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TWI797617B - Mesh mask inspection device - Google Patents

Mesh mask inspection device Download PDF

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TWI797617B
TWI797617B TW110117048A TW110117048A TWI797617B TW I797617 B TWI797617 B TW I797617B TW 110117048 A TW110117048 A TW 110117048A TW 110117048 A TW110117048 A TW 110117048A TW I797617 B TWI797617 B TW I797617B
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shape data
inspected
aforementioned
metal mask
inspection
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TW110117048A
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TW202202009A (en
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新山孝幸
菊池和義
大山剛
坂井田憲彥
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日商Ckd股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination

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  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Image Analysis (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

[課題] 提供可抑制發生印刷不良等的網遮罩檢查裝置。 [解決手段] 金屬遮罩檢查裝置30具備:照明裝置32A、32B,可將預定之光照射在預定被檢查部,該預定被檢查部係為金屬遮罩20的表背兩面當中於焊劑印刷時會成為和印刷基板抵接之基板抵接面側之背面201側的開口部21周邊部;攝像機32C,拍攝金屬遮罩20之背面201的被檢查部;及控制裝置,用以控制上述構成。控制裝置係構成為依據藉由攝像機32C所拍攝的和前述被檢查部相關的影像資料,取得和該被檢查部相關的形狀資料,並且可依據與該被檢查部相關的形狀資料,來判定該被檢查部之良否。[Problem] Provide a screen mask inspection device that can suppress the occurrence of printing defects, etc. [Solution] The metal mask inspection device 30 is provided with: illuminating devices 32A, 32B, which can irradiate predetermined light on a predetermined inspected portion which is between the front and back surfaces of the metal mask 20 during solder printing. The peripheral part of the opening 21 on the back side 201 side which will be the substrate contacting side which will be in contact with the printed circuit board; the camera 32C photographs the inspected part on the back side 201 of the metal mask 20; and the control device controls the above-mentioned configuration. The control device is configured to obtain shape data related to the inspected part based on image data related to the inspected part captured by the camera 32C, and determine the shape data related to the inspected part based on the shape data related to the inspected part. Whether the inspected department is good or not.

Description

網遮罩檢查裝置Mesh mask inspection device

本發明係關於用以檢查對基板實施焊劑印刷之際所使用的網遮罩的網遮罩檢查裝置。The present invention relates to a mesh mask inspection device for inspecting a mesh mask used for solder printing on a substrate.

通常,在基板上安裝電子零件的生產線中,首先係在焊劑印刷機上藉網版印刷使膏狀焊劑印刷在基板之島部(land)上。接著,利用該膏狀焊劑的黏性,使電子零件暫時固定在基板上。然後,透過將前述基板導入迴焊爐中進行焊接。Generally, in a production line for mounting electronic components on a substrate, firstly, paste solder is printed on lands of the substrate by screen printing on a solder printing machine. Next, the electronic components are temporarily fixed on the substrate by utilizing the viscosity of the cream solder. Then, soldering is performed by introducing the aforementioned substrate into a reflow furnace.

焊劑印刷機中,具備有和要成為預先印刷對象之基板的島部配置對應而形成之多數個開口部的網遮罩。在進行焊劑印刷之際,在使該網遮罩抵接於基板表面的狀態下,透過將膏狀焊劑供給到該上面,並藉滑動刮板將膏狀焊劑推入開口部內。然後,透過將網遮罩從基板分離,使填充在開口部內的膏狀焊劑脫版,並印刷(轉印)在島部上。A solder printer is provided with a mesh mask having a plurality of openings formed corresponding to the arrangement of islands of a substrate to be printed in advance. When performing solder printing, with the mesh mask in contact with the surface of the substrate, cream flux is supplied to the upper surface, and the cream flux is pushed into the openings by the sliding squeegee. Then, by separating the mesh mask from the substrate, the cream solder filled in the openings is released and printed (transferred) on the islands.

這種焊劑印刷機中,係在例如發生焊劑印刷不良、或作為印刷對象之基板更換規格的情況等,進行網遮罩的更換。In such a solder printing machine, the screen mask is replaced when, for example, defective solder printing occurs or a specification of a substrate to be printed is changed.

接著,使用已更換的網遮罩開始重行焊劑印刷之際,為了防止印刷不良發生於未然,會有事前檢查網遮罩的情形。Next, when solder printing starts again using the replaced mesh mask, the mesh mask may be inspected in advance in order to prevent printing defects from occurring in the first place.

實施這種檢查的技術,例如,在焊劑印刷機裝設有網遮罩的狀態下,藉雷射量測裝置將網遮罩的上面作三維量測,來判定網遮罩之良否的技術已屬公知(參照例如專利文獻1)。 [先前技術文獻] [專利文獻]The technology of implementing this kind of inspection, for example, in the state where the screen mask is installed on the solder printing machine, the technology of using the laser measuring device to measure the top of the screen mask three-dimensionally to determine whether the screen mask is good or not has been established. It is well known (see, for example, Patent Document 1). [Prior Art Literature] [Patent Document]

[專利文獻1] 日本特開2001-315310號公報[Patent Document 1] Japanese Patent Laid-Open No. 2001-315310

[發明欲解決之課題][Problem to be solved by the invention]

然而,上述專利文獻1的構成,係為在焊劑印刷時,在網遮罩的表背兩面中,從作為和印刷基板抵接的背面(下面)側相反之側的表面(上面)側進行三維量測,該背面(下面)係基板抵接面側,該表面(上面)係基板非抵接面側。However, in the structure of the above-mentioned Patent Document 1, when solder printing is performed, three-dimensional soldering is performed on the front and back sides of the mesh mask from the surface (upper) side opposite to the back (lower) side that contacts the printed circuit board. In the measurement, the back (lower surface) is the substrate abutting surface side, and the surface (upper surface) is the substrate non-contacting surface side.

因此,會有無法檢測在焊劑印刷時成為轉印在島部上的膏狀焊劑發生滲透或涶流等原因之網遮罩背面側的各種異常(不良部位)的顧慮。Therefore, there is a possibility that various abnormalities (defective parts) on the back side of the mesh mask, which cause penetration or flow of the cream solder transferred to the island portion during solder printing, may not be detected.

例如,網遮罩背面側之開口部周緣的角部,因過度的電解研磨處理等而產生過度圓弧化的情況[參照圖10(b)]、或網遮罩的背面側存在有和開口部連通的凹陷或切口等傷痕的情況[參照圖10(c)]、或在網遮罩之背面側的開口部周緣產生變形等的情況[參照圖10(d)]中,有成為焊劑印刷時膏狀焊劑從此處流動、滲透或涶流等原因之虞,甚至容易發生搭橋(bridge)等印刷不良,而且安裝零件之焊接作業無法適當執行,有不良品發生率增高之虞。For example, the corners of the openings on the back side of the net mask are excessively rounded due to excessive electrolytic polishing [see Fig. 10(b)], or there are openings on the back side of the net mask. In the case of flaws such as recesses or cuts that are connected to each other [see Fig. 10(c)], or when deformation occurs on the periphery of the opening on the back side of the mesh mask [see Fig. 10(d)], solder printing may occur. When the paste flux flows, permeates or flows from here, it may even cause poor printing such as bridging (bridge), and the soldering operation of the mounting parts cannot be properly performed, and the occurrence rate of defective products may increase.

本發明係有鑒於上述情形而研發者,其目的在提供可抑制發生印刷不良等的網遮罩檢查裝置。 [用以解決課題之手段]The present invention was developed in view of the above circumstances, and an object of the present invention is to provide a screen mask inspection device that can suppress occurrence of printing defects and the like. [Means to solve the problem]

下文中,就適於解決上述課題的各手段分項說明。另外,亦依需要附帶陳述對應手段特有的作用效果。Hereinafter, each means suitable for solving the above-mentioned problems will be described item by item. In addition, if necessary, the specific function and effect of the corresponding means are also stated.

手段1.一種網遮罩檢查裝置,形成有複數個開口部,用以檢查在對基板進行焊劑印刷之際所使用的網遮罩,其特徵為具備: 至少1個照射手段,可將預定的光照射在預定被檢查部,該預定被檢查部係在前述網遮罩的表背兩面之中於焊劑印刷時會成為和前述基板抵接之基板抵接面側的背面側之前述開口部的周邊部; 拍攝手段,可對前述預定之光所照射的前述被檢查部進行拍攝; 形狀資料取得手段,依據藉前述拍攝手段拍攝的和前述被檢查部相關的1個或複數個影像資料,可取得與該被檢查部相關的形狀資料;及 判定手段,根據藉前述形狀資料取得手段所取得的和前述被檢查部相關的形狀資料,判定前述被檢查部的良否。Means 1. A mesh mask inspection device having a plurality of openings for inspecting a mesh mask used for solder printing on a substrate, characterized by having: At least one irradiating means capable of irradiating a predetermined light onto a portion to be inspected that is in contact with the substrate that will be in contact with the substrate during solder printing among the front and back sides of the mesh mask The peripheral portion of the aforementioned opening on the back side of the front side; photographing means capable of photographing the portion to be inspected irradiated by the predetermined light; The shape data acquisition means can obtain the shape data related to the inspected part based on one or more image data related to the inspected part captured by the aforementioned shooting means; and The judging means judges the quality of the inspected part based on the shape data related to the inspected part acquired by the shape data acquiring means.

若依據上述手段1,網遮罩的表背兩面之中,從焊劑印刷時和基板抵接之基板抵接面側的背面側,進行關於屬於開口部之周邊部分的預定被檢查部的檢查。According to the above method 1, of the front and back surfaces of the mesh mask, inspection is performed on the portion to be inspected which is the peripheral portion of the opening from the back side of the substrate abutting surface side which is in contact with the substrate during solder printing.

藉由此種構成,可對會造成印刷時焊劑之滲透或涶流等原因之網遮罩背面側的開口部周邊(被檢查部)相關的各種異常(不良部位)進行檢測。結果,得以抑制發生印刷不良等情形。With this configuration, it is possible to detect various abnormalities (defective parts) related to the periphery of the opening on the back side of the mesh mask (inspected part) which may cause penetration or flow of flux during printing. As a result, occurrence of printing defects and the like can be suppressed.

手段2.如手段1所述的網遮罩檢查裝置,其中,前述判定手段係構成為可藉由判定前述開口部周緣的倒角部之大小是否有超過預定量(例如,倒角部的「深度」及「寬度」之中的至少一個判定項目是否有超過預定臨界值),來判定前述被檢查部之良否。Means 2. The net mask inspection device as described in means 1, wherein the aforementioned determination means is configured to determine whether the size of the chamfered portion on the periphery of the aforementioned opening exceeds a predetermined amount (for example, the "" of the chamfered portion Whether at least one of the judging items among “depth” and “width” exceeds a predetermined critical value) to judge whether the aforementioned inspected part is good or not.

如上述「發明所欲解決之課題」所述,網遮罩之背面側的開口部之周緣角部分會有因過度的電解研磨處理等而變得過度圓弧化的情形[參照圖10(b)],故在焊劑印刷時,有造成焊劑從此處流動、滲透或涶流等原因之虞。對於此點,若依據上述手段2,即可防止這種缺點發生於未然。As described in the above "Problems to be Solved by the Invention", the peripheral corners of the openings on the back side of the mesh cover may become excessively rounded due to excessive electrolytic polishing [see Fig. 10(b) )], so during flux printing, there is a risk of causing flux to flow, permeate or flow from here. For this point, if according to the above-mentioned means 2, this shortcoming can be prevented from happening before it happens.

手段3.如手段1或2的網遮罩檢查裝置,其中,前述判定手段係構成為可透過判定在前述被檢查部中是否有超過預定大小的異常部分(例如,「深度」、「寬度」、「長度」及「體積」中的至少1個判定項目是否有超過預定臨界值的異常部),而判定前述被檢查部的良否。Means 3. The net mask inspection device as in means 1 or 2, wherein the aforementioned judging means is configured to transparently judge whether there is an abnormal part exceeding a predetermined size (for example, "depth", "width") in the aforementioned inspected part , "Length" and "Volume" in at least one of the judgment items whether there is an abnormal part exceeding a predetermined critical value), and judge whether the aforementioned inspected part is good or not.

如上文「發明所欲解決之課題」所述,網遮罩之背面側存在有連通於開口部的凹陷或切痕等傷口時[參照圖10(c)]、網遮罩背面側的開口部周緣產生變形等時[參照圖10(d)],會有焊劑印刷時焊膏自此處流動,而造成滲透或涶流等原因之虞。對於此點,若依據上述手段3,即可防止發生這種缺失於未然。意即,上述「異常部」係包含連通於開口部之凹陷或切痕等傷口、開口部周緣之變形。此外,上述「異常部」中,也可包含異物附著的部位(附著於被檢查部的異物)等。As mentioned above in "Problems to be Solved by the Invention", when there is a wound such as a depression or a cut on the back side of the mesh cover that communicates with the opening [see Fig. 10(c)], the opening on the back side of the mesh cover When the peripheral edge is deformed [see FIG. 10(d)], there is a possibility that the solder paste flows from this area during flux printing, causing penetration or bleeding. For this point, if according to the above-mentioned means 3, it is possible to prevent this defect from happening before it happens. That is, the above-mentioned "abnormal part" includes wounds such as depressions or cuts communicating with the opening, and deformation of the periphery of the opening. In addition, the above-mentioned "abnormal part" may also include a part where foreign matter adheres (foreign matter adhering to the part to be inspected), and the like.

手段4.如手段1至3中任一項之網遮罩檢查裝置,其中,具備辨別手段(生成模型),其係對具有從輸入的形狀資料擷取特徵量的編碼部(Encoder)、及從該特徵量重建形狀資料的解碼部(解碼器)的神經網路,僅使和無異常的前述被檢查部有關的形狀資料(僅屬於良品的形狀資料)作為學習資料進行學習而生成, 前述判定手段具備: 重建形狀資料取得手段,可取得和前述被檢查部相關的重建形狀資料,該和前述被檢查部相關的重建形狀資料係以和藉前述形狀資料取得手段所取得的前述被檢查部相關的形狀資料作為原形狀資料,並輸入前述辨別手段輸入而重建;及 比較手段,將前述原形狀資料與前述重建形狀資料加以比較; 且構成為可根據藉前述比較手段所得的比較結果,來判定前述被檢查部之良否。Means 4. The mesh mask inspection device according to any one of means 1 to 3, wherein a discrimination means (generated model) is provided for an encoding unit (Encoder) which extracts feature quantities from input shape data, and The neural network of the decoding unit (decoder) that reconstructs the shape data from this feature value uses only the shape data (shape data belonging to only good products) related to the above-mentioned inspected part without abnormality as learning data to generate, The aforesaid judgment means have: The reconstructed shape data obtaining means can obtain the reconstructed shape data related to the inspected part, and the reconstructed shape data related to the inspected part is the shape data related to the inspected part obtained by the aforementioned shape data obtaining means As the original shape data, it is input and reconstructed by inputting the aforementioned identification means; and comparison means, comparing the aforementioned original shape data with the aforementioned reconstructed shape data; In addition, it is configured such that the quality of the inspected part can be judged based on the comparison result obtained by the comparison means.

另外,上述「神經網路」中包含例如具有複數個卷積層的卷積型神經網路等。此外,上述「學習」中,包含例如深度學習(deep learning)等。上述「辨別手段(生成模型)」中包含例如自動編碼器(自編碼器)、或卷積型自動編碼器(卷積型自編碼器)等。In addition, the above-mentioned "neural network" includes, for example, a convolutional neural network having a plurality of convolutional layers. In addition, the above-mentioned "learning" includes, for example, deep learning and the like. The aforementioned "discrimination means (generated model)" includes, for example, an autoencoder (autoencoder), a convolutional autoencoder (convolutional autoencoder), and the like.

若依據上述手段4,可使用學習神經網路所構築的自編碼器等辨別手段(生成模型),藉以判定被檢查部有無異常(不良部位)。依據這種構成,以往難以檢測的微小異常即得以檢測。According to the above-mentioned method 4, it is possible to use a discrimination method (generated model) such as an autoencoder constructed by a learning neural network to determine whether there is an abnormality (defective part) in the inspected part. With this configuration, minute abnormalities that were difficult to detect in the past can be detected.

再者,本手段中,因將被檢查部拍攝所得的原形狀資料、和依據該原形狀資料重建所得的重建形狀資料相比較,故在比較的兩形狀資料中,沒有因屬於檢查對象物的網遮罩側之拍攝條件(例如,網遮罩的配置位置或配置角度、彎曲等)、或屬於檢查裝置側的拍攝條件(例如,照明狀態或攝像機的畫角等)的差異產生的影響,可更正確地檢測出更微細的異常。Furthermore, in this method, since the original shape data captured by the inspected part is compared with the reconstructed shape data reconstructed based on the original shape data, there is no object belonging to the inspection object among the compared two shape data. Influences caused by differences in imaging conditions on the side of the net mask (for example, arrangement position or arrangement angle of the net mask, bending, etc.), or differences in imaging conditions on the side of the inspection device (for example, lighting conditions or camera angles, etc.), Finer abnormalities can be detected more accurately.

另外,假如位於網遮罩之預定位置的預定被檢查部(開口部的周邊部分)相關的檢查進行之際,必須以該被檢查部的構成資訊(位置資料或尺寸資料等)作為判定良否之基準的構成中,例如將賈柏資料等基板設計資訊預先記憶妥當,並適當取得要成為檢查對象之被檢查部的構成資訊,並和該構成資訊比較,對要成為檢查對象之被檢查部的良否進行判定,故有檢查效率降低之虞。而且,網遮罩對檢查位置的定位也必須正確進行。In addition, if the inspection is carried out on the part to be inspected (periphery of the opening) at the predetermined position of the net cover, the composition information (position data or size data, etc.) of the part to be inspected must be used as a criterion for judging whether it is good or not In the composition of the standard, for example, the substrate design information such as Jaber data is stored in advance, and the composition information of the inspected part to be inspected is obtained appropriately, and compared with the composition information, the information of the inspected part to be inspected is Good or bad is judged, so there is a risk of lower inspection efficiency. Furthermore, the positioning of the mesh mask to the inspection position must also be done correctly.

對於此點,若依據本手段,係利用自編碼器等辨別手段,將各被檢查部進行檢查的構成,故不必須將多數被檢查部各者之個別構成資訊預先加以記憶,故檢查之際不用參考該資訊,即可謀求檢查效率的提升。Regarding this point, if according to this method, it is the structure of inspecting each inspected part by means of discrimination such as an autoencoder, it is not necessary to memorize the individual configuration information of each of the inspected parts in advance, so when inspecting Improve inspection efficiency without referring to this information.

手段5.如前述手段1至4中任一項之網遮罩檢查裝置,其中,前述照射手段係構成為可照射三維量測用光(例如,具有條紋狀之光強度分布的圖案光)作為前述預定之光, 前述形狀資料取得手段係構成為可利用預定的三維量測法(例如,相移法)取得和前述被檢查部相關的三維形狀資料。Means 5. The mesh mask inspection device according to any one of the aforementioned means 1 to 4, wherein the aforementioned irradiating means is configured to irradiate three-dimensional measuring light (for example, patterned light having a stripe-shaped light intensity distribution) as The aforementioned light of predestination, The shape data obtaining means is configured to obtain the three-dimensional shape data related to the inspected portion by a predetermined three-dimensional measurement method (for example, a phase shift method).

在此處,作為上述「三維量測法」的一個例子,可舉出以在相位不同的複數道圖案光之下所拍攝的複數種影像資料作為依據,而取得三維形狀資料的相移法。Here, as an example of the above-mentioned "three-dimensional measurement method", there can be mentioned a phase shift method for obtaining three-dimensional shape data based on a plurality of image data captured under a plurality of patterned lights with different phases.

若依據上述手段5,係利用相移法等三維量測法,透過取得有關被檢查部的三維形狀資料,即可以優異精度判定被檢查部有否異常(不良部位)。結果,可謀求檢查精度的提升。According to the above method 5, by using the three-dimensional measurement method such as the phase shift method, by obtaining the three-dimensional shape data of the inspected part, it is possible to determine whether the inspected part is abnormal (defective part) with excellent accuracy. As a result, inspection accuracy can be improved.

另外,為了適當掌握在焊劑印刷時,膏狀焊劑會從網遮罩背面側開口部周緣的間隙流動,並轉印於島部上之成為膏狀焊劑的滲透或涶流等原因之異常部,即使是在形狀資料中,用以取得可產生前述間隙之異常部的高度方向資訊(高度資料)就很重要。In addition, in order to properly grasp that during solder printing, cream flux flows from the gap around the opening on the back side of the mesh mask, and is transferred to abnormal parts on the islands that cause penetration or sloshing of the cream flux, Even in the shape data, it is important to obtain the height direction information (height data) of the abnormal part that can generate the aforementioned gap.

關於此點,如本手段所示,透過取得與被檢查部相關的三維形狀資料,可以優異精度判定得以產生上述間隙的異常部是否存在於被檢查部。結果,可謀求檢查精度之提升。In this regard, as shown in this means, by acquiring three-dimensional shape data related to the inspected portion, it is possible to determine with excellent accuracy whether an abnormal portion in which the above-mentioned gap occurs exists in the inspected portion. As a result, the inspection accuracy can be improved.

手段6.如手段1至5之網遮罩檢查裝置,其中,前述網遮罩係配置成前述背面側變成下側,而前述照射手段係配置成可對前述網遮罩之背面側從下方照射前述預定之光;且前述拍攝手段係配置成可將前述網遮罩的背面側從下方拍攝。Means 6. The net mask inspection device according to means 1 to 5, wherein the aforementioned net mask is configured so that the aforementioned back side becomes the lower side, and the aforementioned irradiation means is configured to illuminate the back side of the aforementioned net mask from below The aforementioned predetermined light; and the aforementioned photographing means are configured to photograph the back side of the aforementioned net mask from below.

作成假定網遮罩的背面側(基板抵接面側)配置成位在上側,從上方進行檢查之構成的情況,會受到室內照明等外擾光的影響,有難以進行穩定的檢查之虞。In the case where inspection is performed from above assuming that the back side (substrate contact surface side) of the mesh mask is placed on the upper side, it may be affected by external light such as indoor lighting, and stable inspection may be difficult.

對於此點,若依據上述手段6,即可謀求抑制上述不良情況之發生、及檢查精度之提升。特別是,如利用相移法的情況所示,在容易受到微細的亮度變化之影響的環境下進行檢查的情況,更能達成功效。Regarding this point, according to the above-mentioned means 6, the occurrence of the above-mentioned disadvantages can be suppressed and the inspection accuracy can be improved. In particular, as in the case of using the phase shift method, it is more effective when inspection is performed in an environment that is easily affected by minute luminance changes.

[用以實施發明的形態][Mode for Carrying Out the Invention]

以下就本發明之一實施形態加以說明。首先,針對印刷焊劑並安裝零件之基板的構成加以說明。圖1係將作為基板的印刷基板的一部分加以放大的局部放大俯視圖。One embodiment of the present invention will be described below. First, the structure of the substrate on which solder is printed and components are mounted will be described. FIG. 1 is an enlarged partial plan view of a part of a printed circuit board as a substrate.

如圖1所示,印刷基板1係在由玻璃環氧樹脂等構成的平板狀底層基板2之表面形成有由銅箔形成的配線圖案(圖示省略)或複數個島部3。而且,在底層基板2的表面,除了島部3以外的部分,均塗佈有阻劑膜4。而且,如圖1、3所示,在島部3上印刷有具黏性的膏狀焊劑5。另外,圖1、3中,係權宜上在顯示膏狀焊劑5的部分附設散點狀模樣。As shown in FIG. 1 , a printed circuit board 1 has a copper foil wiring pattern (not shown) or a plurality of islands 3 formed on the surface of a flat base substrate 2 made of glass epoxy resin or the like. Furthermore, a resist film 4 is coated on the surface of the base substrate 2 except for the island portion 3 . Furthermore, as shown in FIGS. 1 and 3 , a viscous cream solder 5 is printed on the island portion 3 . In addition, in FIGS. 1 and 3 , it is expedient to attach scattered dots to the portion where the cream solder 5 is displayed.

接著,參照圖2說明有關製作印刷基板1的生產線(製程)。圖2為顯示印刷基板1之生產線10之構成的方塊圖。本實施形態中的生產線10,從其正面側觀看,設定為將印刷基板1由左向右搬送。Next, a production line (process) for producing the printed circuit board 1 will be described with reference to FIG. 2 . FIG. 2 is a block diagram showing the configuration of a production line 10 for printed substrates 1 . The production line 10 in this embodiment is set to convey the printed circuit board 1 from left to right when viewed from the front side.

如圖2所示,生產線10係自上游側(圖2左側)依序設置有焊劑印刷機12、焊劑印刷檢查裝置13、零件安裝機14、及迴焊裝置15。As shown in FIG. 2 , the production line 10 is sequentially provided with a solder printing machine 12 , a solder printing inspection device 13 , a component mounting machine 14 , and a reflow device 15 from the upstream side (left side of FIG. 2 ).

焊劑印刷機12係為用以進行將膏狀焊劑5印刷在印刷基板1之島部3上之焊劑印刷步驟者。如圖3所示,焊劑印刷機12具備有:平板狀的金屬遮罩20,其與印刷基板1上的各島部3對應而形成有複數個開口部21;及沿著該金屬遮罩20之表面202滑動的刮板22。本實施形態中,金屬遮罩20係相當於本實施形態的網遮罩。The solder printing machine 12 is used to perform a solder printing step of printing cream solder 5 on the island portion 3 of the printed circuit board 1 . As shown in FIG. 3 , the solder printer 12 is provided with: a flat metal mask 20 having a plurality of openings 21 corresponding to the islands 3 on the printed circuit board 1; The scraper 22 that slides on the surface 202. In this embodiment, the metal mask 20 corresponds to the mesh mask of this embodiment.

此外,本實施形態中的金屬遮罩20(參照圖4)係由形成有前述複數個開口部21的矩形薄板狀金屬製遮罩本體部20a,及用以保持該遮罩本體部20a之周緣部四邊的矩形框狀金屬製框架部20b所構成。透過將薄板狀遮罩本體部20a以張拉狀態保持在高剛性的框架部20b,可將遮罩本體部20a的撓曲等加以抑制。In addition, the metal mask 20 in this embodiment (refer to FIG. 4 ) is made of a rectangular thin-plate-shaped metal mask body part 20a formed with the aforementioned plurality of openings 21, and a peripheral edge for holding the mask body part 20a. It is composed of rectangular frame-shaped metal frame parts 20b on the four sides. By holding the thin-plate-shaped mask body portion 20a in a tensioned state on the highly rigid frame portion 20b, it is possible to suppress bending of the mask body portion 20a, and the like.

在上述構成之下,於焊劑印刷步驟中,首先,使金屬遮罩20對準並抵接於印刷基板1之表面側。接著,將膏狀焊劑5供給至金屬遮罩20之表面202。再令刮板22沿著金屬遮罩20的表面202滑動,且將膏狀焊劑5推入開口部21內。Under the above configuration, in the solder printing step, first, the metal mask 20 is aligned and brought into contact with the surface side of the printed circuit board 1 . Next, the paste solder 5 is supplied to the surface 202 of the metal mask 20 . Then make the scraper 22 slide along the surface 202 of the metal mask 20 , and push the paste solder 5 into the opening 21 .

然後,透過使金屬遮罩20從印刷基板1脫離,且將填充於開口部21內的膏狀焊劑5自背面201側脫版,且印刷(轉印)到島部3上,焊劑印刷即告結束。Then, by detaching the metal mask 20 from the printed circuit board 1, the cream solder 5 filled in the opening 21 is released from the back surface 201 side, and printed (transferred) onto the island 3, the solder printing is completed. Finish.

焊劑印刷檢查裝置13係用以進行焊劑印刷檢查步驟者,該焊劑印刷檢查步驟係將依上述方式印刷的膏狀焊劑5的狀態(例如,印刷位置、高度、量等)進行檢查。The solder printing inspection device 13 is used to perform a solder printing inspection step of inspecting the state (for example, printing position, height, amount, etc.) of the cream solder 5 printed as described above.

零件安裝機14係為進行將電子零件25(參照圖1)搭載在印刷有膏狀焊劑5的島部3上的零件安裝步驟者。電子零件25具備有複數個電極或導線,且該各電極或導線係分別暫時固定在既定的膏狀焊劑5。The component mounting machine 14 performs a component mounting step of mounting an electronic component 25 (see FIG. 1 ) on the island portion 3 on which the cream solder 5 is printed. The electronic component 25 is provided with a plurality of electrodes or lead wires, and each of the electrodes or lead wires is temporarily fixed to predetermined cream solder 5 .

迴焊裝置15係為使膏狀焊劑5加熱溶融,藉以將島部3、電子零件25之電極或導線實施焊劑接合(焊接)之迴焊步驟的配備。The reflow device 15 is used to heat and melt the cream flux 5, so as to implement the reflow step of soldering (soldering) the electrodes or wires of the island part 3 and the electronic component 25.

其他方面,雖將圖示省略,但在生產線10中,在焊劑印刷機12與焊劑印刷檢查裝置13之間等上述各裝置間,設有用以搬送印刷基板1的輸送帶(conveyor)等。此外,焊劑印刷檢查裝置13與零件安裝機14之間設有岔開裝置。而且,藉焊劑印刷檢查裝置13判定為良品的印刷基板1向其下游側的零件安裝機14引導,另一方面,判定為不良品的印刷基板1則藉岔開裝置排出到不良品貯置部。In other respects, although not shown, in the production line 10, a conveyor for conveying the printed circuit board 1 is provided between the above-mentioned devices such as the solder printing machine 12 and the solder printing inspection device 13. In addition, a branching device is provided between the solder printing inspection device 13 and the component mounting machine 14 . Furthermore, the printed circuit board 1 judged to be a good product by the solder printing inspection device 13 is guided to the component mounting machine 14 on the downstream side thereof, while the printed circuit board 1 judged to be a defective product is discharged to the defective product storage section by the diverting device. .

再者,在焊劑印刷機12的附近併設有清潔裝置29及金屬遮罩檢查裝置30。金屬遮罩檢查裝置30在本實施形態中係構成為網遮罩檢查裝置。Furthermore, a cleaning device 29 and a metal mask inspection device 30 are provided in the vicinity of the solder printer 12 . The metal mask inspection device 30 is configured as a mesh mask inspection device in the present embodiment.

清潔裝置29係為用以對在焊劑印刷機12中附著有污垢等的金屬遮罩20進行清潔的清潔步驟者。另外,本實施形態中,構成為在上述印刷基板1的製造步驟(生產線10)中,每藉焊劑印刷機12執行了預定次數的焊劑印刷,即令焊劑印刷暫停,將使用於該焊劑印刷的金屬遮罩20加以清潔。The cleaning device 29 is a cleaning step for cleaning the metal mask 20 to which dirt and the like adhered in the solder printer 12 . In addition, in the present embodiment, in the manufacturing process (line 10) of the above-mentioned printed circuit board 1, every time a predetermined number of times of solder printing is performed by the solder printing machine 12, that is, the solder printing is suspended, and the metal used for the solder printing is used. Mask 20 is cleaned.

金屬遮罩檢查裝置30係為依上述方式在清潔裝置29中已完成清潔的金屬遮罩20、或已換新的未使用金屬遮罩20等要裝設到焊劑印刷機12之前的金屬遮罩20進行檢查者。The metal mask inspection device 30 is a metal mask 20 that has been cleaned in the cleaning device 29 in the above-mentioned manner, or a new unused metal mask 20 that is to be installed before the solder printer 12, etc. 20 examiners.

在此處,有關金屬遮罩檢查裝置30的構成,係參照圖4、5詳為說明。圖4係示意性顯示金屬遮罩檢查裝置30的概略構成圖。圖5為顯示金屬遮罩檢查裝置30之功能構成的方塊圖。Here, the configuration of the metal mask inspection device 30 will be described in detail with reference to FIGS. 4 and 5 . FIG. 4 is a schematic configuration diagram schematically showing a metal mask inspection device 30 . FIG. 5 is a block diagram showing the functional configuration of the metal mask inspection device 30 .

金屬遮罩檢查裝置30具備:搬送機構31,金屬遮罩20的搬送或定位等;檢查單元32,用以執行金屬遮罩20之檢查;控制裝置33,以搬送機構31或檢查單元32之驅動控制為首,執行金屬遮罩檢查裝置30內之各種控制或影像處理、運算處理。The metal mask inspection device 30 is equipped with: a conveying mechanism 31 for conveying or positioning the metal mask 20; an inspection unit 32 for performing inspection of the metal mask 20; a control device 33 for driving the conveying mechanism 31 or the inspection unit 32 Control is the first, and various controls, image processing, and calculation processing in the metal mask inspection device 30 are executed.

搬送機構31配備有:沿著金屬遮罩20的搬入搬出方向配置的一對搬送軌道31a;配設成可相對於各搬送軌道31a旋轉的環狀的輸送帶31b;驅動該輸送帶31b的馬達等驅動手段(圖示略);及用以將金屬遮罩20定位在預定位置的夾持機構(圖示略);且藉控制裝置33(後述之搬送機構控制部79)執行驅動控制。The conveyance mechanism 31 is equipped with: a pair of conveyance rails 31a arranged along the loading and unloading direction of the metal mask 20; an endless conveyer belt 31b arranged rotatably with respect to each conveyance rail 31a; and a motor for driving the conveyance belt 31b. and other driving means (not shown); and a clamping mechanism (not shown) for positioning the metal mask 20 at a predetermined position;

在上述構成之下,朝金屬遮罩檢查裝置30搬入的金屬遮罩20係使和搬入搬出方向正交之寬度方向兩側緣部的框架部20b分別插入搬送軌道31a,並且載置於輸送帶31b上。接著,輸送帶31b開始動作,並使金屬遮罩20搬送到預定的檢查位置。金屬遮罩20到達檢查位置時,輸送帶31b即停止,並且,夾持機構會動作。透過該夾持機構的動作,輸送帶31b會被上推,成為藉著輸送帶31b與搬送軌道31a的上邊部使金屬遮罩20的兩側緣部之框架部20b被挾持的狀態。藉此,金屬遮罩20即可定位固定在檢查位置。檢查結束時,藉夾持機構的固定即被解除,並且輸送帶31b開始動作。藉此,金屬遮罩20從金屬遮罩檢查裝置30搬出。當然,搬送機構31的構成並非限定於上述形態,也可採用其他的構成。With the above configuration, the metal mask 20 carried into the metal mask inspection device 30 is inserted into the conveying rail 31a by the frame portions 20b at both side edges in the width direction perpendicular to the carrying in and carrying out direction, and placed on the conveyor belt. 31b on. Next, the conveyor belt 31b starts to operate, and conveys the metal mask 20 to a predetermined inspection position. When the metal mask 20 reaches the inspection position, the conveyor belt 31b stops and the clamping mechanism operates. Through the operation of the clamping mechanism, the conveyor belt 31b is pushed up, and the frame portions 20b at both side edges of the metal mask 20 are clamped by the conveyor belt 31b and the upper edge of the conveyor rail 31a. Thereby, the metal mask 20 can be positioned and fixed at the inspection position. When the inspection is finished, the fixation by the clamping mechanism is released, and the conveyor belt 31b starts to move. Thereby, the metal mask 20 is carried out from the metal mask inspection apparatus 30. As shown in FIG. Of course, the structure of the conveyance mechanism 31 is not limited to the above-mentioned form, and other structures can also be employ|adopted.

檢查單元32係配設在搬送軌道31a(金屬遮罩20之搬送路徑)的下方。檢查單元32具備:作為照射手段的第1照明裝置32A及第2照明裝置32B,將三維量測用的預定光線(具有條紋狀之光強度分布的圖案光)從斜下方照射在金屬遮罩20之背面201的預定檢查範圍;攝像機32C,作為從正下方拍攝金屬遮罩20之背面201的預定檢查範圍的拍攝手段;X軸移動機構32D(參照圖5),可移動於X軸方向(圖4的左右方向);及Y軸移動機構32E(參照圖5),設成可朝Y軸方向(圖4前後方向)移動;並且藉控制裝置33實施驅動控制。The inspection unit 32 is arranged below the conveyance rail 31a (conveyance path of the metal mask 20). The inspection unit 32 includes a first illuminating device 32A and a second illuminating device 32B as irradiation means, and irradiates the metal mask 20 with predetermined light rays (pattern light having a stripe-shaped light intensity distribution) for three-dimensional measurement from obliquely below. The predetermined inspection range of the back side 201; the camera 32C, as a means of photographing the predetermined inspection range of the back side 201 of the metal mask 20 from directly below; the X-axis moving mechanism 32D (referring to FIG. 5 ), which can move in the X-axis direction (Fig. 4 left and right direction); and Y-axis moving mechanism 32E (referring to Fig. 5), is set to move toward the Y-axis direction (Fig. 4 front-rear direction);

另外,本實施形態中,以焊劑印刷時成為和印刷基板1抵接的金屬遮罩20之基板抵接面側的背面201係朝向下方(變成下面),而且成為基板非抵接面側的表面202係朝向上方(變成上面)之方式,對金屬遮罩檢查裝置30設定金屬遮罩20。In addition, in the present embodiment, the back surface 201 on the substrate-contacting surface side of the metal mask 20 that is in contact with the printed circuit board 1 at the time of solder printing is directed downward (becomes the lower surface), and becomes the surface on the substrate non-contacting surface side. The metal mask 20 is set to the metal mask inspection device 30 so that it faces upward (turns to the upper side) at 202 .

再者,金屬遮罩20之背面201的「檢查範圍」係指以攝像機32C的拍攝視角(拍攝範圍)的大小作為1單位,預先設定在金屬遮罩20之背面201的複數個區域中的1個區域。Furthermore, the "inspection range" of the rear surface 201 of the metal mask 20 refers to one of the plurality of regions preset in advance on the rear surface 201 of the metal mask 20, taking the size of the imaging angle of view (shooting range) of the camera 32C as a unit. area.

控制裝置33(移動機構控制部76)係透過驅動控制X軸移動機構32D及Y軸移動機構32E,使檢查單元32可向定位固定在檢查位置的金屬遮罩20之背面201的任意檢查範圍的下方位置移動。然後,透過使檢查單元32依序移動到設定在金屬遮罩20之背面201的複數個檢查範圍,實施和該檢查範圍相關的檢查,而形成可將金屬遮罩20之背面201的整個區域執行檢查的構成。The control device 33 (moving mechanism control part 76) drives and controls the X-axis moving mechanism 32D and the Y-axis moving mechanism 32E, so that the inspection unit 32 can move to any inspection range on the back side 201 of the metal mask 20 positioned and fixed at the inspection position. The lower position moves. Then, by sequentially moving the inspection unit 32 to a plurality of inspection ranges set on the back side 201 of the metal mask 20, and performing inspections related to the inspection ranges, the entire area of the back side 201 of the metal mask 20 can be inspected. Check composition.

第1照明裝置32A具備發出預定之光的第1光源32Aa、或形成將來自該第1光源32Aa之光變換為具有條紋狀之光強度分布的第1圖案光之第1格子的第1液晶快門32Ab,並藉控制裝置33(後述的照明控制部72)執行驅動控制。The first lighting device 32A includes a first light source 32Aa that emits a predetermined light, or a first liquid crystal shutter that forms a first grid that converts light from the first light source 32Aa into a first pattern light having a stripe-like light intensity distribution. 32Ab, and drive control is performed by the control device 33 (illumination control unit 72 described later).

第2照明裝置32B具備發出預定之光的第2光源32Ba、或形成將來自該第2光源32Ba之光變換成具有條紋狀光強度分布的第2圖案光的第2格子的第2液晶快門32Bb,並藉控制裝置33(後述的照明控制部72)進行驅動控制。The second illuminating device 32B includes a second light source 32Ba that emits a predetermined light, or a second liquid crystal shutter 32Bb that forms a second lattice for converting the light from the second light source 32Ba into a second pattern light having a stripe-like light intensity distribution. , and drive control is performed by the control device 33 (illumination control unit 72 described later).

在上述構成之下,從各光源32Aa、32Ba發出的光係分別導至聚光透鏡(圖示略),並在此處作成平行光後,經由液晶快門32Ab、32Bb導至投影透鏡(圖示略),投影到金屬遮罩20作為圖案光。再者,本實施形態中,係施行液晶快門32Ab、32Bb的切換控制,使各圖案光的相位分別逐一以4分之1節距移位。Under the above-mentioned configuration, the light systems emitted from the light sources 32Aa, 32Ba are respectively guided to the condenser lens (not shown in the figure), and after being made into parallel light here, they are guided to the projection lens (not shown in the figure) through the liquid crystal shutters 32Ab, 32Bb. abbreviated), projected onto the metal mask 20 as patterned light. In addition, in this embodiment, switching control of the liquid crystal shutters 32Ab and 32Bb is performed so that the phases of the respective pattern lights are shifted one by one at a quarter pitch.

另外,透過使用液晶快門32Ab、32Bb作為格子,可以照射出接近理想正弦波的圖案光。依據這種構成,使三維計量的量測解析度能夠提升。此外,還可以電性方式執行圖案光的相位移位控制,而謀求裝置的精簡化。In addition, by using the liquid crystal shutters 32Ab and 32Bb as grids, it is possible to irradiate pattern light close to an ideal sine wave. According to this configuration, the measurement resolution of the three-dimensional metrology can be improved. In addition, the phase shift control of the pattern light can also be performed electrically, and the simplification of the device can be achieved.

攝像機32C具有:CCD(電荷耦合元件,Charge Coupled Device)型影像感測器或CMOS(互補金氧半導體,Complementary Metal Oxide Semiconductor)型影像感測器等拍攝元件;及使金屬遮罩20的影像成像在該拍攝元件的光學系統(透鏡單元或光圈等);其光軸則配置成順沿上下方向(Z軸方向)。當然,拍攝元件並非限定在這些元件,也可採用其他拍攝元件。Camera 32C has: CCD (Charge Coupled Device, Charge Coupled Device) type image sensor or CMOS (complementary metal oxide semiconductor, Complementary Metal Oxide Semiconductor) type image sensor and other shooting elements; and the image imaging of metal mask 20 In the optical system (lens unit or aperture, etc.) of the photographing element, its optical axis is arranged along the vertical direction (Z-axis direction). Of course, the imaging elements are not limited to these elements, and other imaging elements may also be used.

攝像機32C係藉控制裝置33(後述的攝像機控制部73)施以驅動控制。更詳言之,控制裝置33可一邊採取和藉兩照明裝置32A、32B的照射處理同步,一邊執行藉攝像機32C的拍攝處理。藉此,從第1照明裝置32A或第2照明裝置32B照射的光中,在金屬遮罩20反射的光,會被攝像機32C拍攝而生成影像資料。The camera 32C is driven and controlled by the control device 33 (camera control unit 73 described later). More specifically, the control device 33 can execute the photographing process by the camera 32C while synchronizing with the illumination process by the two lighting devices 32A and 32B. Thereby, among the light irradiated from the 1st illuminating device 32A or the 2nd illuminating device 32B, the light reflected by the metal mask 20 is captured by the camera 32C, and an image data is generated.

依此方式,藉攝像機32C拍攝及生成的影像資料,在該攝像機32C的內部變換成數位訊號後,可以數位訊號的形態轉送並記憶在控制裝置33(後述的影像取得部74)。接著,控制裝置33(後述的資料處理部75等)會根據該影像資料而實施後述的各種影像處理或運算處理等。In this way, the image data captured and generated by the camera 32C is converted into a digital signal inside the camera 32C, and can be transferred and stored in the control device 33 (the image acquisition unit 74 described later) in the form of a digital signal. Next, the control device 33 (the data processing unit 75 and the like to be described later) executes various image processing and calculation processing described later based on the image data.

控制裝置33係由執行預定之運算處理的CPU(中央處理單元,Central Processing Unit)、記憶各種程式或固定值資料等的ROM(唯讀記憶體,Read Only Memory)、執行各種運算處理之際將各種資料暫時記憶的RAM(隨機存取記憶體,Random Access Memory)、及包含這些周邊迴路的電腦所構成。The control device 33 is composed of a CPU (Central Processing Unit, Central Processing Unit) that performs predetermined arithmetic processing, a ROM (Read Only Memory, Read Only Memory) that stores various programs or fixed value data, etc., and performs various arithmetic processing. It consists of RAM (Random Access Memory, Random Access Memory) which temporarily stores various data, and a computer including these peripheral circuits.

其次,控制裝置33係在CPU依照各種程式執行動作,藉此作為後述的主控制部71、照明控制部72、攝像機控制部73、影像取得部74、資料處理部75、移動機構控制部76、學習部77、檢查部78、搬送機構控制部79等各種功能部而發揮功能。Next, the control device 33 is executed by the CPU according to various programs, thereby serving as the main control unit 71, lighting control unit 72, camera control unit 73, image acquisition unit 74, data processing unit 75, moving mechanism control unit 76, Various functional units such as the learning unit 77, the inspection unit 78, and the transport mechanism control unit 79 function.

但,上述各種功能部係透過上述CPU、ROM、RAM等各種硬體搭配運作而實現,不必明確區別以硬體式或軟體式實現的功能,這些功能的一部分或全部可藉IC等硬體電路來實現。However, the above-mentioned various functions are realized through the operation of various hardware such as the above-mentioned CPU, ROM, and RAM, and it is not necessary to clearly distinguish functions realized by hardware or software. Some or all of these functions can be implemented by hardware circuits such as ICs. accomplish.

再者,控制裝置33中設有:由鍵盤或滑鼠、觸控板等構成的輸入部55、液晶顯示器等具有顯示畫面功能的顯示部56、可記憶各種資料或程式、運算結果等的記憶部57、可和外部進行各種資料之收發訊的通訊部58等。Furthermore, the control device 33 is provided with: an input unit 55 composed of a keyboard, a mouse, a touch panel, etc., a display unit 56 with a display screen function such as a liquid crystal display, and a memory that can store various data or programs, calculation results, etc. Part 57, the communication part 58 etc. which can send and receive various data with the outside.

茲就構成控制裝置33的上述各種功能部詳加說明。主控制部71係為掌管金屬遮罩檢查裝置30之整體控制的功能部,以可和照明控制部72或攝像機控制部73等其他功能部的各種訊號進行接收發送的方式構成。Hereinafter, the various functional units constituting the control device 33 will be described in detail. The main control unit 71 is a functional unit in charge of the overall control of the metal mask inspection device 30 , and is configured to receive and send various signals from other functional units such as the lighting control unit 72 and the camera control unit 73 .

照明控制部72係為驅動控制第1照明裝置32A及第2照明裝置32B的功能部。The lighting control unit 72 is a functional unit for driving and controlling the first lighting device 32A and the second lighting device 32B.

攝像機控制部73為驅動控制攝像機32C的功能部,其係根據來自主控制部71的指令訊號來控制拍攝時機等。The camera control unit 73 is a functional unit that drives and controls the camera 32C, and controls shooting timing and the like based on command signals from the main control unit 71 .

影像取得部74為將藉攝像機32C拍攝取得的影像資料輸入的功能部。The video acquisition unit 74 is a functional unit for inputting video data captured by the camera 32C.

資料處理部75係為對藉影像取得部74取入的影像資料施以預定的影像處理,或使用該影像資料實施三維量測處理的功能部。例如,在後述的學習處理中,生成要作為深層神經網路90(以下簡稱為「神經網路90」,參照圖6。)之學習用的學習資料的學習用形狀資料(學習用的三維形狀資料)。此外,後述的檢查處理中,係生成檢查用形狀資料(檢查用的三維形狀資料)。The data processing unit 75 is a functional unit that performs predetermined image processing on the image data acquired by the image acquisition unit 74 or performs three-dimensional measurement processing using the image data. For example, in the learning process described later, the shape data for learning (three-dimensional shape data for learning) to be used as learning data for learning of the deep neural network 90 (hereinafter simply referred to as "neural network 90", see Fig. 6 ) is generated. material). In addition, in the inspection process described later, shape data for inspection (three-dimensional shape data for inspection) are generated.

移動機構控制部76為驅動控制X軸移動機構32D及Y軸移動機構32E的功能部,其係根據來自主控制部71的指令訊號控制檢查單元32的位置。The moving mechanism control unit 76 is a functional unit that drives and controls the X-axis moving mechanism 32D and the Y-axis moving mechanism 32E, and controls the position of the inspection unit 32 according to the command signal from the main control unit 71 .

學習部77為使用學習資料等進行神經網路90的學習並構築作為辨別手段的AI(人工智慧,Artificial Intelligence)模型100的功能部。The learning unit 77 is a functional unit that learns the neural network 90 using learning materials and constructs an AI (Artificial Intelligence) model 100 as a discrimination means.

另外,本實施形態中的AI模型100,係如後述方式將無異常的未使用的金屬遮罩20的被檢查部EA[參照圖10(a)等]所涉及的形狀資料作為學習資料,使神經網路90作深度學習(Deep Learning)而構築的生成模型,具有所謂的自動編碼器(自編碼器)的構造。In addition, the AI model 100 in this embodiment uses the shape data related to the inspected portion EA [see FIG. The generative model constructed by the neural network 90 for deep learning (Deep Learning) has a so-called autoencoder (autoencoder) structure.

茲參照圖6就神經網路90的構造加以說明。圖6為概念性顯示神經網路90之構造的示意圖。如圖6所示,神經網路90係具有:作為編碼部的編碼器部91,從所輸入的形狀資料GA擷取特徵量(潛在變數)TA;及作為解碼部的解碼器部92,從該特徵量TA重建(reconstitution)形狀資料GB,而構成卷積型自動編碼器(CAE:Convolutional Auto-Encoder)的構造。The structure of the neural network 90 will now be described with reference to FIG. 6 . FIG. 6 is a schematic diagram conceptually showing the structure of the neural network 90 . As shown in FIG. 6 , the neural network 90 has: an encoder unit 91 as an encoding unit, which extracts a feature quantity (latent variable) TA from the input shape data GA; and a decoder unit 92 as a decoder unit, which extracts the The feature amount TA reconstructs (reconstitutes) the shape data GB to form a structure of a convolutional auto-encoder (CAE: Convolutional Auto-Encoder).

卷積型自動編碼器之構造為公知技術,其詳細說明雖已省略,但編碼器部91具有複數個卷積層(Convolution Layer)93,在各卷積層93中,使用複數個過濾器(核心部分)94對輸入資料進行折疊運算的結果係作為下一層的輸入資料而輸出。同樣的,解碼器部92具有複數個反卷積層(Deconvolution Layer)95,在各反卷積層95中,對輸入資料使用複數個過濾器(核心部分)96進行反卷積型運算執行的結果係作為下一層的輸入資料而輸出。再者,後述的學習處理中,各過濾器94、96的權重(參數)可予以更新。The structure of a convolutional autoencoder is a well-known technology, and its detailed description is omitted, but the encoder unit 91 has a plurality of convolution layers (Convolution Layer) 93, and in each convolution layer 93, a plurality of filters (core part) are used. ) 94 The result of performing the folding operation on the input data is output as the input data of the next layer. Similarly, the decoder unit 92 has a plurality of deconvolution layers (Deconvolution Layer) 95, and in each deconvolution layer 95, the result of performing a deconvolution type operation on the input data using a plurality of filters (core parts) 96 is output as input to the next layer. In addition, in the learning process mentioned later, the weight (parameter) of each filter 94,96 can be updated.

檢查部78係為對金屬遮罩20的被檢查部EA有無異常進行檢查的功能部。本實施形態中,如圖9(a)、(b)所示,屬於金屬遮罩20之基板抵接面側的背面201側之1個開口部21的周邊部分預定範圍係設定為1個被檢查部EA。意即,在金屬遮罩20之背面201可設定複數個被檢查部EA。圖9(a)係為顯示從表面202側觀看的開口部21及其周邊部分之金屬遮罩20的局部放大俯視圖。圖9(b)為圖9(a)之A-A線的剖面圖。另外,圖9(a)之開口部21的周邊部分(表面202)中附加有散點花樣,俾易於判別該範圍。The inspection unit 78 is a functional unit that inspects the presence or absence of an abnormality in the inspected portion EA of the metal mask 20 . In this embodiment, as shown in FIG. 9(a) and (b), the predetermined range of the peripheral portion of one opening 21 on the back side 201 side of the substrate contact side of the metal mask 20 is set to be one Check Ministry EA. That is, a plurality of inspected parts EA can be set on the back surface 201 of the metal mask 20 . FIG. 9( a ) is a partial enlarged plan view of the metal mask 20 showing the opening 21 and its peripheral portion viewed from the surface 202 side. Fig. 9(b) is a sectional view of line A-A of Fig. 9(a). In addition, a scatter pattern is added to the peripheral portion (surface 202) of the opening 21 in FIG. 9( a ), so that the range can be easily distinguished.

搬送機構控制部79為驅動控制搬送機構31的功能部,其係根據來自主控制部71的指令訊號來控制金屬遮罩20的位置。The transport mechanism control unit 79 is a functional unit that drives and controls the transport mechanism 31 , and controls the position of the metal mask 20 according to the instruction signal from the main control unit 71 .

記憶部57係由HDD(硬碟機,Hard Disk Drive)或SSD(固態機,Solid State Drive)等所構成,具有將例如AI模型100(神經網路90及藉其學習而獲得的學習資訊)加以記憶的預定記憶領域。此種記憶領域係構成本實施形態中的模型儲存手段。The memory unit 57 is composed of HDD (hard disk drive, Hard Disk Drive) or SSD (solid state machine, Solid State Drive), etc., and has, for example, the AI model 100 (the neural network 90 and the learning information obtained by learning it) A predetermined area of memory to be memorized. This memory area constitutes the model storage means in this embodiment.

通訊部58具備例如依據有線LAN(區域網路,Local Area Network)或無線LAN等通訊規格的無線通訊介面等,構成為可將各種資料和外部進行收發訊。The communication unit 58 includes, for example, a wireless communication interface conforming to communication standards such as wired LAN (Local Area Network) or wireless LAN, and is configured to transmit and receive various data to and from the outside.

接著,參照圖7的流程圖說明藉金屬遮罩檢查裝置30執行的神經網路90的學習處理。Next, the learning process of the neural network 90 executed by the metal mask inspection device 30 will be described with reference to the flowchart of FIG. 7 .

首先,作業人員要準備無異常(不具後述的各種異常部Q)且未使用的金屬遮罩20。此處所準備的金屬遮罩20較佳為具有和作為檢查對象的金屬遮罩20相同形狀的開口部21。但,金屬遮罩20的厚度或材質、開口部21的大小或配置布局等不必具有同一性,以依據多樣種類的學習資料學習者,在泛用性方面較佳。First, the operator prepares an unused metal mask 20 that has no abnormality (does not have various abnormal parts Q described later). The metal mask 20 prepared here preferably has an opening 21 having the same shape as the metal mask 20 to be inspected. However, the thickness and material of the metal mask 20 , the size and layout of the opening 21 do not have to be identical, so that learners can learn from various types of learning materials, which is better in terms of versatility.

此外,作業人員係在將無前述異常的未使用金屬遮罩20配置在金屬遮罩檢查裝置30的預定檢查位置後,使主控制部71執行預定的學習程式。In addition, the operator causes the main control unit 71 to execute a predetermined learning program after arranging the unused metal mask 20 without the aforementioned abnormality at a predetermined inspection position of the metal mask inspection device 30 .

根據預定的學習程式的執行,開始學習處理時,主控制部71首先係在步驟S101中進行用以實施神經網路90之學習的前處理。When starting the learning process based on the execution of a predetermined learning program, the main control unit 71 first performs preprocessing for implementing learning of the neural network 90 in step S101.

該前處理中,係施行與後述的檢查處理相關的影像資料取得處理(步驟S301)及三維形狀資料取得處理(步驟S302)同樣的處理。另外,有關這些處理的詳細內容將陳述於後,故在此處作簡單說明。In this preprocessing, the same processing as the image data acquisition processing (step S301 ) and the three-dimensional shape data acquisition processing (step S302 ) related to the inspection processing described later is performed. In addition, the details of these processes will be described later, so they will be briefly described here.

首先,針對金屬遮罩20之背面201側的預定檢查範圍,一邊使照射自第1照明裝置32A的第1圖案光之相位變化,一邊在相位不同的第1圖案光下進行4次的拍攝處理後,一邊使照射自第2照明裝置32B的第2圖案光的相位變化,一邊在相位不同的第2圖案光之下進行4次的拍攝處理,取得共計8種的區域影像資料。First, with respect to the predetermined inspection range on the rear surface 201 side of the metal mask 20 , while changing the phase of the first pattern light irradiated from the first illuminating device 32A, imaging processing is performed four times under the first pattern light having different phases. Thereafter, while changing the phase of the second patterned light irradiated from the second illuminating device 32B, imaging processing is performed four times under the second patterned light with different phases, and a total of eight types of area image data are obtained.

然後,以上述各圖案光之下分別拍攝的4套區域影像資料為基礎,利用公知的相移法,施行包含有複數個被檢查部EA(開口部21)的預定檢查範圍的三維形狀量測,且將量測結果(區域形狀資料)記憶在記憶部57。Then, on the basis of the 4 sets of area image data captured under each of the above-mentioned patterned lights, the three-dimensional shape measurement of the predetermined inspection range including a plurality of inspected parts EA (openings 21) is carried out by using the known phase shift method , and the measurement result (area shape data) is stored in the memory unit 57 .

另外,上述一系列的處理,係在取得包含和所需數量的被檢查部EA(開口部21的周邊部分)相關的形狀資料的區域形狀資料作為學習資料之前,係一面在金屬遮罩20的檢查範圍內移動,一面反覆進行。In addition, the above-mentioned series of processing is performed on the side of the metal mask 20 before obtaining the area shape data including the shape data related to the required number of inspected parts EA (peripheral parts of the opening 21) as learning data. Move within the inspection range, while doing it repeatedly.

在步驟S101中,取得包含和學習所需數量的被檢查部EA相關的形狀資料的區域形狀資料時,在接下來的步驟S102中,根據來自主控制部71的指令,學習部77會準備未學習神經網路90。例如,將預先儲存於記憶部57等的神經網路90讀出。或者,依據將儲存於記憶部57等的網路構成資訊(例如,神經網路的層數或各層的節點數等)來構築神經網路90。In step S101, when the area shape data including the shape data related to the examined part EA required for learning is obtained, in the next step S102, according to the instruction from the main control part 71, the learning part 77 will prepare Learning Neural Networks 90. For example, the neural network 90 previously stored in the memory unit 57 or the like is read out. Alternatively, the neural network 90 is constructed based on network configuration information (for example, the number of layers of the neural network, the number of nodes in each layer, etc.) to be stored in the memory unit 57 or the like.

步驟S103中,係取得作為學習資料的學習用形狀資料(學習用的三維形狀資料)。具體而言,根據來自主控制部71的指令,資料處理部75會根據在步驟S101中記憶在記憶部57的區域形狀資料,從該區域形狀資料所包含的多數個被檢查部EA中擷取1個被檢查部EA,而取得和該被檢查部EA相關的形狀資料作為1個學習用形狀資料。然後,將該學習用形狀資料向學習部77輸出。意即,僅有無異常之未使用且和金屬遮罩20的被檢查部EA相關的形狀資料用作為學習資料(學習用形狀資料)。In step S103, shape data for learning (three-dimensional shape data for learning) are acquired as learning data. Specifically, according to the instruction from the main control unit 71, the data processing unit 75 will extract the area shape data from the plurality of inspected parts EA included in the area shape data based on the area shape data stored in the memory unit 57 in step S101. One inspected part EA is used, and the shape data related to the inspected part EA is acquired as one shape data for learning. Then, the shape data for learning is output to the learning unit 77 . That is, only unused shape data related to the inspected portion EA of the metal mask 20 without abnormality is used as learning data (shape data for learning).

在步驟S104中,係取得重建形狀資料。具體而言,根據來自主控制部71的指令,學習部77會將步驟S103中取得的學習用形狀資料作為輸入資料,傳給神經網路90的輸入層,藉此取得從神經網路90的輸出層所輸出的重建形狀資料。In step S104, the reconstructed shape data is obtained. Specifically, according to the instruction from the main control unit 71, the learning unit 77 will send the shape data for learning obtained in step S103 as input data to the input layer of the neural network 90, thereby obtaining the shape data from the neural network 90. The reconstructed shape data output by the output layer.

接下來的步驟S105中,學習部77會將在步驟S103中取得的學習用形狀資料、和步驟S104中藉神經網路90輸出的重建形狀資料相比較,判定其誤差是否充分夠小(是否在預定的臨界值以下)。In the following step S105, the learning part 77 will compare the shape data for learning obtained in step S103 with the reconstructed shape data output by the neural network 90 in step S104, and determine whether the error is sufficiently small (whether it is within below a predetermined threshold).

在此處,其誤差夠小的情況中,將神經網路90及其學習資訊(後述的更新後參數等)作為AI模型100儲存在記憶部57,並結束本學習處理。Here, if the error is sufficiently small, the neural network 90 and its learning information (updated parameters described later, etc.) are stored in the memory unit 57 as the AI model 100, and this learning process ends.

另一方面,其誤差不夠小的情況中,在步驟S106中,進行網路更新處理(神經網路90的學習)後,再返回步驟S103,重覆上述的一連串處理。On the other hand, if the error is not small enough, in step S106, the network update process (learning of the neural network 90) is performed, and then returns to step S103 to repeat the series of processes described above.

具體而言,在步驟S105的網路更新處理中,係使用例如誤差倒傳播法(Backpropagation)等公知的學習運算法,為了將神經網路90中的上述各過濾器94、96的權重(參數)更新為更適切者,以使表示學習用形狀資料與重建形狀資料之差分的損失函數極力縮小。另外,亦可利用例如BCE(二值化交叉熵,Binary Cross-entropy)作為損失函數。Specifically, in the network update process of step S105, known learning algorithms such as error backpropagation (Backpropagation) are used, in order to set the weights (parameters) of the above-mentioned filters 94, 96 in the neural network 90 to ) is updated to a more appropriate one so that the loss function representing the difference between the learning shape data and the reconstructed shape data is minimized. In addition, for example, BCE (Binary Cross-entropy) may also be used as the loss function.

透過將這些處理反覆施行幾遍,在神經網路90中,學習用形狀資料與重建形狀資料的誤差會變極小,得以輸出更正確的重建形狀資料。By repeating these processes several times, in the neural network 90, the error between the shape data for learning and the reconstructed shape data becomes extremely small, and more accurate reconstructed shape data can be output.

接著,參照圖8的流程圖說明藉金屬遮罩檢查裝置30執行的金屬遮罩檢查處理。但,圖8所示的檢查處理係為依金屬遮罩20的每個預定檢查範圍執行的處理。Next, the metal mask inspection process executed by the metal mask inspection device 30 will be described with reference to the flowchart of FIG. 8 . However, the inspection process shown in FIG. 8 is performed for each predetermined inspection range of the metal mask 20 .

將金屬遮罩檢查裝置30搬入金屬遮罩20,並定位在預定的檢查位置時,即根據預定的檢查程式的執行,開始檢查處理。When the metal mask inspection device 30 is carried into the metal mask 20 and positioned at a predetermined inspection position, the inspection process starts according to the execution of a predetermined inspection program.

檢查處理開始時,首先,係在步驟S301執行影像資料取得處理。本實施形態中,係在和金屬遮罩20之背面201側的各檢查範圍相關的檢查中,使照射自第1照明裝置32A的第1圖案光的相位變化,在相位不同的第1圖案光下執行4次拍攝處理後,一面使照射自第2照明裝置32B的第2圖案光的相位變化,一面在相位不同的第2圖案光之下進行4次的拍攝處理,取得合計8套的影像資料。詳細說明如下。When the inspection process is started, first, the image data acquisition process is executed in step S301. In this embodiment, in the inspection related to each inspection range on the back surface 201 side of the metal mask 20, the phase of the first patterned light irradiated from the first illuminating device 32A is changed, and the first patterned light with a different phase After executing the photographing process four times, while changing the phase of the second pattern light irradiated from the second illumination device 32B, the photographing process is performed four times under the second pattern light with different phases, and a total of 8 sets of images are obtained. material. The details are as follows.

如上所述,朝金屬遮罩檢查裝置30搬入的金屬遮罩20定位固定在預定的檢查位置時,依據來自主控制部71的指令,移動機構控制部76首先會驅動控制X軸移動機構32D及Y軸移動機構32E,使檢查單元32移動,將攝像機32C的拍攝視角(拍攝範圍)對準金屬遮罩20之背面201的預定檢查範圍。As described above, when the metal mask 20 carried into the metal mask inspection device 30 is positioned and fixed at a predetermined inspection position, according to the instruction from the main control unit 71, the moving mechanism control unit 76 first drives and controls the X-axis moving mechanism 32D and The Y-axis moving mechanism 32E moves the inspection unit 32 to align the shooting angle (shooting range) of the camera 32C with the predetermined inspection range of the back surface 201 of the metal mask 20 .

並且,照明控制部72會將控制兩照明裝置32A、32B的液晶快門32Ab、32Bb進行切換,將形成在該兩液晶快門32Ab、32Bb的第1格子及第2格子的位置設定在預定的基準位置。In addition, the lighting control unit 72 switches the liquid crystal shutters 32Ab and 32Bb for controlling the two lighting devices 32A and 32B, and sets the positions of the first grid and the second grid formed on the two liquid crystal shutters 32A and 32Bb at predetermined reference positions. .

第1格子及第2格子的切換設定完成時,照明控制部72會使第1照明裝置32A的第1光源32Aa點亮,將第1圖案光照射,並且,攝像機控制部73會驅動控制攝像機32C,執行在該第1圖案光之下的第1次拍攝處理。另外,藉拍攝處理生成的影像資料係隨時被取入影像取得部74(以下相同)。依據這種構成,即可取得包含複數個被檢查部EA(開口部21)的檢查範圍的區域影像資料。When the switching setting of the first grid and the second grid is completed, the lighting control unit 72 lights up the first light source 32Aa of the first lighting device 32A to irradiate the first pattern light, and the camera control unit 73 drives and controls the camera 32C. , execute the first shooting process under the first pattern light. In addition, the video data generated by the photographing process is taken into the video acquisition unit 74 at any time (the same applies hereinafter). According to such a configuration, the area image data of the inspection range including a plurality of inspected parts EA (openings 21 ) can be obtained.

然後,照明控制部72係在第1圖案光之下的第1次拍攝處理結束之同時,熄滅第1照明裝置32A的第1光源32Aa,並且執行第1液晶快門32Ab的切換處理。具體而言,係將形成第1液晶快門32Ab的第1格子的位置從前述基準位置向第1圖案光的相位偏移4分之1節距(90°)的第2位置進行切換設定。Then, the lighting control unit 72 turns off the first light source 32Aa of the first lighting device 32A and executes switching processing of the first liquid crystal shutter 32Ab at the same time as the first imaging process under the first pattern light is completed. Specifically, the position of the first lattice forming the first liquid crystal shutter 32Ab is switched from the reference position to the second position where the phase of the first pattern light is shifted by 1/4 pitch (90°).

第1格子的切換設定完成時,照明控制部72會使第1照明裝置32A之光源32Aa點亮,照射第1圖案光,同時,攝像機控制部73會驅動控制攝像機32C,在該第1圖案光之下執行第2次拍攝處理。然後,透過反覆執行同樣的處理,取得相位逐次相差90°的第1圖案光之下的4套區域影像資料。When the switch setting of the first grid is completed, the lighting control unit 72 will light the light source 32Aa of the first lighting device 32A to illuminate the first pattern light. Next, the second shooting process is executed. Then, by repeatedly performing the same process, four sets of image data of the region under the first pattern light with a phase difference of 90° successively are obtained.

接著,照明控制部72會使第2照明裝置32B的第2光源32Ba點亮,照射第2圖案光,並且以攝像機控制部73驅動控制攝像機32C,在該第2圖案光之下進行第1次的拍攝處理。Next, the lighting control unit 72 turns on the second light source 32Ba of the second lighting device 32B to irradiate the second pattern light, and drives and controls the camera 32C with the camera control unit 73 to carry out the first lighting operation under the second pattern light. shooting processing.

然後,在第2圖案光之下的第1次拍攝處理結束的同時,照明控制部72會將第2照明裝置32B的第2光源32Ba熄滅,同時執行第2液晶快門32Bb的切換處理。具體而言,係將形成於第2液晶快門32Bb的第2格子的位置,從前述基準位置向第2圖案光的相位偏移4分之1節距(90°)的第2位置進行切換設定。Then, when the first imaging process under the second pattern light ends, the illumination control unit 72 turns off the second light source 32Ba of the second illumination device 32B, and executes the switching process of the second liquid crystal shutter 32Bb. Specifically, the position of the second lattice formed on the second liquid crystal shutter 32Bb is switched from the aforementioned reference position to the second position where the phase of the second pattern light is shifted by 1/4 pitch (90°). .

第2格子的切換設定完成時,照明控制部72會使第2照明裝置32B之光源32Ba點亮,並照射第2圖案光,同時,攝像機控制部73會驅動控制攝像機32C,並執行在該第2圖案光之下的第2次拍攝處理。以後,透過反覆進行同樣的處理,取得相位逐次相差90°的第2圖案光之下的4種區域影像資料。When the switching setting of the second grid is completed, the lighting control part 72 will light the light source 32Ba of the second lighting device 32B, and illuminate the second pattern light. 2 Processing of the second shot under patterned light. Thereafter, by repeating the same process, four kinds of area image data under the second pattern light whose phases successively differ by 90° are obtained.

在下一步驟S302中,執行三維形狀資料的取得處理。具體而言,依據來自主控制部71的指令,資料處理部75會在上述步驟S301中依據各圖案光之下分別拍攝的4種區域影像資料,透過公知的相移法,進行包含複數個被檢查部EA(開口部21)的預定檢查範圍的三維形狀量測,且將相關的量測結果(區域形狀資料)記憶在記憶部57。依據執行相關處理的功能,而構成本實施形態的形狀資料取得手段。另外,本實施形態中,由於是從2個方向照射圖案光來進行三維形狀的量測,故可防止未照射圖案光之陰影部分的產生。In the next step S302, the acquisition process of the three-dimensional shape data is performed. Specifically, according to the instruction from the main control unit 71, the data processing unit 75 will, in the above step S301, carry out a process including a plurality of subject areas through a known phase shift method based on the four kinds of area image data captured under each pattern light in the above-mentioned step S301. The three-dimensional shape of the predetermined inspection range of the inspection part EA (opening part 21 ) is measured, and the related measurement results (area shape data) are stored in the memory part 57 . The shape data acquisition means of this embodiment is constituted by the function of executing related processing. In addition, in the present embodiment, since the three-dimensional shape is measured by irradiating the patterned light from two directions, it is possible to prevent the generation of the shadow portion where the patterned light is not irradiated.

接著,在步驟S303中,係取得和各被檢查部EA相關的檢查用形狀資料(檢查用的三維形狀資料)。Next, in step S303, shape data for inspection (three-dimensional shape data for inspection) related to each inspected portion EA is acquired.

具體而言,首先,依據來自主控制部71的指令,資料處理部75會依據在上述步驟S302取得的和預定檢查範圍相關的區域形狀資料,特定並擷取該區域形狀資料所包含的全部複數個被檢查部EA。Specifically, first, according to the instruction from the main control unit 71, the data processing unit 75 will specify and retrieve all the complex numbers contained in the area shape data according to the area shape data related to the predetermined inspection range obtained in the above step S302. The inspected department EA.

繼之,將這些分別編號並登記作為被檢查部EA涉及的原形狀資料。本處理中,例如取得圖10(a)所示之無異常的被檢查部EA涉及的原形狀資料、或如圖10(b)~(e)所示之有某些異常的被檢查部EA涉及的原形狀資料等。Then, these are individually numbered and registered as original shape data related to the inspected portion EA. In this process, for example, the original shape data related to the non-abnormal inspected part EA as shown in Fig. 10(a), or the inspected part EA with some abnormalities as shown in Fig. 10(b) to (e) is acquired. The original shape data involved, etc.

在步驟S304中,實施重建處理(重建形狀資料取得處理)。利用實施本處理的功能,而構成本實施形態中的重建形狀資料取得手段。In step S304, reconstruction processing (reconstruction shape data acquisition processing) is performed. The reconstructed shape data acquisition means in this embodiment is constituted by the function of performing this processing.

具體而言,依據來自主控制部71的指令,檢查部78會將步驟S303取得的預定號碼(例如第001號)的被檢查部EA涉及的原形狀資料輸入AI模型100的輸入層。接著,將藉AI模型100重建並從輸出層輸出的形狀資料,取得作為前述預定號碼(例如第001號)之被檢查部EA涉及的重建形狀資料,同時,將該重建形狀資料和同一編號的原形狀資料建立關連並加以記憶。依此方式,本處理中,針對在步驟S303中編號登記的全部被檢查部EA,可取得重建形狀資料。Specifically, according to an instruction from the main control unit 71 , the inspection unit 78 inputs the original shape data related to the inspected part EA of a predetermined number (for example, No. 001) obtained in step S303 into the input layer of the AI model 100 . Next, the shape data reconstructed by the AI model 100 and output from the output layer is obtained as the reconstructed shape data related to the inspected part EA of the aforementioned predetermined number (for example, No. 001), and at the same time, the reconstructed shape data and the same number The original shape data is associated and memorized. In this manner, in this process, reconstructed shape data can be acquired for all the parts to be inspected EA whose numbers are registered in step S303.

在此處,AI模型100將如圖10(a)所示的無異常之被檢查部EA相關的原形狀資料輸入時是當然的,即使是在將具有如圖10(b)~(e)所示之異常的被檢查部EA涉及的原形狀資料輸入的情況,透過以上述方式進行學習,即可將如圖10(a)所示的無異常被檢查部EA涉及的形狀資料輸出作為重建形狀資料。Here, it is natural for the AI model 100 to input the original shape data related to the inspected part EA without abnormality as shown in FIG. In the case of the input of the original shape data related to the abnormal inspected part EA as shown, by learning in the above-mentioned manner, the shape data related to the non-abnormal inspected part EA as shown in Figure 10 (a) can be output as a reconstructed shape data.

步驟S305中,係執行良否的判定處理。具體而言,依據來自主控制部71的指令,檢查部78首先會將同一號碼的原形狀資料和重建形狀資料相比較,並擷取兩形狀資料的差分。藉由實施此種處理的功能,構成本實施形態中的比較手段。In step S305, a judgment process of good or bad is executed. Specifically, according to the command from the main control unit 71 , the checking unit 78 first compares the original shape data and the reconstructed shape data of the same number, and extracts the difference between the two shape data. The comparison means in this embodiment is constituted by the function of performing such processing.

接著,檢查部78會判定兩形狀資料的差分,亦即,相當於異常部Q的部分是否大於預定臨界值。在此處,兩影像資料的差分較預定的臨界值大時,即判定為「有異常」。Next, the inspection unit 78 determines whether the difference between the two shape data, that is, the part corresponding to the abnormal part Q is greater than a predetermined threshold. Here, when the difference between the two image data is larger than a predetermined critical value, it is determined as "abnormal".

例如,如圖9(a)、(b)所示,金屬遮罩20之背面201側的被檢查部EA存在有異常部Q的情況中,在該異常部Q之深度d及寬度w的兩判定項目分別超過預定的臨界值的情況時,係判定為「有異常」。For example, as shown in FIGS. 9( a ) and ( b ), when there is an abnormal part Q in the inspection part EA on the back surface 201 side of the metal mask 20 , the difference between the depth d and the width w of the abnormal part Q When each judgment item exceeds a predetermined threshold value, it is judged to be "abnormal".

依據這種構成,例如圖10(b)所示,金屬遮罩20之背面201側的開口部21周緣的倒角部Q1藉由過多的電解研磨處理等而變得過於圓弧時,該倒角部Q1也會被視為異常部Q。According to this configuration, for example, as shown in FIG. 10( b ), when the chamfered portion Q1 around the opening 21 on the back surface 201 side of the metal mask 20 becomes too round due to excessive electrolytic polishing, the chamfered The corner Q1 is also regarded as an abnormal part Q.

同樣地,如圖10(c)所示,被檢查部EA存在有與開口部21相連的凹陷或切痕等傷口Q2時,或如圖10(d)所示,開口部21的周緣產生變形Q3時,係依其程度而視為異常部Q。Similarly, as shown in FIG. 10( c ), when there is a wound Q2 such as a depression or a notch connected to the opening 21 in the inspected portion EA, or as shown in FIG. 10( d ), the periphery of the opening 21 is deformed. In case of Q3, it is regarded as an abnormal part Q according to its degree.

另一方面,兩影像資料的差分較預定的臨界值小的情況中,係判定為「無異常」。透過執行這些判定的功能,構成本實施形態中的判定手段。On the other hand, when the difference between the two image data is smaller than a predetermined threshold value, it is determined as "no abnormality". The judging means in this embodiment is constituted by performing these judging functions.

在此處,檢查部78係在針對區域形狀資料(金屬遮罩20的預定檢查範圍)所包含的全部被檢查部EA判定為「無異常」的情況中,將該區域形狀資料相關的檢查範圍判定為「良好」,同時將該結果記憶在記憶部57,並結束本處理。Here, when the inspection unit 78 determines that all the inspected parts EA included in the area shape data (planned inspection range of the metal mask 20) are "no abnormality", the inspection range related to the area shape data It is judged as "good", and the result is stored in the storage unit 57, and this process ends.

再一方面,區域形狀資料(金屬遮罩20的預定檢查範圍)所包含的複數個被檢查部EA之中,被判定為「有異常」的被檢查部EA僅存在1個時,係將該區域形狀資料相關的檢查範圍判定為「不良」並將該結果記憶在記憶部57,並結束本處理。On the other hand, if there is only one inspected part EA judged to be "abnormal" among the plurality of inspected parts EA included in the area shape data (planned inspection range of the metal mask 20), the The inspection range related to the area shape data is judged to be "defective", the result is stored in the storage unit 57, and this process ends.

接著,金屬遮罩檢查裝置30針對金屬遮罩20之背面201的所有檢查範圍執行上述檢查處理的結果,對全部檢查範圍判定為「良好」時,即判定為無異常的金屬遮罩20(判定及格),並經由顯示部56或通訊部58等將其意旨告知作業人員。Next, the metal mask inspection device 30 executes the result of the above-mentioned inspection process for all the inspection ranges of the back surface 201 of the metal mask 20, and when all the inspection ranges are judged to be "good", that is, it is judged that there is no abnormal metal mask 20 (determination pass), and inform the operator of its intention through the display unit 56 or the communication unit 58, etc.

另一方面,金屬遮罩20上的全部檢查範圍中存在有1個被判定為「不良」的檢查範圍時,金屬遮罩檢查裝置30即判定(不及格判定)為有異常的金屬遮罩20,並經由顯示部56或通訊部58等將該意旨告知作業人員。On the other hand, when there is one inspection range judged as "defective" among all the inspection ranges on the metal mask 20, the metal mask inspection device 30 judges (fail judgment) that there is an abnormal metal mask 20. , and notify the operator of this fact via the display unit 56 or the communication unit 58 .

如以上所詳述,本實施形態中,係從金屬遮罩20的表背兩面之中,在焊劑印刷時會成為和印刷基板1抵接的基板抵接面側的背面201側,實施和開口部21周邊部、亦即預定被檢查部EA相關的檢查。As described in detail above, in this embodiment, of the front and back surfaces of the metal mask 20, the back surface 201 side that will be the substrate contact surface side that contacts the printed circuit board 1 during solder printing is implemented and opened. The inspection related to the peripheral part of the part 21 , that is, the planned part to be inspected EA.

藉此,成為印刷時造成膏狀焊劑5之滲透或涶流等原因之與金屬遮罩20之背面201側的開口部21周邊(被檢查部EA)相關的各種異常部Q(Q1~Q4)均可檢測出來。結果,發生印刷不良的情形可獲得抑制。Thereby, various abnormal parts Q (Q1 to Q4) related to the periphery of the opening 21 (the part to be inspected EA) on the back side 201 side of the metal mask 20, which cause penetration or sloshing of the cream solder 5 during printing, etc. can be detected. As a result, occurrence of poor printing can be suppressed.

特別是,本實施形態中,係使用學習神經網路90構築的AI模型100來判定金屬遮罩20的被檢查部EA是否存在異常部Q(Q1~Q4)。依據這種構成,習知技術中難以檢測的微小異常可加以檢測出。In particular, in this embodiment, the AI model 100 constructed using the learning neural network 90 is used to determine whether or not there is an abnormal part Q ( Q1 to Q4 ) in the inspected part EA of the metal mask 20 . According to this constitution, minute abnormalities which were difficult to detect in the conventional art can be detected.

再者,本實施形態中,因為要將拍攝被檢查部EA所得的原形狀資料與依據其原形狀資料重建所得的重建形狀資料作比較,故在相比較的兩形狀資料中,不會有基於屬於檢查對象物之金屬遮罩20側的拍攝條件(例如,金屬遮罩20的配置位置或配置角度、彎曲等)、或金屬遮罩檢查裝置30側的拍攝條件(例如,照明狀態或攝像機32C的畫角等)的差異而產生影響,故可更正確地檢測更微細的異常部Q。Furthermore, in this embodiment, because the original shape data obtained by photographing the inspected part EA will be compared with the reconstructed shape data reconstructed based on the original shape data, there will be no difference between the two compared shape data. Shooting conditions on the side of the metal mask 20 belonging to the inspection object (for example, the arrangement position or arrangement angle of the metal mask 20, bending, etc.), or shooting conditions on the side of the metal mask inspection device 30 (for example, lighting conditions or camera 32C Due to the influence of the difference in the picture angle, etc.), it is possible to more accurately detect the finer abnormal part Q.

另外,在假定進行處於金屬遮罩20之預定位置的預定被檢查部EA(開口部21的周邊部分)相關的檢查之際,需要該被檢查部EA的構成資訊(位置資料或尺寸資料等)作為良否判定基準的構成中,係將例如賈伯資料(Gerber data)等基板設計資訊預先記憶,適當成為取得檢查對象的被檢查部EA的構成資訊,且和該構成資訊比較,同時進行將要成為檢查對象的被檢查部EA的良否判定,因此會有檢查效率降低之虞。而且,金屬遮罩20對檢查位置的定位也須正確進行。In addition, when it is assumed that an inspection is performed on a predetermined inspected portion EA (peripheral portion of the opening 21 ) at a predetermined position of the metal mask 20 , configuration information (position data, dimension data, etc.) of the inspected portion EA is required. In the configuration as the standard of good/failure judgment, board design information such as Gerber data is stored in advance, and the configuration information of the inspected part EA to be inspected is obtained appropriately, and compared with the configuration information, the process to become Because of the good/failure judgment of the inspected portion EA, which is the inspection object, there is a possibility that the inspection efficiency may decrease. Moreover, the positioning of the metal mask 20 to the inspection position must also be performed correctly.

對於此點,若依據本實施形態,因係利用針對被檢查部EA學習的AI模型100,進行各被檢查部EA的檢查的構成,故不必將多數的被檢查部EA各自的構成資訊預先記憶,故在檢查之際,不必參照這些資料,故可謀求檢查效率的提升。In this regard, according to the present embodiment, since the AI model 100 learned for the inspected part EA is used to perform the inspection of each inspected part EA, it is not necessary to store the configuration information of each of the plurality of inspected parts EA in advance. , so it is not necessary to refer to these materials during the inspection, so the inspection efficiency can be improved.

除此之外,本實施形態中,焊劑印刷時係以要作為和印刷基板1抵接的金屬遮罩20的基板抵接面側之背面201朝向下方配置的狀態,從金屬遮罩20的下側藉檢查單元32施行檢查的構成。In addition, in the present embodiment, during solder printing, the back surface 201 of the substrate contact surface side of the metal mask 20 to be in contact with the printed circuit board 1 is arranged downward, and the solder is printed from the bottom of the metal mask 20 . The inspection is performed by the inspection unit 32 .

依據這種構成,即不易受到室內照明等外擾光的影響,可謀求檢查精度的提升。特別是,像利用相移法時,可不易受到微細之亮度變化影響的環境下進行檢查時,更能達到功效。According to this configuration, it is less likely to be affected by external disturbance light such as indoor lighting, and the inspection accuracy can be improved. In particular, it is more effective when inspection can be performed in an environment that is not easily affected by subtle brightness changes, such as when using the phase shift method.

另外,並不限定於上述實施形態的記載內容,例如,也可依下述方式實施。當然,也可為未在下文中例示的其他應用例、變化例。In addition, it is not limited to the description content of the said embodiment, For example, it can implement as follows. Of course, other application examples and modification examples not exemplified below are also possible.

(a)網遮罩的構成並不限定於上述實施形態涉及的金屬遮罩20,也可採用其他的構成。(a) The configuration of the mesh mask is not limited to the metal mask 20 according to the above-mentioned embodiment, and other configurations may be employed.

(a-1)例如,上述實施形態涉及的金屬遮罩20,係由遮罩本體部20a及框架部20b所構成,但非限定於此,也可作成省略框架部20b的構成。(a-1) For example, the metal mask 20 according to the above embodiment is composed of the mask body 20a and the frame 20b, but the present invention is not limited thereto, and the frame 20b may be omitted.

(a-2)上述實施形態涉及的遮罩本體部20a係藉金屬材料形成。但不限於此,作為遮罩本體部20a也可採用例如:在將尼龍製、聚酯製、不銹鋼製等線材編織而成的「紗(篩網)」上塗布感光性乳劑等而形成被覆部,且只有相當於開口部21的部分露出「紗」的類型;在「紗(篩網)」上黏貼形成有開口部21的金屬版而成的複合型製品。(a-2) The mask body part 20a according to the above embodiment is formed of a metal material. However, it is not limited to this, and as the mask body part 20a, for example, a coating part formed by coating a photosensitive emulsion or the like on a "yarn (mesh)" made of nylon, polyester, stainless steel, etc. wire rods may be used. , and only the part corresponding to the opening 21 exposes the "yarn" type; a composite product formed by pasting a metal plate with the opening 21 on the "yarn (screen)".

(b)生產線10等和印刷基板1之製造相關的構成,不限定於上述實施形態,也可採用其他構成。(b) The configuration related to the production of the printed circuit board 1 such as the production line 10 is not limited to the above-described embodiment, and other configurations may be employed.

(b-1)上述實施形態中,係採取將清潔裝置29及金屬遮罩檢查裝置30併設在焊劑印刷機12之附近的構成。但不限於此,也可將清潔裝置及/或金屬遮罩檢查裝置的功能和焊劑印刷機12或焊劑印刷檢查裝置13一體組裝的構成。(b-1) In the above embodiment, the cleaning device 29 and the metal mask inspection device 30 are installed in the vicinity of the solder printing machine 12 together. However, the present invention is not limited thereto, and the functions of the cleaning device and/or the metal mask inspection device may be integrated with the solder printing machine 12 or the solder printing inspection device 13 .

(b-2)清潔裝置29或金屬遮罩檢查裝置30也可採取獨立設置於生產線10等之其它空間的構成。(b-2) The cleaning device 29 or the metal mask inspection device 30 may be independently installed in other spaces such as the production line 10 .

(c)和金屬遮罩檢查裝置30相關的構成,並非限定於上述實施形態,也可採用其他的構成。(c) The configuration related to the metal mask inspection device 30 is not limited to the above-mentioned embodiment, and other configurations may be employed.

例如,上述實施形態中,也可為焊劑印刷時以成為和印刷基板1抵接的金屬遮罩20之基板抵接面側的背面201朝向下方的方式配置,藉檢查單元32從金屬遮罩20的下側實施檢查的構成。For example, in the above-mentioned embodiment, it may be arranged such that the back surface 201 of the metal mask 20 that is in contact with the printed circuit board 1 faces downward during solder printing, and the metal mask 20 may be inspected by the inspection unit 32. The lower side implements the composition of the inspection.

不限於此,也可作成在以金屬遮罩20之背面201(基板抵接面)側朝向上方的方式配置的狀態,藉由配置於金屬遮罩20上方的檢查單元32從上側執行檢查的構成。但,在抑制室內照明等外擾光的影響,謀求提升檢查精度方面,較佳為以配置成金屬遮罩20的背面201側朝向下方的狀態執行檢查。It is not limited to this, and it may be arranged so that the back surface 201 (substrate abutting surface) side of the metal mask 20 faces upward, and the inspection unit 32 arranged above the metal mask 20 may perform inspection from the upper side. . However, in order to improve the inspection accuracy by suppressing the influence of external light such as indoor lighting, it is preferable to perform the inspection with the rear surface 201 side of the metal mask 20 facing downward.

(d)作為辨別手段的AI模型100(神經網路90)的構成及其學習方法,並不限定於上述實施形態。(d) The configuration of the AI model 100 (neural network 90 ) as a discrimination means and its learning method are not limited to the above-mentioned embodiments.

(d-1)上述實施形態中,特別是(上文中未提及)在進行神經網路90的學習處理、金屬遮罩檢查處理中的重建處理之際,亦可依需要採取對各種資料執行正規化等處理的構成。(d-1) In the above-mentioned embodiment, especially (not mentioned above) when performing the learning process of the neural network 90 and the reconstruction process in the metal mask inspection process, it is also possible to execute various data as needed. Formation of processing such as normalization.

(d-2)神經網路90的構造並不限定於圖6所示的樣態,例如,也可為在卷積層93之後設置池化層的構成。當然,神經網路90的層數、各層的節點數、各節點的連接構造等也可採用不同的構成。(d-2) The structure of the neural network 90 is not limited to that shown in FIG. 6 , and for example, a pooling layer may be provided after the convolutional layer 93 . Of course, the number of layers of the neural network 90, the number of nodes in each layer, the connection structure of each node, etc. may also be configured differently.

(d-3)上述實施形態中,AI模型100(神經網路90)雖係作成具有卷積型自動編碼器(CAE)之構造的生成模型,但也可為例如變分自編碼器(VAE:Variational Autoencoder)等具有不同形態的自動編碼器構造的生成模型。(d-3) In the above embodiment, although the AI model 100 (neural network 90) is a generative model having a structure of a convolutional autoencoder (CAE), it may be, for example, a variational autoencoder (VAE : Variational Autoencoder) and other generative models with different forms of autoencoder construction.

(d-4)上述實施形態中,係採取藉誤差倒傳播法令神經網路90學習的構成,但不限於此,也可作成使用其他各種學習運算法學習的構成。(d-4) In the above embodiment, the neural network 90 learns by the error backpropagation method, but it is not limited to this, and it is also possible to make a learning structure using other various learning algorithms.

(d-5)神經網路90也可用所謂AI晶片等AI處理專用迴路來構成。在此情形中,只有參數等學習資訊會記憶在記憶部57,且透過以AI處理專用迴路將其讀出並設定在神經網路90,而構成AI模型100。(d-5) The neural network 90 may also be configured by a circuit dedicated to AI processing such as a so-called AI chip. In this case, only learning information such as parameters is memorized in the memory unit 57 , and it is read out and set in the neural network 90 by a circuit dedicated to AI processing to form the AI model 100 .

(d-6)上述實施形態中也可為具備有學習部77,在該控制裝置33內執行神經網路90之學習的構成,但非僅限於此,只要將至少AI模型100(已完成學習的神經網路90)記憶在記憶部57即可,亦可為將學習部77省略的構成。因而,也可採取神經網路90的學習係在控制裝置33的外部進行並將其記憶在記憶部57的構成。(d-6) In the above-mentioned embodiment, a learning unit 77 may be provided to execute the learning of the neural network 90 in the control device 33, but it is not limited thereto. The neural network 90) may be memorized in the memory unit 57, or the learning unit 77 may be omitted. Therefore, learning of the neural network 90 may be performed outside the control device 33 and stored in the memory unit 57 .

(e)金屬遮罩20(被檢查部EA)的檢查方法不限定於上述實施形態,也可採用其他的構成。(e) The inspection method of the metal mask 20 (inspected part EA) is not limited to the above-mentioned embodiment, and other configurations may be employed.

(e-1)例如,上述實施形態中,也可構成為透過使用AI模型(生成模型)100擷取原形狀資料和重建形狀資料的差分來判定被檢查部EA有否異常部Q。(e-1) For example, in the above embodiment, it may be configured to determine whether there is an abnormal part Q in the inspected part EA by using the AI model (generated model) 100 to extract the difference between the original shape data and the reconstructed shape data.

不限於此,也可構成為不用AI模型100,而例如預先記憶的基準形狀資料(位置資料或尺寸資料等被檢查部EA的構成資訊)、和算出的被檢查部EA的形狀資料相比較,以判定被檢查部EA中有否異常部Q。It is not limited thereto, and the AI model 100 may not be used, for example, the pre-stored reference shape data (configuration information of the inspected part EA such as position data or size data) is compared with the calculated shape data of the inspected part EA, To determine whether there is an abnormal part Q in the inspected part EA.

(e-2)上述實施形態中,構成為被檢查部EA中存在有異常部Q的情形中,該異常部Q的深度d及寬度w等兩個判定項目分別超過預定的臨界值時,即判定為「有異常」。(e-2) In the above-mentioned embodiment, when there is an abnormal part Q in the inspected part EA, when the two judgment items such as the depth d and the width w of the abnormal part Q exceed predetermined critical values, namely It was judged as "abnormal".

不限於此,例如構成為異常部Q的深度d及寬度w之中,至少一者的判定項目超過預定的臨界值時,即判定為「有異常」。It is not limited thereto, for example, it is configured such that when at least one of the determination items of the depth d and the width w of the abnormal portion Q exceeds a predetermined threshold value, it is determined that “there is an abnormality”.

再者,構成為增加判定項目,在異常部Q的深度d、寬度w、長度l及體積v之中,至少1個判定項目或預定的複數個判定項目超過預定的臨界值時,即判定為「有異常」。當然,也可採判定項目只設定1個的構成。Furthermore, it is configured to add more judgment items, and when at least one judgment item or a predetermined plurality of judgment items exceeds a predetermined threshold value among the depth d, width w, length l, and volume v of the abnormal part Q, it is judged to be "There are exceptions." Of course, only one determination item may be set.

(e-3)所檢測的異常部Q之種類並不限定於上述實施形態所例示者,也可採用可檢測其他異常部Q的構成。例如,在上述實施形態中,作為異常部Q,係例示過多的研磨且過度圓弧化的倒角部Q1[參照圖10(b)]、連通到開口部21的傷痕Q2[參照圖10(c)]、開口部21周緣的變形Q3[參照圖10(d)]等。(e-3) The type of abnormal part Q to be detected is not limited to those exemplified in the above embodiment, and a configuration capable of detecting other abnormal parts Q may be employed. For example, in the above-mentioned embodiment, as the abnormal part Q, the chamfered part Q1 [refer to FIG. c)], deformation Q3 of the periphery of the opening 21 [see FIG. 10(d)], and the like.

不限於此,也可構成為例如圖10(e)所示,將被檢查部EA中附著有異物Q4的部位(附著於被檢查部EA的異物Q4)當作異常部Q實施檢測。It is not limited thereto, and may be configured, for example, as shown in FIG.

另外,在未使用過的金屬遮罩20中附著有異物Q4的可能性極少,例如用清潔裝置29施行金屬遮罩20的清潔後,將該金屬遮罩20再度透過焊劑印刷機12使用之際,在該金屬遮罩20之背面201側的開口部21周邊部分(被檢查部EA),會有無法以清潔手段完全去除之膏狀焊劑5或助熔劑(flux)等微小的殘留物固著的狀態下殘留的情形。In addition, there is very little possibility of foreign matter Q4 adhering to the unused metal mask 20. For example, when the metal mask 20 is cleaned by the cleaning device 29 and the metal mask 20 is used again through the solder printer 12. In the peripheral part of the opening 21 (the inspected part EA) on the back side 201 side of the metal mask 20, there will be small residues such as cream solder 5 or flux (flux) that cannot be completely removed by cleaning means. The situation remaining in the state.

依此方式,在被檢查部EA附著有異物Q4的情況中,在印刷焊劑時,會由於被檢查部EA(金屬遮罩20之背面201側的開口部21周邊部分)浮起,而有造成膏狀焊劑流動、滲透或涶流等的原因之虞。In this way, when the foreign matter Q4 adheres to the part to be inspected EA, the part to be inspected EA (peripheral portion of the opening 21 on the back surface 201 side of the metal mask 20) floats up when printing flux, which may cause problems. Potential causes of paste flux flow, penetration or sloshing, etc.

(e-4)上述實施形態中,係構成為在進行金屬遮罩20(被檢查部EA)的檢查之際,照射圖案光執行三維量測,但取而代之,亦可構成為根據一面照射均勻光一面拍攝而取得的和被檢查部EA相關的二維亮度影像資料,檢測出異常部Q。(e-4) In the above-mentioned embodiment, when the metal mask 20 (inspected part EA) is inspected, three-dimensional measurement is performed by irradiating patterned light, but instead, it may be configured by irradiating uniform light on one surface. The abnormal part Q is detected by taking the two-dimensional luminance image data related to the inspected part EA obtained by shooting.

此時,也可構成為例如使用和上述AI模型100相異的其他AI模型(已完成學習的神經網路),依據上述二維亮度影像資料,從因被檢查部EA的凹凸形狀等而相異的反射率(反射光的亮度值)等的差異,取得和被檢查部EA相關的形狀資料。In this case, for example, using another AI model (a learned neural network) different from the above-mentioned AI model 100, based on the above-mentioned two-dimensional luminance image data, it may be configured such that the uneven shape of the part EA to be inspected, etc. The difference in reflectance (brightness value of reflected light), etc., and the shape data related to the inspected part EA are obtained.

(f)三維量測方法不限於上述實施形態,也可採用其他的構成。(f) The three-dimensional measurement method is not limited to the above-mentioned embodiment, and other configurations may also be adopted.

(f-1)例如,上述實施形態中,係在藉相移法執行三維量測的基礎上,取得各圖案光的相位逐次相差90°的4種影像資料的構成,但相位移位次數及相位移位量並不限定於此。也可採用可藉由相移法實施三維量測的其他相位移位次數及相位移位量。(f-1) For example, in the above embodiment, on the basis of performing three-dimensional measurement by the phase shift method, four types of image data in which the phases of each pattern light are successively different by 90° are obtained, but the number of phase shifts and The amount of phase shift is not limited to this. Other phase shift times and phase shift amounts that can be measured three-dimensionally by the phase shift method can also be used.

例如,也可設成取得相位逐次相差120°(或90°)的3種影像資料來進行三維量測的構成,亦可採用取得相位逐次相差180°(或90°)的2種影像資料來進行三維量測的構成。For example, it can also be configured to obtain three types of image data with successive phase differences of 120° (or 90°) for three-dimensional measurement, or to obtain two types of image data with successive phase differences of 180° (or 90°). Composition for 3D measurement.

(f-2)上述實施形態中,雖採用了相移法作為三維量測法,但也不限定於此,亦可採用光切斷法或波紋法、聚焦、空間代碼法等其他三維量測法。(f-2) In the above-mentioned embodiment, although the phase shift method is used as the three-dimensional measurement method, it is not limited to this, and other three-dimensional measurement methods such as the light cutting method, the moire method, focusing, and the spatial code method can also be used. Law.

1:印刷基板 3:島部 5:膏狀焊劑 10:生產線 12:焊劑印刷機 20:金屬遮罩 21:開口部 29:清潔裝置 30:金屬遮罩檢查裝置 32:檢查單元 32A:第1照明裝置 32B:第2照明裝置 32C:攝像機 33:控制裝置 77:學習部 78:檢查部 90:神經網路 100:AI模型 201:背面 202:表面 EA:被檢查部 Q:異常部1: Printed substrate 3: Island Department 5: Paste flux 10: Production line 12: Solder printing machine 20: metal mask 21: opening 29: Cleaning device 30: Metal mask inspection device 32: Check unit 32A: 1st lighting device 32B: Second lighting device 32C: camera 33: Control device 77: Learning Department 78: Inspection Department 90: Neural Networks 100: AI model 201: back 202: surface EA: inspected department Q: Abnormal Department

圖1為印刷基板的一部分經放大後的局部放大俯視圖。 圖2為顯示印刷基板之生產線的構成之方塊圖。 圖3為用以說明藉由焊劑印刷機之印刷動作的示意圖。 圖4為示意性顯示金屬遮罩檢查裝置的概略構成圖。 圖5為顯示金屬遮罩檢查裝置之功能構成的方塊圖。 圖6為用以說明神經網路之構造的示意圖。 圖7為神經網路之學習處理流程的流程圖。 圖8為顯示檢查處理的流程之流程圖。 圖9中,(a)為顯示從表面側觀看之開口部及其周邊部分之金屬遮罩的局部放大俯視圖,(b)為(a)之AA線剖面圖。 圖10中,(a)為顯示無異常的開口部及其周邊部分之金屬遮罩的局部放大剖面圖,(b)~(e)為顯示有異常的開口部及其周邊部分之金屬遮罩的局部放大剖面圖。FIG. 1 is an enlarged partial top view of a part of a printed substrate. Fig. 2 is a block diagram showing the configuration of a production line for printed circuit boards. FIG. 3 is a schematic diagram for explaining a printing operation by a solder printer. FIG. 4 is a schematic configuration diagram schematically showing a metal mask inspection device. Fig. 5 is a block diagram showing the functional configuration of the metal mask inspection device. FIG. 6 is a schematic diagram illustrating the structure of a neural network. FIG. 7 is a flow chart of the learning process of the neural network. FIG. 8 is a flowchart showing the flow of inspection processing. In FIG. 9 , (a) is a partial enlarged plan view of the metal mask showing the opening and its peripheral portion viewed from the surface side, and (b) is a cross-sectional view along line AA of (a). In Fig. 10, (a) is a partially enlarged cross-sectional view of the metal mask showing the opening without abnormalities and its surrounding parts, and (b) to (e) are the metal masks showing the abnormal opening and its surrounding parts A partial enlarged cross-sectional view.

20:金屬遮罩 20: metal mask

20a:遮罩本體部 20a: mask body part

20b:遮罩框架部 20b: mask frame part

21:開口部 21: opening

30:金屬遮罩檢查裝置 30: Metal mask inspection device

31:搬送機構 31: Transport mechanism

31a:搬送軌道 31a: Transport track

31b:輸送帶 31b: conveyor belt

32:檢查單元 32: Check unit

32A:第1照明裝置 32A: 1st lighting device

32Aa:第1光源 32Aa: 1st light source

32B:第2照明裝置 32B: Second lighting device

32Ba:第2光源 32Ba: Second light source

32Ab,32Bb:液晶快門 32Ab, 32Bb: liquid crystal shutter

32C:攝像機 32C: camera

201:背面 201: back

202:表面 202: surface

Claims (5)

一種網遮罩檢查裝置,形成有複數個開口部,用以檢查在對基板進行焊劑印刷之際所使用的網遮罩,其特徵為具備:至少1個照射手段,可將預定之光照射在預定被檢查部,該預定被檢查部係前述網遮罩的表背兩面之中於焊劑印刷時會成為和前述基板抵接的基板抵接面側之背面側的前述開口部的周邊部;拍攝手段,對被前述預定之光所照射到的前述被檢查部進行拍攝;形狀資料取得手段,依據藉前述拍攝手段所拍攝的和前述被檢查部相關的影像資料,可取得和該被檢查部相關的形狀資料;及判定手段,依據藉前述形狀資料取得手段所取得的和前述被檢查部相關的形狀資料,來判定前述被檢查部的良否,且具備辨別手段,其係對具有從所輸入的形狀資料擷取特徵量之編碼部、及從該特徵量重建形狀資料之解碼部的神經網路,無論配置布局為何,僅使和無異常的前述被檢查部相關的形狀資料作為學習資料進行學習而生成,前述判定手段具備:重建形狀資料取得手段,可取得和前述被檢查部相 關的重建形狀資料,該和前述被檢查部相關的重建形狀資料係以和藉由前述形狀資料取得手段所取得的前述被檢查部相關的形狀資料作為原形狀資料,並輸入前述辨別手段而重建;及比較手段,可將前述原形狀資料與前述重建形狀資料比較;且構成為可按各個前述被檢查部,依據藉由前述比較手段所得的比較結果,來判定前述被檢查部的良否。 A mesh mask inspection device having a plurality of openings for inspecting a mesh mask used for solder printing on a substrate, characterized by having at least one irradiating means capable of irradiating predetermined light on the A portion to be inspected, which is the peripheral portion of the opening on the back side of the substrate abutting surface side that will be in contact with the substrate during solder printing, among the front and back surfaces of the mesh mask; photographing The method is to photograph the part to be inspected that is irradiated by the predetermined light; the means to obtain shape data is to obtain the image data related to the part to be inspected based on the image data related to the part to be inspected that is photographed by the aforementioned shooting means. The shape data of the aforementioned shape data; and the judging means, based on the shape data related to the aforementioned inspected part obtained by the aforementioned shape data acquisition means, to judge whether the aforementioned inspected part is good or not, and has a discrimination means, which is based on the input from the The neural network of the encoding unit that extracts feature data from shape data and the decoding unit that reconstructs shape data from the feature data uses only the shape data related to the inspected part without abnormalities as learning data, regardless of the layout. And generate, the above-mentioned judging means has: reconstruction shape data obtaining means, can obtain and the above-mentioned inspected part The reconstructed shape data related to the aforementioned inspected part is based on the shape data related to the aforementioned inspected part obtained by the aforementioned shape data acquisition means as the original shape data, and input into the aforementioned identification means for reconstruction and a comparison means, which can compare the aforementioned original shape data with the aforementioned reconstructed shape data; and is configured to judge whether the aforementioned inspected parts are good or not according to the comparison results obtained by the aforementioned comparison means for each of the aforementioned inspected parts. 如請求項1之網遮罩檢查裝置,其中,前述判定手段係構成為可藉由判定前述開口部周緣之倒角部的大小是否有超過預定量來判定前述被檢查部的良否。 The net mask inspection device according to claim 1, wherein the judging means is configured to judge whether the part to be inspected is good or not by judging whether the size of the chamfer at the periphery of the opening exceeds a predetermined amount. 如請求項1之網遮罩檢查裝置,其中,前述照射手段係構成為可照射三維量測用光作為前述預定之光;前述形狀資料取得手段係構成為可利用預定的三維量測法取得和前述被檢查部相關的三維形狀資料。 Such as the net mask inspection device of claim 1, wherein the aforementioned irradiation means is configured to be capable of irradiating three-dimensional measurement light as the aforementioned predetermined light; the aforementioned shape data acquisition means is configured to obtain and obtain the predetermined three-dimensional measurement method. Three-dimensional shape data related to the part to be inspected. 如請求項1之網遮罩檢查裝置,其中,前述判定手段係構成為可藉由判定前述被檢查部之中是否有超過預定大小的異常部來判定前述被檢查部之良否。 The net mask inspection device according to claim 1, wherein the judging means is configured to judge whether the inspected part is good or not by judging whether there is an abnormal part exceeding a predetermined size in the inspected part. 如請求項1至4中任一項之網遮罩檢查裝置,其中,前述網遮罩係以前述背面側成為下側的方式配置,前述照射手段係配置成可對前述網遮罩之背面側從 下方照射前述預定之光,前述拍攝手段係配置成可將前述網遮罩的背面側從下方拍攝。 The mesh mask inspection device according to any one of claims 1 to 4, wherein the mesh mask is arranged so that the back side becomes the lower side, and the irradiation means is arranged so as to be able to illuminate the back side of the mesh mask from The predetermined light is irradiated from below, and the photographing means is arranged so that the rear side of the mesh mask can be photographed from below.
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JP2005203424A (en) * 2004-01-13 2005-07-28 Yamaha Motor Co Ltd Data creation method, data creation apparatus, screen printing inspection method, screen printing inspection apparatus, and screen printing machine
JP2015145092A (en) * 2014-02-03 2015-08-13 株式会社プロセス・ラボ・ミクロン Metal mask and manufacturing method thereof
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