[go: up one dir, main page]

TWI738633B - Manufacturing method of processed objects - Google Patents

Manufacturing method of processed objects Download PDF

Info

Publication number
TWI738633B
TWI738633B TW104140062A TW104140062A TWI738633B TW I738633 B TWI738633 B TW I738633B TW 104140062 A TW104140062 A TW 104140062A TW 104140062 A TW104140062 A TW 104140062A TW I738633 B TWI738633 B TW I738633B
Authority
TW
Taiwan
Prior art keywords
adhesive
adhesive sheet
plate
shaped component
manufacturing
Prior art date
Application number
TW104140062A
Other languages
Chinese (zh)
Other versions
TW201629171A (en
Inventor
山下茂之
中村優智
Original Assignee
日商琳得科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商琳得科股份有限公司 filed Critical 日商琳得科股份有限公司
Publication of TW201629171A publication Critical patent/TW201629171A/en
Application granted granted Critical
Publication of TWI738633B publication Critical patent/TWI738633B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/10Homopolymers or copolymers of methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/10Homopolymers or copolymers of methacrylic acid esters
    • C09J133/12Homopolymers or copolymers of methyl methacrylate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/24Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/241Polyolefin, e.g.rubber
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesive Tapes (AREA)
  • Dicing (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laser Beam Processing (AREA)
  • Laminated Bodies (AREA)

Abstract

本發明係關於一種黏接片以及加工物之製造方法,其中,本發明所提供的一種黏接片,係在板狀組件照射雷射光形成改質部,用於將上述板狀組件分割後晶片化的黏接片,具有基材和上述基材的一邊面上備有的黏接劑層,上述基材對於上述一邊面以及上述一邊面之反面的兩邊面,於JIS B0601:2013(ISO 4287:1997)所規定的算數平均粗糙度Ra係0.01μm以上、0.2μm以下,上述黏接劑層的厚度係2μm以上、12μm以下。這種黏接片在利用雷射光之切割製程中使用時,難以產生瑕疵且具有優越的頂取(Pick up)性。 The present invention relates to an adhesive sheet and a manufacturing method of a processed object. The adhesive sheet provided by the present invention is used to irradiate a plate-shaped component with laser light to form a modified portion, which is used to divide the above-mentioned plate-shaped component into a chip The adhesive sheet has a base material and an adhesive layer provided on one side of the base material. The base material is used for the above-mentioned one side and the opposite sides of the above-mentioned one side in accordance with JIS B0601: 2013 (ISO 4287). : 1997) The prescribed arithmetic average roughness Ra is 0.01 μm or more and 0.2 μm or less, and the thickness of the adhesive layer is 2 μm or more and 12 μm or less. When the adhesive sheet is used in the cutting process using laser light, it is difficult to produce defects and has excellent pick-up properties.

Description

加工物之製造方法 Manufacturing method of processed objects

本發明係關於一種黏接片以及加工物之製造方法;特別關於一種於板狀組件照射雷射光形成改質部,用於將該板狀組件個片化,得晶片狀加工物的黏接片,以及一種利用上述黏接片,製造晶片等加工物的方法。 The present invention relates to an adhesive sheet and a manufacturing method of a processed object; in particular, it relates to an adhesive sheet for irradiating a plate-shaped component with laser light to form a modified part, which is used to separate the plate-shaped component into pieces to obtain a wafer-shaped processed object , And a method for manufacturing wafers and other processed objects using the above-mentioned adhesive sheet.

半導體晶圓於表面形成回路後,在晶圓的背面進行研磨加工,進行調整晶圓厚度的背面研磨製程以及將晶圓個片化為所需晶片大小的切割製程。 After forming a loop on the surface of the semiconductor wafer, the back surface of the wafer is polished, the back polishing process is performed to adjust the thickness of the wafer, and the dicing process is performed to slice the wafer into the required wafer size.

近來隨著電子機器機殼尺寸的縮小或利用多積層晶片的半導體裝置之需求增加,該構成組件之半導體晶片正持續薄型化中,因此,對於原本厚度係350μm左右的晶圓,要求需薄化至50~100μm或此厚度以下。 Recently, with the shrinking of the size of electronic equipment casings or the increasing demand for semiconductor devices using multi-layered chips, the semiconductor chips constituting the components are continuously being thinned. Therefore, the original thickness of the wafers of about 350μm needs to be thinned. To 50~100μm or below this thickness.

質地脆弱的組件晶圓變薄的同時,加工以及搬運時破損的危險性亦提高。這種薄度的晶圓若透過高速旋轉的切割刀裁切,尤其係半導體晶圓的背面,會發生晶片崩裂等,使晶片的抗折強度明顯下降。 As the fragile component wafers become thinner, the risk of breakage during processing and handling also increases. If such a thin wafer is cut through a high-speed rotating dicing knife, especially on the back of a semiconductor wafer, chip cracks will occur, which will significantly reduce the flexural strength of the wafer.

因此,專利文獻中揭示了將雷射光照射於半導體晶圓的內部,選擇部分形成改質部同時形成切割線,以改質部為基準裁切半導體晶圓,即所謂的隱形切割法(專利文獻1)。 根據隱形切割法,以雷射光照射半導體晶圓內部形成改質部後,將薄的半導體晶圓黏貼於以基材和黏接劑層組成的黏接片(切割片),藉由將切割片延展,沿著切割線分割(切割)半導體晶圓後,即可以良好的產率生產半導體晶片。此外,亦揭示了在半導體晶圓黏貼於切割片後,以雷射光照射形成改質部。藉由採用這樣的製程形成改質部,由於不需經過於變得脆弱的晶圓上黏貼切割膠帶的製程,便可降低已變得脆弱的晶圓之破損風險。在這樣的情況下,由於一般雷射係照射於晶圓未形成回路的面,因此產生通過切割片照射雷射的必要性。 Therefore, the patent literature discloses the so-called stealth dicing method by irradiating the laser light into the semiconductor wafer, forming a modified part while forming a dicing line at the same time, and cutting the semiconductor wafer based on the modified part (Patent Document 1). According to the invisible dicing method, after irradiating the inside of the semiconductor wafer with laser light to form a modified part, the thin semiconductor wafer is pasted on an adhesive sheet (dicing sheet) composed of a base material and an adhesive layer. After stretching, dividing (cutting) the semiconductor wafer along the cutting line, the semiconductor wafer can be produced at a good yield. In addition, it is also disclosed that after the semiconductor wafer is attached to the dicing sheet, it is irradiated with laser light to form a modified part. By adopting such a process to form the modified part, since there is no need to go through the process of attaching a dicing tape to the fragile wafer, the risk of damage to the fragile wafer can be reduced. In such a case, since a general laser system irradiates the surface of the wafer where the circuit is not formed, it is necessary to irradiate the laser through the dicing sheet.

如同上述切割製程中,作為加工方法,有些情況需利用雷射,而於切割製程時,作為準確地校準半導體晶圓等板狀組件的工具亦有使用雷射的情況。與該等情況一樣的切割製程中,利用雷射光的情況下,使用的黏接片(本發明專利說明書中將此黏接片稱為「雷射切割片」)在該使用過程中,此雷射切割片透過雷射的情況下,對於此雷射光必須具有優越的穿透性才行。 As in the above-mentioned dicing process, as a processing method, a laser is required in some cases, and in the dicing process, a laser is also used as a tool for accurately aligning plate-shaped components such as semiconductor wafers. In the same cutting process as these cases, when laser light is used, the adhesive sheet used (this adhesive sheet is referred to as "laser cutting sheet" in the patent specification of the present invention) during the use process, the laser In the case that the cutting sheet is transmitted through the laser, it must have excellent penetrability for the laser light.

為了滿足這樣的要求,例如,專利文獻2中揭示了作為以基材和該單面形成的黏接劑層形成的雷射切割片,300~400nm的波長範圍之全光線透過率係60%以上,霧度係20%以下,光梳的幅寬係0.25mm的穿透鮮明度係30以上的雷射切割片。 In order to meet such requirements, for example, Patent Document 2 discloses that as a laser dicing sheet formed of a substrate and an adhesive layer formed on one side, the total light transmittance in the wavelength range of 300 to 400 nm is 60% or more. , Haze is below 20%, the width of the comb is 0.25mm, and the sharpness of penetration is above 30.

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利公開第2005-229040號公 報 [Patent Document 1] Japanese Patent Publication No. 2005-229040 Report

[專利文獻2]專利第5124778號公報 [Patent Document 2] Patent No. 5124778

專利文獻2中,作為上述雷射切割片,該基材的單面之中心線平均粗糙度Ra比另一邊面的中心線平均粗糙度Ra大,以於中心線平均粗糙度Ra較大的面形成黏接劑層而組成,將中心線平均粗糙度Ra係0.3~0.7μm的面作為黏接劑層形成面,基材的該面之反面的中心線平均粗糙度Ra係0.14μm的雷射切割片(專利文獻2實施例)。 In Patent Document 2, as the above-mentioned laser dicing sheet, the centerline average roughness Ra of one side of the substrate is greater than the centerline average roughness Ra of the other side surface, so that the centerline average roughness Ra is larger. An adhesive layer is formed to form a laser whose centerline average roughness Ra is 0.3~0.7μm as the adhesive layer forming surface, and the centerline average roughness Ra of the opposite side of the substrate is 0.14μm. Cut sheet (Patent Document 2 Example).

這種雷射切割片由於雷射入射側的面之基材的黏接劑層形成面之反面成為平滑面,可防止基材表面的雷射光散亂,以期有效利用雷射光。 This kind of laser dicing sheet has a smooth surface on the side opposite to the surface where the adhesive layer of the substrate is formed on the surface of the laser incident side, which prevents the laser light on the surface of the substrate from being scattered, so as to effectively utilize the laser light.

但利用雷射切割片,在半導體晶圓等板狀組件上製造的半導體晶片等加工物,該厚度有變得更薄的傾向,此外,近來實裝的高密度化持續進行中,有時會以聚矽氧晶圓取代基板,在其上方利用矽(Si)貫穿電極(TSV、Through-Silicon Via)積層晶片。與此相同,加工物很薄或加工物具有TSV所涉及的構造之情況下,雷射切割片的黏接劑層可從附著於該黏接劑層的加工物輕鬆地剝離(頂取性優秀)者為佳。 However, the thickness of semiconductor wafers and other processed objects manufactured on plate-shaped components such as semiconductor wafers using laser dicing sheets tends to become thinner. In addition, recent high-density mounting is continuing, sometimes The substrate is replaced by a polysilicon wafer, and silicon (Si) through electrodes (TSV, Through-Silicon Via) are used to laminate the wafer on top of it. Similarly, when the processed product is thin or the processed product has the structure involved in TSV, the adhesive layer of the laser dicing sheet can be easily peeled off from the processed product attached to the adhesive layer (excellent liftability) ) Is better.

另一方面,專利文獻2中所記載的雷射切割片上,有時會產生黏接劑層無法適當地於基材上形成的部分,這種部分在雷射切割片的平面視被視為係瑕疵,有導致為了板狀組件加工而入射的雷射之板狀組件抵達光不均性的疑慮。 On the other hand, the laser dicing sheet described in Patent Document 2 sometimes has a portion where the adhesive layer cannot be properly formed on the substrate. Such a portion is regarded as a system in the plane view of the laser dicing sheet. Defects, there is a concern that the plate-shaped components of the laser incident for the processing of the plate-shaped components may reach the light unevenness.

本發明係切割製程中利用雷射光的情況下所使用的黏接片,目的在於提供一種難以產生瑕疵且具有優越的頂取性之黏接片,以及提供利用這種黏接片於板狀組件製造加工物的方法。 The present invention is an adhesive sheet used when laser light is used in the cutting process, and its purpose is to provide an adhesive sheet that is difficult to produce defects and has superior removability, and to provide the use of such an adhesive sheet for plate-shaped components Methods of manufacturing processed objects.

為了達成上述目的,經本發明者等深入鑽研,藉由將黏接劑層的厚度設為2μm以上、12μm以下,基材雙面的算數平均粗糙度Ra設為0.2μm以下,便可獲得可穩定地降低瑕疵發生的可能性,同時具有優越的頂取性之黏接片的新知。 In order to achieve the above object, the inventors of the present invention have intensively studied, by setting the thickness of the adhesive layer to 2 μm or more and 12 μm or less, and the arithmetic average roughness Ra of both sides of the base material to 0.2 μm or less, it is possible to obtain stable The new knowledge of adhesive sheet that reduces the possibility of flaws and has excellent repellency.

本發明以上述新知為基礎所完成,內容如下。 The present invention has been completed on the basis of the above-mentioned new knowledge, and its contents are as follows.

(1)一種黏接片,係在板狀組件照射雷射光形成改質部,用於將上述板狀組件分割後晶片化的黏接片,其特徵在於:具有基材和上述基材的一邊面上備有的黏接劑層,上述基材對於上述一邊面以及上述一邊面之反面的兩邊面,於JIS B0601:2013(ISO 4287:1997)所規定的算數平均粗糙度Ra係0.01μm以上、0.2μm以下,上述黏接劑層的厚度係2μm以上、12μm以下。 (1) An adhesive sheet for forming a modified part by irradiating a laser light on a plate-shaped component, which is used to divide the plate-shaped component into a chip, and is characterized in that it has a substrate and one side of the substrate Adhesive layer provided on the surface, the above-mentioned base material has an arithmetic average roughness Ra specified in JIS B0601:2013 (ISO 4287:1997) of 0.01μm or more for the above-mentioned one side and the opposite sides of the above-mentioned one side. , 0.2μm or less, the thickness of the adhesive layer is 2μm or more and 12μm or less.

(2)上述第(1)項所述的黏接片,上述黏接片於JIS K7136:2000(ISO 14782:1999)所規定的霧度,在將基材側作為入射側時,係0.01%以上、10%以下。 (2) The adhesive sheet described in (1) above, which has a haze specified in JIS K7136: 2000 (ISO 14782: 1999), and 0.01% when the substrate side is the incident side Above and below 10%.

(3)上述第(1)項或第(2)項所述的黏接片,上述黏接劑層含有丙烯酸類聚合物,上述丙烯酸類聚合物的玻璃轉換溫度Tg係-40℃以上、-10℃以下。 (3) The adhesive sheet according to the above item (1) or (2), wherein the adhesive layer contains an acrylic polymer, and the glass transition temperature Tg of the acrylic polymer is above -40°C,- Below 10°C.

(4)上述第(3)項所述的黏接片,上述丙烯酸類聚合 物包含源自甲基丙烯酸甲酯的構成單位,對於賦予上述丙烯酸類聚合物的單體整體之甲基丙烯酸甲酯質量比係5質量%以上、20質量%以下。 (4) The adhesive sheet described in (3) above, wherein the acrylic polymer is polymerized The substance contains a structural unit derived from methyl methacrylate, and the mass ratio of methyl methacrylate to the entire monomer imparted to the acrylic polymer is 5% by mass or more and 20% by mass or less.

(5)上述第(3)項或第(4)項所述的黏接片,上述丙烯酸類聚合物具有能量線聚合性基。 (5) The adhesive sheet according to the above (3) or (4), wherein the acrylic polymer has an energy ray polymerizable group.

(6)上述第(1)項至第(5)項中任一項所述的黏接片,上述基材含有聚烯烴類材料。 (6) The adhesive sheet according to any one of the above items (1) to (5), wherein the base material contains a polyolefin-based material.

(7)上述第(1)項至第(6)項中任一項所述的黏接片,上述基材的上述算數平均粗糙度Ra係包含上述基材輥加壓而設定。 (7) The adhesive sheet according to any one of the above (1) to (6), wherein the arithmetic average roughness Ra of the substrate is set including the substrate roll pressing.

(8)上述第(7)項所述的黏接片,上述輥加壓中所使用的輥具有以金屬材料組成之表面。 (8) The adhesive sheet according to the above item (7), wherein the roller used in the roller pressing has a surface composed of a metal material.

(9)一種加工物之製造方法,包括:將上述第(1)項至第(8)中任一項所述的黏接片之比起上述基材更鄰近黏接劑層的面黏貼於包含板狀組件的黏附體之一邊面,獲得具有上述黏接片以及上述板狀組件的第1積層體之黏貼製程;藉由將具有上述第1積層體的上述基材延展,分割上述黏接片上的上述板狀組件,獲得具有上述板狀組件的分割體之多個晶片,配置於上述黏接片上形成的第2積層體之分割製程;以及將上述第2積層體的上述多個晶片之份別從上述黏接片分離,將上述晶片作為加工物獲得的頂取製程;其特徵在於:至上述分割製程開始為止,照射雷射光使其聚焦於上述板狀組件的內部所設定的焦點,於上述板狀組件的內部形成改質部的改質部形成製程。 (9) A method of manufacturing a processed product, comprising: sticking the adhesive sheet according to any one of the above items (1) to (8) on the surface that is closer to the adhesive layer than the base material One side surface of the adhered body including the plate-shaped component, and the bonding process of obtaining the first laminate having the above-mentioned adhesive sheet and the above-mentioned plate-shaped component; The above-mentioned plate-shaped component on the chip, obtaining a plurality of wafers having the divided body of the above-mentioned plate-shaped component, and arranging the dividing process of the second laminated body formed on the bonding sheet; and dividing the plurality of wafers of the second laminated body An ejecting process in which the parts are separated from the above-mentioned adhesive sheet and the above-mentioned wafer is obtained as a processed product; the feature is that until the start of the above-mentioned dividing process, laser light is irradiated to focus on the focal point set inside the plate-shaped component, A modified part forming process for forming a modified part inside the plate-shaped component.

(10)上述第(9)項所述的加工物之製造方法,於上述分割製程所提供的上述第1積層體,於上述黏接劑層和上述板狀組件之間具有附加層,於上述分割製程同時分割上述附加層,於上述頂取製程,從上述黏接片分離的晶片具有上述板狀組件的分割體,以及該板狀組件的分割體之上述鄰近黏接片的面上形成的上述附加層之分割體。 (10) The method for manufacturing a processed product described in the above item (9), wherein the first laminate provided in the division process has an additional layer between the adhesive layer and the plate-shaped component, and the The dividing process divides the additional layer at the same time. In the ejecting process, the chip separated from the adhesive sheet has the divided body of the plate-shaped component, and the surface of the divided body of the plate-shaped component adjacent to the adhesive sheet is formed Split body of the above additional layer.

(11)上述第(10)項所述的加工物之製造方法,上述附加層具有保護層。 (11) The method for manufacturing a processed product described in the above item (10), wherein the additional layer has a protective layer.

(12)上述第(11)項所述的加工物之製造方法,至上述分割製程開始為止,具有由保護膜形成薄膜形成上述第1積層體的上述保護層的保護膜形成製程。 (12) The method for manufacturing a processed product described in the above item (11) includes a protective film forming process for forming the protective layer of the first laminate from a protective film forming film until the start of the dividing process.

(13)上述第(10)項所述的加工物之製造方法,上述附加層具有晶粒結著層。 (13) The method for producing a processed product according to the above item (10), wherein the additional layer has a grain bonding layer.

本發明提供難以產生瑕疵且具有優越的頂取性之黏接片。此外,藉由利用這種黏接片,便可於板狀組件上穩定地製造加工物。 The present invention provides an adhesive sheet that is hard to produce defects and has superior ejectability. In addition, by using this adhesive sheet, a processed product can be stably manufactured on a plate-shaped component.

以下對於本發明的實施形態進行詳細說明。 Hereinafter, the embodiment of the present invention will be described in detail.

1.黏接片 1. Adhesive sheet

本發明之其一實施形態所涉及的黏接片具有基材以及黏接劑層。 The adhesive sheet according to one embodiment of the present invention has a base material and an adhesive layer.

(1)基材 (1) Substrate

本發明之其一實施形態所涉及的黏接片的基材,對於黏接劑層相對側的面(本發明專利說明書中稱為「黏接劑加工面」)以及黏接劑加工面之反面(本發明專利說明書中稱為「雷射入射面」)之兩個面,於IS B0601:2013(ISO 4287:1997)所規定的算數平均粗糙度Ra(以下未特別註明的「算數平均粗糙度Ra」皆係此含意)係0.2μm以下。透過該等面的算數平均粗糙度Ra係0.2μm以下,難以觀測到黏接片的平面視上之瑕疵,因此,於黏接片的基材側入射的雷射光很容易均一地抵達黏接片黏貼的板狀組件,這種雷射光在不均地抵達板狀組件的情況下,例如,板狀組件內產生沒有適當地形成改質部的部分,提高了從這部分發生板狀組件的個片化無法適當地進行等問題之可能性。從提高上述入射雷射光的均一性之觀點來看,對於黏接劑加工面以及雷射入射面這兩個面,算數平均粗糙度Ra係0.18μm以下為佳,較佳係0.16μm以下,更佳係0.14μm以下,特佳係0.12μm以下。從獲得難以產生平面視瑕疵的黏接片之觀點來看,對於黏接劑加工面,算數平均粗糙度Ra的下限並無限制。從維持製造穩定性等的觀點等來看,對於黏接劑加工面以及雷射入射面這兩面,算數平均粗糙度Ra係0.01μm以上為佳。 The base material of the adhesive sheet according to one embodiment of the present invention has a surface opposite to the adhesive layer (referred to as the "adhesive processed surface" in the patent specification of the present invention) and the opposite surface of the adhesive processed surface (Referred to as the "laser incident surface" in the patent specification of the present invention), the arithmetic average roughness Ra specified in IS B0601:2013 (ISO 4287:1997) (the "arithmetic average roughness" not specified below Ra" all means this) is 0.2μm or less. The arithmetic average roughness Ra through these surfaces is 0.2μm or less, and it is difficult to observe the flaws in the plane view of the adhesive sheet. Therefore, the laser light incident on the substrate side of the adhesive sheet can easily reach the adhesive sheet uniformly. In the case of pasted plate-shaped components, this laser light reaches the plate-shaped components unevenly. For example, a part of the plate-shaped component that is not properly formed with a modified part is generated in the plate-shaped component, which increases the number of plate-shaped components from this part. Possibility of problems such as fragmentation cannot be carried out properly. From the viewpoint of improving the uniformity of the incident laser light, for both the adhesive processing surface and the laser incident surface, the arithmetic average roughness Ra is preferably 0.18 μm or less, preferably 0.16 μm or less, and more Preferably it is 0.14μm or less, and particularly preferably it is 0.12μm or less. From the viewpoint of obtaining an adhesive sheet that is difficult to produce flat-view defects, there is no limit to the lower limit of the arithmetic average roughness Ra for the adhesive processed surface. From the viewpoint of maintaining manufacturing stability, etc., it is preferable that the arithmetic average roughness Ra is 0.01 μm or more for both the adhesive processing surface and the laser incident surface.

本發明之其一實施形態所涉及的基材之構成材料,滿足對於上述算數平均粗糙度Ra的相關條件,可用來作為雷射切割片的基材,即,只要在所需波長的雷射光可以實用的範圍之穿透率穿透,即使在以面內方向延展或以局部的厚度 方向突出的情況下,亦可滿足難以斷裂之要求的前提下,並無特別限制。本發明之其一實施形態所涉及的基材,通常由樹脂類材料為主要材料的薄膜構成。此薄膜可係單層,亦可係積層體。 The constituent material of the substrate according to one embodiment of the present invention satisfies the relevant conditions for the arithmetic average roughness Ra, and can be used as the substrate of the laser dicing sheet, that is, as long as the laser light of the required wavelength can be used Penetration in a practical range, even in the in-plane direction or with a local thickness In the case of a protruding direction, there is no special restriction on the premise that it can also meet the requirement of being difficult to break. The substrate according to one embodiment of the present invention is usually composed of a film mainly composed of a resin-based material. This film can be a single layer or a laminate.

包含於這種薄膜的樹脂類材料之具體例子,可舉例:隨機共聚聚丙烯、嵌段共聚聚丙烯等聚丙烯;低密度聚乙烯(LDPE)、直鏈低密度聚乙烯(LLDPE)、高密度聚乙烯(HDPE)等聚乙烯;乙烯/乙酸乙烯酯共聚物、乙烯-(甲基)丙烯酸共聚物、乙烯-(甲基)丙烯酸酯共聚物、乙烯-降莰烯共聚物等乙烯類共聚物;降莰烯樹脂等環烯烴聚合物(COP)聚丁烯、聚丁二烯、聚甲基戊烯等聚烯烴類材料;聚氯乙烯、氯乙烯共聚物等聚氯乙烯類材料;聚對酞酸乙二酯、聚(對酞酸丁二酯)等聚酯類材料;聚氨酯類材料;聚醯亞胺類材料;離子聚合物樹脂類材料;烷基(甲基)丙烯酸酯的同元聚合物、烷基(甲基)丙烯酸酯的共聚物等聚丙烯酸類材料;聚苯乙烯類材料;聚碳酸酯類材料;氟樹脂類材料;以及將該等樹脂類材料的氫化物以及變性物作為主要材料的樹脂類材料等。樹脂類材料亦可係上述材料和架橋劑的架橋物,另外,本發明專利說明書中的「(甲基)丙烯酸」,意指丙烯酸以及甲基丙烯酸這兩種,其他類似用語亦同。賦予上述基材的樹脂類材料可係單獨1種,亦可係混合2種以之混合物。從高雷射穿透性、面內方向的延展以及厚度方向的局部變形容易性、低環境負荷等觀點來看,本發明之其一實施形態中所涉及的基材含有聚烯烴類材料為佳,聚烯烴類材料中又以含有隨機共聚聚丙烯等的聚丙烯較佳。 Specific examples of resin materials included in this film include: random copolymer polypropylene, block copolymer polypropylene and other polypropylene; low density polyethylene (LDPE), linear low density polyethylene (LLDPE), high density Polyethylene (HDPE) and other polyethylene; ethylene/vinyl acetate copolymer, ethylene-(meth)acrylic acid copolymer, ethylene-(meth)acrylate copolymer, ethylene-norbornene copolymer and other ethylene copolymers ; Cyclic olefin polymers such as norbornene resin (COP) polyolefin materials such as polybutene, polybutadiene, and polymethylpentene; polyvinyl chloride materials such as polyvinyl chloride and vinyl chloride copolymers; Polyester materials such as ethylene phthalate and poly(butylene terephthalate); polyurethane materials; polyimide materials; ionic polymer resin materials; homologous alkyl (meth)acrylates Polyacrylic materials such as polymers and alkyl (meth)acrylate copolymers; polystyrene materials; polycarbonate materials; fluororesin materials; and hydrides and denatured products of these resin materials As the main material, resin-based materials, etc. The resin material can also be the bridging material of the above-mentioned materials and the bridging agent. In addition, the "(meth)acrylic acid" in the patent specification of the present invention means both acrylic acid and methacrylic acid, and other similar terms are also the same. The resin-based material provided to the above-mentioned base material may be a single type or a mixture of two types. From the viewpoints of high laser penetration, elongation in the in-plane direction, easiness of local deformation in the thickness direction, and low environmental load, it is preferable that the base material according to one embodiment of the present invention contains a polyolefin-based material Among the polyolefin materials, polypropylene containing random copolymerized polypropylene is preferred.

包含於基材的樹脂類材料係聚烯烴類材料的情況下,一般而言,基材雙面的算數表面粗糙度Ra之控制,可利用2個輥透過將基材嵌入的輥加壓形成。藉由調整構成該等輥的表面材料以及該表面的粗糙度,設定基材雙面的算數表面粗糙度Ra。向來該等輥的表面,一般係一邊係以金屬形成、另一邊係以和橡膠一樣的彈性材料形成,因此,接觸以金屬面形成的輥的基材之面的算數表面粗糙度Ra,雖可相對容易以低數值進行,但接觸以彈性材料形成的輥的基材之面的算數表面粗糙度Ra,難以用低數值進行。此處,如同本發明之其一實施形態所涉及的基材,想使基材的雙面算數表面粗糙度Ra低落的情況下,對於輥加壓中所要求的輥的兩邊面,使用以金屬形成的面來進行為佳。但在這情況下,比起一邊輥的表面係以彈性材料形成的情況下,兩邊面的輥以及基材的相對配置需更嚴密地控制,包含於基材的樹脂類材料係聚氯乙烯類材料的情況下,由於可以膨脹成形(Inflation molding)製造基材,可輕易地將基材雙面的算數表面粗糙度Ra設為低數值。但,聚氯乙烯類材料由於包含鹵素元素,在減輕環境負荷的訴求下,不使用其作為基材材料為佳。 In the case of a resin-based material-based polyolefin-based material included in the base material, in general, the control of the arithmetic surface roughness Ra on both sides of the base material can be formed by pressing two rolls through a roll in which the base material is embedded. By adjusting the surface materials constituting the rollers and the roughness of the surface, the arithmetic surface roughness Ra of both sides of the substrate is set. Traditionally, the surface of these rollers is generally formed of metal on one side and elastic material like rubber on the other side. Therefore, the arithmetic surface roughness Ra of the surface contacting the base material of the roller formed by the metal surface is acceptable. It is relatively easy to perform with a low value, but it is difficult to perform with a low value for the arithmetic surface roughness Ra of the surface of the substrate contacting the roll formed of an elastic material. Here, like the base material according to one embodiment of the present invention, when it is desired to reduce the double-sided arithmetic surface roughness Ra of the base material, metal is used for both sides of the roll required for roll pressing. The formed surface is better. However, in this case, the relative arrangement of the rolls on both sides and the base material must be more closely controlled than when the surface of one roll is made of an elastic material. The resin material contained in the base material is polyvinyl chloride. In the case of materials, since the substrate can be manufactured by inflation molding, the arithmetic surface roughness Ra of both sides of the substrate can be easily set to a low value. However, because polyvinyl chloride-based materials contain halogen elements, it is better not to use them as a base material in order to reduce the environmental load.

基材係以上述的樹脂類材料作為主要材料的薄膜內,亦可包含著色劑、阻燃劑、塑化劑、抗靜電劑、潤滑劑、填充劑等各種添加劑。就著色劑而言,可舉例:二氧化鈦、碳黑等顏料或各種染料。此外,就填充劑而言,可舉例:如三聚氰胺樹脂一樣的有機類材料、如氣相二氧化矽一樣的無機類材料,以及如鎳鋼粒子一樣的金屬類材料。這種添加劑的含有量 雖無特別限制,但須固定於可發揮基材所需功能、尤其係穿透雷射的功能,並不失去所需之平滑性以及柔軟性的範圍內。 The substrate is a film containing the above-mentioned resin-based material as the main material, and various additives such as colorants, flame retardants, plasticizers, antistatic agents, lubricants, and fillers may also be contained in the film. As for the coloring agent, for example, pigments such as titanium dioxide and carbon black, or various dyes. In addition, as for the filler, for example, organic materials such as melamine resin, inorganic materials such as fumed silica, and metallic materials such as nickel steel particles. The content of this additive Although there is no particular limitation, it must be fixed in a range that can perform the required functions of the substrate, especially the function of penetrating laser, without losing the required smoothness and flexibility.

為了硬化黏接劑層,作為照射的能量線,利用紫外線的情況下,基材對於紫外線具有穿透性為佳。此外,作為能量線,利用電子束的情況下,基材具有電子束的穿透性為佳。 In order to harden the adhesive layer, in the case of using ultraviolet rays as the irradiated energy rays, it is preferable that the base material is transparent to ultraviolet rays. In addition, when an electron beam is used as an energy beam, it is preferable that the base material has electron beam penetration.

基材的厚度方面,黏接片在前面所述之各製程中,只要可適當地發揮功能,並無特別限制,較佳係介於20~450μm的範圍,更佳係介於25~200μm的範圍,特佳係介於50~150μm的範圍。 In terms of the thickness of the substrate, the adhesive sheet is not particularly limited as long as it can function properly in the various processes described above. It is preferably in the range of 20 to 450 μm, and more preferably in the range of 25 to 200 μm. The range is particularly preferably in the range of 50~150μm.

基材的楊氏模數係50~500MPa為佳。藉由使楊氏模數介於此範圍內,便可維持良好的延展性,同時提升基材的機械強度,使形成黏接劑層之際的製程性質良好。例如,作為基材的含聚烯烴類樹脂薄膜置於塗佈機時,可防止在施以張力的情況的基材之意外的延展。 The Young's modulus of the substrate is preferably 50~500MPa. By keeping the Young's modulus within this range, good ductility can be maintained, while the mechanical strength of the substrate is improved, so that the process properties when forming the adhesive layer are good. For example, when a polyolefin-containing resin film as a substrate is placed in a coating machine, it can prevent the substrate from unexpectedly spreading when tension is applied.

從上述楊氏模數難以發生阻斷,此外,提升機械強度的同時,擴充性相對較良好的觀點來看,較佳係60~450MPa,更佳係100~420MPa,特佳係150~300MPa。 From the viewpoint that it is difficult to block the Young's modulus, and that while improving the mechanical strength, the expandability is relatively good, preferably 60-450 MPa, more preferably 100-420 MPa, and particularly preferably 150-300 MPa.

(2)黏接劑層 (2) Adhesive layer

具有本發明之其一實施形態所涉及的黏接片的黏接劑層之厚度係2μm以上、12μm以下。藉由黏接劑層的厚度介於上述範圍內,基材雙面算數平均粗糙度Ra介於前面所述之範圍內,便可獲得從平面視難以產生瑕疵,且具有優越的頂取性之黏接片。從使上述產生瑕疵的可能性相對較穩定地降低的觀點來看,黏接劑層的厚度較佳係3μm以上,更佳係4μm以上。 從可更為穩定地實現獲得優越的頂取性之黏接片的觀點來看,黏接劑層的厚度較佳係10μm以下,更佳係8μm以下,特佳係6μm以下。 The thickness of the adhesive layer having the adhesive sheet according to one embodiment of the present invention is 2 μm or more and 12 μm or less. When the thickness of the adhesive layer is within the above range and the arithmetic average roughness Ra on both sides of the substrate is within the above-mentioned range, it is possible to obtain a product that is difficult to produce defects from a planar view and has excellent pick-up properties. Bonding piece. From the viewpoint of relatively stably reducing the possibility of occurrence of defects, the thickness of the adhesive layer is preferably 3 μm or more, more preferably 4 μm or more. From the viewpoint of stably realizing an adhesive sheet with superior ejectability, the thickness of the adhesive layer is preferably 10 μm or less, more preferably 8 μm or less, and particularly preferably 6 μm or less.

用於形成具有本發明之其一實施形態所涉及的黏接片的黏接劑層的黏接劑組成物並無限制,作為包含於這種黏接劑組成物的黏接劑,可舉例:橡膠類、丙烯酸類、聚矽氧類、聚乙烯醚等黏接劑。以下,以用於形成黏接劑層的黏接劑組成物含有丙烯酸類黏接劑的情況為例進行說明。由於丙烯酸類的黏接劑的透明性優秀,容易穿透雷射光線。 The adhesive composition used to form the adhesive layer having the adhesive sheet according to one of the embodiments of the present invention is not limited. As the adhesive included in the adhesive composition, for example: Adhesives such as rubber, acrylic, silicone, polyvinyl ether, etc. Hereinafter, a case where the adhesive composition for forming the adhesive layer contains an acrylic adhesive will be described as an example. Due to the excellent transparency of the acrylic adhesive, it is easy to penetrate the laser light.

丙烯酸類的黏接劑含有丙烯酸類聚合物。丙烯酸類聚合物係將以丙烯酸類化合物為基礎的構成單位,作為構成該骨架的單位而包含的聚合物。丙烯酸類聚合物可係1種單體聚合所形成的同元聚合物,亦可係多種單體聚合所形成的共聚物。從容易控制聚合物物理特性以及化學特性之觀點來看,丙烯酸類聚合物係共聚物為佳。 Acrylic adhesives contain acrylic polymers. The acrylic polymer is a polymer containing a structural unit based on an acrylic compound as a unit constituting the skeleton. The acrylic polymer can be a homopolymer formed by the polymerization of one monomer, or a copolymer formed by the polymerization of multiple monomers. From the viewpoint of easy control of the physical and chemical properties of the polymer, an acrylic polymer-based copolymer is preferred.

丙烯酸類聚合物的玻璃轉換溫度Tg係-40℃以上、-10℃以下為佳。藉由玻璃轉換溫度Tg係-40℃以上的丙烯酸類聚合物包含於黏接劑組成物,變得可以降低黏接劑層的黏接性,並將頂取性更為提升。從更為穩定地獲得這種提升頂取性的效果之觀點來看,丙烯酸類聚合物的玻璃轉換溫度Tg係-35℃以上更佳。晶圓的晶片分割後,從易於保持維持晶片性能的觀點來看,丙烯酸類聚合物的玻璃轉換溫度Tg係-20℃以下為佳。 The glass transition temperature Tg of the acrylic polymer is preferably -40°C or higher and -10°C or lower. By including acrylic polymer with a glass transition temperature Tg of -40°C or higher in the adhesive composition, it becomes possible to reduce the adhesiveness of the adhesive layer and improve the ejectability. From the viewpoint of more stably obtaining the effect of improving the ejectability, the glass transition temperature Tg of the acrylic polymer is preferably -35°C or higher. After the wafer is divided, the glass transition temperature Tg of the acrylic polymer is preferably -20°C or less from the viewpoint of easy maintenance of the performance of the wafer.

丙烯酸類聚合物的重量平均分子量(Mw)並無限 制,通常較佳係10萬~200萬,更佳係30萬~150萬。此外,分子量分布(Mw/Mn、Mn係數均分子量)亦無限制,通常較佳係1.0~10,更佳係1.0~3.0。 The weight average molecular weight (Mw) of acrylic polymer is not unlimited System, usually 100,000 to 2 million is preferred, and 300,000 to 1.5 million is more preferred. In addition, the molecular weight distribution (Mw/Mn, Mn coefficient average molecular weight) is also not limited, usually 1.0-10, more preferably 1.0-3.0.

賦予丙烯酸類聚合物的單體之具體種類並無限制,作為這種單體,可舉例:(甲基)丙烯酸、(甲基)丙烯酸酯、丙烯腈等。作為(甲基)丙烯酸酯的具體例子,可舉例:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸十二酯、(甲基)丙烯酸十五酯、(甲基)丙烯酸十八酯等烷基碳數係1~18的烷基(甲基)丙烯酸酯;(甲基)丙烯酸環烷基酯、(甲基)丙烯酸苄基酯、丙烯酸異莰基酯、丙烯酸二環戊基酯、丙烯酸二環戊烯基酯、丙烯酸二環戊烯基羥乙基酯、丙烯酸醯亞胺基酯等具有環狀骨架的(甲基)丙烯酸酯;2-(甲基)丙烯酸羥基乙酯、2-(甲基)丙烯酸羥基丙酯等具有羥基的(甲基)丙烯酸酯;縮水甘油甲基丙烯酸酯、縮水甘油丙烯酸酯等具有環氧樹脂基的(甲基)丙烯酸酯等。 The specific types of monomers imparted to the acrylic polymer are not limited, and examples of such monomers include (meth)acrylic acid, (meth)acrylate, acrylonitrile, and the like. As specific examples of (meth)acrylate, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, (meth)acrylate, and (meth)acrylate can be given as specific examples. 2-ethylhexyl acrylate, nonyl (meth)acrylate, lauryl (meth)acrylate, pentadecyl (meth)acrylate, octadecyl (meth)acrylate and other alkyl carbon numbers are 1~ Alkyl (meth)acrylate of 18; cycloalkyl (meth)acrylate, benzyl (meth)acrylate, isobornyl acrylate, dicyclopentyl acrylate, dicyclopentenyl acrylate , Dicyclopentenyl hydroxyethyl acrylate, amide acrylate and other (meth)acrylates with a cyclic skeleton; 2-(meth) hydroxyethyl acrylate, 2-(meth) hydroxyethyl acrylate (Meth)acrylates having hydroxyl groups such as propyl ester; (meth)acrylates having epoxy resin groups, such as glycidyl methacrylate and glycidyl acrylate, and the like.

從丙烯酸類聚合物使該玻璃轉換溫度Tg上升的觀點來看,含有甲基丙烯酸甲酯為佳。藉由丙烯酸類聚合物含有甲基丙烯酸甲酯,從得到更為穩定之所帶來的效果的觀點來看,對於賦予丙烯酸類聚合物的單體整體之甲基丙烯酸甲酯的質量比較佳係5質量%以上、20質量%以下,更佳係7質量%以上、15質量%以下。 From the viewpoint that the acrylic polymer increases the glass transition temperature Tg, it is preferable to contain methyl methacrylate. Since the acrylic polymer contains methyl methacrylate, from the viewpoint of obtaining a more stable effect, the quality of the methyl methacrylate is better for the entire monomer of the acrylic polymer. 5% by mass or more and 20% by mass or less, more preferably 7% by mass or more and 15% by mass or less.

丙烯酸類聚合物亦可係以乙酸乙烯酯、苯乙烯、乙酸乙烯酯等作為單體含有的共聚物。 The acrylic polymer may also be a copolymer containing vinyl acetate, styrene, vinyl acetate, etc. as monomers.

丙烯酸類聚合物具有可與能量線聚合性基和架橋劑反應的反應性官能基(以下簡稱「反應性官能基」)的至少一邊亦可。 The acrylic polymer may have at least one side of a reactive functional group (hereinafter referred to as "reactive functional group") capable of reacting with the energy ray polymerizable group and the bridging agent.

丙烯酸類聚合物含有能量線聚合性基的情況下,藉由於黏接劑層照射能量線,便更容易獲得可使對於黏附體的黏接性變得低落,且具有優越頂取性的黏接片。作為能量線聚合性基,可舉例具有聚合性雙鍵的基。具有能量線聚合性基的丙烯酸類聚合物之調製方法並無限制,作為這種調製方法之其中一例,對於具有含羥基、羧酸基、胺基等的活性氫的官能基之丙烯酸類聚合物,能與異氰酸鹽基等上述的官能基反應的官能基,以及具有能量線聚合性基的物質(具體可舉例(甲基)丙烯酸乙氧基異氰酸鹽)反應者。此外,丙烯酸類的黏接劑透過這種調整方法,在含有含能量線聚合性基的丙烯酸類聚合物的情況下,上述的丙烯酸類聚合物之玻璃轉換溫度Tg,指的係使可與上述官能基反應的官能基,以及具有能量線聚合性基的物質反應之前的Tg。 When the acrylic polymer contains an energy-ray polymerizable group, the adhesive layer is irradiated with energy rays, and it is easier to obtain an adhesive that can lower the adhesiveness to the adherend and has excellent ejectability. piece. As the energy ray polymerizable group, a group having a polymerizable double bond can be exemplified. The preparation method of the acrylic polymer having energy-beam polymerizable group is not limited. As an example of this preparation method, for the acrylic polymer having a functional group containing active hydrogen such as a hydroxyl group, a carboxylic acid group and an amine group , A functional group capable of reacting with the aforementioned functional group such as an isocyanate group, and a substance having an energy ray polymerizable group (specifically, a (meth)acrylic acid ethoxy isocyanate) reactant. In addition, through this adjustment method, the acrylic adhesive contains an energy-ray polymerizable group-containing acrylic polymer. The glass transition temperature Tg of the above-mentioned acrylic polymer refers to a system that can be The functional group to which the functional group is reacted, and the Tg before the reaction of the substance having the energy ray polymerizable group.

丙烯酸類聚合物具有反應性官能基的情況下,藉由此反應性官能基和架橋劑反應,調整黏接劑層凝聚性,抑制黏接片的剝離後於黏附體發生殘渣,或使黏接劑層的黏接性低下,更為提升頂取性等變得更為容易。反應性官能基和架橋劑的組合並無限制,作為反應性官能基,可舉例:羥基、羧酸基、胺基等具有活性氫的基。作為架橋劑,可舉例:異氰酸鹽類架橋劑、環氧樹脂類架橋劑、氮環丙烷類架橋劑、金屬鉗合物類架橋劑等。 When the acrylic polymer has a reactive functional group, the reactive functional group reacts with the bridging agent to adjust the cohesiveness of the adhesive layer and prevent the occurrence of residue in the adherend after the peeling of the adhesive sheet, or make the adhesion The adhesiveness of the agent layer is low, and it is easier to improve the pick-up property and so on. The combination of the reactive functional group and the bridging agent is not limited, and examples of the reactive functional group include groups having active hydrogen such as a hydroxyl group, a carboxylic acid group, and an amino group. As the bridging agent, for example, isocyanate-based bridging agents, epoxy resin-based bridging agents, aziridine-based bridging agents, metal clamp compound-based bridging agents, and the like can be exemplified.

異氰酸鹽類架橋劑至少含有含多個異氰酸鹽基的聚異氰酸鹽化合物。就聚異氰酸鹽化合物而言,可舉例:二異氰酸甲苯酯、二苯甲烷二異氰酸酯、二甲苯二異氰酸鹽等芳香族聚異氰酸鹽;二環己基甲烷-4,4’-二異氰酸鹽、雙環庚烷三異氰酸鹽、伸環戊基二異氰酸鹽、伸環己基二異氰酸鹽、甲基伸環己基二異氰酸鹽、氫化二甲苯二異氰酸鹽等脂環式異氰酸鹽化合物;環己烷二異氰酸鹽、三甲環己烷二異氰酸鹽、離胺酸二異氰酸鹽等非環式脂肪族異氰酸鹽以及該縮二脲體和三聚異氰酸體、具有異氰酸鹽基的化合物與乙烯乙二醇、三羥甲基丙烷、篦蔴油等與含非芳香族性低分子活性氫化合物的反應物之加成物等變性體。 The isocyanate-based bridging agent contains at least a polyisocyanate compound containing a plurality of isocyanate groups. For the polyisocyanate compound, for example, aromatic polyisocyanates such as toluene diisocyanate, diphenylmethane diisocyanate, xylene diisocyanate, etc.; dicyclohexylmethane-4,4 '-Diisocyanate, bicycloheptane triisocyanate, cyclopentyl diisocyanate, cyclohexyl diisocyanate, methylcyclohexyl diisocyanate, hydrogenated xylene Alicyclic isocyanate compounds such as diisocyanate; acyclic aliphatic isocyanates such as cyclohexane diisocyanate, trimethylcyclohexane diisocyanate, and lysine diisocyanate Acid salt and the biuret body, trimer isocyanate body, compound with isocyanate group, ethylene glycol, trimethylolpropane, sesame oil, etc. and non-aromatic low molecular active hydrogen compound Adducts of the reactants and other denatured bodies.

就環氧樹脂類架橋劑而言,可舉例:1,3-雙(N,N-二縮水甘油氨甲基)環己烷、N,N,N’,N’-四縮水甘油基-m-苯二甲胺、乙二醇二縮水甘油醚、1,6-二醇二縮水甘油醚、三羥甲基丙烷二縮水甘油醚、二縮水甘油基、縮水甘油胺等。 For epoxy resin bridging agents, for example: 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane, N,N,N',N'-tetraglycidyl-m -Xylylenediamine, ethylene glycol diglycidyl ether, 1,6-diol diglycidyl ether, trimethylolpropane diglycidyl ether, diglycidyl, glycidylamine, etc.

就氮環丙烷類架橋劑而言,可舉例:二苯甲烷-4,4’-雙(1-氮環丙烷甲醯胺)、三羥甲基丙烷三-β-氮丙啶丙酸、四甲基甲烷三-β-氮丙啶丙酸、甲苯-2,4-雙(1-氮環丙烷甲醯胺)、三伸三聚氰胺、雙異酞醯基-1-(2-甲基氮環丙烷)、三-1-(2-甲基氮環丙烷)膦、三羥甲基丙烷三-β-(2-甲基氮環丙烷)丙酸酯等。 As far as aziridine-based bridging agents are concerned, for example: diphenylmethane-4,4'-bis(1-aziridine carboxamide), trimethylolpropane tris-β-aziridine propionic acid, tetrakis Methylmethane tris-β-aziridine propionic acid, toluene-2,4-bis(1-aziridine carboxamide), melamine, bisisophthaloyl-1-(2-methyl nitrogen ring) Propane), tri-1-(2-methylaziridine) phosphine, trimethylolpropane tri-β-(2-methyl aziridine) propionate and the like.

金屬鉗合物類架橋劑中,金屬原子有鋁、鋯、鈦、鋅、鐵、錫等鉗合物化合物,該等中由於鋁鉗合物化合物的性能佳,故較為理想。作為鋁鉗合物化合物,可舉例:二異丙氧基鋁單油乙醯乙酸酯、單異丙氧基鋁雙油乙醯乙酸酯、單異丙 氧基鋁單油酸鹽單油酸鹽乙醯乙酸酯、二異丙氧基鋁單月桂基乙醯乙酸酯、二異丙氧基鋁單硬脂醯乙醯乙酸酯、二異丙氧基鋁單異硬脂乙醯乙酸酯等。 Among the metal clamp type bridging agents, the metal atoms include aluminum, zirconium, titanium, zinc, iron, tin and other clamp compounds. Among them, the aluminum clamp compound compounds are more desirable because of their good performance. As the aluminum clamp compound, for example: aluminum diisopropoxide mono-oil acetate, monoisopropoxide aluminum di-oil acetate, monoisopropyl Aluminum Oxide Monooleate Monooleate Acetate Acetate, Diisopropoxy Aluminum Monolauryl Acetate Acetate, Diisopropoxide Aluminum Monostearyl Acetate Acetate, Diiso Propoxy aluminum monoisostearyl acetate and so on.

黏接劑組成物在含有丙烯酸類聚合物的情況下,黏接劑組成物含有丙烯酸類聚合物以外的成分亦可。就這種材料而言,可舉能量線聚合性化合物為例。能量線聚合性化合物係受紫外線、電子束等能量線照射聚合而成的化合物,此能量線聚合性化合物可舉具有能量線聚合性基的低分子量化合物(單官能、多官能的單體以及寡聚物)為例,具體可舉例:三羥甲基丙烷三丙烯酸酯、四羥甲基甲烷四丙烯酸酯、新戊四醇三丙烯酸酯、季戊四醇單羥基戊基丙烯酸酯、季戊四醇己基丙烯酸酯,或1,4-丁烯乙二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、二環戊二烯二甲氧基二丙烯酸酯、丙烯酸異莰基酯等含有環狀脂肪族骨架的丙烯酸酯;聚乙烯乙二醇二丙烯酸酯、低聚酯丙烯酸酯、胺甲酸乙酯丙烯酸酯寡聚物、環氧樹脂變性丙烯酸酯、聚醚丙烯酸酯等丙烯酸酯類化合物。這種化合物的分子內至少具有1個聚合性雙鍵,通常分子量係100~30000,較佳係300~10000左右。黏接劑組成物係丙烯酸類的黏接劑,含有含能量線聚合性基的丙烯酸類聚合物之情況下,即使黏接劑組成物不含具有能量線聚合性基的低分子量化合物,或僅含有少量,藉由對黏接劑層照射能量線,仍可使對於黏附體的黏接性低落。黏接劑組成物中之具有能量線聚合性基的低分子量化合物之含有量很大的情況下,會有頂取性低落的傾向,因此,黏接劑組成物係丙烯酸類黏接劑,藉由含有含能量線聚合性基的 丙烯酸類聚合物,可使具有能量線聚合性基的低分子量化合物之使用量減少,而得以更加提升頂取性。黏接劑組成物係丙烯酸類的黏接劑的情況下,黏接劑組成物相對於丙烯酸類聚合物100質量份,含有能量線聚合性化合物0~30質量份較佳,含有0~15質量份更佳,含有0~10質量份特佳。 When the adhesive composition contains an acrylic polymer, the adhesive composition may contain components other than the acrylic polymer. As for this material, an energy-ray polymerizable compound can be cited as an example. Energy-ray polymerizable compounds are compounds that are polymerized by irradiation with energy rays such as ultraviolet rays and electron beams. Examples of the energy-ray polymerizable compounds include low-molecular-weight compounds having energy-ray polymerizable groups (monofunctional, polyfunctional monomers and oligofunctional monomers). Polymer) as an example, specific examples can be: trimethylolpropane triacrylate, tetramethylolmethane tetraacrylate, neopentaerythritol triacrylate, pentaerythritol monohydroxypentyl acrylate, pentaerythritol hexyl acrylate, or 1,4-Butene glycol diacrylate, 1,6-hexanediol diacrylate, dicyclopentadiene dimethoxy diacrylate, isobornyl acrylate, etc. containing cycloaliphatic skeleton Acrylate; acrylate compounds such as polyethylene glycol diacrylate, oligoester acrylate, urethane acrylate oligomer, epoxy resin denatured acrylate, and polyether acrylate. This compound has at least one polymerizable double bond in the molecule, and the molecular weight is usually about 100 to 30,000, preferably about 300 to 10,000. The adhesive composition is an acrylic adhesive. When it contains an energy-ray polymerizable group-containing acrylic polymer, even if the adhesive composition does not contain low-molecular-weight compounds with energy-ray polymerizable groups, or only Containing a small amount, by irradiating the adhesive layer with energy rays, the adhesiveness to the adherend can still be reduced. When the content of low molecular weight compounds with energy-beam polymerizable groups in the adhesive composition is large, the receptivity tends to decrease. Therefore, the adhesive composition is an acrylic adhesive. Contains polymerizable groups containing energy rays Acrylic polymers can reduce the amount of low-molecular-weight compounds with energy-ray polymerizable groups, and can further improve the ejectability. When the adhesive composition is an acrylic adhesive, the adhesive composition preferably contains 0 to 30 parts by mass of the energy ray polymerizable compound, and 0 to 15 parts by mass relative to 100 parts by mass of the acrylic polymer. It is better to contain 0-10 parts by mass.

黏接劑組成物含有含能量線聚合性基的丙烯酸類聚合物,或含能量線聚合性化合物的情況下,亦含有光聚合起始劑為佳,作為光聚合起始劑,可舉例:安息香化合物、苯乙酮化合物、醯基膦氧化物化合物、二茂鈦化合物、噻吨酮化合物、過氧化物化合物等光起始劑;亦可舉胺和醌等光敏劑為例,具體而言,可舉例:1-羥基環己基苯基酮、安息香、安息香甲基酯、安息香乙醚、安息香異丙醚、苄基二苯硫醚、四甲基秋蘭姆單硫化物、偶氮雙異丁腈、二苄基、二乙醯基、β-氯蒽醌、2,4,6-三甲基苯甲醯基-二苯-膦氧化物等。藉由使其含有光聚合起始劑,利用紫外線作為能量線的情況下,即可以少量的照射時間、照射量進行。 When the adhesive composition contains an energy-ray polymerizable group-containing acrylic polymer, or an energy-ray polymerizable compound, it preferably also contains a photopolymerization initiator. As the photopolymerization initiator, benzoin Compounds, acetophenone compounds, phosphine oxide compounds, titanocene compounds, thioxanthone compounds, peroxide compounds and other photoinitiators; photosensitizers such as amines and quinones can also be cited as examples. Specifically, Examples can be: 1-hydroxycyclohexyl phenyl ketone, benzoin, benzoin methyl ester, benzoin ethyl ether, benzoin isopropyl ether, benzyl diphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile , Dibenzyl, diacetyl, β-chloroanthraquinone, 2,4,6-trimethylbenzyl-diphenyl-phosphine oxide, etc. By containing a photopolymerization initiator, when ultraviolet rays are used as energy rays, it can be performed with a small amount of irradiation time and irradiation amount.

作為用於使能量線聚合性基以及能量線聚合性化合物反應的能量線,可舉例:游離輻射、即X射線、紫外線、電子束等。該等中又以相對來說較容易準備照射設備的紫外線為佳。 Examples of the energy ray for reacting the energy ray polymerizable group and the energy ray polymerizable compound include ionizing radiation, that is, X-rays, ultraviolet rays, electron beams, and the like. Among them, it is relatively easy to prepare ultraviolet rays for irradiating equipment.

作為游離輻射,利用紫外線的情況下,從處理容易性方面來說,利用包含波長200~380nm左右的紫外線之近紫外線即可。就紫外線的光量而言,根據包含於黏接劑層的能量線聚合性基、能量線聚合性化合物之種類,以及黏接劑層的 厚度適當地選擇即可,通常係50~500mJ/cm2左右,較佳係100~450mJ/cm2,更佳係150~400mJ/cm2。此外,紫外線的照度通常係50~500mW/cm2左右,較佳係100~450mW/cm2,更佳係150~400mW/cm2。紫外線源並無特別限制,例如可利用高壓汞燈、金屬鹵素燈等。 In the case of using ultraviolet rays as ionizing radiation, in terms of ease of handling, it is sufficient to use near ultraviolet rays including ultraviolet rays having a wavelength of about 200 to 380 nm. The amount of ultraviolet light can be appropriately selected according to the type of energy ray polymerizable group contained in the adhesive layer, the type of energy ray polymerizable compound, and the thickness of the adhesive layer, usually 50~500mJ/cm 2 Around, preferably 100~450mJ/cm 2 , more preferably 150~400mJ/cm 2 . Further, an ultraviolet line illumination generally 50 ~ 500mW / cm 2 or so, preferably based 100 ~ 450mW / cm 2, more preferably based 150 ~ 400mW / cm 2. The ultraviolet source is not particularly limited, and for example, a high-pressure mercury lamp, a metal halide lamp, etc. can be used.

利用電子束作為游離輻射的情況下,對於加速電壓,根據包含於黏接劑層的能量線聚合性基、能量線聚合性化合物的種類,以及黏接劑層厚度適當地選擇即可,通常加速電壓係10~1000kV左右為佳。此外,照射線量只要設定在包含於黏接劑層的能量線聚合性基以及能量線聚合性化合物之反應可適當地進行的範圍內即可,通常選定於10~1000krad之範圍。電子束源並無特別限制,可舉例使用科克勞夫-沃吞型加速器(Cockcroft-Walton accelerator)、凡德格拉夫型加速器(Van de Graaff accelerator)、共振變壓器型加速器、絕緣芯變壓器型加速器,或直線型、高頻高壓(Dynamitron)型加速器、高頻率型加速器等各種電子束加速器。 In the case of using electron beam as ionizing radiation, the accelerating voltage can be appropriately selected according to the type of energy ray polymerizable group contained in the adhesive layer, the type of energy ray polymerizable compound, and the thickness of the adhesive layer. Generally, acceleration The voltage is around 10~1000kV. In addition, the irradiation dose may be set within a range in which the reaction of the energy-beam polymerizable group and the energy-beam polymerizable compound contained in the adhesive layer can proceed appropriately, and is usually selected in the range of 10 to 1000 krad. The electron beam source is not particularly limited, and examples of Cockcroft-Walton accelerators, Van de Graaff accelerators, resonance transformer accelerators, and insulated core transformer accelerators can be used. , Or various electron beam accelerators such as linear, high-frequency and high-voltage (Dynamitron) accelerators, and high-frequency accelerators.

(3)光學特性 (3) Optical characteristics

本發明之其一實施形態所涉及的黏接片於JIS K7136:2000(ISO 14782:1999)所規定的霧度,比起黏接劑層,將鄰近基材的面作為入射面時,係0.01%以上、10%以下為佳。透過該霧度係10%以下,便可有效地活用入射於黏接片的雷射光。從可更為穩定地有效活用入射於黏接片的雷射光的觀點來看,上述霧度係5%以下較佳,更佳係2.5%以下;從有效活用入射於黏接片的雷射光之觀點來看,上述霧度不設下限;而從 提高製造穩定性的觀點等來看,上述霧度係0.01%以上左右為佳。 The adhesive sheet according to an embodiment of the present invention has a haze specified in JIS K7136: 2000 (ISO 14782: 1999), when compared with the adhesive layer, when the surface adjacent to the substrate is used as the incident surface, it is 0.01 Above% and below 10% are better. Through the haze of 10% or less, the laser light incident on the adhesive sheet can be effectively utilized. From the viewpoint that the laser light incident on the adhesive sheet can be used more stably and effectively, the above-mentioned haze is preferably 5% or less, more preferably 2.5% or less; from the effective use of the laser light incident on the adhesive sheet From the point of view, the above haze does not set a lower limit; and from From the viewpoint of improving manufacturing stability, the above-mentioned haze is preferably about 0.01% or more.

本發明之其一實施形態所涉及的黏接片於JIS K7375:2000所規定的全光線透過率,比起黏接劑層,將鄰近基材的面作為入射面時,係85%以上為佳。透過該全光線透過率係85%以上,便可有效地活用入射於黏接片的雷射光。從有效活用入射於黏接片的雷射光之觀點來看,上述全光線透過率係90%以上為佳;從有效活用入射於黏接片的雷射光之觀點來看,上述全光線透過率不設上限;而從提高製造穩定性的觀點等來看,上述全光線透過率係99.99%以下左右為佳。 The adhesive sheet according to one embodiment of the present invention has a total light transmittance specified in JIS K7375:2000. Compared to the adhesive layer, when the surface adjacent to the substrate is used as the incident surface, it is preferably 85% or more . Through the total light transmittance of 85% or more, the laser light incident on the adhesive sheet can be effectively utilized. From the viewpoint of effectively using the laser light incident on the adhesive sheet, the above-mentioned total light transmittance is preferably 90% or more; from the viewpoint of effectively using the laser light incident on the adhesive sheet, the above-mentioned total light transmittance is not The upper limit is set; and from the viewpoint of improving manufacturing stability, etc., the above-mentioned total light transmittance is preferably about 99.99% or less.

(4)附加層 (4) Additional layer

本發明之其一實施形態所涉及的黏接片,黏接劑層側的面上形成附加層,黏接片使用時黏接片的黏附體之板狀組件亦可黏貼上述的附加層。附加層的構成並無限制,附加層的具體例子可舉附加層具有保護膜形成薄膜的情況,或附加層具有晶粒結著層的情況。 In the adhesive sheet according to one embodiment of the present invention, an additional layer is formed on the surface of the adhesive layer side. When the adhesive sheet is used, the plate-shaped component of the adhesive body of the adhesive sheet can also be pasted with the above-mentioned additional layer. The configuration of the additional layer is not limited, and specific examples of the additional layer include a case where the additional layer has a protective film to form a thin film, or a case where the additional layer has a crystal grain bonding layer.

保護膜形成薄膜會透過熱等外部能量硬化,以可形成保護膜的材料構成。保護膜形成薄膜或保護膜,該分割體附著於板狀組件個片化而形成的晶片狀組件的狀態下從黏接劑層分離。因此,附加層係保護膜形成薄膜的情況下,可獲得於晶片狀組件的一邊面上積層保護膜形成薄膜或保護膜的分割體所形成的加工物。 The protective film forming film is cured by external energy such as heat, and is made of a material that can form a protective film. The protective film forms a thin film or a protective film, and the divided body is separated from the adhesive layer in a state where the divided body is attached to a wafer-shaped module formed by dividing the plate-shaped module into pieces. Therefore, when the additional layer-based protective film is formed into a thin film, a processed product formed by laminating a protective film to form a thin film or a divided body of the protective film on one side of the wafer-like component can be obtained.

附加層係晶粒結著層的情況下,板狀組件個片化而形成的晶片狀組件上附著晶粒結著層的分割體的狀態下從 黏接劑層分離。因此,附加層係晶粒結著層的情況下,可獲得晶片狀組件的一邊面上積層晶粒結著層的分割體所形成的加工物。 In the case of an additional layer-based crystal grain bonding layer, the wafer-shaped component formed by slicing the plate-shaped component into pieces is attached to the divided body of the crystal grain bonding layer from The adhesive layer is separated. Therefore, in the case of the additional layer-based crystal grain bonding layer, a processed product formed by laminating a divided body of the crystal grain bonding layer on one side surface of the wafer-like component can be obtained.

(5)剝離片 (5) Peeling sheet

本發明之其一實施形態所涉及的黏接片,至黏接劑層或附加層黏貼於黏附體之板狀組件時為止這段時間之內,以保護黏接劑層或附加層為目的,亦可於比黏接片的基材更鄰近黏接劑層的面,具體來說,於黏接劑層的面或者附加層的面上貼合剝離片的剝離面。剝離片的構成無限制,舉例來說,可於塑膠薄膜上塗佈剝離劑。塑膠薄膜的具體例子可舉:聚對酞酸乙二酯、聚(對酞酸丁二酯)、聚萘二甲酸乙二酯等聚酯薄膜,以及聚丙烯或聚乙烯等聚烯烴薄膜。就剝離劑而言,雖可舉例聚矽氧類、氟類、長鏈烷類等,該等又以價格低廉且可獲得穩定性能的聚矽氧類為佳。上述剝離片亦可不使用塑膠薄膜,改用玻璃紙、塗被紙、道林紙等紙基材,或使用於紙基材上積層聚乙烯等熱塑性樹脂的積層紙。對於該剝離片的厚度雖無特別限制,通常係20μm以上、250μm以下左右。 The adhesive sheet according to one embodiment of the present invention has the purpose of protecting the adhesive layer or additional layer during the period of time until the adhesive layer or additional layer is attached to the plate-shaped component of the adherend. It is also possible to attach the release surface of the release sheet to the surface of the adhesive layer closer to the substrate of the adhesive sheet, specifically, to the surface of the adhesive layer or the surface of the additional layer. The composition of the release sheet is not limited, for example, a release agent can be coated on the plastic film. Specific examples of the plastic film include polyester films such as polyethylene terephthalate, poly(butylene terephthalate), and polyethylene naphthalate, and polyolefin films such as polypropylene or polyethylene. As for the release agent, although polysiloxanes, fluorines, long-chain alkanes, etc. can be exemplified, these are preferably low-priced and stable polysiloxanes. The above-mentioned release sheet can also be used instead of a plastic film, and a paper substrate such as cellophane, coated paper, or forest paper, or a laminated paper in which a thermoplastic resin such as polyethylene is laminated on the paper substrate. Although the thickness of the release sheet is not particularly limited, it is usually about 20 μm or more and 250 μm or less.

2.加工物之製造方法 2. Manufacturing method of processed objects

藉由利用上述的本發明之其一實施形態所涉及的黏接片,便可如以下說明於板狀組件上製造加工物。 By using the adhesive sheet according to one of the embodiments of the present invention described above, a processed product can be manufactured on a plate-shaped component as described below.

(1)黏貼製程 (1) Pasting process

首先,於上述的本發明之其一實施形態所涉及的黏接片之比基材更鄰近黏接劑層的面,具體來說係黏接劑層的面或附加層的面,黏貼於包含板狀組件的黏附體之一邊面上,獲得具有 黏接片以及板狀組件的第1積層體。板狀組件並無限制,例如:聚矽氧晶圓等半導體晶圓、具有TSV所涉及的構造的積層體等。板狀組件的厚度亦無限制,例如:數十μm~數百μm之範圍。 First, in the adhesive sheet according to one embodiment of the present invention described above, the surface of the adhesive layer that is closer to the substrate than the substrate, specifically the surface of the adhesive layer or the surface of the additional layer, is attached to the surface containing On one side of the adherent body of the plate-like component, it is obtained with Adhesive sheet and the first laminate of plate-shaped components. There are no restrictions on plate-shaped components, such as semiconductor wafers such as polysilicon wafers, and laminates with structures related to TSVs. The thickness of the plate-shaped component is also unlimited, for example, in the range of tens of μm to hundreds of μm.

第1積層體亦可具有附加層,作為附加層,可舉例:於保護膜形成薄膜、保護膜形成薄膜上形成的保護膜、晶粒結著層等。附加層作為黏接片的一部份,可黏貼於板狀組件,亦可於板狀組件的一邊面上事先積層附加層。在後者的情況下,附加層的板狀組件相對面之反面作為包含板狀組件之黏附體的一邊面,成為黏接片黏貼的面。 The first layered body may have an additional layer, and examples of the additional layer include: a protective film formed on a protective film forming film, a protective film forming film, a crystal grain bonding layer, and the like. The additional layer, as a part of the adhesive sheet, can be pasted on the plate-shaped component, or an additional layer can be laminated on one side of the plate-shaped component in advance. In the latter case, the opposite side of the opposing surface of the plate-shaped component of the additional layer serves as the side surface of the adherend containing the plate-shaped component, and becomes the surface on which the adhesive sheet is adhered.

(2)分割製程 (2) Segmentation process

藉由延展具有第1積層體的基材,分割黏接片上的板狀組件,獲得將具有板狀組件的分割體之多個晶片配置於黏接片上而形成的第2積層體。第1積層體具有附加層的情況下,藉由延展基材附加層亦被分割。完成分割製程後,對於基材的延展程度較大的部分,透過加熱等方法使其收縮,亦可解決對於黏接片過度的鬆弛的發生。 By spreading the base material with the first laminate and dividing the plate-shaped components on the adhesive sheet, a second laminate formed by arranging a plurality of wafers of the divided bodies of the plate-shaped components on the adhesive sheet is obtained. When the first laminate has an additional layer, the additional layer is also divided by stretching the base material. After the dividing process is completed, the part of the substrate with a greater degree of extension can be shrunk by heating or other methods, which can also solve the occurrence of excessive relaxation of the adhesive sheet.

(3)改質部形成製程 (3) Formation process of reforming part

至上述分割製程開始為止,照射雷射光聚焦於板狀組件的內部所設定的焦點,於板狀組件的內部形成改質部。此雷射光的波長以及照射方法,根據板狀組件的組成、厚度等構造適當地設定。上述黏貼製程完成後,進行改質部形成製程的情況下,雷射光之對於板狀組件之照射亦可透過黏接片形成。即使在那樣的情況下,由於本發明之其一實施形態所涉及的黏接片 在平面視仍很難產生瑕疵,雷射光的照射之程度於瑕疵以及該鄰近之處產生變動,導致板狀組件內的改質部局部變得不適當的問題也難發生。與此相同,板狀組件內改質物若形成局部不適當,上述分割製程中,便有板狀組件的分割無法適當進行的疑慮。若板狀組件的分割無法適當地進行,則加工物品質降低的可能性便會提高。 Until the start of the above-mentioned dividing process, the irradiated laser light is focused on the focal point set inside the plate-shaped component, and a modified part is formed in the inside of the plate-shaped component. The wavelength of the laser light and the irradiation method are appropriately set according to the composition and thickness of the plate-shaped component. After the above-mentioned pasting process is completed, in the case of performing the reforming part forming process, the laser light can also be irradiated to the plate-shaped component through the bonding sheet. Even in such a case, the adhesive sheet according to one embodiment of the present invention It is still difficult to produce flaws in a plane view, and the degree of laser light irradiation changes in the flaws and the vicinity, and the problem that the modified part in the plate-shaped component becomes partially inappropriate is also difficult to occur. Similarly, if the modification of the plate-shaped component is partially formed inappropriately, in the above-mentioned dividing process, there is a doubt that the plate-shaped component cannot be properly divided. If the division of the plate-shaped component cannot be performed properly, the possibility of a reduction in the quality of the processed product will increase.

(4)頂取製程 (4) Topping process

藉由將第2積層體的多個晶片個別自黏接片分離,可獲得作為加工物的晶片。分離方法並無限制,通常黏接片的晶片相對面之反面上,以針(Pin)等上頂,藉由局部地使黏接片變形,使對於預計分離的晶片之黏接劑層的黏接性降低。接著,使用真空筒夾(Collet)等,將預計分離的晶片從黏接片摘除,使晶片自黏接片分離。此情況下,上頂針時或從真空筒夾往上拉取晶片時,會於晶片上施予欲摘除黏接劑層的力量,晶片很薄或具有TSV所涉及的構造的情況下,進行此摘除步驟時,晶片上恐有產生龜裂之疑慮。但由於本發明之其一實施形態所涉及的黏接片已適當地控制黏接劑層的厚度,此摘除步驟進行時,適當地降低了晶片裂開的可能性,即,本發明之其一實施形態所涉及的黏接片的頂取性十分優秀。 By separating the plurality of wafers of the second laminate from the adhesive sheet individually, a wafer as a processed product can be obtained. The separation method is not limited. Usually, the opposite side of the chip of the bonding sheet is topped with a pin, etc., by locally deforming the bonding sheet, the bonding of the bonding agent layer of the chip that is expected to be separated Reduced connectivity. Then, using a vacuum collet (Collet) or the like, the wafer that is expected to be separated is removed from the adhesive sheet to separate the wafer from the adhesive sheet. In this case, when the ejector pin is pulled up or the chip is pulled up from the vacuum collet, the force to remove the adhesive layer will be applied to the chip. This is done when the chip is thin or has the structure involved in TSV. During the removal step, there may be concerns about cracks on the chip. However, since the adhesive sheet according to one embodiment of the present invention has appropriately controlled the thickness of the adhesive layer, when this removal step is performed, the possibility of chip cracking is appropriately reduced, that is, one of the present inventions. The repellency of the adhesive sheet according to the embodiment is very excellent.

第1積層體具有附加層的情況下,透過此頂取製程,從黏接片分離的晶片具有板狀組件的分割體以及此板狀組件的分割體之黏接片鄰近的面上形成的附加層之分割體。即,頂取製程中,黏接劑層和附加層的分割體之間產生剝離,加工物自黏接片分離。 In the case where the first laminate has an additional layer, the wafer separated from the adhesive sheet through this pick-up process has a split body of the plate-shaped component and the additional layer formed on the adjacent surface of the adhesive sheet of the split body of the plate-shaped component The division of the layer. That is, during the pick-up process, peeling occurs between the adhesive layer and the split body of the additional layer, and the processed product is separated from the adhesive sheet.

賦予附加層的分割體之附加層係保護膜的情況下,保護膜於保護膜形成薄膜上形成的時間點並無限制。第1積層體之附加層係保護膜形成薄膜、至分離製程開始為止,亦可進行於保護膜形成薄膜形成保護膜之作業。附加層的賦予分割體之附加層係保護膜形成薄膜,亦可於加工物所具有的保護膜形成薄膜之分割體上形成保護膜。 In the case of the additional layer-based protective film of the divided body provided with the additional layer, the time when the protective film is formed on the protective film forming film is not limited. The protective film formation of the additional layer of the first laminate can also be performed until the separation process starts. The additional layer-based protective film forming film of the additional layer imparted to the divided body, and the protective film may be formed on the divided body of the protective film forming film possessed by the processed object.

以上說明的實施形態,係為了便於理解本發明而記載,當不能以此限定本發明實施之範圍,因此,屬於上述實施形態中記載的各元素之技術性範圍內的所有設計變更或均等物,皆應仍屬本發明專利涵蓋之範圍內。 The above-described embodiments are described to facilitate the understanding of the present invention and should not limit the scope of the present invention. Therefore, they belong to all design changes or equivalents within the technical scope of each element described in the above-mentioned embodiments. All should still fall within the scope of the invention patent.

(實施例) (Example)

以下,透過實施例等進一步對本發明進行具體說明,但本發明的範圍並不受這些實施例等限制。 Hereinafter, the present invention will be further specifically described through examples and the like, but the scope of the present invention is not limited by these examples and the like.

〔實施例1〕 [Example 1]

(1)基材之製作 (1) Production of base material

使用小型T字擠出機(Toyo Seiki Seisaku-sho,Ltd.製,「Laboplastomill.」),利用以隨機共聚聚丙烯樹脂形成的樹脂組成物擠出成形,製作一邊面(相當於黏接劑加工面)的算數表面粗糙度Ra係0.03μm,另一邊面(相當於雷射入射面)的算數表面粗糙度Ra係0.03μm之薄膜,以此作為基材。此外,基材的表面粗糙度利用表面粗糙度測量機(Mitutoyo Corporation製,「SV-3000」)測量。 Using a small T-shaped extruder (manufactured by Toyo Seiki Seisaku-sho, Ltd., "Laboplastomill."), a resin composition formed of random copolymer polypropylene resin is used for extrusion molding to produce one side (equivalent to adhesive processing) A thin film with arithmetic surface roughness Ra of 0.03 μm on the surface) and 0.03 μm on the arithmetic surface roughness Ra of the other side (corresponding to the laser incident surface) is used as a substrate. In addition, the surface roughness of the base material was measured with a surface roughness measuring machine (manufactured by Mitutoyo Corporation, "SV-3000").

(2)黏接劑組成物之調製 (2) Preparation of adhesive composition

將62質量份的丙烯酸丁酯和10質量份的甲基丙烯酸甲 酯,以及28質量份的2-羥基乙基丙烯酸酯(HEA)共聚合,於獲得的共聚物(玻璃轉換溫度Tg-34℃),將甲基丙烯醯氧乙基異氰酸酯(MOI)對於共聚物的HEA,使其反應80mol%,獲得具有能量線聚合性基的丙烯酸類聚合物(重量平均分子量50萬)。 Combine 62 parts by mass of butyl acrylate and 10 parts by mass of methyl methacrylate Ester, and 28 parts by mass of 2-hydroxyethyl acrylate (HEA) were copolymerized. In the obtained copolymer (glass transition temperature Tg-34°C), methacryloxyethyl isocyanate (MOI) was added to the copolymer 80 mol% of HEA was reacted to obtain an acrylic polymer (weight average molecular weight 500,000) with energy-ray polymerizable groups.

相對於上述丙烯酸類聚合物100質量份,將光聚合起始劑(BASF公司製,「Iragacure 184」、濃度:100%)3.0質量份、異氰酸鹽化合物(Toyo Ink Co.,Ltd.製,「BHS-8515」)1.0質量份混合後,獲得以溶劑稀釋而成黏接劑組成物。 With respect to 100 parts by mass of the acrylic polymer, 3.0 parts by mass of a photopolymerization initiator (manufactured by BASF, "Iragacure 184", concentration: 100%), and an isocyanate compound (manufactured by Toyo Ink Co., Ltd.) , "BHS-8515") 1.0 parts by mass are mixed and then diluted with a solvent to obtain an adhesive composition.

(3)黏接片之製作 (3) Making of bonding sheet

於剝離片的剝離面上塗佈上述黏接劑組成物,藉由將獲得的塗膜使每個剝離片在80℃的環境中經過1分鐘,獲得以剝離片和黏接劑層(測量的厚度係10μm)所形成的積層體。 The above-mentioned adhesive composition was coated on the release surface of the release sheet, and each release sheet was subjected to 1 minute in an environment of 80°C by applying the obtained coating film to obtain a release sheet and an adhesive layer (measured The thickness is 10μm).

於前面所述之基材的黏接劑加工面黏貼上述積層體的黏接劑層側的面,在黏接劑層側的面上剝離片積層更多的狀態中獲得以基材和黏接劑層形成的黏接片。 Paste the adhesive layer side surface of the laminate on the adhesive processing surface of the aforementioned substrate, and peel off the laminate on the adhesive layer side surface to obtain the substrate and the adhesive layer. Adhesive sheet formed by the agent layer.

〔實施例2〕 [Example 2]

除了黏接劑層的厚度設為5μm以外,其餘皆與實施例1一致,於黏接劑層側的面上積層剝離片的狀態下獲得黏接片。 Except that the thickness of the adhesive layer was set to 5 μm, everything else was the same as in Example 1. The adhesive sheet was obtained with the release sheet laminated on the surface on the adhesive layer side.

〔實施例3〕 [Example 3]

除了下列的變更內容以外,其餘皆與實施例1一致,於黏接劑層側的面上積層剝離片的狀態下獲得黏接片。 Except for the following changes, the rest is the same as in Example 1, and the adhesive sheet is obtained in the state where the release sheet is laminated on the surface of the adhesive layer side.

(變更內容):變更基材的成形條件,基材的黏接劑加工面之算數表面粗糙度Ra設為0.16μm、雷射入射面之算數表面粗 糙度Ra設為0.03μm。 (Content of change): Change the molding conditions of the substrate, set the arithmetic surface roughness Ra of the adhesive processing surface of the substrate to 0.16μm, and set the arithmetic surface roughness of the laser incident surface The roughness Ra was set to 0.03 μm.

〔比較例1〕 [Comparative Example 1]

除了黏接劑層的厚度設為15μm以外,其餘皆與實施例3一致,於黏接劑層面上積層剝離片的狀態下獲得黏接片。 Except that the thickness of the adhesive layer was set to 15 μm, everything else was the same as in Example 3. The adhesive sheet was obtained with the release sheet laminated on the adhesive layer.

〔比較例2〕 [Comparative Example 2]

除了以下變更內容1與2以外,其餘皆與實施例1一致,於黏接劑層側的面上積層剝離片的狀態下獲得黏接片。 Except for the following changes 1 and 2, the rest is the same as in Example 1, and the adhesive sheet is obtained in the state where the release sheet is laminated on the surface of the adhesive layer side.

(變更內容1):變更基材的成形條件,基材的黏接劑加工面之算數表面粗糙度Ra設為1.3μm,雷射入射面之算數表面粗糙度Ra設為0.04μm。 (Modification 1): The molding conditions of the substrate were changed, the arithmetic surface roughness Ra of the adhesive processing surface of the substrate was set to 1.3μm, and the arithmetic surface roughness Ra of the laser incident surface was set to 0.04μm.

(變更內容2):黏接劑層的厚度設為15μm。 (Change content 2): The thickness of the adhesive layer is set to 15 μm.

〔比較例3〕 [Comparative Example 3]

除了黏接劑層的厚度設為10μm以外,其餘皆與比較例2一致,於黏接劑層側的面上積層剝離片的狀態下獲得黏接片。 Except that the thickness of the adhesive layer was set to 10 μm, everything else was the same as in Comparative Example 2. The adhesive sheet was obtained in a state where the release sheet was laminated on the surface of the adhesive layer side.

〔比較例4〕 [Comparative Example 4]

除了以下變更內容以外,其餘皆與實施例1一致,於黏接劑層側的面上積層剝離片的狀態下獲得黏接片。 Except for the following changes, everything else was the same as in Example 1, and the adhesive sheet was obtained in a state where the release sheet was laminated on the surface on the adhesive layer side.

(變更內容):變更基材的成形條件,基材的黏接劑加工面之算數表面粗糙度Ra設為0.04μm,雷射入射面之算數表面粗糙度Ra設為1.3μm。 (Content of change): Change the molding conditions of the substrate, the arithmetic surface roughness Ra of the adhesive processing surface of the substrate is set to 0.04μm, and the arithmetic surface roughness Ra of the laser incident surface is set to 1.3μm.

〔測試例1〕<霧度之測量> [Test Example 1] <Measurement of Haze>

透過實施例以及比較例所製造的黏接片中,摘除剝離片後裁切為適當的大小,所獲得的測試片之霧度以JIS K7136:2000為基準,利用HAZE METER(Nippon Denshoku Industries Co., Ltd.製,「NDH-5000」)測量,測量光入射於黏接片的基材側的面,結果如表1所示。 In the adhesive sheets manufactured in the examples and comparative examples, the release sheet was removed and cut to an appropriate size. The haze of the obtained test sheet was based on JIS K7136: 2000, using HAZE METER (Nippon Denshoku Industries Co. , Ltd., "NDH-5000"). The measurement light was incident on the substrate side surface of the adhesive sheet. The results are shown in Table 1.

〔測試例2〕<瑕疵之觀察> [Test Example 2] <Observation of Defects>

透過實施例以及比較例所製造的黏接片中,摘除剝離片後,將各黏接片的黏接劑層側的面之任意的100mm×100mm範圍作為觀察範圍,對於各個該等觀察範圍,利用光學顯微鏡觀察,根據瑕疵的存在程度,以下列基準評價,結果如表1所示。 In the adhesive sheets manufactured through the examples and comparative examples, after the release sheet was removed, an arbitrary range of 100mm×100mm on the adhesive layer side surface of each adhesive sheet was used as the observation range, and for each of these observation ranges, Observed with an optical microscope, according to the degree of flaws, the following criteria were evaluated. The results are shown in Table 1.

A:觀察範圍內沒有發現瑕疵。 A: No flaws are found in the observation range.

B:觀察範圍內發現5個以下的瑕疵。 B: Five or less defects are found in the observation range.

C:觀察範圍內發現6個以下的瑕疵。 C: Six or less defects are found in the observation range.

〔測試例3〕<頂取性評價> [Test Example 3] <Rejectability Evaluation>

將透過實施例以及比較例所製造的黏接片,於平面視裁切成圓形,摘除剝離片後,於聚矽氧晶圓(厚度:100μm)以及環狀框架(Ring frame)黏貼黏接片的黏接劑層面。 The adhesive sheets manufactured through the examples and comparative examples were cut into a circular shape in plan view, and after removing the peeling sheet, they were pasted on a polysilicon wafer (thickness: 100μm) and a ring frame (Ring frame). The adhesive layer of the film.

利用雷射照射儀器,於聚矽氧晶圓的黏接劑層相對的面上,往黏接片之間,以光線集中的雷射沿著設定的裁切預定線掃描並照射,使晶圓內部形成8mm×8mm的晶片。所有裁切預定線照射雷射後,利用延展儀器,以速度10mm/秒鐘拉拔10mm黏接片,使黏接片的黏接劑層側的面之聚矽氧晶圓黏貼的區塊往主面內外方向延展。 Using a laser irradiation instrument, on the opposite side of the adhesive layer of the polysilicon wafer, scan and irradiate the wafer with a concentrated laser along the predetermined cutting line between the adhesive sheets. An 8mm×8mm wafer is formed inside. After all the cutting lines are irradiated with the laser, use the stretching device to pull the 10mm adhesive sheet at a speed of 10mm/sec. Extend in and out of the main surface.

在此狀態下,根據以下條件對黏接片照射紫外線。 In this state, irradiate the adhesive sheet with ultraviolet rays under the following conditions.

照度:220mW/cm2 Illumination: 220mW/cm 2

光量:190mJ/cm2 Light quantity: 190mJ/cm 2

接著以Aikoh Engineeering Co.,Ltd.製,Push Pull Guage(上頂的夾具:1個(Pin))測量頂取時的荷重。測量上頂時所需荷重,根據此測量值,按以下基準評價頂取性,結果如表1所示。 Then made by Aikoh Engineeering Co., Ltd., Push Pull Guage (fixture on top: 1 (Pin)) measures the load during jacking. Measure the load required for topping. According to this measured value, the liftability is evaluated according to the following criteria. The results are shown in Table 1.

A:1.7N以下 A: Below 1.7N

B:比1.7N大 B: larger than 1.7N

Figure 104140062-A0202-12-0026-1
Figure 104140062-A0202-12-0026-1

從表1可得知,滿足本發明的條件之實施例的黏接片,霧度低、難以產生瑕疵,且頂取性優越,係理想的雷射切割片。 It can be seen from Table 1 that the adhesive sheet of the embodiment that satisfies the conditions of the present invention has low haze, is difficult to produce defects, and has excellent pick-up properties, and is an ideal laser dicing sheet.

(產業上之可利用性) (Industrial availability)

本發明所涉及的黏接片適合作為雷射切割片使用。 The adhesive sheet according to the present invention is suitable for use as a laser dicing sheet.

Claims (10)

一種加工物之製造方法,係使用具有基材和上述基材的一邊面備有的黏接劑層之黏接片的加工物之製造方法,其特徵在於:上述基材對於上述一邊面以及上述一邊面之反面的兩邊面,於JIS B0601:2013(ISO 4287:1997)所規定的算數平均粗糙度Ra係0.01μm以上、0.2μm以下;上述基材含有聚烯烴類材料;上述基材的上述算數平均粗糙度Ra係0.01μm以上、0.12μm以下;上述黏接劑層由包含具有能量線聚合性基的丙烯酸類聚合物及能量線聚合性化合物中的至少一個的黏接劑組成物形成;上述黏接劑層的厚度係2μm以上、12μm以下;上述製造方法為將上述黏接片之比起上述基材,更鄰近上述黏接劑層的面黏貼於包含板狀組件的黏附體之一邊面,獲得具有上述黏接片以及上述板狀組件的第1積層體之黏貼製程;藉由將上述第1積層體的上述基材延展,分割上述黏接片上的上述板狀組件,獲得具有上述板狀組件的分割體之多個晶片配置於上述黏接片上形成的第2積層體之分割製程;以及將上述第2積層體的上述多個晶片分別從上述黏接片分離,將上述晶片作為加工物獲得的頂取製程; 至上述分割製程開始為止,照射雷射光使其聚焦於上述板狀組件的內部所設定的焦點,於上述板狀組件的內部形成改質部的改質部形成製程,並且於上述分割製程所提供的上述第1積層體,於上述黏接劑層和上述板狀組件之間具有附加層,於上述分割製程也分割上述附加層,於上述頂取製程,從上述黏接片分離的晶片具有上述板狀組件的分割體,以及該板狀組件的分割體之鄰近上述黏接片的面上形成的上述附加層之分割體。 A method of manufacturing a processed product using an adhesive sheet having a substrate and an adhesive layer provided on one side of the substrate, characterized in that: the substrate is opposite to the one side and the The arithmetic average roughness Ra specified in JIS B0601:2013 (ISO 4287:1997) is 0.01 μm or more and 0.2 μm or less; the above-mentioned base material contains polyolefin-based materials; the above-mentioned base material The arithmetic average roughness Ra is 0.01 μm or more and 0.12 μm or less; the adhesive layer is formed of an adhesive composition containing at least one of an acrylic polymer having an energy ray polymerizable group and an energy ray polymerizable compound; The thickness of the adhesive layer is 2 μm or more and 12 μm or less; the manufacturing method is that the adhesive sheet is adhered to one side of the adhesive body containing the plate-shaped component, which is closer to the surface of the adhesive layer than the substrate Surface, the bonding process of obtaining a first laminate having the adhesive sheet and the plate-shaped component; by extending the base material of the first laminate, dividing the plate-shaped component on the adhesive sheet to obtain the A process for arranging the plurality of wafers of the split body of the plate-shaped component on the second laminate formed on the bonding sheet; and separating the plurality of wafers of the second laminate from the bonding sheet, and using the wafer as The topping process of the processed product; Until the start of the dividing process, the laser light is irradiated to focus on the focal point set inside the plate-shaped component, and the reforming part forming process is formed in the plate-shaped component, and is provided in the dividing process The first laminate has an additional layer between the adhesive layer and the plate-shaped component, and the additional layer is also divided in the dividing process, and in the ejecting process, the wafer separated from the adhesive sheet has the The divided body of the plate-shaped component, and the divided body of the additional layer formed on the surface of the divided body of the plate-shaped component adjacent to the adhesive sheet. 根據申請專利範圍第1項所述之加工物之製造方法,上述黏接片於JIS K7136:2000(ISO 14782:1999)所規定的霧度,在將基材側作為入射側時,係0.01%以上、10%以下。 According to the manufacturing method of the processed product described in the first item of the patent application, the above-mentioned adhesive sheet has a haze specified in JIS K7136: 2000 (ISO 14782: 1999), when the substrate side is used as the incident side, it is 0.01% Above and below 10%. 根據申請專利範圍第1項所述之加工物之製造方法,上述黏接劑層含有丙烯酸類聚合物,上述丙烯酸類聚合物的玻璃轉換溫度Tg係-40℃以上、-10℃以下。 According to the method of manufacturing a processed product described in the first item of the scope of the patent application, the adhesive layer contains an acrylic polymer, and the glass transition temperature Tg of the acrylic polymer is -40°C or higher and -10°C or lower. 根據申請專利範圍第3項所述之加工物之製造方法,上述丙烯酸類聚合物包含源自甲基丙烯酸甲酯的構成單位,對於賦予上述丙烯酸類聚合物的單體整體之甲基丙烯酸甲酯質量比係5質量%以上、20質量%以下。 According to the manufacturing method of the processed product described in the third item of the scope of the patent application, the acrylic polymer contains a structural unit derived from methyl methacrylate, and the methyl methacrylate which is the entire monomer imparted to the acrylic polymer is The mass ratio is 5% by mass or more and 20% by mass or less. 根據申請專利範圍第3項所述之加工物之製造方法,上述丙烯酸類聚合物具有能量線聚合性基。 According to the method of manufacturing a processed product described in the third item of the scope of patent application, the acrylic polymer has an energy ray polymerizable group. 根據申請專利範圍第1項所述之加工物之製造方法,上述基材的上述算數平均粗糙度Ra係包含上述基材輥加壓而設定。 According to the method of manufacturing a processed product described in the first item of the scope of the patent application, the arithmetic average roughness Ra of the substrate is set including the substrate roll pressing. 根據申請專利範圍第6項所述之加工物之製造方法,上述 輥加壓中所使用的輥具有以金屬材料組成之表面。 According to the manufacturing method of processed objects described in item 6 of the scope of patent application, the above The roller used in the roller press has a surface composed of a metal material. 根據申請專利範圍第1項所述之加工物之製造方法,上述附加層具有保護層。 According to the manufacturing method of the processed object described in the first item of the scope of patent application, the above-mentioned additional layer has a protective layer. 根據申請專利範圍第8項所述之加工物之製造方法,至上述分割製程開始為止,包括由保護膜形成薄膜形成上述第1積層體的上述保護層的保護膜形成製程。 According to the manufacturing method of the processed article described in the scope of the patent application, the protective film forming process of forming the protective layer of the first laminate from a protective film forming thin film until the start of the dividing process is included. 根據申請專利範圍第1項所述之加工物之製造方法,上述附加層具有晶粒結著層。 According to the method of manufacturing a processed product described in the first item of the scope of patent application, the above-mentioned additional layer has a grain bonding layer.
TW104140062A 2014-12-02 2015-12-01 Manufacturing method of processed objects TWI738633B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-244009 2014-12-02
JP2014244009 2014-12-02

Publications (2)

Publication Number Publication Date
TW201629171A TW201629171A (en) 2016-08-16
TWI738633B true TWI738633B (en) 2021-09-11

Family

ID=56091621

Family Applications (3)

Application Number Title Priority Date Filing Date
TW108148058A TW202014490A (en) 2014-12-02 2015-12-01 Adhesive sheet, and method for manufacturing processed article
TW104140062A TWI738633B (en) 2014-12-02 2015-12-01 Manufacturing method of processed objects
TW110129890A TWI811763B (en) 2014-12-02 2015-12-01 Adhesive sheet and manufacturing method of processed product

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW108148058A TW202014490A (en) 2014-12-02 2015-12-01 Adhesive sheet, and method for manufacturing processed article

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW110129890A TWI811763B (en) 2014-12-02 2015-12-01 Adhesive sheet and manufacturing method of processed product

Country Status (6)

Country Link
JP (1) JP6731852B2 (en)
KR (1) KR102447759B1 (en)
CN (1) CN106795396B (en)
SG (1) SG11201704347YA (en)
TW (3) TW202014490A (en)
WO (1) WO2016088677A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102430472B1 (en) * 2014-12-25 2022-08-05 덴카 주식회사 Adhesive sheet for laser dicing and method for manufacturing semiconductor device
KR102447761B1 (en) * 2016-11-02 2022-09-27 린텍 가부시키가이샤 dicing sheet
WO2019008807A1 (en) * 2017-07-03 2019-01-10 リンテック株式会社 Adhesive sheet for stealth dicing, and production method for semiconductor device
JP7109918B2 (en) * 2017-12-28 2022-08-01 日東電工株式会社 Dicing tape integrated semiconductor back adhesion film
JP7296944B2 (en) * 2018-03-29 2023-06-23 リンテック株式会社 Work processing sheet
WO2019203021A1 (en) * 2018-04-18 2019-10-24 リンテック株式会社 Workpiece processing sheet
WO2020195744A1 (en) * 2019-03-27 2020-10-01 リンテック株式会社 Work processing sheet
KR102426261B1 (en) * 2019-09-26 2022-07-29 주식회사 엘지화학 Adhesive composition for dicing tape and dicing tape comprising the same
CN111693368A (en) * 2020-06-15 2020-09-22 苏州高泰电子技术股份有限公司 Test method for microscopic characterization performance of wafer cutting adhesive tape

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011139042A (en) * 2009-12-04 2011-07-14 Lintec Corp Adhesive sheet for stealth dicing and method of manufacturing semiconductor device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5124778B2 (en) 1971-12-22 1976-07-27
JP2005229040A (en) 2004-02-16 2005-08-25 Denki Kagaku Kogyo Kk Adhesive sheet for fixing semiconductor substrates
JP4712468B2 (en) * 2004-11-30 2011-06-29 古河電気工業株式会社 Dicing die bond tape
JP4762671B2 (en) * 2005-10-26 2011-08-31 古河電気工業株式会社 Dicing tape and semiconductor wafer dicing method
JP5019619B2 (en) * 2008-03-27 2012-09-05 古河電気工業株式会社 Wafer surface protection tape
JP5124778B2 (en) * 2008-09-18 2013-01-23 リンテック株式会社 Laser dicing sheet and semiconductor chip manufacturing method
JP2011040449A (en) * 2009-08-07 2011-02-24 Du Pont Mitsui Polychem Co Ltd Substrate for dicing tape, the dicing tape, and method for manufacturing semiconductor device
JP2012079936A (en) * 2010-10-01 2012-04-19 Nitto Denko Corp Dicing, die-bonding film and method for manufacturing semiconductor device
WO2012077471A1 (en) * 2010-12-06 2012-06-14 株式会社きもと Auxiliary sheet for laser dicing
JP6071712B2 (en) * 2013-04-05 2017-02-01 日東電工株式会社 Adhesive tape

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011139042A (en) * 2009-12-04 2011-07-14 Lintec Corp Adhesive sheet for stealth dicing and method of manufacturing semiconductor device

Also Published As

Publication number Publication date
SG11201704347YA (en) 2017-06-29
WO2016088677A1 (en) 2016-06-09
KR20170091578A (en) 2017-08-09
TW202144516A (en) 2021-12-01
CN106795396B (en) 2020-12-18
JP6731852B2 (en) 2020-07-29
TW202014490A (en) 2020-04-16
TW201629171A (en) 2016-08-16
TWI811763B (en) 2023-08-11
KR102447759B1 (en) 2022-09-27
CN106795396A (en) 2017-05-31
JPWO2016088677A1 (en) 2017-09-07

Similar Documents

Publication Publication Date Title
TWI738633B (en) Manufacturing method of processed objects
KR101215105B1 (en) An adhesive sheet for a stealth dicing and a production method of a semiconductor wafer device
TWI809120B (en) Adhesive tape for semiconductor processing and method for manufacturing semiconductor device
US20070036930A1 (en) Pressure-sensitive adhesive sheet, production method thereof and method of processing articles
CN104303271B (en) Dicing sheet
TWI657550B (en) Extensible sheet and method for manufacturing laminated wafer
CN105378899B (en) Cutting sheet
JP2020038985A (en) Adhesive tape for semiconductor processing and method for manufacturing semiconductor device
CN104508801B (en) The manufacture method of cutting sheet and device wafer
TWI642717B (en) Dicing film
TW202405113A (en) Adhesive sheet for temporary fixation of electronic parts
CN106104759A (en) Cut sheet and use the manufacturing method of chip of this cutting sheet
WO2024063126A1 (en) Element transfer sheet
TWI702271B (en) Cutting chip, cutting chip manufacturing method, and mold chip manufacturing method
WO2016017265A1 (en) Dicing sheet, method for manufacturing dicing sheet, and method for manufacturing molded chip
CN107408500B (en) Dicing sheet, method for manufacturing dicing sheet, and method for manufacturing die chip
CN102031072A (en) Pressure-sensitive adhesive sheet for retaining elements and method of producing elements
CN107236475B (en) Adhesive sheet for glass cutting and method for producing same
TWI791424B (en) Adhesive sheet for glass cutting and manufacturing method thereof
WO2025063125A1 (en) Adhesive sheet and method for handling object
WO2025063123A1 (en) Pressure-sensitive adhesive sheet and method of handling object
WO2025063124A1 (en) Adhesive sheet and method for handling object
TW202308850A (en) Protective film forming film, protective film forming composite sheet, manufacturing method of workpiece with protective film, and manufacturing method of processed object of workpiece with protective film for the damage/scratches on the surface of the protective film after thermal curing to become less noticeable
WO2023068088A1 (en) Base material which is used for adhesive sheet for processing semiconductor wafer having projected part