TWI709441B - Substrate container and purge tower assembly for the substrate container - Google Patents
Substrate container and purge tower assembly for the substrate container Download PDFInfo
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- TWI709441B TWI709441B TW105128692A TW105128692A TWI709441B TW I709441 B TWI709441 B TW I709441B TW 105128692 A TW105128692 A TW 105128692A TW 105128692 A TW105128692 A TW 105128692A TW I709441 B TWI709441 B TW I709441B
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Description
本發明大體上係關於用於微型環境之清潔系統,且更具體而言本發明係關於用於基板容器之噴灑器塔。 The present invention generally relates to cleaning systems for micro-environments, and more specifically, the present invention relates to sprinkler towers for substrate containers.
在將基板自一基板容器插入或移除期間,灰塵痕跡、氣體雜質或增加溼度可引入該基板容器中,負面影響駐留晶圓之產物良率。相應地,在基板處置期間存在對於控制此等容器內之環境之一增加需求以達成或維持清潔度之一高位準。 During the insertion or removal of the substrate from a substrate container, dust traces, gas impurities, or increased humidity can be introduced into the substrate container, negatively affecting the product yield of the resident wafer. Correspondingly, there is an increased need to control one of the environments in these containers during substrate processing to achieve or maintain a high level of cleanliness.
在一些例項中,使用透過一入口端口注入一基板容器之內部以引起該容器內之空氣透過一出口端口離開之一惰性氣體來清潔該容器內之一微型環境。將清潔氣體遞送至該容器中之系統及方法已經設計以提供該容器內之一改良環境。 In some examples, injecting into the interior of a substrate container through an inlet port is used to cause the air in the container to leave an inert gas through an outlet port to clean a microenvironment in the container. The system and method for delivering clean gas into the container has been designed to provide an improved environment in the container.
由於開發了前開式晶圓傳送盒(FOUP),因此由載體製造商引入底部清潔端口以使用清潔乾燥空氣(CDA)或惰性清潔來實現內部環境之清潔。在FOUP殼之內部底面下方引入此等清潔模組。 Since the front opening wafer transfer box (FOUP) was developed, the carrier manufacturer introduced the bottom cleaning port to use clean dry air (CDA) or inert cleaning to clean the internal environment. Introduce these cleaning modules under the inner bottom surface of the FOUP shell.
當引入清潔噴灑器時,吾人將明白:若噴灑器軸向組裝至清潔介面,則噴灑器將不僅干擾晶圓處置排除體積亦干擾儲存在FOUP內部的晶圓。相反,在未對既有殼設計實行任何修改之情況下,噴灑器管設計為軸 向朝內部偏移。 When the cleaning sprayer is introduced, we will understand that if the sprayer is assembled axially to the cleaning interface, the sprayer will not only interfere with the wafer disposal volume but also the wafers stored in the FOUP. On the contrary, without any modification to the existing shell design, the sprinkler tube is designed as a shaft Offset towards the inside.
讓渡給Burns等人(「Burns」)之美國專利第9,054,144號揭示一種具一清潔塔之基板容器,該清潔塔包含由一偏移導管連接之一基座部分及一噴灑器塔部分。該偏移導管使得該塔部分能夠朝向該容器之背部偏移,藉此使得內部空間能夠更佳地用於基板儲存及處置且提供一更緊湊設計。除了含納於其中之明確限定及專利請求項之外,Burns之揭示內容特此以引用的方式併入本文中。 U.S. Patent No. 9,054,144 assigned to Burns et al. ("Burns") discloses a substrate container with a cleaning tower. The cleaning tower includes a base portion and a sprinkler tower portion connected by an offset conduit. The offset duct enables the tower portion to be offset toward the back of the container, thereby enabling the internal space to be better used for substrate storage and disposal and providing a more compact design. Except for the explicit limitations and patent claims contained therein, the disclosure of Burns is hereby incorporated by reference.
利用一偏移導管之習知清潔塔經構形使得該偏移導管位於基板容器內部且自基板容器之地板向上突出使得偏移導管部分不與地板齊平。儘管導管可經設定大小使得最底下晶圓在導管上通過,但吾人已發現在最底下晶圓之插入或移除期間突出導管仍可干擾機器人端效應器之操作。干擾可引起端效應器與導管之間的碰撞,藉此產生顆粒且亦可導致晶圓不當處理。 The conventional cleaning tower using an offset conduit is configured such that the offset conduit is located inside the substrate container and protrudes upward from the floor of the substrate container so that the offset conduit part is not flush with the floor. Although the catheter can be sized so that the bottom wafer passes through the catheter, we have found that the protruding catheter can still interfere with the operation of the robot end effector during the insertion or removal of the bottom wafer. Interference can cause collisions between the end effector and the conduit, thereby generating particles and can also lead to improper handling of the wafer.
與習知偏移清潔塔有關的另一問題係習知偏移清潔塔必須安裝至基板容器之內部。對於其中偏移清潔塔之總長度大於基板容器之地板至天花板間隙之構形,當在組裝期間嘗試使清潔塔直立時可出現問題。噴灑器部分之上端可與基板容器之天花板碰撞,其可損壞噴灑器部分及基板容器之一者或兩者。在一些例項中,可需要折衷噴灑器部分之所要長度。 Another problem related to the conventional offset cleaning tower is that the conventional offset cleaning tower must be installed inside the substrate container. For configurations where the total length of the offset cleaning tower is greater than the floor-to-ceiling gap of the substrate container, problems can arise when trying to make the cleaning tower upright during assembly. The upper end of the sprayer part can collide with the ceiling of the substrate container, which can damage one or both of the sprayer part and the substrate container. In some cases, it may be necessary to compromise the desired length of the sprinkler section.
本發明之各種實施例係關於一種釋放用於晶圓儲存及操縱同時允許清潔氣體之氣流的晶圓容器內之額外空間之清潔噴灑器總成。相應地,本發明之各種實施例呈現歸因於端效應器與清潔塔總成之間的碰撞而污染基板容器之內表面之一較低機率。此外,在本發明之各種實施例中,清潔塔 總成之噴灑器部分之有效長度增加使得清潔氣體出口位於比使用習知清潔塔總成更靠近基板容器之地板。藉由定位清潔出口更靠近地板,基板容器之最底下晶圓下方之清潔氣體之氣流可增加以改良清潔效能。 Various embodiments of the present invention relate to a cleaning sprayer assembly that releases extra space in a wafer container for wafer storage and manipulation while allowing a flow of cleaning gas. Accordingly, various embodiments of the present invention present a lower probability of contaminating the inner surface of the substrate container due to the collision between the end effector and the cleaning tower assembly. In addition, in various embodiments of the present invention, the cleaning tower The effective length of the sprayer part of the assembly is increased so that the cleaning gas outlet is located closer to the floor of the substrate container than the conventional cleaning tower assembly. By positioning the cleaning outlet closer to the floor, the flow of cleaning gas under the bottom wafer of the substrate container can be increased to improve cleaning performance.
本發明之各種實施例提供一種位於基板容器外部而非位於容器內部之偏移導管,該導管在基板容器之地板下面安排路線。藉由將偏移導管定位於基板容器外部而提供之額外空間使得機器人端效應器能夠在不會與偏移導管碰撞之情況下在儲存於其中之一最底下晶圓下方操控。 Various embodiments of the present invention provide an offset conduit located outside of the substrate container rather than inside the container, the conduit being routed under the floor of the substrate container. The extra space provided by positioning the offset tube outside the substrate container allows the robotic end effector to be manipulated under one of the bottom wafers stored without colliding with the offset tube.
另外,一些實施例經構形使得清潔塔之噴灑器部分可在基板容器之地板平面處起作用。即,噴灑器部分之有效長度開始於與基板容器之地板對應之噴灑器部分上之一高度處。這使得清潔氣體能夠進入地板平面處之基板容器,使得最底下基板下方之清潔氣流相對於習知清潔塔而增加。在一實施例中,噴灑器部分之有效部分相對於習知噴灑器降低多至4.5mm。 In addition, some embodiments are configured so that the sprayer portion of the cleaning tower can function at the floor level of the substrate container. That is, the effective length of the sprayer portion starts at a height on the sprayer portion corresponding to the floor of the substrate container. This allows the cleaning gas to enter the substrate container at the floor level, so that the cleaning air flow under the bottom substrate is increased compared to the conventional cleaning tower. In one embodiment, the effective part of the sprinkler part is reduced by up to 4.5 mm compared to the conventional sprinkler.
本發明之一些實施例呈現組裝於外部且可自基板容器之外部安裝及卸除之一外部偏移清潔塔總成。本發明之一些實施例包含可拆離及可重新附接至該外部偏移清潔塔總成之一清潔介面本體之一噴灑器部分,使得該噴灑器部分在該清潔介面本體安裝至基板容器之後貼附至該清潔介面本體。透過此等實施例之兩者,消除清潔塔總成之過量長度之問題。 Some embodiments of the present invention present an external offset cleaning tower assembly that is assembled outside and can be installed and removed from the outside of the substrate container. Some embodiments of the present invention include a sprayer portion that is detachable and reattachable to a cleaning interface body of the external offset cleaning tower assembly, so that the sprayer portion is installed after the cleaning interface body is mounted to the substrate container Attached to the cleaning interface body. Through both of these embodiments, the problem of excessive length of the cleaning tower assembly is eliminated.
亦考量藉由在一內部導管透過其安排路線之容器之地板中提供一凹口而減小導管之輪廓之實施例。偏移導管及凹口可經設定大小使得偏移導管之最上端位於基板容器之地板之內部平面處或下方。在此一實施例中,偏移導管之減小輪廓(儘管位於內部)相對於端效應器間隙而提供相同於一外部偏移導管之效應且增強最底下基板之清潔。 An embodiment in which the contour of the duct is reduced by providing a recess in the floor of the container through which an internal duct is routed is also considered. The offset conduit and the notch can be sized so that the uppermost end of the offset conduit is located at or below the inner plane of the floor of the substrate container. In this embodiment, the reduced profile of the offset conduit (albeit on the inside) relative to the end effector gap provides the same effect as an external offset conduit and enhances the cleaning of the bottom substrate.
本發明之各種實施例係關於一種用於一基板容器之包含用於連接至一基板容器之一底板之一清潔介面本體的清潔塔總成。該清潔介面本體可包含一基座部分及一頂部部分。該基座部分可具有一自一底部邊緣向上延伸至一頂部邊緣之實質上管狀基座側壁。該底部邊緣可界定用於接達至該基座部分之一內部之一第一孔隙,該第一孔隙係圍繞一第一軸線同心。 Various embodiments of the present invention relate to a cleaning tower assembly for a substrate container including a cleaning interface body for connecting to a bottom plate of a substrate container. The cleaning interface body can include a base part and a top part. The base portion may have a substantially tubular base side wall extending upward from a bottom edge to a top edge. The bottom edge may define a first aperture for access to an interior of the base portion, the first aperture being concentric about a first axis.
在一或多個實施例中,該頂部部分連接至該基座部分之該頂部邊緣。該頂部部分可具有定位於該基座部分之該頂部邊緣上以向上遮蓋該底部孔隙之一頂部側壁。該頂部部分可包含用於透過該基板容器之該底板中之一入口安裝之一入口管嘴。該入口管嘴可具有自該頂部側壁向上延伸至一管嘴邊緣之一實質上管狀管嘴側壁。該管嘴邊緣可界定用於接達至該入口管嘴之一內部之一第二孔隙,該第二孔隙係圍繞一第二軸線同心。在特定實施例中,該第二軸線實質上平行於該第一軸線且定位於該第一軸線後側。在一或多個實施例中,該清潔介面本體包含安置於該基座部分與該入口管嘴之間的一偏移導管部分。該基座部分及該入口管嘴可經由該偏移導管部分呈流體連通。 In one or more embodiments, the top portion is connected to the top edge of the base portion. The top part may have a top side wall positioned on the top edge of the base part to cover up the bottom aperture. The top portion may include an inlet nozzle for installing through an inlet in the bottom plate of the substrate container. The inlet nozzle may have a substantially tubular nozzle side wall extending upward from the top side wall to an edge of the nozzle. The edge of the nozzle may define a second aperture for access to the inside of one of the inlet nozzles, the second aperture being concentric about a second axis. In a specific embodiment, the second axis is substantially parallel to the first axis and is positioned behind the first axis. In one or more embodiments, the cleaning interface body includes an offset duct part disposed between the base part and the inlet nozzle. The base part and the inlet nozzle can be in fluid communication via the offset conduit part.
該清潔塔總成包含一噴灑器部分。在一或多個實施例中,該噴灑器部分係一包含一多孔噴灑器側壁且界定一沿一噴灑器軸線延伸至該噴灑器部分之噴灑器通道之噴灑器部分。該噴灑器側壁可界定可操作性耦合至該入口管嘴用於該基座部分、該入口管嘴與該噴灑器部分之間的流體連通之該噴灑器部分之一底部部分處之一開口。另外或替代地,該噴灑器部分可包括一具有複數個形成於其中之通過孔隙的外殼。 The cleaning tower assembly includes a sprayer part. In one or more embodiments, the sprinkler portion is a sprinkler portion that includes a porous sprinkler side wall and defines a sprinkler channel extending along a sprinkler axis to the sprinkler portion. The sprinkler side wall may define an opening at a bottom portion of the sprinkler portion that is operatively coupled to the inlet nozzle for fluid communication between the base portion, the inlet nozzle, and the sprinkler portion. Additionally or alternatively, the sprinkler part may include a housing having a plurality of passage holes formed therein.
上述[發明內容]不意欲描述本發明的各所繪示實施例或每個實施方案。 The above [Summary of the Invention] is not intended to describe each illustrated embodiment or every implementation of the present invention.
7-7:線 7-7: Line
30:基板容器 30: Substrate container
32a:基板 32a: substrate
32b:基板 32b: substrate
34:相對側部分/側壁部分 34: Opposite side part/side wall part
36:頂部部分 36: top part
38:底板 38: bottom plate
40:地板 40: Floor
42:背部 42: back
44:前部 44: front
46:門框 46: door frame
48:門開口 48: Door opening
52:門 52: door
54:垂直方向 54: vertical
64:微型環境 64: micro environment
66:開槽側壁 66: Slotted side wall
68:狹槽位置 68: slot position
68a:最底下狹槽 68a: bottom slot
70:清潔塔總成 70: Clean tower assembly
71:輸送板 71: conveyor plate
90:清潔介面本體 90: Clean the interface body
94:基座部分 94: base part
98:頂部部分 98: top part
100:側壁 100: sidewall
102:底部邊緣 102: bottom edge
106:頂部邊緣 106: top edge
110:內部部分 110: internal part
114:底部孔隙 114: bottom pore
118:索環 118: Grommet
119:孔隙 119: Pore
120:支撐部分 120: support part
122:過濾器 122: filter
126:閥 126: Valve
130:第一軸線 130: first axis
134:頂部側壁 134: top side wall
138:偏移部分 138: offset part
142:入口管嘴 142: Inlet nozzle
146:管嘴側壁 146: Nozzle side wall
150:管嘴邊緣 150: Nozzle edge
154:內部部分 154: internal part
158:管嘴孔隙 158: Nozzle hole
162:第二軸線 162: Second axis
166:偏移導管部分 166: Offset duct part
170:具倒鉤部分 170: Barbed part
174:錐形部分 174: tapered part
178:側孔隙 178: Side Pore
182:噴灑器部分 182: Sprinkler part
186:側壁 186: Sidewall
190:頂面 190: top surface
194:底部邊緣 194: bottom edge
198:孔隙 198: Pore
202:底部部分 202: bottom part
206:加寬部分 206: widened part
210:方向 210: direction
214:後部入口 214: Rear Entrance
218:後部安裝區域 218: Rear installation area
222:垂直高度 222: vertical height
250:安裝入口 250: Installation entrance
251:安裝入口 251: Installation entrance
254:安裝機構 254: installation mechanism
258:向下延伸側壁 258: Extend the side wall downward
263:垂直部分 263: vertical part
264:止動部分 264: Stop part
265:凸輪 265: Cam
266:後部開口 266: rear opening
267:側開口 267: side opening
268:支撐架 268: support frame
269:底切部分 269: Undercut
290:間隙 290: Gap
300:後部凹口 300: Rear notch
304:孔隙 304: Pore
308:清潔氣流 308: clean airflow
包含於本申請案中之圖式併入本說明書中且形成本說明書之部分。圖式繪示本發明之實施例且與[實施方式]一起用以闡釋本發明之原理。圖式僅繪示特定實施例且不限制本發明。 The drawings included in this application are incorporated into this specification and form part of this specification. The drawings illustrate embodiments of the present invention and together with [Embodiments] are used to explain the principle of the present invention. The drawings only illustrate specific embodiments and do not limit the present invention.
圖1係根據本發明之一實施例之一基板容器之一透視圖。 Fig. 1 is a perspective view of a substrate container according to an embodiment of the present invention.
圖2係根據本發明之一實施例之一清潔塔總成之一正視圖。 Fig. 2 is a front view of a cleaning tower assembly according to an embodiment of the present invention.
圖3係根據本發明之一實施例之圖2之清潔塔總成之一截面圖。 Figure 3 is a cross-sectional view of the cleaning tower assembly of Figure 2 according to an embodiment of the present invention.
圖4係根據本發明之一實施例之圖2之清潔塔總成之一分解圖。 Figure 4 is an exploded view of the cleaning tower assembly of Figure 2 according to an embodiment of the present invention.
圖5係根據本發明之一實施例之一清潔塔總成之一放大部分透視圖。 Fig. 5 is an enlarged partial perspective view of a cleaning tower assembly according to an embodiment of the present invention.
圖6係根據本發明之一實施例之安裝在一基板容器中之清潔塔總成之一正視圖。 Fig. 6 is a front view of a cleaning tower assembly installed in a substrate container according to an embodiment of the present invention.
圖7係依圖6之線7-7取得之清潔塔總成及基板容器之一截面圖。 Figure 7 is a cross-sectional view of the cleaning tower assembly and substrate container taken along line 7-7 of Figure 6.
圖8係根據本發明之一實施例之一基板容器之一截面圖及一清潔塔總成之一分解圖。 8 is a cross-sectional view of a substrate container and an exploded view of a cleaning tower assembly according to an embodiment of the present invention.
圖9係根據本發明之一實施例之包含一清潔塔總成之開口的一基板容器之一部分底部透視圖。 9 is a partial bottom perspective view of a substrate container including an opening of a cleaning tower assembly according to an embodiment of the present invention.
圖10係根據本發明之一實施例之包含一輸送板之一基板容器之一部分底部透視圖。 Fig. 10 is a bottom perspective view of a part of a substrate container including a conveying plate according to an embodiment of the present invention.
圖11係根據本發明之一實施例之包含安裝至一底板之一輸送板的一基板容器之一部分底部透視圖。 Figure 11 is a partial bottom perspective view of a substrate container including a transport plate mounted to a bottom plate according to an embodiment of the present invention.
圖12係根據本發明之一實施例之包含安裝至一底板之一輸送板的一基板容器之一部分截面圖。 12 is a partial cross-sectional view of a substrate container including a transport plate mounted to a bottom plate according to an embodiment of the present invention.
圖13係根據本發明之一實施例之包含一安裝於外部之清潔塔總成之 一基板容器之一部分底部透視圖。 Figure 13 is a cleaning tower assembly according to an embodiment of the present invention including an externally installed cleaning tower assembly A bottom perspective view of a portion of a substrate container.
圖14係根據本發明之一實施例之包含一安裝於外部之清潔塔總成之一基板容器之一內部之一部分透視圖。 Fig. 14 is a partial perspective view of the inside of a substrate container including a cleaning tower assembly mounted on the outside according to an embodiment of the present invention.
圖15係根據本發明之一實施例之包含一安裝於外部之清潔塔總成之一基板容器之一內部之一部分透視圖。 15 is a partial perspective view of the inside of a substrate container including a cleaning tower assembly installed on the outside according to an embodiment of the present invention.
圖16係根據本發明之一實施例之包含具有一安裝於內部之清潔塔總成之一凹口的一基板容器之一截面圖。 FIG. 16 is a cross-sectional view of a substrate container including a recess having a cleaning tower assembly installed inside according to an embodiment of the present invention.
圖17係依圖6之線7-7取得之清潔塔總成及基板容器之一特寫截面圖。 Figure 17 is a close-up cross-sectional view of the cleaning tower assembly and substrate container taken along line 7-7 of Figure 6.
雖然本發明之實施例適合各種修改及替代形式,但其具體細節已以實例的方式在圖式中展示且將被詳細描述。然而,應瞭解,本發明不使揭示內容受限於所描述之特定實施例。相反地,本發明涵蓋落入本發明之精神及範疇內的所有修改、等效物及替代方案。 Although the embodiments of the present invention are suitable for various modifications and alternative forms, the specific details thereof have been shown in the drawings by way of examples and will be described in detail. However, it should be understood that the present invention does not limit the disclosure to the specific embodiments described. On the contrary, the present invention covers all modifications, equivalents, and alternatives that fall within the spirit and scope of the present invention.
本申請案主張2015年9月4日申請之較早申請日期之美國專利申請案第62/214,464號及2015年12月4日申請之美國專利申請案第62/263,194號之權利,該等專利申請案之全部內容以引用的方式併入本文中。 This application claims the rights of the earlier U.S. Patent Application No. 62/214,464 filed on September 4, 2015 and the U.S. Patent Application No. 62/263,194 filed on December 4, 2015. These patents The entire content of the application is incorporated herein by reference.
參考圖1,描繪根據本發明之一實施例之用於儲存複數個基板之一基板容器30。如本文所使用,該複數個基板包含在半導體、印刷電路板、平板顯示器及/或其類似者之製造中使用之基板。為了繪示,呈現一單一基板32a。在特定實施例中,基板容器30包含兩個相對側部分34、一頂部部分36、一底板38及一背部42。底板38界定基板容器30之一內表面或地板
40。基板容器30之一前部44包含界定用於基板32之插入及移除的一門開口48之一門框46。一門52經調適以密封及遮蓋門開口48。基板容器30之門開口48位於一實質上平行於一垂直方向54之平面中。在各種實施例中,基板容器30之特性在於含有一微型環境64。
1, a
在一或多個實施例中,一對開槽側壁66安置於基板容器30內,各鄰近側壁部分34之一各自側壁部分。開槽側壁66經對準使得狹槽面向彼此以界定複數個狹槽位置68且隔開使得(若干)基板32被支撐於其等之間。為了本發明之目的,該複數個狹槽位置68之一最底下狹槽位置68a(即,最靠近底板38之狹槽)識別為「第一」狹槽,其中狹槽數目在向上方向上增加。為了繪示,諸如在下文所描述之圖6至圖8及圖15至圖16中,呈現一基板32b且其被描繪為佔據最底下狹槽68a。
In one or more embodiments, a pair of slotted
在各種實施例中,基板容器30進一步包含安置於基板容器30內的至少一清潔塔總成70。在各種實施例中,清潔塔總成70可操作性耦合至位於基板容器30外部之一氣體源(未描繪)用於將一氣態工作流體引入至基板容器30中。在特定實施例中,清潔塔總成70之一或多者經定向以朝向門開口48引導該氣態工作流體以清潔基板容器30。
In various embodiments, the
在特定實施例中,基板容器30進一步包含定位於底板38下之一輸送板71。在各種實施例中,輸送板71安裝至基板容器30之底部以在各種基板處理步驟期間用於基板容器30之以機器為基礎之定位及對準。
In a specific embodiment, the
參考圖2至圖5,描繪根據本發明之一實施例之一清潔塔總成70。在所描繪之實施例中,清潔塔總成70包含一清潔介面本體90,其包含一基座部分94及一頂部部分98。在一或多個實施例中,清潔介面本體90經適當設定大小及塑形用於外部安裝於一基板容器30上。例如,清潔介面本體
可安裝至一基板容器30之一輸送板71。在一些實施例中,清潔介面本體可安裝至底板38。在一些實施例中,清潔介面本體90可安裝於底板38與一輸送板71之間。
2 to 5, depicts a cleaning
在(例如)圖3中之各種實施例中,基座部分94具有由自一底部邊緣102延伸至一頂部邊緣106之一側壁100界定之管狀形狀。側壁100之管狀形狀界定一內部部分110及於底部邊緣102處界定用於接達至內部部分110之一底部孔隙114。在各種實施例中,基座部分94包含用於耦合至一外部流體源之組件。例如,在一些實施例中,基座部分包含安裝在底部孔隙114及內部部分110中之一索環118、過濾器122及一閥126(圖4)。在特定實施例中,底部孔隙114與一軸線130同心。
In, for example, the various embodiments in FIG. 3, the
在(例如)圖5中之一或多個實施例中,側壁100界定基座部分94中的複數個孔隙119。在特定實施例中,孔隙119之各者圍繞側壁100及軸線130圓周地間隔。在各種實施例中,孔隙119係自索環118之側突出之凸出部用於將索環118裝配及放置於基座部分94之內部110內的插孔。例如,在一些實施例中,索環118係一撓性組件且凸出部可在插入至基座部分之內部110期間彈性地壓縮且接著向外擴展至孔隙119以將索環鎖定在適當位置。
In one or more embodiments of, for example, FIG. 5, the
在一些實施例中,基座部分94包含支撐部分120。支撐部分120可係與側壁100整合之向外延伸材料部分。在特定實施例中,支撐部分120作為用於清潔介面本體90之操縱之握柄或手柄。在一些實施例中,支撐部分120係卡扣配合至輸送板中之底切特徵用於將本體90安裝至一基板容器之撓性樑,本文中進一步描述。
In some embodiments, the
在一或多個實施例中,頂部部分98包含實質上係平面且沿頂部邊緣
106連接至基座部分94之一頂部側壁134。在一些實施例中,頂部側壁134連接至基座部分94之頂部。基座部分94及頂部部分98可由技術者可用之技術(例如,超音波焊接或熱焊接、卡扣配合、黏著劑結合)或由其他適合技術連接。
In one or more embodiments, the
另外,(例如)在圖3中,頂部側壁134可包含自基座部分94延伸至一側之一偏移部分138。偏移部分138可包含自基座部分94偏移之一入口管嘴142。在一或多個實施例中,入口管嘴142具有由自頂部側壁134向上延伸至一管嘴邊緣150之一管嘴側壁146界定之一管狀形狀。在一或多個實施例中,管嘴側壁146界定一內部部分154及位於管嘴邊緣150處之一管嘴孔隙158。在各種實施例中,管嘴孔隙158提供接達至入口管嘴142之內部部分154。在特定實施例中,管嘴孔隙158係圍繞一第二軸線162同心。在各種實施例中,第二軸線162實質上平行於第一軸線130。
In addition, for example in FIG. 3, the
在一或多個實施例中,一偏移導管部分166安置於基座部分94與入口管嘴142之間(圖2及圖5)。在一或多個實施例中,偏移導管部分166與頂部側壁134之偏移部分138協作以在基座部分94與入口管嘴142之間提供一通路用於清潔介面本體90之組件之間的流體連通。
In one or more embodiments, an offset
在操作中,流體透過止回閥126及底部孔隙114、通過內部部分110、154且透過管嘴孔隙158進入清潔塔總成70。在功能上,偏移導管166將氣流自第一軸線130轉向至第二軸線162。
In operation, fluid enters the cleaning
在一些實施例中,如圖5中所展示,入口管嘴142係包含管嘴側壁146之一具倒鉤部分170及一錐形部分174之一具倒鉤之管嘴。在特定實施例中,具倒鉤部分170界定入口管嘴142之一外徑及錐形部分174界定毗鄰具倒鉤部分170之一減小外徑。在特定實施例中,管嘴側壁146界定具倒鉤
部分170與錐形部分174之間的一側孔隙178。進一步描述:側孔隙178係管嘴側壁146中用於將氣體低噴灑至基板容器30之一孔或孔隙。
In some embodiments, as shown in FIG. 5, the
在一或多個實施例中,清潔塔總成70包含一耦合至清潔介面本體90之入口管嘴142之噴灑器部分182。在一些實施例中,噴灑器部分182包含一多孔或穿孔(孔隙)側壁186。在一些實施例中,側壁186界定一實質上管狀形狀,其中一噴灑器通道自噴灑器部分182之一頂面190延伸至一底部邊緣194。在一或多個實施例中,噴灑器部分182之底部邊緣194界定位於噴灑器部分182之一底部部分202處之一孔隙198。在各種實施例中,孔隙198可經設定大小用於入口管嘴142之插入以操作地耦合於兩者之間用於基座部分94、入口管嘴142與噴灑器部分182之間的流體連通。
In one or more embodiments, the cleaning
在特定實施例中,管嘴側壁146包含形成於管嘴側壁146之一外表面上之外部螺紋(未描繪)。噴灑器部分182可包含形成於噴灑器部分之一內表面上之內部螺紋(未描繪)。當實施時,噴灑器部分182之螺紋與管嘴側壁146之螺紋相容以耦合於其等之間。
In a particular embodiment, the
在各種實施例中,噴灑器部分182包含位於噴灑器部分182之底部部分處之一加寬部分206。在特定實施例中,加寬部分206向外加寬,具有相對於噴灑器部分之主體之一增加內徑以插入入口管嘴146及與入口管嘴142耦合。
In various embodiments, the
參考圖6至圖8,根據本發明之一實施例描繪組裝於基板容器30中之清潔塔總成70。在所描繪之實施例中,基板容器30與清潔塔總成70相同或實質上類似,如本文所描述。相應地,相同元件係以相同編號參考數字予以識別。
Referring to FIGS. 6 to 8, a cleaning
在(例如)圖8中之組裝中,可藉由以下步驟將清潔介面本體90組裝至
基板容器30:在方向210上向上插入清潔介面本體90、透過底板38中之一後部入口214放置入口管嘴142及將清潔介面本體90附接至一後部安裝區域218中之底板38之一外表面。在各種實施例中,後部安裝區域218介於輸送板71與底板38之間。清潔介面本體90可經設計以組裝至基板容器30達相對於一負載端口之一清潔固定裝置之各種垂直高度222。在各種實施例中,垂直高度222實質上匹配(若干)既有基板容器之垂直高度。在一或多個實施例中,入口管嘴142經設定大小使得當安裝至基板容器30之輸送板71時,入口管嘴142之管嘴邊緣150向上延伸至大約基板容器30之第一狹槽68a。
In (for example) the assembly in Figure 8, the cleaning
一旦清潔介面本體90透過入口214插入,噴灑器部分182可藉由經由門開口48使入口管嘴142接達基板容器30後部處而對其組裝。接著,噴灑器部分182貼附至入口管嘴142。
Once the cleaning
參考圖9至圖14,根據本發明之一實施例描繪基板容器30內之清潔塔總成70之組裝之各種階段。基板容器30與清潔塔總成70可係相同或實質上類似,如本文所描述。相應地,相同元件係以相同編號之參考數字予以識別。參考圖9,其中描繪一基板容器30及底板38之一底部透視圖。在一或多個實施例中,底板38包含用於一清潔塔總成70之一入口管嘴142之插入的一後部入口214(圖8)。另外,在一些實施例中,底板38包含一安裝入口250。在各種實施例中,安裝入口250係底板38中之用於接納用於將輸送板71安裝至基板容器30之底板38之安裝構件之一孔隙。
Referring to FIGS. 9 to 14, various stages of assembling the cleaning
例如,在圖10中,一輸送板71抵靠基板容器30之底板38放置。輸送板71可包含與安裝入口250對準之安裝入口251。如圖11中所描繪,一安裝機構254被接納於安裝入口250中且將輸送板71固定至底板38。在一或
多個實施例中,安裝機構254係定位於底板38中以將輸送板71固定至基板容器30之底部的材料之一部分。圖11及圖12中描繪:安裝機構254係一具有一向下延伸側壁258且包含複數個圓周地配置在側壁258中之大體上L形狹槽262之部分環。在一或多個實施例中,L形狹槽262經傾斜具有一垂直部分263及一水平或止動部分264。
For example, in FIG. 10, a conveying
在各種實施例中,輸送板71在安裝入口251中可包含複數個向外延伸部件或凸輪265。凸輪265之各者可與L形狹槽262對應使得輸送板71可藉由以下步驟固定至底板38:將安裝機構254向下插入至安裝入口250及251、將凸輪265接納至垂直部分263中及扭轉安裝機構254以向上引導凸輪265及引導至止動部分264中,從而將輸送板71固定至底板38。
In various embodiments, the conveying
在各種實施例中,側壁254包含一對應於偏移導管部分166之後部開口266。如此一來,當固定於底板38時,偏移導管部分166自安裝機構254向後延伸以到達入口管嘴142。
In various embodiments, the
在特定實施例中,各種類型之安裝機構254可用以將輸送板71固定至底板38。例如,安裝機構可使用超音波焊接或熱焊接、卡扣配合、黏著劑結合或其他適合技術。在一些實施例中,安裝機構254與底板38整合,使得底板38及安裝機構係一連續零件。
In certain embodiments, various types of mounting
在圖12至圖13中描繪之一或多個實施例中,輸送板71包含用於清潔介面本體90之鎖定特徵,包含安裝入口251中的一或多個曝露接達至一支撐架268之側開口267。在各種實施例中,支撐架268由輸送板71中之底切部分269界定。在各種實施例中,藉由將清潔介面本體90向上插入至安裝入口251及將入口管嘴142(圖2至圖4)插入至後部入口214而將清潔介面本體90固定至基板容器30。當向上插入清潔介面本體90時,支撐部分120可
與傾斜或具倒鉤底切部分269接合及撓曲直至清潔介面本體90已完全插入安裝入口251中。一旦插入,支撐部分120可「卡扣」至支撐架268上以將清潔介面本體鎖定在適當位置。
In one or more of the embodiments depicted in FIGS. 12-13, the conveying
在圖14中,描繪基板容器30之內部。在內部中,後部入口214及安裝機構254描繪於基板容器30之地板40中。清潔介面本體90安裝至基板容器30且入口管嘴142經描繪插入穿過後部入口214且延伸至容器30之內部中。在圖15中,描繪一噴灑器塔182,其裝配至入口管嘴142中。
In FIG. 14, the inside of the
參考圖16及圖17,描繪根據本發明之實施例之一基板容器30及清潔塔總成70之一部分之截面圖。在圖15中,清潔介面本體90外部安裝於底板38上,如上文所描述。安裝機構254定位於地板40中且將清潔介面本體90固定至容器30。入口管嘴142透過後部入口214進入容器30之內部。用於透過清潔介面本體90進入基板容器30之清潔氣體之噴灑的一噴灑器部分182裝配至入口管嘴142上使得入口管嘴142之一部分延伸至噴灑器部分182之內部中。定位於最底下狹槽68a中之基板32b在容器30中朝向清潔塔總成70向後延伸。因為清潔介面本體90安裝在外部,所以一間隙290維持在最底下基板32b與容器之地板40及安裝機構254之間。
16 and FIG. 17, depict a cross-sectional view of a part of a
諸如圖16中所描繪,在一些實施例中,基板容器30界定地板40中之一後部凹口300。在此等實施例中,清潔介面本體90內部安裝於容器30內。例如,清潔介面本體90可定位於凹口300中,其中基座部分94延伸穿過用於連接至一外部流體源之一孔隙304。凹口300可經設定大小使得清潔介面本體90之最上端位於基板容器30之地板40之平面處或下方。
Such as depicted in FIG. 16, in some embodiments, the
在功能上,圖16實施例之凹口300減小偏移導管166之輪廓。由於該減小之輪廓,因此偏移導管166(儘管位於容器30內部)提供相同於圖15之
外部偏移導管配置之間隙290及相對於端效應器操縱及氣體清潔之相同操作優點。
Functionally, the
亦在圖15及圖16中描繪,在一或多個實施例中,入口管嘴142包含一側孔隙178,如上文所描述。在各種實施例中,入口管嘴142及側孔隙178經構形使得清潔塔總成70之噴灑器部分182可在基板容器之地板40處或附近起作用。例如,在一些實施例中,側孔隙178依一高度定位於與基板容器30之地板40對應之入口管嘴142上。
Also depicted in Figures 15 and 16, in one or more embodiments, the
在操作中,對於圖15之實施例及圖16之實施例兩者,間隙290提供機器人端效應器(未描繪)之基板32b下方的具有來自清潔介面本體90之組件之少量或無干擾之操控空間。另外,使地板平面處之噴灑器部分182之基座與由外部或減小輪廓偏移導管166提供之間隙290組合使得清潔氣體能夠進入地板平面處之基板容器30使得清潔氣流308被引導至最底下基板32b下方。
In operation, for both the embodiment of FIG. 15 and the embodiment of FIG. 16, the
本文所揭示之額外特徵及方法之各者可單獨使用或與其他特徵及方法搭配使用以提供改良裝置及用於製造及使用改良裝置之方法。因此,本文所揭示之特徵及方法之組合可未必就其最廣義而言來實踐本發明且代以僅揭示以尤其描述代表實施例及較佳實施例。 Each of the additional features and methods disclosed herein can be used alone or in combination with other features and methods to provide improved devices and methods for manufacturing and using the improved devices. Therefore, the combination of the features and methods disclosed herein may not necessarily implement the present invention in its broadest sense, and instead, only the representative embodiments and preferred embodiments are disclosed with particular descriptions.
熟習技術者在閱讀本發明之後可明白對實施例的各種修改。例如,熟習一般相關技術者將認識到針對不同實施例所描述之各種特徵可與其他特徵(單獨或在不同組合中)適合地組合、分離及重新組合。同樣地,上文所描述之各種特徵應全部被視為實例性實施例而不是對本發明之範疇或精神之限制。 Those skilled in the art can understand various modifications to the embodiments after reading the present invention. For example, those familiar with the related art in general will recognize that various features described for different embodiments can be combined, separated, and recombined as appropriate with other features (alone or in different combinations). Likewise, the various features described above should all be regarded as exemplary embodiments rather than limiting the scope or spirit of the present invention.
熟習一般相關技術者將認識到各種實施例可包括比上文所描述之任 何個別實施例中所繪示之特徵少的特徵。本文所描述之實施例不意謂為其中可組合各種特徵之方式之一窮舉性表示。相應地,實施例並非特徵之互斥組合;確切而言,申請專利範圍可包括選自不同個別實施例之不同個別特徵之一組合,如由熟習一般相關技術者所理解。 Those familiar with the related art in general will recognize that various embodiments may include any other than those described above. Few features are shown in the individual embodiments. The embodiments described herein are not meant to be an exhaustive representation of the ways in which various features can be combined. Correspondingly, the embodiments are not mutually exclusive combinations of features; to be precise, the scope of the patent application may include a combination of different individual features selected from different individual embodiments, as understood by those familiar with the related art.
限制以引用上述文件的形式之任何併入使得無與本文之明確揭示內容相反之標的併入。進一步限制以引用上述文件的形式之任何併入使得無包含於文件中之請求項以引用的方式併入本文中。又進一步限制以引用上述文件的形式之任何併入使得提供於文件中的任何定義未以引用的方式併入本文中,除非明確包含於本文中。 Any incorporation in the form of citing the above-mentioned documents is restricted so that there is no incorporation of subject matter contrary to the content clearly disclosed in this article. Any incorporation in the form of citing the above-mentioned documents is further restricted so that claims not included in the documents are incorporated herein by reference. It is further restricted to any incorporation in the form of citing the aforementioned documents so that any definitions provided in the documents are not incorporated herein by reference, unless expressly included herein.
參考含於本文中的「(若干)實施例」、「揭示內容」、「本發明」、「本發明之(若干)實施例」、「所揭示之(若干)實施例」及其類似者指稱未許可先前技術之本專利申請案之說明書(文字,包含申請專利範圍及圖式)。 Refer to "(several) embodiments", "disclosure", "present invention", "(several) embodiments of the present invention", "disclosed (several) embodiments" and the like contained in this text The description (text, including the scope of the patent application and drawings) of this patent application without prior art.
為解釋申請專利範圍,本文之明確意圖為:未引用35 U.S.C.112(f)之條款,除非在各自請求項中列舉特定術語「...之方法」或「...之步驟」。 In order to explain the scope of the patent application, the express intention of this article is to not quote the clauses of 35 U.S.C.112(f) unless specific terms "method of..." or "steps of..." are listed in the respective claims.
94:基座部分 94: base part
98:頂部部分 98: top part
100:側壁 100: sidewall
102:底部邊緣 102: bottom edge
106:頂部邊緣 106: top edge
114:底部孔隙 114: bottom pore
118:索環 118: Grommet
122:過濾器 122: filter
126:閥 126: Valve
134:頂部側壁 134: top side wall
138:偏移部分 138: offset part
142:入口管嘴 142: Inlet nozzle
146:管嘴側壁 146: Nozzle side wall
150:管嘴邊緣 150: Nozzle edge
166:偏移導管部分 166: Offset duct part
170:具倒鉤部分 170: Barbed part
174:錐形部分 174: tapered part
178:側孔隙 178: Side Pore
182:噴灑器部分 182: Sprinkler part
194:底部邊緣 194: bottom edge
198:孔隙 198: Pore
202:底部部分 202: bottom part
Claims (12)
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| Application Number | Priority Date | Filing Date | Title |
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| TW105128692A TWI709441B (en) | 2016-09-05 | 2016-09-05 | Substrate container and purge tower assembly for the substrate container |
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| Application Number | Priority Date | Filing Date | Title |
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| TW105128692A TWI709441B (en) | 2016-09-05 | 2016-09-05 | Substrate container and purge tower assembly for the substrate container |
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| Publication Number | Publication Date |
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| TW201811452A TW201811452A (en) | 2018-04-01 |
| TWI709441B true TWI709441B (en) | 2020-11-11 |
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105900217A (en) * | 2013-10-14 | 2016-08-24 | 安格斯公司 | Towers for Substrate Carriers |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105900217A (en) * | 2013-10-14 | 2016-08-24 | 安格斯公司 | Towers for Substrate Carriers |
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