TWI844723B - Shape transfer film - Google Patents
Shape transfer film Download PDFInfo
- Publication number
- TWI844723B TWI844723B TW109129894A TW109129894A TWI844723B TW I844723 B TWI844723 B TW I844723B TW 109129894 A TW109129894 A TW 109129894A TW 109129894 A TW109129894 A TW 109129894A TW I844723 B TWI844723 B TW I844723B
- Authority
- TW
- Taiwan
- Prior art keywords
- shape
- layer
- transfer film
- film
- concave
- Prior art date
Links
- 238000012546 transfer Methods 0.000 title claims abstract description 180
- 229920005989 resin Polymers 0.000 claims abstract description 79
- 239000011347 resin Substances 0.000 claims abstract description 79
- 239000000758 substrate Substances 0.000 claims abstract description 56
- 239000000945 filler Substances 0.000 claims abstract description 29
- 238000011161 development Methods 0.000 claims abstract description 14
- 239000010410 layer Substances 0.000 claims description 188
- 239000012790 adhesive layer Substances 0.000 claims description 63
- 239000002313 adhesive film Substances 0.000 claims description 52
- 239000002245 particle Substances 0.000 description 36
- 238000000034 method Methods 0.000 description 24
- 238000011156 evaluation Methods 0.000 description 23
- 239000003822 epoxy resin Substances 0.000 description 21
- 229920000647 polyepoxide Polymers 0.000 description 21
- 229910052751 metal Inorganic materials 0.000 description 20
- 239000002184 metal Substances 0.000 description 20
- -1 mesh Substances 0.000 description 19
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 16
- 239000011241 protective layer Substances 0.000 description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 229910052709 silver Inorganic materials 0.000 description 14
- 239000004332 silver Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 230000001070 adhesive effect Effects 0.000 description 12
- 239000011342 resin composition Substances 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 239000000853 adhesive Substances 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 9
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 8
- 239000000049 pigment Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000003086 colorant Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000002923 metal particle Substances 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 238000003825 pressing Methods 0.000 description 7
- 239000004615 ingredient Substances 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 239000005020 polyethylene terephthalate Substances 0.000 description 6
- 239000004848 polyfunctional curative Substances 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 229910000881 Cu alloy Inorganic materials 0.000 description 5
- 239000004743 Polypropylene Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 229920001155 polypropylene Polymers 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920005672 polyolefin resin Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000011164 primary particle Substances 0.000 description 3
- 238000000790 scattering method Methods 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 2
- 101000661807 Homo sapiens Suppressor of tumorigenicity 14 protein Proteins 0.000 description 2
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000004840 adhesive resin Substances 0.000 description 2
- 229920006223 adhesive resin Polymers 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 239000004811 fluoropolymer Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 229920006113 non-polar polymer Polymers 0.000 description 2
- 239000011146 organic particle Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- FWLHAQYOFMQTHQ-UHFFFAOYSA-N 2-N-[8-[[8-(4-aminoanilino)-10-phenylphenazin-10-ium-2-yl]amino]-10-phenylphenazin-10-ium-2-yl]-8-N,10-diphenylphenazin-10-ium-2,8-diamine hydroxy-oxido-dioxochromium Chemical compound O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.Nc1ccc(Nc2ccc3nc4ccc(Nc5ccc6nc7ccc(Nc8ccc9nc%10ccc(Nc%11ccccc%11)cc%10[n+](-c%10ccccc%10)c9c8)cc7[n+](-c7ccccc7)c6c5)cc4[n+](-c4ccccc4)c3c2)cc1 FWLHAQYOFMQTHQ-UHFFFAOYSA-N 0.000 description 1
- STHCTMWQPJVCGN-UHFFFAOYSA-N 2-[[2-[1,1,2-tris[2-(oxiran-2-ylmethoxy)phenyl]ethyl]phenoxy]methyl]oxirane Chemical compound C1OC1COC1=CC=CC=C1CC(C=1C(=CC=CC=1)OCC1OC1)(C=1C(=CC=CC=1)OCC1OC1)C1=CC=CC=C1OCC1CO1 STHCTMWQPJVCGN-UHFFFAOYSA-N 0.000 description 1
- UJWXADOOYOEBCW-UHFFFAOYSA-N 2-[[2-[bis[2-(oxiran-2-ylmethoxy)phenyl]methyl]phenoxy]methyl]oxirane Chemical compound C1OC1COC1=CC=CC=C1C(C=1C(=CC=CC=1)OCC1OC1)C1=CC=CC=C1OCC1CO1 UJWXADOOYOEBCW-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- 239000001692 EU approved anti-caking agent Substances 0.000 description 1
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- GZCGUPFRVQAUEE-SLPGGIOYSA-N aldehydo-D-glucose Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C=O GZCGUPFRVQAUEE-SLPGGIOYSA-N 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000005260 alpha ray Effects 0.000 description 1
- 229920005603 alternating copolymer Polymers 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000005250 beta ray Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000805 composite resin Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004845 glycidylamine epoxy resin Substances 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000003273 ketjen black Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229920000092 linear low density polyethylene Polymers 0.000 description 1
- 239000004707 linear low-density polyethylene Substances 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229920001179 medium density polyethylene Polymers 0.000 description 1
- 239000004701 medium-density polyethylene Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 239000011242 organic-inorganic particle Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920006350 polyacrylonitrile resin Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical group 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 229920001862 ultra low molecular weight polyethylene Polymers 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
- B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/04—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the partial melting of at least one layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/538—Roughness
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Laminated Bodies (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Decoration By Transfer Pictures (AREA)
- Materials For Medical Uses (AREA)
Abstract
本發明之課題在提供一種形狀轉印薄膜,其具有凹凸形狀,藉由將源自上述凹凸形狀的形狀轉印至轉印對象物上,可賦予轉印對象物足夠之隱蔽性,且於意圖從轉印對象物剝下時可輕易地剝下。 解決手段方面,形狀轉印薄膜於至少一面具有界面展開面積比Sdr為1500~7000%及/或核心部高度差Sk為2.0~7.0μm的凹凸形狀,用以將源自上述凹凸形狀的形狀轉印至轉印對象物上。形狀轉印薄膜例如具備基材層及設置於基材層之一面上的樹脂層。又,形狀轉印薄膜例如包含填料,且上述凹凸形狀是藉由令填料比薄膜平坦面更朝外側突出而形成。The subject of the present invention is to provide a shape transfer film having a concave-convex shape, which can provide sufficient concealment to the transfer object by transferring the shape derived from the concave-convex shape to the transfer object, and can be easily peeled off from the transfer object when intending to peel it off. In terms of the solution, the shape transfer film has a concave-convex shape with an interface development area ratio Sdr of 1500~7000% and/or a core height difference Sk of 2.0~7.0μm on at least one side, which is used to transfer the shape derived from the concave-convex shape to the transfer object. The shape transfer film, for example, has a substrate layer and a resin layer disposed on one side of the substrate layer. In addition, the shape transfer film, for example, contains fillers, and the concave-convex shape is formed by making the fillers protrude more outward than the flat surface of the film.
Description
發明領域 本揭示發明是有關於形狀轉印薄膜。更詳而言之,本揭示發明是有關於一種形狀轉印薄膜,其用以將源自形狀轉印薄膜所具有之凹凸形狀的形狀,轉印至轉印對象物上。Field of the Invention The present invention relates to a shape transfer film. More specifically, the present invention relates to a shape transfer film for transferring a shape derived from a concave-convex shape of the shape transfer film to a transfer object.
背景技術 在行動電話、視訊攝影機、筆記型電腦等電子儀器中,印刷配線板廣泛用來將電路組入機構中。又,也會利用在諸如印刷頭的可動部與控制部之連接。於該等電子儀器中,必須要有電磁波屏蔽措施,於裝置內所使用之印刷配線板中,亦開始使用施以電磁波屏蔽措施的屏蔽印刷配線板。Background technology In electronic devices such as mobile phones, video cameras, and laptop computers, printed wiring boards are widely used to integrate circuits into the mechanism. They are also used to connect the movable part of the print head and the control part. In these electronic devices, electromagnetic wave shielding measures must be taken, and shielded printed wiring boards with electromagnetic wave shielding measures are also beginning to be used in the printed wiring boards used in the devices.
屏蔽印刷配線板會使用電磁波屏蔽膜。舉例言之,接著於印刷配線板來使用的電磁波屏蔽膜具有:導電性接著劑層;及保護層,其用以保護上述導電性接著劑層抑或視需要設置的金屬層等屏蔽層。An electromagnetic wave shielding film is used to shield a printed wiring board. For example, an electromagnetic wave shielding film used in conjunction with a printed wiring board has: a conductive adhesive layer; and a protective layer for protecting the conductive adhesive layer or a shielding layer such as a metal layer provided as needed.
近年來,屏蔽印刷配線板中,構成已積層於印刷配線板的電磁波屏蔽膜最表層的保護層,基於電路圖案隱蔽性之目的,有時會要求能呈現出表面光澤性低的外觀。作為表面光澤性低的保護層,可舉如表面具有凹凸形狀的保護層。此種保護層例如可依下述來製作:於表面具有凹凸形狀的轉印薄膜(形狀轉印薄膜)之凹凸面上,澆注塗佈用以形成保護層之組成物,然後,進行固化而形成保護層,藉此將源自形狀轉印薄膜之凹凸形狀的形狀,賦予(轉印)至保護層表面,以進行消光加工。In recent years, in a shielded printed wiring board, the protective layer constituting the outermost layer of the electromagnetic wave shielding film laminated on the printed wiring board is sometimes required to have a low surface glossiness for the purpose of concealing the circuit pattern. As an example of a protective layer with low surface glossiness, there can be exemplified a protective layer having a concave-convex shape on the surface. Such a protective layer can be produced, for example, as follows: a composition for forming a protective layer is poured and coated on the concave-convex surface of a transfer film (shape transfer film) having a concave-convex shape on the surface, and then the protective layer is formed by curing, thereby imparting (transferring) the shape of the concave-convex shape derived from the shape transfer film to the surface of the protective layer for matte processing.
作為此種形狀轉印薄膜,舉例言之,已知的是專利文獻1中揭示者。As such a shape transfer film, for example, the one disclosed in Patent Document 1 is known.
先前技術文獻 專利文獻 專利文獻1:日本特開2017-71107號公報Prior art documents Patent documents Patent document 1: Japanese Patent Publication No. 2017-71107
發明概要 發明欲解決之課題 然而,以賦予保護層隱蔽性為目的而設有凹凸形狀的習知形狀轉印薄膜,在已與保護層積層之狀態下,源自上述凹凸形狀的錨固效果會發生作用,因此,從保護層剝下形狀轉印薄膜時不易剝離,或者即便是在可剝下形狀轉印薄膜之情形時,也會有保護層隨之剝離的問題。另一方面,若使上述凹凸形狀變淺,便可削弱錨固效果,從已貼合於保護層之狀態下輕易地剝下形狀轉印薄膜,然而,由於形成於保護層的凹凸形狀也會變淺,因此無法賦予保護層足夠之隱蔽性。Summary of the invention Problems to be solved by the invention However, in the conventional shape transfer film having a concave-convex shape for the purpose of imparting concealing properties to the protective layer, when the shape transfer film is laminated with the protective layer, the anchoring effect derived from the concave-convex shape takes effect, so that when the shape transfer film is peeled off from the protective layer, it is difficult to peel off, or even when the shape transfer film can be peeled off, there is a problem that the protective layer is peeled off along with it. On the other hand, if the above-mentioned concavo-convex shape is made shallow, the anchoring effect can be weakened, and the shape transfer film can be easily peeled off from the state that it has been attached to the protective layer. However, since the concavo-convex shape formed on the protective layer will also become shallow, it is impossible to give the protective layer sufficient concealment.
本發明是有鑑於上述而成,本發明之目的在提供一種形狀轉印薄膜,其具有凹凸形狀,藉由將源自上述凹凸形狀的形狀轉印至轉印對象物上,可賦予轉印對象物足夠之隱蔽性,且於意圖從轉印對象物剝下時可輕易地剝下。The present invention is made in view of the above, and the purpose of the present invention is to provide a shape transfer film having a concave-convex shape. By transferring the shape derived from the concave-convex shape to the transfer object, sufficient concealment can be given to the transfer object, and it can be easily peeled off from the transfer object when it is intended to be peeled off.
用以解決課題之手段 發明人為了達成上述目的精心探討,結果發現,若藉由表面具有特定凹凸形狀的形狀轉印薄膜,即可藉著將源自上述凹凸形狀的形狀轉印至轉印對象物上,來賦予轉印對象物足夠之隱蔽性,且於意圖從轉印對象物剝下時可輕易地剝下。本發明是根據該等見解而完成。Means for Solving the Problem The inventors have made careful studies to achieve the above-mentioned purpose and have found that if a shape transfer film having a specific concave-convex shape on its surface is used, the shape derived from the concave-convex shape can be transferred to the transfer object, thereby giving the transfer object sufficient concealment and making it easy to peel off the transfer object when it is intended. The present invention was completed based on these findings.
本揭示發明提供一種形狀轉印薄膜,其至少一面具有界面展開面積比Sdr為1500~7000%的凹凸形狀,用以將源自上述凹凸形狀的形狀轉印至轉印對象物上。The present invention provides a shape transfer film, at least one side of which has a concave-convex shape with an interface development area ratio Sdr of 1500-7000%, for transferring a shape derived from the concave-convex shape to a transfer object.
上述凹凸形狀之核心部高度差Sk宜為2.0~7.0μm。The height difference Sk of the core of the above-mentioned concave-convex shape is preferably 2.0~7.0μm.
又,本揭示發明提供一種形狀轉印薄膜,其至少一面具有核心部高度差Sk為2.0~7.0μm的凹凸形狀,用以將源自上述凹凸形狀的形狀轉印至轉印對象物上。In addition, the present invention provides a shape transfer film having at least one surface thereof having a concave-convex shape with a core height difference Sk of 2.0-7.0 μm, for transferring a shape derived from the concave-convex shape to a transfer object.
上述凹凸形狀之算術平均高度Sa宜為1.0~2.0μm。The arithmetic mean height Sa of the above-mentioned concavo-convex shapes is preferably 1.0~2.0μm.
上述凹凸形狀之均方根高度Sq宜為1.0~2.8μm。The root mean square height Sq of the above-mentioned concavo-convex shape is preferably 1.0~2.8μm.
上述凹凸形狀之均方根斜率Sdq宜為7~15。The root mean square slope Sdq of the above-mentioned concave-convex shape should be 7~15.
上述凹凸形狀之界面展開面積比Sdr相對於均方根斜率Sdq的比[Sdr/Sdq]宜為200~500。The ratio of the interface development area ratio Sdr of the above-mentioned concavo-convex shape to the root mean square slope Sdq [Sdr/Sdq] is preferably 200~500.
上述形狀轉印薄膜宜具備基材層及設置於上述基材層之一面的樹脂層,且上述樹脂層側表面具有上述凹凸形狀。The shape transfer film preferably includes a base layer and a resin layer disposed on one surface of the base layer, and the side surface of the resin layer has the concavo-convex shape.
上述形狀轉印薄膜宜包含填料,且上述凹凸形狀是藉由令上述填料比薄膜平坦面更朝外側突出而形成。The shape transfer film preferably includes a filler, and the concavo-convex shape is formed by making the filler protrude outwards more than a flat surface of the film.
再者,本揭示發明提供一種印刷配線板用貼附薄膜,具備:上述形狀轉印薄膜;及電路圖案隱蔽層,其與上述形狀轉印薄膜直接積層。Furthermore, the present invention provides an adhesive film for a printed wiring board, comprising: the shape transfer film; and a circuit pattern concealing layer directly laminated with the shape transfer film.
上述印刷配線板用貼附薄膜宜依序積層有接著劑層、上述電路圖案隱蔽層及上述形狀轉印薄膜。The above-mentioned adhesive film for printed wiring board preferably has an adhesive layer, the above-mentioned circuit pattern concealing layer and the above-mentioned shape transfer film laminated in sequence.
上述電路圖案隱蔽層之上述形狀轉印薄膜側表面的85°光澤度宜在15以下。The 85° glossiness of the surface of the shape transfer film side of the circuit pattern concealing layer is preferably below 15.
發明效果 依據本揭示發明之形狀轉印薄膜,藉由令表面具有上述特定凹凸形狀,可將源自上述凹凸形狀的形狀賦予至轉印對象物,藉此可賦予轉印對象物足夠之隱蔽性,且於意圖從轉印對象物剝下時可輕易地剝下。又,於運送中等,除了意圖從轉印對象物剝下形狀轉印薄膜時以外的狀況下則不易剝離。Effect of the invention According to the shape transfer film of the present invention, by making the surface have the above-mentioned specific concavo-convex shape, the shape derived from the above-mentioned concavo-convex shape can be imparted to the transfer object, thereby giving the transfer object sufficient concealment, and it can be easily peeled off from the transfer object when it is intended to be peeled off. In addition, during transportation, the shape transfer film is not easy to be peeled off except when it is intended to be peeled off from the transfer object.
用以實施發明之形態 [形狀轉印薄膜] 本揭示發明一實施形態的形狀轉印薄膜於至少一面具有凹凸形狀,用以將源自上述凹凸形狀的形狀賦予(轉印)至轉印對象物。上述形狀轉印薄膜,尤佳者為用以將源自上述凹凸形狀的形狀,賦予(轉印)至用以貼附於印刷配線板的薄膜(印刷配線板用貼附薄膜)之最表層(例如後述電路圖案隱蔽層等)。Form for implementing the invention [Shape transfer film] The shape transfer film of one embodiment of the present invention has a concave-convex shape on at least one side, and is used to impart (transfer) a shape derived from the concave-convex shape to a transfer object. The shape transfer film is preferably used to impart (transfer) a shape derived from the concave-convex shape to the outermost layer (e.g., a circuit pattern concealing layer described later) of a film (printed wiring board attachment film) for attaching to a printed wiring board.
上述形狀轉印薄膜所具有的上述凹凸形狀中,界面展開面積比Sdr宜為1500~7000%,較佳為2000~6500%,更佳為2500~6000%。上述界面展開面積比Sdr是依循ISO25178,為表示定義區域之展開面積(表面積)相對於上述定義區域之面積增加多少的指標。完全平坦的面之Sdr會構成0%。若上述界面展開面積比Sdr在1500%以上,則可對已被賦予源自上述凹凸形狀的形狀之轉印對象物賦予足夠之隱蔽性。若上述界面展開面積比Sdr在7000%以下,意圖從轉印對象物剝離形狀轉印薄膜就會變得容易。In the above-mentioned concavo-convex shape of the shape transfer film, the interface development area ratio Sdr is preferably 1500~7000%, preferably 2000~6500%, and more preferably 2500~6000%. The above-mentioned interface development area ratio Sdr is in accordance with ISO25178, and is an indicator of how much the development area (surface area) of the defined area increases relative to the area of the defined area. The Sdr of a completely flat surface will constitute 0%. If the above-mentioned interface development area ratio Sdr is above 1500%, sufficient concealment can be given to the transfer object that has been given a shape derived from the above-mentioned concavo-convex shape. If the interface development area ratio Sdr is less than 7000%, it becomes easy to peel the shape transfer film from the transfer object.
上述凹凸形狀中,核心部高度差Sk宜為2.0~7.0μm,較佳為2.3~6.0μm,更佳為2.5~5.0μm。上述核心部高度差Sk是依循ISO25178,為凹凸形狀中核心部最大高度減去最小高度的值。核心部是夾在等效直線之負荷面積率0%與100%之高度間的區域。若上述核心部高度差Sk在2.0μm以上,則核心部之高低差大,可對已被賦予源自上述凹凸形狀的形狀之轉印對象物賦予足夠之隱蔽性。若上述核心部高度差Sk在7.0μm以下,意圖從轉印對象物剝離形狀轉印薄膜就會變得容易。In the above-mentioned concave-convex shape, the height difference Sk of the core part is preferably 2.0~7.0μm, preferably 2.3~6.0μm, and more preferably 2.5~5.0μm. The above-mentioned core part height difference Sk follows ISO25178 and is the value of the maximum height of the core part minus the minimum height in the concave-convex shape. The core part is the area between the heights of 0% and 100% of the load area ratio of the equivalent straight line. If the above-mentioned core part height difference Sk is above 2.0μm, the height difference of the core part is large, and sufficient concealment can be given to the transfer object that has been given a shape derived from the above-mentioned concave-convex shape. If the above-mentioned core part height difference Sk is below 7.0μm, it will become easy to peel off the shape transfer film from the transfer object.
上述凹凸形狀中,算術平均高度Sa宜為1.0~2.0μm,較佳為1.0~1.8μm,更佳為1.0~1.6μm。上述算術平均高度Sa是依循ISO25178,表示相對於表面的平均面,各點高度差的絕對值平均。若上述算術平均高度Sa在1.0μm以上,則可對已被賦予源自上述凹凸形狀的形狀之轉印對象物賦予更加足夠之隱蔽性。若上述算術平均高度Sa在2.0μm以下,意圖從轉印對象物剝離形狀轉印薄膜就會變得更加容易。In the above-mentioned concave-convex shape, the arithmetic mean height Sa is preferably 1.0~2.0μm, preferably 1.0~1.8μm, and more preferably 1.0~1.6μm. The above-mentioned arithmetic mean height Sa is in accordance with ISO25178, which means the average of the absolute values of the height difference of each point relative to the average surface of the surface. If the above-mentioned arithmetic mean height Sa is above 1.0μm, it is possible to give more sufficient concealment to the transfer object that has been given a shape derived from the above-mentioned concave-convex shape. If the above-mentioned arithmetic mean height Sa is below 2.0μm, it will become easier to peel off the shape transfer film from the transfer object.
上述凹凸形狀中,均方根高度Sq宜為1.0~2.8μm,較佳為1.1~2.5μm,更佳為1.3~2.0μm。上述均方根高度Sq是依循ISO25178,為相當於起自平均面的距離標準差之參數。若上述均方根高度Sq在1.0μm以上,則可對已被賦予源自上述凹凸形狀的形狀之轉印對象物賦予更加足夠之隱蔽性。若上述均方根高度Sq在2.8μm以下,則凹凸形狀中高度不均少,意圖從轉印對象物剝離形狀轉印薄膜會變得更加容易。In the above-mentioned concave-convex shape, the root mean square height Sq is preferably 1.0~2.8μm, preferably 1.1~2.5μm, and more preferably 1.3~2.0μm. The above-mentioned root mean square height Sq is in accordance with ISO25178 and is a parameter equivalent to the standard deviation of the distance from the average plane. If the above-mentioned root mean square height Sq is above 1.0μm, it is possible to give more sufficient concealment to the transfer object that has been given a shape derived from the above-mentioned concave-convex shape. If the above-mentioned root mean square height Sq is below 2.8μm, the height unevenness in the concave-convex shape is less, and it will become easier to peel off the shape transfer film from the transfer object.
上述凹凸形狀中,均方根斜率Sdq宜為7~15,較佳為8~14,更佳為9~13.5。上述均方根斜率Sdq是依循ISO25178,是利用定義區域所有點之斜率均方根而算出的參數。完全平坦的面之Sdq為0。若上述均方根斜率Sdq在7以上,則可對已被賦予源自上述凹凸形狀的形狀之轉印對象物賦予更加足夠之隱蔽性。若上述均方根斜率Sdq在15以下,則凹凸形狀之高度不均少,意圖從轉印對象物剝離形狀轉印薄膜會變得更加容易。In the above-mentioned concave-convex shape, the root mean square slope Sdq is preferably 7 to 15, preferably 8 to 14, and more preferably 9 to 13.5. The above-mentioned root mean square slope Sdq is in accordance with ISO25178 and is a parameter calculated by using the root mean square of the slopes of all points in the defined area. The Sdq of a completely flat surface is 0. If the above-mentioned root mean square slope Sdq is above 7, a more sufficient concealment can be given to the transfer object that has been given a shape derived from the above-mentioned concave-convex shape. If the above-mentioned root mean square slope Sdq is below 15, the height unevenness of the concave-convex shape is less, and it will become easier to peel off the shape transfer film from the transfer object.
上述凹凸形狀中,界面展開面積比Sdr[%]相對於均方根斜率Sdq的比[Sdr/Sdq]宜為200~500,較佳為250~480,更佳為300~450。若上述比在200以上,表面積會變大(即,凹凸之起伏變得劇烈),吾人推測可對已被賦予源自上述凹凸形狀的形狀之轉印對象物賦予更加足夠之隱蔽性。若上述比在500以下,則可抑制凹凸之斜率,同時表面積(即,凹凸之起伏程度)亦可抑制在一定範圍內,藉此,意圖從轉印對象物剝離形狀轉印薄膜會變得更加容易。In the above-mentioned concavoconvex shape, the ratio of the interface development area ratio Sdr [%] to the root mean square slope Sdq [Sdr/Sdq] is preferably 200~500, preferably 250~480, and more preferably 300~450. If the above ratio is above 200, the surface area will become larger (that is, the fluctuation of the concavoconvex becomes more intense), and it is speculated that the transfer object that has been given a shape derived from the above-mentioned concavoconvex shape can be given more sufficient concealment. If the above ratio is below 500, the slope of the concavoconvex can be suppressed, and the surface area (that is, the degree of fluctuation of the concavoconvex) can also be suppressed within a certain range, thereby making it easier to peel the shape transfer film from the transfer object.
上述凹凸形狀之60°光澤度宜為4.0以上,較佳為4.5以上,更佳為5.0以上。若上述60°光澤度在4.0以上,吾人推測上述凹凸形狀會構成更適合於意圖性剝離的形狀,意圖從轉印對象物剝離形狀轉印薄膜會變得更加容易。上述60°光澤度可利用依循JIS Z8741的方法進行測定。The 60° gloss of the concavo-convex shape is preferably 4.0 or more, more preferably 4.5 or more, and more preferably 5.0 or more. If the 60° gloss is 4.0 or more, it is estimated that the concavo-convex shape will constitute a shape more suitable for intentional peeling, and it will become easier to intentionally peel the shape transfer film from the transfer object. The 60° gloss can be measured by a method in accordance with JIS Z8741.
上述凹凸形狀之85°光澤度宜為2.5~15.0,更佳為3.0~13.0。若上述85°光澤度在2.5以上,意圖從轉印對象物剝離形狀轉印薄膜就會變得更加容易。若上述85°光澤度在15.0以下,則可賦予轉印對象物更加足夠之隱蔽性。上述85°光澤度可利用依循JIS Z8741的方法進行測定。The 85° gloss of the concavo-convex shape is preferably 2.5 to 15.0, more preferably 3.0 to 13.0. If the 85° gloss is above 2.5, it will be easier to peel the shape transfer film from the transfer object. If the 85° gloss is below 15.0, the transfer object can be given more sufficient concealment. The 85° gloss can be measured by a method in accordance with JIS Z8741.
作為上述形狀轉印薄膜之一實施形態,可舉如以下形狀轉印薄膜:具備基材層及設置於該基材層之至少一面上的樹脂層,且上述樹脂層側表面具有上述凹凸形狀。又,作為上述形狀轉印薄膜之其他實施形態,可舉如基材層表面具有上述凹凸形狀的形狀轉印薄膜。As one embodiment of the shape transfer film, there can be exemplified a shape transfer film having a base layer and a resin layer disposed on at least one side of the base layer, wherein the side surface of the resin layer has the concavo-convex shape. Also, as another embodiment of the shape transfer film, there can be exemplified a shape transfer film having the concavo-convex shape on the surface of the base layer.
上述形狀轉印薄膜中,上述凹凸形狀可利用公知或慣用方法以具有上述各種特性來形成。形成上述凹凸形狀的方法可舉如:藉由將平坦面進行噴砂處理的方法、於平坦面噴上乾冰等的方法、按壓具有凹凸形狀之鑄模的方法等而將平坦面予以物理性粗面化的方法;摻合填料使其自形狀轉印薄膜平坦面朝外側突出的方法等。該等方法可以僅使用一種,亦可組合、使用二種以上。In the shape transfer film, the concavo-convex shape can be formed by using a known or conventional method to have the above-mentioned various characteristics. The method of forming the concavo-convex shape can be exemplified by a method of physically roughening the flat surface by sandblasting the flat surface, spraying dry ice on the flat surface, pressing a mold having a concavo-convex shape, etc.; a method of mixing a filler so that it protrudes outward from the flat surface of the shape transfer film, etc. These methods can be used alone or in combination of two or more.
就摻合填料而形成有凹凸形狀的上述形狀轉印薄膜之實施形態而言,可舉如圖1及圖2所示之形狀轉印薄膜。圖1所示之形狀轉印薄膜1具備基材層2及設置於基材層2之一面上的樹脂層3,且樹脂層3側表面具有上述凹凸形狀。樹脂層3含有填料4,填料4自薄膜平坦面即樹脂層3之平坦面3a朝外側突出,藉此形成上述凹凸形狀。As for the embodiment of the shape transfer film having a concavo-convex shape formed by mixing fillers, the shape transfer film shown in Figures 1 and 2 can be cited. The shape transfer film 1 shown in Figure 1 has a base layer 2 and a resin layer 3 provided on one surface of the base layer 2, and the side surface of the resin layer 3 has the above-mentioned concavo-convex shape. The resin layer 3 contains fillers 4, and the fillers 4 protrude outward from the flat surface of the film, that is, the flat surface 3a of the resin layer 3, thereby forming the above-mentioned concavo-convex shape.
上述基材層可舉如:塑膠基材(尤其是塑膠膜)、紙、布、不織布等多孔質材料、網狀體、發泡片、金屬箔等。上述基材層可為單層,亦可為同種或異種基材之積層體。又,上述基材層之表面例如可適當地施以電暈放電處理、電漿處理等物理性處理、底塗處理等化學性處理等公知慣用的表面處理。The substrate layer may be, for example, a plastic substrate (especially a plastic film), porous materials such as paper, cloth, nonwoven fabric, mesh, foam sheet, metal foil, etc. The substrate layer may be a single layer or a laminate of the same or different substrates. The surface of the substrate layer may be appropriately subjected to a known and conventional surface treatment such as a physical treatment such as a corona discharge treatment, a plasma treatment, or a chemical treatment such as a primer treatment.
構成上述塑膠基材的樹脂可舉如:低密度聚乙烯、直鏈狀低密度聚乙烯、中密度聚乙烯、高密度聚乙烯、超低密度聚乙烯、無規共聚聚丙烯、嵌段共聚聚丙烯、均聚聚丙烯、聚丁烯、聚甲基戊烯、乙烯-乙酸乙烯酯共聚物(EVA)、離子聚合物、乙烯-(甲基)丙烯酸共聚物、乙烯-(甲基)丙烯酸酯(無規、交替)共聚物、乙烯-丁烯共聚物、乙烯-己烯共聚物等聚烯烴樹脂;聚胺甲酸酯;聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯、聚對苯二甲酸丁二酯(PBT)等聚酯;聚碳酸酯;聚醯亞胺;聚醚醚酮;聚醚醯亞胺;聚芳醯胺、全芳香族聚醯胺等聚醯胺;聚苯硫;氟樹脂;聚氯乙烯;聚偏二氯乙烯;纖維素樹脂;聚矽氧樹脂等。上述樹脂可以僅使用一種,亦可使用二種以上。The resin constituting the above-mentioned plastic substrate can be exemplified by low-density polyethylene, linear low-density polyethylene, medium-density polyethylene, high-density polyethylene, ultra-low-density polyethylene, random copolymer polypropylene, block copolymer polypropylene, homopolymer polypropylene, polybutene, polymethylpentene, ethylene-vinyl acetate copolymer (EVA), ionic polymer, ethylene-(meth)acrylic acid copolymer, ethylene-(meth)acrylate (random, alternating) copolymer , ethylene-butene copolymer, ethylene-hexene copolymer and other polyolefin resins; polyurethane; polyesters such as polyethylene terephthalate (PET), polyethylene naphthalate, polybutylene terephthalate (PBT); polycarbonate; polyimide; polyetheretherketone; polyetherimide; polyarylamide, wholly aromatic polyamide and other polyamides; polyphenylene sulfide; fluororesin; polyvinyl chloride; polyvinylidene chloride; cellulose resin; polysilicone resin, etc. The above resins may be used alone or in combination of two or more.
形成上述樹脂層的樹脂並無特殊限制,可舉如熱塑性樹脂抑或熱硬化型樹脂、活性能量線硬化型樹脂等硬化型樹脂等。另,本說明書中,所謂「硬化型樹脂」,其概念包含可硬化而形成樹脂的樹脂(硬化性樹脂)以及令硬化性樹脂硬化所形成的樹脂兩者。其中,從硬化後從後述電路圖案隱蔽層之剝離性優異之觀點來看,上述樹脂宜為硬化型樹脂,從在將印刷配線板用貼附薄膜熱壓接於印刷配線板時硬化度不易變動之觀點來看,又以活性能量線硬化型樹脂尤佳。上述樹脂可以僅使用一種,亦可使用二種以上。The resin forming the above-mentioned resin layer is not particularly limited, and examples thereof include thermoplastic resins, thermosetting resins, active energy ray-curing resins, and other curing resins. In addition, in this specification, the so-called "curing resin" includes both a resin that can be cured to form a resin (curable resin) and a resin formed by curing a curable resin. Among them, from the perspective of excellent peelability from the circuit pattern concealing layer described later after curing, the above-mentioned resin is preferably a curing resin. From the perspective of the hardening degree not easily changing when the printed wiring board is hot-pressed to the printed wiring board with an adhesive film, an active energy ray-curing resin is particularly preferred. The above-mentioned resins may be used alone or in combination of two or more.
上述熱塑性樹脂可舉如:聚苯乙烯系樹脂、乙酸乙烯酯系樹脂、聚酯系樹脂、聚烯烴系樹脂(例如聚乙烯系樹脂、聚丙烯系樹脂組成物等)、聚醯亞胺系樹脂、丙烯酸系樹脂等。Examples of the thermoplastic resin include polystyrene resins, vinyl acetate resins, polyester resins, polyolefin resins (e.g. polyethylene resins, polypropylene resin compositions, etc.), polyimide resins, acrylic resins, and the like.
上述熱硬化型樹脂可舉如:酚系樹脂、環氧系樹脂、胺甲酸乙酯系樹脂、三聚氰胺系樹脂、醇酸系樹脂、聚矽氧樹脂等。Examples of the thermosetting resin include phenolic resins, epoxy resins, urethane resins, melamine resins, alkyd resins, silicone resins, and the like.
上述環氧系樹脂可舉如:雙酚型環氧系樹脂、螺環型環氧系樹脂、萘型環氧系樹脂、聯苯型環氧系樹脂、萜烯型環氧系樹脂、環氧丙基醚型環氧系樹脂、環氧丙基胺型環氧系樹脂、酚醛清漆型環氧系樹脂等。Examples of the epoxy resins include bisphenol epoxy resins, spirocyclic epoxy resins, naphthalene epoxy resins, biphenyl epoxy resins, terpene epoxy resins, glycidyl ether epoxy resins, glycidyl amine epoxy resins, and novolac epoxy resins.
上述雙酚型環氧樹脂可舉如:雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、四溴雙酚A型環氧樹脂等。上述環氧丙基醚型環氧樹脂可舉如:參(環氧丙氧基苯基)甲烷、肆(環氧丙氧基苯基)乙烷等。上述環氧丙基胺型環氧樹脂可舉如:四環氧丙基二胺基二苯甲烷等。上述酚醛清漆型環氧樹脂可舉如:甲酚酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、α-萘酚酚醛清漆型環氧樹脂、溴化苯酚酚醛清漆型環氧樹脂等。Examples of the bisphenol type epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, tetrabromobisphenol A type epoxy resin, etc. Examples of the glycidyl ether type epoxy resin include tris(glycidoxyphenyl)methane, tetrakis(glycidoxyphenyl)ethane, etc. Examples of the glycidyl amine type epoxy resin include tetraglycidyl diamino diphenylmethane, etc. Examples of the novolac type epoxy resin include cresol novolac type epoxy resin, phenol novolac type epoxy resin, α-naphthol novolac type epoxy resin, brominated phenol novolac type epoxy resin, and the like.
上述活性能量線硬化型樹脂可舉如:分子中具有至少2個自由基反應性基(例如(甲基)丙烯醯基)的具聚合性樹脂等。上述活性能量線可舉如:電子射線、紫外線、α射線、β射線、γ射線、X射線等。The active energy ray curing resin may be, for example, a polymerizable resin having at least two free radical reactive groups (e.g., (meth)acryloyl groups) in the molecule. The active energy ray may be, for example, electron ray, ultraviolet ray, α ray, β ray, γ ray, X ray, etc.
上述填料可舉如有機粒子及無機粒子。上述有機粒子可舉如:聚甲基丙烯酸甲酯等丙烯酸系樹脂、聚丙烯腈樹脂、聚胺甲酸酯樹脂、聚醯胺、聚醯亞胺等。上述無機粒子可舉如:碳酸鈣、矽酸鈣、黏土、高嶺土、滑石、二氧化矽、玻璃、矽藻土、雲母粉、氧化鋁、氧化鎂、氧化鋅、硫酸鋇、硫酸鋁、硫酸鈣、碳酸鎂等。上述粒子可以僅使用一種,亦可使用二種以上。Examples of the filler include organic particles and inorganic particles. Examples of the organic particles include acrylic resins such as polymethyl methacrylate, polyacrylonitrile resins, polyurethane resins, polyamides, polyimides, and the like. Examples of the inorganic particles include calcium carbonate, calcium silicate, clay, kaolin, talc, silica, glass, diatomaceous earth, mica powder, aluminum oxide, magnesium oxide, zinc oxide, barium sulfate, aluminum sulfate, calcium sulfate, magnesium carbonate, and the like. Only one type of the particles may be used, or two or more types may be used.
上述填料之中位直徑(D50)並無特殊限制,宜為0.5~20μm,更佳為1~10μm。若D50在上述範圍內,則可輕易地形成上述凹凸形狀。上述D50意指利用雷射繞射-散射法求得之粒度分布中積算值50%下的粒徑。The median diameter (D50) of the filler is not particularly limited, and is preferably 0.5 to 20 μm, more preferably 1 to 10 μm. If D50 is within the above range, the above concave-convex shape can be easily formed. The above D50 refers to the particle size at 50% of the integral value in the particle size distribution obtained by the laser diffraction-scattering method.
上述樹脂層中上述填料之含量並無特殊限制,相對於形成上述樹脂層的樹脂100質量份,宜為20~70質量份,更佳為30~60質量份。若上述含量在上述範圍內,則可輕易地形成上述凹凸形狀。The content of the filler in the resin layer is not particularly limited, and is preferably 20 to 70 parts by mass, more preferably 30 to 60 parts by mass, relative to 100 parts by mass of the resin forming the resin layer. If the content is within the above range, the above concavo-convex shape can be easily formed.
上述樹脂層之厚度(兩面之平坦面間的厚度)並無特殊限制,宜為0.5~9μm,更佳為1~7μm。若上述厚度在上述範圍內,則可利用與上述填料之D50之關係,將從平坦面突出的填料形狀設定在適當範圍內,並且可輕易地形成上述凹凸形狀。The thickness of the resin layer (the thickness between the two flat surfaces) is not particularly limited, and is preferably 0.5 to 9 μm, more preferably 1 to 7 μm. If the thickness is within the above range, the shape of the filler protruding from the flat surface can be set within an appropriate range by utilizing the relationship with the D50 of the filler, and the above concave-convex shape can be easily formed.
圖1所示之形狀轉印薄膜1可依下述來製作:利用公知或慣用方法,將樹脂層3以具有上述凹凸形狀形成於基材層2上。具體而言,例如可依下述來製造:將用以形成上述樹脂層的樹脂、或包含化合物及填料且視需要含溶劑的組成物,澆注塗佈於基材層之一面上,進行去溶劑或硬化處理而固化。The shape transfer film 1 shown in FIG1 can be manufactured as follows: a resin layer 3 having the above-mentioned concavo-convex shape is formed on a base layer 2 by a known or conventional method. Specifically, for example, it can be manufactured as follows: a resin for forming the above-mentioned resin layer, or a composition containing a compound and a filler and optionally a solvent, is poured and coated on one side of the base layer, and then the solvent is removed or hardened to solidify.
圖2所示之形狀轉印薄膜1,其基材層2表面具有上述凹凸形狀。基材層2含有填料4,填料4自薄膜平坦面即基材層2之平坦面2a朝外側突出,藉此形成上述凹凸形狀。The shape transfer film 1 shown in Fig. 2 has the above-mentioned concavo-convex shape on the surface of the base layer 2. The base layer 2 contains fillers 4, and the fillers 4 protrude outward from the flat surface of the film, that is, the flat surface 2a of the base layer 2, thereby forming the above-mentioned concavo-convex shape.
於上述基材層之具有凹凸形狀之表面上亦可設置脫模處理層。上述脫模處理層可舉如:利用聚矽氧系、長鏈烷基系、氟系、硫化鉬等剝離處理劑進行表面處理而形成的層體。另,當具有脫模處理層時,脫模處理層之厚度或形狀可依基材層表面的凹凸形狀不會消失,即,形狀轉印薄膜會具有上述凹凸形狀來適當地設定。A release treatment layer may also be provided on the surface of the substrate layer having the concavo-convex shape. The release treatment layer may be, for example, a layer formed by surface treatment using a polysilicone-based, long-chain alkyl-based, fluorine-based, molybdenum sulfide-based release treatment agent. In addition, when the release treatment layer is provided, the thickness or shape of the release treatment layer may be appropriately set according to the fact that the concavo-convex shape of the substrate layer surface will not disappear, that is, the shape transfer film will have the concavo-convex shape.
具有上述脫模處理層之情形的基材層,可舉如上述已作為具有樹脂層之基材層所例示及說明者。不具上述脫模處理層之情形的基材層,則可舉如由氟聚合物構成的低接著性基材抑或由無極性聚合物構成的低接著性基材等。上述由氟聚合物構成的低接著性基材中的氟系聚合物,可舉如:聚四氟乙烯、聚氯三氟乙烯、聚氟乙烯、聚偏二氟乙烯、四氟乙烯-六氟丙烯共聚物、氯氟乙烯-偏二氟乙烯共聚物等。又,上述無極性聚合物可舉如烯烴系樹脂(例如聚乙烯、聚丙烯等)等。上述基材層之表面例如可適當地施以電暈放電處理、電漿處理等物理性處理、底塗處理等化學性處理等公知慣用的表面處理。The substrate layer having the above-mentioned release treatment layer may be exemplified and described as the substrate layer having the resin layer. The substrate layer without the above-mentioned release treatment layer may be a low-adhesion substrate composed of a fluoropolymer or a low-adhesion substrate composed of a non-polar polymer. The fluorine-based polymer in the above-mentioned low-adhesion substrate composed of a fluoropolymer may be polytetrafluoroethylene, polychlorotrifluoroethylene, polyvinyl fluoride, polyvinylidene fluoride, tetrafluoroethylene-hexafluoropropylene copolymer, chlorofluoroethylene-vinylidene fluoride copolymer, etc. In addition, the above-mentioned non-polar polymer may be olefin resin (e.g., polyethylene, polypropylene, etc.). The surface of the substrate layer may be appropriately subjected to a known and conventional surface treatment such as a physical treatment such as a corona discharge treatment or a plasma treatment, or a chemical treatment such as a primer treatment.
上述填料可舉如:上述已作為樹脂層中所含填料而例示及說明者。The filler mentioned above can be exemplified by those already exemplified and explained as the filler contained in the resin layer.
上述填料之中位直徑(D50)並無特殊限制,宜為0.5~20μm,更佳為1~10μm。若D50在上述範圍內,則可輕易地形成上述凹凸形狀。上述D50意指利用雷射繞射-散射法求得之粒度分布中積算值50%下的粒徑。The median diameter (D50) of the filler is not particularly limited, and is preferably 0.5 to 20 μm, more preferably 1 to 10 μm. If D50 is within the above range, the above concave-convex shape can be easily formed. The above D50 refers to the particle size at 50% of the integral value in the particle size distribution obtained by the laser diffraction-scattering method.
上述基材層中上述填料之含有比例並無特殊限制,相對於上述基材層之總量100體積%,宜為10~70體積%,較佳為20~60體積%,更佳為30~50體積%。若上述含有比例在上述範圍內,則可輕易地形成上述凹凸形狀。The content ratio of the filler in the substrate layer is not particularly limited, and is preferably 10 to 70 volume %, more preferably 20 to 60 volume %, and more preferably 30 to 50 volume % relative to 100 volume % of the total amount of the substrate layer. If the content ratio is within the above range, the above concave-convex shape can be easily formed.
圖2所示之形狀轉印薄膜1可依下述來製作:利用公知或慣用方法,以至少一表面具有上述凹凸形狀來成形基材層2。具體而言,例如可依下述來製造:於形成基材層的樹脂組成物中揑合上述填料並成形。然後,亦可視需要將脫模處理劑進行塗佈及固化而形成脫模處理層。The shape transfer film 1 shown in FIG. 2 can be manufactured as follows: a substrate layer 2 is formed with the above-mentioned concavo-convex shape on at least one surface by a known or conventional method. Specifically, for example, it can be manufactured as follows: the above-mentioned filler is kneaded into a resin composition forming the substrate layer and formed. Then, a release agent can be applied and cured as needed to form a release treatment layer.
在無損本發明效果的範圍內,具有上述凹凸形狀之層體(樹脂層或基材層)亦可包含上述各成分以外的其他成分。上述其他成分可舉如:著色劑、抗靜電劑、穩定劑、抗氧化劑、紫外線吸收劑、螢光增白劑等。上述其他成分可以僅使用一種,亦可使用二種以上。The layer (resin layer or substrate layer) having the above-mentioned concavo-convex shape may also contain other components other than the above-mentioned components within the scope of not impairing the effect of the present invention. The above-mentioned other components may include: coloring agent, antistatic agent, stabilizer, antioxidant, ultraviolet absorber, fluorescent whitening agent, etc. The above-mentioned other components may be used alone or in combination of two or more.
上述形狀轉印薄膜之厚度並無特殊限制,例如為10~200μm,較佳為15~150μm。若上述厚度在10μm以上,轉印對象物之保護性能會更加優異。若上述厚度在200μm以下,使用時會更容易剝離。The thickness of the shape transfer film is not particularly limited, for example, 10 to 200 μm, preferably 15 to 150 μm. If the thickness is above 10 μm, the protection performance of the transfer object will be better. If the thickness is below 200 μm, it will be easier to peel off during use.
依據上述形狀轉印薄膜,藉由令表面具有上述特定凹凸形狀,可將源自上述凹凸形狀的形狀賦予至轉印對象物,藉此可賦予轉印對象物足夠之隱蔽性,且於意圖從轉印對象物剝下時可輕易地剝下。又,於運送中等,除非是意圖從電路圖案隱蔽層剝下形狀轉印薄膜的情況,除此以外的狀況下則不易剝離。According to the shape transfer film, by making the surface have the above-mentioned specific concavo-convex shape, the shape derived from the above-mentioned concavo-convex shape can be given to the transfer object, thereby giving the transfer object sufficient concealment, and it can be easily peeled off from the transfer object when it is intended to be peeled off. In addition, during transportation, unless the shape transfer film is intended to be peeled off from the circuit pattern concealing layer, it is not easy to peel off in other situations.
[印刷配線板用貼附薄膜] 本揭示發明一實施形態的印刷配線板用貼附薄膜具備:上述形狀轉印薄膜、及與上述形狀轉印薄膜直接積層的電路圖案隱蔽層。於已直接積層於上述形狀轉印薄膜中具有上述凹凸形狀之面上的電路圖案隱蔽層表面,可賦予(轉印)源自上述凹凸形狀的形狀。藉此,於意圖剝下上述形狀轉印薄膜時,可輕易地從上述電路圖案隱蔽層剝下,且剝下後的上述電路圖案隱蔽層具有足夠之隱蔽性。[Adhesive film for printed wiring board] The adhesive film for printed wiring board of one embodiment of the present invention comprises: the shape transfer film and a circuit pattern concealing layer directly laminated with the shape transfer film. The surface of the circuit pattern concealing layer directly laminated on the surface having the concave-convex shape in the shape transfer film can be given (transferred) a shape derived from the concave-convex shape. Thus, when the shape transfer film is intended to be peeled off, it can be easily peeled off from the circuit pattern concealing layer, and the circuit pattern concealing layer after peeling has sufficient concealing property.
上述印刷配線板用貼附薄膜宜依序積層有接著劑層、上述電路圖案隱蔽層及上述形狀轉印薄膜。上述印刷配線板用貼附薄膜亦可具備上述接著劑層、上述電路圖案隱蔽層及上述形狀轉印薄膜以外的層體。The above-mentioned adhesive film for printed wiring board preferably has an adhesive layer, the above-mentioned circuit pattern concealing layer and the above-mentioned shape transfer film laminated in this order. The above-mentioned adhesive film for printed wiring board may also have layers other than the above-mentioned adhesive layer, the above-mentioned circuit pattern concealing layer and the above-mentioned shape transfer film.
以下說明上述印刷配線板用貼附薄膜之一實施形態。圖3為截面示意圖,其顯示上述印刷配線板用貼附薄膜之一實施形態。An embodiment of the above-mentioned adhesive film for a printed wiring board will be described below. Fig. 3 is a schematic cross-sectional view showing an embodiment of the above-mentioned adhesive film for a printed wiring board.
圖3所示之印刷配線板用貼附薄膜5具備接著劑層7、電路圖案隱蔽層6及圖1所示之形狀轉印薄膜1。更具體而言,印刷配線板用貼附薄膜5是在接著劑層7之一面上直接積層有電路圖案隱蔽層6,該電路圖案隱蔽層6是用以保護接著劑層7的保護層。另,當印刷配線板用貼附薄膜5採用導電性接著劑層作為接著劑層7時,導電性接著劑層具有作為電磁波屏蔽層之機能,發揮電磁波屏蔽性能。在此情形下,印刷配線板用貼附薄膜5可作為電磁波屏蔽膜來使用。又,當接著劑層7不具屏蔽性能抑或要求更高的屏蔽性能時,可於電路圖案隱蔽層與接著劑層間另外具備金屬層等其他電磁波屏蔽層。在此情形下,電路圖案隱蔽層會間接積層於接著劑層上。The adhesive film 5 for printed wiring board shown in FIG3 has an adhesive layer 7, a circuit pattern concealing layer 6 and the shape transfer film 1 shown in FIG1. More specifically, the adhesive film 5 for printed wiring board has the circuit pattern concealing layer 6 directly laminated on one surface of the adhesive layer 7, and the circuit pattern concealing layer 6 is a protective layer for protecting the adhesive layer 7. In addition, when the adhesive film 5 for printed wiring board adopts a conductive adhesive layer as the adhesive layer 7, the conductive adhesive layer has a function as an electromagnetic wave shielding layer and exerts electromagnetic wave shielding performance. In this case, the adhesive film 5 for printed wiring board can be used as an electromagnetic wave shielding film. Furthermore, when the adhesive layer 7 does not have shielding performance or requires higher shielding performance, another electromagnetic wave shielding layer such as a metal layer can be provided between the circuit pattern shielding layer and the adhesive layer. In this case, the circuit pattern shielding layer will be indirectly laminated on the adhesive layer.
於電路圖案隱蔽層6之與接著劑層7為相反側之面上,以電路圖案隱蔽層6與樹脂層3接觸之方式積層有形狀轉印薄膜1。電路圖案隱蔽層6表面會直接積層於形狀轉印薄膜1之具有上述凹凸形狀之面上,因此,可被賦予(轉印)源自上述凹凸形狀的形狀。The shape transfer film 1 is laminated on the surface of the circuit pattern concealing layer 6 opposite to the adhesive layer 7 in such a manner that the circuit pattern concealing layer 6 is in contact with the resin layer 3. The surface of the circuit pattern concealing layer 6 is directly laminated on the surface of the shape transfer film 1 having the above-mentioned concave-convex shape, and thus, a shape derived from the above-mentioned concave-convex shape can be imparted (transferred).
(電路圖案隱蔽層) 在已將印刷配線板用貼附薄膜貼合於印刷配線板之狀態下,上述電路圖案隱蔽層是作為隱蔽用的層體使印刷配線板中的電路圖案不易視辨,有時亦擔負著設計性。在已將上述印刷配線板用貼附薄膜之接著劑層貼附於印刷配線板時,所在側會位於上述接著劑層之與上述印刷配線板為相反側。上述印刷配線板用貼附薄膜中,上述電路圖案隱蔽層可為單層、複層(複數個電路圖案隱蔽層之積層體)任一者。另,當電路圖案隱蔽層與接著劑層間另外具備其他電磁波屏蔽層時,電路圖案隱蔽層可保護該其他電磁波屏蔽層與接著劑層。(Circuit pattern concealing layer) When the printed wiring board adhesive film is attached to the printed wiring board, the circuit pattern concealing layer is used as a concealing layer to make the circuit pattern in the printed wiring board difficult to be seen, and sometimes also bears design. When the adhesive layer of the printed wiring board adhesive film is attached to the printed wiring board, the side is located on the opposite side of the adhesive layer to the printed wiring board. In the printed wiring board adhesive film, the circuit pattern concealing layer can be either a single layer or a multi-layer (a laminate of multiple circuit pattern concealing layers). In addition, when another electromagnetic wave shielding layer is provided between the circuit pattern shielding layer and the adhesive layer, the circuit pattern shielding layer can protect the other electromagnetic wave shielding layer and the adhesive layer.
上述電路圖案隱蔽層亦可含有金屬或樹脂作為黏結劑成分。上述樹脂可舉如:上述已作為樹脂層中所含樹脂而例示及說明者。上述金屬可舉如:鎳、銅、銀、錫、金、鈀、鋁、鉻、鈦、鋅及含該等中1種以上的合金。上述黏結劑成分可以僅使用一種,亦可使用二種以上。The circuit pattern concealing layer may also contain metal or resin as a binder component. Examples of the resin include those exemplified and described above as the resin contained in the resin layer. Examples of the metal include nickel, copper, silver, tin, gold, palladium, aluminum, chromium, titanium, zinc, and alloys containing one or more of these. The binder component may be used alone or in combination of two or more.
其中,上述黏結劑成分又以樹脂為佳。從可使硬化前後對上述形狀轉印薄膜之密著性變動而藉以調整剝離容易度之觀點來看,上述樹脂宜為硬化型樹脂,從在將印刷配線板用貼附薄膜熱壓接於印刷配線板時可同時硬化而容易降低對上述形狀轉印薄膜之密著性之觀點來看,又以熱硬化型樹脂尤佳。Among them, the above-mentioned adhesive component is preferably a resin. From the perspective of being able to change the adhesion to the above-mentioned shape transfer film before and after curing to adjust the ease of peeling, the above-mentioned resin is preferably a curing resin. From the perspective of being able to cure simultaneously when the adhesive film for the printed wiring board is hot-pressed to the printed wiring board and easily reducing the adhesion to the above-mentioned shape transfer film, a thermosetting resin is particularly preferred.
上述電路圖案隱蔽層中上述黏結劑成分之含有比例並無特殊限制,相對於上述電路圖案隱蔽層之總量100質量%,宜為10~70質量%,較佳為20~60質量%,更佳為30~50質量%。The content ratio of the adhesive component in the circuit pattern concealing layer is not particularly limited. Relative to 100% by weight of the total amount of the circuit pattern concealing layer, the content ratio is preferably 10-70% by weight, more preferably 20-60% by weight, and even more preferably 30-50% by weight.
從可使隱蔽性優異之觀點來看,上述電路圖案隱蔽層宜包含黑色系著色劑。上述黑色系著色劑可使用黑色顏料、抑或將複數種顏料減色混合而黑色化的混合顏料等。上述黑色顏料可舉如:碳黑、科琴黑、苝黑、鈦黑、鐵黑、苯胺黑等。從朝電路圖案隱蔽層之分散性之觀點來看,黑色顏料之粒徑宜為平均一次粒徑在20nm以上,在100nm以下更佳。黑色顏料之平均一次粒徑,可從利用穿透型電子顯微鏡(TEM)放大至5萬倍~100萬倍之影像觀察到的20個左右一次粒子之平均值來求得。上述混合顏料例如可混合紅色、綠色、藍色、黃色、紫色、靛青、洋紅等顏料後使用。上述電路圖案隱蔽層中黑色系著色劑之含量,相對於上述電路圖案隱蔽層之總量100質量%,例如為0.5~50質量%,較佳為1~40質量%。From the perspective of achieving excellent concealment, the circuit pattern concealing layer preferably includes a black colorant. The black colorant may be a black pigment or a mixed pigment obtained by mixing a plurality of pigments to obtain a black color. Examples of the black pigment include carbon black, ketjen black, perylene black, titanium black, iron black, aniline black, etc. From the perspective of the dispersibility of the circuit pattern concealing layer, the particle size of the black pigment preferably has an average primary particle size of more than 20 nm, preferably less than 100 nm. The average primary particle size of the black pigment can be obtained from the average value of about 20 primary particles observed using an image magnified 50,000 to 1,000,000 times using a transmission electron microscope (TEM). The mixed pigment can be used after mixing red, green, blue, yellow, purple, indigo, magenta and other pigments. The content of the black colorant in the circuit pattern concealing layer is, for example, 0.5-50% by mass, preferably 1-40% by mass, relative to 100% by mass of the total amount of the circuit pattern concealing layer.
在無損本發明效果的範圍內,上述電路圖案隱蔽層亦可含有上述各成分以外的其他成分。上述其他成分可舉如:消泡劑、黏度調整劑、抗氧化劑、稀釋劑、防沈劑、填充劑、著色劑、調平劑、耦合劑、紫外線吸收劑、賦黏樹脂、硬化促進劑、塑化劑、阻燃劑、抗結塊劑、硬化劑等。上述其他成分可以僅使用一種,亦可使用二種以上。The circuit pattern concealing layer may also contain other components other than the above components within the scope of not impairing the effect of the present invention. The above other components may include: defoaming agent, viscosity regulator, antioxidant, diluent, anti-settling agent, filler, coloring agent, leveling agent, coupling agent, ultraviolet absorber, adhesive resin, hardening accelerator, plasticizer, flame retardant, anti-caking agent, hardener, etc. The above other components may be used alone or in combination of two or more.
上述電路圖案隱蔽層貼合有上述形狀轉印薄膜之表面的60°光澤度宜為0.3~5.0,較佳為0.4~3.0,更佳為0.5~2.0。若上述60°光澤度在0.3以上,意圖剝離形狀轉印薄膜就會變得更加容易。若上述60°光澤度在5.0以下,隱蔽性會更加提升。上述60°光澤度可利用依循JIS Z8741的方法來進行測定。另,上述60°光澤度是在已從上述印刷配線板用貼附薄膜剝下上述形狀轉印薄膜的狀態下測得。The 60° gloss of the surface of the circuit pattern concealing layer to which the shape transfer film is attached is preferably 0.3~5.0, preferably 0.4~3.0, and more preferably 0.5~2.0. If the 60° gloss is above 0.3, it will be easier to peel off the shape transfer film. If the 60° gloss is below 5.0, the concealment will be further improved. The 60° gloss can be measured using a method in accordance with JIS Z8741. In addition, the 60° gloss is measured in a state where the shape transfer film has been peeled off from the attached film for the printed wiring board.
上述電路圖案隱蔽層貼合有上述形狀轉印薄膜之表面的85°光澤度宜為15以下,更佳為小於15。若上述85°光澤度在15以下,隱蔽性會更加提升。上述85°光澤度可利用依循JIS Z8741的方法來進行測定。另,上述85°光澤度是在已從上述印刷配線板用貼附薄膜剝下上述形狀轉印薄膜的狀態下測得。The 85° gloss of the surface of the circuit pattern concealing layer to which the shape transfer film is attached is preferably 15 or less, more preferably less than 15. If the 85° gloss is 15 or less, the concealment will be further improved. The 85° gloss can be measured by a method in accordance with JIS Z8741. In addition, the 85° gloss is measured in a state where the shape transfer film has been peeled off from the printed wiring board attachment film.
上述電路圖案隱蔽層,全光線穿透率宜為20%以下,較佳為10%以下,更佳為5%以下。若上述全光線穿透率在20%以下,在已將印刷配線板用貼附薄膜貼合於印刷配線板時,會更加不易視辨電路圖案。The circuit pattern concealing layer preferably has a total light transmittance of 20% or less, preferably 10% or less, and more preferably 5% or less. If the total light transmittance is less than 20%, it will be more difficult to discern the circuit pattern when the printed wiring board is attached to the printed wiring board with an adhesive film.
上述電路圖案隱蔽層之厚度並無特殊限制,可以視需要適當地設定。從隱蔽性之實現、形成容易度及可撓性之確保等觀點來看,上述電路圖案隱蔽層之厚度宜為1μm以上,更佳為4μm以上。又,上述電路圖案隱蔽層之厚度宜為20μm以下,較佳為10μm以下,更佳為5μm以下。The thickness of the circuit pattern concealing layer is not particularly limited and can be appropriately set as needed. From the perspective of achieving concealment, ease of formation, and ensuring flexibility, the thickness of the circuit pattern concealing layer is preferably 1 μm or more, and more preferably 4 μm or more. In addition, the thickness of the circuit pattern concealing layer is preferably 20 μm or less, preferably 10 μm or less, and more preferably 5 μm or less.
(接著劑層) 上述接著劑層具有用以將上述印刷配線板用貼附薄膜接著於印刷配線板的接著性。接著劑層可為單層、複層任一者。(Adhesive layer) The adhesive layer has adhesive properties for bonding the printed wiring board adhesive film to the printed wiring board. The adhesive layer may be a single layer or a multi-layer.
上述接著劑層宜含有接著劑層中構成樹脂區域的黏結劑成分。上述黏結劑成分可舉如:上述已作為樹脂層中所含樹脂而例示及說明者。上述黏結劑成分可以僅使用一種,亦可使用二種以上。The adhesive layer preferably contains a binder component constituting the resin region in the adhesive layer. The binder component may be exemplified and described above as the resin contained in the resin layer. The binder component may be used alone or in combination of two or more.
當上述黏結劑成分包含熱硬化型樹脂時,構成上述黏結劑成分的成分亦可包含用以促進熱硬化反應的硬化劑。上述硬化劑可依照上述熱硬化型樹脂之種類適當地選擇。上述硬化劑可以僅使用一種,亦可使用二種以上。When the binder component includes a thermosetting resin, the components constituting the binder component may also include a hardener for promoting a thermosetting reaction. The hardener may be appropriately selected according to the type of the thermosetting resin. The hardener may be used alone or in combination of two or more.
上述接著劑層亦可為導電性接著劑層。若為導電性接著劑層之情形下,上述接著劑層可發揮電磁波屏蔽性。當上述接著劑層為導電性接著劑層時,更宜含有導電性粒子。The adhesive layer may be a conductive adhesive layer. If it is a conductive adhesive layer, the adhesive layer can exert electromagnetic wave shielding properties. When the adhesive layer is a conductive adhesive layer, it is more preferable to contain conductive particles.
上述導電性粒子可舉如:金屬粒子、金屬被覆樹脂粒子、金屬纖維、碳填料等。上述導電性粒子可以僅使用一種,亦可使用二種以上。Examples of the conductive particles include metal particles, metal-coated resin particles, metal fibers, carbon fillers, etc. Only one type of the conductive particles may be used, or two or more types may be used.
上述金屬粒子、構成上述金屬被覆樹脂粒子之被覆部的金屬以及構成上述金屬纖維的金屬可舉如:金、銀、銅、鎳、鋅等。上述金屬可以僅使用一種,亦可使用二種以上。The metal particles, the metal constituting the coating of the metal-coated resin particles, and the metal constituting the metal fibers may be gold, silver, copper, nickel, zinc, etc. Only one kind of the metal may be used, or two or more kinds may be used.
具體而言,上述金屬粒子可舉如:銅粒子、銀粒子、鎳粒子、銀被覆銅粒子、金被覆銅粒子、銀被覆鎳粒子、金被覆鎳粒子、銀被覆合金粒子等。上述銀被覆合金粒子可舉如:含銅的合金粒子(例如由銅、鎳與鋅之合金構成的銅合金粒子)已由銀被覆的銀被覆銅合金粒子等。上述金屬粒子可利用電解法、霧化法、還原法等來製作。Specifically, the metal particles include copper particles, silver particles, nickel particles, silver-coated copper particles, gold-coated copper particles, silver-coated nickel particles, gold-coated nickel particles, silver-coated alloy particles, etc. The silver-coated alloy particles include copper-containing alloy particles (e.g., copper alloy particles composed of an alloy of copper, nickel and zinc) and silver-coated copper alloy particles. The metal particles can be produced by electrolysis, atomization, reduction, etc.
其中,上述金屬粒子又以銀粒子、銀被覆銅粒子、銀被覆銅合金粒子為佳。從導電性優異、抑制金屬粒子之氧化及凝集且可降低金屬粒子之成本之觀點來看,尤以銀被覆銅粒子、銀被覆銅合金粒子為佳。Among them, the above metal particles are preferably silver particles, silver-coated copper particles, and silver-coated copper alloy particles. Silver-coated copper particles and silver-coated copper alloy particles are particularly preferred from the viewpoints of excellent electrical conductivity, inhibition of oxidation and aggregation of metal particles, and reduction of the cost of metal particles.
上述導電性粒子之形狀可舉如:球狀、小片狀(鱗片狀)、樹枝狀、纖維狀、不定形(多面體)等。The conductive particles may be in the form of spheres, flakes (scales), branches, fibers, or amorphous shapes (polyhedrons).
上述導電性粒子之中位直徑(D50)宜為1~50μm,更佳為3~40μm。若上述中位直徑在1μm以上,則導電性粒子之分散性良好而可抑制凝集,並且不易氧化。若上述平均粒徑在50μm以下,導電性會變得良好。上述D50意指利用雷射繞射-散射法求得之粒度分布中積算值50%下的粒徑。The median diameter (D50) of the conductive particles is preferably 1 to 50 μm, more preferably 3 to 40 μm. If the median diameter is greater than 1 μm, the conductive particles have good dispersibility and can suppress aggregation, and are not easily oxidized. If the average particle diameter is less than 50 μm, the conductivity will be good. The D50 refers to the particle diameter at 50% of the integral value in the particle size distribution obtained by the laser diffraction-scattering method.
上述導電性接著劑層可以視需要設為具有各向同性導電性或各向異性導電性的層體。The conductive adhesive layer can be a layer having isotropic conductivity or anisotropic conductivity as required.
當上述接著劑層為導電性接著劑層時,上述接著劑層中黏結劑成分之含有比例並無特殊限制,相對於接著劑層之總量100質量%,宜為5~60質量%,較佳為10~50質量%,更佳為20~40質量%。若上述含有比例在5質量%以上,電磁波屏蔽性能會變得良好。若上述含有比例在60質量%以下,對印刷配線板之密著性會更加優異。When the adhesive layer is a conductive adhesive layer, the content of the binder component in the adhesive layer is not particularly limited. Relative to the total amount of the adhesive layer (100 mass%), it is preferably 5-60 mass%, preferably 10-50 mass%, and more preferably 20-40 mass%. If the content is above 5 mass%, the electromagnetic wave shielding performance will become good. If the content is below 60 mass%, the adhesion to the printed wiring board will be more excellent.
當上述接著劑層為導電性接著劑層時,上述接著劑層中導電性粒子之含有比例並無特殊限制,相對於接著劑層之總量100質量%,宜為2~95質量%,較佳為5~80質量%,更佳為10~70質量%。若上述含有比例在2質量%以上,導電性會變得更加良好。若上述含有比例在95質量%以下,則可足量含有黏結劑成分,對印刷配線板之密著性會變得更加良好。When the adhesive layer is a conductive adhesive layer, the content of the conductive particles in the adhesive layer is not particularly limited. It is preferably 2-95% by mass, preferably 5-80% by mass, and more preferably 10-70% by mass relative to the total amount of the adhesive layer (100% by mass). If the content is above 2% by mass, the conductivity will be better. If the content is below 95% by mass, the adhesive component can be contained in sufficient amount, and the adhesion to the printed wiring board will be better.
在無損本發明效果的範圍內,上述接著劑層亦可含有上述各成分以外的其他成分。上述其他成分可舉如公知或慣用接著劑層中所含成分。上述其他成分可舉如:消泡劑、黏度調整劑、抗氧化劑、稀釋劑、防沉劑、填充劑、著色劑、調平劑、耦合劑、紫外線吸收劑、賦黏樹脂、硬化促進劑、塑化劑、阻燃劑、抗結塊劑等。上述其他成分可以僅使用一種,亦可使用二種以上。The adhesive layer may contain other ingredients other than the above ingredients within the scope of not impairing the effect of the present invention. The above other ingredients may include ingredients contained in known or conventional adhesive layers. The above other ingredients may include defoaming agents, viscosity regulators, antioxidants, diluents, anti-settling agents, fillers, colorants, leveling agents, coupling agents, ultraviolet absorbers, adhesive resins, hardening accelerators, plasticizers, flame retardants, anti-caking agents, etc. The above other ingredients may be used alone or in combination of two or more.
上述接著劑層之厚度宜為3~20μm,更佳為5~15μm。若上述厚度在3μm以上,與印刷配線板間密著性會變得更加良好。The thickness of the adhesive layer is preferably 3-20 μm, more preferably 5-15 μm. If the thickness is above 3 μm, the adhesion to the printed wiring board will be better.
上述印刷配線板用貼附薄膜亦可具有上述形狀轉印薄膜、上述電路圖案隱蔽層及上述接著劑層以外的其他層。上述其他層可舉如:設置於上述電路圖案隱蔽層與上述接著劑層間之金屬層等上述導電性接著劑層以外的其他電磁波屏蔽層。又,當具有上述其他電磁波屏蔽層時,上述其他層可舉如:設置於上述電路圖案隱蔽層與上述其他電磁波屏蔽層間之底塗層。The above-mentioned adhesive film for printed wiring board may also have other layers other than the above-mentioned shape transfer film, the above-mentioned circuit pattern concealing layer and the above-mentioned adhesive layer. The above-mentioned other layers may be, for example, other electromagnetic wave shielding layers other than the above-mentioned conductive adhesive layer, such as a metal layer disposed between the above-mentioned circuit pattern concealing layer and the above-mentioned adhesive layer. Furthermore, when the above-mentioned other electromagnetic wave shielding layer is present, the above-mentioned other layers may be, for example, a primer layer disposed between the above-mentioned circuit pattern concealing layer and the above-mentioned other electromagnetic wave shielding layer.
構成上述金屬層的金屬可舉如:金、銀、銅、鋁、鎳、錫、鈀、鉻、鈦、鋅或該等之合金等。上述金屬層宜為金屬板或金屬箔。即,上述金屬層宜為銅板(銅箔)、銀板(銀箔)。The metal constituting the metal layer may be, for example, gold, silver, copper, aluminum, nickel, tin, palladium, chromium, titanium, zinc or alloys thereof. The metal layer is preferably a metal plate or a metal foil. That is, the metal layer is preferably a copper plate (copper foil) or a silver plate (silver foil).
形成上述底塗層的材料可舉如:胺甲酸乙酯系樹脂、丙烯酸系樹脂、以胺甲酸乙酯系樹脂為殼且以丙烯酸系樹脂為核的核-殼型複合樹脂、環氧系樹脂、聚醯亞胺系樹脂、聚醯胺系樹脂、三聚氰胺系樹脂、酚系樹脂、脲甲醛系樹脂、使苯酚等封端劑對聚異氰酸酯反應而得之封閉異氰酸酯、聚乙烯醇、聚乙烯吡咯啶酮等。上述材料可以僅使用一種,亦可使用二種以上。The material forming the above-mentioned base coating layer may be exemplified by urethane resin, acrylic resin, core-shell composite resin with urethane resin as shell and acrylic resin as core, epoxy resin, polyimide resin, polyamide resin, melamine resin, phenol resin, urea-formaldehyde resin, blocked isocyanate obtained by reacting a blocking agent such as phenol with polyisocyanate, polyvinyl alcohol, polyvinyl pyrrolidone, etc. Only one of the above-mentioned materials may be used, or two or more of them may be used.
上述印刷配線板用貼附薄膜中形狀轉印薄膜對電路圖案隱蔽層之剝離力(第1剝離力)宜為0.1N以上,較佳為0.2N以上,更佳為0.3N以上。若第1剝離力在0.1N以上,則於運送中等不易剝離,可抑制非意圖性剝離。另,第1剝離力可利用實施例中記載的方法進行測定。The peeling force (first peeling force) of the shape transfer film on the circuit pattern concealing layer in the above-mentioned adhesive film for printed wiring boards is preferably 0.1N or more, more preferably 0.2N or more, and more preferably 0.3N or more. If the first peeling force is 0.1N or more, it is not easy to peel off during transportation, and unintentional peeling can be suppressed. In addition, the first peeling force can be measured by the method described in the embodiment.
在將上述印刷配線板用貼附薄膜之接著劑層面貼合於印刷配線板,並進行利用加熱加壓所行之貼附後的狀態下,形狀轉印薄膜對電路圖案隱蔽層之剝離力(第2剝離力)宜為3.0N以下,較佳為2.0N以下,更佳為1.5N以下。若第2剝離力在3.0N以下,於使用時意圖剝離形狀轉印薄膜時,可輕易地剝離形狀轉印薄膜。另,第2剝離力可利用實施例中記載的方法進行測定。When the adhesive layer of the above-mentioned printed wiring board attachment film is attached to the printed wiring board and attached by heating and pressurizing, the peeling force (second peeling force) of the shape transfer film on the circuit pattern concealing layer is preferably 3.0N or less, preferably 2.0N or less, and more preferably 1.5N or less. If the second peeling force is less than 3.0N, the shape transfer film can be easily peeled off when it is intended to be peeled off during use. In addition, the second peeling force can be measured by the method described in the embodiment.
第2剝離力相對於第1剝離力的比[第2剝離力/第1剝離力]宜為0.5~1.5,較佳為0.6~1.3,更佳為0.7~1.2。若上述比在上述範圍內,則可進一步地抑制非意圖性剝離,且於使用時意圖剝離時,可更輕易地進行剝離。The ratio of the second peeling force to the first peeling force [second peeling force/first peeling force] is preferably 0.5 to 1.5, more preferably 0.6 to 1.3, and more preferably 0.7 to 1.2. If the above ratio is within the above range, unintentional peeling can be further suppressed, and when peeling is intended during use, peeling can be performed more easily.
上述印刷配線板用貼附薄膜又以撓性印刷配線板(FPC)用途尤佳。上述印刷配線板用貼附薄膜宜作為撓性印刷配線板用貼附薄膜來使用。The above-mentioned adhesive film for printed wiring board is particularly preferably used for flexible printed wiring board (FPC). The above-mentioned adhesive film for printed wiring board is preferably used as an adhesive film for flexible printed wiring board.
(印刷配線板用貼附薄膜之製造方法) 就上述印刷配線板用貼附薄膜之製造方法予以說明。製作圖3所示印刷配線板用貼附薄膜5時,首先,個別製作接著劑層7與電路圖案隱蔽層6。然後,貼合已個別製作的接著劑層7與電路圖案隱蔽層6(積層法)。(Manufacturing method of adhesive film for printed wiring board) The manufacturing method of the adhesive film for printed wiring board described above is explained. When manufacturing the adhesive film 5 for printed wiring board shown in FIG3, first, the adhesive layer 7 and the circuit pattern concealing layer 6 are individually manufactured. Then, the adhesive layer 7 and the circuit pattern concealing layer 6 that have been manufactured individually are laminated (lamination method).
接著劑層7例如可將用以形成接著劑層7之接著劑組成物,塗佈(塗覆)於分離薄膜等暫時基材或基材上,並且視需要去溶劑及/或局部硬化而形成。The adhesive layer 7 can be formed, for example, by coating (applying) an adhesive composition for forming the adhesive layer 7 on a temporary substrate such as a separation film or on a substrate, and removing the solvent and/or partially curing the adhesive composition as needed.
除了上述接著劑層中所含各成分外,上述接著劑組成物例如還可包含溶劑(溶媒)。溶劑可舉如:甲苯、丙酮、甲基乙基酮、甲醇、乙醇、丙醇、二甲基甲醯胺等。接著劑組成物之固體成分濃度可依照形成的接著劑層之厚度等適當地設定。In addition to the components contained in the adhesive layer, the adhesive composition may also include a solvent. Examples of the solvent include toluene, acetone, methyl ethyl ketone, methanol, ethanol, propanol, dimethylformamide, etc. The solid component concentration of the adhesive composition may be appropriately set according to the thickness of the adhesive layer to be formed.
上述接著劑組成物之塗佈可使用公知塗佈法。舉例言之,可使用凹版輥式塗佈機、反向輥式塗佈機、接觸輥式塗佈機、模唇塗佈機、浸漬輥式塗佈機、棒式塗佈機、刀式塗佈機、噴霧塗佈機、缺角輪塗佈機、直接塗佈機、狹縫式模具塗佈機等塗佈機。The adhesive composition can be applied by a known coating method. For example, a coating machine such as a gravure roll coater, a reverse roll coater, a contact roll coater, a die lip coater, a dip roll coater, a rod coater, a knife coater, a spray coater, a notched wheel coater, a direct coater, a slot die coater, etc. can be used.
另一方面,當電路圖案隱蔽層6是採用樹脂作為黏結劑成分之物時,例如可將用以形成電路圖案隱蔽層6之樹脂組成物,塗佈(塗覆)於上述形狀轉印薄膜之已形成有上述凹凸形狀的面上,並且視需要去溶劑及/或局部硬化、固化而形成。藉此,可將源自形狀轉印薄膜1之凹凸形狀面的形狀,賦予至電路圖案隱蔽層6表面。On the other hand, when the circuit pattern concealing layer 6 is made of resin as a binder component, for example, the resin composition used to form the circuit pattern concealing layer 6 can be applied (coated) on the surface of the shape transfer film on which the above-mentioned concave-convex shape has been formed, and the solvent is removed and/or partially hardened and solidified as needed. In this way, the shape derived from the concave-convex surface of the shape transfer film 1 can be given to the surface of the circuit pattern concealing layer 6.
除了上述電路圖案隱蔽層中所含各成分外,上述樹脂組成物例如還可包含溶劑(溶媒)。溶劑可舉如:上述已作為接著劑組成物可含之溶劑所例示者。上述樹脂組成物之固體成分濃度可依照形成的電路圖案隱蔽層之厚度等適當地設定。In addition to the components contained in the circuit pattern concealing layer, the resin composition may also contain a solvent. Examples of the solvent include those exemplified above as the solvent that may be contained in the adhesive composition. The solid component concentration of the resin composition may be appropriately set according to the thickness of the circuit pattern concealing layer to be formed.
上述樹脂組成物之塗佈可使用公知塗佈法。可舉如:上述已作為用於接著劑組成物之塗佈之塗佈機所例示者。The resin composition can be applied by a known coating method, for example, the coating machine described above as an example for applying the adhesive composition.
其次,貼合已分別製作的接著劑層7之露出面與電路圖案隱蔽層6之露出面,製作出印刷配線板用貼附薄膜5。Next, the exposed surface of the adhesive layer 7 and the exposed surface of the circuit pattern concealing layer 6, which have been separately produced, are bonded together to produce the adhesive film 5 for the printed wiring board.
上述積層法以外的其他態樣方面,上述印刷配線板用貼附薄膜亦可藉由依序積層各層的方法來製造(直接塗佈法)。舉例言之,圖3所示印刷配線板用貼附薄膜5可依下述來製造:於接著劑層7之表面,塗佈(塗覆)用以形成電路圖案隱蔽層6之樹脂組成物,並且視需要去溶劑及/或局部硬化,藉此使其固化而形成電路圖案隱蔽層6。另,在此情形下,於完全固化前將形狀轉印薄膜1之凹凸形狀面積層於上述樹脂組成物層上,然後使其完全固化,藉此便可將源自上述凹凸形狀的形狀,賦予至所形成的電路圖案隱蔽層6表面。或者可依下述來製造:先於形狀轉印薄膜1之凹凸形狀面形成電路圖案隱蔽層6,並於電路圖案隱蔽層6之表面塗佈(塗覆)用以形成接著劑層7之接著劑組成物,視需要去溶劑及/或局部硬化而形成接著劑層7。In other aspects other than the above-mentioned lamination method, the above-mentioned adhesive film for printed wiring board can also be manufactured by a method of sequentially laminating each layer (direct coating method). For example, the adhesive film 5 for printed wiring board shown in FIG. 3 can be manufactured as follows: a resin composition for forming a circuit pattern concealing layer 6 is coated (coated) on the surface of the adhesive layer 7, and the solvent is removed and/or partially hardened as needed, thereby solidifying it to form the circuit pattern concealing layer 6. In this case, the concavo-convex shape of the shape transfer film 1 is layered on the resin composition layer before complete curing, and then completely cured, so that the shape derived from the concavo-convex shape can be imparted to the surface of the formed circuit pattern concealing layer 6. Alternatively, it can be manufactured as follows: the circuit pattern concealing layer 6 is first formed on the concavo-convex shape surface of the shape transfer film 1, and the adhesive composition for forming the adhesive layer 7 is applied (coated) on the surface of the circuit pattern concealing layer 6, and the adhesive layer 7 is formed by removing the solvent and/or partially curing as needed.
實施例 以下,根據實施例更詳細地說明本發明,惟本發明並非僅限於該等實施例。Embodiments The present invention is described in more detail below based on embodiments, but the present invention is not limited to these embodiments.
實施例1 (形狀轉印薄膜之製作) 調製由二氧化矽粒子(D50:6.5μm)30質量份、三聚氰胺系樹脂100質量份及甲苯構成的樹脂組成物,使用線錠,將上述樹脂組成物塗佈於厚度25μm之聚對苯二甲酸乙二酯膜之表面,並利用加熱進行去溶劑,製作出基材層表面具有厚度5μm之樹脂層的形狀轉印薄膜。Example 1 (Preparation of shape transfer film) A resin composition consisting of 30 parts by mass of silica particles (D50: 6.5 μm), 100 parts by mass of melamine resin and toluene was prepared, and the resin composition was applied to the surface of a 25 μm thick polyethylene terephthalate film using a wire pellet, and the solvent was removed by heating to prepare a shape transfer film having a 5 μm thick resin layer on the surface of the substrate layer.
(貼附薄膜之製作) 於甲苯中摻合雙酚A型環氧系樹脂(商品名「jER1256」,三菱化學股份有限公司製造)100質量份、硬化劑(商品名「ST14」,三菱化學股份有限公司製造)0.1質量份、作為黑色系著色劑之碳粒子(商品名「TOKABLACK#8300/F」,東海碳股份有限公司製造)15質量份使固體成分量為20質量%,調製出樹脂組成物。使用線錠,將上述樹脂組成物塗佈於上述形狀轉印薄膜之樹脂層表面,並進行利用加熱所行之固化,而於形狀轉印薄膜之表面形成厚度5μm之電路圖案隱蔽層。(Preparation of adhesive film) 100 parts by mass of bisphenol A epoxy resin (trade name "jER1256", manufactured by Mitsubishi Chemical Co., Ltd.), 0.1 parts by mass of hardener (trade name "ST14", manufactured by Mitsubishi Chemical Co., Ltd.), and 15 parts by mass of carbon particles as a black colorant (trade name "TOKABLACK#8300/F", manufactured by Tokai Carbon Co., Ltd.) were mixed in toluene to prepare a resin composition having a solid content of 20% by mass. The resin composition was applied to the surface of the resin layer of the shape transfer film using a wire tablet, and cured by heating to form a circuit pattern concealing layer with a thickness of 5μm on the surface of the shape transfer film.
其次,於甲苯中摻合雙酚A型環氧系樹脂(商品名「jER1256」,三菱化學股份有限公司製造)100質量份、硬化劑(商品名「ST14」,三菱化學股份有限公司製造)0.1質量份使固體成分量為20質量%,攪拌混合而調製出接著劑層組成物。使用線錠,將上述接著劑層組成物塗佈於表面經脫模處理的PET膜(以下為支持膜)上,並進行利用加熱所行之固化,於支持膜表面形成厚度5μm之接著劑層。Next, 100 parts by mass of bisphenol A epoxy resin (trade name "jER1256", manufactured by Mitsubishi Chemical Co., Ltd.) and 0.1 parts by mass of hardener (trade name "ST14", manufactured by Mitsubishi Chemical Co., Ltd.) were mixed in toluene to a solid content of 20% by mass, and the mixture was stirred to prepare an adhesive layer composition. The adhesive layer composition was applied to a PET film (hereinafter referred to as a support film) whose surface had been subjected to a mold release treatment using a wire tablet, and cured by heating to form an adhesive layer with a thickness of 5 μm on the surface of the support film.
其次,貼合已形成於形狀轉印薄膜表面的電路圖案隱蔽層及已形成於支持膜表面的接著劑層,使用已加熱成100℃的一對金屬輥,於5MPa之壓力下加熱加壓而製得貼附薄膜。所製得貼附薄膜之全光線穿透率在5%以下。Next, the circuit pattern concealing layer formed on the surface of the shape transfer film and the adhesive layer formed on the surface of the support film are laminated, and a pair of metal rollers heated to 100°C are used to heat and pressurize at a pressure of 5MPa to obtain an adhesive film. The total light transmittance of the obtained adhesive film is less than 5%.
(評價用基板之製作) 將上述所製得的貼附薄膜積層於印刷配線板上,然後,使用壓機,於溫度:170℃、壓力:2MPa之條件下抽真空60秒後,再加熱加壓180秒鐘而進行接著,製作出評價用基板。另,上述印刷配線板是使用已於由聚醯亞胺膜構成的基底層上形成有電路圖案的印刷配線板。上述電路圖案是利用線寬0.1mm、高度12μm之銅箔來形成。於上述基底層上,設置厚度25μm之接著劑層及厚度12.5μm之聚醯亞胺膜構成的覆蓋層(絕緣膜)以覆蓋電路圖案。(Preparation of evaluation substrate) The above-prepared adhesive film is laminated on a printed wiring board, and then, a press is used to evacuate the board at a temperature of 170°C and a pressure of 2MPa for 60 seconds, and then heated and pressurized for 180 seconds to prepare an evaluation substrate. In addition, the above-mentioned printed wiring board is a printed wiring board on which a circuit pattern is formed on a base layer composed of a polyimide film. The above-mentioned circuit pattern is formed using a copper foil with a line width of 0.1mm and a height of 12μm. On the above-mentioned base layer, a 25μm thick adhesive layer and a covering layer (insulating film) composed of a polyimide film with a thickness of 12.5μm are provided to cover the circuit pattern.
實施例2 除了於基材層表面形成厚度7μm之樹脂層外,與實施例1同樣施行,製作出形狀轉印薄膜、貼附薄膜及評價用基板。Example 2 Except for forming a 7μm thick resin layer on the surface of the base layer, the same method as Example 1 was followed to produce a shape transfer film, an adhesive film and an evaluation substrate.
實施例3 除了二氧化矽粒子使用D50為4.5μm之二氧化矽粒子外,與實施例1同樣施行,製作出形狀轉印薄膜、貼附薄膜及評價用基板。Example 3 Except that the silica particles used were silica particles with a D50 of 4.5 μm, the same method as Example 1 was followed to produce a shape transfer film, an adhesive film, and an evaluation substrate.
實施例4 除了二氧化矽粒子使用D50為3.8μm之二氧化矽粒子外,與實施例1同樣施行,製作出形狀轉印薄膜、貼附薄膜及評價用基板。Example 4 Except that the silica particles used were silica particles with a D50 of 3.8 μm, the same method as Example 1 was followed to produce a shape transfer film, an adhesive film, and an evaluation substrate.
比較例1 除了二氧化矽粒子使用D50為9μm之二氧化矽粒子外,與實施例1同樣施行,製作出形狀轉印薄膜、貼附薄膜及評價用基板。Comparative Example 1 Except that the silica particles used were silica particles with a D50 of 9 μm, the same method as Example 1 was followed to produce a shape transfer film, an adhesive film, and an evaluation substrate.
比較例2 除了二氧化矽粒子使用D50為10μm之二氧化矽粒子外,與實施例1同樣施行,製作出形狀轉印薄膜、貼附薄膜及評價用基板。Comparative Example 2 Except that the silica particles used were silica particles with a D50 of 10 μm, the same method as Example 1 was followed to produce a shape transfer film, an adhesive film, and an evaluation substrate.
比較例3 除了二氧化矽粒子使用D50為3.5μm之二氧化矽粒子,且於基材層表面形成厚度3μm之樹脂層外,與實施例1同樣施行,製作出形狀轉印薄膜、貼附薄膜及評價用基板。Comparative Example 3 Except that the silica particles used were silica particles with a D50 of 3.5 μm and a resin layer with a thickness of 3 μm was formed on the surface of the substrate layer, the same method as Example 1 was used to produce a shape transfer film, an attachment film and an evaluation substrate.
比較例4 除了於基材層表面形成厚度4μm之樹脂層外,與比較例3同樣施行,製作出形狀轉印薄膜、貼附薄膜及評價用基板。Comparative Example 4 Except for forming a 4μm thick resin layer on the surface of the base layer, the same procedure as in Comparative Example 3 was followed to produce a shape transfer film, an adhesive film, and an evaluation substrate.
比較例5 使用具有表1所示性能的凹凸形狀之薄膜作為形狀轉印薄膜。又,除了使用上述形狀轉印薄膜外,與實施例1同樣施行,製作出貼附薄膜及評價用基板。Comparative Example 5 A film having a concave-convex shape with the properties shown in Table 1 was used as a shape transfer film. In addition, the same method as Example 1 was used to prepare an adhesive film and an evaluation substrate.
比較例6 使用已藉由於聚對苯二甲酸乙二酯樹脂中揑合填料而成形所製得之具有表1所示性能的凹凸形狀之薄膜作為形狀轉印薄膜。又,除了使用上述形狀轉印薄膜外,與實施例1同樣施行,製作出貼附薄膜及評價用基板。Comparative Example 6 A film having a concave-convex shape having the properties shown in Table 1, which was obtained by extruding a filler into a polyethylene terephthalate resin, was used as a shape transfer film. In addition, except for using the above-mentioned shape transfer film, the same method as Example 1 was used to produce an adhesive film and an evaluation substrate.
比較例7 使用已藉由於聚對苯二甲酸乙二酯樹脂中揑合填料而成形所製得之具有表1所示性能的凹凸形狀之薄膜作為形狀轉印薄膜。又,除了使用上述形狀轉印薄膜外,與實施例1同樣施行,製作出貼附薄膜及評價用基板。Comparative Example 7 A film having a concave-convex shape having the properties shown in Table 1 and formed by extruding a filler into a polyethylene terephthalate resin was used as a shape transfer film. In addition, except for using the above-mentioned shape transfer film, the same method as Example 1 was used to produce an adhesive film and an evaluation substrate.
比較例8 使用已藉由將聚對苯二甲酸乙二酯膜表面進行噴砂處理所製得之具有表1所示性能的凹凸形狀之薄膜作為形狀轉印薄膜。又,除了使用上述形狀轉印薄膜外,與實施例1同樣施行,製作出貼附薄膜及評價用基板。Comparative Example 8 A film having a concave-convex shape having the properties shown in Table 1, which was obtained by sandblasting the surface of a polyethylene terephthalate film, was used as a shape transfer film. In addition, except for using the above-mentioned shape transfer film, the same method as Example 1 was used to produce an adhesive film and an evaluation substrate.
(評價) 針對實施例及比較例中製得的各形狀轉印薄膜、貼附薄膜及評價用基板,如下述般進行評價。評價結果記載於表中。(Evaluation) Evaluation was performed as follows for each shape transfer film, adhesive film, and evaluation substrate produced in the embodiment and comparative example. The evaluation results are shown in the table.
(1)表面形狀 使用共焦顯微鏡(商品名「OPTELICS HYBRID」,雷瑟科(Lasertec)公司製造,接物鏡100倍),依循ISO25178,針對已形成於形狀轉印薄膜之樹脂層表面任意5處的凹凸形狀,測定界面展開面積比Sdr、核心部高度差Sk、算術平均高度Sa、均方根高度Sq及均方根斜率Sdq之算術平均。另,S濾波器之截止波長設為0.0025mm,L濾波器之截止波長設為0.8mm。(1) Surface shape Using a confocal microscope (trade name "OPTELICS HYBRID", manufactured by Lasertec, objective lens 100 times), in accordance with ISO25178, the interface development area ratio Sdr, core height difference Sk, arithmetic mean height Sa, root mean square height Sq and arithmetic mean of root mean square slope Sdq were measured for the concave and convex shapes formed at any five locations on the surface of the resin layer of the shape transfer film. In addition, the cutoff wavelength of the S filter was set to 0.0025 mm, and the cutoff wavelength of the L filter was set to 0.8 mm.
(2)光澤度 使用加特納微型光澤儀(Gardner micro gloss)(攜帶型光澤計,畢克(BYK)公司製造),測定已形成於形狀轉印薄膜之樹脂層表面的凹凸形狀中60°光澤度及85°光澤度,以及評價用基板中電路圖案隱蔽層表面之轉印有上述凹凸形狀的區域中60°光澤度及85°光澤度。另,電路圖案隱蔽層表面之光澤度測定是針對已從上述評價用基板剝離形狀轉印薄膜後的表面來進行。(2) Gloss The 60° gloss and 85° gloss of the concavo-convex shapes formed on the resin layer surface of the shape transfer film and the 60° gloss and 85° gloss of the area on the surface of the circuit pattern concealing layer of the evaluation substrate to which the concavo-convex shapes were transferred were measured using a Gardner micro gloss (portable gloss meter, manufactured by BYK). The gloss of the circuit pattern concealing layer surface was measured after the shape transfer film was peeled off from the evaluation substrate.
(3)加熱加壓前的剝離力(第1剝離力) 測定從上述實施例及比較例中所製作之貼附薄膜(進行加熱加壓前的狀態)將形狀轉印薄膜剝離時的剝離力,作為第1剝離力。具體而言,將貼附薄膜固定在厚度100μm之聚醯亞胺膜上,使用強度試驗機(商品名「PFT50S」,帕爾默(PALMEC)股份有限公司),於試樣寬度10mm、剝離角度170°、剝離速度1000mm/min之條件下,評價已從貼附薄膜剝離形狀轉印薄膜時的剝離力(第1剝離力)。(3) Peeling force before heating and pressing (first peeling force) The peeling force when the shape transfer film is peeled off from the adhesive film (before heating and pressing) prepared in the above-mentioned embodiment and comparative example is measured as the first peeling force. Specifically, the adhesive film is fixed on a polyimide film with a thickness of 100 μm, and a strength tester (trade name "PFT50S", PALMEC Co., Ltd.) is used to evaluate the peeling force (first peeling force) when the shape transfer film is peeled off from the adhesive film under the conditions of a sample width of 10 mm, a peeling angle of 170°, and a peeling speed of 1000 mm/min.
(4)加熱加壓後的剝離力(第2剝離力) 測定從在製作上述評價用基板時已進行加熱加壓後的狀態下將形狀轉印薄膜剝離時的剝離力,作為第2剝離力。具體而言,使用強度試驗機(商品名「PFT50S」,帕爾默(PALMEC)股份有限公司),於試樣寬度10mm、剝離角度170°、剝離速度1000mm/min之條件下,評價已從評價用基板剝離形狀轉印薄膜時的剝離力(第2剝離力)。(4) Peeling force after heating and pressing (second peeling force) The peeling force when the shape transfer film is peeled off from the evaluation substrate after heating and pressing when the evaluation substrate is prepared is measured as the second peeling force. Specifically, the peeling force (second peeling force) when the shape transfer film is peeled off from the evaluation substrate is evaluated using a strength tester (trade name "PFT50S", PALMEC Co., Ltd.) under the conditions of a sample width of 10 mm, a peeling angle of 170°, and a peeling speed of 1000 mm/min.
(5)隱蔽性 將評價用基板置於平坦桌面上,剝離形狀轉印薄膜後,於屏蔽配線板之表面照度為500勒克司之環境下,在自評價用基板算起高度為30cm、45°之角度下,評價可否從電路圖案隱蔽層側視辨電路圖案。將無法視辨電路圖案之情形評價為隱蔽性良好(○),將可視辨電路圖案之情形評價為隱蔽性不佳(×)。(5) Concealment Place the evaluation substrate on a flat table, peel off the shape transfer film, and evaluate whether the circuit pattern can be seen from the circuit pattern concealment layer side at a height of 30 cm and an angle of 45° under an environment with a surface illumination of 500 lux on the shielded wiring board. If the circuit pattern cannot be seen, it is evaluated as good concealment (○), and if the circuit pattern can be seen, it is evaluated as poor concealment (×).
[表1] [Table 1]
實施例之形狀轉印薄膜中,使用形狀轉印薄膜所形成的電路圖案隱蔽層之隱蔽性優異,加熱加壓後的剝離力(第2剝離力)低到2.0N以下,從電路圖案隱蔽層之剝離性亦優異。又,加熱加壓前的剝離力(第1剝離力)在0.1N以上,形狀轉印薄膜顯示出在非意圖性狀況下不易剝離。另一方面,當形狀轉印薄膜表面之界面展開面積比Sdr或核心部高度差Sk大時(比較例1及2),第2剝離力會大於2.0N,從電路圖案隱蔽層之剝離性差。又,當形狀轉印薄膜表面之界面展開面積比Sdr或核心部高度差Sk小時(比較例3~8),電路圖案隱蔽層之隱蔽性差。又,比較例8中,第2剝離力大於2.0N,從電路圖案隱蔽層之剝離性亦差。In the shape transfer film of the embodiment, the concealing property of the circuit pattern concealing layer formed by using the shape transfer film is excellent, and the peeling force (the second peeling force) after heating and pressing is as low as below 2.0N, and the peeling property from the circuit pattern concealing layer is also excellent. In addition, the peeling force (the first peeling force) before heating and pressing is above 0.1N, and the shape transfer film shows that it is not easy to peel off under unintentional conditions. On the other hand, when the interface development area ratio Sdr or the core height difference Sk on the surface of the shape transfer film is larger (comparison examples 1 and 2), the second peeling force will be greater than 2.0N, and the peeling property from the circuit pattern concealing layer is poor. Furthermore, when the interface development area of the shape transfer film surface is smaller than Sdr or the core height difference Sk (Comparative Examples 3 to 8), the concealment of the circuit pattern concealing layer is poor. Furthermore, in Comparative Example 8, the second peeling force is greater than 2.0N, and the peeling property from the circuit pattern concealing layer is also poor.
1:形狀轉印薄膜 2:基材層 2a,3a:形狀轉印薄膜平坦面 3:樹脂層 4:填料 5:印刷配線板用貼附薄膜 6:電路圖案隱蔽層 7:接著劑層1: Shape transfer film 2: Base material layer 2a, 3a: Flat surface of shape transfer film 3: Resin layer 4: Filler 5: Adhesive film for printed wiring board 6: Circuit pattern concealing layer 7: Adhesive layer
圖1為截面示意圖,其顯示本揭示發明之形狀轉印薄膜之一實施形態。 圖2為截面示意圖,其顯示本揭示發明之形狀轉印薄膜之其他實施形態。 圖3為截面示意圖,其顯示使用了圖1所示之形狀轉印薄膜的印刷配線板用貼附薄膜之一實施形態。FIG. 1 is a schematic cross-sectional view showing one embodiment of the shape transfer film of the present invention. FIG. 2 is a schematic cross-sectional view showing another embodiment of the shape transfer film of the present invention. FIG. 3 is a schematic cross-sectional view showing one embodiment of an adhesive film for a printed wiring board using the shape transfer film shown in FIG. 1.
1:形狀轉印薄膜1: Shape transfer film
2:基材層2: Base material layer
3:樹脂層3: Resin layer
3a:形狀轉印薄膜平坦面3a: Flat surface of shape transfer film
4:填料4: Filling
Claims (12)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020001942 | 2020-01-09 | ||
| JP2020-001942 | 2020-01-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202130500A TW202130500A (en) | 2021-08-16 |
| TWI844723B true TWI844723B (en) | 2024-06-11 |
Family
ID=76788612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109129894A TWI844723B (en) | 2020-01-09 | 2020-09-01 | Shape transfer film |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7410182B2 (en) |
| KR (1) | KR102773073B1 (en) |
| CN (1) | CN114902819B (en) |
| TW (1) | TWI844723B (en) |
| WO (1) | WO2021141098A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023145973A1 (en) * | 2022-01-31 | 2023-08-03 | 太陽ホールディングス株式会社 | Dry film, cured product, interlayer insulation layer comprising cured product, and wiring board |
| US12280564B2 (en) * | 2022-02-11 | 2025-04-22 | Chang Chun Petrochemical Co., Ltd. | Polymer film and uses of the same |
| US12280565B2 (en) * | 2022-02-11 | 2025-04-22 | Chang Chun Petrochemical Co., Ltd. | Polymer film and uses of the same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201634521A (en) * | 2014-11-19 | 2016-10-01 | Teijin Dupont Films Japan Ltd | Biaxially oriented polyester film |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3929957B2 (en) * | 2003-09-30 | 2007-06-13 | 株式会社ダイフク・ロジスティック・テクノロジー | Automatic warehouse and its operation method |
| JP5115980B2 (en) * | 2008-08-14 | 2013-01-09 | 新日鉄住金化学株式会社 | Method for manufacturing circuit wiring board |
| JP6014680B2 (en) * | 2012-11-19 | 2016-10-25 | タツタ電線株式会社 | Laminated film and shield printed wiring board |
| JP6247577B2 (en) * | 2014-03-24 | 2017-12-13 | 帝人フィルムソリューション株式会社 | Polyester film for electromagnetic wave shield film transfer |
| JP6441036B2 (en) * | 2014-11-13 | 2018-12-19 | 旭化成株式会社 | Transfer method |
| JP6630108B2 (en) | 2015-10-06 | 2020-01-15 | 東洋紡フイルムソリューション株式会社 | Biaxially oriented polyester film with matte layer |
| JP6863908B2 (en) * | 2018-01-12 | 2021-04-21 | タツタ電線株式会社 | Electromagnetic wave shield film |
| TW201943054A (en) * | 2018-03-30 | 2019-11-01 | 日商拓自達電線股份有限公司 | Electromagnetic wave shielding film, shielding printed circuit board and method for manufacturing shielding printed circuit capable of exhibiting high adhesive strength when an adhered member such as a reinforced plate is adhered to the isolation layer |
| TWI768219B (en) * | 2018-07-06 | 2022-06-21 | 日商拓自達電線股份有限公司 | Adhesive film for printed wiring board |
| CN114650718B (en) * | 2021-02-09 | 2025-06-03 | 广州方邦电子股份有限公司 | Electromagnetic shielding film and circuit board |
-
2020
- 2020-09-01 TW TW109129894A patent/TWI844723B/en active
-
2021
- 2021-01-08 WO PCT/JP2021/000419 patent/WO2021141098A1/en not_active Ceased
- 2021-01-08 CN CN202180007796.1A patent/CN114902819B/en active Active
- 2021-01-08 KR KR1020227019748A patent/KR102773073B1/en active Active
- 2021-01-08 JP JP2021570095A patent/JP7410182B2/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201634521A (en) * | 2014-11-19 | 2016-10-01 | Teijin Dupont Films Japan Ltd | Biaxially oriented polyester film |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20220124685A (en) | 2022-09-14 |
| TW202130500A (en) | 2021-08-16 |
| JP7410182B2 (en) | 2024-01-09 |
| CN114902819A (en) | 2022-08-12 |
| KR102773073B1 (en) | 2025-02-24 |
| JPWO2021141098A1 (en) | 2021-07-15 |
| CN114902819B (en) | 2025-03-04 |
| WO2021141098A1 (en) | 2021-07-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI844723B (en) | Shape transfer film | |
| JP6722370B2 (en) | Adhesive film for printed wiring boards | |
| KR20190114890A (en) | Electromagnetic wave shield film, shield printed circuit board and method for manufacturing shield printed circuit | |
| JP6431998B1 (en) | Conductive adhesive layer | |
| TWI829647B (en) | Electromagnetic wave shielding film | |
| JP7181933B2 (en) | Adhesive film for printed wiring board | |
| TWI842957B (en) | Electromagnetic wave shielding film | |
| TW202134051A (en) | Electromagnetic wave shielding film | |
| JP7506150B2 (en) | Electromagnetic wave shielding film | |
| JP7566151B2 (en) | Electromagnetic wave shielding film | |
| TW202138189A (en) | Electromagnetic wave shielding film | |
| CN118234619A (en) | Transfer film and electromagnetic wave shielding film with transfer film | |
| TW202446610A (en) | Transfer film, electromagnetic wave shielding film with transfer film, and shielding printed wiring board | |
| KR102926362B1 (en) | electromagnetic shielding film | |
| JP7180033B2 (en) | electromagnetic wave shielding film | |
| TW202547957A (en) | Electromagnetic wave shielding film | |
| HK40036487A (en) | Adhesive film for printed wiring board | |
| HK40035233B (en) | Electromagnetic wave shielding film |