TWI876172B - Double-sided polishing conditioner - Google Patents
Double-sided polishing conditioner Download PDFInfo
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- TWI876172B TWI876172B TW111120947A TW111120947A TWI876172B TW I876172 B TWI876172 B TW I876172B TW 111120947 A TW111120947 A TW 111120947A TW 111120947 A TW111120947 A TW 111120947A TW I876172 B TWI876172 B TW I876172B
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Description
本發明涉及一種研磨工具,特別是涉及一種兩面使用的研磨修整器,可廣泛使用於脆硬材料如陶瓷、金屬、玻璃、晶圓等的加工製程。The present invention relates to a grinding tool, in particular to a grinding dresser for use on both sides, which can be widely used in the processing of brittle and hard materials such as ceramics, metals, glass, wafers, etc.
在半導體製程中,晶圓上不斷的經過沉積、曝光、顯影與蝕刻,以形成一層層的微電路;若每層微電路都凹凸不平,勢必會影響層間的疊加,因此須達到相當程度的平坦化,才有辦法製作出性能佳的積體電路。In the semiconductor manufacturing process, wafers are continuously deposited, exposed, developed, and etched to form layers of microcircuits. If each layer of microcircuit is uneven, it will inevitably affect the stacking of layers. Therefore, a certain degree of flatness must be achieved in order to produce integrated circuits with good performance.
化學機械研磨(Chemical Mechanical Polishing, CMP)是半導體製程中常見的平坦化技術之一,其是利用拋光墊(Pad)對晶圓(或其他半導體元件)接觸,並視需要搭配使用研磨液,使拋光墊透過化學反應與物理機械力將晶圓表面之雜質或不平坦結構移除。而當拋光墊使用一段時間後,研磨過程產生的磨屑容易積滯於拋光墊表面,造成研磨效果及效率降低,此時須利用修整器(Conditioner)對拋光墊表面進行修整,使拋光墊維持在最佳的使用狀態。Chemical Mechanical Polishing (CMP) is one of the common planarization technologies in semiconductor manufacturing. It uses a polishing pad (Pad) to contact the wafer (or other semiconductor components), and uses polishing fluid as needed to remove impurities or uneven structures on the wafer surface through chemical reactions and physical mechanical forces. After the polishing pad has been used for a period of time, the grinding debris generated during the grinding process is likely to accumulate on the surface of the polishing pad, resulting in reduced polishing effect and efficiency. At this time, a conditioner must be used to condition the surface of the polishing pad to keep the polishing pad in the best use condition.
然而,在現有的修整器中,附有研磨粒的研磨單元(如研磨塊)是由非工作面固接至載體,也就是說,只有一面能實際發揮作用,真正參與修整拋光墊之研磨粒很有限;這樣既造成了研磨粒的浪費,也縮短了修整器的使用壽命。此外,現有的修整器因操作瑕疵或是使用損耗而導致部分的研磨單元失去修整能力時,只能將整個修整器汰換。However, in the existing dressers, the grinding unit (such as the grinding block) with abrasive grains attached is fixed to the carrier by the non-working surface, that is, only one side can actually play a role, and the abrasive grains that actually participate in dressing the polishing pad are very limited; this not only causes a waste of abrasive grains, but also shortens the service life of the dresser. In addition, when the existing dresser loses its dressing ability due to operational defects or wear and tear, the entire dresser can only be replaced.
本發明所要解決的技術問題在於,針對現有技術的不足提供一種兩面使用的研磨修整器,其正反兩面皆可用來對拋光墊進行修整,例如去除拋光墊表面所堆積的廢料以維持良好的加工品質和效率。The technical problem to be solved by the present invention is to provide a double-sided grinding dresser to address the shortcomings of the prior art. Both the front and back sides of the grinding dresser can be used to dress the polishing pad, for example, to remove the waste accumulated on the surface of the polishing pad to maintain good processing quality and efficiency.
為了解決上述的技術問題,本發明所採用的其中一技術方案是提供一種兩面使用的研磨修整器,其包括一載體、多個研磨塊及一結合材料。所述載體具有一上表面及與所述上表面相對的一下表面,並具有一載體中心及圍繞所述載體中心呈間隔分布的多個開口結構。多個所述研磨塊分別設置於多個所述開口結構內,其中每一所述研磨塊具有外露於所述載體的所述上表面的一第一研磨面及外露於所述載體的所述下表面的一第二研磨面。所述結合材料填入多個所述開口結構內,以固定住多個所述研磨塊。In order to solve the above technical problems, one of the technical solutions adopted by the present invention is to provide a double-sided grinding dresser, which includes a carrier, a plurality of grinding blocks and a bonding material. The carrier has an upper surface and a lower surface opposite to the upper surface, and has a carrier center and a plurality of opening structures distributed at intervals around the carrier center. The plurality of grinding blocks are respectively arranged in the plurality of opening structures, wherein each of the grinding blocks has a first grinding surface exposed on the upper surface of the carrier and a second grinding surface exposed on the lower surface of the carrier. The bonding material is filled into the plurality of opening structures to fix the plurality of grinding blocks.
在本發明的一實施例中,每一所述開口結構具有一鏤空部及設置於所述鏤空部周圍的至少一承靠部。每一所述研磨塊包括一研磨部及設置於所述研磨部周圍的至少一翼部,所述研磨部容置於對應的所述開口結構的所述鏤空部內,且所述第一研磨面與所述第二研磨面彼此相對地形成於所述研磨部上,且至少一所述翼部抵靠於對應的所述開口結構的至少一所述承靠部上。所述結合材料經配置以使每一所述研磨塊的至少一所述翼部與對應的所述開口結構的至少一所述承靠部連接成一體。In an embodiment of the present invention, each of the opening structures has a hollow portion and at least one supporting portion disposed around the hollow portion. Each of the grinding blocks includes a grinding portion and at least one wing portion disposed around the grinding portion, the grinding portion is accommodated in the hollow portion of the corresponding opening structure, and the first grinding surface and the second grinding surface are formed on the grinding portion opposite to each other, and at least one wing portion abuts against at least one supporting portion of the corresponding opening structure. The bonding material is configured to connect at least one wing portion of each grinding block and at least one supporting portion of the corresponding opening structure into one body.
在本發明的一實施例中,每一所述研磨塊的至少一所述翼部被一部分的所述結合材料固定於對應的所述開口結構的至少一所述承靠部上。In one embodiment of the present invention, at least one wing portion of each of the grinding blocks is fixed to at least one supporting portion of the corresponding opening structure by a portion of the bonding material.
在本發明的一實施例中,每一所述研磨塊的至少一所述翼部具有至少一貫穿孔,且另一部分的所述結合材料通過至少一所述貫穿孔以接觸到對應的所述開口結構的至少一所述承靠部。In one embodiment of the present invention, at least one wing portion of each of the grinding blocks has at least one through hole, and another portion of the bonding material passes through at least one through hole to contact at least one supporting portion of the corresponding opening structure.
在本發明的一實施例中,至少一所述承靠部完全環繞所述鏤空部。In an embodiment of the present invention, at least one of the supporting portions completely surrounds the hollow portion.
在本發明的一實施例中,所述載體具有與多個所述開口結構位置互不重疊的多個第一固定孔,且多個所述第一固定孔鄰近於所述載體的邊緣。In an embodiment of the present invention, the carrier has a plurality of first fixing holes that do not overlap with the positions of the plurality of opening structures, and the plurality of first fixing holes are adjacent to the edge of the carrier.
在本發明的一實施例中,所述兩面使用的研磨修整器更包括一安裝墊片,所述安裝墊片固定於所述載體的所述上表面或所述下表面上,且避開多個所述開口結構所在的位置。In one embodiment of the present invention, the double-sided grinding dresser further includes a mounting pad, which is fixed on the upper surface or the lower surface of the carrier and avoids the position where the plurality of opening structures are located.
在本發明的一實施例中,所述安裝墊片的厚度大於所述第一研磨面相對於所述載體的所述上表面的高度,或大於所述第二研磨面相對於所述載體的所述下表面的高度。In one embodiment of the present invention, the thickness of the mounting pad is greater than the height of the first grinding surface relative to the upper surface of the carrier, or greater than the height of the second grinding surface relative to the lower surface of the carrier.
在本發明的一實施例中,所述載體具有與多個所述開口結構位置互不重疊的多個第一固定孔,且多個所述第一固定孔鄰近於所述載體的邊緣。另外,所述安裝墊片具有與多個所述第一固定孔位置相對應的多個第一安裝孔。In one embodiment of the present invention, the carrier has a plurality of first fixing holes that do not overlap with the positions of the plurality of opening structures, and the plurality of first fixing holes are adjacent to the edge of the carrier. In addition, the mounting pad has a plurality of first mounting holes corresponding to the positions of the plurality of first fixing holes.
在本發明的一實施例中,每一所述研磨塊包含多個研磨粒,且多個所述研磨粒為多個鑽石顆粒或多個立方氮化硼顆粒。或者,每一所述研磨塊包括一硬質合金主體及一被覆在所述硬質合金主體的一外表面上的研磨層。In one embodiment of the present invention, each of the abrasive blocks comprises a plurality of abrasive grains, and the abrasive grains are a plurality of diamond grains or a plurality of cubic boron nitride grains. Alternatively, each of the abrasive blocks comprises a cemented carbide body and an abrasive layer coated on an outer surface of the cemented carbide body.
在本發明的一實施例中,所述載體呈圓盤狀,多個所述開口結構的數量為四個且圍繞所述載體中心以均勻的間隔分布。In one embodiment of the present invention, the carrier is in the shape of a disk, and the number of the plurality of opening structures is four and they are evenly distributed around the center of the carrier.
本發明的其中一有益效果在於,憑藉“多個研磨塊分別設置於載體的多個開口結構內,其中每一研磨塊具有外露於載體的上表面的第一研磨面及外露於載體的下表面的第二研磨面”以及“結合材料填入載體的多個開口結構內,以固定住多個研磨塊”的技術特徵,本發明的研磨修整器的正反兩面皆可使用,當其中一面已鈍化至失去修整能力時,只需要翻面即可改以另一面進行修整工作。又,多個研磨塊是獨立存在的,對不符工作需求的研磨塊(如損壞的研磨塊)可直接從載體上拆下進行更換,而不需更換整個修整器。One of the beneficial effects of the present invention is that, by virtue of the technical features of "multiple grinding blocks are respectively disposed in multiple opening structures of a carrier, wherein each grinding block has a first grinding surface exposed on the upper surface of the carrier and a second grinding surface exposed on the lower surface of the carrier" and "a bonding material is filled in the multiple opening structures of the carrier to fix the multiple grinding blocks", both sides of the grinding dresser of the present invention can be used. When one side has been passivated to the point of losing the dressing ability, it only needs to be turned over to perform the dressing work on the other side. In addition, the multiple grinding blocks exist independently, and the grinding blocks that do not meet the working requirements (such as damaged grinding blocks) can be directly removed from the carrier for replacement without replacing the entire dresser.
為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。To further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings of the present invention. However, the drawings provided are only used for reference and description and are not used to limit the present invention.
以下是通過特定的具體實施例來說明本發明所公開有關“兩面使用的研磨修整器”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不背離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。The following is an explanation of the implementation of the "double-sided grinding dresser" disclosed in the present invention through specific concrete embodiments. Those skilled in the art can understand the advantages and effects of the present invention from the contents disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and the details in this specification can also be modified and changed in various ways based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are only for simple schematic illustrations and are not depicted according to actual sizes. Please note in advance. The following implementation will further explain the relevant technical contents of the present invention in detail, but the disclosed contents are not intended to limit the scope of protection of the present invention. In addition, the term "or" used herein may include any one or more combinations of the associated listed items as appropriate.
在沒有另行定義的情況下,本文中所使用的術語具有與本領域技術人員的通常理解相同的含義。各實施例中所涉及的材料,如無特別說明則為市售或根據現有技術製得的材料。Unless otherwise defined, the terms used herein have the same meanings as those generally understood by those skilled in the art. The materials involved in each embodiment are commercially available or prepared according to prior art unless otherwise specified.
[第一實施例][First embodiment]
參閱圖1至圖4所示,本發明第一實施例提供一種研磨修整器Z,其主要包括一載體1、多個研磨塊2及一結合材料3。載體1具有一上表面101及與相對的一下表面102,並具有一載體中心1c及圍繞載體中心1c呈間隔分布的多個開口結構11。多個研磨塊2分別設置於多個開口結構11內,其中每一研磨塊2具有外露於載體1的上表面101的一第一研磨面201及外露於載體1的下表面102的一第二研磨面202。結合材料3填入多個開口結構11內,以固定住多個研磨塊2。因此,本發明的研磨修整器Z的正反兩面皆可用來對拋光墊進行修整,例如移除拋光墊表面所堆積的廢料,使拋光墊表面具有一定的粗糙度以維持良好的加工品質和效率。Referring to FIGS. 1 to 4 , the first embodiment of the present invention provides a grinding dresser Z, which mainly includes a carrier 1, a plurality of
進一步地說,多個研磨塊2的第一研磨面201與第二研磨面202都可作為工作面,當多個研磨塊2的第一研磨面201已鈍化至難以修整拋光墊時,只需要將載體1翻面,即可改以多個研磨塊2的第二研磨面202進行修整工作。Furthermore, both the
需要說明的是,雖然在本文中是以晶圓拋光墊的修整為例來描述本發明的研磨修整器Z的特點,但是本發明的研磨修整器Z也可使用於其他修整工序中,對各種脆硬材料如陶瓷、金屬、玻璃、晶圓等的物件進行修整工作。It should be noted that, although the features of the grinding dresser Z of the present invention are described in this article by taking the dressing of wafer polishing pads as an example, the grinding dresser Z of the present invention can also be used in other dressing processes to perform dressing work on various brittle and hard materials such as ceramics, metals, glass, wafers, etc.
在本實施例中,載體1可經配置以將多個研磨塊2固持於一拋光機的驅動頭(圖中未顯示)上,使多個研磨塊2在驅動頭的帶動下對拋光墊進行修整工作,以恢復拋光墊的表面形貌及去除拋光墊表面所堆積的廢料。載體1可為一金屬載體如金屬圓盤,但不限於此;載體1的外徑可為9公分至50公分,厚度可為0.2公分至3公分。然而,載體1的外徑和厚度可因應實際應用需求而彈性地調整。在一些實施例中,載體1也可為一硬質塑膠載體。In this embodiment, the carrier 1 can be configured to hold a plurality of
另外,載體1可具有多個第一固定孔1h1,而多個固定件F如螺釘或螺栓可分別穿設於多個第一固定孔1h1,以實現載體1與拋光機的驅動頭之間的固定連接。進一步地說,多個第一固定孔1h1被設置為避開多個開口結構11,即多個第一固定孔1h1與多個開口結構11的位置互不重疊,且多個第一固定孔1h1鄰近於載體1的邊緣。In addition, the carrier 1 may have a plurality of first fixing holes 1h1, and a plurality of fixing members F such as screws or bolts may be respectively inserted into the plurality of first fixing holes 1h1 to achieve a fixed connection between the carrier 1 and the driving head of the polishing machine. In other words, the plurality of first fixing holes 1h1 are arranged to avoid the plurality of
可選地,載體1還可具有多個第二固定孔1h2,以適應不同廠家、不同型號的機台,或是不同構造、不同尺寸的固定件。進一步地說,多個第二固定孔1h2被設置為避開多個開口結構11及多個第一固定孔1h1,即多個第二固定孔1h2與多個開口結構11及多個第一固定孔1h1的位置互不重疊,且多個第二固定孔1h2的位置比多個第一固定孔1h1更靠近載體中心1c。Optionally, the carrier 1 may also have a plurality of second fixing holes 1h2 to accommodate machines of different manufacturers and models, or fixing parts of different structures and sizes. In other words, the plurality of second fixing holes 1h2 are arranged to avoid the plurality of
如圖2及圖4所示,為了將多個研磨塊2巧妙並緊湊地結合於載體1上,載體1的每一開口結構11具有一鏤空部111及設置於鏤空部111周圍的至少一承靠部112;每一研磨塊2包括一研磨部21及設置於研磨部21周圍的至少一翼部22,其中研磨部21容置於對應的開口結構11的鏤空部111內,且第一研磨面201與第二研磨面202彼此相對地形成於研磨部21上,且至少一翼部22抵靠於對應的開口結構11的至少一承靠部112上。另外,結合材料3經配置以使每一研磨塊2的至少一翼部22與對應的開口結構11的至少一承靠部112連接成一體。進一步地說,每一研磨塊2的至少一翼部22被一部分的結合材料3固定於對應的開口結構11的至少一承靠部112上。As shown in FIG. 2 and FIG. 4 , in order to skillfully and compactly combine a plurality of
實際應用時,多個開口結構11可具有相對於載體中心1c基本上相同的方向性,且在每一開口結構11中,至少一承靠部112可完全環繞鏤空部111;鏤空部111可為一鏤空槽,至少一承靠部112的數量可為一個且形成為環狀。結合材料3可為一黏著材料如合成樹脂組合物,其對載體1有很好的黏結力。然而,以上所述只是可行的實施方式而並非用以限制本發明。In practical application, the plurality of opening
如圖4所示,為了使結合材料3對於多個研磨塊2的固定效果更好,研磨塊2的翼部22可具有至少一貫穿孔22h,而部分的結合材料3可通過至少一貫穿孔22h以接觸到下方的承靠部112,產生近似於鎖固的效果。As shown in FIG. 4 , in order to better fix the
請配合參閱圖11,在本實施例中,研磨塊2可包括一硬質合金主體21a及一被覆在硬質合金主體21a的外表面上的研磨層21b。硬質合金主體21a作為研磨塊2的基礎,在外表面設置有高低起伏的立體圖案;硬質合金可採用碳化鎢、碳化矽或其他硬質金屬,研磨層21b可以是鑽石膜層,但本發明不受限於上述所舉例子。Please refer to FIG. 11 . In this embodiment, the grinding
在一些實施例中,研磨塊2可包含結合劑及研磨粒,且研磨塊2的成型方法可包括熱壓或冷壓成型步驟、燒結、鍍膜步驟及精細加工步驟(即在燒結體上加工出研磨部21及翼部22的步驟)。結合劑可採用樹脂、金屬或陶瓷結合劑;研磨粒可採用鑽石研磨粒或立方氮化硼研磨粒,其尺寸可以是微米等級或奈米等級。In some embodiments, the
請再配合參閱圖7至圖10,需要說明的是,本發明的研磨修整器Z可通過改變多個研磨塊2的數量、形狀和排布方式,以對不同脆硬材料的物件進行修整工作;除此之外,也可同時改變多個研磨塊2中的研磨粒的尺寸和種類。Please refer to Figures 7 to 10. It should be noted that the grinding dresser Z of the present invention can perform dressing work on objects made of different brittle and hard materials by changing the number, shape and arrangement of multiple grinding
[第二實施例][Second embodiment]
參閱圖5及圖6所示,本發明第二實施例提供一種研磨修整器Z,其包括載體1、多個研磨塊2、結合材料3及一安裝墊片4。載體1具有一上表面101及與上表面101相對的一下表面102,並具有一載體中心1c及圍繞載體中心1c呈間隔分布的多個開口結構11。多個研磨塊2分別設置於多個開口結構11內,其中每一研磨塊2具有外露於載體1的上表面101的一第一研磨面201及外露於載體1的下表面102的一第二研磨面202。結合材料3填入多個開口結構11內,以固定住多個研磨塊2。安裝墊片4可固定於載體1的上表面101或下表面102上且避開多個開口結構11所在的位置,以防止多個研磨塊2的第一研磨面201或第二研磨面202受到擠壓而損壞。Referring to FIG. 5 and FIG. 6 , the second embodiment of the present invention provides a grinding dresser Z, which includes a carrier 1, a plurality of grinding
進一步地說,在晶圓拋光墊的修整工序中,載體1與拋光機的驅動頭(圖中未顯示)之間可通過安裝墊片4形成固定連接,從而驅動頭可帶動載體1,使多個研磨塊2以第一研磨面201及第二研磨面202的其中一面對拋光墊進行修整工作,且在安裝墊片4的存在下,第一研磨面201及第二研磨面202的另外一面可與驅動頭保持安全的距離。Furthermore, in the trimming process of the wafer polishing pad, the carrier 1 and the driving head of the polishing machine (not shown in the figure) can be fixedly connected by the mounting
實際應用時,安裝墊片4的厚度大於第一研磨面201相對於載體1的上表面101的高度,或者大於第二研磨面202相對於載體1的下表面102的高度。另外,安裝墊片4具有多個第一安裝孔4h1,其數量和位置與載體1的多個第一固定孔1h1相對應。使用時,可將固定件F如螺釘或螺栓依序穿設於第一固定孔1h1與第一安裝孔4h1,並鎖入拋光機的驅動頭。為了適應不同的固定件或機台,安裝墊片4還可具有多個第二安裝孔4h2,其數量和位置與載體1的多個第二固定孔1h2相對應。In actual application, the thickness of the mounting
第一實施例中提到的相關技術細節在本實施例中依然有效,為了減少重複,這裡不再贅述。同樣地,本實施例中提到的相關技術細節也可以應用在第一實施例中。The relevant technical details mentioned in the first embodiment are still valid in this embodiment, and in order to reduce repetition, they are not repeated here. Similarly, the relevant technical details mentioned in this embodiment can also be applied in the first embodiment.
[實施例的有益效果][Beneficial Effects of Embodiments]
本發明的其中一有益效果在於,憑藉“多個研磨塊分別設置於載體的多個開口結構內,其中每一研磨塊具有外露於載體的上表面的第一研磨面及外露於載體的下表面的第二研磨面”以及“結合材料填入載體的多個開口結構內,以固定住多個研磨塊”的技術特徵,本發明的研磨修整器的正反兩面皆可使用,當其中一面已鈍化至失去修整能力時,只需要翻面即可改以另一面進行修整工作。又,多個研磨塊是獨立存在的,對不符工作需求的研磨塊(如損壞的研磨塊)可直接從載體上拆下進行更換,而不需更換整個修整器。One of the beneficial effects of the present invention is that, by virtue of the technical features of "multiple grinding blocks are respectively disposed in multiple opening structures of a carrier, wherein each grinding block has a first grinding surface exposed on the upper surface of the carrier and a second grinding surface exposed on the lower surface of the carrier" and "a bonding material is filled in the multiple opening structures of the carrier to fix the multiple grinding blocks", both sides of the grinding dresser of the present invention can be used. When one side has been passivated to the point of losing the dressing ability, it only needs to be turned over to perform the dressing work on the other side. In addition, the multiple grinding blocks exist independently, and the grinding blocks that do not meet the working requirements (such as damaged grinding blocks) can be directly removed from the carrier for replacement without replacing the entire dresser.
此外,本發明的研磨修整器可在使用時,可將安裝墊片固定於載體的上表面或下表面上,以防止多個研磨塊的第一研磨面或第二研磨面受到擠壓而損壞。In addition, when the grinding dresser of the present invention is used, the mounting pad can be fixed on the upper surface or the lower surface of the carrier to prevent the first grinding surface or the second grinding surface of the plurality of grinding blocks from being squeezed and damaged.
更進一步來說,本發明的研磨修整器具有使用壽命更長、用料更少、成本更低、使用和維修更方便靈活等優點。Furthermore, the grinding dresser of the present invention has the advantages of longer service life, less material, lower cost, more convenient and flexible use and maintenance, etc.
以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的申請專利範圍內。The above disclosed contents are only the preferred feasible embodiments of the present invention, and do not limit the scope of the patent application of the present invention. Therefore, all equivalent technical changes made by using the contents of the description and drawings of the present invention are included in the scope of the patent application of the present invention.
Z:研磨修整器
1:載體
1c:載體中心
1h1:第一固定孔
1h2:第二固定孔
101:上表面
102:下表面
11:開口結構
111:鏤空部
112:承靠部
2:研磨塊
201:第一研磨面
202:第二研磨面
21:研磨部
21a:硬質合金主體
21b:研磨層
22:翼部
22h:貫穿孔
3:結合材料
4:安裝墊片
4h1:第一安裝孔
4h2:第二安裝孔
F:固定件
Z: Grinding dresser
1:
圖1為本發明第一實施例的研磨修整器組合的立體示意圖。FIG1 is a three-dimensional schematic diagram of a grinding dresser assembly according to a first embodiment of the present invention.
圖2為本發明第一實施例的研磨修整器部分分解的立體示意圖。FIG. 2 is a partially exploded perspective view of the grinding dresser of the first embodiment of the present invention.
圖3為本發明第一實施例的研磨修整器的俯視示意圖。FIG. 3 is a schematic top view of the grinding dresser of the first embodiment of the present invention.
圖4為沿圖3中IV-IV剖線的其中一剖面示意圖,顯示的燒結形式的研磨塊。FIG. 4 is a schematic cross-sectional view along the IV-IV section line in FIG. 3 , showing the sintered abrasive block.
圖5為本發明第二實施例的研磨修整器組合的立體示意圖。FIG5 is a three-dimensional schematic diagram of a grinding dresser assembly according to a second embodiment of the present invention.
圖6為本發明第二實施例的研磨修整器部分分解的立體示意圖。FIG6 is a partially exploded perspective view of a grinding dresser according to a second embodiment of the present invention.
圖7至圖10為本發明第一和第二實施例的研磨修整器的不同實施態樣的示意圖。7 to 10 are schematic diagrams of different implementations of the grinding dresser of the first and second embodiments of the present invention.
圖11為沿圖3中IV-IV剖線的另外一剖面示意圖,顯示的覆膜形式的研磨塊。FIG. 11 is another schematic cross-sectional view along the IV-IV section line in FIG. 3 , showing the film-coated polishing block.
Z:研磨修整器
1:載體
1c:載體中心
1h1:第一固定孔
1h2:第二固定孔
101:上表面
102:下表面
11:開口結構
111:鏤空部
112:承靠部
2:研磨塊
21:研磨部
22:翼部
22h:貫穿孔
3:結合材料
Z: grinding dresser
1:
Claims (10)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW111120947A TWI876172B (en) | 2022-06-07 | 2022-06-07 | Double-sided polishing conditioner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW111120947A TWI876172B (en) | 2022-06-07 | 2022-06-07 | Double-sided polishing conditioner |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202349483A TW202349483A (en) | 2023-12-16 |
| TWI876172B true TWI876172B (en) | 2025-03-11 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111120947A TWI876172B (en) | 2022-06-07 | 2022-06-07 | Double-sided polishing conditioner |
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| Country | Link |
|---|---|
| TW (1) | TWI876172B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201038362A (en) * | 2009-04-21 | 2010-11-01 | Chien-Min Sung | Assembled grinding machine and manufacturing method thereof |
| TW201100198A (en) * | 2009-06-19 | 2011-01-01 | Chien-Min Sung | Assembly type trimmer |
| TW201434585A (en) * | 2013-03-15 | 2014-09-16 | Kinik Co | Stick-type chemical mechanical polishing conditioner and manufacturing method thereof |
| TWM642196U (en) * | 2022-06-07 | 2023-06-11 | 鑽面奈米科技股份有限公司 | Grinding trimmer for two-side use |
-
2022
- 2022-06-07 TW TW111120947A patent/TWI876172B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201038362A (en) * | 2009-04-21 | 2010-11-01 | Chien-Min Sung | Assembled grinding machine and manufacturing method thereof |
| TW201100198A (en) * | 2009-06-19 | 2011-01-01 | Chien-Min Sung | Assembly type trimmer |
| TW201434585A (en) * | 2013-03-15 | 2014-09-16 | Kinik Co | Stick-type chemical mechanical polishing conditioner and manufacturing method thereof |
| TWM642196U (en) * | 2022-06-07 | 2023-06-11 | 鑽面奈米科技股份有限公司 | Grinding trimmer for two-side use |
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| Publication number | Publication date |
|---|---|
| TW202349483A (en) | 2023-12-16 |
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