TWI703371B - Display panel - Google Patents
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- TWI703371B TWI703371B TW108115709A TW108115709A TWI703371B TW I703371 B TWI703371 B TW I703371B TW 108115709 A TW108115709 A TW 108115709A TW 108115709 A TW108115709 A TW 108115709A TW I703371 B TWI703371 B TW I703371B
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- 239000000758 substrate Substances 0.000 claims abstract description 111
- 125000006850 spacer group Chemical group 0.000 claims abstract description 38
- 239000000463 material Substances 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/123—Connection of the pixel electrodes to the thin film transistors [TFT]
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Liquid Crystal (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
本發明是有關於一種顯示面板,且特別是有關於一種包括間隙物的顯示面板。The present invention relates to a display panel, and particularly relates to a display panel including spacers.
隨著顯示科技的發展,顯示面板已大量被運用在各式電子裝置中,例如:手機、平板電腦、筆記型電腦、電視等。為使電子裝置具有薄型化的外觀,顯示面板的厚度也須減薄。一般而言,將主動元件基板與對向基板組立後,會進行薄化工序,以減薄主動元件基板的基底與對向基板的基底。然而,基底被薄化後,基底的剛性降低,顯示面板易受重力的影響而彎曲,造成主動元件基板與對向基板的偏移。當主動元件基板與對向基板偏移時,對向基板的間隙物偏離原位置而刮傷主動元件基板之顯示區上的配向膜,因而產生亮點缺陷。With the development of display technology, display panels have been widely used in various electronic devices, such as mobile phones, tablet computers, notebook computers, TVs, etc. In order for the electronic device to have a thinner appearance, the thickness of the display panel must also be reduced. Generally speaking, after the active device substrate and the counter substrate are assembled, a thinning process is performed to thin the base of the active device substrate and the counter substrate. However, after the substrate is thinned, the rigidity of the substrate is reduced, and the display panel is easily bent under the influence of gravity, which causes the displacement of the active device substrate and the counter substrate. When the active device substrate is shifted from the counter substrate, the spacers of the counter substrate deviate from the original position and scratch the alignment film on the display area of the active device substrate, resulting in bright spot defects.
本發明提供一種顯示面板,性能佳。The invention provides a display panel with good performance.
本發明一實施例的顯示面板,包括第一基底、主動元件、第一絕緣層、畫素電極、共用電極、第二絕緣層、第二基底、間隙物以及顯示介質。主動元件設置於第一基底上。第一絕緣層設置於主動元件上。畫素電極、共用電極及第二絕緣層設置於第一絕緣層上。畫素電極電性連接至主動元件。第二絕緣層設置於畫素電極與共用電極之間。第二絕緣層具有第一表面和側面。第一表面與側面相連接以定義第二絕緣層的凹陷。第二基底設置於第一基底的對向。間隙物設置於第二基底上。間隙物於第一基底上的垂直投影與第二絕緣層之凹陷於第一基底上之垂直投影重疊。顯示介質設置於第一基底與第二基底之間。The display panel of an embodiment of the present invention includes a first substrate, an active device, a first insulating layer, a pixel electrode, a common electrode, a second insulating layer, a second substrate, a spacer, and a display medium. The active element is arranged on the first substrate. The first insulating layer is disposed on the active element. The pixel electrode, the common electrode and the second insulating layer are arranged on the first insulating layer. The pixel electrode is electrically connected to the active device. The second insulating layer is disposed between the pixel electrode and the common electrode. The second insulating layer has a first surface and a side surface. The first surface and the side surface are connected to define a depression of the second insulating layer. The second substrate is disposed opposite to the first substrate. The spacer is arranged on the second substrate. The vertical projection of the spacer on the first substrate overlaps the vertical projection of the second insulating layer recessed on the first substrate. The display medium is disposed between the first substrate and the second substrate.
本發明一實施例的顯示面板,包括第一基底、主動元件、畫素電極、絕緣層、凸起物、第二基底、間隙物以及顯示介質。主動元件設置於第一基底上。畫素電極設置於第一基底上,且電性連接至主動元件。絕緣層設置於第一基底上。絕緣層具有第一表面和側面,且第一表面與側面相連接以定義絕緣層的凹陷。凸起物設置於絕緣層的凹陷中。第二基底設置於第一基底的對向。間隙物設置於第二基底上,其中間隙物與凸起物互相抵頂。顯示介質設置於第一基底與第二基底之間。The display panel of an embodiment of the present invention includes a first substrate, an active element, a pixel electrode, an insulating layer, a protrusion, a second substrate, a spacer, and a display medium. The active element is arranged on the first substrate. The pixel electrode is arranged on the first substrate and electrically connected to the active device. The insulating layer is disposed on the first substrate. The insulating layer has a first surface and a side surface, and the first surface and the side surface are connected to define a recess of the insulating layer. The protrusions are arranged in the recesses of the insulating layer. The second substrate is disposed opposite to the first substrate. The spacer is arranged on the second substrate, and the spacer and the protrusion abut against each other. The display medium is disposed between the first substrate and the second substrate.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.
現將詳細地參考本發明的示範性實施例,示範性實施例的實例說明於附圖中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to the exemplary embodiments of the present invention, and examples of the exemplary embodiments are illustrated in the accompanying drawings. Whenever possible, the same component symbols are used in the drawings and descriptions to indicate the same or similar parts.
應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件“上”或“連接到”另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為“直接在另一元件上”或“直接連接到”另一元件時,不存在中間元件。如本文所使用的,“連接”可以指物理及/或電性連接。再者,“電性連接”或“耦合”係可為二元件間存在其它元件。It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected" to another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements. As used herein, "connected" can refer to physical and/or electrical connection. Furthermore, "electrically connected" or "coupled" may mean that there are other elements between two elements.
本文使用的“約”、“近似”、或“實質上”包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,“約”可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。再者,本文使用的“約”、“近似”或“實質上”可依光學性質、蝕刻性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。As used herein, "about", "approximately", or "substantially" includes the stated value and the average value within the acceptable deviation range of the specific value determined by a person of ordinary skill in the art, taking into account the measurement in question and the The specific amount of measurement-related error (ie, the limitation of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. Furthermore, the "about", "approximately" or "substantially" used herein can select a more acceptable range of deviation or standard deviation based on optical properties, etching properties, or other properties, instead of using one standard deviation for all properties .
除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which the present invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having meanings consistent with their meanings in the context of related technologies and the present invention, and will not be interpreted as idealized or excessive The formal meaning, unless explicitly defined as such in this article.
圖1為本發明第一實施例之顯示面板的剖面示意圖。請參照圖1,顯示面板10包括主動元件基板100、相對於主動元件基板100的對向基板200以及設置於主動元件基板100與對向基板200之間的顯示介質300。顯示介質300設置於主動元件基板100的第一基底110與對向基板200的第二基底210之間。舉例而言,在本實施例中,顯示介質300是液晶,但本發明不以此為限。FIG. 1 is a schematic cross-sectional view of a display panel according to a first embodiment of the invention. 1, the
主動元件基板100包括第一基底110。第一基底110主要是用來承載主動元件基板100之元件之用,其材質可為玻璃、石英、有機聚合物、或是不透光/反射材料(例如:導電材料、晶圓、陶瓷、或其它可適用的材料)、或是其它可適用的材料。The
主動元件基板100包括主動元件T,設置於第一基底110上。主動元件T包括薄膜電晶體。薄膜電晶體具有閘極120、半導體圖案130、設置於閘極120與半導體圖案130之間的閘絕緣層GI以及分別與半導體圖案130之不同兩區電性連接的源極141與汲極142。The
在本實施例中,閘極120位於半導體圖案130的下方,而薄膜電晶體可以是底部閘極型電晶體。然而,本發明不以此為限,根據其它實施例,薄膜電晶體也可以是頂部閘極型或其它適當型式的電晶體。In this embodiment, the
主動元件基板100包括絕緣層150,設置於主動元件T上。主動元件基板100還包括絕緣層160,設置於絕緣層150上。在本實施例中,絕緣層150、160的材料可以是無機材料(例如:氧化矽、氮化矽、氮氧化矽、或上述至少二種材料的堆疊層)、有機材料或上述之組合。The
主動元件基板100包括畫素電極190、共用電極170及絕緣層180,設置於絕緣層160上。絕緣層180設置於畫素電極190與共用電極170之間。畫素電極190電性連接至主動元件T。在本實施例中,絕緣層180的材料可以是無機材料(例如:氧化矽、氮化矽、氮氧化矽、或上述至少二種材料的堆疊層)、有機材料或上述之組合。The
舉例而言,在本實施例中,共用電極170設置在絕緣層160上,絕緣層180設置於共用電極170上,而畫素電極190設置於絕緣層180上且具有多個狹縫192。也就是說,在本實施例中,畫素電極190可設置於共用電極170的上方。然而,本發明不限於此,根據其它實施例,畫素電極190也可設置於共用電極170的下方。For example, in this embodiment, the
對向基板200包括第二基底210及間隙物240。第二基底210設置於第一基底110的對向。間隙物240設置於第二基底210上。在本實施例中,間隙物240例如是感光性間隙物(photo spacer),但本發明不以此為限。The
在本實施例中,對向基板200可選擇性地包括遮光圖案220,設置於第二基底210上。遮光圖案220可遮蔽間隙物240及主動元件T。在本實施例中,對向基板200還可選擇性地包括彩色濾光層230,設置於第二基底210上,且重疊於畫素電極190。然而,本發明不限於此,根據其它實施例,遮光圖案220及/或彩色濾光層230也可選擇性地設置於第一基底110上。In this embodiment, the
值得注意的是,主動元件基板100的絕緣層180具有第一表面182a和側面182b;第一表面182a與側面182b相連接,以定義絕緣層180的凹陷182。對向基板200之間隙物240於第一基底110上的垂直投影與絕緣層180之凹陷182於第一基底110上之垂直投影重疊。It is worth noting that the insulating
基於開口率的考量,在本實施例中,絕緣層180之凹陷182可設置於主動元件T的上方;也就是說,絕緣層180之凹陷182於第一基底110上的垂直投影與主動元件T於第一基底110上之垂直投影可重疊,但本發明不以此為限。Based on the consideration of the aperture ratio, in this embodiment, the
值得一提的是,在本實施例中,對向基板200之間隙物240可伸入主動元件基板100之絕緣層180的凹陷182中,而間隙物240可抵頂凹陷182的第一表面182a。藉此,主動元件基板100與對向基板200不易發生過度偏移,間隙物240不易偏離原位置而損傷畫素電極190上的配向膜(未繪示)。如此一來,便能改善先前技術所述之亮點缺陷。It is worth mentioning that, in this embodiment, the
再者,於本實施例中,係利用間隙物240與絕緣層180之凹陷182的搭配來降低間隙物240偏離原位置的機率;而非利用間隙物240與絕緣層180的貫孔的搭配來降低間隙物240偏離原位置的機率。也就是說,在有效降低間隙物240偏離原位置之機率的前提下,絕緣層180覆蓋易吸溼的絕緣層160,使顯示面板10不易因絕緣層160吸濕後膨脹而產生剝開(peeling)的問題。Furthermore, in this embodiment, the matching of the
在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。It must be noted here that the following embodiments use the element numbers and part of the content of the previous embodiments, wherein the same numbers are used to represent the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.
圖2為本發明第二實施例之顯示面板的剖面示意圖。圖2的顯示面板10A與圖1的顯示面板10類似,兩者的差異在於:在圖2的實施例中,間隙物240下方可設有導電圖案172。2 is a schematic cross-sectional view of a display panel according to a second embodiment of the invention. The
請參照圖2,具體而言,導電圖案172設置於絕緣層180與絕緣層160之間。導電圖案172於第一基底110上的垂直投影與絕緣層180之凹陷182於第一基底110上之垂直投影重疊。2, specifically, the conductive pattern 172 is disposed between the insulating
在本實施例中,導電圖案172與共用電極170可形成於同一第一透明導電層,且導電圖案172可以是共用電極170的一部分,但本發明不以此為限。In this embodiment, the conductive pattern 172 and the
圖3為本發明第三實施例之顯示面板的剖面示意圖。圖3的顯示面板10B與圖1的顯示面板10類似,兩者的差異如下。3 is a schematic cross-sectional view of a display panel according to a third embodiment of the invention. The
請參照圖3,在本實施例中,主動元件基板100還包括凸起物194,設置於絕緣層180的凹陷182中。凸起物194具有高度H,絕緣層180的凹陷182具有深度D,且H>D。也就是說,凸起物194的頂點高於設置於絕緣層180上的畫素電極190。Please refer to FIG. 3, in this embodiment, the
對向基板200的間隙物240與主動元件基板100的凸起物194互相抵頂,以維持間隙(cell gap)。舉例而言,在本實施例中,凸起物194具有高度H,絕緣層180之凹陷182具有深度D,顯示介質300具有厚度G,且
。
The
在本實施例中,凸起物194可直接設置於絕緣層180之凹陷182的第一表面182a上,而凸起物194與凹陷182的第一表面182a接觸。在本實施例中,凸起物194與絕緣層180可皆包括有機材料,而凸起物194可良好地附著在絕緣層180的第一表面182a。In this embodiment, the
值得一提的是,利用互相抵頂之對向基板200的間隙物240與主動元件基板100的凸起物194,主動元件基板100與對向基板200不易發生過度偏移,間隙物240不易偏離原位置而損傷畫素電極190上的配向膜(未繪示)。如此一來,便能改善先前技術所述之亮點缺陷的問題。It is worth mentioning that by using the
此外,受限於製程能力及材料特性,凸起物194需具有一定的高度H,例如:
1.3µm,將具有一定高度H的凸起物194設置於絕緣層180的凹陷182中,能使凸起物194不會過凸起,進而使配向膜(未繪示)能良好地形成在主動元件基板100上。舉例而言,在本實施例中,設置於凹陷182之凸起物194的高度H可大於或等於1.5µm,凸起物194的高度H足夠而不易損壞。
In addition, due to process capability and material characteristics, the
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the relevant technical field can make slight changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be determined by the scope of the attached patent application.
10、10A、10B:顯示面板10, 10A, 10B: display panel
100:主動元件基板100: Active component substrate
110:第一基底110: first substrate
120:閘極120: gate
130:半導體圖案130: semiconductor pattern
141:源極141: Source
142:汲極142: Drain
150、160、180:絕緣層150, 160, 180: insulating layer
182:凹陷182: Depression
182a:第一表面182a: First surface
182b:側面182b: side
170:共用電極170: Common electrode
172:導電圖案172: Conductive pattern
190:畫素電極190: pixel electrode
192:狹縫192: slit
194:凸起物194: Bulge
200:對向基板200: Opposite substrate
210:第二基底210: second base
220:遮光圖案220: shading pattern
230:彩色濾光層230: Color filter layer
240:間隙物240: Spacer
300:顯示介質300: display medium
D:深度D: depth
GI:閘絕緣層GI: Gate insulation layer
H:高度H: height
T:主動元件T: Active component
圖1為本發明第一實施例之顯示面板的剖面示意圖。 圖2為本發明第二實施例之顯示面板的剖面示意圖。 圖3為本發明第三實施例之顯示面板的剖面示意圖。 FIG. 1 is a schematic cross-sectional view of a display panel according to a first embodiment of the invention. 2 is a schematic cross-sectional view of a display panel according to a second embodiment of the invention. 3 is a schematic cross-sectional view of a display panel according to a third embodiment of the invention.
10:顯示面板 10: Display panel
100:主動元件基板 100: Active component substrate
110:第一基底 110: first substrate
120:閘極 120: gate
130:半導體圖案 130: semiconductor pattern
141:源極 141: Source
142:汲極 142: Drain
150、160、180:絕緣層 150, 160, 180: insulating layer
182:凹陷 182: Depression
182a:第一表面 182a: First surface
182b:側面 182b: side
170:共用電極 170: Common electrode
190:畫素電極 190: pixel electrode
192:狹縫 192: slit
200:對向基板 200: Opposite substrate
210:第二基底 210: second base
220:遮光圖案 220: shading pattern
230:彩色濾光層 230: Color filter layer
240:間隙物 240: Spacer
300:顯示介質 300: display medium
GI:閘絕緣層 GI: Gate insulation layer
T:主動元件 T: Active component
Claims (8)
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| TW108115709A TWI703371B (en) | 2019-05-07 | 2019-05-07 | Display panel |
| CN201911241353.XA CN110928063A (en) | 2019-05-07 | 2019-12-06 | display panel |
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| TWI744034B (en) * | 2020-10-14 | 2021-10-21 | 友達光電股份有限公司 | Display panel |
| JP7472323B2 (en) * | 2021-01-12 | 2024-04-22 | 株式会社ジャパンディスプレイ | Display device |
| TWI871139B (en) * | 2023-12-19 | 2025-01-21 | 友達光電股份有限公司 | Display panel |
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| CN104793407A (en) * | 2015-04-29 | 2015-07-22 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and liquid crystal display |
| TW201621431A (en) * | 2014-12-09 | 2016-06-16 | 友達光電股份有限公司 | Display panel |
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| CN103913896A (en) * | 2013-01-07 | 2014-07-09 | 瀚宇彩晶股份有限公司 | Liquid crystal display panel |
| KR20160001794A (en) * | 2014-06-26 | 2016-01-07 | 삼성디스플레이 주식회사 | Liquid crystal display panel |
| CN104503153A (en) * | 2015-01-04 | 2015-04-08 | 京东方科技集团股份有限公司 | Liquid crystal panel and display device |
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| CN108983508A (en) * | 2018-08-27 | 2018-12-11 | 南京中电熊猫平板显示科技有限公司 | Liquid crystal display panel, display device and spacer material preparation method |
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| CN104793407A (en) * | 2015-04-29 | 2015-07-22 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and liquid crystal display |
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