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TWI711091B - Chip package structure and manufacturing method thereof - Google Patents

Chip package structure and manufacturing method thereof Download PDF

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Publication number
TWI711091B
TWI711091B TW109105214A TW109105214A TWI711091B TW I711091 B TWI711091 B TW I711091B TW 109105214 A TW109105214 A TW 109105214A TW 109105214 A TW109105214 A TW 109105214A TW I711091 B TWI711091 B TW I711091B
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Taiwan
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wafer
circuit layer
chip package
manufacturing
reconfiguration circuit
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TW109105214A
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TW202133280A (en
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曾子章
劉漢誠
柯正達
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欣興電子股份有限公司
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Priority to TW109105214A priority Critical patent/TWI711091B/en
Priority to CN202010246021.7A priority patent/CN113345847B/en
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Publication of TW202133280A publication Critical patent/TW202133280A/en

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    • H10W74/114
    • H10W70/65
    • H10W74/014
    • H10W90/00
    • H10W90/701
    • H10W70/60

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  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

A manufacturing method of a chip package structure includes a following steps. At least one diced wafer is provided. A carrier is provided with an adhesive layer. The diced wafer is positioned on the carrier through the adhesive layer. A redistribution layer is formed on the diced wafer. The diced wafer is electrically connected to the redistribution layer. A singulation process is performed on the diced wafer and the redistribution layer to form a plurality of chip package structures.

Description

晶片封裝結構及其製作方法Chip packaging structure and manufacturing method thereof

本發明是有關於一種封裝結構及其製作方法,且特別是有關於一種晶片封裝結構及其製作方法。The invention relates to a packaging structure and a manufacturing method thereof, and more particularly to a chip packaging structure and a manufacturing method thereof.

隨著電子技術的進步,半導體元件尺寸逐漸縮小,同時提供更強大的功能並包括更大容量的積體電路。由於半導體元件微型化,晶圓級晶片尺寸封裝(wafer level chip scale package ,WLCSP )被廣泛應用於製造中。With the advancement of electronic technology, the size of semiconductor components is gradually shrinking, while providing more powerful functions and including larger capacity integrated circuits. Due to the miniaturization of semiconductor components, wafer level chip scale package (WLCSP) is widely used in manufacturing.

就晶圓級晶片尺寸封裝(WLCSP)的封裝型態而言,其是對單片晶圓以透過半導體設備及半導體製程的方式先進行封裝後再切割而得到晶片封裝結構的技術。然而,因為晶圓級晶片尺寸封裝(WLCSP)是使用半導體設備及半導體製程,因此無法有效地降低製作成本。此外,於每一次的製程中,僅針對一片晶圓進行製作,因而無法有效地提高產能。As far as the packaging type of wafer-level chip scale packaging (WLCSP) is concerned, it is a technology to obtain a chip package structure by encapsulating a single wafer through semiconductor equipment and semiconductor manufacturing processes before cutting. However, because wafer-level chip scale packaging (WLCSP) uses semiconductor equipment and semiconductor manufacturing processes, it cannot effectively reduce manufacturing costs. In addition, in each manufacturing process, only one wafer is manufactured, so the productivity cannot be effectively increased.

本發明提供一種晶片封裝結構及其製作方法,其可具有較高產出率(high throughput)且可降低生產成本。The present invention provides a chip packaging structure and a manufacturing method thereof, which can have high throughput and can reduce production costs.

本發明的晶片封裝結構的製作方法,其包括以下步驟。提供至少一已切割晶圓。提供一已配置有一黏著層的一承載板。令已切割晶圓透過黏著層而定位於承載板上。形成一重配置線路層於已切割晶圓上。已切割晶圓與重配置線路層電性連接。對已切割晶圓與重配置線路層進行一單體化程序,以形成多個晶片封裝結構。The manufacturing method of the chip package structure of the present invention includes the following steps. Provide at least one diced wafer. Provide a carrier board with an adhesive layer. The cut wafer is positioned on the carrier board through the adhesive layer. A reconfiguration circuit layer is formed on the diced wafer. The cut wafer is electrically connected to the reconfiguration circuit layer. A singulation process is performed on the cut wafer and the reconfiguration circuit layer to form a plurality of chip package structures.

在本發明的一實施例中,上述的晶片封裝結構的製作方法,更包括:提供已切割晶圓時,同時提供至少一未切割晶圓。令已切割晶圓透過黏著層而定位於承載板上之前,提供具有至少一第一開口與至少一第二開口的一板件於黏著層上。板件透過黏著層而定位於承載板上。將未切割晶圓與已切割晶圓分別配置於第一開口與第二開口內,且透過黏著層而定位於承載板上。In an embodiment of the present invention, the manufacturing method of the above-mentioned chip package structure further includes: providing at least one uncut wafer while providing the cut wafer. Before the diced wafer is positioned on the carrier board through the adhesive layer, a board with at least one first opening and at least one second opening is provided on the adhesive layer. The board is positioned on the carrier board through the adhesive layer. The uncut wafer and the cut wafer are respectively arranged in the first opening and the second opening, and are positioned on the carrier board through the adhesive layer.

在本發明的一實施例中,上述的第一開口的外型輪廓等於或大於未切割晶圓的外型輪廓。第二開口的外型輪廓等於或大於已切割晶圓的外型輪廓。In an embodiment of the present invention, the outline of the first opening described above is equal to or greater than the outline of the uncut wafer. The outline of the second opening is equal to or greater than the outline of the cut wafer.

在本發明的一實施例中,上述的未切割晶圓具有彼此相對的一第一主動面與一第一背面。已切割晶圓具有彼此相對的一第二主動面與一第二背面。未切割晶圓的第一背面與已切割晶圓的第二背面直接接觸黏著層。In an embodiment of the present invention, the aforementioned uncut wafer has a first active surface and a first back surface opposite to each other. The diced wafer has a second active surface and a second back surface opposite to each other. The first back surface of the uncut wafer and the second back surface of the cut wafer directly contact the adhesive layer.

在本發明的一實施例中,上述的板件具有一上表面,而未切割晶圓的第一主動表面與已切割晶圓的第二主動表面切齊於板件的上表面。In an embodiment of the present invention, the above-mentioned board has an upper surface, and the first active surface of the uncut wafer and the second active surface of the cut wafer are aligned with the upper surface of the board.

在本發明的一實施例中,上述的未切割晶圓包括設置在第一主動面上的多個第一接墊。已切割晶圓包括設置在第二主動面上的多個第二接墊。第一接墊以及第二接墊分別與重配置線路層電性連接。In an embodiment of the present invention, the aforementioned uncut wafer includes a plurality of first pads arranged on the first active surface. The diced wafer includes a plurality of second pads arranged on the second active surface. The first pad and the second pad are respectively electrically connected to the reconfiguration circuit layer.

在本發明的一實施例中,上述的晶片封裝結構的製作方法,更包括:對已切割晶圓與重配置線路層進行單體化程序之前,形成多個銲球於重配置線路層上。銲球透過重配置線路層與已切割晶圓電性連接。In an embodiment of the present invention, the manufacturing method of the aforementioned chip package structure further includes: forming a plurality of solder balls on the reconfiguration circuit layer before the singulation process is performed on the cut wafer and the reconfiguration circuit layer. The solder balls are electrically connected to the cut wafer through the reconfiguration circuit layer.

在本發明的一實施例中,上述的晶片封裝結構的製作方法,更包括:形成銲球於重配置線路層上之後,且對已切割晶圓與重配置線路層進行單體化程序之前,移除承載板以及黏著層。In an embodiment of the present invention, the manufacturing method of the aforementioned chip package structure further includes: after forming solder balls on the reconfiguration circuit layer, and before performing a singulation process on the cut wafer and the reconfiguration circuit layer, Remove the carrier board and the adhesive layer.

在本發明的一實施例中,上述的已切割晶圓的外型輪廓至少是由一直線與連接直線的一弧線所構成。In an embodiment of the present invention, the outline of the diced wafer described above is at least composed of a straight line and an arc connecting the straight line.

本發明的晶片封裝結構的製作方法,其包括以下步驟。提供至少一已切割晶圓。提供一已配置有一黏著層的一承載板。令已切割晶圓透過黏著層而定位於承載板上。對已切割晶圓進行一第一次單體化程序,而形成透過黏著層而定位於承載板上的多個晶片。形成一封裝膠體於黏著層上,其中封裝膠體包覆晶片。移除承載板及黏著層,而暴露出封裝膠體的一底表面。形成一重配置線路層於封裝膠體的底表面上,其中重配置線路層與晶片電性連接。對封裝膠體、晶片以及重配置線路層進行一第二次單體化程序,以形成多個晶片封裝結構。The manufacturing method of the chip package structure of the present invention includes the following steps. Provide at least one diced wafer. Provide a carrier board with an adhesive layer. The cut wafer is positioned on the carrier board through the adhesive layer. A first singulation process is performed on the diced wafer to form a plurality of chips positioned on the carrier board through the adhesive layer. A packaging glue is formed on the adhesive layer, wherein the packaging glue covers the chip. The carrier board and the adhesive layer are removed, and a bottom surface of the packaging glue is exposed. A reconfiguration circuit layer is formed on the bottom surface of the packaging compound, wherein the reconfiguration circuit layer is electrically connected to the chip. A second singulation process is performed on the packaging glue, the chip and the reconfiguration circuit layer to form a plurality of chip packaging structures.

在本發明的一實施例中,上述的晶片封裝結構的製作方法,更包括:提供已切割晶圓時,同時提供至少一未切割晶圓。未切割晶圓具有彼此相對的一第一主動面與一第一背面。已切割晶圓具有彼此相對的一第二主動面與一第二背面。未切割晶圓的第一主動面與已切割晶圓的第二主動面直接接觸黏著層。In an embodiment of the present invention, the manufacturing method of the above-mentioned chip package structure further includes: providing at least one uncut wafer while providing the cut wafer. The uncut wafer has a first active surface and a first back surface opposite to each other. The diced wafer has a second active surface and a second back surface opposite to each other. The first active surface of the uncut wafer and the second active surface of the cut wafer directly contact the adhesive layer.

在本發明的一實施例中,上述的相鄰兩晶片之間具有一水平間距,而水平間距為30微米至100微米。In an embodiment of the present invention, there is a horizontal distance between the two adjacent wafers, and the horizontal distance is 30 μm to 100 μm.

在本發明的一實施例中,上述的晶片封裝結構的製作方法,更包括:對封裝膠體、晶片以及重配置線路層進行第二次單體化程序之前,形成多個銲球於重配置線路層上,其中銲球透過重配置線路層與晶片電性連接。In an embodiment of the present invention, the manufacturing method of the above-mentioned chip package structure further includes: forming a plurality of solder balls on the reconfiguration circuit before performing the second singulation process on the package compound, the chip and the reconfiguration circuit layer On the layer, the solder balls are electrically connected to the chip through the reconfiguration circuit layer.

在本發明的一實施例中,上述的封裝膠體的一邊緣與晶片的一周圍表面之間具有一水平距離,而水平距離為15微米至50微米。In an embodiment of the present invention, there is a horizontal distance between an edge of the above-mentioned encapsulant and a peripheral surface of the chip, and the horizontal distance is 15 μm to 50 μm.

在本發明的一實施例中,上述的已切割晶圓的外型輪廓至少是由一直線與連接直線的一弧線所構成。In an embodiment of the present invention, the outline of the diced wafer described above is at least composed of a straight line and an arc connecting the straight line.

本發明的晶片封裝結構,其包括一晶片以及一重配置線路層。晶片具有彼此相對的一主動面與一背面,且包括配置在主動面上的多個接墊。重配置線路層配置於晶片的主動面上,且與接墊電性連接。The chip package structure of the present invention includes a chip and a reconfiguration circuit layer. The chip has an active surface and a back surface opposite to each other, and includes a plurality of pads arranged on the active surface. The reconfiguration circuit layer is disposed on the active surface of the chip and is electrically connected to the pads.

在本發明的一實施例中,上述的晶片封裝結構,更包括:多個銲球,配置於重配置線路層上,且透過重配置線路層與晶片的接墊電性連接。In an embodiment of the present invention, the above-mentioned chip package structure further includes: a plurality of solder balls disposed on the reconfiguration circuit layer and electrically connected to the pads of the chip through the reconfiguration circuit layer.

在本發明的一實施例中,上述的晶片的邊緣切齊於重配置線路層的邊緣。In an embodiment of the present invention, the edge of the aforementioned wafer is aligned with the edge of the reconfiguration circuit layer.

在本發明的一實施例中,上述的晶片封裝結構,更包括:一封裝膠體,配置於重配置線路層上,且包覆晶片,其中封裝膠體覆蓋晶片的背面。In an embodiment of the present invention, the above-mentioned chip packaging structure further includes: an encapsulating compound disposed on the reconfiguration circuit layer and covering the chip, wherein the encapsulating compound covers the backside of the chip.

在本發明的一實施例中,上述的封裝膠體的邊緣切齊於重配置線路層的邊緣。In an embodiment of the present invention, the edge of the above-mentioned encapsulation glue is aligned with the edge of the reconfiguration circuit layer.

基於上述,在本發明的晶片封裝結構的製作方法中,是在至少一已切割晶圓上形成重配置線路層以及進行單體化程序,而形成多個晶片封裝結構。相較於習知一次僅針對一片完整未切割晶圓的晶圓級晶片尺寸封裝的製作,本發明的晶片封裝結構的製作方法可具有較高的產出率,且可有效地降低生產成本。Based on the foregoing, in the manufacturing method of the chip package structure of the present invention, a reconfiguration circuit layer is formed on at least one diced wafer and a singulation process is performed to form a plurality of chip package structures. Compared with the conventional fabrication of wafer-level chip scale packages that only target one complete uncut wafer at a time, the fabrication method of the chip package structure of the present invention can have a higher yield and can effectively reduce production costs.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.

圖1A至圖1F是依照本發明的一實施例的一種晶片封裝結構的製作方法的示意圖。為了方便說明起見,圖1A與圖1C以俯視繪示,而圖1B、圖1D至圖1F以剖面繪示。1A to 1F are schematic diagrams of a manufacturing method of a chip package structure according to an embodiment of the present invention. For the convenience of description, FIGS. 1A and 1C are shown in plan view, and FIGS. 1B, 1D to 1F are shown in cross section.

關於本實施例的晶片封裝結構的製作方法,首先,請先參考圖1A,提供至少一已切割晶圓(示意地繪示一個已切割晶圓110b)。此處,已切割晶圓110b的外型輪廓具體化是由一直線S與連接直線S的一弧線C所構成,但不以此為限。Regarding the manufacturing method of the chip package structure of this embodiment, first, please refer to FIG. 1A to provide at least one diced wafer (schematically shows a diced wafer 110b). Here, the outline of the cut wafer 110b is embodied by a straight line S and an arc C connecting the straight line S, but it is not limited to this.

如圖1A所示,本實施例於提供已切割晶圓110b的同時,亦提供至少一未切割晶圓(示意地繪示一個未切割晶圓110a)。此處,未切割晶圓110a的尺寸大於已切割晶圓110b的尺寸,其中未切割晶圓110a的外型輪廓具體化為圓形。As shown in FIG. 1A, the present embodiment provides at least one uncut wafer (one uncut wafer 110a is schematically shown) while providing a cut wafer 110b. Here, the size of the uncut wafer 110a is larger than the size of the cut wafer 110b, and the outline of the uncut wafer 110a is embodied as a circle.

接著,請參考圖1B,提供一已配置有一黏著層12的一承載板10。此處,黏著層12例如是雙面熱解黏膠帶(thermal release tape),而承載板10例如是印刷電路板或沒有電性功能的暫時基板,但不以此為限。Next, please refer to FIG. 1B to provide a carrier board 10 that has been configured with an adhesive layer 12. Here, the adhesive layer 12 is, for example, a double-sided thermal release tape, and the carrier board 10 is, for example, a printed circuit board or a temporary substrate without electrical functions, but not limited to this.

接著,請參考圖1C,為了提高後續製程的良率,可選擇性地提供具有至少一第一開口(示意地繪示一個第一開口22a)與至少一第二開口(示意地繪示一個第二開口22b)的一板件20。此處,板件20例如是印刷電路板或沒有電性功能的暫時基板,但不以此為限。Next, referring to FIG. 1C, in order to improve the yield of the subsequent process, at least one first opening (schematically shows a first opening 22a) and at least one second opening (schematically shows a first opening 22a) can be selectively provided. Two openings 22b) a plate 20. Here, the board 20 is, for example, a printed circuit board or a temporary substrate without electrical functions, but it is not limited thereto.

接著,請同時參考圖1A、圖1C以及圖1D,將板件20配置於承載板10的黏著層12上,其中板件20透過黏著層12而定位於承載板10上。接著,令未切割晶圓110a與已切割晶圓110b透過黏著層12而定位於承載板10上。此處,將未切割晶圓110a與已切割晶圓分110b分別配置於第一開口22a與第二開口22b內,且透過黏著層12而定位於承載板10上。較佳地,第一開口22a的外型輪廓等於或大於未切割晶圓110a的外型輪廓。第二開口22b的外型輪廓等於或大於已切割晶圓110b的外型輪廓。Next, referring to FIGS. 1A, 1C and 1D at the same time, the board 20 is disposed on the adhesive layer 12 of the carrier board 10, and the board 20 is positioned on the carrier board 10 through the adhesive layer 12. Then, the uncut wafer 110a and the diced wafer 110b are positioned on the carrier board 10 through the adhesive layer 12. Here, the uncut wafer 110a and the diced wafer 110b are respectively arranged in the first opening 22a and the second opening 22b, and are positioned on the carrier board 10 through the adhesive layer 12. Preferably, the outline of the first opening 22a is equal to or larger than the outline of the uncut wafer 110a. The outline of the second opening 22b is equal to or larger than the outline of the cut wafer 110b.

更進一步來說,在本實施例中,未切割晶圓110a具有彼此相對的一第一主動面111a與一第一背面113a。已切割晶圓110b具有彼此相對的一第二主動面111b與一第二背面113b。未切割晶圓110a的第一背面113a與已切割晶圓110b的第二背面113b直接接觸黏著層12。意即,本實施例的未切割晶圓110a與已切割晶圓110b是以主動面朝上(face-up)的製作方式配置於承載板10上。Furthermore, in this embodiment, the uncut wafer 110a has a first active surface 111a and a first back surface 113a opposite to each other. The diced wafer 110b has a second active surface 111b and a second back surface 113b opposite to each other. The first back surface 113 a of the uncut wafer 110 a and the second back surface 113 b of the cut wafer 110 b directly contact the adhesive layer 12. That is, the uncut wafer 110a and the diced wafer 110b of this embodiment are arranged on the carrier board 10 in an active face-up manufacturing manner.

再者,本實施例的板件20具有一上表面21,而未切割晶圓110a的第一主動表面111a與已切割晶圓110b的第二主動表面111b切齊於板件20的上表面21。意即,板件20的上表面21、未切割晶圓110a的第一主動表面111a以及已切割晶圓110b的第二主動表面111b三者共平面,可提高後續一重配置線路層120(請參考圖1E)的製程良率。此外,本實施例的未切割晶圓110a還包括配置於第一主動面111a上的多個第一接墊112a,而已切割晶圓110b還包括設置在第二主動面111b上的多個第二接墊112b。Furthermore, the plate 20 of this embodiment has an upper surface 21, and the first active surface 111a of the uncut wafer 110a and the second active surface 111b of the cut wafer 110b are aligned with the upper surface 21 of the plate 20 . That is, the upper surface 21 of the plate 20, the first active surface 111a of the uncut wafer 110a, and the second active surface 111b of the cut wafer 110b are coplanar, which can improve the subsequent reconfiguration circuit layer 120 (please refer to Figure 1E) Process yield. In addition, the uncut wafer 110a of this embodiment further includes a plurality of first pads 112a disposed on the first active surface 111a, and the diced wafer 110b further includes a plurality of second pads 112a disposed on the second active surface 111b.接垫112b.

之後,請參考圖1E,形成重配置線路層120於未切割晶圓110a與已切割晶圓110b上,其中未切割晶圓110a的第一接墊112a與已切割晶圓110b的第二接墊112b分別與重配置線路層120電性連接。緊接著,形成多個銲球130於重配置線路層120上,其中銲球130透過重配置線路層120與未切割晶圓110a以及已切割晶圓110b電性連接。Then, referring to FIG. 1E, a reconfiguration circuit layer 120 is formed on the uncut wafer 110a and the diced wafer 110b, wherein the first pad 112a of the uncut wafer 110a and the second pad of the diced wafer 110b 112b is electrically connected to the reconfiguration circuit layer 120 respectively. Next, a plurality of solder balls 130 are formed on the reconfiguration circuit layer 120, wherein the solder balls 130 are electrically connected to the uncut wafer 110a and the diced wafer 110b through the reconfiguration circuit layer 120.

最後,請同時參考圖1E與圖1F,移除板件20、承載板10及承載板10上的黏著層12,且對未切割晶圓110a與重配置線路層120以及已切割晶圓110b與重配置線路層120進行一單體化程序,以形成多個晶片封裝結構(示意地繪示一個晶片封裝結構100)。至此,已完成晶片封裝結構100的製作方法。Finally, referring to FIGS. 1E and 1F at the same time, remove the board 20, the carrier board 10 and the adhesive layer 12 on the carrier board 10, and perform the uncut wafer 110a and the reconfigured circuit layer 120 as well as the cut wafer 110b and The reconfiguration circuit layer 120 performs a singulation process to form a plurality of chip package structures (a chip package structure 100 is schematically shown). So far, the manufacturing method of the chip package structure 100 has been completed.

在結構上,請再參考圖1F,本實施例的晶片封裝結構100包括一晶片110以及一重配置線路層120’。晶片110具有彼此相對的一主動面111與一背面113,且包括配置在主動面111上的多個接墊112。重配置線路層120’配置於晶片110的主動面111上,且與接墊112電性連接,其中重配置線路層120’例如是一種扇入線路。此處,晶片110的邊緣115切齊於重配置線路層120’的邊緣121。此外,本實施例的晶片封裝結構100還更包括多個銲球130,配置於重配置線路層120’上,且透過重配置線路層120’與晶片110的接墊112電性連接。In terms of structure, please refer to FIG. 1F again. The chip package structure 100 of this embodiment includes a chip 110 and a reconfiguration circuit layer 120'. The chip 110 has an active surface 111 and a back surface 113 opposite to each other, and includes a plurality of pads 112 disposed on the active surface 111. The reconfiguration circuit layer 120' is disposed on the active surface 111 of the chip 110 and is electrically connected to the pad 112. The reconfiguration circuit layer 120' is, for example, a fan-in circuit. Here, the edge 115 of the wafer 110 is aligned with the edge 121 of the reconfiguration circuit layer 120'. In addition, the chip package structure 100 of this embodiment further includes a plurality of solder balls 130 disposed on the reconfiguration circuit layer 120', and electrically connected to the pad 112 of the chip 110 through the reconfiguration circuit layer 120'.

在本實施例的晶片封裝結構100的製作方法中,是在至少一未切割晶圓110a與至少一已切割晶圓110b上形成重配置線路層120以及進行單體化程序,而形成晶片封裝結構100。相較於習知一次僅針對一片晶圓的晶圓級晶片尺寸封裝的製作,本實施例的晶片封裝結構100的製作方法可具有較高的產出率。此外,本實施例是以電路板製程及其設備來製作晶片封裝結構100,因此可有效地降低生產成本。In the manufacturing method of the chip package structure 100 of this embodiment, the reconfiguration circuit layer 120 is formed on the at least one uncut wafer 110a and the at least one diced wafer 110b and the singulation process is performed to form the chip package structure 100. Compared with the conventional fabrication of wafer-level chip scale packaging for only one wafer at a time, the fabrication method of the chip packaging structure 100 of this embodiment can have a higher yield. In addition, the present embodiment uses the circuit board manufacturing process and equipment to manufacture the chip package structure 100, so the production cost can be effectively reduced.

值得一提的是,上述實施例中,僅示意地繪示一個未切割晶圓110a以及一個已切割晶圓110b於承載板10上,但不以此為限。實質上,未切割晶圓110a以及已切割晶圓110b的個數可依據承載板10的大小來決定,且已切割晶圓110b的輪廓形狀亦可根據配置完未切割晶圓110a後,剩下來的承載板10區域來決定其形狀,可做最大空間的配置利用。It is worth mentioning that, in the above embodiment, only one uncut wafer 110a and one cut wafer 110b are shown on the carrier board 10, but not limited to this. In essence, the number of uncut wafers 110a and diced wafers 110b can be determined according to the size of the carrier plate 10, and the contour shape of the diced wafers 110b can also be determined according to the configuration of the uncut wafers 110a. The area of the carrier board 10 determines its shape, which can be used for maximum space configuration.

在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。It must be noted here that the following embodiments use the element numbers and part of the content of the foregoing embodiments, wherein the same numbers are used to represent the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

圖2A至圖2G是依照本發明的另一實施例的一種晶片封裝結構的製作方法的示意圖。為了方便說明起見,圖2A以俯視繪示,而圖2B至圖2G以剖面繪示。2A to 2G are schematic diagrams of a manufacturing method of a chip package structure according to another embodiment of the present invention. For convenience of description, FIG. 2A is shown in a top view, and FIGS. 2B to 2G are shown in cross-section.

關於本實施例的晶片封裝結構的製作方法,首先,請先參考圖2A,提供至少一已切割晶圓(示意地繪示四個已切割晶圓210c、210d、210e、210f)。此處,已切割晶圓210c、210d、210f的外型輪廓是由一直線S與連接直線S的一弧線C所構成,且已切割晶圓210e的外型輪廓是由兩直線S1、S2與連接兩直線S1、S2的兩弧線C1、C2所構成,但不以此為限。Regarding the manufacturing method of the chip package structure of this embodiment, first, please refer to FIG. 2A to provide at least one diced wafer (schematically show four diced wafers 210c, 210d, 210e, and 210f). Here, the outline of the cut wafer 210c, 210d, and 210f is composed of a straight line S and an arc C connecting the straight line S, and the outline of the cut wafer 210e is composed of two straight lines S1, S2 and The two straight lines S1 and S2 are formed by two arcs C1 and C2, but not limited to this.

如圖2A所示,提供已切割晶圓210c、210d、210e、210f的同時,亦提供至少一未切割晶圓(示意地繪示二個未切割晶圓210a、210b)。此處,未切割晶圓210a、210b的尺寸大於已切割晶圓210c、210d、210e、210f的尺寸,其中未切割晶圓210a、210b的外型輪廓具體化為圓形。As shown in FIG. 2A, while providing cut wafers 210c, 210d, 210e, and 210f, at least one uncut wafer is also provided (two uncut wafers 210a, 210b are schematically shown). Here, the size of the uncut wafers 210a, 210b is larger than the size of the cut wafers 210c, 210d, 210e, and 210f, and the outline of the uncut wafers 210a, 210b is embodied as a circle.

接著,請參考圖2B,提供一已配置有一黏著層12的一承載板10。此處,黏著層12例如是雙面熱解黏膠帶(thermal release tape),但不以此為限。緊接著,令未切割晶圓(僅示意地繪示未切割晶圓210a)與已切割晶圓(僅示意地繪示已切割晶圓210c)透過黏著層12而定位於承載板10上。此處,未切割晶圓210a具有彼此相對的一第一主動面211a與一第一背面213a。已切割晶圓210c具有彼此相對的一第二主動面211c與一第二背面213c。未切割晶圓210a的第一主動面211a與已切割晶圓210c的第二主動面211c直接接觸黏著層12。換言之,本實施例的未切割晶圓210a與已切割晶圓210c是以主動面朝下(face-down)的製作方式配置於承載板10上。Next, referring to FIG. 2B, a carrier board 10 that has been configured with an adhesive layer 12 is provided. Here, the adhesive layer 12 is, for example, a double-sided thermal release tape (thermal release tape), but it is not limited thereto. Next, the uncut wafer (only the uncut wafer 210a is schematically shown) and the cut wafer (only the cut wafer 210c is schematically shown) are positioned on the carrier board 10 through the adhesive layer 12. Here, the uncut wafer 210a has a first active surface 211a and a first back surface 213a opposite to each other. The diced wafer 210c has a second active surface 211c and a second back surface 213c opposite to each other. The first active surface 211a of the uncut wafer 210a and the second active surface 211c of the diced wafer 210c directly contact the adhesive layer 12. In other words, the uncut wafer 210a and the diced wafer 210c of this embodiment are arranged on the carrier board 10 in an active face-down manufacturing manner.

接著,請參考圖2C,對未切割晶圓(僅示意地繪示未切割晶圓210a)與已切割晶圓(僅示意地繪示已切割晶圓210c)進行一第一次單體化程序,而形成透過黏著層12而定位於承載板10上的多個晶片210。此處,相鄰兩晶片210之間具有一水平間距G,而水平間距G為30微米至100微米,可具有較佳的封裝餘裕度。Next, referring to FIG. 2C, perform a first singulation process on the undiced wafer (only the undiced wafer 210a is schematically shown) and the diced wafer (only the diced wafer 210c is schematically shown) , To form a plurality of chips 210 positioned on the carrier board 10 through the adhesive layer 12. Here, there is a horizontal gap G between two adjacent chips 210, and the horizontal gap G is 30 micrometers to 100 micrometers, which can have a better packaging margin.

接著,請參考圖2D,形成一封裝膠體220於黏著層12上,其中封裝膠體220包覆晶片210。Next, referring to FIG. 2D, an encapsulant 220 is formed on the adhesive layer 12, wherein the encapsulant 220 covers the chip 210.

接著,請參考圖2E,移除承載板10及黏著層12,而暴露出封裝膠體220的一底表面222。此時,晶片210的主動面211切齊於封裝膠體220的底表面222。Next, referring to FIG. 2E, the carrier board 10 and the adhesive layer 12 are removed, and a bottom surface 222 of the packaging glue 220 is exposed. At this time, the active surface 211 of the chip 210 is aligned with the bottom surface 222 of the packaging compound 220.

之後,請參考圖2F,形成一重配置線路層230於封裝膠體220的底表面222上,其中重配置線路層230與晶片210電性連接。緊接著,形成多個銲球240於重配置線路層230上,其中銲球230透過重配置線路層230與晶片210的接墊212電性連接。Afterwards, referring to FIG. 2F, a reconfiguration circuit layer 230 is formed on the bottom surface 222 of the encapsulant 220, wherein the reconfiguration circuit layer 230 is electrically connected to the chip 210. Next, a plurality of solder balls 240 are formed on the reconfiguration circuit layer 230, wherein the solder balls 230 are electrically connected to the pads 212 of the chip 210 through the reconfiguration circuit layer 230.

最後,請參考圖2G,對封裝膠體220、晶片210以及重配置線路層230進行一第二次單體化程序,以形成多個晶片封裝結構200。至此,已完成具有封裝膠體220的晶片封裝結構200的製作。Finally, referring to FIG. 2G, a second singulation process is performed on the packaging compound 220, the chip 210, and the reconfiguration circuit layer 230 to form a plurality of chip packaging structures 200. So far, the fabrication of the chip packaging structure 200 with the packaging glue 220 has been completed.

在結構上,請再參考圖2G,本實施例的晶片封裝結構200包括一晶片210以及一重配置線路層230’。晶片210具有彼此相對的一主動面211與一背面213,且包括配置在主動面211上的多個接墊212。重配置線路層230’配置於晶片210的主動面211上,且與接墊212電性連接,其中重配置線路層230’例如是一種扇出線路。再者,本實施例的晶片封裝結構200還包括一封裝膠體220’,配置於重配置線路層230’上,且包覆晶片210,其中封裝膠體220’覆蓋晶片210的背面213。此處,封裝膠體220’的邊緣221切齊於重配置線路層230的邊緣231。封裝膠體220’的邊緣221與晶片210的一周圍表面215之間具有一水平距離,而水平距離H為15微米至50微米,以保護晶片210。此外,本實施例的晶片封裝結構200還更包括多個銲球240,配置於重配置線路層230’上,且透過重配置線路層230’與晶片210的接墊212電性連接。In terms of structure, please refer to FIG. 2G again. The chip package structure 200 of this embodiment includes a chip 210 and a reconfiguration circuit layer 230'. The chip 210 has an active surface 211 and a back surface 213 opposite to each other, and includes a plurality of pads 212 disposed on the active surface 211. The reconfiguration circuit layer 230' is disposed on the active surface 211 of the chip 210 and is electrically connected to the pad 212. The reconfiguration circuit layer 230' is, for example, a fan-out circuit. Furthermore, the chip packaging structure 200 of this embodiment further includes a packaging glue 220' disposed on the reconfiguration circuit layer 230' and covering the chip 210, wherein the packaging glue 220' covers the back surface 213 of the chip 210. Here, the edge 221 of the encapsulant 220' is aligned with the edge 231 of the reconfiguration circuit layer 230. There is a horizontal distance between the edge 221 of the encapsulant 220' and a peripheral surface 215 of the chip 210, and the horizontal distance H is 15-50 microns to protect the chip 210. In addition, the chip package structure 200 of the present embodiment further includes a plurality of solder balls 240 disposed on the reconfiguration circuit layer 230' and electrically connected to the pads 212 of the chip 210 through the reconfiguration circuit layer 230'.

綜上所述,在本發明的晶片封裝結構的製作方法中,是在至少一已切割晶圓上形成重配置線路層以及進行單體化程序,而形成多個晶片封裝結構。相較於習知一次僅針對一片晶圓的晶圓級晶片尺寸封裝的製作,本發明的晶片封裝結構的製作方法可具有較高的產出率,且可有效地降低生產成本。In summary, in the manufacturing method of the chip package structure of the present invention, a reconfiguration circuit layer is formed on at least one diced wafer and a singulation process is performed to form a plurality of chip package structures. Compared with the conventional fabrication of wafer-level chip size packages for only one wafer at a time, the fabrication method of the chip package structure of the present invention can have a higher yield and can effectively reduce production costs.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be determined by the scope of the attached patent application.

10:承載板 12:黏著層 20:板件 21:上表面 22a:第一開口 22b:第二開口 100:晶片封裝結構 110、210:晶片 110a、210a、210b:未切割晶圓 110b、210c、210d、210e、210f:已切割晶圓 111、211: 主動面 111a、211a:第一主動面 111b、211c:第二主動面 112、212:接墊 112a:第一接墊 112b:第二接墊 113、213: 背面 113a、213a:第一背面 113b、213c:第二背面 115、121、221、231:邊緣 120、120’ 、230、230’: 重配置線路層 130、240:銲球 215:周圍表面 220、220’:封裝膠體 222:底表面 C、C1、C2:弧線 G:水平間距 H:水平距離 S、S1、S2:直線 10: Carrying board 12: Adhesive layer 20: Plate 21: upper surface 22a: first opening 22b: second opening 100: Chip package structure 110, 210: chip 110a, 210a, 210b: uncut wafers 110b, 210c, 210d, 210e, 210f: diced wafer 111, 211: Active side 111a, 211a: the first active surface 111b, 211c: second active surface 112, 212: pad 112a: first pad 112b: second pad 113, 213: Back 113a, 213a: first back 113b, 213c: second back 115, 121, 221, 231: edge 120, 120’, 230, 230’: reconfiguration line layer 130, 240: solder ball 215: Surrounding surface 220, 220’: Encapsulating gel 222: bottom surface C, C1, C2: arc G: Horizontal spacing H: horizontal distance S, S1, S2: straight line

圖1A至圖1F是依照本發明的一實施例的一種晶片封裝結構的製作方法的示意圖。 圖2A至圖2G是依照本發明的另一實施例的一種晶片封裝結構的製作方法的示意圖。 1A to 1F are schematic diagrams of a manufacturing method of a chip package structure according to an embodiment of the present invention. 2A to 2G are schematic diagrams of a manufacturing method of a chip package structure according to another embodiment of the present invention.

10:承載板 10: Carrying board

12:黏著層 12: Adhesive layer

20:板件 20: Plate

110a:未切割晶圓 110a: Uncut wafer

110b:已切割晶圓 110b: diced wafer

112a:第一接墊 112a: first pad

112b:第二接墊 112b: second pad

120:重配置線路層 120: reconfiguration line layer

130:銲球 130: solder ball

Claims (13)

一種晶片封裝結構的製作方法,包括:提供至少一已切割晶圓,其中該至少一已切割晶圓的外型輪廓至少是由一直線與連接該直線的一弧線所構成;提供一已配置有一黏著層的一承載板;令該至少一已切割晶圓透過該黏著層而定位於該承載板上;形成一重配置線路層於該至少一已切割晶圓上,其中該至少一已切割晶圓與該重配置線路層電性連接;以及對該至少一已切割晶圓與該重配置線路層進行一單體化程序,以形成多個晶片封裝結構。 A method for manufacturing a chip package structure includes: providing at least one diced wafer, wherein the outline of the at least one diced wafer is formed by at least a straight line and an arc connecting the straight line; and providing an adhesive Layer of a carrier board; enabling the at least one cut wafer to be positioned on the carrier board through the adhesive layer; forming a reconfiguration circuit layer on the at least one cut wafer, wherein the at least one cut wafer and The reconfiguration circuit layer is electrically connected; and a singulation process is performed on the at least one cut wafer and the reconfiguration circuit layer to form a plurality of chip package structures. 如請求項1所述的晶片封裝結構的製作方法,更包括:提供該至少一已切割晶圓時,同時提供至少一未切割晶圓;令該至少一已切割晶圓透過該黏著層而定位於該承載板上之前,提供具有至少一第一開口與至少一第二開口的一板件於該黏著層上,該板件透過該黏著層而定位於該承載板上;以及將該至少一未切割晶圓與該至少一已切割晶圓分別配置於該至少一第一開口與該至少一第二開口內,且透過該黏著層而定位於該承載板上。 The manufacturing method of the chip package structure according to claim 1, further comprising: providing at least one uncut wafer when the at least one cut wafer is provided; and positioning the at least one cut wafer through the adhesive layer Before the carrying plate, a plate having at least one first opening and at least one second opening is provided on the adhesive layer, and the plate is positioned on the carrying plate through the adhesive layer; and the at least one The uncut wafer and the at least one cut wafer are respectively disposed in the at least one first opening and the at least one second opening, and are positioned on the carrier board through the adhesive layer. 如請求項2所述的晶片封裝結構的製作方法,其中該至少一第一開口的外型輪廓等於或大於該至少一未切割晶圓的外型輪廓,而該至少一第二開口的外型輪廓等於或大於該至少一已切割晶圓的外型輪廓。 The manufacturing method of the chip package structure according to claim 2, wherein the outline of the at least one first opening is equal to or greater than the outline of the at least one uncut wafer, and the outline of the at least one second opening The contour is equal to or greater than the outer contour of the at least one cut wafer. 如請求項2所述的晶片封裝結構的製作方法,其中該至少一未切割晶圓具有彼此相對的一第一主動面與一第一背面,而該至少一已切割晶圓具有彼此相對的一第二主動面與一第二背面,該至少一未切割晶圓的該第一背面與該至少一已切割晶圓的該第二背面直接接觸該黏著層。 The method for manufacturing a chip package structure according to claim 2, wherein the at least one uncut wafer has a first active surface and a first back surface opposite to each other, and the at least one cut wafer has a first active surface opposite to each other The second active surface and a second back surface, the first back surface of the at least one uncut wafer and the second back surface of the at least one cut wafer directly contact the adhesive layer. 如請求項4所述的晶片封裝結構的製作方法,其中該板件具有一上表面,而該至少一未切割晶圓的該第一主動表面與該至少一已切割晶圓的該第二主動表面切齊於該板件的該上表面。 The method for manufacturing a chip package structure according to claim 4, wherein the plate has an upper surface, and the first active surface of the at least one uncut wafer and the second active surface of the at least one cut wafer The surface is in line with the upper surface of the plate. 如請求項4所述的晶片封裝結構的製作方法,其中該至少一未切割晶圓包括設置在該第一主動面上的多個第一接墊,而該至少一已切割晶圓包括設置在該第二主動面上的多個第二接墊,該些第一接墊以及該些第二接墊分別與該重配置線路層電性連接。 The method for manufacturing a chip package structure according to claim 4, wherein the at least one uncut wafer includes a plurality of first pads disposed on the first active surface, and the at least one diced wafer includes A plurality of second pads on the second active surface, the first pads and the second pads are respectively electrically connected to the reconfiguration circuit layer. 如請求項1所述的晶片封裝結構的製作方法,更包括:對該至少一已切割晶圓與該重配置線路層進行該單體化程序之前,形成多個銲球於該重配置線路層上,其中該些銲球透過該重配置線路層與該至少一已切割晶圓電性連接。 The manufacturing method of the chip package structure according to claim 1, further comprising: forming a plurality of solder balls on the reconfiguration circuit layer before performing the singulation process on the at least one diced wafer and the reconfiguration circuit layer Above, the solder balls are electrically connected to the at least one diced wafer through the reconfiguration circuit layer. 如請求項7所述的晶片封裝結構的製作方法,更包括:形成該些銲球於該重配置線路層上之後,且對該至少一已切割晶圓與該重配置線路層進行該單體化程序之前,移除該承載板以及該黏著層。 The manufacturing method of the chip package structure according to claim 7, further comprising: after forming the solder balls on the reconfiguration circuit layer, and performing the monomer operation on the at least one cut wafer and the reconfiguration circuit layer Before the chemical process, remove the carrier board and the adhesive layer. 一種晶片封裝結構的製作方法,包括:提供至少一已切割晶圓,其中該至少一已切割晶圓的外型輪廓至少是由一直線與連接該直線的一弧線所構成;提供一已配置有一黏著層的一承載板;令該至少一已切割晶圓透過該黏著層而定位於該承載板上;對該至少一已切割晶圓進行一第一次單體化程序,而形成透過該黏著層而定位於該承載板上的多個晶片;形成一封裝膠體於該黏著層上,其中該封裝膠體包覆該些晶片;移除該承載板及該黏著層,而暴露出該封裝膠體的一底表面;形成一重配置線路層於該封裝膠體的該底表面上,其中該重配置線路層與該些晶片電性連接;以及對該封裝膠體、該些晶片以及該重配置線路層進行一第二次單體化程序,以形成多個晶片封裝結構。 A method for manufacturing a chip package structure includes: providing at least one diced wafer, wherein the outline of the at least one diced wafer is formed by at least a straight line and an arc connecting the straight line; and providing an adhesive The at least one cut wafer is positioned on the support board through the adhesive layer; the first singulation process is performed on the at least one cut wafer to form a through the adhesive layer And a plurality of chips positioned on the carrier board; forming an encapsulating glue on the adhesive layer, wherein the encapsulating glue covers the chips; removing the carrier board and the adhesive layer to expose a part of the encapsulating glue Bottom surface; forming a reconfiguration circuit layer on the bottom surface of the packaging compound, wherein the reconfiguration circuit layer is electrically connected to the chips; and performing a second operation on the packaging compound, the chips, and the reconfiguration circuit layer Secondary singulation process to form multiple chip package structures. 如請求項9所述的晶片封裝結構的製作方法,更包括:提供該至少一已切割晶圓時,同時提供至少一未切割晶圓,其中該至少一未切割晶圓具有彼此相對的一第一主動面與一第一背面,而該至少一已切割晶圓具有彼此相對的一第二主動面與一第二背面,該至少一未切割晶圓的該第一主動面與該至少一已切割晶圓的該第二主動面直接接觸該黏著層。 The manufacturing method of the chip package structure according to claim 9, further comprising: when the at least one cut wafer is provided, at least one uncut wafer is simultaneously provided, wherein the at least one uncut wafer has a first An active surface and a first back surface, the at least one cut wafer has a second active surface and a second back surface opposite to each other, the first active surface and the at least one back surface of the at least one uncut wafer The second active surface of the dicing wafer directly contacts the adhesive layer. 如請求項9所述的晶片封裝結構的製作方法,其中相鄰兩該些晶片之間具有一水平間距,而該水平間距為30微米至100微米。 The manufacturing method of the chip package structure according to claim 9, wherein there is a horizontal interval between two adjacent chips, and the horizontal interval is 30 μm to 100 μm. 如請求項9所述的晶片封裝結構的製作方法,更包括:對該封裝膠體、該些晶片以及該重配置線路層進行該第二次單體化程序之前,形成多個銲球於該重配置線路層上,其中該些銲球透過該重配置線路層與該些晶片電性連接。 The manufacturing method of the chip package structure according to claim 9, further comprising: forming a plurality of solder balls on the reconfiguration circuit layer before performing the second singulation procedure on the package compound, the chips and the reconfiguration circuit layer. On the configuration circuit layer, the solder balls are electrically connected to the chips through the reconfiguration circuit layer. 如請求項9所述的晶片封裝結構的製作方法,其中該封裝膠體的一邊緣與該晶片的一周圍表面之間具有一水平距離,而該水平距離為15微米至50微米。 The manufacturing method of the chip packaging structure according to claim 9, wherein there is a horizontal distance between an edge of the packaging compound and a peripheral surface of the chip, and the horizontal distance is 15 to 50 μm.
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