TWI872929B - Projection display device and optical shielding element thereof - Google Patents
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Description
本案關於一種投影顯示裝置,尤指一種具有光學遮蔽件的投影顯示裝置。The present invention relates to a projection display device, and more particularly to a projection display device having an optical shielding member.
目前,數位光處理(Digital Light Processing,DLP)顯像技術已經被廣泛地使用於投影顯示設備中。一般而言,在數位光處理之投影顯示設備中,圖像是由數位微鏡裝置(Digital Micromirror Device,DMD)反射光線所產生的。Currently, digital light processing (DLP) imaging technology has been widely used in projection display devices. Generally speaking, in digital light processing projection display devices, images are generated by reflecting light from a digital micromirror device (DMD).
傳統的數位微鏡裝置包含基板及複數個微型反射鏡片,其中複數個微型反射鏡片陣列地設置於基板上,且架構形成數位微鏡裝置之第一區域。每一個微型反射鏡片控制投影圖像中的一個像素。數位微鏡裝置之第二區域形成於基板未設置微型反射鏡片的部分。當入射光照射於數位微鏡裝置時,數位微鏡裝置的第一區域的微型反射鏡片反射光線,並投影成圖像。然而,入射光亦同時照射於數位微鏡裝置的第二區域,使第二區域反射光線而形成雜散光,該雜散光將造成干擾而導致投影成像品質不佳。A conventional digital micromirror device includes a substrate and a plurality of micro-reflective mirrors, wherein the plurality of micro-reflective mirrors are arranged in an array on the substrate and are structured to form a first region of the digital micromirror device. Each micro-reflective mirror controls a pixel in the projected image. The second region of the digital micromirror device is formed on the portion of the substrate where the micro-reflective mirrors are not arranged. When incident light is irradiated on the digital micromirror device, the micro-reflective mirrors in the first region of the digital micromirror device reflect the light and project it into an image. However, the incident light also irradiates the second region of the digital micromirror device at the same time, causing the second region to reflect the light and form stray light, which will cause interference and result in poor projection imaging quality.
有鑑於此,實有必要發展一種投影顯示裝置及其光學遮蔽件,以解決現有技術所面臨之問題。In view of this, it is necessary to develop a projection display device and an optical shielding member thereof to solve the problems faced by the prior art.
本案之目的在於提供一種投影顯示裝置及其光學遮蔽件,其可減少雜散光的產生,以提升投影成像品質。The purpose of this case is to provide a projection display device and an optical shielding member thereof, which can reduce the generation of stray light to improve the projection imaging quality.
為達前述目的,本案之一廣義實施態樣為提供一種光學遮蔽件,適用於一投影顯示裝置,其中投影顯示裝置包含發光單元及數位微鏡裝置。發光單元以一入射光投射至數位微鏡裝置,使數位微鏡裝置反射入射光,並投影成像。光學遮蔽件包含框體及鍍膜層。框體包含本體及中空部。本體環繞形成中空部。本體包含第一表面、第二表面、內側表面及缺口。第一表面及第二表面為本體之兩相對表面。內側表面連接於第一表面,並且對應中空部設置。本體之第二表面貼附於數位微鏡裝置上。缺口由內側表面朝向遠離中空部的方向凹陷形成。鍍膜層設置於本體之第一表面。鍍膜層之粗糙度小於500奈米,鍍膜層對於入射光之反射率小於5%,以及鍍膜層對於入射光之穿透率小於1%。To achieve the aforementioned purpose, one general implementation of the present case is to provide an optical shielding member suitable for a projection display device, wherein the projection display device includes a light-emitting unit and a digital micromirror device. The light-emitting unit projects an incident light onto the digital micromirror device, causing the digital micromirror device to reflect the incident light and project an image. The optical shielding member includes a frame and a coating layer. The frame includes a main body and a hollow portion. The main body surrounds the hollow portion. The main body includes a first surface, a second surface, an inner surface and a notch. The first surface and the second surface are two opposite surfaces of the main body. The inner surface is connected to the first surface and is arranged corresponding to the hollow portion. The second surface of the main body is attached to the digital micromirror device. The notch is formed by the inner surface being recessed in a direction away from the hollow portion. The coating layer is disposed on the first surface of the main body. The roughness of the coating layer is less than 500 nanometers, the reflectivity of the coating layer to the incident light is less than 5%, and the transmittance of the coating layer to the incident light is less than 1%.
為達前述目的,本案之另一廣義實施態樣為提供一種投影顯示裝置,包含數位微鏡裝置、發光單元及光學遮蔽件。數位微鏡裝置包含基板及複數個微型反射鏡片。複數個微型反射鏡片陣列地設置於基板上,形成數位微鏡裝置之第一區域。數位微鏡裝置之第二區域形成於基板未設置微型反射鏡片的部分。發光單元架構於將入射光投射至數位微鏡裝置,使數位微鏡裝置之第一區域之複數個微型反射鏡片反射入射光,而投影成像。光學遮蔽件設置於數位微鏡裝置,且包含框體及鍍膜層,其中框體包含一本體及一中空部,本體環繞形成中空部。本體包含第一表面、第二表面、內側表面及缺口。第一表面及第二表面為本體之兩相對表面。內側表面連接於第一表面,並且對應中空部設置。本體之第二表面貼附於數位微鏡裝置上。缺口由內側表面朝向遠離中空部的方向凹陷形成。鍍膜層設置於本體之第一表面。鍍膜層之粗糙度小於500奈米,鍍膜層對於入射光之反射率小於5%,以及鍍膜層對於入射光之穿透率小於1%。To achieve the above-mentioned purpose, another general implementation of the present case is to provide a projection display device, including a digital micromirror device, a light-emitting unit and an optical shielding member. The digital micromirror device includes a substrate and a plurality of micro-reflective mirrors. The plurality of micro-reflective mirrors are arranged in an array on the substrate to form a first area of the digital micromirror device. The second area of the digital micromirror device is formed in a portion of the substrate where the micro-reflective mirrors are not arranged. The light-emitting unit is configured to project incident light onto the digital micromirror device, so that the plurality of micro-reflective mirrors in the first area of the digital micromirror device reflect the incident light to project an image. The optical shielding member is arranged in the digital micromirror device and includes a frame and a coating layer, wherein the frame includes a body and a hollow portion, and the body surrounds the hollow portion. The main body includes a first surface, a second surface, an inner surface and a notch. The first surface and the second surface are two opposite surfaces of the main body. The inner surface is connected to the first surface and is arranged corresponding to the hollow portion. The second surface of the main body is attached to the digital microscope device. The notch is formed by the inner surface being concave in a direction away from the hollow portion. The coating layer is arranged on the first surface of the main body. The roughness of the coating layer is less than 500 nanometers, the reflectivity of the coating layer to the incident light is less than 5%, and the transmittance of the coating layer to the incident light is less than 1%.
體現本案特徵與優點的一些典型實施例將在後段的說明中詳細敘述。應理解的是本案能夠在不同的態樣上具有各種的變化,其皆不脫離本案的範圍,且其中的說明及圖示在本質上當作說明之用,而非用以限制本案。Some typical embodiments that embody the features and advantages of the present invention will be described in detail in the following description. It should be understood that the present invention can have various variations in different aspects without departing from the scope of the present invention, and the descriptions and illustrations therein are essentially for illustrative purposes rather than for limiting the present invention.
第1圖為本案一實施例之投影顯示裝置之結構示意圖,第2圖為第1圖所示之投影顯示裝置之數位微鏡裝置及光學遮蔽件之局部放大之剖面結構示意圖。如第1圖及第2圖所示,本實施例之投影顯示裝置100包含數位微鏡裝置1、發光單元2及光學遮蔽件3。數位微鏡裝置1包含基板11及複數個微型反射鏡片12。複數個微型反射鏡片12陣列地設置於基板11上,形成數位微鏡裝置1之第一區域A。數位微鏡裝置1之第二區域B形成於基板11未設置微型反射鏡片12的部分。發光單元2架構於將入射光投射至數位微鏡裝置1,使數位微鏡裝置1之第一區域A之複數個微型反射鏡片12反射入射光,並通過一鏡頭(未圖示)投影至一投影幕(未圖示)而成像。於本實施例中,投影顯示裝置100更包含透鏡組4,其中透鏡組4架構於將入射光匯聚並投射至數位微鏡裝置1。FIG. 1 is a schematic diagram of the structure of a projection display device of an embodiment of the present invention, and FIG. 2 is a partially enlarged cross-sectional schematic diagram of the digital micromirror device and the optical shield of the projection display device shown in FIG. As shown in FIG. 1 and FIG. 2, the
第3圖為第1圖所示之投影顯示裝置之光學遮蔽件之結構示意圖,以及第4圖為第1圖所示之投影顯示裝置之光學遮蔽件於另一視角之結構示意圖。如第1圖至第4圖所示,本實施例之光學遮蔽件3設置於數位微鏡裝置1上,且包含框體31及鍍膜層32。框體31包含本體311及中空部312。框體31之本體311環繞形成中空部312。框體31之本體311包含第一表面311a、第二表面311b、內側表面311c及缺口311d。第一表面311a及第二表面311b分別為本體311之兩相對表面。內側表面311c連接於第一表面311a,並且對應框體31之中空部312設置。本體311之第二表面311b貼附於數位微鏡裝置1,且對應於第二區域B設置。框體31之中空部312對應於第一區域A設置。缺口311d由內側表面311c朝向遠離中空部312的方向凹陷形成。透過缺口311d的設置,使本體311之內側表面311c的面積減少,藉此降低投射至數位微鏡裝置1的入射光被本體311之內側表面311c反射所產生的雜散光,俾提升投影成像品質。FIG. 3 is a schematic diagram of the structure of the optical shielding member of the projection display device shown in FIG. 1, and FIG. 4 is a schematic diagram of the structure of the optical shielding member of the projection display device shown in FIG. 1 at another viewing angle. As shown in FIG. 1 to FIG. 4, the
如第1圖至第4圖所示,本實施例之鍍膜層32設置於框體31之本體311之第一表面311a。於本實施例中,鍍膜層32之粗糙度係小於500奈米(nm),較佳為介於1奈米(nm)至500奈米(nm)之間,但不以此為限。由於鍍膜層32之粗糙度小於500奈米(nm),使鍍膜層32形成接近於鏡面之表面,使被鍍膜層32反射的光線均勻地反射至同一方向,減少雜散光的產生,俾提升投影成像品質。此外,本實施例之鍍膜層32為薄膜結構,其厚度極小,可降低被鍍膜層32的厚度所反射的雜散光,提升投影成像品質。相較於其他表面處理方式,例如消光噴漆,本實施例的鍍膜層32具有低粗糙度及低厚度,且可形成接近於鏡面之表面,對於雜散光的抑制效果較佳,投影成像品質更好。為了方便理解與說明,第2圖及第4圖所示鍍膜層32均以明顯可視的厚度繪製,但此並非限定本案鍍膜層32具有肉眼可見之厚度,事實上,於本實施例中,鍍膜層32的厚度極小且難以用肉眼直接視得。As shown in FIGS. 1 to 4 , the
於本實施例中,鍍膜層32對於入射光之反射率小於5%,較佳為介於0.1%至5%之間,但不以此為限。由於鍍膜層32對於入射光之反射率小於5%,使照射於鍍膜層32的入射光被大部分地吸收,減少雜散光的產生,俾提升投影成像品質。於一實施例中,光學遮蔽件3之鍍膜層32為黑色鍍膜層,以降低反射率,但不以此為限。In this embodiment, the reflectivity of the
於本實施例中,鍍膜層32對於入射光之穿透率小於1%,較佳為介於0.01%至1%之間,但不以此為限。由於鍍膜層32對於入射光之穿透率小於1%,可降低入射光穿透鍍膜層32而投射至第二區域B所對應之基板11部分,進而降低雜散光之產生,俾提升投影成像品質。In this embodiment, the transmittance of the
如第3圖及第4圖所示,於本實施例中,光學遮蔽件3之框體31例如但不限為一矩形框體。框體31之本體311包括第一側板311e、第二側板311f、第三側板311g及第四側板311h。第一側板311e與第二側板311f相對設置,第三側板311g與第四側板311h相對設置。第三側板311g之兩端分別連接於第一側板311e與第二側板311f。第四側板311h之兩端分別連接於第一側板311e與第二側板311f。第一側板311e、第二側板311f、第三側板311g及第四側板311h環繞形成中空部312。本實施例之框體31為矩形框體,其結構簡單且易於製造,結構強度亦較高。As shown in FIG. 3 and FIG. 4, in this embodiment, the
於一實施例中,光學遮蔽件3之中空部312的面積大於數位微鏡裝置1之第一區域A的面積,避免光學遮蔽件3遮蔽第一區域A的微型反射鏡片12,以提升成像品質。於一實施例中,光學遮蔽件3之中空部312的面積等於數位微鏡裝置1之第一區域A的面積,換言之,光學遮蔽件3之中空部312與數位微鏡裝置1之第一區域A對位且輪廓相互匹配,藉此降低光學遮蔽件3與數位微鏡裝置1之第一區域A之間的空隙,提升投影成像品質。於一實施例中,光學遮蔽件3之框體31的面積等於數位微鏡裝置1之第二區域B的面積,但不以此為限。In one embodiment, the area of the
於一些實施例中,框體31之本體311為一不透光板件,且由一金屬材料製成,其中金屬材料例如但不限為鋁、鋁合金或其他金屬合金。於一實施例中,框體31之本體311可為一玻璃材料製成。In some embodiments, the
第5圖為第4圖所示之投影顯示裝置之光學遮蔽件於截面C-C之局部放大剖面結構示意圖,其中截面C-C分別垂直於本體311之第一表面311a及內側表面311c。於本實施例中,如第3圖至第5圖所示,框體31之本體311之缺口311d例如但不限為矩形截面缺口(以虛線填充部份表示),其易於製造且成本較低。FIG. 5 is a partially enlarged cross-sectional structural diagram of the optical shielding member of the projection display device shown in FIG. 4 at section C-C, wherein section C-C is respectively perpendicular to the
第6圖為本案一變化例之光學遮蔽件之局部放大剖面結構示意圖。第6圖所示之框體31a與第5圖所示之框體31結構相仿,其中相同符號代表相同的元件及功能,故於此不再贅述。不同於第5圖所示之框體31,此變化例的框體31a之本體311之缺口311d為扇形截面缺口(以虛線填充部份表示)。由於本體311對應於缺口311d的內壁為連續的弧面,可避免光線被多個表面多次反射,以降低雜散光的產生。FIG. 6 is a partially enlarged cross-sectional structural schematic diagram of an optical shielding member of a variation of the present invention. The
第7圖為本案另一變化例之光學遮蔽件之局部放大剖面結構示意圖。第7圖所示之框體31b與第5圖所示之框體31結構相仿,其中相同符號代表相同的元件及功能,故於此不再贅述。不同於第5圖所示之框體31,此變化例的框體31b之本體311之缺口311d例如但不限為三角形截面缺口(以虛線填充部份表示)。由於本體311對應於缺口311d的內壁為連續的平面,可避免光線被多個表面多次反射,以降低雜散光的產生。此外,三角形截面缺口易於製造且成本較低。於一些實施例中,本體311之缺口311d可為多邊形截面缺口或不規則形截面缺口,但不以此為限。FIG. 7 is a partially enlarged cross-sectional structural schematic diagram of an optical shielding member of another variation of the present invention. The
綜上所述,本案提供一種投影顯示裝置及其光學遮蔽件,其中光學遮蔽件包括框體及鍍膜層。框體之本體的缺口係由本體的內側表面朝向遠離中空部的方向凹陷形成,使本體之內側表面的面積減少,以降低投射至數位微鏡裝置的入射光被本體之內側表面反射所產生的雜散光,俾提升投影成像品質。此外,光學遮蔽件的鍍膜層之粗糙度係小於500奈米,使鍍膜層形成接近於鏡面之表面,使被鍍膜層反射的光線均勻地反射至同一方向,減少雜散光的產生,俾提升投影成像品質。再則,鍍膜層對於入射光之反射率小於5%,使照射於鍍膜層的入射光被大部分地吸收,減少雜散光的產生,俾提升投影成像品質。更甚者,鍍膜層對於入射光之穿透率小於1%,可降低入射光穿透鍍膜層而被第二區域所對應之基板部分反射,以降低雜散光之產生,俾提升投影成像品質。In summary, the present invention provides a projection display device and an optical shielding member thereof, wherein the optical shielding member includes a frame and a coating layer. The notch of the main body of the frame is formed by the inner surface of the main body being recessed in a direction away from the hollow portion, so that the area of the inner surface of the main body is reduced, so as to reduce the stray light generated by the incident light projected onto the digital micromirror device being reflected by the inner surface of the main body, so as to improve the projection imaging quality. In addition, the roughness of the coating layer of the optical shielding member is less than 500 nanometers, so that the coating layer forms a surface close to a mirror surface, so that the light reflected by the coating layer is evenly reflected in the same direction, reducing the generation of stray light, so as to improve the projection imaging quality. Furthermore, the reflectivity of the coating layer to the incident light is less than 5%, so that the incident light irradiated on the coating layer is mostly absorbed, reducing the generation of stray light, so as to improve the quality of projection imaging. Moreover, the transmittance of the coating layer to the incident light is less than 1%, which can reduce the incident light penetrating the coating layer and being reflected by the substrate portion corresponding to the second area, so as to reduce the generation of stray light, so as to improve the quality of projection imaging.
本案得由熟知此技術之人士任施匠思而為諸般修飾,然皆不脫如附申請專利範圍所欲保護者。This case can be modified in various ways by a person familiar with this technology, but all of them will not deviate from the scope of protection sought by the attached patent application.
100:投影顯示裝置
1:數位微鏡裝置
11:基板
12:微型反射鏡片
2:發光單元
3:光學遮蔽件
31、31a、31b:框體
311:本體
311a:第一表面
311b:第二表面
311c:內側表面
311d:缺口
311e:第一側板
311f:第二側板
311g:第三側板
311h:第四側板
312:中空部
32:鍍膜層
4:透鏡組
A:第一區域
B:第二區域
C-C:截面100: projection display device
1: digital micromirror device
11: substrate
12: micro reflective lens
2: light-emitting unit
3: optical shielding
第1圖為本案一實施例之投影顯示裝置之結構示意圖。 第2圖為第1圖所示之投影顯示裝置之數位微鏡裝置及光學遮蔽件之局部放大之剖面結構示意圖。 第3圖為第1圖所示之投影顯示裝置之光學遮蔽件之結構示意圖。 第4圖為第1圖所示之投影顯示裝置之光學遮蔽件於另一視角之結構示意圖。 第5圖為第4圖所示之投影顯示裝置之光學遮蔽件於截面C-C之局部放大剖面結構示意圖,其中截面C-C分別垂直於本體之第一表面及內側表面。 第6圖為本案一變化例之光學遮蔽件之局部放大剖面結構示意圖。 第7圖為本案另一變化例之光學遮蔽件之局部放大剖面結構示意圖。 FIG. 1 is a schematic diagram of the structure of a projection display device of an embodiment of the present invention. FIG. 2 is a partially enlarged cross-sectional structural diagram of a digital micro-mirror device and an optical shield of the projection display device shown in FIG. FIG. 3 is a schematic diagram of the structure of the optical shield of the projection display device shown in FIG. FIG. 4 is a schematic diagram of the structure of the optical shield of the projection display device shown in FIG. 1 at another viewing angle. FIG. 5 is a schematic diagram of the partially enlarged cross-sectional structure of the optical shield of the projection display device shown in FIG. 4 at section C-C, wherein section C-C is perpendicular to the first surface and the inner surface of the body, respectively. FIG. 6 is a schematic diagram of the partially enlarged cross-sectional structure of an optical shield of a variation of the present invention. FIG. 7 is a schematic diagram of the partially enlarged cross-sectional structure of an optical shield of another variation of the present invention.
1:數位微鏡裝置 1: Digital microscope device
11:基板 11: Substrate
12:微型反射鏡片 12: Micro reflective lens
3:光學遮蔽件 3: Optical shielding parts
31:框體 31:Frame
311:本體 311:Entity
311a:第一表面 311a: first surface
311b:第二表面 311b: Second surface
311c:內側表面 311c: Inner surface
311d:缺口 311d: Gap
312:中空部 312: Hollow part
32:鍍膜層 32: coating layer
A:第一區域 A: The first area
B:第二區域 B: Second area
Claims (10)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW113102806A TWI872929B (en) | 2024-01-24 | 2024-01-24 | Projection display device and optical shielding element thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW113102806A TWI872929B (en) | 2024-01-24 | 2024-01-24 | Projection display device and optical shielding element thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI872929B true TWI872929B (en) | 2025-02-11 |
| TW202530805A TW202530805A (en) | 2025-08-01 |
Family
ID=95557257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW113102806A TWI872929B (en) | 2024-01-24 | 2024-01-24 | Projection display device and optical shielding element thereof |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI872929B (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080043208A1 (en) * | 2006-08-17 | 2008-02-21 | Delta Electronics, Inc. | Projection system and its optical shutter |
| TW201022825A (en) * | 2008-12-08 | 2010-06-16 | Mitsubishi Electric Corp | Projection type display device |
| TW202117434A (en) * | 2019-10-16 | 2021-05-01 | 明基電通股份有限公司 | Projection system |
-
2024
- 2024-01-24 TW TW113102806A patent/TWI872929B/en active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080043208A1 (en) * | 2006-08-17 | 2008-02-21 | Delta Electronics, Inc. | Projection system and its optical shutter |
| TW201022825A (en) * | 2008-12-08 | 2010-06-16 | Mitsubishi Electric Corp | Projection type display device |
| TW202117434A (en) * | 2019-10-16 | 2021-05-01 | 明基電通股份有限公司 | Projection system |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202530805A (en) | 2025-08-01 |
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