TWI857104B - Method for manufacturing laminate and laminate - Google Patents
Method for manufacturing laminate and laminate Download PDFInfo
- Publication number
- TWI857104B TWI857104B TW109124567A TW109124567A TWI857104B TW I857104 B TWI857104 B TW I857104B TW 109124567 A TW109124567 A TW 109124567A TW 109124567 A TW109124567 A TW 109124567A TW I857104 B TWI857104 B TW I857104B
- Authority
- TW
- Taiwan
- Prior art keywords
- polymer
- layer
- polymer layer
- laminate
- manufacturing
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 229920000642 polymer Polymers 0.000 claims abstract description 299
- 239000007788 liquid Substances 0.000 claims abstract description 88
- 238000000576 coating method Methods 0.000 claims abstract description 77
- 239000000758 substrate Substances 0.000 claims abstract description 73
- 239000011248 coating agent Substances 0.000 claims abstract description 68
- 239000000203 mixture Substances 0.000 claims abstract description 65
- 239000000843 powder Substances 0.000 claims abstract description 48
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims abstract description 31
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 31
- 238000010438 heat treatment Methods 0.000 claims abstract description 27
- 238000001816 cooling Methods 0.000 claims abstract description 24
- -1 alkyl vinyl ether Chemical compound 0.000 claims abstract description 19
- 230000009477 glass transition Effects 0.000 claims abstract description 19
- 238000002844 melting Methods 0.000 claims abstract description 19
- 230000008018 melting Effects 0.000 claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims description 45
- 239000002184 metal Substances 0.000 claims description 45
- 239000011888 foil Substances 0.000 claims description 41
- 239000011256 inorganic filler Substances 0.000 claims description 21
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 21
- 229920006015 heat resistant resin Polymers 0.000 claims description 18
- 125000000524 functional group Chemical group 0.000 claims description 15
- 238000001035 drying Methods 0.000 abstract description 13
- 239000010410 layer Substances 0.000 description 232
- 239000010408 film Substances 0.000 description 38
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 35
- 239000011889 copper foil Substances 0.000 description 34
- 239000000945 filler Substances 0.000 description 27
- 230000005540 biological transmission Effects 0.000 description 23
- 229920001721 polyimide Polymers 0.000 description 16
- 239000002609 medium Substances 0.000 description 15
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 14
- 239000012298 atmosphere Substances 0.000 description 14
- 239000004642 Polyimide Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000002270 dispersing agent Substances 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 230000000704 physical effect Effects 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 9
- 239000004810 polytetrafluoroethylene Substances 0.000 description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 239000000454 talc Substances 0.000 description 8
- 229910052623 talc Inorganic materials 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- 239000000178 monomer Substances 0.000 description 7
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 7
- 229910052582 BN Inorganic materials 0.000 description 6
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 229920002313 fluoropolymer Polymers 0.000 description 6
- 239000004811 fluoropolymer Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 230000001476 alcoholic effect Effects 0.000 description 5
- 230000001186 cumulative effect Effects 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- 229920005596 polymer binder Polymers 0.000 description 5
- 239000002491 polymer binding agent Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- KHXKESCWFMPTFT-UHFFFAOYSA-N 1,1,1,2,2,3,3-heptafluoro-3-(1,2,2-trifluoroethenoxy)propane Chemical compound FC(F)=C(F)OC(F)(F)C(F)(F)C(F)(F)F KHXKESCWFMPTFT-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000004952 Polyamide Substances 0.000 description 4
- 239000004962 Polyamide-imide Substances 0.000 description 4
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229920000058 polyacrylate Polymers 0.000 description 4
- 229920002647 polyamide Polymers 0.000 description 4
- 229920002312 polyamide-imide Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000004416 thermosoftening plastic Substances 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 150000008064 anhydrides Chemical group 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910000071 diazene Inorganic materials 0.000 description 3
- 238000007731 hot pressing Methods 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- BLTXWCKMNMYXEA-UHFFFAOYSA-N 1,1,2-trifluoro-2-(trifluoromethoxy)ethene Chemical compound FC(F)=C(F)OC(F)(F)F BLTXWCKMNMYXEA-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000004917 carbon fiber Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 239000013039 cover film Substances 0.000 description 2
- TYZFTGHDCPRRBH-UHFFFAOYSA-N curium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Cm+3].[Cm+3] TYZFTGHDCPRRBH-UHFFFAOYSA-N 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000007561 laser diffraction method Methods 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- 229920006380 polyphenylene oxide Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000000790 scattering method Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 230000009974 thixotropic effect Effects 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical group CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- 125000000424 1,2-diol group Chemical group 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- QYCGBAJADAGLLK-UHFFFAOYSA-N 1-(cyclohepten-1-yl)cycloheptene Chemical compound C1CCCCC=C1C1=CCCCCC1 QYCGBAJADAGLLK-UHFFFAOYSA-N 0.000 description 1
- WCIOJVGOBKXQPK-UHFFFAOYSA-N 1-ethenoxy-3-propoxypropane Chemical compound CCCOCCCOC=C WCIOJVGOBKXQPK-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- NFIHXTUNNGIYRF-UHFFFAOYSA-N 2-decanoyloxypropyl decanoate Chemical compound CCCCCCCCCC(=O)OCC(C)OC(=O)CCCCCCCCC NFIHXTUNNGIYRF-UHFFFAOYSA-N 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical class OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical group NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229920002614 Polyether block amide Polymers 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 125000004036 acetal group Chemical group 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000006258 conductive agent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 150000003949 imides Chemical group 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 125000005702 oxyalkylene group Chemical group 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920006260 polyaryletherketone Polymers 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 229940116422 propylene glycol dicaprate Drugs 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001374 small-angle light scattering Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229920006259 thermoplastic polyimide Polymers 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/025—Electric or magnetic properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
本發明提供一種具有與基材層之密接性優異、且電特性及機械特性優異之聚合物層之積層體、及上述積層體之製造方法。 本發明之積層體之製造方法係具有基材層及聚合物層之積層體之製造方法,該聚合物層形成於上述基材層之至少一表面,且包含含有基於四氟乙烯之單元及基於全氟(烷基乙烯基醚)之單元之熱塑性聚合物。該製造方法係將包含上述熱塑性聚合物之粉末之液狀組合物塗佈於上述基材層之表面並進行乾燥而形成乾燥覆膜,將上述乾燥覆膜以上述聚合物層每1 μm厚度15秒以上之時間、上述熱塑性聚合物之熔融溫度以上之溫度進行加熱,形成熔融覆膜,將上述熔融覆膜於120秒以內冷卻至上述熱塑性聚合物之玻璃轉移點以下之溫度,而獲得上述積層體。The present invention provides a laminate having a polymer layer with excellent adhesion to a substrate layer and excellent electrical and mechanical properties, and a method for manufacturing the laminate. The method for manufacturing the laminate of the present invention is a method for manufacturing a laminate having a substrate layer and a polymer layer, wherein the polymer layer is formed on at least one surface of the substrate layer and comprises a thermoplastic polymer containing a unit based on tetrafluoroethylene and a unit based on perfluoro(alkyl vinyl ether). The manufacturing method comprises applying a liquid composition containing the powder of the thermoplastic polymer on the surface of the substrate layer and drying it to form a dry coating, heating the dry coating at a temperature above the melting temperature of the thermoplastic polymer for more than 15 seconds per 1 μm thickness of the polymer layer to form a molten coating, cooling the molten coating to a temperature below the glass transition point of the thermoplastic polymer within 120 seconds to obtain the laminate.
Description
本發明係關於一種積層體之製造方法及積層體。The present invention relates to a method for manufacturing a laminate and the laminate.
包含基於四氟乙烯之單元及基於乙烯、六氟丙烯或全氟(烷基乙烯基醚)之單元之聚合物等熱塑性含氟聚合物之耐化學品性、撥水撥油性、耐熱性、電特性等物性優異,且具有熱熔融加工性,因此被用於各種產業用途。 若將包含該等含氟聚合物之粉末之液狀組合物製成塗佈劑,於基材之表面形成聚合物層,則容易獲得表面賦予了含氟聚合物之物性之基材(參照專利文獻1)。 先前技術文獻 專利文獻Thermoplastic fluoropolymers such as polymers containing units based on tetrafluoroethylene and units based on ethylene, hexafluoropropylene or perfluoro(alkyl vinyl ether) have excellent physical properties such as chemical resistance, water and oil repellency, heat resistance, and electrical properties, and have hot melt processability, and are therefore used for various industrial purposes. If a liquid composition containing powders of these fluoropolymers is made into a coating agent and a polymer layer is formed on the surface of a substrate, it is easy to obtain a substrate with the physical properties of the fluoropolymer imparted to the surface (see Patent Document 1). Prior Art Documents Patent Documents
專利文獻1:國際公開2018/016644號Patent document 1: International Publication No. 2018/016644
[發明所欲解決之問題][The problem the invention is trying to solve]
本發明人等對由上述液狀組合物形成且包含熱塑性含氟聚合物之聚合物層之物性進行了銳意研究。 本發明人等發現,此時若選擇包含基於四氟乙烯之單元及基於全氟(烷基乙烯基醚)之單元的熱塑性含氟聚合物之粉末,則由包含其之液狀組合物形成之聚合物層之物性容易受到該形成條件之影響。而且發現,若調整上述形成條件中之加熱條件及冷卻條件,則形成表面平滑性較高之聚合物層,與基材之密接性得到提高。進而發現,於具有上述聚合物層之基材中,構成其之含氟聚合物之物性(尤其是介電損耗正切等電特性)得到顯著表現。The inventors of the present invention have conducted intensive research on the physical properties of a polymer layer formed from the above-mentioned liquid composition and containing a thermoplastic fluoropolymer. The inventors of the present invention have found that if a powder of a thermoplastic fluoropolymer containing units based on tetrafluoroethylene and units based on perfluoro(alkyl vinyl ether) is selected at this time, the physical properties of the polymer layer formed from the liquid composition containing it are easily affected by the formation conditions. It has also been found that if the heating conditions and cooling conditions in the above-mentioned formation conditions are adjusted, a polymer layer with higher surface smoothness is formed, and the adhesion with the substrate is improved. It has further been found that in a substrate having the above-mentioned polymer layer, the physical properties of the fluoropolymer constituting it (especially electrical properties such as dielectric loss tangent) are significantly manifested.
本發明之目的在於提供一種具有與基材層之密接性優異之聚合物層之積層體、及上述積層體之製造方法。 [解決問題之技術手段]The purpose of the present invention is to provide a laminate having a polymer layer with excellent adhesion to a substrate layer, and a method for manufacturing the laminate. [Technical means for solving the problem]
本發明具有下述態樣。 <1>一種積層體之製造方法,該積層體含有基材層及聚合物層,該聚合物層形成於上述基材層之至少一表面,且包含含有基於四氟乙烯之單元及基於全氟(烷基乙烯基醚)之單元之熱塑性聚合物,該積層體之製造方法係將包含上述熱塑性聚合物之粉末之液狀組合物塗佈於上述基材層之表面並進行乾燥而形成乾燥覆膜,將上述乾燥覆膜以上述聚合物層每1 μm厚度15秒以上之時間、上述熱塑性聚合物之熔融溫度以上之溫度進行加熱,形成熔融覆膜,將上述熔融覆膜於120秒以內冷卻至上述熱塑性聚合物之玻璃轉移點以下之溫度,而獲得上述積層體。 <2>如<1>之製造方法,其中上述聚合物層之厚度小於上述基材層之厚度。 <3>如<1>或<2>之製造方法,其中上述聚合物層之厚度為0.1~20 μm。 <4>如<1>至<3>中任一項之製造方法,其中加熱上述乾燥覆膜時之溫度與冷卻上述熔融覆膜時之溫度之差為上述聚合物層每1 μm厚度75℃以上。 <5>如<1>至<4>中任一項之製造方法,其中上述聚合物層包含上述熱塑性聚合物之球晶,上述球晶之半徑為5 μm以下。 <6>如<1>至<5>中任一項之製造方法,其中上述聚合物層之結晶度為50%以上。 <7>如<1>至<6>中任一項之製造方法,其中上述熱塑性聚合物係熔融溫度為260~320℃且玻璃轉移點為75~125℃者。 <8>如<1>至<7>中任一項之製造方法,其中上述熱塑性聚合物為:含有基於四氟乙烯之單元、基於全氟(丙基乙烯基醚)之單元及基於具有極性官能基之單體之單元的熱塑性聚合物;含有基於四氟乙烯之單元及基於全氟(丙基乙烯基醚)之單元2~4莫耳%之熱塑性聚合物;或含有基於四氟乙烯之單元及基於全氟(甲基乙烯基醚)之單元之熱塑性聚合物。 <9>如<1>至<8>中任一項之製造方法,其中上述液狀組合物包含無機填料。 <10>如<1>至<9>中任一項之製造方法,其中上述基材層為金屬箔或耐熱性樹脂膜。 <11>一種積層體,其具有基材層及聚合物層,該聚合物層形成於上述基材層之至少一表面,且包含含有基於四氟乙烯之單元及基於全氟(烷基乙烯基醚)之單元之熱塑性聚合物,且上述聚合物層包含上述熱塑性聚合物之球晶,上述球晶之半徑為5 μm以下。 <12>如<11>之積層體,其中上述聚合物層之結晶度為50%以上。 <13>如<11>或<12>之積層體,其中上述熱塑性聚合物係熔融溫度為260~320℃且玻璃轉移點為75~125℃者。 <14>如<11>至<13>中任一項之積層體,其中上述基材層為耐熱性樹脂膜,於上述基材層之兩面形成有上述聚合物層,且該積層體之線膨脹係數之絕對值為50 ppm/℃以下。 <15>如<11>至<14>中任一項之積層體,其用作印刷基板材料。 [發明之效果]The present invention has the following aspects. <1> A method for manufacturing a laminate, the laminate comprising a substrate layer and a polymer layer, the polymer layer being formed on at least one surface of the substrate layer and comprising a thermoplastic polymer comprising a tetrafluoroethylene-based unit and a perfluoro(alkyl vinyl ether)-based unit, the method for manufacturing the laminate comprising applying a liquid composition comprising a powder of the thermoplastic polymer on the surface of the substrate layer and drying the composition to form a dry coating, heating the dry coating at a temperature above the melting temperature of the thermoplastic polymer for a period of more than 15 seconds per 1 μm thickness of the polymer layer to form a molten coating, cooling the molten coating to a temperature below the glass transition point of the thermoplastic polymer within 120 seconds to obtain the laminate. <2> A manufacturing method as in <1>, wherein the thickness of the polymer layer is less than the thickness of the substrate layer. <3> A manufacturing method as in <1> or <2>, wherein the thickness of the polymer layer is 0.1 to 20 μm. <4> A manufacturing method as in any one of <1> to <3>, wherein the difference between the temperature when heating the dry coating and the temperature when cooling the molten coating is 75°C or more per 1 μm thickness of the polymer layer. <5> A manufacturing method as in any one of <1> to <4>, wherein the polymer layer comprises spherulites of the thermoplastic polymer, and the radius of the spherulites is 5 μm or less. <6> A manufacturing method as in any one of <1> to <5>, wherein the crystallinity of the polymer layer is 50% or more. <7> A manufacturing method as described in any one of <1> to <6>, wherein the thermoplastic polymer has a melting temperature of 260 to 320°C and a glass transition point of 75 to 125°C. <8> A manufacturing method as described in any one of <1> to <7>, wherein the thermoplastic polymer is: a thermoplastic polymer containing units based on tetrafluoroethylene, units based on perfluoro(propyl vinyl ether) and units based on monomers having polar functional groups; a thermoplastic polymer containing 2 to 4 mol% of units based on tetrafluoroethylene and units based on perfluoro(propyl vinyl ether); or a thermoplastic polymer containing units based on tetrafluoroethylene and units based on perfluoro(methyl vinyl ether). <9> A manufacturing method as described in any one of <1> to <8>, wherein the liquid composition contains an inorganic filler. <10> A manufacturing method as described in any one of <1> to <9>, wherein the substrate layer is a metal foil or a heat-resistant resin film. <11> A laminate having a substrate layer and a polymer layer, wherein the polymer layer is formed on at least one surface of the substrate layer and comprises a thermoplastic polymer containing units based on tetrafluoroethylene and units based on perfluoro(alkyl vinyl ether), and the polymer layer comprises spherulites of the thermoplastic polymer, wherein the radius of the spherulites is 5 μm or less. <12> A laminate as described in <11>, wherein the crystallinity of the polymer layer is 50% or more. <13> A laminate as described in <11> or <12>, wherein the thermoplastic polymer has a melting temperature of 260 to 320°C and a glass transition point of 75 to 125°C. <14> A laminate as described in any one of <11> to <13>, wherein the substrate layer is a heat-resistant resin film, the polymer layer is formed on both sides of the substrate layer, and the absolute value of the linear expansion coefficient of the laminate is 50 ppm/°C or less. <15> A laminate as described in any one of <11> to <14>, which is used as a printed circuit board material. [Effect of the invention]
根據本發明,獲得一種作為印刷基板材料等有用之積層體,其基材層與聚合物層之密接性較高,電特性(尤其是低介電損耗正切性)及機械特性(尤其是剝離強度及低線膨脹性)優異。According to the present invention, a laminate useful as a printed circuit board material is obtained, wherein the substrate layer and the polymer layer have high adhesion, and have excellent electrical properties (especially low dielectric loss tangent) and mechanical properties (especially peel strength and low linear expansion).
以下用語具有以下含義。 「熱塑性聚合物」意指表現出熔融流動性之聚合物,指於負載49 N之條件下,於較聚合物之熔融溫度高20℃以上之溫度中存在熔融流動速度成為0.1~1000 g/10分鐘之溫度之聚合物。再者,「熔融流動速度(MFR)」意指JIS K 7210:1999(ISO 1133:1997)中規定之聚合物之熔體質量流率。 「聚合物之熔融溫度(熔點)」係與藉由示差掃描熱測定(DSC)法測定之聚合物之熔解峰之最大值對應的溫度。 「聚合物之玻璃轉移點」係藉由動態黏彈性測定(DMA)法分析聚合物並進行測定所得之值。 「粉末之平均粒徑(D50)」係藉由雷射繞射、散射法求出之粉末之體積基準累積50%粒徑。即藉由雷射繞射、散射法測定粉末之粒度分佈,將粉末之粒子集群之總體積設為100%求出累積曲線,粉末之平均粒徑(D50)為該累積曲線上累積體積成為50%之點之粒徑。 「粉末之D100」係以同樣之方式測定之粉末之體積基準累積100%粒徑。 粉末之D50及D100係使粉末分散於水中,使用雷射繞射、散射式粒度分佈測定裝置(堀場製作所公司製造之LA-920測定器)求出。 「層之結晶度」係對單離所得之層進行X射線繞射而求出。即,於所獲得之X射線繞射圖案中,以連接10°之繞射角2θ下之繞射強度與25°之繞射角2θ下之繞射強度之直線作為基準線,藉由輪廓擬合將由基準線及繞射強度曲線圍成之區域分離成2個對稱性峰,以繞射角2θ較大者作為結晶性峰,作為上述結晶性峰於上述區域中所占之比率而求出。 「基材層之表面之十點平均粗糙度(Rzjis)」係JIS B 0601:2013之附件JA中規定之值。 「耐熱性樹脂」意指熔點為280℃以上之高分子化合物,或JIS C 4003:2010(IEC 60085:2007)中規定之最高連續使用溫度為121℃以上之高分子化合物。 聚合物中之「單元」可為利用聚合反應由單體直接形成之原子團,亦可為利用特定之方法對藉由聚合反應所得之聚合物進行處理而結構之一部分經轉化而成之原子團。亦將聚合物中所含之基於單體A之單元僅記為「單體A單元」。 「重量平均分子量(Mw)」係藉由凝膠滲透層析法(GPC)測定之聚合物之標準聚苯乙烯換算值。 「(甲基)丙烯酸系聚合物」係甲基丙烯酸酯之聚合物與丙烯酸酯之聚合物之統稱。 「(甲基)丙烯酸酯」係丙烯酸酯與甲基丙烯酸酯之統稱。The following terms have the following meanings. "Thermoplastic polymer" means a polymer that exhibits melt fluidity, and refers to a polymer that has a melt flow rate of 0.1 to 1000 g/10 minutes at a temperature 20°C higher than the melting temperature of the polymer under a load of 49 N. Furthermore, "melt flow rate (MFR)" means the melt mass flow rate of a polymer as specified in JIS K 7210:1999 (ISO 1133:1997). "Melting temperature (melting point) of a polymer" is the temperature corresponding to the maximum value of the melting peak of a polymer measured by differential scanning calorimetry (DSC). "Glass transition point of a polymer" is a value obtained by analyzing and measuring a polymer by dynamic viscoelasticity measurement (DMA). "Average particle size of powder (D50)" is the volume-based cumulative 50% particle size of powder obtained by laser diffraction and scattering method. That is, the particle size distribution of powder is measured by laser diffraction and scattering method, and the total volume of the particle cluster of powder is set as 100% to obtain the cumulative curve. The average particle size of powder (D50) is the particle size at the point where the cumulative volume is 50% on the cumulative curve. "D100 of powder" is the volume-based cumulative 100% particle size of powder measured in the same way. The D50 and D100 of powder are obtained by dispersing the powder in water and using a laser diffraction and scattering particle size distribution measuring device (LA-920 measuring device manufactured by Horiba, Ltd.). "Layer crystallinity" is obtained by performing X-ray diffraction on the isolated layer. That is, in the obtained X-ray diffraction pattern, a straight line connecting the diffraction intensity at a diffraction angle of 10° and the diffraction intensity at a diffraction angle of 2θ of 25° is used as a reference line, and the area enclosed by the reference line and the diffraction intensity curve is separated into two symmetrical peaks by contour fitting, and the one with a larger diffraction angle 2θ is taken as the crystallinity peak, and the ratio of the above crystallinity peak in the above area is obtained. "Ten-point average roughness of the surface of the substrate layer (Rzjis)" is the value specified in Annex JA of JIS B 0601:2013. "Heat-resistant resin" means a polymer compound with a melting point of 280°C or above, or a polymer compound with a maximum continuous use temperature of 121°C or above as specified in JIS C 4003:2010 (IEC 60085:2007). "Unit" in a polymer can be an atomic group directly formed from a monomer by polymerization reaction, or an atomic group formed by treating a polymer obtained by polymerization reaction by a specific method and converting a part of the structure. Units based on monomer A contained in a polymer are also simply referred to as "monomer A units". "Weight average molecular weight (Mw)" is the standard polystyrene conversion value of the polymer measured by gel permeation chromatography (GPC). "(Meth) acrylic polymer" is a general term for polymers of methacrylate and polymers of acrylate. "(Meth)acrylate" is a general term for acrylate and methacrylate.
本發明之製造方法(本法)將液狀組合物塗佈於基材層之至少一表面並進行乾燥,形成乾燥覆膜,對乾燥覆膜進行加熱而形成熔融覆膜,並將熔融覆膜加以冷卻,該液狀組合物包含熱塑性聚合物(以下亦記為「PFA系聚合物」)之粉末,該熱塑性聚合物含有基於四氟乙烯(TFE)之單元(TFE單元)及基於全氟(烷基乙烯基醚)(PAVE)之單元(PAVE單元)。藉由本法,製造具有基材層、以及形成於基材層之至少一表面且包含PFA系聚合物之聚合物層的積層體。 本法中之乾燥覆膜之加熱係以聚合物層每1 μm厚度15秒以上之時間、PFA系聚合物之熔融溫度以上之溫度進行。 本法中之熔融覆膜之冷卻係於120秒以內設為PFA系聚合物之玻璃轉移點以下之溫度而進行。The manufacturing method of the present invention (this method) is to apply a liquid composition on at least one surface of a substrate layer and dry it to form a dry coating, heat the dry coating to form a molten coating, and cool the molten coating. The liquid composition contains a powder of a thermoplastic polymer (hereinafter also referred to as "PFA-based polymer"), and the thermoplastic polymer contains a unit based on tetrafluoroethylene (TFE) (TFE unit) and a unit based on perfluoro(alkyl vinyl ether) (PAVE) (PAVE unit). By this method, a laminate having a substrate layer and a polymer layer formed on at least one surface of the substrate layer and containing a PFA-based polymer is manufactured. The heating of the dry coating in this method is performed for a time of more than 15 seconds per 1 μm thickness of the polymer layer and at a temperature above the melting temperature of the PFA-based polymer. In this method, the cooling of the molten coating is performed within 120 seconds to a temperature below the glass transition point of the PFA-based polymer.
本發明人等發現,若將熔融覆膜(包含熔融狀態之PFA系聚合物之覆膜)之形成中之加熱條件、及聚合物層(將熔融覆膜冷卻所形成之包含PFA系聚合物之覆膜)之形成中之冷卻條件分別設為上述條件,則積層體中之聚合物層與基材層之密接性優異,且該聚合物層之電特性(尤其是低介電損耗正切性)及機械特性(尤其是剝離強度及低線膨脹性)顯著優異。The inventors of the present invention have discovered that if the heating conditions in the formation of a molten coating (a coating comprising a PFA-based polymer in a molten state) and the cooling conditions in the formation of a polymer layer (a coating comprising a PFA-based polymer formed by cooling the molten coating) are respectively set to the above conditions, the adhesion between the polymer layer and the substrate layer in the laminate is excellent, and the electrical properties (especially low dielectric loss tangent) and mechanical properties (especially peel strength and low linear expansion) of the polymer layer are remarkably excellent.
其理由未必明確,如下所述進行考慮。 認為若於上述條件下對乾燥覆膜進行加熱,則PFA系聚合物之粉末整體充分熔融,形成PFA系聚合物高度流動而成之熔融覆膜。認為若於上述條件下將上述狀態之熔融覆膜冷卻,則至少部分作為結晶性聚合物之PFA系聚合物緻密地結晶化(固化),其球晶變得充分小。即,亦認為聚合物層包含PFA系聚合物之微小球晶,其表面之微小階差(凹凸)之尺寸變得充分小。認為其結果為,積層體中之基材層與聚合物層之密接性得到提高,其特性顯著提高。The reason is not necessarily clear, and it is considered as follows. It is believed that if the dry coating is heated under the above conditions, the powder of the PFA-based polymer is fully melted as a whole, forming a molten coating in which the PFA-based polymer is highly fluid. It is believed that if the molten coating in the above state is cooled under the above conditions, at least part of the PFA-based polymer, which is a crystalline polymer, is densely crystallized (solidified), and its spherulites become sufficiently small. In other words, it is also believed that the polymer layer contains microscopic spherulites of the PFA-based polymer, and the size of the microscopic steps (concavities and convexities) on its surface becomes sufficiently small. As a result, it is believed that the adhesion between the base material layer and the polymer layer in the laminate is improved, and its characteristics are significantly improved.
具體而言,本發明人等發現,於基材層為金屬箔之積層體(附聚合物層之金屬箔)或由其獲得之印刷基板中,剝離強度顯著提高。認為其原因在於:由於上述理由,聚合物層與基材層之接著面之密接性提高,其中存在之空氣量或空隙變得充分小。 又,本發明人等發現,於積層體或印刷基板之聚合物層中,介電損耗正切(Df)顯著降低。認為其原因在於PFA系聚合物緻密地結晶化,而高度表現PFA系聚合物之特性。 上述積層體中之聚合物層之頻率10 GHz下之介電損耗正切較佳為0.0020以下,更佳為0.0015以下。上述介電損耗正切較佳為0.0001以上。由上述積層體製造之印刷基板之傳輸損耗被充分降低。Specifically, the inventors of the present invention have found that the peel strength is significantly improved in a laminate whose substrate layer is a metal foil (metal foil with a polymer layer attached) or a printed circuit board obtained therefrom. The reason for this is believed to be that the adhesion between the polymer layer and the substrate layer is improved due to the above reasons, and the amount of air or voids present therein becomes sufficiently small. In addition, the inventors of the present invention have found that the dielectric loss tangent (Df) is significantly reduced in the polymer layer of the laminate or printed circuit board. The reason for this is believed to be that the PFA-based polymer is densely crystallized and the characteristics of the PFA-based polymer are highly expressed. The dielectric loss tangent of the polymer layer in the laminate at a frequency of 10 GHz is preferably 0.0020 or less, more preferably 0.0015 or less. The dielectric loss tangent is preferably 0.0001 or more. The transmission loss of the printed circuit board manufactured by the laminate is sufficiently reduced.
又,本發明人等發現,基材層為耐熱性樹脂膜且於基材層之兩面形成聚合物層之積層體之線膨脹性顯著降低,而不易產生翹曲。認為其原因亦在於:由於上述理由,聚合物層與基材層之接著面之密接性提高。 上述積層體中之聚合物層之線膨脹係數(絕對值)較佳為50 ppm/℃以下,更佳為25 ppm/℃。上述線膨脹係數(絕對值)較佳為1 ppm/℃以上。Furthermore, the inventors have found that the linear expansion of a laminate in which the substrate layer is a heat-resistant resin film and polymer layers are formed on both sides of the substrate layer is significantly reduced, and warping is not easy to occur. The reason is believed to be that the adhesion between the polymer layer and the substrate layer is improved due to the above reasons. The linear expansion coefficient (absolute value) of the polymer layer in the above laminate is preferably less than 50 ppm/℃, and more preferably 25 ppm/℃. The above linear expansion coefficient (absolute value) is preferably greater than 1 ppm/℃.
本發明之聚合物層較佳為包含PFA系聚合物之球晶。 上述球晶之半徑較佳為5 μm以下,更佳為3 μm以下,進而較佳為未達1 μm。上述半徑較佳為0.01 μm以上,更佳為0.1 μm以上。 本發明之PFA系聚合物含有TFE單元及PAVE單元。再者,亦可於PAVE單元所具有之側鏈之全氟烷基之碳原子間插入醚性氧原子。The polymer layer of the present invention is preferably a spherulite containing a PFA-based polymer. The radius of the spherulite is preferably less than 5 μm, more preferably less than 3 μm, and further preferably less than 1 μm. The radius is preferably greater than 0.01 μm, more preferably greater than 0.1 μm. The PFA-based polymer of the present invention contains a TFE unit and a PAVE unit. Furthermore, an etheric oxygen atom may be inserted between carbon atoms of the perfluoroalkyl group of the side chain of the PAVE unit.
本發明之聚合物層之結晶度較佳為聚合物層中之PFA系聚合物之結晶度。聚合物層之結晶度較佳為50%以上,更佳為60%以上,進而較佳為65%以上,尤佳為70%以上。聚合物層之結晶度較佳為99%以下。 根據本法,熔融之PFA系聚合物被急速冷卻至特定溫度而形成聚合物層,因此容易形成上述結晶度之聚合物層。其結果為,容易形成與上述基材層之密接性或電特性優異,且線膨脹係數較低,導熱性亦優異之聚合物層。The crystallinity of the polymer layer of the present invention is preferably the crystallinity of the PFA-based polymer in the polymer layer. The crystallinity of the polymer layer is preferably 50% or more, more preferably 60% or more, further preferably 65% or more, and particularly preferably 70% or more. The crystallinity of the polymer layer is preferably 99% or less. According to this method, the molten PFA-based polymer is rapidly cooled to a specific temperature to form a polymer layer, so it is easy to form a polymer layer with the above crystallinity. As a result, it is easy to form a polymer layer with excellent adhesion or electrical properties to the above-mentioned substrate layer, a low linear expansion coefficient, and excellent thermal conductivity.
PFA系聚合物之氟含量較佳為70~76質量%,更佳為72~76質量%。 PFA系聚合物較佳為相對於構成聚合物之所有單元,包含90~99莫耳%之TFE單元。 PFA系聚合物較佳為相對於構成聚合物之所有單元,包含1~10莫耳%之PAVE單元。 作為PAVE,可列舉:全氟(甲基乙烯基醚)(CF2 =CFOCF3 :PMVE)、全氟(乙基乙烯基醚)(CF2 =CFOCF2 CF3 )、全氟(丙基乙烯基醚)(CF2 =CFOCF2 CF2 CF3 :PPVE)、CF2 =CFOCF2 CF2 CF2 CF3 、全氟(丙氧基丙基乙烯基醚)(CF2 =CFOCF2 CF(CF3 )OCF2 CF2 CF3 :PPOVE)。The fluorine content of the PFA-based polymer is preferably 70-76% by mass, more preferably 72-76% by mass. The PFA-based polymer preferably contains 90-99 mol% of TFE units relative to all units constituting the polymer. The PFA-based polymer preferably contains 1-10 mol% of PAVE units relative to all units constituting the polymer. Examples of PAVE include perfluoro(methyl vinyl ether) ( CF2 = CFOCF3 : PMVE), perfluoro(ethyl vinyl ether) (CF2=CFOCF2CF3), perfluoro( propyl vinyl ether ) ( CF2 = CFOCF2CF2CF3 : PPVE ), CF2 = CFOCF2CF2CF2CF3 , and perfluoro(propoxypropyl vinyl ether) ( CF2 = CFOCF2CF ( CF3 ) OCF2CF2CF3 : PPOVE ) .
PFA系聚合物可為僅包含TFE單元及PAVE單元之聚合物,亦可為進而包含其他單元之聚合物。 PFA系聚合物可為具有極性官能基之聚合物。作為具有極性官能基之聚合物,可列舉:於聚合物之主鏈之末端基具有極性官能基之PFA系聚合物;藉由電漿處理、電離輻射處理或電暈處理被導入極性官能基之PFA系聚合物;含有TFE單元、PAVE單元及基於具有極性官能基之單體(以下亦記為「極性單體」)之單元(以下亦記為「極性單元」)的PFA系聚合物。PFA-based polymers may be polymers containing only TFE units and PAVE units, or may be polymers containing other units. PFA-based polymers may be polymers having polar functional groups. Examples of polymers having polar functional groups include: PFA-based polymers having polar functional groups at the terminal groups of the main chains of the polymers; PFA-based polymers into which polar functional groups are introduced by plasma treatment, ionizing radiation treatment, or corona treatment; PFA-based polymers containing TFE units, PAVE units, and units based on monomers having polar functional groups (hereinafter also referred to as "polar monomers") (hereinafter also referred to as "polar units").
作為極性官能基,較佳為羥基含有基、羰基含有基、縮醛基或膦酸基(-OP(O)OH2 ),就進一步提高與基材層之接著性之觀點而言,更佳為羰基含有基。 羥基含有基較佳為含有醇性羥基之基,更佳為-CF2 CH2 OH、-C(CF3 )2 OH或1,2-二醇基(-CH(OH)CH2 OH)。 羰基含有基為含羰基(>C(O))之基,較佳為羧基、烷氧基羰基、醯胺基、異氰酸基、胺基甲酸酯基(-OC(O)NH2 )、酸酐殘基(-C(O)OC(O)-)、醯亞胺殘基(-C(O)NHC(O)-等)或碳酸酯基(-OC(O)O-)。 作為極性單體之具體例,可列舉:伊康酸酐、檸康酸酐、5-降𦯉烯-2,3-二羧酸酐(別稱:雙環庚烯二甲酸酐;以下亦記為「NAH」)或順丁烯二酸酐。The polar functional group is preferably a hydroxyl group, a carbonyl group, an acetal group or a phosphonic acid group (-OP(O)OH 2 ), and is more preferably a carbonyl group from the viewpoint of further improving the adhesion to the substrate layer. The hydroxyl group is preferably a group containing an alcoholic hydroxyl group, and is more preferably -CF 2 CH 2 OH, -C(CF 3 ) 2 OH or a 1,2-diol group (-CH(OH)CH 2 OH). The carbonyl-containing group is a group containing a carbonyl group (>C(O)), preferably a carboxyl group, an alkoxycarbonyl group, an amide group, an isocyanate group, a carbamate group (-OC(O)NH 2 ), an anhydride residue (-C(O)OC(O)-), an imide residue (-C(O)NHC(O)-, etc.) or a carbonate group (-OC(O)O-). Specific examples of polar monomers include itaconic anhydride, cisconic anhydride, 5-northene-2,3-dicarboxylic anhydride (also known as bicycloheptene dicarboxylic anhydride; hereinafter also referred to as "NAH") or maleic anhydride.
PFA系聚合物較佳為:(i)含有TFE單元、PAVE單元及極性單元之聚合物;(ii)含有TFE單元及PPVE單元2~4莫耳%之聚合物;或(iii)含有TFE單元及PMVE單元之聚合物。 上述(i)之聚合物於結晶化時,極性官能基彼此相互作用,因此容易促進層狀結構之形成,生成微小球晶,而容易進一步提高與基材層之密接性。進而,藉由極性官能基,基材層與聚合物層之接著性容易進一步提高。 構成上述(i)之聚合物之所有單元中,TFE單元之比率、PAVE單元之比率、極性單元之比率較佳為依序為90~99莫耳%、0.5~9.97莫耳%、0.01~3莫耳%。The PFA-based polymer is preferably: (i) a polymer containing TFE units, PAVE units and polar units; (ii) a polymer containing TFE units and 2-4 mol% of PPVE units; or (iii) a polymer containing TFE units and PMVE units. When the polymer of the above (i) is crystallized, the polar functional groups interact with each other, thereby easily promoting the formation of a layered structure, generating micro-spherulites, and easily further improving the adhesion with the substrate layer. Furthermore, the adhesion between the substrate layer and the polymer layer is easily further improved by the polar functional groups. Among all the units constituting the polymer of the above (i), the ratio of TFE units, the ratio of PAVE units, and the ratio of polar units are preferably 90-99 mol%, 0.5-9.97 mol%, and 0.01-3 mol%, respectively.
上述(ii)之聚合物之PAVE單元為PPVE單元,且構成聚合物之所有單元中,含有中量(2~4莫耳%)PPVE單元,因此,於結晶化時容易促進層狀結構之形成,生成微小球晶,而容易進一步提高與基材層之密接性。該聚合物較佳為包含TFE單元及PPVE單元,且含有96~98莫耳%之TFE單元、2~4莫耳%之PPVE單元。The PAVE unit of the polymer of (ii) above is a PPVE unit, and among all the units constituting the polymer, a moderate amount (2 to 4 mol%) of the PPVE unit is contained, so that during crystallization, the formation of a layered structure is easily promoted to generate micro-spherulites, and the adhesion with the substrate layer is easily further improved. The polymer preferably contains a TFE unit and a PPVE unit, and contains 96 to 98 mol% of the TFE unit and 2 to 4 mol% of the PPVE unit.
上述(iii)之聚合物之PAVE單元為側鏈較短之PMVE單元,於結晶化時容易促進層狀結構之形成,生成微小球晶,而容易進一步提高與基材層之密接性。該聚合物較佳為含有10~20莫耳%之PMVE單元。該聚合物較佳為包含TFE單元及PMVE單元,且含有80~90莫耳%之TFE單元、10~20莫耳%之PMVE單元。The PAVE unit of the polymer of (iii) above is a PMVE unit with a short side chain, which can easily promote the formation of a layered structure during crystallization, generate microspherulites, and easily further improve the adhesion with the substrate layer. The polymer preferably contains 10-20 mol% of PMVE units. The polymer preferably contains TFE units and PMVE units, and contains 80-90 mol% of TFE units and 10-20 mol% of PMVE units.
本發明中之PFA系聚合物可單獨使用1種,亦可使用2種以上。作為後者之態樣,可列舉使用PFA系聚合物與上述(i)之聚合物、上述(iii)之聚合物、或含有TFE單元及PPOVE單元之熱塑性聚合物的態樣。前者之PFA系聚合物係與後者之聚合物不同之PFA系聚合物,其較佳為包含TFE單元及PPVE單元,且含有超過98莫耳%且未達100%之TFE單元、以及超過0莫耳%且未達2莫耳%之PPVE單元。 於上述態樣中,後者之聚合物作為結晶核發揮功能,以該結晶核為中心而容易促進前者之PFA系聚合物之結晶化,生成微小球晶,而容易提高與基材層之密接性。 前者之PFA系聚合物相對於後者之聚合物之質量比較佳為2~50,更佳為5~35。於該情形時,更容易調整所生成之球晶之半徑。The PFA polymers in the present invention may be used alone or in combination of two or more. As the latter aspect, there may be exemplified an aspect in which a PFA polymer is used together with the polymer of (i) above, the polymer of (iii) above, or a thermoplastic polymer containing TFE units and PPOVE units. The former PFA polymer is a PFA polymer different from the latter polymer, and preferably contains TFE units and PPVE units, and contains more than 98 mol% and less than 100% TFE units, and more than 0 mol% and less than 2 mol% PPVE units. In the above aspect, the latter polymer functions as a crystal nucleus, and the crystallization of the former PFA polymer is easily promoted with the crystal nucleus as the center, generating microspherulites, and easily improving the adhesion with the substrate layer. The mass ratio of the former PFA-based polymer to the latter polymer is preferably 2 to 50, more preferably 5 to 35. In this case, it is easier to adjust the radius of the generated spherulites.
PFA系聚合物於380℃下之熔融黏度較佳為1×102 ~1×106 Pa・s,更佳為1×103 ~1×106 Pa・s。 PFA系聚合物之熔融溫度較佳為260~320℃,更佳為280~320℃。 PFA系聚合物之玻璃轉移點較佳為75~125℃,更佳為80~100℃。 若使用上述PFA系聚合物,則容易形成緻密且密接性優異之聚合物層。The melt viscosity of the PFA polymer at 380°C is preferably 1×10 2 to 1×10 6 Pa·s, more preferably 1×10 3 to 1×10 6 Pa·s. The melting temperature of the PFA polymer is preferably 260 to 320°C, more preferably 280 to 320°C. The glass transition point of the PFA polymer is preferably 75 to 125°C, more preferably 80 to 100°C. If the above PFA polymer is used, a dense polymer layer with excellent adhesion can be easily formed.
本法中之粉末之D50較佳為小於聚合物層之厚度。 粉末較佳為0.05~6 μm,更佳為0.1~3 μm。又,其D100較佳為10 μm以下,更佳為5 μm以下。於該範圍之D50及D100下,粉末之流動性及分散性良好,容易形成緻密且密接性優異之聚合物層。 粉末可含有PFA系聚合物以外之成分,較佳為由PFA系聚合物構成。粉末中之PFA系聚合物之含量較佳為80質量%以上,更佳為100質量%。 作為PFA系聚合物以外之成分,可列舉:芳香族聚酯、聚醯胺醯亞胺、熱塑性聚醯亞胺、聚苯醚(polyphenylene ether)、聚苯醚(polyphenylene oxide)。The D50 of the powder in this method is preferably less than the thickness of the polymer layer. The powder is preferably 0.05 to 6 μm, more preferably 0.1 to 3 μm. In addition, its D100 is preferably 10 μm or less, more preferably 5 μm or less. Under this range of D50 and D100, the powder has good fluidity and dispersibility, and it is easy to form a dense and excellent polymer layer. The powder may contain components other than PFA polymers, and is preferably composed of PFA polymers. The content of PFA polymers in the powder is preferably 80% by mass or more, and more preferably 100% by mass. As components other than PFA polymers, there can be listed: aromatic polyesters, polyamide imides, thermoplastic polyimides, polyphenylene ethers, and polyphenylene oxides.
本法中之液狀組合物較佳為包含液狀介質。該液狀介質係粉末之分散介質,為於25℃下為惰性之液狀化合物。上述液狀介質較佳為沸點低於液狀組合物所含之液狀介質以外之成分且揮發性之化合物。液狀介質可單獨使用1種,亦可混合2種以上。 液狀介質較佳為極性,且為非水性。 液狀介質之沸點較佳為80~275℃,更佳為125~250℃。於該情形時,於形成乾燥覆膜時,隨著液狀介質之揮發,粉末之流動有效地進行,粉末容易緻密地填充。The liquid composition in this method preferably contains a liquid medium. The liquid medium is a dispersion medium for the powder and is a liquid compound that is inert at 25°C. The liquid medium is preferably a volatile compound having a boiling point lower than the components other than the liquid medium contained in the liquid composition. The liquid medium may be used alone or two or more may be mixed. The liquid medium is preferably polar and non-aqueous. The boiling point of the liquid medium is preferably 80 to 275°C, more preferably 125 to 250°C. In this case, when forming a dry film, the powder flows effectively as the liquid medium evaporates, and the powder is easily and densely filled.
作為液狀介質之具體例,可列舉:水、甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、1-甲氧基-2-丙醇、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、甲基乙基酮、N-甲基-2-吡咯啶酮、γ-丁內酯、環己酮、環戊酮、二甲基亞碸、二乙醚、二㗁烷、乳酸乙酯、乙酸乙酯、乙酸丁酯、甲基乙基酮、甲基異丙基酮、環戊酮、環己酮、乙二醇單異丙醚、溶纖劑(甲基溶纖劑、乙基溶纖劑等)。 就調整液狀組合物之液物性(黏度、觸變比等)之觀點而言,液狀介質較佳為有機液狀介質(有機化合物),更佳為酮或醯胺,進而較佳為甲基乙基酮、環己酮或N-甲基-2-吡咯啶酮。Specific examples of liquid media include: water, methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 1-methoxy-2-propanol, N,N-dimethylformamide, N,N-dimethylacetamide, methyl ethyl ketone, N-methyl-2-pyrrolidone, γ-butyrolactone, cyclohexanone, cyclopentanone, dimethyl sulfoxide, diethyl ether, dioxane, ethyl lactate, ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isopropyl ketone, cyclopentanone, cyclohexanone, ethylene glycol monoisopropyl ether, and solvents (methyl solvent, ethyl solvent, etc.). From the viewpoint of adjusting the liquid properties (viscosity, thixotropic ratio, etc.) of the liquid composition, the liquid medium is preferably an organic liquid medium (organic compound), more preferably a ketone or an amide, and further preferably methyl ethyl ketone, cyclohexanone, or N-methyl-2-pyrrolidone.
本法中之液狀組合物較佳為進而包含聚合物結著劑。再者,構成該等劑之聚合物為不同於PFA系聚合物之聚合物,較佳為順丁烯二醯亞胺樹脂、胺基甲酸酯樹脂、聚醯亞胺、聚醯胺酸、聚醯胺醯亞胺、聚苯醚(polyphenylene ether)、聚苯醚(polyphenylene oxide)、液晶聚酯及(甲基)丙烯酸系聚合物,更佳為順丁烯二醯亞胺樹脂、聚醯亞胺及聚醯胺酸。 於結著劑為順丁烯二醯亞胺樹脂、聚醯亞胺及聚醯胺酸之情形時,聚合物層容易柔軟性及接著性優異。作為結著劑,更佳為均為芳香族性之順丁烯二醯亞胺樹脂、聚醯亞胺及聚醯胺酸。 聚醯亞胺較佳為熱塑性。The liquid composition in the present method preferably further includes a polymer binder. Furthermore, the polymer constituting the agents is a polymer different from the PFA-based polymer, preferably butylene diimide resin, urethane resin, polyimide, polyamide, polyamide imide, polyphenylene ether, polyphenylene oxide, liquid crystal polyester and (meth) acrylic polymer, more preferably butylene diimide resin, polyimide and polyamide. When the binder is butylene diimide resin, polyimide and polyamide, the polymer layer is easy to be flexible and has excellent adhesion. As binders, preferred are butylene imide resins, polyimide and polyamide, all of which are aromatic. Polyimide is preferably thermoplastic.
若液狀組合物包含聚合物結著劑,則覆膜中之粉末之落粉得到抑制,而聚合物層之表面平滑性容易進一步提高。 若液狀組合物包含聚合物分散劑,則液狀組合物之液物性及分散穩定性容易進一步提高,而覆膜之形成容易更緻密地進行。If the liquid composition contains a polymer binder, the powder falling in the coating is suppressed, and the surface smoothness of the polymer layer is further improved. If the liquid composition contains a polymer dispersant, the liquid properties and dispersion stability of the liquid composition are further improved, and the coating is formed more densely.
作為聚合物結著劑之具體例,可列舉:「ADVANCELL」系列(積水化學公司製造)、「ARON」系列(東亞合成公司製造)、「Oricox」系列(共榮社化學公司製造)、「PHORET」系列(綜研化學公司製造)、「Dicfine」系列(DIC公司製造)等(甲基)丙烯酸系聚合物;「HPC」系列(日立化成公司製造)等聚醯胺醯亞胺;「Neopulim」系列(Mitsubishi Gas Chemical公司製造)、「SPIXAREA」系列(SOMAR公司製造)、「Q-PILON」系列(PI技術研究所製造)、「WINGO」系列(WINGO TECHNOLOGY公司製造)、「TOHMIDE」系列(T&K TOKA公司製造)、「KPI-MX」系列(河村產業公司製造)、「UPIA-AT」系列(宇部興產公司製造)等聚醯亞胺。Specific examples of polymer binders include (meth)acrylic polymers such as the "ADVANCELL" series (manufactured by Sekisui Chemical Co., Ltd.), the "ARON" series (manufactured by Toagosei Co., Ltd.), the "Oricox" series (manufactured by Kyoeisha Chemical Co., Ltd.), the "PHORET" series (manufactured by Soken Chemical Co., Ltd.), and the "Dicfine" series (manufactured by DIC Corporation); polyamide imides such as the "HPC" series (manufactured by Hitachi Chemical Co., Ltd.); "Neopulim" series (manufactured by Mitsubishi Gas Chemical Co., Ltd.), "SPIXAREA" series (manufactured by Somar Co., Ltd.), "Q-PILON" series (manufactured by PI Technical Laboratory), "WINGO" series (manufactured by WINGO TECHNOLOGY Co., Ltd.), and "TOHMIDE" series (manufactured by T&K Chemical Co., Ltd.). TOKA Co., Ltd.), "KPI-MX" series (manufactured by Kawamura Industrial Co., Ltd.), "UPIA-AT" series (manufactured by Ube Industries, Ltd.), and other polyimides.
本法中之液狀組合物較佳為進而包含聚合物分散劑。 聚合物分散劑較佳為包含具有親水部位及疏水部位之聚合物。上述聚合物較佳為於聚合物之側鏈具有該等部位。 親水部位較佳為包含非離子性官能基之分子鏈,更佳為含醇性羥基之基或聚氧伸烷基。 聚氧伸烷基可包含1種聚氧伸烷基,亦可包含2種以上聚氧伸烷基。於後者之情形時,種類不同之聚氧伸烷基可呈無規狀配置,亦可呈嵌段狀配置。 聚氧伸烷基較佳為聚氧伸乙基或聚氧伸丙基,更佳為聚氧伸乙基。The liquid composition in the present method preferably further comprises a polymer dispersant. The polymer dispersant preferably comprises a polymer having a hydrophilic part and a hydrophobic part. The above polymer preferably has these parts in the side chain of the polymer. The hydrophilic part is preferably a molecular chain containing a non-ionic functional group, and more preferably a group containing an alcoholic hydroxyl group or a polyoxyalkylene group. The polyoxyalkylene group may contain one type of polyoxyalkylene group, or may contain two or more types of polyoxyalkylene groups. In the latter case, different types of polyoxyalkylene groups may be arranged randomly or in blocks. The polyoxyalkylene group is preferably a polyoxyethylene group or a polyoxypropylene group, and more preferably a polyoxyethylene group.
疏水部位較佳為烷基、乙炔基含有基、聚矽氧烷基、全氟烷基或全氟烯基,更佳為全氟烷基或全氟烯基。 全氟烷基或全氟烯基之碳數較佳為4~16。又,全氟烷基或全氟烯基之碳原子-碳原子間亦可插入醚性氧原子。The hydrophobic part is preferably an alkyl group, an ethynyl group, a polysiloxane group, a perfluoroalkyl group or a perfluoroalkenyl group, and more preferably a perfluoroalkyl group or a perfluoroalkenyl group. The carbon number of the perfluoroalkyl group or the perfluoroalkenyl group is preferably 4 to 16. In addition, an etheric oxygen atom may be inserted between carbon atoms of the perfluoroalkyl group or the perfluoroalkenyl group.
上述聚合物較佳為非離子性。 上述聚合物之重量平均分子量較佳為2000~80000。 上述聚合物之氟含量更佳為20~50質量%。 上述聚合物之氧伸烷基之含量更佳為20~50質量%。 上述聚合物之羥值較佳為10~300 mgKOH/g。The polymer is preferably non-ionic. The weight average molecular weight of the polymer is preferably 2000 to 80000. The fluorine content of the polymer is more preferably 20 to 50% by mass. The content of the oxyalkylene group of the polymer is more preferably 20 to 50% by mass. The hydroxyl value of the polymer is preferably 10 to 300 mgKOH/g.
作為上述聚合物之適宜態樣,可列舉側鏈分別具有全氟烷基或全氟烯基及聚氧伸烷基或醇性羥基之聚合物。作為上述聚合物之更適宜態樣,可列舉具有全氟烷基或全氟烯基之(甲基)丙烯酸酯及具有聚氧伸烷基或醇性羥基之(甲基)丙烯酸酯的共聚物。 作為聚合物分散劑之具體例,可列舉:「FTERGENT」系列(NEOS公司製造)、「Surflon」系列(AGC清美化學公司製造)、「MEGAFAC」系列(DIC公司製造)、「Unidyne」系列(大金工業公司製造)。As a suitable embodiment of the above polymer, there can be cited a polymer having a perfluoroalkyl group or a perfluoroalkenyl group and a polyoxyalkylene group or an alcoholic hydroxyl group as the side chain. As a more suitable embodiment of the above polymer, there can be cited a copolymer of a (meth)acrylate having a perfluoroalkyl group or a perfluoroalkenyl group and a (meth)acrylate having a polyoxyalkylene group or an alcoholic hydroxyl group. As specific examples of polymer dispersants, there can be cited: "FTERGENT" series (manufactured by NEOS), "Surflon" series (manufactured by AGC Seimei Chemical Co., Ltd.), "MEGAFAC" series (manufactured by DIC Corporation), and "Unidyne" series (manufactured by Daikin Industries, Ltd.).
本法中之液狀組合物亦可進而包含PFA系聚合物以外之含氟聚合物。作為上述含氟聚合物之適宜態樣,可列舉聚四氟乙烯(PTFE)之粉末。於該情形時,於聚合物層(成形物)中,容易顯著地表現基於PTFE之物性(低介電損耗正切性等電特性)。 PTFE較佳為基於下式(1)算出之數量平均分子量(Mn)為20萬以下之PTFE(低分子量PTFE)。 Mn=2.1×1010×ΔHc-5.16・・・(1) 式(1)中,ΔHc表示利用示差掃描熱量分析法測定之PTFE之結晶化熱量(cal/g)。 低分子量PTFE之Mn較佳為10以下,更佳為5萬以下。低分子量PTFE之Mn較佳為1萬以上。The liquid composition in this method may further include fluorine-containing polymers other than PFA-based polymers. As a suitable embodiment of the above-mentioned fluorine-containing polymer, a powder of polytetrafluoroethylene (PTFE) can be cited. In this case, the physical properties based on PTFE (electrical properties such as low dielectric loss tangent) are easily and significantly expressed in the polymer layer (molded product). PTFE is preferably PTFE (low molecular weight PTFE) having a number average molecular weight (Mn) of 200,000 or less calculated based on the following formula (1). Mn=2.1×1010×ΔHc-5.16・・・(1) In formula (1), ΔHc represents the crystallization heat (cal/g) of PTFE measured by differential scanning calorimetry. The Mn of low molecular weight PTFE is preferably 10 or less, and more preferably 50,000 or less. The Mn of low molecular weight PTFE is preferably 10,000 or more.
認為於本法中之液狀組合物包含該等成分之情形時,於由熔融覆膜形成聚合物層時,該等成分作為結晶核發揮功能,以該結晶核為中心而促進PFA系聚合物之結晶化,容易形成PFA系聚合物之微小球晶。其結果為,積層體中之基材層與聚合物層之密接性容易進一步提高,其電特性及機械物性容易進一步提高。It is believed that when the liquid composition in the present method contains these components, when the polymer layer is formed by melt coating, these components function as crystal nuclei, promote the crystallization of the PFA-based polymer around the crystal nuclei, and easily form micro spherulites of the PFA-based polymer. As a result, the adhesion between the substrate layer and the polymer layer in the laminate is likely to be further improved, and its electrical characteristics and mechanical properties are likely to be further improved.
本法中之液狀組合物較佳為進而包含無機填料。於上述情形時,聚合物層容易電特性及低線膨脹性優異。又,乾燥覆膜、熔融覆膜及聚合物層容易導熱性優異,於形成聚合物層時,上述膜及層容易迅速且均勻地加熱冷卻,因此聚合物層容易表面平滑性及均一性優異。The liquid composition in this method preferably further contains an inorganic filler. In the above case, the polymer layer is easy to have excellent electrical properties and low linear expansion. In addition, the dry coating, melt coating and polymer layer are easy to have excellent thermal conductivity. When forming the polymer layer, the above film and layer are easy to be quickly and evenly heated and cooled, so the polymer layer is easy to have excellent surface smoothness and uniformity.
無機填料較佳為氮化物填料或無機氧化物填料,更佳為氮化硼填料、氧化鈹填料(鈹之氧化物之填料)、矽酸鹽填料(二氧化矽填料、矽灰石填料、滑石填料、塊滑石填料)或金屬氧化物(氧化鈰、氧化鋁、氧化鎂、氧化鋅、氧化鈦等)填料,進而較佳為二氧化矽填料、氮化硼填料及塊滑石填料。 氮化硼、二氧化矽及塊滑石與PFA系聚合物之相互作用容易亢進,包含其等之無機填料容易進一步提高液狀組合物之分散穩定性。又,於聚合物層中,容易顯著地表現氮化硼、二氧化矽或塊滑石之物性。The inorganic filler is preferably a nitride filler or an inorganic oxide filler, more preferably a boron nitride filler, a curium oxide filler (a filler of a curium oxide), a silicate filler (a silica filler, a wollastonite filler, a talc filler, or a metal oxide filler (aluminum oxide, magnesium oxide, zinc oxide, titanium oxide, etc.), and more preferably a silica filler, a boron nitride filler, and a talc filler. Boron nitride, silica, and talc tend to interact more strongly with PFA-based polymers, and inorganic fillers containing them tend to further improve the dispersion stability of the liquid composition. In addition, in the polymer layer, the physical properties of boron nitride, silica, or talc tend to be significantly manifested.
無機填料可為經燒結之無機填料。換言之,無機填料可為陶瓷。 無機填料之線膨脹係數之絕對值較佳為8 ppm/℃以下,更佳為5 ppm/℃以下。線膨脹係數之絕對值較佳為1 ppm/℃以上。於上述情形時,於形成聚合物層時容易控制聚合物層之尺寸,又,聚合物層容易低線膨脹性優異。The inorganic filler may be a sintered inorganic filler. In other words, the inorganic filler may be ceramic. The absolute value of the linear expansion coefficient of the inorganic filler is preferably 8 ppm/°C or less, and more preferably 5 ppm/°C or less. The absolute value of the linear expansion coefficient is preferably 1 ppm/°C or more. In the above case, it is easy to control the size of the polymer layer when forming the polymer layer, and the polymer layer is easy to have excellent low linear expansion.
無機填料較佳為使用矽烷偶合劑對其表面之至少一部分進行表面處理。 矽烷偶合劑較佳為3-胺基丙基三乙氧基矽烷、乙烯基三甲氧基矽烷、3-巰基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷或3-異氰酸基丙基三乙氧基矽烷。The inorganic filler is preferably surface treated with a silane coupling agent on at least a portion of its surface. The silane coupling agent is preferably 3-aminopropyltriethoxysilane, vinyltrimethoxysilane, 3-butylpropyltrimethoxysilane, 3-glycidyloxypropylmethyldiethoxysilane, 3-methacryloyloxypropyltriethoxysilane or 3-isocyanatopropyltriethoxysilane.
無機填料之平均粒徑較佳為20 μm以下,更佳為10 μm以下。平均粒徑較佳為0.1 μm以上,更佳為1 μm以上。 無機填料之形狀可為粒狀、針狀(纖維狀)、板狀之任一者,較佳為板狀。於無機填料之形狀為板狀之情形時,無機填料容易配向,乾燥覆膜、熔融覆膜及聚合物層之平面方向之導熱性容易提高。 其結果為,於形成聚合物層時,上述膜及層容易迅速且均勻地加熱冷卻,聚合物層容易表面平滑性及均一性優異。 作為無機填料之具體形狀,可列舉:球狀、鱗片狀、層狀、葉片狀、杏仁狀、柱狀、雞冠狀、等軸狀、葉狀、雲母狀、塊狀、平板狀、楔狀、玫瑰花狀、網狀、角柱狀。無機填料可為中空狀,亦可包含中空狀填料及非中空狀填料。The average particle size of the inorganic filler is preferably 20 μm or less, more preferably 10 μm or less. The average particle size is preferably 0.1 μm or more, more preferably 1 μm or more. The shape of the inorganic filler can be any of granular, needle-shaped (fibrous), and plate-shaped, preferably plate-shaped. When the shape of the inorganic filler is plate-shaped, the inorganic filler is easy to align, and the thermal conductivity of the dry coating, melt coating, and polymer layer in the plane direction is easy to improve. As a result, when forming the polymer layer, the above-mentioned film and layer are easy to heat and cool quickly and evenly, and the polymer layer is easy to have excellent surface smoothness and uniformity. Specific shapes of the inorganic filler include: spherical, scale-like, layer-like, leaf-like, almond-like, columnar, cockscomb-like, isometric, leaf-like, mica-like, block-like, flat-plate-like, wedge-like, rose-like, net-like, and angular column-like. The inorganic filler may be hollow, and may include hollow fillers and non-hollow fillers.
作為無機填料之具體例,可列舉:二氧化矽填料(Admatechs公司製造之「Admafine」、太平洋水泥公司製造之「E-SPHERES」系列、日鐵礦業公司製造之「SiliNax」系列、Emerson & Cuming公司製造之「Ecco sphere」系列、DENKA公司製造之「SFP」系列等)、利用二癸酸丙二醇酯等酯進行表面處理之氧化鋅(堺化學工業股份有限公司製造之「FINEX」系列等)、利用多元醇及無機物進行被覆處理之氧化鈦填料(石原產業公司製造之「Tipaque」系列等)、利用烷基矽烷進行表面處理之金紅石型二氧化鈦(帝國化工公司製造之「JMT」系列等)、滑石填料(NIPPON TALC公司製造之「SG」系列等)、塊滑石填料(NIPPON TALC公司製造之「BST」系列等)、氧化鎂填料(UBE MATERIALS公司製造之「Magnesia」系列等)、氮化硼填料(昭電工公司製造之「UHP」、「HGP」系列等)。Specific examples of inorganic fillers include: silica fillers (Admafine manufactured by Admatechs, E-SPHERES series manufactured by Pacific Cement, SiliNax series manufactured by Nippon Steel Mining, Ecco sphere series manufactured by Emerson & Cuming, SFP series manufactured by DENKA, etc.), zinc oxide surface-treated with esters such as propylene glycol dicaprate (FINEX series manufactured by Sakai Chemical Industry Co., Ltd., etc.), titanium oxide fillers coated with polyols and inorganic substances (Tipaque series manufactured by Ishihara Sangyo Co., Ltd., etc.), rutile titanium dioxide surface-treated with alkyl silane (JMT series manufactured by Teikoku Chemical Co., Ltd., etc.), talc fillers (NIPPON TALC's "SG" series, etc.), block talc filler (NIPPON TALC's "BST" series, etc.), magnesium oxide filler (UBE MATERIALS's "Magnesia" series, etc.), boron nitride filler (Akidenko's "UHP", "HGP" series, etc.).
於不損害本發明之效果之範圍內,本法中之液狀組合物可包含觸變性賦予劑、消泡劑、矽烷偶合劑、脫水劑、塑化劑、耐候劑、抗氧化劑、熱穩定劑、潤滑劑、抗靜電劑、增白劑、著色劑、導電劑、脫模劑、表面處理劑、黏度調節劑、阻燃劑。 液狀組合物於25℃下之黏度較佳為10000 mPa・s以下,更佳為10~1000 mPa・s。 液狀組合物之觸變比較佳為1~2.5,更佳為1.2~2。Within the scope that does not impair the effect of the present invention, the liquid composition in this method may contain a thixotropic agent, a defoaming agent, a silane coupling agent, a dehydrating agent, a plasticizer, a weathering agent, an antioxidant, a heat stabilizer, a lubricant, an antistatic agent, a whitening agent, a coloring agent, a conductive agent, a mold release agent, a surface treatment agent, a viscosity regulator, and a flame retardant. The viscosity of the liquid composition at 25°C is preferably less than 10000 mPa·s, and more preferably 10 to 1000 mPa·s. The thixotropic ratio of the liquid composition is preferably 1 to 2.5, and more preferably 1.2 to 2.
液狀組合物中之PFA系聚合物之比率較佳為5~60質量%,更佳為15~50質量%。於該範圍內,容易形成電特性及對基材層之密接性優異之聚合物層。 於液狀組合物包含液狀介質之情形時,液狀組合物中之液狀介質之比率較佳為40~95質量%,更佳為50~85質量%。 於液狀組合物包含聚合物結著劑之情形時,液狀組合物中之聚合物結著劑之比率較佳為0.01~1質量%。 於液狀組合物包含聚合物分散劑之情形時,液狀組合物中之分散劑之比率較佳為1~15質量%。於該情形時,容易進一步提高聚合物層中之PFA系聚合物本來之物性。 於液狀組合物包含無機填料之情形時,液狀組合物中之無機填料之比率較佳為1~50質量%,較佳為5~30質量%。於該情形時,容易形成電特性及低線膨脹性優異之聚合物層。The ratio of the PFA-based polymer in the liquid composition is preferably 5 to 60% by mass, more preferably 15 to 50% by mass. Within this range, it is easy to form a polymer layer with excellent electrical properties and adhesion to the substrate layer. When the liquid composition contains a liquid medium, the ratio of the liquid medium in the liquid composition is preferably 40 to 95% by mass, more preferably 50 to 85% by mass. When the liquid composition contains a polymer binder, the ratio of the polymer binder in the liquid composition is preferably 0.01 to 1% by mass. When the liquid composition contains a polymer dispersant, the ratio of the dispersant in the liquid composition is preferably 1 to 15% by mass. In this case, it is easy to further improve the original physical properties of the PFA-based polymer in the polymer layer. When the liquid composition contains an inorganic filler, the ratio of the inorganic filler in the liquid composition is preferably 1 to 50% by mass, more preferably 5 to 30% by mass. In this case, a polymer layer having excellent electrical properties and low linear expansion properties can be easily formed.
本法中之液狀組合物對基材層之表面之塗佈只要為於基材層之表面形成穩定之液狀覆膜的方法即可,可列舉:噴霧法、輥塗法、旋轉塗佈法、凹版塗佈法、微凹版塗佈法、凹版膠版法、刮塗法、接觸塗佈法、棒式塗佈法、模嘴塗佈法、噴注麥勒棒法、狹縫式模嘴塗佈法、缺角輪塗佈法。In the present method, the liquid composition is applied to the surface of the substrate layer by any method that forms a stable liquid coating on the surface of the substrate layer, and examples thereof include: spraying method, roller coating method, rotary coating method, gravure coating method, micro-gravure coating method, gravure offset coating method, doctor coating method, contact coating method, rod coating method, die nozzle coating method, injection merrer rod method, slot die nozzle coating method, and notch wheel coating method.
本法中之乾燥覆膜之形成係將基材層之表面之液狀組合物(液狀覆膜)乾燥而進行。 作為液狀覆膜之乾燥方法,可列舉:加熱乾燥、利用空氣(氣體)吹送進行之乾燥、自然乾燥等。其中,作為乾燥方法,由於可穩定地保持液狀覆膜之形狀,且於短時間使液狀覆膜乾燥,故而較佳為加熱乾燥。又,乾燥覆膜中亦可殘留可包含於液狀組合物中之液狀介質之一部分。 此時之加熱溫度(氛圍之溫度)以未達PFA系聚合物之熔融溫度,根據可包含於液狀組合物中之液狀介質之沸點等進行設定即可,較佳為90~250℃,更佳為100~200℃。又,加熱時間較佳為0.1~10分鐘,更佳為0.5~5分鐘。 再者,加熱乾燥中之加熱可以1階段實施,亦可以不同之溫度分2階段以上實施。The formation of the dry coating in this method is carried out by drying the liquid composition (liquid coating) on the surface of the substrate layer. As drying methods for the liquid coating, there can be listed: heating drying, drying by blowing air (gas), natural drying, etc. Among them, as a drying method, heating drying is preferred because it can stably maintain the shape of the liquid coating and dry the liquid coating in a short time. In addition, a part of the liquid medium that can be contained in the liquid composition may also remain in the dry coating. The heating temperature (temperature of the atmosphere) at this time can be set according to the boiling point of the liquid medium that can be contained in the liquid composition, etc., so as not to reach the melting temperature of the PFA-based polymer. It is preferably 90 to 250°C, and more preferably 100 to 200°C. In addition, the heating time is preferably 0.1 to 10 minutes, and more preferably 0.5 to 5 minutes. Furthermore, the heating in the heat drying can be implemented in one stage, or in two or more stages at different temperatures.
本法中之熔融覆膜之形成係對乾燥覆膜進行加熱,使乾燥覆膜中之PFA系聚合物熔融而進行。 此時之加熱溫度(氛圍之溫度)以PFA系聚合物之熔融溫度以上,根據PFA系聚合物之種類進行設定即可,較佳為300~400℃,更佳為320~390℃,進而較佳為340~380℃。 又,此時之加熱可以1階段實施,亦可以不同之溫度分2階段以上實施。The formation of the melt coating in this method is carried out by heating the dry coating to melt the PFA polymer in the dry coating. The heating temperature (atmosphere temperature) at this time is higher than the melting temperature of the PFA polymer and can be set according to the type of the PFA polymer. It is preferably 300-400°C, more preferably 320-390°C, and further preferably 340-380°C. In addition, the heating at this time can be implemented in one stage or in two or more stages at different temperatures.
將乾燥覆膜以所形成之聚合物層每1 μm厚度15秒以上之時間進行加熱。藉此,PFA系聚合物之粉末整體被充分加熱,於熔融覆膜中,PFA系聚合物高度流動。所形成之聚合物層每1 μm厚度之乾燥覆膜之加熱時間較佳為30秒分以上,更佳為45秒以上。就積層體之生產性之觀點而言,上述加熱時間較佳為100秒以下。 例如,於形成厚度為4 μm之聚合物層之情形時,上述加熱時間為60秒以上,較佳為120秒以上,更佳為180秒以上。The dry coating is heated for more than 15 seconds per 1 μm thickness of the formed polymer layer. In this way, the powder of the PFA-based polymer is fully heated as a whole, and the PFA-based polymer is highly fluid in the molten coating. The heating time of the dry coating for each 1 μm thickness of the formed polymer layer is preferably more than 30 seconds, and more preferably more than 45 seconds. From the perspective of productivity of the laminate, the above heating time is preferably less than 100 seconds. For example, when forming a polymer layer with a thickness of 4 μm, the above heating time is more than 60 seconds, preferably more than 120 seconds, and more preferably more than 180 seconds.
作為形成乾燥覆膜及熔融覆膜時之加熱方法,可列舉:使用通風乾燥爐之方法、使用紅外線等熱線照射爐之方法。 此時之加熱時之氛圍之狀態可為常壓下、減壓下之任一者。 此時之氛圍可為氧化性氣體(氧氣等)氛圍、還原性氣體(氫氣等)氛圍、惰性氣體(氦氣、氖氣、氬氣、氮氣等)氛圍之任一者,就抑制液狀組合物中所含之聚合物成分之變質、變差之觀點而言,較佳為包含80~100體積%惰性氣體之氛圍。就促進液狀組合物中所含之分散劑等成分之分解,使聚合物層之介電損耗正切降低之觀點而言,較佳為包含1~20體積%氧氣之氛圍。As heating methods for forming dry coatings and melt coatings, there are: methods using a ventilation drying furnace, methods using a heat irradiation furnace such as infrared rays. The state of the atmosphere during heating at this time can be either normal pressure or reduced pressure. The atmosphere at this time can be any of an oxidizing gas (oxygen, etc.) atmosphere, a reducing gas (hydrogen, etc.) atmosphere, and an inert gas (helium, neon, argon, nitrogen, etc.) atmosphere. From the perspective of suppressing the deterioration and degradation of the polymer component contained in the liquid composition, an atmosphere containing 80 to 100% by volume of an inert gas is preferred. From the viewpoint of promoting the decomposition of the dispersant and other components contained in the liquid composition and reducing the dielectric loss tangent of the polymer layer, an atmosphere containing 1 to 20 volume % of oxygen is preferred.
本法中之聚合物層之形成係將熔融覆膜冷卻,使熔融覆膜中之PFA系聚合物固化而進行。 此時之冷卻係將熔融覆膜於120秒以內急冷至PFA系聚合物之玻璃轉移點以下之特定溫度而進行。藉由該急冷,PFA系聚合物緻密地結晶化並固化,因此促進微小球晶之生成。又,於液狀組合物包含無機填料之情形時,藉由該急冷,熔融覆膜中之無機填料容易配向,聚合物層容易低線膨脹性優異。 使冷卻溫度達到上述特定溫度之時間較佳為100秒以內,更佳為60秒以內。再者,就提高積層體之生產性之觀點而言,上述時間之下限通常為10秒。 熔融覆膜之冷卻速度較佳為所形成之聚合物層每1 μm厚度0.25℃/秒以上,更佳為2.5℃/秒以上。再者,上述冷卻速度之上限通常為30℃/秒。The formation of the polymer layer in this method is carried out by cooling the molten film to solidify the PFA-based polymer in the molten film. The cooling at this time is carried out by rapidly cooling the molten film to a specific temperature below the glass transition point of the PFA-based polymer within 120 seconds. By this rapid cooling, the PFA-based polymer is densely crystallized and solidified, thereby promoting the formation of micro-spherulites. In addition, when the liquid composition contains an inorganic filler, by this rapid cooling, the inorganic filler in the molten film is easily oriented, and the polymer layer is easy to have excellent low linear expansion. The time for the cooling temperature to reach the above-mentioned specific temperature is preferably within 100 seconds, and more preferably within 60 seconds. Furthermore, from the perspective of improving the productivity of the laminate, the lower limit of the above-mentioned time is usually 10 seconds. The cooling rate of the melt coating is preferably 0.25°C/sec or more per 1 μm thickness of the formed polymer layer, more preferably 2.5°C/sec or more. The upper limit of the cooling rate is usually 30°C/sec.
上述冷卻不僅可藉由調整冷卻溫度(氛圍之溫度)進行調整,而且亦可藉由選擇具有充分高於PFA系聚合物之熱導率的基材層、或充分薄於基材層之聚合物層進行調整。 具體而言,基材層之熱導率相對於PFA系聚合物之熱導率之比較佳為1000以上,更佳為1250~3000。基材層之熱導率之具體值較佳為200 W/m・K以上,更佳為250~600 W/m・K。作為上述基材層,可列舉金屬基板,較佳可列舉金屬箔。The above cooling can be adjusted not only by adjusting the cooling temperature (temperature of the atmosphere), but also by selecting a substrate layer having a thermal conductivity sufficiently higher than that of the PFA-based polymer, or a polymer layer sufficiently thinner than the substrate layer. Specifically, the thermal conductivity of the substrate layer relative to the thermal conductivity of the PFA-based polymer is preferably 1000 or more, more preferably 1250 to 3000. The specific value of the thermal conductivity of the substrate layer is preferably 200 W/m・K or more, more preferably 250 to 600 W/m・K. As the above substrate layer, a metal substrate can be listed, and a metal foil can be listed preferably.
上述冷卻溫度根據PFA系聚合物之玻璃轉移點進行設定即可,較佳為0~70℃,更佳為10~40℃。又,維持上述冷卻溫度之時間較佳為1~30分鐘,更佳為3~15分鐘。 進而,形成熔融覆膜時之加熱溫度與形成聚合物層時之冷卻溫度之差較佳為所形成之聚合物層每1 μm厚度75℃以上,更佳為100℃以上。於該情形時,PFA系聚合物之結晶化急遽地進行,容易促進微小球晶之生成,聚合物層之物性容易進一步提高。The above cooling temperature can be set according to the glass transition point of the PFA polymer, preferably 0 to 70°C, more preferably 10 to 40°C. In addition, the time for maintaining the above cooling temperature is preferably 1 to 30 minutes, more preferably 3 to 15 minutes. Furthermore, the difference between the heating temperature when forming the molten coating and the cooling temperature when forming the polymer layer is preferably 75°C or more per 1 μm thickness of the formed polymer layer, more preferably 100°C or more. In this case, the crystallization of the PFA polymer proceeds rapidly, which easily promotes the formation of microspherulites, and the physical properties of the polymer layer are easily further improved.
聚合物層之厚度較佳為小於基材層之厚度。 基材層之厚度相對於聚合物層之厚度之比較佳為1.5以上,更佳為2以上。上述比較佳為100以下,更佳為10以下。 聚合物層之厚度較佳為0.1~20 μm,更佳為0.5~10 μm,進而較佳為1~5 μm。 作為本法中之聚合物層之厚度及基材層之厚度之適宜態樣,可列舉前者為1~5 μm且後者為6~25 μm之態樣。The thickness of the polymer layer is preferably less than the thickness of the substrate layer. The ratio of the thickness of the substrate layer to the thickness of the polymer layer is preferably 1.5 or more, more preferably 2 or more. The above ratio is preferably 100 or less, more preferably 10 or less. The thickness of the polymer layer is preferably 0.1 to 20 μm, more preferably 0.5 to 10 μm, and further preferably 1 to 5 μm. As suitable aspects of the thickness of the polymer layer and the thickness of the substrate layer in this method, the former is 1 to 5 μm and the latter is 6 to 25 μm.
本法中之基材層較佳為金屬箔或耐熱性樹脂膜。 金屬箔之表面之十點平均粗糙度較佳為0.5 μm以下,更佳為未達0.1 μm。金屬箔之表面之十點平均粗糙度較佳為0.01 μm以上。於該情形時,表面平滑性較高之聚合物層與金屬箔均進一步高度地密接。 因此,於積層體(附聚合物層之金屬箔)或將其加工所得之印刷基板中,介電損耗正切(Df)更顯著地降低。具體而言,於本法中之基材層為金屬箔之情形時,積層體之頻率10 GHz下之介電損耗正切較佳為0.0020以下,更佳為0.0015以下。上述介電損耗正切較佳為0.0001以上。 作為金屬箔之材質,可列舉:銅、銅合金、不鏽鋼、鎳、鎳合金(亦包括42合金)、鋁、鋁合金、鈦、鈦合金等。 金屬箔較佳為壓延銅箔或電解銅箔。The substrate layer in this method is preferably a metal foil or a heat-resistant resin film. The ten-point average roughness of the surface of the metal foil is preferably less than 0.5 μm, and more preferably less than 0.1 μm. The ten-point average roughness of the surface of the metal foil is preferably more than 0.01 μm. In this case, the polymer layer with higher surface smoothness and the metal foil are further highly bonded. Therefore, in the laminate (metal foil with polymer layer) or the printed circuit board processed therefrom, the dielectric loss tangent (Df) is more significantly reduced. Specifically, in the case where the substrate layer in this method is a metal foil, the dielectric loss tangent of the laminate at a frequency of 10 GHz is preferably less than 0.0020, and more preferably less than 0.0015. The dielectric loss tangent is preferably greater than 0.0001. The material of the metal foil includes: copper, copper alloy, stainless steel, nickel, nickel alloy (including 42 alloy), aluminum, aluminum alloy, titanium, titanium alloy, etc. The metal foil is preferably a rolled copper foil or an electrolytic copper foil.
金屬箔之表面可進行防銹處理(形成鉻酸鹽等氧化物皮膜等)。又,金屬箔之表面亦可藉由矽烷偶合劑進行處理。此時之處理範圍可為金屬箔之表面之一部分,亦可為表面之全部。 金屬箔之厚度較佳為0.1~20 μm,更佳為0.5~10 μm。The surface of the metal foil can be treated with an anti-rust treatment (forming an oxide film such as chromate). In addition, the surface of the metal foil can also be treated with a silane coupling agent. The treatment range at this time can be a part of the surface of the metal foil or the entire surface. The thickness of the metal foil is preferably 0.1 to 20 μm, and more preferably 0.5 to 10 μm.
又,亦可使用包含2層以上金屬箔之附載體金屬箔作為金屬箔。作為附載體金屬箔,可列舉包含載體銅箔(厚度:10~35 μm)、及介隔剝離層積層於載體銅箔上之極薄銅箔(厚度:2~5 μm)的附載體銅箔。若使用上述附載體銅箔,則能夠藉由MSAP(Modified Semi-Additive,改良型半加成)製程形成精細圖案。作為上述剝離層,較佳為包含鎳或鉻之金屬層、或將該金屬層積層而成之多層金屬層。 作為附載體金屬箔之具體例,可列舉福田金屬箔粉工業股份有限公司製造之商品名「FUTF-5DAF-2」。In addition, a carrier metal foil including two or more layers of metal foil can also be used as the metal foil. As the carrier metal foil, there can be cited a carrier copper foil including a carrier copper foil (thickness: 10-35 μm) and an extremely thin copper foil (thickness: 2-5 μm) laminated on the carrier copper foil with an intermediate release layer. If the above-mentioned carrier copper foil is used, a fine pattern can be formed by the MSAP (Modified Semi-Additive) process. As the above-mentioned release layer, it is preferably a metal layer including nickel or chromium, or a multi-layer metal layer formed by laminating the metal layer. As a specific example of the carrier metal foil, the product name "FUTF-5DAF-2" manufactured by Futian Metal Foil Powder Industry Co., Ltd. can be cited.
耐熱性樹脂膜為包含1種以上耐熱性樹脂之膜,可為單層膜,亦可為多層膜。耐熱性樹脂膜中可埋設玻璃纖維或碳纖維等。 作為耐熱性樹脂,可列舉:聚醯亞胺、聚芳酯、聚碸、聚芳碸、芳香族聚醯胺、芳香族聚醚醯胺、聚苯硫醚、聚芳醚酮、聚醯胺醯亞胺、液晶性聚酯、液晶性聚酯醯胺,較佳為聚醯亞胺。 於基材層為耐熱性樹脂膜之情形時,較佳為於基材層之兩面形成聚合物層。於該情形時,由於表面平滑性較高之聚合物層形成於耐熱性樹脂膜之兩面,故而積層體之線膨脹係數容易顯著降低。又,積層體不易產生翹曲,因此其加工時之操作性優異。The heat-resistant resin film is a film containing one or more heat-resistant resins, and may be a single-layer film or a multi-layer film. Glass fibers or carbon fibers may be embedded in the heat-resistant resin film. Examples of heat-resistant resins include polyimide, polyarylate, polysulfone, polyarylsulfone, aromatic polyamide, aromatic polyetheramide, polyphenylene sulfide, polyaryletherketone, polyamide imide, liquid crystalline polyester, and liquid crystalline polyesteramide, preferably polyimide. In the case where the substrate layer is a heat-resistant resin film, it is preferred to form polymer layers on both sides of the substrate layer. In this case, since the polymer layers with high surface smoothness are formed on both sides of the heat-resistant resin film, the linear expansion coefficient of the laminate is likely to be significantly reduced. In addition, the laminate is not prone to warping, so its workability during processing is excellent.
於本法中,若於基材層之兩面賦予(塗佈)本組合物,則獲得具有基材層、及形成於基材層之兩表面之聚合物層的積層體。作為上述積層體之具體例,可列舉聚醯亞胺膜與於該聚醯亞胺膜之兩表面具有聚合物層之多層膜。 上述積層體之電特性、耐回流焊性等耐熱性、耐化學品性、表面平滑性等各物性優異,適宜作為印刷基板材料等。 上述積層體之線膨脹係數之絕對值較佳為50 ppm/℃以下,更佳為25 ppm/℃以下。線膨脹係數之絕對值較佳為1 ppm/℃以下。In this method, if the composition is applied (coated) on both sides of a substrate layer, a laminate having a substrate layer and polymer layers formed on both surfaces of the substrate layer is obtained. As specific examples of the above-mentioned laminate, a polyimide film and a multilayer film having polymer layers on both surfaces of the polyimide film can be cited. The above-mentioned laminate has excellent electrical properties, heat resistance such as reflow resistance, chemical resistance, surface smoothness and other physical properties, and is suitable as a printed circuit board material, etc. The absolute value of the linear expansion coefficient of the above-mentioned laminate is preferably 50 ppm/℃ or less, and more preferably 25 ppm/℃ or less. The absolute value of the linear expansion coefficient is preferably 1 ppm/℃ or less.
作為本發明之積層體,可列舉具有形成於基材層之至少一表面,且包含PFA系聚合物之聚合物層的積層體,且上述聚合物層包含PFA系聚合物之球晶,上述球晶之半徑為5 μm以下。 本發明之積層體可藉由本法進行製造。本發明之積層體之各構成包括其適宜態樣在內,與本法中之構成相同。As the laminate of the present invention, there can be cited a laminate having a polymer layer formed on at least one surface of a substrate layer and comprising a PFA-based polymer, wherein the polymer layer comprises spherulites of the PFA-based polymer, and the radius of the spherulites is 5 μm or less. The laminate of the present invention can be manufactured by this method. The various structures of the laminate of the present invention, including their appropriate forms, are the same as the structures in this method.
為了進一步提高本發明之積層體之聚合物層之低線膨脹性或接著性,其最表面亦可進一步進行表面處理。 作為表面處理之方法,可列舉:退火處理、電暈處理、電漿處理、臭氧處理、準分子處理、矽烷偶合處理。 退火處理之條件較佳為將溫度設為120~180℃,將壓力設為0.005~0.015 MPa,將時間設為30~120分鐘。 作為電漿處理中使用之氣體,可列舉:氧氣、氮氣、稀有氣體(氬氣等)、氫氣、氨氣、乙酸乙烯酯。該等氣體可單獨使用1種,亦可併用2種以上製成混合氣體。In order to further improve the low linear expansion or adhesion of the polymer layer of the laminate of the present invention, the outermost surface can also be further surface treated. As the surface treatment method, it can be listed: annealing treatment, corona treatment, plasma treatment, ozone treatment, excimer treatment, silane coupling treatment. The conditions for annealing treatment are preferably set to 120-180°C, the pressure to 0.005-0.015 MPa, and the time to 30-120 minutes. As the gas used in the plasma treatment, it can be listed: oxygen, nitrogen, rare gas (argon, etc.), hydrogen, ammonia, vinyl acetate. These gases can be used alone or in combination to make a mixed gas.
亦可於本發明之積層體之聚合物層之最表面進一步積層其他基板。 作為其他基板,可列舉:耐熱性樹脂膜、作為纖維強化樹脂板之前驅物之預浸體、具有耐熱性樹脂膜層之積層體、具有預浸體層之積層體。 再者,預浸體係強化纖維(玻璃纖維、碳纖維等)基材(絲束、織布等)中含浸熱硬化性樹脂或熱塑性樹脂而成之片狀基板。 作為耐熱性樹脂膜,可列舉上述耐熱性樹脂膜。Other substrates may be further laminated on the outermost surface of the polymer layer of the laminate of the present invention. As other substrates, heat-resistant resin films, prepregs as precursors of fiber-reinforced resin sheets, laminates having heat-resistant resin film layers, and laminates having prepreg layers may be cited. Furthermore, the prepreg is a sheet-like substrate in which a thermosetting resin or a thermoplastic resin is impregnated in a reinforcing fiber (glass fiber, carbon fiber, etc.) base material (tow, woven fabric, etc.). As heat-resistant resin films, the above-mentioned heat-resistant resin films may be cited.
作為積層之方法,可列舉將積層體與其他基板進行熱壓之方法。 於其他基板為預浸體之情形時,熱壓條件較佳為將溫度設為120~300℃,將氛圍之壓力設為20 kPa以下之減壓(真空),將加壓壓力設為0.2~10 MPa。於其他基板為耐熱性樹脂膜之情形時,熱壓條件較佳為將其中之溫度設為310~400℃。 本發明之積層體具有電特性優異之聚合物層,因此適宜作為印刷基板材料。具體而言,本發明之積層體可作為軟性金屬箔積層板或剛性金屬箔積層板而用於印刷基板之製造,尤其可適宜地作為軟性金屬箔積層板而用於軟性印刷基板之製造。As a lamination method, a method of hot pressing the laminate and other substrates can be cited. When the other substrate is a prepreg, the hot pressing conditions are preferably set to a temperature of 120 to 300°C, a pressure of the atmosphere of 20 kPa or less under reduced pressure (vacuum), and a pressurized pressure of 0.2 to 10 MPa. When the other substrate is a heat-resistant resin film, the hot pressing conditions are preferably set to a temperature of 310 to 400°C. The laminate of the present invention has a polymer layer with excellent electrical properties, and is therefore suitable as a printed substrate material. Specifically, the laminate of the present invention can be used as a flexible metal foil laminate or a rigid metal foil laminate for the manufacture of printed circuit boards, and can be particularly suitably used as a flexible metal foil laminate for the manufacture of flexible printed circuit boards.
對基材層為金屬箔之積層體(附聚合物層之金屬箔)之金屬箔進行蝕刻加工,形成傳輸電路而獲得印刷基板。具體而言,可藉由對金屬箔進行蝕刻處理而加工成特定傳輸電路之方法,製造印刷基板。 由附聚合物層之金屬箔製造之印刷基板依序具有由金屬箔形成之傳輸電路及聚合物層。作為印刷基板之構成之具體例,可列舉傳輸電路/聚合物層/預浸體層、傳輸電路/聚合物層/預浸體層/聚合物層/傳輸電路、傳輸電路/聚合物層/聚醯亞胺層、傳輸電路/聚合物層/聚醯亞胺層/聚合物層/傳輸電路。 於上述印刷基板之製造中,可於傳輸電路上形成層間絕緣膜,亦可於傳輸電路上積層阻焊劑,亦可於傳輸電路上積層覆蓋層膜。作為該等層間絕緣膜、阻焊劑及覆蓋層膜之材料,可使用上述液狀組合物。A printed circuit board is obtained by etching a metal foil whose base layer is a laminate of metal foil (metal foil with a polymer layer) to form a transmission circuit. Specifically, a printed circuit board can be manufactured by a method of etching a metal foil to form a specific transmission circuit. A printed circuit board manufactured from a metal foil with a polymer layer has a transmission circuit and a polymer layer formed of metal foil in this order. Specific examples of the structure of the printed circuit board include transmission circuit/polymer layer/prepreg layer, transmission circuit/polymer layer/prepreg layer/polymer layer/transmission circuit, transmission circuit/polymer layer/polyimide layer, and transmission circuit/polymer layer/polyimide layer/polymer layer/transmission circuit. In the manufacture of the printed circuit board, an interlayer insulating film may be formed on the transmission circuit, a solder resist may be laminated on the transmission circuit, or a cover film may be laminated on the transmission circuit. As the material of the interlayer insulating film, the solder resist, and the cover film, the liquid composition may be used.
作為印刷基板之具體態樣,可列舉將印刷基板多層化而成之多層印刷電路基板。 作為多層印刷電路基板之適宜態樣,可列舉具有一個以上如下構成之態樣:多層印刷電路基板之最外層為聚合物層,依序積層金屬箔或傳輸電路、聚合物層及預浸體層或聚醯亞胺層而成。再者,上述構成之數量較佳為複數個(兩個以上)。又,於聚合物層及預浸體層或聚醯亞胺層之間亦可進一步配置傳輸電路。 上述態樣之多層印刷電路基板藉由最外層之聚合物層,而耐熱加工性尤其優異。具體而言,即便於288℃下,亦不易產生聚合物層與預浸體層或聚醯亞胺層之界面鼓出、或金屬箔(傳輸電路)與聚合物層之界面剝離。尤其是即便於金屬箔形成傳輸電路之情形時,聚合物層與金屬箔(傳輸電路)亦牢固地密接,因此不易產生翹曲,耐熱加工性優異。As a specific aspect of the printed circuit board, a multilayer printed circuit board formed by multi-layering the printed circuit board can be cited. As a suitable aspect of the multilayer printed circuit board, an aspect having one or more of the following structures can be cited: the outermost layer of the multilayer printed circuit board is a polymer layer, and a metal foil or a transmission circuit, a polymer layer and a prepreg layer or a polyimide layer are stacked in sequence. Furthermore, the number of the above structures is preferably plural (two or more). Moreover, a transmission circuit can be further arranged between the polymer layer and the prepreg layer or the polyimide layer. The multilayer printed circuit board of the above aspect has particularly excellent heat resistance and processability due to the outermost polymer layer. Specifically, even at 288°C, the interface between the polymer layer and the prepreg layer or the polyimide layer is not easily bulged, or the interface between the metal foil (transmission circuit) and the polymer layer is not easily peeled off. In particular, even when the metal foil forms the transmission circuit, the polymer layer and the metal foil (transmission circuit) are firmly bonded, so it is not easy to warp, and the heat-resistant processability is excellent.
作為多層印刷電路基板之適宜態樣,亦可列舉具有一個以上如下構成之態樣:多層印刷電路基板之最外層為預浸體層,依序積層金屬箔或傳輸電路、聚合物層及預浸體層而成。再者,上述構成之數量較佳為複數個(兩個以上)。又,於聚合物層與預浸體層之間亦可進一步配置傳輸電路。 上述態樣之多層印刷電路基板即便於最外層具有預浸體層,耐熱加工性亦優異。具體而言,即便於300℃下,亦不易產生聚合物層與預浸體層之界面鼓出或金屬箔(傳輸電路)與聚合物層之界面剝離。尤其是即便於金屬箔形成傳輸電路之情形時,聚合物層與金屬箔(傳輸電路)亦牢固地密接,因此不易產生翹曲,耐熱加工性優異。 即,根據本發明,容易獲得一種具有各種構成之印刷基板,該印刷基板即便不實施各種表面處理,各界面亦牢固地密接,加熱下之界面鼓出或界面剝離、尤其是最外層之鼓出或剝離之產生亦得到抑制。As a suitable embodiment of a multi-layer printed circuit substrate, an embodiment having one or more of the following structures can also be cited: the outermost layer of the multi-layer printed circuit substrate is a prepreg layer, and a metal foil or a transmission circuit, a polymer layer, and a prepreg layer are stacked in sequence. Furthermore, the number of the above structures is preferably plural (two or more). In addition, a transmission circuit can be further arranged between the polymer layer and the prepreg layer. The multi-layer printed circuit substrate of the above embodiment has excellent heat resistance and processability even if the outermost layer has a prepreg layer. Specifically, even at 300°C, it is not easy to produce bulging at the interface between the polymer layer and the prepreg layer or peeling at the interface between the metal foil (transmission circuit) and the polymer layer. In particular, even when the metal foil forms a transmission circuit, the polymer layer and the metal foil (transmission circuit) are firmly bonded, so warping is not easy to occur, and heat-resistant processing is excellent. That is, according to the present invention, it is easy to obtain a printed circuit board with various structures, and even if the printed circuit board is not subjected to various surface treatments, each interface is firmly bonded, and interface bulging or interface peeling under heating, especially bulging or peeling of the outermost layer, is suppressed.
以上,對本發明之積層體之製造方法及積層體進行了說明,但本發明並不限定於上述實施形態之構成。 例如,本發明之積層體於上述實施形態之構成中可藉由追加而具有其他任意構成,亦可與產生相同作用之任意構成進行置換。 又,本發明之積層體之製造方法於上述實施形態之構成中可藉由追加而具有其他任意步驟,亦可與產生相同作用之任意步驟進行置換。 實施例The above describes the manufacturing method of the laminate and the laminate of the present invention, but the present invention is not limited to the above-mentioned embodiment. For example, the laminate of the present invention can have any other structure by adding to the above-mentioned embodiment, and can also be replaced with any structure that produces the same effect. Furthermore, the manufacturing method of the laminate of the present invention can have any other steps by adding to the above-mentioned embodiment, and can also be replaced with any steps that produce the same effect. Embodiment
以下,列舉實施例具體地說明本發明,但本發明並不限定於該等。 1.各成分之準備 [PFA系聚合物] 聚合物1:含有98.0莫耳%之TFE單元、0.1莫耳%之NAH單元及1.9莫耳%之PPVE單元,且具有極性官能基之聚合物(熔融溫度:300℃,玻璃轉移點:95℃) 聚合物2:含有97.5莫耳%之TFE單元及2.5莫耳%之PPVE單元,且不具有極性官能基之聚合物(熔融溫度:305℃,玻璃轉移點:85℃) 聚合物3:含有98.7莫耳%之TFE單元及1.3莫耳%之PPVE單元,且不具有極性官能基之聚合物(熔融溫度:305℃,玻璃轉移點:90℃) 聚合物4:含有85.0莫耳%之TFE單元及15.0莫耳%之PMVE單元,且不具有極性官能基之聚合物(熔融溫度:285℃,玻璃轉移點:85℃)The present invention is specifically described below by way of examples, but the present invention is not limited thereto. 1. Preparation of each component [PFA-based polymer] Polymer 1: A polymer containing 98.0 mol% of TFE units, 0.1 mol% of NAH units, and 1.9 mol% of PPVE units, and having polar functional groups (melting temperature: 300°C, glass transition point: 95°C) Polymer 2: A polymer containing 97.5 mol% of TFE units and 2.5 mol% of PPVE units, and having no polar functional groups (melting temperature: 305℃, glass transition point: 85℃) Polymer 3: A polymer containing 98.7 mol% TFE units and 1.3 mol% PPVE units, and no polar functional groups (melting temperature: 305℃, glass transition point: 90℃) Polymer 4: A polymer containing 85.0 mol% TFE units and 15.0 mol% PMVE units, and no polar functional groups (melting temperature: 285℃, glass transition point: 85℃)
[粉末] 粉末1:包含聚合物1之粉末(D50:1.7 μm) 粉末2:包含聚合物2之粉末(D50:3.2 μm) 粉末3:包含80質量份之聚合物3及20質量份之聚合物4的粉末(D50:2.7 μm) 粉末4:包含聚合物3之粉末(D50:2.4 μm) [填料] 填料1:板狀氮化硼填料(D50:7.0 μm)[Powder] Powder 1: Powder containing polymer 1 (D50: 1.7 μm) Powder 2: Powder containing polymer 2 (D50: 3.2 μm) Powder 3: Powder containing 80 parts by mass of polymer 3 and 20 parts by mass of polymer 4 (D50: 2.7 μm) Powder 4: Powder containing polymer 3 (D50: 2.4 μm) [Filler] Filler 1: Plate-shaped boron nitride filler (D50: 7.0 μm)
[溶劑] NMP:N-甲基-2-吡咯啶酮 [分散劑] 分散劑1:側鏈分別具有全氟烯基與聚氧伸乙基及醇性羥基之非離子性(甲基)丙烯酸酯系聚合物(NEOS公司製造之「FTERGENT 710FL」) [金屬箔] 銅箔1:低粗化電解銅箔(厚度:12 μm,表面之十點平均粗糙度:0.08 μm) [耐熱性樹脂膜] 膜1:芳香族聚醯亞胺膜(厚度:25 μm,東麗杜邦公司製造之「Kapton EN」)[Solvent] NMP: N-methyl-2-pyrrolidone [Dispersant] Dispersant 1: Non-ionic (meth)acrylate polymer having perfluoroolefin and polyoxyethylene groups and alcoholic hydroxyl groups in the side chains ("FTERGENT 710FL" manufactured by NEOS) [Metal foil] Copper foil 1: Low-roughening electrolytic copper foil (thickness: 12 μm, ten-point average roughness of the surface: 0.08 μm) [Heat-resistant resin film] Film 1: Aromatic polyimide film (thickness: 25 μm, "Kapton EN" manufactured by DuPont Toray)
1.液狀組合物之製造 (液狀組合物1) 於容器中放入NMP(67質量份)及分散劑1(3質量份)製成溶液後,放入粉末1(30質量份)。其後,投入氧化鋯球,以150 rpm使容器滾動1小時,製造分散有粉末1之液狀組合物1。 再者,液狀組合物1於25℃下之黏度為25 mPa・s,即便於25℃下靜置亦不產生明顯之沈澱物,分散性優異。 (液狀組合物2~4) 使用粉末2代替液狀組合物1中之粉末1製造液狀組合物2,使用粉末3代替液狀組合物1中之粉末1製造液狀組合物3,使用粉末4代替液狀組合物1中之粉末1製造液狀組合物4。1. Preparation of liquid composition (Liquid composition 1) After NMP (67 parts by mass) and dispersant 1 (3 parts by mass) were placed in a container to prepare a solution, powder 1 (30 parts by mass) was placed. Thereafter, a zirconia ball was added, and the container was rolled at 150 rpm for 1 hour to prepare liquid composition 1 in which powder 1 was dispersed. In addition, the viscosity of liquid composition 1 at 25°C was 25 mPa・s, and no obvious precipitate was produced even when left at 25°C, indicating excellent dispersibility. (Liquid compositions 2-4) Liquid composition 2 was prepared by replacing powder 1 in liquid composition 1 with powder 2, liquid composition 3 was prepared by replacing powder 1 in liquid composition 1 with powder 3, and liquid composition 4 was prepared by replacing powder 1 in liquid composition 1 with powder 4.
(液狀組合物5) 首先,於容器中投入粉末3(30質量份)、分散劑1(2質量份)及NMP(45質量份),並投入氧化鋯球。其後,以150 rpm使容器滾動1小時,製備組合物。於另一容器中投入填料1(10質量份)、分散劑1(1質量份)及NMP(12質量份),並投入氧化鋯球。其後,以150 rpm使容器滾動1小時,製備組合物。 於進而另一容器中投入兩者之組合物,並投入氧化鋯球。其後,以150 rpm使容器滾動1小時,製造分散有粉末2及填料1之液狀組合物5。 再者,液狀組合物5於25℃下之黏度為25 mPa・s,即便於25℃下靜置,亦不產生明顯之沈澱物,分散性優異。(Liquid composition 5) First, powder 3 (30 parts by mass), dispersant 1 (2 parts by mass), and NMP (45 parts by mass) were added to a container, and zirconia balls were added. Then, the container was rolled at 150 rpm for 1 hour to prepare a composition. Filler 1 (10 parts by mass), dispersant 1 (1 part by mass), and NMP (12 parts by mass) were added to another container, and zirconia balls were added. Then, the container was rolled at 150 rpm for 1 hour to prepare a composition. The combination of the two was added to another container, and zirconia balls were added. Then, the container was rolled at 150 rpm for 1 hour to prepare a liquid composition 5 in which powder 2 and filler 1 were dispersed. Furthermore, the viscosity of the liquid composition 5 at 25°C was 25 mPa·s. Even when left at 25°C, no obvious precipitate was generated, indicating excellent dispersibility.
2.附聚合物層之銅箔之製造 藉由小徑反向凹版法,利用輥對輥於銅箔1之表面塗敷液狀組合物1,形成液狀覆膜。其次,使該銅箔通過乾燥爐,於150℃下加熱300秒形成乾燥覆膜。其後,於氮氣氛圍下之遠紅外線烘箱中,於380℃之氛圍下將乾燥覆膜加熱600秒使其熔融。其次,於20℃之氛圍下將熔融覆膜冷卻,製造銅箔1之表面形成有聚合物層(厚度:4 μm)之附聚合物層之銅箔1。乾燥覆膜之加熱時間為聚合物層每1 μm厚度150秒,將熔融覆膜於25秒內冷卻至95℃(聚合物1之玻璃轉移點)。其冷卻速度為對於聚合物層每1 μm厚度為2.9℃/秒。2. Production of copper foil with polymer layer The liquid composition 1 is applied to the surface of the copper foil 1 by roller-to-roll method using a small-diameter reverse gravure method to form a liquid coating. Next, the copper foil is passed through a drying furnace and heated at 150°C for 300 seconds to form a dry coating. Thereafter, the dry coating is heated at 380°C for 600 seconds in a far-infrared oven under a nitrogen atmosphere to melt it. Next, the molten coating is cooled at 20°C to produce a copper foil 1 with a polymer layer (thickness: 4 μm) formed on the surface of the copper foil 1. The heating time of the dry coating is 150 seconds per 1 μm thickness of the polymer layer, and the molten coating is cooled to 95°C (glass transition point of polymer 1) within 25 seconds. The cooling rate is 2.9°C/sec per 1 μm thickness of the polymer layer.
分別使用液狀組合物2~5代替液狀組合物1,除此以外,以與附聚合物層之銅箔1同樣之方式製造附聚合物層之銅箔2~5。於任一附聚合物層之銅箔之製造中,乾燥覆膜之加熱時間均為對於聚合物層每1 μm厚度為150秒,將熔融覆膜冷卻至PFA系聚合物之玻璃轉移點之時間均為25~60秒。 (附聚合物層之銅箔6(比較例)) 將乾燥覆膜之加熱時間設為40秒,將乾燥覆膜之加熱時間設為對於聚合物層每1 μm厚度為10秒,除此以外,以與附聚合物層之銅箔4同樣之方式製造附聚合物層之銅箔6。 (附聚合物層之銅箔7(比較例)) 依序於200℃之氛圍、20℃之氛圍下進行熔融覆膜之冷卻,將熔融覆膜冷卻至90℃(聚合物3之玻璃轉移點)之時間超過120秒,除此以外,以與附聚合物層之銅箔4同樣之方式製造附聚合物層之銅箔7。Copper foils with polymer layer 2 to 5 were manufactured in the same manner as copper foil with polymer layer 1 except that liquid compositions 2 to 5 were used instead of liquid composition 1. In the manufacture of any copper foil with polymer layer, the heating time of the dry coating was 150 seconds per 1 μm thickness of the polymer layer, and the time for cooling the molten coating to the glass transition point of the PFA-based polymer was 25 to 60 seconds. (Copper foil with polymer layer 6 (comparative example)) Copper foil with polymer layer 6 was manufactured in the same manner as copper foil with polymer layer 4 except that the heating time of the dry coating was set to 40 seconds and the heating time of the dry coating was set to 10 seconds per 1 μm thickness of the polymer layer. (Copper foil with polymer layer 7 (comparative example)) Copper foil with polymer layer 7 was manufactured in the same manner as copper foil with polymer layer 4 except that the molten film was cooled in an atmosphere of 200°C and an atmosphere of 20°C, and the time for cooling the molten film to 90°C (glass transition point of polymer 3) was more than 120 seconds.
3.附聚合物層之銅箔之測定及評估 <球晶半徑之測定> 於各附聚合物層之銅箔中,利用酸水溶液溶解銅箔,獲得聚合物層。 關於所獲得之聚合物層之銅箔側之面,使用利用小角光散射之高分子相結構分析系統(大塚化學公司製造之「PP-1000」),求出散射向量q(μm-1 )與散射強度(Is)之關聯,測定其球晶半徑。 若將散射強度最高之散射向量設為qmax,則表示為qmax=(4πn/λ0 )×sin(θmax/2)[此處,λ0 為真空中之光之波長,n為介質之折射率,θmax為散射強度為峰值位置處之散射角度],推導出球晶半徑R(μm)=4.09/qmax。3. Measurement and evaluation of copper foil with polymer layer <Measurement of spherulite radius> In each copper foil with polymer layer, the copper foil was dissolved with an acid aqueous solution to obtain the polymer layer. The spherulite radius was measured by using a polymer phase structure analysis system using small-angle light scattering ("PP-1000" manufactured by Otsuka Chemical Co., Ltd.) to obtain the correlation between the scattering vector q (μm -1 ) and the scattering intensity (Is) on the copper foil side of the obtained polymer layer. If the scattering vector with the highest scattering intensity is set to qmax, it is expressed as qmax = (4πn/λ 0 ) × sin(θmax/2) [here, λ 0 is the wavelength of light in a vacuum, n is the refractive index of the medium, and θmax is the scattering angle at the peak position of the scattering intensity], and the spherulite radius R (μm) = 4.09/qmax is derived.
<密接性> 利用SEM(Scanning electron microscope,掃描式電子顯微鏡)觀察各附聚合物層之銅箔之剖面,根據以下基準評估銅箔與聚合物層之界面之狀態。 A:界面整個面緻密地密接。 B:界面整個面密接,但有存在空隙之部分。 C:界面整個面存在空隙。<Adhesion> The cross-section of each copper foil with a polymer layer was observed using a SEM (Scanning electron microscope), and the state of the interface between the copper foil and the polymer layer was evaluated based on the following criteria. A: The entire interface is tightly bonded. B: The entire interface is tightly bonded, but there are gaps. C: There are gaps on the entire interface.
<剝離強度> 自各附聚合物層之銅箔切下矩形狀(長:100 mm,寬:10 mm)試片。然後,將距離試片之長度方向之一端50 mm之位置固定,以拉伸速度50 mm/min自長度方向之一端起對試片以90°剝離銅箔及聚合物層。測定此時之最大負載作為剝離強度(N/cm),根據以下之基準進行評估。 A:剝離強度為12 N/cm以上。 B:剝離強度為8 N/cm以上且未達12 N/cm。 C:剝離強度未達8 N/cm。<Peel strength> A rectangular specimen (length: 100 mm, width: 10 mm) was cut from each copper foil with a polymer layer. Then, the specimen was fixed at a position 50 mm away from one end in the longitudinal direction, and the copper foil and polymer layer were peeled off from one end in the longitudinal direction at a tensile speed of 50 mm/min at 90°. The maximum load at this time was measured as the peel strength (N/cm), and evaluated according to the following criteria. A: The peel strength is 12 N/cm or more. B: The peel strength is 8 N/cm or more and less than 12 N/cm. C: The peel strength is less than 8 N/cm.
<介電損耗正切> 自聚合物層切下長100 mm、寬50 mm之方形試片,使用網路分析儀作為測定器,藉由空腔共振器擾動法測定聚合物層之介電損耗正切,根據以下之基準進行評估。再者,測定頻率設為10 GHz。 A:介電損耗正切未達0.0015。 B:介電損耗正切為0.0015以上0.0030以下。 C:介電損耗正切超過0.0030。<Dielectric loss tangent> A square specimen with a length of 100 mm and a width of 50 mm was cut from the polymer layer. The dielectric loss tangent of the polymer layer was measured by the cavity resonator perturbation method using a network analyzer as a measuring instrument and evaluated according to the following criteria. The measurement frequency was set to 10 GHz. A: The dielectric loss tangent was less than 0.0015. B: The dielectric loss tangent was between 0.0015 and 0.0030. C: The dielectric loss tangent exceeded 0.0030.
<線膨脹係數> 自聚合物層切下寬3 mm、長10 mm見方之方形試片,測定使用熱機械分析裝置(SII Nano Technology公司製造之「TMA/SS6100」),以10℃/min自0℃升溫至400℃後,以40℃/min冷卻至10℃,進而以10℃/min自10℃升溫至200℃時之線膨脹係數之絕對值。測定負載設為29.4 mN,測定氛圍設為空氣氛圍。 A:線膨脹係數之絕對值為30 ppm/℃以下。 B:線膨脹係數之絕對值超過30 ppm/℃且為50 ppm/℃以下。 C:線膨脹係數之絕對值超過50 ppm/℃。 將該等結果示於以下之表1。<Linear expansion coefficient> A square specimen with a width of 3 mm and a length of 10 mm was cut from the polymer layer and measured using a thermomechanical analyzer ("TMA/SS6100" manufactured by SII Nano Technology) when the temperature was raised from 0°C to 400°C at 10°C/min, cooled to 10°C at 40°C/min, and then raised from 10°C to 200°C at 10°C/min. The measurement load was set to 29.4 mN and the measurement atmosphere was set to air. A: The absolute value of the linear expansion coefficient is less than 30 ppm/°C. B: The absolute value of the linear expansion coefficient exceeds 30 ppm/°C and is less than 50 ppm/°C. C: The absolute value of the linear expansion coefficient exceeds 50 ppm/°C. The results are shown in Table 1 below.
[表1]
再者,附聚合物層之銅箔1、2及5之聚合物層之結晶度為60%以上,附聚合物層之銅箔1、2及5之導熱性亦較其他附聚合物層之銅箔優異。Furthermore, the crystallinity of the polymer layer of the copper foils 1, 2 and 5 with polymer layers is above 60%, and the thermal conductivity of the copper foils 1, 2 and 5 with polymer layers is also superior to that of other copper foils with polymer layers.
4.積層膜之製造 藉由小徑反向凹版法利用輥對輥於膜1之表面塗敷液狀組合物1,形成液狀覆膜,使其通過乾燥爐,於150℃下加熱180秒形成乾燥覆膜。進而,於膜1之另一表面亦同樣地形成乾燥覆膜。 其後,於遠紅外線烘箱中,將乾燥覆膜於380℃下加熱1200秒使其熔融後,進行冷卻,獲得膜1之兩面形成有聚合物層(厚度:25 μm)之積層膜1。 乾燥覆膜之加熱時間為對於聚合物層每1 μm厚度為48秒,熔融覆膜於45秒內被冷卻至95℃(聚合物1之玻璃轉移點)。4. Production of laminated film The liquid composition 1 is applied to the surface of the film 1 by roller-to-roller method by a small-diameter reverse gravure method to form a liquid coating, which is passed through a drying furnace and heated at 150°C for 180 seconds to form a dry coating. Furthermore, a dry coating is formed on the other surface of the film 1 in the same manner. Thereafter, the dry coating is heated at 380°C for 1200 seconds in a far-infrared oven to melt it, and then cooled to obtain a laminated film 1 with a polymer layer (thickness: 25 μm) formed on both sides of the film 1. The heating time of the dry coating is 48 seconds for every 1 μm thickness of the polymer layer, and the molten coating is cooled to 95°C (glass transition point of polymer 1) within 45 seconds.
與聚合物層之線膨脹係數之測定同樣地測定所獲得之積層膜1之線膨脹係數,結果,積層膜1之線膨脹係數之絕對值為22 ppm/℃。 產業上之可利用性The linear expansion coefficient of the obtained laminated film 1 was measured in the same manner as the linear expansion coefficient of the polymer layer. As a result, the absolute value of the linear expansion coefficient of the laminated film 1 was 22 ppm/℃. Industrial Availability
本發明之積層體可適宜地用作傳輸高頻信號之印刷基板材料。又,根據本發明之製造方法,可有效率地製造上述積層體。The laminate of the present invention can be suitably used as a printed circuit board material for transmitting high-frequency signals. In addition, according to the manufacturing method of the present invention, the laminate can be efficiently manufactured.
Claims (7)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019134455 | 2019-07-22 | ||
| JP2019-134455 | 2019-07-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202110654A TW202110654A (en) | 2021-03-16 |
| TWI857104B true TWI857104B (en) | 2024-10-01 |
Family
ID=74193487
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109124567A TWI857104B (en) | 2019-07-22 | 2020-07-21 | Method for manufacturing laminate and laminate |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7484917B2 (en) |
| TW (1) | TWI857104B (en) |
| WO (1) | WO2021015079A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115397672A (en) * | 2020-03-31 | 2022-11-25 | Agc株式会社 | Multilayer film, method for producing same, metal-clad laminate, and method for producing printed wiring board |
| CN116333361A (en) * | 2023-04-25 | 2023-06-27 | 安徽中科宇顺科技有限公司 | Preparation method of high-frequency flexible electronic membrane |
| TWI888076B (en) | 2024-03-27 | 2025-06-21 | 台燿科技股份有限公司 | Metal-clad laminate |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6458534A (en) * | 1987-08-31 | 1989-03-06 | Canon Kk | Elastic rotary body and its preparation |
| JP2000010430A (en) * | 1998-06-19 | 2000-01-14 | Showa Electric Wire & Cable Co Ltd | Film for fixing part |
| CN1108909C (en) * | 1999-02-24 | 2003-05-21 | 杜邦三井氟化物有限公司 | Method for coating lining of a mould by rotating the mould |
| JP2007322751A (en) * | 2006-06-01 | 2007-12-13 | Fuji Xerox Co Ltd | Image forming apparatus, fixing device, fixing member, and method for manufacturing fixing member |
| TW201821558A (en) * | 2016-10-12 | 2018-06-16 | Asahi Glass Co Ltd | Laminate and method for manufacturing same |
| TW201821517A (en) * | 2016-07-22 | 2018-06-16 | Asahi Glass Co Ltd | Liquid composition, and method for manufacturing film and layered body using same |
| JP2019028184A (en) * | 2017-07-28 | 2019-02-21 | キヤノン株式会社 | Fixing member, manufacturing method of fixing member, |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003114585A (en) * | 2001-10-09 | 2003-04-18 | Nitto Denko Corp | Durable fixing belt and method of manufacturing the same |
| JP4048927B2 (en) * | 2002-11-20 | 2008-02-20 | 松下電器産業株式会社 | Induction heating coil |
| JP2018159826A (en) * | 2017-03-23 | 2018-10-11 | 住友電工ファインポリマー株式会社 | Fixation roller and method for manufacturing fixation roller |
-
2020
- 2020-07-16 JP JP2021533980A patent/JP7484917B2/en active Active
- 2020-07-16 WO PCT/JP2020/027617 patent/WO2021015079A1/en not_active Ceased
- 2020-07-21 TW TW109124567A patent/TWI857104B/en active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6458534A (en) * | 1987-08-31 | 1989-03-06 | Canon Kk | Elastic rotary body and its preparation |
| JP2000010430A (en) * | 1998-06-19 | 2000-01-14 | Showa Electric Wire & Cable Co Ltd | Film for fixing part |
| CN1108909C (en) * | 1999-02-24 | 2003-05-21 | 杜邦三井氟化物有限公司 | Method for coating lining of a mould by rotating the mould |
| JP2007322751A (en) * | 2006-06-01 | 2007-12-13 | Fuji Xerox Co Ltd | Image forming apparatus, fixing device, fixing member, and method for manufacturing fixing member |
| TW201821517A (en) * | 2016-07-22 | 2018-06-16 | Asahi Glass Co Ltd | Liquid composition, and method for manufacturing film and layered body using same |
| TW201821558A (en) * | 2016-10-12 | 2018-06-16 | Asahi Glass Co Ltd | Laminate and method for manufacturing same |
| JP2019028184A (en) * | 2017-07-28 | 2019-02-21 | キヤノン株式会社 | Fixing member, manufacturing method of fixing member, |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202110654A (en) | 2021-03-16 |
| JPWO2021015079A1 (en) | 2021-01-28 |
| WO2021015079A1 (en) | 2021-01-28 |
| JP7484917B2 (en) | 2024-05-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7151140B2 (en) | Fluororesin sheet, laminate and method for producing the same | |
| TWI837258B (en) | Powder dispersions, laminates and printed circuit boards | |
| JP7571723B2 (en) | Dispersions and moldings | |
| JP7435441B2 (en) | Powder dispersions, laminates, membranes and impregnated woven fabrics | |
| TWI891676B (en) | Non-aqueous dispersion, method for producing laminate, and formed article | |
| TWI824049B (en) | Dispersions | |
| JP7283208B2 (en) | Powder dispersion, method for producing laminate, method for producing laminate and printed circuit board | |
| TWI857104B (en) | Method for manufacturing laminate and laminate | |
| CN112236302B (en) | Method for producing resin-coated metal foil, laminate, and printed board | |
| KR102715823B1 (en) | Method for manufacturing resin-attached metal foil and resin-attached metal foil | |
| JP7635715B2 (en) | Method for producing non-aqueous dispersion and laminate | |
| JP7511110B2 (en) | Method for producing liquid composition and laminate | |
| TW202039678A (en) | Liquid composition, powder, and powder manufacturing method | |
| TWI845633B (en) | Liquid composition, strong dielectric insulating sheet and method for producing the same | |
| JP7380690B2 (en) | Film, film manufacturing method, metal clad laminate, and coated metal conductor | |
| JP7468520B2 (en) | Liquid Composition | |
| CN115397672A (en) | Multilayer film, method for producing same, metal-clad laminate, and method for producing printed wiring board | |
| TWI841684B (en) | Laminated body and method for manufacturing the laminated body |