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TWI851006B - In-dynamic memory search device and operation method thereof - Google Patents

In-dynamic memory search device and operation method thereof Download PDF

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TWI851006B
TWI851006B TW112104108A TW112104108A TWI851006B TW I851006 B TWI851006 B TW I851006B TW 112104108 A TW112104108 A TW 112104108A TW 112104108 A TW112104108 A TW 112104108A TW I851006 B TWI851006 B TW I851006B
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search
transistor
storage
transistors
data
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TW112104108A
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TW202433471A (en
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曾柏皓
李峯旻
林榆瑄
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旺宏電子股份有限公司
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Abstract

An in-dynamic memory search device and an operation method thereof are provided. The in-dynamic memory search device includes at least one word line, at least two bit lines, at least one match line, at least one unit cell, at least two search lines, at least one pre-charge unit and at least one sense unit. The unit cell includes two storage elements and two search transistors. Each of the storage elements includes a write transistor and a read transistor. The write transistor is connected to the word line and one of the bit lines. The read transistor is connected to the write transistor and the match line. The search transistors are respectively connected to the read transistors. The search lines are respectively connected to the search transistors. The pre-charge unit is connected to the match line. The sense unit is connected to the match line.

Description

動態記憶體內搜尋裝置及其操作方法 Dynamic memory in-body search device and its operation method

本揭露是有關於一種記憶體裝置及其操作方法,且特別是有關於一種動態記憶體內搜尋裝置及其操作方法。 The present disclosure relates to a memory device and an operating method thereof, and in particular to a dynamic memory search device and an operating method thereof.

傳統上,基於靜態隨機存取記憶體(SRAM)的TCAM可以使用於網路路由器等商業應用。然而,單個TCAM需要16個電晶體,這將需要相當大的面積和與功耗,限制了其在某些具有能源受限應用的潛力。 Traditionally, TCAM based on static random access memory (SRAM) can be used in commercial applications such as network routers. However, a single TCAM requires 16 transistors, which will require a considerable area and power consumption, limiting its potential in certain energy-constrained applications.

TCAM可用於路由器、數據庫搜索、內存數據處理和神經形態計算。 TCAM can be used in routers, database searches, in-memory data processing, and neuromorphic computing.

隨著物聯網應用的興起,對低靜態功耗CAM的需求也在增加。基於新興記憶體(RRAM、PCM、FeFET)的TCAM已被證明能夠克服面積密度/靜態功耗方面的挑戰,而不會降低性能。然而,ReRAM和PCM中的啟動/關閉比例(on/off ratio)對於需要並行搜索海量數據集的許多實際應用來說是不夠的。因為在TCAM陣列中,同一匹配線上的TCAM單元的漏電流會加在一 起,並且有限的R比例會使得組數大時很難區分全匹配狀態和1位元不匹配狀態。此外,這些新興記憶體的TCAM的耐用性有限,也限制了數據更新頻率。 With the rise of IoT applications, the demand for low static power CAM is also increasing. TCAM based on emerging memories (RRAM, PCM, FeFET) has been shown to overcome the challenges of area density/static power without sacrificing performance. However, the on/off ratio in ReRAM and PCM is not enough for many practical applications that require parallel search of massive data sets. Because in the TCAM array, the leakage current of TCAM cells on the same match line will be added together, and the limited R ratio makes it difficult to distinguish between the full match state and the 1-bit mismatch state when the number of groups is large. In addition, the limited endurance of TCAM of these emerging memories also limits the frequency of data update.

本揭露係有關於一種動態記憶體內搜尋裝置及其操作方法。本揭露之動態記憶體內搜尋裝置係為近似DRAM的一種TCAM(其採用一對2T0C結構與2個搜尋電晶體),以執行記憶體內搜尋的功能。動態記憶體內搜尋裝置100可以提供無限制的更新頻率、快速的搜尋與適合長搜尋字串的開啟/關閉比例(on/off ratio)。單位記憶胞UC係為一6T0C結構。相較於SRAM的TCAM來說,6T0C結構具有較小的面積。本揭露之技術相當適用可於路由器、數據庫搜索、內存數據處理和神經形態計算。 The present disclosure is about a dynamic in-memory search device and its operation method. The dynamic in-memory search device disclosed in the present disclosure is a TCAM similar to DRAM (it adopts a pair of 2T0C structures and 2 search transistors) to perform the function of in-memory search. The dynamic in-memory search device 100 can provide unlimited update frequency, fast search and on/off ratio suitable for long search strings. The unit memory cell UC is a 6T0C structure. Compared with the TCAM of SRAM, the 6T0C structure has a smaller area. The technology disclosed in the present disclosure is very suitable for routers, database search, memory data processing and neural morphological computing.

根據本揭露之一方面,提出一種動態記憶體內搜尋裝置(in-dynamic memory search device)。動態記憶體內搜尋裝置包括至少一字元線、至少二位元線、至少一匹配線、至少一單位記憶胞、至少二搜尋線、至少一預充電單元及至少一感測單元。單位記憶胞包括二儲存元件及二搜尋電晶體。各個儲存元件包括一寫入電晶體及一讀取電晶體。寫入電晶體連接於字元線及這些位元線之其中之一。讀取電晶體連接於寫入電晶體及匹配線。這些搜尋電晶體分別連接於這些讀取電晶體。至少二搜尋線 分別連接於這些搜尋電晶體。預充電單元連接於匹配線。感測單元連接於匹配線。 According to one aspect of the present disclosure, an in-dynamic memory search device is provided. The in-dynamic memory search device includes at least one word line, at least two bit lines, at least one matching line, at least one unit memory cell, at least two search lines, at least one precharge unit and at least one sensing unit. The unit memory cell includes two storage elements and two search transistors. Each storage element includes a write transistor and a read transistor. The write transistor is connected to the word line and one of the bit lines. The read transistor is connected to the write transistor and the matching line. The search transistors are respectively connected to the read transistors. At least two search lines are respectively connected to the search transistors. The precharge unit is connected to the matching line. The sensing unit is connected to the matching line.

根據本揭露之另一方面,提出一種動態記憶體內搜尋裝置之操作方法。動態記憶體內搜尋裝置包括至少一字元線、至少二位元線、至少一匹配線、至少一單位記憶胞及二搜尋電晶體。單位記憶胞包括二儲存元件及二搜尋電晶體。各個儲存元件包括一寫入電晶體及一讀取電晶體。寫入電晶體連接於字元線及這些位元線之其中之一。讀取電晶體連接於寫入電晶體及匹配線。操作方法包括以下步驟。寫入一儲存資料至單位記憶胞。對匹配線預充電。輸入一搜尋資料至這些搜尋線。感測匹配線之一電壓,以判定搜尋資料與儲存資料是否匹配。 According to another aspect of the present disclosure, a method for operating a search device in a dynamic memory is provided. The search device in a dynamic memory includes at least one word line, at least two bit lines, at least one matching line, at least one unit memory cell and two search transistors. The unit memory cell includes two storage elements and two search transistors. Each storage element includes a write transistor and a read transistor. The write transistor is connected to the word line and one of the bit lines. The read transistor is connected to the write transistor and the matching line. The operation method includes the following steps. Write a storage data to the unit memory cell. Precharge the matching line. Input a search data to the search lines. Sense a voltage of the matching line to determine whether the search data matches the storage data.

為了對本揭露之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式詳細說明如下: In order to better understand the above and other aspects of this disclosure, the following is a specific example, and the attached drawings are used to explain in detail as follows:

100,200:動態記憶體內搜尋裝置 100,200: Dynamic memory in-body search device

CG,CGj:預充電單元 CG, CGj: pre-charged unit

CV1,CV2,CV3:曲線 CV1,CV2,CV3: curves

DT,DTj:儲存資料 DT, DTj: store data

EC:解碼器 EC:decoder

GD:接地端 GD: Ground terminal

Irk,Iwk:漏電流 Irk,Iwk: leakage current

Irp:導通電流 Irp: conduction current

ML,MLj:匹配線 ML,MLj:matching line

RS:搜尋結果 RS:Search results

RT0,RT1,RT_0,RT_1,RT_2,RT_3:讀取電晶體 RT0,RT1,RT_0,RT_1,RT_2,RT_3: read transistors

SA,SAj:感測單元 SA,SAj: Sensing unit

SE0,SE1,SE_0,SE_1,SE_2,SE_3:儲存元件 SE0, SE1, SE_0, SE_1, SE_2, SE_3: storage components

SL1,SL1’,SLi,SLi’:搜尋線 SL1,SL1’,SLi,SLi’:Search line

SR:搜尋資料 SR: Search data

SRi:位元 SRi: bit

ST0,ST1:搜尋電晶體 ST0, ST1: Search transistor

SN,SN’:儲存節點 SN,SN’: storage node

UC,UCij:單位記憶胞 UC,UCij:unit memory cell

Voff:關閉電壓 Voff: Off voltage

Von:啟動電壓 Von: Starting voltage

WBL0,WBL1,WBLi,WBLi’:位元線 WBL0,WBL1,WBLi,WBLi’: bit line

WT0,WT1,WT_0,WT_1,WT_2,WT_3:寫入電晶體 WT0,WT1,WT_0,WT_1,WT_2,WT_3: write transistors

WWL,WWLj:字元線 WWL,WWLj: character line

第1圖繪示根據一實施例之動態記憶體內搜尋裝置(in-dynamic memory search device)的示意圖。 FIG. 1 is a schematic diagram of an in-dynamic memory search device according to an embodiment.

第2A~2D圖示例說明表一之運作。 Figures 2A to 2D illustrate the operation of Table 1.

第3A~3D圖示例說明表二之運作。 Figures 3A to 3D illustrate the operation of Table 2.

第4圖繪示根據一實施例之動態記憶體內搜尋裝置之操作方法的流程圖。 Figure 4 shows a flow chart of an operation method of a dynamic memory in-body search device according to an embodiment.

第5A圖繪示寫入電晶體之電流-電壓特性曲線(I-V characteristic curve)。 Figure 5A shows the I-V characteristic curve of the write transistor.

第5B圖繪示讀取電晶體之電流-電壓特性曲線。 Figure 5B shows the current-voltage characteristic curve of the transistor.

第6A~6D圖繪示四種2T0C結構。 Figures 6A to 6D show four types of 2T0C structures.

第7圖繪示根據一實施例之動態記憶體內搜尋裝置。 FIG. 7 illustrates a dynamic memory in-body search device according to an embodiment.

第8圖繪示匹配線之示例的曲線。 Figure 8 shows an example of a matching line curve.

請參照第1圖,其繪示根據一實施例之動態記憶體內搜尋裝置(in-dynamic memory search device)100的示意圖。動態記憶體內搜尋裝置100係為近似DRAM的一種TCAM,以執行記憶體內搜尋的功能。舉例來說,動態記憶體內搜尋裝置100可以是一二維快閃記憶體裝置或一三維快閃記憶體裝置。如第1圖所示,動態記憶體內搜尋裝置100之一單位記憶胞UC用以儲存一儲存資料DT之一個位元。一搜尋資料SR輸入至動態記憶體內搜尋裝置100後,輸出一搜尋結果RS,以得知儲存資料DT與搜尋資料SR是否匹配。 Please refer to FIG. 1, which shows a schematic diagram of an in-dynamic memory search device 100 according to an embodiment. The in-dynamic memory search device 100 is a TCAM similar to DRAM to perform an in-memory search function. For example, the in-dynamic memory search device 100 can be a two-dimensional flash memory device or a three-dimensional flash memory device. As shown in FIG. 1, a unit memory cell UC of the in-dynamic memory search device 100 is used to store a bit of storage data DT. After a search data SR is input into the in-dynamic memory search device 100, a search result RS is output to know whether the storage data DT matches the search data SR.

在本揭露中,動態記憶體內搜尋裝置100可以提供無限制的更新頻率、快速的搜尋與適合長搜尋字串的開啟/關閉比例(on/off ratio)。動態記憶體內搜尋裝置100的細部結構及其操作方法將說明如下。 In the present disclosure, the dynamic memory search device 100 can provide unlimited update frequency, fast search and on/off ratio suitable for long search strings. The detailed structure of the dynamic memory search device 100 and its operation method will be described as follows.

如第1圖所示,單位記憶胞UC係為一6T0C結構。相較於SRAM的TCAM來說,6T0C結構具有較小的面積。「6T0C」指得是6個電晶體與0個電容。在此實施例中,6T0C結構包括一對儲存元件SE0、SE1與兩個搜尋電晶體ST0、ST1。各個儲存元件SE0、SE1係為一2T0C結構。「2T0C」結構指的是2個電晶體與0個電容。詳細來說,儲存元件SE0包括一寫入電晶體WT0及一讀取電晶體RT0;儲存元件SE1包括一寫入電晶體WT1及一讀取電晶體RT1。 As shown in Figure 1, the unit memory cell UC is a 6T0C structure. Compared with the TCAM of SRAM, the 6T0C structure has a smaller area. "6T0C" refers to 6 transistors and 0 capacitors. In this embodiment, the 6T0C structure includes a pair of storage elements SE0, SE1 and two search transistors ST0, ST1. Each storage element SE0, SE1 is a 2T0C structure. The "2T0C" structure refers to 2 transistors and 0 capacitors. In detail, the storage element SE0 includes a write transistor WT0 and a read transistor RT0; the storage element SE1 includes a write transistor WT1 and a read transistor RT1.

動態記憶體內搜尋裝置100包括至少一字元線WWL、至少二位元線WBL0、WBL1、至少一匹配線ML、至少一單位記憶胞UC、至少二搜尋線SL1、SL1’、至少一預充電單元CG及至少一感測單元SA。寫入電晶體WT0之一閘極連接於字元線WWL,寫入電晶體WT0之一源極/汲極連接於位元線WBL0,寫入電晶體WT0之另一源極/汲極連接於讀取電晶體RT0之一閘極。讀取電晶體RT0之閘極連接於寫入電晶體WT0之源極/汲極,讀取電晶體RT0之一源極/汲極連接於匹配線ML,讀取電晶體RT0之另一源極/汲極連接於搜尋電晶體ST0之一源極/汲極。搜尋電晶體ST0之一閘極連接於搜尋線SL1,搜尋電晶體ST0之一源極/汲極連接於讀取電晶體RT0之源極/汲極,搜尋電晶體ST0之另一源極/汲極連接於一接地端GD。讀取電晶體RT0與搜尋電晶體ST0串聯於匹配線ML與接地端GD之間。 The dynamic memory in-memory search device 100 includes at least one word line WWL, at least two bit lines WBL0, WBL1, at least one match line ML, at least one unit memory cell UC, at least two search lines SL1, SL1', at least one precharge unit CG and at least one sensing unit SA. A gate of the write transistor WT0 is connected to the word line WWL, a source/drain of the write transistor WT0 is connected to the bit line WBL0, and another source/drain of the write transistor WT0 is connected to a gate of the read transistor RT0. The gate of the read transistor RT0 is connected to the source/drain of the write transistor WT0, one source/drain of the read transistor RT0 is connected to the match line ML, and the other source/drain of the read transistor RT0 is connected to a source/drain of the search transistor ST0. A gate of the search transistor ST0 is connected to the search line SL1, one source/drain of the search transistor ST0 is connected to the source/drain of the read transistor RT0, and the other source/drain of the search transistor ST0 is connected to a ground terminal GD. The read transistor RT0 and the search transistor ST0 are connected in series between the match line ML and the ground terminal GD.

寫入電晶體WT1之一閘極連接於字元線WWL,寫入電晶體WT1之一源極/汲極連接於位元線WBL1,寫入電晶體WT1之另一源極/汲極連接於讀取電晶體RT1之一閘極。讀取電晶體RT1之閘極連接於寫入電晶體WT1之源極/汲極,讀取電晶體RT1之一源極/汲極連接於匹配線ML,讀取電晶體RT1之另一源極/汲極連接於搜尋電晶體ST1之一源極/汲極。搜尋電晶體ST1之一閘極連接於搜尋線SL1’,搜尋電晶體ST1之一源極/汲極連接於讀取電晶體RT1之源極/汲極,搜尋電晶體ST1之另一源極/汲極連接於接地端GD。讀取電晶體RT1與搜尋電晶體ST1串聯於匹配線ML與接地端GD之間。 A gate of the write transistor WT1 is connected to the word line WWL, a source/drain of the write transistor WT1 is connected to the bit line WBL1, and the other source/drain of the write transistor WT1 is connected to a gate of the read transistor RT1. A gate of the read transistor RT1 is connected to the source/drain of the write transistor WT1, a source/drain of the read transistor RT1 is connected to the match line ML, and the other source/drain of the read transistor RT1 is connected to a source/drain of the search transistor ST1. One gate of the search transistor ST1 is connected to the search line SL1', one source/drain of the search transistor ST1 is connected to the source/drain of the read transistor RT1, and the other source/drain of the search transistor ST1 is connected to the ground terminal GD. The read transistor RT1 and the search transistor ST1 are connected in series between the match line ML and the ground terminal GD.

預充電單元CG連接於匹配線ML,以對匹配線ML預充電至一預定電壓位準。感測單元SA連接於匹配線ML,以感測匹配線ML之電壓。 The pre-charge unit CG is connected to the matching line ML to pre-charge the matching line ML to a predetermined voltage level. The sensing unit SA is connected to the matching line ML to sense the voltage of the matching line ML.

請參照表一及第2A~2D圖。表一記錄在寫入儲存資料DT時,對動態記憶體內搜尋裝置100所施加的電壓。第2A~2D圖示例說明表一之運作。在表一之第一列中,欲儲存於單位記憶胞UC之儲存資料DT為「0」。在表一之第二列中,欲儲存於單位記憶胞UC之儲存資料DT為「1」。在表一之第三列中,欲儲存於單位記憶胞UC之儲存資料DT為「不在意(Don’t’care)」。「不在意(Don’t’care)」可以匹配於任何搜尋資料SR。在表一之第四列中,欲儲存於單位記憶胞UC之儲存資料DT為「無效(Invalid)」。「無效(Invalid)」無法匹配於任何搜尋資料SR。 Please refer to Table 1 and Figures 2A to 2D. Table 1 records the voltage applied to the search device 100 in the dynamic memory when writing the storage data DT. Figures 2A to 2D illustrate the operation of Table 1. In the first column of Table 1, the storage data DT to be stored in the unit memory cell UC is "0". In the second column of Table 1, the storage data DT to be stored in the unit memory cell UC is "1". In the third column of Table 1, the storage data DT to be stored in the unit memory cell UC is "Don't care". "Don't care" can match any search data SR. In the fourth column of Table 1, the storage data DT to be stored in the unit memory cell UC is "Invalid". "Invalid" cannot match any search data SR.

Figure 112104108-A0305-02-0010-1
Figure 112104108-A0305-02-0010-1

如第2A圖及表一第一列所示,「0」欲儲存於單位記憶胞UC。字元線WWL被施加一啟動電壓(例如是3V),以導通寫入電晶體WT0、WT1。搜尋線SL1、SL1’被施加一關閉電壓(例如是0V),以關閉搜尋電晶體ST0、ST1。位元線WBL0被施加一預定低電壓(例如是0V),位元線WBL1被施加一預定高電壓(例如是1V)。「預定低電壓、預定高電壓」(「0V、1V」)表示儲存資料DT的「0」。由於寫入電晶體WT0已導通,施加於位元線WBL0之0V將會被儲存於寫入電晶體WT0與讀取電晶體RT0之間的儲存節點SN。由於寫入電晶體WT1已導通,施加於位元線WBL1之1V將會被儲存於寫入電晶體WT1與讀取電晶體RT1之間的儲存節點SN’。 As shown in FIG. 2A and the first column of Table 1, "0" is to be stored in the unit memory cell UC. A start voltage (e.g., 3V) is applied to the word line WWL to turn on the write transistors WT0 and WT1. A turn-off voltage (e.g., 0V) is applied to the search lines SL1 and SL1' to turn off the search transistors ST0 and ST1. A predetermined low voltage (e.g., 0V) is applied to the bit line WBL0, and a predetermined high voltage (e.g., 1V) is applied to the bit line WBL1. "Predetermined low voltage, predetermined high voltage" ("0V, 1V") represents the storage data DT "0". Since the write transistor WT0 is turned on, the 0V applied to the bit line WBL0 will be stored in the storage node SN between the write transistor WT0 and the read transistor RT0. Since the write transistor WT1 is turned on, the 1V applied to the bit line WBL1 will be stored in the storage node SN’ between the write transistor WT1 and the read transistor RT1.

如第2B圖及表一第二列所示,「1」欲儲存於單位記憶胞UC。字元線WWL被施加一啟動電壓(例如是3V),以導通寫入電晶體WT0、WT1。搜尋線SL1、SL1’被施加一關閉電壓(例如是0V),以關閉搜尋電晶體ST0、ST1。位元線WBL0被施加一預定高電壓(例如是1V),位元線WBL1被施加一預定低電壓(例如是0V)。「預定高電壓、預定低電壓」(「1V、0V」)表示儲存資料DT的「1」。由於寫入電晶體WT0已導通,施加於位元線WBL0之1V將會被儲存於寫入電晶體WT0與讀取電晶體RT0之間的儲存節點SN。由於寫入電晶體WT1已導通,施加於位元線WBL1之0V將會被儲存於寫入電晶體WT1與讀取電晶體RT1之間的儲存節點SN’。 As shown in FIG. 2B and the second column of Table 1, "1" is to be stored in the unit memory cell UC. A start voltage (e.g., 3V) is applied to the word line WWL to turn on the write transistors WT0 and WT1. A turn-off voltage (e.g., 0V) is applied to the search lines SL1 and SL1' to turn off the search transistors ST0 and ST1. A predetermined high voltage (e.g., 1V) is applied to the bit line WBL0, and a predetermined low voltage (e.g., 0V) is applied to the bit line WBL1. "Predetermined high voltage, predetermined low voltage" ("1V, 0V") represents the "1" of the storage data DT. Since the write transistor WT0 is turned on, 1V applied to the bit line WBL0 will be stored in the storage node SN between the write transistor WT0 and the read transistor RT0. Since the write transistor WT1 is turned on, 0V applied to the bit line WBL1 will be stored in the storage node SN’ between the write transistor WT1 and the read transistor RT1.

如第2C圖及表一第三列所示,「不在意(Don’t care)」欲儲存於單位記憶胞UC。字元線WWL被施加一啟動電壓(例如是3V),以導通寫入電晶體WT0、WT1。搜尋線SL1、SL1’被施加一關閉電壓(例如是0V),以關閉搜尋電晶體ST0、ST1。位元線WBL0被施加一預定低電壓(例如是0V),位元線WBL1被施加一預定低電壓(例如是0V)。「預定低電壓、預定低電壓」(「0V、0V」)表示儲存資料DT的「不在意(Don’t care)」。由於寫入電晶體WT0已導通,施加於位元線WBL0之0V將會被儲存於寫入電晶體WT0與讀取電晶體RT0之間的儲存節點SN。由於寫入電晶體WT1已導通,施加於位元線WBL1之0V將會被儲存於寫入電晶體WT1與讀取電晶體RT1之間的儲存節點SN’。 As shown in FIG. 2C and the third column of Table 1, “Don’t care” is to be stored in the unit memory cell UC. An enable voltage (e.g., 3V) is applied to the word line WWL to turn on the write transistors WT0 and WT1. A turn-off voltage (e.g., 0V) is applied to the search lines SL1 and SL1’ to turn off the search transistors ST0 and ST1. A predetermined low voltage (e.g., 0V) is applied to the bit line WBL0, and a predetermined low voltage (e.g., 0V) is applied to the bit line WBL1. “Predetermined low voltage, predetermined low voltage” (“0V, 0V”) indicates “Don’t care” of the stored data DT. Since the write transistor WT0 is turned on, 0V applied to the bit line WBL0 will be stored in the storage node SN between the write transistor WT0 and the read transistor RT0. Since the write transistor WT1 is turned on, 0V applied to the bit line WBL1 will be stored in the storage node SN’ between the write transistor WT1 and the read transistor RT1.

如第2D圖及表一第四列所示,「無效(Invalid)」欲儲存於單位記憶胞UC。字元線WWL被施加一啟動電壓(例如是3V),以導通寫入電晶體WT0、WT1。搜尋線SL1、SL1’被施加一關閉電壓(例如是0V),以關閉搜尋電晶體ST0、ST1。位元線WBL0被施加一預定高電壓(例如是1V),位元線WBL1被施加一預定高電壓(例如是1V)。「預定高電壓、預定高電壓」(「1V、1V」)表示儲存資料DT的「無效(Invalid)」。由於寫入電晶體WT0已導通,施加於位元線WBL0之1V將會被儲存於寫入電晶體WT0與讀取電晶體RT0之間的儲存節點SN。由於寫入電晶體WT1已導通,施加於位元線WBL1之1V將會被儲存於寫入電晶體WT1與讀取電晶體RT1之間的儲存節點SN’。 As shown in FIG. 2D and the fourth column of Table 1, "Invalid" is to be stored in the unit memory cell UC. An enable voltage (e.g., 3V) is applied to the word line WWL to turn on the write transistors WT0 and WT1. A turn-off voltage (e.g., 0V) is applied to the search lines SL1 and SL1' to turn off the search transistors ST0 and ST1. A predetermined high voltage (e.g., 1V) is applied to the bit line WBL0, and a predetermined high voltage (e.g., 1V) is applied to the bit line WBL1. "Predetermined high voltage, predetermined high voltage" ("1V, 1V") indicates "Invalid" of the stored data DT. Since the write transistor WT0 is turned on, the 1V applied to the bit line WBL0 will be stored in the storage node SN between the write transistor WT0 and the read transistor RT0. Since the write transistor WT1 is turned on, the 1V applied to the bit line WBL1 will be stored in the storage node SN’ between the write transistor WT1 and the read transistor RT1.

請參照表二及第3A~3D圖。表二在搜尋儲存資料DT時,對動態記憶體內搜尋裝置100所施加的電壓。第3A~3D圖示例說明表二之運作。在表二之第一列中,搜尋資料SR係為「0」。在表二之第二列中,搜尋資料SR係為「1」。在表二之第三列中,搜尋資料SR係為「萬用卡(Wildcard)」。「萬用卡(Wildcard)」可以匹配於任何的儲存資料DT。在表二之第四列中,搜尋資料SR係為「無效(Invalid)」。「無效(Invalid)」無法匹配於任何的儲存資料DT。 Please refer to Table 2 and Figures 3A to 3D. Table 2 shows the voltage applied to the search device 100 in the dynamic memory when searching for the stored data DT. Figures 3A to 3D illustrate the operation of Table 2. In the first row of Table 2, the search data SR is "0". In the second row of Table 2, the search data SR is "1". In the third row of Table 2, the search data SR is "Wildcard". "Wildcard" can match any stored data DT. In the fourth row of Table 2, the search data SR is "Invalid". "Invalid" cannot match any stored data DT.

Figure 112104108-A0305-02-0012-2
Figure 112104108-A0305-02-0012-2
Figure 112104108-A0305-02-0013-3
Figure 112104108-A0305-02-0013-3

如第3A圖所示,搜尋資料SR係為「0」,儲存資料DT係為「0」。1V與0V分別施加於搜尋線SL1、SL1’,0V與1V分別儲存於儲存節點SN、SN’。儲存節點SN係為0V,故讀取電晶體RT0被關閉,0V施加於搜尋線SL1’,故搜尋電晶體ST1被關閉。因此,匹配線ML的電壓將會維持不變。 As shown in Figure 3A, the search data SR is "0" and the storage data DT is "0". 1V and 0V are applied to the search lines SL1 and SL1' respectively, and 0V and 1V are stored in the storage nodes SN and SN' respectively. The storage node SN is 0V, so the read transistor RT0 is turned off, and 0V is applied to the search line SL1', so the search transistor ST1 is turned off. Therefore, the voltage of the matching line ML will remain unchanged.

如第3B圖所示,搜尋資料SR係為「1」,儲存資料DT係為「0」。0V與1V分別施加於搜尋線SL1、SL1’,0V與1V分別儲存於儲存節點SN、SN’。儲存節點SN’係為1V,故讀取電晶體RT1被導通,1V施加於搜尋線SL1,故搜尋電晶體ST1被導通。因此,匹配線ML的電壓將會被下拉。 As shown in Figure 3B, the search data SR is "1" and the storage data DT is "0". 0V and 1V are applied to the search lines SL1 and SL1' respectively, and 0V and 1V are stored in the storage nodes SN and SN' respectively. The storage node SN' is 1V, so the read transistor RT1 is turned on, and 1V is applied to the search line SL1, so the search transistor ST1 is turned on. Therefore, the voltage of the matching line ML will be pulled down.

如第3C圖所示,搜尋資料SR係為「萬用卡(Wildcard)」,儲存資料DT係為「0」。0V與0V分別施加於搜尋線SL1、SL1’,0V與1V分別儲存於儲存節點SN、SN’。儲存節點SN係為0V,故讀取電晶體RT0被關閉,0V施加於搜尋線 SL1,故搜尋電晶體ST1被關閉。因此,匹配線ML的電壓將會維持不變。 As shown in Figure 3C, the search data SR is "Wildcard" and the storage data DT is "0". 0V and 0V are applied to the search lines SL1 and SL1' respectively, and 0V and 1V are stored in the storage nodes SN and SN' respectively. The storage node SN is 0V, so the read transistor RT0 is turned off, and 0V is applied to the search line SL1, so the search transistor ST1 is turned off. Therefore, the voltage of the matching line ML will remain unchanged.

如第3D圖所示,搜尋資料SR係為「0」,儲存資料DT係為「不在意(Don’t care)」。1V與0V分別施加於搜尋線SL1、SL1’,0V與0V分別儲存於儲存節點SN、SN’。儲存節點SN係為0V,故讀取電晶體RT0被關閉,0V施加於搜尋線SL1,故搜尋電晶體ST1被關閉。因此,匹配線ML的電壓將會維持不變。 As shown in Figure 3D, the search data SR is "0" and the storage data DT is "Don't care". 1V and 0V are applied to the search lines SL1 and SL1' respectively, and 0V and 0V are stored in the storage nodes SN and SN' respectively. The storage node SN is 0V, so the read transistor RT0 is turned off, and 0V is applied to the search line SL1, so the search transistor ST1 is turned off. Therefore, the voltage of the matching line ML will remain unchanged.

一些例子已經示例說明如上,但動態記憶體內搜尋裝置100的操作並不局限於上述的例子。動態記憶體內搜尋裝置100的操作可以透過以下流程圖來進行。 Some examples have been described above, but the operation of the dynamic memory search device 100 is not limited to the above examples. The operation of the dynamic memory search device 100 can be performed through the following flowchart.

請參照第4圖,其繪示根據一實施例之動態記憶體內搜尋裝置100之操作方法的流程圖。操作方法包括步驟S110~S140。在步驟S110中,如第2A~2D圖所示的例子,儲存資料ST寫入於單位記憶胞UC中。請參照第5A圖,其繪示寫入電晶體WT0(或寫入電晶體WT1)之電流-電壓特性曲線(I-V characteristic curve)。在此步驟中,字元線WWL被施加啟動電壓Von(例如是3V),以啟動寫入電晶體WT0、WT1。當寫入電晶體WT0、WT1被啟動,施加於位元線WBL0、WBL1之電壓將被儲存於儲存節點SN、SN’。 Please refer to FIG. 4, which is a flow chart showing an operation method of a dynamic memory search device 100 according to an embodiment. The operation method includes steps S110 to S140. In step S110, as shown in the example of FIGS. 2A to 2D, the storage data ST is written into the unit memory cell UC. Please refer to FIG. 5A, which shows the current-voltage characteristic curve (I-V characteristic curve) of the write transistor WT0 (or the write transistor WT1). In this step, the word line WWL is applied with an activation voltage Von (for example, 3V) to activate the write transistors WT0 and WT1. When the write transistors WT0 and WT1 are activated, the voltage applied to the bit lines WBL0 and WBL1 will be stored in the storage nodes SN and SN’.

在電壓儲存於儲存節點SN、SN’之後,字元線WWL被施加關閉電壓Voff(例如是0V或-2V),以關閉寫入電晶體WT0、WT1,使得儲存於儲存節點SN、SN’的電壓能夠維持。在 一實施例中,寫入電晶體WT0、WT1之通道層的材料可以是氧化銦鎵鋅(indium gallium zinc oxide,IGZO)、多晶矽(poly-silicon)、非晶矽(amorphous silicon,a-Si)、或多晶鍺(polycrystalline germanium,poly-Ge),以使寫入電晶體WT0、WT1的漏電流Iwk可以盡可能地降低。在寫入電晶體WT0、WT1的漏電流Iwk可以相當低的情況下,儲存於儲存節點SN、SN’的電壓可以被維持得很好。 After the voltage is stored in the storage nodes SN and SN', the word line WWL is applied with an off voltage Voff (for example, 0V or -2V) to turn off the write transistors WT0 and WT1 so that the voltage stored in the storage nodes SN and SN' can be maintained. In one embodiment, the material of the channel layer of the write transistors WT0 and WT1 can be indium gallium zinc oxide (IGZO), polycrystalline silicon (poly-silicon), amorphous silicon (a-Si), or polycrystalline germanium (poly-Ge), so that the leakage current Iwk of the write transistors WT0 and WT1 can be reduced as much as possible. When the leakage current Iwk of the write transistors WT0 and WT1 can be quite low, the voltage stored in the storage nodes SN and SN’ can be well maintained.

然後,在步驟S120中,如第3A~3D圖的例子所示,預充電單元CG對匹配線ML進行預充電。舉例來說,匹配線ML可以被預充電至一設定電壓(例如是5V)。 Then, in step S120, as shown in the examples of Figures 3A to 3D, the pre-charge unit CG pre-charges the match line ML. For example, the match line ML can be pre-charged to a set voltage (e.g., 5V).

接著,在步驟S130中,如第3A~3D圖的例子所示,搜尋資料SR輸入至搜尋線SL1、SL1’。在此步驟中,當儲存於儲存節點SN的電壓為1V,讀取電晶體RT0被導通;當儲存於儲存節點SN’的電壓為1V,讀取電晶體RT1被導通;當施加於搜尋線SL1的電壓為1V,搜尋電晶體ST0被導通;當施加於搜尋線SL1’的電壓為1V,搜尋電晶體ST1被導通。 Next, in step S130, as shown in the examples of Figures 3A to 3D, the search data SR is input to the search lines SL1 and SL1'. In this step, when the voltage stored in the storage node SN is 1V, the read transistor RT0 is turned on; when the voltage stored in the storage node SN' is 1V, the read transistor RT1 is turned on; when the voltage applied to the search line SL1 is 1V, the search transistor ST0 is turned on; when the voltage applied to the search line SL1' is 1V, the search transistor ST1 is turned on.

請參照第5B圖,其繪示讀取電晶體RT0(或讀取電晶體RT1)之電流-電壓特性曲線。在一實施例中,讀取電晶體RT0、RT1之通道層之材料例如是單晶矽(single crystal silicon)、單晶鍺(single crystal Ge)、III-V族材料、氧化銦鎵鋅(indium gallium zinc oxide,IGZO),以使讀取電晶體RT0、RT1之導通電流(pass current)Irp可以盡可能地提高。 在讀取電晶體RT0、RT1的導通電流Irp可以相當高的情況下,匹配線ML的電壓拉低可以變得相當明顯且搜尋速度也可以提升。 Please refer to FIG. 5B, which shows the current-voltage characteristic curve of the read transistor RT0 (or the read transistor RT1). In one embodiment, the material of the channel layer of the read transistors RT0 and RT1 is, for example, single crystal silicon, single crystal Ge, III-V material, indium gallium zinc oxide (IGZO), so that the pass current Irp of the read transistors RT0 and RT1 can be increased as much as possible. When the pass current Irp of the read transistors RT0 and RT1 can be quite high, the voltage pull-down of the matching line ML can become quite obvious and the search speed can also be improved.

如第5B圖所示,導通電流Irp約為1*10-6A,漏電流Irk約為1*10-12A。讀取電晶體RT0、RT1的啟動/關閉比率相當的大(約為10-6),而能夠應用於長字串的搜尋。 As shown in FIG. 5B , the conduction current Irp is about 1*10 -6 A, and the leakage current Irk is about 1*10 -12 A. The on/off ratio of the read transistors RT0 and RT1 is quite large (about 10 -6 ), and can be applied to long string searches.

接著,在步驟S140中,感測單元SA感測匹配線ML之電壓,以判定搜尋資料SR與儲存資料DT是否匹配。 Next, in step S140, the sensing unit SA senses the voltage of the matching line ML to determine whether the search data SR matches the storage data DT.

儲存元件SE0、SE1係為一2T0C結構。在一些實施例中,2T0C結構可以透過以下四種結構來實現。請參照第6A~6D圖,其繪示四種2T0C結構。如第6A圖所示,儲存元件SE_0包括一寫入電晶體WT_0及一讀取電晶體RT_0。在儲存元件SE_0中,寫入電晶體WT_0與讀取電晶體RT_0皆為一種臨界電壓可調電晶體(threshold voltage tunable transistor)。舉例來說,寫入電晶體WT_0在其閘極堆疊具有一電荷存儲層(charge storage layer)或一鐵電層(ferroelectric layer),讀取電晶體RT_0在其閘極堆疊具有一電荷存儲層或一鐵電層。電荷存儲層或鐵電層係以斜線表示。舉例來說,電荷存儲層例如是一SONOS結構或一浮動閘極(floating gate),鐵電層例如是一FeFET結構。 The storage elements SE0 and SE1 are a 2T0C structure. In some embodiments, the 2T0C structure can be implemented by the following four structures. Please refer to Figures 6A to 6D, which illustrate four 2T0C structures. As shown in Figure 6A, the storage element SE_0 includes a write transistor WT_0 and a read transistor RT_0. In the storage element SE_0, the write transistor WT_0 and the read transistor RT_0 are both a threshold voltage tunable transistor. For example, the write transistor WT_0 has a charge storage layer or a ferroelectric layer in its gate stack, and the read transistor RT_0 has a charge storage layer or a ferroelectric layer in its gate stack. The charge storage layer or the ferroelectric layer is represented by a slash. For example, the charge storage layer is a SONOS structure or a floating gate, and the ferroelectric layer is a FeFET structure.

如第6B圖所示,儲存元件SE_1包括一寫入電晶體WT_1及一讀取電晶體RT_1。在儲存元件SE_1中,僅有讀取電晶體RT_1為臨界電壓可調電晶體。舉例來說,寫入電晶體WT_1不具有任何電荷存儲層或任何鐵電層,讀取電晶體RT_1在其閘極堆 疊具有一電荷存儲層或一鐵電層。電荷存儲層或鐵電層係以斜線表示。舉例來說,電荷存儲層例如是一SONOS結構或一浮動閘極,鐵電層例如是一FeFET結構。 As shown in FIG. 6B , the storage element SE_1 includes a write transistor WT_1 and a read transistor RT_1. In the storage element SE_1, only the read transistor RT_1 is a critical voltage adjustable transistor. For example, the write transistor WT_1 does not have any charge storage layer or any ferroelectric layer, and the read transistor RT_1 has a charge storage layer or a ferroelectric layer in its gate stack. The charge storage layer or the ferroelectric layer is represented by a slash. For example, the charge storage layer is, for example, a SONOS structure or a floating gate, and the ferroelectric layer is, for example, a FeFET structure.

如第6C圖所示,儲存元件SE_2包括一寫入電晶體WT_2及一讀取電晶體RT_2。在儲存元件SE_2中,僅有寫入電晶體WT_2為臨界電壓可調電晶體。舉例來說,寫入電晶體WT_2在其閘極堆疊具有一電荷存儲層或一鐵電層,讀取電晶體RT_2不具有任何電荷存儲層或任何鐵電層。電荷存儲層或鐵電層係以斜線表示。舉例來說,電荷存儲層例如是一SONOS結構或一浮動閘極,鐵電層例如是一FeFET結構。 As shown in FIG. 6C , the storage element SE_2 includes a write transistor WT_2 and a read transistor RT_2. In the storage element SE_2, only the write transistor WT_2 is a critical voltage adjustable transistor. For example, the write transistor WT_2 has a charge storage layer or a ferroelectric layer in its gate stack, and the read transistor RT_2 does not have any charge storage layer or any ferroelectric layer. The charge storage layer or the ferroelectric layer is represented by a slash. For example, the charge storage layer is, for example, a SONOS structure or a floating gate, and the ferroelectric layer is, for example, a FeFET structure.

如第6D圖所示,儲存元件SE_3包括一寫入電晶體WT_3及一讀取電晶體RT_3。在儲存元件SE_3中,寫入電晶體WT_3及讀取電晶體RT_3皆不是臨界電壓可調電晶體。舉例來說,寫入電晶體WT_3不具有任何電荷存儲層或任何鐵電層,讀取電晶體RT_3不具有任何電荷存儲層或任何鐵電層。 As shown in FIG. 6D , the storage element SE_3 includes a write transistor WT_3 and a read transistor RT_3. In the storage element SE_3, the write transistor WT_3 and the read transistor RT_3 are not critical voltage adjustable transistors. For example, the write transistor WT_3 does not have any charge storage layer or any ferroelectric layer, and the read transistor RT_3 does not have any charge storage layer or any ferroelectric layer.

在臨界電壓可調電晶體所實現的2T0C結構中,漏電流及導通電流可以調整,且可以獲得許多優點。舉例來說,如第5A圖所示,當寫入電晶體WT0、WT1的漏電流Iwk被調整的較低,儲存於儲存節點SN、SN’之電壓可以維持得很好。此外,如第5B圖所示,當讀取電晶體RT0、RT1的導通電流被調整的較高,匹配線ML的電壓下拉會變得比較明顯,且可增加搜尋速度。當讀取 電晶體RT0、RT1的啟動/關閉比率被調整的的較大,則可適用於長字串的搜尋。 In the 2T0C structure implemented by the critical voltage adjustable transistor, the leakage current and the conduction current can be adjusted, and many advantages can be obtained. For example, as shown in Figure 5A, when the leakage current Iwk of the write transistors WT0 and WT1 is adjusted lower, the voltage stored in the storage nodes SN and SN' can be maintained well. In addition, as shown in Figure 5B, when the conduction current of the read transistors RT0 and RT1 is adjusted higher, the voltage pull-down of the match line ML becomes more obvious and the search speed can be increased. When the start/stop ratio of the read transistors RT0 and RT1 is adjusted larger, it can be applied to the search of long strings.

再者,在儲存元件SE0、SE1中,儲存資料DT係透過電壓儲存於儲存節點SN、SN’,故動態記憶體內搜尋裝置可以提供無限次的更新頻率。 Furthermore, in the storage elements SE0 and SE1, the storage data DT is stored in the storage nodes SN and SN' through voltage, so the search device in the dynamic memory can provide an unlimited update frequency.

此外,上述之動態記憶體內搜尋裝置10可以採用陣列結構來實現,以進行長字串的搜尋。請參照第7圖,其繪示根據一實施例之動態記憶體內搜尋裝置200。動態記憶體內搜尋裝置200包括數個字元線WWLj、數個位元線WBLi、WBLi’、數個匹配線MLj、數個單位記憶胞UCij、數個搜尋線SLi、SLi’、數個預充電單元CGj、數個感測單元SAj及一解碼器(priority encoder)EC。搜尋資料SR包括數個位元SRi。搜尋資料SR輸入至動態記憶體內搜尋裝置200後,感測單元SAj感測匹配線MLj之電壓,以判定儲存資料DTj是否匹配於搜尋資料SR。請參照第8圖,其繪示匹配線MLj之示例的曲線CV1、CV2、CV3。當儲存資料DTj的所有位元匹配於搜尋資料SR的所有位元,曲線CV1的電壓被維持住,而沒有下拉。 In addition, the above-mentioned dynamic memory internal search device 10 can be implemented using an array structure to search for long strings. Please refer to Figure 7, which shows a dynamic memory internal search device 200 according to an embodiment. The dynamic memory internal search device 200 includes a plurality of word lines WWLj, a plurality of bit lines WBLi, WBLi’, a plurality of matching lines MLj, a plurality of unit memory cells UCij, a plurality of search lines SLi, SLi’, a plurality of pre-charge units CGj, a plurality of sensing units SAj and a decoder (priority encoder) EC. The search data SR includes a plurality of bits SRi. After the search data SR is input to the dynamic memory search device 200, the sensing unit SAj senses the voltage of the matching line MLj to determine whether the storage data DTj matches the search data SR. Please refer to Figure 8, which shows the curves CV1, CV2, and CV3 of the example of the matching line MLj. When all bits of the storage data DTj match all bits of the search data SR, the voltage of the curve CV1 is maintained without being pulled down.

當儲存資料DTj有一個位元不匹配於搜尋資料SR的一對應位元,曲線CV2的電壓被輕微地下拉。 When one bit of the storage data DTj does not match a corresponding bit of the search data SR, the voltage of the curve CV2 is slightly pulled down.

當儲存資料DTj有兩個位元不匹配於搜尋資料SR的對應兩個位元,曲線CV3被大幅下拉。 When two bits of the stored data DTj do not match the corresponding two bits of the search data SR, the curve CV3 is pulled down significantly.

解碼器EC可以根據電壓下拉量來輸出搜尋結果RS。在搜尋結果RS中,儲存資料DTj可以根據匹配程度進行排序。 The decoder EC can output the search result RS according to the voltage pull-down amount. In the search result RS, the stored data DTj can be sorted according to the matching degree.

根據上述實施例,動態記憶體內搜尋裝置係為近似DRAM的一種TCAM(其採用一對2T0C結構與2個搜尋電晶體),以執行記憶體內搜尋的功能。動態記憶體內搜尋裝置100可以提供無限制的更新頻率、快速的搜尋與適合長搜尋字串的開啟/關閉比例(on/off ratio)。單位記憶胞UC係為一6T0C結構。相較於SRAM的TCAM來說,6T0C結構具有較小的面積。本揭露之技術相當適用可於路由器、數據庫搜索、內存數據處理和神經形態計算。 According to the above embodiment, the dynamic in-memory search device is a TCAM similar to DRAM (which uses a pair of 2T0C structures and 2 search transistors) to perform the in-memory search function. The dynamic in-memory search device 100 can provide unlimited update frequency, fast search and on/off ratio suitable for long search strings. The unit memory cell UC is a 6T0C structure. Compared with the TCAM of SRAM, the 6T0C structure has a smaller area. The technology disclosed in this disclosure is very suitable for routers, database searches, memory data processing and neural morphological computing.

綜上所述,雖然本揭露已以實施例揭露如上,然其並非用以限定本揭露。本揭露所屬技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作各種之更動與潤飾。因此,本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 In summary, although the present disclosure has been disclosed as above by the embodiments, it is not intended to limit the present disclosure. Those with ordinary knowledge in the technical field to which the present disclosure belongs can make various changes and modifications without departing from the spirit and scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the scope defined by the attached patent application.

100:動態記憶體內搜尋裝置 100: Dynamic memory in-body search device

CG:預充電單元 CG: Pre-charged unit

DT:儲存資料 DT: Save data

GD:接地端 GD: Ground terminal

ML:匹配線 ML: Matching line

RS:搜尋結果 RS:Search results

RT0,RT1:讀取電晶體 RT0,RT1: read transistors

SA:感測單元 SA: Sensing unit

SE0,SE1:儲存元件 SE0, SE1: storage element

SL1,SL1’:搜尋線 SL1,SL1’:Search line

SR:搜尋資料 SR: Search data

ST0,ST1:搜尋電晶體 ST0, ST1: Search transistor

SN,SN’:儲存節點 SN,SN’: storage node

UC:單位記憶胞 UC:Unit memory cell

WBL0,WBL1:位元線 WBL0,WBL1:bit line

WT0,WT1:寫入電晶體 WT0, WT1: write transistor

WWL:字元線 WWL: Character Line

Claims (10)

一種動態記憶體內搜尋裝置(in-dynamic memory search device),包括:至少一字元線;至少二位元線;至少一匹配線;至少一單位記憶胞,包括:二儲存元件,各該儲存元件包括:一寫入電晶體,連接於該字元線及該些位元線之其中之一;及一讀取電晶體,連接於該寫入電晶體及該匹配線;及二搜尋電晶體,分別連接於該些讀取電晶體;至少二搜尋線,分別連接於該些搜尋電晶體;至少一預充電單元,連接於該匹配線;以及至少一感測單元,透過該匹配線連接於各該讀取電晶體之一端。 An in-dynamic memory search device includes: at least one word line; at least two bit lines; at least one match line; at least one unit memory cell, including: two storage elements, each of which includes: a write transistor connected to the word line and one of the bit lines; and a read transistor connected to the write transistor and the match line; and two search transistors connected to the read transistors respectively; at least two search lines connected to the search transistors respectively; at least one precharge unit connected to the match line; and at least one sensing unit connected to one end of each read transistor through the match line. 如請求項1所述之動態記憶體內搜尋裝置,其中各該儲存元件包括一儲存節點,各該儲存節點位於各該寫入電晶體與各該讀取電晶體之間,該單位記憶胞儲存一儲存資料之一位元於該些儲存節點。 The dynamic memory search device as described in claim 1, wherein each storage element includes a storage node, each storage node is located between each write transistor and each read transistor, and the unit memory cell stores a bit of storage data in the storage nodes. 如請求項2所述之動態記憶體內搜尋裝置,其中藉由導通該些寫入電晶體,該儲存資料寫入該些儲存節點。 A dynamic memory search device as described in claim 2, wherein the storage data is written into the storage nodes by turning on the write transistors. 如請求項1所述之動態記憶體內搜尋裝置,其中在各該儲存元件中,該寫入電晶體及該讀取電晶體皆為臨界電壓可調電晶體(threshold voltage tunable transistor)。 The dynamic memory search device as described in claim 1, wherein in each of the storage elements, the write transistor and the read transistor are both threshold voltage tunable transistors. 如請求項1所述之動態記憶體內搜尋裝置,其中在各該儲存元件中,該寫入電晶體及該讀取電晶體之其中之一為一臨界電壓可調電晶體(threshold voltage tunable transistor)。 A dynamic memory search device as described in claim 1, wherein in each of the storage elements, one of the write transistor and the read transistor is a threshold voltage tunable transistor. 如請求項1所述之動態記憶體內搜尋裝置,其中該些讀取電晶體之其中之一與該些搜尋電晶體之其中之一串連於該匹配線與一接地端之間。 A dynamic memory in-body search device as described in claim 1, wherein one of the read transistors and one of the search transistors are connected in series between the matching line and a ground terminal. 一種動態記憶體內搜尋裝置之操作方法,其中該動態記憶體內搜尋裝置包括至少一字元線、至少二位元線、至少一匹配線、至少一單位記憶胞及二搜尋電晶體,該單位記憶胞包括二儲存元件及二搜尋電晶體,各該儲存元件包括一寫入電晶體及一讀取電晶體,該寫入電晶體連接於該字元線及該些位元線之其中之一,該讀取電晶體連接於該寫入電晶體,各該讀取電晶體之一端透過該匹配線連接於該感測單元,該操作方法包括:寫入一儲存資料至該單位記憶胞; 對該匹配線預充電;輸入一搜尋資料至該些搜尋線;以及感測該匹配線之一電壓,以判定該搜尋資料與該儲存資料是否匹配。 An operation method of a dynamic memory search device, wherein the dynamic memory search device includes at least one word line, at least two bit lines, at least one matching line, at least one unit memory cell and two search transistors, the unit memory cell includes two storage elements and two search transistors, each of the storage elements includes a write transistor and a read transistor, the write transistor is connected to the word line and the bit lines. One of the bit lines, the read transistor is connected to the write transistor, one end of each read transistor is connected to the sensing unit through the matching line, and the operation method includes: writing a storage data to the unit memory cell; precharging the matching line; inputting a search data to the search lines; and sensing a voltage of the matching line to determine whether the search data matches the storage data. 如請求項7所述之動態記憶體內搜尋裝置之操作方法,其中各該儲存元件包括一儲存節點,各該儲存節點位於各該寫入電晶體與各該讀取電晶體之間,在寫入該儲存資料至該單位記憶胞之步驟中,該儲存資料之一位元儲存於該些儲存節點。 The method for operating a dynamic memory search device as described in claim 7, wherein each storage element includes a storage node, each storage node is located between each write transistor and each read transistor, and in the step of writing the storage data into the unit memory cell, one bit of the storage data is stored in the storage nodes. 如請求項7所述之動態記憶體內搜尋裝置之操作方法,其中在寫入該儲存資料至該單位記憶胞之步驟中,藉由導通該些寫入電晶體,以寫入該儲存資料至該些儲存節點。 The method for operating a dynamic memory search device as described in claim 7, wherein in the step of writing the storage data into the unit memory cell, the storage data is written into the storage nodes by turning on the write transistors. 如請求項7所述之動態記憶體內搜尋裝置之操作方法,其中在感測該匹配線之該電壓的步驟中,當該匹配線之該電壓維持,則判定該搜尋資料與該儲存資料匹配。 The method for operating a dynamic memory in-body search device as described in claim 7, wherein in the step of sensing the voltage of the match line, when the voltage of the match line is maintained, it is determined that the search data matches the stored data.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6944038B2 (en) * 2002-09-20 2005-09-13 Stmicroelectronics S.R.L. Non-volatile NOR-type CAM memory
US7057912B2 (en) * 2003-05-28 2006-06-06 Hitachi, Ltd. Semiconductor device
US7319608B2 (en) * 2005-06-30 2008-01-15 International Business Machines Corporation Non-volatile content addressable memory using phase-change-material memory elements
USRE41351E1 (en) * 2000-05-18 2010-05-25 Netlogic Microsystems, Inc. CAM arrays having CAM cells therein with match line and low match line connections and methods of operating same
TWI763266B (en) * 2020-01-24 2022-05-01 台灣積體電路製造股份有限公司 Memory device, data processing device, and data processing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE41351E1 (en) * 2000-05-18 2010-05-25 Netlogic Microsystems, Inc. CAM arrays having CAM cells therein with match line and low match line connections and methods of operating same
US6944038B2 (en) * 2002-09-20 2005-09-13 Stmicroelectronics S.R.L. Non-volatile NOR-type CAM memory
US7057912B2 (en) * 2003-05-28 2006-06-06 Hitachi, Ltd. Semiconductor device
US7319608B2 (en) * 2005-06-30 2008-01-15 International Business Machines Corporation Non-volatile content addressable memory using phase-change-material memory elements
TWI763266B (en) * 2020-01-24 2022-05-01 台灣積體電路製造股份有限公司 Memory device, data processing device, and data processing method

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