TWI865179B - Coating equipment - Google Patents

Abstract

The subject of the present invention is to detect the electric field disorder formed between the anode and the substrate. The coating device 10 of the present invention includes: a coating tank 50 for containing the coating liquid Q; an anode 21, which is arranged in the coating tank 50; a substrate holder 40, which holds the substrate WF in a manner that the coated surface WF1 faces the anode 21; an anode mask 70, which is arranged between the anode 21 and the substrate holder 40, and has an anode opening 70 that passes through the side of the anode 21 and the side of the substrate holder 40. a, which is configured in a manner that the size of the anode opening 70a can be adjusted; the adjustment plate 30 is arranged between the anode shield 70 and the substrate holder 40; the measuring electrode 74 is arranged between the anode shield 70 and the adjustment plate 30; the reference electrode 75 is arranged in the plating liquid Q contained in the plating tank 50; and the measuring device 76 measures the voltage between the reference electrode 75 and the measuring electrode 74.

Description

Coating equipment

This case concerns a coating device.

As an example of electroplating equipment, an immersion type plating equipment and a cup type plating equipment are known. The common point is that a substrate (such as a semiconductor wafer) is held in a substrate holder and immersed in a plating liquid, and a conductive film is deposited on the surface of the substrate by applying a voltage between the substrate (cathode) and the anode. The two have different directions in which the surface to be plated of the substrate faces. In the immersion type plating equipment, the substrate is immersed in the plating liquid in a manner that the surface to be plated faces sideways, and in the cup type plating equipment, the substrate is immersed in the plating liquid in a manner that the surface to be plated faces downward.

Patent document 1 discloses an immersion coating device. This coating device has an anode shield, which is used to adjust the electric field between the anode and the substrate. The anode shield is a plate-shaped component arranged between the anode and the substrate holder, and has an opening in the center portion for allowing the current flowing between the anode and the substrate to pass through, and the opening diameter is adjustable. [Prior technical document] [Patent document]

[Patent Document 1] Japanese Patent No. 6335763

[Identify the problem you want to solve]

The coating device disclosed in Patent Document 1 does not take into account the detection of the disturbance of the electric field formed between the anode and the substrate.

That is, part of the anode mask (for example, a component used to adjust the opening diameter of the anode mask) may be damaged due to the chemical changes caused by the plating liquid, which may lead to component degradation. If part of the anode mask is damaged, the electric field between the anode and the substrate will be disrupted, making it difficult to form the expected coating film thickness distribution on the plated surface. In addition, not only the anode mask, but also other components arranged in the plating tank may be damaged due to chemical changes caused by the plating liquid.

Furthermore, in the coating device, the anode, anode mask and substrate (substrate holder) are required to be arranged at appropriate positions with each axis aligned with each other. However, if the arrangement position of any component is deviated, the electric field between the anode and the substrate is disrupted, making it difficult to form the expected coating film thickness distribution.

Therefore, one of the objectives of this project is to detect the disorder of the electric field formed between the anode and the substrate. [Methods of solving the problem]

According to one embodiment, a coating device is disclosed, which includes: a coating tank for containing a coating liquid; an anode disposed in the coating tank; a substrate holder for holding a substrate in a manner such that a coated surface faces the anode; an anode mask disposed between the anode and the substrate holder, and having an anode opening that passes through a side of the anode and a side of the substrate holder. , which is configured to adjust the size of the anode opening; an electric field adjusting component, arranged between the anode shield and the substrate holder; a measuring electrode, arranged between the anode shield and the electric field adjusting component; a reference electrode, arranged in the plating liquid contained in the plating tank; and a measuring device, measuring the voltage between the reference electrode and the measuring electrode.

The following is a description of the embodiments of the present invention with reference to the drawings. In the drawings described below, the same or equivalent components are given the same symbols and repeated descriptions are omitted.

FIG1 is a cross-sectional view showing the overall structure of a coating device of an embodiment. As shown in the figure, the coating device 10 of this embodiment has: an anode holder 20, which is configured to hold an anode 21; a substrate holder 40, which is configured to hold a substrate WF; and a coating tank 50, which accommodates the anode holder 20 and the substrate holder 40. In this embodiment, the substrate WF is formed into a disk shape, and the anode 21 is formed into a disk shape corresponding to the shape of the substrate WF.

As shown in FIG. 1 , the coating tank 50 includes: a coating treatment tank 52 for accommodating a coating liquid Q containing an additive; a coating liquid discharge tank 54 for receiving and discharging the coating liquid Q overflowing from the coating treatment tank 52; and a partition wall 55 for separating the coating treatment tank 52 from the coating liquid discharge tank 54.

The anode holder 20 holding the anode 21 and the substrate holder 40 holding the substrate WF are immersed in the plating liquid Q in the plating treatment tank 52, and are arranged opposite to each other in such a manner that the anode 21 and the plated surface WF1 of the substrate WF are approximately parallel. In other words, the substrate holder 40 holds the substrate WF in a state where the plated surface WF1 faces sideways. A voltage is applied to the anode 21 and the substrate WF while being immersed in the plating liquid Q in the plating treatment tank 52. Thereby, metal ions are reduced on the plated surface WF1 of the substrate WF, and a thin film is formed on the plated surface WF1.

The coating treatment tank 52 has a coating liquid supply port 56 for supplying the coating liquid Q into the tank. The coating liquid discharge tank 54 has a coating liquid discharge port 57 for discharging the coating liquid Q overflowing from the coating treatment tank 52. The coating liquid supply port 56 is arranged at the bottom of the coating treatment tank 52, and the coating liquid discharge port 57 is arranged at the bottom of the coating liquid discharge tank 54.

When the coating liquid Q is supplied to the coating treatment tank 52 from the coating liquid supply port 56, the coating liquid Q overflows from the coating treatment tank 52 and flows into the coating liquid discharge tank 54 over the partition wall 55. The coating liquid Q flowing into the coating liquid discharge tank 54 is discharged from the coating liquid discharge port 57, and impurities are removed by a filter or the like provided in the coating liquid circulation device 58. The coating liquid Q from which impurities have been removed is supplied to the coating treatment tank 52 through the coating liquid supply port 56 by the coating liquid circulation device 58.

The coating device 10 has an anode shield 70, which is used to adjust the electric field between the anode 21 and the substrate WF. The anode shield 70 is, for example, a roughly plate-shaped component made of a dielectric material, which is arranged on the front surface of the anode holder 20. Here, the so-called front surface of the anode holder 20 refers to the surface on one side opposite to the substrate holder 40. That is, the anode shield 70 is arranged between the anode 21 and the substrate holder 40. The anode shield 70 has an anode opening 70a in the roughly central portion, which passes through the anode 21 side and the substrate holder 40 side, in other words, allows the current flowing between the anode 21 and the substrate WF to pass through. The diameter of the anode opening 70a is preferably smaller than the diameter of the anode 21. The anode shield 70 is configured to be able to adjust the diameter of the anode opening 70a. This point is described below.

FIG. 2 is a schematic front view of the anode shield 70. FIG. 2 is an arrow view of the A-A line in FIG. 1. As shown in FIG. 2, the anode shield 70 has a plate-shaped anode shield body 71 and a roughly annular edge 73 formed in the center of the anode shield body 71. The anode shield 70 has a plurality of shielding blades 72, which are configured to adjust the anode opening 70a. The shielding blades 72 are mounted on the edge 73, and they cooperate to divide the anode opening 70a. The shielding blade 72 enlarges or reduces the diameter of the anode opening 70a (adjusts the diameter of the anode opening 70a) by the same structure as the aperture mechanism of the camera. The anode opening 70a of the anode shield 70 shown in FIG. 2 is formed into a non-circular shape (e.g., a polygon) by the shielding blade 72. The diameter of the anode opening 70a in this case refers to the shortest distance between the opposite sides of the polygon, or the diameter of the inscribed circle. Alternatively, the diameter of the anode opening 70a can also be defined by the diameter of a circle having an area equivalent to the opening area.

The shielding blades 72 can be manually operated to enlarge or reduce the diameter of the anode opening 70a. In addition, the shielding blades 72 can also be driven by air pressure or electric drive.

Referring to FIG. 1 , the coating device 10 has an adjustment plate 30, which is an example of an electric field adjustment component for adjusting the electric field between the anode 21 and the substrate WF. The adjustment plate 30 is, for example, a roughly plate-shaped component made of a dielectric material, and is disposed between the anode shield 70 and the substrate holder 40 (substrate WF). The adjustment plate 30 has an adjustment opening 30a, which passes through the anode 21 side and the substrate holder 40 side, in other words, it allows the current flowing between the anode 21 and the substrate WF to pass. The diameter of the adjustment opening 30a is preferably smaller than the diameter of the substrate WF.

The adjusting plate 30, like the anode shield 70, can also be configured to adjust the diameter of the adjusting opening 30a by means of a shielding blade. However, the adjustment of the diameter of the adjusting opening 30a is not limited to the shielding blade. For example, an elastic tube can be installed on the slightly annular edge, and a fluid (gas such as air or nitrogen, or a fluid such as water) can be made to enter and exit the cavity inside the elastic tube to expand/contract the elastic tube, thereby also adjusting the diameter of the adjusting opening 30a.

The adjustment plate 30 is preferably located closer to the substrate holder 40 than the middle position between the anode holder 20 and the substrate holder 40. The closer the adjustment plate 30 is to the substrate holder 40, the more accurately the film thickness of the peripheral portion of the substrate WF can be controlled by controlling the diameter of the adjustment opening 30a of the adjustment plate 30.

A paddle 18 is provided between the adjustment plate 30 and the substrate holder 40 to stir the coating liquid Q near the coating surface WF1 of the substrate WF. One end of the paddle 18 is fixed to the paddle driving device 19. The paddle 18 is moved along the coating surface WF1 of the substrate WF by the paddle driving device 19 to stir the coating liquid Q.

The coating apparatus 10 further includes a diaphragm box 60. The diaphragm box 60 is a box-shaped member for accommodating the anode holder 20 (anode 21) and the anode mask 70 in the coating tank 50. The diaphragm box 60 includes a diaphragm 62 disposed between the anode mask 70 and the adjustment plate 30. The diaphragm 62 is a thin film that separates the anode region where the anode 21 is disposed and the cathode region where the substrate WF is disposed. The diaphragm box 60 includes a plug 64 that discharges the coating liquid Q from the diaphragm box 60 when the diaphragm box 60 is lifted from the coating tank 50.

Next, the state of detecting electric field disorder of the coating device 10 is described. As shown in FIG2 , the coating device 10 has a measuring electrode 74 (three measuring electrodes 74 - 1 , 74 - 2 , and 74 - 3 in the embodiment of FIG2 ), a reference electrode 75 , and a measuring device 76 for measuring the voltage between the reference electrode 75 and the measuring electrode 74 .

In the embodiment of FIG. 2 , the measuring electrodes 74-1, 74-2, and 74-3 are arranged at equal intervals (120° intervals) on the surface of the anode shield 70 on the substrate holder 40 side, on the circumference opposite to the center of the anode opening 70a. More specifically, the measuring electrodes 74-1, 74-2, and 74-3 are arranged on the surface of the shielding blade 72 on the substrate holder 40 side. However, the measuring electrode 74 is not limited to the arrangement of the embodiment of FIG. 2 , and it can also be arranged between the anode shield 70 and the adjustment plate 30 (electric field adjustment member). When there are a plurality of measuring electrodes 74, the measuring electrodes 74 may be arranged at equal intervals on a circle with the virtual axis connecting the center of the anode 21 and the center of the substrate WF as the center. The number of measuring electrodes 74 may also be singular.

The reference electrode 75 is disposed on the surface of the substrate holder 40 side of the anode shield 70, at a position far from the measuring electrodes 74-1, 74-2, and 74-3 relative to the center of the anode shield 70. However, the reference electrode 75 is not limited to the configuration of the embodiment of FIG. 2, as long as it is disposed in the plating liquid Q contained in the plating tank 50. The measuring electrode 74 and the reference electrode 75 are connected to the measuring device 76 through the pattern wiring 77, respectively.

FIG3 is a three-dimensional cross-sectional view of an anode shield 70 and a diaphragm 62 in an embodiment. As shown in FIG3, the anode shield body 71 has a plate-shaped first anode shield body 71-1 and a plate-shaped second anode shield body 71-2. The first anode shield body 71-1 and the second anode shield body 71-2 are arranged in a manner of facing each other with a gap therebetween. The pattern wiring 77 is arranged in the space between the first anode shield body 71-1 and the second anode shield body 71-2. The pattern wiring 77 can be formed by forming a pattern of copper foil on a substrate such as epoxy resin. The first anode mask body 71 - 1 and the second anode mask body 71 - 2 function as sealing materials, thereby preventing the plating liquid Q from invading the internal space that accommodates the pattern wiring 77 .

The coating apparatus 10 can detect the disorder of the electric field formed between the anode 21 and the substrate WF by measuring the voltage of the measuring electrode 74 relative to the reference electrode 75 by the measuring device 76. An example related to the detection of the disorder of the electric field is described below.

2, the coating device 10 has a detection component 80, which is configured to detect the damage of the anode shield 70 or the adjustment plate 30 (electric field adjustment component) according to the time change of the voltage measured by the measuring device 76. That is, a part of the anode shield 70 (for example, the shielding blade 72 used to adjust the diameter of the anode opening) may be damaged due to the degradation of the component caused by the chemical change caused by the coating liquid. If a part of the anode shield is damaged, the electric field between the anode and the substrate is disrupted, and it is difficult to form the expected coating film thickness distribution on the coating surface. Furthermore, there is a concern that not only the anode shield 70 but also the adjustment plate 30 may be damaged due to chemical changes caused by the coating liquid.

In this regard, the detection component 80 detects the change of the voltage of at least one of the measuring electrodes 74-1, 74-2, and 74-3 relative to the normal state according to the time change of the voltage measured by the measuring device 76. For example, when the shielding blade 72 arranged near the measuring electrode 74-1 is damaged, the voltage of the measuring electrode 74-1 changes relative to the normal state. When the detection component 80 detects that the voltage of the measuring electrode 74-1 changes relative to the normal state, an alarm is issued to remind that the shielding blade 72 arranged near the measuring electrode 74-1 may be damaged. In addition, the detection component 80 can stop the operation of the coating device 10 at the same time as issuing the alarm.

FIG4 is a schematic front view of an anode mask of an embodiment. As shown in FIG4, the coating device 10 may also have six measuring electrodes 74-1 to 74-6. In this case, the measuring electrodes 74-1 to 74-6 are arranged at equal intervals (60° intervals) on the surface of the substrate holder 40 side of the anode mask 70 on the circumference opposite to the center of the anode opening 70a.

The detection member 80 is configured as follows: for each of the measuring electrodes 74-1 to 74-6, damage to the anode shield 70 or the adjustment plate 30 (electric field adjustment member) is detected based on the time variation of the voltage measured by the measuring device 76. By increasing the number of measuring electrodes 74 as in the present embodiment, it is possible to more specifically detect where the electric field formed between the anode 21 and the substrate WF is disrupted. As a result, for example, when the shielding blade 72 is damaged, the damaged portion can be more specifically identified.

Fig. 5 is a schematic front view of an anode mask of an embodiment. This embodiment is an embodiment of a plating device for plating a rectangular substrate WF. As shown in Fig. 5, the anode opening 70a is formed into a rectangle corresponding to the shape of the rectangular substrate WF.

As shown in FIG5 , the anode shield 70 has a plurality of shielding members 79 (shielding members 79-1, 79-2, 79-3, 79-4), which are arranged on each side of the rectangular anode opening 70a. Each shielding member 79 can move in a direction close to or away from the center of the anode opening 70a. Also, as shown in FIG5 , the coating device 10 includes a plurality of (4) measuring electrodes 74-1, 74-2, 74-3, 74-4, which are respectively arranged for each side of the rectangular anode opening 70a.

The coating apparatus 10 has an opening adjustment member 90 configured to move the shielding member 79 according to the voltages of the plurality of measuring electrodes measured by the measuring device 76. The opening adjustment member 90 can adjust the anode opening 70a when the alignment of the anode 21, the anode mask 70 and the substrate WF (substrate holder 40) is deviated.

That is, the anode 21, the anode mask 70 and the substrate WF (substrate holder 40) are required to be arranged at appropriate positions with the axes aligned with each other. However, if the arrangement position of any component is deviated, the electric field between the anode and the substrate is disordered, and it is difficult to form the expected coating film thickness distribution.

In response to this, the opening adjustment member 90 compares the voltage values of the measuring electrodes on the opposite sides of the anode opening 70a, and moves the shielding members 79-1, 79-2, 79-3, and 79-4 according to the comparison result to adjust the position of the anode opening 70a. For example, the substrate holder 40 is arranged at a position lower than the appropriate position. In this case, the electric field between the anode and the substrate is chaotic, and if the voltage of the measuring electrode 74-1 is compared with the voltage of the measuring electrode 74-3, the voltage of the measuring electrode 74-3 becomes higher. The opening adjustment member 90 moves the shielding members 79-1 and 79-3 downward according to the comparison result, thereby moving the anode opening 70a downward. The opening adjustment member 90 can move the shielding members 79-1 and 79-3 downward until the voltage of the measuring electrode 74-1 is equal to the voltage of the measuring electrode 74-3. As a result, the electric field disorder between the anode and the substrate can be suppressed, and the expected coating film thickness distribution can be easily formed.

In the above-mentioned embodiment, an immersion plating apparatus in which the substrate WF is immersed in the plating liquid with the surface WF1 to be coated facing sideways is described as an example, but the present invention is not limited to this. The present invention can also be applied to a cup plating apparatus in which the substrate WF is immersed in the plating liquid with the surface WF1 to be coated facing downward. This point is described below.

Fig. 6 is a cross-sectional view showing the overall structure of a coating device of an embodiment. Components having the same functions as those of the above-mentioned embodiment are given the same symbols and their description is omitted.

As shown in FIG6 , the substrate holder 40 is configured to hold the substrate WF in a state where the coated surface WF1 faces downward. The coating device 10 has a resistor 32 (electric field adjustment member) disposed between the anode shield 70 and the substrate holder 40 and having a plurality of openings 32a that pass through the anode 21 side and the substrate holder 40 side. The resistor 32 may be, for example, a punching plate having a plurality of punching openings, but is not limited thereto.

According to this embodiment, similar to the above-mentioned embodiment, the coating device 10 can measure the voltage of the measuring electrode 74 relative to the reference electrode 75 by the measuring device 76, thereby detecting the disorder of the electric field formed between the anode 21 and the substrate WF. In addition, the coating device 10 has a detection component 80, which detects the damage of the anode shield 70 or the resistor 32 (electric field adjustment component) based on the time change of the voltage measured by the measuring device 76. When the detection component 80 detects that the voltage of the measuring electrode 74 changes relative to the normal state, it can issue an alarm to remind that the shielding blade 72 arranged near the measuring electrode 74 may be damaged. Furthermore, the detection component 80 can stop the operation of the coating device 10 while issuing an alarm.

Several embodiments of the present invention are described above, but the embodiments are intended to facilitate understanding of the present invention and do not limit the present invention. The present invention can be modified and improved without departing from its main purpose, and the present invention naturally includes its equivalents. In addition, the constituent elements described in the scope of the patent application and the specification can be arbitrarily combined or omitted within the scope of solving at least part of the above-mentioned problems or exerting at least part of the effects.

In this case, as an implementation form, a coating device is disclosed, which includes: a coating tank for containing a coating liquid; an anode disposed in the coating tank; a substrate holder for holding a substrate in a manner such that a surface to be coated faces the anode; an anode shield disposed between the anode and the substrate holder, having an anode opening that passes through a side of the anode and a side of the substrate holder. The invention relates to an anode electrode having an opening configured to adjust the size of the anode opening; an electric field adjusting component disposed between the anode shield and the substrate holder; a measuring electrode disposed between the anode shield and the electric field adjusting component; a reference electrode disposed in the plating liquid contained in the plating tank; and a measuring device for measuring the voltage between the reference electrode and the measuring electrode.

In addition, in this case, as an embodiment, a coating device is disclosed, wherein the measuring electrode includes a plurality of measuring electrodes which are arranged at equal intervals on a circle centered on a virtual axis connecting the center of the anode and the center of the substrate.

Furthermore, in this case, as an embodiment, a coating device is disclosed, wherein the plurality of measuring electrodes are arranged on the surface of the anode shield on the substrate holder side.

Furthermore, in this case, as an embodiment, a coating device is disclosed, which further includes a detection component, which is configured to detect damage to the anode shield or the electric field regulating component based on the time variation of the voltage measured by the measurer.

Furthermore, in the present case, as an implementation form, a coating device is disclosed, wherein the anode opening forms a rectangle corresponding to the shape of the rectangular substrate held by the substrate holder; the multiple measuring electrodes are respectively arranged for each side of the rectangular anode opening; the anode shield includes a plurality of shielding components arranged on each side of the rectangular anode opening; it further includes an opening adjusting component, which is constructed in the following manner: according to the voltage measured by the measurer, the plurality of shielding components are moved in a direction close to or away from the center of the anode opening.

Furthermore, in this case, as an implementation form, a coating device is disclosed, wherein the substrate holder is constructed in a manner to hold the substrate with the coated surface facing sideways; the electric field adjustment component has an adjustment plate having a single adjustment opening that passes through the anode side and the substrate holder side.

Furthermore, in this case, as an implementation form, a coating device is disclosed, wherein the substrate holder is constructed in a manner to hold the substrate with the coated surface facing downward, and the electric field regulating component includes a resistor having a plurality of openings passing through the anode side and the substrate holder side.

10: coating device 18: paddle 19: paddle driving device 20: anode holder 21: anode 30: adjustment plate 30a: adjustment opening 32: resistor 32a: opening 40: substrate holder 50: coating tank 52: coating treatment tank 54: coating liquid discharge tank 55: partition wall 56: coating liquid supply port 57: coating liquid discharge port 58: coating liquid circulation device 60: diaphragm box 62: diaphragm 64: plug 70: anode shield 70a: anode opening 71: Anode shield body 71-1: 1st anode shield body 71-2: 2nd anode shield body 72: Shielding blade 73: Edge 74,74-1,74-2,74-3,74-4,74-5,74-6: Measuring electrode 75: Reference electrode 76: Measuring device 77: Pattern wiring 79,79-1,79-2,79-3,79-4: Shielding member 80: Detection member 90: Opening adjustment member Q: Plating liquid WF: Substrate WF1: Plated surface

FIG. 1 is a cross-sectional view showing the overall structure of a coating device of an embodiment. FIG. 2 is a schematic front view of an anode shield of an embodiment. FIG. 3 is a longitudinal cross-sectional view of an anode shield of an embodiment. FIG. 4 is a schematic front view of an anode shield of an embodiment. FIG. 5 is a schematic front view of an anode shield of an embodiment. FIG. 6 is a cross-sectional view showing the overall structure of a coating device of an embodiment.

10: Coating device

18: Paddle

19: Paddle drive device

20: Anode holder

21: Yang pole

30: Adjustment plate

30a: Adjust the opening

40: Substrate holder

50: Plated groove

52: Plating treatment tank

54: Plating liquid discharge tank

55: Partition wall

56: Plating liquid supply port

57: Plating liquid discharge port

58: Coating liquid circulation device

60: Diaphragm box

62: Diaphragm

64: Embolism

70: Anode mask

70a: Anode opening

72: shielding blades

73: Fate

74: Measuring electrode

75: Reference electrode

76:Measurement device

Q: Plating liquid

WF: Substrate

WF1: coated

Claims (7)

A coating device, comprising: A coating tank for containing coating liquid; An anode, arranged in the coating tank; A substrate holder, holding the substrate in a manner that the coated surface faces the anode; An anode shield, arranged between the anode and the substrate holder, having an anode opening that passes through the anode side and the substrate holder side, and configured to adjust the size of the anode opening; An electric field regulating component, arranged between the anode shield and the substrate holder; A measuring electrode, arranged between the anode shield and the electric field regulating component; A reference electrode is disposed in the plating solution contained in the plating tank; and a measuring device is used to measure the voltage between the reference electrode and the measuring electrode. A coating device as claimed in claim 1, wherein the measuring electrode comprises a plurality of measuring electrodes which are arranged at equal intervals on a circle centered on a virtual axis connecting the center of the anode and the center of the substrate. A coating device as claimed in claim 2, wherein the plurality of measuring electrodes are arranged on a surface of the substrate holder side of the anode mask. The coated device of any one of claims 1 to 3 further comprises a detection component configured to detect damage to the anode shield or the electric field regulating component based on the time variation of the voltage measured by the measurer. A coating device as claimed in claim 2 or 3, wherein the anode opening forms a rectangle corresponding to the shape of the rectangular substrate held by the substrate holder; The plurality of measuring electrodes are respectively arranged for each side of the rectangular anode opening; The anode shield includes a plurality of shielding members arranged on each side of the rectangular anode opening; It further includes an opening adjustment member, which is configured as follows: according to the voltage measured by the measuring device, the plurality of shielding members are moved in a direction close to or away from the center of the anode opening. The coating device of claim 1, wherein the substrate holder is configured to hold the substrate in a state where the coated surface faces sideways; The electric field adjustment member includes an adjustment plate having a single adjustment opening that passes through the anode side and the substrate holder side. The coating device of claim 1, wherein the substrate holder is configured to hold the substrate with the coated surface facing downward; The electric field regulating component includes a resistor having a plurality of openings passing through the anode side and the substrate holder side.