TWI710862B - Movable body apparatus, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method - Google Patents

Abstract

The substrate stage device (20) is equipped with an X column (24) that can move in the Y-axis direction, is provided on the X column (24) and can move in the Y-axis direction together with the X column (24), and can move relative to the X column (24). ) Coarse movement stage (26) that moves in the X-axis direction, fine movement stage (28) that holds the substrate (P) and is induced to move in the X-axis and/or Y-axis direction by the coarse movement stage (26), and respectively It is arranged on the +Y side and -Y side of the X column (24) to support the +Y side and -Y side area of the micro-movement stage (28) from below and can move in the Y-axis direction together with the micro-movement stage (28) One pair of step guides (30).

Description

Mobile device, exposure device, method for manufacturing flat panel display, and method for manufacturing device

The present invention relates to a mobile device, an exposure device, a method of manufacturing a flat panel display, and a method of manufacturing a device. More specifically, it relates to a mobile device that drives an object holding member that holds an object along a horizontal plane, including the aforementioned mobile device. An exposure device that forms a predetermined pattern on the aforementioned object, a method of manufacturing a flat panel display using the aforementioned exposure device, and a method of manufacturing an element using the aforementioned exposure device.

In the past, in the lithography process for manufacturing electronic components (microcomponents) such as liquid crystal display elements and semiconductor components (integrated circuits, etc.), a mask or reticle (hereinafter collectively referred to as "mask") and glass The plate or wafer (hereinafter collectively referred to as "substrate") is a step-and-scan exposure device that moves synchronously along a predetermined scanning direction (SCAN direction) while using an energy beam to transfer the pattern formed on the mask to the substrate.

As this type of exposure device, since the position in the horizontal plane of the substrate (scanning direction, cross-scanning direction, and the position around the axis orthogonal to the horizontal plane) is controlled with high speed and high precision, a so-called bracket ( gantry) type of substrate stage device with coarse and fine motion structure formed by combining a 2-axis coarse motion stage and a fine motion stage (see, for example, Patent Document 1).

With the increase in the size of substrates in recent years, the size of the substrate stage device has also increased, so it is expected to have A substrate stage device with a simple structure and capable of controlling the position of a large substrate in the horizontal plane with high precision and high speed.

[Patent Literature]

[Patent Document 1] U.S. Invention Patent Application Publication No. 2010/0018950

The present invention is made in view of the above situation, and viewed from a first point of view, it is a mobile device comprising: a first mobile body that can move in a position along a first direction in a two-dimensional plane parallel to a horizontal plane; The second movable body is provided in the first movable body, and can move together with the first movable body in the position along the first direction, and can move relative to the first movable body along the two-dimensional plane and the first movable body. The position moves in the second direction orthogonal to the direction; the object holding member holds the object and is induced by the second moving body to move along the two-dimensional plane; the first guide member is arranged in the first direction in the first direction The moving body is supported from below when the object holding member moves in the second direction, and the object holding member is in an area on one side of the first direction, and can move in the first direction together with the object holding member; and The second guide member is arranged on the other side of the first moving body in the first direction, and is supported from below when the object holding member moves in the second direction, the object holding member is on the other side of the first direction Area, and can move in the first direction together with the object holding member.

Thereby, the object holding member is guided by the first and second moving bodies along a two-dimensional plane parallel to the horizontal plane. The first and second guide members that support the object holding member on one side and the other side area in the first direction from below move in the first direction together with the object holding member, so the structure of the device is simple.

Viewed from a second viewpoint, the present invention is an exposure apparatus including: the moving body device of the first viewpoint of the present invention; and a pattern forming apparatus that uses energy beams to form a predetermined pattern on the object held by the object holding member.

Viewed from a third point of view, the present invention is a method for manufacturing a flat panel display, which includes: The operation of exposing the aforementioned object with the exposure device of the second aspect of the present invention; and the operation of developing the aforementioned object after exposure.

Viewed from a fourth viewpoint, the present invention is a device manufacturing method including: the operation of exposing the object using the exposure device of the exposure device of the second viewpoint of the present invention; and the operation of developing the object after the exposure.

10: Liquid crystal exposure device

11: Ground

12: Lighting Department

14: Mask stage

16: Projection Optics

18: substrate carrier table

19: Anti-vibration device

20: substrate stage device

21: Micro-motion stage

21a: Magnet unit

21b: Coil unit

22: bottom frame

23: Y linear guide device

23a: Y linear guide

23b: Y sliding member

24: X column

25: Y bracket

26: coarse movement stage

27: Y linear guide device

27a: Y linear guide

27b: Y sliding member

28: Micro-motion stage

29: Y linear guide device

29a: X linear guide

29b: X sliding member

30: step guide

31: X linear motor

31a: Magnet unit

31b: Coil unit

32: mounting plate

34: Link device

36: substrate holder

38: mirror base

40x: X rod mirror

40y: Y rod mirror

42: reinforcement block

44: Air bearing

46a: X anchor

46b: X mover

46x: X voice coil motor

46y: Y voice coil motor

IL: Illumination light

M: Mask

P: substrate

Fig. 1 is a diagram schematically showing the structure of a liquid crystal exposure apparatus according to an embodiment.

FIG. 2 is a plan view of the substrate stage device included in the liquid crystal exposure device of FIG. 1. FIG.

Figure 3 is a cross-sectional view taken along line B of Figure 2;

Hereinafter, an embodiment will be explained using FIGS. 1 to 3.

FIG. 1 schematically shows the structure of a liquid crystal exposure apparatus 10 according to an embodiment. The liquid crystal exposure device 10 is a step-and-scan projection exposure device that uses a rectangular (angled) glass substrate P (hereinafter simply referred to as substrate P) used for liquid crystal display devices (flat panel displays) and the like as the exposure object. Scanning machine.

The liquid crystal exposure apparatus 10 includes an illumination system 12, a mask stage 14 holding a mask M, a projection optics system 16, a "substrate stage stage 18" (an example of the second base), and a surface (in FIG. 1) It is the substrate stage device 20 of the substrate P on which the resist (sensor) is applied to the surface facing the +Z side, and these control systems. In the following description, the direction in which the light mask M and the substrate P are scanned relative to the projection optical system 16 is the X-axis direction, the direction orthogonal to the X-axis in the horizontal plane is the Y-axis direction, and the The direction in which the axis and the Y axis are orthogonal to each other is the Z axis direction, and the rotation directions around the X axis, Y axis, and Z axis are respectively the θx, θy, and θz directions.

The lighting system 12 has the same structure as the lighting system disclosed in the specification of US Patent No. 5,729,331, for example. That is, the illumination system 12 irradiates the mask M with illumination light IL for exposure. The illumination light IL system uses, for example, i-line (wavelength 365nm), g-line (wavelength 436nm), h-line (wavelength 405nm) Equal light (or the combined light of the i-line, g-line, and h-line above).

The mask stage 14 holds a mask M in which a predetermined circuit pattern is formed, for example, by vacuum suction. The mask stage 14 is driven in the scanning direction (X-axis direction) with a predetermined stroke by a mask stage drive system (not shown) including, for example, a linear motor, and is appropriately driven slightly in the Y-axis direction and θz direction. The position information of the mask stage 14 in the XY plane (including the rotation information in the θz direction) is obtained by a mask interferometer system including a laser interferometer not shown.

The projection optical system 16 is arranged under the mask stage 14. The projection optical system 16 has the same configuration as the projection optical system disclosed in the specification of US Patent No. 6,552,775, for example. That is, the projection optical system 16 includes, for example, a so-called multi-lens projection optical system in which a plurality of optical systems with equal magnification systems telecentric on both sides form an upright image. The projection optics of a single image field has the same function.

Therefore, after illuminating the illumination area on the mask M with the illumination light IL from the illumination system 12, the projected image of the circuit pattern of the mask M in the illumination area is projected by the illumination light IL passing through the mask M. The optical system 16 is formed in the illumination area of the illumination light IL conjugated to the illumination area on the substrate P. Then, by moving the photomask M in the scanning direction relative to the illumination area (illumination light IL), and moving the substrate P in the scanning direction relative to the exposure area (illumination light IL), thereby transferring to an illumination area on the substrate P The pattern formed on the mask M.

The substrate stage 18 is composed of a member extending in the Y-axis direction. As shown in FIG. 2, for example, two are provided at a predetermined interval in the X-axis direction. For example, a plurality of Y linear guides 27a extending in the Y-axis direction are fixed at predetermined intervals in the X-axis direction on the respective upper surfaces of the two substrate stages 18, and in this embodiment, there are three. The vicinity of the longitudinal end of the substrate stage 18 is supported from below by an anti-vibration device 19 installed on the floor 11 of the clean room as shown in FIG. 1. The substrate stage 18 constitutes a part of the apparatus body (machine body) of the liquid crystal exposure apparatus 10. The mask stage 14 and the projection optical system 16 are supported by the main body of the apparatus, and are separated from the ground 11 in vibration. In addition, the substrate stage device 20 shown in FIG. 1 corresponds to the cross-sectional view along the line A-A in FIG. 2.

The substrate stage device 20, as shown in FIG. 2, has a pair of "bottom frames 22" (an example of the first base), and an "X column 24" (an example of a second drive system) erected on the pair of bottom frames 22 Mode), the "coarse motion stage 26" mounted on the X column 24 (an example of the first drive system), the coarse motion stage 26 is guided in the X-axis direction and/or Y-axis with a predetermined stroke The micro-movement stage 28 of the direction and a pair of "stepping guides 30" that guide the movement of the micro-movement stage 21 along the XY plane (an example of the supporting device).

A pair of bottom frames 22, one is set on the +X side of the +X side substrate stage 18, and the other is set on the -X side of the -X side substrate stage 18, separated from the substrate stage 18 by a predetermined distance ( In the state of vibration separation) set on the ground 11 of the clean room. The pair of bottom frames 22 support the vicinity of both ends in the longitudinal direction of the X-pillar 24 described later from below, and serve as a guide member when the X-pillar 24 moves in the Y-axis direction with a predetermined long stroke. As shown in FIG. 3, magnet units 21a (Y-fixers) including a plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction are respectively fixed on both sides of the bottom frame 22. In addition, a Y linear guide 23a that is an element of the Y linear guide 23 is fixed to the upper end surface (+Z side end) of the bottom frame 22.

The X column 24 is composed of a member with a YZ cross-sectional rectangle (refer to FIG. 1) extending in the X-axis direction. On the lower surface near both ends in the longitudinal direction of the X-pillar 24, a member having an inverted U-shaped XZ cross section called a Y bracket 25 is fixed corresponding to the pair of bottom frames 22. The bottom frame 22 is inserted between the opposite surfaces of the Y bracket 25. On the top surface of the Y bracket 25, a Y sliding member 23b that forms the Y linear guide 23 together with the Y linear guide 23a is fixed. The Y sliding member 23b is slidably engaged with the corresponding Y linear guide 23a with low friction, and the X column 24 can move on the pair of bottom frames 22 with a predetermined stroke in the Y axis direction with low friction.

In addition, a coil unit 21b (X movable element) constituting the Y linear motor 21 together with the magnet unit 21a is fixed to one of the opposite surfaces of the Y bracket 25, respectively. The X column 24 is driven in the Y axis direction on the pair of bottom frames 22 by the Y linear motor 21 described above. In addition, the type of Y actuator that drives the X column 24 is not limited to this. For example, a feed screw device, a belt drive device, and a wire drive can be used. Moving devices, etc.

The Z position under the X column 24 is shown in FIG. 1 and is set to be closer to the +Z side than the upper end of the Y linear guide 27a. The X column 24 is separated from the substrate stage 18 (ie, the device body) in vibration. In addition, an auxiliary bottom frame that supports the center portion of the X column 24 in the longitudinal direction from below may be arranged between the pair of substrate mounts 18.

Furthermore, on the X column 24, as shown in FIG. 2, the X linear guide 29a, which is an element of the X linear guide 29, is fixed at a predetermined interval in the X axis direction, for example, two. In addition, magnet units 31a (X holders) including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction are fixed to both sides of the X column 24.

The coarse motion stage 26 is composed of a rectangular parallelepiped-shaped member, and a plurality of X sliding members 29b constituting the X linear guide device 29 together with the above-mentioned X linear guide 29a are fixed on the lower surface thereof. As shown in FIG. 3, the X sliding member 29b is provided in one X linear guide 29a at predetermined intervals in the X-axis direction, for example, two. The X sliding member 29b is slidably engaged with the corresponding X linear guide 29a with low friction, and the coarse motion stage 26 can move on the X column 24 with a predetermined stroke in the X axis direction with low friction.

In addition, on both sides of the coarse motion stage 26, the coil unit 31b of the X linear motor 31 configured to drive the coarse motion stage 26 in the X-axis direction with a predetermined stroke together with the magnet unit 31a is fixed through the mounting plate 32 ( X movable sub).

The coarse motion stage 26 is restricted from relative movement in the Y axis direction with respect to the X column 24 by the Y linear guide device 29, and moves in the Y axis direction integrally with the X column 24. That is, the "coarse movement stage 26 and the X-pillar 24" (an exemplary aspect of the drive system) together constitute a gantry type two-axis stage device. The Y position information of the X column 24 and the X position information of the coarse motion stage 26 are respectively obtained by, for example, a linear encoder system (or an optical interferometer system) not shown.

The pair of stepping guides 30 are both mounted on the pair of substrate stage tables 18 as shown in FIG. 2. The pair of step guides 30 are each composed of a member having a rectangular cross-section of YZ extending in the X-axis direction (see FIG. 1), and are arranged parallel to each other at a predetermined interval in the Y-axis direction. The above X-pillar 24 passes through a predetermined gap Insert a pair of step guide 30 between. The length direction (X axis direction) of the stepping guide 30 is set to be slightly shorter than the X column 24, and the width direction (Y axis direction) is set to be slightly wider than the X column 24. The flatness of the upper surface of the stepping guide 30 is made very high.

Below the stepping guide 30, as shown in FIG. 1, there are fixed a plurality of Y sliding members 27b that form the Y linear guide 27 together with the Y linear guide 27a. The Y sliding member 27b is provided with, for example, two Y linear guides 27a at predetermined intervals in the Y-axis direction. The Y sliding member 27b is slidably engaged with the corresponding Y linear guide 27a with low friction, and the step guide 30 can move on the pair of substrate stage 18 with a predetermined stroke in the Y-axis direction with low friction.

As shown in FIG. 2, the pair of step guides 30 are mechanically connected to the X-pillar 24 through a connecting device 34 in the vicinity of both ends in the longitudinal direction. The connecting device 34 includes a rod-shaped member extending in the Y-axis direction and sliding joint devices (such as ball joints) installed at both ends of the rod-shaped member. The sliding joint device is installed on the X column 24 and the step guide 30 through the sliding joint device. between. The rigidity of the rod-shaped member in the Y-axis direction is set to be high.

In the substrate stage device 20, when the X column 24 is driven in one of the Y-axis directions (for example, +Y) by a plurality of Y linear motors 21 (not shown in FIG. 2; refer to FIG. 3), the Y-axis The stepping guide 30 on the other side of the axis direction (for example -Y side) is pulled by the X column 24 through the connecting device 34, and the stepping guide 30 on one side of the Y axis direction (for example, the +Y side) is connected through The device 34 is pressed against the X column 24. Thereby, the pair of step guides 30 and the X column 24 move integrally in the Y-axis direction.

Returning to FIG. 1, the micro-movement stage 28 is composed of a rectangular box-shaped member in a plan view, and a substrate holder 36 is fixed on the top. On the -Y side surface of the micro-movement stage 28, a Y rod mirror 40y with a reflective surface orthogonal to the Y axis is fixed through the mirror base 38, and on the -X side surface of the micro-movement stage 28, as shown in Figure 3 The transmission mirror base 38 is fixed with an X rod mirror 40x having a reflective surface orthogonal to the X axis. In addition, in FIG. 2, in order to avoid the illustration being too complicated, the illustrations of the substrate holder 36, the mirror base 38, the Y rod mirror 40y, and the X rod mirror 40x (refer to FIGS. 1 and 3) are respectively omitted.

Near the four corners below the micro-movement stage 28, reinforcement blocks 42 are respectively installed as shown in FIG. 2. Furthermore, under the reinforcement block 42, an air bearing 44 is installed as shown in FIG. Returning to Fig. 2, the gas ejection surfaces (bearing surfaces) of the two air bearings 44 on the +Y side oppose the stepping guide 30 on the +Y side, and the gas ejection surfaces of the two air bearings 44 on the -Y side Opposite to the upper surface of the step guide 30 on the -Y side. For example, the four air bearings 44 spray pressurized gas (for example, air) onto the corresponding stepping guide 30. The micro-motion stage 28 is suspended on a pair of step guides 30 with a small gap by the static pressure of the gas supplied between the air bearing 44 and the step guide 30. In addition, the arrangement and number of the air bearings 44 are not particularly limited as long as the micro-movement stage 28 can float on the pair of step guides 30 in a stable state.

The fine movement stage 28 is induced by the coarse movement stage 26 by a fine movement stage drive system including a plurality of voice coil motors to be driven in the X-axis direction and/or the Y-axis direction. A plurality of voice coil motors includes, for example, two X voice coil motors 46x and two Y voice coil motors 46y, which generate stacking forces in the X-axis direction as shown in FIG. 2. For example, two X voice coil motors 46x, one is arranged on the +Y side of the micro-motion stage 28, the other is arranged on the -Y side of the micro-motion stage 28, for example, two Y voice coil motors 46y, one is arranged on the micro-motion stage 28 The +X side of the stage 28, and the other side is arranged on the -X side of the micro-motion stage 28.

The structure of the plurality of voice coil motors described above is the same except for the configuration. Therefore, the X voice coil motor 46x arranged on the +Y side of the micro-motion stage 28 will be described below. As shown in FIG. 1, the X voice coil motor 46x includes an X stator 46a fixed on the +Y side of the coarse motion stage 26 and an X movable member 46b fixed below the fine motion stage 28. The X stator 46a has a coil unit not shown. The X movable element 46b is formed in a U-shape in the YZ cross-section, and a permanent magnet is fixed to a pair of opposed surfaces. The coil unit of the X stator 46a is inserted between the pair of permanent magnets through a predetermined gap. In addition, although the X voice coil motor 46x of this embodiment is a moving magnet type, it may be a moving coil type.

When the substrate stage device 20, for example, the coarse motion stage 26 moves along the X column 24 with a long stroke in the X-axis direction, it controls the thrust in the X-axis direction generated by, for example, two X voice coil motors 46x (Lorentz Force) so that the fine movement stage 28 moves in the same direction and the same speed as the coarse movement stage 26. In addition, when the X-pillar 24 moves in the Y-axis direction with a long stroke, for example, the thrust in the Y-axis direction generated by the two Y voice coil motors 46y is controlled to make the fine movement stage 28 and the X-pillar 24 (that is, coarse movement) The stage 26) moves in the same direction and at the same speed. Thereby, the coarse motion stage 26 and the fine motion stage 28 move together with a long stroke along the XY plane.

In addition, the micro-motion stage 28 makes the thrust directions of the two X voice coil motors 46x (or, for example, the two Y voice coil motors 46y) opposite to each other, and moves in the θz direction relative to the coarse motion stage 26 Driven slightly. When the fine movement stage 28 is induced by the coarse movement stage 26 to be driven with a long stroke in the X-axis direction, it is appropriately finely driven in the Y-axis direction and/or the θz direction.

The liquid crystal exposure apparatus 10 (refer to FIG. 1) constructed in the above manner is managed by a main control device (not shown), and the mask M is loaded on the mask stage 14 by a mask loader (not shown). And the substrate P is loaded on the substrate holder 36 by a substrate loader not shown. After that, the main control device uses the alignment detection system not shown to perform alignment measurement. After the alignment measurement is completed, step-and-scan exposure actions are successively performed on the plurality of shot areas set on the substrate P . In addition, since this exposure operation is the same as that of the conventional step-and-scan method, the detailed description is omitted.

For example, in the scanning exposure operation during the exposure operation of the step-and-scan method described above, in the substrate stage device 20, the micro-movement stage 28 holding the substrate P through the substrate holder 36 is driven with a long stroke in the X-axis direction. The size of the stepping guide 30 in the longitudinal direction (X-axis direction) is set to be slightly longer than the movable distance of the fine movement stage 28 in the X-axis direction. When the fine movement stage 28 and the coarse movement stage 26 move in the X-axis direction, It moves on a pair of step guides 30. In addition, when the fine movement stage 28 performs a stepping operation in the Y-axis direction, it moves in the Y-axis direction integrally with the coarse movement stage 26, the X column 24, and the pair of step guides 30. Therefore, the fine movement stage 28 will not fall off from the pair of step guides 30.

According to the substrate stage device 20 of the present embodiment described above, since the fine movement stage 28 is not The contact state is mounted on the pair of step guides 30, so the micro-movement stage 28 can be driven (induced) in the X-axis and/or Y-axis directions with a small thrust. In addition, since the position control of the micro-movement stage 28 is improved, high-precision exposure can be performed. In addition, since the transmission of external vibration and reaction force to the micro-movement stage 28 is suppressed, the position of the micro-movement stage 28 can be controlled with high precision.

In addition, since the pair of stepping guides 30 cover the movable range of the micro-movement stage 28 in the X-axis direction, and move integrally with the micro-movement stage 28 in the Y-axis direction, the substrate stage device 20 does not need to have sufficient coverage A guide member (for example, a fixed plate) of a wide area for the full range of movement of the micro-movement stage 28 in the XY plane. Therefore, the cost is low and transportation and assembly are easy.

In addition, since the magnet unit 21a (Y stator), which is an element of the Y linear motor 21 for driving the X-pillar 24, is separated from the substrate stage 18 in vibration, it is possible to suppress the driving reaction force and vibration when the X-pillar 24 is driven. Etc. are transmitted to the projection optical system 16 etc. supported by the apparatus body.

In addition, the configuration of the present embodiment described above can be appropriately changed. For example, a Z tilt actuator may be arranged between the micro-movement stage 28 and the substrate holder 36, or between the reinforcement block 42 and the micro-movement stage 28 to control the Z-axis direction, the θx direction, and the θy direction of the substrate P. position. In addition, a plurality of X pillars 24 may be arranged between the pair of step guides 30.

Moreover, in the above-mentioned embodiment, although the stepping guide 30 is pulled by the X column 24 to move in the Y-axis direction, it is not limited to this. For example, an actuator such as a linear motor may be used to connect the pair of stepping guides 30 and The X columns 24 are driven independently. In this case, as a stator for driving the linear motor of the pair of stepping guides 30, the Y stator 21a fixed to the bottom frame 22 can also be used (refer to FIG. 3).

In addition, in the above embodiment, although the X column 24 is driven in the Y axis direction by a plurality of Y linear motors 21 and the pair of stepping guides 30 and the X column 24 move integrally in the Y axis direction, it is not limited to Here, a pair of stepping guides 30 are driven in the Y-axis direction by an actuator (such as a linear motor), and the X-pillar 24 moves in the Y-axis direction (even if the actuator for driving the X-pillar 24 is not provided) It can be.

In addition, in the above-mentioned embodiment, although the fine movement stage 28 passes through a plurality of air bearings 44, The square is supported on a pair of step guides 30 in a non-contact manner, but the micro-motion stage 28 can also be mounted on the step guide 30 in a contact state through a rolling element (such as a ball).

In addition, a pair of stepping guides 30 may be physically (mechanically) connected (but it does not interfere with the X column 24). In this case, after the stepping guide 30 on one side is pulled by the X-pillar 24, the stepping guide 30 on the other side also moves integrally, so for example, as long as the X-pillar 24 only pulls (or presses) the stepping guide on one side 30 is fine.

In addition, the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193nm), KrF excimer laser light (wavelength 248nm), or vacuum ultraviolet light such as F2 laser light (wavelength 157nm). In addition, as illuminating light, for example, single-wavelength laser light in the infrared band or visible light band emitted from a DFB semiconductor laser or fiber laser can be used, for example, a fiber amplifier doped with erbium (or both erbium and ytterbium). Amplification, using nonlinear optical crystals to convert the wavelength into harmonics of ultraviolet light. In addition, solid lasers (wavelengths: 355 nm, 266 nm) and the like can also be used.

In addition, although the above-mentioned embodiment has described the case of the projection optical system 16 of the multi-lens system provided with a plurality of projection optical units, the number of projection optical units is not limited to this, as long as there is more than one. In addition, it is not limited to the projection optical system of the multi-lens method, and may be, for example, a projection optical system using an Ofner-type large mirror. In addition, in the above-mentioned embodiment, although the case where the projection magnification is used as the projection optical system 16 is described, it is not limited to this, and the projection optical system may be either a reduction system or an enlargement system.

In addition, although a light-transmitting photomask with a predetermined light-shielding pattern (or phase pattern, dimming pattern) formed on a light-transmitting photomask substrate is used, it can be replaced with this photomask, for example, US Patent No. 6,778,257 According to the electronic data of the pattern to be exposed, the electronic mask (variable shaping mask) that forms the transmission pattern, the reflection pattern, or the luminous pattern according to the electronic data disclosed in the specification, such as the use of non-luminous image display elements (also known as spatial light modulation) DMD (Digital Micro-mirror Device), a kind of variable shaping mask.

In addition, as the exposure device, the size (including at least one of the outer diameter, the diagonal length, and one side The exposure device is particularly effective for exposing large-scale substrates for flat panel displays (FPD) such as liquid crystal display elements, which are 500mm or more substrates, as exposure objects.

In addition, as an exposure device, it can also be applied to a step & repeat method exposure device and a step & stitch method exposure device. In addition, the object held by the mobile device is not limited to the substrate or the like of the object to be exposed, and may be a pattern holder (original plate) such as a photomask.

In addition, the use of the exposure device is not limited to the exposure device for liquid crystal that transfers the pattern of the liquid crystal display element to the square glass plate, but can also be widely applied to, for example, exposure devices for semiconductor manufacturing, for the manufacture of thin film magnetic heads, micromachines, and DNA Exposure equipment for wafers, etc. In addition, not only micro-elements such as semiconductor components, the present invention can also be applied to the manufacture of photomasks or reticles for light exposure devices, EUV exposure devices, X-ray exposure devices, electronic line exposure devices, etc. The pattern is transferred to exposure devices such as glass substrates or silicon wafers. Furthermore, the object to be exposed is not limited to a glass plate, and may also be other objects such as a wafer, a ceramic substrate, a thin film member, or a mask blank. In addition, when the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited. For example, a film-like (flexible sheet-like member) is also included.

Electronic components such as liquid crystal display components (or semiconductor components) are manufactured through the following steps, namely: the steps of designing the function and performance of the components, the steps of making a mask (or reticle) according to this design step, and manufacturing The step of glass substrate (or wafer), the lithography step of transferring the pattern of the photomask (reticle) to the glass substrate according to the exposure device and the exposure method of the above embodiments, and developing the exposed glass substrate The development step, the etching step to remove the exposed member of the part other than the remaining part of the resist by etching, the resist removal step to remove the resist that is not needed due to the completion of the etching, the component assembly step, the inspection step, etc. In this case, in the lithography step, since the exposure method described above is performed using the exposure device of the above embodiment, the device pattern is formed on the glass substrate, and therefore, a high-integration device can be manufactured with good productivity.

Industrial availability

As explained above, the mobile device of the present invention is suitable for the object holding member that holds the object Drive along a two-dimensional plane parallel to the horizontal plane. Furthermore, the exposure device of the present invention exposes an object. Moreover, the manufacturing method of the flat panel display of the present invention is suitable for the manufacturing of the flat panel display. Moreover, the device manufacturing method of the present invention is suitable for the manufacture of micro devices.

10‧‧‧LCD Exposure Device

11‧‧‧land

12‧‧‧Lighting Department

14‧‧‧Mask Stage

16‧‧‧Projection Optics

18‧‧‧Substrate carrier table

19‧‧‧Anti-vibration device

20‧‧‧Substrate stage device

24‧‧‧X Pillar

26‧‧‧Coarse movement stage

27‧‧‧Y Linear guide device

27a‧‧‧Y linear guide

27b‧‧‧Y sliding member

28‧‧‧Micro-motion stage

29‧‧‧Y Linear guide device

29a‧‧‧X linear guide

29b‧‧‧X sliding member

30‧‧‧Step guide

31‧‧‧X Linear Motor

31a‧‧‧Magnet unit

31b‧‧‧Coil unit

32‧‧‧Mounting plate

34‧‧‧Connecting device

36‧‧‧Substrate holder

38‧‧‧Mirror base

42‧‧‧Reinforcement block

44‧‧‧Air Bearing

46a‧‧‧X holder

46b‧‧‧X Movable

46x‧‧‧X voice coil motor

IL‧‧‧Illumination light

M‧‧‧Mask

P‧‧‧Substrate

Claims (12)

A moving body device comprising: a first moving body capable of moving in a position along a first direction in a two-dimensional plane parallel to a horizontal plane; and a second moving body provided on the first moving body and capable of being compatible with the first moving body. The moving body moves together at a position along the first direction, and can move relative to the first moving body in a position in a second direction orthogonal to the first direction in the two-dimensional plane; the object holding member is for holding the object , Induced by the second moving body to move along the two-dimensional plane; the first guide member is arranged on the side of the first moving body in the first direction, and is supported by the object holding member in the second direction from below When moving, the object holding member is in one side area of the first direction, and can move in the first direction together with the object holding member; and the second guide member is arranged on the first moving body in the first direction The other side is supported from below when the object holding member moves in the second direction, and the object holding member is in the other side area of the first direction, and can move in the first direction together with the object holding member. Such as the mobile device of the first item of the scope of patent application, wherein the object holding member is supported by the first and second guide members in a non-contact manner. Such as the mobile device of the second item of the patent application, wherein the object holding member is supplied between the object holding member and the first guide member, and between the object holding member and the second guide member The static pressure of the gas is suspended on the first and second guide members in a non-contact manner. For example, the moving body device of any one of items 1 to 3 in the scope of patent application, which further includes moving the object holding member in the first and second directions relative to the second moving body, and around an axis orthogonal to the horizontal plane Actuator driven slightly. For example, in the mobile device of claim 4, the object holding member is induced by the second mobile body along the horizontal plane by the thrust generated by the actuator. For example, the mobile device according to any one of items 1 to 5 in the scope of the patent application further includes a connecting member that physically connects the first mobile body and the first and second guide members. An exposure apparatus is provided with: a moving body apparatus according to any one of items 1 to 6 in the scope of patent application; and a pattern forming apparatus that uses energy beams to form a predetermined pattern on the object held by the object holding member. For example, in the exposure device of claim 7, wherein when the pattern is formed on the object, the moving body device moves the object in the second direction relative to the energy beam. Such as the exposure device of the 7th or 8th patent application, wherein the aforementioned system is used for the substrate of flat panel display device. For example, the exposure device of claim 9, wherein the length of at least one side or diagonal length of the aforementioned substrate is 500mm or more. A method for manufacturing a flat panel display, comprising: using the exposure device of the 9th or 10th patent application to expose the aforementioned object; and the operation of developing the aforementioned object after exposure. A method of manufacturing a device, which includes: the operation of exposing the aforementioned object using the exposure device of the 7th or 8th patent application; and the operation of developing the aforementioned object after the exposure.

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