TWI863130B - Cooling structure having metal plating layer - Google Patents
Cooling structure having metal plating layer Download PDFInfo
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- TWI863130B TWI863130B TW112105091A TW112105091A TWI863130B TW I863130 B TWI863130 B TW I863130B TW 112105091 A TW112105091 A TW 112105091A TW 112105091 A TW112105091 A TW 112105091A TW I863130 B TWI863130 B TW I863130B
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- metal coating
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- blocks
- arrangement spacing
- heat sink
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 114
- 239000002184 metal Substances 0.000 title claims abstract description 114
- 238000007747 plating Methods 0.000 title claims abstract description 23
- 238000001816 cooling Methods 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 claims abstract description 70
- 238000000034 method Methods 0.000 claims abstract description 26
- 238000004544 sputter deposition Methods 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 7
- 238000000576 coating method Methods 0.000 claims description 71
- 239000011248 coating agent Substances 0.000 claims description 70
- 239000011247 coating layer Substances 0.000 claims description 39
- 239000010410 layer Substances 0.000 claims description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 229910052709 silver Inorganic materials 0.000 claims description 8
- 239000004332 silver Substances 0.000 claims description 8
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 6
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 6
- 229910001096 P alloy Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 claims description 6
- 230000007423 decrease Effects 0.000 claims description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 238000012545 processing Methods 0.000 abstract description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical group [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- 230000007812 deficiency Effects 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000012809 cooling fluid Substances 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
本發明涉及一種散熱器結構,具體來說是涉及一種具金屬鍍層之散熱器結構。 The present invention relates to a heat sink structure, and more specifically to a heat sink structure with a metal coating.
有些散熱器表面會形成有燒結用的鍍層,以透過燒結後的鍍層來與功率晶片連接。然而,鍍層燒結後的收縮與其上功率晶片運作時冷熱變化所帶來的應力衝擊對散熱器是十分不利的。 Some heat sinks have a coating for sintering on their surface, which is used to connect to the power chip. However, the shrinkage of the coating after sintering and the stress shock caused by the thermal changes of the power chip on it during operation are very detrimental to the heat sink.
有鑑於此,本發明人本於多年從事相關產品之開發與設計,有感上述缺失之可改善,乃特潛心研究並配合學理之運用,終於提出一種設計合理且有效改善上述缺失之本發明。 In view of this, the inventor has been engaged in the development and design of related products for many years and feels that the above-mentioned deficiencies can be improved. Therefore, he has devoted himself to research and applied academic theories, and finally proposed a reasonable design and effective improvement of the above-mentioned deficiencies.
本發明所要解決的技術問題在於,針對現有技術的不足提供一種具金屬鍍層之散熱器結構。 The technical problem that the present invention aims to solve is to provide a heat sink structure with a metal coating to address the deficiencies of the existing technology.
本發明實施例公開了一種具金屬鍍層之散熱器結構,其具有一基底且所述基底上是通過兩種不同材料及製程工藝成形有一第一金屬鍍層及一第二金屬鍍層;其中,所述第一金屬鍍層是通過濕式製程工藝先成形在所述基底上的鍍層,所述第二金屬鍍層是通過濺鍍製程工藝而後成形在所述第一金屬鍍層上的0.1至5μm厚的鍍層,且所述第二金屬鍍層由至少三個以上間隔排列的區塊所構成,且至少有兩所述區塊之間的排列間距和其他各所述區塊之間的排列間距為不等距。 The present invention discloses a heat sink structure with a metal coating, which has a substrate and a first metal coating and a second metal coating formed on the substrate by two different materials and processes; wherein the first metal coating is a coating formed on the substrate by a wet process, and the second metal coating is a coating with a thickness of 0.1 to 5 μm formed on the first metal coating by a sputtering process, and the second metal coating is composed of at least three or more spaced blocks, and the spacing between at least two of the blocks is unequal to the spacing between the other blocks.
在一優選實施例中,所述基底是銅/銅合金層、鋁/鋁合金層的至少其一。 In a preferred embodiment, the substrate is at least one of a copper/copper alloy layer and an aluminum/aluminum alloy layer.
在一優選實施例中,所述第一金屬鍍層是鎳/鎳合金層、鎳磷合金層的至少其一。 In a preferred embodiment, the first metal plating layer is at least one of a nickel/nickel alloy layer and a nickel-phosphorus alloy layer.
在一優選實施例中,所述第二金屬鍍層是銀/銀合金層。 In a preferred embodiment, the second metal plating layer is a silver/silver alloy layer.
在一優選實施例中,所述第二金屬鍍層的多個所述區塊是相對於所述基底之中心線呈對稱排列,且最接近所述基底之中心線的兩所述區塊之間的排列間距是大於其他各所述區塊之間的排列間距。 In a preferred embodiment, the multiple blocks of the second metal coating layer are arranged symmetrically relative to the center line of the substrate, and the arrangement spacing between the two blocks closest to the center line of the substrate is greater than the arrangement spacing between the other blocks.
在一優選實施例中,最接近所述基底之中心線的兩所述區塊之間的排列間距為1倍時,其他各所述區塊之間的排列間距在遠離所述基底之中心線的方向上以1/2^N倍逐漸減小,其中N從1開始,遞增量為1。 In a preferred embodiment, when the arrangement spacing between the two blocks closest to the center line of the substrate is 1, the arrangement spacing between the other blocks gradually decreases by 1/2^N times in the direction away from the center line of the substrate, where N starts from 1 and the increment is 1.
在一優選實施例中,在各所述區塊為矩形且尺寸相同時,最接近所述基底之中心線的兩所述區塊之間的排列間距為各所述區塊其自身沿著排列方向之寬度的2倍。 In a preferred embodiment, when each of the blocks is rectangular and has the same size, the arrangement spacing between the two blocks closest to the center line of the substrate is twice the width of each of the blocks along the arrangement direction.
在一優選實施例中,所述基底表面一體成形有多個鰭片,且所述鰭片是針鰭片。 In a preferred embodiment, the substrate surface is integrally formed with a plurality of fins, and the fins are needle fins.
在一優選實施例中,所述基底具有相連通的一入水口及一出水口。 In a preferred embodiment, the base has a water inlet and a water outlet connected to each other.
在一優選實施例中,有多個所述第二金屬鍍層是彼此之間呈平行地形成在所述基底上的所述第一金屬鍍層上。 In a preferred embodiment, a plurality of the second metal coating layers are formed on the first metal coating layer on the substrate in parallel with each other.
本發明實施例另公開了一種具金屬鍍層之散熱器結構,其具有一基底且所述基底上是通過兩種不同材料及製程工藝成形有一第一金屬鍍層及一第二金屬鍍層;其中,所述第一金屬鍍層是通過濕式製程工藝先成形在所述基底上的鍍層,所述第二金屬鍍層是通過濺鍍製程工藝而後 成形在所述基底上的0.1至5μm厚的鍍層,所述第一金屬鍍層是形成在非所述第二金屬鍍層所覆蓋的所述基底上,且所述第二金屬鍍層由至少三個以上間隔排列的區塊所構成,且至少有兩所述區塊之間的排列間距和其他各所述區塊之間的排列間距為不等距。 The present invention also discloses a heat sink structure with a metal coating, which has a substrate and a first metal coating and a second metal coating formed on the substrate by two different materials and processes; wherein the first metal coating is a coating formed on the substrate by a wet process, and the second metal coating is a coating with a thickness of 0.1 to 5 μm formed on the substrate by a sputtering process, the first metal coating is formed on the substrate not covered by the second metal coating, and the second metal coating is composed of at least three or more spaced blocks, and the spacing between at least two of the blocks is unequal to the spacing between the other blocks.
本發明實施例亦公開了一種具金屬鍍層之散熱器結構,其具有一基底且所述基底上至少成形有一金屬鍍層,所述金屬鍍層是通過濺鍍製程工藝成形在所述基底上的0.1至5μm厚的鍍層,且所述金屬鍍層由至少三個以上間隔排列的區塊所構成,且至少有兩所述區塊之間的排列間距和其他各所述區塊之間的排列間距為不等距。 The present invention also discloses a heat sink structure with a metal coating, which has a substrate and at least one metal coating formed on the substrate. The metal coating is formed on the substrate by a sputtering process to form a 0.1 to 5 μm thick coating. The metal coating is composed of at least three or more spaced blocks, and the spacing between at least two of the blocks is unequal to the spacing between the other blocks.
為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。 To further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings of the present invention. However, the drawings provided are only for reference and description and are not used to limit the present invention.
10:基底 10: Base
13:入水口 13: Water inlet
14:出水口 14: Water outlet
15:鰭片 15: Fins
20:第一金屬鍍層 20: First metal plating layer
30:第二金屬鍍層 30: Second metal plating layer
31,31a,31b,31c,31d:區塊 31,31a,31b,31c,31d: Block
D1,D2,D3:排列間距 D1, D2, D3: Arrangement spacing
W:寬度 W: Width
L:中心線 L: Center line
圖1為本發明第一實施例的結構俯視示意圖。 Figure 1 is a schematic top view of the structure of the first embodiment of the present invention.
圖2為本發明第一實施例的結構側視示意圖。 Figure 2 is a schematic side view of the structure of the first embodiment of the present invention.
圖3為本發明第二實施例的結構俯視示意圖。 Figure 3 is a schematic top view of the structure of the second embodiment of the present invention.
圖4為本發明第二實施例的結構側視示意圖。 Figure 4 is a schematic side view of the structure of the second embodiment of the present invention.
圖5為本發明第三實施例的結構俯視示意圖。 Figure 5 is a schematic top view of the structure of the third embodiment of the present invention.
圖6為本發明第四實施例的結構側視示意圖。 Figure 6 is a schematic side view of the structure of the fourth embodiment of the present invention.
圖7為本發明第五實施例的結構側視示意圖。 Figure 7 is a schematic side view of the structure of the fifth embodiment of the present invention.
以下是通過特定的具體實施例來說明本發明所公開有關的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書 中的各項細節也可基於不同觀點與應用,在不背離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。並且,附圖中相同或類似的部位以相同的標號標示。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。 The following is a specific embodiment to illustrate the implementation methods disclosed by the present invention. The technical personnel in this field can understand the advantages and effects of the present invention from the contents disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments. The details in this specification can also be modified and changed in various ways based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are only for simple schematic illustration and are not depicted according to actual dimensions. Please note in advance. In addition, the same or similar parts in the drawings are marked with the same reference numerals. The following implementation methods will further explain the relevant technical contents of the present invention in detail, but the disclosed contents are not used to limit the scope of protection of the present invention. In addition, the term "or" used in this document may include any one or more combinations of the associated listed items as the case may be.
[第一實施例] [First embodiment]
請參閱圖1、2所示,其為本發明的第一實施例,本發明實施例提供一種具金屬鍍層之散熱器結構。根據本發明實施例所提供的具金屬鍍層之散熱器結構,其具有一基底10,且基底10上是通過兩種不同材料及製程工藝成形有一第一金屬鍍層20及一第二金屬鍍層30。
Please refer to Figures 1 and 2, which are the first embodiment of the present invention. The embodiment of the present invention provides a heat sink structure with a metal coating. According to the heat sink structure with a metal coating provided by the embodiment of the present invention, it has a
在本實施例中,基底10可以是銅/銅合金層,或是鋁/鋁合金層。第一金屬鍍層20可以是通過濕式製程工藝先成形在基底10上的鍍層,且第二金屬鍍層30可以是通過濺鍍製程工藝而後成形在第一金屬鍍層20上的0.1至5μm厚的鍍層。
In this embodiment, the
進一步地說,第一金屬鍍層20可以是通過濕式製程工藝,如化學鍍/電鍍製程工藝先成形在基底10表面。並且,第二金屬鍍層30可以是通過濺鍍製程工藝而後成形在第一金屬鍍層20上。
Furthermore, the first
在本實施例中,第一金屬鍍層20可以是以化學鍍/電鍍鎳、鎳合金,或是鎳磷合金所形成。因此,第一金屬鍍層20可以是鎳/鎳合金層,或是鎳磷合金層。並且,藉由基底10表面形成有第一金屬鍍層20,可以有效增加基底10的抗氧化性及美觀性。
In this embodiment, the first
在本實施例中,第二金屬鍍層30可以是以直接濺鍍銀或銀合金所形成。因此,第二金屬鍍層30可以是濺鍍銀/銀合金層,使得第二金屬
鍍層30可具備銀燒結之功能性,從而能透過銀燒結之功能性來與一或多個功率晶片連接。並且,由於第二金屬鍍層30是透過直接濺鍍銀/銀合金在鎳/鎳合金或鎳磷合金的表面上,進而使得第二金屬鍍層30為具高附著力且均勻度佳的極薄之鍍層。
In this embodiment, the second
進一步地說,第二金屬鍍層30可以是由至少三個以上間隔排列的區塊31所構成,且至少有兩區塊31之間的排列間距和其他各區塊31之間的排列間距為不等距。在本實施例中,第二金屬鍍層30是由四個間隔排列的區塊31所構成,可進一步區分為區塊31a,31b,31c,31d,且有兩區塊31b,31c之間的排列間距D1和其他各區塊31之間的排列間距為不等距,如和區塊31a與區塊31b之間的排列間距D2為不等距,或和區塊31d與區塊31c之間的排列間距D3為不等距。
In other words, the second
這是由於各區塊31之間的排列間距若為等距,其燒結後的收縮與其上的功率晶片運作時冷熱變化所帶來的應力衝擊較大,因此本實施例至少有兩區塊31之間的排列間距和其他各區塊31之間的排列間距為不等距,從而透過直接濺鍍銀/銀合金在鎳/鎳合金或鎳磷合金的表面上的區塊是呈不等間距排列,進而減小應力衝擊。
This is because if the arrangement spacing between the
並且,為了更確實減小應力衝擊,這些區塊31是相對於基底10之中心線L呈對稱排列,且最接近基底10之中心線L的兩區塊31之間的排列間距D1需大於其他各區塊31之間的排列間距。再者,在第二金屬鍍層30的各區塊31為矩形且尺寸(長、寬、高)相同時,最接近基底10之中心線L的兩區塊31之間的排列間距D1為各區塊31其自身沿著排列方向(即,沿著基底10長度方向)之寬度W的2倍(1.9~2.1倍)。本實施例中提及的中心線L是指經過基底10中心點,將基底10分割為左右對稱兩部分的直線。
Furthermore, in order to more effectively reduce stress impact, these
[第二實施例] [Second embodiment]
請參閱圖3、4所示,其為本發明的第二實施例。本實施例與第一實施例大致相同,其差異說明如下。 Please refer to Figures 3 and 4, which are the second embodiment of the present invention. This embodiment is roughly the same as the first embodiment, and the differences are described as follows.
在本實施例中,在遠離基底10之中心線L的方向上,各區塊31之間的排列間距逐漸減小。進一步地說,最接近基底10之中心線L的兩區塊31之間的排列間距D1為1倍時,其他各區塊31之間的排列間距依序約為排列間距D1的1/2倍(0.45~0.55倍)、1/4倍(0.2025倍~0.3025倍)、1/8倍(0.091125倍~0.166375倍)......,依此類推。也就是說,最接近基底10之中心線L的兩區塊31之間的排列間距為1倍時,其他各區塊31之間的排列間距在遠離基底10之中心線L的方向上以1/2^N倍(0.45^N~0.55^N倍)逐漸減小,其中N從1開始,遞增量為1。如此,經由實際試驗,應力的變化範圍為最小(+43.83~-46.29MPa),也就是第二金屬鍍層30各區塊31燒結後的收縮與其上的功率晶片運作時冷熱變化所帶來的應力衝擊為最小,使整體散熱器結構收縮變形的可能性變小、鍍層甚至功率晶片剝離的可能性也變小。
In this embodiment, the arrangement spacing between the
[第三實施例] [Third embodiment]
請參閱圖5所示,其為本發明的第三實施例。本實施例與第一實施例大致相同,其差異說明如下。 Please refer to Figure 5, which is the third embodiment of the present invention. This embodiment is roughly the same as the first embodiment, and the differences are described as follows.
在本實施例中,基底10為封閉式散熱結構,其具有相連通的一入水口13及一出水口14,使冷卻流體可以通過入水口13流入基底10內部,並通過出水口14從基底10內部流出,從而能將基底10吸收的熱量快速的帶走。
In this embodiment, the
再者,有多個第二金屬鍍層30可直接形成在基底10上或可形成在基底10上的第一金屬鍍層上,且多個第二金屬鍍層30彼此之間呈平行。在本實施例中,有三個第二金屬鍍層30,但是第二金屬鍍層30的數量
並不限制,可以重複出現在同一個散熱器結構上。並且,每個第二金屬鍍層30可以如第二實施例所示,但也可以如第一實施例所示。
Furthermore, there are multiple second metal coating layers 30 that can be directly formed on the
[第四實施例] [Fourth embodiment]
請參閱圖6所示,其為本發明的第四實施例。本實施例與第一實施例大致相同,其差異說明如下。 Please refer to Figure 6, which is the fourth embodiment of the present invention. This embodiment is roughly the same as the first embodiment, and the differences are described as follows.
在本實施例中,第二金屬鍍層30可直接形成在基底10上,而第一金屬鍍層20可形成在非第二金屬鍍層30所覆蓋的基底10上,或是完全沒有第一金屬鍍層20,也就是本實施例可以不具有第一金屬鍍層20。
In this embodiment, the second
[第五實施例] [Fifth embodiment]
請參閱圖7所示,其為本發明的第五實施例。本實施例與第一實施例大致相同,其差異說明如下。 Please refer to Figure 7, which is the fifth embodiment of the present invention. This embodiment is roughly the same as the first embodiment, and the differences are described as follows.
在本實施例中,為了增加散熱面積,基底10可具有多個鰭片15,並且鰭片15可一體成形於基底10表面。進一步地說,本實施例的鰭片15是以機械加工方式,例如以切削或研磨方式一體成形於基底10表面。另外,本實施例的鰭片15可以是以鍛造方式一體成形於基底10表面,但也可以是以沖壓方式一體成形於基底10表面。並且,為了有更好的散熱效果,本實施例的鰭片15是以高密度排列的針鰭片(pin-fin)。
In this embodiment, in order to increase the heat dissipation area, the
綜合以上所述,本發明提供的具金屬鍍層之散熱器結構,其至少可以通過「基底上是通過兩種不同材料及製程工藝成形有一第一金屬鍍層及一第二金屬鍍層」、「第一金屬鍍層是通過濕式製程工藝先成形在基底上的鍍層,第二金屬鍍層是通過濺鍍製程工藝而後成形在第一金屬鍍層上的0.1至5μm厚的鍍層」、「第二金屬鍍層由至少三個以上間隔排列的區塊所構成,且至少有兩區塊之間的排列間距和其他各區塊之間的排列間距為不等距」的技術方案,從而能確實減小第二金屬鍍層燒結後的收縮與 其上的功率晶片運作時冷熱變化所帶來的應力衝擊。 In summary, the heat sink structure with metal coating provided by the present invention can at least be formed by "a first metal coating layer and a second metal coating layer are formed on the substrate by two different materials and processes", "the first metal coating layer is first formed on the substrate by a wet process, and the second metal coating layer is formed on the first metal coating layer by a sputtering process The technical solution of "a 0.1 to 5μm thick coating on the second metal coating", "the second metal coating is composed of at least three or more spaced blocks, and the spacing between at least two blocks is unequal to the spacing between other blocks", can effectively reduce the shrinkage of the second metal coating after sintering and the stress impact caused by the hot and cold changes of the power chip on it during operation.
以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的申請專利範圍內。 The above disclosed contents are only the preferred feasible embodiments of the present invention, and do not limit the scope of the patent application of the present invention. Therefore, all equivalent technical changes made by using the contents of the specification and drawings of the present invention are included in the scope of the patent application of the present invention.
20:第一金屬鍍層 20: First metal plating layer
30:第二金屬鍍層 30: Second metal plating layer
31,31a,31b,31c,31d:區塊 31,31a,31b,31c,31d: Block
D1,D2,D3:排列間距 D1, D2, D3: Arrangement spacing
W:寬度 W: Width
Claims (10)
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| TWM612230U (en) * | 2021-01-08 | 2021-05-21 | 艾姆勒車電股份有限公司 | Heat dissipating substrate with sputtered layer |
| TWM628410U (en) * | 2021-07-07 | 2022-06-21 | 艾姆勒車電股份有限公司 | Cooling structure |
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| TWM612230U (en) * | 2021-01-08 | 2021-05-21 | 艾姆勒車電股份有限公司 | Heat dissipating substrate with sputtered layer |
| TWM628410U (en) * | 2021-07-07 | 2022-06-21 | 艾姆勒車電股份有限公司 | Cooling structure |
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