TWI851415B - Curable composition, cured layer, color filter and display device - Google Patents
Curable composition, cured layer, color filter and display device Download PDFInfo
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Abstract
Description
本揭露是關於一種可固化組成物、使用所述組成物製造的固化層、包含固化層的彩色濾光片以及包含彩色濾光片的顯示裝置。 The present disclosure relates to a curable composition, a curable layer made using the composition, a color filter including the curable layer, and a display device including the color filter.
在一般量子點的情況下,歸因於具有疏水性的表面特性,其中分散有所述量子點的溶劑受到限制。因此,難以引入至諸如黏合劑或可固化單體的極性系統中。 In the case of general quantum dots, the solvent in which the quantum dots are dispersed is limited due to the hydrophobic surface characteristics. Therefore, it is difficult to introduce into polar systems such as adhesives or curable monomers.
舉例而言,即使在積極研究量子點油墨組成物的情況下,極性在初始步驟中亦相對較低且其可分散於具有高疏水性的可固化組成物中所使用的溶劑中。因此,因為量子點按組成物的總量計為20重量%或大於20重量%,所以無法在某一水準上提高油墨的光效率。儘管另外添加量子點且按次序分散量子點以提高光效率,但黏度已超出能夠噴墨的範圍,且可能不滿足可加工性。 For example, even in the case of actively studying quantum dot ink compositions, polarity is relatively low in the initial step and it can be dispersed in a solvent used in a curable composition having high hydrophobicity. Therefore, because the quantum dots are 20 wt% or more based on the total amount of the composition, the light efficiency of the ink cannot be improved to a certain level. Although quantum dots are additionally added and dispersed in order to improve light efficiency, the viscosity is beyond the range that can be jetted and processability may not be satisfied.
為了達成能夠噴墨的黏度範圍,亦提供一種藉由溶解按組成物的總量計為50重量%或大於50重量%的溶劑來降低油墨固體含量的方法,所述方法就黏度而言提供略微令人滿意的結果。然 而,其就黏度而言可視為令人滿意的結果,但由於噴墨期間的溶劑揮發而引起的噴嘴乾燥、噴嘴堵塞、噴墨之後隨時間推移的單一膜的厚度減小可能變得更糟糕,且在固化後難以控制厚度偏差。因此,難以將其應用於實際製程。 In order to achieve a viscosity range capable of ink jetting, a method of reducing the solid content of ink by dissolving a solvent of 50 wt% or more based on the total amount of the composition is also provided, which provides slightly satisfactory results in terms of viscosity. However, although it can be regarded as a satisfactory result in terms of viscosity, nozzle drying, nozzle clogging, and reduction in thickness of a single film over time after ink jetting due to solvent volatilization during ink jetting may become worse, and it is difficult to control thickness deviation after curing. Therefore, it is difficult to apply it to an actual process.
因此,不包含溶劑的非溶劑型量子點油墨為應用於實際製程的最佳形式。將量子點本身應用於溶劑型組成物的目前技術現在在一定程度上受到限制。 Therefore, solvent-free quantum dot inks that do not contain solvents are the best form for application in actual processes. Current technology for applying quantum dots themselves to solvent-based compositions is now limited to a certain extent.
在無溶劑可固化組成物(量子點油墨組成物)的情況下,由於包含過量的可聚合化合物,因此可造成因揮發性引起的噴嘴乾燥所致的堵塞及噴射故障及由於在圖案化分區壁像素中噴射的油墨組成物的揮發而導致的單層膜厚度減小。因此,已從不同角度做出改良無溶劑可固化組成物的光學特性的努力。為了改良無溶劑可固化組成物的光學特性,通常使用增加無機材料的含量的方法,但存在無機材料愈多,反射率愈高的問題。換言之,由於無溶劑可固化組成物的光學特性的改良與反射率降低問題存在權衡關係,因此對能夠同時改良前述兩種特性(光學特性改良及反射率降低)的技術的需求逐漸增長。 In the case of solvent-free curable compositions (quantum dot ink compositions), since an excessive amount of polymerizable compounds is contained, blockage and ejection failure due to nozzle drying caused by volatility and a reduction in the thickness of a single layer film due to the volatility of the ink composition ejected in the patterned partition wall pixels may occur. Therefore, efforts have been made from various angles to improve the optical properties of solvent-free curable compositions. In order to improve the optical properties of solvent-free curable compositions, a method of increasing the content of inorganic materials is generally used, but there is a problem that the more inorganic materials there are, the higher the reflectivity. In other words, since there is a trade-off between the improvement of the optical properties of solvent-free curable compositions and the problem of reducing the reflectivity, there is a growing demand for a technology that can simultaneously improve the aforementioned two properties (improvement of optical properties and reduction of reflectivity).
實施例提供一種能夠同時改良光學特性且降低反射率的可固化組成物。 The embodiment provides a curable composition capable of simultaneously improving optical properties and reducing reflectivity.
另一實施例提供使用可固化組成物製造的固化層。 Another embodiment provides a cured layer made using a curable composition.
另一實施例提供一種包含固化層的彩色濾光片。 Another embodiment provides a color filter including a cured layer.
另一實施例提供一種包含彩色濾光片的顯示裝置。 Another embodiment provides a display device including a color filter.
實施例提供一種可固化組成物,所述可固化組成物包含:(A)量子點;及(B)可聚合化合物,包含由化學式1表示的化合物。 The embodiment provides a curable composition, the curable composition comprising: (A) quantum dots; and (B) a polymerizable compound, comprising a compound represented by Chemical Formula 1.
在化學式1中,L1為含有硫原子的二價連接基團,但不包含二硫鍵(*-S-S-*)鍵聯結構,L2及L3各自獨立地為單鍵、經取代或未經取代的C1至C20伸烷基,或經取代或未經取代的C3至C20環伸烷基,且R1及R2各自獨立地為氫原子、經取代或未經取代的C1至C20烷基、經取代或未經取代的C3至C20環烷基,或經取代或未經取代的C6至C20芳基。 In Formula 1, L1 is a divalent linking group containing a sulfur atom, but does not contain a disulfide bond (*-SS-*) bonding structure, L2 and L3 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, or a substituted or unsubstituted C3 to C20 cycloalkylene group, and R1 and R2 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group.
L1可由化學式化學式L-1至化學式L-4中的任一者表示。 L1 can be represented by any one of Chemical Formula L-1 to Chemical Formula L-4.
在化學式L-1至化學式L-4中,L4至L8各自獨立地為單鍵或經取代或未經取代的C1至C20伸烷基。 In Formulae L-1 to L-4, L4 to L8 are each independently a single bond or a substituted or unsubstituted C1 to C20 alkylene group.
由化學式1表示的化合物可具有大於1.455的折射率。 The compound represented by Chemical Formula 1 may have a refractive index greater than 1.455.
由化學式1表示的化合物可由化學式1-1至化學式1-3中的任一者表示。 The compound represented by Chemical Formula 1 may be represented by any one of Chemical Formula 1-1 to Chemical Formula 1-3.
可聚合化合物可更包含結構與由化學式1表示的化合物的結構不同的化合物。 The polymerizable compound may further include a compound having a structure different from that of the compound represented by Chemical Formula 1.
結構與由化學式1表示的化合物的結構不同的化合物可由化學式2表示。 A compound having a structure different from that of the compound represented by Chemical Formula 1 can be represented by Chemical Formula 2.
在化學式2中,L9為經取代或未經取代的C1至C10伸烷基、經取代或未經取代的C3至C20環伸烷基或酮基(*-O-*),L10及L11各自獨立地為單鍵或經取代或未經取代的C1至C10伸烷基,且R3及R4各自獨立地為氫原子、經取代或未經取代的C1至C20烷基、經取代或未經取代的C3至C20環烷基,或經取代或未經取代的C6至C20芳基。 In Chemical Formula 2, L9 is a substituted or unsubstituted C1 to C10 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, or a keto group (*-O-*), L10 and L11 are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group, and R3 and R4 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group.
由化學式2表示的化合物可具有小於或等於1.455的折射率。 The compound represented by Chemical Formula 2 may have a refractive index less than or equal to 1.455.
可按1:9至9:1的重量比包含由化學式1表示的化合物及結構與由化學式1表示的化合物的結構不同的化合物。 The compound represented by Chemical Formula 1 and a compound having a structure different from that of the compound represented by Chemical Formula 1 may be included in a weight ratio of 1:9 to 9:1.
可固化組成物可為無溶劑可固化組成物。 The curable composition may be a solvent-free curable composition.
按無溶劑可固化組成物的總量計,無溶劑可固化組成物可包含5重量%至60重量%的量子點及40重量%至95重量%的可聚合化合物。 Based on the total amount of the solvent-free curable composition, the solvent-free curable composition may contain 5 wt% to 60 wt% of quantum dots and 40 wt% to 95 wt% of polymerizable compounds.
可固化組成物可更包含聚合起始劑、光漫射劑、聚合抑制劑或其組合。 The curable composition may further include a polymerization initiator, a light diffuser, a polymerization inhibitor or a combination thereof.
光漫射劑可包含硫酸鋇、碳酸鈣、二氧化鈦、氧化鋯或其組合。 The light diffuser may include barium sulfate, calcium carbonate, titanium dioxide, zirconium oxide, or a combination thereof.
可固化組成物可更包含溶劑。 The curable composition may further comprise a solvent.
按可固化組成物的總重量計,可固化組成物可包含1重量%至40重量%的量子點、1重量%至20重量%的可聚合化合物以及40重量%至80重量%的溶劑。 The curable composition may include 1 wt % to 40 wt % of quantum dots, 1 wt % to 20 wt % of polymerizable compounds, and 40 wt % to 80 wt % of solvents, based on the total weight of the curable composition.
可固化組成物可更包含丙二酸、3-胺基1,2-丙二醇、矽烷類偶合劑、氟類界面活性劑或其組合。 The curable composition may further include malonic acid, 3-amino 1,2-propylene glycol, a silane coupling agent, a fluorine-based surfactant or a combination thereof.
另一實施例提供使用可固化組成物製造的固化層。 Another embodiment provides a cured layer made using a curable composition.
固化層可具有50%至55%的漫反射率。 The cured layer can have a diffuse reflectivity of 50% to 55%.
另一實施例提供一種包含固化層的彩色濾光片。 Another embodiment provides a color filter including a cured layer.
另一實施例提供一種包含彩色濾光片的顯示裝置。 Another embodiment provides a display device including a color filter.
本發明的其他實施例包含於以下實施方式中。 Other embodiments of the present invention are included in the following embodiments.
含硫二(甲基)丙烯酸酯化合物包含於含量子點的可固化組成物中,且由此可改良含量子點的可固化組成物的光學特性,且可同時減小反射率。 The sulfur-containing di(meth)acrylate compound is contained in the curable composition containing quantum dots, and thereby the optical properties of the curable composition containing quantum dots can be improved and the reflectivity can be reduced at the same time.
在下文中詳細地描述本發明的實施例。然而,此等實施例 為例示性的,本發明不限於此且本發明由申請專利範圍的範疇限定。 The embodiments of the present invention are described in detail below. However, these embodiments are illustrative, the present invention is not limited thereto and the present invention is limited by the scope of the patent application.
在本說明書中,當不另外提供特定定義時,「烷基」指C1至C20烷基,「烯基」指C2至C20烯基,「環烯基」指C3至C20環烯基,「雜環烯基」指C3至C20雜環烯基,「芳基」指C6至C20芳基,「芳烷基」指C6至C20芳烷基,「伸烷基」指C1至C20伸烷基,「伸芳基」指C6至C20伸芳基,「烷基伸芳基」指C6至C20烷基伸芳基,「伸雜芳基」指C3至C20伸雜芳基,且「伸烷氧基」指C1至C20伸烷氧基。 In this specification, when no specific definition is otherwise provided, "alkyl" refers to C1 to C20 alkyl, "alkenyl" refers to C2 to C20 alkenyl, "cycloalkenyl" refers to C3 to C20 cycloalkenyl, "heterocycloalkenyl" refers to C3 to C20 heterocycloalkenyl, "aryl" refers to C6 to C20 aryl, "aralkyl" refers to C6 to C20 aralkyl, "alkylene" refers to C1 to C20 alkylene, "arylene" refers to C6 to C20 arylene, "alkylarylene" refers to C6 to C20 alkylarylene, "heteroarylene" refers to C3 to C20 heteroarylene, and "alkoxylene" refers to C1 to C20 alkoxylene.
在本說明書中,當不另外提供特定定義時,「取代」指藉由由以下各者中選出的取代基的至少一個氫原子的替換:鹵素原子(F、Cl、Br或I)、羥基、C1至C20烷氧基、硝基、氰基、胺基、亞胺基基團、疊氮基、甲脒基基團、肼基基團、亞肼基基團、羰基、胺甲醯基基團、硫醇基、酯基、酮基、羧基或其鹽、磺酸基團或其鹽、磷酸或其鹽、C1至C20烷基、C2至C20烯基、C2至C20炔基、C6至C20芳基、C3至C20環烷基、C3至C20環烯基、C3至C20環炔基、C2至C20雜環烷基、C2至C20雜環烯基、C2至C20雜環炔基、C3至C20雜芳基或其組合。 In the present specification, when a specific definition is not otherwise provided, "substituted" refers to the replacement of at least one hydrogen atom by a substituent selected from the following: a halogen atom (F, Cl, Br or I), a hydroxyl group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, an azido group, a formamido group, a hydrazine group, a hydrazone group, a carbonyl group, a carbamoyl group, a thiol group, an ester group, a keto group , carboxyl or its salt, sulfonic acid group or its salt, phosphoric acid or its salt, C1 to C20 alkyl, C2 to C20 alkenyl, C2 to C20 alkynyl, C6 to C20 aryl, C3 to C20 cycloalkyl, C3 to C20 cycloalkenyl, C3 to C20 cycloalkynyl, C2 to C20 heterocycloalkyl, C2 to C20 heterocycloalkenyl, C2 to C20 heterocycloalkynyl, C3 to C20 heteroaryl or a combination thereof.
在本說明書中,當不另外提供特定定義時,「雜(hetero)」指在化學式中包含至少一個N、O、S以及P的雜原子。 In this specification, when no specific definition is provided, "hetero" refers to a hetero atom containing at least one N, O, S and P in the chemical formula.
在本說明書中,當不另外提供特定定義時,「(甲基)丙烯酸酯」指「丙烯酸酯」及「甲基丙烯酸脂」兩者,且「(甲基)丙烯酸」指「丙烯酸」及「甲基丙烯酸」。 In this specification, when no specific definition is otherwise provided, "(meth)acrylate" refers to both "acrylate" and "methacrylate", and "(meth)acrylic acid" refers to both "acrylic acid" and "methacrylic acid".
在本說明書中,當不另外提供特定定義時,術語「組合」 指混合或共聚。 In this specification, when no specific definition is otherwise provided, the term "combination" refers to mixing or copolymerization.
在本說明書中,當不另外提供定義時,當在化學式中在應給出的位置處未繪製化學鍵時,在所述位置處鍵結氫。 In this specification, when no definition is otherwise provided, when a chemical bond is not drawn at a position where it should be given in a chemical formula, a hydrogen bond is formed at the position.
另外,在本說明書中,當不另外提供定義時,「*」是指與相同或不同原子或化學式的連接點。 In addition, in this specification, when no additional definition is provided, "*" refers to the connection point with the same or different atoms or chemical formulas.
在下文中,詳細描述根據實施例的構成可固化組成物的各組分。 Hereinafter, each component constituting the curable composition according to the embodiment is described in detail.
可聚合化合物 Polymerizable compounds
根據實施例的含量子點的可固化組成物包含具有高折射率的含硫二(甲基)丙烯酸酯化合物作為可聚合化合物,使得含硫二(甲基)丙烯酸酯化合物的高折射特性可引起可固化組成物的光學特性的改良,且此外,當可固化組成物熱固化時,誘發硫醇烯加成反應以促進可固化組成物的固化層的表面固化,由此同時滿足反射率降低效果。 The quantum dot-containing curable composition according to the embodiment contains a sulfur-containing di(meth)acrylate compound having a high refractive index as a polymerizable compound, so that the high refractive property of the sulfur-containing di(meth)acrylate compound can cause the improvement of the optical properties of the curable composition, and further, when the curable composition is thermally cured, a thiol-ene addition reaction is induced to promote the surface curing of the cured layer of the curable composition, thereby simultaneously satisfying the reflectivity reduction effect.
含硫二(甲基)丙烯酸酯化合物可由化學式1表示。 The sulfur-containing di(meth)acrylate compound can be represented by Chemical Formula 1.
在化學式1中,L1為含有硫原子的二價連接基團,但不包含二硫鍵(*-S-S-*)鍵聯結構,L2及L3各自獨立地為單鍵、經取代或未經取代的C1至C20伸烷基,或經取代或未經取代的C3至C20環伸烷基,且 R1及R2各自獨立地為氫原子、經取代或未經取代的C1至C20烷基、經取代或未經取代的C3至C20環烷基,或經取代或未經取代的C6至C20芳基。 In Formula 1, L1 is a divalent linking group containing a sulfur atom, but does not contain a disulfide bond (*-SS-*) bonding structure, L2 and L3 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, or a substituted or unsubstituted C3 to C20 cycloalkylene group, and R1 and R2 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group.
含綠色量子點的可固化組成物具有相對較低的吸收率(絕對值)及光效率(EQE),以及近似高達含紅色量子點的可固化組成物的兩倍的反射率。因此,改良面板中綠色量子點像素的亮度存在尚未解決的技術性挑戰,但減少外部光的反射需要進一步改良其正面的亮度。 Curable compositions containing green quantum dots have relatively low absorptivity (absolute value) and light efficiency (EQE), and reflectivity that is approximately twice as high as that of curable compositions containing red quantum dots. Therefore, there are unresolved technical challenges to improving the brightness of green quantum dot pixels in panels, but reducing the reflection of external light requires further improvements in the brightness of the front side.
本發明人已清楚地識別到以上問題,且進行了長時間的相關研究以改良含綠色量子點的可固化組成物的光學特性但降低其反射率,經由數百次試驗及錯誤且最終藉由應用由化學式1表示的化合物作為可聚合化合物成功地解決了所述技術性挑戰。 The inventors have clearly recognized the above problems and have conducted relevant research for a long time to improve the optical properties of the curable composition containing green quantum dots while reducing its reflectivity. After hundreds of trials and errors, they finally successfully solved the technical challenges by applying the compound represented by Chemical Formula 1 as a polymerizable compound.
一般而言,為了改良含綠色量子點的可固化組成物的光學特性,主要使用增加無機材料的含量的方法,但相反,為了降低含綠色量子點的可固化組成物的反射率,使用減少無機材料的含量的方法,其中光學特性改良與反射率降低彼此相對,亦即存在權衡關係,此可使得難以同時達成兩種特性。 Generally speaking, in order to improve the optical properties of a curable composition containing green quantum dots, the method of increasing the content of inorganic materials is mainly used, but in contrast, in order to reduce the reflectivity of a curable composition containing green quantum dots, the method of reducing the content of inorganic materials is used, wherein the improvement of optical properties and the reduction of reflectivity are relative to each other, that is, there is a trade-off relationship, which can make it difficult to achieve both properties at the same time.
根據實施例,將作為可聚合化合物的由化學式1表示的含硫二(甲基)丙烯酸酯化合物應用於可固化組成物,從而同時在除含紅色量子點的可固化組成物以外的含綠色量子點的可固化組成物中實現光學特性改良且降低反射效果。 According to the embodiment, a sulfur-containing di(meth)acrylate compound represented by Chemical Formula 1 as a polymerizable compound is applied to a curable composition, thereby achieving optical property improvement and reflection reduction effects in a curable composition containing green quantum dots in addition to a curable composition containing red quantum dots.
特定言之,歸因於由化學式1表示的化合物的高折射率,可實現光學特性改良。舉例而言,由化學式1表示的化合物可具有大於1.455的折射率,例如大於1.455且小於或等於1.7,其中 由於由化學式1表示的化合物具有在所述範圍內的高折射率,因此可極大地改良包含此化合物作為可聚合化合物的含量子點的可固化組成物的光學特性。 Specifically, due to the high refractive index of the compound represented by Chemical Formula 1, optical properties can be improved. For example, the compound represented by Chemical Formula 1 may have a refractive index greater than 1.455, for example, greater than 1.455 and less than or equal to 1.7, wherein Since the compound represented by Chemical Formula 1 has a high refractive index within the range, the optical properties of the curable composition containing the compound as a content quantum dot of the polymerizable compound can be greatly improved.
此外,由於用作可聚合化合物的由化學式1表示的化合物在實施例的可固化組成物的熱固化期間熱分解以暴露硫醇基,且此硫醇基易於與(甲基)丙烯酸酯基團的碳碳雙鍵誘導硫醇烯反應(參考以下反應方案),且因此促進經熱固化單一膜的表面固化,最終顯著地降低固化層的反射率,尤其是漫反射率,因此可獲得反射率降低。舉例而言,固化層的漫反射率可降低至小於或等於55%,例如50%至55%。 In addition, since the compound represented by Chemical Formula 1 used as a polymerizable compound is thermally decomposed during the thermal curing of the curable composition of the embodiment to expose a thiol group, and this thiol group is easy to induce a thiol-ene reaction with the carbon-carbon double bond of the (meth)acrylate group (refer to the following reaction scheme), and thus promotes the surface curing of the thermally cured single film, ultimately significantly reducing the reflectivity of the cured layer, especially the diffuse reflectivity, so that the reflectivity reduction can be obtained. For example, the diffuse reflectivity of the cured layer can be reduced to less than or equal to 55%, such as 50% to 55%.
在化學式1中,當L1包含二硫鍵(*-S-S-*)連接結構,或L2或L3包含伸芳基作為連接基團時,所述化合物可具有較低折射率及在光學特性方面的缺點,且另外,硫醇烯反應並未順利地發生,從而使反射率降低效果降低至一半。 In Chemical Formula 1, when L1 includes a disulfide bond (*-SS-*) linking structure, or L2 or L3 includes an aryl group as a linking group, the compound may have a lower refractive index and disadvantages in optical properties, and in addition, the thiol-ene reaction does not occur smoothly, thereby reducing the reflectivity reducing effect to half.
舉例而言,L1可由化學式L-1至化學式L-4中的任一者表示。 For example, L1 can be represented by any one of Chemical Formula L-1 to Chemical Formula L-4.
[化學式L-2]
在化學式L-1至化學式L-4中,L4至L8各自獨立地為單鍵或經取代或未經取代的C1至C20伸烷基。 In Formulae L-1 to L-4, L4 to L8 are each independently a single bond or a substituted or unsubstituted C1 to C20 alkylene group.
當化學式1的L1連接基團具有以上結構時,同時實現改良根據實施例的可固化組成物的光學特性及降低其反射率(漫反射率)的效果可為極其有利的。 When the L1 linking group of Chemical Formula 1 has the above structure, it may be extremely advantageous to simultaneously achieve the effects of improving the optical properties of the curable composition according to the embodiment and reducing its reflectivity (diffuse reflectivity).
舉例而言,由化學式1表示的化合物可由化學式1-1至化學式1-3中的任一者表示,但未必限於此。 For example, the compound represented by Chemical Formula 1 can be represented by any one of Chemical Formula 1-1 to Chemical Formula 1-3, but is not necessarily limited thereto.
舉例而言,可聚合化合物可更包含結構與由化學式1表示的化合物的結構不同的化合物。亦即,可聚合化合物可包含由化學式1表示的化合物及具有不同結構的另一化合物。 For example, the polymerizable compound may further include a compound having a structure different from that of the compound represented by Chemical Formula 1. That is, the polymerizable compound may include the compound represented by Chemical Formula 1 and another compound having a different structure.
舉例而言,結構與由化學式1表示的化合物的結構不同的化合物可由化學式2表示。 For example, a compound having a structure different from that of the compound represented by Chemical Formula 1 can be represented by Chemical Formula 2.
在化學式2中,L9為經取代或未經取代的C1至C10伸烷基、經取代或未經取代的C3至C20環伸烷基或酮基(*-O-*),L10及L11各自獨立地為單鍵或經取代或未經取代的C1至C10伸烷基,且R3及R4各自獨立地為氫原子、經取代或未經取代的C1至C20烷基、經取代或未經取代的C3至C20環烷基,或經取代或未經取代的C6至C20芳基。 In Chemical Formula 2, L9 is a substituted or unsubstituted C1 to C10 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, or a keto group (*-O-*), L10 and L11 are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group, and R3 and R4 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group.
即使根據實施例的可固化組成物更包含由化學式2表示的化合物以及具有高折射率的由化學式1表示化合物作為可聚合化合物,亦可同時達成改良可固化組成物的光學特性及降低反射 率的效果,如在單獨使用由化學式1表示的化合物的情況下。 Even if the curable composition according to the embodiment further comprises the compound represented by Chemical Formula 2 and the compound represented by Chemical Formula 1 having a high refractive index as polymerizable compounds, the effects of improving the optical properties of the curable composition and reducing the reflectivity can be achieved at the same time, as in the case of using the compound represented by Chemical Formula 1 alone.
舉例而言,由化學式2表示的化合物可具有小於或等於1.455的折射率。當由化學式2表示的化合物具有大於1.455的折射率時,其有利於改良光學特性,但就降低反射率而言可為不利的。 For example, the compound represented by Chemical Formula 2 may have a refractive index less than or equal to 1.455. When the compound represented by Chemical Formula 2 has a refractive index greater than 1.455, it is advantageous in improving optical properties, but may be disadvantageous in terms of reducing reflectivity.
舉例而言,由化學式1表示的化合物及結構與由化學式1表示的化合物的結構不同的化合物(例如,由化學式2表示的化合物等)具有1:9至9:1的重量比,例如5:5至9:1的重量比。 For example, the compound represented by Chemical Formula 1 and a compound having a structure different from that of the compound represented by Chemical Formula 1 (e.g., a compound represented by Chemical Formula 2, etc.) have a weight ratio of 1:9 to 9:1, such as a weight ratio of 5:5 to 9:1.
舉例而言,可以比結構與由化學式1表示的化合物的結構不同的化合物(例如,由化學式2表示的化合物等)更高的量包含由化學式1表示的化合物。 For example, the compound represented by Chemical Formula 1 may be contained in a higher amount than a compound having a structure different from that of the compound represented by Chemical Formula 1 (e.g., a compound represented by Chemical Formula 2, etc.).
舉例而言,可以6:4至9:1的重量比包含由化學式1表示的化合物及結構與由化學式1表示的化合物的結構不同的化合物(例如,由化學式2表示的化合物等)。 For example, the compound represented by Chemical Formula 1 and a compound having a structure different from that of the compound represented by Chemical Formula 1 (for example, a compound represented by Chemical Formula 2, etc.) may be included in a weight ratio of 6:4 to 9:1.
當以比結構與由化學式1表示的化合物的結構不同的化合物(例如,由化學式2表示的化合物等)更高的量包含由化學式1表示的化合物時,例如以6:4至9:1的重量比,根據實施例的可固化組成物的固化速率增加,且可最大化改良光學特性及降低反射率的兩個效果的同時改良。 When the compound represented by Chemical Formula 1 is contained in a higher amount than a compound having a structure different from that of the compound represented by Chemical Formula 1 (e.g., a compound represented by Chemical Formula 2, etc.), for example, at a weight ratio of 6:4 to 9:1, the curing rate of the curable composition according to the embodiment increases, and the simultaneous improvement of the two effects of improving optical characteristics and reducing reflectivity can be maximized.
舉例而言,由化學式2表示的化合物可由化學式2-1或化學式2-2表示,但未必限於此。 For example, the compound represented by Chemical Formula 2 can be represented by Chemical Formula 2-1 or Chemical Formula 2-2, but is not necessarily limited thereto.
[化學式2-1]
舉例而言,除由化學式2-1及化學式2-2表示的化合物以外,結構與由化學式1表示的化合物的結構不同的化合物可更包含:乙二醇二丙烯酸酯、三乙二醇二丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、新戊二醇二丙烯酸酯、新戊四醇二丙烯酸酯、新戊四醇三丙烯酸酯、二新戊四醇二丙烯酸酯、二新戊四醇三丙烯酸酯、二新戊四醇五丙烯酸酯、新戊四醇六丙烯酸酯、雙酚A二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、酚醛環氧丙烯酸酯、乙二醇二甲基丙烯酸酯、三乙二醇二甲基丙烯酸酯、丙二醇二甲基丙烯酸酯、1,4-丁二醇二甲基丙烯酸酯、1,6-己二醇二甲基丙烯酸酯或其組合。 For example, in addition to the compounds represented by Chemical Formula 2-1 and Chemical Formula 2-2, the compound having a structure different from that of the compound represented by Chemical Formula 1 may further include: ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trihydroxymethylpropane triacrylate, novolac epoxy acrylate, ethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanediol dimethacrylate, or a combination thereof.
除可聚合化合物以外,可進一步使用通常用於習知熱固性或光可固化組成物中的單體,且例如,單體可更包含氧雜環丁烷類化合物,諸如雙[1-乙基(3-氧雜環丁烷基)]甲酮。 In addition to the polymerizable compound, a monomer commonly used in a known thermosetting or photocurable composition may be further used, and for example, the monomer may further include an oxacyclobutane compound such as bis[1-ethyl(3-oxacyclobutane)]methanone.
按無溶劑可固化組成物的總量計,可以40重量%至95重量%,例如50重量%至90重量%的量包含可聚合化合物。當可聚合化合物包含於所述範圍內時,可製備具有具有能夠噴墨的黏度的無溶劑可固化組成物,且所製備的無溶劑可固化組成物中的量 子點可具有改良的分散性,藉此改良光學特性。 The polymerizable compound may be included in an amount of 40 wt % to 95 wt %, for example, 50 wt % to 90 wt %, based on the total amount of the solvent-free curable composition. When the polymerizable compound is included in the range, a solvent-free curable composition having a viscosity capable of inkjetting may be prepared, and the quantum dots in the prepared solvent-free curable composition may have improved dispersibility, thereby improving optical properties.
舉例而言,可聚合化合物可具有170公克/莫耳至1,000公克/莫耳的分子量。當可聚合化合物具有在所述範圍內的分子量時,其可有利於噴墨,因為其在不妨礙量子點的光學特性的情況下不會增加組成物的黏度。 For example, the polymerizable compound may have a molecular weight of 170 g/mol to 1,000 g/mol. When the polymerizable compound has a molecular weight within the range, it may be advantageous for inkjetting because it does not increase the viscosity of the composition without interfering with the optical properties of the quantum dots.
另外,當可固化組成物包含溶劑時,按可固化組成物的總量計,可以1重量%至20重量%、1重量%至15重量%,例如5重量%至15重量%的量包含可聚合化合物。當可聚合化合物包含於以上範圍內時,可改良量子點的光學特性。 In addition, when the curable composition includes a solvent, the polymerizable compound may be included in an amount of 1 wt % to 20 wt %, 1 wt % to 15 wt %, for example, 5 wt % to 15 wt %, based on the total amount of the curable composition. When the polymerizable compound is included in the above range, the optical properties of the quantum dots may be improved.
量子點 Quantum dots
舉例而言,量子點可在500奈米至680奈米下具有最大螢光發射波長。 For example, quantum dots can have a maximum fluorescence emission wavelength between 500 nm and 680 nm.
舉例而言,當根據實施例的可固化組成物為無溶劑可固化組成物時,可以5重量%至60重量%,例如10重量%至60重量%,例如20重量%至60重量%,例如30重量%至50重量%的量包含量子點。當量子點包含於以上範圍內時,即使在固化之後亦可達成高光保留及光效率。 For example, when the curable composition according to the embodiment is a solvent-free curable composition, the quantum dots may be included in an amount of 5 wt % to 60 wt %, such as 10 wt % to 60 wt %, such as 20 wt % to 60 wt %, such as 30 wt % to 50 wt %. When the quantum dots are included in the above range, high light retention and light efficiency can be achieved even after curing.
舉例而言,當根據實施例的可固化組成物為含有溶劑的可固化組成物時,按可固化組成物的總量計,可以1重量%至40重量%,例如3重量%至30重量%包含量子點。當量子點包含於以上範圍內時,改良光轉換率且不減弱圖案特性及顯影特性,使得可獲得極佳可加工性。 For example, when the curable composition according to the embodiment is a curable composition containing a solvent, the quantum dots may be included in an amount of 1 wt% to 40 wt%, for example, 3 wt% to 30 wt%, based on the total amount of the curable composition. When the quantum dots are included in the above range, the light conversion efficiency is improved without weakening the pattern characteristics and the development characteristics, so that excellent processability can be obtained.
舉例而言,量子點吸收在360奈米至780奈米,例如400奈米至780奈米光的波長區內的光,且發射在500奈米至700奈 米,例如500奈米至580奈米的波長區內的螢光,或發射在600奈米至680奈米的波長區內的螢光。亦即,量子點可在500奈米至680奈米下具有最大螢光發射波長(λem)。 For example, the quantum dot absorbs light in the wavelength region of 360 nm to 780 nm, such as 400 nm to 780 nm, and emits fluorescence in the wavelength region of 500 nm to 700 nm, such as 500 nm to 580 nm, or emits fluorescence in the wavelength region of 600 nm to 680 nm. That is, the quantum dot may have a maximum fluorescence emission wavelength (λ em ) at 500 nm to 680 nm.
量子點可各自獨立地具有20奈米至100奈米,例如20奈米至50奈米的半高全寬(full width at halfmaximum;FWHM)。當量子點具有所述範圍的半高全寬(FWHM)時,在由於高色彩純度而在彩色濾光片中用作彩色材料時增加色彩再現性。 The quantum dots may each independently have a full width at half maximum (FWHM) of 20 nm to 100 nm, for example, 20 nm to 50 nm. When the quantum dots have a full width at half maximum (FWHM) in the range, the color reproducibility is increased when used as a color material in a color filter due to high color purity.
量子點可各自獨立地為有機材料或無機材料,或有機材料與無機材料的混成物(混合物)。 Quantum dots can be independently organic materials or inorganic materials, or a mixture of organic and inorganic materials.
量子點可各自獨立地由核及圍繞核的殼組成,且核及殼可各自獨立地具有由第II族至第IV族、第III族至第V族以及類似者組成的核、核/殼、核/第一殼/第二殼、合金、合金/殼或類似者的結構,但不限於此。 The quantum dots may each independently consist of a core and a shell surrounding the core, and the core and the shell may each independently have a core, core/shell, core/first shell/second shell, alloy, alloy/shell or similar structure consisting of Group II to Group IV, Group III to Group V and the like, but are not limited thereto.
舉例而言,核可包含至少由以下中選出的至少一種材料:CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、HgS、HgSe、HgTe、GaN、GaP、GaAs、InP、InAs以及其合金,但未必限於此。圍繞核的殼可包含至少由以下中選出的至少一種材料:CdSe、ZnSe、ZnS、ZnTe、CdTe、PbS、TiO、SrSe、HgSe以及其合金,但未必限於此。 For example, the core may include at least one material selected from the following: CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, and alloys thereof, but not necessarily limited thereto. The shell surrounding the core may include at least one material selected from the following: CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe, and alloys thereof, but not necessarily limited thereto.
在實施例中,由於近來在全世界範圍內對環境的關注已大大增加且亦已強化對毒性材料的限制,因此使用具有略低量子效率(量子產率)但環境友好的非鎘類發光材料(InP/ZnS、InP/ZeSe/ZnS等),而非具有鎘類核的發光材料,但未必限於此。 In the embodiment, since the concern for the environment has greatly increased worldwide recently and the restrictions on toxic materials have also been strengthened, non-cadmium-based luminescent materials (InP/ZnS, InP/ZeSe/ZnS, etc.) with slightly lower quantum efficiency (quantum yield) but environmentally friendly are used instead of luminescent materials with cadmium-based cores, but not necessarily limited thereto.
在核/殼結構的量子點的情況下,包含殼的整體大小(平均粒徑)可為1奈米至15奈米,例如5奈米至15奈米。 In the case of core/shell structured quantum dots, the overall size (average particle size) including the shell may be 1 nm to 15 nm, for example 5 nm to 15 nm.
舉例而言,量子點可各自獨立地包含紅色量子點、綠色量子點或其組合。紅色量子點各自獨立地具有10奈米至15奈米的平均粒徑。綠色量子點可各自獨立地具有5奈米至8奈米的平均粒徑。 For example, the quantum dots may each independently include red quantum dots, green quantum dots, or a combination thereof. The red quantum dots each independently have an average particle size of 10 nm to 15 nm. The green quantum dots may each independently have an average particle size of 5 nm to 8 nm.
另一方面,對於量子點的分散穩定性,根據實施例的可固化組成物可更包含分散劑。分散劑有助於諸如可固化組成物中的量子點的光轉化材料的均勻分散性,且可包含非離子型、陰離子型或陽離子型分散劑。特定言之,分散劑可為聚伸烷二醇或其酯、聚氧伸烷基、多元醇酯環氧烷加成產物、乙醇環氧烷加成產物、磺酸酯、磺酸鹽、羧酸酯、羧酸鹽、烷基醯胺環氧烷加成產物、烷基胺以及類似者,且其可單獨使用或以兩種或大於兩種的混合物形式使用。相對於諸如量子點的光轉換材料的固體含量,可以0.1重量%至100重量%,例如10重量%至20重量%的量使用分散劑。 On the other hand, for the dispersion stability of quantum dots, the curable composition according to the embodiment may further include a dispersant. The dispersant contributes to the uniform dispersion of the photoconversion material such as the quantum dots in the curable composition, and may include a non-ionic, anionic or cationic dispersant. Specifically, the dispersant may be polyalkylene glycol or its ester, polyoxyalkylene glycol, polyol ester epoxide addition product, ethanol epoxide addition product, sulfonate, sulfonate salt, carboxylate, carboxylate salt, alkylamide epoxide addition product, alkylamine and the like, and it may be used alone or in the form of a mixture of two or more. The dispersant may be used in an amount of 0.1 wt % to 100 wt %, for example 10 wt % to 20 wt %, relative to the solid content of the light conversion material such as quantum dots.
舉例而言,量子點可為經具有極性基團的配位體表面改質的量子點,例如與可聚合化合物具有高親和力的配位體。在如上文所描述的表面改質的量子點的情況下,非常容易製備高濃度或高度濃縮的量子點分散液(改良量子點相對於可聚合化合物的分散性),其可對改良光效率具有巨大影響,且特定言之對實施無溶劑可固化組成物可為有利的。 For example, the quantum dots may be quantum dots that have been surface-modified with a ligand having a polar group, such as a ligand having a high affinity for the polymerizable compound. In the case of surface-modified quantum dots as described above, it is very easy to prepare a high concentration or highly concentrated dispersion of quantum dots (improving the dispersibility of the quantum dots relative to the polymerizable compound), which can have a huge impact on improving light efficiency and in particular can be advantageous for implementing solvent-free curable compositions.
舉例而言,具有極性基團的配位體可具有與可聚合化合物的化學結構具有高親和力的結構。 For example, a ligand having a polar group may have a structure that has a high affinity for the chemical structure of the polymerizable compound.
舉例而言,具有極性基團的配位體可由化學式A至化學式Q中的任一者表示,但未必限於此。 For example, a ligand having a polar group can be represented by any one of Chemical Formula A to Chemical Formula Q, but is not necessarily limited thereto.
[化學式A]
在化學式D中,m1為0至10的整數。 In the chemical formula D, m1 is an integer from 0 to 10.
[化學式H]
當使用配位體時,量子點的表面改質可變得更容易,且當將用配位體表面改質的量子點添加至前述可聚合化合物且接著攪拌時,可獲得極透明的分散液,此證實極充分地進行量子點的表面改質。 When a ligand is used, the surface modification of quantum dots can become easier, and when the quantum dots surface-modified with the ligand are added to the aforementioned polymerizable compound and then stirred, an extremely transparent dispersion can be obtained, which confirms that the surface modification of the quantum dots is extremely sufficiently performed.
光漫射劑 Light diffuser
根據實施例的可固化組成物可更包含光漫射劑。 The curable composition according to the embodiment may further include a light diffuser.
舉例而言,光漫射劑可包含硫酸鋇(BaSO4)、碳酸鈣(CaCO3)、二氧化鈦(TiO2)、氧化鋯(ZrO2)或其組合。 For example, the light diffuser may include barium sulfate (BaSO 4 ), calcium carbonate (CaCO 3 ), titanium dioxide (TiO 2 ), zirconium oxide (ZrO 2 ), or a combination thereof.
光漫射劑可反射前述量子點中未經吸收的光且允許量子點再次吸收反射光。亦即,光漫射劑可增加由量子點吸收的光量,且提高可固化組成物的光轉化效率。 The light diffuser can reflect the light that is not absorbed by the quantum dots and allow the quantum dots to absorb the reflected light again. That is, the light diffuser can increase the amount of light absorbed by the quantum dots and improve the light conversion efficiency of the curable composition.
光漫射劑可具有150奈米至250奈米,且特定言之180奈米至230奈米的平均粒徑(D50)。當光漫射劑的平均粒徑在所述範圍內時,其可具有較佳光漫射效應且提高光轉化效率。 The light diffuser may have an average particle size (D 50 ) of 150 nm to 250 nm, and specifically 180 nm to 230 nm. When the average particle size of the light diffuser is within the range, it may have a better light diffusion effect and improve light conversion efficiency.
按可固化組成物的總量計,可以1重量%至20重量%,例如2重量%至15重量%,例如3重量%至10重量%的量包含光漫射劑。按可固化組成物的總量計,當包含小於1重量%的光漫射劑時,難以預期藉由使用光漫射劑來改良光轉化效率的效果,且當含有大於20重量%的光漫射劑時,可出現量子點沈澱問題。 The light diffuser may be included in an amount of 1 wt% to 20 wt%, such as 2 wt% to 15 wt%, such as 3 wt% to 10 wt%, based on the total amount of the curable composition. When less than 1 wt% of the light diffuser is included in the total amount of the curable composition, it is difficult to expect the effect of improving the light conversion efficiency by using the light diffuser, and when more than 20 wt% of the light diffuser is included, quantum dot precipitation problems may occur.
聚合起始劑 Polymerization initiator
根據實施例的可固化組成物可更包含聚合起始劑,例如光聚合起始劑、熱聚合起始劑或其組合。 The curable composition according to the embodiment may further include a polymerization initiator, such as a photopolymerization initiator, a thermal polymerization initiator or a combination thereof.
光聚合起始劑可為用於感光性樹脂組成物的常用起始劑,例如苯乙酮類化合物、二苯甲酮類化合物、噻噸酮類化合物、安息香類化合物、三嗪類化合物、肟類化合物、胺基酮類化合物以及類似者,但未必限於此。 The photopolymerization initiator may be a commonly used initiator for photosensitive resin compositions, such as acetophenone compounds, benzophenone compounds, thiophenone compounds, benzoin compounds, triazine compounds, oxime compounds, aminoketone compounds and the like, but is not necessarily limited thereto.
苯乙酮類化合物的實例可為2,2'-二乙氧基苯乙酮、2,2'-二丁氧基苯乙酮、2-羥基-2-甲基苯丙酮、對三級丁基三氯苯乙酮、 對三級丁基二氯苯乙酮、4-氯苯乙酮、2,2'-二氯-4-苯氧基苯乙酮、2-甲基-1-(4-(甲硫基)苯基)-2-嗎啉基丙-1-酮、2-苯甲基-2-二甲胺基-1-(4-嗎啉基苯基)丁-1-酮以及類似者。 Examples of acetophenone compounds include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, tert-butyltrichloroacetophenone, tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, and the like.
二苯甲酮類化合物的實例可為二苯甲酮、苯甲酸苯甲酯、苯甲醯基苯甲酸甲酯、4-苯基二苯甲酮、羥基二苯甲酮、丙烯酸化二苯甲酮、4,4'-雙(二甲胺基)二苯甲酮、4,4'-雙(二乙胺基)二苯甲酮、4,4'-二甲胺基二苯甲酮、4,4'-二氯二苯甲酮、3,3'-二甲基-2-甲氧基二苯甲酮以及類似者。 Examples of benzophenone compounds include benzophenone, benzyl benzoate, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.
噻噸酮類化合物的實例可為噻噸酮、2-甲基噻噸酮、異丙基噻噸酮、2,4-二乙基噻噸酮、2,4-二異丙基噻噸酮、2-氯噻噸酮以及類似者。 Examples of thiothione compounds include thiothione, 2-methylthiothione, isopropylthiothione, 2,4-diethylthiothione, 2,4-diisopropylthiothione, 2-chlorothiothione and the like.
安息香類化合物的實例可為安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香異丁醚、苯甲基二甲基縮酮以及類似者。 Examples of benzoin compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal and the like.
三嗪類化合物的實例可為2,4,6-三氯均三嗪、2-苯基-4,6-雙(三氯甲基)均三嗪、2-(3',4'-二甲氧基苯乙烯基)-4,6-雙(三氯甲基)均三嗪、2-(4'-甲氧基萘基)-4,6-雙(三氯甲基)均三嗪、2-(對甲氧基苯基)-4,6-雙(三氯甲基)均三嗪、2-(對甲苯基)-4,6-雙(三氯甲基)均三嗪、2-聯苯-4,6-雙(三氯甲基)均三嗪、雙(三氯甲基)-6-苯乙烯基均三嗪、2-(萘酚-基)-4,6-雙(三氯甲基)均三嗪、2-(4-甲氧基萘酚-基)-4,6-雙(三氯甲基)均三嗪、2-4-雙(三氯甲基)-6-胡椒基均三嗪、2-4-雙(三氯甲基)-6-(4-甲氧基苯乙烯基)均三嗪以及類似者。 Examples of triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-phenylvinyl-s-triazine, 2-(naphthol-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthol-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxyphenylvinyl)-s-triazine and the like.
肟類化合物的實例可為O-醯基肟類化合物、2-(O-苯甲醯基肟)-1-[4-(苯硫基)苯基]-1,2-辛二酮、1-(O-乙醯基肟)-1-[9-乙基- 6-(2-甲基苯甲醯基)9H-咔唑-3-基]乙酮、O-乙氧基羰基-α-氧胺基-1-苯基丙-1-酮以及類似者。O-醯基肟類化合物的特定實例可為1,2-辛二酮、2-二甲胺基-2-(4-甲基苯甲基)-1-(4-嗎啉-4-基-苯基)-丁-1-酮、1-(4-苯硫基苯基)-丁烷-1,2-二酮-2-肟-O-苯甲酸酯、1-(4-苯硫基苯基)-辛烷-1,2-二酮-2-肟-O-苯甲酸酯、1-(4-苯硫基苯基)-辛-1-酮肟-O-乙酸酯、1-(4-苯硫基苯基)-丁-1-酮肟-O-乙酸酯以及類似者。 Examples of oxime compounds include O-acyl oxime compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime)-1-[9-ethyl- 6-(2-methylbenzoyl)9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, and the like. Specific examples of O-acyl oxime compounds may be 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-pyrrol-4-yl-phenyl)-butan-1-one, 1-(4-phenylthiophenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylthiophenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylthiophenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylthiophenyl)-octan-1-one oxime-O-acetate, 1-(4-phenylthiophenyl)-butan-1-one oxime-O-acetate and the like.
胺基酮類化合物的實例可為2-苯甲基-2-二甲胺基-1-(4-嗎啉基苯基)丁酮-1及類似者。 Examples of aminoketone compounds include 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butanone-1 and the like.
除所述化合物以外,光聚合起始劑可更包含咔唑類化合物、二酮類化合物、硼酸鋶類化合物、重氮類化合物、咪唑類化合物、聯咪唑類化合物以及類似者。 In addition to the above compounds, the photopolymerization initiator may further include carbazole compounds, diketone compounds, cobalt borate compounds, diazo compounds, imidazole compounds, biimidazole compounds and the like.
光聚合起始劑可與能夠藉由吸收光且變成激發態且接著傳遞其能量而引起化學反應的光敏劑一起使用。 The photopolymerization initiator can be used together with a photosensitizer that can cause a chemical reaction by absorbing light and becoming excited and then transferring its energy.
光敏劑的實例可為四乙二醇雙-3-巰基丙酸酯、新戊四醇四-3-巰基丙酸酯、二新戊四醇四-3-巰基丙酸酯以及類似者。 Examples of photosensitizers may include tetraethylene glycol di-3-butyl propionate, pentaerythritol tetra-3-butyl propionate, dipentaerythritol tetra-3-butyl propionate, and the like.
熱聚合起始劑的實例可為過氧化物,具體而言,過氧化苯甲醯、過氧化二苯甲醯、過氧化月桂醯、過氧化二月桂醯、過氧化二三級丁基(di-tert-butyl peroxide)、過氧化環己烷、過氧化甲基乙基酮、過氧化氫(例如三級丁基過氧化氫、異丙苯過氧化氫)、過氧化二碳酸二環己酯、2,2-偶氮-雙(異丁腈)、過苯甲酸三級丁酯以及類似者,例如2,2'-偶氮雙-2-甲基丙腈,但未必限於此,且可使用所屬領域中熟知的過氧化物中的任一者。 Examples of thermal polymerization initiators may be peroxides, specifically, benzoyl peroxide, dibenzoyl peroxide, lauryl peroxide, dilauryl peroxide, di-tert-butyl peroxide, cyclohexane peroxide, methyl ethyl ketone peroxide, hydrogen peroxide (e.g., tert-butyl hydrogen peroxide, isopropylbenzene hydrogen peroxide), dicyclohexyl peroxydicarbonate, 2,2-azo-bis(isobutyronitrile), tert-butyl perbenzoate, and the like, such as 2,2'-azobis-2-methylpropionitrile, but are not necessarily limited thereto, and any peroxide known in the art may be used.
按可固化組成物的總量計,可以0.1重量%至5重量%, 例如1重量%至4重量%的量包含聚合起始劑。當聚合起始劑包含於所述範圍內時,有可能由於在曝光或熱固化期間充分固化而獲得極佳可靠性,且有可能防止由於非反應起始劑而導致的透射率劣化,藉此防止量子點的光學特性劣化。 The polymerization initiator may be included in an amount of 0.1 wt% to 5 wt%, for example, 1 wt% to 4 wt%, based on the total amount of the curable composition. When the polymerization initiator is included in the range, it is possible to obtain excellent reliability due to sufficient curing during exposure or heat curing, and it is possible to prevent the transmittance from being degraded due to the non-reactive initiator, thereby preventing the optical properties of the quantum dots from being degraded.
黏合劑樹脂 Adhesive resin
根據實施例的可固化組成物可更包含黏合劑樹脂。 The curable composition according to the embodiment may further include a binder resin.
黏合劑樹脂可包含丙烯醯類樹脂、卡哆類樹脂、環氧樹脂或其組合。 The adhesive resin may include an acrylic resin, a cardo resin, an epoxy resin or a combination thereof.
丙烯醯類樹脂可為第一烯系不飽和單體及與其可共聚的第二烯系不飽和單體的共聚物,且可為包含至少一個丙烯醯類重複單元的樹脂。 The acrylic resin may be a copolymer of a first olefinic unsaturated monomer and a second olefinic unsaturated monomer copolymerizable therewith, and may be a resin containing at least one acrylic repeating unit.
丙烯醯類黏合劑樹脂的特定實例可為聚苯甲基甲基丙烯酸酯、(甲基)丙烯酸/甲基丙烯酸苯甲酯共聚物、(甲基)丙烯酸/甲基丙烯酸苯甲酯/苯乙烯共聚物、(甲基)丙烯酸/甲基丙烯酸苯甲酯/甲基丙烯酸2-羥乙酯共聚物、(甲基)丙烯酸/甲基丙烯酸苯甲酯/苯乙烯/甲基丙烯酸2-羥乙酯共聚物以及類似者,但不限於此,且可單獨使用或以兩種或大於兩種的混合物形式使用。 Specific examples of acrylic adhesive resins may be polybenzyl methacrylate, (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/benzyl methacrylate/2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer, and the like, but are not limited thereto, and may be used alone or in the form of a mixture of two or more.
丙烯醯類黏合劑樹脂的重量平均分子量可為5,000公克/莫耳至15,000公克/莫耳。當丙烯醯類黏合劑樹脂具有在所述範圍內的重量平均分子量時,改良與基底的緊密接觸性質、物理性質以及化學性質,且黏度適當。 The weight average molecular weight of the acrylic adhesive resin may be 5,000 g/mol to 15,000 g/mol. When the acrylic adhesive resin has a weight average molecular weight within the range, the close contact property with the substrate, the physical property and the chemical property are improved, and the viscosity is appropriate.
丙烯醯類樹脂的酸值可為80毫克氫氧化鉀/公克至130毫克氫氧化鉀/公克。當丙烯醯類樹脂具有在所述範圍內的酸值時,可獲得像素的極佳解析度。 The acid value of the acrylic resin may be 80 mg potassium hydroxide/g to 130 mg potassium hydroxide/g. When the acrylic resin has an acid value within the range, an excellent resolution of pixels may be obtained.
卡哆類樹脂可用於習知可固化樹脂(或感光性樹脂)組成物中,且可例如如韓國專利特許公開申請案第10-2018-0067243號中所揭露的使用,但不限於此。 Cardoline resins can be used in known curable resin (or photosensitive resin) compositions, and can be used, for example, as disclosed in Korean Patent Publication No. 10-2018-0067243, but are not limited thereto.
可例如藉由將以下化合物中的至少兩者混合來製備卡哆類樹脂:含芴化合物,諸如9,9-雙(4-環氧乙烷基甲氧基苯基)芴;酐化合物,諸如苯四甲酸二酐、萘四甲酸二酐、聯苯四甲酸二酐、二苯甲酮四甲酸二酐、均苯四酸二酐、環丁烷四甲酸二酐、苝四甲酸二酐、四氫呋喃四甲酸二酐以及四氫鄰苯二甲酸酐;二醇化合物,諸如乙二醇、丙二醇以及聚乙二醇;醇化合物,諸如甲醇、乙醇、丙醇、正丁醇、環己醇以及苯甲醇;溶劑類化合物,諸如丙二醇甲基乙基乙酸酯及N-甲基吡咯啶酮;含磷化合物,諸如三苯膦;以及胺或銨鹽化合物,諸如氯化四甲銨、溴化四乙銨、苯甲基二乙胺、三乙胺、三丁胺或氯化苯甲基三乙銨。 The cardo-based resin can be prepared, for example, by mixing at least two of the following compounds: a fluorene-containing compound such as 9,9-bis(4-oxiranylmethoxyphenyl)fluorene; an anhydride compound such as benzenetetracarboxylic dianhydride, naphthalenetetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, benzophenonetetracarboxylic dianhydride, pyromellitic dianhydride, cyclobutanetetracarboxylic dianhydride, perylenetetracarboxylic dianhydride, tetrahydrofurantetracarboxylic dianhydride, and tetrahydrophthalic anhydride; Alcohol compounds, such as ethylene glycol, propylene glycol and polyethylene glycol; alcohol compounds, such as methanol, ethanol, propanol, n-butanol, cyclohexanol and benzyl alcohol; solvent compounds, such as propylene glycol methyl ethyl acetate and N-methylpyrrolidone; phosphorus-containing compounds, such as triphenylphosphine; and amine or ammonium salt compounds, such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine or benzyltriethylammonium chloride.
卡哆類黏合劑樹脂的重量平均分子量可為500公克/莫耳至50,000公克/莫耳,例如1,000公克/莫耳至30,000公克/莫耳。當卡哆類黏合劑樹脂的重量平均分子量在所述範圍內時,可在固化層的生產期間無殘餘物的情況下及在可固化組成物的顯影期間不損耗膜厚度的情況下形成令人滿意的圖案。 The weight average molecular weight of the cardo-based binder resin may be 500 g/mol to 50,000 g/mol, for example, 1,000 g/mol to 30,000 g/mol. When the weight average molecular weight of the cardo-based binder resin is within the range, a satisfactory pattern may be formed without residue during the production of the cured layer and without loss of film thickness during the development of the curable composition.
當黏合劑樹脂為卡哆類樹脂時,改良包含黏合劑樹脂的可固化組成物,特定言之感光性樹脂組成物的顯影性,且在光固化期間的敏感性為良好的,以便改良精細圖案形成性質。 When the binder resin is a cardo resin, the developing property of the curable composition containing the binder resin, in particular the photosensitive resin composition, is improved, and the sensitivity during photocuring is good, so as to improve the fine pattern forming property.
環氧樹脂可為可熱聚合單體或寡聚物,且可包含具有碳-碳不飽和鍵及碳-碳環鍵的化合物。 Epoxy resins may be thermally polymerizable monomers or oligomers and may include compounds having carbon-carbon unsaturated bonds and carbon-carbon ring bonds.
環氧樹脂可包含但不限於雙酚A環氧樹脂、雙酚F環氧 樹脂、苯酚酚醛環氧樹脂、環脂族環氧樹脂以及脂族聚縮水甘油醚,但未必限於此。 Epoxy resins may include, but are not limited to, bisphenol A epoxy resins, bisphenol F epoxy resins, phenol novolac epoxy resins, cycloaliphatic epoxy resins, and aliphatic polyglycidyl ethers, but are not necessarily limited thereto.
由於所述化合物的可商購產品可為:雙苯基環氧樹脂,諸如優卡殼牌環氧樹脂株式會社(Yuka Shell Epoxy Co.)的YX4000、YX4000H、YL6121H、YL6640或YL6677;甲酚酚醛環氧樹脂,諸如日本化藥株式會社(Nippon Kayaku Co.,Ltd.)的EOCN-102、EOCN-103S、EOCN-104S、EOCN-1020、EOCN-1025以及EOCN-1027,及優卡殼牌環氧樹脂株式會社的EPIKOTE 180S75及類似者;雙酚A環氧樹脂,諸如優卡殼牌環氧樹脂株式會社的EPIKOTE 1001、EPIKOTE 1002、EPIKOTE 1003、EPIKOTE 1004、EPIKOTE 1007、EPIKOTE 1009、EPIKOTE 1010以及EPIKOTE 828;雙酚F環氧樹脂,諸如優卡殼牌環氧樹脂株式會社的EPIKOTE 807及EPIKOTE 834;苯酚酚醛環氧樹脂,諸如優卡殼牌環氧樹脂株式會社的EPIKOTE 152、EPIKOTE 154以及EPIKOTE 157H65,及日本化藥株式會社的EPPN 201、EPPN 202,及日本化藥株式會社的EPPN 201、EPPN 202;環脂族環氧樹脂,諸如汽巴-嘉基集團公司(CIBA-GEIGY A.G)的CY175、CY177以及CY179、美國聯合碳化物公司(U.C.C)的ERL-4234、ERL-4299、ERL-4221以及ERL-4206、昭和電工株式會社(Showa Denko K.K.)的Shodyne 509、汽巴-嘉基集團公司的Araldite CY-182、大日本油墨化學工業株式會社(Dainippon Ink & Chemicals,Inc.)的CY-192及CY-184、優卡殼牌環氧樹脂株式會社的EPICLON 200及EPICLON 400、EPIKOTE 871、EPIKOTE 872以及塞拉尼斯塗層公司(Celanese Coatings Corporation)的EP1032H60、ED-5661以及ED-5662,因 此脂族聚縮水甘油醚可為優卡殼牌環氧樹脂株式會社的EPIKOTE 190P及EPIKOTE 191P、共榮社侑士株式會社(Kyoesha Yushi Co.,Ltd.)的Epolite 100MF、日本侑士株式會社(Nippon Yushi Co.,Ltd.)的Epiol TMP以及類似者。 Since the commercially available products of the compound may be: diphenyl epoxy resins, such as YX4000, YX4000H, YL6121H, YL6640 or YL6677 of Yuka Shell Epoxy Co.; cresol novolac epoxy resins, such as EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025 and EOCN-1027 of Nippon Kayaku Co., Ltd., and EPIKOTE 180S75 and similar; bisphenol A epoxies such as EPIKOTE 1001, EPIKOTE 1002, EPIKOTE 1003, EPIKOTE 1004, EPIKOTE 1007, EPIKOTE 1009, EPIKOTE 1010 and EPIKOTE 828 from Eukashell Epoxy Co., Ltd.; bisphenol F epoxies such as EPIKOTE 807 and EPIKOTE 834 from Eukashell Epoxy Co., Ltd.; phenol novolac epoxies such as EPIKOTE 152, EPIKOTE 154 and EPIKOTE 157H65, and EPPN 201 and EPPN 202 of Nippon Kayaku Co., Ltd., and EPPN 201 and EPPN 202 of Nippon Kayaku Co., Ltd.; cycloaliphatic epoxy resins, such as CY175, CY177 and CY179 of CIBA-GEIGY AG, ERL-4234, ERL-4299, ERL-4221 and ERL-4206 of Union Carbide Corporation (U.C.C), Shodyne 509 of Showa Denko K.K., Araldite CY-182 of Ciba-Geigy, Dainippon Ink & Chemicals Co., Ltd. CY-192 and CY-184 of EPICLON Chemicals, Inc., EPICLON 200 and EPICLON 400, EPIKOTE 871, EPIKOTE 872 of Eukashell Epoxy Resin Co., Ltd., and EP1032H60, ED-5661 and ED-5662 of Celanese Coatings Corporation, so the aliphatic polyglycidyl ether can be EPIKOTE 190P and EPIKOTE 191P of Eukashell Epoxy Resin Co., Ltd., Epolite 100MF of Kyoesha Yushi Co., Ltd., Epiol TMP of Nippon Yushi Co., Ltd., and the like.
舉例而言,當根據實施例的可固化組成物為無溶劑可固化組成物時,按可固化組成物的總量計,可以0.5重量%至10重量%,例如1重量%至5重量%的量包含黏合劑樹脂。在此情況下,可改良無溶劑可固化組成物的耐熱性及耐化學性,且亦可改善組成物的儲存穩定性。 For example, when the curable composition according to the embodiment is a solvent-free curable composition, the binder resin may be included in an amount of 0.5 wt % to 10 wt %, for example, 1 wt % to 5 wt %, based on the total amount of the curable composition. In this case, the heat resistance and chemical resistance of the solvent-free curable composition may be improved, and the storage stability of the composition may also be improved.
舉例而言,當根據實施例的可固化組成物為包含溶劑的可固化組成物時,按可固化組成物的總量計,可以1重量%至30重量%,例如3重量%至20重量%的量包含黏合劑樹脂。在此情況下,可改良圖案特性、耐熱性以及耐化學性。 For example, when the curable composition according to the embodiment is a curable composition containing a solvent, the binder resin may be contained in an amount of 1 wt % to 30 wt %, for example, 3 wt % to 20 wt %, based on the total amount of the curable composition. In this case, pattern characteristics, heat resistance, and chemical resistance may be improved.
其他添加劑 Other additives
針對量子點的穩定性及分散改良,根據實施例的可固化組成物可更包含聚合抑制劑。 In order to improve the stability and dispersion of quantum dots, the curable composition according to the embodiment may further include a polymerization inhibitor.
聚合抑制劑可包含對苯二酚類化合物、兒茶酚類化合物或其組合,但未必限於此。當根據實施例的可固化組成物更包含對苯二酚類化合物、兒茶酚類化合物或其組合時,可防止在塗佈可固化組成物之後的曝光期間的室溫交聯。 The polymerization inhibitor may include a hydroquinone compound, a catechol compound, or a combination thereof, but is not necessarily limited thereto. When the curable composition according to the embodiment further includes a hydroquinone compound, a catechol compound, or a combination thereof, room temperature crosslinking during exposure after coating the curable composition can be prevented.
舉例而言,對苯二酚類化合物、兒茶酚類化合物或其組合可為對苯二酚、甲基對苯二酚、甲氧基對苯二酚、三級丁基對苯二酚、2,5-二三級丁基對苯二酚(2,5-di-t-butyl hydroquinone)、2,5-雙(1,1-二甲基丁基)對苯二酚、2,5-雙(1,1,3,3-四甲基丁基)對苯二 酚、兒茶酚、三級丁基兒茶酚、4-甲氧基苯酚、苯三酚、2,6-二三級丁基-4-甲苯酚(2,6-di-t-butyl-4-methylphenol)、2-萘酚、參(N-羥基-N-亞硝基苯胺基-O,O')鋁或其組合,但未必限於此。 For example, the hydroquinone compound, catechol compound or a combination thereof may be hydroquinone, methyl hydroquinone, methoxy hydroquinone, tert-butyl hydroquinone, 2,5-di-tert-butyl hydroquinone, 2,5-bis(1,1-dimethylbutyl) hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl) hydroquinone, catechol, tert-butyl catechol, 4-methoxyphenol, benzyltriol, 2,6-di-tert-butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosoanilino-O,O')aluminum or a combination thereof, but is not necessarily limited thereto.
對苯二酚類化合物、兒茶酚類化合物或其組合可以分散液的形式使用。按可固化組成物的總量計,可以0.001重量%至3重量%,例如0.01重量%至2重量%的量包含呈分散液形式的聚合抑制劑。當聚合抑制劑包含於所述範圍中時,可解決室溫下的時間推移,且同時可防止敏感性降低及表面分層現象。 The hydroquinone compound, the catechol compound or a combination thereof can be used in the form of a dispersion. The polymerization inhibitor in the form of a dispersion can be included in an amount of 0.001 wt % to 3 wt %, for example, 0.01 wt % to 2 wt %, based on the total amount of the curable composition. When the polymerization inhibitor is included in the range, the passage of time at room temperature can be solved, and at the same time, the reduction in sensitivity and the surface stratification phenomenon can be prevented.
另外,根據實施例的可固化組成物可更包含丙二酸、3-胺基-1,2-丙二醇、矽烷類偶合劑、調平劑、氟類界面活性劑或其組合,以便改良耐熱性及可靠度。 In addition, the curable composition according to the embodiment may further include malonic acid, 3-amino-1,2-propylene glycol, a silane coupling agent, a leveling agent, a fluorine-based surfactant or a combination thereof to improve heat resistance and reliability.
舉例而言,根據實施例的可固化組成物可更包含具有諸如乙烯基、羧基、甲基丙烯醯氧基、異氰酸酯基、環氧基以及類似者的反應性取代基的矽烷類偶合劑,以便改良與基底的緊密接觸性質。 For example, the curable composition according to the embodiment may further include a silane coupling agent having a reactive substituent such as a vinyl group, a carboxyl group, a methacryloyl group, an isocyanate group, an epoxy group, and the like, so as to improve the close contact property with the substrate.
矽烷類偶合劑的實例可為三甲氧基矽烷基苯甲酸、γ-甲基丙烯醯基丙氧基三甲氧基矽烷、乙烯基三乙醯氧基矽烷、乙烯基三甲氧基矽烷、γ-異氰酸酯丙基三乙氧基矽烷、γ-縮水甘油氧基丙基三甲氧基矽烷、β-環氧基環己基)乙基三甲氧基矽烷以及類似者,且此等矽烷類偶合劑可單獨使用或以兩種或多於兩種的混合物形式使用。 Examples of silane coupling agents include trimethoxysilylbenzoic acid, γ-methacryloylpropoxytrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanatepropyltriethoxysilane, γ-glycidyloxypropyltrimethoxysilane, β-((cyclohexyl)-epoxy)ethyltrimethoxysilane, and the like, and these silane coupling agents may be used alone or in the form of a mixture of two or more.
按100重量份的可固化組成物計,可以0.01重量份至10重量份的量使用矽烷類偶合劑。當矽烷基偶合劑包含於所述範圍內時,緊密接觸性質、儲存能力以及類似者得到改良。 The silane coupling agent may be used in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the curable composition. When the silane coupling agent is included within the range, close contact properties, storage capacity, and the like are improved.
另外,可固化組成物可視需要更包含界面活性劑,例如氟類界面活性劑,以便改良塗佈性質及抑制斑點產生,亦即,改良調平效能。 In addition, the curable composition may further contain a surfactant, such as a fluorine-based surfactant, as needed, in order to improve the coating properties and inhibit the generation of spots, that is, to improve the leveling performance.
氟類界面活性劑可具有4,000公克/莫耳至10,000公克/莫耳,且特定言之6,000公克/莫耳至10,000公克/莫耳的低重量平均分子量。另外,氟類界面活性劑可具有18毫牛/公尺至23毫牛/公尺的表面張力(按0.1%聚乙二醇單甲基醚乙酸酯(polyethylene glycol monomethylether acetate;PGMEA)溶液量測)。當氟類界面活性劑具有在所述範圍內的重量平均分子量及表面張力時,可進一步改良調平效能,且在應用作為高速塗佈的狹縫塗佈時,可提供極佳特性,此是因為可藉由在高速塗佈期間防止斑點產生且抑制蒸氣產生來較少地產生膜缺陷。 The fluorine-based surfactant may have a low weight average molecular weight of 4,000 g/mol to 10,000 g/mol, and specifically 6,000 g/mol to 10,000 g/mol. In addition, the fluorine-based surfactant may have a surface tension of 18 mN/m to 23 mN/m (measured as a 0.1% polyethylene glycol monomethylether acetate (PGMEA) solution). When the fluorine-based surfactant has a weight average molecular weight and surface tension within the range, the leveling performance can be further improved, and when applied to narrow gap coating for high-speed coating, excellent properties can be provided, because less film defects can be generated by preventing spot generation and suppressing vapor generation during high-speed coating.
氟類界面活性劑的實例可為BM-1000®及BM-1100®(BM化學公司(BM Chemie Inc.));馬佳菲斯(MEGAFACE)F 142D®、馬佳菲斯F 172®、馬佳菲斯F 173®以及馬佳菲斯F 183®(大日本油墨化學工業株式會社(Dainippon Ink Kagaku Kogyo Co.,Ltd.));福勒拉德(FULORAD)FC-135®、福勒拉德FC-170C®、福勒拉德FC-430®以及福勒拉德FC-431®(住友3M株式會社(Sumitomo 3M Co.,Ltd.));索龍(SURFLON)S-112®、索龍S-113®、索龍S-131®、索龍S-141®以及索龍S-145®(朝日玻璃株式會社(ASAHI Glass Co.,Ltd.));以及SH-28PA®、SH-190®、SH-193®、SZ-6032®以及SF-8428®以及類似者(東麗矽酮株式會社(Toray Silicone Co.,Ltd.));來自大日本油墨化學工業株式會社(DIC Co.,Ltd.)的F-482、F-484、F-478、F-554以及類似者。 Examples of fluorine-based surfactants include BM- 1000® and BM- 1100® (BM Chemie Inc.); MEGAFACE F 142D® , MEGAFACE F 172® , MEGAFACE F 173® , and MEGAFACE F 183® (Dainippon Ink Kagaku Kogyo Co., Ltd.); FULORAD FC- 135® , FULORAD FC- 170C® , FULORAD FC- 430® , and FULORAD FC- 431® (Sumitomo 3M Co., Ltd.); SURFLON S- 112® , SURFLON S-113®, and SURFLON S-135®. ® , Solon S-131 ® , Solon S-141 ® and Solon S-145 ® (ASAHI Glass Co., Ltd.); and SH-28PA ® , SH-190 ® , SH-193 ® , SZ-6032 ® and SF-8428 ® and the like (Toray Silicone Co., Ltd.); F-482, F-484, F-478, F-554 and the like from Dainippon Ink and Chemicals Co., Ltd. (DIC Co., Ltd.).
另外,除氟類界面活性劑以外,根據實施例的可固化組成物亦可包含矽酮類界面活性劑。矽酮類界面活性劑的特定實例可為東芝矽酮有限公司(Toshiba Silicone Co.,Ltd.)的TSF400、TSF401、TSF410、TSF4440以及類似者,但不限於此。 In addition, in addition to the fluorine-based surfactant, the curable composition according to the embodiment may also include a silicone-based surfactant. Specific examples of silicone-based surfactants may be TSF400, TSF401, TSF410, TSF4440 and the like from Toshiba Silicone Co., Ltd., but are not limited thereto.
按100重量份的可固化組成物計,可以0.01重量份至5重量份,例如0.1重量份至2重量份的量包含界面活性劑。當界面活性劑包含於所述範圍內時,在噴塗組成物中產生的異物較少。 The surfactant may be included in an amount of 0.01 to 5 parts by weight, for example, 0.1 to 2 parts by weight, based on 100 parts by weight of the curable composition. When the surfactant is included within the range, fewer foreign substances are generated in the spray composition.
另外,除非性質劣化,否則根據實施例的可固化組成物可更包含預定量的其他添加劑,諸如抗氧化劑、穩定劑以及類似者。 In addition, unless the properties are deteriorated, the curable composition according to the embodiment may further contain a predetermined amount of other additives, such as antioxidants, stabilizers, and the like.
溶劑 Solvent
同時,根據實施例的可固化組成物可更包含溶劑。 Meanwhile, the curable composition according to the embodiment may further contain a solvent.
溶劑可例如包含醇,諸如甲醇、乙醇以及類似者;二醇醚,諸如乙二醇甲醚、乙二醇乙醚、丙二醇甲醚以及類似者;乙酸2-乙氧基乙酯(cellosolve acetate),諸如乙酸2-甲氧乙酯(methyl cellosolve acetate)、乙酸2-乙氧乙酯(ethyl cellosolve acetate)、乙酸2-乙氧二乙酯(diethyl cellosolve acetate)以及類似者;卡必醇,諸如甲基乙基卡必醇、二乙基卡必醇、二乙二醇單甲基醚、二乙二醇單乙基醚、二乙二醇二甲基醚、二乙二醇甲基乙基醚、二乙二醇二乙基醚以及類似者;丙二醇烷基醚乙酸酯,諸如丙二醇單甲基醚乙酸酯、丙二醇丙基醚乙酸酯以及類似者;酮,諸如甲基乙基酮、環己酮、4-羥基-4-甲基-2-戊酮、甲基正丙基酮、甲基正丁基酮、甲基正戊基酮、2-庚酮以及類似者;飽和脂族單羧酸烷基酯,諸如乙酸乙酯、乙酸正丁酯、乙酸異丁酯以及類似者;乳酸酯,諸如乳酸甲酯、乳酸乙酯以及類似者;羥基乙酸烷基酯,諸如羥基乙 酸甲酯、羥基乙酸乙酯、羥基乙酸丁酯以及類似者;乙酸烷氧基烷基酯,諸如乙酸甲氧基甲酯、乙酸甲氧基乙酯、乙酸甲氧基丁酯、乙酸乙氧基甲酯、乙酸乙氧基乙酯以及類似者;3-羥基丙酸烷基酯,諸如3-羥基丙酸甲酯、3-羥基丙酸乙酯以及類似者;3-烷氧基丙酸烷基酯,諸如3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸乙酯、3-乙氧基丙酸甲酯以及類似者;2-羥基丙酸烷基酯,諸如2-羥基丙酸甲酯、2-羥基丙酸乙酯、2-羥基丙酸丙酯以及類似者;2-烷氧基丙酸烷基酯,諸如2-甲氧基丙酸甲酯、2-甲氧基丙酸乙酯、2-乙氧基丙酸乙酯、2-乙氧基丙酸甲酯以及類似者;2-羥基-2-甲基丙酸烷基酯,諸如2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲基丙酸乙酯以及類似者;2-烷氧基-2-甲基丙酸烷基酯,諸如2-甲氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基丙酸乙酯以及類似者;酯,諸如丙酸2-羥基乙酯、丙酸2-羥基-2-甲基乙酯、乙酸羥基乙酯、2-羥基-3-甲基丁酸甲酯以及類似者;或酮酸酯,諸如丙酮酸乙酯及類似者,且另外,可為N-甲基甲醯胺、N,N-二甲基甲醯胺、N-甲基甲醯苯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮、二甲亞碸、苯甲基乙醚、二己醚、乙醯基丙酮、異佛酮、己酸、辛酸、1-辛醇、1-壬醇、苯甲醇、乙酸苯甲酯、苯甲酸乙酯、草酸二乙酯、順丁烯二酸二乙酯、γ-丁內酯、碳酸乙烯酯、碳酸丙烯酯、乙酸2-苯氧基乙酯以及類似者,但不限於此。 The solvent may, for example, include alcohols such as methanol, ethanol, and the like; glycol ethers such as ethylene glycol methyl ether, ethylene glycol ethyl ether, propylene glycol methyl ether, and the like; 2-ethoxyethyl acetate (cellosolve acetate) such as 2-methyl acetate (methyl cellosolve acetate), 2-ethoxyethyl acetate (ethyl cellosolve acetate), 2-ethoxydiethyl acetate (diethyl cellosolve acetate), and the like. acetate) and the like; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether and the like; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate and the like; ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl n-propyl ketone, methyl n-butyl ketone, methyl n-amyl ketone, 2-heptanone and the like; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, isobutyl acetate and the like ; lactic acid esters such as methyl lactate, ethyl lactate and the like; alkyl hydroxyacetates such as methyl hydroxyacetate, ethyl hydroxyacetate, butyl hydroxyacetate and the like; alkoxyalkyl acetates such as methoxymethyl acetate, methoxyethyl acetate, methoxybutyl acetate, ethoxymethyl acetate, ethoxyethyl acetate and the like; alkyl 3-hydroxypropionates such as methyl 3-hydroxypropionate, ethyl 3-hydroxypropionate and the like; alkyl 3-alkoxypropionates such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate and the like; alkyl 2-hydroxypropionates such as methyl such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, propyl 2-hydroxypropionate and the like; alkyl 2-alkoxypropionates such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, methyl 2-ethoxypropionate and the like; alkyl 2-hydroxy-2-methylpropionates such as methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate and the like; alkyl 2-alkoxy-2-methylpropionates such as methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate and the like; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate; Esters, hydroxyethyl acetate, methyl 2-hydroxy-3-methylbutyrate and the like; or ketoesters such as ethyl pyruvate and the like, and in addition, may be N-methylformamide, N,N-dimethylformamide, N-methylformaniline, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethylsulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, hexanoic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, 2-phenoxyethyl acetate and the like, but are not limited thereto.
舉例而言,溶劑可理想地為二醇醚,諸如乙二醇單乙醚、乙烯二甘醇甲基乙醚以及類似者;乙二醇烷基醚乙酸酯,諸如乙酸2-乙氧乙酯及類似者;酯,諸如丙酸2-羥基乙酯及類似者;卡必醇,諸如二乙二醇單甲基醚及類似者;丙二醇烷基醚乙酸酯,諸如 丙二醇單甲基醚乙酸酯、丙二醇丙基醚乙酸酯以及類似者;醇,諸如乙醇及類似者,或其組合。 For example, the solvent may desirably be glycol ethers such as ethylene glycol monoethyl ether, ethylene diglycol methyl ethyl ether, and the like; ethylene glycol alkyl ether acetates such as 2-ethoxyethyl acetate and the like; esters such as 2-hydroxyethyl propionate and the like; carbitols such as diethylene glycol monomethyl ether and the like; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate, and the like; alcohols such as ethanol and the like, or combinations thereof.
舉例而言,溶劑可為極性溶劑包含丙二醇單甲基醚乙酸酯、二丙二醇甲基醚乙酸酯、乙醇、乙二醇二甲基醚、乙烯二甘醇甲基乙醚、二乙二醇二甲基醚、2-丁氧基乙醇、N-甲基吡咯啶、N-乙基吡咯啶、碳酸丙烯酯、γ-丁內酯或其組合。 For example, the solvent may be a polar solvent including propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, ethanol, ethylene glycol dimethyl ether, ethylene diglycol methyl ethyl ether, diethylene glycol dimethyl ether, 2-butoxyethanol, N-methylpyrrolidine, N-ethylpyrrolidine, propylene carbonate, γ-butyrolactone or a combination thereof.
按可固化組成物的總量計,可以40重量%至80重量%,例如45重量%至80重量%的量包含溶劑。當溶劑在所述範圍內時,溶劑型可固化組成物具有適當的黏度,且因此在經由旋轉塗佈及狹縫塗佈進行大面積塗佈時可具有極佳塗佈性質。 The solvent may be included in an amount of 40 wt % to 80 wt %, for example, 45 wt % to 80 wt %, based on the total amount of the curable composition. When the solvent is within the range, the solvent-type curable composition has an appropriate viscosity and thus can have excellent coating properties when coating a large area by spin coating and slit coating.
另一實施例提供一種使用可固化組成物製造的固化層,以及包含固化層的彩色濾光片及包含彩色濾光片的顯示裝置。此時,固化層可具有如上文所描述的50%至55%的漫反射率。 Another embodiment provides a cured layer made using a curable composition, a color filter including the cured layer, and a display device including the color filter. In this case, the cured layer may have a diffuse reflectivity of 50% to 55% as described above.
製造固化層的方法之一可包含使用噴墨噴塗方法在基底上塗佈前述可固化組成物及溶劑型可固化組成物以形成圖案(S1)且固化所述圖案(S2)。 One method of manufacturing a cured layer may include applying the aforementioned curable composition and the solvent-based curable composition on a substrate using an inkjet coating method to form a pattern (S1) and curing the pattern (S2).
(S1)形成圖案 (S1) Forming a pattern
可理想地用噴墨噴塗方法在基底上將可固化組成物塗佈至約0.5微米至約20微米。噴墨噴塗方法可藉由根據各噴嘴噴塗單一顏色且因此根據所需顏色數量而重複噴塗多次來形成圖案,但可經由各噴墨噴嘴藉由同時噴塗所需顏色數量以減少製程來形成圖案。 The curable composition can be applied to the substrate to a thickness of about 0.5 micrometers to about 20 micrometers using an inkjet coating method. The inkjet coating method can form a pattern by spraying a single color according to each nozzle and thus repeating the spraying multiple times according to the required number of colors, but can form a pattern by spraying the required number of colors simultaneously through each inkjet nozzle to reduce the process.
(S2)固化 (S2) Solidification
固化所獲得的圖案以獲得像素。在本文中,固化方法可為 熱固化製程或光固化製程。可在高於或等於約100℃下,理想地在約100℃至約300℃的範圍內,且更理想地在約160℃至約250℃的範圍內進行熱固化製程。光固化製程可包含輻射光化射線,諸如190奈米至450奈米,例如200奈米至500奈米的UV射線。藉由使用諸如具有低壓、高壓或超高壓的汞燈、金屬鹵化物燈、氬氣雷射器以及類似者的光源來進行輻射。亦可按需要使用X射線、電子束以及類似者。 The obtained pattern is cured to obtain pixels. In this article, the curing method may be a thermal curing process or a photocuring process. The thermal curing process may be performed at a temperature greater than or equal to about 100°C, desirably in the range of about 100°C to about 300°C, and more desirably in the range of about 160°C to about 250°C. The photocuring process may include irradiating actinic rays, such as UV rays of 190 nm to 450 nm, for example, 200 nm to 500 nm. Irradiation is performed by using a light source such as a mercury lamp, a metal halide lamp, an argon laser, and the like having low pressure, high pressure, or ultra-high pressure. X-rays, electron beams, and the like may also be used as needed.
製造固化層的另一方法可包含藉由如下微影方法使用前述可固化組成物製造固化層。 Another method of manufacturing a cured layer may include manufacturing a cured layer using the aforementioned curable composition by the following lithography method.
(1)塗佈及成膜 (1) Coating and film formation
使用旋轉塗佈或狹縫塗佈方法、滾塗法、網版印刷法、塗抹方法以及類似者來塗佈可固化的樹脂組成物以在進行預定預處理的基底上具有所要厚度,例如在約2微米至約10微米的範圍內的厚度。接著,在約70℃至約90℃的溫度下加熱經過塗佈的基底約1分鐘至約10分鐘,以移除溶劑且形成膜。 The curable resin composition is applied to a substrate subjected to a predetermined pretreatment to have a desired thickness, for example, a thickness in the range of about 2 micrometers to about 10 micrometers, using a spin coating or slit coating method, a roll coating method, a screen printing method, a coating method, and the like. Then, the coated substrate is heated at a temperature of about 70° C. to about 90° C. for about 1 minute to about 10 minutes to remove the solvent and form a film.
(2)曝光 (2) Exposure
在置放具有預定形狀的罩幕之後,藉由諸如190奈米至450奈米,例如200奈米至400奈米的UV射線的光化射線輻射所得膜,以形成所要圖案。藉由使用諸如具有低壓、高壓或超高壓的汞燈、金屬鹵化物燈、氬氣雷射器以及類似者的光源來進行輻射。亦可按需要使用X射線、電子束以及類似者。 After placing a mask having a predetermined shape, the resulting film is irradiated with actinic radiation such as UV radiation of 190 nm to 450 nm, for example, 200 nm to 400 nm, to form a desired pattern. Irradiation is performed by using a light source such as a mercury lamp, a metal halide lamp, an argon laser, and the like having low pressure, high pressure, or ultra-high pressure. X-rays, electron beams, and the like may also be used as needed.
當使用高壓汞燈時,曝光製程使用例如500毫焦/平方公分或小於500毫焦/平方公分的光劑量(利用365奈米的感測器)。然而,光劑量可依據可固化組成物的各組分的類別、其組合比率以 及乾膜厚度而變化。 When a high-pressure mercury lamp is used, the exposure process uses, for example, a photo dose of 500 mJ/cm2 or less (using a 365 nm sensor). However, the photo dose may vary depending on the types of components of the curable composition, their combination ratios, and the dry film thickness.
(3)顯影 (3) Imaging
在曝光製程之後,使用鹼性水溶液藉由溶解及移除除曝光部分外的不必要部分來使曝光膜顯影,從而形成影像圖案。換言之,當鹼性顯影溶液用於顯影時,溶解非曝光區且形成影像彩色濾光片圖案。 After the exposure process, an alkaline aqueous solution is used to develop the exposed film by dissolving and removing unnecessary parts except for the exposed parts, thereby forming an image pattern. In other words, when an alkaline developing solution is used for development, the non-exposed area is dissolved and an image color filter pattern is formed.
(4)後處理 (4) Post-processing
所顯影的影像圖案可再次加熱或藉由光化射線及類似者輻射以進行固化,以便實現就耐熱性、耐光性、緊密接觸性質、抗裂性、耐化學性、高強度、儲存穩定性以及類似者而言的極佳品質。 The developed image pattern can be cured again by heating or by irradiation with actinic rays and the like to achieve excellent qualities in terms of heat resistance, light resistance, close contact properties, crack resistance, chemical resistance, high strength, storage stability and the like.
在下文中,參考實例更詳細說明本發明。然而,此等實例在任何意義上均不解釋為限制本發明的範疇。 Hereinafter, the present invention will be described in more detail with reference to examples. However, these examples are not to be construed as limiting the scope of the present invention in any sense.
製備實例1 Preparation Example 1
將20公克2,2-硫代乙醇置放於燒瓶中且充分溶解於400毫升二氯甲烷中。向其中添加32.6公克丙烯醯氯,且接著在氮氣氛圍下攪拌。在0℃下以逐滴方式向其中注入36.4公克三甲胺持續1小時,且接著攪拌2小時,完成反應。向其中添加200毫升二氯甲烷及500毫升水以進行萃取,且在自其中分離二氯甲烷層之後,向其中添加稀鹽酸以重複萃取三次。向分離的二氯甲烷層中添加MgSO4,且接著攪拌5分鐘。在過濾之後,濃縮來自其中的濾液。所得產物經管柱層析且接著濃縮且真空乾燥,從而製備由化學式1-1表示的化合物(折射率:1.495)。 20 g of 2,2-thioethanol was placed in a flask and fully dissolved in 400 ml of dichloromethane. 32.6 g of acryloyl chloride was added thereto, and then stirred under a nitrogen atmosphere. 36.4 g of trimethylamine was injected thereto dropwise at 0°C for 1 hour, and then stirred for 2 hours to complete the reaction. 200 ml of dichloromethane and 500 ml of water were added thereto for extraction, and after separating the dichloromethane layer therefrom, dilute hydrochloric acid was added thereto to repeat the extraction three times. MgSO 4 was added to the separated dichloromethane layer, and then stirred for 5 minutes. After filtering, the filtrate therefrom was concentrated. The obtained product was subjected to column chromatography and then concentrated and vacuum dried, thereby preparing a compound represented by Chemical Formula 1-1 (refractive index: 1.495).
製備實例2 Preparation Example 2
將20公克3,6-二硫雜-1,8-辛二酸置放於燒瓶中且充分溶解於200毫升二氯甲烷及200毫升乙醇中。向其中添加21.8公克丙烯醯氯,且接著在氮氣氛圍下攪拌。在0℃下向其中逐滴注入24.4公克三甲胺持續1小時且攪拌2小時,完成反應。向其中添加200毫升二氯甲烷及500毫升水以進行萃取,且在自其中分離二氯甲烷層之後,向其中添加稀鹽酸以重複萃取三次。向分離的二氯甲烷層中添加MgSO4,且接著攪拌5分鐘。在過濾之後,濃縮來自其中的濾液。所得產物經管柱層析且接著濃縮且真空乾燥,從而製備由化學式1-2表示的化合物(折射率:1.529)。 20 g of 3,6-dithia-1,8-octanedioic acid was placed in a flask and fully dissolved in 200 ml of dichloromethane and 200 ml of ethanol. 21.8 g of acryloyl chloride was added thereto, and then stirred under a nitrogen atmosphere. 24.4 g of trimethylamine was dropwise injected thereto at 0°C for 1 hour and stirred for 2 hours to complete the reaction. 200 ml of dichloromethane and 500 ml of water were added thereto for extraction, and after separating the dichloromethane layer therefrom, dilute hydrochloric acid was added thereto to repeat the extraction three times. MgSO 4 was added to the separated dichloromethane layer, and then stirred for 5 minutes. After filtering, the filtrate therefrom was concentrated. The obtained product was subjected to column chromatography and then concentrated and vacuum dried, thereby preparing a compound represented by Chemical Formula 1-2 (refractive index: 1.529).
製備實例3 Preparation Example 3
將20公克1,4-二噻烷-2,5-二醇添加至300毫升乙醇及200毫升二氯甲烷中,且接著攪拌。向其中添加26公克丙烯醯氯,且接著在氮氣氛圍下攪拌。在0℃下向其中逐滴注入29.2公克三甲胺持續1小時且攪拌2小時,完成反應。向其中添加200毫升二氯甲烷及500毫升水以進行萃取,且在自其中分離二氯甲烷層 之後,向其中添加稀鹽酸以重複萃取三次。對分離的二氯甲烷層進行分離,且向其中添加MgSO4,且接著攪拌5分鐘。在過濾之後,濃縮來自其中的濾液。所得產物經管柱層析且接著濃縮且真空乾燥,從而製備由化學式1-3表示的化合物(折射率:1.680)。 20 g of 1,4-dithiane-2,5-diol was added to 300 ml of ethanol and 200 ml of dichloromethane, and then stirred. 26 g of acryloyl chloride was added thereto, and then stirred under a nitrogen atmosphere. 29.2 g of trimethylamine was injected dropwise thereto at 0°C for 1 hour and stirred for 2 hours to complete the reaction. 200 ml of dichloromethane and 500 ml of water were added thereto for extraction, and after separating the dichloromethane layer therefrom, dilute hydrochloric acid was added thereto to repeat the extraction three times. The separated dichloromethane layer was separated, and MgSO 4 was added thereto, and then stirred for 5 minutes. After filtering, the filtrate therefrom was concentrated. The obtained product was subjected to column chromatography and then concentrated and vacuum dried, thereby preparing a compound represented by Chemical Formula 1-3 (refractive index: 1.680).
製備實例4 Preparation Example 4
將100公克1,6-己二醇溶解於100毫升甲苯中,且向其中添加135公克丙烯酸及8.2公克甲磺酸,且接著在120℃下反應5小時,從而製備由化學式2-2表示的化合物(折射率:1.455)。 100 g of 1,6-hexanediol was dissolved in 100 ml of toluene, and 135 g of acrylic acid and 8.2 g of methanesulfonic acid were added thereto, and then reacted at 120°C for 5 hours, thereby preparing a compound represented by Chemical Formula 2-2 (refractive index: 1.455).
比較製備實例1 Comparative preparation example 1
將20公克雙(2-羥乙基)二硫化物充分溶解於300毫升乙醇及150毫升二氯甲烷中。向其中添加25.7公克丙烯醯氯,且接著攪拌10分鐘。向其中逐滴緩慢注入28.8公克三乙胺,且接著在0℃下攪拌5小時以完成反應,且向其中添加250毫升二氯甲烷及300毫升水以進行萃取。分離有機層,且另外用稀鹽酸水溶液萃取三次。自其中分離二氯甲烷層,添加MgSO4,且接著攪拌5分鐘。在過濾之後,濃縮來自其中的濾液。所得產物經管柱層析且接著濃 縮且真空乾燥,從而製備由化學式C-1表示的化合物(折射率:1.517)。 20 g of bis(2-hydroxyethyl)disulfide was fully dissolved in 300 ml of ethanol and 150 ml of dichloromethane. 25.7 g of acryloyl chloride was added thereto, and then stirred for 10 minutes. 28.8 g of triethylamine was slowly injected dropwise thereto, and then stirred at 0°C for 5 hours to complete the reaction, and 250 ml of dichloromethane and 300 ml of water were added thereto for extraction. The organic layer was separated, and extracted three times with a dilute hydrochloric acid aqueous solution. The dichloromethane layer was separated therefrom, MgSO 4 was added thereto, and then stirred for 5 minutes. After filtering, the filtrate therefrom was concentrated. The obtained product was subjected to column chromatography and then concentrated and vacuum dried, thereby preparing a compound represented by Chemical Formula C-1 (refractive index: 1.517).
比較製備實例2 Comparative preparation example 2
將20公克1,4-苯二硫醇充分溶解於200毫升二氯甲烷中。向其中添加22.5公克丙烯酸2-氯乙酯,且接著攪拌10分鐘,且在0℃下向其中逐滴緩慢注入17公克三乙胺,且接著攪拌12小時,完成反應。向其中添加300毫升二氯甲烷及300毫升水以進行萃取,且在分離有機層之後,向其中添加稀鹽酸溶液以重複萃取三次。自其中分離二氯甲烷層,且向其中添加MgSO4,且接著攪拌5分鐘。在過濾之後,濃縮來自其中的濾液。所得產物經管柱層析且接著濃縮且真空乾燥,從而製備由化學式C-2表示的化合物(折射率:1.556)。 20 g of 1,4-benzenedithiol was fully dissolved in 200 ml of dichloromethane. 22.5 g of 2-chloroethyl acrylate was added thereto, and then stirred for 10 minutes, and 17 g of triethylamine was slowly injected dropwise thereto at 0°C, and then stirred for 12 hours to complete the reaction. 300 ml of dichloromethane and 300 ml of water were added thereto for extraction, and after separation of the organic layer, a dilute hydrochloric acid solution was added thereto to repeat the extraction three times. The dichloromethane layer was separated therefrom, and MgSO 4 was added thereto, and then stirred for 5 minutes. After filtration, the filtrate therefrom was concentrated. The obtained product was subjected to column chromatography and then concentrated and vacuum dried to prepare a compound represented by Chemical Formula C-2 (refractive index: 1.556).
製備實例5 Preparation Example 5
在將磁棒置放於3頸圓底燒瓶中之後,將綠色量子點分散溶液(InP/ZnSe/ZnS,量子點固體:23重量%,韓松化學(Hansol Chemical))置放於其中。向其中添加由化學式Q表示的化合物(配位體),且接著在氮氣氛圍下在80℃下進行攪拌。在反應完成且接著冷卻至室溫(23℃)之後,將量子點反應溶液添加至環己烷中以捕獲沈澱物。沈澱物經由離心與環己烷分離,且在真空烘箱中充分乾燥24小時,從而獲得表面改質的量子點。 After placing a magnetic bar in a 3-neck round-bottom flask, a green quantum dot dispersion solution (InP/ZnSe/ZnS, quantum dot solid: 23% by weight, Hansol Chemical) was placed therein. A compound represented by the chemical formula Q (ligand) was added thereto, and then stirred at 80°C under a nitrogen atmosphere. After the reaction was completed and then cooled to room temperature (23°C), the quantum dot reaction solution was added to cyclohexane to capture the precipitate. The precipitate was separated from the cyclohexane by centrifugation and fully dried in a vacuum oven for 24 hours to obtain surface-modified quantum dots.
表面改質的綠色量子點在可聚合化合物中攪拌12小時,從而獲得表面改質的量子點分散液(QD固體:23重量%)。 The surface-modified green quantum dots were stirred in the polymerizable compound for 12 hours to obtain a surface-modified quantum dot dispersion (QD solids: 23 wt%).
(*合成由化學式Q表示的化合物:將100公克PH-4(韓農化學股份有限公司(Hannong Chemical Inc.))置放於2頸圓底燒瓶中,且接著充分溶解於300毫升THF中。在0℃下向其中注入15.4公克NaOH及100毫升水,且接著充分溶解,直至獲得澄清溶液。 (*Synthesis of the compound represented by the chemical formula Q: 100 g of PH-4 (Hannong Chemical Inc.) was placed in a 2-neck round-bottom flask and then fully dissolved in 300 ml of THF. 15.4 g of NaOH and 100 ml of water were injected therein at 0°C and then fully dissolved until a clear solution was obtained.
在0℃下向其中緩慢注入藉由將73公克對甲苯磺酸氯溶解於100毫升THF中所獲得的溶液。注入進行1小時,且在室溫下攪拌所得混合物持續12小時。當反應完成時,向其中添加過量的二氯甲烷且接著攪拌,且向其中添加NaHCO3飽和溶液,隨之進行萃取、滴定以及脫水。在移除溶劑之後,在乾燥烘箱中乾燥殘餘物24小時。將50公克乾燥產物置放於2頸圓底燒瓶中且在300毫升乙醇中充分攪拌。隨後,向其中添加27公克硫脲且分散於其中,且接著在80℃下回流12小時。接著,向其中注入藉由將4.4公克NaOH溶解於20毫升水中而製備的水性溶液,同時另外攪拌5小時,向其中添加過量的二氯甲烷,且接著向其中添加氫氯酸水 溶液,接著按順序進行萃取、滴定、脫水以及溶劑移除。在真空烘箱中乾燥所得產物24小時,從而獲得由化學式Q表示的化合物。) A solution obtained by dissolving 73 g of p-toluenesulfonic acid chloride in 100 ml of THF was slowly injected thereinto at 0°C. The injection was performed for 1 hour, and the resulting mixture was stirred at room temperature for 12 hours. When the reaction was completed, an excess of dichloromethane was added thereto and then stirred, and a saturated solution of NaHCO 3 was added thereto, followed by extraction, titration and dehydration. After removing the solvent, the residue was dried in a drying oven for 24 hours. 50 g of the dried product was placed in a 2-neck round-bottom flask and fully stirred in 300 ml of ethanol. Subsequently, 27 g of thiourea was added thereto and dispersed therein, and then refluxed at 80°C for 12 hours. Then, an aqueous solution prepared by dissolving 4.4 g of NaOH in 20 ml of water was injected thereto, and while stirring for another 5 hours, an excess of dichloromethane was added thereto, and then an aqueous hydrochloric acid solution was added thereto, followed by extraction, titration, dehydration, and solvent removal in sequence. The obtained product was dried in a vacuum oven for 24 hours, thereby obtaining a compound represented by the chemical formula Q. )
根據實例1至實例7及比較例1至比較例3的各可固化組成物藉由使用表1及表2中所繪示的組成物來製備。 Each curable composition according to Examples 1 to 7 and Comparative Examples 1 to 3 was prepared by using the compositions shown in Tables 1 and 2.
特定言之,在對量子點分散液進行稱重之後,藉由與可聚合化合物混合來對其進行稀釋,且添加聚合抑制劑且攪拌5分鐘。隨後,向其中添加光起始劑,且向其中添加光漫射劑。接著,將對應的粗液體攪拌1小時以製備可固化組成物。 Specifically, after weighing the quantum dot dispersion, it was diluted by mixing with the polymerizable compound, and a polymerization inhibitor was added and stirred for 5 minutes. Subsequently, a photoinitiator was added thereto, and a light diffuser was added thereto. Then, the corresponding crude liquid was stirred for 1 hour to prepare a curable composition.
(A)量子點 (A) Quantum dots
由製備實例5製備的表面改質的綠色量子點分散液 Surface-modified green quantum dot dispersion prepared by Preparation Example 5
(B)可聚合化合物 (B) Polymerizable compounds
(B-1)製備實例1的化合物 (B-1) Preparation of the compound of Example 1
(B-2)製備實例2的化合物 (B-2) Preparation of the compound of Example 2
(B-3)製備實例3的化合物 (B-3) Preparation of the compound of Example 3
(B-4)製備實例4的化合物 (B-4) Preparation of the compound of Example 4
(B-5)比較製備實例1的化合物 (B-5) Comparison of the compounds of Preparation Example 1
(B-6)比較製備實例2的化合物 (B-6) Comparison of the compounds of Preparation Example 2
(C)光聚合起始劑 (C) Photopolymerization initiator
TPO-L(聚萘酮總部(Polynetron Co.)) TPO-L (Polynetron Co.)
(D)光漫射劑 (D) Light diffuser
二氧化鈦分散液(TiO2固體含量:20重量%,平均粒徑:200奈米,Ditto技術) Titanium dioxide dispersion ( TiO2 solid content: 20% by weight, average particle size: 200 nm, Ditto technology)
(E)聚合抑制劑 (E)Polymerization inhibitor
甲基對苯二酚(東京化學(TOKYO CHEMICAL)) Methylhydroquinone (TOKYO CHEMICAL)
藉由使用分光光度計(CM-3600A,柯尼卡美能達感測公司(Konica Minolta Sensing Inc.))來量測根據實例1至實例7及比較例1至比較例3的各可固化組成物的曝光後量子效率(EQE)及固化後漫反射率(SCE),且結果展示於表3中。 The post-exposure quantum efficiency (EQE) and the post-curing diffuse reflectance (SCE) of each curable composition according to Examples 1 to 7 and Comparative Examples 1 to 3 were measured by using a spectrophotometer (CM-3600A, Konica Minolta Sensing Inc.), and the results are shown in Table 3.
參考表3,與根據比較例1至比較例3的可固化組成物相比,根據實例1至實例7的可固化組成物展現較高曝光後量子效率且因此展現改良的光學特性,且同時展現較低固化後漫反射率及因此展現反射率降低效果。 Referring to Table 3, compared with the curable compositions according to Comparative Examples 1 to 3, the curable compositions according to Examples 1 to 7 exhibit higher post-exposure quantum efficiencies and thus exhibit improved optical properties, and at the same time exhibit lower post-curing diffuse reflectance and thus exhibit a reflectivity reduction effect.
儘管本發明已結合目前視為實用例示性實施例之內容來描述,但應瞭解,本發明不限於所揭露之實施例,而是相反,本發明意欲涵蓋包含在所附申請專利範圍的精神及範疇內的各種修改及等效配置。因此,前述實施例應理解為例示性的,但不以任何方式限制本發明。 Although the present invention has been described in conjunction with what are currently considered to be practical exemplary embodiments, it should be understood that the present invention is not limited to the disclosed embodiments, but rather, the present invention is intended to cover various modifications and equivalent configurations within the spirit and scope of the attached patent application. Therefore, the foregoing embodiments should be understood as exemplary, but not limiting the present invention in any way.
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