TWI848823B - Water treatment device, and water treatment method - Google Patents
Water treatment device, and water treatment method Download PDFInfo
- Publication number
- TWI848823B TWI848823B TW112136510A TW112136510A TWI848823B TW I848823 B TWI848823 B TW I848823B TW 112136510 A TW112136510 A TW 112136510A TW 112136510 A TW112136510 A TW 112136510A TW I848823 B TWI848823 B TW I848823B
- Authority
- TW
- Taiwan
- Prior art keywords
- osmosis membrane
- treatment device
- water
- forward osmosis
- treatment
- Prior art date
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- 238000011282 treatment Methods 0.000 title claims abstract description 701
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 536
- 238000000034 method Methods 0.000 title claims abstract description 97
- 239000012528 membrane Substances 0.000 claims abstract description 725
- 238000009292 forward osmosis Methods 0.000 claims abstract description 451
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 217
- 238000002203 pretreatment Methods 0.000 claims abstract description 135
- 238000001223 reverse osmosis Methods 0.000 claims abstract description 132
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 107
- 239000000243 solution Substances 0.000 claims description 295
- 239000007864 aqueous solution Substances 0.000 claims description 106
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 66
- 238000006243 chemical reaction Methods 0.000 claims description 61
- 159000000003 magnesium salts Chemical class 0.000 claims description 56
- 239000002253 acid Substances 0.000 claims description 33
- 239000011780 sodium chloride Substances 0.000 claims description 33
- 238000005342 ion exchange Methods 0.000 claims description 29
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 28
- 239000003456 ion exchange resin Substances 0.000 claims description 27
- 229920003303 ion-exchange polymer Polymers 0.000 claims description 27
- 239000011777 magnesium Substances 0.000 claims description 18
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 17
- 229910052749 magnesium Inorganic materials 0.000 claims description 17
- 239000012141 concentrate Substances 0.000 abstract description 9
- 239000007788 liquid Substances 0.000 description 86
- 239000007800 oxidant agent Substances 0.000 description 68
- -1 hydrogen peroxide Chemical compound 0.000 description 66
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 65
- 239000000203 mixture Substances 0.000 description 65
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- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 61
- 239000000460 chlorine Substances 0.000 description 54
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 53
- 230000000844 anti-bacterial effect Effects 0.000 description 53
- 229910052801 chlorine Inorganic materials 0.000 description 53
- 239000000701 coagulant Substances 0.000 description 51
- 239000003899 bactericide agent Substances 0.000 description 50
- 239000000645 desinfectant Substances 0.000 description 50
- 230000001590 oxidative effect Effects 0.000 description 49
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- 230000015271 coagulation Effects 0.000 description 46
- 239000003513 alkali Substances 0.000 description 43
- 238000000926 separation method Methods 0.000 description 40
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 33
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- CUILPNURFADTPE-UHFFFAOYSA-N hypobromous acid Chemical compound BrO CUILPNURFADTPE-UHFFFAOYSA-N 0.000 description 26
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- 238000010790 dilution Methods 0.000 description 14
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- 230000000855 fungicidal effect Effects 0.000 description 6
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 6
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- 238000001728 nano-filtration Methods 0.000 description 6
- 230000035484 reaction time Effects 0.000 description 6
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 5
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- 238000001704 evaporation Methods 0.000 description 5
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- 239000011261 inert gas Substances 0.000 description 5
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- 238000001179 sorption measurement Methods 0.000 description 5
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 4
- QDHHCQZDFGDHMP-UHFFFAOYSA-N Chloramine Chemical compound ClN QDHHCQZDFGDHMP-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 239000005708 Sodium hypochlorite Substances 0.000 description 4
- 229920006318 anionic polymer Polymers 0.000 description 4
- CODNYICXDISAEA-UHFFFAOYSA-N bromine monochloride Chemical compound BrCl CODNYICXDISAEA-UHFFFAOYSA-N 0.000 description 4
- 229910052791 calcium Inorganic materials 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000010612 desalination reaction Methods 0.000 description 4
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- 229920005597 polymer membrane Polymers 0.000 description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 description 4
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 4
- 150000003871 sulfonates Chemical group 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
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- QNGVNLMMEQUVQK-UHFFFAOYSA-N 4-n,4-n-diethylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1 QNGVNLMMEQUVQK-UHFFFAOYSA-N 0.000 description 2
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- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- QWDJLDTYWNBUKE-UHFFFAOYSA-L magnesium bicarbonate Chemical compound [Mg+2].OC([O-])=O.OC([O-])=O QWDJLDTYWNBUKE-UHFFFAOYSA-L 0.000 description 1
- 229910000022 magnesium bicarbonate Inorganic materials 0.000 description 1
- 235000014824 magnesium bicarbonate Nutrition 0.000 description 1
- 239000002370 magnesium bicarbonate Substances 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 150000002696 manganese Chemical class 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000009285 membrane fouling Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- AMULHDKUJWPBKU-UHFFFAOYSA-L nickel(2+);dichlorite Chemical compound [Ni+2].[O-]Cl=O.[O-]Cl=O AMULHDKUJWPBKU-UHFFFAOYSA-L 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000010525 oxidative degradation reaction Methods 0.000 description 1
- 238000001139 pH measurement Methods 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920001444 polymaleic acid Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 1
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- SATVIFGJTRRDQU-UHFFFAOYSA-N potassium hypochlorite Chemical compound [K+].Cl[O-] SATVIFGJTRRDQU-UHFFFAOYSA-N 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- VISKNDGJUCDNMS-UHFFFAOYSA-M potassium;chlorite Chemical compound [K+].[O-]Cl=O VISKNDGJUCDNMS-UHFFFAOYSA-M 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-M propane-1-sulfonate Chemical compound CCCS([O-])(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-M 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 1
- 229960002218 sodium chlorite Drugs 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 159000000008 strontium salts Chemical class 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 150000008054 sulfonate salts Chemical class 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/04—Feed pretreatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/24—Dialysis ; Membrane extraction
- B01D61/28—Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/58—Multistep processes
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
- C02F1/60—Silicon compounds
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A20/00—Water conservation; Efficient water supply; Efficient water use
- Y02A20/124—Water desalination
- Y02A20/131—Reverse-osmosis
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- Engineering & Computer Science (AREA)
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Abstract
Description
本發明係關於進行包含溶解性二氧化矽及硬度成分中之至少一者之被處理水的處理的水處理裝置及水處理方法。此外,本發明係關於正滲透膜處理方法、正滲透膜處理系統及使用該正滲透膜處理方法、正滲透膜處理系統的水處理方法、水處理系統。The present invention relates to a water treatment device and a water treatment method for treating water to be treated containing at least one of soluble silica and a hardness component. In addition, the present invention relates to a forward osmosis membrane treatment method, a forward osmosis membrane treatment system, and a water treatment method and a water treatment system using the forward osmosis membrane treatment method and the forward osmosis membrane treatment system.
為了減少排水之放流對環境之影響,在進行排水淨化及減容化等之處理後,才進行放流、廢棄之動作。排水處理使用固液分離、膜分離、減壓濃縮等,但排水中含有之溶解性二氧化矽及鈣等之硬度成分不溶化而附著在用於排水處理之配管及裝置等上,發生所謂結垢,因此系統之性能降低是習知的。為了進行有效率之排水處理,必須去除排水中之溶解性二氧化矽及硬度成分等。In order to reduce the impact of wastewater discharge on the environment, it is discharged and disposed of after being treated with wastewater purification and volume reduction. Drainage treatment uses solid-liquid separation, membrane separation, and pressure reduction concentration, but the hardness components such as soluble silica and calcium contained in the wastewater do not dissolve and adhere to the pipes and devices used for wastewater treatment, causing so-called scaling, so it is known that the performance of the system is reduced. In order to carry out efficient wastewater treatment, it is necessary to remove the soluble silica and hardness components in the wastewater.
例如,專利文獻1記載對含有溶解性二氧化矽之排水,在鹼性條件下添加鎂鹽以使溶解性二氧化矽不溶化後固液分離,接著逆滲透膜處理或正滲透膜處理製得之處理水,由排水回收淡水的方法。For example,
正滲透膜處理係透過正滲透膜使供給水及吸引溶液存在,藉此即使未加壓時亦可利用滲透壓使水移動至吸引溶液。接著藉由例如加溫等之手段使稀釋之吸引溶液相變化,藉此可一面取得淡水,一面再利用吸引溶液。The forward osmosis membrane treatment allows the supply water and the draw solution to exist through the forward osmosis membrane, so that even when there is no pressure, the water can be moved to the draw solution by osmotic pressure. Then, the diluted draw solution is phase-changed by means such as heating, so that fresh water can be obtained while the draw solution can be reused.
正滲透膜處理之吸引溶液可使用碳酸銨水溶液、及無機鹽與溫度感應性藥劑之混合物等(請參照專利文獻2)。The attracting solution for the forward osmosis membrane treatment may be an aqueous solution of ammonium carbonate, a mixture of an inorganic salt and a temperature-sensitive agent, etc. (see Patent Document 2).
為了再利用吸引溶液必須施加加溫等以外的能量,且必須追加地具有用以再利用吸引溶液之裝置(請參照圖10),因此造成整體系統之成本增加。In order to reuse the suction solution, energy other than heating must be applied, and an additional device for reusing the suction solution must be provided (see FIG. 10 ), thereby increasing the cost of the entire system.
專利文獻3記載添加鹼劑於含有硬度成分之排水中使其析出(所謂石灰軟化法)、凝集、過濾處理後逆滲透膜處理過濾水的方法,作為硬度成分之去除方法。此外,專利文獻4記載使用離子交換樹脂吸附去除硬度成分之方法(樹脂軟化法)。
但是,在石灰軟化法中必須添加鹼劑,且在樹脂軟化法中為了再生吸附硬度成分之離子交換樹脂,必須通入高濃度鹽水(氯化鈉水溶液),因此需要降低藥品成本。However, in the lime softening method, an alkali must be added, and in the resin softening method, in order to regenerate the ion exchange resin that adsorbs the hardness component, a high-concentration salt water (sodium chloride aqueous solution) must be passed through, so it is necessary to reduce the cost of chemicals.
另一方面,在藉由透過正滲透膜使被處理水與濃度比被處理水高之吸引溶液接觸而製得濃縮水及稀薄吸引溶液的正滲透(FO)膜處理系統中,膜之積垢控制是重要的課題。正滲透膜處理系統之殺菌方法使用次氯酸及氯胺等之氯系殺菌劑、過氧化氫等之氧化劑、或5-氯-2-甲基-4-異噻唑啉-3-酮等之有機系殺菌劑(例如,請參照專利文獻5、6)。On the other hand, in a forward osmosis (FO) membrane treatment system that produces concentrated water and a dilute draw solution by bringing the treated water into contact with a draw solution having a higher concentration than the treated water through a forward osmosis membrane, membrane fouling control is an important issue. The sterilization method of the forward osmosis membrane treatment system uses chlorine-based disinfectants such as hypochlorous acid and chloramine, oxidants such as hydrogen peroxide, or organic disinfectants such as 5-chloro-2-methyl-4-isothiazoline-3-one (for example, see
但是,因為該等殺菌劑(氯系殺菌劑、氧化劑、有機系殺菌劑)會透過正滲透膜,所以殺菌劑之殺菌成分未充分地擴散到正滲透膜處理裝置之出口側,因此產生無法將正滲透膜充分地殺菌之問題。此外,有機系殺菌劑特別會對生物、環境等產生影響。特別在藉由加熱等處理由稀薄吸引溶液中分離生產水並加以利用時,若生產水中含有有機系殺菌劑,則會顯著地限制對工業用途、食品用途、飲用用途等之用途適用性。另外,為了將包含透過正滲透膜之殺菌劑的稀薄吸引溶液的一部份或全部排出至系外,必須去除稀薄吸引溶液的一部份或全部。此外,氯系殺菌劑及氧化劑等使正滲透膜,特別是聚醯胺系逆滲透膜之性能降低,因此藉由逆滲透膜再處理稀薄吸引溶液之一部份或全部時,恐有該等殺菌劑使逆滲透膜之性能降低之虞。 [先前技術文獻] [專利文獻] However, since these disinfectants (chlorine disinfectants, oxidants, organic disinfectants) can pass through the forward osmosis membrane, the disinfectant components are not sufficiently diffused to the outlet side of the forward osmosis membrane treatment device, so the forward osmosis membrane cannot be fully sterilized. In addition, organic disinfectants have a particular impact on organisms, the environment, etc. In particular, when the produced water is separated from the dilute suction solution by heating and other treatments and then used, if the produced water contains organic disinfectants, it will significantly limit the applicability for industrial use, food use, drinking use, etc. In addition, in order to discharge part or all of the dilute draw solution containing the bactericidal agent that has passed through the forward osmosis membrane to the outside of the system, part or all of the dilute draw solution must be removed. In addition, chlorine-based bactericidal agents and oxidants reduce the performance of forward osmosis membranes, especially polyamide reverse osmosis membranes. Therefore, when part or all of the dilute draw solution is reprocessed through the reverse osmosis membrane, there is a risk that the bactericidal agent will reduce the performance of the reverse osmosis membrane. [Prior art literature] [Patent literature]
專利文獻1:國際專利申請公開2013/153587號說明書 專利文獻2:日本特開2017-056424號公報 專利文獻3:日本特開2017-170275號公報 專利文獻4:日本特開2014-231039號公報 專利文獻5:日本特開2015-188787號公報 專利文獻6:日本特開2018-015684號公報 Patent document 1: International Patent Application Publication No. 2013/153587 Patent document 2: Japanese Patent Publication No. 2017-056424 Patent document 3: Japanese Patent Publication No. 2017-170275 Patent document 4: Japanese Patent Publication No. 2014-231039 Patent document 5: Japanese Patent Publication No. 2015-188787 Patent document 6: Japanese Patent Publication No. 2018-015684
[發明所欲解決的問題][The problem the invention is trying to solve]
本發明之目的在於提供一種可用低成本處理包含溶解性二氧化矽及硬度成分中之至少一者的被處理水的水處理裝置及水處理方法。The object of the present invention is to provide a water treatment device and a water treatment method which can treat water to be treated containing at least one of soluble silica and a hardness component at a low cost.
此外,本發明之目的在於提供一種抑制殺菌劑透過正滲透膜且可再利用稀薄吸引溶液之正滲透膜處理方法、正滲透膜處理系統及使用該正滲透膜處理方法、正滲透膜處理系統的水處理方法、水處理系統。 [解決問題之技術手段] In addition, the purpose of the present invention is to provide a forward osmosis membrane treatment method and a forward osmosis membrane treatment system that inhibit the passage of a bactericidal agent through a forward osmosis membrane and can reuse a dilute attracting solution, and a water treatment method and a water treatment system using the forward osmosis membrane treatment method and the forward osmosis membrane treatment system. [Technical means for solving the problem]
本發明係一種水處理裝置,其進行包含溶解性二氧化矽及硬度成分中之至少一者之被處理水的處理,且具有:前處理設備,其具有溶解性二氧化矽去除設備及硬度成分去除設備中之任一者;濃縮處理設備,其濃縮處理藉由前述前處理設備製得之前處理水;及正滲透膜處理設備,其正滲透膜處理藉由前述濃縮處理設備製得之濃縮水,前述前處理設備中使用前述正滲透膜處理設備中使用之稀薄吸引溶液。The present invention is a water treatment device, which treats water to be treated containing at least one of soluble silica and hardness components, and comprises: a pre-treatment device, which has either a soluble silica removal device or a hardness component removal device; a concentration treatment device, which concentrates the pre-treated water obtained by the pre-treatment device; and a forward osmosis membrane treatment device, which uses the concentrated water obtained by the concentration treatment device through forward osmosis membrane treatment, and the pre-treatment device uses the dilute suction solution used in the forward osmosis membrane treatment device.
較佳地,在前述水處理裝置中,前述濃縮處理設備係逆滲透膜處理設備。Preferably, in the aforementioned water treatment apparatus, the aforementioned concentration treatment equipment is a reverse osmosis membrane treatment equipment.
本發明係一種水處理裝置,其進行包含溶解性二氧化矽及硬度成分中之至少一者之被處理水的處理,且具有:前處理設備,其具有溶解性二氧化矽去除設備及硬度成分去除設備中之任一者;第一濃縮處理設備,其濃縮處理藉由前述前處理設備製得之前處理水;正滲透膜處理設備,其正滲透膜處理藉由前述第一濃縮處理設備製得之濃縮水;及第二濃縮處理設備,其濃縮處理前述正滲透膜處理設備中使用之稀薄吸引溶液的一部份,前述前處理設備中使用前述正滲透膜處理設備中使用之稀薄吸引溶液的一部份,且再度使用藉由前述第二濃縮處理設備濃縮之濃縮吸引溶液作為前述正滲透膜處理設備中之吸引溶液。The present invention is a water treatment device, which treats water to be treated containing at least one of soluble silica and hardness components, and comprises: a pre-treatment device, which has either a soluble silica removal device or a hardness component removal device; a first concentration treatment device, which concentrates the pre-treated water obtained by the pre-treatment device; a forward osmosis membrane treatment device, which forward osmosis membrane treatment is performed by the pre-treatment device; The concentrated water produced by the first concentration treatment device; and the second concentration treatment device, which concentrates a part of the dilute attracting solution used in the aforementioned forward osmosis membrane treatment device, uses a part of the dilute attracting solution used in the aforementioned forward osmosis membrane treatment device in the aforementioned pre-treatment device, and reuses the concentrated attracting solution concentrated by the aforementioned second concentration treatment device as the attracting solution in the aforementioned forward osmosis membrane treatment device.
較佳地,在前述水處理裝置中,前述第二濃縮處理設備係使用半透膜之濃縮設備。Preferably, in the water treatment apparatus, the second concentration treatment device is a concentration device using a semipermeable membrane.
較佳地,在前述水處理裝置中,前述第一濃縮處理設備係逆滲透膜處理設備。Preferably, in the aforementioned water treatment apparatus, the aforementioned first concentration treatment equipment is a reverse osmosis membrane treatment equipment.
較佳地,在前述水處理裝置中,前述正滲透膜處理設備中使用之吸引溶液係鎂鹽水溶液,且前述溶解性二氧化矽去除設備中使用前述正滲透膜處理設備中使用之鎂鹽稀薄水溶液。Preferably, in the water treatment apparatus, the draw solution used in the forward osmosis membrane treatment device is a magnesium salt aqueous solution, and the soluble silicon dioxide removal device uses a dilute magnesium salt aqueous solution used in the forward osmosis membrane treatment device.
較佳地,在前述水處理裝置中,更具有調製設備,該調製設備混合氫氧化鎂及酸且在pH7以下使其反應,藉此調製作為前述正滲透膜處理設備中使用之吸引溶液使用的鎂鹽水溶液。Preferably, the water treatment apparatus further comprises a preparation device for mixing magnesium hydroxide and an acid and reacting them at a pH of less than 7 to prepare an aqueous magnesium salt solution for use as a draw solution in the forward osmosis membrane treatment device.
較佳地,在前述水處理裝置中,前述正滲透膜處理設備中使用之吸引溶液係鹼劑水溶液,且前述硬度成分去除設備中使用前述正滲透膜處理設備中使用之鹼劑稀薄水溶液。Preferably, in the water treatment apparatus, the draw solution used in the forward osmosis membrane treatment device is an alkaline aqueous solution, and the hardness component removal device uses a dilute alkaline aqueous solution used in the forward osmosis membrane treatment device.
較佳地,在前述水處理裝置中,前述正滲透膜處理設備中使用之吸引溶液係酸水溶液或氯化鈉水溶液,且前述硬度成分去除設備中使用前述正滲透膜處理設備中使用之酸稀薄水溶液或氯化鈉稀薄水溶液。Preferably, in the water treatment apparatus, the draw solution used in the forward osmosis membrane treatment device is an acid aqueous solution or a sodium chloride aqueous solution, and the hardness component removal device uses the acid dilute aqueous solution or the sodium chloride dilute aqueous solution used in the forward osmosis membrane treatment device.
此外,本發明係一種水處理方法,其進行包含溶解性二氧化矽及硬度成分中之至少一者之被處理水的處理,且包含以下步驟:前處理步驟,其包含溶解性二氧化矽去除步驟及硬度成分去除步驟中之任一者;濃縮處理步驟,濃縮處理藉由前述前處理步驟製得之前處理水;及正滲透膜處理步驟,正滲透膜處理藉由前述濃縮處理步驟製得之濃縮水,在前述前處理步驟中使用前述正滲透膜處理步驟中使用之稀薄吸引溶液。In addition, the present invention is a water treatment method, which treats water to be treated that contains at least one of soluble silica and a hardness component, and includes the following steps: a pre-treatment step, which includes any one of a soluble silica removal step and a hardness component removal step; a concentration treatment step, which concentrates the pre-treated water obtained by the aforementioned pre-treatment step; and a forward osmosis membrane treatment step, which treats the concentrated water obtained by the aforementioned concentration treatment step by forward osmosis membrane, and uses the dilute attracting solution used in the aforementioned forward osmosis membrane treatment step in the aforementioned pre-treatment step.
較佳地,在前述水處理方法中,前述濃縮處理步驟係逆滲透膜處理步驟。Preferably, in the aforementioned water treatment method, the aforementioned concentration treatment step is a reverse osmosis membrane treatment step.
本發明係一種水處理方法,其進行包含溶解性二氧化矽及硬度成分中之至少一者之被處理水的處理,且包含以下步驟:前處理步驟,其包含溶解性二氧化矽去除步驟及硬度成分去除步驟中之任一者;第一濃縮處理步驟,濃縮處理藉由前述前處理步驟製得之前處理水;正滲透膜處理步驟,正滲透膜處理藉由前述第一濃縮處理步驟製得之濃縮水;及第二濃縮處理步驟,濃縮處理前述正滲透膜處理步驟中使用之稀薄吸引溶液的一部份,在前述前處理步驟中使用前述正滲透膜處理步驟中使用之稀薄吸引溶液的一部份,且再度使用藉由前述第二濃縮處理步驟濃縮之濃縮吸引溶液作為前述正滲透膜處理步驟中之吸引溶液。The present invention is a water treatment method, which treats water to be treated containing at least one of soluble silica and hardness components, and comprises the following steps: a pre-treatment step, which comprises either a soluble silica removal step or a hardness component removal step; a first concentration treatment step, in which the pre-treated water is obtained by the concentration treatment in the pre-treatment step; a positive osmosis membrane treatment step, in which the pre-treated water is obtained by the positive osmosis membrane treatment in the pre-treatment step; The concentrated water obtained in the first concentration treatment step; and a second concentration treatment step, concentrating a portion of the dilute attracting solution used in the forward osmosis membrane treatment step, using a portion of the dilute attracting solution used in the forward osmosis membrane treatment step in the pre-treatment step, and reusing the concentrated attracting solution concentrated by the second concentration treatment step as the attracting solution in the forward osmosis membrane treatment step.
較佳地,在前述水處理方法中,前述第二濃縮處理步驟係使用半透膜之濃縮步驟。Preferably, in the water treatment method, the second concentration treatment step is a concentration step using a semipermeable membrane.
較佳地,在前述水處理方法中,前述第一濃縮處理步驟係逆滲透膜處理步驟。Preferably, in the aforementioned water treatment method, the aforementioned first concentration treatment step is a reverse osmosis membrane treatment step.
較佳地,在前述水處理方法中,前述正滲透膜處理步驟中使用之吸引溶液係鎂鹽水溶液,且在前述溶解性二氧化矽去除步驟中使用前述正滲透膜處理步驟中使用之鎂鹽稀薄水溶液。Preferably, in the water treatment method, the draw solution used in the forward osmosis membrane treatment step is an aqueous solution of a magnesium salt, and the dilute aqueous solution of a magnesium salt used in the forward osmosis membrane treatment step is used in the soluble silica removal step.
較佳地,在前述水處理方法中,更具有調製步驟,該調製步驟混合氫氧化鎂及酸且在pH7以下使其反應,藉此調製作為前述正滲透膜處理步驟中使用之吸引溶液使用的鎂鹽水溶液。Preferably, the water treatment method further comprises a preparation step of mixing magnesium hydroxide and an acid and reacting them at a pH below 7 to prepare an aqueous solution of magnesium salt to be used as an attracting solution in the forward osmosis membrane treatment step.
較佳地,在前述水處理方法中,前述正滲透膜處理步驟中使用之吸引溶液係鹼劑水溶液,且在前述硬度成分去除步驟中使用前述正滲透膜處理步驟中使用之鹼劑稀薄水溶液。Preferably, in the water treatment method, the draw solution used in the forward osmosis membrane treatment step is an alkaline aqueous solution, and the alkaline dilute aqueous solution used in the forward osmosis membrane treatment step is used in the hardness component removal step.
較佳地,在前述水處理方法中,前述正滲透膜處理步驟中使用之吸引溶液係酸水溶液或氯化鈉水溶液,且在前述硬度成分去除步驟中使用前述正滲透膜處理步驟中使用之酸稀薄水溶液或氯化鈉稀薄水溶液。Preferably, in the aforementioned water treatment method, the attracting solution used in the aforementioned forward osmosis membrane treatment step is an acid aqueous solution or a sodium chloride aqueous solution, and the aforementioned hardness component removal step uses the acid dilute aqueous solution or the sodium chloride dilute aqueous solution used in the aforementioned forward osmosis membrane treatment step.
本發明係一種正滲透膜處理方法,其包含:藉由透過正滲透膜使被處理水及濃度比前述被處理水高之吸引溶液接觸,製得濃縮水及稀薄吸引溶液的正滲透膜處理步驟,且使包含溴系氧化劑或氯系氧化劑及磺醯胺酸化合物之殺菌劑存在前述被處理水中。The present invention is a forward osmosis membrane treatment method, which includes: a forward osmosis membrane treatment step of making the treated water contact with a draw solution with a higher concentration than the treated water through a forward osmosis membrane to obtain concentrated water and a dilute draw solution, and a bactericide containing a bromine-based oxidant or a chlorine-based oxidant and a sulfonylamine compound is allowed to exist in the treated water.
本發明係一種正滲透膜處理方法,其包含:藉由透過正滲透膜使被處理水及濃度比前述被處理水高之吸引溶液接觸,製得濃縮水及稀薄吸引溶液的正滲透膜處理步驟,且使包含溴系氧化劑及磺醯胺酸化合物之殺菌劑存在前述被處理水中。The present invention is a forward osmosis membrane treatment method, which includes: a forward osmosis membrane treatment step of making the treated water contact with a draw solution with a higher concentration than the treated water through a forward osmosis membrane to obtain concentrated water and a dilute draw solution, and a bactericide containing a bromine oxidant and a sulfonylamine compound is allowed to exist in the treated water.
本發明係一種正滲透膜處理方法,其包含:藉由透過正滲透膜使被處理水及濃度比前述被處理水高之吸引溶液接觸,製得濃縮水及稀薄吸引溶液的正滲透膜處理步驟,且使包含溴及磺醯胺酸化合物之殺菌劑存在前述被處理水中。The present invention is a forward osmosis membrane treatment method, which includes: a forward osmosis membrane treatment step of making the treated water contact with a draw solution with a higher concentration than the treated water through a forward osmosis membrane to obtain concentrated water and a dilute draw solution, and allowing a bactericide containing bromine and sulfonylamine compounds to exist in the treated water.
本發明係一種水處理方法,其包含前述正滲透膜處理方法,且在前述正滲透膜處理步驟之前段中包含前處理步驟及逆滲透膜處理步驟,並且在前述前處理步驟中使用藉由前述正滲透膜處理步驟製得之稀薄吸引溶液。The present invention is a water treatment method, which includes the forward osmosis membrane treatment method, and includes a pre-treatment step and a reverse osmosis membrane treatment step in the preceding stage of the forward osmosis membrane treatment step, and the dilute draw solution obtained by the forward osmosis membrane treatment step is used in the pre-treatment step.
本發明係一種正滲透膜處理系統,其具有:藉由透過正滲透膜使被處理水及濃度比前述被處理水高之吸引溶液接觸,製得濃縮水及稀薄吸引溶液的正滲透膜處理設備,且使包含溴系氧化劑或氯系氧化劑及磺醯胺酸化合物之殺菌劑存在前述被處理水中。The present invention is a forward osmosis membrane treatment system, which has: a forward osmosis membrane treatment device that produces concentrated water and a dilute attracting solution by bringing the water to be treated into contact with an attracting solution having a higher concentration than the water to be treated through a forward osmosis membrane, and a bactericide containing a bromine-based oxidant or a chlorine-based oxidant and a sulfonylamine compound is present in the water to be treated.
本發明係一種正滲透膜處理系統,其具有:藉由透過正滲透膜使被處理水及濃度比前述被處理水高之吸引溶液接觸,製得濃縮水及稀薄吸引溶液的正滲透膜處理設備,且使包含溴系氧化劑及磺醯胺酸化合物之殺菌劑存在前述被處理水中。The present invention is a forward osmosis membrane treatment system, which has: a forward osmosis membrane treatment device that makes the treated water contact with a draw solution with a higher concentration than the treated water through a forward osmosis membrane to produce concentrated water and a dilute draw solution, and a bactericide containing a bromine oxidant and a sulfonylamine compound is present in the treated water.
本發明係一種正滲透膜處理系統,其具有:藉由透過正滲透膜使被處理水及濃度比前述被處理水高之吸引溶液接觸,製得濃縮水及稀薄吸引溶液的正滲透膜處理設備,且使包含溴及磺醯胺酸化合物之殺菌劑存在前述被處理水中。The present invention is a forward osmosis membrane treatment system, which has: a forward osmosis membrane treatment device that makes the treated water contact with a draw solution with a higher concentration than the treated water through a forward osmosis membrane to produce concentrated water and a dilute draw solution, and a bactericide containing bromine and sulfonylamine compounds is present in the treated water.
本發明係一種水處理系統,其具有前述正滲透膜處理系統,且在前述正滲透膜處理設備之前段中具有前處理設備及逆滲透膜處理設備,並且前述前處理設備中使用藉由前述正滲透膜處理設備製得之稀薄吸引溶液。 [發明之效果] The present invention is a water treatment system, which has the aforementioned forward osmosis membrane treatment system, and has a pre-treatment device and a reverse osmosis membrane treatment device in the front section of the aforementioned forward osmosis membrane treatment device, and the aforementioned pre-treatment device uses a dilute suction solution prepared by the aforementioned forward osmosis membrane treatment device. [Effect of the invention]
藉由本發明,可用低成本處理包含溶解性二氧化矽及硬度成分中之至少一者的被處理水。According to the present invention, water to be treated containing at least one of soluble silica and a hardness component can be treated at low cost.
此外,藉由本發明,可提供抑制殺菌劑透過正滲透膜且可再利用稀薄吸引溶液之正滲透膜處理方法、正滲透膜處理系統及使用該正滲透膜處理方法、正滲透膜處理系統的水處理方法、水處理系統。Furthermore, the present invention can provide a forward osmosis membrane treatment method and a forward osmosis membrane treatment system that inhibit the passage of a bactericidal agent through a forward osmosis membrane and that can reuse a dilute draw solution, and a water treatment method and a water treatment system using the forward osmosis membrane treatment method and the forward osmosis membrane treatment system.
以下說明本發明之實施形態。本實施形態係實施本發明之一例,且本發明不限於本實施形態。The following describes an embodiment of the present invention. This embodiment is an example of the present invention, and the present invention is not limited to this embodiment.
以下在圖1中顯示本發明實施形態之一水處理裝置例的概略,且說明其結構。FIG. 1 schematically shows an example of a water treatment device according to an embodiment of the present invention, and explains its structure.
水處理裝置1具有:前處理裝置10,其作為具有溶解性二氧化矽去除設備及硬度成分去除設備中之至少一者的前處理設備;逆滲透膜處理裝置12,其作為濃縮處理藉由前處理裝置10製得之前處理水的濃縮處理設備;及正滲透膜處理裝置14,其作為正滲透膜處理藉由逆滲透膜處理裝置12製得之濃縮水的正滲透膜處理設備。The
圖1之水處理裝置1中,被處理水配管16連接於前處理裝置10之被處理水入口,且前處理裝置10之出口及逆滲透膜處理裝置12之入口藉由前處理水配管18連接。逆滲透膜處理裝置12之濃縮水出口及正滲透膜處理裝置14之濃縮水入口藉由濃縮水配管20連接,且透過水配管22連接於逆滲透膜處理裝置12之透過水出口。吸引溶液配管24連接於正滲透膜處理裝置14之吸引溶液入口,且正滲透膜處理裝置14之稀薄吸引溶液出口及前處理裝置10之稀薄吸引溶液入口藉由稀薄吸引溶液配管26連接,並且FO濃縮水配管28連接於正滲透膜處理裝置14之FO濃縮水出口。In the
以下說明本實施形態之水處理方法及水處理裝置1的動作。The water treatment method and the operation of the
包含溶解性二氧化矽及硬度成分中之至少一者的被處理水通過被處理水配管16輸送至前處理裝置10。在前處理裝置10中,進行溶解性二氧化矽及硬度成分中之至少一者的去除處理(前處理步驟)。The water to be treated containing at least one of soluble silica and hardness components is transported to the
被處理水包含溶解性二氧化矽時,前處理裝置10具有:鎂反應設備,其將鎂鹽添加至被處理水中使其反應,使溶解性二氧化矽不溶化;凝集處理設備,其將凝集劑添加至反應後之被處理水中使其凝集;及固液分離設備,其由凝集處理後之被處理水分離凝集物。前處理裝置10中,在例如鹼條件(例如,pH10至12)下將鎂鹽添加至被處理水中,使溶解性二氧化矽不溶化(鎂反應步驟)。然後,依需要添加凝集劑以進行凝集處理(凝集處理步驟),使凝集物固液分離(固液分離步驟)。接著將藉由固液分離製得之前處理水通過前處理水配管18輸送至逆滲透膜處理裝置12。When the treated water contains soluble silica, the
被處理水包含硬度成分,且藉由石灰軟化法進行硬度成分之去除時,前處理裝置10具有例如:鹼劑反應設備,其將鹼劑添加至被處理水中使其反應,使硬度成分不溶化;凝集處理設備,其依需要將凝集劑添加至反應後之被處理水中使其凝集;及固液分離設備,其由凝集處理後之被處理水分離凝集物。前處理裝置10中,例如將鹼劑添加至被處理水中,使硬度成分不溶化(鹼劑反應步驟)。然後,添加凝集劑以進行凝集處理(凝集處理步驟),使凝集物固液分離(固液分離步驟)。接著將藉由固液分離製得之前處理水通過前處理水配管18輸送至逆滲透膜處理裝置12。When the treated water contains hardness components and the hardness components are removed by lime softening, the
被處理水包含硬度成分,且藉由樹脂軟化法進行硬度成分之去除時,前處理裝置10具有例如使用離子交換樹脂等進行離子交換處理之離子交換處理設備。前處理裝置10中,例如將被處理水通至填充離子交換樹脂作為離子交換處理設備之離子交換塔,並吸附去除硬度成分(離子交換步驟)。接著將藉由離子交換處理製得之前處理水通過前處理水配管18輸送至逆滲透膜處理裝置12。離子交換樹脂需要再生時,藉由通過再生劑再生離子交換樹脂。When the water to be treated contains hardness components and the hardness components are removed by a resin softening method, the
接著,在逆滲透膜處理裝置12中濃縮處理藉由前處理步驟製得之前處理水(濃縮處理步驟)。藉由逆滲透膜處理製得之濃縮水通過濃縮水配管20輸送至正滲透膜處理裝置14,且透過水通過透過水配管22排出。Next, the pre-treatment step is concentrated in the reverse osmosis
在正滲透膜處理裝置14中正滲透膜處理藉由逆滲透膜處理製得之濃縮水(正滲透膜處理步驟)。在正滲透膜處理裝置14中,吸引溶液通過吸引溶液配管24輸送至正滲透膜之二次側,接著透過正滲透膜,使濃縮水及吸引溶液存在,藉此利用滲透壓使水移動至吸引溶液。The concentrated water obtained by the reverse osmosis membrane treatment is treated by the forward osmosis membrane in the forward osmosis membrane treatment device 14 (forward osmosis membrane treatment step). In the forward osmosis
正滲透膜處理步驟中使用之稀薄吸引溶液通過稀薄吸引溶液配管26輸送至前處理裝置10,並在前處理裝置10中在前處理步驟中使用。接著通過FO濃縮水配管28排出藉由正滲透膜處理步驟製得之FO濃縮水。FO濃縮水可回收、再利用。The dilute draw solution used in the forward osmosis membrane treatment step is transported to the
前處理裝置10包含進行溶解性二氧化矽去除之裝置時,例如,可使用鎂鹽水溶液作為正滲透膜處理裝置14中之吸引溶液,且正滲透膜處理裝置14中使用之稀薄吸引溶液(鎂鹽稀薄水溶液)可作為在前處理裝置10中添加之鎂鹽使用。When the
前處理裝置10包含藉由石灰軟化法進行硬度成分之去除的裝置時,可使用例如鹼劑水溶液作為正滲透膜處理裝置14中之吸引溶液,且正滲透膜處理裝置14中使用之稀薄吸引溶液(鹼劑稀薄水溶液)可作為在前處理裝置10中添加之鹼劑使用。When the
前處理裝置10包含藉由樹脂軟化法進行硬度成分之去除的裝置時,例如,可使用酸水溶液或氯化鈉水溶液作為正滲透膜處理裝置14中之吸引溶液,且正滲透膜處理裝置14中使用之稀薄吸引溶液(酸稀薄水溶液或氯化鈉稀薄水溶液)可在前處理裝置10中作為離子交換樹脂之再生劑使用。When the
藉由本實施形態之水處理方法及水處理裝置,可用低成本處理包含溶解性二氧化矽及硬度成分中之至少一者的被處理水。By using the water treatment method and the water treatment apparatus of the present embodiment, water to be treated containing at least one of soluble silica and a hardness component can be treated at low cost.
因為在前處理步驟中使用藉由正滲透膜處理稀釋之稀薄吸引溶液,所以可減少本來需要之再利用吸引溶液的必要成本且不需要再生設備。因為稀薄吸引溶液只是稀釋前處理步驟中本來使用之吸引溶液,所以幾乎不產生追加之成本。Since the dilute draw solution diluted by the positive osmosis membrane is used in the pre-treatment step, the necessary cost of reusing the draw solution that is originally required can be reduced and no regeneration equipment is required. Since the dilute draw solution is only used to dilute the draw solution originally used in the pre-treatment step, there is almost no additional cost.
以下在圖3中顯示本發明實施形態之另一水處理裝置例的概略,且說明其結構。FIG. 3 schematically shows another water treatment device example according to an embodiment of the present invention, and explains its structure.
水處理裝置5具有:前處理裝置10,其作為具有溶解性二氧化矽去除設備及硬度成分去除設備中之至少一者的前處理設備;逆滲透膜處理裝置12,其作為濃縮處理藉由前處理裝置10製得之前處理水的第一濃縮處理設備;正滲透膜處理裝置14,其作為正滲透膜處理藉由逆滲透膜處理裝置12製得之濃縮水的正滲透膜處理設備;及濃縮裝置34,其作為濃縮處理正滲透膜處理裝置14使用之稀薄吸引溶液之一部份的第二濃縮處理設備。The
圖3之水處理裝置5中,被處理水配管16連接於前處理裝置10之被處理水入口,且前處理裝置10之出口及逆滲透膜處理裝置12之入口藉由前處理水配管18連接。逆滲透膜處理裝置12之濃縮水出口及正滲透膜處理裝置14之濃縮水入口藉由濃縮水配管20連接,且透過水配管22連接於逆滲透膜處理裝置12之透過水出口。吸引溶液配管24連接於正滲透膜處理裝置14之吸引溶液入口,且正滲透膜處理裝置14之稀薄吸引溶液出口及前處理裝置10之稀薄吸引溶液入口藉由稀薄吸引溶液配管26連接,並且FO濃縮水配管28連接於正滲透膜處理裝置14之FO濃縮水出口。由稀薄吸引溶液配管26分歧之稀薄吸引溶液配管36連接於濃縮裝置34之入口,且濃縮裝置34之濃縮吸引溶液出口與吸引溶液配管24之中途藉由濃縮吸引溶液配管38連接。稀釋液配管40連接於濃縮裝置34之稀釋液出口。In the
以下說明本實施形態之水處理方法及水處理裝置5的動作。The water treatment method and the operation of the
包含溶解性二氧化矽及硬度成分中之至少一者的被處理水通過被處理水配管16輸送至前處理裝置10。在前處理裝置10中,進行溶解性二氧化矽及硬度成分中之至少一者的去除處理(前處理步驟)。The water to be treated containing at least one of soluble silica and hardness components is transported to the
被處理水包含溶解性二氧化矽時,前處理裝置10具有例如:鎂反應設備,其將鎂鹽添加至被處理水中使其反應,使溶解性二氧化矽不溶化;凝集處理設備,其將凝集劑添加至反應後之被處理水中使其凝集;及固液分離設備,其由凝集處理後之被處理水分離凝集物。前處理裝置10中,在例如鹼條件(例如,pH10至12)下將鎂鹽添加至被處理水中,使溶解性二氧化矽不溶化(鎂反應步驟)。然後,依需要添加凝集劑以進行凝集處理(凝集處理步驟),使凝集物固液分離(固液分離步驟)。接著將藉由固液分離製得之前處理水通過前處理水配管18輸送至逆滲透膜處理裝置12。When the treated water contains soluble silica, the
被處理水包含硬度成分,且藉由石灰軟化法進行硬度成分之去除時,前處理裝置10具有例如:鹼劑反應設備,其將鹼劑添加至被處理水中使其反應,使硬度成分不溶化;凝集處理設備,其依需要將凝集劑添加至反應後之被處理水中使其凝集;及固液分離設備,其由凝集處理後之被處理水分離凝集物。前處理裝置10中,例如將鹼劑添加至被處理水中,使硬度成分不溶化(鹼劑反應步驟)。然後,添加凝集劑以進行凝集處理(凝集處理步驟),使凝集物固液分離(固液分離步驟)。接著將藉由固液分離製得之前處理水通過前處理水配管18輸送至逆滲透膜處理裝置12。When the treated water contains hardness components and the hardness components are removed by lime softening, the
被處理水包含硬度成分,且藉由樹脂軟化法進行硬度成分之去除時,前處理裝置10具有例如使用離子交換樹脂等進行離子交換處理之離子交換處理設備。前處理裝置10中,例如將被處理水通至填充離子交換樹脂作為離子交換處理設備之離子交換塔,並吸附去除硬度成分(離子交換步驟)。接著將藉由離子交換處理製得之前處理水通過前處理水配管18輸送至逆滲透膜處理裝置12。離子交換樹脂需要再生時,藉由通過再生劑再生離子交換樹脂。When the water to be treated contains hardness components and the hardness components are removed by a resin softening method, the
接著,在逆滲透膜處理裝置12中濃縮處理藉由前處理步驟製得之前處理水(第一濃縮處理步驟)。藉由第一濃縮處理(逆滲透膜處理)製得之濃縮水(RO濃縮水)通過濃縮水配管20輸送至正滲透膜處理裝置14,接著通過透過水配管22排出透過水(RO透過水)。Next, the pre-treated water (first concentration treatment step) is obtained by concentration treatment in the reverse osmosis
在正滲透膜處理裝置14中正滲透膜處理藉由第一濃縮處理(逆滲透膜處理)製得之濃縮水(正滲透膜處理步驟)。在正滲透膜處理裝置14中,吸引溶液通過吸引溶液配管24輸送至正滲透膜之二次側,接著透過正滲透膜,使濃縮水及吸引溶液存在,藉此利用滲透壓使水移動至吸引溶液。The concentrated water obtained by the first concentration treatment (reverse osmosis membrane treatment) is treated by the forward osmosis membrane in the forward osmosis membrane treatment device 14 (forward osmosis membrane treatment step). In the forward osmosis
正滲透膜處理步驟中使用之稀薄吸引溶液的一部份通過稀薄吸引溶液配管26輸送至前處理裝置10,接著在前處理裝置10中在前處理步驟中使用。藉由正滲透膜處理步驟製得之FO濃縮水通過FO濃縮水配管28排出。FO濃縮水亦可依需要藉由濃縮裝置及結晶裝置等進一步濃縮、固形化處理。A portion of the dilute draw solution used in the forward osmosis membrane treatment step is transported to the
正滲透膜處理步驟中使用之稀薄吸引溶液的一部份由稀薄吸引溶液配管26分歧並通過稀薄吸引溶液配管36輸送至濃縮裝置34,接著在濃縮裝置34中濃縮處理(第二濃縮處理步驟)。藉由第二濃縮處理製得之濃縮吸引溶液通過濃縮吸引溶液配管38供給至吸引溶液配管24之中途,接著作為正滲透膜處理裝置14中之吸引溶液再度使用。藉由第二濃縮處理製得之稀釋液通過稀釋液配管40排出。稀釋液亦可依需要實施超過濾膜(UF膜)處理、逆滲透膜(RO膜)處理、離子交換處理等後,回收、再利用。A portion of the dilute draw solution used in the forward osmosis membrane treatment step is branched from the dilute
前處理裝置10包含進行溶解性二氧化矽去除之裝置時,例如,可使用鎂鹽水溶液作為正滲透膜處理裝置14中之吸引溶液,且正滲透膜處理裝置14中使用之稀薄吸引溶液(鎂鹽稀薄水溶液)的一部份可作為在前處理裝置10中添加之鎂鹽使用。此外,正滲透膜處理裝置14中使用之稀薄吸引溶液(鎂鹽稀薄水溶液)的一部份可在濃縮裝置34中濃縮處理並作為正滲透膜處理裝置14中之吸引溶液再度使用。When the
前處理裝置10包含藉由石灰軟化法進行硬度成分之去除的裝置時,可使用例如鹼劑水溶液作為正滲透膜處理裝置14中之吸引溶液,且正滲透膜處理裝置14中使用之稀薄吸引溶液(鹼劑稀薄水溶液)的一部份可作為在前處理裝置10中添加之鹼劑使用。此外,正滲透膜處理裝置14中使用之稀薄吸引溶液(鹼劑稀薄水溶液)的一部份可在濃縮裝置34中濃縮處理並作為正滲透膜處理裝置14中之吸引溶液再度使用。When the
前處理裝置10包含藉由樹脂軟化法進行硬度成分之去除的裝置時,例如,可使用酸水溶液或氯化鈉水溶液作為正滲透膜處理裝置14中之吸引溶液,且正滲透膜處理裝置14中使用之稀薄吸引溶液(酸稀薄水溶液或氯化鈉稀薄水溶液)的一部份可在前處理裝置10中作為離子交換樹脂之再生劑使用。此外,正滲透膜處理裝置14中使用之稀薄吸引溶液(酸稀薄水溶液或氯化鈉稀薄水溶液)的一部份可在濃縮裝置34中濃縮處理並作為正滲透膜處理裝置14中之吸引溶液再度使用。When the
藉由本實施形態之水處理方法及水處理裝置,可用低成本處理包含溶解性二氧化矽及硬度成分中之至少一者的被處理水。By using the water treatment method and the water treatment apparatus of the present embodiment, water to be treated containing at least one of soluble silica and a hardness component can be treated at low cost.
因為在前處理步驟中使用藉由正滲透膜處理稀釋之稀薄吸引溶液,所以可減少本來需要之再利用吸引溶液的必要成本且不需要再生設備。因為稀薄吸引溶液只是稀釋前處理步驟中本來使用之吸引溶液,所以幾乎不產生追加之成本。Since the dilute draw solution diluted by the positive osmosis membrane is used in the pre-treatment step, the necessary cost of reusing the draw solution that is originally required can be reduced and no regeneration equipment is required. Since the dilute draw solution is only used to dilute the draw solution originally used in the pre-treatment step, there is almost no additional cost.
藉由正滲透膜處理稀釋之稀薄吸引溶液比在前處理步驟中所需之使用量多時,在前處理步驟中使用正滲透膜處理中使用之稀薄吸引溶液的一部份,接著濃縮未在前處理步驟中使用之稀薄吸引溶液的一部份,並在正滲透膜處理步驟中再度使用作為吸引溶液,藉此可減少稀薄吸引溶液之損失。因為此時濃縮之稀薄吸引溶液係一部份,所以相較於濃縮稀薄吸引溶液之全量再利用,成本可顯著地降低。When the amount of dilute attracting solution diluted by the forward osmosis membrane treatment is larger than the amount required in the pre-treatment step, a portion of the dilute attracting solution used in the forward osmosis membrane treatment is used in the pre-treatment step, and then a portion of the dilute attracting solution not used in the pre-treatment step is concentrated and reused as the attracting solution in the forward osmosis membrane treatment step, thereby reducing the loss of the dilute attracting solution. Since the concentrated dilute attracting solution is only a portion at this time, the cost can be significantly reduced compared to reusing the entire amount of the concentrated dilute attracting solution.
作為本實施形態之水處理方法及水處理裝置之處理對象的被處理水只要是包含溶解性二氧化矽及硬度成分中之至少一者的水即可,沒有特別限制,但可舉例如:工業用水、表層水、自來水、地下水、海水、藉由逆滲透法或蒸發法使海水脫鹽之海水淡化處理水、例如在半導體製程中排出之排水等的各種排水。The water to be treated by the water treatment method and the water treatment device of this embodiment is not particularly limited as long as it contains at least one of soluble silica and hardness components. Examples thereof include industrial water, surface water, tap water, groundwater, seawater, desalinated water obtained by desalinating seawater by reverse osmosis or evaporation, and various types of wastewater such as wastewater discharged during semiconductor manufacturing processes.
被處理水中含有溶解性二氧化矽時,溶解性二氧化矽之濃度係在例如5至400mg/L之範圍內。被處理水中含有硬度成分時,鈣硬度成分之濃度係在例如5至600mg/L之範圍內。被處理水中之全蒸發殘留物(TDS:全部溶解固體量(Total Dissolved Solid)係在例如100至50000mg/L之範圍內。When the treated water contains dissolved silica, the concentration of dissolved silica is, for example, in the range of 5 to 400 mg/L. When the treated water contains hardness components, the concentration of calcium hardness components is, for example, in the range of 5 to 600 mg/L. The total evaporation residue (TDS: Total Dissolved Solid) in the treated water is, for example, in the range of 100 to 50,000 mg/L.
在本實施形態之水處理方法及水處理裝置中,被處理水包含溶解性二氧化矽及硬度成分兩者時,前處理設備(前處理步驟)可具有溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟)及硬度成分去除設備(硬度成分去除步驟)兩者。溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟)及硬度成分去除設備(硬度成分去除步驟)之順序可第一是溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟),第二是硬度成分去除設備(硬度成分去除步驟),或第一是硬度成分去除設備(硬度成分去除步驟),第二是溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟)。In the water treatment method and water treatment apparatus of the present embodiment, when the water to be treated contains both soluble silica and hardness components, the pretreatment device (pretreatment step) may include both a soluble silica removal device (soluble silica removal step) and a hardness component removal device (hardness component removal step). The order of the soluble silica removal device (soluble silica removal step) and the hardness component removal device (hardness component removal step) may be the soluble silica removal device (soluble silica removal step) first and the hardness component removal device (hardness component removal step) second, or the hardness component removal device (hardness component removal step) first and the soluble silica removal device (soluble silica removal step) second.
此時,使用鎂鹽水溶液、鹼劑水溶液、酸水溶液及氯化鈉水溶液中之至少一者作為正滲透膜處理裝置14(正滲透膜處理步驟)中之吸引溶液,且正滲透膜處理裝置14中使用之稀薄吸引溶液(鎂鹽稀薄水溶液、鹼劑稀薄水溶液、酸稀薄水溶液及氯化鈉稀薄水溶液中之至少一者)可使用在前處理裝置10(前處理步驟)之溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟)及硬度成分去除設備(硬度成分去除步驟)中適合的方面。At this time, at least one of a magnesium salt aqueous solution, an alkali aqueous solution, an acid aqueous solution and a sodium chloride aqueous solution is used as the draw solution in the forward osmosis membrane treatment device 14 (forward osmosis membrane treatment step), and the dilute draw solution (at least one of a dilute magnesium salt aqueous solution, a dilute alkali aqueous solution, a dilute acid aqueous solution and a dilute sodium chloride aqueous solution) used in the forward osmosis
在本實施形態之水處理方法及水處理裝置中,可更具有去除被處理水中之濁質成分等的濁質去除設備。濁質去除設備可舉例如:砂過濾裝置、超過濾(UF)膜等之膜過濾裝置、加壓浮選裝置等。濁質去除設備之設置位置沒有特別限制,但濁質去除設備為砂過濾裝置時係例如前處理裝置10(前處理步驟)之前段,且濁質去除設備為膜過濾裝置及加壓浮選裝置等時係在前處理裝置10(前處理步驟)與逆滲透膜處理裝置12(濃縮處理步驟)之間。In the water treatment method and water treatment device of the present embodiment, there may be a turbidity removal device for removing turbidity components in the treated water. The turbidity removal device may be, for example, a sand filter device, a membrane filter device such as an ultrafiltration (UF) membrane, a pressurized flotation device, etc. There is no particular restriction on the location of the turbidity removal device, but when the turbidity removal device is a sand filter device, it is, for example, in the front section of the pre-treatment device 10 (pre-treatment step), and when the turbidity removal device is a membrane filter device and a pressurized flotation device, it is between the pre-treatment device 10 (pre-treatment step) and the reverse osmosis membrane treatment device 12 (concentration treatment step).
[前處理步驟:去除溶解性二氧化矽] 在被處理水包含溶解性二氧化矽時之前處理步驟中,在例如鹼條件下添加鎂鹽至被處理水中,使溶解性二氧化矽不溶化(鎂反應步驟)。 [Pre-treatment step: Removal of dissolved silica] In the pre-treatment step when the treated water contains dissolved silica, magnesium salt is added to the treated water under alkaline conditions, for example, to insolubilize the dissolved silica (magnesium reaction step).
使用之鎂鹽可為氯化鎂(MgCl 2)、硫酸鎂(MgSO 4)等之鎂鹽或其水和物,沒有特別限制,但由抑制因添加硫酸鹽而產生難溶性物質等之觀點來看,以氯化鎂為佳。 The magnesium salt used may be magnesium chloride (MgCl 2 ), magnesium sulfate (MgSO 4 ), or a magnesium salt thereof, without particular limitation. However, magnesium chloride is preferred from the viewpoint of suppressing the generation of insoluble substances due to the addition of sulfate.
鎂反應步驟中之pH只要是鹼性條件即可,沒有特別限制,但可在例如pH10至12之範圍內,在10.5至11.5之範圍內較佳,且在11至11.5之範圍內更佳。鎂反應步驟中之pH小於10或超過12時,二氧化矽去除率會降低。The pH in the magnesium reaction step is not particularly limited as long as it is an alkaline condition, but can be, for example, in the range of
pH調整劑可使用氫氧化鈉、氫氧化鈣等之鹼,亦可依需要使用鹽酸、硫酸等之無機酸。The pH adjuster may be a base such as sodium hydroxide or calcium hydroxide, or an inorganic acid such as hydrochloric acid or sulfuric acid as needed.
鎂反應步驟中之溫度只要是進行二氧化矽之不溶化反應的溫度即可,沒有特別限制,但可在例如1℃至小於50℃之範圍內,且在10℃至小於50℃之範圍內更佳。鎂反應步驟中之溫度小於1℃時,二氧化矽之不溶化反應會不充分,且50℃以上時,處理成本會升高。The temperature in the magnesium reaction step is not particularly limited as long as it is a temperature at which the insolubilization reaction of silicon dioxide is carried out, but it can be, for example, in the range of 1°C to less than 50°C, and more preferably in the range of 10°C to less than 50°C. When the temperature in the magnesium reaction step is less than 1°C, the insolubilization reaction of silicon dioxide will not be sufficient, and when it is above 50°C, the processing cost will increase.
鎂反應步驟中之反應時間只要可進行二氧化矽之不溶化反應即可,沒有特別限制,但可在例如1分至60分之範圍內,且在5至30分之範圍內更佳。鎂反應步驟中之反應時間小於1分時,二氧化矽之不溶化反應會不充分,且超過60分時,反應槽會過大。The reaction time in the magnesium reaction step is not particularly limited as long as the insolubilization reaction of silicon dioxide can be carried out, but it can be, for example, in the range of 1 minute to 60 minutes, and more preferably in the range of 5 to 30 minutes. If the reaction time in the magnesium reaction step is less than 1 minute, the insolubilization reaction of silicon dioxide will be insufficient, and if it exceeds 60 minutes, the reaction tank will be too large.
鎂鹽之添加量相對被處理水中之二氧化矽的重量濃度按鎂濃度計宜在0.1至10倍量之範圍內,且在0.5至5倍量之範圍內更佳。鎂鹽之添加量相對被處理水中之二氧化矽的重量濃度小於0.1倍量時,二氧化矽之不溶化反應會不充分,且超過10倍量時,污泥產生量會過多。The amount of magnesium salt added is preferably in the range of 0.1 to 10 times the weight concentration of silicon dioxide in the treated water, and more preferably in the range of 0.5 to 5 times. When the amount of magnesium salt added is less than 0.1 times the weight concentration of silicon dioxide in the treated water, the insolubilization reaction of silicon dioxide will be insufficient, and when it exceeds 10 times, the amount of sludge generated will be excessive.
為了使溶解性二氧化矽不溶化,除了鎂鹽以外,亦可使用多氯化鋁(PAC)、硫酸鋁等之鋁鹽;氯化鐵、硫酸鐵等之鐵鹽等。由二氧化矽去除率等方面來看,使用鎂鹽較佳。In order to insolubilize soluble silica, in addition to magnesium salts, aluminum salts such as polyaluminum chloride (PAC) and aluminum sulfate, and iron salts such as ferric chloride and ferric sulfate can also be used. From the perspective of silica removal rate, magnesium salts are preferred.
凝集處理步驟係例如在凝集槽中,將無機凝集劑添加至鎂反應後之被處理水中,使不溶化物凝集(凝集步驟)。然後,在凝絮形成槽中,添加高分子凝集劑,接著形成凝絮(凝絮形成步驟)。The coagulation treatment step is, for example, adding an inorganic coagulant to the treated water after the magnesium reaction in a coagulation tank to coagulate the insoluble matter (coagulation step). Then, in a flocculant forming tank, a polymer coagulant is added to form floccules (flocculant forming step).
凝集步驟中使用之無機凝集劑可舉氯化鐵等之鐵系無機凝集劑、多氯化鋁(PAC)等之鋁系無機凝集劑等為例,且由藥品成本及凝集pH範圍等方面來看,鐵系無機凝集劑較佳。Examples of the inorganic coagulant used in the coagulation step include iron-based inorganic coagulants such as ferric chloride and aluminum-based inorganic coagulants such as polyaluminium chloride (PAC). In terms of drug cost and coagulation pH range, iron-based inorganic coagulants are preferred.
無機凝集劑之添加量相對添加之鎂鹽量按重量比宜在0.1至10倍量之範圍內,且在1至5倍量之範圍內更佳。無機凝集劑之添加量相對添加之鎂鹽量按重量比計小於0.1倍量時,凝集會不充分,且超過10倍量時,污泥產生量會過多。The amount of inorganic coagulant added is preferably in the range of 0.1 to 10 times the amount of magnesium salt added, and more preferably in the range of 1 to 5 times. If the amount of inorganic coagulant added is less than 0.1 times the amount of magnesium salt added, the coagulation will be insufficient, and if it exceeds 10 times, the amount of sludge generated will be excessive.
凝集步驟中之pH係在例如3至11之範圍內。凝集步驟中之pH小於3或超過11時,會產生凝集不良。此外,凝集步驟中之pH小於9時,會由凝絮溶出二氧化矽,因此最好在pH9至11之範圍內進行凝集步驟。The pH in the coagulation step is, for example, in the range of 3 to 11. When the pH in the coagulation step is less than 3 or exceeds 11, poor coagulation occurs. In addition, when the pH in the coagulation step is less than 9, silicon dioxide is dissolved from the flocculation, so it is best to perform the coagulation step in the range of pH 9 to 11.
凝集步驟中之溫度係在例如1℃至80℃之範圍內。凝集步驟中之溫度小於1℃或超過80℃時,會產生凝集不良。The temperature in the coagulation step is, for example, in the range of 1° C. to 80° C. When the temperature in the coagulation step is less than 1° C. or exceeds 80° C., poor coagulation may occur.
凝絮形成步驟中使用之高分子凝集劑可舉例如:聚丙烯醯胺系、聚丙烯酸酯系等之陽離子系高分子凝集劑;陰離子系高分子凝集劑;非離子系高分子凝集劑等,由凝集性等方面來看,陰離子系高分子凝集劑較佳。The polymer coagulants used in the flocculant formation step include, for example, cationic polymer coagulants such as polyacrylamide and polyacrylate, anionic polymer coagulants, and nonionic polymer coagulants. In terms of coagulation properties, anionic polymer coagulants are preferred.
市售之高分子凝集劑可舉ORFLOCK OA-3H(ORGANO公司(股)製)等之陰離子系高分子凝集劑為例。Examples of commercially available high molecular weight coagulants include cationic high molecular weight coagulants such as ORFLOCK OA-3H (manufactured by ORGANO Co., Ltd.).
高分子凝集劑之添加量相對原水之水量宜在0.1至10mg/L之範圍內,且在1至5mg/L之範圍內更佳。高分子凝集劑之添加量相對原水之水量小於0.1mg/L時,會無法促使凝絮形成,且超過10mg/L時,溶存於處理水中之高分子凝集劑會殘留。The amount of polymer coagulant added relative to the amount of raw water should be in the range of 0.1 to 10 mg/L, and preferably in the range of 1 to 5 mg/L. When the amount of polymer coagulant added relative to the amount of raw water is less than 0.1 mg/L, it will not promote the formation of flocculation, and when it exceeds 10 mg/L, the polymer coagulant dissolved in the treated water will remain.
凝絮形成步驟中之pH係在例如3至11之範圍內。凝絮形成步驟中之pH小於3或超過11時,會產生凝集不良。此外,凝絮形成步驟中之pH小於9時會由凝絮溶出二氧化矽,因此最好在pH9至11之範圍內進行凝絮形成步驟。The pH in the flocculant formation step is, for example, in the range of 3 to 11. When the pH in the flocculant formation step is less than 3 or exceeds 11, poor coagulation occurs. In addition, when the pH in the flocculant formation step is less than 9, silicon dioxide is dissolved from the flocculants. Therefore, the flocculant formation step is preferably performed in the range of pH 9 to 11.
凝絮形成步驟中之溫度係在例如1℃至80℃之範圍內。凝絮形成步驟中之溫度小於1℃或超過80℃時,會產生凝集不良。The temperature in the flocculant formation step is, for example, in the range of 1° C. to 80° C. When the temperature in the flocculant formation step is less than 1° C. or exceeds 80° C., poor coagulation may occur.
上述凝集處理雖然使用無機凝集劑及高分子凝集劑進行凝集步驟及凝絮形成步驟,但可使用無機凝集劑、高分子凝集劑等中之至少一者,且宜使用鐵系無機凝集劑及陰離子系高分子凝集劑中之至少一者。使與鎂鹽反應且不溶化之二氧化矽凝集時,藉由使用鐵系無機凝集劑及陰離子系高分子凝集劑中之至少一者,可提高凝集性及固液分離性。Although the above-mentioned coagulation treatment uses an inorganic coagulant and a polymer coagulant to perform the coagulation step and the flocculant formation step, at least one of an inorganic coagulant, a polymer coagulant, etc. may be used, and at least one of an iron-based inorganic coagulant and an anionic polymer coagulant is preferably used. When the silicon dioxide that reacts with the magnesium salt and becomes insoluble is coagulated, the coagulation property and the solid-liquid separation property can be improved by using at least one of an iron-based inorganic coagulant and an anionic polymer coagulant.
固液分離步驟係在例如沉澱槽中固液分離凝絮形成之凝集物(固液分離步驟)。接著將藉由固液分離製得之前處理水輸送至逆滲透膜處理裝置12。另一方面,通過污泥配管排出污泥。污泥可回收、再利用。The solid-liquid separation step is to separate the flocculated aggregates in a sedimentation tank (solid-liquid separation step). The treated water obtained by the solid-liquid separation is then transported to the reverse osmosis
固液分離步驟中之固液分離除了藉由自然沉降來沉降分離以外,可舉加壓浮選處理、膜過濾處理等為例,且由分離性等方面來看,沉降分離較佳。In the solid-liquid separation step, in addition to separation by natural sedimentation, solid-liquid separation can be performed by pressure flotation treatment, membrane filtration treatment, etc., and in terms of separation properties, sedimentation separation is better.
[前處理步驟:藉由石灰軟化法去除硬度成分] 被處理水包含硬度成分時,可藉由石灰軟化法去除硬度成分。硬度成分分成一次硬度及永久硬度,且一次硬度係藉由氫氧化鈉(NaOH)等之鹼劑去除,而永久硬度係藉由添加碳酸鈉(NaCO 3)等之碳酸鹽去除。在本說明書中,為方便起見,碳酸鹽亦記載為鹼劑。即,在前處理步驟中,添加鹼劑至被處理水中,使硬度成分不溶化(鹼劑反應步驟)。 [Pre-treatment step: Removal of hardness components by lime softening] When the water to be treated contains hardness components, the hardness components can be removed by lime softening. Hardness components are divided into primary hardness and permanent hardness, and primary hardness is removed by alkali such as sodium hydroxide (NaOH), while permanent hardness is removed by adding carbonate such as sodium carbonate (NaCO 3 ). In this manual, for convenience, carbonate is also recorded as alkali. That is, in the pre-treatment step, alkali is added to the water to be treated to make the hardness components insoluble (alkali reaction step).
使用之鹼劑可舉例如:氫氧化鈣(Ca(OH) 2)、氫氧化鈉(NaOH)、氫氧化鉀(KOH)、碳酸氫鈣(Ca(HCO 3) 2)、碳酸氫鎂(Mg(HCO 3) 2)、碳酸鈉(Na 2CO 3)、碳酸鉀(K 2CO 3)等,且可使用其中一者以上。即,亦可依需要分別添加氫氧化鈉及碳酸鈉。由不溶化效率等之觀點來看,碳酸鈉較佳。 Alkaline agents used include, for example, calcium hydroxide (Ca(OH) 2 ), sodium hydroxide (NaOH), potassium hydroxide (KOH), calcium bicarbonate (Ca(HCO 3 ) 2 ), magnesium bicarbonate (Mg(HCO 3 ) 2 ), sodium carbonate (Na 2 CO 3 ), potassium carbonate (K 2 CO 3 ), etc., and more than one of them may be used. That is, sodium hydroxide and sodium carbonate may be added separately as needed. From the viewpoint of insolubilization efficiency, etc., sodium carbonate is preferred.
鹼劑反應步驟中之pH只要是鹼性條件即可,沒有特別限制,但可在例如pH9至13之範圍內,且在11至12之範圍內較佳。鹼劑反應步驟中之pH小於9時,硬度成分去除率降低,且超過13時,鹼劑之添加量會變多。The pH in the alkali reaction step is not particularly limited as long as it is an alkaline condition, but can be, for example, in the range of pH 9 to 13, and preferably in the range of pH 11 to 12. When the pH in the alkali reaction step is less than 9, the hardness component removal rate decreases, and when it exceeds 13, the amount of alkali added increases.
鹼劑反應步驟中之溫度只要是進行硬度成分之不溶化反應的溫度即可,沒有特別限制,但可在例如1℃至80℃之範圍內。鹼劑反應步驟中之溫度小於1℃時,硬度成分之不溶化反應會不充分,且超過80℃時,設備之耐熱溫度會有問題。The temperature in the alkali reaction step is not particularly limited as long as it is a temperature at which the insolubilization reaction of the hardness component is carried out, but it can be, for example, in the range of 1°C to 80°C. If the temperature in the alkali reaction step is less than 1°C, the insolubilization reaction of the hardness component will not be sufficient, and if it exceeds 80°C, the heat resistance temperature of the equipment will be problematic.
鹼劑反應步驟中之只要可進行硬度成分之不溶化反應即可,沒有特別限制,但可在例如10分至30分之範圍內。鹼劑反應步驟中之反應時間小於10分時,硬度成分之不溶化反應會不充分,且超過30分時,反應槽會變大而使設備成本升高。The reaction time in the alkali reaction step is not particularly limited as long as the insolubilization reaction of the hardness component can be carried out, but it can be, for example, in the range of 10 minutes to 30 minutes. If the reaction time in the alkali reaction step is less than 10 minutes, the insolubilization reaction of the hardness component will be insufficient, and if it exceeds 30 minutes, the reaction tank will become larger, which will increase the equipment cost.
鹼劑之添加量相對被處理水中之硬度成分的莫耳濃度宜在1.0至2.0倍量之範圍內,且在1.0至1.2倍量之範圍內更佳。鹼劑之添加量相對被處理水中之硬度成分的莫耳濃度小於1.0倍量時,硬度成分之不溶化反應會不充分,且超過2.0倍量時,藥品成本會升高。The amount of alkali added is preferably in the range of 1.0 to 2.0 times the molar concentration of the hardness components in the treated water, and more preferably in the range of 1.0 to 1.2 times. When the amount of alkali added is less than 1.0 times the molar concentration of the hardness components in the treated water, the insolubilization reaction of the hardness components will be insufficient, and when it exceeds 2.0 times, the cost of the drug will increase.
後來之凝集處理步驟及固液分離步驟與上述前處理步驟(藉由鎂鹽去除二氧化矽)相同。接著將藉由固液分離製得之前處理水輸送至逆滲透膜處理裝置12。The subsequent coagulation treatment step and solid-liquid separation step are the same as the above-mentioned pre-treatment step (removal of silicon dioxide by magnesium salt). Then, the pre-treated water obtained by solid-liquid separation is transported to the reverse osmosis
[前處理步驟:藉由樹脂軟化法去除硬度成分]
在被處理水包含硬度成分時之樹脂軟化法的前處理步驟中,例如,將被處理水通入填充離子交換樹脂之離子交換塔,吸附去除硬度成分(離子交換步驟)。接著將藉由離子交換處理製得之前處理水輸送至逆滲透膜處理裝置12。
[Pre-treatment step: Removal of hardness components by resin softening method]
In the pre-treatment step of the resin softening method when the treated water contains hardness components, for example, the treated water is passed through an ion exchange tower filled with ion exchange resin to remove the hardness components by adsorption (ion exchange step). Then, the treated water obtained by ion exchange treatment is transported to the reverse osmosis
離子交換步驟中使用之離子交換樹脂係陽離子交換樹脂,且可舉Amberrex 100Na,IRC-76(ORGANO公司(股)製)等為例。The ion exchange resin used in the ion exchange step is a cation exchange resin, and examples thereof include Amberrex 100Na and IRC-76 (produced by ORGANO Co., Ltd.).
離子交換樹脂需要再生時,藉由通過再生劑再生離子交換樹脂。When the ion exchange resin needs to be regenerated, the ion exchange resin is regenerated by passing a regeneration agent.
使用之再生劑可舉例如:鹽酸、硫酸、硝酸等之酸水溶液;氯化鈉水溶液;氯化鉀水溶液等,且可使用其中一者以上。即,亦可依需要藉由酸水溶液再生後,藉由氯化鈉水溶液進行追加再生。由吸引溶液之再利用等的觀點來看,酸水溶液、氯化鈉水溶液較佳。若藉由酸水溶液再生,則離子交換樹脂成為H形,而若藉由氯化鈉水溶液再生,則離子交換樹脂成為Na形。The regeneration agent used may be, for example, an acid aqueous solution of hydrochloric acid, sulfuric acid, nitric acid, etc.; an aqueous sodium chloride solution; an aqueous potassium chloride solution, etc., and more than one of them may be used. That is, after regeneration with an acid aqueous solution, additional regeneration with an aqueous sodium chloride solution may be performed as needed. From the viewpoint of the reuse of the attracting solution, an acid aqueous solution and an aqueous sodium chloride solution are preferred. If regenerated with an acid aqueous solution, the ion exchange resin becomes an H form, and if regenerated with an aqueous sodium chloride solution, the ion exchange resin becomes a Na form.
[濃縮處理步驟(第一濃縮處理步驟)] 濃縮處理設備(第一濃縮處理設備)只要可濃縮前處理水即可,沒有特別限制,但除了逆滲透膜處理裝置以外,亦可使用:使用奈米過濾膜等之膜過濾裝置、蒸餾裝置、電透析裝置等中之一個裝置以上。即,可依需要藉由電透析處理進一步濃縮藉由逆滲透膜處理裝置製得之濃縮水,或藉由第二逆滲透處理進一步濃縮藉由第一逆滲透處理製得之濃縮水。由在前處理水中之TDS低時可有效率地處理等之觀點來看,逆滲透膜處理裝置較佳。 [Concentration treatment step (first concentration treatment step)] The concentration treatment equipment (first concentration treatment equipment) is not particularly limited as long as it can concentrate the pre-treated water, but in addition to the reverse osmosis membrane treatment device, one or more of the following devices may be used: a membrane filtration device using a nanofiltration membrane, a distillation device, an electrodialysis device, etc. That is, the concentrated water obtained by the reverse osmosis membrane treatment device can be further concentrated by electrodialysis treatment as needed, or the concentrated water obtained by the first reverse osmosis treatment can be further concentrated by the second reverse osmosis treatment. From the perspective of being able to efficiently treat water when the TDS in the pre-treated water is low, the reverse osmosis membrane treatment device is better.
逆滲透膜處理裝置中使用之逆滲透膜,除了使用於純水製造用途及排水回收等之用途的超低壓逆滲透膜、低壓逆滲透膜以外,可舉使用於海水淡化等用途之中壓逆滲透膜及高壓逆滲透膜等為例。超低壓逆滲透膜、低壓逆滲透膜可舉例如:ES15(日東電工製)、TM720D(TORAY製)、BW30HRLE(Dow Chemical製)、LFC3-LD(Hydranautics製)。高壓逆滲透膜可舉例如:SWC5-LD(Hydranautics製)、TM820V(TORAY製)、XUS180808(Dow Chemical製)等。The reverse osmosis membrane used in the reverse osmosis membrane treatment device includes ultra-low pressure reverse osmosis membrane and low pressure reverse osmosis membrane used for pure water production and wastewater recovery, as well as medium pressure reverse osmosis membrane and high pressure reverse osmosis membrane used for seawater desalination. Examples of ultra-low pressure reverse osmosis membrane and low pressure reverse osmosis membrane include ES15 (manufactured by Nitto Denko), TM720D (manufactured by TORAY), BW30HRLE (manufactured by Dow Chemical), and LFC3-LD (manufactured by Hydranautics). Examples of high pressure reverse osmosis membrane include SWC5-LD (manufactured by Hydranautics), TM820V (manufactured by TORAY), and XUS180808 (manufactured by Dow Chemical).
在濃縮處理步驟(第一濃縮處理步驟)中,亦可添加pH調整劑、抑制在系內之無機鹽結垢的水垢分散劑及抑制在系內產生微生物之殺菌劑等的藥品。In the concentration treatment step (first concentration treatment step), chemicals such as a pH adjuster, a scale dispersant for inhibiting scaling of inorganic salts in the system, and a bactericide for inhibiting the generation of microorganisms in the system may also be added.
[正滲透膜處理步驟] 正滲透膜處理步驟中使用之正滲透膜形狀沒有特別限制,但可使用例如:中空紗膜、螺旋膜、管形膜、板底框構造之膜等。正滲透膜之膜材質可舉芳香族聚醯胺系、乙酸纖維素系等為例。此外,亦可使用在分離膜之基材中組合機能性蛋白質及無機材料等以賦予分離性能及透水性等的膜。正滲透膜可舉例如:HP5230(東洋紡製)、HFFO2(Aquaporin製)、OsmoF20(Fruid Technology Solutions製)。該等正滲透膜可單段地使用或串聯地連接多數段使用。即,可藉由第二正滲透膜處理進一步濃縮藉由第一正滲透膜處理製得之FO濃縮水。 [Forward osmosis membrane treatment step] The shape of the forward osmosis membrane used in the forward osmosis membrane treatment step is not particularly limited, but for example, hollow yarn membrane, spiral membrane, tubular membrane, plate-bottom frame structure membrane, etc. can be used. Examples of the membrane material of the forward osmosis membrane include aromatic polyamide series and cellulose acetate series. In addition, a membrane in which functional proteins and inorganic materials are combined in the base material of the separation membrane to impart separation performance and water permeability can also be used. Examples of the forward osmosis membrane include HP5230 (manufactured by Toyobo), HFFO2 (manufactured by Aquaporin), and OsmoF20 (manufactured by Fruid Technology Solutions). Such forward osmosis membranes can be used in a single section or in a plurality of sections connected in series. That is, the FO concentrated water obtained by the first forward osmosis membrane treatment can be further concentrated by the second forward osmosis membrane treatment.
正滲透膜處理步驟中使用之吸引溶液,如上所述,可舉例如:鎂鹽水溶液、鹼劑水溶液、酸水溶液、氯化鈉水溶液等。此外,除上述以外,只要是本水處理裝置中使用之藥品即可,可無限制地使用。即,亦可使用凝集步驟中使用之各種凝集劑、濃縮處理步驟中使用水垢分散劑及殺菌劑等作為吸引溶液。As mentioned above, the attracting solution used in the forward osmosis membrane treatment step can be, for example, a magnesium salt aqueous solution, an alkaline aqueous solution, an acid aqueous solution, a sodium chloride aqueous solution, etc. In addition, in addition to the above, any chemical used in the water treatment device can be used without limitation. That is, various coagulants used in the coagulation step, scale dispersants and disinfectants used in the concentration treatment step, etc. can also be used as the attracting solution.
在正滲透膜處理步驟中進行多數段之正滲透膜處理時,可組合上述吸引溶液使用。例如,使用氯化鈉水溶液作為第一正滲透膜處理步驟之吸引溶液,且使用鎂鹽水溶液作為第二正滲透膜處理步驟之吸引溶液。此外,例如,可使用藉由第一正滲透膜處理步驟製得之稀薄氯化鈉水溶液作為軟化樹脂之再生液,且使用藉由第二正滲透膜處理步驟製得之稀薄鎂鹽水溶液作為溶解性二氧化矽去除步驟之鎂源。When multiple stages of forward osmosis membrane treatment are performed in the forward osmosis membrane treatment step, the above-mentioned draw solutions may be used in combination. For example, a sodium chloride aqueous solution is used as the draw solution for the first forward osmosis membrane treatment step, and a magnesium salt aqueous solution is used as the draw solution for the second forward osmosis membrane treatment step. In addition, for example, a dilute sodium chloride aqueous solution obtained by the first forward osmosis membrane treatment step may be used as a regeneration solution for the softening resin, and a dilute magnesium salt aqueous solution obtained by the second forward osmosis membrane treatment step may be used as a magnesium source for the soluble silica removal step.
[第二濃縮處理步驟] 第二濃縮處理設備只要可濃縮正滲透膜處理步驟中使用之稀薄吸引溶液即可,沒有特別限制,但可使用:奈米過濾膜處理裝置、逆滲透膜處理裝置、正滲透膜處理裝置、壓力輔助逆滲透膜處理裝置等之使用半透膜的濃縮裝置;使用奈米過濾膜等之膜過濾裝置;蒸餾裝置;電透析裝置等中之一個裝置以上。由減少濃縮成本等之觀點來看,使用半透膜之濃縮裝置較佳,且特別在被處理水之TDS濃度超過5%時可減少滲透壓影響的壓力輔助逆滲透膜處理裝置更佳。 [Second concentration treatment step] The second concentration treatment equipment is not particularly limited as long as it can concentrate the dilute absorption solution used in the forward osmosis membrane treatment step, but can be: a concentration device using a semipermeable membrane such as a nanofiltration membrane treatment device, a reverse osmosis membrane treatment device, a forward osmosis membrane treatment device, a pressure-assisted reverse osmosis membrane treatment device, etc.; a membrane filtration device using a nanofiltration membrane, etc.; a distillation device; an electrodialysis device, etc., or one or more of the following devices can be used. From the perspective of reducing concentration costs, a concentration device using a semipermeable membrane is preferred, and a pressure-assisted reverse osmosis membrane treatment device that can reduce the impact of osmotic pressure is preferred, especially when the TDS concentration of the treated water exceeds 5%.
圖4顯示本實施形態之水處理裝置中的一濃縮裝置例。FIG. 4 shows an example of a concentration device in a water treatment device according to this embodiment.
圖4所示之濃縮裝置340係一壓力輔助逆滲透膜處理裝置例。濃縮裝置340係一裝置,該裝置具有使用半透膜濃縮處理對象水之2個以上的濃縮設備,且將上述稀薄吸引溶液供給至第一段半透膜之一次側並將稀薄液供給至二次側,由一次側之另一流路製得濃縮液且由二次側之另一流路製得稀釋液,接著供給該稀釋液至次段半透膜之一次側,並加壓各段半透膜之一次側使該一次側含有之水透過二次側,依序製得濃縮液及稀釋液。The
濃縮裝置340具有例如:第一段半透膜處理裝置42、第二段半透膜處理裝置44、第三段半透膜處理裝置46。半透膜處理裝置分別具有被半透膜52分隔之一次側(第一空間)48及二次側(第二空間)50。The concentrating
在圖4所示之濃縮裝置340中,配管54透過泵70連接於第一段半透膜處理裝置42之一次側48的入口,且配管56連接於一次側48的出口。第二段半透膜處理裝置44之一次側48的出口及第一段半透膜處理裝置42之二次側50的入口藉由配管58連接,且第一段半透膜處理裝置42之二次側50的出口及第二段半透膜處理裝置44之一次側48的入口透過泵72藉由配管60連接。第三段半透膜處理裝置46之一次側48的出口及第二段半透膜處理裝置44之二次側50的入口藉由配管62連接,且第二段半透膜處理裝置44之二次側50的出口及第三段半透膜處理裝置46之一次側48的入口透過泵74藉由配管64連接。配管66連接於第三段半透膜處理裝置46之二次側50的入口且配管68連接於二次側50的出口。In the
濃縮裝置340係使用多段式半透膜處理裝置之裝置,該多段式半透膜處理裝置具有被半透膜52分隔之一次側48及二次側50。作為被處理水之正滲透膜處理裝置14中使用的稀薄吸引溶液(例如,MgCl
2:8質量%)之一部份藉由泵70通過配管54而通至第一段半透膜處理裝置42之一次側48,且後述第二段半透膜處理裝置44中製得之第二濃縮液(例如,MgCl
2:10質量%)通過配管58而通至二次側50,接著加壓一次側48使該一次側48含有之水透過二次側50,製得第一濃縮液(例如,MgCl
2:30質量%)及第一稀釋液(例如,MgCl
2:5質量%)(濃縮步驟(第一段))。第一濃縮液(濃縮吸引溶液)通過配管56排出並作為正滲透膜處理裝置14中之吸引溶液再度使用。
The
第一稀釋液通過配管60並藉由泵72通至第二段半透膜處理裝置44之一次側48,且藉由後述第三段半透膜處理裝置46製得之第三濃縮液(例如,MgCl
2:3質量%)通過配管62而通至二次側50,接著加壓一次側48使該一次側48含有之水透過二次側50,製得第二濃縮液(例如,MgCl
2:10質量%)及第二稀釋液(例如,MgCl
2:1質量%)(濃縮步驟(第二段))。第二濃縮液通過配管58而通至第一段半透膜處理裝置42之二次側50。
The first dilution liquid passes through the
第二稀釋液通過配管64並藉由泵74通至第三段半透膜處理裝置46之一次側48,且稀釋液(例如,MgCl
2:1質量%)通過配管66而通至二次側50,接著加壓一次側48使該一次側48含有之水透過二次側50,製得第三濃縮液(例如,MgCl
2:3質量%)及第三稀釋液(例如,MgCl
2:<1質量%)(濃縮步驟(第三段))。第三濃縮液通過配管62而通至第二段半透膜處理裝置44之二次側50。第三稀釋液通過配管68排出。第二濃縮液、第三濃縮液之一部份可作為正滲透膜處理裝置14中之吸引溶液再度使用。第三稀釋液可依需要在實施超過濾膜(UF膜)處理、逆滲透膜(RO膜)處理、離子交換處理等後回收、再利用。
The second dilution liquid passes through the
該壓力輔助逆滲透膜處理裝置減少一次側48與二次側50之滲透壓差,可用比一般逆滲透膜處理裝置小之能量運轉,因此可用更低成本進行運轉。The pressure-assisted reverse osmosis membrane treatment device reduces the osmotic pressure difference between the
如上所述,由上述稀薄吸引溶液製得之濃縮吸引溶液可作為正滲透膜處理裝置14中之吸引溶液再度使用。As described above, the concentrated draw solution prepared from the above-mentioned dilute draw solution can be reused as the draw solution in the forward osmosis
在圖4所示之濃縮裝置340中,通至第一段半透膜處理裝置42之二次側50及第二段以後之半透膜處理裝置的液可為與通至第一段半透膜處理裝置42之一次側48的稀薄吸引溶液不同成分的液。圖5顯示如此之濃縮裝置例。In the
圖5所示之濃縮裝置342係具有與圖4所示之濃縮裝置340相同結構的裝置。作為被處理水之正滲透膜處理裝置14中使用的稀薄吸引溶液(例如,MgCl
2:8質量%)之一部份藉由泵70通過配管54而通至第一段半透膜處理裝置42之一次側48,且後述第二段半透膜處理裝置44中製得之第二濃縮液(例如,葡萄糖:20質量%)通過配管58而通至二次側50,接著加壓一次側48使該一次側48含有之水透過二次側50,製得第一濃縮液(例如,MgCl
2:30質量%)及第一稀釋液(例如,葡萄糖:10質量%)(濃縮步驟(第一段))。第一濃縮液(濃縮吸引溶液)通過配管56排出並作為正滲透膜處理裝置14中之吸引溶液再度使用。
The concentrating
第一稀釋液通過配管60並藉由泵72通至第二段半透膜處理裝置44之一次側48,且藉由後述第三段半透膜處理裝置46製得之第三濃縮液(例如,NaCl:3質量%)通過配管62而通至二次側50,接著加壓一次側48使該一次側48含有之水透過二次側50,製得第二濃縮液(例如,葡萄糖:20質量%)及第二稀釋液(例如,NaCl:1質量%)(濃縮步驟(第二段))。第二濃縮液通過配管58而通至第一段半透膜處理裝置42之二次側50。The first dilution liquid passes through the
第二稀釋液通過配管64並藉由泵74通至第三段半透膜處理裝置46之一次側48,且稀釋液(例如,NaCl:1質量%)通過配管66而通至二次側50,接著加壓一次側48使該一次側48含有之水透過二次側50,製得第三濃縮液(例如,NaCl:3質量%)及第三稀釋液(例如,NaCl:<1質量%)(濃縮步驟(第三段))。第三濃縮液通過配管62而通至第二段半透膜處理裝置44之二次側50。第三稀釋液通過配管68排出。第三稀釋液可依需要在實施超過濾膜(UF膜)處理、逆滲透膜(RO膜)處理、離子交換處理等後回收、再利用。The second dilution liquid passes through the
通至第一段半透膜處理裝置42之二次側50及第二段以後之半透膜處理裝置的液只要是具有滲透壓之液即可,沒有特別限制。可舉例如:包含氯化鈉等之無機鹽類的水溶液、包含葡萄糖等之有機物的水溶液、包含聚合物之水溶液及離子液體等。由減少成分由一次側擴散至二次側之影響的觀點來看,宜使用與通至第一段半透膜處理裝置42之一次側48的稀薄吸引溶液相同成分的液。The liquid passed to the
圖6顯示本實施形態之水處理裝置5中之濃縮裝置34的另一例。FIG. 6 shows another example of the
圖6所示之濃縮裝置344係一壓力輔助逆滲透膜處理裝置例。濃縮裝置344係一裝置,該裝置具有使用半透膜濃縮處理對象水並進一步使用半透膜濃縮該濃縮液之一個以上的濃縮設備,且將前述稀薄吸引溶液供給至第一段半透膜之一次側,接著將該濃縮液依序供給至各段半透膜之一次側並將前述稀薄吸引溶液之一部份或任一段濃縮液之一部份供給至各段半透膜之二次側,並加壓各段半透膜之一次側使該一次側含有之水透過二次側。The
濃縮裝置344具有例如:第一段半透膜處理裝置78、第二段半透膜處理裝置80、第三段半透膜處理裝置82。各半透膜處理裝置具有被半透膜88分隔之一次側(第一空間)84及二次側(第二空間)86。The concentrating
在圖6所示之濃縮裝置344中,配管90透過泵106連接於第一段半透膜處理裝置78之一次側84的入口。第一段半透膜處理裝置78之一次側84的出口及第二段半透膜處理裝置80之一次側84的入口藉由配管92連接。第二段半透膜處理裝置80之一次側84的出口及第三段半透膜處理裝置82之一次側84的入口藉由配管94連接。配管96連接於第三段半透膜處理裝置82之一次側84的出口。由配管96分歧之配管98連接於第三段半透膜處理裝置82之二次側86的入口。第三段半透膜處理裝置82之二次側86的出口及第二段半透膜處理裝置80之二次側86的入口藉由配管100連接。第二段半透膜處理裝置80之二次側86的出口及第一段半透膜處理裝置78之二次側86的入口藉由配管102連接。配管104連接於第一段半透膜處理裝置78之二次側86的出口。依據需要,配管92、94、96、98、100、102中可具有:加壓、送液用之泵;用以調整施加在半透膜上之壓力的閥等壓力調整機構;用以暫時貯存處理水之槽等。In the
在濃縮裝置344中,作為被處理水之正滲透膜處理裝置14中使用的稀薄吸引溶液(例如,MgCl
2:10質量%)之一部份藉由泵106通過配管90,接著輸送至第一段半透膜處理裝置78之一次側84。另一方面,由後述最終段之第三段半透膜處理裝置82經由第二段半透膜處理裝置80之二次側86送回的稀釋液(二次側處理水)(例如,MgCl
2:6質量%)通過配管102,接著輸送至第一段半透膜處理裝置78之二次側86。在第一段半透膜處理裝置78中,加壓半透膜之一次側84使該一次側84含有之水透過二次側86(濃縮步驟(第一段))。
In the
第一段半透膜處理裝置78之濃縮液(一次側處理水)(例如,MgCl
2:18質量%)通過配管92,接著輸送至第二段半透膜處理裝置80之一次側84。另一方面,由後述最終段之第三段半透膜處理裝置82送回的稀釋液(二次側處理水)(例如,MgCl
2:15質量%)通過配管100,接著輸送至第二段半透膜處理裝置80之二次側86。與第一段同樣地,在第二段半透膜處理裝置80中,加壓半透膜之一次側84使該一次側84含有之水透過二次側86(濃縮步驟(第二段))。
The concentrated liquid (primary side treated water) (e.g., MgCl 2 : 18 mass %) of the first stage semipermeable
第二段半透膜處理裝置80之濃縮液(一次側處理水)(例如,MgCl
2:23質量%)通過配管94,接著輸送至第三段半透膜處理裝置82之一次側84。另一方面,由後述最終段之第三段半透膜處理裝置82送回的濃縮液(例如,MgCl
2:30質量%)通過配管98,接著輸送至第三段半透膜處理裝置82之二次側86。與第一、二段同樣地,在第三段半透膜處理裝置82中,加壓半透膜之一次側84使該一次側84含有之水透過二次側86(濃縮步驟(第三段))。
The concentrated liquid (primary side treated water) (e.g., MgCl 2 : 23 mass%) of the second stage semipermeable
最終段之第三段半透膜處理裝置82之濃縮液(一次側處理水)(例如,MgCl
2:30質量%)的一部份通過配管96排出,作為正滲透膜處理裝置14中之吸引溶液再度使用。第三段半透膜處理裝置82之濃縮液剩餘的一部份通過配管96、98,接著輸送至第三段半透膜處理裝置82之二次側86。如上所述,在第三段半透膜處理裝置82中,加壓半透膜之一次側84使該一次側84含有之水透過二次側86(濃縮步驟(第三段))。
A portion of the concentrated liquid (primary side treated water) (e.g., MgCl 2 : 30 mass %) of the final stage third-stage semipermeable
第三段半透膜處理裝置82之稀釋液(二次側處理水)(例如,MgCl
2:15質量%)通過配管100,接著輸送至第二段半透膜處理裝置80之二次側86。如上所述,在第二段半透膜處理裝置80中,加壓半透膜之一次側84使該一次側84含有之水透過二次側86(濃縮步驟(第二段))。
The dilute liquid (secondary side treated water) (e.g., MgCl 2 : 15 mass%) of the third stage semipermeable
第二段半透膜處理裝置80之稀釋液(二次側處理水)(例如,MgCl
2:6質量%)通過配管102,接著輸送至第一段半透膜處理裝置78之二次側86。如上所述,在第一段半透膜處理裝置78中,加壓半透膜之一次側84使該一次側84含有之水透過二次側86(濃縮步驟(第一段))。第一段半透膜處理裝置78之稀釋液(二次側處理水)(例如,MgCl
2:<1質量%)通過配管104排出。稀釋液可依需要在實施超過濾膜(UF膜)處理、逆滲透膜(RO膜)處理、離子交換處理等後回收、再利用。
The dilute liquid (secondary side treated water) (e.g., MgCl 2 : 6 mass%) of the second stage semipermeable
因為該濃縮裝置344之如此壓力輔助逆滲透膜處理裝置使用被處理水之一部份作為滲透壓輔助用之稀釋用液,所以可不必另外準備稀釋液,因此裝置結構可比濃縮裝置340之如此壓力輔助逆滲透膜處理裝置簡化。Because the pressure-assisted reverse osmosis membrane treatment device of the
如上所述,由上述稀薄吸引溶液製得之濃縮吸引溶液作為正滲透膜處理裝置14中之吸引溶液再度使用。As described above, the concentrated attracting solution prepared from the above-mentioned dilute attracting solution is reused as the attracting solution in the forward osmosis
可在該濃縮裝置344之如此壓力輔助逆滲透膜處理裝置中,供給正滲透膜處理裝置14中使用之稀薄吸引溶液之一部份或任一段濃縮液之一部份至各段半透膜之二次側,該方法沒有特別限制。In such a pressure-assisted reverse osmosis membrane treatment device of the
例如,如圖7之濃縮裝置346所示地,可分配作為被處理水之正滲透膜處理裝置14中使用的稀薄吸引溶液,並分別供給至第一段半透膜處理裝置78之一次側84、二次側86,接著分別依序供給該濃縮液及透過液至各段半透膜之一次側84及二次側86,然後加壓各段半透膜之一次側使該一次側含有之水透過二次側。For example, as shown in the
如圖8之濃縮裝置348所示地,可供給作為被處理水之正滲透膜處理裝置14中使用的稀薄吸引溶液至第一段半透膜處理裝置78之一次側84,並依序供給該濃縮液至各段半透膜之一次側,接著供給最終段之第三段半透膜處理裝置82之濃縮液的一部份至第一段半透膜處理裝置78之二次側86並依序供給該透過液至各段半透膜之二次側,然後加壓各段半透膜之一次側使該一次側含有之水透過二次側。As shown in the
如圖9之濃縮裝置350所示地,可供給作為被處理水之正滲透膜處理裝置14中使用的稀薄吸引溶液至第一段半透膜處理裝置78之一次側84,並依序供給該濃縮液至各段半透膜之一次側,接著供給各段之半透膜處理裝置之濃縮液的一部份至該半透膜處理裝置本身之二次側86,然後加壓各段半透膜之一次側使該一次側含有之水透過二次側。As shown in the
在上述濃縮裝置340、342、344、346、348、350中,半透膜處理裝置之段數可依據目的之處理水濃度等來決定。例如,在濃縮裝置344、346、348、350中,欲由較稀濃度之稀薄吸引溶液製得較濃濃度之處理水(濃縮吸引溶液)時,可增加半透膜處理裝置之段數。In the above-mentioned concentrating
在上述濃縮裝置340、342、344、346、348、350中,可使用具有並聯地連接之2個以上膜模組的膜模組單元作為各段之半透膜處理裝置。各膜模組單元中之膜模組條數可依據處理對象之稀薄吸引溶液的流量等來決定。In the above-mentioned concentrating
具有半透膜處理裝置之半透膜可舉例如:逆滲透膜(RO膜)、正滲透膜(FO膜)、奈米過濾膜(NF膜)等之半透膜。半透膜宜為逆滲透膜、正滲透膜、奈米過濾膜。此外,使用逆滲透膜或正滲透膜、奈米過濾膜作為半透膜時,一次側之對象溶液的壓力宜為0.5至10.0MPa。The semipermeable membrane of the semipermeable membrane treatment device may be, for example, a reverse osmosis membrane (RO membrane), a forward osmosis membrane (FO membrane), a nanofiltration membrane (NF membrane), etc. The semipermeable membrane is preferably a reverse osmosis membrane, a forward osmosis membrane, or a nanofiltration membrane. In addition, when a reverse osmosis membrane, a forward osmosis membrane, or a nanofiltration membrane is used as the semipermeable membrane, the pressure of the target solution on the primary side is preferably 0.5 to 10.0 MPa.
構成半透膜沒有特別限制,但可舉例如:乙酸纖維素系樹脂等之纖維素系樹脂、聚醚碸系樹脂等之聚碸系樹脂、聚醯胺系樹脂等。構成半透膜之材料係乙酸纖維素系樹脂較佳。The material constituting the semipermeable membrane is not particularly limited, but examples thereof include cellulose resins such as cellulose acetate resins, polysulfide resins such as polyethersulfide resins, and polyamide resins. Preferably, the material constituting the semipermeable membrane is cellulose acetate resin.
半透膜之形狀只要具有可分別地供給溶液至膜之一次側及二次側的構造即可,沒有特別限制,可舉螺旋型、中空紗膜、板底框型等為例。The shape of the semipermeable membrane is not particularly limited as long as it has a structure that can supply a solution to the primary side and the secondary side of the membrane, and examples thereof include a spiral type, a hollow yarn membrane, and a plate-bottom-frame type.
[水處理裝置之另一例]
本發明實施形態之另一水處理裝置例的概略結構顯示於圖2中。圖2所示之水處理裝置3更具有吸引溶液調製槽30,作為混合氫氧化鎂及酸並在pH7以下使其反應以調製作為吸引溶液使用之鎂鹽水溶液的調製設備。
[Another example of water treatment device]
The schematic structure of another example of water treatment device of the present invention is shown in FIG2. The
在圖2之水處理裝置3中,吸引溶液調製槽30之出口及正滲透膜處理裝置14之吸引溶液入口藉由吸引溶液配管32連接。In the
與圖1之水處理裝置1同樣地進行:前處理步驟,其包含溶解性二氧化矽去除步驟及硬度成分去除步驟中之任一步驟;及濃縮處理步驟,濃縮處理藉由前處理步驟製得之前處理水。The same steps as those of the
另一方面,在吸引溶液調製槽30中,混合氫氧化鎂及酸並在pH7以下使其反應以調製作為吸引溶液使用之鎂鹽水溶液(調製步驟)。On the other hand, in the draw
在正滲透膜處理裝置14中正滲透膜處理藉由逆滲透膜處理製得之濃縮水(正滲透膜處理步驟)。在正滲透膜處理裝置14中,藉由吸引溶液調製槽30調製之吸引溶液通過吸引溶液配管32輸送至正滲透膜之二次側,接著透過正滲透膜使濃縮水及吸引溶液存在,藉此使水利用滲透壓移動至吸引溶液。The concentrated water obtained by the reverse osmosis membrane treatment is treated by the forward osmosis membrane in the forward osmosis membrane treatment device 14 (forward osmosis membrane treatment step). In the forward osmosis
正滲透膜處理步驟中使用之稀薄吸引溶液通過稀薄吸引溶液配管26輸送至前處理裝置10,接著在前處理裝置10中在前處理步驟中使用。The dilute draw solution used in the forward osmosis membrane treatment step is transported to the
在圖3之水處理裝置5中,與圖2之水處理裝置3同樣地,可更具有吸引溶液調製槽,作為混合氫氧化鎂及酸並在pH7以下使其反應以調製作為吸引溶液使用之鎂鹽水溶液的調製設備。在吸引溶液調製槽中,混合氫氧化鎂及酸並在pH7以下使其反應以調製鎂鹽水溶液(調製步驟),且可將調製之鎂鹽水溶液輸送至正滲透膜處理裝置14之二次側作為吸引溶液使用。In the
調製步驟中使用之酸可舉例如:鹽酸、硫酸、硝酸等,且由抑制難溶解性物質生成等之觀點來看,鹽酸或硝酸較佳。The acid used in the preparation step may be, for example, hydrochloric acid, sulfuric acid, nitric acid, etc., and hydrochloric acid or nitric acid is preferred from the viewpoint of inhibiting the formation of poorly soluble substances.
調製步驟中之pH只要7以下即可,沒有特別限制,但可在例如pH1至7之範圍內,且宜在2至5之範圍內。調製步驟中之pH超過7時,鎂鹽之溶解會不充分,且小於1時,酸之添加量會過多。The pH in the preparation step is not particularly limited as long as it is below 7, but may be, for example, in the range of
調製步驟中之溫度只要是進行鎂鹽之溶解反應的溫度即可,沒有特別限制,但可在例如1℃至80℃之範圍內。調製步驟中之溫度小於1℃時,鎂鹽之溶解反應會不充分,且超過80℃時,設備之耐熱性等會有問題。The temperature in the preparation step is not particularly limited as long as it is a temperature at which the magnesium salt dissolves, but may be, for example, in the range of 1°C to 80°C. If the temperature in the preparation step is less than 1°C, the magnesium salt dissolves insufficiently, and if it exceeds 80°C, the heat resistance of the equipment may be problematic.
調製步驟中之反應時間只要可進行鎂鹽之溶解反應即可,沒有特別限制,但可在例如5分至120分之範圍內。調製步驟中之反應時間小於5分時,鎂鹽之溶解反應會不充分,且超過120分時,設備會有問題。The reaction time in the preparation step is not particularly limited as long as the dissolution reaction of the magnesium salt can be carried out, but it can be in the range of 5 minutes to 120 minutes, for example. If the reaction time in the preparation step is less than 5 minutes, the dissolution reaction of the magnesium salt will be insufficient, and if it exceeds 120 minutes, there will be problems with the equipment.
<正滲透膜處理方法及正滲透膜處理系統> 以下在圖11中顯示本發明實施形態之一正滲透膜處理系統例的概略,且說明其結構。 <Forward Osmosis Membrane Treatment Method and Forward Osmosis Membrane Treatment System> The following is a schematic diagram of an example of a forward osmosis membrane treatment system which is one embodiment of the present invention, and its structure is described.
本實施形態之正滲透膜處理系統8具有正滲透膜處理裝置14,且該正滲透膜處理裝置14作為藉由使被處理水(FO被處理水)及濃度比被處理水(FO被處理水)高之吸引溶液透過正滲透膜110接觸來製得濃縮水(FO濃縮水)及稀薄吸引溶液的正滲透膜處理設備。The forward osmosis
在圖11之正滲透膜處理系統8中,FO被處理水配管16連接於正滲透膜處理裝置14之FO被處理水入口,且FO濃縮水配管28連接於FO濃縮水出口。吸引溶液配管24連接於正滲透膜處理裝置14之吸引溶液入口,且稀薄吸引溶液配管26連接於稀薄吸引溶液出口。殺菌劑添加配管112連接於FO被處理水配管16作為殺菌劑添加設備。In the forward osmosis
以下說明本實施形態之正滲透膜處理方法及正滲透膜處理系統8之動作。The following describes the operation of the forward osmosis membrane treatment method and the forward osmosis
FO被處理水通過FO被處理水配管16輸送至正滲透膜處理裝置14之一次側且在正滲透膜處理裝置14中進行正滲透膜處理(正滲透膜處理步驟)。在正滲透膜處理裝置14中,吸引溶液通過吸引溶液配管24輸送至正滲透膜之二次側且透過正滲透膜110使FO被處理水及吸引溶液存在,藉此使水利用滲透壓移動至吸引溶液。正滲透膜處理步驟中使用之稀薄吸引溶液通過稀薄吸引溶液配管26排出。藉由正滲透膜處理步驟製得之FO濃縮水通過FO濃縮水配管28排出。稀薄吸引溶液及FO濃縮水中之至少一者可回收、再利用。The FO treated water is transported to the primary side of the forward osmosis
在此,使包含溴系氧化劑或氯系氧化劑及胺磺酸化合物之殺菌劑(以下,有時稱為「正滲透膜用殺菌劑」)存在FO被處理水中。例如,正滲透膜用殺菌劑通過殺菌劑添加配管112在FO被處理水配管16中添加至FO被處理水中。亦可在正滲透膜處理裝置14之前段另外設置貯存FO被處理水之FO被處理水槽,且在FO被處理水槽中添加正滲透膜用殺菌劑。Here, a bactericide containing a bromine-based oxidant or a chlorine-based oxidant and an amine sulfonic acid compound (hereinafter, sometimes referred to as "forward osmosis membrane bactericide") is allowed to exist in the FO treated water. For example, the forward osmosis membrane bactericide is added to the FO treated water in the FO treated
如此,在本實施形態之正滲透膜處理方法及正滲透膜處理系統8中,正滲透膜處理被處理水時,使包含溴系氧化劑或氯系氧化劑及胺磺酸化合物之正滲透膜用殺菌劑存在正滲透膜處理之被處理水(FO被處理水)中。本發明人發現包含溴系氧化劑或氯系氧化劑及胺磺酸化合物之正滲透膜用殺菌劑幾乎未透過正滲透膜。該正滲透膜用殺菌劑對正滲透膜發揮比習知之氯系殺菌劑、氧化劑、有機系殺菌劑更充分之殺菌效果。此外,因為殺菌劑幾乎未洩漏至吸引溶液中,所以可再利用稀薄吸引溶液。Thus, in the forward osmosis membrane treatment method and the forward osmosis
因為該正滲透膜用殺菌劑之殺菌有效成分幾乎未透過正滲透膜,所以隨著前進至正滲透膜處理裝置14之出口(FO濃縮水出口)而逐漸濃縮。因此,殺菌劑之殺菌有效成分可充分地擴散到正滲透膜處理裝置14之出口(FO濃縮水出口)側且充分地殺菌到正滲透膜之出口側。Since the bactericidal active ingredient of the forward osmosis membrane sterilizer hardly permeates the forward osmosis membrane, it gradually concentrates as it advances to the outlet (FO concentrated water outlet) of the forward osmosis
在習知方法中,在FO被處理水中添加次氯酸、氯胺、過氧化氫、有機系殺菌劑等之殺菌劑時,FO被處理水之一部份因與吸引溶液之滲透壓差而移動至吸引溶液側,同時殺菌劑之一部份移動至吸引溶液側。相對於此,在本實施形態之正滲透膜處理方法及正滲透膜處理系統8中,藉由使用上述正滲透膜用殺菌劑,可抑制殺菌劑透過正滲透膜且再利用稀薄吸引溶液。In the conventional method, when a disinfectant such as hypochlorous acid, chloramine, hydrogen peroxide, or an organic disinfectant is added to FO treated water, a portion of the FO treated water moves to the side of the suction solution due to the osmotic pressure difference with the suction solution, and a portion of the disinfectant moves to the side of the suction solution. In contrast, in the forward osmosis membrane treatment method and forward osmosis
「包含溴系氧化劑及胺磺酸化合物之殺菌劑」可為含有包含「溴系氧化劑」及「胺磺酸化合物」之混合物的安定化次溴酸組成物的殺菌劑,或含有包含「溴系氧化劑及胺磺酸化合物之反應生成物」之安定化次溴酸組成物的殺菌劑。「包含氯系氧化劑及胺磺酸化合物之殺菌劑」可為含有包含「氯系氧化劑」及「胺磺酸化合物」之混合物的安定化次氯酸組成物的殺菌劑,或含有包含「氯系氧化劑及胺磺酸化合物之反應生成物」之安定化次氯酸組成物的殺菌劑。The “fungicide containing a bromine-based oxidizing agent and an amide sulfonic acid compound” may be a fungicide containing a stabilized hypobromous acid composition containing a mixture of a “bromine-based oxidizing agent” and a “amide sulfonic acid compound”, or a fungicide containing a stabilized hypobromous acid composition containing a “reaction product of a bromine-based oxidizing agent and an amide sulfonic acid compound”. The “fungicide containing a chlorine-based oxidizing agent and an amide sulfonic acid compound” may be a fungicide containing a stabilized hypochlorous acid composition containing a mixture of a “chlorine-based oxidizing agent” and a “amide sulfonic acid compound”, or a fungicide containing a stabilized hypochlorous acid composition containing a “reaction product of a chlorine-based oxidizing agent and an amide sulfonic acid compound”.
即,本發明實施形態之正滲透膜處理方法係使「溴系氧化劑」及「胺磺酸化合物」之混合物或「氯系氧化劑」及「胺磺酸化合物」之混合物存在被處理水(FO被處理水)中的方法。因此,考慮在被處理水中生成安定化次溴酸組成物或安定化次氯酸組成物。That is, the forward osmosis membrane treatment method of the embodiment of the present invention is a method of allowing a mixture of a "bromine-based oxidant" and a "sulfonic acid compound" or a mixture of a "chlorine-based oxidant" and a "sulfonic acid compound" to exist in the water to be treated (FO treated water). Therefore, it is considered that a stabilized hypobromous acid composition or a stabilized hypochlorous acid composition is generated in the water to be treated.
此外,本發明實施形態之正滲透膜處理方法係使「溴系氧化劑及胺磺酸化合物之反應生成物」之安定化次溴酸組成物或「氯系氧化劑及胺磺酸化合物之反應生成物」之安定化次氯酸組成物存在被處理水(FO被處理水)中的方法。In addition, the forward osmosis membrane treatment method of the embodiment of the present invention is a method of allowing a stabilized hypobromous acid composition of a "reaction product of a bromine-based oxidant and an amine sulfonic acid compound" or a stabilized hypochlorous acid composition of a "reaction product of a chlorine-based oxidant and an amine sulfonic acid compound" to exist in the water to be treated (FO treated water).
具體而言,本發明實施形態之正滲透膜處理方法係使「溴」、「氯化溴」、「次溴酸」或「溴化鈉及次氯酸之反應物」及「胺磺酸化合物」之混合物存在被處理水中的方法。或者,使「次氯酸」及「胺磺酸化合物」之混合物存在被處理水中的方法。Specifically, the forward osmosis membrane treatment method of the embodiment of the present invention is a method in which a mixture of "bromine", "bromine chloride", "hypobromous acid" or "a reaction product of sodium bromide and hypochlorous acid" and "sulfamic acid compound" is allowed to exist in the water to be treated. Alternatively, a mixture of "hypochlorous acid" and "sulfamic acid compound" is allowed to exist in the water to be treated.
此外,本發明實施形態之正滲透膜處理方法係例如使「溴及胺磺酸化合物之反應生成物」、「氯化溴及胺磺酸化合物之反應生成物」、「次溴酸及胺磺酸化合物之反應生成物」或「溴化鈉與次氯酸之反應物及胺磺酸化合物的反應生成物」之安定化次溴酸組成物存在被處理水中的方法。或者,使「次氯酸及胺磺酸化合物之反應生成物」之安定化次氯酸組成物存在被處理水中的方法。In addition, the forward osmosis membrane treatment method of the embodiment of the present invention is a method of allowing a stabilized hypobromous acid composition of "a reaction product of bromine and an amine sulfonic acid compound", "a reaction product of bromine chloride and an amine sulfonic acid compound", "a reaction product of hypobromous acid and an amine sulfonic acid compound", or "a reaction product of sodium bromide and hypochlorous acid and an amine sulfonic acid compound" to exist in the water to be treated. Alternatively, a stabilized hypochlorous acid composition of "a reaction product of hypochlorous acid and an amine sulfonic acid compound" is allowed to exist in the water to be treated.
在本發明實施形態之正滲透膜處理方法中,雖然安定化次溴酸組成物或安定化次氯酸組成物發揮與次氯酸等氯系氧化劑等之習知殺菌劑同等以上的殺菌效果,但相較於氯系氧化劑等之習知殺菌劑,對正滲透膜之劣化影響低,因此可抑制在正滲透膜之積垢且抑制正滲透膜之氧化劣化。因此,本實施形態之正滲透膜處理方法中使用之安定化次溴酸組成物或安定化次氯酸組成物適合作為在利用正滲透膜處理被處理水之方法中使用的殺菌劑。In the forward osmosis membrane treatment method of the embodiment of the present invention, although the stabilized hypobromous acid composition or the stabilized hypochlorous acid composition exerts a bactericidal effect equal to or higher than that of conventional bactericides such as chlorine-based oxidants such as hypochlorous acid, it has less effect on the deterioration of the forward osmosis membrane than conventional bactericides such as chlorine-based oxidants, and thus can inhibit the fouling of the forward osmosis membrane and inhibit the oxidative degradation of the forward osmosis membrane. Therefore, the stabilized hypobromous acid composition or the stabilized hypochlorous acid composition used in the forward osmosis membrane treatment method of the present embodiment is suitable as a bactericide used in a method of treating water to be treated using a forward osmosis membrane.
本實施形態之正滲透膜處理方法中,「包含溴系氧化劑及胺磺酸化合物之殺菌劑」時,氯系氧化劑不存在,因此對正滲透膜之劣化影響更低。包含氯系氧化劑時有生成氯酸之虞。In the forward osmosis membrane treatment method of this embodiment, when the bactericide contains a bromine-based oxidant and an amine sulfonic acid compound, the chlorine-based oxidant does not exist, so the deterioration effect on the forward osmosis membrane is lower. When a chlorine-based oxidant is contained, there is a risk of generating chloric acid.
本實施形態之正滲透膜處理方法中,「溴系氧化劑」係溴時,氯系氧化劑不存在,因此對正滲透膜之劣化影響顯著地低。In the forward osmosis membrane treatment method of this embodiment, when the "bromine-based oxidant" is bromine, there is no chlorine-based oxidant, so the effect on the deterioration of the forward osmosis membrane is significantly low.
在本實施形態之正滲透膜處理方法中,可例如藉由注藥泵等將「溴系氧化劑」或「氯系氧化劑」及「胺磺酸化合物」注入被處理水中。「溴系氧化劑」或「氯系氧化劑」及「胺磺酸化合物」可分別地添加在被處理水中或用原液混合後添加在被處理水中。In the forward osmosis membrane treatment method of this embodiment, the "bromine-based oxidant" or "chlorine-based oxidant" and "sulfamic acid compound" can be injected into the water to be treated, for example, by an injection pump, etc. The "bromine-based oxidant" or "chlorine-based oxidant" and "sulfamic acid compound" can be added to the water to be treated separately or mixed with stock solutions and added to the water to be treated.
此外,可例如藉由注藥泵等將「溴系氧化劑及胺磺酸化合物之反應生成物」或「氯系氧化劑及胺磺酸化合物之反應生成物」注入被處理水中。In addition, the "reaction product of a bromine-based oxidant and an amine sulfonic acid compound" or the "reaction product of a chlorine-based oxidant and an amine sulfonic acid compound" can be injected into the water to be treated, for example, by means of an injection pump.
在本實施形態之正滲透膜處理方法中,「胺磺酸化合物」之當量對「溴系氧化劑」或「氯系氧化劑」之當量的比宜為1以上,且在1以上2以下之範圍內更佳。「胺磺酸化合物」之當量對「溴系氧化劑」或「氯系氧化劑」之當量的比小於1時可能使膜劣化,且超過2時製造成本會增加。In the forward osmosis membrane treatment method of the present embodiment, the ratio of the equivalent of the "sulfonamide compound" to the equivalent of the "bromine-based oxidant" or the "chlorine-based oxidant" is preferably greater than 1, and more preferably within the range of greater than 1 and less than 2. When the ratio of the equivalent of the "sulfonamide compound" to the equivalent of the "bromine-based oxidant" or the "chlorine-based oxidant" is less than 1, the membrane may be degraded, and when it exceeds 2, the production cost will increase.
按有效氯濃度換算,接觸正滲透膜之全氯濃度宜為0.01至100mg/L。小於0.01mg/L時無法獲得充分之殺菌效果,且大於100mg/L時可能引起正滲透膜之劣化、配管等之腐蝕。Calculated by effective chlorine concentration, the total chlorine concentration in contact with the positive osmosis membrane should be between 0.01 and 100 mg/L. If it is less than 0.01 mg/L, it will not have a sufficient sterilization effect, and if it is greater than 100 mg/L, it may cause deterioration of the positive osmosis membrane and corrosion of the piping.
溴系氧化劑可舉例如:溴(液體溴)、氯化溴、溴酸、溴酸鹽、次溴酸等。次溴酸可為使溴化鈉等之溴化物與次氯酸等氯系氧化劑反應而生成者。Examples of bromine-based oxidants include bromine (liquid bromine), bromine chloride, bromic acid, bromate, hypobromous acid, etc. Hypobromous acid can be produced by reacting a bromide such as sodium bromide with a chlorine-based oxidant such as hypochlorous acid.
其中,使用溴之「溴及胺磺酸化合物(溴及胺磺酸化合物之混合物)」或「溴及胺磺酸化合物之反應生成物」的製劑,相較於「次氯酸、溴化合物及胺磺酸」之製劑及「氯化溴及胺磺酸」之製劑等,溴酸之副產物少且不會使正滲透膜更劣化,因此作為正滲透膜用之殺菌劑更理想。Among them, the preparation of "bromine and amine sulfonic acid compound (mixture of bromine and amine sulfonic acid compound)" or "reaction product of bromine and amine sulfonic acid compound" using bromine has less by-product of bromic acid and will not further deteriorate the forward osmosis membrane, compared with the preparation of "hypochlorous acid, bromine compound and amine sulfonic acid" and the preparation of "bromine chloride and amine sulfonic acid". Therefore, it is more ideal as a disinfectant for forward osmosis membrane.
即,本發明實施形態之正滲透膜處理方法宜使溴及胺磺酸化合物存在(使溴及胺磺酸化合物之混合物存在)被處理水中。此外,宜使溴及胺磺酸化合物之反應生成物存在被處理水中。That is, in the forward osmosis membrane treatment method of the embodiment of the present invention, bromine and sulfamic acid compound are preferably present in the water to be treated (a mixture of bromine and sulfamic acid compound is present). In addition, the reaction product of bromine and sulfamic acid compound is preferably present in the water to be treated.
溴化合物可舉例如:溴化鈉、溴化鉀、溴化鋰、溴化銨及溴化氫酸等。其中,由製劑成本等之方面來看,溴化鈉較佳。Bromine compounds include, for example, sodium bromide, potassium bromide, lithium bromide, ammonium bromide, and hydrobromide, etc. Among them, sodium bromide is preferred in terms of the cost of the preparation.
氯系氧化劑可舉例如:氯氣、二氧化氯、次氯酸或其鹽、亞氯酸或其鹽、氯酸或其鹽、過氯酸或其鹽、氯化異氰酸或其鹽等。其中,鹽可舉例如:次氯酸鈉、次氯酸鉀等之次氯酸鹼金屬鹽;次氯酸鈣、次氯酸鋇等之次氯酸鹼土金屬鹽;亞氯酸鈉、亞氯酸鉀等之亞氯酸鹼金屬鹽;亞氯酸鋇等之亞氯酸鹼土金屬鹽;亞氯酸鎳等之其他亞氯酸金屬鹽;氯酸銨、氯酸鈉、氯酸鉀等之氯酸鹼金屬鹽;氯酸鈣、氯酸鋇等之氯酸鹼土金屬鹽等。該等氯系氧化劑可單獨地使用一種或組合2種以上使用。由操作性等方面來看,氯系氧化劑宜使用次氯酸鈉。Examples of the chlorine-based oxidizing agent include chlorine gas, chlorine dioxide, hypochlorous acid or its salts, chlorous acid or its salts, chloric acid or its salts, perchloric acid or its salts, chloroisocyanate or its salts, and the like. Among them, the salts include, for example, hypochlorite metal salts such as sodium hypochlorite and potassium hypochlorite; hypochlorite earth metal salts such as calcium hypochlorite and barium hypochlorite; hypochlorite metal salts such as sodium chlorite and potassium chlorite; hypochlorite earth metal salts such as barium chlorite; other hypochlorite metal salts such as nickel chlorite; hypochlorite metal salts such as ammonium chlorate, sodium chlorate and potassium chlorate; hypochlorite earth metal salts such as calcium chlorate and barium chlorate. These chlorine-based oxidants can be used alone or in combination of two or more. From the perspective of operability, sodium hypochlorite is preferably used as the chlorine-based oxidant.
胺磺酸化合物係用以下通式(1)表示之化合物。 R 2NSO 3H (1) (式中,R係獨立地為氫原子或碳數1至8之烷基。) The sulfonamide compound is a compound represented by the following general formula (1). R 2 NSO 3 H (1) (wherein R is independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.)
胺磺酸化合物可舉例如:除了2個R基兩者均係氫原子之胺磺酸(醯胺硫酸)以外,N-甲基胺磺酸、N-乙基胺磺酸、N-丙基胺磺酸、N-異丙基胺磺酸、N-丁基胺磺酸等之2個R基中之一R基係氫原子且另一R基係碳數1至8之烷基的胺磺酸化合物;N,N-二甲基胺磺酸、N,N-二乙基胺磺酸、N,N-二丙基胺磺酸、N,N-二丁基胺磺酸、N-甲基-N-乙基胺磺酸、N-甲基-N-丙基胺磺酸等之2個R基兩者均係碳數1至8之烷基的胺磺酸化合物;N-苯胺磺酸等之2個R基中之一R基係氫原子且另一R基係碳數6至10之芳基的胺磺酸化合物;或其鹽等。胺磺酸鹽可舉例如:鈉鹽、鉀鹽等之鹼金屬鹽;鈣鹽、鍶鹽、鋇鹽等之鹼土金屬鹽;錳鹽、銅鹽、鋅鹽、鐵鹽、鈷鹽、鎳鹽等之其他金屬鹽;銨鹽及胍鹽等。胺磺酸化合物及其鹽可單獨地使用一種或組合2種以上使用。由環境負荷等方面來看,胺磺酸化合物使用胺磺酸(醯胺硫酸)較佳。Examples of the sulfonate compound include, in addition to sulfonate (amide sulfuric acid) in which both R groups are hydrogen atoms, sulfonate compounds in which one of the two R groups is a hydrogen atom and the other is an alkyl group having 1 to 8 carbon atoms, such as N-methylsulfonate, N-ethylsulfonate, N-propylsulfonate, N-isopropylsulfonate, and N-butylsulfonate; sulfonate compounds in which both of the two R groups are alkyl groups having 1 to 8 carbon atoms, such as N,N-dimethylsulfonate, N,N-diethylsulfonate, N,N-dipropylsulfonate, N,N-dibutylsulfonate, N-methyl-N-ethylsulfonate, and N-methyl-N-propylsulfonate; sulfonate compounds in which one of the two R groups is a hydrogen atom and the other is an aryl group having 6 to 10 carbon atoms, such as N-anilinesulfonate; or salts thereof. Examples of sulfonate salts include alkaline metal salts such as sodium salts and potassium salts; alkaline earth metal salts such as calcium salts, strontium salts, and barium salts; other metal salts such as manganese salts, copper salts, zinc salts, iron salts, cobalt salts, and nickel salts; ammonium salts and guanidine salts. Sulfonate compounds and their salts may be used alone or in combination of two or more. From the perspective of environmental load, sulfonate (sulfuric acid amide) is preferably used as the sulfonate compound.
在本實施形態之正滲透膜處理方法中,可進一步使鹼存在。鹼可舉例如:氫氧化鈉、氫氧化鉀等之氫氧化鹼等。由低溫之製品安定性等方面來看,可併用氫氧化鈉及氫氧化鉀。此外,鹼可非固形而是形成水溶液來使用。In the forward osmosis membrane treatment method of this embodiment, an alkali may be further present. Examples of the alkali include alkali hydroxides such as sodium hydroxide and potassium hydroxide. In view of the stability of the product at low temperatures, sodium hydroxide and potassium hydroxide may be used together. In addition, the alkali may be used in the form of an aqueous solution rather than a solid.
正滲透膜處理步驟中使用之正滲透膜的形狀沒有特別限制,但可使用例如中空紗膜、螺旋膜、管形膜、板底框構造之膜等。正滲透膜之膜材質可舉芳香族聚醯胺系、乙酸纖維素系、多酮系等為例。此外,亦可使用在分離膜之基材中組合機能性蛋白質及無機材料等以賦予分離性能及透水性等的膜。本實施形態之正滲透膜處理方法可理想地使用在芳香族聚醯胺系、醯胺系之基材中組合機能性蛋白質及無機材料等以賦予分離性能及透水性等的膜作為正滲透膜。已知的是該等膜特別容易受到因習知使用之氯系氧化劑造成的劣化影響。The shape of the forward osmosis membrane used in the forward osmosis membrane treatment step is not particularly limited, but for example, a hollow yarn membrane, a spiral membrane, a tubular membrane, a membrane with a plate bottom frame structure, etc. can be used. Examples of the membrane material of the forward osmosis membrane include aromatic polyamide series, cellulose acetate series, polyketone series, etc. In addition, a membrane in which functional proteins and inorganic materials are combined in the base material of the separation membrane to give separation performance and water permeability can also be used. The forward osmosis membrane treatment method of this embodiment can ideally use a membrane in which functional proteins and inorganic materials are combined in the base material of an aromatic polyamide series or an amide series to give separation performance and water permeability as a forward osmosis membrane. It is known that such membranes are particularly susceptible to deterioration caused by the chlorine-based oxidants commonly used.
正滲透膜可舉例如:HP5230(東洋紡製)、HFFO2(Aquaporin製)、OsmoF20(Fruid Technology Solutions製)。該等正滲透膜可單段地使用或串聯地連接多數段使用。即,可藉由第二正滲透膜處理進一步濃縮藉由第一正滲透膜處理製得之濃縮水。Examples of forward osmosis membranes include HP5230 (manufactured by Toyobo), HFFO2 (manufactured by Aquaporin), and OsmoF20 (manufactured by Fruid Technology Solutions). These forward osmosis membranes can be used in a single stage or in a plurality of stages connected in series. That is, the concentrated water obtained by the first forward osmosis membrane treatment can be further concentrated by the second forward osmosis membrane treatment.
但是,正滲透膜及逆滲透膜因其運轉方法不同,膜之構造、性質不同。逆滲透膜對膜之一次側施加高壓力,因此使膜厚為厚以保持可耐壓力之機械強度。另一方面,因為正滲透膜之施加於膜的壓力比逆滲透膜低,所以可沒有逆滲透膜情形之機械強度,且必須進一步抑制膜內部之濃度極化,因此需要使膜厚為薄。使膜最適合要求之運轉條件,結果逆滲透膜及正滲透膜雖然膜材質相同,但具有不同膜構造,因此透過性能、阻止性能不同。因此,將逆滲透膜處理中使用之逆滲透膜用於正滲透用途時,無法獲得充分之性能。However, because of their different operating methods, forward osmosis membranes and reverse osmosis membranes have different membrane structures and properties. Reverse osmosis membranes apply high pressure to the primary side of the membrane, so the membrane thickness is made thick to maintain mechanical strength that can withstand the pressure. On the other hand, because the pressure applied to the membrane of the forward osmosis membrane is lower than that of the reverse osmosis membrane, the mechanical strength of the reverse osmosis membrane does not have to be the same, and the concentration polarization inside the membrane must be further suppressed, so the membrane thickness needs to be made thin. The membrane is made to best suit the required operating conditions. As a result, although the reverse osmosis membrane and the forward osmosis membrane have the same membrane material, they have different membrane structures, so the permeation performance and blocking performance are different. Therefore, when the reverse osmosis membrane used in reverse osmosis membrane treatment is used for forward osmosis purposes, sufficient performance cannot be obtained.
正滲透膜處理步驟中使用之吸引溶液可舉例如:碳酸銨水溶液、鎂鹽水溶液、鈉鹽水溶液等之無機鹽水溶液;蔗糖、葡萄糖、有機性聚合物等之有機物水溶液;離子液體等。正滲透膜處理步驟中使用之稀薄吸引溶液可原封不動地使用在另一步驟中,或藉由對稀薄吸引溶液施加加熱、膜分離等之操作而由稀薄吸引溶液分離水,接著再利用製得之水及濃縮吸引溶液。在正滲透膜處理步驟中進行多數段正滲透膜處理時,可組合使用上述吸引溶液。The attracting solution used in the forward osmosis membrane treatment step may be, for example, an inorganic salt aqueous solution such as an aqueous solution of ammonium carbonate, an aqueous solution of magnesium salt, an aqueous solution of sodium salt, etc.; an organic aqueous solution such as sucrose, glucose, an organic polymer, etc.; an ionic liquid, etc. The dilute attracting solution used in the forward osmosis membrane treatment step may be used in another step as is, or water may be separated from the dilute attracting solution by heating the dilute attracting solution, performing membrane separation, etc., and then the obtained water and concentrated attracting solution may be reused. When multiple stages of forward osmosis membrane treatment are performed in the forward osmosis membrane treatment step, the above-mentioned attracting solutions may be used in combination.
被處理水(FO被處理水)沒有特別限制,但可舉例如:工業用水、表層水、自來水、地下水、海水、藉由逆滲透法或蒸發法使海水脫鹽之海水淡化處理水、例如在半導體製程等中排出之排水等的各種排水。The water to be treated (FO treated water) is not particularly limited, but examples thereof include industrial water, surface water, tap water, groundwater, seawater, desalinated water obtained by desalination of seawater by reverse osmosis or evaporation, and various types of wastewater such as wastewater discharged in semiconductor manufacturing processes.
被處理水之pH係在例如2至12之範圍內,且在4至11之範圍內較佳。被處理水之pH小於2或超過12時,正滲透膜會劣化。The pH of the treated water is, for example, in the range of 2 to 12, and preferably in the range of 4 to 11. When the pH of the treated water is less than 2 or exceeds 12, the positive osmosis membrane deteriorates.
在正滲透膜處理裝置中,被處理水為pH5.5以上且產生水垢時,可與上述殺菌劑併用分散劑以抑制水垢。分散劑可舉例如:聚丙烯酸、聚順丁烯二酸、膦酸等。分散劑對被處理水之添加量係例如按FO濃縮水中之濃度計在0.1至1,000mg/L之範圍內。In a forward osmosis membrane treatment device, when the treated water has a pH of 5.5 or above and scale is generated, a dispersant can be used together with the above-mentioned bactericide to inhibit scale. Examples of dispersants include polyacrylic acid, polymaleic acid, phosphonic acid, etc. The amount of dispersant added to the treated water is, for example, in the range of 0.1 to 1,000 mg/L based on the concentration in FO concentrated water.
此外,為了在未使用分散劑之情形下控制水垢之發生,例如,可調整正滲透膜處理裝置之回收率、水溫、pH等之運轉條件,使FO濃縮水中之二氧化矽濃度在溶解度以下且使作為鈣水垢之指標的藍氏(Langelier)指數為0以下。Furthermore, in order to control the occurrence of scaling when a dispersant is not used, for example, the operating conditions of the forward osmosis membrane treatment device, such as the recovery rate, water temperature, and pH, can be adjusted so that the concentration of silica in the FO concentrated water is below the solubility and the Langelier index, which is an indicator of calcium scaling, is below 0.
正滲透膜處理系統之用途可舉例如:海水淡化、排水減容化、有價物之濃縮、食品及飲料之濃縮等。Forward osmosis membrane treatment systems are used in, for example, seawater desalination, wastewater volume reduction, concentration of valuables, and concentration of food and beverages.
<水處理方法、水處理系統> 接著,說明使用上述正滲透膜處理方法、正滲透膜處理系統之水處理方法、水處理系統。 <Water treatment method, water treatment system> Next, a water treatment method and a water treatment system using the above-mentioned forward osmosis membrane treatment method and forward osmosis membrane treatment system will be described.
本發明實施形態之水處理方法係包含上述正滲透膜處理方法,且在正滲透膜處理步驟之前段中包含前處理步驟及逆滲透膜處理步驟,並且在前處理步驟中使用藉由正滲透膜處理步驟製得之稀薄吸引溶液的水處理方法。此外,本發明實施形態之水處理系統係具有上述正滲透膜處理系統,且在正滲透膜處理設備之前段中具有前處理設備及逆滲透膜處理設備,並且在前處理設備中使用藉由正滲透膜處理設備製得之稀薄吸引溶液的水處理系統。The water treatment method of the embodiment of the present invention includes the forward osmosis membrane treatment method described above, and includes a pre-treatment step and a reverse osmosis membrane treatment step in the preceding stage of the forward osmosis membrane treatment step, and uses the dilute draw solution obtained by the forward osmosis membrane treatment step in the pre-treatment step. In addition, the water treatment system of the embodiment of the present invention includes the forward osmosis membrane treatment system described above, and includes a pre-treatment device and a reverse osmosis membrane treatment device in the preceding stage of the forward osmosis membrane treatment device, and uses the dilute draw solution obtained by the forward osmosis membrane treatment device in the pre-treatment device.
以下在圖12中顯示本發明實施形態之一水處理系統例的概略,且說明其結構。FIG. 12 shows an overview of an example of a water treatment system according to an embodiment of the present invention, and explains its structure.
本實施形態之水處理系統9具有:前處理裝置114,其作為進行被處理水之前處理的前處理設備;逆滲透膜處理裝置118,其作為進行藉由前處理製得之前處理水的逆滲透膜處理且製得RO濃縮水及RO透過水的逆滲透膜處理設備;及正滲透膜處理裝置14,其作為進行藉由逆滲透膜處理製得之RO濃縮水的正滲透膜處理的正滲透膜處理設備。水處理系統9可具有濁質去除裝置116,作為進行藉由前處理製得之前處理水的濁質去除處理的濁質去除設備。The water treatment system 9 of this embodiment has: a
在圖12之水處理系統9中,被處理水配管120連接於前處理裝置114之前處理水入口,且前處理裝置114之出口及濁質去除裝置116之入口藉由配管122連接,並且濁質去除裝置116之出口及逆滲透膜處理裝置118之入口藉由配管124連接。逆滲透膜處理裝置118之RO濃縮水出口及正滲透膜處理裝置14之FO前處理水入口藉由FO被處理水配管16連接,且RO透過水配管126連接於逆滲透膜處理裝置118之RO透過水出口。吸引溶液配管24連接於正滲透膜處理裝置14之吸引溶液入口,且正滲透膜處理裝置14之稀薄吸引溶液出口及前處理裝置114之稀薄吸引溶液入口藉由稀薄吸引溶液配管26連接,並且FO濃縮水配管28連接於正滲透膜處理裝置14之FO濃縮水出口。逆洗排水配管128亦可連接於濁質去除裝置116之逆洗排水出口。In the water treatment system 9 of FIG. 12 , the treated
以下說明本實施形態之水處理方法及水處理系統9的動作。The following describes the operation of the water treatment method and water treatment system 9 of this embodiment.
被處理水通過被處理水配管120輸送至前處理裝置114。在前處理裝置114中,進行被處理水含有之溶解性二氧化矽、硬度成分等的去除處理(前處理步驟)。The water to be treated is transported to the
被處理水包含溶解性二氧化矽時,前處理裝置114具有例如:鎂反應設備,其將鎂鹽添加至被處理水中使其反應,使溶解性二氧化矽不溶化;凝集處理設備,其將凝集劑添加至反應後之被處理水中使其凝集;及固液分離設備,其由凝集處理後之被處理水分離凝集物。前處理裝置114中,在例如鹼條件(例如,pH10至12)下將鎂鹽添加至被處理水中,使溶解性二氧化矽不溶化(鎂反應步驟)。然後,依需要添加凝集劑以進行凝集處理(凝集處理步驟),使凝集物固液分離(固液分離步驟)。藉由固液分離製得之固液分離處理水作為前處理水通過配管122輸送至濁質去除裝置116,接著藉由UF膜等進行濁質去除處理,並在去除濁質成分等後(濁質去除步驟),輸送至逆滲透膜處理裝置118。When the treated water contains soluble silica, the
被處理水包含硬度成分,且藉由石灰軟化法進行硬度成分之去除時,前處理裝置114具有例如:鹼劑反應設備,其將鹼劑添加至被處理水中使其反應,使硬度成分不溶化;凝集處理設備,其依需要將凝集劑添加至反應後之被處理水中使其凝集;及固液分離設備,其由凝集處理後之被處理水分離凝集物。前處理裝置114中,例如將鹼劑添加至被處理水中,使硬度成分不溶化(鹼劑反應步驟)。然後,依需要添加凝集劑以進行凝集處理(凝集處理步驟),使凝集物固液分離(固液分離步驟)。藉由固液分離製得之固液分離處理水作為前處理水通過配管122輸送至濁質去除裝置116,接著藉由UF膜等進行濁質去除處理,並在去除濁質成分等後(濁質去除步驟),輸送至逆滲透膜處理裝置118。When the treated water contains hardness components and the hardness components are removed by lime softening, the
被處理水包含硬度成分,且藉由樹脂軟化法進行硬度成分之去除時,前處理裝置114具有例如使用離子交換樹脂等進行離子交換處理之離子交換處理設備。前處理裝置114中,例如將被處理水通至填充離子交換樹脂作為離子交換處理設備之離子交換塔,並吸附去除硬度成分(離子交換步驟)。將藉由離子交換處理製得之前處理水通過配管122輸送至濁質去除裝置116,接著藉由UF膜等進行濁質去除處理,並在去除濁質成分等後(濁質去除步驟),輸送至逆滲透膜處理裝置118。離子交換樹脂需要再生時,藉由通過再生劑再生離子交換樹脂。When the water to be treated contains hardness components and the hardness components are removed by a resin softening method, the
接著,在逆滲透膜處理裝置118中逆滲透膜處理濁質去除處理後之前處理水,製得RO濃縮水及RO透過水(逆滲透膜處理步驟)。藉由逆滲透膜處理製得之RO濃縮水作為FO被處理水通過FO被處理水配管16輸送至正滲透膜處理裝置14之一次側,且RO透過水通過RO透過水配管126排出。此外,在濁質去除裝置116中,可每隔預定時間進行膜之逆洗。例如,供給RO透過水等至濁質去除裝置116作為逆洗水,且逆洗排水通過逆洗排水配管128排出。Next, the treated water after the turbidity removal treatment is treated by reverse osmosis membrane in the reverse osmosis
在正滲透膜處理裝置14中正滲透膜處理藉由逆滲透膜處理製得之RO濃縮水(正滲透膜處理步驟)。在正滲透膜處理裝置14中,吸引溶液通過吸引溶液配管24輸送至正滲透膜之二次側,接著透過正滲透膜,使RO濃縮水及吸引溶液存在,藉此利用滲透壓使水移動至吸引溶液。The RO concentrated water obtained by the reverse osmosis membrane treatment is treated by the forward osmosis membrane in the forward osmosis membrane treatment device 14 (forward osmosis membrane treatment step). In the forward osmosis
在此,使包含溴系氧化劑或氯系氧化劑及胺磺酸化合物之正滲透膜用殺菌劑存在RO濃縮水(FO被處理水)中。例如,正滲透膜用殺菌劑通過殺菌劑添加配管112在FO被處理水配管16中添加至RO濃縮水(FO被處理水)中。亦可在正滲透膜處理裝置14之前段,例如逆滲透膜處理裝置118與正滲透膜處理裝置14之間另外設置貯存RO濃縮水(FO被處理水)之FO被處理水槽,且在FO被處理水槽中添加正滲透膜用殺菌劑。Here, a forward osmosis membrane bactericide containing a bromine-based oxidant or a chlorine-based oxidant and an amine sulfonic acid compound is allowed to exist in RO concentrated water (FO treated water). For example, the forward osmosis membrane bactericide is added to the RO concentrated water (FO treated water) in the FO treated
該正滲透膜用殺菌劑對正滲透膜發揮比習知之氯系殺菌劑、氧化劑、有機系殺菌劑更充分之殺菌效果。藉由在本實施形態之水處理方法中使用上述正滲透膜用殺菌劑,殺菌有效成分幾乎未透過正滲透膜,因此可在前處理中使用藉由正滲透膜處理稀釋之稀薄吸引溶液且可再利用稀薄吸引溶液。稀薄吸引溶液中含有有機系殺菌劑時,在濁質去除裝置116之逆洗排水及逆滲透膜處理裝置118之RO透過水中包含殺菌有效成分。稀薄吸引溶液中含有氯系殺菌劑或氧化劑時,氯系殺菌劑或氧化劑流入濁質去除裝置116或逆滲透膜處理裝置118時使膜劣化。使用上述正滲透膜用殺菌劑時,因為殺菌有效成分幾乎未透過正滲透膜,所以可抑制如此之風險。The forward osmosis membrane disinfectant exerts a more effective disinfection effect on the forward osmosis membrane than the conventional chlorine disinfectants, oxidants, and organic disinfectants. By using the forward osmosis membrane disinfectant in the water treatment method of the present embodiment, the bactericidal active ingredients hardly pass through the forward osmosis membrane, so the dilute attracting solution diluted by the forward osmosis membrane treatment can be used in the pretreatment and the dilute attracting solution can be reused. When the dilute attracting solution contains the organic disinfectant, the backwash drainage of the
正滲透膜處理步驟中使用之稀薄吸引溶液通過稀薄吸引溶液配管26輸送至前處理裝置114,並在前處理裝置114中在前處理步驟中使用。藉由正滲透膜處理步驟製得之FO濃縮水通過FO濃縮水配管28排出。FO濃縮水可回收、再利用。The dilute draw solution used in the forward osmosis membrane treatment step is transported to the
前處理裝置114包含進行溶解性二氧化矽去除之裝置時,例如,可使用鎂鹽水溶液作為正滲透膜處理裝置14中之吸引溶液,且可使用正滲透膜處理裝置14中使用之稀薄吸引溶液(鎂鹽稀薄水溶液)作為在前處理裝置114中添加之鎂鹽。When the
前處理裝置114包含藉由石灰軟化法進行硬度成分之去除的裝置時,例如,可使用例如鹼劑水溶液作為正滲透膜處理裝置14中之吸引溶液,且可使用正滲透膜處理裝置14中使用之稀薄吸引溶液(鹼劑稀薄水溶液)作為在前處理裝置114中添加之鹼劑。When the
前處理裝置114包含藉由樹脂軟化法進行硬度成分之去除的裝置時,例如,可使用酸水溶液或氯化鈉水溶液作為正滲透膜處理裝置14中之吸引溶液,且正滲透膜處理裝置14中使用之稀薄吸引溶液(酸稀薄水溶液或氯化鈉稀薄水溶液)可在前處理裝置114中作為離子交換樹脂之再生劑使用。When the
藉由本實施形態之水處理方法及水處理裝置,可用低成本處理例如包含溶解性二氧化矽及硬度成分中之至少一者的被處理水。By using the water treatment method and water treatment apparatus of the present embodiment, water to be treated containing at least one of soluble silica and a hardness component, for example, can be treated at low cost.
因為在前處理步驟中使用藉由正滲透膜處理稀釋之稀薄吸引溶液,所以可減少本來需要之再利用吸引溶液的必要成本且不需要再生設備。因為稀薄吸引溶液只是稀釋前處理步驟中本來使用之吸引溶液,所以幾乎不產生追加之成本。Since the dilute draw solution diluted by the positive osmosis membrane is used in the pre-treatment step, the necessary cost of reusing the draw solution that is originally required can be reduced and no regeneration equipment is required. Since the dilute draw solution is only used to dilute the draw solution originally used in the pre-treatment step, there is almost no additional cost.
作為本實施形態之水處理方法及水處理裝置之處理對象的被處理水沒有特別限制,但可為例如包含溶解性二氧化矽及硬度成分中之至少一者的水,且可舉例如:工業用水、表層水、自來水、地下水、海水、藉由逆滲透法或蒸發法使海水脫鹽之海水淡化處理水、例如在半導體製程中排出之排水等的各種排水。The water to be treated as the treatment object of the water treatment method and the water treatment device of this embodiment is not particularly limited, but can be, for example, water containing at least one of soluble silica and hardness components, and can include: industrial water, surface water, tap water, groundwater, seawater, desalinated water obtained by desalting seawater by reverse osmosis or evaporation, various wastewaters such as wastewater discharged in semiconductor manufacturing processes, etc.
被處理水中含有溶解性二氧化矽時,溶解性二氧化矽之濃度係在例如5至400mg/L之範圍內。被處理水中含有硬度成分時,鈣硬度成分之濃度係在例如5至600mg/L之範圍內。被處理水中之全蒸發殘留物(TDS:全部溶解固體量(Total Dissolved Solid)係在例如100至50000mg/L之範圍內。When the treated water contains dissolved silica, the concentration of dissolved silica is, for example, in the range of 5 to 400 mg/L. When the treated water contains hardness components, the concentration of calcium hardness components is, for example, in the range of 5 to 600 mg/L. The total evaporation residue (TDS: Total Dissolved Solid) in the treated water is, for example, in the range of 100 to 50,000 mg/L.
在本實施形態之水處理方法及水處理裝置中,被處理水包含溶解性二氧化矽及硬度成分兩者時,前處理設備(前處理步驟)可具有溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟)及硬度成分去除設備(硬度成分去除步驟)兩者。溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟)及硬度成分去除設備(硬度成分去除步驟)之順序可第一是溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟),第二是硬度成分去除設備(硬度成分去除步驟),或第一是硬度成分去除設備(硬度成分去除步驟),第二是溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟)。In the water treatment method and water treatment apparatus of the present embodiment, when the water to be treated contains both soluble silica and hardness components, the pretreatment device (pretreatment step) may include both a soluble silica removal device (soluble silica removal step) and a hardness component removal device (hardness component removal step). The order of the soluble silica removal device (soluble silica removal step) and the hardness component removal device (hardness component removal step) may be the soluble silica removal device (soluble silica removal step) first and the hardness component removal device (hardness component removal step) second, or the hardness component removal device (hardness component removal step) first and the soluble silica removal device (soluble silica removal step) second.
此時,使用鎂鹽水溶液、鹼劑水溶液、酸水溶液及氯化鈉水溶液中之至少一者作為正滲透膜處理裝置14(正滲透膜處理步驟)中之吸引溶液,且正滲透膜處理裝置14中使用之稀薄吸引溶液(鎂鹽稀薄水溶液、鹼劑稀薄水溶液、酸稀薄水溶液及氯化鈉稀薄水溶液中之至少一者)可使用在前處理裝置114(前處理步驟)之溶解性二氧化矽去除設備(溶解性二氧化矽去除步驟)及硬度成分去除設備(硬度成分去除步驟)中適合的方面。At this time, at least one of a magnesium salt aqueous solution, an alkali aqueous solution, an acid aqueous solution and a sodium chloride aqueous solution is used as the attracting solution in the forward osmosis membrane treatment device 14 (forward osmosis membrane treatment step), and the dilute attracting solution (at least one of a dilute magnesium salt aqueous solution, a dilute alkali aqueous solution, a dilute acid aqueous solution and a dilute sodium chloride aqueous solution) used in the forward osmosis
濁質去除設備可舉例如:砂過濾裝置、超過濾(UF)膜等之膜過濾裝置、加壓浮選裝置等。濁質去除設備之設置位置沒有特別限制,例如前處理裝置114(前處理步驟)之前段或前處理裝置114(前處理步驟)與逆滲透膜處理裝置118(逆滲透膜處理步驟)之間。The filth removal device may be, for example, a sand filter, a membrane filter such as an ultrafiltration (UF) membrane, a pressurized flotation device, etc. There is no particular limitation on the location of the filth removal device, such as the front section of the pre-treatment device 114 (pre-treatment step) or between the pre-treatment device 114 (pre-treatment step) and the reverse osmosis membrane treatment device 118 (reverse osmosis membrane treatment step).
前處理步驟之細節係如前所述。在溶解性二氧化矽去除及石灰軟化法之硬度成分去除中,藉由固液分離製得之前處理水可輸送至逆滲透膜處理裝置118或通過濁質去除裝置116輸送至逆滲透膜處理裝置118。在樹脂軟化法之硬度成分去除中,藉由離子交換處理製得之前處理水可輸送至逆滲透膜處理裝置118或通過濁質去除裝置116輸送至逆滲透膜處理裝置118。The details of the pre-treatment step are as described above. In the removal of dissolved silica and hardness components in the lime softening method, the pre-treated water obtained by solid-liquid separation can be transported to the reverse osmosis
可使包含溴系氧化劑或氯系氧化劑及胺磺酸化合物之殺菌劑(「正滲透膜用殺菌劑」)存在圖1至3之水處理裝置1、3、5中作為FO被處理水的濃縮水中。例如,正滲透膜用殺菌劑通過殺菌劑添加配管在濃縮水配管20中添加至FO被處理水(濃縮水)中。亦可在正滲透膜處理裝置14之前段,例如逆滲透膜處理裝置12與正滲透膜處理裝置14之間另外設置貯存FO被處理水(濃縮水)之濃縮水槽,且在濃縮水槽中添加正滲透膜用殺菌劑。A bactericide containing a bromine-based oxidant or a chlorine-based oxidant and an amine sulfonic acid compound ("bactericide for forward osmosis membrane") can be allowed to exist in concentrated water as FO treated water in the
[逆滲透膜處理步驟] 近來作為主流之聚醯胺系高分子膜可理想地作為逆滲透膜處理步驟中使用之逆滲透膜使用。聚醯胺系高分子膜對氧化劑之耐性比較低,因此使游離氯等連續地接觸聚醯胺系高分子膜時膜性能顯著地降低。但是,藉由在本實施形態之水處理方法中使用上述正滲透膜用殺菌劑,殺菌有效成分幾乎未透過正滲透膜,因此即使聚醯胺系高分子膜亦幾乎不產生如此顯著之膜性能降低。 [Reverse osmosis membrane treatment step] The polyamide polymer membrane, which has become the mainstream recently, can be used ideally as the reverse osmosis membrane used in the reverse osmosis membrane treatment step. The polyamide polymer membrane has a relatively low resistance to oxidants, so when free chlorine and the like continuously contact the polyamide polymer membrane, the membrane performance is significantly reduced. However, by using the above-mentioned forward osmosis membrane disinfectant in the water treatment method of this embodiment, the bactericidal active ingredients hardly pass through the forward osmosis membrane, so even the polyamide polymer membrane hardly produces such a significant reduction in membrane performance.
逆滲透膜處理可串聯或並聯多數逆滲透膜處理來使用。可藉由第二、第三逆滲透膜處理進一步濃縮藉由第一逆滲透膜處理製得之濃縮水,或可藉由對藉由第一逆滲透膜處理製得之透過水實施另外之逆滲透膜處理,進一步提高水質。Reverse osmosis membrane treatment can be used by connecting multiple reverse osmosis membrane treatments in series or in parallel. The concentrated water obtained by the first reverse osmosis membrane treatment can be further concentrated by the second and third reverse osmosis membrane treatments, or the permeate obtained by the first reverse osmosis membrane treatment can be subjected to another reverse osmosis membrane treatment to further improve the water quality.
逆滲透膜處理步驟中使用之逆滲透膜,除了使用於純水製造用途及排水回收等之用途的超低壓逆滲透膜、低壓逆滲透膜以外,可舉使用於海水淡化等用途之中壓逆滲透膜及高壓逆滲透膜等為例。超低壓逆滲透膜、低壓逆滲透膜可舉例如:ES15(日東電工製)、TM720D(TORAY製)、BW30HRLE(Dow Chemical製)、LFC3-LD(Hydranautics製)。高壓逆滲透膜可舉例如:SWC5-LD(Hydranautics製)、TM820V(TORAY製)、XUS180808(Dow Chemical製)等。使用多數段逆滲透膜步驟時,可依據各段之被處理水的TDS、pH、水溫等之條件來選擇不同種類之膜。The reverse osmosis membrane used in the reverse osmosis membrane treatment step includes ultra-low pressure reverse osmosis membrane and low pressure reverse osmosis membrane used for pure water production and wastewater recovery, as well as medium pressure reverse osmosis membrane and high pressure reverse osmosis membrane used for seawater desalination. Examples of ultra-low pressure reverse osmosis membrane and low pressure reverse osmosis membrane include ES15 (manufactured by Nitto Denko), TM720D (manufactured by TORAY), BW30HRLE (manufactured by Dow Chemical), and LFC3-LD (manufactured by Hydranautics). Examples of high pressure reverse osmosis membrane include SWC5-LD (manufactured by Hydranautics), TM820V (manufactured by TORAY), and XUS180808 (manufactured by Dow Chemical). When using multiple reverse osmosis membrane steps, different types of membranes can be selected according to the TDS, pH, water temperature and other conditions of the water being treated in each stage.
在濃縮處理步驟中,亦可添加pH調整劑、抑制在系內之無機鹽結垢的水垢分散劑、抑制在系內產生微生物之殺菌劑等的藥品。In the concentration step, pH adjusters, scale dispersants to inhibit scaling of inorganic salts in the system, and fungicides to inhibit the growth of microorganisms in the system may also be added.
<正滲透膜用殺菌劑> 本實施形態之正滲透膜用殺菌劑含有包含「溴系氧化劑或氯系氧化劑」及「胺磺酸化合物」之混合物的安定化次溴酸組成物的殺菌劑或安定化次氯酸組成物,且可進一步含有鹼。 <Bactericide for positive osmotic membrane> The bactericide for positive osmotic membrane of this embodiment contains a bactericide of a stabilized hypobromous acid composition containing a mixture of a "bromine-based oxidant or a chlorine-based oxidant" and a "sulfonamic acid compound" or a stabilized hypochlorous acid composition, and may further contain an alkali.
本實施形態之正滲透膜用殺菌劑含有包含「溴系氧化劑及胺磺酸化合物之反應生成物」之安定化次溴酸組成物或包含「氯系氧化劑及胺磺酸化合物之反應生成物」之安定化次氯酸組成物,且可進一步含有鹼。The positive osmotic membrane disinfectant of this embodiment contains a stabilized hypobromous acid composition comprising "a reaction product of a bromine-based oxidant and an amide sulfonic acid compound" or a stabilized hypochlorous acid composition comprising "a reaction product of a chlorine-based oxidant and an amide sulfonic acid compound", and may further contain an alkali.
溴系氧化劑、溴化合物、氯系氧化劑及胺磺酸化合物係如上所述。The bromine-based oxidizing agent, the bromine compound, the chlorine-based oxidizing agent, and the sulfamic acid compound are as described above.
包含氯系氧化劑及胺磺酸化合物之安定化次氯酸組成物的市售品可舉栗田工業公司(股)製之「KURIVERTER IK-110」為例。An example of a commercially available product of a stabilized hypochlorous acid composition containing a chlorine-based oxidant and an amide sulfonic acid compound is "KURIVERTER IK-110" manufactured by Kurita Industries Co., Ltd.
為了不使正滲透膜進一步劣化,本實施形態之正滲透膜用殺菌劑宜為含有溴及胺磺酸化合物者(含有溴及胺磺酸化合物之混合物者),例如含有溴、胺磺酸化合物、鹼及水之混合物,或溴及胺磺酸化合物之反應生成物者,例如溴與胺磺酸化合物之反應生成物、鹼及水的混合物。In order to prevent the forward osmosis membrane from being further deteriorated, the forward osmosis membrane disinfectant of this embodiment is preferably one containing bromine and an amine sulfonic acid compound (one containing a mixture of bromine and an amine sulfonic acid compound), for example, a mixture of bromine, an amine sulfonic acid compound, an alkali and water, or a reaction product of bromine and an amine sulfonic acid compound, for example, a mixture of a reaction product of bromine and an amine sulfonic acid compound, an alkali and water.
本實施形態之正滲透膜用殺菌劑中,含有包含溴系氧化劑及胺磺酸化合物之安定化次溴酸組成物的殺菌劑,特別是含有包含溴及胺磺酸化合物之安定化次溴酸組成物的殺菌劑,相較於包含氯系氧化劑及胺磺酸化合物之殺菌劑(氯胺磺酸等),雖然氧化力高且污泥抑制力、污泥剝離力顯著地高,但幾乎未引起如相同氧化力高之次氯酸的顯著膜劣化。在通常之使用濃度下,可實質地忽視對膜劣化之影響。因此,作為殺菌劑最適當。The disinfectant for positive osmosis membrane of this embodiment includes a disinfectant containing a stabilized hypobromous acid composition including a bromine-based oxidant and an amine sulfonic acid compound, and in particular, a disinfectant containing a stabilized hypobromous acid composition including bromine and an amine sulfonic acid compound. Compared with disinfectants containing a chlorine-based oxidant and an amine sulfonic acid compound (chloramine sulfonic acid, etc.), although the oxidizing power is high and the sludge inhibition power and sludge stripping power are significantly high, it hardly causes significant membrane degradation like hypochlorous acid with the same high oxidizing power. At normal use concentrations, the effect on membrane degradation can be substantially ignored. Therefore, it is most suitable as a disinfectant.
本實施形態之正滲透膜用殺菌劑與次氯酸等之殺菌劑不同,因為幾乎未透過正滲透膜,所以幾乎不會影響稀薄吸引溶液。此外,可與次氯酸等同樣地在現場測量濃度,因此可進行更正確之濃度管理。The forward osmosis membrane disinfectant of this embodiment is different from the disinfectant of hypochlorous acid, etc., because it hardly passes through the forward osmosis membrane, so it has almost no effect on the dilute absorption solution. In addition, the concentration can be measured on site like hypochlorous acid, so more accurate concentration management can be performed.
正滲透膜用殺菌劑之pH係例如超過13.0,且超過13.2更佳。正滲透膜用殺菌劑之pH係13.0以下時,正滲透膜用殺菌劑中之有效鹵素會不安定。The pH of the forward osmotic membrane disinfectant is, for example, higher than 13.0, and more preferably higher than 13.2. When the pH of the forward osmotic membrane disinfectant is lower than 13.0, the effective halogen in the forward osmotic membrane disinfectant may be unstable.
正滲透膜用殺菌劑中之溴酸濃度宜小於5mg/kg。正滲透膜用殺菌劑中之溴酸濃度係5mg/kg以上時,稀薄吸引溶液之溴酸離子濃度會升高。The concentration of bromic acid in the positive osmotic membrane disinfectant should be less than 5 mg/kg. When the concentration of bromic acid in the positive osmotic membrane disinfectant is above 5 mg/kg, the concentration of bromic acid ions in the dilute attracting solution will increase.
<正滲透膜用殺菌劑之製造方法> 本實施形態之正滲透膜用殺菌劑係藉由混合溴系氧化劑或氯系氧化劑及胺磺酸化合物製得,且可進一步混合鹼。 <Manufacturing method of bactericide for positive osmosis membrane> The bactericide for positive osmosis membrane of this embodiment is prepared by mixing a bromine-based oxidant or a chlorine-based oxidant and an amine sulfonic acid compound, and can further be mixed with a base.
含有包含溴及胺磺酸化合物之安定化次溴酸組成物的正滲透膜用殺菌劑製造方法宜包含以下步驟:在惰性氣體環境下將溴添加至包含水、鹼及胺磺酸化合物之混合液中使其反應,或在惰性氣體環境下將溴添加至包含水、鹼及胺磺酸化合物之混合液中。藉由在惰性氣體環境下添加使其反應或在惰性氣體環境下添加,正滲透膜用殺菌劑中之溴酸離子濃度降低,因此稀薄吸引溶液中之溴酸離子濃度降低。The method for producing a forward osmotic membrane disinfectant containing a stabilized hypobromous acid composition comprising bromine and an amine sulfonic acid compound preferably comprises the following steps: adding bromine to a mixed solution comprising water, an alkali and an amine sulfonic acid compound in an inert gas environment to react, or adding bromine to a mixed solution comprising water, an alkali and an amine sulfonic acid compound in an inert gas environment. By adding to react in an inert gas environment or adding in an inert gas environment, the concentration of bromic acid ions in the forward osmotic membrane disinfectant is reduced, thereby reducing the concentration of bromic acid ions in the dilute attracting solution.
使用之惰性氣體沒有特別限制,但由製造等方面來看宜為氮及氬中之至少一者,且由製造成本方面來看氮特別好。The inert gas used is not particularly limited, but from the perspective of manufacturing and the like, it is preferably at least one of nitrogen and argon, and nitrogen is particularly preferred from the perspective of manufacturing cost.
溴添加時之反應器內的氧濃度宜為6%以下,但4%以下較佳,2%以下更佳,且1%以下特佳。溴反應時之反應器內的氧濃度超過6%時,反應系內之溴酸生成量會增加。The oxygen concentration in the reactor during bromine addition is preferably 6% or less, preferably 4% or less, more preferably 2% or less, and particularly preferably 1% or less. When the oxygen concentration in the reactor during bromine reaction exceeds 6%, the amount of bromic acid generated in the reaction system will increase.
相對正滲透膜用殺菌劑全體之量的溴添加率宜為25重量%以下,且1重量%以上20重量%以下更佳。相對正滲透膜用殺菌劑全體之量的溴添加率超過25重量%時,反應系內之溴酸生成量會增加。小於1重量%時,殺菌力會很差。The bromine addition rate relative to the total amount of the forward osmosis membrane bactericidal agent is preferably 25% by weight or less, and more preferably 1% by weight or more and 20% by weight or less. When the bromine addition rate relative to the total amount of the forward osmosis membrane bactericidal agent exceeds 25% by weight, the amount of bromic acid generated in the reaction system will increase. When it is less than 1% by weight, the bactericidal power will be very poor.
溴添加時之反應溫度宜控制在0℃以上25℃以下之範圍內,但由製造成本等方面來看,控制在0℃以上15℃以下之範圍內更佳。溴添加時之反應溫度超過25℃時,反應系內之溴酸生成量會增加,且小於0℃時會凍結。 實施例 The reaction temperature when bromine is added should be controlled within the range of 0°C to 25°C, but from the perspective of manufacturing costs, it is better to control it within the range of 0°C to 15°C. When the reaction temperature when bromine is added exceeds 25°C, the amount of bromic acid generated in the reaction system will increase, and it will freeze when it is less than 0°C. Example
以下,列舉實施例及比較例,更具體地詳細說明本發明,但本發明不限於以下實施例。The present invention will be described in more detail below with reference to embodiments and comparative examples, but the present invention is not limited to the following embodiments.
<實施例1>
對包含TDS100ppm、溶解性二氧化矽15ppm之工業用水使用圖1記載之水處理裝置實施濃縮處理。藉由逆滲透膜處理裝置,濃縮到TDS8%為止。將該濃縮水供給至正滲透膜處理裝置(正滲透膜:HP5230(東洋紡製)),接著供給30重量%氯化鎂溶液作為吸引溶液,製得TDS20%之FO濃縮水。藉由正滲透膜處理稀釋之稀薄氯化鎂溶液原封不動地添加至溶解性二氧化矽去除裝置中。算出用於正滲透膜處理之能量成本。結果顯示於表1中。
<Example 1>
Industrial water containing TDS 100ppm and dissolved silica 15ppm was concentrated using the water treatment device shown in Figure 1. The water was concentrated to
<比較例1>
在實施例1使用之水處理裝置中,實施用蒸發器取代正滲透膜處理裝置之濃縮操作,同樣地製得TDS20%之濃縮水。算出用於蒸發器之能量成本並與實施例1比較。結果顯示於表1中。
<Comparative Example 1>
In the water treatment device used in Example 1, the evaporator is used to replace the concentration operation of the forward osmosis membrane treatment device to produce concentrated water with
<比較例2> 在實施例1使用之水處理裝置中,使用30重量%碳酸銨溶液作為正滲透膜處理裝置之吸引溶液,同樣地製得TDS20%之濃縮水。將藉由正滲透膜處理稀釋之稀薄碳酸銨溶液輸送至再生裝置,並藉由熱實施再生(再生步驟)。算出用於正滲透膜處理之能量成本(包含供應至再生步驟之能量)。結果顯示於表1中。 <Comparative Example 2> In the water treatment device used in Example 1, a 30 wt% ammonium carbonate solution was used as the suction solution of the forward osmosis membrane treatment device, and concentrated water with a TDS of 20% was similarly produced. The dilute ammonium carbonate solution diluted by the forward osmosis membrane treatment was transported to the regeneration device and regenerated by heat (regeneration step). The energy cost for the forward osmosis membrane treatment (including the energy supplied to the regeneration step) was calculated. The results are shown in Table 1.
[表1]
如此,可了解的是藉由實施例1之處理方法,相較於比較例1、2之處理方法,可用低能量成本濃縮,因此可用低成本處理包含溶解性二氧化矽及硬度成分中之至少一者的被處理水。Thus, it can be understood that the treatment method of Example 1 can be concentrated at a low energy cost compared to the treatment methods of Comparative Examples 1 and 2, and thus the treated water containing at least one of soluble silica and hardness components can be treated at a low cost.
<實施例2>
對包含TDS100ppm、溶解性二氧化矽15ppm之工業用水使用圖3記載之水處理裝置實施濃縮處理。藉由逆滲透膜處理裝置,濃縮到TDS8%為止。將該濃縮水供給至正滲透膜處理裝置(正滲透膜:HP5230(東洋紡製)),接著供給30重量%氯化鎂溶液作為吸引溶液,製得TDS20%之FO濃縮水。藉由正滲透膜處理稀釋之稀薄氯化鎂溶液的一部份原封不動地添加至溶解性二氧化矽去除裝置中,且剩餘部份使用圖6之結構的濃縮裝置濃縮到氯化鎂30%為止並作為正滲透膜處理裝置之吸引溶液再利用。算出用於正滲透膜處理之能量成本。結果顯示於表2中。
<Example 2>
Industrial water containing TDS 100ppm and dissolved silica 15ppm was concentrated using the water treatment device shown in Figure 3. The water was concentrated to
<比較例3>
在實施例2使用之水處理裝置中,實施用蒸發器取代正滲透膜處理裝置之濃縮操作,同樣地製得TDS20%之濃縮水。算出用於蒸發器之能量成本並與實施例2比較。結果顯示於表2中。
<Comparative Example 3>
In the water treatment device used in Example 2, the evaporator is used to replace the concentration operation of the forward osmosis membrane treatment device to produce concentrated water with
<比較例4> 在實施例2使用之水處理裝置中,使用30重量%碳酸銨溶液作為正滲透膜處理裝置之吸引溶液,同樣地製得TDS20%之濃縮水。將藉由正滲透膜處理稀釋之稀薄碳酸銨溶液輸送至再生裝置,並藉由熱實施再生(再生步驟)。算出用於正滲透膜處理之能量成本(包含供應至再生步驟之能量)。結果顯示於表2中。 <Comparative Example 4> In the water treatment device used in Example 2, a 30 wt% ammonium carbonate solution was used as the suction solution of the forward osmosis membrane treatment device, and concentrated water with a TDS of 20% was similarly produced. The dilute ammonium carbonate solution diluted by the forward osmosis membrane treatment was transported to the regeneration device and regenerated by heat (regeneration step). The energy cost for the forward osmosis membrane treatment (including the energy supplied to the regeneration step) was calculated. The results are shown in Table 2.
[表2]
如此,可了解的是藉由實施例2之處理方法,相較於比較例3、4之處理方法,可用低能量成本濃縮,因此可用低成本處理包含溶解性二氧化矽及硬度成分中之至少一者的被處理水。Thus, it can be understood that the treatment method of Example 2 can be concentrated at a low energy cost compared to the treatment methods of Comparative Examples 3 and 4, and thus the treated water containing at least one of soluble silica and hardness components can be treated at a low cost.
[安定化次溴酸組成物(組成物1)之調製] 在氮環境下,混合:液體溴:16.9重量%(wt%)、胺磺酸:10.7重量%、氫氧化鈉:12.9重量%、氫氧化鉀:3.94重量%、水:剩餘部份,藉此調製安定化次溴酸組成物(組成物1)。安定化次溴酸組成物之pH為14,且全氯濃度為7.5重量%。全氯濃度係使用HACH公司之多項目水質分析計DR/4000,藉由全氯測量法(DPD(二乙基對苯二胺)法)測量的值(mg/L 相當於Cl 2)。安定化次溴酸組成物之詳細調製方法如下。 [Preparation of stabilized hypobromous acid composition (composition 1)] In a nitrogen environment, mix: liquid bromine: 16.9 weight % (wt%), sulfamic acid: 10.7 weight %, sodium hydroxide: 12.9 weight %, potassium hydroxide: 3.94 weight %, water: the remainder, to prepare a stabilized hypobromous acid composition (composition 1). The pH of the stabilized hypobromous acid composition is 14, and the total chlorine concentration is 7.5 weight %. The total chlorine concentration is a value measured by the total chlorine measurement method (DPD (diethyl-p-phenylenediamine) method) using a multi-item water quality analyzer DR/4000 from HACH (mg/L equivalent to Cl 2 ). The detailed preparation method of the stabilized hypobromous acid composition is as follows.
一面藉由質量流控制器控制氮氣之流量,使反應容器內之氧濃度維持在1%,一面添加混合1436g之水、361g之氫氧化鈉於藉由連續注入裝入之2L的4個燒瓶中,接著添加混合300g之胺磺酸後,一面維持冷卻使反應液之溫度為0至15℃,一面添加473g之液體溴,接著添加230g之48%氫氧化鉀溶液,製得按對組成物全體之量的重量比計,胺磺酸10.7%、溴16.9%、胺磺酸當量對溴當量之比為1.04的目的安定化次溴酸組成物(組成物1)。生成之溶液的pH用玻璃電極法測量之結果為14。生成之溶液的溴含有率藉由將溴用碘化鉀轉變成碘後,使用硫代硫酸鈉氧化還原滴定之方法測量的結果是16.9%且係理論含有率(16.9%)之100.0%。此外,溴反應時之反應容器內的氧濃度係使用JIKCO公司(股)製之「OXYGEN MONITOR JKO-02 LJDII」測量。另外,溴酸濃度小於5mg/kg。While controlling the flow rate of nitrogen by a mass flow controller to maintain the oxygen concentration in the reaction container at 1%, 1436 g of water and 361 g of sodium hydroxide were added and mixed into four 2 L flasks filled by continuous injection, and then 300 g of amine sulfonic acid was added and mixed. While cooling the reaction solution to keep the temperature at 0 to 15°C, 473 g of liquid bromine was added, and then 230 g of 48% potassium hydroxide solution was added to obtain the target stabilized hypobromous acid composition (composition 1) with a weight ratio of amine sulfonic acid 10.7%, bromine 16.9%, and a ratio of amine sulfonic acid equivalent to bromine equivalent of 1.04 based on the weight ratio of the total composition. The pH of the resulting solution was measured by a glass electrode method and was 14. The bromine content of the resulting solution was measured by converting bromine into iodine using potassium iodide and then using sodium thiosulfate redox titration. The result was 16.9%, which is 100.0% of the theoretical content (16.9%). In addition, the oxygen concentration in the reaction vessel during the bromine reaction was measured using "OXYGEN MONITOR JKO-02 LJDII" manufactured by JIKCO Co., Ltd. In addition, the bromic acid concentration was less than 5 mg/kg.
此外,pH之測量係在以下條件下進行。 電極種類:玻璃電極式 pH測量計:DKK-TOA公司製,IOL-30型 電極之校正:藉由關東化學公司製中性磷酸鹽pH(6.86)標準液(第二種)、同公司製硼酸鹽pH(9.18)標準液(第二種)的2點校正來進行 測量溫度:25℃ 測量值:將電極浸漬於測量液中,用安定後之值作為測量值,3次測量之平均值 In addition, pH measurement is performed under the following conditions. Electrode type: glass electrode type pH meter: DKK-TOA, IOL-30 type Electrode calibration: performed by two-point calibration using neutral phosphate pH (6.86) standard solution (type 2) manufactured by Kanto Chemical Co., Ltd. and borate pH (9.18) standard solution (type 2) manufactured by the same company Measuring temperature: 25°C Measurement value: immerse the electrode in the measuring solution, and use the value after stabilization as the measurement value, the average value of 3 measurements
[安定化次氯酸組成物(組成物2)之調製] 混合:12%次氯酸鈉水溶液:50重量%、胺磺酸:12重量%、氫氧化鈉:8重量%、水:剩餘部份,藉此調製安定化次氯酸組成物(組成物2)。組成物2之pH為13.7,且全氯濃度為6.2重量%。 [Preparation of stabilized hypochlorous acid composition (composition 2)] Mix: 12% sodium hypochlorite aqueous solution: 50% by weight, sulfamic acid: 12% by weight, sodium hydroxide: 8% by weight, water: the remainder, and prepare stabilized hypochlorous acid composition (composition 2). The pH of composition 2 is 13.7, and the total chlorine concentration is 6.2% by weight.
<實施例3> 使用濃縮到全蒸發殘留物(TDS)8重量%為止之工業排水作為FO被處理水,接著用30重量%MgCl 2溶液作為吸引溶液,實施正滲透膜處理。調整吸引溶液之流量,使FO濃縮水出口之流量為FO被處理水入口之50%(濃縮倍率2倍)。使用乙酸纖維素製FO膜(HPC3205,東洋紡製)作為正滲透膜(FO膜)。在FO被處理水中添加安定化次溴酸組成物(組成物1)作為正滲透膜用殺菌劑,使在FO被處理水入口之全氯濃度為1ppmCl。總計繼續本運轉200小時,接著評價正滲透膜處理裝置之FO被處理水入口至FO濃縮水出口的壓力損失(通水壓差)及殺菌劑的阻止率。此外,運轉開始後之通水壓差係0.02MPa。結果顯示於表3中。 殺菌劑之阻止率[%]=(1-(稀薄吸引溶液流量×稀薄吸引溶液全氯濃度/FO被處理水×FO被處理水全氯濃度)) <Example 3> Industrial wastewater concentrated to 8 wt% of total evaporated residue (TDS) was used as FO treated water, and then a 30 wt% MgCl2 solution was used as an attracting solution to perform forward osmosis membrane treatment. The flow rate of the attracting solution was adjusted so that the flow rate at the FO concentrated water outlet was 50% of the flow rate at the FO treated water inlet (concentration ratio 2 times). A cellulose acetate FO membrane (HPC3205, manufactured by Toyobo) was used as a forward osmosis membrane (FO membrane). A stabilized hypobromous acid composition (composition 1) was added to the FO treated water as a disinfectant for the forward osmosis membrane so that the total chlorine concentration at the FO treated water inlet was 1 ppmCl. The operation was continued for a total of 200 hours, and then the pressure loss (water pressure difference) from the FO treated water inlet to the FO concentrated water outlet of the positive permeation membrane treatment device and the rejection rate of the disinfectant were evaluated. In addition, the water pressure difference after the start of operation was 0.02MPa. The results are shown in Table 3. Bactericide rejection rate [%] = (1-(dilute suction solution flow rate × dilute suction solution total chlorine concentration/FO treated water × FO treated water total chlorine concentration))
<實施例4> 在FO被處理水中添加安定化次氯酸組成物(組成物2;氯胺磺酸)取代安定化次溴酸組成物(組成物1)作為正滲透膜用殺菌劑,使在FO被處理水入口之全氯濃度為1ppmCl,除此以外,與實施例3同樣地實施正滲透膜處理。結果顯示於表3中。 <Example 4> A stabilized hypochlorous acid composition (composition 2; chloramine sulfonic acid) was added to the FO treated water instead of the stabilized hypobromous acid composition (composition 1) as a disinfectant for the forward osmosis membrane, so that the total chlorine concentration at the inlet of the FO treated water was 1 ppmCl. The forward osmosis membrane treatment was carried out in the same manner as in Example 3. The results are shown in Table 3.
<比較例5> 在FO被處理水中添加作為氯系殺菌劑之次氯酸鈉取代安定化次溴酸組成物(組成物1)作為正滲透膜用殺菌劑,使在FO被處理水入口之游離氯濃度為1ppmCl,除此以外,與實施例3同樣地實施正滲透膜處理。結果顯示於表3中。 <Comparative Example 5> Sodium hypochlorite as a chlorine-based disinfectant was added to the FO treated water instead of the stabilized hypobromous acid composition (composition 1) as a disinfectant for the forward osmosis membrane, and the free chlorine concentration at the inlet of the FO treated water was made 1 ppmCl. The forward osmosis membrane treatment was carried out in the same manner as in Example 3. The results are shown in Table 3.
<比較例6> 在FO被處理水中添加作為有機系殺菌劑之5-氯-2-甲基-4-異噻唑啉-3-酮取代安定化次溴酸組成物(組成物1)作為正滲透膜用殺菌劑,使在FO被處理水入口之TOC為10ppm,除此以外,與實施例3同樣地實施正滲透膜處理。結果顯示於表3中。除此以外,與實施例3同樣地實施正滲透膜處理。結果顯示於表3中。 <Comparative Example 6> 5-Chloro-2-methyl-4-isothiazoline-3-one was added as an organic bactericide to the FO treated water, and the stabilized hypobromous acid composition (composition 1) was substituted as a forward osmosis membrane bactericide to make the TOC at the inlet of the FO treated water 10ppm. The forward osmosis membrane treatment was carried out in the same manner as in Example 3. The results are shown in Table 3. The forward osmosis membrane treatment was carried out in the same manner as in Example 3. The results are shown in Table 3.
[表3]
[結果] 在實施例3中,可抑制正滲透膜之通水壓差的上升。殺菌劑亦阻止99%以上。在實施例4中亦有同樣之傾向,但通水壓差稍微上升。在比較例5、6中,通水壓差>0.2MPa且超過膜之容許通水壓差(0.2MPa)。殺菌劑阻止率亦為85%以下,且確認殺菌有效成分洩漏至稀薄吸引溶液中。 [Results] In Example 3, the increase in the water pressure difference of the positive osmosis membrane can be suppressed. The bactericide also blocked more than 99%. In Example 4, there was a similar tendency, but the water pressure difference increased slightly. In Comparative Examples 5 and 6, the water pressure difference was greater than 0.2MPa and exceeded the allowable water pressure difference of the membrane (0.2MPa). The bactericide blocking rate was also less than 85%, and it was confirmed that the bactericidal active ingredient leaked into the dilute suction solution.
如此,可了解的是藉由使用安定化次溴酸組成物或安定化次氯酸組成物作為殺菌劑,可抑制殺菌劑透過正滲透膜且可再利用稀薄吸引溶液。Thus, it can be understood that by using a stabilized hypobromous acid composition or a stabilized hypochlorous acid composition as a bactericide, the bactericide can be inhibited from passing through a positive osmosis membrane and the dilute attracting solution can be reused.
1,3,5,7:水處理裝置
8:正滲透膜處理系統
9:水處理系統
10,114:前處理裝置
12,118:逆滲透膜處理裝置
14:滲透膜處理裝置
16,120:被處理水配管
18:前處理水配管
20:濃縮水配管
22:透過水配管
24,32:吸引溶液配管
26,36:稀薄吸引溶液配管
28:FO濃縮水配管
30:吸引溶液調製槽
34,340,342,344,346,348,350:濃縮裝置
38:濃縮吸引溶液配管
40:稀釋液配管
42,78:第一段半透膜處理裝置
44,80:第二段半透膜處理裝置
46,82:第三段半透膜處理裝置
48,84:一次側(第一空間)
50,86:二次側(第二空間)
52,88:半透膜
54,56,58,60,62,64,66,68,90,92,94,96,98,100,102,104,122,124:配管
70,72,74,106:泵
110:正滲透膜
112:殺菌劑添加配管
116:濁質去除裝置
126:RO透過水配管
128:逆洗排水配管
1,3,5,7: Water treatment device
8: Forward osmosis membrane treatment system
9: Water treatment system
10,114: Pretreatment device
12,118: Reverse osmosis membrane treatment device
14: Osmosis membrane treatment device
16,120: Treated water piping
18: Pretreatment water piping
20: Concentrated water piping
22: Permeated water piping
24,32: Suction solution piping
26,36: Dilute suction solution piping
28: FO concentrated water piping
30: Suction solution preparation tank
34,340,342,344,346,348,350: Concentration device
38: Concentrated suction solution piping
40: Dilution piping
42,78: First stage semipermeable
[圖1]係顯示本發明實施形態之一水處理裝置例的概略結構圖。 [圖2]係顯示本發明實施形態之另一水處理裝置例的概略結構圖。 [圖3]係顯示本發明實施形態之另一水處理裝置例的概略結構圖。 [圖4]係顯示本發明實施形態之水處理裝置的一濃縮裝置例的概略結構圖。 [圖5]係顯示本發明實施形態之水處理裝置的另一濃縮裝置例的概略結構圖。 [圖6]係顯示本發明實施形態之水處理裝置的另一濃縮裝置例的概略結構圖。 [圖7]係顯示本發明實施形態之水處理裝置的另一濃縮裝置例的概略結構圖。 [圖8]係顯示本發明實施形態之水處理裝置的另一濃縮裝置例的概略結構圖。 [圖9]係顯示本發明實施形態之水處理裝置的另一濃縮裝置例的概略結構圖。 [圖10]係顯示習知水處理裝置的概略結構圖。 [圖11]係顯示本發明實施形態之一正滲透膜處理系統例的概略結構圖。 [圖12]係顯示本發明實施形態之一水處理系統例的概略結構圖。 [Figure 1] is a schematic structural diagram showing an example of a water treatment device according to an embodiment of the present invention. [Figure 2] is a schematic structural diagram showing another example of a water treatment device according to an embodiment of the present invention. [Figure 3] is a schematic structural diagram showing another example of a water treatment device according to an embodiment of the present invention. [Figure 4] is a schematic structural diagram showing an example of a concentrator of the water treatment device according to an embodiment of the present invention. [Figure 5] is a schematic structural diagram showing another example of a concentrator of the water treatment device according to an embodiment of the present invention. [Figure 6] is a schematic structural diagram showing another example of a concentrator of the water treatment device according to an embodiment of the present invention. [Figure 7] is a schematic structural diagram showing another example of a concentrator of the water treatment device according to an embodiment of the present invention. [Figure 8] is a schematic structural diagram showing another example of a concentration device of a water treatment device according to an embodiment of the present invention. [Figure 9] is a schematic structural diagram showing another example of a concentration device of a water treatment device according to an embodiment of the present invention. [Figure 10] is a schematic structural diagram showing a conventional water treatment device. [Figure 11] is a schematic structural diagram showing an example of a forward osmosis membrane treatment system according to an embodiment of the present invention. [Figure 12] is a schematic structural diagram showing an example of a water treatment system according to an embodiment of the present invention.
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| US20220204375A1 (en) * | 2020-12-30 | 2022-06-30 | Industrial Technology Research Institute | System and method of treating waste water |
| JP7637570B2 (en) * | 2021-06-04 | 2025-02-28 | オルガノ株式会社 | Water treatment method and water treatment device |
| CN115465978A (en) * | 2021-10-11 | 2022-12-13 | 苏州诺津环保科技有限公司 | Water solution concentration method by combining osmotic membrane and dialysis membrane |
| TWI796894B (en) * | 2021-12-23 | 2023-03-21 | 財團法人工業技術研究院 | Forward-osmosis concentration device and concentrating method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100032375A1 (en) * | 2008-08-05 | 2010-02-11 | Venkataraman Jagannathan | Reverse osmosis enhanced recovery hybrid process |
| CN105142762A (en) * | 2013-03-15 | 2015-12-09 | 波里费拉公司 | Improvement of Osmotically Driven Membrane Systems Including Multistage Purification |
| CN205603387U (en) * | 2016-02-22 | 2016-09-28 | 麦王环境技术股份有限公司 | Strong brine zero release divides membrane concentrator of matter crystallization |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5910732B2 (en) * | 2012-04-11 | 2016-04-27 | Jfeエンジニアリング株式会社 | Method and apparatus for treatment of associated water from a well |
| DK177696B1 (en) * | 2013-02-25 | 2014-03-17 | Aquaporin As | Systems for water extraction |
| JP2014180628A (en) * | 2013-03-19 | 2014-09-29 | Kubota Corp | Water treatment method and system |
| JP6401491B2 (en) * | 2013-08-28 | 2018-10-10 | オルガノ株式会社 | Method for inhibiting slime of separation membrane, slime inhibitor composition for reverse osmosis membrane or nanofiltration membrane, and method for producing slime inhibitor composition for separation membrane |
| JP6252297B2 (en) * | 2014-03-27 | 2017-12-27 | 東洋紡株式会社 | Forward osmosis treatment method and forward osmosis treatment apparatus |
| US10351444B2 (en) * | 2014-05-08 | 2019-07-16 | Organo Corporation | Filtration treatment system and filtration treatment method |
| JP6534524B2 (en) * | 2014-12-25 | 2019-06-26 | オルガノ株式会社 | Filtration treatment system and filtration treatment method |
| CN107108277B (en) * | 2014-12-25 | 2020-12-15 | 奥加诺株式会社 | Viscosity Inhibition Method for Separation Membranes |
| WO2016160810A1 (en) * | 2015-03-30 | 2016-10-06 | Oasys Water, Inc. | Osmotic separation systems and methods |
| JP2016188823A (en) * | 2015-03-30 | 2016-11-04 | 栗田工業株式会社 | Method and apparatus for treating contaminated water |
| JP6289413B2 (en) * | 2015-04-23 | 2018-03-07 | 株式会社ササクラ | Power generation / desalination method and system |
| JP6465301B2 (en) * | 2015-08-12 | 2019-02-06 | Jfeエンジニアリング株式会社 | Water desalination equipment |
| JP6521077B2 (en) * | 2015-08-31 | 2019-05-29 | 東洋紡株式会社 | Water treatment method and water treatment system |
| JP6727056B2 (en) * | 2016-07-25 | 2020-07-22 | 水ing株式会社 | Wastewater treatment equipment and wastewater treatment method |
| CN109863122B (en) * | 2016-10-25 | 2022-01-25 | 奥加诺株式会社 | Water treatment method and water treatment apparatus using reverse osmosis membrane |
-
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100032375A1 (en) * | 2008-08-05 | 2010-02-11 | Venkataraman Jagannathan | Reverse osmosis enhanced recovery hybrid process |
| CN105142762A (en) * | 2013-03-15 | 2015-12-09 | 波里费拉公司 | Improvement of Osmotically Driven Membrane Systems Including Multistage Purification |
| CN205603387U (en) * | 2016-02-22 | 2016-09-28 | 麦王环境技术股份有限公司 | Strong brine zero release divides membrane concentrator of matter crystallization |
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| TWI835878B (en) | 2024-03-21 |
| TW202404904A (en) | 2024-02-01 |
| CN112805247A (en) | 2021-05-14 |
| TW202019552A (en) | 2020-06-01 |
| CN112805247B (en) | 2023-05-02 |
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