TWI722625B - Gold finger structure and manufacturing method thereof - Google Patents
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- TWI722625B TWI722625B TW108138818A TW108138818A TWI722625B TW I722625 B TWI722625 B TW I722625B TW 108138818 A TW108138818 A TW 108138818A TW 108138818 A TW108138818 A TW 108138818A TW I722625 B TWI722625 B TW I722625B
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- 239000010931 gold Substances 0.000 title claims abstract description 58
- 229910052737 gold Inorganic materials 0.000 title claims abstract description 58
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 46
- 239000002184 metal Substances 0.000 claims abstract description 72
- 229910052751 metal Inorganic materials 0.000 claims abstract description 72
- 238000005553 drilling Methods 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 20
- 238000007747 plating Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 abstract 4
- 238000005530 etching Methods 0.000 description 17
- 238000009713 electroplating Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
- -1 polyethylene Polymers 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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Abstract
Description
本發明涉及一種金手指及其製造方法,尤其涉及一種金手指結構及其製造方法。The invention relates to a gold finger and a manufacturing method thereof, in particular to a gold finger structure and a manufacturing method thereof.
於現有的金手指結構的製造方法中,是以蝕刻方式對現有的金手指結構的半成品進行修飾。然而,上述蝕刻方式實際上會產生諸多問題。例如,蝕刻方式所需的蝕刻藥液會對環境產生不小的汙染;以蝕刻方式的製程會花費較長的時間,進而造成生產效率低且生產成本高的問題;並且,現有的金手指結構的製造方法,於完成鍍金後難以再修改金手指的長度。 因此,如何提供一種低汙染、節省時間且可於鍍金後再修改金手指長度的金手指結構的製造方法,據以改善現有的金手指結構的製造方法的缺陷,已成為該項事業所欲解決的重要課題之一。In the existing manufacturing method of the gold finger structure, the semi-finished product of the existing gold finger structure is modified by etching. However, the above-mentioned etching method actually causes many problems. For example, the etching solution required by the etching method will cause considerable pollution to the environment; the etching method will take a long time, which will cause the problems of low production efficiency and high production cost; and, the existing gold finger structure It is difficult to modify the length of the gold finger after the gold plating is completed. Therefore, how to provide a low-pollution, time-saving, gold-finger structure manufacturing method that can modify the length of the gold-finger structure after gold plating, so as to improve the defects of the existing gold-finger structure manufacturing method, has become a solution for this business. One of the important topics.
於是,本發明人認為上述缺陷可改善,乃特潛心研究並配合科學原理的運用,終於提出一種設計合理且有效改善上述缺陷的本發明。Therefore, the inventor believes that the above-mentioned shortcomings can be improved, and with great concentration of research and the application of scientific principles, we finally propose an invention with reasonable design and effective improvement of the above-mentioned defects.
本發明實施例在於提供一種金手指結構及其製造方法,其能有效地改善現有的金手指結構及其製造方法所可能產生的缺陷。The embodiment of the present invention is to provide a gold finger structure and a manufacturing method thereof, which can effectively improve the defects that may occur in the existing gold finger structure and the manufacturing method thereof.
本發明實施例在於提供一種金手指結構的製造方法,包括:一前置步驟:提供一板體、形成於所述板體的一線路層、及覆蓋局部所述線路層的一絕緣外層;其中,所述線路層包含有沿一橫向方向排列的多條金屬線路,並且各條所述金屬線路包含:一線路段,部分埋置於所述絕緣外層;一接墊,包含有連接於所述線路段的一內線路及鍍設於所述內線路的一鍍金膜;及一第一犧牲段,連接於所述內線路遠離所述線路段的部位;其中,各條所述金屬線路的所述第一犧牲段裸露於相對應的所述鍍金膜之外;以及一盲鑽步驟:對各條所述金屬線路的所述第一犧牲段進行鑽孔,以移除各個所述第一犧牲段、其所相鄰的所述接墊部位、及其所相鄰的所述板體部位,使各條所述金屬線路的所述接墊於遠離所述線路段的部位形成有一第一圓弧邊、且使所述板體於對應各個所述第一圓弧邊的位置形成有一第一圓槽。The embodiment of the present invention provides a method for manufacturing a gold finger structure, including: a pre-step: providing a board, a circuit layer formed on the board, and an insulating outer layer covering a part of the circuit layer; wherein , The circuit layer includes a plurality of metal circuits arranged in a lateral direction, and each of the metal circuits includes: a circuit section partially buried in the insulating outer layer; and a pad including a connection to the wire An inner circuit of the road section and a gold-plated film plated on the inner circuit; and a first sacrificial section connected to a part of the inner circuit far away from the circuit section; wherein, the metal circuit The first sacrificial section is exposed outside the corresponding gold-plated film; and a blind drilling step: drilling the first sacrificial section of each of the metal lines to remove each of the first sacrificial sections , The adjacent pad portion and the adjacent board portion, so that the pads of each of the metal circuits form a first arc at a portion away from the circuit section A first circular groove is formed on the side of the board, and a first circular groove is formed at a position corresponding to each of the first circular arc sides.
本發明實施例另公開一種金手指結構,包括:一板體,形成有多個第一圓槽;一絕緣外層,形成於所述板體;以及一線路層,形成於所述板體上並包含有沿一橫向方向排列的多條金屬線路,而各條所述金屬線路包含:一線路段,部分埋置於所述絕緣外層;及一接墊,包含有連接於所述線路段的一內線路及鍍設於所述內線路的一鍍金膜;其中,於各條所述金屬線路中,所述接墊於遠離所述線路段的部位形成有一第一圓弧邊;多個所述第一圓槽的位置分別對應於多個所述第一圓弧邊的位置。The embodiment of the present invention further discloses a gold finger structure, including: a plate body formed with a plurality of first circular grooves; an insulating outer layer formed on the plate body; and a circuit layer formed on the plate body and It includes a plurality of metal circuits arranged in a lateral direction, and each of the metal circuits includes: a circuit segment partially buried in the insulating outer layer; and a pad including an inner portion connected to the circuit segment Circuit and a gold-plated film plated on the inner circuit; wherein, in each of the metal circuits, the pads form a first arc edge at a position far from the circuit section; a plurality of the first The positions of a circular groove respectively correspond to the positions of the first arc edges.
綜上所述,本發明實施例所公開的金手指結構及其製造方法,其相較於現有的金手指結的構製造方法,通過製造方法的改良,大幅減少或完全省去蝕刻藥液的使用,據以提供一種對環境污染較低、製成花費時間較短、並且可在鍍金後再修各個改金手指長度的金手指結構及其製造方法。In summary, the gold finger structure and its manufacturing method disclosed in the embodiments of the present invention, compared with the existing gold finger structure manufacturing method, through the improvement of the manufacturing method, the etching solution is greatly reduced or completely eliminated. It is used to provide a gold finger structure with low environmental pollution, a shorter manufacturing time, and a gold finger structure that can be modified after gold plating, and a manufacturing method thereof.
為能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,但是此等說明與附圖僅用來說明本發明,而非對本發明的保護範圍作任何的限制。In order to further understand the features and technical content of the present invention, please refer to the following detailed descriptions and drawings about the present invention, but these descriptions and drawings are only used to illustrate the present invention, and do not make any claims about the protection scope of the present invention. limit.
請參閱圖1至圖8所示,其為本發明的實施例,需先說明的是,本實施例對應附圖所提及的相關數量與外形,僅用來具體地說明本發明的實施方式,以便於了解本發明的內容,而非用來侷限本發明的保護範圍。Please refer to Figures 1 to 8, which are embodiments of the present invention. It should be noted that the relevant numbers and appearances mentioned in the corresponding drawings in this embodiment are only used to specifically illustrate the embodiments of the present invention. , In order to understand the content of the present invention, but not to limit the protection scope of the present invention.
[金手指結構的製造方法][Manufacturing method of gold finger structure]
請參閱圖1及圖2所示,本實施例公開一種金手指結構的製造方法。與現有的金手指製造結構的方法相比,本實施例的所述金手指結構的製造方法對環境造成的汙染較低、花費的時間較少且可於鍍金後再修改金手指長度。所述金手指結構的製造方法包含一前置步驟S110及一盲鑽步驟S120。以下將就本實施例的金手指結構的製造方法之各個步驟作一說明。需要說明的是,本發明於實現上述金手指結構的製造方法時,不以上述各個步驟的內容以及順序為限。Please refer to FIG. 1 and FIG. 2. This embodiment discloses a method for manufacturing a gold finger structure. Compared with the existing method of manufacturing a gold finger structure, the manufacturing method of the gold finger structure of this embodiment causes less environmental pollution, takes less time, and can modify the length of the gold finger after gold plating. The manufacturing method of the golden finger structure includes a pre-step S110 and a blind drilling step S120. Hereinafter, each step of the manufacturing method of the gold finger structure of this embodiment will be described. It should be noted that the present invention is not limited to the content and sequence of the above-mentioned steps when implementing the above-mentioned method for manufacturing the golden finger structure.
所述前置步驟S110,如圖1所示:提供一板體1、一絕緣外層2、及形成於所述板體1的一線路層3。所述絕緣外層2覆蓋局部所述線路層3。所述線路層3包含有沿一橫向方向W排列的多條金屬線路31,並且各條所述金屬線路31包含有部分埋置於所述絕緣外層2的一線路段311、一接墊312、及一第一犧牲段313。其中,所述接墊312包含有連接於所述線路段311的一內線路3121及鍍設所述內線路3121的一鍍金膜3122;所述第一犧牲段313連接於所述內線路3121遠離所述線路段311的部位;並且各條所述金屬線路31的所述第一犧牲段313裸露於相對應的所述鍍金膜3122之外。The pre-step S110 is shown in FIG. 1: providing a board 1, an insulating
於本實施例中,所述板體1大致呈矩形,上述矩形(或所述板體1)的短邊是大致平行於所述橫向方向W,並且所述橫向方向W是垂直於一縱向方向L。所述板體1主要用以承載其他構件,並且本實施例於此不對所述板體1的外形、尺寸、材質、及其他性質加以限制。In this embodiment, the board body 1 is substantially rectangular, the short sides of the rectangle (or the board body 1) are substantially parallel to the lateral direction W, and the lateral direction W is perpendicular to a longitudinal direction. L. The board body 1 is mainly used to carry other components, and this embodiment does not limit the shape, size, material, and other properties of the board body 1 here.
所述絕緣外層2覆蓋局部所述線路層3並且形成於所述板體1鄰近於圖1中上方的一端。於本實施例中的所述絕緣外層2大致呈矩形,並且上述矩形(或所述絕緣外層2)的短邊是大致平行於所述縱向方向L。所述絕緣外層2可以是一樹脂材料,例如是聚醯亞胺、滌綸、聚二甲酸乙二醇酯、聚四氟乙烯、環氧樹脂或芳綸等。然而,所述絕緣外層2的外形、尺寸、材質、及其他相關性質等皆可依據需求變化,本實施例於此不加以限制。The insulating
於本實施例中,所述線路層3可以是由導電材質,例如銅或銀形成,且所述線路層3的材質可依據需求變化。如所述前置步驟S110所提及,所述線路層3包含有多條金屬線路31,並且各條金屬線路31包含有所述線路段311、所述接墊312、及所述第一犧牲段313。並且,各個所述接墊312於所述縱向方向L具有一第一長度L1。於所述縱向方向L,各個所述子接墊312’具有一第二長度L2,並且各個所述接墊312的所述第一長度L1是大於任一個所述子接墊312’的所述第二長度L2。In this embodiment, the
於本實施例中的所述線路層3包含的所述金屬線路31的數量為九條,並且其中的兩條所述金屬線路31各被定義為一子金屬線路31’(如:從圖1的左側數來第三條及第四條的所述金屬線路31)。於各條所述子金屬線路31’中,所述接墊312包含有沿所述縱向方向L間隔地設置的兩個子接墊312’。In this embodiment, the number of the
詳細來說,各個所述子接墊312’包含有一子內線路3121’及鍍設於所述子內線路3121’的一子鍍金膜3122’。於各條子金屬線路31’的兩個所述子接墊312’中,相對位於圖1中上方的所述子接墊312’的所述子內線路3121’連接於所述線路段311;相對位於圖1中下方的所述子接墊312’的所述子內線路3121’連接於所述第一犧牲段313。此外,兩個所述子接墊312’的兩個所述子內線路3121’部位通過一第二犧牲段314連接,並且所述第二犧牲段314是位於兩個子接墊312’之間。需要說明的是,於各條所述金屬線路31及所述子金屬線路31’中,所述第一犧牲段313及所述第二犧牲段314皆是裸露於相對應的鍍金膜3122之外。In detail, each of the sub-pads 312' includes a sub-inner circuit 3121' and a sub-gold-plated film 3122' plated on the sub-inner circuit 3121'. Among the two sub-pads 312' of each sub-metal circuit 31', the sub-inner circuit 3121' of the sub-pad 312' located on the upper side of FIG. 1 is connected to the
需要說明的是,多條所述金屬線路31不限制包含有所述子金屬線路31’。並且,於各條所述子金屬線路31’中,所述接墊312所包含的所述子接墊312’的數量不限制為兩個。也就是說,當所述接墊312所包含的子接墊312’的數量大於或等於兩個時,包含所述接墊312的所述金屬線路31可以被定義為所述子金屬線路31’,並且任兩個相鄰的所述子接墊312’通過所述第二犧牲段314連接。此外,所述金屬線路31與所述子金屬線路31’沿所述橫向方向W的排列順序也可以依據需求變化,本實施例於此不加以限制。It should be noted that the
所述盲鑽步驟S120,如圖2所示:對各條所述金屬線路31的所述第一犧牲段313進行鑽孔,以移除各個所述第一犧牲段313、其所相鄰的所述接墊312部位、及其所相鄰的所述板體1部位,使各條所述金屬線路31的所述接墊312於遠離所述線路段311的部位形成有一第一圓弧邊312a、且使所述板體1於對應各個所述第一圓弧邊312a的位置形成有一第一圓槽1a。The blind drilling step S120 is shown in FIG. 2: drilling the first
所述盲鑽步驟S120還可以對各條所述子金屬線路31’的所述第二犧牲段314進行鑽孔,以移除所述第二犧牲段314、其所相鄰的兩個所述子接墊312’部位、及其所相鄰的所述板體1部位,使兩個所述子接墊312’形成有相鄰的兩個第二圓弧邊312’a,並且使所述板體1於對應兩個所述第二圓弧邊312’a的位置形成有一第二圓槽1b。In the blind drilling step S120, the second
請參閱圖3至圖6所示,詳細來說,通過所述盲鑽步驟S120所形成的所述第一圓弧邊312a及所述第二圓弧邊312’a分別切齊於一部分的所述第一圓槽1a及一部分的所述第二圓槽1b。此外,為了方便說明,所述金手指結構的製造方法還定義有垂直於所述縱向方向L及所述橫向方向W的一深度方向D。其中,所述第一圓槽1a具有一第一深度D1,並且所述第一深度D1是介於25um至75um之間;所述第二圓槽1b具有一第二深度D2,並且所述第二深度D2是介於25um至75um之間。所述第一深度D1及所述第二深度D2皆大致平行於所述深度方向D。Please refer to FIGS. 3 to 6, in detail, the
於本實施例的所述盲鑽步驟S120中,是通過一鑽刀(圖未示)的旋轉以對各個對應的部位進行鑽孔。所述鑽刀大致呈長形且具有一長軸方向。並且,所述鑽刀於鑽孔時是以所述長軸方向為軸心而自轉,所以會於鄰近所述鑽刀進行鑽孔的部位形成有所述第一圓弧邊312a及所述第一圓槽1a、或所述第二圓弧邊312’a及所述第二圓槽1b。需要說明的是,於所述盲鑽步驟S120中,進行鑽孔所需的工具、進行鑽孔的方法、以及所述鑽刀的外形及尺寸等皆可依據需求變化,不以本實施例為限。In the blind drilling step S120 of this embodiment, a drill (not shown) is rotated to drill holes in each corresponding part. The drill is generally elongated and has a long axis direction. In addition, the drill rotates with the long axis as the axis when drilling, so the
於本實施例的所述盲鑽步驟S120中,不對多個所述第一犧牲段313及多個所述第二犧牲段314的鑽孔順序加以限制。也就是說,依據實際需求,可以先對多個所述第二犧牲段314進行鑽孔後,再對多個所述第一犧牲段313進行鑽孔。或者,多個所述第一犧牲段313及多個所述第二犧牲段314可以被交替地進行鑽孔。In the blind drilling step S120 of this embodiment, the drilling sequence of the plurality of first
需要說明的是,多個所述第一犧牲段313及多個所述第二犧牲段314不限制為皆通過所述盲鑽步驟S120移除。舉例來說,於特殊應用中,多個所述第一犧牲段313可以通過所述盲鑽步驟S120移除,並且多個所述第二犧牲段314可以通過一蝕刻方式移除;或者,多個所述第一犧牲段313可以通過所述蝕刻方式移除,並且多個所述第二犧牲段314可以通過所述盲鑽步驟S120移除。然而,除了所述盲鑽步驟S120以外,本實施例不對移除多個所述第一犧牲段313或多個所述第二犧牲段314的方式加以限制。It should be noted that the plurality of first
需要額外說明的是,所述金手指結構的製造方法於所述前置步驟S110前,還可以依序包含有一上膜步驟、一電鍍步驟、及一移除步驟。但所述金手指結構的製造方法不限制包含有所述上膜步驟、所述電鍍步驟、及所述移除步驟。It should be additionally noted that, before the pre-step S110, the manufacturing method of the golden finger structure may further include a filming step, an electroplating step, and a removing step in sequence. However, the manufacturing method of the gold finger structure is not limited to include the filming step, the electroplating step, and the removing step.
於所述上膜步驟中,於所述絕緣外層2覆蓋一遮蔽物(圖未示)。所述遮蔽物可以是具有防鍍性質(也就是,金不容易鍍附於所述遮蔽物),據以避免金鍍設於所述遮蔽物的外表面而造成鍍金藥液的浪費。需要說明的是,所述遮蔽物的外形、數量、材質及其他性質等皆可依據需求變化,本實施例於此不加以限制。In the filming step, a shield (not shown) is covered on the insulating
於所述電鍍步驟中,多個所述第一犧牲段313連接於一電鍍設備(圖未示),據以於各條金屬線路31及各條子金屬線路31’中,所述內線路3121的外表面及兩個所述子內線路3121’的外表面分別鍍設有所述鍍金膜3122及兩個所述子鍍金膜3122’,並且在完成電鍍後使所述第一犧牲段313未被所述電鍍設備連接。由於多個所述第一犧牲段313於所述電鍍時接觸所述電鍍設備,所以多個所述第一犧牲段313未鍍設有所述鍍金膜3122或所述子鍍金膜3122’。In the electroplating step, a plurality of the first
於所述移除步驟中,移除所述遮蔽物,據以形成如所述前置步驟中所提供的所述板體1、所述絕緣外層2、及所述線路層3。In the removing step, the shield is removed, thereby forming the board 1, the insulating
在不同的實施例中,於所述金手指結構的製造方法中,上述步驟的順序可以被調整如下:所述上膜步驟、所述電鍍步驟、所述前置步驟S110、所述盲鑽步驟S120、及所述移除步驟。也就是說,所述移除步驟可以被調整至所述盲鑽步驟S120後,並且於所述前置步驟S110中,所述絕緣外層2被尚未被移除的所述遮蔽物覆蓋。In different embodiments, in the method of manufacturing the golden finger structure, the sequence of the above steps can be adjusted as follows: the filming step, the electroplating step, the pre-step S110, the blind drilling step S120, and the removing step. That is, the removing step can be adjusted to after the blind drilling step S120, and in the pre-step S110, the insulating
[金手指結構][Gold Finger Structure]
請參閱圖7及圖8所示,本實施例還公開一種金手指結構100,其包含一板體1、形成於所述板體1的一絕緣外層2、及形成於所述板體1的一線路層3。需要說明的是,本實施例的所述金手指結構100可以由上述金手指結構的製造方法製成,但本實施例不對所述金手指結構100的製造方法加以限制。以下介紹所述金手指結構100的各個元件構造,並且適時說明所述金手指結構100的各元件彼此之間的連接關係。Please refer to Figures 7 and 8, this embodiment also discloses a
於本實施例中,所述板體1大致呈矩形,上述矩形(或所述板體)的短邊是大致平行於一橫向方向W,並且所述橫向方向W是垂直於一縱向方向L。所述板體1主要用以承載其他構件,並且本實施例於此不對所述板體1的外型、尺寸、材質、及其他性質加以限制。In this embodiment, the board 1 is substantially rectangular, the short sides of the rectangle (or the board) are substantially parallel to a transverse direction W, and the transverse direction W is perpendicular to a longitudinal direction L. The board body 1 is mainly used to carry other components, and this embodiment does not limit the shape, size, material, and other properties of the board body 1 here.
所述板體1於鄰近圖7中下方的一端形成有多個第一圓槽1a。於本實施例中,所述板體1形成有九個所述第一圓槽1a,任一個所述第一圓槽1a皆未貫穿所述板體1,並且任兩個所述第一圓槽1a的尺寸相等。所述第一圓槽1a具有一第一深度D1,並且所述第一深度D1是介於25um至75um之間。需要說明的是,所述第一圓槽1a的外形、尺寸、形成位置皆可依據需求變化,不以本實施例為限。The plate body 1 is formed with a plurality of first circular grooves 1a at one end adjacent to the lower part in FIG. 7. In this embodiment, the plate body 1 is formed with nine first circular grooves 1a, none of the first circular grooves 1a penetrates the plate body 1, and any two of the first circular grooves 1a The dimensions of the grooves 1a are equal. The first circular groove 1a has a first depth D1, and the first depth D1 is between 25um and 75um. It should be noted that the shape, size, and formation position of the first circular groove 1a can be changed according to requirements, and is not limited to this embodiment.
請參閱圖7及圖8所示。於本實施例中,所述板體1形成有兩個所述第二圓槽1b,任一個所述第二圓槽1b皆未貫穿所述板體1,並且兩個所述第二圓槽1b的尺寸相等。所述第二圓槽1b具有一第二深度D2,並且所述第二深度D2是介於25um至75um之間。於本發明未繪示的其他實施例中,所述板體1形成所述第二圓槽1b的數量可以為一個。也就是說,所述板體1形成所述第二圓槽1b的數量為至少一個。需要說明的是,所述第二圓槽1b的外形、尺寸、形成位置皆可依據需求變化,不以本實施例為限。Please refer to Figure 7 and Figure 8. In this embodiment, the plate body 1 is formed with two second
所述絕緣外層2覆蓋局部所述線路層3並且形成於所述板體1鄰近於圖7中上方的一端。於本實施例中的所述絕緣外層2大致呈矩形,並且上述矩形(或所述絕緣外層)的短邊是大致平行於所述縱向方向。所述絕緣外層2可以是一樹脂材料,例如是聚醯亞胺、滌綸、聚二甲酸乙二醇酯、聚四氟乙烯、環氧樹脂或芳綸等。然而,所述絕緣外層的外形、尺寸、材質、及其他相關性質等皆可依據需求變化,本實施例於此不加以限制。The insulating
於本實施例中,所述線路層3可以是由導電材質,例如銅或銀形成,且所述線路層3的材質可依據需求變化。所述線路層3包含有沿一橫向方向W排列的多條金屬線路31,並且各條所述金屬線路31包含有一線路段311及一接墊312。所述線路段311部分埋置於所述絕緣外層2。In this embodiment, the
所述接墊312包含有連接於所述線路段311的一內線路3121及鍍設於所述內線路3121的一鍍金膜3122,並且所述接墊312於所述縱向方向L上具有一第一長度L1。於本實施例中的所述線路層3包含的所述金屬線路31的數量為九條,並且其中的兩條所述金屬線路31各被定義為一子金屬線路31’(如:從圖7的左側數來第三條及第四條的所述金屬線路31)。於各條所述子金屬線路31’中,所述接墊312包含有沿所述縱向方向L間隔地設置的兩個子接墊312’。各個所述子接墊312’於所述縱向方向L具有一第二長度L2,並且各個所述接墊312的所述第一長度L1是大於任一個所述子接墊312’的所述第二長度L2。The
於各條所述金屬線路31中,所述接墊312於遠離所述線路段311的部位形成有一第一圓弧邊312a。也就是說,於本實施例中的九條所述金屬線路31共包含有九個第一圓弧邊312a,並且多個所述第一圓弧邊312a是形成於多條所述金屬線路31鄰近於圖7中下方的一端。此外,多個所述第一圓弧邊312a的位置分別對應於多個所述第一圓槽1a的位置,並且所述第一圓弧邊312a切齊於一部分的所述第一圓槽1a。In each of the
於各條所述子金屬線路31’中,各個所述子接墊312’包含有一子內線路3121’及鍍設於所述子內線路3121’的一子鍍金膜3122’。詳細來說,於各條子金屬線路31’中的兩個所述子接墊312’中,相對位於圖7中上方的所述子接墊312’的所述子內線路3121’連接於所述線路段311;兩個所述子接墊312’形成有相鄰的兩個第二圓弧邊312’a,並且兩個所述第二圓弧邊312’a的位置是對應於所述第二圓槽1b的位置,並且所述第二圓弧邊312’a切齊於一部分的所述第二圓槽1b。In each of the sub metal lines 31', each of the sub pads 312' includes a sub inner circuit 3121' and a sub gold plating film 3122' plated on the sub inner circuit 3121'. In detail, among the two sub-pads 312' of each sub-metal circuit 31', the sub-inner circuit 3121' of the sub-pad 312' located at the upper part of FIG. 7 is connected to the
需要說明的是,多條所述金屬線路31不限制包含有所述子金屬線路31’。並且,於各條所述子金屬線路31’中,所述接墊312所包含的所述子接墊312’的數量不限制為兩個。也就是說,當所述接墊312所包含的所述子接墊312’的數量大於或等於兩個時,包含所述接墊312的所述金屬線路31可以被定義為所述子金屬線路31’,並且任兩個相鄰的所述子接墊312’形成有相鄰的兩個所述第二圓弧邊312’a。此外,所述金屬線路31與所述子金屬線路31’的排列順序也可以依據需求變化,本實施例於此不加以限制。It should be noted that the
[本發明實施例的技術效果][Technical effects of the embodiment of the present invention]
綜上所述,本發明實施例所公開的金手指結構及其製造方法,其相較於現有的金手指結構及其製造方法,通過製造方法的改良,大幅減少或完全省去蝕刻藥液的使用。詳細來說,現有的金手指結構的製造方法多半是以蝕刻方式移除所述第一犧牲段及第二犧牲段。上述蝕刻方式實際上會產生諸多問題。例如,蝕刻方式所需的蝕刻藥液會對環境產生不小的汙染;以蝕刻方式的製程會花費較長的時間,進而造成生產效率低且生產成本高的問題;並且,現有的金手指結構的製造方法,於完成鍍金後難以再修改金手指的長度。In summary, the gold finger structure and its manufacturing method disclosed in the embodiments of the present invention, compared with the existing gold finger structure and its manufacturing method, through the improvement of the manufacturing method, greatly reducing or completely eliminating the etching solution use. In detail, most of the existing manufacturing methods of the gold finger structure are to remove the first sacrificial section and the second sacrificial section by etching. The above-mentioned etching method actually causes many problems. For example, the etching solution required by the etching method will cause considerable pollution to the environment; the etching method will take a long time, which will cause the problems of low production efficiency and high production cost; and, the existing gold finger structure It is difficult to modify the length of the gold finger after the gold plating is completed.
本發明實施例的所述金手指結構的製造方法的所述盲鑽步驟可以是通過鑽孔方式移除所述第一犧牲段或所述第二犧牲段。因此,與現有的金手指結構的製造方法相比,所述金手指結構的製造方法省去會對環境造成汙染的蝕刻藥液、節省蝕刻方式所花費的時間(蝕刻方式會比鑽孔方式花費較多時間)、並且還能再電鍍之後修改所述接墊的長度。除此之外,本發明實施例的所述金手指結構的製造方法的所述盲鑽步驟能提供單點性的快速鑽孔加工,據以使本實施例的所述金手指結構的製造方法能適用於多種不同的應用。The blind drilling step of the method of manufacturing the gold finger structure of the embodiment of the present invention may be to remove the first sacrificial section or the second sacrificial section by drilling. Therefore, compared with the existing manufacturing method of the gold finger structure, the manufacturing method of the gold finger structure saves the etching solution that pollutes the environment and saves the time spent in the etching method (the etching method is more expensive than the drilling method. More time), and the length of the pad can be modified after electroplating. In addition, the blind drilling step of the method of manufacturing the gold finger structure of the embodiment of the present invention can provide single-point rapid drilling processing, so that the method of manufacturing the gold finger structure of the present embodiment Can be applied to many different applications.
再者,本發明實施例所公開的金手指結構及其製造方法,還具有較高的精度。例如:所述第一圓槽具有一第一深度,並且所述第一深度介於25um至75um之間,以及所述第二圓槽具有一第二深度,並且所述第二深度介於25um至75um之間。Furthermore, the gold finger structure and the manufacturing method thereof disclosed in the embodiments of the present invention also have higher accuracy. For example: the first circular groove has a first depth, and the first depth is between 25um and 75um, and the second circular groove has a second depth, and the second depth is between 25um Between 75um.
以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的專利範圍內。The content disclosed above is only the preferred and feasible embodiments of the present invention, and does not limit the patent scope of the present invention. Therefore, all equivalent technical changes made by using the description and drawings of the present invention are included in the patent scope of the present invention. Inside.
100:金手指結構100: gold finger structure
1:板體1: Board body
1a:第一圓槽1a: The first circular groove
1b:第二圓槽1b: Second round groove
2:絕緣外層2: Insulation outer layer
3:線路層3: Line layer
31:金屬線路31: Metal circuit
31’:子金屬線路31’: Sub-metal circuit
311:線路段311: line segment
312:接墊312: Pad
3121:內線路3121: internal line
3122:鍍金膜3122: gold-plated film
312a:第一圓弧邊312a: the first arc edge
312’:子接墊312’: Sub-pad
3121’:子內線路3121’: Inner line
3122’:子鍍金膜3122’: Sub-gold-plated film
312’a:第二圓弧邊312’a: second arc edge
313:第一犧牲段313: First Sacrifice Section
314:第二犧牲段314: Second Sacrifice Section
L:縱向方向L: longitudinal direction
L1:第一長度L1: first length
L2:第二長度L2: second length
W:橫向方向W: horizontal direction
D:深度方向D: depth direction
D1:第一深度D1: first depth
D2:第二深度D2: second depth
S110:前置步驟S110: Preliminary steps
S120:盲鑽步驟S120: Blind drilling steps
圖1為本發明的實施例的金手指結的構製造方法的前置步驟示意圖。.FIG. 1 is a schematic diagram of the pre-steps of the method for fabricating a gold finger structure according to an embodiment of the present invention. .
圖2為本發明的實施例的金手指結構的製造方法的盲鑽步驟示意圖。2 is a schematic diagram of blind drilling steps in the method of manufacturing a gold finger structure according to an embodiment of the present invention.
圖3為圖2中區域III的放大示意圖。Fig. 3 is an enlarged schematic diagram of area III in Fig. 2.
圖4為圖2沿剖線IV的剖視示意圖。4 is a schematic cross-sectional view of FIG. 2 along section line IV.
圖5為圖2中區域V的放大示意圖。FIG. 5 is an enlarged schematic diagram of area V in FIG. 2.
圖6為圖2沿剖線VI的剖視示意圖。FIG. 6 is a schematic cross-sectional view of FIG. 2 along the section line VI.
圖7為本發明的實施例的金手指結構的示意圖。Fig. 7 is a schematic diagram of a gold finger structure according to an embodiment of the present invention.
圖8為圖7省略多個鍍金膜及多個子鍍金膜的示意圖。FIG. 8 is a schematic diagram of FIG. 7 omitting multiple gold-plated films and multiple sub-gold-plated films.
100:金手指結構 100: gold finger structure
1:板體 1: Board body
1a:第一圓槽 1a: The first circular groove
1b:第二圓槽 1b: Second round groove
2:絕緣外層 2: Insulation outer layer
3:線路層 3: Line layer
31:金屬線路 31: Metal circuit
31’:子金屬線路 31’: Sub-metal circuit
311:線路段 311: line segment
312:接墊 312: Pad
3121:內線路 3121: internal line
3122:鍍金膜 3122: gold-plated film
312a:第一圓弧邊 312a: the first arc edge
312’:子接墊 312’: Sub-pad
3121’:子內線路 3121’: Inner line
3122’:子鍍金膜 3122’: Sub-gold-plated film
312’a:第二圓弧邊 312’a: second arc edge
L:縱向方向 L: longitudinal direction
L1:第一長度 L1: first length
L2:第二長度 L2: second length
W:橫向方向 W: horizontal direction
D:深度方向 D: depth direction
Claims (6)
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|---|---|---|---|---|
| CN106455343A (en) * | 2016-11-30 | 2017-02-22 | 深圳市景旺电子股份有限公司 | Gold finger lead removing method |
| CN107148141A (en) * | 2017-06-09 | 2017-09-08 | 苏州欧菲光科技有限公司 | Gold finger structure and flexible circuit board |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106455343A (en) * | 2016-11-30 | 2017-02-22 | 深圳市景旺电子股份有限公司 | Gold finger lead removing method |
| CN107148141A (en) * | 2017-06-09 | 2017-09-08 | 苏州欧菲光科技有限公司 | Gold finger structure and flexible circuit board |
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