TWI859351B - Adhesive film sticking device - Google Patents
Adhesive film sticking device Download PDFInfo
- Publication number
- TWI859351B TWI859351B TW109136532A TW109136532A TWI859351B TW I859351 B TWI859351 B TW I859351B TW 109136532 A TW109136532 A TW 109136532A TW 109136532 A TW109136532 A TW 109136532A TW I859351 B TWI859351 B TW I859351B
- Authority
- TW
- Taiwan
- Prior art keywords
- adhesive film
- annular frame
- film
- sheet
- wafer
- Prior art date
Links
Classifications
-
- H10P72/0442—
-
- H10P72/7402—
-
- H10P72/7416—
Landscapes
- Engineering & Computer Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Abstract
[課題]在膠膜黏貼裝置中,以不產生皺摺及氣泡之方式將圓形的膠膜黏貼於環狀框架及晶圓。[解決手段]一種膠膜黏貼裝置,其包含:保持台,其具有環狀框架保持部、與框架開口內的晶圓保持部;剝離板(peel plate),其在輸出膠膜單元的單元與捲繞已剝離膠膜的薄片的單元之間,使膠膜單元彎曲並從薄片剝離膠膜;膠膜黏貼輥;以及噴嘴,其在相對於膠膜黏貼輥的旋轉軸呈正交的方向,從比環狀框架保持部所保持的環狀框架的外周更外側,朝向黏貼輥噴射空氣。[Topic] In the adhesive film laminating device, a circular adhesive film is attached to a ring frame and a wafer in a way that does not generate wrinkles or bubbles. [Solution] A film pasting device includes: a holding table having an annular frame holding portion and a wafer holding portion in an opening of the frame; a peel plate, which is between a unit for outputting a film unit and a unit for winding a sheet from which the film has been peeled, and which bends the film unit and peels the film from the sheet; a film pasting roller; and a nozzle, which sprays air toward the pasting roller from an outer side than an outer periphery of an annular frame held by the annular frame holding portion in a direction orthogonal to a rotation axis of the film pasting roller.
Description
本發明係關於一種膠膜黏貼裝置,其將膠膜黏貼於環狀框架與晶圓。The present invention relates to an adhesive film pasting device, which pastes the adhesive film on a ring frame and a wafer.
例如,如專利文獻1所揭示,有一種膠膜黏貼裝置,其於具備圓形開口之環狀框架黏貼圓形的膠膜(例如,切割膠膜)以塞住開口,並將晶圓黏貼於從開口露出之膠膜,藉由膠膜而使環狀框架與晶圓一體化。For example, as disclosed in Patent Document 1, there is a film pasting device that pastes a circular film (e.g., a cutting film) on a ring-shaped frame having a circular opening to plug the opening, and pastes a wafer on the film exposed from the opening, thereby integrating the ring-shaped frame and the wafer through the film.
在如上述的膠膜黏貼裝置中會使用膠膜單元,所述膠膜單元係將圓形的膠膜於帶狀保護薄片(以下稱為薄片)的長度方向等間隔地排列並黏貼而一體化者。此膠膜單元係以圓形的膠膜被配置於內側之方式,對捲筒捲繞成輥狀。接著,在已捲繞此輥狀膠膜單元的捲筒被貫穿設置於膠膜黏貼裝置的軸之狀態下,從輥狀膠膜單元的外周的一端握持薄片而拉出,並從膠膜單元的薄片側按壓剝離板(peel plate)以使薄片彎曲,藉此從此薄片剝離膠膜的一端。In the above-mentioned adhesive film sticking device, an adhesive film unit is used, which is a device that arranges and sticks circular adhesive films at equal intervals in the longitudinal direction of a strip-shaped protective sheet (hereinafter referred to as a sheet) to form an integrated structure. The adhesive film unit is wound into a roll shape on a reel in such a way that the circular adhesive film is arranged on the inner side. Next, when the roll on which the rolled adhesive film unit is wound is passed through a shaft provided in the adhesive film pasting device, a sheet is gripped from one end of the outer periphery of the rolled adhesive film unit and pulled out, and a peel plate is pressed from the sheet side of the adhesive film unit to bend the sheet, thereby peeling one end of the adhesive film from the sheet.
接著,將從薄片剝離的圓形膠膜的一端定位於環狀框架上,利用轉動的輥將膠膜推抵於環狀框架,藉此將膠膜的一端黏貼於環狀框架。進一步,一邊將薄片剝離一邊利用輥推抵膠膜,而黏貼於晶圓的上表面與環狀框架的上表面。 [習知技術文獻] [專利文獻]Next, one end of the circular adhesive film peeled off from the sheet is positioned on the annular frame, and the adhesive film is pushed against the annular frame by a rotating roller, thereby adhering one end of the adhesive film to the annular frame. Furthermore, the sheet is peeled off while the adhesive film is pushed against the roller, and is adhered to the upper surface of the wafer and the upper surface of the annular frame. [Known technical literature] [Patent literature]
專利文獻1:日本特開2011-086687號公報Patent document 1: Japanese Patent Application Publication No. 2011-086687
[發明所欲解決的課題] 如上述,為了一邊從薄片剝離膠膜一邊進行黏貼,而於剝離板與輥之間具有間隙。而且,在膠膜對晶圓與環狀框架的黏貼結束後,以因自體重量而從薄片掉落之方式分離的膠膜會因本身的重量而黏貼於環狀框架,其後,輥會將膠膜推抵於環狀框架。因此,膠膜會在有皺摺之狀態下黏貼於環狀框架、或會在膠膜與環狀框架之間產生氣泡。[Problems to be solved by the invention] As described above, in order to peel the adhesive film from the sheet while performing the pasting, a gap is provided between the peeling plate and the roller. Furthermore, after the adhesive film is pasted to the wafer and the ring frame, the adhesive film separated from the sheet by its own weight will adhere to the ring frame by its own weight, and then the roller will push the adhesive film against the ring frame. Therefore, the adhesive film will adhere to the ring frame in a wrinkled state, or bubbles will be generated between the adhesive film and the ring frame.
黏貼於環狀框架之膠膜中有皺摺的部分或有氣泡的部分係黏貼力弱,在擴張膠膜並分割晶圓之際,會有未充分擴張膠膜的情況。而且,因此會產生晶片彼此接觸而使晶片崩缺、或膠膜從環狀框架剝離之問題。If there are wrinkles or bubbles in the adhesive film attached to the ring frame, the adhesive force is weak, and when the adhesive film is expanded and the wafers are divided, the adhesive film may not be fully expanded. In addition, this may cause the chips to contact each other and cause chip breakage, or the adhesive film may be peeled off from the ring frame.
因此,本發明之目的為提供一種膠膜黏貼裝置,其可以不產生皺摺及氣泡之方式將圓形的膠膜黏貼於環狀框架及晶圓。Therefore, the object of the present invention is to provide an adhesive film pasting device, which can paste a circular adhesive film on a ring frame and a wafer in a manner without generating wrinkles and bubbles.
[解決課題的技術手段] 根據本發明一態樣,提供一種膠膜黏貼裝置,其將帶狀的膠膜單元中已從薄片剝離的膠膜黏貼於環狀框架與配置於該環狀框架的開口之晶圓,藉由該膠膜而使該環狀框架與該晶圓一體化,該帶狀的膠膜單元是在帶狀的該薄片之長度方向排列並黏貼圓形的該膠膜,所述膠膜黏貼裝置包含:保持台,其具有保持該環狀框架之環狀框架保持部、與在該環狀框架的該開口內保持該晶圓之晶圓保持部;輸出單元,其一邊旋轉一邊輸出該膠膜單元;捲繞單元,其將已剝離該膠膜的該薄片一邊旋轉一邊捲繞;剝離板,其在該輸出單元與該捲繞單元之間接觸該薄片,以該薄片成為內側之方式使該膠膜單元彎曲,並從該薄片剝離該膠膜;黏貼輥,其將已從該薄片剝離的該膠膜一邊推抵於該環狀框架與該晶圓一邊進行黏貼;以及噴射噴嘴,其在相對於該黏貼輥之旋轉軸呈正交的方向,從比該環狀框架保持部所保持的該環狀框架的外周更外側,朝向該黏貼輥噴射空氣,所述膠膜黏貼裝置係一邊藉由從該噴射噴嘴噴射之空氣而將從該薄片剝離且要垂落的該膠膜推抵於該黏貼輥的側面,一邊使該黏貼輥轉動,而將該膠膜黏貼於該環狀框架與該晶圓。[Technical means for solving the problem] According to one aspect of the present invention, a kind of adhesive film pasting device is provided, which pastes the adhesive film peeled off from the thin sheet in the strip-shaped adhesive film unit to the ring-shaped frame and the wafer arranged at the opening of the ring-shaped frame, and integrates the ring-shaped frame and the wafer by the adhesive film. The strip-shaped adhesive film unit is arranged in the length direction of the strip-shaped thin sheet. The adhesive film pasting device comprises: a holding table having an annular frame holding part for holding the annular frame and a wafer holding part for holding the wafer in the opening of the annular frame; an output unit for outputting the adhesive film unit while rotating; a winding unit for rotating and winding the thin sheet from which the adhesive film has been peeled off; and a peeling plate. , which contacts the sheet between the output unit and the winding unit, bends the adhesive film unit in a manner that the sheet becomes the inner side, and peels the adhesive film from the sheet; a pasting roller, which pushes one side of the adhesive film that has been peeled off from the sheet against the annular frame and the wafer side for pasting; and a spray nozzle, which sprays the adhesive film in a direction orthogonal to the rotation axis of the pasting roller. The air is sprayed toward the sticking roller from the outer side than the outer periphery of the annular frame held by the annular frame holding portion. The adhesive film sticking device pushes the adhesive film that is peeled off from the sheet and is about to fall against the side surface of the sticking roller by the air sprayed from the spray nozzle, and at the same time rotates the sticking roller to stick the adhesive film to the annular frame and the wafer.
前述噴射噴嘴較佳為沿著保持於前述環狀框架保持部之前述環狀框架的上表面噴射空氣。The spray nozzle preferably sprays air along the upper surface of the annular frame held by the annular frame holding portion.
從前述噴射噴嘴噴射之空氣的噴射角度較佳為:在將與前述環狀框架的上表面平行的方向設為0度時,為0度至向上45度的範圍內。The spray angle of the air sprayed from the spray nozzle is preferably within a range of 0 degrees to 45 degrees upward when the direction parallel to the upper surface of the annular frame is set to 0 degrees.
[發明功效] 本發明之膠膜黏貼裝置具備噴射噴嘴,所述噴射噴嘴係在相對於黏貼輥之旋轉軸呈正交的方向,從比環狀框架保持部所保持的環狀框架的外周更外側,朝向黏貼輥噴射空氣,因此可一邊藉由從噴射噴嘴噴射之空氣而將從薄片剝離且要垂落之膠膜推抵於黏貼輥的側面,一邊使黏貼輥轉動,而將膠膜黏貼於環狀框架與晶圓。藉此,可以不產生皺摺或氣泡之方式,將膠膜黏貼於環狀框架與晶圓。因此,在擴張膠膜並分割晶圓之際,可防止已分割之相鄰晶片彼此接觸,而不會產生晶片崩缺。[Effect of the invention] The adhesive film pasting device of the present invention is equipped with a spray nozzle, and the spray nozzle sprays air toward the pasting roller from the outer side of the annular frame held by the annular frame holding part in a direction orthogonal to the rotation axis of the pasting roller, so that the adhesive film that is peeled off from the sheet and is about to fall can be pushed against the side surface of the pasting roller by the air sprayed from the spray nozzle, while the pasting roller is rotated, so that the adhesive film can be pasted to the annular frame and the wafer. In this way, the adhesive film can be pasted to the annular frame and the wafer in a manner that does not generate wrinkles or bubbles. Therefore, when the film is expanded and the wafer is separated, it is possible to prevent adjacent separated chips from contacting each other and prevent chip breakage.
在噴射噴嘴沿著保持於環狀框架保持部之環狀框架的上表面噴射空氣之情形中,能藉由空氣而將膠膜更確實地推抵於黏貼輥的側面。In the case where the spray nozzle sprays air along the upper surface of the annular frame held by the annular frame holding portion, the adhesive film can be more surely pushed against the side surface of the laminating roller by the air.
在將與環狀框架的上表面平行的方向設為0度時,將從該噴射噴嘴噴射之空氣的噴射角度設為0度至向上45度的範圍內之情形中,能藉由空氣而將膠膜更確實地推抵於黏貼輥的側面。When the direction parallel to the upper surface of the annular frame is set to 0 degrees, and the spray angle of the air sprayed from the spray nozzle is set to within the range of 0 degrees to 45 degrees upward, the adhesive film can be pushed against the side of the laminating roller more reliably by the air.
圖1所示之膠膜單元TU例如成為帶狀膠膜T5與帶狀的保護薄片T1貼合的構造,所述帶狀膠膜T5係以由聚烯烴系樹脂等所構成之基材T51與形成於該基材T51的一側的面之黏著層T52所構成,所述保護薄片T1係保護黏著層T52(以下稱為薄片T1)。 本實施方法所示之帶狀膠膜T5係預先因應成為黏貼對象之圓環板狀的環狀框架F(參照圖2)的開口徑而被預裁切為多個圓形狀,多個對應於晶圓W之圓形形狀的圓形的膠膜T2係成為在薄片T1的長度方向(圖1中為X軸方向)隔著等間隔地被黏貼於薄片T1之狀態。如圖1所示,上述膠膜單元TU成為於圓筒T3以膠膜T2為內側地捲繞成輥狀的輥膠膜之狀態。此外,膠膜T2的直徑大於環狀框架F之圓形開口(參照圖2)的內徑且小於環狀框架F的外徑。The adhesive film unit TU shown in FIG1 is, for example, a structure in which a strip-shaped adhesive film T5 and a strip-shaped protective sheet T1 are bonded together. The strip-shaped adhesive film T5 is composed of a base material T51 composed of a polyolefin resin or the like and an adhesive layer T52 formed on one side of the base material T51. The protective sheet T1 is a protective adhesive layer T52 (hereinafter referred to as sheet T1). The tape-shaped adhesive film T5 shown in the present embodiment is pre-cut into a plurality of circular shapes in accordance with the opening diameter of the annular frame F (see FIG. 2 ) to be pasted, and a plurality of circular adhesive films T2 corresponding to the circular shape of the wafer W are pasted to the thin film T1 at equal intervals in the length direction of the thin film T1 (the X-axis direction in FIG. 1 ). As shown in FIG. 1 , the above-mentioned adhesive film unit TU is in the form of a rolled adhesive film rolled up on a cylinder T3 with the adhesive film T2 as the inner side. In addition, the diameter of the adhesive film T2 is larger than the inner diameter of the circular opening of the annular frame F (see FIG. 2 ) and smaller than the outer diameter of the annular frame F.
圖2所示之本發明之膠膜黏貼裝置1具備基台10,可形成藉由圓形的膠膜T2而使環狀框架F與晶圓W一體化之工件組,所述基台10配設有後述的各發明構成要件且長度方向為X軸方向。The adhesive film sticking device 1 of the present invention shown in FIG. 2 has a base 10, which can form a workpiece assembly in which a ring frame F and a wafer W are integrated by a circular adhesive film T2. The base 10 is provided with the constituent elements of the invention described below and has a longitudinal direction in the X-axis direction.
如圖2所示,環狀框架F係由預定金屬(例如SUS等)所構成,且成為環狀平板狀,並且具備內徑大於晶圓W外徑的圓形開口。又,例如使環狀框架F其外周的一部分切成為平坦,藉此具備平行相向的一對第一平坦面與一對第二平坦面,一對第一平坦面及一對第二平坦面被使用於環狀框架F之定位。As shown in FIG. 2 , the annular frame F is made of a predetermined metal (such as SUS) and is in the shape of an annular flat plate, and has a circular opening whose inner diameter is larger than the outer diameter of the wafer W. In addition, for example, a portion of the outer periphery of the annular frame F is cut flat, thereby having a pair of first flat surfaces and a pair of second flat surfaces facing each other in parallel, and the pair of first flat surfaces and the pair of second flat surfaces are used for positioning the annular frame F.
晶圓W例如為由矽母材等所構成之圓形的半導體晶圓,在圖2中,朝向下方之晶圓W的正面Wa(下表面Wa)係於被劃分成格子狀的區域中形成有多個元件,並黏貼有未圖示之保護膠膜而被保護。晶圓W的背面Wb(上表面Wb)成為黏貼膠膜T2的面。此外,晶圓W除了矽以外也可由砷化鎵、藍寶石、氮化鎵、陶瓷、樹脂或碳化矽等所構成,也可為矩形的封裝基板等。Wafer W is, for example, a circular semiconductor wafer made of a silicon mother material, etc. In FIG. 2 , the front surface Wa (lower surface Wa) of wafer W facing downward is formed with a plurality of components in a grid-shaped area, and is protected by a protective adhesive film not shown in the figure. The back surface Wb (upper surface Wb) of wafer W becomes the surface to which the adhesive film T2 is attached. In addition, wafer W may be made of gallium arsenide, sapphire, gallium nitride, ceramic, resin or silicon carbide, etc., in addition to silicon, and may also be a rectangular packaging substrate, etc.
膠膜黏貼裝置1之基台10的上表面係成為水平面,基台10的後方側(+X方向側)上方配設有輸出單元80,所述輸出單元80係一邊旋轉一邊輸出膠膜單元TU。輸出單元80係在使旋轉軸插通於圖1所示之成為輥狀的膠膜單元TU的圓筒T3之狀態下,可旋轉地支撐膠膜單元TU,所述旋轉軸的軸方向為在水平面中與X軸方向正交之Y軸方向。伴隨著該旋轉軸進行旋轉,輥狀的膠膜單元TU會旋轉,膠膜單元TU會成為帶狀並向剝離板15輸出。此外,在剝離板15與輸出單元80之間,配設有防止膠膜單元TU鬆弛等之未圖示的夾輥等。The upper surface of the base 10 of the adhesive film pasting device 1 is a horizontal plane, and an output unit 80 is arranged above the rear side (+X direction side) of the base 10, and the output unit 80 outputs the adhesive film unit TU while rotating. The output unit 80 supports the adhesive film unit TU rotatably in a state where the rotating shaft is inserted into the cylinder T3 of the rolled adhesive film unit TU shown in FIG. 1, and the axial direction of the rotating shaft is the Y-axis direction orthogonal to the X-axis direction in the horizontal plane. As the rotating shaft rotates, the rolled adhesive film unit TU rotates, and the adhesive film unit TU becomes a strip and is output to the peeling plate 15. In addition, between the peeling plate 15 and the output unit 80, a clamping roller (not shown) is provided to prevent the adhesive film unit TU from loosening.
在成為輸出單元80的下方後方之位置,配設有捲繞單元82,所述捲繞單元82係一邊將已剝離膠膜T2的薄片T1旋轉一邊進行捲繞,在成為輸出單元80的前方斜下方之位置配設有剝離板15,所述剝離板15係在輸出單元80與捲繞單元82之間接觸薄片T1,並以薄片T1為內側而使膠膜單元TU彎曲,並使膠膜T2從薄片T1剝離。A winding unit 82 is provided at a position below and behind the output unit 80. The winding unit 82 winds up the sheet T1 from which the rubber film T2 has been peeled while rotating it. A peeling plate 15 is provided at a position obliquely below and in front of the output unit 80. The peeling plate 15 contacts the sheet T1 between the output unit 80 and the winding unit 82, bends the rubber film unit TU with the sheet T1 as the inner side, and peels the rubber film T2 from the sheet T1.
剝離板15例如為在從Y軸方向觀看之情形中成為側視三角形狀之斜板,在Y軸方向延伸薄片T1的寬度(Y軸方向長度)以上之長度。為了不傷害膠膜單元TU,剝離板15的前端側可蜷曲成R狀。如圖3、4所示,剝離板15可利用其前端側推壓薄片T1並使其彎曲成銳角,藉此從薄片T1剝離膠膜T2。The peeling plate 15 is, for example, an inclined plate that is in a triangular shape when viewed from the Y-axis direction, and extends in the Y-axis direction by a length greater than the width of the sheet T1 (the length in the Y-axis direction). In order not to damage the film unit TU, the front end of the peeling plate 15 may be curled into an R shape. As shown in FIGS. 3 and 4 , the peeling plate 15 can use its front end to press the sheet T1 and bend it into a sharp angle, thereby peeling the film T2 from the sheet T1.
例如,如圖5所示,剝離板15係與黏貼輥30相向,並透過板可動構件161而被配設於斜上方延伸之板基台160上,所述黏貼輥30係一邊將已從薄片T1剝離的膠膜T2推抵於環狀框架F與晶圓W,一邊進行黏貼。板可動構件161係藉由未圖示之滾珠螺桿機構等而使板基台160可在斜上下方向往返移動,藉此可使剝離板15相對於膠膜單元TU定位於適當位置。此外,在圖2~圖4中,省略使剝離板15可動之板基台160及板可動構件161。For example, as shown in FIG. 5 , the peeling plate 15 is disposed on a plate base 160 extending obliquely upward and facing the sticking roller 30 through a plate movable member 161. The sticking roller 30 pushes the adhesive film T2 that has been peeled off from the sheet T1 against the annular frame F and the wafer W while sticking. The plate movable member 161 enables the plate base 160 to move back and forth in an oblique vertical direction by a ball screw mechanism (not shown), thereby positioning the peeling plate 15 at an appropriate position relative to the adhesive film unit TU. In addition, in FIGS. 2 to 4 , the plate base 160 and the plate movable member 161 that enable the peeling plate 15 to move are omitted.
如圖2所示,藉由剝離板15,已剝離膠膜T2之薄片T1係被送往剝離板15的後方(+X方向)。然後,藉由捲繞單元82使薄片T1捲繞成輥狀,所述捲繞單元82係藉由馬達等旋轉驅動源且將Y軸方向的旋轉軸作為軸而進行旋轉。捲繞單元82之該旋轉驅動源例如藉由扭矩控制而控制從輥狀的膠膜單元TU拉出薄片T1之速度。此外,在捲繞單元82與剝離板15之間配設有薄片支撐輥820,藉由薄片支撐輥820,使已剝離膠膜T2的薄片T1不會鬆弛。As shown in FIG2 , the sheet T1 from which the rubber film T2 has been peeled off is sent to the rear (+X direction) of the peeling plate 15 by the peeling plate 15. Then, the sheet T1 is rolled into a roll by the winding unit 82, which is rotated by a rotation drive source such as a motor and uses a rotation axis in the Y-axis direction as an axis. The rotation drive source of the winding unit 82 controls the speed of pulling the sheet T1 out of the rolled rubber film unit TU, for example, by torque control. In addition, a sheet support roller 820 is provided between the winding unit 82 and the peeling plate 15, and the sheet support roller 820 prevents the sheet T1 from being peeled off the rubber film T2 from being loosened.
如圖2所示,膠膜黏貼裝置1具備:保持台(保持手段)2,其係由保持環狀框架F之環狀框架保持部20、與在環狀框架F的開口內保持晶圓W之晶圓保持部21所構成;以及黏貼輥30,其一邊將已從薄片T1剝離的膠膜T2推抵於環狀框架F與晶圓W,一邊進行黏貼。As shown in FIG. 2 , the adhesive film pasting device 1 comprises: a holding table (holding means) 2, which is composed of an annular frame holding portion 20 for holding the annular frame F, and a wafer holding portion 21 for holding the wafer W in the opening of the annular frame F; and a pasting roller 30, which pushes the adhesive film T2 peeled off from the sheet T1 against the annular frame F and the wafer W while pasting.
圖2、3所示之環狀框架保持部20例如被形成為俯視呈正方形狀,在形成於其中央之凹部200內容納晶圓保持部21。環狀框架保持部20之上表面20a成為平坦面之環狀框架保持面。在環狀框架保持部20之上表面20a具有開口,且設置凹狀之例如4個未圖示之吸盤容納部。在此等4個未圖示之吸盤容納部,分別配設有可吸附環狀框架F之吸盤25(僅圖2有圖示)。吸盤25例如為將可變形的橡膠等彈性材料形成為俯視呈圓形狀者。各吸盤25係與真空產生裝置等未圖示之吸引源連通。 此外,環狀框架保持部20之外形及構造等並不受限於本實施方法。The annular frame holding part 20 shown in Figures 2 and 3 is formed, for example, in a square shape when viewed from above, and a wafer holding part 21 is accommodated in a recessed part 200 formed in the center thereof. The upper surface 20a of the annular frame holding part 20 is a flat annular frame holding surface. The upper surface 20a of the annular frame holding part 20 has an opening, and is provided with concave, for example, four suction cup accommodating parts not shown in the figure. In these four suction cup accommodating parts not shown in the figure, suction cups 25 (only shown in Figure 2) that can adsorb the annular frame F are respectively provided. The suction cup 25 is, for example, a deformable elastic material such as rubber formed into a circular shape when viewed from above. Each suction cup 25 is connected to a suction source not shown in the figure, such as a vacuum generating device. In addition, the shape and structure of the annular frame holding portion 20 are not limited to the present embodiment.
在環狀框架保持部20之上表面20a,配置有第一固定定位部23及第一可動定位部24,所述第一固定定位部23係用於將環狀框架F定位(置中)於上表面20a上,且係由固定銷等所構成,所述第一可動定位部24係由可動銷等所構成,並在與面向第一固定定位部23且平行於上表面20a的方向接近及遠離第一固定定位部23。再者,在上表面20a配置有第二固定定位部26及第二可動定位部27,所述第二可動定位部27係由可動銷等所構成,並在與面向第二固定定位部26且平行於上表面20a的方向接近及遠離第二固定定位部26。 例如,第一固定定位部23與第一可動定位部24相面向的方向、及第二固定定位部26與第二可動定位部27相面向的方向,係在水平面內互相大致正交。On the upper surface 20a of the annular frame holding portion 20, a first fixed positioning portion 23 and a first movable positioning portion 24 are arranged. The first fixed positioning portion 23 is used to position (center) the annular frame F on the upper surface 20a and is composed of a fixed pin, etc. The first movable positioning portion 24 is composed of a movable pin, etc., and approaches and moves away from the first fixed positioning portion 23 in a direction facing the first fixed positioning portion 23 and parallel to the upper surface 20a. Furthermore, a second fixed positioning portion 26 and a second movable positioning portion 27 are arranged on the upper surface 20a. The second movable positioning portion 27 is composed of a movable pin, etc., and approaches and moves away from the second fixed positioning portion 26 in a direction facing the second fixed positioning portion 26 and parallel to the upper surface 20a. For example, the direction in which the first fixed positioning portion 23 and the first movable positioning portion 24 face each other, and the direction in which the second fixed positioning portion 26 and the second movable positioning portion 27 face each other are substantially orthogonal to each other in a horizontal plane.
本實施方式中,第一固定定位部23及第一可動定位部24、與第二固定定位部26及第二可動定位部27的至少任一者會夾住環狀框架F外周中的一對第一平坦面及一對第二平坦面的至少任一者,在環狀框架保持部20之上表面20a上將環狀框架F定位(置中)於目標位置。其後,利用各吸盤25吸引保持環狀框架F。In this embodiment, at least one of the first fixed positioning part 23 and the first movable positioning part 24, and at least one of the second fixed positioning part 26 and the second movable positioning part 27 clamps at least one of the pair of first flat surfaces and the pair of second flat surfaces in the outer periphery of the annular frame F, and positions (centers) the annular frame F at the target position on the upper surface 20a of the annular frame holding part 20. Thereafter, the annular frame F is held by suction by each suction cup 25.
圖3詳細表示之晶圓保持部21,例如其外形為圓形狀,並具備:吸附部210,其係由多孔構件等所構成且吸附晶圓W;及框體211,其縱剖面成為凹形狀且支撐吸附部210。呈嵌入框體211的凹部之狀態的吸附部210係與未圖示之吸引源連通。將吸引源所產生的吸引力傳遞至作為吸附部210的上表面且為平坦面之保持面210a,藉此使晶圓保持部21在保持面210a上吸引保持晶圓W。The wafer holding part 21 shown in detail in FIG. 3 is, for example, circular in shape and comprises: an adsorption part 210, which is composed of a porous member and adsorbs the wafer W; and a frame 211, which has a concave longitudinal section and supports the adsorption part 210. The adsorption part 210 embedded in the concave part of the frame 211 is connected to a suction source not shown. The suction force generated by the suction source is transmitted to the holding surface 210a, which is a flat surface and serves as the upper surface of the adsorption part 210, so that the wafer holding part 21 attracts and holds the wafer W on the holding surface 210a.
例如,環狀框架保持部20之上表面20a的高度係以下述方式設定:在將晶圓W保持於晶圓保持部21之保持面210a,並以環狀框架保持部20之上表面20a保持環狀框架F之情形中,環狀框架F之上表面與晶圓W之上表面Wb成為略相同的高度。For example, the height of the upper surface 20a of the annular frame holding portion 20 is set in the following manner: when the wafer W is held on the holding surface 210a of the wafer holding portion 21 and the annular frame F is held by the upper surface 20a of the annular frame holding portion 20, the upper surface of the annular frame F and the upper surface Wb of the wafer W become approximately the same height.
如圖2、3所示,在基台10上配設有保持台移動機構(保持手段移動手段)13,其使晶圓保持部21及環狀框架保持部20在X軸方向往返移動。保持台移動機構13具備:滾珠螺桿130,其具有X軸方向之軸心;導軌131,其與滾珠螺桿130平行配設;及馬達132,其與滾珠螺桿130連結並使滾珠螺桿130轉動,在環狀框架保持部20中,其下表面側具備之未圖示之螺帽係與滾珠螺桿130螺合。而且,若馬達132使滾珠螺桿130轉動,則伴隨於此使晶圓保持部21及環狀框架保持部20被導軌131導引而在X軸方向往返移動。As shown in FIGS. 2 and 3 , a holding table moving mechanism (holding means moving means) 13 is provided on the base 10 , which enables the wafer holding portion 21 and the ring-shaped frame holding portion 20 to reciprocate in the X-axis direction. The holding table moving mechanism 13 includes: a ball screw 130 having an axis in the X-axis direction; a guide rail 131 arranged parallel to the ball screw 130; and a motor 132 connected to the ball screw 130 to rotate the ball screw 130. In the ring-shaped frame holding portion 20 , a nut (not shown) provided on its lower surface is screwed with the ball screw 130. When the motor 132 rotates the ball screw 130 , the wafer holding portion 21 and the ring-shaped frame holding portion 20 are guided by the guide rail 131 and reciprocate in the X-axis direction.
如圖2所示,在環狀框架保持部20的移動路徑上方位置且在下降至黏貼位置之剝離板15的前端鄰近處的位置,配設有黏貼輥30。黏貼輥30例如具備環狀框架保持部20之Y軸方向的寬度以上之長度,並藉由未圖示之輥框架及輥旋轉軸32(以下稱為旋轉軸32)而被支撐為可旋轉。而且,黏貼輥30係在Y軸方向橫跨環狀框架保持部20,並藉由輥上下移動機構(輥上下移動手段)31(參照圖5)而可在上下方向移動。As shown in FIG2 , a pasting roller 30 is provided above the moving path of the annular frame holding portion 20 and near the front end of the peeling plate 15 that has been lowered to the pasting position. The pasting roller 30 has a length greater than the width of the annular frame holding portion 20 in the Y-axis direction, for example, and is supported to be rotatable by a roller frame and a roller rotating shaft 32 (hereinafter referred to as the rotating shaft 32) not shown in the figure. Moreover, the pasting roller 30 crosses the annular frame holding portion 20 in the Y-axis direction and can move in the up-and-down direction by a roller up-and-down moving mechanism (roller up-and-down moving means) 31 (see FIG5 ).
如圖2、3所示,膠膜黏貼裝置1具備噴射噴嘴35,所述噴射噴嘴35係在X軸方向從比環狀框架保持部20所保持的環狀框架F的外周更外側,朝向黏貼輥30噴射空氣,所述X軸方向係相對於軸方向為Y軸方向之黏貼輥30的旋轉軸32而在水平面內呈正交之方向。As shown in Figures 2 and 3, the adhesive film pasting device 1 has a spray nozzle 35, which sprays air toward the pasting roller 30 from the outer side of the annular frame F held by the annular frame holding portion 20 in the X-axis direction. The X-axis direction is a direction that is orthogonal in the horizontal plane to the rotation axis 32 of the pasting roller 30 whose axial direction is the Y-axis direction.
例如,在環狀框架保持部20之+X方向側的側面的中央,以在水平方向拉出之方式配設噴嘴設置台36,並在噴嘴設置台36固定噴射噴嘴35。 噴射噴嘴35例如為側視呈L字狀之外形,其噴射口350在圖2、3所示之例中係朝向-X方向側,從噴射口350噴射之空氣係沿著保持於環狀框架保持部20之環狀框架F的上表面而流往-X方向側。如圖3所示,於噴射噴嘴35係連通有空氣供給源359,所述空氣供給源359係由壓縮機等所構成且可供給壓縮空氣。 例如,噴射噴嘴35之噴射口350只要可將膠膜T2之會在最後被貼合的外周部分推抵於黏貼輥30的側面即可,因此只要與黏貼輥30的側面之長度方向(Y軸方向)的至少中央區域相向即可。此外,噴射噴嘴35係位於第一固定定位部23的後方(+X方向側)。噴射噴嘴35所噴射的空氣可穿過第一固定定位部23的2根定位固定銷之間而前進,因此所噴射的氣流不會被第一固定定位部23妨礙。For example, a nozzle mounting platform 36 is provided in the center of the side surface on the +X direction side of the annular frame holding portion 20 in a manner of being pulled out in the horizontal direction, and a spray nozzle 35 is fixed on the nozzle mounting platform 36. The spray nozzle 35 is, for example, L-shaped in side view, and its spray port 350 is oriented toward the -X direction side in the example shown in FIGS. 2 and 3 , and the air sprayed from the spray port 350 flows toward the -X direction side along the upper surface of the annular frame F held in the annular frame holding portion 20. As shown in FIG. 3 , the spray nozzle 35 is connected to an air supply source 359, which is composed of a compressor and can supply compressed air. For example, the ejection port 350 of the ejection nozzle 35 only needs to push the peripheral portion of the adhesive film T2 that will be bonded last against the side of the pasting roller 30, and therefore only needs to face at least the central area of the side of the pasting roller 30 in the length direction (Y-axis direction). In addition, the ejection nozzle 35 is located behind the first fixed positioning portion 23 (+X direction side). The air ejected by the ejection nozzle 35 can pass through the two positioning pins of the first fixed positioning portion 23 and advance, so the ejected airflow will not be hindered by the first fixed positioning portion 23.
例如,在圖6所示之保持台2的上方的位置配設有離化器6,所述保持台2是在-X方向移動至通過黏貼輥30的位置為止之狀態下,所述離化器6係用於將黏貼於晶圓W及環狀框架F的膠膜T2進行靜電消除。離化器6例如為噴嘴型的脈衝AC(脈衝交流電)式者,但不限於此。如圖2、3所示,離化器6例如具備:離子化噴嘴60,其係以噴射口60a與膠膜T2在Z軸方向相向之方式配設,所述膠膜T2係黏貼在保持於保持台2之環狀框架F;及空氣源61,其與離子化噴嘴60連通。 在圖2所示之例子中,離子化噴嘴60係以橫跨保持台2之長度在Y軸方向延伸,並成為將離子化空氣從通過下方之膠膜T2的外周緣噴至中心的另一側的外周緣,但不限於此。For example, an ionizer 6 is arranged above the holding table 2 shown in FIG6. When the holding table 2 moves in the -X direction to the position passing through the pasting roller 30, the ionizer 6 is used to eliminate static electricity of the adhesive film T2 pasted on the wafer W and the annular frame F. The ionizer 6 is, for example, a nozzle-type pulse AC (pulsed alternating current) type, but is not limited to this. As shown in FIGS. 2 and 3, the ionizer 6 has, for example: an ionization nozzle 60, which is arranged in a manner that the nozzle 60a and the adhesive film T2 are facing each other in the Z-axis direction, and the adhesive film T2 is pasted on the annular frame F held on the holding table 2; and an air source 61, which is connected to the ionization nozzle 60. In the example shown in FIG. 2 , the ionization nozzle 60 extends in the Y-axis direction across the length of the holding table 2 and becomes the outer periphery of the other side of the center from the outer periphery passing through the lower film T2, but the present invention is not limited thereto.
以下說明圖2所示之膠膜黏貼裝置1的運作例。 首先,晶圓W係以互相的中心略重合之方式被載置於保持台2的晶圓保持部21,且將環狀框架F載置於環狀框架保持部20。接著,未圖示之吸引源運作,利用晶圓保持部21之保持面210a吸引保持晶圓W,並利用環狀框架保持部20之保持面亦即上表面20a吸引保持環狀框架F。The following is an example of the operation of the adhesive film laminating device 1 shown in FIG. 2. First, the wafer W is placed on the wafer holding portion 21 of the holding table 2 in a manner that the centers of the wafer W and the ring frame F are placed on the ring frame holding portion 20. Then, the suction source (not shown) operates to hold the wafer W by suction using the holding surface 210a of the wafer holding portion 21, and to hold the ring frame F by suction using the holding surface, i.e., the upper surface 20a, of the ring frame holding portion 20.
又,輸出單元80係一邊旋轉一邊將膠膜單元TU朝向剝離板15輸出。Furthermore, the output unit 80 outputs the adhesive film unit TU toward the peeling plate 15 while rotating.
在此狀態下,保持台移動機構13使保持台2例如在-X方向移動,藉此,保持環狀框架F之環狀框架保持部20會接近黏貼輥30的正下方。其後,藉由輥上下移動機構31(圖2中未圖示),黏貼輥30會下降,黏貼輥30被定位於將膠膜T2黏貼於環狀框架保持部20所保持的環狀框架F時的高度位置。In this state, the holding table moving mechanism 13 moves the holding table 2, for example, in the -X direction, whereby the annular frame holding portion 20 holding the annular frame F approaches directly below the pasting roller 30. Thereafter, the pasting roller 30 is lowered by the roller up-and-down moving mechanism 31 (not shown in FIG. 2 ), and the pasting roller 30 is positioned at a height position when the adhesive film T2 is pasted to the annular frame F held by the annular frame holding portion 20.
又,藉由剝離板15下降且位於膠膜剝離位置,例如成為膠膜單元TU通過剝離板15的前端部與黏貼輥30的外周側面之間隙的狀態。此外,該間隙為膠膜單元TU僅可剛剛好通過的小間隙。因此,剝離板15係以前端比保持於環狀框架保持部20之環狀框架F的上表面更上方之方式配置。環狀框架F的上表面與剝離板15的前端之距離係在黏貼輥30的半徑以內。此外,如圖3、4所示,若將剝離板15以接近水平之角度配置,則可縮小上述的距離。但是,有膠膜黏貼裝置1在X軸方向變大之問題。對此,如圖5、6所示,若將剝離板15以接近垂直之角度配置,則上述的距離會變大。因此,如本發明般,可更有效地活用後述之使空氣噴射且將膠膜T2推抵於黏貼輥30之機構。又,藉由將剝離板15以接近垂直之角度配置,可縮小膠膜黏貼裝置1之X軸方向的距離。而且,剝離板15的前端部接觸/推壓膠膜單元TU之薄片T1,而以薄片T1為內側使膠膜單元TU彎曲而形成銳角。如此一來,可從膠膜單元TU剝離膠膜T2,將膠膜T2送入黏貼輥30的下方。Furthermore, by the peeling plate 15 being lowered and positioned at the film peeling position, for example, the film unit TU is in a state of passing through the gap between the front end of the peeling plate 15 and the outer peripheral side surface of the pasting roller 30. In addition, the gap is a small gap that the film unit TU can just pass through. Therefore, the peeling plate 15 is arranged in a manner such that the front end is higher than the upper surface of the annular frame F held by the annular frame holding portion 20. The distance between the upper surface of the annular frame F and the front end of the peeling plate 15 is within the radius of the pasting roller 30. In addition, as shown in Figures 3 and 4, if the peeling plate 15 is arranged at an angle close to the horizontal, the above-mentioned distance can be shortened. However, there is a problem that the adhesive film pasting device 1 becomes larger in the X-axis direction. In response to this, as shown in Figures 5 and 6, if the peeling plate 15 is arranged at an angle close to vertical, the above-mentioned distance will become larger. Therefore, as in the present invention, the mechanism described later for spraying air and pushing the adhesive film T2 against the pasting roller 30 can be more effectively utilized. In addition, by arranging the peeling plate 15 at an angle close to vertical, the distance in the X-axis direction of the adhesive film pasting device 1 can be reduced. Moreover, the front end of the peeling plate 15 contacts/presses the thin film T1 of the adhesive film unit TU, and the adhesive film unit TU is bent with the thin film T1 as the inner side to form a sharp angle. In this way, the rubber film T2 can be peeled off from the rubber film unit TU and sent to the bottom of the laminating roller 30.
如圖3所示,一邊藉由輸出單元80而對剝離板15輸送膠膜單元TU,一邊以預定的旋轉速度旋轉黏貼輥30,再者,如圖3所示,藉由保持台移動機構13而將環狀框架保持部20及晶圓保持部21輸出往-X方向,藉此可藉由黏貼輥30而從保持於環狀框架保持部20之環狀框架F的一側推抵膠膜T2。 又,捲繞單元82係捲繞已剝離膠膜T2的薄片T1。As shown in FIG3 , while the adhesive film unit TU is transported to the peeling plate 15 by the output unit 80 , the laminating roller 30 is rotated at a predetermined rotation speed. Furthermore, as shown in FIG3 , the ring frame holding part 20 and the wafer holding part 21 are output to the -X direction by the holding stage moving mechanism 13 , so that the adhesive film T2 can be pushed from one side of the ring frame F held in the ring frame holding part 20 by the laminating roller 30 . In addition, the winding unit 82 winds up the sheet T1 from which the adhesive film T2 has been peeled.
然後,若一邊利用黏貼輥30將膠膜T2推抵於環狀框架F及晶圓W,一邊如圖4、5所示使保持台2在-X方向移動至通過黏貼輥30後的預定位置,則可於晶圓W及環狀框架F黏貼一片膠膜T2,而可製作藉由膠膜T2使晶圓W與環狀框架F一體化之工件組。Then, if the adhesive film T2 is pushed against the annular frame F and the wafer W by the adhesive roller 30 while the holding table 2 is moved in the -X direction to a predetermined position after passing through the adhesive roller 30 as shown in Figures 4 and 5, a piece of adhesive film T2 can be adhered to the wafer W and the annular frame F, and a workpiece group can be manufactured in which the wafer W and the annular frame F are integrated by the adhesive film T2.
於此,在本發明之膠膜黏貼裝置1中,如圖5所示,藉由從噴射噴嘴35所噴射的空氣而防止下述狀況:被黏貼在薄片T1直到最後的膠膜T2的外周部分,從薄片T1剝離並因膠膜T2的自體重量而要垂落至環狀框架F上表面。亦即,如圖5所示,從空氣供給源359對噴射噴嘴35供給壓縮空氣,從噴射口350噴射之空氣係從比環狀框架保持部20所保持的環狀框架F的外周更外側朝向黏貼輥30。此時,該空氣例如沿著保持於環狀框架保持部20之環狀框架F的上表面流動,並接觸膠膜T2的下表面側(糊層側),再進一步以從下側支撐從薄片T1剝離且要垂落的膠膜T2之方式上升。亦即,一邊藉由該空氣使膠膜T2以沿著黏貼輥30的側面之方式推抵,一邊於晶圓W與環狀框架F黏貼一片膠膜T2。其結果,可以不產生皺摺及氣泡之方式,將膠膜T2黏貼於環狀框架F與晶圓W。因此,在之後分割晶圓W且使膠膜T2擴張之際,能防止已分割之相鄰晶片彼此接觸,而不會產生晶片崩缺。Here, in the adhesive film laminating device 1 of the present invention, as shown in FIG5 , the air sprayed from the spray nozzle 35 prevents the following situation: the outer peripheral portion of the adhesive film T2 adhered to the sheet T1 to the end is peeled off from the sheet T1 and falls to the upper surface of the ring frame F due to the self-weight of the adhesive film T2. That is, as shown in FIG5 , compressed air is supplied to the spray nozzle 35 from the air supply source 359, and the air sprayed from the spray port 350 is directed toward the laminating roller 30 from the outer side of the outer periphery of the ring frame F held by the ring frame holding portion 20. At this time, the air flows, for example, along the upper surface of the ring frame F held by the ring frame holding portion 20, and contacts the lower surface side (paste layer side) of the adhesive film T2, and further rises in a manner of supporting the adhesive film T2 that is peeled off from the sheet T1 and is about to fall from the lower side. That is, while the adhesive film T2 is pushed along the side surface of the pasting roller 30 by the air, a piece of adhesive film T2 is pasted on the wafer W and the ring frame F. As a result, the adhesive film T2 can be pasted on the ring frame F and the wafer W in a manner that does not generate wrinkles and bubbles. Therefore, when the wafer W is subsequently divided and the adhesive film T2 is expanded, it is possible to prevent the divided adjacent chips from contacting each other, and chip chipping will not occur.
例如,如圖6所示,亦可藉由從圖5所示之噴射噴嘴35的另一形態亦即噴射噴嘴37所噴射的空氣而防止下述狀況:被黏貼在薄片T1直到最後的膠膜T2的外周部分,從薄片T1剝離且要垂落至環狀框架F的上表面。For example, as shown in FIG. 6 , the following situation can be prevented by spraying air from another form of the spray nozzle 35 shown in FIG. 5 , namely, the spray nozzle 37: the peripheral portion of the adhesive film T2 adhered to the sheet T1 until the end is peeled off from the sheet T1 and is about to fall to the upper surface of the annular frame F.
圖6所示之噴射噴嘴37例如與環狀框架保持部20一體形成,並具備:空氣導入口370,其於環狀框架保持部20的側面開口;及空氣噴射口371,其在環狀框架保持部20的上表面之第一固定定位部23的後方區域中開口。而且,在空氣導入口370連通有空氣供給源359。在環狀框架保持部20之空氣噴射口371的鄰近處形成導引部205,所述導引部205係被形成為R狀,且以朝向保持台2側的斜上方之方式,導引從空氣噴射口371往正上方噴射之空氣。從空氣噴射口371往正上方噴出之空氣係沿著導引部205之R狀(R面)而改變空氣的流向,並平行於導引部205的上表面流動,藉此流動於保持於環狀框架保持部20之環狀框架F的上表面,並朝向黏貼輥30。再者,在導引部205之斜上方的位置配設有整流板375,所述整流板375係將從噴射噴嘴37噴射且被導引部205導引的氣流調整成固定。The spray nozzle 37 shown in FIG. 6 is formed integrally with the annular frame holding portion 20, for example, and has: an air inlet 370, which opens on the side of the annular frame holding portion 20; and an air ejection port 371, which opens in the rear area of the first fixed positioning portion 23 on the upper surface of the annular frame holding portion 20. In addition, the air inlet 370 is connected to the air supply source 359. A guide portion 205 is formed near the air ejection port 371 of the annular frame holding portion 20, and the guide portion 205 is formed in an R shape, and guides the air ejected from the air ejection port 371 to the upper side in a manner that is obliquely upward toward the side of the holding table 2. The air ejected from the air ejection port 371 directly upward changes its flow direction along the R shape (R surface) of the guide portion 205, and flows parallel to the upper surface of the guide portion 205, thereby flowing on the upper surface of the ring frame F held by the ring frame holding portion 20, and toward the pasting roller 30. Furthermore, a rectifying plate 375 is provided at a position obliquely above the guide portion 205, and the rectifying plate 375 adjusts the airflow ejected from the ejection nozzle 37 and guided by the guide portion 205 to be fixed.
如圖6所示,從空氣供給源359對噴射噴嘴37供給壓縮空氣,從空氣噴射口371噴射之空氣係從比環狀框架保持部20所保持的環狀框架F的外周更外側朝向黏貼輥30。於此,該空氣的噴射角度例如藉由調整整流板375之角度,而在將與環狀框架F的上表面平行的方向設為0度時,在圖6中成為0度至向上(由紙面前側觀看的順時針方向)45度的範圍內。然後,空氣接觸膠膜T2的下表面側,再進一步以從下方支撐從薄片T1剝離且要垂落之膠膜T2之方式上升。亦即,一邊藉由該空氣而以沿著黏貼輥30的側面之方式推抵膠膜T2,一邊於晶圓W及環狀框架F黏貼一片膠膜T2。其結果,可以不產生皺摺及氣泡之方式,將膠膜T2黏貼於環狀框架F與晶圓W。因此,在之後分割晶圓W且使膠膜T2擴張之際,可防止已分割之相鄰晶片彼此接觸,而不會產生晶片崩缺。此外,例如若從噴射噴嘴37噴射之空氣係以正交之方式接觸從薄片T1剝離且還未黏貼之膠膜T2,則膠膜T2會在鬆弛狀態下沿著黏貼輥30,但若使空氣的噴射角度在0度至向上45度的範圍內,則可預防此種鬆弛發生。As shown in FIG6 , compressed air is supplied to the spray nozzle 37 from the air supply source 359, and the air sprayed from the air spray port 371 is directed toward the laminating roller 30 from the outer side of the outer periphery of the annular frame F held by the annular frame holding portion 20. Here, the spray angle of the air is, for example, adjusted by adjusting the angle of the straightening plate 375, and when the direction parallel to the upper surface of the annular frame F is set to 0 degrees, it becomes a range of 0 degrees to 45 degrees upward (clockwise direction viewed from the front side of the paper) in FIG6 . Then, the air contacts the lower surface side of the adhesive film T2, and further rises in a manner of supporting the adhesive film T2 peeled off from the sheet T1 and about to fall from below. That is, while the adhesive film T2 is pushed along the side of the pasting roller 30 by the air, a piece of adhesive film T2 is pasted on the wafer W and the ring frame F. As a result, the adhesive film T2 can be pasted on the ring frame F and the wafer W without generating wrinkles and bubbles. Therefore, when the wafer W is subsequently divided and the adhesive film T2 is expanded, the adjacent chips that have been divided can be prevented from contacting each other, and chip chipping will not occur. In addition, for example, if the air sprayed from the spray nozzle 37 contacts the adhesive film T2 peeled off from the sheet T1 and not yet adhered in an orthogonal manner, the adhesive film T2 will be in a relaxed state along the pasting roller 30, but if the spray angle of the air is within the range of 0 degrees to 45 degrees upward, such relaxation can be prevented.
在一邊藉由圖5所示之噴射噴嘴35或圖6所示之噴射噴嘴37進行空氣噴射,一邊例如於晶圓W與環狀框架F黏貼膠膜T2而製作工件組後,例如從圖5所示之空氣源61對離子化噴嘴60供給空氣,並從離子化噴嘴60將大略相同量之帶(+)電之離子化空氣與帶(-)電之離子化空氣噴附於通過離子化噴嘴60的下方之工件組的膠膜T2,以進行由於從薄片T1剝離而帶電之膠膜T2的靜電消除。其後,透過環狀框架F而可作為工件組進行處理之晶圓W係藉由未圖示之搬送單元例如被移送至切割裝置等而進行切割等。While air is sprayed by the spray nozzle 35 shown in FIG. 5 or the spray nozzle 37 shown in FIG. 6 , for example, after the workpiece group is manufactured by pasting the adhesive film T2 between the wafer W and the annular frame F, air is supplied to the ionization nozzle 60 from the air source 61 shown in FIG. 5 , and approximately the same amount of ionized air with (+) charge and ionized air with (-) charge is sprayed from the ionization nozzle 60 onto the adhesive film T2 of the workpiece group passing under the ionization nozzle 60, so as to eliminate static electricity of the adhesive film T2 that is charged due to being peeled off from the thin film T1. Thereafter, the wafers W that have passed through the ring frame F and are processed as a workpiece group are transferred to a dicing device or the like by a transport unit (not shown) and diced or the like.
本發明之膠膜黏貼裝置1並不受限於本實施方法,又,附圖所示之膠膜黏貼裝置1的構成形狀等亦不受限於此,能在可發揮本發明功效之範圍內適當地變更。The adhesive film pasting device 1 of the present invention is not limited to this implementation method. Moreover, the configuration of the adhesive film pasting device 1 shown in the attached figure is not limited thereto and can be appropriately changed within the scope of the effectiveness of the present invention.
TU:膠膜單元 T1:薄片 T2:圓形的膠膜 T3:圓筒 W:晶圓 F:環狀框架 1:膠膜黏貼裝置 10:基台 80:輸出單元 82:捲繞單元 820:薄片支撐輥 15:剝離板 160:板基台 161:板可動構件 2:保持台(保持手段) 20:環狀框架保持部 21:晶圓保持部 210a:保持面 25:吸盤 23:第一固定定位部 24:第一可動定位部 26:第二固定定位部 27:第二可動定位部 13:保持台移動機構(保持手段移動手段) 130:滾珠螺桿 132:馬達 30:黏貼輥 31:輥上下移動機構(輥上下移動手段) 32:輥旋轉軸 35:噴射噴嘴 36:噴嘴設置台 359:空氣供給源 6:離化器 60:離子化噴嘴 61:空氣源 37:噴射噴嘴 370:空氣導入口 371:空氣噴射口 205:導引部 375:整流板TU: Adhesive film unit T1: Thin film T2: Circular adhesive film T3: Cylinder W: Wafer F: Ring frame 1: Adhesive film pasting device 10: Base 80: Output unit 82: Winding unit 820: Thin film support roller 15: Peeling plate 160: Plate base 161: Plate movable member 2: Holding table (holding means) 20: Ring frame holding part 21: Wafer holding part 210a: Holding surface 25: Suction cup 23: First fixed positioning part 24: First movable positioning part 26: Second Fixed positioning part 27: Second movable positioning part 13: Holding platform moving mechanism (holding means moving means) 130: Ball screw 132: Motor 30: Paste roller 31: Roller up and down moving mechanism (roller up and down moving means) 32: Roller rotating shaft 35: Jet nozzle 36: Nozzle setting platform 359: Air supply source 6: Ionizer 60: Ionization nozzle 61: Air source 37: Jet nozzle 370: Air inlet 371: Air ejection port 205: Guide part 375: Rectifier plate
圖1係表示被捲繞成輥狀之膠膜單元的一例的立體圖。 圖2係表示膠膜黏貼裝置的一例的立體圖。 圖3係說明在膠膜黏貼裝置中,開始將膠膜黏貼於環狀框架與晶圓之狀態的側視圖。 圖4係說明在膠膜黏貼裝置中,一邊藉由沿著環狀框架的上表面噴射之空氣而將膠膜推抵於黏貼輥的側邊,一邊完成將膠膜黏貼於環狀框架與晶圓之狀態的側視圖。 圖5係放大說明在膠膜黏貼裝置中,一邊藉由沿著環狀框架的上表面噴射之空氣而將膠膜推抵於黏貼輥的側面,一邊完成將膠膜黏貼於環狀框架與晶圓之狀態的側視圖。 圖6係放大說明在膠膜黏貼裝置中,在將與環狀框架的上表面平行的方向設為0度時,一邊藉由在0度至向上45度的範圍內所噴射的空氣而將膠膜推抵於黏貼輥的側面,一邊完成將膠膜黏貼於環狀框架與晶圓之狀態的側視圖。FIG. 1 is a perspective view showing an example of a film unit wound into a roll. FIG. 2 is a perspective view showing an example of a film pasting device. FIG. 3 is a side view showing a state where the film pasting device starts pasting the film to the ring frame and the wafer. FIG. 4 is a side view showing a state where the film pasting device completes pasting the film to the ring frame and the wafer while the film is pushed against the side of the pasting roll by air sprayed along the upper surface of the ring frame. FIG5 is an enlarged side view illustrating a state in which the adhesive film is pasted to the annular frame and the wafer by pushing the adhesive film against the side of the pasting roller by air sprayed along the upper surface of the annular frame in the adhesive film pasting device. FIG6 is an enlarged side view illustrating a state in which the adhesive film is pasted to the annular frame and the wafer by pushing the adhesive film against the side of the pasting roller by air sprayed in a range of 0 degrees to 45 degrees upward when the direction parallel to the upper surface of the annular frame is set to 0 degrees in the adhesive film pasting device.
TU:膠膜單元TU: membrane unit
T1:薄片T1: Thin slices
T2:圓形的膠膜T2: Round film
W:晶圓W: Wafer
Wa:正面Wa: Front
Wb:背面Wb:Back
F:環狀框架F: Ring frame
1:膠膜黏貼裝置1: Adhesive film pasting device
10:基台10: Abutment
80:輸出單元80: Output unit
82:捲繞單元82: Winding unit
820:薄片支撐輥820: Thin sheet support roller
15:剝離板15: Peel off board
2:保持台(保持手段)2: Holding table (holding means)
20:環狀框架保持部20: Ring frame holding part
20a:上表面20a: Upper surface
21:晶圓保持部21: Wafer holding part
23:第一固定定位部23: First fixed positioning part
24:第一可動定位部24: First movable positioning part
25:吸盤25: Suction cup
26:第二固定定位部26: Second fixed positioning part
27:第二可動定位部27: Second movable positioning part
13:保持台移動機構(保持手段移動手段)13: Holding platform moving mechanism (holding means moving means)
130:滾珠螺桿130:Ball Screw
131:導軌131:Guide rail
132:馬達132: Motor
30:黏貼輥30: Paste Roller
32:輥旋轉軸32: Roller shaft
35:噴射噴嘴35: Spray nozzle
6:離化器6: Ionizer
60:離子化噴嘴60: Ionization nozzle
61:空氣源61: Air source
200:凹部200: concave
Claims (3)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019193370A JP7412957B2 (en) | 2019-10-24 | 2019-10-24 | tape pasting device |
| JP2019-193370 | 2019-10-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202117921A TW202117921A (en) | 2021-05-01 |
| TWI859351B true TWI859351B (en) | 2024-10-21 |
Family
ID=75637894
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109136532A TWI859351B (en) | 2019-10-24 | 2020-10-21 | Adhesive film sticking device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7412957B2 (en) |
| KR (1) | KR102823036B1 (en) |
| SG (1) | SG10202009951TA (en) |
| TW (1) | TWI859351B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI810084B (en) * | 2022-10-06 | 2023-07-21 | 萬潤科技股份有限公司 | Laminating device and equipment |
| CN115783386B (en) * | 2022-12-13 | 2025-06-17 | 重庆中科渝芯电子有限公司 | A manual film laminating device for semiconductor wafer |
| CN116153838A (en) * | 2023-02-13 | 2023-05-23 | 华虹半导体(无锡)有限公司 | A kind of method for sticking film on the back of Taiko wafer before chemical plating |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1943025A (en) * | 2004-04-14 | 2007-04-04 | 琳得科株式会社 | Wafer processing device and wafer processing method |
| JP2009010154A (en) * | 2007-06-28 | 2009-01-15 | Lintec Corp | Sheet sticking device and sticking method |
| CN104576488A (en) * | 2013-10-24 | 2015-04-29 | 株式会社迪思科 | Pasting device of splicing tapes |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63165271A (en) * | 1986-12-26 | 1988-07-08 | Nitto Electric Ind Co Ltd | Laminating method for viscous film piece |
| JP3210743B2 (en) * | 1992-09-10 | 2001-09-17 | 旭硝子株式会社 | Sheet material suspension holding device and sheet material transfer method |
| JP5006300B2 (en) | 2008-10-23 | 2012-08-22 | リンテック株式会社 | MOUNTING DEVICE AND MOUNTING METHOD |
| JP5519235B2 (en) | 2009-10-14 | 2014-06-11 | 株式会社ディスコ | Adhesive tape sticking device |
| EP4026848A1 (en) * | 2015-12-09 | 2022-07-13 | F. Hoffmann-La Roche AG | Type ii anti-cd20 antibody for reducing the cytokine release syndrome |
| JP7064868B2 (en) * | 2017-12-26 | 2022-05-11 | リンテック株式会社 | Sheet supply device and sheet supply method, and sheet pasting device and sheet pasting method |
-
2019
- 2019-10-24 JP JP2019193370A patent/JP7412957B2/en active Active
-
2020
- 2020-09-15 KR KR1020200118042A patent/KR102823036B1/en active Active
- 2020-10-07 SG SG10202009951TA patent/SG10202009951TA/en unknown
- 2020-10-21 TW TW109136532A patent/TWI859351B/en active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1943025A (en) * | 2004-04-14 | 2007-04-04 | 琳得科株式会社 | Wafer processing device and wafer processing method |
| JP2009010154A (en) * | 2007-06-28 | 2009-01-15 | Lintec Corp | Sheet sticking device and sticking method |
| CN104576488A (en) * | 2013-10-24 | 2015-04-29 | 株式会社迪思科 | Pasting device of splicing tapes |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202117921A (en) | 2021-05-01 |
| JP2021068817A (en) | 2021-04-30 |
| JP7412957B2 (en) | 2024-01-15 |
| KR20210048980A (en) | 2021-05-04 |
| SG10202009951TA (en) | 2021-05-28 |
| KR102823036B1 (en) | 2025-06-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI859351B (en) | Adhesive film sticking device | |
| JP4187065B2 (en) | Adhesive tape application method and apparatus | |
| CN100495680C (en) | Non-contact type adsorption holding device | |
| US7455095B2 (en) | Protective tape separation method, and apparatus using the same | |
| CN100459055C (en) | Protective tape attaching method and device thereof, protective tape detaching method and device thereof | |
| KR102464297B1 (en) | Adhesion method of protective tape and adhesion apparatus for protective tape | |
| JP5431053B2 (en) | Adhesive tape application method and adhesive tape application device | |
| TW559880B (en) | Method and apparatus for peeling protective sheet | |
| JP2004047823A (en) | Dicing tape sticking device and back grinding / dicing tape sticking system | |
| CN104576488A (en) | Pasting device of splicing tapes | |
| TWI634606B (en) | Semiconductor wafer mounting method and semiconductor wafer mounting device | |
| CN106409745A (en) | Peeling method and peeling apparatus | |
| TW201519304A (en) | Adhesive tape attachment method and adhesive tape attachment device | |
| JP6621365B2 (en) | How to peel off the protective tape | |
| JP2007110014A (en) | Sheet peeler and peeling method | |
| JP5192999B2 (en) | Ionized air supply program | |
| CN110911333B (en) | With adhesive device | |
| JP2002151528A (en) | Die bonding sheet sticking apparatus and die bonding sheet sticking method | |
| JP7396849B2 (en) | tape pasting device | |
| JP2005123653A (en) | Taping/peering apparatus and taping system | |
| JP6822869B2 (en) | Peeling device | |
| TWI383716B (en) | Separating device | |
| JP2004304133A (en) | Wafer treatment device | |
| JP2004079768A (en) | Pasting device | |
| CN114597139A (en) | With sticking device |