TWI799604B - 工件加工方法 - Google Patents
工件加工方法 Download PDFInfo
- Publication number
- TWI799604B TWI799604B TW108121271A TW108121271A TWI799604B TW I799604 B TWI799604 B TW I799604B TW 108121271 A TW108121271 A TW 108121271A TW 108121271 A TW108121271 A TW 108121271A TW I799604 B TWI799604 B TW I799604B
- Authority
- TW
- Taiwan
- Prior art keywords
- processing method
- workpiece processing
- workpiece
- processing
- Prior art date
Links
Classifications
-
- H10P54/00—
-
- H10P52/00—
-
- H10P90/123—
-
- H10P90/128—
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018118692A JP7068064B2 (ja) | 2018-06-22 | 2018-06-22 | 被加工物の加工方法 |
| JP2018-118692 | 2018-06-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202002093A TW202002093A (zh) | 2020-01-01 |
| TWI799604B true TWI799604B (zh) | 2023-04-21 |
Family
ID=68968867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108121271A TWI799604B (zh) | 2018-06-22 | 2019-06-19 | 工件加工方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7068064B2 (zh) |
| KR (1) | KR102742368B1 (zh) |
| CN (1) | CN110634736B (zh) |
| TW (1) | TWI799604B (zh) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111403315B (zh) * | 2020-03-03 | 2022-03-18 | 上海华力集成电路制造有限公司 | 晶圆切边装置和方法 |
| USD969050S1 (en) * | 2020-12-03 | 2022-11-08 | Ralph Preston Kirtland | Vehicle bumper brace |
| JP7687834B2 (ja) * | 2021-03-12 | 2025-06-03 | 株式会社ディスコ | 加工装置及び加工方法 |
| CN115132568A (zh) * | 2021-03-25 | 2022-09-30 | 三美电机株式会社 | 半导体装置的制造方法 |
| CN113510609B (zh) * | 2021-07-12 | 2023-09-08 | 长鑫存储技术有限公司 | 晶圆以及晶圆的处理方法 |
| CN113510544A (zh) * | 2021-07-14 | 2021-10-19 | 凯龙蓝烽新材料科技有限公司 | 一种蜂窝陶瓷载体的外圆磨装置 |
| CN114597125A (zh) * | 2022-02-28 | 2022-06-07 | 太极半导体(苏州)有限公司 | 一种晶圆研磨前半环切边加工工艺 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6004405A (en) * | 1997-03-11 | 1999-12-21 | Super Silicon Crystal Research Institute Corp. | Wafer having a laser mark on chamfered edge |
| TW200807600A (en) * | 2006-06-09 | 2008-02-01 | Disco Corp | Sensing mechanism for crystal orientation indication mark of semiconductor wafer |
| TW200935575A (en) * | 2007-09-04 | 2009-08-16 | Disco Corp | Wafer |
| JP2013115187A (ja) * | 2011-11-28 | 2013-06-10 | Disco Abrasive Syst Ltd | ウェーハの加工方法 |
| TWI496205B (zh) * | 2009-04-15 | 2015-08-11 | 大都電子股份有限公司 | 晶圓斜角加工方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3515917B2 (ja) | 1998-12-01 | 2004-04-05 | シャープ株式会社 | 半導体装置の製造方法 |
| JP4029975B2 (ja) | 2002-12-18 | 2008-01-09 | コバレントマテリアル株式会社 | 半導体ウェーハのノッチの肩円弧部半径の測定方法 |
| JP4354769B2 (ja) * | 2003-09-19 | 2009-10-28 | 株式会社ディスコ | ウェーハの研磨方法 |
| JP5343400B2 (ja) * | 2008-05-22 | 2013-11-13 | 株式会社Sumco | 半導体ウェーハの製造方法 |
| JP5881504B2 (ja) * | 2012-03-30 | 2016-03-09 | 株式会社ディスコ | ウエーハの加工方法 |
| JP6093650B2 (ja) * | 2013-05-20 | 2017-03-08 | 株式会社ディスコ | ウェーハの加工方法 |
| JP6479532B2 (ja) * | 2015-03-30 | 2019-03-06 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
-
2018
- 2018-06-22 JP JP2018118692A patent/JP7068064B2/ja active Active
-
2019
- 2019-05-27 KR KR1020190061724A patent/KR102742368B1/ko active Active
- 2019-06-17 CN CN201910519907.1A patent/CN110634736B/zh active Active
- 2019-06-19 TW TW108121271A patent/TWI799604B/zh active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6004405A (en) * | 1997-03-11 | 1999-12-21 | Super Silicon Crystal Research Institute Corp. | Wafer having a laser mark on chamfered edge |
| TW200807600A (en) * | 2006-06-09 | 2008-02-01 | Disco Corp | Sensing mechanism for crystal orientation indication mark of semiconductor wafer |
| TW200935575A (en) * | 2007-09-04 | 2009-08-16 | Disco Corp | Wafer |
| TWI496205B (zh) * | 2009-04-15 | 2015-08-11 | 大都電子股份有限公司 | 晶圓斜角加工方法 |
| JP2013115187A (ja) * | 2011-11-28 | 2013-06-10 | Disco Abrasive Syst Ltd | ウェーハの加工方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202002093A (zh) | 2020-01-01 |
| CN110634736B (zh) | 2023-08-04 |
| CN110634736A (zh) | 2019-12-31 |
| KR102742368B1 (ko) | 2024-12-12 |
| KR20200000337A (ko) | 2020-01-02 |
| JP2019220632A (ja) | 2019-12-26 |
| JP7068064B2 (ja) | 2022-05-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP3759580A4 (en) | TOOL FOR LASER FINISHING DRAWINGS | |
| TWI799604B (zh) | 工件加工方法 | |
| DK3575022T3 (da) | Værktøjssystem | |
| PL3387354T3 (pl) | Urządzenie do obróbki oraz sposób obróbki przedmiotów obrabianych | |
| PL4227023T3 (pl) | Metoda otrzymywania efektywnych kosztowo elementów o złożonej geometrii | |
| SG10201905294RA (en) | Wafer processing method | |
| EP3643443A4 (en) | LASER TREATMENT MACHINE | |
| HUE062649T2 (hu) | Hulladékfeldolgozási módszer | |
| EP4011542A4 (en) | TREATMENT DEVICE | |
| EP3825055A4 (en) | MACHINE TOOL | |
| TWI800654B (zh) | 晶圓的加工方法 | |
| SG10201907317UA (en) | Processing method of workpiece | |
| JP2017534145A5 (ja) | ワークピース処理方法およびシステム | |
| EP3953503C0 (en) | ELECTROLYTIC POLISHING PROCESS | |
| EP4188608A4 (en) | TREATMENT METHOD | |
| SG10201700917TA (en) | Workpiece processing method | |
| SG10201904719TA (en) | Wafer processing method | |
| ITUB20161051A1 (it) | Macchina trafilatrice e metodo di trafilatura | |
| TWI799626B (zh) | 晶圓的加工方法 | |
| TWI799624B (zh) | 晶圓的加工方法 | |
| SG10201904710UA (en) | Wafer processing method | |
| EP3769910A4 (en) | MACHINE TOOL | |
| EP4272094A4 (en) | EDIT SETTINGS | |
| SG10201904720XA (en) | Workpiece processing method | |
| FI20165818A7 (fi) | Menetelmä lentotuhkan käsittelemiseksi |