TWI861293B - Lapping device cleaning device - Google Patents

Abstract

The present invention is a cleaning device for a lapping device, the lapping device is provided with a rotatable upper and lower platform and a slurry supply nozzle, the slurry is supplied, and the upper and lower platforms are rotated to lap the clamped workpiece; the cleaning device for the lapping device is characterized in that: a cleaning waste liquid passage is formed on a platform support that supports the lower platform and can rotate together, and is used to discharge the waste slurry; a first and a second cleaning nozzle for spraying cleaning water are provided; The invention relates to a device for automatically cleaning a waste liquid passage formed by an annular portion located on the inner circumference of a platform support and a radial portion extending radially from the annular portion, wherein the first cleaning nozzle faces the annular portion and the second cleaning nozzle faces the outer circumference from the inner circumference of the platform support; the whole waste liquid passage can be automatically cleaned by spraying cleaning water and rotating the platform support. Thus, a cleaning device for a lapping device is provided, which can effectively remove sludge deposited in the waste liquid passage of the platform support and can automatically clean in a short time.

Description

Lapping device cleaning device

The present invention relates to a cleaning device for a lapping device.

In the past, for example, when manufacturing silicon wafers, in order to make the wafers uniformly have a predetermined thickness and obtain the necessary shape accuracy such as flatness and parallelism, lapping was performed by a lapping device (for example, see Patent Document 1). Lapping is performed by the following method: a wafer or other workpiece is sandwiched between upper and lower platforms, slurry is supplied, and the upper and lower platforms are rotated.

An example of the shape of the waste liquid passage of the platform support for supporting the lower platform of such a lapping device is shown in Fig. 5A. The platform support, which supports the lower platform and can rotate together with the lower platform, forms a waste liquid passage extending obliquely from the center toward the periphery to discharge the waste slurry (hereinafter also referred to as sludge) flowing down from the lower platform.

If the polishing is repeated, the sludge will be deposited in the waste liquid passage and hinder the discharge. Therefore, the operator regularly performs a cleaning operation to remove the sludge manually. A schematic diagram of the cleaning operation is shown in FIG5B. As shown in FIG5B, the cleaning hose is inserted into the waste liquid passage from the gap between the center and the outer periphery of the lower platform by the operator's hand, and the cleaning water is sprayed at high pressure to remove the deposited sludge. [Known Technical Literature] [Patent Literature]

Patent document 1: Japanese Patent Application No. 2016-55381

[Problems to be solved by the present invention]

However, as shown in FIG5C , when the lower platform is placed on the platform support, the operator cannot see most of the waste liquid passages. In addition, the space for entering and exiting the waste liquid passages is only a narrow space of about 70 mm wide in the center and periphery of the lower platform, making cleaning difficult. In addition, since it is a manual operation, the front end of the cleaning hose cannot be fixed and the cleaning position cannot be determined, so it cannot be said that the sludge removal effect is high. Furthermore, when there are multiple waste liquid passages extending from the center toward the periphery, the operation time is also increased. For example, in the case where there are waste liquid passages in 8 directions as shown in FIG5A , it takes about 3 hours to complete the cleaning.

In view of the above problems, the purpose of the present invention is to provide a cleaning device for a lapping device, which can effectively remove the sludge deposited in the waste liquid passage of the platform support and can be cleaned in a short time. [Technical means to solve the problem]

In order to achieve the above-mentioned problem, the present invention provides a cleaning device for a lapping device, the lapping device having a rotatable upper and lower platforms and a slurry supply nozzle for supplying slurry between the upper and lower platforms, the upper and lower platforms being rotated while supplying the slurry, and the workpiece sandwiched between the upper and lower platforms being lapped; the cleaning device for the lapping device is characterized in that: a waste liquid passage is cleaned by cleaning water, the waste liquid passage is formed on a platform support that supports the lower platform and can rotate with the lower platform, and is used to discharge the waste slurry flowing down from the lower platform; it has: a first cleaning nozzle and a second cleaning nozzle for spraying the cleaning water; and an arm portion, on which the first cleaning nozzle and the second cleaning nozzle are installed, and the first cleaning nozzle is fixed to the cleaning device. The configuration position and configuration direction of the washing nozzle and the second washing nozzle; relative to the waste liquid passage formed by the annular portion located on the inner circumference of the rotation axis surrounding the platform support, and one or more radial portions extending radially from the annular portion to the outer circumference, the first washing nozzle is directed toward the annular portion, and the second washing nozzle is directed from the inner circumference of the platform support to the outer circumference; by spraying the washing water from the fixedly configured first washing nozzle and the second washing nozzle, and rotating the platform support and the lower platform, the entire area of the annular portion can be automatically washed by the washing water from the first washing nozzle, and the entire area of the radial portion can be automatically washed by the washing water from the second washing nozzle.

In this way, if the cleaning water is sprayed from the fixedly arranged first cleaning nozzle and the second cleaning nozzle in the above two directions, and the platform support and the lower platform are rotated to clean the device of the waste liquid passage, the cleaning water can stably rinse the entire area of the annular part and the radial part, so the sludge deposited in these areas can be removed effectively and can be cleaned uniformly in a short time. Moreover, it can be cleaned automatically, which is quite simple.

In addition, the first cleaning nozzle and the second cleaning nozzle can spray the cleaning water in a fan shape. If the cleaning nozzle can spray the cleaning water in a fan shape, it can clean uniformly over a wide range, so a higher sludge removal effect can be obtained. [Effects of the present invention]

As described above, according to the present invention, the sludge in the waste liquid passage of the platform support can be effectively and stably removed, and can be automatically cleaned uniformly in a short time, which is quite simple.

The inventor of this case carefully examined the cross-sectional shape of the platform support and the structure of the inlet and outlet points to determine how to allow the cleaning water to stably flush the entire waste liquid channel. As a result, it was found that by spraying the cleaning water from a fixedly configured nozzle in two directions (i.e., spraying in a ring-shaped portion in the center and in a radial portion from the center toward the periphery), the sludge can flow out, thereby having a high sludge removal effect and being able to clean in a short time, and thus completing the present invention.

Hereinafter, the present invention will be described in detail with reference to the drawings as an example of an implementation mode, but the present invention is not limited to this type. FIG. 1F is a schematic diagram showing an example of a grinding device to which the cleaning device of the present invention can be applied. The upper side is a longitudinal section view, and the lower side is a top view. In addition, the platform support located further below the lower platform in the longitudinal section view is omitted, and the upper platform and the slurry supply nozzle are omitted in the top view. The grinding device 11 has a rotatable upper platform 12 and a lower platform 13. The lower platform 13 is provided with a sun gear 14 on the top of its center portion, and an annular inner gear 15 is provided on its edge portion. The upper platform 12 is made to be able to rise and fall. In addition, a gear portion that engages with the above-mentioned solar gear 14 and inner gear 15 is formed on the outer peripheral surface of the carrier 16 holding the wafer W (processed object), and the entire structure becomes a gear structure. One or more holding holes 17 are provided on the carrier 16. The polished wafer W is inserted into the holding hole 17 and held. One or more carriers 16 holding the wafer W are arranged and sandwiched between the upper platform 12 and the lower platform 13 that are lowered from above, and can rotate and revolve by the rotation of the lower platform 13, etc. In addition, a slurry supply nozzle 18 is disposed above the upper platform 12 , and slurry can be supplied from the slurry supply nozzle 18 to between the wafer W and the upper and lower platforms 12 , 13 via a through hole 19 provided in the upper platform 12 .

FIG. 1E is a schematic diagram showing an example of a platform support for supporting the lower platform and rotating it in the above-mentioned lapping device. On the platform support 20, a waste liquid passage 23 is formed, which is composed of an annular portion 21 and one or more (here, 8) radial portions 22; the annular portion 21 is located on the inner circumference of the rotation axis surrounding the platform support, and the radial portion 22 extends radially from the annular portion toward the outer circumference. It becomes a structure for receiving sludge from the lower platform 13 and discharging it; the radial portion 22 is inclined downward toward the outer circumference. In addition, the number of radial portions 22 can be appropriately determined according to the amount of sludge to be discharged, so the upper limit number is not particularly limited, for example, it can be made less than 60.

Next, the cleaning device of the present invention applied to the lapping device shown in FIG. 1E and FIG. 1F is described. FIG. 1A shows a top view of the cleaning device, and FIG. 1B shows a side view of the cleaning device. They are all configurations for the lapping device. The cleaning device 1 has a first cleaning nozzle 2, a second cleaning nozzle 3, and an arm 4; the first cleaning nozzle 2 faces the annular portion 21 of the platform support 20, and the second cleaning nozzle 3 faces the outer peripheral direction from the inner peripheral side of the platform support 20. The number of each can be 1 or plural. The configuration position and configuration direction of the first cleaning nozzle 2 and the second cleaning nozzle 3 are fixed by the arm 4, and the arm 4 is further fixed to the outer peripheral plate 6 by clamping the back plate 5. The peripheral plate 6 is a cylindrical member fixedly arranged in a manner of surrounding the platform support 20; the clamping back plate 5, the arm 4, the first cleaning nozzle 2 and the second cleaning nozzle 3 are sequentially installed as described above, thereby fixing the first cleaning nozzle 2 and the second cleaning nozzle 3.

The fixing of the first cleaning nozzle 2, the second cleaning nozzle 3, and the arm 4 is explained in more detail using a figure that simplifies the positional relationship between them for the purpose of explanation. FIG. 1C shows a top view of the cleaning device, and FIG. 1D shows a side view of the cleaning device. The clamping back plate 5 of the cleaning device can be adjusted in length in conjunction with the peripheral plate 6, for example, after being clamped on the peripheral plate 6 by the extension and contraction of a spring, it is fixed to the peripheral plate 6 by screws or the like. The arm 4 of the cleaning device 1 can adjust the position of the nozzle by sliding in the horizontal direction; the front end of the arm 4 having the first cleaning nozzle 2 and the second cleaning nozzle 3 can adjust the height by sliding in the vertical direction. In addition, by rotating the first cleaning nozzle 2 and the second cleaning nozzle 3, the spraying direction of the cleaning water can also be adjusted. By such adjustments, the front end of the arm 4 is inserted from the gap in the center of the lower platform into the waste liquid passage, and the spraying position of the first cleaning nozzle 2 can be adjusted to face the annular portion 21, and the spraying position of the second cleaning nozzle 3 can be fixed to face the radial portion 22. In addition, the clamping back plate 5 can also be reinforced with reinforcing materials. It is effective in preventing the position of the arm 4 from being offset due to the rise of the cleaning water spray. Naturally, the fixing method of the first cleaning nozzle 2 and the second cleaning nozzle 3 by the arm 4 is not limited to this type and can be appropriately determined. For example, the arm 4 can also be fixed to the floor or wall, other fixed components, etc.

FIG2 shows the spraying range of the cleaning water performed by the cleaning device 1. As shown in FIG2, the cleaning water from the first cleaning nozzle 2 is sprayed on the annular portion 21, and the cleaning water from the second cleaning nozzle 3 is sprayed on the radial portion 22. In this way, the cleaning water is sprayed while the configuration positions and configuration directions of the first cleaning nozzle 2 and the second cleaning nozzle 3 are fixed, and the platform support 20 and the lower platform 13 are rotated, thereby automatically performing the cleaning operation. Since the cleaning water from the first cleaning nozzle 2 is sprayed on the entire annular portion 21, and the cleaning water from the second cleaning nozzle 3 is sprayed on the entire radial portion 22, the sludge in the entire waste liquid passage can be effectively removed. In addition, due to the high sludge removal effect, the operation time is shortened, and since it is automatically operated, no operator is required during cleaning.

In addition, the first cleaning nozzle 2 and the second cleaning nozzle 3 (especially the second cleaning nozzle 3) are fan-shaped nozzles that can spray cleaning water in a fan shape. If it is a fan-shaped nozzle, the cleaning water is sprayed in a wide range, so a higher sludge removal effect can be obtained. The structure of these fan-shaped nozzles and the straight-forward nozzle that can spray cleaning water in a straight line is explained. FIG. 3A shows a front view of the spray port of the fan-shaped nozzle, FIG. 3B shows a spraying explanation diagram in the A-A section of the fan-shaped nozzle, FIG. 3C shows a front view of the spray port of the straight-forward nozzle, and FIG. 3D shows a spraying explanation diagram in the B-B section of the straight-forward nozzle. As shown in Fig. 3A and Fig. 3B, the fan-shaped nozzle has a groove that expands in a fan shape from the central nozzle, and the sprayed cleaning water spreads along the groove, so the spray shape becomes a fan shape. In contrast, in the straight nozzle, as shown in Fig. 3C and Fig. 3D, the cleaning water is directly sprayed from the center of the nozzle, so the spray shape becomes a straight line.

FIG3E is an example of the configuration of the fan-shaped nozzle toward the radial portion. In addition, the diffusion direction of the cleaning water of the fan-shaped nozzle can be changed by contracting the cleaning nozzle, but it is more appropriate to configure it in a manner that the cleaning water expands longitudinally. In this case, as shown in FIG3E, the cleaning water is sprayed on the entire waste liquid channel in conjunction with the rotation of the platform support, so a higher sludge removal effect can be obtained compared to the configuration in a manner that expands horizontally.

The cleaning method using the cleaning device 1 of the present invention as described above is described. First, the arm 4 is mounted on the clamping back plate 5, and the first cleaning nozzle 2 and the second cleaning nozzle 3 are mounted on the front end of the arm 4. Further, the clamping back plate 5 is mounted on the fixed peripheral plate 6. After adjusting the horizontal length of the arm, the vertical height of the front end on which the nozzle is mounted is adjusted, and the front end is inserted from the central gap of the lower platform into the waste liquid passage. Then the position and direction of the cleaning nozzle are fixed. In this state, the platform support and the lower platform are rotated, and cleaning water is sprayed. In this way, cleaning water is sprayed in two directions, the annular part and the radial part (peripheral direction), and the entire waste liquid passage is automatically cleaned. In addition, as the cleaning water sprayed from the cleaning nozzle, water, for example, can be used. If high-pressure water is used, a higher sludge removal effect can be obtained. The spraying force itself is not particularly limited, and for example, it can be made 20 MPa or more. [Example]

The present invention is further described below based on the embodiments. These embodiments are only for illustration and should not be interpreted as limiting.

(Example) Prepare the cleaning device of the present invention as shown in Figures 1A to 1D, 3A, and 3B. The first cleaning nozzle and the second cleaning nozzle of the cleaning device are configured to spray cleaning water in a fan-shaped manner, and the second cleaning nozzle is configured to diffuse the cleaning water longitudinally. High-pressure water of 20 MPa is sprayed from the first cleaning nozzle and the second cleaning nozzle, and the platform support is rotated at 2 rpm to perform automatic cleaning operations, and the annual cleaning time and sludge removal amount are measured.

(Comparative Example) The cleaning operation is performed under the same conditions as in the embodiment, except that the cleaning device of the present invention is not used, but the cleaning operation is performed manually as shown in FIG5B.

As shown in FIG4 , the annual cleaning time in the embodiment is 112 hours, and the annual sludge removal is 448 kg. In the comparative example, the annual cleaning time is 336 hours, and the annual sludge removal is 134 kg. Compared with the conventional method (comparative example) in which the operator uses a cleaning hose for cleaning, the cleaning device of the present invention improves the annual cleaning time to 1/3, and the annual sludge removal is improved by about 234%.

In addition, the present invention is not limited to the above-mentioned embodiments. The above-mentioned embodiments are illustrative only, and those having substantially the same structure and achieving the same effects as the technical concept described in the scope of the invention application of the present invention are all included in the technical scope of the present invention.

1: Cleaning device 2: First cleaning nozzle 3: Second cleaning nozzle 4: Arm 5: Clamping back plate 6: Peripheral plate 11: Polishing device 12: Upper platform 13: Lower platform 14: Sun gear 15: Inner gear 16: Carrier 17: Holding hole 18: Slurry supply nozzle 19: Through hole 20: Platform support 21: Ring 22: Radial 23: Waste liquid passage W: Wafer

FIG. 1A is a top view showing an example of the cleaning device of the present invention. FIG. 1B is a side view showing an example of the cleaning device of the present invention. FIG. 1C is a schematic top view showing the vicinity of the cleaning device of the present invention. FIG. 1D is a schematic side view showing the vicinity of the cleaning device of the present invention. FIG. 1E is a schematic diagram showing an example of a platform support of a lapping device to which the cleaning device of the present invention can be applied. FIG. 1F is a schematic diagram showing an example of a lapping device to which the cleaning device of the present invention can be applied. FIG. 2 is a schematic diagram showing the cleaning range of the cleaning device of the present invention. FIG. 3A is a front view showing the nozzle of a fan-shaped nozzle that can spray cleaning water in a fan shape. FIG. 3B is an explanatory diagram showing a spray structure of a fan-shaped nozzle that can spray washing water in a fan shape. FIG. 3C is a front view showing a spray port of a straight-forward nozzle that can spray washing water in a straight line. FIG. 3D is an explanatory diagram showing a spray structure of a straight-forward nozzle that can spray washing water in a straight line. FIG. 3E is a schematic diagram showing an example of a cleaning range using a fan-shaped nozzle. FIG. 4 is a graph showing the annual cleaning time and sludge removal amount of an embodiment and a comparative example. FIG. 5A is a schematic diagram showing an example of a platform support of a lapping device. FIG. 5B is a schematic diagram showing an example of a cleaning operation performed by a known operator. FIG. 5C is a schematic diagram of a space of a waste liquid passage that can enter and exit the platform support.

1: Cleaning device

2: First clean the nozzle

3: Second cleaning nozzle

4: Arms

5: Clamp the back panel

6: Peripheral plate

20: Platform support

21: Ring-shaped part

Claims (2)

A cleaning device for a lapping device, the lapping device comprises a rotatable upper and lower platforms, and a slurry supply nozzle for supplying slurry between the upper and lower platforms, the upper and lower platforms are rotated while supplying the slurry, and the workpiece sandwiched between the upper and lower platforms is lapped; The cleaning device for the lapping device is characterized in that: The waste liquid passage is cleaned by cleaning water, and the waste liquid passage is formed on a platform support that supports the lower platform and can rotate with the lower platform, and is used to discharge the waste slurry flowing down from the lower platform; It comprises: a first cleaning nozzle and a second cleaning nozzle, which spray the cleaning water; and an arm, which is used to install the first cleaning nozzle and the second cleaning nozzle, and to connect the first cleaning nozzle and the second cleaning nozzle. The configuration position and configuration direction of the cleaning nozzle are fixed; Relative to the waste liquid passage formed by the annular portion located on the inner circumference of the rotation axis surrounding the platform support, and one or more radial portions extending radially from the annular portion to the outer circumference, the first cleaning nozzle is directed toward the annular portion, and the second cleaning nozzle is directed from the inner circumference of the platform support to the outer circumference; By spraying the cleaning water from the fixedly configured first cleaning nozzle and the second cleaning nozzle, and rotating the platform support and the lower platform, the entire area of the annular portion can be automatically cleaned by the cleaning water from the first cleaning nozzle, and the entire area of the radial portion can be automatically cleaned by the cleaning water from the second cleaning nozzle. A cleaning device for a lapping device as claimed in claim 1, wherein the first cleaning nozzle and the second cleaning nozzle can spray the cleaning water in a fan shape.

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