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TWI872460B - Method for manufacturing circuit unit with coplanar structure - Google Patents

Method for manufacturing circuit unit with coplanar structure Download PDF

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TWI872460B
TWI872460B TW112106515A TW112106515A TWI872460B TW I872460 B TWI872460 B TW I872460B TW 112106515 A TW112106515 A TW 112106515A TW 112106515 A TW112106515 A TW 112106515A TW I872460 B TWI872460 B TW I872460B
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metal
circuit unit
self
manufacturing
coplanar structure
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TW112106515A
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TW202435369A (en
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陳祖旺
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大陸商北京集創北方科技股份有限公司
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Abstract

本發明主要揭示一種具共平面結構之電路單元的製造方法,其主要利用蒸鍍技術、微影蝕刻技術、自組裝單層技術、黏性平板壓印技術、以及旋塗技術在一基板之上製作出複數個具共平面結構的電子元件,使得至少二個所述電子元件組成一個電路單元。例如,在該基板上製作出一個二極體與一個電容以組成一個整流器,或製作出二個二極體與二個電容以組成一個二倍壓整流器。本發明之製造方法具有以下優點:產量高、穩定性佳、低設備成本以及適合大規模量產。The present invention mainly discloses a method for manufacturing a circuit unit with a coplanar structure, which mainly utilizes evaporation technology, photolithography technology, self-assembled single layer technology, adhesive plate imprinting technology, and spin coating technology to manufacture a plurality of electronic components with a coplanar structure on a substrate, so that at least two of the electronic components form a circuit unit. For example, a diode and a capacitor are manufactured on the substrate to form a rectifier, or two diodes and two capacitors are manufactured to form a double voltage rectifier. The manufacturing method of the present invention has the following advantages: high yield, good stability, low equipment cost, and suitability for large-scale mass production.

Description

具共平面結構之電路單元的製造方法Method for manufacturing circuit unit with coplanar structure

本發明為用於無線通信之電子電路的相關技術領域,尤指一種具共平面結構之電路單元的製造方法。The present invention relates to the related technical field of electronic circuits used for wireless communication, and more particularly to a method for manufacturing a circuit unit with a coplanar structure.

近年來,無線射頻辨識(Radio Frequency Identification, RFID)技術係迅速發展,且其經常應用於識別證、門禁卡、悠遊卡、金融卡、信用卡、以及電子標籤。In recent years, Radio Frequency Identification (RFID) technology has developed rapidly and is often used in ID cards, access cards, EasyCards, debit cards, credit cards, and electronic tags.

請參閱圖1,其顯示為習知的一種RFID系統的架構圖。如圖1所示,習知的RFID系統1a主要包括:一應答機(Transponder)11a以及一讀取機(reader)12a,其中該讀取機12a通常整合在一電子裝置2a之中。進一步地,圖2為圖1所示之應答機11a和讀取機12a的電路方塊圖。如圖1與圖2所示,該應答機11a包括一第一天線111a以及一第一控制電路112a,且該控制電路112a包括:一第一電容C1a、一調製器(modulator)11Ma、一整流單元11Fa、以及一邏輯電路單元11La。另一方面,該讀取機12a包括一第二天線121a以及一第二控制電路122a,且該第二控制電路122a包括:一第二電容C1a以及一讀取電路單元12Ra。Please refer to FIG. 1, which shows a schematic diagram of a known RFID system. As shown in FIG. 1, the known RFID system 1a mainly includes: a transponder 11a and a reader 12a, wherein the reader 12a is usually integrated into an electronic device 2a. Further, FIG. 2 is a circuit block diagram of the transponder 11a and the reader 12a shown in FIG. 1. As shown in FIG. 1 and FIG. 2, the transponder 11a includes a first antenna 111a and a first control circuit 112a, and the control circuit 112a includes: a first capacitor C1a, a modulator 11Ma, a rectifier unit 11Fa, and a logic circuit unit 11La. On the other hand, the reader 12a includes a second antenna 121a and a second control circuit 122a, and the second control circuit 122a includes: a second capacitor C1a and a reading circuit unit 12Ra.

由圖2可知,二極體和電容為所述整流單元11Fa的主要電子元件,使得所述整流單元11Fa可以將該第一天線111a所接收的一交流信號轉換成一直流信號。換句話說,二極體和電容的性能直接影響該應答機11a的效能。As shown in Fig. 2, the diode and the capacitor are the main electronic components of the rectifier unit 11Fa, so that the rectifier unit 11Fa can convert an AC signal received by the first antenna 111a into a DC signal. In other words, the performance of the diode and the capacitor directly affects the performance of the answering machine 11a.

已知,現有技術利用有機材料或無機材料製作二極體和電容。舉例而言,文獻一提出了一種利用並五苯(pentacene)製成的有機二極體以及使用該有機二極體的整流器。另一方面,文獻二提出了一種利用C60和WO 3製成的二極體以及使用該二極體的整流器。於此,文獻一指的是 D. Im et al., “Towards gigahertz operation: Ultrafast low turn-on organic diodes and rectifiers based on C60 and tungsten oxide”, Nat. Mater. 4, 597-600 (2005)。並且,文獻二指的是S. Steudel et al., “50MHz rectifier based on an organic diode”,  Adv. Mater., vol. 23, no. 5, pp. 644–648 (2011)。    進一步地,文獻三提出了一種利用非晶氧化銦鎵鋅(amorphous IGZO)製成的蕭特基二極體以及使用該蕭特基二極體的整流器。於此,文獻三指的是 Chasin A et al., “Gigahertz operation of a-IGZO Schottky diodes”, IEEE Trans. Electron. Devices 60, 3407–3412 (2013)。 It is known that the prior art uses organic materials or inorganic materials to make diodes and capacitors. For example, document 1 proposes an organic diode made of pentacene and a rectifier using the organic diode. On the other hand, document 2 proposes a diode made of C60 and WO 3 and a rectifier using the diode. Here, document 1 refers to D. Im et al., “Towards gigahertz operation: Ultrafast low turn-on organic diodes and rectifiers based on C60 and tungsten oxide”, Nat. Mater. 4, 597-600 (2005). Furthermore, reference 2 refers to S. Steudel et al., “50MHz rectifier based on an organic diode”, Adv. Mater., vol. 23, no. 5, pp. 644–648 (2011). Furthermore, reference 3 proposes a Schottky diode made of amorphous indium gallium zinc oxide (amorphous IGZO) and a rectifier using the Schottky diode. Here, reference 3 refers to Chasin A et al., “Gigahertz operation of a-IGZO Schottky diodes”, IEEE Trans. Electron. Devices 60, 3407–3412 (2013).

實務經驗顯示,文獻一、文獻二和文獻三所提出的製造方法皆可被應用於整流二極體的製作,然而習知的製造方法需要在真空環境下才能夠實現,因而具有產量低以及成本高等缺點。Practical experience shows that the manufacturing methods proposed in Reference 1, Reference 2 and Reference 3 can all be applied to the manufacture of rectifier diodes. However, the conventional manufacturing methods need to be implemented in a vacuum environment, and thus have disadvantages such as low yield and high cost.

由上述說明可知,本領域亟需一種具共平面結構之電路單元的製造方法。From the above description, it can be seen that there is an urgent need in the art for a method for manufacturing a circuit unit with a coplanar structure.

本發明之主要目的在於提供一種具共平面結構之電路單元的製造方法,其主要利用蒸鍍技術、微影蝕刻技術、自組裝單層技術、黏性平板壓印技術、以及旋塗技術在一基板之上製作出複數個具共平面結構的電子元件,使得至少二個所述電子元件組成一個電路單元。例如,在該基板上製作出一個二極體與一個電容以組成一個整流器,或製作出二個二極體與二個電容以組成一個二倍壓整流器。本發明之製造方法具有以下優點:產量高、穩定性佳、低設備成本以及適合大規模量產。The main purpose of the present invention is to provide a method for manufacturing a circuit unit with a coplanar structure, which mainly utilizes evaporation technology, lithography technology, self-assembled single layer technology, adhesive plate imprinting technology, and spin coating technology to manufacture a plurality of electronic components with a coplanar structure on a substrate, so that at least two of the electronic components form a circuit unit. For example, a diode and a capacitor are manufactured on the substrate to form a rectifier, or two diodes and two capacitors are manufactured to form a double voltage rectifier. The manufacturing method of the present invention has the following advantages: high yield, good stability, low equipment cost, and suitability for large-scale mass production.

為達成上述目的,本發明提出所述具共平面結構之電路單元的製造方法的一實施例,其包括: 在一基板之上形成一包含至少一第一金屬板的第一圖案化(patterned)金屬層; 在各所述第一金屬板覆上一自組裝單分子膜(Self-assembled monolayer, SAM); 在該基板及覆有所述自組裝單分子膜的該至少一第一金屬板之上形成一金屬層,並將一膠帶貼附在該金屬層之上; 沿一方向撕開該膠帶,使該金屬層在該基板上變成一包含至少一第二金屬板的第二圖案化金屬層; 除去所有自組裝單分子膜,使得任一所述第一金屬板和與其相鄰的一個所述第二金屬板之間具有一間隙;以及 在各所述間隙內形成一介電層,使得所述介電層以及夾置該介電層的一個所述第一金屬板和一個所述第二金屬板共同組成一個電子元件,且至少二個所述電子元件組成一個電路單元。 To achieve the above-mentioned purpose, the present invention proposes an embodiment of a method for manufacturing a circuit unit with a coplanar structure, which comprises: Forming a first patterned metal layer including at least one first metal plate on a substrate; Covering each of the first metal plates with a self-assembled monolayer (SAM); Forming a metal layer on the substrate and the at least one first metal plate covered with the self-assembled monolayer, and attaching a tape to the metal layer; Tearing the tape in one direction so that the metal layer becomes a second patterned metal layer including at least one second metal plate on the substrate; Removing all the self-assembled monolayers so that there is a gap between any of the first metal plates and a second metal plate adjacent thereto; and A dielectric layer is formed in each of the gaps, so that the dielectric layer and the first metal plate and the second metal plate sandwiching the dielectric layer together constitute an electronic component, and at least two of the electronic components constitute a circuit unit.

在一實施例中,所述電子元件為一二極體或一電容。In one embodiment, the electronic component is a diode or a capacitor.

在一實施例中,該第一圖案化金屬層還包括至少一第一金屬墊與至少一第一金屬線,且該第二圖案化金屬層還包括至少一第二金屬墊與至少一第二金屬線。In one embodiment, the first patterned metal layer further includes at least one first metal pad and at least one first metal line, and the second patterned metal layer further includes at least one second metal pad and at least one second metal line.

在一實施例中,所述第一金屬板和所述第二金屬板係由一金屬材料製成,且該金屬材料包含選自於由金、鉑、鋁、銀、和銅所組成群組之中的至少一種金屬。In one embodiment, the first metal plate and the second metal plate are made of a metal material, and the metal material includes at least one metal selected from the group consisting of gold, platinum, aluminum, silver, and copper.

在一實施例中,所述介電層包含選自於由三氧化二鋁(Al 2O 3)、二氧化鉿(HfO 2)、五氧化二鉭(Ta 2O 5)、二氧化鋯(ZrO 2)、氧化鋅(ZnO)、二氧化鈦(TiO 2)、氧化鎂(MgO)、和氮化鈦(TiN)組成群組之中的至少一種介電材料。 In one embodiment, the dielectric layer includes at least one dielectric material selected from the group consisting of aluminum oxide ( Al2O3 ), helium oxide ( HfO2 ), tantalum pentoxide ( Ta2O5 ), zirconium oxide ( ZrO2 ), zinc oxide ( ZnO ), titanium oxide ( TiO2 ), magnesium oxide (MgO), and titanium nitride (TiN).

在一實施例中,所述自組裝單分子膜具有一分子長度,使得所述間隙的大小和所述分子長度的大小相等。In one embodiment, the self-assembled monolayer has a molecular length, so that the size of the gap is equal to the size of the molecular length.

在一實施例中,除去所有自組裝單分子膜之時,係將該基板置入一紫外光臭氧清洗機之中,並操作該紫外光臭氧清洗機向該基板之上的所述自組裝單分子膜提供紫外光和臭氧,從而利用紫外光和臭氧分解所述自組裝單分子膜,最終自該基板之上將分解的所述自組裝單分子膜去除。In one embodiment, when all self-assembled monolayers are removed, the substrate is placed in a UV-ozone cleaning machine, and the UV-ozone cleaning machine is operated to provide UV light and ozone to the self-assembled monolayers on the substrate, thereby utilizing UV light and ozone to decompose the self-assembled monolayers, and finally removing the decomposed self-assembled monolayers from the substrate.

在一實施例中,所述自組裝單分子膜由一有機材料製成,該有機材料的分子結構包括具親金屬性的一第一端、具疏金屬性的一第二端與連接於該第一端和該第二端之間的一中間段。In one embodiment, the self-assembled monolayer is made of an organic material, and the molecular structure of the organic material includes a first end with metallophilicity, a second end with metallophobicity, and a middle section connected between the first end and the second end.

在一實施例中,該有機材料為選自於十八碳硫醇(Octadecanethiolate, ODT)和十八烷基膦酸(Octadecylphosphonic acid, ODPA)所組成群組之中的任一者。In one embodiment, the organic material is any one selected from the group consisting of octadecanethiolate (ODT) and octadecylphosphonic acid (ODPA).

在一實施例中,係先將至少一所述介電材料溶於一溶劑之中以獲得一溶液,而後將該溶液填入所述間隙之中,待所述溶劑蒸發之後即在各間隙內形成所述介電層。In one embodiment, at least one of the dielectric materials is first dissolved in a solvent to obtain a solution, and then the solution is filled into the gaps. After the solvent evaporates, the dielectric layer is formed in each gap.

為使  貴審查委員能進一步瞭解本發明之結構、特徵、目的、與其優點,茲附以圖式及較佳具體實施例之詳細說明如後。In order to enable the Review Committee to further understand the structure, features, purpose, and advantages of the present invention, the following are attached with drawings and detailed descriptions of preferred specific embodiments.

請參閱圖3,其為利用本發明之製造方法所製得的一個電路單元的上視圖。本發明主要揭示一種具共平面結構之電路單元的製造方法,其主要利用蒸鍍技術、微影蝕刻技術、自組裝單層技術、黏性平板壓印技術、以及旋塗技術在一基板10之上製作出複數個具共平面結構的電子元件(1C1, 1C2, 1D1, 1D2),使得至少二個所述電子元件組成一個具共平面結構的電路單元1。Please refer to FIG3, which is a top view of a circuit unit manufactured by the manufacturing method of the present invention. The present invention mainly discloses a manufacturing method of a circuit unit with a coplanar structure, which mainly utilizes evaporation technology, lithography technology, self-assembled single layer technology, adhesive plate imprinting technology, and spin coating technology to manufacture a plurality of electronic components (1C1, 1C2, 1D1, 1D2) with a coplanar structure on a substrate 10, so that at least two of the electronic components form a circuit unit 1 with a coplanar structure.

圖4為圖3所示之電路單元的電路圖。如圖3與圖4所示,該電路單元1為一二倍壓整流器,其包括:一第一二極體1D1、一第二二極體1D2、一第一電容1C1、以及一第二電容1C2,其中該第一二極體1D1的陽極端通過一第一導線而耦接一第一金屬墊MP1,且其陰極端通過一第二導線而耦接一第二金屬墊MP2。另一方面,該第二二極體1D2的陰極端通過一第三導線而耦接該第一金屬墊MP1,且其陽極端通過一第四導線而耦接一第三金屬墊MP3。另一方面,更詳細地說明,該第一電容1C1的第一端通過一第五導線而耦接該第二導線,且其第二端通過一第六導線而耦接一第四金屬墊MP4。再者,該第二電容1C2的第一端耦接該第六導線,且其第二端通過一第七導線而耦接該第四導線。FIG4 is a circuit diagram of the circuit unit shown in FIG3. As shown in FIG3 and FIG4, the circuit unit 1 is a double voltage rectifier, which includes: a first diode 1D1, a second diode 1D2, a first capacitor 1C1, and a second capacitor 1C2, wherein the anode end of the first diode 1D1 is coupled to a first metal pad MP1 through a first wire, and the cathode end thereof is coupled to a second metal pad MP2 through a second wire. On the other hand, the cathode end of the second diode 1D2 is coupled to the first metal pad MP1 through a third wire, and the anode end thereof is coupled to a third metal pad MP3 through a fourth wire. On the other hand, to explain in more detail, the first end of the first capacitor 1C1 is coupled to the second wire through a fifth wire, and the second end thereof is coupled to a fourth metal pad MP4 through a sixth wire. Furthermore, the first end of the second capacitor 1C2 is coupled to the sixth wire, and the second end thereof is coupled to the fourth wire through a seventh wire.

由圖4與圖3可知,該第一二極體1D1由共平面的一個第一金屬板M1、一個介電層DL以及一個第二金屬板M2所組成,且該第二二極體1D2同樣是由共平面的一個第一金屬板M1、一個介電層DL以及一個第二金屬板M2所組成。另一方面,該第一電容1C1由共平面的一個第一金屬板M1、一個介電層DL以及一個第二金屬板M2所組成,且該第二電容1C2同樣是由共平面的一個第一金屬板M1、一個介電層DL以及一個第二金屬板M2所組成。As can be seen from FIG. 4 and FIG. 3 , the first diode 1D1 is composed of a first metal plate M1, a dielectric layer DL, and a second metal plate M2 in the same plane, and the second diode 1D2 is also composed of a first metal plate M1, a dielectric layer DL, and a second metal plate M2 in the same plane. On the other hand, the first capacitor 1C1 is composed of a first metal plate M1, a dielectric layer DL, and a second metal plate M2 in the same plane, and the second capacitor 1C2 is also composed of a first metal plate M1, a dielectric layer DL, and a second metal plate M2 in the same plane.

必須加以強調的是,利用本發明之製造分法所製得之電路單元1係包含至少一個二極體及/或電容,因此並不限於二倍壓整流器。圖3和圖4所繪出的二倍壓整流器只是用以作為示範例,用以表示本發明之具共平面結構之電路單元1。接著,於下文中,將藉由多個製造流程圖的輔助加以說明如何製造出如圖3所示之具共平面結構的電路單元1。It must be emphasized that the circuit unit 1 manufactured by the manufacturing method of the present invention includes at least one diode and/or capacitor, and is therefore not limited to a double voltage rectifier. The double voltage rectifiers shown in FIG3 and FIG4 are only used as examples to represent the circuit unit 1 with a coplanar structure of the present invention. Next, in the following, it will be explained how to manufacture the circuit unit 1 with a coplanar structure as shown in FIG3 with the aid of a plurality of manufacturing flow charts.

請接著參閱圖5,其為本發明之一種具共平面結構之電路單元的製造方法的流程圖。並且,請搭配參閱圖6A~圖6H,其為本發明之具共平面結構之電路單元的製造流程圖。如圖5與圖6A所示,製造方法係首先執行步驟S1:在一基板10之上形成一包含至少一第一金屬板M1的第一圖案化(patterned)金屬層11。具體地,可先利用蒸鍍設備沉積一金屬層在該基板10之上,接著再利用微影蝕刻技術(photolithography)將該金屬層加工成為所述第一圖案化金屬層11,使得該第一圖案化金屬層11包含至少一個第一金屬板M1。並且,在實務上,亦可使該第一圖案化金屬層11同時包含至少一第一金屬墊(作為信號輸入或輸出金屬電極)與至少一第一金屬線(作為兩個電子元件之間的連線)。另一方面,所述第一金屬板M1的製造材料可以是金、鉑、鋁、銀、銅、前述任兩者之複合物、或前述任兩者以上之複合物。Please refer to FIG. 5, which is a flow chart of a method for manufacturing a circuit unit with a coplanar structure of the present invention. In addition, please refer to FIG. 6A to FIG. 6H, which are flow charts of manufacturing a circuit unit with a coplanar structure of the present invention. As shown in FIG. 5 and FIG. 6A, the manufacturing method first performs step S1: forming a first patterned metal layer 11 including at least one first metal plate M1 on a substrate 10. Specifically, a metal layer can be first deposited on the substrate 10 using an evaporation device, and then the metal layer is processed into the first patterned metal layer 11 using photolithography technology, so that the first patterned metal layer 11 includes at least one first metal plate M1. Furthermore, in practice, the first patterned metal layer 11 may also include at least one first metal pad (as a signal input or output metal electrode) and at least one first metal wire (as a connection between two electronic components). On the other hand, the manufacturing material of the first metal plate M1 may be gold, platinum, aluminum, silver, copper, a composite of any two of the foregoing, or a composite of any two or more of the foregoing.

如圖5與圖6B所示,方法流程接著執行步驟S2:在各所述第一金屬板M1覆上一自組裝單分子膜(Self-assembled monolayer, SAM)12。值得說明的是,所述自組裝單分子膜12由一有機材料製成,該有機材料的分子結構包括具親金屬性的一第一端、具疏金屬性的一第二端與連接於該第一端和該第二端之間的一中間段。舉例而言,可以使用十八碳硫醇(Octadecanethiolate, ODT)或十八烷基膦酸(Octadecylphosphonic acid, ODPA)作為用以形成所述自組裝單分子膜12的有機材料。由於ODT和ODPA的分子長度大約在20 nm左右,因此利用ODT或ODPA所製成的自組裝單分子膜12也僅會具有20 nm的膜厚。再者,由於ODT(或ODPA)含有具親金屬性的第一端以及具疏金屬性的第二端,因此,在沉積ODT(或ODPA)的過程中,ODT(或ODPA)的分子自組裝單層膜只會形成在第一金屬板M1的表面,而不會沉積在基板10之上。As shown in FIG. 5 and FIG. 6B , the method flow then performs step S2: a self-assembled monolayer (SAM) 12 is coated on each of the first metal plates M1. It is worth noting that the self-assembled monolayer 12 is made of an organic material, and the molecular structure of the organic material includes a first end with metal affinity, a second end with metal phobicity, and a middle section connected between the first end and the second end. For example, octadecanethiolate (ODT) or octadecylphosphonic acid (ODPA) can be used as an organic material for forming the self-assembled monolayer 12. Since the molecular length of ODT and ODPA is about 20 nm, the self-assembled monolayer 12 made using ODT or ODPA will only have a film thickness of 20 nm. Furthermore, since ODT (or ODPA) contains a metal-philic first end and a metal-phobic second end, during the deposition process of ODT (or ODPA), a molecular self-assembled monolayer film of ODT (or ODPA) will only be formed on the surface of the first metal plate M1 and will not be deposited on the substrate 10.

如圖5與圖6C~6F所示,方法流程接著執行步驟S3:在該基板10及覆有所述自組裝單分子膜12的該至少一第一金屬板M1之上形成一金屬層13,並將一膠帶14貼附在該金屬層13之上。進一步地,在步驟S4之中,係   沿一方向撕開該膠帶14,使該金屬層13在該基板10上變成一包含至少一第二金屬板M2的第二圖案化金屬層15。應可理解,步驟S3~S4係利用蒸鍍技術與黏性平板壓印技術,在該基板10及覆有所述自組裝單分子膜12的該至少一第一金屬板M1之上進一步地製作出一個第二圖案化金屬層15。值得說明的是,由於覆於第一金屬板M1之上的自組裝單分子膜12是以其親金屬端(即,第一端)連接該第一金屬板M1,故其親金屬端即為自組裝單分子膜12的下側。因此,自組裝單分子膜12的疏金屬端自然位於其上側(即,遠離第一金屬板M1的該側)。換句話說,在圖6C中,自組裝單分子膜12是以其疏金屬端接觸所述金屬層13。故此,在圖6D與圖6E中,當沿一方向撕開該膠帶14之時,位於自組裝單分子膜12之上的金屬層13的部分係由該膠帶14所全部沾黏帶走,而位於任兩個所述第一金屬板M1之間的金屬層13的部分則由該膠帶14所部分沾黏帶走。As shown in FIG. 5 and FIG. 6C-6F, the method flow then performs step S3: forming a metal layer 13 on the substrate 10 and the at least one first metal plate M1 covered with the self-assembled monolayer 12, and attaching a tape 14 to the metal layer 13. Further, in step S4, the tape 14 is torn off in one direction, so that the metal layer 13 becomes a second patterned metal layer 15 including at least one second metal plate M2 on the substrate 10. It should be understood that steps S3-S4 utilize evaporation technology and adhesive plate imprinting technology to further produce a second patterned metal layer 15 on the substrate 10 and the at least one first metal plate M1 covered with the self-assembled monolayer 12. It is worth noting that, since the self-assembled monolayer 12 covered on the first metal plate M1 is connected to the first metal plate M1 with its metallophilic end (i.e., the first end), its metallophilic end is the lower side of the self-assembled monolayer 12. Therefore, the metalphobic end of the self-assembled monolayer 12 is naturally located on its upper side (i.e., the side away from the first metal plate M1). In other words, in FIG. 6C , the self-assembled monolayer 12 contacts the metal layer 13 with its metalphobic end. Therefore, in Figures 6D and 6E, when the tape 14 is torn off in one direction, the portion of the metal layer 13 located on the self-assembled monolayer 12 is completely adhered and taken away by the tape 14, while the portion of the metal layer 13 located between any two of the first metal plates M1 is partially adhered and taken away by the tape 14.

實務上,亦可使該第二圖案化金屬層12同時包含至少一第二金屬墊(作為信號輸入或輸出金屬電極)與至少一第二金屬線(作為兩個電子元件之間的連線)。另一方面,所述第二金屬板M2的製造材料可以是金、鉑、鋁、銀、銅、前述任兩者之複合物、或前述任兩者以上之複合物。In practice, the second patterned metal layer 12 may also include at least one second metal pad (as a signal input or output metal electrode) and at least one second metal wire (as a connection between two electronic components). On the other hand, the manufacturing material of the second metal plate M2 may be gold, platinum, aluminum, silver, copper, a composite of any two of the foregoing, or a composite of any two or more of the foregoing.

如圖5與圖6F~6G所示,方法流程接著執行步驟S5:除去所有自組裝單分子膜12,使得任一所述第一金屬板M1和與其相鄰的一個所述第二金屬板M2之間具有一間隙12S。具體地,除去所有自組裝單分子膜12之時,係將該基板10置入一紫外光臭氧清洗機之中,接著操作該紫外光臭氧清洗機向該基板10之上的所述自組裝單分子膜12提供紫外光及/或臭氧,從而利用紫外光及/或臭氧分解所述自組裝單分子膜12,最終自該基板10之上將分解的所述自組裝單分子膜12去除。重複說明的是,由於ODT和ODPA的分子長度大約在20 nm左右,因此利用ODT或ODPA所製成的自組裝單分子膜12也僅會具有20 nm的膜厚。換句話說,所述間隙12S的大小會與所述分子長度的大小相等。As shown in FIG. 5 and FIG. 6F-6G , the method flow then performs step S5: removing all the self-assembled monolayers 12, so that there is a gap 12S between any of the first metal plates M1 and one of the second metal plates M2 adjacent thereto. Specifically, when removing all the self-assembled monolayers 12, the substrate 10 is placed in a UV-ozone cleaning machine, and then the UV-ozone cleaning machine is operated to provide UV light and/or ozone to the self-assembled monolayers 12 on the substrate 10, thereby utilizing the UV light and/or ozone to decompose the self-assembled monolayers 12, and finally removing the decomposed self-assembled monolayers 12 from the substrate 10. It is to be repeated that since the molecular length of ODT and ODPA is about 20 nm, the self-assembled monolayer 12 made of ODT or ODPA will only have a thickness of 20 nm. In other words, the size of the gap 12S will be equal to the size of the molecular length.

如圖5與圖6G~6H所示,方法流程最終執行步驟S6:在各所述間隙12S內形成一介電層DL,使得所述介電層以及夾置該介電層的一個所述第一金屬板M1和一個所述第二金屬板M2共同組成一個電子元件(1C1, 1C2, 1D1, 或1D2),且至少二個所述電子元件組成一個電路單元1。具體地,執行步驟S6之時,係先將至少一種介電材料溶於一溶劑之中以獲得一溶液,而後將該溶液填入所述間隙12S之中,待所述溶劑蒸發之後即在各間隙12S內形成所述介電層DL。其中,所述介電層可以是三氧化二鋁(Al 2O 3)、二氧化鉿(HfO 2)、五氧化二鉭(Ta 2O 5)、二氧化鋯(ZrO 2)、氧化鋅(ZnO)、二氧化鈦(TiO 2)、氧化鎂(MgO)、或氮化鈦(TiN)。 As shown in FIG. 5 and FIG. 6G to FIG. 6H , the method flow finally performs step S6: forming a dielectric layer DL in each of the gaps 12S, so that the dielectric layer and the first metal plate M1 and the second metal plate M2 sandwiching the dielectric layer together constitute an electronic component (1C1, 1C2, 1D1, or 1D2), and at least two of the electronic components constitute a circuit unit 1. Specifically, when performing step S6, at least one dielectric material is first dissolved in a solvent to obtain a solution, and then the solution is filled into the gaps 12S, and after the solvent evaporates, the dielectric layer DL is formed in each of the gaps 12S. The dielectric layer may be aluminum oxide (Al 2 O 3 ), helium oxide (HfO 2 ), tantalum pentoxide (Ta 2 O 5 ), zirconium oxide (ZrO 2 ), zinc oxide (ZnO), titanium oxide (TiO 2 ), magnesium oxide (MgO), or titanium nitride (TiN).

舉例而言,在第一金屬板M1的材質為金且第一金屬板M2的材質為鋁的情況下,可以將ZnO加入NH 4(OH)之中以獲得一溶液,接著將該溶液填入所述間隙12S之中,待溶劑蒸發之後即在各間隙12S內形成一個ZnO奈米結構層以作為所述介電層DL。此時,ZnO奈米結構層以及夾置該ZnO奈米結構層的一個所述第一金屬板M1和一個所述第二金屬板M2共同組成一個蕭特基二極體,且此蕭特基二極體的開啟電壓僅為0.1V,且其整流比可以達到105。再另舉例而言,在第一金屬板M1的材質為金且第一金屬板M2的材質為鋁的情況下,可採用二氧化鋯(ZrO 2)作為用以製造該介電層DL的介電材料。 For example, when the material of the first metal plate M1 is gold and the material of the first metal plate M2 is aluminum, ZnO can be added to NH 4 (OH) to obtain a solution, and then the solution is filled into the gaps 12S. After the solvent evaporates, a ZnO nanostructure layer is formed in each gap 12S to serve as the dielectric layer DL. At this time, the ZnO nanostructure layer and the first metal plate M1 and the second metal plate M2 sandwiching the ZnO nanostructure layer together form a Schottky diode, and the turn-on voltage of the Schottky diode is only 0.1V, and its rectification ratio can reach 105. For another example, when the material of the first metal plate M1 is gold and the material of the first metal plate M2 is aluminum, zirconium dioxide (ZrO 2 ) may be used as the dielectric material for manufacturing the dielectric layer DL.

最終,對照圖6H與圖3可知,圖3之中的第一二極體1D1由共平面的一個第一金屬板M1、一個介電層DL以及一個第二金屬板M2所組成,其中該介電層DL例如為一ZnO奈米結構層。同樣地,圖3之中的第二二極體1D2由共平面的一個第一金屬板M1、一個介電層DL以及一個第二金屬板M2所組成,其中該介電層DL例如為一ZnO奈米結構層。另一方面,圖3之中的該第一電容1C1由共平面的一個第一金屬板M1、一個介電層DL以及一個第二金屬板M2所組成,其中該介電層DL為一二氧化鋯層。同樣地,圖3之中的二電容1C2同樣是由共平面的一個第一金屬板M1、一個介電層DL以及一個第二金屬板M2所組成,其中該介電層DL為一二氧化鋯層。Finally, by comparing FIG. 6H with FIG. 3 , it can be seen that the first diode 1D1 in FIG. 3 is composed of a first metal plate M1, a dielectric layer DL, and a second metal plate M2 in the same plane, wherein the dielectric layer DL is, for example, a ZnO nanostructure layer. Similarly, the second diode 1D2 in FIG. 3 is composed of a first metal plate M1, a dielectric layer DL, and a second metal plate M2 in the same plane, wherein the dielectric layer DL is, for example, a ZnO nanostructure layer. On the other hand, the first capacitor 1C1 in FIG. 3 is composed of a first metal plate M1, a dielectric layer DL, and a second metal plate M2 in the same plane, wherein the dielectric layer DL is a zirconia layer. Similarly, the two capacitors 1C2 in FIG. 3 are also composed of a first metal plate M1, a dielectric layer DL, and a second metal plate M2 on the same plane, wherein the dielectric layer DL is a zirconia layer.

如此,上述已完整且清楚地說明本發明之具共平面結構之電路單元的製造方法;並且,經由上述可得知本發明具有下列優點:Thus, the above has completely and clearly described the manufacturing method of the circuit unit with a coplanar structure of the present invention; and, from the above, it can be known that the present invention has the following advantages:

(1)本發明提供一種具共平面結構之電路單元的製造方法,其主要利用蒸鍍技術、微影蝕刻技術、自組裝單層技術、黏性平板壓印技術、以及旋塗技術在一基板之上製作出複數個具共平面結構的電子元件,使得至少二個所述電子元件組成一個電路單元。例如,在該基板上製作出一個二極體與一個電容以組成一個整流器,或製作出二個二極體與二個電容以組成一個二倍壓整流器。本發明之製造方法具有以下優點:產量高、穩定性佳、低設備成本以及適合大規模量產。(1) The present invention provides a method for manufacturing a circuit unit with a coplanar structure, which mainly utilizes evaporation technology, photolithography technology, self-assembled single layer technology, adhesive plate imprinting technology, and spin coating technology to manufacture a plurality of electronic components with a coplanar structure on a substrate, so that at least two of the electronic components form a circuit unit. For example, a diode and a capacitor are manufactured on the substrate to form a rectifier, or two diodes and two capacitors are manufactured to form a double voltage rectifier. The manufacturing method of the present invention has the following advantages: high yield, good stability, low equipment cost, and suitability for large-scale mass production.

必須加以強調的是,前述本案所揭示者乃為較佳實施例,舉凡局部之變更或修飾而源於本案之技術思想而為熟習該項技藝之人所易於推知者,俱不脫本案之專利權範疇。It must be emphasized that what is disclosed in the above-mentioned case is a preferred embodiment. Any partial changes or modifications that are derived from the technical ideas of this case and are easily inferred by people familiar with the art do not deviate from the scope of the patent rights of this case.

綜上所陳,本案無論目的、手段與功效,皆顯示其迥異於習知技術,且其首先發明合於實用,確實符合發明之專利要件,懇請  貴審查委員明察,並早日賜予專利俾嘉惠社會,是為至禱。In summary, this case shows that its purpose, means and effects are very different from the known technology, and it is the first invention that is practical and indeed meets the patent requirements for invention. We sincerely request the review committee to examine this carefully and grant a patent as soon as possible to benefit the society. This is our utmost prayer.

1a:RFID系統 11a:應答機 111a:第一天線 112a:第一控制電路 11Ma:調製器 11Fa:整流單元 11La:邏輯電路單元 12a:讀取機 121a:第二天線 122a:第二控制電路 12Ra:讀取電路單元 2a:電子裝置 C1a:第一電容 C2a:第二電容 1:電路單元 10:基板 11:第一圖案化金屬層 12:自組裝單分子膜 13:金屬層 14:膠帶 15:第二圖案化金屬層 1D1:第一二極體 1D2:第二二極體 1C1:第一電容 1C2:第二電容 MP1:第一金屬墊 MP2:第二金屬墊 MP3:第三金屬墊 MP4:第四金屬墊 M1:第一金屬板 M2:第二金屬板 S1:在一基板之上形成一包含至少一第一金屬板的第一圖案化金屬層 S2:在各所述第一金屬板覆上一自組裝單分子膜 S3:在該基板及覆有所述自組裝單分子膜的該至少一第一金屬板之上形成一金屬層,並將一膠帶貼附在該金屬層之上 S4:沿一方向撕開該膠帶,使該金屬層在該基板上變成一包含至少一第二金屬板的第二圖案化金屬層 S5:除去所有自組裝單分子膜,使得任一所述第一金屬板和與其相鄰的一個所述第二金屬板之間具有一間隙 S6:在各所述間隙內形成一介電層,使得所述介電層以及夾置該介電層的一個所述第一金屬板和一個所述第二金屬板共同組成一個電子元件,且至少二個所述電子元件組成一個電路單元 1a: RFID system 11a: transponder 111a: first antenna 112a: first control circuit 11Ma: modulator 11Fa: rectifier unit 11La: logic circuit unit 12a: reader 121a: second antenna 122a: second control circuit 12Ra: reader circuit unit 2a: electronic device C1a: first capacitor C2a: second capacitor 1: circuit unit 10: substrate 11: first patterned metal layer 12: self-assembled monolayer 13: metal layer 14: tape 15: second patterned metal layer 1D1: first diode 1D2: second diode 1C1: first capacitor 1C2: second capacitor MP1: first metal pad MP2: second metal pad MP3: third metal pad MP4: fourth metal pad M1: first metal plate M2: second metal plate S1: forming a first patterned metal layer including at least one first metal plate on a substrate S2: coating each of the first metal plates with a self-assembled monolayer S3: forming a metal layer on the substrate and the at least one first metal plate coated with the self-assembled monolayer, and attaching a tape to the metal layer S4: tearing the tape in a direction, so that the metal layer becomes a second patterned metal layer including at least one second metal plate on the substrate S5: remove all self-assembled monolayers, so that there is a gap between any of the first metal plates and the second metal plates adjacent to it S6: form a dielectric layer in each of the gaps, so that the dielectric layer and the first metal plate and the second metal plate sandwiching the dielectric layer together constitute an electronic component, and at least two of the electronic components constitute a circuit unit

圖1為習知的一種RFID系統的架構圖; 圖2為圖1所示之應答機和讀取機的電路方塊圖; 圖3為利用本發明之製造方法所製得的一個電路單元的上視圖; 圖4為圖3所示之電路單元的電路圖; 圖5為本發明之一種具共平面結構之電路單元的製造方法的流程圖;以及 圖6A至圖6H為本發明之具共平面結構之電路單元的製造流程圖。 FIG. 1 is a block diagram of a known RFID system; FIG. 2 is a circuit block diagram of the transponder and reader shown in FIG. 1; FIG. 3 is a top view of a circuit unit manufactured using the manufacturing method of the present invention; FIG. 4 is a circuit diagram of the circuit unit shown in FIG. 3; FIG. 5 is a flow chart of a manufacturing method of a circuit unit with a coplanar structure of the present invention; and FIG. 6A to FIG. 6H are manufacturing flow charts of a circuit unit with a coplanar structure of the present invention.

S1:在一基板之上形成一包含至少一第一金屬板的第一圖案化金屬層 S1: Forming a first patterned metal layer including at least one first metal plate on a substrate

S2:在各所述第一金屬板覆上一自組裝單分子膜 S2: Cover each of the first metal plates with a self-assembled monolayer

S3:在該基板及覆有所述自組裝單分子膜的該至少一第一金屬板之上形成一金屬層,並將一膠帶貼附在該金屬層之上 S3: Form a metal layer on the substrate and the at least one first metal plate covered with the self-assembled monolayer, and attach a tape to the metal layer

S4:沿一方向撕開該膠帶,使該金屬層在該基板上變成一包含至少一第二金屬板的第二圖案化金屬層 S4: Tear the tape in one direction so that the metal layer on the substrate becomes a second patterned metal layer including at least one second metal plate

S5:除去所有自組裝單分子膜,使得任一所述第一金屬板和與其相鄰的一個所述第二金屬板之間具有一間隙 S5: Remove all self-assembled monolayers, so that there is a gap between any of the first metal plates and the second metal plate adjacent to it

S6:在各所述間隙內形成一介電層,使得所述介電層以及夾置該介電層的一個所述第一金屬板和一個所述第二金屬板共同組成一個電子元件,且至少二個所述電子元件組成一個電路單元 S6: forming a dielectric layer in each of the gaps, so that the dielectric layer and the first metal plate and the second metal plate sandwiching the dielectric layer together constitute an electronic component, and at least two of the electronic components constitute a circuit unit

Claims (9)

一種具共平面結構之電路單元的製造方法,包括:在一基板之上形成包含至少一第一金屬板的一第一圖案化(patterned)金屬層;在各所述第一金屬板覆上一自組裝單分子膜(Self-assembled monolayer,SAM);其中,所述自組裝單分子膜包括具親金屬性的一第一端、具疏金屬性的一第二端與連接於該第一端和該第二端之間的一中間段,且以所述具親金屬性的第一端連接所述第一金屬板;在該基板以及各所述自組裝單分子膜之上形成一金屬層,並將一膠帶貼附在該金屬層之上;沿一方向撕開該膠帶,使該金屬層在該基板上變成一包含至少一第二金屬板的第二圖案化金屬層;除去所有自組裝單分子膜,使得任一所述第一金屬板和與其相鄰的一個所述第二金屬板之間具有一間隙;以及在各所述間隙內形成一介電層,使得所述介電層以及夾置該介電層的一個所述第一金屬板和一個所述第二金屬板共同組成一個電子元件,且至少二個所述電子元件組成一個電路單元。 A method for manufacturing a circuit unit with a coplanar structure comprises: forming a first patterned metal layer including at least one first metal plate on a substrate; covering each of the first metal plates with a self-assembled monolayer (SAM); wherein the self-assembled monolayer comprises a first end with metal affinity, a second end with metal phobic property and a middle section connected between the first end and the second end, and the first end with metal affinity is connected to the first metal plate; forming a metal layer on the substrate and each of the self-assembled monolayers, and attaching a tape on the metal layer; tearing the tape in a direction so that the metal layer is on the substrate; The first metal plate is changed into a second patterned metal layer including at least one second metal plate; all self-assembled monolayers are removed so that there is a gap between any of the first metal plates and one of the second metal plates adjacent thereto; and a dielectric layer is formed in each of the gaps so that the dielectric layer and one of the first metal plates and one of the second metal plates sandwiching the dielectric layer together constitute an electronic component, and at least two of the electronic components constitute a circuit unit. 如請求項1所述之具共平面結構之電路單元的製造方法,其中,所述電子元件為一二極體或一電容。 A method for manufacturing a circuit unit with a coplanar structure as described in claim 1, wherein the electronic component is a diode or a capacitor. 如請求項1所述之具共平面結構之電路單元的製造方法,其中,該第一圖案化金屬層還包括至少一第一金屬墊與至少一第 一金屬線,且該第二圖案化金屬層還包括至少一第二金屬墊與至少一第二金屬線。 The method for manufacturing a circuit unit with a coplanar structure as described in claim 1, wherein the first patterned metal layer further includes at least one first metal pad and at least one first metal line, and the second patterned metal layer further includes at least one second metal pad and at least one second metal line. 如請求項1所述之具共平面結構之電路單元的製造方法,其中,所述第一金屬板和所述第二金屬板係由一金屬材料製成,且該金屬材料包含選自於由金、鉑、鋁、銀、和銅所組成群組之中的至少一種金屬。 The method for manufacturing a circuit unit with a coplanar structure as described in claim 1, wherein the first metal plate and the second metal plate are made of a metal material, and the metal material includes at least one metal selected from the group consisting of gold, platinum, aluminum, silver, and copper. 如請求項1所述之具共平面結構之電路單元的製造方法,其中,所述介電層包含選自於由三氧化二鋁(Al2O3)、二氧化鉿(HfO2)、五氧化二鉭(Ta2O5)、二氧化鋯(ZrO2)、氧化鋅(ZnO)、二氧化鈦(TiO2)、氧化鎂(MgO)、和氮化鈦(TiN)組成群組之中的至少一種介電材料。 A method for manufacturing a circuit unit with a coplanar structure as described in claim 1, wherein the dielectric layer comprises at least one dielectric material selected from the group consisting of aluminum oxide (Al2O3), helium oxide (HfO2), tantalum pentoxide (Ta2O5 ) , zirconium oxide ( ZrO2 ), zinc oxide (ZnO), titanium oxide ( TiO2 ), magnesium oxide (MgO), and titanium nitride (TiN). 如請求項1所述之具共平面結構之電路單元的製造方法,其中,所述自組裝單分子膜具有一分子長度,使得所述間隙的大小和所述分子長度的大小相等。 A method for manufacturing a circuit unit with a coplanar structure as described in claim 1, wherein the self-assembled monolayer has a molecular length, so that the size of the gap is equal to the size of the molecular length. 如請求項1所述之具共平面結構之電路單元的製造方法,其中,除去所有自組裝單分子膜之時,係將該基板置入一紫外光臭氧清洗機之中,並操作該紫外光臭氧清洗機向該基板之上的所述自組裝單分子膜提供紫外光和臭氧,從而利用紫外光和臭氧分解所述自組裝單分子膜,最終自該基板之上將分解的所述自組裝單分子膜去除。 The manufacturing method of the circuit unit with a coplanar structure as described in claim 1, wherein when removing all the self-assembled monolayers, the substrate is placed in a UV-ozone cleaning machine, and the UV-ozone cleaning machine is operated to provide UV light and ozone to the self-assembled monolayers on the substrate, thereby utilizing the UV light and ozone to decompose the self-assembled monolayers, and finally removing the decomposed self-assembled monolayers from the substrate. 如請求項5所述之具共平面結構之電路單元的製造方法,其中,係先將至少一所述介電材料溶於一溶劑之中以獲得一溶 液,而後將該溶液填入所述間隙之中,待所述溶劑蒸發之後即在各間隙內形成所述介電層。 The manufacturing method of the circuit unit with a coplanar structure as described in claim 5, wherein at least one of the dielectric materials is first dissolved in a solvent to obtain a solution, and then the solution is filled into the gaps, and after the solvent evaporates, the dielectric layer is formed in each gap. 如請求項8所述之具共平面結構之電路單元的製造方法,其中,該自組裝單分子膜由選自於十八碳硫醇(Octadecanethiolate,ODT)和十八烷基膦酸(Octadecylphosphonic acid,ODPA)所組成群組之中的一有機材料製成。 A method for manufacturing a circuit unit with a coplanar structure as described in claim 8, wherein the self-assembled monolayer is made of an organic material selected from the group consisting of octadecanethiolate (ODT) and octadecylphosphonic acid (ODPA).
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TW200945213A (en) * 2008-04-29 2009-11-01 Mizuho Technology Corp Antenna of non-contact card or tag and manufacturing method thereof
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Patent Citations (4)

* Cited by examiner, † Cited by third party
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TW200945213A (en) * 2008-04-29 2009-11-01 Mizuho Technology Corp Antenna of non-contact card or tag and manufacturing method thereof
US20120181543A1 (en) * 2010-05-12 2012-07-19 Takashi Ichiryu Flexible semiconductor device and method for producing the same
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CN108538926A (en) * 2017-12-29 2018-09-14 西安电子科技大学 InGaAs bases MOS capacitor in flexible substrate and production method

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