TWI855198B - Optical film manufacturing method - Google Patents
Optical film manufacturing method Download PDFInfo
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- TWI855198B TWI855198B TW109143558A TW109143558A TWI855198B TW I855198 B TWI855198 B TW I855198B TW 109143558 A TW109143558 A TW 109143558A TW 109143558 A TW109143558 A TW 109143558A TW I855198 B TWI855198 B TW I855198B
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- Prior art keywords
- film
- film substrate
- liquid crystal
- coating
- main surface
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Classifications
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08J5/18—Manufacture of films or sheets
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- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
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- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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- B05D2252/02—Sheets of indefinite length
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2301/00—Handling processes for sheets or webs
- B65H2301/50—Auxiliary process performed during handling process
- B65H2301/51—Modifying a characteristic of handled material
- B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
- B65H2301/5114—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
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- B65H2701/17—Nature of material
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Landscapes
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- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Laminated Bodies (AREA)
- Polarising Elements (AREA)
Abstract
本發明之課題在於提供一種具備缺陷較少且均勻性優異之塗層之光學膜。 將於長條膜基材(1)之第一主面上可剝離地貼附保護膜(2)而成之積層體(8)沿著長度方向輥搬送至剝離部(10),於剝離部中,將保護膜自膜基材之第一主面剝離後,將塗液塗佈於膜基材之第一主面。保護膜之背面之表面電阻較佳為1×10 11Ω/sq以下。 The subject of the present invention is to provide an optical film with a coating having fewer defects and excellent uniformity. A laminate (8) formed by releasably attaching a protective film (2) to the first main surface of a long film substrate (1) is conveyed to a stripping section (10) along the length direction by rollers. In the stripping section, after the protective film is stripped from the first main surface of the film substrate, a coating liquid is applied to the first main surface of the film substrate. The surface resistance of the back side of the protective film is preferably less than 1×10 11 Ω/sq.
Description
本發明係關於一種光學膜之製造方法。The present invention relates to a method for manufacturing an optical film.
作為具有液晶顯示裝置之光學補償、有機EL(Electroluminescence,電致發光)元件之抗外界光反射等功能之光學膜,使用有薄型塗膜。厚度較小之膜之自持性較低,難以單獨進行處理,因此於塑膠膜等支持體上塗佈溶液而形成塗層,於使塗層密接於支持體上之狀態下進行乾燥、加工。As an optical film with functions such as optical compensation for liquid crystal display devices and anti-external light reflection for organic EL (Electroluminescence) elements, a thin coating is used. Thin films have low self-sustaining properties and are difficult to handle alone, so a solution is applied to a support such as a plastic film to form a coating, and the coating is dried and processed in a state where it is in close contact with the support.
例如於專利文獻1中,揭示有一種於支持體上塗佈樹脂溶液形成樹脂塗層,將支持體與塗層之積層體延伸而製作積層相位差膜之方法。於專利文獻2中,揭示有一種將延伸膜作為支持體,於其上塗佈液晶組合物,沿著膜之延伸方向(配向方向)使液晶化合物沿面配向,而製作配向液晶層之方法。 [先前技術文獻] [專利文獻] For example, Patent Document 1 discloses a method of preparing a laminated phase difference film by coating a resin solution on a support to form a resin coating, and stretching the laminate of the support and the coating. Patent Document 2 discloses a method of preparing an aligned liquid crystal layer by coating a liquid crystal composition on a stretched film as a support, and aligning the liquid crystal compound along the stretching direction (alignment direction) of the film. [Prior Art Document] [Patent Document]
[專利文獻1]日本專利特開2004-46068號公報 [專利文獻2]WO2016/121856號 [Patent document 1] Japanese Patent Publication No. 2004-46068 [Patent document 2] WO2016/121856
[發明所欲解決之問題][The problem the invention is trying to solve]
於一面利用卷對卷法將作為支持體之膜基材沿著長度方向搬送一面於其上塗佈溶液而形成塗層之方法中,若膜基材上存在傷痕,則會導致傷痕轉印至塗層、或液晶分子之配向不良等缺陷。又,由於膜基材之表面狀態會導致塗佈不良,故存在塗層之膜厚或光學特性變得不均勻之情形。 [解決問題之技術手段] In a method of forming a coating by conveying a film substrate as a support in the longitudinal direction using a roll-to-roll method and coating a solution thereon, if there are scratches on the film substrate, the scratches may be transferred to the coating or the liquid crystal molecules may have poor alignment. In addition, since the surface condition of the film substrate may cause poor coating, the film thickness or optical properties of the coating may become uneven. [Technical means to solve the problem]
本發明之一實施方式係長條光學膜之製造方法,於具有第一主面及第二主面之長條膜基材之第一主面上形成塗層。首先,準備於長條膜基材之第一主面上可剝離地貼附保護膜而成之積層體。將該積層體沿著膜基材之長度方向輥搬送至剝離部(第一搬送步驟),於剝離部中,將保護膜自膜基材之第一主面剝離(保護膜剝離步驟)。將剝離保護膜後之膜基材沿著膜基材之長度方向自剝離部搬送至塗佈部(第二搬送步驟),於塗佈部中,於膜基材之第一主面上塗佈塗(塗佈步驟),獲得於膜基材之第一主面上具備塗層之積層體。One embodiment of the present invention is a method for manufacturing a long optical film, wherein a coating is formed on the first main surface of a long film substrate having a first main surface and a second main surface. First, a laminate is prepared in which a protective film is releasably attached to the first main surface of the long film substrate. The laminate is conveyed to a peeling section by a roller along the length direction of the film substrate (a first conveying step), and in the peeling section, the protective film is peeled off from the first main surface of the film substrate (a protective film peeling step). The film substrate after the protective film is peeled off is transported from the peeling section to the coating section along the length direction of the film substrate (second transporting step), and in the coating section, the coating is applied on the first main surface of the film substrate (coating step), thereby obtaining a laminate having a coating on the first main surface of the film substrate.
塗液亦可為包含液晶化合物之液晶組合物。液晶組合物還可包含光硬化性之液晶化合物。亦可於膜基材上塗佈包含光硬化性之液晶化合物之液晶組合物後,使液晶化合物光硬化。The coating liquid may also be a liquid crystal composition containing a liquid crystal compound. The liquid crystal composition may also contain a photocurable liquid crystal compound. The liquid crystal composition containing a photocurable liquid crystal compound may also be coated on a film substrate and then the liquid crystal compound may be photocured.
膜基材可為具有使液晶分子於特定方向上配向之配向限制力者。膜基材例如可為與長度方向不平行地配向有分子之延伸膜,亦可為斜延伸膜。The film substrate may have an alignment restraining force that allows the liquid crystal molecules to align in a specific direction. For example, the film substrate may be a stretched film in which the molecules are aligned non-parallel to the longitudinal direction, or may be an oblique stretched film.
保護膜之背面(與膜基材之貼合面之相反側之面)之表面電阻R較佳為1×10 11Ω/sq以下。於剝離角度180°、剝離速度10 m/分鐘之條件下,將保護膜自膜基材剝離時之剝離力F較佳為1.5 N/50 mm以下。上述之表面電阻R與剝離力F較佳為滿足log 10R+2.3F≦11.5之關係。 The surface resistance R of the back side of the protective film (the side opposite to the film substrate bonding side) is preferably 1×10 11 Ω/sq or less. Under the conditions of a peeling angle of 180° and a peeling speed of 10 m/min, the peeling force F when peeling the protective film from the film substrate is preferably 1.5 N/50 mm or less. The surface resistance R and the peeling force F preferably satisfy the relationship of log 10 R+2.3F≦11.5.
光學膜可為於塗層上以卷對卷積層有其他光學層者。積層於塗層上之光學層亦可包含偏光元件。光學膜可為積層塗層與偏光元件而成之圓偏光板。 [發明之效果]The optical film may be a film having other optical layers laminated on the coating in a roll-to-roll manner. The optical layer laminated on the coating may also include a polarizing element. The optical film may be a circular polarizing plate formed by laminating coatings and polarizing elements. [Effect of the invention]
由於暫時黏有保護膜直至於膜基材上即將塗佈塗液之前,故由輥搬送導致之膜基材上之傷痕產生得到抑制。又,由於暫時黏於膜基材之保護膜之背面之表面電阻、及膜基材與保護膜之接著力(剝離力)較小,故於剝離保護膜後由膜基材之帶電等導致之塗佈不良之產生得到抑制。因此,可獲得由膜基材導致之傷痕或條紋等缺陷較少之塗層。Since the protective film is temporarily attached to the film substrate just before the coating liquid is applied, the scratches on the film substrate caused by roller conveyance are suppressed. In addition, since the surface resistance of the back side of the protective film temporarily attached to the film substrate and the adhesion force (peeling force) between the film substrate and the protective film are small, the coating defects caused by the electrification of the film substrate after the protective film is peeled off are suppressed. Therefore, a coating with fewer defects such as scratches or stripes caused by the film substrate can be obtained.
[步驟之概要] 於本發明中,於長條膜基材之一主面上塗佈溶液而形成塗層。圖1係於膜基材1之第一主面1A上設置塗層3而成之光學膜9的剖視圖。圖2係於膜基材1之第一主面1A上可剝離地貼附保護膜2而成之積層體8的剖視圖。 [Overview of the steps] In the present invention, a solution is applied to one main surface of a long film substrate to form a coating. FIG1 is a cross-sectional view of an optical film 9 formed by providing a coating 3 on the first main surface 1A of a film substrate 1. FIG2 is a cross-sectional view of a laminate 8 formed by releasably attaching a protective film 2 to the first main surface 1A of a film substrate 1.
圖3係表示於膜基材1上形成塗層3之製膜裝置及製膜步驟之概要之概念圖。圖3中,於捲出輥81上纏繞有將積層體8之長條膜捲繞成卷狀後所得之捲繞體80。自捲繞體80捲出之積層體8向沿著搬送輥83、85、87形成之搬送路徑之下游側連續地移動,而被搬送至剝離部10(第一搬送步驟)。FIG3 is a conceptual diagram showing an outline of a film forming apparatus and film forming steps for forming a coating layer 3 on a film substrate 1. In FIG3, a roll 80 obtained by winding a long film of a laminate 8 into a roll shape is wound around a roll-out roll 81. The laminate 8 rolled out from the roll 80 continuously moves to the downstream side along the conveying path formed by conveying rolls 83, 85, and 87, and is conveyed to the stripping section 10 (first conveying step).
於剝離部10,將保護膜2自膜基材1剝離(剝離步驟)。藉由剝離保護膜2,膜基材1之第一主面1A露出。將剝離保護膜後之膜基材1自剝離部10搬送至塗佈部30(第二搬送步驟)。於塗佈部30中,將塗液塗佈於膜基材1之第一主面1A上(塗佈步驟)。In the peeling section 10, the protective film 2 is peeled off from the film substrate 1 (peeling step). By peeling off the protective film 2, the first main surface 1A of the film substrate 1 is exposed. The film substrate 1 after the protective film is peeled off is transported from the peeling section 10 to the coating section 30 (second transporting step). In the coating section 30, the coating liquid is coated on the first main surface 1A of the film substrate 1 (coating step).
將於膜基材1之第一主面1A上形成塗層3而成之積層體9(光學膜)利用捲取輥91進行捲取,藉此可獲得長條光學膜之捲繞體90。於塗佈部30與捲取輥91之間,亦可利用加熱部50進行加熱。於塗液包含光聚合性液晶化合物等光聚合性之成分之情形時,亦可於硬化部60實施光硬化。The laminate 9 (optical film) formed by forming the coating layer 3 on the first main surface 1A of the film substrate 1 is rolled up by a roll 91, thereby obtaining a long optical film roll 90. The coating liquid 30 and the roll 91 may be heated by a heating unit 50. When the coating liquid contains a photopolymerizable component such as a photopolymerizable liquid crystal compound, light curing may be performed in a curing unit 60.
於一面利用卷對卷搬送膜基材一面塗佈溶液之情形時,因與搬送輥之接觸及摩擦,而容易於膜基材上產生沿著長度方向之傷痕。若膜基材上存在傷痕,則於其上形成塗層時,膜基材之傷痕會轉印至塗層,有可能導致光學缺陷。又,於膜基材上塗佈有液晶組合物之情形時,液晶分子容易沿著傷痕之延伸方向進行配向,有可能導致配向不良缺陷。When the film substrate is conveyed by roll-to-roll while the solution is applied, scratches along the length direction are easily generated on the film substrate due to contact and friction with the conveying roller. If there are scratches on the film substrate, when a coating is formed thereon, the scratches on the film substrate will be transferred to the coating, which may cause optical defects. In addition, when a liquid crystal composition is applied on the film substrate, the liquid crystal molecules are easily aligned along the extension direction of the scratches, which may cause poor alignment defects.
於本發明之實施方式中,膜基材1之第一主面1A上可剝離地貼附有保護膜2。由於在自捲出輥81到達剝離部10之期間(第一搬送步驟),於膜基材1之第一主面1A上貼附有保護膜2,故於第一搬送步驟中,膜基材1之第一主面1A不與搬送輥87直接接觸。由於自膜基材1剝離保護膜2後即刻於膜基材1之第一主面1A上塗佈塗液,故可防止與搬送輥87接觸所導致之膜基材之第一主面上之傷痕產生,可抑制傷痕轉印至塗層3或液晶分子之配向不良。In the embodiment of the present invention, the protective film 2 is releasably attached to the first main surface 1A of the film substrate 1. Since the protective film 2 is attached to the first main surface 1A of the film substrate 1 during the period from the unwinding roller 81 to the stripping section 10 (the first conveying step), the first main surface 1A of the film substrate 1 does not directly contact the conveying roller 87 in the first conveying step. Since the coating liquid is applied to the first main surface 1A of the film substrate 1 immediately after the protective film 2 is stripped from the film substrate 1, the generation of scratches on the first main surface of the film substrate caused by contact with the conveying roller 87 can be prevented, and the transfer of the scratches to the coating layer 3 or the poor alignment of the liquid crystal molecules can be suppressed.
於本實施方式中,由於自膜基材1剝離保護膜2後即刻實施塗佈,故將剝離部10與塗佈部30接近地配置,第二搬送步驟中之膜基材之搬送路徑較短。因此,存在膜基材與保護膜之貼合狀態、或於剝離部10自膜基材剝離保護膜時之靜電等物理作用對塗佈部30中之塗液之塗佈產生影響的情形。具體而言,將塗層厚度較小之區域形成為於寬度方向上延伸之條紋狀,於將光學膜應用於圖像顯示裝置時,存在被視認為條紋狀不均之情形。In this embodiment, since coating is performed immediately after the protective film 2 is peeled off from the film substrate 1, the peeling section 10 and the coating section 30 are arranged close to each other, and the conveying path of the film substrate in the second conveying step is short. Therefore, there is a situation where the bonding state of the film substrate and the protective film, or the physical effect such as static electricity when the peeling section 10 peels off the protective film from the film substrate, affects the coating of the coating liquid in the coating section 30. Specifically, when the area with a smaller coating thickness is formed into a stripe shape extending in the width direction, there is a situation where the stripe shape is seen as uneven when the optical film is applied to an image display device.
於本發明之一實施方式中,保護膜2之背面2A之表面電阻為1×10 11Ω/sq以下。由於保護膜2之表面電阻較小,故上述於寬度方向上延伸之條紋狀不均之產生得到抑制。 In one embodiment of the present invention, the surface resistance of the back surface 2A of the protective film 2 is less than 1×10 11 Ω/sq. Since the surface resistance of the protective film 2 is small, the generation of the stripe-like unevenness extending in the width direction is suppressed.
於剝離保護膜後即刻於膜基材上塗佈塗液時,對塗層上產生條紋狀不均之試樣進行分析,結果於剝離塗層後之膜基材上未發現厚度不均或物理變形。因此,認為形成於膜基材上之塗層之條紋狀厚度不均係由在膜基材之表面塗佈塗液時之收縮導致。When the coating liquid was applied on the film substrate immediately after the protective film was peeled off, the sample with stripe-like unevenness on the coating layer was analyzed. The results showed that no thickness unevenness or physical deformation was found on the film substrate after the coating layer was peeled off. Therefore, it is believed that the stripe-like uneven thickness of the coating layer formed on the film substrate is caused by the shrinkage of the coating liquid when it is applied on the surface of the film substrate.
由於保護膜2之背面2A之表面電阻較小,故膜基材1與保護膜2之貼合時之內部帶電得到減少。因此,剝離保護膜2後,膜基材1之帶電亦較少,於膜基材1之第一主面1A上塗佈塗液時之收縮得到抑制,認為可防止塗佈不良導致之條紋狀厚度不均之產生。Since the surface resistance of the back surface 2A of the protective film 2 is small, the internal charge of the film substrate 1 and the protective film 2 is reduced when they are attached. Therefore, after the protective film 2 is peeled off, the charge of the film substrate 1 is also reduced, and the shrinkage when the coating liquid is applied on the first main surface 1A of the film substrate 1 is suppressed, which is considered to prevent the occurrence of stripe-like thickness unevenness caused by poor coating.
保護膜2之背面2A之表面電阻越小,則越呈如下趨勢,即於膜基材1上形成之塗層3上產生條紋狀不均得到抑制。保護膜2之背面2A之表面電阻較佳為1×10 10Ω/sq以下,更佳為5×10 9Ω/sq以下,進而較佳為1×10 9Ω/sq以下,亦可為5×10 8Ω/sq以下。表面電阻通常為1×10 3Ω/sq以上,亦可為1×10 4Ω/sq以上、或1×10 5Ω/sq以上。 The smaller the surface resistance of the back surface 2A of the protective film 2, the more the occurrence of stripe-like unevenness on the coating layer 3 formed on the film substrate 1 is suppressed. The surface resistance of the back surface 2A of the protective film 2 is preferably 1×10 10 Ω/sq or less, more preferably 5×10 9 Ω/sq or less, further preferably 1×10 9 Ω/sq or less, and may be 5×10 8 Ω/sq or less. The surface resistance is usually 1×10 3 Ω/sq or more, and may be 1×10 4 Ω/sq or more, or 1×10 5 Ω/sq or more.
自膜基材1之第一主面1A剝離保護膜2時之剝離力存在對表面性造成影響之情形。自膜基材1剝離保護膜2時之剝離力較佳為1.5 N/50 mm以下,更佳為1.0 N/50 mm以下,進而較佳為0.8 N/50 mm以下。剝離力係於剝離試驗中之測定值,上述剝離試驗係於剝離角度180°、拉伸速度10 m/分鐘之條件下自膜基材剝離保護膜。The peeling force when peeling the protective film 2 from the first main surface 1A of the film substrate 1 may affect the surface properties. The peeling force when peeling the protective film 2 from the film substrate 1 is preferably 1.5 N/50 mm or less, more preferably 1.0 N/50 mm or less, and further preferably 0.8 N/50 mm or less. The peeling force is a measured value in a peeling test, and the above peeling test is to peel the protective film from the film substrate under the conditions of a peeling angle of 180° and a tensile speed of 10 m/min.
出於減少塗佈不良之考量,剝離力越小則越佳。又,出於抑制自膜基材剝離保護膜時之快速移動之考量,亦較佳為剝離力較小。另一方面,若剝離力過小,則於輥搬送膜基材與保護膜之積層體時,存在保護膜無意地自膜基材剝離而導致搬送不良之情形。因此,自膜基材剝離保護膜時之剝離力較佳為0.05 N/50 mm以上,更佳為0.1 N/50 mm以上,進而較佳為0.15 N/50 mm以上,亦可為0.2 N/50 mm以上。In order to reduce coating defects, the smaller the peeling force, the better. In addition, in order to suppress the rapid movement when peeling the protective film from the film substrate, the peeling force is also preferably smaller. On the other hand, if the peeling force is too small, when the roll conveys the laminate of the film substrate and the protective film, there is a situation where the protective film is accidentally peeled off from the film substrate, resulting in poor conveying. Therefore, the peeling force when peeling the protective film from the film substrate is preferably 0.05 N/50 mm or more, more preferably 0.1 N/50 mm or more, and further preferably 0.15 N/50 mm or more, and can also be 0.2 N/50 mm or more.
呈保護膜2之背面2A之表面電阻R越小,且自膜基材1剝離保護膜2時之剝離力F越小,則越抑制膜基材導致之塗佈不良之趨勢。表面電阻R(Ω/sq)與剝離力F(N/50 mm)較佳為滿足下述式(1)。 log 10R+2.3F≦11.5 (1) The smaller the surface resistance R of the back side 2A of the protective film 2 and the smaller the peeling force F when peeling the protective film 2 from the film substrate 1, the more the tendency of coating failure caused by the film substrate is suppressed. The surface resistance R (Ω/sq) and the peeling force F (N/50 mm) preferably satisfy the following formula (1). log 10 R+2.3F≦11.5 (1)
呈表面電阻R及剝離力F越小,log 10R+2.3F之值變得越小,從而越為抑制塗佈不良之趨勢。log 10R+2.3F之值較佳為11.0以下,更佳為10.5以下,亦可為10.3以下。 The smaller the surface resistance R and the peeling force F are, the smaller the value of log 10 R+2.3F becomes, thereby suppressing the tendency of coating defects. The value of log 10 R+2.3F is preferably 11.0 or less, more preferably 10.5 or less, and may be 10.3 or less.
[材料] 以下,對本實施方式中所使用之各材料進行說明。 [Materials] Below, the materials used in this implementation are described.
<塗液> 塗佈於膜基材1上之塗液係包含構成塗層3之固形物成分(溶質)、及使固形物成分溶解、分散之溶劑的溶液。作為固形物成分,可使用各種樹脂材料或液晶材料。 <Coating liquid> The coating liquid applied to the film substrate 1 is a solution containing a solid component (solute) constituting the coating layer 3 and a solvent for dissolving and dispersing the solid component. As the solid component, various resin materials or liquid crystal materials can be used.
作為塗層之樹脂材料,可例舉:乙醯纖維素等纖維素系樹脂、聚酯系樹脂、聚碳酸酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、順丁烯二醯亞胺系樹脂、聚烯烴系樹脂、(甲基)丙烯酸系樹脂、環狀聚烯烴樹脂(降𦯉烯系樹脂)、聚芳酯系樹脂、聚苯乙烯系樹脂、聚乙烯醇系樹脂、聚碸系樹脂等。Examples of the resin material for the coating include cellulose resins such as acetyl cellulose, polyester resins, polycarbonate resins, polyamide resins, polyimide resins, butylene imide resins, polyolefin resins, (meth)acrylic resins, cyclic polyolefin resins (northene resins), polyarylate resins, polystyrene resins, polyvinyl alcohol resins, polysulfone resins, and the like.
將包含液晶化合物之液晶組合物塗佈於膜基材1上,使液晶化合物於特定方向上配向,其後,固定配向狀態,藉此形成液晶分子於特定方向上配向之塗層(液晶層)。A liquid crystal composition containing a liquid crystal compound is coated on a film substrate 1 to align the liquid crystal compound in a specific direction, and then the alignment state is fixed to form a coating layer (liquid crystal layer) in which liquid crystal molecules are aligned in a specific direction.
作為液晶化合物,可例舉棒狀液晶化合物及圓盤狀液晶化合物等。自藉由膜基材之配向限制力而容易沿面配向之方面考慮,液晶化合物較佳為棒狀液晶化合物。棒狀液晶化合物可為主鏈型液晶,亦可為側鏈型液晶。棒狀液晶化合物可為液晶聚合物,亦可為聚合性液晶化合物之聚合物。若聚合前之液晶化合物(單體)呈現液晶性,則聚合後亦可不呈現液晶性。As the liquid crystal compound, rod-shaped liquid crystal compounds and disc-shaped liquid crystal compounds can be exemplified. From the perspective of easy surface alignment due to the alignment restriction force of the film substrate, the liquid crystal compound is preferably a rod-shaped liquid crystal compound. The rod-shaped liquid crystal compound can be a main chain liquid crystal or a side chain liquid crystal. The rod-shaped liquid crystal compound can be a liquid crystal polymer or a polymer of a polymerizable liquid crystal compound. If the liquid crystal compound (monomer) before polymerization exhibits liquid crystal properties, it may not exhibit liquid crystal properties after polymerization.
液晶化合物較佳為藉由加熱而呈現液晶性之熱致型液晶。熱致型液晶隨著溫度變化而發生結晶相、液晶相、各向同性相之相轉移。液晶組合物中所含之液晶化合物可為向列型液晶、層列型液晶、及膽固醇型液晶中之任一種。亦可於向列型液晶中添加手性劑,以使其具有膽固醇型配向性。The liquid crystal compound is preferably a thermotropic liquid crystal that exhibits liquid crystal properties by heating. Thermotropic liquid crystal undergoes phase transitions between a crystalline phase, a liquid crystal phase, and an isotropic phase as the temperature changes. The liquid crystal compound contained in the liquid crystal composition may be any one of a nematic liquid crystal, a lamellar liquid crystal, and a cholesteric liquid crystal. A chiral agent may also be added to the nematic liquid crystal to give it a cholesteric orientation.
作為呈現熱致性之棒狀液晶化合物,可例舉:甲亞胺類、氧偶氮類、氰基聯苯類、氰基苯酯類、苯甲酸酯類、環己烷羧酸苯酯類、氰基苯基環己烷類、經氰基取代之苯基嘧啶類、經烷氧基取代之苯基嘧啶類、苯基二㗁烷類、二苯乙炔類、烯基環己基苯甲腈類等。Examples of the thermotropic rod-shaped liquid crystal compound include azomethines, oxyazos, cyanobiphenyls, cyanophenyl esters, benzoates, cyclohexanecarboxylic acid phenyl esters, cyanophenylcyclohexanes, cyano-substituted phenylpyrimidines, alkoxy-substituted phenylpyrimidines, phenyldioxanes, tolans, and alkenylcyclohexylbenzonitriles.
作為聚合性液晶化合物,例如可例舉:使用聚合物黏合劑而能夠固定棒狀液晶化合物之配向狀態的聚合性液晶化合物;具有藉由聚合能夠固定液晶化合物之配向狀態之聚合性官能基的聚合性液晶化合物等。其中,較佳為具有光硬化性官能基之光硬化性液晶化合物。Examples of polymerizable liquid crystal compounds include polymerizable liquid crystal compounds that can fix the alignment of rod-shaped liquid crystal compounds using a polymer binder, polymerizable liquid crystal compounds having polymerizable functional groups that can fix the alignment of liquid crystal compounds by polymerization, etc. Among them, photocurable liquid crystal compounds having photocurable functional groups are preferred.
光硬化性液晶化合物(液晶單體)於1分子中具有液晶原基與至少1個光硬化性官能基。液晶單體呈現液晶性之溫度(液晶相轉移溫度)較佳為40~200℃,更佳為50~150℃,進而較佳為55~100℃。The photocurable liquid crystal compound (liquid crystal monomer) has a mesogen group and at least one photocurable functional group in one molecule. The temperature at which the liquid crystal monomer exhibits liquid crystallinity (liquid crystal phase transition temperature) is preferably 40 to 200°C, more preferably 50 to 150°C, and further preferably 55 to 100°C.
作為液晶單體之液晶原基,可例舉:聯苯基、苯基苯甲酸酯基、苯基環己烷基、氧偶氮苯基、甲亞胺基、偶氮苯基、苯基嘧啶基、二苯基乙炔基、二苯基苯甲酸酯基、聯環己烷基、環己基苯基、聯三苯基等環狀結構。該等環狀單元之末端可具有氰基、烷基、烷氧基、鹵基等取代基。Examples of the mesogen group of the liquid crystal monomer include cyclic structures such as biphenyl, phenylbenzoate, phenylcyclohexyl, oxyazophenyl, azomethine, azophenyl, phenylpyrimidinyl, diphenylethynyl, diphenylbenzoate, bicyclohexyl, cyclohexylphenyl, and terphenyl. The ends of these cyclic units may have substituents such as cyano, alkyl, alkoxy, and halogen.
作為光硬化性官能基,可例舉(甲基)丙烯醯基、環氧基、乙烯醚基等。其中,較佳為(甲基)丙烯醯基。光硬化性液晶單體較佳為於1分子中具有2個以上之光硬化性官能基者。藉由使用含有2個以上之光硬化性官能基之液晶單體,而於光硬化後之液晶層導入交聯結構,因此有光學膜之耐久性提昇之趨勢。As the photocurable functional group, (meth)acryl, epoxy, vinyl ether, etc. can be cited. Among them, (meth)acryl is preferred. The photocurable liquid crystal monomer preferably has two or more photocurable functional groups in one molecule. By using a liquid crystal monomer containing two or more photocurable functional groups, a cross-linked structure is introduced into the liquid crystal layer after photocuring, so there is a trend that the durability of the optical film is improved.
作為光硬化性液晶單體,可採用任意適當之液晶單體。例如可例舉國際公開第00/37585號、美國專利第5211877號、美國專利第4388453號、國際公開第93/22397號、歐洲專利第0261712號、德國專利第19504224號、德國專利第4408171號、英國專利第2280445號、日本專利特開2017-206460號公報、國際公開第2014/126113號、國際公開第2016/114348號、國際公開第2014/010325號、日本專利特開2015-200877號公報、日本專利特開2010-31223號公報、國際公開第2011/050896號、日本專利特開2011-207765號公報、日本專利特開2010-31223號公報、日本專利特開2010-270108號公報、國際公開第2008/119427號、日本專利特開2008-107767號公報、日本專利特開2008-273925號公報、國際公開第2016/125839號、日本專利特開2008-273925號公報等中記載之化合物。藉由選擇液晶單體,亦可調整雙折射之呈現性、或延遲之波長色散。As the photocurable liquid crystal monomer, any appropriate liquid crystal monomer may be used. For example, International Publication No. 00/37585, U.S. Patent No. 5211877, U.S. Patent No. 4388453, International Publication No. 93/22397, European Patent No. 0261712, German Patent No. 19504224, German Patent No. 4408171, British Patent No. 2280445, Japanese Patent Publication No. 2017-206460, International Publication No. 2014/126113, International Publication No. 2016/114348, International Publication No. 2014/010325, Japanese Patent Publication No. 2015-20087 7, Japanese Patent Publication No. 2010-31223, International Publication No. 2011/050896, Japanese Patent Publication No. 2011-207765, Japanese Patent Publication No. 2010-31223, Japanese Patent Publication No. 2010-270108, International Publication No. 2008/119427, Japanese Patent Publication No. 2008-107767, Japanese Patent Publication No. 2008-273925, International Publication No. 2016/125839, Japanese Patent Publication No. 2008-273925, etc. By selecting the liquid crystal monomer, the appearance of birefringence or the wavelength dispersion of delay can also be adjusted.
於液晶組合物中,除液晶單體以外,還可包含控制液晶單體向特定方向配向之化合物。例如,藉由使液晶組合物包含側鏈型液晶聚合物,可使液晶化合物(單體)垂直配向。又,藉由於液晶組合物中添加手性劑,可使液晶化合物膽固醇型配向。In addition to the liquid crystal monomer, the liquid crystal composition may also contain a compound that controls the liquid crystal monomer to align in a specific direction. For example, by making the liquid crystal composition contain a side-chain liquid crystal polymer, the liquid crystal compound (monomer) can be aligned vertically. In addition, by adding a chiral agent to the liquid crystal composition, the liquid crystal compound can be aligned in a cholesterol-type manner.
液晶組合物可含有光聚合起始劑。於藉由紫外線照射使液晶單體硬化之情形時,為了促進光硬化,液晶組合物較佳為含有藉由光照射會生成自由基之光聚合起始劑(光自由基產生劑)。亦可根據液晶單體之種類(光硬化性官能基之種類),使用光陽離子產生劑或光陰離子產生劑。光聚合起始劑之使用量相對於液晶單體100重量份為0.01~10重量份左右。除光聚合起始劑以外,還可使用增感劑等。The liquid crystal composition may contain a photopolymerization initiator. When the liquid crystal monomer is cured by ultraviolet irradiation, in order to promote photocuring, the liquid crystal composition preferably contains a photopolymerization initiator (photoradical generator) that generates free radicals by light irradiation. Depending on the type of liquid crystal monomer (type of photocurable functional group), a photocation generator or a photoanion generator may be used. The amount of the photopolymerization initiator used is about 0.01 to 10 parts by weight relative to 100 parts by weight of the liquid crystal monomer. In addition to the photopolymerization initiator, a sensitizer may also be used.
藉由將液晶單體、視需要之各種配向控制劑、及聚合起始劑等與溶劑加以混合,可製備液晶組合物。The liquid crystal composition can be prepared by mixing a liquid crystal monomer, various alignment control agents as needed, and a polymerization initiator with a solvent.
(溶劑) 塗液之溶劑只要能夠使溶質溶解且不會侵蝕基板(或侵蝕性較低),則無特別限定,可例舉:氯仿、二氯甲烷、四氯化碳、二氯乙烷、四氯乙烷、三氯乙烯、四氯乙烯、氯苯、鄰二氯苯等鹵代烴類;苯酚、對氯苯酚等苯酚類;苯、甲苯、二甲苯、甲氧基苯、1,2-二甲氧基苯等芳香族烴類;丙酮、甲基乙基酮、甲基異丁基酮、環己酮、環戊酮、2-吡咯啶酮、N-甲基-2-吡咯啶酮等酮系溶劑;乙酸乙酯、乙酸丁酯等酯系溶劑;第三丁醇、甘油、乙二醇、三乙二醇、乙二醇單甲醚、二乙二醇二甲醚、丙二醇、二丙二醇、2-甲基-2,4-戊二醇等醇系溶劑;二甲基甲醯胺、二甲基乙醯胺等胺系溶劑;乙腈、丁腈等腈系溶劑;二乙醚、二丁醚、四氫呋喃等醚系溶劑;乙基賽路蘇、丁基賽路蘇等。亦可使用2種以上之溶劑之混合溶劑。 (Solvent) The solvent of the coating liquid is not particularly limited as long as it can dissolve the solute and does not corrode the substrate (or has low corrosiveness). Examples include: chloroform, dichloromethane, carbon tetrachloride, dichloroethane, tetrachloroethane, trichloroethylene, tetrachloroethylene, chlorobenzene, o-dichlorobenzene and other halogenated hydrocarbons; phenols such as phenol and p-chlorophenol; aromatic hydrocarbons such as benzene, toluene, xylene, methoxybenzene, 1,2-dimethoxybenzene; acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, cyclopentanone, 2-pyridine Ketone solvents such as pyrrolidone and N-methyl-2-pyrrolidone; ester solvents such as ethyl acetate and butyl acetate; alcohol solvents such as tert-butyl alcohol, glycerol, ethylene glycol, triethylene glycol, ethylene glycol monomethyl ether, diethylene glycol dimethyl ether, propylene glycol, dipropylene glycol, 2-methyl-2,4-pentanediol; amine solvents such as dimethylformamide and dimethylacetamide; nitrile solvents such as acetonitrile and butyronitrile; ether solvents such as diethyl ether, dibutyl ether, tetrahydrofuran; ethyl thiocyanate, butyl thiocyanate, etc. A mixed solvent of two or more solvents may also be used.
塗液之固形物成分濃度通常為5~60重量%左右。塗液亦可含有界面活性劑或調平劑等添加劑。The solid content concentration of the coating liquid is usually about 5 to 60% by weight. The coating liquid may also contain additives such as surfactants and leveling agents.
<膜基材> 藉由使用長條膜基材1作為基板,可利用卷對卷實施自塗液之塗佈至乾燥為止之一連串步驟。於塗液為液晶組合物之情形時,塗佈後之液晶分子之配向處理或光硬化等操作亦可於膜基材1上作為一連串步驟而實施。又,將形成於膜基材1上之塗層3貼合於其他基材之步驟亦可藉由卷對卷來實施,因此可提昇光學膜之生產性。 <Film substrate> By using a long film substrate 1 as a substrate, a series of steps from coating to drying of the coating liquid can be implemented by roll-to-roll. When the coating liquid is a liquid crystal composition, the alignment treatment or photocuring of the liquid crystal molecules after coating can also be implemented as a series of steps on the film substrate 1. In addition, the step of bonding the coating layer 3 formed on the film substrate 1 to other substrates can also be implemented by roll-to-roll, thereby improving the productivity of the optical film.
膜基材1之寬度較佳為30 cm以上,亦可為50 cm以上、80 cm以上、100 cm以上或120 cm以上。就光學膜之生產性之觀點而言,膜基材1之寬度越大則越佳,通常為500 cm以下,亦可為400 cm以下或300 cm以下。膜基材之長度較佳為100 m以上,亦可為300 m以上、500 m以上、800 m以上、1000 m以上或1200 m以上。膜基材1之長度之上限並無特別限定,通常為10000 m以下,亦可為7000 m以下或5000 m以下。膜基材1之厚度較佳為10~200 μm左右。The width of the film substrate 1 is preferably 30 cm or more, and may be 50 cm or more, 80 cm or more, 100 cm or more, or 120 cm or more. From the perspective of the productivity of the optical film, the larger the width of the film substrate 1, the better, and it is usually 500 cm or less, and may be 400 cm or less, or 300 cm or less. The length of the film substrate is preferably 100 m or more, and may be 300 m or more, 500 m or more, 800 m or more, 1000 m or more, or 1200 m or more. There is no particular upper limit to the length of the film substrate 1, and it is usually 10,000 m or less, and may be 7,000 m or less, or 5,000 m or less. The thickness of the film substrate 1 is preferably about 10 to 200 μm.
構成膜基材1之樹脂材料只要不會溶解於塗液之溶劑,且可耐受乾燥、配向處理、硬化等處理,則並無特別限定,可例舉:聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯;聚乙烯、聚丙烯等聚烯烴;降𦯉烯系聚合物等環狀聚烯烴;二乙醯纖維素、三乙醯纖維素等纖維素系聚合物;丙烯酸系聚合物;苯乙烯系聚合物;聚碳酸酯、聚醯胺、聚醯亞胺等。The resin material constituting the film substrate 1 is not particularly limited as long as it does not dissolve in the solvent of the coating liquid and can withstand drying, orientation treatment, hardening and other treatments. Examples thereof include: polyesters such as polyethylene terephthalate and polyethylene naphthalate; polyolefins such as polyethylene and polypropylene; cyclic polyolefins such as norolefin polymers; cellulose polymers such as diacetyl cellulose and triacetyl cellulose; acrylic polymers; styrene polymers; polycarbonate, polyamide, polyimide, etc.
包含聚烯烴、環狀聚烯烴、丙烯酸系聚合物等疏水性樹脂材料之膜在與保護膜2貼合時容易產生內部帶電,有可能導致在剝離保護膜後塗佈塗液時之塗佈不良。如上所述,藉由使用背面2A(與膜基材1之貼合面之相反側之面)之表面電阻較小之保護膜2,內部帶電得到抑制,因此即便於使用疏水性樹脂膜作為膜基材1之情形時,亦可防止塗佈不良。Films made of hydrophobic resin materials such as polyolefin, cyclic polyolefin, and acrylic polymer are prone to internal charging when attached to the protective film 2, which may cause poor coating when applying the coating liquid after peeling off the protective film. As described above, by using a protective film 2 with a small surface resistance on the back side 2A (the side opposite to the surface attached to the film substrate 1), internal charging is suppressed, so that even when a hydrophobic resin film is used as the film substrate 1, poor coating can be prevented.
膜基材1亦可具有用於使液晶分子於特定方向上配向之配向限制力。例如,膜基材1亦可為於第一主面具備配向膜者。配向膜只要根據液晶化合物之種類或基板之材質等來適當選擇適宜之配向膜即可。作為用以使液晶分子於特定方向上沿面配向之配向膜,可例舉對聚醯亞胺系或聚乙烯醇系配向膜進行摩擦處理後所獲得者。又,亦可使用光配向膜。亦可不設置配向膜而對樹脂膜進行摩擦處理。The film substrate 1 may also have an alignment restriction force for aligning the liquid crystal molecules in a specific direction. For example, the film substrate 1 may also be provided with an alignment film on the first main surface. The alignment film may be selected appropriately according to the type of liquid crystal compound or the material of the substrate. As an alignment film for aligning the liquid crystal molecules along the surface in a specific direction, a film obtained by rubbing a polyimide or polyvinyl alcohol alignment film may be cited. In addition, a photoalignment film may also be used. It is also possible to rub the resin film without providing an alignment film.
膜基材1亦可具備用以使液晶分子垂直配向之配向膜。作為用於形成垂直配向性之配向膜(垂直配向膜)之配向劑,可例舉:卵磷脂、硬脂酸、溴化十六烷基三甲基銨、十八烷基胺鹽酸鹽、單羧酸鉻錯合物、矽烷偶合劑或矽氧烷化合物等有機矽烷、全氟二甲基環己烷、四氟乙烯、聚四氟乙烯等。The film substrate 1 may also have an alignment film for vertically aligning the liquid crystal molecules. Examples of the alignment agent for forming the vertically oriented alignment film (vertical alignment film) include lecithin, stearic acid, cetyltrimethylammonium bromide, octadecylamine hydrochloride, monocarboxylic acid chromium complex, silane coupling agent or organic silane such as siloxane compound, perfluorodimethylcyclohexane, tetrafluoroethylene, polytetrafluoroethylene, etc.
亦可使用延伸膜作為膜基材1。於延伸膜中,構成膜之樹脂材料(聚合物)於延伸方向上配向,並且該延伸膜具有使液晶分子沿著延伸方向配向之作用。藉由使用延伸膜,即便於膜基材上不形成配向膜之情形時,亦可具有用以使液晶分子於特定方向上配向之配向限制力。由於無需形成配向膜,故可減少光學膜之製造成本。又,藉由不設置配向膜,可防止由摩擦氣體導致之污染或配向不良。A stretch film can also be used as the film substrate 1. In the stretch film, the resin material (polymer) constituting the film is aligned in the stretching direction, and the stretch film has the function of aligning the liquid crystal molecules along the stretching direction. By using the stretch film, even when the alignment film is not formed on the film substrate, it can have an alignment restriction force for aligning the liquid crystal molecules in a specific direction. Since there is no need to form an alignment film, the manufacturing cost of the optical film can be reduced. In addition, by not providing an alignment film, contamination or poor alignment caused by friction gas can be prevented.
延伸膜之延伸方向(聚合物之配向方向)並無特別限定,可與膜基材之長度方向平行,亦可與膜基材之長度方向不平行。藉由使用與長度方向不平行地配向有分子之延伸膜,可形成與長度方向不平行地配向有液晶分子之液晶層作為塗層3。The stretching direction of the stretch film (alignment direction of the polymer) is not particularly limited and may be parallel to the length direction of the film substrate or may be non-parallel to the length direction of the film substrate. By using a stretch film in which molecules are aligned non-parallel to the length direction, a liquid crystal layer in which liquid crystal molecules are aligned non-parallel to the length direction can be formed as the coating layer 3.
延伸膜之延伸倍率只要為可發揮配向限制力之程度即可,例如為1.1倍~5倍左右。延伸膜亦可為雙軸延伸膜。即便為雙軸延伸膜,只要使用縱向與橫向之延伸倍率不同者,便可使液晶分子沿著延伸倍率較大之方向配向。The stretching ratio of the stretching film can be any level that can exert the alignment restraining force, for example, about 1.1 to 5 times. The stretching film can also be a biaxial stretching film. Even if it is a biaxial stretching film, as long as the longitudinal and transverse stretching ratios are different, the liquid crystal molecules can be aligned along the direction with the larger stretching ratio.
延伸膜亦可為斜延伸膜。斜延伸膜在與長度方向既不平行亦不正交之方向(例如相對於長度方向為10~80°之方向)上具有配向軸,因此藉由使用斜延伸膜作為膜基材1,可形成在與長度方向既不平行亦不正交之方向上配向有液晶分子之液晶層。The stretched film may also be an oblique stretched film. The oblique stretched film has an alignment axis in a direction that is neither parallel nor orthogonal to the longitudinal direction (e.g., a direction that is 10 to 80 degrees relative to the longitudinal direction). Therefore, by using the oblique stretched film as the film substrate 1, a liquid crystal layer having liquid crystal molecules aligned in a direction that is neither parallel nor orthogonal to the longitudinal direction can be formed.
<保護膜> 暫時黏於膜基材1之第一主面1A之保護膜2如圖2所示,較佳為於芯材291之一面具有黏著劑層292。保護膜2亦可於芯材291之背面(與黏著劑層形成面相反側之面)具備防靜電層295。 <Protective film> As shown in FIG. 2, the protective film 2 temporarily adhered to the first main surface 1A of the film substrate 1 preferably has an adhesive layer 292 on one side of the core material 291. The protective film 2 may also have an antistatic layer 295 on the back side of the core material 291 (the side opposite to the side where the adhesive layer is formed).
(芯材) 保護膜2之芯材291只要具有可撓性即可,其材料並無特別限定,可使用金屬箔或樹脂膜等。自材料廉價且加工性優異之方面考慮,較佳為樹脂膜。作為構成芯材291之樹脂材料之具體例,可例舉上文中作為膜基材1之樹脂材料所述者。芯材291亦可為延伸膜。芯材291之厚度並無特別限定。要想兼具自持性與可撓性,芯材291之厚度較佳為10~100 μm左右。 (Core material) The core material 291 of the protective film 2 is not particularly limited as long as it is flexible, and metal foil or resin film can be used. Considering that the material is cheap and has excellent processability, a resin film is preferred. As a specific example of the resin material constituting the core material 291, the resin material described above as the film substrate 1 can be cited. The core material 291 can also be a stretched film. The thickness of the core material 291 is not particularly limited. In order to have both self-sustaining properties and flexibility, the thickness of the core material 291 is preferably about 10 to 100 μm.
(黏著劑層) 黏著劑層292只要能夠貼附於膜基材1且能夠自膜基材1剝離即可,可由一般之黏著帶等中所使用之黏著劑所構成。作為保護膜2,亦可使用自黏著性膜,其係將構成芯材291之樹脂材料與黏著劑層292之樹脂材料藉由多層擠壓而一體成型後所得。 (Adhesive layer) The adhesive layer 292 can be formed of an adhesive used in a general adhesive tape, etc., as long as it can be attached to the film substrate 1 and can be peeled off from the film substrate 1. As the protective film 2, a self-adhesive film can also be used, which is obtained by integrally molding the resin material constituting the core material 291 and the resin material of the adhesive layer 292 through multi-layer extrusion.
構成黏著劑層292之黏著劑之組成並無特別限定,可適當選擇使用以丙烯酸系聚合物、聚矽氧系聚合物、聚酯、聚胺基甲酸酯、聚醯胺、聚乙烯醚、乙酸乙烯酯/氯乙烯共聚物、改性聚烯烴、環氧系、氟系、天然橡膠、合成橡膠等橡膠系等聚合物作為基礎聚合物者。尤其是自容易調整接著力(剝離力)、作為被黏著體之膜基材1上之糊劑殘留較少之方面考慮,可較佳地使用以丙烯酸系聚合物作為基礎聚合物之丙烯酸系黏著劑。The composition of the adhesive constituting the adhesive layer 292 is not particularly limited, and an adhesive having an acrylic polymer, a silicone polymer, a polyester, a polyurethane, a polyamide, a polyvinyl ether, a vinyl acetate/vinyl chloride copolymer, a modified polyolefin, an epoxy, a fluorine, a natural rubber, a synthetic rubber, or other rubber-based polymer as a base polymer can be appropriately selected and used. In particular, from the perspective of easy adjustment of the adhesion (peeling force) and less adhesive residue on the film substrate 1 as the adherend, an acrylic adhesive having an acrylic polymer as a base polymer can be preferably used.
作為丙烯酸系基礎聚合物,適宜使用以(甲基)丙烯酸烷基酯之單體單元作為主骨架之聚合物。作為(甲基)丙烯酸烷基酯,適宜使用烷基之碳數為1~20之(甲基)丙烯酸烷基酯。相對於構成基礎聚合物之單體成分總量,(甲基)丙烯酸烷基酯之含量較佳為40重量%以上,更佳為50重量%以上,進而較佳為60重量%以上。丙烯酸系聚合物可為複數種(甲基)丙烯酸烷基酯之共聚物。構成單體單元之排列可為無規,亦可為嵌段。As the acrylic base polymer, a polymer having a monomer unit of alkyl (meth)acrylate as the main skeleton is preferably used. As the alkyl (meth)acrylate, an alkyl (meth)acrylate having an alkyl carbon number of 1 to 20 is preferably used. The content of the alkyl (meth)acrylate is preferably 40% by weight or more, more preferably 50% by weight or more, and further preferably 60% by weight or more relative to the total amount of the monomer components constituting the base polymer. The acrylic polymer may be a copolymer of a plurality of alkyl (meth)acrylates. The arrangement of the constituent monomer units may be random or block.
丙烯酸系基礎聚合物較佳為含有具有能夠交聯之官能基之單體成分作為共聚成分。作為具有能夠交聯之官能基之單體,可例舉含羥基單體、或含羧基單體。其中,作為基礎聚合物之共聚成分,較佳為含有(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸4-羥基丁酯等含羥基單體。基礎聚合物之羥基或羧基會成為與交聯劑反應之反應點。藉由向基礎聚合物中導入交聯結構,黏著劑之凝聚力提高,表現出對作為被黏著體之膜基材之適度接著力,並且有自膜基材1剝離保護膜2時之剝離力降低之趨勢。The acrylic base polymer preferably contains a monomer component having a functional group capable of crosslinking as a copolymer component. As the monomer having a functional group capable of crosslinking, a hydroxyl-containing monomer or a carboxyl-containing monomer can be cited. Among them, as the copolymer component of the base polymer, it is preferably a hydroxyl-containing monomer such as (meth) ethyl acrylate and (meth) butyl acrylate. The hydroxyl group or carboxyl group of the base polymer will become a reaction point for reacting with the crosslinking agent. By introducing a crosslinking structure into the base polymer, the cohesive force of the adhesive is improved, showing a moderate adhesion to the film substrate as the adherend, and there is a tendency for the peeling force to decrease when the protective film 2 is peeled off from the film substrate 1.
基礎聚合物之分子量係以黏著劑層292具有所期望之接著力之方式進行適當調整,例如,聚苯乙烯換算之重量平均分子量為5萬~200萬左右,較佳為7萬~180萬左右,更佳為10萬~150萬左右,進而較佳為20萬~100萬左右。再者,於向基礎聚合物中導入交聯結構之情形時,較佳為導入交聯結構前之基礎聚合物之分子量為上述範圍。The molecular weight of the base polymer is appropriately adjusted so that the adhesive layer 292 has the desired adhesion. For example, the weight average molecular weight converted to polystyrene is about 50,000 to 2 million, preferably about 70,000 to 1.8 million, more preferably about 100,000 to 1.5 million, and further preferably about 200,000 to 1 million. Furthermore, when a cross-linking structure is introduced into the base polymer, it is preferred that the molecular weight of the base polymer before the cross-linking structure is introduced is within the above range.
以調整黏著劑層292之接著力等為目的,亦可向基礎聚合物中導入交聯結構。例如藉由向使基礎聚合物聚合後之溶液中添加交聯劑並視需要進行加熱,從而導入交聯結構。A cross-linking structure may be introduced into the base polymer for the purpose of adjusting the adhesion of the adhesive layer 292. For example, a cross-linking agent may be added to a solution of the polymerized base polymer and the solution may be heated as necessary to introduce the cross-linking structure.
作為交聯劑,可例舉:異氰酸酯系交聯劑、環氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、碳二醯亞胺系交聯劑、金屬螯合物系交聯劑等。其中,自與基礎聚合物之羥基或羧基之反應性較高而容易導入交聯結構之方面考慮,較佳為異氰酸酯系交聯劑及環氧系交聯劑。交聯劑之使用量只要根據基礎聚合物之組成或分子量、目標接著特性等來適當調整即可。要想使黏著劑具有適度之凝聚力且將自被黏著體剝離保護膜時之剝離力調整為適當之範圍,相對於基礎聚合物100重量份,交聯劑之使用量較佳為0.5重量份以上,更佳為1重量份以上,進而較佳為1.5重量份以上。要想對被黏著體具有適度之接著性,相對於基礎聚合物100重量份,交聯劑之使用量較佳為20重量份以下,更佳為15重量份以下,進而較佳為10重量份以下。Examples of the crosslinking agent include isocyanate crosslinking agents, epoxy crosslinking agents, oxazoline crosslinking agents, aziridine crosslinking agents, carbodiimide crosslinking agents, and metal chelate crosslinking agents. Among them, isocyanate crosslinking agents and epoxy crosslinking agents are preferred because of their high reactivity with the hydroxyl or carboxyl groups of the base polymer and the ease of introducing a crosslinking structure. The amount of the crosslinking agent used can be appropriately adjusted according to the composition or molecular weight of the base polymer, the target bonding properties, and the like. In order to make the adhesive have a moderate cohesive force and adjust the peeling force when peeling the protective film from the adherend to a suitable range, the amount of the crosslinking agent used is preferably 0.5 parts by weight or more, more preferably 1 part by weight or more, and further preferably 1.5 parts by weight or more, relative to 100 parts by weight of the base polymer. In order to have a moderate adhesion to the adherend, the amount of the crosslinking agent used is preferably 20 parts by weight or less, more preferably 15 parts by weight or less, and further preferably 10 parts by weight or less, relative to 100 parts by weight of the base polymer.
藉由向基礎聚合物中導入交聯結構,有黏著劑之凝膠分率上升,隨著黏性行為之減少而自被黏著體剝離保護膜時之剝離力變小之趨勢。黏著劑層292之凝膠分率較佳為70.0%以上,更佳為80.0%以上,進而較佳為90.0%以上。若黏著劑層292之凝膠分率過大,則存在對被黏著體之潤濕性降低,接著力變得不充分之情形。因此,黏著劑層292之凝膠分率較佳為99%以下,更佳為98%以下。凝膠分率可以於乙酸乙酯等溶劑中之不溶分之形式求出,具體而言,可求出將黏著劑層於乙酸乙酯中於23℃下浸漬7天後之不溶成分相對於浸漬前之試樣之重量分率(單位:重量%)。通常,聚合物之凝膠分率與交聯度相等,聚合物中之經交聯之部分越多,凝膠分率變得越大。By introducing a cross-linked structure into the base polymer, the gel fraction of the adhesive increases, and as the viscous behavior decreases, the peeling force when peeling the protective film from the adherend tends to decrease. The gel fraction of the adhesive layer 292 is preferably 70.0% or more, more preferably 80.0% or more, and further preferably 90.0% or more. If the gel fraction of the adhesive layer 292 is too large, the wettability to the adherend is reduced, and the adhesion becomes insufficient. Therefore, the gel fraction of the adhesive layer 292 is preferably 99% or less, and more preferably 98% or less. The gel fraction can be obtained as the insoluble content in solvents such as ethyl acetate. Specifically, the weight fraction (unit: weight %) of the insoluble content of the adhesive layer after immersion in ethyl acetate at 23°C for 7 days relative to the sample before immersion can be obtained. Generally, the gel fraction of a polymer is equal to the degree of crosslinking. The more crosslinked parts in the polymer, the greater the gel fraction.
黏著劑層292亦可含有矽烷偶合劑、黏著性賦予劑、塑化劑、軟化劑、防劣化劑、填充劑、著色劑、紫外線吸收劑、抗氧化劑、界面活性劑、抗靜電劑等添加劑。The adhesive layer 292 may also contain additives such as silane coupling agents, adhesive imparting agents, plasticizers, softeners, anti-degradation agents, fillers, colorants, ultraviolet absorbers, antioxidants, surfactants, antistatic agents, etc.
黏著劑層292之厚度並無特別限定,要想兼顧對被黏著體之接著力、與自被黏著體剝離之剝離性,黏著劑層292之厚度較佳為1~50 μm,更佳為2~40 μm,進而較佳為3~35 μm。有黏著劑層292之厚度越小,自被黏著體剝離之剝離性越為提昇之趨勢。The thickness of the adhesive layer 292 is not particularly limited. In order to take into account both the adhesion to the adherend and the peeling property from the adherend, the thickness of the adhesive layer 292 is preferably 1 to 50 μm, more preferably 2 to 40 μm, and further preferably 3 to 35 μm. There is a trend that the smaller the thickness of the adhesive layer 292, the better the peeling property from the adherend.
(防靜電層) 保護膜2較佳為於芯材291之背面具備防靜電層295。藉由具備防靜電層,保護膜2之背面2A之表面電阻變小,因此可抑制膜基材1與保護膜2之積層體之內部帶電。又,藉由使保護膜2具備防靜電層295,可防止自膜基材1剝離保護膜2時膜基材1帶電,可抑制因靜電而塵埃附著於膜基材1、或塗佈不良。 (Antistatic layer) The protective film 2 preferably has an antistatic layer 295 on the back side of the core material 291. By having the antistatic layer, the surface resistance of the back side 2A of the protective film 2 becomes smaller, so that the internal charging of the laminate of the film substrate 1 and the protective film 2 can be suppressed. In addition, by providing the protective film 2 with the antistatic layer 295, the film substrate 1 can be prevented from being charged when the protective film 2 is peeled off from the film substrate 1, and dust adhesion to the film substrate 1 due to static electricity or coating defects can be suppressed.
作為防靜電層,例如可例舉使黏合劑樹脂含有防靜電成分所形成之層。作為黏合劑樹脂,可採用熱硬化型樹脂、紫外線硬化型樹脂、電子束硬化型樹脂、二液混合型樹脂等各種類型之樹脂。作為防靜電成分,可例舉有機或無機之導電性物質、各種抗靜電劑等。作為有機導電性物質,可例舉聚苯胺、聚吡咯、聚噻吩、聚伸乙基亞胺、烯丙基胺系聚合物等導電性聚合物。作為無機導電性物質,可例舉各種金屬、合金、導電性金屬氧化物。無機導電性物質較佳為以粒徑為0.1 μm以下(具有代表性的是0.01 μm~0.1 μm)之微粒子之形式含於防靜電層中。防靜電成分可為陽離子型抗靜電劑、陰離子型抗靜電劑、兩性離子型抗靜電劑、非離子型抗靜電劑等。As an antistatic layer, for example, a layer formed by making the adhesive resin contain an antistatic component can be cited. As the adhesive resin, various types of resins such as thermosetting resins, ultraviolet curing resins, electron beam curing resins, and two-liquid mixed resins can be used. As antistatic components, organic or inorganic conductive substances, various antistatic agents, etc. can be cited. As organic conductive substances, conductive polymers such as polyaniline, polypyrrole, polythiophene, polyethyleneimine, and allylamine polymers can be cited. As inorganic conductive substances, various metals, alloys, and conductive metal oxides can be cited. The inorganic conductive material is preferably contained in the antistatic layer in the form of microparticles with a particle size of 0.1 μm or less (typically 0.01 μm to 0.1 μm). The antistatic component may be a cationic antistatic agent, an anionic antistatic agent, an amphoteric antistatic agent, a non-ionic antistatic agent, or the like.
<積層體> 藉由將保護膜2之黏著劑層292貼合於膜基材1之一面而形成積層體8。於膜基材1上積層保護膜2之積層方法並無特別限定。例如於膜基材1之製造步驟中,只要在將膜基材1捲取成卷狀之前,以卷對卷將保護膜2貼合於膜基材1上即可。藉由繼膜基材1之製造步驟後實施保護膜2之貼合,可減少輥與膜基材1之第一主面1A之接觸次數,而抑制傷痕產生。 <Laminate> The laminate 8 is formed by laminating the adhesive layer 292 of the protective film 2 to one surface of the film substrate 1. The lamination method of laminating the protective film 2 on the film substrate 1 is not particularly limited. For example, in the manufacturing step of the film substrate 1, the protective film 2 can be laminated to the film substrate 1 in a roll-to-roll manner before the film substrate 1 is rolled into a roll. By laminating the protective film 2 after the manufacturing step of the film substrate 1, the number of contacts between the roll and the first main surface 1A of the film substrate 1 can be reduced, thereby suppressing the generation of scratches.
於膜基材1為延伸膜之情形時,較佳為於延伸後即刻貼合保護膜2。例如藉由把持膜之兩端之拉幅機方式實施延伸後,於膜基材1之第一主面1A與搬送輥接觸之前貼合保護膜2,藉此可防止於膜基材1之第一主面1A上產生傷痕。When the film substrate 1 is a stretched film, it is preferred to immediately attach the protective film 2 after stretching. For example, after stretching by a tentering method that holds both ends of the film, the protective film 2 is attached before the first main surface 1A of the film substrate 1 contacts the conveying roller, thereby preventing scratches from being generated on the first main surface 1A of the film substrate 1.
如上所述,自膜基材1剝離保護膜2時之剝離力較佳為1.5 N/50mm以下,更佳為1.0 N/50mm以下,進而較佳為0.8 N/50mm以下。藉由調整黏著劑層292之組成、厚度等,可使剝離力成為上述範圍內。具體而言,有黏著劑層292之厚度越小,剝離力變得越小之趨勢。又,藉由增加交聯結構向構成黏著劑層292之基礎聚合物中之導入量,有凝膠分率上升、剝離力變小之趨勢。As described above, the peeling force when peeling the protective film 2 from the film substrate 1 is preferably 1.5 N/50 mm or less, more preferably 1.0 N/50 mm or less, and further preferably 0.8 N/50 mm or less. By adjusting the composition and thickness of the adhesive layer 292, the peeling force can be made within the above range. Specifically, there is a trend that the smaller the thickness of the adhesive layer 292, the smaller the peeling force becomes. In addition, by increasing the amount of cross-linked structure introduced into the base polymer constituting the adhesive layer 292, there is a trend that the gel fraction increases and the peeling force becomes smaller.
如上所述,保護膜2之背面2A之表面電阻較佳為1×10 10Ω/sq以下,更佳為5×10 9Ω/sq以下,進而較佳為1×10 9Ω/sq以下,亦可為5×10 8Ω/sq以下。藉由於芯材291之背面設置防靜電層,可減少表面電阻。 As described above, the surface resistance of the back surface 2A of the protective film 2 is preferably 1×10 10 Ω/sq or less, more preferably 5×10 9 Ω/sq or less, further preferably 1×10 9 Ω/sq or less, and may be 5×10 8 Ω/sq or less. By providing an antistatic layer on the back surface of the core material 291, the surface resistance can be reduced.
[光學膜之製作] 自積層體8之膜基材1剝離保護膜2,於膜基材1之第一主面1A上形成塗層3,藉此可獲得膜基材1上具備塗層3之積層體(光學膜)9。以下,以使用包含液晶化合物之液晶組合物作為塗液,形成配向液晶層作為塗層3之情形為中心,對各步驟進行說明。 [Production of optical film] The protective film 2 is peeled off from the film substrate 1 of the laminate 8, and the coating 3 is formed on the first main surface 1A of the film substrate 1, thereby obtaining a laminate (optical film) 9 having the coating 3 on the film substrate 1. The following is a description of each step, centering on the case where a liquid crystal composition containing a liquid crystal compound is used as a coating liquid to form an aligned liquid crystal layer as the coating 3.
<第一搬送步驟> 於膜基材1之第一主面1A貼合保護膜2而成之積層體8被暫時捲取成卷狀之捲繞體80,並設置於捲出輥81。自設置於捲出輥81之捲繞體80捲出之積層體8係向沿著搬送輥83、85、87形成之搬送路徑之下游側連續地移動,而被搬送至剝離部10。 <First conveying step> The laminated body 8 formed by laminating the protective film 2 on the first main surface 1A of the film substrate 1 is temporarily rolled into a roll 80 and placed on a roll-out roller 81. The laminated body 8 rolled out from the roll 80 placed on the roll-out roller 81 is continuously moved to the downstream side along the conveying path formed by the conveying rollers 83, 85, and 87, and is conveyed to the peeling section 10.
將膜基材1與保護膜2貼合而形成積層體8之步驟、與第一搬送步驟亦可連續地實施。例如,亦可於將膜基材1與保護膜2貼合後,不捲取積層體8而直接將其搬送至剝離部10。The step of bonding the film substrate 1 and the protective film 2 to form the laminate 8 and the first conveying step may be performed continuously. For example, after bonding the film substrate 1 and the protective film 2, the laminate 8 may be directly conveyed to the peeling unit 10 without being rolled up.
<剝離步驟> 於剝離步驟中,自搬送至剝離部10之積層體8剝離保護膜2,使膜基材1之第一主面1A露出。保護膜之剝離方法並無特別限定,通常為於剝離輥11上進行剝離之方法。若以保護膜2相對於剝離輥11之抱角大於膜基材1相對於剝離輥11之抱角之方式配置剝離輥11之下流之搬送輥13、23,則可於剝離輥11上自膜基材1剝離保護膜2。剝離輥可為上下夾持積層體8之一對夾輥。自膜基材1之第一主面剝離之保護膜2沿著由搬送輥23、25形成之搬送路徑被搬送,利用捲取輥21捲取成捲繞體20。 <Peeling step> In the peeling step, the protective film 2 is peeled off from the laminate 8 transported to the peeling section 10, so that the first main surface 1A of the film substrate 1 is exposed. The method of peeling the protective film is not particularly limited, and is usually a method of peeling on a peeling roller 11. If the conveying rollers 13 and 23 downstream of the peeling roller 11 are arranged in a manner such that the protective film 2 has a greater embrace angle with respect to the peeling roller 11 than the film substrate 1 has a embrace angle with respect to the peeling roller 11, the protective film 2 can be peeled off from the film substrate 1 on the peeling roller 11. The peeling roller can be a pair of upper and lower clamping rollers for holding the laminate 8. The protective film 2 peeled off from the first main surface of the film substrate 1 is conveyed along the conveying path formed by the conveying rollers 23 and 25, and is wound into a roll 20 by the winding roller 21.
如上所述,藉由調整自膜基材1剝離保護膜2時之剝離力,可抑制由剝離時之快速移動等導致之膜基材1之變形。又,由於保護膜2之背面2A之表面電阻較小,故可抑制膜基材1之剝離帶電。As described above, by adjusting the peeling force when peeling the protective film 2 from the film substrate 1, deformation of the film substrate 1 caused by rapid movement during peeling can be suppressed. In addition, since the surface resistance of the back surface 2A of the protective film 2 is small, the peeling electrification of the film substrate 1 can be suppressed.
<第二搬送步驟> 於第二搬送步驟中,將剝離保護膜2後之膜基材1搬送至塗佈部30。於將剝離部10中剝離保護膜2後之膜基材1自剝離部10搬送至塗佈部30的期間,膜基材1之第一主面1A露出。於本實施方式中,第二搬送步驟中之膜基材1之搬送路徑較短,膜基材1之第一主面1A與搬送輥之接觸機會較少,因此第二搬送步驟中之膜基材上之傷痕產生頻度極少。 <Second conveying step> In the second conveying step, the film substrate 1 after the protective film 2 is peeled off is conveyed to the coating section 30. During the period when the film substrate 1 after the protective film 2 is peeled off in the peeling section 10 is conveyed from the peeling section 10 to the coating section 30, the first main surface 1A of the film substrate 1 is exposed. In this embodiment, the conveying path of the film substrate 1 in the second conveying step is shorter, and the first main surface 1A of the film substrate 1 and the conveying roller have less contact opportunities, so the frequency of scratches on the film substrate in the second conveying step is extremely low.
於將膜基材1自剝離部10(剝離輥11)搬送至塗佈部30(支承輥31)之期間,若使搬送輥不與膜基材1之第一主面1A接觸,則可防止於第二搬送步驟中在膜基材1之第一主面1A上產生傷痕。If the transport roller is prevented from contacting the first main surface 1A of the film substrate 1 while the film substrate 1 is being transported from the stripping section 10 (stripping roller 11) to the coating section 30 (support roller 31), scratches on the first main surface 1A of the film substrate 1 can be prevented from being generated in the second transport step.
如圖3之虛線所示,於第二搬送步驟中,輥15亦可與膜基材1之第一主面1A接觸。藉由使輥15與膜基材1之第一主面1A接觸,自第一主面側(圖之下側)向圖之上側按壓之力會作用於膜基材1。因此,由保護膜2之剝離力導致之膜基材1之振動得到減少,而可抑制塗液之塗佈不均。As shown by the dotted line in FIG3 , in the second conveying step, the roller 15 may also contact the first main surface 1A of the film substrate 1. By making the roller 15 contact the first main surface 1A of the film substrate 1, a pressing force from the first main surface side (the lower side in the figure) to the upper side in the figure acts on the film substrate 1. Therefore, the vibration of the film substrate 1 caused by the peeling force of the protective film 2 is reduced, and the uneven coating of the coating liquid can be suppressed.
於在剝離部10中剝離保護膜2後至在塗佈部30中塗佈塗液為止之期間的膜基材1之搬送路徑(第二搬送步驟)中,與膜基材1之第一主面1A相接之輥15可作為對膜基材1之「按壓輥」發揮作用。In the conveying path of the film substrate 1 (second conveying step) from the peeling of the protective film 2 in the peeling section 10 to the coating of the coating liquid in the coating section 30, the roller 15 in contact with the first main surface 1A of the film substrate 1 can function as a "pressing roller" for the film substrate 1.
按壓輥只要能夠抑制剝離部10中由保護膜2之剝離所導致之膜基材1之振動即可,無需與膜基材1之寬度方向之整體相接。按壓輥可僅接觸膜基材1之寬度方向之兩端部而不與寬度方向之中央部接觸。例如作為與膜基材1之第一主面1A接觸之按壓輥15,可使用圖4中模式性地表示之杠鈴形狀之輥151。The pressing roller only needs to suppress the vibration of the film substrate 1 caused by the peeling of the protective film 2 in the peeling portion 10, and does not need to be in contact with the entire width direction of the film substrate 1. The pressing roller may only contact the two end portions in the width direction of the film substrate 1 without contacting the central portion in the width direction. For example, as the pressing roller 15 in contact with the first main surface 1A of the film substrate 1, a lever-shaped roller 151 schematically shown in FIG. 4 can be used.
輥151於兩端具備圓筒形狀之輥15R、15L,經由直徑小於該等輥之連結軸15C,將兩端之輥15R、15L連結。若使用該輥151,則輥151僅與膜基材之寬度方向之兩端部接觸,而不與膜基材之寬度方向之中央接觸。The roller 151 has cylindrical rollers 15R and 15L at both ends, and the rollers 15R and 15L at both ends are connected via a connecting shaft 15C having a diameter smaller than the rollers. If the roller 151 is used, the roller 151 only contacts the both ends of the film substrate in the width direction, and does not contact the center of the film substrate in the width direction.
於第二搬送步驟中,膜基材之寬度方向之兩端部(輥15R、15L接觸之區域)存在因與輥15之接觸而於膜基材之第一主面上形成傷痕之情形,但若將該區域作為非製品區域,僅將不與輥15接觸之寬度方向之中央作為製品區域,則可獲得由膜基材1之傷痕導致之缺陷較少之光學膜(塗層3)。例如,若僅於膜基材1之寬度方向之中央塗佈塗液,於膜基材之寬度方向之兩端部不形成塗層,則僅寬度方向之中央成為製品區域。又,亦可藉由於形成塗層後之適當階段沖裁膜、或將端部切割成長條等方法,而自製品切斷去除兩端部之區域,從而僅將膜基材之寬度方向之中央部作為製品區域。In the second conveying step, the two ends of the film substrate in the width direction (areas where the rollers 15R and 15L contact) may form scratches on the first main surface of the film substrate due to contact with the roller 15. However, if such areas are regarded as non-product areas and only the center in the width direction that does not contact the roller 15 is regarded as the product area, an optical film (coating 3) with fewer defects caused by scratches on the film substrate 1 can be obtained. For example, if the coating liquid is applied only to the center in the width direction of the film substrate 1 and the coating is not formed on the two ends in the width direction of the film substrate, only the center in the width direction becomes the product area. Furthermore, the regions at both ends can be cut off from the product by punching the film at an appropriate stage after the coating is formed, or by cutting the ends into strips, so that only the central portion in the width direction of the film substrate is used as the product region.
如上所述,於第二搬送步驟中,於輥與膜基材1之第一主面1A接觸之情形時,較佳為於寬度方向之兩端部第一主面1A與按壓輥接觸,於寬度方向之中央部對一主面不與輥接觸。於該形態下,可抑制由保護膜2之剝離導致之膜基材1之振動,而減少塗層3之塗佈不均,並且可獲得由膜基材1之傷痕導致之缺陷較少之塗層3。As described above, in the second conveying step, when the roller contacts the first main surface 1A of the film substrate 1, it is preferred that the first main surface 1A contacts the pressing roller at both ends in the width direction, and the first main surface in the center in the width direction does not contact the roller. In this state, the vibration of the film substrate 1 caused by the peeling of the protective film 2 can be suppressed, and the uneven coating of the coating layer 3 can be reduced, and a coating layer 3 with fewer defects caused by scratches on the film substrate 1 can be obtained.
於膜基材1之兩端部,膜基材與按壓輥接觸之部分之寬度例如分別為1~50 cm。於膜基材與按壓輥接觸之部分之寬度過小之情形時,存在膜基材之振動抑制作用不充分,或膜基材之移動性降低之情形。於膜基材與按壓輥接觸之部分之寬度過大之情形時,光學膜之非製品區域之寬度較大,而導致生產效率或良率降低。膜基材與按壓輥接觸之部分之寬度可為2 cm以上、3 cm以上或5 cm以上,亦可為30 cm以下、25 cm以下、20 cm以下、15 cm以下或10 cm以下。At both ends of the film substrate 1, the width of the portion where the film substrate and the pressing roller are in contact is, for example, 1 to 50 cm respectively. When the width of the portion where the film substrate and the pressing roller are in contact is too small, the vibration suppression effect of the film substrate is insufficient, or the mobility of the film substrate is reduced. When the width of the portion where the film substrate and the pressing roller are in contact is too large, the width of the non-product area of the optical film is larger, resulting in reduced production efficiency or yield. The width of the portion where the film substrate and the pressing roller are in contact may be greater than 2 cm, greater than 3 cm, or greater than 5 cm, and may also be less than 30 cm, less than 25 cm, less than 20 cm, less than 15 cm, or less than 10 cm.
按壓輥可以自膜基材1之寬度方向之兩端向外側伸出之方式配置,亦可配置於寬度方向之兩端之內側。於將按壓輥配置在較膜基材1之寬度方向之兩端更靠內側之情形時,自膜基材之寬度方向之一端至按壓輥之距離可為30 cm以內、20 cm以內、15 cm以內、10 cm以內、5 cm以內、3 cm以內或1 cm以內。The pressing roller may be arranged to extend outward from both ends in the width direction of the film substrate 1, or may be arranged inside the both ends in the width direction. When the pressing roller is arranged inside the both ends in the width direction of the film substrate 1, the distance from one end in the width direction of the film substrate to the pressing roller may be within 30 cm, within 20 cm, within 15 cm, within 10 cm, within 5 cm, within 3 cm, or within 1 cm.
於在剝離部10中剝離保護膜2後至在塗佈部30中塗佈塗液之期間,與膜基材1之第一主面1A相接之按壓輥只要能夠按壓膜基材之兩端部而抑制膜基材之振動即可,其形狀不限於圖4所示之杠鈴形狀。例如亦可於寬度方向之兩端分離地配置2個輥。與膜基材1之第一主面1A相接之按壓輥亦可與相接於膜基材1之第二主面1B之輥成對而為挾持膜基材1之夾輥。於剝離部10與塗佈部30之間,亦可設置2根以上與膜基材1之第一主面1A相接之按壓輥。In the period from the time when the protective film 2 is peeled off in the peeling section 10 to the time when the coating liquid is applied in the coating section 30, the pressing roller in contact with the first main surface 1A of the film substrate 1 can suppress the vibration of the film substrate by pressing both ends of the film substrate, and its shape is not limited to the lever shape shown in FIG. 4. For example, two rollers may be arranged separately at both ends in the width direction. The pressing roller in contact with the first main surface 1A of the film substrate 1 may also be paired with a roller in contact with the second main surface 1B of the film substrate 1 to serve as a clamping roller for clamping the film substrate 1. Two or more pressing rollers in contact with the first main surface 1A of the film substrate 1 may also be provided between the peeling section 10 and the coating section 30.
於第二搬送步驟中,自膜基材1之第一主面1A側按壓膜基材而抑制膜基材之振動的構件並不一定必須是旋轉體。例如於剝離部10與塗佈部30之間,亦可配置將膜基材自第一主面側(圖之下側)朝向第二主面側按壓之頂銷等作為膜按壓機構。In the second conveying step, the member that presses the film substrate from the first main surface 1A side of the film substrate 1 to suppress the vibration of the film substrate does not necessarily have to be a rotating body. For example, between the stripping part 10 and the coating part 30, a push pin that presses the film substrate from the first main surface side (lower side in the figure) toward the second main surface side can also be arranged as a film pressing mechanism.
於第二搬送步驟中,亦可利用拉幅夾把持膜基材之兩端部。於此情形時,亦可不使輥等與膜基材之寬度方向中央部接觸而自第一主面及第二主面之兩面按壓膜基材之寬度方向兩端部之區域,從而抑制由保護膜2之剝離導致之膜基材1之振動。於此情形時,與膜基材之第一主面側相接之下夾具作為膜按壓機構發揮作用。In the second conveying step, the two ends of the film substrate may be gripped by a tenter clip. In this case, the regions of the two ends of the film substrate in the width direction may be pressed from both the first main surface and the second main surface without the rollers etc. contacting the central portion of the film substrate in the width direction, thereby suppressing the vibration of the film substrate 1 caused by the peeling of the protective film 2. In this case, the lower clamp in contact with the first main surface side of the film substrate functions as a film pressing mechanism.
如圖3所示,於剝離部10與塗佈部30之間之第二搬送步驟中,藉由使輥13與膜基材1之第二主面1B接觸,亦可自第二主面1B側按壓膜基材1,因此能夠更有效地抑制由保護膜2之剝離力導致之膜基材1之振動。As shown in FIG. 3 , in the second transport step between the stripping section 10 and the coating section 30 , by bringing the roller 13 into contact with the second main surface 1B of the film substrate 1 , the film substrate 1 can also be pressed from the second main surface 1B side, thereby being able to more effectively suppress the vibration of the film substrate 1 caused by the stripping force of the protective film 2 .
與膜基材1之第二主面1B相接之輥13可僅與膜基材之兩端部相接,亦可與膜基材之寬度方向整體相接。就膜基材之搬送性等觀點而言,輥13較佳為與膜基材之第二主面之寬度方向整體相接。The roller 13 in contact with the second main surface 1B of the film substrate 1 may be in contact with only the two ends of the film substrate or may be in contact with the entire width direction of the film substrate. From the perspective of the transportability of the film substrate, the roller 13 is preferably in contact with the entire width direction of the second main surface of the film substrate.
<塗佈步驟> 於搬送至塗佈部30之膜基材1之第一主面1A上塗佈塗液。於圖3所示之形態中,在膜基材1之第二主面1B與支承輥31相接之狀態下,於膜基材1之第一主面1A上塗佈自模嘴33噴出之塗液。 <Coating step> The coating liquid is coated on the first main surface 1A of the film substrate 1 transported to the coating section 30. In the state shown in FIG. 3 , the coating liquid ejected from the die nozzle 33 is coated on the first main surface 1A of the film substrate 1 while the second main surface 1B of the film substrate 1 is in contact with the support roller 31 .
於膜基材1上塗佈塗液之方法並無特別限定。作為塗佈方法,除了模嘴塗佈以外,亦可例舉接觸輥式塗佈、凹版塗佈、反向塗佈、噴塗、邁耶棒式塗佈、刀輥式塗佈、氣刀塗佈等。塗液之塗佈厚度較佳為以將溶劑乾燥後之塗層3之厚度成為0.1~20 μm左右的方式進行調整。The method of applying the coating liquid on the film substrate 1 is not particularly limited. As the coating method, in addition to die-mouth coating, contact roller coating, gravure coating, reverse coating, spray coating, Meyer bar coating, knife roll coating, air knife coating, etc. can also be cited. The coating thickness of the coating liquid is preferably adjusted so that the thickness of the coating layer 3 after the solvent is dried becomes about 0.1 to 20 μm.
於本實施方式中,由於在即將進行塗佈步驟之前,膜基材1之第一主面1A上暫時黏有保護膜2而得到保護,因此由輥搬送導致之膜基材1之第一主面1A上之傷痕產生得到抑制。又,由於暫時黏於膜基材1之保護膜2之背面2A之表面電阻、及膜基材1與保護膜2之接著力(剝離力)被調整至特定範圍,故於剝離保護膜2後由膜基材1之第一主面1A之帶電等所導致之塗佈不良的產生得到抑制。因此,可形成由膜基材1導致之傷痕或條紋等缺陷較少之塗層3。In this embodiment, since the protective film 2 is temporarily adhered to the first main surface 1A of the film substrate 1 immediately before the coating step, the generation of scratches on the first main surface 1A of the film substrate 1 caused by roller conveyance is suppressed. In addition, since the surface resistance of the back surface 2A of the protective film 2 temporarily adhered to the film substrate 1 and the adhesion force (peeling force) between the film substrate 1 and the protective film 2 are adjusted to a specific range, the generation of coating defects caused by the charging of the first main surface 1A of the film substrate 1 after the protective film 2 is peeled off is suppressed. Therefore, a coating layer 3 with fewer defects such as scratches or stripes caused by the film substrate 1 can be formed.
<塗佈後之步驟> 亦可利用加熱部50對塗佈塗液後之膜基材1進行加熱。加熱部50例如包括加熱爐55,於膜基材1在加熱爐55內被搬送之期間,對膜基材1、及塗佈於其上之塗液進行加熱。例如,可藉由加熱而去除塗液之溶劑。 <Steps after coating> The film substrate 1 after coating with the coating liquid can also be heated by the heating unit 50. The heating unit 50 includes, for example, a heating furnace 55, and the film substrate 1 and the coating liquid coated thereon are heated while the film substrate 1 is being transported in the heating furnace 55. For example, the solvent of the coating liquid can be removed by heating.
於塗液為液晶組合物且液晶組合物中所含之液晶化合物為熱致型液晶之情形時,對液晶組合物層進行加熱以使之成為液晶相,藉此液晶化合物於特定方向上配向。具體而言,將膜基材上所塗佈之液晶組合物加熱至N(向列相)-I(各向同性液體相)轉移溫度以上,而使該液晶組合物成為各向同性液體狀態。然後,視需要進行緩冷使其呈現向列相。此時,較理想的是暫時保持為呈液晶相之溫度,使液晶相疇成長而成為單疇。或者,亦可於塗佈液晶組合物後,將溫度保持在呈現向列相之溫度範圍內一定時間而使液晶分子於特定方向上配向。When the coating liquid is a liquid crystal composition and the liquid crystal compound contained in the liquid crystal composition is a thermotropic liquid crystal, the liquid crystal composition layer is heated to form a liquid crystal phase, whereby the liquid crystal compound is aligned in a specific direction. Specifically, the liquid crystal composition coated on the film substrate is heated to a temperature above the N (nematic phase) -I (isotropic liquid phase) transition temperature, so that the liquid crystal composition becomes an isotropic liquid state. Then, if necessary, it is slowly cooled to present a nematic phase. At this time, it is more ideal to temporarily maintain the temperature of the liquid crystal phase so that the liquid crystal phase grows into a single phase. Alternatively, after the liquid crystal composition is coated, the temperature can be maintained within the temperature range of the nematic phase for a certain period of time to align the liquid crystal molecules in a specific direction.
使液晶化合物於特定方向上配向時之加熱溫度只要根據液晶組合物之種類來適當選擇即可,通常為40~200℃左右。若加熱溫度過低,則有向液晶相之轉移變得不充分之趨勢,若加熱溫度過高,則存在配向缺陷增加之情形。加熱時間只要以液晶相區域充分成長之方式進行調整即可,通常為30秒~30分鐘左右。The heating temperature for aligning the liquid crystal compound in a specific direction can be appropriately selected according to the type of liquid crystal composition, and is usually about 40 to 200°C. If the heating temperature is too low, the transition to the liquid crystal phase tends to be insufficient, and if the heating temperature is too high, there is a tendency for the alignment defects to increase. The heating time can be adjusted in such a way that the liquid crystal phase region grows sufficiently, and is usually about 30 seconds to 30 minutes.
較佳為藉由加熱使液晶化合物配向之後,冷卻至玻璃轉移溫度以下之溫度。冷卻方法並無特別限定,例如只要自加熱氛圍中取出至室溫中即可。亦可進行空氣冷卻、水冷等強制冷卻。It is preferred to heat the liquid crystal compound to align it and then cool it to a temperature below the glass transition temperature. The cooling method is not particularly limited, for example, it can be taken out from the heated atmosphere to room temperature. Strong cooling such as air cooling or water cooling can also be performed.
於液晶化合物具有硬化性之情形時,較佳為利用硬化部60進行硬化。例如,於液晶化合物具有光硬化性之情形時,以光硬化性液晶化合物(液晶單體)具有液晶規則性之狀態進行光硬化。來自光源61之照射光只要能夠使光硬化性液晶化合物聚合即可,通常使用波長250~450 nm之紫外線或可見光。於液晶組合物含有光聚合起始劑之情形時,只要選擇光聚合起始劑具有感度之波長之光即可。作為照射光源,可使用低壓水銀燈、高壓水銀燈、超高壓水銀燈、金屬鹵化物燈、氙氣燈、LED(Light Emitting Diode,發光二極體)、黑光燈、化學燈等。為促進光硬化反應,光照射較佳為於氮氣等惰性氣體氛圍下進行。When the liquid crystal compound has curability, it is preferred to use the curing part 60 for curing. For example, when the liquid crystal compound has photocurability, photocuring is performed in a state where the photocurable liquid crystal compound (liquid crystal monomer) has liquid crystal regularity. The irradiation light from the light source 61 only needs to be able to polymerize the photocurable liquid crystal compound, and usually ultraviolet light or visible light with a wavelength of 250 to 450 nm is used. When the liquid crystal composition contains a photopolymerization initiator, it is sufficient to select light with a wavelength to which the photopolymerization initiator is sensitive. As the irradiation light source, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, a xenon lamp, an LED (Light Emitting Diode), a black light lamp, a chemical lamp, etc. can be used. To promote the photocuring reaction, the light irradiation is preferably carried out in an inert gas atmosphere such as nitrogen.
於光硬化時,藉由利用特定方向之偏光,亦可使液晶化合物於特定方向上配向。如上所述,於藉由膜基材1之配向限制力使液晶化合物配向之情形時,照射光亦可為非偏光(自然光)。During photocuring, the liquid crystal compound can be aligned in a specific direction by using polarized light in a specific direction. As described above, when the liquid crystal compound is aligned by the alignment restraining force of the film substrate 1, the irradiated light can also be non-polarized light (natural light).
照射強度只要根據液晶組合物之組成、光聚合起始劑之添加量等來適當調整即可。照射能量(累計照射光量)通常為20~10000 mJ/cm 2左右,較佳為50~5000 mJ/cm 2,更佳為100~800 mJ/cm 2。為促進光硬化反應,亦可於加熱條件下實施光照射。 The irradiation intensity can be appropriately adjusted according to the composition of the liquid crystal composition, the amount of photopolymerization initiator added, etc. The irradiation energy (accumulated irradiation light quantity) is usually about 20 to 10,000 mJ/cm 2 , preferably 50 to 5,000 mJ/cm 2 , and more preferably 100 to 800 mJ/cm 2. To promote the photohardening reaction, light irradiation can also be performed under heating conditions.
使液晶單體光硬化後之聚合物為非液晶性,不會因溫度變化而產生液晶相、玻璃相、結晶相之轉移。因此,以使液晶單體於特定方向上配向之狀態光硬化後所得之液晶層難以因溫度變化而產生分子配向之變化。又,液晶層與包含非液晶材料之膜相比,雙折射明顯較大,因此可使具有所需延遲之光學各向異性元件之厚度明顯變小。The polymer formed after the liquid crystal monomer is photocured is non-liquid crystal and will not undergo transitions between the liquid crystal phase, glass phase, and crystal phase due to temperature changes. Therefore, the liquid crystal layer obtained after photocuring the liquid crystal monomer in a state of being oriented in a specific direction is unlikely to undergo changes in molecular orientation due to temperature changes. In addition, the liquid crystal layer has significantly greater birefringence than a film containing non-liquid crystal materials, so the thickness of an optically anisotropic element with the desired delay can be significantly reduced.
塗層(液晶層)3之光學特性並無特別限定。塗層3之正面延遲及厚度方向延遲只要根據用途等來適當設定即可。於沿面配向有液晶分子之情形時,塗層3之正面延遲例如為20~1000 nm左右。於塗層3為1/4波長板之情形時,正面延遲較佳為100~180 nm,更佳為120~150 nm。於塗層3為1/2波長板之情形時,正面延遲較佳為200~340 nm,更佳為240~300 nm。於垂直配向有液晶之情形時,塗層3之面內延遲大約為0(例如5 nm以下,較佳為3 nm以下),厚度方向延遲之絕對值為30~500 nm左右。The optical properties of the coating (liquid crystal layer) 3 are not particularly limited. The front retardation and thickness direction retardation of the coating 3 can be appropriately set according to the purpose, etc. When there are liquid crystal molecules aligned along the surface, the front retardation of the coating 3 is, for example, about 20 to 1000 nm. When the coating 3 is a 1/4 wavelength plate, the front retardation is preferably 100 to 180 nm, and more preferably 120 to 150 nm. When the coating 3 is a 1/2 wavelength plate, the front retardation is preferably 200 to 340 nm, and more preferably 240 to 300 nm. When there is liquid crystal in vertical alignment, the in-plane retardation of the coating layer 3 is approximately 0 (eg, less than 5 nm, preferably less than 3 nm), and the absolute value of the retardation in the thickness direction is approximately 30 to 500 nm.
液晶層等塗層3之延遲與厚度成正比。於塗佈塗液時,若因膜基材之表面之收縮等而導致形成局部厚度較小之部分,則該部分之延遲變小,因此於顯示裝置中產生光學不均。如上所述,於本實施方式中,保護膜2之背面2A之表面電阻、及膜基材1與保護膜2之接著力(剝離力)被調整至特定範圍,由塗佈不良導致之條紋狀厚度不均之產生得到抑制。因此,難以產生由光學膜(塗層)之厚度不均導致之延遲不均,光學均勻性優異。The retardation of the coating 3 such as the liquid crystal layer is proportional to the thickness. When applying the coating, if a portion with a smaller thickness is formed due to the shrinkage of the surface of the film substrate, the retardation of the portion becomes smaller, thereby generating optical unevenness in the display device. As described above, in the present embodiment, the surface resistance of the back surface 2A of the protective film 2 and the adhesion (peeling force) between the film substrate 1 and the protective film 2 are adjusted to a specific range, and the generation of stripe-like thickness unevenness caused by poor coating is suppressed. Therefore, it is difficult to generate retardation unevenness caused by uneven thickness of the optical film (coating), and the optical uniformity is excellent.
塗層(液晶層)3中之液晶分子之配向方向可與膜基材1之長度方向(卷對卷之搬送方向)平行,亦可與該長度方向不平行。如上所述,藉由利用斜延伸膜等之配向限制力,可形成與長度方向不平行地配向有液晶分子之液晶層。在與長度方向不平行地配向有液晶分子之情形時,若於膜基材上存在沿著長度方向之傷痕,則於其上形成之液晶層中液晶分子沿著傷痕於長度方向上配向,因此導致配向不良。如上所述,藉由將暫時黏於膜基材1之保護膜2剝離後即刻於膜基材1上塗佈液晶組合物,可抑制於膜基材上產生傷痕,減少液晶層之配向不良。The orientation direction of the liquid crystal molecules in the coating (liquid crystal layer) 3 may be parallel to the length direction (roll-to-roll conveying direction) of the film substrate 1, or may be non-parallel to the length direction. As described above, by utilizing the orientation limiting force of an obliquely stretched film or the like, a liquid crystal layer in which the liquid crystal molecules are oriented non-parallel to the length direction can be formed. In the case where the liquid crystal molecules are oriented non-parallel to the length direction, if there is a scratch along the length direction on the film substrate, the liquid crystal molecules in the liquid crystal layer formed thereon are oriented along the scratch in the length direction, thus resulting in poor orientation. As described above, by coating the liquid crystal composition on the film substrate 1 immediately after peeling off the protective film 2 temporarily attached to the film substrate 1, the generation of scratches on the film substrate can be suppressed, thereby reducing poor orientation of the liquid crystal layer.
<光學膜之加工> 藉由將於膜基材1之第一主面1A上形成有塗層3之積層體9(光學膜)利用捲取輥91捲取,可獲得長條光學膜之捲繞體90。該積層體9可直接用作光學膜。由於膜基材1之寬度方向之兩端部之區域為非製品區域,故亦可在形成塗層3後直到利用捲取輥91進行捲取為止之期間、或利用捲取輥91捲取後之適當階段,藉由切割成長條而切斷去除該區域。又,亦可以不包含寬度方向之兩端部之區域之方式對膜進行沖裁而切出單片製品。 <Processing of optical film> By rolling up the laminate 9 (optical film) having the coating 3 formed on the first main surface 1A of the film substrate 1 using a winding roll 91, a long optical film roll 90 can be obtained. The laminate 9 can be used directly as an optical film. Since the regions at both ends of the film substrate 1 in the width direction are non-product regions, the regions can be cut off and removed by cutting into long strips during the period from the formation of the coating 3 until the winding is performed using the winding roll 91, or at an appropriate stage after the winding is performed using the winding roll 91. In addition, the film can be punched out in a manner that does not include the regions at both ends in the width direction to cut out a single product.
膜基材1之第一主面1A上形成塗層3而成之積層體9可直接用作光學膜,亦可將膜基材1剝離去除而僅將塗層3用作光學膜。於塗層3為樹脂層之情形時,亦可將膜基材1與塗層3之積層體延伸,對塗層3賦予光學各向異性。The laminate 9 formed by forming the coating 3 on the first main surface 1A of the film substrate 1 can be used directly as an optical film, or the film substrate 1 can be peeled off and only the coating 3 can be used as an optical film. When the coating 3 is a resin layer, the laminate of the film substrate 1 and the coating 3 can be extended to give the coating 3 optical anisotropy.
於塗層3上亦可積層其他層。例如,於塗層3上經由接著劑層5而貼合光學層4,藉此可獲得圖5所示之積層體96。Other layers may also be laminated on the coating layer 3. For example, the optical layer 4 may be laminated on the coating layer 3 via the adhesive layer 5, thereby obtaining the laminate body 96 shown in FIG. 5 .
積層於塗層3上之光學層4並無特別限定,可無特別限制地使用通常可用作光學膜之光學各向同性或光學各向異性之膜。作為光學層4之具體例,可例舉:相位差膜或偏光元件保護膜等透明膜、偏光元件、視角擴大膜、視角限制(防窺)膜、增亮膜等功能性膜。光學層4可為單層,亦可為積層體。光學層4亦可為液晶層。光學層4亦可為於偏光元件之一面或兩面貼合透明保護膜而成之偏光板。偏光板於一面具備透明保護膜之情形時,可使偏光元件與塗層貼合,亦可使透明保護膜與塗層貼合。The optical layer 4 laminated on the coating 3 is not particularly limited, and optically isotropic or optically anisotropic films that can be generally used as optical films can be used without particular restrictions. Specific examples of the optical layer 4 include transparent films such as phase difference films or polarizing element protective films, polarizing elements, viewing angle expansion films, viewing angle limiting (anti-obstruction) films, and brightness enhancement films. The optical layer 4 can be a single layer or a laminate. The optical layer 4 can also be a liquid crystal layer. The optical layer 4 can also be a polarizing plate formed by laminating a transparent protective film to one or both sides of a polarizing element. When a polarizing plate is provided with a transparent protective film on one side, the polarizing element can be laminated to the coating, or the transparent protective film can be laminated to the coating.
構成接著劑層5之接著劑只要光學上透明,則其材料並無特別限制,可例舉:環氧樹脂、聚矽氧樹脂、丙烯酸樹脂、聚胺基甲酸酯、聚醯胺、聚醚、聚乙烯醇等。接著劑層5之厚度根據被黏著體之種類或接著劑之材料等來適當設定。於使用藉由塗佈後之交聯反應而顯示出接著性之硬化型接著劑之情形時,接著劑層5之厚度較佳為0.01~5 μm,更佳為0.03~3 μm。The adhesive constituting the adhesive layer 5 is not particularly limited in material as long as it is optically transparent, and examples thereof include epoxy resin, silicone resin, acrylic resin, polyurethane, polyamide, polyether, polyvinyl alcohol, etc. The thickness of the adhesive layer 5 is appropriately set according to the type of the adherend or the material of the adhesive. When a curing adhesive that exhibits adhesion by a crosslinking reaction after coating is used, the thickness of the adhesive layer 5 is preferably 0.01 to 5 μm, and more preferably 0.03 to 3 μm.
作為接著劑,可使用水系接著劑、溶劑系接著劑、熱熔接著劑系、活性能量射線硬化型接著劑等各種形態之接著劑。其中,自可減小接著劑層之厚度之方面考慮,較佳為水系接著劑或活性能量射線硬化型接著劑。As the adhesive, various types of adhesives can be used, such as water-based adhesives, solvent-based adhesives, hot melt adhesives, active energy ray-curing adhesives, etc. Among them, water-based adhesives or active energy ray-curing adhesives are preferred from the perspective of reducing the thickness of the adhesive layer.
藉由於塗層3之表面及光學層4之表面之任一面或兩面塗佈接著劑並進行硬化,而經由接著劑層5積層塗層3與光學層4。接著劑之硬化只要根據接著劑之種類進行適當選擇即可。例如,水系接著劑可藉由加熱來硬化。活性能量射線硬化型接著劑可藉由紫外線等活性能量射線之照射來硬化。By applying an adhesive on one or both of the surfaces of the coating layer 3 and the optical layer 4 and curing them, the coating layer 3 and the optical layer 4 are laminated via the adhesive layer 5. The curing of the adhesive can be appropriately selected according to the type of adhesive. For example, a water-based adhesive can be cured by heating. An active energy ray curing adhesive can be cured by irradiation with active energy rays such as ultraviolet rays.
於膜基材1上之塗層3上經由接著劑層5貼合光學層4而成之積層體96可直接用作光學膜。於此情形時,膜基材1構成光學膜之一部分。亦可如圖6所示,自塗層3剝離去除膜基材。亦如圖7所示,於因膜基材之剝離而露出之塗層3之表面上可積層適當之黏著劑層6。The laminate 96 formed by bonding the optical layer 4 to the coating 3 on the film substrate 1 via the adhesive layer 5 can be directly used as an optical film. In this case, the film substrate 1 constitutes a part of the optical film. The film substrate can also be removed by peeling off the coating 3 as shown in FIG6. As shown in FIG7, an appropriate adhesive layer 6 can be deposited on the surface of the coating 3 exposed by peeling off the film substrate.
構成黏著劑層6之黏著劑並無特別限制,可適當選擇使用以丙烯酸系聚合物、聚矽氧系聚合物、聚酯、聚胺基甲酸酯、聚醯胺、聚醚、氟系聚合物、橡膠系聚合物等作為基礎聚合物之黏著劑。尤佳為丙烯酸系黏著劑或橡膠系黏著劑等透明性優異、顯示出適度之潤濕性、凝聚性及接著性且耐候性或耐熱性等優異之黏著劑。黏著劑層之厚度根據被黏著體之種類等來適當設定,通常為5~500 μm左右。The adhesive constituting the adhesive layer 6 is not particularly limited, and an adhesive having an acrylic polymer, a silicone polymer, a polyester, a polyurethane, a polyamide, a polyether, a fluorine polymer, a rubber polymer, etc. as a base polymer can be appropriately selected and used. Particularly preferred are adhesives such as acrylic adhesives or rubber adhesives that have excellent transparency, exhibit appropriate wettability, cohesion and adhesion, and have excellent weather resistance or heat resistance. The thickness of the adhesive layer is appropriately set according to the type of the adherend, etc., and is generally about 5 to 500 μm.
於塗層3上積層黏著劑層6時,例如藉由將預先形成為片材狀之黏著劑貼合於塗層3之表面來進行。亦可於塗層3上塗佈黏著劑組合物後,進行溶劑之乾燥、交聯、光硬化等而形成黏著劑層6。為提高塗層3與黏著劑層6之接著力(抓固力),亦可對塗層3之表面進行電暈處理、電漿處理等表面處理或形成易接著層後再積層黏著劑層6。When the adhesive layer 6 is deposited on the coating layer 3, for example, the adhesive formed in advance in a sheet form is adhered to the surface of the coating layer 3. Alternatively, the adhesive layer 6 may be formed by applying an adhesive composition on the coating layer 3 and then drying, crosslinking, photocuring, etc. the solvent. In order to improve the adhesion (gripping force) between the coating layer 3 and the adhesive layer 6, the surface of the coating layer 3 may be subjected to surface treatment such as corona treatment or plasma treatment, or an easy-adhesion layer may be formed before depositing the adhesive layer 6.
較佳為於黏著劑層6之表面暫時黏有隔離件7。隔離件7於將光學膜與其他構件貼合之前之期間保護黏著劑層6之表面。作為隔離件之構成材料,可適宜使用丙烯酸樹脂、聚烯烴、環狀聚烯烴、聚酯等之塑膠膜。隔離件之厚度通常為5~200 μm左右。較佳為對隔離件之表面實施脫模處理。作為脫模劑,可例舉聚矽氧系材料、氟系材料、長鏈烷基系材料、脂肪酸醯胺系材料等。It is preferred that a spacer 7 is temporarily adhered to the surface of the adhesive layer 6. The spacer 7 protects the surface of the adhesive layer 6 before the optical film is bonded to other components. As the constituent material of the spacer, plastic films such as acrylic resin, polyolefin, cyclic polyolefin, polyester, etc. can be appropriately used. The thickness of the spacer is generally about 5 to 200 μm. It is preferred that a release treatment be performed on the surface of the spacer. Examples of release agents include polysilicone-based materials, fluorine-based materials, long-chain alkyl-based materials, fatty acid amide-based materials, etc.
於剝離膜基材1後之塗層3之露出面,亦可經由適當之接著劑層或黏著劑層而積層其他光學層。例如於塗層3上亦可經由適當之接著劑層而積層其他光學層,亦可於其上進而積層黏著劑層。On the exposed surface of the coating layer 3 after peeling off the film substrate 1, other optical layers can also be deposited via a suitable adhesive layer or a bonding agent layer. For example, other optical layers can also be deposited on the coating layer 3 via a suitable adhesive layer, and a bonding agent layer can also be deposited thereon.
具備塗層之光學膜例如可用作圖像顯示裝置用之光學膜。作為於塗層3上貼合其他光學層4而成之光學膜之一例,可例舉積層作為塗層3之配向液晶層與偏光板而成之圓偏光板。The optical film with a coating can be used as an optical film for an image display device, for example. As an example of an optical film formed by laminating another optical layer 4 on a coating 3, a circular polarizer formed by laminating an oriented liquid crystal layer and a polarizer as the coating 3 can be cited.
偏光板可僅由1層偏光元件所構成,亦可如上所述,於偏光元件之一面或兩面貼合有透明保護膜。作為偏光元件,可例舉:使聚乙烯醇系膜、部分縮甲醛化聚乙烯醇系膜、乙烯-乙酸乙烯酯共聚物系部分皂化膜等親水性高分子膜吸附碘或二色性染料等二色性物質並進行單軸延伸而成者;聚乙烯醇之脫水處理物或聚氯乙烯之脫氯化氫處理物等多烯系配向膜等。The polarizing plate may be composed of only one layer of polarizing element, or a transparent protective film may be laminated to one or both sides of the polarizing element as described above. Examples of the polarizing element include: a hydrophilic polymer film such as a polyvinyl alcohol film, a partially formalized polyvinyl alcohol film, and a partially saponified film of an ethylene-vinyl acetate copolymer film adsorbed with a dichroic substance such as iodine or a dichroic dye and then uniaxially stretched; a polyene alignment film such as a dehydrated product of polyvinyl alcohol or a dehydrochlorinated product of polyvinyl chloride, etc.
其中,就具有較高之偏光度之方面而言,較佳為使聚乙烯醇、或部分縮甲醛化聚乙烯醇等聚乙烯醇系膜吸附碘或二色性染料等二色性物質並使之於特定方向上配向後而成之聚乙烯醇(PVA)系偏光元件。例如,藉由對聚乙烯醇系膜實施碘染色及延伸而獲得PVA系偏光元件。亦可於樹脂基材上形成PVA系樹脂層,以積層體之狀態進行碘染色及延伸。Among them, in terms of having a higher degree of polarization, a polyvinyl alcohol (PVA) polarizing element is preferably formed by adsorbing a dichroic substance such as iodine or a dichroic dye to a polyvinyl alcohol film such as polyvinyl alcohol or partially formalized polyvinyl alcohol and aligning it in a specific direction. For example, a PVA polarizing element is obtained by dyeing and stretching a polyvinyl alcohol film with iodine. Alternatively, a PVA resin layer may be formed on a resin substrate and dyed and stretched with iodine in a laminated state.
於積層有偏光板與液晶層之圓偏光板中,較佳為至少1層液晶層中沿面配向有液晶分子。於圓偏光板中,沿面配向有液晶分子之液晶層中之液晶分子之配向方向、與偏光元件之吸收軸方向以既不平行亦不正交之方式配置。In a circular polarizer having a polarizer and a liquid crystal layer, it is preferred that at least one liquid crystal layer has liquid crystal molecules aligned along a plane. In a circular polarizer, the alignment direction of the liquid crystal molecules in the liquid crystal layer having liquid crystal molecules aligned along a plane is arranged in a manner that is neither parallel nor orthogonal to the absorption axis direction of the polarizer.
例如於圓偏光板僅具有1層液晶層之情形時,作為塗層3之液晶層為1/4波長板,且偏光元件之吸收軸方向與液晶分子之配向方向(一般而言為遲相軸方向)所成之角度被設定為45°。偏光元件之吸收軸方向與液晶分子之配向方向所成之角度可為35~55°,亦可為40~50°,亦可為43~47°。For example, when the circular polarizer has only one liquid crystal layer, the liquid crystal layer as coating layer 3 is a 1/4 wavelength plate, and the angle between the absorption axis direction of the polarizer and the alignment direction of the liquid crystal molecules (generally, the retardation axis direction) is set to 45°. The angle between the absorption axis direction of the polarizer and the alignment direction of the liquid crystal molecules can be 35-55°, 40-50°, or 43-47°.
於偏光板4與作為1/4波長板之塗層3以兩者之光軸所成之角度呈45°之方式積層而成之構成中,亦可進而具備相對於基板面垂直配向(homeotropic alignment)有液晶分子之液晶層。藉由於偏光板上依序積層作為1/4波長板之塗層3與作為正C板發揮功能之垂直液晶層,可形成對於來自斜方向之外界光亦能夠遮蔽反射光之圓偏光板。亦可於偏光板上依序積層垂直配向液晶層(正C板)與沿面配向液晶層(作為正A板之1/4波長板)。In the structure formed by laminating the polarizing plate 4 and the coating 3 as a quarter-wave plate in such a way that the angle between the optical axes of the two is 45°, a liquid crystal layer having liquid crystal molecules vertically aligned (homeotropically aligned) relative to the substrate surface can also be provided. By sequentially laminating the coating 3 as a quarter-wave plate and the vertical liquid crystal layer functioning as a positive C plate on the polarizing plate, a circular polarizing plate capable of shielding reflected light from external light coming from an oblique direction can be formed. It is also possible to sequentially laminate a vertically aligned liquid crystal layer (positive C plate) and a surface-aligned liquid crystal layer (quarter-wave plate as a positive A plate) on the polarizing plate.
於偏光板上積層複數個液晶層而成之圓偏光板中,液晶層亦可均為沿面配向液晶層。於此情形時,較佳為配置於靠近偏光板4之一側之液晶層為1/2波長板,配置於遠離偏光板之一側之液晶層為1/4波長板。於該積層構成中,較佳為以1/2波長板之遲相軸方向與偏光元件之吸收軸方向所成之角度呈75°±5°、1/4波長板之遲相軸方向與偏光元件之吸收軸方向所成之角度呈15°±5°之方式進行配置。此種積層構成之圓偏光板於可見光之廣泛波長範圍內作為圓偏光板發揮功能,因此可減少反射光之色差。In the circular polarizer formed by laminating a plurality of liquid crystal layers on a polarizer, the liquid crystal layers may all be plane-aligned liquid crystal layers. In this case, it is preferred that the liquid crystal layer disposed on one side close to the polarizer 4 is a 1/2 wavelength plate, and the liquid crystal layer disposed on one side away from the polarizer is a 1/4 wavelength plate. In the laminated structure, it is preferred that the angle formed by the retardation axis direction of the 1/2 wavelength plate and the absorption axis direction of the polarizer is 75°±5°, and the angle formed by the retardation axis direction of the 1/4 wavelength plate and the absorption axis direction of the polarizer is 15°±5°. This layered circular polarizer functions as a circular polarizer over a wide wavelength range of visible light, thereby reducing the chromatic aberration of reflected light.
如上所述,於本發明之實施方式中,由於在膜基材之表面上暫時黏有保護膜直至即將塗佈塗液之前,故膜基材上之傷痕產生得到抑制,由膜基材之傷痕導致之塗層缺陷較少。又,即便於塗層為配向液晶層,且與膜基材之長度方向不平行地配向有液晶分子之情形時,配向不良缺陷亦較少。進而,由膜基材與保護膜貼合導致之塗佈不良得到抑制,因此塗層之面內均勻性變高,可實現良好之顯示特性。 [實施例] As described above, in the embodiment of the present invention, since the protective film is temporarily adhered to the surface of the film substrate until the coating liquid is applied, the generation of scratches on the film substrate is suppressed, and the coating defects caused by the scratches on the film substrate are less. In addition, even when the coating is an oriented liquid crystal layer, and the liquid crystal molecules are aligned non-parallel to the length direction of the film substrate, there are fewer defects due to poor alignment. Furthermore, the poor coating caused by the lamination of the film substrate and the protective film is suppressed, so the in-plane uniformity of the coating becomes higher, and good display characteristics can be achieved. [Example]
以下,示出實施例對本發明更具體地進行說明,但本發明不限於下述例。Hereinafter, the present invention will be described more specifically by showing examples, but the present invention is not limited to the following examples.
<塗液之製備> 使呈現向列型液晶相之光聚合性液晶化合物(BASF製造之「Paliocolor LC242」)溶解於環戊酮中,而製備固形物成分濃度30重量%之溶液。向該溶液中添加界面活性劑(BYK-Chemie製造之「BYK-360」)及光聚合起始劑(IGM Resins製造之「Omnirad907」),而製備液晶組合物溶液。相對於光聚合性液晶化合物100重量份,調平劑及聚合起始劑之添加量分別設為0.01重量份及3重量份。 <Preparation of coating solution> A photopolymerizable liquid crystal compound exhibiting a nematic liquid crystal phase ("Paliocolor LC242" manufactured by BASF) was dissolved in cyclopentanone to prepare a solution having a solid content concentration of 30% by weight. A surfactant ("BYK-360" manufactured by BYK-Chemie) and a photopolymerization initiator ("Omnirad907" manufactured by IGM Resins) were added to the solution to prepare a liquid crystal composition solution. The amount of the leveling agent and the polymerization initiator added was set to 0.01 parts by weight and 3 parts by weight, respectively, relative to 100 parts by weight of the photopolymerizable liquid crystal compound.
<附保護膜之膜基材之製作> 使用環狀聚烯烴樹脂(日本瑞翁製造之「ZEONOR 1420R」)之顆粒,藉由熔融擠出法使其成形為膜狀後,進行雙軸延伸,而獲得厚度33 μm、面內延遲135 nm之延伸膜。於延伸膜基材之單面貼合保護膜後,將該積層體捲取成卷狀。 <Preparation of film substrate with protective film> Using pellets of cyclic polyolefin resin ("ZEONOR 1420R" manufactured by Zeon Japan), it was formed into a film by melt extrusion and then biaxially stretched to obtain a stretched film with a thickness of 33 μm and an in-plane delay of 135 nm. After the protective film was attached to one side of the stretched film substrate, the laminate was rolled into a roll.
作為保護膜,使用於雙軸延伸聚酯膜之單面具備丙烯酸系黏著劑層者。藉由變更黏著劑層之組成及厚度、以及設置在背面之防靜電層之種類,而調整保護膜之背面之表面電阻、及自膜基材剝離之剝離力。As a protective film, an acrylic adhesive layer is prepared on one side of a biaxially oriented polyester film. By changing the composition and thickness of the adhesive layer and the type of antistatic layer provided on the back side, the surface resistance of the back side of the protective film and the peeling force from the film substrate can be adjusted.
<配向液晶層之製作> 於圖3所示之塗佈裝置之捲出輥設置上述積層體,一面卷對卷搬送積層體一面自膜基材剝離保護膜,將上述液晶組合物以乾燥後之厚度成為1 μm之方式塗佈於基材之表面,於100℃下加熱3分鐘,使液晶配向。冷卻至室溫後,於氮氣氛圍下,照射累計光量400 mJ/cm 2之紫外線來進行光硬化,而獲得膜基材上形成有沿面配向液晶層之積層體。 <Preparation of Aligned Liquid Crystal Layer> The above-mentioned laminate was placed on the roll-out roll of the coating device shown in FIG3 , and the protective film was peeled off from the film substrate while the laminate was transported roll-to-roll. The above-mentioned liquid crystal composition was coated on the surface of the substrate in a manner such that the thickness after drying was 1 μm, and heated at 100°C for 3 minutes to align the liquid crystal. After cooling to room temperature, the laminate was irradiated with ultraviolet light with a cumulative light amount of 400 mJ/cm 2 in a nitrogen atmosphere for photocuring, and a laminate with a surface-aligned liquid crystal layer formed on the film substrate was obtained.
[評價] <剝離力> 將膜基材與保護膜之積層體切成寬度50 mm、長度100 mm之尺寸,於剝離角度180°、拉伸速度10 m/分鐘之條件下測定自膜基材剝離保護膜時之剝離力。 [Evaluation] <Peeling force> The laminate of the film substrate and the protective film was cut into pieces with a width of 50 mm and a length of 100 mm. The peeling force when the protective film was peeled off from the film substrate was measured at a peeling angle of 180° and a tensile speed of 10 m/min.
<表面電阻> 於溫度23℃、相對濕度50%之環境下,使用電阻率計(TREK製造之「Model 152-1」,使探針(Nittoseiko Analytech Co.,Ltd.製造之「Hiresta-UX MCP-HT800」)接觸保護膜之背面(黏著劑層非形成面),於外加電壓10 V、電壓施加時間30秒之條件下測定表面電阻。未形成防靜電層之保護膜(比較例1、2)之表面電阻超過測定上限(1×10 13Ω/sq)。 <Surface resistance> The surface resistance was measured at a temperature of 23°C and a relative humidity of 50% using a resistivity meter (Model 152-1 manufactured by TREK) with a probe (Hiresta-UX MCP-HT800 manufactured by Nittoseiko Analytech Co., Ltd.) in contact with the back side of the protective film (the side not formed with the adhesive layer) at an applied voltage of 10 V for 30 seconds. The surface resistance of the protective film without an antistatic layer (Comparative Examples 1 and 2) exceeded the upper limit of the measurement (1×10 13 Ω/sq).
<條紋不均> 於玻璃基板上貼合透明丙烯酸系黏著片,於其上貼合配向液晶層,其後自配向液晶層剝離膜基材。將該試樣配置在正交偏光鏡所配置之2片偏光板之間,於跟蹤台上利用目視來觀察。將於寬度方向上延伸之條紋狀不均被觀察到之試樣標記為NG,將未確認到條紋狀不均之試樣標記為OK。 <Striation unevenness> A transparent acrylic adhesive sheet is attached to a glass substrate, an aligned liquid crystal layer is attached thereto, and then the film substrate is peeled off from the aligned liquid crystal layer. The sample is placed between two polarizing plates arranged by crossed polarizers and visually observed on a tracking table. Samples in which stripe-like unevenness extending in the width direction is observed are marked as NG, and samples in which no stripe-like unevenness is confirmed are marked as OK.
[評價結果] 將實施例及比較例中使用之保護膜之背面之表面電阻R及自膜基材剝離之剝離力F、以及配向液晶層之條紋不均之評價結果示於表1中。 [Evaluation Results] The evaluation results of the surface resistance R of the back side of the protective film used in the embodiment and the comparative example, the peeling force F from the film substrate, and the stripe unevenness of the alignment liquid crystal layer are shown in Table 1.
[表1]
於所有實施例及比較例中均未確認到液晶之配向缺陷。認為其原因在於,於即將塗佈液晶組合物之前,膜基材之表面上暫時黏有保護膜,從而膜基材上之傷痕產生得到抑制。No alignment defects of the liquid crystal were found in all the examples and comparative examples. This is believed to be because a protective film was temporarily attached to the surface of the film substrate before the liquid crystal composition was applied, thereby suppressing the generation of scratches on the film substrate.
於使用背面具備防靜電層之保護膜之實施例1~9中,未確認到條紋不均,相對於此,於使用不具備防靜電層之保護膜之比較例1、2中,配向液晶層之整面產生了於寬度方向上延伸之條紋狀不均。於使用剝離力F較大之保護膜之比較例3中,亦與比較例1、2同樣地產生了條紋狀不均。In Examples 1 to 9 using a protective film with an antistatic layer on the back, no stripe unevenness was observed. In contrast, in Comparative Examples 1 and 2 using a protective film without an antistatic layer, stripe-like unevenness extending in the width direction occurred on the entire surface of the alignment liquid crystal layer. In Comparative Example 3 using a protective film with a large peeling force F, stripe-like unevenness also occurred in the same manner as in Comparative Examples 1 and 2.
根據上述結果可知,預先將背面之表面電阻較小且剝離力較小之保護膜暫時黏於膜基材,自膜基材剝離保護膜後即刻塗佈液晶組合物,藉此可獲得無配向缺陷,且面內均勻性優異之配向液晶層。According to the above results, it can be seen that by temporarily adhering a protective film with a smaller surface resistance and a smaller peeling force on the back side to the film substrate, and immediately applying the liquid crystal composition after peeling off the protective film from the film substrate, an aligned liquid crystal layer with no alignment defects and excellent in-plane uniformity can be obtained.
對實施例及比較例中所獲得之配向液晶層之膜厚及面內延遲之分佈進行測定,結果比較例1~3之配向液晶層中條紋不均之產生部位之厚度較其他部位小30~40 nm,於厚度較小之部位處面內延遲變小。另一方面,剝離配向液晶層後之膜基材上未確認到條紋狀之厚度不均。The film thickness and in-plane retardation distribution of the aligned liquid crystal layers obtained in the examples and comparative examples were measured. The results showed that the thickness of the aligned liquid crystal layers of Examples 1 to 3 where the stripe unevenness occurred was 30 to 40 nm smaller than that of other parts, and the in-plane retardation became smaller at the thinner thickness parts. On the other hand, no stripe-like thickness unevenness was confirmed on the film substrate after the aligned liquid crystal layer was peeled off.
根據上述結果推測,於比較例1~3中,由於剝離保護膜後之膜基材之局部帶電等,故在塗佈液晶組合物時因收縮而產生了塗佈不良。相對於此,於實施例中,認為由於保護膜之表面電阻及/或剝離力較小,故剝離保護膜後之膜基材之帶電等之影響較小,塗佈不良得到抑制,形成了面內均勻性較高之配向液晶層。Based on the above results, it is speculated that in Comparative Examples 1 to 3, due to the partial charging of the film substrate after the protective film is peeled off, the liquid crystal composition is coated due to shrinkage, resulting in poor coating. In contrast, in the embodiment, it is believed that since the surface resistance and/or peeling force of the protective film are small, the influence of the charging of the film substrate after the protective film is peeled off is small, the poor coating is suppressed, and an aligned liquid crystal layer with high in-plane uniformity is formed.
1:膜基材 1A:第一主面 1B:第二主面 2:保護膜 2A:背面 3:塗層(液晶層) 4:光學層(偏光板) 5:接著劑層 6:黏著劑層 7:隔離件 8:積層體 9:積層體(光學膜) 10:剝離部 11:剝離輥 13:搬送輥 15:按壓輥 15C:連結軸 15L:輥 15R:輥 20:捲繞體 21:捲取輥 23:搬送輥 25:搬送輥 30:塗佈部 31:支承輥 33:模嘴 50:加熱部 55:加熱爐 60:硬化部 61:光源 71, 73, 75, 77, 79:搬送輥 80:捲繞體 81:捲出輥 83, 85, 87:搬送輥 90:捲繞體 91:捲取輥 96:積層體(光學膜) 97:積層體(光學膜) 98:積層體(光學膜) 151:按壓輥 291:芯材 292:黏著劑層 295:防靜電層 1: Film substrate 1A: First main surface 1B: Second main surface 2: Protective film 2A: Back surface 3: Coating (liquid crystal layer) 4: Optical layer (polarizer) 5: Adhesive layer 6: Adhesive layer 7: Isolation element 8: Laminated body 9: Laminated body (optical film) 10: Peeling section 11: Peeling roller 13: Transport roller 15: Pressing roller 15C: Connecting shaft 15L: Roller 15R: Roller 20: Winding body 21: Take-up roller 23: Transport roller 25: Transport roller 30: coating section 31: support roller 33: die nozzle 50: heating section 55: heating furnace 60: curing section 61: light source 71, 73, 75, 77, 79: conveying roller 80: winding body 81: unwinding roller 83, 85, 87: conveying roller 90: winding body 91: take-up roller 96: laminate (optical film) 97: laminate (optical film) 98: laminate (optical film) 151: pressing roller 291: core material 292: adhesive layer 295: Anti-static layer
圖1係膜基材上具備塗層之光學膜之剖視圖。 圖2係膜基材上暫時黏有保護膜之積層體之剖視圖。 圖3係表示於膜基材上形成塗層之製膜裝置及製膜步驟之概要之圖。 圖4係表示按壓輥之形狀之一例之立體圖。 圖5係一實施方式之光學膜之剖視圖。 圖6係一實施方式之光學膜之剖視圖。 圖7係一實施方式之光學膜之剖視圖。 FIG. 1 is a cross-sectional view of an optical film having a coating on a film substrate. FIG. 2 is a cross-sectional view of a laminate having a protective film temporarily adhered to a film substrate. FIG. 3 is a diagram showing an outline of a film-forming device and film-forming steps for forming a coating on a film substrate. FIG. 4 is a three-dimensional view showing an example of the shape of a pressing roller. FIG. 5 is a cross-sectional view of an optical film of an embodiment. FIG. 6 is a cross-sectional view of an optical film of an embodiment. FIG. 7 is a cross-sectional view of an optical film of an embodiment.
1:膜基材 1: Membrane substrate
2:保護膜 2: Protective film
8:積層體 8: Laminated body
9:積層體(光學膜) 9: Laminated body (optical film)
10:剝離部 10: Peeling part
11:剝離輥 11: Peel off the roller
13:搬送輥 13: Transport roller
15:按壓輥 15: Press the roller
20:捲繞體 20: Coiled body
21:捲取輥 21: Rolling roller
23:搬送輥 23: Transport roller
25:搬送輥 25: Transport roller
30:塗佈部 30: Painting Department
31:支承輥 31: Support roller
33:模嘴 33: Mouthpiece
50:加熱部 50: Heating section
55:加熱爐 55: Heating furnace
60:硬化部 60: Hardened part
61:光源 61: Light source
71,73,75,77,79:搬送輥 71,73,75,77,79: conveyor rollers
80:捲繞體 80: coiled body
81:捲出輥 81: Roll out roller
83,85,87:搬送輥 83,85,87: Transport rollers
90:捲繞體 90: Coiled body
91:捲取輥 91: Roller
Claims (10)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020190241A JP6986615B1 (en) | 2020-11-16 | 2020-11-16 | Optical film manufacturing method |
| JP2020-190241 | 2020-11-16 |
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| Publication Number | Publication Date |
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| TW202221072A TW202221072A (en) | 2022-06-01 |
| TWI855198B true TWI855198B (en) | 2024-09-11 |
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| TW109143558A TWI855198B (en) | 2020-11-16 | 2020-12-10 | Optical film manufacturing method |
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| JP (1) | JP6986615B1 (en) |
| KR (1) | KR20220066837A (en) |
| CN (1) | CN114509828A (en) |
| TW (1) | TWI855198B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201509670A (en) * | 2013-07-30 | 2015-03-16 | Nitto Denko Corp | Surface protective film and optical component |
| JP2016012031A (en) * | 2014-06-27 | 2016-01-21 | 日本ゼオン株式会社 | Method for manufacturing multilayer film, retardation film, circularly polarizing plate, and organic electroluminescence display device |
| JP2017119749A (en) * | 2015-12-28 | 2017-07-06 | 日東電工株式会社 | Protective film and laminate for transparent conductive film |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004046068A (en) | 2002-01-23 | 2004-02-12 | Nitto Denko Corp | Method for producing birefringent layer, and optical film including birefringent layer |
| JP4400877B2 (en) * | 2004-09-06 | 2010-01-20 | 東京エレクトロン株式会社 | Substrate processing equipment |
| JP5211607B2 (en) * | 2007-09-26 | 2013-06-12 | 大日本印刷株式会社 | Separator-less protective film |
| JP4656344B2 (en) * | 2008-08-27 | 2011-03-23 | 富士フイルム株式会社 | Web conveying method and apparatus |
| JP5700438B2 (en) * | 2011-06-14 | 2015-04-15 | 三菱樹脂株式会社 | Substrate-less double-sided adhesive sheet |
| US10712484B2 (en) | 2015-01-30 | 2020-07-14 | Zeon Corporation | Multilayer film, use thereof, and production method thereof |
| JP6339515B2 (en) * | 2015-03-26 | 2018-06-06 | 藤森工業株式会社 | Surface protective film and optical component on which it is bonded |
| JP6414983B2 (en) * | 2015-09-10 | 2018-10-31 | 藤森工業株式会社 | Surface protective film and optical component on which it is bonded |
| JP7126306B2 (en) * | 2017-12-06 | 2022-08-26 | 日東電工株式会社 | Surface protective film and optical member with protective film |
| JP7409323B2 (en) * | 2018-12-27 | 2024-01-09 | 日本ゼオン株式会社 | Film manufacturing method, manufacturing device, and manufacturing method of liquid crystal cured film |
| JP7319815B2 (en) * | 2019-04-24 | 2023-08-02 | 日東電工株式会社 | Surface protection film and optical components |
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2020
- 2020-11-16 JP JP2020190241A patent/JP6986615B1/en active Active
- 2020-12-10 TW TW109143558A patent/TWI855198B/en active
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- 2021-11-03 KR KR1020210149558A patent/KR20220066837A/en active Pending
- 2021-11-15 CN CN202111345632.8A patent/CN114509828A/en active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201509670A (en) * | 2013-07-30 | 2015-03-16 | Nitto Denko Corp | Surface protective film and optical component |
| JP2016012031A (en) * | 2014-06-27 | 2016-01-21 | 日本ゼオン株式会社 | Method for manufacturing multilayer film, retardation film, circularly polarizing plate, and organic electroluminescence display device |
| JP2017119749A (en) * | 2015-12-28 | 2017-07-06 | 日東電工株式会社 | Protective film and laminate for transparent conductive film |
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| Publication number | Publication date |
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| JP6986615B1 (en) | 2021-12-22 |
| KR20220066837A (en) | 2022-05-24 |
| CN114509828A (en) | 2022-05-17 |
| JP2022079202A (en) | 2022-05-26 |
| TW202221072A (en) | 2022-06-01 |
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