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TWI863654B - Wafer holding device having function of positioning wafer - Google Patents

Wafer holding device having function of positioning wafer Download PDF

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Publication number
TWI863654B
TWI863654B TW112141034A TW112141034A TWI863654B TW I863654 B TWI863654 B TW I863654B TW 112141034 A TW112141034 A TW 112141034A TW 112141034 A TW112141034 A TW 112141034A TW I863654 B TWI863654 B TW I863654B
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Taiwan
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wafer
linear actuator
carrier
positioning function
positioning
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TW112141034A
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Chinese (zh)
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TW202518622A (en
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張容華
郭大豪
張茂展
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天虹科技股份有限公司
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Priority to TW112141034A priority Critical patent/TWI863654B/en
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Publication of TWI863654B publication Critical patent/TWI863654B/en
Publication of TW202518622A publication Critical patent/TW202518622A/en

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  • Jigs For Machine Tools (AREA)

Abstract

A wafer holding device having function of positioning wafer, configured to fix a wafer thereon and position the wafer having a positioning structure at an edge of the wafer. The wafer holding device includes a base, a holder plate, a plurality of lifting pins, a linear actuator, and a positioning member. The holder plate is disposed on the base. The holder plate includes an upper surface and a lower surface. The upper surface is provided for the wafer to be placed thereon. And the upper surface is provided with an adsorption structure for adsorbing and fixing the wafer. The lifting pins are disposed on the upper surface in a protruding manner, and each of the lifting pins is disposed on the holder plate at intervals around the holder plate with respect to a predetermined datum center on the holder plate. The linear actuator is disposed on the base, and an actuating direction of the linear actuator is parallel to the upper surface. The positioning member is configured to be driven by the linear actuator to move in the actuating direction to contact and push against the positioning structure of the wafer.

Description

具有晶圓片定位功能的晶圓片承載裝置Wafer carrier with wafer positioning function

本發明有關於晶圓片的承載與定位,特別是關於一種具有晶圓片定位功能的晶圓片承載裝置。 The present invention relates to the carrying and positioning of wafers, and in particular to a wafer carrying device with a wafer positioning function.

現有的晶圓片製程持續地以多道工序晶圓片表面進行加工,持續進行蝕刻作業或堆疊晶圓片圖案。每一道工序的蝕刻或堆疊都必須落在相同元件的預定位置上,才能完成元件的製作。 The existing wafer manufacturing process continuously processes the wafer surface with multiple steps, continuously etching or stacking wafer patterns. Each step of etching or stacking must fall on the predetermined position of the same component to complete the manufacturing of the component.

上述工序會在不同的晶圓片吸盤(wafer chuck)執行。當晶圓片移轉至一個晶圓片吸盤時,必須進行晶圓片的定位,在晶圓片吸盤上執行的加工作業才會落在晶圓片上正確的位置。 The above processes are performed on different wafer chucks. When the wafer is transferred to a wafer chuck, the wafer must be positioned so that the processing performed on the wafer chuck will fall on the correct position on the wafer.

現有的晶圓片定位,大多以光學偵測或影像辨識方式執行。一般而言,晶圓片上會先設置定位結構或是圖案。以定位結構而言,常見的作法是在晶圓片邊緣設置一個平邊(flat edge)或缺口(notch),透過光學偵測或影像辨識平邊/缺口位置,而透過旋轉機構在晶圓片的垂直軸上轉動晶圓片,讓平邊/缺口位於正確位置。 Most of the existing wafer positioning is performed by optical detection or image recognition. Generally speaking, a positioning structure or pattern is set on the wafer first. As for the positioning structure, the common practice is to set a flat edge or notch on the edge of the wafer, and use optical detection or image recognition to identify the position of the flat edge/notch, and use a rotating mechanism to rotate the wafer on the vertical axis of the wafer so that the flat edge/notch is located in the correct position.

在上述的定位方式中,必須設置旋轉機構,並且定位的精準度取決於光學偵測或影像辨識方式辨識平邊/缺口的精確度。不但使得晶圓片吸盤裝置的機構變得複雜。高精確度的辨識與旋轉,也會提升設備成本以及增加定位所需要時間。 In the above positioning method, a rotation mechanism must be set up, and the accuracy of positioning depends on the accuracy of optical detection or image recognition to identify the flat edge/notch. Not only does it make the mechanism of the wafer suction cup device complicated. High-precision identification and rotation will also increase equipment costs and the time required for positioning.

鑑於上述技術問題,本發明提出一種具有晶圓片定位功能的晶圓片承載裝置,可快速地進行晶圓片之定位。 In view of the above technical problems, the present invention proposes a wafer carrier with a wafer positioning function, which can quickly position the wafer.

本發明提出一種具有晶圓片定位功能的晶圓片承載裝置,用以固定一晶圓片於其上,並且可對晶圓片進行定位,並且晶圓片的邊緣具有一定位結構,晶圓片承載裝置包含一基座、一承載盤、多個頂針、一線性致動器以及一對準器。承載盤設置於基座上。承載盤具有一上表面以及一下表面;上表面用以供晶圓片被放置於其上,且上表面設置有吸附結構,用於吸附並固定晶圓片。頂針突出地設置於上表面,各頂針分別以承載盤上的一預設基準中心為基準環繞間隔地設置於承載盤上。線性致動器設置於基座上,且線性致動器的一致動方向平行於上表面。對準器可被線性致動器驅動,沿著致動方向移動以接觸並推抵晶圓片的定位結構。 The present invention proposes a wafer carrier with a wafer positioning function, which is used to fix a wafer thereon and can position the wafer, and the edge of the wafer has a positioning structure. The wafer carrier includes a base, a carrier plate, a plurality of ejector pins, a linear actuator and an aligner. The carrier plate is arranged on the base. The carrier plate has an upper surface and a lower surface; the upper surface is used for the wafer to be placed thereon, and the upper surface is provided with an adsorption structure for adsorbing and fixing the wafer. The ejector pins are protrudingly arranged on the upper surface, and each ejector pin is arranged on the carrier plate at intervals around a preset reference center on the carrier plate. The linear actuator is arranged on the base, and a uniform actuation direction of the linear actuator is parallel to the upper surface. The aligner can be driven by a linear actuator and moved along the actuation direction to contact and push against the positioning structure of the wafer.

在至少一實施例中,吸附結構為一真空吸附孔以及連通真空吸附孔的導氣槽,真空吸附孔連通上表面以及下表面。 In at least one embodiment, the adsorption structure is a vacuum adsorption hole and an air guide groove connected to the vacuum adsorption hole, and the vacuum adsorption hole connects the upper surface and the lower surface.

在至少一實施例中,具有晶圓片定位功能的晶圓片承載裝置更包含一抽氣泵,並且真空吸附孔於下表面連接抽氣泵。 In at least one embodiment, the wafer carrier with wafer positioning function further includes an air pump, and the vacuum adsorption hole is connected to the air pump on the lower surface.

在至少一實施例中,具有晶圓片定位功能的晶圓片承載裝置更包含多個升降桿,可升降地設置於承載盤;其中,升降桿可下降而埋設於承載盤中,或是上升而突出於上表面。 In at least one embodiment, the wafer carrier with wafer positioning function further includes a plurality of lifting rods that can be lifted and lowered on the carrier plate; wherein the lifting rods can be lowered and buried in the carrier plate, or raised and protruded from the upper surface.

在至少一實施例中,線性致動器透過一支架連接於基座,且線性致動器具有至少一線性滑軌單元、一移動件以及一導螺桿。移動件可移動地結合於至少一線性滑軌單元,且移動件的一移動方向平行於線性致動器的致動方向。導螺桿的一端可轉動地固定於支架,另一端穿過移動件的一中空空間而可轉動地固定於移動件。 In at least one embodiment, the linear actuator is connected to the base through a bracket, and the linear actuator has at least one linear slide rail unit, a moving member, and a lead screw. The moving member is movably coupled to the at least one linear slide rail unit, and a moving direction of the moving member is parallel to the actuation direction of the linear actuator. One end of the lead screw is rotatably fixed to the bracket, and the other end passes through a hollow space of the moving member and is rotatably fixed to the moving member.

在至少一實施例中,線性致動器還具有一壓縮彈簧,套設於導螺桿,壓縮彈簧的一端頂抵於移動件,另一端連接於至少一線性滑軌單元。 In at least one embodiment, the linear actuator also has a compression spring, which is sleeved on the lead screw, one end of the compression spring presses against the moving part, and the other end is connected to at least one linear slide rail unit.

在至少一實施例中,線性致動器還具有一壓縮彈簧,壓縮彈簧套設於導螺桿,壓縮彈簧的一端頂抵於移動件,另一端頂抵於支架。 In at least one embodiment, the linear actuator also has a compression spring, which is sleeved on the lead screw, with one end of the compression spring abutting against the moving part and the other end abutting against the bracket.

在至少一實施例中,對準器的前端具有一定位平面。 In at least one embodiment, the front end of the aligner has a positioning plane.

在至少一實施例中,對準器是平板狀,垂直於上表面,並且朝向預設基準中心延伸。 In at least one embodiment, the aligner is in the form of a flat plate, perpendicular to the upper surface, and extending toward a preset reference center.

在至少一實施例中,承載盤還配置有一槽溝,槽溝位於上表面且連通承載盤的邊緣;對準器與線性致動器的局部是可移動地設置於槽溝中。 In at least one embodiment, the carrier plate is further provided with a groove, which is located on the upper surface and connected to the edge of the carrier plate; the aligner and the part of the linear actuator are movably disposed in the groove.

本發明提出具有晶圓片定位功能的晶圓片承載裝置,是透過定位結構、對準器以及頂針的配合,達成晶圓片的定位。定位過程不涉及晶圓片位置/定位結構的偵測、識別,大幅簡化定位機制的複雜度。並且本發明可達成快速定位,並且容易提升定位的精確性而不影響定位作業執行速率。 The present invention proposes a wafer carrier with a wafer positioning function, which achieves wafer positioning through the cooperation of a positioning structure, an aligner, and an ejector pin. The positioning process does not involve the detection and identification of the wafer position/positioning structure, which greatly simplifies the complexity of the positioning mechanism. In addition, the present invention can achieve rapid positioning and easily improve the accuracy of positioning without affecting the execution rate of the positioning operation.

100:晶圓片承載裝置 100: Wafer carrier

110:基座 110: Base

112:底部 112: Bottom

114:側壁 114: Side wall

120:承載盤 120: Carrier plate

121:槽孔 121: Slot

122:上表面 122: Upper surface

123:槽溝 123: Groove

123a:延伸部 123a: Extension

124:下表面 124: Lower surface

126:吸附結構 126: Adsorption structure

126a:真空吸附孔 126a: Vacuum adsorption hole

126b:導氣溝 126b: air channel

128:升降孔 128: Lifting hole

130:頂針 130: Top needle

132:平面凸輪 132: Flat cam

132a:外頂點 132a: Outer vertex

132b:內凹點 132b: Indentation

134:彈性件 134: Elastic parts

136:伺服馬達 136:Servo motor

140:線性致動器 140: Linear actuator

142:線性滑軌單元 142: Linear slide unit

142a:滑塊 142a: Slider

142b:軌道 142b: Track

144:移動件 144: Moving parts

146:導螺桿 146: Lead screw

148:壓縮彈簧 148:Compression spring

150:對準器 150: Alignment device

152:定位平面 152: Positioning plane

160:升降桿 160: Lifting rod

170:固定塊 170:Fixed block

180:支架 180: Bracket

190:升降單元 190: Lifting unit

200:晶圓片 200: Wafer

212:平邊 212: Flat edge

214:缺口 214: Gap

300:抽氣泵 300: Air pump

C1:預設基準中心 C1: Default reference center

C2:晶圓片中心 C2: Wafer center

R1:最大外廓 R1: Maximum outer contour

R2:最小外廓 R2: Minimum outline

圖1是本發明第一實施例中,具有晶圓片定位功能的晶圓片承載裝置的俯視圖。 FIG1 is a top view of a wafer carrier having a wafer positioning function in the first embodiment of the present invention.

圖2是本發明第一實施例中,具有晶圓片定位功能的晶圓片承載裝置的局部立體圖。 Figure 2 is a partial three-dimensional diagram of a wafer carrier having a wafer positioning function in the first embodiment of the present invention.

圖3是本發明第一實施例中,線性致動器的俯視圖,顯示局部剖面。 Figure 3 is a top view of the linear actuator in the first embodiment of the present invention, showing a partial cross section.

圖4是本發明第一實施例中,部分元件的俯視圖。 Figure 4 is a top view of some components in the first embodiment of the present invention.

圖5是本發明第一實施例中,具有晶圓片定位功能的晶圓片承載裝置的局部剖視圖。 FIG5 is a partial cross-sectional view of a wafer carrier having a wafer positioning function in the first embodiment of the present invention.

圖6是本發明第一實施例中,部分元件的剖視圖。 Figure 6 is a cross-sectional view of some components in the first embodiment of the present invention.

圖7是本發明第一實施例中,部分元件的俯視圖。 Figure 7 is a top view of some components in the first embodiment of the present invention.

圖8是本發明第一實施例中,部分元件的剖視圖。 Figure 8 is a cross-sectional view of some components in the first embodiment of the present invention.

圖9是本發明第一實施例中,部分元件的俯視圖。 Figure 9 is a top view of some components in the first embodiment of the present invention.

圖10與圖11是本發明實施例中,承載盤的底視圖,揭露一種頂針的驅動機構。 Figures 10 and 11 are bottom views of the carrier plate in an embodiment of the present invention, revealing a driving mechanism for the ejector pin.

圖12是本發明實施例中,平面凸輪的最大外廓與最小外廓的示意圖。 Figure 12 is a schematic diagram of the maximum and minimum outer contours of the planar cam in an embodiment of the present invention.

圖13是本發明第二實施例中,線性致動器的俯視圖,顯示局部剖面。 Figure 13 is a top view of the linear actuator in the second embodiment of the present invention, showing a partial cross section.

圖14是本發明第二實施例中,部分元件的剖視圖。 Figure 14 is a cross-sectional view of some components in the second embodiment of the present invention.

圖15是本發明第二實施例中,部分元件的俯視圖。 Figure 15 is a top view of some components in the second embodiment of the present invention.

圖16是本發明第二實施例中,部分元件的剖視圖。 Figure 16 is a cross-sectional view of some components in the second embodiment of the present invention.

圖17是本發明第二實施例中,部分元件的俯視圖。 Figure 17 is a top view of some components in the second embodiment of the present invention.

請參閱圖1、圖2、圖3與圖4所示,為本發明第一實施例中具有晶圓片定位功能的晶圓片承載裝置100。晶圓片承載裝置100用以固定一晶圓片200於其上,並且可對晶圓片200進行定位。所述晶圓片200的邊緣具有一定位結構,定位結構可為但不限定於平邊212(flat edge)或缺口(notch)。在第一實施例中先以定位結構為平邊212進行示例說明。 Please refer to Figures 1, 2, 3 and 4, which are wafer carriers 100 with wafer positioning function in the first embodiment of the present invention. The wafer carrier 100 is used to fix a wafer 200 thereon and can position the wafer 200. The edge of the wafer 200 has a positioning structure, which can be but is not limited to a flat edge 212 (flat edge) or a notch (notch). In the first embodiment, the positioning structure is first illustrated as a flat edge 212.

如圖1與圖2所示,晶圓片承載裝置100包含一基座110、一承載盤120、多個頂針130、一線性致動器140以及一對準器150。 As shown in FIG. 1 and FIG. 2 , the wafer carrier 100 includes a base 110, a carrier plate 120, a plurality of ejector pins 130, a linear actuator 140, and an aligner 150.

如圖1與圖2所示,基座110用以作為承載盤120以及線性致動器140的設置基礎,亦即承載盤120以及線性致動器140是直接地或間接地設置於基座110上。基座110可為平板結構、槽體結構或其他型態;第一實施例以槽體結構作為基座110的示例。如圖所示,基座110包含底部112以及環繞底部112的側壁114。 As shown in FIG. 1 and FIG. 2 , the base 110 is used as a base for the support plate 120 and the linear actuator 140, that is, the support plate 120 and the linear actuator 140 are directly or indirectly disposed on the base 110. The base 110 can be a flat plate structure, a tank structure or other types; the first embodiment uses a tank structure as an example of the base 110. As shown in the figure, the base 110 includes a bottom 112 and a side wall 114 surrounding the bottom 112.

如圖1、圖2與圖5所示,承載盤120設置於基座110的底部112上。承載盤120可透過支撐件設置於底部112,使得承載盤120與底部112之間保持一間隔距離,以供設置其他元件於承載盤120與底部112之間。 As shown in FIG. 1 , FIG. 2 and FIG. 5 , the support plate 120 is disposed on the bottom 112 of the base 110 . The support plate 120 can be disposed on the bottom 112 through a support member so that a spacing distance is maintained between the support plate 120 and the bottom 112 for other components to be disposed between the support plate 120 and the bottom 112 .

如圖1、圖2與圖5所示,承載盤120具有一上表面122以及一下表面124。上表面122用以供晶圓片200被放置於其上。上表面122上設置有吸附結構126,吸附結構126為連接於一抽氣泵300的真空吸附孔126a以及連通真空吸附 孔126a的導氣溝126b,藉以產生負壓以吸附晶圓片200。真空吸附孔126a可以是連通上表面122以及下表面124,並且真空吸附孔126a於下表面124連接抽氣泵300。 As shown in FIG. 1 , FIG. 2 and FIG. 5 , the carrier plate 120 has an upper surface 122 and a lower surface 124. The upper surface 122 is used for placing the wafer 200 thereon. A suction structure 126 is provided on the upper surface 122. The suction structure 126 is a vacuum suction hole 126a connected to an air pump 300 and an air guide groove 126b connected to the vacuum suction hole 126a, so as to generate a negative pressure to suck the wafer 200. The vacuum suction hole 126a can be connected to the upper surface 122 and the lower surface 124, and the vacuum suction hole 126a is connected to the air pump 300 on the lower surface 124.

如圖1與圖5所示,承載盤120還具有多個升降孔128,並且晶圓片承載裝置100更包含多個升降桿160。升降桿160由承載盤120的下表面124穿過升降孔128,並且藉由液壓缸、氣壓缸或線性馬達等升降單元190的驅動,多個升降桿160是可升降地設置於承載盤120。因此,升降桿160可下降而完全埋設於承載盤120中,或是上升而突出於上表面122。此外,上表面122的邊緣也可以配置為階梯狀結構。 As shown in FIG. 1 and FIG. 5 , the carrier plate 120 also has a plurality of lifting holes 128, and the wafer carrier device 100 further includes a plurality of lifting rods 160. The lifting rods 160 pass through the lifting holes 128 from the lower surface 124 of the carrier plate 120, and are driven by a lifting unit 190 such as a hydraulic cylinder, a pneumatic cylinder or a linear motor, so that the plurality of lifting rods 160 can be lifted and lowered on the carrier plate 120. Therefore, the lifting rods 160 can be lowered and completely buried in the carrier plate 120, or raised and protruded from the upper surface 122. In addition, the edge of the upper surface 122 can also be configured as a stepped structure.

如圖1、圖2與圖5所示,多個頂針130突出地設置於承載盤120的上表面122,並且是匹配於晶圓片200的邊緣。各頂針130分別以承載盤120上的一預設基準中心C1為基準環繞間隔地設置於承載盤120上。 As shown in FIG. 1 , FIG. 2 and FIG. 5 , a plurality of ejector pins 130 are protrudingly disposed on the upper surface 122 of the carrier plate 120 and are matched with the edge of the wafer 200 . Each ejector pin 130 is disposed on the carrier plate 120 at intervals around a preset reference center C1 on the carrier plate 120 .

如圖1、圖2與圖5所示,頂針130可以是可移動地設置於承載盤120,並且突出於承載盤120的上表面122。以第一實施例為例,承載盤120還包含多個槽孔121,各槽孔121連通承載盤120的上表面122以及下表面124,且各槽孔121的延伸方向朝向預設基準中心C1。頂針130固定於一個固定塊170上,固定塊170可移動地設置於下表面124,而頂針130由下表面124穿過槽孔121而突出於上表面122。透過固定塊170的位置調整,可改變頂針130與預設基準中心C1的距離,使得多個頂針130可以配合不同直徑大小的晶圓片200。 As shown in FIG. 1 , FIG. 2 and FIG. 5 , the ejector pin 130 can be movably disposed on the carrier plate 120 and protrude from the upper surface 122 of the carrier plate 120. Taking the first embodiment as an example, the carrier plate 120 further includes a plurality of slots 121, each slot 121 connecting the upper surface 122 and the lower surface 124 of the carrier plate 120, and the extension direction of each slot 121 is toward the preset reference center C1. The ejector pin 130 is fixed on a fixing block 170, and the fixing block 170 is movably disposed on the lower surface 124, and the ejector pin 130 passes through the slot 121 from the lower surface 124 and protrudes from the upper surface 122. By adjusting the position of the fixing block 170, the distance between the ejector pin 130 and the preset reference center C1 can be changed, so that multiple ejector pins 130 can be matched with wafers 200 of different diameters.

如圖1、圖2、圖3與圖4所示,線性致動器140直接地或間接地固定於基座110,且線性致動器140的致動方向平行於上表面122。具體而言,在第一實施例中,線性致動器140是透過一支架180連接於側壁114。 As shown in FIG. 1 , FIG. 2 , FIG. 3 and FIG. 4 , the linear actuator 140 is directly or indirectly fixed to the base 110 , and the actuation direction of the linear actuator 140 is parallel to the upper surface 122 . Specifically, in the first embodiment, the linear actuator 140 is connected to the side wall 114 through a bracket 180 .

如圖3所示,第一實施例的線性致動器140具有二線性滑軌單元142、一移動件144、一導螺桿146以及一壓縮彈簧148。二線性滑軌單元142平行地配置,並且連接於支架180。線性滑軌單元142具有一滑塊142a與一軌道142b,滑塊142a可滑動地結合於軌道142b。移動件144可移動地結合於二線性滑軌單元142,且移動件144的一移動方向平行於線性致動器140的致動方向。具體而言,移動件144的內部可為一中空空間,使得線性滑軌單元142局部地位於移動件144的中空空間。導螺桿146的一端可轉動地固定於支架180,另一端穿過移動件144的中空空間而可轉動地固定於移動件144,並且導螺桿146是位於二個線性滑軌單元142之間。壓縮彈簧148套設於導螺桿146,壓縮彈簧148的一端頂抵於移動件144,另一端連接於二線性滑軌單元142,使得壓縮彈簧148的彈性力常態地朝承載盤120推動移動件144,以達成前後緩衝,並且消除線性滑軌單元142中因為公差產生的遊隙。壓縮彈簧148可以使得移動件144的移動更順暢,移動件144不會在前後移動時因為零件間遊隙發生頓挫的狀況。對準器150連接於線性致動器140,而可被線性致動器140驅動,而沿著致動方向移動以接觸並推抵晶圓片200的定位結構。具體而言,對準器150固定於移動件144,或是對準器150一體成形於移動件144。對準器150的前端具有一定位平面152,定位平面152匹配於晶圓片200的平邊212,並且是垂直於線性致動器140的致動方向以及上表面122。 As shown in FIG3 , the linear actuator 140 of the first embodiment has two linear rail units 142, a moving member 144, a lead screw 146, and a compression spring 148. The two linear rail units 142 are arranged in parallel and connected to the bracket 180. The linear rail unit 142 has a slider 142a and a track 142b, and the slider 142a is slidably coupled to the track 142b. The moving member 144 is movably coupled to the two linear rail units 142, and a moving direction of the moving member 144 is parallel to the actuation direction of the linear actuator 140. Specifically, the interior of the moving member 144 may be a hollow space, so that the linear slide rail unit 142 is partially located in the hollow space of the moving member 144. One end of the lead screw 146 is rotatably fixed to the bracket 180, and the other end passes through the hollow space of the moving member 144 and is rotatably fixed to the moving member 144, and the lead screw 146 is located between the two linear slide rail units 142. The compression spring 148 is sleeved on the lead screw 146, one end of the compression spring 148 presses against the moving member 144, and the other end is connected to the two linear slide rail units 142, so that the elastic force of the compression spring 148 normally pushes the moving member 144 toward the carrier plate 120 to achieve forward and backward buffering and eliminate the clearance caused by tolerance in the linear slide rail unit 142. The compression spring 148 can make the moving member 144 move more smoothly, and the moving member 144 will not be jerked when moving forward and backward due to the clearance between parts. The aligner 150 is connected to the linear actuator 140 and can be driven by the linear actuator 140 to move along the actuation direction to contact and push against the positioning structure of the wafer 200. Specifically, the aligner 150 is fixed to the moving member 144, or the aligner 150 is integrally formed on the moving member 144. The front end of the aligner 150 has a positioning plane 152, which matches the flat edge 212 of the wafer 200 and is perpendicular to the actuation direction of the linear actuator 140 and the upper surface 122.

上述的線性致動器140僅為示例,不排除其他形式的線性致動器140,例如馬達、齒輪與齒條的組合,或是以磁力推動的線性馬達。 The above-mentioned linear actuator 140 is only an example, and other forms of linear actuators 140 are not excluded, such as a motor, a combination of gears and racks, or a linear motor driven by magnetic force.

讓對準器150於上表面122滑動並接觸晶圓片200的平邊212有實施上的難度。對準器150接觸上表面122並且進行滑動會造成過大的摩擦阻力,而對準器150與上表面122保持間隔距離又會造成對準器150無法確實地接觸平 邊212,甚至是因為間隔距離大於晶圓片200的厚度而導致對準器150無法接觸平邊212。 It is difficult to make the aligner 150 slide on the upper surface 122 and contact the flat edge 212 of the wafer 200. The aligner 150 contacting the upper surface 122 and sliding will cause excessive friction resistance, and the aligner 150 and the upper surface 122 will maintain a spacing distance, which will cause the aligner 150 to be unable to accurately contact the flat edge 212. The aligner 150 may even be unable to contact the flat edge 212 because the spacing distance is greater than the thickness of the wafer 200.

如圖1、圖2與圖5所示,在本發明的一或多個實施例中,承載盤120還配置有槽溝123,位於上表面122且連通承載盤120的邊緣。對準器150與線性致動器140的局部(移動件144)是可移動地設置於槽溝123中。 As shown in FIG. 1 , FIG. 2 and FIG. 5 , in one or more embodiments of the present invention, the carrier plate 120 is further provided with a groove 123, which is located on the upper surface 122 and connected to the edge of the carrier plate 120. The aligner 150 and a part of the linear actuator 140 (moving member 144) are movably disposed in the groove 123.

以下說明第一實施例放置與定位晶圓片200的流程。 The following describes the process of placing and positioning the wafer 200 in the first embodiment.

如圖5所示,多個升降桿160先上升突出於承載盤120的上表面122。晶圓片200由機械手臂或其他搬運設備進行移動,並放置於多個升降桿160上,並且以晶圓片200的平邊212大致對應於對準器150。 As shown in FIG. 5 , a plurality of lifting rods 160 first rise and protrude above the upper surface 122 of the carrier plate 120 . The wafer 200 is moved by a robot or other handling equipment and placed on the plurality of lifting rods 160 , with the flat edge 212 of the wafer 200 roughly corresponding to the aligner 150 .

如圖6與圖7所示,接著,升降桿160下降而完全埋設於承載盤120中,使晶圓片200放置於上表面122。線性致動器140開始作動,使得對準器150以定位平面152接觸晶圓片200的平邊212,並開始推動晶圓片200於上表面122位移以及水平轉動。 As shown in FIG6 and FIG7, the lifting rod 160 then descends and is completely buried in the carrier plate 120, so that the wafer 200 is placed on the upper surface 122. The linear actuator 140 starts to operate, so that the alignment device 150 contacts the flat edge 212 of the wafer 200 with the positioning plane 152, and starts to push the wafer 200 to move and rotate horizontally on the upper surface 122.

如圖7與圖8所示,藉由對準器150的推動,晶圓片200於上表面122位移而以邊緣接觸頂針130,頂針130也同步朝向預設基準中心C1移動至配合晶圓片200外徑的位置,使得晶圓片中心C2移動至與預設基準中心C1重合。接著被對準器150推動的晶圓片200開始轉動使得對準器150的定位平面152貼合於晶圓片200的平邊212,完成晶圓片200的定位。 As shown in FIG. 7 and FIG. 8 , by pushing the aligner 150, the wafer 200 moves on the upper surface 122 and contacts the ejector pin 130 with its edge. The ejector pin 130 also moves toward the preset reference center C1 to a position matching the outer diameter of the wafer 200, so that the wafer center C2 moves to coincide with the preset reference center C1. Then, the wafer 200 pushed by the aligner 150 begins to rotate so that the positioning plane 152 of the aligner 150 is attached to the flat edge 212 of the wafer 200, completing the positioning of the wafer 200.

之後,抽氣泵300就可以開始作動,使吸附結構126開始提供負壓以吸引/固定晶圓片200。 Afterwards, the vacuum pump 300 can start to operate, so that the suction structure 126 starts to provide negative pressure to attract/fix the wafer 200.

參閱圖10與圖11所示,為本發明實施例所提出的一種頂針130的驅動機構,適用於本發明一或多個實施例。 Referring to Figures 10 and 11, a driving mechanism of a top pin 130 proposed in an embodiment of the present invention is applicable to one or more embodiments of the present invention.

圖10與圖11所示者為承載盤120的底視圖。如圖所示,頂針130的驅動機構包含一平面凸輪132、多個彈性件134以及一伺服馬達136。 Figures 10 and 11 show bottom views of the carrier plate 120. As shown in the figure, the driving mechanism of the ejector pin 130 includes a flat cam 132, a plurality of elastic members 134, and a servo motor 136.

如圖12所示,平面凸輪132可轉動地設置於承載盤120的下表面124,且凸輪中心與預設基準中心C1重合。平面凸輪132具有一最大外廓R1以及一最小外廓R2。最大外廓R1的直徑大於晶圓片200的直徑,最小外廓R2的直徑大致等於晶圓片200的直徑。平面凸輪132具有多個外頂點132a,分別相應於頂針130,並且位於最大外廓R1。平面凸輪132還具有多個內凹點132b,分別相應於頂針130,並且位於最小外廓R2。 As shown in FIG. 12 , the planar cam 132 is rotatably disposed on the lower surface 124 of the carrier plate 120, and the cam center coincides with the preset reference center C1. The planar cam 132 has a maximum outer profile R1 and a minimum outer profile R2. The diameter of the maximum outer profile R1 is greater than the diameter of the wafer 200, and the diameter of the minimum outer profile R2 is approximately equal to the diameter of the wafer 200. The planar cam 132 has a plurality of outer apex points 132a, which correspond to the ejector pins 130, respectively, and are located at the maximum outer profile R1. The planar cam 132 also has a plurality of inner concave points 132b, which correspond to the ejector pins 130, respectively, and are located at the minimum outer profile R2.

如圖12所示,多個彈性件134設置於承載盤120的下表面124,各彈性件134分別用於常態地朝向預設基準中心C1推動頂針130,並且使得頂針130抵靠於平面凸輪132。 As shown in FIG. 12 , a plurality of elastic members 134 are disposed on the lower surface 124 of the carrier plate 120 , and each elastic member 134 is used to normally push the ejector pin 130 toward the preset reference center C1 and make the ejector pin 130 abut against the flat cam 132 .

如圖12所示,伺服馬達136連接於平面凸輪132,使得平面凸輪132可相對於承載盤120。 As shown in FIG. 12 , the servo motor 136 is connected to the planar cam 132 so that the planar cam 132 can be relative to the carrier plate 120.

參閱圖10與圖12所示,以三個頂針130為例,平面凸輪132具有三個外頂點132a以及三個內凹點132b,交錯地配置。當要放置晶圓片200於承載盤120的上表面122時,伺服馬達136轉動平面凸輪132,使得三個外頂點132a分別接觸一個頂針130,使得頂針130被外推至相應於最大外廓R1的位置上,而使得晶圓片200可以不受阻礙地被放置在承載盤120的上表面122。 Referring to FIG. 10 and FIG. 12 , taking three ejector pins 130 as an example, the planar cam 132 has three outer apex points 132a and three inner concave points 132b, which are arranged in a staggered manner. When the wafer 200 is to be placed on the upper surface 122 of the carrier plate 120, the servo motor 136 rotates the planar cam 132 so that the three outer apex points 132a contact one ejector pin 130 respectively, so that the ejector pin 130 is pushed outward to a position corresponding to the maximum outer contour R1, so that the wafer 200 can be placed on the upper surface 122 of the carrier plate 120 without hindrance.

參閱圖11與圖12所示,接著,伺服馬達136驅動平面凸輪132轉動一預定角度,例如本實施例中伺服馬達136驅動平面凸輪132轉動60度,使得三個內凹點132b接觸頂針130。此時,頂針130也受到彈性件134的推動,朝向預設基準中心C1位移而持續抵靠於平面凸輪132的外廓而接觸內凹點132b。此時,頂 針130至預設基準中心C1的距離大致等於晶圓片200的直徑,而可定位晶圓片200使得晶圓片200的晶圓片中心C2移動至與預設基準中心C1重合。 Referring to FIG. 11 and FIG. 12 , the servo motor 136 then drives the planar cam 132 to rotate a predetermined angle. For example, in the present embodiment, the servo motor 136 drives the planar cam 132 to rotate 60 degrees, so that the three inner concave points 132b contact the ejector pin 130. At this time, the ejector pin 130 is also pushed by the elastic member 134, and moves toward the preset reference center C1 and continues to abut against the outer contour of the planar cam 132 and contact the inner concave points 132b. At this time, the distance from the ejector pin 130 to the preset reference center C1 is roughly equal to the diameter of the wafer 200, and the wafer 200 can be positioned so that the wafer center C2 of the wafer 200 moves to coincide with the preset reference center C1.

透過平面凸輪132的干涉,可以使得多個頂針130同步位移,確保多個頂針130至預設基準中心C1的距離維持一致。此外,對準器150可於頂針130接觸內凹點132b而完成晶圓片200的定位後再開始作動進行對準,對準器150也可以與頂針130同時作動,同時完成晶圓片200的定位與對準。 Through the interference of the planar cam 132, multiple ejector pins 130 can be displaced synchronously to ensure that the distances from multiple ejector pins 130 to the preset reference center C1 remain consistent. In addition, the aligner 150 can start to align after the ejector pin 130 contacts the inner concave point 132b to complete the positioning of the wafer 200. The aligner 150 can also be actuated simultaneously with the ejector pin 130 to complete the positioning and alignment of the wafer 200 at the same time.

請參閱圖13所示,為本發明第二實施例提出的一種線性致動器140與對準器150,應用於本發明一或多個實施例中。第二實施例所適用晶圓片200,其定位結構為缺口214。 Please refer to FIG. 13 , which shows a linear actuator 140 and an aligner 150 proposed in the second embodiment of the present invention, which are applied in one or more embodiments of the present invention. The wafer 200 used in the second embodiment has a positioning structure of a notch 214.

如圖13所示,線性致動器140直接地或間接地固定於基座110,且線性致動器140的致動方向平行於上表面122。具體而言,在第二實施例中,線性致動器140是透過一支架180連接於側壁114。 As shown in FIG. 13 , the linear actuator 140 is directly or indirectly fixed to the base 110, and the actuation direction of the linear actuator 140 is parallel to the upper surface 122. Specifically, in the second embodiment, the linear actuator 140 is connected to the side wall 114 via a bracket 180.

如圖13所示,第二實施例的線性致動器140具有一線性滑軌單元142、一移動件144、一導螺桿146以及一壓縮彈簧148。線性滑軌單元142連接於支架180。線性致動器140也可以如第一實施例左右對稱地配置兩個線性滑軌單元142。移動件144可移動地結合於線性滑軌單元142,且移動件144的一移動方向平行於線性致動器140的致動方向。線性滑軌單元142局部地位於移動件144的中空空間。導螺桿146的一端可轉動地固定於支架180,另一端穿過移動件144的中空空間而可轉動地固定於移動件144。壓縮彈簧148套設於導螺桿146,壓縮彈簧148的一端頂抵於移動件144,另一端頂抵於支架180,使得壓縮彈簧148的彈性力常態地朝承載盤120推動移動件144。不同於第一實施例,第二實施例中的壓縮彈簧148是位於移動件144外部,而被壓縮於移動件144與支架180之間。 As shown in FIG13 , the linear actuator 140 of the second embodiment has a linear slide rail unit 142, a moving member 144, a lead screw 146, and a compression spring 148. The linear slide rail unit 142 is connected to the bracket 180. The linear actuator 140 may also be configured with two linear slide rail units 142 symmetrically as in the first embodiment. The moving member 144 is movably coupled to the linear slide rail unit 142, and a moving direction of the moving member 144 is parallel to the actuation direction of the linear actuator 140. The linear slide rail unit 142 is partially located in the hollow space of the moving member 144. One end of the lead screw 146 is rotatably fixed to the bracket 180, and the other end passes through the hollow space of the moving member 144 and is rotatably fixed to the moving member 144. The compression spring 148 is sleeved on the lead screw 146, and one end of the compression spring 148 abuts against the moving member 144, and the other end abuts against the bracket 180, so that the elastic force of the compression spring 148 normally pushes the moving member 144 toward the supporting plate 120. Different from the first embodiment, the compression spring 148 in the second embodiment is located outside the moving member 144 and is compressed between the moving member 144 and the bracket 180.

如圖13、圖14與圖15所示,對準器150固定於移動件144,對準器150是平板狀,垂直於上表面122,並且朝向預設基準中心C1延伸,且對準器150的前端可配置為具有導圓角,對準器150的前端用以插入匹配於晶圓片200的缺口214,以抵靠於缺口214的角落。 As shown in FIG. 13 , FIG. 14 and FIG. 15 , the aligner 150 is fixed to the moving member 144 . The aligner 150 is in the shape of a flat plate, perpendicular to the upper surface 122 , and extends toward the preset reference center C1 . The front end of the aligner 150 can be configured to have a rounded corner. The front end of the aligner 150 is used to be inserted into the notch 214 matching the wafer 200 to abut against the corner of the notch 214 .

同樣地,第二實施例的承載盤120也配置有槽溝123,位於上表面122且連通承載盤120的邊緣,並且槽溝123更配置有朝向預設基準中心C1延伸的延伸部123a,用以供對準器150的前端插入而進一步地接近預設基準中心C1。 Similarly, the carrier plate 120 of the second embodiment is also provided with a groove 123, which is located on the upper surface 122 and connected to the edge of the carrier plate 120, and the groove 123 is further provided with an extension portion 123a extending toward the preset reference center C1, for the front end of the aligner 150 to be inserted and further approach the preset reference center C1.

以下說明第二實施例放置與定位晶圓片200的流程。 The following describes the process of placing and positioning the wafer 200 in the second embodiment.

如圖14與圖15所示,晶圓片200放置於上表面122之後,線性致動器140開始作動,使得對準器150的前端插入圓片的缺口214,並開始推動晶圓片200於上表面122位移以及水平轉動。 As shown in FIG. 14 and FIG. 15 , after the wafer 200 is placed on the upper surface 122 , the linear actuator 140 starts to operate, so that the front end of the aligner 150 is inserted into the notch 214 of the wafer, and starts to push the wafer 200 to move and rotate horizontally on the upper surface 122 .

如圖16與圖17所示,藉由對準器150的推動,晶圓片200於上表面122位移而以邊緣接觸頂針130,使得晶圓片中心C2移動至與預設基準中心C1重合。接著晶圓片200開始轉動使得對準器150的前端頂抵於缺口214的角落,完成晶圓片200的定位。之後,抽氣泵300就可以開始作動,使吸附結構126開始提供負壓以吸引/固定晶圓片200。 As shown in Figures 16 and 17, by pushing the aligner 150, the wafer 200 moves on the upper surface 122 and contacts the ejector 130 with its edge, so that the wafer center C2 moves to coincide with the preset reference center C1. Then the wafer 200 starts to rotate so that the front end of the aligner 150 presses against the corner of the notch 214, completing the positioning of the wafer 200. After that, the vacuum pump 300 can start to operate, so that the suction structure 126 starts to provide negative pressure to attract/fix the wafer 200.

本發明提出具有晶圓片定位功能的晶圓片承載裝置100,是透過定位結構、對準器150以及頂針130的配合,達成晶圓片200的定位。定位過程不涉及晶圓片200位置/定位結構的偵測、識別,大幅簡化定位機制的複雜度。並且本發明可達成快速定位,並且容易提升定位的精確性而不影響定位作業執行速率。 The present invention proposes a wafer carrier 100 with a wafer positioning function, which achieves the positioning of the wafer 200 through the cooperation of the positioning structure, the aligner 150 and the ejector pin 130. The positioning process does not involve the detection and identification of the position/positioning structure of the wafer 200, which greatly simplifies the complexity of the positioning mechanism. In addition, the present invention can achieve rapid positioning and easily improve the accuracy of positioning without affecting the execution rate of the positioning operation.

100:晶圓片承載裝置 100: Wafer carrier

110:基座 110: Base

112:底部 112: Bottom

114:側壁 114: Side wall

120:承載盤 120: Carrier plate

121:槽孔 121: Slot

123:槽溝 123: Groove

126:吸附結構 126: Adsorption structure

126a:真空吸附孔 126a: Vacuum adsorption hole

126b:導氣溝 126b: air channel

128:升降孔 128: Lifting hole

130:頂針 130: Top needle

140:線性致動器 140: Linear actuator

142:線性滑軌單元 142: Linear slide unit

144:移動件 144: Moving parts

150:對準器 150: Alignment device

160:升降桿 160: Lifting rod

170:固定塊 170:Fixed block

180:支架 180: Bracket

Claims (10)

一種具有晶圓片定位功能的晶圓片承載裝置,用以固定一晶圓片於其上,並且可對該晶圓片進行定位,並且該晶圓片的邊緣具有一定位結構,其包含:一基座;一承載盤,設置於該基座上;其中,該承載盤具有一上表面以及一下表面;該上表面用以供該晶圓片被放置於其上,且該上表面設置有吸附結構,用於吸附並固定該晶圓片;多個頂針,突出地設置於該上表面,各該頂針分別以該承載盤上的一預設基準中心為基準環繞間隔地設置於該承載盤上;一線性致動器,設置於該基座上,且該線性致動器的一致動方向平行於上表面;以及一對準器,可被該線性致動器驅動,沿著該致動方向移動以接觸並推抵該晶圓片的該定位結構。 A wafer carrier with a wafer positioning function is used to fix a wafer thereon and position the wafer, and the edge of the wafer has a positioning structure, which includes: a base; a carrier plate, which is arranged on the base; wherein the carrier plate has an upper surface and a lower surface; the upper surface is used for the wafer to be placed thereon, and the upper surface is provided with an adsorption structure for adsorbing and Fix the wafer; multiple ejector pins are protrudingly disposed on the upper surface, and each of the ejector pins is disposed on the carrier plate at intervals around a preset reference center on the carrier plate; a linear actuator is disposed on the base, and a driving direction of the linear actuator is parallel to the upper surface; and an aligner can be driven by the linear actuator to move along the driving direction to contact and push against the positioning structure of the wafer. 如請求項1所述的具有晶圓片定位功能的晶圓片承載裝置,其中,該吸附結構為一真空吸附孔以及連通該真空吸附孔的導氣槽,該真空吸附孔連通該上表面以及該下表面。 The wafer carrier with wafer positioning function as described in claim 1, wherein the adsorption structure is a vacuum adsorption hole and an air guide groove connected to the vacuum adsorption hole, and the vacuum adsorption hole is connected to the upper surface and the lower surface. 如請求項2所述的具有晶圓片定位功能的晶圓片承載裝置,更包含一抽氣泵,並且該真空吸附孔於該下表面連接該抽氣泵。 The wafer carrier with wafer positioning function as described in claim 2 further includes an air pump, and the vacuum adsorption hole is connected to the air pump on the lower surface. 如請求項1所述的具有晶圓片定位功能的晶圓片承載裝置,更包含多個升降桿,可升降地設置於該承載盤;其中,該升降桿可下降而埋設於該承載盤中,或是上升而突出於該上表面。 The wafer carrier with wafer positioning function as described in claim 1 further comprises a plurality of lifting rods which can be lifted and lowered on the carrier plate; wherein the lifting rods can be lowered and buried in the carrier plate, or raised and protruded from the upper surface. 如請求項1所述的具有晶圓片定位功能的晶圓片承載裝置,其中,該線性致動器透過一支架連接於該基座,且該線性致動器具有:至少一線性滑軌單元;一移動件,可移動地結合於該至少一線性滑軌單元,且該移動件的一移動方向平行於該線性致動器的該致動方向;以及一導螺桿,其一端可轉動地固定於該支架,另一端穿過移動件的一中空空間而可轉動地固定於該移動件。 A wafer carrier with a wafer positioning function as described in claim 1, wherein the linear actuator is connected to the base through a bracket, and the linear actuator has: at least one linear slide rail unit; a moving member movably coupled to the at least one linear slide rail unit, and a moving direction of the moving member is parallel to the actuation direction of the linear actuator; and a lead screw, one end of which is rotatably fixed to the bracket, and the other end of which passes through a hollow space of the moving member and is rotatably fixed to the moving member. 如請求項5所述的具有晶圓片定位功能的晶圓片承載裝置,其中,該線性致動器還具有一壓縮彈簧,套設於該導螺桿,該壓縮彈簧的一端頂抵於該移動件,另一端連接於該至少一線性滑軌單元。 As described in claim 5, the wafer carrier with wafer positioning function, wherein the linear actuator also has a compression spring, which is sleeved on the lead screw, one end of the compression spring presses against the moving part, and the other end is connected to the at least one linear slide rail unit. 如請求項5所述的具有晶圓片定位功能的晶圓片承載裝置,其中,該線性致動器還具有一壓縮彈簧,該壓縮彈簧套設於該導螺桿,該壓縮彈簧的一端頂抵於該移動件,另一端頂抵於該支架。 As described in claim 5, the wafer carrier with wafer positioning function, wherein the linear actuator also has a compression spring, the compression spring is sleeved on the lead screw, one end of the compression spring presses against the moving part, and the other end presses against the bracket. 如請求項1所述的具有晶圓片定位功能的晶圓片承載裝置,其中,該對準器的前端具有一定位平面。 A wafer carrier with wafer positioning function as described in claim 1, wherein the front end of the aligner has a positioning plane. 如請求項1所述的具有晶圓片定位功能的晶圓片承載裝置,其中,該對準器是平板狀,垂直於該上表面,並且朝向該預設基準中心延伸。 A wafer carrier with wafer positioning function as described in claim 1, wherein the aligner is in the shape of a flat plate, perpendicular to the upper surface, and extends toward the preset reference center. 如請求項1所述的具有晶圓片定位功能的晶圓片承載裝置,其中,該承載盤還配置有一槽溝,該槽溝位於該上表面且連通該承載盤的邊緣;該對準器與該線性致動器的局部是可移動地設置於該槽溝中。As described in claim 1, the wafer carrier with wafer positioning function is further provided with a groove, which is located on the upper surface and connected to the edge of the carrier; the aligner and part of the linear actuator are movably arranged in the groove.
TW112141034A 2023-10-26 2023-10-26 Wafer holding device having function of positioning wafer TWI863654B (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190176291A1 (en) * 2017-12-13 2019-06-13 Samsung Electronics Co., Ltd. Load cup and chemical mechanical polishing apparatus and method of manufacturing including the same
TWI776665B (en) * 2021-09-03 2022-09-01 天虹科技股份有限公司 Alignment mechanism and bonding machine using the alignment mechanism
TWM651950U (en) * 2023-10-26 2024-02-21 天虹科技股份有限公司 Wafer-carrying device with wafer-positioning function

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190176291A1 (en) * 2017-12-13 2019-06-13 Samsung Electronics Co., Ltd. Load cup and chemical mechanical polishing apparatus and method of manufacturing including the same
TWI776665B (en) * 2021-09-03 2022-09-01 天虹科技股份有限公司 Alignment mechanism and bonding machine using the alignment mechanism
TWM651950U (en) * 2023-10-26 2024-02-21 天虹科技股份有限公司 Wafer-carrying device with wafer-positioning function

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