TWI853709B - Quantum dot structure, forming method thereof and light emitting device including the same - Google Patents
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Abstract
Description
本揭露係關於一種量子點結構、其形成方法及包括其之發光裝置,特別是具有優良的抗水氧特性的一種量子點結構、其形成方法及包括其之發光裝置。The present disclosure relates to a quantum dot structure, a method for forming the same and a light-emitting device including the same, and in particular to a quantum dot structure with excellent water and oxygen resistance, a method for forming the same and a light-emitting device including the same.
量子點(quantum dots, QDs)是奈米級的半導體材料。量子點通常具有由約數百個原子到約數千個原子所形成的球形或類球形晶體結構。量子點是一種波長轉換材料,其具有高色彩飽和度的優點,因此在廣色域(Wide Color Gamut)顯示技術具有極大優勢。Quantum dots (QDs) are nanoscale semiconductor materials. Quantum dots usually have a spherical or quasi-spherical crystal structure formed by about hundreds of atoms to about thousands of atoms. Quantum dots are a wavelength conversion material that has the advantage of high color saturation, so they have great advantages in wide color gamut display technology.
然而,量子點在含有水以及氧的環境下容易被氧化。量子點被氧化會導致其發光波長位移、發光頻譜的半高寬變寬、以及量子效率衰減等問題。因此,在本領域中仍需尋求對氧氣或水氣的阻擋力或耐受性較佳的量子點結構。However, quantum dots are easily oxidized in an environment containing water and oxygen. The oxidation of quantum dots will lead to problems such as wavelength shift of the emission, widening of the half-width of the emission spectrum, and quantum efficiency attenuation. Therefore, there is still a need in the field to find a quantum dot structure with better resistance or tolerance to oxygen or water vapor.
鑒於上述需求,本揭露提供一種對氧氣或水氣的阻擋力或耐受性較佳的量子點結構。In view of the above needs, the present disclosure provides a quantum dot structure with better barrier or tolerance to oxygen or water vapor.
本揭露之一些實施方式提供一種量子點結構,其包括量子點以及包覆量子點的至少一部分且具有不規則狀外表面的第三殼體。所述量子點包括:核體;不連續地位於核體的核體表面周圍的第一殼體;以及位於核體與第一殼體之間且包覆核體表面的第二殼體,其中所述第二殼體具有不規則狀的外表面。Some embodiments of the present disclosure provide a quantum dot structure, which includes a quantum dot and a third shell that covers at least a portion of the quantum dot and has an irregular outer surface. The quantum dot includes: a core; a first shell that is discontinuously located around the core surface of the core; and a second shell that is located between the core and the first shell and covers the core surface, wherein the second shell has an irregular outer surface.
在本揭露的一些實施方式中,量子點在一平面上的投影在第一方向上具有一最大寬度,且在與第一方向垂直的第二方向上具有一最大長度。第三殼體在該平面上的投影與量子點在該平面上的投影以一重疊面積重疊,其中該重疊面積符合以下公式: ≧重疊面積≧ ,其中量子點的最大徑長的延伸方向定義為第一方向,與第一方向垂直的方向定義為第二方向,第一方向與第二方向構成此平面。 In some embodiments of the present disclosure, the projection of the quantum dot on a plane has a maximum width in a first direction and a maximum length in a second direction perpendicular to the first direction. The projection of the third housing on the plane overlaps with the projection of the quantum dot on the plane with an overlapping area, wherein the overlapping area satisfies the following formula: ≧Overlapping area≧ , wherein the extension direction of the maximum diameter of the quantum dot is defined as the first direction, the direction perpendicular to the first direction is defined as the second direction, and the first direction and the second direction constitute this plane.
在本揭露的一些實施方式中,第三殼體與第一殼體之間存有空隙,且第三殼體與第二殼體之間存有空隙。In some embodiments of the present disclosure, there is a gap between the third housing and the first housing, and there is a gap between the third housing and the second housing.
在本揭露的一些實施方式中,第一殼體、第二殼體與第三殼體包括相同材料。In some embodiments of the present disclosure, the first housing, the second housing, and the third housing include the same material.
在本揭露的一些實施方式中,第三殼體的外表面與第二殼體的外表面具有不同的表面廓形。In some embodiments of the present disclosure, the outer surface of the third shell has a different surface profile from the outer surface of the second shell.
在本揭露的一些實施方式中,第二殼體的外表面是一凹凸外表面。所述凹凸外表面的最高點與最低點之間具有一高度差,且所述高度差大於0 nm且小於等於5 nm。In some embodiments of the present disclosure, the outer surface of the second shell is a concave-convex outer surface. There is a height difference between the highest point and the lowest point of the concave-convex outer surface, and the height difference is greater than 0 nm and less than or equal to 5 nm.
在本揭露的一些實施方式中,所述凹凸外表面具有至少一凹陷部,所述凹陷部具有一凹陷寬度,且所述凹陷寬度大於0nm且小於等於10 nm。In some embodiments of the present disclosure, the concave-convex outer surface has at least one concave portion, the concave portion has a concave width, and the concave width is greater than 0 nm and less than or equal to 10 nm.
在本揭露的一些實施方式中,第一殼體可包括複數個殼體顆粒。In some embodiments of the present disclosure, the first shell may include a plurality of shell particles.
在本揭露的一些實施方式中,該複數個顆粒中的部分顆粒彼此堆疊。In some embodiments of the present disclosure, some of the plurality of particles are stacked on top of each other.
在本揭露的一些實施方式中,量子點結構可進一步包括位於第一殼體、第二殼體及/或第三殼體的表面上的配體。In some embodiments of the present disclosure, the quantum dot structure may further include ligands located on the surface of the first shell, the second shell, and/or the third shell.
本揭露之一些實施方式提供量子點結構的形成方法,其包括:提供量子點核體溶液,所述量子點核體溶液包括複數個核體;提供殼體前驅物溶液與量子點核體溶液混合以形成量子點前驅物溶液;於第一溫度下加熱所述量子點前驅物溶液以形成量子點溶液。量子點溶液包括在核體的核體表面上具有第一殼體與第二殼體的量子點,其中第一殼體不連續地形成於核體表面周圍,第二殼體形成於核體與第一殼體之間且包覆核體表面,且第二殼體具有不規則狀的外表面;以及於第二溫度下持續攪拌所述量子點溶液,以形成包括量子點以及包覆所述量子點的至少一部分的第三殼體的量子點結構,其中所述第二溫度大於等於所述第一溫度。Some embodiments of the present disclosure provide a method for forming a quantum dot structure, which includes: providing a quantum dot core solution, the quantum dot core solution including a plurality of cores; providing a shell precursor solution to mix with the quantum dot core solution to form a quantum dot precursor solution; heating the quantum dot precursor solution at a first temperature to form a quantum dot solution. The quantum dot solution includes quantum dots having a first shell and a second shell on the core surface of the core, wherein the first shell is formed discontinuously around the core surface, the second shell is formed between the core and the first shell and covers the core surface, and the second shell has an irregular outer surface; and continuously stirring the quantum dot solution at a second temperature to form a quantum dot structure including quantum dots and a third shell covering at least a portion of the quantum dots, wherein the second temperature is greater than or equal to the first temperature.
在本揭露的一些實施方式中,在提供殼體前驅物溶液至量子點核體溶液的步驟中,殼體前驅物溶液係以一導入速率導入至量子點核體溶液,以量子點核體溶液中的核體含量作為1當量,所述導入速率為0.016~1.6 當量/分鐘 (eq/min)。In some embodiments of the present disclosure, in the step of providing a shell precursor solution to a quantum dot core solution, the shell precursor solution is introduced into the quantum dot core solution at an introduction rate of 0.016 to 1.6 equivalents/minute (eq/min), with the core content in the quantum dot core solution being taken as 1 equivalent.
在本揭露的一些實施方式中,所述第三殼體具有不規則狀的外表面。In some embodiments of the present disclosure, the third housing has an irregular outer surface.
在本揭露的一些實施方式中,第二溫度大於等於250℃且小於等於310℃。In some embodiments of the present disclosure, the second temperature is greater than or equal to 250° C. and less than or equal to 310° C.
在本揭露的一些實施方式中,提供殼體前驅物溶液至量子點核體溶液的步驟包括:以第一導入速率導入第一殼體前驅物溶液;以及以第二導入速率導入第二殼體前驅物溶液,其中以所述量子點核體溶液中的核體含量作為1當量,所述第一導入速率為0.016~1.6 eq/min,所述第二導入速率為0.016~1.6 eq/min,且第一導入速率大於等於第二導入速率。In some embodiments of the present disclosure, the step of providing a shell precursor solution to a quantum dot core solution includes: introducing a first shell precursor solution at a first introduction rate; and introducing a second shell precursor solution at a second introduction rate, wherein the core content in the quantum dot core solution is taken as 1 equivalent, the first introduction rate is 0.016~1.6 eq/min, the second introduction rate is 0.016~1.6 eq/min, and the first introduction rate is greater than or equal to the second introduction rate.
在本揭露的一些實施方式中,進一步包括在形成複數個量子點結構後進行純化製程。In some embodiments of the present disclosure, a purification process is further performed after forming a plurality of quantum dot structures.
本揭露之一些實施方式提供一種發光裝置,包括:發出第一光線的光源;以及吸收部分的第一光線而轉換成第二光線的波長轉換部,其中所述波長轉換部包括上述量子點結構。Some embodiments of the present disclosure provide a light-emitting device, comprising: a light source that emits a first light ray; and a wavelength conversion unit that absorbs a portion of the first light ray and converts it into a second light ray, wherein the wavelength conversion unit includes the above-mentioned quantum dot structure.
根據本揭露的上述實施方式,本揭露的量子點結構包括量子點以及包覆量子點的至少一部分且具有不規則狀外表面的第三殼體。透過上述結構,本揭露的量子點結構對於環境中的破壞因子,像是水、氧或自由基等,可具有較高的阻擋力或較佳的耐受性,並因此可具有較佳的信賴性或較長的發光壽命。本揭露的量子點結構的形成方法可形成具有較佳的信賴性或較長的發光壽命的量子點結構,而包括上述量子點結構的發光裝置也可具有較佳的信賴性或較長的發光壽命。According to the above-mentioned embodiments of the present disclosure, the quantum dot structure of the present disclosure includes quantum dots and a third shell that covers at least a portion of the quantum dots and has an irregular outer surface. Through the above-mentioned structure, the quantum dot structure of the present disclosure can have a higher barrier or better tolerance to destructive factors in the environment, such as water, oxygen or free radicals, and thus can have better reliability or longer luminescence life. The method for forming the quantum dot structure of the present disclosure can form a quantum dot structure with better reliability or longer luminescence life, and the light-emitting device including the above-mentioned quantum dot structure can also have better reliability or longer luminescence life.
以下的揭露內容提供許多不同的實施例或範例以實施本案的不同特徵。以下的揭露內容敘述各個構件及其排列方式的特定範例,以簡化說明。當然,這些特定的範例並非用以限定。例如,若是本揭露實施例敘述了第一特徵部件形成於第二特徵部件之上或上方,即表示其可能包括上述第一特徵部件與上述第二特徵部件是直接接觸的實施例,亦可能包括了有附加特徵部件形成於上述第一特徵部件與上述第二特徵部件之間,而使上述第一特徵部件與第二特徵部件可能未直接接觸的實施例。The following disclosure provides many different embodiments or examples to implement different features of the present invention. The following disclosure describes specific examples of each component and its arrangement to simplify the description. Of course, these specific examples are not intended to be limiting. For example, if the disclosed embodiment describes that a first feature component is formed on or above a second feature component, it means that it may include an embodiment in which the first feature component and the second feature component are in direct contact, and it may also include an embodiment in which an additional feature component is formed between the first feature component and the second feature component, so that the first feature component and the second feature component may not be in direct contact.
應理解的是,額外的操作步驟可實施於所述方法之前、之間或之後,且在所述方法的其他實施例中,部分的操作步驟可被取代或省略。It should be understood that additional operating steps may be implemented before, during or after the method, and in other embodiments of the method, some operating steps may be replaced or omitted.
此外,其中可能用到與空間相關用詞,例如「在… 之下」、「在… 的下方」、「下」、「在… 之上」、「在… 的上方」、「上」及類似的用詞,這些空間相關用詞係為了便於描述圖示中一個(些)元件或特徵部件與另一個(些)元件或特徵部件之間的關係,這些空間相關用詞包括使用中或操作中的裝置之不同方位,以及圖式中所描述的方位。當裝置被轉向不同方位時(例如,旋轉90度或其他方位),則其中所使用的空間相關形容詞也將依轉向後的方位來解釋。In addition, spatially related terms may be used, such as "under", "below", "down", "above", "above", "upper", and similar terms. These spatially related terms are used to facilitate the description of the relationship between one (or some) elements or features and another (or some) elements or features in the diagram. These spatially related terms include different orientations of the device in use or operation, as well as the orientations described in the drawings. When the device is turned to a different orientation (for example, rotated 90 degrees or other orientations), the spatially related adjectives used therein will also be interpreted according to the orientation after the rotation.
在說明書中,「約」、「大約」、「實質上」之用語通常表示在一給定值或範圍的20%之內,或10%之內,或5%之內,或3%之內,或2%之內,或1%之內,或0.5%之內。在此給定的數量為大約的數量,亦即在沒有特定說明「約」、「大約」、「實質上」的情況下,仍可隱含「約」、「大約」、「實質上」之含義。在說明書中,「a~b」之表述表示範圍包括大於等於a的值以及小於等於b的值。In the specification, the terms "about", "approximately", and "substantially" usually mean within 20%, or within 10%, or within 5%, or within 3%, or within 2%, or within 1%, or within 0.5% of a given value or range. The quantities given here are approximate quantities, that is, in the absence of specific description of "about", "approximately", and "substantially", the meaning of "about", "approximately", and "substantially" can still be implied. In the specification, the expression "a~b" means that the range includes values greater than or equal to a and values less than or equal to b.
除非另外定義,在此使用的全部用語(包括技術及科學用語)具有與此篇揭露所屬之一般技藝者所通常理解的相同涵義。能理解的是,這些用語,例如在通常使用的字典中定義的用語,應被解讀成具有與相關技術及本揭露的背景或上下文一致的意思,而不應以一理想化或過度正式的方式解讀,除非在本揭露實施例有特別定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It is understood that these terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning consistent with the background or context of the relevant technology and this disclosure, and should not be interpreted in an idealized or overly formal manner unless specifically defined in the embodiments of this disclosure.
以下所揭露之不同實施例可能重複使用相同的參考符號及/或標記。這些重複係為了簡化與清晰的目的,並非用以限定所討論的不同實施例及/或結構之間有特定的關係。Different embodiments disclosed below may repeatedly use the same reference symbols and/or labels. These repetitions are for the purpose of simplicity and clarity, and are not intended to limit the specific relationship between the different embodiments and/or structures discussed.
本揭露之一些實施方式提供量子點結構的形成方法。本揭露之量子點結構的形成方法包括:提供包括複數個核體之量子點核體溶液; 提供殼體前驅物溶液與量子點核體溶液混合以形成量子點前驅物溶液; 於第一溫度下加熱量子點前驅物溶液,以形成包括複數個量子點的量子點溶液,其中量子點包括在核體表面上具有不連續地形成於核體表面周圍的第一殼體,與形成於核體與第一殼體之間包覆核體表面且具有不規則狀的外表面的第二殼體;以及於第二溫度下持續攪拌量子點溶液以形成量子點結構,其中量子點結構具有量子點以及包覆量子點的至少一部分的第三殼體,且第二溫度大於等於第一溫度。第1圖繪示根據本揭露一些實施例之量子點結構的形成方法1的流程圖。如第1圖所示,量子點結構的形成方法1包括:提供量子點核體溶液的步驟S101、提供殼體前驅物溶液與量子點核體溶液混合以形成量子點前驅物溶液的步驟S103、於第一溫度下加熱量子點前驅物溶液,以形成量子點溶液的步驟S105、以及於第二溫度下攪拌量子點溶液的步驟S107。Some embodiments of the present disclosure provide a method for forming a quantum dot structure. The method for forming a quantum dot structure of the present disclosure includes: providing a quantum dot core solution including a plurality of cores; providing a shell precursor solution to mix with the quantum dot core solution to form a quantum dot precursor solution; heating the quantum dot precursor solution at a first temperature to form a quantum dot solution including a plurality of quantum dots, wherein the quantum dots include a first shell formed discontinuously around the core surface on the core surface, and a second shell formed between the core and the first shell to cover the core surface and having an irregular outer surface; and continuously stirring the quantum dot solution at a second temperature to form a quantum dot structure, wherein the quantum dot structure has quantum dots and a third shell covering at least a portion of the quantum dots, and the second temperature is greater than or equal to the first temperature. FIG. 1 shows a flow chart of a method 1 for forming a quantum dot structure according to some embodiments of the present disclosure. As shown in FIG. 1 , the method 1 for forming a quantum dot structure includes: step S101 of providing a quantum dot core solution, step S103 of providing a shell precursor solution and mixing it with the quantum dot core solution to form a quantum dot precursor solution, step S105 of heating the quantum dot precursor solution at a first temperature to form a quantum dot solution, and step S107 of stirring the quantum dot solution at a second temperature.
在步驟S101中,提供的量子點核體溶液中包括複數個核體。在一些實施例中,提供量子點核體溶液的步驟S101包括將第一核體前驅物溶液以及第二核體前驅物溶液混合以形成一核體前驅物混合溶液的步驟以及加熱所述核體前驅物混合溶液以形成核體的步驟。在一些實施例中,第一核體前驅物溶液以及第二核體前驅物溶液可包括混合加熱後可形成包括無機導體材料或無機半導體材料的核體的任何材料。在一些實施例中,第一核體前驅物溶液及/或第二核體前驅物溶液可包括II族、III 族、IV族、V族、VI族、或其組合之無機半導體材料。加熱溫度可在170℃-270℃。In step S101, the quantum dot nucleus solution provided includes a plurality of nuclei. In some embodiments, the step S101 of providing a quantum dot nucleus solution includes the steps of mixing a first nucleus precursor solution and a second nucleus precursor solution to form a nucleus precursor mixed solution and heating the nucleus precursor mixed solution to form a nucleus. In some embodiments, the first nucleus precursor solution and the second nucleus precursor solution may include any material that can form a nucleus including an inorganic conductor material or an inorganic semiconductor material after mixing and heating. In some embodiments, the first nucleus precursor solution and/or the second nucleus precursor solution may include an inorganic semiconductor material of group II, group III, group IV, group V, group VI, or a combination thereof. The heating temperature may be between 170°C and 270°C.
在步驟S103中,將殼體前驅物溶液提供至自上述步驟S101獲得的量子點核體溶液中,使殼體前驅物溶液與量子點核體溶液混合以形成量子點前驅物溶液。在一些實施例中,殼體前驅物溶液可包括可於後續形成殼體的材料。所述殼體可包括包覆量子點核體溶液中的核體的殼體(即下文所述的第一殼體以及第二殼體)以及包覆包括第一殼體以及第二殼體以及核體之量子點的至少一部分的第三殼體。所述殼體具有與量子點核體溶液中的核體相同或晶格較為匹配的材料。在一些實施例中,殼體前驅物溶液可包括II族、III 族、IV族、V族、VI族、或其組合之無機半導體材料。量子點核體溶液與殼體前驅物溶液的當量比例可為約1:100~1:1。在一些實施例中,步驟S103中提供殼體前驅物溶液與量子點核體溶液混合以形成量子點前驅物溶液的步驟包括將殼體前驅物溶液以約1至2個小時的導入時間緩慢地導入至自上述步驟S101獲得的量子點核體溶液中。以量子點核體溶液中的核體含量作為1當量,殼體前驅物溶液的導入速率為約0.016~1.6 當量/分鐘 (eq/min)。在一些實施例中,殼體前驅物溶液的導入速率為約0.05~1.6 eq/min、約0.06~1.6 eq/min、約0.05~1.55 eq/min、約0.06~1.55 eq/min、約0.05~1.5 eq/min、或約0.06~1.5 eq/min。當殼體前驅物溶液的導入速率為約0.016~1.6 eq/min時,殼體前驅物溶液與量子點核體溶液中的分子具有適當的反應時間,因此該些分子可藉由彼此之間的吸引力以及排斥力作用,於後續階段形成不規則的殼體(例如下文所述的第二殼體以及第三殼體),並同時維持量子點的發光特性。當導入速率小於約0.016 eq/min時,殼體前驅物溶液與量子點核體溶液中的分子彼此之間的反應時間過長,因此該些分子容易形成塊(bulk)材,使後續形成的量子點結構喪失發光特性。當導入速率大於約1.6 eq/min時,殼體前驅物溶液與量子點核體溶液中的分子之間的作用力與殼體的生長速度不平衡,使得於後續階段形成的殼體會具有較大的殼體間隙而無法聚集在核體周圍,因此無法形成對於環境中的破壞因子可具有較高的阻擋力或較佳的耐受性的量子點結構。In step S103, a shell precursor solution is provided to the quantum dot core solution obtained from the above step S101, so that the shell precursor solution is mixed with the quantum dot core solution to form a quantum dot precursor solution. In some embodiments, the shell precursor solution may include a material that can subsequently form a shell. The shell may include a shell that encapsulates the core in the quantum dot core solution (i.e., the first shell and the second shell described below) and a third shell that encapsulates at least a portion of the quantum dots including the first shell, the second shell, and the core. The shell has a material that is the same as or has a more lattice-matched material with the core in the quantum dot core solution. In some embodiments, the shell precursor solution may include an inorganic semiconductor material of Group II, Group III, Group IV, Group V, Group VI, or a combination thereof. The equivalent ratio of the quantum dot core solution to the shell precursor solution may be about 1:100 to 1:1. In some embodiments, the step of providing a shell precursor solution and mixing the quantum dot core solution to form a quantum dot precursor solution in step S103 includes slowly introducing the shell precursor solution into the quantum dot core solution obtained from the above step S101 with an introduction time of about 1 to 2 hours. Taking the core content in the quantum dot core solution as 1 equivalent, the introduction rate of the shell precursor solution is about 0.016 to 1.6 equivalents/minute (eq/min). In some embodiments, the introduction rate of the shell precursor solution is about 0.05-1.6 eq/min, about 0.06-1.6 eq/min, about 0.05-1.55 eq/min, about 0.06-1.55 eq/min, about 0.05-1.5 eq/min, or about 0.06-1.5 eq/min. When the introduction rate of the shell precursor solution is about 0.016-1.6 eq/min, the molecules in the shell precursor solution and the quantum dot core solution have an appropriate reaction time, so that the molecules can form irregular shells (such as the second shell and the third shell described below) in the subsequent stage by the attraction and repulsion between each other, while maintaining the luminescence characteristics of the quantum dots. When the introduction rate is less than about 0.016 eq/min, the reaction time between the molecules in the shell precursor solution and the quantum dot core solution is too long, so the molecules are easily formed into bulk materials, causing the quantum dot structure formed subsequently to lose its luminescence properties. When the introduction rate is greater than about 1.6 eq/min, the interaction between the molecules in the shell precursor solution and the quantum dot core solution and the growth rate of the shell are unbalanced, so that the shell formed in the subsequent stage will have a larger shell gap and cannot be gathered around the core, so it is impossible to form a quantum dot structure that can have a higher barrier or better tolerance to destructive factors in the environment.
在一些實施例中,殼體前驅物溶液可包括第一殼體前驅物溶液以及第二殼體前驅物溶液。在一些實施例中,第一殼體前驅物溶液與第二殼體前驅物溶液的當量比可為1:1。在一些實施例中,步驟S103可包括以第一導入速率導入第一殼體前驅物溶液,以及以第二導入速率導入第二殼體前驅物溶液。以量子點核體溶液中的核體含量作為1當量,第一導入速率為約0.016~1.6 eq/min,第二導入速率為約0.016~1.6 eq/min,且所述第一導入速率大於等於所述第二導入速率。在一些實施例中,第一導入速率可為約0.1~1.6 eq/min、約0.15~1.6 eq/min、約0.2~1.6 eq/min、約0.3~1.6 eq/min、 約0.15~1.55 eq/min、約0.2~1.55 eq/min、約0.3~1.55 eq/min、約0.15~1.5 eq/min、約0.2~1.5 eq/min、或約0.3~1.5 eq/min。在一些實施例中,第二導入速率導入可為約0.05~1.3 eq/min、約0.05~1.2 eq/min、約0.05~1.0 eq/min、約0.06~1.3 eq/min、約0.06~1.2 eq/min、或約0.06~1.0 eq/min。在一些實施例中,第二殼體前驅物溶液可在第一殼體前驅物溶液之後導入,且所述第一導入速率大於等於所述第二導入速率。在一些實施例中,第二殼體前驅物溶液可導入兩次,其中第一殼體前驅物溶液在兩次第二殼體前驅物溶液之間導入,所述第一導入速率大於等於所述第二導入速率。在一些實施例中,第一殼體前驅物溶液及/或第二殼體前驅物溶液可包括可於後續形成殼體的材料。所述殼體可包括包覆量子點核體溶液中之核體的殼體以及包覆包括上述殼體與所述核體之量子點的至少一部分的第三殼體。所述殼體具有與量子點前驅物溶液中的核體相同或晶格較為匹配的材料。在一些實施例中,第一殼體前驅物溶液及/或第二殼體前驅物溶液可包括II族、III 族、IV族、V族、VI族、或其組合之無機半導體材料。In some embodiments, the shell precursor solution may include a first shell precursor solution and a second shell precursor solution. In some embodiments, the equivalent ratio of the first shell precursor solution to the second shell precursor solution may be 1:1. In some embodiments, step S103 may include introducing the first shell precursor solution at a first introduction rate, and introducing the second shell precursor solution at a second introduction rate. Taking the core content in the quantum dot core solution as 1 equivalent, the first introduction rate is about 0.016~1.6 eq/min, the second introduction rate is about 0.016~1.6 eq/min, and the first introduction rate is greater than or equal to the second introduction rate. In some embodiments, the first introduction rate may be about 0.1-1.6 eq/min, about 0.15-1.6 eq/min, about 0.2-1.6 eq/min, about 0.3-1.6 eq/min, about 0.15-1.55 eq/min, about 0.2-1.55 eq/min, about 0.3-1.55 eq/min, about 0.15-1.5 eq/min, about 0.2-1.5 eq/min, or about 0.3-1.5 eq/min. In some embodiments, the second introduction rate may be about 0.05-1.3 eq/min, about 0.05-1.2 eq/min, about 0.05-1.0 eq/min, about 0.06-1.3 eq/min, about 0.06-1.2 eq/min, or about 0.06-1.0 eq/min. In some embodiments, the second shell precursor solution may be introduced after the first shell precursor solution, and the first introduction rate is greater than or equal to the second introduction rate. In some embodiments, the second shell precursor solution may be introduced twice, wherein the first shell precursor solution is introduced between the two second shell precursor solutions, and the first introduction rate is greater than or equal to the second introduction rate. In some embodiments, the first shell precursor solution and/or the second shell precursor solution may include a material that can subsequently form a shell. The shell may include a shell that encapsulates a core in a quantum dot core solution and a third shell that encapsulates at least a portion of the quantum dots including the shell and the core. The shell has a material that is the same as or has a more lattice-matched core in the quantum dot precursor solution. In some embodiments, the first shell precursor solution and/or the second shell precursor solution may include an inorganic semiconductor material of Group II, Group III, Group IV, Group V, Group VI, or a combination thereof.
在步驟S105中,於第一溫度下加熱自步驟S103所獲得的量子點前驅物溶液,以形成包括複數個量子點的量子點溶液。在一些實施例中,第一溫度大於等於250℃且小於等於310℃。步驟S105中形成的量子點為具有核殼結構的量子點。所述量子點之核體的核體表面上具有第一殼體與第二殼體,其中第一殼體不連續地形成於核體表面周圍,第二殼體形成於核體與第一殼體之間且包覆核體表面,且第二殼體具有連續且不規則狀的外表面。在一些實施例中,步驟S105中形成的量子點具有如第2圖所示之核殼結構。In step S105, the quantum dot precursor solution obtained from step S103 is heated at a first temperature to form a quantum dot solution including a plurality of quantum dots. In some embodiments, the first temperature is greater than or equal to 250° C. and less than or equal to 310° C. The quantum dots formed in step S105 are quantum dots having a core-shell structure. The core of the quantum dot has a first shell and a second shell on the core surface, wherein the first shell is discontinuously formed around the core surface, the second shell is formed between the core and the first shell and covers the core surface, and the second shell has a continuous and irregular outer surface. In some embodiments, the quantum dots formed in step S105 have a core-shell structure as shown in FIG. 2.
第2圖繪示根據本揭露一些實施例之量子點20的示意圖。如第2圖所示,量子點20具有核體201、第一殼體205以及第二殼體203。核體201具有核體表面2011,且第一殼體205以及第二殼體203位於核體表面2011上。第一殼體205不連續地分布於核體表面2011周圍。第二殼體203具有連續且不規則狀的外表面2031,形成於核體201與第一殼體205之間且包覆核體表面2011。FIG. 2 is a schematic diagram of a quantum dot 20 according to some embodiments of the present disclosure. As shown in FIG. 2, the quantum dot 20 has a core 201, a first shell 205, and a second shell 203. The core 201 has a core surface 2011, and the first shell 205 and the second shell 203 are located on the core surface 2011. The first shell 205 is discontinuously distributed around the core surface 2011. The second shell 203 has a continuous and irregular outer surface 2031, which is formed between the core 201 and the first shell 205 and covers the core surface 2011.
核體201為量子點20的發光核心。在一些實施例中,核體201的平均直徑大於等於9 nm 且小於等於20 nm。在一些實施例中,核體201可由無機導體材料或無機半導體材料構成。無機半導體材料的實例可包括但不限於II-VI族、III-V族、IV-VI族、及/或IV族之半導體材料,其具體實例可包括但不限於CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe、CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe、HgZnSTe、GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、GaAlNAs、GaAlNSb、 GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、 InAlPAs、InAlPSb、SnS、SnSe、SnTe、PbS、PbSe、PbTe、SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe、SnPbSSe、SnPbSeTe、SnPbSTe、CsPbX 3或Cs 4PbX 6,其中,X為氯、溴、碘或其組合。 The core 201 is the light-emitting core of the quantum dot 20. In some embodiments, the average diameter of the core 201 is greater than or equal to 9 nm and less than or equal to 20 nm. In some embodiments, the core 201 can be made of an inorganic conductive material or an inorganic semiconductor material. Examples of inorganic semiconductor materials may include, but are not limited to, semiconductor materials of Group II-VI, Group III-V, Group IV-VI, and/or Group IV, and specific examples thereof may include, but are not limited to, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, Al NSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe, SnPbSTe, CsPbX3 or Cs4PbX6 , wherein X is chlorine, bromine, iodine or a combination thereof.
在一些實施例中,第二殼體203包覆核體201且與核體201的核體表面2011直接接觸,但本揭露不限於此。在一些實施例中,第二殼體203與核體201之間存在一空隙而不與核體201的核體表面2011直接接觸。第二殼體203具有不規則狀的凹凸外表面。換句話說,第二殼體203具有厚薄不均勻的複數個區域,其中第二殼體203的厚度逐漸變小的區域被定義為凹陷部,而凹陷部中厚度最薄的區域或點被定義為凹陷部的底部。第二殼體203的厚度範圍大於等於0 nm 且小於等於5 nm。第二殼體203中厚度為0 nm的區域表示該區域不存在第二殼體203。因此,相應於該區域的核體表面2011未被第二殼體203覆蓋,從而暴露於外。在一些實施例中,第二殼體大於等於0 nm 且小於等於4 nm,或大於0 nm 且小於等於3 nm。在一些實施例中,第二殼體203具有至少一個凹陷部。所述凹陷部具有一凹陷寬度w,如第2圖所示。在一些實施例中,凹陷寬度w也相當於第二殼體203的一區域中兩頂部之間的距離(此處所謂之頂部是指第二殼體203中,兩側之厚度皆小於該區域或點的厚度之處)。當凹陷部的數量大於2個時,每一個凹陷部的凹陷寬度可彼此相同或不同。如第2圖所示,第二殼體203可具有多個凹陷部2037,每一個凹陷部2037都具有一凹陷寬度w,該些凹陷寬度w可彼此相同或不同。在一些實施例中,凹陷寬度w大於0nm且小於等於10 nm。在一些實施例中,凹陷寬度w大於0nm且小於等於7 nm、大於0nm且小於等於5 nm、或大於0nm且小於等於3 nm。此外,凹陷部具有一凹陷底部,凹陷底部為凹陷部中第二殼體203的厚度最薄的區域或點,凹陷底部與核體表面2011之間具有一距離d。當凹陷部的數量大於2個時,每一個凹陷部的凹陷底部與核體表面2011之間的距離d可彼此相同或不同,如第2圖所示。第二殼體203中的凹陷底部與核體表面2011之間的距離d最小的部分被定義為第二殼體203的最低點2033。在第二殼體203的厚度為0 nm時,距離d為0 nm。第二殼體203中厚度最厚的區域或點被定義為最高點2035。在一些實施例中,第二殼體的外表面是一凹凸外表面,且所述凹凸外表面的最低點2033與最高點2035之間具有一高度差,所述高度差大於0 nm且小於5 nm。In some embodiments, the second shell 203 covers the core 201 and is in direct contact with the core surface 2011 of the core 201, but the present disclosure is not limited thereto. In some embodiments, there is a gap between the second shell 203 and the core 201 and the second shell 203 is not in direct contact with the core surface 2011 of the core 201. The second shell 203 has an irregular concave-convex outer surface. In other words, the second shell 203 has a plurality of regions with uneven thickness, wherein the region where the thickness of the second shell 203 gradually decreases is defined as a recessed portion, and the region or point with the thinnest thickness in the recessed portion is defined as the bottom of the recessed portion. The thickness range of the second shell 203 is greater than or equal to 0 nm and less than or equal to 5 nm. An area with a thickness of 0 nm in the second shell 203 indicates that the second shell 203 does not exist in the area. Therefore, the core surface 2011 corresponding to the area is not covered by the second shell 203 and is exposed to the outside. In some embodiments, the second shell is greater than or equal to 0 nm and less than or equal to 4 nm, or greater than 0 nm and less than or equal to 3 nm. In some embodiments, the second shell 203 has at least one recessed portion. The recessed portion has a recessed width w, as shown in Figure 2. In some embodiments, the recessed width w is also equivalent to the distance between the two tops in an area of the second shell 203 (the top here refers to the second shell 203, where the thickness of both sides is less than the thickness of the area or point). When the number of recessed portions is greater than 2, the recessed width of each recessed portion may be the same as or different from each other. As shown in FIG. 2, the second shell 203 may have a plurality of recessed portions 2037, each of which has a recessed width w, and these recessed widths w may be the same as or different from each other. In some embodiments, the recessed width w is greater than 0 nm and less than or equal to 10 nm. In some embodiments, the recessed width w is greater than 0 nm and less than or equal to 7 nm, greater than 0 nm and less than or equal to 5 nm, or greater than 0 nm and less than or equal to 3 nm. In addition, the recessed portion has a recessed bottom, which is the area or point in the recessed portion where the thickness of the second shell 203 is the thinnest, and there is a distance d between the recessed bottom and the core surface 2011. When the number of the recessed parts is greater than 2, the distance d between the bottom of each recessed part and the core surface 2011 may be the same or different, as shown in FIG. 2. The part where the distance d between the bottom of the recessed part and the core surface 2011 in the second shell 203 is the smallest is defined as the lowest point 2033 of the second shell 203. When the thickness of the second shell 203 is 0 nm, the distance d is 0 nm. The thickest area or point in the second shell 203 is defined as the highest point 2035. In some embodiments, the outer surface of the second shell is a concave-convex outer surface, and there is a height difference between the lowest point 2033 and the highest point 2035 of the concave-convex outer surface, and the height difference is greater than 0 nm and less than 5 nm.
第一殼體205可不連續地分布於核體201的核體表面2011周圍,而第二殼體203可位於核體201與第一殼體205之間,但本揭露不限於此。在一些實施例中,核體201與第一殼體205之間可不存在第二殼體203。在一些實施例中,第一殼體205可與第二殼體203的外表面2031之間相隔間隙g且不連續地分布於第二殼體203周圍,但本揭露不限於此。在第二殼體203的厚度為0 nm的實施例中,第一殼體205可與核體201的核體表面2011之間相隔間隙g且不連續地分布於核體表面2011的周圍。多個間隙g的大小可彼此相同或不同。間隙g可大於等於0 nm且小於等於10 nm。在一些實施例中,間隙g可大於等於0 nm且小於等於7 nm、大於等於0 nm且小於等於5 nm、或大於等於0 nm且小於等於3 nm。The first shell 205 may be distributed discontinuously around the core surface 2011 of the core 201, and the second shell 203 may be located between the core 201 and the first shell 205, but the disclosure is not limited thereto. In some embodiments, the second shell 203 may not exist between the core 201 and the first shell 205. In some embodiments, the first shell 205 may be spaced apart from the outer surface 2031 of the second shell 203 by a gap g and distributed discontinuously around the second shell 203, but the disclosure is not limited thereto. In an embodiment where the thickness of the second shell 203 is 0 nm, the first shell 205 may be spaced apart from the core surface 2011 of the core 201 by a gap g and distributed discontinuously around the core surface 2011. The sizes of the plurality of gaps g may be the same or different from each other. The gap g may be greater than or equal to 0 nm and less than or equal to 10 nm. In some embodiments, the gap g may be greater than or equal to 0 nm and less than or equal to 7 nm, greater than or equal to 0 nm and less than or equal to 5 nm, or greater than or equal to 0 nm and less than or equal to 3 nm.
在一些實施例中,第一殼體205為顆粒狀,在此實施例中,第一殼體205可包括分布於核體201和第二殼體203周圍之複數個顆粒。在一些實施例中,至少部分的第一殼體205中的顆粒可彼此堆疊,如第3圖所示。在一些實施例中,堆疊的第一殼體205顆粒數量小於等於4。在一些實施例中,堆疊的第一殼體205顆粒數量小於等於3。在此實施例中,第一殼體205顆粒的平均直徑大於0nm且小於等於5 nm。在一些實施例中,第一殼體205顆粒的平均直徑大於等於1nm且小於等於5nm、大於等於1 nm且小於等於4 nm、大於等於2 nm且小於等於5nm、或大於等於2 nm且小於等於4 nm。第2圖顯示第一殼體205包括複數個殼體顆粒的態樣,在此實施態樣中,第一殼體205所包括的每個殼體顆粒與第二殼體203的外表面2031的各部分之間相隔的間隙g可彼此相同或不同。In some embodiments, the first shell 205 is granular. In this embodiment, the first shell 205 may include a plurality of particles distributed around the core 201 and the second shell 203. In some embodiments, at least part of the particles in the first shell 205 may be stacked on each other, as shown in FIG. 3. In some embodiments, the number of stacked first shell 205 particles is less than or equal to 4. In some embodiments, the number of stacked first shell 205 particles is less than or equal to 3. In this embodiment, the average diameter of the first shell 205 particles is greater than 0 nm and less than or equal to 5 nm. In some embodiments, the average diameter of the particles of the first shell 205 is greater than or equal to 1 nm and less than or equal to 5 nm, greater than or equal to 1 nm and less than or equal to 4 nm, greater than or equal to 2 nm and less than or equal to 5 nm, or greater than or equal to 2 nm and less than or equal to 4 nm. FIG. 2 shows an embodiment in which the first shell 205 includes a plurality of shell particles. In this embodiment, the gaps g between each shell particle included in the first shell 205 and each portion of the outer surface 2031 of the second shell 203 may be the same or different from each other.
在一些實施例中,第一殼體205與第二殼體203的厚度與間隙g的總和大於0nm且小於等於35 nm,例如總和大於0 nm且小於等於30 nm、大於0 nm且小於等於25 nm、大於0 nm且小於等於20 nm、大於等於1 nm且小於等於25 nm、大於等於2 nm且小於等於25 nm、大於等於5 nm且小於等於25 nm等。舉例而言,在第一殼體205包複數個顆粒的實施例中,第一殼體205顆粒數量為4時,第一殼體205與第二殼體203的厚度與間隙g的總和大於0nm且小於等於35 nm;第一殼體205顆粒數量為3時,第一殼體205與第二殼體203的厚度與間隙g的總和大於0nm且小於等於30 nm;第一殼體205顆粒數量為2時,第一殼體205與第二殼體203的厚度與間隙g的總和大於0nm且小於等於25 nm;第一殼體205顆粒數量為1時,第一殼體205與第二殼體203的厚度與間隙g的總和大於0nm且小於等於20 nm。在一些實施例中,第一殼體205與第二殼體203可包括與核體201相同的材料或是與核體201的材料的晶格較為匹配的材料。在一些實施例中,第一殼體205與第二殼體203可包括相同的材料。In some embodiments, the sum of the thickness and the gap g of the first shell 205 and the second shell 203 is greater than 0 nm and less than or equal to 35 nm, for example, the sum is greater than 0 nm and less than or equal to 30 nm, greater than 0 nm and less than or equal to 25 nm, greater than 0 nm and less than or equal to 20 nm, greater than or equal to 1 nm and less than or equal to 25 nm, greater than or equal to 2 nm and less than or equal to 25 nm, greater than or equal to 5 nm and less than or equal to 25 nm, etc. For example, in an embodiment where the first shell 205 contains a plurality of particles, when the number of particles in the first shell 205 is 4, the sum of the thickness and the gap g between the first shell 205 and the second shell 203 is greater than 0 nm and less than or equal to 35 nm; when the number of particles in the first shell 205 is 3, the sum of the thickness and the gap g between the first shell 205 and the second shell 203 is greater than 0 nm and less than or equal to 30 nm; when the number of particles in the first shell 205 is 2, the sum of the thickness and the gap g between the first shell 205 and the second shell 203 is greater than 0 nm and less than or equal to 25 nm; when the number of particles of the first shell 205 is 1, the sum of the thickness of the first shell 205 and the second shell 203 and the gap g is greater than 0 nm and less than or equal to 20 nm. In some embodiments, the first shell 205 and the second shell 203 may include the same material as the core 201 or a material that is more lattice-matched with the material of the core 201. In some embodiments, the first shell 205 and the second shell 203 may include the same material.
由於量子點20的第一殼體205不連續地位於核體201的核體表面2011周圍,且第二殼體203具有不規則狀的外表面2031,因此量子點20也具有不規則表面。在一些實施例中,量子點20具有最大徑長以及最小徑長。「量子點20的最大徑長」係指包覆量子點20的最小虛擬方框的長寬高中最長的長度。如第2圖所示,量子點20的最大徑長是指包覆量子點20的最小虛擬方框QV在Y方向上的長度(徑長)L1、在X方向上的長度(徑長)L2以及在Z方向上的長度(圖未示)中最長者。更詳細地,最大徑長L1及/或L2涵蓋核體201的直徑、第二殼體203的最大厚度、第一殼體205與第二殼體203之間的最大間隙、以及第一殼體205的最大直徑。此處所謂第一殼體的最大直徑表示堆疊的N顆第一殼體205的最大直徑的總和。在N小於等於4的實施例中,量子點20的最大徑長L1及/或L2可大於等於30 nm且小於等於90 nm。在N小於等於3的實施例中,量子點20的最大徑長L1及/或L2可大於等於30 nm且小於等於80 nm。在N小於等於2的實施例中,量子點20的最大徑長L1及/或L2可大於等於30 nm且小於等於70 nm。在N小於等於1的實施例中,量子點20的最大徑長L1和L2可大於等於30 nm且小於等於60 nm。相對於最大徑長,「量子點20的最小徑長」係指包覆量子點20的最小虛擬方框的長寬高中最短的長度。如第2圖所示,量子點20的最小徑長是指包覆量子點20的最小虛擬方框QV在Y方向上的長度(徑長)L1、在X方向上的長度(徑長)L2以及在Z方向上的長度(圖未示)中最短者。量子點20的最小徑長L1及/或L2涵蓋核體201的直徑以及第二殼體203的最小厚度。因此,本揭露的量子點20的最小徑長L1及/或L2可大於9 nm。Since the first shell 205 of the quantum dot 20 is discontinuously located around the core surface 2011 of the core 201, and the second shell 203 has an irregular outer surface 2031, the quantum dot 20 also has an irregular surface. In some embodiments, the quantum dot 20 has a maximum diameter and a minimum diameter. "The maximum diameter of the quantum dot 20" refers to the longest length of the length, width, and height of the smallest virtual box encapsulating the quantum dot 20. As shown in Figure 2, the maximum diameter of the quantum dot 20 refers to the longest of the length (diameter) L1 in the Y direction, the length (diameter) L2 in the X direction, and the length in the Z direction (not shown) of the smallest virtual box QV encapsulating the quantum dot 20. In more detail, the maximum diameter L1 and/or L2 covers the diameter of the core 201, the maximum thickness of the second shell 203, the maximum gap between the first shell 205 and the second shell 203, and the maximum diameter of the first shell 205. The maximum diameter of the first shell here refers to the sum of the maximum diameters of the stacked N first shells 205. In an embodiment where N is less than or equal to 4, the maximum diameter L1 and/or L2 of the quantum dot 20 may be greater than or equal to 30 nm and less than or equal to 90 nm. In an embodiment where N is less than or equal to 3, the maximum diameter L1 and/or L2 of the quantum dot 20 may be greater than or equal to 30 nm and less than or equal to 80 nm. In an embodiment where N is less than or equal to 2, the maximum diameter L1 and/or L2 of the quantum dot 20 may be greater than or equal to 30 nm and less than or equal to 70 nm. In an embodiment where N is less than or equal to 1, the maximum diameters L1 and L2 of the quantum dot 20 may be greater than or equal to 30 nm and less than or equal to 60 nm. Relative to the maximum diameter, the "minimum diameter of the quantum dot 20" refers to the shortest length of the length, width, and height of the smallest virtual box encapsulating the quantum dot 20. As shown in Figure 2, the minimum diameter of the quantum dot 20 refers to the shortest of the length (diameter) L1 in the Y direction, the length (diameter) L2 in the X direction, and the length in the Z direction (not shown) of the smallest virtual box QV encapsulating the quantum dot 20. The minimum diameter L1 and/or L2 of the quantum dot 20 covers the diameter of the core 201 and the minimum thickness of the second shell 203. Therefore, the minimum diameter L1 and/or L2 of the quantum dot 20 disclosed in the present invention may be greater than 9 nm.
第3圖繪示根據本揭露另一些實施例之量子點20的示意圖。如第3圖所示,量子點20外可進一步分布有配體207。配體207可位於第二殼體203的外表面2031周圍及/或位於間隙g中,如第3圖所示。配體207可進一步提升量子點20的表面立體障礙以加強將環境中的破壞因子侷限在量子點20或配體207的外部或量子點20與配體207之間的能力。配體207可進一步提升量子點20對於環境中破壞因子的阻擋力或耐受性或量子點20的信賴性或發光壽命。配體207可為極性配體或非極性配體。配體207的實例可包括但不限於烷基膦、烷基胺、芳基胺、吡啶、脂肪酸、噻吩、硫醇化合物、碳烯化合物、或其任意組合。脂肪酸的實例可包括但不限於油酸(oleyl acid)、硬脂酸(stearic acid)、月桂酸(lauric acid)、或其任意組合。烷基胺的實例可包括但不限於油胺(oleyl amine)、辛胺(octyl amine)、二辛基胺(dioctyl amine)、十六烷基胺(hexadecyl amine)、或其任意組合。碳烯化合物的實例可包括但不限於1-十八烯(1-octdencene)。烷基膦的實例可包括但不限於三辛基膦。在一些實施例中,配體207的長度可為約1~2.5 nm、約1.2~2.3 nm、約1.3~2.0nm、或約1.5~1.9 nm。FIG. 3 is a schematic diagram of a quantum dot 20 according to other embodiments of the present disclosure. As shown in FIG. 3 , a ligand 207 may be further distributed outside the quantum dot 20. The ligand 207 may be located around the outer surface 2031 of the second shell 203 and/or in the gap g, as shown in FIG. 3 . The ligand 207 may further enhance the surface steric barrier of the quantum dot 20 to enhance the ability to confine destructive factors in the environment to the outside of the quantum dot 20 or the ligand 207 or between the quantum dot 20 and the ligand 207. The ligand 207 may further enhance the resistance or tolerance of the quantum dot 20 to destructive factors in the environment or the reliability or luminescence lifetime of the quantum dot 20. The ligand 207 may be a polar ligand or a non-polar ligand. Examples of ligand 207 may include, but are not limited to, alkylphosphines, alkylamines, arylamines, pyridines, fatty acids, thiophenes, thiol compounds, carbenes, or any combination thereof. Examples of fatty acids may include, but are not limited to, oleyl acid, stearic acid, lauric acid, or any combination thereof. Examples of alkylamines may include, but are not limited to, oleylamine, octylamine, dioctylamine, hexadecylamine, or any combination thereof. Examples of carbenes may include, but are not limited to, 1-octadecene. Examples of alkylphosphines may include, but are not limited to, trioctylphosphine. In some embodiments, the length of ligand 207 may be about 1 to 2.5 nm, about 1.2 to 2.3 nm, about 1.3 to 2.0 nm, or about 1.5 to 1.9 nm.
接著步驟S107於第二溫度下攪拌包括複數個上述量子點(例如,量子點20)的量子點溶液,以形成量子點結構。在一些實施例中,第二溫度大於等於第一溫度。在一些實施例中,第二溫度等於第一溫度。在一些實施例中,第二溫度大於等於250℃且小於等於310℃。步驟S107係以約10~90 rpm攪拌速率攪拌約10~60分鐘。在一些實施例中,攪拌速率可為約20~80 rpm、約30~70 rpm、約40~60 rpm、或約50 rpm。在一些實施例中,攪拌可持續約10~60分鐘、約15~50分鐘、約20~40分鐘、或約30分鐘。所形成的量子點結構具有包覆量子點的至少一部分的第三殼體,如第4圖所示。Then, step S107 is performed to stir the quantum dot solution including a plurality of the above-mentioned quantum dots (e.g., quantum dot 20) at a second temperature to form a quantum dot structure. In some embodiments, the second temperature is greater than or equal to the first temperature. In some embodiments, the second temperature is equal to the first temperature. In some embodiments, the second temperature is greater than or equal to 250° C. and less than or equal to 310° C. Step S107 is performed to stir at a stirring rate of about 10 to 90 rpm for about 10 to 60 minutes. In some embodiments, the stirring rate may be about 20 to 80 rpm, about 30 to 70 rpm, about 40 to 60 rpm, or about 50 rpm. In some embodiments, the stirring may last for about 10 to 60 minutes, about 15 to 50 minutes, about 20 to 40 minutes, or about 30 minutes. The formed quantum dot structure has a third shell that covers at least a portion of the quantum dot, as shown in FIG. 4 .
第4圖繪示根據本揭露一些實施例之量子點結構2的示意圖。量子點結構2包括上述量子點20以及第三殼體40。第三殼體40包覆量子點20的至少一部分且具有不規則狀的外表面401。在一些實施例中,第三殼體40可包括與核體201相同的材料或是與核體201的材料的晶格較為匹配的材料。在一些實施例中,第三殼體40可包括與第一殼體205及/或第二殼體203相同的材料。FIG. 4 is a schematic diagram of a
在本揭露的一些實施方式中,量子點20在一平面上的投影在第一方向上具有一最大寬度,且在與第一方向垂直的第二方向上具有一最大長度。第三殼體40在此平面上的投影與量子點20在此平面上的投影以一重疊面積重疊,其中此重疊面積符合以下公式: ≧重疊面積≧ 。 In some embodiments of the present disclosure, the projection of the quantum dot 20 on a plane has a maximum width in a first direction and a maximum length in a second direction perpendicular to the first direction. The projection of the third housing 40 on this plane overlaps with the projection of the quantum dot 20 on this plane with an overlapping area, wherein the overlapping area satisfies the following formula: ≧Overlapping area≧ .
舉例而言,參照第2圖,將量子點20的最大徑長的延伸方向定義為第一方向,並將與第一方向垂直的方向定義為第二方向。以第一方向和第二方向界定的一平面為基準,量子點20在此平面上的投影在第一方向上具有最大寬度且在與第一方向垂直的第二方向上具有最大長度。在一實施例中,第一方向為Y方向且第二方向為X方向,量子點20的最大寬度為量子點20在XY平面上投影在Y方向上的最大徑長L1,而量子點20的最大長度為量子點20在XY平面上投影在X方向上的最大徑長L2。第三殼體40包覆量子點20的至少一部分表示,第三殼體40在以第一方向和第二方向界定的平面上的投影與量子點20在此平面上的投影至少部分重疊。在一些實施例中,第三殼體40與量子點20在此平面上的投影以一重疊面積重疊,所述重疊面積符合以下公式: 最大寬度L1 最大長度L2≧重疊面積≧1/4 最大寬度L1 最大長度L2。 For example, referring to FIG. 2, the extension direction of the maximum diameter of the quantum dot 20 is defined as the first direction, and the direction perpendicular to the first direction is defined as the second direction. Based on a plane defined by the first direction and the second direction, the projection of the quantum dot 20 on this plane has a maximum width in the first direction and a maximum length in the second direction perpendicular to the first direction. In one embodiment, the first direction is the Y direction and the second direction is the X direction, the maximum width of the quantum dot 20 is the maximum diameter L1 of the quantum dot 20 projected on the XY plane in the Y direction, and the maximum length of the quantum dot 20 is the maximum diameter L2 of the quantum dot 20 projected on the XY plane in the X direction. The third shell 40 covers at least a portion of the quantum dot 20, indicating that the projection of the third shell 40 on the plane defined by the first direction and the second direction at least partially overlaps with the projection of the quantum dot 20 on this plane. In some embodiments, the projections of the third shell 40 and the quantum dot 20 on the plane overlap with an overlapping area, and the overlapping area meets the following formula: Maximum width L1 Maximum length L2≧overlapping area≧1/4 Maximum width L1 Maximum length L2.
在一些實施例中,第三殼體40與量子點20的第一殼體205直接接觸,且第三殼體40與量子點20的第二殼體203直接接觸,但本揭露不限於此。在一些實施例中,第三殼體40與量子點20的第一殼體205之間存有空隙,且第三殼體40與第二殼體203之間存有空隙。In some embodiments, the third shell 40 is in direct contact with the first shell 205 of the quantum dot 20, and the third shell 40 is in direct contact with the second shell 203 of the quantum dot 20, but the disclosure is not limited thereto. In some embodiments, there is a gap between the third shell 40 and the first shell 205 of the quantum dot 20, and there is a gap between the third shell 40 and the second shell 203.
在一些實施例中 ,第三殼體40的外表面401為一連續的凹凸外表面。在一些實施例中,第三殼體40的最低點與最高點之間具有一高度差。第三殼體40的最低點、最高點、以及高度差的定義與第二殼體203的最低點、最高點、以及高度差的定義類似,故於此不再重複。在一些實施例中,第三殼體40的外表面與第二殼體203的外表面具有不同的表面廓形。在一些實施例中,第三殼體40的最低點與最高點之間的高度差小於等於第二殼體203的最低點與最高點之間的高度差。在一些實施例中,第三殼體40的最低點與最高點之間的高度差不為0。In some embodiments, the outer surface 401 of the third shell 40 is a continuous concave-convex outer surface. In some embodiments, there is a height difference between the lowest point and the highest point of the third shell 40. The definition of the lowest point, the highest point, and the height difference of the third shell 40 is similar to the definition of the lowest point, the highest point, and the height difference of the second shell 203, so it is not repeated here. In some embodiments, the outer surface of the third shell 40 has a different surface profile from the outer surface of the second shell 203. In some embodiments, the height difference between the lowest point and the highest point of the third shell 40 is less than or equal to the height difference between the lowest point and the highest point of the second shell 203. In some embodiments, the height difference between the lowest point and the highest point of the third shell 40 is not 0.
包括量子點20以及第三殼體40的量子點結構2可在步驟S107完成之後獲得。在一些實施例中,量子點結構2在以第一方向和第二方向界定的平面上的投影在第一方向上具有結構寬度且在與第二方向上具有結構長度。結構寬度可大於9 nm且小於等於1.5*最大寬度L1。結構長度可大於9 nm且小於等於1.5*最大長度L2。The
在一些實施例中,本揭露一些實施例之量子點結構的形成方法可進一步包括純化步驟S109。在一些實施例中,純化步驟S109可包括以有機溶劑清洗後離心其中包含量子點結構的溶液以獲得純化的量子點結構的純化製程。In some embodiments, the method for forming a quantum dot structure of some embodiments disclosed herein may further include a purification step S109. In some embodiments, the purification step S109 may include a purification process of washing with an organic solvent and then centrifuging the solution containing the quantum dot structure to obtain a purified quantum dot structure.
在一些實施例中,量子點結構可進一步包括位於第一殼體205、第二殼體203及/或第三殼體40的表面上的配體207,如第5圖所示。第5圖繪示根據本揭露一些實施例之量子點結構3的示意圖。量子點結構3包括上述量子點20、包覆量子點20的至少一部分的第三殼體40,以及位於第一殼體205、第二殼體203及/或第三殼體40的表面上的配體207。在一些實施例中,配體207與第一殼體205、第二殼體203的外表面2031及/或第三殼體40的外表面401直接接觸。第5圖所示的配體207與第3圖的配體207實質上相同,故於此不再重複描述。配體207可進一步提升量子點結構3的表面立體障礙、提升量子點結構3對於環境中破壞因子的阻擋力或耐受性、或提升量子點結構3的信賴性或發光壽命。In some embodiments, the quantum dot structure may further include a ligand 207 located on the surface of the first shell 205, the second shell 203 and/or the third shell 40, as shown in FIG. 5. FIG. 5 is a schematic diagram of a quantum dot structure 3 according to some embodiments of the present disclosure. The quantum dot structure 3 includes the above-mentioned quantum dot 20, the third shell 40 covering at least a portion of the quantum dot 20, and the ligand 207 located on the surface of the first shell 205, the second shell 203 and/or the third shell 40. In some embodiments, the ligand 207 is in direct contact with the outer surface 2031 of the first shell 205, the second shell 203 and/or the outer surface 401 of the third shell 40. The ligand 207 shown in FIG. 5 is substantially the same as the ligand 207 of FIG. 3, so it will not be described again here. The ligand 207 can further enhance the surface steric barrier of the quantum dot structure 3, enhance the barrier or tolerance of the quantum dot structure 3 to destructive factors in the environment, or enhance the reliability or luminescence life of the quantum dot structure 3.
上述量子點結構2或量子點結構3可應用於發光裝置中以提供具有較佳的信賴性以及使用壽命的發光裝置。根據本揭露的另一態樣,本揭露進一步提供一種發光裝置,其包括發出第一光線的光源以及吸收部分第一光線而轉換成第二光線的波長轉換部,其中所述波長轉換部包括上述量子點結構2及/或量子點結構3。在一些實施例中,波長轉換部可進一步混合其他螢光粉。此外,可根據所需的光色(例如白光、紅光、藍光、綠光等)來選擇量子點20之核體201的材料,以使發光裝置應用於多種領域,例如應用於照明、車用中控板及儀表板、顯示器的背光單元、發光二極體顯示器(LED display)的RGB像素等。The above-mentioned
第6A圖繪示根據本揭露一些實施例之發光裝置的示意圖。如第6A圖所示,發光裝置是一種LED發光裝置,包括光源4以及波長轉換部5。所述光源4可為發光二極體晶片,可發出具有第一波長的第一光線(例如藍光或UV光)。在一些實施例中,發光二極體晶片包括次毫米發光二極體(mini LED)晶片與微型發光二極體(micro LED)晶片。波長轉換部5可吸收部分光源4所發出的第一光線,並將吸收的第一光線轉換成具有第二波長的第二光線。在一些實施例中,第一波長與二波長不同。波長轉換部5可包括基質6以及均勻地分散於基質6中的量子點結構2,但本揭露不限於此。在一些實施例中,波長轉換部5中的部分或全部的量子點結構2可以用上述量子點結構3所取代。基質6可包括透明樹脂,例如丙烯酸酯類樹脂、有機矽氧烷樹脂、丙烯酸酯改性聚氨酯、丙烯酸酯改性有機矽樹脂或環氧樹脂。在一些實施例中,波長轉換部5可進一步包含均勻地分散於基質6中的擴散粒子。擴散粒子可使入射至基質6內的第一光線散射,藉以增加第一光線通過波長轉換部5的路徑。擴散粒子可包括無機粒子、有機高分子粒子、或其組合。無機粒子的實例包括但不限於氧化矽、氧化鈦、氧化鋁、碳酸鈣、硫酸鋇、或其任意組合。有機高分子粒子的實例包括但不限於聚甲基丙烯酸甲酯(PMMA)、聚苯乙烯(PS)、丙烯腈-丁二烯-苯乙烯共聚物(ABS)、聚氨酯(PU)、或其任意組合。FIG. 6A is a schematic diagram of a light-emitting device according to some embodiments of the present disclosure. As shown in FIG. 6A, the light-emitting device is an LED light-emitting device, comprising a light source 4 and a
在一些實施例中,發光裝置可以是白光發光裝置。如第6A圖所示,在一實施例中,光源4可為藍光發光二極體晶片,波長轉換部5可包括紅色量子點結構2與綠色量子點結構2,其中紅色量子點結構2含有紅色量子點20,綠色量子點結構2含有綠色量子點20。在另一實施例中,光源4可為UV發光二極體晶片,波長轉換部5可包括紅色、綠色、藍色量子點結構2,其中紅色量子點結構2含有紅色量子點20,綠色量子點結構2含有綠色量子點20,而藍色量子點結構2含有藍色量子點20。在一些實施例中,波長轉換部5中的部分或全部的量子點結構2可以上述量子點結構3所取代。在一些實施例中,發光裝置可發出單色光,例如紅光、綠光或藍光等。發出紅光的發光裝置可包括紅色量子點結構2或3以及發出藍光或UV光的光源4。在此實施例中,光源4可為發光二極體晶片,來自發光二極體晶片的藍光或UV光可激發紅色量子點結構2或3以發出紅光。發出綠光的發光裝置可包括綠色量子點結構2或3以及發出藍光或UV光的光源4。在此實施例中,光源4可為發光二極體晶片,來自發光二極體晶片的藍光或UV光可激發綠色量子點結構2或3以發出綠光。藍光發光裝置可包括藍色量子點結構2或3以及發出藍光或UV光的光源4。在此實施例中,光源4可為發光二極體晶片,來自發光二極體晶片的藍光或UV光可激發藍色量子點結構2或3以發出藍光。前述紅光發光裝置、綠光發光裝置與藍光發光裝置可作為發光二極體顯示器或微型發光二極體顯示器中的像素。In some embodiments, the light emitting device may be a white light emitting device. As shown in FIG. 6A , in one embodiment, the light source 4 may be a blue light emitting diode chip, and the
第6B圖繪示根據本揭露一些實施例之發光裝置的示意圖。如第6B圖所示,發光裝置可為晶片級封裝(CSP),其中光源4可為覆晶式發光二極體晶片,波長轉換部5可為包括量子點結構2、量子點結構3、或其組合的量子點膜。量子點膜可包覆光源4的頂面與側面,如第6B圖所示。在其他實施例中,量子點膜包覆光源4的頂面。在一些實施例中,發光二極體晶片包括次毫米發光二極體(mini LED)晶片與微型發光二極體(micro LED)晶片。FIG. 6B is a schematic diagram of a light emitting device according to some embodiments of the present disclosure. As shown in FIG. 6B , the light emitting device may be a chip-level package (CSP), wherein the light source 4 may be a flip-chip light emitting diode chip, and the
在一些實施例中,發光裝置可為發白光的晶片級封裝(CSP)。如第6B圖所示,在一實施例中,光源4可為覆晶式藍光發光二極體晶片,波長轉換部5可以量子點膜的形式包覆光源4的頂面與側面,或是包覆光源4的頂面,其中量子點膜可包括紅色量子點結構2與綠色量子點結構2,且紅色量子點結構2含有紅色量子點20,綠色量子點結構2含有綠色量子點20。在其他實施例中,光源4可為覆晶式UV發光二極體晶片,波長轉換部5可以量子點膜的形式包覆光源4的頂面與側面,或是包覆光源4的頂面,其中量子點膜可包括紅色、綠色、藍色量子點結構2,且紅色量子點結構2含有紅色量子點20,綠色量子點結構2含有綠色量子點20,而藍色量子點結構2含有藍色量子點20。量子點膜中的部分或全部的量子點結構2可以上述量子點結構3所取代。在一些實施例中,發光裝置可為發出單色光,例如紅光、綠光或藍光的晶片級封裝發光裝置。發出紅光的發光裝置可包括含有紅色量子點結構2或3的量子點膜以及發出藍光或UV光的光源4。在此實施例中,光源4可為發光二極體晶片,來自發光二極體晶片的藍光或UV光可激發紅色量子點結構2或3以發出紅光。發出綠光的發光裝置可包括含有綠色量子點結構2或3的量子點膜以及發出藍光或UV光的光源4。在此實施例中,光源4可為發光二極體晶片,來自發光二極體晶片的藍光或UV光可激發綠色量子點結構2或3以發出綠光。藍光發光裝置可包括含有藍色量子點結構2或3的量子點膜以及發出藍光或UV光的光源4。在此實施例中,光源4可為發光二極體晶片,來自發光二極體晶片的藍光或UV光可激發藍色量子點結構2或3以發出藍光。前述發紅光、藍光、綠光的晶片級封裝發光裝置可作為發光二極體顯示器(LED display)或微型發光二極體顯示器(Micro LED display)中的像素。In some embodiments, the light emitting device may be a chip-scale package (CSP) that emits white light. As shown in FIG. 6B , in one embodiment, the light source 4 may be a flip-chip blue light emitting diode chip, and the
在一些實施例中,微型發光二極體顯示器可包含如第6A圖或第6B圖所示的多個紅光發光裝置、綠光發光裝置及/或藍光發光裝置。在一些實施例中,微型發光二極體顯示器的藍光發光裝置可只含有藍光微型發光二極體晶片而不包括前述波長轉換部5。In some embodiments, the micro-LED display may include a plurality of red light emitting devices, green light emitting devices and/or blue light emitting devices as shown in FIG. 6A or FIG. 6B. In some embodiments, the blue light emitting device of the micro-LED display may only include a blue micro-LED chip without the aforementioned
在一些實施例中,前述的波長轉換部5除了含有量子點結構2及/或量子點結構3外,亦可與其他螢光粉混合。在一實施例中,波長轉換部5可包括紅色量子點結構2與綠色螢光粉,其中綠色螢光粉可為例如鎦鋁石榴石(LuAG)螢光粉、釔鋁石榴石(YAG)螢光粉、賽隆(β-SiAlON)螢光粉、矽酸鹽(Silicate)螢光粉,但不以此為限。在另一實施例中,波長轉換部5可包括綠色量子點結構2與紅色螢光粉,其中紅色螢光粉可為例如(Sr,Ca)AlSiN
3:Eu
2+、Ca
2Si
5N
8:Eu
2+、Sr(LiAl
3N
4):Eu
2、錳摻雜紅色氟化物螢光粉(例如K
2GeF
6:Mn
4+、K
2SiF
6:Mn
4+、K
2TiF
6:Mn
4+等),但不以此為限。
In some embodiments, the
本揭露提供一種背光單元,其含有多個前述白光發光裝置。本揭露提供一種顯示器,其包括前述背光單元。在一些實施例中,顯示器為液晶顯示器。The present disclosure provides a backlight unit, which contains a plurality of the aforementioned white light emitting devices. The present disclosure provides a display, which includes the aforementioned backlight unit. In some embodiments, the display is a liquid crystal display.
在一些實施例中,波長轉換部5可為量子點層(QD layer),如第6C圖所示。第6C圖繪示根據本揭露一些實施例之波長轉換部5的示意圖,其中所述波長轉換部5為量子點層。所述量子點層可包含透明基質6與量子點結構2,且其中部分或全部的量子點結構2可以上述量子點結構3所取代。透明基質6可包括例如丙烯酸酯類樹脂、有機矽氧烷樹脂、丙烯酸酯改性聚氨酯、丙烯酸酯改性有機矽樹脂或環氧樹脂。在一些實施例中,量子點層可應用於顯示器的背光單元。在一些實施例中,背光單元提供白光,其中背光單元包括量子點層以及含有多個藍光發光二極體晶片的燈板,所述量子點層含有綠色與紅色的量子點結構2或量子點結構3或其組合。同理,如前面所述,量子點層可根據需求含有其他螢光粉來與量子點結構混合。In some embodiments, the
為了讓本揭露之上述和其他目的、特徵、和優點能更明顯易懂,下文特舉量子點結構和量子點之製備,並利用量子點結構和量子點分別製備成發光裝置後在無阻隔水氧的一般環境下與無水氧的氮氣環境下進行燒測,以觀察量子點結構和量子點水氧耐受度以及信賴性。此些實驗內容可具體地說明根據本揭露內容之實施例的量子點結構的形成方法所製成的量子點結構的特性、根據本揭露內容之實施例的量子點結構可達成的功效、以及應用本揭露內容所製得之發光裝置的特性。然而以下之實施例和比較例僅為例示說明之用,而不應被解釋為本揭露內容實施之限制。In order to make the above and other purposes, features, and advantages of the present disclosure more clearly understood, the preparation of quantum dot structures and quantum dots is specifically cited below, and the quantum dot structures and quantum dots are used to prepare light-emitting devices, and then fired in a general environment without water and oxygen barriers and in a nitrogen environment without water and oxygen barriers to observe the water and oxygen tolerance and reliability of the quantum dot structures and quantum dots. These experimental contents can specifically illustrate the characteristics of the quantum dot structure made according to the method for forming the quantum dot structure of the embodiments of the present disclosure, the effects that can be achieved by the quantum dot structure according to the embodiments of the present disclosure, and the characteristics of the light-emitting device made by applying the present disclosure. However, the following embodiments and comparative examples are only for illustrative purposes and should not be interpreted as limitations on the implementation of the present disclosure.
[核體溶液的製備][Preparation of nuclear solution]
<第一核體前驅物溶液><First nuclear precursor solution>
首先將64 mg氧化鎘(CdO)、1615 mg氧化鋅(ZnO)、20 mL油酸(Oleic acid,OA)以及80 mL 1-十八烯(1-octdencene,ODE)放入250 mL三頸圓底瓶中形成一混合物。將該混合物於100m torr下抽氣加熱150℃約120分鐘,接著將氮氣或是惰性氣體通入三頸圓底瓶中,得到4當量作為第一核體前驅物溶液的鎘-鋅 (Cd-Zn)混合溶液。First, 64 mg of cadmium oxide (CdO), 1615 mg of zinc oxide (ZnO), 20 mL of oleic acid (OA) and 80 mL of 1-octdencene (ODE) were placed in a 250 mL three-neck round-bottom flask to form a mixture. The mixture was evacuated at 100 m torr and heated to 150°C for about 120 minutes, and then nitrogen or inert gas was introduced into the three-neck round-bottom flask to obtain 4 equivalents of a cadmium-zinc (Cd-Zn) mixed solution as the first nuclear precursor solution.
<第二核體前驅物溶液><Second nuclear precursor solution>
將655 mg硒粉(Se)、148 mg硫粉(S)、以及8 g三辛基膦(TOP)放入燒杯中,攪拌澄清後通入氮氣密封,得到作為第二核體前驅物溶液的硒-硫混合液。655 mg of selenium powder (Se), 148 mg of sulfur powder (S), and 8 g of trioctylphosphine (TOP) were placed in a beaker, stirred to clarify, and then nitrogen was introduced to seal the beaker to obtain a selenium-sulfur mixed solution as the second nuclear precursor solution.
[殼體前驅物溶液的製備][Preparation of Shell Propulsion Solution]
<第一殼體前驅物溶液><First Shell Precursor Solution>
將5.6 g無水醋酸鋅、4 g油酸(OA)、以及20 g 1-十八烯(ODE)放入50 mL三頸圓底瓶中,加熱到150℃約30分鐘,澄清後加入氮氣密封,得到0.7當量作為第一殼體前驅物溶液的Zn-OA溶液。5.6 g of anhydrous zinc acetate, 4 g of oleic acid (OA), and 20 g of 1-octadecene (ODE) were placed in a 50 mL three-neck round-bottom flask, heated to 150°C for about 30 minutes, and sealed with nitrogen after clarification to obtain 0.7 equivalents of Zn-OA solution as the first shell precursor solution.
<第二殼體前驅物溶液><Second Shell Precursor Solution>
將352mg 硫粉以及5.5 g 三辛基膦(TOP)放入燒杯中,攪拌澄清後通入氮氣密封,得到1當量作為第二殼體前驅物溶液的S-TOP溶液。352 mg of sulfur powder and 5.5 g of trioctylphosphine (TOP) were placed in a beaker, stirred to clarify, and then nitrogen was introduced to seal the beaker to obtain 1 equivalent of S-TOP solution as the second shell precursor solution.
[比較例量子點1的製備][Preparation of Comparative Example Quantum Dot 1]
取1當量的第一核體前驅物溶液加熱到280℃並反應3分鐘後,將1當量的第二核體前驅物溶液導入加熱過的第一核體前驅物溶液,接著升溫到320℃並反應10分鐘以形成核體溶液。將第二殼體前驅物溶液導入所得之核體溶液反應10分鐘後降溫到250℃,接著將1當量的第一殼體前驅物溶液快速導入核體溶液中,然後再將1當量的第二殼體前驅物溶液導入核體溶液以獲得一量子點前驅物溶液,將所得之量子點前驅物溶液在250℃加熱20分鐘以合成量子點。將包含量子點的溶液降溫至室溫後重複4次以100 mL甲醇/80 mL甲苯清洗後離心量子點溶液的步驟,藉以獲得純化之比較例量子點1。One equivalent of the first core precursor solution is heated to 280°C and reacted for 3 minutes, and then one equivalent of the second core precursor solution is introduced into the heated first core precursor solution, and then the temperature is raised to 320°C and reacted for 10 minutes to form a core solution. The second shell precursor solution is introduced into the obtained core solution and reacted for 10 minutes, and then the temperature is lowered to 250°C, and then one equivalent of the first shell precursor solution is quickly introduced into the core solution, and then one equivalent of the second shell precursor solution is introduced into the core solution to obtain a quantum dot precursor solution, and the obtained quantum dot precursor solution is heated at 250°C for 20 minutes to synthesize quantum dots. The solution containing quantum dots was cooled to room temperature, and then the steps of washing with 100 mL of methanol/80 mL of toluene and then centrifuging the quantum dot solution were repeated 4 times to obtain purified comparative example quantum dots 1.
[比較例量子點2的製備][Preparation of Comparative Example Quantum Dot 2]
取1當量的第一核體前驅物溶液加熱到280℃並反應3分鐘後,將1當量的第二核體前驅物溶液導入至加熱過的第一核體前驅物溶液,接著升溫到320℃並反應10分鐘以形成核體溶液。將第二殼體前驅物溶液導入所得之核體溶液反應10分鐘後降溫到250℃,以0.38 eq/min之導入速率將1當量的第一殼體前驅物溶液導入核體溶液,然後再以0.9 eq/min之導入速率將1當量的第二殼體前驅物溶液導入核體溶液以獲得一量子點前驅物溶液,將所得之量子點前驅物溶液在250℃加熱60分鐘以形成其中包括量子點的量子點溶液。將量子點溶液降溫至室溫後,以100 mL甲醇/80 mL甲苯重複清洗量子點溶液4次,接著離心量子點溶液,藉以獲得純化之比較例量子點2。One equivalent of the first core precursor solution is heated to 280°C and reacted for 3 minutes, and then one equivalent of the second core precursor solution is introduced into the heated first core precursor solution, and then the temperature is raised to 320°C and reacted for 10 minutes to form a core solution. The second shell precursor solution is introduced into the obtained core solution for 10 minutes and then cooled to 250°C, and one equivalent of the first shell precursor solution is introduced into the core solution at an introduction rate of 0.38 eq/min, and then one equivalent of the second shell precursor solution is introduced into the core solution at an introduction rate of 0.9 eq/min to obtain a quantum dot precursor solution, and the obtained quantum dot precursor solution is heated at 250°C for 60 minutes to form a quantum dot solution including quantum dots. After the quantum dot solution was cooled to room temperature, it was washed four times with 100 mL methanol/80 mL toluene, and then the quantum dot solution was centrifuged to obtain purified comparative
[量子點結構的製備][Preparation of quantum dot structure]
取1當量的第一核體前驅物溶液加熱到280℃並反應3分鐘後,將1當量的第二核體前驅物溶液導入至加熱過的第一核體前驅物溶液,接著升溫到320℃並反應10分鐘以形成核體溶液。將第二殼體前驅物溶液導入所得之核體溶液反應10分鐘後降溫到250℃,以0.38 eq/min之導入速率將1當量的第一殼體前驅物溶液導入核體溶液,然後再以0.9 eq/min之導入速率將1當量的第二殼體前驅物溶液導入核體溶液以獲得一量子點前驅物溶液,將所得之量子點前驅物溶液在250℃加熱60分鐘以形成其中包括量子點的量子點溶液。將磁石置於量子點溶液中,於250℃下以50 rpm的轉速攪拌量子點溶液15分鐘後,將攪拌過後之量子點溶液靜置30分鐘以形成其中包括量子點結構的量子點結構溶液。將量子點結構溶液降溫至室溫後,以100 mL甲醇/80 mL甲苯重複清洗量子點結構溶液4次,接著離心量子點結構溶液,藉以獲得純化之量子點結構。One equivalent of the first core precursor solution is heated to 280°C and reacted for 3 minutes, and then one equivalent of the second core precursor solution is introduced into the heated first core precursor solution, and then the temperature is raised to 320°C and reacted for 10 minutes to form a core solution. The second shell precursor solution is introduced into the obtained core solution for 10 minutes and then cooled to 250°C, and one equivalent of the first shell precursor solution is introduced into the core solution at an introduction rate of 0.38 eq/min, and then one equivalent of the second shell precursor solution is introduced into the core solution at an introduction rate of 0.9 eq/min to obtain a quantum dot precursor solution, and the obtained quantum dot precursor solution is heated at 250°C for 60 minutes to form a quantum dot solution including quantum dots. The magnet was placed in the quantum dot solution, and the quantum dot solution was stirred at 250°C and 50 rpm for 15 minutes, and then the stirred quantum dot solution was allowed to stand for 30 minutes to form a quantum dot structure solution including the quantum dot structure. After the quantum dot structure solution was cooled to room temperature, the quantum dot structure solution was repeatedly washed 4 times with 100 mL methanol/80 mL toluene, and then the quantum dot structure solution was centrifuged to obtain a purified quantum dot structure.
以穿透式電子顯微鏡(TEM,日本JEOL生產,型號 JEM-2100F)分析比較例量子點1和2以及量子點結構。第7圖係本揭露比較例量子點1的穿透式電子顯微鏡(TEM)圖。第8圖係本揭露比較例量子點2的TEM圖。第9圖係本揭露實施例之量子點結構的TEM圖。平均隨機測量的50個比較例量子點1和2以及量子點結構的最大徑長以獲得平均最大徑長。以螢光光譜儀(Fluoromax-4 Spectrofluorometer)量測量子點結構以及比較例量子點1和2的量子效率。量子點結構以及比較例量子點1和2的平均最大徑長以及量子效率如以下表1所示。
表1
由表1可以看出,本揭露實施例的量子點結構的平均最大徑長為比較例量子點1的約2.2~3.6倍,且本揭露實施例的量子點結構的平均最大徑長為比較例量子點2的約1.1~1.8倍。量子點結構以及比較例量子點1和2的量子效率皆大於約60%。As can be seen from Table 1, the average maximum diameter of the quantum dot structure of the disclosed embodiment is about 2.2 to 3.6 times that of the comparative example quantum dot 1, and the average maximum diameter of the quantum dot structure of the disclosed embodiment is about 1.1 to 1.8 times that of the comparative example
[發光裝置的製備][Preparation of light-emitting device]
將量子點結構以及比較例量子點1和2分別與有機矽氧烷樹脂混合後塗佈於波長約450~460 nm,光能(optical power)約為34.6 mW且晶片大小約為0.35*0.70 mm的藍光發光二極體晶片上以分別獲得實施例的發光裝置和比較例1以及比較例2的發光裝置。比較例1的發光裝置包括比較例量子點1,而比較例2的發光裝置包括比較例量子點2。The quantum dot structure and comparative example
[發光裝置的性能測試][Performance test of light emitting device]
以20 mA的電流、3.0 V的驅動電壓、以及15 mA的持續點亮電流在無水氧的氮氣環境下點亮實施例的發光裝置和比較例的發光裝置1000 小時左右。在無阻隔水氧的一般環境下點亮實施例的發光裝置和比較例的發光裝置300 小時左右。以亮度量測儀器(維明企業/6122)分別量測實施例的發光裝置和比較例的發光裝置的發光強度隨時間衰減的程度,並以所得數據製成如第10圖以及第11圖所示之折線圖。第10圖繪示本揭露實施例與比較例之發光裝置的發光強度在氮氣環境下隨著時間變化的折線圖。第11圖繪示本揭露實施例與比較例之發光裝置的發光強度在一般環境下隨著時間變化的折線圖。The light-emitting device of the embodiment and the light-emitting device of the comparative example were illuminated for about 1000 hours in a nitrogen environment without water and oxygen at a current of 20 mA, a driving voltage of 3.0 V, and a continuous lighting current of 15 mA. The light-emitting device of the embodiment and the light-emitting device of the comparative example were illuminated for about 300 hours in a general environment without water and oxygen barriers. The degree of attenuation of the light-emitting intensity of the light-emitting device of the embodiment and the light-emitting device of the comparative example over time was measured using a brightness measurement instrument (Weiming Enterprise/6122), and the obtained data was used to prepare the line graphs shown in Figures 10 and 11. FIG10 is a line graph showing the variation of the luminous intensity of the luminous device of the embodiment and the comparative example in a nitrogen environment with time. FIG11 is a line graph showing the variation of the luminous intensity of the luminous device of the embodiment and the comparative example in a general environment with time.
由第10圖可看出在氮氣環境下點亮1000小時後,比較例1之發光裝置的發光強度與初始發光強度相比降低了約50%;比較例2之發光裝置的發光強度與初始發光強度相比降低了約20%;而實施例之發光裝置的發光強度與初始發光強度相比沒有降低。由第11圖可看出在一般環境下點亮100小時左右時,比較例2之發光裝置的發光強度與初始發光強度相比降低了約20%,而實施例之發光裝置的發光強度與初始發光強度相比降低了不到約5%。由上述實驗結果可明顯看出,與比較例的發光裝置相比,本案實施例的發光裝置不論是在氮氣環境或一般環境下皆具有較佳的信賴性或較長的發光壽命。也就是說,與比較例量子點相比,本揭露之量子點結構對於環境破壞因子具有較高的阻擋力或較佳的耐受性,並因此具有較佳的信賴性或較長的發光壽命。As shown in FIG. 10, after being lit for 1000 hours in a nitrogen environment, the luminous intensity of the luminous device of Comparative Example 1 decreased by about 50% compared with the initial luminous intensity; the luminous intensity of the luminous device of Comparative Example 2 decreased by about 20% compared with the initial luminous intensity; while the luminous intensity of the luminous device of the embodiment did not decrease compared with the initial luminous intensity. As shown in FIG. 11, after being lit for about 100 hours in a general environment, the luminous intensity of the luminous device of Comparative Example 2 decreased by about 20% compared with the initial luminous intensity, while the luminous intensity of the luminous device of the embodiment decreased by less than about 5% compared with the initial luminous intensity. It can be clearly seen from the above experimental results that, compared with the light-emitting device of the comparative example, the light-emitting device of the embodiment of the present case has better reliability or longer luminescence life in both nitrogen environment and general environment. In other words, compared with the quantum dots of the comparative example, the quantum dot structure disclosed in the present invention has higher resistance or better tolerance to environmental damage factors, and therefore has better reliability or longer luminescence life.
以上概述數個實施例的部件,以便在本揭露所屬技術領域中具有通常知識者可以更理解本揭露實施例的觀點。在本揭露所屬技術領域中具有通常知識者應該理解,他們能以本揭露實施例為基礎,設計或修改其他製程和結構以達到與在此介紹的實施例相同之目的及/或優勢。在本揭露所屬技術領域中具有通常知識者也應該理解到,此類等效的結構並無悖離本揭露的精神與範圍,且他們能在不違背本揭露之精神和範圍之下,做各式各樣的改變、取代和替換。因此,本揭露之保護範圍當視後附之申請專利範圍所界定者為準。另外,雖然本揭露已以數個較佳實施例揭露如上,然其並非用以限定本揭露。The above summarizes the components of several embodiments so that those with ordinary knowledge in the art to which the present disclosure belongs can better understand the viewpoints of the embodiments of the present disclosure. Those with ordinary knowledge in the art to which the present disclosure belongs should understand that they can design or modify other processes and structures based on the embodiments of the present disclosure to achieve the same purpose and/or advantages as the embodiments introduced herein. Those with ordinary knowledge in the art to which the present disclosure belongs should also understand that such equivalent structures do not deviate from the spirit and scope of the present disclosure, and they can make various changes, substitutions and replacements without violating the spirit and scope of the present disclosure. Therefore, the scope of protection of the present disclosure shall be defined by the scope of the attached patent application. In addition, although the present disclosure has been disclosed as above with several preferred embodiments, it is not used to limit the present disclosure.
整份說明書對特徵、優點或類似語言的引用,並非意味可以利用本揭露實現的所有特徵和優點應該或者可以在本揭露的任何單個實施例中實現。相對地,涉及特徵和優點的語言被理解為其意味著結合實施例描述的特定特徵、優點或特性包括在本揭露的至少一個實施例中。因而,在整份說明書中對特徵和優點以及類似語言的討論可以但不一定代表相同的實施例。References throughout this specification to features, advantages, or similar language do not imply that all features and advantages that may be achieved using the present disclosure should or may be achieved in any single embodiment of the present disclosure. Rather, language referring to features and advantages is understood to mean that a particular feature, advantage, or characteristic described in connection with an embodiment is included in at least one embodiment of the present disclosure. Thus, discussions of features and advantages and similar language throughout this specification may, but do not necessarily, refer to the same embodiment.
再者,在一個或多個實施例中,可以任何合適的方式組合本揭露的所描述的特徵、優點和特性。根據本文的描述,相關領域的技術人員將意識到,可在沒有特定實施例的一個或多個特定特徵或優點的情況下實現本揭露。在其他情況下,在某些實施例中可辨識附加的特徵和優點,這些特徵和優點可能不存在於本揭露的所有實施例中。Furthermore, the described features, advantages, and characteristics of the present disclosure may be combined in any suitable manner in one or more embodiments. Based on the description herein, a person skilled in the relevant art will recognize that the present disclosure may be implemented without one or more of the specific features or advantages of a particular embodiment. In other cases, additional features and advantages may be identified in certain embodiments that may not be present in all embodiments of the present disclosure.
1:量子點形成方法
2,3:量子點結構
20:量子點
201:核體
2011:核體表面
203:第二殼體
2031,401:外表面
2033:最低點
2035:最高點
2037:凹陷部
205:第一殼體
207:配體
40:第三殼體
4:光源
5:波長轉換部
6:基質
g:間隙
w:凹陷寬度
d:距離
QV:虛擬方框
L1, L2:長度
S101,S103,S105,S107,S109:步驟
1: Quantum
以下將配合所附圖式詳述本揭露實施例。應注意的是,各種特徵部件並未按照比例繪製且僅用以說明例示。事實上,元件的尺寸可能經放大或縮小,以清楚地表現出本揭露實施例的技術特徵。 第1圖繪示根據本揭露一些實施例之量子點結構的形成方法流程圖。 第2圖繪示根據本揭露一些實施例之量子點的示意圖。 第3圖繪示根據本揭露一些實施例之量子點的示意圖。 第4圖繪示根據本揭露一些實施例之量子點結構的示意圖。 第5圖繪示根據本揭露一些實施例之量子點結構的示意圖。 第6A圖繪示根據本揭露一些實施例之發光裝置的示意圖。 第6B圖繪示根據本揭露一些實施例之發光裝置的示意圖。 第6C圖繪示根據本揭露一些實施例之波長轉換部的示意圖。 第7圖係本揭露一比較例量子點的穿透式電子顯微鏡(TEM)圖。 第8圖係本揭露一比較例量子點的TEM圖。 第9圖係本揭露一實施例之量子點結構的TEM圖。 第10圖繪示本揭露實施例以及比較例之發光裝置的發光強度在氮氣環境下隨著時間變化的折線圖。 第11圖繪示本揭露實施例以及比較例之發光裝置的發光強度在一般環境下隨著時間變化的折線圖。 The following will be described in detail with the accompanying drawings. It should be noted that the various characteristic components are not drawn in proportion and are only used for illustration. In fact, the size of the components may be enlarged or reduced to clearly show the technical features of the embodiments of the present disclosure. Figure 1 shows a flow chart of a method for forming a quantum dot structure according to some embodiments of the present disclosure. Figure 2 shows a schematic diagram of a quantum dot according to some embodiments of the present disclosure. Figure 3 shows a schematic diagram of a quantum dot according to some embodiments of the present disclosure. Figure 4 shows a schematic diagram of a quantum dot structure according to some embodiments of the present disclosure. Figure 5 shows a schematic diagram of a quantum dot structure according to some embodiments of the present disclosure. Figure 6A shows a schematic diagram of a light-emitting device according to some embodiments of the present disclosure. Figure 6B shows a schematic diagram of a light-emitting device according to some embodiments of the present disclosure. FIG. 6C is a schematic diagram of a wavelength conversion unit according to some embodiments of the present disclosure. FIG. 7 is a transmission electron microscope (TEM) image of a quantum dot of a comparative example of the present disclosure. FIG. 8 is a TEM image of a quantum dot of a comparative example of the present disclosure. FIG. 9 is a TEM image of a quantum dot structure of an embodiment of the present disclosure. FIG. 10 is a line graph showing the change of the luminescence intensity of the luminescent device of the embodiment of the present disclosure and the comparative example with time in a nitrogen environment. FIG. 11 is a line graph showing the change of the luminescence intensity of the luminescent device of the embodiment of the present disclosure and the comparative example with time in a general environment.
2:量子點結構 2: Quantum dot structure
20:量子點 20: Quantum dots
201:核體 201: Nucleus
2011:核體表面 2011: Nuclear surface
203:第二殼體 203: Second shell
2031,401:外表面 2031,401: External surface
205:第一殼體 205: First shell
40:第三殼體 40: The third shell
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