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TWI871595B - X-ray inspection device, x-ray inspection method and x-ray inspection program - Google Patents

X-ray inspection device, x-ray inspection method and x-ray inspection program Download PDF

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TWI871595B
TWI871595B TW112109763A TW112109763A TWI871595B TW I871595 B TWI871595 B TW I871595B TW 112109763 A TW112109763 A TW 112109763A TW 112109763 A TW112109763 A TW 112109763A TW I871595 B TWI871595 B TW I871595B
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ray
brightness
image
slice
substrate
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TW202346850A (en
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野口健二
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日商泰可諾智能股份有限公司
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    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/046Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using tomography, e.g. computed tomography [CT]

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Abstract

The present invention provides a technique for easily distinguishing a conductor portion that is an inspection target and an insulating portion other than the conductor portion in a substrate.
The X-ray inspection device of the present invention has an X-ray image obtaining part, a reconstruction calculation part, a sliced image obtaining part, a classification part, and a contrast enhancement part. The X-ray image obtaining part is to obtain a plurality of X-ray images captured by irradiating the substrate with X-rays at an angle oblique to a predetermined direction; the reconstruction calculation part is to perform reconstruction calculations according to the X-ray images to obtain reconstruction information; the sliced image obtaining part is to obtain a sliced image of the substrate in the predetermined first direction according to the reconstruction information; the classification part is to classify the sliced image into a conductor part and an insulation part; the contrast enhancement part is to enhance the contrast between the conductor part and the insulation part.

Description

X射線檢查裝置、X射線檢查方法及X射線檢查程式 X-ray inspection device, X-ray inspection method and X-ray inspection program

本發明係關於X射線檢查裝置、X射線檢查方法及X射線檢查程式。 The present invention relates to an X-ray inspection device, an X-ray inspection method and an X-ray inspection program.

習知已知有從不同方向利用X射線拍攝基板,再依據所拍攝的影像生成重建資訊(reconstruction information),根據貫穿孔中填充的電鍍等三維構造施行檢查的X檢查裝置(例如參照專利文獻1)。 It is known that there is an X-ray inspection device that uses X-rays to photograph a substrate from different directions, generates reconstruction information based on the photographed images, and performs inspection based on three-dimensional structures such as electroplating filled in the through-holes (for example, refer to Patent Document 1).

[先行技術文獻] [Prior technical literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利第6946516號公報 [Patent document 1] Japanese Patent No. 6946516

根據從不同方向利用X射線所拍攝到基板的複數影像,生成重建資訊的技術,會因各種原因生成偽影(artifact)。若生成偽影,會導致影像不清晰,導致頗難進行基板檢查對象的導體部檢查。 The technology that generates reconstructed information based on multiple images of the substrate taken from different directions using X-rays may generate artifacts for various reasons. If artifacts are generated, the image will be unclear, making it difficult to inspect the conductor part of the substrate.

本發明係有鑑於上述課題而完成,目的在於提供:可輕易區分基板中屬於檢查對象的導體部與導體部以外的絕緣部之技術。 This invention was completed in view of the above-mentioned problem, and its purpose is to provide a technology that can easily distinguish the conductive part of the substrate that is the inspection object from the insulating part other than the conductive part.

為達成上述目的,X射線檢查裝置係具備有:X射線影像取得部、重建演算部、切片影像取得部、分類部及對比強調部;而,該X射線影像取得部係取得將X射線依傾斜於既定方向的角度照射基板,所拍攝到的複數X射線影像;該重建演算部係根據 該些X射線影像執行重建演算而取得重建資訊;該切片影像取得部係根據該重建資訊,取得在預設第一方向上切斷該基板的切片影像;該分類部係將該切片影像分類為導體部與絕緣部;該對比強調部係強調該導體部與該絕緣部的對比。 To achieve the above-mentioned purpose, the X-ray inspection device is provided with: an X-ray image acquisition unit, a reconstruction calculation unit, a slice image acquisition unit, a classification unit and a contrast and emphasis unit; the X-ray image acquisition unit acquires a plurality of X-ray images taken by irradiating a substrate with X-rays at an angle inclined to a predetermined direction; the reconstruction calculation unit performs reconstruction calculations based on the X-ray images to acquire reconstruction information; the slice image acquisition unit acquires a slice image of the substrate cut in a preset first direction based on the reconstruction information; the classification unit classifies the slice image into a conductive part and an insulating part; and the contrast and emphasis unit emphasizes the contrast between the conductive part and the insulating part.

以上所說明構成,雖從該些X射線影像取得重建資訊,但該重建資訊會受偽影影響。因此,檢查對象部分中若偽影的影響較大,便較難區分構成基板的導體部與絕緣部,導致較難執行檢查。然而,在X射線檢查裝置中,根據重建資訊取得切片影像,藉由對切片影像進行解析,而將切片影像中所含的影像分類為導體部與絕緣部。然後,強調導體部與絕緣部的對比。結果,重建資訊可輕易區分出導體部與絕緣部。 The above-described structure obtains reconstruction information from the X-ray images, but the reconstruction information is affected by artifacts. Therefore, if the artifacts have a greater impact on the inspection object, it is more difficult to distinguish the conductor part and the insulating part that constitute the substrate, making it more difficult to perform the inspection. However, in the X-ray inspection device, a slice image is obtained based on the reconstruction information, and the slice image is analyzed to classify the image contained in the slice image into the conductor part and the insulating part. Then, the contrast between the conductor part and the insulating part is emphasized. As a result, the reconstruction information can easily distinguish the conductor part from the insulating part.

10:X射線攝像機構部 10: X-ray imaging device

11:X射線產生器 11: X-ray generator

11a:X射線輸出部 11a: X-ray output unit

12:X射線檢測器 12: X-ray detector

12a:檢測面 12a: Detection surface

20:控制部 20: Control Department

21:產生器控制部 21: Generator control unit

22:檢測器控制部 22: Detector control unit

23:定位機構控制部 23: Positioning mechanism control unit

24:輸入部 24: Input section

25:輸出部 25: Output section

26:記憶體 26: Memory

26a:程式數據 26a: Program data

26b:X射線影像數據 26b: X-ray image data

27:CPU 27:CPU

27a:X射線影像取得部 27a: X-ray image acquisition unit

27b:重建演算部 27b: Reconstruction calculation department

27c:切片影像取得部 27c: Slice image acquisition unit

27d:分類部 27d: Classification Department

27e:對比強調部 27e: Contrast emphasis section

27f:顯示控制部 27f: Display control unit

Ar,A:箭頭 Ar,A:arrow

Ax:旋轉軸 Ax: Rotation axis

D1:第一方向 D1: First direction

D2:第二方向 D2: Second direction

Nv:法線 Nv:Normal

Pt,Vi:元件符號 Pt,Vi: Component symbol

Rg1,Rg2:圓環 Rg1,Rg2: Ring

S100~S150,S200~S255:步驟 S100~S150,S200~S255: Steps

Tr1,Tr2:二點鏈線曲線 Tr1, Tr2: two-point chain curve

W:基板 W: Substrate

Z1,Z2:部分 Z1, Z2: Partial

Zo:導體部的統計範圍 Zo: Statistical scope of the conductor department

Zu:絕緣部的統計範圍 Zu: Statistical range of the insulated area

α:傾斜角 α: Tilt angle

〔圖1〕係X射線檢查裝置的概略方塊圖。 [Figure 1] is a schematic block diagram of an X-ray inspection device.

〔圖2〕中,〔圖2A〕係基板、X射線檢測器及X射線產生器的關係說明圖;〔圖2B〕、〔圖2C〕係由修正前重建資訊所獲得切片影像例圖;〔圖2D〕、〔圖2E〕係由修正後重建資訊所獲得切片影像例圖。 In [Figure 2], [Figure 2A] is a diagram illustrating the relationship between the substrate, X-ray detector, and X-ray generator; [Figure 2B] and [Figure 2C] are examples of slice images obtained from the reconstructed information before correction; [Figure 2D] and [Figure 2E] are examples of slice images obtained from the reconstructed information after correction.

〔圖3〕中,〔圖3A〕係X射線檢查處理的流程圖;〔圖3B〕係導體部與絕緣部的分類處理流程圖。 In [Figure 3], [Figure 3A] is a flowchart of X-ray inspection processing; [Figure 3B] is a flowchart of classification processing of the conductor part and the insulation part.

〔圖4〕中,〔圖4A〕~〔圖4F〕係根據切片影像進行影像處理的過程圖。 In [Figure 4], [Figure 4A] ~ [Figure 4F] are process diagrams of image processing based on slice images.

〔圖5〕中,〔圖5A〕係每個區域編號的亮度統計值與分類結果圖;〔圖5B〕係分類結果對應關聯於切片影像的圖;〔圖5C〕係修正後的切片影像圖;〔圖5D〕係過衝與下衝的說明圖。 In [Figure 5], [Figure 5A] is a graph showing the brightness statistics and classification results of each region number; [Figure 5B] is a graph showing the classification results corresponding to the slice image; [Figure 5C] is a graph showing the corrected slice image; and [Figure 5D] is a graph showing overshoot and undershoot.

〔圖6〕係過衝與下衝的說明圖。 [Figure 6] is an illustration of overshoot and undershoot.

此處,依照下述順序針對本發明實施例進行說明。 Here, the embodiments of the present invention are described in the following order.

(1)X射線檢查裝置之構成: (1) Composition of X-ray inspection device:

(2)X射線檢查處理: (2) X-ray examination and processing:

(3)其他實施例: (3) Other embodiments:

(1)X射線檢查裝置之構成: (1) Composition of X-ray inspection device:

圖1所示係本發明一實施例的X射線檢查裝置概略方塊圖。X射線檢查裝置係具備有:X射線攝像機構部10與控制部20。X射線攝像機構部10係具備有:X射線產生器11與X射線檢測器12。X射線攝像機構部10係在基板W、X射線產生器11及X射線檢測器12呈既定的相對位置關係狀態下,從X射線產生器11朝基板W照射X射線。 FIG1 is a schematic block diagram of an X-ray inspection device of an embodiment of the present invention. The X-ray inspection device comprises: an X-ray imaging mechanism 10 and a control unit 20. The X-ray imaging mechanism 10 comprises: an X-ray generator 11 and an X-ray detector 12. The X-ray imaging mechanism 10 irradiates X-rays from the X-ray generator 11 toward the substrate W when the substrate W, the X-ray generator 11 and the X-ray detector 12 are in a predetermined relative position relationship.

X射線產生器11係具備有輸出X射線的X射線輸出部11a,可從X射線輸出部11a依既定強度將X射線照射於基板W。X射線檢測器12係具備有檢測面12a,可檢測到達檢測面12a的X射線強度。X射線檢測器12係可根據在檢測面12a所檢測到的X射線強度,拍攝反映穿透基板W的X射線穿透量之X射線影像。即,X射線檢測器12係生成表示檢測面12a各位置處之X射線穿透量影像的X射線影像數據26b。 The X-ray generator 11 has an X-ray output unit 11a for outputting X-rays, and can irradiate the substrate W with X-rays at a predetermined intensity from the X-ray output unit 11a. The X-ray detector 12 has a detection surface 12a, and can detect the X-ray intensity reaching the detection surface 12a. The X-ray detector 12 can take an X-ray image reflecting the X-ray penetration amount penetrating the substrate W based on the X-ray intensity detected on the detection surface 12a. That is, the X-ray detector 12 generates X-ray image data 26b representing the X-ray penetration amount image at each position of the detection surface 12a.

本實施例的基板W係具有複數層的疊層基板。基板W係雙面較大於另一面的立方體(即,板狀形狀)。各層係朝基板W最寬雙面的垂直方向積層。在各層中,於基板W最寬面的平行面內利用導體形成佈線圖案。各層的佈線圖案間利用經填充電鍍的貫穿孔進行電氣式耦接。本實施例中,將基板W中所形成的佈線圖案、填充電鍍等導體稱為「導體部」,並將導體部以外的部分稱為「絕緣部」。另外,本實施例中,貫穿孔直徑係30μm程度,但貫穿孔的大小、層間距離以及基板W大小等並無限定。 The substrate W of this embodiment is a stacked substrate with multiple layers. The substrate W is a cube with two sides larger than the other side (i.e., a plate-like shape). Each layer is stacked in the perpendicular direction of the widest two sides of the substrate W. In each layer, a wiring pattern is formed by a conductor in a parallel plane to the widest surface of the substrate W. The wiring patterns of each layer are electrically coupled by through holes that are filled with electroplating. In this embodiment, the wiring pattern, the conductors such as the filling electroplating formed in the substrate W are called "conductor parts", and the part other than the conductor parts are called "insulating parts". In addition, in this embodiment, the diameter of the through hole is about 30μm, but the size of the through hole, the distance between layers, and the size of the substrate W are not limited.

本實施例中,貫穿孔大小與其周邊的導體部係屬於檢查對象,當然檢查對象並無限定,焊料等亦可為檢查對象。基板W係利用未圖示搬送機構被沿既定平面進行搬送。即,未檢查基板W被沿既定平面搬入並配置於X射線的照射範圍,經檢查後再度利用搬送機構搬出。本實施例中,具備有使X射線產生器11、X射線檢測器12及基板W的相對位置關係變化之未圖示定位機構。本實施例中,定位機構係可使基板W在由X射線產生器11所射出X 射線的照射範圍內,沿既定平面(稱「X-Y平面」)進行二維式移動。又,定位機構係可使X射線檢測器12以既定旋轉軸為中心進行旋轉。 In this embodiment, the size of the through hole and the conductor part around it are the inspection objects, but of course the inspection objects are not limited, and solder etc. can also be the inspection objects. The substrate W is transported along a predetermined plane by a transport mechanism not shown in the figure. That is, the uninspected substrate W is transported along a predetermined plane and arranged in the irradiation range of the X-ray, and is transported out again by the transport mechanism after inspection. In this embodiment, there is an unillustrated positioning mechanism that changes the relative position relationship between the X-ray generator 11, the X-ray detector 12 and the substrate W. In this embodiment, the positioning mechanism can move the substrate W two-dimensionally along a predetermined plane (called "X-Y plane") within the irradiation range of the X-ray emitted by the X-ray generator 11. In addition, the positioning mechanism can rotate the X-ray detector 12 around a predetermined rotation axis.

圖2A所示係X射線照射於基板W的樣子示意圖。圖2A中,橫向係X-Y平面的平行方向,上下方向係垂直於X-Y平面的Z方向。圖2A示意圖示在基板W與其周圍所存在X射線產生器11及X射線檢測器12。省略圖示定位機構。 FIG2A is a schematic diagram showing how X-rays are irradiated on a substrate W. In FIG2A , the horizontal direction is parallel to the X-Y plane, and the vertical direction is the Z direction perpendicular to the X-Y plane. FIG2A schematically shows the X-ray generator 11 and the X-ray detector 12 on and around the substrate W. The positioning mechanism is omitted.

本實施例中,X射線產生器11係從X射線輸出部11a朝既定範圍輸出X射線。X射線檢測器12的檢測面12a係以既定旋轉軸Ax為中心進行旋轉。本實施例中,旋轉軸Ax係平行於Z方向,通過X射線輸出部11a的直線。另外,圖2A中,旋轉軸Ax係依單點鏈線表示。X射線檢測器12的檢測面12a中心之法線Nv係相對於旋轉軸Ax僅傾斜傾斜角α。X射線檢測器12的檢測面12a係一邊維持朝向X射線輸出部11a的狀態(即,一邊維持法線Nv傾斜於旋轉軸Ax的傾斜角為α狀態),一邊以旋轉軸Ax為中心進行旋轉。另外,圖2A中,法線Nv係依虛線表示,X射線檢測器12進行旋轉時的軌跡係依二點鏈線曲線Tr1表示。 In this embodiment, the X-ray generator 11 outputs X-rays from the X-ray output portion 11a toward a predetermined range. The detection surface 12a of the X-ray detector 12 rotates around a predetermined rotation axis Ax. In this embodiment, the rotation axis Ax is a straight line parallel to the Z direction and passing through the X-ray output portion 11a. In addition, in FIG. 2A , the rotation axis Ax is represented by a single-point chain. The normal Nv of the center of the detection surface 12a of the X-ray detector 12 is tilted by an angle α relative to the rotation axis Ax. The detection surface 12a of the X-ray detector 12 rotates around the rotation axis Ax while maintaining a state of facing the X-ray output unit 11a (i.e., maintaining a state where the normal line Nv is inclined at an angle α to the rotation axis Ax). In addition, in FIG. 2A , the normal line Nv is represented by a dotted line, and the trajectory of the X-ray detector 12 when rotating is represented by a two-point chain curve Tr1.

本實施例中,定位機構係使基板W的位置在X-Y平面內依成為圓周狀軌道方式移動。即,利用X射線檢測器12的旋轉,使由X射線檢測器12進行的拍攝範圍變化,因而定位機構亦與X射線檢測器12的旋轉,同步地使基板W位置移動。例如依基板W特定位置的影像係在X射線檢測器12的檢測面12a特定位置拍攝方式,使基板W進行移動。圖2A中,X-Y平面的基板W軌跡係依二點鏈線曲線Tr2表示。 In this embodiment, the positioning mechanism moves the position of the substrate W in a circular orbit in the X-Y plane. That is, the X-ray detector 12 rotates to change the shooting range of the X-ray detector 12, so the positioning mechanism also moves the position of the substrate W synchronously with the rotation of the X-ray detector 12. For example, the image of a specific position of the substrate W is shot at a specific position of the detection surface 12a of the X-ray detector 12, so that the substrate W moves. In Figure 2A, the trajectory of the substrate W in the X-Y plane is represented by a two-point chain curve Tr2.

另外,定位機構係只要依能從不同方向拍攝基板W的方式,使基板W、X射線輸出部11a及檢測面12a的相對位置關係產生變動即可。因此,只要藉由以旋轉軸Ax為中心,使X射線檢測器12、X射線產生器11及基板W中之至少一個進行旋轉,即可從不同方向拍攝基板W。為達此項功能的構成,並不僅侷限於圖2A所示構成。例如亦可使基板W的位置呈固定,並使X射線產生器11 與X射線檢測器12在同軸上朝相反方向旋轉。又,亦可使X射線產生器11與X射線檢測器12呈固定,並使基板W在X射線檢測器12的視野內進行旋轉。 In addition, the positioning mechanism can change the relative position relationship between the substrate W, the X-ray output unit 11a, and the detection surface 12a in a manner that the substrate W can be photographed from different directions. Therefore, by rotating at least one of the X-ray detector 12, the X-ray generator 11, and the substrate W around the rotation axis Ax, the substrate W can be photographed from different directions. The structure to achieve this function is not limited to the structure shown in Figure 2A. For example, the position of the substrate W can be fixed, and the X-ray generator 11 and the X-ray detector 12 can be rotated in opposite directions on the same axis. In addition, the X-ray generator 11 and the X-ray detector 12 can be fixed, and the substrate W can be rotated within the field of view of the X-ray detector 12.

其次,針對控制部20進行說明。控制部20係具備有:產生器控制部21、檢測器控制部22、定位機構控制部23、輸入部24、輸出部25、記憶體26及CPU27。記憶體26係可記憶數據的記憶媒體,記憶著程式數據26a與X射線影像數據26b。CPU27係讀取並執行程式數據26a以執行用於後述各種處理的演算。另外,記憶體26係只要能記憶數據即可,可採用例如:RAM、EEPROM、HDD等各種記憶媒體。 Next, the control unit 20 is explained. The control unit 20 includes: a generator control unit 21, a detector control unit 22, a positioning mechanism control unit 23, an input unit 24, an output unit 25, a memory 26, and a CPU 27. The memory 26 is a storage medium that can store data, and stores program data 26a and X-ray image data 26b. The CPU 27 reads and executes the program data 26a to perform calculations for various processing described later. In addition, the memory 26 can be any storage medium as long as it can store data, such as RAM, EEPROM, HDD, etc.

定位機構控制部23係對圖未示出的定位機構進行控制,調整基板W與X射線檢測器12的位置,以使基板W位於圖2A所示的拍攝位置。產生器控制部21係對X射線產生器11進行控制,從X射線產生器11朝基板W照射X射線。檢測器控制部22係取得由X射線檢測器12所檢測到的X射線強度(即表示穿透量影像的X射線影像數據26b)。X射線影像數據26b係由複數像素的色階值所構成影像數據,各像素的色階值係表示由X射線檢測器12所檢測到X射線的強度。檢測器控制部22係從X射線檢測器12取得X射線影像數據26b,並記憶於記憶體26中。輸出部25係顯示出基板W檢查結果等的顯示器。輸入部24係受理使用者輸入的操作輸入機器。 The positioning mechanism control unit 23 controls the positioning mechanism not shown in the figure to adjust the positions of the substrate W and the X-ray detector 12 so that the substrate W is located at the shooting position shown in FIG. 2A. The generator control unit 21 controls the X-ray generator 11 to irradiate X-rays from the X-ray generator 11 toward the substrate W. The detector control unit 22 obtains the X-ray intensity detected by the X-ray detector 12 (i.e., the X-ray image data 26b representing the penetration image). The X-ray image data 26b is image data composed of the color gradation values of a plurality of pixels, and the color gradation value of each pixel represents the intensity of the X-ray detected by the X-ray detector 12. The detector control unit 22 obtains the X-ray image data 26b from the X-ray detector 12 and stores it in the memory 26. The output unit 25 is a display that displays the inspection results of the substrate W, etc. The input unit 24 is an operation input device that accepts user input.

CPU27係為執行基板W的檢查,而執行程式數據26a所表示的程式。若執行程式,CPU27便具有X射線影像取得部27a、重建演算部27b、切片影像取得部27c、分類部27d、對比強調部27e及顯示控制部27f的機能。 CPU 27 executes the program represented by program data 26a to perform inspection of substrate W. When executing the program, CPU 27 has the functions of X-ray image acquisition unit 27a, reconstruction calculation unit 27b, slice image acquisition unit 27c, classification unit 27d, contrast emphasis unit 27e and display control unit 27f.

X射線影像取得部27a係使CPU27執行:取得依傾斜於Z軸方向的角度朝基板W照射X射線,所拍攝複數X射線影像的機能。即,CPU27係利用X射線影像取得部27a的處理,對產生器控制部21、檢測器控制部22及定位機構控制部23輸出既定指示,在圍繞旋轉軸Ax的不同旋轉角複數旋轉位置處拍攝基板W,取得表示X射線影像的X射線影像數據26b。 The X-ray image acquisition unit 27a enables the CPU 27 to execute the function of acquiring multiple X-ray images taken by irradiating the substrate W with X-rays at an angle inclined to the Z-axis direction. That is, the CPU 27 uses the processing of the X-ray image acquisition unit 27a to output predetermined instructions to the generator control unit 21, the detector control unit 22, and the positioning mechanism control unit 23, and photographs the substrate W at multiple rotation positions with different rotation angles around the rotation axis Ax to acquire X-ray image data 26b representing the X-ray image.

重建演算部27b係根據複數X射線影像使CPU27執行重建演算處理的機能。即,CPU27係利用重建演算部27b的處理,根據X射線影像數據26b執行重建演算。重建演算係可採用公知各種演算法,本實施例係採用含濾波反投影法(filtered Back Projection Method)的重建演算。若執行重建演算,便成在由X、Y、Z軸構成的三維空間內,所取得相關基板W的重建資訊狀態(即,形成針對基板W在三維空間內依每個座標取得X射線穿透量對應值的狀態)。依此生成的重建資訊係依三維空間內的每個座標,表示基板W在各場所對應於X射線穿透量的色階值,根據該色階值便可解析基板W的三維構造。例如若將重建資訊在沿特定平面切剖截面的各位置處穿透量依二維顯示時,則可解析基板W在該截面的構造。因此,若依任意截面施行解析,便可解析基板W的三維構造。本實施例中,表示重建資訊在每個位置處的穿透量係依8位元表現。即,每個位置的穿透量係依256色階表現。又,本實施例中,依穿透量越小則色階值越大的方式定義色階值。因此,在將色階值視為亮度的影像中,亮度越大,則表示由在各像素位置處所存在物質造成的X射線穿透量越小,又,亮度越小,則表示由在各像素位置處所存物質造成的X射線穿透量越大。因此,導體部的影像變亮,而絕緣部的影像變暗。另外,以下將表示任意方向截面每個位置處的穿透量資訊,稱為「切片影像」。 The reconstruction calculation unit 27b is a function for causing the CPU 27 to perform reconstruction calculation processing based on a plurality of X-ray images. That is, the CPU 27 uses the processing of the reconstruction calculation unit 27b to perform reconstruction calculation based on the X-ray image data 26b. The reconstruction calculation can adopt various known algorithms. In this embodiment, a reconstruction calculation including a filtered back projection method is adopted. If the reconstruction calculation is executed, the state of reconstruction information of the substrate W is obtained in the three-dimensional space formed by the X, Y, and Z axes (that is, the state of obtaining the corresponding value of the X-ray penetration amount for each coordinate in the three-dimensional space for the substrate W is formed). The reconstruction information thus generated represents the color scale value corresponding to the X-ray penetration of the substrate W at each location according to each coordinate in the three-dimensional space, and the three-dimensional structure of the substrate W can be analyzed based on the color scale value. For example, if the penetration of the reconstruction information at each position along a specific plane is displayed in two dimensions, the structure of the substrate W at the section can be analyzed. Therefore, if the analysis is performed on an arbitrary section, the three-dimensional structure of the substrate W can be analyzed. In this embodiment, the penetration of the reconstruction information at each position is expressed in 8 bits. That is, the penetration at each position is expressed in 256 color scales. In addition, in this embodiment, the color scale value is defined in such a way that the smaller the penetration, the larger the color scale value. Therefore, in an image that regards color values as brightness, the greater the brightness, the smaller the X-ray penetration caused by the material at each pixel position, and the smaller the brightness, the greater the X-ray penetration caused by the material at each pixel position. Therefore, the image of the conductor becomes brighter, while the image of the insulating part becomes darker. In addition, the penetration information at each position of the cross section in any direction will be called "slice image" below.

如上所述,根據重建資訊所獲得的切片影像,大多會因偽影的影響導致呈不清晰,特別針對如貫穿孔之類較小的檢查對象進行檢查時會有較為困難的情況。圖2B所示係由重建資訊所獲得切片影像例。該切片影像係將貫穿孔朝Z方向的平行方向切斷之截面影像。該切片影像中,深灰階係表示絕緣部,淡灰階係表示貫穿孔內的電鍍與佈線圖案。但是,該切片影像受偽影的影響導致呈不清晰,導致電鍍、佈線圖案等導體部與絕緣部不易明確區分。因此,本實施例中,藉由CPU27的分類部27d與對比強調部27e機能,修正重建資訊,便可輕易區分導體部與絕緣部。 As mentioned above, the slice images obtained based on the reconstruction information are mostly unclear due to the influence of artifacts, which is particularly difficult when inspecting smaller inspection objects such as through-holes. Figure 2B shows an example of a slice image obtained from the reconstruction information. The slice image is a cross-sectional image of the through-hole cut in a direction parallel to the Z direction. In the slice image, the dark gray level represents the insulating part, and the light gray level represents the electroplating and wiring pattern in the through-hole. However, the slice image is unclear due to the influence of artifacts, making it difficult to clearly distinguish between the conductive parts such as the electroplating and wiring patterns and the insulating parts. Therefore, in this embodiment, by using the functions of the classification unit 27d and the contrast and emphasis unit 27e of the CPU 27 to correct and reconstruct information, the conductive part and the insulating part can be easily distinguished.

切片影像取得部27c係具有:根據重建資訊,取得朝 預設第一方向切斷基板之切片影像的機能。本實施例中,第一方向係X-Y平面的平行方向。圖2A中例示第一方向D1。本實施例中,基板W係在X-Y平面上形成平行複數層的疊層基板,Z方向為層的積層方向。因此,第一方向係基板W的複數層積層方向之垂直方向。本實施例中,在X-Y平面的平行各層之面上,利用導體形成佈線圖案。因此,第一方向係有形成佈線圖案之面的平行方向。又,本實施例中,貫穿孔係朝層的積層方向之平行方向延伸。因此,第一方向係貫穿孔延伸方向的垂直方向。 The slice image acquisition unit 27c has the function of obtaining a slice image of a substrate cut in a preset first direction according to reconstruction information. In this embodiment, the first direction is a direction parallel to the X-Y plane. The first direction D1 is illustrated in FIG2A. In this embodiment, the substrate W is a stacked substrate formed with a plurality of parallel layers on the X-Y plane, and the Z direction is the stacking direction of the layers. Therefore, the first direction is a direction perpendicular to the stacking direction of the plurality of layers of the substrate W. In this embodiment, a wiring pattern is formed on the surface of each parallel layer in the X-Y plane using a conductor. Therefore, the first direction is a direction parallel to the surface on which the wiring pattern is formed. In addition, in this embodiment, the through hole extends in a direction parallel to the stacking direction of the layer. Therefore, the first direction is a direction perpendicular to the extension direction of the through hole.

再者,本實施例中,X-Y平面係垂直於旋轉軸Ax與Z方向,第一方向係旋轉軸Ax的垂直方向。本實施例中,CPU27係根據重建資訊,取得在平行於第一方向的切斷位置處依複數剖面切斷時的切片影像,詳細容後述。圖2C所示係切片影像一例,特別圖示貫穿孔周邊。 Furthermore, in this embodiment, the X-Y plane is perpendicular to the rotation axis Ax and the Z direction, and the first direction is the perpendicular direction of the rotation axis Ax. In this embodiment, CPU27 obtains slice images when cutting according to multiple sections at the cutting position parallel to the first direction based on the reconstruction information, and the details are described later. FIG. 2C shows an example of a slice image, and particularly illustrates the periphery of the through hole.

因為重建資訊受偽影的影響,因而切片影像呈不清晰。例如圖2C中,貫穿孔影像係依元件符號Vi表示的淡灰階圓形,在其周圍存在有少許的深灰階圓環Rg1,更在其周圍存在有深灰階圓環Rg2。圖2C所示切片影像中,在貫穿孔影像周圍所存在的圓環Rg1實際係絕緣部,但由該切片影像看起來好似導體部。因此,從受偽影影響的切片影像,頗難依目視判斷到底何者是導體部、絕緣部。 Because the reconstructed information is affected by the artifacts, the slice image is not clear. For example, in Figure 2C, the through hole image is a light gray circle represented by the element symbol Vi, and there are a few dark gray rings Rg1 around it, and there are dark gray rings Rg2 around it. In the slice image shown in Figure 2C, the ring Rg1 around the through hole image is actually an insulating part, but it looks like a conductive part from the slice image. Therefore, it is difficult to visually judge which is the conductive part and which is the insulating part from the slice image affected by the artifacts.

此處,本實施例中,CPU27係根據切片影像分類為導體部與絕緣部,並強調對比。分類部27d係具有將切片影像分類為導體部與絕緣部的機能。本實施例中,CPU27係藉由非朝第二方向D2而是朝第一方向切斷的切片影像進行解析,而分類為導體部與絕緣部。本實施例中,由重建資訊朝第一方向切斷獲得的切片影像,相較於朝垂直於第一方向的第二方向切斷獲得的切片影像之下,前者的影像處理較為容易。例如若將圖2B與圖2C進行比較,朝第二方向(Z方向)切斷的截面圖2B,得知基板W為多層基板,反映積層薄層,在狹窄範圍內存在複數層佈線圖案。另外,圖2B中,佈線圖案影像之一係依元件符號Pt表示。 Here, in this embodiment, CPU27 classifies the slice image into the conductive part and the insulating part and emphasizes the contrast. Classification unit 27d has the function of classifying the slice image into the conductive part and the insulating part. In this embodiment, CPU27 classifies the slice image into the conductive part and the insulating part by analyzing the slice image that is not cut in the second direction D2 but in the first direction. In this embodiment, the slice image obtained by cutting in the first direction based on the reconstruction information is easier to process than the slice image obtained by cutting in the second direction perpendicular to the first direction. For example, if Figure 2B is compared with Figure 2C, the cross-sectional view of Figure 2B cut in the second direction (Z direction) shows that the substrate W is a multi-layer substrate, reflecting the stacking of thin layers, and there are multiple layers of wiring patterns in a narrow range. In addition, in Figure 2B, one of the wiring pattern images is represented by the component symbol Pt.

另一方面,朝第一方向(X-Y平面方向)切斷的截面圖2C中,貫穿孔的周圍構造係較圖2B單純。此處,本實施例中,CPU27為了能從切片影像中擷取導體部與絕緣部的處理容易,便根據朝第一方向切斷的切片影像施行分類。另外,圖2C中,貫穿孔的影像係依元件符號Vi表示。 On the other hand, in the cross-sectional view 2C cut in the first direction (X-Y plane direction), the surrounding structure of the through hole is simpler than that of FIG. 2B. Here, in this embodiment, in order to facilitate the processing of extracting the conductor part and the insulating part from the slice image, CPU27 performs classification according to the slice image cut in the first direction. In addition, in FIG. 2C, the image of the through hole is represented by the element symbol Vi.

詳細容後述,CPU27係利用分類部27d的機能,根據切片影像的亮度值,分辨切片影像中所含的導體部與絕緣部,並對各像素分別就何者是導體部、何者是絕緣部賦予對應關聯。 As will be described in detail later, CPU 27 utilizes the function of the classification unit 27d to distinguish the conductive part and the insulating part contained in the slice image according to the brightness value of the slice image, and assigns a corresponding association to each pixel as to which is the conductive part and which is the insulating part.

對比強調部27e係具有強調導體部與絕緣部之對比的機能。本實施例中,CPU27係利用對比強調部27e的機能,藉由維持導體部的亮度、且降低絕緣部的亮度而強調對比。即,因為利用分類部27d,切片影像的各像素被特定為何者是導體部、何者是絕緣部,因而CPU27便根據分類結果降低絕緣部的亮度。圖2D所示係針對圖2C施行對比強調的狀態。若施行對比強調,便如圖2D所示,降低絕緣部的亮度,使在絕緣部存在的偽影呈幾乎不會被視認到的狀態。另一方面,因為導體部維持亮度,因而導體部的存在被強調。根據以上的構成,便可明確區分導體部與絕緣部。 The contrast emphasis section 27e has the function of emphasizing the contrast between the conductor part and the insulating part. In this embodiment, the CPU 27 uses the function of the contrast emphasis section 27e to emphasize the contrast by maintaining the brightness of the conductor part and reducing the brightness of the insulating part. That is, because each pixel of the slice image is specified as a conductor part and an insulating part by using the classification section 27d, the CPU 27 reduces the brightness of the insulating part according to the classification result. FIG. 2D shows the state in which contrast emphasis is performed on FIG. 2C. If contrast emphasis is performed, as shown in FIG. 2D, the brightness of the insulating part is reduced, so that the false shadow existing in the insulating part is almost not visible. On the other hand, because the conductor part maintains its brightness, the existence of the conductor part is emphasized. Based on the above structure, the conductor part and the insulating part can be clearly distinguished.

以上的分類與對比強調係針對複數切片影像實施。此項結果係在表示基板W三維構造的重建資訊中強調對比,便可明確區分導體部與絕緣部。因此,當根據經施行對比強調修正的重建資訊,生成任意切片影像時,便可輕易區分導體部與絕緣部。 The above classification and contrast emphasis are implemented for multiple slice images. The result is that by emphasizing the contrast in the reconstruction information representing the three-dimensional structure of the substrate W, the conductor part and the insulating part can be clearly distinguished. Therefore, when an arbitrary slice image is generated based on the reconstruction information corrected by contrast emphasis, the conductor part and the insulating part can be easily distinguished.

本實施例中,因為根據修正後的重建資施行顯示,因而CPU27發揮顯示控制部27f的機能。顯示控制部27f係根據經施行對比強調後的重建資訊,取得朝垂直於第一方向的第二方向切斷基板W之解析對象影像,並使解析對象影像顯示於顯示部的機能。即,CPU27係根據修正後的重建資訊,針對朝第二方向切斷基板W的剖面上,取得各位置處的色階值並生成切片影像,控制輸出部25顯示該切片影像。 In this embodiment, because the display is performed based on the corrected reconstruction information, the CPU 27 performs the function of the display control unit 27f. The display control unit 27f obtains the analysis target image of the substrate W cut in the second direction perpendicular to the first direction based on the reconstruction information after contrast emphasis, and displays the analysis target image on the display unit. That is, the CPU 27 obtains the color level value at each position on the cross section of the substrate W cut in the second direction based on the corrected reconstruction information and generates a slice image, and controls the output unit 25 to display the slice image.

圖2E所示係針對圖2B所示例施行對比強調時的例子。如圖2E所示,經對比強調後的切片影像中,絕緣部的亮度降 低。因此,絕緣部中所含的偽影不易被視認到。又,因為分類出導體部與絕緣部後才施行對比強調,因而導體部與絕緣部的邊界清晰。因此,視認該切片影像的使用者可輕易區分含有貫穿孔、佈線圖案的導體部與絕緣部。 FIG2E shows an example of contrast emphasis applied to the example shown in FIG2B. As shown in FIG2E, in the slice image after contrast emphasis, the brightness of the insulating portion is reduced. Therefore, the false image contained in the insulating portion is not easily visible. In addition, because contrast emphasis is applied after the conductor portion and the insulating portion are classified, the boundary between the conductor portion and the insulating portion is clear. Therefore, the user who views the slice image can easily distinguish between the conductor portion containing the through hole and the wiring pattern and the insulating portion.

(2)X射線檢查處理: (2) X-ray examination and processing:

接著,根據圖3A、圖3B所示流程圖,針對本實施例的X射線檢查裝置所執行X射線檢查處理進行說明。在執行X射線檢查處理之前,藉由CPU27發揮X射線影像取得部27a與重建演算部27b的機能,取得拍攝檢查對象基板W的複數X射線影像,更進一步施行重建演算,取得相關基板W的重建資訊。 Next, the X-ray inspection process performed by the X-ray inspection device of this embodiment is described according to the flowchart shown in FIG. 3A and FIG. 3B. Before performing the X-ray inspection process, the CPU 27 uses the functions of the X-ray image acquisition unit 27a and the reconstruction calculation unit 27b to obtain multiple X-ray images of the inspection target substrate W, and further performs reconstruction calculation to obtain reconstruction information of the substrate W.

若取得重建資訊,CPU27係執行為修正重建資訊的處理。為施行修正,首先由CPU27發揮切片影像取得部27c的機能,而施行前處理(步驟S100)。前處理係供施行後述邊緣擷取的前處理。因此,為能輕易執行邊緣擷取亦可為各種處理。本實施例中,前處理係雜訊減輕處理。為能減輕雜訊的處理係可採用各種處理,例如可採用公知的平滑化處理。 If reconstruction information is obtained, CPU27 performs processing for correcting the reconstruction information. To perform the correction, CPU27 first uses the function of the slice image acquisition unit 27c to perform pre-processing (step S100). Pre-processing is pre-processing for edge capture described later. Therefore, various processing can be performed to easily perform edge capture. In this embodiment, pre-processing is noise reduction processing. Various processing can be used to reduce noise, such as the well-known smoothing processing.

因為平滑化處理係針對二維影像實施,因而CPU27根據重建資訊生成複數切片影像。具體而言,CPU27係參照重建資訊,設定Z方向上不同位置處的複數切斷位置。又,CPU27係在各切斷位置處,取得將沿第一方向設為切斷方向時的切片影像。另外,各切片影像對應關聯於識別資訊。識別資訊係整數,最小值係1,最大值係切片影像的總數。此處,假設依Z方向從負方向朝正方向的數值變大方式,對各切片影像賦予對應關聯識別資訊的例子。切片影像的總數越多,越能輕易施行正確的分類,亦可在不會超過重建資訊解析度極限的數目範圍內適當選擇。圖4A所示係與圖2C同一影像,特別圖示切片影像其中一部分。以下一邊適當參照對圖4A所示切片影像施行的影像處理結果,一邊進行說明。若獲得切片影像,CPU27便對各切片影像施行平滑化處理。 Because the smoothing process is performed on a two-dimensional image, CPU27 generates a plurality of slice images based on the reconstruction information. Specifically, CPU27 sets a plurality of cutting positions at different positions in the Z direction with reference to the reconstruction information. Furthermore, CPU27 obtains a slice image when the first direction is set as the cutting direction at each cutting position. In addition, each slice image corresponds to identification information. The identification information is an integer, the minimum value is 1, and the maximum value is the total number of slice images. Here, it is assumed that each slice image is given corresponding identification information in a manner in which the value increases from the negative direction to the positive direction in the Z direction. The more slice images there are, the easier it is to perform correct classification, and they can also be appropriately selected within a range of numbers that does not exceed the resolution limit of the reconstruction information. FIG. 4A shows the same image as FIG. 2C, and specifically shows a portion of the slice image. The following description will be made with reference to the image processing results of the slice image shown in FIG. 4A. If a slice image is obtained, CPU 27 performs smoothing processing on each slice image.

其次,CPU27利用分類部27d的機能,施行導體部與絕緣部的分類(步驟S110)。圖3B所示係步驟S110所示分類的處理 流程圖。分類處理中,首先由CPU27將切片編號k初始化(步驟S200)。切片編號k係為將由步驟S100所生成切片影像予以特定的變數。本實施例中,切片影像識別資訊的最小值係1,最大值係切片影像總數。因此,步驟S100中,CPU27係將1代入切片編號k而初始化。 Next, CPU27 uses the function of the classification unit 27d to classify the conductor part and the insulating part (step S110). FIG. 3B shows a processing flow chart of the classification shown in step S110. In the classification process, CPU27 first initializes the slice number k (step S200). The slice number k is a variable that specifies the slice image generated by step S100. In this embodiment, the minimum value of the slice image identification information is 1, and the maximum value is the total number of slice images. Therefore, in step S100, CPU27 initializes the slice number k by substituting 1 into it.

其次,CPU27係針對切片編號k的切片影像執行步驟S205~S255的處理。具體而言,CPU27係從切片編號k的切片影像中擷取區域(步驟S205)。區域擷取係為將同一物質的影像在切片影像內設為同一區域的處理。即,因為基板W係由導體部與佈線部構成,因而切片影像的任意像素便為導體部的影像或佈線部的影像。此處,CPU27係將同一物質的影像擷取為同一區域。 Next, CPU27 executes the processing of steps S205 to S255 for the slice image of slice number k. Specifically, CPU27 captures the area from the slice image of slice number k (step S205). Area capture is a process of setting the image of the same substance as the same area in the slice image. That is, because the substrate W is composed of a conductor part and a wiring part, any pixel of the slice image is an image of the conductor part or an image of the wiring part. Here, CPU27 captures the image of the same substance as the same area.

擷取係可利用各種處理實施。本實施例中,CPU27係利用邊緣擷取而從切片影像擷取邊界線,藉由將由該邊界線區隔的部位視為不同區域,而擷取區域。邊界線的擷取處理係可利用公知的處理,例如可利用Sobel濾波器及二值化。即,CPU27係對切片編號k的切片影像,使用Sobel濾波器取得每像素的邊緣強度,將邊緣強度大於既定基準值的像素視為邊界線。本實施例中,CPU27係藉由將屬於邊界線的像素值設為1、將非屬於邊界線的像素值設為0而施行二值化。另外,本實施例中,依邊界線寬度成為1像素的方式設定邊界線。圖4B所示係從圖4A所示切片影像中擷取邊界線,且經二值化後的影像。二值化影像中,值為1的像素依白色表示,值為0的像素依黑色表示(以下亦同)。本實施例中,將經該二值化後的影像稱為「邊界線影像」。另外,隨區域擷取處理,亦可實施各種處理,例如為減輕雜訊的處理、為使邊界線成為既定寬度的處理。 The capture can be implemented using various processing. In this embodiment, CPU27 uses edge capture to capture the boundary from the slice image, and captures the area by treating the parts separated by the boundary as different areas. The capture process of the boundary can utilize known processing, such as Sobel filter and binarization. That is, CPU27 uses Sobel filter to obtain the edge intensity of each pixel for the slice image of slice number k, and regards the pixels whose edge intensity is greater than the predetermined reference value as the boundary. In this embodiment, CPU27 performs binarization by setting the pixel value belonging to the boundary to 1 and the pixel value not belonging to the boundary to 0. In addition, in this embodiment, the boundary is set in such a way that the width of the boundary becomes 1 pixel. FIG. 4B shows an image obtained by extracting the boundary line from the slice image shown in FIG. 4A and binarizing it. In the binarized image, pixels with a value of 1 are represented by white, and pixels with a value of 0 are represented by black (the same applies below). In this embodiment, the image after binarization is referred to as a "boundary line image". In addition, various processing can also be performed along with the region extraction processing, such as processing to reduce noise and processing to make the boundary line a predetermined width.

若獲得邊界線影像,CPU27係施行將由邊界線區隔的一連串像素視為同一區域的處理,將切片影像分割為複數區域。又,CPU27係對經分割後的各區域,對應關聯賦予表示區域的識別資訊。本實施例中,表示區域的識別資訊係1以上的整數。圖4C所示係從圖4A所示例中擷取的區域圖。即,根據圖4A生成圖 4B所示邊界線影像,若擷取區域,便對各區域對應關聯賦予區域的識別資訊。圖4C中,從位於外側的區域起依序對應關聯賦予1,2,3,4識別資訊的例子。圖4C中,依區域的識別資訊越小則灰階越深的方式著色,而圖示各區域。 If a boundary image is obtained, CPU 27 performs processing to regard a series of pixels separated by a boundary as the same region, and divides the slice image into a plurality of regions. In addition, CPU 27 assigns identification information representing the region to each divided region in a corresponding manner. In this embodiment, the identification information representing the region is an integer greater than 1. FIG. 4C shows a region map captured from the example shown in FIG. 4A. That is, the boundary image shown in FIG. 4B is generated based on FIG. 4A, and if a region is captured, identification information of the region is assigned to each region in a corresponding manner. FIG. 4C shows an example in which identification information 1, 2, 3, and 4 are assigned in a corresponding manner in order from the region located on the outside. In Figure 4C, each region is illustrated by coloring it in a manner such that the smaller the identification information of the region, the darker the grayscale.

若擷取區域,則CPU27便將區域編號L初始化(步驟S210)。區域編號L係表示由步驟S205所擷取區域的變數。本實施例中,區域的識別資訊係最小值為1,最大值係在切片影像內所存在區域的總數。因此,CPU27藉由將1代入區域編號L而初始化。 If the region is captured, CPU27 initializes the region number L (step S210). Region number L is a variable representing the region captured by step S205. In this embodiment, the identification information of the region has a minimum value of 1 and a maximum value of the total number of regions in the slice image. Therefore, CPU27 initializes by substituting 1 into region number L.

其次,CPU27便針對區域編號L的區域取得統計範圍(步驟S215)。統計範圍係為收集每區域之亮度統計值的範圍。即,本實施例中,針對由步驟S205所擷取的各區域,取得亮度的統計值,視為代表區域的亮度值。統計值係只要代表區域的亮度值即可,可採用例如平均數、眾數、中位數等各種值。CPU27係在取得該統計值時,未將區域全域設為統計取得對象,而是將其中一部分除外再取得統計。此處,依此將其中一部分除外的剩餘區域,稱為「統計範圍」。 Next, CPU27 obtains the statistical range for the area numbered L (step S215). The statistical range is the range for collecting the brightness statistical values of each area. That is, in this embodiment, the statistical value of brightness is obtained for each area captured by step S205, and is regarded as the brightness value representing the area. The statistical value only needs to represent the brightness value of the area, and various values such as the average, majority, and median can be used. When obtaining the statistical value, CPU27 does not set the entire area as the statistical acquisition object, but excludes a part of it and then obtains the statistics. Here, the remaining area that excludes a part is called the "statistical range".

統計範圍係設定為統計值能輕易呈現各區域到底為導體部或為絕緣部。具體而言,因為導體部係由金屬構成,而絕緣部係由樹脂等構成,因而一般X射線穿透量係導體部較小於絕緣部。在圖4A等所示切片影像中,會有X射線穿透量較小的導體部,較穿透量較大的絕緣部變亮(亮度值較大)傾向。即,依能清晰視認解析對象導體部,使導體部變為較絕緣部更亮的方式生成重建資訊。因此,切片影像所含區域中,可認為亮度統計值較大的區域係導體部,亮度統計值較小的區域係絕緣部。 The statistical range is set so that the statistical value can easily show whether each area is a conductor or an insulating part. Specifically, because the conductor is made of metal and the insulating part is made of resin, the X-ray penetration of the conductor is generally smaller than that of the insulating part. In the slice image shown in Figure 4A, there is a tendency that the conductor with a smaller X-ray penetration is brighter (larger brightness value) than the insulating part with a larger penetration. That is, the reconstruction information is generated in such a way that the conductor part of the analysis object can be clearly seen and the conductor part becomes brighter than the insulating part. Therefore, among the areas contained in the slice image, the area with a larger brightness statistical value can be considered to be the conductor part, and the area with a smaller brightness statistical value is the insulating part.

另一方面,已知切片影像中,在邊界線二側有存在從邊界朝區域內側的亮度過衝與下衝。圖6所示係過衝與下衝的說明圖。圖6的上圖係表示切片影像其中一部分。在該切片影像中央存在有亮度較大的導體部,在其周圍存在有亮度較小的絕緣部。 On the other hand, it is known that in the slice image, there are brightness overshoots and undershoots from the boundary to the inner side of the region on both sides of the boundary line. Figure 6 shows an illustration of overshoots and undershoots. The upper figure of Figure 6 shows a part of the slice image. There is a conductor part with higher brightness in the center of the slice image, and there is an insulating part with lower brightness around it.

圖6的下圖係切片影像中箭頭Ar部分的每個位置亮度。如該圖所示,在導體部與絕緣部邊界的亮度有大變化。具體 而言,在導體部中央處存在有亮度幾乎一定的部分Z1。絕緣部中若離開邊界線某程度距離,則存在有亮度幾乎一定的部分Z2。在部分Z1與Z2之間,若從部分Z1接近邊界則亮度急遽上升,然後再下降。若更進一步越過邊界接近部分Z2,則亮度急遽下降後再上升,最終成為幾乎一定。 The lower figure of Figure 6 shows the brightness of each position of the arrow Ar part in the slice image. As shown in the figure, the brightness at the boundary between the conductor part and the insulating part varies greatly. Specifically, there is a part Z1 with almost constant brightness in the center of the conductor part. If the insulating part is away from the boundary line to a certain extent, there is a part Z2 with almost constant brightness. Between parts Z1 and Z2, if the part Z1 approaches the boundary, the brightness rises sharply and then drops. If it further crosses the boundary and approaches part Z2, the brightness drops sharply and then rises again, and finally becomes almost constant.

依此將在導體部與絕緣部邊界附近的導體部內側,亮度較高於部分Z1亮度現象稱為「過衝」。又,將在導體部與絕緣部邊界附近的絕緣部內側,亮度降低於部分Z2亮度現象稱為「下衝」。此種過衝與下衝係因施行含有濾波反投影法的重建演算而產生。即,若執行濾波反投影法,便適用使空間頻率高諧波成分通過的濾波器,而強調邊緣。因為邊緣被強調,因而在包夾邊緣的高亮度側會產生過衝,而在低亮度側會產生下衝。 In this way, the phenomenon that the brightness inside the conductor part near the boundary between the conductor part and the insulating part is higher than the brightness of part Z1 is called "overshoot". In addition, the phenomenon that the brightness inside the insulating part near the boundary between the conductor part and the insulating part is lower than the brightness of part Z2 is called "undershoot". Such overshoot and undershoot are generated by performing a reconstruction algorithm including the filtered back projection method. That is, if the filtered back projection method is performed, a filter that allows high-harmonic components of spatial frequency to pass is applied to emphasize the edge. Because the edge is emphasized, an overshoot will occur on the high-brightness side of the edge, and an undershoot will occur on the low-brightness side.

如圖6的下圖所示,過衝部分的亮度較高於部分Z1的亮度,下衝部分的亮度係較小於部分Z2的亮度。因此,當依每區域取得亮度統計值時,相較於在部分Z1或部分Z2取得統計值之下,在過衝部分、下衝部分處取得統計值的情況,能使在邊緣二側存在的每區域亮度差更明顯。因此,本實施例中,CPU27便將在邊界線二側存在有從邊界朝區域內側的亮度過衝與下衝之範圍,設為統計範圍,並依該統計範圍取得亮度統計值。 As shown in the lower figure of FIG6 , the brightness of the overshoot portion is higher than that of portion Z1, and the brightness of the undershoot portion is lower than that of portion Z2. Therefore, when obtaining brightness statistics for each region, obtaining statistics at the overshoot portion and the undershoot portion can make the brightness difference of each region on both sides of the edge more obvious than obtaining statistics at portion Z1 or portion Z2. Therefore, in this embodiment, CPU 27 sets the range of brightness overshoot and undershoot from the boundary to the inner side of the region on both sides of the boundary as the statistical range, and obtains brightness statistics according to the statistical range.

統計範圍係只要從邊界朝區域內側既定寬度的範圍即可,可依各種手法定義。本實施例中,將利用既定影像處理所獲得寬度的範圍設為統計範圍。具體而言,本實施例中,CPU27係利用形貌處理的收縮處理,計算出收縮處理前的區域影像與收縮處理後的區域影像之差分,而特定統計範圍。 The statistical range is a range of a predetermined width from the boundary toward the inner side of the region, and can be defined by various methods. In this embodiment, the range of width obtained by using a predetermined image processing is set as the statistical range. Specifically, in this embodiment, CPU27 uses the shrinkage processing of the morphology processing to calculate the difference between the regional image before the shrinkage processing and the regional image after the shrinkage processing, and specifies the statistical range.

為施行此項處理,CPU27便在處理對象中,生成將區域編號L的像素為1、其他像素為0的二值化影像。圖4D所示係針對圖4C所示區域編號2的區域,使用該二值化生成的影像。CPU27係針對利用二值化所獲得影像實施收縮處理。收縮處理係可利用公知演算實現。圖4E所示係針對圖4D所示影像實施收縮處理後的影像。但,圖4E中,區域編號1的區域與區域編號2的區域邊界線 以及區域編號2的區域與區域編號3的區域邊界線,依白線表示。實際影像處理時,該等邊界線並不會出現(像素值為0)。 To perform this processing, CPU27 generates a binary image in the processing object, with the pixels of area number L being 1 and the other pixels being 0. FIG. 4D shows an image generated by the binarization for the area number 2 shown in FIG. 4C. CPU27 performs a shrinkage process on the image obtained by the binarization. The shrinkage process can be implemented using a known algorithm. FIG. 4E shows an image after the shrinkage process is performed on the image shown in FIG. 4D. However, in FIG. 4E, the boundary between the area number 1 and the area number 2, and the boundary between the area number 2 and the area number 3 are indicated by white lines. In actual image processing, the boundary does not appear (the pixel value is 0).

然後,CPU27藉由從收縮處理前的影像中剃除收縮處理後的影像,而特定統計範圍。圖4F所示係從圖4D所示影像中,剔除圖4E所示影像後的影像。根據以上的處理,便如圖4F所示,從邊界朝區域編號2的區域內側既定寬度範圍之像素值成為1。因此,值為1的像素便屬於供統計區域編號2之區域亮度用的統計範圍。另外,圖6中,圖6的下圖係將絕緣部的統計範圍表示為Zu、將導體部的統計範圍表示為Zo。又,統計範圍係只要屬於從邊界朝區域內側亮度過衝或下衝存在的範圍即可,收縮程度係可預設,亦可配合區域大小、亮度大小等再行決定。又,亦可利用形貌處理之收縮處理以外的處理決定統計範圍,例如可將距邊界線一定寬度範圍採用為統計範圍的構成等。 Then, CPU27 specifies the statistical range by removing the image after the shrinkage processing from the image before the shrinkage processing. FIG. 4F shows the image after removing the image shown in FIG. 4E from the image shown in FIG. 4D. According to the above processing, as shown in FIG. 4F, the pixel value of the predetermined width range from the boundary toward the inner side of the area numbered 2 becomes 1. Therefore, the pixel with a value of 1 belongs to the statistical range used for statistically calculating the brightness of the area numbered 2. In addition, in FIG. 6, the lower figure of FIG. 6 represents the statistical range of the insulating part as Zu and the statistical range of the conductive part as Zo. Moreover, the statistical range only needs to belong to the range where there is an overshoot or undershoot of the brightness from the boundary toward the inner side of the area. The shrinkage degree can be preset or determined in accordance with the area size, brightness size, etc. In addition, the statistical range can be determined by processing other than shrinkage processing of the shape processing, for example, a certain width range from the boundary line can be used as the composition of the statistical range, etc.

如上所述,若取得區域編號L的區域統計範圍,CPU27便取得亮度的統計值(步驟S220)。即,CPU27從切片編號k的切片影像中,特定區域編號L之區域的統計範圍,並取得該統計範圍的亮度統計值。例如圖4F所示例,CPU27係從圖4A所示切片影像中,擷取圖4F中依白色表示的像素,而取得各像素的亮度統計值。當如上所述取得亮度的統計值後,CPU27便針對區域編號L的區域,對應關聯賦予亮度統計值。另外,區域內側係指將邊界線視為最外側時,外側的反面側。因此,如區域編號2的區域,若由2個區域(區域編號1、3區域)邊界線包圍的區域,便定義為朝各邊界線內側的2個統計範圍。另一方面,如區域編號4的區域,僅存在與1個區域(區域編號3區域)的邊界線,而其餘則沒有邊界線的情況,便定義為朝1個邊界線內側的1個統計範圍。 As described above, if the statistical range of the area with area number L is obtained, CPU27 obtains the statistical value of the brightness (step S220). That is, CPU27 specifies the statistical range of the area with area number L from the slice image with slice number k, and obtains the statistical value of the brightness of the statistical range. For example, as shown in FIG. 4F, CPU27 extracts the pixels represented by white in FIG. 4F from the slice image shown in FIG. 4A, and obtains the statistical value of the brightness of each pixel. After obtaining the statistical value of the brightness as described above, CPU27 assigns the corresponding statistical value of the brightness to the area with area number L. In addition, the inner side of the area refers to the opposite side of the outer side when the boundary line is regarded as the outermost side. Therefore, if the area with area number 2 is surrounded by the boundary lines of two areas (area numbers 1 and 3), it is defined as two statistical ranges toward the inside of each boundary line. On the other hand, if the area with area number 4 only has a boundary line with one area (area number 3) and there are no other boundaries, it is defined as one statistical range toward the inside of one boundary line.

若針對區域編號L的區域取得亮度統計值,CPU27便將區域編號L遞增(步驟S225)。然後,CPU27判定區域編號L是否大於由步驟S205所擷取區域的總數(步驟S230)。步驟S230中,當區域編號L未被判定為大於區域總數時,CPU27便重複步驟S215以後的處理。 If the brightness statistics are obtained for the area with area number L, CPU27 increments the area number L (step S225). Then, CPU27 determines whether the area number L is greater than the total number of areas captured by step S205 (step S230). In step S230, when the area number L is not determined to be greater than the total number of areas, CPU27 repeats the processing after step S215.

另一方面,在步驟S230中,當判定區域編號L大於區域總數時,CPU27便取得切片編號k之切片影像應適用的閾值(步驟S235)。圖3B所示導體部與絕緣部的分類處理係將切片影像內的物件分類為導體部與絕緣部任一者的處理。表示切片影像的數據係表示每像素亮度值的數據,因而若解析亮度值,便可將任意像素分類到底屬於導體部或絕緣部中任一者。本實施例中,藉由將切片影像所含各區域的亮度統計值與閾值進行比較而分類。 On the other hand, in step S230, when it is determined that the region number L is greater than the total number of regions, CPU27 obtains the threshold value that should be applied to the slice image of the slice number k (step S235). The classification process of the conductive part and the insulating part shown in Figure 3B is a process of classifying the object in the slice image into either the conductive part or the insulating part. The data representing the slice image is data representing the brightness value of each pixel, so if the brightness value is analyzed, any pixel can be classified as belonging to either the conductive part or the insulating part. In this embodiment, the classification is performed by comparing the brightness statistics of each region contained in the slice image with the threshold value.

因此,CPU27取得切片編號k的切片影像應適用的閾值。閾值係只要根據各區域的亮度統計值,可將各區域辨別為導體部與絕緣部等二種的閾值即可。閾值係可依各種手法取得。本實施例係使用判別分析法。具體而言,CPU27係執行以下的演算。 Therefore, CPU27 obtains the threshold value that should be applied to the slice image of slice number k. The threshold value can be used as long as it can distinguish each area into two types such as a conductor part and an insulating part based on the brightness statistics of each area. The threshold value can be obtained by various methods. This embodiment uses the discriminant analysis method. Specifically, CPU27 performs the following calculations.

1.將由步驟S205取得的區域總數設為Zmax 1. Set the total number of regions obtained in step S205 as Zmax

2.針對Zmax個區域,將由步驟S220取得的統計值進行升序排序 2. For the Zmax regions, sort the statistical values obtained from step S220 in ascending order

3.將統計值分為從第1號至第i號的數據組與從第i+1號至第Zmax號的數據組,計算出組間變異數(i係1~Zmax中任一整數) 3. Divide the statistical values into data sets from No. 1 to No. i and data sets from No. i+1 to No. Zmax, and calculate the inter-group variance (i is any integer from 1 to Zmax)

4.依迴圈調查組間變異數值成為最大的i(=i0) 4. The i (=i 0 ) with the largest inter-group variance value in the loop survey

5.將第i0號數據值設為閾值 5. Set the i 0th data value as the threshold

根據以上的處理,取得能依由步驟S220所取得亮度統計值成為組間變異數最大的方式,進行分類之閾值。 According to the above processing, the threshold value for classification is obtained in such a way that the brightness statistics obtained in step S220 can maximize the inter-group variance.

然後,CPU27根據該閾值進行區域分類(步驟S240)。即,CPU27係將由步驟S220所取得亮度統計值與由步驟S235所取得閾值進行比較,將亮度統計值大於閾值的區域視為導體部。又,CPU27係將亮度統計值在閾值以下的區域視為絕緣部。另外,供利用判別分析法特定閾值的手法係可為各種手法。例如可依分離度(=組間變異數/組內變異數)最大化方式特定閾值。 Then, CPU27 classifies the region according to the threshold value (step S240). That is, CPU27 compares the brightness statistics obtained by step S220 with the threshold value obtained by step S235, and regards the region where the brightness statistics value is greater than the threshold value as the conductor part. In addition, CPU27 regards the region where the brightness statistics value is below the threshold value as the insulating part. In addition, various methods can be used to specify the threshold value using the discriminant analysis method. For example, the threshold value can be specified by maximizing the separation degree (=inter-group variation/intra-group variation).

其次,CPU27儲存表示由步驟S240所獲得分類的值(步驟S245)。即,CPU27針對各區域的各位置(像素),賦予對應關聯表示各區域分類結果的值(例如導體部係1、絕緣部係-1等)。根據以上的處理,切片編號k的切片影像內各區域,便呈被 分類為導體部或絕緣部中任一者的狀態。 Next, CPU27 stores the value representing the classification obtained in step S240 (step S245). That is, CPU27 assigns a corresponding value representing the classification result of each region (e.g., the conductive part is 1, the insulating part is -1, etc.) to each position (pixel) of each region. According to the above processing, each region in the slice image with slice number k is classified as either a conductive part or an insulating part.

圖5A所示係針對依如圖4C所示分割的區域編號1~4區域,依圖4F所示統計範圍統計的亮度統計值(平均數)。此例的情況,區域編號1~4的各亮度統計值係125.1、69.0、114.8、249.9。而,此例中,依照判別分析法取得的閾值係125.1。因此,就該例而言,區域編號1~3被分類為絕緣部、區域編號4被分類為導體部。CPU27係將表示該分類結果的資訊對應關聯於各區域。圖5A係例示相關導體部賦予1、絕緣部賦予-1的對應關聯例。另外,本實施例中,分類係針對各區域實施,但相關區域的邊界線並未進行分類,表示分類結果的值對應關聯賦予0。 FIG. 5A shows the brightness statistics (average) calculated according to the statistical range shown in FIG. 4F for the area numbers 1 to 4 divided as shown in FIG. 4C. In this example, the brightness statistics of the area numbers 1 to 4 are 125.1, 69.0, 114.8, and 249.9. In this example, the threshold value obtained according to the discriminant analysis method is 125.1. Therefore, in this example, the area numbers 1 to 3 are classified as insulating parts, and the area number 4 is classified as a conductive part. CPU 27 associates the information representing the classification result with each area. FIG. 5A illustrates an example of a corresponding association in which the conductive part is assigned 1 and the insulating part is assigned -1. In addition, in this embodiment, classification is implemented for each area, but the boundaries of the relevant areas are not classified, indicating that the value of the classification result is assigned to the corresponding association as 0.

若表示分類的值已儲存,CPU27便遞增切片編號k(步驟S250)。然後,CPU27判定切片編號k是否大於切片影像的總數(步驟S255)。在步驟S255中,若非判定為切片編號k大於切片影像總數的情況,CPU27便重複步驟S205以後的處理。在步驟S255中,當判定切片編號k大於切片影像總數的情況,便針對所有的切片影像結束分類。 If the value representing the classification has been stored, CPU27 increments the slice number k (step S250). Then, CPU27 determines whether the slice number k is greater than the total number of slice images (step S255). In step S255, unless it is determined that the slice number k is greater than the total number of slice images, CPU27 repeats the processing after step S205. In step S255, when it is determined that the slice number k is greater than the total number of slice images, the classification is terminated for all slice images.

圖3B所示處理係針對複數切片影像分別實施,並針對各切片影像的各位置(各像素)對應關聯賦予分類結果。切片影像的各位置係存在於平行第一方向的二維平面內,切片影像係藉由在Z方向的不同位置處切斷重建資訊即可獲得。因此,若結束圖3B所示處理,相關三維空間內的各位置便處於被分類為導體部或絕緣部的狀態。 The processing shown in FIG3B is implemented for multiple slice images respectively, and the classification result is assigned to each position (pixel) of each slice image. Each position of the slice image exists in a two-dimensional plane parallel to the first direction, and the slice image can be obtained by cutting and reconstructing information at different positions in the Z direction. Therefore, if the processing shown in FIG3B is completed, each position in the relevant three-dimensional space is classified as a conductive part or an insulating part.

當如上所述施行分類,CPU27便回歸於圖3A所示處理。然後,CPU27利用對比強調部27e的機能執行對比強調(步驟S120)。即,CPU27參照表示重建資訊各位置對應關聯分類結果的值,根據該位置係屬於導體部或絕緣部中之何者調整該位置的亮度對比。具體而言,CPU27係當該位置係導體部的情況便維持亮度,當該位置係絕緣部的情況便降低亮度,藉此強調對比。另外,亮度降低程度係可預設,例如設為原本亮度一半值的處理等。 When the classification is performed as described above, CPU27 returns to the processing shown in FIG3A. Then, CPU27 uses the function of the contrast emphasis unit 27e to perform contrast emphasis (step S120). That is, CPU27 refers to the value representing the associated classification result corresponding to each position of the reconstruction information, and adjusts the brightness contrast of the position according to whether the position belongs to the conductor part or the insulation part. Specifically, CPU27 maintains the brightness when the position is the conductor part, and reduces the brightness when the position is the insulation part, thereby emphasizing the contrast. In addition, the degree of brightness reduction can be preset, such as setting it to half the original brightness value.

其次,CPU27執行邊界部內插(步驟S130)。該邊界 部內插係為使邊界線不會被不自然看到的處理。本實施例的邊界部內插係使邊界線的亮度不會急遽變化的處理。圖5B所示係針對圖4C所示各區域對應關聯賦予表示分類結果的值後的狀態圖。本例中,僅對在中央處所存在的區域編號4對應關聯賦予1,而其餘區域編號1~3則對應關聯賦予-1。針對未被分類的邊界線則對應關聯賦予0。圖5B中,將對應關聯賦予1的像素著色為白色圖示,將對應關聯賦予-1的像素著色為灰色圖示,將對應關聯賦予0的像素著色為黑色圖示。 Next, the CPU 27 performs boundary interpolation (step S130). The boundary interpolation is a process for preventing the boundary line from being seen unnaturally. The boundary interpolation of this embodiment is a process for preventing the brightness of the boundary line from changing abruptly. FIG. 5B shows a state diagram after assigning values representing the classification results to the corresponding associations of each region shown in FIG. 4C. In this example, only the corresponding association of region number 4 in the center is assigned 1, while the corresponding associations of the remaining region numbers 1 to 3 are assigned -1. The corresponding associations of the unclassified boundary lines are assigned 0. In FIG. 5B , the pixel whose corresponding association is assigned to 1 is colored with a white icon, the pixel whose corresponding association is assigned to -1 is colored with a gray icon, and the pixel whose corresponding association is assigned to 0 is colored with a black icon.

本實施例中,邊界線寬度係設定成為1像素狀態。又,針對各區域,利用對比強調使亮度差大於原本影像。因此,在寬度為1像素的邊界線中,若利用邊界線二側的亮度施行內插處理,區域邊界的亮度會急遽變化,導致成為不自然的影像。而,實施例中,由CPU27依增加邊界線寬度的方式進行修正,再據經修正後的邊界線二側各區域之亮度施行內插處理,取修正後邊界線的亮度。內插處理係可使用公知各種處理,例如可適用各種平滑化濾波器。又,亦可利用雙線性內插(bi-linear interpolation)、雙立方內插(bicubic interpolation)等各種演算施行內插處理。圖5C所示係從經內插處理後的重建資訊中,在與圖4A所示位置的同一位置進行切片,並特別圖示與圖4A同一部分的圖。如圖5C所示,雖絕緣部的亮度差可視認,但絕緣部的亮度有降低,而導體部的亮度沒有降低,因此可明確區分導體部與絕緣部。又,導體部與絕緣部的邊界亦不會有不自然被看到情形。 In this embodiment, the width of the boundary line is set to 1 pixel. In addition, for each area, contrast emphasis is used to make the brightness difference greater than the original image. Therefore, in a boundary line with a width of 1 pixel, if the brightness on both sides of the boundary line is used for interpolation processing, the brightness of the area boundary will change rapidly, resulting in an unnatural image. However, in the embodiment, CPU27 performs correction by increasing the width of the boundary line, and then performs interpolation processing based on the brightness of each area on both sides of the corrected boundary line to obtain the brightness of the corrected boundary line. The interpolation processing can use various known processing, for example, various smoothing filters can be applied. In addition, various calculations such as bilinear interpolation and bicubic interpolation can also be used for interpolation processing. FIG5C shows a slice taken from the reconstructed information after interpolation at the same position as FIG4A, and specifically shows the same portion as FIG4A. As shown in FIG5C, although the brightness difference of the insulating portion is visible, the brightness of the insulating portion is reduced, while the brightness of the conductive portion is not reduced, so the conductive portion and the insulating portion can be clearly distinguished. In addition, the boundary between the conductive portion and the insulating portion will not be seen unnaturally.

藉由以上處理,呈現依能明確區分導體部與絕緣部的方式,施行重建資訊修正的狀態。本實施例的X射線檢查裝置便根據該修正後的重建資訊,可朝任意方向顯示切片影像。為執行該顯示,CPU27係利用顯示控制部27f的機能受理剖面(步驟S140)。具體而言,由使用者使用輸入部24指定基板W的剖面。本實施例的剖面係朝垂直於第一方向的第二方向(Z方向)切斷基板W的剖面。剖面係可利用各種手法指定,例如可採取由使用者指定:解析對象貫穿孔位置與通過該位置且朝平行Z方向的旋轉軸之 旋轉方向等構成。 Through the above processing, a state in which the reconstruction information is corrected in a manner that can clearly distinguish the conductor part from the insulating part is presented. The X-ray inspection device of this embodiment can display the slice image in any direction based on the corrected reconstruction information. To perform the display, the CPU 27 uses the function of the display control unit 27f to accept the section (step S140). Specifically, the user specifies the section of the substrate W using the input unit 24. The section of this embodiment is a section of the substrate W cut in the second direction (Z direction) perpendicular to the first direction. The section can be specified by various methods, for example, the user can specify: the position of the penetration hole of the analysis object and the rotation direction of the rotation axis passing through the position and parallel to the Z direction, etc.

其次,由CPU27利用顯示控制部27f的機能,顯示出解析對象影像(步驟S150)。即,CPU27係從經修正後的重建資訊,取得表示在由步驟S140所受理剖面上之位置穿透量的資訊,並生成切片影像,視為解析對象影像。然後,由CPU27控制輸出部25,顯示出解析對象影像。此項結果係例如將圖2E所示影像當作解析對象影像,並顯示於輸出部25。該影像中幾乎沒有視認到偽影,使用者可輕易區分含有貫穿孔、佈線圖案的導體部與絕緣部。因此,使用者根據該解析對象影像,便可輕易解析導體部的良莠等。 Next, CPU27 uses the function of the display control unit 27f to display the analysis target image (step S150). That is, CPU27 obtains information indicating the position penetration amount on the section accepted by step S140 from the corrected reconstruction information, and generates a slice image as the analysis target image. Then, CPU27 controls the output unit 25 to display the analysis target image. This result is, for example, that the image shown in FIG. 2E is regarded as the analysis target image and displayed on the output unit 25. There is almost no visible artifact in the image, and the user can easily distinguish the conductor part containing the through hole and the wiring pattern from the insulating part. Therefore, the user can easily analyze the quality of the conductor part based on the analysis target image.

再者,本實施例中,第一方向係屬於疊層基板的基板W,所具備複數層的積層方向之垂直方向。因此,本實施例中,朝平行於基板W之層的第一方向切斷之切片影像成為解析對象。在層內,佈線圖案呈平面式擴大,形成比較單純的形狀。另一方面,在層的垂直方向上,佈線圖案成為比較複雜。例如圖2C所示切片影像,較圖2B所示切片影像更單純。因此,藉由對朝第一方向切斷的切片影像進行解析,便可使用較單純形狀的影像分類出導體部與絕緣部。 Furthermore, in this embodiment, the first direction is a direction perpendicular to the stacking direction of the substrate W of the stacked substrate having multiple layers. Therefore, in this embodiment, the slice image cut in the first direction parallel to the layer of the substrate W becomes the object of analysis. Within the layer, the wiring pattern is expanded in a planar manner to form a relatively simple shape. On the other hand, in the vertical direction of the layer, the wiring pattern becomes more complex. For example, the slice image shown in FIG. 2C is simpler than the slice image shown in FIG. 2B. Therefore, by analyzing the slice image cut in the first direction, the conductor part and the insulating part can be classified using the image with a relatively simple shape.

再者,本實施例中,第一方向係旋轉軸Ax的垂直方向。因此,根據平行於X射線檢測器12旋轉軌跡的圓且朝基板W移動方向X-Y平面的平行方向切斷之切片影像,便可分類出導體部與絕緣部。因此,從X射線產生器11、X射線檢測器12、定位機構等空間配置,便可輕易特定切片影像的切斷方向。故,使用者可輕易直覺掌握供分類出基板W的導體部與絕緣部之切片影像,到底係從哪一方向切斷。 Furthermore, in this embodiment, the first direction is the perpendicular direction of the rotation axis Ax. Therefore, the conductive part and the insulating part can be classified according to the slice image that is cut in a direction parallel to the circle of the rotation trajectory of the X-ray detector 12 and in the X-Y plane in the moving direction of the substrate W. Therefore, the cutting direction of the slice image can be easily specified from the spatial configuration of the X-ray generator 11, the X-ray detector 12, the positioning mechanism, etc. Therefore, the user can easily and intuitively grasp the direction from which the slice image for classifying the conductive part and the insulating part of the substrate W is cut.

再者,本實施例中,根據第二方向上不同切斷位置的複數切片影像,分類出導體部與絕緣部。因此,可將朝基板W高度方向擴大的重建資訊分類出導體部與絕緣部。又,若第二方向的切斷位置係沿基板W全高均有設定,便可針對網羅基板W全高度範圍的重建資訊,分類出導體部與絕緣部。 Furthermore, in this embodiment, the conductor part and the insulating part are classified according to the multiple slice images of different cutting positions in the second direction. Therefore, the reconstruction information expanded in the height direction of the substrate W can be classified into the conductor part and the insulating part. In addition, if the cutting position in the second direction is set along the entire height of the substrate W, the conductor part and the insulating part can be classified for the reconstruction information covering the entire height range of the substrate W.

再者,本實施例中,因為根據朝第一方向切斷的切 片影像分類出導體部與絕緣部,因而根據該切片影像內所含的單純形狀導體部影像便可執行分類。然後,在施行分類後根據經對比強調過的重建資訊,藉由將朝第二方向切斷的切片影像設為解析對象影像,便可依能明確區分導體部與絕緣部的狀態,對解析對象影像施行解析。 Furthermore, in this embodiment, since the conductive part and the insulating part are classified according to the slice image cut in the first direction, the classification can be performed according to the simple shape conductive part image contained in the slice image. Then, after the classification is performed, according to the reconstruction information emphasized by contrast, by setting the slice image cut in the second direction as the analysis target image, the analysis target image can be analyzed in a state that the conductive part and the insulating part can be clearly distinguished.

再者,本實施例中,分別針對從切片影像擷取的複數區域,取得表示區域之值的亮度統計值。因此,各區域的分類可根據各區域對應關聯的亮度統計值實施,只要解析較少數量的統計值便可進行分類。因此,利用單純的處理便可分類出導體部與絕緣部。 Furthermore, in this embodiment, for each of the multiple regions captured from the slice image, the brightness statistics representing the region values are obtained. Therefore, the classification of each region can be implemented according to the brightness statistics corresponding to each region, and the classification can be performed by analyzing a small number of statistics. Therefore, the conductor part and the insulation part can be classified by simple processing.

再者,本實施例中,並非針對各區域全體,而是藉由統計鄰接邊界線既定寬度範圍的統計範圍內亮度,取得亮度統計值。因此,可將反映邊界線附近亮度特性的值設為亮度統計值。 Furthermore, in this embodiment, the brightness statistics are obtained by statistically calculating the brightness within a statistical range of a predetermined width adjacent to the boundary line instead of targeting the entire area. Therefore, the value reflecting the brightness characteristics near the boundary line can be set as the brightness statistics value.

再者,本實施例中,統計範圍係從邊界朝區域內側既定寬度的範圍,在該範圍內存在有亮度過衝或下衝。因此,根據本實施例,可較區域全體的亮度強調(或抑制)亮度。 Furthermore, in this embodiment, the statistical range is a range of a predetermined width from the boundary toward the inner side of the region, and there is brightness overshoot or undershoot in this range. Therefore, according to this embodiment, the brightness can be emphasized (or suppressed) compared to the brightness of the entire region.

再者,根據該構成,可使導體部亮度與絕緣部亮度的差較為明顯。因此,相較於統計區域全體亮度的構成之下,可使為分類出導體部與絕緣部用的閾值設定更為容易。圖5D所示係沿圖4A所示切片影像的箭頭A之每個位置亮度圖,上圖係與圖4A同一切片影像,下圖係亮度圖形。另外,上圖所示切片影像中,對各區域對應關聯賦予與圖4C同樣的區域編號,下圖所示圖形亦對應關聯於區域編號。 Furthermore, according to this structure, the difference between the brightness of the conductor part and the brightness of the insulating part can be made more obvious. Therefore, compared with the structure of statistically calculating the overall brightness of the area, it is easier to set the threshold for classifying the conductor part and the insulating part. FIG5D shows the brightness diagram of each position along the arrow A of the slice image shown in FIG4A. The upper figure is the same slice image as FIG4A, and the lower figure is a brightness diagram. In addition, in the slice image shown in the upper figure, each area is associated with the same area number as FIG4C, and the figure shown in the lower figure also corresponds to the area number.

如圖5D的上圖所示,區域編號4的區域係由邊界線所包圍的封閉區域,亮度較大於在區域編號4周圍所存在區域。因此,在區域編號4的區域內僅存在過衝,若取得鄰接邊界線的統計範圍內之亮度統計值,統計值變為非常大。結果,可使區域編號4區域對應關聯的亮度,非常大於周圍區域。依此,亮度大於周圍區域的封閉區域可良好地呈現佈線圖案、貫穿孔的影像。因此,根據本實施例,可依能將佈線圖案、貫穿孔的典型影像,分類為 導體部之可能性非常高的方式,取得亮度值。 As shown in the upper figure of FIG. 5D, the area with area number 4 is a closed area surrounded by a boundary line, and the brightness is greater than the area around area number 4. Therefore, there is only overshoot in the area with area number 4, and if the statistical value of the brightness within the statistical range adjacent to the boundary line is obtained, the statistical value becomes very large. As a result, the brightness corresponding to the area with area number 4 can be made very greater than the surrounding area. Accordingly, the closed area with brightness greater than the surrounding area can well present the image of the wiring pattern and the through hole. Therefore, according to this embodiment, the brightness value can be obtained in a manner that is very likely to classify the typical image of the wiring pattern and the through hole as the conductor part.

再者,如區域編號2,在亮度小於周圍的區域中,在區域內僅存在下衝,若取得鄰接邊界線的統計範圍內之亮度統計值,統計值變為非常小。結果可使對應關聯於區域編號2區域的亮度,非常小於周圍區域。依此,亮度小於周圍區域的區域係絕緣部的可能性非常高。因此,根據本實施例,可依絕緣部的典型影像被分類為絕緣部之可能性非常高的方式,取得亮度值。 Furthermore, for example, in the area with brightness lower than the surrounding area, there is only undershoot in the area. If the brightness statistics within the statistical range of the adjacent boundary are obtained, the statistics become very small. As a result, the brightness of the area corresponding to the area with brightness lower than the surrounding area is very small. Accordingly, the area with brightness lower than the surrounding area is very likely to be an insulating part. Therefore, according to this embodiment, the brightness value can be obtained in a manner that the typical image of the insulating part is very likely to be classified as an insulating part.

再者,本實施例中,將區域分類為導體部與絕緣部的閾值,係依照判別分析法取得。因此,可輕易取得供分類區域用的閾值。 Furthermore, in this embodiment, the threshold for classifying the region into the conductor part and the insulation part is obtained according to the discriminant analysis method. Therefore, the threshold for classifying the region can be easily obtained.

(3)其他實施例: (3) Other embodiments:

以上實施例係本發明之一實施方式,其他尚亦可採用各種實施方式。例如X射線檢查裝置的態樣不僅侷限於圖1所示態樣。例如係可在工廠等設置有複數台X射線攝像機構部10,而控制部20係由一台電腦實現,構成利用一台電腦所具備的控制部20,對複數X射線攝像機構部10進行控制。 The above embodiment is one embodiment of the present invention, and other embodiments may also be adopted. For example, the form of the X-ray inspection device is not limited to the form shown in FIG. 1. For example, a plurality of X-ray imaging mechanisms 10 may be installed in a factory, and the control unit 20 is implemented by a computer, so that the control unit 20 of a computer is used to control the plurality of X-ray imaging mechanisms 10.

再者,X射線影像取得部27a、重建演算部27b、切片影像取得部27c、分類部27d、對比強調部27e、顯示控制部27f中至少其中一部分,亦可分開存在於複數裝置中。例如亦可顯示控制部27f的機能中,利用CPU27取得獲取解析對象影像的機能,再將解析對象影像傳輸給其他裝置,利用其他裝置所設置顯示控制部27f的機能,使解析對象影像顯示於顯示器上。 Furthermore, at least a part of the X-ray image acquisition unit 27a, the reconstruction calculation unit 27b, the slice image acquisition unit 27c, the classification unit 27d, the contrast emphasis unit 27e, and the display control unit 27f may also be separately present in multiple devices. For example, the function of the display control unit 27f may be used to obtain the function of the analyzed object image by using the CPU 27, and then transmit the analyzed object image to other devices, and use the function of the display control unit 27f provided in other devices to display the analyzed object image on the display.

當然亦可省略上述實施方式其中一部分的構成,處理的順序亦可變動或省略。例如圖3A所示步驟S100的前處理,係在邊緣擷取時,為能不會看到邊緣而導入雜訊。因此,若即使未施行前處理,仍可在不受雜訊影響情況下執行邊緣擷取的話,便可省略前處理。又,例如相關邊界部的內插,即使由一個像素的邊界線內插仍不會不自然看到時,亦可依一個像素的邊界線內插。又,藉由可被看到與鄰接邊界線的像素亮度相同或是邊界線位置的重建資訊亮度在未修正情況下便可使用,亦可不施行內插 等。又,在上述實施例中,供施行導體部與絕緣部分類用的閾值,係根據各切片編號k的切片影像取得,但亦可由複數切片影像取得共通閾值。 Of course, some of the structures of the above-mentioned implementation methods can be omitted, and the processing order can also be changed or omitted. For example, the pre-processing of step S100 shown in FIG. 3A introduces noise when capturing the edge so that the edge cannot be seen. Therefore, if the edge can be captured without being affected by noise even without pre-processing, the pre-processing can be omitted. In addition, for example, if the interpolation of the relevant boundary portion does not appear unnatural even if it is interpolated by the boundary line of one pixel, it can be interpolated by the boundary line of one pixel. In addition, by being able to see that the brightness of the pixel adjacent to the boundary line is the same or the brightness of the reconstructed information at the boundary position can be used without correction, interpolation can be omitted. Furthermore, in the above-mentioned embodiment, the threshold value used for classifying the conductive part and the insulating part is obtained based on the slice image of each slice number k, but a common threshold value can also be obtained from a plurality of slice images.

由切片影像取得部切斷基板的第一方向,並不僅侷限於如上述實施例平行於基板表面的方向,亦可為各種方向。但,因為朝第一方向的平行方向切斷獲得的切片影像,係屬於供施行導體部與絕緣部分類用之解析的影像,因而平行於第一方向的方向設定為可執行該解析。例如朝第一方向切斷時,最好依導體部不會成為無法解析程度小面積的方式,選擇第一方向。 The first direction of cutting the substrate by the slice image acquisition unit is not limited to the direction parallel to the substrate surface as in the above-mentioned embodiment, but can be various directions. However, because the slice image obtained by cutting in a direction parallel to the first direction is an image for performing analysis for classifying the conductor part and the insulating part, the direction parallel to the first direction is set to be able to perform the analysis. For example, when cutting in the first direction, it is best to select the first direction in such a way that the conductor part does not become a small area that cannot be analyzed.

分類部係只要能將切片影像分類出導體部與絕緣部即可。因此,除上述實施例外,尚亦可利用各種手法施行分類。例如供取得每區域亮度統計值的統計範圍,亦可採用不限定於如該區域其中一部分範圍的構成等。又,為特定區域的邊界,亦可考慮基板的設計資訊(導體部、絕緣部設計上的位置)。又,雜訊減輕處理、邊界擷取、縮小處理、放大處理、形貌處理等,亦可採用各種公知處理。又,亦可省略其中一部分的處理(例如:縮小處理、放大處理等)。又,收縮處理或膨脹處理時亦可不使用形貌處理,例如亦可將距邊界一定距離範圍的區域設為統計範圍,並進行擷取的處理。 The classification part only needs to be able to classify the slice image into the conductor part and the insulation part. Therefore, in addition to the above-mentioned embodiments, various methods can also be used to implement classification. For example, the statistical range for obtaining the statistical value of the brightness of each area can also be used, and the composition that is not limited to a part of the area can also be used. In addition, for the boundary of a specific area, the design information of the substrate (the design position of the conductor part and the insulation part) can also be considered. In addition, various known processes such as noise reduction processing, boundary extraction, reduction processing, magnification processing, morphology processing, etc. can also be used. In addition, some of the processing (for example: reduction processing, magnification processing, etc.) can also be omitted. Furthermore, it is not necessary to use topographic processing during shrinkage or expansion processing. For example, an area within a certain distance from the boundary can be set as the statistical range and the capture process can be performed.

對比強調部係只要能強調導體部與絕緣部的對比即可。因此,供強調對比的手法不僅侷限於上述手法。例如亦可降低絕緣部亮度,同時提高導體部亮度的構成。又,亦可降低導體部亮度,只要利用降低絕緣部亮度,結果可強調對比的話即可。又,即使維持(或提高)絕緣部亮度,但只要藉由調整導體部的亮度,便可強調對比的話即可。即,藉由強調對比,相較於強調對比前較不易辨識到偽影,結果可輕易區分導體部與絕緣部的話即可。 The contrast emphasis part can be any part that can emphasize the contrast between the conductor part and the insulating part. Therefore, the method for emphasizing the contrast is not limited to the above method. For example, the brightness of the insulating part can be reduced while the brightness of the conductor part can be increased. In addition, the brightness of the conductor part can be reduced as long as the contrast can be emphasized by reducing the brightness of the insulating part. In addition, even if the brightness of the insulating part is maintained (or increased), the contrast can be emphasized by adjusting the brightness of the conductor part. That is, by emphasizing the contrast, it is less likely to identify the false image than before emphasizing the contrast, and the conductor part and the insulating part can be easily distinguished.

統計範圍係在從邊界朝區域內側的亮度有存在過衝或下衝的範圍即可。因此,只要在統計範圍中含有過衝或下衝中任一者即可,結果相較於僅使用在區域內亮度較平坦部分進行統 計的構成下,構成導體部與絕緣部的亮度統計值容易產生差的構成。統計範圍係含有過衝或下衝的範圍,只要含有過衝或下衝經減衰後的平坦部分即可,但為使亮度統計值容易產生差,最好不要含有平坦部分。 The statistical range is the range where the brightness from the boundary to the inside of the area has overshoot or undershoot. Therefore, as long as either overshoot or undershoot is included in the statistical range, the statistical values of the brightness of the conductor and the insulation are more likely to differ compared to the configuration in which only the brightness of the flatter portion in the area is used for statistics. The statistical range is the range that includes overshoot or undershoot, and it is sufficient to include the flat portion after the overshoot or undershoot is attenuated, but in order to make the brightness statistical value more likely to differ, it is better not to include the flat portion.

再者,根據重建資訊的切片影像進行導體部與絕緣部的分類,並施行對比強調的手法,亦可適用程式或方法。又,亦可適當將其中一部分變更為軟體,或將其中一部分變更為硬體等。又,控制裝置的程式之記錄媒體亦成立發明。當然,該軟體的記錄媒體係可為磁記錄媒體,亦可為半導體記憶體,也可以是未來開發的任何其他記錄媒體。 Furthermore, the classifying of the conductive part and the insulating part according to the slice image of the reconstructed information and the contrast and emphasis technique can also be applied to the program or method. Also, part of it can be appropriately changed to software, or part of it can be changed to hardware, etc. In addition, the recording medium of the program of the control device is also an invention. Of course, the recording medium of the software can be a magnetic recording medium, a semiconductor memory, or any other recording medium developed in the future.

10:X射線攝像機構部 10: X-ray imaging device

11:X射線產生器 11: X-ray generator

11a:X射線輸出部 11a: X-ray output unit

12:X射線檢測器 12: X-ray detector

12a:檢測面 12a: Detection surface

20:控制部 20: Control Department

21:產生器控制部 21: Generator control unit

22:檢測器控制部 22: Detector control unit

23:定位機構控制部 23: Positioning mechanism control unit

24:輸入部 24: Input section

25:輸出部 25: Output section

26:記憶體 26: Memory

26a:程式數據 26a: Program data

26b:X射線影像數據 26b: X-ray image data

27:CPU 27:CPU

27a:X射線影像取得部 27a: X-ray image acquisition unit

27b:重建演算部 27b: Reconstruction calculation department

27c:切片影像取得部 27c: Slice image acquisition unit

27d:分類部 27d: Classification Department

27e:對比強調部 27e: Contrast emphasis section

27f:顯示控制部 27f: Display control unit

W:基板 W: Substrate

Claims (10)

一種X射線檢查裝置,係包含:X射線影像取得部,其係取得將X射線依傾斜於既定方向的角度照射基板而拍攝到的複數X射線影像;重建演算部,其係根據該些X射線影像執行重建演算而取得重建資訊;切片影像取得部,其係根據該重建資訊,取得在預設第一方向上切斷該基板的切片影像,並取得不同切斷位置的複數切片影像;分類部,其係將該些切片影像分類為導體部與絕緣部,並根據該些切片影像的分類結果,將表示該重建資訊的各位置分類為該導體部或該絕緣部;對比強調部,其係強調該導體部與該絕緣部的對比,其係根據表示該重建資訊的各位置係屬於該導體部或該絕緣部中之何者,強調各位置的亮度對比;以及顯示控制部,其係根據經施行對比強調後的該重建資訊,取得朝垂直於該第一方向的第二方向切斷該基板之解析對象影像,並使該解析對象影像顯示於顯示部。 An X-ray inspection device includes: an X-ray image acquisition unit, which acquires a plurality of X-ray images taken by irradiating a substrate with X-rays at an angle inclined to a predetermined direction; a reconstruction calculation unit, which performs a reconstruction calculation based on the X-ray images to acquire reconstruction information; a slice image acquisition unit, which acquires a slice image of the substrate cut in a preset first direction based on the reconstruction information, and acquires a plurality of slice images at different cutting positions; a classification unit, which classifies the slice images into a conductive portion and an insulating portion, and classifies the slice images based on the reconstruction information. The classification results of the slice images are used to classify each position representing the reconstruction information as the conductive part or the insulating part; the contrast emphasis part emphasizes the contrast between the conductive part and the insulating part, and emphasizes the brightness contrast of each position according to whether each position representing the reconstruction information belongs to the conductive part or the insulating part; and the display control part obtains the analysis target image of the substrate cut in a second direction perpendicular to the first direction according to the reconstruction information after contrast emphasis, and displays the analysis target image on the display part. 如請求項1所述之X射線檢查裝置,其中,該對比強調部係降低該絕緣部的亮度。 An X-ray inspection device as described in claim 1, wherein the contrast emphasis portion reduces the brightness of the insulating portion. 如請求項1所述之X射線檢查裝置,其中,該分類部係擷取該切片影像所含的邊界,並擷取由所擷取之該邊界分割的區域,取得所擷取之該區域的亮度統計值,根據該區域的該亮度統計值,分別將該區域分類為該導體部或該絕緣部。 The X-ray inspection device as described in claim 1, wherein the classification unit captures the boundary contained in the slice image, captures the area divided by the captured boundary, obtains the brightness statistics of the captured area, and classifies the area into the conductive part or the insulating part according to the brightness statistics of the area. 如請求項3所述之X射線檢查裝置,其中,該區域的該亮度統計值係通過統計獲得統計範圍內之亮度而獲得的值,該統計範圍係從該邊界朝該區域內側之既定寬度範圍。 An X-ray inspection device as described in claim 3, wherein the brightness statistical value of the region is a value obtained by statistically obtaining the brightness within a statistical range, and the statistical range is a predetermined width range from the boundary toward the inside of the region. 如請求項4所述之X射線檢查裝置,其中,該統計範圍係從該邊界朝該區域內側的亮度過衝或下衝所存在範圍。 An X-ray inspection device as described in claim 4, wherein the statistical range is the range of brightness overshoot or undershoot from the boundary toward the inner side of the region. 如請求項4所述之X射線檢查裝置,其中,該分類 部係藉由將該區域的該亮度統計值與閾值進行比較,而將該區域分類為該導體部或該絕緣部;該閾值係供根據從該切片影像所含複數該統計範圍獲得的複數該亮度統計值,利用判別分析法特定為二值化的值。 An X-ray inspection device as described in claim 4, wherein the classification section classifies the region into the conductor portion or the insulating portion by comparing the brightness statistical value of the region with a threshold value; the threshold value is a value that is specifically binarized using a discriminant analysis method based on the plurality of brightness statistical values obtained from the plurality of statistical ranges contained in the slice image. 如請求項1所述之X射線檢查裝置,其中,該基板係具有複數層的疊層基板;以及該第一方向係垂直於該些層的積層方向之方向。 An X-ray inspection device as described in claim 1, wherein the substrate is a stacked substrate having a plurality of layers; and the first direction is a direction perpendicular to the stacking direction of the layers. 如請求項1所述之X射線檢查裝置,其中,該X射線影像取得部係使該X射線檢測器、該X射線產生器、該基板中至少其中一者,以旋轉軸為中心進行旋轉,並在不同旋轉角的複數位置處拍攝該X射線影像;以及該第一方向係垂直於該旋轉軸之方向。 The X-ray inspection device as described in claim 1, wherein the X-ray image acquisition unit rotates at least one of the X-ray detector, the X-ray generator, and the substrate around a rotation axis and captures the X-ray image at multiple positions at different rotation angles; and the first direction is a direction perpendicular to the rotation axis. 一種X射線檢查方法,係包含:X射線影像取得步驟,係取得將X射線依傾斜於既定方向的角度照射基板,所拍攝到的複數X射線影像;重建演算步驟,其係根據該些X射線影像執行重建演算而取得重建資訊;切片影像取得步驟,其係根據該重建資訊,取得在預設第一方向上切斷該基板的切片影像,並取得不同切斷位置的複數切片影像;分類步驟,其係將該些切片影像分類為導體部與絕緣部,並根據該些切片影像的分類結果,將表示該重建資訊的各位置分類為該導體部或該絕緣部;對比強調步驟,其係強調該導體部與該絕緣部之對比,其係根據表示該重建資訊的各位置係屬於該導體部或該絕緣部中之何者,強調各位置的亮度對比;以及顯示控制部,其係根據經施行對比強調後的該重建資訊,取得朝垂直於該第一方向的第二方向切斷該基板之解析對象影像,並使該解析對象影像顯示於顯示部。 An X-ray inspection method includes: an X-ray image acquisition step, which is to obtain a plurality of X-ray images taken by irradiating a substrate with X-rays at an angle inclined to a predetermined direction; a reconstruction calculation step, which is to perform a reconstruction calculation based on the X-ray images to obtain reconstruction information; a slice image acquisition step, which is to obtain a slice image of the substrate cut in a preset first direction according to the reconstruction information, and obtain a plurality of slice images at different cutting positions; a classification step, which is to classify the slice images into a conductive part and an insulating part, and According to the classification results of the slice images, each position representing the reconstruction information is classified as the conductor part or the insulating part; the contrast emphasis step is to emphasize the contrast between the conductor part and the insulating part, which is to emphasize the brightness contrast of each position according to whether each position representing the reconstruction information belongs to the conductor part or the insulating part; and the display control unit is to obtain the analysis object image of the substrate cut in a second direction perpendicular to the first direction according to the reconstruction information after contrast emphasis, and display the analysis object image on the display unit. 一種X射線檢查程式,係使電腦具有下述機能: X射線影像取得部,其係取得將X射線依傾斜於既定方向的角度照射基板,所拍攝到的複數X射線影像;重建演算部,其係根據該些X射線影像執行重建演算而取得重建資訊;切片影像取得部,其係根據該重建資訊,取得在預設第一方向上切斷該基板的切片影像,並取得不同切斷位置的複數切片影像;分類部,其係將該些切片影像分類為導體部與絕緣部,並根據該些切片影像的分類結果,將表示該重建資訊的各位置分類為該導體部或該絕緣部;對比強調部,其係強調該導體部與該絕緣部之對比,其係根據表示該重建資訊的各位置係屬於該導體部或該絕緣部中之何者,強調各位置的亮度對比;以及顯示控制部,其係根據經施行對比強調後的該重建資訊,取得朝垂直於該第一方向的第二方向切斷該基板之解析對象影像,並使該解析對象影像顯示於顯示部。 An X-ray inspection program enables a computer to have the following functions: An X-ray image acquisition unit, which acquires a plurality of X-ray images taken by irradiating a substrate with X-rays at an angle inclined to a predetermined direction; a reconstruction calculation unit, which performs a reconstruction calculation based on the X-ray images to acquire reconstruction information; a slice image acquisition unit, which acquires a slice image of the substrate cut in a preset first direction based on the reconstruction information, and acquires a plurality of slice images at different cutting positions; a classification unit, which classifies the slice images into conductive parts and insulating parts , and according to the classification results of the slice images, each position representing the reconstruction information is classified as the conductor part or the insulating part; a contrast emphasis part, which emphasizes the contrast between the conductor part and the insulating part, emphasizes the brightness contrast of each position according to whether each position representing the reconstruction information belongs to the conductor part or the insulating part; and a display control part, which obtains an analysis target image of the substrate cut in a second direction perpendicular to the first direction according to the reconstruction information after contrast emphasis, and displays the analysis target image on the display part.
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