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TWI852671B - Invisible light sensing device - Google Patents

Invisible light sensing device Download PDF

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Publication number
TWI852671B
TWI852671B TW112125570A TW112125570A TWI852671B TW I852671 B TWI852671 B TW I852671B TW 112125570 A TW112125570 A TW 112125570A TW 112125570 A TW112125570 A TW 112125570A TW I852671 B TWI852671 B TW I852671B
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Taiwan
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sensing
sensing pixel
pixel row
pixels
scanning line
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TW112125570A
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Chinese (zh)
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TW202504121A (en
Inventor
蔡佳修
張家銘
陳瑞沛
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友達光電股份有限公司
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Priority to TW112125570A priority Critical patent/TWI852671B/en
Priority to CN202410032563.2A priority patent/CN117832241A/en
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Publication of TWI852671B publication Critical patent/TWI852671B/en
Publication of TW202504121A publication Critical patent/TW202504121A/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/811Interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/189X-ray, gamma-ray or corpuscular radiation imagers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/802Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
    • H10F39/8023Disposition of the elements in pixels, e.g. smaller elements in the centre of the imager compared to larger elements at the periphery
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/803Pixels having integrated switching, control, storage or amplification elements

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  • Facsimile Heads (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

An invisible light sensing device includes scanning lines, reading lines and sensing pixels. The sensing pixels are arranged into sensing pixel columns and sensing pixel rows. Control terminals of switching elements of sensing pixels of the mth sensing pixel row are electrically connected to the kth scanning line and the (k+1)th scanning line respectively. First ends of switching elements of sensing pixels of the nth sensing pixel column and first ends of switching elements of sensing pixels of the (n+1)th sensing pixel column are electrically connected to a single reading line.

Description

不可見光感測裝置Invisible light sensor

本發明是有關於一種感測裝置,且特別是有關於一種不可見光感測裝置。 The present invention relates to a sensing device, and in particular to an invisible light sensing device.

光感測器的應用非常廣泛。較常見的有數位相機或攝影機所使用的影像感測器,例如互補式金屬氧化物半導體(Complementary Metal-Oxide-Semiconductor,CMOS)影像感測器或電荷耦合元件(Charge-coupled Device,CCD)。除此之外,用於安檢、工業檢測或醫療診察的非可見光(例如X射線)感測器,因其高附加價值而成為相關製造商的重點開發項目。 Photo sensors have a wide range of applications. The more common ones are image sensors used in digital cameras or camcorders, such as complementary metal-oxide-semiconductor (CMOS) image sensors or charge-coupled devices (CCD). In addition, non-visible light (such as X-ray) sensors used in security inspections, industrial inspections or medical examinations have become a key development project for related manufacturers due to their high added value.

一般來說,用於醫療檢測或手術用的X射線感測器須具備較高的感測頻率才能讓醫療人員從中取得病患體內的即時狀態,來增加檢測的準確率和手術的成功率。因此,這類感測器大都使用具有高電子遷移率(high electron mobility)的薄膜電晶體來作為開關元件。光感測器的感測畫素包括感光元件、電性連接至感光元件的開關元件及電性連接至開關元件的讀取線,其中讀取線是用以傳輸來自於感光元件的電訊號。當感測畫素的數量越多時,光感 測器也需配置更多的讀取線。當讀取線的數量多時,所需的驅動晶片的數量也越多。然而,驅動晶片的售價高,所使用之驅動晶片的數量越多,越不利於光感測器的成本降低。 Generally speaking, X-ray sensors used for medical testing or surgery must have a higher sensing frequency so that medical personnel can obtain the real-time status of the patient's body from it to increase the accuracy of the test and the success rate of the operation. Therefore, most of these sensors use thin film transistors with high electron mobility as switching elements. The sensing pixels of the photosensor include a photosensitive element, a switching element electrically connected to the photosensitive element, and a readout line electrically connected to the switch element, wherein the readout line is used to transmit the electrical signal from the photosensitive element. When the number of sensing pixels is greater, the photosensor also needs to be equipped with more readout lines. When the number of readout lines is greater, the number of driver chips required is also greater. However, the selling price of driver chips is high, and the more driver chips are used, the more unfavorable it is to reduce the cost of photo sensors.

本發明提供一種不可見光感測裝置,成本低。 The present invention provides an invisible light sensing device with low cost.

本發明的不可見光感測裝置包括多條掃描線、多條讀取線及多個感測畫素。多條掃描線在第一方向上延伸。多條讀取線在第二方向上延伸。第一方向與第二方向交錯。多個感測畫素電性連接至多條掃描線及多條讀取線。每一感測畫素包括開關元件、電性連接至開關元件的第一電極、設置於第一電極之對向的第二電極、設置於第一電極與第二電極之間的光電轉換圖案和重疊於光電轉換圖案的波長轉換層。多個感測畫素沿第一方向及第二方向排成多個感測畫素行與多個感測畫素列。同一感測畫素列的多個感測畫素在第一方向上排列。同一感測畫素行的多個感測畫素在第二方向上排列。多個感測畫素行包括在第一方向上依序排列的第n個感測畫素行及第(n+1)個感測畫素行。多個感測畫素列包括第m個感測畫素列。多條掃描線包括在第二方向上依序排列的第k條掃描線及第(k+1)條掃描線。n、m及k為正整數。第m個感測畫素列的多個感測畫素的多個開關元件的多個控制端電性連接分別至第k條掃描線及第(k+1)條掃描線。第n個感測畫素行的多個感測畫素的多個開關元件的多個第一端及第(n+1)個感測畫素行的多個 感測畫素的多個開關元件的多個第一端電性連接至同一條讀取線。 The invisible light sensing device of the present invention includes a plurality of scanning lines, a plurality of reading lines and a plurality of sensing pixels. The plurality of scanning lines extend in a first direction. The plurality of reading lines extend in a second direction. The first direction and the second direction are interlaced. The plurality of sensing pixels are electrically connected to the plurality of scanning lines and the plurality of reading lines. Each sensing pixel includes a switching element, a first electrode electrically connected to the switching element, a second electrode disposed opposite to the first electrode, a photoelectric conversion pattern disposed between the first electrode and the second electrode, and a wavelength conversion layer superimposed on the photoelectric conversion pattern. The plurality of sensing pixels are arranged into a plurality of sensing pixel rows and a plurality of sensing pixel columns along the first direction and the second direction. The plurality of sensing pixels in the same sensing pixel column are arranged in the first direction. Multiple sensing pixels of the same sensing pixel row are arranged in the second direction. The multiple sensing pixel rows include the nth sensing pixel row and the (n+1)th sensing pixel row arranged in sequence in the first direction. The multiple sensing pixel columns include the mth sensing pixel column. The multiple scanning lines include the kth scanning line and the (k+1)th scanning line arranged in sequence in the second direction. n, m and k are positive integers. The multiple control ends of the multiple switch elements of the multiple sensing pixels of the mth sensing pixel row are electrically connected to the kth scanning line and the (k+1)th scanning line respectively. The multiple first ends of the multiple switch elements of the multiple sensing pixels of the nth sensing pixel row and the multiple first ends of the multiple switch elements of the multiple sensing pixels of the (n+1)th sensing pixel row are electrically connected to the same read line.

10、10A、10B:不可見光感測裝置 10, 10A, 10B: Invisible light sensing device

110:基板 110: Substrate

120:緩衝層 120: Buffer layer

130:半導體圖案 130: Semiconductor pattern

140:閘絕緣層 140: Gate insulation layer

150:控制端 150: Control terminal

160:層間絕緣層 160: Interlayer insulation layer

172:第一端 172: First end

174:第二端 174: Second end

180、220、240、260:絕緣層 180, 220, 240, 260: Insulation layer

180a、220a、230a、230b、240a、240b、:開口 180a, 220a, 230a, 230b, 240a, 240b,: Opening

190:第一電極 190: First electrode

200:光電轉換層 200: Photoelectric conversion layer

210:第二電極 210: Second electrode

230、270:平坦層 230, 270: Flat layer

250:導電層 250: Conductive layer

280:波長轉換層 280: Wavelength conversion layer

290:阻水阻氣層 290: Water and air barrier layer

C、Cn、Cn+1、Cn+2:感測畫素行 C, Cn , Cn +1 , Cn +2 : sensing pixel rows

CL:共用線 CL: common line

d1:第一方向 d1: first direction

d2:第二方向 d2: Second direction

GL、GLk、GLk+1、GLk+2、GLk+3:掃描線 GL, GL k , GL k+1 , GL k+2 , GL k+3 : Scanning lines

PX、PXA、PXB、PXC、PXD、PXE、PXF:感測畫素 PX, PXA, PXB, PXC, PXD, PXE, PXF: sensing pixels

PD:感光元件 PD: Photosensitive element

RL、RLi、RLi+1:讀取線 RL, RL i , RL i+1 : Reading line

R、Rm、Rm+1:感測畫素列 R, R m , R m+1 : sensing pixel rows

SCL、SRLi-A、SRLi+1-C、SRLi-B、SRLi-D、SRLi-F、SGLk、SGLk+1、SGLk+2:訊號 S CL , S RLi-A , S RLi+1-C , S RLi-B , S RLi-D , S RLi-F , S GLk , S GLk+1 , S GLk+2 : signal

T:開關元件 T: Switching element

t1:第一時間區間 t1: first time interval

t2:第二時間區間 t2: Second time period

t3:第三時間區間 t3: The third time period

I-I’:剖線 I-I’: section line

圖1為本發明一實施例之不可見光感測裝置的俯視示意圖。 Figure 1 is a schematic top view of an invisible light sensing device according to an embodiment of the present invention.

圖2本發明一實施例之不可見光感測裝置的局部放大示意圖。 Figure 2 is a partially enlarged schematic diagram of an invisible light sensing device of an embodiment of the present invention.

圖3本發明一實施例之不可見光感測裝置的剖面示意圖。 Figure 3 is a schematic cross-sectional view of an invisible light sensing device according to an embodiment of the present invention.

圖4示出本發明一實施例之共用線的訊號、第i條讀取線自第一感測畫素讀出的訊號、第(i+1)條讀取線自第一感測畫素讀出的訊號、第i條讀取線自第二感測畫素讀出的訊號、第i條讀取線RLi自第三感測畫素讀出的訊號及第(i+1)條讀取線自第三感測畫素讀出的訊號、第k條掃描線的訊號、第(k+1)條掃描線的訊號及第(k+2)條掃描線的訊號。 4 shows signals of a common line, a signal read from a first sensing pixel by an i-th read line, a signal read from a first sensing pixel by an (i+1)-th read line, a signal read from a second sensing pixel by an i-th read line, a signal read from a third sensing pixel by an i-th read line RL i, a signal read from a third sensing pixel by an (i+1)-th read line, a signal of a k-th scan line, a signal of a (k+1)-th scan line, and a signal of a (k+2)-th scan line according to an embodiment of the present invention.

圖5為本發明另一實施例的不可見光感測裝置的俯視示意圖。 Figure 5 is a top view schematic diagram of an invisible light sensing device of another embodiment of the present invention.

圖6為本發明再一實施例的不可見光感測裝置的局部的俯視示意圖。 Figure 6 is a partial top view schematic diagram of an invisible light sensing device of another embodiment of the present invention.

本文使用的「約」、「近似」、「本質上」、或「實質上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差 範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,「約」可以表示在所述值的一個或多個標準偏差內,或例如±30%、±20%、±15%、±10%、±5%內。再者,本文使用的「約」、「近似」、「本質上」、或「實質上」可依量測性質、切割性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。 As used herein, "about", "approximately", "essentially", or "substantially" include the stated value and the average value within an acceptable deviation range of a specific value determined by a person of ordinary skill in the art, taking into account the measurement in question and the specific amount of error associated with the measurement (i.e., the limitations of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or, for example, within ±30%, ±20%, ±15%, ±10%, ±5%. Furthermore, as used herein, "about", "approximately", "essentially", or "substantially" can select a more acceptable deviation range or standard deviation based on the measured property, cutting property, or other property, and can apply to all properties without a single standard deviation.

在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」可為二元件間存在其它元件。 In the accompanying drawings, the thickness of layers, films, panels, regions, etc., is exaggerated for clarity. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to another element, or an intermediate element may also exist. Conversely, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intermediate elements. As used herein, "connected" may refer to physical and/or electrical connections. Furthermore, "electrical connection" may be the presence of other elements between two elements.

現將詳細地參考本發明的示範性實施方式,示範性實施方式的實例說明於所附圖式中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。 Reference will now be made in detail to exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Whenever possible, the same element symbols are used in the drawings and description to represent the same or similar parts.

圖1為本發明一實施例之不可見光感測裝置的俯視示意圖。圖2本發明一實施例之不可見光感測裝置的局部放大示意圖。圖3本發明一實施例之不可見光感測裝置的剖面示意圖。圖3對應圖2的剖線I-I’。圖1及圖2省略圖3的波長轉換層280。 FIG. 1 is a schematic top view of an invisible light sensing device of an embodiment of the present invention. FIG. 2 is a partially enlarged schematic view of an invisible light sensing device of an embodiment of the present invention. FIG. 3 is a schematic cross-sectional view of an invisible light sensing device of an embodiment of the present invention. FIG. 3 corresponds to the section line I-I' of FIG. 2. FIG. 1 and FIG. 2 omit the wavelength conversion layer 280 of FIG. 3.

請參照圖1、圖2及圖3,不可見光感測裝置10包括基板110和設置於基板110上的多個感測畫素PX。每一感測畫素PX 包括開關元件T、電性連接至開關元件T的感光元件PD和重疊於感光元件PD的波長轉換層280。 Referring to FIG. 1 , FIG. 2 and FIG. 3 , the invisible light sensing device 10 includes a substrate 110 and a plurality of sensing pixels PX disposed on the substrate 110 . Each sensing pixel PX includes a switch element T, a photosensitive element PD electrically connected to the switch element T, and a wavelength conversion layer 280 superimposed on the photosensitive element PD.

開關元件T可包括薄膜電晶體。舉例而言,在本實施例中,形成開關元件T的方法可包括以下步驟:在基板110上依序形成緩衝層120、半導體圖案130、閘絕緣層140、控制端150、層間絕緣層160、第一端172與第二端174,其中第一端172和第二端174貫穿層間絕緣層160與閘絕緣層140,以分別電性連接至半導體圖案130的不同兩區。在本實施例中,開關元件T的控制端150可選擇性地配置於半導體圖案130的上方,以形成頂部閘極型薄膜電晶體(top-gate TFT)。然而,本發明不以此為限,根據其他的實施例,開關元件T的控制端150也可配置於半導體圖案130的下方,以形成底部閘極型薄膜電晶體(bottom-gate TFT)。在本實施例中,半導體圖案130的材料例如是銦鎵鋅氧化物(IGZO)。然而,本發明不以此為限,根據其他的實施例,也可選用其他材料製作半導體圖案130。 The switch element T may include a thin film transistor. For example, in the present embodiment, the method for forming the switch element T may include the following steps: sequentially forming a buffer layer 120, a semiconductor pattern 130, a gate insulating layer 140, a control terminal 150, an interlayer insulating layer 160, a first terminal 172, and a second terminal 174 on a substrate 110, wherein the first terminal 172 and the second terminal 174 penetrate the interlayer insulating layer 160 and the gate insulating layer 140 to be electrically connected to two different regions of the semiconductor pattern 130, respectively. In the present embodiment, the control terminal 150 of the switch element T may be selectively disposed above the semiconductor pattern 130 to form a top-gate thin film transistor (top-gate TFT). However, the present invention is not limited thereto. According to other embodiments, the control terminal 150 of the switch element T may also be disposed below the semiconductor pattern 130 to form a bottom-gate thin film transistor (bottom-gate TFT). In this embodiment, the material of the semiconductor pattern 130 is, for example, indium gallium zinc oxide (IGZO). However, the present invention is not limited thereto. According to other embodiments, other materials may also be used to make the semiconductor pattern 130.

除了開關元件T和感光元件PD外,感測畫素PX還包括設置於感光元件PD之收光側的波長轉換層280。波長轉換層280能將入射的不可見光轉換成可見光,而感光元件PD適於接收所述可見光並產生相應的電訊號。舉例而言,在本實施例中,不可見光感測裝置10可做為醫療用的X射線(x-ray)感測面板,感測畫素PX之波長轉換層280的材料例如是碘化銫(Cesium Iodide,CsI),其可將人射的X射線轉換為綠光,而感光元件PD適於接收所述 綠光並產生相對應的電訊號,但本發明不以此為限。 In addition to the switch element T and the photosensitive element PD, the sensing pixel PX also includes a wavelength conversion layer 280 disposed on the light receiving side of the photosensitive element PD. The wavelength conversion layer 280 can convert the incident invisible light into visible light, and the photosensitive element PD is suitable for receiving the visible light and generating a corresponding electrical signal. For example, in this embodiment, the invisible light sensing device 10 can be used as a medical X-ray sensing panel. The material of the wavelength conversion layer 280 of the sensing pixel PX is, for example, cesium iodide (CsI), which can convert the incident X-rays into green light, and the photosensitive element PD is suitable for receiving the green light and generating a corresponding electrical signal, but the present invention is not limited to this.

在本實施例中,形成感光元件PD的方法可包括以下步驟:在開關元件T上依序形成絕緣層180、第一電極190、光電轉換層200和第二電極210。舉例而言,在本實施例中,絕緣層180的材料可選自無機材料(例如氧化矽、氮化矽、氮氧化矽、其它合適的材料或上述至少二種材料的堆疊層)、有機材料或上述之組合;第一電極190的材料可包括金屬、合金、金屬材料的氮化物、金屬材料的氧化物、金屬材料的氮氧化物、或其他具有高反射率的導電材料;第二電極210的材料可包括透明導電材料,例如:銦錫氧化物(ITO);但本發明不以此為限。 In this embodiment, the method for forming the photosensitive element PD may include the following steps: forming an insulating layer 180, a first electrode 190, a photoelectric conversion layer 200 and a second electrode 210 on the switch element T in sequence. For example, in this embodiment, the material of the insulating layer 180 may be selected from inorganic materials (such as silicon oxide, silicon nitride, silicon oxynitride, other suitable materials or a stacked layer of at least two of the above materials), organic materials or a combination thereof; the material of the first electrode 190 may include metal, alloy, nitride of metal material, oxide of metal material, oxynitride of metal material, or other conductive materials with high reflectivity; the material of the second electrode 210 may include a transparent conductive material, such as indium tin oxide (ITO); but the present invention is not limited thereto.

在本實施例中,光電轉換層200例如是由P型摻雜層、本質層及N型摻雜層堆疊形成的PIN接面結構。然而,本發明不限於此,在其他實施例中,光電轉換層200也可以是由P型摻雜層及N型摻雜層堆疊形成的PN接面結構,或者是,由PN接面結構與PIN接面結構重複排列的串疊結構。 In this embodiment, the photoelectric conversion layer 200 is, for example, a PIN junction structure formed by stacking a P-type doped layer, an intrinsic layer, and an N-type doped layer. However, the present invention is not limited thereto. In other embodiments, the photoelectric conversion layer 200 may also be a PN junction structure formed by stacking a P-type doped layer and an N-type doped layer, or a series structure in which a PN junction structure and a PIN junction structure are repeatedly arranged.

在本實施例中,不可見光感測裝置10更包括絕緣層220、平坦層230、絕緣層240、導電層250、絕緣層260及平坦層270。絕緣層220和平坦層230依序覆蓋感光元件PD與絕緣層180。絕緣層240、導電層250、絕緣層260及平坦層270依序設置於平坦層230上。在本實施例中,導電層250可包括讀取線RL和共用線CL。讀取線RL可透過絕緣層240的開口240a、平坦層230的開口230a、絕緣層220的開口220a及絕緣層180的開口180a電性 連接開關元件T的第一端172。共用線CL可透過絕緣層240的開口240b(標示於圖2)和平坦層230的開口230b電性連接至感光元件PD的第二電極210(標示於圖2)。共用線CL用以傳輸感光元件PD所需的偏壓訊號。讀取線RL用以傳輸感光元件PD接收光線後所產生的電訊號。 In this embodiment, the invisible light sensing device 10 further includes an insulating layer 220, a planar layer 230, an insulating layer 240, a conductive layer 250, an insulating layer 260, and a planar layer 270. The insulating layer 220 and the planar layer 230 sequentially cover the photosensitive element PD and the insulating layer 180. The insulating layer 240, the conductive layer 250, the insulating layer 260, and the planar layer 270 are sequentially disposed on the planar layer 230. In this embodiment, the conductive layer 250 may include a read line RL and a common line CL. The read line RL can be electrically connected to the first end 172 of the switch element T through the opening 240a of the insulating layer 240, the opening 230a of the planar layer 230, the opening 220a of the insulating layer 220, and the opening 180a of the insulating layer 180. The common line CL can be electrically connected to the second electrode 210 (marked in FIG. 2 ) of the photosensitive element PD through the opening 240b (marked in FIG. 2 ) of the insulating layer 240 and the opening 230b of the planar layer 230. The common line CL is used to transmit the bias signal required by the photosensitive element PD. The read line RL is used to transmit the electrical signal generated by the photosensitive element PD after receiving light.

在本實施例中,絕緣層220、平坦層230、絕緣層240及絕緣層260的材料可選自無機材料(例如氧化矽、氮化矽、氮氧化矽、其它合適的材料或上述至少二種材料的堆疊層)、有機材料或上述之組合。在本實施例中,平坦層270的材料可選自聚乙烯=咯烷酮(poly(vinyl pyrrolidone),PVP)、聚乙烯醇(polyvinyl alcohol,PVA)、聚甲基丙烯酸甲酯(poly(methyl methacrylate),PMMA)、乙烯四氟乙烯共聚物(ethylene-tetrafluoroethylene,ETFE)、氟化乙烯丙烯共聚物(fluorinated ethylene propylene,FEP)、聚偏二氟乙烯共聚物(poly(vinylidene fluoride),PVDF)、聚氟乙烯共聚物(polyvinyl fluoride,PVF)、乙烯-氯代三氟乙烯共聚物(ethylene chlorotrifluoroethylene,ECTFE)、聚四氟乙烯(polytetrafluoroethylene,PTFE)、過氟烷氧基化物(PFA,perfluoro(alkoxy alkane))或其他氟系材料,但本發明不以此為限。 In this embodiment, the materials of the insulating layer 220, the planar layer 230, the insulating layer 240 and the insulating layer 260 can be selected from inorganic materials (such as silicon oxide, silicon nitride, silicon oxynitride, other suitable materials or a stacked layer of at least two of the above materials), organic materials or a combination thereof. In the present embodiment, the material of the planar layer 270 can be selected from polyvinyl pyrrolidone (PVP), polyvinyl alcohol (PVA), polymethyl methacrylate (PMMA), ethylene-tetrafluoroethylene (ETFE), fluorinated ethylene propylene (FEP), polyvinylidene fluoride (PVDF), polyvinyl fluoride (PVF), ethylene chlorotrifluoroethylene (ECTFE), polytetrafluoroethylene (PTFE), perfluoroalkoxy (PFA) or other fluorine-based materials, but the present invention is not limited thereto.

在本實施例中,波長轉換層280可設置於平坦層270上。在本實施例中,不可見光感測裝置10更包括阻水阻氣層290,設置於波長轉換層280上。舉例而言,在本實施例中,阻水阻氣層290的材質可包括鋁,但本發明不以此為限。 In this embodiment, the wavelength conversion layer 280 can be disposed on the flat layer 270. In this embodiment, the invisible light sensing device 10 further includes a water-blocking and air-blocking layer 290 disposed on the wavelength conversion layer 280. For example, in this embodiment, the material of the water-blocking and air-blocking layer 290 can include aluminum, but the present invention is not limited thereto.

請參照圖1,不可見光感測裝置10更包括多條掃描線GL及多條讀取線RL,多條掃描線GL在第一方向d1上延伸,多條讀取線RL在第二方向d2上延伸,其中第一方向d1與第二方向d2交錯。舉例而言,在本實施例中,第一方向d1與第二方向d2可相垂直,但本發明不以此為限。在本實施例中,不可見光感測裝置10更包括多條共用線CL。舉例而言,在本實施例中,多條共用線CL可在第二方向d2上延伸,多條共用線CL與多條讀取線RL大致上可平行,但本發明不以此為限。 Referring to FIG. 1 , the invisible light sensing device 10 further includes a plurality of scanning lines GL and a plurality of reading lines RL, wherein the plurality of scanning lines GL extend in a first direction d1, and the plurality of reading lines RL extend in a second direction d2, wherein the first direction d1 and the second direction d2 intersect. For example, in this embodiment, the first direction d1 and the second direction d2 may be perpendicular to each other, but the present invention is not limited thereto. In this embodiment, the invisible light sensing device 10 further includes a plurality of common lines CL. For example, in this embodiment, the plurality of common lines CL may extend in the second direction d2, and the plurality of common lines CL and the plurality of reading lines RL may be substantially parallel, but the present invention is not limited thereto.

請參照圖1、圖2及圖3,多個感測畫素PX電性連接至多條掃描線GL、多條讀取線RL及多條共用線CL。詳細而言,在本實施例中,每一感測畫素PX的開關元件T的控制端150電性連接至對應的一條掃描線GL,每一感測畫素PX的開關元件T的第一端172電性連接至對應的一條讀取線RL,且每一感測畫素PX的感光元件PD的第二電極210電性連接至對應的一條共用線CL。 Please refer to Figures 1, 2 and 3, multiple sensing pixels PX are electrically connected to multiple scanning lines GL, multiple reading lines RL and multiple common lines CL. In detail, in this embodiment, the control end 150 of the switch element T of each sensing pixel PX is electrically connected to a corresponding scanning line GL, the first end 172 of the switch element T of each sensing pixel PX is electrically connected to a corresponding reading line RL, and the second electrode 210 of the photosensitive element PD of each sensing pixel PX is electrically connected to a corresponding common line CL.

請參照圖1,多個感測畫素PX沿第一方向d1及第二方向d2排成多個感測畫素行C與多個感測畫素列R,同一感測畫素列R的多個感測畫素PX在第一方向d1上排列,且同一感測畫素行C的多個感測畫素PX在第二方向d2上排列。多個感測畫素行C包括在第一方向d1上依序排列的第n個感測畫素行Cn、第(n+1)個感測畫素行Cn+1及第(n+2)個感測畫素行Cn+2。多個感測畫素列R包括在第二方向d2上依序排列的第m個感測畫素列Rm及第(m+1)個感測畫素列Rm+1。多條掃描線GL包括在第二方向d2上 依序排列的第k條掃描線GLk、第(k+1)條掃描線GLk+1、第(k+2)條掃描線GLk+2及第(k+3)條掃描線GLk+3。多條讀取線RL包括在第一方向d1上依序排列的第i條讀取線RLi及第(i+1)條讀取線RLi+1。n、m、k及i為正整數。 Referring to FIG. 1 , a plurality of sensing pixels PX are arranged into a plurality of sensing pixel rows C and a plurality of sensing pixel columns R along a first direction d1 and a second direction d2. A plurality of sensing pixels PX of the same sensing pixel column R are arranged in the first direction d1, and a plurality of sensing pixels PX of the same sensing pixel row C are arranged in the second direction d2. The plurality of sensing pixel rows C include an nth sensing pixel row C n , an (n+1)th sensing pixel row C n+1 , and an (n+2)th sensing pixel row C n+2 arranged in sequence in the first direction d1. The plurality of sensing pixel columns R include an mth sensing pixel column R m and an (m+1)th sensing pixel column R m+1 arranged in sequence in the second direction d2. The plurality of scanning lines GL include a kth scanning line GL k , a (k+1)th scanning line GL k+1 , a (k+2)th scanning line GL k+2 , and a (k+3)th scanning line GL k+3 arranged in sequence in the second direction d2. The plurality of reading lines RL include an i-th reading line RL i and a (i+1)-th reading line RL i+1 arranged in sequence in the first direction d1. n, m, k, and i are positive integers.

請參照圖1及圖2,值得注意的是,第m個感測畫素列Rm的多個感測畫素PX的多個開關元件T的多個控制端150電性連接分別至第k條掃描線GLk及第(k+1)條掃描線GLk+1,第n個感測畫素行Cn的多個感測畫素PX的多個開關元件T的多個第一端172及第(n+1)個感測畫素行Cn+1的多個感測畫素PX的多個開關元件T的多個第一端172電性連接至同一條讀取線RL(例如:第i條讀取線RLi)。也就是說,相鄰兩感測畫素行C是共用同一條讀取線RL。藉此,不可見光感測裝置10之讀取線RL的數量可減少,進而可減少與讀取線RL電性連接之驅動晶片(未繪示)的數量。由於所述驅動晶片(未繪示)的數量可減少(例如:減半),因此,不可見光感測裝置10的成本可大幅下降。 Referring to FIG. 1 and FIG. 2 , it is worth noting that the control terminals 150 of the switch elements T of the sensing pixels PX of the m-th sensing pixel row R m are electrically connected to the k-th scanning line GL k and the (k+1)-th scanning line GL k+1 , respectively, and the first terminals 172 of the switch elements T of the sensing pixels PX of the n-th sensing pixel column C n and the first terminals 172 of the switch elements T of the sensing pixels PX of the (n+1)-th sensing pixel column C n+1 are electrically connected to the same read line RL (e.g., the i-th read line RL i ). In other words, two adjacent sensing pixel columns C share the same read line RL. Thus, the number of readout lines RL of the invisible light sensing device 10 can be reduced, and thus the number of driver chips (not shown) electrically connected to the readout lines RL can be reduced. Since the number of driver chips (not shown) can be reduced (e.g., halved), the cost of the invisible light sensing device 10 can be significantly reduced.

在本實施例中,第m個感測畫素列Rm的感測畫素PX包括多個第一感測畫素PXA、PXC及第二感測畫素PXB,第二感測畫素PXB設置於多個第一感測畫素PXA、PXC之間,多個第一感測畫素PXA、PXC的多個開關元件T的多個控制端150電性連接至第k條掃描線GLk,而第二感測畫素PXB的開關元件T的控制端150電性連接至第(k+1)條掃描線GLk+1In this embodiment, the sensing pixel PX of the m-th sensing pixel row R m includes a plurality of first sensing pixels PXA, PXC and a second sensing pixel PXB. The second sensing pixel PXB is disposed between the plurality of first sensing pixels PXA, PXC. The plurality of control terminals 150 of the plurality of switch elements T of the plurality of first sensing pixels PXA, PXC are electrically connected to the k-th scanning line GL k , and the control terminal 150 of the switch element T of the second sensing pixel PXB is electrically connected to the (k+1)-th scanning line GL k+1 .

在本實施例中,第(m+1)個感測畫素列Rm+1的多個感測畫 素PX的多個開關元件T的多個控制端150分別電性連接至第(k+2)條掃描線GLk+2及第(k+3)條掃描線GLk+3。詳細而言,在本實施例中,第(m+1)個感測畫素列Rm+1的多個感測畫素PX包括多個第三感測畫素PXD、PXF及第四感測畫素PXE,第四感測畫素PXE設置於多個第三感測畫素PXD、PXF之間,多個第三感測畫素PXD、PXF的多個開關元件T的多個控制端150電性連接至第(k+2)條掃描線GLk+2,且第四感測畫素PXE的開關元件T的控制端150電性連接至第(k+3)條掃描線GLk+3In this embodiment, the control terminals 150 of the switch elements T of the sensing pixels PX of the (m+1)th sensing pixel row R m+1 are electrically connected to the (k+2)th scanning line GL k+2 and the (k+3)th scanning line GL k+3 , respectively. In detail, in the present embodiment, the plurality of sensing pixels PX of the (m+1)th sensing pixel row R m+1 include a plurality of third sensing pixels PXD, PXF and a fourth sensing pixel PXE, the fourth sensing pixel PXE is disposed between the plurality of third sensing pixels PXD, PXF, the plurality of control ends 150 of the plurality of switch elements T of the plurality of third sensing pixels PXD, PXF are electrically connected to the (k+2)th scanning line GL k+2 , and the control end 150 of the switch element T of the fourth sensing pixel PXE is electrically connected to the (k+3)th scanning line GL k+3 .

在本實施例中,於不可見光感測裝置10的俯視圖中,第k條掃描線GLk及第(k+1)條掃描線GLk+1分別位於第m個感測畫素列Rm的相對兩側,第(k+2)條掃描線GLk+2及第(k+3)條掃描線GLk+3分別位於第(m+1)個感測畫素列Rm+1的相對兩側,且第(k+1)條掃描線GLk+1及第(k+2)條掃描線GLk+2位於第m個感測畫素列Rm與第(m+1)個感測畫素列Rm+1之間。 In the present embodiment, in the top view of the invisible light sensing device 10, the kth scanning line GL k and the (k+1)th scanning line GL k+1 are respectively located on opposite sides of the mth sensing pixel row R m , the (k+2)th scanning line GL k+2 and the (k+3)th scanning line GL k+3 are respectively located on opposite sides of the (m+1)th sensing pixel row R m+1 , and the (k+1)th scanning line GL k+1 and the (k+2)th scanning line GL k+2 are located between the mth sensing pixel row R m and the (m+1)th sensing pixel row R m+1 .

在本實施例中,第一感測畫素PXA及第三感測畫素PXD同屬第n個感測畫素行Cn,第二感測畫素PXB及第四感測畫素PXE同屬於第(n+1)個感測畫素行Cn+1,第一感測畫素PXC及第三感測畫素PXF同屬於第(n+2)個感測畫素行Cn+2,第一感測畫素PXA、第三感測畫素PXD、第二感測畫素PXB及第四感測畫素PXE的多個開關元件T的多個第一端172皆電性連接至第i條讀取線RLi,且第一感測畫素PXC及第三感測畫素PXF的多個開關元件T的多個第一端172皆電性連接至第(i+1)條讀取線RLi+1In the present embodiment, the first sensing pixel PXA and the third sensing pixel PXD belong to the nth sensing pixel row Cn , the second sensing pixel PXB and the fourth sensing pixel PXE belong to the (n+1)th sensing pixel row Cn +1 , the first sensing pixel PXC and the third sensing pixel PXF belong to the (n+2)th sensing pixel row Cn +2 , the first ends 172 of the plurality of switch elements T of the first sensing pixel PXA, the third sensing pixel PXD, the second sensing pixel PXB and the fourth sensing pixel PXE are all electrically connected to the i-th read line RLi , and the first ends 172 of the plurality of switch elements T of the first sensing pixel PXC and the third sensing pixel PXF are all electrically connected to the (i+1)-th read line RLi +1 .

圖4示出本發明一實施例之共用線CL的訊號SCL、第i條讀取線RLi自第一感測畫素PXA讀出的訊號SRLi-A、第(i+1)條讀取線RLi+1自第一感測畫素PXC讀出的訊號SRLi+1-C、第i條讀取線RLi自第二感測畫素PXB讀出的訊號SRLi-B、第i條讀取線RLi自第三感測畫素PXD讀出的訊號SRLi-D及第(i+1)條讀取線RLi+1自第三感測畫素PXF讀出的訊號SRLi-F、第k條掃描線GLk的訊號SGLk、第(k+1)條掃描線GLk+1的訊號SGLk+1及第(k+2)條掃描線GLk+2的訊號SGLk+2FIG. 4 shows a signal S CL of a common line CL, a signal S RLi-A read from a first sensing pixel PXA by an i-th read line RL i , a signal S RLi+1-C read from a first sensing pixel PXC by an (i+1)-th read line RL i+1 , a signal S RLi -B read from a second sensing pixel PXB by an i-th read line RL i , a signal S RLi-D read from a third sensing pixel PXD by an i-th read line RL i , a signal S RLi-F read from a third sensing pixel PXF by an (i+1)-th read line RL i+1 , a signal S GLk read from a k-th scan line GL k , a signal S S L i+1 read from a (k+1)-th scan line GL k+1 , and a signal S GLk+1 and the signal S GLk+2 of the (k+2)th scanning line GL k+2 .

請參照圖1及圖4,在第一時間區間t1,第k條掃描線GLk的訊號SGLk+1具有一閘極開啟訊號,第i條讀取線RLi輸出來自於第m個感測畫素列Rm之第一感測畫素PXA的感測訊號SRLi-A,且第(i+1)條讀取線RLi+1輸出來自於第m個感測畫素列Rm之第一感測畫素PXC的感測訊號SRLi+1-C;在接續第一時間區間t1的第二時間區間t2,第k+1條掃描線GLk+1具有一閘極開啟訊號,第i條讀取線RLi輸出來自於第m個感測畫素列Rm之第二感測畫素PXB的感測訊號SRLi-B;在接續第二時間區間t2的第三時間區間t3,第(k+2)條掃描線GLk+2的訊號SGLk+2具有一閘極開啟訊號,第i條讀取線RLi輸出來自於第(m+1)個感測畫素列Rm+1之第三感測畫素PXD的感測訊號SRLi-D,且第(i+1)條讀取線RLi+1輸出來自於第(m+1)個感測畫素列Rm+1之第三感測畫素PXF的感測訊號SRLi+1-F…。以此類推,便可完成不可見光感測裝置10之所有感測畫素PX的讀取。 1 and 4 , in the first time interval t1, the signal S GLk+1 of the k-th scanning line GL k has a gate-opening signal, the i-th read line RL i outputs the sensing signal S RLi-A from the first sensing pixel PXA of the m-th sensing pixel row R m , and the (i+1)-th read line RL i+1 outputs the sensing signal S RLi+1-C from the first sensing pixel PXC of the m-th sensing pixel row R m ; in the second time interval t2 following the first time interval t1, the k+1-th scanning line GL k+1 has a gate-opening signal, the i-th read line RL i outputs the sensing signal S RLi-B from the second sensing pixel PXB of the m-th sensing pixel row R m . In the third time interval t3 following the second time interval t2, the signal S GLk +2 of the (k+2)th scanning line GL k +2 has a gate-on signal, the i-th read line RL i outputs the sensing signal S RLi-D from the third sensing pixel PXD of the (m+1)th sensing pixel row R m+1 , and the (i+1)th read line RLi+1 outputs the sensing signal S RLi+1-F from the third sensing pixel PXF of the (m+1)th sensing pixel row R m+1 . By analogy, the reading of all sensing pixels PX of the invisible light sensing device 10 can be completed.

以下將列舉另一些實施例以詳細說明本揭露,其中相同的構件將標示相同的符號,並且省略相同技術內容的說明,省略部分請參考前述實施例,以下不再贅述。 The following will list some other embodiments to illustrate the present disclosure in detail, wherein the same components will be marked with the same symbols, and the description of the same technical content will be omitted. For the omitted parts, please refer to the aforementioned embodiments, and no further description will be given below.

圖5為本發明另一實施例的不可見光感測裝置的俯視示意圖。圖5的不可見光感測裝置10A與圖1的不可見光感測裝置10類似,兩者的差異在於:兩者的共用線CL與感測畫素PX的電性連接方式不同,且兩者的共用線CL的位置也不同。 FIG5 is a top view schematic diagram of another embodiment of the invisible light sensing device of the present invention. The invisible light sensing device 10A of FIG5 is similar to the invisible light sensing device 10 of FIG1 . The difference between the two is that the electrical connection method of the common line CL and the sensing pixel PX of the two is different, and the position of the common line CL of the two is also different.

請參照圖1及圖5,詳細而言,在圖1的實施例中,多個感測畫素行C是分別與電性連接至多條共用線CL;在圖5的實施例中,相鄰的兩感測畫素行C是電性連接至同一條共用線CL。舉例而言,在圖5的實施例中,第(n+1)個感測畫素行Cn+1的多個感測畫素PX的多個第二電極210及第(n+2)個感測畫素行Cn+2的多個感測畫素PX的多個第二電極210是電性連接至同一條共用線CL。 Please refer to FIG. 1 and FIG. 5 , in detail, in the embodiment of FIG. 1 , a plurality of sensing pixel rows C are electrically connected to a plurality of common lines CL respectively; in the embodiment of FIG. 5 , two adjacent sensing pixel rows C are electrically connected to the same common line CL. For example, in the embodiment of FIG. 5 , a plurality of second electrodes 210 of a plurality of sensing pixels PX in the (n+1)th sensing pixel row C n+1 and a plurality of second electrodes 210 of a plurality of sensing pixels PX in the (n+2)th sensing pixel row C n+2 are electrically connected to the same common line CL.

此外,在圖1的實施例中,於不可見光感測裝置10的俯視圖中,每一條共用線CL是設置於對應之一個感測畫素行C的多個感光元件PD上;在圖5的實施例中,於可見光感測裝置10A的俯視圖中,每條共用線CL是設置在相鄰的兩感測畫素行C之間。舉例而言,在圖5的實施例中,一條共用線CL位於第(n+1)個感測畫素行Cn+1及第(n+2)個感測畫素行Cn+2之間。 In addition, in the embodiment of FIG. 1 , in the top view of the invisible light sensing device 10, each common line CL is disposed on a plurality of photosensitive elements PD of a corresponding sensing pixel row C; in the embodiment of FIG. 5 , in the top view of the visible light sensing device 10A, each common line CL is disposed between two adjacent sensing pixel rows C. For example, in the embodiment of FIG. 5 , one common line CL is located between the (n+1)th sensing pixel row C n+1 and the (n+2)th sensing pixel row C n+2 .

圖6為本發明再一實施例的不可見光感測裝置的局部的俯視示意圖。圖6的不可見光感測裝置10B與圖2的不可見光感 測裝置10類似,兩者的差異在於:圖6之開關元件T的形式與圖2之開關元件T的形式不同,且兩者之共用線CL遮蔽開關元件T的範圍也不同。 FIG6 is a partial top view schematic diagram of another embodiment of the invisible light sensing device of the present invention. The invisible light sensing device 10B of FIG6 is similar to the invisible light sensing device 10 of FIG2. The difference between the two is that the form of the switch element T of FIG6 is different from the form of the switch element T of FIG2, and the range of the common line CL shielding the switch element T of the two is also different.

詳細而言,在圖2的實施例中,開關元件T的控制端150位於半導體圖案130上,即開關元件T為頂部閘極型薄膜電晶體(top-gate TFT),而共用線CL可不遮蔽整個半導體圖案130;在圖6的實施例中,開關元件T的控制端150位於半導體圖案130下,即開關元件T為底部閘極型薄膜電晶體(bottom-gate TFT),而共用線CL可遮蔽整個半導體圖案130。此外,在圖6的實施例中,半導體圖案130的材質例如是多晶矽。 In detail, in the embodiment of FIG. 2 , the control terminal 150 of the switch element T is located on the semiconductor pattern 130, that is, the switch element T is a top-gate thin film transistor (top-gate TFT), and the common line CL may not cover the entire semiconductor pattern 130; in the embodiment of FIG. 6 , the control terminal 150 of the switch element T is located below the semiconductor pattern 130, that is, the switch element T is a bottom-gate thin film transistor (bottom-gate TFT), and the common line CL may cover the entire semiconductor pattern 130. In addition, in the embodiment of FIG. 6 , the material of the semiconductor pattern 130 is, for example, polysilicon.

10:不可見光感測裝置 10: Invisible light sensing device

190:第一電極 190: First electrode

200:光電轉換層 200: Photoelectric conversion layer

210:第二電極 210: Second electrode

C、Cn、Cn+1、Cn+2:感測畫素行 C, Cn , Cn +1 , Cn +2 : sensing pixel rows

CL:共用線 CL: common line

d1:第一方向 d1: first direction

d2:第二方向 d2: Second direction

GL、GLk、GLk+1、GLk+2、GLk+3:掃描線 GL, GL k , GL k+1 , GL k+2 , GL k+3 : Scanning lines

PX、PXA、PXB、PXC、PXD、PXE、PXF:感測畫素 PX, PXA, PXB, PXC, PXD, PXE, PXF: sensing pixels

PD:感光元件 PD: Photosensitive element

RL、RLi、RLi+1:讀取線 RL, RL i , RL i+1 : Reading line

R、Rm、Rm+1:感測畫素列 R, R m , R m+1 : sensing pixel rows

Claims (8)

一種不可見光感測裝置,包括: 多條掃描線,在一第一方向上延伸; 多條讀取線,在一第二方向上延伸,其中該第一方向與該第二方向交錯;以及 多個感測畫素,電性連接至該些掃描線及該些讀取線,其中每一該感測畫素包括一開關元件、電性連接至該開關元件的一第一電極、設置於該第一電極之對向的一第二電極、設置於該第一電極與該第二電極之間的一光電轉換圖案和重疊於該光電轉換圖案的一波長轉換層; 該些感測畫素沿該第一方向及該第二方向排成多個感測畫素行與多個感測畫素列,同一感測畫素列的多個感測畫素在該第一方向上排列,且同一感測畫素行的多個感測畫素在該第二方向上排列; 該些感測畫素行包括在該第一方向上依序排列的一第n個感測畫素行及一第(n+1)個感測畫素行,該些感測畫素列包括一第m個感測畫素列,該些掃描線包括在該第二方向上依序排列的一第k條掃描線及一第(k+1)條掃描線,其中n、m及k為正整數; 該第m個感測畫素列的該些感測畫素的多個開關元件的多個控制端電性連接分別至該第k條掃描線及該第(k+1)條掃描線,該第n個感測畫素行的該些感測畫素的多個開關元件的多個第一端及該第(n+1)個感測畫素行的該些感測畫素的多個開關元件的多個第一端電性連接至該些讀取線的同一條讀取線。 An invisible light sensing device comprises: A plurality of scanning lines extending in a first direction; A plurality of reading lines extending in a second direction, wherein the first direction intersects with the second direction; and A plurality of sensing pixels electrically connected to the scanning lines and the reading lines, wherein each of the sensing pixels comprises a switching element, a first electrode electrically connected to the switching element, a second electrode disposed opposite to the first electrode, a photoelectric conversion pattern disposed between the first electrode and the second electrode, and a wavelength conversion layer superimposed on the photoelectric conversion pattern; The sensing pixels are arranged into a plurality of sensing pixel rows and a plurality of sensing pixel columns along the first direction and the second direction, and a plurality of sensing pixels of the same sensing pixel column are arranged in the first direction, and a plurality of sensing pixels of the same sensing pixel column are arranged in the second direction; The sensing pixel rows include an nth sensing pixel row and an (n+1)th sensing pixel row arranged in sequence in the first direction, the sensing pixel columns include an mth sensing pixel column, and the scanning lines include a kth scanning line and a (k+1)th scanning line arranged in sequence in the second direction, wherein n, m and k are positive integers; The multiple control ends of the multiple switch elements of the sensing pixels of the mth sensing pixel row are electrically connected to the kth scanning line and the (k+1)th scanning line respectively, and the multiple first ends of the multiple switch elements of the sensing pixels of the nth sensing pixel row and the multiple first ends of the multiple switch elements of the sensing pixels of the (n+1)th sensing pixel row are electrically connected to the same read line of the read lines. 如請求項1所述的不可見光感測裝置,其中該些感測畫素行更包括一第(n+2)個感測畫素行,該第n個感測畫素行、該第(n+1)個感測畫素行及該第(n+2)個感測畫素行在該第一方向上依序排列,該不可見光感測裝置更包括: 一共用線,其中於該可見光感測裝置的俯視圖中,該共用線位於該第(n+1)個感測畫素行及該第(n+2)個感測畫素行之間。 The invisible light sensing device as described in claim 1, wherein the sensing pixel rows further include an (n+2)th sensing pixel row, the nth sensing pixel row, the (n+1)th sensing pixel row and the (n+2)th sensing pixel row are arranged in sequence in the first direction, and the invisible light sensing device further includes: A common line, wherein in a top view of the visible light sensing device, the common line is located between the (n+1)th sensing pixel row and the (n+2)th sensing pixel row. 如請求項2所述的不可見光感測裝置,其中該第(n+1)個感測畫素行的該些感測畫素的多個第二電極及該第(n+2)個感測畫素行的該些感測畫素的多個第二電極電性連接至該共用線。The invisible light sensing device as described in claim 2, wherein the second electrodes of the sensing pixels in the (n+1)th sensing pixel row and the second electrodes of the sensing pixels in the (n+2)th sensing pixel row are electrically connected to the common line. 如請求項1所述的不可見光感測裝置,其中該第m個感測畫素列的該些感測畫素包括多個第一感測畫素及一第二感測畫素,該第二感測畫素設置於該些第一感測畫素之間,該些第一感測畫素的多個開關元件的多個控制端電性連接至該第k條掃描線,且該第二感測畫素的該開關元件的一控制端電性連接至該第(k+1)條掃描線。The invisible light sensing device as described in claim 1, wherein the sensing pixels of the m-th sensing pixel row include a plurality of first sensing pixels and a second sensing pixel, the second sensing pixel is arranged between the first sensing pixels, a plurality of control ends of the plurality of switch elements of the first sensing pixels are electrically connected to the k-th scanning line, and a control end of the switch element of the second sensing pixel is electrically connected to the (k+1)-th scanning line. 如請求項4所述的不可見光感測裝置,其中在一第一時間區間,該第k條掃描線具有一閘極開啟訊號,該同一條讀取線輸出來自於該第m個感測畫素列之一該第一感測畫素的一感測訊號;在接續該第一時間區間的一第二時間區間,該第k+1條掃描線具有一閘極開啟訊號,該同一條讀取線輸出來自於該第m個感測畫素列之一該第二感測畫素的一感測訊號。An invisible light sensing device as described in claim 4, wherein in a first time period, the k-th scanning line has a gate-on signal, and the same read line outputs a sensing signal from the first sensing pixel in the m-th sensing pixel row; in a second time period following the first time period, the k+1-th scanning line has a gate-on signal, and the same read line outputs a sensing signal from the second sensing pixel in the m-th sensing pixel row. 如請求項1所述的不可見光感測裝置,其中該些感測畫素列更包括一第(m+1)個感測畫素列,該第m個感測畫素列及該第(m+1)個感測畫素列在該第二方向上依序排列;該些掃描線更包括一第(k+2)條掃描線及一第(k+3)條掃描線,該第k條掃描線、該第(k+1)條掃描線、該第(k+2)條掃描線及該第(k+3)條掃描線在該第二方向上依序排列;該第(m+1)個感測畫素列的該些感測畫素的多個開關元件的多個控制端分別電性連接至該第(k+2)條掃描線及該第(k+3)條掃描線。The invisible light sensing device as described in claim 1, wherein the sensing pixel rows further include an (m+1)th sensing pixel row, the mth sensing pixel row and the (m+1)th sensing pixel row are arranged sequentially in the second direction; the scanning lines further include a (k+2)th scanning line and a (k+3)th scanning line, the kth scanning line, the (k+1)th scanning line, the (k+2)th scanning line and the (k+3)th scanning line are arranged sequentially in the second direction; and the multiple control ends of the multiple switch elements of the sensing pixels of the (m+1)th sensing pixel row are electrically connected to the (k+2)th scanning line and the (k+3)th scanning line, respectively. 如請求項6所述的不可見光感測裝置,其中在該可見光感測裝置的俯視圖中,該第k條掃描線及該第(k+1)條掃描線分別位於該第m個感測畫素列的相對兩側,該第(k+2)條掃描線及該第(k+3)條掃描線分別位於該第(m+1)個感測畫素列的相對兩側,且該第(k+1)條掃描線及該第(k+2)條掃描線位於該第m個感測畫素列與該第(m+1)個感測畫素列之間。An invisible light sensing device as described in claim 6, wherein in a top view of the visible light sensing device, the kth scan line and the (k+1)th scan line are respectively located on opposite sides of the mth sensing pixel row, the (k+2)th scan line and the (k+3)th scan line are respectively located on opposite sides of the (m+1)th sensing pixel row, and the (k+1)th scan line and the (k+2)th scan line are located between the mth sensing pixel row and the (m+1)th sensing pixel row. 如請求項6所述的不可見光感測裝置,其中該第(m+1)個感測畫素列的該些感測畫素包括多個第三感測畫素及一第四感測畫素,該第四感測畫素設置於該些第三感測畫素之間,該些第三感測畫素的多個開關元件的多個控制端電性連接至該第(k+2)條掃描線,且該第四感測畫素的該開關元件的一控制端電性連接至該第(k+3)條掃描線。The invisible light sensing device as described in claim 6, wherein the sensing pixels of the (m+1)th sensing pixel row include a plurality of third sensing pixels and a fourth sensing pixel, the fourth sensing pixel is arranged between the third sensing pixels, a plurality of control ends of the plurality of switch elements of the third sensing pixels are electrically connected to the (k+2)th scanning line, and a control end of the switch element of the fourth sensing pixel is electrically connected to the (k+3)th scanning line.
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