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TWI879870B - Laser processing device and laser processing method - Google Patents

Laser processing device and laser processing method Download PDF

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TWI879870B
TWI879870B TW110101565A TW110101565A TWI879870B TW I879870 B TWI879870 B TW I879870B TW 110101565 A TW110101565 A TW 110101565A TW 110101565 A TW110101565 A TW 110101565A TW I879870 B TWI879870 B TW I879870B
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laser light
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TW202132031A (en
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坂本剛志
久野耕司
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日商濱松赫德尼古斯股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50Working by transmitting the laser beam through or within the workpiece
    • B23K26/53Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • B23K26/032Observing, e.g. monitoring, the workpiece using optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/0869Devices involving movement of the laser head in at least one axial direction
    • H10P72/0428

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  • Physics & Mathematics (AREA)
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  • Laser Beam Processing (AREA)
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Abstract

雷射加工裝置係具備支承部、照射部、移動機構、驅動部、測定資料取得部及控制部。控制部係執行第1處理及第2處理,該第1處理係在較對象物的周緣更內側,以聚光位置沿著周緣移動的方式使支承部及照射部中的至少一方移動,沿著周緣而在對象物的內部形成第1改質區域,該第2處理係在進行第1處理後,以聚光位置從對象物的外部進入內部的方式使支承部及照射部中的至少一方移動,在對象物的內部形成第2改質區域。測定資料取得部係在第1處理,使測定資料與關於對象物的位置之位置資訊相關連並取得。控制部係在第2處理,當聚光位置從對象物的外部進入內部前或進入時,使沿著藉由驅動部之支承部及聚光透鏡中的至少一方的光軸方向之位置,朝依據在第1處理取得的測定資料之初期位置移動。The laser processing device includes a support part, an irradiation part, a moving mechanism, a driving part, a measurement data acquisition part, and a control part. The control part performs a first process and a second process. The first process is to move at least one of the support part and the irradiation part inwardly of the periphery of the object so that the focusing position moves along the periphery to form a first modified area inside the object along the periphery. The second process is to move at least one of the support part and the irradiation part so that the focusing position moves from the outside of the object to the inside after the first process to form a second modified area inside the object. The measurement data acquisition part associates the measurement data with the position information about the position of the object in the first process and acquires it. The control unit moves the position along the optical axis direction of at least one of the support unit of the driving unit and the focusing lens toward the initial position based on the measurement data obtained in the first processing before or when the focusing position enters the inside of the object from the outside in the second processing.

Description

雷射加工裝置及雷射加工方法Laser processing device and laser processing method

本發明係關於雷射加工裝置及雷射加工方法。The present invention relates to a laser processing device and a laser processing method.

以往,藉由對對象物照射雷射光,在前述對象物形成改質區域之雷射加工裝置為眾所皆知(例如參照專利文獻1)。這種的雷射加工裝置具備:支承對象物之支承部;對對象物,經由聚光透鏡照射雷射光之照射部;以雷射光的聚光位置移動的方式,使支承部及照射部中的至少一方移動之移動機構;及以追隨雷射光射入面的位移的方式,將聚光透鏡沿著光軸方向進行驅動之驅動部。 [先前技術文獻] [專利文獻] In the past, laser processing devices for forming a modified area on an object by irradiating the object with laser light are well known (for example, refer to Patent Document 1). Such a laser processing device comprises: a support portion for supporting the object; an irradiation portion for irradiating the object with laser light through a focusing lens; a moving mechanism for moving at least one of the support portion and the irradiation portion by moving the focusing position of the laser light; and a driving portion for driving the focusing lens along the optical axis direction by following the displacement of the laser light incident surface. [Prior Technical Document] [Patent Document]

[專利文獻1]日本特開2015-186825號公報[Patent Document 1] Japanese Patent Application Publication No. 2015-186825

[發明所欲解決之問題][The problem the invention is trying to solve]

在前述的技術中,在以聚光位置從對象物的外部進入內部的方式使支承部或照射部移動而在對象物形成改質區域之情況,有例如在剛進入後的時間點,在輸入於驅動部的控制訊號產生過衝,使聚光透鏡追隨雷射光射入面的位移的精度降低之可能性。In the aforementioned technology, when the support part or the irradiation part is moved in such a way that the focusing position moves from the outside to the inside of the object to form a modified area on the object, there is a possibility that, for example, at a point in time just after the entry, an overshoot occurs in the control signal input to the drive part, thereby reducing the accuracy of the focusing lens in tracking the displacement of the laser light incident surface.

因此,本發明的目的係在於提供可抑制追隨動作對雷射光射入面的位移之精度降低的雷射加工裝置及雷射加工方法。 [解決問題之技術手段] Therefore, the purpose of the present invention is to provide a laser processing device and a laser processing method that can suppress the reduction in the accuracy of the displacement of the laser light incident surface due to the tracking action. [Technical means to solve the problem]

本發明的一態樣之雷射加工裝置,係藉由對對象物照射雷射光,在對象物的內部形成改質區域,其特徵為具備:支承部,其係用來支承對象物;照射部,其係對對象物,經由聚光透鏡照射雷射光;移動機構,其係使支承部及照射部中的至少一方移動,讓雷射光的聚光位置移動;驅動部,其係沿著聚光透鏡的光軸方向,驅動支承部及聚光透鏡中的至少一方;測定資料取得部,其係用來取得關於對象物之雷射光射入的雷射光射入面的位移、及支承部之支承對象物的支承面的位移中的至少一個之測定資料;及控制部,其係控制照射部、移動機構及驅動部,控制部係執行第1處理及第2處理,該第1處理係在較對象物的周緣更內側,以使聚光位置沿著周緣移動的方式使支承部及照射部中的至少一方移動,沿著周緣而在對象物的內部形成第1改質區域,該第2處理係在進行第1處理後,以聚光位置從對象物的外部進入內部的方式使支承部及照射部中的至少一方移動,在對象物的內部形成第2改質區域,測定資料取得部係在第1處理,使測定資料與關於對象物的位置之位置資訊相關連並取得,控制部係在第2處理,當聚光位置從對象物的外部進入內部前或進入時,使沿著藉由驅動部之支承部及聚光透鏡中的至少一方的光軸方向之位置,朝依據在第1處理取得的測定資料之初期位置移動。A laser processing device according to one aspect of the present invention forms a modified area inside an object by irradiating the object with laser light, and is characterized by comprising: a support portion for supporting the object; an irradiation portion for irradiating the object with laser light through a focusing lens; a moving mechanism for moving at least one of the support portion and the irradiation portion to move the focusing position of the laser light; a driving portion for driving at least one of the support portion and the focusing lens along the optical axis direction of the focusing lens; a measurement data acquisition portion for acquiring measurement data on at least one of the displacement of the laser light incident surface of the object through which the laser light is incident and the displacement of the supporting surface of the support portion supporting the object; and a control portion for controlling the irradiation portion, the moving mechanism and the driving portion, wherein the control portion executes a first process and a second process. The first processing is to move at least one of the support part and the irradiation part in a manner that the focusing position moves along the periphery at a position further inward than the periphery of the object, thereby forming a first modified area inside the object along the periphery. The second processing is to move at least one of the support part and the irradiation part in a manner that the focusing position enters the inside of the object from the outside after the first processing, thereby forming a second modified area inside the object. The measurement data acquisition part associates and acquires the measurement data with the position information about the position of the object in the first processing. The control part moves the position along the optical axis direction of at least one of the support part and the focusing lens through the driving part toward the initial position according to the measurement data acquired in the first processing before or when the focusing position enters the inside of the object from the outside.

在此雷射加工裝置,在執行第2處理時,當聚光位置從對象物的外部進入內部前或進入時,藉由驅動部,使支承部及聚光透鏡中的至少一方朝依據在第1處理取得的測定資料之初期位置移動。藉此,在例如剛進入後的時間點,比起未考量這樣的初期位置的情況,能夠抑制前述的過衝。其結果,能夠抑制追隨動作對雷射光射入面的位移之精度降低。In this laser processing device, when the second process is performed, before or when the focusing position enters the inside of the object from the outside, the driving unit moves at least one of the support unit and the focusing lens toward the initial position based on the measurement data obtained in the first process. In this way, at a time point such as immediately after the entry, the aforementioned overshoot can be suppressed compared to a case where such an initial position is not considered. As a result, the accuracy of the displacement of the laser light incident surface by the tracking operation can be suppressed from being reduced.

在本發明的一態樣之雷射加工裝置,亦可為控制部係在第1處理,沿著繞著對象物的周緣之環狀線,形成第1改質區域,在第2處理,沿著與環狀線交叉的直線狀線,當從雷射光射入面觀看時,在從對象物之周緣到第1改質區域為止之周緣部分,形成第2改質區域。在此情況,可將對象物的周緣部分切離而去除。In a laser processing device of one aspect of the present invention, the control unit may form a first modified region along a ring-shaped line around the periphery of the object in the first process, and form a second modified region along a straight line intersecting the ring-shaped line in the peripheral portion from the periphery of the object to the first modified region when viewed from the laser light incident surface in the second process. In this case, the peripheral portion of the object can be cut off and removed.

在本發明的一態樣之雷射加工裝置,亦可為初期位置係依據測定資料之位置,該測定資料為關於在雷射光射入面之環狀線與直線狀線之交叉位置的位移之測定資料。藉此,在將對象物的周緣部分切離而去除的情況,可進一步抑制追隨動作對雷射光射入面的位移之精度降低。In one aspect of the present invention, the initial position of the laser processing device can be based on the position of the measured data, which is the measured data on the displacement of the intersection position of the ring line and the straight line on the laser light incident surface. In this way, when the peripheral part of the object is cut off and removed, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be further suppressed.

在本發明的一態樣之雷射加工裝置,亦可為控制部係在第1處理,一邊以聚光位置沿著周緣移動的方式使支承部及照射部中的至少一方移動,一邊以追隨雷射光射入面的位移的方式,藉由驅動部驅動支承部及聚光透鏡中的至少一方,測定資料取得部係在第1處理,將為了追隨雷射光射入面的位移而藉由驅動部驅動支承部及聚光透鏡中的至少一方的情況之該驅動部的控制訊號值作為測定資料,並使其與位置資訊相關連且加以記憶,控制部係在第2處理,讀取在第1處理追隨環狀線與第1直線狀線之交叉位置的位移時之控制訊號值,沿著第1直線狀線,使支承部及照射部中的至少一方移動,讓聚光位置從對象物的外部進入內部,在周緣部分形成第2改質區域,並且,當聚光位置從對象物的外部進入內部前或進入到內部時,藉由讀取到的該控制訊號值控制驅動部,使支承部及聚光透鏡中的至少一方朝第1初期位置移動,讀取在第1處理追隨環狀線與第2直線狀線之交叉位置的位移時之控制訊號值,沿著第2直線狀線,使支承部及照射部中的至少一方移動,讓聚光位置從對象物的外部進入內部,在周緣部分形成第2改質區域,並且,當聚光位置從對象物的外部進入內部前或進入到內部時,藉由讀取到的該控制訊號值控制驅動部,使支承部及聚光透鏡中的至少一方朝第2初期位置移動。藉此,在將對象物的周緣部分切離而去除的情況,可進一步且具體地抑制追隨動作對雷射光射入面的位移之精度降低。In one aspect of the laser processing device of the present invention, the control unit may be in the first processing, while moving at least one of the support unit and the irradiation unit in a manner that the focusing position moves along the periphery, and at the same time, the driving unit drives at least one of the support unit and the focusing lens in a manner that tracks the displacement of the laser light incident surface, and the measurement data acquisition unit may be in the first processing ... The control signal value of the driving unit when the driving unit drives at least one of the supporting unit and the focusing lens is used as the measurement data, and is associated with the position information and stored. The control unit reads the control signal value when the first processing tracks the displacement of the intersection position of the ring line and the first straight line, and moves at least one of the supporting unit and the irradiating unit along the first straight line to move the focusing lens. The light position enters the inside of the object from the outside, and a second modified area is formed in the peripheral part. Moreover, before the focusing position enters the inside of the object from the outside or enters the inside, the driving part is controlled by the read control signal value, so that at least one of the support part and the focusing lens moves toward the first initial position, and the control signal value at the time of displacement of the intersection position of the first processing tracking annular line and the second straight line is read, and at least one of the supporting part and the irradiation part is moved along the second straight line, so that the focusing position enters the inside of the object from the outside, and a second modified area is formed in the peripheral part. Moreover, before the focusing position enters the inside of the object from the outside or enters the inside, the driving part is controlled by the read control signal value, so that at least one of the supporting part and the focusing lens moves toward the second initial position. Thereby, when the peripheral portion of the object is cut off and removed, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking operation can be further and specifically suppressed.

在本發明的一態樣之雷射加工裝置,亦可為控制部係在第1處理,沿著繞著對象物的周緣之環狀線,形成第1改質區域,在第2處理,沿著與環狀線交叉的直線狀線,當從雷射光射入面觀看時,在從對象物之較第1改質區域更內側的內側部分,形成第2改質區域。在此情況,作成為自第2改質區域起的龜裂不易朝對象物的周緣部分延伸,能在對象物的內側部分形成第2改質區域。In a laser processing device of one aspect of the present invention, the control unit may form a first modified region along a ring-shaped line around the periphery of the object in the first process, and form a second modified region along a straight line intersecting the ring-shaped line in the inner portion of the object more inner than the first modified region when viewed from the laser light incident surface in the second process. In this case, the second modified region can be formed in the inner portion of the object so that the cracks formed from the second modified region are less likely to extend toward the peripheral portion of the object.

在本發明的一態樣之雷射加工裝置,亦可為初期位置係依據測定資料之位置,該測定資料為關於在雷射光射入面之環狀線與直線狀線之交叉位置的位移之測定資料。藉此,在以作成自第2改質區域起的龜裂不易朝周緣部分延伸的方式形成第2改質區域的情況,可進一步抑制追隨動作對雷射光射入面的位移之精度降低。In a laser processing device of one aspect of the present invention, the initial position may be based on the position of the measured data, which is the measured data on the displacement of the intersection position of the ring line and the straight line on the laser light incident surface. In this way, when the second modified area is formed in a manner that makes it difficult for the tortoise crack from the second modified area to extend toward the peripheral portion, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be further suppressed.

在本發明的一態樣之雷射加工裝置,亦可為控制部係在第1處理,沿著繞著對象物的周緣之環狀線,形成第1改質區域,在第2處理,沿著對象物的內部之假想面,形成第2改質區域。在此情況,能夠達到將對象物沿著假想面剝離之剝離加工。In one aspect of the laser processing device of the present invention, the control unit may form a first modified area along a loop line around the periphery of the object in the first processing, and form a second modified area along an imaginary surface inside the object in the second processing. In this case, a peeling process can be achieved in which the object is peeled off along the imaginary surface.

在本發明的一態樣之雷射加工裝置,亦可為控制部係將在第2處理開始進行雷射光的照射之雷射光射入面的θ軸的周圍之θ位置作為第2處理用照射開始θ位置,初期位置係為依據測定資料之位置,該測定資料為關於在雷射光射入面之環狀線的第2處理用照射開始θ位置的位移之測定資料。藉此,在將對象物沿著假想面進行剝離的剝離加工的情況,可進一步抑制追隨動作對雷射光射入面的位移之精度降低。In a laser processing device of one aspect of the present invention, the control unit may set the θ position around the θ axis of the laser light incident surface where the laser light is irradiated at the start of the second process as the θ position for the second process irradiation start, and the initial position is a position based on measurement data, and the measurement data is measurement data of the displacement of the θ position for the second process irradiation start of the ring line on the laser light incident surface. In this way, in the case of peeling processing in which the object is peeled along the imaginary surface, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be further suppressed.

在本發明的一態樣之雷射加工裝置,亦可為控制部係在第2處理,在使支承部及聚光透鏡中的至少一方朝初期位置移動後,自當從雷射光射入面觀看時,聚光位置位於從對象物之周緣到第1改質區域為止的周緣部分時起,藉由驅動部驅動支承部及聚光透鏡中的至少一方,用以追隨雷射光射入面的位移。即使以如此的方式,在周緣部分,驅動成追隨雷射光射入面的位移的情況,亦可抑制追隨動作對雷射光射入面的位移之精度降低。In the laser processing device of one aspect of the present invention, the control unit may drive at least one of the support unit and the condensing lens to follow the displacement of the laser light incident surface by the driving unit after the condensing position is located at the peripheral portion from the periphery of the object to the first modified region when viewed from the laser light incident surface in the second process after the control unit moves at least one of the support unit and the condensing lens to the initial position. Even in such a manner, when the peripheral portion is driven to follow the displacement of the laser light incident surface, the reduction in the accuracy of the displacement of the laser light incident surface by the following operation can be suppressed.

在本發明的一態樣之雷射加工裝置,亦可為控制部係在第2處理,在使支承部及聚光透鏡中的至少一方朝初期位置移動後,在當從雷射光射入面觀看時,聚光位置位於從對象物之周緣到第1改質區域為止的周緣部分的期間,藉由驅動部將支承部及聚光透鏡中的至少一方保持在該初期位置。即使以如此的方式,在周緣部分,將支承部及聚光透鏡中的至少一方保持在該初期位置的情況,亦可抑制追隨動作對雷射光射入面的位移之精度降低。In the laser processing apparatus of one aspect of the present invention, the control unit may move at least one of the support unit and the focusing lens to the initial position in the second process, and the driving unit may keep at least one of the support unit and the focusing lens at the initial position while the focusing position is located in the peripheral portion from the periphery of the object to the first modified region when viewed from the laser light incident surface. Even in this manner, when at least one of the support unit and the focusing lens is kept at the initial position in the peripheral portion, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking operation can be suppressed.

在本發明的一態樣之雷射加工裝置,亦可為測定資料取得部係具有感測器,該感測器係對對象物照射測定光,檢測關於在雷射光射入面所反射的測定光之反射光的資訊。在此情況,可利用測定光,使支承部及聚光透鏡中的至少一方追隨雷射光射入面的位移。In one aspect of the laser processing device of the present invention, the measurement data acquisition unit may include a sensor that irradiates the object with measurement light and detects information about reflected light of the measurement light reflected by the laser light incident surface. In this case, the measurement light may be used to cause at least one of the support unit and the focusing lens to track the displacement of the laser light incident surface.

本發明的一態樣之雷射加工方法,係藉由對對象物照射雷射光,在對象物的內部形成改質區域,其特徵為具有:第1製程,其係在較對象物的周緣更內側,以使雷射光的聚光位置沿著周緣移動的方式使支承對象物的支承部及經由聚光透鏡對對象物照射雷射光之照射部中的至少一方移動,沿著周緣而在對象物的內部形成第1改質區域;及第2製程,其係在進行第1製程後,以聚光位置從對象物的外部進入內部的方式使支承部及照射部中的至少一方移動,在對象物的內部形成第2改質區域,在第1製程,將關於對象物之雷射光射入的雷射光射入面的位移、及支承部之支承對象物的支承面的位移之測定資料與關於對象物的位置之位置資訊相關連並加以取得,在第2製程,當聚光位置從對象物的外部進入內部前或進入時,使沿著藉由驅動部之支承部及聚光透鏡中的至少一方的沿著聚光透鏡的光軸方向之位置,朝依據在第1製程取得的測定資料之初期位置移動。A laser processing method according to one aspect of the present invention forms a modified region inside an object by irradiating a laser beam to the object, and is characterized by having: a first process, in which at least one of a support portion supporting the object and an irradiation portion irradiating the object with laser beam through a condensing lens is moved inwardly from the periphery of the object so that the focusing position of the laser beam moves along the periphery, thereby forming a first modified region inside the object along the periphery; and a second process, in which after the first process is performed, the support portion and the irradiation portion are moved in such a way that the focusing position moves from the outside of the object to the inside. At least one of the parts is moved to form a second modified area inside the object. In the first process, the displacement of the laser light incident surface of the object and the displacement of the supporting surface of the supporting part supporting the object are correlated with the position information about the position of the object and obtained. In the second process, before or when the focusing position enters the inside of the object from the outside, the position along the optical axis direction of at least one of the supporting part of the driving part and the focusing lens is moved toward the initial position according to the measurement data obtained in the first process.

在此雷射加工方法,在實施第2製程時,當聚光位置從對象物的外部進入內部前或進入時,藉由驅動部,使支承部及聚光透鏡中的至少一方朝依據在第1製程取得的測定資料之初期位置移動。藉此,在例如剛進入後的時間點,比起未考量這樣的初期位置的情況,能夠抑制前述的過衝。其結果,能夠抑制追隨動作對雷射光射入面的位移之精度降低。 [發明效果] In this laser processing method, when the second process is implemented, before or when the focusing position enters the interior of the object from the outside, the driving unit moves at least one of the support unit and the focusing lens toward the initial position based on the measurement data obtained in the first process. In this way, at a time point such as just after entering, the aforementioned overshoot can be suppressed compared to a case where such an initial position is not considered. As a result, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be suppressed. [Effect of the invention]

若依據本發明的一態樣,能夠提供可抑制追隨動作對雷射光射入面的位移之精度降低的雷射加工裝置及雷射加工方法。According to one aspect of the present invention, it is possible to provide a laser processing device and a laser processing method that can suppress a decrease in the accuracy of displacement of a laser light incident surface due to a tracking operation.

以下,參照圖面等,詳細地說明關於實施形態。再者,在各圖中,會有對相同或相當的部分賦予相同的符號,並省略重複之說明之情況。Hereinafter, the embodiments will be described in detail with reference to the drawings, etc. In the drawings, the same or corresponding parts are denoted by the same reference numerals, and repeated descriptions will be omitted.

首先,說明關於雷射加工裝置的基本結構、作用、效果及變形例。First, the basic structure, function, effect and modification examples of the laser processing device are explained.

[雷射加工裝置之結構] 如圖1所示,雷射加工裝置1,係具備有複數個移動機構5、6;支承部7;1對雷射加工頭10A、10B;光源單元8;及控制部9。以下的說明,將第1方向稱為X方向、與第1方向垂直的第2方向稱為Y方向、與第1方向及第2方向垂直的第3方向稱為Z方向。在本實施形態,X方向及Y方向為水平方向,Z方向為垂直方向。 [Structure of laser processing device] As shown in FIG. 1 , the laser processing device 1 has a plurality of moving mechanisms 5, 6; a support portion 7; a pair of laser processing heads 10A, 10B; a light source unit 8; and a control portion 9. In the following description, the first direction is referred to as the X direction, the second direction perpendicular to the first direction is referred to as the Y direction, and the third direction perpendicular to the first direction and the second direction is referred to as the Z direction. In this embodiment, the X direction and the Y direction are horizontal directions, and the Z direction is a vertical direction.

移動機構5係具有固定部51、移動部53及安裝部55。固定部51係安裝於裝置框架1a。移動部53係安裝於設在固定部51的軌道,可沿著Y方向移動。安裝部55係安裝於設在移動部53的軌道,可沿著X方向移動。The moving mechanism 5 includes a fixed portion 51, a moving portion 53, and a mounting portion 55. The fixed portion 51 is mounted on the device frame 1a. The moving portion 53 is mounted on a track provided on the fixed portion 51 and is movable in the Y direction. The mounting portion 55 is mounted on a track provided on the moving portion 53 and is movable in the X direction.

移動機構6係具有固定部61、1對移動部63、64及1對安裝部65、66。固定部61係安裝於裝置框架1a。1對移動部63、64分別安裝於設在固定部61的軌道,各自獨立而可沿著Y方向移動。安裝部65係安裝於設在移動部63的軌道,可沿著Z方向移動。安裝部66係安裝於設在移動部64的軌道,可沿著Z方向移動。亦即,對於裝置框架1a,1對安裝部65、66分別可沿著Y方向及Z方向移動。移動部63、64分別構成第1及第2水平移動機構(水平移動機構)。安裝部65、66分別構成第1及第2垂直移動機構(垂直移動機構)。The moving mechanism 6 has a fixed portion 61, a pair of moving portions 63, 64, and a pair of mounting portions 65, 66. The fixed portion 61 is mounted on the device frame 1a. The pair of moving portions 63, 64 are respectively mounted on rails provided on the fixed portion 61, and are each independently movable along the Y direction. The mounting portion 65 is mounted on the rail provided on the moving portion 63, and is movable along the Z direction. The mounting portion 66 is mounted on the rail provided on the moving portion 64, and is movable along the Z direction. That is, with respect to the device frame 1a, a pair of mounting portions 65, 66 are respectively movable along the Y direction and the Z direction. The moving portions 63, 64 constitute the first and second horizontal moving mechanisms (horizontal moving mechanisms), respectively. The mounting portions 65 and 66 constitute the first and second vertical movement mechanisms (vertical movement mechanisms), respectively.

支承部7係安裝於設在移動機構5的安裝部55之旋轉軸,能以與Z方向平行的軸線作為中心線而進行旋轉。亦即,支承部7係可分別沿著X方向及Y方向移動,能以與Z方向平行的軸線作為中心線而進行旋轉。支承部7係用來支承對象物100。對象物100,例如為晶圓。The support part 7 is mounted on the rotation axis of the mounting part 55 provided on the moving mechanism 5, and can rotate with the axis parallel to the Z direction as the center line. That is, the support part 7 can move along the X direction and the Y direction respectively, and can rotate with the axis parallel to the Z direction as the center line. The support part 7 is used to support the object 100. The object 100 is, for example, a wafer.

如圖1及圖2所示,雷射加工頭10A係安裝於移動機構6的安裝部65。雷射加工頭10A係在Z方向上與支承部7相對向的狀態下,對支承於支承部7之對象物100照射雷射光L1(亦稱為「第1雷射光L1」)。雷射加工頭10B係安裝於移動機構6的安裝部66。雷射加工頭10B係在Z方向上與支承部7相對向的狀態下,對支承於支承部7之對象物100照射雷射光L2(亦稱為「第2雷射光L2」)。雷射加工頭10A、10B構成照射部。As shown in FIG. 1 and FIG. 2 , the laser processing head 10A is mounted on the mounting portion 65 of the moving mechanism 6. The laser processing head 10A irradiates the object 100 supported by the support portion 7 with laser light L1 (also referred to as "first laser light L1") while being opposed to the support portion 7 in the Z direction. The laser processing head 10B is mounted on the mounting portion 66 of the moving mechanism 6. The laser processing head 10B irradiates the object 100 supported by the support portion 7 with laser light L2 (also referred to as "second laser light L2") while being opposed to the support portion 7 in the Z direction. The laser processing heads 10A and 10B constitute an irradiation portion.

光源單元8具有1對光源81、82。光源81係輸出雷射光L1。雷射光L1係自光源81的射出部81a射出,藉由光纖2導引至雷射加工頭10A。光源82係輸出雷射光L2。雷射光L2係自光源82的射出部82a射出,藉由其他光纖2導引至雷射加工頭10B。The light source unit 8 has a pair of light sources 81 and 82. The light source 81 outputs laser light L1. The laser light L1 is emitted from the emission portion 81a of the light source 81 and guided to the laser processing head 10A through the optical fiber 2. The light source 82 outputs laser light L2. The laser light L2 is emitted from the emission portion 82a of the light source 82 and guided to the laser processing head 10B through the other optical fiber 2.

控制部9係用來控制雷射加工裝置1的各部(支承部7、複數個移動機構5、6、1對雷射加工頭10A、10B、及光源單元8等)等。控制部9係作為包含處理器、記憶體、儲存器及通訊裝置等之電腦裝置構成。在控制部9,加載於記憶體等的軟體(程式)是藉由處理器執行,記憶體及儲存器之資料的讀取及寫入以及藉由通訊裝置之通訊是藉由處理器控制。藉此,控制部9能夠達到各種功能。The control unit 9 is used to control the various parts of the laser processing device 1 (supporting unit 7, multiple moving mechanisms 5, 6, a pair of laser processing heads 10A, 10B, and light source unit 8, etc.). The control unit 9 is composed of a computer device including a processor, a memory, a storage, and a communication device. In the control unit 9, the software (program) loaded on the memory, etc. is executed by the processor, and the reading and writing of data in the memory and storage and the communication through the communication device are controlled by the processor. In this way, the control unit 9 can achieve various functions.

說明關於藉由如以上所構成的雷射加工裝置1進行加工的一例。該加工的一例,係為了將作為晶圓的對象物100裁切成複數個晶片,沿著設定成格子狀的複數個線,在對象物100的內部形成改質區域之例子。An example of processing performed by the laser processing apparatus 1 configured as above will be described. The example of processing is an example of forming a modified region inside the object 100 along a plurality of lines arranged in a grid shape in order to cut the object 100 as a wafer into a plurality of chips.

首先,移動機構5使支承部7分別沿著X方向及Y方向移動,讓支承對象物100之支承部7在Z方向上與1對雷射加工頭10A、10B相對向。接著,移動機構5以與Z方向平行的軸線作為中心線而使支承部7旋轉,讓在對象物100上朝一方向延伸的複數個線沿著X方向。First, the moving mechanism 5 moves the support 7 in the X direction and the Y direction respectively, so that the support 7 supporting the object 100 faces the pair of laser processing heads 10A and 10B in the Z direction. Then, the moving mechanism 5 rotates the support 7 with an axis parallel to the Z direction as the center line, so that a plurality of lines extending in one direction on the object 100 are along the X direction.

然後,移動機構6使雷射加工頭10A沿著Y方向移動,使雷射光L1的聚光點(聚光區域的一部分)位在朝一方向延伸的一條線上。另外,為了讓雷射光L2的聚光點位於朝一方向延伸的其他線上,移動機構6使雷射加工頭10B沿著Y方向移動。然後,移動機構6使雷射加工頭10A沿著Z方向移動,使雷射光L1的聚光點位於對象物100的內部。另外,移動機構6使雷射加工頭10B沿著Z方向移動,使雷射光L2的聚光點位於對象物100的內部。Then, the moving mechanism 6 moves the laser processing head 10A along the Y direction so that the focal point (a part of the focal area) of the laser light L1 is located on a line extending in one direction. In addition, in order to make the focal point of the laser light L2 located on another line extending in one direction, the moving mechanism 6 moves the laser processing head 10B along the Y direction. Then, the moving mechanism 6 moves the laser processing head 10A along the Z direction so that the focal point of the laser light L1 is located inside the object 100. In addition, the moving mechanism 6 moves the laser processing head 10B along the Z direction so that the focal point of the laser light L2 is located inside the object 100.

接著,光源81輸出雷射光L1而雷射加工頭10A對對象物100照射雷射光L1,並且光源82輸出雷射光L2而雷射加工頭10B對對象物100照射雷射光L2。與此同時,移動機構5使支承部7沿著X方向移動,使雷射光L1的聚光點沿著朝一方向延伸的線相對地移動,並且使雷射光L2的聚光點沿著朝一方向延伸的其他線相對地移動。如此,雷射加工裝置1係在對象物100內,分別沿著朝一方向延伸的複數個線,在對象物100的內部形成改質區域。Then, the light source 81 outputs the laser light L1 and the laser processing head 10A irradiates the laser light L1 to the object 100, and the light source 82 outputs the laser light L2 and the laser processing head 10B irradiates the laser light L2 to the object 100. At the same time, the moving mechanism 5 moves the support 7 along the X direction, so that the focal point of the laser light L1 moves relatively along the line extending in one direction, and the focal point of the laser light L2 moves relatively along other lines extending in one direction. In this way, the laser processing device 1 forms a modified area inside the object 100 along a plurality of lines extending in one direction in the object 100.

接著,移動機構5以與Z方向平行的軸線作為中心線而使支承部7旋轉,讓在對象物100上朝與一方向正交的另一方向延伸的複數個線沿著X方向。Next, the moving mechanism 5 rotates the support portion 7 with the axis parallel to the Z direction as the center line so that a plurality of lines extending in another direction perpendicular to the one direction on the object 100 are along the X direction.

然後,移動機構6使雷射加工頭10A沿著Y方向移動,使雷射光L1的聚光點位在朝另一方向延伸的一條線上。另外,為了讓雷射光L2的聚光點位於朝另一方向延伸的其他線上,移動機構6使雷射加工頭10B沿著Y方向移動。然後,移動機構6使雷射加工頭10A沿著Z方向移動,使雷射光L1的聚光點位於對象物100的內部。另外,移動機構6使雷射加工頭10B沿著Z方向移動,使雷射光L2的聚光點位於對象物100的內部。Then, the moving mechanism 6 moves the laser processing head 10A along the Y direction so that the focal point of the laser light L1 is located on a line extending in another direction. In addition, in order to make the focal point of the laser light L2 located on another line extending in another direction, the moving mechanism 6 moves the laser processing head 10B along the Y direction. Then, the moving mechanism 6 moves the laser processing head 10A along the Z direction so that the focal point of the laser light L1 is located inside the object 100. In addition, the moving mechanism 6 moves the laser processing head 10B along the Z direction so that the focal point of the laser light L2 is located inside the object 100.

接著,光源81輸出雷射光L1而雷射加工頭10A對對象物100照射雷射光L1,並且光源82輸出雷射光L2而雷射加工頭10B對對象物100照射雷射光L2。與此同時,移動機構5使支承部7沿著X方向移動,使雷射光L1的聚光點沿著朝另一方向延伸的線相對地移動,並且使雷射光L2的聚光點沿著朝另一方向延伸的其他線相對地移動。如此,雷射加工裝置1係在對象物100內,分別沿著朝與一方向正交的另一方向延伸的複數個線,在對象物100的內部形成改質區域。Then, the light source 81 outputs the laser light L1 and the laser processing head 10A irradiates the laser light L1 to the object 100, and the light source 82 outputs the laser light L2 and the laser processing head 10B irradiates the laser light L2 to the object 100. At the same time, the moving mechanism 5 moves the support 7 along the X direction, moves the focal point of the laser light L1 relatively along the line extending in the other direction, and moves the focal point of the laser light L2 relatively along other lines extending in the other direction. In this way, the laser processing device 1 forms a modified area inside the object 100 along a plurality of lines extending in another direction orthogonal to the one direction in the object 100.

再者,在前述加工的一例,光源81係藉由例如脈衝振盪方式,對對象物100,輸出具有透過性之雷射光L1,光源82係藉由例如脈衝振盪方式,對對象物100,輸出具有透過性之雷射光L2。若這樣的雷射光聚光於對象物100的內部的話,則在與雷射光的聚光點對應之部分,特別是雷射光被吸收,在對象物100的內部形成改質區域。改質區域係密度、折射率、機械性強度、其他的物理特性等形成為與周圍的非改質區域不同之區域。作為改質區域,具有例如熔融處理區域、龜裂區域、絕緣破壞區域、折射率變化區域等。Furthermore, in an example of the aforementioned processing, the light source 81 outputs a laser light L1 having transparency to the object 100 by, for example, a pulse oscillation method, and the light source 82 outputs a laser light L2 having transparency to the object 100 by, for example, a pulse oscillation method. If such laser light is focused inside the object 100, then the laser light is absorbed in the portion corresponding to the focal point of the laser light, and a modified region is formed inside the object 100. The modified region is a region whose density, refractive index, mechanical strength, other physical properties, etc. are different from the surrounding non-modified regions. The modified region includes, for example, a melt-processed region, a cracked region, an insulation-damaged region, a refractive index-changed region, and the like.

藉由脈衝振盪方式所輸出的雷射光照射至對象物100,沿著設定於對象物100的線,使雷射光的聚光點相對地移動的話,則複數個改質點形成為沿著線排列成1列。1個改質點係藉由1脈衝的雷射光的照射所形成。1列的改質區域係為排列成1列之複數個改質點的集合。相鄰的改質點係藉由雷射光的聚光點對對象物100之相對的移動速度及雷射光的反覆頻率,即使在相連的情況或分離的情況皆存在。所設定的線之形狀,不限於格子狀,亦可為環狀、直線狀、曲線狀及該等形狀的至少某些形狀組合之形狀。 [雷射加工頭之結構] When the laser light output by pulse oscillation is irradiated to the object 100 and the focal point of the laser light is relatively moved along the line set on the object 100, a plurality of modified points are formed and arranged in a row along the line. One modified point is formed by irradiation of one pulse of laser light. One row of modified areas is a collection of a plurality of modified points arranged in one row. Adjacent modified points exist even in a connected or separated situation by the relative moving speed of the focal point of the laser light to the object 100 and the repetition frequency of the laser light. The shape of the set line is not limited to a grid shape, and can also be a ring shape, a straight line shape, a curve shape, and a combination of at least some of these shapes. [Structure of laser processing head]

如圖3及圖4所示,雷射加工頭10A具備框體11、射入部12、調整部13及聚光部14。As shown in FIG. 3 and FIG. 4 , the laser processing head 10A includes a housing 11 , an incident portion 12 , an adjustment portion 13 , and a focusing portion 14 .

框體11具有第1壁部21及第2壁部22、第3壁部23及第4壁部24、以及第5壁部25及第6壁部26。第1壁部21及第2壁部22係在X方向上互相對向。第3壁部23及第4壁部24係在Y方向上互相對向。第5壁部25及第6壁部26係在Z方向上互相對向。The frame 11 has a first wall 21 and a second wall 22, a third wall 23 and a fourth wall 24, and a fifth wall 25 and a sixth wall 26. The first wall 21 and the second wall 22 are opposed to each other in the X direction. The third wall 23 and the fourth wall 24 are opposed to each other in the Y direction. The fifth wall 25 and the sixth wall 26 are opposed to each other in the Z direction.

第3壁部23與第4壁部24之距離係較第1壁部21與第2壁部22之距離小。第1壁部21與第2壁部22之距離係較第5壁部25與第6壁部26之距離小。再者,第1壁部21與第2壁部22之距離,可與第5壁部25與第6壁部26之距離相等,或者,亦可較第5壁部25與第6壁部26之距離大。The distance between the third wall portion 23 and the fourth wall portion 24 is smaller than the distance between the first wall portion 21 and the second wall portion 22. The distance between the first wall portion 21 and the second wall portion 22 is smaller than the distance between the fifth wall portion 25 and the sixth wall portion 26. Furthermore, the distance between the first wall portion 21 and the second wall portion 22 may be equal to the distance between the fifth wall portion 25 and the sixth wall portion 26, or may be larger than the distance between the fifth wall portion 25 and the sixth wall portion 26.

在雷射加工頭10A,第1壁部21係位於移動機構6的固定部61相反側,第2壁部22係位於固定部61側。第3壁部23係位於移動機構6的安裝部65側,第4壁部24係位於安裝部65相反側亦即雷射加工頭10B側(參照圖2)。第5壁部25係位於支承部7相反側,第6壁部26係位於支承部7側。In the laser processing head 10A, the first wall portion 21 is located on the opposite side of the fixed portion 61 of the moving mechanism 6, and the second wall portion 22 is located on the fixed portion 61 side. The third wall portion 23 is located on the mounting portion 65 side of the moving mechanism 6, and the fourth wall portion 24 is located on the opposite side of the mounting portion 65, that is, on the laser processing head 10B side (see FIG. 2). The fifth wall portion 25 is located on the opposite side of the support portion 7, and the sixth wall portion 26 is located on the support portion 7 side.

框體11係在第3壁部23配置於移動機構6的安裝部65側之狀態下,框體11安裝於安裝部65。具體而言,如以下所述。安裝部65具有座板65a和安裝板65b。座板65a係安裝於設在移動部63的軌道(參照圖2)。安裝板65b係立設於座板65a之雷射加工頭10B側的端部(參照圖2)。框體11係在第3壁部23接觸於安裝板65b之狀態下,經由台座27,將螺栓28螺合於安裝板65b,藉此安裝於安裝部65。台座27係分別設在第1壁部21及第2壁部22。框體11係對安裝部65可進行裝卸。The frame 11 is mounted on the mounting portion 65 when the third wall portion 23 is arranged on the mounting portion 65 side of the moving mechanism 6. Specifically, it is as follows. The mounting portion 65 has a seat plate 65a and a mounting plate 65b. The seat plate 65a is mounted on a rail provided on the moving portion 63 (refer to FIG. 2). The mounting plate 65b is erected on the end of the seat plate 65a on the laser processing head 10B side (refer to FIG. 2). The frame 11 is mounted on the mounting portion 65 by screwing the bolt 28 into the mounting plate 65b via the pedestal 27 when the third wall portion 23 contacts the mounting plate 65b. The pedestal 27 is provided on the first wall portion 21 and the second wall portion 22, respectively. The frame 11 can be loaded and unloaded with respect to the mounting portion 65.

射入部12係安裝於第5壁部25上。射入部12係對框體11內射入雷射光L1。射入部12係在X方向上,靠近第2壁部22側(一方的壁部側),在Y方向上靠近第4壁部24側也就是X方向之射入部12與第2壁部22之距離,係較X方向上之射入部12與第1壁部21之距離小,Y方向上之射入部12與第4壁部24之距離,係較X方向上之射入部12與第3壁部23之距離小。The incident portion 12 is mounted on the fifth wall portion 25. The incident portion 12 injects the laser light L1 into the frame 11. The incident portion 12 is close to the second wall portion 22 side (one wall side) in the X direction and close to the fourth wall portion 24 side in the Y direction. That is, the distance between the incident portion 12 and the second wall portion 22 in the X direction is smaller than the distance between the incident portion 12 and the first wall portion 21 in the X direction, and the distance between the incident portion 12 and the fourth wall portion 24 in the Y direction is smaller than the distance between the incident portion 12 and the third wall portion 23 in the X direction.

射入部12構成為可與光纖2的連接端部2a連接。在光纖2的連接端部2a,設有將自光纖的射出端所射出的雷射光L1進行準直之準直透鏡,未設置抑制返回光之隔離器。該隔離器係設在較連接端部2a更靠近光源81側之光纖的附近。藉此,可謀求連接端部2a的小型化,進而可謀求射入部12之小型化。再者,亦可將隔離器設在光纖2的連接端部2a。The incident portion 12 is configured to be connectable to the connection end 2a of the optical fiber 2. The connection end 2a of the optical fiber 2 is provided with a collimating lens for collimating the laser light L1 emitted from the emission end of the optical fiber, and no isolator for suppressing the return light is provided. The isolator is provided near the optical fiber closer to the light source 81 side than the connection end 2a. In this way, the miniaturization of the connection end 2a can be sought, and the miniaturization of the incident portion 12 can be sought. Furthermore, the isolator can also be provided at the connection end 2a of the optical fiber 2.

調整部13配置在框體11內。調整部13係用來調整自射入部12射入的雷射光L1。調整部13所具有的各結構,安裝於設在框體11內的光學基座29。光學基座29係以將框體11內的區域區隔成第3壁部23側的區域與第4壁部24側的區域的方式,安裝於框體11。光學基座29係與框體11形成為一體。調整部13所具有的各結構係在第4壁部24側,安裝於光學基座29。關於調整部13所具有的各結構的詳細說明容後再述。The adjustment section 13 is disposed in the frame 11. The adjustment section 13 is used to adjust the laser light L1 incident from the incident section 12. The various structures of the adjustment section 13 are mounted on the optical base 29 provided in the frame 11. The optical base 29 is mounted on the frame 11 in such a manner that the area in the frame 11 is divided into an area on the side of the third wall 23 and an area on the side of the fourth wall 24. The optical base 29 is formed integrally with the frame 11. The various structures of the adjustment section 13 are mounted on the optical base 29 on the side of the fourth wall 24. The detailed description of the various structures of the adjustment section 13 will be described later.

聚光部14係安裝於第6壁部26上。具體而言,聚光部14係在插通於形成在第6壁部26的孔26a之狀態下(參照圖5),配置於第6壁部26。聚光部14係一邊將藉由調整部13所調整的雷射光L1聚光一邊朝框體11外射出。聚光部14係在X方向上,靠近第2壁部22側(一方的壁部側),在Y方向上靠近第4壁部24側。也就是X方向上之聚光部14與第2壁部22之距離,係較X方向上之聚光部14與第1壁部21之距離小,Y方向上之聚光部14與第4壁部24之距離,係較X方向上之聚光部14與第3壁部23之距離小。The light-collecting portion 14 is mounted on the sixth wall portion 26. Specifically, the light-collecting portion 14 is arranged on the sixth wall portion 26 in a state of being inserted through a hole 26a formed in the sixth wall portion 26 (see FIG. 5). The light-collecting portion 14 collects the laser light L1 adjusted by the adjusting portion 13 and emits it out of the frame 11. The light-collecting portion 14 is close to the second wall portion 22 side (one wall side) in the X direction and close to the fourth wall portion 24 side in the Y direction. That is, the distance between the light-collecting portion 14 and the second wall portion 22 in the X direction is smaller than the distance between the light-collecting portion 14 and the first wall portion 21 in the X direction, and the distance between the light-collecting portion 14 and the fourth wall portion 24 in the Y direction is smaller than the distance between the light-collecting portion 14 and the third wall portion 23 in the X direction.

如圖5所示,調整部13具有衰減器31、擴束器32、和鏡子33。射入部12、以及調整部13的衰減器31、擴束器32及鏡子33係配置於沿著Z方向延伸的直線(第1直線)A1上。衰減器31及擴束器32係在直線A1上,配置於射入部12與鏡子33之間。衰減器31係用來調整自射入部12射入的雷射光L1之輸出。擴束器32係將以衰減器31調整了輸出之雷射光L1的直徑擴大。鏡子33係用來將以擴束器32擴大了直徑雷射光L1進行反射。As shown in FIG5 , the adjustment section 13 has an attenuator 31, a beam expander 32, and a mirror 33. The incident section 12, and the attenuator 31, the beam expander 32, and the mirror 33 of the adjustment section 13 are arranged on a straight line (first straight line) A1 extending along the Z direction. The attenuator 31 and the beam expander 32 are arranged on the straight line A1 between the incident section 12 and the mirror 33. The attenuator 31 is used to adjust the output of the laser light L1 incident from the incident section 12. The beam expander 32 expands the diameter of the laser light L1 whose output is adjusted by the attenuator 31. The mirror 33 is used to reflect the laser light L1 whose diameter is expanded by the beam expander 32.

調整部13還具有反射型空間光調變器34、和成像光學系統35。調整部13的反射型空間光調變器34及成像光學系統35、以及聚光部14係配置於沿著Z方向延伸的直線(第2直線)A2上。反射型空間光調變器34係將以鏡子33進行了反射的雷射光L1調變。反射型空間光調變器34係例如反射型液晶(LCOS:Liquid Crystal on Silicon)的空間光調變器(SLM:Spatial Light Modulator)。成像光學系統35係構成反射型空間光調變器34的反射面34a與聚光部14的入瞳面14a處於成像關係之雙邊遠心光學系統。成像光學系統35係藉由3個以上的透鏡所構成。The adjustment section 13 also has a reflective spatial light modulator 34 and an imaging optical system 35. The reflective spatial light modulator 34 and the imaging optical system 35 of the adjustment section 13, and the focusing section 14 are arranged on a straight line (second straight line) A2 extending along the Z direction. The reflective spatial light modulator 34 modulates the laser light L1 reflected by the mirror 33. The reflective spatial light modulator 34 is, for example, a spatial light modulator (SLM: Spatial Light Modulator) of a reflective liquid crystal (LCOS: Liquid Crystal on Silicon). The imaging optical system 35 is a bilateral telecentric optical system in which the reflecting surface 34a of the reflective spatial light modulator 34 and the entrance pupil surface 14a of the focusing section 14 are in an imaging relationship. The imaging optical system 35 is composed of three or more lenses.

直線A1及直線A2係位於與Y方向垂直的平面上。直線A1係對直線A2,位於第2壁部22側(一方的壁部側)。在雷射加工頭10A,雷射光L1係從射入部12射入到框體11內後在直線A1上行進,以鏡子33及反射型空間光調變器34依次反射後,在直線A2上行進而從聚光部14射出至框體11外。再者,衰減器31及擴束器32的排列順序亦可相反。又,衰減器31亦可配置於鏡子33與反射型空間光調變器34之間。又,調整部13亦可具有其他的光學零件(例如配置於擴束器32前的轉向鏡等)。Straight line A1 and straight line A2 are located on a plane perpendicular to the Y direction. Straight line A1 is opposite to straight line A2 and is located on the second wall portion 22 side (the side of one wall portion). In the laser processing head 10A, the laser light L1 is incident from the incident portion 12 into the frame 11 and then travels on the straight line A1. After being reflected by the mirror 33 and the reflective spatial light modulator 34 in sequence, it travels on the straight line A2 and is emitted from the focusing portion 14 to the outside of the frame 11. Furthermore, the arrangement order of the attenuator 31 and the beam expander 32 may also be reversed. Furthermore, the attenuator 31 may also be arranged between the mirror 33 and the reflective spatial light modulator 34. Furthermore, the adjustment portion 13 may also have other optical components (for example, a turning mirror arranged in front of the beam expander 32).

雷射加工頭10A還具備分光鏡15、測定部16、觀察部17、驅動部18及電路部19。The laser processing head 10A further includes a spectroscope 15 , a measuring unit 16 , an observation unit 17 , a driving unit 18 , and a circuit unit 19 .

分光鏡15係在直線A2上,配置於成像光學系統35與聚光部14之間。亦即,分光鏡15係在框體11內,配置於調整部13與聚光部14之間。分光鏡15係在第4壁部24側,安裝於光學基座29。分光鏡15係使雷射光L1透過。分光鏡15係在抑制散光的觀點,可為例如立方體形,亦可為配置成具有扭曲的關係之2片板型。The spectroscope 15 is disposed on the straight line A2 between the imaging optical system 35 and the focusing section 14. That is, the spectroscope 15 is disposed between the adjustment section 13 and the focusing section 14 in the frame 11. The spectroscope 15 is mounted on the optical base 29 on the side of the fourth wall section 24. The spectroscope 15 allows the laser light L1 to pass through. From the viewpoint of suppressing astigmatism, the spectroscope 15 may be, for example, a cubic shape or may be a two-plate type disposed in a twisted relationship.

測定部16係在框體11內,對調整部13配置於第1壁部21側(一方的壁部側相反側)。測定部16係在第4壁部24側,安裝於光學基座29。測定部16係輸出用來測定對象物100的表面(例如雷射光L1射入之側的表面)與聚光部14之距離的測定光L10,經由聚光部14,檢測被對象物100的表面所反射之測定光L10。也就是從測定部16所輸出的測定光L10是經由聚光部14照射至對象物100的表面,被對象物100的表面所反射之測定光L10是經由聚光部14,以測定部16進行檢測。The measuring unit 16 is arranged on the first wall 21 side (the side opposite to the wall side) with respect to the adjusting unit 13 in the frame 11. The measuring unit 16 is mounted on the optical base 29 on the fourth wall 24 side. The measuring unit 16 outputs a measuring light L10 for measuring the distance between the surface of the object 100 (for example, the surface on the side where the laser light L1 is incident) and the focusing unit 14, and detects the measuring light L10 reflected by the surface of the object 100 through the focusing unit 14. That is, the measuring light L10 output from the measuring unit 16 is irradiated to the surface of the object 100 through the focusing unit 14, and the measuring light L10 reflected by the surface of the object 100 is detected by the measuring unit 16 through the focusing unit 14.

更具體而言,從測定部16輸出的測定光L10係被在第4壁部24側安裝於光學基座29之光束分離器20及分光鏡15依次反射,再從聚光部14射出至框體11外。被對象物100的表面反射之測定光L10,係從聚光部14射入到框體11內,再以分光鏡15及光束分離器20依次反射,然後射入到測定部16而再以測定部16進行檢測。More specifically, the measurement light L10 output from the measurement section 16 is reflected in sequence by the beam splitter 20 and the spectroscope 15 mounted on the optical base 29 on the side of the fourth wall 24, and then emitted from the focusing section 14 to the outside of the frame 11. The measurement light L10 reflected by the surface of the object 100 is incident from the focusing section 14 into the frame 11, and then reflected in sequence by the spectroscope 15 and the beam splitter 20, and then incident on the measurement section 16 and detected by the measurement section 16.

觀察部17係在框體11內,對調整部13配置於第1壁部21側(一方的壁部側相反側)。觀察部17係在第4壁部24側,安裝於光學基座29。觀察部17係輸出用來觀察對象物100的表面(例如雷射光L1射入之側的表面)之觀察光L20,經由聚光部14,檢測被對象物100的表面所反射之觀察光L20。也就是從觀察部17所輸出的觀察光L20,係經由聚光部14而照射至對象物100的表面,被對象物100的表面反射之觀察光L20係經由聚光部14,以觀察部17進行檢測。The observation section 17 is disposed on the first wall 21 side (the side opposite to the wall side) with respect to the adjustment section 13 in the frame 11. The observation section 17 is mounted on the optical base 29 on the fourth wall 24 side. The observation section 17 outputs the observation light L20 for observing the surface of the object 100 (for example, the surface on the side where the laser light L1 is incident), and detects the observation light L20 reflected by the surface of the object 100 through the focusing section 14. That is, the observation light L20 output from the observation section 17 is irradiated to the surface of the object 100 through the focusing section 14, and the observation light L20 reflected by the surface of the object 100 is detected by the observation section 17 through the focusing section 14.

更具體而言,從觀察部17輸出的觀察光L20係透過光束分離器20而被分光鏡15反射,再從聚光部14射出至框體11外。被對象物100的表面反射之觀察光L20,係從聚光部14射入到框體11內,再以分光鏡15反射,然後透過光束分離器20射入觀察部17而再以觀察部17進行檢測。再者,雷射光L1、測定光L10及觀察光L20各自的波長係互相不同(至少各自的中心波長互相偏移)。More specifically, the observation light L20 output from the observation section 17 passes through the beam splitter 20, is reflected by the spectroscope 15, and is then emitted from the focusing section 14 to the outside of the frame 11. The observation light L20 reflected by the surface of the object 100 enters the frame 11 from the focusing section 14, is reflected by the spectroscope 15, and then passes through the beam splitter 20 to enter the observation section 17 and is detected by the observation section 17. Furthermore, the wavelengths of the laser light L1, the measurement light L10, and the observation light L20 are different from each other (at least the central wavelengths of each are offset from each other).

驅動部18係在第4壁部24側,安裝於光學基座29。驅動部18係藉由例如壓電元件之驅動力,使配置於第6壁部26之聚光部14沿著Z方向移動。The driving unit 18 is mounted on the optical base 29 on the side of the fourth wall 24. The driving unit 18 moves the light collecting unit 14 disposed on the sixth wall 26 along the Z direction by the driving force of a piezoelectric element, for example.

電路部19係在框體11內,對光學基座29配置於第3壁部23側。也就是電路部19係在框體11內,對調整部13、測定部16及觀察部17配置於第3壁部23側。電路部19為例如複數個電路基板。電路部19係處理自測定部16輸出的訊號及輸入至反射型空間光調變器34之訊號。電路部19係依據自測定部16輸出的訊號,控制驅動部18。作為一例,電路部19係依據自測定部16輸出的訊號,控制驅動部18,使對象物100的表面與聚光部14之距離維持成一定(亦即,對象物100的表面與雷射光L1的聚光點之距離維持成一定)。再者,在框體11,設有連接有用來將電路部19電性連接於控制部9(參照圖1)等之配線的連接器(未圖示)。The circuit section 19 is disposed in the frame 11 on the side of the third wall section 23 with respect to the optical base 29. That is, the circuit section 19 is disposed in the frame 11 on the side of the third wall section 23 with respect to the adjustment section 13, the measuring section 16, and the observation section 17. The circuit section 19 is, for example, a plurality of circuit substrates. The circuit section 19 processes the signal output from the measuring section 16 and the signal input to the reflective spatial light modulator 34. The circuit section 19 controls the driving section 18 according to the signal output from the measuring section 16. For example, the circuit section 19 controls the driving section 18 based on the signal output from the measuring section 16 so that the distance between the surface of the object 100 and the focusing section 14 is maintained constant (that is, the distance between the surface of the object 100 and the focusing point of the laser light L1 is maintained constant). Furthermore, the frame 11 is provided with a connector (not shown) for connecting wiring for electrically connecting the circuit section 19 to the control section 9 (see FIG. 1 ) and the like.

雷射加工頭10B係與雷射加工頭10A同樣地,具備框體11、射入部12、調整部13、聚光部14、分光鏡15、測定部16、觀察部17、驅動部18及電路部19。但,雷射加工頭10B的各結構係如圖2所示,對通過1對安裝部65、66間的中心點且與Y方向垂直之虛擬平面,配置成具有與雷射加工頭10A之各結構呈面對稱的關係。The laser processing head 10B is similar to the laser processing head 10A, and includes a housing 11, an incident portion 12, an adjustment portion 13, a focusing portion 14, a spectroscope 15, a measuring portion 16, an observation portion 17, a driving portion 18, and a circuit portion 19. However, the structures of the laser processing head 10B are arranged to have a plane-symmetrical relationship with the structures of the laser processing head 10A with respect to a virtual plane passing through the center point between a pair of mounting portions 65 and 66 and perpendicular to the Y direction, as shown in FIG.

例如,雷射加工頭10A的框體(第1框體)11係以第4壁部24對第3壁部23位於雷射加工頭10B側、且第6壁部26對第5壁部25位於支承部7側的方式,安裝於安裝部65。相對於此,雷射加工頭10B的框體(第2框體)11係以第4壁部24對第3壁部23位於雷射加工頭10A側、且第6壁部26對第5壁部25位於支承部7側的方式,安裝於安裝部66。For example, the frame (first frame) 11 of the laser machining head 10A is mounted on the mounting portion 65 in such a manner that the fourth wall portion 24 is located on the laser machining head 10B side with respect to the third wall portion 23, and the sixth wall portion 26 is located on the support portion 7 side with respect to the fifth wall portion 25. In contrast, the frame (second frame) 11 of the laser machining head 10B is mounted on the mounting portion 66 in such a manner that the fourth wall portion 24 is located on the laser machining head 10A side with respect to the third wall portion 23, and the sixth wall portion 26 is located on the support portion 7 side with respect to the fifth wall portion 25.

雷射加工頭10B的框體11構成為在第3壁部23配置於安裝部66側之狀態下,框體11安裝於安裝部66。具體而言,如以下所述。安裝部66具有座板66a和安裝板66b。座板66a係安裝於設在移動部63的軌道。安裝板66b係立設於座板66a之雷射加工頭10A側的端部。雷射加工頭10B的框體11為在第3壁部23接觸於安裝板66b之狀態下,安裝於安裝部66。雷射加工頭10B的框體11係對安裝部66可進行裝卸。 [作用及效果] The frame 11 of the laser processing head 10B is configured to be mounted on the mounting portion 66 when the third wall portion 23 is arranged on the mounting portion 66 side. Specifically, it is as follows. The mounting portion 66 has a seat plate 66a and a mounting plate 66b. The seat plate 66a is mounted on a track provided on the moving portion 63. The mounting plate 66b is erected on the end of the seat plate 66a on the laser processing head 10A side. The frame 11 of the laser processing head 10B is mounted on the mounting portion 66 when the third wall portion 23 contacts the mounting plate 66b. The frame 11 of the laser processing head 10B can be loaded and unloaded on the mounting portion 66. [Function and Effect]

在雷射加工頭10A,由於輸出雷射光L1之光源未設在框體11內,故,可謀求框體11的小型化。且,在框體11,第3壁部23與第4壁部24之距離是較第1壁部21與第2壁部22之距離小,配置於第6壁部26之聚光部14在Y方向上朝第4壁部24側偏移。藉此,在沿著與聚光部14的光軸垂直的方向使框體11移動之情況,即使在例如第4壁部24側存在有其他構件(例如雷射加工頭10B),也能夠使聚光部14接近該其他構件。因此,雷射加工頭10A亦可使聚光部14沿著與其光軸垂直的方向移動。In the laser processing head 10A, since the light source for outputting the laser light L1 is not provided in the frame 11, the frame 11 can be miniaturized. In addition, in the frame 11, the distance between the third wall portion 23 and the fourth wall portion 24 is smaller than the distance between the first wall portion 21 and the second wall portion 22, and the light focusing portion 14 disposed on the sixth wall portion 26 is offset toward the fourth wall portion 24 in the Y direction. Thus, when the frame 11 is moved in a direction perpendicular to the optical axis of the light focusing portion 14, even if there is another component (such as the laser processing head 10B) on the fourth wall portion 24 side, the light focusing portion 14 can be brought close to the other component. Therefore, the laser processing head 10A can also move the light focusing portion 14 in a direction perpendicular to its optical axis.

又,在雷射加工頭10A,射入部12是設在第5壁部25,在Y方向上朝第4壁部24側偏移。藉此,可在框體11內的區域中之對調整部13較靠近第3壁部23側之區域,配置其他構件(例如電路部19)等,可有效地利用該區域。In the laser processing head 10A, the incident portion 12 is provided on the fifth wall portion 25 and is offset in the Y direction toward the fourth wall portion 24. Thus, other components (such as the circuit portion 19) can be arranged in the region of the region within the frame 11 that is closer to the third wall portion 23 than the adjustment portion 13, and the region can be effectively utilized.

又,在雷射加工頭10A,聚光部14是在X方向上朝第2壁部22側偏移。藉此,在沿著與聚光部14的光軸垂直的方向使框體11移動之情況,即使在例如第2壁部22側存在有其他構件,也能夠使聚光部14接近該其他構件。In the laser processing head 10A, the focusing part 14 is offset in the X direction toward the second wall part 22. Thus, when the frame 11 is moved in a direction perpendicular to the optical axis of the focusing part 14, even if there are other components on the second wall part 22, for example, the focusing part 14 can be brought close to the other components.

又,在雷射加工頭10A,射入部12是設在第5壁部25,在X方向上朝第2壁部22側偏移。藉此,可在框體11內的區域中之對調整部13較靠近第1壁部21側之區域,配置其他構件(例如測定部16及觀察部17)等,可有效地利用該區域。In the laser processing head 10A, the incident portion 12 is provided on the fifth wall portion 25 and is offset in the X direction toward the second wall portion 22. Thus, other components (such as the measuring portion 16 and the observation portion 17) can be arranged in the region of the region within the frame 11 that is closer to the first wall portion 21 than the adjustment portion 13, and the region can be effectively utilized.

又,在雷射加工頭10A,測定部16及觀察部17係在框體11內的區域中,配置於對調整部13靠近第1壁部21側之區域,電路部19係在框體11內的區域中,配置於對調整部13靠近第3壁部23側,分光鏡15係框體11內,配置於調整部13與聚光部14之間。藉此,可有效地利用框體11內的區域。且,在雷射加工裝置1,可依據對象物100的表面與聚光部14之距離的測定結果進行加工。又,在雷射加工裝置1,可依據對象物100的表面之觀察結果進行加工。Furthermore, in the laser processing head 10A, the measuring section 16 and the observation section 17 are arranged in the area inside the frame 11, on the side of the adjustment section 13 close to the first wall section 21, the circuit section 19 is arranged in the area inside the frame 11, on the side of the adjustment section 13 close to the third wall section 23, and the spectroscope 15 is arranged in the frame 11, between the adjustment section 13 and the focusing section 14. Thus, the area inside the frame 11 can be effectively used. Furthermore, in the laser processing device 1, processing can be performed based on the measurement result of the distance between the surface of the object 100 and the focusing section 14. Furthermore, in the laser processing device 1, processing can be performed based on the observation result of the surface of the object 100.

又,在雷射加工頭10A,電路部19係依據自測定部16輸出的訊號,控制驅動部18。藉此,可依據對象物100的表面與聚光部14之距離的測定結果,調整雷射光L1的聚光點之位置。In the laser processing head 10A, the circuit section 19 controls the driving section 18 according to the signal output from the measuring section 16. Thus, the position of the focal point of the laser light L1 can be adjusted according to the measurement result of the distance between the surface of the object 100 and the focusing section 14.

又,在雷射加工頭10A,射入部12、以及調整部13的衰減器31、擴束器32及鏡子33係配置於沿著Z方向延伸之直線A1上,調整部13的反射型空間光調變器34、成像光學系統35及聚光部14、以及聚光部14係配置於沿著Z方向延伸的直線A2上。藉此,能夠緊緻地構成具有衰減器31、擴束器32、反射型空間光調變器34及成像光學系統35之調整部13。In the laser processing head 10A, the incident part 12, the attenuator 31, the beam expander 32 and the mirror 33 of the adjustment part 13 are arranged on the straight line A1 extending along the Z direction, and the reflective spatial light modulator 34, the imaging optical system 35 and the focusing part 14 of the adjustment part 13, and the focusing part 14 are arranged on the straight line A2 extending along the Z direction. In this way, the adjustment part 13 having the attenuator 31, the beam expander 32, the reflective spatial light modulator 34 and the imaging optical system 35 can be compactly configured.

又,在雷射加工頭10A,直線A1係對直線A2,位於第2壁部22側。藉此,可在框體11內的區域中之對調整部13較靠近第1壁部21側之區域,構成使用聚光部14之其他光學系統(例如測定部16及觀察部17)之情況,可使該其他光學系統的結構之自由度提升。In the laser processing head 10A, the straight line A1 is opposite to the straight line A2 and is located on the second wall portion 22 side. Thus, in the region within the frame 11, other optical systems (such as the measuring section 16 and the observing section 17) using the focusing section 14 can be configured in the region closer to the first wall portion 21 than the adjusting section 13, and the degree of freedom of the structure of the other optical systems can be increased.

以上的作用及效果,藉由雷射加工頭10B也同樣地可以達到。The above functions and effects can also be achieved by the laser processing head 10B.

又,在雷射加工裝置1,雷射加工頭10A的聚光部14係在雷射加工頭10A的框體11朝雷射加工頭10B側偏移,雷射加工頭10B的聚光部14係在雷射加工頭10B的框體11朝雷射加工頭10A側偏移。藉此,使1對雷射加工頭10A、10B分別沿著Y方向移動之情況,能夠使雷射加工頭10A的聚光部14與雷射加工頭10B的聚光部14互相地接近。因此,若依據雷射加工裝置1的話,能夠效率良好地加工對象物100。In the laser processing device 1, the focusing portion 14 of the laser processing head 10A is offset toward the laser processing head 10B side at the frame 11 of the laser processing head 10A, and the focusing portion 14 of the laser processing head 10B is offset toward the laser processing head 10A side at the frame 11 of the laser processing head 10B. Thus, when the pair of laser processing heads 10A and 10B are moved in the Y direction, the focusing portion 14 of the laser processing head 10A and the focusing portion 14 of the laser processing head 10B can be brought close to each other. Therefore, according to the laser processing device 1, the object 100 can be processed efficiently.

又,在雷射加工裝置1,1對安裝部65、66分別可沿著Y方向及Z方向移動。藉此,能夠效率更良好地加工對象物100。Furthermore, in the laser processing device 1, the pair of mounting parts 65 and 66 can be moved in the Y direction and the Z direction, respectively. Thus, the object 100 can be processed more efficiently.

又,在雷射加工裝置1,支承部7係可分別沿著X方向及Y方向移動,以與Z方向平行的軸線作為中心線而進行旋轉。藉此,能夠效率更良好地加工對象物100。 [變形例] Furthermore, in the laser processing device 1, the support portion 7 can be moved in the X direction and the Y direction, respectively, and rotated with an axis parallel to the Z direction as the center line. Thus, the object 100 can be processed more efficiently. [Variation]

例如,如圖6所示,射入部12、調整部13及聚光部14,亦可配置於沿著Z方向延伸的直線A上。藉此,能夠緊緻地構成調整部13。在該情況,調整部13亦可不具有反射型空間光調變器34、和成像光學系統35。又,調整部13亦可具有衰減器31及擴束器32。藉此,能夠緊緻地構成具有衰減器31、擴束器32之調整部13。再者,衰減器31及擴束器32的排列順序亦可相反。For example, as shown in FIG6 , the incident part 12, the adjustment part 13, and the focusing part 14 may be arranged on a straight line A extending along the Z direction. In this way, the adjustment part 13 can be compactly configured. In this case, the adjustment part 13 may not have the reflective spatial light modulator 34 and the imaging optical system 35. In addition, the adjustment part 13 may have the attenuator 31 and the beam expander 32. In this way, the adjustment part 13 having the attenuator 31 and the beam expander 32 can be compactly configured. Furthermore, the arrangement order of the attenuator 31 and the beam expander 32 may be reversed.

又,框體11係構成為第1壁部21、第2壁部22、第3壁部23及第5壁部25中的至少1個配置於雷射加工裝置1的安裝部65(或安裝部66)側之狀態下,框體11安裝於安裝部65(或安裝部66)即可。又,聚光部14係至少在Y方向上朝第4壁部24側偏移即可。藉此,在沿著Y方向使框體11移動之情況,即使在例如第4壁部24側存在有其他構件,也能夠使聚光部14接近該其他構件。又,在沿著Z方向使框體11移動之情況,例如能夠使聚光部14接近對象物100。Furthermore, the frame 11 is configured such that at least one of the first wall portion 21, the second wall portion 22, the third wall portion 23, and the fifth wall portion 25 is disposed on the side of the mounting portion 65 (or the mounting portion 66) of the laser processing device 1, and the frame 11 can be mounted on the mounting portion 65 (or the mounting portion 66). Furthermore, the focusing portion 14 can be offset toward the fourth wall portion 24 at least in the Y direction. Thereby, when the frame 11 is moved along the Y direction, even if there are other components on the side of the fourth wall portion 24, for example, the focusing portion 14 can be brought close to the other components. Furthermore, when the frame 11 is moved along the Z direction, for example, the focusing portion 14 can be brought close to the object 100.

又,亦可為聚光部14係至少在X方向上朝第1壁部21側偏移。藉此,在沿著與聚光部14的光軸垂直的方向使框體11移動之情況,即使在例如第1壁部21側存在有其他構件,也能夠使聚光部14接近該其他構件。在該情況,亦可為射入部12係在X方向上朝第1壁部21側偏移。藉此,可在框體11內的區域中之對調整部13較靠近第2壁部22側之區域,配置其他構件(例如測定部16及觀察部17)等,可有效地利用該區域。Furthermore, the light-collecting portion 14 may be offset toward the first wall portion 21 at least in the X direction. Thus, when the frame 11 is moved in a direction perpendicular to the optical axis of the light-collecting portion 14, even if there are other components on the first wall portion 21 side, for example, the light-collecting portion 14 can be brought close to the other components. In this case, the incident portion 12 may be offset toward the first wall portion 21 side in the X direction. Thus, other components (for example, the measuring portion 16 and the observing portion 17) can be arranged in the region within the frame 11 that is closer to the second wall portion 22 than the adjusting portion 13, and the region can be effectively utilized.

又,亦可為從光源單元8的射出部81a朝雷射加工頭10A的射入部12之雷射光L1的導光、及從光源單元8的射出部82a朝雷射加工頭10B的射入部12之雷射光L2的導光之至少一個是藉由鏡子實施。圖7係為雷射光L1被鏡子導引之雷射加工裝置1的一部分之正面圖。在如圖7所示的結構,用來反射雷射光L1之鏡子3係以在Y方向上與光源單元8的射出部81a相對向且在Z方向上與雷射加工頭10A的射入部12相對向的方式,安裝於移動機構6的移動部63。Furthermore, at least one of the guiding of the laser light L1 from the emitting portion 81a of the light source unit 8 to the incident portion 12 of the laser processing head 10A and the guiding of the laser light L2 from the emitting portion 82a of the light source unit 8 to the incident portion 12 of the laser processing head 10B may be implemented by a mirror. FIG7 is a front view of a portion of the laser processing device 1 in which the laser light L1 is guided by a mirror. In the structure shown in FIG7, the mirror 3 for reflecting the laser light L1 is mounted on the moving portion 63 of the moving mechanism 6 in such a manner as to be opposite to the emitting portion 81a of the light source unit 8 in the Y direction and to be opposite to the incident portion 12 of the laser processing head 10A in the Z direction.

在如圖7所示的結構,即使將移動機構6的移動部63沿著Y方向移動,鏡子3在Y方向上與光源單元8的射出部81a相對向的狀態仍被維持。又,即使將移動機構6的安裝部65沿著Z方向移動,鏡子3在Z方向上與雷射加工頭10A的射入部12相對向的狀態仍被維持。因此,不受雷射加工頭10A的位置影響,能使自光源單元8的射出部81a所射出的雷射光L1確實地射入到雷射加工頭10A的射入部12。並且,亦可利用藉由光纖2之導光極為困難的高輸出長短脈衝雷射等的光源。In the structure shown in FIG. 7 , even if the moving portion 63 of the moving mechanism 6 is moved in the Y direction, the state in which the mirror 3 is opposed to the emission portion 81a of the light source unit 8 in the Y direction is maintained. Furthermore, even if the mounting portion 65 of the moving mechanism 6 is moved in the Z direction, the state in which the mirror 3 is opposed to the injection portion 12 of the laser processing head 10A in the Z direction is maintained. Therefore, the laser light L1 emitted from the emission portion 81a of the light source unit 8 can be reliably injected into the injection portion 12 of the laser processing head 10A without being affected by the position of the laser processing head 10A. In addition, a light source such as a high-output long and short pulse laser, which is extremely difficult to guide through the optical fiber 2, can also be used.

又,在如圖7所示的結構,亦可為鏡子3係以可至少進行角度調整及位置調整中的至少1個調整的方式,安裝於移動機構6的移動部63。藉此,能使自光源單元8的射出部81a所射出的雷射光L1更確實地射入到雷射加工頭10A的射入部12。7, the mirror 3 may be mounted on the moving portion 63 of the moving mechanism 6 in a manner that allows at least one of angle adjustment and position adjustment. This allows the laser light L1 emitted from the emission portion 81a of the light source unit 8 to be more reliably emitted into the injection portion 12 of the laser processing head 10A.

又,光源單元8亦可為具有1個光源者。在該情況,光源單元8係構成為將自1個光源所輸出的雷射光之一部分從射出部81a射出且將該雷射光的殘餘部分從射出部82b射出即可。Furthermore, the light source unit 8 may include one light source. In this case, the light source unit 8 may be configured to emit a portion of the laser light output from one light source from the emission portion 81a and to emit the remaining portion of the laser light from the emission portion 82b.

又,雷射加工裝置1亦可具備1個雷射加工頭10A。即使在具備1個雷射加工頭10A之雷射加工裝置1,在沿著與聚光部14的光軸垂直的Y方向使框體11移動之情況,即使在例如第4壁部24側存在有其他構件,也能夠使聚光部14接近該其他構件。因此,若依據具備1個雷射加工頭10A的雷射加工裝置1的話,也能夠效率良好地加工對象物100。又,在具備1個雷射加工頭10A的雷射加工裝置1,若安裝部65沿著Z方向移動的話,則也能夠效率良好地加工對象物100。又,在具備1個雷射加工頭10A的雷射加工裝置1,若支承部7沿著X方向移動且以與Z方向平行的軸線作為中心線而進行旋轉的話,則能效率更良好地加工對象物100。Furthermore, the laser processing device 1 may also include a laser processing head 10A. Even in the case of a laser processing device 1 including a laser processing head 10A, when the frame 11 is moved in the Y direction perpendicular to the optical axis of the focusing portion 14, even if there are other components on the side of the fourth wall portion 24, for example, the focusing portion 14 can be brought close to the other components. Therefore, according to the laser processing device 1 including a laser processing head 10A, the object 100 can be processed efficiently. Furthermore, in the laser processing device 1 including a laser processing head 10A, when the mounting portion 65 is moved in the Z direction, the object 100 can be processed efficiently. Furthermore, in the laser processing device 1 having one laser processing head 10A, if the support portion 7 moves in the X direction and rotates about an axis parallel to the Z direction as a center line, the object 100 can be processed more efficiently.

又,雷射加工裝置1亦可具備3個以上的雷射加工頭。圖8係具備2對的雷射加工頭之雷射加工裝置1的斜視圖。如圖8所示的雷射加工裝置1,係具備有複數個移動機構200、300、400;支承部7;1對雷射加工頭10A、10B;1對雷射加工頭10C、10D;及光源單元(未圖示)。Furthermore, the laser processing device 1 may also have more than three laser processing heads. FIG8 is a perspective view of the laser processing device 1 having two pairs of laser processing heads. The laser processing device 1 shown in FIG8 has a plurality of moving mechanisms 200, 300, 400; a support portion 7; a pair of laser processing heads 10A, 10B; a pair of laser processing heads 10C, 10D; and a light source unit (not shown).

移動機構200係使支承部7分別沿著X方向、Y方向及Z方向移動,並以與Z方向平行的軸線作為中心線而使支承部7旋轉。The moving mechanism 200 moves the support portion 7 in the X direction, the Y direction, and the Z direction, and rotates the support portion 7 with an axis parallel to the Z direction as a center line.

移動機構300係具有固定部301、及1對安裝部(第1安裝部、第2安裝部)305、306。固定部301係安裝於裝置框架(未圖示)。1對安裝部305、306分別安裝於設在固定部301的軌道,各自獨立而可沿著Y方向移動。The moving mechanism 300 includes a fixed portion 301 and a pair of mounting portions (first mounting portion, second mounting portion) 305, 306. The fixed portion 301 is mounted on a device frame (not shown). The pair of mounting portions 305, 306 are mounted on rails provided on the fixed portion 301, and are independently movable in the Y direction.

移動機構400係具有固定部401、及1對安裝部(第1安裝部、第2安裝部)405、406。固定部401係安裝於裝置框架(未圖示)。1對安裝部405、406分別安裝於設在固定部401的軌道,各自獨立而可沿著X方向移動。再者,固定部401的軌道配置成與固定部301的軌道立體地交叉。The moving mechanism 400 has a fixed part 401 and a pair of mounting parts (first mounting part, second mounting part) 405, 406. The fixed part 401 is mounted on a device frame (not shown). The pair of mounting parts 405, 406 are respectively mounted on rails provided on the fixed part 401, and are independently movable along the X direction. Furthermore, the rails of the fixed part 401 are arranged to intersect with the rails of the fixed part 301 in a three-dimensional manner.

雷射加工頭10A係安裝於移動機構300的安裝部305。雷射加工頭10A係在Z方向上與支承部7相對向的狀態下,對支承於支承部7之對象物100照射雷射光。從雷射加工頭10A所射出的雷射光係藉由光纖2從光源單元(未圖示)進行導引。雷射加工頭10B係安裝於移動機構300的安裝部306。雷射加工頭10B係在Z方向上與支承部7相對向的狀態下,對支承於支承部7之對象物100照射雷射光。從雷射加工頭10B所射出的雷射光係藉由光纖2從光源單元(未圖示)進行導引。The laser processing head 10A is mounted on the mounting portion 305 of the moving mechanism 300. The laser processing head 10A irradiates the object 100 supported by the support portion 7 with laser light in a state where the laser processing head 10A is opposite to the support portion 7 in the Z direction. The laser light emitted from the laser processing head 10A is guided from the light source unit (not shown) by the optical fiber 2. The laser processing head 10B is mounted on the mounting portion 306 of the moving mechanism 300. The laser processing head 10B irradiates the object 100 supported by the support portion 7 with laser light in a state where the laser processing head 10B is opposite to the support portion 7 in the Z direction. The laser light emitted from the laser processing head 10B is guided from the light source unit (not shown) by the optical fiber 2.

雷射加工頭10C係安裝於移動機構400的安裝部405。雷射加工頭10C係在Z方向上與支承部7相對向的狀態下,對支承於支承部7之對象物100照射雷射光。從雷射加工頭10C所射出的雷射光係藉由光纖2從光源單元(未圖示)進行導引。雷射加工頭10D係安裝於移動機構400的安裝部406。雷射加工頭10D係在Z方向上與支承部7相對向的狀態下,對支承於支承部7之對象物100照射雷射光。從雷射加工頭10D所射出的雷射光係藉由光纖2從光源單元(未圖示)進行導引。The laser processing head 10C is mounted on the mounting portion 405 of the moving mechanism 400. The laser processing head 10C irradiates the object 100 supported by the support portion 7 with laser light in a state where the laser processing head 10C is opposite to the support portion 7 in the Z direction. The laser light emitted from the laser processing head 10C is guided from the light source unit (not shown) by the optical fiber 2. The laser processing head 10D is mounted on the mounting portion 406 of the moving mechanism 400. The laser processing head 10D irradiates the object 100 supported by the support portion 7 with laser light in a state where the laser processing head 10D is opposite to the support portion 7 in the Z direction. The laser light emitted from the laser processing head 10D is guided from the light source unit (not shown) by the optical fiber 2.

如圖8所示的雷射加工裝置1之1對雷射加工頭10A、10B的結構係與圖1所示的雷射加工裝置1之1對雷射加工頭10A、10B的結構相同。如圖8所示的雷射加工裝置1之1對雷射加工頭10C、10D的結構,係和將如圖1所示的雷射加工裝置1之1對雷射加工頭10A、10B以與Z方向平行的軸線作為中心線而旋轉90°之情況的1對雷射加工頭10A、10B的結構相同。The structure of the pair of laser processing heads 10A and 10B of the laser processing device 1 shown in Fig. 8 is the same as the structure of the pair of laser processing heads 10A and 10B of the laser processing device 1 shown in Fig. 1. The structure of the pair of laser processing heads 10C and 10D of the laser processing device 1 shown in Fig. 8 is the same as the structure of the pair of laser processing heads 10A and 10B of the laser processing device 1 shown in Fig. 1 rotated 90 degrees with the axis parallel to the Z direction as the center line.

例如,雷射加工頭10C的框體(第1框體)11係以第4壁部24對第3壁部23位於雷射加工頭10D側、且第6壁部26對第5壁部25位於支承部7側的方式,安裝於安裝部65。又,雷射加工頭10C的聚光部14是在Y方向上朝第4壁部24側(亦即,雷射加工頭10D側)偏移。For example, the frame (first frame) 11 of the laser machining head 10C is mounted on the mounting portion 65 in such a manner that the fourth wall portion 24 is located on the laser machining head 10D side relative to the third wall portion 23, and the sixth wall portion 26 is located on the support portion 7 side relative to the fifth wall portion 25. In addition, the focusing portion 14 of the laser machining head 10C is offset in the Y direction toward the fourth wall portion 24 side (that is, the laser machining head 10D side).

雷射加工頭10D的框體(第2框體)11係以第4壁部24對第3壁部23位於雷射加工頭10C側、且第6壁部26對第5壁部25位於支承部7側的方式,安裝於安裝部66。又,雷射加工頭10D的聚光部14是在Y方向上朝第4壁部24側(亦即,雷射加工頭10C側)偏移。The frame (second frame) 11 of the laser machining head 10D is mounted on the mounting portion 66 in such a manner that the fourth wall portion 24 is located on the laser machining head 10C side relative to the third wall portion 23, and the sixth wall portion 26 is located on the support portion 7 side relative to the fifth wall portion 25. In addition, the focusing portion 14 of the laser machining head 10D is offset in the Y direction toward the fourth wall portion 24 side (that is, the laser machining head 10C side).

如以上所述,在如圖8所示的雷射加工裝置1,使1對雷射加工頭10A、10B分別沿著Y方向移動之情況,能夠使雷射加工頭10A的聚光部14與雷射加工頭10B的聚光部14互相地接近。又,使1對雷射加工頭10C、10D分別沿著X方向移動之情況,能夠使雷射加工頭10C的聚光部14與雷射加工頭10D的聚光部14互相地接近。As described above, in the laser processing device 1 shown in FIG8 , when the pair of laser processing heads 10A and 10B are moved in the Y direction, the focusing portion 14 of the laser processing head 10A and the focusing portion 14 of the laser processing head 10B can be brought close to each other. Also, when the pair of laser processing heads 10C and 10D are moved in the X direction, the focusing portion 14 of the laser processing head 10C and the focusing portion 14 of the laser processing head 10D can be brought close to each other.

又,雷射加工頭及雷射加工裝置,不限於將改質區域形成於對象物100的內部者,亦可為實施其他雷射加工者。Furthermore, the laser processing head and the laser processing device are not limited to those that form the modified region inside the object 100, and may also be those that perform other laser processing.

其次,說明實施形態。在以下的說明,省略與前述實施形態重複之說明。In the following description, the descriptions that are repeated with the above-mentioned embodiments are omitted.

如圖9所示的雷射加工裝置101,係藉由朝對象物100配合聚光位置(至少聚光區域之一部分、聚光點)而照射雷射光,使得在對象物100形成改質區域的裝置。雷射加工裝置101係對對象物100實施修整加工、放射切削加工及剝離加工,取得(製造)半導體裝置。修整加工係為用來在對象物100去除不要部分之加工。放射切削加工係為了將以修整加工去除之不要部分分離之加工。剝離加工係用來將對象物100的一部分剝離的加工。The laser processing device 101 shown in FIG9 is a device that forms a modified area on the object 100 by irradiating laser light toward the object 100 in accordance with the focusing position (at least a part of the focusing area, the focusing point). The laser processing device 101 performs trimming processing, radial cutting processing, and stripping processing on the object 100 to obtain (manufacture) a semiconductor device. The trimming processing is a processing for removing an unnecessary portion of the object 100. The radial cutting processing is a processing for separating the unnecessary portion removed by the trimming processing. The stripping processing is a processing for stripping a part of the object 100.

對象物100係例如包含形成為圓板狀之半導體晶圓。作為對象物未特別限定,可為以各種材料所形成,亦可呈現各種形狀。在對象物100的表面100a形成有功能元件(未圖示)。功能元件為例如發光二極體等的受光元件、雷射二極體等的發光元件、記憶體等的回路元件等。The object 100 includes, for example, a semiconductor wafer formed in a disk shape. The object is not particularly limited and may be formed of various materials and may have various shapes. A functional element (not shown) is formed on the surface 100a of the object 100. The functional element is, for example, a light-receiving element such as a light-emitting diode, a light-emitting element such as a laser diode, a circuit element such as a memory, and the like.

如圖10(a)及圖10(b)所示,在對象物100,設定有有效區域R及去除區域E。有效區域R係對應於要取得的半導體裝置之部分。有效區域R係為裝置區域。例如,有效區域R係從厚度方向觀看對象物100時,包含中央部分之圓板狀的部分。有效區域R為較去除區域E更內側的內側區域。去除區域E係為較對象物100之有效區域R更外側的區域。去除區域E係在對象物100中,有效區域R以外之外緣部分。例如,去除區域E係為包圍有效區域R的圓環狀之部分。去除區域E係從厚度方向觀看對象物100時,包含周緣部分(外緣的斜角部)。去除區域E係成為放射切削加工的對象之放射切削區域。As shown in FIG. 10( a) and FIG. 10( b), an effective area R and a removal area E are set in the object 100. The effective area R is a portion corresponding to the semiconductor device to be obtained. The effective area R is a device area. For example, the effective area R is a disk-shaped portion including the central portion when the object 100 is viewed from the thickness direction. The effective area R is an inner area that is further inward than the removal area E. The removal area E is an area further outward than the effective area R of the object 100. The removal area E is an outer edge portion outside the effective area R in the object 100. For example, the removal area E is a ring-shaped portion surrounding the effective area R. The removal area E includes the peripheral portion (the beveled portion of the outer edge) when the object 100 is viewed from the thickness direction. The removal area E is a radial cutting area that becomes the object of radial cutting processing.

在對象物100,設定作為剝離預定面的假想面M1。假想面M1係預定藉由剝離加工之改質區域的形成之面。假想面M1係與對象物100的雷射光射入面亦即背面100b對向之面。假想面M1係為與背面100b平行的面,呈例如圓形狀。假想面M1係為假想的區域,未限定於平面,亦可為曲面乃至三維狀的面。有效區域R、去除區域E及假想面M1的設定係可在控制部9進行。有效區域R、去除區域E及假想面M1亦可為座標指定者。In the object 100, a virtual surface M1 is set as a surface predetermined for peeling. The virtual surface M1 is a surface predetermined to form a modified area by peeling processing. The virtual surface M1 is a surface opposite to the laser light incident surface of the object 100, that is, the back side 100b. The virtual surface M1 is a surface parallel to the back side 100b, and is, for example, circular. The virtual surface M1 is a virtual area, which is not limited to a plane, and can also be a curved surface or even a three-dimensional surface. The setting of the effective area R, the removal area E and the virtual surface M1 can be performed in the control unit 9. The effective area R, the removal area E and the virtual surface M1 can also be specified by coordinates.

在對象物100,設定有作為修整予定線之線(環狀線)M2。線M2係為預定進行藉由修整加工之改質區域的形成之線。線M2係在對象物100的外緣內側,呈環狀延伸。在此的線M2係呈圓環狀延伸。線M2係在對象物100的內部之較假想面M1更靠近雷射光射入面相反側的部分,設定於有效區域R與去除區域E之邊界。線M2的設定係可在控制部9進行。線M2係為假想的線,但亦可為實際上劃出的線。線M2亦可為座標指定者。關於線M2的設定之說明,在後述的線M3~M5也相同。In the object 100, a line (annular line) M2 is set as a predetermined trimming line. The line M2 is a line for forming a modified area predetermined to be processed by trimming. The line M2 extends in a ring shape inside the outer edge of the object 100. Here, the line M2 extends in a circular ring shape. The line M2 is set at the boundary between the effective area R and the removal area E in the part of the interior of the object 100 that is closer to the opposite side of the laser light incident surface than the imaginary surface M1. The setting of the line M2 can be performed in the control unit 9. The line M2 is an imaginary line, but it can also be a line actually drawn. The line M2 can also be specified by coordinates. The description of the setting of the line M2 is the same as that of the lines M3 to M5 described later.

在對象物100,設定有作為放射切削予定線之線(直線狀線)M3。線M3係為預定進行藉由放射切削加工之改質區域的形成之線。線M3係當從雷射光射入面觀看時,朝沿著對象物100的徑方向之直線狀(放射狀)延伸。線M3係當從雷射光射入面觀看時,以去除區域E朝周方向進行相等分割(在此為四分割)的方式設有複數個。在圖示的例子,線M3係當從雷射光射入面觀看時,包含朝一方向延伸的線M3a、M3b;及朝與一方向正交的另一方向延伸的線M3c、M3d。In the object 100, a line (straight line) M3 is set as a predetermined radial cutting line. The line M3 is a line for forming a modified area predetermined to be processed by radial cutting. The line M3 extends in a straight line (radial) along the radial direction of the object 100 when viewed from the laser light incident surface. When viewed from the laser light incident surface, a plurality of lines M3 are provided in a manner that the removal area E is equally divided in the circumferential direction (four divisions in this case). In the example shown in the figure, the line M3 includes lines M3a and M3b extending in one direction when viewed from the laser light incident surface; and lines M3c and M3d extending in another direction orthogonal to the one direction.

如圖9所示,雷射加工裝置101係具備載置台107、雷射加工頭10A、第1Z軸軌道106A、Y軸軌道108、攝像部110、GUI(Graphical User Interface)111以及控制部9。載置台107係為用來支承對象物100的支承部。載置台107係與前述支承部7(參照圖1)同樣地構成。在載置台107的支承面107a,以將對象物100的背面100b設成為雷射光射入面側亦即上側之狀態(將表面100a設成為載置台107側亦即下側之狀態),載置對象物100。載置台107係具有設在其中心的旋轉軸C。旋轉軸C係為沿著聚光部14的光軸方向亦即Z方向延伸之軸。載置台107係能以旋轉軸C為中心進行旋轉。載置台107係藉由馬達等的習知驅動裝置的驅動力進行旋轉驅動。As shown in FIG9 , the laser processing device 101 includes a stage 107, a laser processing head 10A, a first Z-axis track 106A, a Y-axis track 108, an imaging unit 110, a GUI (Graphical User Interface) 111, and a control unit 9. The stage 107 is a support unit for supporting the object 100. The stage 107 is configured in the same manner as the support unit 7 (see FIG1 ). The object 100 is placed on a support surface 107a of the stage 107 in a state where the back side 100b of the object 100 is set as the laser light incident side, i.e., the upper side (the surface 100a is set as the stage 107 side, i.e., the lower side). The stage 107 has a rotation axis C provided at its center. The rotation axis C is an axis extending along the optical axis direction of the light focusing unit 14, that is, the Z direction. The mounting table 107 can rotate around the rotation axis C. The mounting table 107 is rotationally driven by a driving force of a conventional driving device such as a motor.

雷射加工頭10A係對載置於載置台107之對象物100,沿著Z方向經由聚光部14照射雷射光L1(參照圖11(a)),在該對象物100的內部形成改質區域。雷射加工頭10A係安裝於第1Z軸軌道106A及Y軸軌道108。雷射加工頭10A係藉由馬達等的習知驅動裝置之驅動力,沿著第1Z軸軌道106A,可朝Z方向直線地移動。雷射加工頭10A係藉由馬達等的習知驅動裝置之驅動力,沿著Y軸軌道108,可朝Y方向直線地移動。雷射加工頭10A係構成照射部。聚光部14包含聚光透鏡。The laser processing head 10A irradiates the object 100 placed on the mounting table 107 with laser light L1 along the Z direction via the focusing portion 14 (refer to FIG. 11(a)), thereby forming a modified area inside the object 100. The laser processing head 10A is mounted on the first Z-axis track 106A and the Y-axis track 108. The laser processing head 10A can be moved linearly in the Z direction along the first Z-axis track 106A by the driving force of a known driving device such as a motor. The laser processing head 10A can be moved linearly in the Y direction along the Y-axis track 108 by the driving force of a known driving device such as a motor. The laser processing head 10A constitutes an irradiation portion. The light-collecting unit 14 includes a light-collecting lens.

雷射加工頭10A係具備:反射型空間光調變器34、驅動部18及距離測量感測器36。反射型空間光調變器34及驅動部18係具備前述的結構(參照圖5)。距離測量感測器36係為對對象物100的雷射光射入面照射距離測量用雷射光(測定光),在該雷射光射入面反射之距離測量用雷射光的反射光的感測器。距離測量感測器36係將關於接收到的反射光之資訊作為關於對象物100的雷射光射入面的位移(包含凹凸、傾斜等)之位移資料加以取得。位移資料係為例如因應接收到的反射光之電壓值。作為距離測量感測器36,為與雷射光L1不同軸的感測器之情況,能夠使用三角距離測量方式、雷射共焦點方式、白色共焦點方式、光譜干擾方式、散光方式等的感測器。作為距離測量感測器36,為與雷射光L1同軸的感測器之情況,能夠使用散光方式等的感測器。距離測量感測器36的種類未特別限定,可利用各種的感測器。The laser processing head 10A is equipped with: a reflective spatial light modulator 34, a drive unit 18 and a distance measuring sensor 36. The reflective spatial light modulator 34 and the drive unit 18 have the aforementioned structure (refer to FIG. 5). The distance measuring sensor 36 is a sensor for reflecting the distance measuring laser light (measurement light) reflected by the laser light incident surface of the object 100 when the distance measuring laser light (measurement light) is irradiated on the laser light incident surface of the object 100. The distance measuring sensor 36 obtains information about the received reflected light as displacement data about the displacement (including convexity and concavity, tilt, etc.) of the laser light incident surface of the object 100. The displacement data is, for example, a voltage value corresponding to the received reflected light. When the distance measuring sensor 36 is a sensor that is not coaxial with the laser light L1, a sensor of a triangular distance measuring method, a laser confocal method, a white confocal method, a spectral interference method, an astigmatism method, etc. can be used. When the distance measuring sensor 36 is a sensor that is coaxial with the laser light L1, a sensor of an astigmatism method, etc. can be used. The type of the distance measuring sensor 36 is not particularly limited, and various sensors can be used.

雷射加工頭10A的電路部19(參照圖3)係依據在距離測量感測器36所取得的位移資料,驅動驅動部18(參照圖5),使聚光部14追隨雷射光射入面。例如,一面以距離測量感測器36取得作為位移資料之電壓值,一面以取得的該電壓值成為基準值的方式,驅動部18驅動而將聚光部14朝Z方向驅動。基準值,係依據成為為了追隨雷射光照射面而驅動聚光部14的基準之電壓值亦即後述的高度設定時的高度設定電壓值之值。以下,將為了追隨雷射光照射面而驅動聚光部14一事稱為AF(自動對焦)追隨。The circuit section 19 (see FIG. 3 ) of the laser processing head 10A drives the driving section 18 (see FIG. 5 ) based on the displacement data obtained by the distance measuring sensor 36 so that the focusing section 14 follows the laser light incident surface. For example, the driving section 18 drives the focusing section 14 in the Z direction in such a manner that the voltage value obtained as the displacement data is obtained by the distance measuring sensor 36 and the obtained voltage value is used as a reference value. The reference value is a voltage value that serves as a reference for driving the focusing section 14 to follow the laser light irradiation surface, that is, a height setting voltage value when setting the height described later. Hereinafter, driving the focusing unit 14 to track the laser light irradiation surface is referred to as AF (auto focus) tracking.

藉此,依據該位移資料,使聚光部14沿著Z方向移動,將對象物100的雷射光射入面與雷射光L1的聚光位置之距離維持成一定。電路部19係將以聚光部14追隨雷射光射入面的方式驅動驅動部18之控制訊號值作為測定資料加以記憶(取得)。距離測量感測器36及電路部19係構成測定資料取得部。再者,亦可為使控制部9或其他電路部具有:將驅動部18進行追隨驅動之功能及記憶控制訊號值之功能。如以上方式所獲得的測定資料,係為除了關於對象物100的雷射光射入面的位移以外,亦關於支承該對象物100的支承面107a的位移之資料。順便一提,測定資料,係關於雷射光射入面的位移及支承面107a的位移中的至少一個即可,這樣的測定資料可藉由各種的習知技術取得。Thus, the focusing unit 14 is moved along the Z direction according to the displacement data, and the distance between the laser light incident surface of the object 100 and the focusing position of the laser light L1 is maintained constant. The circuit unit 19 stores (acquires) the control signal value of the driving unit 18 in a manner that the focusing unit 14 follows the laser light incident surface as measurement data. The distance measurement sensor 36 and the circuit unit 19 constitute a measurement data acquisition unit. Furthermore, the control unit 9 or other circuit units may have the function of following and driving the driving unit 18 and the function of storing the control signal value. The measurement data obtained in the above manner is not only about the displacement of the laser light incident surface of the object 100, but also about the displacement of the support surface 107a supporting the object 100. Incidentally, the measurement data only need to be about at least one of the displacement of the laser light incident surface and the displacement of the support surface 107a, and such measurement data can be obtained by various known techniques.

第1Z軸軌道106A為沿著Z方向延伸的軌道。第1Z軸軌道106A係經由安裝部65而安裝於雷射加工頭10A。第1Z軸軌道106A係使雷射加工頭10A沿著Z方向移動,讓雷射光L1的聚光位置沿著Z方向(與假想面M1交叉的方向)移動。Y軸軌道108為沿著Y方向延伸的軌道。Y軸軌道108係安裝於第1Z軸軌道106A。Y軸軌道108係使雷射加工頭10A沿著Y方向移動,讓雷射光L1的聚光位置沿著Y方向(沿著假想面M1的方向)移動。第1Z軸軌道106A及Y軸軌道108係對應於前述移動機構6(參照圖1)或前述移動機構300(參照圖8)的軌道。第1Z軸軌道106A及Y軸軌道108係為了讓藉由聚光部14之雷射光L1的聚光位置移動,使載置台107及雷射加工頭10A中的至少一方移動。以下,亦將藉由聚光部14之雷射光L1的聚光位置僅稱為[聚光位置]。The first Z-axis track 106A is a track extending along the Z direction. The first Z-axis track 106A is mounted on the laser processing head 10A via the mounting portion 65. The first Z-axis track 106A moves the laser processing head 10A along the Z direction, and moves the focusing position of the laser light L1 along the Z direction (the direction intersecting the imaginary plane M1). The Y-axis track 108 is a track extending along the Y direction. The Y-axis track 108 is mounted on the first Z-axis track 106A. The Y-axis track 108 moves the laser processing head 10A along the Y direction, and moves the focusing position of the laser light L1 along the Y direction (the direction along the imaginary plane M1). The first Z-axis track 106A and the Y-axis track 108 correspond to the tracks of the aforementioned moving mechanism 6 (see FIG. 1 ) or the aforementioned moving mechanism 300 (see FIG. 8 ). The first Z-axis track 106A and the Y-axis track 108 are used to move the focusing position of the laser light L1 by the focusing unit 14, so as to move at least one of the mounting table 107 and the laser processing head 10A. Hereinafter, the focusing position of the laser light L1 by the focusing unit 14 is also referred to as the “focusing position”.

攝像部110係從沿著雷射光L1的射入方向之方向,對對象物100進行攝像。攝像部110係包含對準用照相機AC及攝像單元IR。對準用照相機AC及攝像單元IR係與雷射加工頭10A安裝於安裝部65。對準用照相機AC係例如使用透過對象物100之光,對裝置圖案等進行攝像。藉此,所獲得的圖像被提供於雷射光L1對對象物100的照射位置之對準。The imaging unit 110 captures the object 100 from a direction along the incident direction of the laser light L1. The imaging unit 110 includes an alignment camera AC and an imaging unit IR. The alignment camera AC and the imaging unit IR are mounted on the mounting portion 65 together with the laser processing head 10A. The alignment camera AC captures the device pattern, etc., using light that has passed through the object 100. The image thus obtained is provided for alignment of the irradiation position of the laser light L1 on the object 100.

攝像單元IR係藉由透過對象物100之光,對對象物100進行攝像。例如,在對象物100為包含矽之晶圓的情況,在攝像單元IR,使用近紅外區域的光。攝像單元IR具有光源、物鏡、及光檢測部。光源係對對象物100,輸出具有透過性的光。光源係例如藉由鹵素燈及過濾器構成,例如輸出近紅外區域的光。從光源輸出的光,係藉由鏡子等的光學系統進行導光而通過物鏡,再照射至對象物100。物鏡係使在對象物100的雷射光射入面相反側的面反射之光通過。亦即,物鏡係使傳播(透過)對象物100的光通過。物鏡係具有修正環。修正環係例如藉由調整構成物鏡的複數個透鏡之相互間的距離,在對象物100內,修正在光所產生的像差。光檢測部係檢測通過物鏡的光。光檢測部係例如藉由InGaAs照相機構成,檢測近紅外區域的光。攝像單元IR係可對形成於對象物100的內部之改質區域、及從改質區域延伸的龜裂中的至少一個進行攝像。在雷射加工裝置101,可使用攝像單元IR,以非破壞的方式確認雷射加工的加工狀態。The imaging unit IR captures an image of the object 100 by light passing through the object 100. For example, when the object 100 is a wafer including silicon, the imaging unit IR uses light in the near-infrared region. The imaging unit IR has a light source, an objective lens, and a light detection unit. The light source outputs light that is transparent to the object 100. The light source is composed of, for example, a halogen lamp and a filter, and outputs light in the near-infrared region. The light output from the light source is guided by an optical system such as a mirror and passes through the objective lens, and then irradiates the object 100. The objective lens allows light reflected from the surface opposite to the laser light incident surface of the object 100 to pass through. That is, the objective lens allows light that propagates (transmits) the object 100 to pass through. The objective lens has a correction ring. The correction ring corrects the aberration generated in the light in the object 100, for example, by adjusting the distance between the plurality of lenses constituting the objective lens. The light detection unit detects the light that passes through the objective lens. The light detection unit is constituted by, for example, an InGaAs camera, and detects light in the near-infrared region. The imaging unit IR can photograph at least one of the modified area formed inside the object 100 and the cracks extending from the modified area. In the laser processing device 101, the imaging unit IR can be used to confirm the processing status of the laser processing in a non-destructive manner.

GUI111係顯示各種資訊。GUI111係為例如包含觸控面板顯示器。GUI111係藉由使用者的觸控等,輸入關於加工條件之各種的設定。GUI111係構成接收來自於使用者的輸入之輸入部。The GUI 111 displays various information. The GUI 111 includes, for example, a touch panel display. The GUI 111 allows the user to input various settings related to processing conditions through touch, etc. The GUI 111 constitutes an input unit that receives input from the user.

控制部9係作為包含處理器、記憶體、儲存器及通訊裝置等之電腦裝置構成。在控制部9,加載於記憶體等的軟體(程式)是藉由處理器執行,記憶體及儲存器之資料的讀取及寫入以及藉由通訊裝置之通訊是藉由處理器控制。控制部9係控制雷射加工裝置101的各部,達到各種功能。The control unit 9 is constituted as a computer device including a processor, a memory, a storage, and a communication device. In the control unit 9, the software (program) loaded on the memory, etc. is executed by the processor, and the reading and writing of data in the memory and the storage and the communication through the communication device are controlled by the processor. The control unit 9 controls each part of the laser processing device 101 to achieve various functions.

控制部9至少控制:載置台107、雷射加工頭10A、及前述移動機構6(參照圖1)或前述移動機構300(參照圖1)。控制部9係控制載置台107的旋轉、來自於雷射加工頭10A的雷射光L1的照射、及雷射光L1的聚光位置的移動。控制部9係依據關於載置台107的旋轉量之旋轉資訊(以下亦稱為[θ資訊]),可執行各種的控制。θ資訊可從使載置台107旋轉的驅動裝置之驅動量取得,亦可藉由其他的感測器等取得。θ資訊係可藉由習知的各種方法取得。The control unit 9 controls at least: the stage 107, the laser processing head 10A, and the aforementioned moving mechanism 6 (refer to FIG. 1 ) or the aforementioned moving mechanism 300 (refer to FIG. 1 ). The control unit 9 controls the rotation of the stage 107, the irradiation of the laser light L1 from the laser processing head 10A, and the movement of the focusing position of the laser light L1. The control unit 9 can perform various controls based on the rotation information about the rotation amount of the stage 107 (hereinafter also referred to as [θ information]). The θ information can be obtained from the driving amount of the driving device that rotates the stage 107, and can also be obtained by other sensors, etc. The θ information can be obtained by various known methods.

控制部9係在一邊使載置台107旋轉,一邊使聚光位置位於對象物100之線M2(有效區域R的周緣)上的狀態,依據θ資訊控制雷射加工頭10A之雷射光L1的照射開始及停止,執行沿著有效區域R的周緣形成改質區域的修整處理。修整處理係實現修整加工之控制部9的處理。The control unit 9 controls the start and stop of irradiation of the laser light L1 of the laser processing head 10A according to the θ information while rotating the stage 107 so that the focusing position is located on the line M2 (the periphery of the effective area R) of the object 100, and performs a trimming process to form a modified area along the periphery of the effective area R. The trimming process is a process of the control unit 9 that realizes the trimming process.

控制部9係在不使載置台107旋轉,而使聚光位置位於對象物100之線M3上的狀態,控制雷射加工頭10A之雷射光L1的照射開始及停止,並且使該雷射光L1的聚光位置沿著線M3移動,藉此,執行沿著線M3在去除區域E形成改質區域的放射切削處理。放射切削處理係實現放射切削加工之控制部9的處理。The control unit 9 controls the start and stop of the irradiation of the laser light L1 of the laser processing head 10A without rotating the stage 107, and moves the focusing position of the laser light L1 along the line M3, thereby performing the radial cutting process to form the modified area in the removal area E along the line M3. The radial cutting process is the process of the control unit 9 to realize the radial cutting process.

控制部9係藉由一邊使載置台107旋轉,一邊從雷射加工頭10A照射雷射光L1並且控制聚光位置的Y方向之移動,執行在對象物100的內部沿著假想面M1形成改質區域的剝離處理。剝離處理係實現剝離加工之控制部9的處理。控制部9控制GUI111之顯示。依據從GUI111輸入的各種設定,執行修整處理、放射切削處理及剝離處理。The control unit 9 performs a peeling process to form a modified area along the imaginary surface M1 inside the object 100 by rotating the stage 107 while irradiating the laser light L1 from the laser processing head 10A and controlling the movement of the focusing position in the Y direction. The peeling process is a process of the control unit 9 to realize the peeling process. The control unit 9 controls the display of the GUI 111. According to various settings input from the GUI 111, the trimming process, the radial cutting process and the peeling process are performed.

改質區域的形成及其停止的切換係能以下述的方式達成。例如,在雷射加工頭10A,藉由切換雷射光L1的照射(輸出)的開始及停止(ON/OFF),能夠切換改質區域的形成與該形成的停止。具體而言,在雷射振盪器是以固體雷射器所構成之情況,利用切換設在共振器內的Q開關(AOM(音響光學調變器)、EOM(電氣光學調變器)等)之ON/OFF,高速地切換雷射光L1的照射之開始及停止。在雷射振盪器是以光纖雷射器所構成之情況,利用切換晶種雷射、構成放大器(激發用)雷射器之半導體雷射器的輸出之ON/OFF,高速地切換雷射光L1的照射之開始及停止。在雷射振盪器是使用外部調變元件之情況,利用切換設在共振器外的外部調變元件(AOM、EOM等)之ON/OFF,高速地切換雷射光L1的照射之ON/OFF。The switching of the formation of the modified region and the stopping thereof can be achieved in the following manner. For example, in the laser processing head 10A, by switching the start and stop (ON/OFF) of the irradiation (output) of the laser light L1, the formation of the modified region and the stopping of the formation can be switched. Specifically, in the case where the laser oscillator is composed of a solid laser, the start and stop of the irradiation of the laser light L1 are switched at high speed by switching the ON/OFF of the Q switch (AOM (acoustic optical modulator), EOM (electro-optical modulator), etc.) provided in the resonator. In the case where the laser oscillator is composed of an optical fiber laser, the start and stop of the irradiation of the laser light L1 are switched at high speed by switching the ON/OFF of the output of the seed laser and the semiconductor laser constituting the amplifier (excitation) laser. When the laser oscillator uses an external modulation element, the irradiation of the laser light L1 is switched ON/OFF at high speed by switching the external modulation element (AOM, EOM, etc.) provided outside the resonator ON/OFF.

或者,改質區域的形成及其停止的切換,亦可由下述的方式達成。例如,亦可藉由控制擋門等的機械式機構,開閉雷射光L1的光路,切換改質區域的形成與該形成的停止。亦可藉由將雷射光L1切換成CW光(連續波),使改質區域的形成停止。亦可藉由在反射型空間光調變器34的液晶層,顯示作成為無法將雷射光L1的聚光狀態改質之狀態的圖案(例如,使雷射光散射之緞紋(satin pattern)的圖案),使改質區域的形成停止。亦可藉由控制衰減器等的輸出調整部而使雷射光L1的輸出降低成無法形成改質區域,使改質區域的形成停止。亦可藉由切換偏振光方向,使改質區域的形成停止。亦可藉由將雷射光L1朝光軸以外的方向散射(飛散)而切斷,使改質區域的形成停止。Alternatively, the switching between the formation of the modified area and its stopping can also be achieved in the following manner. For example, the formation of the modified area and the stopping of the formation can be switched by controlling a mechanical mechanism such as a shutter to open and close the optical path of the laser light L1. The formation of the modified area can also be stopped by switching the laser light L1 to CW light (continuous wave). The formation of the modified area can also be stopped by displaying a pattern that is made to be in a state that cannot modify the focusing state of the laser light L1 (for example, a satin pattern that scatters the laser light) on the liquid crystal layer of the reflective spatial light modulator 34. The formation of the modified area can also be stopped by controlling the output adjustment unit such as an attenuator to reduce the output of the laser light L1 to the point where the modified area cannot be formed. The formation of the modified region can also be stopped by switching the polarization direction. The formation of the modified region can also be stopped by scattering (scattering) the laser light L1 in directions other than the optical axis to cut it off.

其次,以下說明關於使用雷射加工裝置101,對對象物100實施修整加工、放射切削加工及剝離加工,取得(製造)半導體裝置的雷射加工方法之一例。Next, an example of a laser processing method for obtaining (manufacturing) a semiconductor device by performing trimming processing, radial cutting processing, and stripping processing on the object 100 using the laser processing device 101 will be described below.

首先,在將背面100b作成為雷射光射入面側之狀態下,將對象物100載置於載置台107上。在對象物100,搭載有功能元件的表面100a側係黏著有支承基板或帶構件而被保護著。First, the object 100 is placed on the mounting table 107 with the back surface 100b being the laser light incident side. The surface 100a of the object 100 on which the functional element is mounted is adhered to a supporting substrate or a tape member for protection.

接著,實施修整加工。在修整加工,藉由控制部9執行修整處理(第1處理)。修整加工包含修整製程(第1製程)。具體而言,在修整加工,如圖11(a)所示,在一邊使載置台107以一定的旋轉速度進行旋轉,一邊使聚光位置P1位於線M2的狀態下,依據θ資訊控制雷射加工頭10A之雷射光L1的照射開始及停止。藉此,如圖11(b)及圖11(c)所示,沿著線M2形成改質區域4。所形成的改質區域4係包含改質點及從改質點延伸的龜裂。Next, the trimming process is performed. In the trimming process, the trimming process (first process) is executed by the control unit 9. The trimming process includes a trimming process (first process). Specifically, in the trimming process, as shown in FIG. 11(a), while the stage 107 is rotated at a certain rotation speed, the focusing position P1 is located on the line M2, and the irradiation start and stop of the laser light L1 of the laser processing head 10A is controlled according to the θ information. Thereby, as shown in FIG. 11(b) and FIG. 11(c), a modified area 4 is formed along the line M2. The formed modified area 4 includes a modified point and a crack extending from the modified point.

接著,實施放射切削加工。在放射切削加工,藉由控制部9執行放射切削處理(第2處理)。放射切削加工包含放射切削製程(第2製程)。具體而言,在放射切削加工,如圖11(b)及圖12(a)所示,不使載置台107旋轉,而從雷射加工頭10A照射雷射光L1,並且使雷射加工頭10A沿著Y軸軌道108移動,讓聚光位置P1沿著線M3a、M3b移動。使載置台107旋轉90度後,不使載置台107旋轉,而從雷射加工頭10A照射雷射光L1,並且使雷射加工頭10A沿著Y軸軌道108移動,讓聚光位置P1沿著線M3c、M3d移動。藉此,如圖12(b)所示,沿著線M3成改質區域4。所形成的改質區域4係包含改質點及從改質點延伸的龜裂。此龜裂可到達表面100a及背面100b中的至少一個,亦可不到達表面100a及背面100b中的中的至少一個。然後,如圖13(a)及圖13(b)所示,例如藉由治具或空氣,以改質區域4作為邊界而將去除區域E切離並去除。Next, radial cutting processing is performed. In radial cutting processing, the control unit 9 executes radial cutting processing (second processing). Radial cutting processing includes a radial cutting process (second process). Specifically, in radial cutting processing, as shown in Figures 11(b) and 12(a), the laser processing head 10A irradiates laser light L1 without rotating the stage 107, and the laser processing head 10A is moved along the Y-axis track 108 so that the focusing position P1 moves along the lines M3a and M3b. After rotating the stage 107 90 degrees, the laser processing head 10A irradiates laser light L1 without rotating the stage 107, and the laser processing head 10A is moved along the Y-axis track 108 so that the focusing position P1 moves along the lines M3c and M3d. Thus, as shown in FIG. 12( b ), a modified region 4 is formed along the line M3. The formed modified region 4 includes a modified point and a crack extending from the modified point. The crack may reach at least one of the surface 100a and the back surface 100b, or may not reach at least one of the surface 100a and the back surface 100b. Then, as shown in FIG. 13( a ) and FIG. 13( b ), the removal region E is cut off and removed with the modified region 4 as a boundary, for example, by a jig or air.

接著,實施剝離加工。具體而言,如圖13(c)所示,一邊使載置台107以一定的旋轉速度旋轉,一邊從雷射加工頭10A照射雷射光L1,並且使雷射加工頭10A沿著Y軸軌道108移動,讓聚光位置P1從假想面M1的外緣側朝內側,沿著Y方向移動。藉此,如圖13(a)及圖13(b)所示,在對象物100的內部沿著假想面M1,形成朝以旋轉軸C(參照圖9)的位置為中心之渦螺狀(漸開線)延伸的改質區域4。所形成的改質區域4包含複數個改質點。Next, the peeling process is performed. Specifically, as shown in FIG13(c), while the stage 107 is rotated at a certain rotation speed, the laser light L1 is irradiated from the laser processing head 10A, and the laser processing head 10A is moved along the Y-axis track 108, so that the focusing position P1 moves from the outer edge side of the imaginary surface M1 to the inner side, along the Y direction. Thereby, as shown in FIG13(a) and FIG13(b), a modified area 4 extending in a spiral shape (asymptotic line) centered on the position of the rotation axis C (see FIG9) is formed inside the object 100 along the imaginary surface M1. The formed modified area 4 includes a plurality of modified points.

接著,如圖14(c)所示,藉由例如吸附治具,以遍及假想面M1改質區域4為邊界,將對象物100的一部分剝離。對象物100的剝離,可在載置台107上實施,亦可移動至剝離專用的區域實施。對象物100的剝離,亦可利用吹氣或膠帶材進行剝離。在僅藉由外部應力無法剝離對象物100的情況,可藉由與對象物100反應的蝕刻液(KOH或TMAH等)選擇性地蝕刻改質區域4。藉此,可容易地剝離對象物100。如圖14(d)所示,對對象物100的剝離面100h,進行精磨或藉由磨石等的研磨材KM之研磨。在藉由蝕刻將對象物100剝離之情況,亦可將該研磨簡單化。進行以上的結果,取得半導體裝置100K。Next, as shown in FIG14(c), a portion of the object 100 is peeled off by, for example, an adsorption jig, with the modified region 4 covering the imaginary surface M1 as the boundary. The peeling of the object 100 can be carried out on the mounting table 107, or it can be moved to an area dedicated to peeling. The peeling of the object 100 can also be carried out by using air blowing or a tape. In the case where the object 100 cannot be peeled off by external stress alone, the modified region 4 can be selectively etched by an etching liquid (KOH or TMAH, etc.) that reacts with the object 100. In this way, the object 100 can be easily peeled off. As shown in FIG. 14( d ), the peeled surface 100h of the object 100 is finely ground or polished with a grinding material KM such as a grindstone. In the case where the object 100 is peeled off by etching, the polishing can also be simplified. As a result of the above, a semiconductor device 100K is obtained.

其次,詳細說明關於修整加工及放射切削加工。Next, the trimming process and radial cutting process are explained in detail.

首先,依據例如藉由攝像部110取得的對象物100的雷射光射入面之圖像,以聚光位置位於雷射光射入面上的方式,藉由控制部9,使雷射加工頭10A沿著Z方向移動,讓聚光部14沿著Z方向移動。以下,將這樣聚光部14對雷射光射入面之對位稱為高度設定,將此時的聚光部14的位置稱為高度位置。在高度設定,可使聚光位置對齊雷射光射入面之中央Ct,亦可使聚光位置對齊修整加工的線M3上。First, based on the image of the laser light incident surface of the object 100 obtained by the imaging unit 110, for example, the laser processing head 10A is moved in the Z direction by the control unit 9 so that the focusing position is located on the laser light incident surface, and the focusing unit 14 is moved in the Z direction. Hereinafter, the alignment of the focusing unit 14 to the laser light incident surface is referred to as height setting, and the position of the focusing unit 14 at this time is referred to as the height position. In the height setting, the focusing position can be aligned with the center Ct of the laser light incident surface, or the focusing position can be aligned with the trimming line M3.

接著,以聚光位置從雷射光射入面起位於修整加工深度(修整加工之形成改質區域4的深度)位置的方式,藉由控制部9,使雷射加工頭10A沿著Z方向移動,讓聚光部14從高度設定位置起朝Z方向移動相當於修整加工深度的距離。此時,將以距離測量感測器36所取得的電壓值作為修整加工用基準電壓值加以記憶。接著,以聚光位置從雷射光射入面起位於放射切削加工深度(放射切削加工之形成改質區域4的深度)位置的方式,藉由控制部9,使雷射加工頭10A沿著Z方向移動,讓聚光部14從高度設定位置起朝Z方向移動相當於放射切削加工的距離。此時,將以距離測量感測器36所取得的電壓值作為放射切削加工用基準電壓值加以記憶。Next, the laser processing head 10A is moved in the Z direction by the control unit 9 so that the focusing position is located at the trimming depth (the depth of the modified area 4 formed by the trimming process) from the laser light incident surface, and the focusing unit 14 is moved in the Z direction from the height setting position by a distance corresponding to the trimming depth. At this time, the voltage value obtained by the distance measurement sensor 36 is stored as a reference voltage value for trimming. Next, the laser processing head 10A is moved in the Z direction by the control unit 9 so that the focusing position is located at the radial cutting depth (the depth of the modified area 4 formed by the radial cutting process) from the laser light incident surface, and the focusing unit 14 is moved in the Z direction from the height setting position by a distance corresponding to the radial cutting process. At this time, the voltage value obtained by the distance measuring sensor 36 is stored as a reference voltage value for radial cutting.

接著,如圖15(b)所示,藉由控制部9執行修整處理(修整製程),在較對象物100的周緣更內側,以聚光位置沿著線M2移動的方式,使雷射加工頭10A移動,在對象物100的內部,沿著線M3形成第1改質區域41。Next, as shown in FIG. 15( b ), the control unit 9 performs trimming processing (trimming process) to move the laser processing head 10A in a manner that the focusing position moves along the line M2 further inward than the periphery of the object 100, thereby forming a first modified area 41 along the line M3 inside the object 100.

在修整處理,一邊以聚光位置沿著線M2移動的方式使雷射加工頭10A移動,一邊以藉由距離測量感測器36所取得的電壓值成為修整加工用基準電壓值的方式,藉由電路部19驅動驅動部18,以追隨雷射光射入面的位移的方式,執行驅動聚光部14之AF追隨。又,藉由電路部19,將實現該AF追隨之驅動部18的控制訊號值亦即測定資料與對象物100的位置資訊(在此為θ位置)相關連並加以取得。在圖中的θ位置,當從雷射光射入面觀看對象物100時,將一方向作為12點鐘方向,將從12點鐘方向朝順時鐘方向前進90°後的方向作為3點鐘方向,將從3點鐘方向朝順時鐘方向前進90°後的方向作為6點鐘方向,將從6點鐘方向朝順時鐘方向前進90°後的方向稱為9點鐘方向。In the trimming process, the laser processing head 10A is moved so that the focusing position moves along the line M2, and the voltage value obtained by the distance measurement sensor 36 becomes a reference voltage value for trimming. The driving unit 18 is driven by the circuit unit 19 to follow the displacement of the laser light incident surface, and AF tracking of driving the focusing unit 14 is performed. In addition, the control signal value of the driving unit 18 that realizes the AF tracking, that is, the measurement data, is correlated with the position information of the object 100 (here, the θ position) by the circuit unit 19 and is obtained. At the θ position in the figure, when viewing the object 100 from the laser light incident surface, one direction is the 12 o'clock direction, the direction 90° from the 12 o'clock direction in the clockwise direction is the 3 o'clock direction, the direction 90° from the 3 o'clock direction in the clockwise direction is the 6 o'clock direction, and the direction 90° from the 6 o'clock direction in the clockwise direction is the 9 o'clock direction.

圖16係顯示與θ位置相關連之測定資料的例子的圖表。如圖16的例子所示,測定資料係能藉由以對象物100的θ位置作為橫軸,以該測定資料作為縱軸之圖表加以顯示。測定資料係記憶於控制部9或電路部19。再者,在線M2形成複數列第1改質區域41的情況之AF追隨,亦可當進行第1列的第1改質區域41的形成時記憶測定資料,當進行第2列以降的第1改質區域41的形成時,利用該測定資料。在第1改質區域41的Z方向的位置未達到AF追隨的測定範圍之情況,亦可最初使聚光位置對於測定範圍內(例如雷射光射入面)後進行AF追隨,再記憶測定資料,利用該測定資料形成該第1改質區域41。該等狀況,在以下的AF追隨也相同。FIG. 16 is a graph showing an example of measurement data associated with the θ position. As shown in the example of FIG. 16, the measurement data can be displayed by a graph with the θ position of the object 100 as the horizontal axis and the measurement data as the vertical axis. The measurement data is stored in the control unit 9 or the circuit unit 19. Furthermore, in the AF tracking of the case where a plurality of rows of the first modified regions 41 are formed on the line M2, the measurement data can be stored when the first modified region 41 of the first row is formed, and the measurement data can be used when the first modified regions 41 of the second row and below are formed. When the position of the first modified area 41 in the Z direction does not reach the measurement range of AF tracking, AF tracking can be performed after the focusing position is initially aligned with the measurement range (e.g., the laser light incident surface), and then the measurement data is stored and used to form the first modified area 41. This is also the case in the following AF tracking.

接著,如圖15(b)及圖17所示,在進行修整處理後,藉由控制部9執行放射切削處理,以聚光位置從對象物100的外部進入到內部及從內部朝外部退出的方式,使雷射加工頭10A沿著線M3a~M3d移動。藉此,在對象物100的去除區域E之內部,沿著線M3a~M3d形成第2改質區域42。Next, as shown in FIG. 15( b) and FIG. 17 , after the trimming process, the control unit 9 performs the radial cutting process, and moves the laser processing head 10A along the lines M3a to M3d in such a manner that the focusing position enters from the outside to the inside of the object 100 and exits from the inside to the outside. Thus, a second modified area 42 is formed inside the removal area E of the object 100 along the lines M3a to M3d.

在放射切削處理,當聚光位置從對象物100的外部進入內部前或進入時,使沿著藉由驅動部18之聚光部14的沿著Z方向之位置,朝依據在修整處理取得的測定資料之初期位置移動。初期位置係為依據在雷射光射入面之線M2與線M3a、M3c之交叉位置的測定資料之位置。在放射切削處理,使聚光部14朝初期位置移動後,當聚光位置位於去除區域E時起,以聚光位置沿著線M3移動的方式,一邊移動雷射加工頭10A,一邊藉由驅動部18進行AF追隨。In the radial cutting process, before or when the focusing position enters the object 100 from the outside to the inside, the position of the focusing unit 14 along the Z direction is moved by the driving unit 18 to the initial position based on the measurement data obtained in the trimming process. The initial position is a position based on the measurement data of the intersection position of the line M2 and the lines M3a and M3c on the laser light incident surface. In the radial cutting process, after the focusing unit 14 is moved to the initial position, when the focusing position is located at the removal area E, the laser processing head 10A is moved in such a manner that the focusing position moves along the line M3, while the driving unit 18 performs AF tracking.

具體而言,例如圖18所示,在放射切削處理,從自對象物100分離加速區間的位置起,開始進行沿著第1直線狀線亦即線M3a之聚光位置的移動。此時,停止(OFF)來自於雷射加工頭10A之雷射光L1的照射。加速區間係為可將聚光位置的移動速度作成一定之助行區間。與此同時,從控制部9或電路部19讀取θ位置為9點鐘方向時之測定資料。將驅動部18的控制訊號作為該測定資料而驅動驅動部18,使聚光部14朝第1初期位置移動。第1初期位置係對應於:在修整處理,聚光位置存在於線M2的9點鐘方向的θ位置時之聚光部14的Z方向的位置。在聚光位置進入到對象物100後,通過斜角部之時間點,開始(ON)進行來自於雷射加工頭10A的雷射光L1之照射。Specifically, as shown in FIG. 18 , in the radial cutting process, the focusing position starts to move along the first straight line, i.e., line M3a, from the position of the acceleration section separated from the object 100. At this time, the irradiation of the laser light L1 from the laser processing head 10A is stopped (OFF). The acceleration section is an auxiliary section that can make the moving speed of the focusing position constant. At the same time, the measurement data when the θ position is at 9 o'clock is read from the control unit 9 or the circuit unit 19. The driving unit 18 is driven by the control signal of the driving unit 18 as the measurement data, so that the focusing unit 14 moves toward the first initial position. The first initial position corresponds to the Z-direction position of the focusing unit 14 when the focusing position is at the θ position at 9 o'clock on the line M2 during the trimming process. After the focusing position enters the object 100 and passes the bevel portion, the irradiation of the laser light L1 from the laser processing head 10A starts (ON).

再者,在圖18,顯示在使聚光位置朝Y方向移動的情況,當從X方向觀看時,該聚光位置位於對象物100的外側及內側時的各種狀態。圖中的左右方向係對應於聚光位置。關於該等狀況,在圖19~圖22也相同。當聚光位置位於對象物100,可將雷射光L1的照射設成ON,但,在此,為了抑制在斜角部的剝蝕,當聚光位置位於斜角部時,將雷射光L1的照射設為OFF。Furthermore, FIG. 18 shows various states when the light-converging position is moved in the Y direction and when viewed from the X direction, the light-converging position is located on the outside and inside of the object 100. The left and right directions in the figure correspond to the light-converging position. The same applies to FIG. 19 to FIG. 22. When the light-converging position is located at the object 100, the irradiation of the laser light L1 can be set to ON. However, in order to suppress the erosion at the bevel portion, the irradiation of the laser light L1 is set to OFF when the light-converging position is located at the bevel portion.

接著,使聚光位置沿著線M3a移動。在此期間,藉由電路部19,將驅動部18的控制訊號以θ位置為9點鐘方向時的測定資料加以維持,將聚光部14的Z方向的位置保持在第1初期位置。以下,將保持聚光部14的Z方向的位置一事亦稱為[AF固定]。當聚光位置到達了去除區域E的徑方向中央時,為了使藉由距離測量感測器36取得的電壓值成為放射切削加工用基準電壓值,藉由電路部19驅動驅動部18。藉此,開始進行以追隨雷射光射入面的位移的方式驅動聚光部14之AF追隨。在圖18,從聚光位置的移動開始到開始進行AF追隨為止的區域係為初期位置保持區域,從開始進行AF追隨後的區域係為追隨區域。又,在聚光位置進入到有效區域R的時間點,將來自於雷射加工頭10A的雷射光L1之照射作成OFF。Next, the focusing position is moved along the line M3a. During this period, the control signal of the driving unit 18 is maintained by the circuit unit 19 with the measurement data when the θ position is at the 9 o'clock direction, and the position of the focusing unit 14 in the Z direction is maintained at the first initial position. Hereinafter, maintaining the position of the focusing unit 14 in the Z direction is also referred to as [AF fixing]. When the focusing position reaches the radial center of the removal area E, in order to make the voltage value obtained by the distance measurement sensor 36 become the reference voltage value for radial cutting processing, the driving unit 18 is driven by the circuit unit 19. In this way, AF tracking of driving the focusing unit 14 in a manner of tracking the displacement of the laser light incident surface is started. In Fig. 18, the area from the start of the movement of the focusing position to the start of AF tracking is the initial position holding area, and the area after the start of AF tracking is the tracking area. When the focusing position enters the effective area R, the irradiation of the laser light L1 from the laser processing head 10A is turned off.

然後,在此狀態時續進行聚光位置的移動,沿著線M3b,使聚光位置從對象物100的內部退出至外部。此時,在聚光位置進入到去除區域E的時間點,將來自於雷射加工頭10A的雷射光L1之照射作成ON,並且藉由驅動部18開始進行AF固定。在此的AF固定,將θ位置為3點鐘方向時的測定資料從控制部9或電路部19讀取,藉由電路部19,將驅動部18的控制訊號作為該測定資料而驅動驅動部18,並且以該測定資料加以維持,保持聚光部14的Z方向的位置。在聚光位置將要從對象物100退出前的時間點,將來自於雷射加工頭10A的雷射光L1之照射作成OFF。再者,在此的AF固定的控制訊號亦可為將要開始進行AF固定前的AF追隨時的控制訊號值,取代θ位置為3點鐘方向時的測定資料。Then, the focusing position is continuously moved in this state, and the focusing position is withdrawn from the inside to the outside of the object 100 along the line M3b. At this time, at the time point when the focusing position enters the removal area E, the irradiation of the laser light L1 from the laser processing head 10A is turned on, and AF fixation is started by the driver 18. In this AF fixation, the measurement data when the θ position is at the 3 o'clock direction is read from the control unit 9 or the circuit unit 19, and the driver 18 is driven by the circuit unit 19 using the control signal of the driver 18 as the measurement data, and the Z direction position of the focusing unit 14 is maintained. At the time point before the focusing position is about to withdraw from the object 100, the irradiation of the laser light L1 from the laser processing head 10A is turned off. Furthermore, the AF fixation control signal here may be a control signal value at the time of AF tracking just before the AF fixation is started, instead of the measurement data when the θ position is at the 3 o'clock direction.

接著,使載置台107旋轉90°,從自對象物100分離加速區間的位置起,開始進行沿著第2直線狀線亦即線M3c之聚光位置的移動。此時,來自於雷射加工頭10A之雷射光L1的照射係停止(OFF)。與此同時,從控制部9或電路部19讀取θ位置為6點鐘方向時之測定資料。將驅動部18的控制訊號作為該測定資料而驅動驅動部18,使聚光部14朝第2初期位置移動。第2初期位置係對應於:在修整處理,聚光位置存在於線M2的6點鐘方向的θ位置時之聚光部14的Z方向的位置。在聚光位置剛進入到對象物100後的時間點,將來自於雷射加工頭10A的雷射光L1之照射作成OFF。接著,使聚光位置沿著線M3a移動,並且在第2初期位置將聚光部14的位置進行AF固定。當聚光位置到達了去除區域E的徑方向中央時,開始進行AF追隨。在聚光位置進入到有效區域R的時間點,將來自於雷射加工頭10A的雷射光L1之照射作成OFF。Next, the stage 107 is rotated 90°, and the focusing position is moved along the second straight line, i.e., line M3c, from the position separating from the object 100 in the acceleration zone. At this time, the irradiation of the laser light L1 from the laser processing head 10A is stopped (OFF). At the same time, the measurement data when the θ position is at the 6 o'clock direction is read from the control unit 9 or the circuit unit 19. The driving unit 18 is driven by the control signal of the driving unit 18 as the measurement data, so that the focusing unit 14 moves toward the second initial position. The second initial position corresponds to the Z-direction position of the focusing unit 14 when the focusing position is at the θ position at the 6 o'clock direction of the line M2 during the trimming process. At the time point just after the focusing position enters the object 100, the irradiation of the laser light L1 from the laser processing head 10A is turned off. Then, the focusing position is moved along the line M3a, and the position of the focusing unit 14 is fixed by AF at the second initial position. When the focusing position reaches the radial center of the removal area E, AF tracking is started. At the time point when the focusing position enters the effective area R, the irradiation of the laser light L1 from the laser processing head 10A is turned off.

然後,在此狀態時續進行聚光位置的移動,沿著線M3d,使聚光位置從對象物100的內部退出至外部。此時,在聚光位置進入到去除區域E的時間點,將來自於雷射加工頭10A的雷射光L1之照射作成ON,並且開始進行AF固定。在此的AF固定,將θ位置為12點鐘方向時的測定資料從控制部9或電路部19讀取,藉由電路部19,將驅動部18的控制訊號作為該測定資料而驅動驅動部18,並且以該測定資料加以維持,保持聚光部14的Z方向的位置。在聚光位置將要從對象物100退出前的時間點,將來自於雷射加工頭10A的雷射光L1之照射作成OFF。再者,在此的AF固定的控制訊號亦可為將要開始進行AF固定前的AF追隨時的控制訊號值,取代θ位置為12點鐘方向時的測定資料。Then, the focusing position is continuously moved in this state, and the focusing position is withdrawn from the inside to the outside of the object 100 along the line M3d. At this time, at the time point when the focusing position enters the removal area E, the irradiation of the laser light L1 from the laser processing head 10A is turned on, and AF fixation is started. In this AF fixation, the measurement data when the θ position is at the 12 o'clock direction is read from the control unit 9 or the circuit unit 19, and the circuit unit 19 drives the drive unit 18 using the control signal of the drive unit 18 as the measurement data, and maintains the position of the focusing unit 14 in the Z direction. At the time point before the focusing position is about to withdraw from the object 100, the irradiation of the laser light L1 from the laser processing head 10A is turned off. Furthermore, the AF fixation control signal here may also be a control signal value at the time of AF tracking just before the AF fixation is started, instead of the measurement data when the θ position is at the 12 o'clock direction.

以上,在本實施形態之雷射加工裝置101及雷射加工方法,當執行放射切削處理以及放射切削製程時,在聚光位置從對象物100的外部進入內部前,藉由驅動部18,使聚光部14朝依據在放射切削處理以及放射切削製程取得的測定資料之初期位置移動。藉此,在例如剛進入後的時間點,比起未考量這樣的初期位置的情況,能夠抑制在輸入於驅動部18的控制訊號產生之過衝(超過目標值)。能夠縮小追隨誤差(Z方向上之聚光部14的位置從追隨雷射光射入面的位移之位置偏移的情況時的該誤差)。亦即,若依據本實施形態,能夠抑制追隨動作對雷射光射入面的位移之精度降低。As described above, in the laser processing device 101 and the laser processing method of the present embodiment, when performing the radial cutting treatment and the radial cutting process, before the focusing position enters the inside of the object 100 from the outside, the focusing portion 14 is moved to the initial position according to the measurement data obtained in the radial cutting treatment and the radial cutting process by the driving portion 18. In this way, at a time point such as just after entering, the overshoot (exceeding the target value) generated in the control signal input to the driving portion 18 can be suppressed compared to the case where such an initial position is not considered. The tracking error (the error when the position of the focusing portion 14 in the Z direction is offset from the position that tracks the displacement of the laser light incident surface) can be reduced. That is, according to this embodiment, it is possible to suppress the reduction in the accuracy of the displacement of the laser light incident surface in the tracking operation.

又,可省略在修整加工後且進行放射切削加工前實施的高度設定,能夠達到手法提升(作業時間的縮短化)。在放射切削加工,加工區域極短,突進到對象物100的聚光位置,沒有充分地消除追隨誤差,即通過加工區域。因此,在放射切削加工,追隨誤差的影響極大。在此情況,有在之後產生未分割或品質不良(崩裂或斷裂)的可能性。因此,能夠抑制追隨動作對雷射光射入面的位移之精度降低的效果,在放射切削加工上尤其有效。In addition, the height setting performed after the trimming process and before the radial cutting process can be omitted, which can achieve a technique improvement (shortening of the operation time). In radial cutting, the processing area is extremely short, and the tracking error is not fully eliminated when advancing to the focusing position of the object 100, that is, passing through the processing area. Therefore, in radial cutting, the influence of the tracking error is extremely large. In this case, there is a possibility of undivided or poor quality (cracks or breaks) occurring later. Therefore, the effect of reducing the accuracy of the displacement of the laser light incident surface due to the tracking action can be suppressed, which is particularly effective in radial cutting.

本實施形態之雷射加工裝置101及雷射加工方法,控制部9係在修整處理,沿著繞著對象物100的周緣之線M2,形成第1改質區域41,在放射切削處理,沿著與線M2交叉的線M3在去除區域E形成第2改質區域42。在此情況,可將對象物100的去除區域E切離而去除。In the laser processing device 101 and the laser processing method of the present embodiment, the control unit 9 forms a first modified area 41 along a line M2 around the periphery of the object 100 in the trimming process, and forms a second modified area 42 in the removal area E along a line M3 intersecting the line M2 in the radial cutting process. In this case, the removal area E of the object 100 can be cut off and removed.

在本實施形態之雷射加工裝置101及雷射加工方法,初期位置係依據測定資料之位置,該測定資料為關於在雷射光射入面之線M2、M3之交叉位置的位移之測定資料。藉此,在將對象物100的去除區域E切離而去除的情況,可進一步抑制追隨動作對雷射光射入面的位移之精度降低。In the laser processing device 101 and the laser processing method of the present embodiment, the initial position is based on the position of the measured data, which is the measured data on the displacement of the intersection position of the lines M2 and M3 on the laser light incident surface. In this way, when the removal area E of the object 100 is cut off and removed, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be further suppressed.

在本實施形態之雷射加工裝置101及雷射加工方法,控制部9係在修整處理,一邊沿著線M2使聚光部14移動,一邊以追隨雷射光射入面的位移方式藉由驅動部18驅動聚光部14。此時,為了追隨雷射光射入面的位移而藉由驅動部18驅動聚光部14的情況之該驅動部18的控制訊號值作為測定資料,並使其與位置資訊相關連且加以記憶。控制部9係在放射切削處理,讀取在修整處理追隨線M2與線M3之交叉位置的位移時之控制訊號值,沿著線M3a,使聚光部14移動,讓聚光位置從對象物100的外部進入內部,在去除區域E形成第2改質區域42,並且,當聚光位置從對象物100的外部進入內部前或進入到內部時,藉由讀取到的該控制訊號值控制驅動部18,使聚光部14朝第1初期位置移動。控制部9係在放射切削處理,讀取在修整處理追隨線M2與線M3c之交叉位置的位移時之控制訊號值,沿著線M3c,使聚光部14移動,讓聚光位置從對象物100的外部進入內部,在去除區域E形成第2改質區域42,並且,當聚光位置從對象物100的外部進入內部前或進入到內部時,藉由讀取到的該控制訊號值控制驅動部,使聚光部14朝第2初期位置移動。藉此,在將對象物100的去除區域E切離而去除的修整加工,可進一步且具體地抑制追隨動作對雷射光射入面的位移之精度降低。In the laser processing device 101 and the laser processing method of the present embodiment, the control unit 9 moves the focusing unit 14 along the line M2 during the trimming process, and drives the focusing unit 14 by the driving unit 18 in a manner that tracks the displacement of the laser light incident surface. At this time, the control signal value of the driving unit 18 when the focusing unit 14 is driven by the driving unit 18 in order to track the displacement of the laser light incident surface is used as measurement data, and is associated with the position information and stored. The control unit 9 reads the control signal value when tracking the displacement of the intersection position of the line M2 and the line M3 in the trimming process during the radial cutting process, and moves the focusing unit 14 along the line M3a so that the focusing position enters the inside from the outside of the object 100, and forms the second modified area 42 in the removal area E. Moreover, before the focusing position enters the inside from the outside of the object 100 or when it enters the inside, the driving unit 18 is controlled by the read control signal value to move the focusing unit 14 toward the first initial position. The control unit 9 reads the control signal value when the intersection position of the tracking line M2 and the line M3c is displaced in the trimming process, and moves the focusing unit 14 along the line M3c so that the focusing position enters the inside from the outside of the object 100, and forms the second modified area 42 in the removal area E. In addition, before or when the focusing position enters the inside from the outside of the object 100, the driving unit is controlled by the read control signal value to move the focusing unit 14 to the second initial position. In this way, in the trimming process of cutting and removing the removal area E of the object 100, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be further and specifically suppressed.

在本實施形態之雷射加工裝置101及雷射加工方法,控制部9係在放射切削處理,使聚光部14朝初期位置移動後,聚光位置位於去除區域E時起,藉由驅動部18驅動聚光部14,使其追隨雷射光射入面的位移。即使以如此的方式,在去除區域E,即使驅動成追隨雷射光射入面的位移的情況,亦可抑制追隨動作對雷射光射入面的位移之精度降低。In the laser processing device 101 and the laser processing method of the present embodiment, the control unit 9 drives the focusing unit 14 to follow the displacement of the laser light incident surface by the driving unit 18 after the focusing position is located at the removal area E after the focusing unit 14 is moved to the initial position during the radiation cutting process. Even in this manner, even if the focusing unit is driven to follow the displacement of the laser light incident surface in the removal area E, the reduction in the accuracy of the displacement of the laser light incident surface due to the following operation can be suppressed.

在本實施形態之雷射加工裝置101及雷射加工方法,使用距離測量感測器36,其係對對象物100照射距離測量用雷射光,檢測關於在雷射光射入面反射的距離測量用雷射光的反射光之資訊。藉此,可利用距離測量用雷射光,使聚光部14追隨雷射光射入面的位移。In the laser processing device 101 and the laser processing method of the present embodiment, the distance measuring sensor 36 is used to irradiate the distance measuring laser light to the object 100 and detect the information about the reflected light of the distance measuring laser light reflected from the laser light incident surface. In this way, the distance measuring laser light can be used to make the focusing unit 14 track the displacement of the laser light incident surface.

再者,本實施形態的AF固定,係包含將聚光部14的Z方向的位置在一定範圍作成可動且加以保持,不限於藉由驅動部18將聚光部14的Z方向的位置完全地固定。也就是在本實施形態的AF固定,不限於將驅動部18的控制訊號作成為一定的控制訊號值。例如如圖19所示,在本實施形態的AF固定,將驅動部18的控制訊號值作成為將修整處理時的測定資料之訊號值與平緩變動的訊號值合成而構成的控制訊號值。即使在此情況,亦可抑制追隨動作對雷射光射入面的位移之精度降低。Furthermore, the AF fixation of the present embodiment includes making the position of the light focusing unit 14 in the Z direction movable and maintained within a certain range, and is not limited to completely fixing the position of the light focusing unit 14 in the Z direction by the driving unit 18. That is, the AF fixation of the present embodiment is not limited to making the control signal of the driving unit 18 a certain control signal value. For example, as shown in FIG. 19, in the AF fixation of the present embodiment, the control signal value of the driving unit 18 is made to be a control signal value composed of the signal value of the measurement data during the trimming process and the signal value of the smoothly changing signal. Even in this case, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be suppressed.

又例如圖20所示,在本實施形態的AF固定,亦可使聚光部14從高度設定位置或其他保持位置平緩地朝初期位置附近移動。亦即,在本實施形態的AF固定,亦可將驅動部18的控制訊號值作成為朝修整處理時的測定資料直線性變大的控制訊號值。再者,在此情況,不限於直線性變大的控制訊號值,可為直線性變小的控制訊號值,亦可為曲線性變化的控制訊號值。即使在此情況,亦可抑制追隨動作對雷射光射入面的位移之精度降低。As another example, as shown in FIG. 20, in the AF fixation of the present embodiment, the focusing unit 14 can be smoothly moved from the height setting position or other holding position to the vicinity of the initial position. That is, in the AF fixation of the present embodiment, the control signal value of the driving unit 18 can be made a control signal value that increases linearly toward the measurement data during the trimming process. Furthermore, in this case, it is not limited to a control signal value that increases linearly, and it can be a control signal value that decreases linearly or a control signal value that changes in a curved manner. Even in this case, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be suppressed.

在本實施形態,亦可為控制部9係在放射切削處理,使聚光部14朝初期位置移動後且聚光位置位於去除區域E的期間,藉由驅動部18,將聚光部14保持在該初期位置。例如圖21所示,在聚光位置位於去除區域E的期間,作成為AF固定,在聚光位置剛進入到有效區域R後作成為AF追隨。即使以如此的方式,在去除區域E,將聚光部14保持在初期位置的情況,亦可抑制追隨動作對雷射光射入面的位移之精度降低。在此情況,當去除區域E為非常狹窄時極為有效。再者,即使在聚光位置進入到有效區域R後,亦可不進行AF追隨而作成為AF固定的狀態。In the present embodiment, the control unit 9 may keep the focusing unit 14 at the initial position by the driving unit 18 after the focusing unit 14 is moved to the initial position by the radiation cutting process and the focusing position is located in the removal area E. For example, as shown in FIG. 21 , the AF is fixed while the focusing position is located in the removal area E, and the AF tracking is performed just after the focusing position enters the effective area R. Even in this manner, when the focusing unit 14 is kept at the initial position in the removal area E, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be suppressed. In this case, it is very effective when the removal area E is very narrow. Furthermore, even after the focusing position enters the effective area R, the AF fixing state may be set without performing AF tracking.

在本實施形態,亦可為控制部9係在放射切削處理,使聚光部14朝初期位置移動後,聚光位置剛進入到對象物100後,藉由驅動部18驅動聚光部14,使其追隨雷射光射入面的位移。例如圖22所示,亦可在聚光位置朝對象物100突入後,立即開始進行AF追隨。AF追隨的開始,可依據聚光位置的座標進行,亦可依據在距離測量感測器36接收到的反射光之光量進行。即使在此情況,亦可抑制追隨動作對雷射光射入面的位移之精度降低。再者,在因對象物100的外緣的斜角部的影響,造成在驅動部18的控制訊號產生大過衝的情況,亦可在聚光位置進入對象物100且剛通過斜角部後,開始進行AF追隨。In this embodiment, the control unit 9 may drive the focusing unit 14 by the driving unit 18 to track the displacement of the laser light incident surface after the focusing position just enters the object 100 after the focusing unit 14 moves toward the initial position during the radiation cutting process. For example, as shown in FIG. 22 , AF tracking may be started immediately after the focusing position enters the object 100. The start of AF tracking may be performed based on the coordinates of the focusing position or based on the amount of reflected light received by the distance measuring sensor 36. Even in this case, the reduction in the accuracy of the displacement of the laser light incident surface due to the tracking operation may be suppressed. Furthermore, even if a large overshoot occurs in the control signal of the driving unit 18 due to the influence of the bevel portion of the outer edge of the object 100, AF tracking may be started just after the object 100 enters the focusing position and passes the bevel portion.

在本實施形態,針對支承於載置台107之對象物100的雷射光射入面的位移,在支承面107a的凹凸及傾斜等占優勢的情況(雷射光射入面本身的平面度較高的情況),當對複數個對象物100實施雷射加工時,亦可取得對最初的第1片對象物100進行修整加工時之測定資料,對第2片以降的對象物100進行修整加工時,使用該測定資料。In the present embodiment, with respect to the displacement of the laser light incident surface of the object 100 supported on the mounting table 107, in the case where the unevenness and inclination of the supporting surface 107a are dominant (the flatness of the laser light incident surface itself is higher), when laser processing is performed on a plurality of objects 100, it is also possible to obtain measurement data when the first first object 100 is trimmed, and use this measurement data when trimming the second and subsequent objects 100.

在本實施形態,亦可藉由高度偏移功能,修正修整加工用基準電壓值及放射切削加工用基準電壓值中的至少一個。在高度偏移功能,例如在距離測量感測器36為同軸的感測器的情況,亦可預先使修整加工用基準電壓值及放射切削加工用基準電壓值與驅動部18的控制訊號的中心值相關連,在進行AF追隨時,因應控制訊號而修正各基準電壓值。在高度偏移功能,例如距離測量感測器36為不同軸的感測器之情況,亦可將與在修整加工形成第1列的第1改質區域41時的聚光位置的Z方向的位置和在放射切削加工形成第1列的第2改質區域42時的聚光位置的Z方向的位置之差量相對應的電壓值,加上放射切削加工用基準電壓值。In this embodiment, at least one of the reference voltage value for trimming and the reference voltage value for radial cutting can be corrected by the height offset function. In the height offset function, for example, when the distance measurement sensor 36 is a coaxial sensor, the reference voltage value for trimming and the reference voltage value for radial cutting can be pre-associated with the center value of the control signal of the drive unit 18, and each reference voltage value can be corrected in response to the control signal when AF tracking is performed. In the height offset function, for example, when the distance measuring sensor 36 is a sensor of a different axis, the voltage value corresponding to the difference between the Z-direction position of the focusing position when the first modified area 41 of the first row is formed by trimming processing and the Z-direction position of the focusing position when the second modified area 42 of the first row is formed by radial cutting processing can be added to the reference voltage value for radial cutting processing.

圖23係顯示第1比較例中,放射切削加工之追隨動作對雷射光射入面的位移之精度的圖表。在圖23中,橫軸係顯示從對象物100的周緣起的聚光位置之沿著線M3的距離。在橫軸,將對象物100的周緣設為0,將對象物100內設為正。縱軸係顯示當將高度設定位置設為0時的Z方向的相對位置亦即相對高度。D1係對應於實際的聚光部14的現在位置之相對高度的資料,D2係對應於驅動部18的控制訊號值之相對高度的資料,D3係對應於雷射光射入面的位移之相對高度的資料。圖23中的說明在圖24~圖26也相同。FIG23 is a graph showing the accuracy of the tracking action of the radial cutting process to the displacement of the laser light incident surface in the first comparative example. In FIG23, the horizontal axis shows the distance along the line M3 of the focusing position from the periphery of the object 100. On the horizontal axis, the periphery of the object 100 is set to 0, and the inside of the object 100 is set to positive. The vertical axis shows the relative position in the Z direction when the height setting position is set to 0, that is, the relative height. D1 is the data of the relative height corresponding to the current position of the actual focusing part 14, D2 is the data of the relative height corresponding to the control signal value of the drive part 18, and D3 is the data of the relative height corresponding to the displacement of the laser light incident surface. The description in FIG. 23 is the same in FIG. 24 to FIG. 26 .

在第1比較例之放射切削加工,在聚光位置進入去除區域E前,在高度設定位置進行AF固定,在聚光位置進入到去除區域E的時間點開始進行AF追隨。如圖23所示,可知在第1比較例之放射切削加工,有在對象物100的緣部產生大幅超過雷射光射入面的位移之控制訊號值的過衝的情況。又,可知對控制訊號值,在聚光部14的現在位置產生延遲,在距離為0mm~10mm的地點,相對高度產生3μm左右的差。可知在去除區域E,追隨誤差大。In the radial cutting process of the first comparative example, AF is fixed at the height setting position before the focusing position enters the removal area E, and AF tracking is started at the time point when the focusing position enters the removal area E. As shown in FIG. 23 , it can be seen that in the radial cutting process of the first comparative example, there is an overshoot of the control signal value that greatly exceeds the displacement of the laser light incident surface at the edge of the object 100. In addition, it can be seen that the control signal value is delayed at the current position of the focusing part 14, and a difference of about 3μm is generated in relative height at a distance of 0mm~10mm. It can be seen that in the removal area E, the tracking error is large.

圖24係顯示第1實施例中,放射切削加工之追隨動作對雷射光射入面的位移之精度的圖表。第1實施例之放射切削加工係為前述本發明的一態樣。在第1實施例之放射切削加工,在聚光位置進入去除區域E前,在依據以修整處理取得的測定資料之初期位置進行AF固定,在進入到去除區域E的時間點開始進行AF追隨。如圖24所示,在第1實施例之放射切削加工,可知即使進行AF追隨,過衝也被大幅地減輕。可知在去除區域E,能夠抑制追隨誤差。FIG24 is a graph showing the accuracy of the tracking action of the radial cutting process to the displacement of the laser light incident surface in the first embodiment. The radial cutting process of the first embodiment is one aspect of the present invention described above. In the radial cutting process of the first embodiment, before the focusing position enters the removal area E, AF fixing is performed at the initial position based on the measurement data obtained by the trimming process, and AF tracking is started at the time point of entering the removal area E. As shown in FIG24, in the radial cutting process of the first embodiment, it can be seen that even if AF tracking is performed, overshoot is greatly reduced. It can be seen that in the removal area E, the tracking error can be suppressed.

圖25係顯示第2比較例中,放射切削加工之追隨動作對雷射光射入面的位移之精度的圖表。在第2比較例之放射切削加工,在聚光位置通過去除區域E而位於對象物100的內部期間,在高度設定位置進行AF固定,在之後的時間點開始進行AF追隨。如圖25所示,在第2比較例之放射切削加工,在去除區域E追隨誤差仍大。FIG. 25 is a graph showing the accuracy of the tracking action of the radial cutting process for the displacement of the laser light incident surface in the second comparative example. In the radial cutting process of the second comparative example, while the focusing position passes through the removal area E and is located inside the object 100, AF fixing is performed at the height setting position, and AF tracking is started at a later time point. As shown in FIG. 25, in the radial cutting process of the second comparative example, the tracking error is still large in the removal area E.

圖26係顯示第2實施例中,放射切削加工之追隨動作對雷射光射入面的位移之精度的圖表。第2實施例之放射切削加工係為前述本發明的一態樣。在第2實施例之放射切削加工,在聚光位置通過去除區域E而直到位於對象物100的內部,在依據以修整處理取得的測定資料之初期位置進行AF固定,在之後的時間點開始進行AF追隨。如圖26所示,得知在第2實施例之放射切削加工,在去除區域E可抑制追隨誤差。FIG. 26 is a graph showing the accuracy of the tracking action of the radial cutting process to the displacement of the laser light incident surface in the second embodiment. The radial cutting process of the second embodiment is one aspect of the present invention. In the radial cutting process of the second embodiment, the AF is fixed at the initial position based on the measurement data obtained by the trimming process until it is located inside the object 100 at the focusing position, and the AF tracking is started at a later time point. As shown in FIG. 26, it is known that in the radial cutting process of the second embodiment, the tracking error can be suppressed by removing the area E.

以上,本發明的一態樣係不限於前述實施形態。As mentioned above, one aspect of the present invention is not limited to the aforementioned implementation forms.

在前述的實施形態及變形例,以執行作為第2處理及第2製程的放射切削處理及放射切削製程之放射切削加工為例進行了說明,但,不限於此。例如,在進行修整加工後,亦可進行在有效區域R的內部形成改質區域之切斷加工。在此情況,第2處理及第2製程係對應於實現切斷加工之處理及製程。In the above-mentioned embodiments and modifications, the radial cutting process of the radial cutting process and the radial cutting process as the second treatment and the second process is described as an example, but it is not limited to this. For example, after the trimming process, the cutting process of forming the modified area inside the effective area R can also be performed. In this case, the second treatment and the second process correspond to the treatment and process for realizing the cutting process.

具體而言,亦可如圖27(a)及圖27(b)所示,控制部9係在實現切斷加工之第2處理,沿著與線M2(參照圖15(a))交叉的直線狀之線M4,在有效區域R(當從雷射光射入面觀看時,對象物100之較第1改質區域41更內側的內側部分)形成第2改質區域42。線M4係以複數個的方式設在對象物100。複數個線M4係至少在有效區域R設定為格子狀。在此情況,作成為自第2改質區域42起的龜裂不易朝對象物100的去除區域E延伸,能在對象物100的有效區域R形成第2改質區域42。Specifically, as shown in FIG. 27(a) and FIG. 27(b), the control unit 9 forms the second modified region 42 in the effective region R (the inner portion of the object 100 that is further inner than the first modified region 41 when viewed from the laser light incident surface) along a straight line M4 that intersects the line M2 (see FIG. 15(a)) in the second process of realizing the cutting process. The lines M4 are provided in the object 100 in a plurality. The plurality of lines M4 are provided in a grid shape at least in the effective region R. In this case, the second modified region 42 can be formed in the effective region R of the object 100 so that the cracks formed from the second modified region 42 are not easily extended toward the removal region E of the object 100.

在此情況之第2處理,初期位置係為依據當使聚光位置沿著一個線M4移動時,在雷射光射入面之線M3與該一個線M4的交叉位置的位移之測定資料的位置。藉此,在以作成自第2改質區域42起的龜裂不易朝去除區域E延伸的方式形成第2改質區域42的情況,可進一步抑制追隨動作對雷射光射入面的位移之精度降低。In the second processing in this case, the initial position is based on the position of the measured data of the displacement of the intersection position of the line M3 of the laser light incident surface and the line M4 when the focusing position is moved along the line M4. In this way, when the second modified area 42 is formed in such a way that the cracks from the second modified area 42 are not easy to extend toward the removal area E, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking operation can be further suppressed.

在如圖27(a)及圖27(b)所示的例子,當形成第2改質區域42時,當雷射光L1的聚光位置位於外緣時,將雷射光L1的照射設為OFF,但,該OFF的區間,是因應可分割對象物100的範圍進行設定,故,不受在修整加工的第1改質區域41的位置影響即可決定。再者,在此情況,亦可不將雷射光L1的照射設為OFF。如圖示,在第2改質區域42超過修整加工之第1改質區域41的範圍而朝外側延伸的情況,有助於對象物100的分割及有效區域R內的第2改質區域42之穩定化。圖示的例子之加工主要對較薄的對象物100之加工有效。In the example shown in FIG. 27(a) and FIG. 27(b), when the second modified area 42 is formed, when the focusing position of the laser light L1 is located at the outer edge, the irradiation of the laser light L1 is set to OFF. However, the OFF interval is set according to the range of the divisible object 100, so it can be determined without being affected by the position of the first modified area 41 in the trimming process. Furthermore, in this case, the irradiation of the laser light L1 may not be set to OFF. As shown in the figure, when the second modified area 42 exceeds the range of the first modified area 41 in the trimming process and extends outward, it helps to divide the object 100 and stabilize the second modified area 42 in the effective area R. The processing of the example shown in the figure is mainly effective for processing thinner objects 100.

或者,亦可在例如進行修整加工後,不進行放射切削加工,而是進行剝離加工。在此情況,第2處理及第2製程係對應於實現剝離加工之處理及製程。具體而言,亦可如圖28(a)及圖28(b)所示,控制部9係在實現剝離加工之第2處理,沿著與對象物100的內部之假想面M1(參照圖10(b)的線M5,形成第2改質區域42。線M5係至設定於有效區域R。線M5係延伸成以對象物100的中心位置為中心之渦螺狀。在此情況之第2處理,初期位置係為關於雷射光射入面的線M2上之第2處理用照射開始θ位置的位移之測定資料。第2處理用照射開始θ位置係為在第2處理開始進行雷射光L1的照射之雷射光射入面的θ軸周圍(在此為如圖9的旋轉軸C周圍)之θ位置。藉此,在剝離加工,可進一步抑制追隨動作對雷射光射入面的位移之精度降低。Alternatively, after the trimming process, for example, instead of performing the radial cutting process, a stripping process may be performed. In this case, the second treatment and the second process correspond to the treatment and process for realizing the stripping process. Specifically, as shown in Figures 28(a) and 28(b), the control unit 9 forms a second modified area 42 along the imaginary surface M1 (refer to the line M5 in Figure 10(b)) with the inside of the object 100 in the second treatment for realizing the stripping process. The line M5 is set to the effective area R. The line M5 extends into a spiral shape centered on the center position of the object 100. In this case, the second treatment is initially The expected position is the measurement data of the displacement of the θ position at the start of the second treatment irradiation on the line M2 of the laser light incident surface. The θ position at the start of the second treatment irradiation is the θ position around the θ axis (here around the rotation axis C in FIG. 9 ) of the laser light incident surface where the laser light L1 is irradiated at the start of the second treatment. In this way, the reduction in the accuracy of the displacement of the laser light incident surface by the tracking action can be further suppressed in the peeling process.

在前述實施形態及變形例,以對象物100的背面100b作為雷射光射入面,但,亦可以對象物100的表面100a作為雷射光射入面。在前述實施形態及變形例,改質區域4亦可為例如形成於對象物100的內部之結晶區域、再結晶區域、吸除區域。結晶區域係維持對象物100的加工前的構造之區域。再結晶區域係暫時蒸發、電漿化或熔融後,再凝固時,作為單結晶或多結晶凝固之區域。吸除區域係發揮將重金屬等的雜質收集並捕獲之吸除效果的區域,可連續地形成,亦可斷續地形成。又,例如亦可為雷射加工裝置能適用於剝蝕電漿等的加工。In the aforementioned embodiments and modifications, the back side 100b of the object 100 is used as the laser light incident surface, but the surface 100a of the object 100 may also be used as the laser light incident surface. In the aforementioned embodiments and modifications, the modified region 4 may also be, for example, a crystallization region, a recrystallization region, or an absorption region formed inside the object 100. The crystallization region is a region that maintains the structure of the object 100 before processing. The recrystallization region is a region that solidifies as a single crystal or multiple crystals when solidifying after temporary evaporation, plasma formation, or melting. The absorption region is a region that exerts an absorption effect to collect and capture impurities such as heavy metals, and may be formed continuously or intermittently. Furthermore, for example, a laser processing device may be applicable to processing such as stripping plasma.

在前述實施形態及變形例,移動機構可使載置台107及雷射加工頭10A中的至少一方移動即可。在前述實施形態及變形例,驅動部18可將載置台107及聚光部14的至少一方沿著Z方向驅動即可。In the above-mentioned embodiments and modifications, the moving mechanism may move at least one of the mounting table 107 and the laser processing head 10A. In the above-mentioned embodiments and modifications, the driving unit 18 may drive at least one of the mounting table 107 and the focusing unit 14 along the Z direction.

在前述實施形態及變形例,在聚光位置從對象物100的外部進入內部前,使藉由驅動部18之聚光部14的沿著Z方向之位置朝初期位置移動,但,亦可為當聚光位置從對象物100的外部進入內部時,使藉由驅動部18之聚光部14的沿著Z方向之位置朝初期位置移動。當聚光位置進入對象物100時一事,係包含聚光位置進入對象物100的時間點、及實質上與其相同的時間點。In the above-mentioned embodiments and modifications, the position of the light-concentrating portion 14 along the Z direction is moved toward the initial position by the driving portion 18 before the light-concentrating portion enters the object 100 from the outside. However, the position of the light-concentrating portion 14 along the Z direction is moved toward the initial position by the driving portion 18 when the light-concentrating portion enters the object 100 from the outside. When the light-concentrating portion enters the object 100 includes the time point when the light-concentrating portion enters the object 100 and the time point substantially the same as the time point.

在前述實施形態及變形例,使用θ位置作為位置資訊,但,亦使用從雷射加工開始時的時間及座標資訊等中的至少一個作為位置資訊,可取代該θ位置,或並用。位置資訊係可得知對象物100的圓周之哪一個位置的資料的資訊即可。在前述實施形態及變形例,省略了在修整加工後且進行放射切削加工前實施的高度設定,但,亦可不省略該高度設定。In the above-mentioned embodiments and modifications, the θ position is used as the position information, but at least one of the time and coordinate information from the start of the laser processing can be used as the position information instead of the θ position or in addition. The position information is information that can be used to know the position of the circumference of the object 100. In the above-mentioned embodiments and modifications, the height setting performed after the trimming process and before the radial cutting process is omitted, but the height setting may not be omitted.

在前述實施形態及變形例,取得作為測定資料之驅動部18的控制訊號(電壓值),但,測定資料未特別限定,可為Z方向之聚光部14的絕對位置,亦可為對高度設定時的位置之相對位置。In the aforementioned embodiments and variations, the control signal (voltage value) of the driving unit 18 is obtained as the measurement data, but the measurement data is not particularly limited and may be the absolute position of the focusing unit 14 in the Z direction or the relative position to the position when the height is set.

在前述實施形態及變形例,關於在例如進行從預定θ方向進入到對象物100之放射切削加工的情況,當使聚光部14位於初期位置時所利用之測定資料,可為以下中的至少一個。 (1)所定θ方向的θ位置之測定資料。 (2)預定θ方向的θ位置的前、後或前後的複數個取樣位置的測定資料之平均值。 (3)將測定資料作為對象物100的圓周上的凹凸近似的圖表或變換成式子之資料。 (4)載置台107的凹凸之資料。 In the above-mentioned embodiments and variations, when radial cutting processing is performed from a predetermined θ direction to the object 100, for example, the measurement data used when the focusing unit 14 is located at the initial position may be at least one of the following. (1) Measurement data of the θ position in the predetermined θ direction. (2) The average value of measurement data of a plurality of sampling positions before, after, or before and after the θ position in the predetermined θ direction. (3) The measurement data is a graph approximating the convexity and concavity on the circumference of the object 100 or data converted into an equation. (4) Data of the concavity and convexity of the mounting table 107.

在前述實施形態及變形例,在修整加工時,一邊照射雷射光L1一邊實施AF追隨而取得測定資料,但,亦可不照射雷射光L1而另外實施AF追隨,取得測定資料。在前述實施形態及變形例,在進行放射切削加工時,若可抑制前述過衝,則可在讀取修整加工時所取得的測定資料後,在依據在該測定資料加減預定值之值,控制驅動部18。In the above-mentioned embodiments and modifications, during trimming, AF tracking is performed while irradiating the laser light L1 to obtain measurement data, but it is also possible to perform AF tracking separately without irradiating the laser light L1 to obtain measurement data. In the above-mentioned embodiments and modifications, during radial cutting, if the above-mentioned overshoot can be suppressed, after reading the measurement data obtained during trimming, the drive unit 18 can be controlled based on the value of adding or subtracting a predetermined value from the measurement data.

前述實施形態及變形例之各結構,不限於前述材料及形狀,能適用各種材料及形狀。又,前述實施形態及變形例之各結構,能夠任意適用於其他實施形態或變形例之各結構。The structures of the aforementioned embodiments and modifications are not limited to the aforementioned materials and shapes, and can be applied to various materials and shapes. In addition, the structures of the aforementioned embodiments and modifications can be arbitrarily applied to the structures of other embodiments or modifications.

1,101:雷射加工裝置 4:改質區域 41:第1改質區域(改質區域) 42:第2改質區域(改質區域) 5,6,200,300,400:移動機構 7:支承部 9:控制部 10A,10B,10C,10D:雷射加工頭(照射部) 14:聚光部(聚光透鏡) 18:驅動部 19:電路部(測定資料取得部) 36:距離測量感測器(測定資料取得部) 55,65,66,305,306,405,406:安裝部 100:對象物 100b:背面(雷射光射入面) 106A:第1Z軸軌道(移動機構) 107:載置台(支承部) 107a:支承面 108:Y軸軌道(移動機構) E:去除區域(周緣部分) L1,L2:雷射光(雷射光) M1:假想面 M2:線(環狀線) M3:線(直線狀線) M3a:線(第1直線狀線) M3c:線(第2直線狀線) M4:線(直線狀線) P1:聚光位置 R:有效區域(內側區域) 1,101: Laser processing device 4: Modified area 41: First modified area (modified area) 42: Second modified area (modified area) 5,6,200,300,400: Moving mechanism 7: Support unit 9: Control unit 10A,10B,10C,10D: Laser processing head (irradiation unit) 14: Focusing unit (focusing lens) 18: Driving unit 19: Circuit unit (measurement data acquisition unit) 36: Distance measurement sensor (measurement data acquisition unit) 55,65,66,305,306,405,406: Mounting unit 100: Object 100b: Back side (laser light incident side) 106A: 1st Z-axis track (moving mechanism) 107: loading platform (supporting part) 107a: supporting surface 108: Y-axis track (moving mechanism) E: removal area (peripheral part) L1, L2: laser light (laser light) M1: imaginary surface M2: line (annular line) M3: line (straight line) M3a: line (1st straight line) M3c: line (2nd straight line) M4: line (straight line) P1: focusing position R: effective area (inner area)

[圖1]係實施形態之雷射加工裝置的斜視圖。 [圖2]係為圖1中所示之雷射加工裝置的一部分之正面圖。 [圖3]係為圖1中所示之雷射加工裝置的雷射加工頭之正面圖。 [圖4]係為圖3中所示之雷射加工頭之側面圖。 [圖5]為圖3中所示之雷射加工頭的光學系統之構成圖。 [圖6]係變形例之雷射加工頭的光學系統之構成圖。 [圖7]係變形例之雷射加工裝置的一部分之正面圖。 [圖8]係變形例之雷射加工裝置的斜視圖。 [圖9]係顯示第1實施形態之雷射加工裝置的概略結構之平面圖。 [圖10(a)]係顯示對象物的例子之平面圖。[圖10(b)]係圖10(a)所示的對象物之側面圖。 [圖11(a)]係用來說明實施形態之雷射加工的對象物之側面圖。[圖11(b)]係顯示圖11(a)後續的對象物之平面圖。[圖11(c)]係圖11(b)所示的對象物之側面圖。 [圖12(a)]係顯示圖11(b)後續的對象物之側面圖。[圖12(b)]係顯示圖12(a)後續的對象物之平面圖。 [圖13(a)]係顯示圖12(b)後續的對象物之平面圖。[圖13(b)]係圖13(a)所示的對象物之側面圖。[圖13(c)]係顯示圖13(b)後續的對象物之側面圖。 [圖14(a)]係顯示圖13(c)後續的對象物之平面圖。[圖14(b)]係圖14(a)所示的對象物之側面圖。[圖14(c)]係顯示圖14(a)後續的對象物之側面圖。[圖14(d)]係顯示圖14(c)後續的對象物之側面圖。 [圖15(a)]係用來說明修整加工的對象物的平面圖。[圖15(b)]係顯示圖15(a)後續的對象物之平面圖。 [圖16]係顯示與位置資訊相關連並加以取得之測定資料的例子的圖表。 [圖17]係用來說明放射切削加工的對象物的平面圖。 [圖18]係顯示在放射切削加工,聚光位置位於對象物的外側及內側時的各種狀態的例子之圖。 [圖19]係顯示在放射切削加工,聚光位置位於對象物的外側及內側時的各種狀態的其他例子之圖。 [圖20]係顯示在放射切削加工,聚光位置位於對象物的外側及內側時的各種狀態的其他例子之圖。 [圖21]係顯示在放射切削加工,聚光位置位於對象物的外側及內側時的各種狀態的其他例子之圖。 [圖22]係顯示在放射切削加工,聚光位置位於對象物的外側及內側時的各種狀態的其他例子之圖。 [圖23]係顯示第1比較例中,放射切削加工之追隨動作對雷射光射入面的位移之精度的圖表。 [圖24]係顯示第1實施例中,放射切削加工之追隨動作對雷射光射入面的位移之精度的圖表。 [圖25]係顯示第2比較例中,放射切削加工之追隨動作對雷射光射入面的位移之精度的圖表。 [圖26]係顯示第2實施例中,放射切削加工之追隨動作對雷射光射入面的位移之精度的圖表。 [圖27(a)]係用來說明切斷加工的對象物的平面圖。[圖27(b)]係顯示圖27(a)後續的對象物之平面圖。 [圖28(a)]係用來說明剝離加工的對象物的平面圖。[圖28(b)]係顯示圖28(a)後續的對象物之平面圖。 [FIG. 1] is an oblique view of a laser processing device of an embodiment. [FIG. 2] is a front view of a portion of the laser processing device shown in FIG. 1. [FIG. 3] is a front view of a laser processing head of the laser processing device shown in FIG. 1. [FIG. 4] is a side view of the laser processing head shown in FIG. 3. [FIG. 5] is a configuration diagram of an optical system of the laser processing head shown in FIG. 3. [FIG. 6] is a configuration diagram of an optical system of a laser processing head of a modified example. [FIG. 7] is a front view of a portion of a laser processing device of a modified example. [FIG. 8] is an oblique view of a laser processing device of a modified example. [FIG. 9] is a plan view showing a schematic structure of the laser processing device of the first embodiment. [FIG. 10(a)] is a plan view showing an example of an object. [Fig. 10(b)] is a side view of the object shown in Fig. 10(a). [Fig. 11(a)] is a side view of the object for explaining the laser processing of the implementation form. [Fig. 11(b)] is a plan view of the object following Fig. 11(a). [Fig. 11(c)] is a side view of the object shown in Fig. 11(b). [Fig. 12(a)] is a side view of the object following Fig. 11(b). [Fig. 12(b)] is a plan view of the object following Fig. 12(a). [Fig. 13(a)] is a plan view of the object following Fig. 12(b). [Fig. 13(b)] is a side view of the object shown in Fig. 13(a). [Figure 13(c)] is a side view of the object following Figure 13(b). [Figure 14(a)] is a plan view of the object following Figure 13(c). [Figure 14(b)] is a side view of the object shown in Figure 14(a). [Figure 14(c)] is a side view of the object following Figure 14(a). [Figure 14(d)] is a side view of the object following Figure 14(c). [Figure 15(a)] is a plan view of the object for explaining trimming. [Figure 15(b)] is a plan view of the object following Figure 15(a). [Figure 16] is a graph showing an example of measurement data associated with position information and acquired. [Figure 17] is a plan view of an object for explaining radial cutting. [Figure 18] is a diagram showing examples of various states when the focusing position is located on the outside and inside of the object during radial cutting. [Figure 19] is a diagram showing other examples of various states when the focusing position is located on the outside and inside of the object during radial cutting. [Figure 20] is a diagram showing other examples of various states when the focusing position is located on the outside and inside of the object during radial cutting. [Figure 21] is a diagram showing other examples of various states when the focusing position is located on the outside and inside of the object during radial cutting. [Figure 22] is a diagram showing other examples of various states when the focusing position is located on the outside and inside of the object during radial cutting. [Figure 23] is a graph showing the accuracy of the displacement of the laser light incident surface by the tracking action of the radial cutting process in the first comparative example. [Figure 24] is a graph showing the accuracy of the displacement of the laser light incident surface by the tracking action of the radial cutting process in the first embodiment. [Figure 25] is a graph showing the accuracy of the displacement of the laser light incident surface by the tracking action of the radial cutting process in the second comparative example. [Figure 26] is a graph showing the accuracy of the displacement of the laser light incident surface by the tracking action of the radial cutting process in the second embodiment. [Figure 27(a)] is a plan view of an object for explaining the cutting process. [Figure 27(b)] is a plan view of the object subsequent to Figure 27(a). [Figure 28(a)] is a plan view of an object used to illustrate the peeling process. [Figure 28(b)] is a plan view showing the object after Figure 28(a).

9:控制部 9: Control Department

10A:雷射加工頭(照射部) 10A: Laser processing head (irradiation part)

14:聚光部(聚光透鏡) 14: Focusing part (focusing lens)

18:驅動部 18: Drive unit

34:反射型空間光調變器 34: Reflective spatial light modulator

36:距離測量感測器(測定資料取得部) 36: Distance measurement sensor (measurement data acquisition unit)

65:安裝部 65: Installation Department

100:對象物 100: Object

100a:表面 100a: Surface

100b:背面(雷射光射入面) 100b: Back side (laser light incident side)

101:雷射加工裝置 101: Laser processing equipment

106A:第1Z軸軌道(移動機構) 106A: 1st Z axis track (moving mechanism)

107:載置台(支承部) 107: Loading table (supporting part)

107a:支承面 107a: Support surface

108:Y軸軌道(移動機構) 108: Y-axis track (moving mechanism)

110:攝像部 110: Camera Department

111:GUI 111:GUI

AC:對準用照相機 AC: Alignment camera

C:旋轉軸 C: Rotation axis

E:去除區域(周緣部分) E: Remove area (peripheral part)

IR:攝像單元 IR: Imaging unit

M3:線(直線狀線) M3: Line (straight line)

R:有效區域(內側區域) R: Effective area (inner area)

Claims (14)

一種雷射加工裝置,係藉由對對象物照射雷射光,在前述對象物的內部形成改質區域,其特徵為具備: 支承部,其係用來支承前述對象物; 照射部,其係對前述對象物,經由聚光透鏡照射前述雷射光; 移動機構,其係使前述支承部及前述照射部中的至少一方移動,讓前述雷射光的聚光位置移動; 驅動部,其係沿著前述聚光透鏡的光軸方向,驅動前述支承部及前述聚光透鏡中的至少一方; 測定資料取得部,其係用來取得關於前述對象物之前述雷射光射入的雷射光射入面的位移、及前述支承部之支承前述對象物的支承面的位移中的至少一個之測定資料;及 控制部,其係控制前述照射部、前述移動機構及前述驅動部, 前述控制部係執行: 第1處理,該第1處理係在較前述對象物的周緣更內側,以使前述聚光位置沿著前述周緣移動的方式使前述支承部及前述照射部中的至少一方移動,沿著前述周緣而在前述對象物的內部形成第1改質區域;及 第2處理,該第2處理係在進行前述第1處理後,以前述聚光位置從前述對象物的外部進入內部的方式使前述支承部及前述照射部中的至少一方移動,在前述對象物的內部形成第2改質區域, 前述測定資料取得部係在前述第1處理,使前述測定資料與關於前述對象物的位置之位置資訊相關連並取得, 前述控制部係在前述第2處理,當前述聚光位置從前述對象物的外部進入內部前或進入時,使沿著藉由前述驅動部之前述支承部及前述聚光透鏡中的至少一方的前述光軸方向之位置,朝依據在前述第1處理取得的前述測定資料之初期位置移動, 前述控制部係 在前述第1處理,沿著繞著前述對象物的周緣之環狀線,形成前述第1改質區域, 在前述第2處理,沿著與前述環狀線交叉的直線狀線,當從前述雷射光射入面觀看時,在前述對象物之從周緣到前述第1改質區域為止的周緣部分,形成前述第2改質區域, 前述初期位置係依據前述測定資料之位置,該測定資料為關於在前述雷射光射入面之前述環狀線與前述直線狀線之交叉位置的位移之測定資料。 A laser processing device forms a modified area inside an object by irradiating the object with laser light, and is characterized by comprising: a support portion for supporting the object; an irradiation portion for irradiating the object with the laser light through a focusing lens; a moving mechanism for moving at least one of the support portion and the irradiation portion to move the focusing position of the laser light; a driving portion for driving at least one of the support portion and the focusing lens along the optical axis direction of the focusing lens; a measurement data acquisition portion for acquiring measurement data on at least one of the displacement of the laser light incident surface of the object on which the laser light is incident and the displacement of the support surface of the support portion supporting the object; and A control unit controls the irradiation unit, the moving mechanism and the driving unit. The control unit performs: a first process, wherein at least one of the support unit and the irradiation unit is moved inwardly from the periphery of the object so that the focusing position moves along the periphery to form a first modified area inside the object along the periphery; and a second process, wherein after performing the first process, at least one of the support unit and the irradiation unit is moved so that the focusing position moves from the outside of the object to the inside to form a second modified area inside the object. The measurement data acquisition unit associates the measurement data with the position information about the position of the object in the first process and acquires the measurement data. The control unit moves the position along the optical axis direction of at least one of the support unit and the focusing lens by the driving unit toward the initial position according to the measurement data obtained in the first processing in the second processing, before or when the focusing position enters the inside of the object from the outside. The control unit forms the first modified area along the annular line around the periphery of the object in the first processing. In the second processing, the second modified area is formed in the peripheral portion of the object from the periphery to the first modified area when viewed from the laser light incident surface along the straight line intersecting the annular line. The aforementioned initial position is based on the position of the aforementioned measurement data, which is the measurement data on the displacement of the intersection position of the aforementioned ring line and the aforementioned straight line before the aforementioned laser light incident surface. 如請求項1的雷射加工裝置,其中, 前述控制部係在前述第1處理,一邊以前述聚光位置沿著前述周緣移動的方式使前述支承部及前述照射部中的至少一方移動,一邊以追隨前述雷射光射入面的位移的方式,藉由前述驅動部驅動前述支承部及前述聚光透鏡中的至少一方, 前述測定資料取得部係在前述第1處理,將為了追隨前述雷射光射入面的位移而藉由前述驅動部驅動前述支承部及前述聚光透鏡中的至少一方的情況之該驅動部的控制訊號值作為前述測定資料,並使其與前述位置資訊相關連且加以記憶, 前述控制部係在前述第2處理, 讀取在前述第1處理追隨前述環狀線與第1直線狀線之交叉位置的位移時之前述控制訊號值, 沿著前述第1直線狀線,使前述支承部及前述照射部中的至少一方移動,讓前述聚光位置從前述對象物的外部進入內部,在前述周緣部分形成前述第2改質區域,並且,當前述聚光位置從前述對象物的外部進入內部前或進入到內部時,藉由讀取到的該控制訊號值控制前述驅動部,使前述支承部及前述聚光透鏡中的至少一方朝第1初期位置移動, 讀取在前述第1處理追隨前述環狀線與第2直線狀線之交叉位置的位移時之前述控制訊號值, 沿著前述第2直線狀線,使前述支承部及前述照射部中的至少一方移動,讓前述聚光位置從前述對象物的外部進入內部,在前述周緣部分形成前述第2改質區域,並且,當前述聚光位置從前述對象物的外部進入內部前或進入到內部時,藉由讀取到的該控制訊號值控制前述驅動部,使前述支承部及前述聚光透鏡中的至少一方朝第2初期位置移動。 A laser processing device as claimed in claim 1, wherein, the control unit moves at least one of the support unit and the irradiation unit in the first processing so that the focusing position moves along the periphery, and drives at least one of the support unit and the focusing lens by the drive unit in a manner that tracks the displacement of the laser light incident surface, the measurement data acquisition unit, in the first processing, uses the control signal value of the drive unit in the case where the drive unit drives at least one of the support unit and the focusing lens in order to track the displacement of the laser light incident surface as the measurement data, and associates it with the position information and stores it, the control unit, in the second processing, The control signal value mentioned above is read when the first processing follows the displacement of the intersection position of the annular line and the first straight line. Move at least one of the support part and the irradiation part along the first straight line so that the focusing position enters the inside from the outside of the object and the second modified area is formed in the peripheral part. Moreover, before or when the focusing position enters the inside from the outside of the object, the driving part is controlled by the control signal value read so that at least one of the support part and the focusing lens moves toward the first initial position. Read the control signal value mentioned above when the first processing follows the displacement of the intersection position of the annular line and the second straight line. At least one of the support part and the irradiation part is moved along the second straight line, so that the focusing position enters the inside of the object from the outside, and the second modified area is formed in the peripheral part. Moreover, before or when the focusing position enters the inside of the object from the outside, the driving part is controlled by the read control signal value, so that at least one of the support part and the focusing lens is moved to the second initial position. 一種雷射加工裝置,係藉由對對象物照射雷射光,在前述對象物的內部形成改質區域,其特徵為具備: 支承部,其係用來支承前述對象物; 照射部,其係對前述對象物,經由聚光透鏡照射前述雷射光; 移動機構,其係使前述支承部及前述照射部中的至少一方移動,讓前述雷射光的聚光位置移動; 驅動部,其係沿著前述聚光透鏡的光軸方向,驅動前述支承部及前述聚光透鏡中的至少一方; 測定資料取得部,其係用來取得關於前述對象物之前述雷射光射入的雷射光射入面的位移、及前述支承部之支承前述對象物的支承面的位移中的至少一個之測定資料;及 控制部,其係控制前述照射部、前述移動機構及前述驅動部, 前述控制部係執行: 第1處理,該第1處理係在較前述對象物的周緣更內側,以使前述聚光位置沿著前述周緣移動的方式使前述支承部及前述照射部中的至少一方移動,沿著前述周緣而在前述對象物的內部形成第1改質區域;及 第2處理,該第2處理係在進行前述第1處理後,以前述聚光位置從前述對象物的外部進入內部的方式使前述支承部及前述照射部中的至少一方移動,在前述對象物的內部形成第2改質區域, 前述測定資料取得部係在前述第1處理,使前述測定資料與關於前述對象物的位置之位置資訊相關連並取得, 前述控制部係在前述第2處理,當前述聚光位置從前述對象物的外部進入內部前或進入時,使沿著藉由前述驅動部之前述支承部及前述聚光透鏡中的至少一方的前述光軸方向之位置,朝依據在前述第1處理取得的前述測定資料之初期位置移動, 前述控制部係 在前述第1處理,沿著繞著前述對象物的周緣之環狀線,形成前述第1改質區域, 在前述第2處理,沿著與前述環狀線交叉的直線狀線,當從前述雷射光射入面觀看時,在前述對象物之較前述第1改質區域更內側的內側部分,形成前述第2改質區域, 較前述第1改質區域更內側的內側部分為有效區域, 前述直線狀線在前述對象物設有複數個, 前述直線狀線在前述有效區域設定為格子狀。 A laser processing device forms a modified area inside an object by irradiating the object with laser light, and is characterized by comprising: a support portion for supporting the object; an irradiation portion for irradiating the object with the laser light through a focusing lens; a moving mechanism for moving at least one of the support portion and the irradiation portion to move the focusing position of the laser light; a driving portion for driving at least one of the support portion and the focusing lens along the optical axis direction of the focusing lens; a measurement data acquisition portion for acquiring measurement data on at least one of the displacement of the laser light incident surface of the object on which the laser light is incident and the displacement of the support surface of the support portion supporting the object; and A control unit controls the irradiation unit, the moving mechanism and the driving unit. The control unit performs: a first process, wherein at least one of the support unit and the irradiation unit is moved inwardly from the periphery of the object so that the focusing position moves along the periphery to form a first modified area inside the object along the periphery; and a second process, wherein after performing the first process, at least one of the support unit and the irradiation unit is moved so that the focusing position moves from the outside of the object to the inside to form a second modified area inside the object. The measurement data acquisition unit associates the measurement data with the position information about the position of the object in the first process and acquires the measurement data. The control unit moves the position along the optical axis direction of at least one of the support unit and the focusing lens by the driving unit toward the initial position according to the measurement data obtained in the first processing in the second processing, before or when the focusing position enters the inside of the object from the outside. The control unit forms the first modified area along the annular line around the periphery of the object in the first processing. In the second processing, the second modified area is formed in the inner part of the object more inner than the first modified area when viewed from the laser light incident surface along the straight line intersecting the annular line. The inner part more inner than the first modified area is the effective area. The aforementioned straight lines are provided in a plurality in the aforementioned object, and the aforementioned straight lines are provided in a grid pattern in the aforementioned effective area. 如請求項3的雷射加工裝置,其中, 前述初期位置係依據前述測定資料之位置,該測定資料為關於在前述雷射光射入面之前述環狀線與前述直線狀線之交叉位置的位移之測定資料。 The laser processing device of claim 3, wherein the initial position is based on the position of the measurement data, which is the measurement data on the displacement of the intersection position of the annular line and the straight line before the laser light incident surface. 一種雷射加工裝置,係藉由對對象物照射雷射光,在前述對象物的內部形成改質區域,其特徵為具備: 支承部,其係用來支承前述對象物; 照射部,其係對前述對象物,經由聚光透鏡照射前述雷射光; 移動機構,其係使前述支承部及前述照射部中的至少一方移動,讓前述雷射光的聚光位置移動; 驅動部,其係沿著前述聚光透鏡的光軸方向,驅動前述支承部及前述聚光透鏡中的至少一方; 測定資料取得部,其係用來取得關於前述對象物之前述雷射光射入的雷射光射入面的位移、及前述支承部之支承前述對象物的支承面的位移中的至少一個之測定資料;及 控制部,其係控制前述照射部、前述移動機構及前述驅動部, 前述控制部係執行: 第1處理,該第1處理係在較前述對象物的周緣更內側,以使前述聚光位置沿著前述周緣移動的方式使前述支承部及前述照射部中的至少一方移動,沿著前述周緣而在前述對象物的內部形成第1改質區域;及 第2處理,該第2處理係在進行前述第1處理後,以前述聚光位置從前述對象物的外部進入內部的方式使前述支承部及前述照射部中的至少一方移動,在前述對象物的內部形成第2改質區域, 前述測定資料取得部係在前述第1處理,使前述測定資料與關於前述對象物的位置之位置資訊相關連並取得, 前述控制部係在前述第2處理,當前述聚光位置從前述對象物的外部進入內部前或進入時,使沿著藉由前述驅動部之前述支承部及前述聚光透鏡中的至少一方的前述光軸方向之位置,朝依據在前述第1處理取得的前述測定資料之初期位置移動, 前述控制部係 在前述第1處理,沿著繞著前述對象物的周緣之環狀線,形成前述第1改質區域, 在前述第2處理,沿著前述對象物的內部之假想面,形成前述第2改質區域, 在前述第2處理,沿著前述對象物的內部的剝離預定面(亦即與前述雷射光射入面相對向的面)上的線,形成前述第2改質區域。 A laser processing device forms a modified area inside an object by irradiating the object with laser light, and is characterized by comprising: a support portion for supporting the object; an irradiation portion for irradiating the object with the laser light through a focusing lens; a moving mechanism for moving at least one of the support portion and the irradiation portion to move the focusing position of the laser light; a driving portion for driving at least one of the support portion and the focusing lens along the optical axis direction of the focusing lens; a measurement data acquisition portion for acquiring measurement data on at least one of the displacement of the laser light incident surface of the object on which the laser light is incident and the displacement of the support surface of the support portion supporting the object; and A control unit controls the irradiation unit, the moving mechanism and the driving unit. The control unit performs: a first process, wherein at least one of the support unit and the irradiation unit is moved inwardly from the periphery of the object so that the focusing position moves along the periphery to form a first modified area inside the object along the periphery; and a second process, wherein after performing the first process, at least one of the support unit and the irradiation unit is moved so that the focusing position moves from the outside of the object to the inside to form a second modified area inside the object. The measurement data acquisition unit associates the measurement data with the position information about the position of the object in the first process and acquires the measurement data. The control unit moves the position along the optical axis direction of at least one of the support unit and the focusing lens by the driving unit toward the initial position according to the measurement data obtained in the first processing, before or when the focusing position enters the inside of the object from the outside, in the second processing. The control unit forms the first modified area along the annular line around the periphery of the object in the first processing, forms the second modified area along the imaginary surface inside the object in the second processing, forms the second modified area along the line on the peeling predetermined surface inside the object (i.e., the surface opposite to the laser light incident surface) in the second processing. 如請求項5的雷射加工裝置,其中, 前述控制部,係將在前述第2處理開始進行前述雷射光的照射之前述雷射光射入面的θ軸周圍之θ位置作為第2處理用照射開始θ位置, 前述初期位置係依據前述測定資料之位置,該測定資料為關於在前述雷射光射入面之前述環狀線的前述第2處理用照射開始θ位置的位移之前述測定資料。 A laser processing device as claimed in claim 5, wherein, the control unit uses the θ position around the θ axis of the laser light incident surface before the laser light is irradiated at the start of the second processing as the θ position for irradiation start of the second processing, the initial position is a position based on the measurement data, which is the measurement data regarding the displacement of the θ position for irradiation start of the second processing of the annular line before the laser light incident surface. 如請求項1至6中任一項的雷射加工裝置,其中, 前述控制部係在前述第2處理,在使前述支承部及前述聚光透鏡中的至少一方朝前述初期位置移動後,當從前述雷射光射入面觀看時,前述聚光位置位於從前述對象物之周緣到前述第1改質區域為止的周緣部分時起,藉由前述驅動部驅動前述支承部及前述聚光透鏡中的至少一方,用以追隨前述雷射光射入面的位移。 A laser processing device as claimed in any one of claims 1 to 6, wherein, the control unit drives at least one of the support unit and the focusing lens to follow the displacement of the laser light incident surface when the focusing position is located at the peripheral portion from the periphery of the object to the first modified area when viewed from the laser light incident surface in the second process after the support unit and the focusing lens are moved toward the initial position. 一種雷射加工裝置,係藉由對對象物照射雷射光,在前述對象物的內部形成改質區域,其特徵為具備: 支承部,其係用來支承前述對象物; 照射部,其係對前述對象物,經由聚光透鏡照射前述雷射光; 移動機構,其係使前述支承部及前述照射部中的至少一方移動,讓前述雷射光的聚光位置移動; 驅動部,其係沿著前述聚光透鏡的光軸方向,驅動前述支承部及前述聚光透鏡中的至少一方; 測定資料取得部,其係用來取得關於前述對象物之前述雷射光射入的雷射光射入面的位移、及前述支承部之支承前述對象物的支承面的位移中的至少一個之測定資料;及 控制部,其係控制前述照射部、前述移動機構及前述驅動部, 前述控制部係執行: 第1處理,該第1處理係在較前述對象物的周緣更內側,以使前述聚光位置沿著前述周緣移動的方式使前述支承部及前述照射部中的至少一方移動,沿著前述周緣而在前述對象物的內部形成第1改質區域;及 第2處理,該第2處理係在進行前述第1處理後,以前述聚光位置從前述對象物的外部進入內部的方式使前述支承部及前述照射部中的至少一方移動,在前述對象物的內部形成第2改質區域, 前述測定資料取得部係在前述第1處理,使前述測定資料與關於前述對象物的位置之位置資訊相關連並取得, 前述控制部係在前述第2處理,當前述聚光位置從前述對象物的外部進入內部前或進入時,使沿著藉由前述驅動部之前述支承部及前述聚光透鏡中的至少一方的前述光軸方向之位置,朝依據在前述第1處理取得的前述測定資料之初期位置移動, 前述控制部係在前述第2處理,在使前述支承部及前述聚光透鏡中的至少一方朝前述初期位置移動後,當從前述雷射光射入面觀看時,前述聚光位置位於從前述對象物之周緣到前述第1改質區域為止的周緣部分時起,藉由前述驅動部驅動前述支承部及前述聚光透鏡中的至少一方,用以追隨前述雷射光射入面的位移。 A laser processing device forms a modified area inside an object by irradiating the object with laser light, and is characterized by comprising: a support portion for supporting the object; an irradiation portion for irradiating the object with the laser light through a focusing lens; a moving mechanism for moving at least one of the support portion and the irradiation portion to move the focusing position of the laser light; a driving portion for driving at least one of the support portion and the focusing lens along the optical axis direction of the focusing lens; a measurement data acquisition portion for acquiring measurement data on at least one of the displacement of the laser light incident surface of the object on which the laser light is incident and the displacement of the support surface of the support portion supporting the object; and A control unit controls the irradiation unit, the moving mechanism and the driving unit. The control unit performs: a first process, wherein at least one of the support unit and the irradiation unit is moved inwardly from the periphery of the object so that the focusing position moves along the periphery to form a first modified area inside the object along the periphery; and a second process, wherein after performing the first process, at least one of the support unit and the irradiation unit is moved so that the focusing position moves from the outside of the object to the inside to form a second modified area inside the object. The measurement data acquisition unit associates the measurement data with the position information about the position of the object in the first process and acquires the measurement data. The control unit moves the position of at least one of the support unit and the focusing lens along the optical axis direction by the driving unit to the initial position according to the measurement data obtained in the first processing before or when the focusing position enters the interior of the object from the exterior. The control unit moves at least one of the support unit and the focusing lens to the initial position in the second processing. When the focusing position is located at the peripheral portion from the periphery of the object to the first modified region when viewed from the laser light incident surface, the driving unit drives at least one of the support unit and the focusing lens to track the displacement of the laser light incident surface. 如請求項1至6中任一項的雷射加工裝置,其中, 前述控制部係在前述第2處理,在使前述支承部及前述聚光透鏡中的至少一方朝前述初期位置移動後,當從前述雷射光射入面觀看時,前述聚光位置位於從前述對象物之周緣到前述第1改質區域為止的周緣部分的期間,藉由前述驅動部將前述支承部及前述聚光透鏡中的至少一方保持在該初期位置。 A laser processing device as claimed in any one of claims 1 to 6, wherein, the control unit, in the second process, moves at least one of the support unit and the focusing lens toward the initial position, and when the focusing position is located in the peripheral portion from the periphery of the object to the first modified area when viewed from the laser light incident surface, at least one of the support unit and the focusing lens is maintained at the initial position by the driving unit. 如請求項1至6、8中任一項的雷射加工裝置,其中, 前述測定資料取得部係具有感測器,該感測器係對前述對象物照射測定光,檢測關於在前述雷射光射入面所反射的前述測定光之反射光的資訊。 A laser processing device as claimed in any one of claims 1 to 6 and 8, wherein the measurement data acquisition unit has a sensor that irradiates the object with measurement light and detects information about reflected light of the measurement light reflected from the laser light incident surface. 一種雷射加工方法,係藉由對對象物照射雷射光,在前述對象物的內部形成改質區域,其特徵為具備: 第1製程,其係在較前述對象物的周緣更內側,以使前述雷射光的聚光位置沿著前述周緣移動的方式使支承前述對象物的支承部及經由聚光透鏡對前述對象物照射前述雷射光之照射部中的至少一方移動,沿著前述周緣而在前述對象物的內部形成第1改質區域;及 第2製程,其係在進行前述第1製程後,以前述聚光位置從前述對象物的外部進入內部的方式使前述支承部及前述照射部中的至少一方移動,在前述對象物的內部形成第2改質區域, 在前述第1製程, 將關於前述對象物之前述雷射光射入的雷射光射入面的位移、及前述支承部之支承前述對象物的支承面的位移之測定資料與關於前述對象物的位置之位置資訊相關連並加以取得, 在前述第2製程, 當前述聚光位置從前述對象物的外部進入內部前或進入時,使沿著藉由驅動部之前述支承部及前述聚光透鏡中的至少一方的前述聚光透鏡之光軸方向之位置,朝依據在前述第1製程取得的前述測定資料之初期位置移動, 在前述第1製程,沿著繞著前述對象物的周緣之環狀線,形成前述第1改質區域, 在前述第2製程,沿著與前述環狀線交叉的直線狀線,當從前述雷射光射入面觀看時,在前述對象物之從周緣到前述第1改質區域為止的周緣部分,形成前述第2改質區域, 前述初期位置係依據前述測定資料之位置,該測定資料為關於在前述雷射光射入面之前述環狀線與前述直線狀線之交叉位置的位移之測定資料。 A laser processing method is to form a modified area inside the object by irradiating the object with laser light, and is characterized by having: A first process, which is to move at least one of a support portion supporting the object and an irradiation portion irradiating the object with the laser light through a focusing lens, further inward than the periphery of the object, so that the focusing position of the laser light moves along the periphery, thereby forming a first modified area inside the object along the periphery; and A second process, which is to move at least one of the support portion and the irradiation portion so that the focusing position moves from the outside of the object to the inside, thereby forming a second modified area inside the object after performing the first process. In the first process, The displacement of the laser light incident surface of the aforementioned object on which the aforementioned laser light is incident and the displacement of the supporting surface of the aforementioned supporting portion supporting the aforementioned object are correlated with the position information about the position of the aforementioned object and obtained. In the aforementioned second process, before or when the aforementioned focusing position enters the interior from the outside of the aforementioned object, the position along the optical axis direction of at least one of the aforementioned supporting portion and the aforementioned focusing lens by the driving portion is moved toward the initial position according to the aforementioned measurement data obtained in the aforementioned first process. In the aforementioned first process, the aforementioned first modified area is formed along a ring line around the circumference of the aforementioned object. In the aforementioned second process, along the straight line intersecting the aforementioned ring line, when viewed from the aforementioned laser light incident surface, the aforementioned second modified area is formed in the peripheral portion of the aforementioned object from the periphery to the aforementioned first modified area. The aforementioned initial position is based on the position of the aforementioned measurement data, which is the measurement data on the displacement of the intersection position of the aforementioned ring line and the aforementioned straight line before the aforementioned laser light incident surface. 一種雷射加工方法,係藉由對對象物照射雷射光,在前述對象物的內部形成改質區域,其特徵為具備: 第1製程,其係在較前述對象物的周緣更內側,以使前述雷射光的聚光位置沿著前述周緣移動的方式使支承前述對象物的支承部及經由聚光透鏡對前述對象物照射前述雷射光之照射部中的至少一方移動,沿著前述周緣而在前述對象物的內部形成第1改質區域;及 第2製程,其係在進行前述第1製程後,以前述聚光位置從前述對象物的外部進入內部的方式使前述支承部及前述照射部中的至少一方移動,在前述對象物的內部形成第2改質區域, 在前述第1製程, 將關於前述對象物之前述雷射光射入的雷射光射入面的位移、及前述支承部之支承前述對象物的支承面的位移之測定資料與關於前述對象物的位置之位置資訊相關連並加以取得, 在前述第2製程, 當前述聚光位置從前述對象物的外部進入內部前或進入時,使沿著藉由前述驅動部之前述支承部及前述聚光透鏡中的至少一方的前述聚光透鏡之光軸方向之位置,朝依據在前述第1製程取得的前述測定資料之初期位置移動, 在前述第1製程,沿著繞著前述對象物的周緣之環狀線,形成前述第1改質區域, 在前述第2製程,沿著與前述環狀線交叉的直線狀線,當從前述雷射光射入面觀看時,在前述對象物之較前述第1改質區域更內側的內側部分,形成前述第2改質區域, 較前述第1改質區域更內側的內側部分為有效區域, 前述直線狀線在前述對象物設有複數個, 前述直線狀線在前述有效區域設定為格子狀。 A laser processing method is to form a modified area inside the object by irradiating the object with laser light, and is characterized by having: A first process, which is to move at least one of a support portion supporting the object and an irradiation portion irradiating the object with the laser light through a focusing lens, further inward than the periphery of the object, so that the focusing position of the laser light moves along the periphery, thereby forming a first modified area inside the object along the periphery; and A second process, which is to move at least one of the support portion and the irradiation portion so that the focusing position moves from the outside of the object to the inside, thereby forming a second modified area inside the object after performing the first process. In the first process, The displacement of the laser light incident surface of the aforementioned object on which the aforementioned laser light is incident and the displacement of the supporting surface of the aforementioned supporting portion supporting the aforementioned object are correlated with the position information about the position of the aforementioned object and obtained. In the aforementioned second process, before or when the aforementioned focusing position enters the interior of the aforementioned object from the exterior, the position along the optical axis direction of at least one of the aforementioned supporting portion and the aforementioned focusing lens through the aforementioned driving portion is moved toward the initial position according to the aforementioned measurement data obtained in the aforementioned first process. In the aforementioned first process, the aforementioned first modified area is formed along a ring line around the circumference of the aforementioned object. In the second process, along the straight line intersecting the annular line, when viewed from the laser light incident surface, the second modified area is formed in the inner part of the object which is inner than the first modified area. The inner part which is inner than the first modified area is the effective area. There are a plurality of straight lines in the object. The straight lines are arranged in a grid pattern in the effective area. 一種雷射加工方法,係藉由對對象物照射雷射光,在前述對象物的內部形成改質區域,其特徵為具備: 第1製程,其係在較前述對象物的周緣更內側,以使前述雷射光的聚光位置沿著前述周緣移動的方式使支承前述對象物的支承部及經由聚光透鏡對前述對象物照射前述雷射光之照射部中的至少一方移動,沿著前述周緣而在前述對象物的內部形成第1改質區域;及 第2製程,其係在進行前述第1製程後,以前述聚光位置從前述對象物的外部進入內部的方式使前述支承部及前述照射部中的至少一方移動,在前述對象物的內部形成第2改質區域, 在前述第1製程, 將關於前述對象物之前述雷射光射入的雷射光射入面的位移、及前述支承部之支承前述對象物的支承面的位移之測定資料與關於前述對象物的位置之位置資訊相關連並加以取得, 在前述第2製程, 當前述聚光位置從前述對象物的外部進入內部前或進入時,使沿著藉由前述驅動部之前述支承部及前述聚光透鏡中的至少一方的前述聚光透鏡之光軸方向之位置,朝依據在前述第1製程取得的前述測定資料之初期位置移動, 在前述第1製程,沿著繞著前述對象物的周緣之環狀線,形成前述第1改質區域, 在前述第2製程,沿著前述對象物的內部之假想面,形成前述第2改質區域, 在前述第2製程,沿著前述對象物的內部的剝離預定面(亦即與前述雷射光射入面相對向的面)上的線,形成前述第2改質區域。 A laser processing method is to form a modified area inside the object by irradiating the object with laser light, and is characterized by having: A first process, which is to move at least one of a support portion supporting the object and an irradiation portion irradiating the object with the laser light through a focusing lens, further inward than the periphery of the object, so that the focusing position of the laser light moves along the periphery, thereby forming a first modified area inside the object along the periphery; and A second process, which is to move at least one of the support portion and the irradiation portion so that the focusing position moves from the outside of the object to the inside, thereby forming a second modified area inside the object after performing the first process. In the first process, The displacement of the laser light incident surface of the aforementioned object on which the aforementioned laser light is incident and the displacement of the supporting surface of the aforementioned supporting portion supporting the aforementioned object are correlated with the position information about the position of the aforementioned object and obtained. In the aforementioned second process, before or when the aforementioned focusing position enters the interior of the aforementioned object from the exterior, the position along the optical axis direction of at least one of the aforementioned supporting portion and the aforementioned focusing lens through the aforementioned driving portion is moved toward the initial position according to the aforementioned measurement data obtained in the aforementioned first process. In the aforementioned first process, the aforementioned first modified region is formed along a ring line around the circumference of the aforementioned object. In the aforementioned second process, the aforementioned second modified region is formed along an imaginary surface inside the aforementioned object. In the aforementioned second process, the aforementioned second modified area is formed along a line on the predetermined peeling surface inside the aforementioned object (i.e., the surface opposite to the aforementioned laser light incident surface). 一種雷射加工方法,係藉由對對象物照射雷射光,在前述對象物的內部形成改質區域,其特徵為具備: 第1製程,其係在較前述對象物的周緣更內側,以使前述雷射光的聚光位置沿著前述周緣移動的方式使支承前述對象物的支承部及經由聚光透鏡對前述對象物照射前述雷射光之照射部中的至少一方移動,沿著前述周緣而在前述對象物的內部形成第1改質區域;及 第2製程,其係在進行前述第1製程後,以前述聚光位置從前述對象物的外部進入內部的方式使前述支承部及前述照射部中的至少一方移動,在前述對象物的內部形成第2改質區域, 在前述第1製程, 將關於前述對象物之前述雷射光射入的雷射光射入面的位移、及前述支承部之支承前述對象物的支承面的位移之測定資料與關於前述對象物的位置之位置資訊相關連並加以取得, 在前述第2製程, 當前述聚光位置從前述對象物的外部進入內部前或進入時,使沿著藉由前述驅動部之前述支承部及前述聚光透鏡中的至少一方的前述聚光透鏡之光軸方向之位置,朝依據在前述第1製程取得的前述測定資料之初期位置移動, 在前述第2製程,在使前述支承部及前述聚光透鏡中的至少一方朝前述初期位置移動後,當從前述雷射光射入面觀看時,前述聚光位置位於從前述對象物之周緣到前述第1改質區域為止的周緣部分的期間,藉由前述驅動部將前述支承部及前述聚光透鏡中的至少一方保持在該初期位置。A laser processing method is to form a modified area inside the object by irradiating the object with laser light, and is characterized by having: A first process, which is to move at least one of a support portion supporting the object and an irradiation portion irradiating the object with the laser light through a focusing lens, further inward than the periphery of the object, so that the focusing position of the laser light moves along the periphery, thereby forming a first modified area inside the object along the periphery; and A second process, which is to move at least one of the support portion and the irradiation portion so that the focusing position moves from the outside of the object to the inside, thereby forming a second modified area inside the object after performing the first process. In the first process, The displacement of the laser light incident surface of the aforementioned object on which the aforementioned laser light is incident and the displacement of the supporting surface of the aforementioned supporting portion supporting the aforementioned object are correlated with the position information about the position of the aforementioned object and obtained. In the aforementioned second process, before or when the aforementioned focusing position enters the interior of the aforementioned object from the exterior, the position along the optical axis direction of at least one of the aforementioned supporting portion and the aforementioned focusing lens through the aforementioned driving portion is moved toward the initial position according to the aforementioned measurement data obtained in the aforementioned first process. In the aforementioned second process, after at least one of the aforementioned support portion and the aforementioned focusing lens is moved toward the aforementioned initial position, when viewed from the aforementioned laser light incident surface, the aforementioned focusing position is located in the peripheral portion from the periphery of the aforementioned object to the aforementioned first modified area, and at least one of the aforementioned support portion and the aforementioned focusing lens is maintained at the initial position by the aforementioned driving portion.
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