TWI850615B - Multilayer glass ceramic dielectric material, sintered body, method for manufacturing sintered body, and high frequency circuit component - Google Patents
Multilayer glass ceramic dielectric material, sintered body, method for manufacturing sintered body, and high frequency circuit component Download PDFInfo
- Publication number
- TWI850615B TWI850615B TW111101685A TW111101685A TWI850615B TW I850615 B TWI850615 B TW I850615B TW 111101685 A TW111101685 A TW 111101685A TW 111101685 A TW111101685 A TW 111101685A TW I850615 B TWI850615 B TW I850615B
- Authority
- TW
- Taiwan
- Prior art keywords
- outer layer
- sintered body
- inner layer
- sintering
- thermal expansion
- Prior art date
Links
- 239000003989 dielectric material Substances 0.000 title claims abstract description 33
- 239000002241 glass-ceramic Substances 0.000 title claims description 23
- 238000000034 method Methods 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000919 ceramic Substances 0.000 claims abstract description 39
- 238000005245 sintering Methods 0.000 claims abstract description 30
- 239000000463 material Substances 0.000 claims abstract description 16
- 239000005340 laminated glass Substances 0.000 claims abstract description 12
- 239000000843 powder Substances 0.000 claims description 62
- 239000011521 glass Substances 0.000 claims description 55
- 239000010433 feldspar Substances 0.000 claims description 14
- 239000013078 crystal Substances 0.000 claims description 7
- 239000011159 matrix material Substances 0.000 claims description 4
- LGERWORIZMAZTA-UHFFFAOYSA-N silicon zinc Chemical compound [Si].[Zn] LGERWORIZMAZTA-UHFFFAOYSA-N 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 124
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 239000004020 conductor Substances 0.000 description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- 238000002425 crystallisation Methods 0.000 description 8
- 230000008025 crystallization Effects 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- 238000010304 firing Methods 0.000 description 7
- 238000013001 point bending Methods 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 5
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 4
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 4
- 229910052788 barium Inorganic materials 0.000 description 4
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 4
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium monoxide Inorganic materials [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- NWXHSRDXUJENGJ-UHFFFAOYSA-N calcium;magnesium;dioxido(oxo)silane Chemical compound [Mg+2].[Ca+2].[O-][Si]([O-])=O.[O-][Si]([O-])=O NWXHSRDXUJENGJ-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 229910052637 diopside Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- 229910021532 Calcite Inorganic materials 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical group CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 229960002380 dibutyl phthalate Drugs 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- 229910021489 α-quartz Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/16—Compositions for glass with special properties for dielectric glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B18/00—Layered products essentially comprising ceramics, e.g. refractory products
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/025—Electric or magnetic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/027—Thermal properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/108—Forming porous, sintered or foamed beads
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C12/00—Powdered glass; Bead compositions
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/16—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/16—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay
- C04B35/18—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay rich in aluminium oxide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/08—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances quartz; glass; glass wool; slag wool; vitreous enamels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/12—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances ceramics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Structural Engineering (AREA)
- Dispersion Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Inorganic Insulating Materials (AREA)
Abstract
本發明提供一種於20 GHz以上之高頻區域中,具有低介電特性及高機械強度之積層玻璃陶瓷介電體材料、燒結體及高頻用電路構件。 本發明之積層玻璃陶瓷介電體材料之特徵在於,其具有至少依外層、內層、外層之順序積層之積層構造,上述外層包含燒結後之測定溫度為25℃、頻率為28 GHz時之相對介電常數成為5.5以下之材料,且上述內層包含燒結後之熱膨脹係數變得高於上述外層之燒結後之熱膨脹係數之材料。 The present invention provides a laminated glass ceramic dielectric material, a sintered body and a high frequency circuit component having low dielectric properties and high mechanical strength in a high frequency region above 20 GHz. The laminated glass ceramic dielectric material of the present invention is characterized in that it has a laminated structure in which at least an outer layer, an inner layer and an outer layer are laminated in the order of an outer layer, the outer layer comprises a material having a relative dielectric constant of 5.5 or less at a measured temperature of 25°C and a frequency of 28 GHz after sintering, and the inner layer comprises a material having a thermal expansion coefficient after sintering that becomes higher than the thermal expansion coefficient of the outer layer after sintering.
Description
本發明係關於一種在20 GHz以上之高頻區域中,具有對信號處理有利之較低之介電常數及較高之機械強度的積層玻璃陶瓷介電體材料、燒結體及高頻用電路構件。The present invention relates to a laminated glass ceramic dielectric material, a sintered body and a high frequency circuit component having a lower dielectric constant and a higher mechanical strength which are advantageous for signal processing in a high frequency region above 20 GHz.
氧化鋁陶瓷被廣泛用作配線基板或電路零件。氧化鋁陶瓷因其相對介電常數較高,為10,故存在信號處理之速度較慢之缺點。又,因導體材料必須使用高熔點之鎢,故亦存在導體損耗變高之缺點。Alumina ceramics are widely used as wiring boards or circuit components. Alumina ceramics have a relatively high relative dielectric constant of 10, so they have the disadvantage of slow signal processing speed. In addition, since the conductor material must use tungsten with a high melting point, there is also a disadvantage of high conductor loss.
為了彌補上述缺點,正在開發包含玻璃粉末及陶瓷粉末之玻璃陶瓷介電體材料,其燒結體被用作介電體層。例如,使用包含鹼式硼矽酸玻璃之玻璃粉末的玻璃陶瓷介電體材料之燒結體之相對介電常數為6~8,低於氧化鋁陶瓷材料之相對介電常數。又,因可於1000℃以下之溫度下燒成,故具有可與導體損耗較低之Ag、Cu等低熔點之金屬材料同時燒成,可將該等用作內層導體之優點(參照專利文獻1及2)。 [先前技術文獻] [專利文獻] In order to remedy the above shortcomings, glass-ceramic dielectric materials containing glass powder and ceramic powder are being developed, and their sintered bodies are used as dielectric layers. For example, the relative dielectric constant of the sintered body of the glass-ceramic dielectric material using glass powder containing alkaline borosilicate glass is 6 to 8, which is lower than the relative dielectric constant of the alumina ceramic material. In addition, because it can be sintered at a temperature below 1000°C, it has the advantage of being able to be sintered simultaneously with low-melting-point metal materials such as Ag and Cu with low conductor loss, and these can be used as inner conductors (see patent documents 1 and 2). [Prior art document] [Patent document]
[專利文獻1]日本專利特開平11-116272號 [專利文獻2]日本專利特開平9-241068號 [專利文獻3]日本專利特開昭60-136294號 [Patent document 1] Japanese Patent No. 11-116272 [Patent document 2] Japanese Patent No. 9-241068 [Patent document 3] Japanese Patent No. 60-136294
[發明所欲解決之問題][The problem the invention is trying to solve]
然而,近年來,於5G(fifth-generation,第五代行動通訊技術)所代表之行動通訊機器、WiFi等區域網路通訊領域中,所利用之頻帶較高,為20 GHz以上,於此種高頻區域中,強烈要求玻璃陶瓷介電體材料進一步低介電常數化。However, in recent years, in the field of mobile communication devices represented by 5G (fifth-generation) and local area network communications such as WiFi, the frequency band used is higher, above 20 GHz. In this high-frequency area, there is a strong demand for glass-ceramic dielectric materials to have a further lower dielectric constant.
電磁波於電子線路中之傳輸損耗與電路基板之介電常數之平方根、介電損耗正切、電磁波之頻率之積成正比。專利文獻1及2中所揭示之玻璃陶瓷介電體材料因燒結體之相對介電常數為6~8,相對於要求值不夠低,故存在傳輸損耗變大之問題。又,介電常數較低之玻璃陶瓷介電體材料之燒結體之機械強度較低,在將元件安裝於基板之過程中發生過產生破裂、龜裂等異常情況。The transmission loss of electromagnetic waves in electronic circuits is proportional to the product of the square root of the dielectric constant of the circuit substrate, the dielectric loss tangent, and the frequency of the electromagnetic waves. The glass-ceramic dielectric materials disclosed in Patent Documents 1 and 2 have a problem of increased transmission loss because the relative dielectric constant of the sintered body is 6 to 8, which is not low enough compared to the required value. In addition, the mechanical strength of the sintered body of the glass-ceramic dielectric material with a lower dielectric constant is lower, and abnormal conditions such as cracks and crazing have occurred during the process of mounting components on the substrate.
為了克服上述問題,提出了使低介電常數層與高強度層複合化,兼顧傳輸損耗之降低與基板之高強度化(參照專利文獻3)。In order to overcome the above problems, it has been proposed to combine a low dielectric constant layer with a high strength layer to achieve both a reduction in transmission loss and a high strength of the substrate (see Patent Document 3).
然而,專利文獻3所揭示之介電體材料存在強度不夠充分之問題。However, the dielectric material disclosed in Patent Document 3 has the problem of insufficient strength.
本發明之目的係提供一種於20 GHz以上之高頻區域中,具有低介電特性及高機械強度之積層玻璃陶瓷介電體材料、燒結體及高頻用電路構件。 [解決問題之技術手段] The purpose of the present invention is to provide a multilayer glass ceramic dielectric material, a sintered body and a high-frequency circuit component having low dielectric properties and high mechanical strength in the high-frequency region above 20 GHz. [Technical means to solve the problem]
本發明之積層玻璃陶瓷介電體材料之特徵在於,其具有至少依外層、內層、外層之順序積層之積層構造,上述外層包含燒結後之測定溫度為25℃、頻率為28 GHz時之相對介電常數成為5.5以下之材料,且上述內層包含燒結後之熱膨脹係數變得高於上述外層之燒結後之熱膨脹係數之材料。The laminated glass ceramic dielectric material of the present invention is characterized in that it has a laminated structure in which at least an outer layer, an inner layer, and an outer layer are laminated in the order of one another, wherein the outer layer comprises a material having a relative dielectric constant of 5.5 or less when the measured temperature is 25°C and the frequency is 28 GHz after sintering, and the inner layer comprises a material having a thermal expansion coefficient after sintering that is higher than the thermal expansion coefficient of the outer layer after sintering.
此處,「測定溫度為25℃、頻率為28 GHz時之相對介電常數」係將於900℃下緻密地燒結之燒結體作為測定試樣而進行測定。「熱膨脹係數」係將於900℃下緻密地燒結之燒結體作為測定試樣,於30~380℃之溫度範圍內測定之平均值。又,「內層」與「外層」係異種材料。並且,「內層」與「外層」各自並不限於包含一層者,亦可為積層有包含大致同種材料之複數層者。再者,大致同種材料係指燒成後之熱膨脹係數之差為1 ppm/K以下之材料。又,大致同種材料之積層體於燒結後會一體化,成為單一層。該情形時之「熱膨脹係數」係指使大致同種材料之積層體於900℃下緻密地燒結的燒結體之熱膨脹係數。再者,就切實地享有本發明之效果之觀點而言,較佳為除「內層」及「外層」以外不具有異種層者,但於本發明中,並不完全排除於外層之內側進而具備異種層之情況。Here, the "relative dielectric constant at a measurement temperature of 25°C and a frequency of 28 GHz" is measured by using a sintered body densely sintered at 900°C as a measurement sample. The "thermal expansion coefficient" is an average value measured by using a sintered body densely sintered at 900°C as a measurement sample in a temperature range of 30 to 380°C. In addition, the "inner layer" and the "outer layer" are different materials. Furthermore, the "inner layer" and the "outer layer" are not limited to one layer each, but may be a plurality of layers stacked with substantially the same material. Furthermore, substantially the same material refers to a material whose difference in thermal expansion coefficient after sintering is less than 1 ppm/K. Furthermore, the laminate of substantially the same material will be integrated into a single layer after sintering. The "thermal expansion coefficient" in this case refers to the thermal expansion coefficient of the sintered body of the laminate of substantially the same material sintered densely at 900°C. Furthermore, from the perspective of effectively enjoying the effects of the present invention, it is preferred that there are no heterogeneous layers other than the "inner layer" and the "outer layer", but in the present invention, the situation of having a heterogeneous layer inside the outer layer is not completely excluded.
又,於本發明之積層玻璃陶瓷介電體材料中,測定溫度為25℃、頻率為28 GHz時之燒成後之外層之相對介電常數為5.5以下。藉此,可確保燒結體之較低之介電特性。In addition, in the laminated glass ceramic dielectric material of the present invention, the relative dielectric constant of the outer layer after sintering at a temperature of 25°C and a frequency of 28 GHz is measured to be less than 5.5. Thus, the lower dielectric properties of the sintered body can be ensured.
進而,於本發明之積層玻璃陶瓷介電體材料中,內層包含燒結後之熱膨脹係數變得高於外層之燒結後之熱膨脹係數之材料。藉此,能夠使燒成時之內層之熱收縮量大於外層之熱收縮量。其結果,燒結體之正面及背面之表層附近變得容易產生壓縮應力,可提高燒結體之機械強度。再者,上述壓縮應力值為50~100 MPa。Furthermore, in the laminated glass ceramic dielectric material of the present invention, the inner layer contains a material whose thermal expansion coefficient after sintering becomes higher than the thermal expansion coefficient of the outer layer after sintering. As a result, the thermal contraction of the inner layer during sintering can be greater than the thermal contraction of the outer layer. As a result, compressive stress is easily generated near the surface of the front and back sides of the sintered body, which can improve the mechanical strength of the sintered body. Furthermore, the above-mentioned compressive stress value is 50 to 100 MPa.
於本發明之積層玻璃陶瓷介電體材料中,較佳為上述內層包含燒結後之熱膨脹係數較上述外層之燒結後之熱膨脹係數高1.5 ppm/K以上之材料。In the laminated glass-ceramic dielectric material of the present invention, it is preferred that the inner layer comprises a material whose thermal expansion coefficient after sintering is higher than the thermal expansion coefficient of the outer layer after sintering by at least 1.5 ppm/K.
又,於本發明之積層玻璃陶瓷介電體材料中,較佳為內層至少含有結晶性玻璃粉末。Furthermore, in the multilayer glass-ceramic dielectric material of the present invention, it is preferred that the inner layer contains at least crystalline glass powder.
另一方面,於本發明之積層玻璃陶瓷介電體材料中,較佳為外層至少含有非晶質玻璃粉末。On the other hand, in the laminated glass-ceramic dielectric material of the present invention, it is preferred that the outer layer contains at least amorphous glass powder.
此處,「結晶性玻璃粉末」係指於以900℃燒成時析出結晶之玻璃粉末,「非晶質玻璃粉末」係指於900℃下燒成時不析出結晶之玻璃粉末。於本發明之積層玻璃陶瓷介電體材料中,藉由內層至少含有結晶性玻璃粉末,外層至少含有非晶質玻璃粉末,而在提高機械強度之同時,變得容易以1000℃以下之溫度燒成,因此可將Ag及Cu等低熔點之金屬材料用作內層導體。Here, "crystalline glass powder" refers to glass powder that crystallizes when fired at 900°C, and "amorphous glass powder" refers to glass powder that does not crystallize when fired at 900°C. In the laminated glass ceramic dielectric material of the present invention, the inner layer contains at least crystalline glass powder and the outer layer contains at least amorphous glass powder, thereby improving the mechanical strength and making it easy to fire at a temperature below 1000°C, so that metal materials with low melting points such as Ag and Cu can be used as inner conductors.
本發明之積層玻璃陶瓷介電體材料較佳為以積層坯片之形態供使用。The laminated glass-ceramic dielectric material of the present invention is preferably used in the form of a laminated green sheet.
又,本發明之燒結體較佳為使上述積層玻璃陶瓷介電體材料燒結之燒結體,且從內層之玻璃基質析出選自鈣長石、Sr長石、鋇長石、透輝石及矽鋅礦中之一種以上之結晶。如上所述,藉由規制內層所含之結晶性玻璃中析出之結晶種,可提高燒結體之機械強度。Furthermore, the sintered body of the present invention is preferably a sintered body obtained by sintering the above-mentioned multilayer glass ceramic dielectric material, and crystals selected from one or more of calcite, Sr feldspar, barium feldspar, diopside and silica-zinc ore are precipitated from the glass matrix of the inner layer. As described above, by regulating the crystal seeds precipitated from the crystalline glass contained in the inner layer, the mechanical strength of the sintered body can be improved.
於本發明之燒結體中,測定溫度為25℃、頻率為28 GHz時之外層之相對介電常數較佳為4以下。如上所述,藉由使外層之相對介電常數變低,可於外層進行信號處理。In the sintered body of the present invention, the relative dielectric constant of the outer layer when measured at a temperature of 25° C. and a frequency of 28 GHz is preferably 4 or less. As described above, by lowering the relative dielectric constant of the outer layer, signal processing can be performed in the outer layer.
又,於本發明之燒結體中,較佳為外層實質上不含陶瓷粉末(外層中之陶瓷粉末之含量未達0.5質量%)。Furthermore, in the sintered body of the present invention, it is preferred that the outer layer substantially does not contain ceramic powder (the content of ceramic powder in the outer layer is less than 0.5 mass %).
本發明之燒結體較佳為至少依外層、內層、外層之順序而積層一體化之燒結體,並且,測定溫度為25℃、頻率為28 GHz時之外層之相對介電常數為5.5以下,且內層之熱膨脹係數高於外層之熱膨脹係數。The sintered body of the present invention is preferably a sintered body which is layered and integrated in the order of at least an outer layer, an inner layer, and an outer layer, and the relative dielectric constant of the outer layer is less than 5.5 when measured at a temperature of 25°C and a frequency of 28 GHz, and the thermal expansion coefficient of the inner layer is higher than the thermal expansion coefficient of the outer layer.
於本發明之燒結體之製造方法中,較佳為對上述積層玻璃陶瓷介電體材料進行燒成。In the method for manufacturing a sintered body of the present invention, it is preferred to sinter the above-mentioned laminated glass-ceramic dielectric material.
於本發明之燒結體之製造方法中,較佳為以1000℃以下之溫度對上述積層玻璃陶瓷介電體材料進行燒成。In the method for manufacturing a sintered body of the present invention, it is preferred that the laminated glass-ceramic dielectric material is sintered at a temperature below 1000°C.
本發明之高頻電路構件較佳為具有介電體層之高頻用電路構件,且介電體層為上述燒結體。 [發明之效果] The high-frequency circuit component of the present invention is preferably a high-frequency circuit component having a dielectric layer, and the dielectric layer is the above-mentioned sintered body. [Effect of the invention]
本發明之積層玻璃陶瓷介電體材料於20 GHz以上之高頻區域中,燒結體具有較低之介電特性,燒結體之機械強度較高。因此,本發明之積層玻璃陶瓷介電體材料適宜作為5G通訊等之高頻用電路構件。The multilayer glass ceramic dielectric material of the present invention has a lower dielectric property in the high frequency region above 20 GHz, and the mechanical strength of the sintered body is higher. Therefore, the multilayer glass ceramic dielectric material of the present invention is suitable as a high frequency circuit component for 5G communication, etc.
於本說明書中使用「~」表示之數值範圍意指分別包括「~」前後所記載之數值作為最小值及最大值之範圍。 本發明之積層玻璃陶瓷介電體材料係依外層、內層、外層之順序積層之積層體,尤其是內層含有結晶性玻璃粉末,外層含有非晶質玻璃粉末之積層體較佳。 The numerical range indicated by "~" in this specification means a range including the numerical values recorded before and after "~" as the minimum and maximum values, respectively. The laminated glass ceramic dielectric material of the present invention is a laminated body laminated in the order of outer layer, inner layer, and outer layer, and in particular, the laminated body in which the inner layer contains crystalline glass powder and the outer layer contains amorphous glass powder is preferred.
首先,對內層進行說明。First, the inner layer is described.
構成內層之玻璃粉末較佳為包含於燒成後表現出高於外層之熱膨脹係數之結晶性玻璃粉末。例如較佳為使用具有如下性質之結晶性玻璃粉末,該性質係當燒成時,會析出選自鈣長石、Sr長石、鋇長石、透輝石及矽鋅礦中之一種以上之結晶。析出上述結晶之玻璃陶瓷之熱膨脹係數容易變高,且機械強度較高,因此會容易提高燒結體之機械強度。再者,燒成後之內層玻璃陶瓷之熱膨脹係數於30~380℃下例如為大致6~11 ppm/K。The glass powder constituting the inner layer is preferably a crystalline glass powder that exhibits a higher thermal expansion coefficient than the outer layer after firing. For example, it is preferred to use a crystalline glass powder having the following properties: when fired, one or more crystals selected from calcite, Sr feldspar, barium feldspar, diopside and silica-zinc ore will precipitate. The thermal expansion coefficient of the glass-ceramic that precipitates the above crystals tends to be higher, and the mechanical strength is higher, so it is easy to improve the mechanical strength of the sintered body. Furthermore, the thermal expansion coefficient of the inner layer glass-ceramic after firing is, for example, approximately 6 to 11 ppm/K at 30 to 380°C.
為了進一步提高燒結體之機械強度,較佳為於結晶性玻璃粉末中包含氧化鋁或氧化鋯等高強度陶瓷粉末。於混合高強度陶瓷粉末時,較佳為結晶性玻璃粉末之含量為50~80質量%,高強度陶瓷粉末之含量為20~50質量%,進而較佳為結晶性玻璃粉末之含量為60~75質量%,高強度陶瓷粉末之含量為25~40質量%。當高強度陶瓷粉末之含量過多時,燒結體之緻密化會變得困難。另一方面,當高強度陶瓷粉末過少時,燒結體之機械強度會容易降低。In order to further improve the mechanical strength of the sintered body, it is preferred to include high-strength ceramic powders such as alumina or zirconia in the crystalline glass powder. When mixing the high-strength ceramic powder, it is preferred that the content of the crystalline glass powder is 50-80% by mass, and the content of the high-strength ceramic powder is 20-50% by mass, and further preferably the content of the crystalline glass powder is 60-75% by mass, and the content of the high-strength ceramic powder is 25-40% by mass. When the content of the high-strength ceramic powder is too high, the densification of the sintered body becomes difficult. On the other hand, when the high-strength ceramic powder is too low, the mechanical strength of the sintered body is easily reduced.
作為高強度陶瓷粉末,除氧化鋁、氧化鋯以外,亦可導入其他陶瓷粉末。其他陶瓷粉末例如可使用選自碳化矽、氮化矽及氮化鋁中之一種以上。As high-strength ceramic powder, in addition to aluminum oxide and zirconium oxide, other ceramic powders may also be introduced. For example, other ceramic powders may be one or more selected from silicon carbide, silicon nitride, and aluminum nitride.
內層之結晶化溫度T 1較佳為850~900℃,尤其是870~900℃。當T 1過低時,基板會容易翹曲。另一方面,當T 1過高時,燒成溫度會變高。 The crystallization temperature T1 of the inner layer is preferably 850-900°C, especially 870-900°C. When T1 is too low, the substrate will be easily warped. On the other hand, when T1 is too high, the sintering temperature will become high.
結晶性玻璃粉末之組成根據所要析出之結晶種進行選擇即可。析出鈣長石之結晶性玻璃粉末較佳為以質量%計,含有40~60%之SiO 2、1~20%之Al 2O 3、15~30%之CaO及0~10%之B 2O 3作為玻璃組成。析出Sr系長石之結晶性玻璃粉末較佳為以質量%計,含有20~40%之SiO 2、20~40%之Al 2O 3、10~30%之SrO、10~20%之MgO及0~10%之B 2O 3作為玻璃組成。析出鋇長石之結晶性玻璃粉末較佳為以質量%計,含有35~60%之SiO 2、1~10%之Al 2O 3、20~40%之BaO及10~20%之MgO作為玻璃組成。析出透輝石之結晶性玻璃粉末較佳為以質量%計,含有40~60%之SiO 2、0~10%之Al 2O 3、10~25%之MgO及15~35%之CaO作為玻璃組成。析出矽鋅礦之結晶性玻璃粉末較佳為以質量%計,含有30~60%之SiO 2、10~30%之CaO、10~20%之MgO及10~30%之ZnO作為玻璃組成。 The composition of the crystalline glass powder can be selected according to the crystal seeds to be precipitated. The crystalline glass powder for precipitating calcium feldspar preferably contains 40-60% SiO 2 , 1-20% Al 2 O 3 , 15-30% CaO and 0-10% B 2 O 3 as the glass composition by mass %. The crystalline glass powder for precipitating Sr-based feldspar preferably contains 20-40% SiO 2 , 20-40% Al 2 O 3 , 10-30% SrO, 10-20% MgO and 0-10% B 2 O 3 as the glass composition by mass %. The crystalline glass powder of precipitated barium feldspar preferably contains, by mass%, 35-60% SiO 2 , 1-10% Al 2 O 3 , 20-40% BaO and 10-20% MgO as glass compositions. The crystalline glass powder of precipitated diopside preferably contains, by mass%, 40-60% SiO 2 , 0-10% Al 2 O 3 , 10-25% MgO and 15-35% CaO as glass compositions. The crystalline glass powder of precipitated silicon zinc ore preferably contains, by mass%, 30-60% SiO 2 , 10-30% CaO, 10-20% MgO and 10-30% ZnO as glass compositions.
內層較佳為於燒成後,25℃、28 GHz下之相對介電常數為10以下,尤其是9.5以下。當相對介電常數過高時,信號處理之速度容易變慢。再者,相對介電常數之下限並無特別限定,實際上為5以上。The relative dielectric constant of the inner layer after sintering at 25°C and 28 GHz is preferably less than 10, especially less than 9.5. When the relative dielectric constant is too high, the signal processing speed tends to be slow. In addition, there is no particular lower limit for the relative dielectric constant, and it is actually greater than 5.
又,內層較佳為於燒成後,25℃、28 GHz下之介電損耗正切為0.0040以下,尤其是0.0038以下。當介電損耗正切過高時,傳輸信號之損耗容易變大。再者,介電損耗正切之下限並無特別限定,實際上為0.0005以上。In addition, the dielectric loss tangent of the inner layer is preferably less than 0.0040, especially less than 0.0038 at 25°C and 28 GHz after sintering. When the dielectric loss tangent is too high, the loss of the transmission signal tends to increase. Furthermore, the lower limit of the dielectric loss tangent is not particularly limited, and is actually greater than 0.0005.
繼而,對外層進行說明。Next, the outer layer is described.
外層所含之非晶質玻璃粉末較佳為表現出低於燒成後之內層之熱膨脹係數,且25℃、28 GHz下之相對介電常數為5.5以下,尤其是4以下。又,介電損耗正切較佳為0.0020以下。再者,燒成後之外層為非晶質玻璃陶瓷之情形時之熱膨脹係數於30~380℃下例如為大致5.5~6.5 ppm/K,非晶質玻璃之情形時例如為大致3.5~4.5 ppm/K。The amorphous glass powder contained in the outer layer preferably exhibits a lower thermal expansion coefficient than the inner layer after firing, and the relative dielectric constant at 25°C and 28 GHz is 5.5 or less, especially 4 or less. In addition, the dielectric loss tangent is preferably 0.0020 or less. Furthermore, the thermal expansion coefficient of the outer layer after firing is amorphous glass ceramic, for example, about 5.5 to 6.5 ppm/K at 30 to 380°C, and in the case of amorphous glass, for example, about 3.5 to 4.5 ppm/K.
非晶質玻璃粉末較佳為低膨脹且相對介電常數較低之硼矽酸玻璃,進而較佳為以質量%計,含有70~80%之SiO 2、15~30%之B 2O 3及0.1~5%之Li 2O+Na 2O+K 2O(Li 2O、Na 2O及K 2O之總量)作為玻璃組成。又,Li 2O、Na 2O及K 2O之含量較佳為各自為0~3%。 The amorphous glass powder is preferably a borosilicate glass with low expansion and low relative dielectric constant, and preferably contains 70-80% SiO2 , 15-30% B2O3 and 0.1-5% Li2O + Na2O + K2O (the total amount of Li2O , Na2O and K2O ) as a glass composition by mass%. In addition , the content of Li2O , Na2O and K2O is preferably 0-3% respectively.
為了使相對介電常數進一步變低,亦可於非晶質玻璃粉末中包含相對介電常數為5.5以下,尤其是4以下之低介電常數陶瓷粉末,而於非晶質玻璃粉末之相對介電常數足夠低之情形時,亦可不包含低介電常數陶瓷粉末。於含有低介電常數陶瓷粉末時,較佳為非晶質玻璃粉末之含量為60~80質量%,低介電常數陶瓷粉末之含量為20~40質量%。當低介電常數陶瓷粉末之含量過多時,燒結體之緻密化會變得困難。另一方面,當低介電常數陶瓷粉末過少時,相對介電常數會難以降低。In order to further reduce the relative dielectric constant, a low dielectric constant ceramic powder having a relative dielectric constant of 5.5 or less, especially 4 or less, may be included in the amorphous glass powder. In the case where the relative dielectric constant of the amorphous glass powder is low enough, the low dielectric constant ceramic powder may not be included. When the low dielectric constant ceramic powder is included, it is preferred that the content of the amorphous glass powder is 60-80% by mass and the content of the low dielectric constant ceramic powder is 20-40% by mass. When the content of the low dielectric constant ceramic powder is too high, densification of the sintered body becomes difficult. On the other hand, when the low dielectric constant ceramic powder is too little, the relative dielectric constant is difficult to reduce.
低介電常數陶瓷粉末較佳為20 GHz以上之高頻區域中之相對介電常數為5以下、介電損耗正切為0.0010以下的α-石英、α-方矽石或β-鱗石英。The low dielectric constant ceramic powder is preferably α-quartz, α-knosslite or β-phospho-quartz having a relative dielectric constant of 5 or less and a dielectric loss tangent of 0.0010 or less in a high frequency region above 20 GHz.
外層之軟化點T 2較佳為770~840℃,尤其是790~830℃。當T 2過低時,耐熱性會降低。另一方面,當T 2過高時,燒成溫度會變高。 The softening point T2 of the outer layer is preferably 770-840°C, especially 790-830°C. When T2 is too low, the heat resistance will decrease. On the other hand, when T2 is too high, the sintering temperature will become high.
外層較佳為於燒成後,25℃、28 GHz下之相對介電常數為5.5以下,尤其是4以下。當相對介電常數過高時,信號處理之速度容易變慢。再者,相對介電常數之下限並無特別限定,實際上為2.5以上。The outer layer preferably has a relative dielectric constant of 5.5 or less, especially 4 or less, at 25°C and 28 GHz after sintering. When the relative dielectric constant is too high, the signal processing speed tends to be slow. In addition, there is no particular lower limit for the relative dielectric constant, and it is actually above 2.5.
又,外層較佳為於燒成後,25℃、28 GHz下之介電損耗正切為0.0025以下,尤其是0.0020以下。當介電損耗正切過高時,傳輸信號之損耗容易變大。再者,介電損耗正切之下限並無特別限定,實際上為0.0005以上。In addition, the outer layer preferably has a dielectric loss tangent of 0.0025 or less, and particularly 0.0020 or less, at 25°C and 28 GHz after sintering. When the dielectric loss tangent is too high, the loss of the transmission signal tends to increase. Furthermore, the lower limit of the dielectric loss tangent is not particularly limited, and is actually 0.0005 or more.
繼而,以下敍述本發明之燒結體之製造方法。Next, the method for manufacturing the sintered body of the present invention is described below.
首先,於上述玻璃粉末、或玻璃粉末與陶瓷粉末之混合粉末中,添加特定量之結合劑、塑化劑及溶劑,製備漿料。結合劑例如聚乙烯醇縮丁醛樹脂、甲基丙烯酸樹脂等較為適宜,塑化劑例如鄰苯二甲酸二丁酯等較為適宜,溶劑例如甲苯、甲基乙基酮等較為適宜。First, a specific amount of binder, plasticizer and solvent are added to the glass powder or the mixed powder of glass powder and ceramic powder to prepare a slurry. The binder is preferably polyvinyl butyral resin, methacrylate resin, etc., the plasticizer is preferably dibutyl phthalate, etc., and the solvent is preferably toluene, methyl ethyl ketone, etc.
其次,於藉由刮刀法使上述漿料成型為坯片後,進行乾燥,切斷為特定尺寸,而後實施機械加工,形成導通孔,將例如銀導體或要成為電極之低電阻金屬材料印刷於導通孔及坯片表面。其次,將含有結晶性玻璃粉末之片材配置於內層,將含有非晶質玻璃粉末之片材配置於外層,進行積層,藉由熱壓接合進行一體化,獲得積層坯片。再者,上述積層坯片較佳為內層占整體之1/3以上、尤其是一半以上之厚度。具體而言,上述內層較佳為積層後為0.2~3 mm,上述外層較佳為分別為0.1~1.5 mm。當內層過薄時,難以獲得內層與外層之熱膨脹係數之差所帶來之強度提高的效果。Next, after the slurry is formed into a blank by a scraper method, it is dried, cut into specific sizes, and then mechanically processed to form via holes, and a silver conductor or a low-resistance metal material to be an electrode is printed on the via holes and the surface of the blank. Next, a sheet containing crystalline glass powder is arranged on the inner layer, and a sheet containing amorphous glass powder is arranged on the outer layer, and laminated and integrated by hot pressing to obtain a laminated blank. Furthermore, the thickness of the laminated blank is preferably such that the inner layer accounts for more than 1/3 of the total, especially more than half. Specifically, the inner layer is preferably 0.2 to 3 mm after lamination, and the outer layer is preferably 0.1 to 1.5 mm, respectively. When the inner layer is too thin, it is difficult to achieve the effect of increasing strength due to the difference in thermal expansion coefficients between the inner layer and the outer layer.
內層之結晶化溫度T 1與外層之軟化點T 2之溫度差T 1-T 2較佳為50~120℃,尤其是60~110℃。當T 1-T 2過小時,基板會容易翹曲。另一方面,當T 1-T 2過大時,存在導體之擴散變大之虞。 The temperature difference T 1 -T 2 between the crystallization temperature T 1 of the inner layer and the softening point T 2 of the outer layer is preferably 50-120°C, especially 60-110° C. When T 1 -T 2 is too small, the substrate will be easily warped. On the other hand, when T 1 -T 2 is too large , there is a risk of increased diffusion of the conductor.
進而,當對積層坯片進行燒成時,可獲得燒結體。如此製作之燒結體於內部或表面具備導體或電極。再者,就使用導體損耗較低之Ag、Cu等低熔點之金屬材料之觀點而言,燒成溫度理想的是1000℃以下、尤其是800~950℃之溫度。Furthermore, when the laminated green sheets are fired, a sintered body can be obtained. The sintered body thus produced has a conductor or an electrode inside or on the surface. Furthermore, from the perspective of using a low melting point metal material such as Ag and Cu with low conductor loss, the firing temperature is preferably below 1000°C, especially 800 to 950°C.
再者,亦可採取於燒成前之壓接體之外側兩表面配置氧化鋁等在1000℃以下不收縮之拘束層,不於XY方向上收縮之燒成方法。藉由進行拘束燒成,可防止翹曲、龜裂、層間之剝離。Furthermore, a constraining layer such as aluminum oxide that does not shrink below 1000°C can be placed on the outer surfaces of the press-bonded body before firing, so that the layer does not shrink in the XY direction. By performing constrained firing, warping, cracking, and interlayer peeling can be prevented.
所製作之燒結體較佳為內層之熱膨脹係數高於外層之熱膨脹係數。具體而言,內層之熱膨脹係數與外層之熱膨脹係數之差較佳為1.5 ppm/K以上、1.6 ppm/K以上、尤其是1.7 ppm/K以上,且較佳為10 ppm/K以下、6 ppm/K以下、尤其是5.3 ppm/K以下。熱膨脹係數之差越大,燒結體之正面及背面之表層附近越容易產生壓縮應力,可提高燒結體之機械強度。另一方面,當熱膨脹係數之差過大時,於內層與外層之界面會容易產生剝離。The produced sintered body preferably has a higher thermal expansion coefficient of the inner layer than that of the outer layer. Specifically, the difference between the thermal expansion coefficient of the inner layer and the thermal expansion coefficient of the outer layer is preferably 1.5 ppm/K or more, 1.6 ppm/K or more, and especially 1.7 ppm/K or more, and preferably 10 ppm/K or less, 6 ppm/K or less, and especially 5.3 ppm/K or less. The greater the difference in thermal expansion coefficient, the easier it is to generate compressive stress near the surface of the front and back of the sintered body, which can improve the mechanical strength of the sintered body. On the other hand, when the difference in thermal expansion coefficient is too large, peeling will easily occur at the interface between the inner layer and the outer layer.
所製作之燒結體之三點彎曲強度較佳為300 MPa以上、尤其是310 MPa以上。三點彎曲強度越高,燒結體越難以產生龜裂等。The three-point bending strength of the produced sintered body is preferably 300 MPa or more, and particularly 310 MPa or more. The higher the three-point bending strength, the less likely the sintered body will crack.
本發明之高頻電路構件較佳為具有介電體層之高頻用電路構件,且介電體層為上述燒結體。 本發明之高頻用電路構件可藉由利用配線形成線圈,或將Si系或GaAs系半導體元件之晶片連接於如上所述地製作之燒結體表面上而進行製作。 [實施例] The high-frequency circuit component of the present invention is preferably a high-frequency circuit component having a dielectric layer, and the dielectric layer is the above-mentioned sintered body. The high-frequency circuit component of the present invention can be manufactured by forming a coil using wiring, or by connecting a chip of a Si-based or GaAs-based semiconductor element to the surface of the sintered body manufactured as described above. [Example]
以下,基於實施例,對本發明進行說明。但是,本發明並不限定於以下實施例,以下實施例為例示。Hereinafter, the present invention will be described based on the embodiments. However, the present invention is not limited to the following embodiments, which are merely illustrative.
表1示出了本發明之實施例(試樣No.1~7)及比較例(試樣No.8)。再者,表1中之R 2O係指Li 2O+Na 2O+K 2O。表1中之CTE係指熱膨脹係數。 Table 1 shows the examples (samples No. 1 to 7) and the comparative example (sample No. 8) of the present invention. In Table 1, R 2 O means Li 2 O + Na 2 O + K 2 O. CTE in Table 1 means coefficient of thermal expansion.
[表1]
各試樣如下所述地進行製作。首先,以成為表1中所示之玻璃組成之方式,製備各種氧化物之玻璃原料,均勻地混合後,放入至鉑坩堝中,於1400~1600℃下進行3~8小時熔融,藉由水冷輥使熔融玻璃成形為薄板狀。繼而,將所得之玻璃膜粗粉碎後,加入酒精,藉由球磨機進行濕式粉碎,以平均粒徑成為1.5~3 μm之方式進行分級而獲得玻璃粉末。Each sample was prepared as follows. First, glass raw materials of various oxides were prepared in such a manner as to obtain the glass composition shown in Table 1, and after being uniformly mixed, they were placed in a platinum crucible and melted at 1400-1600°C for 3-8 hours, and the molten glass was formed into a thin plate by a water-cooled roller. Then, the obtained glass film was coarsely crushed, alcohol was added, and wet-crushed by a ball mill, and classified so that the average particle size became 1.5-3 μm to obtain glass powder.
其次,於上述玻璃粉末中均勻地混合表1中所示之量之陶瓷粉末(平均粒徑2 μm),獲得玻璃陶瓷介電體材料。Next, the glass powder was uniformly mixed with the ceramic powder (average particle size 2 μm) in the amount shown in Table 1 to obtain a glass ceramic dielectric material.
繼而,於所得之玻璃陶瓷介電體材料中添加15質量%之聚乙烯醇縮丁醛作為結合劑,4質量%之鄰苯二甲酸丁苄酯作為塑化劑,及30質量%之甲苯作為溶劑,製備漿料。繼而,藉由刮刀法使上述漿料成型為150 μm之坯片,進行乾燥,切斷為特定尺寸後,內層積層4層,外層積層上下各2層,藉由熱壓接合進行一體化。進而,於900℃下對所得之積層坯片進行1小時燒成,藉此獲得燒結體。Next, 15% by mass of polyvinyl butyral as a binder, 4% by mass of benzyl butyl phthalate as a plasticizer, and 30% by mass of toluene as a solvent were added to the obtained glass ceramic dielectric material to prepare a slurry. Next, the slurry was formed into a 150 μm green sheet by a doctor blade method, dried, cut into a specific size, and then the inner layer was laminated into 4 layers and the outer layer was laminated into 2 layers each, and integrated by hot pressing. Furthermore, the obtained laminated green sheet was sintered at 900°C for 1 hour to obtain a sintered body.
對如此獲得之各試樣鑑定結晶相,評價相對介電常數、介電損耗正切、內層與外層之熱膨脹係數差、燒結體之三點彎曲強度及內層之結晶化溫度T 1與外層之軟化點T 2之差。將其結果示於表1。 The crystal phase of each sample obtained in this way was identified, and the relative dielectric constant, dielectric loss tangent, difference in thermal expansion coefficient between the inner layer and the outer layer, three-point bending strength of the sintered body, and difference between the crystallization temperature T1 of the inner layer and the softening point T2 of the outer layer were evaluated. The results are shown in Table 1.
結晶相係藉由粉末X射線繞射進行鑑定。The crystalline phase was identified by powder X-ray diffraction.
相對介電常數及介電損耗正切係以900℃使成型為坯片者燒結後,加工為25 mm×50 mm×0.1 mm之大小,製成測定試樣後,基於精密陶瓷基板之微波介電特性之測定方法(JIS R1641),於測定溫度25℃、頻率28 GHz下測得。The relative dielectric constant and dielectric loss tangent were obtained by sintering the green sheets at 900°C and processing them into a size of 25 mm × 50 mm × 0.1 mm to make test specimens. The specimens were then measured at a temperature of 25°C and a frequency of 28 GHz based on the method for determining the microwave dielectric properties of precision ceramic substrates (JIS R1641).
內層與外層之熱膨脹係數之差(內層CTE-外層CTE)係於30~380℃之溫度範圍內,藉由熱機械分析裝置對以900℃分別燒結之內層及外層進行測定而算出。The difference in thermal expansion coefficient between the inner layer and the outer layer (inner layer CTE - outer layer CTE) was calculated by measuring the inner layer and the outer layer sintered at 900°C in the temperature range of 30 to 380°C using a thermomechanical analysis device.
三點彎曲強度係依據JIS R1601進行評價。The three-point bending strength is evaluated according to JIS R1601.
內層之結晶化溫度T 1及外層之軟化點T 2係使用大型示差熱分析計進行測定。具體而言,使用大型示差熱分析計以10℃/分鐘之升溫速度至1050℃,對燒成前之內層及外層進行測定,將測得之圖中第四個反曲點之值設為軟化點,將較強之發熱峰設為結晶化溫度。又,將上述結晶化溫度與軟化點之差以T 1-T 2之形式算出。 The crystallization temperature T1 of the inner layer and the softening point T2 of the outer layer were measured using a large differential thermal analyzer. Specifically, the inner layer and the outer layer before sintering were measured using a large differential thermal analyzer at a heating rate of 10°C/min to 1050°C. The value of the fourth inflection point in the measured graph was set as the softening point, and the stronger exothermic peak was set as the crystallization temperature. In addition, the difference between the above crystallization temperature and the softening point was calculated in the form of T1 - T2 .
根據表可知,試樣No.1~7因內層與外層之熱膨脹係數之差(內層CTE-外層CTE)為1.8~5.3 ppm/K,故三點彎曲強度較高,為200~380 MPa。又,外層之相對介電常數較低,為3.8~4.0,因此20 GHz以上之頻率下之信號之衰減變少。 According to the table, the difference in thermal expansion coefficient between the inner layer and the outer layer of samples No. 1 to 7 (inner layer CTE - outer layer CTE) is 1.8 to 5.3 ppm/K, so the three-point bending strength is higher, 200 to 380 MPa. In addition, the relative dielectric constant of the outer layer is lower, 3.8 to 4.0, so the attenuation of the signal at frequencies above 20 GHz is reduced.
另一方面,試樣No.8因內層與外層之熱膨脹係數之差(內層CTE-外層CTE)為-2.5 ppm/K,故三點彎曲強度較低,為100 MPa。On the other hand, the difference in thermal expansion coefficient between the inner layer and the outer layer of sample No. 8 (inner layer CTE - outer layer CTE) is -2.5 ppm/K, so the three-point bending strength is lower, which is 100 MPa.
Claims (11)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021-017824 | 2021-02-05 | ||
| JP2021017824 | 2021-02-05 | ||
| JP2021-178627 | 2021-11-01 | ||
| JP2021178627 | 2021-11-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202235269A TW202235269A (en) | 2022-09-16 |
| TWI850615B true TWI850615B (en) | 2024-08-01 |
Family
ID=82741136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111101685A TWI850615B (en) | 2021-02-05 | 2022-01-14 | Multilayer glass ceramic dielectric material, sintered body, method for manufacturing sintered body, and high frequency circuit component |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2022168624A1 (en) |
| KR (1) | KR20230142453A (en) |
| TW (1) | TWI850615B (en) |
| WO (1) | WO2022168624A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102804466B1 (en) * | 2023-11-24 | 2025-05-13 | 솔믹스 주식회사 | Method of Manufacturing Sintered Body and Quartz Glass Parts |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108476593A (en) * | 2016-01-13 | 2018-08-31 | 株式会社村田制作所 | Laminates and Electronic Components |
| WO2020129858A1 (en) * | 2018-12-20 | 2020-06-25 | 株式会社村田製作所 | Laminate, electronic component, and laminate production method |
| CN111801308A (en) * | 2018-03-07 | 2020-10-20 | 日本电气硝子株式会社 | Glass ceramic dielectrics |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09241068A (en) | 1996-03-11 | 1997-09-16 | Sumitomo Metal Ind Ltd | Low temperature firing ceramics substrate |
| JP4748435B2 (en) * | 2001-08-21 | 2011-08-17 | 日本電気硝子株式会社 | Laminated glass ceramic material and laminated glass ceramic sintered body |
| JP4095416B2 (en) * | 2001-11-29 | 2008-06-04 | 京セラ株式会社 | Glass ceramic multilayer wiring board |
| JP2008053525A (en) * | 2006-08-25 | 2008-03-06 | Murata Mfg Co Ltd | Multilayer ceramic substrate and manufacturing method thereof |
| JP5198327B2 (en) * | 2009-02-27 | 2013-05-15 | 京セラ株式会社 | High frequency substrate, transmitter, receiver, transmitter / receiver, and radar device including high frequency substrate |
| KR101203892B1 (en) | 2010-04-19 | 2012-11-23 | 주식회사 에스에프에이 | Laser welding device |
| JP6927252B2 (en) * | 2019-07-08 | 2021-08-25 | Tdk株式会社 | Glass-ceramic sintered body and wiring board |
-
2022
- 2022-01-14 TW TW111101685A patent/TWI850615B/en active
- 2022-01-20 JP JP2022579436A patent/JPWO2022168624A1/ja active Pending
- 2022-01-20 WO PCT/JP2022/002048 patent/WO2022168624A1/en not_active Ceased
- 2022-01-20 KR KR1020237021780A patent/KR20230142453A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108476593A (en) * | 2016-01-13 | 2018-08-31 | 株式会社村田制作所 | Laminates and Electronic Components |
| CN111801308A (en) * | 2018-03-07 | 2020-10-20 | 日本电气硝子株式会社 | Glass ceramic dielectrics |
| WO2020129858A1 (en) * | 2018-12-20 | 2020-06-25 | 株式会社村田製作所 | Laminate, electronic component, and laminate production method |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022168624A1 (en) | 2022-08-11 |
| JPWO2022168624A1 (en) | 2022-08-11 |
| KR20230142453A (en) | 2023-10-11 |
| TW202235269A (en) | 2022-09-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5079194A (en) | Crystal growth inhibitor for glassy low dielectric inorganic composition | |
| CN109206124B (en) | Low-temperature co-fired ceramic dielectric material and preparation method thereof | |
| US5316985A (en) | Suppression of crystal growth in low dielectric inorganic composition using ultrafine alumina | |
| JP7348587B2 (en) | glass ceramic dielectric | |
| JPH04231363A (en) | Dielectric composition containing cordierite and glass | |
| JP2003342063A (en) | Glass ceramic composition, glass ceramics and ceramic multilayer substrate | |
| US6649550B2 (en) | Glass ceramics dielectric material and sintered glass ceramics | |
| TWI850615B (en) | Multilayer glass ceramic dielectric material, sintered body, method for manufacturing sintered body, and high frequency circuit component | |
| JP7758056B2 (en) | Glass ceramics and electronic components | |
| US11939258B2 (en) | Glass powder, dielectric material, sintered body, and high frequency circuit member | |
| JP2011213570A (en) | Crystalline glass | |
| US5177034A (en) | Gallium crystal growth inhibitor for glassy low dielectric inorganic composition | |
| TW202440486A (en) | Glass ceramic substrate and method for manufacturing glass ceramic substrate | |
| US5270268A (en) | Aluminum borate devitrification inhibitor in low dielectric borosilicate glass | |
| JP7737076B2 (en) | Glass ceramic dielectric material, sintered body, method for producing sintered body, and high frequency circuit component | |
| CN116848594A (en) | Laminated glass ceramic dielectric material, sintered body, method of manufacturing sintered body, and high-frequency circuit component | |
| JP2012051767A (en) | Crystalline glass powder | |
| TWI894449B (en) | Glass ceramic dielectric materials, sintered bodies and high-frequency circuit components | |
| JP7549289B2 (en) | Glass ceramic dielectric materials, sintered bodies and high frequency circuit components | |
| JP2006256956A (en) | Glass ceramic sintered compact and circuit member for microwave | |
| WO2019172042A1 (en) | Glass ceramic dielectric body | |
| CN117222607A (en) | Glass ceramic dielectric material, sintered body, and circuit member for high frequency | |
| CN115724588A (en) | Crystalline glass powder, glass ceramic dielectric material, sintered body, and high-frequency circuit member | |
| JP2023033104A (en) | Crystalline glass powder, glass-ceramic dielectric material, sintered body and high-frequency circuit member | |
| JPH0738214A (en) | Glass-ceramic substrate and manufacturing method thereof |