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TWI867111B - Composite material cutting method - Google Patents

Composite material cutting method Download PDF

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Publication number
TWI867111B
TWI867111B TW109143306A TW109143306A TWI867111B TW I867111 B TWI867111 B TW I867111B TW 109143306 A TW109143306 A TW 109143306A TW 109143306 A TW109143306 A TW 109143306A TW I867111 B TWI867111 B TW I867111B
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Taiwan
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laser light
layer
brittle material
light source
processing groove
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TW109143306A
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TW202134702A (en
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篠崎貴博
伊藤賢
菅野敏弘
仲井宏太
大峰俊樹
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日商日東電工股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/362Laser etching
    • B23K26/364Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/54Glass

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Laser Beam Processing (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Polarising Elements (AREA)

Abstract

本發明提供一種不會於脆性材料層之端面產生裂痕之複合材之分斷方法。 本發明係將於脆性材料層之各面側分別積層有光學功能層與保護層的複合材予以分斷的方法,其包含以下步驟:加工槽形成步驟,係將從第1雷射光源振盪出之雷射光沿著複合材之分斷預定線照射於光學功能層,形成第1加工槽,且將從第2雷射光源振盪出之雷射光沿著複合材之分斷預定線照射於保護層,形成第2加工槽;及脆性材料去除步驟,係於加工槽形成步驟之後,將從超短脈衝雷射光源振盪出之雷射光沿著分斷預定線照射於脆性材料層,形成加工痕;並且,以第2加工槽之寬度為於加工痕形成步驟中從超短脈衝雷射光源振盪出之雷射光朝脆性材料層之照射位置處之光點直徑以上之方式,去除形成保護層之樹脂。The present invention provides a method for cutting a composite material without generating cracks on the end face of a brittle material layer. The present invention is a method for cutting a composite material having an optical functional layer and a protective layer laminated on each side of a brittle material layer, and comprises the following steps: a processing groove forming step, wherein the laser light oscillated from the first laser light source is irradiated on the optical functional layer along the predetermined cutting line of the composite material to form a first processing groove, and the laser light oscillated from the second laser light source is irradiated on the protective layer along the predetermined cutting line of the composite material to form a second processing groove. 2 processing grooves; and a brittle material removal step, which is to irradiate the brittle material layer along the predetermined dividing line with the laser light oscillated from the ultra-short pulse laser light source after the processing groove forming step to form a processing mark; and, in a manner where the width of the second processing groove is greater than the spot diameter of the irradiation position of the laser light oscillated from the ultra-short pulse laser light source toward the brittle material layer in the processing mark forming step, the resin forming the protective layer is removed.

Description

複合材之分斷方法Composite material cutting method

本發明係關於將複合材分斷之方法,該複合材係於脆性材料層之一面側積層有樹脂製光學功能層(例如偏光薄膜)、於脆性材料層之另一面側積層有樹脂製保護層(例如保護薄膜)者。本發明尤其關於可在不使脆性材料層之端面產生裂痕下分斷複合材之方法。The present invention relates to a method for cutting a composite material, wherein a resin optical functional layer (e.g., a polarizing film) is laminated on one side of a brittle material layer, and a resin protective layer (e.g., a protective film) is laminated on the other side of the brittle material layer. In particular, the present invention relates to a method for cutting a composite material without causing cracks to be generated on the end face of the brittle material layer.

背景技術 近年來,液晶面板除了朝薄型化及高精細化進展外,為了使介面具有多樣性而於畫面上搭載有觸控感測器功能的液晶面板被使用於行動電話到資訊顯示器的廣泛領域中。 最近,由薄型化及輕量化之觀點,出現具有內置式液晶單元之液晶面板,該內置式液晶單元係於液晶單元之玻璃基板組裝有觸控感測器。Background technology In recent years, in addition to the thinning and high-precision of liquid crystal panels, liquid crystal panels equipped with touch sensor functions on the screen to make the interface more diverse are used in a wide range of fields from mobile phones to information displays. Recently, from the perspective of thinning and light weight, liquid crystal panels with built-in liquid crystal cells have emerged. The built-in liquid crystal cell is a touch sensor assembled on the glass substrate of the liquid crystal cell.

另一方面,被稱為薄玻璃之薄膜狀玻璃正作為配置於液晶面板之最表面的前面板而受到注目。薄玻璃由於可捲成捲筒狀,故具有亦可應用於所謂捲對捲方式之製程的優點,有人提出有與偏光薄膜一體化的玻璃偏光薄膜(例如參照專利文獻1)。 玻璃偏光薄膜由於只要貼合於內置式液晶單元即可獲得搭載有觸控感測器功能的液晶面板,故與使用強化玻璃作為前面板的一般液晶面板相比,可大幅簡化製程。On the other hand, thin-film glass called thin glass is attracting attention as the front panel disposed on the outermost surface of the liquid crystal panel. Since thin glass can be rolled into a roll shape, it has the advantage of being applicable to the so-called roll-to-roll process. Some people have proposed a glass polarizing film integrated with a polarizing film (for example, refer to Patent Document 1). Since the glass polarizing film can be attached to the built-in liquid crystal unit to obtain a liquid crystal panel equipped with a touch sensor function, it can greatly simplify the process compared to a general liquid crystal panel using tempered glass as the front panel.

專利文獻2提出有一種將複合材根據用途分斷成期望的形狀、尺寸之方法,該複合材如同上述玻璃偏光薄膜般,積層有由玻璃等形成之脆性材料層與由偏光薄膜等形成之光學功能層。 專利文獻2所記載之方法係如下所述:將從CO2 雷射光源等雷射光源振盪出之雷射光沿著複合材之分斷預定線照射至複合材之光學功能層(於專利文獻2中為樹脂層),將形成光學功能層之樹脂去除後,將從超短脈衝雷射光源振盪出之雷射光(超短脈衝雷射光)沿著複合材之分斷預定線照射至脆性材料層,將形成脆性材料層之脆性材料去除,藉此將複合材予以分斷。 根據專利文獻2記載之方法,具有不會於分斷後之脆性材料層之端面產生裂痕的優點。Patent document 2 proposes a method for dividing a composite material into a desired shape and size according to its use. The composite material, like the above-mentioned glass polarizing film, is layered with a brittle material layer formed of glass or the like and an optical functional layer formed of a polarizing film or the like. The method described in Patent Document 2 is as follows: laser light oscillated from a laser light source such as a CO2 laser light source is irradiated onto an optical functional layer (resin layer in Patent Document 2) of a composite material along a predetermined separation line of the composite material, and after removing the resin forming the optical functional layer, laser light oscillated from an ultra-short pulse laser light source (ultra-short pulse laser light) is irradiated onto a brittle material layer along a predetermined separation line of the composite material, and the brittle material forming the brittle material layer is removed, thereby separating the composite material. The method described in Patent Document 2 has the advantage that cracks will not be generated on the end face of the brittle material layer after separation.

此處,如同上述玻璃偏光薄膜般,積層有由玻璃等形成之脆性材料層與由偏光薄膜等形成之光學功能層的複合材,通常是於分斷後的複合材片中之脆性材料層之與積層有光學功能層的面為相反側的面上,積層保護薄膜等保護層後出貨。由於對每個分斷後的複合材片執行積層保護層之步驟很費時,故為了解決此問題以減少工時,期望一次性將複合材分斷的方法,該複合材係於脆性材料層之一面側積層有光學功能層且於脆性材料層之另一面側積層有保護層者。Here, as in the glass polarizing film described above, a composite material having a brittle material layer formed of glass or the like and an optical functional layer formed of a polarizing film or the like is usually shipped after a protective layer such as a protective film is laminated on the surface of the brittle material layer in the cut composite material sheet opposite to the surface on which the optical functional layer is laminated. Since the step of laminating the protective layer for each cut composite material sheet is very time-consuming, in order to solve this problem and reduce the working hours, a method of cutting a composite material at one time is desired, wherein the composite material has an optical functional layer laminated on one side of the brittle material layer and a protective layer laminated on the other side of the brittle material layer.

然而,於專利文獻2中並沒有提出將於脆性材料層之一面側積層有光學功能層、於脆性材料層之另一面側積層有保護層的複合材一次性分斷的方法。However, Patent Document 2 does not propose a method for simultaneously dividing a composite material having an optical functional layer laminated on one side of a brittle material layer and a protective layer laminated on the other side of the brittle material layer.

再者,於非專利文獻1中記載:於使用超短脈衝雷射光之加工技術中,利用超短脈衝雷射光之光絲現象,或於超短脈衝雷射光源應用多焦點光學系統或貝索光束光學系統。 先行技術文獻 專利文獻Furthermore, it is described in non-patent document 1 that: in a processing technology using ultra-short pulse laser light, the filament phenomenon of ultra-short pulse laser light is utilized, or a multi-focus optical system or a Besso beam optical system is applied to the ultra-short pulse laser light source. Prior art document Patent document

[專利文獻1]國際公開第2013/175767號 [專利文獻2]日本特開2019-122966號公報 [非專利文獻][Patent Document 1] International Publication No. 2013/175767 [Patent Document 2] Japanese Patent Publication No. 2019-122966 [Non-patent Document]

[非專利文獻1] 約翰·洛佩茲(John Lopez)等人、“使用超短脈衝貝索光束之玻璃切断(GLASS CUTTING USING ULTRASHORT PULSED BESSEL BEAMS)”、[online]、2015年10月、International Congress on Applications of Lasers & Electro-Optics (ICALEO)、[令和1年7月8日檢索]、網址(URL:https://www.researchgate.net/publication/284617626_GLASS_CUTTING_USING_ULTRASHORT_PULSED_BESSEL_BEAMS)[Non-patent document 1] John Lopez et al., “GLASS CUTTING USING ULTRASHORT PULSED BESSEL BEAMS”, [online], October 2015, International Congress on Applications of Lasers & Electro-Optics (ICALEO), [retrieved on July 8, 2015], URL: https://www.researchgate.net/publication/284617626_GLASS_CUTTING_USING_ULTRASHORT_PULSED_BESSEL_BEAMS)

發明概要 發明欲解決之課題 本發明係為解決上述先前技術之問題而完成者,其課題提供一種複合材之分斷方法,係將於脆性材料層之一面側積層有樹脂製光學功能層、於脆性材料層之另一面側積層有樹脂製保護層的複合材予以分斷的方法,且於脆性材料層之端面不產生裂痕。 用以解決課題之手段Summary of the invention Problem to be solved by the invention The present invention is completed to solve the above-mentioned problems of the prior art. The problem provides a method for cutting a composite material, which is a method for cutting a composite material having a resin optical functional layer laminated on one side of a brittle material layer and a resin protective layer laminated on the other side of the brittle material layer, and no cracks are generated on the end face of the brittle material layer. Means for solving the problem

為解決前述課題,本發明人等對應用前述專利文獻2記載之方法進行檢討。 具體而言,考慮於脆性材料層之一面側積層有樹脂製光學功能層、於脆性材料層之另一面側積層有樹脂製保護層的複合材中,藉由從CO2 雷射光源等振盪出之雷射光沿著複合材之分斷預定線於光學功能層形成加工槽(第1加工槽),且藉由從CO2 雷射光源等振盪出之雷射光沿著複合材之分斷預定線於保護層形成加工槽(第2加工槽)。然後,為了使分斷後之光學功能層之端面不產生嚴重的熱劣化(伴隨熱劣化之變色區域較少),認為可將從超短脈衝雷射光源振盪出之雷射光(超短脈衝雷射光)通過第2加工槽沿著複合材之分斷預定線照射於脆性材料層。To solve the aforementioned problem, the inventors of the present invention have examined the method described in the aforementioned patent document 2. Specifically, in a composite material in which a resin optical functional layer is laminated on one side of a brittle material layer and a resin protective layer is laminated on the other side of the brittle material layer, a processing groove (first processing groove) is formed in the optical functional layer along a predetermined dividing line of the composite material by laser light oscillating from a CO2 laser light source, etc., and a processing groove (second processing groove) is formed in the protective layer along a predetermined dividing line of the composite material by laser light oscillating from a CO2 laser light source, etc. Then, in order to prevent the end face of the optical functional layer after cutting from undergoing severe thermal degradation (with fewer discoloration areas associated with thermal degradation), it is considered that the laser light (ultra-short pulse laser light) oscillated from the ultra-short pulse laser light source can be irradiated onto the brittle material layer along the predetermined cutting line of the composite material through the second processing groove.

然而,本發明人等實際上就上述方法進行試驗,結果發現:若形成第2加工槽之雷射光之輸出較小、第2加工槽之深度較小,在將超短脈衝雷射光照射於脆性材料層時,無法於脆性材料層形成貫通其厚度方向之加工痕,無法分斷複合材。另一方面,已知若形成第2加工槽之雷射光之輸出過大,脆性材料層會受到熱損傷,在將超短脈衝雷射光照射於脆性材料層時,會以受到熱損傷之處為起點,於脆性材料層之端面產生裂痕。然後,已知為了可於脆性材料層形成加工痕,且不於脆性材料層之端面產生裂痕,在將用以形成第2加工槽之雷射光之輸出設定為適當值時,需要極微妙的調整,難以進行自動化。However, the inventors of the present invention have actually conducted tests on the above method and found that if the output of the laser light for forming the second processing groove is small and the depth of the second processing groove is small, when the ultra-short pulse laser light is irradiated on the brittle material layer, a processing mark penetrating the thickness direction of the brittle material layer cannot be formed, and the composite material cannot be separated. On the other hand, it is known that if the output of the laser light for forming the second processing groove is too large, the brittle material layer will be thermally damaged, and when the ultra-short pulse laser light is irradiated on the brittle material layer, cracks will be generated on the end surface of the brittle material layer starting from the thermally damaged area. It is known that in order to form a processing mark on the brittle material layer without generating cracks on the end surface of the brittle material layer, extremely delicate adjustments are required when setting the output of the laser light used to form the second processing groove to an appropriate value, and it is difficult to automate.

因此,本發明人等進而專心致力於研究,結果發現:只要以第2加工槽之寬度為超短脈衝雷射光朝脆性材料層的照射位置處的光點直徑以上之方式形成第2加工槽,就不需要微妙地調整用以形成第2加工槽之雷射光之輸出,可在不使脆性材料層之端面產生裂痕下分斷複合材,而完成本發明。Therefore, the inventors of the present invention further devoted themselves to research and found that as long as the width of the second processed groove is formed in a manner that is greater than the spot diameter of the ultra-short pulse laser light at the irradiation position toward the brittle material layer, there is no need to subtly adjust the output of the laser light used to form the second processed groove, and the composite material can be severed without causing cracks on the end surface of the brittle material layer, thereby completing the present invention.

本發明係基於上述本發明人等之發現而完成者。 即,為了解決前述課題,本發明提供一種複合材之分斷方法,係將於脆性材料層之一面側積層有樹脂製光學功能層、於前述脆性材料層之另一面側積層有樹脂製保護層的複合材予以分斷的方法,其包含以下步驟:加工槽形成步驟,係將從第1雷射光源振盪出之雷射光沿著前述複合材之分斷預定線照射於前述光學功能層,去除形成前述光學功能層之樹脂,藉此形成沿循前述分斷預定線之第1加工槽,且將從第2雷射光源振盪出之雷射光沿著前述分斷預定線照射於前述保護層,去除形成前述保護層之樹脂,藉此形成沿循前述分斷預定線之第2加工槽;及加工痕形成步驟,係於前述加工槽形成步驟之後,將從超短脈衝雷射光源振盪出之雷射光從前述第2加工槽側沿著前述分斷預定線照射於前述脆性材料層,去除形成前述脆性材料層之脆性材料,藉此形成沿循前述分斷預定線之加工痕;並且,於前述加工槽形成步驟中,以前述第2加工槽之寬度為於前述加工痕形成步驟中從前述超短脈衝雷射光源振盪出之雷射光朝前述脆性材料層之照射位置處之光點直徑以上之方式,去除形成前述保護層之樹脂。This invention is completed based on the discovery of the above inventors. That is, in order to solve the above-mentioned problem, the present invention provides a composite material cutting method, which is a composite material in which a resin optical functional layer is laminated on one side of a brittle material layer and a resin protective layer is laminated on the other side of the brittle material layer, and the composite material is cut, which comprises the following steps: a processing groove forming step, which is to irradiate the optical functional layer with laser light oscillated from a first laser light source along a predetermined cutting line of the composite material, remove the resin forming the optical functional layer, thereby forming a first processing groove along the predetermined cutting line, and irradiate the protective layer with laser light oscillated from a second laser light source along the predetermined cutting line, remove the resin forming the protective layer, and the composite material is cut. resin, thereby forming a second processing groove along the aforementioned predetermined breaking line; and a processing mark forming step, after the aforementioned processing groove forming step, irradiating the aforementioned brittle material layer with laser light oscillated from an ultra-short pulse laser light source from the side of the aforementioned second processing groove along the aforementioned predetermined breaking line, removing the brittle material forming the aforementioned brittle material layer, thereby forming a processing mark along the aforementioned predetermined breaking line; and, in the aforementioned processing groove forming step, the resin forming the aforementioned protective layer is removed in such a manner that the width of the aforementioned second processing groove is greater than the spot diameter of the laser light oscillated from the aforementioned ultra-short pulse laser light source at the irradiation position of the aforementioned brittle material layer in the aforementioned processing mark forming step.

根據本發明之方法,藉由於加工槽形成步驟中去除形成光學功能層之樹脂及形成保護層之樹脂,形成沿循分斷預定線之第1加工槽及第2加工槽後,於加工痕形成步驟中從第2加工槽側去除形成脆性材料層之脆性材料,藉此形成沿循相同的分斷預定線之加工痕。然後,於加工槽形成步驟中形成之第2加工槽,係以其寬度為於加工痕形成步驟中從超短脈衝雷射光源振盪出之雷射光(超短脈衝雷射光)朝脆性材料層之照射位置處之光點直徑以上之方式形成。藉此,如同前述本發明人等之見解,可在不使脆性材料層之端面產生裂痕下分斷脆性材料層。 如本發明之方法,藉由將第2加工槽之寬度設為在超短脈衝雷射光朝脆性材料層之照射位置處之光點直徑以上,則超短脈衝雷射光之能量不易被消耗在去除形成保護層之樹脂,而是充分地使用在去除形成脆性材料層之脆性材料,故可於脆性材料層形成加工痕,且可不使脆性材料層之端面產生裂痕。According to the method of the present invention, after the first processing groove and the second processing groove along the predetermined dividing line are formed by removing the resin forming the optical functional layer and the resin forming the protective layer in the processing groove forming step, the brittle material forming the brittle material layer is removed from the side of the second processing groove in the processing mark forming step, thereby forming a processing mark along the same predetermined dividing line. Then, the second processing groove formed in the processing groove forming step is formed in such a manner that its width is greater than the spot diameter of the laser light (ultra-short pulse laser light) oscillated from the ultra-short pulse laser light source at the irradiation position of the brittle material layer in the processing mark forming step. Thus, as the inventors of the present invention have found out, the brittle material layer can be cut without causing cracks to form on the end surface of the brittle material layer. As in the method of the present invention, by setting the width of the second processing groove to be larger than the spot diameter at the irradiation position of the ultra-short pulse laser light toward the brittle material layer, the energy of the ultra-short pulse laser light is not easily consumed in removing the resin forming the protective layer, but is fully used in removing the brittle material forming the brittle material layer, so that processing marks can be formed on the brittle material layer, and cracks can be prevented from forming on the end surface of the brittle material layer.

再者,於本發明之方法中,所謂「將雷射光沿著前述複合材之分斷預定線照射於前述光學功能層」係指從複合材之厚度方向(光學功能層、脆性材料層及保護層之積層方向)觀看,沿著分斷預定線將雷射光照射於光學功能層。又,於本發明之方法中,所謂「將雷射光沿著前述分斷預定線照射於前述保護層」係指從複合材之厚度方向(光學功能層、脆性材料層及保護層之積層方向)觀看,沿著分斷預定線將雷射光照射於保護層。進而,所謂「將雷射光從前述第2加工槽側沿著前述分斷預定線照射於前述脆性材料層」係指從複合材之厚度方向(光學功能層、脆性材料層及保護層之積層方向)觀看,沿著分斷預定線將雷射光從第2加工槽側照射於保護層。 又,於本發明之方法中,所謂「沿著分斷預定線照射於…」係指照射於分斷預定線上、或於分斷預定線之附近位置,與分斷預定線平行地照射。 進而,於本發明之方法中,所謂「第2加工槽之寬度」係指與分斷預定線垂直之方向上的第2加工槽底部的尺寸。Furthermore, in the method of the present invention, the so-called "irradiating the optical functional layer with laser light along the predetermined separation line of the composite material" means irradiating the optical functional layer with laser light along the predetermined separation line when viewed from the thickness direction of the composite material (the stacking direction of the optical functional layer, the brittle material layer, and the protective layer). Furthermore, in the method of the present invention, the so-called "irradiating the protective layer with laser light along the predetermined separation line" means irradiating the protective layer with laser light along the predetermined separation line when viewed from the thickness direction of the composite material (the stacking direction of the optical functional layer, the brittle material layer, and the protective layer). Furthermore, the so-called "irradiating the brittle material layer with laser light from the second processing groove side along the predetermined breaking line" means irradiating the protective layer with laser light from the second processing groove side along the predetermined breaking line when viewed from the thickness direction of the composite material (the stacking direction of the optical functional layer, the brittle material layer and the protective layer). In addition, in the method of the present invention, the so-called "irradiating along the predetermined breaking line" means irradiating on the predetermined breaking line or at a position near the predetermined breaking line, parallel to the predetermined breaking line. Furthermore, in the method of the present invention, the so-called "width of the second processing groove" means the size of the bottom of the second processing groove in the direction perpendicular to the predetermined breaking line.

又,於本發明之方法中,於加工槽形成步驟中使用之第1雷射光源及第2雷射光源之種類,只要屬可以振盪出之雷射光去除樹脂者,則無特別限定。惟,由可提高雷射光相對於複合材之相對移動速度(加工速度)之觀點,宜使用振盪出紅外區域之波長之雷射光的CO2 雷射光源或CO雷射光源。第1雷射光源及第2雷射光源可為相同種類、亦可為不同種類。又,第1雷射光源及第2雷射光源不一定需要獨立準備,亦可將第1雷射光源兼用作為第2雷射光源。 在獨立準備第1雷射光源及第2雷射光源時,只要將第1雷射光源配置於光學功能層側、將第2雷射光源配置於保護層側,使用第1雷射光源於光學功能層形成第1加工槽後,使用第2雷射光源於保護層形成第2加工槽即可。又,亦可使用第2雷射光源於保護層形成第2加工槽後,使用第1雷射光源於光學功能層形成第1加工槽。進而,亦可使用第1雷射光源及第2雷射光源同時形成第1加工槽及第2加工槽。 又,在將第1雷射光源兼用作為第2雷射光源時,亦可於與光學功能層及保護層中之任一者對向之側配置第1雷射光源(第2雷射光源),使用第1雷射光源(第2雷射光源)於光學功能層形成第1加工槽(或於保護層形成第2加工槽)後,將複合材反轉,使第1雷射光源(第2雷射光源)與光學功能層及保護層中之另一者對向,使用第1雷射光源(第2雷射光源)於保護層形成第2加工槽(或於光學功能層形成第1加工槽)。Furthermore, in the method of the present invention, the types of the first laser light source and the second laser light source used in the processing groove forming step are not particularly limited as long as they can oscillate laser light to remove resin. However, from the perspective of increasing the relative movement speed (processing speed) of the laser light relative to the composite material, it is preferable to use a CO2 laser light source or a CO laser light source that oscillates laser light with a wavelength in the infrared region. The first laser light source and the second laser light source may be of the same type or of different types. Furthermore, the first laser light source and the second laser light source do not necessarily need to be prepared independently, and the first laser light source may also be used as the second laser light source. When the first laser light source and the second laser light source are prepared independently, the first laser light source is arranged on the optical functional layer side and the second laser light source is arranged on the protective layer side, and after the first laser light source is used to form the first processing groove in the optical functional layer, the second laser light source is used to form the second processing groove in the protective layer. Alternatively, after the second laser light source is used to form the second processing groove in the protective layer, the first laser light source is used to form the first processing groove in the optical functional layer. Furthermore, the first laser light source and the second laser light source may be used to form the first processing groove and the second processing groove at the same time. Furthermore, when the first laser light source is also used as the second laser light source, the first laser light source (the second laser light source) can be arranged on the side opposite to either the optical functional layer or the protective layer. After the first laser light source (the second laser light source) is used to form the first processing groove in the optical functional layer (or the second processing groove in the protective layer), the composite material is reversed so that the first laser light source (the second laser light source) is opposite to the other of the optical functional layer and the protective layer, and the first laser light source (the second laser light source) is used to form the second processing groove in the protective layer (or the first processing groove in the optical functional layer).

進而,於本發明之方法中,關於於加工痕形成步驟中形成之加工痕,可例示譬如專利文獻2記載之沿循分斷預定線之點線狀貫通孔。此時,於加工痕形成步驟後,可藉由沿著分斷預定線施加外力而分斷複合材。作為朝複合材施加外力之方法,可例示:機械性破裂(山摺)、利用紅外區域雷射光加熱切斷預定線之附近部位、利用超音波滾筒施加振動、利用吸盤吸附及拉起等。關於朝複合材施加外力之方法,在使用利用紅外區域雷射光加熱切斷預定線之附近部位之情形下,利用於脆性材料層產生之熱應力,會以連接點線狀貫通孔之方式沿著分斷預定線發生龜裂,使得脆性材料層被分斷(割斷)。再者,於第1加工槽之底部殘存樹脂之殘渣時,只要如上所述施加外力將脆性材料層分斷後,例如對光學功能層進一步施加機械性外力來將複合材分斷即可。即使對光學功能層乃至於脆性材料層進一步施加機械性外力,由於此時脆性材料層已經被分斷,故不會於脆性材料層之端面產生裂痕。 於本發明之方法中,於加工痕形成步驟中形成之加工痕不一定限於點線狀貫通孔。若於加工痕形成步驟中,將從超短脈衝雷射光源振盪出之雷射光與脆性材料層之沿循分斷預定線之相對移動速度設定為小、或將超短脈動雷射光源之脈衝振盪之重複頻率設定為大,可形成沿著分斷預定線連接成一體之貫通孔(長孔)作為加工痕。此時,於加工痕形成步驟後,即使不沿著分斷預定線施加外力,亦可分斷脆性材料層。其中,於第1加工槽之底部殘存樹脂之殘渣時,只要將脆性材料層分斷後,例如對光學功能層施加機械性外力來將複合材分斷即可。Furthermore, in the method of the present invention, the processing mark formed in the processing mark forming step may be, for example, a dot-line through hole along the predetermined breaking line described in Patent Document 2. At this time, after the processing mark forming step, the composite material may be broken by applying an external force along the predetermined breaking line. Examples of methods for applying an external force to the composite material include mechanical rupture (mountain fold), heating and cutting the vicinity of the predetermined breaking line using infrared laser light, applying vibration using an ultrasonic roller, and adsorption and pulling up using a suction cup. Regarding the method of applying external force to the composite material, when using infrared laser light to heat the area near the predetermined cutting line, the thermal stress generated in the brittle material layer will cause a turtle crack along the predetermined cutting line in the form of a linear through hole connecting the points, so that the brittle material layer is separated (cut). Furthermore, when resin residues remain at the bottom of the first processing groove, after applying external force to separate the brittle material layer as described above, a mechanical external force can be further applied to the optical functional layer to separate the composite material. Even if a mechanical external force is further applied to the optical functional layer or even the brittle material layer, since the brittle material layer has been separated at this time, no cracks will be generated on the end surface of the brittle material layer. In the method of the present invention, the processing mark formed in the processing mark forming step is not necessarily limited to a dot-line through hole. If, in the processing mark forming step, the relative moving speed of the laser light oscillated from the ultra-short pulse laser light source and the brittle material layer along the predetermined breaking line is set to be small, or the repetition frequency of the pulse oscillation of the ultra-short pulse laser light source is set to be large, a through hole (long hole) connected to one another along the predetermined breaking line can be formed as a processing mark. In this case, after the processing mark forming step, the brittle material layer can be broken even if no external force is applied along the predetermined breaking line. When resin residues remain at the bottom of the first processing groove, the composite material can be separated by applying a mechanical external force to the optical functional layer after the brittle material layer is separated.

於本發明之方法中,為了使於加工槽形成步驟中形成之第2加工槽之寬度為於加工痕形成步驟中從超短脈衝雷射光源振盪出之雷射光(超短脈衝雷射光)朝脆性材料層之照射位置處之光點直徑以上,考慮例如使從第2雷射光源振盪出之雷射光之照射位置於與分斷預定線垂直之方向上移動,於各照射位置將雷射光照射於保護層後,將存在於各照射位置之間的形成保護層之樹脂剝離。若將該剝離樹脂之部分之尺寸(與分斷預定線垂直之方向之尺寸)設為超短脈衝雷射光朝脆性材料層之照射位置處之光點直徑以上,則可使第2加工槽之寬度成為超短脈衝雷射光朝脆性材料層之照射位置處之光點直徑以上。 即,較佳為於前述加工槽形成步驟中,將從前述第2雷射光源振盪出之雷射光朝前述保護層之照射位置於與前述分斷預定線垂直之方向上移動,於各照射位置沿著前述分斷預定線將前述雷射光照射於前述保護層後,將存在於前述各照射位置之間的形成前述保護層之樹脂剝離,藉此形成前述第2加工槽。In the method of the present invention, in order to make the width of the second processing groove formed in the processing groove forming step larger than the spot diameter of the laser light (ultra-short pulse laser light) oscillated from the ultra-short pulse laser light source in the processing mark forming step at the irradiation position of the brittle material layer, it is considered, for example, to move the irradiation position of the laser light oscillated from the second laser light source in a direction perpendicular to the predetermined dividing line, and after irradiating the protective layer with laser light at each irradiation position, peeling off the resin forming the protective layer between each irradiation position. If the size of the resin-stripped portion (the size in the direction perpendicular to the predetermined breaking line) is set to be larger than the spot diameter at the irradiation position of the ultra-short pulse laser light toward the brittle material layer, the width of the second processing groove can be made larger than the spot diameter at the irradiation position of the ultra-short pulse laser light toward the brittle material layer. That is, it is preferred that in the aforementioned processing groove forming step, the laser light oscillated from the aforementioned second laser light source is moved toward the irradiation position of the aforementioned protective layer in a direction perpendicular to the aforementioned predetermined breaking line, and after the aforementioned laser light is irradiated to the aforementioned protective layer along the aforementioned predetermined breaking line at each irradiation position, the resin forming the aforementioned protective layer between the aforementioned irradiation positions is stripped, thereby forming the aforementioned second processing groove.

根據上述較佳方法(以下適當稱為「剝離法」),例如考慮於加工槽形成步驟中,將從第2雷射光源振盪出之雷射光分別照射於以分斷預定線為基準、於與分斷預定線垂直之方向上等距離之位置,將存在於其等之間之形成保護層之樹脂剝離。藉此,若形成以分斷預定線作為寬度方向之中心的第2加工槽後,朝分斷預定線上照射超短脈衝雷射光,則從第2雷射光源振盪出之雷射光之照射位置與超短脈衝雷射光之照射位置僅偏離第2加工槽之寬度之1/2。 因此,縱使假設於加工槽形成步驟中,將從第2雷射光源振盪出之雷射光之輸出設定為大到一定程度,去除形成保護層之樹脂,使脆性材料層之表面露出而受到一些熱損傷,亦由於超短脈衝雷射光不易照射到相同位置,故於脆性材料層之端面不易產生裂痕。 又,存在於各照射位置之間之形成保護層之樹脂的剝離,可適當使用周知的剝離裝置進行。According to the above preferred method (hereinafter appropriately referred to as "stripping method"), for example, in the processing groove forming step, the laser light oscillated from the second laser light source is irradiated to positions equidistant in a direction perpendicular to the predetermined breaking line based on the predetermined breaking line, and the resin forming the protective layer existing therebetween is stripped. Thus, after forming the second processing groove with the predetermined breaking line as the center in the width direction, if the ultra-short pulse laser light is irradiated toward the predetermined breaking line, the irradiation position of the laser light oscillated from the second laser light source and the irradiation position of the ultra-short pulse laser light are only offset by 1/2 of the width of the second processing groove. Therefore, even if the output of the laser light oscillated from the second laser light source is set to a certain level in the processing groove forming step, the resin forming the protective layer is removed, so that the surface of the brittle material layer is exposed and suffers some thermal damage, it is also difficult for the ultra-short pulse laser light to irradiate the same position, so it is difficult for cracks to occur on the end surface of the brittle material layer. In addition, the resin forming the protective layer between each irradiation position can be stripped using a known stripping device as appropriate.

於本發明之方法中,使於加工槽形成步驟中形成之第2加工槽之寬度為超短脈衝雷射光朝脆性材料層之照射位置處之光點直徑以上之方法,並不限定於上述剝離法。 例如亦可為如下方法:於前述加工槽形成步驟中,將從前述第2雷射光源振盪出之雷射光朝前述保護層之照射位置於與前述分斷預定線垂直之方向上依序移動,於各照射位置沿著前述分斷預定線將前述雷射光照射於前述保護層,藉此形成前述第2加工槽(以下適當稱為「移動法」)。 若將使從第2雷射光源振盪出之雷射光之照射位置移動之範圍(與分斷預定線垂直之方向之範圍)設為超短脈衝雷射光朝脆性材料層之照射位置處之光點直徑以上,則可使第2加工槽之寬度成為超短脈衝雷射光朝脆性材料層之照射位置處之光點直徑以上。In the method of the present invention, the method of making the width of the second processing groove formed in the processing groove forming step larger than the spot diameter at the irradiation position of the ultra-short pulse laser light toward the brittle material layer is not limited to the above-mentioned stripping method. For example, it can also be the following method: in the aforementioned processing groove forming step, the laser light oscillated from the aforementioned second laser light source is sequentially moved toward the irradiation position of the aforementioned protective layer in a direction perpendicular to the aforementioned predetermined breaking line, and the aforementioned laser light is irradiated to the aforementioned protective layer along the aforementioned predetermined breaking line at each irradiation position, thereby forming the aforementioned second processing groove (hereinafter appropriately referred to as "movement method"). If the range of movement of the irradiation position of the laser light oscillated from the second laser light source (the range in the direction perpendicular to the predetermined dividing line) is set to be greater than the spot diameter of the irradiation position of the ultra-short pulse laser light toward the brittle material layer, the width of the second processing groove can be made greater than the spot diameter of the irradiation position of the ultra-short pulse laser light toward the brittle material layer.

於本發明中,超短脈衝雷射光朝脆性材料層之照射位置處之光點直徑例如設為100μm。 因此,於前述加工槽形成步驟中,宜以前述第2加工槽之寬度為100μm以上之方式去除形成前述保護層之樹脂,較佳為以前述第2加工槽之寬度為150μm以上之方式去除形成前述保護層之樹脂。 再者,超短脈衝雷射光源朝脆性材料層之照射位置處之光點直徑為100μm時,脆性材料層之光學功能層側之面之光點直徑經聚光後例如為1.2μm。又,超短脈衝雷射光朝脆性材料層之照射位置處之光點直徑為100μm時,在相當於保護層表面(與脆性材料層側之面相反側之面)的位置的光點直徑例如為154μm。In the present invention, the spot diameter of the ultra-short pulse laser light at the irradiation position of the brittle material layer is set to 100 μm, for example. Therefore, in the aforementioned processing groove formation step, the resin forming the aforementioned protective layer is preferably removed in a manner that the width of the aforementioned second processing groove is 100 μm or more, and preferably the resin forming the aforementioned protective layer is removed in a manner that the width of the aforementioned second processing groove is 150 μm or more. Furthermore, when the spot diameter of the ultra-short pulse laser light source at the irradiation position of the brittle material layer is 100 μm, the spot diameter of the surface of the optical functional layer side of the brittle material layer after focusing is, for example, 1.2 μm. Furthermore, when the spot diameter of the ultrashort pulse laser light at the irradiation position of the brittle material layer is 100 μm, the spot diameter at the position corresponding to the surface of the protective layer (the surface opposite to the surface of the brittle material layer) is, for example, 154 μm.

較好的是,前述保護層具備基材層、及配置於前述脆性材料層側之黏著劑層,於前述加工槽形成步驟中,以殘存前述黏著劑層之厚度方向之一部份之方式去除形成前述保護層之樹脂。Preferably, the protective layer comprises a substrate layer and an adhesive layer disposed on the side of the brittle material layer, and in the processing groove forming step, the resin forming the protective layer is removed in such a way that a portion of the adhesive layer in the thickness direction remains.

根據上述較佳方法,於加工槽形成步驟中,由於以殘存黏著劑層之厚度方向之一部份之方式去除形成保護層之樹脂,故脆性材料層不易受到熱損傷,於脆性材料層之端面更加不易產生裂痕。According to the above preferred method, in the processing groove forming step, since the resin forming the protective layer is removed in a manner that a portion of the residual adhesive layer in the thickness direction is left, the brittle material layer is not easily damaged by heat, and cracks are even less likely to occur on the end surface of the brittle material layer.

關於形成保護層所具備之黏著劑層之黏著劑,例如可使用丙烯酸系黏著劑,但為了防止於加工槽形成步驟中在保護層形成第2加工槽時產生煙霧,宜使用難以產生煙霧之胺基甲酸酯系黏著劑作為黏著劑。 即,較佳為前述保護層具備基材層、及配置於前述脆性材料層側之胺基甲酸酯系黏著劑層。Regarding the adhesive for forming the adhesive layer provided by the protective layer, for example, an acrylic adhesive can be used, but in order to prevent smoke from being generated when the protective layer forms the second processing groove in the processing groove forming step, a urethane adhesive that is difficult to generate smoke is preferably used as the adhesive. That is, it is preferred that the protective layer has a base material layer and a urethane adhesive layer disposed on the side of the brittle material layer.

根據上述較佳方法,可防止於加工槽形成步驟中從保護層所具備之黏著劑層產生煙霧。上述較佳方法於加工槽形成步驟中應用前述移動法時特別有效。即,於應用移動法時,與應用剝離法時相比,由於從第2雷射光源振盪出之雷射光朝保護層之照射位置較多,故成為從保護層所具備之黏著劑層容易產生煙霧之狀況。因此,可防止產生煙霧之上述較佳方法於應用移動法時特別有效。According to the above preferred method, it is possible to prevent smoke from being generated from the adhesive layer provided on the protective layer in the processing groove forming step. The above preferred method is particularly effective when the above-mentioned transfer method is applied in the processing groove forming step. That is, when the transfer method is applied, compared with when the peeling method is applied, the laser light oscillated from the second laser light source irradiates more positions toward the protective layer, so it becomes a situation where smoke is easily generated from the adhesive layer provided on the protective layer. Therefore, the above preferred method that can prevent smoke from being generated is particularly effective when the transfer method is applied.

本發明之方法例如適合使用於前述脆性材料層包含玻璃、且前述光學功能層包含偏光薄膜之情形。 發明效果The method of the present invention is suitable for use in the case where the aforementioned brittle material layer includes glass and the aforementioned optical functional layer includes a polarizing film. Effect of the invention

根據本發明,可將於脆性材料層之一面側積層有樹脂製光學功能層、於脆性材料層之另一面側積層有樹脂製保護層的複合材,在不使脆性材料層之端面產生裂痕下予以分斷。According to the present invention, a composite material having a resin optical functional layer laminated on one side of a brittle material layer and a resin protective layer laminated on the other side of the brittle material layer can be cut without causing cracks to occur on the end face of the brittle material layer.

用以實施發明之形態 以下,一面適當地參照附圖,一面對本發明一實施形態之複合材之分斷方法進行說明。Embodiment for implementing the invention Below, a method for cutting a composite material in an embodiment of the present invention will be described with appropriate reference to the attached drawings.

<複合材之構造> 首先,對應用本實施形態之分斷方法之複合材之構造進行說明。 圖1係顯示應用本實施形態之分斷方法之複合材之概略構造的剖面圖。 再者,應該注意的是,圖1只是參考性顯示,圖中顯示的構件等的尺寸、比例尺及形狀可能與實際的有所不同。關於其他圖亦相同。 如圖1所示,複合材10具有積層有脆性材料層1、積層於脆性材料層1之一面側(於圖1所示例中為下側)之樹脂製光學功能層2、及積層於脆性材料層1之另一面側(於圖1所示例中為上側)之樹脂製保護層3的構造。保護層3具備基材層3a、與配置於脆性材料層1側之黏著劑層3b。 本實施形態之分斷方法係將該複合材10於厚度方向(光學功能層2、脆性材料層1及保護層3之積層方向、圖1之上下方向、Z方向)上分斷之方法。<Structure of composite material> First, the structure of the composite material to which the cutting method of the present embodiment is applied is described. Fig. 1 is a cross-sectional view showing the schematic structure of the composite material to which the cutting method of the present embodiment is applied. It should be noted that Fig. 1 is for reference only, and the size, scale and shape of the components shown in the figure may differ from the actual ones. The same applies to other figures. As shown in Fig. 1, the composite material 10 has a structure in which a brittle material layer 1 is laminated, a resin optical functional layer 2 is laminated on one side of the brittle material layer 1 (the lower side in the example of Fig. 1), and a resin protective layer 3 is laminated on the other side of the brittle material layer 1 (the upper side in the example of Fig. 1). The protective layer 3 has a base material layer 3a and an adhesive layer 3b disposed on the side of the brittle material layer 1. The cutting method of this embodiment is a method of cutting the composite material 10 in the thickness direction (the stacking direction of the optical functional layer 2, the brittle material layer 1 and the protective layer 3, the up-down direction in FIG. 1, and the Z direction).

脆性材料層1、光學功能層2及保護層3係藉由任意之適當方法積層。例如,脆性材料層1、光學功能層2及保護層3可藉由所謂捲對捲方式積層。例如,可一面將長條之脆性材料層1、長條之光學功能層2之本體(例如構成光學功能層2之由圖1上方起依序為偏光薄膜、黏著劑及離型薄膜。唯,於圖1中省略偏光薄膜、黏著劑及離型薄膜之圖示)於長度方向上搬送、一面對齊彼此的長度方向後,經由接著劑(未圖示)相互貼合,藉此將脆性材料層1與光學功能層2(光學功能層2之本體及接著劑)積層。然後,可一面將長條之脆性材料層1及光學功能層2之積層體、長條之保護層3之基材層3a於長度方向上搬送、一面對齊彼此的長度方向後,經由黏著劑層3b相互貼合,藉此將脆性材料層1、光學功能層2及保護層3積層。然而,亦可將脆性材料層1與光學功能層2之本體分別切割為特定形狀後,再經由接著劑積層。又,亦可將脆性材料層1及光學功能層2之積層體與保護層3之基材層3a分別切割為特定形狀後,經由黏著劑層3b積層。The brittle material layer 1, the optical functional layer 2 and the protective layer 3 are laminated by any appropriate method. For example, the brittle material layer 1, the optical functional layer 2 and the protective layer 3 can be laminated by a so-called roll-to-roll method. For example, a long strip of brittle material layer 1 and a long strip of optical functional layer 2 (for example, the optical functional layer 2 is composed of a polarizing film, an adhesive, and a release film in order from the top of FIG. 1. However, the polarizing film, the adhesive, and the release film are omitted in FIG. 1) can be transported in the length direction, aligned in the length direction, and then bonded to each other via an adhesive (not shown), thereby laminating the brittle material layer 1 and the optical functional layer 2 (the main body of the optical functional layer 2 and the adhesive). Then, the long brittle material layer 1 and the laminated body of the optical functional layer 2 and the long base layer 3a of the protective layer 3 can be transported in the length direction and aligned with each other in the length direction, and then bonded to each other through the adhesive layer 3b, thereby laminating the brittle material layer 1, the optical functional layer 2 and the protective layer 3. However, the main bodies of the brittle material layer 1 and the optical functional layer 2 can be cut into specific shapes respectively, and then laminated through the adhesive layer. In addition, the laminated body of the brittle material layer 1 and the optical functional layer 2 and the base layer 3a of the protective layer 3 can be cut into specific shapes respectively, and then laminated through the adhesive layer 3b.

關於形成脆性材料層1之脆性材料,可例示:玻璃、及單晶或多晶矽。較佳為使用玻璃。 關於玻璃,若根據組成進行分類,可例示:鈉鈣玻璃、硼酸玻璃、氧化鋁矽酸玻璃、石英玻璃及藍寶石玻璃。又,若根據鹼成分進行分類,可例示:無鹼玻璃、低鹼玻璃。玻璃之鹼金屬成分(例如Na2 O、K2 O、Li2 O)之含量宜為15重量%以下、較佳為10重量%以下。As for the brittle material forming the brittle material layer 1, examples include glass and single crystal or polycrystalline silicon. Glass is preferably used. As for glass, if it is classified according to the composition, examples include sodium calcium glass, boric acid glass, alumina silicate glass, quartz glass and sapphire glass. Moreover, if it is classified according to the alkali component, examples include alkali-free glass and low-alkali glass. The content of the alkali metal component (e.g., Na2O , K2O , Li2O ) of the glass is preferably 15% by weight or less, preferably 10% by weight or less.

脆性材料層1之厚度宜為150μm以下、較佳為120μm以下、更佳為100μm以下。另一方面,脆性材料層1之厚度宜為30μm以上、較佳為80μm以上。若脆性材料層1之厚度於上述範圍,可利用捲對捲與光學功能層2積層。The thickness of the brittle material layer 1 is preferably 150 μm or less, preferably 120 μm or less, and more preferably 100 μm or less. On the other hand, the thickness of the brittle material layer 1 is preferably 30 μm or more, and preferably 80 μm or more. If the thickness of the brittle material layer 1 is within the above range, the optical functional layer 2 can be laminated using roll-to-roll.

形成脆性材料層1之脆性材料為玻璃時,脆性材料層1之波長550nm下之透光率宜為85%以上。形成脆性材料層1之脆性材料為玻璃時,脆性材料層1之波長550nm下之折射率宜為1.4~1.65。形成脆性材料層1之脆性材料為玻璃時,脆性材料層1之密度宜為2.3g/cm3 ~3.0g/cm3 、較佳為2.3g/cm3 ~2.7g/cm3When the brittle material forming the brittle material layer 1 is glass, the light transmittance of the brittle material layer 1 at a wavelength of 550nm is preferably 85% or more. When the brittle material forming the brittle material layer 1 is glass, the refractive index of the brittle material layer 1 at a wavelength of 550nm is preferably 1.4 to 1.65. When the brittle material forming the brittle material layer 1 is glass, the density of the brittle material layer 1 is preferably 2.3 g/cm 3 to 3.0 g/cm 3 , preferably 2.3 g/cm 3 to 2.7 g/cm 3 .

形成脆性材料層1之脆性材料為玻璃時,可直接使用市售的玻璃板作為脆性材料層1,亦可將市售的玻璃板研磨為期望的厚度後使用。關於市售的玻璃板,可舉例:Corning公司製「7059」、「1737」或「EAGLE2000」、旭硝子公司製「AN100」、NH Techno Glass公司製「NA-35」、日本電氣硝子公司製「OA-10G」、Schott公司製「D263」或「AF45」。When the brittle material forming the brittle material layer 1 is glass, a commercially available glass plate may be used directly as the brittle material layer 1, or a commercially available glass plate may be ground to a desired thickness and used. Examples of commercially available glass plates include "7059", "1737" or "EAGLE2000" manufactured by Corning, "AN100" manufactured by Asahi Glass, "NA-35" manufactured by NH Techno Glass, "OA-10G" manufactured by Nippon Electric Glass, and "D263" or "AF45" manufactured by Schott.

關於光學功能層2之本體,可例示由聚對苯二甲酸乙二酯(PET)、聚乙烯(PE)、聚丙烯(PP)、聚甲基丙烯酸甲酯(PMMA)等丙烯酸樹脂、環狀烯烴聚合物(COP)、環狀烯烴共聚物(COC)、聚碳酸酯(PC)、胺基甲酸酯樹脂、聚乙烯醇(PVA)、聚醯亞胺(PI)、聚四氟乙烯(PTFE)、聚氯乙烯(PVC)、聚苯乙烯(PS)、三醋酸纖維素(TAC)、聚萘二甲酸乙二酯(PEN)、乙烯-乙酸乙烯酯(EVA)、聚醯胺(PA)、聚矽氧樹脂、環氧樹脂、液晶聚合物、各種樹脂製發泡體等塑膠材料形成之單層薄膜、或由複數層構成之積層薄膜。Regarding the main body of the optical functional layer 2, examples include a single-layer film formed of plastic materials such as acrylic resins such as polyethylene terephthalate (PET), polyethylene (PE), polypropylene (PP), polymethyl methacrylate (PMMA), cyclic olefin polymers (COP), cyclic olefin copolymers (COC), polycarbonate (PC), urethane resins, polyvinyl alcohol (PVA), polyimide (PI), polytetrafluoroethylene (PTFE), polyvinyl chloride (PVC), polystyrene (PS), cellulose triacetate (TAC), polyethylene naphthalate (PEN), ethylene-vinyl acetate (EVA), polyamide (PA), silicone resins, epoxy resins, liquid crystal polymers, and various resin foams, or a laminated film consisting of a plurality of layers.

光學功能層2之本體為由複數層構成之積層薄膜時,亦可於層間存在丙烯酸黏著劑、胺基甲酸酯黏著劑、聚矽氧黏著劑等各種黏著劑或接著劑。 又,亦可於光學功能層2之本體表面形成有氧化銦錫(ITO)、Ag、Au、Cu等導電性無機膜。 本實施形態之分斷方法尤其適用於光學功能層2之本體為用於顯示器的偏光薄膜或相位差薄膜等之情形。 光學功能層2之本體厚度宜為20~500μm、較佳為50~300μm。When the main body of the optical functional layer 2 is a laminated film composed of multiple layers, various adhesives or bonding agents such as acrylic adhesives, urethane adhesives, and polysilicone adhesives may also exist between the layers. In addition, a conductive inorganic film such as indium tin oxide (ITO), Ag, Au, and Cu may also be formed on the surface of the main body of the optical functional layer 2. The separation method of this embodiment is particularly suitable for the case where the main body of the optical functional layer 2 is a polarizing film or a phase difference film used in a display. The main body thickness of the optical functional layer 2 is preferably 20 to 500 μm, preferably 50 to 300 μm.

於本實施形態中,如前所述,光學功能層2之本體為從圖1上方起依序積層有偏光薄膜、黏著劑及離型薄膜的積層薄膜。光學功能層2之本體係經由接著劑(未圖示)與脆性材料層1積層。於本實施形態中,將光學功能層2之本體(偏光薄膜、黏著劑及離型薄膜)與接著劑之組合稱為光學功能層2。In this embodiment, as described above, the main body of the optical functional layer 2 is a laminated film on which a polarizing film, an adhesive, and a release film are laminated in order from the top of FIG. 1. The main body of the optical functional layer 2 is laminated with the brittle material layer 1 via an adhesive (not shown). In this embodiment, the combination of the main body of the optical functional layer 2 (polarizing film, adhesive, and release film) and the adhesive is referred to as the optical functional layer 2.

構成光學功能層2之本體之偏光薄膜具有偏光件與配置於偏光件之至少一側之保護薄膜。偏光件之厚度並無特別限制,可視目的採用適當的厚度。偏光件之厚度通常為1~80μm左右。於一態樣中,偏光件之厚度宜為30μm以下。偏光件為碘系偏光件。更詳細而言,上述偏光件可由包含碘之聚乙烯醇系樹脂薄膜構成。The polarizing film constituting the main body of the optical functional layer 2 has a polarizer and a protective film disposed on at least one side of the polarizer. The thickness of the polarizer is not particularly limited, and an appropriate thickness can be adopted according to the purpose. The thickness of the polarizer is usually about 1 to 80 μm. In one embodiment, the thickness of the polarizer is preferably less than 30 μm. The polarizer is an iodine-based polarizer. In more detail, the above-mentioned polarizer can be composed of a polyvinyl alcohol-based resin film containing iodine.

關於構成上述偏光薄膜之偏光件之製造方法,可舉例以下方法1、2等。 (1)方法1:使聚乙烯醇系樹脂薄膜單體延伸、染色之方法。 (2)方法2:使具有樹脂基材與聚乙烯醇系樹脂層之積層體(i)延伸、染色之方法。 方法1由於為本技術領域者周知慣用的方法,故省略詳細的說明。 方法2宜包含使具有樹脂基材與形成於該樹脂基材單側之聚乙烯醇系樹脂層的積層體(i)延伸、染色後,於前述樹脂基材上製作偏光件之步驟。積層體(i)可於樹脂基材上塗佈包含聚乙烯醇系樹脂之塗佈液並使之乾燥而形成。又,積層體(i)亦可於樹脂基材上轉印聚乙烯醇系樹脂膜而形成。方法2之詳細情形例如記載於日本特開2012-73580號公報,該公報作為參考引用於本說明書中。Regarding the method for manufacturing the polarizer constituting the above-mentioned polarizing film, the following methods 1 and 2 can be cited as examples. (1) Method 1: A method for stretching and dyeing a polyvinyl alcohol-based resin film monomer. (2) Method 2: A method for stretching and dyeing a laminate (i) having a resin substrate and a polyvinyl alcohol-based resin layer. Method 1 is a commonly used method known to those skilled in the art, so a detailed description thereof is omitted. Method 2 preferably includes the step of stretching and dyeing a laminate (i) having a resin substrate and a polyvinyl alcohol-based resin layer formed on one side of the resin substrate, and then manufacturing a polarizer on the resin substrate. The laminate (i) can be formed by coating a coating liquid containing a polyvinyl alcohol resin on a resin substrate and drying it. Alternatively, the laminate (i) can be formed by transferring a polyvinyl alcohol resin film onto a resin substrate. The details of method 2 are described in, for example, Japanese Patent Application Publication No. 2012-73580, which is incorporated herein by reference.

構成上述偏光薄膜之保護薄膜係配置於偏光件之一面或兩面。關於保護薄膜,亦可使用三醋酸纖維素系薄膜、丙烯酸系薄膜、環烯烴系薄膜、聚對苯二甲酸乙二酯系薄膜等。又,偏光薄膜亦可適當地進一步具備相位差薄膜。相位差薄膜可視目的,具有任意適當的光學特性及/或機械特性。The protective film constituting the polarizing film is disposed on one or both sides of the polarizer. As for the protective film, a triacetate cellulose film, an acrylic film, a cycloolefin film, a polyethylene terephthalate film, etc. can also be used. In addition, the polarizing film can also be appropriately provided with a phase difference film. The phase difference film can have any appropriate optical properties and/or mechanical properties depending on the purpose.

在複合材10提供實用之前,構成光學功能層2之本體之離型薄膜具有保護構成光學功能層2之本體的黏著劑層的作用。關於離型薄膜之構成材料,例如可列舉:聚乙烯、聚丙烯、聚對苯二甲酸乙二酯、聚酯薄膜等塑膠薄膜、或紙、布、不織布等多孔質材料、網狀物、發泡片、金屬箔及此等之層壓體等適當的薄片體等,由表面平滑性優異之觀點,宜使用塑膠薄膜。Before the composite material 10 is put into practical use, the release film constituting the main body of the optical functional layer 2 has the function of protecting the adhesive layer constituting the main body of the optical functional layer 2. The constituent materials of the release film include, for example, plastic films such as polyethylene, polypropylene, polyethylene terephthalate, polyester films, or porous materials such as paper, cloth, non-woven fabrics, meshes, foam sheets, metal foils, and laminates thereof, and appropriate thin sheets, etc. Plastic films are preferably used from the viewpoint of excellent surface smoothness.

關於構成光學功能層2之接著劑,例如可使用:聚酯系接著劑、聚胺基甲酸酯系接著劑、聚乙烯醇系接著劑、環氧系接著劑。尤其由獲得良好的密著性之觀點,宜使用環氧系接著劑。 接著劑為熱硬化型接著劑時,可藉由加熱而硬化(固化)來發揮剝離阻力。又,接著劑為紫外線硬化型等光硬化型接著劑時,可藉由照射紫外線等光而使之硬化,來發揮剝離阻力。進而,接著劑為溼氣硬化型接著劑時,因為可與環境中之水分等反應而硬化,故即使放置亦會硬化,而發揮剝離阻力。 關於接著劑,例如可使用市售的接著劑、亦可將各種硬化型樹脂溶解或分散於溶劑中、製備作為接著劑溶液(或分散液)。 接著劑之厚度宜為10μm以下、較佳為1~10μm、更佳為1~8μm、再更佳為1~6μm。Regarding the adhesive constituting the optical functional layer 2, for example, polyester adhesives, polyurethane adhesives, polyvinyl alcohol adhesives, and epoxy adhesives can be used. In particular, epoxy adhesives are preferably used from the viewpoint of obtaining good adhesion. When the adhesive is a thermosetting adhesive, it can be cured (cured) by heating to exert peeling resistance. In addition, when the adhesive is a light-curing adhesive such as an ultraviolet curing adhesive, it can be cured by irradiating ultraviolet light to exert peeling resistance. Furthermore, when the adhesive is a moisture-curing adhesive, it can react with moisture in the environment to cure, so it will cure even if it is left alone, and exert peeling resistance. As for the adhesive, for example, a commercially available adhesive may be used, or various hardening resins may be dissolved or dispersed in a solvent to prepare an adhesive solution (or dispersion). The thickness of the adhesive is preferably less than 10 μm, preferably 1 to 10 μm, more preferably 1 to 8 μm, and even more preferably 1 to 6 μm.

於本實施形態中,保護層3之基材層3a係經由黏著劑層3b積層於脆性材料層1。雖然亦可以自黏著型薄膜構成保護層3之基材層3a、不經由黏著劑層地積層於脆性材料層1,但由保護脆性材料層1之觀點,宜如本實施形態般經由黏著劑層3b積層於脆性材料層1。 由檢查性或管理性等觀點,關於基材層3a係選擇具有各向同性或接近各向同性之薄膜材料。關於其薄膜材料,例如可列舉:聚對苯二甲酸乙二酯薄膜等聚酯系樹脂、纖維素系樹脂、乙酸酯系樹脂、聚醚碸系樹脂、聚碳酸酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚烯烴系樹脂、丙烯酸系樹脂等透明的聚合物。其等之中,較佳為聚酯系樹脂。關於基材層3a,亦可使用1種或2種以上之薄膜材料之層壓體,亦可使用前述薄膜之延伸物。基材層3a之厚度宜為35μm~100μm以下、進而較佳為超過38μm、100μm以下。In this embodiment, the base layer 3a of the protective layer 3 is laminated on the brittle material layer 1 via the adhesive layer 3b. Although the base layer 3a of the protective layer 3 can also be formed of a self-adhesive film and laminated on the brittle material layer 1 without an adhesive layer, from the perspective of protecting the brittle material layer 1, it is preferable to laminate on the brittle material layer 1 via the adhesive layer 3b as in this embodiment. From the perspective of inspection or management, a thin film material having isotropy or near isotropy is selected for the base layer 3a. Regarding the film material, for example, polyester resins such as polyethylene terephthalate film, cellulose resins, acetate resins, polyether sulfone resins, polycarbonate resins, polyamide resins, polyimide resins, polyolefin resins, acrylic resins and other transparent polymers can be listed. Among them, polyester resins are preferred. Regarding the substrate layer 3a, a laminate of one or more film materials can also be used, and an extension of the aforementioned film can also be used. The thickness of the substrate layer 3a is preferably 35μm to 100μm or less, and more preferably more than 38μm and less than 100μm.

關於形成黏著劑層3b之黏著劑,可適當選擇以(甲基)丙烯酸系聚合物、聚矽氧系聚合物、聚酯、聚胺基甲酸酯、聚醯胺、聚醚、氟系或橡膠系等聚合物作為基礎聚合物之黏著劑使用。由透明性、耐候性、耐熱性等觀點,較佳為以丙烯酸系聚合物作為基礎聚合物之丙烯酸系黏著劑。然後,如後所述,為了防止於保護層3形成第2加工槽31時產生煙霧,關於形成黏著劑層3b之黏著劑宜使用以聚胺基甲酸酯作為基礎聚合物之胺基甲酸酯系黏著劑。黏著劑層3b之厚度(乾燥膜厚)係根據所需要之黏著力而決定。通常為1~100μm左右、較佳為5~50μm。As for the adhesive forming the adhesive layer 3b, an adhesive having a polymer such as (meth) acrylic polymer, silicone polymer, polyester, polyurethane, polyamide, polyether, fluorine or rubber as a base polymer can be appropriately selected for use. From the viewpoints of transparency, weather resistance, heat resistance, etc., an acrylic adhesive having an acrylic polymer as a base polymer is preferred. Then, as described later, in order to prevent the generation of smoke when the second processing groove 31 is formed in the protective layer 3, a urethane adhesive having a polyurethane as a base polymer is preferably used as the adhesive forming the adhesive layer 3b. The thickness (dry film thickness) of the adhesive layer 3b is determined according to the required adhesion. Usually it is about 1~100μm, preferably 5~50μm.

<複合材之分斷方法> 以下,就具有上述構造之複合材10之分斷方法進行說明。 本實施形態之分斷方法包含加工槽形成步驟與加工痕形成步驟。又,本實施形態之分斷方法視需要包含複合材分斷步驟。以下,就各步驟依序說明。<Method for cutting composite material> The following is a description of a method for cutting the composite material 10 having the above-mentioned structure. The cutting method of this embodiment includes a processing groove forming step and a processing mark forming step. In addition, the cutting method of this embodiment includes a composite material cutting step as needed. The following is a description of each step in order.

[加工槽形成步驟] 圖2係示意性說明本實施形態之分斷方法之概略程序的說明圖。圖2(a)及(b)係顯示本實施形態之分斷方法之加工槽形成步驟的剖面圖。圖2(c)係顯示本實施形態之分斷方法之加工痕形成步驟的剖面圖。圖2(d)係顯示本實施形態之分斷方法之複合材分斷步驟的剖面圖。 如圖2(a)所示,於加工槽形成步驟中,將從第1雷射光源20振盪出之雷射光L1沿著複合材10之分斷預定線照射於光學功能層2,去除形成光學功能層2之樹脂。藉此,形成沿循分斷預定線之第1加工槽21。 於圖2所示之例中,為求方便,圖示複合材10之面內(XY二維平面內)垂直之2方向(X方向及Y方向)之中、於Y方向延伸之直線DL為分斷預定線之情形,但本發明並不限於此,例如設定有於X方向延伸之複數條直線DL與於Y方向延伸之複數條直線DL而形成格子狀之分斷預定線等,可設定各種分斷預定線。以下,將該直線DL稱為「分斷預定線DL」。 分斷預定線DL亦可實際上描繪於複合材10,作為可視覺性辨識之顯示,亦可於控制雷射光L1與複合材10之XY二維平面上之相對位置關係之控制裝置(未圖示)預先輸入分斷預定線DL之座標。圖2所示之分斷預定線DL係於控制裝置預先輸入其座標、實際上未描繪於複合材10之假想線。再者,分斷預定線DL並不限於直線,亦可為曲線。可根據複合材10之用途決定分斷預定線DL,藉此根據用途將複合材10分斷為任意形狀、尺寸。[Processing groove forming step] Figure 2 is an explanatory diagram schematically illustrating the general procedure of the segmentation method of the present embodiment. Figures 2(a) and (b) are cross-sectional views showing the processing groove forming step of the segmentation method of the present embodiment. Figure 2(c) is a cross-sectional view showing the processing mark forming step of the segmentation method of the present embodiment. Figure 2(d) is a cross-sectional view showing the composite material segmentation step of the segmentation method of the present embodiment. As shown in Figure 2(a), in the processing groove forming step, the laser light L1 oscillated from the first laser light source 20 is irradiated onto the optical functional layer 2 along the predetermined segmentation line of the composite material 10 to remove the resin forming the optical functional layer 2. Thereby, the first processing groove 21 along the predetermined segmentation line is formed. In the example shown in FIG. 2 , for convenience, the straight line DL extending in the Y direction among the two perpendicular directions (X direction and Y direction) in the plane of the composite material 10 (in the XY two-dimensional plane) is shown as the predetermined breaking line, but the present invention is not limited to this. For example, a plurality of straight lines DL extending in the X direction and a plurality of straight lines DL extending in the Y direction are set to form a grid-like predetermined breaking line, and various predetermined breaking lines can be set. Hereinafter, the straight line DL is referred to as the "predetermined breaking line DL". The predetermined breaking line DL can also be actually drawn on the composite material 10 as a display that can be visually identified, and the coordinates of the predetermined breaking line DL can also be pre-input into a control device (not shown) that controls the relative position relationship between the laser light L1 and the composite material 10 on the XY two-dimensional plane. The predetermined separation line DL shown in FIG. 2 is an imaginary line whose coordinates are pre-input in the control device and which is not actually drawn on the composite material 10. Furthermore, the predetermined separation line DL is not limited to a straight line, but may also be a curved line. The predetermined separation line DL may be determined according to the purpose of the composite material 10, thereby the composite material 10 may be separated into any shape and size according to the purpose.

於本實施形態中,使用振盪出之雷射光L1之波長為紅外區域之9~11μm的CO2 雷射光源作為第1雷射光源20。 然而,本發明並不限於此,亦可使用振盪出之雷射光L1之波長為5μm的CO雷射光源作為第1雷射光源20。 又,亦可使用可見光及紫外線(UV)脈衝雷射光源作為第1雷射光源20。關於可見光及UV脈衝雷射光源,可例示:振盪出之雷射光L1之波長為532nm、355nm、349nm或266nm(以Nd:YAG、Nd:YLF或YVO4作為介質之固體雷射光源之高次諧波)者、振盪出之雷射光L1之波長為351nm、248nm、222nm、193nm或157nm之準分子雷射光源、振盪出之雷射光L1之波長為157nm之F2雷射光源。 又,關於第1雷射光源20,亦可使用振盪出之雷射光L1之波長為紫外區域以外且脈衝寬為飛秒或皮秒級之脈衝雷射光源。若使用從該脈衝雷射光源振盪之雷射光L1,可基於多光子吸收過程而誘發蝕除加工。 進而,關於第1雷射光源20,亦可使用振盪出之雷射光L1之波長為紅外區域之半導體雷射光源或光纖雷射光源。In the present embodiment, a CO2 laser light source oscillating the wavelength of the laser light L1 in the infrared region of 9 to 11 μm is used as the first laser light source 20. However, the present invention is not limited thereto, and a CO laser light source oscillating the wavelength of the laser light L1 in the infrared region of 5 μm may be used as the first laser light source 20. In addition, a visible light and ultraviolet (UV) pulse laser light source may be used as the first laser light source 20. As for the visible light and UV pulse laser light source, there can be exemplified: laser light L1 oscillating at a wavelength of 532nm, 355nm, 349nm or 266nm (higher harmonics of solid laser light sources using Nd:YAG, Nd:YLF or YVO4 as the medium), excimer laser light source oscillating at a wavelength of 351nm, 248nm, 222nm, 193nm or 157nm, and F2 laser light source oscillating at a wavelength of 157nm. In addition, as for the first laser light source 20, a pulse laser light source oscillating at a wavelength of laser light L1 outside the ultraviolet region and having a pulse width of femtosecond or picosecond level can also be used. If the laser light L1 oscillated from the pulse laser light source is used, the etching process can be induced based on the multiphoton absorption process. Furthermore, as for the first laser light source 20, a semiconductor laser light source or a fiber laser light source oscillating the laser light L1 at a wavelength in the infrared region can also be used.

關於將雷射光L1沿著複合材10之分斷預定線照射之態樣(掃描雷射光L1之態樣),例如考慮如下方法:將單片狀之複合材10載置於XY雙軸工作台(未圖示),進行固定(例如吸附固定),藉由來自控制裝置之控制信號驅動XY雙軸工作台,藉此改變複合材10相對於雷射光L1於XY二維平面上之相對位置。又,亦考慮如下方法:將複合材10之位置固定、使用利用來自控制裝置之控制信號驅動之檢流計反射鏡或多邊形鏡使從第1雷射光源20振盪出之雷射光L1偏向,藉此改變照射於複合材10之雷射光L1於XY二維平面上之位置。進而,亦可併用上述使用XY雙軸工作台之複合材10之掃描與使用檢流計反射鏡等之雷射光L1之掃描兩者。Regarding the state of irradiating the composite material 10 with the laser light L1 along the predetermined dividing line (the state of scanning the laser light L1), for example, the following method is considered: a single-sheet composite material 10 is placed on an XY two-axis table (not shown), fixed (for example, fixed by adsorption), and the XY two-axis table is driven by a control signal from a control device, thereby changing the relative position of the composite material 10 with respect to the laser light L1 on the XY two-dimensional plane. In addition, the following method is also considered: the position of the composite material 10 is fixed, and the laser light L1 oscillated from the first laser light source 20 is deflected using a galvanometer reflector or a polygonal mirror driven by a control signal from a control device, thereby changing the position of the laser light L1 irradiated on the composite material 10 on the XY two-dimensional plane. Furthermore, the scanning of the composite material 10 using the XY dual-axis worktable and the scanning of the laser light L1 using a galvanometer mirror or the like may be used in combination.

第1雷射光源20之振盪形態可為脈衝振盪,亦可為連續振盪。雷射光L1之空間強度分布可為高斯分布,亦可為了抑制作為雷射光L1之去除對象外的脆性材料層1之熱損傷,而使用繞射光學元件(未圖示)等整形為平頂分布。雷射光L1之偏光狀態並無限制,可為直線偏光、圓偏光及不規則偏光中任一者。The oscillation form of the first laser light source 20 may be a pulse oscillation or a continuous oscillation. The spatial intensity distribution of the laser light L1 may be a Gaussian distribution, or may be shaped into a flat-top distribution using a diffraction optical element (not shown) or the like in order to suppress thermal damage to the brittle material layer 1 other than the removal target of the laser light L1. The polarization state of the laser light L1 is not limited, and may be any of linear polarization, circular polarization, and irregular polarization.

藉由將雷射光L1沿著複合材10之分斷預定線DL照射於光學功能層2,形成光學功能層2之樹脂中被雷射光L1照射到的樹脂,伴隨著吸收紅外光而產生局部的溫度上升,該樹脂飛散,藉此從複合材10去除該樹脂,於複合材10形成第1加工槽21。為了抑制從複合材10去除之樹脂之飛散物再度附著於複合材10,宜於分斷預定線DL之附近設置集塵機構。為了抑制第1加工槽21之寬度過大,宜以朝光學功能層2之照射位置處之光點直徑(光學功能層2之與脆性材料層1側之面為相反側之面處的光點直徑)為300μm以下之方式,使雷射光L1聚光,較佳為以光點直徑為200μm以下之方式使雷射光L1聚光。 朝光學功能層2之照射位置處之雷射光L1之光點直徑例如設為150μm左右,此時,光學功能層2之脆性材料層1側之面處之光點直徑經聚光後例如成為30~40μm。藉此,形成寬度(與分斷預定線DL垂直之方向上之第1加工槽21之底部尺寸)為30~40μm之第1加工槽21。 第1加工槽21之寬度例如為100μm以下、較佳為50μm以下。By irradiating the optical functional layer 2 with laser light L1 along the predetermined dividing line DL of the composite material 10, the resin irradiated by the laser light L1 in the resin forming the optical functional layer 2 absorbs infrared light and generates a local temperature rise, and the resin is scattered, thereby removing the resin from the composite material 10, and forming the first processing groove 21 in the composite material 10. In order to suppress the scattered resin removed from the composite material 10 from being attached to the composite material 10 again, a dust collecting mechanism is preferably provided near the predetermined dividing line DL. In order to prevent the width of the first processing groove 21 from being too large, the laser light L1 is preferably focused in a manner that the spot diameter at the irradiation position toward the optical functional layer 2 (the spot diameter at the surface of the optical functional layer 2 opposite to the brittle material layer 1 side) is 300 μm or less, and preferably the laser light L1 is focused in a manner that the spot diameter is 200 μm or less. The spot diameter of the laser light L1 at the irradiation position toward the optical functional layer 2 is set to about 150 μm, for example. At this time, the spot diameter at the surface of the optical functional layer 2 on the brittle material layer 1 side becomes, for example, 30-40 μm after focusing. Thus, a first processing groove 21 having a width (the bottom dimension of the first processing groove 21 in a direction perpendicular to the predetermined dividing line DL) of 30 to 40 μm is formed. The width of the first processing groove 21 is, for example, less than 100 μm, preferably less than 50 μm.

再者,根據本發明人等之見解,採用以照射到雷射光L1之樹脂伴隨紅外光吸收而局部溫度上升作為原理的樹脂去除方法時,可不管樹脂種類或光學功能層2之層構造,而根據光學功能層2之厚度,粗略估計形成第1加工槽21所必需的輸入能量。具體而言,可根據光學功能層2之厚度,藉由下式(2)估計形成第1加工槽21所必需的以下式(1)表示的輸入能量。 輸入能量[mJ/mm]=雷射光L1之平均功率[mW]/加工速度[mm/sec]...(1) 輸入能量[mJ/mm]=0.5×光學功能層2之厚度[μm]...(2) 實際設定的輸入能量宜設定為上述式(2)所估計的輸入能量的20~180%、較佳為設定為50~150%。如此對估計出的輸入能量設置邊界範圍,其原因為考慮到:根據形成光學功能層2之樹脂之光吸收率(雷射光L1之波長下的光吸收率)或樹脂之熔點、分解點等熱物性的不同,於形成第1加工槽21所必需的輸入能量會產生差異。具體而言,例如可準備應用本實施形態之分斷方法的複合材10的樣品,進行以於上述適當範圍內之複數個輸入能量在該樣品之光學功能層2形成第1加工槽21之預備試驗後,決定適當的輸入能量。Furthermore, according to the view of the inventors, when a resin removal method based on the principle that the resin irradiated with laser light L1 absorbs infrared light and the local temperature rises, the input energy required to form the first processing groove 21 can be roughly estimated based on the thickness of the optical functional layer 2 regardless of the type of resin or the layer structure of the optical functional layer 2. Specifically, the input energy represented by the following formula (1) required to form the first processing groove 21 can be estimated based on the thickness of the optical functional layer 2 by the following formula (2). Input energy [mJ/mm] = average power of laser light L1 [mW] / processing speed [mm/sec]...(1) Input energy [mJ/mm] = 0.5 × thickness of optical functional layer 2 [μm]...(2) The actual input energy should be set to 20~180% of the input energy estimated by the above formula (2), and preferably 50~150%. The reason for setting the boundary range for the estimated input energy in this way is that the input energy required to form the first processing groove 21 will vary depending on the light absorption rate of the resin forming the optical functional layer 2 (light absorption rate at the wavelength of laser light L1) or the melting point, decomposition point and other thermophysical properties of the resin. Specifically, for example, a sample of the composite material 10 to which the segmentation method of the present embodiment is applied can be prepared, and after a preliminary test of forming the first processing groove 21 in the optical functional layer 2 of the sample at a plurality of input energies within the above-mentioned appropriate range, an appropriate input energy can be determined.

又,如圖2(b)所示,於加工槽形成步驟中,將從第2雷射光源30振盪出之雷射光L2沿著複合材10之分斷預定線照射於保護層3,去除形成保護層3之樹脂。藉此,形成沿循分斷預定線之第2加工槽31(參照圖2(c))。形成第2加工槽31時,於本實施形態中使用剝離法或移動法,關於剝離法或移動法的具體內容容後述。 於本實施形態中,係形成第1加工槽21後再形成第2加工槽31,但本發明並不限於此,亦可於形成第2加工槽31後再形成第1加工槽21。又,如圖2所示,在分別準備第1雷射光源20及第2雷射光源30之情形下,亦可同時形成第1加工槽21及第2加工槽31。Furthermore, as shown in FIG. 2(b), in the processing groove forming step, the laser light L2 oscillated from the second laser light source 30 is irradiated on the protective layer 3 along the predetermined dividing line of the composite material 10 to remove the resin forming the protective layer 3. In this way, the second processing groove 31 along the predetermined dividing line is formed (refer to FIG. 2(c)). When forming the second processing groove 31, the stripping method or the moving method is used in this embodiment, and the specific content of the stripping method or the moving method will be described later. In this embodiment, the second processing groove 31 is formed after the first processing groove 21 is formed, but the present invention is not limited to this, and the first processing groove 21 can also be formed after the second processing groove 31 is formed. Furthermore, as shown in FIG. 2 , when the first laser light source 20 and the second laser light source 30 are prepared separately, the first processed groove 21 and the second processed groove 31 can be formed simultaneously.

於本實施形態中,使用與第1雷射光源20相同種類的CO2 雷射光源作為第2雷射光源30。然而,本發明並不限於此,與之前關於第1雷射光源20所描述的相同,亦可使用CO雷射光源等其他雷射光源。第2雷射光源30可為與第1雷射光源20相同種類、亦可為不同種類。關於將雷射光L2沿著分斷預定線DL照射之態樣(使雷射光L2相對地掃描之態樣),與之前關於雷射光L1所描述的相同,可採用XY雙軸工作台或檢流計反射鏡等之態樣。 雷射光L2係以朝保護層3之照射位置處的光點直徑(保護層3之與脆性材料層1側之面為相反側之面的光點直徑)為例如120~130μm之方式進行聚光。藉此,形成底部寬度為20~30μm之槽。In this embodiment, a CO2 laser light source of the same type as the first laser light source 20 is used as the second laser light source 30. However, the present invention is not limited thereto, and as described above with respect to the first laser light source 20, other laser light sources such as a CO2 laser light source may also be used. The second laser light source 30 may be of the same type as the first laser light source 20, or may be of a different type. As for the state of irradiating the laser light L2 along the predetermined dividing line DL (the state of making the laser light L2 relatively scan), as described above with respect to the laser light L1, a state such as an XY two-axis table or a galvanometer reflector may be used. The laser light L2 is focused in such a way that the spot diameter at the irradiation position of the protective layer 3 (the spot diameter of the surface of the protective layer 3 opposite to the brittle material layer 1) is, for example, 120-130 μm. Thus, a groove with a bottom width of 20-30 μm is formed.

第2加工槽31係以其寬度W(參照圖2(c))為於後述加工痕形成步驟中從超短脈衝雷射光源40振盪出之雷射光L3朝脆性材料層1之照射位置處之光點直徑D(參照圖2(c))以上之方式形成。 具體而言,本實施形態之第2加工槽31之寬度W宜為100μm以上、較佳為150μm以上。第2加工槽31之寬度W之上限,例如為1000μm以下、較佳為500μm以下、更佳為300μm以下。 如上所述,第2加工槽31之寬度W宜為100μm以上、較佳為比100μm以下的第1加工槽21之寬度大。The second processed groove 31 is formed in such a manner that its width W (see FIG. 2(c)) is greater than the spot diameter D (see FIG. 2(c)) at the irradiation position of the laser light L3 oscillated from the ultra-short pulse laser light source 40 toward the brittle material layer 1 in the processing mark forming step described later. Specifically, the width W of the second processed groove 31 of the present embodiment is preferably greater than 100 μm, preferably greater than 150 μm. The upper limit of the width W of the second processed groove 31 is, for example, less than 1000 μm, preferably less than 500 μm, and more preferably less than 300 μm. As described above, the width W of the second processed groove 31 is preferably greater than 100 μm, preferably greater than the width of the first processed groove 21 less than 100 μm.

於圖2所示例中,雖然於與光學功能層2對向之側配置第1雷射光源20、於與保護層3對向之側配置與第1雷射光源20不同之第2雷射光源30,但本發明並不限於此,亦可將第1雷射光源20兼用作為第2雷射光源30。 將第1雷射光源20兼用作為第2雷射光源30時,例如圖2(a)所示,可於與光學功能層2對向之側配置第1雷射光源20(第2雷射光源30),使用第1雷射光源20(第2雷射光源30)於光學功能層2形成第1加工槽21後,使用周知之反轉機構使複合材10上下反轉,令第1雷射光源20(第2雷射光源30)與保護層3對向,使用第1雷射光源20(第2雷射光源30)於保護層3形成第2加工槽31。或者,如圖2(b)所示,可於與保護層3對向之側配置第1雷射光源20(第2雷射光源30),使用第1雷射光源20(第2雷射光源30)於保護層3形成第2加工槽31後,使用周知之反轉機構使複合材10上下反轉,令第1雷射光源20(第2雷射光源30)與光學功能層2對向,使用第1雷射光源20(第2雷射光源30)於光學功能層2形成第1加工槽21。In the example shown in FIG. 2 , although the first laser light source 20 is arranged on the side opposite to the optical functional layer 2 and the second laser light source 30 different from the first laser light source 20 is arranged on the side opposite to the protective layer 3, the present invention is not limited thereto, and the first laser light source 20 may also be used as the second laser light source 30. When the first laser light source 20 is also used as the second laser light source 30, as shown in FIG. 2(a), the first laser light source 20 (the second laser light source 30) can be arranged on the side opposite to the optical functional layer 2. After the first laser light source 20 (the second laser light source 30) is used to form the first processing groove 21 in the optical functional layer 2, a well-known reversing mechanism is used to reverse the composite material 10 upside down so that the first laser light source 20 (the second laser light source 30) is opposite to the protective layer 3, and the first laser light source 20 (the second laser light source 30) is used to form the second processing groove 31 in the protective layer 3. Alternatively, as shown in FIG. 2( b), the first laser light source 20 (the second laser light source 30) may be disposed on the side opposite to the protective layer 3, and after the second processing groove 31 is formed in the protective layer 3 using the first laser light source 20 (the second laser light source 30), a well-known reversal mechanism is used to reverse the composite material 10 upside down so that the first laser light source 20 (the second laser light source 30) is opposite to the optical functional layer 2, and the first laser light source 20 (the second laser light source 30) is used to form the first processing groove 21 in the optical functional layer 2.

再者,於加工槽形成步驟中,作為較佳態樣,亦可以光學功能層2之厚度方向之一部分作為殘渣殘存之方式,去除形成光學功能層2之樹脂。又,於本實施形態中,作為較佳態樣,以保護層3之黏著劑層3b之厚度方向之一部分作為殘渣殘存之方式,去除形成保護層3之樹脂。關於光學功能層2及保護層3之殘渣厚度,較佳為1~30μm、更佳為1~10μm。 如此,與沿著分斷預定線DL完全地去除形成光學功能層2及保護層3之樹脂時相比,藉由以殘存殘渣之方式去除樹脂,可獲得減低對脆性材料層1造成的熱損傷、於脆性材料層1之端面更加難以產生裂痕的優點。Furthermore, in the processing groove forming step, as a preferred embodiment, the resin forming the optical functional layer 2 can be removed in a manner that a portion of the thickness direction of the optical functional layer 2 is left as residue. Also, in this embodiment, as a preferred embodiment, the resin forming the protective layer 3 is removed in a manner that a portion of the thickness direction of the adhesive layer 3b of the protective layer 3 is left as residue. The residue thickness of the optical functional layer 2 and the protective layer 3 is preferably 1-30μm, and more preferably 1-10μm. In this way, compared with completely removing the resin forming the optical functional layer 2 and the protective layer 3 along the predetermined dividing line DL, by removing the resin in a manner that leaves residual residue, the advantages of reducing the thermal damage caused to the brittle material layer 1 and making it more difficult to generate cracks on the end surface of the brittle material layer 1 can be obtained.

[加工痕形成步驟] 如圖2(c)所示,於加工痕形成步驟中,係於加工槽形成步驟後,將從超短脈衝雷射光源40振盪(脈衝振盪)出之雷射光(超短脈衝雷射光)L3從第2加工槽31側沿著分斷預定線DL照射於脆性材料層1,去除形成脆性材料層1之脆性材料,藉此形成沿循分斷預定線DL之加工痕11。 關於將雷射光L3沿著分斷預定線DL照射之態樣(使雷射光L3相對地掃描之態樣),由於可採用與前述將雷射光L1沿著分斷預定線DL照射之態樣相同態樣,故此處省略詳細的說明。[Processing mark forming step] As shown in FIG. 2(c), in the processing mark forming step, after the processing groove forming step, the laser light (ultra-short pulse laser light) L3 oscillated (pulsed oscillated) from the ultra-short pulse laser light source 40 is irradiated to the brittle material layer 1 along the predetermined breaking line DL from the second processing groove 31 side, and the brittle material forming the brittle material layer 1 is removed, thereby forming the processing mark 11 along the predetermined breaking line DL. Regarding the state of irradiating the laser light L3 along the predetermined breaking line DL (the state of making the laser light L3 relatively scan), since the same state as the state of irradiating the laser light L1 along the predetermined breaking line DL mentioned above can be adopted, the detailed description is omitted here.

形成脆性材料層1之脆性材料係利用從超短脈衝雷射光源40振盪出之雷射光L3之光絲現象,或於超短脈衝雷射光源40應用多焦點光學系統(未圖示)或貝索光束光學系統(未圖示),藉此而去除。 又,關於利用超短脈衝雷射光之光絲現象,或於超短脈衝雷射光源應用多焦點光學系統或貝索光束光學系統係記載於非專利文獻1。又,德國的Trumpf公司販賣有於超短脈衝雷射光源應用多焦點光學系統的與玻璃加工相關的製品。如此,由於關於利用超短脈衝雷射光之光絲現象,或於超短脈衝雷射光源應用多焦點光學系統或貝索光束光學系統為公知,故此處省略詳細的說明。The brittle material forming the brittle material layer 1 is removed by utilizing the filament phenomenon of the laser light L3 oscillated from the ultra-short pulse laser light source 40, or by applying a multi-focus optical system (not shown) or a Besso beam optical system (not shown) to the ultra-short pulse laser light source 40. In addition, the use of the filament phenomenon of the ultra-short pulse laser light, or the application of a multi-focus optical system or a Besso beam optical system to the ultra-short pulse laser light source is described in non-patent document 1. In addition, Trumpf of Germany sells products related to glass processing that use a multi-focus optical system to an ultra-short pulse laser light source. As such, since it is well known to utilize the filament phenomenon of ultra-short pulse laser light, or to apply a multi-focus optical system or a Besso beam optical system to an ultra-short pulse laser light source, a detailed description is omitted here.

於本實施形態之加工痕形成步驟中形成之加工痕11,例如係作成專利文獻2記載之沿循分斷預定線DL之點線狀貫通孔。沿循分斷預定線DL之貫通孔之間距取決於脈衝振盪之重複頻率與雷射光L3相對於複合材10之相對移動速度(加工速度)。為了簡便且穩定地進行後述的複合材分斷步驟,貫通孔之間距宜設定為10μm以下。較佳設定為5μm以下。貫通孔之直徑大多以5μm以下形成。 然而,加工痕11並不限於沿循分斷預定線DL之點線狀貫通孔。若將從超短脈衝雷射光源40振盪出之雷射光L3與脆性材料層1之沿循分斷預定線DL之相對移動速度設定為小、或將超短脈動雷射光源40之脈衝振盪之重複頻率設定為大,則會形成沿著分斷預定線DL連接成一體之貫通孔(長孔)作為加工痕11。The processing mark 11 formed in the processing mark forming step of the present embodiment is, for example, a dotted line through hole along the predetermined dividing line DL described in patent document 2. The spacing of the through holes along the predetermined dividing line DL depends on the repetition frequency of the pulse oscillation and the relative movement speed (processing speed) of the laser light L3 relative to the composite material 10. In order to simply and stably perform the composite material dividing step described later, the spacing of the through holes is preferably set to less than 10μm. It is preferably set to less than 5μm. The diameter of the through hole is mostly formed with a diameter of less than 5μm. However, the processing mark 11 is not limited to the dotted line through hole along the predetermined dividing line DL. If the relative movement speed of the laser light L3 oscillated from the ultra-short pulse laser light source 40 and the brittle material layer 1 along the predetermined dividing line DL is set to a small value, or the repetition frequency of the pulse oscillation of the ultra-short pulse laser light source 40 is set to a large value, a through hole (long hole) connected as one along the predetermined dividing line DL will be formed as a processing mark 11.

在形成脆性材料層1之脆性材料為玻璃時,從超短脈衝雷射光源40振盪出之雷射光L3之波長宜為表示高透光率之500nm~2500nm。為了有效地引起非線形光學現象(多光子吸收),雷射光L3之脈衝寬度宜為100皮秒以下、較佳為50皮秒以下。雷射光L3之振盪形態可為單一脈衝振盪,亦可為突發模式之多脈衝振盪。 如圖2(c)所示,雷射光L3朝脆性材料層1之照射位置處之光點直徑D例如設為100μm,如前所述,第2加工槽31之寬度W成為該光點直徑D以上。When the brittle material forming the brittle material layer 1 is glass, the wavelength of the laser light L3 oscillated from the ultra-short pulse laser light source 40 is preferably 500nm~2500nm, which indicates high transmittance. In order to effectively induce nonlinear optical phenomena (multiphoton absorption), the pulse width of the laser light L3 is preferably less than 100 picoseconds, preferably less than 50 picoseconds. The oscillation form of the laser light L3 can be a single pulse oscillation or a multi-pulse oscillation in a burst mode. As shown in FIG2(c), the spot diameter D of the laser light L3 at the irradiation position of the brittle material layer 1 is set to 100μm, for example. As mentioned above, the width W of the second processing groove 31 becomes greater than the spot diameter D.

再者,於加工痕形成步驟之前可進一步包含清洗步驟,其藉由應用各種溼式或乾式之清洗將於加工槽形成步驟中所形成之第2加工槽31去除形成保護層3之樹脂殘渣。若於清洗步驟中去除形成保護層3之樹脂殘渣,即使於加工痕形成步驟中從第2加工槽31側對脆性材料層1照射從超短脈衝雷射光源40振盪出之雷射光L3,雷射光L3亦可不受樹脂殘渣影響地於脆性材料層1形成更佳適當的加工痕11。Furthermore, a cleaning step may be further included before the processing mark forming step, in which the second processing groove 31 formed in the processing groove forming step is cleaned by various wet or dry cleaning methods to remove the resin residues forming the protective layer 3. If the resin residues forming the protective layer 3 are removed in the cleaning step, even if the laser light L3 oscillated from the ultra-short pulse laser light source 40 is irradiated to the brittle material layer 1 from the side of the second processing groove 31 in the processing mark forming step, the laser light L3 can form a better and more appropriate processing mark 11 on the brittle material layer 1 without being affected by the resin residues.

[複合材分斷步驟] 如圖2(d)所示,於複合材分斷步驟中,係於加工痕形成步驟之後,沿著分斷預定線DL施加外力,藉此而分斷複合材10。於圖2(d)所示例中,複合材10被分斷為複合材片10a、10b。 複合材分斷步驟在如下情形時特別需要:於加工痕形成步驟所形成之加工痕11為沿循分斷預定線DL之點線狀貫通孔時;或以光學功能層2之厚度方向之一部分作為殘渣殘存之方式,去除形成光學功能層2之樹脂(於第1加工槽21之底部殘存殘渣)時。在加工痕11為沿著分斷預定線DL連接成一體之貫通孔(長孔)、且於第1加工槽21之底部未殘存殘渣時,由於可在執行加工痕形成步驟之同時分斷複合材10,故不一定需要複合材分斷步驟。 作為朝複合材10施加外力之方法,可例示:機械性破裂(山摺)、利用紅外區域雷射光加熱切斷預定線DL之附近部位、利用超音波滾筒施加振動、利用吸盤之吸附及拉起等。[Composite material cutting step] As shown in FIG. 2( d ), in the composite material cutting step, after the processing mark forming step, an external force is applied along the predetermined cutting line DL, thereby cutting the composite material 10. In the example shown in FIG. 2( d ), the composite material 10 is cut into composite material sheets 10a and 10b. The composite material cutting step is particularly necessary in the following cases: when the processing mark 11 formed in the processing mark forming step is a dot-line through hole along the predetermined cutting line DL; or when the resin forming the optical functional layer 2 is removed in a manner that a portion of the optical functional layer 2 in the thickness direction remains as residue (residue remains at the bottom of the first processing groove 21). When the processing mark 11 is a through hole (long hole) connected to form an integral body along the predetermined separation line DL, and no residual slag remains at the bottom of the first processing groove 21, the composite material 10 can be separated while the processing mark forming step is performed, so the composite material separation step is not necessarily required. As a method of applying external force to the composite material 10, there can be exemplified: mechanical rupture (mountain fold), heating and cutting the vicinity of the predetermined separation line DL using infrared laser light, applying vibration using an ultrasonic roller, and adsorption and pulling using a suction cup.

以下,依序說明本實施形態之分斷方法之加工槽形成步驟中用於形成第2加工槽31時之剝離法及移動法。The following describes in order the stripping method and the moving method used to form the second processing groove 31 in the processing groove forming step of the separation method of this embodiment.

(剝離法) 圖3係示意性說明於加工槽形成步驟中之剝離法之概略程序的剖面圖。剝離法按照圖3(a)、(b)及(d)之順序執行。再者,圖3(c)為由圖3(b)之虛線C包圍之區域之放大圖。 如圖3(a)、(b)所示,於剝離法中,將從第2雷射光源30振盪出之雷射光L2朝保護層3之照射位置於與分斷預定線DL垂直之方向上(於圖3所示例中為X方向)移動,於各照射位置(於圖3(a)所示之A1位置、圖3(b)所示之A2位置)沿著分斷預定線DL將雷射光L2照射於保護層3。具體而言,於本實施形態中,將從第2雷射光源30振盪出之雷射光L2以分斷預定線DL為基準,分別照射於在與分斷預定線DL垂直之方向(X方向)上等距離的位置A1、A2。藉此,於各照射位置A1、A2形成加工槽31a、31b。然後,於X方向上的加工槽31a、31b之間隔距離(各照射位置A1、A2之間隔距離)為於加工痕形成步驟中從超短脈衝雷射光L3朝脆性材料層1之照射位置處之光點直徑D(參照圖2(c))以上。 又,如前所述,於本實施形態中,作為較佳態樣,以保護層3之黏著劑層3b之厚度方向之一部分作為殘渣殘存之方式,藉由將雷射光L2照射於保護層3而去除形成保護層3之樹脂(參照圖3(c))。如前所述,殘渣厚度T宜為1~30μm、較佳為1~10μm。(Stripping method) Figure 3 is a cross-sectional view schematically illustrating the general procedure of the stripping method in the processing groove forming step. The stripping method is performed in the order of Figures 3(a), (b) and (d). Furthermore, Figure 3(c) is an enlarged view of the area surrounded by the dotted line C in Figure 3(b). As shown in Figures 3(a) and (b), in the stripping method, the laser light L2 oscillated from the second laser light source 30 is moved toward the irradiation position of the protective layer 3 in a direction perpendicular to the predetermined dividing line DL (in the example of Figure 3, the X direction), and the laser light L2 is irradiated to the protective layer 3 along the predetermined dividing line DL at each irradiation position (at the A1 position shown in Figure 3(a) and the A2 position shown in Figure 3(b)). Specifically, in this embodiment, the laser light L2 oscillated from the second laser light source 30 is irradiated to positions A1 and A2 equidistant in the direction (X direction) perpendicular to the predetermined dividing line DL, based on the predetermined dividing line DL. Thus, processing grooves 31a and 31b are formed at each irradiation position A1 and A2. Then, the spacing distance between the processing grooves 31a and 31b in the X direction (the spacing distance between each irradiation position A1 and A2) is greater than the spot diameter D (refer to FIG. 2 (c)) at the irradiation position of the ultra-short pulse laser light L3 toward the brittle material layer 1 in the processing mark formation step. As mentioned above, in this embodiment, as a preferred aspect, a portion of the adhesive layer 3b of the protective layer 3 in the thickness direction is left as residue, and the resin forming the protective layer 3 is removed by irradiating the protective layer 3 with the laser light L2 (see FIG. 3(c)). As mentioned above, the residue thickness T is preferably 1-30 μm, preferably 1-10 μm.

接著,如圖3(d)所示,於剝離法中,藉由將存在於各照射位置A1、A2之間之形成保護層3之樹脂剝離,形成第2加工槽31。樹脂的剝離可適當使用周知的剝離裝置進行。如前所示,由於加工槽31a、31b之間隔距離為超短脈衝雷射光L3之光點直徑D以上,故第2加工槽31之寬度W(參照圖2(c))亦為超短脈衝雷射光L3之光點直徑D以上。 又,若以剝離法剝離存在於各照射位置A1、A2間之形成保護層3之樹脂,由圖3(c)或(d)可明白,可期待黏著劑層3b之厚度方向之一部分作為殘渣殘存於各照射位置A1、A2附近,而於其他部分,包含黏著劑層3b之保護層3全體被剝離,露出脆性材料層1之表面。Next, as shown in FIG3(d), in the stripping method, the second processing groove 31 is formed by stripping the resin forming the protective layer 3 between the irradiation positions A1 and A2. The stripping of the resin can be appropriately performed using a known stripping device. As shown above, since the spacing distance between the processing grooves 31a and 31b is greater than the spot diameter D of the ultra-short pulse laser light L3, the width W of the second processing groove 31 (see FIG2(c)) is also greater than the spot diameter D of the ultra-short pulse laser light L3. Furthermore, if the resin forming the protective layer 3 between the irradiation positions A1 and A2 is peeled off by a peeling method, it can be understood from Figure 3(c) or (d) that a portion of the adhesive layer 3b in the thickness direction can be expected to remain as residue near the irradiation positions A1 and A2, while in other portions, the protective layer 3 including the adhesive layer 3b is completely peeled off, exposing the surface of the brittle material layer 1.

根據以上所說明之剝離法,若於分斷預定線DL上照射超短脈衝雷射光L3(參照圖2(c)),從第2雷射光源30振盪出之雷射光L2之照射位置A1、A2與超短脈衝雷射光L3之照射位置偏移第2加工槽31之寬度W之1/2。 因此,縱使假設於加工槽形成步驟中,將從第2雷射光源30振盪出之雷射光L2之輸出設定為大到一定程度,去除形成保護層3之樹脂,使脆性材料層1之表面露出而受到一些熱損傷,亦由於超短脈衝雷射光L3不易照射到相同位置,故於脆性材料層1之端面不易產生裂痕。According to the stripping method described above, if the ultra-short pulse laser light L3 is irradiated on the predetermined dividing line DL (refer to FIG. 2(c)), the irradiation positions A1 and A2 of the laser light L2 oscillated from the second laser light source 30 and the irradiation position of the ultra-short pulse laser light L3 are offset by 1/2 of the width W of the second processing groove 31. Therefore, even if the output of the laser light L2 oscillated from the second laser light source 30 is set to a certain degree in the processing groove forming step, the resin forming the protective layer 3 is removed, and the surface of the brittle material layer 1 is exposed and subjected to some thermal damage, it is also difficult for the ultra-short pulse laser light L3 to irradiate the same position, so that cracks are not easy to be generated on the end surface of the brittle material layer 1.

圖4係示意性說明將複合材10分斷為四個矩形複合材片時於加工槽形成步驟中之剝離法及加工痕形成步驟之概略程序的俯視圖。圖4(a)~(c)顯示剝離法之概略程序,圖4(d)顯示加工痕形成步驟之概略程序。再者,於圖4中,為求方便,第2雷射光源30及超短脈衝雷射光源40以立體圖示。 如圖4(a)所示,於剝離法中,將從第2雷射光源30振盪出之雷射光L2朝保護層3之照射位置於與分斷預定線DL垂直之方向上移動,於各照射位置沿著分斷預定線DL將雷射光L2照射於保護層3。具體而言,於圖4(a)所示例中,將雷射光L2照射於較分斷預定線DL向內側偏移第2加工槽31之寬度W(參照圖2(c))的1/2的位置(以實線表示的位置)。圖4(a)中以符號31a、31b表示的部位相當於圖3所示的加工槽31a、31b。FIG. 4 is a top view schematically illustrating the general procedure of the peeling method and the processing mark forming step in the processing groove forming step when the composite material 10 is separated into four rectangular composite material sheets. FIG. 4 (a) to (c) show the general procedure of the peeling method, and FIG. 4 (d) shows the general procedure of the processing mark forming step. Furthermore, in FIG. 4 , for convenience, the second laser light source 30 and the ultra-short pulse laser light source 40 are shown in three dimensions. As shown in FIG. 4 (a), in the peeling method, the laser light L2 oscillated from the second laser light source 30 is moved toward the irradiation position of the protective layer 3 in a direction perpendicular to the predetermined separation line DL, and the laser light L2 is irradiated on the protective layer 3 along the predetermined separation line DL at each irradiation position. Specifically, in the example shown in FIG. 4(a), the laser light L2 is irradiated to a position (position indicated by a solid line) that is offset inward from the predetermined dividing line DL by 1/2 of the width W of the second processing groove 31 (refer to FIG. 2(c)). The portions indicated by symbols 31a and 31b in FIG. 4(a) correspond to the processing grooves 31a and 31b shown in FIG.

接著,於剝離法中,將存在於各照射位置間之形成保護層3之樹脂剝離,藉此形成第2加工槽31。圖4(b)顯示形成剝離後之保護層3之樹脂,圖4(c)表示剝離後之複合材10。於圖4(b)所示例中,不僅將存在於各照射位置間之形成保護層3之樹脂(存在於圖4(b)十字狀區域之樹脂)剝離,亦同時剝離位於照射位置外側的形成保護層3之樹脂。Next, in the stripping method, the resin forming the protective layer 3 existing between each irradiation position is stripped, thereby forming the second processing groove 31. FIG. 4(b) shows the resin forming the protective layer 3 after stripping, and FIG. 4(c) shows the composite material 10 after stripping. In the example shown in FIG. 4(b), not only the resin forming the protective layer 3 existing between each irradiation position (resin existing in the cross-shaped area of FIG. 4(b)) is stripped, but also the resin forming the protective layer 3 located outside the irradiation position is stripped at the same time.

接著,如圖4(d)所示,於加工痕形成步驟中,於分斷預定線DL上照射從超短脈衝雷射光源40振盪出之超短脈衝雷射光L3。 藉此(或者進一步執行複合材分斷步驟),可分斷為4個矩形的複合材片。Next, as shown in FIG. 4( d ), in the processing mark forming step, the ultra-short pulse laser light L3 oscillated from the ultra-short pulse laser light source 40 is irradiated on the predetermined separation line DL. In this way (or by further performing the composite material separation step), the composite material can be separated into four rectangular sheets.

(移動法) 圖5係示意性說明於加工槽形成步驟中之移動法之概略程序的剖面圖。移動法按照圖5(a)~(d)之順序執行。 如圖5(a)~(c)所示,於移動法中,將從第2雷射光源30振盪出之雷射光L2朝保護層3之照射位置於與分斷預定線DL垂直之方向上(於圖5所示例中為X方向)依序移動,於各照射位置(圖5(a)所示之B1位置、圖5(b)所示之B2位置及圖5(c)所示之B3位置)沿著分斷預定線DL將雷射光L2照射於保護層3。具體而言,於本實施形態中,將從第2雷射光源30振盪出之雷射光L2以特定之間距(例如與雷射光L2之光點直徑相同尺寸之30μm左右之間距)依序移動,分別照射於以分斷預定線DL為基準在與分斷預定線DL垂直之方向(X方向)上等距離的位置B1到位置B3的各位置。藉此,於各照射位置形成之加工槽31c之寬度依序變大,最後如圖5(d)所示形成第2加工槽31。藉由將使雷射光L2之照射位置移動之範圍(照射位置B1、B3之間隔距離)設為加工痕形成步驟中超短脈衝雷射光L3朝脆性材料層1之照射位置處之光點直徑D(參照圖2(c))以上,可使第2加工槽31之寬度W(參照圖2(c))成為超短脈衝雷射光L3之光點直徑D以上。(Moving method) Figure 5 is a cross-sectional view schematically illustrating the general procedure of the moving method in the processing groove forming step. The moving method is performed in the order of Figures 5(a) to (d). As shown in Figures 5(a) to (c), in the moving method, the laser light L2 oscillated from the second laser light source 30 is sequentially moved toward the irradiation position of the protective layer 3 in a direction perpendicular to the predetermined dividing line DL (in the example of Figure 5, the X direction), and the laser light L2 is irradiated to the protective layer 3 along the predetermined dividing line DL at each irradiation position (B1 position shown in Figure 5(a), B2 position shown in Figure 5(b), and B3 position shown in Figure 5(c)). Specifically, in this embodiment, the laser light L2 oscillated from the second laser light source 30 is sequentially moved at a specific pitch (e.g., a pitch of about 30 μm, which is the same size as the spot diameter of the laser light L2) and irradiated at each position from position B1 to position B3 that is equidistant in the direction (X direction) perpendicular to the predetermined breaking line DL based on the predetermined breaking line DL. As a result, the width of the processing groove 31c formed at each irradiation position becomes larger in sequence, and finally the second processing groove 31 is formed as shown in FIG. 5( d ). By setting the range of moving the irradiation position of the laser light L2 (the spacing distance between the irradiation positions B1 and B3) to be greater than the spot diameter D (see FIG. 2(c)) of the irradiation position of the ultra-short pulse laser light L3 toward the brittle material layer 1 in the processing mark forming step, the width W (see FIG. 2(c)) of the second processing groove 31 can be made greater than the spot diameter D of the ultra-short pulse laser light L3.

又,於移動法中亦作為較佳態樣,以保護層3之黏著劑層3b之厚度方向之一部分作為殘渣殘存之方式,藉由將雷射光L2照射於保護層3而去除形成保護層3之樹脂。特別是應用移動法時,與應用剝離法時相比,由於從第2雷射光源30振盪出之雷射光L2朝保護層3之照射位置較多,故為脆性材料層1容易受到熱損傷之狀況。因此,使黏著劑層3b之厚度方向之一部分作為殘渣殘存之方法於應用移動法時特別有效。 又,於應用移動法時,與應用剝離法時相比,由於從第2雷射光源30振盪出之雷射光L2朝保護層3之照射位置較多,故成為從保護層3所具備之黏著劑層3b容易產生煙霧之狀況。因此,於應用移動法時,為了防止煙霧產生,宜將黏著劑層3b設為胺基甲酸酯系黏著劑層。In addition, in the transfer method, it is also a preferred embodiment to leave a portion of the adhesive layer 3b of the protective layer 3 as residue in the thickness direction, and remove the resin forming the protective layer 3 by irradiating the protective layer 3 with the laser light L2. In particular, when the transfer method is applied, compared with the peeling method, the laser light L2 oscillated from the second laser light source 30 irradiates more positions toward the protective layer 3, so the brittle material layer 1 is easily damaged by heat. Therefore, the method of leaving a portion of the adhesive layer 3b as residue in the thickness direction is particularly effective when the transfer method is applied. Furthermore, when the transfer method is applied, the laser light L2 oscillated from the second laser light source 30 irradiates more positions on the protective layer 3 than when the peeling method is applied, so smoke is easily generated from the adhesive layer 3b provided on the protective layer 3. Therefore, when the transfer method is applied, in order to prevent the generation of smoke, it is preferable to set the adhesive layer 3b to a urethane adhesive layer.

圖6係示意性說明將複合材10分斷為四個矩形複合材片時於加工槽形成步驟中之移動法及加工痕形成步驟之概略程序的俯視圖。圖6(a)顯示移動法之概略程序,圖6(b)顯示加工痕形成步驟之概略程序。再者,於圖6中,為求方便,第2雷射光源30及超短脈衝雷射光源40以立體圖示。 如圖6(a)所示,於移動法中,將從第2雷射光源30振盪出之雷射光L2朝保護層3之照射位置於與分斷預定線DL垂直之方向上依序移動,於各照射位置沿著分斷預定線DL將雷射光L2照射於保護層3。具體而言,於圖6(a)所示例中,將雷射光L2照射於較分斷預定線DL向內側及外側偏移第2加工槽31之寬度W(參照圖2(c))的1/2的位置(以實線表示的位置)的範圍,使於各照射位置所形成之加工槽31c之寬度依序變大。藉此,如圖6(b)所示,形成有第2加工槽31(於圖6(b)中未賦予斜線影線的區域)。FIG. 6 is a top view schematically illustrating the general procedure of the moving method and the processing mark forming step in the processing groove forming step when the composite material 10 is divided into four rectangular composite material sheets. FIG. 6(a) shows the general procedure of the moving method, and FIG. 6(b) shows the general procedure of the processing mark forming step. Furthermore, in FIG. 6, for convenience, the second laser light source 30 and the ultra-short pulse laser light source 40 are shown in three dimensions. As shown in FIG. 6(a), in the moving method, the laser light L2 oscillated from the second laser light source 30 is sequentially moved toward the irradiation position of the protective layer 3 in a direction perpendicular to the predetermined dividing line DL, and the laser light L2 is irradiated on the protective layer 3 along the predetermined dividing line DL at each irradiation position. Specifically, in the example shown in FIG6(a), the laser light L2 is irradiated to the range of positions (positions indicated by solid lines) that are offset inward and outward from the predetermined dividing line DL by 1/2 of the width W of the second processing groove 31 (refer to FIG2(c)), so that the width of the processing groove 31c formed at each irradiation position becomes larger in sequence. Thus, as shown in FIG6(b), the second processing groove 31 is formed (the area not given the oblique line hatching in FIG6(b)).

接著,如圖6(b)所示,於加工痕形成步驟中,於分斷預定線DL上照射從超短脈衝雷射光源40振盪出之超短脈衝雷射光L3。 藉此(或者進一步執行複合材分斷步驟),可分斷為4個矩形的複合材片。Next, as shown in FIG6(b), in the processing mark forming step, the ultra-short pulse laser light L3 oscillated from the ultra-short pulse laser light source 40 is irradiated on the predetermined separation line DL. In this way (or by further performing the composite material separation step), the composite material can be separated into 4 rectangular sheets.

根據以上所說明之本實施形態之分斷方法,藉由於加工槽形成步驟中去除形成光學功能層2之樹脂及形成保護層3之樹脂,而形成沿循分斷預定線DL之第1加工槽21及第2加工槽31後,於加工痕形成步驟中從第2加工槽31側去除形成脆性材料層1之脆性材料,藉此形成沿循相同的分斷預定線DL之加工痕11。然後,於加工槽形成步驟中形成之第2加工槽31,由於以其寬度W為於加工痕形成步驟中從超短脈衝雷射光源40振盪出之雷射光(超短脈衝雷射光)L3朝脆性材料層1之照射位置處之光點直徑D以上之方式形成,故可在不使脆性材料層1之端面產生裂痕下分斷脆性材料層1。According to the breaking method of the present embodiment described above, the resin forming the optical functional layer 2 and the resin forming the protective layer 3 are removed in the processing groove forming step to form the first processing groove 21 and the second processing groove 31 along the predetermined breaking line DL, and then the brittle material forming the brittle material layer 1 is removed from the side of the second processing groove 31 in the processing mark forming step to form a processing mark 11 along the same predetermined breaking line DL. Then, the second processing groove 31 formed in the processing groove forming step is formed in a manner such that its width W is greater than the spot diameter D of the laser light (ultra-short pulse laser light) L3 oscillated from the ultra-short pulse laser light source 40 toward the brittle material layer 1 at the irradiation position in the processing mark forming step. Therefore, the brittle material layer 1 can be cut without causing cracks on the end surface of the brittle material layer 1.

以下,說明使用本實施形態之分斷方法(實施例1~5)及比較例(比較例1、2)之分斷方法進行將複合材10分斷之試驗的結果的一例。 圖7係顯示關於實施例之於加工槽形成步驟中應用剝離法時之主要試驗條件及試驗結果之一例。圖8係顯示關於實施例之於加工槽形成步驟中應用移動法時之主要試驗條件及試驗結果之一例。The following describes an example of the results of a test of cutting a composite material 10 using the cutting method of the present embodiment (Examples 1 to 5) and the cutting method of the comparative example (Comparative Examples 1 and 2). FIG. 7 shows an example of the main test conditions and test results when the peeling method is applied in the processing groove forming step of the embodiment. FIG. 8 shows an example of the main test conditions and test results when the moving method is applied in the processing groove forming step of the embodiment.

<實施例1> [光學功能層2之製作] 使用長條且玻璃轉移溫度(Tg)為約75℃之非晶質之間苯二酸共聚合聚對苯二甲酸乙二酯薄膜(厚度:100μm)作為熱塑性樹脂基材,於該樹脂基材之單面實施電暈處理。 另一方面,於將以9:1混合聚乙烯醇(聚合度4200、皂化度99.2莫耳%)及乙醯乙醯基改質PVA(日本合成化學工業公司製、商品名「GOHSEFIMER」)而成之PVA系樹脂100重量份中添加碘化鉀13重量份後,溶解於水中,製備PVA水溶液(塗佈液)。 然後,於上述樹脂基材之電暈處理面塗佈上述PVA水溶液,於60℃進行乾燥,藉此形成厚度13μm之PVA系樹脂層,製作積層體。<Example 1> [Preparation of optical functional layer 2] A long amorphous isophthalic acid copolymer polyethylene terephthalate film (thickness: 100 μm) having a glass transition temperature (Tg) of about 75°C was used as a thermoplastic resin substrate, and a corona treatment was performed on one side of the resin substrate. On the other hand, 13 parts by weight of potassium iodide was added to 100 parts by weight of a PVA-based resin prepared by mixing polyvinyl alcohol (polymerization degree 4200, saponification degree 99.2 mol%) and acetoacetyl-modified PVA (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name "GOHSEFIMER") in a ratio of 9:1, and then dissolved in water to prepare a PVA aqueous solution (coating liquid). Then, the PVA aqueous solution was applied to the corona treated surface of the resin substrate and dried at 60° C. to form a PVA resin layer with a thickness of 13 μm to prepare a laminate.

將上述製作之積層體於130℃烘箱內於縱向(長度方向)單軸延伸至2.4倍(空中輔助延伸處理)。 接著,將單軸延伸後之積層體浸漬於液溫40℃之不溶化浴(相對於水100重量份調配硼酸4重量份而獲得之硼酸水溶液)30秒(不溶化處理)。 接著,以最後獲得之偏光件之單體穿透率(Ts)成為所期望值之方式,將上述積層體於液溫30℃之染色浴(相對於水100重量份以1:7重量比調配碘與碘化鉀而獲得之碘水溶液)中一面調整濃度一面浸漬60秒(染色處理)。 接著,將上述積層體浸漬於液溫40℃之交聯浴(相對於水100重量份調配3重量份碘化鉀、5重量份硼酸而得之硼酸水溶液)30秒(交聯處理)。 然後,將上述積層體一面浸漬於液溫70℃之硼酸水溶液(硼酸濃度4重量%、碘化鉀濃度5重量%)、一面於周速不同之滾筒之間於縱向(長度方向)以總延伸倍率成為5.5倍之方式進行單軸延伸(水中延伸處理)。 接著,將上述積層體浸漬於液溫20℃之洗淨浴(相對於水100重量份調配4重量份碘化鉀而得之水溶液)(洗淨處理)。 最後,將上述積層體於保持在約90℃之烘箱中一面乾燥、一面使之接觸表面溫度保持在約75℃之不鏽鋼製加熱滾筒(乾燥收縮處理)。 如上所述,製作於樹脂基材上形成厚度約5μm之偏光件,具有樹脂基材/偏光件之構造的積層體。The laminate prepared above was uniaxially stretched to 2.4 times in the longitudinal direction (length direction) in an oven at 130°C (air-assisted stretching treatment). Then, the uniaxially stretched laminate was immersed in an insolubilization bath (a boric acid aqueous solution obtained by mixing 4 parts by weight of boric acid with 100 parts by weight of water) at a liquid temperature of 40°C for 30 seconds (insolubilization treatment). Then, the laminate was immersed in a dyeing bath (an iodine aqueous solution obtained by mixing iodine and potassium iodide at a weight ratio of 1:7 with respect to 100 parts by weight of water) at a liquid temperature of 30°C for 60 seconds while adjusting the concentration so that the monomer transmittance (Ts) of the polarizer finally obtained would be the desired value (dyeing treatment). Next, the laminate is immersed in a crosslinking bath (boric acid aqueous solution prepared by mixing 3 parts by weight of potassium iodide and 5 parts by weight of boric acid with respect to 100 parts by weight of water) at a liquid temperature of 40°C for 30 seconds (crosslinking treatment). Then, the laminate is immersed in a boric acid aqueous solution (boric acid concentration 4 weight%, potassium iodide concentration 5 weight%) at a liquid temperature of 70°C, and uniaxially stretched in the longitudinal direction (length direction) between rollers with different peripheral speeds at a total stretching ratio of 5.5 times (in-water stretching treatment). Next, the laminate is immersed in a cleaning bath (aqueous solution prepared by mixing 4 parts by weight of potassium iodide with respect to 100 parts by weight of water) at a liquid temperature of 20°C (cleaning treatment). Finally, the laminate is dried in an oven maintained at about 90°C while being brought into contact with a stainless steel heated drum maintained at a surface temperature of about 75°C (drying and shrinking treatment). As described above, a laminate having a resin substrate/polarizer structure is prepared by forming a polarizer having a thickness of about 5 μm on a resin substrate.

接著,於構成上述積層體之偏光件之一面(與樹脂基材側之面為相反側之面)貼合丙烯酸系保護薄膜(厚度:40μm),製作偏光薄膜。然後,從偏光薄膜剝離樹脂基材,於該剝離面經由丙烯酸系黏著劑(厚度:20μm)貼合聚對苯二甲酸乙二酯離型薄膜(厚度:38μm),藉此製作光學功能層2之本體。 又,作為接著劑,準備調配有CELLOXIDE 2021P(DAICEL化學工業公司製)70重量份、EHPE3150 5重量份、ARONE OXETANE OXT-221(東亞合成公司製)19重量份、KBM-403(信越化學工業公司製)4重量份、CPI101A(SANAPRO公司製)2重量份之環氧系接著劑。 上述光學功能層2之本體與上述接著劑之組合構成光學功能層2。Next, an acrylic protective film (thickness: 40μm) is bonded to one side of the polarizer constituting the above-mentioned laminate (the side opposite to the side of the resin substrate) to produce a polarizing film. Then, the resin substrate is peeled off from the polarizing film, and a polyethylene terephthalate release film (thickness: 38μm) is bonded to the peeled surface via an acrylic adhesive (thickness: 20μm) to produce the main body of the optical functional layer 2. In addition, as an adhesive, an epoxy adhesive was prepared, which included 70 parts by weight of CELLOXIDE 2021P (manufactured by DAICEL Chemical Industries, Ltd.), 5 parts by weight of EHPE3150, 19 parts by weight of ARONE OXETANE OXT-221 (manufactured by Toagosei Co., Ltd.), 4 parts by weight of KBM-403 (manufactured by Shin-Etsu Chemical Industries, Ltd.), and 2 parts by weight of CPI101A (manufactured by SANAPRO Co., Ltd.). The combination of the main body of the optical functional layer 2 and the adhesive constitutes the optical functional layer 2.

[脆性材料層1及光學功能層2之積層體之製作] 作為脆性材料層1,準備玻璃薄膜(日本電氣硝子公司製、商品名「OA-10G」、厚度:100μm)。 接著,將上述脆性材料層1與上述光學功能層2之本體經由上述接著劑貼合。此時,光學功能層2之本體係以丙烯酸系保護薄膜成為脆性材料層1側之方式配置。接著,利用高壓水銀燈朝上述接著劑照射(500mJ/cm2 )紫外線,使接著劑硬化,藉此製作脆性材料層1及光學功能層2之積層體。硬化後之接著劑厚度為5μm。[Production of a laminate of brittle material layer 1 and optical functional layer 2] A glass film (manufactured by Nippon Electric Glass Co., Ltd., trade name "OA-10G", thickness: 100μm) is prepared as the brittle material layer 1. Then, the brittle material layer 1 and the main body of the optical functional layer 2 are bonded together via the adhesive. At this time, the main body of the optical functional layer 2 is arranged in such a way that the acrylic protective film becomes the side of the brittle material layer 1. Then, a high-pressure mercury lamp is used to irradiate the adhesive with ultraviolet rays (500mJ/ cm2 ) to cure the adhesive, thereby producing a laminate of the brittle material layer 1 and the optical functional layer 2. The thickness of the adhesive after curing is 5μm.

[複合材10之製作] 接著,如圖7所示,準備具有丙烯酸系黏著劑層之表面保護薄膜(日東電工公司製、商品名「RP207」)作為保護層3。 該保護層3之基材層3a係由厚度38μm之未處理聚對苯二甲酸乙二酯薄膜(三菱化學聚酯公司製、Diafoil T100 #38)形成。 又,該保護層3之黏著劑層3b係如下所述地製作。首先,於乙酸乙酯中,以單體計為35%之方式使丙烯酸2-乙基己酯100重量份及丙烯酸2-羥乙酯4重量份共聚合,獲得重量平均分子量60萬之含有丙烯酸系聚合物之溶液。接著,於該溶液中,相對於丙烯酸系聚合物(乾燥重量)100重量份調配具有異三聚氰酸酯環之異氰酸酯系交聯劑(日本聚胺酯工業公司製、CORONATE HX)4重量份,進而添加乙酸乙酯,製備固體成分濃度經調整為20%之黏著劑溶液。最後,將該黏著劑溶液以乾燥膜厚度成為20μm之方式塗佈於基材層3a上,於140℃乾燥2分鐘,形成黏著劑層3b。 保護層3(RP207)具備如上所述地製作之基材層3a及黏著劑層3b。然後,藉由經由該保護層3之黏著劑層3b將保護層3與脆性材料層1及光學功能層2之積層體的脆性材料層1貼合,製作複合材10。[Preparation of composite material 10] Next, as shown in FIG. 7, a surface protection film having an acrylic adhesive layer (manufactured by Nitto Denko Corporation, trade name "RP207") is prepared as protective layer 3. The base layer 3a of the protective layer 3 is formed of an untreated polyethylene terephthalate film (manufactured by Mitsubishi Chemical Polyester Co., Ltd., Diafoil T100 #38) having a thickness of 38 μm. In addition, the adhesive layer 3b of the protective layer 3 is prepared as follows. First, 100 parts by weight of 2-ethylhexyl acrylate and 4 parts by weight of 2-hydroxyethyl acrylate are copolymerized in ethyl acetate in a monomer ratio of 35% to obtain a solution containing an acrylic polymer having a weight average molecular weight of 600,000. Next, 4 parts by weight of an isocyanate crosslinking agent having an isocyanurate ring (CORONATE HX manufactured by Nippon Polyurethane Industries) was added to the solution relative to 100 parts by weight of the acrylic polymer (dry weight), and ethyl acetate was added to prepare an adhesive solution having a solid content concentration adjusted to 20%. Finally, the adhesive solution was applied to the substrate layer 3a in such a manner that the dry film thickness became 20 μm, and dried at 140°C for 2 minutes to form an adhesive layer 3b. Protective layer 3 (RP207) has the substrate layer 3a and adhesive layer 3b prepared as described above. Then, the composite material 10 is manufactured by bonding the protective layer 3 to the brittle material layer 1 of the laminate of the brittle material layer 1 and the optical functional layer 2 via the adhesive layer 3 b of the protective layer 3 .

[加工槽形成步驟(形成第1加工槽21)] 將如上所述製作之複合材10單片化後,於光學功能層2形成第1加工槽21。具體而言,關於具備第1雷射光源20及控制雷射光L1之掃描之光學系統或控制裝置的雷射加工裝置,係使用武井電機公司製之TLSU系列(振盪波長9.4μm之CO2 雷射光源、脈衝振盪之重複頻率12.5kHz、雷射光L1之功率250W),將從第1雷射光源20振盪出之雷射光L1之輸出設為11.8W,使用聚光透鏡在朝光學功能層2之照射位置上聚光為光點直徑150μm,沿著複合材10之分斷預定線(設定為格子狀之複數條分斷預定線)DL照射於光學功能層2。雷射光L1相對於複合材10之相對移動速度(加工速度)設為400mm/sec。藉此,去除形成光學功能層2之樹脂,形成沿循分斷預定線DL之第1加工槽21。此時,以形成光學功能層2之樹脂之一部分作為殘渣(厚度:10~20μm)殘存於第1加工槽21底部之方式,去除樹脂。[Processing Groove Forming Step (Forming the First Processing Groove 21 )] After the composite material 10 manufactured as described above is separated into individual pieces, the first processing groove 21 is formed in the optical functional layer 2 . Specifically, the laser processing device having a first laser light source 20 and an optical system or control device for controlling the scanning of the laser light L1 uses the TLSU series manufactured by Takei Electric Co., Ltd. (a CO2 laser light source with an oscillation wavelength of 9.4μm, a repetition frequency of pulse oscillation of 12.5kHz, and a power of laser light L1 of 250W). The output of the laser light L1 oscillated from the first laser light source 20 is set to 11.8W, and a focusing lens is used to focus the light to a spot diameter of 150μm at the irradiation position toward the optical functional layer 2, and the optical functional layer 2 is irradiated along the predetermined dividing lines DL of the composite material 10 (a plurality of predetermined dividing lines set in a grid shape). The relative moving speed (processing speed) of the laser light L1 relative to the composite material 10 is set to 400 mm/sec. In this way, the resin forming the optical functional layer 2 is removed, and the first processing groove 21 along the predetermined dividing line DL is formed. At this time, the resin is removed in such a way that a part of the resin forming the optical functional layer 2 remains as residue (thickness: 10-20 μm) at the bottom of the first processing groove 21.

[加工槽形成步驟(形成第2加工槽31)] 接著,於保護層3形成第2加工槽31。具體而言,與形成第1加工槽21時相同,關於具備第2雷射光源30及控制雷射光L2之掃描之光學系統或控制裝置之雷射加工裝置,使用武井電機公司製之TLSU系列(振盪波長9.4μm之CO2 雷射光源、脈衝振盪之重複頻率12.5kHz、雷射光L2之功率250W),如圖7所示,將從第2雷射光源30振盪出之雷射光L2之輸出設為10.5W,使用聚光透鏡在朝保護層3之照射位置上聚光為光點直徑120~130μm,沿著複合材10之分斷預定線(設定為格子狀之複數條分斷預定線)DL照射於保護層3。雷射光L2相對於複合材10之相對移動速度(加工速度)設為400mm/sec。然後,藉由應用剝離法,如圖7所示,形成寬度為200μm之第2加工槽31。再者,將雷射光L2照射於保護層3時,如圖7所示,於照射位置處,以沒有形成保護層3之樹脂之一部分作為殘渣殘存(厚度:0μm)之方式去除樹脂。[Processing Groove Forming Step (Forming the Second Processing Groove 31 )] Next, the second processing groove 31 is formed in the protective layer 3 . Specifically, similar to the formation of the first processing groove 21, the laser processing device having a second laser light source 30 and an optical system or control device for controlling the scanning of the laser light L2 uses the TLSU series manufactured by Takei Electric Co., Ltd. (a CO2 laser light source with an oscillation wavelength of 9.4μm, a repetition frequency of pulse oscillation of 12.5kHz, and a power of 250W for the laser light L2). As shown in FIG. 7, the output of the laser light L2 oscillated from the second laser light source 30 is set to 10.5W, and a focusing lens is used to focus the light to a spot diameter of 120~130μm at the irradiation position toward the protective layer 3, and the protective layer 3 is irradiated along the predetermined dividing lines DL of the composite material 10 (a plurality of predetermined dividing lines set in a grid shape). The relative moving speed (processing speed) of the laser light L2 relative to the composite material 10 is set to 400 mm/sec. Then, by applying the stripping method, as shown in FIG7 , a second processing groove 31 with a width of 200 μm is formed. Furthermore, when the laser light L2 is irradiated to the protective layer 3, as shown in FIG7 , at the irradiated position, the resin is removed in such a manner that a portion of the resin without forming the protective layer 3 remains as a residue (thickness: 0 μm).

[加工痕形成步驟] 上述加工槽形成步驟之後,執行加工痕形成步驟。具體而言,作為超短脈衝雷射光源40使用振盪波長1064nm、雷射光L3之脈衝寬10皮秒、脈衝振盪之重複頻率50kHz 、平均功率10W者,將從超短脈衝雷射光源40振盪出之雷射光L3經由多焦點光學系統從第2加工槽31側照射於複合材10之脆性材料層1。雷射光L3朝脆性材料層1之照射位置處之光點直徑D例如設為100μm。將雷射光L3相對於複合材10之相對移動速度(加工速度)設為100mm/sec,沿著分斷預定線DL掃描雷射光L3後,形成作為加工痕11之間距2μm之點線狀貫通孔(直徑1~2μm左右)。[Processing mark forming step] After the processing groove forming step described above, the processing mark forming step is performed. Specifically, as an ultra-short pulse laser light source 40, an oscillation wavelength of 1064nm, a pulse width of 10 picoseconds for the laser light L3, a repetition frequency of 50kHz for the pulse oscillation, and an average power of 10W are used, and the laser light L3 oscillated from the ultra-short pulse laser light source 40 is irradiated to the brittle material layer 1 of the composite material 10 from the second processing groove 31 side through a multi-focus optical system. The spot diameter D of the laser light L3 at the irradiation position toward the brittle material layer 1 is set to 100μm, for example. The relative moving speed (processing speed) of the laser light L3 relative to the composite material 10 is set to 100 mm/sec. After the laser light L3 is scanned along the predetermined dividing line DL, dot-line through holes (diameter of about 1 to 2 μm) with a pitch of 2 μm are formed as the processing marks 11.

[複合材分斷步驟] 上述加工痕形成步驟之後,執行複合材分斷步驟。具體而言,使用Keyence公司製之MLG-9300(振盪波長10.6μm、雷射光之功率30W)作為具備CO2 雷射光源及控制雷射光之掃描之光學系統或控制裝置之雷射加工裝置,將從雷射光源振盪出之雷射光之輸出設為80%(即輸出24W),使用聚光透鏡聚光為光點直徑0.7mm(此時之能量密度為62W/m2 ),沿著複合材10之分斷預定線DL從保護層3側照射於脆性材料層1。此時,將雷射光相對於複合材10之相對移動速度設為500mm/sec。 最後,對複合材10施加機械性外力,將於加工槽形成步驟後殘存於第1加工槽21底部的樹脂的殘渣分斷,將複合材10分斷。[Composite material cutting step] After the above processing mark forming step, the composite material cutting step is performed. Specifically, MLG-9300 (oscillation wavelength 10.6μm, laser light power 30W) manufactured by Keyence is used as a laser processing device equipped with a CO2 laser light source and an optical system or control device for controlling the scanning of the laser light. The output of the laser light oscillated from the laser light source is set to 80% (i.e., output 24W), and the light is focused using a focusing lens to a spot diameter of 0.7mm (the energy density at this time is 62W/ m2 ), and irradiated to the brittle material layer 1 from the protective layer 3 side along the predetermined cutting line DL of the composite material 10. At this time, the relative moving speed of the laser beam relative to the composite material 10 is set to 500 mm/sec. Finally, a mechanical external force is applied to the composite material 10 to separate the resin residue remaining at the bottom of the first processing groove 21 after the processing groove forming step, and the composite material 10 is separated.

以目視觀察利用實施例1之分斷方法分斷後之複合材10(複合材片)之脆性材料層1之端面,其結果:如圖7所示,脆性材料層1可無問題地分斷、不產生裂痕。The end surface of the brittle material layer 1 of the composite material 10 (composite material sheet) cut by the cutting method of Example 1 was visually observed. As shown in FIG. 7 , the brittle material layer 1 could be cut without any problem and no cracks were generated.

<實施例2> 如圖7所示,除了將形成第2加工槽31時,從第2雷射光源30振盪出之雷射光L2之輸出設為8.0W、以於照射位置處形成保護層3之樹脂(黏著劑層3b)之一部分作為殘渣(厚度:10μm)殘存之方式去除樹脂之點外,以與實施例1相同條件將複合材10分斷。 以目視觀察利用實施例2之分斷方法分斷後之複合材10(複合材片)之脆性材料層1之端面,其結果:如圖7所示,脆性材料層1可無問題地分斷、不產生裂痕。<Example 2> As shown in FIG. 7, the composite material 10 was cut under the same conditions as in Example 1, except that the output of the laser light L2 oscillated from the second laser light source 30 was set to 8.0W when forming the second processing groove 31, and the resin point was removed in such a way that a part of the resin (adhesive layer 3b) of the protective layer 3 remained as a residue (thickness: 10μm) at the irradiation position. The end face of the brittle material layer 1 of the composite material 10 (composite sheet) cut by the cutting method of Example 2 was visually observed, and the result was: as shown in FIG. 7, the brittle material layer 1 could be cut without any problem and no cracks were generated.

<比較例1> 除了形成第2加工槽31時,將從第2雷射光源30振盪出之雷射光L2於複合材10之分斷預定線(設定為格子狀之複數條分斷預定線)DL上對保護層3僅照射1次(不應用剝離法)之點外,以與實施例1相同條件嘗試複合材10之分斷。如圖7所示,於比較例1形成之第2加工槽31之寬度為30μm、比於加工痕形成步驟中從超短脈衝雷射光源40振盪出之雷射光L3朝脆性材料層1之照射位置處之光點直徑D(100μm)小。 如圖7所示,於比較例1之分斷方法中,未形成貫通脆性材料層1之加工痕11,不能分斷複合材10。<Comparative Example 1> Except that when forming the second processing groove 31, the laser light L2 oscillated from the second laser light source 30 is irradiated only once (without applying the peeling method) on the protective layer 3 on the predetermined breaking line (set as a plurality of predetermined breaking lines in a grid shape) DL of the composite material 10, the composite material 10 is tried to be broken under the same conditions as in Example 1. As shown in FIG. 7, the width of the second processing groove 31 formed in Comparative Example 1 is 30 μm, which is smaller than the spot diameter D (100 μm) at the irradiation position of the laser light L3 oscillated from the ultra-short pulse laser light source 40 toward the brittle material layer 1 in the processing mark forming step. As shown in FIG. 7 , in the breaking method of Comparative Example 1, a processing mark 11 penetrating the brittle material layer 1 is not formed, and the composite material 10 cannot be broken.

<實施例3> 除了以下(1)~(3)所示點外,以與實施例1相同條件製作複合材10,將該複合材10分斷。 (1)如圖8所示,準備具有胺基甲酸酯系黏著劑層之表面保護薄膜(日東電工公司製、商品名「AW700EC」)作為保護層3。 該保護層3之基材層3a由聚酯樹脂構成之基材「Lumirror S10」(厚度38μm、Toray公司製)形成。 又,該保護層3之黏著劑層3b如下所述地製作。首先,關於多元醇,使用具有3個OH基之多元醇之PREMINOL S3011(旭硝子公司製、Mn=10000)、具有3個OH基之多元醇之SANNIX GP-3000(三洋化成公司製、Mn=3000)、具有3個OH基之多元醇之SANNIX GP-1000(三洋化成公司製、Mn=1000)。又,關於多官能異氰酸酯化合物,使用作為多官能脂環族系異氰酸酯化合物之CORONATE HX(日本聚胺酯工業公司製)。又,關於觸媒,使用日本化學產業公司製之商品名「Nasem Ferric」。又,關於防劣化劑,使用Irganox1010(BASF製)。又,關於脂肪酸酯,使用肉荳蔻酸異丙酯(花王公司製、商品名「EXEPARL IPM」、Mn=270)、或鯨蠟醇乙基己酸酯(日清OilliO Group公司製、商品名「SALACOSPR 816T」、Mn=368)。然後,於其等中添加1-乙基-3-甲基咪唑鎓雙(氟甲烷磺醯基)醯亞胺(第一工業製藥公司製、商品名「AS110」)、兩末端型之聚醚改質聚矽氧油(信越化學工業公司製、商品名「KF-6004」)與作為稀釋溶劑之乙酸乙酯,進行混合攪拌,藉此製作胺基甲酸酯系黏著劑組成物。然後,將製作之胺基甲酸酯系黏著劑組成物以乾燥後厚度成為10μm之方式利用水槽輥塗佈於上述基材層3a上,於乾燥溫度130℃、乾燥時間30秒之條件下固化後使之乾燥,形成黏著劑層3b。 保護層3(AW700EC)具備如上所述製作之基材層3a及黏著劑層3b。然後,藉由經由該保護層3之黏著劑層3b將保護層3與和實施例1相同之脆性材料層1及光學功能層2之積層體的脆性材料層1貼合,製作複合材10。 (2)形成第2加工槽31時應用移動法。 (3)如圖8所示,將形成第2加工槽31時,從第2雷射光源30振盪出之雷射光L2之輸出設為4.3W、以於照射位置處形成保護層3之樹脂(黏著劑層3b)之一部分作為殘渣(厚度:7.5μm)殘存之方式去除樹脂。 以目視觀察利用實施例3之分斷方法分斷後之複合材10(複合材片)之脆性材料層1之端面,其結果:如圖8所示,脆性材料層1可無問題地分斷、不產生裂痕。<Example 3> Except for the following points (1) to (3), a composite material 10 was prepared under the same conditions as in Example 1, and the composite material 10 was cut. (1) As shown in FIG8, a surface protection film having a urethane adhesive layer (manufactured by Nitto Denko Corporation, trade name "AW700EC") was prepared as a protective layer 3. The base material layer 3a of the protective layer 3 was formed of a base material "Lumirror S10" (thickness 38μm, manufactured by Toray Corporation) composed of a polyester resin. In addition, the adhesive layer 3b of the protective layer 3 was prepared as described below. First, as for the polyol, PREMINOL S3011 (manufactured by Asahi Glass Co., Ltd., Mn=10000) which is a polyol having three OH groups, SANNIX GP-3000 (manufactured by Sanyo Chemical Co., Ltd., Mn=3000) which is a polyol having three OH groups, and SANNIX GP-1000 (manufactured by Sanyo Chemical Co., Ltd., Mn=1000) which is a polyol having three OH groups were used. Also, as for the polyfunctional isocyanate compound, CORONATE HX (manufactured by Nippon Polyurethane Industries Co., Ltd.) which is a polyfunctional alicyclic isocyanate compound was used. Also, as for the catalyst, "Nasem Ferric" manufactured by Nippon Chemical Industry Co., Ltd. was used. Also, as for the anti-deterioration agent, Irganox 1010 (manufactured by BASF) was used. As fatty acid ester, isopropyl myristate (manufactured by Kao Corporation, trade name "EXEPARL IPM", Mn=270) or cetyl ethylhexanoate (manufactured by Nissin Oillio Group, trade name "SALACOSPR 816T", Mn=368) was used. Then, 1-ethyl-3-methylimidazolium bis(fluoromethanesulfonyl)imide (manufactured by Daiichi Kogyo Seiyaku Co., Ltd., trade name "AS110"), both-end-type polyether-modified polysilicone oil (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "KF-6004") and ethyl acetate as a diluent were added thereto, and the mixture was mixed and stirred to prepare a urethane adhesive composition. Then, the prepared urethane adhesive composition is applied to the above-mentioned base layer 3a using a water tank roller in a manner such that the thickness after drying becomes 10μm, and then cured at a drying temperature of 130°C and a drying time of 30 seconds to form an adhesive layer 3b. The protective layer 3 (AW700EC) has the base layer 3a and adhesive layer 3b prepared as described above. Then, the protective layer 3 is bonded to the brittle material layer 1 of the laminate of the brittle material layer 1 and the optical functional layer 2 which are the same as those in Example 1 through the adhesive layer 3b of the protective layer 3 to prepare the composite material 10. (2) The transfer method is applied when forming the second processing groove 31. (3) As shown in FIG8 , when forming the second processing groove 31, the output of the laser light L2 oscillated from the second laser light source 30 is set to 4.3 W, and the resin (adhesive layer 3b) forming the protective layer 3 at the irradiation position is removed in such a manner that a portion of the resin (adhesive layer 3b) remains as a residue (thickness: 7.5 μm). The end surface of the brittle material layer 1 of the composite material 10 (composite material sheet) cut by the cutting method of Example 3 is visually observed. The result is: as shown in FIG8 , the brittle material layer 1 can be cut without any problem and no cracks are generated.

<實施例4> 如圖8所示,除了將形成第2加工槽31時,從第2雷射光源30振盪出之雷射光L2之輸出設為4.9W、以於照射位置處形成保護層3之樹脂(黏著劑層3b)之一部分作為厚度2.1μm之殘渣殘存之方式去除樹脂之點外,以與實施例3相同條件將複合材10分斷。 以目視觀察利用實施例4之分斷方法分斷後之複合材10(複合材片)之脆性材料層1之端面,其結果:如圖8所示,脆性材料層1可無問題地分斷、不產生裂痕。<Example 4> As shown in FIG8, the composite material 10 was cut under the same conditions as in Example 3, except that the output of the laser light L2 oscillated from the second laser light source 30 was set to 4.9W when forming the second processing groove 31, and the resin (adhesive layer 3b) of the protective layer 3 was removed in a manner such that a portion of the resin remained as a residue with a thickness of 2.1 μm at the irradiation position. The end surface of the brittle material layer 1 of the composite material 10 (composite sheet) cut by the cutting method of Example 4 was visually observed, and the result was: as shown in FIG8, the brittle material layer 1 could be cut without any problem and no cracks were generated.

<實施例5> 如圖8所示,除了將形成第2加工槽31時,從第2雷射光源30振盪出之雷射光L2之輸出設為5.1W、以於照射位置處,沒有形成保護層3之樹脂之一部分作為殘渣殘存(厚度:0μm)之方式去除樹脂之點外,以與實施例3相同條件將複合材10分斷。 以目視觀察利用實施例5之分斷方法分斷後之複合材10(複合材片)之脆性材料層1之端面,其結果:如圖8所示,脆性材料層1可無問題地分斷、不產生裂痕。<Example 5> As shown in FIG8, the composite material 10 was cut under the same conditions as in Example 3, except that the output of the laser light L2 oscillated from the second laser light source 30 was set to 5.1W when forming the second processing groove 31, and the resin point was removed in such a way that a part of the resin without forming the protective layer 3 remained as a residue (thickness: 0 μm) at the irradiation position. The end surface of the brittle material layer 1 of the composite material 10 (composite material sheet) cut by the cutting method of Example 5 was visually observed, and the result was: as shown in FIG8, the brittle material layer 1 could be cut without any problem and no cracks were generated.

<比較例2> 除了形成第2加工槽31時,將從第2雷射光源30振盪出之雷射光L2於複合材10之分斷預定線(設定為格子狀之複數條分斷預定線)DL上對保護層3僅照射1次(不應用移動法)之點外,以與實施例5相同條件嘗試複合材10之分斷。如圖8所示,於比較例2形成之第2加工槽31之寬度為30μm、比於加工痕形成步驟中從超短脈衝雷射光源40振盪出之雷射光L3朝脆性材料層1之照射位置處之光點直徑D(100μm)小。 如圖8所示,於比較例2之分斷方法中,未形成貫通脆性材料層1之加工痕11,不能分斷複合材10。<Comparative Example 2> Except that when forming the second processing groove 31, the laser light L2 oscillated from the second laser light source 30 is irradiated to the protective layer 3 only once (without applying the shifting method) on the predetermined dividing line DL of the composite material 10 (set as a plurality of predetermined dividing lines in a grid shape), the composite material 10 is tried to be divided under the same conditions as in Example 5. As shown in FIG8 , the width of the second processing groove 31 formed in Comparative Example 2 is 30 μm, which is smaller than the spot diameter D (100 μm) at the irradiation position of the laser light L3 oscillated from the ultra-short pulse laser light source 40 toward the brittle material layer 1 in the processing mark forming step. As shown in FIG. 8 , in the breaking method of Comparative Example 2, a processing mark 11 penetrating the brittle material layer 1 is not formed, and the composite material 10 cannot be broken.

1:脆性材料層 2:光學功能層 3:保護層 3a:基材層 3b:黏著劑層 10:複合材 10a,10b:複合材片 11:加工痕 20:第1雷射光源 21:第1加工槽 30:第2雷射光源 31:第2加工槽 31a,31b,31c:加工槽 40:超短脈衝雷射光源 A1,A2:照射位置 B1,B2,B3:照射位置 C:虛線 D:光點直徑 DL:分斷預定線 L1,L2,L3:雷射光 T:殘渣厚度 W:第2加工槽之寬度1: Brittle material layer 2: Optical functional layer 3: Protective layer 3a: Base material layer 3b: Adhesive layer 10: Composite material 10a, 10b: Composite sheet 11: Processing mark 20: First laser source 21: First processing groove 30: Second laser source 31: Second processing groove 31a, 31b, 31c: Processing groove 40: Ultra-short pulse laser source A1, A2: Irradiation position B1, B2, B3: Irradiation position C: Dotted line D: Light spot diameter DL: Predetermined breaking line L1, L2, L3: Laser light T: Residue thickness W: Width of second processing groove

圖1係示意性顯示應用本發明一實施形態之分斷方法之複合材之概略構造的剖面圖。 圖2係示意性說明本發明一實施形態之複合材之分斷方法之概略程序的說明圖。 圖3係示意性說明於加工槽形成步驟中之剝離法之概略程序的剖面圖。 圖4係示意性說明將複合材分斷為四個矩形複合材片時於加工槽形成步驟中之剝離法及加工痕形成步驟之概略程序的俯視圖。 圖5係示意性說明於加工槽形成步驟中之移動法之概略程序的剖面圖。 圖6係示意性說明將複合材分斷為四個矩形複合材片時於加工槽形成步驟中之移動法及加工痕形成步驟之概略程序的俯視圖。 圖7係顯示關於實施例之於加工槽形成步驟中應用剝離法時之結果之一例。 圖8係顯示關於實施例之於加工槽形成步驟中應用移動法時之試驗條件及試驗結果之一例。FIG. 1 is a cross-sectional view schematically showing the general structure of a composite material to which a cutting method of an embodiment of the present invention is applied. FIG. 2 is an explanatory view schematically illustrating the general procedure of the cutting method of a composite material of an embodiment of the present invention. FIG. 3 is a cross-sectional view schematically illustrating the general procedure of the peeling method in the processing groove forming step. FIG. 4 is a top view schematically illustrating the general procedure of the peeling method and the processing mark forming step in the processing groove forming step when the composite material is cut into four rectangular composite material pieces. FIG. 5 is a cross-sectional view schematically illustrating the general procedure of the moving method in the processing groove forming step. FIG. 6 is a top view schematically illustrating the general procedure of the moving method and the processing mark forming step in the processing groove forming step when the composite material is divided into four rectangular composite material sheets. FIG. 7 shows an example of the result when the peeling method is applied in the processing groove forming step of the embodiment. FIG. 8 shows an example of the test conditions and test results when the moving method is applied in the processing groove forming step of the embodiment.

(無)(without)

Claims (6)

一種複合材之分斷方法,係將於脆性材料層之一面側積層有樹脂製光學功能層、於前述脆性材料層之另一面側積層有樹脂製保護層的複合材予以分斷的方法,其包含以下步驟:加工槽形成步驟,係將從第1雷射光源振盪出之雷射光沿著前述複合材之分斷預定線照射於前述光學功能層,去除形成前述光學功能層之樹脂,藉此形成沿循前述分斷預定線之第1加工槽,且將從第2雷射光源振盪出之雷射光沿著前述分斷預定線照射於前述保護層,去除形成前述保護層之樹脂,藉此形成沿循前述分斷預定線之第2加工槽;及加工痕形成步驟,係於前述加工槽形成步驟之後,將從超短脈衝雷射光源振盪出之雷射光從前述第2加工槽側沿著前述分斷預定線照射於前述脆性材料層,去除形成前述脆性材料層之脆性材料,藉此形成沿循前述分斷預定線之加工痕;並且,於前述加工槽形成步驟中,以前述第2加工槽之寬度為於前述加工痕形成步驟中從前述超短脈衝雷射光源振盪出之雷射光朝前述脆性材料層之照射位置處之光點直徑以上之方式,去除形成前述保護層之樹脂;於前述加工槽形成步驟中,將從前述第2雷射光源振盪出之雷射光朝前述保護層之照射位置於與前述分斷預定線垂直之方向上移動,於各照射位置沿著前述分斷預定線將前述雷射光照射於前述保護層後,將存在於前述各照射位置之間的形成前述保護層之樹脂剝離,藉此形成前述第2加工槽。 A composite material cutting method is a composite material in which a resin optical functional layer is laminated on one side of a brittle material layer and a resin protective layer is laminated on the other side of the brittle material layer. The method comprises the following steps: a processing groove forming step, wherein a laser light oscillated from a first laser light source is irradiated on the optical functional layer along a predetermined cutting line of the composite material to remove the resin forming the optical functional layer. The process comprises: forming a first processing groove along the predetermined breaking line by irradiating the protective layer with laser light oscillated from a second laser light source along the predetermined breaking line, removing the resin forming the protective layer, thereby forming a second processing groove along the predetermined breaking line; and a processing mark forming step, after the processing groove forming step, irradiating the laser light oscillated from an ultra-short pulse laser light source from the side edge of the second processing groove. The method further comprises: irradiating the predetermined breaking line to the brittle material layer to remove the brittle material forming the brittle material layer, thereby forming a processing mark along the predetermined breaking line; and removing the brittle material forming the brittle material layer in a manner that the width of the second processing groove is greater than the diameter of the spot at the irradiation position of the laser light oscillated from the ultra-short pulse laser light source toward the brittle material layer in the processing mark forming step. The resin forming the aforementioned protective layer is formed; in the aforementioned processing groove forming step, the laser light oscillated from the aforementioned second laser light source is moved toward the irradiation position of the aforementioned protective layer in a direction perpendicular to the aforementioned predetermined breaking line, and after the aforementioned laser light is irradiated to the aforementioned protective layer along the aforementioned predetermined breaking line at each irradiation position, the resin forming the aforementioned protective layer between the aforementioned irradiation positions is peeled off, thereby forming the aforementioned second processing groove. 如請求項1之複合材之分斷方法,其中於前述加工槽形成步驟中,以前述第2加工槽之寬度為100μm以上之方式去除形成前述保護層之樹脂。 A composite material cutting method as claimed in claim 1, wherein in the aforementioned processing groove forming step, the resin forming the aforementioned protective layer is removed in such a way that the width of the aforementioned second processing groove is greater than 100μm. 如請求項1之複合材之分斷方法,其中前述保護層具備基材層、及配置於前述脆性材料層側之黏著劑層;於前述加工槽形成步驟中,以殘存前述黏著劑層之厚度方向之一部份之方 式去除形成前述保護層之樹脂。 A composite material cutting method as claimed in claim 1, wherein the protective layer comprises a substrate layer and an adhesive layer disposed on the side of the brittle material layer; in the processing groove forming step, the resin forming the protective layer is removed in such a way that a portion of the adhesive layer in the thickness direction remains. 如請求項1之複合材之分斷方法,其中前述保護層具備基材層、及配置於前述脆性材料層側之胺基甲酸酯系黏著劑層。 A composite material cutting method as claimed in claim 1, wherein the protective layer comprises a substrate layer and a urethane adhesive layer disposed on the side of the brittle material layer. 如請求項1之複合材之分斷方法,其中前述第2雷射光源為CO2雷射光源。 A composite material cutting method as claimed in claim 1, wherein the second laser light source is a CO2 laser light source. 如請求項1之複合材之分斷方法,其中前述脆性材料層包含玻璃,前述光學功能層包含偏光薄膜。 A composite material cutting method as claimed in claim 1, wherein the aforementioned brittle material layer comprises glass, and the aforementioned optical functional layer comprises a polarizing film.
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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114609711B (en) * 2022-03-09 2023-07-18 业成科技(成都)有限公司 Manufacturing method of optical element, clamping device, display module and electronic equipment
TW202408706A (en) * 2022-04-28 2024-03-01 美商元平台技術有限公司 Glass-film lamination and cutting method to mitigate orange peel
KR20250047164A (en) * 2023-09-27 2025-04-03 앱솔릭스 인코포레이티드 Packaging substrate and manufacturing method of the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017145188A (en) * 2017-03-14 2017-08-24 日東電工株式会社 Method for producing flexible film
JP2019025539A (en) * 2017-08-04 2019-02-21 株式会社ディスコ Laser processing device
TW201927450A (en) * 2017-11-30 2019-07-16 日商日東電工股份有限公司 Long film laser machining method
JP2019122966A (en) * 2018-01-12 2019-07-25 日東電工株式会社 Segmentation method of composite material

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102020417A (en) * 2009-09-16 2011-04-20 昆山汉白精密设备有限公司 Process for processing glass for electronic product
US20150146294A1 (en) 2012-05-23 2015-05-28 Konica Minolta, Inc. Polarizing plate, fabrication method for polarizing plate, and image display device
JP2014043363A (en) * 2012-08-24 2014-03-13 Hamamatsu Photonics Kk Reinforced glass member working method
WO2015053167A1 (en) * 2013-10-07 2015-04-16 日本電気硝子株式会社 Method for cutting sheet glass with laser, and sheet glass
KR20170088844A (en) * 2014-11-20 2017-08-02 니폰 제온 가부시키가이샤 Method for manufacturing optical film
JP2016113309A (en) * 2014-12-11 2016-06-23 三星ダイヤモンド工業株式会社 Scribe method and scribe device for composite substrate
JP6608694B2 (en) * 2015-12-25 2019-11-20 株式会社ディスコ Wafer processing method
JP6888809B2 (en) * 2017-03-30 2021-06-16 三星ダイヤモンド工業株式会社 Brittle material substrate with metal film Dividing method and dividing device
JP6871095B2 (en) * 2017-07-14 2021-05-12 株式会社ディスコ Manufacturing method of glass interposer
CN109367931A (en) * 2018-10-18 2019-02-22 东莞理工学院 A film peeling mechanism for cylindrical products

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017145188A (en) * 2017-03-14 2017-08-24 日東電工株式会社 Method for producing flexible film
JP2019025539A (en) * 2017-08-04 2019-02-21 株式会社ディスコ Laser processing device
TW201927450A (en) * 2017-11-30 2019-07-16 日商日東電工股份有限公司 Long film laser machining method
JP2019122966A (en) * 2018-01-12 2019-07-25 日東電工株式会社 Segmentation method of composite material

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