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TWI797689B - Apparatus and method for performing internal defects inspection of an electronic component - Google Patents

Apparatus and method for performing internal defects inspection of an electronic component Download PDF

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TWI797689B
TWI797689B TW110127311A TW110127311A TWI797689B TW I797689 B TWI797689 B TW I797689B TW 110127311 A TW110127311 A TW 110127311A TW 110127311 A TW110127311 A TW 110127311A TW I797689 B TWI797689 B TW I797689B
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electronic component
light source
infrared light
image capture
capture unit
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TW110127311A
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TW202246761A (en
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志川 唐
萬泉 鄭
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馬來西亞商正齊科技有限公司
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    • H10P74/203
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • G01N21/9505Wafer internal defects, e.g. microcracks

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  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
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Abstract

The present invention relates to an apparatus (1) and method (2) for performing internal defects inspection of an electronic component comprising of an image capturing unit (102) is arranged in a configuration whereby said electronic component (101) is within the field of view (FOV) of said image capturing unit (102); and at least one infrared (IR) light source (104, 106, 107); wherein said image capturing unit (102) and said IR light source (104, 106, 107) is positioned and tilted to an angle of 0° to 360° with reference to their respective horizontal plane (ICHP, IRHP) whereby said IR light source (104, 106, 107) is capable of illuminating at least one internal defect (108) of said electronic component (101); and said electronic component (101) is positioned to an angle of 0° with reference to its horizontal plane (ECHP).

Description

檢查電子元件內部缺陷的裝置及方法Device and method for inspecting internal defects of electronic components

本發明是有關於一種檢查電子元件內部缺陷的裝置及方法,其包括:一圖像擷取單元,該電子元件位於該圖像擷取單元的視場內;以及至少一紅外線光源;其中,該圖像擷取單元和該紅外線光源被擺成相對於各自的水平面傾斜0至360度的角度,因此該紅外線光源能夠照亮該電子元件的至少一個內部缺陷,且該電子元件被擺成與其水平面的角度為0度。 The present invention relates to a device and method for inspecting internal defects of electronic components, which includes: an image capture unit, the electronic component is located in the field of view of the image capture unit; and at least one infrared light source; wherein, the The image capture unit and the infrared light source are arranged at an angle of 0 to 360 degrees with respect to their respective horizontal planes, so that the infrared light source can illuminate at least one internal defect of the electronic component, and the electronic component is placed at an angle relative to its horizontal plane The angle is 0 degrees.

晶粒背面碎裂是一種故障機制,在鋸切晶圓後,沿著晶粒背面的邊緣會發生碎裂。因此,晶粒的背面將有因物理斷裂並從背面邊緣的諸多地方脫落的小缺口所造成的粗糙邊緣。這跡象間接地說明,鋸切操作壓力很大,隨後可能會導致晶粒開裂。設備不當的設置可能會無意中用力降落在晶粒上,並切斷其一部分。因此,晶圓鋸切後的背面碎裂的跡象必須迅速解決。 Die backside chipping is a failure mechanism that occurs along the edge of the backside of the die after sawing the wafer. As a result, the back side of the die will have a rough edge caused by small nicks that physically break and come off in various places along the back side edge. This is an indirect indication that the sawing operation is stressful and may subsequently lead to grain cracking. Improper setup of the equipment may inadvertently land hard on the die and cut off a portion of it. Therefore, signs of backside chipping after wafer sawing must be addressed quickly.

Nikoonahad等人於US5883710A公開了一種高靈敏度和高處理能力的表面檢查系統,其將聚焦的光束以入射餘角(grazing angle)入射待檢查的表面。在光束和表面之間引起相對運動,使光束掃描一基本上覆蓋整個表面的掃描路徑,且沿該路徑散射的光被收集用於檢測異常。該掃描路徑包括複數個由直線掃描路徑段構成的陣列。聚焦的光束照射在寬度 介於5-15微米之間的表面區域,該系統每小時能夠檢查超過約40個直徑150毫米的晶圓(6英寸晶圓)、超過約20個直徑200毫米的晶圓(8英寸晶圓)或超過約10個直徑300毫米的晶圓(12英寸晶圓)。然而,US5883710A致力於表面缺陷檢查,而本發明是檢測半導體裝置中有無內部缺陷。此外,本發明能夠識別和區分表面缺陷和內部缺陷。 Nikoonahad et al. disclosed in US5883710A a surface inspection system with high sensitivity and high throughput, which makes a focused beam incident on the surface to be inspected at a grazing angle. Relative motion is induced between the beam and the surface such that the beam scans a scan path substantially covering the entire surface, and light scattered along the path is collected for detecting anomalies. The scan path includes a plurality of arrays of rectilinear scan path segments. The focused beam illuminates the width of the With a surface area between 5-15 microns, the system is capable of inspecting more than about 40 wafers with a diameter of 150 mm (6-inch wafers), more than about 20 wafers with a diameter of 200 mm (8-inch wafers) per hour ) or more than about 10 300 mm diameter wafers (12-inch wafers). However, US5883710A is devoted to surface defect inspection, while the present invention is to detect the presence or absence of internal defects in a semiconductor device. Furthermore, the present invention is capable of identifying and distinguishing between surface defects and internal defects.

再如John S.Batchelder於US4740708A公開了一種檢查半導體晶圓表面的系統及方法。該系統及方法旨在確定在製造積體電路的過程中,已充分清除了表面上的微粒污染物。晶圓沿第一方向前進,並沿垂直於第一方向的第二方向進行光學掃描,以根據掃描線上的位置記錄從晶圓表面正常反射的光強度。高強度的反射表明了一個光滑的平面,適合透過積分半球法與複數光感測器來檢查其中的粒子。弱反射表明起伏和圖案化的區域,不利於晶圓表面的粒子檢驗。第二次掃描被橫向偏移,以補償晶片的運動,以便重新掃描與第一次掃描相同的線。在第二次掃描過程中,積分球中的光感測器在由第一次掃描判斷出的適當檢查點的位置上被導通和關關。這種方法同樣限制了US5883710A,因為該系統及方法無法檢查和檢測是否存在內部缺陷,如微裂紋。 Another example is that John S. Batchelder discloses a system and method for inspecting the surface of a semiconductor wafer in US4740708A. The systems and methods are directed to determining that surfaces have been sufficiently cleaned of particulate contamination during the fabrication of integrated circuits. The wafer is advanced in a first direction and optically scanned in a second direction perpendicular to the first direction to record the intensity of light normally reflected from the wafer surface according to the position on the scan line. High intensity reflections indicate a smooth surface suitable for examining particles within it by the integrating hemisphere method and multiple light sensors. Weak reflections indicate areas of relief and patterning that are not conducive to particle inspection on the wafer surface. The second scan is offset laterally to compensate for wafer motion so that the same lines as the first scan are rescanned. During the second scan, the light sensors in the integrating sphere are switched on and off at the appropriate checkpoint locations determined from the first scan. This method is also limited by US5883710A because the system and method cannot inspect and detect the presence of internal defects such as microcracks.

因此,若有一種檢查電子元件內部缺陷的裝置及方法能利用不同角度的紅外線照明投射來檢查該電子元件,並且讓圖像擷取單元以不同角度朝向該電子元件,將有利於減輕這些缺點,該圖像擷取單元和該紅外線光源被擺成相對於各自的水平面傾斜0至360度的角度。 Therefore, if there is a device and method for inspecting internal defects of electronic components that can inspect the electronic components by using infrared illumination projections at different angles, and allow the image capture unit to face the electronic components at different angles, it will help to alleviate these defects. The image capture unit and the infrared light source are arranged at an angle of 0 to 360 degrees relative to the respective horizontal planes.

因此,本發明的主要目的是提供一種檢查電子元件內部缺陷的裝置及方法,該裝置及方法能夠區分表面缺陷和內部缺陷。 Therefore, the main object of the present invention is to provide an apparatus and method for inspecting internal defects of electronic components, which are capable of distinguishing surface defects from internal defects.

本發明的另一個目的是提供一種檢查電子元件內部缺陷的裝置及方法,該裝置及方法能夠在缺陷區域和非缺陷區域之間產生用來進行影像處理的顯著對比。 Another object of the present invention is to provide an apparatus and method for inspecting internal defects of an electronic component capable of producing a significant contrast between defective and non-defective areas for image processing.

本發明的再一個目的是提供一種檢查電子元件內部缺陷的裝置及方法,該裝置及方法能夠降低誤宰(overkill)率。 Another object of the present invention is to provide a device and method for inspecting internal defects of electronic components, which can reduce the rate of overkill.

本發明的再一個目的是提供一種檢查電子元件內部缺陷的裝置及方法,其中該方法能夠提高生產量。 Still another object of the present invention is to provide an apparatus and method for inspecting internal defects of electronic components, wherein the method can improve throughput.

經由理解本發明的以下詳細描述或在實踐中使用本發明,本發明的其他進一步目的將變得顯而易見。 Other further objects of the invention will become apparent upon understanding the following detailed description of the invention or by using the invention in practice.

以下是根據本發明較佳實施例的詳述:一種檢查電子元件內部缺陷的裝置,包括:一圖像擷取單元,該電子元件位於該圖像擷取單元的視場內;以及至少一紅外線光源;其特徵在於:該圖像擷取單元和該紅外線光源被擺成相對於各自的水平面傾斜0至360度的角度,因此該紅外線光源能夠照亮該電子元件的至少一個內部缺陷;且該電子元件與其水平面的角度為0度。 The following is a detailed description according to a preferred embodiment of the present invention: a device for inspecting internal defects of electronic components, including: an image capture unit, the electronic component is located in the field of view of the image capture unit; and at least one infrared ray A light source; characterized in that: the image capture unit and the infrared light source are placed at an angle of 0 to 360 degrees with respect to the respective horizontal planes, so that the infrared light source can illuminate at least one internal defect of the electronic component; and the The angle between an electronic component and its horizontal plane is 0 degrees.

在本發明另一實施例,提供:一種檢查電子元件內部缺陷的方法,包括以下步驟: (i)將該電子元件從一第一站傳送到一檢查站;(ii)透過一圖像擷取單元搭配至少一紅外線光源,檢查該電子元件的第一側;(iii)將該圖像擷取單元和該紅外線光源沿著其各自的水平面旋轉,並在該紅外線光源和該圖像擷取單元旋轉後,透過該圖像擷取單元檢查該電子元件的第二側;(iv)重複步驟(iii)將該圖像擷取單元和該紅外線(IR)光源沿著其各自的水平面旋轉,並在該紅外線光源和圖像擷取單元旋轉後,通過該圖像擷取單元檢查該電子元件的第二側,以檢查該電子元件的四側;以及(v)將該電子元件傳送到一第二站;其特徵在於:該圖像擷取單元和該紅外線光源被擺成相對於各自的水平面傾斜0至360度的角度,因此該紅外線光源能夠照亮該電子元件的至少一內部缺陷,該內部缺陷是由切割和組裝過程引起;以及該電子元件與其水平面的角度為0度。 In another embodiment of the present invention, there is provided: a method for inspecting internal defects of electronic components, comprising the following steps: (i) transferring the electronic component from a first station to an inspection station; (ii) inspecting the first side of the electronic component through an image capture unit with at least one infrared light source; (iii) the image The capturing unit and the infrared light source are rotated along their respective horizontal planes, and after the infrared light source and the image capturing unit are rotated, the second side of the electronic component is inspected through the image capturing unit; (iv) repeating Step (iii) rotating the image capture unit and the infrared (IR) light source along their respective horizontal planes, and inspecting the electron through the image capture unit after the infrared light source and image capture unit are rotated the second side of the component to inspect the four sides of the electronic component; and (v) deliver the electronic component to a second station; it is characterized in that: the image capture unit and the infrared light source are placed relative to their respective The horizontal plane is inclined at an angle of 0 to 360 degrees, so that the infrared light source can illuminate at least one internal defect of the electronic component caused by the cutting and assembly process; and the angle between the electronic component and the horizontal plane is 0 degrees.

1:裝置 1: device

101:電子元件 101: Electronic components

102:圖像擷取單元 102: Image capture unit

104:前側紅外線光源 104: Front side infrared light source

106:旁側紅外線光源 106: side infrared light source

107:旁側紅外線光源 107: side infrared light source

110:背側紅外線光源 110: Back side infrared light source

112:前側紅外線光源 112: Front side infrared light source

114:第一表面 114: first surface

116:第二表面 116: second surface

118:反射鏡 118: Mirror

2:方法 2: method

3A:圖像樣品 3A: Image samples

301:晶粒背面碎裂 301: Chipping on the back of the grain

BSHP:水平面 BSHP: horizontal plane

IRHP:水平面 IRHP: horizontal plane

ICHP:水平面 ICHP: horizontal plane

X°:傾斜角 X°: tilt angle

Y°:傾斜角 Y°: tilt angle

在結合附圖研究詳細描述之後,將認識到本發明的其他方面及其優點,其中:圖1-A顯示出本發明示範性示意圖,其中圖像擷取單元和紅外線光源面向該電子元件的第一表面,且紅外線光源定位於該電子元件的一側壁上;圖1-B顯示出本發明示意圖,其中圖像擷取單元和紅外線光源面向該電子元件的第一表面,且紅外線光源位於該電子元件的另一側壁上; 圖1-C顯示出本發明另示意圖,其中圖像擷取單元和紅外線光源面向該電子元件的第一表面,且一反射鏡面向該電子元件的第二表面;圖1-D顯示出本發明另一示意圖,其中該圖像擷取單元嵌入有面向該電子元件的第一表面的嵌入式紅外線光源,且一反射鏡面向該電子元件的第二表面;圖1-E顯示出本發明另一示意圖,其中圖像擷取單元和紅外線光源面向該電子元件的第一表面,其中一個紅外線光源位於該電子元件的前視處,另外兩個紅外線光源分別位於該電子元件的左側壁和右側壁上,且一反射鏡面向該電子元件的第二表面;圖2顯示出本發明檢測電子元件中的內部缺陷的方法流程圖;圖3-A顯示出本發明檢測電子元件的表面缺陷的示意圖。 Other aspects of the present invention and its advantages will be appreciated after studying the detailed description in conjunction with the accompanying drawings, wherein: FIG. One surface, and the infrared light source is positioned on the side wall of the electronic component; Figure 1-B shows a schematic diagram of the present invention, wherein the image capture unit and the infrared light source face the first surface of the electronic component, and the infrared light source is located On the other side wall of the component; Figure 1-C shows another schematic view of the present invention, wherein the image capture unit and the infrared light source face the first surface of the electronic component, and a mirror faces the second surface of the electronic component; Figure 1-D shows the present invention Another schematic diagram, wherein the image capture unit is embedded with an embedded infrared light source facing the first surface of the electronic component, and a mirror faces the second surface of the electronic component; FIG. 1-E shows another embodiment of the present invention A schematic diagram, wherein the image capture unit and the infrared light source face the first surface of the electronic component, one of the infrared light sources is located at the front view of the electronic component, and the other two infrared light sources are respectively located on the left side wall and the right side wall of the electronic component , and a mirror faces the second surface of the electronic component; FIG. 2 shows a flow chart of the method for detecting internal defects in the electronic component of the present invention; FIG. 3-A shows a schematic diagram of the present invention for detecting surface defects in the electronic component.

圖3-B顯示出本發明檢測電子元件的表面缺陷的另一示意圖;及圖3-C顯示出本發明檢測電子元件的表面缺陷的高倍率顯微圖像的示意圖。 FIG. 3-B shows another schematic diagram of detecting surface defects of electronic components according to the present invention; and FIG. 3-C shows a schematic diagram of high-magnification microscopic images of detecting surface defects of electronic components according to the present invention.

在以下詳細描述中,闡述了許多具體細節以便提供對本發明的透徹理解。然而,本領域具有通常知識者將理解,可以在沒有這些具體細節的情況下實踐本發明。在其他情況下,沒有詳細描述習知的方法,過程和/或元件,以免模糊本發明。 In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, it will be understood by one of ordinary skill in the art that the present invention may be practiced without these specific details. In other instances, well-known methods, procedures and/or elements have not been described in detail so as not to obscure the present invention.

從以下對實施例的描述中將更清楚地理解本發明,這些實施例僅通過示例的方式參考附圖給出,附圖未按比例繪製。 The invention will be more clearly understood from the following description of the embodiments, which are given by way of example only with reference to the accompanying drawings, which are not drawn to scale.

如本公開內容和本文所附權利要求中所使用的,單數形式“一”,“一個”和“該”包括複數指示物,除非上下文清楚地指示或另外表示。 As used in this disclosure and in the claims appended hereto, the singular forms "a", "an" and "the" include plural referents unless the context clearly dictates otherwise or indicates otherwise.

貫穿本說明書的整個公開內容和權利要求,詞語“包括”和該詞語的變體,例如“包括”和“包含”,意指“包括但不限於”,並且不旨在排除,例如,其他元件,整數或步驟。“示例性”意味著“示例”並且不旨在表達優選或理想實施例的指示,“諸如”不是用於限制性意義,而是用於解釋目的。 Throughout the disclosure and claims of this specification, the word "comprise" and variations of that word, such as "comprises" and "comprising", means "including but not limited to" and is not intended to exclude, for example, other elements , an integer or a step. "Exemplary" means "example" and is not intended to convey an indication of a preferred or ideal embodiment, "such as" is not used in a limiting sense, but rather for purposes of explanation.

本發明主張一種檢查電子元件(101)內部缺陷的裝置(1),包括一圖像擷取單元(102),該電子元件(101)位於該圖像擷取單元(102)的視場內,該圖像擷取單元(102)面向該電子元件(101)的第一表面(114),以拍攝該內部缺陷(108)的圖像。此外,該裝置還包括至少一紅外線光源(104,106,107),其中該圖像擷取單元(102)和該紅外線光源(104,106,107)被擺成相對於各自的水平面(ICHP,IRHP)傾斜0至360度的角度(如圖像擷取單元(102)相對於水平面(ICHP)的傾斜角(X°)及紅外線光源(104,106,107)相對於水平面(IRHP)的傾斜角(Y°)),因此該紅外線光源(104,106,107)能夠照亮該電子元件(101)的至少一個內部缺陷(108)。透過具有該設置,可以檢查和檢測該電子元件(101)的不同層。該電子元件(101)被擺成與其水平面(ECHP)的角度為0度。該圖像擷取單元(102)和該紅外線光源(104,106,107)的不同擺放和配置請參見圖1-A至圖1-E。 The present invention claims a device (1) for inspecting internal defects of an electronic component (101), comprising an image capture unit (102), and the electronic component (101) is located within the field of view of the image capture unit (102), The image capture unit (102) faces the first surface (114) of the electronic component (101) to capture the image of the internal defect (108). In addition, the device further comprises at least one infrared light source (104, 106, 107), wherein the image capture unit (102) and the infrared light source (104, 106, 107) are arranged relative to respective horizontal planes (ICHP, IRHP) tilt angle from 0 to 360 degrees (such as the tilt angle (X°) of the image capture unit (102) relative to the horizontal plane (ICHP) and the tilt of the infrared light source (104, 106, 107) relative to the horizontal plane (IRHP) angle (Y°)), so that the infrared light source (104, 106, 107) can illuminate at least one internal defect (108) of the electronic component (101). By having this arrangement, different layers of the electronic component (101) can be inspected and inspected. The electronic component (101) is placed at an angle of 0 degrees to its horizontal plane (ECHP). Please refer to FIG. 1-A to FIG. 1-E for different placements and configurations of the image capture unit (102) and the infrared light sources (104, 106, 107).

參照圖1-A和1-B所示,其為檢測電子元器件(101)中的內部缺陷(108),例如微裂紋或內部裂縫,的示意圖。該圖像擷取單元(102)和該紅外線光源(104,106,107)面向該電子元件(101)的第一表面(114),其中該圖像擷取單元(102)和該紅外線光源(104,106,107)被擺成相對於各自的水平面(ICHP,IRHP)傾斜0至360度的角度,因此該紅外線光源(104,106,107)能夠照亮該電子元件(101)的至少一個內部缺陷(108)。該電子元件(101)與其水平面(ECHP)的角度為0度。該紅外線光源(104,106,107)包括前側紅外線光源(104)、旁側紅外線光源(106,107)或其組合。該旁側紅外線光源(106,107)可位於該電子元件(101)的右側,如圖1-A所示,或者可位於電子元件(101)的左側,如圖1-B所示。該第一表面(114)是指該電子元件(101)的背面,而第二表面(116)包括該電子元件(101)的凸點側。 1-A and 1-B, which are schematic diagrams for detecting internal defects (108), such as microcracks or internal cracks, in electronic components (101). The image capture unit (102) and the infrared light source (104, 106, 107) face the first surface (114) of the electronic component (101), wherein the image capture unit (102) and the infrared light source ( 104, 106, 107) are arranged to be inclined at an angle of 0 to 360 degrees relative to the respective horizontal plane (ICHP, IRHP), so that the infrared light source (104, 106, 107) can illuminate at least one of the electronic components (101) Internal defects (108). The angle between the electronic component (101) and its horizontal plane (ECHP) is 0 degrees. The infrared light source (104, 106, 107) includes a front infrared light source (104), a side infrared light source (106, 107) or a combination thereof. The side infrared light source (106, 107) can be located on the right side of the electronic component (101), as shown in Figure 1-A, or can be located on the left side of the electronic component (101), as shown in Figure 1-B. The first surface (114) refers to the backside of the electronic component (101), and the second surface (116) includes the bump side of the electronic component (101).

參照圖1-C所示,其為圖像擷取單元(102)和前側紅外線光源(104)連同一反射鏡(118)和至少一背側紅外線光源(110)的另一配置示意圖。在此配置下,該圖像擷取單元(102)和前側紅外線光源(104)面向該電子元件(101)的第一表面(114),且被擺成相對於各自的水平面(ICHP,IRHP)傾斜0至360度的角度。此外,該反射器(118)和背側紅外線光源(110)面向該電子元件(101)的第二表面(116),且該反射鏡(118)與該電子元件(101)平行且位於該電子元件(101)和背側紅外線光源(110)之間。背側紅外線光源(110)相對於其水平面(BSHP)傾斜0至360度。該反射鏡(118)作為雜訊過濾工具,以獲得用於紅外線檢查處理且品質更好的圖像。或者,嵌入式前側紅外線光源(112)被嵌入到該 圖像擷取單元(102)中,藉此該圖像擷取單元(102)與該嵌入式前側紅外線光源(112)作為一單一單元共同運作,如圖1-D所示。 Referring to FIG. 1-C, it is a schematic diagram of another arrangement of the image capture unit (102) and the front infrared light source (104) together with a reflector (118) and at least one rear infrared light source (110). Under this configuration, the image capture unit (102) and the front infrared light source (104) face the first surface (114) of the electronic component (101) and are placed relative to the respective horizontal planes (ICHP, IRHP) Tilt angle from 0 to 360 degrees. In addition, the reflector (118) and the backside infrared light source (110) face the second surface (116) of the electronic component (101), and the reflector (118) is parallel to the electronic component (101) and located on the electronic component (101). Between the element (101) and the backside infrared light source (110). The backside infrared light source (110) is inclined from 0 to 360 degrees relative to its horizontal plane (BSHP). The mirror (118) acts as a noise filtering tool to obtain better quality images for infrared inspection processing. Alternatively, an embedded front infrared light source (112) is embedded in the In the image capture unit (102), the image capture unit (102) and the embedded front infrared light source (112) work together as a single unit, as shown in FIG. 1-D.

參照圖1-E所示,其為本發明另一配置示意圖。一前側紅外線光源(104)和一圖像擷取單元(102)面向該電子元件(101)的第一表面(114),以及一反射鏡(118)面向該電子元件(101)的第二表面(116)。另外,一旁側紅外線光源(106)位於該電子元件(101)的右側,而另一旁紅外線光源(107)位於該電子元件(101)的左側。該前側紅外線光源(104)、圖像擷取單元(102)和旁側紅外線光源(106,107)被擺成相對於各自的水平面(ICHP,IRHP)傾斜0至360度的角度。 Referring to Fig. 1-E, it is a schematic diagram of another configuration of the present invention. A front side infrared light source (104) and an image capture unit (102) face the first surface (114) of the electronic component (101), and a reflector (118) faces the second surface of the electronic component (101) (116). In addition, one side infrared light source (106) is located on the right side of the electronic component (101), and the other side infrared light source (107) is located on the left side of the electronic component (101). The front infrared light source (104), the image capturing unit (102) and the side infrared light sources (106, 107) are arranged at an angle of 0 to 360 degrees relative to the respective horizontal plane (ICHP, IRHP).

參照圖2所示,其顯示本發明一種檢查電子元件(101)內部缺陷的方法(2)。(i)將該電子元件(101)從一第一站傳送到一檢查站(步驟201);(ii)該圖像擷取單元(102)隨後與至少一紅外線光源(104,106,107)一起檢查該電子元件(101)的第一側(步驟203);(iii)將該圖像擷取單元(102)和該紅外線光源(104,106,107)沿著其各自的水平面旋轉,並在該紅外線光源(104,106,107)和圖像擷取單元(102)旋轉後,透過該圖像擷取單元(102)檢查該電子元件(101)的第二側(步驟205);重複步驟(iii),亦即將該圖像擷取單元(102)和該紅外線光源(104,106,107)沿著其各自的水平面旋轉,並在該紅外線光源(104,106,107)和圖像擷取單元(102)旋轉後,透過該圖像擷取單元(102)檢查該電子元件(101)的第二側,以檢查該電子元件(101)的四側(步驟207);以及(v)將該電子元件(101)傳送到一第二站(步驟209)。該圖像擷取單元(102)和該紅外線光源(104,106,107)被擺成相對於 各自的水平面(ICHP,IRHP)傾斜0至360度的角度,因此該紅外線光源(104,106,107)能夠照亮該電子元件(101)的至少一個內部缺陷(108),且該電子元件(101)被擺成與其水平面(ECHP)的角度為0度。內部缺陷(108)由切割和組裝過程引起。該紅外線光源(104,106,107)包括前側紅外線光源(104)、旁側紅外線光源(106,107)或其組合。 Referring to Fig. 2, it shows a method (2) of the present invention for inspecting internal defects of an electronic component (101). (i) transfer the electronic component (101) from a first station to an inspection station (step 201); (ii) the image capture unit (102) is then combined with at least one infrared light source (104, 106, 107) checking the first side of the electronic component (101) together (step 203); (iii) rotating the image capture unit (102) and the infrared light source (104, 106, 107) along their respective horizontal planes, and After the infrared light source (104, 106, 107) and the image capture unit (102) rotate, inspect the second side of the electronic component (101) through the image capture unit (102) (step 205); repeat Step (iii), that is, rotating the image capture unit (102) and the infrared light source (104, 106, 107) along their respective horizontal planes, and rotating the infrared light source (104, 106, 107) and the image After the capture unit (102) is rotated, inspect the second side of the electronic component (101) through the image capture unit (102) to check the four sides of the electronic component (101) (step 207); and (v ) transfer the electronic component (101) to a second station (step 209). The image capture unit (102) and the infrared light source (104, 106, 107) are placed relative to The respective horizontal planes (ICHP, IRHP) are inclined at an angle of 0 to 360 degrees, whereby the infrared light source (104, 106, 107) is able to illuminate at least one internal defect (108) of the electronic component (101), and the electronic component ( 101) is placed at an angle of 0 degrees to its horizontal plane (ECHP). Internal defects (108) are caused by the cutting and assembly process. The infrared light source (104, 106, 107) includes a front infrared light source (104), a side infrared light source (106, 107) or a combination thereof.

另外,該方法(2)在(i)將該電子元件(101)從第一站傳送到檢查站(步驟201)之前,還包括通過一取放模組拾取該電子元件(101)並隨後將該電子元件(101)放置在用於內部缺陷檢查的該檢查站的步驟。該第一站可以是取放站、雷射標記站、測試站等。該第二站包括捲帶、托盤、視覺檢查站等。透過反射鏡(118)過濾該電子元件(101)的雜訊的步驟可選地包括在該方法(2)中。 In addition, before (i) transferring the electronic component (101) from the first station to the inspection station (step 201), the method (2) further includes picking up the electronic component (101) by a pick-and-place module and then placing The step of placing the electronic component (101) at the inspection station for internal defect inspection. This first station may be a pick and place station, a laser marking station, a testing station, or the like. This second station includes reels, pallets, visual inspection stations, and the like. The step of filtering noise of the electronic component (101 ) through a mirror (118) is optionally included in the method (2).

參照圖3-A所示,其為本發明使用該裝置(1)和上述配置檢測到表面缺陷時的圖像樣品(3A)。圖像顯示上方白線的對比較深,其代表表面缺陷,即晶粒背面碎裂(301)。圖3-B呈現本發明檢測表面缺陷的另一圖像樣品,而圖3-C顯示出高倍率顯微圖像,其不會在上方白線上產生較深的對比度。參照圖3-A和3-B所示,由該裝置(1)產生的圖像樣品能夠產生用於影像處理的顯著對比度,且隨後能夠區分表面缺陷和內部缺陷。因此,可以降低電子元件(101)的誤宰率。 Referring to Fig. 3-A, it is an image sample (3A) of the present invention when surface defects are detected using the device (1) and the above-mentioned configuration. The image shows a darker contrast to the upper white line, which represents a surface defect, ie, chipped backside of the die (301). Figure 3-B presents another image sample of the present invention detecting surface defects, while Figure 3-C shows a high magnification microscopic image that does not produce a darker contrast on the upper white line. As shown with reference to Figures 3-A and 3-B, the image samples produced by the device (1) are capable of producing significant contrast for image processing and subsequently distinguishing between surface and internal defects. Therefore, the false kill rate of the electronic component (101) can be reduced.

1:裝置 1: device

101:電子元件 101: Electronic components

102:圖像擷取單元 102: Image capture unit

106:旁側紅外線光源 106: side infrared light source

114:第一表面 114: first surface

116:第二表面 116: second surface

IRHP:水平面 IRHP: horizontal plane

ICHP:水平面 ICHP: horizontal plane

X°:傾斜角 X°: tilt angle

Y°:傾斜角 Y°: tilt angle

Claims (10)

一種檢查電子元件(101)內部缺陷的裝置(1),包括:一圖像擷取單元(102),該電子元件(101)位於該圖像擷取單元(102)的視場內,該電子元件(101)包含一第一表面(114)和一第二表面(116);以及至少一紅外線光源(104,106,107);其特徵在於:該裝置(1)還包括一反射鏡(118),該反射鏡(118)面向該電子元件(101)的該第二表面(116)且與該電子元件(101)平行;該圖像擷取單元(102)和該紅外線光源(104,106,107)被擺成傾斜於各自的水平面(ICHP,IRHP)0至360度的角度,因此該紅外線光源(104,106,107)能夠照亮該電子元件(101)的至少一個內部缺陷(108);以及該電子元件(101)被擺成與其水平面(ECHP)的角度為0度。 A device (1) for inspecting internal defects of an electronic component (101), comprising: an image capture unit (102), the electronic component (101) is located within the field of view of the image capture unit (102), the electronic The element (101) includes a first surface (114) and a second surface (116); and at least one infrared light source (104, 106, 107); it is characterized in that: the device (1) also includes a reflector (118 ), the mirror (118) faces the second surface (116) of the electronic component (101) and is parallel to the electronic component (101); the image capture unit (102) and the infrared light source (104, 106 , 107) are placed at an angle of 0 to 360 degrees inclined to the respective horizontal plane (ICHP, IRHP), so that the infrared light source (104, 106, 107) can illuminate at least one internal defect (108) of the electronic component (101) ); and the electronic component (101) is placed at an angle of 0 degrees to its horizontal plane (ECHP). 如請求項1所述之檢查電子元件(101)內部缺陷的裝置(1),其中該紅外線光源(104,106,107)包括前側紅外線光源(104)、旁側紅外線光源(106,107)或其組合。 The device (1) for inspecting internal defects of electronic components (101) according to claim 1, wherein the infrared light source (104, 106, 107) includes a front side infrared light source (104), a side infrared light source (106, 107) or its combination. 如請求項1所述之檢查電子元件(101)內部缺陷的裝置(1),其中該裝置(1)還包括至少一背側紅外線光源(110),該背側紅外線光源(110)被擺成相對於其水平面(BSHP)傾斜0至360度的角度。 The device (1) for inspecting internal defects of electronic components (101) as described in claim 1, wherein the device (1) further includes at least one backside infrared light source (110), and the backside infrared light source (110) is arranged as Inclined at an angle of 0 to 360 degrees relative to its horizontal plane (BSHP). 如請求項1或2所述之檢查電子元件(101)內部缺陷的裝置(1),其中該圖像擷取單元(102)包括一嵌入式前側紅外線光源(112)或一外部前側紅外線光源(104)。 The device (1) for inspecting internal defects of electronic components (101) as described in claim 1 or 2, wherein the image capture unit (102) includes an embedded front infrared light source (112) or an external front infrared light source ( 104). 如請求項1所述之檢查電子元件(101)內部缺陷的裝置(1),其中該電子元件(101)的該第一表面(114)包含該電子元件(101)的背面,而該電子元件(101)的該第二表面(116)包含該電子元件(101)的凸點側。 The device (1) for inspecting internal defects of an electronic component (101) according to claim 1, wherein the first surface (114) of the electronic component (101) includes the back surface of the electronic component (101), and the electronic component The second surface (116) of (101) includes the bump side of the electronic component (101). 一種檢查電子元件(101)內部缺陷的方法(2),包括以下步驟:(i)將該電子元件(101)從一第一站傳送到一檢查站;(ii)透過一圖像擷取單元(102)搭配至少一紅外線光源(104,106,107),檢查該電子元件(101)的第一側;(iii)將該圖像擷取單元(102)和該紅外線光源(104,106,107)沿著其各自的水平面旋轉,並在該紅外線光源(104,106,107)和該圖像擷取單元(102)旋轉後,透過該圖像擷取單元(102)檢查該電子元件(101)的第二側;重複該步驟(iii),以檢查該電子元件(101)的四側;以及(v)將該電子元件(101)傳送到一第二站;其特徵在於:該方法(2)還包括透過反射鏡(118)過濾該電子元件(101)的雜訊的步驟;該圖像擷取單元(102)和該紅外線光源(104,106,107)被擺成相對於各自的水平面(ICHP,IRHP)傾斜0至360度的角度,因此該紅外線光源(104,106,107)能夠照亮該電子元件(101)的至少一個內部缺陷(108),該內部缺陷是由切割和組裝過程引起;以及 該電子元件(101)與其水平面(ECHP)的角度為0度。 A method (2) for inspecting internal defects of an electronic component (101), comprising the steps of: (i) transferring the electronic component (101) from a first station to an inspection station; (ii) through an image capture unit (102) inspecting the first side of the electronic component (101) with at least one infrared light source (104, 106, 107); (iii) the image capture unit (102) and the infrared light source (104, 106, 107) rotate along their respective horizontal planes, and inspect the electronic component ( 101) on the second side; repeat the step (iii) to check the four sides of the electronic component (101); and (v) deliver the electronic component (101) to a second station; it is characterized in that: the method (2) It also includes the step of filtering the noise of the electronic component (101) through the reflector (118); the image capture unit (102) and the infrared light source (104, 106, 107) are arranged relative to The horizontal plane (ICHP, IRHP) is inclined at an angle of 0 to 360 degrees, so that the infrared light source (104, 106, 107) can illuminate at least one internal defect (108) of the electronic component (101), which is caused by cutting caused by the assembly process; and The angle between the electronic component (101) and its horizontal plane (ECHP) is 0 degrees. 如請求項6所述之檢查電子元件(101)內部缺陷的方法(2),其中該方法(2)還包括在該步驟(i)之前透過一取放模組拾取該電子元件(101)並隨後將該電子元件(101)放置在用於內部缺陷檢查的該檢查站的步驟。 The method (2) for inspecting internal defects of an electronic component (101) according to claim 6, wherein the method (2) further includes picking up the electronic component (101) through a pick-and-place module before the step (i) and This is followed by the step of placing the electronic component (101) at the inspection station for internal defect inspection. 如請求項6所述之檢查電子元件(101)內部缺陷的方法(2),其中該第一站包括取放站、鐳射標記站或測試站。 The method (2) for inspecting internal defects of an electronic component (101) as claimed in Claim 6, wherein the first station includes a pick-and-place station, a laser marking station or a testing station. 如請求項6所述之檢查電子元件(101)內部缺陷的方法(2),其中該第二站包括捲帶、托盤或視覺檢查站。 The method (2) for inspecting internal defects of an electronic component (101) as claimed in claim 6, wherein the second station includes a reel, tray or visual inspection station. 如請求項6所述之檢查電子元件(101)內部缺陷的方法(2),其中該紅外線光源(104,106,107)包括前側紅外線光源(104)、旁側紅外線光源(106,107)或其組合。 The method (2) for inspecting internal defects of an electronic component (101) as claimed in item 6, wherein the infrared light source (104, 106, 107) includes a front side infrared light source (104), a side infrared light source (106, 107) or its combination.
TW110127311A 2021-05-24 2021-07-26 Apparatus and method for performing internal defects inspection of an electronic component TWI797689B (en)

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TW202009476A (en) * 2018-08-30 2020-03-01 馬來西亞商正齊科技有限公司 An apparatus for infrared inspection of an electronic component and method thereof

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TW201118369A (en) * 2009-09-02 2011-06-01 Gp Inspect Gmbh Method and device for detecting defects in an object
TW201930864A (en) * 2014-12-05 2019-08-01 美商克萊譚克公司 Apparatus, method and computer program product for defect detection in work pieces
TW202009476A (en) * 2018-08-30 2020-03-01 馬來西亞商正齊科技有限公司 An apparatus for infrared inspection of an electronic component and method thereof

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