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TWI880391B - Fluid flowrate calibration system and calibration method - Google Patents

Fluid flowrate calibration system and calibration method Download PDF

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Publication number
TWI880391B
TWI880391B TW112138799A TW112138799A TWI880391B TW I880391 B TWI880391 B TW I880391B TW 112138799 A TW112138799 A TW 112138799A TW 112138799 A TW112138799 A TW 112138799A TW I880391 B TWI880391 B TW I880391B
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flow
fluid flow
control module
fluid
valve
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TW112138799A
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TW202516299A (en
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林君澔
黃立佐
張修凱
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弘塑科技股份有限公司
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Abstract

A fluid flowrate calibration system and calibration method are utilized to calibrate a flowrate of fluid flowing into a process device end through a pipeline. The system includes: a control valve for control the fluid flow; a flowrate calibration device for measuring and calibrating the fluid flowrate; at least one measuring instrument for monitoring the fluid flowrate; and a control module connected to the afore-mentioned components to regulate the fluid flowrate through signals. The control module sets a target flowrate and controls the control valve to adjust the fluid flowrate according to the target flowrate. The control module determines whether the fluid flowrate is same as the target flowrate: when being different, the control module controls the control valve to adjust the fluid flowrate to conform with the target flowrate; when being the same, the control module controls the fluid to flow into the process device end.

Description

流體流量校正系統及校正方法Fluid flow calibration system and calibration method

本發明係有關一種流量校正系統及校正方法,特別是關於一種流體流量校正系統及校正方法。 The present invention relates to a flow calibration system and calibration method, and in particular to a fluid flow calibration system and calibration method.

現今的半導體產業正快速發展,其中濕製程設備因應需求而有許多不同的種類。大多數製程設備在輸送流體時,由於同一工序或製程所需的流體(例如蝕刻液或流洗液等)相同,會將該流體循環使用,但流體中因製程反應而產生的氣泡或固體副產物會隨著循環使用次數的不斷上升而增加或堆積,造成流體黏度增加,而導致流量不穩問題。然而,由於前述流體的價格高昂,故除非該流體的性質已不符規範、產品壽命已屆或歲修前並不會全部更換。 Today's semiconductor industry is developing rapidly, and there are many different types of wet process equipment to meet the needs. Most process equipment will recycle the fluid when conveying fluids because the fluids required for the same process or process (such as etching liquid or washing liquid, etc.) are the same. However, the bubbles or solid byproducts generated in the fluid due to process reactions will increase or accumulate as the number of cycles increases, causing the fluid viscosity to increase, resulting in unstable flow problems. However, due to the high price of the above-mentioned fluids, they will not be completely replaced unless the properties of the fluids no longer meet the specifications, the product life has expired, or before the annual maintenance.

因此,本發明技術領域急需一種在製程循環使用的流體全部更換前,可藉由流體流量校正以及管路分支設計維持該流體流量的流體流量校正系統及方法。 Therefore, the technical field of the present invention urgently needs a fluid flow correction system and method that can maintain the fluid flow rate through fluid flow correction and pipeline branch design before all the fluids used in the process cycle are replaced.

本發明提供的流體流量校正系統及方法能夠藉由定期校正管路中的流體流量,調整控制閥的閥門大小,以使得流體流量達到製程所需的目標流量。藉此,經由定期進行流體流量值校正,可降低在半導體製程設備中(例如濕製程設備)流體流量不穩的問題,進而提高整體製程的良率或產率(例如提升晶圓蝕刻後的清洗良率),同時減少更換價格高昂的流體的次數並降低製程成本。 The fluid flow correction system and method provided by the present invention can adjust the valve size of the control valve by regularly correcting the fluid flow in the pipeline so that the fluid flow reaches the target flow required by the process. Thus, by regularly correcting the fluid flow value, the problem of unstable fluid flow in semiconductor process equipment (such as wet process equipment) can be reduced, thereby improving the yield or production rate of the overall process (such as improving the cleaning yield after wafer etching), while reducing the number of times expensive fluids are replaced and reducing process costs.

鑒於上述問題,為解決習知流體流量與目標流量不同的問題,本發明提供一種流體流量校正系統,用以校正透過一管路流入一製程設備端流體的一流體流量,該包括:一控制閥,用以控制該流體流量大小;至少一計量儀器,用以監測該流體流量;一流量校正設備,用以量測流入該流量校正設備的一液體流量並校正該流體流量;以及一控制模組,訊號連接於該控制閥、該流量校正設備以及該至少一計量儀器,用以透過訊號調控該流體流量。該控制模組設定一目標流量,且該控制模組控制該控制閥根據該目標流量調整該流體流量。該控制模組透過該流量校正設備判斷該流體流量與該目標流量是否相同。當該流體流量與該目標流量不同時,該控制模組控制該控制閥調整該流體流量以符合該目標流量,當該流體流量與該目標流量相同時,該控制模組控制該流體流入該製程設備端。 In view of the above problems, in order to solve the problem that the known fluid flow rate is different from the target flow rate, the present invention provides a fluid flow correction system for correcting a fluid flow rate flowing into a process equipment end fluid through a pipeline, which includes: a control valve for controlling the size of the fluid flow rate; at least one metering instrument for monitoring the fluid flow rate; a flow correction device for measuring a liquid flow rate flowing into the flow correction device and correcting the fluid flow rate; and a control module, the signal of which is connected to the control valve, the flow correction device and the at least one metering instrument, for regulating the fluid flow rate through the signal. The control module sets a target flow rate, and the control module controls the control valve to adjust the fluid flow rate according to the target flow rate. The control module determines whether the fluid flow rate is the same as the target flow rate through the flow correction device. When the fluid flow rate is different from the target flow rate, the control module controls the control valve to adjust the fluid flow rate to meet the target flow rate. When the fluid flow rate is the same as the target flow rate, the control module controls the fluid to flow into the process equipment end.

在一較佳實施例中,該控制模組設定該目標流量,且該控制模組控制該控制閥根據該目標流量調整該流體流量,進一步包括:該控制模組傳送一目標流量訊號至該控制閥以控制該控制閥根據該目標流量調整該流體流量;以及該控制閥根據該目標流量訊號調整該流體流量,並回傳一調整回饋訊號至該控制模組。 In a preferred embodiment, the control module sets the target flow rate, and the control module controls the control valve to adjust the fluid flow rate according to the target flow rate, further comprising: the control module transmits a target flow rate signal to the control valve to control the control valve to adjust the fluid flow rate according to the target flow rate; and the control valve adjusts the fluid flow rate according to the target flow rate signal, and returns an adjustment feedback signal to the control module.

在一較佳實施例中,該流體流量校正系統,進一步包括一製程設備端閥門以及一流量校正設備端閥門,該製程設備端閥門設置在該製程設備端前的該管路上,該流量校正設備端閥門設置在該流量校正設備前的該管路上。在該控制模組透過該流量校正設備判斷該流體流量與該目標流量是否相同前,進一步包括:該控制模組關閉該製程設備端閥門,以停止該流體流入該製程設備端;該控制模組開啟該流量校正設備端閥門,以供該流體流入該流量校正設備;以及該控制模組傳送一流量校正訊號至該流量校正設備以啟動該流量校正設備並使其量測該流體流量,該流量校正設備量測該流體流量後,傳送一校正回饋訊號至該控制模組。 In a preferred embodiment, the fluid flow correction system further includes a process equipment end valve and a flow correction equipment end valve, the process equipment end valve is arranged on the pipeline in front of the process equipment end, and the flow correction equipment end valve is arranged on the pipeline in front of the flow correction equipment. Before the control module determines whether the fluid flow rate is the same as the target flow rate through the flow correction device, it further includes: the control module closes the valve at the process equipment end to stop the fluid from flowing into the process equipment end; the control module opens the valve at the flow correction device end to allow the fluid to flow into the flow correction device; and the control module transmits a flow correction signal to the flow correction device to start the flow correction device and make it measure the fluid flow rate. After the flow correction device measures the fluid flow rate, it transmits a correction feedback signal to the control module.

在一較佳實施例中,在該控制模組透過該流量校正設備判斷該流體流量與該目標流量是否相同時,進一步包括:該控制模組根據該調整回饋訊號以及該校正回饋訊號判斷該流體流量以及該目標流量是否相同。 In a preferred embodiment, when the control module determines whether the fluid flow rate is the same as the target flow rate through the flow correction device, it further includes: the control module determines whether the fluid flow rate is the same as the target flow rate according to the adjustment feedback signal and the correction feedback signal.

在一較佳實施例中,當該流體流量以及該目標流量的差小於或等於一預定容許值時,該控制模組判斷該流體流量與該目標流量相同。 In a preferred embodiment, when the difference between the fluid flow rate and the target flow rate is less than or equal to a predetermined allowable value, the control module determines that the fluid flow rate is the same as the target flow rate.

在一較佳實施例中,該至少一計量儀器設置在該管路上,且位於該控制閥以及該製程設備端閥門之間,用以監測流過該製程設備端閥門的該流體流量。 In a preferred embodiment, the at least one metering instrument is disposed on the pipeline and is located between the control valve and the valve at the end of the process equipment to monitor the flow rate of the fluid flowing through the valve at the end of the process equipment.

在一較佳實施例中,該至少一計量儀器設置在該管路上,且位於該控制閥以及該流量校正設備端閥門之間,用以監測流過該流量校正設備端閥門的該流體流量。 In a preferred embodiment, the at least one metering instrument is disposed on the pipeline and is located between the control valve and the valve at the end of the flow correction device to monitor the flow rate of the fluid flowing through the valve at the end of the flow correction device.

本發明還提供一種流體流量校正方法,用以校正透過一管路流入一製程設備端流體的一流體流量,包括下列步驟:透過一控制模組設定一目 標流量,且該控制模組控制一控制閥根據該目標流量調整該流體流量大小;該控制模組透過一流量校正設備量測流入該流量校正設備的一液體流量,以判斷該流體流量與該目標流量是否相同;當該流體流量與該目標流量不同時,該控制模組控制該控制閥調整該流體流量大小以符合該目標流量;當該流體流量與該目標流量相同時,該控制模組控制該流體流入該製程設備端。該控制模組訊號連接於該控制閥以及該流量校正設備,並透過訊號調控該流體流量。 The present invention also provides a fluid flow correction method for correcting a fluid flow rate flowing into a process equipment end through a pipeline, comprising the following steps: setting a target flow rate through a control module, and the control module controls a control valve to adjust the fluid flow rate according to the target flow rate; the control module measures a liquid flow rate flowing into the flow correction device through a flow correction device to determine whether the fluid flow rate is the same as the target flow rate; when the fluid flow rate is different from the target flow rate, the control module controls the control valve to adjust the fluid flow rate to meet the target flow rate; when the fluid flow rate is the same as the target flow rate, the control module controls the fluid to flow into the process equipment end. The control module signal is connected to the control valve and the flow correction device, and the fluid flow rate is adjusted through the signal.

相較於先前技術,本發明的流體流量校正系統及校正方法,僅須透過定期進行流體流量值校正,即可降低在濕製程設備中流體流量不穩的問題,進而提高整體製程的良率(例如提升晶圓蝕刻後的清洗良率),同時減少更換價格高昂的流體的次數並降低製程成本。 Compared with the prior art, the fluid flow calibration system and calibration method of the present invention can reduce the problem of fluid flow instability in wet process equipment by only regularly calibrating the fluid flow value, thereby improving the yield of the overall process (for example, improving the cleaning yield after wafer etching), while reducing the number of times expensive fluids need to be replaced and reducing process costs.

1000:流體流量校正系統 1000: Fluid flow calibration system

100:控制閥 100: Control valve

200:計量儀器 200: Measuring instruments

300:流量校正設備 300: Flow calibration equipment

400:荷重計 400: Load meter

500:控制模組 500: Control module

600:製程設備端 600: Process equipment side

V1:製程設備端閥門 V1: Process equipment end valve

V2:流量校正設備端閥門 V2: Flow calibration equipment end valve

P:管路 P: Pipeline

S100,S110,S120,S200,S300,S400,S500:步驟 S100,S110,S120,S200,S300,S400,S500: Steps

圖1為本發明一實施例所提供的流體流量校正系統的單元方塊示意圖。 Figure 1 is a schematic diagram of a unit block of a fluid flow correction system provided in an embodiment of the present invention.

圖2為本發明一實施例所提供的流體流量校正系統的立體操作示意圖。 Figure 2 is a three-dimensional operation schematic diagram of a fluid flow correction system provided in an embodiment of the present invention.

圖3為本發明一實施例所提供的流體流量校正方法的流程示意圖。 Figure 3 is a schematic diagram of the flow chart of the fluid flow correction method provided in an embodiment of the present invention.

圖4為本發明另一實施例所提供的流體流量校正方法的流程示意圖。 Figure 4 is a schematic diagram of the flow chart of the fluid flow correction method provided by another embodiment of the present invention.

為能進一步瞭解本發明的特徵、技術手段以及所達成的具體功能、目的,列舉較具體的實施例,繼以圖式、圖號詳細說明如後。 In order to further understand the features, technical means, and specific functions and purposes of the present invention, more specific embodiments are listed, followed by detailed descriptions with drawings and figure numbers as follows.

以下各實施例的說明是參考附加的圖式,用以例示本發明可用以實施之特定實施例。本發明所提到的方向用語,例如「上」、「下」、「前」、「後」、「左」、「右」、「頂」、「底」、「水平」、「垂直」等,僅是參考附加圖式的方向。因此,使用的方向用語是用以說明及理解本發明,而非用以限制本發明。為方便描述,本發明圖式中的比例及相對位置可能誇大或與實際實施時不完全相同,圖式內容僅為示例,不用以限制本發明。 The following descriptions of the embodiments refer to the attached drawings to illustrate specific embodiments in which the present invention can be implemented. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "top", "bottom", "horizontal", "vertical", etc., are only with reference to the directions of the attached drawings. Therefore, the directional terms used are used to illustrate and understand the present invention, rather than to limit the present invention. For the convenience of description, the proportions and relative positions in the drawings of the present invention may be exaggerated or not exactly the same as in the actual implementation. The contents of the drawings are only examples and are not intended to limit the present invention.

請參見圖1及圖2所示,圖1為本發明一實施例所提供的流體流量校正系統的單元方塊示意圖,圖2為本發明一實施例所提供的流體流量校正系統的立體操作示意圖。本發明提供一種流體流量校正系統1000,且該流體流量校正系統1000能夠校正透過一管路P流入一製程設備端600流體的一流體流量。在實際應用中,該製程設備端600可以是用於濕製程的一腔室、酸洗模組、淋洗模組,或其他半導體製程的設備應用,本發明並不以此為限。 Please refer to FIG. 1 and FIG. 2. FIG. 1 is a schematic diagram of a unit block of a fluid flow correction system provided by an embodiment of the present invention, and FIG. 2 is a three-dimensional operation schematic diagram of a fluid flow correction system provided by an embodiment of the present invention. The present invention provides a fluid flow correction system 1000, and the fluid flow correction system 1000 can correct a fluid flow of a fluid flowing into a process equipment end 600 through a pipeline P. In actual application, the process equipment end 600 can be a chamber for a wet process, a pickling module, a rinsing module, or other equipment applications for semiconductor processes, and the present invention is not limited thereto.

具體而言,該流體流量校正系統1000包括:一控制閥100、至少一計量儀器200、一流量校正設備300以及一控制模組500。該控制閥100是透過控制其所具有的閥門的開關大小,以控制流過該管路P的該流體流量大小。該控制閥100可以是透過其閥門開度、電磁控制或其他定量方式控制該流體流量大小,本發明並不以此為限。該至少一計量儀器200能夠監測該流體流量,該至少一計量儀器200可以是流量計或流速計等儀器,本發明並不以此為限。在實際應用時,該至少一計量儀器200可以是在該流體流經一段時間或流速穩定時再行測量。該流量校正設備300能夠量測流入該流量校正設備300的一液體流 量並校正該流體流量。在一實施例中,本發明的該流體流量校正系統1000進一步包括一荷重計(Load Cell)400,該荷重計400與該流量校正設備300訊號連接或電性連接,並且能夠量測透過單位時間內通過該流量校正設備300的該流體重量,以供該流量校正設備300測量該流體流量。該荷重計400可以是磅秤、電子天平或其他用於秤重的裝置或儀器,本發明並不以此為限。該控制模組500是訊號連接於該控制閥100、該流量校正設備300(及/或該荷重計400)以及該至少一計量儀器200,該控制模組500能夠透過向前述元件傳送或接收訊號,以調控該流體流量。該控制模組500可以是一可程式化邏輯控制器(Programmable Logic Controller,PLC)、工業電腦(Industrial Personal Computer,IPC)或其他具有運算及控制功能的控制裝置或設備,且所述訊號連接可以是以有線或無線的方式為之,本發明並不以此為限。 Specifically, the fluid flow correction system 1000 includes: a control valve 100, at least one metering instrument 200, a flow correction device 300 and a control module 500. The control valve 100 controls the flow rate of the fluid flowing through the pipeline P by controlling the switch size of the valve it has. The control valve 100 can control the flow rate of the fluid through its valve opening, electromagnetic control or other quantitative methods, but the present invention is not limited to this. The at least one metering instrument 200 can monitor the fluid flow rate, and the at least one metering instrument 200 can be an instrument such as a flow meter or a flow meter, but the present invention is not limited to this. In actual application, the at least one metering instrument 200 can measure again when the fluid flows for a period of time or the flow rate is stable. The flow calibration device 300 can measure a liquid flow rate flowing into the flow calibration device 300 and calibrate the fluid flow rate. In one embodiment, the fluid flow calibration system 1000 of the present invention further includes a load cell 400, which is signal-connected or electrically connected to the flow calibration device 300 and can measure the weight of the fluid passing through the flow calibration device 300 per unit time, so that the flow calibration device 300 can measure the fluid flow rate. The load cell 400 can be a scale, an electronic balance, or other device or instrument for weighing, but the present invention is not limited thereto. The control module 500 is signal-connected to the control valve 100, the flow correction device 300 (and/or the load cell 400) and the at least one metering instrument 200. The control module 500 can adjust the fluid flow rate by transmitting or receiving signals to the aforementioned components. The control module 500 can be a programmable logic controller (PLC), an industrial personal computer (IPC) or other control device or equipment with computing and control functions, and the signal connection can be made in a wired or wireless manner, but the present invention is not limited thereto.

在一實施例中,本發明的流體流量校正系統1000是透過執行下述動作以校正該流體流量。首先,該控制模組500設定一目標流量並控制該控制閥100根據該目標流量調整該流體流量。該目標流量可以是製程所需的流量,並且在校正過程中,可以先依初始流量設定,也就是依未曾進入過該製程設備端600的該流體所應具有的該目標流量。具體而言,該控制模組500是透過傳送一目標流量訊號至該控制閥100,以控制該控制閥100根據該目標流量訊號調整該流體流量,以及該控制閥100根據該目標流量訊號調整該流體流量,並回傳一調整回饋訊號至該控制模組500。也就是說,控制模組500在接收到該調整回饋訊號後,即確認該控制閥100的當前的該流體流量以設定在該目標流量。 In one embodiment, the fluid flow correction system 1000 of the present invention corrects the fluid flow by performing the following actions. First, the control module 500 sets a target flow and controls the control valve 100 to adjust the fluid flow according to the target flow. The target flow can be the flow required by the process, and during the correction process, it can be set according to the initial flow, that is, according to the target flow that the fluid that has not entered the process equipment end 600 should have. Specifically, the control module 500 controls the control valve 100 to adjust the fluid flow according to the target flow signal by transmitting a target flow signal to the control valve 100, and the control valve 100 adjusts the fluid flow according to the target flow signal, and returns an adjustment feedback signal to the control module 500. That is, after receiving the adjustment feedback signal, the control module 500 confirms the current fluid flow rate of the control valve 100 and sets it at the target flow rate.

接著,該控制模組500透過該流量校正設備300判斷該流體流量與該目標流量是否相同。如圖2所示,該流體流量校正系統1000的該管路P上進一步包括一製程設備端閥門V1以及一流量校正設備端閥門V2,該製程設備端閥門V1設置在該製程設備端600前的該管路P上,該流量校正設備端閥門V2設置在該流量校正設備300前的該管路P上。也就是說,本發明流體流量校正系統1000的該管路P是以分支的方式設計,並透過該製程設備端閥門V1以及該流量校正設備端閥門V2分別控制該流體的流入。藉此,透過該製程設備端閥門V1以及該流量校正設備端閥門V2的開啟及關閉,可以控制該流體往該製程設備端600或往該流量校正設備300流動。 Then, the control module 500 determines whether the fluid flow rate is the same as the target flow rate through the flow correction device 300. As shown in FIG2 , the pipeline P of the fluid flow correction system 1000 further includes a process equipment end valve V1 and a flow correction device end valve V2. The process equipment end valve V1 is set on the pipeline P before the process equipment end 600, and the flow correction device end valve V2 is set on the pipeline P before the flow correction device 300. In other words, the pipeline P of the fluid flow correction system 1000 of the present invention is designed in a branching manner, and the inflow of the fluid is controlled by the process equipment end valve V1 and the flow correction device end valve V2. Thus, by opening and closing the valve V1 at the process equipment end and the valve V2 at the flow correction equipment end, the fluid can be controlled to flow to the process equipment end 600 or to the flow correction equipment 300.

具體而言,為了以該流量校正設備300量測該流體當前的該流體流量,該控制模組500需控制該流體流量校正系統1000的該管路P中的該流體完全流向該流體流量校正設備300。在一實施例中,該控制模組500關閉該製程設備端閥門V1,以停止該流體流入該製程設備端600,且該控制模組500開啟該流量校正設備端閥門V2,以供該流體流入該流量校正設備300。接著,該控制模組500傳送一流量校正訊號至該流量校正設備300以啟動該流量校正設備300並使其量測該流體流量,該流量校正設備300量測該流體流量後,傳送一校正回饋訊號至該控制模組500。 Specifically, in order to measure the current fluid flow rate of the fluid with the flow correction device 300, the control module 500 needs to control the fluid in the pipeline P of the fluid flow correction system 1000 to flow completely to the fluid flow correction device 300. In one embodiment, the control module 500 closes the process equipment end valve V1 to stop the fluid from flowing into the process equipment end 600, and the control module 500 opens the flow correction device end valve V2 to allow the fluid to flow into the flow correction device 300. Then, the control module 500 transmits a flow correction signal to the flow correction device 300 to start the flow correction device 300 and make it measure the fluid flow rate. After measuring the fluid flow rate, the flow correction device 300 transmits a correction feedback signal to the control module 500.

在一實施例中,該流量校正設備300可以是透過該荷重計400量測該流體單位時間內累積流過該流量校正設備300的重量以量測該流體流量。該流量校正設備300再根據所量測到的該流體流量傳送該校正回饋訊號至該控制模組500。如此,該控制模組500即可根據該調整回饋訊號以及該校正回饋訊號判斷該流體流量以及所設定的該目標流量是否相同。在實際應用時,該控制 模組500可以根據將前述訊號彼此比較或是經過其他計算得出前述判斷,本發明並不以此為限。當該流體流量與該目標流量不同時,該控制模組500控制該控制閥100調整該流體流量以符合該目標流量,而當該流體流量與該目標流量相同時,該控制模組500控制該流體流入該製程設備端600。 In one embodiment, the flow calibration device 300 can measure the fluid flow rate by measuring the accumulated weight of the fluid flowing through the flow calibration device 300 per unit time through the load cell 400. The flow calibration device 300 then transmits the calibration feedback signal to the control module 500 according to the measured fluid flow rate. In this way, the control module 500 can determine whether the fluid flow rate is the same as the set target flow rate according to the adjustment feedback signal and the calibration feedback signal. In actual application, the control module 500 can obtain the above judgment by comparing the above signals with each other or through other calculations, and the present invention is not limited thereto. When the fluid flow rate is different from the target flow rate, the control module 500 controls the control valve 100 to adjust the fluid flow rate to meet the target flow rate, and when the fluid flow rate is the same as the target flow rate, the control module 500 controls the fluid to flow into the process equipment end 600.

值得一提的是,在一實施例中,當該流體流量以及該目標流量的差小於或等於一預定容許值時,該控制模組500可以判斷該流體流量與該目標流量相同。在實際應用中,由於當前流過該管路P的該流體中所含的氣泡及副產物的含量不盡然相同,故往復調控該目標流量以及該流體流量有可能仍難以達到完全相同。因此,可以預先在該控制模組500中預設該預定容許值,若該流體流量以及該目標流量的差小於或等於該預定容許值,而不會對製程產生影響時,即可執行後續動作,以達到校正該流體流量以優化製程並降低成本的目的。例如,該預定容許值可以是介於5%至15%的範圍,較佳為10%,意即該流體流量以及該目標流量的差介於±10%間時,該控制模組500仍判斷該流體流量與該目標流量相同,但本發明並不以此為限,並可以根據實際需求調整。 It is worth mentioning that in one embodiment, when the difference between the fluid flow rate and the target flow rate is less than or equal to a predetermined allowable value, the control module 500 can determine that the fluid flow rate is the same as the target flow rate. In actual applications, since the content of bubbles and byproducts contained in the fluid currently flowing through the pipeline P is not exactly the same, it may still be difficult to achieve the same consistency by reciprocating the target flow rate and the fluid flow rate. Therefore, the predetermined allowable value can be preset in the control module 500 in advance. If the difference between the fluid flow rate and the target flow rate is less than or equal to the predetermined allowable value and will not affect the process, subsequent actions can be executed to achieve the purpose of correcting the fluid flow rate to optimize the process and reduce costs. For example, the predetermined allowable value may be in the range of 5% to 15%, preferably 10%, which means that when the difference between the fluid flow rate and the target flow rate is between ±10%, the control module 500 still determines that the fluid flow rate is the same as the target flow rate, but the present invention is not limited thereto and can be adjusted according to actual needs.

當該控制模組500判斷該流體流量與該目標流量不同或差不在容許值範圍內時,該控制模組500傳送一流量調整訊號至該控制閥100,該控制閥100根據該流量調整訊號調整其閥門的大小以調整使該流體流量符合該目標流量,以及該控制閥100傳送一調整回饋訊號至該控制模組500。該控制模組500可以再傳送該流量校正訊號至該流量校正設備300以使其量測該流體流量,該流量校正設備300則同樣量測該流體流量後,傳送該校正回饋訊號至該控制模組500。該控制模組500可以再根據該調整回饋訊號以及該校正回饋訊號判斷該流體流量以及該目標流量是否相同,如此循環往復直至該控制模組500判斷該 流體流量與該目標流量相同或差介於容許值範圍內時,該控制模組500開啟該製程設備端閥門V1,以供應該流體流入該製程設備端600,且該控制模組500關閉該流量校正設備端閥門V2,以停止該流體流入該流量校正設備300。值得一提的是,本發明並不限制前述該製程設備端閥門V1及該流量校正設備端閥門V2關閉及開啟的順序。此外,本發明所述的調整回饋訊號及校正回饋訊號至少包含該元件所量測取得的該流體流量,以供該控制模組500判斷及比對。 When the control module 500 determines that the fluid flow rate is different from the target flow rate or the difference is not within the allowable value range, the control module 500 transmits a flow adjustment signal to the control valve 100, and the control valve 100 adjusts the size of its valve according to the flow adjustment signal to adjust the fluid flow rate to meet the target flow rate, and the control valve 100 transmits an adjustment feedback signal to the control module 500. The control module 500 can then transmit the flow correction signal to the flow correction device 300 to measure the fluid flow rate, and the flow correction device 300 also measures the fluid flow rate and transmits the correction feedback signal to the control module 500. The control module 500 can then determine whether the fluid flow rate is the same as the target flow rate according to the adjustment feedback signal and the correction feedback signal, and repeat this cycle until the control module 500 determines that the fluid flow rate is the same as the target flow rate or the difference is within the allowable value range. The control module 500 opens the process equipment end valve V1 to supply the fluid to flow into the process equipment end 600, and the control module 500 closes the flow correction device end valve V2 to stop the fluid from flowing into the flow correction device 300. It is worth mentioning that the present invention does not limit the order of closing and opening the aforementioned process equipment end valve V1 and the flow correction device end valve V2. In addition, the adjustment feedback signal and correction feedback signal described in the present invention at least include the fluid flow rate measured by the component for the control module 500 to judge and compare.

在本發明實施例中,該控制模組500可以透過該至少一計量儀器200監控流過該管路P的該流體流量,該流體流量校正系統1000的該至少一計量儀器200訊號連接於該控制模組500,且至少一計量儀器200可以是設置在該控制閥100以及該製程設備端閥門V1之間,用以監測流過該製程設備端閥門V1的該流體流量,或是設置在該控制閥100以及該流量校正設備端閥門V2之間,用以監測流過該流量校正設備端閥門V2的該流體流量。藉此,該控制模組500可以實時監測該管路P中的該流體流量,以判斷是否需進行流體流量校正或是先前所進行的校正是否正確。 In the embodiment of the present invention, the control module 500 can monitor the fluid flow rate flowing through the pipeline P through the at least one metering instrument 200. The signal of the at least one metering instrument 200 of the fluid flow correction system 1000 is connected to the control module 500, and the at least one metering instrument 200 can be arranged between the control valve 100 and the valve V1 at the process equipment end to monitor the fluid flow rate flowing through the valve V1 at the process equipment end, or be arranged between the control valve 100 and the valve V2 at the flow correction equipment end to monitor the fluid flow rate flowing through the valve V2 at the flow correction equipment end. In this way, the control module 500 can monitor the fluid flow in the pipeline P in real time to determine whether fluid flow calibration is required or whether the calibration previously performed is correct.

請參見圖3及圖4所示,圖3為本發明一實施例所提供的流體流量校正方法的流程示意圖,圖4為本發明另一實施例所提供的流體流量校正方法的流程示意圖。在另一實施例中,本發明提供一流體流量校正方法,以校正透過該管路P流入該製程設備端600流體的該流體流量。如圖3及圖4所示,一併配合參閱圖1及圖2所示,本發明的流體流量校正方法是透過下列步驟達成該流體流量校正:步驟S100:透過該控制模組500設定該目標流量,且該控制模組500控制該控制閥100根據該目標流量調整該流體流量大小; 步驟S200:該控制模組500透過該流量校正設備300量測流入該流量校正設備300的一液體流量;步驟S300:該控制模組500判斷該流體流量與該目標流量是否相同,當該流體流量與該目標流量不同時,執行步驟S400;當該流體流量與該目標流量相同時,執行步驟S500;步驟S400:該控制模組500控制該控制閥100調整該流體流量大小以符合該目標流量;以及步驟S500:該控制模組500控制該流體流入該製程設備端600。 Please refer to FIG. 3 and FIG. 4. FIG. 3 is a schematic flow chart of a fluid flow correction method provided by one embodiment of the present invention, and FIG. 4 is a schematic flow chart of a fluid flow correction method provided by another embodiment of the present invention. In another embodiment, the present invention provides a fluid flow correction method to correct the fluid flow of the fluid flowing into the process equipment end 600 through the pipeline P. As shown in FIG. 3 and FIG. 4, together with FIG. 1 and FIG. 2, the fluid flow correction method of the present invention achieves the fluid flow correction through the following steps: Step S100: The target flow is set through the control module 500, and the control module 500 controls the control valve 100 to adjust the fluid flow according to the target flow; Step S200: The control module 500 measures a liquid flow flowing into the flow correction device 300 through the flow correction device 300. ; Step S300: The control module 500 determines whether the fluid flow rate is the same as the target flow rate. When the fluid flow rate is different from the target flow rate, step S400 is executed; when the fluid flow rate is the same as the target flow rate, step S500 is executed; Step S400: The control module 500 controls the control valve 100 to adjust the fluid flow rate to meet the target flow rate; and Step S500: The control module 500 controls the fluid to flow into the process equipment end 600.

在步驟S100中,該控制模組500是透過傳送該目標流量訊號至該控制閥100以控制該控制閥100根據該目標流量調整該流體流量,且該控制閥100根據該目標流量訊號調整該流體流量,並回傳該調整回饋訊號至該控制模組500。在步驟S300中,該控制模組500是根據該調整回饋訊號以及該校正回饋訊號判斷該流體流量以及該目標流量是否相同。 In step S100, the control module 500 controls the control valve 100 to adjust the fluid flow according to the target flow by transmitting the target flow signal to the control valve 100, and the control valve 100 adjusts the fluid flow according to the target flow signal and returns the adjustment feedback signal to the control module 500. In step S300, the control module 500 determines whether the fluid flow and the target flow are the same according to the adjustment feedback signal and the correction feedback signal.

在另一實施例中,在執行步驟S200前,進一步包括下列步驟:步驟S110:該控制模組500關閉該製程設備端閥門V1,以停止該流體流入該製程設備端600;以及步驟S120:該控制模組500開啟該流量校正設備端閥門V2,以供該流體流入該流量校正設備300。 In another embodiment, before executing step S200, the following steps are further included: step S110: the control module 500 closes the process equipment end valve V1 to stop the fluid from flowing into the process equipment end 600; and step S120: the control module 500 opens the flow correction device end valve V2 to allow the fluid to flow into the flow correction device 300.

在步驟S110及步驟S120中,該控制模組500是透過傳送該流量校正訊號至該流量校正設備300以啟動該流量校正設備300並使其量測該流體流量,在該流量校正設備300量測該流體流量後,該流量校正設備300傳送該校正回饋訊號至該控制模組500。 In step S110 and step S120, the control module 500 transmits the flow correction signal to the flow correction device 300 to activate the flow correction device 300 and make it measure the fluid flow rate. After the flow correction device 300 measures the fluid flow rate, the flow correction device 300 transmits the correction feedback signal to the control module 500.

本發明的流體流量校正方法可應用於本發明的流體流量校正系統1000,有關該流體流量校正系統1000的具體實施方式,均已於前述實施例中詳細描述,故於此不再贅述。 The fluid flow correction method of the present invention can be applied to the fluid flow correction system 1000 of the present invention. The specific implementation of the fluid flow correction system 1000 has been described in detail in the aforementioned embodiments, so it will not be repeated here.

綜上所述,藉由定期校正管路中的流體流量,本發明所提供的流體流量校正系統1000及校正方法有助於調整控制閥100的閥門大小,以使得流體流量達到製程所需的目標流量。藉此,可降低在半導體製程設備中(例如濕製程設備)流體流量不穩的問題,進而提高整體製程的良率或產率(例如提升晶圓蝕刻後的清洗良率),同時減少更換價格高昂的流體的次數並降低製程成本。 In summary, by regularly calibrating the fluid flow in the pipeline, the fluid flow calibration system 1000 and calibration method provided by the present invention help adjust the valve size of the control valve 100 so that the fluid flow reaches the target flow required by the process. In this way, the problem of unstable fluid flow in semiconductor process equipment (such as wet process equipment) can be reduced, thereby improving the yield or production rate of the overall process (such as improving the cleaning yield after wafer etching), while reducing the number of times expensive fluids are replaced and reducing process costs.

以上僅是本發明的較佳實施方式,應當指出,對於本發明所屬技術領域中具有通常知識者而言,在不脫離本發明原理的前提下,還可以做出若干改進和潤飾,這些改進和潤飾也應視為本發明的保護範圍。 The above is only the best implementation method of the present invention. It should be pointed out that for those with ordinary knowledge in the technical field to which the present invention belongs, several improvements and modifications can be made without departing from the principle of the present invention. These improvements and modifications should also be regarded as the scope of protection of the present invention.

1000:流體流量校正系統 1000: Fluid flow calibration system

100:控制閥 100: Control valve

200:計量儀器 200: Measuring instruments

300:流量校正設備 300: Flow calibration equipment

400:荷重計 400: Load meter

500:控制模組 500: Control module

600:製程設備端 600: Process equipment side

Claims (14)

一種流體流量校正系統,用以校正透過一管路流入一製程設備端流體的一流體流量,包括: 一控制閥,用以控制該流體流量大小; 至少一計量儀器,用以監測該流體流量; 一流量校正設備,用以量測流入該流量校正設備的一液體流量並校正該流體流量;以及 一控制模組,訊號連接於該控制閥、該流量校正設備以及該至少一計量儀器,用以透過訊號調控該流體流量; 其中,該控制模組設定一目標流量,且該控制模組控制該控制閥根據該目標流量調整該流體流量; 其中,該控制模組透過該流量校正設備判斷該流體流量與該目標流量是否相同; 當該流體流量與該目標流量不同時,該控制模組控制該控制閥調整該流體流量以符合該目標流量; 當該流體流量與該目標流量相同時,該控制模組控制該流體流入該製程設備端。 A fluid flow correction system is used to correct the flow of a fluid flowing into a process equipment end through a pipeline, comprising: A control valve for controlling the size of the fluid flow; At least one metering instrument for monitoring the fluid flow; A flow correction device for measuring the flow of a liquid flowing into the flow correction device and correcting the fluid flow; and A control module, the signal of which is connected to the control valve, the flow correction device and the at least one metering instrument, for regulating the fluid flow through the signal; Wherein, the control module sets a target flow, and the control module controls the control valve to adjust the fluid flow according to the target flow; Wherein, the control module determines whether the fluid flow is the same as the target flow through the flow correction device; When the fluid flow rate is different from the target flow rate, the control module controls the control valve to adjust the fluid flow rate to meet the target flow rate; When the fluid flow rate is the same as the target flow rate, the control module controls the fluid to flow into the process equipment end. 如請求項1所述的流體流量校正系統,其中該控制模組設定該目標流量,且該控制模組控制該控制閥根據該目標流量調整該流體流量,進一步包括: 該控制模組傳送一目標流量訊號至該控制閥以控制該控制閥根據該目標流量調整該流體流量;以及 該控制閥根據該目標流量訊號調整該流體流量,並回傳一調整回饋訊號至該控制模組。 The fluid flow correction system as described in claim 1, wherein the control module sets the target flow, and the control module controls the control valve to adjust the fluid flow according to the target flow, further comprising: The control module transmits a target flow signal to the control valve to control the control valve to adjust the fluid flow according to the target flow; and The control valve adjusts the fluid flow according to the target flow signal, and returns an adjustment feedback signal to the control module. 如請求項2所述的流體流量校正系統,進一步包括一製程設備端閥門以及一流量校正設備端閥門,該製程設備端閥門設置在該製程設備端前的該管路上,該流量校正設備端閥門設置在該流量校正設備前的該管路上,其中,在該控制模組透過該流量校正設備判斷該流體流量與該目標流量是否相同前,進一步包括: 該控制模組關閉該製程設備端閥門,以停止該流體流入該製程設備端; 該控制模組開啟該流量校正設備端閥門,以供該流體流入該流量校正設備;以及 該控制模組傳送一流量校正訊號至該流量校正設備以啟動該流量校正設備並使其量測該流體流量,該流量校正設備量測該流體流量後,傳送一校正回饋訊號至該控制模組。 The fluid flow correction system as described in claim 2 further includes a process equipment end valve and a flow correction device end valve, the process equipment end valve is arranged on the pipeline in front of the process equipment end, and the flow correction device end valve is arranged on the pipeline in front of the flow correction device, wherein, before the control module determines whether the fluid flow is the same as the target flow through the flow correction device, it further includes: The control module closes the process equipment end valve to stop the fluid from flowing into the process equipment end; The control module opens the flow correction device end valve to allow the fluid to flow into the flow correction device; and The control module transmits a flow correction signal to the flow correction device to activate the flow correction device and enable it to measure the fluid flow rate. After measuring the fluid flow rate, the flow correction device transmits a correction feedback signal to the control module. 如請求項3所述的流體流量校正系統,其中,在該控制模組透過該流量校正設備判斷該流體流量與該目標流量是否相同時,進一步包括: 該控制模組根據該調整回饋訊號以及該校正回饋訊號判斷該流體流量以及該目標流量是否相同。 The fluid flow correction system as described in claim 3, wherein when the control module determines whether the fluid flow is the same as the target flow through the flow correction device, it further includes: The control module determines whether the fluid flow is the same as the target flow based on the adjustment feedback signal and the correction feedback signal. 如請求項4所述的流體流量校正系統,其中, 當該流體流量以及該目標流量的差小於或等於一預定容許值時,該控制模組判斷該流體流量與該目標流量相同。 A fluid flow correction system as described in claim 4, wherein, when the difference between the fluid flow and the target flow is less than or equal to a predetermined allowable value, the control module determines that the fluid flow is the same as the target flow. 如請求項3所述的流體流量校正系統,其中,該至少一計量儀器設置在該管路上,且位於該控制閥以及該製程設備端閥門之間,用以監測流過該製程設備端閥門的該流體流量。A fluid flow calibration system as described in claim 3, wherein the at least one metering instrument is arranged on the pipeline and located between the control valve and the valve at the end of the process equipment to monitor the fluid flow flowing through the valve at the end of the process equipment. 如請求項3所述的流體流量校正系統,其中,該至少一計量儀器設置在該管路上,且位於該控制閥以及該流量校正設備端閥門之間,用以監測流過該流量校正設備端閥門的該流體流量。A fluid flow correction system as described in claim 3, wherein the at least one metering instrument is arranged on the pipeline and located between the control valve and the valve at the end of the flow correction device to monitor the fluid flow flowing through the valve at the end of the flow correction device. 一種流體流量校正方法,用以校正透過一管路流入一製程設備端流體的一流體流量,包括下列步驟: 透過一控制模組設定一目標流量,且該控制模組控制一控制閥根據該目標流量調整該流體流量大小; 該控制模組透過一流量校正設備量測流入該流量校正設備的一液體流量,以判斷該流體流量與該目標流量是否相同; 當該流體流量與該目標流量不同時,該控制模組控制該控制閥調整該流體流量大小以符合該目標流量; 當該流體流量與該目標流量相同時,該控制模組控制該流體流入該製程設備端; 其中,該控制模組訊號連接於該控制閥以及該流量校正設備,並透過訊號調控該流體流量。 A fluid flow correction method is used to correct a fluid flow rate of a fluid flowing into a process equipment end through a pipeline, comprising the following steps: A target flow rate is set through a control module, and the control module controls a control valve to adjust the fluid flow rate according to the target flow rate; The control module measures a liquid flow rate flowing into the flow correction device through a flow correction device to determine whether the fluid flow rate is the same as the target flow rate; When the fluid flow rate is different from the target flow rate, the control module controls the control valve to adjust the fluid flow rate to meet the target flow rate; When the fluid flow rate is the same as the target flow rate, the control module controls the fluid to flow into the process equipment end; Wherein, the control module signal is connected to the control valve and the flow correction device, and the fluid flow rate is adjusted through the signal. 如請求項8所述的流體流量校正方法,其中該控制模組設定該目標流量,且該控制模組控制該控制閥根據該目標流量調整該流體流量大小,進一步包括: 該控制模組傳送一目標流量訊號至該控制閥以控制該控制閥根據該目標流量調整該流體流量;以及 該控制閥根據該目標流量訊號調整該流體流量,並回傳一調整回饋訊號至該控制模組。 The fluid flow correction method as described in claim 8, wherein the control module sets the target flow, and the control module controls the control valve to adjust the fluid flow according to the target flow, further comprising: The control module transmits a target flow signal to the control valve to control the control valve to adjust the fluid flow according to the target flow; and The control valve adjusts the fluid flow according to the target flow signal, and returns an adjustment feedback signal to the control module. 如請求項9所述的流體流量校正方法,該管路上進一步具有一製程設備端閥門以及一流量校正設備端閥門,該製程設備端閥門設置在該製程設備端前的該管路上,該流量校正設備端閥門設置在該流量校正設備前的該管路上,其中,在該控制模組透過該流量校正設備判斷該流體流量與該目標流量是否相同前,進一步包括: 該控制模組關閉該製程設備端閥門,以停止該流體流入該製程設備端; 該控制模組開啟該流量校正設備端閥門,以供該流體流入該流量校正設備;以及 該控制模組傳送一流量校正訊號至該流量校正設備以啟動該流量校正設備並使其量測該流體流量,該流量校正設備量測該流體流量後,傳送一校正回饋訊號至該控制模組。 As described in claim 9, the fluid flow correction method further comprises a process equipment end valve and a flow correction device end valve on the pipeline, the process equipment end valve is arranged on the pipeline in front of the process equipment end, and the flow correction device end valve is arranged on the pipeline in front of the flow correction device, wherein, before the control module determines whether the fluid flow is the same as the target flow through the flow correction device, it further comprises: The control module closes the process equipment end valve to stop the fluid from flowing into the process equipment end; The control module opens the flow correction device end valve to allow the fluid to flow into the flow correction device; and The control module transmits a flow correction signal to the flow correction device to activate the flow correction device and enable it to measure the fluid flow rate. After measuring the fluid flow rate, the flow correction device transmits a correction feedback signal to the control module. 如請求項10所述的流體流量校正方法,其中,在該控制模組透過該流量校正設備判斷該流體流量與該目標流量是否相同時,進一步包括: 該控制模組根據該調整回饋訊號以及該校正回饋訊號判斷該流體流量以及該目標流量是否相同。 The fluid flow correction method as described in claim 10, wherein when the control module determines whether the fluid flow is the same as the target flow through the flow correction device, it further includes: The control module determines whether the fluid flow is the same as the target flow based on the adjustment feedback signal and the correction feedback signal. 如請求項11所述的流體流量校正方法,其中, 當該流體流量以及該目標流量的差小於或等於一預定容許值時,該控制模組判斷該流體流量與該目標流量相同。 A fluid flow correction method as described in claim 11, wherein, when the difference between the fluid flow and the target flow is less than or equal to a predetermined allowable value, the control module determines that the fluid flow is the same as the target flow. 如請求項10所述的流體流量校正方法,其中,該管路上進一步具有至少一計量儀器,訊號連接於該控制模組,且該至少一計量儀器位於該控制閥以及該製程設備端閥門之間,用以監測流過該製程設備端閥門的該流體流量。A fluid flow correction method as described in claim 10, wherein the pipeline further has at least one metering instrument, the signal of which is connected to the control module, and the at least one metering instrument is located between the control valve and the valve at the end of the process equipment to monitor the fluid flow flowing through the valve at the end of the process equipment. 如請求項10所述的流體流量校正方法,其中,該管路上進一步具有至少一計量儀器,訊號連接於該控制模組,且該至少一計量儀器位於該控制閥以及該流量校正設備端閥門之間,用以監測流過該流量校正設備端閥門的該流體流量。A fluid flow correction method as described in claim 10, wherein the pipeline further has at least one metering instrument, the signal of which is connected to the control module, and the at least one metering instrument is located between the control valve and the valve at the end of the flow correction device to monitor the fluid flow flowing through the valve at the end of the flow correction device.
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