TWI866857B - A manufacturing method of electrochromic element - Google Patents

Abstract

A method for manufacturing an electrochromic element, comprising: preparing an electrochromic layer substrate, preparing a nickel oxide ion storage layer substrate, and assembly and packaging processes. Producing an electrochromic layer substrate comprising: Providing a pre-treated ITO glass as the first substrate; the electrochromic layer coating process, using the scraper-coating method to coat the tungsten trioxide precursor liquid on the surface of the first substrate; the first photo-annealing process, tungsten trioxide is irradiated with a low-intensity near-infrared light source to form a tungsten trioxide dry film; the second photo-annealing process, the tungsten trioxide dry film is irradiated with a high-intensity near-infrared light source to complete the production of the electrochromic layer substrate. Preparing the nickel oxide ion storage layer substrate, comprising forming a nickel oxide film layer on the surface of the second substrate by using a vacuum sputtering process. The electrochromic layer substrate and the nickel oxide ion storage layer substrate are then bonded and packaged, and the electrochromic element is subsequently obtained.

Description

Method for manufacturing electrochromic element

The present disclosure relates to a method for manufacturing an electrochromic element, and in particular to a method for manufacturing an electrochromic element comprising a fast, low-temperature and low-energy annealing process using a near-infrared light source.

In order to cope with environmental changes, countries around the world are committed to achieving the goal of energy conservation and carbon reduction, and taking measures to reduce energy consumption and carbon emissions in the industrial and livelihood fields. my country's 2050 net zero carbon emission plan also clearly stipulates that 100% of new buildings and 80% of existing buildings must meet the standard of near-zero carbon emissions by 2050, and at the same time promote the popularization of low-carbon processes. In the fields of architecture and livelihood, reducing the waste heat caused by sunlight penetrating through windows and car skylights can be used as a glass curtain wall of a building to effectively control the waste heat generated by sunlight indoors, and can be used as a smart energy-saving building material.

According to the market analysis report of Allied Market Research, related dimmable products can be applied to windows, mirrors and display technologies. It is estimated that the market will reach 4.1 billion US dollars in 2032, with an annual growth rate of 9.2%, which has great market development potential. Electrochromic products are a kind of electrochemical dimming products with low power consumption, adjustable light intake, clear vision, infrared blocking and other multi-functions. The application can be based on the actual situation. By applying bias, the light transmittance can be arbitrarily changed and it has good heat insulation effect. It is generally favored by the market. However, there is no relevant industry development in Taiwan at present. Therefore, the research and development of relevant process technology will help Taiwan to seize the first opportunity in the rapidly developing electrochromic product market.

Foreign related electrochromic glass mainly adopts glass substrate and vacuum coating process technology. The process cost and product price are high, making it difficult to be widely used in the current general construction market.

Solution printing process technology is considered to be one of the low-carbon process technologies with low-cost benefits. However, the currently known related process technologies usually require high-temperature, long-time thermal annealing to optimize the characteristics of the electrochromic layer. For example, a literature proposes a process technology that synthesizes tungsten trioxide by chemical synthesis, and after coating it on a soft substrate, it needs to be thermally annealed at 60°C for 6 hours under vacuum to optimize the electrochromic layer (Materials & Design, Volume 162, 15 January 2019, Pages 45-51). In addition, another literature suggests that after tungsten trioxide is synthesized by chemical synthesis, it can be thermally annealed at 60°C for 10 hours to obtain an electrochromic film with higher performance (J. Mater. Chem. C, 2016, 4 (46), 10887-10892). However, the above-mentioned processes all require a long thermal annealing process and are not suitable for actual mass production processes.

In addition, there are also literatures that focus on the effects of high temperature annealing and strong pulse annealing on the performance of electrochromic films. From the results, although the strong pulse annealing method can obtain the best color-changing performance, the strong pulse equipment is expensive. If used in mass production processes, it will increase the manufacturing cost (Current Applied Physics, Volume 20, Issue 6, June 2020, Pages 782-787). Although there have been literatures that have discussed and compared the effects of photoannealing processes with various light sources on electrochromic films, the results show that considering the performance and life of the electrochromic layer, a photoannealing process of at least 5 minutes is still necessary, and there is still room for improvement in terms of the applicability of rapid mass production processes (ACS Sustainable Chem. Eng. 2021, 9, 43, 14559–14568).

It is currently known that electrochromic films made by solution printing processes need to undergo rapid high-temperature annealing (rapid annealing at a temperature greater than 300°C for at least 1 hour) or slow low-temperature annealing (slow annealing at a temperature of 60°C for at least 6 hours) to have good electrochromic properties. However, long annealing processes are not suitable for actual mass production processes.

In order to solve the above problems, the inventors of the present disclosure have proposed a rapid photoannealing manufacturing method technology, which uses a near-infrared light source for photoannealing. The electrochromic film layer can be quickly annealed in no more than 3 minutes, and has good color-changing properties and life. It can solve the shortcomings of traditional high-temperature or long-time annealing, and is applied to the rapid mass production process of solution coating process, which significantly improves production efficiency and reduces process costs, and has considerable potential for relevant market development.

Tungsten trioxide is a commonly used electrochromic film material in solution coating processes, and the tetravalent tungsten (W ⁴⁺ ) in it cannot participate in the reaction during the color change process, and if its proportion is too high, it will be detrimental to the color change performance of the electrochromic film. Therefore, the inventors of the present disclosure have developed a technology for photoannealing using a near-infrared light source, which can completely eliminate the tetravalent tungsten (W ⁴⁺ ) that is detrimental to the color change performance in no more than 3 minutes, and convert it into hexavalent tungsten (W ⁶⁺ ) that is beneficial to the color change performance. After the electrochromic film is modified by this photoannealing technology, in addition to obtaining better electrochromic film properties, the uniformity of the electrochromic film during drying can also be improved. In addition, after 3,000 cycles of coating and fading, the electrochromic film can still maintain about 90% of the initial light transmittance change rate, effectively improving the quality of the electrochromic film.

The present disclosure provides a method for manufacturing an electrochromic element, comprising the following steps: manufacturing an electrochromic layer substrate, manufacturing a nickel oxide ion storage layer substrate, performing an assembly process, and performing a packaging process. The electrochromic layer substrate is manufactured, comprising: providing an ITO glass as a first substrate, and pre-treating the surface of the first substrate; then, performing an electrochromic layer coating process, comprising: coating a tungsten trioxide precursor on one surface of the first substrate by a doctor blade coating process to form a tungsten trioxide wet film; then, performing a first light annealing process, comprising: irradiating the tungsten trioxide wet film with a low-intensity (~1000 mW/cm ² ) near-infrared light source (wavelength range: 500 ~ 2500 nm) for a first irradiation time to form a tungsten trioxide dry film; then, performing a second light annealing process, comprising: irradiating the tungsten trioxide dry film with a high-intensity (~2500 mW/cm ² ) near-infrared light source (wavelength range: 500 ~ 2500 nm) ~ 2500 nm) for a second irradiation time to form a tungsten oxide film layer, and the electrochromic layer substrate is manufactured. The nickel oxide ion storage layer substrate is manufactured, including: providing an ITO glass as a second substrate, and pre-treating the surface of the second substrate; then, performing a vacuum sputtering process to form a nickel oxide film layer on one surface of the second substrate, and the nickel oxide ion storage layer substrate is manufactured. The assembly process includes: placing the tungsten oxide film layer of the electrochromic layer substrate upward, and pasting a hot-pressed adhesive on the edge of the electrochromic layer substrate, then dripping a glue solid electrolyte on the tungsten oxide film layer, placing the electrochromic layer substrate on a heating plate to heat the hot-pressed adhesive to soften the hot-pressed adhesive, and quickly covering the nickel oxide film layer of the nickel oxide ion storage layer substrate on the glue solid electrolyte. Since the hot-pressed adhesive softens due to heat, the electrochromic layer substrate and the nickel oxide ion storage layer substrate are bonded to obtain a semi-finished electrochromic element. The packaging process includes: applying ultraviolet curing glue around the edge of the semi-finished electrochromic element, and then curing the ultraviolet curing glue by irradiating ultraviolet light to obtain the electrochromic element.

In one embodiment of the present disclosure, in the manufacturing method of the electrochromic element, the first irradiation time is about 30 seconds to 90 seconds. Preferably, the first irradiation time is about 40 seconds, 50 seconds, 60 seconds, 70 seconds, or 80 seconds.

In one embodiment of the present disclosure, in the manufacturing method of the electrochromic element, the second irradiation time is about 30 seconds to 90 seconds. Preferably, the second irradiation time is about 40 seconds, 50 seconds, 60 seconds, 70 seconds, or 80 seconds.

In another embodiment of the present disclosure, in the manufacturing method of the electrochromic element, the first irradiation time is about 60 seconds, the second irradiation time is about 60 seconds, and the content of hexavalent chrysene (W ⁶⁺ ) in the electrochromic layer substrate is not less than 70%.

In one embodiment of the present disclosure, in the manufacturing method of the electrochromic element, the tungsten trioxide precursor solution is prepared according to the following steps, including: mixing metallic ochre powder and about 30 wt% hydrogen peroxide at a weight ratio of about 1:10 (W:H ₂ O ₂ ), stirring and reacting at 80° C. for about 0.5 to 1 hour; then filtering and removing the supernatant, adding anhydrous alcohol of about the same volume as the supernatant, and stirring and reacting at 80° C. for about 2 to 3 hours; finally adding an appropriate volume of isopropanol to dilute to obtain a tungsten trioxide precursor solution with a concentration of about 70 mg/ml to 80 mg/ml.

In one embodiment of the present disclosure, in the manufacturing method of the electrochromic element, the gel-solid electrolyte is prepared according to the following steps, including: dissolving lithium ion battery in propylene carbonate (PC) to prepare a liquid electrolyte with a concentration of 0.5 M; then mixing the liquid electrolyte with poly (methyl methacrylate) (PMMA) at a weight ratio of 7:1.5 (liquid electrolyte: PMMA = 7:1.5), and stirring at 110°C to obtain a gel-solid electrolyte.

In one embodiment of the present disclosure, in the method for manufacturing the electrochromic element, the nickel oxide film has a thickness of about 300 nm to 400 nm.

In one embodiment of the present disclosure, in the manufacturing method of the electrochromic element, the vacuum sputtering process further includes: performing film deposition at a deposition rate of about 2 to 3 nm/min in an environment where the flow ratio of oxygen to argon is about 1 to 3.

In one embodiment of the present disclosure, in the manufacturing method of the electrochromic element, the electrochromic layer coating process further includes: fixing the distance between the scraper and the surface of the first substrate to 50 μm to 60 μm, and coating at a speed of about 8 cm per second.

In one embodiment of the present disclosure, in the method for manufacturing the electrochromic element, the ITO glass is a transparent ITO glass with a resistance of about 5 ohms.

The following will refer to the relevant drawings to illustrate an embodiment of a method for manufacturing an electrochromic element disclosed in the present disclosure. For the sake of clarity and convenience of the diagram description, the components in the drawings may be exaggerated or reduced in size and proportion. In the following description and/or patent application, when it is mentioned that an element is "connected" or "coupled" to another element, it may be directly connected or coupled to the other element or there may be an intervening element; and when it is mentioned that an element is "directly connected" or "directly coupled" to another element, there is no intervening element, and other words used to describe the relationship between elements or layers should be interpreted in the same way. For ease of understanding, the same elements in the following embodiments are illustrated with the same symbols.

Please refer to Figure 1, which is a structural diagram of an electrochromic element 10 of an embodiment of the present disclosure. The structure of the electrochromic element 10 described in the present disclosure includes: a first substrate 100, an electrochromic layer 200, a colloidal solid electrolyte layer 300, a nickel oxide ion storage layer 400, and a second substrate 500. The first substrate 100 and the second substrate 500 are ITO glass, and further explained, they are transparent ITO glass with a resistance of about 5 ohms. The electrochromic layer 200 is made of tungsten trioxide by a solution coating process. The nickel oxide ion storage layer 400 is made by a vacuum sputtering process.

Example 1: Raw material preparation

1.1 Preparation of WO ₃ Precursor

The metallic tungsten powder is fully mixed with about 30 wt% hydrogen peroxide at a weight ratio of about 1:10 (W:H ₂ O ₂ ), and stirred at 80°C for about 0.5 to 1 hour; then, after filtering to remove the supernatant, anhydrous alcohol of about the same volume as the supernatant is added, and stirred at 80°C for about 2 to 3 hours to remove excess hydrogen peroxide; finally, an appropriate volume of isopropanol is added for dilution to obtain a tungsten trioxide precursor solution with a concentration of about 70 mg/ml to 80 mg/ml.

1.2 Preparation of colloidal solid electrolyte

Lithium-salt electrolyte is dissolved in propylene carbonate (PC) to prepare a liquid electrolyte with a concentration of about 0.5 M. The liquid electrolyte is then mixed with poly (methyl methacrylate) (PMMA) at a weight ratio of 7:1.5 (liquid electrolyte: PMMA = 7:1.5) and stirred at 110°C to obtain a gel-solid electrolyte.

Example 2: Preparation of electrochromic element

2.1 Substrate surface treatment

The transparent conductive ITO glass with a resistance of about 5 ohms is used as the first substrate 100 and the second substrate 500 used in the manufacturing method of the electrochromic element 10 disclosed in the present invention. Then, the first substrate 100 and the second substrate 500 are cut into a shape of about 5 cm to 6 cm in width and about 6 cm to 7 cm in length. Then, they are wiped with acetone to remove surface dirt and dust. Then, an ultraviolet light/ozone cleaning machine is used to remove organic pollutants on the surface of the first substrate 100 and the second substrate 500 and to perform surface modification to enhance the adhesion of the subsequent tungsten trioxide precursor solution applied to the surface.

2.2 Fabrication of electrochromic layer substrate

The present disclosure adopts a solution coating process, and uses a scraper coating method to coat a tungsten trioxide precursor on a surface of the first substrate 100. First, the distance between the scraper and the surface of the first substrate 100 is fixed to be about 50 μm to 60 μm. Then, a proper amount of tungsten trioxide precursor solution is dropped between the surface of the first substrate 100 and the scraper, and then the scraper is coated at a coating speed of about 8 cm per second to coat the tungsten trioxide precursor solution on a surface of the first substrate 100 to form a layer of tungsten trioxide wet film. Then, a first light annealing process is performed, where the tungsten oxide wet film is irradiated with a near-infrared light source (wavelength range: 500 ~ 2500 nm) of low intensity (~1000 mW/cm ² ) for a first irradiation time (about 30 seconds to 90 seconds) to obtain a tungsten oxide dry film. Then, a second light annealing process is performed, where the tungsten oxide dry film is irradiated with a near-infrared light source (wavelength range: 500 ~ 2500 nm) of high intensity (~2500 mW/cm ² ) for a second irradiation time (about 30 seconds to 90 seconds) to form a tungsten oxide film layer (i.e., the electrochromic layer 200 ), thereby completing the production of the electrochromic layer substrate. At this time, the properties of the tungsten trioxide film layer have been optimized after being irradiated by low-intensity and high-intensity near-infrared light sources. It should be understood that the above-mentioned optimized properties mean that the tetravalent tungsten trioxide (W ⁴⁺ ) that cannot participate in the reaction during the color change process is converted into hexavalent tungsten trioxide (W ⁶⁺ ) that is beneficial to the color change performance by using a near-infrared light source for photo-annealing, thereby improving the color change performance of the electrochromic film layer.

2.3 Fabrication of NiO Ion Storage Layer Substrate

The nickel oxide ion storage layer substrate disclosed herein adopts a vacuum sputtering process to form a nickel oxide ion storage layer 400 on one surface of a second substrate 500. First, the vacuum sputtering chamber is evacuated to 10 ^-5 torr ~ 10 ^-6 torr, and then oxygen and argon are introduced, and the flow ratio of oxygen to argon is about 1 ~ 3. After the gas is stable, the coating is performed at a coating rate of about 2 ~ 3 nm/min, and the thickness of the obtained nickel oxide film layer is about 300 nm ~ 400 nm. This completes the production of the nickel oxide ion storage layer substrate.

2.4 Assembly and packaging of electrochromic components

The electrochromic element 10 described in the present disclosure, as shown in FIG. 1 , is formed by combining a tungsten oxide film layer (i.e., an electrochromic layer 200) and a nickel oxide ion storage layer 400, and filling the gap between the two with a gel-solid electrolyte, which forms a gel-solid electrolyte layer 300 between the two. The assembly process includes: first, the tungsten oxide film layer (i.e., the electrochromic layer 200) of the electrochromic layer substrate is facing upward, and a heat-pressing adhesive is attached to the edge of the electrochromic layer substrate. Then, a solid electrolyte is dripped on the tungsten oxide film layer, and the electrochromic layer substrate is placed on a heating plate and heated to about 100°C to soften the heat-pressing adhesive. Then, the electrochromic layer substrate is quickly The nickel oxide film layer (i.e., nickel oxide ion storage layer 400) of the nickel oxide ion storage layer substrate is covered on the gel solid electrolyte. As the hot pressed glue softens due to heat, the electrochromic layer substrate and the nickel oxide ion storage layer substrate are bonded to form a gel solid electrolyte layer 300 with a thickness of about 50 μm, thus completing the electrochromic element semi-finished product. Then, the packaging process is implemented, including: applying ultraviolet curing glue around the edge of the electrochromic element semi-finished product, and then curing the ultraviolet curing glue by irradiating ultraviolet light, and then the electrochromic element 10 shown in FIG. 1 can be obtained.

Example 3: Results Analysis and Comparison

3.1 Analysis and comparison of photoannealing process results

Tungsten trioxide used in the present disclosure is a common electrochromic film material. The tungsten trioxide precursor is applied to a surface of the first substrate 100 using a doctor blade coating process. Since the tetravalent tungsten trioxide (W ⁴⁺ ) cannot participate in the reaction during the color change process, and if its proportion is too high, it will be detrimental to the color change performance of the electrochromic film. Therefore, annealing is required to eliminate the tetravalent tungsten (W ⁴⁺ ) that is detrimental to the color change performance and convert it into hexavalent tungsten (W ⁶⁺ ) that is beneficial to the color change performance. Here, X-ray photoelectron spectroscopy (XPS) analysis technology is used to compare the composition of the electrochromic film obtained by the near-infrared light source annealing method disclosed herein (first irradiation time 60 seconds and second irradiation time 60 seconds) and the electrochromic film obtained by the traditional thermal annealing method (annealing in an environment of 120°C for 10 minutes). The results are shown in Figure 2A and Figure 2B respectively. The above results are sorted out as shown in Table (I): Table (I): Valence of chrysanthemum percentage Thermal annealing 120℃/10min W ⁶⁺ 54.10% W ⁵⁺ 13.37% W ⁴⁺ 32.53% Near infrared light annealing for 2 minutes W ⁶⁺ 71.17% W ⁵⁺ 28.83%

From the results in Table (I), it can be clearly seen that after only 2 minutes of light annealing process, the tetravalent tungsten (W ⁴⁺ ) which is not conducive to the color change performance has been completely eliminated and converted into hexavalent tungsten (W ⁶⁺ ) which is conducive to the color change performance, and the content of hexavalent tungsten (W ⁶⁺ ) can even reach more than 70%. In contrast, the proportion of tetravalent tungsten (W ⁴⁺ ) in tungsten trioxide is still as high as 32.53% even after 10 minutes of thermal annealing. The light annealing technology proposed in the manufacturing method disclosed in this disclosure is significantly better than the thermal annealing method in optimizing the characteristics of the electrochromic film layer.

3.2 Comparison of electrochromic film uniformity

In the conventional thermal annealing process, the tungsten oxide precursor liquid coated on the substrate shrinks due to uneven local heating during the drying process of the electrochromic film layer, making the electrochromic film layer uneven after drying, as shown in FIG. 3A. By using the optical annealing technology proposed in the present disclosure, the electrochromic film layer can be heated more evenly during the drying process, so an electrochromic film layer with better uniformity can be obtained, as shown in FIG. 3B. In the photo of the electrochromic element in FIG. 3A, it can be clearly seen that a large area presents a blue distribution of varying shades; while in FIG. 3B, compared with FIG. 3A, the blue distribution does not have a significant difference in shades, and the color distribution is uniform. From this result, it can be seen that the optical annealing technology proposed in the present disclosure can significantly improve the problem of poor uniformity of the electrochromic film layer caused by the traditional thermal annealing process.

3.3 Characteristics and life of electrochromic elements

The electrochromic element 10 manufactured by the manufacturing method of the electrochromic element proposed in the present disclosure has been tested and the results show that it has good color change characteristics and life. Please refer to Figure 4. In terms of color change characteristics, as shown in Figure 4, the electrochromic element manufactured according to the manufacturing method shown in the present disclosure has a transmittance change rate of 50% between the color state and the fading state in the visible light wavelength.

In addition, in terms of life test, the electrochromic element 10 was colored and faded at a bias voltage between -2 volts and 2 volts by cyclic voltammetry. After 3000 cycles of coloring and fading tests, the electrochromic element 10 was still able to maintain about 90% of the initial visible light transmittance change rate, as shown in FIG. 4 .

Of course, the embodiments in the specification are only used for illustration and are not intended to limit the scope of the present disclosure. Equivalent modifications or changes made to the method for manufacturing an electrochromic element according to the present embodiment should still be included in the scope of protection claimed in the present disclosure.

In summary, the inventors of the present disclosure have proposed a rapid light annealing manufacturing method technology with the following advantages:

1. Using near-infrared light source for photo annealing can quickly complete the annealing of tungsten trioxide electrochromic film in no more than 3 minutes, or even within 2 minutes. Compared with the traditional thermal annealing method that requires several hours of annealing process time, it has very fast production efficiency and cost, and is also very competitive in the market.

Second, using near-infrared light sources for photoannealing can significantly improve the problem of uneven distribution of electrochromic film layers caused by traditional thermal annealing processes, and can obtain electrochromic devices with better characteristics.

3. The electrochromic element obtained by light annealing with near-infrared light source has considerable advantages in characteristics and product life. After only about 2 minutes of rapid light annealing, the tetravalent chrysene (W ⁴⁺ ) in the electrochromic film layer that cannot participate in the color change process reaction has been completely eliminated, and the content of hexavalent chrysene (W ⁶⁺ ) that is beneficial to the color change performance can be as high as 70%. After 3,000 cycles of testing, the product can still retain about 90% of the initial visible light transmittance change.

It can be seen that the present disclosure has indeed achieved the desired improved effect by breaking through the previous technology, and it is not easy for people familiar with the technology to think of. Its progress and practicality obviously meet the patent application requirements. Therefore, a patent application is filed in accordance with the law. I sincerely request that your office approve this invention patent application to encourage creativity. I am truly grateful for your kindness.

The above description is for illustrative purposes only and is not intended to be limiting. Any other equivalent modifications or changes that do not depart from the spirit and scope of this disclosure should be included in the scope of the attached patent application.

10: Electrochromic element

100: first substrate

200:Electrochromic layer

300: Gel solid electrolyte layer

400: Nickel oxide ion storage layer

500: Second substrate

FIG. 1 is a structural diagram of an electrochromic element according to an embodiment of the present disclosure.

FIG. 2A is an XPS composition analysis spectrum of an electrochromic film fabricated by a conventional thermal annealing process.

FIG. 2B is an XPS composition analysis spectrum of the electrochromic film layer fabricated by the photoannealing process described in the fabrication method disclosed herein.

FIG. 3A is a photograph of an electrochromic device fabricated using a conventional thermal annealing process.

FIG. 3B is a photograph of an electrochromic device manufactured by the manufacturing method disclosed herein.

FIG. 4 is a spectrum diagram of the electrochromic element manufactured by the manufacturing method disclosed herein in the initial state and after 3000 cycles of testing, in the colored state and the faded state.

10: Electrochromic element

100: First substrate

200:Electrochromic layer

300: Gel solid electrolyte layer

400: Nickel oxide ion storage layer

500: Second substrate

Claims (10)

A method for manufacturing an electrochromic element comprises the following steps: manufacturing an electrochromic layer substrate, comprising: providing an ITO glass as a first substrate and pre-treating the surface of the first substrate; performing an electrochromic layer coating process, comprising: coating a tungsten trioxide precursor liquid on a surface of the first substrate by a scraper coating process to form a tungsten trioxide wet film; performing a first light annealing process, comprising: annealing the tungsten trioxide wet film with a low temperature. The method comprises: irradiating the tungsten trioxide dry film with a near-infrared light source of high intensity for a first irradiation time to form a tungsten trioxide dry film; performing a second light annealing process, including: irradiating the tungsten trioxide dry film with a near-infrared light source of high intensity for a second irradiation time to form a tungsten trioxide film layer, thereby completing the preparation of the electrochromic layer substrate; preparing the nickel oxide ion storage layer substrate, including: providing another ITO glass as a second substrate, and pre-treating the surface of the second substrate; performing a second light annealing process, including: irradiating the tungsten trioxide dry film with a near-infrared light source of high intensity for a second irradiation time to form a tungsten trioxide film layer, thereby completing the preparation of the electrochromic layer substrate; preparing the nickel oxide ion storage layer substrate, including: providing another ITO glass as a second substrate, and pre-treating the surface of the second substrate; performing a second light annealing process, including: A vacuum sputtering process is performed to form a nickel oxide film on one surface of the second substrate, thus completing the manufacture of the nickel oxide ion storage layer substrate; an assembly process is performed, including: placing the tungsten oxide film of the electrochromic layer substrate upward, and applying a hot press adhesive to the edge of the electrochromic layer substrate, then dripping a gel-solid electrolyte on the tungsten oxide film, placing the electrochromic layer substrate on a heating plate to heat the hot press adhesive to soften it, and quickly The nickel oxide film of the nickel oxide ion storage layer substrate is covered on the glue solid electrolyte, and the electrochromic layer substrate and the nickel oxide ion storage layer substrate are bonded due to the heat softening of the hot pressed glue, so that an electrochromic element semi-finished product can be obtained; and a packaging process is implemented, including: applying ultraviolet curing glue around the edge of the electrochromic element semi-finished product, and then curing the ultraviolet curing glue by irradiating ultraviolet light, so that the electrochromic element can be obtained. The manufacturing method as described in claim 1, wherein the first irradiation time is about 30 seconds to 90 seconds. The manufacturing method as described in claim 1, wherein the second irradiation time is about 30 seconds to 90 seconds. The manufacturing method as described in claim 1, wherein the first irradiation time is about 60 seconds, the second irradiation time is about 60 seconds, and the hexavalent tungsten content in the electrochromic layer substrate is not less than 70%. The manufacturing method as described in claim 1, wherein the tungsten trioxide precursor solution is prepared according to the following steps, including: mixing metal tungsten powder and about 30wt% hydrogen peroxide in a weight ratio of about 1:10, and stirring and reacting at 80°C for about 0.5~1 hour; then filtering and removing the supernatant, adding anhydrous alcohol of about the same volume as the supernatant, and stirring and reacting at 80°C for about 2~3 hours; finally adding an appropriate volume of isopropanol to dilute, so as to obtain the tungsten trioxide precursor solution with a concentration of about 70mg/ml~80mg/ml. The manufacturing method as described in claim 1, wherein the gel-solid electrolyte is prepared according to the following steps, including: dissolving lithium ion battery in propylene carbonate (PC) to prepare a liquid electrolyte with a concentration of 0.5M; then mixing the liquid electrolyte with poly(methyl methacrylate) (PMMA) at a weight ratio of 7:1.5 (liquid electrolyte: PMMA=7:1.5), and stirring evenly at 110°C to obtain the gel-solid electrolyte. The manufacturing method as described in claim 1, wherein the nickel oxide film layer has a thickness of about 300nm~400nm. The manufacturing method as described in claim 1, wherein the vacuum sputtering process further comprises: performing film deposition at a deposition rate of about 2-3 nm/min in an environment where the flow ratio of oxygen to argon is about 1-3 for oxygen/argon. The manufacturing method as described in claim 1, wherein the electrochromic layer coating process further includes: fixing the distance between the scraper and the surface of the first substrate to 50μm~60μm, and coating at a speed of about 8 cm per second. The manufacturing method as described in claim 1, wherein the ITO glass and the other ITO glass are transparent ITO glasses with a resistance of about 5 ohms.