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TWI872929B - Projection display device and optical shielding element thereof - Google Patents

Projection display device and optical shielding element thereof Download PDF

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Publication number
TWI872929B
TWI872929B TW113102806A TW113102806A TWI872929B TW I872929 B TWI872929 B TW I872929B TW 113102806 A TW113102806 A TW 113102806A TW 113102806 A TW113102806 A TW 113102806A TW I872929 B TWI872929 B TW I872929B
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coating layer
side panel
notch
hollow portion
frame
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TW113102806A
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TW202530805A (en
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林宏英
周彥伊
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台達電子工業股份有限公司
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Abstract

An optical shielding element is disclosed and designed for use in a projection display device. The projection display device includes a light-emitting unit and a digital micromirror device. The light-emitting unit projects incident light onto the digital micromirror device, causing the digital micromirror device to reflect the incident light and project an image. The optical shielding component includes a frame and a coating layer. The frame includes a body and a hollow portion. The body surrounds and forms the hollow portion. The body includes an inner surface and a notch. The inner surface is arranged corresponding to the hollow portion. The frame is attached on the digital micromirror device. The notch is recessed from the inner surface in a direction away from the hollow portion. The coating layer is disposed on the body of the frame. The roughness of the coating layer is less than 500 nanometers, the reflectance of the coating layer for incident light is less than 5%, and the transmittance of the coating layer for incident light is less than 1%.

Description

投影顯示裝置及其光學遮蔽件Projection display device and optical shielding member thereof

本案關於一種投影顯示裝置,尤指一種具有光學遮蔽件的投影顯示裝置。The present invention relates to a projection display device, and more particularly to a projection display device having an optical shielding member.

目前,數位光處理(Digital Light Processing,DLP)顯像技術已經被廣泛地使用於投影顯示設備中。一般而言,在數位光處理之投影顯示設備中,圖像是由數位微鏡裝置(Digital Micromirror Device,DMD)反射光線所產生的。Currently, digital light processing (DLP) imaging technology has been widely used in projection display devices. Generally speaking, in digital light processing projection display devices, images are generated by reflecting light from a digital micromirror device (DMD).

傳統的數位微鏡裝置包含基板及複數個微型反射鏡片,其中複數個微型反射鏡片陣列地設置於基板上,且架構形成數位微鏡裝置之第一區域。每一個微型反射鏡片控制投影圖像中的一個像素。數位微鏡裝置之第二區域形成於基板未設置微型反射鏡片的部分。當入射光照射於數位微鏡裝置時,數位微鏡裝置的第一區域的微型反射鏡片反射光線,並投影成圖像。然而,入射光亦同時照射於數位微鏡裝置的第二區域,使第二區域反射光線而形成雜散光,該雜散光將造成干擾而導致投影成像品質不佳。A conventional digital micromirror device includes a substrate and a plurality of micro-reflective mirrors, wherein the plurality of micro-reflective mirrors are arranged in an array on the substrate and are structured to form a first region of the digital micromirror device. Each micro-reflective mirror controls a pixel in the projected image. The second region of the digital micromirror device is formed on the portion of the substrate where the micro-reflective mirrors are not arranged. When incident light is irradiated on the digital micromirror device, the micro-reflective mirrors in the first region of the digital micromirror device reflect the light and project it into an image. However, the incident light also irradiates the second region of the digital micromirror device at the same time, causing the second region to reflect the light and form stray light, which will cause interference and result in poor projection imaging quality.

有鑑於此,實有必要發展一種投影顯示裝置及其光學遮蔽件,以解決現有技術所面臨之問題。In view of this, it is necessary to develop a projection display device and an optical shielding member thereof to solve the problems faced by the prior art.

本案之目的在於提供一種投影顯示裝置及其光學遮蔽件,其可減少雜散光的產生,以提升投影成像品質。The purpose of this case is to provide a projection display device and an optical shielding member thereof, which can reduce the generation of stray light to improve the projection imaging quality.

為達前述目的,本案之一廣義實施態樣為提供一種光學遮蔽件,適用於一投影顯示裝置,其中投影顯示裝置包含發光單元及數位微鏡裝置。發光單元以一入射光投射至數位微鏡裝置,使數位微鏡裝置反射入射光,並投影成像。光學遮蔽件包含框體及鍍膜層。框體包含本體及中空部。本體環繞形成中空部。本體包含第一表面、第二表面、內側表面及缺口。第一表面及第二表面為本體之兩相對表面。內側表面連接於第一表面,並且對應中空部設置。本體之第二表面貼附於數位微鏡裝置上。缺口由內側表面朝向遠離中空部的方向凹陷形成。鍍膜層設置於本體之第一表面。鍍膜層之粗糙度小於500奈米,鍍膜層對於入射光之反射率小於5%,以及鍍膜層對於入射光之穿透率小於1%。To achieve the aforementioned purpose, one general implementation of the present case is to provide an optical shielding member suitable for a projection display device, wherein the projection display device includes a light-emitting unit and a digital micromirror device. The light-emitting unit projects an incident light onto the digital micromirror device, causing the digital micromirror device to reflect the incident light and project an image. The optical shielding member includes a frame and a coating layer. The frame includes a main body and a hollow portion. The main body surrounds the hollow portion. The main body includes a first surface, a second surface, an inner surface and a notch. The first surface and the second surface are two opposite surfaces of the main body. The inner surface is connected to the first surface and is arranged corresponding to the hollow portion. The second surface of the main body is attached to the digital micromirror device. The notch is formed by the inner surface being recessed in a direction away from the hollow portion. The coating layer is disposed on the first surface of the main body. The roughness of the coating layer is less than 500 nanometers, the reflectivity of the coating layer to the incident light is less than 5%, and the transmittance of the coating layer to the incident light is less than 1%.

為達前述目的,本案之另一廣義實施態樣為提供一種投影顯示裝置,包含數位微鏡裝置、發光單元及光學遮蔽件。數位微鏡裝置包含基板及複數個微型反射鏡片。複數個微型反射鏡片陣列地設置於基板上,形成數位微鏡裝置之第一區域。數位微鏡裝置之第二區域形成於基板未設置微型反射鏡片的部分。發光單元架構於將入射光投射至數位微鏡裝置,使數位微鏡裝置之第一區域之複數個微型反射鏡片反射入射光,而投影成像。光學遮蔽件設置於數位微鏡裝置,且包含框體及鍍膜層,其中框體包含一本體及一中空部,本體環繞形成中空部。本體包含第一表面、第二表面、內側表面及缺口。第一表面及第二表面為本體之兩相對表面。內側表面連接於第一表面,並且對應中空部設置。本體之第二表面貼附於數位微鏡裝置上。缺口由內側表面朝向遠離中空部的方向凹陷形成。鍍膜層設置於本體之第一表面。鍍膜層之粗糙度小於500奈米,鍍膜層對於入射光之反射率小於5%,以及鍍膜層對於入射光之穿透率小於1%。To achieve the above-mentioned purpose, another general implementation of the present case is to provide a projection display device, including a digital micromirror device, a light-emitting unit and an optical shielding member. The digital micromirror device includes a substrate and a plurality of micro-reflective mirrors. The plurality of micro-reflective mirrors are arranged in an array on the substrate to form a first area of the digital micromirror device. The second area of the digital micromirror device is formed in a portion of the substrate where the micro-reflective mirrors are not arranged. The light-emitting unit is configured to project incident light onto the digital micromirror device, so that the plurality of micro-reflective mirrors in the first area of the digital micromirror device reflect the incident light to project an image. The optical shielding member is arranged in the digital micromirror device and includes a frame and a coating layer, wherein the frame includes a body and a hollow portion, and the body surrounds the hollow portion. The main body includes a first surface, a second surface, an inner surface and a notch. The first surface and the second surface are two opposite surfaces of the main body. The inner surface is connected to the first surface and is arranged corresponding to the hollow portion. The second surface of the main body is attached to the digital microscope device. The notch is formed by the inner surface being concave in a direction away from the hollow portion. The coating layer is arranged on the first surface of the main body. The roughness of the coating layer is less than 500 nanometers, the reflectivity of the coating layer to the incident light is less than 5%, and the transmittance of the coating layer to the incident light is less than 1%.

體現本案特徵與優點的一些典型實施例將在後段的說明中詳細敘述。應理解的是本案能夠在不同的態樣上具有各種的變化,其皆不脫離本案的範圍,且其中的說明及圖示在本質上當作說明之用,而非用以限制本案。Some typical embodiments that embody the features and advantages of the present invention will be described in detail in the following description. It should be understood that the present invention can have various variations in different aspects without departing from the scope of the present invention, and the descriptions and illustrations therein are essentially for illustrative purposes rather than for limiting the present invention.

第1圖為本案一實施例之投影顯示裝置之結構示意圖,第2圖為第1圖所示之投影顯示裝置之數位微鏡裝置及光學遮蔽件之局部放大之剖面結構示意圖。如第1圖及第2圖所示,本實施例之投影顯示裝置100包含數位微鏡裝置1、發光單元2及光學遮蔽件3。數位微鏡裝置1包含基板11及複數個微型反射鏡片12。複數個微型反射鏡片12陣列地設置於基板11上,形成數位微鏡裝置1之第一區域A。數位微鏡裝置1之第二區域B形成於基板11未設置微型反射鏡片12的部分。發光單元2架構於將入射光投射至數位微鏡裝置1,使數位微鏡裝置1之第一區域A之複數個微型反射鏡片12反射入射光,並通過一鏡頭(未圖示)投影至一投影幕(未圖示)而成像。於本實施例中,投影顯示裝置100更包含透鏡組4,其中透鏡組4架構於將入射光匯聚並投射至數位微鏡裝置1。FIG. 1 is a schematic diagram of the structure of a projection display device of an embodiment of the present invention, and FIG. 2 is a partially enlarged cross-sectional schematic diagram of the digital micromirror device and the optical shield of the projection display device shown in FIG. As shown in FIG. 1 and FIG. 2, the projection display device 100 of the present embodiment includes a digital micromirror device 1, a light-emitting unit 2, and an optical shield 3. The digital micromirror device 1 includes a substrate 11 and a plurality of micro-reflective mirrors 12. The plurality of micro-reflective mirrors 12 are arranged in an array on the substrate 11 to form a first region A of the digital micromirror device 1. The second region B of the digital micromirror device 1 is formed on the portion of the substrate 11 where the micro-reflective mirrors 12 are not arranged. The light-emitting unit 2 is configured to project the incident light onto the digital micro-mirror device 1, so that the plurality of micro-reflective lenses 12 in the first area A of the digital micro-mirror device 1 reflect the incident light and project the incident light onto a projection screen (not shown) through a lens (not shown) to form an image. In this embodiment, the projection display device 100 further includes a lens set 4, wherein the lens set 4 is configured to converge the incident light and project the light onto the digital micro-mirror device 1.

第3圖為第1圖所示之投影顯示裝置之光學遮蔽件之結構示意圖,以及第4圖為第1圖所示之投影顯示裝置之光學遮蔽件於另一視角之結構示意圖。如第1圖至第4圖所示,本實施例之光學遮蔽件3設置於數位微鏡裝置1上,且包含框體31及鍍膜層32。框體31包含本體311及中空部312。框體31之本體311環繞形成中空部312。框體31之本體311包含第一表面311a、第二表面311b、內側表面311c及缺口311d。第一表面311a及第二表面311b分別為本體311之兩相對表面。內側表面311c連接於第一表面311a,並且對應框體31之中空部312設置。本體311之第二表面311b貼附於數位微鏡裝置1,且對應於第二區域B設置。框體31之中空部312對應於第一區域A設置。缺口311d由內側表面311c朝向遠離中空部312的方向凹陷形成。透過缺口311d的設置,使本體311之內側表面311c的面積減少,藉此降低投射至數位微鏡裝置1的入射光被本體311之內側表面311c反射所產生的雜散光,俾提升投影成像品質。FIG. 3 is a schematic diagram of the structure of the optical shielding member of the projection display device shown in FIG. 1, and FIG. 4 is a schematic diagram of the structure of the optical shielding member of the projection display device shown in FIG. 1 at another viewing angle. As shown in FIG. 1 to FIG. 4, the optical shielding member 3 of this embodiment is disposed on the digital microscope device 1, and includes a frame 31 and a coating layer 32. The frame 31 includes a body 311 and a hollow portion 312. The body 311 of the frame 31 surrounds the hollow portion 312. The body 311 of the frame 31 includes a first surface 311a, a second surface 311b, an inner surface 311c and a notch 311d. The first surface 311a and the second surface 311b are two opposite surfaces of the body 311. The inner surface 311c is connected to the first surface 311a and is disposed corresponding to the hollow portion 312 of the frame 31. The second surface 311b of the body 311 is attached to the digital microscope device 1 and is disposed corresponding to the second area B. The hollow portion 312 of the frame 31 is disposed corresponding to the first area A. The notch 311d is formed by the inner surface 311c being recessed in a direction away from the hollow portion 312. By providing the notch 311d, the area of the inner surface 311c of the body 311 is reduced, thereby reducing stray light generated by reflection of the inner surface 311c of the body 311 when the incident light projected onto the digital microscope device 1 is reflected by the inner surface 311c of the body 311, so as to improve the projection imaging quality.

如第1圖至第4圖所示,本實施例之鍍膜層32設置於框體31之本體311之第一表面311a。於本實施例中,鍍膜層32之粗糙度係小於500奈米(nm),較佳為介於1奈米(nm)至500奈米(nm)之間,但不以此為限。由於鍍膜層32之粗糙度小於500奈米(nm),使鍍膜層32形成接近於鏡面之表面,使被鍍膜層32反射的光線均勻地反射至同一方向,減少雜散光的產生,俾提升投影成像品質。此外,本實施例之鍍膜層32為薄膜結構,其厚度極小,可降低被鍍膜層32的厚度所反射的雜散光,提升投影成像品質。相較於其他表面處理方式,例如消光噴漆,本實施例的鍍膜層32具有低粗糙度及低厚度,且可形成接近於鏡面之表面,對於雜散光的抑制效果較佳,投影成像品質更好。為了方便理解與說明,第2圖及第4圖所示鍍膜層32均以明顯可視的厚度繪製,但此並非限定本案鍍膜層32具有肉眼可見之厚度,事實上,於本實施例中,鍍膜層32的厚度極小且難以用肉眼直接視得。As shown in FIGS. 1 to 4 , the coating layer 32 of this embodiment is disposed on the first surface 311a of the body 311 of the frame 31. In this embodiment, the roughness of the coating layer 32 is less than 500 nanometers (nm), preferably between 1 nanometer (nm) and 500 nanometers (nm), but not limited thereto. Since the roughness of the coating layer 32 is less than 500 nanometers (nm), the coating layer 32 forms a surface close to a mirror surface, so that the light reflected by the coating layer 32 is evenly reflected in the same direction, reducing the generation of stray light, so as to improve the projection imaging quality. In addition, the coating layer 32 of this embodiment is a thin film structure with an extremely small thickness, which can reduce the stray light reflected by the thickness of the coating layer 32 and improve the quality of projection imaging. Compared with other surface treatment methods, such as matte spray paint, the coating layer 32 of this embodiment has low roughness and low thickness, and can form a surface close to a mirror surface, which has a better effect of suppressing stray light and better projection imaging quality. For the convenience of understanding and explanation, the coating layer 32 shown in Figures 2 and 4 is drawn with a clearly visible thickness, but this does not limit the coating layer 32 of this case to have a thickness visible to the naked eye. In fact, in this embodiment, the thickness of the coating layer 32 is extremely small and difficult to be directly seen with the naked eye.

於本實施例中,鍍膜層32對於入射光之反射率小於5%,較佳為介於0.1%至5%之間,但不以此為限。由於鍍膜層32對於入射光之反射率小於5%,使照射於鍍膜層32的入射光被大部分地吸收,減少雜散光的產生,俾提升投影成像品質。於一實施例中,光學遮蔽件3之鍍膜層32為黑色鍍膜層,以降低反射率,但不以此為限。In this embodiment, the reflectivity of the coating layer 32 to the incident light is less than 5%, preferably between 0.1% and 5%, but not limited thereto. Since the reflectivity of the coating layer 32 to the incident light is less than 5%, the incident light irradiated on the coating layer 32 is mostly absorbed, reducing the generation of stray light to improve the projection imaging quality. In one embodiment, the coating layer 32 of the optical shielding member 3 is a black coating layer to reduce the reflectivity, but not limited thereto.

於本實施例中,鍍膜層32對於入射光之穿透率小於1%,較佳為介於0.01%至1%之間,但不以此為限。由於鍍膜層32對於入射光之穿透率小於1%,可降低入射光穿透鍍膜層32而投射至第二區域B所對應之基板11部分,進而降低雜散光之產生,俾提升投影成像品質。In this embodiment, the transmittance of the coating layer 32 to the incident light is less than 1%, preferably between 0.01% and 1%, but not limited thereto. Since the transmittance of the coating layer 32 to the incident light is less than 1%, the incident light can be reduced from penetrating the coating layer 32 and projecting onto the portion of the substrate 11 corresponding to the second region B, thereby reducing the generation of stray light and improving the projection imaging quality.

如第3圖及第4圖所示,於本實施例中,光學遮蔽件3之框體31例如但不限為一矩形框體。框體31之本體311包括第一側板311e、第二側板311f、第三側板311g及第四側板311h。第一側板311e與第二側板311f相對設置,第三側板311g與第四側板311h相對設置。第三側板311g之兩端分別連接於第一側板311e與第二側板311f。第四側板311h之兩端分別連接於第一側板311e與第二側板311f。第一側板311e、第二側板311f、第三側板311g及第四側板311h環繞形成中空部312。本實施例之框體31為矩形框體,其結構簡單且易於製造,結構強度亦較高。As shown in FIG. 3 and FIG. 4, in this embodiment, the frame 31 of the optical shielding member 3 is, for example but not limited to, a rectangular frame. The body 311 of the frame 31 includes a first side plate 311e, a second side plate 311f, a third side plate 311g, and a fourth side plate 311h. The first side plate 311e is disposed opposite to the second side plate 311f, and the third side plate 311g is disposed opposite to the fourth side plate 311h. The two ends of the third side plate 311g are respectively connected to the first side plate 311e and the second side plate 311f. The two ends of the fourth side plate 311h are respectively connected to the first side plate 311e and the second side plate 311f. The first side plate 311e, the second side plate 311f, the third side plate 311g and the fourth side plate 311h surround to form a hollow portion 312. The frame 31 of this embodiment is a rectangular frame, which has a simple structure and is easy to manufacture, and has a high structural strength.

於一實施例中,光學遮蔽件3之中空部312的面積大於數位微鏡裝置1之第一區域A的面積,避免光學遮蔽件3遮蔽第一區域A的微型反射鏡片12,以提升成像品質。於一實施例中,光學遮蔽件3之中空部312的面積等於數位微鏡裝置1之第一區域A的面積,換言之,光學遮蔽件3之中空部312與數位微鏡裝置1之第一區域A對位且輪廓相互匹配,藉此降低光學遮蔽件3與數位微鏡裝置1之第一區域A之間的空隙,提升投影成像品質。於一實施例中,光學遮蔽件3之框體31的面積等於數位微鏡裝置1之第二區域B的面積,但不以此為限。In one embodiment, the area of the hollow portion 312 of the optical shielding member 3 is larger than the area of the first area A of the digital microscope device 1, so as to prevent the optical shielding member 3 from shielding the micro reflective lens 12 in the first area A, thereby improving the imaging quality. In one embodiment, the area of the hollow portion 312 of the optical shielding member 3 is equal to the area of the first area A of the digital microscope device 1. In other words, the hollow portion 312 of the optical shielding member 3 and the first area A of the digital microscope device 1 are aligned and their contours match each other, thereby reducing the gap between the optical shielding member 3 and the first area A of the digital microscope device 1, thereby improving the projection imaging quality. In one embodiment, the area of the frame 31 of the optical shielding member 3 is equal to the area of the second region B of the digital microscope device 1, but the present invention is not limited thereto.

於一些實施例中,框體31之本體311為一不透光板件,且由一金屬材料製成,其中金屬材料例如但不限為鋁、鋁合金或其他金屬合金。於一實施例中,框體31之本體311可為一玻璃材料製成。In some embodiments, the body 311 of the frame 31 is a light-proof plate and is made of a metal material, wherein the metal material is, for example but not limited to, aluminum, aluminum alloy or other metal alloys. In one embodiment, the body 311 of the frame 31 can be made of a glass material.

第5圖為第4圖所示之投影顯示裝置之光學遮蔽件於截面C-C之局部放大剖面結構示意圖,其中截面C-C分別垂直於本體311之第一表面311a及內側表面311c。於本實施例中,如第3圖至第5圖所示,框體31之本體311之缺口311d例如但不限為矩形截面缺口(以虛線填充部份表示),其易於製造且成本較低。FIG. 5 is a partially enlarged cross-sectional structural diagram of the optical shielding member of the projection display device shown in FIG. 4 at section C-C, wherein section C-C is respectively perpendicular to the first surface 311a and the inner surface 311c of the body 311. In this embodiment, as shown in FIG. 3 to FIG. 5, the notch 311d of the body 311 of the frame 31 is, for example but not limited to, a rectangular cross-sectional notch (indicated by a dotted line filled portion), which is easy to manufacture and has a low cost.

第6圖為本案一變化例之光學遮蔽件之局部放大剖面結構示意圖。第6圖所示之框體31a與第5圖所示之框體31結構相仿,其中相同符號代表相同的元件及功能,故於此不再贅述。不同於第5圖所示之框體31,此變化例的框體31a之本體311之缺口311d為扇形截面缺口(以虛線填充部份表示)。由於本體311對應於缺口311d的內壁為連續的弧面,可避免光線被多個表面多次反射,以降低雜散光的產生。FIG. 6 is a partially enlarged cross-sectional structural schematic diagram of an optical shielding member of a variation of the present invention. The frame 31a shown in FIG. 6 is similar in structure to the frame 31 shown in FIG. 5, wherein the same symbols represent the same components and functions, and therefore no further description is given here. Unlike the frame 31 shown in FIG. 5, the notch 311d of the body 311 of the frame 31a of this variation is a fan-shaped cross-sectional notch (indicated by the dotted line filled portion). Since the inner wall of the body 311 corresponding to the notch 311d is a continuous curved surface, it can prevent the light from being reflected multiple times by multiple surfaces, thereby reducing the generation of stray light.

第7圖為本案另一變化例之光學遮蔽件之局部放大剖面結構示意圖。第7圖所示之框體31b與第5圖所示之框體31結構相仿,其中相同符號代表相同的元件及功能,故於此不再贅述。不同於第5圖所示之框體31,此變化例的框體31b之本體311之缺口311d例如但不限為三角形截面缺口(以虛線填充部份表示)。由於本體311對應於缺口311d的內壁為連續的平面,可避免光線被多個表面多次反射,以降低雜散光的產生。此外,三角形截面缺口易於製造且成本較低。於一些實施例中,本體311之缺口311d可為多邊形截面缺口或不規則形截面缺口,但不以此為限。FIG. 7 is a partially enlarged cross-sectional structural schematic diagram of an optical shielding member of another variation of the present invention. The frame 31b shown in FIG. 7 is similar in structure to the frame 31 shown in FIG. 5, wherein the same symbols represent the same components and functions, and therefore will not be described in detail here. Unlike the frame 31 shown in FIG. 5, the notch 311d of the body 311 of the frame 31b of this variation is, for example but not limited to, a triangular cross-sectional notch (indicated by a dotted line filled portion). Since the inner wall of the body 311 corresponding to the notch 311d is a continuous plane, it is possible to avoid multiple reflections of light by multiple surfaces to reduce the generation of stray light. In addition, a triangular cross-sectional notch is easy to manufacture and has a lower cost. In some embodiments, the notch 311d of the body 311 may be a polygonal cross-sectional notch or an irregular cross-sectional notch, but is not limited thereto.

綜上所述,本案提供一種投影顯示裝置及其光學遮蔽件,其中光學遮蔽件包括框體及鍍膜層。框體之本體的缺口係由本體的內側表面朝向遠離中空部的方向凹陷形成,使本體之內側表面的面積減少,以降低投射至數位微鏡裝置的入射光被本體之內側表面反射所產生的雜散光,俾提升投影成像品質。此外,光學遮蔽件的鍍膜層之粗糙度係小於500奈米,使鍍膜層形成接近於鏡面之表面,使被鍍膜層反射的光線均勻地反射至同一方向,減少雜散光的產生,俾提升投影成像品質。再則,鍍膜層對於入射光之反射率小於5%,使照射於鍍膜層的入射光被大部分地吸收,減少雜散光的產生,俾提升投影成像品質。更甚者,鍍膜層對於入射光之穿透率小於1%,可降低入射光穿透鍍膜層而被第二區域所對應之基板部分反射,以降低雜散光之產生,俾提升投影成像品質。In summary, the present invention provides a projection display device and an optical shielding member thereof, wherein the optical shielding member includes a frame and a coating layer. The notch of the main body of the frame is formed by the inner surface of the main body being recessed in a direction away from the hollow portion, so that the area of the inner surface of the main body is reduced, so as to reduce the stray light generated by the incident light projected onto the digital micromirror device being reflected by the inner surface of the main body, so as to improve the projection imaging quality. In addition, the roughness of the coating layer of the optical shielding member is less than 500 nanometers, so that the coating layer forms a surface close to a mirror surface, so that the light reflected by the coating layer is evenly reflected in the same direction, reducing the generation of stray light, so as to improve the projection imaging quality. Furthermore, the reflectivity of the coating layer to the incident light is less than 5%, so that the incident light irradiated on the coating layer is mostly absorbed, reducing the generation of stray light, so as to improve the quality of projection imaging. Moreover, the transmittance of the coating layer to the incident light is less than 1%, which can reduce the incident light penetrating the coating layer and being reflected by the substrate portion corresponding to the second area, so as to reduce the generation of stray light, so as to improve the quality of projection imaging.

本案得由熟知此技術之人士任施匠思而為諸般修飾,然皆不脫如附申請專利範圍所欲保護者。This case can be modified in various ways by a person familiar with this technology, but all of them will not deviate from the scope of protection sought by the attached patent application.

100:投影顯示裝置 1:數位微鏡裝置 11:基板 12:微型反射鏡片 2:發光單元 3:光學遮蔽件 31、31a、31b:框體 311:本體 311a:第一表面 311b:第二表面 311c:內側表面 311d:缺口 311e:第一側板 311f:第二側板 311g:第三側板 311h:第四側板 312:中空部 32:鍍膜層 4:透鏡組 A:第一區域 B:第二區域 C-C:截面100: projection display device 1: digital micromirror device 11: substrate 12: micro reflective lens 2: light-emitting unit 3: optical shielding member 31, 31a, 31b: frame 311: body 311a: first surface 311b: second surface 311c: inner surface 311d: notch 311e: first side plate 311f: second side plate 311g: third side plate 311h: fourth side plate 312: hollow part 32: coating layer 4: lens group A: first region B: second region C-C: cross section

第1圖為本案一實施例之投影顯示裝置之結構示意圖。 第2圖為第1圖所示之投影顯示裝置之數位微鏡裝置及光學遮蔽件之局部放大之剖面結構示意圖。 第3圖為第1圖所示之投影顯示裝置之光學遮蔽件之結構示意圖。 第4圖為第1圖所示之投影顯示裝置之光學遮蔽件於另一視角之結構示意圖。 第5圖為第4圖所示之投影顯示裝置之光學遮蔽件於截面C-C之局部放大剖面結構示意圖,其中截面C-C分別垂直於本體之第一表面及內側表面。 第6圖為本案一變化例之光學遮蔽件之局部放大剖面結構示意圖。 第7圖為本案另一變化例之光學遮蔽件之局部放大剖面結構示意圖。 FIG. 1 is a schematic diagram of the structure of a projection display device of an embodiment of the present invention. FIG. 2 is a partially enlarged cross-sectional structural diagram of a digital micro-mirror device and an optical shield of the projection display device shown in FIG. FIG. 3 is a schematic diagram of the structure of the optical shield of the projection display device shown in FIG. FIG. 4 is a schematic diagram of the structure of the optical shield of the projection display device shown in FIG. 1 at another viewing angle. FIG. 5 is a schematic diagram of the partially enlarged cross-sectional structure of the optical shield of the projection display device shown in FIG. 4 at section C-C, wherein section C-C is perpendicular to the first surface and the inner surface of the body, respectively. FIG. 6 is a schematic diagram of the partially enlarged cross-sectional structure of an optical shield of a variation of the present invention. FIG. 7 is a schematic diagram of the partially enlarged cross-sectional structure of an optical shield of another variation of the present invention.

1:數位微鏡裝置 1: Digital microscope device

11:基板 11: Substrate

12:微型反射鏡片 12: Micro reflective lens

3:光學遮蔽件 3: Optical shielding parts

31:框體 31:Frame

311:本體 311:Entity

311a:第一表面 311a: first surface

311b:第二表面 311b: Second surface

311c:內側表面 311c: Inner surface

311d:缺口 311d: Gap

312:中空部 312: Hollow part

32:鍍膜層 32: coating layer

A:第一區域 A: The first area

B:第二區域 B: Second area

Claims (10)

一種光學遮蔽件,適用於一投影顯示裝置,其中該投影顯示裝置包含一發光單元及一數位微鏡裝置,該發光單元以一入射光投射至該數位微鏡裝置,使該數位微鏡裝置反射該入射光,並投影成像,其中該光學遮蔽件包含: 一框體,包含一本體及一中空部,該本體環繞形成該中空部,其中該本體包含一第一表面、一第二表面、一內側表面及一缺口,其中該第一表面及該第二表面為該本體之兩相對表面,該內側表面連接於該第一表面,並且對應該中空部設置,其中該本體之該第二表面貼附於該數位微鏡裝置上,其中該缺口由該內側表面朝向遠離該中空部的方向凹陷形成;以及 一鍍膜層,設置於該本體之該第一表面,其中該鍍膜層之粗糙度小於500奈米,該鍍膜層對於該入射光之反射率小於5%,以及該鍍膜層對於該入射光之穿透率小於1%。 An optical shielding member is applicable to a projection display device, wherein the projection display device comprises a light-emitting unit and a digital micromirror device, wherein the light-emitting unit projects an incident light onto the digital micromirror device, so that the digital micromirror device reflects the incident light and projects an image, wherein the optical shielding member comprises: a frame, comprising a body and a hollow portion, wherein the body surrounds the hollow portion, wherein the body comprises a first surface, a second surface, an inner surface and a notch, wherein the first surface and the second surface are two opposite surfaces of the body, wherein the inner surface is connected to the first surface and is arranged corresponding to the hollow portion, wherein the second surface of the body is attached to the digital micromirror device, wherein the notch is formed by the inner surface being recessed in a direction away from the hollow portion; and A coating layer is disposed on the first surface of the body, wherein the roughness of the coating layer is less than 500 nanometers, the reflectivity of the coating layer to the incident light is less than 5%, and the transmittance of the coating layer to the incident light is less than 1%. 如請求項1所述之光學遮蔽件,其中該鍍膜層為一黑色鍍膜層。An optical shield as described in claim 1, wherein the coating layer is a black coating layer. 如請求項1所述之光學遮蔽件,其中該框體之該本體為一不透光板件,且由一金屬材料製成,其中該金屬材料為鋁或鋁合金構成。An optical shielding member as described in claim 1, wherein the main body of the frame is an opaque plate and is made of a metal material, wherein the metal material is aluminum or an aluminum alloy. 如請求項1所述之光學遮蔽件,其中該缺口為一扇形截面缺口、一三角形截面缺口、一矩形截面缺口、一多邊形截面缺口或一不規則形截面缺口。An optical shield as described in claim 1, wherein the notch is a fan-shaped cross-sectional notch, a triangular cross-sectional notch, a rectangular cross-sectional notch, a polygonal cross-sectional notch or an irregular cross-sectional notch. 如請求項1所述之光學遮蔽件,其中該框體為一矩形框體,且該框體之該本體包括一第一側板、一第二側板、一第三側板及一第四側板,其中該第一側板與該第二側板相對設置,該第三側板與該第四側板相對設置,該第三側板之兩端分別連接於該第一側板與該第二側板,該第四側板之兩端分別連接於該第一側板與該第二側板,其中該第一側板、該第二側板、該第三側板及該第四側板環繞形成該中空部。An optical shielding member as described in claim 1, wherein the frame is a rectangular frame, and the main body of the frame includes a first side panel, a second side panel, a third side panel and a fourth side panel, wherein the first side panel is arranged opposite to the second side panel, the third side panel is arranged opposite to the fourth side panel, two ends of the third side panel are respectively connected to the first side panel and the second side panel, and two ends of the fourth side panel are respectively connected to the first side panel and the second side panel, wherein the first side panel, the second side panel, the third side panel and the fourth side panel surround to form the hollow portion. 一種投影顯示裝置,包含: 一數位微鏡裝置,包含一基板及複數個微型反射鏡片,其中該複數個微型反射鏡片陣列地設置於該基板上,形成一第一區域,其中一第二區域形成於該基板未設置該微型反射鏡片的部分; 一發光單元,架構於將一入射光投射至該數位微鏡裝置,使該數位微鏡裝置之該第一區域之該複數個微型反射鏡片反射該入射光,而投影成像;以及 一光學遮蔽件,設置於該數位微鏡裝置,且包含一框體及一鍍膜層,其中該框體包含一本體及一中空部,該本體環繞形成該中空部,其中該本體包含一第一表面、一第二表面、一內側表面及一缺口,其中該第一表面及該第二表面為該本體之兩相對表面,該內側表面連接於該第一表面,並且對應該中空部設置,其中該本體之該第二表面貼附於該數位微鏡裝置上,其中該缺口由該內側表面朝向遠離該中空部的方向凹陷形成,其中該鍍膜層設置於該本體之該第一表面,其中該鍍膜層之粗糙度小於500奈米,該鍍膜層對於該入射光之反射率小於5%,以及該鍍膜層對於該入射光之穿透率小於1%。 A projection display device comprises: A digital micro-mirror device comprising a substrate and a plurality of micro-reflective mirrors, wherein the plurality of micro-reflective mirrors are arranged in an array on the substrate to form a first area, wherein a second area is formed on a portion of the substrate where the micro-reflective mirrors are not arranged; A light-emitting unit is configured to project an incident light onto the digital micro-mirror device so that the plurality of micro-reflective mirrors in the first area of the digital micro-mirror device reflect the incident light to project an image; and An optical shielding member is disposed on the digital micromirror device and includes a frame and a coating layer, wherein the frame includes a body and a hollow portion, the body surrounds the hollow portion, wherein the body includes a first surface, a second surface, an inner surface and a notch, wherein the first surface and the second surface are two opposite surfaces of the body, the inner surface is connected to the first surface and corresponds to the hollow portion. The hollow portion is provided, wherein the second surface of the main body is attached to the digital microscope device, wherein the notch is formed by the inner surface being recessed in a direction away from the hollow portion, wherein the coating layer is provided on the first surface of the main body, wherein the roughness of the coating layer is less than 500 nanometers, the reflectivity of the coating layer to the incident light is less than 5%, and the transmittance of the coating layer to the incident light is less than 1%. 如請求項6所述之投影顯示裝置,其中該光學遮蔽件之該鍍膜層為一黑色鍍膜層。A projection display device as described in claim 6, wherein the coating layer of the optical shielding element is a black coating layer. 如請求項6所述之投影顯示裝置,其中該本體對應於該數位微鏡裝置之該第二區域設置,該中空部對應於該數位微鏡裝置之該第一區域設置,其中該光學遮蔽件之該中空部的面積大於或等於該數位微鏡裝置之該第一區域的面積。A projection display device as described in claim 6, wherein the main body is arranged corresponding to the second area of the digital microscope device, the hollow portion is arranged corresponding to the first area of the digital microscope device, and the area of the hollow portion of the optical shielding member is greater than or equal to the area of the first area of the digital microscope device. 如請求項6所述之投影顯示裝置,其中該框體之該本體為一不透光板件,且由一金屬材料製成,其中該金屬材料為鋁或鋁合金構成。A projection display device as described in claim 6, wherein the main body of the frame is an opaque plate made of a metal material, wherein the metal material is aluminum or an aluminum alloy. 如請求項6所述之投影顯示裝置,其中該缺口為一扇形截面缺口、一三角形截面缺口、一矩形截面缺口、一多邊形截面缺口或一不規則形截面缺口。A projection display device as described in claim 6, wherein the notch is a fan-shaped cross-sectional notch, a triangular cross-sectional notch, a rectangular cross-sectional notch, a polygonal cross-sectional notch or an irregular cross-sectional notch.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080043208A1 (en) * 2006-08-17 2008-02-21 Delta Electronics, Inc. Projection system and its optical shutter
TW201022825A (en) * 2008-12-08 2010-06-16 Mitsubishi Electric Corp Projection type display device
TW202117434A (en) * 2019-10-16 2021-05-01 明基電通股份有限公司 Projection system

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