TWI856586B - Precision granite pneumatic hydrostatic motion platform device - Google Patents
Precision granite pneumatic hydrostatic motion platform device Download PDFInfo
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- TWI856586B TWI856586B TW112111785A TW112111785A TWI856586B TW I856586 B TWI856586 B TW I856586B TW 112111785 A TW112111785 A TW 112111785A TW 112111785 A TW112111785 A TW 112111785A TW I856586 B TWI856586 B TW I856586B
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- 230000002706 hydrostatic effect Effects 0.000 title claims abstract description 62
- 239000010438 granite Substances 0.000 title claims abstract description 35
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910010293 ceramic material Inorganic materials 0.000 claims description 2
- 239000010439 graphite Substances 0.000 claims description 2
- 229910002804 graphite Inorganic materials 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 10
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 230000001133 acceleration Effects 0.000 abstract description 3
- 230000000694 effects Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000000227 grinding Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 239000004575 stone Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005188 flotation Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000012536 packaging technology Methods 0.000 description 2
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 2
- 241000872198 Serjania polyphylla Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003631 expected effect Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
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- Magnetic Bearings And Hydrostatic Bearings (AREA)
- Machine Tool Units (AREA)
Abstract
一種精密花崗岩氣靜壓運動平台裝置,包含一導軌單元、一滑座單元、一氣靜壓軸承單元及一線性馬達單元。該導軌單元包括一基座及一導軌組,該滑座單元包括一台座、二下滑塊、二側滑塊及一導氣道組,該氣靜壓軸承單元可使該滑座單元與該導軌單元之間允許氣膜產生,該線性馬達單元可驅動該滑座單元相對於該導軌單元沿該長軸向產生線性移動。利用氣靜壓浮力,可使該滑座單元在高精度花崗岩導軌單元上進行非接觸式滑動,搭配該線性馬達單元可達到優於金屬軌道之高定位精度與高加減速運動,可應用於高精密半導體加工設備。A precision granite pneumatic hydrostatic motion platform device includes a guide rail unit, a slide unit, a pneumatic hydrostatic bearing unit and a linear motor unit. The guide rail unit includes a base and a guide rail assembly, the slide unit includes a base, two slide blocks, two side slide blocks and an air guide channel assembly, the pneumatic hydrostatic bearing unit allows an air film to be generated between the slide unit and the guide rail unit, and the linear motor unit can drive the slide unit to generate linear movement relative to the guide rail unit along the long axis. By utilizing the hydrostatic buoyancy, the slide unit can slide non-contactly on the high-precision granite guide rail unit. When used with the linear motor unit, it can achieve high positioning accuracy and high acceleration and deceleration motion that is superior to metal rails, and can be applied to high-precision semiconductor processing equipment.
Description
本發明是有關於一種精密機械設備,特別是指一種精密花崗岩氣靜壓運動平台裝置。 The present invention relates to a precision mechanical device, in particular to a precision granite pneumatic hydrostatic motion platform device.
在現今的半導體製程中,為了持續突破摩爾定律:「積體電路上單位面積可容納的電晶體數目,約每隔兩年便會增加一倍」,除了在半導體微影製程(photolithography)持續精進或改變電晶體元件結構(如鰭式場效應電晶體FinFET)等方式外,在晶片的封裝技術上亦發展出3D堆疊封裝技術,即在矽晶片上面疊加更多矽晶片的3DIC封裝設計,而在製程中需要藉由精密定位平台搭載晶圓作快速移動,來進行不同位置的雷射加工或作晶圓檢測,也成為半導體精密加工不可或缺的關鍵零組件。但是在高速移動過程所產生的熱和功率損耗等問題也逐漸浮現,傳統使用金屬材質(不鏽鋼或鋁合金)製作的線性滑軌(滾珠軸承)已無法滿足半導體製程的精度與穩定度要求,在加工成本、良率與使用壽命上已不具可行性。 In today's semiconductor manufacturing process, in order to continue to break Moore's Law: "The number of transistors that can be accommodated per unit area of an integrated circuit will double approximately every two years", in addition to continuously improving the semiconductor photolithography process or changing the transistor device structure (such as fin field effect transistor FinFET), 3D stacking packaging technology has also been developed in chip packaging technology, that is, a 3DIC packaging design that stacks more silicon chips on a silicon chip. In the process, a precise positioning platform is required to carry the wafer for rapid movement to perform laser processing or wafer inspection at different locations, and it has also become an indispensable key component for semiconductor precision processing. However, problems such as heat and power loss generated during high-speed movement have gradually emerged. The linear slide rails (ball bearings) made of traditional metal materials (stainless steel or aluminum alloy) can no longer meet the precision and stability requirements of semiconductor manufacturing processes, and are no longer feasible in terms of processing costs, yield and service life.
雖然中華人民共和國授權公告號CN202539944U的一 種龍門移動式數控機床揭示,通過採用花崗石實體X軸、X軸滑架、橫樑和工作臺,可以有效吸收磨銑過程中的有害振動波,消除工件表面振紋,從而提高工件表面加工精度及提高刀具耐用度。另外,美國專利公告號US7845257B2揭示,主要結構部分由花崗岩、氧化鋁陶瓷等無機物形成,因而可使熱位移引起的誤差最小,從而能夠對納米級別的工件進行高精度的機械加工。 Although the People's Republic of China's authorized announcement number CN202539944U discloses that by using a solid granite X-axis, X-axis slide, crossbeam and workbench, it can effectively absorb harmful vibration waves in the milling process, eliminate vibration marks on the workpiece surface, thereby improving the workpiece surface processing accuracy and tool durability. In addition, the US patent announcement number US7845257B2 discloses that the main structural part is formed by inorganic materials such as granite and alumina ceramics, so that the error caused by thermal displacement can be minimized, so that high-precision machining of nano-level workpieces can be performed.
但是申請人認為精密加工的技術仍有待提升,終於有本發明的誕生。 However, the applicant believed that the precision machining technology still needed to be improved, and finally the present invention was born.
因此,本發明的目的,即在提供一種可提升加工精度的精密花崗岩氣靜壓運動平台裝置。 Therefore, the purpose of the present invention is to provide a precision granite pneumatic hydrostatic motion platform device that can improve processing accuracy.
於是,本發明精密花崗岩氣靜壓運動平台裝置,包含一導軌單元、一滑座單元、一氣靜壓軸承單元及一線性馬達單元。該導軌單元沿一長軸向延伸且採用花崗岩材質製成,並包括一基座,以及一固定於該基座的導軌組,該導軌組具有至少一頂面、二相反於該頂面的底面,以及二分別與該頂面、該底面呈角度相交的外側面。該滑座單元可沿該長軸向在該導軌單元上滑動,並包括一相對於該頂面的台座、二分別相對於該等底面的下滑塊、二分別連接於該台座與該等下滑塊之間的側滑塊,以及一連通該台座、該等下滑塊與該等側滑塊的導氣道組,該等側滑塊相對於該等外側面,該台 座具有二沿一垂直於該長軸向的橫軸向呈相反設置的側端部,每一側端部與對應的該側滑塊、該下滑塊共同構成一呈倒U形的側框架。該氣靜壓軸承單元連通於該導氣道組,並包括一固設於該台座且相對於該頂面的第一氣靜壓軸承組、一固設於該等下滑塊且相對於該等底面的第二氣靜壓軸承組,以及一固設於該等側滑塊且相對於該等外側面的第三氣靜壓軸承組,該氣靜壓軸承單元可使該滑座單元與該導軌單元之間允許氣膜產生。該線性馬達單元包括一安裝於該導軌單元的定子,以及一安裝於該滑座單元的台座且相對於該定子的動子,該線性馬達單元可驅動該滑座單元相對於該導軌單元沿該長軸向產生線性移動。 Therefore, the precision granite pneumatic hydrostatic motion platform device of the present invention comprises a guide rail unit, a slide unit, a pneumatic hydrostatic bearing unit and a linear motor unit. The guide rail unit extends along a long axis and is made of granite material, and comprises a base and a guide rail assembly fixed to the base, the guide rail assembly having at least one top surface, two bottom surfaces opposite to the top surface, and two outer side surfaces intersecting the top surface and the bottom surface at an angle. The slide unit can slide on the guide rail unit along the long axis, and includes a pedestal relative to the top surface, two lower slide blocks respectively relative to the bottom surfaces, two side slide blocks respectively connected between the pedestal and the lower slide blocks, and an air guide channel group connecting the pedestal, the lower slide blocks and the side slide blocks. The side slide blocks are relative to the outer side surfaces. The pedestal has two side ends which are oppositely arranged along a transverse axis perpendicular to the long axis, and each side end and the corresponding side slide block and the lower slide block together form an inverted U-shaped side frame. The pneumatic pressure bearing unit is connected to the air guide channel assembly and includes a first pneumatic pressure bearing assembly fixed to the base and opposite to the top surface, a second pneumatic pressure bearing assembly fixed to the lower slide blocks and opposite to the bottom surfaces, and a third pneumatic pressure bearing assembly fixed to the side slide blocks and opposite to the outer side surfaces. The pneumatic pressure bearing unit allows an air film to be generated between the slide unit and the guide rail unit. The linear motor unit includes a stator mounted on the guide rail unit, and a mover mounted on the base of the slide unit and opposite to the stator. The linear motor unit can drive the slide unit to generate linear movement along the long axis relative to the guide rail unit.
本發明的功效在於:利用整體的組合可降低超精密加工設備行程尺寸要求,並可以充分發揮加工設備的精度能力,且利用氣靜壓浮力,可使該滑座單元在高精度花崗岩的導軌單元上進行非接觸式滑動,搭配該線性馬達單元可達到優於金屬軌道之高定位精度與高加減速運動,可應用於高精密半導體加工設備。 The effect of the present invention is that the overall combination can reduce the stroke size requirements of ultra-precision processing equipment and fully exert the precision capability of the processing equipment. By utilizing the hydrostatic buoyancy, the slide unit can slide non-contactly on the high-precision granite guide rail unit. When combined with the linear motor unit, it can achieve high positioning accuracy and high acceleration and deceleration motion that is superior to metal rails, and can be applied to high-precision semiconductor processing equipment.
100:氣靜壓運動平台裝置 100: Hydrostatic motion platform device
10:導軌單元 10: Guide rail unit
11:基座 11: Base
12:導軌組 12: Guide rail assembly
120:側座 120: Side seat
121:頂面 121: Top
122:底面 122: Bottom
123:外側面 123: Outer side
124:內側面 124: Inner side
20:滑座單元 20: Sliding seat unit
21:台座 21: Pedestal
211:側端部 211: Side end
212:底端面 212: Bottom end surface
213:第一嵌槽 213: First slot
22:下滑塊 22: Slide down block
221:上端面 221: Upper end surface
222:第二嵌槽 222: Second bezel
23:側滑塊 23: Side slider
231:側端面 231: Side surface
232:第三嵌槽 232: The third slot
24:導氣道組 24: Airway Group
241:第一導氣道 241: First airway
242:第二導氣道 242: Second airway
243:第三導氣道 243: The third airway
25:側框架 25: Side frame
30:氣靜壓軸承單元 30: Hydrostatic bearing unit
31:第一氣靜壓軸承組 31: The first hydrostatic bearing set
311:第一氣靜壓軸承 311: The first hydrostatic bearing
32:第二氣靜壓軸承組 32: Second pneumatic hydrostatic bearing set
321:第二氣靜壓軸承 321: Second pneumatic hydrostatic bearing
33:第三氣靜壓軸承組 33: The third hydrostatic bearing set
331:第三氣靜壓軸承 331: The third hydrostatic bearing
34:第四氣靜壓軸承組 34: The fourth hydrostatic bearing set
40:線性馬達單元 40: Linear motor unit
41:定子 41: Stator
42:動子 42: Movers
51:極限開關 51: Limit switch
52:位置感知器 52: Position sensor
X:長軸向 X: Long axis
Y:橫軸向 Y: horizontal axis
10’:導軌單元 10’: Rail unit
11’:基座 11’: Base
12’:導軌組 12’: Rail assembly
120’:側座 120’: Side seat
13’:凹陷空間 13’: Recessed space
20’:滑座單元 20’: Sliding seat unit
21’:台座 21’: Pedestal
26’:延伸塊 26’: Extension block
本發明的其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中:圖1是本發明精密花崗岩氣靜壓運動平台裝置一第一實施例的一立體組合圖; 圖2是該第一實施例的一俯視圖;圖3是沿圖2中之線Ⅲ-Ⅲ的一剖面圖;圖4是圖3的一局部放大示意圖;圖5是該第一實施例呈堆疊配置的一立體示意圖;圖6是本發明精密花崗岩氣靜壓運動平台裝置一第二實施例的一剖視示意圖;圖7是本發明精密花崗岩氣靜壓運動平台裝置一第三實施例的一剖視示意圖;及圖8是本發明精密花崗岩氣靜壓運動平台裝置一第四實施例的一剖視示意圖。 Other features and effects of the present invention will be clearly presented in the embodiments with reference to the drawings, wherein: FIG. 1 is a three-dimensional assembly diagram of a first embodiment of the precision granite gas hydrostatic motion platform device of the present invention; FIG. 2 is a top view of the first embodiment; FIG. 3 is a cross-sectional view along line III-III in FIG. 2; FIG. 4 is a partially enlarged schematic diagram of FIG. 3; FIG. 5 is a three-dimensional schematic diagram of the first embodiment in a stacked configuration; FIG. 6 is a cross-sectional schematic diagram of a second embodiment of the precision granite gas hydrostatic motion platform device of the present invention; FIG. 7 is a cross-sectional schematic diagram of a third embodiment of the precision granite gas hydrostatic motion platform device of the present invention; and FIG. 8 is a cross-sectional schematic diagram of a fourth embodiment of the precision granite gas hydrostatic motion platform device of the present invention.
在本發明被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。 Before the present invention is described in detail, it should be noted that similar components are represented by the same numbers in the following description.
參閱圖1至圖4,本發明精密花崗岩氣靜壓運動平台裝置100的一第一實施例,包含一導軌單元10、一滑座單元20、一氣靜壓軸承單元30及一線性馬達單元40。 Referring to Figures 1 to 4, a first embodiment of the precision granite pneumatic hydrostatic motion platform device 100 of the present invention includes a guide rail unit 10, a slide unit 20, a pneumatic hydrostatic bearing unit 30 and a linear motor unit 40.
該導軌單元10沿一長軸向X延伸且採用花崗岩材質製成,並包括一基座11,以及一固定於該基座11的導軌組12。本實施例的該導軌組12呈兩件式,分別以螺絲鎖固於該基座11,且該導軌組12具有二沿一垂直於該長軸向X的橫軸向Y呈間隔設置的側座 120。每一個側座120具有一頂面121、一相反於該頂面121的底面122、一與該頂面121、該底面122呈角度相交的外側面123,以及一與該頂面121呈角度相交且與該外側面123呈相反設置的內側面124。 The guide rail unit 10 extends along a long axis X and is made of granite, and includes a base 11 and a guide rail assembly 12 fixed to the base 11. The guide rail assembly 12 of this embodiment is a two-piece type, which is screwed to the base 11 respectively, and the guide rail assembly 12 has two side seats 120 arranged at intervals along a transverse axis Y perpendicular to the long axis X. Each side seat 120 has a top surface 121, a bottom surface 122 opposite to the top surface 121, an outer side surface 123 intersecting the top surface 121 and the bottom surface 122 at an angle, and an inner side surface 124 intersecting the top surface 121 at an angle and arranged opposite to the outer side surface 123.
該滑座單元20可沿該長軸向X在該導軌單元10上滑動,並包括一相對於該等頂面121的台座21、二分別相對於該等底面122的下滑塊22、二分別連接於該台座21與該等下滑塊22之間的側滑塊23,以及一連通該台座21、該等下滑塊22與該等側滑塊23的導氣道組24。該台座21具有二沿該橫軸向Y呈相反設置的側端部211、一相對於該等頂面121的底端面212,以及二分別對應於該等側端部211且由該底端面212凹設的第一嵌槽213。該等下滑塊22各具有一相對於該等底面122的上端面221,以及一由該上端面221凹設的第二嵌槽222。該等側滑塊23各具有一相對於該等外側面123的側端面231,以及一由該側端面231凹設的第三嵌槽232。每一側端部211與對應的該側滑塊23、該下滑塊22共同構成一呈倒U形的側框架25。該導氣道組24具有多數設置於該台座21內部且可連通至該等第一嵌槽213的第一導氣道241、多數設置於該等下滑塊22內部且可連通至該等第二嵌槽222的第二導氣道242,以及多數設置於該等側滑塊23內部且可連通至該等第三嵌槽232的第三導氣道243,該等第一導氣道241、該等第二導氣道242與該等第三 導氣道243互相連通。 The slide unit 20 can slide on the guide rail unit 10 along the long axis X, and includes a base 21 relative to the top surfaces 121, two lower slide blocks 22 respectively relative to the bottom surfaces 122, two side slide blocks 23 respectively connected between the base 21 and the lower slide blocks 22, and an air guide channel set 24 connecting the base 21, the lower slide blocks 22 and the side slide blocks 23. The base 21 has two side end portions 211 oppositely arranged along the transverse axis Y, a bottom end surface 212 relative to the top surfaces 121, and two first embedding grooves 213 respectively corresponding to the side end portions 211 and recessed by the bottom end surface 212. Each of the lower slide blocks 22 has an upper end surface 221 relative to the bottom surfaces 122, and a second embedding groove 222 recessed from the upper end surface 221. Each of the side slide blocks 23 has a side end surface 231 relative to the outer side surfaces 123, and a third embedding groove 232 recessed from the side end surface 231. Each side end portion 211 and the corresponding side slide block 23 and the lower slide block 22 together form an inverted U-shaped side frame 25. The air guide channel set 24 has a plurality of first air guide channels 241 disposed inside the base 21 and connected to the first embedded grooves 213, a plurality of second air guide channels 242 disposed inside the lower slide blocks 22 and connected to the second embedded grooves 222, and a plurality of third air guide channels 243 disposed inside the side slide blocks 23 and connected to the third embedded grooves 232. The first air guide channels 241, the second air guide channels 242 and the third air guide channels 243 are connected to each other.
該氣靜壓軸承單元30包括一固設於該台座21且相對於該等頂面121的第一氣靜壓軸承組31、一固設於該等下滑塊22且相對於該等底面122的第二氣靜壓軸承組32,以及一固設於該等側滑塊23且相對於該等外側面123的第三氣靜壓軸承組33。該氣靜壓軸承單元30可使該滑座單元20與該導軌單元10之間允許氣膜產生。也就是說,該第一氣靜壓軸承組31具有多數分別嵌固於該等第一嵌槽213的第一氣靜壓軸承311,該第一氣靜壓軸承組31可使該台座21與該等頂面121之間允許氣膜產生。該第二氣靜壓軸承組32具有多數分別嵌固於該等第二嵌槽222的第二氣靜壓軸承321,該第二氣靜壓軸承組32可使該等下滑塊22與該等底面122之間允許氣膜產生。該第三氣靜壓軸承組33具有多數分別嵌固於該等第三嵌槽232的第三氣靜壓軸承331,該第三氣靜壓軸承組33可使該等側滑塊23與該等外側面123之間允許氣膜產生。該等第一氣靜壓軸承311、該等第二氣靜壓軸承321及該等第三氣靜壓軸承331採用多孔性陶瓷材料或採用其他多孔材料(例如含有多孔性石墨層的材料)所製成。 The pneumatic pressure bearing unit 30 includes a first pneumatic pressure bearing set 31 fixed to the base 21 and opposite to the top surfaces 121, a second pneumatic pressure bearing set 32 fixed to the lower slide blocks 22 and opposite to the bottom surfaces 122, and a third pneumatic pressure bearing set 33 fixed to the side slide blocks 23 and opposite to the outer side surfaces 123. The pneumatic pressure bearing unit 30 allows an air film to be generated between the slide unit 20 and the guide rail unit 10. That is, the first pneumatic pressure bearing assembly 31 has a plurality of first pneumatic pressure bearings 311 respectively embedded in the first embedding grooves 213, and the first pneumatic pressure bearing assembly 31 allows air film to be generated between the pedestal 21 and the top surfaces 121. The second pneumatic pressure bearing assembly 32 has a plurality of second pneumatic pressure bearings 321 respectively embedded in the second embedding grooves 222, and the second pneumatic pressure bearing assembly 32 allows air film to be generated between the lower slide blocks 22 and the bottom surfaces 122. The third pneumatic bearing assembly 33 has a plurality of third pneumatic bearings 331 respectively embedded in the third embedding grooves 232. The third pneumatic bearing assembly 33 allows air film to be generated between the side sliders 23 and the outer side surfaces 123. The first pneumatic bearings 311, the second pneumatic bearings 321 and the third pneumatic bearings 331 are made of porous ceramic materials or other porous materials (e.g., materials containing porous graphite layers).
該線性馬達單元40包括一安裝於該導軌單元10的定子41,以及一安裝於該滑座單元20的底端面212且相對於該定子41的動子42,該定子41固定於該基座11且位於該等側座120之間,該線 性馬達單元40可驅動該滑座單元20相對於該導軌單元10沿該長軸向X產生線性移動。 The linear motor unit 40 includes a stator 41 mounted on the guide rail unit 10, and a mover 42 mounted on the bottom end surface 212 of the slide unit 20 and opposite to the stator 41. The stator 41 is fixed to the base 11 and located between the side seats 120. The linear motor unit 40 can drive the slide unit 20 to generate linear movement along the long axis X relative to the guide rail unit 10.
為供進一步瞭解本發明各元件配合所產生的作用、運用技術手段,以及所預期達成的功效,將再說明如下,相信當可由此而對本發明有更深入且具體的瞭解。 In order to further understand the effects of the components of the present invention, the technical means used, and the expected effects, the following will be explained. I believe that this will provide a deeper and more specific understanding of the present invention.
如圖1至圖3所示,當整體組配完成時,該滑座單元20套設於該導軌單元10外部,且該氣靜壓軸承單元30也預先設置於該滑座單元20,該線性馬達單元40則設置於該導軌單元10與該滑座單元20之間。 As shown in Figures 1 to 3, when the overall assembly is completed, the slide unit 20 is sleeved on the outside of the guide rail unit 10, and the pneumatic hydrostatic bearing unit 30 is also pre-set on the slide unit 20, and the linear motor unit 40 is set between the guide rail unit 10 and the slide unit 20.
當啟動該線性馬達單元40時,也同時將高壓空氣導入於該導氣道組24,並分別透過該等第一導氣道241將壓力氣流導引至該等第一氣靜壓軸承311,透過該等第二導氣道242將壓力氣流導引至該等第二氣靜壓軸承321,以及透過該等第三導氣道243將壓力氣流導引至該等第三氣靜壓軸承331,且在該台座21與該等頂面121之間產生氣膜,在該等下滑塊22與該等底面122之間產生氣膜,在該等側滑塊23與該等外側面123之間也產生氣膜。並在該滑座單元20與該導軌單元10之間產生氣浮作用(類似線性滑軌功能),且提供該滑座單元20相對於該導軌單元10產生順暢滑動,並保持該滑座單元20行走直線度。 When the linear motor unit 40 is started, high-pressure air is also introduced into the air guide channel set 24 at the same time, and the pressure airflow is guided to the first pneumatic bearings 311 through the first air guide channels 241, the pressure airflow is guided to the second pneumatic bearings 321 through the second air guide channels 242, and the pressure airflow is guided to the third pneumatic bearings 331 through the third air guide channels 243, and an air film is generated between the base 21 and the top surfaces 121, between the lower slide blocks 22 and the bottom surfaces 122, and between the side slide blocks 23 and the outer side surfaces 123. An air flotation effect (similar to the function of a linear slide) is generated between the slide unit 20 and the guide rail unit 10, and the slide unit 20 is provided with smooth sliding relative to the guide rail unit 10, and the straightness of the slide unit 20 is maintained.
因此,本發明精密花崗岩氣靜壓運動平台裝置,使用該 氣靜壓軸承單元30(Air Bearing),因為採用靜壓空氣軸承(氣浮)進行直線導引,滑動面的摩擦極小,且不會有沾黏現象。因此運行過程非常平順,並能獲得很高的直線度和定位精度,也改善速度不均等現象。同時,因發塵量極少,可以滿足無塵室環境中次微米精密移動的需求。 Therefore, the precision granite pneumatic hydrostatic motion platform device of the present invention uses the pneumatic hydrostatic bearing unit 30 (Air Bearing). Because the hydrostatic air bearing (air flotation) is used for linear guidance, the friction of the sliding surface is extremely small, and there will be no sticking phenomenon. Therefore, the operation process is very smooth, and a very high straightness and positioning accuracy can be obtained, and the speed inequality phenomenon is also improved. At the same time, due to the extremely low dust generation, the needs of sub-micron precision movement in a clean room environment can be met.
另外,參圖1,透過安裝於該導軌單元10的二極限開關51,以及一位置感知器52,以及該線性馬達單元40的運作,可以感測該滑座單元20的位置,且可精準控制該滑座單元20的行程及定位。上述零組件皆可集中安裝於該滑座單元20下方與該導軌單元10之間的空間內。 In addition, referring to FIG. 1 , through the operation of the two-limit switch 51 and the position sensor 52 installed on the guide rail unit 10 and the linear motor unit 40, the position of the slide unit 20 can be sensed, and the stroke and positioning of the slide unit 20 can be precisely controlled. The above components can all be centrally installed in the space between the bottom of the slide unit 20 and the guide rail unit 10.
除此之外,再將本發明的優點歸納如下: In addition, the advantages of the present invention are summarized as follows:
一、本發明的導軌單元10採三件式組合設計,可分為該基座11、兩個側座120組成的導軌組,再配合該滑座單元20的設計,此設計方式可降低超精密磨床加工設備行程尺寸要求,而可四面研磨的元件設計,非常適合花崗岩材質構件製作,並可以充分發揮平面研磨設備的精度能力,減低側磨、更換砂輪與治具上拆裝產生的誤差。 1. The guide rail unit 10 of the present invention adopts a three-piece assembly design, which can be divided into a guide rail group consisting of the base 11 and two side seats 120, and combined with the design of the slide unit 20, this design method can reduce the stroke size requirements of ultra-precision grinding machine processing equipment, and the component design that can grind on all four sides is very suitable for the production of granite components, and can fully exert the precision capability of the plane grinding equipment, reducing the errors caused by side grinding, replacement of grinding wheels and disassembly and assembly of fixtures.
二、利用每一側端部211與對應的該側滑塊23、該下滑塊22共同構成呈倒U形的側框架25,以及與該等側座120構成的幾何型式配合,進一步拘束該滑座單元20的自由度,進而實現理想的單 自由度方向運動。該滑座單元20與該導軌組12之間的幾何拘束型式呈封閉式,所以能穩定的實現理想單一線性自由度拘束,滿足高精度、高穩定度的運動需求。 Second, each side end 211 and the corresponding side slider 23 and the lower slider 22 together form an inverted U-shaped side frame 25, and cooperate with the geometric form formed by the side seats 120 to further constrain the freedom of the slide unit 20, thereby realizing the ideal single-degree-of-freedom direction movement. The geometric constraint between the slide unit 20 and the guide rail assembly 12 is closed, so it can stably realize the ideal single linear degree of freedom constraint and meet the high-precision and high-stability movement requirements.
三、在該滑座單元20內部的該氣靜壓軸承單元軸承30與供氣迴路設計部分。該氣靜壓軸承單元30採嵌入式(黏合)整合於該滑座單元20中,平均分布於該滑座單元20與該導軌單元10各相對面之間,並整合設計對應所需隱藏式的導氣道組24,讓該滑座單元20外觀與週邊更簡潔單一化,同時有效降低該滑座單元20高度。 3. The pneumatic pressure bearing unit bearing 30 and air supply circuit design inside the slide unit 20. The pneumatic pressure bearing unit 30 is embedded (bonded) and integrated into the slide unit 20, evenly distributed between the slide unit 20 and the guide rail unit 10, and the corresponding hidden air guide duct assembly 24 is integrated and designed to make the appearance and periphery of the slide unit 20 more simple and unified, while effectively reducing the height of the slide unit 20.
四、本發明是以精密花崗岩作為主要構件,包含使用精密花崗岩製作該導軌單元10,主要原因是精密花崗岩具備熱傳導係數低(不易傳熱)、熱膨脹係數低(不易熱變形)、密度低(同體積重量輕)與阻尼特性佳(吸震能力高)等特點,適合取代金屬材質並應用於對穩定性要求極為嚴苛的半導體製程設備。 4. The present invention uses precision granite as the main component, including the use of precision granite to make the guide rail unit 10. The main reason is that precision granite has the characteristics of low thermal conductivity (not easy to conduct heat), low thermal expansion coefficient (not easy to deform by heat), low density (light weight per volume), and good damping characteristics (high shock absorption ability). It is suitable for replacing metal materials and applied to semiconductor process equipment with extremely strict requirements on stability.
五、本發明的該導軌單元10與該滑座單元20的組成是採用簡單長方體形狀、分件式設計,該基座11與該等側座120由三件式的長方體構件組成,適合使用石材進行製作,且長方體構件因為外型簡單故可進行四面向的研磨,並可以充分發揮平面研磨設備的精度能力。石材選用花崗岩種類高硬度(如印度黑相同硬度等級或以上)石材為主,並進行精密研磨,平面度須達DIN 876 00級,因石材穩定性高於一般所使用金屬基底(不銹鋼、鋁合金)所開發之次 微米運動平台,具備更高的剛性,減少動件懸伸時所造成的平面度變異,並可運用於半導精密加工設備機台。另外,該滑座單元20由該台座21、該等下滑塊22、該等側滑塊23組成,構形簡單、加工容易。 5. The guide rail unit 10 and the slide unit 20 of the present invention are composed of a simple rectangular shape and a split-piece design. The base 11 and the side seats 120 are composed of three-piece rectangular components, which are suitable for being made of stone. The rectangular components can be ground on all four sides due to their simple appearance, and the precision capability of the plane grinding equipment can be fully utilized. The stone material is mainly granite with high hardness (such as Indian black with the same hardness level or above), and is precisely ground to a flatness of DIN 876 00. The stability of the stone is higher than that of the sub-micrometer motion platform developed with the metal substrate (stainless steel, aluminum alloy) generally used. It has higher rigidity, reduces the flatness variation caused by the suspension of the moving parts, and can be used in semiconductor precision processing equipment. In addition, the slide unit 20 is composed of the base 21, the lower slide blocks 22, and the side slide blocks 23, and has a simple structure and is easy to process.
六、本發明以精密花崗岩為主要結構件之氣靜壓運動平台裝置,該滑座單元20利用氣靜壓浮力在高精度(平面度、真直度)花崗岩導軌組12上進行非接觸式滑動,並替代金屬導軌(不鏽鋼或鋁合金材質之線性滑軌),搭配該線性馬達單元40(磁浮),可達到優於金屬軌道之高定位精度與高加減速運動,可應用於高精密半導體晶圓加工設備。 6. The present invention uses precision granite as the main structural component of the pneumatic hydrostatic motion platform device. The slide unit 20 uses the pneumatic hydrostatic buoyancy to perform non-contact sliding on the high-precision (flatness, straightness) granite guide rail set 12, and replaces the metal guide rail (linear slide rail made of stainless steel or aluminum alloy). In combination with the linear motor unit 40 (magnetic levitation), it can achieve high positioning accuracy and high acceleration and deceleration motion that is superior to metal rails, and can be applied to high-precision semiconductor wafer processing equipment.
如圖5所示,本發明上述實施例的氣靜壓運動平台裝置100可以堆疊配置,利用兩個單軸向移動的氣靜壓運動平台裝置,以堆疊的方式進行組合,架構出所需X-Y雙軸向運動平台的移動與定位功能,並應用於半導體與光電產業的高精度加工設備,上、下運動台面的台面尺寸與移動行程可根據設備的需求作設計上的調整,並可將導軌組12或整個運動平台進行模組化、規格分級與界面標準化,將有助於降低量產成本,此外亦可針對特殊需求進行客製化設計。 As shown in FIG. 5 , the pneumatic hydrostatic motion platform device 100 of the above embodiment of the present invention can be stacked. Two uniaxially movable pneumatic hydrostatic motion platform devices are combined in a stacked manner to construct the required X-Y dual-axis motion platform movement and positioning functions, and are applied to high-precision processing equipment in the semiconductor and optoelectronic industries. The table size and movement stroke of the upper and lower motion tables can be adjusted in design according to the requirements of the equipment, and the guide rail assembly 12 or the entire motion platform can be modularized, graded, and interface standardized, which will help reduce mass production costs. In addition, customized designs can also be performed for special needs.
如圖6所示,本發明精密花崗岩氣靜壓運動平台裝置的一第二實施例,與第一實施例的差異在於:該導軌單元10’採兩件式。 包括一基座11’,以及一固定於該基座11’的導軌組12’。該導軌組12’呈單件式,該導軌組12’還具有一由該頂面凹設的凹陷空間13’,該線性馬達單元40的定子41安裝於該凹陷空間13’。藉由該凹陷空間13’的設置而形成兩個側座120’。該第二實施例也可達成與第一實施例相同的目的及功效。 As shown in FIG6 , a second embodiment of the precision granite pneumatic hydrostatic motion platform device of the present invention is different from the first embodiment in that the guide rail unit 10 'is a two-piece type. It includes a base 11 ', and a guide rail assembly 12 'fixed to the base 11 '. The guide rail assembly 12 'is a single-piece type, and the guide rail assembly 12 'also has a recessed space 13 'recessed by the top surface, and the stator 41 of the linear motor unit 40 is installed in the recessed space 13 '. Two side seats 120 'are formed by the provision of the recessed space 13 '. The second embodiment can also achieve the same purpose and effect as the first embodiment.
如圖7所示,本發明精密花崗岩氣靜壓運動平台裝置的一第三實施例,與第一實施例的差異在於:該滑座單元20’的台座21’還具有一設置於該等側座120之間的延伸塊26’,該氣靜壓軸承單元30還包括至少一固設於該延伸塊26’且相對於其中一側座120的內側面124的第四氣靜壓軸承組34。該第三實施例也可達成與上述實施例相同的目的及功效。 As shown in FIG. 7 , a third embodiment of the precision granite pneumatic hydrostatic motion platform device of the present invention is different from the first embodiment in that the base 21 'of the slide unit 20 'also has an extension block 26 'set between the side seats 120, and the pneumatic hydrostatic bearing unit 30 also includes at least one fourth pneumatic hydrostatic bearing assembly 34 fixed to the extension block 26 'and opposite to the inner side surface 124 of one of the side seats 120. The third embodiment can also achieve the same purpose and effect as the above embodiment.
如圖8所示,本發明精密花崗岩氣靜壓運動平台裝置的一第四實施例,類似於第三實施例,且該滑座單元20’的延伸塊26’呈相反的兩側各固設有至少一第四氣靜壓軸承組34,該第四實施例也可達成與上述實施例相同的目的及功效。 As shown in FIG8 , a fourth embodiment of the precision granite pneumatic hydrostatic motion platform device of the present invention is similar to the third embodiment, and the extension block 26' of the slide unit 20' is fixed with at least one fourth pneumatic hydrostatic bearing assembly 34 on opposite sides. The fourth embodiment can also achieve the same purpose and effect as the above embodiments.
綜上所述,本發明精密花崗岩氣靜壓運動平台裝置,整體結構簡單、製造組配容易,且可達到精密加工目的,確實能達成本發明的目的。 In summary, the precision granite pneumatic hydrostatic motion platform device of the present invention has a simple overall structure, is easy to manufacture and assemble, and can achieve the purpose of precision processing, which can indeed achieve the purpose of this invention.
惟以上所述者,僅為本發明的實施例而已,當不能以此限定本發明實施的範圍,凡是依本發明申請專利範圍及專利說明書 內容所作的簡單的等效變化與修飾,皆仍屬本發明專利涵蓋的範圍內。 However, the above is only an example of the implementation of the present invention, and it cannot be used to limit the scope of the implementation of the present invention. All simple equivalent changes and modifications made according to the scope of the patent application of the present invention and the content of the patent specification are still within the scope of the patent of the present invention.
100:氣靜壓運動平台裝置 100: Hydrostatic motion platform device
10:導軌單元 10: Guide rail unit
11:基座 11: Base
12:導軌組 12: Guide rail assembly
120:側座 120: Side seat
121:頂面 121: Top
122:底面 122: Bottom
123:外側面 123: Outer side
124:內側面 124: Inner side
20:滑座單元 20: Sliding seat unit
21:台座 21: Pedestal
211:側端部 211: Side end
212:底端面 212: Bottom end surface
213:第一嵌槽 213: First slot
22:下滑塊 22: Slide down block
221:上端面 221: Upper end surface
222:第二嵌槽 222: Second bezel
23:側滑塊 23: Side slider
231:側端面 231: Side surface
232:第三嵌槽 232: The third slot
24:導氣道組 24: Airway Group
241:第一導氣道 241: First airway
242:第二導氣道 242: Second airway
243:第三導氣道 243: The third airway
25:側框架 25: Side frame
30:氣靜壓軸承單元 30: Hydrostatic bearing unit
31:第一氣靜壓軸承組 31: The first hydrostatic bearing set
311:第一氣靜壓軸承 311: The first hydrostatic bearing
32:第二氣靜壓軸承組 32: Second pneumatic hydrostatic bearing set
321:第二氣靜壓軸承 321: Second pneumatic hydrostatic bearing
33:第三氣靜壓軸承組 33: The third hydrostatic bearing set
331:第三氣靜壓軸承 331: The third hydrostatic bearing
40:線性馬達單元 40: Linear motor unit
41:定子 41: Stator
42:動子 42: Movers
Y:橫軸向 Y: horizontal axis
Claims (6)
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| Application Number | Priority Date | Filing Date | Title |
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| TW112111785A TWI856586B (en) | 2023-03-28 | 2023-03-28 | Precision granite pneumatic hydrostatic motion platform device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112111785A TWI856586B (en) | 2023-03-28 | 2023-03-28 | Precision granite pneumatic hydrostatic motion platform device |
Publications (2)
| Publication Number | Publication Date |
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| TWI856586B true TWI856586B (en) | 2024-09-21 |
| TW202438788A TW202438788A (en) | 2024-10-01 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120704078A (en) * | 2025-08-21 | 2025-09-26 | 济南东星精密量仪有限公司 | An ultra-precision air-floating motion platform |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20110070346A (en) * | 2009-12-18 | 2011-06-24 | (주)트리엔 | Linear stage |
| CN217421878U (en) * | 2021-12-31 | 2022-09-13 | 苏州恰克精密机械有限公司 | Aerostatic suspension sliding platform |
| TWI793392B (en) * | 2019-01-31 | 2023-02-21 | 日商斯庫林集團股份有限公司 | Conveyor apparatus, light exposure device, and conveyance method |
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2023
- 2023-03-28 TW TW112111785A patent/TWI856586B/en active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20110070346A (en) * | 2009-12-18 | 2011-06-24 | (주)트리엔 | Linear stage |
| TWI793392B (en) * | 2019-01-31 | 2023-02-21 | 日商斯庫林集團股份有限公司 | Conveyor apparatus, light exposure device, and conveyance method |
| CN217421878U (en) * | 2021-12-31 | 2022-09-13 | 苏州恰克精密机械有限公司 | Aerostatic suspension sliding platform |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120704078A (en) * | 2025-08-21 | 2025-09-26 | 济南东星精密量仪有限公司 | An ultra-precision air-floating motion platform |
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| TW202438788A (en) | 2024-10-01 |
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