TWI797617B - Mesh mask inspection device - Google Patents
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- 238000007689 inspection Methods 0.000 title claims abstract description 149
- 229910000679 solder Inorganic materials 0.000 claims abstract description 66
- 238000007639 printing Methods 0.000 claims abstract description 55
- 239000000758 substrate Substances 0.000 claims abstract description 34
- 230000002093 peripheral effect Effects 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims description 64
- 238000013528 artificial neural network Methods 0.000 claims description 41
- 230000002159 abnormal effect Effects 0.000 claims description 39
- 230000005856 abnormality Effects 0.000 claims description 18
- 238000005259 measurement Methods 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 9
- 238000000691 measurement method Methods 0.000 claims description 7
- 239000000284 extract Substances 0.000 claims description 6
- 239000002184 metal Substances 0.000 abstract description 124
- 229910052751 metal Inorganic materials 0.000 abstract description 124
- 230000007547 defect Effects 0.000 abstract description 5
- 230000008569 process Effects 0.000 description 42
- 238000012545 processing Methods 0.000 description 35
- 238000013473 artificial intelligence Methods 0.000 description 21
- 230000007246 mechanism Effects 0.000 description 20
- 239000006071 cream Substances 0.000 description 17
- 230000004907 flux Effects 0.000 description 15
- 230000010363 phase shift Effects 0.000 description 15
- 230000006870 function Effects 0.000 description 13
- 239000004973 liquid crystal related substance Substances 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 238000004140 cleaning Methods 0.000 description 11
- 230000002950 deficient Effects 0.000 description 10
- 238000003384 imaging method Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 7
- 238000004891 communication Methods 0.000 description 6
- 238000005286 illumination Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000035515 penetration Effects 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000005476 soldering Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 230000007723 transport mechanism Effects 0.000 description 4
- 206010052428 Wound Diseases 0.000 description 3
- 208000027418 Wounds and injury Diseases 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 238000013135 deep learning Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 238000007781 pre-processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013527 convolutional neural network Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000012850 discrimination method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- -1 firstly Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000011176 pooling Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
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- Immunology (AREA)
- Pathology (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
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Abstract
[課題] 提供可抑制發生印刷不良等的網遮罩檢查裝置。 [解決手段] 金屬遮罩檢查裝置30具備:照明裝置32A、32B,可將預定之光照射在預定被檢查部,該預定被檢查部係為金屬遮罩20的表背兩面當中於焊劑印刷時會成為和印刷基板抵接之基板抵接面側之背面201側的開口部21周邊部;攝像機32C,拍攝金屬遮罩20之背面201的被檢查部;及控制裝置,用以控制上述構成。控制裝置係構成為依據藉由攝像機32C所拍攝的和前述被檢查部相關的影像資料,取得和該被檢查部相關的形狀資料,並且可依據與該被檢查部相關的形狀資料,來判定該被檢查部之良否。[Problem] Provide a screen mask inspection device that can suppress the occurrence of printing defects, etc. [Solution] The metal mask inspection device 30 is provided with: illuminating devices 32A, 32B, which can irradiate predetermined light on a predetermined inspected portion which is between the front and back surfaces of the metal mask 20 during solder printing. The peripheral part of the opening 21 on the back side 201 side which will be the substrate contacting side which will be in contact with the printed circuit board; the camera 32C photographs the inspected part on the back side 201 of the metal mask 20; and the control device controls the above-mentioned configuration. The control device is configured to obtain shape data related to the inspected part based on image data related to the inspected part captured by the camera 32C, and determine the shape data related to the inspected part based on the shape data related to the inspected part. Whether the inspected department is good or not.
Description
本發明係關於用以檢查對基板實施焊劑印刷之際所使用的網遮罩的網遮罩檢查裝置。The present invention relates to a mesh mask inspection device for inspecting a mesh mask used for solder printing on a substrate.
通常,在基板上安裝電子零件的生產線中,首先係在焊劑印刷機上藉網版印刷使膏狀焊劑印刷在基板之島部(land)上。接著,利用該膏狀焊劑的黏性,使電子零件暫時固定在基板上。然後,透過將前述基板導入迴焊爐中進行焊接。Generally, in a production line for mounting electronic components on a substrate, firstly, paste solder is printed on lands of the substrate by screen printing on a solder printing machine. Next, the electronic components are temporarily fixed on the substrate by utilizing the viscosity of the cream solder. Then, soldering is performed by introducing the aforementioned substrate into a reflow furnace.
焊劑印刷機中,具備有和要成為預先印刷對象之基板的島部配置對應而形成之多數個開口部的網遮罩。在進行焊劑印刷之際,在使該網遮罩抵接於基板表面的狀態下,透過將膏狀焊劑供給到該上面,並藉滑動刮板將膏狀焊劑推入開口部內。然後,透過將網遮罩從基板分離,使填充在開口部內的膏狀焊劑脫版,並印刷(轉印)在島部上。A solder printer is provided with a mesh mask having a plurality of openings formed corresponding to the arrangement of islands of a substrate to be printed in advance. When performing solder printing, with the mesh mask in contact with the surface of the substrate, cream flux is supplied to the upper surface, and the cream flux is pushed into the openings by the sliding squeegee. Then, by separating the mesh mask from the substrate, the cream solder filled in the openings is released and printed (transferred) on the islands.
這種焊劑印刷機中,係在例如發生焊劑印刷不良、或作為印刷對象之基板更換規格的情況等,進行網遮罩的更換。In such a solder printing machine, the screen mask is replaced when, for example, defective solder printing occurs or a specification of a substrate to be printed is changed.
接著,使用已更換的網遮罩開始重行焊劑印刷之際,為了防止印刷不良發生於未然,會有事前檢查網遮罩的情形。Next, when solder printing starts again using the replaced mesh mask, the mesh mask may be inspected in advance in order to prevent printing defects from occurring in the first place.
實施這種檢查的技術,例如,在焊劑印刷機裝設有網遮罩的狀態下,藉雷射量測裝置將網遮罩的上面作三維量測,來判定網遮罩之良否的技術已屬公知(參照例如專利文獻1)。 [先前技術文獻] [專利文獻]The technology of implementing this kind of inspection, for example, in the state where the screen mask is installed on the solder printing machine, the technology of using the laser measuring device to measure the top of the screen mask three-dimensionally to determine whether the screen mask is good or not has been established. It is well known (see, for example, Patent Document 1). [Prior Art Literature] [Patent Document]
[專利文獻1] 日本特開2001-315310號公報[Patent Document 1] Japanese Patent Laid-Open No. 2001-315310
[發明欲解決之課題][Problem to be solved by the invention]
然而,上述專利文獻1的構成,係為在焊劑印刷時,在網遮罩的表背兩面中,從作為和印刷基板抵接的背面(下面)側相反之側的表面(上面)側進行三維量測,該背面(下面)係基板抵接面側,該表面(上面)係基板非抵接面側。However, in the structure of the above-mentioned
因此,會有無法檢測在焊劑印刷時成為轉印在島部上的膏狀焊劑發生滲透或涶流等原因之網遮罩背面側的各種異常(不良部位)的顧慮。Therefore, there is a possibility that various abnormalities (defective parts) on the back side of the mesh mask, which cause penetration or flow of the cream solder transferred to the island portion during solder printing, may not be detected.
例如,網遮罩背面側之開口部周緣的角部,因過度的電解研磨處理等而產生過度圓弧化的情況[參照圖10(b)]、或網遮罩的背面側存在有和開口部連通的凹陷或切口等傷痕的情況[參照圖10(c)]、或在網遮罩之背面側的開口部周緣產生變形等的情況[參照圖10(d)]中,有成為焊劑印刷時膏狀焊劑從此處流動、滲透或涶流等原因之虞,甚至容易發生搭橋(bridge)等印刷不良,而且安裝零件之焊接作業無法適當執行,有不良品發生率增高之虞。For example, the corners of the openings on the back side of the net mask are excessively rounded due to excessive electrolytic polishing [see Fig. 10(b)], or there are openings on the back side of the net mask. In the case of flaws such as recesses or cuts that are connected to each other [see Fig. 10(c)], or when deformation occurs on the periphery of the opening on the back side of the mesh mask [see Fig. 10(d)], solder printing may occur. When the paste flux flows, permeates or flows from here, it may even cause poor printing such as bridging (bridge), and the soldering operation of the mounting parts cannot be properly performed, and the occurrence rate of defective products may increase.
本發明係有鑒於上述情形而研發者,其目的在提供可抑制發生印刷不良等的網遮罩檢查裝置。 [用以解決課題之手段]The present invention was developed in view of the above circumstances, and an object of the present invention is to provide a screen mask inspection device that can suppress occurrence of printing defects and the like. [Means to solve the problem]
下文中,就適於解決上述課題的各手段分項說明。另外,亦依需要附帶陳述對應手段特有的作用效果。Hereinafter, each means suitable for solving the above-mentioned problems will be described item by item. In addition, if necessary, the specific function and effect of the corresponding means are also stated.
手段1.一種網遮罩檢查裝置,形成有複數個開口部,用以檢查在對基板進行焊劑印刷之際所使用的網遮罩,其特徵為具備:
至少1個照射手段,可將預定的光照射在預定被檢查部,該預定被檢查部係在前述網遮罩的表背兩面之中於焊劑印刷時會成為和前述基板抵接之基板抵接面側的背面側之前述開口部的周邊部;
拍攝手段,可對前述預定之光所照射的前述被檢查部進行拍攝;
形狀資料取得手段,依據藉前述拍攝手段拍攝的和前述被檢查部相關的1個或複數個影像資料,可取得與該被檢查部相關的形狀資料;及
判定手段,根據藉前述形狀資料取得手段所取得的和前述被檢查部相關的形狀資料,判定前述被檢查部的良否。
若依據上述手段1,網遮罩的表背兩面之中,從焊劑印刷時和基板抵接之基板抵接面側的背面側,進行關於屬於開口部之周邊部分的預定被檢查部的檢查。According to the
藉由此種構成,可對會造成印刷時焊劑之滲透或涶流等原因之網遮罩背面側的開口部周邊(被檢查部)相關的各種異常(不良部位)進行檢測。結果,得以抑制發生印刷不良等情形。With this configuration, it is possible to detect various abnormalities (defective parts) related to the periphery of the opening on the back side of the mesh mask (inspected part) which may cause penetration or flow of flux during printing. As a result, occurrence of printing defects and the like can be suppressed.
手段2.如手段1所述的網遮罩檢查裝置,其中,前述判定手段係構成為可藉由判定前述開口部周緣的倒角部之大小是否有超過預定量(例如,倒角部的「深度」及「寬度」之中的至少一個判定項目是否有超過預定臨界值),來判定前述被檢查部之良否。
如上述「發明所欲解決之課題」所述,網遮罩之背面側的開口部之周緣角部分會有因過度的電解研磨處理等而變得過度圓弧化的情形[參照圖10(b)],故在焊劑印刷時,有造成焊劑從此處流動、滲透或涶流等原因之虞。對於此點,若依據上述手段2,即可防止這種缺點發生於未然。As described in the above "Problems to be Solved by the Invention", the peripheral corners of the openings on the back side of the mesh cover may become excessively rounded due to excessive electrolytic polishing [see Fig. 10(b) )], so during flux printing, there is a risk of causing flux to flow, permeate or flow from here. For this point, if according to the above-mentioned
手段3.如手段1或2的網遮罩檢查裝置,其中,前述判定手段係構成為可透過判定在前述被檢查部中是否有超過預定大小的異常部分(例如,「深度」、「寬度」、「長度」及「體積」中的至少1個判定項目是否有超過預定臨界值的異常部),而判定前述被檢查部的良否。Means 3. The net mask inspection device as in
如上文「發明所欲解決之課題」所述,網遮罩之背面側存在有連通於開口部的凹陷或切痕等傷口時[參照圖10(c)]、網遮罩背面側的開口部周緣產生變形等時[參照圖10(d)],會有焊劑印刷時焊膏自此處流動,而造成滲透或涶流等原因之虞。對於此點,若依據上述手段3,即可防止發生這種缺失於未然。意即,上述「異常部」係包含連通於開口部之凹陷或切痕等傷口、開口部周緣之變形。此外,上述「異常部」中,也可包含異物附著的部位(附著於被檢查部的異物)等。As mentioned above in "Problems to be Solved by the Invention", when there is a wound such as a depression or a cut on the back side of the mesh cover that communicates with the opening [see Fig. 10(c)], the opening on the back side of the mesh cover When the peripheral edge is deformed [see FIG. 10(d)], there is a possibility that the solder paste flows from this area during flux printing, causing penetration or bleeding. For this point, if according to the above-mentioned
手段4.如手段1至3中任一項之網遮罩檢查裝置,其中,具備辨別手段(生成模型),其係對具有從輸入的形狀資料擷取特徵量的編碼部(Encoder)、及從該特徵量重建形狀資料的解碼部(解碼器)的神經網路,僅使和無異常的前述被檢查部有關的形狀資料(僅屬於良品的形狀資料)作為學習資料進行學習而生成,
前述判定手段具備:
重建形狀資料取得手段,可取得和前述被檢查部相關的重建形狀資料,該和前述被檢查部相關的重建形狀資料係以和藉前述形狀資料取得手段所取得的前述被檢查部相關的形狀資料作為原形狀資料,並輸入前述辨別手段輸入而重建;及
比較手段,將前述原形狀資料與前述重建形狀資料加以比較;
且構成為可根據藉前述比較手段所得的比較結果,來判定前述被檢查部之良否。Means 4. The mesh mask inspection device according to any one of
另外,上述「神經網路」中包含例如具有複數個卷積層的卷積型神經網路等。此外,上述「學習」中,包含例如深度學習(deep learning)等。上述「辨別手段(生成模型)」中包含例如自動編碼器(自編碼器)、或卷積型自動編碼器(卷積型自編碼器)等。In addition, the above-mentioned "neural network" includes, for example, a convolutional neural network having a plurality of convolutional layers. In addition, the above-mentioned "learning" includes, for example, deep learning and the like. The aforementioned "discrimination means (generated model)" includes, for example, an autoencoder (autoencoder), a convolutional autoencoder (convolutional autoencoder), and the like.
若依據上述手段4,可使用學習神經網路所構築的自編碼器等辨別手段(生成模型),藉以判定被檢查部有無異常(不良部位)。依據這種構成,以往難以檢測的微小異常即得以檢測。According to the above-mentioned
再者,本手段中,因將被檢查部拍攝所得的原形狀資料、和依據該原形狀資料重建所得的重建形狀資料相比較,故在比較的兩形狀資料中,沒有因屬於檢查對象物的網遮罩側之拍攝條件(例如,網遮罩的配置位置或配置角度、彎曲等)、或屬於檢查裝置側的拍攝條件(例如,照明狀態或攝像機的畫角等)的差異產生的影響,可更正確地檢測出更微細的異常。Furthermore, in this method, since the original shape data captured by the inspected part is compared with the reconstructed shape data reconstructed based on the original shape data, there is no object belonging to the inspection object among the compared two shape data. Influences caused by differences in imaging conditions on the side of the net mask (for example, arrangement position or arrangement angle of the net mask, bending, etc.), or differences in imaging conditions on the side of the inspection device (for example, lighting conditions or camera angles, etc.), Finer abnormalities can be detected more accurately.
另外,假如位於網遮罩之預定位置的預定被檢查部(開口部的周邊部分)相關的檢查進行之際,必須以該被檢查部的構成資訊(位置資料或尺寸資料等)作為判定良否之基準的構成中,例如將賈柏資料等基板設計資訊預先記憶妥當,並適當取得要成為檢查對象之被檢查部的構成資訊,並和該構成資訊比較,對要成為檢查對象之被檢查部的良否進行判定,故有檢查效率降低之虞。而且,網遮罩對檢查位置的定位也必須正確進行。In addition, if the inspection is carried out on the part to be inspected (periphery of the opening) at the predetermined position of the net cover, the composition information (position data or size data, etc.) of the part to be inspected must be used as a criterion for judging whether it is good or not In the composition of the standard, for example, the substrate design information such as Jaber data is stored in advance, and the composition information of the inspected part to be inspected is obtained appropriately, and compared with the composition information, the information of the inspected part to be inspected is Good or bad is judged, so there is a risk of lower inspection efficiency. Furthermore, the positioning of the mesh mask to the inspection position must also be done correctly.
對於此點,若依據本手段,係利用自編碼器等辨別手段,將各被檢查部進行檢查的構成,故不必須將多數被檢查部各者之個別構成資訊預先加以記憶,故檢查之際不用參考該資訊,即可謀求檢查效率的提升。Regarding this point, if according to this method, it is the structure of inspecting each inspected part by means of discrimination such as an autoencoder, it is not necessary to memorize the individual configuration information of each of the inspected parts in advance, so when inspecting Improve inspection efficiency without referring to this information.
手段5.如前述手段1至4中任一項之網遮罩檢查裝置,其中,前述照射手段係構成為可照射三維量測用光(例如,具有條紋狀之光強度分布的圖案光)作為前述預定之光,
前述形狀資料取得手段係構成為可利用預定的三維量測法(例如,相移法)取得和前述被檢查部相關的三維形狀資料。Means 5. The mesh mask inspection device according to any one of the
在此處,作為上述「三維量測法」的一個例子,可舉出以在相位不同的複數道圖案光之下所拍攝的複數種影像資料作為依據,而取得三維形狀資料的相移法。Here, as an example of the above-mentioned "three-dimensional measurement method", there can be mentioned a phase shift method for obtaining three-dimensional shape data based on a plurality of image data captured under a plurality of patterned lights with different phases.
若依據上述手段5,係利用相移法等三維量測法,透過取得有關被檢查部的三維形狀資料,即可以優異精度判定被檢查部有否異常(不良部位)。結果,可謀求檢查精度的提升。According to the
另外,為了適當掌握在焊劑印刷時,膏狀焊劑會從網遮罩背面側開口部周緣的間隙流動,並轉印於島部上之成為膏狀焊劑的滲透或涶流等原因之異常部,即使是在形狀資料中,用以取得可產生前述間隙之異常部的高度方向資訊(高度資料)就很重要。In addition, in order to properly grasp that during solder printing, cream flux flows from the gap around the opening on the back side of the mesh mask, and is transferred to abnormal parts on the islands that cause penetration or sloshing of the cream flux, Even in the shape data, it is important to obtain the height direction information (height data) of the abnormal part that can generate the aforementioned gap.
關於此點,如本手段所示,透過取得與被檢查部相關的三維形狀資料,可以優異精度判定得以產生上述間隙的異常部是否存在於被檢查部。結果,可謀求檢查精度之提升。In this regard, as shown in this means, by acquiring three-dimensional shape data related to the inspected portion, it is possible to determine with excellent accuracy whether an abnormal portion in which the above-mentioned gap occurs exists in the inspected portion. As a result, the inspection accuracy can be improved.
手段6.如手段1至5之網遮罩檢查裝置,其中,前述網遮罩係配置成前述背面側變成下側,而前述照射手段係配置成可對前述網遮罩之背面側從下方照射前述預定之光;且前述拍攝手段係配置成可將前述網遮罩的背面側從下方拍攝。Means 6. The net mask inspection device according to
作成假定網遮罩的背面側(基板抵接面側)配置成位在上側,從上方進行檢查之構成的情況,會受到室內照明等外擾光的影響,有難以進行穩定的檢查之虞。In the case where inspection is performed from above assuming that the back side (substrate contact surface side) of the mesh mask is placed on the upper side, it may be affected by external light such as indoor lighting, and stable inspection may be difficult.
對於此點,若依據上述手段6,即可謀求抑制上述不良情況之發生、及檢查精度之提升。特別是,如利用相移法的情況所示,在容易受到微細的亮度變化之影響的環境下進行檢查的情況,更能達成功效。Regarding this point, according to the above-mentioned means 6, the occurrence of the above-mentioned disadvantages can be suppressed and the inspection accuracy can be improved. In particular, as in the case of using the phase shift method, it is more effective when inspection is performed in an environment that is easily affected by minute luminance changes.
[用以實施發明的形態][Mode for Carrying Out the Invention]
以下就本發明之一實施形態加以說明。首先,針對印刷焊劑並安裝零件之基板的構成加以說明。圖1係將作為基板的印刷基板的一部分加以放大的局部放大俯視圖。One embodiment of the present invention will be described below. First, the structure of the substrate on which solder is printed and components are mounted will be described. FIG. 1 is an enlarged partial plan view of a part of a printed circuit board as a substrate.
如圖1所示,印刷基板1係在由玻璃環氧樹脂等構成的平板狀底層基板2之表面形成有由銅箔形成的配線圖案(圖示省略)或複數個島部3。而且,在底層基板2的表面,除了島部3以外的部分,均塗佈有阻劑膜4。而且,如圖1、3所示,在島部3上印刷有具黏性的膏狀焊劑5。另外,圖1、3中,係權宜上在顯示膏狀焊劑5的部分附設散點狀模樣。As shown in FIG. 1 , a printed
接著,參照圖2說明有關製作印刷基板1的生產線(製程)。圖2為顯示印刷基板1之生產線10之構成的方塊圖。本實施形態中的生產線10,從其正面側觀看,設定為將印刷基板1由左向右搬送。Next, a production line (process) for producing the printed
如圖2所示,生產線10係自上游側(圖2左側)依序設置有焊劑印刷機12、焊劑印刷檢查裝置13、零件安裝機14、及迴焊裝置15。As shown in FIG. 2 , the
焊劑印刷機12係為用以進行將膏狀焊劑5印刷在印刷基板1之島部3上之焊劑印刷步驟者。如圖3所示,焊劑印刷機12具備有:平板狀的金屬遮罩20,其與印刷基板1上的各島部3對應而形成有複數個開口部21;及沿著該金屬遮罩20之表面202滑動的刮板22。本實施形態中,金屬遮罩20係相當於本實施形態的網遮罩。The
此外,本實施形態中的金屬遮罩20(參照圖4)係由形成有前述複數個開口部21的矩形薄板狀金屬製遮罩本體部20a,及用以保持該遮罩本體部20a之周緣部四邊的矩形框狀金屬製框架部20b所構成。透過將薄板狀遮罩本體部20a以張拉狀態保持在高剛性的框架部20b,可將遮罩本體部20a的撓曲等加以抑制。In addition, the
在上述構成之下,於焊劑印刷步驟中,首先,使金屬遮罩20對準並抵接於印刷基板1之表面側。接著,將膏狀焊劑5供給至金屬遮罩20之表面202。再令刮板22沿著金屬遮罩20的表面202滑動,且將膏狀焊劑5推入開口部21內。Under the above configuration, in the solder printing step, first, the
然後,透過使金屬遮罩20從印刷基板1脫離,且將填充於開口部21內的膏狀焊劑5自背面201側脫版,且印刷(轉印)到島部3上,焊劑印刷即告結束。Then, by detaching the
焊劑印刷檢查裝置13係用以進行焊劑印刷檢查步驟者,該焊劑印刷檢查步驟係將依上述方式印刷的膏狀焊劑5的狀態(例如,印刷位置、高度、量等)進行檢查。The solder
零件安裝機14係為進行將電子零件25(參照圖1)搭載在印刷有膏狀焊劑5的島部3上的零件安裝步驟者。電子零件25具備有複數個電極或導線,且該各電極或導線係分別暫時固定在既定的膏狀焊劑5。The
迴焊裝置15係為使膏狀焊劑5加熱溶融,藉以將島部3、電子零件25之電極或導線實施焊劑接合(焊接)之迴焊步驟的配備。The
其他方面,雖將圖示省略,但在生產線10中,在焊劑印刷機12與焊劑印刷檢查裝置13之間等上述各裝置間,設有用以搬送印刷基板1的輸送帶(conveyor)等。此外,焊劑印刷檢查裝置13與零件安裝機14之間設有岔開裝置。而且,藉焊劑印刷檢查裝置13判定為良品的印刷基板1向其下游側的零件安裝機14引導,另一方面,判定為不良品的印刷基板1則藉岔開裝置排出到不良品貯置部。In other respects, although not shown, in the
再者,在焊劑印刷機12的附近併設有清潔裝置29及金屬遮罩檢查裝置30。金屬遮罩檢查裝置30在本實施形態中係構成為網遮罩檢查裝置。Furthermore, a
清潔裝置29係為用以對在焊劑印刷機12中附著有污垢等的金屬遮罩20進行清潔的清潔步驟者。另外,本實施形態中,構成為在上述印刷基板1的製造步驟(生產線10)中,每藉焊劑印刷機12執行了預定次數的焊劑印刷,即令焊劑印刷暫停,將使用於該焊劑印刷的金屬遮罩20加以清潔。The
金屬遮罩檢查裝置30係為依上述方式在清潔裝置29中已完成清潔的金屬遮罩20、或已換新的未使用金屬遮罩20等要裝設到焊劑印刷機12之前的金屬遮罩20進行檢查者。The metal
在此處,有關金屬遮罩檢查裝置30的構成,係參照圖4、5詳為說明。圖4係示意性顯示金屬遮罩檢查裝置30的概略構成圖。圖5為顯示金屬遮罩檢查裝置30之功能構成的方塊圖。Here, the configuration of the metal
金屬遮罩檢查裝置30具備:搬送機構31,金屬遮罩20的搬送或定位等;檢查單元32,用以執行金屬遮罩20之檢查;控制裝置33,以搬送機構31或檢查單元32之驅動控制為首,執行金屬遮罩檢查裝置30內之各種控制或影像處理、運算處理。The metal
搬送機構31配備有:沿著金屬遮罩20的搬入搬出方向配置的一對搬送軌道31a;配設成可相對於各搬送軌道31a旋轉的環狀的輸送帶31b;驅動該輸送帶31b的馬達等驅動手段(圖示略);及用以將金屬遮罩20定位在預定位置的夾持機構(圖示略);且藉控制裝置33(後述之搬送機構控制部79)執行驅動控制。The
在上述構成之下,朝金屬遮罩檢查裝置30搬入的金屬遮罩20係使和搬入搬出方向正交之寬度方向兩側緣部的框架部20b分別插入搬送軌道31a,並且載置於輸送帶31b上。接著,輸送帶31b開始動作,並使金屬遮罩20搬送到預定的檢查位置。金屬遮罩20到達檢查位置時,輸送帶31b即停止,並且,夾持機構會動作。透過該夾持機構的動作,輸送帶31b會被上推,成為藉著輸送帶31b與搬送軌道31a的上邊部使金屬遮罩20的兩側緣部之框架部20b被挾持的狀態。藉此,金屬遮罩20即可定位固定在檢查位置。檢查結束時,藉夾持機構的固定即被解除,並且輸送帶31b開始動作。藉此,金屬遮罩20從金屬遮罩檢查裝置30搬出。當然,搬送機構31的構成並非限定於上述形態,也可採用其他的構成。With the above configuration, the
檢查單元32係配設在搬送軌道31a(金屬遮罩20之搬送路徑)的下方。檢查單元32具備:作為照射手段的第1照明裝置32A及第2照明裝置32B,將三維量測用的預定光線(具有條紋狀之光強度分布的圖案光)從斜下方照射在金屬遮罩20之背面201的預定檢查範圍;攝像機32C,作為從正下方拍攝金屬遮罩20之背面201的預定檢查範圍的拍攝手段;X軸移動機構32D(參照圖5),可移動於X軸方向(圖4的左右方向);及Y軸移動機構32E(參照圖5),設成可朝Y軸方向(圖4前後方向)移動;並且藉控制裝置33實施驅動控制。The
另外,本實施形態中,以焊劑印刷時成為和印刷基板1抵接的金屬遮罩20之基板抵接面側的背面201係朝向下方(變成下面),而且成為基板非抵接面側的表面202係朝向上方(變成上面)之方式,對金屬遮罩檢查裝置30設定金屬遮罩20。In addition, in the present embodiment, the
再者,金屬遮罩20之背面201的「檢查範圍」係指以攝像機32C的拍攝視角(拍攝範圍)的大小作為1單位,預先設定在金屬遮罩20之背面201的複數個區域中的1個區域。Furthermore, the "inspection range" of the
控制裝置33(移動機構控制部76)係透過驅動控制X軸移動機構32D及Y軸移動機構32E,使檢查單元32可向定位固定在檢查位置的金屬遮罩20之背面201的任意檢查範圍的下方位置移動。然後,透過使檢查單元32依序移動到設定在金屬遮罩20之背面201的複數個檢查範圍,實施和該檢查範圍相關的檢查,而形成可將金屬遮罩20之背面201的整個區域執行檢查的構成。The control device 33 (moving mechanism control part 76) drives and controls the
第1照明裝置32A具備發出預定之光的第1光源32Aa、或形成將來自該第1光源32Aa之光變換為具有條紋狀之光強度分布的第1圖案光之第1格子的第1液晶快門32Ab,並藉控制裝置33(後述的照明控制部72)執行驅動控制。The
第2照明裝置32B具備發出預定之光的第2光源32Ba、或形成將來自該第2光源32Ba之光變換成具有條紋狀光強度分布的第2圖案光的第2格子的第2液晶快門32Bb,並藉控制裝置33(後述的照明控制部72)進行驅動控制。The second illuminating
在上述構成之下,從各光源32Aa、32Ba發出的光係分別導至聚光透鏡(圖示略),並在此處作成平行光後,經由液晶快門32Ab、32Bb導至投影透鏡(圖示略),投影到金屬遮罩20作為圖案光。再者,本實施形態中,係施行液晶快門32Ab、32Bb的切換控制,使各圖案光的相位分別逐一以4分之1節距移位。Under the above-mentioned configuration, the light systems emitted from the light sources 32Aa, 32Ba are respectively guided to the condenser lens (not shown in the figure), and after being made into parallel light here, they are guided to the projection lens (not shown in the figure) through the liquid crystal shutters 32Ab, 32Bb. abbreviated), projected onto the
另外,透過使用液晶快門32Ab、32Bb作為格子,可以照射出接近理想正弦波的圖案光。依據這種構成,使三維計量的量測解析度能夠提升。此外,還可以電性方式執行圖案光的相位移位控制,而謀求裝置的精簡化。In addition, by using the liquid crystal shutters 32Ab and 32Bb as grids, it is possible to irradiate pattern light close to an ideal sine wave. According to this configuration, the measurement resolution of the three-dimensional metrology can be improved. In addition, the phase shift control of the pattern light can also be performed electrically, and the simplification of the device can be achieved.
攝像機32C具有:CCD(電荷耦合元件,Charge Coupled Device)型影像感測器或CMOS(互補金氧半導體,Complementary Metal Oxide Semiconductor)型影像感測器等拍攝元件;及使金屬遮罩20的影像成像在該拍攝元件的光學系統(透鏡單元或光圈等);其光軸則配置成順沿上下方向(Z軸方向)。當然,拍攝元件並非限定在這些元件,也可採用其他拍攝元件。
攝像機32C係藉控制裝置33(後述的攝像機控制部73)施以驅動控制。更詳言之,控制裝置33可一邊採取和藉兩照明裝置32A、32B的照射處理同步,一邊執行藉攝像機32C的拍攝處理。藉此,從第1照明裝置32A或第2照明裝置32B照射的光中,在金屬遮罩20反射的光,會被攝像機32C拍攝而生成影像資料。The
依此方式,藉攝像機32C拍攝及生成的影像資料,在該攝像機32C的內部變換成數位訊號後,可以數位訊號的形態轉送並記憶在控制裝置33(後述的影像取得部74)。接著,控制裝置33(後述的資料處理部75等)會根據該影像資料而實施後述的各種影像處理或運算處理等。In this way, the image data captured and generated by the
控制裝置33係由執行預定之運算處理的CPU(中央處理單元,Central Processing Unit)、記憶各種程式或固定值資料等的ROM(唯讀記憶體,Read Only Memory)、執行各種運算處理之際將各種資料暫時記憶的RAM(隨機存取記憶體,Random Access Memory)、及包含這些周邊迴路的電腦所構成。The
其次,控制裝置33係在CPU依照各種程式執行動作,藉此作為後述的主控制部71、照明控制部72、攝像機控制部73、影像取得部74、資料處理部75、移動機構控制部76、學習部77、檢查部78、搬送機構控制部79等各種功能部而發揮功能。Next, the
但,上述各種功能部係透過上述CPU、ROM、RAM等各種硬體搭配運作而實現,不必明確區別以硬體式或軟體式實現的功能,這些功能的一部分或全部可藉IC等硬體電路來實現。However, the above-mentioned various functions are realized through the operation of various hardware such as the above-mentioned CPU, ROM, and RAM, and it is not necessary to clearly distinguish functions realized by hardware or software. Some or all of these functions can be implemented by hardware circuits such as ICs. accomplish.
再者,控制裝置33中設有:由鍵盤或滑鼠、觸控板等構成的輸入部55、液晶顯示器等具有顯示畫面功能的顯示部56、可記憶各種資料或程式、運算結果等的記憶部57、可和外部進行各種資料之收發訊的通訊部58等。Furthermore, the
茲就構成控制裝置33的上述各種功能部詳加說明。主控制部71係為掌管金屬遮罩檢查裝置30之整體控制的功能部,以可和照明控制部72或攝像機控制部73等其他功能部的各種訊號進行接收發送的方式構成。Hereinafter, the various functional units constituting the
照明控制部72係為驅動控制第1照明裝置32A及第2照明裝置32B的功能部。The
攝像機控制部73為驅動控制攝像機32C的功能部,其係根據來自主控制部71的指令訊號來控制拍攝時機等。The
影像取得部74為將藉攝像機32C拍攝取得的影像資料輸入的功能部。The
資料處理部75係為對藉影像取得部74取入的影像資料施以預定的影像處理,或使用該影像資料實施三維量測處理的功能部。例如,在後述的學習處理中,生成要作為深層神經網路90(以下簡稱為「神經網路90」,參照圖6。)之學習用的學習資料的學習用形狀資料(學習用的三維形狀資料)。此外,後述的檢查處理中,係生成檢查用形狀資料(檢查用的三維形狀資料)。The
移動機構控制部76為驅動控制X軸移動機構32D及Y軸移動機構32E的功能部,其係根據來自主控制部71的指令訊號控制檢查單元32的位置。The moving
學習部77為使用學習資料等進行神經網路90的學習並構築作為辨別手段的AI(人工智慧,Artificial Intelligence)模型100的功能部。The
另外,本實施形態中的AI模型100,係如後述方式將無異常的未使用的金屬遮罩20的被檢查部EA[參照圖10(a)等]所涉及的形狀資料作為學習資料,使神經網路90作深度學習(Deep Learning)而構築的生成模型,具有所謂的自動編碼器(自編碼器)的構造。In addition, the
茲參照圖6就神經網路90的構造加以說明。圖6為概念性顯示神經網路90之構造的示意圖。如圖6所示,神經網路90係具有:作為編碼部的編碼器部91,從所輸入的形狀資料GA擷取特徵量(潛在變數)TA;及作為解碼部的解碼器部92,從該特徵量TA重建(reconstitution)形狀資料GB,而構成卷積型自動編碼器(CAE:Convolutional Auto-Encoder)的構造。The structure of the
卷積型自動編碼器之構造為公知技術,其詳細說明雖已省略,但編碼器部91具有複數個卷積層(Convolution Layer)93,在各卷積層93中,使用複數個過濾器(核心部分)94對輸入資料進行折疊運算的結果係作為下一層的輸入資料而輸出。同樣的,解碼器部92具有複數個反卷積層(Deconvolution Layer)95,在各反卷積層95中,對輸入資料使用複數個過濾器(核心部分)96進行反卷積型運算執行的結果係作為下一層的輸入資料而輸出。再者,後述的學習處理中,各過濾器94、96的權重(參數)可予以更新。The structure of a convolutional autoencoder is a well-known technology, and its detailed description is omitted, but the
檢查部78係為對金屬遮罩20的被檢查部EA有無異常進行檢查的功能部。本實施形態中,如圖9(a)、(b)所示,屬於金屬遮罩20之基板抵接面側的背面201側之1個開口部21的周邊部分預定範圍係設定為1個被檢查部EA。意即,在金屬遮罩20之背面201可設定複數個被檢查部EA。圖9(a)係為顯示從表面202側觀看的開口部21及其周邊部分之金屬遮罩20的局部放大俯視圖。圖9(b)為圖9(a)之A-A線的剖面圖。另外,圖9(a)之開口部21的周邊部分(表面202)中附加有散點花樣,俾易於判別該範圍。The
搬送機構控制部79為驅動控制搬送機構31的功能部,其係根據來自主控制部71的指令訊號來控制金屬遮罩20的位置。The transport
記憶部57係由HDD(硬碟機,Hard Disk Drive)或SSD(固態機,Solid State Drive)等所構成,具有將例如AI模型100(神經網路90及藉其學習而獲得的學習資訊)加以記憶的預定記憶領域。此種記憶領域係構成本實施形態中的模型儲存手段。The
通訊部58具備例如依據有線LAN(區域網路,Local Area Network)或無線LAN等通訊規格的無線通訊介面等,構成為可將各種資料和外部進行收發訊。The
接著,參照圖7的流程圖說明藉金屬遮罩檢查裝置30執行的神經網路90的學習處理。Next, the learning process of the
首先,作業人員要準備無異常(不具後述的各種異常部Q)且未使用的金屬遮罩20。此處所準備的金屬遮罩20較佳為具有和作為檢查對象的金屬遮罩20相同形狀的開口部21。但,金屬遮罩20的厚度或材質、開口部21的大小或配置布局等不必具有同一性,以依據多樣種類的學習資料學習者,在泛用性方面較佳。First, the operator prepares an
此外,作業人員係在將無前述異常的未使用金屬遮罩20配置在金屬遮罩檢查裝置30的預定檢查位置後,使主控制部71執行預定的學習程式。In addition, the operator causes the
根據預定的學習程式的執行,開始學習處理時,主控制部71首先係在步驟S101中進行用以實施神經網路90之學習的前處理。When starting the learning process based on the execution of a predetermined learning program, the
該前處理中,係施行與後述的檢查處理相關的影像資料取得處理(步驟S301)及三維形狀資料取得處理(步驟S302)同樣的處理。另外,有關這些處理的詳細內容將陳述於後,故在此處作簡單說明。In this preprocessing, the same processing as the image data acquisition processing (step S301 ) and the three-dimensional shape data acquisition processing (step S302 ) related to the inspection processing described later is performed. In addition, the details of these processes will be described later, so they will be briefly described here.
首先,針對金屬遮罩20之背面201側的預定檢查範圍,一邊使照射自第1照明裝置32A的第1圖案光之相位變化,一邊在相位不同的第1圖案光下進行4次的拍攝處理後,一邊使照射自第2照明裝置32B的第2圖案光的相位變化,一邊在相位不同的第2圖案光之下進行4次的拍攝處理,取得共計8種的區域影像資料。First, with respect to the predetermined inspection range on the
然後,以上述各圖案光之下分別拍攝的4套區域影像資料為基礎,利用公知的相移法,施行包含有複數個被檢查部EA(開口部21)的預定檢查範圍的三維形狀量測,且將量測結果(區域形狀資料)記憶在記憶部57。Then, on the basis of the 4 sets of area image data captured under each of the above-mentioned patterned lights, the three-dimensional shape measurement of the predetermined inspection range including a plurality of inspected parts EA (openings 21) is carried out by using the known phase shift method , and the measurement result (area shape data) is stored in the
另外,上述一系列的處理,係在取得包含和所需數量的被檢查部EA(開口部21的周邊部分)相關的形狀資料的區域形狀資料作為學習資料之前,係一面在金屬遮罩20的檢查範圍內移動,一面反覆進行。In addition, the above-mentioned series of processing is performed on the side of the
在步驟S101中,取得包含和學習所需數量的被檢查部EA相關的形狀資料的區域形狀資料時,在接下來的步驟S102中,根據來自主控制部71的指令,學習部77會準備未學習神經網路90。例如,將預先儲存於記憶部57等的神經網路90讀出。或者,依據將儲存於記憶部57等的網路構成資訊(例如,神經網路的層數或各層的節點數等)來構築神經網路90。In step S101, when the area shape data including the shape data related to the examined part EA required for learning is obtained, in the next step S102, according to the instruction from the
步驟S103中,係取得作為學習資料的學習用形狀資料(學習用的三維形狀資料)。具體而言,根據來自主控制部71的指令,資料處理部75會根據在步驟S101中記憶在記憶部57的區域形狀資料,從該區域形狀資料所包含的多數個被檢查部EA中擷取1個被檢查部EA,而取得和該被檢查部EA相關的形狀資料作為1個學習用形狀資料。然後,將該學習用形狀資料向學習部77輸出。意即,僅有無異常之未使用且和金屬遮罩20的被檢查部EA相關的形狀資料用作為學習資料(學習用形狀資料)。In step S103, shape data for learning (three-dimensional shape data for learning) are acquired as learning data. Specifically, according to the instruction from the
在步驟S104中,係取得重建形狀資料。具體而言,根據來自主控制部71的指令,學習部77會將步驟S103中取得的學習用形狀資料作為輸入資料,傳給神經網路90的輸入層,藉此取得從神經網路90的輸出層所輸出的重建形狀資料。In step S104, the reconstructed shape data is obtained. Specifically, according to the instruction from the
接下來的步驟S105中,學習部77會將在步驟S103中取得的學習用形狀資料、和步驟S104中藉神經網路90輸出的重建形狀資料相比較,判定其誤差是否充分夠小(是否在預定的臨界值以下)。In the following step S105, the learning
在此處,其誤差夠小的情況中,將神經網路90及其學習資訊(後述的更新後參數等)作為AI模型100儲存在記憶部57,並結束本學習處理。Here, if the error is sufficiently small, the
另一方面,其誤差不夠小的情況中,在步驟S106中,進行網路更新處理(神經網路90的學習)後,再返回步驟S103,重覆上述的一連串處理。On the other hand, if the error is not small enough, in step S106, the network update process (learning of the neural network 90) is performed, and then returns to step S103 to repeat the series of processes described above.
具體而言,在步驟S105的網路更新處理中,係使用例如誤差倒傳播法(Backpropagation)等公知的學習運算法,為了將神經網路90中的上述各過濾器94、96的權重(參數)更新為更適切者,以使表示學習用形狀資料與重建形狀資料之差分的損失函數極力縮小。另外,亦可利用例如BCE(二值化交叉熵,Binary Cross-entropy)作為損失函數。Specifically, in the network update process of step S105, known learning algorithms such as error backpropagation (Backpropagation) are used, in order to set the weights (parameters) of the above-mentioned
透過將這些處理反覆施行幾遍,在神經網路90中,學習用形狀資料與重建形狀資料的誤差會變極小,得以輸出更正確的重建形狀資料。By repeating these processes several times, in the
接著,參照圖8的流程圖說明藉金屬遮罩檢查裝置30執行的金屬遮罩檢查處理。但,圖8所示的檢查處理係為依金屬遮罩20的每個預定檢查範圍執行的處理。Next, the metal mask inspection process executed by the metal
將金屬遮罩檢查裝置30搬入金屬遮罩20,並定位在預定的檢查位置時,即根據預定的檢查程式的執行,開始檢查處理。When the metal
檢查處理開始時,首先,係在步驟S301執行影像資料取得處理。本實施形態中,係在和金屬遮罩20之背面201側的各檢查範圍相關的檢查中,使照射自第1照明裝置32A的第1圖案光的相位變化,在相位不同的第1圖案光下執行4次拍攝處理後,一面使照射自第2照明裝置32B的第2圖案光的相位變化,一面在相位不同的第2圖案光之下進行4次的拍攝處理,取得合計8套的影像資料。詳細說明如下。When the inspection process is started, first, the image data acquisition process is executed in step S301. In this embodiment, in the inspection related to each inspection range on the
如上所述,朝金屬遮罩檢查裝置30搬入的金屬遮罩20定位固定在預定的檢查位置時,依據來自主控制部71的指令,移動機構控制部76首先會驅動控制X軸移動機構32D及Y軸移動機構32E,使檢查單元32移動,將攝像機32C的拍攝視角(拍攝範圍)對準金屬遮罩20之背面201的預定檢查範圍。As described above, when the
並且,照明控制部72會將控制兩照明裝置32A、32B的液晶快門32Ab、32Bb進行切換,將形成在該兩液晶快門32Ab、32Bb的第1格子及第2格子的位置設定在預定的基準位置。In addition, the
第1格子及第2格子的切換設定完成時,照明控制部72會使第1照明裝置32A的第1光源32Aa點亮,將第1圖案光照射,並且,攝像機控制部73會驅動控制攝像機32C,執行在該第1圖案光之下的第1次拍攝處理。另外,藉拍攝處理生成的影像資料係隨時被取入影像取得部74(以下相同)。依據這種構成,即可取得包含複數個被檢查部EA(開口部21)的檢查範圍的區域影像資料。When the switching setting of the first grid and the second grid is completed, the
然後,照明控制部72係在第1圖案光之下的第1次拍攝處理結束之同時,熄滅第1照明裝置32A的第1光源32Aa,並且執行第1液晶快門32Ab的切換處理。具體而言,係將形成第1液晶快門32Ab的第1格子的位置從前述基準位置向第1圖案光的相位偏移4分之1節距(90°)的第2位置進行切換設定。Then, the
第1格子的切換設定完成時,照明控制部72會使第1照明裝置32A之光源32Aa點亮,照射第1圖案光,同時,攝像機控制部73會驅動控制攝像機32C,在該第1圖案光之下執行第2次拍攝處理。然後,透過反覆執行同樣的處理,取得相位逐次相差90°的第1圖案光之下的4套區域影像資料。When the switch setting of the first grid is completed, the
接著,照明控制部72會使第2照明裝置32B的第2光源32Ba點亮,照射第2圖案光,並且以攝像機控制部73驅動控制攝像機32C,在該第2圖案光之下進行第1次的拍攝處理。Next, the
然後,在第2圖案光之下的第1次拍攝處理結束的同時,照明控制部72會將第2照明裝置32B的第2光源32Ba熄滅,同時執行第2液晶快門32Bb的切換處理。具體而言,係將形成於第2液晶快門32Bb的第2格子的位置,從前述基準位置向第2圖案光的相位偏移4分之1節距(90°)的第2位置進行切換設定。Then, when the first imaging process under the second pattern light ends, the
第2格子的切換設定完成時,照明控制部72會使第2照明裝置32B之光源32Ba點亮,並照射第2圖案光,同時,攝像機控制部73會驅動控制攝像機32C,並執行在該第2圖案光之下的第2次拍攝處理。以後,透過反覆進行同樣的處理,取得相位逐次相差90°的第2圖案光之下的4種區域影像資料。When the switching setting of the second grid is completed, the
在下一步驟S302中,執行三維形狀資料的取得處理。具體而言,依據來自主控制部71的指令,資料處理部75會在上述步驟S301中依據各圖案光之下分別拍攝的4種區域影像資料,透過公知的相移法,進行包含複數個被檢查部EA(開口部21)的預定檢查範圍的三維形狀量測,且將相關的量測結果(區域形狀資料)記憶在記憶部57。依據執行相關處理的功能,而構成本實施形態的形狀資料取得手段。另外,本實施形態中,由於是從2個方向照射圖案光來進行三維形狀的量測,故可防止未照射圖案光之陰影部分的產生。In the next step S302, the acquisition process of the three-dimensional shape data is performed. Specifically, according to the instruction from the
接著,在步驟S303中,係取得和各被檢查部EA相關的檢查用形狀資料(檢查用的三維形狀資料)。Next, in step S303, shape data for inspection (three-dimensional shape data for inspection) related to each inspected portion EA is acquired.
具體而言,首先,依據來自主控制部71的指令,資料處理部75會依據在上述步驟S302取得的和預定檢查範圍相關的區域形狀資料,特定並擷取該區域形狀資料所包含的全部複數個被檢查部EA。Specifically, first, according to the instruction from the
繼之,將這些分別編號並登記作為被檢查部EA涉及的原形狀資料。本處理中,例如取得圖10(a)所示之無異常的被檢查部EA涉及的原形狀資料、或如圖10(b)~(e)所示之有某些異常的被檢查部EA涉及的原形狀資料等。Then, these are individually numbered and registered as original shape data related to the inspected portion EA. In this process, for example, the original shape data related to the non-abnormal inspected part EA as shown in Fig. 10(a), or the inspected part EA with some abnormalities as shown in Fig. 10(b) to (e) is acquired. The original shape data involved, etc.
在步驟S304中,實施重建處理(重建形狀資料取得處理)。利用實施本處理的功能,而構成本實施形態中的重建形狀資料取得手段。In step S304, reconstruction processing (reconstruction shape data acquisition processing) is performed. The reconstructed shape data acquisition means in this embodiment is constituted by the function of performing this processing.
具體而言,依據來自主控制部71的指令,檢查部78會將步驟S303取得的預定號碼(例如第001號)的被檢查部EA涉及的原形狀資料輸入AI模型100的輸入層。接著,將藉AI模型100重建並從輸出層輸出的形狀資料,取得作為前述預定號碼(例如第001號)之被檢查部EA涉及的重建形狀資料,同時,將該重建形狀資料和同一編號的原形狀資料建立關連並加以記憶。依此方式,本處理中,針對在步驟S303中編號登記的全部被檢查部EA,可取得重建形狀資料。Specifically, according to an instruction from the
在此處,AI模型100將如圖10(a)所示的無異常之被檢查部EA相關的原形狀資料輸入時是當然的,即使是在將具有如圖10(b)~(e)所示之異常的被檢查部EA涉及的原形狀資料輸入的情況,透過以上述方式進行學習,即可將如圖10(a)所示的無異常被檢查部EA涉及的形狀資料輸出作為重建形狀資料。Here, it is natural for the
步驟S305中,係執行良否的判定處理。具體而言,依據來自主控制部71的指令,檢查部78首先會將同一號碼的原形狀資料和重建形狀資料相比較,並擷取兩形狀資料的差分。藉由實施此種處理的功能,構成本實施形態中的比較手段。In step S305, a judgment process of good or bad is executed. Specifically, according to the command from the
接著,檢查部78會判定兩形狀資料的差分,亦即,相當於異常部Q的部分是否大於預定臨界值。在此處,兩影像資料的差分較預定的臨界值大時,即判定為「有異常」。Next, the
例如,如圖9(a)、(b)所示,金屬遮罩20之背面201側的被檢查部EA存在有異常部Q的情況中,在該異常部Q之深度d及寬度w的兩判定項目分別超過預定的臨界值的情況時,係判定為「有異常」。For example, as shown in FIGS. 9( a ) and ( b ), when there is an abnormal part Q in the inspection part EA on the
依據這種構成,例如圖10(b)所示,金屬遮罩20之背面201側的開口部21周緣的倒角部Q1藉由過多的電解研磨處理等而變得過於圓弧時,該倒角部Q1也會被視為異常部Q。According to this configuration, for example, as shown in FIG. 10( b ), when the chamfered portion Q1 around the
同樣地,如圖10(c)所示,被檢查部EA存在有與開口部21相連的凹陷或切痕等傷口Q2時,或如圖10(d)所示,開口部21的周緣產生變形Q3時,係依其程度而視為異常部Q。Similarly, as shown in FIG. 10( c ), when there is a wound Q2 such as a depression or a notch connected to the
另一方面,兩影像資料的差分較預定的臨界值小的情況中,係判定為「無異常」。透過執行這些判定的功能,構成本實施形態中的判定手段。On the other hand, when the difference between the two image data is smaller than a predetermined threshold value, it is determined as "no abnormality". The judging means in this embodiment is constituted by performing these judging functions.
在此處,檢查部78係在針對區域形狀資料(金屬遮罩20的預定檢查範圍)所包含的全部被檢查部EA判定為「無異常」的情況中,將該區域形狀資料相關的檢查範圍判定為「良好」,同時將該結果記憶在記憶部57,並結束本處理。Here, when the
再一方面,區域形狀資料(金屬遮罩20的預定檢查範圍)所包含的複數個被檢查部EA之中,被判定為「有異常」的被檢查部EA僅存在1個時,係將該區域形狀資料相關的檢查範圍判定為「不良」並將該結果記憶在記憶部57,並結束本處理。On the other hand, if there is only one inspected part EA judged to be "abnormal" among the plurality of inspected parts EA included in the area shape data (planned inspection range of the metal mask 20), the The inspection range related to the area shape data is judged to be "defective", the result is stored in the
接著,金屬遮罩檢查裝置30針對金屬遮罩20之背面201的所有檢查範圍執行上述檢查處理的結果,對全部檢查範圍判定為「良好」時,即判定為無異常的金屬遮罩20(判定及格),並經由顯示部56或通訊部58等將其意旨告知作業人員。Next, the metal
另一方面,金屬遮罩20上的全部檢查範圍中存在有1個被判定為「不良」的檢查範圍時,金屬遮罩檢查裝置30即判定(不及格判定)為有異常的金屬遮罩20,並經由顯示部56或通訊部58等將該意旨告知作業人員。On the other hand, when there is one inspection range judged as "defective" among all the inspection ranges on the
如以上所詳述,本實施形態中,係從金屬遮罩20的表背兩面之中,在焊劑印刷時會成為和印刷基板1抵接的基板抵接面側的背面201側,實施和開口部21周邊部、亦即預定被檢查部EA相關的檢查。As described in detail above, in this embodiment, of the front and back surfaces of the
藉此,成為印刷時造成膏狀焊劑5之滲透或涶流等原因之與金屬遮罩20之背面201側的開口部21周邊(被檢查部EA)相關的各種異常部Q(Q1~Q4)均可檢測出來。結果,發生印刷不良的情形可獲得抑制。Thereby, various abnormal parts Q (Q1 to Q4) related to the periphery of the opening 21 (the part to be inspected EA) on the
特別是,本實施形態中,係使用學習神經網路90構築的AI模型100來判定金屬遮罩20的被檢查部EA是否存在異常部Q(Q1~Q4)。依據這種構成,習知技術中難以檢測的微小異常可加以檢測出。In particular, in this embodiment, the
再者,本實施形態中,因為要將拍攝被檢查部EA所得的原形狀資料與依據其原形狀資料重建所得的重建形狀資料作比較,故在相比較的兩形狀資料中,不會有基於屬於檢查對象物之金屬遮罩20側的拍攝條件(例如,金屬遮罩20的配置位置或配置角度、彎曲等)、或金屬遮罩檢查裝置30側的拍攝條件(例如,照明狀態或攝像機32C的畫角等)的差異而產生影響,故可更正確地檢測更微細的異常部Q。Furthermore, in this embodiment, because the original shape data obtained by photographing the inspected part EA will be compared with the reconstructed shape data reconstructed based on the original shape data, there will be no difference between the two compared shape data. Shooting conditions on the side of the
另外,在假定進行處於金屬遮罩20之預定位置的預定被檢查部EA(開口部21的周邊部分)相關的檢查之際,需要該被檢查部EA的構成資訊(位置資料或尺寸資料等)作為良否判定基準的構成中,係將例如賈伯資料(Gerber data)等基板設計資訊預先記憶,適當成為取得檢查對象的被檢查部EA的構成資訊,且和該構成資訊比較,同時進行將要成為檢查對象的被檢查部EA的良否判定,因此會有檢查效率降低之虞。而且,金屬遮罩20對檢查位置的定位也須正確進行。In addition, when it is assumed that an inspection is performed on a predetermined inspected portion EA (peripheral portion of the opening 21 ) at a predetermined position of the
對於此點,若依據本實施形態,因係利用針對被檢查部EA學習的AI模型100,進行各被檢查部EA的檢查的構成,故不必將多數的被檢查部EA各自的構成資訊預先記憶,故在檢查之際,不必參照這些資料,故可謀求檢查效率的提升。In this regard, according to the present embodiment, since the
除此之外,本實施形態中,焊劑印刷時係以要作為和印刷基板1抵接的金屬遮罩20的基板抵接面側之背面201朝向下方配置的狀態,從金屬遮罩20的下側藉檢查單元32施行檢查的構成。In addition, in the present embodiment, during solder printing, the
依據這種構成,即不易受到室內照明等外擾光的影響,可謀求檢查精度的提升。特別是,像利用相移法時,可不易受到微細之亮度變化影響的環境下進行檢查時,更能達到功效。According to this configuration, it is less likely to be affected by external disturbance light such as indoor lighting, and the inspection accuracy can be improved. In particular, it is more effective when inspection can be performed in an environment that is not easily affected by subtle brightness changes, such as when using the phase shift method.
另外,並不限定於上述實施形態的記載內容,例如,也可依下述方式實施。當然,也可為未在下文中例示的其他應用例、變化例。In addition, it is not limited to the description content of the said embodiment, For example, it can implement as follows. Of course, other application examples and modification examples not exemplified below are also possible.
(a)網遮罩的構成並不限定於上述實施形態涉及的金屬遮罩20,也可採用其他的構成。(a) The configuration of the mesh mask is not limited to the
(a-1)例如,上述實施形態涉及的金屬遮罩20,係由遮罩本體部20a及框架部20b所構成,但非限定於此,也可作成省略框架部20b的構成。(a-1) For example, the
(a-2)上述實施形態涉及的遮罩本體部20a係藉金屬材料形成。但不限於此,作為遮罩本體部20a也可採用例如:在將尼龍製、聚酯製、不銹鋼製等線材編織而成的「紗(篩網)」上塗布感光性乳劑等而形成被覆部,且只有相當於開口部21的部分露出「紗」的類型;在「紗(篩網)」上黏貼形成有開口部21的金屬版而成的複合型製品。(a-2) The
(b)生產線10等和印刷基板1之製造相關的構成,不限定於上述實施形態,也可採用其他構成。(b) The configuration related to the production of the printed
(b-1)上述實施形態中,係採取將清潔裝置29及金屬遮罩檢查裝置30併設在焊劑印刷機12之附近的構成。但不限於此,也可將清潔裝置及/或金屬遮罩檢查裝置的功能和焊劑印刷機12或焊劑印刷檢查裝置13一體組裝的構成。(b-1) In the above embodiment, the
(b-2)清潔裝置29或金屬遮罩檢查裝置30也可採取獨立設置於生產線10等之其它空間的構成。(b-2) The
(c)和金屬遮罩檢查裝置30相關的構成,並非限定於上述實施形態,也可採用其他的構成。(c) The configuration related to the metal
例如,上述實施形態中,也可為焊劑印刷時以成為和印刷基板1抵接的金屬遮罩20之基板抵接面側的背面201朝向下方的方式配置,藉檢查單元32從金屬遮罩20的下側實施檢查的構成。For example, in the above-mentioned embodiment, it may be arranged such that the
不限於此,也可作成在以金屬遮罩20之背面201(基板抵接面)側朝向上方的方式配置的狀態,藉由配置於金屬遮罩20上方的檢查單元32從上側執行檢查的構成。但,在抑制室內照明等外擾光的影響,謀求提升檢查精度方面,較佳為以配置成金屬遮罩20的背面201側朝向下方的狀態執行檢查。It is not limited to this, and it may be arranged so that the back surface 201 (substrate abutting surface) side of the
(d)作為辨別手段的AI模型100(神經網路90)的構成及其學習方法,並不限定於上述實施形態。(d) The configuration of the AI model 100 (neural network 90 ) as a discrimination means and its learning method are not limited to the above-mentioned embodiments.
(d-1)上述實施形態中,特別是(上文中未提及)在進行神經網路90的學習處理、金屬遮罩檢查處理中的重建處理之際,亦可依需要採取對各種資料執行正規化等處理的構成。(d-1) In the above-mentioned embodiment, especially (not mentioned above) when performing the learning process of the
(d-2)神經網路90的構造並不限定於圖6所示的樣態,例如,也可為在卷積層93之後設置池化層的構成。當然,神經網路90的層數、各層的節點數、各節點的連接構造等也可採用不同的構成。(d-2) The structure of the
(d-3)上述實施形態中,AI模型100(神經網路90)雖係作成具有卷積型自動編碼器(CAE)之構造的生成模型,但也可為例如變分自編碼器(VAE:Variational Autoencoder)等具有不同形態的自動編碼器構造的生成模型。(d-3) In the above embodiment, although the AI model 100 (neural network 90) is a generative model having a structure of a convolutional autoencoder (CAE), it may be, for example, a variational autoencoder (VAE : Variational Autoencoder) and other generative models with different forms of autoencoder construction.
(d-4)上述實施形態中,係採取藉誤差倒傳播法令神經網路90學習的構成,但不限於此,也可作成使用其他各種學習運算法學習的構成。(d-4) In the above embodiment, the
(d-5)神經網路90也可用所謂AI晶片等AI處理專用迴路來構成。在此情形中,只有參數等學習資訊會記憶在記憶部57,且透過以AI處理專用迴路將其讀出並設定在神經網路90,而構成AI模型100。(d-5) The
(d-6)上述實施形態中也可為具備有學習部77,在該控制裝置33內執行神經網路90之學習的構成,但非僅限於此,只要將至少AI模型100(已完成學習的神經網路90)記憶在記憶部57即可,亦可為將學習部77省略的構成。因而,也可採取神經網路90的學習係在控制裝置33的外部進行並將其記憶在記憶部57的構成。(d-6) In the above-mentioned embodiment, a
(e)金屬遮罩20(被檢查部EA)的檢查方法不限定於上述實施形態,也可採用其他的構成。(e) The inspection method of the metal mask 20 (inspected part EA) is not limited to the above-mentioned embodiment, and other configurations may be employed.
(e-1)例如,上述實施形態中,也可構成為透過使用AI模型(生成模型)100擷取原形狀資料和重建形狀資料的差分來判定被檢查部EA有否異常部Q。(e-1) For example, in the above embodiment, it may be configured to determine whether there is an abnormal part Q in the inspected part EA by using the AI model (generated model) 100 to extract the difference between the original shape data and the reconstructed shape data.
不限於此,也可構成為不用AI模型100,而例如預先記憶的基準形狀資料(位置資料或尺寸資料等被檢查部EA的構成資訊)、和算出的被檢查部EA的形狀資料相比較,以判定被檢查部EA中有否異常部Q。It is not limited thereto, and the
(e-2)上述實施形態中,構成為被檢查部EA中存在有異常部Q的情形中,該異常部Q的深度d及寬度w等兩個判定項目分別超過預定的臨界值時,即判定為「有異常」。(e-2) In the above-mentioned embodiment, when there is an abnormal part Q in the inspected part EA, when the two judgment items such as the depth d and the width w of the abnormal part Q exceed predetermined critical values, namely It was judged as "abnormal".
不限於此,例如構成為異常部Q的深度d及寬度w之中,至少一者的判定項目超過預定的臨界值時,即判定為「有異常」。It is not limited thereto, for example, it is configured such that when at least one of the determination items of the depth d and the width w of the abnormal portion Q exceeds a predetermined threshold value, it is determined that “there is an abnormality”.
再者,構成為增加判定項目,在異常部Q的深度d、寬度w、長度l及體積v之中,至少1個判定項目或預定的複數個判定項目超過預定的臨界值時,即判定為「有異常」。當然,也可採判定項目只設定1個的構成。Furthermore, it is configured to add more judgment items, and when at least one judgment item or a predetermined plurality of judgment items exceeds a predetermined threshold value among the depth d, width w, length l, and volume v of the abnormal part Q, it is judged to be "There are exceptions." Of course, only one determination item may be set.
(e-3)所檢測的異常部Q之種類並不限定於上述實施形態所例示者,也可採用可檢測其他異常部Q的構成。例如,在上述實施形態中,作為異常部Q,係例示過多的研磨且過度圓弧化的倒角部Q1[參照圖10(b)]、連通到開口部21的傷痕Q2[參照圖10(c)]、開口部21周緣的變形Q3[參照圖10(d)]等。(e-3) The type of abnormal part Q to be detected is not limited to those exemplified in the above embodiment, and a configuration capable of detecting other abnormal parts Q may be employed. For example, in the above-mentioned embodiment, as the abnormal part Q, the chamfered part Q1 [refer to FIG. c)], deformation Q3 of the periphery of the opening 21 [see FIG. 10(d)], and the like.
不限於此,也可構成為例如圖10(e)所示,將被檢查部EA中附著有異物Q4的部位(附著於被檢查部EA的異物Q4)當作異常部Q實施檢測。It is not limited thereto, and may be configured, for example, as shown in FIG.
另外,在未使用過的金屬遮罩20中附著有異物Q4的可能性極少,例如用清潔裝置29施行金屬遮罩20的清潔後,將該金屬遮罩20再度透過焊劑印刷機12使用之際,在該金屬遮罩20之背面201側的開口部21周邊部分(被檢查部EA),會有無法以清潔手段完全去除之膏狀焊劑5或助熔劑(flux)等微小的殘留物固著的狀態下殘留的情形。In addition, there is very little possibility of foreign matter Q4 adhering to the
依此方式,在被檢查部EA附著有異物Q4的情況中,在印刷焊劑時,會由於被檢查部EA(金屬遮罩20之背面201側的開口部21周邊部分)浮起,而有造成膏狀焊劑流動、滲透或涶流等的原因之虞。In this way, when the foreign matter Q4 adheres to the part to be inspected EA, the part to be inspected EA (peripheral portion of the
(e-4)上述實施形態中,係構成為在進行金屬遮罩20(被檢查部EA)的檢查之際,照射圖案光執行三維量測,但取而代之,亦可構成為根據一面照射均勻光一面拍攝而取得的和被檢查部EA相關的二維亮度影像資料,檢測出異常部Q。(e-4) In the above-mentioned embodiment, when the metal mask 20 (inspected part EA) is inspected, three-dimensional measurement is performed by irradiating patterned light, but instead, it may be configured by irradiating uniform light on one surface. The abnormal part Q is detected by taking the two-dimensional luminance image data related to the inspected part EA obtained by shooting.
此時,也可構成為例如使用和上述AI模型100相異的其他AI模型(已完成學習的神經網路),依據上述二維亮度影像資料,從因被檢查部EA的凹凸形狀等而相異的反射率(反射光的亮度值)等的差異,取得和被檢查部EA相關的形狀資料。In this case, for example, using another AI model (a learned neural network) different from the above-mentioned
(f)三維量測方法不限於上述實施形態,也可採用其他的構成。(f) The three-dimensional measurement method is not limited to the above-mentioned embodiment, and other configurations may also be adopted.
(f-1)例如,上述實施形態中,係在藉相移法執行三維量測的基礎上,取得各圖案光的相位逐次相差90°的4種影像資料的構成,但相位移位次數及相位移位量並不限定於此。也可採用可藉由相移法實施三維量測的其他相位移位次數及相位移位量。(f-1) For example, in the above embodiment, on the basis of performing three-dimensional measurement by the phase shift method, four types of image data in which the phases of each pattern light are successively different by 90° are obtained, but the number of phase shifts and The amount of phase shift is not limited to this. Other phase shift times and phase shift amounts that can be measured three-dimensionally by the phase shift method can also be used.
例如,也可設成取得相位逐次相差120°(或90°)的3種影像資料來進行三維量測的構成,亦可採用取得相位逐次相差180°(或90°)的2種影像資料來進行三維量測的構成。For example, it can also be configured to obtain three types of image data with successive phase differences of 120° (or 90°) for three-dimensional measurement, or to obtain two types of image data with successive phase differences of 180° (or 90°). Composition for 3D measurement.
(f-2)上述實施形態中,雖採用了相移法作為三維量測法,但也不限定於此,亦可採用光切斷法或波紋法、聚焦、空間代碼法等其他三維量測法。(f-2) In the above-mentioned embodiment, although the phase shift method is used as the three-dimensional measurement method, it is not limited to this, and other three-dimensional measurement methods such as the light cutting method, the moire method, focusing, and the spatial code method can also be used. Law.
1:印刷基板
3:島部
5:膏狀焊劑
10:生產線
12:焊劑印刷機
20:金屬遮罩
21:開口部
29:清潔裝置
30:金屬遮罩檢查裝置
32:檢查單元
32A:第1照明裝置
32B:第2照明裝置
32C:攝像機
33:控制裝置
77:學習部
78:檢查部
90:神經網路
100:AI模型
201:背面
202:表面
EA:被檢查部
Q:異常部1: Printed substrate
3: Island Department
5: Paste flux
10: Production line
12: Solder printing machine
20: metal mask
21: opening
29: Cleaning device
30: Metal mask inspection device
32: Check
圖1為印刷基板的一部分經放大後的局部放大俯視圖。 圖2為顯示印刷基板之生產線的構成之方塊圖。 圖3為用以說明藉由焊劑印刷機之印刷動作的示意圖。 圖4為示意性顯示金屬遮罩檢查裝置的概略構成圖。 圖5為顯示金屬遮罩檢查裝置之功能構成的方塊圖。 圖6為用以說明神經網路之構造的示意圖。 圖7為神經網路之學習處理流程的流程圖。 圖8為顯示檢查處理的流程之流程圖。 圖9中,(a)為顯示從表面側觀看之開口部及其周邊部分之金屬遮罩的局部放大俯視圖,(b)為(a)之AA線剖面圖。 圖10中,(a)為顯示無異常的開口部及其周邊部分之金屬遮罩的局部放大剖面圖,(b)~(e)為顯示有異常的開口部及其周邊部分之金屬遮罩的局部放大剖面圖。FIG. 1 is an enlarged partial top view of a part of a printed substrate. Fig. 2 is a block diagram showing the configuration of a production line for printed circuit boards. FIG. 3 is a schematic diagram for explaining a printing operation by a solder printer. FIG. 4 is a schematic configuration diagram schematically showing a metal mask inspection device. Fig. 5 is a block diagram showing the functional configuration of the metal mask inspection device. FIG. 6 is a schematic diagram illustrating the structure of a neural network. FIG. 7 is a flow chart of the learning process of the neural network. FIG. 8 is a flowchart showing the flow of inspection processing. In FIG. 9 , (a) is a partial enlarged plan view of the metal mask showing the opening and its peripheral portion viewed from the surface side, and (b) is a cross-sectional view along line AA of (a). In Fig. 10, (a) is a partially enlarged cross-sectional view of the metal mask showing the opening without abnormalities and its surrounding parts, and (b) to (e) are the metal masks showing the abnormal opening and its surrounding parts A partial enlarged cross-sectional view.
20:金屬遮罩 20: metal mask
20a:遮罩本體部 20a: mask body part
20b:遮罩框架部 20b: mask frame part
21:開口部 21: opening
30:金屬遮罩檢查裝置 30: Metal mask inspection device
31:搬送機構 31: Transport mechanism
31a:搬送軌道 31a: Transport track
31b:輸送帶 31b: conveyor belt
32:檢查單元 32: Check unit
32A:第1照明裝置 32A: 1st lighting device
32Aa:第1光源 32Aa: 1st light source
32B:第2照明裝置 32B: Second lighting device
32Ba:第2光源 32Ba: Second light source
32Ab,32Bb:液晶快門 32Ab, 32Bb: liquid crystal shutter
32C:攝像機 32C: camera
201:背面 201: back
202:表面 202: surface
Claims (5)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020-105480 | 2020-06-18 | ||
| JP2020105480A JP7091010B2 (en) | 2020-06-18 | 2020-06-18 | Screen mask inspection device |
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| Publication Number | Publication Date |
|---|---|
| TW202202009A TW202202009A (en) | 2022-01-01 |
| TWI797617B true TWI797617B (en) | 2023-04-01 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110117048A TWI797617B (en) | 2020-06-18 | 2021-05-12 | Mesh mask inspection device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7091010B2 (en) |
| TW (1) | TWI797617B (en) |
| WO (1) | WO2021256076A1 (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW389840B (en) * | 1998-08-10 | 2000-05-11 | Mitsubishi Electric Corp | Apparatus for inspecting printed circuit boards |
| JP2005203424A (en) * | 2004-01-13 | 2005-07-28 | Yamaha Motor Co Ltd | Data creation method, data creation apparatus, screen printing inspection method, screen printing inspection apparatus, and screen printing machine |
| JP2015145092A (en) * | 2014-02-03 | 2015-08-13 | 株式会社プロセス・ラボ・ミクロン | Metal mask and manufacturing method thereof |
| JP2018195119A (en) * | 2017-05-18 | 2018-12-06 | 住友電装株式会社 | Anomaly detection apparatus and anomaly detection method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3758463B2 (en) * | 2000-05-09 | 2006-03-22 | 松下電器産業株式会社 | Screen printing inspection method |
-
2020
- 2020-06-18 JP JP2020105480A patent/JP7091010B2/en active Active
-
2021
- 2021-04-20 WO PCT/JP2021/016053 patent/WO2021256076A1/en not_active Ceased
- 2021-05-12 TW TW110117048A patent/TWI797617B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW389840B (en) * | 1998-08-10 | 2000-05-11 | Mitsubishi Electric Corp | Apparatus for inspecting printed circuit boards |
| JP2005203424A (en) * | 2004-01-13 | 2005-07-28 | Yamaha Motor Co Ltd | Data creation method, data creation apparatus, screen printing inspection method, screen printing inspection apparatus, and screen printing machine |
| JP2015145092A (en) * | 2014-02-03 | 2015-08-13 | 株式会社プロセス・ラボ・ミクロン | Metal mask and manufacturing method thereof |
| JP2018195119A (en) * | 2017-05-18 | 2018-12-06 | 住友電装株式会社 | Anomaly detection apparatus and anomaly detection method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7091010B2 (en) | 2022-06-27 |
| JP2021196326A (en) | 2021-12-27 |
| TW202202009A (en) | 2022-01-01 |
| WO2021256076A1 (en) | 2021-12-23 |
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