之另一實施例之蒸鍍裝置1000。兩者的差異僅為設置於座體1之所述載體2的數量不同,其載體2設置的位置及數量皆可依據實際夾取之晶圓尺寸大小進行調整,在此不作限制。Please refer to FIG. 1 and FIG. 2 again. The
接下來詳細說明鎖固件3及夾持模組4。如圖3及圖6所示,各所述鎖固件3對應地設置於各所述載體2的一中心位置,所述鎖固件3貫穿座體1並鎖固所述載體2。於本實施例中,所述鎖固件3以螺絲與螺帽的組合作為例示,使用者可依據實際需求調整替換為其他種類的鎖固方式,在此不作限制。須說明的是,所述載體2藉由所述鎖固件3固定設置於座體1上,藉由此固定方式可減少用於夾取晶圓2000的所述夾持模組4的彈性係數,可使薄化後的晶圓2000在夾取時降低裂痕。Next, the locking
承上,所述夾持模組4具有彈性,垂直設置於所述本體21相對於所述凸部22的位置。詳言之,夾持模組4具有至少一第一彈性件41及至少一第二彈性件42,所述第一彈性件41固設於所述本體21,所述第二彈性件42可拆卸地設置於所述本體21。於本實施例中,各所述夾持模組4中的所述第一彈性件41與所述第二彈性件42的數量分別為至少二個。較佳地,所述第一彈性件41與所述第二彈性件42分別為二個,使得晶圓2000能夠以四角定位方式固定於所述載體2之所述凸部22上。詳細而言,於本實施例中,所述第一彈性件41及所述第二彈性件42可為同樣的彈簧元件,且所述第一彈性件41固定設置於載體2相對於座體1外周區域之位置,所述第二彈性件42可拆卸地設置於載體2相對於座體1內周區域之位置,如圖6所示。此外,透過夾持模組4夾取晶圓2000的步驟包含,首先將固定設置所述第一彈性件41,接著將晶圓2000之一側先夾持於所述第一彈性件41與部分所述凸部22之間,最後再使用可拆卸地所述第二彈性件42夾持住晶圓2000與所述載體2之剩餘所述凸部22。相反地,欲拆卸晶圓2000時,可先移除所述第二彈性件42,再將晶圓2000取出。As mentioned above, the
綜上所述,本發明的蒸鍍裝置包含座體、載體、鎖固件及夾持模組的組合,與傳統蒸鍍裝置的不同點在於,各個載體以對應的鎖固件將其固定於座體上,不須使用彈性係數大的彈性元件夾持住載體及晶圓。另外,載體上具有一凹陷空間以及僅須透過載體上設置的凸部以接觸並支撐晶圓,可使晶圓與載體接觸的區域大幅縮小。藉此,可達到減少晶圓於蒸鍍製程時的刮傷及破片,提高晶圓外觀良率的效果。In summary, the evaporation device of the present invention includes a combination of a base, a carrier, a locking piece and a clamping module. The difference from the conventional evaporation device is that each carrier is fixed to the base with a corresponding locking piece, and there is no need to use an elastic element with a large elastic coefficient to clamp the carrier and the wafer. In addition, the carrier has a recessed space and only the convex portion provided on the carrier is required to contact and support the wafer, which can greatly reduce the contact area between the wafer and the carrier. In this way, the scratches and breakages of the wafer during the evaporation process can be reduced, and the appearance yield of the wafer can be improved.
上述之實施例僅用來例舉本發明之實施態樣,以及闡釋本發明之技術特徵,並非用來限制本發明之保護範疇。任何熟悉此技術者可輕易完成之改變或均等性之安排均屬於本發明所主張之範圍,本發明之權利保護範圍應以申請專利範圍為準。The above embodiments are only used to illustrate the implementation of the present invention and to explain the technical features of the present invention, and are not used to limit the scope of protection of the present invention. Any changes or equivalent arrangements that can be easily completed by those familiar with this technology are within the scope of the present invention, and the scope of protection of the present invention shall be based on the scope of the patent application.
1000 蒸鍍裝置
2000 晶圓
1 座體
11 中空孔洞
12 支撐片
2 載體
21 本體
211 第一表面
212 第二表面
22 凸部
3 鎖固件
4 夾持模組
41 第一彈性件
42 第二彈性件
H1 第一高低差
H2 第二高低差
S 凹陷空間
1000
圖1為本發明之蒸鍍裝置之載體的正面示意圖; 圖2為本發明之蒸鍍裝置之載體的反面示意圖; 圖3為本發明之蒸鍍裝置的局部剖面圖; 圖4為本發明之一實施例之蒸鍍裝置的正面示意圖; 圖5為本發明之一實施例之蒸鍍裝置的反面示意圖; 圖6為本發明之另一實施例之蒸鍍裝置的正面示意圖;及 圖7為本發明之另一實施例之蒸鍍裝置的反面示意圖。 Figure 1 is a schematic diagram of the front side of the carrier of the evaporation device of the present invention; Figure 2 is a schematic diagram of the back side of the carrier of the evaporation device of the present invention; Figure 3 is a partial cross-sectional view of the evaporation device of the present invention; Figure 4 is a schematic diagram of the front side of the evaporation device of one embodiment of the present invention; Figure 5 is a schematic diagram of the back side of the evaporation device of one embodiment of the present invention; Figure 6 is a schematic diagram of the front side of the evaporation device of another embodiment of the present invention; and Figure 7 is a schematic diagram of the back side of the evaporation device of another embodiment of the present invention.
1000:蒸鍍裝置 1000: Evaporation device
2000:晶圓 2000: Wafer
1:座體 1: Seat
11:中空孔洞 11: Hollow holes
2:載體 2: Carrier
21:本體 21: Body
211:第一表面 211: First surface
212:第二表面 212: Second surface
22:凸部 22: convex part
3:鎖固件 3: Lock the firmware
4:夾持模組 4: Clamping module
41:第一彈性件 41: First elastic member
42:第二彈性件 42: Second elastic member
H1:第一高低差 H1: The first high-low difference
H2:第二高低差 H2: The second high-low difference
S:凹陷空間 S: sunken space
Claims (10)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112146761A TWI880496B (en) | 2023-12-01 | 2023-12-01 | Vapor deposition device |
| CN202410213631.5A CN120082847A (en) | 2023-12-01 | 2024-02-27 | Evaporation device |
| JP2024151198A JP2025089249A (en) | 2023-12-01 | 2024-09-03 | Vapor deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112146761A TWI880496B (en) | 2023-12-01 | 2023-12-01 | Vapor deposition device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI880496B true TWI880496B (en) | 2025-04-11 |
| TW202523882A TW202523882A (en) | 2025-06-16 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112146761A TWI880496B (en) | 2023-12-01 | 2023-12-01 | Vapor deposition device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2025089249A (en) |
| CN (1) | CN120082847A (en) |
| TW (1) | TWI880496B (en) |
Citations (5)
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|---|---|---|---|---|
| EP1507025A1 (en) * | 2002-04-09 | 2005-02-16 | TDK Corporation | Device and method for forming thin-film, and method of manufacturing electronic component using the device |
| TW200905000A (en) * | 2006-03-28 | 2009-02-01 | Tohoku Seiki Ind Ltd | Sputtering system and method for depositing thin film |
| TW201432781A (en) * | 2012-09-27 | 2014-08-16 | 日立國際電氣股份有限公司 | Substrate processing apparatus, lid body, and method of manufacturing the same |
| TW201903947A (en) * | 2017-06-08 | 2019-01-16 | 日商愛發科股份有限公司 | Substrate guides, carriers |
| CN109423626A (en) * | 2017-08-30 | 2019-03-05 | 胜高股份有限公司 | Film formation device, film forming pallet, film build method, the film forming manufacturing method of pallet |
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| JPS5360381A (en) * | 1976-11-11 | 1978-05-30 | Mitsubishi Electric Corp | Planetary for vacuum evaporation |
| JPS6242410A (en) * | 1985-08-19 | 1987-02-24 | Anelva Corp | Substrate treating device |
| JPS62122232A (en) * | 1985-11-22 | 1987-06-03 | Hitachi Ltd | Mounting device |
| JP3657870B2 (en) * | 2000-10-24 | 2005-06-08 | 日本電信電話株式会社 | Substrate holder and thin film forming apparatus |
| JP2009114490A (en) * | 2007-11-05 | 2009-05-28 | Nec Electronics Corp | Substrate holder and film-forming apparatus provided with the same |
| JP5818711B2 (en) * | 2012-02-14 | 2015-11-18 | 三菱電機株式会社 | Wafer holding structure and vapor deposition apparatus having the same |
| CN105002472A (en) * | 2015-07-03 | 2015-10-28 | 苏州工业园区纳米产业技术研究院有限公司 | Wafer fixing device for evaporator |
| CN110387530A (en) * | 2019-08-14 | 2019-10-29 | 南开大学 | A round pot fixture and a coating device |
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2023
- 2023-12-01 TW TW112146761A patent/TWI880496B/en active
-
2024
- 2024-02-27 CN CN202410213631.5A patent/CN120082847A/en active Pending
- 2024-09-03 JP JP2024151198A patent/JP2025089249A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1507025A1 (en) * | 2002-04-09 | 2005-02-16 | TDK Corporation | Device and method for forming thin-film, and method of manufacturing electronic component using the device |
| TW200905000A (en) * | 2006-03-28 | 2009-02-01 | Tohoku Seiki Ind Ltd | Sputtering system and method for depositing thin film |
| TW201432781A (en) * | 2012-09-27 | 2014-08-16 | 日立國際電氣股份有限公司 | Substrate processing apparatus, lid body, and method of manufacturing the same |
| TW201903947A (en) * | 2017-06-08 | 2019-01-16 | 日商愛發科股份有限公司 | Substrate guides, carriers |
| CN109423626A (en) * | 2017-08-30 | 2019-03-05 | 胜高股份有限公司 | Film formation device, film forming pallet, film build method, the film forming manufacturing method of pallet |
Also Published As
| Publication number | Publication date |
|---|---|
| CN120082847A (en) | 2025-06-03 |
| JP2025089249A (en) | 2025-06-12 |
| TW202523882A (en) | 2025-06-16 |
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