TWI864938B - Polyimide film and laminate made of the same - Google Patents
Polyimide film and laminate made of the same Download PDFInfo
- Publication number
- TWI864938B TWI864938B TW112129213A TW112129213A TWI864938B TW I864938 B TWI864938 B TW I864938B TW 112129213 A TW112129213 A TW 112129213A TW 112129213 A TW112129213 A TW 112129213A TW I864938 B TWI864938 B TW I864938B
- Authority
- TW
- Taiwan
- Prior art keywords
- polyimide film
- mole
- bpda
- grams
- minutes
- Prior art date
Links
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Laminated Bodies (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
本發明為一種聚醯亞胺薄膜及其積層板,特別係指一種具3,3',4,4'-聯苯四甲酸二酐(BPDA)成分;均苯四甲酸酐(PMDA)成分;對苯二胺(p-PDA)成分;2,2'-二甲基-4,4'-二氨基聯苯(m-TB)成分以及4,4'-二氨基二苯醚(ODA)成分;並且以BPDA與PDA作為共聚鏈段之聚醯亞胺薄膜及其積層板,使其具有良好的熱性質、機械性質以及接著性。 The present invention is a polyimide film and a laminate thereof, particularly a polyimide film and a laminate thereof having 3,3',4,4'-biphenyltetracarboxylic anhydride (BPDA) component; pyromellitic anhydride (PMDA) component; p-phenylenediamine (p-PDA) component; 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB) component and 4,4'-diaminodiphenyl ether (ODA) component; and using BPDA and PDA as copolymer chain segments, so that the polyimide film and the laminate thereof have good thermal properties, mechanical properties and adhesion.
Description
本發明為一種聚醯亞胺膜及使用該膜製成之積層板,特別係指一種具3,3',4,4'-聯苯四羧酸二酐(BPDA)成分;均苯四甲酸酐(PMDA)成分;對苯二胺(p-PDA)成分;2,2'-二甲基-4,4'-二氨基聯苯(m-TB)成分以及4,4‘-二氨基二苯醚(ODA)成分;並且以BPDA與PDA作為共聚鏈段之聚醯亞胺薄膜及其積層板,使其具有良好的熱性質、機械性質以及接著性。 The present invention is a polyimide film and a laminate made of the film, particularly a polyimide film and laminate made of 3,3',4,4'-biphenyltetracarboxylic anhydride (BPDA); pyromellitic anhydride (PMDA); p-phenylenediamine (p-PDA); 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB) and 4,4'-diaminodiphenyl ether (ODA); and BPDA and PDA as copolymer segments, so that the film and laminate have good thermal properties, mechanical properties and adhesion.
軟性電路板為一種金屬層與聚醯亞胺間的基層體,大多數的軟性電路板在金屬層與聚醯亞胺層間有一層膠層作為兩層之間接著的介質,在近年軟性電路設計朝細線化發展的趨勢,金屬層厚度越來越薄,因此發展出聚醯亞胺層與金屬層直接接著的層積體。 A flexible circuit board is a base layer between a metal layer and a polyimide layer. Most flexible circuit boards have a plastic layer between the metal layer and the polyimide layer as a medium between the two layers. In recent years, as flexible circuit design has developed towards fine lines, the thickness of the metal layer has become thinner and thinner, so a laminate with a polyimide layer and a metal layer directly connected has been developed.
一般而言,聚醯亞胺層與金屬層接著,可以在聚醯亞胺層上附著可塑性聚醯亞胺層作為接著媒介,但在與金屬接著過程中需經由高溫熱壓此種製作方法難以製作出厚度較薄的聚醯亞胺層與金屬層積體。另外一種方式為使用直接金屬化方式進行金屬 層與聚醯亞胺層的接著。但一般常見的聚醯亞胺難以與金屬層產生接著力,需進行表面處理後再進行金屬化才能與金屬有一定的接著性。 Generally speaking, when a polyimide layer is bonded to a metal layer, a plastic polyimide layer can be attached to the polyimide layer as a bonding medium. However, the bonding process with the metal requires high temperature hot pressing. This manufacturing method is difficult to produce a thin polyimide layer and metal layer integral body. Another method is to use direct metallization to bond the metal layer to the polyimide layer. However, common polyimide is difficult to produce bonding force with the metal layer, and surface treatment is required before metallization to have a certain degree of bonding with the metal.
TWI695865提出一種提升金屬化後接著力的方法,該方法為在聚醯亞胺薄膜上塗上一層底漆以提高金屬層與聚醯亞胺層間的接著力,但由於底漆塗層的熱性質較差,會造成整體聚醯亞胺薄膜的熱性質下降,並且容易出現底漆層沾黏的現象,造成後段加工的不易。 TWI695865 proposes a method to improve the adhesion after metallization. The method is to apply a layer of primer on the polyimide film to improve the adhesion between the metal layer and the polyimide layer. However, due to the poor thermal properties of the primer coating, the thermal properties of the entire polyimide film will be reduced, and the primer layer is prone to adhesion, making subsequent processing difficult.
因此,本發明提出一種不需底漆塗層便可提供良好接著力之的聚醯亞胺薄膜,將有效的改善聚醯亞胺膜金屬化後的接著力,並且在老化條件150℃下烘烤24小時後仍能維持接著力大於0.5kgf/cm。 Therefore, the present invention proposes a polyimide film that can provide good adhesion without primer coating, which will effectively improve the adhesion of the polyimide film after metallization, and can still maintain adhesion greater than 0.5kgf/cm after baking at aging conditions of 150°C for 24 hours.
本發明為一種聚醯亞胺膜,其係由二酸酐及二酸形成共聚聚醯亞胺,該二酸酐包括有該3,3',4,4'-聯苯四羧酸二酐(BPDA)占總二酸酐莫爾數60~80mol%及均苯四甲酸酐(PMDA)占總二酸酐莫爾數20~40mol%;該二胺包括有對苯二胺(p-PDA)占總二胺莫爾數10~40mol%,2,2'-二甲基-4,4'-二氨基聯苯(m-TB)占總二胺莫爾數30~60mol%及4,4'-二氨基二苯醚(ODA)占總二胺莫爾數10~40mol%;其中,該共聚聚醯亞胺具有3,3',4,4'-聯苯四羧酸二 酐(BPDA)與對苯二胺(p-PDA)所組成之共聚鏈段,該共聚鏈段佔聚醯亞胺總莫爾數25~40%,使該聚醯亞胺膜之熱線膨脹係數CTE小於15ppm/℃,楊氏膜量大於7GPa。 The present invention is a polyimide film, which is a copolymerized polyimide formed by dianhydride and dian acid, wherein the dianhydride includes 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) accounting for 60-80 mol% of the total dianhydride mole number and pyromellitic anhydride (PMDA) accounting for 20-40 mol% of the total dianhydride mole number; the diamine includes p-phenylenediamine (p-PDA) accounting for 10-40 mol% of the total diamine mole number, and 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB ) accounts for 30-60 mol% of the total diamine molar number and 4,4'-diaminodiphenyl ether (ODA) accounts for 10-40 mol% of the total diamine molar number; wherein the copolymerized polyimide has a copolymer chain segment composed of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and p-phenylenediamine (p-PDA), and the copolymer chain segment accounts for 25-40% of the total molar number of the polyimide, so that the thermal expansion coefficient CTE of the polyimide film is less than 15ppm/℃, and the Young's modulus is greater than 7GPa.
聚醯亞胺膜製作Polyimide film preparation
聚醯亞胺膜係由共聚聚醯胺酸經由化學環化或熱環化的方式製作而成,該共聚聚醯胺酸由二酸酐與二胺聚合而得,二酸酐包括有3,3',4,4'-聯苯四羧酸二酐(BPDA)占總二酸酐莫爾數60~80mol%及均苯四甲酸酐(PMDA)占總二酸酐莫20~40mol%;該二胺包括有對苯二胺(p-PDA)占總二胺莫爾數10~40mol%,2,2'-二甲基-4,4'-二氨基聯苯(m-TB)占總二胺莫爾數30~60mol%及4,4‘-二氨基二苯醚(ODA)占總二胺莫爾數10~40mol%。其中,該共聚聚醯亞胺需具有3,3',4,4'-聯苯四羧酸二酐(BPDA)與對苯二胺(p-PDA)所組成之共聚鏈段。 The polyimide film is prepared by chemical cyclization or thermal cyclization of copolymerized polyamide, wherein the copolymerized polyamide is obtained by polymerization of dianhydride and diamine, wherein the dianhydride comprises 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) accounting for 60-80 mol% of the total dianhydride and pyromellitic anhydride (PMDA) accounting for 20-40 mol% of the total dianhydride; and the diamine comprises p-phenylenediamine (p-PDA) accounting for 10-40 mol% of the total diamine, 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB) accounting for 30-60 mol% of the total diamine, and 4,4'-diaminodiphenyl ether (ODA) accounting for 10-40 mol% of the total diamine. The copolymer polyimide must have a copolymer chain segment composed of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and p-phenylenediamine (p-PDA).
實施方式為,使用BPDA與PDA於溶劑中反應1~3小時形成共聚鏈段,該共聚鏈段莫爾數段須佔總莫爾數的25%~40%以確保能有較好的熱性質。 The implementation method is to use BPDA and PDA to react in a solvent for 1 to 3 hours to form a copolymer chain segment. The molar number of the copolymer chain segment must account for 25% to 40% of the total molar number to ensure better thermal properties.
作為溶劑,聚醯亞胺成分之製作可使用二甲基乙醯胺(DMAc),N-甲基吡咯烷酮(NMP),N-乙基-2-吡咯烷酮(NEP),γ-丁內酯(GBL)、N,N-二甲基甲醯胺(DMF)本發明使用二甲基乙醯 胺作為溶劑。 As a solvent, dimethylacetamide (DMAc), N-methylpyrrolidone (NMP), N-ethyl-2-pyrrolidone (NEP), γ-butyrolactone (GBL), N,N-dimethylformamide (DMF) can be used to prepare the polyimide component. The present invention uses dimethylacetamide as a solvent.
完成BPDA與PDA之共聚鏈段之聚合後,再加入剩餘之二胺,該二胺可以全部添加或是部份添加以形成第二共聚鏈段或第三共聚鏈段。 After the polymerization of the copolymer chain segments of BPDA and PDA is completed, the remaining diamine is added. The diamine can be added in full or in part to form the second copolymer chain segment or the third copolymer chain segment.
該二胺可以為mTB、ODA、PDA之任一種,二胺添加後再加入PMDA或BPDA將總酸酐莫爾數與總二胺莫爾數比調整至0.95以上後,攪拌反應至少1小時,較佳為大於2小時,之後使用微量的BPDA或PMDA進行黏度調整,最終將溶液調整至100,000cps~600,000cps,較佳為150,000~400,000cps,此時溶液固體含量可介於10~25wt%之間即完成聚醯亞胺前驅物的製作。 The diamine can be any one of mTB, ODA, and PDA. After adding the diamine, PMDA or BPDA is added to adjust the total anhydride molar number to the total diamine molar number ratio to 0.95 or more, and then stirred for at least 1 hour, preferably more than 2 hours. Then, a small amount of BPDA or PMDA is used to adjust the viscosity. Finally, the solution is adjusted to 100,000cps~600,000cps, preferably 150,000~400,000cps. At this time, the solid content of the solution can be between 10~25wt% to complete the preparation of the polyimide precursor.
另外,上述聚醯亞胺前驅物施可添加改善收卷性、滑動性、導熱性、高硬度、色澤等各種特性目的無機材料粒子或有機材料粒子,無機材料粒子可以為氧化矽、氮化硼、氧化鋁、氧化鈦、氧化鋯、氧化鋅、磷酸鈣等。 In addition, the above-mentioned polyimide precursor can be added with inorganic material particles or organic material particles for the purpose of improving various properties such as winding, sliding, thermal conductivity, high hardness, color, etc. The inorganic material particles can be silicon oxide, boron nitride, aluminum oxide, titanium oxide, zirconium oxide, zinc oxide, calcium phosphate, etc.
有機材料粒子可以為四氟乙烯一全氟烷氧基乙烯基醚共聚物(PFA)、聚四氟乙烯(PTFE)、液晶高分子(LCP)、聚醯亞胺(PI)。 The organic material particles can be tetrafluoroethylene-perfluoroalkoxy vinyl ether copolymer (PFA), polytetrafluoroethylene (PTFE), liquid crystal polymer (LCP), polyimide (PI).
無機材料粒子與有機材料粒子平均粒徑通常為0.01um至100um,較佳為0.03um至10um,更加為0.05um至5um。 The average particle size of inorganic material particles and organic material particles is usually 0.01um to 100um, preferably 0.03um to 10um, and more preferably 0.05um to 5um.
無機材料粒子與有機材料粒子添加量為0.5~10%,較佳為1~3%。 The addition amount of inorganic material particles and organic material particles is 0.5~10%, preferably 1~3%.
將上述段之聚醯亞胺前驅物(共聚聚醯胺酸),醯亞胺化製備成聚醯亞胺膜可使用熱環化法與化學環化法。 The polyimide precursor (copolymerized polyamide) of the above segment can be imidized to prepare polyimide membrane by thermal cyclization and chemical cyclization.
熱環化法為不使用脫水劑與觸媒之環化方法,將共聚聚醯胺酸與溶劑混合,將黏度調整至8,000~20,000cps塗佈於玻璃或金屬載體上,加熱至350~400度溫度範圍進行長時間烘烤,烘烤時間1~8小時後獲得聚醯亞胺膜。 The thermal cyclization method is a cyclization method that does not use a dehydrating agent or a catalyst. The copolymerized polyimide is mixed with a solvent, the viscosity is adjusted to 8,000~20,000cps, and then coated on a glass or metal carrier. The mixture is heated to a temperature range of 350~400 degrees and baked for a long time. After a baking time of 1~8 hours, a polyimide film is obtained.
化學環化法為,將共聚聚醯胺酸與溶劑混合進行黏度調整,之後加入催化劑與脫水劑進行化學環化,其中脫水劑可以為醋酸酐或苯甲酸酐,在本發明中選用醋酸酐作為脫水劑;其中催化劑可以為吡啶、3-甲基吡啶,2-甲基吡啶,4-甲基吡啶,異喹啉,喹啉,三乙胺,其中較佳的選擇為吡啶、3-甲基吡啶,2-甲基吡啶,4-甲基吡啶,在本發明中選擇3-甲基吡啶作為催化劑。 The chemical cyclization method is to mix the copolymerized polyamine with a solvent to adjust the viscosity, and then add a catalyst and a dehydrating agent for chemical cyclization, wherein the dehydrating agent can be acetic anhydride or benzoic anhydride, and acetic anhydride is selected as the dehydrating agent in the present invention; wherein the catalyst can be pyridine, 3-methylpyridine, 2-methylpyridine, 4-methylpyridine, isoquinoline, quinoline, triethylamine, wherein pyridine, 3-methylpyridine, 2-methylpyridine, 4-methylpyridine are preferably selected, and 3-methylpyridine is selected as the catalyst in the present invention.
上述催化劑與脫水劑可單獨使用,也可以與溶劑混合進行稀釋 The above catalysts and dehydrating agents can be used alone or mixed with solvents for dilution.
後添加至混合液中,將混入脫水劑與催化劑的混合液在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用刮刀進行塗佈,刮刀間隙可示需求厚度進行調整。將塗佈完成之樣品置放於40℃~120℃烘烤10~40分鐘較佳為60℃~100℃烘烤20~30分鐘,再以170oC~200℃烘烤10分鐘後,再以230℃~280℃烘烤5~25分鐘,較佳為240~260℃烘烤10~20 分鐘,最後以330℃~400℃烘烤10~30分鐘分鐘做為最終處理,較佳為350℃~370℃烘烤15~20分鐘。 Add it to the mixed liquid, stir the mixed liquid with dehydrating agent and catalyst evenly, and then use a centrifugal degasser to degas. Apply the degassing solution to the glass plate and then use a scraper to apply it. The gap of the scraper can be adjusted according to the required thickness. Place the coated sample in a baking oven at 40℃~120℃ for 10~40 minutes, preferably at 60℃~100℃ for 20~30 minutes, then bake at 170oC~200℃ for 10 minutes, then bake at 230℃~280℃ for 5~25 minutes, preferably at 240~260℃ for 10~20 minutes, and finally bake at 330℃~400℃ for 10~30 minutes as the final treatment, preferably at 350℃~370℃ for 15~20 minutes.
上述製膜過程之基板,除了玻璃之外,亦可使用金屬板,使用金屬板製作該醯亞胺膜時,於40℃~120C℃溫度範圍烘烤乾燥後需從金屬板上取下,將取下後的半乾燥膜固定於金屬框架上,後續升溫至170℃烘烤20分鐘後,再升溫至350℃烘烤20分鐘做為最終處理,即可得到聚醯亞胺膜。 In addition to glass, metal plates can also be used as substrates in the above film-making process. When using metal plates to make the polyimide film, it needs to be removed from the metal plate after being baked and dried at a temperature range of 40℃~120C℃. The semi-dried film after removal is fixed on the metal frame, and then the temperature is raised to 170℃ and baked for 20 minutes, and then the temperature is raised to 350℃ and baked for 20 minutes as the final treatment to obtain the polyimide film.
積層板的製作Laminate production
積層板之方法,包括:於一聚醯亞胺膜之表面以無電解電鍍方式形成一鎳金屬層,使該鎳金屬層與該聚醯亞胺膜相接觸;並於該鎳金屬層形成後,進行熱處理,再於其上以電解電鍍形成銅層。 The method of laminated plate includes: forming a nickel metal layer on the surface of a polyimide film by electroless plating, so that the nickel metal layer is in contact with the polyimide film; and after the nickel metal layer is formed, heat treatment is performed, and then a copper layer is formed thereon by electrolytic plating.
在本發明中,鎳層係以化學鍍在聚醯亞胺基材的一面或兩面上形成鍍層。就化學鍍而言,可以是習知的化學鍍方法,並未特別限制。又,就化學鍍的具體例而言,亦可對該聚醯亞胺膜先進行表面親水化處理,此處可採用本技術領域習知之表面處理,此處並未加以限制。 In the present invention, the nickel layer is formed by chemical plating on one or both sides of the polyimide substrate. As for the chemical plating, it can be a known chemical plating method and is not particularly limited. In addition, as for the specific example of chemical plating, the polyimide membrane can also be subjected to surface hydrophilization treatment first, and the surface treatment known in the technical field can be adopted here, and it is not limited here.
本發明所使用之表面處理,使用購自馗鼎奈米科技公司(Creating Nano Technologies Inc.)的捲對卷電漿處理機(型號R2RP03)來對聚醯亞胺膜進行表面親水化處理,作業條件說明如下。 The surface treatment used in the present invention uses a roll-to-roll plasma treatment machine (model R2RP03) purchased from Creating Nano Technologies Inc. to perform surface hydrophilization treatment on the polyimide membrane. The operating conditions are described as follows.
將聚醯亞胺膜固定於放捲軸並接上導膜,關閉腔體通入氮氣(N2),啟動電源開始抽氣,待機台完成預熱即可轉入製程段;張力設定為2kg工作壓力為300mTorr,電源功率10kW,調整氣體種類及流量,其中氣體分別有氮氣(N2)、氧氣(O2)、四氟化碳(CF4)及氬氣(Ar)等四種,可依需求任意組合,控制氣體總流量介於1900sccm至2700sccm之間,電漿區的長度為11m,調整機台線速度即可控制處理時間,範圍介於0.5m/min至6.0m/min之間;製程結束後依序通入氧氣(O2)與氬氣(Ar)清潔腔體,破真空後關閉電源,接著開啟腔體取出聚醯亞胺膜,即可完成表面電漿改質。 The polyimide film is fixed on the unwinding reel and connected to the film guide. The chamber is closed and nitrogen (N 2 ) is introduced. The power is turned on to start the vacuum. After the machine is preheated, it can enter the process stage. The tension is set to 2kg, the working pressure is 300mTorr, and the power is 10kW. The gas type and flow rate are adjusted. There are four types of gases: nitrogen (N 2 ), oxygen (O 2 ), carbon tetrafluoride (CF 4 ) and argon (Ar). They can be combined as needed. The total gas flow rate is controlled between 1900sccm and 2700sccm. The length of the plasma zone is 11m. The processing time can be controlled by adjusting the machine line speed, which ranges from 0.5m/min to 6.0m/min. After the process is completed, oxygen (O 2 ) and argon (Ar) to clean the chamber, break the vacuum and turn off the power, then open the chamber to take out the polyimide film to complete the surface plasma modification.
本發明參照日本奧野製藥股份有限公司的SLP金屬化製程(SLP process),使用SLP系列無電解鍍鎳試劑依續進行電荷調節、預浸、催化、速化、還原鍍鎳等步驟,作業條件說明如下。 This invention refers to the SLP metallization process (SLP process) of Japan's Okuno Pharmaceutical Co., Ltd., and uses the SLP series of electroless nickel plating reagents to successively perform charge adjustment, pre-immersion, catalysis, acceleration, and reduction nickel plating steps. The operating conditions are described as follows.
將完成親水化處理的PI基材浸泡於65℃的SLP-200溶液中75秒以進行電荷調節,取出並水洗。 Immerse the hydrophilized PI substrate in a 65°C SLP-200 solution for 75 seconds for charge adjustment, then remove and rinse with water.
連續浸泡於25℃的SLP-300溶液中25秒及SLP-400溶液中75秒,使觸媒附著於透明基材表面,取出並水洗。 Continuously immerse in 25°C SLP-300 solution for 25 seconds and SLP-400 solution for 75 seconds to allow the catalyst to adhere to the surface of the transparent substrate, then remove and rinse with water.
接著浸泡於35℃的SLP-500溶液中75秒以活化觸媒,取出並水洗。 Then soak in 35℃ SLP-500 solution for 75 seconds to activate the catalyst, take out and rinse with water.
最後浸泡於40℃的SLP-660溶液中,控制pH值8.5±0.1,反應250秒後取出並水洗,即可完成鎳金屬層/聚醯亞胺膜之複合膜,且單面鎳層的厚度介於0.08~0.10μm之間。。 Finally, soak in 40℃ SLP-660 solution, control the pH value to 8.5±0.1, react for 250 seconds, take out and wash with water, and the nickel metal layer/polyimide film composite film is completed, and the thickness of the single-sided nickel layer is between 0.08~0.10μm. .
本發明的銅層並未特別限制,只要是能夠形成後續蝕刻線路的銅層即可,並未特別限制。又,在本發明一實施例中,較佳係使用電鍍的方式將銅層鍍於鎳金屬層上,就用於銅層的電鍍液而言,可為市售品,例如可使用硫酸銅電鍍液 The copper layer of the present invention is not particularly limited, as long as it can form a copper layer for subsequent etching circuits. In addition, in one embodiment of the present invention, it is preferred to use electroplating to plate the copper layer on the nickel metal layer. The electroplating solution used for the copper layer can be a commercially available product, such as copper sulfate electroplating solution.
(購自濟緯實業股份有限公司)等,作業條件說明如下。將前述鎳金屬層/聚醯亞胺膜之複合膜先進行熱處理,條件為120℃烘烤24小時,再使用2wt%之硫酸清除鎳金屬層表面之氧化層,接著於電鍍槽中進行電解電鍍,電鍍液包含150g/L之硫酸、120g/L之硫酸銅及50ppm之氯離子,以及適量的電鍍添加劑如光澤劑、平坦劑等,電流密度4 ASD,平均鍍速約為0.5μm/min,控制通電時間即可按照需求於鎳層表面沉積厚度0.2~20μm的銅金屬層。 (Purchased from Jiwei Industrial Co., Ltd.), etc. The working conditions are as follows. The above-mentioned nickel metal layer/polyimide film composite film is first heat-treated at 120℃ for 24 hours, and then 2wt% sulfuric acid is used to remove the oxide layer on the surface of the nickel metal layer. Then, electrolytic plating is performed in the plating tank. The plating solution contains 150g/L sulfuric acid, 120g/L copper sulfate and 50ppm chlorine ions, as well as appropriate plating additives such as brighteners and flattening agents. The current density is 4 ASD, and the average plating speed is about 0.5μm/min. By controlling the power-on time, a copper metal layer with a thickness of 0.2~20μm can be deposited on the surface of the nickel layer according to demand.
實施例 Implementation example
<檢測方法> <Testing method>
下列實施例中所得到的聚醯亞胺膜的熱性質與電性質使用以下方法量測。 The thermal and electrical properties of the polyimide films obtained in the following examples were measured using the following methods.
(1)楊氏膜量:根據ASTM D882標準規範,使用Hounsfield H10K-S拉力機進行量測。 (1) Young's film thickness: measured according to ASTM D882 standard specification using Hounsfield H10K-S tensile testing machine.
(2)熱線膨脹係數CTE:依照ASTM D696規範,使用TA Instruments公司出的型號Q400 TMA儀器量測。量測透明聚醯亞胺膜在50~200℃時的熱膨脹係數,升溫速率設定為10℃/min。為了除去因熱處理所造成的應力,藉由第一次量測除去殘餘應力後,以第二次量測結果做為實際值。 (2) Thermal expansion coefficient CTE: According to ASTM D696, the Q400 TMA instrument produced by TA Instruments was used to measure the thermal expansion coefficient of the transparent polyimide film at 50~200℃, and the heating rate was set to 10℃/min. In order to remove the stress caused by heat treatment, the residual stress was removed by the first measurement, and the second measurement result was used as the actual value.
(3)接著力:根據IPC-TM-6502.4.9標準規範,使用Hounsfield H10K-S拉力機進行量測。 (3) Adhesion force: measured according to IPC-TM-6502.4.9 standard using Hounsfield H10K-S tensile testing machine.
<實施例1><Example 1>
聚醯亞胺膜之製作Preparation of polyimide membrane
將7.139克的對苯二胺(p-PDA,0.066mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入15.538克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.165mole),攪拌反應1小時且溫度持續維持在25℃再添加25.694克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.121mole),攪拌至完全溶解,再緩慢添加11.999克的均苯四甲酸酐(PMDA,0.055mole),攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後再加入12.301克的BPDA並反應1小時後再加入ODA 6.609克(ODA,0.033mol),待其溶解完全後加入19.747克的BPDA(0.0671mol),攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 7.139 g of p-phenylenediamine (p-PDA, 0.066 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After all the DMAc was dissolved, 15.538 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.165 mole) was added. The mixture was stirred for 1 hour and the temperature was maintained at 25°C. Then 25.694 g of 2,2' -dimethyl-4,4'-diaminobenzidine (m-TB, 0.121 mole), stir until completely dissolved, then slowly add 11.999 grams of pyromellitic anhydride (PMDA, 0.055 mole), stir for 0.5 hours to dissolve and react, and the temperature of the solution is maintained at 25°C, then add 12.301 grams of BPDA and react for 1 hour, then add 6.609 grams of ODA (ODA, 0.033 mol), after it is completely dissolved, add 19.747 grams of BPDA (0.0671 mol), stir and react for 2 hours, use a small amount of BPDA to adjust the viscosity to 250,000±300,000 cps, and finally obtain a copolymer polyamide solution with a solid content of 20%.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.12克的醋酸酐稀釋液與5.41克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘分鐘做為最終處理。 Take out 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.12 grams of acetic anhydride dilution and 5.41 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas, apply the degassing solution to a glass plate, and then use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作Laminate production
於一聚醯亞胺膜之表面以無電解電鍍方式形成一鎳金屬層,使該鎳金屬層與該聚醯亞胺膜相接觸;並於該鎳金屬層形成後,進行熱處理,再於其上以電解電鍍形成銅層。 A nickel metal layer is formed on the surface of a polyimide film by electroless plating, so that the nickel metal layer is in contact with the polyimide film; and after the nickel metal layer is formed, heat treatment is performed, and then a copper layer is formed thereon by electrolytic plating.
在本發明中,鎳層係以化學鍍在聚醯亞胺基材的一面或兩面上形成鍍層。就化學鍍而言,可以是習知的化學鍍方法,並未特別限制。又,就化學鍍的具體例而言,可對該聚醯亞胺膜先進行表面親水化處理,此處可採用本技術領域習知之表面處理,此處並未加以限制。 In the present invention, the nickel layer is formed by chemical plating on one or both sides of the polyimide substrate. As for the chemical plating, it can be a known chemical plating method and is not particularly limited. In addition, as for a specific example of chemical plating, the polyimide membrane can be first subjected to surface hydrophilization treatment, and the surface treatment known in the technical field can be adopted here, and it is not limited here.
在本發明中,鎳層係以化學鍍在聚醯亞胺基材的一面或兩面上形成鍍層。本發明參照日本奧野製藥股份有限公司的SLP金屬化製程(SLP process),使用SLP系列無電解鍍鎳試劑依續進行電荷調節、預浸、催化、速化、還原鍍鎳等步驟,作業條件說明如下。 In the present invention, the nickel layer is formed by chemical plating on one or both sides of the polyimide substrate. The present invention refers to the SLP metallization process (SLP process) of Japan Okuno Pharmaceutical Co., Ltd., and uses the SLP series of electroless nickel plating reagents to successively perform charge adjustment, pre-immersion, catalysis, acceleration, and reduction nickel plating steps. The operating conditions are described as follows.
將完成親水化處理的PI基材浸泡於65℃的SLP-200溶液中75秒以進行電荷調節,取出並水洗。 Immerse the hydrophilized PI substrate in a 65°C SLP-200 solution for 75 seconds for charge adjustment, then remove and rinse with water.
連續浸泡於25℃的SLP-300溶液中25秒及SLP-400溶液中75秒,使觸媒附著於透明基材表面,取出並水洗。 Continuously immerse in 25°C SLP-300 solution for 25 seconds and SLP-400 solution for 75 seconds to allow the catalyst to adhere to the surface of the transparent substrate, then remove and rinse with water.
接著浸泡於35℃的SLP-500溶液中75秒以活化觸媒,取出並水洗。 Then soak in 35℃ SLP-500 solution for 75 seconds to activate the catalyst, take out and rinse with water.
最後浸泡於40℃的SLP-660溶液中,控制pH值8.5±0.1,反應250秒後取出並水洗,即可完成鎳金屬層/聚醯亞胺膜之複合膜,且單面鎳層的厚度介於0.08~0.10μm之間。 Finally, soak it in a 40℃ SLP-660 solution, control the pH value to 8.5±0.1, react for 250 seconds, take it out and wash it with water to complete the nickel metal layer/polyimide film composite film, and the thickness of the single-sided nickel layer is between 0.08~0.10μm.
銅層作業條件說明如下。將前述鎳金屬層/聚醯亞胺膜之複合膜先進行熱處理,條件為120℃烘烤24小時,再使用2wt%之硫酸清除鎳金屬層表面之氧化層,接著於電鍍槽中進行電解電鍍,電鍍液包含150g/L之硫酸、120g/L之硫酸銅及50ppm之氯離子,以及適量的電鍍添加劑如光澤劑、平坦劑等,電流密度4 ASD,平均鍍速約為0.5μm/min,控制通電時間即可按照需求於鎳層表面沉積厚度0.2~20μm的銅金屬層。 The copper layer working conditions are as follows. The nickel metal layer/polyimide film composite film is first heat treated at 120℃ for 24 hours, and then 2wt% sulfuric acid is used to remove the oxide layer on the surface of the nickel metal layer. Then, electrolytic plating is performed in the plating tank. The plating solution contains 150g/L sulfuric acid, 120g/L copper sulfate and 50ppm chlorine ions, as well as appropriate plating additives such as brighteners and flattening agents. The current density is 4 ASD, and the average plating speed is about 0.5μm/min. By controlling the power-on time, a copper metal layer with a thickness of 0.2~20μm can be deposited on the surface of the nickel layer as required.
<實施例2><Example 2>
聚醯亞胺膜之製作Preparation of polyimide membrane
將7.167克的對苯二胺(p-PDA,0.0663mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入17.551克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.165mole),攪拌反應1小時且溫度持續維持在25℃再添加18.762克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.088mole),攪拌至完全溶解,再緩慢添加12.047克的均苯四甲酸酐(PMDA,0.055mole),攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後再加入7.150克的BPDA並反應1小時後再加入4,4'-二氨基二苯醚13.272克(ODA,0.066mol),待其溶解完全後加入23.076克的BPDA(0.0784mol),攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 7.167 g of p-phenylenediamine (p-PDA, 0.0663 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 17.551 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.165 mole) was added. The mixture was stirred for 1 hour while the temperature was maintained at 25°C. 18.762 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.088 mole) was added. The mixture was stirred until it was completely dissolved. Then 12.047 g of pyromellitic anhydride (PMD A, 0.055 mole), stirred for 0.5 hours to dissolve and react, and the temperature of the solution was maintained at 25°C, then 7.150 grams of BPDA was added and reacted for 1 hour, and then 13.272 grams of 4,4'-diaminodiphenyl ether (ODA, 0.066 mol) was added, and after it was completely dissolved, 23.076 grams of BPDA (0.0784 mol) was added, and after stirring and reacting for 2 hours, a trace amount of BPDA was used to adjust the viscosity to 250,000±300,000 cps, and finally a copolymer polyamide solution with a solid content of 20% was obtained.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.15克的醋酸酐稀釋液與5.43克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫 泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.15 grams of acetic anhydride dilution and 5.43 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas. Apply the degassing solution to a glass plate and use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一 Preparation of laminate: Same as Example 1
<實施例3><Example 3>
聚醯亞胺膜之製作Preparation of polyimide membrane
將7.167克的對苯二胺(p-PDA,0.0663mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入18.526克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0552mole),攪拌反應1小時且溫度持續維持在25℃再添加18.762克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.0884mole),攪拌至完全溶解,再緩慢添加12.047克的均苯四甲酸酐(PMDA,0.0552mole)與8.45克的BPDA,攪拌1小時後再加入13.272克的4,4'-二氨基二苯醚(ODA,0.0663mole),待全部溶解後緩慢加入20.801克的BPDA(0.0707mole),攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 7.167 g of p-phenylenediamine (p-PDA, 0.0663 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 18.526 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0552 mole) was added. The mixture was stirred for 1 hour while the temperature was maintained at 25°C. 18.762 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.0884 mole) was added. The mixture was stirred until it was completely dissolved. Then 12.047 g of pyromellitic acid was slowly added. Anhydride (PMDA, 0.0552 mole) and 8.45 g BPDA, stir for 1 hour, then add 13.272 g 4,4'-diaminodiphenyl ether (ODA, 0.0663 mole), slowly add 20.801 g BPDA (0.0707 mole) after all dissolved, stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C, then use a small amount of BPDA to adjust the viscosity to 250,000±300,000 cps, and finally obtain a copolymer polyamide solution with a solid content of 20%.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.15克的醋酸酐 稀釋液與5.43克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行`脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. Stir for 10 minutes, then dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.15 grams of acetic anhydride dilution and 5.43 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas, apply the degassing solution to a glass plate, and then use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 20 minutes, then heat it up to 170℃ at a rate of 1.8℃/min and bake it for 20 minutes, then heat it up to 350℃ at a rate of 2.0℃/min and bake it for 20 minutes as the final treatment.
<實施例4><Example 4>
聚醯亞胺膜之製作Preparation of polyimide membrane
將7.228克的對苯二胺(p-PDA,0.0668mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入18.683克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0635mole),攪拌反應1小時且溫度持續維持在25℃再添加18.921克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.209mole),攪拌至完全溶解,再緩慢添加14.579克的均苯四甲酸酐(PMDA,0.0668mole),攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後再加入5.244克的BPDA並反應1小時後再加入4,4'-二氨基二苯醚13.384克(ODA,0.0668mol),待其溶解完全後加入20.977克的BPDA(0.0713mol),攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 7.228 g of p-phenylenediamine (p-PDA, 0.0668 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 18.683 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0635 mole) was added. The mixture was stirred for 1 hour while the temperature was maintained at 25°C. 18.921 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.209 mole) was added. The mixture was stirred until it was completely dissolved. Then 14.579 g of pyromellitic anhydride (PMD A, 0.0668 mole), stirred for 0.5 hours to dissolve and react, and the temperature of the solution was maintained at 25°C, then 5.244 grams of BPDA was added and reacted for 1 hour, and then 13.384 grams of 4,4'-diaminodiphenyl ether (ODA, 0.0668 mol) was added, and after it was completely dissolved, 20.977 grams of BPDA (0.0713 mol) was added, and after stirring and reacting for 2 hours, a trace amount of BPDA was used to adjust the viscosity to 250,000±300,000 cps, and finally a copolymer polyamide solution with a solid content of 20% was obtained.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二 甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.21克的醋酸酐稀釋液與5.48克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.21 grams of acetic anhydride dilution and 5.48 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas. Apply the degassing solution to a glass plate and use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一 Preparation of laminate: Same as Example 1
<實施例5><Example 5>
聚醯亞胺膜之製作:同實施例4 Preparation of polyimide film: Same as Example 4
積層板之製作:將聚醯亞胺膜進行表面電將改質,將聚醯亞胺膜固定於放捲軸並接上導膜,張力設定為2kg工作壓力為300mTorr,電源功率10kW,調整氮氣流量至2000sccm,電漿區的長度為11m,線速度為5.0m/min;製程結束後依序通入氧氣(O2)與氬氣(Ar)清潔腔體,破真空後關閉電源,接著開啟腔體取出聚醯亞胺膜,即可完成表面電漿改質。後續步驟同實施例一。 Preparation of laminate: Surface plasma modification of polyimide film is performed. The polyimide film is fixed on the unwinding reel and connected to the film guide. The tension is set to 2kg, the working pressure is 300mTorr, the power is 10kW, the nitrogen flow rate is adjusted to 2000sccm, the length of the plasma zone is 11m, and the line speed is 5.0m/min. After the process is completed, oxygen ( O2 ) and argon (Ar) are introduced in sequence to clean the chamber. After breaking the vacuum, the power is turned off, and then the chamber is opened to take out the polyimide film to complete the surface plasma modification. The subsequent steps are the same as those in Example 1.
<實施例6><Example 6>
聚醯亞胺膜的製作 Preparation of polyimide membrane
將7.290克的對苯二胺(p-PDA,0.0674mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入18.842克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.064mole),攪拌反應1小時且溫度持續維持在25℃再添加19.082克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.0899mole),攪拌至完全溶解,再緩慢添加17.155克的均苯四甲酸酐(PMDA,0.0786mole),攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後再加入1.983克的BPDA並反應0.5小時後再加入ODA 13.499克(ODA,0.0674mol),待其溶解完全後加入21.156克的BPDA(0.0719mol),攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 7.290 g of p-phenylenediamine (p-PDA, 0.0674 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After all the DMAc was dissolved, 18.842 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.064 mole) was added. The mixture was stirred for 1 hour while the temperature was maintained at 25°C. Then 19.082 g of 2,2'- Dimethyl-4,4'-diaminobenzidine (m-TB, 0.0899 mole), stir until completely dissolved, then slowly add 17.155 grams of pyromellitic anhydride (PMDA, 0.0786 mole), stir for 0.5 hours to dissolve and react, and the temperature of the solution is maintained at 25°C, then add 1.983 grams of BPDA and react for 0.5 hours, then add 13.499 grams of ODA (ODA, 0.0674 mol), wait for it to dissolve completely, then add 21.156 grams of BPDA (0.0719 mol), stir for 2 hours, and use a small amount of BPDA to adjust the viscosity to 250,000±300,000 cps, and finally obtain a copolymer polyamide solution with a solid content of 20%.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.27克的醋酸酐稀釋液與5.52克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.27 grams of acetic anhydride dilution and 5.52 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas, apply the degassing solution to a glass plate, and then use a scraper with a gap of 600μm to apply. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
<實施例7><Example 7>
聚醯亞胺膜的製作:同實施例6 Preparation of polyimide film: Same as Example 6
積層板之製作:將聚醯亞胺膜進行表面電將改質,將聚醯亞胺膜固定於放捲軸並接上導膜,張力設定為2kg工作壓力為300mTorr,電源功率10kW,調整氮氣流量至2000sccm,電漿區的長度為11m,線速度為5.0m/min;製程結束後依序通入氧氣(O2)與氬氣(Ar)清潔腔體,破真空後關閉電源,接著開啟腔體取出聚醯亞胺膜,即可完成表面電漿改質。後續步驟同實施例一。後續步驟同實施例一。 Preparation of laminate: Surface plasma modification of polyimide film, fix the polyimide film on the unwinding reel and connect it to the film guide, set the tension to 2kg, the working pressure to 300mTorr, the power supply to 10kW, adjust the nitrogen flow to 2000sccm, the length of the plasma zone to 11m, and the line speed to 5.0m/min; after the process is completed, oxygen ( O2 ) and argon (Ar) are introduced into the chamber to clean it, and the power supply is turned off after breaking the vacuum, and then the chamber is opened to take out the polyimide film, and the surface plasma modification is completed. The subsequent steps are the same as in Example 1. The subsequent steps are the same as in Example 1.
<實施例8><Example 8>
聚醯亞胺膜的製作:同實施例6 Preparation of polyimide film: Same as Example 6
積層板之製作:將聚醯亞胺膜進行表面電將改質,將聚醯亞胺膜固定於放捲軸並接上導膜,張力設定為2kg工作壓力為300mTorr,電源功率10kW,調整氬氣(Ar)流量至2000sccm,電漿區的長度為11m,線速度為5.0m/min;製程結束後依序通入氧氣(O2)與氬氣(Ar)清潔腔體,破真空後關閉電源,接著開啟腔體取出聚醯亞胺膜,即可完成表面電漿改質。後續步驟同實施例一。 Preparation of laminate: Surface plasma modification of polyimide film is performed. The polyimide film is fixed on the unwinding reel and connected to the film guide. The tension is set to 2kg, the working pressure is 300mTorr, the power is 10kW, the argon (Ar) flow rate is adjusted to 2000sccm, the length of the plasma zone is 11m, and the line speed is 5.0m/min. After the process is completed, oxygen ( O2 ) and argon (Ar) are introduced in sequence to clean the chamber. After breaking the vacuum, the power is turned off, and then the chamber is opened to take out the polyimide film to complete the surface plasma modification. The subsequent steps are the same as those in Example 1.
<實施例9><Example 9>
聚醯亞胺膜的製作 Preparation of polyimide membrane
將9.925克的對苯二胺(p-PDA,0.0918mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入24.304克的 3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0826mole),攪拌反應2小時且溫度持續維持在25℃再添加19.486克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.0918mole),攪拌至完全溶解,再緩慢添加17.517克的均苯四甲酸酐(PMDA,0.0803mole),攪拌1小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後再加入ODA 9.189克(ODA,0.0459mol),待其溶解完全後加入18.566克的BPDA(0.0631mol),攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 9.925 g of p-phenylenediamine (p-PDA, 0.0918 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 24.304 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0826 mole) was added. The mixture was stirred for 2 hours and the temperature was maintained at 25°C. Then 19.486 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.0918 mole) was added and stirred until it was completely dissolved. Then 17.517 g of pyromellitic anhydride (PMDA, 0.0803 mole) was slowly added and stirred for 1 hour until it was dissolved and reacted. The temperature of the solution was maintained at 25°C. Then ODA was added. 9.189g (ODA, 0.0459mol), after it is completely dissolved, add 18.566g BPDA (0.0631mol), stir and react for 2 hours, then use a small amount of BPDA to adjust the viscosity to 250,000±300,000cps, and finally obtain a copolymer polyamide solution with a solid content of 20%.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.42克的醋酸酐稀釋液與5.64克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.42 grams of acetic anhydride dilution and 5.64 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas, apply the degassing solution to a glass plate, and then use a scraper with a gap of 600μm to apply. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
<比較例1><Comparison Example 1>
聚醯亞胺膜的製作Preparation of polyimide membrane
將11.090克的對苯二胺(p-PDA,0.1025mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入24.138克的 3,3',4,4'-聯苯四羧酸二酐(BPDA,0.082mole),攪拌反應1小時且溫度持續維持在25℃再添加19.352克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.0912mole),攪拌至完全溶解,再緩慢添加12.427克的均苯四甲酸酐(PMDA,0.057mole),攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後再加入4,4'-二氨基二苯醚6.845克(ODA,0.0342mol),待其溶解完全後加入25.143克的BPDA(0.0855mol),攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 11.090 g of p-phenylenediamine (p-PDA, 0.1025 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 24.138 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.082 mole) was added. The mixture was stirred for 1 hour while the temperature was maintained at 25°C. 19.352 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.0912 mole) was added. The mixture was stirred until it was completely dissolved. Then 12.427 g of 6.845 g of 4,4'-diaminodiphenyl ether (ODA, 0.0342 mol) was added, and after it was completely dissolved, 25.143 g of BPDA (0.0855 mol) was added. After stirring for 2 hours, a small amount of BPDA was used to adjust the viscosity to 250,000±300,000 cps. Finally, a copolymer polyamide solution with a solid content of 20% was obtained.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.37克的醋酸酐稀釋液與5.6克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.37 grams of acetic anhydride dilution and 5.6 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas, apply the degassing solution to a glass plate, and then use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
<比較例2><Comparison Example 2>
聚醯亞胺膜的製作Preparation of polyimide membrane
將7.167克的對苯二胺(p-PDA,0.0663mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入11.565克的1,2,4,5-苯四甲酸酐(PMDA,0.0530mole),攪拌反應1小時且溫度持續維持在25℃再添加18.762克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.0884mole),攪拌至完全溶解,再緩慢添加0.482克的均苯四甲酸酐(PMDA,0.0786mole),以及20.151克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0685mole)攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後再加入4,4'-二氨基二苯醚13.272克(ODA,0.00.0663mol),待其溶解完全後加入27.626克的BPDA(0.0939mol),攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 7.167 g of p-phenylenediamine (p-PDA, 0.0663 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 11.565 g of 1,2,4,5-benzenetetracarboxylic anhydride (PMDA, 0.0530 mole) was added. The mixture was stirred for 1 hour while the temperature was maintained at 25°C. Then 18.762 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.0884 mole) was added. The mixture was stirred until it was completely dissolved. Then 0.482 g of pyromellitic anhydride (PMDA, 0.0786 mole) was slowly added. 20.151g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0685mole) was stirred for 0.5 hours to dissolve and react, and the temperature of the solution was maintained at 25°C. Then 13.272g of 4,4'-diaminodiphenyl ether (ODA, 0.00.0663mol) was added. After it was completely dissolved, 27.626g of BPDA (0.0939mol) was added. After stirring for 2 hours, a small amount of BPDA was used to adjust the viscosity to 250,000±300,000cps. Finally, a copolymer polyamide solution with a solid content of 20% was obtained.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.15克的醋酸酐稀釋液與5.43克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘分鐘做為最終處理。 Take out 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.15 grams of acetic anhydride dilution and 5.43 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas, apply the degassing solution to a glass plate, and then use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
<比較例3><Comparison Example 3>
聚醯亞胺膜的製作Preparation of polyimide membrane
將13.272克的4,4'-二氨基二苯醚(ODA,0.0663mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入11.565克的均苯四甲酸酐(PMDA,0.0393mole),攪拌反應1小時且溫度持續維持在25℃再添加18.762克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.0884mole),攪拌至完全溶解,再緩慢添加0.482克的均苯四甲酸酐(PMDA,0.0022mole),以及20.801克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0707mole)攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後再加入對苯二胺7.167克(PDA,0.0663mol),待其溶解完全後加入26.976克的BPDA(0.0917mol),攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 13.272 g of 4,4'-diaminodiphenyl ether (ODA, 0.0663 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 11.565 g of pyromellitic anhydride (PMDA, 0.0393 mole) was added. The mixture was stirred for 1 hour while the temperature was maintained at 25°C. 18.762 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.0884 mole) was added. The mixture was stirred until it was completely dissolved. Then 0.482 g of pyromellitic anhydride (PMDA, 0.0022 mole) was slowly added. le), and 20.801 grams of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0707 mole) were stirred for 0.5 hours to dissolve and react, and the temperature of the solution was maintained at 25°C, and then 7.167 grams of p-phenylenediamine (PDA, 0.0663 mol) was added. After it was completely dissolved, 26.976 grams of BPDA (0.0917 mol) was added. After stirring for 2 hours, a small amount of BPDA was used to adjust the viscosity to 250,000±300,000cps, and finally a copolymer polyamide solution with a solid content of 20% was obtained.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.15克的醋酸酐稀釋液與5.43克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以 5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.15 grams of acetic anhydride dilution and 5.43 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas, apply the degassing solution to a glass plate, and then use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
<比較例4><Comparison Example 4>
聚醯亞胺膜的製作Preparation of polyimide membrane
將13.272克的4,4'-二氨基二苯醚(ODA,0.0663mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入15.601克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0530mole),攪拌反應1小時且溫度持續維持在25℃再添加18.762克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.0884mole),攪拌至完全溶解,再緩慢添加12.047克的均苯四甲酸酐(PMDA,0.0552mole),以及4.550克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0155mole)攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後再加入對苯二胺7.167克(PDA,0.0552mol),待其溶解完全後加入27.626克的BPDA(0.0939mol),攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 13.272 g of 4,4'-diaminodiphenyl ether (ODA, 0.0663 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 15.601 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0530 mole) was added. The mixture was stirred for 1 hour while the temperature was maintained at 25°C. 18.762 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.0884 mole) was added. The mixture was stirred until it was completely dissolved. Then 12.047 g of pyromellitic anhydride (PMDA, 0.0530 mole) was slowly added. 0552mole), and 4.550g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0155mole) were stirred for 0.5 hours to dissolve and react, and the temperature of the solution was maintained at 25°C, then 7.167g of p-phenylenediamine (PDA, 0.0552mol) was added, and after it was completely dissolved, 27.626g of BPDA (0.0939mol) was added, and after stirring for 2 hours, a small amount of BPDA was used to adjust the viscosity to 250,000±300,000cps, and finally a copolymer polyamide solution with a solid content of 20% was obtained.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.15克的醋酸酐稀釋液與5.43克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫 泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.15 grams of acetic anhydride dilution and 5.43 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas. Apply the degassing solution to a glass plate and use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
<比較例5><Comparison Example 5>
聚醯亞胺膜的製作Preparation of polyimide membrane
將12.985克的苯二胺(PDA,0.120mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入31.797克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.1081mole),攪拌反應2小時且溫度持續維持在25℃再添加25.493克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.0120mole),攪拌至完全溶解,再緩慢添加26.192克的均苯四甲酸酐(PMDA,0.120mole),以及2.473克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0084mole)攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 12.985 g of phenylenediamine (PDA, 0.120 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 31.797 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.1081 mole) was added. The mixture was stirred for 2 hours while the temperature was maintained at 25°C. 25.493 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.0120 mole) was added and stirred until it was completely dissolved. , then slowly add 26.192 grams of pyromellitic anhydride (PMDA, 0.120 mole) and 2.473 grams of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0084 mole) and stir for 0.5 hours to dissolve and react, and the temperature of the solution is maintained at 25°C. After stirring for 2 hours, use a small amount of BPDA to adjust the viscosity to 250,000±300,000cps, and finally obtain a copolymer polyamide solution with a solid content of 20%.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.77克的醋酸酐稀釋液與5.90克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫 泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.77 grams of acetic anhydride dilution and 5.90 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas. Apply the degassing solution to a glass plate and use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
<比較例6><Comparison Example 6>
聚醯亞胺膜的製作Preparation of polyimide membrane
將25.493克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.120mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入31.797克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.1081mole),攪拌反應2小時且溫度持續維持在25℃再添加12.985克的對苯二胺(PDA,0.120mole),攪拌至完全溶解,再緩慢添加26.192克的均苯四甲酸酐(PMDA,0.120mole),以及2.473克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0084mole)攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 25.493 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.120 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 31.797 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.1081 mole) was added. The mixture was stirred for 2 hours while the temperature was maintained at 25°C. 12.985 g of p-phenylenediamine (PDA, 0.120 mole) was added and stirred until it was completely dissolved. , then slowly add 26.192 grams of pyromellitic anhydride (PMDA, 0.120 mole) and 2.473 grams of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0084 mole) and stir for 0.5 hours to dissolve and react, and the temperature of the solution is maintained at 25°C. After stirring for 2 hours, use a small amount of BPDA to adjust the viscosity to 250,000±300,000cps, and finally obtain a copolymer polyamide solution with a solid content of 20%.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.77克的醋酸酐稀釋液與5.90克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫 泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.77 grams of acetic anhydride dilution and 5.90 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas. Apply the degassing solution to a glass plate and use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
<比較例7><Comparison Example 7>
聚醯亞胺膜的製作Preparation of polyimide membrane
將22.954克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.108mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入28.631克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.108mole),攪拌反應2小時且溫度持續維持在25℃再添加21.650克的4,4'-二氨基二苯醚(ODA,0.0108mole),攪拌至完全溶解,再緩慢添加23.584克的均苯四甲酸酐(PMDA,0.108mole),以及2.227克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0076mole)攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,攪拌反應2小時後使用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 22.954 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.108 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After all the DMAc was dissolved, 28.631 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.108 mole) was added. The mixture was stirred for 2 hours while the temperature was maintained at 25°C. 21.650 g of 4,4'-diaminodiphenyl ether (ODA, 0.0108 mole) was added and stirred until the mixture was completely dissolved. After the mixture is completely dissolved, 23.584 g of pyromellitic anhydride (PMDA, 0.108 mole) and 2.227 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0076 mole) are slowly added and stirred for 0.5 hours to allow them to dissolve and react. The temperature of the solution is maintained at 25°C. After stirring and reacting for 2 hours, a small amount of BPDA is used to adjust the viscosity to 250,000±300,000 cps. Finally, a copolymer polyamide solution with a solid content of 20% is obtained.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.99克的醋酸酐稀釋液與5.32克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫 泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 6.99 grams of acetic anhydride dilution and 5.32 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas. Apply the degassing solution to a glass plate and use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
<比較例8><Comparison Example 8>
聚醯亞胺膜的製作Preparation of polyimide membrane
將22.954克的2,2'-二甲基-4,4'-二氨基聯苯(PDA,0.0449mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入11.901克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0404mole),攪拌反應1小時且溫度持續維持在25℃再添加19.082克的2,2'-二甲基-4,4'-二氨基聯苯(m-TB,0.0899mole)與2.430克的對苯二胺(0.0225mole),攪拌至完全溶解,再緩慢添加17.155克的均苯四甲酸酐(PMDA,0.0786mole),以及6.611克的3,3',4,4'-聯苯四羧酸二酐(BPDA,0.0225mole)攪拌1小時反應後再加入13.499克的4,4'-二氨基二苯醚(ODA,0.0674mole),待其溶解完全後加入23.470克的BPDA(0.0798mole),攪拌反應2小時並且溶液的溫度維持為25℃,最後用微量的BPDA將黏度調整至250,000±300,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 22.954 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (PDA, 0.0449 mole) was added to 400 g of N,N-dimethylacetamide (DMAc). After it was completely dissolved, 11.901 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0404 mole) was added. The mixture was stirred for 1 hour while the temperature was maintained at 25°C. 19.082 g of 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB, 0.0899 mole) and 2.430 g of p-phenylenediamine (0.0225 mole) were added. The mixture was stirred until it was completely dissolved. 17.155 g of DMAc was added slowly. 6.611 grams of 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA, 0.0225 mole) were stirred for 1 hour and then 13.499 grams of 4,4'-diaminodiphenyl ether (ODA, 0.0674 mole) were added. After the ODA was completely dissolved, 23.470 grams of BPDA (0.0798 mole) were added. The mixture was stirred for 2 hours and the temperature of the solution was maintained at 25°C. Finally, a small amount of BPDA was used to adjust the viscosity to 250,000±300,000 cps. Finally, a copolymer polyamide solution with a solid content of 20% was obtained.
在上述共聚聚醯胺酸溶液中取出33克加入17克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至13.2%,攪拌10分鐘後將 醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加7.27克的醋酸酐稀釋液與5.52克的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用600μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤40分鐘,再以3.6℃/min的速度升溫至170℃烘烤10分鐘後,再以5.9℃/min的速度升溫至260℃烘烤10分鐘,最後以8.13℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 33 grams of the above copolymer polyamide solution and add 17 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 13.2%. After stirring for 10 minutes, dilute acetic anhydride and DMAc at a weight ratio of 5:1, and then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1. Then add 7.27 grams of acetic anhydride dilution and 5.52 grams of 3-methylpyridine dilution. After uniform stirring, use a centrifugal degasser to degas. Apply the degassing solution to a glass plate and use a scraper with a gap of 600μm to apply it. Place the coated sample in an oven at 80℃ for 40 minutes, then heat it up to 170℃ at a rate of 3.6℃/min for 10 minutes, then heat it up to 260℃ at a rate of 5.9℃/min for 10 minutes, and finally heat it up to 350℃ at a rate of 8.13℃/min for 20 minutes as the final treatment.
積層板之製作:同實施例一。 Preparation of laminate: Same as in Example 1.
實施例\與比較例表格 Implementation examples and comparison examples table
上述特定實施例之內容係為了詳細說明本發明,然而,該等實施例係僅用於說明,並非意欲限制本發明。熟習本領域之技藝者可理解,在不悖離後附申請專利範圍所界定之範疇下針對本發明所進行之各種變化或修改係落入本發明之一部分。 The contents of the above specific embodiments are for the purpose of describing the present invention in detail. However, such embodiments are for illustration only and are not intended to limit the present invention. Those skilled in the art can understand that various changes or modifications made to the present invention without departing from the scope defined by the scope of the attached patent application are part of the present invention.
Claims (6)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112129213A TWI864938B (en) | 2023-08-03 | 2023-08-03 | Polyimide film and laminate made of the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112129213A TWI864938B (en) | 2023-08-03 | 2023-08-03 | Polyimide film and laminate made of the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI864938B true TWI864938B (en) | 2024-12-01 |
| TW202506826A TW202506826A (en) | 2025-02-16 |
Family
ID=94769073
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112129213A TWI864938B (en) | 2023-08-03 | 2023-08-03 | Polyimide film and laminate made of the same |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI864938B (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202208513A (en) * | 2020-07-17 | 2022-03-01 | 日商鐘化股份有限公司 | Multilayer Polyimide Film |
| CN114763436A (en) * | 2021-01-15 | 2022-07-19 | 达迈科技股份有限公司 | Polyimide film with low dielectric loss |
-
2023
- 2023-08-03 TW TW112129213A patent/TWI864938B/en active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202208513A (en) * | 2020-07-17 | 2022-03-01 | 日商鐘化股份有限公司 | Multilayer Polyimide Film |
| CN114763436A (en) * | 2021-01-15 | 2022-07-19 | 达迈科技股份有限公司 | Polyimide film with low dielectric loss |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202506826A (en) | 2025-02-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101232995B (en) | Metal-coated polyimide film | |
| JP2009067859A (en) | Polyimide film and copper-clad laminate based thereon | |
| TWI897883B (en) | Polyimide film, metal-clad laminate and circuit substrate | |
| CN102741330A (en) | Method for preparing polyimide film and polyimide film | |
| CN101695222A (en) | Preparation method of non-curling high-adhesiveness glue-free flexible copper-clad plate | |
| TWI864938B (en) | Polyimide film and laminate made of the same | |
| JP2009006542A (en) | Method for producing polyimide film | |
| JP2008188843A (en) | Multilayer film of polyimide precursor solution, multilayer polyimide film, single sided metal-clad laminated sheet and manufacturing method of multilayer polyimide film | |
| JP4901509B2 (en) | Multilayer film of polyimide precursor solution, multilayer polyimide film, single-sided metal-clad laminate, and method for producing multilayer polyimide film | |
| JP5291008B2 (en) | Method for manufacturing circuit wiring board | |
| JP2007031622A (en) | Polyimide resin and film with conductor using the same | |
| JP2006278371A (en) | Method for producing polyimide-metal layer laminate and polyimide-metal layer laminate obtained by this method | |
| TWI877695B (en) | Polyimide film, manufacturing method of the same, flexible metal foil laminate and electronic components including the same | |
| JP2011216535A (en) | Composite glass epoxy substrate and metal multilayer substrate using the same | |
| JP2018058923A (en) | Polyimide film | |
| JP4153704B2 (en) | Laminate and printed wiring board manufacturing method | |
| CN119463491A (en) | Polyimide film and laminate made of the same | |
| TWI792818B (en) | Alkali-resistant black matte polyimide film | |
| JP2761655B2 (en) | Manufacturing method of flexible printed circuit board | |
| JP2003264373A (en) | Laminates for printed wiring boards | |
| JP2003118054A (en) | Laminates and multilayer printed wiring boards | |
| JP2002322276A (en) | New thermoplastic polyimide resin | |
| JP2514313B2 (en) | Flexible copper clad circuit board | |
| JP2008258293A (en) | Patterned conductor layer forming method, circuit board manufacturing method, and circuit board | |
| JP2000289167A (en) | Base film and plating film for chemical plating |