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TWI870044B - Optical film and display device - Google Patents

Optical film and display device Download PDF

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Publication number
TWI870044B
TWI870044B TW112137186A TW112137186A TWI870044B TW I870044 B TWI870044 B TW I870044B TW 112137186 A TW112137186 A TW 112137186A TW 112137186 A TW112137186 A TW 112137186A TW I870044 B TWI870044 B TW I870044B
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Taiwan
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optical film
filler
strain
light
load
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TW112137186A
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Chinese (zh)
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TW202417557A (en
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梁種源
權卿旭
朴曉準
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南韓商可隆股份有限公司
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Priority claimed from KR1020230127122A external-priority patent/KR20240045115A/en
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Publication of TWI870044B publication Critical patent/TWI870044B/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

Disclosed are an optical film including a light-transmitting matrix and a filler dispersed in the light-transmitting matrix, the optical film having an S/S index of 0.6 or more, and a display device including the optical film.

Description

光學膜以及顯示裝置 Optical film and display device

本揭露是有關於一種光學膜以及包括所述光學膜的顯示裝置,且更具體而言是有關於一種具有優異機械性質的光學膜。 The present disclosure relates to an optical film and a display device including the optical film, and more specifically to an optical film with excellent mechanical properties.

最近,出於減小厚度及重量並提高顯示裝置的可撓性的目的,已經考慮使用光學膜代替玻璃作為顯示裝置的覆蓋窗(cover window)。為使光學膜可用作顯示裝置的覆蓋窗,光學膜需要具有卓越的光學性質及優異的機械性質。舉例而言,光學膜需要具有例如優異的強度、硬度、耐磨性及可撓性等性質。 Recently, for the purpose of reducing thickness and weight and improving the flexibility of display devices, it has been considered to use optical films instead of glass as cover windows of display devices. In order for optical films to be used as cover windows of display devices, the optical films need to have excellent optical properties and excellent mechanical properties. For example, the optical films need to have properties such as excellent strength, hardness, wear resistance, and flexibility.

可添加填料(filler),以賦予需要各種物理性質的光學膜所期望的物理性質。填料可依據光學膜所需的物理性質而變化。 Fillers can be added to impart the desired physical properties to optical films that require various physical properties. The fillers can vary depending on the physical properties required of the optical film.

因此,鑒於上述問題提出本揭露,且本揭露的一個態樣是提供一種光學膜,所述光學膜包含分散於透光基質中的纖維狀或長絲狀填料。 Therefore, in view of the above problems, the present disclosure is proposed, and one aspect of the present disclosure is to provide an optical film, which includes fibrous or filamentous fillers dispersed in a light-transmitting matrix.

本揭露的另一態樣是提供一種具有為0.6或大於0.6的應力/應變(stress/strain,S/S)指數(S/S index)的光學膜。 Another aspect of the present disclosure is to provide an optical film having a stress/strain (S/S) index of 0.6 or greater.

本揭露的另一態樣是提供一種具有為90百萬帕至160百萬帕的降伏拉伸強度(yield tensile strength)的光學膜。 Another aspect of the present disclosure is to provide an optical film having a yield tensile strength of 90 MPa to 160 MPa.

本揭露的另一態樣是提供一種具有為4.0吉帕至15吉帕的模數的光學膜。 Another aspect of the present disclosure is to provide an optical film having a modulus of 4.0 GPa to 15 GPa.

本揭露的另一態樣是提供一種具有回復力(restoring force)的光學膜。根據本揭露的光學膜具有回復力,且對於顯示裝置而言可為有用的。 Another aspect of the present disclosure is to provide an optical film with a restoring force. The optical film according to the present disclosure has a restoring force and can be useful for a display device.

本揭露的另一態樣是提供一種包括所述光學膜的顯示裝置。 Another aspect of the present disclosure is to provide a display device including the optical film.

根據本揭露的一個態樣,提供一種光學膜,所述光學膜包含透光基質及分散於透光基質中的填料,所述光學膜具有為0.6或大於0.6的S/S指數, 其中S/S指數是根據以下方程式1計算:[方程式1]S/S指數=應力遲滯/應變遲滯 According to one aspect of the present disclosure, an optical film is provided, the optical film comprising a light-transmitting matrix and a filler dispersed in the light-transmitting matrix, the optical film having an S/S index of 0.6 or greater than 0.6, wherein the S/S index is calculated according to the following equation 1: [Equation 1] S/S index = stress hysteresis / strain hysteresis

其中應力遲滯(stress hysteresis)是根據以下方程式2計算:[方程式2]應力遲滯=[最大壓縮荷重/總荷重]* 100 The stress hysteresis is calculated according to the following equation 2: [Equation 2] Stress hysteresis = [maximum compressive load/total load] * 100

其中應變遲滯(strain hysteresis)是根據以下方程式3計算: [方程式3]應變遲滯=[應變2-應變1]* 100 The strain hysteresis is calculated according to the following equation 3: [Equation 3] Strain hysteresis = [Strain 2 - Strain 1] * 100

其中最大壓縮荷重(maximum compressive load)是光學膜在伸長之後返回至原始狀態所需的最大壓縮荷重,且總荷重(N)是拉伸荷重(tensile load)與壓縮荷重(compressive load)之和,其中拉伸荷重是光學膜伸長至特定應變所需的荷重,且壓縮荷重是光學膜在伸長之後返回至原始狀態所需的荷重,應變1是光學膜變形之前的應變,且應變2是光學膜變形之後的應變。 The maximum compressive load is the maximum compressive load required for the optical film to return to its original state after being stretched, and the total load (N) is the sum of the tensile load and the compressive load, wherein the tensile load is the load required for the optical film to be stretched to a specific strain, and the compressive load is the load required for the optical film to return to its original state after being stretched, Strain 1 is the strain before the optical film is deformed, and Strain 2 is the strain after the optical film is deformed.

根據本揭露的另一態樣,提供一種顯示裝置,所述顯示裝置包括顯示面板及設置於顯示面板上的光學膜。 According to another aspect of the present disclosure, a display device is provided, the display device comprising a display panel and an optical film disposed on the display panel.

根據本揭露的一個實施例,包含於光學膜中的填料具有纖維形狀或長絲形狀,從而改良光學膜的機械強度,特別是降伏拉伸強度及彈性。如此一來,當根據本揭露實施例的光學膜用於顯示裝置時,回彈(回復力)可得到改良。 According to an embodiment of the present disclosure, the filler contained in the optical film has a fiber shape or a filament shape, thereby improving the mechanical strength of the optical film, especially the yield tensile strength and elasticity. In this way, when the optical film according to the embodiment of the present disclosure is used in a display device, the rebound (recovery force) can be improved.

根據本揭露的一個實施例,當光學膜的S/S指數高時,遲滯得到改良,在折疊光學膜時形成較少的痕跡(mark),且當以相同的力來按壓膜時,膜返回至原始狀態的回復力更大。 According to an embodiment of the present disclosure, when the S/S index of the optical film is high, hysteresis is improved, fewer marks are formed when the optical film is folded, and when the film is pressed with the same force, the film has a greater restoring force to return to its original state.

100:光學膜 100: Optical film

110:透光基質 110: Translucent matrix

120:填料 120: Filling

200:顯示裝置 200: Display device

501:顯示面板 501: Display panel

510:基板 510: Substrate

520:半導體層 520:Semiconductor layer

530:閘極電極 530: Gate electrode

535:閘極絕緣層 535: Gate insulation layer

541:源極電極 541: Source electrode

542:汲極電極 542: Drain electrode

551:層間絕緣層 551: Interlayer insulation layer

552:平坦化層 552: Planarization layer

570:有機發光裝置 570: Organic light-emitting device

571:第一電極 571: First electrode

572:有機發光層 572: Organic luminescent layer

573:第二電極 573: Second electrode

580:堤層 580:Embankment layer

590:薄膜包封層 590: Film encapsulation layer

P:部分 P: Part

TFT:薄膜電晶體 TFT: Thin Film Transistor

圖1是示出根據本揭露實施例的光學膜的示意圖。 FIG1 is a schematic diagram showing an optical film according to an embodiment of the present disclosure.

圖2是示出根據本揭露另一實施例的顯示裝置的一部分的剖視圖。 FIG2 is a cross-sectional view showing a portion of a display device according to another embodiment of the present disclosure.

圖3是示出圖2中的部分「P」的放大剖視圖。 FIG3 is an enlarged cross-sectional view showing portion "P" in FIG2.

在下文中,將參照附圖詳細地闡述本揭露的實施例。然而,例示性地提供以下實施例僅是為清楚地理解本揭露,且並不限制本揭露的範圍。 Hereinafter, embodiments of the present disclosure will be described in detail with reference to the accompanying drawings. However, the following embodiments are provided illustratively only for a clear understanding of the present disclosure and do not limit the scope of the present disclosure.

在圖式中揭露的用於闡述本揭露的實施例的形狀、大小、比率、角度及數目僅為實例,且本揭露並非僅限於所示細節。在本說明書通篇中,相同的參考編號指代相同的元件。在以下說明中,當確定對相關眾所習知功能或配置的詳細說明不必要地使本揭露的要點模糊不清時,將省略所述詳細說明。 The shapes, sizes, ratios, angles, and numbers disclosed in the drawings for illustrating the embodiments of the present disclosure are examples only, and the present disclosure is not limited to the details shown. Throughout this specification, the same reference numerals refer to the same elements. In the following description, when it is determined that a detailed description of the relevant well-known functions or configurations unnecessarily obscures the main points of the present disclosure, the detailed description will be omitted.

在本說明書中使用例如「包括」、「具有」或「包含」等用語的情形中,除非還使用表述「僅」,否則亦可存在另一部分。除非另有相反表述,否則單數形式的用語可包括複數含義。此外,在解釋元件時,即使不存在對其的明確說明,所述元件亦應被解釋為包括誤差範圍。 In the case where terms such as "include", "have" or "include" are used in this specification, another part may also exist unless the expression "only" is also used. Unless otherwise stated to the contrary, terms in the singular form may include plural meanings. In addition, when explaining an element, even if there is no explicit description of it, the element should be interpreted as including the error range.

在闡述位置關係時,舉例而言,當使用「在...上」、「上方」、「下方」或「靠近於」來闡述位置關係時,除非使用「緊接 (immediately)」或「直接」,否則可包括其間並無接觸的情形。 When describing a positional relationship, for example, when using "on", "above", "below" or "close to" to describe a positional relationship, unless "immediately" or "directly" is used, it can include situations where there is no contact between them.

本文中所使用的例如「下方」、「之下」、「下部」、「上方」及「上部」等空間相對用語可用於闡述如圖中所示的裝置或元件與另一裝置或另一元件之間的關係。應理解,除圖中繪示的定向以外,空間相對用語還旨在囊括在裝置的使用或操作期間裝置的不同定向。舉例而言,若各圖中的一者中的裝置上下顛倒,則被闡述為位於其他元件「下方」或位於其他元件「之下」的元件此時將被定位成位於其他元件「上方」。因此,示例性用語「下方」或「之下」可囊括「下方」與「上方」兩種含義。同樣地,示例性用語「上方」或「上部」可囊括「上方」與「下方」兩種含義。 As used herein, spatially relative terms such as "below", "under", "lower", "above", and "upper" may be used to describe the relationship between a device or element as shown in the figures and another device or another element. It should be understood that in addition to the orientation shown in the figures, spatially relative terms are also intended to encompass different orientations of the device during use or operation of the device. For example, if the device in one of the figures is upside down, the elements described as being "below" or "below" other elements will now be positioned as being "above" other elements. Therefore, the exemplary terms "below" or "below" can encompass both the meanings of "below" and "above". Similarly, the exemplary terms "above" or "upper" can encompass both the meanings of "above" and "below".

在闡述時間關係時,舉例而言,當使用「之後」、「隨後」、「接下來」或「之前」闡述時間次序時,除非使用「緊接」或「直接」,否則可包括非連續關係的情形。 When describing a time relationship, for example, when using "after", "afterwards", "next" or "before" to describe a time sequence, non-continuous relationships can be included unless "immediately" or "directly" is used.

應理解,儘管在本文中可能使用用語「第一(first)」、「第二(second)」等來闡述各種元件,然而該些元件不受該些用語限制。該些用語僅用於區分各個元件。因此,在本揭露的技術思想內,第一元件可被稱為第二元件。 It should be understood that although the terms "first", "second", etc. may be used in this article to describe various components, these components are not limited by these terms. These terms are only used to distinguish between various components. Therefore, within the technical concept of this disclosure, the first component can be referred to as the second component.

應理解,用語「至少一者」包括與一或多個項目相關的所有組合。舉例而言,「第一元件、第二元件及第三元件之中的至少一者」可包括選自第一元件、第二元件及第三元件之中的二或更多個元件的所有組合、以及第一元件、第二元件及第三元件中的每一者。 It should be understood that the term "at least one" includes all combinations related to one or more items. For example, "at least one of the first element, the second element, and the third element" may include all combinations of two or more elements selected from the first element, the second element, and the third element, as well as each of the first element, the second element, and the third element.

本揭露的各種實施例的特徵可部分地或完全地彼此整合或組合,並且可以不同方式彼此相互操作及在技術上驅動。本揭露的實施例可彼此獨立地施行,或者可以相互關聯的方式一起施行。 The features of the various embodiments of the present disclosure may be partially or completely integrated or combined with each other, and may interoperate and technically drive each other in different ways. The embodiments of the present disclosure may be implemented independently of each other, or may be implemented together in an interrelated manner.

圖1是示出根據本揭露實施例的光學膜100的示意圖。根據本揭露的一個實施例,具有透光度的膜被稱為「光學膜100」。 FIG. 1 is a schematic diagram showing an optical film 100 according to an embodiment of the present disclosure. According to an embodiment of the present disclosure, a film having light transmittance is referred to as "optical film 100".

根據本揭露實施例的光學膜100包含透光基質110及分散於透光基質110中的填料120。 According to the disclosed embodiment, the optical film 100 includes a light-transmitting matrix 110 and a filler 120 dispersed in the light-transmitting matrix 110.

透光基質110可為透光的。根據本揭露的實施例,透光基質110可為可撓的。舉例而言,根據本揭露實施例的光學膜可為可彎曲的、可折疊的或可卷起的。因此,根據本揭露實施例的光學膜100可為透光的,且可為可彎曲的、可折疊的或可卷起的。 The light-transmitting substrate 110 may be light-transmitting. According to an embodiment of the present disclosure, the light-transmitting substrate 110 may be flexible. For example, the optical film according to an embodiment of the present disclosure may be bendable, foldable, or rollable. Therefore, the optical film 100 according to an embodiment of the present disclosure may be light-transmitting and may be bendable, foldable, or rollable.

根據本揭露的實施例,透光基質110可包含醯亞胺重複單元或醯胺重複單元中的至少一者。 According to the embodiments disclosed herein, the light-transmitting matrix 110 may include at least one of an imide repeating unit or an amide repeating unit.

根據本揭露實施例的透光基質110可自包括二酐及二胺的單體成分生產出來。具體而言,透光基質110可包含由二酐及二胺形成的醯亞胺重複單元。 The light-transmitting matrix 110 according to the disclosed embodiment can be produced from monomer components including dianhydride and diamine. Specifically, the light-transmitting matrix 110 can include imide repeating units formed by dianhydride and diamine.

然而,根據本揭露實施例的透光基質110並非僅限於此,且透光基質110亦可自除二酐及二胺以外還包括二羰基化合物的單體成分生產出來。根據本揭露實施例的透光基質110可具有醯亞胺重複單元及醯胺重複單元。舉例而言,具有醯亞胺重複單元及醯胺重複單元的透光基質110可為聚醯胺-醯亞胺樹脂。 However, the light-transmitting matrix 110 according to the disclosed embodiment is not limited thereto, and the light-transmitting matrix 110 may also be produced from monomer components including dicarbonyl compounds in addition to dianhydrides and diamines. The light-transmitting matrix 110 according to the disclosed embodiment may have imide repeating units and amide repeating units. For example, the light-transmitting matrix 110 having imide repeating units and amide repeating units may be a polyamide-imide resin.

根據本揭露的一個實施例,透光基質110可包含聚醯亞 胺系聚合物。聚醯亞胺系聚合物的實例可包括聚醯亞胺聚合物、聚醯胺-醯亞胺聚合物及類似材料。根據本揭露實施例的透光基質110可自例如聚醯亞胺系聚合物樹脂生產出來。 According to an embodiment of the present disclosure, the light-transmitting matrix 110 may include a polyimide-based polymer. Examples of polyimide-based polymers may include polyimide polymers, polyamide-imide polymers, and similar materials. The light-transmitting matrix 110 according to an embodiment of the present disclosure may be produced from, for example, a polyimide-based polymer resin.

透光基質110可具有足以使光學膜100保護顯示面板的厚度。舉例而言,透光基質110可具有為10微米至100微米的厚度。透光基質110的厚度可與光學膜100的厚度相同。 The light-transmitting substrate 110 may have a thickness sufficient for the optical film 100 to protect the display panel. For example, the light-transmitting substrate 110 may have a thickness of 10 microns to 100 microns. The thickness of the light-transmitting substrate 110 may be the same as the thickness of the optical film 100.

根據本揭露的一個實施例,填料120的長寬比(aspect ratio)可介於5至2,500的範圍內。長寬比指代填料120的長度對直徑的比率。 According to one embodiment of the present disclosure, the aspect ratio of the filler 120 may be in the range of 5 to 2,500. The aspect ratio refers to the ratio of the length of the filler 120 to the diameter.

當填料120的長寬比小於5時,填料120不夠長且無法充分實行將聚合物鏈彼此連結的功能,且因此無法充分施展改良聚合物鏈的穩定性及排列特性的功能。 When the aspect ratio of the filler 120 is less than 5, the filler 120 is not long enough and cannot fully perform the function of connecting the polymer chains to each other, and therefore cannot fully perform the function of improving the stability and arrangement characteristics of the polymer chains.

當填料120的長寬比大於2,500時,填料120可能降低填料120的分散性(dispersibility),且由於過大的長度而導致填料120在透光基質110內發生團聚(agglomeration)。如此一來,光學膜100可能具有降低的透光度、增大的霧度(haze)及劣化的光學性質。另外,光學膜100的機械強度可能在填料120發生團聚的區域中降低,且因此,光學膜100的模數可能降低,且光學膜100的機械強度亦可能降低。 When the aspect ratio of the filler 120 is greater than 2,500, the filler 120 may reduce the dispersibility of the filler 120, and the filler 120 may agglomerate in the transparent matrix 110 due to the excessive length. As a result, the optical film 100 may have reduced transmittance, increased haze, and degraded optical properties. In addition, the mechanical strength of the optical film 100 may be reduced in the area where the filler 120 agglomerates, and therefore, the modulus of the optical film 100 may be reduced, and the mechanical strength of the optical film 100 may also be reduced.

根據本揭露的一個實施例,填料120的長度可介於0.1微米至5微米的範圍內。 According to one embodiment of the present disclosure, the length of the filler 120 may be in the range of 0.1 micrometer to 5 micrometers.

當填料120的長度小於0.1微米時,填料120對聚合物 鏈進行連結的功能可能無法得到充分施展。 When the length of the filler 120 is less than 0.1 micrometer, the function of the filler 120 in linking the polymer chain may not be fully exerted.

當填料120的長度高於5微米時,填料120的分散性可能降低,且如此一來,填料120可能在透光基質110內發生團聚,且可能由於與聚合物鏈的相互作用而容易發生凝膠化(gelation)。因此,光學膜100可能具有降低的透光度、增大的霧度及劣化的光學性質。 When the length of the filler 120 is greater than 5 micrometers, the dispersibility of the filler 120 may be reduced, and as a result, the filler 120 may agglomerate within the light-transmitting matrix 110 and may easily gelate due to interaction with the polymer chain. Therefore, the optical film 100 may have reduced transmittance, increased haze, and deteriorated optical properties.

根據本揭露的一個實施例,填料120的直徑可介於2奈米至20奈米範圍內。直徑是在垂直於縱向方向的方向上量測。 According to one embodiment of the present disclosure, the diameter of the filler 120 may be in the range of 2 nm to 20 nm. The diameter is measured in a direction perpendicular to the longitudinal direction.

當填料120的直徑小於2奈米時,填料120的穩定性可能降低,且填料可能被切斷或破裂,從而污染光學膜100且增大光學膜100的霧度。 When the diameter of the filler 120 is less than 2 nm, the stability of the filler 120 may be reduced, and the filler may be cut or broken, thereby contaminating the optical film 100 and increasing the haze of the optical film 100.

當填料120的直徑高於20奈米時,填料120難以具有導線形狀(wire shape),且光學膜100可能具有劣化的對聚合物鏈進行連結的功能、增大的霧度及降低的透光度。 When the diameter of the filler 120 is higher than 20 nm, it is difficult for the filler 120 to have a wire shape, and the optical film 100 may have a degraded function of connecting polymer chains, increased haze, and reduced light transmittance.

對填料120的類型並無特別限制。根據本揭露的實施例,可無限制地使用任何填料作為填料120,只要所述填料具有纖維形狀即可。填料120可為無機的或有機的。填料120可包括無機纖維、有機纖維或有機-無機混合纖維中的至少一者。 There is no particular limitation on the type of filler 120. According to the embodiments of the present disclosure, any filler can be used as filler 120 without limitation as long as the filler has a fiber shape. Filler 120 can be inorganic or organic. Filler 120 can include at least one of inorganic fiber, organic fiber, or organic-inorganic hybrid fiber.

更具體而言,填料120可具有纖維形狀或長絲形狀。舉例而言,填料120可具有單股纖維形狀(single-stranded fiber shape)、多股纖維形狀(multi-stranded fiber shape)或分支形狀(branch shape),在分支形狀中,多股以基於一個中心股的分支形式排列。 More specifically, the filler 120 may have a fiber shape or a filament shape. For example, the filler 120 may have a single-stranded fiber shape, a multi-stranded fiber shape, or a branch shape in which multiple strands are arranged in a branched form based on one central strand.

根據本揭露的一個實施例,填料120可包括玻璃纖維、鋁纖維或氟化物纖維中的至少一者。 According to one embodiment of the present disclosure, the filler 120 may include at least one of glass fiber, aluminum fiber, or fluoride fiber.

玻璃纖維包含SiO2,且可更包含除SiO2以外的其他組分。鋁纖維包含Al2O3,且可更包含除Al2O3以外的其他組分。氟化物纖維可包含聚四氟乙烯(polytetrafluoroethylene,PTFE)或聚偏二氟乙烯(polyvinylidene fluoride,PVDF)中的至少一者,且可更包含除PTFE及PVDF以外的其他組分。 Glass fiber includes SiO 2 and may include other components besides SiO 2. Aluminum fiber includes Al 2 O 3 and may include other components besides Al 2 O 3. Fluoride fiber may include at least one of polytetrafluoroethylene (PTFE) or polyvinylidene fluoride (PVDF) and may include other components besides PTFE and PVDF.

根據本揭露的一個實施例,填料120可包括羥基氧化鋁、SiO2、Al2O3、聚四氟乙烯(PTFE)或聚偏二氟乙烯(PVDF)中的至少一者。 According to an embodiment of the present disclosure, the filler 120 may include at least one of hydroxyalumina, SiO 2 , Al 2 O 3 , polytetrafluoroethylene (PTFE), or polyvinylidene fluoride (PVDF).

根據本揭露的一個實施例,填料120可進行表面處理。舉例而言,填料120可利用具有烷氧基的有機化合物來進行纖維表面處理。 According to an embodiment of the present disclosure, the filler 120 may be surface treated. For example, the filler 120 may be surface treated with an organic compound having an alkoxy group.

根據本揭露的一個實施例,鋁纖維可包括羥基氧化鋁或Al2O3中的至少一者。羥基氧化鋁亦被稱為「水鋁石(Boehmite)」,且可由γ-AlO(OH)表示。更具體而言,羥基氧化鋁可包括由以下式1、式2及式3中的任一者表示的結構。 According to one embodiment of the present disclosure, the aluminum fiber may include at least one of hydroxyalumina or Al 2 O 3. Hydroxyalumina is also called "Boehmite" and may be represented by γ-AlO(OH). More specifically, hydroxyalumina may include a structure represented by any one of the following Formulas 1, 2, and 3.

[式1]

Figure 112137186-A0305-12-0010-1
[Formula 1]
Figure 112137186-A0305-12-0010-1

Figure 112137186-A0305-12-0010-2
Figure 112137186-A0305-12-0010-2

Figure 112137186-A0305-12-0010-3
Figure 112137186-A0305-12-0010-3

其中n介於100至20,000的範圍內,m介於50至10,000的 範圍內,且p介於50至10,000的範圍內。 Where n is in the range of 100 to 20,000, m is in the range of 50 to 10,000, and p is in the range of 50 to 10,000.

當為更佳地理解填料120的結構而擴展式1、式2及式3的結構時,填料120可由式4、式5及式6中的任一者表示。 When the structures of Formula 1, Formula 2, and Formula 3 are expanded to better understand the structure of the filler 120, the filler 120 can be represented by any one of Formula 4, Formula 5, and Formula 6.

由式1表示的結構可由例如以下式4表示。以下式4對應於式1的結構,其中n為3。 The structure represented by Formula 1 can be represented by, for example, the following Formula 4. The following Formula 4 corresponds to the structure of Formula 1, wherein n is 3.

Figure 112137186-A0305-12-0011-4
Figure 112137186-A0305-12-0011-4

由式2表示的結構可由例如以下式5表示。以下式5對應於式2的結構,其中m為4。 The structure represented by Formula 2 can be represented by, for example, the following Formula 5. The following Formula 5 corresponds to the structure of Formula 2, wherein m is 4.

Figure 112137186-A0305-12-0011-5
Figure 112137186-A0305-12-0011-5

由式3表示的結構可由例如以下式6表示。以下式6對應於式3的結構,其中p為5。 The structure represented by Formula 3 can be represented by, for example, the following Formula 6. The following Formula 6 corresponds to the structure of Formula 3, where p is 5.

[式6]

Figure 112137186-A0305-12-0012-6
[Formula 6]
Figure 112137186-A0305-12-0012-6

在式4至式6中,「*」表示結合位置。 In Formula 4 to Formula 6, "*" indicates the binding position.

根據本揭露的實施例,Al2O3可具有由以下式7表示的單元結構。 According to an embodiment of the present disclosure, Al2O3 may have a unit structure represented by the following Formula 7.

Figure 112137186-A0305-12-0012-7
Figure 112137186-A0305-12-0012-7

根據本揭露的實施例,SiO2可具有由以下式8表示的單元結構。 According to an embodiment of the present disclosure, SiO2 may have a unit structure represented by the following Formula 8.

Figure 112137186-A0305-12-0012-8
Figure 112137186-A0305-12-0012-8

根據本揭露的實施例,填料120可引起適宜的光散射,以改良光學膜100的光學性質。為增強光散射效果,可調節光學膜100中的填料120的含量。 According to the embodiment of the present disclosure, the filler 120 can cause appropriate light scattering to improve the optical properties of the optical film 100. To enhance the light scattering effect, the content of the filler 120 in the optical film 100 can be adjusted.

根據本揭露的一個實施例,相對於100克的透光基質110而言,填料120的含量可為3份/百份樹脂(per hundred resin,PHR)至50份/百份樹脂。更具體而言,相對於100克的透光基質110而言,填料120的含量可被調節至4份/百份樹脂至30份/百份樹脂,或者可為5份/百份樹脂至20份/百份樹脂。 According to an embodiment of the present disclosure, the content of the filler 120 can be 3 parts per hundred resin (PHR) to 50 parts per hundred resin relative to 100 grams of the light-transmitting matrix 110. More specifically, the content of the filler 120 can be adjusted to 4 parts per hundred resin to 30 parts per hundred resin, or 5 parts per hundred resin to 20 parts per hundred resin relative to 100 grams of the light-transmitting matrix 110.

當相對於100克的透光基質110而言,填料120的含量小於3份/百份樹脂時,由填料120引起的光散射效果不充分,且因此無法獲得改良光學膜100的透光度的效果,且填料120無法充分施展對聚合物鏈進行連結的功能。 When the content of filler 120 is less than 3 parts/100 parts of resin relative to 100 grams of the light-transmitting matrix 110, the light scattering effect caused by filler 120 is insufficient, and thus the effect of improving the light transmittance of optical film 100 cannot be obtained, and filler 120 cannot fully exert the function of connecting polymer chains.

另一方面,當相對於100克的透光基質110而言,填料120的含量高於50份/百份樹脂時,填料120的分散性可能降低,光學膜100的霧度可能降低,脆性(brittleness)可能提高,填料120可能由於過量的填料120而發生團聚,且團聚的填料120會阻擋光,此可能降低光學膜100的透光度。 On the other hand, when the content of filler 120 is higher than 50 parts/100 parts of resin relative to 100 grams of the light-transmitting base 110, the dispersibility of filler 120 may be reduced, the haze of the optical film 100 may be reduced, the brittleness may be increased, the filler 120 may be aggregated due to the excessive filler 120, and the aggregated filler 120 may block light, which may reduce the light transmittance of the optical film 100.

圖2是示出根據本揭露另一實施例的顯示裝置200的一部分的剖視圖,且圖3是圖2中「P」的放大剖視圖。 FIG. 2 is a cross-sectional view showing a portion of a display device 200 according to another embodiment of the present disclosure, and FIG. 3 is an enlarged cross-sectional view of “P” in FIG. 2 .

參照圖2,根據本揭露另一實施例的顯示裝置200包括顯示面板501及位於顯示面板501上的光學膜100。 Referring to FIG. 2 , a display device 200 according to another embodiment of the present disclosure includes a display panel 501 and an optical film 100 located on the display panel 501.

參照圖2及圖3,顯示面板501包括基板510、位於基板510上的薄膜電晶體TFT、以及連接至薄膜電晶體TFT的有機發光裝置570。有機發光裝置570包括第一電極571、位於第一電極571上的有機發光層572、以及位於有機發光層572上的第二電極 573。圖2及圖3中所示的顯示裝置200是有機發光顯示裝置。 2 and 3, the display panel 501 includes a substrate 510, a thin film transistor TFT located on the substrate 510, and an organic light emitting device 570 connected to the thin film transistor TFT. The organic light emitting device 570 includes a first electrode 571, an organic light emitting layer 572 located on the first electrode 571, and a second electrode 573 located on the organic light emitting layer 572. The display device 200 shown in FIG. 2 and FIG. 3 is an organic light emitting display device.

基板510可由玻璃或塑膠形成。具體而言,基板510可由例如聚醯亞胺系樹脂或光學膜等塑膠形成。儘管未示出,然而基板510上可設置有緩衝層。 The substrate 510 may be formed of glass or plastic. Specifically, the substrate 510 may be formed of plastic such as polyimide resin or optical film. Although not shown, a buffer layer may be provided on the substrate 510.

薄膜電晶體TFT設置於基板510上。薄膜電晶體TFT包括:半導體層520;閘極電極530,與半導體層520絕緣且與半導體層520至少部分地交疊;源極電極541,連接至半導體層520;以及汲極電極542,與源極電極541間隔開且連接至半導體層520。 The thin film transistor TFT is disposed on the substrate 510. The thin film transistor TFT includes: a semiconductor layer 520; a gate electrode 530, which is insulated from the semiconductor layer 520 and at least partially overlaps with the semiconductor layer 520; a source electrode 541, which is connected to the semiconductor layer 520; and a drain electrode 542, which is separated from the source electrode 541 and connected to the semiconductor layer 520.

參照圖3,在閘極電極530與半導體層520之間設置有閘極絕緣層535。閘極電極530上可設置有層間絕緣層551,且源極電極541及汲極電極542可設置於層間絕緣層551上。 Referring to FIG. 3 , a gate insulating layer 535 is disposed between the gate electrode 530 and the semiconductor layer 520 . An interlayer insulating layer 551 may be disposed on the gate electrode 530 , and a source electrode 541 and a drain electrode 542 may be disposed on the interlayer insulating layer 551 .

薄膜電晶體TFT上設置有平坦化層552,以對薄膜電晶體TFT的頂部進行平坦化。 A planarization layer 552 is provided on the thin film transistor TFT to planarize the top of the thin film transistor TFT.

平坦化層552上設置有第一電極571。第一電極571藉由設置於平坦化層552中的接觸孔連接至薄膜電晶體TFT。 A first electrode 571 is disposed on the planarization layer 552. The first electrode 571 is connected to the thin film transistor TFT via a contact hole disposed in the planarization layer 552.

在平坦化層552上在第一電極571的一部分中設置有堤層(bank layer)580,以界定畫素區域或發光區域。舉例而言,堤層580以矩陣的形式設置於多個畫素之間的邊界處,以界定相應的畫素區。 A bank layer 580 is disposed in a portion of the first electrode 571 on the planarization layer 552 to define a pixel region or a light-emitting region. For example, the bank layer 580 is disposed in a matrix at the boundaries between a plurality of pixels to define the corresponding pixel region.

有機發光層572設置於第一電極571上。有機發光層572亦可設置於堤層580上。有機發光層572可包括一個發光層或在垂直方向上堆疊的二或更多個發光層。可自有機發光層572發射 具有紅色、綠色及藍色之中的任一種顏色的光,且可自有機發光層572發射白光。 The organic light-emitting layer 572 is disposed on the first electrode 571. The organic light-emitting layer 572 may also be disposed on the bank layer 580. The organic light-emitting layer 572 may include one light-emitting layer or two or more light-emitting layers stacked in a vertical direction. Light having any color among red, green and blue may be emitted from the organic light-emitting layer 572, and white light may be emitted from the organic light-emitting layer 572.

第二電極573設置於有機發光層572上。 The second electrode 573 is disposed on the organic light-emitting layer 572.

第一電極571、有機發光層572及第二電極573可進行堆疊以構成有機發光裝置570。 The first electrode 571, the organic light-emitting layer 572 and the second electrode 573 can be stacked to form an organic light-emitting device 570.

儘管未示出,但當有機發光層572發射白光時,每一畫素可包括彩色濾光片,以用於基於特定波長來過濾自有機發光層572發射的白光。彩色濾光片形成於光路徑上。 Although not shown, when the organic light emitting layer 572 emits white light, each pixel may include a color filter for filtering the white light emitted from the organic light emitting layer 572 based on a specific wavelength. The color filter is formed on the light path.

第二電極573上可設置有薄膜包封層590。薄膜包封層590可包括至少一個有機層及至少一個無機層,且所述至少一個有機層與所述至少一個無機層可交替設置。 A thin film encapsulation layer 590 may be disposed on the second electrode 573. The thin film encapsulation layer 590 may include at least one organic layer and at least one inorganic layer, and the at least one organic layer and the at least one inorganic layer may be alternately disposed.

光學膜100設置於具有上述堆疊結構的顯示面板501上。光學膜100包括透光基質110及分散於透光基質110中的填料120。 The optical film 100 is disposed on the display panel 501 having the above-mentioned stacking structure. The optical film 100 includes a light-transmitting matrix 110 and a filler 120 dispersed in the light-transmitting matrix 110.

根據本揭露的一個實施例,光學膜100的S/S指數為0.6或大於0.6,且是根據以下方程式1計算。 According to one embodiment of the present disclosure, the S/S index of the optical film 100 is 0.6 or greater than 0.6 and is calculated according to the following equation 1.

[方程式1]S/S指數=應力遲滯/應變遲滯 [Equation 1] S/S index = stress hysteresis/strain hysteresis

其中應力遲滯是根據以下方程式2計算:[方程式2]應力遲滯=[最大壓縮荷重/總荷重]* 100 The stress hysteresis is calculated according to the following equation 2: [Equation 2] Stress hysteresis = [maximum compression load/total load] * 100

其中應變遲滯是根據以下方程式3計算: [方程式3]應變遲滯=[應變2-應變1]* 100 The strain hysteresis is calculated according to the following equation 3: [Equation 3] Strain hysteresis = [Strain 2 - Strain 1] * 100

其中最大壓縮荷重是光學膜在伸長之後返回至原始狀態所需的最大壓縮荷重,且總荷重(N)是拉伸荷重與壓縮荷重之和,其中拉伸荷重是光學膜伸長至特定應變所需的荷重,且壓縮荷重是光學膜在伸長之後返回至原始狀態所需的荷重,應變1是光學膜變形之前的應變,且應變2是光學膜變形之後的應變。 Wherein the maximum compressive load is the maximum compressive load required for the optical film to return to its original state after being stretched, and the total load (N) is the sum of the tensile load and the compressive load, wherein the tensile load is the load required for the optical film to be stretched to a specific strain, and the compressive load is the load required for the optical film to return to its original state after being stretched, Strain 1 is the strain before the optical film is deformed, and Strain 2 is the strain after the optical film is deformed.

當S/S指數小於0.6時,光學膜的遲滯可能得不到改良。如此一來,當折疊光學膜時,所述光學膜可能會留下痕跡,且當以相同的力來按壓膜時,返回至原始狀態的力可能減小。 When the S/S index is less than 0.6, the hysteresis of the optical film may not be improved. As a result, the optical film may leave marks when it is folded, and when the film is pressed with the same force, the force to return to the original state may be reduced.

根據本揭露實施例的光學膜100可具有為90百萬帕至160百萬帕的降伏拉伸強度。更具體而言,光學膜100可具有為100百萬帕至150百萬帕的降伏拉伸強度,且可具有為120百萬帕至145百萬帕的降伏拉伸強度。 The optical film 100 according to the disclosed embodiment may have a yield tensile strength of 90 MPa to 160 MPa. More specifically, the optical film 100 may have a yield tensile strength of 100 MPa to 150 MPa, and may have a yield tensile strength of 120 MPa to 145 MPa.

當光學膜100的降伏拉伸強度小於90百萬帕時,由於降伏點(yield point)低且彈性區段中的能量低,光學膜可能容易變形。如此一來,當折疊或按壓膜時,回復力可能弱。 When the yield tensile strength of the optical film 100 is less than 90 MPa, the optical film may be easily deformed due to the low yield point and low energy in the elastic section. As a result, the restoring force may be weak when the film is folded or pressed.

根據本揭露實施例的光學膜100可具有為4.0吉帕至15吉帕的模數。更具體而言,光學膜100可具有為6吉帕至13吉帕的模數,且亦可具有8吉帕至12吉帕的模數。 The optical film 100 according to the disclosed embodiment may have a modulus of 4.0 GPa to 15 GPa. More specifically, the optical film 100 may have a modulus of 6 GPa to 13 GPa, and may also have a modulus of 8 GPa to 12 GPa.

當光學膜100的模數小於4.0吉帕時,由於硬度低,光學膜100可能容易被外力刮劃或因外力而變形,且由於降伏點低且彈性區段中的能量低,光學膜100可能容易變形。如此一來,當折疊或按壓膜時,回復力可能弱。 When the modulus of the optical film 100 is less than 4.0 GPa, the optical film 100 may be easily scratched or deformed by external force due to low hardness, and the optical film 100 may be easily deformed due to low yield point and low energy in the elastic section. As a result, the restoring force may be weak when the film is folded or pressed.

當光學膜100的模數大於15吉帕時,光學膜100可能容易因外力而變形,此可能導致光學膜100彎曲。此外,光學膜100與其他材料之間的曳力(drag)差異增大,因此當折疊顯示裝置200時,導致光學膜100與其他材料之間的分離或折疊。 When the modulus of the optical film 100 is greater than 15 GPa, the optical film 100 may be easily deformed by an external force, which may cause the optical film 100 to bend. In addition, the drag difference between the optical film 100 and other materials increases, so when the display device 200 is folded, the optical film 100 and other materials are separated or folded.

在下文中,將闡述根據本揭露另一實施例的製造光學膜100的方法。 Hereinafter, a method for manufacturing an optical film 100 according to another embodiment of the present disclosure will be described.

根據本揭露實施例的製造光學膜100的方法包括:首先將填料120分散於用於形成透光基質110的樹脂溶液中,以製備第一混合溶液;以及澆鑄第一混合溶液以製備澆鑄膜(cast film)。 The method for manufacturing the optical film 100 according to the embodiment of the present disclosure includes: firstly dispersing the filler 120 in the resin solution used to form the light-transmitting matrix 110 to prepare a first mixed solution; and casting the first mixed solution to prepare a cast film.

根據本揭露的一個實施例,聚醯亞胺系樹脂溶液可用作用於形成透光基質110的樹脂溶液。 According to an embodiment of the present disclosure, a polyimide resin solution can be used as a resin solution for forming a light-transmitting matrix 110.

更具體而言,根據本揭露實施例的製造光學膜100的方法包括:製備聚醯亞胺系樹脂粉末;將聚醯亞胺系樹脂粉末溶解於第一溶劑中,以獲得聚醯亞胺系樹脂溶液;製備填料分散液(filler dispersion);以及將填料分散液與聚醯亞胺系樹脂溶液混合,以製備第一混合溶液。 More specifically, the method for manufacturing the optical film 100 according to the disclosed embodiment includes: preparing polyimide resin powder; dissolving the polyimide resin powder in a first solvent to obtain a polyimide resin solution; preparing a filler dispersion; and mixing the filler dispersion with the polyimide resin solution to prepare a first mixed solution.

可例如藉由將填料120分散於第二溶劑中來製備填料分散液。 The filler dispersion can be prepared, for example, by dispersing the filler 120 in a second solvent.

N,N-二甲基乙醯胺(N,N-dimethylacetamide,DMAc)可用作第一溶劑。N,N-二甲基乙醯胺(DMAc)或甲基乙基酮(methyl ethyl ketone,MEK)可用作第二溶劑,但本揭露的一個實施例並非僅限於此,且可使用其他已知的溶劑作為第一溶劑及第二溶劑。 N,N-dimethylacetamide (DMAc) can be used as the first solvent. N,N-dimethylacetamide (DMAc) or methyl ethyl ketone (MEK) can be used as the second solvent, but an embodiment of the present disclosure is not limited thereto, and other known solvents can be used as the first solvent and the second solvent.

根據本揭露的一個實施例,為改良填料120的分散度,舉例而言,可調節第一混合溶液的pH。舉例而言,可將第一混合溶液的pH調節至為5至7的範圍。因此,可防止填料120的聚集(aggregation)或團聚。 According to an embodiment of the present disclosure, in order to improve the dispersion of the filler 120, for example, the pH of the first mixed solution can be adjusted. For example, the pH of the first mixed solution can be adjusted to a range of 5 to 7. Therefore, aggregation or agglomeration of the filler 120 can be prevented.

接下來,澆鑄第一混合溶液,進行乾燥及熱處理,以形成光學膜100。根據本揭露的一個實施例,藉由澆鑄第一混合溶液而形成的膜可被稱為「澆鑄膜」,且藉由對澆鑄膜進行乾燥及熱處理而生產的膜可被稱為「光學膜100」。澆鑄膜可被稱為「未固化膜(uncured film)」。 Next, the first mixed solution is cast, dried and heat-treated to form the optical film 100. According to an embodiment of the present disclosure, the film formed by casting the first mixed solution may be referred to as a "cast film", and the film produced by drying and heat-treating the cast film may be referred to as an "optical film 100". The cast film may be referred to as an "uncured film".

另外,在藉由澆鑄而形成的澆鑄膜的乾燥及熱處理期間,可防止對流,以使得填料120可在特定方向上進行定向。 In addition, during the drying and heat treatment of the cast film formed by casting, convection can be prevented so that the filler 120 can be oriented in a specific direction.

具體而言,當在使用熱量進行乾燥的澆鑄膜內部產生對流時,填料120的定向可能降低。因此,可使澆鑄膜緩慢乾燥以防止對流。舉例而言,可在以1℃/1分鐘的速率將溫度自80℃升高至120℃的同時實行對澆鑄膜的乾燥。當乾燥實行至超過特定程度時,填料120的定向可固定下來。 Specifically, when convection is generated inside the cast film that is dried using heat, the orientation of the filler 120 may be reduced. Therefore, the cast film may be dried slowly to prevent convection. For example, the cast film may be dried while the temperature is increased from 80°C to 120°C at a rate of 1°C/1 minute. When drying is performed to exceed a certain degree, the orientation of the filler 120 may be fixed.

在下文中,將參照製備例及實例更詳細地闡述本揭露。然而,以下製備例及實例不應被解釋為限制本揭露的範圍。 Hereinafter, the present disclosure will be described in more detail with reference to preparation examples and examples. However, the following preparation examples and examples should not be interpreted as limiting the scope of the present disclosure.

<製備例1:聚合物-醯亞胺系聚合物固體的製備> <Preparation Example 1: Preparation of polymer-imide polymer solid>

將719.104克N,N-二甲基乙醯胺(DMAc)裝入配備有攪拌器、氮氣注射器、滴液漏斗、溫度控制器及冷卻器的1升反應器中,同時用氮氣吹掃反應器。然後,將反應器的溫度調節至25℃,將54.439克(0.17莫耳)雙(三氟甲基)聯苯胺(bis(trifluoromethyl)benzidine,TFDB)溶解於其中,並將溶液的溫度維持在25℃。向其中進一步添加13.505克(0.046莫耳)聯苯基四羧酸二酐(biphenyl-tetracarboxylic acid dianhydride,BPDA),並藉由攪拌3小時使其完全溶解於其中,且向其進一步添加了9.063克(0.020莫耳)4,4'-(六氟伸異丙基)鄰苯二甲酸酐(4,4'-(hexafluoroisopropylidene)diphthalic anhydride,6FDA)並使其完全溶解於其中。將反應器溫度降至10℃,並進一步向其添加了21.053克(0.104莫耳)對苯二甲醯氯(terephthaloyl chloride,TPC),並使其在25℃下反應12小時,以獲得具有12重量%的固體含量的聚合物溶液。 719.104 g of N,N-dimethylacetamide (DMAc) was charged into a 1-liter reactor equipped with a stirrer, a nitrogen injector, a dropping funnel, a temperature controller and a cooler, and the reactor was purged with nitrogen. Then, the temperature of the reactor was adjusted to 25°C, 54.439 g (0.17 mol) of bis(trifluoromethyl)benzidine (TFDB) was dissolved therein, and the temperature of the solution was maintained at 25°C. 13.505 g (0.046 mol) of biphenyl-tetracarboxylic acid dianhydride (BPDA) was further added thereto and completely dissolved therein by stirring for 3 hours, and 9.063 g (0.020 mol) of 4,4'-(hexafluoroisopropylidene) diphthalic anhydride (6FDA) was further added thereto and completely dissolved therein. The reactor temperature was lowered to 10°C, and 21.053 g (0.104 mol) of terephthaloyl chloride (TPC) was further added thereto and reacted at 25°C for 12 hours to obtain a polymer solution having a solid content of 12% by weight.

將11.54克吡啶及14.90克乙酸酐添加至所獲得的聚合物溶液,攪拌30分鐘,在80℃下加熱,在相同的溫度下攪拌1小時以使反應發生,並使其冷卻至室溫。將20升甲醇添加至所獲得的聚合物溶液以沈澱固體,並對所沈澱的固體進行過濾、粉碎,利用2升甲醇進行洗滌,並在100℃下真空乾燥6小時或長於6小時,以將聚醯亞胺系聚合物固體製備成粉末。所製備的聚醯亞胺系聚合物固體是聚醯胺-醯亞胺聚合物固體。 11.54 g of pyridine and 14.90 g of acetic anhydride are added to the obtained polymer solution, stirred for 30 minutes, heated at 80°C, stirred at the same temperature for 1 hour to allow the reaction to occur, and cooled to room temperature. 20 liters of methanol are added to the obtained polymer solution to precipitate the solid, and the precipitated solid is filtered, crushed, washed with 2 liters of methanol, and vacuum dried at 100°C for 6 hours or longer to prepare the polyimide polymer solid into powder. The prepared polyimide polymer solid is a polyamide-imide polymer solid.

<實例1> <Example 1>

將723.46克DMAc(第一溶劑)添加至1升反應器,並在將反應器的溫度維持在10℃的同時將反應器攪拌特定時間週期。然後,將110克在製備例1中作為固體粉末製備的聚醯胺-醯亞胺(聚醯亞胺系樹脂粉末)添加至反應器,攪拌1小時,並加熱至25℃,以製備聚醯亞胺系樹脂溶液。 723.46 g of DMAc (first solvent) was added to a 1-liter reactor, and the reactor was stirred for a specific time period while maintaining the temperature of the reactor at 10°C. Then, 110 g of the polyamide-imide (polyimide resin powder) prepared as a solid powder in Preparation Example 1 was added to the reactor, stirred for 1 hour, and heated to 25°C to prepare a polyimide resin solution.

然後,將所製備的液體聚醯亞胺樹脂溶液緩慢添加至55克氧化鋁水合物填料分散液(alumina hydrate filler dispersion),以製備包含二氧化矽分散液及聚醯亞胺樹脂溶液的第一混合溶液,所述氧化鋁水合物填料分散液是藉由使用圓柱幫浦將平均粒徑為約4奈米且平均長度為約1,500奈米的氧化鋁水合物系填料120分散於DMAc(N,N-二甲基乙醯胺,第二溶劑)溶液中達1小時而製備。 Then, the prepared liquid polyimide resin solution was slowly added to 55 grams of an alumina hydrate filler dispersion to prepare a first mixed solution comprising a silica dispersion and a polyimide resin solution. The alumina hydrate filler dispersion was prepared by dispersing an alumina hydrate filler 120 having an average particle size of about 4 nanometers and an average length of about 1,500 nanometers in a DMAc (N,N-dimethylacetamide, a second solvent) solution for 1 hour using a cylindrical pump.

當在製備第一混合溶液之後立即量測時,第一混合溶液的pH為8或高於8。為改良填料120的配向特性,將弱酸(例如乙酸)添加至第一混合溶液,以將第一混合溶液的pH調節至為5至7的範圍內。如此製備的第一混合溶液是其中分散有具有纖維形狀的填料120的聚醯亞胺系樹脂溶液。 When measured immediately after the first mixed solution is prepared, the pH of the first mixed solution is 8 or higher. In order to improve the alignment characteristics of the filler 120, a weak acid (e.g., acetic acid) is added to the first mixed solution to adjust the pH of the first mixed solution to a range of 5 to 7. The first mixed solution thus prepared is a polyimide-based resin solution in which the filler 120 having a fiber shape is dispersed.

澆鑄所獲得的第一混合溶液。使用澆鑄基板來進行澆鑄。此時,對澆鑄基板的類型並無特別的限制。澆鑄基板可為玻璃基板、不鏽鋼(鋼用不鏽鋼(steel use stainless),SUS)基板、特氟隆(Teflon)基板或類似基板。根據本揭露的一個實施例,玻璃基 板被用作澆鑄基板。 The first mixed solution obtained by casting. A casting substrate is used for casting. At this time, there is no particular restriction on the type of the casting substrate. The casting substrate can be a glass substrate, a stainless steel (steel use stainless steel, SUS) substrate, a Teflon substrate or a similar substrate. According to an embodiment of the present disclosure, a glass substrate is used as a casting substrate.

具體而言,藉由在80℃至高達120℃的熱空氣烘箱中以1℃/分鐘的速率緩慢乾燥約40分鐘以維持填料120的定向而生產出了澆鑄膜。然後,將所生產的膜自玻璃基板剝離,並利用銷固定至框架。 Specifically, a cast film was produced by slowly drying at a rate of 1°C/min for about 40 minutes in a hot air oven at 80°C to up to 120°C to maintain the orientation of the filler 120. Then, the produced film was peeled off from the glass substrate and fixed to the frame using pins.

將固定有光學膜的框架在真空烘箱中自100℃緩慢加熱至280℃達2小時,緩慢冷卻並將光學膜自框架分離,以獲得光學膜。在250℃下再次將光學膜加熱5分鐘。 The frame with the optical film fixed thereon was slowly heated from 100°C to 280°C for 2 hours in a vacuum oven, slowly cooled and the optical film was separated from the frame to obtain the optical film. The optical film was heated again at 250°C for 5 minutes.

作為結果,完成了具有為50微米的厚度且包含透光基質110及分散於透光基質110中的二氧化矽系填料120的光學膜100。 As a result, an optical film 100 having a thickness of 50 micrometers and including a light-transmitting matrix 110 and a silica-based filler 120 dispersed in the light-transmitting matrix 110 is completed.

<實例2及實例3> <Example 2 and Example 3>

以與實例1中相同的方式在表1的條件下生產出了光學膜100,且各光學膜100被分別稱為「實例2及實例3」。 The optical films 100 were produced under the conditions of Table 1 in the same manner as in Example 1, and the optical films 100 are respectively referred to as "Example 2 and Example 3".

<比較例1至比較例4> <Comparison Example 1 to Comparison Example 4>

以與實例1中相同的方式在表1的條件下生產出了光學膜100,且各光學膜100被分別稱為「比較例1至比較例7」。 The optical films 100 were produced under the conditions of Table 1 in the same manner as in Example 1, and the respective optical films 100 are referred to as "Comparative Example 1 to Comparative Example 7".

Figure 112137186-A0305-12-0021-9
Figure 112137186-A0305-12-0021-9

在表1中,填料1指代具有為375的長寬比的奈米線,且填料2指代具有為20奈米的粒徑的奈米顆粒。具體而言,填料1的長度為1.5微米,且填料1的直徑為4奈米。 In Table 1, filler 1 refers to nanowires having an aspect ratio of 375, and filler 2 refers to nanoparticles having a particle diameter of 20 nanometers. Specifically, the length of filler 1 is 1.5 micrometers, and the diameter of filler 1 is 4 nanometers.

在表1中,莫耳比率表示對應組分相對於總計為100莫耳的二胺而言的莫耳比率。 In Table 1, the molar ratio indicates the molar ratio of the corresponding component relative to 100 moles of the total diamine.

在表1中,PHR表示每百份樹脂,其意指相對於100(克)重量的透光基質而言的填料的重量(克)。具體而言,根據本揭露實施例的PHR表示每100(克)重量的聚醯亞胺系聚合物固體中添加的填料的重量(克)。 In Table 1, PHR means per hundred parts of resin, which means the weight (g) of filler relative to 100 (g) of the light-transmitting matrix. Specifically, the PHR according to the embodiment of the present disclosure represents the weight (g) of filler added to every 100 (g) of the polyimide polymer solid.

如下量測了實例1及實例3以及比較例1至比較例4中生產的光學膜的物理性質。 The physical properties of the optical films produced in Example 1 and Example 3 and Comparative Examples 1 to 4 were measured as follows.

(1)模數的量測 (1)Measurement of module

使用來自英斯特朗公司(Instron Corp.)的萬用拉伸試驗器(型號5967)根據美國材料試驗協會(American Society for Testing Material,ASTM)D885量測了光學膜的模數。 The modulus of the optical film was measured using a universal tensile tester (Model 5967) from Instron Corp. according to American Society for Testing Material (ASTM) D885.

-膜生產後三小時內的量測標準 -Measurement standard within three hours after membrane production

-荷重元(Load Cell)為30千牛,抓爪(grip)為250牛 -Load Cell is 30 kN, gripper is 250 N

-樣品大小為10毫米*50毫米,拉伸速度為25毫米/分鐘 -The sample size is 10 mm*50 mm, and the stretching speed is 25 mm/min

(2)降伏拉伸強度的量測 (2) Measurement of yield tensile strength

-當S-S曲線的模數偏移0.2%時在接觸點處形成的應力 - Stress at the contact point when the modulus of the S-S curve shifts by 0.2%

-使用來自英斯特朗公司的萬用拉伸試驗器(型號5967)量測 -Measured using a universal tensile tester (model 5967) from Instron

(3)拉伸荷重的量測 (3) Measurement of tensile load

-達到1%應變時的應力 -Stress at 1% strain

-使用來自英斯特朗公司的萬用拉伸試驗器(型號5967)量測 -Measured using a universal tensile tester (model 5967) from Instron

(4)壓縮荷重的量測 (4) Measurement of compression load

-獲得1%應變之後抓爪返回至初始位置時的應力 -The stress when the gripper returns to the initial position after obtaining 1% strain

-使用來自英斯特朗公司的萬用拉伸試驗器(型號5967)量測 -Measured using a universal tensile tester (model 5967) from Instron

(5)應變2的量測 (5) Measurement of strain 2

-樣品在5次循環之後的應變變化(%) -Strain change of the sample after 5 cycles (%)

-使用來自英斯特朗公司的萬用拉伸試驗器(型號5967)量測 -Measured using a universal tensile tester (model 5967) from Instron

(6)恢復率的量測(循環試驗) (6) Measurement of recovery rate (cycle test)

使用來自英斯特朗公司的萬用拉伸試驗器(型號5967)量測了光學膜的重複拉伸-壓縮時的恢復率(recovery rate)。 The recovery rate of the optical film under repeated tension-compression was measured using a universal tensile tester (Model 5967) from Instron.

-荷重元為30千牛,抓爪為250牛 -Load cell is 30 kN, gripper is 250 N

-樣品大小為10毫米*50毫米,循環應變(cycle strain)為1%,循環速度為30%應變/分鐘,5次循環(伸長-壓縮) - Sample size is 10 mm*50 mm, cycle strain is 1%, cycle speed is 30% strain/min, 5 cycles (extension-compression)

量測結果示出於下表2中。 The measurement results are shown in Table 2 below.

Figure 112137186-A0305-12-0023-10
Figure 112137186-A0305-12-0023-10
Figure 112137186-A0305-12-0024-11
Figure 112137186-A0305-12-0024-11

如可自表2中的量測結果看出,根據本揭露實施例的光學膜100具有為0.6或大於0.6的S/S指數。 As can be seen from the measurement results in Table 2, the optical film 100 according to the embodiment of the present disclosure has an S/S index of 0.6 or greater than 0.6.

100:光學膜 100: Optical film

110:透光基質 110: Translucent matrix

120:填料 120: Filling

Claims (7)

一種光學膜,包含:透光基質;以及填料,分散於所述透光基質中,所述光學膜具有為0.6或大於0.6的應力/應變指數,其中所述填料具有纖維形狀或長絲形狀,其中所述填料包括玻璃纖維、鋁纖維或氟化物纖維中的至少一者,其中相對於100克的所述透光基質而言,所述填料的含量為3份/百份樹脂至50份/百份樹脂,其中所述透光基質包含醯亞胺重複單元或醯胺重複單元中的至少一者,其中所述應力/應變指數是根據以下方程式1計算:[方程式1]應力/應變指數=應力遲滯/應變遲滯其中所述應力遲滯是根據以下方程式2計算:[方程式2]應力遲滯=[最大壓縮荷重/總荷重]* 100其中所述應變遲滯是根據以下方程式3計算:[方程式3]應變遲滯=[應變2-應變1]* 100其中所述最大壓縮荷重是所述光學膜在伸長之後返回至原始 狀態所需的最大壓縮荷重,且所述總荷重(N)是拉伸荷重與壓縮荷重之和,其中所述拉伸荷重是所述光學膜伸長至1%應變所需的荷重,且所述拉伸荷重使用萬用拉伸試驗器量測,且所述壓縮荷重是所述光學膜在獲得所述1%應變之後返回至原始狀態所需的荷重,且所述壓縮荷重使用所述萬用拉伸試驗器量測,且所述應變1是所述光學膜變形之前的應變,且所述應變2是所述光學膜在5次循環之後的變形之後的應變,且使用所述萬用拉伸試驗器量測。 An optical film comprises: a light-transmitting matrix; and a filler dispersed in the light-transmitting matrix, wherein the optical film has a stress/strain index of 0.6 or greater than 0.6, wherein the filler has a fiber shape or a filament shape, wherein the filler comprises at least one of glass fiber, aluminum fiber, or fluoride fiber, wherein the content of the filler is 3 parts/100 relative to 100 grams of the light-transmitting matrix. The invention relates to a method for preparing a light-transmitting matrix comprising: a light-transmitting matrix comprising at least one of an imide repeating unit or an amide repeating unit, wherein the stress/strain index is calculated according to the following equation 1: [Equation 1] Stress/strain index = stress hysteresis / strain hysteresis wherein the stress hysteresis is calculated according to the following equation 2: [Equation 2] Stress hysteresis = [maximum compressive load / total load] * 100 wherein the strain hysteresis is calculated according to the following equation 3: [Equation 3] Strain hysteresis = [strain 2 - strain 1] * 100 wherein the maximum compressive load is the maximum compressive load required for the optical film to return to its original state after being stretched, and the total load (N) is the sum of the tensile load and the compressive load, wherein the tensile load is the load required for the optical film to be stretched to 1% strain, and the tensile load is measured using a universal tensile tester, and the compressive load is the load required for the optical film to return to its original state after obtaining the 1% strain, and the compressive load is measured using the universal tensile tester, and the strain 1 is the strain of the optical film before deformation, and the strain 2 is the strain of the optical film after deformation after 5 cycles, and is measured using the universal tensile tester. 如請求項1所述的光學膜,其中所述填料具有為5至2,500的長寬比,其中所述長寬比是所述填料的長度對所述填料的直徑的比率。 An optical film as described in claim 1, wherein the filler has an aspect ratio of 5 to 2,500, wherein the aspect ratio is the ratio of the length of the filler to the diameter of the filler. 如請求項1所述的光學膜,其中所述填料具有為0.1微米至5微米的長度。 An optical film as described in claim 1, wherein the filler has a length of 0.1 micrometer to 5 micrometers. 如請求項1所述的光學膜,其中所述填料具有為2奈米至20奈米的直徑。 An optical film as described in claim 1, wherein the filler has a diameter of 2 nm to 20 nm. 如請求項1所述的光學膜,其中所述光學膜具有為90百萬帕至160百萬帕的降伏拉伸強度。 An optical film as described in claim 1, wherein the optical film has a yield tensile strength of 90 megapascals to 160 megapascals. 如請求項1所述的光學膜,其中所述光學膜具有為4.0吉帕至15吉帕的模數。 An optical film as described in claim 1, wherein the optical film has a modulus of 4.0 GPa to 15 GPa. 一種顯示裝置,包括: 顯示面板;以及如請求項1至6中任一項所述的光學膜,設置於所述顯示面板上。 A display device, comprising: a display panel; and an optical film as described in any one of claims 1 to 6, disposed on the display panel.
TW112137186A 2022-09-29 2023-09-27 Optical film and display device TWI870044B (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201502166A (en) * 2013-05-28 2015-01-16 Akron Polymer Systems Inc Solution of aromatic polyamide for producing display element, optical element, or illumination element
TW202206547A (en) * 2020-04-30 2022-02-16 日商太陽控股股份有限公司 Resin composition and film using same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2004015013A1 (en) * 2002-08-07 2005-12-02 帝人株式会社 Thermoplastic resin composition and molded body
JP2004149687A (en) * 2002-10-31 2004-05-27 Teijin Ltd Coated fibrous aluminum oxide filler and thermoplastic resin composition containing the filler
JP2007238750A (en) * 2006-03-08 2007-09-20 Nichias Corp Resin paste and heat transfer structure
JP6834440B2 (en) * 2016-12-12 2021-02-24 コニカミノルタ株式会社 Polyimide film and display device using the film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201502166A (en) * 2013-05-28 2015-01-16 Akron Polymer Systems Inc Solution of aromatic polyamide for producing display element, optical element, or illumination element
TW202206547A (en) * 2020-04-30 2022-02-16 日商太陽控股股份有限公司 Resin composition and film using same

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