[go: up one dir, main page]

TWI842205B - Optical element - Google Patents

Optical element Download PDF

Info

Publication number
TWI842205B
TWI842205B TW111143816A TW111143816A TWI842205B TW I842205 B TWI842205 B TW I842205B TW 111143816 A TW111143816 A TW 111143816A TW 111143816 A TW111143816 A TW 111143816A TW I842205 B TWI842205 B TW I842205B
Authority
TW
Taiwan
Prior art keywords
optical element
inclined surface
micro
optical
substrate
Prior art date
Application number
TW111143816A
Other languages
Chinese (zh)
Other versions
TW202321748A (en
Inventor
古凱寧
吳明憲
Original Assignee
財團法人工業技術研究院
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 財團法人工業技術研究院 filed Critical 財團法人工業技術研究院
Priority to US18/070,413 priority Critical patent/US12405426B2/en
Publication of TW202321748A publication Critical patent/TW202321748A/en
Application granted granted Critical
Publication of TWI842205B publication Critical patent/TWI842205B/en

Links

Images

Landscapes

  • Optical Couplings Of Light Guides (AREA)

Abstract

An optical element including a substrate, a first insulating layer, a first optical waveguide layer, a first edge coupler and a first micro-optical element is provided. The first insulating layer is disposed on the substrate. The first optical waveguide layer is disposed on the first insulating layer, and configured to transmit a light beam. The first edge coupler is disposed on the first insulating layer, and coupled to an end of the first optical waveguide layer. The first micro-optical element is disposed on the substrate, and includes a first inclined surface. There is a first groove between the substrate, the first insulating layer, the first optical waveguide layer and the first edge coupler. The first micro-optical element is located within the first groove. The light beam is sequentially transmitted from the first optical waveguide to the first edge coupler, emitted from the first edge coupler, and reflected by the first inclined surface to an optical fiber connector.

Description

光學元件 Optical components

本發明是有關於一種光學元件。 The present invention relates to an optical element.

資料中心對於設備頻寬及速度的需求與日俱增。近年光學共封裝(co-packaged optics,CPO)架構興起,當網路交換器(switch)的頻寬進入51.2T世代,光纖封裝密度將遇到瓶頸。因此,光晶片(photonic chip)必須引入波長分波多工(Wavelength Division Multiplexing,WDM)元件,以緩解光纖密度議題。 Data centers have an increasing demand for equipment bandwidth and speed. In recent years, the co-packaged optics (CPO) architecture has emerged. When the bandwidth of network switches enters the 51.2T generation, the fiber packaging density will encounter a bottleneck. Therefore, photonic chips must introduce wavelength division multiplexing (WDM) components to alleviate the fiber density issue.

光晶片的輸入/輸出耦合器(I/O coupler)過往泛為使用光柵耦合器,但因其光頻寬窄,不適合與波長分波多工元件串接使用。反之,邊緣耦合器的光頻寬大,適合串接波長分波多工元件,但其最大的問題點在於量測效率非常低,難以導入量產。 In the past, grating couplers were widely used in the I/O couplers of optical chips, but due to their narrow optical bandwidth, they are not suitable for serial connection with wavelength division multiplexing components. On the contrary, edge couplers have a wide optical bandwidth and are suitable for serial connection with wavelength division multiplexing components, but their biggest problem is that their measurement efficiency is very low, making them difficult to introduce into mass production.

本發明提供一種光學元件,其能簡單進行量測,因此適於量產。 The present invention provides an optical element that can be easily measured and is therefore suitable for mass production.

本發明的一實施例提供一種光學元件,其包括基底、第 一絕緣層、第一光波導層、第一邊緣耦合器以及第一微光學元件。第一絕緣層設置於基底上。第一光波導層設置在第一絕緣層上,且用以傳遞光束。第一邊緣耦合器設置在第一絕緣層上,且與第一光波導層的一端耦接。第一微光學元件設置在基底上,且包括第一斜面。基底、第一絕緣層、第一光波導層及第一邊緣耦合器之間具有第一凹槽。第一微光學元件位於第一凹槽內。光束依序從第一光波導層傳遞至第一邊緣耦合器,從第一邊緣耦合器出射,再被第一斜面反射至光纖連接器。 An embodiment of the present invention provides an optical element, which includes a substrate, a first insulating layer, a first optical waveguide layer, a first edge coupler and a first micro-optical element. The first insulating layer is disposed on the substrate. The first optical waveguide layer is disposed on the first insulating layer and is used to transmit a light beam. The first edge coupler is disposed on the first insulating layer and is coupled to one end of the first optical waveguide layer. The first micro-optical element is disposed on the substrate and includes a first inclined surface. A first groove is provided between the substrate, the first insulating layer, the first optical waveguide layer and the first edge coupler. The first micro-optical element is located in the first groove. The light beam is sequentially transmitted from the first optical waveguide layer to the first edge coupler, emitted from the first edge coupler, and then reflected by the first inclined surface to the optical fiber connector.

基於上述,在本發明的一實施例中,由於光學元件採用第一邊緣耦合器,因此適於串接波長分波多工元件。而且,光學元件設有第一微光學元件,並利用第一微光學元件將光束耦合至光纖連接器,因此,本發明實施例的光學元件有效解決晶圓級量測效率過低的問題,並有助於整體系統的量產。 Based on the above, in one embodiment of the present invention, since the optical element adopts the first edge coupler, it is suitable for serial connection with the wavelength division multiplexing element. Moreover, the optical element is provided with a first micro-optical element, and the light beam is coupled to the optical fiber connector by using the first micro-optical element. Therefore, the optical element of the embodiment of the present invention effectively solves the problem of low wafer-level measurement efficiency and contributes to the mass production of the overall system.

10、10A、10B、10C、10D、10E、10F:光學元件 10, 10A, 10B, 10C, 10D, 10E, 10F: Optical components

100:基底 100: Base

200:第一絕緣層 200: First insulation layer

200’:第二絕緣層 200’: Second insulating layer

300:第一光波導層 300: First optical waveguide layer

400:第一邊緣耦合器 400: First edge coupler

400’:第二邊緣耦合器 400’: Second edge coupler

500、500A、500D、500E:第一微光學元件 500, 500A, 500D, 500E: The first micro-optical component

500’:第二微光學元件 500’: Second micro-optical element

500S1:第一斜面 500S1: First slope

500S1’:第三斜面 500S1’: The third slope

500S2:底面 500S2: Bottom

500S3:第二斜面 500S3: Second slope

500S4:垂直面 500S4: vertical surface

520:金屬層 520:Metal layer

600:懸臂結構 600: Cantilever structure

700:透鏡 700: Lens

A:空氣間隙 A: Air gap

d、S:距離 d, S: distance

D:直徑 D: Diameter

t:厚度 t: thickness

F:光纖連接器 F: Fiber optic connector

G:第一凹槽 G: First groove

G’:第二凹槽 G’: Second groove

H:高度 H: Height

L:長度 L: Length

L1:光束 L1: beam

P1:底部位置 P1: bottom position

P2:底部 P2: Bottom

W2:寬度 W2: Width

θ:夾角 θ: angle of intersection

圖1是根據本發明的第一實施例的光學元件的示意圖。 Figure 1 is a schematic diagram of an optical element according to the first embodiment of the present invention.

圖2是圖1中在第一微光學元件處的放大示意圖。 Figure 2 is an enlarged schematic diagram of the first micro-optical element in Figure 1.

圖3是根據本發明的第二實施例的光學元件的示意圖。 Figure 3 is a schematic diagram of an optical element according to the second embodiment of the present invention.

圖4是根據本發明的第三實施例的光學元件的示意圖。 Figure 4 is a schematic diagram of an optical element according to the third embodiment of the present invention.

圖5A是根據本發明的第四實施例的光學元件的示意圖。 FIG5A is a schematic diagram of an optical element according to the fourth embodiment of the present invention.

圖5B是圖5A中在透鏡處的放大示意圖。 Figure 5B is an enlarged schematic diagram of Figure 5A at the lens.

圖6是根據本發明的第五實施例的光學元件的示意圖。 Figure 6 is a schematic diagram of an optical element according to the fifth embodiment of the present invention.

圖7是根據本發明的第六實施例的光學元件的示意圖。 FIG7 is a schematic diagram of an optical element according to the sixth embodiment of the present invention.

圖8是根據本發明的第七實施例的光學元件的示意圖。 FIG8 is a schematic diagram of an optical element according to the seventh embodiment of the present invention.

圖1是根據本發明的第一實施例的光學元件的示意圖。請參考圖1,本發明的一實施例提供一種光學元件10,其包括基底100、第一絕緣層200、第一光波導層300、第一邊緣耦合器400以及第一微光學元件500。第一絕緣層200設置於基底100上。第一光波導層300設置在第一絕緣層200上,且用以傳遞光束L1。第一邊緣耦合器400設置在第一絕緣層200上,且與第一光波導層300的一端耦接。第一微光學元件500設置在基底100上,且包括第一斜面500S1。基底100、第一絕緣層200、第一光波導層300及第一邊緣耦合器400之間具有第一凹槽G。第一微光學元件500位於第一凹槽G內。光束L1依序從第一光波導層300傳遞至第一邊緣耦合器400,從第一邊緣耦合器400出射,再被第一斜面500S1反射至光纖連接器F。在一實施例中,光束L1也可依序從光纖連接器F傳遞至第一斜面500S1,被第一斜面500S1反射至第一邊緣耦合器400,並從第一邊緣耦合器400傳遞至第一光波導層300。 FIG1 is a schematic diagram of an optical element according to a first embodiment of the present invention. Referring to FIG1 , an embodiment of the present invention provides an optical element 10, which includes a substrate 100, a first insulating layer 200, a first optical waveguide layer 300, a first edge coupler 400, and a first micro-optical element 500. The first insulating layer 200 is disposed on the substrate 100. The first optical waveguide layer 300 is disposed on the first insulating layer 200 and is used to transmit the light beam L1. The first edge coupler 400 is disposed on the first insulating layer 200 and is coupled to one end of the first optical waveguide layer 300. The first micro-optical element 500 is disposed on the substrate 100 and includes a first inclined surface 500S1. A first groove G is provided between the substrate 100, the first insulating layer 200, the first optical waveguide layer 300 and the first edge coupler 400. The first micro-optical element 500 is located in the first groove G. The light beam L1 is sequentially transmitted from the first optical waveguide layer 300 to the first edge coupler 400, emitted from the first edge coupler 400, and then reflected by the first inclined surface 500S1 to the optical fiber connector F. In one embodiment, the light beam L1 can also be sequentially transmitted from the optical fiber connector F to the first inclined surface 500S1, reflected by the first inclined surface 500S1 to the first edge coupler 400, and transmitted from the first edge coupler 400 to the first optical waveguide layer 300.

詳細來說,上述的第一凹槽G例如是對第一邊緣耦合器400、第一光波導層300及第一絕緣層200的邊緣進行深蝕刻後所 形成。而第一微光學元件500例如對半導體材料(如矽(Si)、一氮化矽(SiN)、氮氧化矽(SiON)等材質)或金屬以濕蝕刻方式製作出具有第一斜面500S1的微光學元件後,再利用覆晶接合器(flip chip bonder)等方式高精度封裝於第一凹槽G內。或者是,第一微光學元件500的材質例如聚合物(Polymer),並以3D列印技術形成具有第一斜面500S1的微光學元件。接著再利用取放等方式高精度封裝於第一凹槽G內。在另一實施例中,第一微光學元件500也可是矽、一氮化矽、氮氧化矽、聚合物、金屬等材料的混合結構,且折射率較佳是落在1.45至3.5的範圍內,但本發明不以此為限。 Specifically, the first groove G is formed by, for example, deep etching the edges of the first edge coupler 400, the first optical waveguide layer 300, and the first insulating layer 200. The first micro-optical element 500 is formed by, for example, wet etching a semiconductor material (such as silicon (Si), silicon nitride (SiN), silicon oxynitride (SiON), etc.) or metal to form a micro-optical element with a first inclined surface 500S1, and then using a flip chip bonder or other methods to package it in the first groove G with high precision. Alternatively, the material of the first micro-optical element 500 is, for example, polymer, and the micro-optical element with a first inclined surface 500S1 is formed by 3D printing technology. Then, it is packaged in the first groove G with high precision by a pick-and-place method or other methods. In another embodiment, the first micro-optical element 500 may also be a mixed structure of materials such as silicon, silicon nitride, silicon oxynitride, polymer, metal, etc., and the refractive index is preferably within the range of 1.45 to 3.5, but the present invention is not limited thereto.

在本實施例中,第一斜面500S1上鍍有反射的金屬層520,使光束L1可被第一斜面500S1反射。 In this embodiment, a reflective metal layer 520 is plated on the first inclined surface 500S1, so that the light beam L1 can be reflected by the first inclined surface 500S1.

在本實施例中,第一微光學元件500更包括底面500S2。底面500S2與第一斜面500S1連接。第一微光學元件500透過底面500S2與基底100連接。第一斜面500S1與底面500S2之間的夾角θ落在30度至60度的範圍。 In this embodiment, the first micro-optical element 500 further includes a bottom surface 500S2. The bottom surface 500S2 is connected to the first inclined surface 500S1. The first micro-optical element 500 is connected to the substrate 100 through the bottom surface 500S2. The angle θ between the first inclined surface 500S1 and the bottom surface 500S2 falls within the range of 30 degrees to 60 degrees.

在本實施例中,第一微光學元件500與第一邊緣耦合器400之間具有空氣間隙A。由於不希望光束L1在空氣中的傳輸距離太長,因此第一微光學元件500與第一邊緣耦合器400之間的距離d落在0.5微米(μm)至10微米的範圍內。 In this embodiment, there is an air gap A between the first micro-optical element 500 and the first edge coupler 400. Since it is not desirable for the transmission distance of the light beam L1 in the air to be too long, the distance d between the first micro-optical element 500 and the first edge coupler 400 falls within the range of 0.5 micrometers (μm) to 10 μm.

圖2是圖1中在第一微光學元件處的放大示意圖。請同時參考圖1與圖2,在本實施例中,第一微光學元件500在垂直於 光束L1於第一光波導層300的傳遞方向且垂直於基底100往第一光波導層300的方向上的長度L落在10微米至1毫米(mm)的範圍內。第一微光學元件500設置在第一邊緣耦合器400旁,其斜面500S1功能是將光束L1反射,將光束L1轉折向上,朝光纖連接器F傳遞,此第一微光學元件500的幾何結構長度L落在10微米(μm)至1毫米(mm)範圍內。 FIG2 is an enlarged schematic diagram of the first micro-optical element in FIG1. Please refer to FIG1 and FIG2 simultaneously. In this embodiment, the length L of the first micro-optical element 500 perpendicular to the transmission direction of the light beam L1 in the first optical waveguide layer 300 and perpendicular to the direction from the substrate 100 to the first optical waveguide layer 300 falls within the range of 10 micrometers to 1 millimeter (mm). The first micro-optical element 500 is disposed beside the first edge coupler 400. The function of the inclined surface 500S1 is to reflect the light beam L1, turn the light beam L1 upward, and transmit it toward the optical fiber connector F. The geometric structure length L of the first micro-optical element 500 falls within the range of 10 micrometers ( μm ) to 1 millimeter (mm).

在本實施例中,第一微光學元件500在沿光束L1於第一光波導層300的傳遞方向上的寬度W2落在5微米至125微米的範圍內。 In this embodiment, the width W2 of the first micro-optical element 500 along the transmission direction of the light beam L1 in the first optical waveguide layer 300 falls within the range of 5 microns to 125 microns.

在本實施例中,第一微光學元件500在沿基底100往第一光波導層300的方向上的高度H落在1微米至62.5微米的範圍內。 In this embodiment, the height H of the first micro-optical element 500 in the direction from the substrate 100 to the first optical waveguide layer 300 falls within the range of 1 micron to 62.5 microns.

基於上述,在本發明的一實施例中,由於光學元件10採用第一邊緣耦合器400,因此適於串接波長分波多工元件。而且,光學元件10設有第一微光學元件500,並利用第一微光學元件500將光束L1耦合至光纖連接器F。因此,相較於傳統使用邊緣耦合器的光學元件需切割晶圓才能對光晶片進行量測,本發明實施例的光學元件10有效解決晶圓級(Wafer-level)量測效率過低的問題,並有助於整體系統的量產。 Based on the above, in one embodiment of the present invention, since the optical element 10 uses the first edge coupler 400, it is suitable for serial connection with a wavelength division multiplexing element. Moreover, the optical element 10 is provided with a first micro-optical element 500, and the light beam L1 is coupled to the optical fiber connector F by using the first micro-optical element 500. Therefore, compared with the traditional optical element using edge couplers, which requires wafer cutting to measure the optical chip, the optical element 10 of the embodiment of the present invention effectively solves the problem of low wafer-level measurement efficiency and is conducive to the mass production of the overall system.

此外,微光學元件500的製作過程除了可利用蝕刻製程直接在光學元件10形成斜面500S1,本案也採用封裝方式(例如flip-chip bonder)將微光學元件500整合在邊緣耦合器400側邊, 形成45度反射斜面500S1,其具有幾個優點:(1)微光學元件500的幾何結構彈性度大(如圖3、圖4、圖5A、圖5B、圖6、圖7);(2)不需用酸、鹼溶液濕式蝕刻出反射斜面500S1,製程相對簡單;(3)微光學元件500與底面500S2接合溫度低(例如以PDMS bonding 80~100度C),不會影響其他前段製程已做好的元件(註:一般CMOS後段製程的熱預算約在400度C以下)。 In addition, the manufacturing process of the micro-optical element 500 can not only use the etching process to directly form the inclined surface 500S1 on the optical element 10, but also adopt a packaging method (such as flip-chip bonder) to integrate the micro-optical element 500 on the side of the edge coupler 400 to form a 45-degree reflective inclined surface 500S1, which has several advantages: (1) The geometric structure of the micro-optical element 500 is highly flexible (such as Figures 3, 4, 5A, 5B, 6, and 7); (2) It is not necessary to use acid or alkaline solution to wet-etch the reflective inclined surface 500S1, and the process is relatively simple; (3) The bonding temperature between the micro-optical element 500 and the bottom surface 500S2 is low (such as PDMS bonding). 80~100 degrees C), will not affect other components that have been completed in the previous process (Note: The thermal budget of the general CMOS back-end process is about below 400 degrees C).

圖3是根據本發明的第二實施例的光學元件的示意圖。請參考圖3,光學元件10A與圖1的光學元件10大致相同,其主要差異如下。在本實施例中,第一微光學元件500A更包括第二斜面500S3。第二斜面500S3相對於第一斜面500S1,且朝向基底100。其中,第二斜面500S3有助於在第一微光學元件500A的取放過程中對準於第一凹槽G,使第一微光學元件500A自動滑入第一凹槽G。 FIG3 is a schematic diagram of an optical element according to a second embodiment of the present invention. Referring to FIG3 , the optical element 10A is substantially the same as the optical element 10 of FIG1 , and the main differences are as follows. In this embodiment, the first micro-optical element 500A further includes a second inclined surface 500S3. The second inclined surface 500S3 is opposite to the first inclined surface 500S1 and faces the substrate 100. The second inclined surface 500S3 helps to align the first micro-optical element 500A with the first groove G during the placement process of the first micro-optical element 500A, so that the first micro-optical element 500A automatically slides into the first groove G.

在本實施例中,在第一光波導層300往基底100的方向上,第一斜面500S1的底部位置P1低於第一光波導層300的底部P2,其有助於提升光束L1從第一邊緣耦合器400至第一斜面500S1的光耦合效率。 In this embodiment, in the direction from the first optical waveguide layer 300 to the substrate 100, the bottom position P1 of the first inclined surface 500S1 is lower than the bottom P2 of the first optical waveguide layer 300, which helps to improve the optical coupling efficiency of the light beam L1 from the first edge coupler 400 to the first inclined surface 500S1.

此外,在本實施例中,第一斜面500S1上鍍有反射的金屬層520,使光束L1可被第一斜面500S1反射。而光學元件10A的其餘優點相似於光學元件10,在此不再贅述。 In addition, in this embodiment, a reflective metal layer 520 is coated on the first inclined surface 500S1, so that the light beam L1 can be reflected by the first inclined surface 500S1. The remaining advantages of the optical element 10A are similar to those of the optical element 10, which will not be elaborated here.

圖4是根據本發明的第三實施例的光學元件的示意圖。請參考圖4,光學元件10B與圖3的光學元件10A大致相同,其 主要差異如下。在本實施例中,光學元件10B更包括懸臂結構600。懸臂結構600與第一微光學元件500A相連接。在另一實施例中,懸臂結構600可與第一微光學元件500A一體成形。其中,懸臂結構600用以承靠在第一邊緣耦合器400上,使第一斜面500S1的底部位置低於第一光波導層300的底部,進而提升光束L1從第一邊緣耦合器400至第一斜面500S1的光耦合效率。舉例來說,當進行蝕刻製程後使第一凹槽G太深時,第一斜面500S1的設置高度會太低而影響光學元件的光耦合效率。因此,設有懸臂結構600可避免前述第一凹槽G太深的問題。 FIG4 is a schematic diagram of an optical element according to a third embodiment of the present invention. Referring to FIG4 , the optical element 10B is substantially the same as the optical element 10A of FIG3 , and the main differences are as follows. In this embodiment, the optical element 10B further includes a cantilever structure 600. The cantilever structure 600 is connected to the first micro-optical element 500A. In another embodiment, the cantilever structure 600 can be formed integrally with the first micro-optical element 500A. The cantilever structure 600 is used to support the first edge coupler 400, so that the bottom position of the first inclined surface 500S1 is lower than the bottom of the first optical waveguide layer 300, thereby improving the optical coupling efficiency of the light beam L1 from the first edge coupler 400 to the first inclined surface 500S1. For example, when the first groove G is too deep after the etching process, the height of the first slope 500S1 will be too low, which will affect the light coupling efficiency of the optical element. Therefore, the cantilever structure 600 can avoid the problem of the first groove G being too deep.

此外,在本實施例中,第一斜面500S1上鍍有反射的金屬層520,使光束L1可被第一斜面500S1反射。而光學元件10B的其餘優點相似於光學元件10A,在此不再贅述。 In addition, in this embodiment, a reflective metal layer 520 is coated on the first inclined surface 500S1, so that the light beam L1 can be reflected by the first inclined surface 500S1. The remaining advantages of the optical element 10B are similar to those of the optical element 10A, which will not be elaborated here.

圖5A是根據本發明的第四實施例的光學元件的示意圖。圖5B是圖5A中在透鏡處的放大示意圖。請參考圖5A與圖5B,光學元件10C與圖4的光學元件10B大致相同,其主要差異如下。在本實施例中,光學元件10C更包括透鏡700。透鏡700配置於第一斜面500S1上,設置於光束L1的傳遞路徑上,且用於準直光束L1。在另一實施例中,透鏡700可與懸臂結構600一體成形,或透鏡700可與懸臂結構600及第一微光學元件500A一體成形。其中,光束L1從第一邊緣耦合器400出射後被第一斜面500S1反射至透鏡700,穿透透鏡700後再傳遞至光纖連接器F。或者是,光束L1依序從光纖連接器F傳遞至透鏡700,穿透透鏡 700後傳遞至第一斜面500S1,再被第一斜面500S1反射至第一邊緣耦合器400。 FIG. 5A is a schematic diagram of an optical element according to a fourth embodiment of the present invention. FIG. 5B is an enlarged schematic diagram of FIG. 5A at the lens. Referring to FIG. 5A and FIG. 5B , the optical element 10C is substantially the same as the optical element 10B of FIG. 4 , and the main differences are as follows. In this embodiment, the optical element 10C further includes a lens 700. The lens 700 is disposed on the first inclined surface 500S1, disposed on the transmission path of the light beam L1, and is used to collimate the light beam L1. In another embodiment, the lens 700 may be formed integrally with the cantilever structure 600, or the lens 700 may be formed integrally with the cantilever structure 600 and the first micro-optical element 500A. Among them, the light beam L1 is emitted from the first edge coupler 400 and then reflected by the first inclined surface 500S1 to the lens 700, and then transmitted to the optical fiber connector F after passing through the lens 700. Alternatively, the light beam L1 is sequentially transmitted from the optical fiber connector F to the lens 700, and then transmitted to the first inclined surface 500S1 after passing through the lens 700, and then reflected by the first inclined surface 500S1 to the first edge coupler 400.

在本實施例中,透鏡700的直徑D較佳是對應於光纖連接器F的直徑,例如是落在單模(single-mode)光纖連接器與多模(multi-mode)光纖連接器的直徑大小之間。在一實施例中,透鏡700的直徑D落在8微米至62.5微米的範圍內。 In this embodiment, the diameter D of the lens 700 preferably corresponds to the diameter of the optical fiber connector F, for example, it falls between the diameters of a single-mode optical fiber connector and a multi-mode optical fiber connector. In one embodiment, the diameter D of the lens 700 falls within the range of 8 microns to 62.5 microns.

在本實施例中,透鏡700與第一邊緣耦合器400重疊區域的距離S落在0微米至D/2的範圍內。透鏡700的厚度t落在50微米至1毫米的範圍內。由於光學元件10C設有透鏡700,其可提高光耦合效率。 In this embodiment, the distance S between the overlapping area of the lens 700 and the first edge coupler 400 falls within the range of 0 micrometers to D/2. The thickness t of the lens 700 falls within the range of 50 micrometers to 1 millimeter. Since the optical element 10C is provided with the lens 700, it can improve the light coupling efficiency.

此外,在本實施例中,第一斜面500S1上鍍有反射的金屬層520,使光束L1可被第一斜面500S1反射。而光學元件10C的其餘優點相似於光學元件10B,在此不再贅述。 In addition, in this embodiment, a reflective metal layer 520 is coated on the first inclined surface 500S1, so that the light beam L1 can be reflected by the first inclined surface 500S1. The remaining advantages of the optical element 10C are similar to those of the optical element 10B and will not be elaborated here.

圖6是根據本發明的第五實施例的光學元件的示意圖。請參考圖6,光學元件10D與圖3的光學元件10A大致相同,其主要差異如下。在本實施例中,第一微光學元件500D中的第一斜面500S1與第二斜面500S3直接相連接。 FIG6 is a schematic diagram of an optical element according to the fifth embodiment of the present invention. Referring to FIG6 , the optical element 10D is substantially the same as the optical element 10A of FIG3 , and the main differences are as follows. In this embodiment, the first inclined surface 500S1 and the second inclined surface 500S3 in the first micro-optical element 500D are directly connected.

此外,在本實施例中,第一斜面500S1上鍍有反射的金屬層520,使光束L1可被第一斜面500S1反射。而光學元件10D的其餘優點相似於光學元件10A,在此不再贅述。 In addition, in this embodiment, a reflective metal layer 520 is coated on the first inclined surface 500S1, so that the light beam L1 can be reflected by the first inclined surface 500S1. The remaining advantages of the optical element 10D are similar to those of the optical element 10A, which will not be elaborated here.

圖7是根據本發明的第六實施例的光學元件的示意圖。請參考圖7,光學元件10E與圖1的光學元件10大致相同,其主 要差異如下。在本實施例中,第一微光學元件500E更包括垂直面500S4。垂直面500S4的兩端分別連接至第一斜面500S1與底面500S3。 FIG. 7 is a schematic diagram of an optical element according to the sixth embodiment of the present invention. Referring to FIG. 7 , the optical element 10E is substantially the same as the optical element 10 of FIG. 1 , and the main differences are as follows. In this embodiment, the first micro-optical element 500E further includes a vertical surface 500S4. Both ends of the vertical surface 500S4 are connected to the first inclined surface 500S1 and the bottom surface 500S3, respectively.

此外,在本實施例中,第一斜面500S1上鍍有反射的金屬層520,使光束L1可被第一斜面500S1反射。而光學元件10E的其餘優點相似於光學元件10,在此不再贅述。 In addition, in this embodiment, a reflective metal layer 520 is coated on the first inclined surface 500S1, so that the light beam L1 can be reflected by the first inclined surface 500S1. The remaining advantages of the optical element 10E are similar to those of the optical element 10, which will not be elaborated here.

圖8是根據本發明的第七實施例的光學元件的示意圖。請參考圖8,光學元件10F與圖1的光學元件10大致相同,其主要差異如下。在本實施例中,光學元件10F更包括至少一第二絕緣層200’、至少一第二光波導層(未顯示於圖中)、至少一第二邊緣耦合器400’以及至少一第二微光學元件500’。第二絕緣層200’設置於基底100上。相似於圖1的第一光波導層300,第二光波導層設置在第二絕緣層200’上。第二邊緣耦合器400’設置在第二絕緣層200’上,且與第二光波導的一端(在垂直於圖6紙面方向上)耦接。第二微光學元件500’設置在基底100上,且第二微光學元件500’位於第一微光學元件500旁。每一第二微光學元件500’包括第三斜面500S1’。基底100、第二絕緣層200’、第二光波導層及第二邊緣耦合器400’之間具有至少一第二凹槽G’,且第二凹槽G’位於第一凹槽G旁。第二微光學元件500’位於第二凹槽G’內。 FIG8 is a schematic diagram of an optical element according to the seventh embodiment of the present invention. Referring to FIG8 , the optical element 10F is substantially the same as the optical element 10 of FIG1 , and the main differences are as follows. In this embodiment, the optical element 10F further includes at least one second insulating layer 200′, at least one second optical waveguide layer (not shown in the figure), at least one second edge coupler 400′, and at least one second micro-optical element 500′. The second insulating layer 200′ is disposed on the substrate 100. Similar to the first optical waveguide layer 300 of FIG1 , the second optical waveguide layer is disposed on the second insulating layer 200′. The second edge coupler 400′ is disposed on the second insulating layer 200′ and is coupled to one end of the second optical waveguide (in a direction perpendicular to the paper surface of FIG6 ). The second micro-optical element 500' is disposed on the substrate 100, and the second micro-optical element 500' is located next to the first micro-optical element 500. Each second micro-optical element 500' includes a third inclined surface 500S1'. There is at least one second groove G' between the substrate 100, the second insulating layer 200', the second optical waveguide layer and the second edge coupler 400', and the second groove G' is located next to the first groove G. The second micro-optical element 500' is located in the second groove G'.

其中,第一微光學元件500及這些第二微光學元件500’在光路上各自對應一個光纖連接器。也就是說,可利用單顆轉移或巨量轉移將第一微光學元件500及第二微光學元件500’整合在 光學元件10F,因此提升整體晶圓級量測的資料流通量(throughput)。 The first micro-optical element 500 and the second micro-optical elements 500' correspond to one optical fiber connector in the optical path. That is, the first micro-optical element 500 and the second micro-optical element 500' can be integrated into the optical element 10F by using a single transfer or a mass transfer, thereby improving the data throughput of the overall wafer-level measurement.

此外,在本實施例中,第一斜面500S1及第三斜面500S1’上鍍有反射的金屬層520,使光束可被第一斜面500S1或第三斜面500S1’反射。而光學元件10F的其餘優點相似於光學元件10,在此不再贅述。 In addition, in this embodiment, the first inclined surface 500S1 and the third inclined surface 500S1' are coated with a reflective metal layer 520, so that the light beam can be reflected by the first inclined surface 500S1 or the third inclined surface 500S1'. The remaining advantages of the optical element 10F are similar to those of the optical element 10, which will not be elaborated here.

綜上所述,在本發明的一實施例中,由於光學元件採用第一邊緣耦合器,因此適於串接波長分波多工元件。而且,光學元件設有第一微光學元件,並利用第一微光學元件將光束耦合至光纖連接器。因此,相較於傳統使用邊緣耦合器的光學元件需切割晶圓才能對光晶片進行量測,本發明實施例的光學元件有效解決晶圓級量測效率過低的問題,並有助於整體系統的量產。 In summary, in one embodiment of the present invention, since the optical element adopts the first edge coupler, it is suitable for serial connection with the wavelength division multiplexing element. Moreover, the optical element is provided with a first micro-optical element, and the light beam is coupled to the optical fiber connector by using the first micro-optical element. Therefore, compared with the traditional optical element using edge couplers, which requires wafer cutting to measure the optical chip, the optical element of the embodiment of the present invention effectively solves the problem of low wafer-level measurement efficiency and is conducive to the mass production of the overall system.

10:光學元件 10: Optical components

100:基底 100: Base

200:第一絕緣層 200: First insulation layer

300:第一光波導層 300: First optical waveguide layer

400:第一邊緣耦合器 400: First edge coupler

500:第一微光學元件 500: The first micro-optical element

500S1:第一斜面 500S1: First slope

500S2:底面 500S2: Bottom

520:金屬層 520:Metal layer

A:空氣間隙 A: Air gap

d:距離 d: distance

F:光纖連接器 F: Fiber optic connector

G:第一凹槽 G: First groove

L1:光束 L1: beam

θ:夾角 θ: angle of inclination

Claims (10)

一種光學元件,包括:一基底;一第一絕緣層,設置於該基底上;一第一光波導層,設置在該第一絕緣層上,且用以傳遞一光束;一第一邊緣耦合器,設置在該第一絕緣層上,且與該第一光波導層的一端耦接;以及一第一微光學元件,設置在該基底上,且包括一第一斜面,其中該基底、該第一絕緣層、該第一光波導層及該第一邊緣耦合器之間具有一第一凹槽,該第一微光學元件位於該第一凹槽內,其中該光束依序從該第一光波導層傳遞至該第一邊緣耦合器,從該第一邊緣耦合器出射,再被該第一斜面反射至一光纖連接器。 An optical element includes: a substrate; a first insulating layer disposed on the substrate; a first optical waveguide layer disposed on the first insulating layer and used to transmit a light beam; a first edge coupler disposed on the first insulating layer and coupled to one end of the first optical waveguide layer; and a first micro-optical element disposed on the substrate and including a first inclined surface, wherein a first groove is provided between the substrate, the first insulating layer, the first optical waveguide layer and the first edge coupler, and the first micro-optical element is located in the first groove, wherein the light beam is sequentially transmitted from the first optical waveguide layer to the first edge coupler, emitted from the first edge coupler, and then reflected by the first inclined surface to an optical fiber connector. 如請求項1所述的光學元件,其中該第一斜面上鍍有一反射的金屬層。 An optical element as described in claim 1, wherein a reflective metal layer is plated on the first inclined surface. 如請求項1所述的光學元件,其中該第一微光學元件更包括一底面,該底面與該第一斜面連接,該第一微光學元件透過該底面與該基底連接,其中該第一斜面與該底面之間的夾角落在30度至60度的範圍。 The optical element as described in claim 1, wherein the first micro-optical element further comprises a bottom surface, the bottom surface is connected to the first inclined surface, the first micro-optical element is connected to the substrate through the bottom surface, wherein the angle between the first inclined surface and the bottom surface is in the range of 30 degrees to 60 degrees. 如請求項1所述的光學元件,其中該第一微光學元件與該第一邊緣耦合器之間具有空氣間隙。 An optical element as described in claim 1, wherein there is an air gap between the first micro-optical element and the first edge coupler. 如請求項1所述的光學元件,其中該第一微光學元件更包括一第二斜面,該第二斜面相對於該第一斜面,且朝向該基底,其中在該第一光波導層往該基底的方向上,該第一斜面的底部位置低於該第一光波導層的底部。 An optical element as described in claim 1, wherein the first micro-optical element further comprises a second inclined surface, the second inclined surface is opposite to the first inclined surface and faces the substrate, wherein in the direction from the first optical waveguide layer to the substrate, the bottom position of the first inclined surface is lower than the bottom of the first optical waveguide layer. 如請求項5所述的光學元件,其中該第一斜面與該第二斜面直接相連接。 An optical element as described in claim 5, wherein the first inclined surface is directly connected to the second inclined surface. 如請求項3所述的光學元件,其中該第一微光學元件更包括一垂直面,該垂直面的兩端分別連接至該第一斜面與該底面。 An optical element as described in claim 3, wherein the first micro-optical element further includes a vertical surface, and two ends of the vertical surface are respectively connected to the first inclined surface and the bottom surface. 如請求項1所述的光學元件,更包括:一透鏡,配置於該第一斜面上,設置於該光束的傳遞路徑上,且用於準直該光束,其中該光束從該第一邊緣耦合器出射後被該第一斜面反射至該透鏡。 The optical element as described in claim 1 further includes: a lens, arranged on the first inclined surface, disposed on the transmission path of the light beam, and used to collimate the light beam, wherein the light beam is reflected by the first inclined surface to the lens after being emitted from the first edge coupler. 如請求項7所述的光學元件,其中該透鏡與該第一邊緣耦合器重疊區域的距離落在0微米至D/2的範圍內,其中D為該透鏡的直徑。 An optical element as described in claim 7, wherein the distance between the overlapping area of the lens and the first edge coupler falls within the range of 0 microns to D/2, where D is the diameter of the lens. 如請求項1所述的光學元件,更包括:至少一第二絕緣層,設置於該基底上; 至少一第二光波導層,設置在該至少一第二絕緣層上;至少一第二邊緣耦合器,設置在該至少一第二絕緣層上,且與該至少一第二光波導的一端耦接;以及至少一第二微光學元件,設置在該基底上,每一第二微光學元件包括一第三斜面,其中該基底、該至少一第二絕緣層、該至少一第二光波導層及該至少一第二邊緣耦合器之間具有至少一第二凹槽,該至少一第二微光學元件位於該至少一第二凹槽內。 The optical element as described in claim 1 further comprises: at least one second insulating layer disposed on the substrate; at least one second optical waveguide layer disposed on the at least one second insulating layer; at least one second edge coupler disposed on the at least one second insulating layer and coupled to one end of the at least one second optical waveguide; and at least one second micro-optical element disposed on the substrate, each second micro-optical element comprising a third inclined surface, wherein at least one second groove is provided between the substrate, the at least one second insulating layer, the at least one second optical waveguide layer and the at least one second edge coupler, and the at least one second micro-optical element is located in the at least one second groove.
TW111143816A 2021-11-29 2022-11-16 Optical element TWI842205B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US18/070,413 US12405426B2 (en) 2021-11-29 2022-11-28 Optical element

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202163284002P 2021-11-29 2021-11-29
US63/284,002 2021-11-29

Publications (2)

Publication Number Publication Date
TW202321748A TW202321748A (en) 2023-06-01
TWI842205B true TWI842205B (en) 2024-05-11

Family

ID=87803721

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111143816A TWI842205B (en) 2021-11-29 2022-11-16 Optical element

Country Status (1)

Country Link
TW (1) TWI842205B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006178001A (en) * 2004-12-20 2006-07-06 Ibiden Co Ltd Optical path conversion member, multilayer printed wiring board, and optical communication device
CN101010609A (en) * 2004-09-02 2007-08-01 日本电气株式会社 Photoelectric composite module
TWI489162B (en) * 2011-12-15 2015-06-21 Intel Corp An efficient backside-emitting/collecting grating coupler and a method for manufacturing the same
CN107346053A (en) * 2016-05-08 2017-11-14 迈络思科技有限公司 Silicon photon connector
WO2020246042A1 (en) * 2019-06-07 2020-12-10 日本電信電話株式会社 Surface-emitting optical circuit and surface-emitting light source using same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101010609A (en) * 2004-09-02 2007-08-01 日本电气株式会社 Photoelectric composite module
JP2006178001A (en) * 2004-12-20 2006-07-06 Ibiden Co Ltd Optical path conversion member, multilayer printed wiring board, and optical communication device
TWI489162B (en) * 2011-12-15 2015-06-21 Intel Corp An efficient backside-emitting/collecting grating coupler and a method for manufacturing the same
CN107346053A (en) * 2016-05-08 2017-11-14 迈络思科技有限公司 Silicon photon connector
WO2020246042A1 (en) * 2019-06-07 2020-12-10 日本電信電話株式会社 Surface-emitting optical circuit and surface-emitting light source using same

Also Published As

Publication number Publication date
TW202321748A (en) 2023-06-01

Similar Documents

Publication Publication Date Title
US10215919B2 (en) Optical coupling arrangement
CN110196473B (en) Photonic integrated circuit package
JP6172679B2 (en) Optical coupling structure, semiconductor device, optical interconnect structure for multi-chip module, and manufacturing method for optical coupling structure
US7218809B2 (en) Integrated planar composite coupling structures for bi-directional light beam transformation between a small mode size waveguide and a large mode size waveguide
US12379555B2 (en) Detachable connector for co-packaged optics
CN113474705A (en) Edge coupling through unetched surfaces of photonic chips
US6628854B1 (en) Connector-type optical transceiver using SOI optical waveguide
KR20150024431A (en) Optical assembly with diffractive optical element
JPWO2002073256A1 (en) Optical circuit element, method of manufacturing the same, arrayed optical circuit element, and optical circuit device using the same
Snyder et al. Packaging and assembly challenges for 50G silicon photonics interposers
CN103066148A (en) Hybrid integrated optoelectronic chip of silicon dioxide base on silicon and preparation method thereof
JP2004029798A (en) Alignment device
US12529844B2 (en) Apparatus for optical coupling
JP2011107384A (en) Method for manufacturing optical coupling device
US12066662B2 (en) Apparatus for optical coupling and system for communication
CN217112794U (en) Optical probe of photoelectronic integrated circuit
Mangal et al. Expanded-beam backside coupling interface for alignment-tolerant packaging of silicon photonics
TWI842205B (en) Optical element
US7111993B2 (en) Optical monitor module
US12405426B2 (en) Optical element
JPH10170765A (en) Optical waveguide
JP6427072B2 (en) Optical fiber block
TWI805350B (en) Optical probe package structure
Gradkowski et al. Out-of-plane optical coupling to photonic integrated circuits using turning-mirror lens arrays
CN114966975A (en) A Probe Fiber for Silicon Optical Wafer End-Face Coupling Test