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TWI856545B - Electronic package and fabricating method thereof - Google Patents

Electronic package and fabricating method thereof Download PDF

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Publication number
TWI856545B
TWI856545B TW112108121A TW112108121A TWI856545B TW I856545 B TWI856545 B TW I856545B TW 112108121 A TW112108121 A TW 112108121A TW 112108121 A TW112108121 A TW 112108121A TW I856545 B TWI856545 B TW I856545B
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Taiwan
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layer
heat dissipation
coating layer
bump
circuit
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TW112108121A
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Chinese (zh)
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TW202437488A (en
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陳盈儒
陳敏堯
張垂弘
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大陸商芯愛科技(南京)有限公司
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Priority to TW112108121A priority Critical patent/TWI856545B/en
Priority to CN202310500353.7A priority patent/CN118645493B/en
Publication of TW202437488A publication Critical patent/TW202437488A/en
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Publication of TWI856545B publication Critical patent/TWI856545B/en

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    • H10W70/614
    • H10W40/22
    • H10W70/611
    • H10W70/65
    • H10W72/071
    • H10W74/01
    • H10W74/111
    • H10W95/00

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Wire Bonding (AREA)

Abstract

An electronic package is provided, in which heat dissipation bumps are embedded in an encapsulation layer to carry an electronic component, and a circuit structure is formed on the encapsulation layer and electrically connected to the heat dissipation bumps. Therefore, heat energy from the electronic component can be transferred to the circuit structure by the heat dissipation bumps and dissipated to the outside, so as to effectively ensure the heat dissipation capability of the electronic package.

Description

電子封裝件及其製法 Electronic packaging and its manufacturing method

本發明係有關一種半導體封裝技術,尤指一種具嵌埋元件之電子封裝件及其製法。 The present invention relates to a semiconductor packaging technology, in particular to an electronic package with embedded components and its manufacturing method.

目前應用於晶片封裝領域之技術,包含有例如晶片尺寸構裝(Chip Scale Package,簡稱CSP)、晶片直接貼附封裝(Direct Chip Attached,簡稱DCA)、雙側(double side)封裝或多晶片模組封裝(Multi-Chip Module,簡稱MCM)等型態的封裝方式。 The technologies currently used in the chip packaging field include chip scale package (CSP), direct chip attached (DCA), double side packaging or multi-chip module (MCM) packaging.

圖1係為習知半導體封裝件1之剖視圖。如圖1所示,該半導體封裝件1係為覆晶封裝型態,其包括一具有核心絕緣層15之封裝基板10、一藉由焊錫凸塊11設於該封裝基板10上之半導體晶片12、以及一用以包覆該半導體晶片12之包覆層13,以回焊該焊錫凸塊11而固定該半導體晶片12,其中,該封裝基板10係於該核心絕緣層15相對兩側均具有複數介電層100及設於該介電層100上之線路層101,且該核心絕緣層15係為雙順丁醯二酸醯亞胺/三氮阱(Bismaleimide triazine,簡稱BT)層,而形成該包覆層13之材質係為環氧樹脂封裝膠體(epoxy molding compound,簡稱EMC)。 FIG. 1 is a cross-sectional view of a conventional semiconductor package 1. As shown in FIG. 1 , the semiconductor package 1 is a flip-chip package type, which includes a package substrate 10 having a core insulation layer 15, a semiconductor chip 12 disposed on the package substrate 10 by a solder bump 11, and a coating layer 13 for coating the semiconductor chip 12 to reflow the solder bump 11 and fix the semiconductor chip 12, wherein the package substrate 10 has a plurality of dielectric layers 100 and a circuit layer 101 disposed on the dielectric layer 100 on opposite sides of the core insulation layer 15, and the core insulation layer 15 is bis(succinylidene)imide/trinitrogen trap (Bismaleimide triazine, BT for short) layer, and the material forming the coating layer 13 is epoxy molding compound (EMC for short).

然而,習知半導體封裝件1中,將該些半導體晶片12設於該封裝基板10之其中一側之介電層100之表面上,使該半導體封裝件1之厚度難以縮減,因而無法達到薄化之需求。 However, in the conventional semiconductor package 1, the semiconductor chips 12 are disposed on the surface of the dielectric layer 100 on one side of the package substrate 10, making it difficult to reduce the thickness of the semiconductor package 1, and thus failing to meet the thinning requirement.

再者,若將該封裝基板10移除該核心絕緣層15,以縮減該半導體封裝件1之厚度,則該封裝基板10容易因該介電層100之強度不足而發生翹曲。 Furthermore, if the core insulating layer 15 is removed from the package substrate 10 to reduce the thickness of the semiconductor package 1, the package substrate 10 is prone to warping due to the insufficient strength of the dielectric layer 100.

又,該半導體晶片12需藉由回焊該些焊錫凸塊11之製程以固定於該封裝基板10上,故當於進行回焊製程之高溫環境或其它熱循環製程時,該封裝基板10易因聚熱而使熱應力分布不均,導致該封裝基板10發生翹曲之問題。 In addition, the semiconductor chip 12 needs to be fixed on the package substrate 10 by reflowing the solder bumps 11. Therefore, when the reflow process is performed in a high temperature environment or other thermal cycle process, the package substrate 10 is prone to uneven distribution of thermal stress due to heat accumulation, resulting in the problem of warping of the package substrate 10.

因此,如何克服上述習知製法的種種問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the above-mentioned problems of the knowledge-based manufacturing method has become an issue that needs to be solved urgently.

鑑於上述習知技術之種種缺失,本發明係提供一種電子封裝件,係包括:包覆層,係具有相對之第一表面與第二表面;第一線路層,係形成於該包覆層之第一表面上;散熱凸塊,係嵌埋於該包覆層之第二表面內;電子元件,係嵌埋於該包覆層中且設於該散熱凸塊上;以及線路結構,係形成於該包覆層之第二表面上,其中,該線路結構係包含至少一形成於該包覆層上之絕緣層、及形成於該絕緣層上之第二線路層,以令該第二線路層電性連接該散熱凸塊,使該電子元件藉由該第二線路層與該散熱凸塊散熱,且形成該絕緣層之材質係為雙順 丁醯二酸醯亞胺/三氮阱(Bismaleimide triazine,簡稱BT)或味之素增層膜(Ajinomoto build-up film,簡稱ABF)。 In view of the above-mentioned deficiencies of the prior art, the present invention provides an electronic package, comprising: a coating layer having a first surface and a second surface opposite to each other; a first circuit layer formed on the first surface of the coating layer; a heat dissipation bump embedded in the second surface of the coating layer; an electronic component embedded in the coating layer and disposed on the heat dissipation bump; and a circuit structure formed on the coating layer. The circuit structure includes at least one insulating layer formed on the cladding layer and a second circuit layer formed on the insulating layer, so that the second circuit layer is electrically connected to the heat dissipation bump, so that the electronic component dissipates heat through the second circuit layer and the heat dissipation bump, and the material forming the insulating layer is Bismaleimide triazine (BT) or Ajinomoto build-up film (ABF).

本發明亦提供一種電子封裝件之製法,係包括:於一承載件之相對兩側上分別設置一承載基板,其中,該承載基板係具有至少一散熱凸塊;設置電子元件於該散熱凸塊上;形成一包覆層於該承載基板上,以包覆該散熱凸塊與該電子元件,其中,該包覆層係具有相對之第一表面與第二表面,以令該包覆層以其第二表面結合至該承載基板上;於該包覆層之第一表面上形成第一線路層,以形成封裝模組;移除該承載件及該承載基板,以獲取複數該封裝模組,並外露出該包覆層之第二表面,其中,該封裝模組係保留該散熱凸塊,以令該散熱凸塊外露於該包覆層之第二表面;於一支撐件之相對兩側分別設置該封裝模組,且各該封裝模組以其第一線路層壓合於該支撐件上,使該包覆層之第二表面朝外;於該包覆層之第二表面上形成一線路結構,其中,該線路結構係包含至少一形成於該包覆層上之絕緣層、及形成於該絕緣層上之第二線路層,以令該第二線路層電性連接該散熱凸塊,使該電子元件藉由該第二線路層與該散熱凸塊散熱,且形成該絕緣層之材質係為雙順丁醯二酸醯亞胺/三氮阱(Bismaleimide triazine,簡稱BT)或味之素增層膜(Ajinomoto build-up film,簡稱ABF);以及移除該支撐件。 The present invention also provides a method for manufacturing an electronic package, comprising: disposing a carrier substrate on two opposite sides of a carrier, wherein the carrier substrate has at least one heat dissipation bump; disposing an electronic component on the heat dissipation bump; forming a coating layer on the carrier substrate to cover the heat dissipation bump and the electronic component, wherein the coating layer has a first surface and a second surface opposite to each other, so that the coating layer is bonded to the carrier substrate with its second surface; forming a first circuit layer on the first surface of the coating layer to form a packaging module; removing the carrier and the carrier substrate to obtain a plurality of the packaging modules and exposing the second surface of the coating layer, wherein the packaging module is The heat dissipation bump is left so that the heat dissipation bump is exposed on the second surface of the coating layer; the packaging modules are respectively arranged on two opposite sides of a support member, and each packaging module is pressed onto the support member with its first circuit layer so that the second surface of the coating layer faces outward; a circuit structure is formed on the second surface of the coating layer, wherein the circuit structure is Containing at least one insulating layer formed on the encapsulation layer and a second circuit layer formed on the insulating layer, so that the second circuit layer is electrically connected to the heat dissipation bump, so that the electronic component dissipates heat through the second circuit layer and the heat dissipation bump, and the material forming the insulating layer is Bismaleimide triazine (BT) or Ajinomoto build-up film (ABF); and removing the support.

前述之電子封裝件及其製法中,該承載基板復具有複數導電凸塊,使該包覆層之第二表面內嵌埋有該複數導電凸塊,以令該第一線路層藉由導電體電性連接該複數導電凸塊。例如,該電子元件係藉由導線電性連接該導電凸塊。 In the aforementioned electronic package and its manufacturing method, the carrier substrate further has a plurality of conductive bumps, so that the second surface of the coating layer is embedded with the plurality of conductive bumps, so that the first circuit layer is electrically connected to the plurality of conductive bumps through a conductor. For example, the electronic element is electrically connected to the conductive bumps through a wire.

前述之電子封裝件及其製法中,該電子元件係藉由黏著層結合該散熱凸塊。 In the aforementioned electronic package and its manufacturing method, the electronic component is bonded to the heat sink bump via an adhesive layer.

前述之電子封裝件及其製法中,復包括形成絕緣保護層於該線路結構上,且該絕緣保護層外露出該第二線路層之部分表面,其中,該絕緣保護層具有填充材。 The aforementioned electronic package and its manufacturing method further include forming an insulating protective layer on the circuit structure, and the insulating protective layer exposes a portion of the surface of the second circuit layer, wherein the insulating protective layer has a filling material.

由上可知,本發明之電子封裝件及其製法,主要藉由將該電子元件嵌埋於該包覆層中,以節省該包覆層之第一表面上之使用空間,因而利於薄化該電子封裝件,故相較於習知技術,本發明之製法能薄化該電子封裝件,以符合微型化之需求。 As can be seen from the above, the electronic package and its manufacturing method of the present invention mainly save the use space on the first surface of the packaging layer by embedding the electronic component in the packaging layer, thereby facilitating the thinning of the electronic package. Therefore, compared with the conventional technology, the manufacturing method of the present invention can thin the electronic package to meet the needs of miniaturization.

再者,藉由該黏著層結合該電子元件,以取代習知覆晶用之焊錫凸塊及其回焊製程,故當該電子封裝件滿足微型化之需求時,能有效降低因高溫環境(或熱循環)所產生之翹曲風險。進一步,藉由該承載件與支撐件之使用,以進行兩次對稱式壓合作業,更能避免於製作該電子封裝件之過程中發生翹曲之問題。 Furthermore, by combining the electronic components with the adhesive layer to replace the conventional flip chip solder bumps and their reflow process, the risk of warping caused by high temperature environment (or thermal cycle) can be effectively reduced when the electronic package meets the requirements of miniaturization. Furthermore, by using the carrier and the support to perform two symmetrical pressing operations, the problem of warping during the manufacturing process of the electronic package can be avoided.

又,藉由將該散熱凸塊嵌埋於該包覆層中,使來自該電子元件之熱能可藉由該散熱凸塊導引至該第二線路層而散逸至外界,以有效確保該電子封裝件之散熱能力,故當該電子封裝件欲滿足微小化之需求時,該電子封裝件適用於薄化該絕緣層之設計,而不會因高溫環境(或熱循環)發生翹曲。 Furthermore, by embedding the heat dissipation bump in the coating layer, the heat energy from the electronic component can be guided to the second circuit layer through the heat dissipation bump and dissipated to the outside, so as to effectively ensure the heat dissipation capacity of the electronic package. Therefore, when the electronic package wants to meet the demand for miniaturization, the electronic package is suitable for the design of thinning the insulation layer, and will not bend due to high temperature environment (or thermal cycle).

另外,因該絕緣保護層具有填充材,以增強其韌性,故若該絕緣層需薄化時,藉由該絕緣保護層之強化設計以作為支撐結構,可避免該電子封裝件因應力收縮(shrinkage)或非對稱式構造(asymmetrical construction)等因素而發生翹曲。 In addition, since the insulating protective layer has a filler material to enhance its toughness, if the insulating layer needs to be thinned, the reinforcing design of the insulating protective layer can be used as a supporting structure to prevent the electronic package from warping due to factors such as shrinkage due to stress or asymmetrical construction.

1:半導體封裝件 1:Semiconductor packages

10:封裝基板 10: Packaging substrate

100:介電層 100: Dielectric layer

101:線路層 101: Circuit layer

11:焊錫凸塊 11: Solder bumps

12:半導體晶片 12: Semiconductor chip

13,23:包覆層 13,23: Coating layer

15:核心絕緣層 15: Core insulation layer

2,3:電子封裝件 2,3: Electronic packaging

2a:封裝模組 2a: Packaging module

20:承載基板 20: Carrier substrate

200:導電凸塊 200: Conductive bump

201:散熱凸塊 201: Heat dissipation bump

21:黏著層 21: Adhesive layer

22,32:電子元件 22,32: Electronic components

22a:作用面 22a: Action surface

22b:非作用面 22b: Non-active surface

220:電極墊 220:Electrode pad

23a:第一表面 23a: First surface

23b:第二表面 23b: Second surface

230,231:盲孔 230,231: Blind hole

24:第一線路層 24: First circuit layer

240,241:導電體 240,241: Conductor

25:線路結構 25: Circuit structure

250:絕緣層 250: Insulation layer

251,252:第二線路層 251,252: Second circuit layer

28:絕緣保護層 28: Insulation protective layer

280:開孔 280: Opening

29:導電元件 29: Conductive element

341:導線 341: Conductor

80:膠帶 80: Tape

9:承載件 9: Carrier

90:剝離層 90: Peeling layer

A:置晶區 A: Crystal placement area

圖1係為習知半導體封裝件之剖視示意圖。 Figure 1 is a schematic cross-sectional view of a conventional semiconductor package.

圖2A至圖2H係為本發明之電子封裝件之製法之剖面示意圖。 Figures 2A to 2H are cross-sectional schematic diagrams of the manufacturing method of the electronic package of the present invention.

圖2H-1係為圖2H之另一實施例之剖面示意圖。 Figure 2H-1 is a cross-sectional schematic diagram of another embodiment of Figure 2H.

圖3係為圖2H之其它實施例之剖面示意圖。 FIG3 is a cross-sectional schematic diagram of another embodiment of FIG2H.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The following is a specific and concrete example to illustrate the implementation of the present invention. People familiar with this technology can easily understand other advantages and effects of the present invention from the content disclosed in this manual.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「第一」、「第二」、「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structures, proportions, sizes, etc. depicted in the drawings attached to this specification are only used to match the contents disclosed in the specification for understanding and reading by people familiar with this technology, and are not used to limit the restrictive conditions for the implementation of the present invention. Therefore, they have no substantial technical significance. Any modification of the structure, change of the proportion relationship or adjustment of the size should still fall within the scope of the technical content disclosed by the present invention without affecting the effects and purposes that can be achieved by the present invention. At the same time, the terms such as "above", "first", "second", "one" etc. used in this specification are only for the convenience of description and are not used to limit the scope of implementation of the present invention. Changes or adjustments in their relative relationships shall also be regarded as the scope of implementation of the present invention without substantially changing the technical content.

圖2A至圖2H係為本發明之電子封裝件2之製法的剖面示意圖。 Figures 2A to 2H are cross-sectional schematic diagrams of the manufacturing method of the electronic package 2 of the present invention.

如圖2A所示,提供一承載件9,以於其相對兩側上分別設置一承載基板20,其中,該承載基板20係具有相鄰之複數導電凸塊200及一置晶區 A,且該置晶區A具有至少一間隔該導電凸塊200配置之散熱凸塊201。接著,設置一電子元件22於該承載基板20之置晶區A之散熱凸塊201上。 As shown in FIG. 2A , a carrier 9 is provided to respectively set a carrier substrate 20 on two opposite sides thereof, wherein the carrier substrate 20 has a plurality of adjacent conductive bumps 200 and a die-plating area A, and the die-plating area A has at least one heat dissipation bump 201 arranged to space the conductive bumps 200. Then, an electronic component 22 is set on the heat dissipation bump 201 of the die-plating area A of the carrier substrate 20.

於本實施例中,該承載件9係為暫時性可拆式核心載板,其可為相對兩側具有金屬層之板材,如銅箔基板,並於其金屬表面上形成剝離層90,使該承載基板20形成於該剝離層90上。 In this embodiment, the carrier 9 is a temporary removable core carrier, which can be a plate having metal layers on opposite sides, such as a copper foil substrate, and a peeling layer 90 is formed on its metal surface, so that the carrier substrate 20 is formed on the peeling layer 90.

再者,形成該承載基板20、散熱凸塊201及導電凸塊200之材質係為金屬材。例如,將一銅板進行蝕刻,以將該導電凸塊200與該散熱凸塊201一體成形於該承載基板20上。應可理解地,亦可於該承載基板20上額外增設凸塊,如電鍍或黏貼方式,並無特別限制。 Furthermore, the material forming the carrier substrate 20, the heat dissipation bump 201 and the conductive bump 200 is a metal material. For example, a copper plate is etched to integrally form the conductive bump 200 and the heat dissipation bump 201 on the carrier substrate 20. It should be understood that additional bumps can also be added to the carrier substrate 20, such as by electroplating or pasting, without any special restrictions.

又,該電子元件22係係為主動元件、被動元件或其二者組合,其中,該主動元件係例如半導體晶片,且該被動元件係例如電阻、電容或電感。例如,若該電子元件22為半導體晶片,其具有相對之作用面22a與非作用面22b,該作用面22a係具有複數電極墊220,且該電子元件22以其非作用面22b藉由黏著層21結合於該散熱凸塊201上。 Furthermore, the electronic component 22 is an active component, a passive component or a combination of the two, wherein the active component is, for example, a semiconductor chip, and the passive component is, for example, a resistor, a capacitor or an inductor. For example, if the electronic component 22 is a semiconductor chip, it has an active surface 22a and an inactive surface 22b opposite to each other, the active surface 22a has a plurality of electrode pads 220, and the electronic component 22 is bonded to the heat sink 201 with its inactive surface 22b through an adhesive layer 21.

另外,該黏著層21可為散熱膠材,如氧化矽(SiO2)或金屬膠,以利於將熱能從該電子元件22導熱至該散熱凸塊201上。 In addition, the adhesive layer 21 can be a heat dissipation adhesive material, such as silicon oxide (SiO 2 ) or metal adhesive, so as to facilitate heat transfer from the electronic component 22 to the heat dissipation bump 201 .

如圖2B所示,形成一包覆層23於該承載基板20上,以包覆該導電凸塊200、該散熱凸塊201、該電子元件22與該黏著層21。接著,於該包覆層23上形成複數外露出各該導電凸塊200之盲孔230。 As shown in FIG. 2B , a coating layer 23 is formed on the carrier substrate 20 to cover the conductive bump 200 , the heat dissipation bump 201 , the electronic component 22 and the adhesive layer 21 . Then, a plurality of blind holes 230 are formed on the coating layer 23 to expose each of the conductive bumps 200 .

於本實施例中,該包覆層23係具有相對之第一表面23a與第二表面23b,以令該包覆層23以其第二表面23b結合至該承載基板20上,並於該包 覆層23之第一表面23a上形成外露出該些導電凸塊200之複數盲孔230。例如,以雷射方式或其它方式形成該盲孔230。 In this embodiment, the cladding layer 23 has a first surface 23a and a second surface 23b opposite to each other, so that the cladding layer 23 is bonded to the carrier substrate 20 with its second surface 23b, and a plurality of blind holes 230 exposing the conductive bumps 200 are formed on the first surface 23a of the cladding layer 23. For example, the blind holes 230 are formed by laser or other methods.

再者,該電極墊220亦可外露於該包覆層23之第一表面23a。例如,亦可於對應該些電極墊220處以雷射方式或其它方式形成盲孔231,使該些盲孔231外露出該些電極墊220。或者,可藉由整平製程,如研磨方式,使該電極墊220與該包覆層23之第一表面23a齊平,以外露出該電極墊220。 Furthermore, the electrode pad 220 may also be exposed on the first surface 23a of the cladding layer 23. For example, blind holes 231 may be formed at the locations corresponding to the electrode pads 220 by laser or other methods, so that the blind holes 231 expose the electrode pads 220. Alternatively, the electrode pad 220 may be made flush with the first surface 23a of the cladding layer 23 by a leveling process, such as grinding, so that the electrode pad 220 is exposed.

又,形成該包覆層23之材質係為絕緣材,如聚醯亞胺(PI)、乾膜(dry film)、環氧樹脂封裝膠體(epoxy molding compound,簡稱EMC)或其它封裝材,其可用壓合(lamination)或模壓(molding)之方式形成於該承載基板20上。 In addition, the material forming the coating layer 23 is an insulating material, such as polyimide (PI), dry film, epoxy molding compound (EMC) or other packaging materials, which can be formed on the carrier substrate 20 by lamination or molding.

如圖2C所示,形成導電體240,241於該些盲孔230,231中,且形成第一線路層24於該導電體240,241上及該包覆層23之第一表面23a上,以形成封裝模組2a,使該第一線路層24透過該些導電體240,241電性連接各該導電凸塊200及各該電極墊220。 As shown in FIG. 2C , conductors 240 , 241 are formed in the blind holes 230 , 231 , and a first circuit layer 24 is formed on the conductors 240 , 241 and on the first surface 23a of the cladding layer 23 to form a package module 2a , so that the first circuit layer 24 is electrically connected to each of the conductive bumps 200 and each of the electrode pads 220 through the conductors 240 , 241 .

於本實施例中,藉由圖案化電鍍製程一併製作該導電體240,241與該第一線路層24,使該第一線路層24與該些導電體240,241一體成形。 In this embodiment, the conductors 240, 241 and the first circuit layer 24 are manufactured together by a patterned electroplating process, so that the first circuit layer 24 and the conductors 240, 241 are formed as one piece.

如圖2D所示,藉由剝離層90分開該承載件9與該封裝模組2a,再以如蝕刻或其它方式移除該承載基板20,以獲取複數封裝模組2a,並外露出該包覆層23之第二表面23b。 As shown in FIG. 2D , the carrier 9 and the package module 2a are separated by the peeling layer 90, and then the carrier substrate 20 is removed by etching or other methods to obtain a plurality of package modules 2a and expose the second surface 23b of the encapsulation layer 23.

於本實施例中,該封裝模組2a係保留該導電凸塊200與該散熱凸塊201,以令該導電凸塊200與該散熱凸塊201外露於該包覆層23之第二表面23b。 In this embodiment, the package module 2a retains the conductive bump 200 and the heat dissipation bump 201, so that the conductive bump 200 and the heat dissipation bump 201 are exposed on the second surface 23b of the encapsulation layer 23.

如圖2E所示,將該些封裝模組2a以壓合方式對稱形成於一支撐件8之相對兩側,且該封裝模組2a以其第一線路層24壓合於該支撐件8上。 As shown in FIG. 2E , the package modules 2a are symmetrically formed on opposite sides of a support member 8 by pressing, and the package module 2a is pressed onto the support member 8 with its first circuit layer 24.

於本實施例中,該支撐件8上具有膠帶80,以令該膠帶80包覆該第一線路層24,使該第一線路層24嵌埋於該膠帶80中,且該封裝模組2a之包覆層23之第二表面23b朝外。 In this embodiment, the support member 8 has a tape 80, so that the tape 80 covers the first circuit layer 24, so that the first circuit layer 24 is embedded in the tape 80, and the second surface 23b of the covering layer 23 of the packaging module 2a faces outward.

如圖2F所示,於各該封裝模組2a之包覆層23之第二表面23b上形成一線路結構25。 As shown in FIG. 2F , a circuit structure 25 is formed on the second surface 23b of the encapsulation layer 23 of each package module 2a.

於本實施例中,該線路結構25係包含至少一形成於該包覆層23上之絕緣層250、及形成於該絕緣層250上之第二線路層251,252,以令該第二線路層251,252電性連接該導電凸塊200與該散熱凸塊201。例如,採用增層法(build-up process)以電鍍金屬(如銅材)或其它方式製作該第二線路層251,252。應可理解地,利用增層法,該些線路結構25可依需求增設多層絕緣層,以製作多層線路層。 In this embodiment, the circuit structure 25 includes at least one insulating layer 250 formed on the cladding layer 23, and second circuit layers 251, 252 formed on the insulating layer 250, so that the second circuit layers 251, 252 are electrically connected to the conductive bump 200 and the heat sink bump 201. For example, the second circuit layers 251, 252 are manufactured by electroplating metal (such as copper) or other methods using a build-up process. It should be understood that, using the build-up process, the circuit structures 25 can add multiple insulating layers as needed to manufacture multiple circuit layers.

再者,形成該絕緣層250之材質係為雙順丁醯二酸醯亞胺/三氮阱(Bismaleimide triazine,簡稱BT)或味之素增層膜(Ajinomoto build-up film,簡稱ABF),其不同於形成該包覆層23之材質。例如,該絕緣層250若為BT,其熱膨脹係數(Coefficient of Thermal Expansion,簡稱CTE)為10~15ppm/℃,且該包覆層23若為EMC材,其CTE為6~10ppm/℃,故該絕緣層250之強度夠強,能避免因熱應力分佈不均而發生翹曲之問題。 Furthermore, the material forming the insulating layer 250 is Bismaleimide triazine (BT) or Ajinomoto build-up film (ABF), which is different from the material forming the coating layer 23. For example, if the insulating layer 250 is BT, its coefficient of thermal expansion (CTE) is 10~15ppm/℃, and if the coating layer 23 is EMC material, its CTE is 6~10ppm/℃, so the strength of the insulating layer 250 is strong enough to avoid the problem of warping caused by uneven distribution of thermal stress.

如圖2G所示,移除該支撐件8及該膠帶80,以獲取多個電子封裝件2。 As shown in FIG. 2G , the support member 8 and the tape 80 are removed to obtain a plurality of electronic packages 2.

於本實施例中,於移除該支撐件8及該膠帶80之前或之後,可依需求形成一如防焊層之絕緣保護層28於該線路結構25之最外側絕緣層250上,如圖2H所示,且外露出該第二線路層251,252之部分表面,供結合如焊球之導電元件29。例如,該絕緣保護層28之CTE係小於20ppm/℃,且該絕緣保護層28具有填充材,如氧化鋁(Al2O3)、氫氧化鋁(Al(OH)3)或如P-compound之其它聚合物,使該絕緣保護層28能滿足該線路結構25之細線路/細間距(L/S)之配線需求。 In this embodiment, before or after removing the support member 8 and the tape 80, an insulating protection layer 28 such as a solder mask can be formed on the outermost insulating layer 250 of the circuit structure 25 as required, as shown in Figure 2H, and a portion of the surface of the second circuit layer 251, 252 is exposed for bonding a conductive element 29 such as a solder ball. For example, the CTE of the insulating protective layer 28 is less than 20 ppm/°C, and the insulating protective layer 28 has a filler such as alumina (Al 2 O 3 ), aluminum hydroxide (Al(OH) 3 ) or other polymers such as P-compound, so that the insulating protective layer 28 can meet the wiring requirements of the fine line/fine space (L/S) of the circuit structure 25 .

再者,因該防焊層具有填充材之組成,可強化該絕緣保護層28,以增強其韌性(toughness),故當該線路結構25僅具有單一層絕緣層250時,如圖2H-1所示,藉由該絕緣保護層28支撐該絕緣層250,能避免該電子封裝件2因應力收縮(shrinkage)或非對稱式構造(asymmetrical construction)等因素而發生翹曲之問題。 Furthermore, since the solder mask has a filler composition, the insulating protective layer 28 can be strengthened to enhance its toughness. Therefore, when the circuit structure 25 has only a single insulating layer 250, as shown in FIG. 2H-1, the insulating protective layer 28 supports the insulating layer 250, thereby preventing the electronic package 2 from warping due to factors such as shrinkage or asymmetrical construction.

因此,若該絕緣層250需薄化時,藉由該絕緣保護層28能避免該電子封裝件2發生翹曲之問題,使該絕緣層250能盡量薄化,故該電子封裝件2能同時滿足薄化與避免翹曲之需求。 Therefore, if the insulating layer 250 needs to be thinned, the insulating protective layer 28 can prevent the electronic package 2 from warping, so that the insulating layer 250 can be thinned as much as possible, so that the electronic package 2 can simultaneously meet the requirements of thinning and avoiding warping.

又,該導電元件29係藉由該第二線路層251電性連接該導電凸塊200,而電性連接該散熱凸塊201之第二線路層252可不結合該導電元件29,如該絕緣保護層28之開孔280之處。 Furthermore, the conductive element 29 is electrically connected to the conductive bump 200 via the second circuit layer 251, and the second circuit layer 252 electrically connected to the heat sink bump 201 may not be combined with the conductive element 29, such as at the opening 280 of the insulating protection layer 28.

另外,於其它實施例中,如圖3所示之電子封裝件3,該電子元件32可採用打線方式藉由導線341電性連接該電極墊220與該導電凸塊200,因而可省略導電體241之相關製程。應可理解地,於其它實施例中(圖未示),該電子元件亦可藉由導線電性連接該散熱凸塊。 In addition, in other embodiments, such as the electronic package 3 shown in FIG. 3 , the electronic component 32 can be electrically connected to the electrode pad 220 and the conductive bump 200 by the wire 341 by wire bonding, so that the related process of the conductor 241 can be omitted. It should be understood that in other embodiments (not shown), the electronic component can also be electrically connected to the heat sink bump by a wire.

因此,本發明之製法主要藉由將該電子元件22,32嵌埋於該包覆層23中,以節省該包覆層23之第一表面23a上之使用空間,因而利於薄化該電子封裝件2,3,故相較於習知技術,本發明之製法能薄化該電子封裝件2,3,以符合微型化之需求。 Therefore, the manufacturing method of the present invention mainly embeds the electronic components 22, 32 in the coating layer 23 to save the use space on the first surface 23a of the coating layer 23, thereby facilitating the thinning of the electronic package 2, 3. Therefore, compared with the prior art, the manufacturing method of the present invention can thin the electronic package 2, 3 to meet the needs of miniaturization.

再者,藉由該黏著層21結合該電子元件22,32,以取代習知覆晶用之焊錫凸塊11及其回焊製程,故當該電子封裝件2,3滿足微型化之需求時,能有效降低因高溫環境(或熱循環)所產生之翹曲風險。進一步,藉由該承載件9與支撐件8之使用,以進行兩次對稱式壓合作業,更能避免於製作該電子封裝件2,3之過程中發生翹曲之問題。 Furthermore, by combining the electronic components 22, 32 with the adhesive layer 21, the conventional flip chip solder bumps 11 and their reflow process are replaced. Therefore, when the electronic packages 2, 3 meet the requirements of miniaturization, the risk of warping caused by high temperature environment (or thermal cycle) can be effectively reduced. Furthermore, by using the carrier 9 and the support 8 to perform two symmetrical pressing operations, the problem of warping during the manufacturing process of the electronic packages 2, 3 can be avoided.

又,藉由將該散熱凸塊201嵌埋於該包覆層23中,能優化散熱路徑,以提升散熱效果,故當該電子封裝件2,3欲滿足微小化之需求時,該電子封裝件2,3適用於薄化該絕緣層250之設計,而不會因高溫環境(或熱循環)發生翹曲。 Furthermore, by embedding the heat dissipation bump 201 in the coating layer 23, the heat dissipation path can be optimized to enhance the heat dissipation effect. Therefore, when the electronic package 2, 3 is to meet the demand for miniaturization, the electronic package 2, 3 is suitable for the design of thinning the insulating layer 250, and will not bend due to high temperature environment (or thermal cycle).

另外,來自該電子元件22之熱能可藉由該散熱凸塊201導引至該第二線路層252所對應之開孔280而散逸至外界,以有效確保該電子封裝件2,3之散熱能力。 In addition, the heat energy from the electronic component 22 can be guided to the opening 280 corresponding to the second circuit layer 252 through the heat dissipation bump 201 and dissipated to the outside, so as to effectively ensure the heat dissipation capacity of the electronic package 2, 3.

本發明復提供一種電子封裝件2,3,係包括:一包覆層23、第一線路層24、至少一散熱凸塊201、至少一電子元件22,32以及一線路結構25。 The present invention further provides an electronic package 2,3, comprising: a coating layer 23, a first circuit layer 24, at least one heat dissipation bump 201, at least one electronic component 22,32 and a circuit structure 25.

所述之包覆層23係具有相對之第一表面23a與第二表面23b。 The coating layer 23 has a first surface 23a and a second surface 23b opposite to each other.

所述之第一線路層24係形成於該包覆層23之第一表面23a上。 The first circuit layer 24 is formed on the first surface 23a of the cladding layer 23.

所述之散熱凸塊201係嵌埋於該包覆層23之第二表面23b內。 The heat dissipation bump 201 is embedded in the second surface 23b of the coating layer 23.

所述之電子元件22,32係嵌埋於該包覆層23中且設於該散熱凸塊201上。 The electronic components 22, 32 are embedded in the coating layer 23 and disposed on the heat dissipation bump 201.

所述之線路結構25係形成於該包覆層23之第二表面23b上,其中,該線路結構25係包含至少一形成於該包覆層23上之絕緣層250、及形成於該絕緣層250上之第二線路層251,252,以令該第二線路層252電性連接該散熱凸塊201,使該電子元件22,32藉由該第二線路層252與該散熱凸塊201散熱,且形成該絕緣層250之材質係為雙順丁醯二酸醯亞胺/三氮阱(Bismaleimide triazine,簡稱BT)或味之素增層膜(Ajinomoto build-up film,簡稱ABF)。 The circuit structure 25 is formed on the second surface 23b of the cladding layer 23, wherein the circuit structure 25 includes at least one insulating layer 250 formed on the cladding layer 23, and second circuit layers 251, 252 formed on the insulating layer 250, so that the second circuit layer 252 is electrically connected to the heat dissipation bump 201, so that the electronic components 22, 32 are heat-dissipated through the second circuit layer 252 and the heat dissipation bump 201, and the material forming the insulating layer 250 is Bismaleimide triazine (BT) or Ajinomoto build-up film (ABF).

於一實施例中,該包覆層23之第二表面23b內係嵌埋有複數導電凸塊200,以令該第一線路層24藉由導電體240電性連接該複數導電凸塊200。例如,該電子元件32係藉由導線341電性連接該導電凸塊200。 In one embodiment, a plurality of conductive bumps 200 are embedded in the second surface 23b of the cladding layer 23, so that the first circuit layer 24 is electrically connected to the plurality of conductive bumps 200 via the conductor 240. For example, the electronic element 32 is electrically connected to the conductive bump 200 via the wire 341.

於一實施例中,該電子元件22,32係藉由黏著層21結合該散熱凸塊201。 In one embodiment, the electronic components 22, 32 are bonded to the heat sink 201 via an adhesive layer 21.

於一實施例中,所述之電子封裝件2,3復包括一形成於該線路結構25上之絕緣保護層28,且外露出該第二線路層251,252之部分表面,其中,該絕緣保護層28具有填充材。 In one embodiment, the electronic package 2, 3 further includes an insulating protective layer 28 formed on the circuit structure 25, and partially exposes the surface of the second circuit layer 251, 252, wherein the insulating protective layer 28 has a filling material.

綜上所述,本發明之電子封裝件及其製法,係藉由將該電子元件嵌埋於該包覆層中,以節省該包覆層之第一表面上之使用空間,因而利於薄化該電子封裝件,故本發明之製法能薄化該電子封裝件,以符合微型化之需求。 In summary, the electronic package and its manufacturing method of the present invention embeds the electronic component in the coating layer to save the space on the first surface of the coating layer, thereby facilitating the thinning of the electronic package. Therefore, the manufacturing method of the present invention can thin the electronic package to meet the needs of miniaturization.

再者,藉由該黏著層結合該電子元件,以取代習知覆晶用之焊錫凸塊及其回焊製程,故當該電子封裝件滿足微型化之需求時,能有效降低因高溫環境(或熱循環)所產生之翹曲風險。進一步,藉由該承載件與支撐件之使用, 以進行兩次對稱式壓合作業,更能避免於製作該電子封裝件之過程中發生翹曲之問題。 Furthermore, by combining the electronic components with the adhesive layer, the conventional flip chip solder bumps and their reflow process are replaced. Therefore, when the electronic package meets the requirements of miniaturization, the risk of warping caused by high temperature environment (or thermal cycle) can be effectively reduced. Furthermore, by using the carrier and the support, two symmetrical pressing operations are performed to avoid the problem of warping in the process of manufacturing the electronic package.

又,藉由將該散熱凸塊嵌埋於該包覆層中,能優化散熱路徑,以提升散熱效果,故當該電子封裝件欲滿足微小化之需求時,該電子封裝件適用於薄化該絕緣層之設計,而不會因高溫環境(或熱循環)發生翹曲。 Furthermore, by embedding the heat dissipation bump in the coating layer, the heat dissipation path can be optimized to enhance the heat dissipation effect. Therefore, when the electronic package is to meet the demand for miniaturization, the electronic package is suitable for the design of thinning the insulation layer, and will not warp due to high temperature environment (or thermal cycle).

另外,來自該電子元件之熱能可藉由該散熱凸塊導引至該第二線路層所對應之開孔而散逸至外界,以有效確保該電子封裝件之散熱能力。 In addition, the heat energy from the electronic component can be guided to the opening corresponding to the second circuit layer through the heat dissipation bump and dissipated to the outside, so as to effectively ensure the heat dissipation capacity of the electronic package.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are used to illustrate the principles and effects of the present invention, but are not used to limit the present invention. Anyone familiar with this technology can modify the above embodiments without violating the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be as listed in the scope of the patent application described below.

2:電子封裝件 2: Electronic packaging components

200:導電凸塊 200: Conductive bump

201:散熱凸塊 201: Heat dissipation bump

21:黏著層 21: Adhesive layer

22:電子元件 22: Electronic components

23:包覆層 23: Coating layer

23a:第一表面 23a: First surface

23b:第二表面 23b: Second surface

24:第一線路層 24: First circuit layer

240,241:導電體 240,241: Conductor

25:線路結構 25: Circuit structure

250:絕緣層 250: Insulation layer

251,252:第二線路層 251,252: Second circuit layer

28:絕緣保護層 28: Insulation protective layer

280:開孔 280: Opening

29:導電元件 29: Conductive element

Claims (5)

一種電子封裝件之製法,係包括:於一承載件之相對兩側上分別設置一承載基板,其中,該承載基板係具有至少一散熱凸塊;設置電子元件於該散熱凸塊上;形成一包覆層於該承載基板上,以包覆該散熱凸塊與該電子元件,其中,該包覆層係具有相對之第一表面與第二表面,以令該包覆層以其第二表面結合至該承載基板上;於該包覆層之第一表面上形成第一線路層,以形成封裝模組;移除該承載件及該承載基板,以獲取複數該封裝模組,並外露出該包覆層之第二表面,其中,該封裝模組係保留該散熱凸塊,以令該散熱凸塊外露於該包覆層之第二表面;於一支撐件之相對兩側分別設置該封裝模組,且各該封裝模組以其第一線路層壓合於該支撐件上,使該包覆層之第二表面朝外;於該包覆層之第二表面上形成一線路結構,其中,該線路結構係包含至少一形成於該包覆層上之絕緣層、及形成於該絕緣層上之第二線路層,以令該第二線路層電性連接該散熱凸塊,使該電子元件藉由該第二線路層與該散熱凸塊散熱,且形成該絕緣層之材質係為雙順丁醯二酸醯亞胺/三氮阱或味之素增層膜;以及移除該支撐件。 A method for manufacturing an electronic package comprises: arranging a carrier substrate on two opposite sides of a carrier, wherein the carrier substrate has at least one heat dissipation bump; arranging an electronic component on the heat dissipation bump; forming a coating layer on the carrier substrate to cover the heat dissipation bump and the electronic component, wherein the coating layer has a first surface and a second surface opposite to each other, so that the coating layer is bonded to the carrier substrate with its second surface; forming a first circuit layer on the first surface of the coating layer to form a packaging module; removing the carrier and the carrier substrate to obtain a plurality of the packaging modules and exposing the second surface of the coating layer, wherein the packaging module retains the heat dissipation bump. The heat dissipation protrusion is exposed on the second surface of the coating layer; the packaging modules are respectively arranged on opposite sides of a support member, and each packaging module is pressed onto the support member with its first circuit layer so that the second surface of the coating layer faces outward; a circuit structure is formed on the second surface of the coating layer, wherein the circuit structure includes at least one shaped An insulating layer is formed on the coating layer, and a second circuit layer is formed on the insulating layer, so that the second circuit layer is electrically connected to the heat dissipation bump, so that the electronic component dissipates heat through the second circuit layer and the heat dissipation bump, and the material forming the insulating layer is bis(succinic acid) imide/trinitrogen trap or azobenzene build-up film; and the support is removed. 如請求項1所述之電子封裝件之製法,其中,該承載基板復具有複數導電凸塊,使該包覆層之第二表面內嵌埋有該複數導電凸塊,以令該第一線路層藉由導電體電性連接該複數導電凸塊。 The method for manufacturing an electronic package as described in claim 1, wherein the carrier substrate further has a plurality of conductive bumps, so that the second surface of the encapsulation layer is embedded with the plurality of conductive bumps, so that the first circuit layer is electrically connected to the plurality of conductive bumps through a conductive body. 如請求項1所述之電子封裝件之製法,其中,該電子元件係藉由導線電性連接該導電凸塊。 A method for manufacturing an electronic package as described in claim 1, wherein the electronic component is electrically connected to the conductive bump via a wire. 如請求項1所述之電子封裝件之製法,其中,該電子元件係藉由黏著層結合該散熱凸塊。 A method for manufacturing an electronic package as described in claim 1, wherein the electronic component is bonded to the heat sink bump via an adhesive layer. 如請求項1所述之電子封裝件之製法,復包括形成絕緣保護層於該線路結構上,且該絕緣保護層外露出該第二線路層之部分表面,其中,該絕緣保護層具有填充材。 The method for manufacturing an electronic package as described in claim 1 further includes forming an insulating protective layer on the circuit structure, and the insulating protective layer exposes a portion of the surface of the second circuit layer, wherein the insulating protective layer has a filling material.
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