[go: up one dir, main page]

TWI843535B - Display panel - Google Patents

Display panel Download PDF

Info

Publication number
TWI843535B
TWI843535B TW112114726A TW112114726A TWI843535B TW I843535 B TWI843535 B TW I843535B TW 112114726 A TW112114726 A TW 112114726A TW 112114726 A TW112114726 A TW 112114726A TW I843535 B TWI843535 B TW I843535B
Authority
TW
Taiwan
Prior art keywords
pixel
electrode
layer
disposed
metal layer
Prior art date
Application number
TW112114726A
Other languages
Chinese (zh)
Other versions
TW202405529A (en
Inventor
李孟儒
陳諺宗
徐維志
葉政諺
蘇振豪
Original Assignee
瀚宇彩晶股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 瀚宇彩晶股份有限公司 filed Critical 瀚宇彩晶股份有限公司
Publication of TW202405529A publication Critical patent/TW202405529A/en
Application granted granted Critical
Publication of TWI843535B publication Critical patent/TWI843535B/en

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136209Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

This invention discloses a display panel which includes a sub-pixel, a first metal layer, a second metal layer, a transparent conductive layer and a third metal layer. The sub-pixel includes a switching element. The first metal layer includes a scan line electrically connected with the switch element. The second metal layer is disposed on the first metal layer and includes a pixel electrode and a data line, the pixel electrode and the data line are electrically connected with the switching element, and a portion of the data line includes a blackened layer. The transparent conductive layer includes a transparent electrode disposed on the pixel electrode and electrically connected with the pixel electrode. The third metal layer includes a reflective electrode disposed on the transparent electrode and electrically connected with the transparent electrode.

Description

顯示面板 Display panel

本發明涉及一種顯示面板,特別是涉及一種反射式顯示面板。 The present invention relates to a display panel, in particular to a reflective display panel.

在反射式顯示面板中,相鄰子像素之間存在有間隙,而被金屬電極所反射的光可能會從這些間隙漏出,進而造成對比不佳。因此,如何減少反射式顯示面板的漏光成為了提升顯示品質的重要研究問題之一。 In a reflective display panel, there are gaps between adjacent sub-pixels, and light reflected by the metal electrode may leak out from these gaps, resulting in poor contrast. Therefore, how to reduce light leakage in reflective display panels has become one of the important research issues for improving display quality.

本發明所要解決的技術問題是如何減少顯示面板的漏光以提升顯示品質。 The technical problem that this invention aims to solve is how to reduce light leakage from the display panel to improve display quality.

為解決上述技術問題,本發明提供了一種顯示面板,包括一顯示區和一非顯示區,非顯示區設置在顯示區的至少一側。顯示面板包括一第一基板、一第一子像素、一第一金屬層、一第二金屬層、一透明導電層以及一第三金屬層。第一子像素設置在第一基板上和顯示區內,且第一子像素包括一第一開關元件。第一金屬層設置在第一基板上,第一金屬層包括多條第一信號線設置在顯示區內,第一信號線包括一第一掃描線電連接第一開關元件,且第一掃描線 沿著一第一方向延伸。一第二金屬層設置在第一金屬層上,第二金屬層包括第一子像素的一第一像素電極以及多條第二信號線。第一像素電極電連接第一開關元件。第二信號線設置在顯示區內,第二信號線包括一數據線電連接第一開關元件,數據線沿著一第二方向延伸,第一方向和第二方向不同,且數據線的一部分包括一黑化層。透明導電層設置在第二金屬層上,第二金屬層設置在透明導電層和第一金屬層之間,透明導電層包括第一子像素的一第一透明電極,且第一透明電極設置在第一像素電極上並電連接第一像素電極。第三金屬層設置在透明導電層上,透明導電層設置在第三金屬層和第二金屬層之間,第三金屬層包括第一子像素的一第一反射電極,且第一反射電極設置在第一透明電極上並電連接第一透明電極。 To solve the above technical problems, the present invention provides a display panel, including a display area and a non-display area, wherein the non-display area is arranged on at least one side of the display area. The display panel includes a first substrate, a first sub-pixel, a first metal layer, a second metal layer, a transparent conductive layer and a third metal layer. The first sub-pixel is arranged on the first substrate and in the display area, and the first sub-pixel includes a first switch element. The first metal layer is arranged on the first substrate, the first metal layer includes a plurality of first signal lines arranged in the display area, the first signal line includes a first scanning line electrically connected to the first switch element, and the first scanning line extends along a first direction. A second metal layer is arranged on the first metal layer, the second metal layer includes a first pixel electrode of the first sub-pixel and a plurality of second signal lines. The first pixel electrode is electrically connected to the first switch element. The second signal line is arranged in the display area, the second signal line includes a data line electrically connected to the first switch element, the data line extends along a second direction, the first direction and the second direction are different, and a portion of the data line includes a blackening layer. The transparent conductive layer is arranged on the second metal layer, the second metal layer is arranged between the transparent conductive layer and the first metal layer, the transparent conductive layer includes a first transparent electrode of the first sub-pixel, and the first transparent electrode is arranged on the first pixel electrode and electrically connected to the first pixel electrode. The third metal layer is arranged on the transparent conductive layer, the transparent conductive layer is arranged between the third metal layer and the second metal layer, the third metal layer includes a first reflective electrode of the first sub-pixel, and the first reflective electrode is arranged on the first transparent electrode and electrically connected to the first transparent electrode.

在本發明的顯示面板中,位於間隙下方的金屬層的部分或全部包括黑化層,可減少反射光並減少漏光,進而提高對比。 In the display panel of the present invention, part or all of the metal layer below the gap includes a blackened layer, which can reduce reflected light and reduce light leakage, thereby improving contrast.

10:顯示面板 10: Display panel

100,200:基板 100,200: Substrate

100s:上表面 100s: upper surface

102,108,116:金屬層 102,108,116:Metal layer

104,110,112:絕緣層 104,110,112: Insulation layer

114:透明導電層 114: Transparent conductive layer

1180:第一部分 1180: Part 1

1182:第二部分 1182: Part 2

1200:第三部分 1200: Part 3

1202:第四部分 1202: Part 4

1220,1221,1260,1261:邊緣 1220,1221,1260,1261:Edge

124:黑化層 124: Black layer

1280,1282,1284:子層 1280,1282,1284: Sublayer

300:液晶層 300: Liquid crystal layer

AA:顯示區 AA: Display area

CH:半導體層 CH: semiconductor layer

CE1,CE2,202:公共電極 CE1, CE2, 202: Common electrode

CL:共通信號線 CL: Public Line

D:汲極 D: Drain

DL1,DL2,DL3:數據線 DL1, DL2, DL3: data lines

G:閘極 G: Gate

GL1,GL2:掃描線 GL1,GL2: Scan line

GP:間隙 GP: Gap

IL:環境光 IL: Ambient Light

PA:非顯示區 PA: Non-display area

PE1,PE2:像素電極 PE1, PE2: pixel electrodes

RE1,RE2:反射電極 RE1,RE2: Reflection electrode

S:源極 S: Source

SP,SP1,SP2:子像素 SP,SP1,SP2: sub-pixel

SW1,SW2:開關元件 SW1, SW2: switch components

TE1,TE2:透明電極 TE1,TE2: Transparent electrode

V1,V2:接觸洞 V1, V2: contact holes

W1:第一寬度 W1: First width

W2:第二寬度 W2: Second width

X,Y,Z:方向 X,Y,Z: Direction

圖1為本發明第一實施例的顯示面板的俯視示意圖。 Figure 1 is a schematic top view of the display panel of the first embodiment of the present invention.

圖2為本發明第一實施例的顯示面板的像素結構的俯視示意圖。 Figure 2 is a top view schematic diagram of the pixel structure of the display panel of the first embodiment of the present invention.

圖3為本發明第一實施例的顯示面板的剖視示意圖。 Figure 3 is a schematic cross-sectional view of the display panel of the first embodiment of the present invention.

圖4為本發明第一實施例的黑化層的剖視示意圖。 Figure 4 is a schematic cross-sectional view of the blackening layer of the first embodiment of the present invention.

圖5為本發明第一實施例的第一變化實施例的黑化層的剖視示意圖。 Figure 5 is a schematic cross-sectional view of the blackening layer of the first variant embodiment of the first embodiment of the present invention.

圖6為本發明第一實施例的第二變化實施例的黑化層的剖視示意圖。 Figure 6 is a schematic cross-sectional view of the blackening layer of the second variant embodiment of the first embodiment of the present invention.

圖7為本發明第二實施例的顯示面板的剖視示意圖。 Figure 7 is a schematic cross-sectional view of the display panel of the second embodiment of the present invention.

為使本領域技術人員能更進一步瞭解本發明,以下特列舉本發明的優選實施例,並配合附圖詳細說明本發明的構成內容及所欲達成的功效。須注意的是,附圖均為簡化的示意圖,因此,僅顯示與本發明有關的元件與組合關係,以對本發明的基本架構或實施方法提供更清楚的描述,而實際的元件與佈局可能更為複雜。另外,為了方便說明,本發明的各附圖中所示的元件並非以實際實施的數目、形狀、尺寸做等比例繪製,其詳細的比例可依照設計的需求進行調整。 In order to enable technical personnel in this field to further understand the present invention, the preferred embodiments of the present invention are listed below, and the components and intended effects of the present invention are described in detail with the accompanying drawings. It should be noted that the accompanying drawings are simplified schematic diagrams, and therefore only show the components and combination relationships related to the present invention to provide a clearer description of the basic structure or implementation method of the present invention, while the actual components and layout may be more complicated. In addition, for the convenience of explanation, the components shown in the various drawings of the present invention are not drawn in proportion to the actual number, shape, and size, and the detailed proportions can be adjusted according to the design requirements.

以下圖式中標出了一方向X(或可稱為第一方向)、一方向Y(或可稱為第二方向)和一方向Z(或可稱為垂直投影方向)。方向Z可垂直於一基板100的一上表面100s(如圖3),方向X和方向Y可平行於基板100的上表面100s。方向Z可垂直於方向X和方向Y,且方向X可垂直於方向Y。以下圖式可依據方向X、方向Y和方向Z來描述結構的空間關係。 The following figure shows a direction X (or a first direction), a direction Y (or a second direction), and a direction Z (or a vertical projection direction). Direction Z may be perpendicular to an upper surface 100s of a substrate 100 (as shown in FIG. 3 ), and direction X and direction Y may be parallel to the upper surface 100s of the substrate 100. Direction Z may be perpendicular to direction X and direction Y, and direction X may be perpendicular to direction Y. The following figure may describe the spatial relationship of the structure according to direction X, direction Y, and direction Z.

請參考圖1到圖4,圖1為本發明第一實施例的顯示面板的俯視示意圖,圖2為本發明第一實施例的顯示面板的像素結構的俯視示意圖,圖3為本發明第一實施例的顯示面板的剖視示意圖,而圖4為本發明第一實施例的黑化層的剖視示意圖。圖3的結構可對應於圖2中的剖線A-A’、B-B’和C-C’。本實施例的顯示面板可為反射式液晶面板,但本發明不以此為限。 Please refer to Figures 1 to 4, Figure 1 is a schematic top view of the display panel of the first embodiment of the present invention, Figure 2 is a schematic top view of the pixel structure of the display panel of the first embodiment of the present invention, Figure 3 is a schematic cross-sectional view of the display panel of the first embodiment of the present invention, and Figure 4 is a schematic cross-sectional view of the blackening layer of the first embodiment of the present invention. The structure of Figure 3 may correspond to the section lines A-A', B-B' and C-C' in Figure 2. The display panel of this embodiment may be a reflective liquid crystal panel, but the present invention is not limited thereto.

如圖1,顯示面板10包括一顯示區AA和一非顯示區PA。非顯示區PA設置在顯示區AA的至少一側,如圖1,非顯示區PA可圍繞顯示區AA,但不以此為限。此外,顯示面板10包括多個子像素SP設置在顯示區AA內。如圖1和圖2,顯示面板10包括一子像素SP1(或可稱為第一子像素)和一子像素SP2(或可稱為第二子像素),且子像素SP1和子像素SP2在方向X上相鄰設置。各子像素SP包括至 少一開關元件。如圖2,子像素SP1包括一開關元件SW1(或可稱為第一開關元件),且子像素SP2包括一開關元件SW2(或可稱為第二開關元件)。 As shown in FIG1 , the display panel 10 includes a display area AA and a non-display area PA. The non-display area PA is disposed on at least one side of the display area AA. As shown in FIG1 , the non-display area PA may surround the display area AA, but is not limited thereto. In addition, the display panel 10 includes a plurality of sub-pixels SP disposed in the display area AA. As shown in FIG1 and FIG2 , the display panel 10 includes a sub-pixel SP1 (or may be referred to as a first sub-pixel) and a sub-pixel SP2 (or may be referred to as a second sub-pixel), and the sub-pixel SP1 and the sub-pixel SP2 are disposed adjacent to each other in the direction X. Each sub-pixel SP includes at least one switching element. As shown in FIG2 , the sub-pixel SP1 includes a switching element SW1 (or may be referred to as a first switching element), and the sub-pixel SP2 includes a switching element SW2 (or may be referred to as a second switching element).

開關元件可包括薄膜電晶體,薄膜電晶體可例如是底閘型薄膜電晶體(bottom-gate thin film transistor),但不以此為限,在其他實施例中,薄膜電晶體也可以是頂閘型薄膜電晶體(top-gate thin film transistor)。此外,薄膜電晶體可以是低溫多晶矽(low temperature poly-silicon,LTPS)薄膜電晶體、銦鎵鋅氧化物((indium gallium zinc oxide,IGZO)薄膜電晶體或非晶矽(a-Si)薄膜電晶體,但不以此為限。 The switch element may include a thin film transistor, and the thin film transistor may be, for example, a bottom-gate thin film transistor, but is not limited thereto. In other embodiments, the thin film transistor may also be a top-gate thin film transistor. In addition, the thin film transistor may be a low temperature polysilicon (LTPS) thin film transistor, an indium gallium zinc oxide (IGZO) thin film transistor, or an amorphous silicon (a-Si) thin film transistor, but is not limited thereto.

如圖3,顯示面板10包括基板100(或可稱為第一基板)、一基板200(或可稱為第二基板)以及一液晶層300,基板200在方向Z上相對基板100設置,且液晶層300設置在基板100和基板200之間。此外,子像素SP1、SP2及開關元件SW1、SW2設置在基板100上。 As shown in FIG3 , the display panel 10 includes a substrate 100 (or may be referred to as a first substrate), a substrate 200 (or may be referred to as a second substrate), and a liquid crystal layer 300. The substrate 200 is disposed relative to the substrate 100 in the direction Z, and the liquid crystal layer 300 is disposed between the substrate 100 and the substrate 200. In addition, sub-pixels SP1, SP2 and switch elements SW1, SW2 are disposed on the substrate 100.

基板100、200可包括硬質基板例如玻璃基板、塑料基板、石英基板或藍寶石基板,但不以此為限。基板100、200也可包括可撓式基板例如聚亞醯胺(polyimide,PI)基板或聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)基板,但不以此為限。液晶層300可包括任何適合種類的液晶,但不以此為限。 The substrates 100 and 200 may include hard substrates such as glass substrates, plastic substrates, quartz substrates or sapphire substrates, but are not limited thereto. The substrates 100 and 200 may also include flexible substrates such as polyimide (PI) substrates or polyethylene terephthalate (PET) substrates, but are not limited thereto. The liquid crystal layer 300 may include any suitable type of liquid crystal, but is not limited thereto.

如圖3,顯示面板10包括一金屬層102(或可稱為第一金屬層)、一絕緣層104、一金屬層108(或可稱為第二金屬層)、一絕緣層110、一絕緣層112、一透明導電層114以及一金屬層116(或可稱為第三金屬層),但不以此為限。 As shown in FIG3 , the display panel 10 includes a metal layer 102 (or may be referred to as a first metal layer), an insulating layer 104, a metal layer 108 (or may be referred to as a second metal layer), an insulating layer 110, an insulating layer 112, a transparent conductive layer 114, and a metal layer 116 (or may be referred to as a third metal layer), but is not limited thereto.

金屬層102設置在基板100上,金屬層102包括各個開關元件(如開關元件SW1)的一閘極G。金屬層102包括多條第一信號線設置在顯示區AA內,如圖2,第一信號線可至少包括一掃描線GL1(或可稱為第一掃描線)、一掃描線GL2(或可稱為第二掃描線)和一共通信號線CL,但不以此為限。掃描線GL1、掃描線GL2和共通信號線CL沿著方向X延伸,掃描線GL1和掃描線GL2沿著方向Y 排列,且共通信號線CL在方向Y上設置在掃描線GL1和掃描線GL2之間,即一條共通信號線可在方向Y上設置在兩條相鄰掃描線之間,但不以此為限。 The metal layer 102 is disposed on the substrate 100. The metal layer 102 includes a gate G of each switch element (such as the switch element SW1). The metal layer 102 includes a plurality of first signal lines disposed in the display area AA. As shown in FIG. 2 , the first signal line may include at least a scanning line GL1 (or may be referred to as a first scanning line), a scanning line GL2 (or may be referred to as a second scanning line) and a common signal line CL, but is not limited thereto. Scanning line GL1, scanning line GL2 and common signal line CL extend along direction X, scanning line GL1 and scanning line GL2 are arranged along direction Y, and common signal line CL is arranged between scanning line GL1 and scanning line GL2 in direction Y, that is, a common signal line can be arranged between two adjacent scanning lines in direction Y, but is not limited thereto.

掃描線GL1電連接開關元件SW1的閘極G,掃描線GL2電連接開關元件SW2的閘極G。此外,金屬層102包括子像素SP1的一公共電極CE1(或可稱為第一公共電極)和子像素SP2的一公共電極CE2(或可稱為第二公共電極),公共電極CE1和公共電極CE2沿著方向X排列,且共通信號線CL電連接公共電極CE1和公共電極CE2。 Scan line GL1 is electrically connected to gate G of switch element SW1, and scan line GL2 is electrically connected to gate G of switch element SW2. In addition, metal layer 102 includes a common electrode CE1 (or first common electrode) of sub-pixel SP1 and a common electrode CE2 (or second common electrode) of sub-pixel SP2. Common electrode CE1 and common electrode CE2 are arranged along direction X, and common signal line CL electrically connects common electrode CE1 and common electrode CE2.

如圖3,各個開關元件(如開關元件SW1)包括一半導體層CH,半導體層CH和金屬層108設置在金屬層102上,且絕緣層104設置在半導體層CH和金屬層102之間並設置在金屬層108和金屬層102之間。半導體層CH包括多晶矽、非晶矽或金屬氧化物,但不以此為限。 As shown in FIG3 , each switch element (such as switch element SW1) includes a semiconductor layer CH, the semiconductor layer CH and the metal layer 108 are disposed on the metal layer 102, and the insulating layer 104 is disposed between the semiconductor layer CH and the metal layer 102 and between the metal layer 108 and the metal layer 102. The semiconductor layer CH includes polycrystalline silicon, amorphous silicon or metal oxide, but is not limited thereto.

金屬層108包括多條第二信號線設置在顯示區AA內,如圖2,第二信號線可至少包括一數據線DL1、一數據線DL2和一數據線DL3,但不以此為限。數據線DL1、數據線DL2和數據線DL3沿著方向Y延伸並沿著方向X排列,且數據線DL1在方向X上設置在數據線DL2和數據線DL3之間。數據線DL1電連接開關元件SW1的一源極S並電連接開關元件SW2的源極S。 The metal layer 108 includes a plurality of second signal lines disposed in the display area AA, as shown in FIG2 , and the second signal lines may include at least one data line DL1, one data line DL2, and one data line DL3, but are not limited thereto. The data line DL1, the data line DL2, and the data line DL3 extend along the direction Y and are arranged along the direction X, and the data line DL1 is disposed between the data line DL2 and the data line DL3 in the direction X. The data line DL1 is electrically connected to a source S of the switch element SW1 and is electrically connected to a source S of the switch element SW2.

金屬層108包括各子像素的一像素電極,如圖2,金屬層108包括子像素SP1的一像素電極PE1(或可稱為第一像素電極)以及子像素SP2的一像素電極PE2(或可稱為第二像素電極)。像素電極PE1電連接開關元件SW1的一汲極D,像素電極PE2電連接開關元件SW2的汲極D,且金屬層108包括各子像素的源極S和汲極D。 The metal layer 108 includes a pixel electrode of each sub-pixel. As shown in FIG2 , the metal layer 108 includes a pixel electrode PE1 (or a first pixel electrode) of the sub-pixel SP1 and a pixel electrode PE2 (or a second pixel electrode) of the sub-pixel SP2. The pixel electrode PE1 is electrically connected to a drain D of the switch element SW1, and the pixel electrode PE2 is electrically connected to the drain D of the switch element SW2. The metal layer 108 includes a source S and a drain D of each sub-pixel.

如圖2,在方向Z上,公共電極CE1設置在像素電極PE1和基板100之間,且公共電極CE2設置在像素電極PE2和基板100之間。在方向Y上,像素電極PE1、公共電極CE1、像素電極PE2和公共電極CE2設置在掃描線GL1和掃描線 GL2之間,像素電極PE1和公共電極CE1設置在開關元件SW1和掃描線GL1的上方,而像素電極PE2和公共電極CE2設置在開關元件SW2和掃描線GL2的下方。 As shown in FIG2 , in the direction Z, the common electrode CE1 is disposed between the pixel electrode PE1 and the substrate 100, and the common electrode CE2 is disposed between the pixel electrode PE2 and the substrate 100. In the direction Y, the pixel electrode PE1, the common electrode CE1, the pixel electrode PE2 and the common electrode CE2 are disposed between the scanning line GL1 and the scanning line GL2, the pixel electrode PE1 and the common electrode CE1 are disposed above the switching element SW1 and the scanning line GL1, and the pixel electrode PE2 and the common electrode CE2 are disposed below the switching element SW2 and the scanning line GL2.

如圖3,絕緣層110設置在金屬層108和半導體層CH上,且絕緣層112、透明導電層114以及金屬層116依序設置在絕緣層110上,但不以此為限。絕緣層112的厚度可大於絕緣層110的厚度,但不以此為限。絕緣層104、絕緣層110和絕緣層112可包括無機或有機絕緣材料,但不以此為限。 As shown in FIG3 , the insulating layer 110 is disposed on the metal layer 108 and the semiconductor layer CH, and the insulating layer 112, the transparent conductive layer 114 and the metal layer 116 are sequentially disposed on the insulating layer 110, but not limited thereto. The thickness of the insulating layer 112 may be greater than the thickness of the insulating layer 110, but not limited thereto. The insulating layer 104, the insulating layer 110 and the insulating layer 112 may include inorganic or organic insulating materials, but not limited thereto.

絕緣層110包括多個接觸洞V1,各個接觸洞V1可暴露出一個像素電極的一部分的上表面。如圖3,接觸洞V1穿過絕緣層110並暴露出一部分的像素電極PE1的上表面。絕緣層112包括多個接觸洞V2,各個接觸洞V2可暴露出一個接觸洞V1。如圖3,接觸洞V2穿過絕緣層112並暴露出接觸洞V1和一部分的絕緣層110的上表面。 The insulating layer 110 includes a plurality of contact holes V1, each of which can expose a portion of the upper surface of a pixel electrode. As shown in FIG3 , the contact hole V1 passes through the insulating layer 110 and exposes a portion of the upper surface of the pixel electrode PE1. The insulating layer 112 includes a plurality of contact holes V2, each of which can expose a contact hole V1. As shown in FIG3 , the contact hole V2 passes through the insulating layer 112 and exposes the contact hole V1 and a portion of the upper surface of the insulating layer 110.

透明導電層114設置在金屬層108上,且金屬層108設置在透明導電層114和金屬層102之間。透明導電層114包括各子像素的一透明電極,如圖2,透明導電層114包括子像素SP1的一透明電極TE1(或可稱為第一透明電極)和子像素SP2的一透明電極TE2(或可稱為第二透明電極)。 The transparent conductive layer 114 is disposed on the metal layer 108, and the metal layer 108 is disposed between the transparent conductive layer 114 and the metal layer 102. The transparent conductive layer 114 includes a transparent electrode for each sub-pixel. As shown in FIG2 , the transparent conductive layer 114 includes a transparent electrode TE1 (or a first transparent electrode) for the sub-pixel SP1 and a transparent electrode TE2 (or a second transparent electrode) for the sub-pixel SP2.

透明電極TE1設置在像素電極PE1上並電連接像素電極PE1,而透明電極TE2設置在像素電極PE2上並電連接像素電極PE2。如圖3,透明電極TE1可延伸進接觸洞V2和接觸洞V1並可和像素電極PE1接觸。類似的,圖2中的透明電極TE2也可延伸進對應的接觸洞V2和接觸洞V1並可和像素電極PE2接觸。透明導電層114可包括氧化銦錫(indium tin oxide,ITO)、氧化銦鋅(indium zinc oxide,IZO)或氧化鋁鋅(aluminum zinc oxide,AZO),但不以此為限。 The transparent electrode TE1 is disposed on the pixel electrode PE1 and electrically connected to the pixel electrode PE1, and the transparent electrode TE2 is disposed on the pixel electrode PE2 and electrically connected to the pixel electrode PE2. As shown in FIG3 , the transparent electrode TE1 can extend into the contact hole V2 and the contact hole V1 and can contact the pixel electrode PE1. Similarly, the transparent electrode TE2 in FIG2 can also extend into the corresponding contact hole V2 and the contact hole V1 and can contact the pixel electrode PE2. The transparent conductive layer 114 may include indium tin oxide (ITO), indium zinc oxide (IZO) or aluminum zinc oxide (AZO), but is not limited thereto.

金屬層116設置在透明導電層114上,且透明導電層114設置在金屬層116和金屬層108之間。金屬層116包括各子像素的一反射電極,如圖2,金屬層116包括子像素SP1的一反射電極RE1(或可稱為第一反射電極)和子像素SP2的一反 射電極RE2(或可稱為第二反射電極)。 The metal layer 116 is disposed on the transparent conductive layer 114, and the transparent conductive layer 114 is disposed between the metal layer 116 and the metal layer 108. The metal layer 116 includes a reflective electrode for each sub-pixel. As shown in FIG2 , the metal layer 116 includes a reflective electrode RE1 (or a first reflective electrode) for the sub-pixel SP1 and a reflective electrode RE2 (or a second reflective electrode) for the sub-pixel SP2.

如圖3,反射電極RE1設置在透明電極TE1上並電連接透明電極TE1,反射電極RE1可和透明電極TE1接觸,且反射電極RE1也可延伸進接觸洞V2和接觸洞V1。類似的,反射電極RE2設置在透明電極TE2上並電連接透明電極TE2,反射電極RE2可和透明電極TE2接觸,且反射電極RE2也可延伸進接觸洞V2和接觸洞V1。 As shown in FIG3 , the reflective electrode RE1 is disposed on the transparent electrode TE1 and electrically connected to the transparent electrode TE1, the reflective electrode RE1 can contact the transparent electrode TE1, and the reflective electrode RE1 can also extend into the contact hole V2 and the contact hole V1. Similarly, the reflective electrode RE2 is disposed on the transparent electrode TE2 and electrically connected to the transparent electrode TE2, the reflective electrode RE2 can contact the transparent electrode TE2, and the reflective electrode RE2 can also extend into the contact hole V2 and the contact hole V1.

金屬層102和金屬層108可包括鋁、銅、鈦、鎢等單一金屬層或者是鉬/鋁/鉬、鈦/鋁/鈦、鈦/銅/鈦、鈦/銅...等複合金屬層,但不以此為限。金屬層116可包括銀等適合的反射性金屬材料,導電層116也可包括單一金屬層或複合金屬層,但不以此為限。 The metal layer 102 and the metal layer 108 may include a single metal layer such as aluminum, copper, titanium, tungsten, or a composite metal layer such as molybdenum/aluminum/molybdenum, titanium/aluminum/titanium, titanium/copper/titanium, titanium/copper..., but are not limited thereto. The metal layer 116 may include a suitable reflective metal material such as silver, and the conductive layer 116 may also include a single metal layer or a composite metal layer, but are not limited thereto.

反射電極RE1、透明電極TE1和像素電極PE1可互相電連接並可一起用做像素電極,同樣的,反射電極RE2、透明電極TE2和像素電極PE2可互相電連接並也可一起用做像素電極,但不以此為限。 The reflective electrode RE1, the transparent electrode TE1 and the pixel electrode PE1 can be electrically connected to each other and can be used together as pixel electrodes. Similarly, the reflective electrode RE2, the transparent electrode TE2 and the pixel electrode PE2 can be electrically connected to each other and can also be used together as pixel electrodes, but this is not limited to this.

反射電極RE1和反射電極RE2之間具有一間隙GP。舉例而言,間隙GP可位於反射電極RE1的一邊緣1220和反射電極RE2的一邊緣1221之間,但不以此為限。 There is a gap GP between the reflective electrode RE1 and the reflective electrode RE2. For example, the gap GP may be located between an edge 1220 of the reflective electrode RE1 and an edge 1221 of the reflective electrode RE2, but is not limited thereto.

如圖3,在方向Z上位於間隙GP下方的數據線DL1的一部分包括一黑化層124。換句話說,間隙GP和數據線DL1的一部分的黑化層124在方向Z上部分重疊。數據線DL1也可全部包括黑化層124,但不以此為限。此外,如圖2,數據線DL1、數據線DL2和數據線DL3可都位於對應的間隙GP下方並可都部分或全部包括黑化層124,但不以此為限。 As shown in FIG3 , a portion of the data line DL1 located below the gap GP in the direction Z includes a black layer 124. In other words, the gap GP and the black layer 124 of a portion of the data line DL1 partially overlap in the direction Z. The data line DL1 may also include the black layer 124 in its entirety, but is not limited thereto. In addition, as shown in FIG2 , the data line DL1, the data line DL2, and the data line DL3 may all be located below the corresponding gap GP and may all include the black layer 124 in part or in its entirety, but is not limited thereto.

當製作反射電極RE1和反射電極RE2時造成間隙GP過大,可能會造成顯示面板10內的電場在間隙GP附近的區域內不穩定,因此位於所述區域內的液晶無法受到有效控制。此時,當一環境光IL從基板200入射到顯示面板10內, 並受到間隙GP下方的金屬層(如數據線DL1)反射後,此反射光可能穿透間隙GP並射出顯示面板10造成漏光,進而造成對比不佳。 When the gap GP is too large when manufacturing the reflective electrodes RE1 and RE2, the electric field in the display panel 10 may be unstable in the area near the gap GP, so the liquid crystal in the area cannot be effectively controlled. At this time, when an ambient light IL is incident from the substrate 200 into the display panel 10, and is reflected by the metal layer (such as the data line DL1) below the gap GP, the reflected light may penetrate the gap GP and emit from the display panel 10 to cause light leakage, thereby causing poor contrast.

然而,在本實施例中,位於間隙GP下方的金屬層(如數據線DL1)的部分或全部包括黑化層124,以此可減少入射到顯示面板10內的環境光IL經金屬層反射後造成漏光,進而提高對比。此外,也可省去在基板200上設置遮蔽層(如黑色矩陣)。因此,本案的基板200上並未設置遮蔽層,進而節省成本。 However, in this embodiment, part or all of the metal layer (such as the data line DL1) below the gap GP includes a black layer 124, which can reduce the light leakage caused by the ambient light IL incident on the display panel 10 after being reflected by the metal layer, thereby improving the contrast. In addition, it is also possible to omit the shielding layer (such as a black matrix) on the substrate 200. Therefore, the shielding layer is not provided on the substrate 200 of this case, thereby saving costs.

此外,在本實施例的金屬層108中,除了在間隙GP下方的部分(如數據線DL1、數據線DL2和/或數據線DL3)外,其餘部分可不包括黑化層,但不以此為限。另外,本實施例的金屬層102可不包括黑化層,但不以此為限。 In addition, in the metal layer 108 of the present embodiment, except for the portion below the gap GP (such as the data line DL1, the data line DL2 and/or the data line DL3), the remaining portion may not include a blackening layer, but the present invention is not limited thereto. In addition, the metal layer 102 of the present embodiment may not include a blackening layer, but the present invention is not limited thereto.

如圖4,在本實施例中,黑化層124可包括一單層結構,且所述單層結構包括一黑化金屬。黑化金屬可包括黑化鉬,但不以此為限。 As shown in FIG. 4 , in this embodiment, the blackening layer 124 may include a single-layer structure, and the single-layer structure includes a blackening metal. The blackening metal may include blackening molybdenum, but is not limited thereto.

此外,如圖2,透明電極可包括寬度不同的設計。透明電極TE1包括一第一部分1180以及一第二部分1182。像素電極PE1可和一部分的第一部分1180在方向Z上重疊,且第一部分1180在方向X上包括一第一寬度W1。第二部分1182在方向Y上設置在第一部分1180的一側,如圖2,第二部分1182可在方向Y上設置在第一部分1180的上方,但不以此為限。第二部分1182在方向X上包括一第二寬度W2,且第二寬度W2大於第一寬度W1。 In addition, as shown in FIG. 2 , the transparent electrode may include designs with different widths. The transparent electrode TE1 includes a first portion 1180 and a second portion 1182. The pixel electrode PE1 may overlap with a portion of the first portion 1180 in the direction Z, and the first portion 1180 includes a first width W1 in the direction X. The second portion 1182 is disposed on one side of the first portion 1180 in the direction Y. As shown in FIG. 2 , the second portion 1182 may be disposed above the first portion 1180 in the direction Y, but is not limited thereto. The second portion 1182 includes a second width W2 in the direction X, and the second width W2 is greater than the first width W1.

透明電極TE2包括一第三部分1200以及一第四部分1202。如圖2,像素電極PE2可和一部分的第三部分1200在方向Z上重疊。第四部分1202在方向Y上設置在第三部分1200的一側,如圖2,第四部分1202可在方向Y上設置在第三部分1200的下方,但不以此為限。第四部分1202在方向X上的寬度大於第三部分1200在方向X上的寬度。 The transparent electrode TE2 includes a third portion 1200 and a fourth portion 1202. As shown in FIG2 , the pixel electrode PE2 can overlap with a portion of the third portion 1200 in the direction Z. The fourth portion 1202 is disposed on one side of the third portion 1200 in the direction Y. As shown in FIG2 , the fourth portion 1202 can be disposed below the third portion 1200 in the direction Y, but is not limited thereto. The width of the fourth portion 1202 in the direction X is greater than the width of the third portion 1200 in the direction X.

在現有的顯示面板的設計中,透明電極並不具有內縮的部分,即透明電極的邊緣在方向Z上和反射電極的邊緣對齊或重疊。然而,在本發明的一些 實施例中,透明電極TE1包括內縮的第一部分1180且透明電極TE2包括內縮的第三部分1200,以增加透明電極TE1和透明電極TE2之間的間距的距離,並使得透明電極TE1的一邊緣1260遠離反射電極RE1的邊緣1220而不彼此重疊,也使得透明電極TE2的一邊緣1261遠離反射電極RE2的邊緣1221而不彼此重疊。 In the existing display panel design, the transparent electrode does not have a retracted portion, that is, the edge of the transparent electrode is aligned with or overlaps the edge of the reflective electrode in the direction Z. However, in some embodiments of the present invention, the transparent electrode TE1 includes a retracted first portion 1180 and the transparent electrode TE2 includes a retracted third portion 1200 to increase the distance between the transparent electrode TE1 and the transparent electrode TE2, and make an edge 1260 of the transparent electrode TE1 away from the edge 1220 of the reflective electrode RE1 without overlapping each other, and also make an edge 1261 of the transparent electrode TE2 away from the edge 1221 of the reflective electrode RE2 without overlapping each other.

此外,如圖3,顯示面板10包括一公共電極202設置在基板200上,且公共電極202設置在液晶層300和基板200之間。在本實施例中,公共電極202可全面形成在基板200上且未被圖案化,但不以此為限。在一些實施例中,公共電極202可被圖案化。 In addition, as shown in FIG. 3 , the display panel 10 includes a common electrode 202 disposed on the substrate 200, and the common electrode 202 is disposed between the liquid crystal layer 300 and the substrate 200. In this embodiment, the common electrode 202 may be formed entirely on the substrate 200 and not patterned, but is not limited thereto. In some embodiments, the common electrode 202 may be patterned.

本發明的顯示面板並不以上述實施例為限。下文將繼續揭示本發明的其它實施例,然而為了簡化說明並突顯各實施例或變化形之間的差異,下文中使用相同標號標注相同元件,並不再對重複部分作贅述。 The display panel of the present invention is not limited to the above-mentioned embodiments. Other embodiments of the present invention will be further disclosed below. However, in order to simplify the description and highlight the differences between the embodiments or variations, the same reference numerals are used below to mark the same components, and the repeated parts will not be elaborated.

請參考圖5,其為本發明第一實施例的第一變化實施例的黑化層的剖視示意圖。與第一實施例不同的地方在於,此變化實施例中的黑化層124包括一疊層結構。如圖5,疊層結構可包括一子層1280和一子層1282,但子層的數量不以此為限。子層1280設置在子層1282上,由於黑化層124可設置在基板100上,因此子層1282可較靠近基板100而子層1280可較遠離基板100,且子層1282可設置在子層1280和基板100之間。在疊層結構中,最遠離基板100的子層(即子層1280)包括黑化金屬(如黑化鉬),但不以此為限。子層1282可包括未黑化金屬,例如鋁,但不以此為限。本變化實施例中的黑化層124的疊層結構可應用在本發明的其他實施例中。 Please refer to FIG. 5 , which is a cross-sectional schematic diagram of the blackening layer of the first variant embodiment of the first embodiment of the present invention. The difference from the first embodiment is that the blackening layer 124 in this variant embodiment includes a stacked structure. As shown in FIG. 5 , the stacked structure may include a sublayer 1280 and a sublayer 1282, but the number of sublayers is not limited thereto. Sublayer 1280 is disposed on sublayer 1282. Since blackening layer 124 can be disposed on substrate 100, sublayer 1282 can be closer to substrate 100 and sublayer 1280 can be farther from substrate 100, and sublayer 1282 can be disposed between sublayer 1280 and substrate 100. In the stacked structure, the sublayer farthest from the substrate 100 (i.e., sublayer 1280) includes blackened metal (such as blackened molybdenum), but is not limited thereto. Sublayer 1282 may include non-blackened metal, such as aluminum, but is not limited thereto. The stacked structure of the blackened layer 124 in this variant embodiment may be applied to other embodiments of the present invention.

請參考圖6,其為本發明第一實施例的第二變化實施例的黑化層的剖視示意圖。與第一變化實施例不同的地方在於,此變化實施例中的疊層結構可包括一子層1280、一子層1282和一子層1284,但子層的數量不以此為限。 Please refer to FIG. 6, which is a cross-sectional schematic diagram of the blackening layer of the second variant embodiment of the first embodiment of the present invention. The difference from the first variant embodiment is that the stacked structure in this variant embodiment may include a sublayer 1280, a sublayer 1282 and a sublayer 1284, but the number of sublayers is not limited thereto.

由於黑化層124可設置在基板100上,因此子層1284可較靠近基板 100,子層1280可較遠離基板100,子層1284可設置在子層1280和基板100之間,而子層1282可設置在子層1280和子層1284之間。 Since the black layer 124 can be disposed on the substrate 100, the sub-layer 1284 can be closer to the substrate 100, the sub-layer 1280 can be farther from the substrate 100, the sub-layer 1284 can be disposed between the sub-layer 1280 and the substrate 100, and the sub-layer 1282 can be disposed between the sub-layer 1280 and the sub-layer 1284.

在疊層結構中,最遠離基板100的子層(即子層1280)包括黑化金屬(如黑化鉬),但不以此為限。子層1282和子層1284可包括未黑化金屬。子層1282可包括鋁,子層1284可包括鉬,但不以此為限。本變化實施例中的黑化層124的疊層結構可應用在本發明的其他實施例中。 In the stacked structure, the sublayer farthest from the substrate 100 (i.e., sublayer 1280) includes blackened metal (such as blackened molybdenum), but is not limited thereto. Sublayer 1282 and sublayer 1284 may include non-blackened metal. Sublayer 1282 may include aluminum, and sublayer 1284 may include molybdenum, but is not limited thereto. The stacked structure of the blackened layer 124 in this variant embodiment may be applied to other embodiments of the present invention.

請參考圖7,其為本發明第二實施例的顯示面板的剖視示意圖。與第一實施例不同的地方在於,本實施例中的金屬層102和金屬層108皆包括黑化層124,但不以此為限。更詳細的,整個金屬層102和整個金屬層108皆包括黑化層124,因此,金屬層102中的所有器件和金屬層108中的所有器件可皆由黑化層124形成。 Please refer to FIG. 7, which is a cross-sectional schematic diagram of a display panel of the second embodiment of the present invention. The difference from the first embodiment is that the metal layer 102 and the metal layer 108 in this embodiment both include a blackening layer 124, but not limited thereto. More specifically, the entire metal layer 102 and the entire metal layer 108 both include a blackening layer 124, so all devices in the metal layer 102 and all devices in the metal layer 108 can be formed by the blackening layer 124.

在一些實施例中,整個金屬層108可皆包括黑化層124,而金屬層102可未包括黑化層124,但不以此為限。在一些實施例中,整個或部分金屬層108可包括圖5或圖6中的黑化層124的疊層結構,但不以此為限。在一些實施例中,整個或部分金屬層102可包括圖5或圖6中的黑化層124的疊層結構,但不以此為限。 In some embodiments, the entire metal layer 108 may include the blackening layer 124, and the metal layer 102 may not include the blackening layer 124, but the present invention is not limited thereto. In some embodiments, the entire or a portion of the metal layer 108 may include the stacked structure of the blackening layer 124 in FIG. 5 or FIG. 6, but the present invention is not limited thereto. In some embodiments, the entire or a portion of the metal layer 102 may include the stacked structure of the blackening layer 124 in FIG. 5 or FIG. 6, but the present invention is not limited thereto.

綜上所述,在本發明的顯示面板中,位於間隙下方的金屬層的部分或全部包括黑化層,以此可減少入射到顯示面板內的環境光經金屬層反射後造成漏光,進而提高對比。透明電極包括內縮的部分,使透明電極的邊緣遠離反射電極的邊緣而不再彼此重疊。即使反射電極的製作偏差較大,亦可減少反射電極的金屬材料殘留的現象,也減少了因殘留的金屬離子遷移而造成短路。 In summary, in the display panel of the present invention, part or all of the metal layer below the gap includes a blackened layer, so that the ambient light incident into the display panel and reflected by the metal layer can be reduced to cause light leakage, thereby improving the contrast. The transparent electrode includes a retracted portion, so that the edge of the transparent electrode is far away from the edge of the reflective electrode and no longer overlaps with each other. Even if the manufacturing deviation of the reflective electrode is large, the phenomenon of residual metal material of the reflective electrode can be reduced, and the short circuit caused by the migration of residual metal ions is also reduced.

以上所述僅為本發明的優選實施例而已,並不用於限制本發明,對於本領域的技術人員來說,本發明可以有各種更改和變化。凡在本發明的精神和原則之內,所作的任何修改、等同替換、改進等,均應包含在本發明的保護範圍之 內。 The above is only a preferred embodiment of the present invention and is not intended to limit the present invention. For technicians in this field, the present invention may have various changes and modifications. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

100,200:基板 100,200: Substrate

100s:上表面 100s: upper surface

102,108,116:金屬層 102,108,116:Metal layer

104,110,112:絕緣層 104,110,112: Insulation layer

114:透明導電層 114: Transparent conductive layer

1220,1221:邊緣 1220,1221:Edge

124:黑化層 124: Black layer

202,CE1:公共電極 202,CE1: Common electrode

300:液晶層 300: Liquid crystal layer

CH:半導體層 CH: semiconductor layer

D:汲極 D: Drain

DL1:數據線 DL1: Data line

G:閘極 G: Gate

GL1:掃描線 GL1: Scan line

GP:間隙 GP: Gap

IL:環境光 IL: Ambient Light

PE1:像素電極 PE1: Pixel electrode

RE1,RE2:反射電極 RE1,RE2: Reflection electrode

S:源極 S: Source

SW1:開關元件 SW1: switch element

TE1:透明電極 TE1: Transparent electrode

V1,V2:接觸洞 V1, V2: contact holes

X,Y,Z:方向 X,Y,Z: Direction

Claims (10)

一種顯示面板,包括:一顯示區和一非顯示區,所述非顯示區設置在所述顯示區的至少一側;一第一基板;一第一子像素設置在所述第一基板上和所述顯示區內,且所述第一子像素包括一第一開關元件;一第一金屬層設置在所述第一基板上,所述第一金屬層包括多條第一信號線設置在所述顯示區內,所述多條第一信號線包括一第一掃描線電連接所述第一開關元件,且所述第一掃描線沿著一第一方向延伸;一第二金屬層設置在所述第一金屬層上,所述第二金屬層包括:所述第一子像素的一第一像素電極,且所述第一像素電極電連接所述第一開關元件;以及多條第二信號線設置在所述顯示區內,所述多條第二信號線包括一數據線電連接所述第一開關元件,所述數據線沿著一第二方向延伸,所述第一方向和所述第二方向不同,且所述數據線的一部分包括一黑化層;一透明導電層設置在所述第二金屬層上,所述第二金屬層設置在所述透明導電層和所述第一金屬層之間,所述透明導電層包括所述第一子像素的一第一透明電極,且所述第一透明電極設置在所述第一像素電極上並電連接所述第一像素電極;一第三金屬層設置在所述透明導電層上,所述透明導電層設置在所述第三金屬層和所述第二金屬層之間,所述第三金屬層包括所述第一子像素的一第一反射電極,且所述第一反射電極設置在所述第一透明電極上並電連接所述第一 透明電極;以及一第二子像素,設置在所述第一基板上,所述第一子像素和所述第二子像素在所述第一方向上相鄰設置;其中所述第一子像素和所述第二子像素之間具有一間隙,且所述間隙和所述數據線的所述部分的所述黑化層在一垂直投影方向上部分重疊,其中所述垂直投影方向和所述第一基板的一上表面垂直。 A display panel comprises: a display area and a non-display area, wherein the non-display area is arranged on at least one side of the display area; a first substrate; a first sub-pixel is arranged on the first substrate and in the display area, and the first sub-pixel includes a first switch element; a first metal layer is arranged on the first substrate, the first metal layer includes a plurality of first signal lines arranged in the display area, the plurality of first signal lines include a first scanning line electrically connected to the first switch element, and the first scanning line is arranged along The display area includes a first sub-pixel and a second metal layer, the second metal layer including: a first pixel electrode of the first sub-pixel, the first pixel electrode being electrically connected to the first switch element; and a plurality of second signal lines arranged in the display area, the plurality of second signal lines including a data line being electrically connected to the first switch element, the data line extending along a second direction, the first direction and the second direction being different, and a portion of the data line including a black layer; a transparent conductive layer; a transparent conductive layer disposed on the second metal layer, the second metal layer disposed between the transparent conductive layer and the first metal layer, the transparent conductive layer including a first transparent electrode of the first sub-pixel, and the first transparent electrode disposed on the first pixel electrode and electrically connected to the first pixel electrode; a third metal layer disposed on the transparent conductive layer, the transparent conductive layer disposed between the third metal layer and the second metal layer, the third metal layer including a first reflective electrode of the first sub-pixel , and the first reflective electrode is disposed on the first transparent electrode and electrically connected to the first transparent electrode; and a second sub-pixel is disposed on the first substrate, the first sub-pixel and the second sub-pixel are disposed adjacent to each other in the first direction; wherein there is a gap between the first sub-pixel and the second sub-pixel, and the gap and the blackened layer of the portion of the data line partially overlap in a vertical projection direction, wherein the vertical projection direction is perpendicular to an upper surface of the first substrate. 如請求項1所述的顯示面板,其中所述第二子像素包括:一第二開關元件,設置在所述第一基板上;一第二像素電極電連接所述第二開關元件,且所述第二金屬層包括所述第二像素電極;一第二透明電極設置在所述第二像素電極上並電連接所述第二像素電極,且所述透明導電層包括所述第二透明電極;以及一第二反射電極設置在所述第二透明電極上並電連接所述第二透明電極,所述第三金屬層包括所述第二反射電極,所述第一反射電極和所述第二反射電極之間具有所述間隙。 The display panel as described in claim 1, wherein the second sub-pixel includes: a second switch element disposed on the first substrate; a second pixel electrode electrically connected to the second switch element, and the second metal layer includes the second pixel electrode; a second transparent electrode disposed on the second pixel electrode and electrically connected to the second pixel electrode, and the transparent conductive layer includes the second transparent electrode; and a second reflective electrode disposed on the second transparent electrode and electrically connected to the second transparent electrode, the third metal layer includes the second reflective electrode, and the first reflective electrode and the second reflective electrode have the gap between them. 如請求項2所述的顯示面板,其中所述第一金屬層包括所述第一子像素的一第一公共電極、所述第二子像素的一第二公共電極和一共通信號線,且所述第一金屬層的所述多條第一信號線包括一第二掃描線,其中,所述第二掃描線沿著所述第一方向延伸並電連接所述第二開關元件,且所述第二開關元件電連接所述數據線,其中,所述第一公共電極設置在所述第一像素電極和所述第一基板之間,所述第二公共電極設置在所述第二像素電極和所述第一基板之間,且所述共通 信號線沿著所述第一方向延伸並電連接所述第一公共電極和所述第二公共電極。 A display panel as described in claim 2, wherein the first metal layer includes a first common electrode of the first sub-pixel, a second common electrode of the second sub-pixel and a common signal line, and the plurality of first signal lines of the first metal layer include a second scan line, wherein the second scan line extends along the first direction and is electrically connected to the second switch element, and the second switch element is electrically connected to the data line, wherein the first common electrode is disposed between the first pixel electrode and the first substrate, the second common electrode is disposed between the second pixel electrode and the first substrate, and the common signal line extends along the first direction and is electrically connected to the first common electrode and the second common electrode. 如請求項1所述的顯示面板,其中全部的所述第二金屬層皆包括所述黑化層。 A display panel as described in claim 1, wherein all of the second metal layers include the blackening layer. 如請求項4所述的顯示面板,其中全部的所述第一金屬層皆包括所述黑化層。 A display panel as described in claim 4, wherein all of the first metal layers include the blackening layer. 如請求項1所述的顯示面板,其中所述黑化層包括一疊層結構,且所述疊層結構中最遠離所述第一基板的一第一子層包括一黑化金屬。 A display panel as described in claim 1, wherein the blackening layer includes a stacked structure, and a first sublayer in the stacked structure that is farthest from the first substrate includes a blackening metal. 如請求項6所述的顯示面板,其中所述疊層結構包括一第二子層設置在所述第一子層和所述第一基板之間,且所述第二子層包括一未黑化金屬。 A display panel as described in claim 6, wherein the stacked structure includes a second sublayer disposed between the first sublayer and the first substrate, and the second sublayer includes an unblackened metal. 如請求項6所述的顯示面板,其中所述疊層結構包括一第二子層和一第三子層,所述第二子層設置在所述第一子層和所述第一基板之間,所述第三子層設置在所述第一子層和所述第二子層之間,且所述第二子層和所述第三子層包括一未黑化金屬。 A display panel as described in claim 6, wherein the stacked structure includes a second sublayer and a third sublayer, the second sublayer is disposed between the first sublayer and the first substrate, the third sublayer is disposed between the first sublayer and the second sublayer, and the second sublayer and the third sublayer include an unblackened metal. 如請求項1所述的顯示面板,其中所述黑化層包括一單層結構,且所述單層結構包括一黑化金屬。 A display panel as described in claim 1, wherein the blackening layer comprises a single-layer structure, and the single-layer structure comprises a blackening metal. 如請求項1所述的顯示面板,還包括:一第二基板,在所述垂直投影方向上相對所述第一基板設置,且所述第二基板上並未設置一遮蔽層;以及一液晶層,設置在所述第一基板和所述第二基板之間。 The display panel as described in claim 1 further comprises: a second substrate disposed opposite to the first substrate in the vertical projection direction, and a shielding layer is not disposed on the second substrate; and a liquid crystal layer disposed between the first substrate and the second substrate.
TW112114726A 2022-07-25 2023-04-20 Display panel TWI843535B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2022108791551 2022-07-25
CN202210879155.1A CN117492287A (en) 2022-07-25 2022-07-25 Display panel

Publications (2)

Publication Number Publication Date
TW202405529A TW202405529A (en) 2024-02-01
TWI843535B true TWI843535B (en) 2024-05-21

Family

ID=89680540

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112114726A TWI843535B (en) 2022-07-25 2023-04-20 Display panel

Country Status (2)

Country Link
CN (1) CN117492287A (en)
TW (1) TWI843535B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080049176A1 (en) * 2006-08-25 2008-02-28 Samsung Electronics Co., Ltd. Thin film transistor-array substrate, transflective liquid crystal display device with the same, and method for manufacturing the same
CN105589249A (en) * 2014-11-10 2016-05-18 株式会社日本显示器 Reflective type display device
CN113805371A (en) * 2020-06-15 2021-12-17 瀚宇彩晶股份有限公司 Display panel
CN114114741A (en) * 2020-08-27 2022-03-01 南京瀚宇彩欣科技有限责任公司 Display device
TW202223515A (en) * 2020-11-30 2022-06-16 友達光電股份有限公司 Pixel structure

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080049176A1 (en) * 2006-08-25 2008-02-28 Samsung Electronics Co., Ltd. Thin film transistor-array substrate, transflective liquid crystal display device with the same, and method for manufacturing the same
CN105589249A (en) * 2014-11-10 2016-05-18 株式会社日本显示器 Reflective type display device
CN113805371A (en) * 2020-06-15 2021-12-17 瀚宇彩晶股份有限公司 Display panel
CN114114741A (en) * 2020-08-27 2022-03-01 南京瀚宇彩欣科技有限责任公司 Display device
TW202223515A (en) * 2020-11-30 2022-06-16 友達光電股份有限公司 Pixel structure

Also Published As

Publication number Publication date
TW202405529A (en) 2024-02-01
CN117492287A (en) 2024-02-02

Similar Documents

Publication Publication Date Title
CN106802519B (en) Liquid crystal display device and method of manufacturing the same
WO2019227806A1 (en) Tft array substrate and liquid crystal display panel
TWI540371B (en) Display panel and display device
US10872984B2 (en) Thin film transistor having channel regions, array substrate, manufacturing method thereof and display device comprising the same
US20140131715A1 (en) Array substrate, method for fabricating the same, and display device
CN102289118B (en) Liquid crystal display element
TWI519879B (en) Display panel and display device including the same
US9588389B2 (en) Array substrate and method for manufacturing the same, and display device
CN106876386A (en) Thin film transistor (TFT) and preparation method thereof, array base palte, display panel
TWI651574B (en) Display panel and method of manufacturing same
US9470916B2 (en) Array substrate, method of manufacturing array substrate, and liquid crystal display
CN116224666B (en) Array substrate, preparation method thereof, display panel and display device
WO2018192217A1 (en) Thin-film transistor and preparation method therefor, array substrate and preparation method therefor, and display panel
JP2024528526A (en) Display substrate and its manufacturing method, display device
CN105070726B (en) Thin film transistor and pixel structure
WO2023272503A1 (en) Thin film transistor, preparation method therefor, display substrate, and display apparatus
US12419109B2 (en) Array substrate and manufacturing method thereof, and display panel
CN109541862A (en) Active switch and manufacturing method thereof, array substrate and display device
US11099442B2 (en) Display device
TWI843535B (en) Display panel
KR20150062741A (en) Array substrate for fringe field switching mode liquid crystal display device and Method of fabricating the same
CN116449612B (en) Display Panel
KR102544031B1 (en) Array substrate for display device and method of manufacturing the same
CN116560126B (en) Display panel
CN105093755A (en) Thin film transistor array substrate and liquid crystal display panel