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TWI722379B - Transparent conducting film or coating on a lens that serves as an interlock on a semiconductor laser module - Google Patents

Transparent conducting film or coating on a lens that serves as an interlock on a semiconductor laser module Download PDF

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Publication number
TWI722379B
TWI722379B TW108103807A TW108103807A TWI722379B TW I722379 B TWI722379 B TW I722379B TW 108103807 A TW108103807 A TW 108103807A TW 108103807 A TW108103807 A TW 108103807A TW I722379 B TWI722379 B TW I722379B
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semiconductor laser
trace
optical element
laser
transparent conductive
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TW108103807A
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Chinese (zh)
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TW201941510A (en
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查理斯 安得烈 史庫拉瑪
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美商亮銳公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068Stabilisation of laser output parameters
    • H01S5/06825Protecting the laser, e.g. during switch-on/off, detection of malfunctioning or degradation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/005Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0225Out-coupling of light
    • H01S5/02257Out-coupling of light using windows, e.g. specially adapted for back-reflecting light to a detector inside the housing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/02208Mountings; Housings characterised by the shape of the housings
    • H01S5/02216Butterfly-type, i.e. with electrode pins extending horizontally from the housings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

Method and apparatuses are described herein for providing laser safety in semiconductor laser modules. For example, a semiconductor laser module may comprise a semiconductor laser and an optical element. The optical element that is operatively coupled with the semiconductor laser may disperse the laser light emitted from the semiconductor laser. The optical element may be coated with a transparent conductive material that serves as an interlock on the semiconductor laser. The transparent conductive material may be placed in the shape of a trace on the optical element where the trace is electrically in series with the semiconductor laser. On a condition that the trace is damaged, the laser light emitted from the semiconductor laser may be interrupted.

Description

作為半導體雷射模組上之互鎖之透鏡上之透明導電膜或塗層As a transparent conductive film or coating on the interlocking lens of the semiconductor laser module

所揭示之實施例大體上係關於一半導體雷射模組,且更特定言之係關於使用作為一互鎖之一透鏡上之透明導電膜或塗層的半導體雷射安全性。 The disclosed embodiment generally relates to a semiconductor laser module, and more specifically relates to the safety of a semiconductor laser using a transparent conductive film or coating on an interlocking lens.

諸如垂直腔面發射雷射(VCSEL)之半導體雷射廣泛用於面部或虹膜辨識。特定言之,雷射輻射藉由一透明光學元件或透鏡分散成一大立體角,接著指向虹膜或面部。相機模組可偵測反射之輻射,且接著影像處理演算法可執行生物識別。為了使此等雷射模組被認為係安全的,其需要符合雷射安全標準,例如國際電工委員會(IEC)60825。在習知雷射模組中,一金屬片(或金屬帽)用於提供雷射安全性並滿足此等安全標準。例如,若金屬片被損壞、移除或斷裂,則與雷射之電連接中斷且雷射關閉。然而,此等習知雷射模組體積龐大且不完整,因為其需要一單獨金屬片來偵測雷射模組中之損壞。此外,金屬片需要包含雷射光發射通過之一孔。若在通過孔暴露之透鏡部分上發生損壞,則習知雷射模組不能關閉雷射光,因為該部分不受金屬片之保護。因此,期望具有藉由作為一互鎖之 透鏡上之透明導電膜或塗層來提供具有減小尺寸之完整雷射安全性之方法及設備。 Semiconductor lasers such as vertical cavity surface emitting lasers (VCSEL) are widely used for facial or iris recognition. Specifically, the laser radiation is dispersed into a large solid angle by a transparent optical element or lens, and then directed toward the iris or face. The camera module can detect the reflected radiation, and then the image processing algorithm can perform biometric identification. In order for these laser modules to be considered safe, they need to comply with laser safety standards, such as the International Electrotechnical Commission (IEC) 60825. In the conventional laser module, a metal sheet (or metal cap) is used to provide laser safety and meet these safety standards. For example, if the metal sheet is damaged, removed or broken, the electrical connection with the laser is interrupted and the laser is turned off. However, these conventional laser modules are bulky and incomplete because they require a separate metal sheet to detect damage in the laser module. In addition, the metal sheet needs to contain a hole through which the laser light is emitted. If damage occurs on the part of the lens exposed through the hole, the conventional laser module cannot turn off the laser light because this part is not protected by the metal sheet. Therefore, it is desirable to have an interlocking The transparent conductive film or coating on the lens provides a method and equipment for complete laser safety with reduced size.

本文描述用於在半導體雷射模組中提供雷射安全性之方法及設備。例如,一半導體雷射模組可包括一半導體雷射及一透明光學元件。該半導體雷射可發射雷射光通過該透明光學元件。可操作地耦合及定位以接收來自該半導體雷射之所發射雷射光之該透明光學元件可在一增大立體角上擴散該發射之光,從而有效地用於分散或漫射自該半導體雷射發射之雷射光。由於該光學元件係透明的,因此散射保持最小且所發射之光大部分保持於比最初發射之雷射光更大之一預定義立體角內。該光學元件可塗覆有一透明導電材料,該材料藉由提供與該半導體雷射之串聯連接之一部分而作為該半導體雷射上之一互鎖。另外,該透明導電材料可在該光學元件上以一跡線之形狀放置,其中該跡線與該半導體雷射電串聯。在該跡線損壞、破裂或斷裂之條件下,可中斷自該半導體雷射發射之雷射光。該透明導電材料可包括氧化銦錫(ITO)、摻雜鋁之氧化鋅(AZO)、摻雜鎵之氧化鋅(GZO)或摻雜銦之氧化鋅(IZO)之至少一者。 This article describes methods and equipment used to provide laser safety in semiconductor laser modules. For example, a semiconductor laser module may include a semiconductor laser and a transparent optical element. The semiconductor laser can emit laser light through the transparent optical element. The transparent optical element operatively coupled and positioned to receive the emitted laser light from the semiconductor laser can diffuse the emitted light at an increased solid angle, thereby effectively dispersing or diffusing from the semiconductor laser Shoot the laser light emitted. Since the optical element is transparent, scattering is kept to a minimum and most of the emitted light is kept within a predefined solid angle larger than the originally emitted laser light. The optical element may be coated with a transparent conductive material that acts as an interlock on the semiconductor laser by providing a part of the serial connection with the semiconductor laser. In addition, the transparent conductive material can be placed on the optical element in the shape of a trace, wherein the trace is connected in series with the semiconductor laser. Under the condition that the trace is damaged, cracked or broken, the laser light emitted from the semiconductor laser can be interrupted. The transparent conductive material may include at least one of indium tin oxide (ITO), aluminum-doped zinc oxide (AZO), gallium-doped zinc oxide (GZO), or indium-doped zinc oxide (IZO).

100:半導體雷射模組 100: Semiconductor laser module

110:半導體雷射 110: Semiconductor laser

120:光學元件 120: optical components

130:透明導電層 130: Transparent conductive layer

140:印刷電路板(PCB) 140: Printed Circuit Board (PCB)

220:光學元件 220: optical components

230:跡線 230: trace

232:端點 232: Endpoint

234:端點 234: Endpoint

240:光學元件 240: optical components

250:跡線 250: trace

252:端點 252: Endpoint

254:端點 254: Endpoint

310:ITO跡線 310: ITO trace

320:電流 320: current

330:ITO跡線 330: ITO trace

340:垂直腔表面發射雷射(VCSEL) 340: Vertical cavity surface emitting laser (VCSEL)

350:雷射光 350: Laser light

410:ITO跡線 410: ITO trace

420:電流 420: Current

430:ITO跡線 430: ITO trace

440:垂直腔表面發射雷射(VCSEL) 440: Vertical cavity surface launch laser (VCSEL)

450:雷射光 450: Laser light

460:場效電晶體(FET) 460: Field Effect Transistor (FET)

470:電阻器 470: resistor

510:步驟 510: Step

530:步驟 530: step

可自以下結合附圖之實例給出之描述中獲得更詳細之理解,其中圖式中相同元件符號表示相同元件,且其中:圖1A係繪示一實例半導體雷射模組之一系統圖,該半導體雷射模組包含塗覆有一透明導電材料之一透明光學元件,該透明導電材料作為一互鎖;圖1B係圖1A中所繪示之實例半導體雷射模組之三維圖; 圖2A係繪示可在圖1A及圖1B中所繪示之半導體雷射模組內使用之跡線之一實例形狀之一圖;圖2B係繪示可在圖1A及圖1B中繪示之半導體雷射模組內使用之跡線之另一實例形狀之一圖;圖3A係繪示當一ITO跡線未被損壞時一電流流動通過一垂直腔表面發射雷射(VCSEL)之一實例連接之一圖;圖3B係繪示當一ITO跡線損壞時一電流中斷之一實例連接之一圖;圖4A係繪示當一場效電晶體(FET)之閘極中之一ITO跡線沒有損壞時一電流流動通過一VCSEL之一實例連接之一圖;圖4B係繪示當閘極中之一ITO跡線至一FET損壞時一電流中斷之一實例連接之一圖;圖5係繪示用於使用一光學元件提供雷射安全性之一實例製程之一圖,該光學元件塗覆有一透明導電材料。 A more detailed understanding can be obtained from the following description given in conjunction with the examples of the drawings, in which the same component symbols in the drawings represent the same components, and among them: FIG. 1A shows a system diagram of an example semiconductor laser module, The semiconductor laser module includes a transparent optical element coated with a transparent conductive material as an interlock; FIG. 1B is a three-dimensional view of the example semiconductor laser module shown in FIG. 1A; FIG. 2A is a diagram showing an example shape of a trace that can be used in the semiconductor laser module shown in FIG. 1A and FIG. 1B; FIG. 2B is a diagram that can be shown in FIG. 1A and FIG. 1B A diagram of another example shape of the trace used in the semiconductor laser module; Figure 3A shows one of a current flowing through a vertical cavity surface emitting laser (VCSEL) when an ITO trace is not damaged A diagram of an example connection; FIG. 3B shows a diagram of an example connection when an ITO trace is damaged and a current is interrupted; FIG. 4A shows a diagram of an ITO trace in the gate of a field-effect transistor (FET) A diagram of an example connection when a current flows through a VCSEL when the wire is not damaged; FIG. 4B is a diagram showing an example connection when an ITO trace in the gate is damaged to a FET when a current is interrupted; FIG. 5 It is a diagram showing an example of the manufacturing process for providing laser safety using an optical element coated with a transparent conductive material.

應當理解,用於作為一半導體雷射模組上之一互鎖之一透鏡上之透明導電膜或塗層之一方法及設備之圖及描述已為清楚理解起見經簡化以繪示相關之元件,同時為清楚目的消除典型裝置處理中發現之許多其他元件。熟習技術者可認識到在實施本發明時期望及/或需要之其他元件及/或步驟。然而,因為此等元件及步驟在本領域中係熟知的,且因為其等不促進更好地理解本發明,所以本文不提供對此等元件及步驟之討論。 It should be understood that the diagrams and descriptions of the method and equipment used as a transparent conductive film or coating on an interlocking lens of a semiconductor laser module have been simplified for the sake of clear understanding to illustrate the related Components, while eliminating many other components found in typical device processing for clarity purposes. Those skilled in the art can recognize other elements and/or steps that are desired and/or required when implementing the present invention. However, because these elements and steps are well known in the art, and because they do not promote a better understanding of the present invention, a discussion of these elements and steps is not provided herein.

本文描述一種用於一半導體雷射模組之一方法及設備,該 半導體雷射模組具有在作為一互鎖之一光學元件(或透鏡)上之透明導電膜或塗層。例如,一半導體雷射模組可包括一半導體雷射及透明光學元件(或一透鏡)。經可操作地耦合及定位以接收來自該半導體雷射之經發射雷射光之該透明光學元件可將在一增大立體角上擴散該發射之光,從而有效地用於分散或漫射自該半導體雷射發射之該雷射光。由於該光學元件係透明的,因此散射保持最小且經發射之光大部分保持於比最初經發射之雷射光更大之一預定義立體角內。該光學元件可塗覆有一透明導電材料,該材料藉由提供與該半導體雷射之一串聯連接之部分而作為該半導體雷射上之一互鎖。該透明導電膜或塗層可為一跡線之形狀,其中該跡線與該半導體雷射電串聯。若該跡線藉由外力損壞、破裂或斷裂,則可關閉自該半導體雷射發射之該雷射光。該透明導電膜或塗層可由例如氧化銦錫(ITO)、摻雜鋁之氧化鋅(AZO)、摻雜鎵之氧化鋅(GZO)、摻雜銦之氧化鋅(IZO)或其任何組合製成。 This article describes a method and device for a semiconductor laser module, which The semiconductor laser module has a transparent conductive film or coating on an optical element (or lens) as an interlock. For example, a semiconductor laser module may include a semiconductor laser and a transparent optical element (or a lens). The transparent optical element that is operatively coupled and positioned to receive the emitted laser light from the semiconductor laser can diffuse the emitted light at an increased solid angle, thereby effectively dispersing or diffusing the emitted light from the semiconductor laser. The laser light emitted by a semiconductor laser. Since the optical element is transparent, scattering is kept to a minimum and most of the emitted light is kept within a predefined solid angle larger than the originally emitted laser light. The optical element may be coated with a transparent conductive material that acts as an interlock on the semiconductor laser by providing a part connected in series with one of the semiconductor lasers. The transparent conductive film or coating may be in the shape of a trace, wherein the trace is connected in series with the semiconductor laser. If the trace is damaged, broken or broken by an external force, the laser light emitted from the semiconductor laser can be turned off. The transparent conductive film or coating can be made of, for example, indium tin oxide (ITO), aluminum-doped zinc oxide (AZO), gallium-doped zinc oxide (GZO), indium-doped zinc oxide (IZO), or any combination thereof to make.

圖1A繪示一實例半導體雷射模組100,其包含用一透明導電層130成膜或塗覆之一光學元件120。透明導電層130可用作一半導體雷射110上之一互鎖。例如,半導體雷射模組100包含一半導體雷射110、一透明光學元件120、一透明導電層130及一印刷電路板(PCB)140。 FIG. 1A shows an example semiconductor laser module 100 which includes an optical element 120 formed or coated with a transparent conductive layer 130. The transparent conductive layer 130 can be used as an interlock on a semiconductor laser 110. For example, the semiconductor laser module 100 includes a semiconductor laser 110, a transparent optical element 120, a transparent conductive layer 130, and a printed circuit board (PCB) 140.

半導體雷射110係藉由使一電流流至半導體而引起雷射振蕩之一裝置。特定言之,藉由使正向電流流至p-n接面而產生光。在正向偏壓操作中,p型層與正極端子連接,n型層與負極端子連接,電子自n型層進入,且電洞自p型層進入。當兩者在接面處相遇時,一電子落入一電洞中且此時會發射光。半導體雷射110之類型包含(但不限於)雷射二極體(LD)、雙異質結構雷射(DH)、分離限制異質結構雷射(SCH)、分佈式布 拉格反射器雷射(DBR)、分佈式回饋雷射(DFB)、量子井雷射、量子點雷射、量子級聯雷射(QCL)、外腔雷射(ECL)、擴展腔二極體雷射、體布拉格(Bragg)閘雷射、垂直腔面發射雷射(VCSEL)、垂直外腔面發射雷射(VECSEL)、混合矽雷射、帶間級聯雷射(ICL)及半導體環形雷射。如本文所使用,術語半導體雷射、雷射二極體(LD)、注入雷射二極體(ILD)或二極體雷射器及其變體在本揭示中可互換使用。 The semiconductor laser 110 is a device that causes the laser to oscillate by flowing a current to the semiconductor. Specifically, light is generated by flowing forward current to the p-n junction. In the forward bias operation, the p-type layer is connected to the positive terminal, the n-type layer is connected to the negative terminal, electrons enter from the n-type layer, and holes enter from the p-type layer. When the two meet at the junction, an electron falls into an electric hole and emits light at this time. Types of semiconductor laser 110 include (but are not limited to) laser diode (LD), double heterostructure laser (DH), separation limited heterostructure laser (SCH), distributed cloth Lager reflector laser (DBR), distributed feedback laser (DFB), quantum well laser, quantum dot laser, quantum cascade laser (QCL), external cavity laser (ECL), extended cavity diode Volume lasers, Bragg gate lasers, vertical cavity surface emitting lasers (VCSEL), vertical external cavity surface emitting lasers (VECSEL), hybrid silicon lasers, interband cascade lasers (ICL) and semiconductors Ring laser. As used herein, the terms semiconductor laser, laser diode (LD), injection laser diode (ILD) or diode laser and variants thereof are used interchangeably in this disclosure.

在一實施例中,半導體雷射110可為紅外紅色雷射,例如垂直腔面發射雷射(VCSEL)。VCSEL可用於面部及虹膜辨識。當將一VCSEL實施至諸如虹膜或面部識別之一應用中時,半導體雷射模組100需要符合雷射安全規則,諸如國際電工委員會(IEC)60825。此可需要半導體雷射模組100中之一特徵,其在系統變得不安全時關閉雷射。例如,當一半導體雷射模組100中之光學元件120(或透鏡)斷裂、移除或斷裂時,會發生此情況。 In an embodiment, the semiconductor laser 110 may be an infrared red laser, such as a vertical cavity surface emitting laser (VCSEL). VCSEL can be used for facial and iris recognition. When implementing a VCSEL in an application such as iris or facial recognition, the semiconductor laser module 100 needs to comply with laser safety regulations, such as the International Electrotechnical Commission (IEC) 60825. This may require a feature in the semiconductor laser module 100, which turns off the laser when the system becomes unsafe. For example, this happens when the optical element 120 (or lens) in a semiconductor laser module 100 is broken, removed or broken.

光學元件120係一透明透鏡、稜鏡或其他元件,其以一較大立體角在散射最小之情況下擴散或分散雷射輻射,使得其使用起來安全。在無光學元件120(或透鏡)之情況下,系統使用起來會不安全。當系統用於一行動應用中之虹膜辨識時,此尤其令人擔憂。光學元件120可為任何類型之光學透鏡。光學元件120之實例包含(但不限於)一凸透鏡、一雙凸透鏡、一等凸透鏡、一凹透鏡、一雙凹透鏡、一平凸透鏡、一平凹透鏡、一凸凹(或彎月)透鏡、一正彎月形透鏡、一負彎月透鏡及一正(或會聚)透鏡。儘管在圖1A及圖1B中將光學元件120繪示為一矩形稜鏡,然光學元件120可不限於此一形狀且可為任何類型之二維或三維形狀。例如,光學元件120可為圓形、橢圓形、卵形、正方形、矩形、三角形、五邊 形、六邊形、八邊形、三角形、圓柱形、球形、圓盤形、立方體形、圓錐形、金字塔形、三角形棱柱形、五角形棱柱形、六角形棱柱形或類似者。 The optical element 120 is a transparent lens, ridge or other element, which diffuses or disperses the laser radiation with a large solid angle with minimal scattering, making it safe to use. Without the optical element 120 (or lens), the system will be unsafe to use. This is especially worrying when the system is used for iris recognition in a mobile application. The optical element 120 can be any type of optical lens. Examples of the optical element 120 include, but are not limited to, a convex lens, a biconvex lens, an isometric lens, a concave lens, a biconcave lens, a plano-convex lens, a plano-concave lens, a convex-concave (or meniscus) lens, and a positive meniscus lens , A negative meniscus lens and a positive (or converging) lens. Although the optical element 120 is shown as a rectangular shape in FIGS. 1A and 1B, the optical element 120 is not limited to this shape and can be any type of two-dimensional or three-dimensional shape. For example, the optical element 120 may be circular, elliptical, oval, square, rectangular, triangular, five-sided Shape, hexagon, octagon, triangle, cylinder, sphere, disc, cube, cone, pyramid, triangular prism, pentagonal prism, hexagonal prism, or the like.

如圖1A中所繪示,光學元件120可用透明導電層130成膜或塗覆,透明導電層130用作用於雷射安全之一互鎖。特定言之,透明導電層130可成形為與半導體雷射110電串聯之一跡線。當光學元件120(或透鏡)破壞、破裂或斷裂時,透明導電層130(即跡線)電中斷,其致使半導體雷射110停止工作。此可防止半導體模組100變得不安全。 As shown in FIG. 1A, the optical element 120 may be formed into a film or coated with a transparent conductive layer 130, and the transparent conductive layer 130 is used as an interlock for laser safety. In particular, the transparent conductive layer 130 may be shaped as a trace electrically connected in series with the semiconductor laser 110. When the optical element 120 (or lens) is damaged, cracked or broken, the transparent conductive layer 130 (ie, the trace) is electrically interrupted, which causes the semiconductor laser 110 to stop working. This can prevent the semiconductor module 100 from becoming unsafe.

透明導電層130可由任何光學透明之導電材料製成。此等透明導電材料之實例包含(但不限於)氧化銦錫(ITO)、摻雜鋁之氧化鋅(AZO)、摻雜鎵之氧化鋅(GZO)、摻雜銦之氧化鋅(IZO)、摻雜銦之氧化鎘(CdO:In)、碳納米管、石墨烯、固有導電聚合物(ICP)、無定形氧化銦鋅及銀納米顆粒-ITO雜化物。 The transparent conductive layer 130 can be made of any optically transparent conductive material. Examples of these transparent conductive materials include (but are not limited to) indium tin oxide (ITO), aluminum-doped zinc oxide (AZO), gallium-doped zinc oxide (GZO), indium-doped zinc oxide (IZO), Indium-doped cadmium oxide (CdO: In), carbon nanotubes, graphene, intrinsically conductive polymers (ICP), amorphous indium zinc oxide and silver nanoparticles-ITO hybrids.

半導體雷射110及透明導電層130(即跡線)與印刷電路板(PCB)140電串聯,其中提供一電流。當半導體雷射模組100正常操作時(即,沒有損壞該跡線),電流可使半導體雷射110、透明導電層130及PCB 140循環。圖1B係圖1A中所繪示之半導體雷射模組100之三維圖。 The semiconductor laser 110 and the transparent conductive layer 130 (ie, the trace) are electrically connected in series with the printed circuit board (PCB) 140, and a current is provided therein. When the semiconductor laser module 100 is operating normally (ie, the trace is not damaged), the current can circulate the semiconductor laser 110, the transparent conductive layer 130, and the PCB 140. FIG. 1B is a three-dimensional view of the semiconductor laser module 100 shown in FIG. 1A.

圖2A及2B繪示光學元件220、240上之跡線230、250之實例形狀,其可與本文中所描述之任何實施例組合使用。如圖2A中所繪示,跡線230可為一彎曲(或散熱器)形狀。如圖2B中所繪示,跡線240可為一螺旋形狀。跡線230、250可具有任何類型之形狀。跡線230、250之實例形狀包含(但不限於)一彎曲形狀、一盤繞形狀、一條紋形狀、一盒形狀、一圓形形狀、一螺旋形狀及一三角形形狀。跡線230、250可部分或完全覆蓋光學元件220、240之表面。然而,跡線230、250可能需要密集 地放置於光學元件220、240之表面上,達到若發生事件則其等可偵測到光學元件220、240上之任何損壞的程度。例如,若光學元件220、240破裂或斷裂,則跡線230、250上之電流中斷。由於半導體雷射經電連接至PCB及跡線230、250,所以當光學元件220、240上之跡線230、250損壞時,可關閉該半導體雷射。跡線230、250之端點232、234、252、254可經連接至該PCB。電流可流入端點232、252且通過端點234、254流出,反之亦然。 2A and 2B show example shapes of traces 230, 250 on optical elements 220, 240, which can be used in combination with any of the embodiments described herein. As shown in FIG. 2A, the trace 230 may have a curved (or heat sink) shape. As shown in FIG. 2B, the trace 240 may have a spiral shape. The traces 230, 250 can have any type of shape. Example shapes of the traces 230, 250 include, but are not limited to, a curved shape, a coiled shape, a striped shape, a box shape, a circular shape, a spiral shape, and a triangular shape. The traces 230 and 250 may partially or completely cover the surface of the optical elements 220 and 240. However, traces 230, 250 may need to be dense The ground is placed on the surface of the optical elements 220, 240 to the extent that if an event occurs, they can detect any damage on the optical elements 220, 240. For example, if the optical element 220, 240 cracks or breaks, the current on the traces 230, 250 is interrupted. Since the semiconductor laser is electrically connected to the PCB and the traces 230, 250, when the traces 230, 250 on the optical components 220, 240 are damaged, the semiconductor laser can be turned off. The terminals 232, 234, 252, and 254 of the traces 230, 250 can be connected to the PCB. Current can flow into the terminals 232 and 252 and flow out through the terminals 234 and 254, and vice versa.

圖3A繪示當ITO跡線310未被損壞時一電流320流動通過一垂直腔表面發射雷射(VCSEL)340之一實例連接。儘管跡線310可不在其上包含一開關,然作為一實例VCSEL 340之操作可藉由表示ITO跡線330之一開關來說明。例如,當ITO跡線310上沒有損壞時,電流320流動通過VCSEL 340,好像控制VCSEL之開關(即代表ITO跡線330之開關)連接或閉合一樣。當表示ITO跡線330之開關連接或閉合時(即,在ITO跡線310上沒有損壞),電流320流入VCSEL 340,且藉此VCSEL 340可發射雷射光350。應當注意,VCSEL 340可用任何類型之半導體雷射替換,諸如雷射二極體(LD)、雙異質結構雷射(DH)、分離限制異質結構雷射(SCH)、分佈式布拉格反射器雷射(DBR)、分佈式回饋雷射(DFB)、量子井雷射、量子點雷射、量子級聯雷射(QCL)、外腔雷射(ECL)、擴展腔二極體雷射、體布拉格閘雷射、垂直外腔表面發射雷射(VECSEL)、混合矽雷射、帶間級聯雷射(ICL)、半導體環形雷射或類似者。 FIG. 3A shows an example connection of a current 320 flowing through a vertical cavity surface emitting laser (VCSEL) 340 when the ITO trace 310 is not damaged. Although the trace 310 may not include a switch thereon, the operation of the VCSEL 340 as an example can be illustrated by representing a switch of the ITO trace 330. For example, when there is no damage on the ITO trace 310, the current 320 flows through the VCSEL 340 as if the switch controlling the VCSEL (ie, the switch representing the ITO trace 330) is connected or closed. When the switch representing the ITO trace 330 is connected or closed (ie, there is no damage on the ITO trace 310), the current 320 flows into the VCSEL 340, and thereby the VCSEL 340 can emit the laser light 350. It should be noted that VCSEL 340 can be replaced with any type of semiconductor laser, such as laser diode (LD), double heterostructure laser (DH), separation confinement heterostructure laser (SCH), distributed Bragg reflector laser (DBR), Distributed Feedback Laser (DFB), Quantum Well Laser, Quantum Dot Laser, Quantum Cascade Laser (QCL), External Cavity Laser (ECL), Extended Cavity Diode Laser, Volume Bragg Gate laser, vertical external cavity surface emitting laser (VECSEL), hybrid silicon laser, interband cascade laser (ICL), semiconductor ring laser or the like.

圖3B繪示當一ITO跡線310被損壞時一電流320被中斷之一實例連接。類似於圖3A,儘管跡線310可不在其上包含一開關,然作為一實例VCSEL 340之操作可藉由表示ITO跡線330之一開關來說明。例如, 當ITO跡線310破壞、斷裂或斷裂時,電流320可能不會流動通過VCSEL 340,好像控制VCSEL之開關(即代表ITO跡線330之開關)斷開連接或斷開一樣。當表示ITO跡線330之開關斷開連接或斷開(即,在ITO跡線310上有損壞)時,VCSEL 340關閉雷射光350,藉此防止不安全之情況。 FIG. 3B shows an example connection when a current 320 is interrupted when an ITO trace 310 is damaged. Similar to FIG. 3A, although the trace 310 may not include a switch thereon, as an example, the operation of the VCSEL 340 can be illustrated by representing a switch of the ITO trace 330. E.g, When the ITO trace 310 is broken, broken or broken, the current 320 may not flow through the VCSEL 340, as if the switch controlling the VCSEL (ie, the switch representing the ITO trace 330) is disconnected or disconnected. When the switch representing the ITO trace 330 is disconnected or disconnected (ie, there is damage on the ITO trace 310), the VCSEL 340 turns off the laser light 350, thereby preventing unsafe conditions.

圖4A繪示當一場效電晶體(FET)460之閘極中之一ITO跡線410未被損壞時一電流420流動通過一VCSEL 440之一實例連接。儘管跡線410可不在其上包含一開關,然作為一實例VCSEL 440之操作可藉由表示ITO跡線430之一開關來說明。例如,當ITO跡線410上沒有損壞時,電流420流入VCSEL 440及FET,好像控制VCSEL之開關(即代表ITO跡線430之開關)連接或閉合一樣。 FIG. 4A shows an example connection of a current 420 flowing through a VCSEL 440 when one of the ITO traces 410 in the gate of a field effect transistor (FET) 460 is not damaged. Although the trace 410 may not include a switch thereon, the operation of the VCSEL 440 as an example can be illustrated by representing a switch of the ITO trace 430. For example, when there is no damage on the ITO trace 410, the current 420 flows into the VCSEL 440 and the FET, as if the switch controlling the VCSEL (that is, the switch representing the ITO trace 430) is connected or closed.

在其中ITO跡線410可能不良好地傳導電流420之情況下,FET 460及電阻器470可用以放大電流420。FET 460可經定位於VCSEL模組中之任何位置,諸如一PCB。然而,需要將其連接至跡線410以確保電流420流動通過VCSEL 440。儘管未在圖4A中繪示,然任何類型之電晶體或開關可用於FET 460。 In the case where the ITO trace 410 may not conduct the current 420 well, the FET 460 and the resistor 470 can be used to amplify the current 420. The FET 460 can be positioned anywhere in the VCSEL module, such as a PCB. However, it needs to be connected to the trace 410 to ensure that the current 420 flows through the VCSEL 440. Although not shown in FIG. 4A, any type of transistor or switch can be used for the FET 460.

類似於圖3A,當表示ITO跡線430之開關經連接(即,在ITO跡線410上沒有損壞)時,電流420流入VCSEL 440及FET 460,且藉此VCSEL 440發射雷射光450。應注意,VCSEL 440可由任何類型之半導體雷射替換,例如雷射二極體(LD)、雙異質結構雷射(DH)、分離限制異質結構雷射(SCH)、分佈式布拉格反射器雷射(DBR)、分佈式回饋雷射(DFB)、量子井雷射、量子點雷射器、量子級聯雷射(QCL)、外腔雷射(ECL)、擴展腔二極體雷射、體布拉格光柵雷射、垂直外腔表面發射雷射器(VECSEL)、混合矽雷射、帶間級聯雷射(ICL)、半導體環形雷射器或 類似者。 Similar to FIG. 3A, when the switch representing the ITO trace 430 is connected (ie, there is no damage on the ITO trace 410), the current 420 flows into the VCSEL 440 and the FET 460, and thereby the VCSEL 440 emits laser light 450. It should be noted that VCSEL 440 can be replaced by any type of semiconductor laser, such as laser diode (LD), double heterostructure laser (DH), separation confinement heterostructure laser (SCH), distributed Bragg reflector laser (DBR), Distributed Feedback Laser (DFB), Quantum Well Laser, Quantum Dot Laser, Quantum Cascade Laser (QCL), External Cavity Laser (ECL), Extended Cavity Diode Laser, Volume Bragg grating laser, vertical external cavity surface emitting laser (VECSEL), hybrid silicon laser, interband cascade laser (ICL), semiconductor ring laser or Similar.

圖4B繪示其中當一FET 460之閘極中之一ITO跡線410被損壞時一電流420被中斷之一實例連接。類似於圖4A,儘管跡線410可不在其上包含一開關,然作為一實例VCSEL 440之操作可藉由表示ITO跡線430之一開關來說明。例如,當ITO跡線410損壞、斷裂或斷裂時,電流420無法流動通過VCSEL 440及FET 460,好像控制VCSEL 440之開關(即代表ITO跡線430之開關)斷開連接或斷開一樣。當表示ITO跡線430之開關斷開連接或斷開(即,在ITO跡線410上有損壞)時,VCSEL 440關閉雷射光450,藉此防止不安全之情況。 FIG. 4B shows an example connection in which a current 420 is interrupted when one of the ITO traces 410 in the gate of a FET 460 is damaged. Similar to FIG. 4A, although the trace 410 may not include a switch thereon, the operation of the VCSEL 440 as an example can be illustrated by representing a switch of the ITO trace 430. For example, when the ITO trace 410 is damaged, broken or broken, the current 420 cannot flow through the VCSEL 440 and the FET 460, as if controlling the switch of the VCSEL 440 (ie, the switch representing the ITO trace 430) to disconnect or disconnect. When the switch representing the ITO trace 430 is disconnected or disconnected (ie, there is damage on the ITO trace 410), the VCSEL 440 turns off the laser light 450, thereby preventing unsafe conditions.

圖5繪示用於使用一光學元件提供雷射安全性之一實例程序,該光學元件由一透明導電材料成膜或塗覆,該透明導電材料作為一半導體雷射模組上之一互鎖。此實例程序可與本文中所描述之任何實施例組合使用。例如,在步驟510處,一半導體雷射模組中之一半導體雷射通過一光學元件或透鏡發射雷射光。與該半導體雷射耦合之光學元件可分散或漫射自該半導體雷射發射之雷射光。該光學元件可由一透明導電材料成膜或塗覆,該透明導電材料作為該半導體雷射上之一互鎖。該透明導電材料之實例包含氧化銦錫(ITO)、摻雜鋁之氧化鋅(AZO)、摻雜鎵之氧化鋅(GZO)、摻雜銦之氧化鋅(IZO)、摻雜銦之氧化鎘(CdO:In)、碳納米管、石墨烯、固有導電聚合物(ICP)、無定形氧化銦鋅、銀納米顆粒-ITO雜化物、或其等之任何組合。 Figure 5 shows an example program for using an optical element to provide laser safety, the optical element is formed or coated with a transparent conductive material, the transparent conductive material as an interlock on a semiconductor laser module . This example program can be used in combination with any of the embodiments described herein. For example, at step 510, a semiconductor laser in a semiconductor laser module emits laser light through an optical element or lens. The optical element coupled with the semiconductor laser can disperse or diffuse the laser light emitted from the semiconductor laser. The optical element can be formed into a film or coated with a transparent conductive material, which acts as an interlock on the semiconductor laser. Examples of the transparent conductive material include indium tin oxide (ITO), aluminum doped zinc oxide (AZO), gallium doped zinc oxide (GZO), indium doped zinc oxide (IZO), indium doped cadmium oxide (CdO: In), carbon nanotubes, graphene, intrinsically conductive polymers (ICP), amorphous indium zinc oxide, silver nanoparticles-ITO hybrid, or any combination thereof.

該透明導電材料可放置成可偵測該光學元件上之損壞之任何形狀。例如,其可為一跡線之形狀。該透明導電材料之形狀之實例包含一彎曲形狀、一散熱器形狀、一螺旋形狀、一圓形形狀、一多邊形形狀、 一三角形形狀、一正方形形狀、一矩形形狀、一梯形形狀或類似者。該跡線可與該半導體雷射電串聯,以使該電流自一PCB流動至該半導體雷射。在該跡線損壞、破裂或斷裂之情況下,該跡線被電中斷,其致使該半導體雷射在步驟530處停止操作或關閉。 The transparent conductive material can be placed in any shape that can detect damage on the optical element. For example, it can be in the shape of a trace. Examples of the shape of the transparent conductive material include a curved shape, a heat sink shape, a spiral shape, a circular shape, a polygonal shape, A triangular shape, a square shape, a rectangular shape, a trapezoidal shape or the like. The trace can be connected in series with the semiconductor laser so that the current flows from a PCB to the semiconductor laser. In the event that the trace is damaged, cracked or broken, the trace is electrically interrupted, which causes the semiconductor laser to stop operating or shut down at step 530.

本文中所描述之實施例可併入一透鏡上之任何合適透明導電膜或塗層中,該透明導電膜或塗層作為一半導體雷射模組上之一互鎖。本發明之實施例不限於所繪示之特定結構。應當注意,上述一光學元件上之跡線之形狀僅為許多其他可能性之一個實例或情況。 The embodiments described herein can be incorporated into any suitable transparent conductive film or coating on a lens that interlocks as one of the semiconductor laser modules. The embodiments of the present invention are not limited to the specific structure shown. It should be noted that the shape of the trace on an optical element described above is only one example or case of many other possibilities.

本文中所描述之用於作為一半導體雷射模組上之一互鎖之透鏡上之一透明導電膜或塗層之一方法及設備之非限制性方法可經修改用於各種應用及用途,同時保持在申請專利範圍之精神及範圍內。本文中所描述及/或附圖中所展示之實施方式及變型僅作為實例呈現,且不限制於範圍及精神。本文中之描述可適於用於作為一半導體雷射模組上之一互鎖之一透鏡上之一透明導電膜或塗層之方法及設備之所有實施方案,然其可關於一特定實方案進行描述。 The non-limiting method and equipment described herein for a transparent conductive film or coating on an interlocking lens of a semiconductor laser module can be modified for various applications and uses. At the same time, stay within the spirit and scope of the patent application. The implementations and modifications described herein and/or shown in the drawings are presented as examples only, and are not limited in scope and spirit. The description in this article can be applied to all implementations of methods and equipment used as a transparent conductive film or coating on an interlocking lens on a semiconductor laser module, but it can be related to a specific implementation. Describe.

如本文中所描述,本文中所描述之方法不限於執行任何特定功能之任何特定元件,且所呈現之方法之一些步驟不一定以所示順序發生。例如,在一些情況下,兩個或更多個方法步驟可以一不同順序或同時發生。另外,所描述之方法之一些步驟可為可選的(即使沒有明確說明為可選的),因此可省略。本文中所揭示之方法之此等及其他變化將為顯而易見的,尤其係鑑於本文中所描述之一方法及設備之描述,且被認為在本發明之全部範疇內。 As described herein, the methods described herein are not limited to any specific elements that perform any specific functions, and some steps of the presented methods do not necessarily occur in the order shown. For example, in some cases, two or more method steps may occur in a different order or simultaneously. In addition, some steps of the described method may be optional (even if not explicitly stated as optional), and therefore may be omitted. These and other variations of the methods disclosed herein will be obvious, especially in view of the description of one of the methods and devices described herein, and are considered to be within the full scope of the present invention.

可省略一些實施方案之一些特徵與其他實施方案一起實 施。本文中所描述之裝置元件及方法元件為可互換,且可在本文中所描述之任何實例或實施方案中使用或自其省略。 Some features of some embodiments can be omitted and implemented together with other embodiments Shi. The device elements and method elements described herein are interchangeable, and can be used in or omitted from any examples or implementations described herein.

儘管以上以特定組合描述特徵及元件,然各特徵或元件可在沒有其他特徵及元件之情況下單獨使用,或在具有或沒有其他特徵及元件之情況下以各種組合使用。 Although the features and elements are described above in specific combinations, each feature or element can be used alone without other features and elements, or in various combinations with or without other features and elements.

100‧‧‧半導體雷射模組 100‧‧‧Semiconductor laser module

110‧‧‧半導體雷射 110‧‧‧Semiconductor laser

120‧‧‧光學元件 120‧‧‧Optical components

130‧‧‧透明導電層 130‧‧‧Transparent conductive layer

140‧‧‧印刷電路板(PCB) 140‧‧‧Printed Circuit Board (PCB)

Claims (17)

一種半導體雷射模組,其包括:一半導體雷射;及一光學元件,其可與該半導體雷射操作地耦合以分散(disperse)自該半導體雷射發射之雷射光,其中該光學元件塗覆有以一跡線(trace)之形式作為該半導體雷射上之一互鎖(interlock)之一透明導電材料,該跡線覆蓋該光學元件相對於該半導體雷射之一表面之至少一實質部分。 A semiconductor laser module includes: a semiconductor laser; and an optical element operatively coupled with the semiconductor laser to disperse the laser light emitted from the semiconductor laser, wherein the optical element is coated Covered with a transparent conductive material in the form of a trace as an interlock on the semiconductor laser, and the trace covers at least a substantial portion of the optical element relative to a surface of the semiconductor laser section. 如請求項1之半導體雷射模組,其中該透明導電材料包含氧化銦錫(ITO)、摻雜鋁之氧化鋅(AZO)、摻雜鎵之氧化鋅(GZO)或摻雜銦之氧化鋅(IZO)之至少一者。 The semiconductor laser module of claim 1, wherein the transparent conductive material includes indium tin oxide (ITO), aluminum-doped zinc oxide (AZO), gallium-doped zinc oxide (GZO), or indium-doped zinc oxide (IZO) at least one. 如請求項1之半導體雷射模組,其中該跡線與該半導體雷射電串聯。 Such as the semiconductor laser module of claim 1, wherein the trace is connected in series with the semiconductor laser. 如請求項1之半導體雷射模組,其中在該跡線損壞之一條件下中斷自該半導體雷射發射之該雷射光。 The semiconductor laser module of claim 1, wherein the laser light emitted from the semiconductor laser is interrupted under one of the conditions that the trace is damaged. 如請求項1之半導體雷射模組,其中該透明導電材料覆蓋與該光學元件相對於該半導體雷射之該表面相鄰之該光學元件之至少一側壁之大部分。 The semiconductor laser module of claim 1, wherein the transparent conductive material covers most of the at least one sidewall of the optical element adjacent to the surface of the semiconductor laser. 如請求項5之半導體雷射模組,其中:至該跡線之連接延伸至相對側壁,且該透明導電材料覆蓋與該光學元件相對於該半導體雷射之該表面相鄰之該光學元件之相對側壁之大部分。 The semiconductor laser module of claim 5, wherein: the connection to the trace extends to opposite sidewalls, and the transparent conductive material covers the optical element adjacent to the surface of the optical element with respect to the semiconductor laser Opposite most of the side wall. 如請求項1之半導體雷射模組,其中該跡線經形成為延伸跨越該光學元件相對於該半導體雷射之該表面之幾乎所有部分之一散熱器(radiator)形狀。 The semiconductor laser module of claim 1, wherein the trace is formed as a radiator shape that extends across almost all portions of the optical element relative to the surface of the semiconductor laser. 如請求項7之半導體雷射模組,其中至該跡線之連接係位於與該光學元件相對於該半導體雷射之該表面相鄰之該光學元件之一相同側壁之相對側。 The semiconductor laser module of claim 7, wherein the connection to the trace is located on the opposite side of the same side wall of the optical element adjacent to the surface of the semiconductor laser. 如請求項1之半導體雷射模組,其中該跡線經形成為延伸跨越該光學元件相對於該半導體雷射之該表面之幾乎所有部分之螺旋形狀。 The semiconductor laser module of claim 1, wherein the trace is formed as a spiral shape extending across almost all parts of the surface of the optical element with respect to the semiconductor laser. 如請求項9之半導體雷射模組,其中至該跡線之連接於與該光學元件相對於該半導體雷射之該表面相鄰之該光學元件之一相同側壁之相同側彼此鄰接。 The semiconductor laser module of claim 9, wherein the same side of the same side wall of the optical element connected to the optical element adjacent to the surface of the semiconductor laser adjoins each other to the trace. 如請求項1之半導體雷射模組,其中該跡線完整覆蓋該光學元件相對於該半導體雷射之該表面。 The semiconductor laser module of claim 1, wherein the trace completely covers the surface of the optical element relative to the semiconductor laser. 如請求項1之半導體雷射模組,其中該跡線將一電流直接提供至該半導體雷射之一陽極或一陰極。 The semiconductor laser module of claim 1, wherein the trace directly supplies a current to an anode or a cathode of the semiconductor laser. 如請求項1之半導體雷射模組,其中該跡線將一電流提供至與該半導體雷射串聯連接之一電晶體之一閘極,該電晶體用於控制通過該半導體雷射之電流。 The semiconductor laser module of claim 1, wherein the trace provides a current to a gate of a transistor connected in series with the semiconductor laser, and the transistor is used to control the current passing through the semiconductor laser. 一種中斷雷射光之方法,其包括:自一半導體雷射發射雷射光;在與該半導體雷射操作地耦合之一光學元件處分散自該半導體雷射發射之該雷射光;及在該光學元件損壞之一條件下中斷該雷射光,其中該光學元件塗覆有一跡線之形式之一透明導電材料,該跡線覆蓋該光學元件相對於該半導體雷射之一表面之至少一實質部分並作為該半導體雷射上之一互鎖。 A method of interrupting laser light, comprising: emitting laser light from a semiconductor laser; dispersing the laser light emitted from the semiconductor laser at an optical element operatively coupled with the semiconductor laser; and in the optical element The laser light is interrupted under a condition of damage, wherein the optical element is coated with a transparent conductive material in the form of a trace, and the trace covers at least a substantial part of a surface of the optical element with respect to the semiconductor laser and serves as One of the semiconductor lasers is interlocked. 如請求項14之方法,其中該透明導電材料包含氧化銦錫(ITO)、摻雜鋁之氧化鋅(AZO)、摻雜鎵之氧化鋅(GZO)或摻雜銦之氧化鋅(IZO)之至少一者。 The method of claim 14, wherein the transparent conductive material comprises indium tin oxide (ITO), aluminum-doped zinc oxide (AZO), gallium-doped zinc oxide (GZO), or indium-doped zinc oxide (IZO) At least one. 如請求項14之方法,其中該跡線與該半導體雷射電串聯。 The method of claim 14, wherein the trace is connected in series with the semiconductor laser. 如請求項14之方法,其中在該跡線損壞之一條件下中斷自該半導體雷射發射之該雷射光。 The method of claim 14, wherein the laser light emitted from the semiconductor laser is interrupted under a condition of the trace damage.
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