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TWI718373B - Force sensor and manufacture method thereof - Google Patents

Force sensor and manufacture method thereof Download PDF

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Publication number
TWI718373B
TWI718373B TW107115601A TW107115601A TWI718373B TW I718373 B TWI718373 B TW I718373B TW 107115601 A TW107115601 A TW 107115601A TW 107115601 A TW107115601 A TW 107115601A TW I718373 B TWI718373 B TW I718373B
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Taiwan
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substrate
bump
force sensor
package body
integrated circuit
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TW107115601A
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Chinese (zh)
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TW201947198A (en
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曾立天
錢元晧
郭致良
葉裕德
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大陸商蘇州明皜傳感科技有限公司
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Publication of TWI718373B publication Critical patent/TWI718373B/en

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Abstract

A force sensor includes a first substrate, a second substrate, a third substrate, and a package body. The first substrate includes a fixed electrode, at least one first conductive contact, and at least one second conductive contact. The second substrate is disposed on the first substrate and electrically connected to the first conductive contact of the first substrate. The second substrate includes a micro-electro-mechanical system (MEMS) element corresponding to the fixed electrode. The third substrate is disposed on the second substrate and includes a pillar connected to the MEMS element. The package covers the third substrate. The foregoing force sensor has better reliability.

Description

力量感測器以及其製造方法 Force sensor and its manufacturing method

本發明是有關一種力量感測器以及其製造方法,特別是一種以微機電系統裝置所實現之力量感測器以及其製造方法。 The present invention relates to a force sensor and a manufacturing method thereof, in particular to a force sensor realized by a micro-electromechanical system device and a manufacturing method thereof.

自1970年代微機電系統(Microelectromechanical System,MEMS)裝置概念成形起,微機電系統裝置已從實驗室的探索對象進步至成為高階系統整合的對象,並已在大眾消費性裝置中有廣泛的應用,展現了驚人且穩定的成長。微機電系統裝置包含一可動之微機電系統元件,藉由感測或控制可動之微機電系統元件之運動物理量可實現微機電系統裝置的各項功能。力量感測器即為一例,其可偵測是否產生按壓動作及/或按壓的力道。 Since the formation of the concept of Microelectromechanical System (MEMS) devices in the 1970s, MEMS devices have progressed from being the object of laboratory exploration to being the object of high-level system integration, and have been widely used in mass consumer devices. Shows amazing and stable growth. The MEMS device includes a movable MEMS element, and various functions of the MEMS device can be realized by sensing or controlling the motion physical quantity of the movable MEMS element. An example is a force sensor, which can detect whether a pressing action and/or pressing force is generated.

習知之力量感測器主要有壓電電阻器式(piezoresistor)壓力感測器以及電容式壓力感測器。請參照圖1,習知之壓電電阻器式壓力感測器是在可動薄膜11上設置多個壓電電阻器12。當按壓的應力導致可動薄膜11產生形變時,壓電電阻器12即產生相對應之偵測訊號。請參照圖2,習知之電容式壓力感測器包含一可動薄膜21以及一固定電極22,其中可動薄膜21與固定電極22相對應,以構成一感測電容。感測電容所產生之偵測訊號則透過引線23輸出至一特定應用積體電路晶片24進行處理。可以理解的是,為了保護裝置,上述元件需以封裝體25 加以封裝。而按壓所產生之應力則透過封裝體25造成可動薄膜21產生形變,並使感測電容輸出相對應之偵測訊號。 The conventional force sensors mainly include piezoresistor pressure sensors and capacitive pressure sensors. Please refer to FIG. 1, the conventional piezoresistor type pressure sensor is provided with a plurality of piezoresistors 12 on the movable film 11. When the pressing stress causes the movable film 11 to deform, the piezoelectric resistor 12 generates a corresponding detection signal. Please refer to FIG. 2, the conventional capacitive pressure sensor includes a movable film 21 and a fixed electrode 22, wherein the movable film 21 corresponds to the fixed electrode 22 to form a sensing capacitor. The detection signal generated by the sensing capacitor is output to a specific application integrated circuit chip 24 for processing through the lead 23. It can be understood that, in order to protect the device, the above-mentioned components need to be packaged with a package body 25 To be packaged. The stress generated by pressing causes deformation of the movable film 21 through the package body 25 and causes the sensing capacitor to output a corresponding detection signal.

依據上述結構,反覆按壓所產生之應力可能導致封裝體25及/或打線的可靠度降低,甚至損毀可動薄膜。此外,按壓所產生之應力大小僅能透過封裝體25之厚度來控制,因此不同規格之力量感測器不容易以標準的組裝製程進行封裝。有鑑於此,如何提升力量感測器之可靠度以及標準化封裝製程便是目前極需努力的目標。 According to the above structure, the stress generated by repeated pressing may reduce the reliability of the package body 25 and/or the wire bonding, and even damage the movable film. In addition, the magnitude of the stress generated by pressing can only be controlled by the thickness of the package body 25, so it is not easy to package force sensors of different specifications by a standard assembly process. In view of this, how to improve the reliability of the force sensor and standardize the packaging process is the goal that needs to be worked hard at present.

本發明提供一種力量感測器以及其製造方法,其是設置一第三基板於一封裝體以及一微機電系統元件之間,以作為微機電系統元件之蓋體,蓋體且與微機電系統元件連接,使微機電系統元件隨著蓋體形變而產生相對應之運動量。依據此結構,力量感測器內之引線可遠離按壓所產生之應力源,且微機電系統元件不易因反覆按壓而損壞,因此裝置之可靠度可大幅提升。此外,不同規格之力量感測器可藉由調整第三基板之厚度加以控制,因此不同規格之力量感測器能夠以相同之組裝製程進行封裝。 The present invention provides a force sensor and a manufacturing method thereof. A third substrate is provided between a package body and a MEMS element to serve as the cover of the MEMS element, and the cover is in contact with the MEMS element. The components are connected, so that the MEMS components produce corresponding motions along with the deformation of the cover. According to this structure, the leads in the force sensor can be far away from the stress source generated by pressing, and the MEMS components are not easily damaged by repeated pressing, so the reliability of the device can be greatly improved. In addition, the force sensors of different specifications can be controlled by adjusting the thickness of the third substrate, so the force sensors of different specifications can be packaged by the same assembly process.

本發明一實施例之力量感測器包含一第一基板、一第二基板、一第三基板以及一封裝體。第一基板包含一固定電極、至少一第一導電接點以及至少一第二導電接點。第二基板包含一第一表面、一相對之第二表面以及一微機電系統元件,其與固定電極相對應,其中第二基板以第一表面朝向第一基板設置於第一基板,並與第一基板之第一導電接點電性連接。第三基板設置於第二基板之第二表面,其中第三基板包含一凸柱,其與微機電系統元件連接。封裝體則覆蓋第三基板。 A force sensor according to an embodiment of the present invention includes a first substrate, a second substrate, a third substrate, and a package. The first substrate includes a fixed electrode, at least one first conductive contact, and at least one second conductive contact. The second substrate includes a first surface, an opposite second surface, and a microelectromechanical system element, which corresponds to the fixed electrode. The second substrate is disposed on the first substrate with the first surface facing the first substrate, and is connected to the The first conductive contact of a substrate is electrically connected. The third substrate is disposed on the second surface of the second substrate, wherein the third substrate includes a protrusion, which is connected with the microelectromechanical system component. The package body covers the third substrate.

本發明另一實施例之力量感測器之製造方法包含提供一第三基板,並定義出至少一第一連接部以及一凸柱;提供一第二基板,其包含一第一表面以及一相對之第二表面;以第二表面朝向第三基板,接合第二基板於第三基板之第一連接部以及凸柱;於第二基板之第一表面定義出至少一第二連接部;於第二基板定義出一微機電系統元件,其中微機電系統元件與凸柱連接;提供一第一基板,其包含一固定電極、至少一第一導電接點以及至少一第二導電接點;接合第一基板以及第二基板,其中至少一第一導電接點與至少一第二連接部電性連接,且微機電系統元件與固定電極相對應;以及以一封裝體覆蓋第三基板。 A method of manufacturing a force sensor according to another embodiment of the present invention includes providing a third substrate and defining at least one first connecting portion and a protrusion; providing a second substrate including a first surface and an opposite The second surface; with the second surface facing the third substrate, join the second substrate to the first connection portion and the protruding post of the third substrate; define at least one second connection portion on the first surface of the second substrate; The two substrates define a MEMS element, wherein the MEMS element is connected to the bump; a first substrate is provided, which includes a fixed electrode, at least one first conductive contact, and at least one second conductive contact; A substrate and a second substrate, in which at least one first conductive contact is electrically connected to at least one second connection portion, and the MEMS element corresponds to the fixed electrode; and a package body covers the third substrate.

以下藉由具體實施例配合所附的圖式詳加說明,當更容易瞭解本發明之目的、技術內容、特點及其所達成之功效。 The following detailed descriptions are provided with specific embodiments and accompanying drawings to make it easier to understand the purpose, technical content, characteristics and effects of the present invention.

11:可動薄膜 11: Movable film

12:壓電電阻器 12: Piezo resistor

21:可動薄膜 21: Movable film

22:固定電極 22: fixed electrode

23:引線 23: Lead

24:特定應用積體電路晶片 24: Integrated circuit chips for specific applications

25:封裝體 25: Package body

31:第一基板 31: The first substrate

311:固定電極 311: fixed electrode

312:第一導電接點 312: The first conductive contact

313:第二導電接點 313: second conductive contact

314:參考電極 314: Reference electrode

32:第二基板 32: second substrate

32a:第一表面 32a: first surface

32b:第二表面 32b: second surface

321:第二連接部 321: second connecting part

322:導電材料 322: conductive material

323:微機電系統元件 323: MEMS components

324:參考元件 324: Reference Components

33:第三基板 33: third substrate

331:第一連接部 331: first connection part

332:凸柱 332: Convex Column

333:凹槽 333: Groove

34:封裝基板 34: Package substrate

341:外部導電接點 341: External conductive contact

35a、35b:引線 35a, 35b: lead

36:封裝體 36: Package body

361:突出部 361: protruding part

37:特定應用積體電路晶片 37: Application-specific integrated circuit chip

38:突出件 38: Protruding pieces

381:凸塊 381: bump

382:平板 382: Tablet

383:連接腳 383: connecting pin

39:膠體 39: colloid

圖1為一示意圖,顯示習知之壓電電阻器式壓力感測器。 Figure 1 is a schematic diagram showing a conventional piezoresistor pressure sensor.

圖2為一示意圖,顯示習知之電容式壓力感測器。 Figure 2 is a schematic diagram showing a conventional capacitive pressure sensor.

圖3為一示意圖,顯示本發明第一實施例之力量感測器。 Fig. 3 is a schematic diagram showing the force sensor according to the first embodiment of the present invention.

圖4為一示意圖,顯示本發明第二實施例之力量感測器。 Fig. 4 is a schematic diagram showing the force sensor according to the second embodiment of the present invention.

圖5為一俯視示意圖,顯示本發明第三實施例之力量感測器之第二基板。 FIG. 5 is a schematic top view showing the second substrate of the force sensor according to the third embodiment of the present invention.

圖6為一示意圖,顯示本發明第四實施例之力量感測器。 Fig. 6 is a schematic diagram showing the force sensor of the fourth embodiment of the present invention.

圖7為一示意圖,顯示本發明第五實施例之力量感測器。 Fig. 7 is a schematic diagram showing the force sensor of the fifth embodiment of the present invention.

圖8為一示意圖,顯示本發明第六實施例之力量感測器。 Fig. 8 is a schematic diagram showing the force sensor of the sixth embodiment of the present invention.

圖9為一示意圖,顯示本發明第七實施例之力量感測器。 Fig. 9 is a schematic diagram showing the force sensor of the seventh embodiment of the present invention.

圖10為一俯視示意圖,顯示本發明第七實施例之力量感測器之突出件。 Fig. 10 is a schematic top view showing the protrusion of the force sensor of the seventh embodiment of the present invention.

圖11為一示意圖,顯示本發明第八實施例之力量感測器。 Fig. 11 is a schematic diagram showing the force sensor of the eighth embodiment of the present invention.

圖12為一示意圖,顯示本發明第九實施例之力量感測器。 Fig. 12 is a schematic diagram showing the force sensor of the ninth embodiment of the present invention.

圖13為一示意圖,顯示本發明第十實施例之力量感測器。 FIG. 13 is a schematic diagram showing the force sensor of the tenth embodiment of the present invention.

圖14a至圖14j為示意圖,顯示本發明第一實施例之力量感測器之製造步驟。 14a to 14j are schematic diagrams showing the manufacturing steps of the force sensor according to the first embodiment of the present invention.

以下將詳述本發明之各實施例,並配合圖式作為例示。除了這些詳細說明之外,本發明亦可廣泛地施行於其它的實施例中,任何所述實施例的輕易替代、修改、等效變化都包含在本發明之範圍內,並以申請專利範圍為準。在說明書的描述中,為了使讀者對本發明有較完整的瞭解,提供了許多特定細節;然而,本發明可能在省略部分或全部特定細節的前提下,仍可實施。此外,眾所周知的步驟或元件並未描述於細節中,以避免對本發明形成不必要之限制。圖式中相同或類似之元件將以相同或類似符號來表示。特別注意的是,圖式僅為示意之用,並非代表元件實際之尺寸或數量,有些細節可能未完全繪出,以求圖式之簡潔。 Hereinafter, various embodiments of the present invention will be described in detail, and the drawings will be used as examples. In addition to these detailed descriptions, the present invention can also be widely implemented in other embodiments, and easy substitutions, modifications, and equivalent changes of any of the embodiments are included in the scope of the present invention, and the scope of the patent application is quasi. In the description of the specification, in order to enable the reader to have a more complete understanding of the present invention, many specific details are provided; however, the present invention may still be implemented under the premise of omitting some or all of the specific details. In addition, well-known steps or elements are not described in details to avoid unnecessary limitation of the present invention. The same or similar elements in the drawings will be represented by the same or similar symbols. It is especially important to note that the drawings are for illustrative purposes only, and do not represent the actual size or quantity of the components. Some details may not be completely drawn in order to keep the drawings concise.

請參照圖3,本發明之一實施例之力量感測器包含一第一基板31、一第二基板32、一第三基板33以及一封裝體36。第一基板31包含一固定電極311、至少一第一導電接點312以及至少一第二導電接點313。於圖3所示之實施例中,第一基板31包含多個金屬層,且彼此以內連接結構連接而形成所需之電路。最上層之金屬層部分曝露於第一基板31之表面,以作為固定電極311、第一導電接點312以及第二導電接點313。 Please refer to FIG. 3, a force sensor according to an embodiment of the present invention includes a first substrate 31, a second substrate 32, a third substrate 33 and a package body 36. The first substrate 31 includes a fixed electrode 311, at least one first conductive contact 312 and at least one second conductive contact 313. In the embodiment shown in FIG. 3, the first substrate 31 includes a plurality of metal layers, which are connected to each other by an internal connection structure to form a required circuit. The uppermost metal layer is partially exposed on the surface of the first substrate 31 to serve as the fixed electrode 311, the first conductive contact 312 and the second conductive contact 313.

第二基板32包含一第一表面(即圖3所示之第二基板32之朝下表面)、一相對之第二表面以及一微機電系統元件323。第二基板32以第一表面朝向 第一基板31設置於第一基板31,並與第一基板31之第一導電接點312電性連接。舉例而言,第二基板32以至少一第二連接部321以及第二連接部321端部之導電材料322與第一基板31之第一導電接點312接合。微機電系統元件323與第一基板31之固定電極311相對應,以形成一感測電容。可以理解的是,隨著微機電系統元件323相對於固定電極311運動將造成感測電容之電容值變化,並輸出相對應之偵測訊號。 The second substrate 32 includes a first surface (ie, the downwardly facing surface of the second substrate 32 shown in FIG. 3 ), an opposite second surface, and a microelectromechanical system element 323. The second substrate 32 faces the first surface The first substrate 31 is disposed on the first substrate 31 and is electrically connected to the first conductive contact 312 of the first substrate 31. For example, the second substrate 32 is joined to the first conductive contact 312 of the first substrate 31 by at least one second connecting portion 321 and the conductive material 322 at the end of the second connecting portion 321. The MEMS element 323 corresponds to the fixed electrode 311 of the first substrate 31 to form a sensing capacitor. It can be understood that as the MEMS element 323 moves relative to the fixed electrode 311, the capacitance value of the sensing capacitor will change, and a corresponding detection signal will be output.

第三基板33設置於第二基板32之第二表面(即圖3所示之第二基板32之朝上表面)。舉例而言,第三基板33藉由第一連接部331與第二基板32之第二表面連接,以作為蓋體。此外,第三基板33包含一凸柱332,其與第二基板32之微機電系統元件323連接。封裝體36則覆蓋於第三基板33上。舉例而言,接合後之第一基板31、第二基板32以及第三基板33設置封裝基板34上,接著透過打線製程以引線35a電性連接第一基板31之第二導電接點313以及封裝基板34,最後再以封裝體36包覆第一基板31、第二基板32、第三基板33以及引線35a,以保護上述元件。第一基板31即可透過第二導電接點313以及封裝基板34之外部導電接點341與外部電性連接。 The third substrate 33 is disposed on the second surface of the second substrate 32 (ie, the upper surface of the second substrate 32 shown in FIG. 3). For example, the third substrate 33 is connected to the second surface of the second substrate 32 through the first connecting portion 331 to serve as a cover. In addition, the third substrate 33 includes a protrusion 332 which is connected to the MEMS element 323 of the second substrate 32. The package body 36 covers the third substrate 33. For example, the bonded first substrate 31, second substrate 32, and third substrate 33 are placed on the package substrate 34, and then the second conductive contact 313 of the first substrate 31 and the package are electrically connected with the lead 35a through a wire bonding process. The substrate 34 is finally covered with a package 36 to cover the first substrate 31, the second substrate 32, the third substrate 33 and the leads 35a to protect the above-mentioned components. The first substrate 31 can be electrically connected to the outside through the second conductive contact 313 and the external conductive contact 341 of the package substrate 34.

依據圖3所示之結構,當第三基板33受到按壓而產生形變時,微機電系統元件323將藉由凸柱332而隨著第三基板33運動。藉由量測感測電容之電容值變化量,力量感測器即可判斷是否被按壓以及按壓的力道。換言之,本發明之力量感測器之微機電系統元件323不會直接承受按壓之應力,因此不易因反覆按壓而損壞。此外,如圖3所示,設置第三基板33可使力量感測器內之引線35a遠離按壓所產生之應力源,因此打線以及裝置之可靠度可大幅提升。另需說明的是,本發明之力量感測器除了可藉由調整微機電系統元件323之厚度、微機電系統元件323之彈性臂設計以及封裝體之厚度或材料來調整不同的量測範圍,還能 夠藉由調整第三基板之厚度來控制不同的量測範圍,例如10牛頓、100牛頓或更高。因此,不同量測範圍之力量感測器能夠以相同之組裝製程進行封裝。 According to the structure shown in FIG. 3, when the third substrate 33 is pressed and deformed, the MEMS element 323 will move with the third substrate 33 through the protrusion 332. By measuring the change in capacitance value of the sensing capacitor, the force sensor can determine whether it is pressed and the force of the pressing. In other words, the MEMS element 323 of the force sensor of the present invention does not directly bear the stress of pressing, and therefore is not easily damaged by repeated pressing. In addition, as shown in FIG. 3, the third substrate 33 is provided to keep the leads 35a in the force sensor away from the stress source caused by pressing, so that the reliability of the wire bonding and the device can be greatly improved. It should also be noted that the force sensor of the present invention can adjust different measurement ranges by adjusting the thickness of the MEMS device 323, the elastic arm design of the MEMS device 323, and the thickness or material of the package. Can still It is possible to control different measurement ranges by adjusting the thickness of the third substrate, such as 10 Newtons, 100 Newtons or higher. Therefore, force sensors with different measurement ranges can be packaged with the same assembly process.

於一實施例中,第一基板31可包含驅動電路及/或感測電路等。舉例而言,於第一基板31中可使用類比及/或數位電路,其通常係以特定應用積體電路(Application-specific integrated circuit,ASIC)設計之電路實施。但不限於此,於一實施例中,第一基板31亦可稱為電極基板。舉例而言,第一基板10可為任何具有適宜機械剛性的基板,包括互補式金氧半導體(CMOS)基板、玻璃基板等。請參照圖4,本發明之力量感測器包含一特定應用積體電路晶片37。圖4所示之實施例中,第一基板31堆疊於特定應用積體電路晶片37上,第一基板31之第二導電接點313以引線35a與特定應用積體電路晶片37電性連接,特定應用積體電路晶片37再以引線35b與封裝基板34電性連接。依據此架構,第一基板31即可透過第二導電接點313、特定應用積體電路晶片37以及封裝基板34之外部導電接點341與外部電性連接。可以理解的是,第一基板31與特定應用積體電路晶片並列設置亦能夠實現本發明之力量感測器。 In an embodiment, the first substrate 31 may include a driving circuit and/or a sensing circuit, etc. For example, analog and/or digital circuits can be used in the first substrate 31, which are usually implemented by circuits designed with application-specific integrated circuits (ASIC). However, it is not limited thereto. In an embodiment, the first substrate 31 may also be referred to as an electrode substrate. For example, the first substrate 10 can be any substrate with suitable mechanical rigidity, including a complementary metal oxide semiconductor (CMOS) substrate, a glass substrate, and the like. Please refer to FIG. 4, the force sensor of the present invention includes an application-specific integrated circuit chip 37. In the embodiment shown in FIG. 4, the first substrate 31 is stacked on the application-specific integrated circuit chip 37, and the second conductive contacts 313 of the first substrate 31 are electrically connected to the application-specific integrated circuit chip 37 by leads 35a. The integrated circuit chip 37 for a specific application is electrically connected to the package substrate 34 by leads 35b. According to this structure, the first substrate 31 can be electrically connected to the outside through the second conductive contacts 313, the application-specific integrated circuit chip 37, and the external conductive contacts 341 of the packaging substrate 34. It can be understood that the parallel arrangement of the first substrate 31 and the integrated circuit chip for a specific application can also realize the force sensor of the present invention.

請再參照圖3,於一實施例中,第一基板31更包含至少一參考電極314,而第二基板32包含至少一參考元件324,其與第一基板31之參考電極314相對應,以形成一參考電容。參考電容能夠與感測電容組成一差分電容對,如此可提升量測之精確度。需說明的是,第二基板32之參考元件324可為一固定元件,如圖3所示。但不限於此,第二基板32之參考元件324亦可為一可動元件。舉例而言,請參照圖5,第二基板32之微機電系統元件323以及參考元件324以第二連接部321作為錨點,形成類似一蹺蹺板結構。依據此結構,微機電系統元件323受到按壓應力而向下運動時,參考元件324將向上運動,因此,微機電系統元件323之微小運動量可藉由感測電容之變化量以及參考電容之變化量之差值量測出來,進而提升量測之精確度。 3 again, in one embodiment, the first substrate 31 further includes at least one reference electrode 314, and the second substrate 32 includes at least one reference element 324, which corresponds to the reference electrode 314 of the first substrate 31 to Form a reference capacitor. The reference capacitor and the sensing capacitor can form a differential capacitor pair, which can improve the accuracy of the measurement. It should be noted that the reference element 324 of the second substrate 32 may be a fixed element, as shown in FIG. 3. But not limited to this, the reference element 324 of the second substrate 32 may also be a movable element. For example, referring to FIG. 5, the MEMS component 323 and the reference component 324 of the second substrate 32 use the second connecting portion 321 as an anchor point to form a structure similar to a seesaw. According to this structure, when the MEMS element 323 moves downward under the pressing stress, the reference element 324 will move upward. Therefore, the micro-movement of the MEMS element 323 can be measured by the change in capacitance and the change in the reference capacitance. The difference is measured to improve the accuracy of the measurement.

請參照圖6,於一實施例中,封裝體36包含一突出部361。突出部361與微機電系統元件323相對應。換言之,突出部361與第三基板33相對應,更精確而言,突出部361與第三基板33之凸柱332相對應。依據此結構,當組裝公差導致不同偏移量時,突出部361能夠使按壓之應力集中在突出部361,進而使本發明之力量感測器在不同偏移量之組裝條件下仍能輸出較為一致的偵測訊號。 Please refer to FIG. 6, in one embodiment, the package body 36 includes a protrusion 361. The protrusion 361 corresponds to the MEMS element 323. In other words, the protruding portion 361 corresponds to the third substrate 33, and more precisely, the protruding portion 361 corresponds to the protrusion 332 of the third substrate 33. According to this structure, when the assembly tolerance results in different offsets, the protrusion 361 can concentrate the pressing stress on the protrusion 361, so that the force sensor of the present invention can still output more under the assembly conditions of different offsets. Consistent detection signal.

請參照圖7,於一實施例中,本發明之力量感測器包含一突出件38,其設置於封裝體36上。突出件38包含一凸塊381,其與微機電系統元件323相對應。相似於封裝體36之突出部361,凸塊381相對於封裝體36較為突出,因此凸塊381能夠使按壓之應力集中在凸塊381,進而使本發明之力量感測器能容許較大的組裝公差。於圖7所示之實施例中,凸塊381之一頂表面為一平面,但不限於此。請參照圖8,於一實施例中,凸塊381之頂表面可為一曲面。可以理解的是,凸塊381能夠以膠體39黏著於封裝體36上。 Please refer to FIG. 7, in one embodiment, the force sensor of the present invention includes a protruding member 38 disposed on the package body 36. The protruding member 38 includes a bump 381 corresponding to the MEMS element 323. Similar to the protruding portion 361 of the package body 36, the bump 381 is more protruding relative to the package body 36, so the bump 381 can concentrate the pressing stress on the bump 381, so that the force sensor of the present invention can tolerate a larger Assembly tolerance. In the embodiment shown in FIG. 7, a top surface of the bump 381 is a flat surface, but it is not limited to this. Please refer to FIG. 8, in one embodiment, the top surface of the bump 381 may be a curved surface. It can be understood that the bumps 381 can be adhered to the package body 36 by the glue 39.

請參照圖9,於一實施例中,突出件38包含一凸塊381以及一平板382,其中平板382設置於凸塊381以及封裝體36之間。舉例而言,突出件38可為一體成型之元件,亦即凸塊381以及平板382為單一元件,其材料可為金屬。平板382之一投影區域可等於或小於第三基板33。於圖9所示之實施例中,平板382對應於第三基板33之形變區域。於一實施例中,請參照圖10,平板382之一投影區域可大於第三基板33,覆蓋封裝體36之上表面。同樣的,凸塊381之一頂表面可為平面(如圖9所示)或為一曲面(如圖10所示)。需說明的是,藉由調整平板382的厚度亦可控制本發明之力量感測器的量測範圍。 Please refer to FIG. 9, in one embodiment, the protruding member 38 includes a bump 381 and a flat plate 382, wherein the flat plate 382 is disposed between the bump 381 and the package body 36. For example, the protruding member 38 may be an integrally formed element, that is, the bump 381 and the flat plate 382 are a single element, and the material thereof may be metal. A projection area of the flat plate 382 may be equal to or smaller than the third substrate 33. In the embodiment shown in FIG. 9, the flat plate 382 corresponds to the deformation area of the third substrate 33. In one embodiment, referring to FIG. 10, a projection area of the flat plate 382 may be larger than the third substrate 33 and cover the upper surface of the package body 36. Similarly, a top surface of the bump 381 can be a flat surface (as shown in FIG. 9) or a curved surface (as shown in FIG. 10). It should be noted that by adjusting the thickness of the plate 382, the measurement range of the force sensor of the present invention can also be controlled.

於一實施例中,請參照圖11以及圖12,平板382可設置於凸塊381上,亦即凸塊381位於封裝體36以及平板382之間。依據此結構,按壓於平板382時,應力可集中至凸塊381,因此,本發明之力量感測器所容許的組裝公差能進 一步增加。於一實施例中,平板382包含至少一連接腳383,其連接至封裝體36,如此可避免平板382因按壓而傾斜。 In one embodiment, referring to FIG. 11 and FIG. 12, the flat plate 382 may be disposed on the bump 381, that is, the bump 381 is located between the package body 36 and the flat plate 382. According to this structure, when pressing on the plate 382, the stress can be concentrated to the bump 381. Therefore, the allowable assembly tolerance of the force sensor of the present invention can be improved. One step increase. In one embodiment, the plate 382 includes at least one connecting pin 383 connected to the package body 36, so as to prevent the plate 382 from tilting due to pressing.

請參照圖13,於一實施例中,凸塊381可利用點膠的方式,在封裝體36設置由膠體構成的凸塊381。可以理解的是,凸塊381之材料為高分子聚合物。 Please refer to FIG. 13, in one embodiment, the bumps 381 can be glued, and the bumps 381 made of glue are provided on the package body 36. It can be understood that the material of the bump 381 is a high molecular polymer.

請參照圖14a至圖14j,以說明圖3所示之本發明力量感測器之製造方法。雖然這些剖面圖中僅顯示單一裝置,但可以理解的是,於單一基板上可製造多個晶粒。因此,這些圖中所示的單一裝置僅為代表,並非用以限制本發明於單一裝置之製造方法。於本說明書中將更完整的描述以晶圓級製程於一基板上製造多個晶粒或裝置。於製造裝置後,再利用切割(dicing)與切單(singulation)技術產生單獨的裝置封裝以於各種應用中使用。 Please refer to FIGS. 14a to 14j to illustrate the manufacturing method of the force sensor of the present invention shown in FIG. 3. Although these cross-sectional views only show a single device, it is understandable that multiple dies can be manufactured on a single substrate. Therefore, the single device shown in these figures is only a representative, and is not intended to limit the manufacturing method of the present invention to a single device. In this specification, a more complete description will be given to fabricate multiple dies or devices on a substrate using a wafer-level process. After the device is manufactured, dicing and singulation technologies are then used to produce individual device packages for use in various applications.

請參照圖14a,首先,提供一第三基板33,並定義出至少一第一連接部331以及一凸柱332。舉例而言,可在第三基板33上蝕刻出適當之凹槽333,即可定義出突出之第一連接部331以及凸柱332。 Please refer to FIG. 14a. First, a third substrate 33 is provided, and at least one first connecting portion 331 and a protrusion 332 are defined. For example, a suitable groove 333 can be etched on the third substrate 33 to define the protruding first connecting portion 331 and the protrusion 332.

接著,提供一第二基板32,其包含一第一表面32a以及一相對之第二表面32b,並將第二基板32以第二表面32b朝向第三基板33,接合於第三基板33之第一連接部331以及凸柱332,如圖14b所示。舉例而言,第二基板32以及第三基板33能夠以熔接(fusion bond)方式接合。於一實施例中,可在第二基板32接合於第三基板33後,薄化第二基板32。舉例而言,薄化後之第二基板32厚度等於或小於30μm。 Next, a second substrate 32 is provided, which includes a first surface 32a and an opposite second surface 32b. The second substrate 32 faces the third substrate 33 with the second surface 32b, and is bonded to the first substrate 33. A connecting portion 331 and a protrusion 332 are as shown in FIG. 14b. For example, the second substrate 32 and the third substrate 33 can be joined by a fusion bond. In one embodiment, after the second substrate 32 is bonded to the third substrate 33, the second substrate 32 may be thinned. For example, the thickness of the thinned second substrate 32 is equal to or less than 30 μm.

接著,於第二基板32之第一表面32a定義出至少一第二連接部321,如圖14c所示。於一實施例中,依據後續接合第二基板32與第一基板31所採用之接合方法,可在第二連接部321上形成適當之接合材料。舉例而言,接合材料可為一導電材料322,如圖14d所示。 Next, at least one second connecting portion 321 is defined on the first surface 32a of the second substrate 32, as shown in FIG. 14c. In one embodiment, a suitable bonding material can be formed on the second connecting portion 321 according to the bonding method used for subsequently bonding the second substrate 32 and the first substrate 31. For example, the bonding material can be a conductive material 322, as shown in FIG. 14d.

接著,請參照圖14e,於第二基板32定義出一微機電系統元件323。需強調的,第二基板32之微機電系統元件323需與第三基板33之凸柱332連接。於一實施例中,定義微機電系統元件323時,亦可同時於第二基板32定義出至少一參考元件324。 Next, referring to FIG. 14e, a MEMS component 323 is defined on the second substrate 32. It should be emphasized that the MEMS element 323 of the second substrate 32 needs to be connected to the protrusion 332 of the third substrate 33. In one embodiment, when the MEMS element 323 is defined, at least one reference element 324 can also be defined on the second substrate 32 at the same time.

接著,請參照圖14f,提供一第一基板31,其包含一固定電極311、至少一第一導電接點312以及至少一第二導電接點313。於一實施例中,第一基板31更包含一參考電極314。 Next, referring to FIG. 14f, a first substrate 31 is provided, which includes a fixed electrode 311, at least one first conductive contact 312, and at least one second conductive contact 313. In one embodiment, the first substrate 31 further includes a reference electrode 314.

接著,請參照圖14g,將第二基板32與第一基板31接合,其中第一基板31之第一導電接點312與第二基板32之第二連接部321透過導電材料322電性連接,且微機電系統元件323與固定電極311相對應。於一實施例中,第二基板32與第一基板31之接合能夠以共晶鍵合(eutectic bonding)、熔接、銲接以及黏合至少其中之一加以實現。 Next, referring to FIG. 14g, the second substrate 32 is joined to the first substrate 31, wherein the first conductive contact 312 of the first substrate 31 and the second connection portion 321 of the second substrate 32 are electrically connected through the conductive material 322. And the MEMS element 323 corresponds to the fixed electrode 311. In one embodiment, the bonding of the second substrate 32 and the first substrate 31 can be achieved by at least one of eutectic bonding, welding, welding, and bonding.

接著,請參照圖14h,薄化第三基板33至適當厚度。接著,移除部分第三基板33,以曝露出第一基板31之第二導電接點313,如圖14i所示。接著,切割第一基板31,以進行後續之封裝程序。舉例而言,請參照圖14j,將切單後之第一基板31設置於封裝基板34,並以引線35a電性連接第一基板31之第二導電接點313以及封裝基板34。最後,以一封裝體36覆蓋第三基板33即可形成如圖3所示之力量感測器。可以理解的是,利用適當的模具進行模封(molding),即可在封裝體36上形成一突出部361,如圖6所示。 Next, referring to FIG. 14h, thin the third substrate 33 to an appropriate thickness. Then, a part of the third substrate 33 is removed to expose the second conductive contacts 313 of the first substrate 31, as shown in FIG. 14i. Next, the first substrate 31 is cut to perform the subsequent packaging process. For example, referring to FIG. 14j, the singulated first substrate 31 is disposed on the packaging substrate 34, and the second conductive contacts 313 of the first substrate 31 and the packaging substrate 34 are electrically connected by leads 35a. Finally, the third substrate 33 is covered with a package 36 to form the force sensor as shown in FIG. 3. It can be understood that by molding with a suitable mold, a protrusion 361 can be formed on the package body 36, as shown in FIG. 6.

不同封裝設計之力量感測器則以不同的封裝程序加以實現。舉例而言,封裝圖4所示之力量感測器時,需先將第一基板31設置於特定應用積體電路晶片37上,再以引線35a電性連接第一基板31之至少一第二導電接點313以及特定應用積體電路晶片37,最後再以封裝體36封裝即可。可以理解的是,本發明 之力量感測器亦可與特定應用積體電路晶片並列設置於封裝基板,再經打線以及模封程序完成封裝。 The force sensors of different package designs are implemented in different package procedures. For example, when the force sensor shown in FIG. 4 is packaged, the first substrate 31 needs to be placed on the application-specific integrated circuit chip 37, and then the leads 35a are electrically connected to at least one second substrate 31 of the first substrate 31. The conductive contacts 313 and the integrated circuit chip 37 for specific applications are finally packaged with the package body 36. It is understandable that the present invention The force sensor can also be arranged on the package substrate in parallel with the integrated circuit chip of the specific application, and then the package can be completed through the process of wire bonding and molding.

於一實施例中,本發明之力量感測器之製造方法更包含在封裝體36上設置包含一凸塊381之一突出件38,如圖7至圖12所示。或者,利用點膠方式在封裝體36上形成凸塊381,如圖13所示。 In one embodiment, the manufacturing method of the force sensor of the present invention further includes disposing a protrusion 38 including a bump 381 on the package body 36, as shown in FIGS. 7-12. Alternatively, the bumps 381 are formed on the package body 36 by a glue dispensing method, as shown in FIG. 13.

綜合上述,本發明之力量感測器是於一封裝體以及一微機電系統元件之間設置一第三基板作為微機電系統元件之蓋體,使微機電系統元件與封裝體在空間上分離。且蓋體與微機電系統元件連接,使微機電系統元件隨著蓋體形變而產生相對應之運動量。依據此結構,本發明之力量感測器內之引線可遠離按壓所產生之應力源,且微機電系統元件不易因反覆按壓而損壞,因此裝置之可靠度可大幅提升。此外,不同規格之力量感測器可藉由調整第三基板之厚度加以控制,因此不同量測範圍之力量感測器能夠以相同之組裝製程進行封裝。 In summary, in the force sensor of the present invention, a third substrate is arranged between a package body and a MEMS device as the cover of the MEMS device, so that the MEMS device and the package body are separated in space. And the cover body is connected with the MEMS element, so that the MEMS element generates a corresponding amount of movement along with the deformation of the cover body. According to this structure, the leads in the force sensor of the present invention can be far away from the stress source caused by pressing, and the MEMS components are not easily damaged by repeated pressing, so the reliability of the device can be greatly improved. In addition, force sensors of different specifications can be controlled by adjusting the thickness of the third substrate, so force sensors of different measurement ranges can be packaged with the same assembly process.

以上所述之實施例僅是為說明本發明之技術思想及特點,其目的在使熟習此項技藝之人士能夠瞭解本發明之內容並據以實施,當不能以之限定本發明之專利範圍,即大凡依本發明所揭示之精神所作之均等變化或修飾,仍應涵蓋在本發明之專利範圍內。 The above-mentioned embodiments are only to illustrate the technical ideas and features of the present invention, and their purpose is to enable those who are familiar with the art to understand the content of the present invention and implement them accordingly. When they cannot be used to limit the patent scope of the present invention, That is, all equal changes or modifications made in accordance with the spirit of the present invention should still be covered by the patent scope of the present invention.

31:第一基板 31: The first substrate

311:固定電極 311: fixed electrode

312:第一導電接點 312: The first conductive contact

313:第二導電接點 313: second conductive contact

314:參考電極 314: Reference electrode

32:第二基板 32: second substrate

321:第二連接部 321: second connecting part

322:導電材料 322: conductive material

323:微機電系統元件 323: MEMS components

324:參考元件 324: Reference Components

33:第三基板 33: third substrate

331:第一連接部 331: first connection part

332:凸柱 332: Convex Column

34:封裝基板 34: Package substrate

341:外部導電接點 341: External conductive contact

35a:引線 35a: Lead

36:封裝體 36: Package body

Claims (25)

一種力量感測器,包含:一封裝基板;一第一基板位於該封裝基板上,其包含一固定電極、至少一第一導電接點、至少一參考電極以及至少一第二導電接點;一第二基板,其包含一第一表面、一相對之第二表面、至少一參考元件以及一微機電系統元件,且該第二基板以該第一表面朝向該第一基板設置於該第一基板上,並與至少該第一導電接點電性連接,其中該微機電系統元件和該固定電極相對應以形成一感測電容,至少該參考元件與至少該參考電極相對應以形成一參考電容,該參考電容和該感測電容組成一差分電容對;一第三基板,其設置於該第二基板之該第二表面上,其中該第三基板包含一凸柱,該凸柱與該微機電系統元件相對應且與該微機電系統元件接合;一封裝體,其覆蓋該第一基板、該第二基板和該第三基板並設置於該封裝基板上;以及一突出件,其位於該封裝體上並與該凸柱相對應。 A force sensor, comprising: a packaging substrate; a first substrate located on the packaging substrate, which includes a fixed electrode, at least one first conductive contact, at least one reference electrode, and at least one second conductive contact; A second substrate includes a first surface, an opposite second surface, at least one reference element, and a MEMS element, and the second substrate is disposed on the first substrate with the first surface facing the first substrate On and electrically connected to at least the first conductive contact, wherein the MEMS element corresponds to the fixed electrode to form a sensing capacitor, and at least the reference element corresponds to at least the reference electrode to form a reference capacitor , The reference capacitor and the sensing capacitor form a differential capacitor pair; a third substrate, which is disposed on the second surface of the second substrate, wherein the third substrate includes a protrusion, the protrusion and the micro The electromechanical system component corresponds to and is joined to the microelectromechanical system component; a package body that covers the first substrate, the second substrate, and the third substrate and is disposed on the package substrate; and a protruding member located on the package substrate On the package body and corresponding to the protruding pillar. 如請求項1所述之力量感測器,其中該參考元件為一固定元件或一可動元件。 The force sensor according to claim 1, wherein the reference element is a fixed element or a movable element. 如請求項1所述之力量感測器,其中該第一基板包含一互補式金氧半導體基板。 The force sensor according to claim 1, wherein the first substrate includes a complementary metal oxide semiconductor substrate. 如請求項1所述之力量感測器,其中該第一基板更包含一特定應用積體電路。 The force sensor according to claim 1, wherein the first substrate further includes an application-specific integrated circuit. 如請求項4所述之力量感測器,更包含一特定應用積體電路晶片以及一引線,其中該特定應用積體電路晶片和該引線被該封裝體覆蓋;該引線電性連接該特定應用積體電路晶片和該第一基板的該第二導電接點;以及該特定應用積體電路晶片堆疊地設置於該第一基板和該封裝基板之間,或是該第一基板與該特定應用積體電路晶片並列設置於該封裝基板上。 The force sensor according to claim 4, further comprising an application-specific integrated circuit chip and a lead, wherein the application-specific integrated circuit chip and the lead are covered by the package; the lead is electrically connected to the specific application Integrated circuit chip and the second conductive contact of the first substrate; and the application-specific integrated circuit chip is stacked between the first substrate and the packaging substrate, or the first substrate and the specific application The integrated circuit chips are arranged side by side on the packaging substrate. 如請求項1所述之力量感測器,其中該突出件包括一金屬或高分子聚合物的凸塊,且該金屬或高分子聚合物的凸塊的一頂表面為平面或曲面。 The force sensor according to claim 1, wherein the protruding member includes a metal or polymer bump, and a top surface of the metal or polymer bump is flat or curved. 如請求項1所述之力量感測器,其中該突出件包括一凸塊以及一平板設置於該凸塊和該封裝體之間或該凸塊上,並且該凸塊與該第三基板的該凸柱相對應。 The force sensor according to claim 1, wherein the protruding member includes a bump and a flat plate disposed between the bump and the package or on the bump, and the bump and the third substrate The convex post corresponds to it. 如請求項7所述之力量感測器,其中該平板的一投影區域等於或小於該第三基板。 The force sensor according to claim 7, wherein a projection area of the flat plate is equal to or smaller than the third substrate. 如請求項7所述之力量感測器,其中該平板設置於該凸塊和該封裝體之間並覆蓋該封裝體;或是該平板設置於該凸塊上,且該平板包含連接至該封裝體的至少一連接腳。 The force sensor according to claim 7, wherein the plate is disposed between the bump and the package body and covers the package body; or the plate is disposed on the bump, and the plate includes At least one connecting pin of the package body. 一種力量感測器,包括:一第一基板,其包含一固定電極、至少一參考電極、至少一第一導電接點以及至少一第二導電接點;一第二基板,其包含一第一表面、一相對之第二表面、一微機電系統元件、至少一參考元件以及至少一第二連接部,其中 該第二基板以該第一表面朝向該第一基板設置於該第一基板上;該第二連接部與該第一導電接點電性連接;該微機電系統元件和該固定電極相對應以形成一感測電容;該參考元件與該參考電極相對應以形成一參考電容,該參考電容和該感測電容組成一差分電容對;以及該微機電系統元件和該參考元件形成以該第二連接部作為一錨點的一蹺蹺板結構;一第三基板,其設置於該第二基板之該第二表面上,其中該第三基板包含一凸柱,該凸柱與該微機電系統元件相對應且與該微機電系統元件接合;以及一封裝體,其覆蓋該第一基板、該第二基板和該第三基板。 A force sensor includes: a first substrate including a fixed electrode, at least one reference electrode, at least one first conductive contact and at least one second conductive contact; a second substrate including a first Surface, an opposite second surface, a microelectromechanical system element, at least one reference element, and at least one second connecting portion, wherein The second substrate is disposed on the first substrate with the first surface facing the first substrate; the second connecting portion is electrically connected to the first conductive contact; the MEMS element and the fixed electrode correspond to A sensing capacitor is formed; the reference element corresponds to the reference electrode to form a reference capacitor, the reference capacitor and the sensing capacitor form a differential capacitor pair; and the MEMS element and the reference element are formed with the second A seesaw structure with the connecting portion as an anchor point; a third substrate, which is disposed on the second surface of the second substrate, wherein the third substrate includes a protruding pillar, the protruding pillar is corresponding to the microelectromechanical system element Corresponding and bonding with the MEMS element; and a package body covering the first substrate, the second substrate and the third substrate. 如請求項10所述之力量感測器,其中該封裝體包含一突出部突出於該封裝體外並與該微機電系統元件相對應。 The force sensor according to claim 10, wherein the package body includes a protrusion protruding outside the package body and corresponding to the microelectromechanical system element. 如請求項10所述之力量感測器,更包含一突出件設置於該封裝體上,其中該突出件包含一凸塊,該凸塊與該凸柱和該微機電系統元件相對應,且該凸塊的一頂表面為平面或曲面。 The force sensor according to claim 10, further comprising a protruding member disposed on the package body, wherein the protruding member includes a bump corresponding to the bump and the microelectromechanical system element, and A top surface of the bump is flat or curved. 如請求項10所述之力量感測器,更包含一突出件設置於該封裝體上,其中該突出件包含一凸塊,該凸塊與該凸柱和該微機電系統元件相對應,且該凸塊之材料為金屬或高分子聚合物。 The force sensor according to claim 10, further comprising a protruding member disposed on the package body, wherein the protruding member includes a bump corresponding to the bump and the microelectromechanical system element, and The material of the bump is metal or high molecular polymer. 如請求項10所述之力量感測器,更包含一突出件設置於該封裝體上,其中: 該突出件包含一凸塊和一平板,該凸塊與該凸柱和該微機電系統元件相對應,而該平板設置於該凸塊與該封裝體之間或該凸塊上,並且該平板的一投影區域等於或小於該第三基板;或是該突出件包含一凸塊和一平板,該凸塊與該凸柱和該微機電系統元件相對應,而該平板設置於該凸塊和該封裝體之間並覆蓋該封裝體;或是該突出件包含一凸塊和設置於該凸塊上、具有至少一連接腳的一平板,其中該凸塊與該凸柱和該微機電系統元件相對應,該連接腳連接至該封裝體。 The force sensor according to claim 10, further comprising a protruding member disposed on the package body, wherein: The protruding member includes a bump and a flat plate, the bump corresponding to the protrusion and the micro-electromechanical system element, and the flat plate is disposed between the bump and the package or on the bump, and the flat plate A projection area of the third substrate is equal to or smaller than the third substrate; or the protrusion includes a protrusion and a flat plate, the protrusion corresponds to the protrusion and the MEMS element, and the flat plate is disposed on the protrusion and Between the package body and cover the package body; or the protruding member includes a bump and a flat plate provided on the bump and having at least one connecting leg, wherein the bump and the bump and the microelectromechanical system Corresponding to the component, the connecting pin is connected to the package body. 如請求項10所述之力量感測器,其中該第一基板更包含一特定應用積體電路。 The force sensor according to claim 10, wherein the first substrate further includes an application-specific integrated circuit. 如請求項15所述之力量感測器,更包含一特定應用積體電路晶片以及一引線,其中該特定應用積體電路晶片和該引線被該封裝體覆蓋;該引線電性連接該特定應用積體電路晶片和該第一基板的該第二導電接點電性連接;以及該第一基板堆疊地設置於該特定應用積體電路電晶片上,或是該第一基板與該特定應用積體電路晶片並列設置。 The force sensor according to claim 15, further comprising an application-specific integrated circuit chip and a lead, wherein the application-specific integrated circuit chip and the lead are covered by the package; the lead is electrically connected to the specific application The integrated circuit chip is electrically connected to the second conductive contact of the first substrate; and the first substrate is stacked on the specific application integrated circuit chip, or the first substrate is connected to the specific application product. The bulk circuit chips are arranged side by side. 一種力量感測器之製造方法,包含:提供一第三基板,並定義出至少一第一連接部以及一凸柱;提供一第二基板,其包含一第一表面、一相對之第二表面;以該第二表面朝向該第三基板,接合該第二基板於該第三基板之該第一連接部以及該凸柱;於該第二基板之該第一表面定義出至少一第二連接部; 於該第二基板定義出一微機電系統元件以及至少一參考元件,其中該微機電系統元件與該凸柱相對應並連接;提供一第一基板,其包含一固定電極、至少一參考電極、至少一第一導電接點以及至少一第二導電接點;接合該第一基板以及該第二基板,其中該至少一第一導電接點與該至少一第二連接部電性連接,且該微機電系統元件與該固定電極相對應以形成一感測電容,至少該參考元件和至少該參考電極相對應以形成一參考電容,且該參考電容和該感測電容組成一差分電容對;以及以一封裝體覆蓋該第三基板、該第二基板和該第一基板。 A method for manufacturing a force sensor includes: providing a third substrate, defining at least one first connecting portion and a protrusion; providing a second substrate, which includes a first surface and an opposite second surface ; With the second surface facing the third substrate, joining the second substrate to the first connection portion of the third substrate and the protrusion; at least one second connection is defined on the first surface of the second substrate unit; A microelectromechanical system element and at least one reference element are defined on the second substrate, wherein the microelectromechanical system element corresponds to and is connected to the protrusion; a first substrate is provided, which includes a fixed electrode, at least one reference electrode, At least one first conductive contact and at least one second conductive contact; joining the first substrate and the second substrate, wherein the at least one first conductive contact is electrically connected to the at least one second connecting portion, and the The MEMS element corresponds to the fixed electrode to form a sensing capacitor, at least the reference element corresponds to at least the reference electrode to form a reference capacitor, and the reference capacitor and the sensing capacitor form a differential capacitor pair; and A package body covers the third substrate, the second substrate and the first substrate. 如請求項17所述之力量感測器之製造方法,更包含薄化該第二基板和該第三基板二者至少之一。 The manufacturing method of the force sensor according to claim 17, further comprising thinning at least one of the second substrate and the third substrate. 如請求項17所述之力量感測器之製造方法,更包含提供一特定應用積體電路的該第一基板。 The manufacturing method of the force sensor according to claim 17, further comprising providing the first substrate of an integrated circuit for a specific application. 如請求項17所述之力量感測器之製造方法,更包含提供一特定應用積體電路晶片以及以一引線電性連接該第一基板的該至少一第二導電接點和該特定應用積體電路晶片,其中該第一基板位於該特定應用積體電路晶片上或與該特定應用積體電路晶片並列。 The manufacturing method of the force sensor according to claim 17, further comprising providing a specific application integrated circuit chip and electrically connecting the at least one second conductive contact of the first substrate and the specific application product by a lead. The bulk circuit chip, wherein the first substrate is located on the application-specific integrated circuit chip or in parallel with the application-specific integrated circuit chip. 如請求項17所述之力量感測器之製造方法,其中該封裝體包含一突出部,該突出部與該凸柱和該微機電系統元件相對應。 The manufacturing method of the force sensor according to claim 17, wherein the package body includes a protrusion, and the protrusion corresponds to the protrusion and the MEMS element. 如請求項17所述之力量感測器之製造方法,更包含設置一突出件於該封裝體上,其中:該突出件包含一凸塊與該凸柱和該微機電系統元件相對應;或是 該突出件包含一凸塊和一平板,該凸塊位於該封裝體上且與該凸柱和該微機電系統元件相對應,而該平板設置於該凸塊與該封裝體之間或該凸塊上,並且該平板的一投影區域等於或小於該第三基板;或是該突出件包含一凸塊和一平板,該凸塊與該凸柱和該微機電系統元件相對應,而該平板設置於該凸塊和該封裝體之間並覆蓋該封裝體;或是該突出件包含一凸塊和設置於該凸塊上、具有至少一連接腳的一平板,其中該凸塊與該凸柱和該微機電系統元件相對應,該連接腳連接至該封裝體。 The manufacturing method of the force sensor according to claim 17, further comprising disposing a protruding member on the package body, wherein: the protruding member includes a bump corresponding to the protruding pillar and the MEMS element; or Yes The protruding member includes a bump and a flat plate, the bump is located on the package body and corresponds to the bump and the MEMS element, and the flat plate is disposed between the bump and the package body or the bump Block, and a projection area of the flat plate is equal to or smaller than the third substrate; or the protruding piece includes a bump and a flat plate, the bump corresponds to the protrusion and the MEMS element, and the flat plate Is disposed between the bump and the package body and covers the package body; or the protruding member includes a bump and a flat plate provided on the bump and having at least one connecting leg, wherein the bump and the bump The column corresponds to the MEMS element, and the connecting pin is connected to the package body. 一種力量感測器,包含:一封裝基板;一第一基板位於該封裝基板上,其包含一固定電極、至少一參考電極、至少一第一導電接點以及至少一第二導電接點;一第二基板,其包含一第一表面、一相對之第二表面、至少一參考元件以及一微機電系統元件,且該第二基板以該第一表面朝向該第一基板設置於該第一基板上,並與至少該第一導電接點電性連接,其中該微機電系統元件和該固定電極相對應以形成一感測電容,至少該參考元件與至少該參考電極相對應以形成一參考電容,該參考電容和該感測電容組成一差分電容對;一第三基板,其設置於該第二基板之該第二表面,其中該第三基板包含一凸柱,該凸柱與該微機電系統元件相對應且與該微機電系統元件接合; 一封裝體,其覆蓋住該封裝基板、該第一基板、該第二基板和該第三基板,其中該封裝體包括一突出部突出於該封裝體外並與該凸柱相對應。 A force sensor includes: a packaging substrate; a first substrate is located on the packaging substrate, and includes a fixed electrode, at least one reference electrode, at least one first conductive contact, and at least one second conductive contact; A second substrate includes a first surface, an opposite second surface, at least one reference element, and a MEMS element, and the second substrate is disposed on the first substrate with the first surface facing the first substrate On and electrically connected to at least the first conductive contact, wherein the MEMS element corresponds to the fixed electrode to form a sensing capacitor, and at least the reference element corresponds to at least the reference electrode to form a reference capacitor , The reference capacitor and the sensing capacitor form a differential capacitor pair; a third substrate, which is disposed on the second surface of the second substrate, wherein the third substrate includes a protruding pillar, the protruding pillar and the MEMS The system element corresponds to and is connected to the MEMS element; A package body covering the package substrate, the first substrate, the second substrate and the third substrate, wherein the package body includes a protruding portion protruding from the package body and corresponding to the protruding pillar. 如請求項23所述之力量感測器,其中該第一基板包含一特定應用積體電路。 The force sensor according to claim 23, wherein the first substrate includes an application-specific integrated circuit. 如請求項23所述之力量感測器,更包括一特定應用積體電路晶片以及一引線,該引線電性連接該第一基板的該第二導電接點和該特定應用積體電路晶片,其中該第一基板堆疊於該特定應用積體電路晶片上或與該特定應用積體電路晶片並列設置。 The force sensor according to claim 23, further comprising an application-specific integrated circuit chip and a lead wire electrically connected to the second conductive contact of the first substrate and the application-specific integrated circuit chip, The first substrate is stacked on the application-specific integrated circuit chip or arranged in parallel with the application-specific integrated circuit chip.
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