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TWI852121B - Temperature control device and electronic component testing device - Google Patents

Temperature control device and electronic component testing device Download PDF

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Publication number
TWI852121B
TWI852121B TW111138591A TW111138591A TWI852121B TW I852121 B TWI852121 B TW I852121B TW 111138591 A TW111138591 A TW 111138591A TW 111138591 A TW111138591 A TW 111138591A TW I852121 B TWI852121 B TW I852121B
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temperature
fluid
valve
temperature adjustment
supply
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TW111138591A
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TW202338376A (en
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山田祐也
菊池有朋
根瑟 耶瑟爾
梅林 瓦爾納
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日商阿德潘鐵斯特股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer

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  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Abstract

本發明係提供:能達DUT溫度調整高速化的溫度調整裝置、以及具備該溫度調整裝置的電子元件測試裝置。 本發明的溫度調整裝置6係具備有:供應第1流體的連續流供應部7;供應具溫度不同於第1流體溫度之第2流體的脈衝流供應部8;將從連續流供應部7所供應的第1流體、與從脈衝流供應部8所供應的第2流體予以混合,再將混合流體供應給插座3內部空間34的混合部9。 The present invention provides: a temperature adjustment device capable of achieving high-speed temperature adjustment of a DUT, and an electronic component test device having the temperature adjustment device. The temperature adjustment device 6 of the present invention comprises: a continuous flow supply section 7 for supplying a first fluid; a pulse flow supply section 8 for supplying a second fluid having a temperature different from that of the first fluid; a mixing section 9 for mixing the first fluid supplied from the continuous flow supply section 7 and the second fluid supplied from the pulse flow supply section 8, and then supplying the mixed fluid to the internal space 34 of the socket 3.

Description

溫度調整裝置以及電子元件測試裝置Temperature control device and electronic component testing device

本發明係關於半導體集積電路元件等受測電子元件(以下簡稱「DUT」(Device Under Test))測試時,調整DUT溫度的溫度調整裝置,以及具備該溫度調整裝置的電子元件測試裝置。The present invention relates to a temperature control device for adjusting the temperature of an electronic device under test (hereinafter referred to as "DUT") such as a semiconductor integrated circuit device during testing, and an electronic device testing device having the temperature control device.

已知有藉由對DUT供應氣體(空氣)而控制測試中DUT溫度的測試系統(例如參照專利文獻1(段落[0033]~[0035]、第5圖))。該測試系統係具備有調整供應給DUT之氣體溫度的冷卻手段與加熱手段,而冷卻手段與加熱手段係利用溫度控制器進行控制。該溫度控制器係根據表示從空氣溫度感測器所輸入氣體溫度計測值的信號,依將DUT溫度保持於所需設定值的方式,對冷卻手段與加熱手段進行控制。 [先前技術文獻] [專利文獻] A test system is known that controls the temperature of a DUT during a test by supplying gas (air) to the DUT (for example, see Patent Document 1 (paragraphs [0033] to [0035], Figure 5)). The test system has cooling means and heating means for adjusting the temperature of the gas supplied to the DUT, and the cooling means and heating means are controlled by a temperature controller. The temperature controller controls the cooling means and heating means in a manner that keeps the temperature of the DUT at a desired set value based on a signal representing a gas thermometer value input from an air temperature sensor. [Prior Technical Document] [Patent Document]

[專利文獻1]日本專利特開2004-503924號公報[Patent Document 1] Japanese Patent Publication No. 2004-503924

[發明所欲解決之課題][The problem that the invention wants to solve]

然而,如上述的測試系統,因氣體流路等的熱阻力,會有氣體的溫度調整較難高速化,導致DUT溫度調整無法追蹤急遽溫度變化的情況等問題。However, in the test system described above, due to the thermal resistance of the gas flow path, etc., it is difficult to adjust the temperature of the gas at a high speed, resulting in the DUT temperature adjustment being unable to track rapid temperature changes.

本發明所欲解決的課題係在於提供:可達DUT溫度調整高速化的溫度調整裝置、以及具備該溫度調整裝置的電子元件測試裝置。 [解決課題之手段] The problem to be solved by the present invention is to provide: a temperature adjustment device capable of achieving high-speed temperature adjustment of a DUT, and an electronic component testing device equipped with the temperature adjustment device. [Means for solving the problem]

[1]本發明的溫度調整裝置,係調整電氣式連接於插座的DUT溫度之溫度調整裝置;其中,上述插座係具備有:具內部空間且供應第1流體的第1供應部;供應具溫度不同於上述第1流體溫度之第2流體的第2供應部;將從上述第1供應部供應的第1流體、從上述第2供應部供應的上述第2流體予以混合,再將混合流體供應給上述內部空間的混合部。[1] The temperature control device of the present invention is a temperature control device for adjusting the temperature of a DUT electrically connected to a socket; wherein the socket comprises: a first supply portion having an internal space and supplying a first fluid; a second supply portion supplying a second fluid having a temperature different from that of the first fluid; and a mixing portion for mixing the first fluid supplied from the first supply portion and the second fluid supplied from the second supply portion, and then supplying the mixed fluid to the internal space.

[2]上述發明中,亦可上述第1流體係常溫空氣;上述第2流體係具有溫度較高於上述第1流體溫度的氣體、或具有溫度較低於上述第1流體溫度的氣體。[2] In the above invention, the first fluid may be air at room temperature; and the second fluid may be a gas having a temperature higher than that of the first fluid, or a gas having a temperature lower than that of the first fluid.

[3]上述發明中,亦可上述第1供應部係具備有:連接於供應上述第1流體之第1供應源的第1連接部、以及調整經由上述第1連接部從上述第1供應源所供應上述第1流體流量的第1閥。[3] In the above invention, the first supply portion may include: a first connection portion connected to a first supply source for supplying the first fluid, and a first valve for adjusting a flow rate of the first fluid supplied from the first supply source via the first connection portion.

[4]上述發明中,亦可上述第1供應部係具備有:計算出上述DUT的溫度,再根據上述DUT溫度的算出結果,對上述第1閥進行控制的第1控制部。[4] In the above invention, the first supply unit may include a first control unit that calculates the temperature of the DUT and controls the first valve based on the calculated temperature of the DUT.

[5]上述發明中,亦可上述第1控制部係依間歇式供應上述第1流體的方式,對上述第1閥進行控制。[5] In the above invention, the first control unit may control the first valve by intermittently supplying the first fluid.

[6]上述發明中,亦可上述第1控制部係利用PWM控制對上述第1閥進行控制。[6] In the above invention, the first control unit may control the first valve using PWM control.

[7]上述發明中,亦可上述第2供應部係具備有:連接供應上述第2流體之第2供應源的第2連接部、調整經由上述第2連接部從上述第2供應源所供應上述第2流體流量的第2閥、以及調整經由上述第2連接部從上述第2供應源所供應上述第2流體溫度的溫度調整部。[7] In the above invention, the second supply part may also include: a second connecting part connected to a second supply source for supplying the second fluid, a second valve for adjusting the flow rate of the second fluid supplied from the second supply source via the second connecting part, and a temperature adjusting part for adjusting the temperature of the second fluid supplied from the second supply source via the second connecting part.

[8]上述發明中,亦可上述第2供應部係具備有:對上述第2閥進行控制的第2控制部;上述第2控制部係依連續供應上述第2流體的方式,對上述第2閥進行控制。[8] In the above invention, the second supply unit may include a second control unit for controlling the second valve; the second control unit controls the second valve by continuously supplying the second fluid.

[9]上述發明中,亦可上述第2控制部係利用開關式控制對上述第2閥進行控制。[9] In the above invention, the second control unit may control the second valve using a switch type control.

[10]上述發明中,亦可上述第2供應部係具備有:在上述溫度調整部的下游端測定上述第2流體溫度的測定部;以及根據上述測定部的測定結果,對上述溫度調整部進行控制的第3控制部。[10] In the above invention, the second supply unit may include: a measuring unit for measuring the temperature of the second fluid at the downstream end of the temperature adjusting unit; and a third control unit for controlling the temperature adjusting unit based on the measurement result of the measuring unit.

[11]上述發明中,亦可上述第2連接部係含有:連接於儲存液態氮並供應氮之第3供應源的第3連接部;上述第2閥係調整經由上述第3連接部從上述第3供應源所供應上述氮流量的第3閥。[11] In the above invention, the second connection part may include: a third connection part connected to a third supply source storing liquid nitrogen and supplying nitrogen; and the second valve is a third valve for adjusting the flow rate of the nitrogen supplied from the third supply source via the third connection part.

[12]上述發明中,亦可上述第2連接部係含有:連接於供應空氣之第4供應源的第4連接部;上述第2閥係含有:調整經由上述第4連接部從上述第4供應源所供應上述空氣流量的第4閥;上述第2供應部係具備有將:連接於上述第3閥的第1流路、與連接於上述第4閥的第2流路予以合流之合流部;上述第2供應部係將由上述第3供應源所供應上述氮、由上述第4供應源所供應上述空氣、或上述空氣與上述氮的混合流體,當作上述第2流體並供應。[12] In the above invention, the second connection part may include: a fourth connection part connected to a fourth supply source for supplying air; the second valve may include: a fourth valve for adjusting the flow rate of the air supplied from the fourth supply source via the fourth connection part; the second supply part may include: a merging part for merging: a first flow path connected to the third valve and a second flow path connected to the fourth valve; the second supply part may supply the nitrogen supplied by the third supply source, the air supplied by the fourth supply source, or a mixed fluid of the air and the nitrogen as the second fluid.

[13]上述發明中,亦可上述溫度調整部係含有加熱上述第2流體的加熱部。[13] In the above invention, the temperature adjustment section may include a heating section for heating the second fluid.

[14]上述發明中,亦可上述混合部係設置於在上述插座周圍所配置的插座導件中。[14] In the above invention, the mixing portion may be disposed in a socket guide disposed around the socket.

[15]上述發明中,亦可上述混合部係設置於上述插座中。[15] In the above invention, the mixing unit may be disposed in the socket.

[16]本發明的電子元件測試裝置,係測試DUT的電子元件測試裝置,具備有:具內部空間的插座、以及上述發明的溫度調整裝置;上述溫度調整裝置係朝上述插座的上述內部空間供應流體。[16] The electronic component testing device of the present invention is an electronic component testing device for testing a DUT, comprising: a socket having an internal space, and the temperature adjusting device of the above invention; the above temperature adjusting device supplies fluid to the above internal space of the above socket.

[17]上述發明中,亦可上述插座係具備有:電氣式連接於上述DUT端子的接觸元件、以及保持上述接觸元件的殼體;上述內部空間係設置於上述殼體中;上述接觸元件係露出於上述內部空間內。 [發明效果] [17] In the above invention, the socket may also include: a contact element electrically connected to the DUT terminal, and a shell for holding the contact element; the internal space is disposed in the shell; and the contact element is exposed in the internal space. [Effect of the invention]

本發明的溫度調整裝置,藉由混合部係對第1流體混合具有溫度不同於第1流體溫度的第2流體,便可達DUT溫度調整高速化。又,本發明的溫度調整裝置,因為朝插座供應混合流體,因而可朝熱阻力較小的DUT下部供應混合流體。故,能對DUT效率佳地施行溫度調整。The temperature control device of the present invention can achieve high-speed DUT temperature control by mixing the second fluid having a temperature different from the first fluid with the first fluid in the mixing unit. In addition, the temperature control device of the present invention can supply the mixed fluid to the lower part of the DUT having a smaller thermal resistance because the mixed fluid is supplied to the socket. Therefore, the temperature control of the DUT can be performed efficiently.

以下,針對本發明實施形態根據圖式進行說明。圖1所示係本實施形態電子元件測試裝置的構成一例方塊圖。The following is a description of the embodiments of the present invention with reference to the drawings. FIG1 is a block diagram showing an example of the structure of an electronic component testing device according to the embodiment.

圖1所示電子元件測試裝置1係測試半導體集積電路元件等DUT100之電氣特性的裝置。該電子元件測試裝置1係一邊對DUT100施加高溫或低溫的熱壓力,一邊測試DUT100是否有適當動作。The electronic component test device 1 shown in Fig. 1 is a device for testing the electrical characteristics of a semiconductor integrated circuit device DUT 100. The electronic component test device 1 applies high or low temperature thermal stress to the DUT 100 to test whether the DUT 100 operates properly.

該電子元件測試裝置1係具備有:測試器2、插座3、插座導件4、以及處理器5。測試器2係執行DUT100之電氣特性測定與評價的測試。該測試器2係具備有:測試器主框架21、與經由排線22連接於該測試器主框架21的測試頭23。在測試頭23的上面裝設有插座3,在該插座3的周圍配置插座導件4。The electronic component test device 1 includes a tester 2, a socket 3, a socket guide 4, and a processor 5. The tester 2 performs a test for measuring and evaluating the electrical characteristics of the DUT 100. The tester 2 includes a tester main frame 21 and a test head 23 connected to the tester main frame 21 via a flat cable 22. The socket 3 is mounted on the test head 23, and the socket guide 4 is arranged around the socket 3.

處理器5係將DUT100押抵於插座3,俾使DUT100與插座3呈電氣式連接。藉此,經由插座3使DUT100與測試頭23呈電氣式連接。然後,測試器2從測試器主框架21經由排線22與測試頭23朝DUT100輸入信號,再根據所輸入的信號,對DUT100的輸出施行測定與評價。The processor 5 presses the DUT 100 against the socket 3 so that the DUT 100 is electrically connected to the socket 3. In this way, the DUT 100 is electrically connected to the test head 23 via the socket 3. Then, the tester 2 inputs a signal from the tester main frame 21 to the DUT 100 via the flat cable 22 and the test head 23, and then measures and evaluates the output of the DUT 100 based on the input signal.

測試對象DUT100係可例示如SoC(System on a chip,系統單晶片),亦可為記憶體系裝置、邏輯系裝置等。又,DUT100亦可為半導體晶片經利用樹脂材料等塑模材進行封裝的樹脂塑模裝置,亦可為未封裝的裸晶粒(bare die)。另外,插座3係在更換DUT100品種時,會被更換為適合於DUT100形狀、針腳數等者。The test object DUT100 can be exemplified by SoC (System on a chip), memory system device, logic system device, etc. Furthermore, DUT100 can be a resin molded device in which a semiconductor chip is packaged by using a molding material such as a resin material, or can be an unpackaged bare die. In addition, when the type of DUT100 is changed, the socket 3 will be replaced with one suitable for the shape, number of pins, etc. of DUT100.

再者,本實施形態的DUT100係具備有檢測接頭溫度的溫度檢測電路101。本實施形態的溫度檢測電路101係例如含有熱二極體的電路,形成於半導體基板上。另外,溫度檢測電路101並不僅侷限於熱二極體。例如亦可使用依存於溫度的電阻特性、或具能帶隙特性的元件,構成溫度檢測電路101,或者溫度檢測電路101亦可將熱電偶埋設於DUT100中。Furthermore, the DUT 100 of this embodiment has a temperature detection circuit 101 for detecting the temperature of the joint. The temperature detection circuit 101 of this embodiment is, for example, a circuit including a thermodiode, formed on a semiconductor substrate. In addition, the temperature detection circuit 101 is not limited to the thermodiode. For example, a component having a temperature-dependent resistance characteristic or a bandgap characteristic may be used to constitute the temperature detection circuit 101, or the temperature detection circuit 101 may also embed a thermocouple in the DUT 100.

處理器5係將DUT100搬送並押抵於插座3。該處理器5係具備有:接觸臂51、與腔52。接觸臂51係具備有:臂511、與推進器512。臂511係具備有水平移動用致動器(未圖示),依循該致動器的滑軌可沿前後左右(XY方向)進行移動。又,臂511亦具備有上下驅動用致動器(未圖示),可沿上下方向(Z軸方向)進行移動。推進器512係設置於臂511的前端。該推進器512係利用真空吸附等可接觸保持著DUT100。The handler 5 transports the DUT 100 and presses it against the socket 3. The handler 5 has a contact arm 51 and a cavity 52. The contact arm 51 has an arm 511 and a pusher 512. The arm 511 has a horizontal movement actuator (not shown), and can move forward, backward, left, and right (XY direction) along the slide rail of the actuator. In addition, the arm 511 also has an up and down driving actuator (not shown), which can move in the up and down direction (Z axis direction). The pusher 512 is set at the front end of the arm 511. The pusher 512 can contact and hold the DUT 100 by vacuum adsorption or the like.

腔52係由絕熱材料等構成的恆溫槽。因為該腔52不易受周邊環境溫度變化的影響,所以可將恆溫槽的內部環境溫度保持一定。測試頭23的上部係經由開口插入於該腔52內,而插座3則配置於腔52內。The cavity 52 is a constant temperature chamber made of insulating materials. Since the cavity 52 is not easily affected by the ambient temperature change, the internal ambient temperature of the constant temperature chamber can be kept constant. The upper part of the test head 23 is inserted into the cavity 52 through the opening, and the socket 3 is arranged in the cavity 52.

該處理器5係藉由將DUT100在由推進器512保持狀態下,使臂511進行水平移動,而搬送於位於腔52內的插座3上方。接著,利用臂511下降,使DUT100押抵於插座3。此時,推進器512係位於腔52內。The handler 5 moves the arm 511 horizontally while holding the DUT 100 by the pusher 512, and transfers the DUT 100 to the socket 3 located in the cavity 52. Then, the arm 511 is lowered to press the DUT 100 against the socket 3. At this time, the pusher 512 is located in the cavity 52.

該處理器5係具備有溫度調整系統11。該溫度調整系統11係具備有:插座溫度調整裝置6、與腔溫度調整裝置9。插座溫度調整裝置6係藉由朝插座3的內部空間34供應經溫度調整的流體,而執行DUT100之溫度調整的裝置。插座溫度調整裝置6與腔溫度調整裝置9係可如本實施形態構成處理器5其中一部分,或者亦可設為處理器5外的另一裝置。The processor 5 is provided with a temperature adjustment system 11. The temperature adjustment system 11 is provided with a socket temperature adjustment device 6 and a cavity temperature adjustment device 9. The socket temperature adjustment device 6 is a device for performing temperature adjustment of the DUT 100 by supplying a temperature-adjusted fluid to the internal space 34 of the socket 3. The socket temperature adjustment device 6 and the cavity temperature adjustment device 9 may constitute a part of the processor 5 as in the present embodiment, or may be another device outside the processor 5.

本實施形態的插座溫度調整裝置6係具備有:連續流供應部7、脈衝流供應部8、以及混合部10。The socket temperature adjustment device 6 of this embodiment includes a continuous flow supply unit 7, a pulse flow supply unit 8, and a mixing unit 10.

連續流供應部7係將由經加熱溫度調整過的冷媒或熱媒所構成加熱流體,連續性供應給混合部10的機構。熱媒與冷媒係供使用於調整DUT100的溫度。測試高溫時DUT100是否適當動作的高溫測試係使用熱媒,反之,測試低溫時DUT100是否適當動作的低溫測試係使用冷媒。本實施形態因為將熱媒或冷媒供應給插座3。因而為保護插座與測試頭的接頭等,熱媒與冷媒最好使用氣體。又,因為氣體不易如液體般發生凝固與沸騰問題,因而可拓廣溫度到達範圍。本實施形態並無特別的限定,例示冷媒係使用低溫氣態氮,熱媒係使用高溫空氣的情況。The continuous flow supply unit 7 is a mechanism that continuously supplies a heating fluid composed of a refrigerant or a heat medium whose heating temperature has been adjusted to the mixing unit 10. The heat medium and the refrigerant are used to adjust the temperature of the DUT 100. The high temperature test to test whether the DUT 100 operates properly at a high temperature uses a heat medium. Conversely, the low temperature test to test whether the DUT 100 operates properly at a low temperature uses a refrigerant. In this embodiment, the heat medium or the refrigerant is supplied to the socket 3. Therefore, in order to protect the socket and the joints of the test head, etc., it is best to use gas as the heat medium and the refrigerant. In addition, because gas is not prone to solidification and boiling problems like liquids, the temperature range that can be reached can be expanded. This embodiment is not particularly limited, and an example is given in which the refrigerant uses low-temperature gaseous nitrogen and the heat medium uses high-temperature air.

連續流供應部7係具備有:複數連接部71a,71b、流路P 1~P 5、複數閥72a 1,72a 2,72b、連續流控制部73、熱交換器74、流路加熱器75、加熱器控制部76、以及溫度感測器77。 The continuous flow supply unit 7 includes a plurality of connection units 71a, 71b, flow paths P1 to P5 , a plurality of valves 72a1 , 72a2 , 72b, a continuous flow control unit 73, a heat exchanger 74, a flow path heater 75, a heater control unit 76, and a temperature sensor 77.

連接部71a係連接於儲存液態氮並供應低溫氮的LN 2(液態氮)供應源200。LN 2供應源200係具備有與依高壓儲存例如液態氮的壓力容器間、或與工廠內之液態氮供應管線間之連接口,可對連接部71a輸送低溫氣態氮及/或液態氮。該連接部71a連接於呈雙叉分支的流路P 1,分支的流路P 1分別連接於合流部J與腔52。在分支的流路P 1中設有調整從LN 2供應源200所供應氮流量的閥72a 1,72a 2。閥72a 1係提整供應給合流部J的氮流量,另一方面,閥72a 2係調整供應給腔52內部的氮流量。 The connection part 71a is connected to the LN2 (liquid nitrogen) supply source 200 that stores liquid nitrogen and supplies low-temperature nitrogen. The LN2 supply source 200 has a connection interface with a pressure vessel that stores, for example, liquid nitrogen at high pressure, or with a liquid nitrogen supply pipeline in a factory, and can transport low-temperature gaseous nitrogen and/or liquid nitrogen to the connection part 71a. The connection part 71a is connected to a bifurcated flow path P1 , and the branched flow path P1 is connected to the confluence part J and the chamber 52 respectively. Valves 72a1 , 72a2 for adjusting the flow rate of nitrogen supplied from the LN2 supply source 200 are provided in the branched flow path P1 . The valve 72a1 adjusts the flow rate of nitrogen supplied to the junction J, while the valve 72a2 adjusts the flow rate of nitrogen supplied to the inside of the chamber 52.

連接部71b係連接於供應常溫空氣的空氣供應源300。空氣供應源300係具備有例如將外部空氣供應給連接部71b的泵。該空氣供應源300亦可採用現有的工廠配管等。該連接部71b連接於流路P 2,在該流路P 2的下游端於合流部J處與流路P 1合流。該流路P 2中設有調整從空氣供應源300所供應空氣流量的閥72b。 The connection part 71b is connected to the air supply source 300 that supplies air at room temperature. The air supply source 300 is provided with, for example, a pump that supplies external air to the connection part 71b. The air supply source 300 may also adopt existing factory piping, etc. The connection part 71b is connected to the flow path P2 , and merges with the flow path P1 at the confluence J at the downstream end of the flow path P2 . The flow path P2 is provided with a valve 72b that adjusts the flow rate of air supplied from the air supply source 300.

連續流控制部73係對閥72a 1,72a 2,72b的開閉進行開關式控制。該連續流控制部73係當執行DUT100的低溫測試時,便開放調整氮流量的閥72a 1,72a 2,將調整空氣流量的閥72b維持呈關閉狀態。即,連續流控制部73係在低溫測試時,依連續式供應冷媒之氮的方式控制著閥72a 1,72a 2The continuous flow control unit 73 performs on-off control of valves 72a1 , 72a2 , and 72b. When the low temperature test of DUT100 is performed, the continuous flow control unit 73 opens valves 72a1 and 72a2 for adjusting the nitrogen flow rate and keeps valve 72b for adjusting the air flow rate closed. That is, the continuous flow control unit 73 controls valves 72a1 and 72a2 in a manner that continuously supplies nitrogen as a refrigerant during the low temperature test.

另一方面,當執行DUT100的高溫測試時,開放調整空氣流量的閥72b,並將調整氮流量的閥72a 1,72a 2維持關閉狀態。即,連續流控制部73係依在高溫測試執行中,連續式供應空氣的方式控制著閥72b。 On the other hand, when the high temperature test of DUT 100 is performed, valve 72b for adjusting the air flow is opened, and valves 72a 1 and 72a 2 for adjusting the nitrogen flow are kept closed. That is, the continuous flow control unit 73 controls valve 72b so that air is continuously supplied during the high temperature test.

圖2所示係本實施形態電子元件測試裝置1的腔52內部構成一例側視圖。如圖1與圖2所示,合流部J連接於流路P 3,在該流路P 3下游端,於腔52內部連接熱交換器74。該熱交換器74係設置於腔52內部,在從流路P 3所供應流體、與腔52內環境之間進行熱交換。 FIG2 is a side view showing an example of the internal structure of the chamber 52 of the electronic component test device 1 of this embodiment. As shown in FIG1 and FIG2, the confluence portion J is connected to the flow path P3 , and at the downstream end of the flow path P3 , a heat exchanger 74 is connected inside the chamber 52. The heat exchanger 74 is disposed inside the chamber 52 to perform heat exchange between the fluid supplied from the flow path P3 and the environment inside the chamber 52.

如圖2所示,熱交換器74係具備有:本體部741、與在該本體部741中形成的複數鰭片742。在本體部741內部形成供從流路P 3所供應流體流通用的流路P 4。該流路P 4係從本體部741一端延伸至另一端,具有依使與本體部741間之接觸面積變大方式蛇行的線形狀。鰭片742係設計呈裸露出腔52內部的狀態,藉由該鰭片742增加熱交換器74的表面積,便可在流路P 4流通的流體、與腔52內環境間效率佳進行熱交換。 As shown in FIG. 2 , the heat exchanger 74 includes a body 741 and a plurality of fins 742 formed in the body 741. A flow path P4 is formed inside the body 741 for the fluid supplied from the flow path P3 to flow. The flow path P4 extends from one end of the body 741 to the other end and has a linear shape that is serpentine in a manner that increases the contact area with the body 741. The fins 742 are designed to be exposed inside the cavity 52. By increasing the surface area of the heat exchanger 74, the fluid flowing in the flow path P4 and the environment inside the cavity 52 can be efficiently exchanged.

腔52內環境的溫度係利用腔溫度調整裝置9調整為高溫或低溫。該腔溫度調整裝置9係具備有:上述連接部71a、上述閥72a 2、上述流路P 1、氮供應口91、腔加熱器92、以及風扇93。即,本實施形態中,插座溫度調整裝置6與腔溫度調整裝置9係共用流路P 1其中一部分、連接部71a、以及閥72a 2The temperature of the environment in the chamber 52 is adjusted to a high temperature or a low temperature by the chamber temperature adjusting device 9. The chamber temperature adjusting device 9 includes: the connection portion 71a, the valve 72a2 , the flow path P1 , a nitrogen supply port 91, a chamber heater 92, and a fan 93. That is, in this embodiment, the socket temperature adjusting device 6 and the chamber temperature adjusting device 9 share a part of the flow path P1 , the connection portion 71a, and the valve 72a2 .

氮供應口91係經由流路P 1連接於連接部71a。該氮供應口91係藉由將由LN 2供應源200所供應的低溫氮,供應給腔52內,而使腔52內環境的溫度降低。另一方面,腔加熱器92係加熱腔52內的環境而使環境溫度上升。 The nitrogen supply port 91 is connected to the connection portion 71a via the flow path P1 . The nitrogen supply port 91 supplies low-temperature nitrogen supplied by the LN2 supply source 200 into the chamber 52 to lower the temperature of the environment in the chamber 52. On the other hand, the chamber heater 92 heats the environment in the chamber 52 to increase the ambient temperature.

風扇93係利用送風使腔52內環境進行循環,藉此效率佳使環境溫度變化。該風扇93係在循環的環境流動中,設置於較熱交換器74更靠上游端,可對熱交換器74進行送風。又,本實施形態的腔加熱器92係位於較熱交換器74更靠上游端,且較風扇93更靠下游端。又,本實施形態的氮供應口91係位於較熱交換器74更靠上游端,且較風扇93更靠下游端。The fan 93 circulates the environment in the chamber 52 by sending air, thereby efficiently changing the ambient temperature. The fan 93 is disposed at the upstream end of the heat exchanger 74 in the circulating ambient flow, and can send air to the heat exchanger 74. In addition, the chamber heater 92 of this embodiment is located at the upstream end of the heat exchanger 74 and at the downstream end of the fan 93. In addition, the nitrogen supply port 91 of this embodiment is located at the upstream end of the heat exchanger 74 and at the downstream end of the fan 93.

當施行DUT100的低溫測試時,腔溫度調整裝置9係一邊利用風扇93進行送風,一邊從氮供應口91朝腔52內供應低溫氮,使腔52內環境的溫度降低至目標溫度(Target Temperature)。當環境溫度較低於目標溫度等情況時,視需要亦可利用腔加熱器92對環境施行加熱。When performing a low temperature test on the DUT 100, the chamber temperature adjustment device 9 supplies low temperature nitrogen from the nitrogen supply port 91 into the chamber 52 while using the fan 93 to blow air, so that the temperature of the environment in the chamber 52 is reduced to the target temperature. When the environment temperature is lower than the target temperature, the chamber heater 92 can be used to heat the environment as needed.

此時,本實施形態在低溫測試時,LN 2供應源200係將LN 2供應給插座溫度調整裝置6。因為低溫測試時的腔內環境設定溫度,通常均呈較高於在流路P 4中流通的氮溫度,因而本實施形態在流路P 4中流通的氮會被熱交換器74加熱。 At this time, in the present embodiment, during the low temperature test, the LN2 supply source 200 supplies LN2 to the socket temperature adjustment device 6. Since the chamber environment setting temperature during the low temperature test is usually higher than the nitrogen temperature flowing in the flow path P4 , the nitrogen flowing in the flow path P4 in the present embodiment is heated by the heat exchanger 74.

再者,當施行DUT100的高溫測試時,腔溫度調整裝置9係一邊利用風扇93送風,一邊利用腔加熱器92使腔52內環境溫度上升至目標溫度。本實施形態在高溫測試時,雖空氣供應源300係將常溫空氣供應給插座溫度調整裝置6,但因為高溫測試時的腔內環境設定溫度較高於常溫,因而即使施行高溫測試的情況,在流路P 4中流通的流體仍會被熱交換器74加熱。 Furthermore, when the high temperature test of DUT 100 is performed, the cavity temperature adjustment device 9 uses the cavity heater 92 to raise the ambient temperature in the cavity 52 to the target temperature while using the fan 93 to blow air. In this embodiment, although the air supply source 300 supplies normal temperature air to the socket temperature adjustment device 6 during the high temperature test, the cavity ambient setting temperature during the high temperature test is higher than the normal temperature. Therefore, even if the high temperature test is performed, the fluid flowing in the flow path P4 is still heated by the heat exchanger 74.

依此,腔52內環境的溫度係不管在低溫測試與高溫測試任一測試時,均設定為較高於在流路P 4中流通流體的溫度,因而在流路P 4中流通的流體便利用熱交換被加熱。依此,藉由熱交換器74利用腔52內環境的熱,便可減少由流路加熱器75施加的流體加熱量。 Thus, the temperature of the environment in the chamber 52 is set higher than the temperature of the fluid flowing in the flow path P4 regardless of whether the test is low temperature or high temperature, so that the fluid flowing in the flow path P4 is heated by heat exchange. Thus, the heat exchanger 74 utilizes the heat of the environment in the chamber 52, thereby reducing the amount of fluid heating applied by the flow path heater 75.

在流路P 4的下游端連接著流路P 5。如圖1所示,在該流路P 5中設有流路加熱器75。該流路加熱器75對在流路P 5中流通的流體加熱。如上述,因為利用流路加熱器75進行加熱的流體,會預先利用熱交換器74進行加熱,因而流路加熱器75可使用輸出較小的加熱器。 The downstream end of the flow path P4 is connected to the flow path P5 . As shown in FIG1, a flow path heater 75 is provided in the flow path P5 . The flow path heater 75 heats the fluid flowing in the flow path P5 . As described above, since the fluid heated by the flow path heater 75 is heated in advance by the heat exchanger 74, the flow path heater 75 can use a heater with a relatively small output.

加熱器控制部76係對流路加熱器75進行回饋控制。具體而言,該加熱器控制部76係根據在流路P 5中設置於較流路加熱器75更靠下游端的溫度感測器77之溫度測定值,依縮小溫度測定值與目標溫度(Target Temperature)間之偏差的方式,對流路加熱器75的輸出進行PID控制。該流體的目標溫度並無特別的限定,例如在高溫測試時可設為較DUT目標溫度設定值(Set temperature)高出20℃左右的溫度,在低溫測試時可設為較DUT目標溫度設定值(Set temperature)低20℃左右的溫度。 The heater control unit 76 performs feedback control on the flow path heater 75. Specifically, the heater control unit 76 performs PID control on the output of the flow path heater 75 in a manner of reducing the deviation between the temperature measurement value and the target temperature (Target Temperature) according to the temperature measurement value of the temperature sensor 77 disposed at the downstream end of the flow path heater 75 in the flow path P5. The target temperature of the fluid is not particularly limited. For example, in a high temperature test, it can be set to a temperature that is about 20°C higher than the DUT target temperature set value (Set temperature), and in a low temperature test, it can be set to a temperature that is about 20°C lower than the DUT target temperature set value (Set temperature).

在流路P 5的下游端連接著混合部10,經利用流路加熱器75進行加熱後的加熱流體,被供應給混合部10。 The downstream end of the flow path P5 is connected to the mixing unit 10, and the heated fluid heated by the flow path heater 75 is supplied to the mixing unit 10.

脈衝流供應部8係將由常溫壓縮乾燥空氣所形成的常溫流體,間歇式供應給混合部10的機構。該脈衝流供應部8係利用常溫壓縮乾燥空氣,使由連續流供應部7供應給混合部10的加熱流體溫度出現瞬間變化。The pulse flow supply section 8 is a mechanism for intermittently supplying a normal temperature fluid formed by compressing dry air at normal temperature to the mixing section 10. The pulse flow supply section 8 utilizes the normal temperature compressed dry air to cause an instantaneous change in the temperature of the heated fluid supplied to the mixing section 10 by the continuous flow supply section 7.

該脈衝流供應部8係具備有:連接部81、閥82、以及脈衝流控制部83。連接部81係連接於供應壓縮乾燥空氣的CDA(Compressed Dry Air,壓縮乾燥空氣)供應源400。CDA供應源400係例如亦可具備有:吸入外部空氣並壓縮的壓縮機、以及將已壓縮空氣施行乾燥的乾燥機。又,CDA供應源400亦可為能供應壓縮乾燥空氣的現有工廠配管等。The pulse flow supply unit 8 includes a connection unit 81, a valve 82, and a pulse flow control unit 83. The connection unit 81 is connected to a CDA (Compressed Dry Air) supply source 400 that supplies compressed dry air. The CDA supply source 400 may include, for example, a compressor that sucks in external air and compresses it, and a dryer that dries the compressed air. In addition, the CDA supply source 400 may also be an existing factory piping that can supply compressed dry air.

由脈衝流供應部8供應的流體,在混合部10中會與由連續流供應部7供應的低溫氮等進行混合,因而為防止結露,最好使用露點溫度較低的壓縮乾燥空氣。雖無特別的限定,壓縮乾燥空氣在大氣壓下的露點溫度較佳係-70℃以下。The fluid supplied by the pulse flow supply section 8 is mixed with the low-temperature nitrogen supplied by the continuous flow supply section 7 in the mixing section 10. Therefore, in order to prevent condensation, it is best to use compressed dry air with a low dew point temperature. Although there is no particular limitation, the dew point temperature of the compressed dry air under atmospheric pressure is preferably below -70°C.

該連接部81係連接於流路P 6,在該流路P 6的下游端連接著混合部10。又,在該流路P 6中設有調整從CDA供應源400所供應壓縮乾燥空氣流量的閥82。本實施形態的閥82係可使用具高頻的常溫用閥,因而可高速控制壓縮乾燥空氣的流量。 The connection part 81 is connected to the flow path P6 , and the mixing part 10 is connected to the downstream end of the flow path P6 . In addition, a valve 82 for adjusting the flow rate of the compressed dry air supplied from the CDA supply source 400 is provided in the flow path P6 . The valve 82 of this embodiment can use a high-frequency normal temperature valve, so the flow rate of the compressed dry air can be controlled at a high speed.

脈衝流控制部83係依間歇式供應壓縮乾燥空氣方式,對閥82施行PWM控制。該脈衝流控制部83係根據從DUT100的溫度檢測電路101所輸入信號,計算出DUT100的接頭溫度Tj。然後,脈衝流控制部83係依縮小接頭溫度計算結果、與DUT100目標溫度間之偏差的方式,對閥82進行控制,而控制供應給流路P 6的壓縮乾燥空氣流量。此時使用接頭溫度的控制具體例,係可例示如:美國專利申請案第15/719,849(美國專利申請案公開第2019/0101587號說明書)、美國專利申請案第16/351,363(美國專利申請案公開第2020/0033402號說明書)、美國專利申請案第16/575,460(美國專利申請案公開第2020/0241582號說明書)、及美國專利申請案第16/575,470(美國專利申請案公開第2020/0241040號說明書)所記載的控制。 The pulse flow control unit 83 performs PWM control on the valve 82 in an intermittent supply of compressed dry air. The pulse flow control unit 83 calculates the joint temperature Tj of the DUT 100 based on the signal input from the temperature detection circuit 101 of the DUT 100. Then, the pulse flow control unit 83 controls the valve 82 in a manner to reduce the deviation between the joint temperature calculation result and the target temperature of the DUT 100, thereby controlling the flow rate of compressed dry air supplied to the flow path P6 . Specific examples of the control of the joint temperature used at this time include the control described in U.S. Patent Application No. 15/719,849 (U.S. Patent Application Publication No. 2019/0101587), U.S. Patent Application No. 16/351,363 (U.S. Patent Application Publication No. 2020/0033402), U.S. Patent Application No. 16/575,460 (U.S. Patent Application Publication No. 2020/0241582), and U.S. Patent Application No. 16/575,470 (U.S. Patent Application Publication No. 2020/0241040).

圖3所示係本實施形態電子元件測試裝置的插座附近構成一例剖視圖。本實施形態的混合部10係設置於插座導件4中。該混合部10係具有中空的構件,內部形成:連接於連續流供應部7之流路P 5的流路P 7、以及連接於脈衝流供應部8之流路P 6的流路P 8。流路P 7連接於流路P 8一端,在該連接部分處,將由連續流供應部7所供應的流體、與由脈衝流供應部8所供應的流體進行混合。 FIG3 is a cross-sectional view of an example of the configuration near the socket of the electronic component test device of this embodiment. The mixing section 10 of this embodiment is provided in the socket guide 4. The mixing section 10 is a hollow member, and the inside thereof is formed with: a flow path P7 connected to the flow path P5 of the continuous flow supply section 7, and a flow path P8 connected to the flow path P6 of the pulse flow supply section 8. The flow path P7 is connected to one end of the flow path P8 , and at the connection portion, the fluid supplied by the continuous flow supply section 7 and the fluid supplied by the pulse flow supply section 8 are mixed.

混合部10的流路P 7係連接於插座導件4內部所形成的流路P 9。該流路P 9係連接於插座3的內部空間34,經由該流路P 9將來自混合部10的混合流體供應給內部空間34。又,內部空間34連接於插座導件4的流路P 10,將從該流路P 10通過內部空間34的混合流體進行排氣。因為本實施形態的混合流體係屬於氣體,因而經排氣的混合流體沒有回收的必要。 The flow path P7 of the mixing section 10 is connected to the flow path P9 formed inside the socket guide 4. The flow path P9 is connected to the internal space 34 of the socket 3, and the mixed fluid from the mixing section 10 is supplied to the internal space 34 through the flow path P9 . In addition, the internal space 34 is connected to the flow path P10 of the socket guide 4, and the mixed fluid passing through the internal space 34 from the flow path P10 is exhausted. Since the mixed fluid of this embodiment is a gas, it is not necessary to recover the exhausted mixed fluid.

本實施形態的插座3係具備有:殼體31、複數接觸元件32、螺旋彈簧33、以及內部空間34。該殼體31係具備有機座構件311、與頂板312。機座構件311係設置於測試頭23上。該機座構件311係具有複數第1保持孔311a。The socket 3 of this embodiment includes: a housing 31, a plurality of contact elements 32, a coil spring 33, and an internal space 34. The housing 31 includes a base member 311 and a top plate 312. The base member 311 is disposed on the test head 23. The base member 311 has a plurality of first holding holes 311a.

頂板312係支撐呈利用在機座構件311中所設置的螺旋彈簧33,可沿DUT100按押方向移動。頂板312遠離機座構件311,藉此在機座構件311與頂板312之間形成內部空間34。頂板312係設有依相對向於第1保持孔311a狀態設置的複數第2保持孔312a。The top plate 312 is supported by a coil spring 33 provided in the base member 311 and can move along the pressing direction of the DUT 100. The top plate 312 is away from the base member 311, thereby forming an internal space 34 between the base member 311 and the top plate 312. The top plate 312 is provided with a plurality of second holding holes 312a provided in a state opposite to the first holding holes 311a.

第1與第2保持孔311a,312a係由接觸元件32保持。該接觸元件32係由金屬等構成,第2保持孔312a接觸於DUT100的端子102。藉此,DUT100與測試頭23便呈電氣式連接。The first and second holding holes 311a and 312a are held by the contact element 32. The contact element 32 is made of metal or the like, and the second holding hole 312a contacts the terminal 102 of the DUT 100. Thus, the DUT 100 and the test head 23 are electrically connected.

再者,接觸元件32其中一部分露出於內部空間34,並接觸於供應給內部空間34的混合流體。因為接觸元件32的熱導率高,因而具有散熱片機能。供應給內部空間34的混合流體經由接觸元件32,在與DUT100間進行熱交換,而調整DUT100的溫度。Furthermore, a portion of the contact element 32 is exposed in the internal space 34 and contacts the mixed fluid supplied to the internal space 34. Since the contact element 32 has a high thermal conductivity, it has a heat sink function. The mixed fluid supplied to the internal space 34 exchanges heat with the DUT 100 through the contact element 32, thereby adjusting the temperature of the DUT 100.

本實施形態的電子元件測試裝置1係當施行低溫測試時,便依如下述執行溫度調整。首先,由連續流控制部73打開閥72a 1,72a 2,藉由將閥72a 1,72a 2維持開啟狀態,便將低溫氮連續式供應給腔52與熱交換器74。供應給熱交換器74的氮係藉由與腔52內環境進行熱交換而被加熱後,再於流路P 5中,依氮溫度較設定值低20℃左右的方式,利用流路加熱器75被加熱。此時,因為氮係利用熱交換器74被加熱,因而可減少由流路加熱器75施加的氮加熱量。朝混合部10連續式供應經流路加熱器75加熱的氮。 When the electronic component test apparatus 1 of this embodiment performs a low temperature test, the temperature adjustment is performed as follows. First, the valves 72a1 and 72a2 are opened by the continuous flow control unit 73, and the low temperature nitrogen is continuously supplied to the chamber 52 and the heat exchanger 74 by maintaining the valves 72a1 and 72a2 in the open state. The nitrogen supplied to the heat exchanger 74 is heated by heat exchange with the environment in the chamber 52, and then heated by the flow path heater 75 in the flow path P5 so that the nitrogen temperature is about 20°C lower than the set value. At this time, because the nitrogen is heated by the heat exchanger 74, the nitrogen heating amount applied by the flow path heater 75 can be reduced. Nitrogen heated by the flow path heater 75 is continuously supplied to the mixing section 10.

在此之同時,脈衝流控制部83利用上述PWM控制重複進行閥82的開閉,而將壓縮乾燥空氣間歇式供應給混合部10。壓縮乾燥空氣係利用混合部10而與氮混合,使混合流體的溫度上升,便製成經溫度調整至設定溫度附近的混合流體。依此,本實施形態因為利用脈衝流控制部83施行PWM控制而頻繁重複閥82的開閉,便可精密控制供應給插座3的混合流體溫度。At the same time, the pulse flow control unit 83 repeatedly opens and closes the valve 82 by the PWM control, and intermittently supplies the compressed dry air to the mixing unit 10. The compressed dry air is mixed with nitrogen by the mixing unit 10, and the temperature of the mixed fluid is increased, thereby producing a mixed fluid whose temperature is adjusted to near the set temperature. In this way, the present embodiment can precisely control the temperature of the mixed fluid supplied to the socket 3 by repeatedly opening and closing the valve 82 by the PWM control of the pulse flow control unit 83.

另一方面,當施行高溫測試時,本實施形態的電子元件測試裝置1係依如下述執行溫度調整。首先,由連續流控制部73打開閥72b,藉由將閥72b維持開啟狀態,便將常溫空氣連續式供應給熱交換器74。此時,腔52內的環境利用腔加熱器92被加熱。供應給熱交換器74的空氣利用與腔52內環境進行熱交換而被加熱後,再於流路P 5中,依空氣溫度較設定值高出20℃左右方式,利用流路加熱器75施行加熱。此時,因為空氣利用熱交換器74被加熱,因而可減少由流路加熱器75進行的空氣加熱量。朝混合部10連續式供應經流路加熱器75加熱的空氣。 On the other hand, when a high temperature test is performed, the electronic component test device 1 of this embodiment performs temperature adjustment as follows. First, the valve 72b is opened by the continuous flow control unit 73, and by maintaining the valve 72b in an open state, air at room temperature is continuously supplied to the heat exchanger 74. At this time, the environment in the chamber 52 is heated by the chamber heater 92. The air supplied to the heat exchanger 74 is heated by heat exchange with the environment in the chamber 52, and then heated by the flow path heater 75 in the flow path P5 in such a way that the air temperature is about 20°C higher than the set value. At this time, because the air is heated by the heat exchanger 74, the amount of air heating by the flow path heater 75 can be reduced. The air heated by the flow path heater 75 is continuously supplied to the mixing section 10.

在此之同時,脈衝流控制部83利用上述PWM控制重複進行閥82的開閉,而將壓縮乾燥空氣間歇式供應給混合部10。壓縮乾燥空氣係利用混合部10而與加熱空氣混合,使混合流體的溫度降低,便製成經溫度調整至設定溫度附近的混合流體。依此,執行高溫測試的情況,亦是因為利用脈衝流控制部83施行PWM控制而頻繁重複閥82的開閉,便可精密控制供應給插座3的混合流體溫度。At the same time, the pulse flow control unit 83 repeatedly opens and closes the valve 82 using the above-mentioned PWM control, and intermittently supplies the compressed dry air to the mixing unit 10. The compressed dry air is mixed with the heated air by the mixing unit 10, so that the temperature of the mixed fluid is reduced, and a mixed fluid whose temperature is adjusted to near the set temperature is produced. In this way, when performing a high temperature test, the pulse flow control unit 83 performs PWM control and repeatedly opens and closes the valve 82, so that the temperature of the mixed fluid supplied to the socket 3 can be precisely controlled.

根據如上述的本實施形態電子元件測試裝置1,藉由在混合部10中,對低溫氣態氮、或加熱空氣等加熱流體,混合入常溫壓縮乾燥空氣等常溫流體,便可使混合流體的溫度在短時間內出現較大變化。故,能達DUT溫度調整的高速化。According to the electronic component test apparatus 1 of the present embodiment as described above, by mixing a heating fluid such as low-temperature gaseous nitrogen or heated air with a normal-temperature fluid such as normal-temperature compressed dry air in the mixing section 10, the temperature of the mixed fluid can be greatly changed in a short time. Therefore, the DUT temperature adjustment can be accelerated.

再者,根據本實施形態的電子元件測試裝置1,因為朝插座3供應混合流體,因而可朝熱阻力較小的DUT100下部供應混合流體。所以,可對DUT有效率地施行溫度調整。特別係樹脂塑模裝置,因為利用熱阻力較大的樹脂塑模覆蓋半導體晶片,因而即使從樹脂塑模端(上側)施行溫度,仍無法效率佳調整半導體晶片的溫度,但如本實施形態藉由經插座3的內部空間從下側施加溫度,便可效率佳調整半導體晶片的溫度。Furthermore, according to the electronic component test device 1 of this embodiment, since the mixed fluid is supplied to the socket 3, the mixed fluid can be supplied to the lower part of the DUT 100 having a relatively small thermal resistance. Therefore, the temperature of the DUT can be efficiently adjusted. In particular, in a resin mold device, since the semiconductor chip is covered with a resin mold having a relatively large thermal resistance, the temperature of the semiconductor chip cannot be efficiently adjusted even if the temperature is applied from the resin mold end (upper side). However, in this embodiment, by applying the temperature from the lower side through the internal space of the socket 3, the temperature of the semiconductor chip can be efficiently adjusted.

特別係本實施形態,將熱容量較小的高導熱性接觸元件32使用為散熱片,在混合流體與DUT100之間施行熱交換,因而可效率佳施行DUT100的溫度調整。In particular, in this embodiment, the high thermal conductivity contact element 32 with a relatively small heat capacity is used as a heat sink to perform heat exchange between the mixed fluid and the DUT 100, thereby efficiently adjusting the temperature of the DUT 100.

再者,習知當測試短時間會生成急遽自熱等形式的DUT時,溫度調整會有無法追蹤DUT之急遽溫度變化的情況,但根據本實施形態的電子元件測試裝置1,可高速切換溫度調整時所使用混合流體的溫度,因而可追蹤DUT100的急遽溫度變化。Furthermore, it is known that when a DUT that generates rapid self-heating in a short period of time is tested, the temperature adjustment may not be able to track the rapid temperature changes of the DUT. However, according to the electronic component testing device 1 of this embodiment, the temperature of the mixed fluid used for temperature adjustment can be switched at high speed, thereby tracking the rapid temperature changes of the DUT100.

再者,藉由將混合部10設於插座3附近,便縮短到達內部空間34的流路,故能可減小混合流體受流路熱阻力的影響。所以,可提升溫度調整精度。Furthermore, by arranging the mixing section 10 near the socket 3, the flow path to the inner space 34 is shortened, so that the influence of the thermal resistance of the flow path on the mixed fluid can be reduced. Therefore, the temperature adjustment accuracy can be improved.

再者,接觸臂設有溫度調整裝置的電子元件測試裝置,若處理器設有複數接觸臂的情況,亦會導致溫度調整裝置的數量增加。相對於此,若本實施形態從插座3端執行溫度調整的電子元件測試裝置1,無關接觸臂51的數量,均可利用最小極限數量的插座溫度調整裝置6施行DUT100之溫度調整。Furthermore, in the case of an electronic component test device having a temperature adjustment device on a contact arm, if the processor is provided with a plurality of contact arms, the number of temperature adjustment devices will also increase. In contrast, in the electronic component test device 1 of the present embodiment that performs temperature adjustment from the socket 3 end, regardless of the number of contact arms 51, the temperature adjustment of the DUT 100 can be performed using the minimum number of socket temperature adjustment devices 6.

另外,上述所說明實施形態係為能輕易理解本發明而記載,並非為限定本發明而記載。所以,涵蓋上述實施形態所揭示各要件在不逾越本發明技術範圍前提下,所為之任何設計變更、均等物。In addition, the above-described embodiments are recorded to facilitate the understanding of the present invention, and are not recorded to limit the present invention. Therefore, any design changes and equivalents made to the elements disclosed in the above-described embodiments are covered without exceeding the technical scope of the present invention.

例如上述實施形態,加熱流體並非同時使用從LN 2供應源200所供應低溫氮、與從空氣供應源300所供應空氣,惟並不僅侷限於此,加熱流體亦可使用由二者混合形成的混合流體。 For example, in the above-mentioned embodiment, the heating fluid does not use the low-temperature nitrogen supplied from the LN2 supply source 200 and the air supplied from the air supply source 300 at the same time, but it is not limited to this. The heating fluid can also use a mixed fluid formed by mixing the two.

再者,上述實施形態,插座溫度調整裝置6係將流體加熱後才供應給混合部10,惟並不僅侷限此。例如亦可配合測試時的設定溫度,藉由將腔52的內部環境溫度,設為較低於在熱交換器74的流路P 4中流通之流體溫度,而冷卻流體。又,亦可取代流路加熱器75,改為設置冷卻器施行流體冷卻。 Furthermore, in the above-mentioned embodiment, the socket temperature adjustment device 6 heats the fluid before supplying it to the mixing part 10, but the present invention is not limited thereto. For example, the internal environment temperature of the chamber 52 may be set lower than the temperature of the fluid flowing in the flow path P4 of the heat exchanger 74 in accordance with the set temperature during the test, thereby cooling the fluid. In addition, a cooler may be provided instead of the flow path heater 75 to cool the fluid.

再者,上述實施形態,混合部10係設置於插座導件中,惟並不僅侷限此。例如混合部10亦可設置於插座中。Furthermore, in the above-mentioned embodiment, the mixing part 10 is disposed in the socket guide, but the present invention is not limited thereto. For example, the mixing part 10 may also be disposed in the socket.

1:電子元件測試裝置 2:測試器 21:測試器主框架 22:排線 23:測試頭 3:插座 31:殼體 311:機座構件 311a:第1保持孔 312:頂板 312a:第2保持孔 32:接觸元件 33:螺旋彈簧 34:內部空間 4:插座導件 5:處理器 51:接觸臂 511:臂 512:推進器 52:腔 6:插座溫度調整裝置 7:連續流供應部 71a,71b:連接部 72a 1,72a 2,72b:閥 73:連續流控制部 74:熱交換器 741:本體部 742:鰭片 75:流路加熱器 76:加熱器控制部 77:溫度感測器 8:脈衝流供應部 81:連接部 82:閥 83:脈衝流控制部 9:腔溫度調整裝置 91:氮供應口 92:腔加熱器 93:風扇 10:混合部 11:溫度調整系統 P 1~P 10:流路 J:合流部 100:DUT 101:溫度檢測電路 102:端子 200:LN 2供應源 300:空氣供應源 400:CDA供應源 1: Electronic component test device 2: Tester 21: Tester main frame 22: Cable 23: Test head 3: Socket 31: Shell 311: Base member 311a: First holding hole 312: Top plate 312a: Second holding hole 32: Contact element 33: Coil spring 34: Internal space 4: Socket guide 5: Processor 51: Contact arm 511: Arm 512: Pusher 52: Cavity 6: Socket temperature adjustment device 7: Continuous flow supply part 71a, 71b: Connecting part 72a 1 , 72a 2 ,72b:valve 73:continuous flow control unit 74:heat exchanger 741:body 742:fin 75:flow path heater 76:heater control unit 77:temperature sensor 8:pulse flow supply unit 81:connection unit 82:valve 83:pulse flow control unit 9:cavity temperature adjustment device 91:nitrogen supply port 92:cavity heater 93:fan 10:mixing unit 11:temperature adjustment system P 1 ~ P 10 :flow path J:merging unit 100:DUT 101:temperature detection circuit 102:terminal 200:LN 2 supply source 300:air supply source 400:CDA supply source

圖1係本發明實施形態電子元件測試裝置的構成一例方塊圖。 圖2係本發明實施形態電子元件測試裝置的腔內部構成一例剖視圖。 圖3係本發明實施形態電子元件測試裝置的插座與插座導件之構成一例剖視圖。 FIG. 1 is a block diagram showing an example of the structure of the electronic component testing device according to the present invention. FIG. 2 is a cross-sectional view showing an example of the structure of the inner part of the cavity of the electronic component testing device according to the present invention. FIG. 3 is a cross-sectional view showing an example of the structure of the socket and the socket guide of the electronic component testing device according to the present invention.

1:電子元件測試裝置 1: Electronic component testing equipment

2:測試器 2: Tester

21:測試器主框架 21: Tester main frame

22:排線 22: Cable arrangement

23:測試頭 23: Test head

3:插座 3: Socket

34:內部空間 34: Internal space

4:插座導件 4: Socket guide

5:處理器 5: Processor

51:接觸臂 51: Contact arm

52:腔 52: cavity

511:臂 511: Arm

512:推進器 512:Thruster

6:插座溫度調整裝置 6: Socket temperature adjustment device

7:連續流供應部 7: Continuous flow supply department

73:連續流控制部 73: Continuous flow control unit

74:熱交換器 74:Heat exchanger

75:流路加熱器 75: Flow path heater

76:加熱器控制部 76: Heater control unit

77:溫度感測器 77: Temperature sensor

71a,71b:連接部 71a, 71b: Connection part

72a1,72a2,72b:閥 72a 1 ,72a 2 ,72b: Valve

8:脈衝流供應部 8: Pulse flow supply unit

81:連接部 81:Connection part

82:閥 82: Valve

83:脈衝流控制部 83: Pulse flow control unit

9:腔溫度調整裝置 9: Cavity temperature adjustment device

10:混合部 10: Mixing section

11:溫度調整系統 11: Temperature adjustment system

100:DUT 100:DUT

101:溫度檢測電路 101: Temperature detection circuit

200:LN2供應源 200:LN 2 supply source

300:空氣供應源 300: Air supply source

400:CDA供應源 400:CDA supply source

P1~P6:流路 P 1 ~P 6 : Flow path

Claims (15)

一種溫度調整裝置,係調整電氣式連接於插座的DUT溫度之溫度調整裝置;其中,上述插座係具有內部空間;上述溫度調整裝置係具備有:第1供應部,其係供應第1流體;第2供應部,其係供應具溫度不同於上述第1流體溫度的第2流體;以及混合部,其係將從上述第1供應部供應的第1流體、與從上述第2供應部供應的上述第2流體予以混合,再將混合流體供應給上述內部空間,其中,上述混合部係設置於在上述插座周圍所配置的插座導件中、或設置於上述插座中。 A temperature adjustment device is a temperature adjustment device for adjusting the temperature of a DUT electrically connected to a socket; wherein the socket has an internal space; the temperature adjustment device has: a first supply part, which supplies a first fluid; a second supply part, which supplies a second fluid having a temperature different from that of the first fluid; and a mixing part, which mixes the first fluid supplied from the first supply part and the second fluid supplied from the second supply part, and then supplies the mixed fluid to the internal space, wherein the mixing part is arranged in a socket guide arranged around the socket, or in the socket. 如請求項1之溫度調整裝置,其中,上述第1流體係常溫空氣;上述第2流體係具有溫度較高於上述第1流體溫度的氣體、或具有溫度較低於上述第1流體溫度的氣體。 As in the temperature adjustment device of claim 1, the first fluid is room temperature air; the second fluid is a gas having a temperature higher than the temperature of the first fluid, or a gas having a temperature lower than the temperature of the first fluid. 如請求項1之溫度調整裝置,其中,上述第1供應部係具備有:第1連接部,其係連接於供應上述第1流體的第1供應源;以及第1閥,其係調整經由上述第1連接部從上述第1供應源所供應的上述第1流體流量。 The temperature control device of claim 1, wherein the first supply portion comprises: a first connection portion connected to a first supply source supplying the first fluid; and a first valve for adjusting the flow rate of the first fluid supplied from the first supply source via the first connection portion. 如請求項3之溫度調整裝置,其中,上述第1供應部係具備有:計算出上述DUT的溫度,再根據上述DUT溫度的算出結果,對上述第1閥進行控制的第1控制部。 The temperature adjustment device of claim 3, wherein the first supply unit has a first control unit that calculates the temperature of the DUT and controls the first valve according to the calculated result of the DUT temperature. 如請求項4之溫度調整裝置,其中,上述第1控制部係依間歇式供應上述第1流體的方式,對上述第1閥進行控制。 As in the temperature control device of claim 4, the first control unit controls the first valve by intermittently supplying the first fluid. 如請求項4之溫度調整裝置,其中,上述第1控制部係利用PWM 控制對上述第1閥進行控制。 As in claim 4, the temperature control device, wherein the first control unit controls the first valve using PWM control. 如請求項1之溫度調整裝置,其中,上述第2供應部係具備有:第2連接部,其係連接供應上述第2流體的第2供應源;第2閥,其係調整經由上述第2連接部從上述第2供應源所供應上述第2流體流量;以及溫度調整部,其係調整經由上述第2連接部從上述第2供應源所供應的上述第2流體溫度。 The temperature adjustment device of claim 1, wherein the second supply portion comprises: a second connection portion connected to a second supply source for supplying the second fluid; a second valve for adjusting the flow rate of the second fluid supplied from the second supply source via the second connection portion; and a temperature adjustment portion for adjusting the temperature of the second fluid supplied from the second supply source via the second connection portion. 如請求項7之溫度調整裝置,其中,上述第2供應部係具備有:對上述第2閥進行控制的第2控制部;上述第2控制部係依連續供應上述第2流體的方式,對上述第2閥進行控制。 As in claim 7, the temperature adjustment device, wherein the second supply unit comprises: a second control unit for controlling the second valve; the second control unit controls the second valve by continuously supplying the second fluid. 如請求項8之溫度調整裝置,其中,上述第2控制部係利用開關式控制對上述第2閥進行控制。 As in the temperature control device of claim 8, the second control unit controls the second valve using a switch type control. 如請求項7之溫度調整裝置,其中,上述第2供應部係具備有:測定部,其係在上述溫度調整部的下游端測定上述第2流體溫度;以及第3控制部,其係根據上述測定部的測定結果,對上述溫度調整部進行控制。 The temperature adjustment device of claim 7, wherein the second supply section comprises: a measuring section, which measures the temperature of the second fluid at the downstream end of the temperature adjustment section; and a third control section, which controls the temperature adjustment section according to the measurement result of the measuring section. 如請求項7之溫度調整裝置,其中,上述第2連接部係含有:連接於儲存液態氮並供應氮之第3供應源的第3連接部;上述第2閥係調整經由上述第3連接部從上述第3供應源所供應上述氮流量的第3閥。 The temperature control device of claim 7, wherein the second connection portion includes: a third connection portion connected to a third supply source storing liquid nitrogen and supplying nitrogen; and the second valve is a third valve for adjusting the flow rate of the nitrogen supplied from the third supply source via the third connection portion. 如請求項11之溫度調整裝置,其中,上述第2連接部係含有:連接於供應空氣之第4供應源的第4連接部;上述第2閥係含有:調整經由上述第4連接部從上述第4供應源所供應上述空氣流量的第4閥;上述第2供應部係具備有將:連接於上述第3閥的第1流路、與連接於上述第 4閥的第2流路予以合流之合流部;上述第2供應部係將由上述第3供應源所供應上述氮、由上述第4供應源所供應上述空氣、或上述空氣與上述氮的混合流體,當作上述第2流體並供應。 The temperature control device of claim 11, wherein the second connection portion includes: a fourth connection portion connected to a fourth supply source for supplying air; the second valve includes: a fourth valve for adjusting the flow rate of the air supplied from the fourth supply source via the fourth connection portion; the second supply portion includes: a confluence portion for confluence of the first flow path connected to the third valve and the second flow path connected to the fourth valve; the second supply portion treats the nitrogen supplied by the third supply source, the air supplied by the fourth supply source, or a mixed fluid of the air and the nitrogen as the second fluid and supplies the same. 如請求項7之溫度調整裝置,其中,上述溫度調整部係含有加熱上述第2流體的加熱部。 As in claim 7, the temperature adjustment device, wherein the temperature adjustment section includes a heating section for heating the second fluid. 一種電子元件測試裝置,係測試DUT的電子元件測試裝置,具備有:插座,其係具內部空間;以及溫度調整裝置,其係請求項1至13中任一項之溫度調整裝置;其中,上述溫度調整裝置係朝上述插座的上述內部空間供應流體。 An electronic component testing device is an electronic component testing device for testing a DUT, comprising: a socket having an internal space; and a temperature adjustment device, which is a temperature adjustment device of any one of claim items 1 to 13; wherein the temperature adjustment device supplies fluid to the internal space of the socket. 如請求項14之電子元件測試裝置,其中,上述插座係具備有:接觸元件,其係電氣式連接於上述DUT端子;以及殼體,其係保持上述接觸元件;其中,上述內部空間係設置於上述殼體中;上述接觸元件係露出於上述內部空間內。 As in claim 14, the electronic component testing device, wherein the socket comprises: a contact element electrically connected to the DUT terminal; and a housing that holds the contact element; wherein the internal space is disposed in the housing; and the contact element is exposed in the internal space.
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