TWI878827B - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

A substrate processing apparatus (100) includes a substrate holding section (13) and a removal member (151). The substrate holding section (13) rotates a substrate W in which a liquid repellent material capable of repelling a processing liquid is attached to at least a main body surface peripheral part (501) and an edge surface (51) of the substrate W. During rotation of the substrate W, the removal member (151) contacts at least the main body surface peripheral part (501) of the substrate W while being separated from a side part (515) of the edge surface (51) in a radial direction RD of the substrate W to bring a remover capable of removing the liquid repellent material into contact with the liquid repellent material attached to the main body surface peripheral part (501). The main body surface peripheral part (501) of the substrate W is a peripheral area of a surface (A1) of a substrate main body (50). The edge surface (51) of the substrate W is an edge area located more outside in the radial direction RD than the substrate main body (50).

Description

Substrate processing device and substrate processing method

The present invention relates to a substrate processing device and a substrate processing method.

The substrate processing device described in Patent Document 1 applies a liquid coating agent to the periphery of the substrate, and covers the dust attached to the periphery of the substrate with the liquid coating agent. Furthermore, by hardening the coating agent covering the dust attached to the periphery of the substrate, the dust is captured inside the hardened coating agent. Therefore, the dust can be removed from the periphery of the substrate by removing the coating agent from the periphery of the substrate. Furthermore, since a photoresist is applied to the front surface of the substrate after the coating agent is applied to the periphery of the substrate, the photoresist is applied on the coating agent in the periphery of the substrate. Therefore, when the coating agent is removed from the periphery of the substrate, the photoresist coated on the coating agent is also removed from the periphery of the substrate together with the coating agent. In this way, the dusty photoresist can be removed from the periphery of the substrate at the same time.

[Prior Art Literature] [Patent Literature]

[Patent document 1] Japanese Patent Publication No. 2013-74126

However, in the substrate processing device of Patent Document 1, the removal mechanism uses nitrogen to blow away the coating agent and removes the photoresist together with the coating agent. Therefore, all the coating agents attached to the substrate are removed. On the other hand, the inventor of this application has repeatedly conducted in-depth research on the repellent substance that can repel the processing liquid, and only removes the excess repellent substance.

The present invention is completed in view of the above-mentioned problems, and its purpose is to provide a substrate processing device and a substrate processing method that can remove only the excess repellent substances from the substrate.

According to one aspect of the present invention, a substrate processing device includes a substrate holding portion and a removal member. The substrate holding portion holds and rotates a substrate having a repellent substance that repels a processing liquid attached to at least the peripheral portion and end portion of the front surface of the body. During the rotation of the substrate, the removal member is separated from the radial side portion in the end portion of the substrate and contacts at least the peripheral portion of the front surface of the body of the substrate, thereby allowing a removal agent that can remove the repellent substance to contact the repellent substance attached to the peripheral portion of the front surface of the body. The peripheral portion of the front surface of the body of the substrate refers to the peripheral area in the front surface of the substrate body. The end portion of the substrate refers to the end surface area that is radially more outward than the substrate body.

In one aspect of the present invention, the removal member preferably includes a first contact portion and a second contact portion. The first contact portion is preferably separated from the side surface of the substrate during the rotation of the substrate and is in contact with at least the peripheral portion of the front surface of the main body of the substrate, so that the removal agent contacts the liquid-repellent substance attached to the peripheral portion of the front surface of the main body. The second contact portion is preferably separated from the side surface of the substrate during the rotation of the substrate and is in contact with at least the peripheral portion of the back surface of the main body of the substrate, so that the removal agent contacts the liquid-repellent substance attached to the peripheral portion of the back surface of the main body. The peripheral portion of the back side of the main body of the above-mentioned substrate preferably refers to the peripheral area on the back side of the above-mentioned substrate main body.

In one aspect of the present invention, the first contact portion preferably includes a first outer contact portion and a first inner contact portion. The first outer contact portion preferably contacts the front peripheral portion of the body during the rotation of the substrate, so that the remover contacts the liquid-repellent substance attached to the front peripheral portion of the body. The first inner contact portion preferably contacts the front edge of the end face portion of the substrate disposed inside the first outer contact portion and contacts the front edge of the substrate during the rotation of the substrate, so that the remover contacts the liquid-repellent substance attached to the front edge. The front edge of the end face is preferably represented on the front side of the substrate, and is located in a region of the end face that is radially outward of the front peripheral portion of the body, and is located in a region that is radially inward of the side face. The second contact portion preferably includes a second outer contact portion and a second inner contact portion. The second outer contact portion is preferably in contact with the back peripheral portion of the body of the substrate during the rotation of the substrate, so that the remover contacts the liquid-repellent substance attached to the back peripheral portion of the body. The second inner contact portion is preferably arranged on the inner side of the second outer contact portion and contacts the back edge portion of the end face portion of the substrate during the rotation of the substrate, so that the remover contacts the liquid-repellent material attached to the back edge portion. The back edge portion of the end face portion is preferably represented on the back side of the substrate, in an area of the end face portion that is radially outward of the back peripheral portion of the body, and in an area that is radially inward of the side face portion.

In one aspect of the present invention, the first outer contact portion preferably has a flat surface in contact with the front peripheral portion of the main body. The first inner contact portion preferably has an inclined surface in contact with the front peripheral portion. The second outer contact portion preferably has a flat surface in contact with the back peripheral portion of the main body. The second inner contact portion preferably has an inclined surface in contact with the back peripheral portion.

In one aspect of the present invention, it is preferred that the interval between the first inner contact portion and the second inner contact portion is scalable.

In one aspect of the present invention, it is preferred that the substrate processing device further has an inert gas ejection unit. The inert gas ejection unit preferably ejects the inert gas from between the first contact unit and the second contact unit.

In one aspect of the present invention, it is preferred that the removal member is separated from the side surface of the substrate and is in contact with at least the peripheral portion of the front surface of the main body while rotating.

In one aspect of the present invention, it is preferred that at least a portion of the removal member enters the recess existing in the end surface portion of the substrate and contacts the bottom point of the recess.

In one aspect of the present invention, it is preferred that the substrate processing device further has a force-applying mechanism. The force-applying mechanism is preferably configured to apply force to the removal member inwardly of the diameter of the substrate.

In one aspect of the present invention, it is preferred that the substrate processing device further has a removing agent supply unit. The removing agent supply unit preferably supplies the removing agent to the removing component.

According to another aspect of the present invention, a substrate processing method uses a removal member that allows a removal agent capable of removing a repellent substance to contact the repellent substance. The substrate processing method includes the following steps: holding a substrate having the repellent substance attached to at least the front peripheral portion and the end surface portion of the body and rotating the substrate; and during the rotation of the substrate, separating the removal member from a radial side portion in the end surface portion of the substrate and allowing the removal member to contact at least the front peripheral portion of the body of the substrate, thereby allowing the removal agent to contact the repellent substance attached to the front peripheral portion of the body. The front peripheral portion of the body of the substrate refers to a peripheral area in the front of the substrate body. The above-mentioned end surface portion of the above-mentioned substrate refers to the end surface area which is closer to the outside than the above-mentioned substrate body.

In one aspect of the present invention, the removal member preferably includes a first contact portion and a second contact portion arranged at intervals in a fixed direction. In the step of making the removal agent contact the liquid-repellent substance, it is preferred to perform a first contact action and a second contact action. The first contact action is preferably an action in which the first contact portion is spaced apart from the side surface of the substrate during the rotation of the substrate, and the first contact portion is made to contact at least the front peripheral portion of the main body of the substrate, thereby making the removal agent contact the liquid-repellent substance attached to the front peripheral portion of the main body. The second contact action is preferably to separate the second contact portion from the side surface of the substrate during the rotation of the substrate, and to make the second contact portion contact at least the peripheral portion of the back surface of the substrate body, thereby making the remover contact the liquid-repellent material attached to the peripheral portion of the back surface of the substrate body. The peripheral portion of the back surface of the substrate body preferably refers to the peripheral area on the back surface of the substrate body.

In one aspect of the present invention, the first contact portion preferably includes a first outer contact portion and a first inner contact portion disposed inside the first outer contact portion. In the step of making the remover contact the liquid-repellent substance, it is preferred to perform a first body contact action and a first end face contact action as the first contact action. The first body contact action is preferably an action in which the first outer contact portion contacts the peripheral portion of the front surface of the body during the rotation of the substrate, thereby making the remover contact the liquid-repellent substance attached to the peripheral portion of the front surface of the body. The first end face contacting action is preferably an action of making the first inner contact part contact the front edge of the end face of the substrate during the rotation of the substrate, so that the remover contacts the liquid-repellent substance attached to the front edge. The front edge of the end face is preferably a region on the front side of the substrate, located radially outward from the front peripheral portion of the body, and radially inward from the side face. The second contact part preferably includes a second outer contact part and a second inner contact part disposed on the inner side of the second outer contact part. In the step of bringing the remover into contact with the repellent substance, it is preferred to perform a second body contacting action and a second end surface contacting action as the second contacting action. The second body contacting action is preferably an action of bringing the remover into contact with the repellent substance attached to the periphery of the back side of the body by bringing the second outer contact portion into contact with the periphery of the back side of the body of the substrate during the rotation of the substrate. The second end face contacting action is preferably an action in which the second inner side contacting portion contacts the back edge of the end face portion of the substrate during the rotation of the substrate, so that the remover contacts the liquid-repellent material attached to the back edge. The back edge of the end face portion is preferably a region on the back side of the substrate, located in a region of the end face portion that is radially outward of the back peripheral portion of the body, and radially inward of the side face portion.

In one aspect of the present invention, the first outer contact portion preferably has a flat surface in contact with the front peripheral portion of the main body. The first inner contact portion preferably has an inclined surface in contact with the front peripheral portion. The second outer contact portion preferably has a flat surface in contact with the back peripheral portion of the main body. The second inner contact portion preferably has an inclined surface in contact with the back peripheral portion.

In one aspect of the present invention, it is preferred that the interval between the first inner contact portion and the second inner contact portion is scalable.

In one aspect of the present invention, it is preferred that in the step of bringing the remover into contact with the repellent substance, an inert gas is sprayed from between the first contact portion and the second contact portion.

In one aspect of the present invention, it is preferred that in the step of making the remover contact the repellent substance, the removal member is separated from the side surface of the substrate, and the removal member is rotated while at least contacting the peripheral portion of the front surface of the main body.

In one aspect of the present invention, it is preferred that in the step of bringing the remover into contact with the repellent substance, at least a portion of the removal member enters the recess existing in the end surface portion of the substrate and contacts the bottom point of the recess.

In one aspect of the present invention, it is preferred that in the step of bringing the remover into contact with the repellent substance, the removal member is forced radially inwardly toward the substrate.

In one aspect of the present invention, it is preferred that the substrate processing method further includes the step of supplying the above-mentioned removal agent to the above-mentioned removal component.

According to the present invention, only the excess repellent material can be removed from the substrate.

1: Processing unit

2: Control device

2R: Diameter

3: Fluid box

4: Liquid medicine cabinet

5: Repellent treatment unit

7: Use the nozzle from the front

8: Use a spray nozzle on the back

11: Chamber

13: Rotating chuck (substrate holding part)

15: Mechanism for removing liquid-repellent substances

17: Remover supply unit

19: Liquid receiving part

20: Heating section

21: Control Department

22: Memory Department

31: Lotion application department

33: Cleaning fluid supply unit

35: Inert gas supply unit

41: 1st non-contact part

42: Second non-contact part

43,43d: 1st inclined contact part

44,44d: Second inclined contact part

50: Substrate body

51: End face

52: Notch

55: 1st interlocking part

56: Second interlocking part

71: Upper surface

72: Inner upper surface

74: Inner Surface

75: Outer surface

81: Repellent

82,85: Dispelling substances

86: Cleaning fluid

87:Removal agent

91: Upper surface

92: Inner upper surface

94: Inner Surface

95: Outer surface

100: Substrate processing device

131: Rotation axis

132: Rotating base

133: Rotary motor

151,151A~151D: Brush (removal of components)

152: Swinging arm

153: Shaking mechanism

154: Lifting mechanism

155: Arm base axis

156: Arm body

157: Support shaft

158: Rotation mechanism

159: Force applying mechanism

160: Brush motor

161: shaft

161a: Opposite shaft

171: Remover nozzle

172: Valve

173: Piping

181,182: Sliders

185,186:Entity

311: Lotion spray nozzle

312: Arm

313: Rotating shaft

314: Nozzle moving mechanism

315: Valve

316: Piping

331: Cleaning fluid nozzle

332,351: Valve

333,352: Piping

353: Inert gas ejection unit

501: The front edge of the body

502: The back edge of the body

511: Front edge

512: Front shoulder

513: Back edge

514: Back shoulder

515: Lateral face

a1: upper area

a2: Lower area

A1: Front

A2: Back

AD: Axial

AX1,AX2: Rotation axis

AX3: rocking axis

b1: lower area

b2: upper area

B1: 1st contact part

B2: Second contact part

B11: 1st outer contact part

B11c: 1st outer contact

B12, B12a, B12c, B12d: 1st inner contact

B13: Inclined surface

B14: Flat surface

B15: 1st contact surface

B16: Second contact surface

B21: 2nd outer contact part

B21c: 2nd outer contact part

B22, B22a, B22c, B22d: Second inner contact part

B23: Inclined surface

B24: Flat surface

B25: 1st contact surface

B26: Second contact surface

BM: bottom point

C1: 1st fixed part

C2: Second fixed part

CD: Circumferential

CR: Center Robot

d:Thickness

D: Depth

D1: Rotation direction

DA: Direction

GP1,GP2,GP3,GP4: Gap

IR:Transmitter robot

L: Width

L0, L1, L2: length

LP: Loading port

M1,M2,N1,N2: Area

MX1: Largest part

P1: Remove position

P2: Standby position

P3: Painting location

P4: Standby position

PL: imaginary plane

R: Radius

R0: Radius of curvature

RD,RDa: radial direction

Rmx: Radius

Rw: Radius

S1~S13: Steps

S100,S200,S300,S400,S500: Steps

S1000: Step 1

S2000: Step 2

SP1,SP2: Inner space

TW:Tower

W: Substrate

θ: center angle

θ1: Tilt angle

θ2: Tilt angle

FIG1 is a top view showing the interior of a substrate processing device according to an embodiment of the present invention.

FIG. 2 is a top view showing the interior of the repellent treatment unit of this embodiment.

FIG3 is a side view showing the interior of the repellent treatment unit of this embodiment.

FIG4 is a cross-sectional view showing the substrate of this embodiment.

FIG5 is a top view showing a portion of the substrate of this embodiment.

FIG6 is a diagram showing the front section of the method for removing liquid-repellent substances in this embodiment.

FIG. 7 is a diagram showing the latter stage of the method for removing the repellent substance of this embodiment.

Figure 8 is a side view of the brush of this embodiment.

FIG. 9 is a diagram showing an example of the removal process of the liquid-repellent substance of the brush of this embodiment.

FIG. 10 is a diagram showing an example of the removal of liquid-repellent substances from a brush in a variation of the present embodiment.

FIG. 11 is a diagram showing an example of a process for removing liquid-repellent substances from a brush in another variation of the present embodiment.

FIG12 is a flow chart showing the substrate processing method of this embodiment.

FIG. 13 is a top view of the substrate of this embodiment.

Figure 14 is a top view showing the state of the brush contacting the recess in this embodiment.

Figure 15 is a top view showing the brush and recess of this embodiment.

FIG16 is a cross-sectional view showing the brush of the first variation of the present embodiment.

FIG. 17 is a diagram showing the first step of removing the liquid-repellent substance from the brush of the first variation.

FIG. 18 is a diagram showing the second step of the process of removing the liquid-repellent substance from the brush of the first variation.

FIG. 19 is a diagram showing an example of the removal process of the liquid-repellent substance of the brush in the second variation of this embodiment.

Hereinafter, the implementation form of the present invention will be described with reference to the drawings. In addition, the same reference symbols are used for the same or equivalent parts in the drawings without repetitive description. In addition, in the drawings, the X-axis, Y-axis, and Z-axis are appropriately illustrated for easy understanding. The X-axis, Y-axis, and Z-axis are orthogonal to each other, the X-axis and Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction. In addition, "top view" means observing the object from the vertical above. In addition, "top view" means the diagram when observing the object from the vertical above.

Referring to FIG. 1 to FIG. 12 , a substrate processing device 100 according to an embodiment of the present invention is described. First, referring to FIG. 1 , the substrate processing device 100 is described. FIG. 1 is a top view showing the interior of the substrate processing device 100. The substrate processing device 100 shown in FIG. 1 processes a substrate W. In the substrate W, for example, a pattern including a plurality of structures is formed.

The substrate W is, for example, a semiconductor wafer (e.g., a silicon wafer), a substrate for a liquid crystal display device, a substrate for a plasma display, a substrate for a field emission display (FED), a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a mask, a ceramic substrate, or a substrate for a solar cell. In the following, as an example, the substrate W is a silicon wafer.

As shown in FIG. 1 , the substrate processing device 100 has a plurality of loading ports LP, a carrier robot IR, a central robot CR, a plurality of processing units 1, a control device 2, a plurality of fluid tanks 3, a chemical liquid tank 4, and a repellent processing unit 5.

Each loading port LP stores a plurality of substrates W by stacking them. The carrier robot IR transfers the substrates W between the loading port LP and the central robot CR. The central robot CR transfers the substrates W between the carrier robot IR and the processing unit 1, between the carrier robot IR and the repellent processing unit 5, or between the processing unit 1 and the repellent processing unit 5. The repellent processing unit 5 applies a repellent on the substrate W. The repellent is a liquid containing a repellent substance that repels the processing liquid. Furthermore, the repellent processing unit 5 removes excess repellent substances from the repellent substances attached to the substrate W. The details of the repellent processing unit 5 will be described later.

Each processing unit 1 processes the substrate W with a processing liquid. Each processing unit 1 is a single-chip device that processes the substrate W piece by piece. Specifically, the processing unit 1 includes a front nozzle 7 and a back nozzle 8. The front nozzle 7 supplies the processing liquid to the front of the substrate W, which is one of the front (upper surface) and the back (lower surface) of the substrate W, to process the front of the substrate W. The back nozzle 8 supplies the processing liquid to the back of the substrate W, to process the back of the substrate W.

The treatment liquid is a chemical liquid or a cleaning liquid. The chemical liquid is a liquid used to treat the substrate W. The chemical liquid is, for example, diluted hydrofluoric acid (DHF), hydrofluoric acid (HF), buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), phosphoric acid (H ₃ PO ₄ ), sulfuric acid, acetic acid, nitric acid, hydrochloric acid, ammonia water, hydrogen peroxide, organic acid (e.g., citric acid, oxalic acid), organic base (e.g., TMAH: tetramethylammonium hydroxide), ammonia hydrogen peroxide mixture (SC1), hydrochloric acid hydrogen peroxide mixture (SC2), isopropyl alcohol (IPA), surfactant, or preservative.

The cleaning liquid is a liquid used to rinse the chemical solution, byproducts after the chemical solution is processed, and/or foreign matter from the substrate W. The cleaning liquid is, for example, deionized water (DIW), carbonated water, electrolyzed ionized water, hydrogen water, ozone water, or hydrochloric acid water of dilute concentration (for example, about 10ppm~100ppm).

A prescribed number of processing units 1 (three processing units 1 in the example of FIG. 1 ) are stacked in the vertical direction to form one tower TW. However, in the example of FIG. 1 , one of the plurality of towers TW (four towers TW in the example of FIG. 1 ) includes one repellent processing unit 5 instead of one processing unit 1. The plurality of towers TW are arranged so as to surround the central robot CR in a top view. In addition, the arrangement of the repellent processing unit 5 is not particularly limited. For example, the repellent processing unit 5 may be arranged in a dedicated space in the substrate processing device 100 or may be arranged outside the substrate processing device 100. Furthermore, the substrate processing device 100 may also have a plurality of repellent processing units 5.

Each of the plurality of fluid boxes 3 stores a fluid machine. The plurality of fluid boxes 3 correspond to the plurality of towers TW. The chemical liquid tank 4 stores chemical liquid. The chemical liquid in the chemical liquid tank 4 is supplied to all the processing units 1 included in the tower TW corresponding to the fluid box 3 through any fluid box 3.

The control device 2 controls the loading port LP, the carrier robot IR, the central robot CR, the processing unit 1, the fluid tank 3, the liquid medicine cabinet 4, and the repellent processing unit 5. The control device 2 is, for example, a computer.

The control device 2 includes a control unit 21 and a memory unit 22. The control unit 21 includes a processor such as a CPU (Central Processing Unit). The memory unit 22 includes a memory device that stores data and computer programs. Specifically, the memory unit 22 includes a main memory device such as a semiconductor memory, and an auxiliary memory device such as a semiconductor memory, a solid state hard drive, and/or a hard drive. The memory unit 22 may also include a removable medium. The memory unit 22 is equivalent to an example of a non-temporary computer-readable memory medium.

Next, referring to FIG. 2 , the repellent treatment unit 5 is described. FIG. 2 is a top view showing the interior of the repellent treatment unit 5. As shown in FIG. 2 , the repellent treatment unit 5 includes a chamber 11, a rotary chuck 13, a repellent substance removal mechanism 15, a remover supply unit 17, a liquid receiving unit 19, a repellent application unit 31, and a cleaning liquid supply unit 33. The repellent substance removal mechanism 15 includes a brush 151 and a swing arm 152. The remover supply unit 17 includes a remover nozzle 171, a valve 172, and a pipe 173. The repellent application unit 31 includes a repellent nozzle 311 and an arm 312. The cleaning liquid supply unit 33 includes a cleaning liquid nozzle 331. The control unit 21 controls the rotary chuck 13, the repellent substance removal mechanism 15, the removal agent supply unit 17, the repellent agent application unit 31, and the cleaning liquid supply unit 33.

The chamber 11 has a roughly box-like shape. The chamber 11 accommodates the rotary chuck 13, the repellent substance removal mechanism 15, the removal agent nozzle 171, the liquid receiving portion 19, the repellent agent application portion 31, the repellent agent nozzle 311, and the cleaning liquid nozzle 331.

The rotary chuck 13 holds the substrate W and rotates the substrate W. Specifically, the rotary chuck 13 holds the substrate W approximately horizontally and rotates the substrate W around the rotation axis AX1. The rotary chuck 13 is equivalent to an example of the "substrate holding portion" of the present invention.

The repellent coating section 31 coats the repellent on the end face portion 51 on the radial outer side RD of the substrate W at the coating position P3. The end face portion 51 is a roughly annular portion of the substrate W around the rotation axis AX1. Specifically, the repellent coating section 31 sprays the repellent on the end face portion 51 on the radial outer side RD of the substrate W through the repellent nozzle 311 at the coating position P3. In this embodiment, the radial direction RD is roughly parallel to the horizontal direction. In addition, the radial direction RD is orthogonal to the rotation axis AX1. The radial direction RD can also be understood as the radial direction relative to the rotation axis AX1. In addition, there is a case where the circumferential direction around the rotation axis AX1 is recorded as the circumferential direction CD. The circumferential direction CD can also be understood as the circumferential direction of the substrate W.

The coating position P3 indicates a position above the end surface 51 of the substrate W. On the other hand, the standby position P4 indicates a position further outward in the radial direction RD than the coating position P3. That is, the standby position P4 indicates a position separated from the substrate W in the radial direction RD.

A repellent is a liquid containing a repellent substance. Specifically, a repellent is a solution containing a repellent substance. A repellent substance is a substance that can repel a processing liquid for processing a substrate W. That is, a repellent substance is a substance that has the property of repelling the processing liquid more than the substrate W. A repellent substance has repellency. Repellency refers to the property of repelling a liquid. For example, a substance having a contact angle of 90 degrees or more is a repellent substance.

The repellent is a mixture of a solvent and a repellent substance as a solute. The solvent is, for example, water. The water is, for example, the same liquid as the cleaning solution. The repellent substance is, for example, a polymer compound. The repellent substance is preferably a non-fluorine-based repellent substance. Although this is an example, NeoSeed (registered trademark) manufactured by Nikka Chemical Co., Ltd. can also be used as the repellent substance. In addition, the repellent can also be wax.

The liquid repellent substance is, for example, a water-repellent substance. The water-repellent substance is a substance that repels water. That is, the water-repellent substance is a substance that repels water more than the substrate W. The water-repellent substance has water-repellency. Water-repellency refers to the property of repelling water. For example, a substance with a contact angle of 90 degrees or more is a water-repellent substance. The water at this time is, for example, the same liquid as the cleaning liquid. When the water-repellent substance is used as a liquid repellent substance, it is effective when the processing liquid is an aqueous solution. In addition, when the liquid repellent substance is a water-repellent substance, the liquid repellent is a water-repellent.

The repellent material may be, for example, a silicon-based repellent material or an acrylic-based repellent material. The silicon-based repellent material imparts repellency to silicon itself and compounds containing silicon. The silicon-based repellent material may be, for example, a silane coupling agent. The silane coupling agent may include, for example, at least one of HMDS (hexamethyldisilazane), TMS (tetramethylsilane), fluorinated alkylchlorosilane, alkyldisilazane, and a non-chlorine-based hydrophobizing agent. The non-chlorine hydrophobic agent includes, for example, at least one of dimethylsilyldimethylamine, dimethylsilyldiethylamine, hexamethyldisilazane, tetramethyldisilazane, bis(dimethylamine)dimethylsilane, N,N-dimethyltrimethylsilamine, N-(trimethylsilyl)dimethylamine and an organic silane compound.

In addition, the repellent substance may be, for example, a metal-based repellent substance. The metal-based repellent substance imparts repellency to the metal itself and a compound containing the metal. The metal-based repellent substance may include, for example, at least one of an amine having a hydrophobic group and an organic silicon compound.

After the repellent sprayed onto the substrate W is dried, the repellent substance removal mechanism 15 performs a removal process of the repellent substance attached to the substrate W using a brush 151 impregnated with the remover at the removal position P1. The removal process refers to a process of separating the repellent substance attached to the substrate W from the substrate W. In this case, "separation" means, for example, separating the repellent substance from the substrate W by polishing the portion of the substrate W to which the repellent substance is attached with the remover. However, "separation" may also mean, for example, separating the repellent substance from the substrate W by dissolving the repellent substance attached to the substrate W with the remover.

The removal position P1 indicates the position of the end surface portion 51 facing the substrate W in the radial direction RD. On the other hand, the standby position P2 indicates a position further outward in the radial direction RD than the removal position P1. That is, the standby position P2 indicates a position separated from the substrate W in the radial direction RD. Below the standby position P2, a liquid receiving portion 19 is arranged. The liquid receiving portion 19 is, for example, a can-shaped object.

The remover is a liquid used to remove the repellent substance. In other words, the remover is a liquid used to separate the repellent substance from the substrate W. The remover is, for example, a liquid containing an abrasive. The abrasive is, for example, bismuth oxide. As the remover, for example, "Kirobin (registered trademark)" manufactured by PROSTAFF can be used. In addition, as long as the repellent substance can be removed (separated) from the substrate W, the type of abrasive contained in the remover is not particularly limited. In addition, as long as the repellent substance can be removed (separated) from the substrate W, for example, the remover can also be a liquid containing a component that dissolves the repellent substance.

After performing a removal process on the repellent material attached to the substrate W, the cleaning liquid supply unit 33 cleans the substrate W with the cleaning liquid. That is, after performing the removal process, the cleaning liquid supply unit 33 rinses the repellent material separated from the substrate W with the cleaning liquid. Specifically, after performing the removal process, the cleaning liquid supply unit 33 sprays the cleaning liquid to the radial RD outer side portion (including the end surface portion 51) of the substrate W through the cleaning liquid nozzle 331.

The remover supply unit 17 supplies the remover to the brush 151 of the repellent material removal mechanism 15 at the standby position P2. Therefore, according to this embodiment, the remover can be effectively impregnated into the brush 151. The brush 151 is equivalent to an example of the "removal member" of the present invention.

The brush 151 has, for example, a roughly cylindrical shape. The brush 151 has, for example, elasticity. The brush 151 includes, for example, a porous material. In this case, for example, the brush 151 may also be sponge-shaped. The brush 151 is preferably repellent. This is because the repellent is easily transferred to the substrate W. The material of the brush 151 is, for example, PTFE (polytetrafluoroethylene) or PFA (tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer). In addition, for example, the brush 151 may be composed of a plurality of components and may also include a plurality of hairs.

Specifically, the remover nozzle 171 of the remover supply unit 17 sprays the remover to the brush 151 located at the standby position P2. As a result, the remover is impregnated into the brush 151.

More specifically, the removal agent nozzle 171 is connected to the piping 173. The piping 173 supplies the removal agent to the removal agent nozzle 171. The valve 172 is arranged on the piping 173. The valve 172 closes or opens the flow path of the piping 173. The control unit 21 controls the valve 172 so that the valve 172 opens the flow path of the piping 173. As a result, since the valve 172 opens the flow path of the piping 173, the removal agent nozzle 171 sprays the removal agent to the brush 151. The removal agent that is not impregnated into the brush 151 falls to the liquid receiving unit 19 and stays in the liquid receiving unit 19.

Next, the repellent treatment unit 5 is described in detail with reference to FIG3. FIG3 is a side view showing the interior of the repellent treatment unit 5. As shown in FIG3, in the repellent treatment unit 5, the rotating chuck 13 is a vacuum adsorption type chuck. Specifically, the rotating chuck 13 includes a rotating shaft 131, a rotating base 132, and a rotating motor 133. The rotating shaft 131 extends in a substantially vertical direction. The rotating base 132 has a substantially circular plate shape and is mounted on the upper end of the rotating shaft 131. Moreover, the rotating base 132 holds the substrate W in a substantially horizontal posture. In the example of FIG3, the rotating base 132 adsorbs the back side of the substrate W and holds the substrate W in a substantially horizontal posture. The rotary motor 133 has a rotary shaft coaxially connected to the rotary shaft 131. In addition, the rotary motor 133 rotates the substrate W around the rotary axis AX1 of the rotary shaft 131 while the substrate W is held on the rotary base 132.

The repellent treatment unit 5 further includes a heating unit 20. The heating unit 20 heats the radial RD outer side portion of the substrate W from the back side of the substrate W under the control of the control unit 21. The heating unit 20 is arranged closer to the radial RD outer side than the rotating chuck 13. The heating unit 20 is arranged below the substrate W. Specifically, the heating unit 20 is arranged below the radial RD outer side portion of the substrate W. In the example of FIG. 3, the heating unit 20 has a generally annular shape extending around the rotation axis AX1. The heating unit 20 is, for example, a heater. In addition, the direction along the rotation axis AX1 is sometimes recorded as the axial direction AD. The axial direction AD is orthogonal to the substrate W and is generally parallel to the lead vertical direction.

Under the control of the control unit 21, the repellent substance removal mechanism 15 causes the brush 151 to swing in the horizontal direction or to move the brush 151 up and down. The repellent substance removal mechanism 15 causes the brush 151 to move between the removal position P1 (FIG. 2) and the standby position P2 (FIG. 2). The details of the brush 151 will be described later.

Specifically, the liquid-repellent substance removal mechanism 15 includes a rocking arm 152, a rocking mechanism 153, a lifting mechanism 154, and an arm base shaft 155. The brush 151 is installed at the front end of one side of the rocking arm 152 in the horizontal direction. In addition, the rocking arm 152 causes the brush 151 to rock in a substantially horizontal direction, or to lift and lower the brush 151.

More specifically, the rocking mechanism 153, under the control of the control unit 21, causes the rocking arm 152 to rock around the rocking axis AX3 in a substantially horizontal direction. Specifically, the upper end of the arm base shaft 155 is connected to the other side of the rocking arm 152 in the horizontal direction. The driving force of the rocking mechanism 153 is input to the arm base shaft 155. By inputting the driving force of the rocking mechanism 153 to the arm base shaft 155, the arm base shaft 155 is reciprocated, and the rocking arm 152 is rocked with the arm base shaft 155 as a fulcrum. The rocking mechanism 153 includes, for example, a motor.

Furthermore, the lifting mechanism 154 raises and lowers the swing arm 152 under the control of the control unit 21. Specifically, the lifting mechanism 154 is connected to the arm base shaft 155. The lifting mechanism 154 moves the arm base shaft 155 up and down, so that the swing arm 152 and the arm base shaft 155 move up and down together. The lifting mechanism 154 includes, for example, a ball screw mechanism and a motor that applies a driving force to the ball screw mechanism.

Specifically, the swing arm 152 includes an arm body 156, a support shaft 157, and a rotation mechanism 158. The arm body 156 is hollow and extends in a substantially horizontal direction. The arm body 156 is swung in a substantially horizontal direction by the swing mechanism 153. The arm body 156 is raised and lowered by the lifting mechanism 154. The support shaft 157 is located on one side of the arm body 156 in the horizontal direction and protrudes in a substantially horizontal direction. The rotation mechanism 158 is supported by the support shaft 157. The brush 151 is installed at the lower end of the rotation mechanism 158.

The rotation mechanism 158 rotates the brush 151 around the rotation axis AX2 under the control of the control unit 21. That is, the rotation mechanism 158 rotates the brush 151. Specifically, the rotation mechanism 158 includes a brush motor 160, a shaft 161, a first fixing part C1, and a second fixing part C2.

The output shaft of the brush motor 160 is fixed to the shaft 161. The shaft 161 extends straight downward. That is, the shaft 161 extends downward along the axial direction AD. The first fixing part C1 and the second fixing part C2 are installed at the lower part of the shaft 161. The first fixing part C1 and the second fixing part C2 fix the brush 151 to the shaft 161. The brush motor 160 rotates the shaft 161 to rotate the brush 151 around the rotation axis AX2 together with the first fixing part C1 and the second fixing part C2. In this embodiment, the rotation axis AX2 is roughly parallel to the rotation axis AX1. Therefore, the axial direction AD relative to the rotation axis AX1 is roughly parallel to the rotation axis AX2. Therefore, the axial direction AD can also be understood as the axial direction relative to the rotation axis AX2.

In addition, the swing arm 152 further includes a force-applying mechanism 159. Under the control of the control unit 21, the force-applying mechanism 159 applies force to the brush 151 toward the inner side of the radial direction RD of the substrate W via the support shaft 157 and the rotation mechanism 158. Specifically, the force-applying mechanism 159 maintains the pushing pressure of the brush 151 relative to the end surface 51 of the substrate W in the radial direction RD at a preset pushing pressure. The pushing pressure is the pressure when the brush 151 is pressed against the end surface 51 in the radial direction RD. For example, the force-applying mechanism 159 drives the support shaft 157 in the radial direction RD using a cylinder, thereby applying force to the brush 151 toward the inner side of the radial direction RD of the substrate W.

The repellent applying unit 31 includes a repellent nozzle 311 and an arm 312, and further includes a rotating shaft 313, a nozzle moving mechanism 314, a valve 315, and a pipe 316. The repellent nozzle 311 is connected to the pipe 316. The pipe 316 supplies the repellent to the repellent nozzle 311. The valve 315 is disposed on the pipe 316. The valve 315 closes or opens the flow path of the pipe 316. The control unit 21 controls the valve 315 so that the valve 315 opens the flow path of the pipe 316. As a result, since the valve 315 opens the flow path of the pipe 316, the repellent nozzle 311 sprays the repellent toward the end surface 51 of the substrate W.

The nozzle moving mechanism 314 moves the repellent nozzle 311 between the coating position P3 (Figure 2) and the standby position P4 (Figure 2) via the arm 312 and the rotating shaft 313.

Specifically, the arm 312 extends in a substantially horizontal direction. The repellent nozzle 311 is mounted at the front end of the arm 312. The arm 312 is connected to the rotating shaft 313. The rotating shaft 313 extends in a substantially vertical direction. The nozzle moving mechanism 314 rotates the rotating shaft 313 around a rotating axis in a substantially vertical direction, so that the arm 312 rotates along a substantially horizontal plane. As a result, the repellent nozzle 311 moves along a substantially horizontal plane. For example, the nozzle moving mechanism 314 includes an arm rocking motor that rotates the rotating shaft 313 around the rotating axis. The arm rocking motor is, for example, a servo motor. Furthermore, the nozzle moving mechanism 314 causes the rotating shaft 313 to rise and fall in a substantially vertical direction, thereby causing the arm 312 to rise and fall. As a result, the liquid dispensing nozzle 311 moves in a substantially vertical direction. For example, the nozzle moving mechanism 314 includes a ball screw mechanism and an arm lifting motor that applies a driving force to the ball screw mechanism. The arm lifting motor is, for example, a servo motor.

The cleaning liquid supply unit 33 further includes a valve 332 and a pipe 333 in addition to the cleaning liquid nozzle 331. The pipe 333 is connected to the cleaning liquid nozzle 331. The pipe 333 supplies the cleaning liquid to the cleaning liquid nozzle 331. The valve 332 is arranged on the pipe 333. The valve 332 closes or opens the flow path of the pipe 333. The control unit 21 controls the valve 332 in such a way that the valve 332 opens the flow path of the pipe 333. As a result, since the valve 332 opens the flow path of the pipe 333, the cleaning liquid nozzle 331 sprays the cleaning liquid toward the radial RD outer side portion (including the end surface portion 51) of the substrate W.

Next, referring to FIG. 4 and FIG. 5 , the details of the substrate W are described. FIG. 4 is a cross-sectional view of the substrate W. FIG. 4 shows an enlarged cross-sectional view of the radially outer portion of the substrate W. FIG. 5 is a top view of a portion of the substrate W. FIG. 5 shows an enlarged front view A1 of the radially outer portion of the substrate W.

As shown in FIG. 4 and FIG. 5 , the substrate W has a body 50 (hereinafter, described as "substrate body 50") and an end face portion 51. The substrate body 50 represents the portion of the substrate W excluding the end face portion 51. In other words, the substrate body 50 represents the portion of the substrate W that is closer to the inner side of the radial direction RD than the end face portion 51. In other words, the substrate body 50 represents the substantially flat portion of the substrate W along the radial direction RD. A pattern is formed on the substrate body 50. For example, a pattern is formed on the substrate body 50 on the front A1 side of the substrate W. In addition, for example, a pattern may also be formed on the substrate body 50 on the back A2 side of the substrate W. The substrate body 50 has a substantially circular plate shape. In addition, in FIG. 5 , for easy understanding, the boundary between the substrate body 50 and the end face portion 51 is shown by a dotted line.

Specifically, the substrate body 50 includes a body front peripheral portion 501 and a body back peripheral portion 502. The body front peripheral portion 501 represents a peripheral area in the front A1 of the substrate body 50. The body back peripheral portion 502 represents a peripheral area in the back A2 of the substrate body 50. The body front peripheral portion 501 and the body back peripheral portion 502 are each a roughly annular area around the rotation axis AX1 (Figure 2). The width of the radial direction RD of each of the body front peripheral portion 501 and the body back peripheral portion 502 is, for example, greater than 1 mm and less than 4 mm.

The end face portion 51 indicates a portion of the substrate W that is closer to the radial RD outer side than the substrate body 50. In other words, the end face portion 51 indicates an end face region of the substrate W that is closer to the radial RD outer side than the substrate body 50. In other words, the end face portion 51 indicates an end face region of the substrate W that is closer to the radial RD outer side than the body front peripheral portion 501 and the body back peripheral portion 502. The end face portion 51 has a front edge portion 511, a front shoulder portion 512, a side face portion 515, a back shoulder portion 514, and a back edge portion 513.

The front edge 511 is located on the front A1 side of the front A1 and the back A2 of the substrate W, in an area of the end surface 51 that is closer to the outer side of the substrate body 50 in the radial direction RD, and is located in an area that is closer to the inner side of the radial direction RD than the side surface 515.

The front edge 511 is a roughly annular area around the rotation axis AX1 (Figure 2). The front edge 511 surrounds the substrate body 50 (specifically, the body front peripheral portion 501) in the circumferential direction CD when viewed from above. The front edge 511 includes an inclined surface that is inclined from the body front peripheral portion 501 toward the front shoulder 512 relative to the front surface A1 of the substrate body 50 when viewed from the cross-section. The front edge 511 has an inclination angle θ1 relative to the body front peripheral portion 501. The front edge 511 connects the body front peripheral portion 501 and the front shoulder 512.

The front shoulder 512 is located on the front A1 side, in the end face portion 51, in a region closer to the outer side of the radial direction RD than the front edge portion 511, and in a region closer to the inner side of the radial direction RD than the side face portion 515.

The front shoulder 512 is a generally annular region around the rotation axis AX1 (FIG. 2). The front shoulder 512 surrounds the front edge 511 in the circumferential direction CD in a top view. The front shoulder 512 includes a curved surface that curves from the front edge 511 toward the side surface 515 in a cross-sectional view. The front shoulder 512 connects the front edge 511 and the side surface 515.

The back edge 513 is located on the back side A2, in the end surface 51, in a region closer to the outer side of the substrate body 50 in radial direction RD, and in a region closer to the inner side of the side surface 515 in radial direction RD.

The back edge 513 is a roughly annular area around the rotation axis AX1 (Figure 2). The back edge 513 surrounds the substrate body 50 (specifically, the back edge 502 of the body) in the circumferential direction CD when viewed from above. The back edge 513 includes an inclined surface that is inclined from the back edge 502 of the body toward the back shoulder 514 relative to the back A2 of the substrate body 50 when viewed from the cross-section. The back edge 513 has an inclination angle θ2 relative to the back edge 502 of the body. For example, the inclination angle θ2 is substantially the same as the inclination angle θ1. The back edge 513 connects the back edge 502 of the body and the back shoulder 514.

The back shoulder 514 is located on the back A2 side, in the end face portion 51, in a region closer to the outer side of the radial direction RD than the back edge portion 513, and in a region closer to the inner side of the radial direction RD than the side face portion 515.

The back shoulder 514 is a generally annular region around the rotation axis AX1 (FIG. 2). The back shoulder 514 surrounds the back edge 513 in the circumferential direction CD in a top view. The back shoulder 514 includes a curved surface that bends from the back edge 513 toward the side surface 515 in a cross-sectional view. The back shoulder 514 connects the back edge 513 and the side surface 515.

The side surface 515 is located at the outermost side of the substrate W in the radial direction RD. The side surface 515 is a roughly annular region around the rotation axis AX1 (FIG. 2). The side surface 515 surrounds the front shoulder 512 and the back shoulder 514 in the circumferential direction CD in a top view. The side surface 515 includes a flat surface extending from the front shoulder 512 toward the back shoulder 514 in a cross-sectional view. The side surface 515 has a roughly cylindrical shape around the rotation axis AX1. The side surface 515 connects the front shoulder 512 and the back shoulder 514.

Here, as shown in FIG. 4 , for example, the thickness d of the substrate W in the axial direction AD is 765 μm. Also, for example, the radius of curvature of the front shoulder 512 is 270 μm, the length L0 of the side surface 515 in the axial direction AD is 228 μm, and the radius of curvature of the back shoulder 514 is 238 μm. Also, for example, the length L1 is 314 μm, and the length L2 is 323 μm. The length L1 represents the distance along the radial direction RD from the radial RD inner end of the front edge 511 to the radial RD outer end (side surface 515) of the front shoulder 512. The length L2 represents the distance along the radial RD from the radial RD inner end of the back edge 513 to the radial RD outer end (side surface 515) of the back shoulder 514. For example, the tilt angle θ1 of the front edge 511 is 22.3 degrees, and the tilt angle θ2 of the back edge 513 is 23.3 degrees.

In addition, in the following Figures 6 to 11 and Figures 16 to 19, the front shoulder 512 and the back shoulder 514 are simplified by straight lines.

Next, referring to FIG. 6 and FIG. 7, the repellent substance removal method of this embodiment is described. The repellent substance removal method constitutes a part of the substrate processing method of this embodiment. FIG. 6 and FIG. 7 are diagrams showing the repellent substance removal method of this embodiment. In FIG. 6 and FIG. 7, for easy viewing of the diagram, the side of the brush 151 is shown, and the cross section of the substrate W is shown.

As shown in FIG6 and FIG7, the method for removing the repellent substance includes step S100, step S200, step S300, step S400, and step S500.

First, as shown in FIG6 , in step S100, at the standby position P2, the remover nozzle 171 sprays the remover 87 toward the rotating brush 151. As a result, the remover 87 is impregnated into the brush 151. In particular, in step S100, since the brush 151 is rotated by the rotation mechanism 158 ( FIG3 ), the remover 87 is uniformly infiltrated into the brush 151. In FIG6 , the remover nozzle 171 sprays the remover 87 in a direction intersecting the rotation axis AX2. Specifically, the remover nozzle 171 sprays the remover 87 in a direction substantially orthogonal to the rotation axis AX2. Furthermore, the swing arm 152 (Fig. 3) moves (lifts and lowers) the brush 151 along the axial direction AD. Therefore, even when the remover nozzle 171 is fixed, the remover 87 can be sprayed on the entire brush 151. As a result, the remover can be effectively impregnated into the entire brush 151. In addition, the remover nozzle 171 can be moved (lifted and lowered) by the same mechanism as the nozzle moving mechanism 314.

Next, in step S200, at the coating position P3, the repellent nozzle 311 sprays the repellent 81 onto the end surface 51 of the rotating substrate W, thereby coating the repellent 81 onto the end surface 51 of the substrate W. In this case, since the repellent 81 is sprayed onto the substrate W, the repellent 81 is not only attached to the end surface 51, but also to the front peripheral portion 501 of the body. In addition, there is also a case where the repellent 81 goes around to the back peripheral portion 502 of the body.

Next, in step S300, the heating unit 20 heats the outer portion of the diameter RD of the rotating substrate W from below the substrate W, thereby drying the repellent 81 applied in step S200. As a result, the solvent evaporates from the repellent 81, and the repellent substance 82 adheres to the end surface 51 of the substrate W, the peripheral portion 501 of the front surface of the body, and the peripheral portion 502 of the back surface of the body. That is, the repellent 81 dries, and the repellent substance 82 in the repellent 81 adheres to the end surface 51 of the substrate W, the peripheral portion 501 of the front surface of the body, and the peripheral portion 502 of the back surface of the body.

Next, as shown in FIG. 7 , in step S400, at the removal position P1, the brush 151 is separated from the side portion 515, the front shoulder 512 and the back shoulder 514 of the rotating substrate W, and contacts the main body front peripheral portion 501, the front edge 511, the back edge 513 and the main body back peripheral portion 502 of the rotating substrate W, thereby making the removing agent 87 contact the repellent substance 82 attached to the main body front peripheral portion 501, the front edge 511, the back edge 513 and the main body back peripheral portion 502 (step S300). As a result, the repellent substance 82 is retained on the side surface 515, the front shoulder 512 and the back shoulder 514, and the repellent substance 82 attached to the front peripheral portion 501, the front peripheral portion 511, the back peripheral portion 513 and the back peripheral portion 502 of the main body is removed by the remover 87. That is, the repellent substance 82 is retained on the side surface 515, the front shoulder 512 and the back shoulder 514, and the repellent substance 82 attached to the front peripheral portion 501, the front peripheral portion 511, the back peripheral portion 513 and the back peripheral portion 502 of the main body is separated from the front peripheral portion 501, the front peripheral portion 511, the back peripheral portion 513 and the back peripheral portion 502 of the main body. As a result, according to this embodiment, only the excess repellent substance 82 can be removed (separated) from the substrate W.

Preferably, in step S400, the self-rotating mechanism 158 (FIG. 3) causes the brush 151 to self-rotate. In this case, the brush 151 is separated from the side surface 515, the front shoulder 512, and the back shoulder 514 of the rotating substrate W, and contacts the body front peripheral portion 501, the front edge 511, the back edge 513, and the body back peripheral portion 502 of the rotating substrate W while self-rotating. As a result, according to this embodiment, the excess repellent substance 82 can be removed (separated) from the substrate W more effectively.

In the example of FIG. 7 , at the contact position between the substrate W and the brush 151, the rotation direction of the substrate W is opposite to the rotation direction of the brush 151. Therefore, the excess repellent substance 82 can be removed (separated) from the substrate W more reliably. In addition, at the contact position between the substrate W and the brush 151, the rotation direction of the substrate W and the rotation direction of the brush 151 can also be the same.

Next, in step S500, the cleaning liquid nozzle 331 sprays the cleaning liquid 86 onto the rotating substrate W to rinse the excess repellent material 82 separated from the substrate W from the substrate W. Thereafter, the cleaning liquid attached to the substrate W is dried by the rotation of the substrate W.

For example, the cleaning liquid nozzle 331 sprays the cleaning liquid 86 to the front peripheral portion 501 and the end surface portion 51 of the main body. In addition, the cleaning liquid nozzle 331 can also spray the cleaning liquid 86 to the entire front surface A1 of the substrate W. In addition, in addition to spraying the cleaning liquid from the front surface A1 of the substrate W, the cleaning liquid can also be sprayed from the back surface A2 of the substrate W.

For example, after step S500, the substrate W with the repellent substance 82 attached to the side surface 515, the front shoulder 512 and the back shoulder 514 is moved into the processing unit 1 (FIG. 1). And, the back nozzle 8 (FIG. 1) sprays the processing liquid to the back surface A2 of the substrate W. In this case, since the repellent substance 82 attached to the side surface 515, the front shoulder 512 and the back shoulder 514 of the substrate W repel the processing liquid, it is possible to prevent the processing liquid from detouring from the back surface A2 of the substrate W to the front surface A1. As a result, it is possible to prevent the pattern formed on the front surface A1 of the substrate W from being affected by the processing liquid sprayed to the back surface A2.

Here, the repellent substance 82 attached to the side surface 515, the front shoulder 512, and the back shoulder 514 of the substrate W is a polymer compound. Therefore, there is no need to remove the repellent substance 82. This is because the repellent substance 82 only exists on the side surface 515, the front shoulder 512, and the back shoulder 514.

In the above, step S400 has been described with reference to FIG. 7 as an example of a step of bringing the remover into contact with the repellent substance. However, the following changes may also be made.

That is, the rotating chuck 13 ( FIG. 3 ) holds and rotates the substrate W with the repellent substance attached to at least the body front peripheral portion 501 and the end surface portion 51. Also, during the rotation of the substrate W, the brush 151 is separated from the side surface portion 515 in the radial direction RD in the end surface portion 51 of the substrate W and contacts at least the body front peripheral portion 501 of the substrate W, thereby allowing the remover that can remove the repellent substance to contact the repellent substance attached to the body front peripheral portion 501. As a result, the repellent substance 82 is retained on the side surface portion 515, and the repellent substance 82 attached to the body front peripheral portion 501 is removed by at least the remover 87. That is, the liquid-repellent substance 82 is retained on the side surface 515, and at least the liquid-repellent substance 82 attached to the front peripheral portion 501 of the main body is separated from the front peripheral portion 501 of the main body. As a result, according to this embodiment, only the excess liquid-repellent substance 82 can be removed (separated) from the substrate W.

It is preferred that the brush 151 is separated from the side surface 515 of the substrate W and at least contacts the front peripheral portion 501 of the body while rotating. In this case, the repellent substance 82 can be removed (separated) more effectively at least from the front peripheral portion 501 of the body.

In addition, there is a case where a repellent substance is attached to the body back peripheral portion 502. In this case, the rotating chuck 13 holds the substrate W with the repellent substance attached to the body front peripheral portion 501, the body back peripheral portion 502 and the end surface portion 51 and rotates it. In addition, during the rotation of the substrate W, the brush 151 is separated from the side surface portion 515 of the substrate W and contacts at least the body front peripheral portion 501 and the body back peripheral portion 502 of the substrate W, thereby making the remover contact the repellent substance attached to the body front peripheral portion 501 and the body back peripheral portion 502. As a result, the repellent substance 82 is retained on the side surface 515, and at least the repellent substance 82 attached to the front peripheral portion 501 and the back peripheral portion 502 of the main body is removed by the remover 87. That is, only the excess repellent substance 82 is removed (separated) from the substrate W.

Preferably, the brush 151 is separated from the side surface 515 of the substrate W, and contacts at least the front peripheral portion 501 and the back peripheral portion 502 of the body while rotating. In this case, the repellent substance 82 can be removed (separated) more effectively from at least the front peripheral portion 501 and the back peripheral portion 502 of the body.

Next, referring to FIG. 8 , the details of the brush 151 are described. FIG. 8 is a side view of the brush 151. As shown in FIG. 8 , the brush 151 includes a first contact portion B1 and a second contact portion B2. The first contact portion B1 and the second contact portion B2 are arranged at intervals in a fixed direction. In the example of FIG. 8 , the first contact portion B1 and the second contact portion B2 are arranged at intervals in the axial direction AD.

The first contact portion B1 includes a first outer contact portion B11 and a first inner contact portion B12. The first outer contact portion B11 has a roughly cylindrical shape or a roughly disk shape. The first outer contact portion B11 has a first fitting portion 55. The first fitting portion 55 includes a roughly cylindrical or roughly disk-shaped space. The first outer contact portion B11 includes a flat surface B14. The flat surface B14 has a roughly annular shape around the rotation axis AX2. The flat surface B14 is the lower end surface of the first outer contact portion B11.

The first fixing portion C1 is fixed to the upper surface of the first outer contact portion B11. In addition, the first fixing portion C1 is fixed to the shaft portion 161.

The first inner contact portion B12 is arranged inside the first outer contact portion B11. The first inner contact portion B12 has a first non-contact portion 41 and a first inclined contact portion 43. The first non-contact portion 41 has a substantially cylindrical shape or a substantially circular plate shape. The first non-contact portion 41 is engaged with the first engagement portion 55 and fixed inside the first outer contact portion B11. The first inclined contact portion 43 has a substantially inverted cone trapezoidal shape. The first inclined contact portion 43 protrudes from the first outer contact portion B11 toward the second contact portion B2. The first inclined contact portion 43 has an inclined surface B13. The inclined surface B13 is inclined relative to the flat surface B14. The inclined surface B13 has an inclination angle θ1 relative to the flat surface B14. The inclination angle θ1 of the inclined surface B13 is substantially the same as the inclination angle θ1 of the front edge 511 (FIG. 4). The inclined surface B13 is substantially an inverted cone surface.

The second contact portion B2 includes a second outer contact portion B21 and a second inner contact portion B22. The second outer contact portion B21 has a roughly cylindrical shape or a roughly disk shape. The second outer contact portion B21 has a second fitting portion 56. The second fitting portion 56 includes a roughly cylindrical or roughly disk-shaped space. The second outer contact portion B21 includes a flat surface B24. The flat surface B24 has a roughly annular shape around the rotation axis AX2. The flat surface B24 is the upper end surface of the second outer contact portion B21.

The second fixing portion C2 is fixed to the lower surface of the second outer contact portion B21. In addition, the second fixing portion C2 is fixed to the shaft portion 161.

The second inner contact portion B22 is arranged on the inner side of the second outer contact portion B21. The second inner contact portion B22 has a second non-contact portion 42 and a second inclined contact portion 44. The second non-contact portion 42 has a substantially cylindrical shape or a substantially circular plate shape. The second non-contact portion 42 is engaged with the second engaging portion 56 and is fixed to the inner part of the second outer contact portion B21. The second inclined contact portion 44 has a substantially conical trapezoidal shape. The second inclined contact portion 44 protrudes from the second outer contact portion B21 toward the first contact portion B1. The second inclined contact portion 44 has an inclined surface B23. The inclined surface B23 is inclined relative to the flat surface B24. The inclined surface B23 has an inclination angle θ2 relative to the flat surface B24. The inclination angle θ2 of the inclined surface B23 is substantially the same as the inclination angle θ1 (FIG. 4) of the front edge 511. The inclined surface B23 is substantially a truncated cone surface.

The flat surface B14 of the first outer contact portion B11 and the flat surface B24 of the second outer contact portion B21 are spaced apart and face each other in the axial direction AD. Furthermore, the inclined surface B13 of the first inner contact portion B12 and the inclined surface B23 of the second inner contact portion B22 are spaced apart and face each other in the axial direction AD. In this embodiment, the first contact portion B1 and the second contact portion B2 are symmetrical with respect to the imaginary plane PL. The imaginary plane PL is an imaginary plane orthogonal to the rotation axis AX2 and passes through the midpoint of the axial direction AD of the opposing axis 161a. Furthermore, in this embodiment, the tilt angle θ1 is substantially the same as the tilt angle θ2.

In addition, the first outer contact portion B11 and the first inner contact portion B12 may also be integrally formed. The second outer contact portion B21 and the second inner contact portion B22 may also be integrally formed.

In addition, the repellent treatment unit 5 (FIG. 3) further includes an inert gas supply unit 35. The inert gas supply unit 35 supplies inert gas between the first contact portion B1 and the second contact portion B2. The inert gas is, for example, nitrogen or argon. Specifically, the inert gas supply unit 35 includes an inert gas ejection unit 353, a pipe 352, and a valve 351. The inert gas ejection unit 353 ejects inert gas from between the first contact portion B1 and the second contact portion B2 toward the outside of the shaft portion 161. The inert gas ejection unit 353 is, for example, a nozzle.

Specifically, the piping 352 is connected to the inert gas ejection section 353. The piping 352 supplies the inert gas to the inert gas ejection section 353. The valve 351 is arranged on the piping 352. The valve 351 closes or opens the flow path of the piping 352. The control section 21 controls the valve 351 in such a way that the valve 351 opens the flow path of the piping 352. As a result, since the valve 351 opens the flow path of the piping 352, the inert gas ejection section 353 ejects the inert gas.

More specifically, the inert gas ejection portion 353 is disposed on the opposing shaft portion 161a. The opposing shaft portion 161a is a portion of the shaft portion 161 located between the first contact portion B1 and the second contact portion B2. The shaft portion 161 passes through the first contact portion B1 and the second contact portion B2 in the axial direction AD, for example.

Next, referring to FIG. 9, an example of the removal process of the repellent substance 82 of the brush 151 is described. FIG. 9 is a diagram showing an example of the removal process of the repellent substance of the brush 151. In FIG. 9, the side of the brush 151 is shown to facilitate understanding of the diagram, and the cross section of the substrate W is shown. In addition, the oblique lines representing the cross section are omitted to simplify the diagram.

As shown in FIG. 9 , the first contact portion B1 is separated from the side portion 515 of the substrate W during the rotation of the substrate W, and is in contact with at least the main body front peripheral portion 501 of the substrate W, thereby allowing the remover to contact the repellent substance attached to the main body front peripheral portion 501. That is, the remover impregnated in the first contact portion B1 is transferred to the main body front peripheral portion 501 and the repellent substance. Therefore, the repellent substance 82 is retained on the side portion 515, and the repellent substance can be removed (separated) from the main body front peripheral portion 501 by the remover.

On the other hand, the second contact portion B2 is separated from the side portion 515 of the substrate W during the rotation of the substrate W, and is in contact with at least the back peripheral portion 502 of the substrate W, thereby making the remover contact the repellent material attached to the back peripheral portion 502 of the substrate W. That is, the remover impregnated in the second contact portion B2 is transferred to the back peripheral portion 502 of the substrate and the repellent material. Therefore, the repellent material 82 is retained on the side portion 515, and the repellent material can be removed (separated) from the back peripheral portion 502 of the substrate by the remover.

Specifically, the first outer contact portion B11 contacts the body front peripheral portion 501 during the rotation of the substrate W, so that the remover contacts the repellent material attached to the body front peripheral portion 501. That is, the remover impregnated in the first outer contact portion B11 is transferred to the body front peripheral portion 501 and the repellent material. Therefore, the repellent material can be effectively removed (separated) from the body front peripheral portion 501 by the remover.

Furthermore, the first inner contact portion B12 contacts the front edge portion 511 in the end portion 51 of the substrate W during the rotation of the substrate W, so that the remover contacts the repellent material attached to the front edge portion 511. That is, the remover impregnated in the first inner contact portion B12 is transferred to the front edge portion 511 and the repellent material. Therefore, the repellent material can be effectively removed (separated) from the front edge portion 511 by the remover.

On the other hand, the second outer contact portion B21 contacts the back peripheral portion 502 of the substrate W during the rotation of the substrate W, so that the remover contacts the repellent material attached to the back peripheral portion 502 of the body. That is, the remover impregnated in the second outer contact portion B21 is transferred to the back peripheral portion 502 of the body and the repellent material. Therefore, the repellent material can be effectively removed (separated) from the back peripheral portion 502 of the body by the remover.

Furthermore, the second inner contact portion B22 contacts the back edge portion 513 in the end portion 51 of the substrate W during the rotation of the substrate W, so that the remover contacts the repellent material attached to the back edge portion 513. That is, the remover impregnated in the second inner contact portion B22 is transferred to the back edge portion 513 and the repellent material. Therefore, the repellent material can be effectively removed (separated) from the back edge portion 513 by the remover.

More specifically, the flat surface B14 of the first outer contact portion B11 contacts the front peripheral portion 501 of the main body. Therefore, the removal liquid impregnated in the first outer contact portion B11 contacts the repellent material attached to the front peripheral portion 501 of the main body through the flat surface B14. Moreover, the repellent material attached to the front peripheral portion 501 of the main body is separated from the front peripheral portion 501 of the main body by, for example, grinding by the removal liquid and the flat surface B14. In this way, the repellent material can be removed more effectively from the front peripheral portion 501 of the main body.

Furthermore, the inclined surface B13 of the first inner contact portion B12 contacts the front edge portion 511. Therefore, the removal liquid impregnated in the first inner contact portion B12 contacts the repellent material attached to the front edge portion 511 through the inclined surface B13. Moreover, the repellent material attached to the front edge portion 511 is separated from the front edge portion 511 by, for example, grinding by the removal liquid and the inclined surface B13. In this way, the repellent material can be removed more effectively from the front edge portion 511. The inclined surface B13 is inclined along the front edge portion 511.

On the other hand, the flat surface B24 of the second outer contact portion B21 contacts the peripheral portion 502 of the back of the body. Therefore, the removal liquid impregnated in the second outer contact portion B21 contacts the repellent material attached to the peripheral portion 502 of the back of the body through the flat surface B24. Moreover, the repellent material attached to the peripheral portion 502 of the back of the body is separated from the peripheral portion 502 of the back of the body by, for example, grinding by the removal liquid and the flat surface B24. In this way, the repellent material can be removed more effectively from the peripheral portion 502 of the back of the body.

In addition, the inclined surface B23 of the second inner contact portion B22 contacts the back edge portion 513. Therefore, the removal liquid impregnated in the second inner contact portion B22 contacts the repellent material attached to the back edge portion 513 through the inclined surface B23. Moreover, the repellent material attached to the back edge portion 513 is separated from the back edge portion 513 by, for example, grinding by the removal liquid and the inclined surface B23. In this way, the repellent material can be removed more effectively from the back edge portion 513. The inclined surface B23 is inclined along the back edge portion 513.

As a result of performing the removal process described with reference to FIG. 9 , the repellent substance can be removed from the body front peripheral portion 501, the front edge portion 511, the back edge portion 513 and the body back peripheral portion 502 of the substrate W, and the repellent substance 82 is retained on the front shoulder portion 512, the side portion 515 and the back shoulder portion 514 of the end portion 51 of the substrate W.

Furthermore, the opposing shaft portion 161a is spaced apart from the repellent substance 82 attached to the end surface portion 51 of the substrate W in the radial direction RDa. The radial direction RDa represents the radial direction relative to the rotation axis AX2 and is orthogonal to the rotation axis AX2. The inert gas ejection portion 353 ejects the inert gas from the opposing shaft portion 161a toward the outer side of the radial direction RDa. As a result, the repellent substance 82 is exposed to the inert gas, which can prevent the repellent substance 82 from being oxidized.

In addition, the first inner contact portion B12 (specifically, the inclined surface B13) can also contact the front edge portion 511 and the front shoulder portion 512 in the end portion 51 of the substrate W during the rotation of the substrate W, so that the remover can contact the repellent substance attached to the front edge portion 511 and the front shoulder portion 512. In this case, the repellent substance can be effectively removed (separated) from the front edge portion 511 and the front shoulder portion 512 by the remover. On the other hand, the second inner contact portion B22 (specifically, the inclined surface B23) can also contact the back edge 513 and the back shoulder 514 in the end surface portion 51 of the substrate W during the rotation of the substrate W, so that the remover can contact the repellent material attached to the back edge 513 and the back shoulder 514. In this case, the repellent material can be effectively removed (separated) from the back edge 513 and the back shoulder 514 by the remover.

In this case, for example, the control unit 21 adjusts the force (pressing pressure) of the force applying mechanism 159 (FIG. 3) to elastically deform the first inner contact portion B12 and the second inner contact portion B22 of the brush 151, so that the first inner contact portion B12 of the brush 151 contacts the front edge 511 and the front shoulder 512, and the second inner contact portion B22 of the brush 151 contacts the back edge 513 and the back shoulder 514.

Next, referring to FIG. 10 , an example of the removal process of the repellent substance 82 of the brush 151A of the variation is described. FIG. 10 is a diagram showing an example of the removal process of the repellent substance of the brush 151A. In FIG. 10 , the side surface of the brush 151A is shown for easy understanding of the diagram, and the cross section of the substrate W is shown. In addition, the oblique lines representing the cross section are omitted to simplify the diagram.

As shown in FIG. 10 , the first contact portion B1 includes the first inner contact portion B12a. The inclined surface B13 of the first inner contact portion B12a contacts the upper area a1 of the front edge portion 511 and does not contact the lower area b1 of the front edge portion 511. Therefore, only the liquid-repellent substance attached to the upper area a1 is removed, and the liquid-repellent substance attached to the lower area b1 is retained.

On the other hand, the second contact portion B2 includes a second inner contact portion B22a. The inclined surface B23 of the second inner contact portion B22a contacts the lower side region a2 of the back edge portion 513 and does not contact the upper side region b2 of the back edge portion 513. Therefore, only the liquid-repellent substance attached to the lower side region a2 is removed, and the liquid-repellent substance attached to the upper side region b2 is retained.

As a result of performing the removal process described with reference to FIG. 10 , the liquid-repellent substance can be removed from the main body front peripheral portion 501 of the substrate W, the upper side region a1 of the front edge portion 511, the lower side region a2 of the back edge portion 513, and the main body back peripheral portion 502, and the liquid-repellent substance 82 can be retained in the lower side region b1 of the front edge portion 511, the front shoulder portion 512, the side portion 515, the back shoulder portion 514, and the upper side region b2 of the back edge portion 513 of the end portion 51 of the substrate W.

In addition, the first outer contact portion B11 and the first inner contact portion B12a may also be integrally formed. The second outer contact portion B21 and the second inner contact portion B22a may also be integrally formed.

Next, referring to FIG. 11, an example of the removal process of the repellent substance 82 of the brush 151B in another variation is described. FIG. 11 is a diagram showing an example of the removal process of the repellent substance of the brush 151B. In FIG. 11, the side of the brush 151B is shown for easy understanding of the diagram, and the cross section of the substrate W is shown. In addition, the oblique lines representing the cross section are omitted to simplify the diagram.

As shown in FIG. 11 , the first contact portion B1 has a first outer contact portion B11 and does not have a first inner contact portion B12 ( FIG. 9 ). That is, the structure of the first contact portion B1 is the same as that of the first outer contact portion B11. In this case, the first contact portion B1 may not have the first engaging portion 55 ( FIG. 9 ). Moreover, the flat surface B14 of the first contact portion B1 is separated from the end surface portion 51 of the substrate W and contacts the front peripheral portion 501 of the body. Therefore, only the liquid-repellent substance attached to the front peripheral portion 501 of the body is removed.

On the other hand, the second contact portion B2 has a second outer contact portion B21 and does not have a second inner contact portion B22 (Fig. 9). That is, the second contact portion B2 has the same structure as the second outer contact portion B21. In this case, the second contact portion B2 may not have the second engaging portion 56 (Fig. 9). Moreover, the flat surface B24 of the second contact portion B2 is separated from the end surface portion 51 of the substrate W and contacts the back peripheral portion 502 of the body. Therefore, only the liquid-repellent substance attached to the back peripheral portion 502 of the body is removed.

As described above, the removal process described in reference to FIG. 11 is performed, and as a result, the repellent substance can be removed from the peripheral portion 501 of the front surface and the peripheral portion 502 of the back surface of the substrate W, and the repellent substance 82 is retained on the entire end surface portion 51 of the substrate W.

Next, referring to FIG. 1 to FIG. 3 and FIG. 12, the substrate processing method of this embodiment is described. The substrate processing method uses a brush 151 that allows a remover capable of removing a repellent substance to contact the repellent substance. The substrate processing method includes a repellent substance removal method. FIG. 12 is a flow chart showing the substrate processing method of this embodiment. As shown in FIG. 12, the substrate processing method includes steps S1 to S13. Steps S1 to S13 are performed by the substrate processing device 100.

First, as shown in FIG. 2 , FIG. 3 and FIG. 12 , in step S1, the remover supply unit 17 causes the brush 151 located at the standby position P2 to rotate while supplying the remover to the brush 151. Specifically, the control unit 21 controls the rotation mechanism 158 so as to cause the brush 151 to rotate. As a result, the rotation mechanism 158 causes the brush 151 to rotate. Furthermore, the control unit 21 controls the remover supply unit 17 so as to supply the remover to the brush 151. As a result, the remover supply unit 17 supplies the remover to the brush 151. In addition, the rotation of the brush 151 and the supply of the remover may be performed simultaneously, or the rotation may be performed first and then the remover is supplied, or the remover may be supplied first and then the rotation may be performed. In addition, after the supply of the remover to the brush 151 is completed, the rotation mechanism 158 stops the rotation of the brush 151.

Next, as shown in FIG. 1 and FIG. 12 , in step S2, the control unit 21 controls the central robot CR to carry the substrate W into the repellent processing unit 5. As a result, the central robot CR carries the substrate W into the repellent processing unit 5 and holds the substrate W on the rotary chuck 13.

Next, as shown in FIG. 2, FIG. 3 and FIG. 12, in step S3, the control unit 21 controls the rotary chuck 13 in such a manner as to rotate the substrate W. As a result, the rotary chuck 13 rotates the substrate W.

Next, in step S4, the repellent coating section 31 sprays the repellent onto the end surface 51 of the rotating substrate W at the coating position P3. Specifically, the control section 21 controls the valve 315 so that the repellent nozzle 311 sprays the repellent onto the end surface 51 of the rotating substrate W. As a result, since the valve 315 opens the flow path of the pipe 316, the repellent nozzle 311 sprays the repellent onto the end surface 51 of the substrate W. Therefore, the repellent is coated onto the end surface 51 of the substrate W. However, since the repellent is applied by the repellent nozzle 311, the repellent is also applied to the peripheral portion 501 on the front side and the peripheral portion 502 on the back side of the substrate W. After the application of the repellent is completed, the repellent nozzle 311 stops spraying the repellent.

Next, in step S5, the rotating chuck 13 holds and rotates the substrate W to which the repellent substance is attached at least on the front peripheral portion 501 and the end surface portion 51 of the body. Typically, the rotating chuck 13 holds and rotates the substrate W to which the repellent substance is attached on the front peripheral portion 501 of the body, the back peripheral portion 502 of the body, and the end surface portion 51. The rotation of the substrate W continues from step S3. Furthermore, the heating unit 20 heats the outer portion of the radial direction RD of the substrate W from below the substrate W. Specifically, the control unit 21 controls the heating unit 20 in such a manner that the substrate W is heated. As a result, the heating unit 20 heats the substrate W, and the repellent applied on the substrate W is dried by the heat. Therefore, the repellent substance contained in the repellent is attached to the end surface 51 of the substrate W, the peripheral portion 501 of the front surface of the body, and the peripheral portion 502 of the back surface of the body.

Next, in step S6, the brush 151 rotates while contacting the rotating substrate W to remove (separate) excess repellent substances from the substrate W.

Specifically, the control unit 21 controls the rotation mechanism 158 so that the brush 151 rotates. As a result, the rotation mechanism 158 rotates the brush 151. Furthermore, the control unit 21 controls the swing arm 152 so that the brush 151 moves from the standby position P2 to the removal position P1. Therefore, the swing arm 152 moves the brush 151 from the standby position P2 to the removal position P1. As a result, the brush 151 retains the necessary repellent substance on the substrate W and removes only the excess repellent substance from the substrate W. After the removal of the excess repellent substance is completed, the swing arm 152 moves the brush 151 from the removal position P1 to the standby position P2, and the rotation mechanism 158 stops the rotation of the brush 151.

Specifically, in step S6, during the rotation of the substrate W, the brush 151 is separated from the side surface 515 in the radial direction RD in the end surface 51 of the substrate W, and the brush 151 is in contact with at least the main body front peripheral portion 501 of the substrate W, so that the remover contacts the repellent substance attached to the main body front peripheral portion 501.

In more detail, in step S6, the brush 151 performs a first contact operation and a second contact operation. The first contact operation is to separate the first contact portion B1 from the side surface 515 of the substrate W during the rotation of the substrate W, and to make the first contact portion B1 contact at least the main body front peripheral portion 501 of the substrate W, so that the brush 151 contacts the liquid-repellent substance attached to the main body front peripheral portion 501. The second contact action is to separate the second contact portion B2 from the side surface 515 of the substrate W during the rotation of the substrate W, and to make the second contact portion B2 contact at least with the back peripheral portion 502 of the substrate W, so that the remover contacts the repellent material 82 attached to the back peripheral portion 502 of the substrate.

More specifically, in step S6, the first body contact action and the first end surface contact action are performed as the first contact action.

The first body contacting action is to make the first outer contact portion B11 contact the body front peripheral portion 501 during the rotation of the substrate W, so that the remover contacts the liquid-repellent substance attached to the body front peripheral portion 501.

The first end surface contact action is to make the first inner contact portion B12 contact the front edge portion 511 in the end surface portion 51 of the substrate W during the rotation of the substrate W, so that the remover contacts the liquid-repellent substance attached to the front edge portion 511. In addition, the first end surface contact action can also be to make the first inner contact portion B12 contact the front edge portion 511 and the front shoulder portion 512 of the substrate W during the rotation of the substrate W, so that the remover contacts the liquid-repellent substance attached to the front edge portion 511 and the front shoulder portion 512.

Furthermore, in step S6, the second body contact action and the second end surface contact action are performed as the second contact action.

The second body contacting action is to make the second outer contact portion B21 contact the body back peripheral portion 502 of the substrate W during the rotation of the substrate W, so that the remover contacts the liquid-repellent substance attached to the body back peripheral portion 502.

The second end surface contacting action is an action in which the second inner contact portion B22 contacts the back edge portion 513 in the end surface portion 51 of the substrate W during the rotation of the substrate W, so that the remover contacts the liquid-repellent substance attached to the back edge portion 513. In addition, the second end surface contacting action can also be an action in which the second inner contact portion B22 contacts the back edge portion 513 and the back shoulder portion 514 of the substrate W during the rotation of the substrate W, so that the remover contacts the liquid-repellent substance attached to the back edge portion 513 and the back shoulder portion 514.

In addition, it is preferred that in step S6, the brush 151 is separated from the side surface 515 of the substrate W, and the brush 151 is rotated while the brush 151 is in contact with at least the front peripheral portion 501 of the body. Further, it is preferred that in step S6, the brush 151 is separated from the side surface 515 of the substrate W, and the brush 151 is rotated while the brush 151 is in contact with at least the front peripheral portion 501 of the body and the back peripheral portion 502 of the body. Furthermore, it is preferred that in step S6, the brush 151 is separated from the side surface 515, the front shoulder 512 and the back shoulder 514 of the substrate W, and the brush 151 is rotated while the brush 151 contacts the front peripheral portion 501, the front edge 511, the back edge 513 and the back peripheral portion 502 of the body. Furthermore, it is preferred that in step S6, the brush 151 is separated from the side surface 515 of the substrate W, and the brush 151 is rotated while the brush 151 contacts the front peripheral portion 501, the front edge 511, the front shoulder 512, the back shoulder 514, the back edge 513 and the back peripheral portion 502 of the body.

Furthermore, it is preferred that in step S6, an inert gas is sprayed toward the repellent material 82 from between the first contact portion B1 and the second contact portion B2 of the brush 151.

Next, in step S7, the cleaning liquid supply unit 33 supplies cleaning liquid to the substrate W, thereby removing (separating) the excess repellent material from the substrate W in the substrate W rinse step S6. Specifically, the control unit 21 controls the valve 332 in such a way that the cleaning liquid nozzle 331 temporarily sprays the cleaning liquid to the rotating substrate W. As a result, since the valve 332 opens the flow path of the pipe 333, the cleaning liquid nozzle 331 sprays the cleaning liquid to the substrate W.

Next, in step S8, the rotary chuck 13 dries the substrate W by rotating the substrate W. The rotation of the substrate W continues from step S3.

Next, in step S9, the control unit 21 controls the rotary chuck 13 to stop the rotation of the substrate W. As a result, the rotary chuck 13 stops the rotation of the substrate W.

Next, in step S10, the control unit 21 controls the central robot CR to move the substrate W out of the repellent treatment unit 5. As a result, the central robot CR moves the substrate W out of the repellent treatment unit 5.

Next, in step S11, the control unit 21 controls the central robot CR to carry the substrate W with the repellent substance attached to the side surface 515, or the substrate W with the repellent substance attached to the side surface 515, the front shoulder 512, and the back shoulder 514 into the processing unit 1. As a result, the central robot CR carries the substrate W into the processing unit 1.

Next, in step S12, the control unit 21 controls the processing unit 1 in such a manner that the substrate W is processed by the processing liquid. As a result, the processing unit 1 processes the substrate W by the processing liquid. As an example, the back side nozzle 8 (FIG. 1) of the processing unit 1 processes the back side A2 of the substrate W by spraying the processing liquid onto the back side A2 of the substrate W. As another example, the front side nozzle 7 (FIG. 1) of the processing unit 1 processes the front side A1 of the substrate W by spraying the processing liquid onto the front side A1 of the substrate W.

Next, in step S13, the control unit 21 controls the central robot CR to carry out the substrate W from the processing unit 1. As a result, the central robot CR carries out the substrate W from the processing unit 1. Then, the processing is completed.

As described above with reference to FIG. 12 , according to the substrate processing method of this embodiment, the brush 151 is separated from the side surface 515 of the substrate W, and the excess repellent substance is removed (step S6). Therefore, the repellent substance can be retained on the side surface 515 of the substrate W, and the excess repellent substance can be removed.

Furthermore, according to the present embodiment, in step S12, for example, even when the processing liquid is sprayed on the back surface A2 of the substrate W, the processing liquid can be prevented from circumventing the front surface A1 of the substrate W. This is because in step S6, only the excess repellent material is removed, and the repellent material is attached to the side surface 515 of the substrate W.

Next, referring to FIG. 13 , the recess 52 formed on the substrate W is described. FIG. 13 is a top view of the substrate W. As shown in FIG. 13 , there is a case where the substrate W has a recess 52. The recess 52 is a recessed portion that is recessed from the end surface 51 of the substrate W toward the inner side in the radial direction RD when viewed from above. The width of the recess 52 in the circumferential direction CD is, for example, smaller as it approaches the inner side in the radial direction RD.

Next, referring to FIG. 9 and FIG. 14 , the relationship between the recess 52 and the brush 151 is explained. FIG. 14 is a top view showing the state where the brush 151 contacts the recess 52. FIG. 14 shows the largest part MX1 of the first inclined contact portion 43 in the brush 151. In addition, the first outer contact portion B11 is represented by a two-point chain.

As shown in FIG. 14 , at least a portion of the brush 151 enters the recess 52 existing in the end surface portion 51 of the substrate W and contacts the bottom point BM of the recess 52. Therefore, according to this embodiment, the repellent substance can be retained in the necessary portion of the repellent substance in the recess 52, and the repellent substance can be removed from the unnecessary portion of the repellent substance in the recess 52 and the vicinity of the recess 52, as in the case of the end surface portion 51, the body front peripheral portion 501, and the body back peripheral portion 502. The necessary portion of the repellent substance includes at least the portion of the recess 52 corresponding to the side surface portion 515. The liquid-repellent substance necessary portion may also include one or more of the portion of the notch 52 corresponding to the front shoulder 512, the portion corresponding to the back shoulder 514, the portion corresponding to the front edge 511, and the portion corresponding to the back edge 513. The liquid-repellent substance unnecessary portion is the portion of the notch 52 other than the liquid-repellent substance necessary portion.

In the example of FIG. 14 , the entire first inclined contact portion 43 and the entire second inclined contact portion 44 ( FIG. 9 ) of the brush 151 enter the recess 52 in a top view. However, as long as the first inclined contact portion 43 and the second inclined contact portion 44 of the brush 151 contact the bottom point BM of the recess 52, a portion of the first inclined contact portion 43 and a portion of the second inclined contact portion 44 may enter the recess 52 in a top view.

In the example of FIG. 14 , the diameter 2R of the brush 151 is smaller than the maximum width L of the recess 52 in the circumferential direction CD. "R" represents the radius of the brush 151 in a top view. As shown in FIG. 9 , in this embodiment, the radius R of the brush 151 represents the radius Rmx of the largest portion MX1 of the first inclined contact portion 43 of the brush 151. Similarly, the diameter 2R of the brush 151 represents the diameter 2Rmx of the largest portion MX1 of the first inclined contact portion 43 of the brush 151. In the example of FIG. 14 , the diameter 2R of the brush 151 is smaller than the depth D of the recess 52 in the radial direction RD. Therefore, in a top view, the entire first inclined contact portion 43 and the entire second inclined contact portion 44 of the brush 151 fall inside the recess 52. Since the substrate W rotates in the rotation direction D1, the brush 151 moves relative to the recess 52. Therefore, in a top view, the entire recess 52 can be covered so that the repellent substance is retained in the necessary part of the repellent substance, and the repellent substance is removed from the unnecessary part of the repellent substance by the first inclined contact portion 43 and the second inclined contact portion 44. Similarly, in a top view, the entire vicinity of the recess 52 can be covered so that the repellent substance is removed by the first outer contact portion B11 and the second outer contact portion B21 (Figure 9).

In particular, in this embodiment, the force applying mechanism 159 (FIG. 3) applies force to the brush 151 toward the inner side of the radial direction RD of the substrate W. Therefore, when the brush 151 is located in the recess 52 as the substrate W rotates, the first inclined contact portion 43 and the second inclined contact portion 44 of the brush 151 quickly enter the recess 52. As a result, the repellent substance can be more reliably removed from the unnecessary portion of the repellent substance in the recess 52.

Next, referring to FIG. 9, FIG. 13 and FIG. 15, an example of a method for determining the radius R of the brush 151 is described. As shown in FIG. 13, the width L of the notch 52 is expressed by formula (1). In formula (1), "Rw" represents the radius of the substrate W. "θ" represents the center angle relative to the notch 52. The unit of the center angle θ is "degree".

L=2π×Rw×(θ/360)…(1)

FIG15 is a top view showing the brush 151 and the notch 52. FIG15 shows the largest part MX1 of the first inclined contact portion 43 in the brush 151. In addition, the first outer contact portion B11 is represented by a two-point chain. As shown in FIG15, the bottom point BM of the notch 52 is taken as the origin 0, and the x-coordinate and the y-coordinate are defined. And, the notch 52 is approximated by the parabola y. Therefore, the notch 52 is represented by formula (2). The coefficient a of formula (2) is represented by formula (3).

y=a×x ² …(2)

a=y/x ² =By/Ax ² …(3)

The radius of curvature Rc at each point x of the parabola y is expressed by equation (4). "y1" represents the first differential of equation (2) and is expressed by equation (5). "y2" represents the second differential of equation (2) and is expressed by equation (6).

Rc=(1+y1 ² ) ^3/2 /y2…(4)

y1=dy/dx…(5)

y2=dy/dx…(6)

The radius of curvature R0 at the origin 0 of the parabola y, that is, the radius of curvature R0 at the bottom point BM of the notch 52 is expressed by equation (7). That is, in equation (7), x=0.

R0=(1+(2a) ² ×x ² ) ^3/2 /2a=1/2a…(7)

In this embodiment, the radius of curvature R0 at the origin 0 is set as the radius R of the brush 151. Therefore, the first inclined contact portion 43 and the second inclined contact portion 44 of the brush 151 can be surely entered into the recess 52. As a result, the repellent substance can be surely removed from the unnecessary part of the repellent substance in the recess 52.

Here, as an example, the maximum value Rmax and the minimum value Rmin of the radius R of the brush 151 are calculated.

First, calculate the maximum value Rmax. In this case, if the radius of the substrate W is Rw = 150mm and the center angle θ = 2, then according to formula (1), the width of the notch 52 is L = 5.24mm. Also, if Ax = 2.62mm, By = 1.20mm, then according to formula (3), the coefficient a = 0.175. If the coefficient a is substituted into formula (7), the maximum value of the curvature radius R0 is 2.86mm. Therefore, the maximum value Rmax of the radius R of the brush 151 is set to 2.86mm.

Next, the minimum value Rmin is calculated. In this case, if the radius of the substrate W is set to Rw = 150mm and the center angle θ = 1.5, then according to formula (1), the width of the notch 52 is L = 3.93mm. Also, if Ax = 1.96mm, By = 1.20mm, then according to formula (3), the coefficient a = 0.31. If the coefficient a is substituted into formula (7), the minimum value of the curvature radius R0 becomes 1.61mm. Therefore, the minimum value Rmin of the radius R of the brush 151 is set to 1.61mm.

That is, for example, when the width L of the notch 52 is greater than 3.93 mm and less than 5.24 mm, the radius R of the brush 151 is set to greater than 1.61 mm and less than 2.86 mm.

(Variation 1)

Referring to Figures 16 to 18, the brush 151C of the first variation of this embodiment is described. The main difference between the first variation and the embodiment described in Figure 8 is that the first inner contact portion B12c and the second inner contact portion B22c of the brush 151C of the first variation are movable. The following mainly describes the differences between the first variation and the embodiment.

FIG. 16 is a cross-sectional view showing the brush 151C of the first variation. As shown in FIG. 16 , the first outer contact portion B11c has an inner space SP1. The inner space SP1 can accommodate the first inner contact portion B12c.

The first inner contact portion B12c includes a slider 181 and a body 185. The body 185 is mounted on the outer circumference of the slider 181. The slider 181 has a substantially cylindrical shape. The slider 181 is inserted into the shaft 161. The slider 181 can move along the axial direction AD in the shaft 161. Therefore, the first inner contact portion B12c can move along the axial direction AD in the shaft 161. In addition, the slider 181 rotates around the rotation axis AX2 together with the shaft 161. In this case, the engaging portion of the slider 181 engages with the engaging portion of the shaft 161. The engaging portion of the slider 181 is, for example, a convex portion extending in the axial direction AD, and the engaging portion of the shaft 161 is, for example, a concave portion extending in the axial direction AD.

The inner space SP1 includes a gap GP1 and a gap GP2. The gap GP1 represents the space between the upper surface 71 of the first inner contact portion B12c and the inner upper surface 72 of the first outer contact portion B11c. The gap GP2 represents the space between the outer peripheral surface 75 of the first inner contact portion B12c and the inner peripheral surface 74 of the first outer contact portion B11c.

On the other hand, the second outer contact portion B21c has an inner space SP2. The inner space SP2 can accommodate the second inner contact portion B22c.

The second inner contact portion B22c includes a slider 182 and a body 186. The body 186 is mounted on the outer circumference of the slider 182. The slider 182 has a substantially cylindrical shape. The slider 182 is inserted into the shaft 161. The slider 182 can move along the axis AD in the shaft 161. Therefore, the second inner contact portion B22c can move along the axis AD in the shaft 161. In addition, the slider 182 rotates around the rotation axis AX2 together with the shaft 161. The structure of the slider 182 is the same as that of the slider 181.

The inner space SP2 includes a gap GP3 and a gap GP4. The gap GP3 represents the space between the upper surface 91 of the second inner contact portion B22c and the inner upper surface 92 of the second outer contact portion B21c. The gap GP4 represents the space between the outer peripheral surface 95 of the second inner contact portion B22c and the inner peripheral surface 94 of the second outer contact portion B21c.

In addition, as a first example, a force member for applying force to the first inner contact portion B12c downward may be arranged in the gap GP1, and a force member for applying force to the second inner contact portion B22c upward may be arranged in the gap GP3. The force member is, for example, an elastic member such as a spring. In addition, as a second example, spacers may be arranged in the gap GP1 and the gap GP3, respectively, to fix the positions of the first inner contact portion B12c and the second inner contact portion B22c. In the first and second examples, a stopper is arranged below the first inner contact portion B12c and above the second inner contact portion B22c in the opposing shaft portion 161a.

Next, referring to FIG. 17 and FIG. 18 , the removal process of the liquid-repellent substance of the brush 151C in the first variation is described. FIG. 17 is a diagram showing the first step S1000 of the removal process of the liquid-repellent substance of the brush 151C. FIG. 18 is a diagram showing the second step S2000 of the removal process of the liquid-repellent substance of the brush 151C.

As shown in FIG. 17 and FIG. 18 , in the first step S1000 and the second step S2000, the slider 181 moves downward, and the first inner contact portion B12c (specifically, the first inclined contact portion 43) protrudes downward from the first outer contact portion B11c. In addition, the slider 182 moves upward, and the second inner contact portion B22c (specifically, the second inclined contact portion 44) protrudes upward from the second outer contact portion B21c.

First, as shown in FIG. 17 , in the first step S1000, the flat surface B14 of the first outer contact portion B11c contacts the area M2 of the front peripheral portion 501 of the body, and the inclined surface B13 of the first inner contact portion B12c contacts the front edge 511. As a result, the repellent material attached to the area M2 and the front edge 511 is removed (separated) by the removal liquid. In addition, in the first step S1000, the flat surface B24 of the second outer contact portion B21c contacts the area N2 of the back peripheral portion 502 of the body, and the inclined surface B23 of the second inner contact portion B22c contacts the back edge 513. As a result, the repellent material attached to the area N2 and the back edge 513 is removed (separated) by the removal liquid.

However, when the first step S1000 is completed, the repellent substance 85 remains in the area M1 of the front peripheral portion 501 of the main body and the area N1 of the back peripheral portion 502 of the main body.

Therefore, after the first step S1000 is completed, the swing arm 152 (Figure 3) moves the brush 151C in the direction DA. The direction DA indicates the direction toward the outside of the radial direction RD. Specifically, the swing arm 152 moves the brush 151C in the direction DA by a distance equivalent to the distance between the area M1 and the area N1.

In addition, the area M1 represents the radial RD inner part of the front peripheral part 501 of the main body, and the area M2 represents the radial RD outer part of the front peripheral part 501 of the main body. The area N1 represents the radial RD inner part of the back peripheral part 502 of the main body, and the area N2 represents the radial RD outer part of the back peripheral part 502 of the main body.

Next, as shown in FIG. 18 , in the second step S2000, the flat surface B14 of the first outer contact portion B11c contacts the area M1 of the front peripheral portion 501 of the body, and the inclined surface B13 of the first inner contact portion B12c is separated from the front edge portion 511. As a result, the repellent material attached to the area M1 is removed (separated) by the removal liquid. In addition, in the second step S2000, the flat surface B24 of the second outer contact portion B21c contacts the area N1 of the back peripheral portion 502 of the body, and the inclined surface B23 of the second inner contact portion B22c is separated from the back edge portion 513. As a result, the repellent substances attached to the area N1 are removed (separated) by the removal liquid.

As a result of the above, in the first variation, the repellent substance 82 remains on the side surface 515, the front shoulder 512 and the back shoulder 514 of the substrate W. In addition, the first step S1000 can also be performed after the second step S2000.

Furthermore, in the first variation, the brush 151C has sliders 181 and 182. Therefore, the interval between the first inner contact portion B12c and the second inner contact portion B22c in the axial direction AD can be scaled. As a result, the positions of the first inner contact portion B12c (inclined surface B13) and the second inner contact portion B22c (inclined surface B23) in the axial direction AD can be set in accordance with the shape of the end surface portion 51 of the substrate W.

(Variation 2)

Referring to FIG. 19 , the brush 151D of the second variation of this embodiment is described. The difference between the second variation and the embodiment described in FIG. 8 is mainly that the first inner contact portion B12 of the brush 151D of the second variation follows the shape of the front edge 511 and the front shoulder 512. The following mainly describes the differences between the second variation and the embodiment.

FIG. 19 is a diagram showing an example of the removal process of the repellent substance of the brush 151D of the second variation. In FIG. 19 , the side surface of the brush 151D is shown for easy understanding of the diagram, and the cross section of the substrate W is shown. In addition, the oblique lines representing the cross section are omitted to simplify the diagram.

As shown in FIG. 19 , the first inclined contact portion 43d has a first contact surface B15 and a second contact surface B16. The first contact surface B15 has a shape following the front edge 511. Therefore, the first contact surface B15 contacts the front edge 511, and the liquid-repellent substance attached to the front edge 511 is removed (separated) by the removal liquid. The second contact surface B16 has a shape following the front shoulder 512. Therefore, the second contact surface B16 contacts the front shoulder 512, and the liquid-repellent substance attached to the front shoulder 512 is removed (separated) by the removal liquid.

Furthermore, the second inclined contact portion 44d has a first contact surface B25 and a second contact surface B26. The first contact surface B25 has a shape following the back edge 513. Therefore, the first contact surface B25 contacts the back edge 513, and the liquid-repellent substance attached to the back edge 513 is removed (separated) by the removal liquid. The second contact surface B26 has a shape following the back shoulder 514. Therefore, the second contact surface B26 contacts the back shoulder 514, and the liquid-repellent substance attached to the back shoulder 514 is removed (separated) by the removal liquid.

As a result of the above, in the second variation, the repellent substance 82 remains only on the side surface 515 of the substrate W.

The embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the embodiments described above, and can be implemented in various forms without departing from the scope of the present invention. In addition, the multiple components disclosed in the embodiments described above can be appropriately changed. For example, a certain component of all the components shown in a certain embodiment can be added to the components of other embodiments, or some of the components of all the components shown in a certain embodiment can be deleted from the embodiment.

In addition, the drawings are mainly schematically displayed with each component as the main body to make the invention easier to understand. The thickness, length, number, spacing, etc. of each component shown in the drawings may be different from the actual ones for the convenience of making the drawings. In addition, of course, the composition of each component shown in the above-mentioned implementation form is an example and is not particularly limited. Various changes can be made within the scope that does not substantially deviate from the effect of the present invention.

(1) In the embodiment (including variations) described with reference to FIG. 3 , the brush 151 rotates by the self-rotation mechanism 158. However, the brush 151 may also rotate by following the substrate W. In addition, the brush 151 may not rotate.

(2) In the embodiment described with reference to FIG. 12 , after removing excess repellent material from substrate W, processing unit 1 processes substrate W with processing liquid. However, after removing excess repellent material from substrate W, repellent processing unit 5 processes substrate W with processing liquid. In this case, repellent processing unit 5 has a nozzle for spraying processing liquid onto substrate W. For example, repellent processing unit 5 may also have a front nozzle 7 and/or a back nozzle 8.

(3) The brushes 151, 151A-151D described in FIG. 8-11 and FIG. 16-19 have flat surfaces B14, B24 and inclined surfaces B13, B23, or flat surfaces B14, B24, first contact surfaces B15, B25, and second contact surfaces B16, B26. However, as long as the excess repellent substances can be removed, the shapes of the brushes 151, 151A-151D are not particularly limited.

Furthermore, the first contact portion B1 and the second contact portion B2 may also constitute different brushes. In this case, for example, a shaft and a rotation mechanism are provided for each brush. Furthermore, the first outer contact portion B11, the first inner contact portion B12, the second outer contact portion B21, and the second inner contact portion B22 may also constitute different brushes respectively. In this case, for example, a shaft and a rotation mechanism are provided for each brush.

(4) The rotary chuck 13 shown in FIG. 3 is of vacuum suction type, but it may also be of clamping type or Bernoulli type, for example.

[Industrial availability]

The present invention is preferably used in a substrate processing device and a substrate processing method.

51: End face

82: Disinfectant substances

86: Cleaning fluid

87:Removal agent

151: Brush (removal of components)

161: shaft

331: Cleaning fluid nozzle

501: The front edge of the body

502: The back edge of the body

511: Front edge

512: Front shoulder

513: Back edge

514: Back shoulder

515: Lateral face

A1: Front

A2: Back

AX1,AX2: Rotation axis

P1: Remove position

S400,S500: Steps

W: Substrate

Claims (18)

A substrate processing device comprises: a substrate holding portion, which holds and rotates a substrate to which a repellent substance capable of repelling a processing liquid is attached; and a removing member, which comprises a first contact portion and a second contact portion; and the first contact portion is in contact with at least a peripheral portion of a front surface of the substrate during the rotation of the substrate, thereby causing a removing agent capable of removing the repellent substance to contact the repellent substance attached to the peripheral portion of the front surface of the substrate; and the second contact portion is in contact with at least a peripheral portion of a back surface of the substrate during the rotation of the substrate, thereby causing the removing agent to contact the repellent substance attached to the peripheral portion of the back surface of the substrate. Liquid substance; the front peripheral portion of the above-mentioned body of the above-mentioned substrate refers to the peripheral area in the front of the substrate body; the back peripheral portion of the above-mentioned body of the above-mentioned substrate refers to the peripheral area in the back of the above-mentioned substrate body; the above-mentioned first contact portion and the above-mentioned second contact portion are arranged on the same axis; when the above-mentioned first contact portion contacts the front peripheral portion of the above-mentioned body and the above-mentioned second contact portion contacts the back peripheral portion of the above-mentioned body, the above-mentioned first contact portion and the above-mentioned second contact portion are separated from the radial side portion in the end portion of the above-mentioned substrate; the above-mentioned end portion of the above-mentioned substrate refers to the end portion area that is closer to the radial outside than the above-mentioned substrate body. The substrate processing device of claim 1, wherein the first contact portion comprises: a first outer contact portion, which contacts the peripheral portion of the front surface of the body during the rotation of the substrate, so that the remover contacts the repellent material attached to the peripheral portion of the front surface of the body; and a first inner contact portion, which is disposed on the inner side of the first outer contact portion and contacts the peripheral portion of the front surface of the body. During the rotation of the substrate, the front edge of the end face of the substrate is contacted, so that the remover contacts the liquid-repellent material attached to the front edge; and the front edge of the end face is represented on the front side of the substrate, and the end face is located in a region that is radially outward of the front peripheral portion of the body and radially inward of the side face. The second contact portion includes: a second outer contact portion, which contacts the peripheral portion of the back side of the main body of the substrate during the rotation of the substrate, so that the remover contacts the liquid-repellent material attached to the peripheral portion of the back side of the main body; and a second inner contact portion, which is arranged on the inner side of the second outer contact portion and contacts the peripheral portion of the back side of the main body during the rotation of the substrate. During the process, the above-mentioned remover contacts the above-mentioned liquid-repellent substance attached to the above-mentioned back edge by contacting the back edge of the above-mentioned end face portion of the above-mentioned substrate; and the above-mentioned back edge of the above-mentioned end face portion is represented by the back side of the above-mentioned substrate, and the above-mentioned end face portion is located in a region that is radially outward of the back peripheral portion of the above-mentioned body, and is located in a region that is radially inward of the above-mentioned side face portion. The substrate processing device of claim 2, wherein the first outer contact portion has a flat surface in contact with the front peripheral portion of the body; the first inner contact portion has an inclined surface in contact with the front peripheral portion; the second outer contact portion has a flat surface in contact with the back peripheral portion of the body; the second inner contact portion has an inclined surface in contact with the back peripheral portion. A substrate processing device as claimed in claim 2 or 3, wherein the interval between the first inner contact portion and the second inner contact portion is scalable. The substrate processing device according to any one of claims 1 to 3 further comprises: an inert gas spraying unit that sprays inert gas from between the first contact portion and the second contact portion. A substrate processing device as claimed in any one of claims 1 to 3, wherein the removal member is separated from the side surface of the substrate and contacts at least the front peripheral portion of the body and the back peripheral portion of the body while rotating. A substrate processing device as claimed in any one of claims 1 to 3, wherein at least a portion of the removal member enters a recess existing in the end surface portion of the substrate and contacts the bottom point of the recess. The substrate processing device of claim 7 further comprises: a force applying mechanism, which applies force to the removal member inwardly toward the diameter of the substrate. The substrate processing device according to any one of claims 1 to 3 further comprises: A removing agent supply unit that supplies the removing agent to the removing component. A substrate processing method uses a removal agent capable of removing a repellent substance to contact a removal member of the repellent substance, and includes the following steps: holding the substrate to which the repellent substance is attached and rotating it; and simultaneously performing a first contact action and a second contact action; and the removal member includes a first contact portion and a second contact portion arranged on the same axis; the first contact action is to make the first contact portion contact at least the peripheral portion of the front surface of the substrate during the rotation of the substrate, thereby making the removal agent contact the repellent substance attached to the peripheral portion of the front surface of the substrate; the second contact action is to make the first contact portion contact the first contact portion during the rotation of the substrate, thereby making the removal agent contact the repellent substance attached to the peripheral portion of the front surface of the substrate; During the rotation period, the second contact portion is brought into contact with at least the peripheral portion of the back side of the main body of the substrate, thereby bringing the removal agent into contact with the liquid-repellent substance attached to the peripheral portion of the back side of the main body; the peripheral portion of the front side of the main body of the substrate refers to the peripheral area in the front side of the main body of the substrate; the peripheral portion of the back side of the main body of the substrate refers to the peripheral area in the back side of the main body of the substrate; in the first contact action and the second contact action, the first contact portion and the second contact portion are separated from the radial side portion in the end face portion of the substrate; the end face portion of the substrate refers to the end face region that is radially outward of the main body of the substrate. The substrate processing method of claim 10, wherein the first contact portion includes a first outer contact portion and a first inner contact portion disposed on the inner side of the first outer contact portion; in the step of simultaneously performing the first contact action and the second contact action, a first body contact action and a first end surface contact action are performed as the first contact action; the first body contact action is performed by causing the first outer contact portion to contact the peripheral portion of the front surface of the body during the rotation of the substrate, so that the removal agent The first end surface contacting action is to make the first inner contact portion contact the front edge of the end surface of the substrate during the rotation of the substrate, so that the removal agent contacts the liquid-repellent substance attached to the front edge; the front edge of the end surface is represented by the front side of the substrate, and the end surface is located in a region that is radially outward of the front peripheral portion of the body and is radially closer to the side surface than the side surface. The second contact portion includes a second outer contact portion and a second inner contact portion disposed inside the second outer contact portion; in the above-mentioned step of simultaneously performing the above-mentioned first contact action and the above-mentioned second contact action, performing a second body contact action and a second end face contact action as the above-mentioned second contact action; the above-mentioned second body contact action is to make the above-mentioned second outer contact portion contact the peripheral portion of the back side of the above-mentioned body of the above-mentioned substrate during the rotation of the above-mentioned substrate, so that the above-mentioned remover contacts and adheres to the above-mentioned first contact action and the second end face contact action. The second end surface contacting action is to make the second inner contact part contact the back edge of the end surface of the substrate during the rotation of the substrate, so that the removal agent contacts the liquid-repellent substance attached to the back edge; The back edge of the end surface is represented by the back side of the substrate, and the end surface is located in a region that is radially outward of the back edge of the body and radially inward of the side surface. The substrate processing method of claim 11, wherein the first outer contact portion has a flat surface in contact with the front peripheral portion of the body; the first inner contact portion has an inclined surface in contact with the front peripheral portion; the second outer contact portion has a flat surface in contact with the back peripheral portion of the body; and the second inner contact portion has an inclined surface in contact with the back peripheral portion. A substrate processing method as claimed in claim 11 or 12, wherein the interval between the first inner contact portion and the second inner contact portion is scalable. A substrate processing method as claimed in any one of claims 10 to 12, wherein in the above step of performing the above first contact action and the above second contact action simultaneously, an inert gas is sprayed from between the above first contact portion and the above second contact portion. A substrate processing method as claimed in any one of claims 10 to 12, wherein in the above step of simultaneously performing the above first contact action and the above second contact action, the above removal member is spaced apart from the above side surface of the above substrate, and the above removal member is rotated while the above removal member is in contact with at least the front peripheral portion of the above body and the back peripheral portion of the above body. A substrate processing method as claimed in any one of claims 10 to 12, wherein in the above step of simultaneously performing the above first contact action and the above second contact action, at least a portion of the above removal member enters the recess existing in the above end surface of the above substrate and contacts the bottom point of the above recess. As in the substrate processing method of claim 16, in the above step of simultaneously performing the above first contact action and the above second contact action, the above removal component is forced radially inward toward the above substrate. The substrate processing method of any one of claim 10 to 12 further comprises the following step: supplying the above-mentioned removal agent to the above-mentioned removal component.