TWI871474B - Composition, cured product and method for producing cured product - Google Patents
Composition, cured product and method for producing cured product Download PDFInfo
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- C07D453/00—Heterocyclic compounds containing quinuclidine or iso-quinuclidine ring systems, e.g. quinine alkaloids
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
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- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
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Abstract
本發明係一種組合物,其具有環狀醚成分、硫醇成分、及下述通式(1)所表示之化合物。較佳為上述環狀醚成分之含量於上述環狀醚成分及上述硫醇成分之合計100質量份中為20質量份以上80質量份以下。上述通式(1)所表示之化合物之含量於上述環狀醚成分、上述硫醇成分及上述通式(1)所表示之化合物之合計100質量份中為3質量份以上15質量份以下亦較佳。 (式中之符號之定義係參照說明書) The present invention is a composition comprising a cyclic ether component, a thiol component, and a compound represented by the following general formula (1). Preferably, the content of the cyclic ether component is 20 parts by mass or more and 80 parts by mass or less in 100 parts by mass of the total of the cyclic ether component and the thiol component. Preferably, the content of the compound represented by the general formula (1) is 3 parts by mass or more and 15 parts by mass or less in 100 parts by mass of the total of the cyclic ether component, the thiol component, and the compound represented by the general formula (1). (The definitions of the symbols in the formula are in the instruction manual)
Description
本發明係關於一種組合物、其硬化物及硬化物之製造方法。The present invention relates to a composition, a cured product thereof and a method for producing the cured product.
通常,感光性樹脂組合物係於感光性樹脂中加入光聚合起始劑而成者,能夠藉由能量線(光)照射進行聚合硬化、或顯影,因此正被用於光硬化性油墨、感光性印刷版、各種光阻、光硬化性接著劑等。Generally, a photosensitive resin composition is formed by adding a photopolymerization initiator to a photosensitive resin. It can be polymerized and cured or developed by irradiation with energy rays (light). Therefore, it is used in photocurable inks, photosensitive printing plates, various photoresists, photocurable adhesives, etc.
光聚合起始劑根據由能量線(光)照射而產生之活性種之不同而被分為光自由基產生劑、光產酸劑、光產鹼劑。光自由基產生劑具有硬化速度快、硬化後不會殘存活性種等優點,另一方面,由於氧會阻礙硬化,故而有於薄膜之硬化時必須設置隔氧層等之缺點。光產酸劑具有不受氧所阻礙之優點,另一方面,有因活性種之酸殘存而使金屬基板腐蝕、或使硬化後之樹脂改性等之缺點。光產鹼劑由於不易產生上述由氧導致之硬化阻礙由因殘存活性種導致之腐蝕等問題,故而受到關注。作為光產鹼劑,已知有離子型(專利文獻1)、非離子型(專利文獻2及3)各者。 [先前技術文獻] [專利文獻] Photopolymerization initiators are classified into photoradical generators, photoacid generators, and photoalkali generators according to the different active species generated by irradiation with energy rays (light). Photoradical generators have the advantages of fast curing speed and no residual active species after curing. On the other hand, since oxygen will hinder curing, it has the disadvantage that an oxygen barrier layer must be set when curing the film. Photoacid generators have the advantage of not being hindered by oxygen. On the other hand, they have the disadvantages of corrosion of metal substrates or modification of resins after curing due to residual acids of active species. Photoalkali generators have attracted attention because they are not prone to the above-mentioned problems of curing inhibition caused by oxygen and corrosion caused by residual active species. As photoalkali generators, there are known ionic types (Patent Document 1) and non-ionic types (Patent Documents 2 and 3). [Prior Art Documents] [Patent Documents]
專利文獻1:WO98/38195A1 專利文獻2:US20110233048A1 專利文獻3:WO2010/064632號說明書 Patent document 1: WO98/38195A1 Patent document 2: US20110233048A1 Patent document 3: WO2010/064632 specification
[發明所欲解決之問題][The problem the invention is trying to solve]
然而,含有離子型光產鹼劑之樹脂組合物存在保存穩定性低之不良情況。又,先前之含有光產鹼劑之樹脂組合物存在曝光後之硬化時需要高溫加熱等接著條件之自由度低之不良情況。However, resin compositions containing ionic photoalkali generators have the disadvantage of low storage stability. In addition, conventional resin compositions containing photoalkali generators have the disadvantage of low flexibility in subsequent conditions such as high temperature heating required for curing after exposure.
本發明係鑒於上述問題點而完成者,目的在於提供一種保存穩定性及低溫接著性優異之硬化性組合物。 [解決問題之技術手段] The present invention is made in view of the above-mentioned problems, and aims to provide a curable composition with excellent storage stability and low-temperature adhesion. [Technical means to solve the problem]
本發明者進行努力研究,發現藉由將特定產鹼劑、硫醇成分、及環狀醚成分進行組合能夠兼顧保存穩定性及低溫接著性,從而完成本發明。The inventors of the present invention have conducted diligent research and found that by combining a specific base generating agent, a thiol component, and a cyclic ether component, both storage stability and low-temperature adhesion can be achieved, thereby completing the present invention.
即,本發明提供一種組合物,其具有環狀醚成分、 硫醇成分、及 下述通式(1)所表示之化合物。 [化1] (式中,Ar為芳香族環基, A為具有啶骨架之基, B -為1價陰離子, R 1及R 2分別獨立地表示氫原子、鹵素原子、硝基、氰基、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-1之二價基之基, 取代上述具有取代基之脂肪族烴基、上述具有取代基之含芳香族烴環之基及上述具有取代基之含雜環基中之一個以上氫原子的取代基為選自下述群II-1之原子或基; 群I-1:-O-、-COO-、-OCO-、-CO-、-CO-CO-、-CO-CO-O-、-CS-、-S-、-SO-、-SO 2-、-NR'-、-NR'-CO-、-CO-NR'-、-NR'-COO-、-OCO-NR'-或-SiR'R''-; 群II-1:鹵素原子、氰基、硝基、-CO-H、-OH、-SH、-NH 2、-C(R')=N-OH、-COOH或-SO 3H; R'及R''分別獨立地表示氫原子或未經取代之脂肪族烴基,於存在複數個R'或R''之情形時,其等可相同亦可不同) That is, the present invention provides a composition comprising a cyclic ether component, a thiol component, and a compound represented by the following general formula (1). (wherein Ar is an aromatic ring group, A is a a pyridine skeleton, B- is a monovalent anion, R1 and R2 each independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group, an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-1, and the substituent replacing one or more hydrogen atoms in the aliphatic alkyl group having a substituent, the aromatic alkyl group having a substituent and the heterocyclic group having a substituent is an atom or group selected from the following group II-1; Group I-1: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO 2 -, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'-, or -SiR'R''-; Group II-1: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , -C(R')=N-OH, -COOH, or -SO 3 H; R' and R'' independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group. When there are plural R' or R'', they may be the same or different)
根據本發明之組合物,成為保存穩定性及低溫接著性之平衡性優異者。The composition of the present invention has an excellent balance between storage stability and low-temperature adhesion.
於本發明中,較佳為上述芳香族環基Ar為下述通式(Ara1)、(Arb1)或(Arc1)所表示之芳香族環基。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the present invention, the aromatic ring group Ar is preferably an aromatic ring group represented by the following general formula (Ara1), (Arb1) or (Arc1). The reason is that the above composition will have a better balance between storage stability and low-temperature adhesion.
[化2] (式中,Y 1為硫原子、CO、SO、SO 2、CR 101 2、PR 102或NR 102, Y 2為單鍵、氧原子、硫原子、CO、SO、SO 2、CR 102 2、PR 102或NR 101, Y 3為氧原子、硫原子、CO、SO、SO 2、CR 102 2、PR 102或NR 101, R 101分別獨立地表示碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-2之二價基之基, R 102分別獨立地表示氫原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、或碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-2之二價基之基, R 31、R 32、R 41、R 42、R 51、R 52及R 53分別獨立地表示鹵素原子、硝基、氰基、-OR 121、-COR 121、-OCOR 121、-COOR 121、-SR 121、-SOR 121、-SO 2R 121、-NR 122R 123、-NR 122COR 123、-CONR 122R 123、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-2之二價基之基, 但是,複數個R 41可相互鍵結而形成環,該環未經取代或具有取代基, R 121、R 122及R 123分別獨立地表示氫原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、或碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-2之二價基之基,於R 121、R 122或R 123各存在複數個之情形時,其等可相同亦可不同, 取代上述具有取代基之脂肪族烴基、上述具有取代基之含芳香族烴環之基、上述具有取代基之含雜環基、及複數個R 41相互鍵結而形成之環中之一個以上氫原子的取代基為選自下述群II-2之原子或基, a1為0~5之整數, a2為0~4之整數, b1為0~4之整數, b2為0~3之整數, c1為0~4之整數, c2為0~1之整數, *表示鍵結部位; 群I-2:-O-、-COO-、-OCO-、-CO-、-CO-CO-、-CO-CO-O-、-CS-、-S-、-SO-、-SO 2-、-NR'-、-NR'-CO-、-CO-NR'-、-NR'-COO-、-OCO-NR'-或-SiR'R''-; 群II-2:鹵素原子、氰基、硝基、-CO-H、-OH、-SH、-NH 2、-C(R')=N-OH、-COOH或-SO 3H; R'及R''分別獨立地表示氫原子或未經取代之脂肪族烴基,於存在複數個R'或R''之情形時,其等可相同亦可不同) [Chemistry 2] ( wherein, Y1 is a sulfur atom, CO, SO, SO2 , CR1012 , PR102 or NR102 , Y2 is a single bond, an oxygen atom, a sulfur atom, CO, SO, SO2, CR1022 , PR102 or NR101 , Y3 is an oxygen atom, a sulfur atom, CO, SO, SO2 , CR1022 , PR102 or NR101 , R 101 each independently represents an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-2, R R102 each independently represents a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, or an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-2; R31 , R32 , R41 , R42 , R51 , R52 and R53 each independently represent a halogen atom, a nitro group, a cyano group, -OR121 , -COR121 , -OCOR121 , -COOR121 , -SR121 , -SOR 121 , -SO 2 R 121 , -NR 122 R 123 , -NR 122 COR 123 , -CONR 122 R 123 , an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-2, However, a plurality of R 41 may be bonded to each other to form a ring, and the ring is unsubstituted or substituted, R 121 , R 122 and R R121 , R122 or R123 each independently represent a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, or an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the above-mentioned aliphatic alkyl group, the above-mentioned aromatic alkyl group or the above-mentioned heterocyclic group are substituted with a divalent group selected from the following group I-2. When there are plural numbers of R121 , R122 or R123, they may be the same or different. The above-mentioned aliphatic alkyl group having a substituent, the above-mentioned aromatic alkyl group having a substituent, the above-mentioned heterocyclic group having a substituent, and the plural numbers of R121, R122 or R123 may be substituted with a divalent group selected from the following group I-2. The substituents of one or more hydrogen atoms in the ring formed by mutual bonding of 41 are atoms or groups selected from the following Group II-2, a1 is an integer of 0 to 5, a2 is an integer of 0 to 4, b1 is an integer of 0 to 4, b2 is an integer of 0 to 3, c1 is an integer of 0 to 4, c2 is an integer of 0 to 1, * represents a bonding site; Group I-2: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO 2 -, -NR'-, -NR'--CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R''-; Group II-2: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , -C(R')=N-OH, -COOH or -SO 3 H; R' and R'' each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group; when there are multiple R' or R'', they may be the same or different)
於本發明中,較佳為上述環狀醚成分之含量於上述環狀醚成分及上述硫醇成分之合計100質量份中為20質量份以上80質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the present invention, the content of the cyclic ether component is preferably 20 parts by mass or more and 80 parts by mass or less in 100 parts by mass of the total of the cyclic ether component and the thiol component. The reason for this is that the composition has a better balance between storage stability and low-temperature adhesion.
於本發明中,較佳為上述通式(1)所表示之化合物之含量於上述環狀醚成分、上述硫醇成分及上述通式(1)所表示之化合物之合計100質量份中為3質量份以上15質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the present invention, it is preferred that the content of the compound represented by the general formula (1) is 3 parts by mass or more and 15 parts by mass or less in the total of 100 parts by mass of the cyclic ether component, the thiol component and the compound represented by the general formula (1). The reason for this is that the composition has a better balance between storage stability and low-temperature adhesiveness.
於本發明中,較佳為上述通式(1)所表示之化合物之含量於上述硫醇成分及上述通式(1)所表示之化合物之合計100質量份中為5質量份以上30質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the present invention, it is preferred that the content of the compound represented by the general formula (1) is 5 parts by mass or more and 30 parts by mass or less in 100 parts by mass of the total of the thiol component and the compound represented by the general formula (1). The reason for this is that the above composition has a better balance between storage stability and low-temperature adhesion.
於本發明中,較佳為上述環狀醚成分包含環氧化合物。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the present invention, it is preferred that the cyclic ether component comprises an epoxy compound because the composition has a better balance between storage stability and low-temperature adhesion.
於本發明中,較佳為上述環氧化合物包含芳香族環氧化合物。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the present invention, it is preferred that the epoxy compound comprises an aromatic epoxy compound because the composition has a better balance between storage stability and low-temperature adhesion.
於本發明中,較佳為上述硫醇成分為具有2個以上一級硫醇基之化合物。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the present invention, it is preferred that the thiol component is a compound having two or more primary thiol groups, because the composition has a better balance between storage stability and low-temperature adhesion.
於本發明中,較佳為上述組合物包含自由基聚合性成分。其原因在於:上述組合物存在保存穩定性及低溫接著性之平衡性更優異之情況,能夠提高接著條件之自由度。In the present invention, it is preferred that the composition contains a free radical polymerizable component because the composition has a better balance between storage stability and low-temperature adhesiveness, and can increase the degree of freedom of adhesive conditions.
本發明提供一種上述組合物之硬化物。 根據本發明,係使用上述組合物而使用者,因而會成為於所需處於不引起周邊構件之劣化之情況下充分地接著者。 The present invention provides a cured product of the above-mentioned composition. According to the present invention, the above-mentioned composition is used and thus becomes a product that can be sufficiently bonded without causing deterioration of surrounding components as required.
本發明提供一種具有使組合物硬化之硬化步驟的硬化物之製造方法。 根據本發明,係使用上述組合物而形成者,因而能夠獲得於所需處於不引起周邊構件之劣化之情況下充分地接著的硬化物。 [發明之效果] The present invention provides a method for manufacturing a hardened product having a hardening step of hardening a composition. According to the present invention, a hardened product that is formed using the above-mentioned composition can be obtained, which is in a desired state without causing deterioration of peripheral components. [Effect of the invention]
本發明提供一種保存穩定性及低溫接著性之平衡性優異之組合物及其硬化物以及使用其之硬化物之製造方法。The present invention provides a composition having an excellent balance between storage stability and low-temperature adhesion, a cured product thereof, and a method for producing the cured product using the composition.
本發明係關於一種組合物、使用其之硬化物及硬化物之製造方法。The present invention relates to a composition, a cured product using the composition and a method for producing the cured product.
A.組合物 首先,針對本發明之組合物進行說明。 本發明之組合物係包含環狀醚成分、硫醇成分及上述通式(1)所表示之化合物者。 A. Composition First, the composition of the present invention is described. The composition of the present invention comprises a cyclic ether component, a thiol component and a compound represented by the above general formula (1).
根據本發明,藉由含有通式(1)所表示之化合物(以下,有時稱為化合物1)、硫醇成分及環狀醚成分,可獲得保存穩定性及低溫接著性優異之組合物。 再者,「保存穩定性」係指曝光前之硫醇成分及環狀醚成分之反應進展得到抑制。關於保存穩定性,例如可將化合物1、硫醇成分及環狀醚成分加以混合而形成組合物,根據經過特定時間前後之黏度上升之程度來確認。 此處,關於藉由具有上述特定構成會發揮出上述效果之原因,推測如下。 According to the present invention, a composition having excellent storage stability and low-temperature adhesion can be obtained by containing a compound represented by general formula (1) (hereinafter, sometimes referred to as compound 1), a thiol component and a cyclic ether component. In addition, "storage stability" means that the reaction progress of the thiol component and the cyclic ether component before exposure is suppressed. Regarding storage stability, for example, compound 1, a thiol component and a cyclic ether component are mixed to form a composition, and the viscosity can be confirmed before and after a specific period of time. Here, the reason why the above effect is exerted by having the above specific structure is speculated as follows.
通式(1)所表示之化合物中之Ar所表示之芳香族環基對可見光以下之區域之光之吸收性優異,並且具有啶骨架之基容易脫離。 又,啶骨架具有如下雜環式三級胺結構:與氮原子鍵結之3個烷基鏈分別形成環結構,且包含1個氮原子作為環骨架形成原子。藉由具有此種結構,具有啶骨架之基於與芳香族環基Ar鍵結時,例如於以組合物之形式與環氧化合物等之環狀醚成分、硫醇成分等一起併用時,可抑制與環狀醚成分、硫醇成分之反應,而發揮優異之保存穩定性。又,具有啶骨架之基於自芳香族環基Ar脫離時,成為氮原子上之非共用電子對周邊之位阻較小之鹼基,會發揮優異之親核性。又,藉由啶骨架結構,例如能夠有效率地發揮由鹼基所產生之觸媒作用等,會成為聚合觸媒能力優異者。 根據此種情況,於將化合物1與環狀醚成分及硫醇成分併用時,能夠於所需時點使環狀醚成分及硫醇成分之硬化反應開始,從而有效率地使硬化反應進行,且能夠發揮低溫接著性。 又,上述組合物會成為接著條件之自由度優異者,即便於50℃以上100℃以下之低溫下亦會使硬化反應快速地進行從而發揮出較高之接著力,進而,藉由設為0℃以上50℃以下之類之室溫附近之溫度區域,能夠使硬化反應緩慢地進行從而發揮出較高之接著力等。進而,本發明之組合物藉由將化合物1與硫醇成分及環狀醚成分加以組合而成為接著性良好者。由於該等原因,本發明之組合物會成為保存穩定性及低溫接著性優異者。進而,成為接著條件之自由度優異者。 The aromatic ring group represented by Ar in the compound represented by general formula (1) has excellent absorption of light in the region below visible light and has The base of the pyridine skeleton is easily detached. The pyridine skeleton has a heterocyclic tertiary amine structure: three alkyl chains bonded to the nitrogen atom each form a ring structure, and one nitrogen atom is included as a ring skeleton forming atom. By having such a structure, When the pyridine skeleton is bonded to an aromatic cyclic group Ar, when used in combination with a cyclic ether component such as an epoxy compound or a thiol component, the reaction with the cyclic ether component or the thiol component can be suppressed, thereby exhibiting excellent storage stability. When the pyridine skeleton is detached from the aromatic ring group Ar, the non-shared electrons on the nitrogen atom become the base group with less steric hindrance to the surrounding area, which will exert excellent nucleophilicity. The pyridine skeleton structure, for example, can efficiently exert the catalytic effect generated by the base group, and will become a polymerizing catalyst with excellent ability. According to this situation, when the compound 1 is used together with the cyclic ether component and the thiol component, the curing reaction of the cyclic ether component and the thiol component can be started at a desired time, thereby efficiently allowing the curing reaction to proceed, and low-temperature adhesion can be exerted. In addition, the above composition has excellent freedom in bonding conditions, and even at a low temperature of 50°C to 100°C, the curing reaction can proceed quickly, thereby exerting a higher bonding force. Furthermore, by setting the temperature to a temperature range near room temperature such as 0°C to 50°C, the curing reaction can proceed slowly, thereby exerting a higher bonding force. Furthermore, the composition of the present invention has good bonding properties by combining compound 1 with a thiol component and a cyclic ether component. For these reasons, the composition of the present invention has excellent storage stability and low-temperature bonding properties. Furthermore, it has excellent freedom in bonding conditions.
以下針對本發明之組合物之各成分詳細地進行說明。The following is a detailed description of each component of the composition of the present invention.
1.化合物1 本發明中所使用之化合物1為下述通式(1)所表示者。 1. Compound 1 The compound 1 used in the present invention is represented by the following general formula (1).
[化3] [Chemistry 3]
(式中,Ar為芳香族環基, A為具有啶骨架之基, B -為1價陰離子, R 1及R 2分別獨立地表示氫原子、鹵素原子、硝基、氰基、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-1之二價基之基, 取代上述具有取代基之脂肪族烴基、上述具有取代基之含芳香族烴環之基及上述具有取代基之含雜環基中之一個以上氫原子的取代基為選自下述群II-1之原子或基; 群I-1:-O-、-COO-、-OCO-、-CO-、-CO-CO-、-CO-CO-O-、-CS-、-S-、-SO-、-SO 2-、-NR'-、-NR'-CO-、-CO-NR'-、-NR'-COO-、-OCO-NR'-或-SiR'R''-; 群II-1:鹵素原子、氰基、硝基、-CO-H、-OH、-SH、-NH 2、-C(R')=N-OH、-COOH或-SO 3H; R'及R''分別獨立地表示氫原子或未經取代之脂肪族烴基,於存在複數個R'或R''之情形時,其等可相同亦可不同) (wherein Ar is an aromatic ring group, A is a a pyridine skeleton, B- is a monovalent anion, R1 and R2 each independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group, an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-1, and the substituent replacing one or more hydrogen atoms in the aliphatic alkyl group having a substituent, the aromatic alkyl group having a substituent and the heterocyclic group having a substituent is an atom or group selected from the following group II-1; Group I-1: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO 2 -, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'-, or -SiR'R''-; Group II-1: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , -C(R')=N-OH, -COOH, or -SO 3 H; R' and R'' independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group. When there are plural R' or R'', they may be the same or different)
作為上述R 1、R 2所表示之鹵素原子及群II-1中之鹵素原子(以下,亦稱為「R 1等中所使用之鹵素原子」),可例舉:氟原子、氯原子、溴原子、碘原子等。 Examples of the halogen atom represented by R 1 and R 2 and the halogen atom in Group II-1 (hereinafter also referred to as "halogen atom used in R 1 , etc.") include fluorine atom, chlorine atom, bromine atom, iodine atom and the like.
作為通式(1)中之R 1、R 2所表示之碳原子數1~20之未經取代或具有取代基之脂肪族烴基(以下,亦總稱為「R 1等中所使用之脂肪族烴基」),只要為不含芳香族烴環或雜環者即可,例如可例舉:碳原子數1~20之烷基、碳原子數2~20之烯基、碳原子數3~20之環烷基、碳原子數4~20之環烷基烷基及該等基之1個或2個以上氫原子經下文所述之取代基取代的基等。 The unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms represented by R 1 and R 2 in the general formula (1) (hereinafter also collectively referred to as "aliphatic alkyl group used in R 1 , etc.") may be any group as long as it does not contain an aromatic hydrocarbon ring or a heterocyclic ring, and examples thereof include an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms, a cycloalkylalkyl group having 4 to 20 carbon atoms, and groups in which one or more hydrogen atoms of these groups are substituted by a substituent described below.
作為上述R 1等中所使用之碳原子數1~20之烷基,可例舉:甲基、乙基、丙基、異丙基、丁基、第二丁基、第三丁基、異丁基、戊基、異戊基、第三戊基、環戊基、己基、2-己基、3-己基、環己基、4-甲基環己基、庚基、2-庚基、3-庚基、異庚基、第三庚基、1-辛基、異辛基、第三辛基、金剛烷基等。 Examples of the alkyl group having 1 to 20 carbon atoms used in the above R1 and the like include methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, t-butyl, isobutyl, pentyl, isopentyl, t-pentyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, t-heptyl, 1-octyl, isooctyl, t-octyl, and adamantyl.
作為上述R 1等中所使用之碳原子數2~20之烯基,例如可例舉:乙烯基、伸乙基、2-丙烯基、3-丁烯基、2-丁烯基、4-戊烯基、3-戊烯基、2-己烯基、3-己烯基、5-己烯基、2-庚烯基、3-庚烯基、4-庚烯基、3-辛烯基、3-壬烯基、4-癸烯基、3-十一碳烯基、4-十二碳烯基及4,8,12-十四烷三烯基烯丙基、環戊二烯基等。 Examples of the alkenyl group having 2 to 20 carbon atoms used in the above R1 and the like include vinyl, ethylidene, 2-propenyl, 3-butenyl, 2-butenyl, 4-pentenyl, 3-pentenyl, 2-hexenyl, 3-hexenyl, 5-hexenyl, 2-heptenyl, 3-heptenyl, 4-heptenyl, 3-octenyl, 3-nonenyl, 4-decenyl, 3-undecenyl, 4-dodecenyl, 4,8,12-tetradecatrienyl, allyl, and cyclopentadienyl.
上述R 1等中所使用之碳原子數3~20之環烷基意指具有3~20之碳原子之飽和單環式或飽和多環式烷基。作為上述碳原子數3~20之環烷基,例如可例舉:環丙基、環丁基、環戊基、環己基、環庚基、環辛基、環壬基、環癸基、金剛烷基、十氫萘基、八氫并環戊二烯及二環[1.1.1]戊基等。 The cycloalkyl group having 3 to 20 carbon atoms used in the above R1 etc. means a saturated monocyclic or polycyclic alkyl group having 3 to 20 carbon atoms. Examples of the cycloalkyl group having 3 to 20 carbon atoms include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl, adamantyl, decahydronaphthyl, octahydropentaene and bicyclo[1.1.1]pentyl.
上述R 1等中所使用之碳原子數4~20之環烷基烷基意指烷基之氫原子被環烷基取代之碳原子數4~20之基。作為上述碳原子數4~20之環烷基烷基,例如可例舉:環丙基甲基、2-環丁基乙基、3-環戊基丙基、4-環己基丁基、環庚基甲基、環辛基甲基、2-環壬基乙基、2-環癸基乙基、3-3-金剛烷基丙基及十氫萘基丙基等。 The cycloalkylalkyl group having 4 to 20 carbon atoms used in the above R1 etc. means a group having 4 to 20 carbon atoms in which the hydrogen atom of the alkyl group is substituted by a cycloalkyl group. Examples of the above cycloalkylalkyl group having 4 to 20 carbon atoms include cyclopropylmethyl, 2-cyclobutylethyl, 3-cyclopentylpropyl, 4-cyclohexylbutyl, cycloheptylmethyl, cyclooctylmethyl, 2-cyclononylethyl, 2-cyclodecylethyl, 3-3-adamantylpropyl and decahydronaphthylpropyl.
於本發明中,關於基之碳原子數,於基中之氫原子被取代基取代之情形時,規定為氫原子被取代後之基之碳原子數。例如於上述碳原子數1~20之烷基之氫原子被取代基取代之情形時,碳原子數1~20係指氫原子被取代基取代後之碳原子數,並非指氫原子被取代前之碳原子數。 又,於本發明中,關於特定碳原子數之基中之亞甲基被取代為二價基之基之碳原子數之規定,其取代前之基之碳原子數之規定與其取代前之基之碳原子數之規定相同。例如,本說明書中,碳原子數1~20之烷基中之亞甲基被取代為二價基之基之碳原子數係視為1~20。 In the present invention, regarding the number of carbon atoms in a group, when a hydrogen atom in the group is replaced by a substituent, it is defined as the number of carbon atoms in the group after the hydrogen atom is replaced. For example, in the case where a hydrogen atom in the above-mentioned alkyl group with 1 to 20 carbon atoms is replaced by a substituent, the number of carbon atoms of 1 to 20 refers to the number of carbon atoms after the hydrogen atom is replaced by the substituent, and does not refer to the number of carbon atoms before the hydrogen atom is replaced. In addition, in the present invention, regarding the definition of the number of carbon atoms in a group with a specific number of carbon atoms, the definition of the number of carbon atoms in the group before the substitution is the same as the definition of the number of carbon atoms in the group before the substitution. For example, in this specification, the number of carbon atoms in a group with 1 to 20 carbon atoms, when a methylene group in a group with a specific number of carbon atoms is replaced by a divalent group, is considered to be 1 to 20.
又,於本發明中,通式中可能存在一分子中存在複數個相同符號之基之情況(例如R'等),於此情形時,相同符號之複數個基相同之情形及不相同之情形均包含於本發明中。Furthermore, in the present invention, there may be a situation where a plurality of groups with the same symbol exist in one molecule in the general formula (such as R', etc.). In this case, the situation where the plurality of groups with the same symbol are the same or different is included in the present invention.
作為通式(1)中之R 1、R 2所表示之碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基(以下,亦總稱為「R 1等所表示之含芳香族烴環之基」),只要為包含芳香族烴環、不含雜環者即可,例如可例舉:碳原子數6~20之芳基、碳原子數7~20之芳烷基、不飽和脂肪族烴基經芳基取代之碳原子數6~20之基以及該等基之1個或2個以上氫原子經下文所述之取代基取代的基等。再者,於本說明書中,「碳原子數6~20之含芳香族烴環之基」規定「含芳香族烴環之基」而非「芳香族烴環」之碳原子數。其他碳原子數之情況亦相同。 The unsubstituted or substituted aromatic hydrocarbon ring-containing group having 6 to 20 carbon atoms represented by R 1 and R 2 in the general formula (1) (hereinafter also collectively referred to as "aromatic hydrocarbon ring-containing group represented by R 1 , etc.") may contain an aromatic hydrocarbon ring and not contain a heterocyclic ring, and examples thereof include an aryl group having 6 to 20 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, a group having 6 to 20 carbon atoms in which an unsaturated aliphatic hydrocarbon group is substituted by an aryl group, and a group in which one or more hydrogen atoms of the group are substituted by a substituent described below. In the present specification, "aromatic hydrocarbon ring-containing group having 6 to 20 carbon atoms" specifies the carbon number of the "aromatic hydrocarbon ring-containing group" rather than the carbon number of the "aromatic hydrocarbon ring". The same applies to other numbers of carbon atoms.
作為上述R 1等中所使用之碳原子數6~20之芳基,為具有芳香族性之基,除可例舉苯基等自單環之芳香族環除去1個氫原子而得之基(以下,有時稱為單環芳香族環基)及萘基、蒽基、菲基、芘基、茀基等自單環之芳香族環之縮合環除去1個氫原子而得之基(以下,有時稱為縮合芳香族烴基)、或聯苯、二苯甲酮等自2個以上單環之芳香族環及其縮合環經由單鍵、羰基(-CO-)或硫醚基(-S-)等連結基鍵結之而成的化合物除去1個以上氫原子而得之基(以下,有時稱為連結芳香族烴基)以外,還可例舉甲苯基等之類的該等芳香族環中之氫原子被取代為脂肪族烴基之基。作為取代芳基之芳香族環中之氫原子之脂肪族烴基,可例舉與上述作為R 1等所表示之脂肪族烴基而例示者相同之基。 The aryl group having 6 to 20 carbon atoms used in the above R1 etc. is a group having aromatic properties, and examples thereof include a group obtained by removing one hydrogen atom from a monocyclic aromatic ring such as phenyl (hereinafter sometimes referred to as a monocyclic aromatic cyclic group), and a group obtained by removing one hydrogen atom from a condensed ring of a monocyclic aromatic ring such as naphthyl, anthracenyl, phenanthrenyl, pyrenyl, fluorenyl, etc. (hereinafter sometimes referred to as a condensed aromatic alkyl group), In addition to a compound obtained by removing one or more hydrogen atoms from two or more monocyclic aromatic rings and their condensed rings bonded via a single bond, a carbonyl group (-CO-) or a sulfide group (-S-) such as biphenyl or benzophenone (hereinafter, sometimes referred to as a bonded aromatic alkyl group), a group in which the hydrogen atom in the aromatic ring is substituted with an aliphatic alkyl group such as tolyl can be exemplified. As the aliphatic alkyl group that replaces the hydrogen atom in the aromatic ring of the aryl group, the same groups as those exemplified above as the aliphatic alkyl group represented by R1 etc. can be exemplified.
作為上述R 1等中所使用之碳原子數7~20之芳烷基,可例舉上述烷基中之1個或2個以上氫原子被上述芳基取代之基等,例如可例舉:苄基、茀基、茚基、9-茀基甲基、α-甲基苄基、α,α-二甲基苄基、苯基乙基及萘基丙基或該等之環中之氫原子經脂肪族烴基取代之基等。作為取代芳烷基中之烷基及芳烷基之氫原子的脂肪族烴基,可例舉與上述作為R 1等所表示之碳原子數1~20之脂肪族烴基而例示者相同之基。 作為上述不飽和脂肪族烴基經芳基取代之碳原子數6~20之基,可例舉上述烯基之1個或2個以上氫原子被上述芳基取代之基等。 Examples of the aralkyl group having 7 to 20 carbon atoms used in the above R1 etc. include groups in which one or more hydrogen atoms in the above alkyl group are substituted by the above aryl group, such as benzyl, fluorenyl, indenyl, 9-fluorenylmethyl, α-methylbenzyl, α,α-dimethylbenzyl, phenylethyl and naphthylpropyl, or groups in which the hydrogen atoms in the rings of these groups are substituted by aliphatic alkyl groups. Examples of the aliphatic alkyl group that replaces the hydrogen atoms of the alkyl group and the aralkyl group in the aralkyl group include the same groups as those exemplified above as the aliphatic alkyl group having 1 to 20 carbon atoms represented by R1 etc. Examples of the unsaturated aliphatic alkyl group having 6 to 20 carbon atoms substituted with an aryl group include a group in which one or two or more hydrogen atoms of the alkenyl group are substituted with the aryl group.
作為通式(1)中之R 1、R 2所表示之碳原子數2~20之未經取代或具有取代基之含雜環基(以下,亦總稱為「R 1等所表示之含雜環基」),除四氫呋喃基、二氧戊環基、四氫吡喃基、𠰌啉基呋喃基、噻吩基、甲基噻吩基、己基噻吩基、苯并噻吩基、吡咯基、吡咯啶基、咪唑基、咪唑啶基、咪唑啉基、吡唑基、吡唑啶基、哌啶基及哌𠯤基等之雜環或雜環之1個或2個以上氫原子被取代為脂肪族烴基之基、以及脂肪族烴基之1個或2個以上氫原子被雜環取代之基以外,還可例舉該等基之1個或2個以上氫原子被下文所述之取代基取代的基等。 又,雜環亦包括吲哚環、喹啉環、苯并呋喃環、咔唑環、𠮿環、9-氧硫𠮿環等雜環與芳香族烴環之縮合環(以下,有時稱為縮合雜環)。 作為該脂肪族烴基,可例舉上述作為R 1等所表示之脂肪族烴基而例示者。 再者,於本說明書中,「碳原子數2~20之含雜環基」中之「2~20」規定「含雜環基」而非「雜環」之碳原子數。其他碳原子數之情形亦相同。 The unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms (hereinafter also collectively referred to as "R 1 , etc.), in addition to tetrahydrofuranyl, dioxolanyl, tetrahydropyranyl, oxazolidinyl, thienyl, methylthienyl, hexylthienyl, benzothienyl, pyrrolyl, pyrrolidinyl, imidazolyl, imidazolidinyl, imidazolinyl, pyrazolyl, pyrazolidinyl, piperidinyl, piperidine, etc., or groups in which one or two or more hydrogen atoms of the heterocyclic ring are substituted with aliphatic alkyl groups, and groups in which one or two or more hydrogen atoms of the aliphatic alkyl groups are substituted with heterocyclic rings, groups in which one or two or more hydrogen atoms of the groups are substituted with substituents described below can be exemplified. Furthermore, the heterocyclic ring also includes an indole ring, a quinoline ring, a benzofuran ring, a carbazole ring, Cyclosulfuron A condensed ring of a heterocyclic ring such as a cyclopentane ring and an aromatic hydrocarbon ring (hereinafter, sometimes referred to as a condensed heterocyclic ring). As the aliphatic alkyl group, the aliphatic alkyl groups exemplified above as R1 , etc. can be cited. Furthermore, in this specification, "2 to 20" in "a heterocyclic group having 2 to 20 carbon atoms" specifies the number of carbon atoms in the "heterocyclic group" rather than the "heterocyclic group". The same applies to other numbers of carbon atoms.
於上述脂肪族烴基、含芳香族烴環之基或含雜環基之2個以上亞甲基被取代為選自上述群I-1之二價基之基中,複數個該二價基可相互相同亦可不同,氧原子彼此、硫原子彼此或氧原子與硫原子不相鄰,選自群I-1之任意二價基亦可不相鄰。再者,此種情況於下述群I-2、群I-3以及其他二價基之群中相同。In the case where two or more methylene groups of the above-mentioned aliphatic alkyl group, aromatic alkyl ring-containing group or heterocyclic group are substituted with divalent groups selected from the above-mentioned group I-1, the plurality of divalent groups may be the same or different, and the oxygen atoms, sulfur atoms or oxygen atoms and sulfur atoms are not adjacent to each other, and any divalent groups selected from group I-1 may not be adjacent to each other. This situation is the same in the following group I-2, group I-3 and other groups of divalent groups.
作為取代通式(1)所說明之脂肪族烴基、含芳香族烴環之基及含雜環基以及該等基中之1個或2個以上亞甲基被取代為選自上述群I-1之二價基之基中之氫原子的取代基,作為群II-1,可例舉鹵素原子、氰基、硝基、-CO-H、-OH、-SH、-NH 2、-C(R')=N-OH、-COOH及-SO 3H。 作為上述群II-1及群II-1中之R'及R''中所使用之未經取代之脂肪族烴基,可使用上述作為R 1等中所使用之脂肪族烴基而例舉者中碳原子數滿足R 1等之碳原子數者。具體而言,作為R'及R''中所使用之未經取代之脂肪族烴基,可使用碳原子數1~19之未經取代之脂肪族烴基。作為R'及R''中所使用之碳原子數1~19之未經取代之脂肪族烴基,可使用作為R 1等中所使用之脂肪族烴基於上述所例舉者中碳原子數為1~19者。 As the substituents for substituting the hydrogen atom in the aliphatic alkyl group, the aromatic alkyl ring-containing group and the heterocyclic group as described in the general formula (1) and one or more methylene groups in these groups are substituted with a divalent group selected from the above group I-1, as group II-1, there can be exemplified a halogen atom, a cyano group, a nitro group, -CO-H, -OH, -SH, -NH 2 , -C(R')=N-OH, -COOH and -SO 3 H. As the unsubstituted aliphatic alkyl group used in the above group II-1 and R' and R'' in group II-1, there can be used those exemplified above as the aliphatic alkyl group used in R 1 etc., as long as the number of carbon atoms satisfies the number of carbon atoms of R 1 etc. Specifically, as the unsubstituted aliphatic alkyl group used in R' and R'', an unsubstituted aliphatic alkyl group having 1 to 19 carbon atoms can be used. As the unsubstituted aliphatic alkyl group having 1 to 19 carbon atoms used in R' and R'', an unsubstituted aliphatic alkyl group having 1 to 19 carbon atoms among the aliphatic alkyl groups used in R1 etc. can be used.
通式(1)中所使用之R 1及R 2較佳為分別獨立地為氫原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自上述群I-1之二價基之基。其原因在於:起因於化合物1之保存穩定性及聚合觸媒能力更優異,上述組合物會成為保存穩定性及低溫接著性更優異者。其中,更佳為通式(1)中所使用之R 1及R 2均為氫原子,或者R 1為氫原子,R 2為除氫原子以外之基。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果,上述組合物會成為保存穩定性及低溫接著性更優異者。 R1 and R2 used in the general formula (1) are preferably independently hydrogen atoms, unsubstituted or substituted aliphatic alkyl groups having 1 to 20 carbon atoms, unsubstituted or substituted aromatic hydrocarbon-containing groups having 6 to 20 carbon atoms, unsubstituted or substituted heterocyclic groups having 2 to 20 carbon atoms, or groups in which one or more methylene groups in the aliphatic alkyl groups, aromatic hydrocarbon-containing groups, or heterocyclic groups are substituted with divalent groups selected from the above group I-1. The reason for this is that the storage stability and polymerization catalytic ability of the compound 1 are better, and the above composition will be better in storage stability and low-temperature adhesion. It is more preferred that both R1 and R2 used in the general formula (1) are hydrogen atoms, or R1 is a hydrogen atom and R2 is a group other than a hydrogen atom. The reason is that the storage stability and polymerization catalytic ability of the compound 1 are better, and as a result, the above-mentioned composition will become one with better storage stability and low-temperature adhesion.
其中R 2較佳為氫原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、或者上述脂肪族烴基或上述含芳香族烴環之基中之一個以上亞甲基被取代為選自群I-1之二價基之基,更佳為氫原子、碳原子數1~10之未經取代或具有取代基之脂肪族烴基、碳原子數6~10之未經取代或具有取代基之含芳香族烴環之基、或者該脂肪族烴基或該含芳香族烴環之基中之一個以上亞甲基被取代為選自群I-1之二價基之基,其中較佳為氫原子、碳原子數1~10之未經取代或具有取代基之烷基、碳原子數6~10之未經取代或具有取代基之芳基、或者該烷基或該芳基中之一個以上亞甲基被取代為選自群I-1之二價基之基,特別是尤佳為氫原子、碳原子數1~5之未經取代或具有取代基之烷基、碳原子數6~10之未經取代或具有取代基之苯環含有基、或者該烷基或該苯環含有基中之一個以上亞甲基被取代為選自群I-1之二價基之基,進而更佳為氫原子、未經取代或具有取代基之甲基或乙基、或者未經取代或具有取代基之苯基,最佳為氫原子、未經取代之甲基或乙基或者未經取代之苯基。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 R2 is preferably a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic hydrocarbon group having 6 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group or the aromatic hydrocarbon group are substituted with a divalent group selected from Group I-1, and more preferably a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 10 carbon atoms, an unsubstituted or substituted aromatic hydrocarbon group having 6 to 10 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group or the aromatic hydrocarbon group are substituted with a divalent group selected from Group I-1, and more preferably a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 10 carbon atoms, an unsubstituted or substituted aromatic hydrocarbon group having 6 to 10 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group or the aromatic hydrocarbon group are substituted with a divalent group selected from Group I-1, and more preferably a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 10 carbon atoms, an unsubstituted or substituted aromatic hydrocarbon group having 6 to 10 carbon atoms, An alkyl group which is substituted or has a substituent, an aryl group which is unsubstituted or has a substituent and has 6 to 10 carbon atoms, or a group in which one or more methylene groups in the alkyl group or the aryl group are substituted with a divalent group selected from Group I-1, particularly preferably a hydrogen atom, an alkyl group which is unsubstituted or has a substituent and has 1 to 5 carbon atoms, a benzene ring-containing group which is unsubstituted or has a substituent and has 6 to 10 carbon atoms, or a group in which one or more methylene groups in the alkyl group or the benzene ring-containing group are substituted with a divalent group selected from Group I-1, further preferably a hydrogen atom, an unsubstituted or substituted methyl or ethyl group, or an unsubstituted or substituted phenyl group, and most preferably a hydrogen atom, an unsubstituted methyl or ethyl group, or an unsubstituted phenyl group. The reason is that compound 1 has better storage stability and polymerization catalytic ability, and as a result, the above composition has better storage stability and low-temperature adhesion.
通式(1)之A中所使用之具有啶骨架之基中之啶骨架係包含1個氮原子作為環骨架形成雜原子且與該氮原子鍵結之3個烷基鏈分別形成環結構的雜環式三級胺結構。A所表示之具有啶骨架之基具有啶環或啶環與其他環之縮合環。就化合物1之保存穩定性及聚合觸媒能力之平衡性之方面而言,尤佳為A所表示之具有啶骨架之基藉由啶環之氮原子上之非共用電子對與通式(1)之-CR 1R 2-鍵結。尤其是化合物1較佳為A所表示之具有啶骨架之基為下述通式(A1)或通式(A2)所表示之基。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 The compound used in A of the general formula (1) has In the base of the pyridine skeleton The pyridine skeleton is a heterocyclic tertiary amine structure containing one nitrogen atom as a heteroatom forming a ring skeleton and three alkyl chains bonded to the nitrogen atom forming a ring structure. The base of the pyridine skeleton has Pyridine or In terms of the balance between the storage stability and polymerization catalytic ability of the compound 1, the compound represented by A having The base of the pyridine skeleton is The unshared electron pair on the nitrogen atom of the pyridine ring is bonded to -CR 1 R 2 - of the general formula (1). In particular, the compound 1 is preferably represented by A having The base of the pyridine skeleton is a base represented by the following general formula (A1) or general formula (A2). The reason is that the storage stability and polymerization catalytic ability of compound 1 are better, and as a result, the above composition will become one with better storage stability and low-temperature adhesion.
[化4] (式中,R 11、R 12、R 13、R 14、R 15、R 16、R 17、R 18及R 19(以下、「R 11~R 19」亦記載為)分別獨立地為氫原子、鹵素原子、硝基、氰基、-OR 111、-COR 111、-OCOR 111、-COOR 111、-SR 111、-SOR 111、-SO 2R 111、-NR 112R 113、-NR 112COR 113、-CONR 112R 113、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-3之二價基之基, 或者選自R 11~R 19之2個基相互連結而形成環, X 11及X 12分別獨立地為-CR 201R 202-所表示之二價基, R 111、R 112及R 113以及R 201及R 202分別獨立地表示氫原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、或碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自上述群I-3之二價基之基,於R 111、R 112、R 113、R 201及R 202各存在複數個之情形時,其等可相同亦可不同, 取代上述具有取代基之脂肪族烴基、上述具有取代基之含芳香族烴環之基及上述具有取代基之含雜環基中之一個以上氫原子的取代基為選自下述群II-3之原子或基, *表示鍵結部位; 群I-3:-O-、-COO-、-OCO-、-CO-、-CO-CO-、-CO-CO-O-、-CS-、-S-、-SO-、-SO 2-、-NR'-、-NR'-CO-、-CO-NR'-、-NR'-COO-、-OCO-NR'-或-SiR'R''-; 群II-3:鹵素原子、氰基、硝基、-CO-H、-OH、-SH、-NH 2、-C(R')=N-OH、-COOH或-SO 3H; R'及R''分別獨立地表示氫原子或未經取代之脂肪族烴基,於存在複數個R'或R''之情形時,其等可相同亦可不同) [Chemistry 4] (wherein, R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 and R 19 (hereinafter, "R 11 to R 19 " are also described as) are independently a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 111 , -COR 111 , -OCOR 111 , -COOR 111 , -SR 111 , -SOR 111 , -SO 2 R 111 , -NR 112 R 113 , -NR 112 COR 113 , -CONR 112 R 113 , an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-3, or two groups selected from R 11 to R 19 are linked to each other to form a ring, X 11 and X 12 are each independently a divalent group represented by -CR 201 R 202 -, R 111 , R 112 and R 113 as well as R 201 and R 19 are each independently a divalent group represented by -CR 201 R 202 -, R 111 , R 112 , R 113 , R 201 and R 202 each independently represent a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, or an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the above group I-3; when there are plural numbers of each of R 111 , R 112 , R 113 , R 201 and R 202 , they may be the same or different. The substituents replacing one or more hydrogen atoms in the above-mentioned aliphatic alkyl groups having a substituent, the above-mentioned aromatic alkyl ring-containing groups having a substituent and the above-mentioned heterocyclic ring-containing groups having a substituent are atoms or groups selected from the following Group II-3: * represents a bonding site; Group I-3: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO 2 -, -NR'-, -NR'--CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R''-; Group II-3: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , -C(R')=N-OH, -COOH or -SO 3 H; R' and R'' each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group. When there are multiple R' or R'', they may be the same or different.
[化5] (式中,R 21、R 22、R 23、R 24、R 25、R 26及R 27(以下、「R 21~R 27」亦記載為)分別獨立地為氫原子、鹵素原子、硝基、氰基、-OR 111、-COR 111、-OCOR 111、-COOR 111、-SR 111、-SOR 111、-SO 2R 111、-NR 112R 113、-NR 112COR 113、-CONR 112R 113、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-4之二價基之基, 或者 選自R 21~R 27之2個基相互連結而形成環, X 21及X 22分別獨立地為-CR 201R 202-所表示之二價基, R 111、R 112及R 113以及R 201及R 202分別獨立地表示氫原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-4之二價基之基,於R 111、R 112、R 113、R 201及R 202各存在複數個之情形時,其等可相同亦可不同, 取代上述具有取代基之脂肪族烴基、上述具有取代基之含芳香族烴環之基及上述具有取代基之含雜環基中之一個以上氫原子的取代基為選自下述群II-4之原子或基, X 23表示氧原子、=CR'R''或=N-OR'', R'R''分別獨立地表示氫原子或碳原子數1~20之未經取代之脂肪族烴基; *表示鍵結部位; 群I-4:-O-、-COO-、-OCO-、-CO-、-CO-CO-、-CO-CO-O-、-CS-、-S-、-SO-、-SO 2-、-NR'-、-NR'-CO-、-CO-NR'-、-NR'-COO-、-OCO-NR'-或-SiR'R''-; 群II-4:鹵素原子、氰基、硝基、-CO-H、-OH、-SH、-NH 2、-C(R')=N-OH、-COOH或-SO 3H; R'及R''分別獨立地表示氫原子或未經取代之脂肪族烴基,於存在複數個R'或R''之情形時,其等可相同亦可不同) [Chemistry 5] (wherein, R 21 , R 22 , R 23 , R 24 , R 25 , R 26 and R 27 (hereinafter, "R 21 to R 27 " are also described as) are independently a hydrogen atom, a halogen atom, a nitro group, a cyano group, -OR 111 , -COR 111 , -OCOR 111 , -COOR 111 , -SR 111 , -SOR 111 , -SO 2 R 111 , -NR 112 R 113 , -NR 112 COR 113 , -CONR 112 R 113 , an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-4, or two groups selected from R 21 to R 27 are linked to each other to form a ring, X 21 and X 22 are each independently a divalent group represented by -CR 201 R 202 -, R 111 , R 112 and R 113 as well as R 201 and R R 111 , R 112 , R 113 , R 201 and R 202 each independently represent a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-4; when there are plural numbers of each of R 111 , R 112 , R 113 , R 201 and R 202 , they may be the same or different. The substituents replacing one or more hydrogen atoms in the above-mentioned aliphatic alkyl groups having a substituent, the above-mentioned aromatic alkyl ring-containing groups having a substituent and the above-mentioned heterocyclic groups having a substituent are atoms or groups selected from the following Group II-4: X23 represents an oxygen atom, =CR'R'' or =N-OR'', R'R'' independently represent a hydrogen atom or an unsubstituted aliphatic alkyl group having 1 to 20 carbon atoms; * represents a bonding site; Group I-4: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO- O- , -CS-, -S-, -SO-, -SO2-, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R''-; Group II-4: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , -C(R')=N-OH, -COOH or -SO 3 H; R' and R'' independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group. When there are multiple R' or R'', they may be the same or different.
作為通式(A1)或(A2)之R 11~R 19、R 21~R 27、R 111、R 112及R 113以及R 201及R 202中所使用之鹵素原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、或碳原子數2~20之未經取代或具有取代基之含雜環基,分別可使用作為R 1等中所使用之鹵素原子、R 1等中所使用之脂肪族烴基、R 1等中所使用之含芳香族烴環之基、R 1等中所使用之含雜環基於上述所例舉者。 關於通式(A1)或(A2)之群I-3、I-4、II-3、II-4、X 23中所使用之R'或R'',可使用與群I-1、II-1等中所使用者相同之基。 As the halogen atom, the unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, the unsubstituted or substituted aromatic hydrocarbon ring-containing group having 6 to 20 carbon atoms, or the unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms used in R11 to R19, R21 to R27 , R111 , R112 and R113 and R201 and R202 in the general formula (A1) or (A2), the halogen atom used in R1 etc., the aliphatic alkyl group used in R1 etc., the aromatic hydrocarbon ring-containing group used in R1 etc., and the heterocyclic group used in R1 etc. can be those listed above. As R' or R'' used in Groups I-3, I-4, II-3, II-4, and X23 of the general formula (A1) or (A2), the same groups as those used in Groups I-1, II-1, etc. can be used.
作為通式(A1)中所使用之選自R 11~R 19之2個基相互連結而形成之環,可例舉脂肪族烴環及芳香族烴環等。作為脂肪族烴環,可例舉飽和脂肪族烴環或不飽和脂肪族烴環。作為飽和脂肪族烴環,可例舉:環己烷環、環戊烷環。作為不飽和脂肪族烴環,可例舉:環己烯環、環戊二烯環。作為芳香族烴環,可例舉:苯環。 作為通式(A2)中所使用之選自R 21~R 27之2個基相互連結而形成之環,可例舉:作為選自R 11等之2個基相互連結而形成之環於上述所例舉者。 Examples of the ring formed by two groups selected from R 11 to R 19 used in the general formula (A1) being linked to each other include aliphatic hydrocarbon rings and aromatic hydrocarbon rings. Examples of the aliphatic hydrocarbon ring include saturated aliphatic hydrocarbon rings or unsaturated aliphatic hydrocarbon rings. Examples of the saturated aliphatic hydrocarbon ring include cyclohexane ring and cyclopentane ring. Examples of the unsaturated aliphatic hydrocarbon ring include cyclohexene ring and cyclopentadiene ring. Examples of the aromatic hydrocarbon ring include benzene ring. Examples of the ring formed by two groups selected from R 21 to R 27 used in the general formula (A2) that are linked to each other include those exemplified above as the ring formed by two groups selected from R 11 , etc. that are linked to each other.
A中所使用之具有啶骨架之基尤佳為式(A1)所表示之基或以式(A2)表示且X 23為氧原子之基,最佳為式(A1)所表示之基。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 The one used in A has The group of the pyridine skeleton is preferably a group represented by formula (A1) or a group represented by formula (A2) in which X23 is an oxygen atom, and the most preferred group is a group represented by formula (A1). The reason is that the storage stability and polymerization catalytic ability of compound 1 are better, and as a result, the above-mentioned composition will become one with better storage stability and low-temperature adhesion.
通式(A1)中之R 11~R 19為氫原子或除氫原子以外之基・原子,作為化合物1之製造原料之獲取容易性較高之基・原子,為鹵素原子、硝基、氰基、-OR 111、-COR 111、-OCOR 111、-COOR 111、-SR 111、-SOR 111、-SO 2R 111、-NR 112R 113、-NR 112COR 113、-CONR 112R 113、碳原子數1~10之未經取代之烷基、碳原子數6~10之未經取代之芳基,可例舉R 111、R 112及R 113分別獨立地為氫原子、碳原子數1~10之未經取代之烷基者。就化合物1之製造容易性之方面而言,R 11~R 19較佳為氫原子或碳原子數為6以下之基。 In the general formula (A1), R 11 to R 19 are hydrogen atoms or groups or atoms other than hydrogen atoms. Groups or atoms that are easily available as raw materials for producing compound 1 are halogen atoms, nitro groups, cyano groups, -OR 111 , -COR 111 , -OCOR 111 , -COOR 111 , -SR 111 , -SOR 111 , -SO 2 R 111 , -NR 112 R 113 , -NR 112 COR 113 , -CONR 112 R 113 , unsubstituted alkyl groups having 1 to 10 carbon atoms, and unsubstituted aryl groups having 6 to 10 carbon atoms. Examples of R 111 , R 112 and R 113 are independently a hydrogen atom or an unsubstituted alkyl group having 1 to 10 carbon atoms. In view of the ease of production of compound 1, R 11 to R 19 are preferably a hydrogen atom or a group having 6 or less carbon atoms.
於本發明中,其中較佳為通式(A1)中之R 11~R 19均為氫原子,或者任意1~3個為作為除氫原子以外之較佳取代基之羥基、氰基、-SH基或者經羥基、氰基或-SH基取代或未經取代之碳原子數1~3之烷基;更佳為均為氫原子,或者任意1個或2個為羥基、-SH基、氰基或者經羥基、氰基或-SH基取代或未經取代之碳原子數1~3之烷基,其餘為氫原子;進而更佳為均為氫原子,或者任意1個或2個為羥基、氰基或-SH基,其餘為氫原子,進而最佳為均為氫原子,或者任意1個或2個為羥基或氰基,其餘為氫原子。其原因在於:上述化合物能夠用作保存穩定性及聚合觸媒能力之平衡性更優異之起始劑。 於通式(A1)中之R 11~R 19之至少1個為除氫原子以外之取代基之情形時,尤佳為R 13、R 14、R 16及R 17之任意一者為上述除氫原子以外之基・原子,特佳為上述除氫以外之較佳取代基。於該等情形時,較佳為R 11~R 19之其餘為氫原子。其原因在於:上述化合物能夠用作保存穩定性及聚合觸媒能力之平衡性更優異之起始劑。 In the present invention, it is preferred that R 11 to R 19 in the general formula (A1) are all hydrogen atoms, or any 1 to 3 of them are hydroxyl, cyano, -SH group, or alkyl group having 1 to 3 carbon atoms which may be substituted or not substituted by hydroxyl, cyano or -SH group, which are preferred substituents other than hydrogen atoms; more preferably, they are all hydrogen atoms, or any 1 or 2 of them are hydroxyl, -SH group, cyano, or alkyl group having 1 to 3 carbon atoms which may be substituted or not substituted by hydroxyl, cyano or -SH group, and the rest are hydrogen atoms; further preferably, they are all hydrogen atoms, or any 1 or 2 of them are hydroxyl, cyano or -SH group, and the rest are hydrogen atoms; further most preferably, they are all hydrogen atoms, or any 1 or 2 of them are hydroxyl or cyano group, and the rest are hydrogen atoms. The reason is that the above-mentioned compound can be used as an initiator with a better balance between storage stability and polymerization catalytic ability. When at least one of R 11 to R 19 in the general formula (A1) is a substituent other than a hydrogen atom, it is particularly preferred that any one of R 13 , R 14 , R 16 and R 17 is a group or atom other than the above-mentioned hydrogen atom, and it is particularly preferred that it is a preferred substituent other than hydrogen atom. In such cases, it is preferred that the rest of R 11 to R 19 are hydrogen atoms. The reason is that the above-mentioned compound can be used as an initiator with a better balance between storage stability and polymerization catalytic ability.
作為通式(A1)中之X 11、X 12,較佳為R 201及R 202為氫原子或碳原子數為3以下之取代或未經取代之烷基,更佳為R 201及R 202為氫原子或碳原子數為3以下之未經取代之烷基,尤佳為R 201及R 202為氫原子或甲基,最佳為R 201及R 202為氫原子。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 As X 11 and X 12 in the general formula (A1), R 201 and R 202 are preferably hydrogen atoms or substituted or unsubstituted alkyl groups having 3 or less carbon atoms, more preferably R 201 and R 202 are hydrogen atoms or unsubstituted alkyl groups having 3 or less carbon atoms, particularly preferably R 201 and R 202 are hydrogen atoms or methyl groups, and most preferably R 201 and R 202 are hydrogen atoms. The reason for this is that the storage stability and polymerization catalytic ability of the compound 1 are better, and as a result, the above-mentioned composition will become one with better storage stability and low-temperature adhesiveness.
通式(A2)中之R 21~R 27為氫原子或除氫原子以外之基・原子,作為化合物1之製造原料之獲取容易性較高之基・原子,為鹵素原子、硝基、氰基、-OR 111、-COR 111、-OCOR 111、-COOR 111、-SR 111、-SOR 111、-SO 2R 111、-NR 112R 113、-NR 112COR 113、-CONR 112R 113、碳原子數1~10之未經取代之烷基、碳原子數6~10之未經取代之芳基,可例舉R 111、R 112及R 113分別獨立地為氫原子、碳原子數1~10之未經取代之烷基者。就化合物1之製造容易性之方面而言,較佳為R 21~R 27為氫原子或碳原子數為6以下之基者。又,關於式(A2)中之R 21~R 27,就製造容易性之方面而言,較佳為任意4個以上為氫原子,亦可全部為氫原子。 In the general formula (A2), R 21 to R 27 are hydrogen atoms or groups or atoms other than hydrogen atoms. Groups or atoms that are easily available as raw materials for producing compound 1 are halogen atoms, nitro groups, cyano groups, -OR 111 , -COR 111 , -OCOR 111 , -COOR 111 , -SR 111 , -SOR 111 , -SO 2 R 111 , -NR 112 R 113 , -NR 112 COR 113 , -CONR 112 R 113 , unsubstituted alkyl groups having 1 to 10 carbon atoms, and unsubstituted aryl groups having 6 to 10 carbon atoms. Examples of R 111 , R 112 and R R 21 to R 27 are preferably hydrogen atoms or groups having 6 or less carbon atoms from the viewpoint of the ease of production of compound 1. In addition, in terms of the ease of production, it is preferred that any 4 or more of R 21 to R 27 in formula ( A2) are hydrogen atoms, or all of them may be hydrogen atoms.
作為通式(A2)中之X 21、X 22,較佳為R 201及R 202為氫原子或碳原子數為3以下之取代或未經取代之烷基,更佳為R 201及R 202為氫原子或碳原子數為3以下之未經取代之烷基,尤佳為R 201及R 202為氫原子或甲基,最佳為R 201及R 202為氫原子。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 As X 21 and X 22 in the general formula (A2), R 201 and R 202 are preferably hydrogen atoms or substituted or unsubstituted alkyl groups having 3 or less carbon atoms, more preferably R 201 and R 202 are hydrogen atoms or unsubstituted alkyl groups having 3 or less carbon atoms, particularly preferably R 201 and R 202 are hydrogen atoms or methyl groups, and most preferably R 201 and R 202 are hydrogen atoms. The reason for this is that the storage stability and polymerization catalytic ability of the compound 1 are better, and as a result, the above-mentioned composition will become one with better storage stability and low-temperature adhesiveness.
通式(1)中所使用之芳香族環基Ar為具有芳香族性之基。 作為上述芳香族環基Ar,可使用作為R 1等中所使用之含芳香族烴環之基而例舉之單環芳香族烴基、縮合芳香族烴基、連結芳香族烴基、及作為R 1等中所使用之含雜環基而例舉之自縮合雜環除去1個氫原子而得之縮合雜環基等。 於本發明中,其中芳香族環基Ar較佳為具有2個以上環結構並且具有芳香族性之基,尤佳為縮合芳香族烴基、連結芳香族烴基、縮合雜環基等,其中尤佳為較佳地使用下述通式(Ara1)、(Arb1)或(Arc1)所表示之基。其原因在於:上述化合物能夠用作保存穩定性及聚合觸媒能力之平衡性更優異之起始劑。 The aromatic cyclic group Ar used in the general formula (1) is a group having aromatic properties. As the aromatic cyclic group Ar , there can be used a monocyclic aromatic alkyl group, a condensed aromatic alkyl group, a linked aromatic alkyl group, and a condensed heterocyclic group obtained by removing one hydrogen atom from a condensed heterocyclic group, which are exemplified as the aromatic alkyl ring-containing group used in R1 , etc., and the like. In the present invention, the aromatic cyclic group Ar is preferably a group having two or more ring structures and having aromatic properties, and is particularly preferably a condensed aromatic alkyl group, a linked aromatic alkyl group, a condensed heterocyclic group, etc., and is particularly preferably a group represented by the following general formula (Ara1), (Arb1) or (Arc1). The reason is that the above compounds can be used as initiators with a better balance between storage stability and polymerization catalyst ability.
[化6] [Chemistry 6]
(式中,Y 1為硫原子、CO、SO、SO 2、CR 101 2、PR 102或NR 102, Y 2為單鍵、氧原子、硫原子、CO、SO、SO 2、CR 102 2、PR 102或NR 101, Y 3為氧原子、硫原子、CO、SO、SO 2、CR 102 2、PR 102或NR 101, R 101分別獨立地表示碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-2之二價基之基, R 102分別獨立地表示氫原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、或碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-2之二價基之基, R 31、R 32、R 41、R 42、R 51、R 52及R 53分別獨立地表示鹵素原子、硝基、氰基、-OR 121、-COR 121、-OCOR 121、-COOR 121、-SR 121、-SOR 121、-SO 2R 121、-NR 122R 123、-NR 122COR 123、-CONR 122R 123、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-2之二價基之基, 但是,複數個R 41可相互鍵結而形成環,該環未經取代或具有取代基, R 121、R 122及R 123分別獨立地表示氫原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、碳原子數2~20之未經取代或具有取代基之含雜環基、或者上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之一個以上亞甲基被取代為選自下述群I-2之二價基之基,於R 121、R 122或R 123各存在複數個之情形時,其等可相同亦可不同, 取代上述具有取代基之脂肪族烴基、上述具有取代基之含芳香族烴環之基、上述具有取代基之含雜環基、及複數個R 41相互鍵結而形成之環中之一個以上氫原子的取代基為選自下述群II-2之原子或基, a1為0~5之整數, a2為0~4之整數, b1為0~4之整數, b2為0~3之整數, c1為0~4之整數, c2為0~1之整數, *表示鍵結部位; 群I-2:-O-、-COO-、-OCO-、-CO-、-CO-CO-、-CO-CO-O-、-CS-、-S-、-SO-、-SO 2-、-NR'-、-NR'-CO-、-CO-NR'-、-NR'-COO-、-OCO-NR'-或-SiR'R''-; 群II-2:鹵素原子、氰基、硝基、-CO-H、-OH、-SH、-NH 2、-C(R')=N-OH、-COOH或-SO 3H; R'及R''分別獨立地表示氫原子或未經取代之脂肪族烴基,於存在複數個R'或R''之情形時,其等可相同亦可不同) ( wherein, Y1 is a sulfur atom, CO, SO, SO2 , CR1012 , PR102 or NR102 , Y2 is a single bond, an oxygen atom, a sulfur atom, CO, SO, SO2, CR1022 , PR102 or NR101 , Y3 is an oxygen atom, a sulfur atom, CO, SO, SO2 , CR1022 , PR102 or NR101 , R 101 each independently represents an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-2, R R102 each independently represents a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, or an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-2; R31 , R32 , R41 , R42 , R51 , R52 and R53 each independently represent a halogen atom, a nitro group, a cyano group, -OR121 , -COR121 , -OCOR121 , -COOR121 , -SR121 , -SOR 121 , -SO 2 R 121 , -NR 122 R 123 , -NR 122 COR 123 , -CONR 122 R 123 , an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group I-2, However, a plurality of R 41 may be bonded to each other to form a ring, and the ring is unsubstituted or substituted, R 121 , R 122 and R R121 , R122 or R123 each independently represent a hydrogen atom, an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 20 carbon atoms, an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, or a group in which one or more methylene groups in the above-mentioned aliphatic alkyl group, the above-mentioned aromatic alkyl group or the above-mentioned heterocyclic group are substituted with a divalent group selected from the following group I-2. When there are plural numbers of R121 , R122 or R123, they may be the same or different. The above-mentioned aliphatic alkyl group having a substituent, the above-mentioned aromatic alkyl group having a substituent, the above-mentioned heterocyclic group having a substituent, and the plural numbers of R121, R122 or R123 may be substituted with a divalent group selected from the following group I-2. The substituents of one or more hydrogen atoms in the ring formed by mutual bonding of 41 are atoms or groups selected from the following Group II-2, a1 is an integer of 0 to 5, a2 is an integer of 0 to 4, b1 is an integer of 0 to 4, b2 is an integer of 0 to 3, c1 is an integer of 0 to 4, c2 is an integer of 0 to 1, * represents a bonding site; Group I-2: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO 2 -, -NR'-, -NR'--CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R''-; Group II-2: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , -C(R')=N-OH, -COOH or -SO 3 H; R' and R'' each independently represent a hydrogen atom or an unsubstituted aliphatic hydrocarbon group; when there are multiple R' or R'', they may be the same or different)
此處,作為(Ara1)、(Arb1)或(Arc1)之R 101、R 102、R 31、R 32、R 41、R 42、R 51、R 52、R 53、R 121、R 122及R 123中所使用之鹵素原子、碳原子數1~20之未經取代或具有取代基之脂肪族烴基、碳原子數6~20之未經取代或具有取代基之含芳香族烴環之基、及碳原子數2~20之未經取代或具有取代基之含雜環基,可使用作為R 1等中所使用之鹵素原子、R 1等中所使用之脂肪族烴基、R 1等中所使用之含芳香族烴環之基、R 1等中所使用之含雜環基於上述所例舉者。 關於通式(Ara1)、(Arb1)、(Arc1)之群I-2、II-2中所使用之R'或R'',可使用與群I-1、II-1等中所使用者相同之基。 作為複數個R 41相互鍵結而形成之環,可例舉縮合於位於Arb1中之左側之苯環的苯環,作為形成有環之式Arb1之結構,可例舉:下述式(Arb1α)、(Arb1β)或(Arb1γ)所表示之結構。 Here, as the halogen atom, unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, unsubstituted or substituted aromatic hydrocarbon ring-containing group having 6 to 20 carbon atoms, and unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms used in R101, R102, R31, R32, R41, R42, R51, R52 , R53 , R121 , R122 , and R123 of (Ara1), (Arb1), or ( Arc1 ), the halogen atom, aliphatic alkyl group, aromatic hydrocarbon ring-containing group used in R1 , etc., R The mixed ring groups used in 1 , etc. are those exemplified above. As for R' or R'' used in Groups I-2 and II-2 of the general formulae (Ara1), (Arb1), and (Arc1), the same groups as those used in Groups I-1, II-1, etc. can be used. As the ring formed by a plurality of R 41s mutually bonding, a benzene ring condensed to a benzene ring located on the left side of Arb1 can be exemplified. As the structure of the formula Arb1 in which the ring is formed, the structures represented by the following formulae (Arb1α), (Arb1β), or (Arb1γ) can be exemplified.
[化6A] ((Arb1α)~(Arb1β)中,R 43為選自上述群II-2之原子或基,b3為0~4之數,b1'為0~2之數;Y 2、Y 3、R 42、b2與式(Arb1)相同;R 41'除複數個R 41'不相互鍵結而形成環之方面以外,與R 41相同) [Chemistry 6A] (In (Arb1α) to (Arb1β), R 43 is an atom or group selected from the above group II-2, b3 is a number from 0 to 4, b1' is a number from 0 to 2; Y 2 , Y 3 , R 42 , and b2 are the same as in formula (Arb1); R 41 ' is the same as R 41 except that a plurality of R 41 ' do not bond to each other to form a ring)
於本發明中,芳香族環基Ar較佳為上述通式(Ara1)或式(Arb1)所表示之基,尤佳為式(Ara1)所表示之基。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。In the present invention, the aromatic ring group Ar is preferably a group represented by the above general formula (Ara1) or formula (Arb1), and is particularly preferably a group represented by formula (Ara1). The reason is that the storage stability and polymerization catalytic ability of compound 1 are better, and as a result, the above composition will become one with better storage stability and low-temperature adhesion.
通式(Ara1)中之R 31及R 32較佳為分別獨立地為硝基、碳原子數1~10之未經取代或具有取代基之脂肪族烴基、碳原子數3~10之未經取代或具有取代基之含雜環基、或者該等脂肪族烴基或含雜環基中之一個以上亞甲基被取代為選自上述群I-2之二價基之基、或者為-COR 121且R 121為碳原子數6~10之未經取代或具有取代基之芳基或碳原子數3~10之未經取代或具有取代基之含雜環基。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 In the general formula (Ara1), R31 and R32 are preferably independently nitro, an unsubstituted or substituted aliphatic alkyl group having 1 to 10 carbon atoms, an unsubstituted or substituted heterocyclic group having 3 to 10 carbon atoms, or one or more methylene groups in the aliphatic alkyl group or heterocyclic group are substituted with a divalent group selected from the above group I-2, or -COR121 and R121 is an unsubstituted or substituted aryl group having 6 to 10 carbon atoms or a unsubstituted or substituted heterocyclic group having 3 to 10 carbon atoms. The reason is that the storage stability and polymerization catalytic ability of the compound 1 are better, and as a result, the above composition will be better in storage stability and low-temperature adhesion.
通式(Ara1)中之a1較佳為0~3之整數,更佳為0~2之整數,尤佳為0~1之整數,最佳為0。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。a1 in the general formula (Ara1) is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, particularly preferably an integer of 0 to 1, and most preferably 0. The reason is that the storage stability and polymerization catalytic ability of compound 1 are better, and as a result, the above composition will become one with better storage stability and low-temperature adhesion.
通式(Ara1)中之a2較佳為0~2之整數,更佳為0~1之整數,最佳為0。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。a2 in the general formula (Ara1) is preferably an integer of 0 to 2, more preferably an integer of 0 to 1, and most preferably 0. The reason is that the storage stability and polymerization catalytic ability of compound 1 are better, and as a result, the above composition will become one with better storage stability and low-temperature adhesion.
通式(Ara1)中之鍵結部位即與-CO-CR 1R 2A +B -之鍵結部位之位置可為芳香族環中之可鍵結之位置,較佳為相對於Y 1為對位。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。因此,於Y 1為硫原子之情形時,較佳為上述化合物1為下述通式(11)所表示之化合物。 The bonding site in the general formula (Ara1), i.e., the bonding site with -CO-CR 1 R 2 A + B -, can be a bonding site in the aromatic ring, preferably in the para position relative to Y 1. The reason for this is that the storage stability and polymerization catalytic ability of the compound 1 are better, and as a result, the above composition will be better in storage stability and low-temperature adhesion. Therefore, when Y 1 is a sulfur atom, it is preferred that the above compound 1 is a compound represented by the following general formula (11).
通式(Ara1)中,Y 1較佳為硫原子、CO、SO、NR 102,尤佳為硫原子。其原因在於:上述化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。又,其原因在於合成容易。根據上述原因,化合物1之中,較佳為下述式(11)所表示之化合物。 In the general formula (Ara1), Y 1 is preferably a sulfur atom, CO, SO, NR 102 , and is particularly preferably a sulfur atom. The reason is that the storage stability and polymerization catalytic ability of the above-mentioned compound 1 are better, and as a result, the above-mentioned composition will become one with better storage stability and low-temperature adhesion. In addition, the reason is that the synthesis is easy. Based on the above reasons, among the compounds 1, the compound represented by the following formula (11) is more preferred.
[化7] (式中,A +、B -、R 1及R 2與上述通式(1)相同, R 31、R 32、a1及a2與上述通式(Ara1)相同) [Chemistry 7] (wherein, A + , B - , R 1 and R 2 are the same as those in the above general formula (1), and R 31 , R 32 , a1 and a2 are the same as those in the above general formula (Ara1))
通式(Arb1)中之R 41及R 42較佳為分別獨立地為硝基、碳原子數1~10之未經取代或具有取代基之脂肪族烴基、碳原子數3~10之未經取代或具有取代基之含雜環基、或者該等脂肪族烴基或含雜環基中之一個以上亞甲基被取代為選自上述群I-2之二價基之基,或者為-COR 121且R 121為碳原子數6~10之未經取代或具有取代基之芳基或碳原子數3~10之未經取代或具有取代基之含雜環基,或R 41彼此鍵結而具有上述(Arb1α)~(Arb1γ)所表示之基。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 In the general formula (Arb1), R41 and R42 are preferably independently nitro, an unsubstituted or substituted aliphatic alkyl group having 1 to 10 carbon atoms, an unsubstituted or substituted heterocyclic group having 3 to 10 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the above group I-2, or -COR121 and R121 is an unsubstituted or substituted aryl group having 6 to 10 carbon atoms, or an unsubstituted or substituted heterocyclic group having 3 to 10 carbon atoms, or R41 are bonded to each other to have the groups represented by (Arb1α) to (Arb1γ) above. The reason is that compound 1 has better storage stability and polymerization catalytic ability, and as a result, the above composition has better storage stability and low-temperature adhesion.
於R 41彼此未鍵結而形成環之情形時,通式(Arb1)中之b1較佳為0~3之整數,更佳為0~2之整數,尤佳為0~1之整數。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 When R 41 is not bonded to each other to form a ring, b1 in the general formula (Arb1) is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably an integer of 0 to 1. The reason is that the storage stability and polymerization catalytic ability of compound 1 are better, and as a result, the above composition will become one with better storage stability and low-temperature adhesion.
於R 41彼此鍵結而形成環且以式(Arb1α)~(Arb1β)之任一者表示之情形時,b1'較佳為0,b3較佳為0~1之整數。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 When R 41 are bonded to form a ring and represented by any of the formulas (Arb1α) to (Arb1β), b1' is preferably 0, and b3 is preferably an integer of 0 to 1. The reason is that the storage stability and polymerization catalytic ability of compound 1 are better, and as a result, the above composition will become better in storage stability and low-temperature adhesion.
通式(Arb1)等之b2較佳為0~2之整數,更佳為0~1之整數,最佳為0。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。b2 in the general formula (Arb1) is preferably an integer of 0 to 2, more preferably an integer of 0 to 1, and most preferably 0. The reason is that the storage stability and polymerization catalytic ability of the compound 1 are better, and as a result, the above composition will become better in storage stability and low-temperature adhesion.
關於通式(Arb1)等之鍵結部位,即,與-CO-CR 1R 2A +B -之鍵結部位之位置,可為芳香族環中之可鍵結之位置,較佳為相對於Y 3為間或對位。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 The bonding site of the general formula (Arb1), i.e., the bonding site with -CO-CR 1 R 2 A + B - , can be a bonding site in the aromatic ring, preferably in the para position relative to Y 3. The reason is that the storage stability and polymerization catalytic ability of compound 1 are better, and as a result, the above composition will become better in storage stability and low-temperature adhesion.
通式(Arb1)中,Y 2較佳為單鍵,Y 3較佳為CR 102 2或NR 101。其原因在於:上述化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。又,其原因在於合成容易。 In the general formula (Arb1), Y2 is preferably a single bond, and Y3 is preferably CR1022 or NR101 . The reason is that the storage stability and polymerization catalytic ability of the above-mentioned compound 1 are better, and as a result , the above-mentioned composition will become one with better storage stability and low-temperature adhesion. Another reason is that the synthesis is easy.
R 101較佳為碳原子數1~20之未經取代或具有取代基之脂肪族烴基或該脂肪族烴基中之一個以上亞甲基被取代為選自上述群I-2之二價基之基,尤佳為碳原子數1~10之未經取代或具有取代基之脂肪族烴基。 R 101 is preferably an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms or a group in which one or more methylene groups in the aliphatic alkyl group are substituted with a divalent group selected from the above group I-2, and is particularly preferably an unsubstituted or substituted aliphatic alkyl group having 1 to 10 carbon atoms.
R 102較佳為氫原子或碳原子數1~20之未經取代或具有取代基之脂肪族烴基或該脂肪族烴基中之一個以上亞甲基被取代為選自上述群I-2之二價基之基,尤佳為氫原子或碳原子數1~8之未經取代或具有取代基之脂肪族烴基。其原因在於:上述化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 R 102 is preferably a hydrogen atom or an unsubstituted or substituted aliphatic alkyl group having 1 to 20 carbon atoms, or a group in which one or more methylene groups in the aliphatic alkyl group are substituted with a divalent group selected from the above group I-2, and is particularly preferably a hydrogen atom or an unsubstituted or substituted aliphatic alkyl group having 1 to 8 carbon atoms. The reason is that the storage stability and polymerization catalytic ability of the above compound 1 are better, and as a result, the above composition will become one with better storage stability and low-temperature adhesion.
芳香族環基由式(Arb1)表示之化合物1之中,尤佳為下述式(12)所表示之化合物。Among the compounds 1 in which the aromatic ring group is represented by the formula (Arb1), the compounds represented by the following formula (12) are particularly preferred.
[化7A] (式中,Y 3'為CR 102 2或NR 101,A +、B -、R 1及R 2與上述通式(1)相同, R 41、R 42、b1及b2與上述通式(Arb1)相同) [Chemical 7A] (wherein, Y 3' is CR 102 2 or NR 101 , A + , B - , R 1 and R 2 are the same as those in the above general formula (1), and R 41 , R 42 , b1 and b2 are the same as those in the above general formula (Arb1))
作為上述通式(1)中之B -所表示之1價陰離子,例如可例舉鹵化物離子、無機鹵化陰離子、磺酸根陰離子、含磷陰離子、醯亞胺離子、硼酸鹽陰離子(有時亦稱為「硼酸根陰離子」)、羧酸根陰離子、二硫代胺基甲酸根陰離子、有機磺醯基甲基化物離子、以及硫氰酸鹽陰離子、二硫代胺基甲酸根陰離子等。 Examples of the monovalent anion represented by B- in the general formula (1) include halide ions, inorganic halogenated anions, sulfonate anions, phosphorus-containing anions, imide ions, borate anions (sometimes also referred to as "borate anions"), carboxylate anions, dithiocarbamate anions, organic sulfonylmethide ions, thiocyanate anions, and dithiocarbamate anions.
作為鹵化物離子,可例舉:氯陰離子、溴陰離子、碘陰離子、氟陰離子。Examples of the halogenide ions include chlorine anion, bromine anion, iodine anion, and fluorine anion.
作為無機鹵化陰離子,可例舉:過氯酸根陰離子、氯酸根陰離子、硫氰酸根陰離子、六氟磷酸根陰離子、六氟銻陰離子、六氟砷陰離子、四氟硼陰離子等。Examples of the inorganic halogenated anion include perchlorate anion, chlorate anion, thiocyanate anion, hexafluorophosphate anion, hexafluoroantimony anion, hexafluoroarsenic anion, tetrafluoroboron anion and the like.
作為磺酸根陰離子,可例舉:甲磺酸根離子、氟磺酸根離子、苯磺酸根陰離子、甲苯磺酸根陰離子、1-萘基磺酸根陰離子、2-萘基磺酸根陰離子、三氟甲磺酸根陰離子、五氟乙磺酸根陰離子、七氟丙磺酸根陰離子、九氟丁磺酸根陰離子、十一氟戊烷磺酸根陰離子、十三氟己烷磺酸根陰離子、十五氟庚烷磺酸根陰離子、十七氟辛磺酸根離子、全氟-4-乙基環己磺酸根離子、N-烷基(或芳基)二苯基胺-4-磺酸根陰離子、2-胺基-4-甲基-5-氯苯磺酸根陰離子、2-胺基-5-硝基苯磺酸根陰離子、日本專利特開2004-53799號公報中記載之磺酸根陰離子、樟腦磺酸根陰離子、氟苯磺酸根陰離子、二氟苯磺酸根陰離子、三氟苯磺酸根陰離子、四氟苯磺酸根陰離子、五氟苯磺酸根陰離子等。Examples of the sulfonate anion include methanesulfonate anion, fluorosulfonate anion, benzenesulfonate anion, toluenesulfonate anion, 1-naphthylsulfonate anion, 2-naphthylsulfonate anion, trifluoromethanesulfonate anion, pentafluoroethanesulfonate anion, heptafluoropropanesulfonate anion, nonafluorobutanesulfonate anion, undecafluoropentanesulfonate anion, tridecafluorohexanesulfonate anion, pentafluoroheptanesulfonate anion, heptadecafluorooctanesulfonate anion, perfluoro-4-ethylhexanesulfonate anion, and the like. The present invention also includes cyclohexanesulfonate anion, N-alkyl (or aryl) diphenylamine-4-sulfonate anion, 2-amino-4-methyl-5-chlorobenzenesulfonate anion, 2-amino-5-nitrobenzenesulfonate anion, sulfonate anions described in Japanese Patent Laid-Open No. 2004-53799, camphorsulfonate anion, fluorobenzenesulfonate anion, difluorobenzenesulfonate anion, trifluorobenzenesulfonate anion, tetrafluorobenzenesulfonate anion, pentafluorobenzenesulfonate anion, and the like.
作為含磷陰離子,可例舉:磷酸或膦酸等之烷基酯或芳基酯、次膦酸((HO)PH 2(=O))中之與磷原子鍵結之氫原子被烷基(例如碳原子數1~20)或芳基(例如碳原子數6~20)或者該等烷基或芳基中之亞甲基被取代為-CO-等選自上述群I-1之二價基之基取代的有機基取代次膦酸根陰離子。例如作為含磷陰離子,具體可例舉:磷酸辛酯陰離子、磷酸十二烷酯陰離子、磷酸十八烷基酯陰離子、磷酸苯基酯陰離子、磷酸壬基苯基酯陰離子等磷酸酯陰離子、或2,2'-亞甲基雙(4,6-二第三丁基苯基)膦酸酯陰離子等膦酸酯陰離子、(2,4,6-三甲基苯甲醯基)亞膦酸苯基酯、亞膦酸二烷基酯、亞膦酸二苯基酯等有機基取代次膦酸根陰離子等。 Examples of phosphorus-containing anions include alkyl or aryl esters of phosphoric acid or phosphonic acid, and organic group-substituted phosphinate anions in which the hydrogen atom bonded to the phosphorus atom in phosphinic acid ((HO) PH2 (=O)) is replaced by an alkyl group (e.g., having 1 to 20 carbon atoms) or an aryl group (e.g., having 6 to 20 carbon atoms), or the methylene group in the alkyl or aryl group is replaced by a divalent group selected from the above group I-1, such as -CO-. For example, the phosphorus-containing anion specifically includes phosphate anions such as octyl phosphate anion, dodecyl phosphate anion, octadecyl phosphate anion, phenyl phosphate anion, nonylphenyl phosphate anion, or phosphonate anions such as 2,2'-methylenebis(4,6-di-tert-butylphenyl)phosphonate anion, and organic group-substituted phosphinate anions such as (2,4,6-trimethylbenzyl)phenyl phosphite, dialkyl phosphite, and diphenyl phosphite.
作為醯亞胺離子,可例舉:雙(三氟甲磺醯)亞胺離子、雙(五氟乙磺醯)亞胺離子、鄰苯二甲醯亞胺離子、鄰磺醯苯甲醯亞胺、雙(七氟丙磺醯)亞胺離子、雙(九氟丁磺醯)亞胺離子、雙(十一氟戊磺醯)亞胺離子、雙(十五氟庚磺醯)亞胺離子、雙(十三氟己磺醯)亞胺離子、雙(十七氟辛磺醯亞胺)離子、(三氟甲烷碸)(九氟丁烷碸)醯亞胺離子、(甲烷碸)(三氟甲烷碸)醯亞胺離子、環-六氟丙烷-1,3-雙(磺醯基)醯亞胺陰離子等。Examples of the imide ion include bis(trifluoromethanesulfonyl)imide ion, bis(pentafluoroethanesulfonyl)imide ion, o-phenylenediformyl imide ion, o-sulfonylbenzyl imide, bis(heptafluoropropanesulfonyl)imide ion, bis(nonafluorobutanesulfonyl)imide ion, bis(undecafluoropentanesulfonyl)imide ion, bis(pentadecafluoropentanesulfonyl)imide ion, fluoroheptanesulfonyl)imide ion, bis(tridecafluorohexanesulfonyl)imide ion, bis(heptadecafluorooctanesulfonyl)imide ion, (trifluoromethanesulfonyl) (nonafluorobutanesulfonyl)imide ion, (methanesulfonyl) (trifluoromethanesulfonyl)imide ion, cyclo-hexafluoropropane-1,3-bis(sulfonyl)imide anion, etc.
作為硼酸鹽陰離子,可例舉:於硼原子之任一鍵結鍵上鍵結有烷基及/或芳基之有機陰離子。作為硼酸鹽陰離子之具體例,可例舉:四(五氟苯基)硼酸鹽陰離子、四(4-氟苯基)硼酸鹽陰離子、四苯基硼酸鹽陰離子、日本專利特開2007-112854號公報中記載之硼酸鹽陰離子等四芳基硼酸鹽陰離子、三芳基烷基硼烷陰離子。又,亦可例舉:日本專利特開平6-184170號公報中記載之硼酸鹽陰離子、日本專利特表2002-526391號公報中記載之硼酸鹽陰離子等。Examples of borate anions include organic anions in which an alkyl group and/or an aryl group is bonded to any bond of a boron atom. Specific examples of borate anions include tetrakis(pentafluorophenyl)borate anion, tetrakis(4-fluorophenyl)borate anion, tetraphenylborate anion, borate anions described in Japanese Patent Laid-Open No. 2007-112854, tetraarylborate anions, and triarylalkylborane anions. In addition, borate anions described in Japanese Patent Laid-Open No. 6-184170 and borate anions described in Japanese Patent No. 2002-526391 can also be cited.
作為羧酸根陰離子,可例舉:苯甲酸根陰離子、三氟乙酸根陰離子、2-側氧基-2-苯基乙酸根陰離子等。Examples of the carboxylate anion include a benzoate anion, a trifluoroacetate anion, and a 2-oxo-2-phenylacetate anion.
作為甲基化物離子,可例舉:三(三氟甲磺醯基)甲基化物、三(甲磺醯基)甲基化物等有機磺醯基甲基化物離子。 作為二硫代胺基甲酸根陰離子,可例舉:N,N-二乙基二硫代胺基甲酸根陰離子等。 Examples of methide ions include organic sulfonyl methide ions such as tris(trifluoromethanesulfonyl)methide and tris(methanesulfonyl)methide. Examples of dithiocarbamate anions include N,N-diethyldithiocarbamate anions.
除此以外,可例舉:烷基磺酸根離子或氟取代烷基磺酸根離子、烷基磺醯亞胺、氟取代烷基磺醯亞胺經丙烯醯氧基、甲基丙烯醯氧基取代者、或經降𦯉基、金剛烷基等脂肪族環狀烷基取代者。又,亦可視需要使用具有使處於激發狀態之活性分子去激發(淬滅)之功能之淬滅陰離子或於環戊二烯基環具有羧基或膦酸基、磺基等陰離子性基之二茂鐵、二茂釕等茂金屬化合物陰離子等。In addition, examples include: alkylsulfonate ions or fluorine-substituted alkylsulfonate ions, alkylsulfonimides, fluorine-substituted alkylsulfonimides substituted with an acryloxy group, a methacryloxy group, or aliphatic cyclic alkyl groups such as a norinyl group and an adamantyl group. In addition, quenching anions having the function of deexciting (quenching) active molecules in an excited state, or metallocene compound anions such as ferrocene and ruthenocene having an anionic group such as a carboxyl group, a phosphonic acid group, or a sulfonic group on the cyclopentadienyl ring, etc. can also be used as needed.
B -所表示之1價陰離子之中,就低溫接著性、保存穩定性、原料獲取容易性等之平衡性等之方面而言,更佳為硼酸鹽陰離子、硫氰酸根陰離子、鄰苯二甲醯亞胺陰離子、鹵化物陰離子、磺醯苯甲醯亞胺陰離子、四氟硼陰離子、六氟化磷陰離子、三氟甲磺酸根陰離子、含磷陰離子,其中尤佳為硼酸鹽陰離子、含磷陰離子,尤其較佳為硼酸鹽陰離子,最佳為以下通式(I)所表示之硼酸鹽陰離子。通式(I)之中,較佳為R 301~R 304為碳原子數6~10之未經取代或具有取代基之芳基之陰離子。其原因在於:化合物1之保存穩定性及聚合觸媒能力更優異,其結果為,上述組合物會成為保存穩定性及低溫接著性更優異者。 Among the monovalent anions represented by B- , in terms of the balance of low-temperature adhesiveness, storage stability, availability of raw materials, etc., more preferred are borate anions, thiocyanate anions, o-phthalimide anions, halide anions, sulfonylbenzalimide anions, tetrafluoroboron anions, phosphorus hexafluoride anions, trifluoromethanesulfonate anions, and phosphorus-containing anions. Among them, borate anions and phosphorus-containing anions are particularly preferred, and borate anions are particularly preferred. The most preferred is a borate anion represented by the following general formula (I). In the general formula (I), it is preferred that R 301 to R 304 are anions of unsubstituted or substituted aromatic groups having 6 to 10 carbon atoms. The reason for this is that the storage stability and polymerization catalytic ability of the compound 1 are better, and as a result, the above-mentioned composition will have better storage stability and low-temperature adhesion.
[化8] (R 301、R 302、R 303及R 304分別獨立地為碳原子數1~20之未經取代或具有取代基之烷基、碳原子數6~20之未經取代或具有取代基之芳基,上述取代基為選自下述群II-5之原子或基; 群II-5:鹵素原子、氰基、硝基、-CO-H、-OH、-SH、-NH 2、-C(R')=N-OH、-COOH或-SO 3H; R'分別獨立地表示氫原子或未經取代之脂肪族烴基,於存在複數個R'之情形時,其等可相同亦可不同) [Chemistry 8] (R 301 , R 302 , R 303 and R 304 are independently an alkyl group having 1 to 20 carbon atoms which is unsubstituted or substituted, or an aryl group having 6 to 20 carbon atoms which is unsubstituted or substituted, and the substituents are atoms or groups selected from the following Group II-5; Group II-5: halogen atom, cyano group, nitro group, -CO-H, -OH, -SH, -NH 2 , -C(R')=N-OH, -COOH or -SO 3 H; R' is independently a hydrogen atom or an unsubstituted aliphatic hydrocarbon group, and when there are plural R's, they may be the same or different)
此處,作為通式(I)中之R 301、R 302、R 303及R 304中所使用之碳原子數1~20之未經取代之烷基、碳原子數6~20之未經取代之芳基,可使用作為R 1等中所使用之烷基、R 1等中所使用之芳基於上述所例舉者。 關於通式(I)之群II-5中所使用之R',可使用與群II-1中所使用者相同之基。 Here, as the unsubstituted alkyl group having 1 to 20 carbon atoms and the unsubstituted aryl group having 6 to 20 carbon atoms used in R 301 , R 302 , R 303 and R 304 in the general formula (I), the alkyl group used in R 1 etc. and the aryl group used in R 1 etc. mentioned above can be used. As for R' used in group II-5 of the general formula (I), the same group as used in group II-1 can be used.
上述通式(I)所表示之化合物之製造方法並無特別限定,例如可按照下述反應式1,藉由以下方法而製造。 即,藉由使於羰基之α位鍵結有溴之酮體與啶或其衍生物進行反應,而獲得作為Br鹽之化合物1。反應式1為A由通式(A1)表示、R 11~R 19為氫原子、X 11及X 12為-CH 2-之情形,其他化合物1亦可藉由變更使用之啶衍生物而製造。 The method for preparing the compound represented by the general formula (I) is not particularly limited, and it can be prepared, for example, by the following method according to the following reaction formula 1. That is, by reacting a ketone having bromine bonded to the α-position of the carbonyl group with The reaction is carried out with pyridine or its derivatives to obtain compound 1 as a Br salt. Reaction formula 1 is a case where A is represented by general formula (A1), R 11 to R 19 are hydrogen atoms, and X 11 and X 12 are -CH 2 -. Other compounds 1 can also be used by changing It is made from pyridine derivatives.
[化9] (式中,R 1及R 2、Ar與通式(1)相同) [Chemistry 9] (wherein, R 1 , R 2 and Ar are the same as those in general formula (1))
除Br鹽以外之化合物1可藉由使目標之陰離子B -與鹼金屬陽離子等陽離子M +之鹽進行反應而獲得(下述反應式2)。作為上述陽離子M +,例如可例舉:鈉陽離子等。 Compound 1 other than Br salt can be obtained by reacting the target anion B - with a salt of a cation M + such as an alkali metal cation (the following reaction formula 2). Examples of the cation M + include sodium cation and the like.
[化10] (式中,R 1及R 2、Ar與通式(1)相同) [Chemistry 10] (wherein, R 1 , R 2 and Ar are the same as those in general formula (1))
根據本發明,化合物1之含量較佳為於上述環狀醚成分、上述硫醇成分及化合物1之合計100質量份中為1質量份以上20質量份以下,其中較佳為3質量份以上15質量份以下,較佳為5質量份以上10質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。According to the present invention, the content of compound 1 is preferably 1 to 20 parts by mass, preferably 3 to 15 parts by mass, and preferably 5 to 10 parts by mass, out of 100 parts by mass of the total of the cyclic ether component, the thiol component, and compound 1. The reason is that the composition has a better balance between storage stability and low-temperature adhesion.
本發明之組合物中,較佳為化合物1之含量相對於上述硫醇成分及化合物1之合計100質量份為5質量份以上30質量份以下,更佳為7質量份以上25質量份以下,較佳為10質量份以上20質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the composition of the present invention, the content of compound 1 is preferably 5 to 30 parts by mass, more preferably 7 to 25 parts by mass, and more preferably 10 to 20 parts by mass, relative to 100 parts by mass of the total of the thiol component and compound 1. The reason is that the above composition has a better balance between storage stability and low-temperature adhesion.
本發明之組合物中,作為上述化合物1之含量,只要為可獲得所需保存穩定性及低溫接著性之含量即可,較佳為於組合物之固形物成分100質量份中為0.2質量份以上30質量份以下,其中較佳為0.5質量份以上20質量份以下,尤佳為2質量份以上15質量份以下,較佳為3質量份以上10質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。再者,固形物成分係指除溶劑以外之所有成分之合計質量。In the composition of the present invention, the content of the compound 1 can be any content that can obtain the desired storage stability and low-temperature adhesion, preferably 0.2 mass parts to 30 mass parts out of 100 mass parts of the solid components of the composition, preferably 0.5 mass parts to 20 mass parts, more preferably 2 mass parts to 15 mass parts, and preferably 3 mass parts to 10 mass parts. The reason is that the above composition will be a better balance between storage stability and low-temperature adhesion. Furthermore, the solid component refers to the total mass of all components except the solvent.
本發明之組合物中,作為上述化合物1之含量,只要為可獲得所需保存穩定性及低溫接著性之含量即可,較佳為於組合物100質量份中為0.2質量份以上30質量份以下,其中較佳為0.5質量份以上20質量份以下,尤佳為2質量份以上15質量份以下,再更佳為3質量份以上10質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the composition of the present invention, the content of the compound 1 can be any content that can obtain the desired storage stability and low-temperature adhesiveness, preferably 0.2 mass parts to 30 mass parts in 100 mass parts of the composition, preferably 0.5 mass parts to 20 mass parts, more preferably 2 mass parts to 15 mass parts, and even more preferably 3 mass parts to 10 mass parts. The reason is that the above composition will be a better balance between storage stability and low-temperature adhesiveness.
作為上述化合物1之含量,只要為可獲得所需保存穩定性及低溫接著性之含量即可,於上述組合物包含作為硬化性成分之環狀醚成分、上述硫醇成分、以及自由基聚合性成分之情形時,較佳為相對於環狀醚成分、上述硫醇成分及自由基聚合性成分之合計100質量份為0.2質量份以上30質量份以下,其中較佳為0.5質量份以上20質量份以下,尤佳為1質量份以上15質量份以下,其中尤佳為3質量份以上10質量份以下。其原因在於:上述組合物會成為保存穩定性及硬化性之平衡性更優異者。The content of the compound 1 can be any content that can obtain the desired storage stability and low-temperature adhesiveness. When the composition includes a cyclic ether component as a curable component, the thiol component, and a radical polymerizable component, the content is preferably 0.2 to 30 parts by mass, preferably 0.5 to 20 parts by mass, more preferably 1 to 15 parts by mass, and most preferably 3 to 10 parts by mass, relative to 100 parts by mass of the total of the cyclic ether component, the thiol component, and the radical polymerizable component. The reason for this is that the composition has a better balance between storage stability and curability.
2.硫醇成分 硫醇成分係指為具有硫醇基之化合物(以下,有時稱為硫醇化合物)之1種或2種以上之成分。 硫醇化合物係作為除上述化合物1以外之成分包含於組合物中者,具有硫醇基及環狀醚基兩者之化合物亦屬於硫醇化合物。 2. Thiol component A thiol component refers to one or more components of a compound having a thiol group (hereinafter, sometimes referred to as a thiol compound). A thiol compound is a component included in the composition other than the above-mentioned compound 1. A compound having both a thiol group and a cyclic ether group also belongs to a thiol compound.
關於硫醇成分,硫醇化合物可僅使用1種,亦可將2種以上組合。本發明中,藉由在上述化合物1中組合硫醇成分,可獲得硬化性特別優異之組合物。Regarding the thiol component, only one thiol compound may be used, or two or more thiol compounds may be used in combination. In the present invention, by combining the thiol component with the above-mentioned compound 1, a composition having particularly excellent curability can be obtained.
作為上述硫醇化合物中之硫醇基之種類,可使用一級硫醇基、二級硫醇基、三級硫醇基等。就更有效地發揮本發明之保存穩定性及低溫接著性優異之效果之觀點而言,上述硫醇基之種類較佳為一級硫醇基或二級硫醇基,其中較佳為一級硫醇基。As the type of thiol group in the thiol compound, a primary thiol group, a secondary thiol group, a tertiary thiol group, etc. can be used. From the viewpoint of more effectively exerting the effects of the present invention in terms of storage stability and excellent low-temperature adhesion, the type of thiol group is preferably a primary thiol group or a secondary thiol group, and preferably a primary thiol group.
作為硫醇化合物,就進一步提高保存穩定性及低溫接著性優異之效果之方面而言,於一分子中含有之硫醇基之數量較佳為2個以上,進而較佳為3個以上。又,就製成保存穩定性更優異者之方面而言,硫醇基之數量較佳為10個以下,更佳為8個以下,進而較佳為7個以下,較佳為6個以下,較佳為5個以下,較佳為4個以下。 尤佳為具有上述數量之硫醇基之一級硫醇化合物,即硫醇化合物為具有2個以上一級硫醇基之化合物,較佳為具有2個以上10個以下一級硫醇基之化合物,其中較佳為具有2個以上8個以下、特別是2個以上7個以下、其中特別是2個以上6個以下、其中特別是3個以上5個以下、其中特別是3個以上4個以下一級硫醇基之化合物。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。關於上述硫醇化合物,作為硫醇基之數量為2個以上10個以下之化合物之例,較佳為使用以下述式(A)表示之化合物(以下,有時稱為化合物A)。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。又,就獲取容易性或組合物之保存穩定性及硬化性之平衡性之方面而言較佳。 As a thiol compound, in terms of further improving the effects of storage stability and excellent low-temperature adhesion, the number of thiol groups contained in one molecule is preferably 2 or more, and more preferably 3 or more. In terms of making a product with better storage stability, the number of thiol groups is preferably 10 or less, more preferably 8 or less, more preferably 7 or less, preferably 6 or less, preferably 5 or less, and preferably 4 or less. The primary thiol compound having the above number of thiol groups is particularly preferred, that is, the thiol compound is a compound having 2 or more primary thiol groups, preferably a compound having 2 or more and 10 or less primary thiol groups, and more preferably a compound having 2 or more and 8 or less, particularly 2 or more and 7 or less, particularly 2 or more and 6 or less, particularly 3 or more and 5 or less, particularly 3 or more and 4 or less primary thiol groups. The reason is that the above composition will be a better balance between storage stability and low-temperature adhesion. As an example of the above thiol compound having 2 or more and 10 or less thiol groups, it is preferred to use a compound represented by the following formula (A) (hereinafter, sometimes referred to as compound A). The reason is that the above composition will be a better balance between storage stability and low-temperature adhesion. In addition, it is better in terms of ease of acquisition or the balance between the storage stability and hardening properties of the composition.
[化11] (式中,X 1表示具有與n1相同之數之價數的碳原子數1~40之未經取代或具有取代基之脂肪族烴基、碳原子數6~40之未經取代或具有取代基之含芳香族烴環之基或碳原子數2~20之未經取代或具有取代基之含雜環基,或者表示該脂肪族烴基、該含芳香族烴環之基或該含雜環基中之1個或2個以上亞甲基被取代為選自下述群III之二價基之基, n1表示2以上10以下之整數; 群III:選自-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR'''-、-S-S-或-SO 2-之基; R'''表示氫原子或碳原子數1~8之烷基,於存在複數個R'''之情形時,其等可相同亦可不同) [Chemistry 11] (wherein X1 represents an unsubstituted or substituted aliphatic alkyl group having 1 to 40 carbon atoms, an unsubstituted or substituted aromatic alkyl group having 6 to 40 carbon atoms, or an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, having the same valence as n1, or represents a group in which one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group, or the heterocyclic group are substituted with a divalent group selected from the following Group III, and n1 represents an integer of 2 to 10; Group III: a group selected from -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'''-, -SS- or -SO2- ; R''' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. When there are multiple R'''s, they may be the same or different.
上述X 1係用作使n1個-SH基鍵結之連結基。上述X 1所表示之具有與n1相同之數之價數的碳原子數1~40之脂肪族烴基、碳原子數6~40之含芳香族烴環之基及碳原子數2~20之含雜環基分別為自一價之碳原子數1~40之脂肪族烴基、一價之碳原子數6~40之含芳香族烴環之基及一價之碳原子數2~20之含雜環基除去(n1-1)個氫原子而得之結構之基。 關於上述X 1,就組合物之保存穩定性及低溫接著性之平衡性而言,具有與n1相同之數之價數的碳原子數1~40之脂肪族烴基更佳為碳原子數1~30,亦可為1~20。作為上述一價之碳原子數1~40之脂肪族烴基、一價之碳原子數6~40之含芳香族烴環之基及一價之碳原子數2~20之含雜環基,分別可使用與上述中所說明之R 1等中所使用之碳原子數1~20之脂肪族烴基、R 1等中所使用之碳原子數6~20之含芳香族烴環之基及R 1等中所使用之碳原子數2~20之含雜環基分別相同之基。 作為上述群III中之R'''中所使用之碳原子數1~8之烷基,可使用R 1等中所使用之碳原子數1~20之烷基中特定碳原子數者。該烷基可未經取代或被下文所述之取代基取代。 於上述脂肪族烴基、上述含芳香族烴環之基或上述含雜環基中之2個以上亞甲基被取代為選自群III之二價基之情形時,複數個該二價基設為互不相鄰。該複數個二價基可相互相同亦可不同。 The above X1 is used as a linking group for bonding n1 -SH groups. The above X1 represented by the aliphatic alkyl group having 1 to 40 carbon atoms, the group containing an aromatic alkyl ring having 6 to 40 carbon atoms, and the heterocyclic group containing 2 to 20 carbon atoms having the same valence as n1 are groups of structures obtained by removing (n1-1) hydrogen atoms from a monovalent aliphatic alkyl group having 1 to 40 carbon atoms, a monovalent aromatic alkyl ring containing 6 to 40 carbon atoms, and a monovalent heterocyclic group containing 2 to 20 carbon atoms. Regarding X1 , in terms of the balance between the storage stability and low temperature adhesiveness of the composition, the aliphatic alkyl group having 1 to 40 carbon atoms and having the same valence as n1 is preferably 1 to 30 carbon atoms, and may be 1 to 20 carbon atoms. As the monovalent aliphatic alkyl group having 1 to 40 carbon atoms, the monovalent aromatic hydrocarbon ring-containing group having 6 to 40 carbon atoms, and the monovalent heterocyclic group having 2 to 20 carbon atoms, the same groups as the aliphatic alkyl group having 1 to 20 carbon atoms, the aromatic hydrocarbon ring-containing group having 6 to 20 carbon atoms, and the heterocyclic group having 2 to 20 carbon atoms used in R1 , etc. described above can be used. As the alkyl group having 1 to 8 carbon atoms used in R''' in the above group III, the alkyl group having 1 to 20 carbon atoms used in R 1 etc. can be used. The alkyl group may be unsubstituted or substituted with a substituent described below. When two or more methylene groups in the above aliphatic alkyl group, the above aromatic alkyl ring-containing group or the above heterocyclic group are substituted with a divalent group selected from group III, the plurality of divalent groups are set to be non-adjacent to each other. The plurality of divalent groups may be the same or different from each other.
作為上述X 1中之脂肪族烴基、含芳香族烴環之基、含雜環基或其等經選自群III之基取代之基等之取代1個或2個以上氫原子之取代基及R'''中所使用之碳原子數1~8之烷基中之取代1個或2個以上氫原子之取代基,可設為選自上述群II-1之基或原子中除硫醇基以外者。具體而言,可設為鹵素原子、氰基、硝基、-CO-H、羥基、-NH 2、-C(R')=N-OH、-COOH或-SO 3H。 The substituents replacing one or more hydrogen atoms in the aliphatic alkyl group, aromatic alkyl ring-containing group, heterocyclic group or the like substituted with a group selected from Group III in X1 and the substituents replacing one or more hydrogen atoms in the alkyl group having 1 to 8 carbon atoms used in R''' may be groups or atoms selected from Group II-1 except for thiol groups. Specifically, they may be halogen atoms, cyano groups, nitro groups, -CO-H, hydroxyl groups , -NH2, -C(R')=N-OH, -COOH or -SO3H .
以下,自組合物之保存穩定性及低溫接著性之平衡性出發,進一步說明由X 1表示之較佳之基之例示。 作為上述X 1所表示之二價之碳原子數1~40之未經取代或具有取代基之脂肪族烴基,例如可較佳地例舉:亞甲基、伸乙基、伸丙基、伸丁基、丁二基等伸烷基或其亞甲基被取代為選自上述群III之基之基及該等基經上述取代基取代之基。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 Below, from the perspective of the balance between the storage stability and low-temperature adhesiveness of the composition, examples of preferred groups represented by X1 are further described. As the divalent aliphatic alkyl group having 1 to 40 carbon atoms, which is unsubstituted or substituted, represented by X1, for example, preferably alkylene groups such as methylene, ethylene, propylene, butylene, butanediyl, or groups in which the methylene groups are substituted with groups selected from the above group III, and groups in which these groups are substituted with the above substituents, can be exemplified. The reason is that the above composition will have a better balance between the storage stability and low-temperature adhesiveness.
作為上述X 1所表示之三價之碳原子數1~40之未經取代或具有取代基之脂肪族烴基,可較佳地例舉:次丙基、1,1,3-次丁基等次烷基或其1個以上亞甲基被取代為選自群III之基之基及該等基中之1個或2個氫原子被上述取代基取代之基。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 As the trivalent aliphatic alkyl group having 1 to 40 carbon atoms represented by X1 , preferably, alkylene groups such as propylene, 1,1,3-butylene, or one or more methylene groups thereof are substituted with groups selected from Group III, and groups in which one or two hydrogen atoms are substituted with the above-mentioned substituents. The reason for this is that the above-mentioned composition will have a better balance between storage stability and low-temperature adhesiveness.
作為上述X 1所表示之四價之碳原子數1~40之未經取代或具有取代基之脂肪族烴基或該脂肪族烴基中之亞甲基被取代為選自群III之基之基的較佳例,可例舉:包含多元醇之殘基(例如,下文所述之通式(X3)所表示之基)之基及該等基經上述取代基取代之基。 Preferred examples of the tetravalent aliphatic alkyl group having 1 to 40 carbon atoms, which is unsubstituted or has a substituent, or a group in which the methylene group in the aliphatic alkyl group is substituted with a group selected from Group III, include groups comprising a residual group of a polyol (for example, a group represented by the general formula (X3) described below) and groups in which these groups are substituted with the above-mentioned substituents.
作為上述X 1所表示之六價之碳原子數1~40之未經取代或具有取代基之脂肪族烴基或該脂肪族烴基中之亞甲基被取代為選自群III之基之基的較佳例,可例舉:包含多元醇之殘基(例如,下文所述之通式(X4)所表示之基)之基及該等基經上述取代基取代之基。 Preferred examples of the hexavalent aliphatic hydrocarbon group having 1 to 40 carbon atoms, which is unsubstituted or has a substituent, or a group in which the methylene group in the aliphatic hydrocarbon group is substituted with a group selected from Group III, include groups comprising a residual group of a polyol (for example, a group represented by the general formula (X4) described below) and groups in which these groups are substituted with the above-mentioned substituents.
作為上述X 1所表示之二價之碳原子數6~40之未經取代或具有取代基之含芳香族烴環之基或其亞甲基被取代為選自群III之基之基的較佳例,例如可例舉:伸苯基、伸萘基等伸芳基、鄰苯二酚、雙酚、該等之環氧烷加成物等二官能酚之殘基;2,4,8,10-四氧雜螺[5,5]十一烷等及該等基經上述取代基取代之基。 Preferred examples of the divalent unsubstituted or substituted aromatic hydrocarbon-containing group having 6 to 40 carbon atoms represented by X1 above, or a group in which the methylene group thereof is substituted with a group selected from Group III, include: arylene groups such as phenylene and naphthylene, residues of bifunctional phenols such as o-catechin, bisphenol, and oxirane adducts thereof; 2,4,8,10-tetraoxaspiro[5,5]undecane, and groups in which these groups are substituted with the above substituents.
作為上述X 1所表示之三價之碳原子數6~40之未經取代或具有取代基之含芳香族烴環之基,例如可例舉:苯基-1,3,5-三亞甲基及該等基經上述取代基取代之基。 Examples of the trivalent unsubstituted or substituted aromatic hydrocarbon ring-containing group having 6 to 40 carbon atoms represented by X1 include phenyl-1,3,5-trimethylene and groups in which these groups are substituted by the above-mentioned substituents.
作為上述X 1所表示之二價之碳原子數2~20之未經取代或具有取代基之含雜環基,例如可例舉:具有吡啶環、嘧啶環、哌啶環、哌𠯤環、三𠯤環、呋喃環、噻吩環、吲哚環等雜環之基及該等基之1個或2個以上氫原子經上述取代基取代之基。 作為上述X 1所表示之三價之碳原子數2~20之未經取代或具有取代基之含雜環基,可例舉:具有異三聚氰酸環或三𠯤環之基及該等基之1個或2個以上氫原子經上述取代基取代之基。 Examples of the divalent heterocyclic group having 2 to 20 carbon atoms and not substituted or having a substituent include groups having a heterocyclic ring such as a pyridine ring, a pyrimidine ring, a piperidine ring, a piperidine ring, a trithion ring, a furan ring, a thiophene ring, an indole ring, and groups in which one or two or more hydrogen atoms of the groups are substituted by the above substituents. Examples of the trivalent heterocyclic group having 2 to 20 carbon atoms and not substituted or having a substituent include groups having an isocyanuric acid ring or a trithion ring, and groups in which one or two or more hydrogen atoms of the groups are substituted by the above substituents.
作為上述X 1所表示之四價之碳原子數2~20之未經取代或具有取代基之含雜環基,可例舉:具有甘脲基之基及該基之氫原子被上述取代基取代之基。 Examples of the tetravalent unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms represented by X1 include groups having a glycoluril group and groups in which the hydrogen atom of the group is substituted by the above-mentioned substituent.
於本發明中,就組合物之保存穩定性及低溫接著性之平衡性之觀點而言,作為X 1,較佳為脂肪族烴基、含芳香族烴環之基及含雜環基中之1個或2個以上亞甲基被取代為選自群III之基,其中較佳為1個或2個以上亞甲基被取代為-O-CO-或-CO-O-,特佳為n1個亞甲基被取代為-O-CO-或-CO-O-。 In the present invention, from the viewpoint of the balance between the storage stability and low temperature adhesiveness of the composition, X 1 is preferably an aliphatic alkyl group, an aromatic alkyl ring-containing group, or a heterocyclic group in which one or more methylene groups are substituted with a group selected from Group III, and more preferably one or more methylene groups are substituted with -O-CO- or -CO-O-, and particularly preferably n1 methylene groups are substituted with -O-CO- or -CO-O-.
於本發明中,較佳為n1為2~8,其中較佳為2~6,特佳為3~4。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the present invention, n1 is preferably 2 to 8, more preferably 2 to 6, and particularly preferably 3 to 4. The reason for this is that the above composition has a better balance between storage stability and low-temperature adhesion.
於本發明中,就組合物之保存穩定性及低溫接著性之平衡性之方面而言,較佳為上述X 1具有下述X1~X6之任一者所表示之結構,就組合物之保存穩定性及硬化性之平衡性之方面而言,特佳為具有X2~X6之任一者所表示之結構,尤佳為具有X2、X3或X5所表示之結構。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 In the present invention, in terms of the balance between the storage stability and low-temperature adhesiveness of the composition, it is preferred that the above X1 has a structure represented by any one of the following X1 to X6. In terms of the balance between the storage stability and curability of the composition, it is particularly preferred that it has a structure represented by any one of X2 to X6, and it is particularly preferred that it has a structure represented by X2, X3 or X5. The reason for this is that the above composition will have a better balance between the storage stability and low-temperature adhesiveness.
[化12] (式中,a11為1~20之整數;*表示鍵結部位) [Chemistry 12] (In the formula, a11 is an integer from 1 to 20; * indicates the bonding site)
於本發明中,其中就組合物之保存穩定性及低溫接著性之平衡性之方面而言,上述式(A)所表示之化合物特佳為下述式(A1)~(A6)之任一者所表示之化合物,更佳為以(A2)~(A6)之任一者表示,尤佳為以(A2)、(A3)或(A5)之任一者表示。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 [化13] (式中,L 11、L 12、L 21、L 22、L 23、L 31、L 32、L 33、L 34、L 41、L 42、L 43、L 44、L 45、L 46、L 51、L 52、L 53、L 61、L 62、L 63及L 64(以下亦記載為「L 11~L 64」)分別獨立地表示直鏈或分支之碳原子數1~10之伸烷基;R 64、R 65及R 66分別獨立地表示氫原子或碳原子數1~20之脂肪族烴基;a21表示1~20之整數) In the present invention, in terms of the balance between the storage stability and low-temperature adhesion of the composition, the compound represented by the above formula (A) is preferably a compound represented by any one of the following formulas (A1) to (A6), more preferably represented by any one of (A2) to (A6), and particularly preferably represented by any one of (A2), (A3) or (A5). The reason is that the above composition will have a better balance between the storage stability and low-temperature adhesion. [Chemistry 13] ( wherein, L11 , L12, L21 , L22 , L23 , L31, L32 , L33 , L34 , L41 , L42 , L43 , L44 , L45 , L46 , L51 , L52 , L53 , L61 , L62 , L63 and L64 (hereinafter also referred to as " L11 to L64 ") independently represent a linear or branched alkylene group having 1 to 10 carbon atoms; R64 , R65 and R66 independently represent a hydrogen atom or an aliphatic hydrocarbon group having 1 to 20 carbon atoms; a21 represents an integer from 1 to 20)
作為上述L 11~L 64所表示之碳原子數1~10之伸烷基,可例舉:自碳原子數1~10之烷基除去1個氫原子而得之結構之二價基。 作為上述碳原子數1~10之烷基,例如可使用上述R 1等中之碳原子數1~20之烷基中特定碳原子數者。 又,作為R 64、R 65及R 66所使用之碳原子數1~20之脂肪族烴基,可與上述R 1等中之碳原子數1~20之脂肪族烴基相同。 關於L 11~L 64所表示之碳原子數1~10之伸烷基以及R 64、R 65及R 66所表示之碳原子數1~20之脂肪族烴基,該等基中之1個或2個以上氫原子經取代或未經取代,作為經取代之情形時之取代基,可設為與取代上述X 1所表示之脂肪族烴基之1個或2個以上氫原子之取代基相同之內容。 Examples of the alkylene group having 1 to 10 carbon atoms represented by L 11 to L 64 include a divalent group having a structure obtained by removing one hydrogen atom from an alkyl group having 1 to 10 carbon atoms. As the alkyl group having 1 to 10 carbon atoms, for example, the alkyl group having 1 to 20 carbon atoms in R 1 etc. mentioned above can be used. Furthermore, the aliphatic alkyl group having 1 to 20 carbon atoms used as R 64 , R 65 and R 66 can be the same as the aliphatic alkyl group having 1 to 20 carbon atoms in R 1 etc. mentioned above. With respect to the alkylene groups having 1 to 10 carbon atoms represented by L 11 to L 64 and the aliphatic alkyl groups having 1 to 20 carbon atoms represented by R 64 , R 65 and R 66 , one or more hydrogen atoms in these groups may be substituted or unsubstituted. In the case of being substituted, the substituents may be the same as the substituents which replace one or more hydrogen atoms of the aliphatic alkyl group represented by X 1 above.
就組合物之保存穩定性及低溫接著性之平衡性之方面而言,上述L 11~L 64較佳為碳原子數1~5之伸烷基,其中較佳為直鏈之碳原子數1~3之伸烷基或分支之3~5之伸烷基,尤佳為直鏈之碳原子數1~3之伸烷基。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 In terms of the balance between storage stability and low temperature adhesiveness of the composition, L 11 to L 64 are preferably alkylene groups having 1 to 5 carbon atoms, preferably linear alkylene groups having 1 to 3 carbon atoms or branched alkylene groups having 3 to 5 carbon atoms, and more preferably linear alkylene groups having 1 to 3 carbon atoms. The reason is that the above composition has a better balance between storage stability and low temperature adhesiveness.
作為上述L 11~L 64所表示之直鏈之碳原子數1~3之伸烷基,具體而言,可例舉:亞甲基、伸乙基(乙烷-1,2-二基)、伸丙基(丙烷-1,3-二基)等。 作為上述L 11~L 64所表示之分支之3~5之伸烷基,具體而言,可例舉:丙烷-1,1-二基、丙烷-1,2-二基、丁烷-1,1-二基、丁烷-1,2-二基、丁烷-1,3-二基、戊烷-1,1-二基、戊烷-1,2-二基、戊烷-1,3-二基、戊烷-1,4-二基等。 Specific examples of the linear alkylene groups having 1 to 3 carbon atoms represented by L 11 to L 64 include methylene, ethylene (ethane-1,2-diyl), propylene (propane-1,3-diyl), etc. Specific examples of the branched alkylene groups having 3 to 5 carbon atoms represented by L 11 to L 64 include propane-1,1-diyl, propane-1,2-diyl, butane-1,1-diyl, butane-1,2-diyl, butane-1,3-diyl, pentane-1,1-diyl, pentane-1,2-diyl, pentane-1,3-diyl, pentane-1,4-diyl, etc.
(A1)中之L 11及L 12可分別為相同之基,亦可為不同之基,就合成容易之觀點而言,較佳為相同之基。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。此種情況,對於(A2)之L 21~L 23、(A3)之L 31~L 34、(A4)之L 41~L 46、(A5)之L 51~L 53、(A6)之L 61~L 64亦相同。 L11 and L12 in (A1) may be the same group or different groups. From the viewpoint of easy synthesis, they are preferably the same group. The reason is that the above composition has a better balance between storage stability and low-temperature adhesion. The same applies to L21 to L23 in (A2), L31 to L34 in (A3), L41 to L46 in (A4), L51 to L53 in (A5), and L61 to L64 in (A6).
於本發明中,較佳為上述R 64為碳原子數1~20之烷基,其中較佳為碳原子數1~10之烷基,尤佳為碳原子數1~3之烷基較。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 In the present invention, it is preferred that R 64 is an alkyl group having 1 to 20 carbon atoms, preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 3 carbon atoms. The reason is that the above composition has a better balance between storage stability and low-temperature adhesion.
關於硫醇化合物,就組合物之保存穩定性及硬化性之平衡性之方面而言,較佳為分子量為100以上1,000以下,更佳為300以上900以下,尤佳為350以上800以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。Regarding the thiol compound, in terms of the balance between storage stability and curability of the composition, the molecular weight is preferably 100 to 1,000, more preferably 300 to 900, and particularly preferably 350 to 800. The reason is that the above composition will have a better balance between storage stability and low-temperature adhesiveness.
作為上述硫醇化合物之硫醇基當量,即硫醇化合物之分子量除以硫醇基之數所得之值(硫醇化合物之分子量/硫醇基SH之數),較佳為500以下,其中較佳為100以上400以下,尤佳為120以上300以下。其原因在於:藉由使上述硫醇化合物之硫醇基當量為上述範圍,上述組合物會成為保存穩定性及硬化性之平衡性優異者。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。The thiol equivalent of the thiol compound, i.e., the value obtained by dividing the molecular weight of the thiol compound by the number of thiol groups (molecular weight of the thiol compound/number of thiol groups SH), is preferably 500 or less, more preferably 100 or more and 400 or less, and particularly preferably 120 or more and 300 or less. The reason is that by making the thiol equivalent of the thiol compound within the above range, the above composition has an excellent balance between storage stability and curing properties. The reason is that the above composition has an even better balance between storage stability and low-temperature adhesiveness.
作為硫醇化合物,亦可使用市售品。作為硫醇化合物之市售品之例,例如可例舉:十二烷硫醇(單官能硫醇化合物)、Karenz MT(註冊商標)BD(商品名,2官能硫醇化合物,1,4-雙(3-巰基丁醯氧基)丁烷,昭和電工(股))、Karenz MT(註冊商標)NR(商品名,3官能硫醇化合物,1,3,5-三(3-巰基丁醯氧基乙基)-1,3,5-三𠯤-2,4,6(1H,3H,5H)-三酮,昭和電工(股))、Karenz MT(註冊商標)PE(商品名,4官能硫醇化合物,季戊四醇四(3-巰基丁酸酯)、昭和電工(股))、EGMP-4(商品名,2官能硫醇化合物,四乙二醇雙(3-巰基丙酸酯),SC有機化學(股))、TMMP(商品名,3官能硫醇化合物,三羥甲基丙烷三(3-巰基丙酸酯),SC有機化學(股))、TEMPIC(商品名,3官能硫醇化合物,三-[(3-巰基丙醯氧基)-乙基]-異氰尿酸酯,SC有機化學(股))、PEMP(商品名,4官能硫醇化合物,季戊四醇四(3-巰基丙酸酯),SC有機化學(股)),DPMP(商品名,6官能硫醇化合物,二季戊四醇六(3-巰基丙酸酯),SC有機化學(股))等。As the thiol compound, a commercially available product may also be used. Examples of commercially available products of the thiol compound include: dodecanethiol (monofunctional thiol compound), Karenz MT (registered trademark) BD (trade name, bifunctional thiol compound, 1,4-bis(3-butylbutyryloxy)butane, Showa Denko KK), Karenz MT (registered trademark) NR (trade name, trifunctional thiol compound, 1,3,5-tris(3-butylbutyryloxyethyl)-1,3,5-tris(1H,3H,5H)-trione, Showa Denko KK), Karenz MT (registered trademark) PE (trade name, 4-functional thiol compound, pentaerythritol tetra(3-butylbutyrate), Showa Denko Co., Ltd.), EGMP-4 (trade name, 2-functional thiol compound, tetraethylene glycol bis(3-butylpropionate), SC Organic Chemical Co., Ltd.), TMMP (trade name, 3-functional thiol compound, trihydroxymethylpropane tri(3-butylpropionate), SC Organic Chemical Co., Ltd.), TE MPIC (trade name, trifunctional thiol compound, tris-[(3-butylpropionyloxy)-ethyl]-isocyanurate, SC Organic Chemicals (Co., Ltd.)), PEMP (trade name, quadrifunctional thiol compound, pentaerythritol tetrakis(3-butylpropionate), SC Organic Chemicals (Co., Ltd.)), DPMP (trade name, hexafunctional thiol compound, dipentaerythritol hexa(3-butylpropionate), SC Organic Chemicals (Co., Ltd.)), etc.
硫醇成分之含量較佳為於上述組合物100質量份中為1質量份以上80質量份以下,更佳為10質量份以上70質量份以下,進而較佳為20質量份以上50質量份以下,尤佳為25質量份以上45質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。The content of the thiol component is preferably 1 to 80 parts by mass, more preferably 10 to 70 parts by mass, further preferably 20 to 50 parts by mass, and particularly preferably 25 to 45 parts by mass, in 100 parts by mass of the composition. The reason is that the composition has a better balance between storage stability and low-temperature adhesion.
硫醇成分之含量更佳為於組合物之固形物成分100質量份中為10質量份以上70質量份以下,進而較佳為20質量份以上50質量份以下,尤佳為25質量份以上45質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性優異者。The content of the thiol component is preferably 10 to 70 parts by mass, more preferably 20 to 50 parts by mass, and particularly preferably 25 to 45 parts by mass, based on 100 parts by mass of the solid component of the composition. The reason for this is that the composition has an excellent balance between storage stability and low-temperature adhesion.
硫醇成分之含量更佳為於化合物1、硫醇成分及環狀醚成分之合計100質量份中為10質量份以上70質量份以下,進而較佳為20質量份以上60質量份以下,尤佳為25質量份以上50質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性優異者。The content of the thiol component is more preferably 10 parts by mass to 70 parts by mass, more preferably 20 parts by mass to 60 parts by mass, and particularly preferably 25 parts by mass to 50 parts by mass, based on 100 parts by mass of the total of compound 1, the thiol component, and the cyclic ether component. The reason for this is that the above composition has an excellent balance between storage stability and low-temperature adhesiveness.
關於硫醇成分中之硫醇基之合計個數(單位:mol),於將組合物中之環狀醚成分中之環狀醚基之合計個數設為100之情形時,較佳為80以上150以下,較佳為90以上120以下,較佳為95以上110以下。其原因在於:上述組合物會成為接著力優異者。The total number of thiol groups in the thiol component (unit: mol) is preferably 80 to 150, more preferably 90 to 120, and more preferably 95 to 110, when the total number of cyclic ether groups in the cyclic ether component in the composition is 100. The reason for this is that the above composition has excellent bonding strength.
3.環狀醚成分 環狀醚成分係指為具有環狀醚基之化合物(以下,有時稱為環狀醚化合物)之1種或2種以上之成分。 環狀醚化合物係作為除上述化合物1及硫醇化合物以外之成分包含於組合物中者,具有硫醇基及環狀醚基兩者之化合物不屬於環狀醚化合物,而屬於硫醇成分。 作為環狀醚基,只要為於環結構中具有至少1個醚鍵者即可,可例舉:環氧基、氧雜環丁基等。即,作為環狀醚化合物,可例舉:具有環氧基之環氧化合物、具有氧雜環丁基之氧雜環丁烷化合物。作為環狀醚化合物,就保存穩定性之方面而言,較佳為使用不具有鹼基產生能力者。又,具有環狀醚基、以及乙烯性不飽和基、羧基、酸酐結構、酚基等羥基之化合物亦視為屬於環狀醚化合物。 作為乙烯性不飽和基,可例舉:丙烯醯基、甲基丙烯醯基、乙烯基等。 又,具有環狀醚基同時具有烷氧基矽烷基之化合物通常被分類為矽烷偶合劑,視為不屬於上述環狀醚化合物。例如γ-縮水甘油氧基丙基三甲氧基矽烷、γ-縮水甘油氧基丙基甲基二乙氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧基矽烷等具有環氧基同時具有烷氧基矽烷基之化合物通常被分類為矽烷偶合劑,視為不屬於環氧化合物。 3. Cyclic ether component The cyclic ether component refers to one or more components of a compound having a cyclic ether group (hereinafter, sometimes referred to as a cyclic ether compound). The cyclic ether compound is included in the composition as a component other than the above-mentioned compound 1 and the thiol compound. A compound having both a thiol group and a cyclic ether group does not belong to the cyclic ether compound but to the thiol component. As the cyclic ether group, any one having at least one ether bond in the ring structure may be used, and examples thereof include an epoxy group and an oxycyclobutyl group. That is, as the cyclic ether compound, examples thereof include an epoxy compound having an epoxy group and an oxycyclobutane compound having an oxycyclobutyl group. As a cyclic ether compound, it is preferred to use one that does not have the ability to generate a base group in terms of storage stability. In addition, compounds having a cyclic ether group and a hydroxyl group such as an ethylenic unsaturated group, a carboxyl group, an anhydride structure, and a phenol group are also considered to belong to the cyclic ether compound. As an ethylenic unsaturated group, examples include: an acryloyl group, a methacryloyl group, a vinyl group, etc. In addition, a compound having a cyclic ether group and an alkoxysilyl group is generally classified as a silane coupling agent and is considered not to belong to the above-mentioned cyclic ether compound. For example, compounds with both epoxy groups and alkoxysilyl groups, such as γ-glycidyloxypropyltrimethoxysilane, γ-glycidyloxypropylmethyldiethoxysilane, and β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, are usually classified as silane coupling agents and are not considered epoxy compounds.
作為環狀醚化合物中之環狀醚基之含有數量,可視所需硬化性等適當設定。環狀醚基之含有數量只要環狀醚化合物每1個分子為1個以上即可,可設為2個以上10個以下,其中,較佳為2個以上8個以下。其原因在於:使用此種環狀醚化合物之組合物成為保存穩定性及硬化性之平衡性優異者。又,其原因在於:於用作接著劑之情形時,會發揮優異之接著容易性及接著性。 作為環狀醚化合物中之環狀醚基當量,只要為可獲得所需保存穩定性及低溫接著性者即可,較佳為100以上1,500以下,其中較佳為130以上500以下,尤佳為150以上400以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 The amount of cyclic ether groups in the cyclic ether compound can be appropriately set according to the required curability, etc. The amount of cyclic ether groups can be set to more than 1 per molecule of the cyclic ether compound, and can be set to more than 2 and less than 10, preferably more than 2 and less than 8. The reason is that the composition using such a cyclic ether compound has an excellent balance between preservation stability and curability. In addition, the reason is that when used as an adhesive, it will show excellent bonding ease and bonding properties. The cyclic ether group equivalent in the cyclic ether compound can be any amount that can achieve the desired storage stability and low-temperature adhesion, preferably 100 to 1,500, preferably 130 to 500, and particularly preferably 150 to 400. The reason is that the above composition will have a better balance between storage stability and low-temperature adhesion.
作為本發明之組合物之一實施方式,較佳為包含環氧化合物作為環狀醚成分。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。As one embodiment of the composition of the present invention, it is preferred to include an epoxy compound as the cyclic ether component. The reason is that the above composition will have a better balance between storage stability and low-temperature adhesion.
(1)環氧化合物 作為環氧化合物,包括環狀醚化合物中、具有環氧基作為環狀醚基之所有化合物。例如環氧化合物中包括1分子中包含環氧基、及氧雜環丁基等其他環狀醚基之化合物。 作為此種環氧化合物,可例舉:芳香族環氧化合物、脂肪族環氧化合物及脂環式環氧化合物等。 (1-1)芳香族環氧化合物 芳香族環氧化合物係具有芳香族環及環氧基而不具有氧化環烯烴結構者。 作為此種芳香族環氧化合物,亦可使用具有至少1個芳香族烴環之化合物。作為芳香族環氧化合物,例如可例舉:雙酚A、雙酚F等具有至少1個芳香族環之多酚或其環氧烷加成物之聚縮水甘油醚化物;環氧酚醛清漆樹脂(苯酚酚醛清漆型環氧化合物);間苯二酚或對苯二酚、鄰苯二酚等具有2個以上酚性羥基之芳香族化合物之聚縮水甘油醚化物;苯基二甲醇或苯基二乙醇、苯基二丁醇等具有2個以上醇性羥基之芳香族化合物之聚縮水甘油醚化物;鄰苯二甲酸、對苯二甲酸、偏苯三甲酸等具有2個以上羧酸之多元酸芳香族化合物之聚縮水甘油酯;二乙烯苯之二環氧化物等。又,亦可例舉使於包含橡膠成分且包含可與環氧基反應而形成共價鍵之基(以下,亦稱為「環氧基反應性基」)之主鏈骨架上具有2個以上縮水甘油醚基的芳香族環氧化合物反應所獲得之化合物。 作為上述芳香族環氧化合物之環氧當量,只要為可獲得所需保存穩定性及低溫接著性者即可,較佳為100以上500以下,其中較佳為130以上400以下,尤佳為150以上350以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 (1) Epoxy compounds Epoxy compounds include all compounds having an epoxy group as a cyclic ether group among cyclic ether compounds. For example, epoxy compounds include compounds containing an epoxy group and other cyclic ether groups such as cyclobutylene oxide in one molecule. Examples of such epoxy compounds include aromatic epoxy compounds, aliphatic epoxy compounds, and alicyclic epoxy compounds. (1-1) Aromatic epoxy compounds Aromatic epoxy compounds are compounds having an aromatic ring and an epoxy group but not an oxyolefin hydrocarbon structure. As such aromatic epoxy compounds, compounds having at least one aromatic hydrocarbon ring can also be used. Examples of the aromatic epoxy compound include: polyglycidyl ethers of polyphenols having at least one aromatic ring such as bisphenol A and bisphenol F or their alkylene oxide adducts; epoxy novolac resins (phenol novolac type epoxy compounds); polyglycidyl ethers of aromatic compounds having two or more phenolic hydroxyl groups such as resorcinol, hydroquinone, or catechol; polyglycidyl ethers of aromatic compounds having two or more alcoholic hydroxyl groups such as phenyl dimethanol, phenyl diethanol, or phenyl dibutyl alcohol; polyglycidyl esters of polyacid aromatic compounds having two or more carboxylic acids such as phthalic acid, terephthalic acid, and trimellitic acid; divinylbenzene diepoxide, etc. In addition, a compound obtained by reacting an aromatic epoxy compound having two or more glycidyl ether groups on a main chain skeleton containing a rubber component and a group that can react with an epoxy group to form a covalent bond (hereinafter, also referred to as an "epoxy-reactive group") can also be cited. The epoxy equivalent of the aromatic epoxy compound can be any one that can obtain the required storage stability and low-temperature adhesion, preferably 100 to 500, preferably 130 to 400, and particularly preferably 150 to 350. The reason is that the above composition will have a better balance between storage stability and low-temperature adhesion.
作為芳香族環氧化合物,可使用市售品,例如可例舉:Denacol EX-146、Denacol EX-147、Denacol EX-201、Denacol EX-203、Denacol EX-711、Denacol EX-721、Oncoat EX-1020、Oncoat EX-1030、Oncoat EX-1040、Oncoat EX-1050、Oncoat EX-1051、Oncoat EX-1010、Oncoat EX-1011、Oncoat 1012(Nagase chemteX(股)公司製造);OGSOL PG-100、OGSOL EG-200、OGSOL EG-210、OGSOL EG-250(Osaka Gas Chemicals(股)公司製造);HP4032、HP4032D、HP4700(DIC(股)公司製造);ESN-475V(東都化成(股)公司製造);YX8800(三菱化學(股)公司製造);Marproof G-0105SA、Marproof G-0130SP(日油(股)公司製造);EPICLON N-665、EPICLON HP-7200(DIC(股)公司製造);EOCN-1020、EOCN-102S、EOCN-103S、EOCN-104S、XD-1000、NC-3000、EPPN-501H、EPPN-501HY、EPPN-502H、NC-7000L(日本化藥(股)公司製造);Adeka Resin EP-4000、Adeka Resin EP-4005、Adeka Resin EP-4100、Adeka Resin EP-4901((股)ADEKA公司製造);TECHMORE VG-3101L(Printec(股)公司製造)等。As the aromatic epoxy compound, commercially available products can be used, for example, Denacol EX-146, Denacol EX-147, Denacol EX-201, Denacol EX-203, Denacol EX-711, Denacol EX-721, Oncoat EX-1020, Oncoat EX-1030, Oncoat EX-1040, Oncoat EX-1050, Oncoat EX-1051, Oncoat EX-1010, Oncoat EX-1011, Oncoat 1012 (manufactured by Nagase ChemteX Co., Ltd.); OGSOL PG-100, OGSOL EG-200, OGSOL EG-210, OGSOL EG-250 (manufactured by Osaka Gas Chemicals Co., Ltd.); HP4032, HP4032D, HP4700 (manufactured by DIC Corporation); ESN-475V (manufactured by Tohto Kasei Corporation); YX8800 (manufactured by Mitsubishi Chemical Corporation); Marproof G-0105SA, Marproof G-0130SP (manufactured by NOF Corporation); EPICLON N-665, EPICLON HP-7200 (manufactured by DIC Corporation); EOCN-1020, EOCN-102S, EOCN-103S, EOCN-104S, XD-1000, NC-3000, EPPN-501H, EPPN-501HY, EPPN-502H, NC-7000L (manufactured by Nippon Kayaku Co., Ltd.); Adeka Resin EP-4000, Adeka Resin EP-4005, Adeka Resin EP-4100, Adeka Resin EP-4901 (manufactured by ADEKA Corporation); TECHMORE VG-3101L (manufactured by Printec Corporation), etc.
於本發明中,較佳為芳香族環氧化合物包含具有至少1個芳香族環之多酚或其環氧烷加成物之聚縮水甘油醚化物,尤佳為包含下述通式(14)所表示之化合物。其原因在於:藉由包含上述化合物,上述組合物會成為保存穩定性及低溫接著性之平衡性更優異並且組合物之製備容易性、塗佈性之平衡性亦優異者。In the present invention, the aromatic epoxy compound preferably comprises a polyglycidyl ether of a polyphenol having at least one aromatic ring or an alkylene oxide adduct thereof, and more preferably comprises a compound represented by the following general formula (14). The reason is that by including the above compound, the above composition has a better balance between storage stability and low-temperature adhesion, and the composition also has a better balance between ease of preparation and coating properties.
[化14] [Chemistry 14]
通式(14)中,X 11可例舉碳原子數6~40之含芳香族烴環之基。碳原子數6~40之含芳香族烴環之基中之1個或2個以上亞甲基可被-O-取代,碳原子數6~40之含芳香族烴環之基中之1個或2個以上氫原子可被羥基取代。 n11表示1~10之整數。 In the general formula (14), X11 can be exemplified by a group containing an aromatic hydrocarbon ring having 6 to 40 carbon atoms. One or more methylene groups in the group containing an aromatic hydrocarbon ring having 6 to 40 carbon atoms may be substituted by -O-, and one or more hydrogen atoms in the group containing an aromatic hydrocarbon ring having 6 to 40 carbon atoms may be substituted by a hydroxyl group. n11 represents an integer of 1 to 10.
作為碳原子數6~40之含芳香族烴環之基,可使用自一價之碳原子數6~40之含芳香族烴環之基除去「n11-1」個氫原子而得之基。As the aromatic hydrocarbon ring-containing group having 6 to 40 carbon atoms, a group obtained by removing "n11-1" hydrogen atoms from a monovalent aromatic hydrocarbon ring-containing group having 6 to 40 carbon atoms can be used.
作為X 11所表示之一價之碳原子數6~40之含芳香族烴環之基,只要為包含芳香族烴環而不包含雜環之烴基即可,例如可例舉與上述X 1等中所使用之碳原子數6~40之含芳香族烴環之基相同之基。 作為X 11所表示之含芳香族烴環之基,更具體而言,亦可例舉將芳基與直鏈或分支之烷基組合而成之基。例如可例舉:直鏈或分支之烷基中之1個或2個以上氫原子被芳基取代之基、直鏈或分支之烷基中之1個或2個以上亞甲基被取代為自芳基除去1個氫原子而得之基之基、芳基之1個或2個以上氫原子被直鏈或分支之烷基取代之基、苯酚酚醛清漆之殘基等。 再者,關於上述芳基及烷基之內容,亦可使用與上述R 1等中所使用之芳基及烷基相同之基。 The monovalent aromatic hydrocarbon ring-containing group having 6 to 40 carbon atoms represented by X11 may be any alkyl group containing an aromatic hydrocarbon ring but not containing a heterocyclic ring, and examples thereof include the same groups as the aromatic hydrocarbon ring-containing group having 6 to 40 carbon atoms used in X1 , etc. More specifically, the aromatic hydrocarbon ring-containing group represented by X11 may be a group formed by combining an aryl group with a linear or branched alkyl group. For example, there can be mentioned: a group in which one or two or more hydrogen atoms in a straight or branched alkyl group are replaced by an aryl group, a group in which one or two or more methylene groups in a straight or branched alkyl group are replaced by a group obtained by removing one hydrogen atom from an aryl group, a group in which one or two or more hydrogen atoms in an aryl group are replaced by a straight or branched alkyl group, a residue of phenol novolac, etc. Furthermore, regarding the above-mentioned aryl group and alkyl group, the same groups as the aryl group and alkyl group used in the above-mentioned R1 , etc. can also be used.
n11較佳為1~7之整數,其中較佳為2~3之整數,尤佳為2。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者,同時會成為組合物之製備容易性、塗佈性之平衡性亦優異者。n11 is preferably an integer of 1 to 7, more preferably an integer of 2 to 3, and particularly preferably 2. The reason is that the composition has a better balance between storage stability and low-temperature adhesion, and also has a better balance between ease of preparation and coating properties.
作為X 11所表示之一價之碳原子數6~40之含芳香族烴環之基,較佳為碳原子數6~20之直鏈或分支之烷基中之1個或2個以上亞甲基被取代為自芳基除去1個氫原子而得之基的基,其中較佳為直鏈或分支之烷基中之1個或2個以上亞甲基被取代為自芳基除去1個氫原子而得之基的碳原子數13~18之基。於n11為2之情形時,通式(14)所表示之化合物尤佳為X 11為通式(6-1)所表示之基。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異並且組合物之製備容易性、塗佈性之平衡性亦優異者。 As the monovalent aromatic hydrocarbon ring-containing group having 6 to 40 carbon atoms represented by X11 , it is preferably a group in which one or more methylene groups in a linear or branched alkyl group having 6 to 20 carbon atoms are replaced by a group obtained by removing one hydrogen atom from an aryl group, and it is more preferably a group in which one or more methylene groups in a linear or branched alkyl group having 13 to 18 carbon atoms are replaced by a group obtained by removing one hydrogen atom from an aryl group. When n11 is 2, the compound represented by the general formula (14) is particularly preferably a group in which X11 is represented by the general formula (6-1). The reason for this is that the above-mentioned composition has a better balance between storage stability and low-temperature adhesiveness, and the composition also has a better balance between ease of preparation and coating properties.
[化15] (通式(6-1)中,R 62-1及R 63-1分別獨立地表示氫原子或碳原子數1~4之烷基, r1及s1分別獨立地表示0~5之數, R 61-1表示下述通式(7)所表示之二價之芳香族環含有基;*表示鍵結鍵) [Chemistry 15] (In the general formula (6-1), R 62-1 and R 63-1 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, r1 and s1 each independently represent a number from 0 to 5, R 61-1 represents a divalent aromatic ring-containing group represented by the following general formula (7); * represents a bond)
[化16] [Chemistry 16]
(通式(7)中,R 71、R 72、R 73、R 74、R 75、R 76、R 77、R 78、R 79、R 80、R 81、R 82、R 83、R 84、R 85、R 86及R 87分別獨立地表示氫原子或碳原子數1~4之烷基, Z 3及Z 4分別獨立地表示單鍵或碳原子數1~4之伸烷基,伸烷基中之氫原子可經甲基或鹵素原子取代, t表示0~5之整數, u表示0~30之整數, *表示鍵結部位) (In the general formula (7), R 71 , R 72 , R 73 , R 74 , R 75 , R 76 , R 77 , R 78 , R 79 , R 80 , R 81 , R 82 , R 83 , R 84 , R 85 , R 86 and R 87 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, Z 3 and Z 4 each independently represent a single bond or an alkylene group having 1 to 4 carbon atoms, the hydrogen atom in the alkylene group may be substituted by a methyl group or a halogen atom, t represents an integer from 0 to 5, u represents an integer from 0 to 30, and * represents a bonding site)
作為通式(6-1)之R 62-1及R 63-1所表示之碳原子數1~4之烷基,例如可例舉:甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁基等。 Examples of the alkyl group having 1 to 4 carbon atoms represented by R 62-1 and R 63-1 in the general formula (6-1) include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl and the like.
作為通式(7)之R 71、R 72、R 73、R 74、R 75、R 76、R 77、R 78、R 79、R 80、R 81、R 82、R 83、R 84、R 85、R 86及R 87所表示之碳原子數1~4之烷基,例如可例舉與通式(6-1)之R 62-1及R 63-1所表示之碳原子數1~4之烷基相同之基。 Examples of the alkyl group having 1 to 4 carbon atoms represented by R 71 , R 72 , R 73 , R 74 , R 75 , R 76 , R 77 , R 78 , R 79 , R 80 , R 81 , R 82 , R 83 , R 84 , R 85 , R 86 and R 87 in the general formula (7) include the same groups as the alkyl group having 1 to 4 carbon atoms represented by R 62-1 and R 63-1 in the general formula (6-1).
作為通式(7)之Z 3及Z 4所表示之碳原子數1~4之伸烷基,例如可例舉:次甲基、亞甲基、伸乙基、亞乙基、正伸丙基、亞丙基、亞異丙基、甲基伸乙基、正伸丁基、亞丁基、亞異丁基、第二亞丁基、1,2-二甲基伸乙基、1-甲基伸丙基、2-甲基伸丙基等。 Examples of the alkylene group having 1 to 4 carbon atoms represented by Z3 and Z4 in the general formula (7) include methine, methylene, ethylene, ethylene, n-propylene, propylene, isopropylene, methylethylene, n-butylene, butylene, isobutylene, tert-butylene, 1,2-dimethylethylene, 1-methylpropylene, and 2-methylpropylene.
作為取代通式(7)之Z 3及Z 4所表示之碳原子數1~4之伸烷基中之氫原子的鹵素原子,例如可例舉:氟原子、氯原子、溴原子、碘原子等。 Examples of the halogen atom substituting for the hydrogen atom in the alkylene group having 1 to 4 carbon atoms represented by Z 3 and Z 4 in the general formula (7) include fluorine atom, chlorine atom, bromine atom and iodine atom.
於通式(6-1)中,r1及s1較佳為分別獨立地為0~3之整數,其中較佳為0~2之整數,尤佳為0~1之整數,其中尤佳為0。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In the general formula (6-1), r1 and s1 are preferably independently integers of 0 to 3, preferably integers of 0 to 2, more preferably integers of 0 to 1, and most preferably 0. The reason is that the above composition has a better balance between storage stability and low-temperature adhesion.
於通式(7)中,較佳為R 71、R 72、R 73、R 74、R 75、R 76、R 77、R 78、R 79、R 80、R 81、R 82、R 83、R 84、R 85、R 86及R 87為氫原子或碳原子數1~2之烷基,即氫原子、甲基或乙基,其中較佳為氫原子。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 In the general formula (7), preferably, R 71 , R 72 , R 73 , R 74 , R 75 , R 76 , R 77 , R 78 , R 79 , R 80 , R 81 , R 82 , R 83 , R 84 , R 85 , R 86 and R 87 are hydrogen atoms or alkyl groups having 1 to 2 carbon atoms, i.e., hydrogen atoms, methyl groups or ethyl groups, and hydrogen atoms are preferred. The reason for this is that the above composition has a better balance between storage stability and low-temperature adhesiveness.
於通式(7)中,較佳為Z 3及Z 4分別獨立地為碳原子數1~4之伸烷基,其中較佳為碳原子數2~4之伸烷基,尤佳為碳原子數2~3之伸烷基。 作為Z 3及Z 4中所使用之伸烷基,較佳為亞甲基、亞乙基、伸丙基、亞丙基、亞異丙基等亞烷基等,即上述芳香族環氧化合物為具有雙酚A型結構、雙酚E型結構、雙酚F型結構等雙酚結構之化合物。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 In the general formula (7), Z3 and Z4 are preferably independently an alkylene group having 1 to 4 carbon atoms, preferably an alkylene group having 2 to 4 carbon atoms, and more preferably an alkylene group having 2 to 3 carbon atoms. The alkylene groups used in Z3 and Z4 are preferably alkylene groups such as methylene, ethylene, propylene, propylene, isopropylene, etc., that is, the aromatic epoxy compound is a compound having a bisphenol structure such as a bisphenol A structure, a bisphenol E structure, or a bisphenol F structure. The reason for this is that the above-mentioned composition will have a better balance between storage stability and low-temperature adhesiveness.
於通式(7)中,較佳為t為0~3,其中較佳為0~1。又,較佳為u為0~10,其中較佳為0~5,尤佳為0~2,其中尤佳為0。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。In general formula (7), t is preferably 0 to 3, and more preferably 0 to 1. Also, u is preferably 0 to 10, and more preferably 0 to 5, and more preferably 0 to 2, and most preferably 0. The reason for this is that the above composition has a better balance between storage stability and low-temperature adhesion.
(1-2)脂肪族環氧化合物 作為脂肪族環氧化合物,係具有環氧基並且不含氧化環烯烴結構及芳香族環者。 作為此種脂肪族環氧化合物,具體而言,可例舉:脂肪族醇之縮水甘油醚化物、脂肪族多元醇或其環氧烷加成物之聚縮水甘油醚化物。更具體而言,可例舉:烯丙基縮水甘油醚、丁基縮水甘油醚、2-乙基己基縮水甘油醚、C12~13混合烷基縮水甘油醚、1,4-丁二醇二縮水甘油醚、1,6-己二醇二縮水甘油醚、甘油之三縮水甘油醚、三羥甲基丙烷之三縮水甘油醚、山梨糖醇之四縮水甘油醚、二季戊四醇之六縮水甘油醚、聚乙二醇之二縮水甘油醚、聚丙二醇之二縮水甘油醚、新戊二醇之二縮水甘油醚等多元醇之縮水甘油醚、以及藉由對丙二醇、三羥甲基丙烷、甘油等脂肪族多元醇加成1種或2種以上環氧烷而得之聚醚多元醇之聚縮水甘油醚化物脂肪族高級醇之單縮水甘油醚或環氧化聚丁二烯等。又,亦可例舉使包含橡膠成分並且於包含可與環氧基反應而形成共價鍵之基(以下,亦稱為「環氧基反應性基」)之主鏈骨架上具有2個以上縮水甘油醚基的脂肪族型之縮水甘油醚型環氧化合物反應所獲得之化合物。 又,作為上述脂肪族環氧化合物,亦可使用氫添加雙酚A二縮水甘油醚等芳香族環氧化合物之氫化物。 作為上述脂肪族環氧化合物,亦可使用2,2-雙(羥甲基)-1-丁醇之1,2-環氧基-4-(2-環氧乙烷基)環己烷加成物等具有環氧乙烷基直接藉由單鍵與源自環氧環烷基環之環烷基環鍵結的結構作為結構單元並且具有環氧環烷基環之環氧基彼此聚合的結構作為主鏈結構的化合物。 (1-2) Aliphatic epoxides Aliphatic epoxides are compounds that have an epoxide group and do not contain an oxyethylene structure or an aromatic ring. Specific examples of such aliphatic epoxides include glycidyl ethers of aliphatic alcohols and polyglycidyl ethers of aliphatic polyols or their alkylene oxide adducts. More specifically, allyl glycidyl ether, butyl glycidyl ether, 2-ethylhexyl glycidyl ether, C12-13 mixed alkyl glycidyl ether, 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, triglycidyl ether of glycerol, triglycidyl ether of trihydroxymethylpropane, tetraglycidyl ether of sorbitol, hexadecaned ether of dipentaerythritol, and tetraglycidyl ether of sorbitol. Glycidyl ethers of polyols such as diglycidyl ether of polyethylene glycol, diglycidyl ether of polypropylene glycol, and diglycidyl ether of neopentyl glycol, and polyglycidyl ethers of polyether polyols obtained by adding one or more alkylene oxides to aliphatic polyols such as propylene glycol, trihydroxymethylpropane, and glycerol, monoglycidyl ethers of aliphatic higher alcohols, or epoxidized polybutadiene, etc. In addition, compounds obtained by reacting aliphatic glycidyl ether-type epoxy compounds containing a rubber component and having two or more glycidyl ether groups on the main chain skeleton containing a group that can react with an epoxy group to form a covalent bond (hereinafter also referred to as an "epoxy-reactive group") can also be cited. Furthermore, as the above-mentioned aliphatic epoxy compound, a hydride of an aromatic epoxy compound such as hydrogen-added bisphenol A diglycidyl ether may be used. As the above-mentioned aliphatic epoxy compound, a compound having a structure in which an oxirane group is directly bonded to a cycloalkyl ring derived from an oxirane alkyl ring via a single bond as a structural unit and having a structure in which oxirane groups of an oxirane alkyl ring are polymerized with each other, such as 1,2-epoxy-4-(2-epoxyethylene) oxirane adduct of 2,2-bis(hydroxymethyl)-1-butanol, as a main chain structure may be used.
作為上述脂肪族環氧化合物,可使用具有脂肪族烴環、脂肪族雜環等脂肪族環之含脂肪族環之環氧化合物、及不具有脂肪族環之鏈狀脂肪族環氧化合物之任一者,其中較佳為脂肪族環氧化合物包含具有脂肪族烴環之含脂肪族環之環氧化合物、鏈狀脂肪族環氧化合物。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 作為上述脂肪族環氧化合物中之環氧基之含有數量,只要為可獲得所需保存穩定性及低溫接著性之數量即可,只要脂肪族環氧化合物每1個分子為1個以上即可,較佳為1個以上6個以下,較佳為1個以上4個以下,較佳為1個以上3個以下,較佳為1個或2個。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 作為上述脂肪族環氧化合物之環氧當量,只要為可獲得所需保存穩定性及低溫接著性者即可,較佳為100以上500以下,其中較佳為130以上400以下,尤佳為150以上350以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 As the above-mentioned aliphatic epoxy compound, any one of an aliphatic ring-containing epoxy compound having an aliphatic ring such as an aliphatic hydrocarbon ring, an aliphatic heterocyclic ring, and a chain aliphatic epoxy compound without an aliphatic ring can be used, among which the aliphatic epoxy compound preferably includes an aliphatic ring-containing epoxy compound having an aliphatic hydrocarbon ring and a chain aliphatic epoxy compound. The reason is that the above-mentioned composition will become a better balance between storage stability and low-temperature adhesion. The amount of epoxy groups in the aliphatic epoxy compound can be any amount that can achieve the desired storage stability and low-temperature adhesion, and can be at least 1 per molecule of the aliphatic epoxy compound, preferably at least 1 and at most 6, preferably at least 1 and at most 4, preferably at least 1 and at most 3, and preferably 1 or 2. The reason is that the composition has a better balance between storage stability and low-temperature adhesion. The epoxy equivalent of the aliphatic epoxy compound can be any amount that can achieve the desired storage stability and low-temperature adhesion, preferably at least 100 and at most 500, preferably at least 130 and at most 400, and particularly preferably at least 150 and at most 350. The reason is that the above composition will have a better balance between storage stability and low-temperature adhesion.
作為脂肪族環氧化合物,可使用市售品,例如可例舉:Denacol EX-121、Denacol EX-171、Denacol EX-192、Denacol EX-211、Denacol EX-212、Denacol EX-313、Denacol EX-314、Denacol EX-321、Denacol EX-411、Denacol EX-421、Denacol EX-512、Denacol EX-521、Denacol EX-611、Denacol EX-612、Denacol EX-614、Denacol EX-622、Denacol EX-810、Denacol EX-811、Denacol EX-850、Denacol EX-851、Denacol EX-821、Denacol EX-830、Denacol EX-832、Denacol EX-841、Denacol EX-861、Denacol EX-911、Denacol EX-941、Denacol EX-920、Denacol EX-931(Nagase chemteX(股)公司製造);Epolight M-1230、Epolight 40E、Epolight 100E、Epolight 200E、Epolight 400E、Epolight 70P、Epolight 200P、Epolight 400P、Epolight 1500NP、Epolight 1600、Epolight 80MF、Epolight 100MF(共榮社化學(股)公司製造)、ADEKA GLYCIROL ED-503、ADEKA GLYCIROL ED-503G、ADEKA GLYCIROL ED-506、ADEKA GLYCIROL ED-523T(ADEKA(股)公司製造)等。As the aliphatic epoxy compound, commercially available products can be used, for example, Denacol EX-121, Denacol EX-171, Denacol EX-192, Denacol EX-211, Denacol EX-212, Denacol EX-313, Denacol EX-314, Denacol EX-321, Denacol EX-411, Denacol EX-421, Denacol EX-512, Denacol EX-521, Denacol EX-611, Denacol EX-612, Denacol EX-614, Denacol EX-622, Denacol EX-810, Denacol EX-811, Denacol EX-850, Denacol EX-851, Denacol EX-821, Denacol EX-830, Denacol EX-832, Denacol EX-841, Denacol EX-861, Denacol EX-911, Denacol EX-941, Denacol EX-920, Denacol EX-931 (manufactured by Nagase ChemteX Co., Ltd.); Epolight M-1230, Epolight 40E, Epolight 100E, Epolight 200E, Epolight 400E, Epolight 70P, Epolight 200P, Epolight 400P, Epolight 1500NP, Epolight 1600, Epolight 80MF, Epolight 100MF (manufactured by Kyoeisha Chemical Co., Ltd.); ADEKA GLYCIROL ED-503, ADEKA GLYCIROL ED-503G, ADEKA GLYCIROL ED-506, ADEKA GLYCIROL ED-523T (manufactured by ADEKA Co., Ltd.), etc.
(1-3)脂環式環氧化合物 作為脂環式環氧化合物之具體例,可例舉:具有至少1個脂環且脂環上直接鍵結有羥基之多元醇之聚縮水甘油醚化物或藉由將含有環己烯或環戊烯環之化合物利用氧化劑進行環氧化而獲得之環氧環己烷或環氧環戊烷等含有氧化環烯烴結構之化合物。 作為上述脂環式環氧化合物之環氧當量,只要為可獲得所需保存穩定性及低溫接著性者即可,較佳為80以上500以下,其中較佳為100以上300以下,尤佳為120以上250以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 (1-3) Alicyclic epoxy compounds Specific examples of alicyclic epoxy compounds include polyglycidyl ethers of polyols having at least one alicyclic ring and a hydroxyl group directly bonded to the alicyclic ring, or compounds containing an oxyalkylene hydrocarbon structure such as oxirane or oxirane obtained by epoxidizing a compound containing a cyclohexene or cyclopentene ring with an oxidizing agent. The epoxide equivalent of the alicyclic epoxy compound may be any one that can obtain the desired storage stability and low-temperature adhesion, preferably 80 to 500, more preferably 100 to 300, and particularly preferably 120 to 250. The reason is that the above composition will have a better balance between storage stability and low-temperature adhesion.
作為脂環式環氧化合物,例如可例舉:3,4-環氧環己基甲基-3,4-環氧環己烷羧酸酯、3,4-環氧基-1-甲基環己基-3,4-環氧基-1-甲基己烷羧酸酯、6-甲基-3,4-環氧環己基甲基-6-甲基-3,4-環氧環己烷羧酸酯、3,4-環氧基-3-甲基環己基甲基-3,4-環氧基-3-甲基環己烷羧酸酯、3,4-環氧基-5-甲基環己基甲基-3,4-環氧基-5-甲基環己烷羧酸酯、2-(3,4-環氧環己基-5,5-螺-3,4-環氧)環己烷-間二㗁烷、雙(3,4-環氧環己基甲基)己二酸酯、亞甲基雙(3,4-環氧環己烷)、丙烷-2,2-二基-雙(3,4-環氧環己烷)、2,2-雙(3,4-環氧環己基)丙烷、二環戊二烯二環氧化物、伸乙基雙(3,4-環氧環己烷羧酸酯)、環氧六氫鄰苯二甲酸二辛酯、環氧六氫鄰苯二甲酸二-2-乙基己酯、1-環氧乙基-3,4-環氧環己烷、1,2-環氧基-2-環氧乙基環己烷、α-氧化蒎烯、ε-己內酯改性3,4-環氧環己烷羧酸3',4'-環氧環己基甲基酯等。Examples of the alicyclic epoxy compound include 3,4-epoxyepoxyhexylmethyl-3,4-epoxyepoxyhexanecarboxylate, 3,4-epoxy-1-methylepoxyhexyl-3,4-epoxy-1-methylhexanecarboxylate, 6-methyl-3,4-epoxyepoxyhexylmethyl-6-methyl-3,4-epoxyepoxyhexanecarboxylate, 3,4-epoxy-3-methylepoxyhexylmethyl-3,4-epoxy-3-methylepoxyhexanecarboxylate, 3,4-epoxy-5-methylepoxyhexylmethyl-3,4-epoxy-5-methylepoxyhexanecarboxylate, 2-(3,4-epoxyepoxyhexyl-5,5-spiro-3,4-epoxy)cyclohexane-m-diol oxane, bis(3,4-epoxycyclohexylmethyl) adipate, methylenebis(3,4-epoxycyclohexane), propane-2,2-diyl-bis(3,4-epoxycyclohexane), 2,2-bis(3,4-epoxycyclohexyl)propane, dicyclopentadiene dicyclooxide, ethylenebis(3,4-epoxycyclohexane carboxylate ), dioctyl epoxyhexahydrophthalate, di-2-ethylhexyl epoxyhexahydrophthalate, 1-epoxyethyl-3,4-epoxycyclohexane, 1,2-epoxy-2-epoxyethylcyclohexane, α-pinene oxide, ε-caprolactone-modified 3,4-epoxycyclohexanecarboxylic acid 3',4'-epoxycyclohexyl methyl ester, etc.
作為可良好地用作上述脂環式環氧化合物之市售品,例如可例舉日本專利第6103653號公報等中所記載者。Examples of commercially available products that can be preferably used as the alicyclic epoxy compound include those described in Japanese Patent No. 6103653 and the like.
(2)氧雜環丁烷化合物 又,作為上述氧雜環丁烷化合物之具體例,例如可例舉以下化合物。可例舉:3-乙基-3-羥甲基氧雜環丁烷、3-(甲基)烯丙氧基甲基-3-乙基氧雜環丁烷、(3-乙基-3-氧雜環丁基甲氧基)甲基苯、4-氟-[1-(3-乙基-3-氧雜環丁基甲氧基)甲基]苯、4-甲氧基-[1-(3-乙基-3-氧雜環丁基甲氧基)甲基]苯、[1-(3-乙基-3-氧雜環丁基甲氧基)乙基]苯醚、異丁氧基甲基(3-乙基-3-氧雜環丁基甲基)醚、異𦯉基氧基乙基(3-乙基-3-氧雜環丁基甲基)醚、異𦯉基(3-乙基-3-氧雜環丁基甲基)醚、2-乙基己基(3-乙基-3-氧雜環丁基甲基)醚、乙基二乙二醇(3-乙基-3-氧雜環丁基甲基)醚、二環戊二烯(3-乙基-3-氧雜環丁基甲基)醚、二環戊烯氧基乙基(3-乙基-3-氧雜環丁基甲基)醚、二環戊烯(3-乙基-3-氧雜環丁基甲基)醚、四氫呋喃甲基(3-乙基-3-氧雜環丁基甲基)醚、四溴苯基(3-乙基-3-氧雜環丁基甲基)醚、2-四溴苯氧基乙基(3-乙基-3-氧雜環丁基甲基)醚、三溴苯基(3-乙基-3-氧雜環丁基甲基)醚、2-三溴苯氧基乙基(3-乙基-3-氧雜環丁基甲基)醚、2-羥基乙基(3-乙基-3-氧雜環丁基甲基)醚、2-羥基丙基(3-乙基-3-氧雜環丁基甲基)醚、丁氧基乙基(3-乙基-3-氧雜環丁基甲基)醚、五氯苯基(3-乙基-3-氧雜環丁基甲基)醚、五溴苯基(3-乙基-3-氧雜環丁基甲基)醚、𦯉基(3-乙基-3-氧雜環丁基甲基)醚、3,7-雙(3-氧雜環丁基)-5-氧雜-壬烷、3,3'-(1,3-(2-甲烯基)丙烷二基雙(氧基亞甲基))雙-(3-乙基氧雜環丁烷)、1,4-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]苯、1,2-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]乙烷、1,3-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]丙烷、乙二醇雙(3-乙基-3-氧雜環丁基甲基)醚、二環戊烯雙(3-乙基-3-氧雜環丁基甲基)醚、三乙二醇雙(3-乙基-3-氧雜環丁基甲基)醚、四乙二醇雙(3-乙基-3-氧雜環丁基甲基)醚、三環癸烷二基二亞甲基(3-乙基-3-氧雜環丁基甲基)醚、三羥甲基丙烷三(3-乙基-3-氧雜環丁基甲基)醚、1,4-雙(3-乙基-3-氧雜環丁基甲氧基)丁烷、1,6-雙(3-乙基-3-氧雜環丁基甲氧基)己烷、季戊四醇三(3-乙基-3-氧雜環丁基甲基)醚、季戊四醇四(3-乙基-3-氧雜環丁基甲基)醚、聚乙二醇雙(3-乙基-3-氧雜環丁基甲基)醚、二季戊四醇六(3-乙基-3-氧雜環丁基甲基)醚、二季戊四醇五(3-乙基-3-氧雜環丁基甲基)醚、二季戊四醇四(3-乙基-3-氧雜環丁基甲基)醚、己內酯改性二季戊四醇六(3-乙基-3-氧雜環丁基甲基)醚、己內酯改性二季戊四醇五(3-乙基-3-氧雜環丁基甲基)醚、二-三羥甲基丙烷四(3-乙基-3-氧雜環丁基甲基)醚、EO改性雙酚A雙(3-乙基-3-氧雜環丁基甲基)醚、PO改性雙酚A雙(3-乙基-3-氧雜環丁基甲基)醚、EO改性氫化雙酚A雙(3-乙基-3-氧雜環丁基甲基)醚、PO改性氫化雙酚A雙(3-乙基-3-氧雜環丁基甲基)醚、EO改性雙酚F(3-乙基-3-氧雜環丁基甲基)醚等。 (2) Oxycyclobutane compounds Specific examples of the above-mentioned oxycyclobutane compounds include the following compounds. Examples include: 3-ethyl-3-hydroxymethyloxycyclobutane, 3-(methyl)allyloxymethyl-3-ethyloxycyclobutane, (3-ethyl-3-oxycyclobutylmethoxy)methylbenzene, 4-fluoro-[1-(3-ethyl-3-oxycyclobutylmethoxy)methyl]benzene, 4-methoxy-[1-(3-ethyl-3-oxycyclobutylmethoxy)methyl]benzene, [1-(3-ethyl-3-oxycyclobutylmethoxy)ethyl]phenyl ether, isobutoxymethyl (3-ethyl- 3-Oxycyclobutylmethyl) ether, isothiocyanate (3-ethyl-3-oxycyclobutylmethyl) ether, isothiocyanate (3-ethyl-3-oxycyclobutylmethyl) ether, 2-ethylhexyl (3-ethyl-3-oxycyclobutylmethyl) ether, ethyl diethylene glycol (3-ethyl-3-oxycyclobutylmethyl) ether, dicyclopentadiene (3-ethyl-3-oxycyclobutylmethyl) ether, dicyclopentenyloxyethyl (3-ethyl-3-oxycyclobutylmethyl) ether, dicyclopentene (3-ethyl-3-oxycyclobutylmethyl) ether 3-ethyl-3-oxocyclobutylmethyl) ether, tetrahydrofuranylmethyl (3-ethyl-3-oxocyclobutylmethyl) ether, tetrabromophenyl (3-ethyl-3-oxocyclobutylmethyl) ether, 2-tetrabromophenoxyethyl (3-ethyl-3-oxocyclobutylmethyl) ether, tribromophenyl (3-ethyl-3-oxocyclobutylmethyl) ether, 2-tribromophenoxyethyl (3-ethyl-3-oxocyclobutylmethyl) ether, 2-hydroxyethyl (3-ethyl-3-oxocyclobutylmethyl) ether, 2-hydroxy propyl (3-ethyl-3-oxocyclobutyl methyl) ether, butoxyethyl (3-ethyl-3-oxocyclobutyl methyl) ether, pentachlorophenyl (3-ethyl-3-oxocyclobutyl methyl) ether, pentabromophenyl (3-ethyl-3-oxocyclobutyl methyl) ether, iodophenyl (3-ethyl-3-oxocyclobutyl methyl) ether, 3,7-bis (3-oxocyclobutyl) -5-oxo-nonane, 3,3'- (1,3- (2-methylenyl) propanediyl bis (oxymethylene)) bis- (3-ethyloxycyclobutane), 1,4-bis[(3-ethyl-3-oxycyclobutylmethoxy)methyl]benzene, 1,2-bis[(3-ethyl-3-oxycyclobutylmethoxy)methyl]ethane, 1,3-bis[(3-ethyl-3-oxycyclobutylmethoxy)methyl]propane, ethylene glycol bis(3-ethyl-3-oxycyclobutylmethyl)ether, dicyclopentene bis(3-ethyl-3-oxycyclobutylmethyl)ether, triethylene glycol bis(3-ethyl-3-oxycyclobutylmethyl)ether ) ether, tetraethylene glycol bis(3-ethyl-3-oxocyclobutyl methyl) ether, tricyclodecanediyl dimethylene(3-ethyl-3-oxocyclobutyl methyl) ether, trihydroxymethylpropane tris(3-ethyl-3-oxocyclobutyl methyl) ether, 1,4-bis(3-ethyl-3-oxocyclobutyl methoxy) butane, 1,6-bis(3-ethyl-3-oxocyclobutyl methoxy) hexane, pentaerythritol tris(3-ethyl-3-oxocyclobutyl methyl) ether, pentaerythritol tetra(3-ethyl- 3-Oxycyclobutylmethyl) ether, polyethylene glycol bis(3-ethyl-3-oxycyclobutylmethyl) ether, dipentaerythritol hexa(3-ethyl-3-oxycyclobutylmethyl) ether, dipentaerythritol penta(3-ethyl-3-oxycyclobutylmethyl) ether, dipentaerythritol tetra(3-ethyl-3-oxycyclobutylmethyl) ether, caprolactone-modified dipentaerythritol hexa(3-ethyl-3-oxycyclobutylmethyl) ether, caprolactone-modified dipentaerythritol penta(3-ethyl-3-oxycyclobutylmethyl) Ether, di-trihydroxymethylpropane tetra(3-ethyl-3-oxocyclobutyl methyl) ether, EO-modified bisphenol A bis(3-ethyl-3-oxocyclobutyl methyl) ether, PO-modified bisphenol A bis(3-ethyl-3-oxocyclobutyl methyl) ether, EO-modified hydrogenated bisphenol A bis(3-ethyl-3-oxocyclobutyl methyl) ether, PO-modified hydrogenated bisphenol A bis(3-ethyl-3-oxocyclobutyl methyl) ether, EO-modified bisphenol F(3-ethyl-3-oxocyclobutyl methyl) ether, etc.
(3)環狀醚化合物 作為本發明之組合物之一實施方式,環狀醚化合物之分子量只要為可獲得所需硬化性等者即可,無特別限定,例如可設為50以上20,000以下。就組合物之保存穩定性及低溫接著性之平衡性、以及組合物之塗佈容易性及接著容易性等觀點而言,更佳為100以上2,000以下,進而較佳為200以上1,500以下較佳。 (3) Cyclic ether compound As one embodiment of the composition of the present invention, the molecular weight of the cyclic ether compound is not particularly limited as long as it can obtain the desired curing properties, etc., and can be set to, for example, 50 or more and 20,000 or less. From the perspective of the balance between the storage stability and low-temperature adhesion of the composition, and the ease of coating and adhesion of the composition, it is more preferably 100 or more and 2,000 or less, and more preferably 200 or more and 1,500 or less.
再者,於化合物為聚合物之情形時,分子量表示重量平均分子量(Mw)。又,重量平均分子量可藉由凝膠滲透層析法(GPC)以標準聚苯乙烯換算值之形式而求出。When the compound is a polymer, the molecular weight refers to the weight average molecular weight (Mw). The weight average molecular weight can be determined by gel permeation chromatography (GPC) in terms of standard polystyrene.
重量平均分子量例如可使用日本分光(股)製造之GPC(LC-2000plus series),將溶出溶劑設為四氫呋喃,將校正曲線用聚苯乙烯標準設為Mw1,110,000、707,000、397,000、189,000、98,900、37,200、13,700、9,490、5,430、3,120、1,010、589(Tosoh(股)公司製造 TSKgel標準聚苯乙烯),將測定管柱設為KF-804、KF-803、KF-802(昭和電工(股)製造)進行測定而獲得。又,測定溫度可設為40℃,流速可設為1.0 mL/分。The weight average molecular weight can be obtained by measuring, for example, using a GPC (LC-2000plus series) manufactured by JASCO Corporation, setting the elution solvent to tetrahydrofuran, setting the calibration curve to polystyrene standards of Mw1, 110,000, 707,000, 397,000, 189,000, 98,900, 37,200, 13,700, 9,490, 5,430, 3,120, 1,010, 589 (TSKgel standard polystyrene manufactured by Tosoh Corporation), and setting the measurement column to KF-804, KF-803, KF-802 (manufactured by Showa Denko Co., Ltd.). The measurement temperature can be set to 40°C, and the flow rate can be set to 1.0 mL/min.
作為本發明之組合物之一實施方式,較佳為環狀醚成分包含具有縮水甘油醚基之縮水甘油醚型環氧化合物作為環氧化合物。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。又,其原因在於:由於縮水甘油醚型環氧化合物具有優異之硬化性,故而組合物會發揮優異之硬化性。 本發明之組合物較佳為環狀醚成分包含芳香族環氧化合物及脂肪族環氧化合物之至少一者作為環氧化合物,其中較佳為含有芳香族環氧化合物。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。又,就製成保存穩定性及硬化性之平衡性優異者之觀點而言較佳。 As one embodiment of the composition of the present invention, it is preferred that the cyclic ether component includes a glycidyl ether type epoxy compound having a glycidyl ether group as the epoxy compound. The reason is that the above composition will be a better balance between storage stability and low-temperature adhesion. In addition, the reason is that since the glycidyl ether type epoxy compound has excellent curing properties, the composition will exhibit excellent curing properties. The composition of the present invention is preferably a cyclic ether component that includes at least one of an aromatic epoxy compound and an aliphatic epoxy compound as the epoxy compound, and preferably contains an aromatic epoxy compound. The reason is that the above composition will be a better balance between storage stability and low-temperature adhesion. In addition, it is better from the perspective of producing a product with an excellent balance between preservation stability and hardening properties.
作為本發明之組合物之一實施方式,就組合物之保存穩定性及低溫接著性之平衡性之觀點而言,較佳為環狀醚成分包含縮水甘油醚型化合物,尤其是就提昇組合物之硬化性之觀點而言,含量較佳為縮水甘油醚型環氧化合物於環狀醚成分100質量份中所占之比率為30質量份以上,其中較佳為80質量份以上,尤佳為90質量份以上。 於本發明中,較佳為芳香族環氧化合物於環狀醚成分100質量份中所占之比率為30質量份以上,其中較佳為80質量份以上,尤佳為90質量份以上。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 As an embodiment of the composition of the present invention, from the perspective of the balance between the storage stability and low-temperature adhesiveness of the composition, it is preferred that the cyclic ether component includes a glycidyl ether type compound, and in particular, from the perspective of improving the curability of the composition, the content of the glycidyl ether type epoxy compound in 100 parts by mass of the cyclic ether component is preferably 30 parts by mass or more, preferably 80 parts by mass or more, and particularly preferably 90 parts by mass or more. In the present invention, it is preferred that the aromatic epoxy compound in 100 parts by mass of the cyclic ether component is 30 parts by mass or more, preferably 80 parts by mass or more, and particularly preferably 90 parts by mass or more. The reason is that the above-mentioned composition will be a better balance between storage stability and low-temperature adhesiveness.
尤其是於芳香族環氧化合物中,上述通式(14)所表示之化合物之含量較佳為於環狀醚成分100質量份中為30質量份以上,其中較佳為40質量份以上,尤佳為50質量份以上,特佳為60質量份以上。尤其是式(14)之X 11為上述通式(6-1)所表示之基之化合物較佳為於環狀醚成分100質量份中為30質量份以上,其中較佳為40質量份以上,尤佳為50質量份以上,特佳為60質量份以上。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 In particular, among aromatic epoxy compounds, the content of the compound represented by the general formula (14) is preferably 30 parts by mass or more, preferably 40 parts by mass or more, particularly preferably 50 parts by mass or more, and particularly preferably 60 parts by mass or more in 100 parts by mass of the cyclic ether component. In particular, the compound wherein X11 in the formula (14) is a group represented by the general formula (6-1) is preferably 30 parts by mass or more, preferably 40 parts by mass or more, particularly preferably 50 parts by mass or more, and particularly preferably 60 parts by mass or more in 100 parts by mass of the cyclic ether component. The reason for this is that the above-mentioned composition has a better balance between storage stability and low-temperature adhesiveness.
於環狀醚成分併用芳香族環氧化合物及脂肪族環氧化合物作為環氧化合物之情形時,脂肪族環氧化合物之含量較佳為於環狀醚成分100質量份中為1質量份以上30質量份以下,較佳為5質量份以上20質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 於環狀醚成分併用芳香族環氧化合物及脂環式環氧化合物作為環氧化合物之情形時,脂環式環氧化合物之含量較佳為於環狀醚成分100質量份中為0.1質量份以上30質量份以下,較佳為0.2質量份以上20質量份以下,較佳為0.3質量份以上10質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。 When an aromatic epoxy compound and an aliphatic epoxy compound are used as the epoxy compound in the cyclic ether component, the content of the aliphatic epoxy compound is preferably 1 to 30 parts by mass, preferably 5 to 20 parts by mass, based on 100 parts by mass of the cyclic ether component. The reason is that the above composition will have a better balance between storage stability and low-temperature adhesion. When an aromatic epoxy compound and an alicyclic epoxy compound are used as the epoxy compound in the cyclic ether component, the content of the alicyclic epoxy compound is preferably 0.1 to 30 parts by mass, preferably 0.2 to 20 parts by mass, and preferably 0.3 to 10 parts by mass in 100 parts by mass of the cyclic ether component. The reason is that the above composition will have a better balance between storage stability and low-temperature adhesion.
根據本發明,較佳為上述環狀醚成分之含量於上述環狀醚成分及上述硫醇成分之合計100質量份中為20質量份以上80質量份以下,更佳為40質量份以上75質量份以下。其原因在於:上述組合物會成為保存穩定性及低溫接著性之平衡性更優異者。According to the present invention, the content of the cyclic ether component is preferably 20 to 80 parts by mass, more preferably 40 to 75 parts by mass, out of 100 parts by mass of the total of the cyclic ether component and the thiol component. The reason is that the composition has a better balance between storage stability and low-temperature adhesion.
就組合物之保存穩定性及低溫接著性之平衡性之方面而言,環狀醚成分之含量較佳為於本發明之組合物100質量份中為10質量份以上90質量份以下,進而較佳為15質量份以上80質量份以下,進而較佳為20質量份以上75質量份以下,尤佳為30質量份以上70質量份以下。In terms of the balance between the storage stability and low-temperature adhesiveness of the composition, the content of the cyclic ether component is preferably 10 parts by mass to 90 parts by mass, more preferably 15 parts by mass to 80 parts by mass, further preferably 20 parts by mass to 75 parts by mass, and particularly preferably 30 parts by mass to 70 parts by mass, based on 100 parts by mass of the composition of the present invention.
就組合物之保存穩定性及低溫接著性之平衡性之方面而言,環狀醚成分之含量較佳為於本發明之組合物之固形物成分100質量份中為10質量份以上90質量份以下,進而較佳為15質量份以上80質量份以下,進而較佳為20質量份以上75質量份以下,尤佳為30質量份以上70質量份以下。In terms of the balance between the storage stability and low-temperature adhesiveness of the composition, the content of the cyclic ether component is preferably 10 parts by mass to 90 parts by mass, more preferably 15 parts by mass to 80 parts by mass, further preferably 20 parts by mass to 75 parts by mass, and particularly preferably 30 parts by mass to 70 parts by mass, based on 100 parts by mass of the solid components of the composition of the present invention.
4.自由基聚合性成分 上述組合物包含環狀醚成分及硫醇成分,亦可同時包含自由基聚合性成分作為硬化性成分。自由基聚合性成分係指為具有自由基聚合性基之化合物(以下亦記載為「自由基聚合性化合物」)之1種或2種以上者。 自由基聚合性化合物由於與環狀醚成分相比,硬化速度等優異,故而有時藉由使自由基聚合性化合物彼此硬化,容易根據用途設定接著條件。化合物1由於在產生鹼基時能夠產生自由基,故而能夠於無需另行添加自由基聚合起始劑或添加少於通常量之自由基聚合起始劑之情況下使自由基聚合性化合物彼此聚合。又,作為自由基聚合性化合物之代表例之具有乙烯性不飽和基之化合物及硫醇化合物係藉由產鹼劑所產生之鹼基,藉由麥可加成反應進行硬化。因此,硬化速度、硬化物之耐久性等之調整等變得容易。 4. Radical polymerizable components The above composition contains a cyclic ether component and a thiol component, and may also contain a radical polymerizable component as a curing component. The radical polymerizable component refers to one or more compounds having a radical polymerizable group (hereinafter also described as "radical polymerizable compounds"). Radical polymerizable compounds are superior to cyclic ether components in curing speed and other properties. Therefore, it is sometimes easy to set the bonding conditions according to the application by curing the radical polymerizable compounds with each other. Compound 1 can generate free radicals when generating a base group, so it is possible to polymerize the radical polymerizable compounds with each other without adding a radical polymerization initiator or adding a radical polymerization initiator in a smaller amount than usual. In addition, compounds with ethylenic unsaturated groups and thiol compounds, which are representative examples of free radical polymerizable compounds, are cured by alkali groups generated by alkali generators through Michel addition reactions. Therefore, it is easy to adjust the curing speed, durability of the cured product, etc.
作為自由基聚合性化合物,可使用具有丙烯醯基、甲基丙烯醯基、乙烯基等乙烯性不飽和基之化合物。 作為上述自由基聚合性化合物,可使用具有1個以上乙烯性不飽和基之化合物,可使用具有1個乙烯性不飽和基之單官能化合物、及具有2個以上乙烯性不飽和基之多官能化合物。 又,自由基聚合性化合物係不具有環狀醚基、及硫醇基之化合物。 As the free radical polymerizable compound, a compound having an ethylenically unsaturated group such as an acryl group, a methacryl group, or a vinyl group can be used. As the above-mentioned free radical polymerizable compound, a compound having one or more ethylenically unsaturated groups can be used, a monofunctional compound having one ethylenically unsaturated group, and a polyfunctional compound having two or more ethylenically unsaturated groups can be used. In addition, the free radical polymerizable compound is a compound having no cyclic ether group and no thiol group.
作為此種自由基聚合性化合物,例如可例舉:聚乙二醇二丙烯酸酯、聚丙二醇二丙烯酸酯、丙氧化乙氧化雙酚A二丙烯酸酯、9,9-雙[4-(2-丙烯醯氧基乙氧基)苯基]茀、三環癸烷二甲醇二丙烯酸酯、1,10-癸二醇二丙烯酸酯、1,9-壬二醇二丙烯酸酯、三丙二醇二丙烯酸酯、聚四亞甲基二醇#650二丙烯酸酯、乙氧化異三聚氰酸三丙烯酸酯、ε-己內酯改性三-(2-丙烯醯氧基乙基)異氰尿酸酯、季戊四醇三丙烯酸酯、三羥甲基丙烷三丙烯酸酯、二-三羥甲基丙烷四丙烯酸酯、乙氧化季戊四醇四丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯等。 又,作為上述自由基聚合性化合物,亦可使用在國際公開2016/136752號、日本專利特開2016-210849號公報、日本專利特開2016-176009號公報等中作為自由基聚合性化合物而記載之化合物。 Examples of such free radical polymerizable compounds include polyethylene glycol diacrylate, polypropylene glycol diacrylate, propoxylated ethoxylated bisphenol A diacrylate, 9,9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorene, tricyclodecanedimethanol diacrylate, 1,10-decanediol diacrylate, 1,9-nonanediol diacrylate, tripropylene glycol diacrylate, polytetramethylene glycol #650 diacrylate, ethoxylated isocyanuric acid triacrylate, ε-caprolactone-modified tri-(2-acryloyloxyethyl) isocyanurate, pentaerythritol triacrylate, trihydroxymethylpropane triacrylate, di-trihydroxymethylpropane tetraacrylate, ethoxylated pentaerythritol tetraacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, etc. Furthermore, as the above-mentioned radical polymerizable compound, compounds described as radical polymerizable compounds in International Publication No. 2016/136752, Japanese Patent Publication No. 2016-210849, Japanese Patent Publication No. 2016-176009, etc. can also be used.
作為上述自由基聚合性化合物之乙烯性不飽和基等之官能基之數量,就能夠製成硬化速度更優異者之觀點而言,較佳為2個以上8個以下,尤佳為3個以上7個以下,其中尤佳為3個以上6個以下。From the viewpoint of obtaining a compound with a superior curing speed, the number of functional groups such as ethylenically unsaturated groups in the radical polymerizable compound is preferably 2 to 8, more preferably 3 to 7, and particularly preferably 3 to 6.
作為上述自由基聚合性化合物,可較佳地使用以下通式(15)所表示之化合物。其原因在於:藉由為該化合物,上述組合物容易提高低溫接著性。As the radical polymerizable compound, a compound represented by the following general formula (15) can be preferably used because the low-temperature adhesiveness of the composition can be easily improved by using the compound.
[化17] [Chemistry 17]
(式中,R 1501表示氫原子或甲基, X 15表示具有與n15相同之數之價數的碳原子數1~40之未經取代或具有取代基之脂肪族烴基;具有與n15相同之數之價數的碳原子數6~40之未經取代或具有取代基之含芳香族烴環之基;具有與n15相同之數之價數的碳原子數2~40之未經取代或具有取代基之含雜環基;或該脂肪族烴基、該含芳香族烴環之基或該含雜環基中之1個或2個以上亞甲基被取代為選自下述群IV之二價基之基, n15表示1~10之整數; 群IV:-O-、-COO-、-OCO-、-CO-、-CO-CO-、-CO-CO-O-、-CS-、-S-、-SO-、-SO 2-、-NR'-、-NR'-CO-、-CO-NR'-、-NR'-COO-、-OCO-NR'-或-SiR'R''-) (wherein, R 1501 represents a hydrogen atom or a methyl group, X 15 represents an unsubstituted or substituted aliphatic alkyl group having 1 to 40 carbon atoms and having the same valence as n15; an unsubstituted or substituted aromatic alkyl group having 6 to 40 carbon atoms and having the same valence as n15; an unsubstituted or substituted heterocyclic group having 2 to 40 carbon atoms and having the same valence as n15; or one or more methylene groups in the aliphatic alkyl group, the aromatic alkyl group or the heterocyclic group are substituted with a divalent group selected from the following group IV, and n15 represents an integer from 1 to 10; Group IV: -O-, -COO-, -OCO-, -CO-, -CO-CO-, -CO-CO-O-, -CS-, -S-, -SO-, -SO 2 -, -NR'-, -NR'-CO-, -CO-NR'-, -NR'-COO-, -OCO-NR'- or -SiR'R''-)
關於X 15所表示之具有與n15相同之數之價數的未經取代或具有取代基之脂肪族烴基、具有與n15相同之數之價數的未經取代或具有取代基之含芳香族烴環之基、及具有與n15相同之數之價數的未經取代或具有取代基之含雜環基,可例舉:與上述通式(A)中之X 1所表示之具有與n1相同之數之價數的碳原子數1~40之未經取代或具有取代基之脂肪族烴基、碳原子數6~40之未經取代或具有取代基之含芳香族烴環之基或碳原子數2~20之未經取代或具有取代基之含雜環基相同之基。 關於通式(15)之群IV中所使用之R'或R'',可使用與群I-1、II-1等中所使用之R'或R''相同之基。 The unsubstituted or substituted aliphatic alkyl group having the same valence as n15 , the unsubstituted or substituted aromatic hydrocarbon ring-containing group having the same valence as n15, and the unsubstituted or substituted heterocyclic group having the same valence as n15 represented by X15 may be the same groups as the unsubstituted or substituted aliphatic alkyl group having 1 to 40 carbon atoms, the unsubstituted or substituted aromatic hydrocarbon ring-containing group having 6 to 40 carbon atoms, or the unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, having the same valence as n1 represented by X1 in the above general formula (A). As R' or R'' used in Group IV of the general formula (15), the same groups as R' or R'' used in Groups I-1, II-1, etc. can be used.
n15較佳為與自由基聚合性化合物之乙烯性不飽和基等官能基之較佳之數相同之範圍。n15 is preferably in the same range as the preferred number of functional groups such as ethylenically unsaturated groups in the free radical polymerizable compound.
於上述自由基聚合性成分為不含芳香族環或雜環之化合物之情形時,作為自由基聚合性成分,可例舉由上述式(15)表示且X 15為脂肪族烴基或脂肪族烴基之1個或2個以上亞甲基於互不相鄰之條件下經選自群IV之基取代之基的化合物,例如較佳為X 15為脂肪族烴基或脂肪族烴基之1個或2個以上亞甲基被取代為-O-之基的化合物。其原因在於:自由基聚合性成分之購入容易且容易提高組合物之硬化速度。就該等方面而言,於如下化合物即X 15為脂肪族烴基或脂肪族烴基之1個或2個以上亞甲基被取代為選自群IV之基之基的情形時,較佳為以式(15)表示且X 15為碳原子數5~16之支鏈狀之烷基或該烷基之亞甲基被取代為-O-之基的化合物。 When the radical polymerizable component is a compound not containing an aromatic ring or a heterocyclic ring, the radical polymerizable component may be a compound represented by the above formula (15) and wherein X15 is an aliphatic alkyl group or one or more methylene groups of an aliphatic alkyl group are substituted with a group selected from Group IV under the condition that they are not adjacent to each other. For example, preferably, X15 is an aliphatic alkyl group or one or more methylene groups of an aliphatic alkyl group are substituted with -O-. The reason for this is that the radical polymerizable component is easy to purchase and the curing speed of the composition can be easily increased. In terms of the above aspects, in the case where X15 is an aliphatic alkyl group or one or more methylene groups of an aliphatic alkyl group are substituted with groups selected from Group IV, preferably the compound is represented by formula (15) and X15 is a branched alkyl group having 5 to 16 carbon atoms or a methylene group of the alkyl group is substituted with -O-.
於上述自由基聚合性成分含有芳香族環之情形時,就自由基聚合性成分之獲取容易性或組合物之硬化速度之方面而言,例如較佳為使用以上述式(15)表示且X 15為上述式(14)之作為X 11於上述所例示之基的化合物。於此情形時,例如X 15亦可為上述式(6-1)所表示之基。 When the radical polymerizable component contains an aromatic ring, it is preferred to use a compound represented by the above formula (15) in which X15 is a group exemplified above as X11 in the above formula (14) from the perspective of the ease of obtaining the radical polymerizable component or the curing speed of the composition. In this case, for example, X15 may also be a group represented by the above formula (6-1).
作為上述自由基聚合性成分之含量,例如於自由基聚合性成分及環狀醚成分之合計量100質量份中可為0質量份,但於含有之情形時,較佳為1質量份以上70質量份以下,其中較佳為5質量份以上40質量份以下,尤佳為8質量份以上30質量份以下。藉由使含量為該範圍,上述組合物存在容易提高低溫接著性之情況。The content of the radical polymerizable component may be, for example, 0 parts by mass in 100 parts by mass of the total of the radical polymerizable component and the cyclic ether component, but when contained, it is preferably 1 part by mass to 70 parts by mass, more preferably 5 parts by mass to 40 parts by mass, and particularly preferably 8 parts by mass to 30 parts by mass. By making the content within this range, the composition can easily improve low-temperature adhesion.
作為上述自由基聚合性成分之含量,例如於自由基聚合性成分、環狀醚成分及硫醇成分之合計量100質量份中可為0質量份,於含有之情形時,較佳為1質量份以上50質量份以下,其中較佳為5質量份以上30質量份以下,尤佳為10質量份以上20質量份以下。藉由使含量為該範圍,存在容易提高低溫接著性之情況。The content of the radical polymerizable component may be, for example, 0 parts by mass in 100 parts by mass of the total of the radical polymerizable component, the cyclic ether component, and the thiol component. When contained, it is preferably 1 part by mass to 50 parts by mass, more preferably 5 parts by mass to 30 parts by mass, and particularly preferably 10 parts by mass to 20 parts by mass. When the content is within this range, low-temperature adhesion is likely to be improved.
5.其他樹脂成分 本發明中亦可含有除環狀醚成分、自由基聚合性成分及硫醇成分以外之樹脂成分(以下,亦稱為其他樹脂成分)。作為其他樹脂成分,可例舉感光性樹脂,具體而言,可例舉具有陰離子聚合性官能基之化合物或以鹼基為觸媒使硬化溫度變低之樹脂,具體而言,可例舉藉由照射紫外線等能量線進行聚合而硬化之感光性樹脂或硬化溫度低溫化之硬化樹脂。作為其他樹脂成分,例如可例舉:酚樹脂、聚醯胺樹脂、聚胺基甲酸酯樹脂、尼龍樹脂、聚酯樹脂、聚矽氧樹脂等。該等樹脂可單獨使用,亦可將2種以上併用。 於本發明之組合物含有其他樹脂成分之情形時,其適宜之量較佳為相對於自由基聚合性化合物及環狀醚化合物之合計量100質量份為50質量份以下,更佳為30質量份以下。其原因在於:將硫醇成分及環狀醚成分之量設為固定量以上,容易提高組合物之保存穩定性及低溫接著性。 5. Other resin components The present invention may also contain resin components other than cyclic ether components, free radical polymerizable components, and thiol components (hereinafter, also referred to as other resin components). Examples of other resin components include photosensitive resins. Specifically, examples include compounds having anionic polymerizable functional groups or resins whose curing temperatures are lowered by using alkali groups as catalysts. Specifically, examples include photosensitive resins that are cured by polymerization by irradiation with energy rays such as ultraviolet rays or curing resins whose curing temperatures are lowered. Examples of other resin components include phenolic resins, polyamide resins, polyurethane resins, nylon resins, polyester resins, and silicone resins. These resins can be used alone or in combination of two or more. When the composition of the present invention contains other resin components, the appropriate amount is preferably 50 parts by mass or less, and more preferably 30 parts by mass or less, relative to 100 parts by mass of the total amount of the free radical polymerizable compound and the cyclic ether compound. The reason is that setting the amount of the thiol component and the cyclic ether component to a fixed amount or more can easily improve the storage stability and low-temperature adhesion of the composition.
6.自由基聚合起始劑 上述組合物可包含自由基聚合性成分以及自由基聚合起始劑。 作為自由基聚合起始劑,例如可使用:國際公開第2018/012383號公報等中記載之苯乙酮系化合物、苯偶醯系化合物、二苯甲酮系化合物、9-氧硫𠮿系化合物及肟酯系化合物之光自由基聚合起始劑;偶氮系化合物、過氧化物及過硫酸鹽等熱自由基聚合起始劑;及日本專利特開2016-210849號公報中記載之光自由基聚合起始劑等。 6. Radical polymerization initiator The above composition may contain a radical polymerizable component and a radical polymerization initiator. As the radical polymerization initiator, for example, acetophenone compounds, benzoyl compounds, benzophenone compounds, 9-oxysulfide compounds described in International Publication No. 2018/012383, etc. can be used. The invention relates to a photoradical polymerization initiator of azo compounds and oxime ester compounds; a thermal radical polymerization initiator such as azo compounds, peroxides and persulfates; and a photoradical polymerization initiator described in Japanese Patent Laid-Open No. 2016-210849.
7.溶劑 上述溶劑於常溫(25℃)大氣壓下為液狀,係能夠使組合物中之各成分分散或溶解者。 因此,即便於常溫(25℃)大氣壓下為液狀,上述化合物1、環狀醚成分、硫醇成分、及自由基聚合性成分亦不會包含於溶劑中。作為上述溶劑,水、有機溶劑之任一者均可使用。於本發明中,上述溶劑較佳為有機溶劑。其原因在於:上述化合物1、環狀醚成分及硫醇成分容易溶解或分散。 7. Solvent The above solvent is liquid at room temperature (25°C) and atmospheric pressure, and is capable of dispersing or dissolving each component in the composition. Therefore, even if it is liquid at room temperature (25°C) and atmospheric pressure, the above compound 1, cyclic ether component, thiol component, and free radical polymerizable component are not included in the solvent. As the above solvent, any of water and organic solvents can be used. In the present invention, the above solvent is preferably an organic solvent. The reason is that the above compound 1, cyclic ether component and thiol component are easily dissolved or dispersed.
作為上述有機溶劑,可例舉:碳酸丙二酯、碳酸二乙酯等碳酸酯類;丙酮、2-庚酮等酮類;乙二醇、丙二醇、丙二醇單乙酸酯、二丙二醇及二丙二醇單乙酸酯之單甲醚或單苯醚等多元醇類及其衍生物;二㗁烷之類之環式醚類;甲酸乙酯、3-甲基-3-甲氧基丁基乙酸酯等酯類;甲苯、二甲苯等芳香族烴類;γ-己內酯、δ-己內酯等內酯類等。Examples of the organic solvent include carbonates such as propylene carbonate and diethyl carbonate; ketones such as acetone and 2-heptanone; polyols such as monomethyl ether or monophenyl ether of ethylene glycol, propylene glycol, propylene glycol monoacetate, dipropylene glycol, and dipropylene glycol monoacetate, and their derivatives; cyclic ethers such as dioxane; esters such as ethyl formate and 3-methyl-3-methoxybutyl acetate; aromatic hydrocarbons such as toluene and xylene; lactones such as γ-caprolactone and δ-caprolactone, etc.
作為上述溶劑之含量,較佳為於組合物100質量份中為1質量份以上70質量份以下,就組合物之使用容易性或塗佈性等方面而言,更佳為2質量份以上50質量份以下。The content of the solvent is preferably 1 to 70 parts by mass based on 100 parts by mass of the composition, and is more preferably 2 to 50 parts by mass in terms of ease of use and coating properties of the composition.
8.添加劑 上述組合物係含有化合物1、硫醇成分、環狀醚成分且可視需要包含自由基聚合性成分及溶劑者,可進而視需要包含添加劑。 作為上述添加劑,可使用在國際公開2019/117162中作為添加劑而記載者,例如可例舉:無機化合物、色料、潛在性環氧硬化劑、鏈轉移劑、增感劑、界面活性劑、矽烷偶合劑、三聚氰胺化合物、紫外線吸收劑、抗氧化劑、抗靜電劑、鹵素系化合物、磷酸酯系化合物、磷酸醯胺系化合物、氟樹脂、金屬氧化物、阻燃劑、烴系、潤滑劑、成核劑、結晶促進劑等結晶劑、矽烷偶合劑、可撓性聚合物等橡膠彈性賦予劑、酸擴散控制劑等。 8. Additives The above composition contains compound 1, a thiol component, a cyclic ether component, and may contain a free radical polymerizable component and a solvent as needed, and may further contain an additive as needed. As the above-mentioned additives, those described as additives in International Publication No. 2019/117162 can be used, for example: inorganic compounds, pigments, latent epoxy curing agents, chain transfer agents, sensitizers, surfactants, silane coupling agents, melamine compounds, ultraviolet absorbers, antioxidants, antistatic agents, halogen compounds, phosphate compounds, phosphoamide compounds, fluororesins, metal oxides, flame retardants, hydrocarbons, lubricants, nucleating agents, crystallization promoters and other crystallization agents, silane coupling agents, rubber elasticity imparting agents such as flexible polymers, acid diffusion control agents, etc. can be cited.
作為添加劑(但是,無機化合物及色料除外)之合計含量,視其使用目的來適當選擇,並無特別限制,較佳為可設為相對於化合物1、環狀醚成分及硫醇成分之合計100質量份為50質量份以下。其原因在於:上述組合物容易成為保存穩定性及低溫接著性更優異者。The total content of the additives (but excluding inorganic compounds and colorants) is appropriately selected depending on the purpose of use and is not particularly limited. It is preferably set to 50 parts by mass or less relative to 100 parts by mass of the total of compound 1, cyclic ether component and thiol component. The reason is that the above-mentioned composition is likely to be more excellent in storage stability and low-temperature adhesion.
9.用途 本發明之組合物能夠形成保存穩定性高且均勻之膜厚之膜,此外,硬化性高且無金屬腐蝕性。就該等方面而言,本發明之組合物可特別良好地用作接著劑或配線保護用。作為配線保護用,亦可用作與金屬配線直接接觸之保護材。 9. Applications The composition of the present invention can form a film with high storage stability and uniform film thickness, and has high hardening properties and no metal corrosion. In terms of these aspects, the composition of the present invention can be used particularly well as an adhesive or wiring protection. As a wiring protection, it can also be used as a protective material that directly contacts metal wiring.
作為除接著劑或配線保護用以外之用途,可使用於如下各種用途:光硬化性塗料或清漆;金屬用塗佈劑;印刷基板;彩色電視、PC(PERSONAL COMPUTER,個人電腦)顯示器、攜帶型資訊終端、數位相機等之彩色顯示之液晶顯示元件之彩色濾光片;CCD(Charge Coupled Device,電荷耦合元件)影像感測器之彩色濾光片;電漿顯示面板用之電極材料;粉末塗料(powder coating);印刷油墨;印刷版;接著劑;牙科用組合物;凝膠塗層;電子工程用之光阻;電鍍阻劑;蝕刻阻劑;乾膜;焊料阻劑;用於製造各種顯示用途用之彩色濾光片或者用於在電漿顯示面板、電發光顯示裝置、及LCD(Liquid Crystal Display,液晶顯示裝置)之製造步驟中用以形成其等構造之抗蝕劑;用於封裝電氣及電子零件之組合物;阻焊劑;磁性記錄材料;微小機械零件;波導;光開關;鍍覆用遮罩;蝕刻遮罩;顏色試驗系統;玻璃纖維纜線塗層;網版印刷用模板;用於藉由立體光刻製造三維物體之材料;全像記錄用材料;圖像記錄材料;微細電子電路;脫色材料;用於圖像記錄材料之脫色材料;使用微膠囊之圖像記錄材料用之脫色材料;印刷配線板用光阻材料;UV(Ultraviolet,紫外線)及可見雷射直接圖像系統用之光阻材料;及印刷電路基板之逐次積層中之介電層形成中使用之光阻材料或保護膜等。In addition to adhesives and wiring protection, it can be used in the following applications: light-curing coatings or varnishes; coatings for metals; printed circuit boards; color filters for liquid crystal display elements of color displays such as color TVs, PC (PERSONAL COMPUTER) monitors, portable information terminals, and digital cameras; color filters for CCD (Charge Coupled Device) image sensors; electrode materials for plasma display panels; powder coatings (powder coatings); coating); printing ink; printing plate; adhesive; dental composition; gel coating; photoresist for electronic engineering; electroplating resist; etching resist; dry film; solder resist; used in the manufacture of color filters for various display purposes or in plasma display panels, electroluminescent display devices, and LCD (Liquid Crystal Display) Display, liquid crystal display device) manufacturing steps used to form its structure; used to package electrical and electronic components of the composition; solder resist; magnetic recording materials; micro-mechanical parts; waveguide; optical switch; coating mask; etching mask; color test system; glass fiber cable coating; screen printing template; used to produce three-dimensional objects by stereolithography; holographic recording material materials; image recording materials; microelectronic circuits; decolorizing materials; decolorizing materials for image recording materials; decolorizing materials for image recording materials using microcapsules; photoresist materials for printed wiring boards; photoresist materials for UV (Ultraviolet) and visible laser direct imaging systems; and photoresist materials or protective films used in the formation of dielectric layers in the sequential lamination of printed circuit substrates.
B.硬化物 繼而,針對本發明之硬化物進行說明。 本發明之硬化物為上述組合物之硬化物。 根據本發明之硬化物,由於為使用上述組合物而形成者,故而會成為於不引起周邊構件之劣化之情況下於所需處充分地接著者。 B. Cured product Next, the cured product of the present invention will be described. The cured product of the present invention is a cured product of the above-mentioned composition. According to the cured product of the present invention, since it is formed using the above-mentioned composition, it will be sufficiently bonded to the required place without causing deterioration of the surrounding components.
關於上述組合物之內容,由於可設為與上述「A.組合物」之項中記載之內容相同,故此處省略說明。 又,作為硬化物,只要為包含環狀醚成分彼此、環狀醚成分及硫醇成分進行聚合反應而得之高分子量體者即可。 關於上述硬化物之俯視形狀,可視上述硬化物之用途等適當設定,例如可為點狀、線狀等圖案狀。 The contents of the above composition can be the same as those described in the above "A. Composition", so the description is omitted here. In addition, as a cured product, it is sufficient to be a high molecular weight body obtained by polymerization reaction of cyclic ether components, cyclic ether components and thiol components. The top view shape of the above cured product can be appropriately set according to the use of the above cured product, for example, it can be a pattern such as dots or lines.
關於上述硬化物之用途等,可設為與上述「A.組合物」之項中記載之內容相同。The uses of the above-mentioned cured product can be the same as those described in the above-mentioned "A. Composition".
作為上述硬化物之製造方法,只要為能夠使上述組合物之硬化物形成為所需形狀之方法即可,無特別限定。 作為此種製造方法,例如可使用下文所述之「C.硬化物之製造方法」之項中記載之製造方法。 The method for producing the above-mentioned cured product is not particularly limited as long as it is a method that can form the cured product of the above-mentioned composition into a desired shape. As such a production method, for example, the production method described in the item "C. Production method of cured product" described below can be used.
C.硬化物之製造方法 繼而,針對本發明之硬化物之製造方法進行說明。 本發明之硬化物之製造方法具有使上述組合物硬化之硬化步驟。 根據本發明,由於為使用上述組合物而形成者,因此能夠獲得於不引起周邊構件之劣化之情況下於所需處充分地接著之硬化物。 根據本發明,由於為使用上述組合物而形成者,因此能夠獲得於不引起周邊構件之劣化之情況下於所需處充分地接著之硬化物。 以下,針對本發明之製造方法之各步驟詳細地進行說明。 C. Method for producing a cured product Next, the method for producing a cured product of the present invention is described. The method for producing a cured product of the present invention has a curing step of curing the above-mentioned composition. According to the present invention, since the above-mentioned composition is used to form the cured product, a cured product that is sufficiently bonded to the desired location without causing deterioration of the surrounding components can be obtained. According to the present invention, since the above-mentioned composition is used to form the cured product, a cured product that is sufficiently bonded to the desired location without causing deterioration of the surrounding components can be obtained. Each step of the method for producing the present invention is described in detail below.
1.硬化步驟 硬化步驟係使上述組合物硬化之步驟。 作為使上述組合物硬化之方法,只要為使上述組合物中之環狀醚成分彼此、環狀醚成分及硫醇成分進行聚合反應而獲得高分子量體之方法即可。 作為此種聚合方法,可使用對上述組合物進行光照射處理而使化合物1產生鹼基、自由基之方法。 作為照射至組合物之光,可設為包含波長300 nm~450 nm之光者。 作為上述光照射之光源,例如可例舉:超高壓水銀、水銀蒸汽電弧、碳弧、氙弧等。 作為上述所照射之光,亦可使用雷射光。作為雷射光,可使用包含波長340~430 nm之光者。 作為雷射光之光源,亦可使用發出氬離子雷射、氦氖雷射、YAG(Yttrium Aluminum Garnet,釔-鋁-石榴石)雷射、及半導體雷射等可見至紅外區域之光者。 再者,於使用該等雷射之情形時,上述組合物可包含吸收可見至紅外相關區域之增感色素。 1. Curing step The curing step is a step of curing the above-mentioned composition. As a method for curing the above-mentioned composition, any method can be used as long as the cyclic ether components in the above-mentioned composition, the cyclic ether component and the thiol component undergo polymerization reaction to obtain a high molecular weight body. As such a polymerization method, a method of subjecting the above-mentioned composition to light irradiation treatment to generate an alkali group or a free radical in compound 1 can be used. The light irradiated to the composition can be set to include light with a wavelength of 300 nm to 450 nm. As a light source for the above-mentioned light irradiation, for example, ultra-high pressure mercury, mercury vapor arc, carbon arc, xenon arc, etc. can be cited. As the above-mentioned irradiated light, laser light can also be used. As laser light, light with a wavelength of 340 to 430 nm can be used. As the light source of laser light, argon ion laser, helium-neon laser, YAG (Yttrium Aluminum Garnet) laser, semiconductor laser and the like which emit light in the visible to infrared region can also be used. Furthermore, when such lasers are used, the above-mentioned composition may contain a sensitizing dye which absorbs light in the visible to infrared region.
由於化合物1之光鹼基產生能力優異,故而於本發明之組合物之硬化時,於照射上述能量線之後,可對塗膜進行加熱,亦可不加熱。再者,假設於進行加熱之情形時,就硬化率之方面而言,較佳為40~150℃左右之加熱,本發明中可設為100℃以下之低溫,進而可設為80℃以下等之低溫。又,於進行加熱之情形時,加熱時間通常為1分鐘~120分鐘。Since compound 1 has excellent photoalkali generation ability, when curing the composition of the present invention, after irradiating the above energy line, the coating film may be heated or not. Furthermore, if heating is performed, in terms of the curing rate, it is preferably heated to about 40 to 150°C. In the present invention, it can be set to a low temperature of 100°C or less, and further, it can be set to a low temperature of 80°C or less. In addition, when heating is performed, the heating time is usually 1 minute to 120 minutes.
2.其他步驟 上述硬化物之製造方法亦可除上述硬化步驟以外視需要而包含其他步驟。 作為上述其他步驟,可例舉:顯影步驟,其係於上述硬化步驟後,將組合物之塗膜中之未聚合部分去除而獲得圖案狀硬化物;後烘烤步驟,其係於上述硬化步驟後對硬化物進行加熱處理;預烘烤步驟,其係於上述硬化步驟前對組合物進行加熱處理以將上述組合物中之溶劑去除;及於上述硬化步驟前形成上述組合物之塗膜之步驟等。 2. Other steps The method for producing the hardened product may also include other steps as needed in addition to the hardening step. Examples of the other steps include: a developing step, which is to remove the unpolymerized part of the coating of the composition after the hardening step to obtain a patterned hardened product; a post-baking step, which is to heat the hardened product after the hardening step; a pre-baking step, which is to heat the composition before the hardening step to remove the solvent in the composition; and a step of forming a coating of the composition before the hardening step, etc.
作為上述顯影步驟中之將未聚合部分去除之方法,例如可例舉將鹼性顯影液塗佈於未聚合部分之方法。 作為上述鹼性顯影液,可使用氫氧化四甲基銨(TMAH)水溶液、或氫氧化鉀水溶液等通常用作鹼性顯影液者。 作為上述顯影步驟之實施時點,只要為上述硬化步驟後即可。 作為上述後烘烤步驟中之加熱條件,只要藉由硬化步驟能夠提昇所獲得之硬化物之強度等者即可,例如可設為200℃以上250℃以下且20分鐘~90分鐘。 作為上述預烘烤步驟中之加熱條件,只要為能夠將組合物中之溶劑去除者即可,例如可設為70℃以上150℃以下且30秒~300秒鐘。 作為於上述形成塗膜之步驟中塗佈組合物之方法,可使用旋轉塗佈機、輥式塗佈機、棒式塗佈機、模嘴塗佈機、簾幕式塗佈機、各種印刷、浸漬等公知之方法。 上述塗膜可於基材上形成。 作為上述基材,可視硬化物之用途等適當設定,可例舉包含鈉玻璃、石英玻璃、半導體基板、配線基板、金屬、紙、塑膠等者。 又,上述硬化物可於在基材上形成之後自基材剝離而使用,亦可自基材轉印至其他被黏著體而使用。 As a method for removing the unpolymerized portion in the above-mentioned developing step, for example, a method of applying an alkaline developer to the unpolymerized portion can be cited. As the above-mentioned alkaline developer, tetramethylammonium hydroxide (TMAH) aqueous solution or potassium hydroxide aqueous solution, which are commonly used as alkaline developers, can be used. As the time point for implementing the above-mentioned developing step, it can be after the above-mentioned curing step. As the heating conditions in the above-mentioned post-baking step, as long as the strength of the cured product obtained by the curing step can be improved, for example, it can be set to 200°C or more and 250°C or less and 20 minutes to 90 minutes. As the heating conditions in the above-mentioned pre-baking step, any conditions are sufficient as long as the solvent in the composition can be removed, for example, it can be set to 70°C or more and 150°C or less and for 30 seconds to 300 seconds. As the method of applying the composition in the above-mentioned step of forming the coating film, a rotary coater, a roll coater, a rod coater, a die coater, a curtain coater, various printing, dipping and other known methods can be used. The above-mentioned coating film can be formed on a substrate. As the above-mentioned substrate, it can be appropriately set depending on the purpose of the cured product, and examples thereof include sodium glass, quartz glass, semiconductor substrate, wiring substrate, metal, paper, plastic, etc. Furthermore, the above-mentioned cured product can be peeled off from the substrate after being formed on the substrate and used, or can be transferred from the substrate to other adherends and used.
3.其他 關於藉由上述製造方法而製造之硬化物及其用途等,可設為與上述「A.組合物」之項中記載之內容相同。 3. Others The cured product produced by the above-mentioned production method and its uses, etc., may be the same as those described in the above-mentioned "A. Composition".
本發明並不限定於上述實施方式。上述實施方式為例示,具有與本發明之申請專利範圍中記載之技術思想實質上相同之構成且發揮出相同之作用效果者不論為何種實施方式,均包含於本發明之技術範圍內。 [實施例] The present invention is not limited to the above-mentioned embodiments. The above-mentioned embodiments are illustrative only. Any embodiment having substantially the same structure as the technical concept described in the scope of the patent application of the present invention and exerting the same effect is included in the technical scope of the present invention. [Example]
以下,例舉實施例及比較例進一步詳細地說明本發明,但本發明並不限定於該等實施例等。The present invention is described in further detail below with reference to embodiments and comparative examples, but the present invention is not limited to these embodiments and the like.
[製造例1]Br鹽中間物1之合成 於燒瓶中加入2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮1.0 eq.,溶解於四氫呋喃(理論產量之1,000重量%)中。向其中加入啶1.1 eq.,於室溫下攪拌2小時。將反應液進行濃縮,以產率100%獲得作為淡黃色粉狀化合物之目標物。 [Preparation Example 1] Synthesis of Br Salt Intermediate 1 1.0 eq. of 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one was added to a flask and dissolved in tetrahydrofuran (theoretical yield 1,000 wt%). 1.1 eq. of pyridine was added and stirred at room temperature for 2 hours. The reaction solution was concentrated to obtain the target compound as a light yellow powder with a yield of 100%.
[化18] [Chemistry 18]
[製造例2]Br鹽中間物2之合成 除將製造例1中記載之啶變更為3-奎寧醇以外,進行與製造例1相同之操作直至反應。藉由抽氣過濾回收析出物,以產率93%獲得作為白色粉狀化合物之目標物。 [Preparation Example 2] Synthesis of Br Salt Intermediate 2 In addition to the above Except that pyridine was changed to 3-quininol, the same operation as in Preparation Example 1 was carried out until the reaction was completed. The precipitate was recovered by vacuum filtration to obtain the target compound as a white powdery compound with a yield of 93%.
[化19] [Chemistry 19]
[製造例3]Br鹽中間物3之合成 除將製造例2中記載之2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮變更為2-溴-1-(4-(苯硫基)苯基)乙烷-1-酮以外,以與製造例2相同之操作而進行。以產率77%獲得作為白色粉狀化合物之目標物。 [Production Example 3] Synthesis of Br Salt Intermediate 3 The same operation as in Production Example 2 was performed except that 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one described in Production Example 2 was replaced with 2-bromo-1-(4-(phenylthio)phenyl)ethane-1-one. The target compound was obtained as a white powdery compound with a yield of 77%.
[化20] [Chemistry 20]
[製造例4]Br鹽中間物4之合成 除將製造例2中記載之2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮變更為2-溴-1-(4-(苯硫基)苯基)丁烷-1-酮,將反應條件變更為回流5小時以外,以與製造例2相同之操作而進行。以產率62%獲得作為白色粉狀化合物之目標物。 [Production Example 4] Synthesis of Br Salt Intermediate 4 The same operation as in Production Example 2 was performed except that 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one described in Production Example 2 was replaced with 2-bromo-1-(4-(phenylthio)phenyl)butane-1-one and the reaction conditions were changed to reflux for 5 hours. The target compound was obtained as a white powdery compound with a yield of 62%.
[化21] [Chemistry 21]
[製造例1A]化合物(1)之合成 於燒瓶中加入1.0 eq.之Br鹽中間物1,溶解於氯仿(理論產量之500重量%)中。又,利用另一容器將四苯基硼酸鈉1.1 eq.溶解於離子交換水(理論產量之500重量%)中,並將該溶液加入至燒瓶側。於室溫下攪拌1小時後,將反應液進行油水分離,並將水層廢棄。進而用離子交換水進行3次洗淨,其後將有機層進行濃縮,以產率95%獲得作為淡黃色粉狀化合物之目標物。關於所獲得之化合物,使用 1H-NMR及UV-Vis進行分析,並將結果示於表1及表2。 [Production Example 1A] Synthesis of Compound (1) 1.0 eq. of Br salt intermediate 1 was added to a flask and dissolved in chloroform (theoretical yield 500 wt%). In addition, 1.1 eq. of sodium tetraphenylborate was dissolved in ion exchange water (theoretical yield 500 wt%) in another container and the solution was added to the side of the flask. After stirring at room temperature for 1 hour, the reaction solution was separated into oil and water, and the aqueous layer was discarded. The reaction mixture was then washed with ion exchange water three times, and the organic layer was concentrated to obtain the target compound as a light yellow powder with a yield of 95%. The obtained compounds were analyzed using 1 H-NMR and UV-Vis. The results are shown in Tables 1 and 2.
[化22] [Chemistry 22]
[製造例2A]化合物(2)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物2以外,以與實施例1相同之操作而進行。以產率89%獲得作為淡黃色粉狀化合物之目標物。關於所獲得之化合物,使用 1H-NMR及UV-Vis進行分析,並將結果示於表1及表2。 [Preparation Example 2A] Synthesis of Compound (2) The same operation as in Example 1 was performed except that the Br salt intermediate 1 described in Preparation Example 1A was replaced with the Br salt intermediate 2. The target compound was obtained as a pale yellow powdery compound with a yield of 89%. The obtained compound was analyzed using 1 H-NMR and UV-Vis, and the results are shown in Tables 1 and 2.
[化23] [Chemistry 23]
[製造例3A]化合物(3)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物3以外,以與實施例1相同之操作而進行。以產率84%獲得作為白色粉狀化合物之目標物。關於所獲得之化合物,使用 1H-NMR及UV-Vis進行分析,並將結果示於表1及表2。 [Preparation Example 3A] Synthesis of Compound (3) The same operation as in Example 1 was performed except that the Br salt intermediate 1 described in Preparation Example 1A was replaced with the Br salt intermediate 3. The target compound was obtained as a white powdery compound with a yield of 84%. The obtained compound was analyzed using 1 H-NMR and UV-Vis, and the results are shown in Tables 1 and 2.
[化24] [Chemistry 24]
[製造例4A]化合物(4)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物4以外,以與實施例1相同之操作而進行。以產率80%獲得作為白色粉狀化合物之目標物。關於所獲得之化合物,使用 1H-NMR及UV-Vis進行分析,並將結果示於表1及表2。 [Preparation Example 4A] Synthesis of Compound (4) The same operation as in Example 1 was performed except that the Br salt intermediate 1 described in Preparation Example 1A was replaced with the Br salt intermediate 4. The target compound was obtained as a white powdery compound with a yield of 80%. The obtained compound was analyzed using 1 H-NMR and UV-Vis, and the results are shown in Tables 1 and 2.
[化25] [Chemistry 25]
[表1] [Table 1]
[表2]
化合物之UV-Vis測定資料
[評價] 以下述表3~表6所示之組成製備組合物。再者,表中之數值表示質量份。又,表中之各成分之符號表示下述成分。將下述成分之一部分結構示於以下。 [Evaluation] The compositions shown in Tables 3 to 6 below were used to prepare the compositions. The numerical values in the tables represent weight percentages. The symbols of the components in the tables represent the following components. The structures of some of the following components are shown below.
(環狀醚成分(環氧化合物)) A1:下述式(A-1)所表示之化合物(芳香族環氧化合物,縮水甘油醚型、雙酚A型環氧化合物) A2:下述式(A-2)所表示之化合物(芳香族環氧化合物,縮水甘油醚型、雙酚E型環氧化合物) A3:下述式(A-3)所表示之化合物(芳香族環氧化合物,縮水甘油醚型,EPPN201,日本化藥公司) A4:下述式(A-4)所表示之化合物(脂肪族環氧化合物,縮水甘油醚型、具有脂肪族烴環之含脂肪族環之環氧化合物,氫化雙酚A型環氧化合物) A5:下述式(A-5)所表示之化合物(脂環式環氧化合物,Daicel公司,Celloxide 2021P) A6:下述式(A-6)所表示之化合物(脂肪族環氧化合物,縮水甘油醚型、鏈狀脂肪族環氧化合物,ADEKA公司製造ED-506,環氧當量300 g/eq) A7:丙烯腈丁二烯改性環氧化合物(縮水甘油醚型環氧化合物,ADEKA公司製造之EPR-4030,環氧當量365 g/eq) A8:下述式(A-8)所表示之化合物(4-羥基丁基丙烯酸酯縮水甘油醚,脂肪族環氧化合物,縮水甘油醚型,4HBAGE) A9:下述式(A-9)所表示之化合物(芳香族環氧化合物,縮水甘油醚型,具有雙酚結構之化合物,下述式(A-1)所表示之化合物與丙烯酸之反應物 (Cyclic ether component (epoxide)) A1: Compound represented by the following formula (A-1) (aromatic epoxy compound, glycidyl ether type, bisphenol A type epoxy compound) A2: Compound represented by the following formula (A-2) (aromatic epoxy compound, glycidyl ether type, bisphenol E type epoxy compound) A3: Compound represented by the following formula (A-3) (aromatic epoxy compound, glycidyl ether type, EPPN201, Nippon Kayaku Co., Ltd.) A4: Compound represented by the following formula (A-4) (aliphatic epoxy compound, glycidyl ether type, epoxy compound containing aliphatic ring with aliphatic hydrocarbon ring, hydrogenated bisphenol A type epoxy compound) A5: Compound represented by the following formula (A-5) (aliphatic epoxy compound, Daicel, Celloxide 2021P) A6: Compound represented by the following formula (A-6) (aliphatic epoxy compound, glycidyl ether type, chain aliphatic epoxy compound, ED-506 manufactured by ADEKA, epoxy equivalent 300 g/eq) A7: Acrylonitrile butadiene modified epoxy compound (glycidyl ether type epoxy compound, EPR-4030 manufactured by ADEKA, epoxy equivalent 365 g/eq) A8: Compound represented by the following formula (A-8) (4-hydroxybutyl acrylate glycidyl ether, aliphatic epoxy compound, glycidyl ether type, 4HBAGE) A9: A compound represented by the following formula (A-9) (aromatic epoxy compound, glycidyl ether type, compound having a bisphenol structure, a reaction product of a compound represented by the following formula (A-1) and acrylic acid
[化26] [Chemistry 26]
(硫醇成分) B1:下述式(B-1)所表示之化合物(PEMP,分子量488.64,官能基4,SC有機化學公司) B2:下述式(B-2)所表示之化合物(TEMPIC,分子量525.6,官能基3,SC有機化學公司) B3:下述式(B-3)所表示之化合(TMMP,分子量398.5,官能基3,SC有機化學公司) (Thiol component) B1: Compound represented by the following formula (B-1) (PEMP, molecular weight 488.64, functional group 4, SC Organic Chemicals) B2: Compound represented by the following formula (B-2) (TEMPIC, molecular weight 525.6, functional group 3, SC Organic Chemicals) B3: Compound represented by the following formula (B-3) (TMMP, molecular weight 398.5, functional group 3, SC Organic Chemicals)
[化27] [Chemistry 27]
(自由基聚合性成分) C1:下述式(C-1)所表示之化合物(DPHA,日本化藥公司) C2:下述式(C-2)所表示之化合物(Viscoat#295,大阪有機化學工業公司) C3:下述式(C-3)所表示之化合物(ABE300,新中村化學工業公司) C4:下述式(C-4)所表示之化合物(4-HBA,三菱化學公司) (Free radical polymerizable component) C1: Compound represented by the following formula (C-1) (DPHA, Nippon Kayaku Co., Ltd.) C2: Compound represented by the following formula (C-2) (Viscoat#295, Osaka Organic Chemical Co., Ltd.) C3: Compound represented by the following formula (C-3) (ABE300, Shin-Nakamura Chemical Co., Ltd.) C4: Compound represented by the following formula (C-4) (4-HBA, Mitsubishi Chemical Co., Ltd.)
[化28] [Chemistry 28]
(起始劑:光起始劑) D1:化合物(1)(製造例1A中所製造之化合物1) D2:化合物(2)(製造例2A中所製造之化合物1) D3:化合物(3)(製造例3A中所製造之化合物1) D4:化合物(4)(製造例4A中所製造之化合物1) E1:下述式所表示之比較化合物1 (Initiator: Photoinitiator) D1: Compound (1) (Compound 1 produced in Production Example 1A) D2: Compound (2) (Compound 1 produced in Production Example 2A) D3: Compound (3) (Compound 1 produced in Production Example 3A) D4: Compound (4) (Compound 1 produced in Production Example 4A) E1: Comparative compound 1 represented by the following formula
[化29] [Chemistry 29]
(溶劑) F1:γ丁內酯 (Solvent) F1: γ-butyrolactone
[評價方法] 進行下述1~5之評價。將結果示於表3~表6。 [Evaluation method] Evaluate 1 to 5 as follows. The results are shown in Tables 3 to 6.
1.曝光後黏著性 將各實施例及比較例之組合物以厚度成為100 μm之方式藉由分配器塗佈於SUS(Steel Use Stainless,日本不鏽鋼標準)製基材,並藉由高壓水銀燈以3,000 mJ/cm 2(波長315 nm~400 nm之範圍之累計光量)進行照射。 照射後,於25℃大氣壓條件下靜置1小時,其後進行觸診,並按照下述基準進行評價。將結果示於下述表3~6。 ++:有黏性且為固體狀態(黏著固體)。 +:有黏性且為黏稠液體狀態。 -:無黏性。 再者,越維持有黏性,會越維持有黏著性,可判斷為構件之接著越容易。 1. Adhesion after exposure The composition of each embodiment and comparative example was applied to a SUS (Steel Use Stainless, Japanese stainless steel standard) substrate by a dispenser in a manner to a thickness of 100 μm, and irradiated with 3,000 mJ/cm 2 (cumulative light quantity in the wavelength range of 315 nm to 400 nm) by a high-pressure mercury lamp. After irradiation, it was left to stand for 1 hour under atmospheric pressure conditions at 25°C, then palpated and evaluated according to the following criteria. The results are shown in the following Tables 3 to 6. ++: Viscous and in a solid state (adherent solid). +: Viscous and in a viscous liquid state. -: No viscosity. Furthermore, the more stickiness a dimension has, the more adhesion it will have, which can be judged as the easier it is to connect the components.
2.保存穩定性 藉由10 g之游標尺分別於褐色螺旋管內調配各實施例・比較例之組合物。測定25℃下之黏度(Pa・s)後於23℃下進行保存,繼而,再次測定1週後之25℃下之黏度。計算增黏率(保存後之黏度/保存前之黏度×100(%)),並按照下述基準進行評價。將結果示於下述表3~6。 +:增黏率為110%以下。 -:增黏率超過110%。 增黏率越低,可判斷為保存穩定性越優異。 2. Storage stability The compositions of each example and comparative example were prepared in a brown spiral tube using a 10 g vernier. The viscosity (Pa・s) at 25°C was measured and then stored at 23°C. Then, the viscosity at 25°C was measured again after 1 week. The viscosity increase rate (viscosity after storage/viscosity before storage × 100 (%)) was calculated and evaluated according to the following criteria. The results are shown in Tables 3 to 6 below. +: The viscosity increase rate is less than 110%. -: The viscosity increase rate exceeds 110%. The lower the viscosity increase rate, the better the storage stability.
3.接著性1 將實施例及比較例中所獲得之組合物以硬化後之厚度(接著層之厚度)成為100 μm之方式藉由分配器塗佈於作為第1基材之SUS製基材,並藉由高壓水銀燈以3,000 mJ/cm 2(波長315 nm~400 nm之範圍之累計光量)進行照射。 繼而,於塗膜上配置作為第2基材之SUS製基材,其後以60℃進行60分鐘加熱處理,而獲得評價用樣品。 使用該評價用樣品測定剝離強度。第1基材與第2基材之貼合以組合物之硬化物與第1基材及第2基材之接觸面積成為直徑100 mm之圓形狀之方式進行調整。使用小型桌上試驗機EZ-X(島津製作所製造)作為測定裝置,以測定溫度25℃、壓縮速度15 mm/min之條件測定壓縮剪切接著力(MPa)。根據測定結果,藉由下述基準進行接著力之評價。將結果示於下述表3~6。 ++:材料破壞或為5 MPa以上 +:未達5 MPa但已硬化。 -:硬化不良,但表現出未達5 MPa之接著力。 --:為未硬化或不黏著狀態,無法貼合。 再者,接著力(MPa)越大,可判斷越充分地硬化,低溫接著性越優異。 3. Adhesion 1 The composition obtained in the embodiment and the comparative example was applied to a SUS substrate as the first substrate by a dispenser in such a manner that the thickness after curing (thickness of the adhesive layer) became 100 μm, and irradiated with 3,000 mJ/cm 2 (cumulative light quantity in the wavelength range of 315 nm to 400 nm) by a high-pressure mercury lamp. Then, a SUS substrate as the second substrate was arranged on the coating film, and then heat-treated at 60°C for 60 minutes to obtain an evaluation sample. The peel strength was measured using the evaluation sample. The bonding of the first substrate and the second substrate was adjusted in such a manner that the contact area between the cured product of the composition and the first substrate and the second substrate became a circular shape with a diameter of 100 mm. A small tabletop tester EZ-X (manufactured by Shimadzu Corporation) was used as a measuring device to measure the compressive shear adhesion (MPa) at a measuring temperature of 25°C and a compression speed of 15 mm/min. The adhesion was evaluated according to the following criteria based on the measurement results. The results are shown in the following Tables 3 to 6. ++: Material damage or above 5 MPa +: Less than 5 MPa but hardened. -: Poor hardening, but exhibits an adhesion of less than 5 MPa. --: Unhardened or non-adhesive state, unable to bond. Furthermore, the greater the adhesion (MPa), the more sufficient the hardening can be judged, and the better the low-temperature adhesion.
4.接著力2 除於光照射後之塗膜上配置作為第2基材之SUS製基材後以25℃靜置24小時而獲得評價用樣品以外,藉由與上述「3.接著力1」相同之方法進行接著力之評價。將結果示於下述表3~6。 4. Adhesion 2 The adhesion was evaluated in the same manner as in "3. Adhesion 1" above, except that a SUS substrate was placed on the coating film after light irradiation as the second substrate and then left at 25°C for 24 hours to obtain an evaluation sample. The results are shown in Tables 3 to 6 below.
5.相溶性 將實施例及比較例中所獲得之組合物藉由磁力攪拌器攪拌30分鐘後進行靜置。於氣泡消失之時點以目視確認組合物之狀態,並藉由下述基準進行評價。 +:為透明之狀態。 -:渾濁,有析出物。 5. Compatibility The compositions obtained in the examples and comparative examples were stirred for 30 minutes with a magnetic stirrer and then left to stand. The state of the composition was visually confirmed when the bubbles disappeared and evaluated according to the following criteria. +: Transparent. -: Turbid, with precipitates.
[表3]
[表4]
[表5]
[表6]
如根據表3~表6之實施例及比較例之評價結果所知,本發明之組合物於光照射後維持於常溫至低溫時之硬化性及曝光後之黏著性之穩定性優異,且於貼合構件彼此時具有較高之接著性,低溫接著性優異。As can be seen from the evaluation results of the embodiments and comparative examples in Tables 3 to 6, the composition of the present invention has excellent curing properties at room temperature to low temperature and stability of adhesion after exposure after light irradiation, and has higher adhesion when bonding components to each other, and excellent low-temperature adhesion.
[製造例5]Br鹽中間物5之合成 除將製造例2中記載之2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮變更為2-溴-1-(4-(苯硫基)苯基)丙烷-1-酮,將反應條件變更為回流3小時以外,進行與製造例2相同之操作。以產率57%獲得作為白色粉狀化合物之目標物。 [Preparation Example 5] Synthesis of Br Salt Intermediate 5 The same operation as in Preparation Example 2 was performed except that 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one described in Preparation Example 2 was changed to 2-bromo-1-(4-(phenylthio)phenyl)propane-1-one and the reaction conditions were changed to reflux for 3 hours. The target compound was obtained as a white powdery compound with a yield of 57%.
[化30] [Chemistry 30]
[製造例6]Br鹽中間物6之合成 除將製造例2中記載之2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮變更為2-溴-1-(9-乙基-6-硝基-9H-咔唑-3-基)丁烷-1-酮,將反應條件變更為回流9小時以外,進行與製造例2相同之操作。以產率64%獲得作為黃色粉狀化合物之目標物。 [Preparation Example 6] Synthesis of Br Salt Intermediate 6 The same operation as in Preparation Example 2 was performed except that 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one described in Preparation Example 2 was replaced with 2-bromo-1-(9-ethyl-6-nitro-9H-carbazole-3-yl)butane-1-one and the reaction conditions were changed to reflux for 9 hours. The target compound was obtained as a yellow powder compound with a yield of 64%.
[化31] [Chemistry 31]
[製造例7]Br鹽中間物7之合成 除將製造例2中記載之2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮變更為2-(6-(2-溴丁醯基)-9-乙基-9H-咔唑-3-基)-2-側氧基乙酸甲酯,將反應條件變更為回流9小時以外,進行與製造例2相同之操作。以產率57%獲得作為淺黃色粉狀化合物之目標物。 [Preparation Example 7] Synthesis of Br Salt Intermediate 7 The same operation as in Preparation Example 2 was performed except that 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one described in Preparation Example 2 was replaced with 2-(6-(2-bromobutyl)-9-ethyl-9H-carbazole-3-yl)-2-oxoacetic acid methyl ester and the reaction conditions were changed to reflux for 9 hours. The target compound was obtained as a light yellow powder compound with a yield of 57%.
[化32] [Chemistry 32]
[製造例8]Br鹽中間物8之合成 除將製造例2中記載之2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮變更為2-溴-1-(7-(2-甲基苯甲醯基)-9H-茀-2-基)丁烷-1-酮,將反應條件變更為回流8小時以外,進行與製造例2相同之操作。以產率80%獲得作為黃色粉狀化合物之目標物。 [Preparation Example 8] Synthesis of Br Salt Intermediate 8 The same operation as in Preparation Example 2 was performed except that 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one described in Preparation Example 2 was replaced with 2-bromo-1-(7-(2-methylbenzoyl)-9H-fluoren-2-yl)butane-1-one and the reaction conditions were changed to reflux for 8 hours. The target compound was obtained as a yellow powder compound with a yield of 80%.
[化33] [Chemistry 33]
[製造例9]Br鹽中間物9之合成 除將製造例2中記載之2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮變更為2-(7-(2-溴丁醯基)-9H-茀-2-基)-2-側氧基乙酸甲酯,將反應條件變更為回流8小時以外,進行與製造例2相同之操作。以產率75%獲得作為黃色粉狀化合物之目標物。 [Production Example 9] Synthesis of Br Salt Intermediate 9 The same operation as in Production Example 2 was performed except that 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one described in Production Example 2 was replaced with 2-(7-(2-bromobutylyl)-9H-fluoren-2-yl)-2-oxoacetic acid methyl ester and the reaction conditions were changed to reflux for 8 hours. The target compound was obtained as a yellow powder compound with a yield of 75%.
[化34] [Chemistry 34]
[製造例10]Br中間物10之合成 除將製造例2中記載之2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮變更為2-溴-1-(4-溴-11-(2-乙基己基)-11H-苯并[a]咔唑-8-基)丁烷-1-酮,將反應條件變更為回流9小時以外,以與製造例2相同之程序進行操作。以產率33%獲得作為白色粉狀化合物之目標物。 [Preparation Example 10] Synthesis of Br intermediate 10 The same procedure as in Preparation Example 2 was followed except that 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one described in Preparation Example 2 was replaced with 2-bromo-1-(4-bromo-11-(2-ethylhexyl)-11H-benzo[a]carbazole-8-yl)butane-1-one and the reaction conditions were changed to reflux for 9 hours. The target compound was obtained as a white powdery compound with a yield of 33%.
[化35] [Chemistry 35]
[製造例11]Br鹽中間物11之合成 除將製造例4中記載之3-奎寧醇變更為3-奎寧酮以外,進行與製造例4相同之操作直至反應。藉由抽氣過濾回收析出物,以產率60%獲得作為白色粉狀化合物之目標物。 [Preparation Example 11] Synthesis of Br Salt Intermediate 11 Except that 3-quininol described in Preparation Example 4 was changed to 3-quininone, the same operation as in Preparation Example 4 was performed until the reaction. The precipitate was recovered by vacuum filtration, and the target compound was obtained as a white powdery compound with a yield of 60%.
[化36] [Chemistry 36]
[製造例12]Br鹽中間物12之合成 除將製造例4中記載之3-奎寧醇變更為4-氰基啶以外,進行與製造例4相同之操作直至反應。藉由抽氣過濾回收析出物,以產率65%獲得作為白色粉狀化合物之目標物。 [Preparation Example 12] Synthesis of Br Salt Intermediate 12 except that the 3-quininol described in Preparation Example 4 was replaced by 4-cyano Except for pyridine, the same operation as in Preparation Example 4 was carried out until the reaction was completed. The precipitate was recovered by vacuum filtration, and the target compound was obtained as a white powdery compound with a yield of 65%.
[化37] [Chemistry 37]
[製造例13]Br鹽中間物13之合成 除將製造例2中記載之2-溴-2-苯基-1-(4-(苯硫基)苯基)乙烷-1-酮變更為4-(溴乙基)-7-甲氧基-2H-𠳭唏-2-酮以外,以與製造例2相同之程序進行操作。以產率93%獲得作為淺黃色粉狀化合物之目標物。 [Preparation Example 13] Synthesis of Br Salt Intermediate 13 The same procedure as in Preparation Example 2 was followed except that 2-bromo-2-phenyl-1-(4-(phenylthio)phenyl)ethane-1-one described in Preparation Example 2 was replaced with 4-(bromoethyl)-7-methoxy-2H-oxazolidin-2-one. The target compound was obtained as a light yellow powdery compound with a yield of 93%.
[化38] [Chemistry 38]
[製造例14]Br鹽中間物14之合成 除將製造例3中記載之3-奎寧醇變更為1-甲基哌啶以外,進行與製造例3相同之操作。以產率87%獲得作為白色粉狀化合物之目標物。 [Preparation Example 14] Synthesis of Br Salt Intermediate 14 The same operation as in Preparation Example 3 was performed except that 3-quininol described in Preparation Example 3 was replaced with 1-methylpiperidine. The target compound was obtained as a white powdery compound with a yield of 87%.
[化39] [Chemistry 39]
[製造例5A]化合物(6)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物5以外,進行與製造例1A相同之操作。以產率67%獲得作為白色粉狀化合物之目標物。 [Production Example 5A] Synthesis of Compound (6) The same operation as in Production Example 1A was performed except that the Br salt intermediate 1 described in Production Example 1A was replaced with the Br salt intermediate 5. The target compound was obtained as a white powdery compound with a yield of 67%.
[化40] [Chemistry 40]
[製造例6A]化合物(7)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物6以外,進行與製造例1A相同之操作。以產率78%獲得作為白色粉狀化合物之目標物。 [Preparation Example 6A] Synthesis of Compound (7) The same operation as in Preparation Example 1A was performed except that the Br salt intermediate 1 described in Preparation Example 1A was replaced with Br salt intermediate 6. The target compound was obtained as a white powdery compound with a yield of 78%.
[化41] [Chemistry 41]
[製造例7A]化合物(8)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物7以外,進行與製造例1A相同之操作。以產率70%獲得作為白色粉狀化合物之目標物。 [Production Example 7A] Synthesis of Compound (8) The same operation as in Production Example 1A was performed except that the Br salt intermediate 1 described in Production Example 1A was replaced with Br salt intermediate 7. The target compound was obtained as a white powdery compound with a yield of 70%.
[化42] [Chemistry 42]
[製造例8A]化合物(9)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物8以外,進行與製造例1A相同之操作。以產率68%獲得作為白色粉狀化合物之目標物。 [Preparation Example 8A] Synthesis of Compound (9) The same operation as in Preparation Example 1A was performed except that the Br salt intermediate 1 described in Preparation Example 1A was replaced with Br salt intermediate 8. The target compound was obtained as a white powdery compound with a yield of 68%.
[化43] [Chemistry 43]
[製造例9A]化合物(10)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物9以外,進行與製造例1A相同之操作。以產率72%獲得作為白色粉狀化合物之目標物。 [Preparation Example 9A] Synthesis of Compound (10) The same operation as in Preparation Example 1A was performed except that the Br salt intermediate 1 described in Preparation Example 1A was replaced with Br salt intermediate 9. The target compound was obtained as a white powdery compound with a yield of 72%.
[化44] [Chemistry 44]
[製造例10A]化合物(11)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物10以外,進行與製造例1A相同之操作。以產率86%獲得作為黃色固體化合物之目標物。 [Preparation Example 10A] Synthesis of Compound (11) The same operation as in Preparation Example 1A was performed except that the Br salt intermediate 1 described in Preparation Example 1A was replaced with the Br salt intermediate 10. The target compound was obtained as a yellow solid compound with a yield of 86%.
[化45] [Chemistry 45]
[製造例11A]化合物(12)之合成 除將製造例3A中記載之四苯基硼酸鈉變更為苯基(2,4,6-三甲基苯甲醯基)亞膦酸鈉以外,進行與製造例3A相同之操作。以產率92%獲得作為白色粉狀化合物之目標物。 [Production Example 11A] Synthesis of Compound (12) The same operation as in Production Example 3A was performed except that the sodium tetraphenylborate described in Production Example 3A was replaced with sodium phenyl (2,4,6-trimethylbenzyl) phosphinate. The target compound was obtained as a white powdery compound with a yield of 92%.
[化46] [Chemistry 46]
[製造例12A]化合物(13)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物11以外,進行與製造例1A相同之操作。以產率68%獲得作為白色粉狀化合物之目標物。 [Preparation Example 12A] Synthesis of Compound (13) The same operation as in Preparation Example 1A was performed except that the Br salt intermediate 1 described in Preparation Example 1A was replaced with the Br salt intermediate 11. The target compound was obtained as a white powdery compound with a yield of 68%.
[化47] [Chemistry 47]
[製造例13A]化合物(14)之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物12以外,進行與製造例1A相同之操作。以產率67%獲得作為白色粉狀化合物之目標物。 [Preparation Example 13A] Synthesis of Compound (14) The same operation as in Preparation Example 1A was performed except that the Br salt intermediate 1 described in Preparation Example 1A was replaced with the Br salt intermediate 12. The target compound was obtained as a white powdery compound with a yield of 67%.
[化48] [Chemistry 48]
[製造例14A]化合物(15)之合成 除將製造例2A中記載之四苯基硼酸鈉變更為硫氰酸鈉以外,進行與製造例2A相同之操作。以產率80%獲得作為白色粉狀化合物之目標物。 [Production Example 14A] Synthesis of Compound (15) The same operation as in Production Example 2A was performed except that the sodium tetraphenylborate described in Production Example 2A was replaced with sodium thiocyanate. The target compound was obtained as a white powdery compound with a yield of 80%.
[化49] [Chemistry 49]
[製造例15A]比較化合物2之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物13以外,進行與製造例1A相同之操作。以產率96%獲得作為淺黃色粉狀化合物之目標物。 [Production Example 15A] Synthesis of Comparative Compound 2 The same operation as in Production Example 1A was performed except that the Br salt intermediate 1 described in Production Example 1A was replaced with Br salt intermediate 13. The target compound was obtained as a light yellow powder with a yield of 96%.
[化50] [Chemistry 50]
[製造例16A]比較化合物3之合成 除將製造例1A中記載之Br鹽中間物1變更為Br鹽中間物14以外,進行進行與製造例1A相同之操作。以產率98%獲得作為白色粉狀化合物之目標物。 [Production Example 16A] Synthesis of Comparative Compound 3 The same operation as in Production Example 1A was performed except that the Br salt intermediate 1 described in Production Example 1A was replaced with Br salt intermediate 14. The target compound was obtained as a white powdery compound with a yield of 98%.
[化51] [Chemistry 51]
關於製造例5A~製造例16A中所獲得之化合物,使用 1H-NMR及UV-Vis進行分析,將結果示於表7及表8。 再者,表7及表8中之化合物(5)表示Br鹽中間物2。 The compounds obtained in Production Examples 5A to 16A were analyzed using 1 H-NMR and UV-Vis. The results are shown in Tables 7 and 8. In addition, compound (5) in Tables 7 and 8 represents Br salt intermediate 2.
[表7] [Table 7]
[表8]
化合物之UV-Vis測定資料
以下述表9~表13所示之組成製備組合物。再者,表中之數值表示質量份。又,表中之各成分之符號表示下述成分。將下述成分之一部分結構示於以下。The compositions shown in Tables 9 to 13 below were used to prepare the compositions. The numerical values in the tables represent weight percentages. The symbols of the components in the tables represent the following components. The structures of some of the following components are shown below.
(環狀醚成分(環氧化合物)) A10:下述式(A-10)所表示之化合物(脂肪族環氧化合物,縮水甘油醚型,ADEKA(股)製造 ED-523T) A11:下述式(A-11)所表示之化合物(脂肪族環氧化合物,縮水甘油醚型,四日市合成(股)製造 Epogosey 2EH) A12:下述式(A-12)所表示之化合物(脂肪族環氧化合物,ADEKA(股)製造 ED-505) A13:下述式(A-13)所表示之化合物(脂肪族環氧化合物,縮水甘油醚型,Nagase chemteX(股)製造 DY-022) (Cyclic ether component (epoxy compound)) A10: Compound represented by the following formula (A-10) (aliphatic epoxy compound, glycidyl ether type, ED-523T manufactured by ADEKA Co., Ltd.) A11: Compound represented by the following formula (A-11) (aliphatic epoxy compound, glycidyl ether type, Epogosey 2EH manufactured by Yokkaichi Kogyo Co., Ltd.) A12: Compound represented by the following formula (A-12) (aliphatic epoxy compound, ED-505 manufactured by ADEKA Co., Ltd.) A13: Compound represented by the following formula (A-13) (aliphatic epoxy compound, glycidyl ether type, DY-022 manufactured by Nagase ChemteX Co., Ltd.)
[化52] [Chemistry 52]
(自由基聚合性成分) C5:下述式(C-5)所表示之化合物(日本化藥(股)製造 KAYARAD DPCA-60) (Free radical polymerizable component) C5: Compound represented by the following formula (C-5) (KAYARAD DPCA-60 manufactured by Nippon Kayaku Co., Ltd.)
[化53] [Chemistry 53]
(起始劑:光起始劑) D5:化合物(5)(製造例2中所製造之化合物1) D6:化合物(6)(製造例5A中所製造之化合物1) D7:化合物(7)(製造例6A中所製造之化合物1) D8:化合物(8)(製造例7A中所製造之化合物1) D9:化合物(9)(製造例8A中所製造之化合物1) D10:化合物(10)(製造例9A中所製造之化合物1) D11:化合物(11)(製造例10A中所製造之化合物1) D12:化合物(12)(製造例11A中所製造之化合物1) D13:化合物(13)(製造例12A中所製造之化合物1) D14:化合物(14)(製造例13A中所製造之化合物1) D15:化合物(15)(製造例14A中所製造之化合物1) E2:製造例15A中所製造之比較化合物2 E3:製造例16A中所製造之比較化合物3 (Initiator: photoinitiator) D5: Compound (5) (Compound 1 produced in Preparation Example 2) D6: Compound (6) (Compound 1 produced in Preparation Example 5A) D7: Compound (7) (Compound 1 produced in Preparation Example 6A) D8: Compound (8) (Compound 1 produced in Preparation Example 7A) D9: Compound (9) (Compound 1 produced in Preparation Example 8A) D10: Compound (10) (Compound 1 produced in Preparation Example 9A) D11: Compound (11) (Compound 1 produced in Preparation Example 10A) D12: Compound (12) (Compound 1 produced in Preparation Example 11A) D13: Compound (13) (Compound 1 produced in Preparation Example 12A) D14: Compound (14) (Compound 1 produced in Preparation Example 13A) D15: Compound (15) (Compound 1 produced in Production Example 14A) E2: Comparative Compound 2 produced in Production Example 15A E3: Comparative Compound 3 produced in Production Example 16A
(溶劑) F2:DMSO (Solvent) F2: DMSO
針對表9~表13中記載之組合物進行上述1~5之評價。將結果示於表9~表13。再者,斜線表示未實施評價。The above evaluations 1 to 5 were performed on the compositions shown in Tables 9 to 13. The results are shown in Tables 9 to 13. In addition, the slash indicates that no evaluation was performed.
[表9]
[表10]
[表11]
[表12]
[表13]
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