TWI790086B - Non-contact semiconductor element measuring device and operation method thereof - Google Patents
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Abstract
Description
本發明係量測技術領域,特別是關於一種半導體製程設備零配件表面形貌資訊的量測裝置及其操作方法。 The invention belongs to the field of measurement technology, in particular to a measurement device and an operation method for the surface topography information of spare parts of semiconductor process equipment.
隨著高科技的發展,電子裝置內部所需的晶片數量越來越多,透過先進的半導體製程可以將晶片的體積不斷地微縮,在晶片的體積越來越微型化的同時,必須要有一種更方便的半導體製程設備零配件表面形貌量測裝置,例如CMP研磨墊或其他工件的表面特徵、尺寸訊息。 With the development of high technology, the number of chips required in electronic devices is increasing. The volume of chips can be continuously reduced through advanced semiconductor manufacturing processes. While the volume of chips is becoming more and more miniaturized, there must be a A more convenient surface topography measurement device for semiconductor process equipment parts, such as CMP polishing pads or other workpiece surface features and size information.
因此,本發明的主要目的在於提供一種非接觸式的半導體製程設備零配件量測裝置及其量測方法,以解決上述問題。 Therefore, the main purpose of the present invention is to provide a non-contact measuring device and method for semiconductor process equipment spare parts, so as to solve the above problems.
在上述背景說明段落中所揭露之內容,僅為增進對本發明之背景技術的瞭解,因此,上述之內容含有不構成阻礙本發明之先前技術,且應為本領域習知技藝者所熟知。 The content disclosed in the background description paragraph above is only to enhance the understanding of the background technology of the present invention. Therefore, the above content contains prior art that does not constitute an obstacle to the present invention, and should be well known to those skilled in the art.
本發明的目的在於提供一種非接觸式的半導體製程設備零配件量測裝置,可以實現非破壞性的量測。 The purpose of the present invention is to provide a non-contact measuring device for spare parts of semiconductor process equipment, which can realize non-destructive measurement.
本發明的另一目的在於提供一種操作方法,用來操作上述的非接觸式半導體製程設備零配件量測裝置。 Another object of the present invention is to provide an operating method for operating the above-mentioned non-contact semiconductor process equipment component measuring device.
本發明的一實施例提出一種非接觸式的半導體製程設備零配件量測裝置,包括殼體、上蓋、下蓋、光學模組以及控制單元,上蓋具有量測視窗。殼體具有上開口以及下開口,上蓋及下蓋分別設置於殼體的上開口及下開口並形成容置空間。光學模組設置於容置空間內,並透過量測視窗量測待測物。控制單元電性連接光學模組,以控制光學模組量測待測物並獲得其量測資訊。 An embodiment of the present invention provides a non-contact measuring device for parts of semiconductor manufacturing equipment, including a housing, an upper cover, a lower cover, an optical module, and a control unit. The upper cover has a measurement window. The housing has an upper opening and a lower opening, and the upper cover and the lower cover are respectively arranged on the upper opening and the lower opening of the housing to form an accommodating space. The optical module is arranged in the accommodating space, and measures the object to be measured through the measuring window. The control unit is electrically connected to the optical module to control the optical module to measure the object under test and obtain its measurement information.
本發明的另一實施例提出一種非接觸式半導體製程設備零配件量測裝置的操作方法,上述量測裝置具有光學模組,上述操作方法包括下列步驟:(a)將光學模組對焦並量測標準元件;(b)獲得標準元件的表面形貌量測資訊;(c)將表面形貌量測資訊與標準元件的表面形貌預設資訊做比較,藉此獲得補償資訊;(d)根據補償資訊校正光學模組;以及(e)透過校正後的光學模組量測半導體待測元件。 Another embodiment of the present invention proposes an operation method of a non-contact semiconductor process equipment spare parts measurement device, the measurement device has an optical module, and the operation method includes the following steps: (a) focusing and measuring the optical module Measure the standard component; (b) obtain the surface topography measurement information of the standard component; (c) compare the surface topography measurement information with the surface topography default information of the standard component, thereby obtaining compensation information; (d) Correcting the optical module according to the compensation information; and (e) measuring the semiconductor DUT through the corrected optical module.
因此,利用本發明所提供之非接觸式半導體製程設備零配件量測裝置及其操作方法,可藉由光學模組量測標準元件獲得補償資訊以對光學模組進行校正,並在校正後對半導體製程設備零配件待測元件進行非接觸式量測,透過觀察所量測之半導體製程設備零配件待測元件的表面形貌來判斷其尺寸是否符合期望數值。 Therefore, using the non-contact semiconductor process equipment spare parts measuring device and its operation method provided by the present invention, the optical module can be used to measure the standard component to obtain compensation information to calibrate the optical module, and after calibration Semiconductor process equipment parts and components under test are measured in a non-contact manner. By observing the surface morphology of the measured semiconductor process equipment parts and components under test, it is judged whether its size meets the expected value.
上述說明僅是本發明技術方案的概述,為了能夠更清楚瞭解本發明的技術手段,而可依照說明書的內容予以實施,並且為了讓本發明的上述和其 他目的、特徵和優點能夠更明顯易懂,以下特舉較佳實施例,並配合圖式,詳細說明如下。 The above description is only an overview of the technical solution of the present invention. In order to understand the technical means of the present invention more clearly, it can be implemented according to the contents of the description, and in order to make the above and other aspects of the present invention Other purposes, features and advantages can be more obvious and understandable, and the preferred embodiments are specially cited below, together with the drawings, and detailed descriptions are as follows.
100、200:非接觸式半導體製程設備零配件量測元件 100, 200: Measuring components for non-contact semiconductor process equipment spare parts
101:人機介面 101: Human-machine interface
20:殼體 20: shell
21:上蓋 21: Upper cover
22:下蓋 22: Lower cover
23:光學模組 23:Optical module
24:待測物 24: The object to be tested
25:分釐卡平台 25: Centric card platform
201:上開口 201: upper opening
202:下開口 202: Lower opening
211:可視螢幕 211: Visual screen
2021:量測視窗 2021: Measurement window
2022:內嵌式磁鐵 2022: Embedded magnets
301~305、401~403、501、601~602:步驟 301~305, 401~403, 501, 601~602: steps
所包括的圖式用來提供對本申請實施例的進一步的理解,其構成了說明書的一部分,用於例示本申請的實施方式,並與文字描述一起來闡釋本申請的原理。顯而易見地,下面描述中的圖式僅僅是本申請的一些實施例,對於本領域普通技術人員來講,在不付出創造性勞動的前提下,還可以根據這些圖式獲得其他的圖式。在圖式中:圖1是本發明一實施例之非接觸式半導體製程設備零配件量測裝置的結構示意圖;圖2是本發明一實施例之非接觸式半導體製程設備零配件量測裝置的爆炸圖;圖3是本發明一實施例之非接觸式半導體製程設備零配件量測裝置的操作流程圖;圖4是本發明另一實施例之非接觸式半導體製程設備零配件量測裝置的操作流程圖;圖5是本發明另一實施例之非接觸式半導體製程設備零配件量測裝置的操作流程圖;及圖6是本發明另一實施例之非接觸式半導體製程設備零配件量測裝置的操作流程圖。 The included drawings are used to provide a further understanding of the embodiments of the present application, which constitute a part of the specification, are used to illustrate the implementation of the present application, and explain the principle of the present application together with the text description. Obviously, the drawings in the following description are only some embodiments of the present application, and those skilled in the art can obtain other drawings based on these drawings without creative efforts. In the drawings: Figure 1 is a schematic structural view of a non-contact semiconductor process equipment spare parts measurement device according to an embodiment of the present invention; Figure 2 is a non-contact semiconductor process equipment spare parts measurement device according to an embodiment of the present invention Exploded diagram; FIG. 3 is an operation flowchart of a non-contact semiconductor process equipment spare parts measuring device according to an embodiment of the present invention; FIG. 4 is a non-contact semiconductor process equipment spare part measurement device according to another embodiment of the present invention Operation flow chart; FIG. 5 is an operation flow chart of a non-contact semiconductor process equipment spare parts measuring device according to another embodiment of the present invention; and FIG. 6 is a non-contact semiconductor process equipment spare part quantity according to another embodiment of the present invention Flow chart of the operation of the measuring device.
為了使本發明的目的、技術方案及優點更加清楚明白,以下結合附圖及實施例,對本發明進行進一步詳細說明。應當理解,此處所描述的具體實施例僅僅用以解釋本發明,並不用於限定本發明。 In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
本發明之優點及特徵以及達到其方法將參照例示性實施例及附圖進行更詳細地描述而更容易理解。然而,本發明可以不同形式來實現且不應該被理解僅限於此處所陳述的實施例。相反地,對所屬技術領域具有通常知識者而言,所提供的此些實施例將使本揭露更加透徹與全面且完整地傳達本發明的範疇,且本發明將僅為所附加的申請專利範圍所定義。在圖中,元件的尺寸及相對尺寸為了清晰易懂而以誇示方法表示。整篇說明書中,某些不同的元件符號可以是相同的元件。本文所公開的具體結構和功能細節僅僅是代表性的,並且是用於描述本發明的示例性實施例的目的。但是本發明可以通過許多替換形式來具體實現,並且不應當被解釋成僅僅受限於本文所闡述的實施例。 The advantages and features of the present invention and methods for achieving them will be more easily understood by describing in more detail with reference to exemplary embodiments and accompanying drawings. However, the invention may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. On the contrary, for those skilled in the art, these embodiments provided will make this disclosure more thorough, comprehensive and completely convey the scope of the present invention, and the present invention will only be the appended claims defined. In the drawings, the dimensions and relative dimensions of elements are exaggerated for clarity. Throughout the specification, some different reference numerals may refer to the same component. Specific structural and functional details disclosed herein are representative only and are for purposes of describing example embodiments of the invention. This invention may, however, be embodied in many alternative forms and should not be construed as limited to only the embodiments set forth herein.
除非另外定義,所有使用於後文的術語(包含科技及科學術語)具有與本發明所屬該領域的技術人士一般所理解相同的意思。將更可理解的是,例如於一般所使用的字典所定義的那些術語應被理解為具有與相關領域的內容一致的意思,且除非明顯地定義於後文,將以所屬技術領域通常知識者所理解的一般意義所理解。 Unless otherwise defined, all terms (including technical and scientific terms) used hereinafter have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be more understandable that, for example, those terms defined in commonly used dictionaries should be understood as having meanings consistent with the content of the relevant field, and unless clearly defined in the following, will be understood by those with ordinary knowledge in the technical field understood in the general sense understood.
在本發明的描述中,需要說明的是,除非另有明確的規定和限定,術語“安裝”、“相連”、“連接”等應做廣義理解,例如,可以是固定連接,也可以是可拆卸連接,或一體地連接;可以是機械連接,也可以是電連接;可以是直接相連,也可以通過中間媒介間接相連,可以是兩個組件內部的連通。對於本領域的 普通技術人員而言,可以具體情況理解上述術語在本發明中的具體含義。 In the description of the present invention, it should be noted that unless otherwise specified and limited, the terms "installation", "connection", and "connection" should be understood in a broad sense, for example, it can be a fixed connection or a flexible connection. Detachable connection, or integral connection; it can be mechanical connection or electrical connection; it can be direct connection or indirect connection through an intermediary, and it can be the internal communication of two components. for the field Those of ordinary skill can understand the specific meanings of the above terms in the present invention in specific situations.
本文所使用的術語僅僅是為了描述具體實施例而非意圖限制示例性實施例。除非上下文明確地另有所指,否則本文所使用的單數形式“一個”、“一項”還意圖包括複數。還應當理解的是,本文所使用的術語“包括”和/或“包含”規定所陳述的特徵、整數、步驟、操作、單元和/或組件的存在,而不排除存在或添加一個或更多其他特徵、整數、步驟、操作、單元、組件和/或其組合。 The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the exemplary embodiments. As used herein, the singular forms "a", "an" and "an" are also intended to include the plural unless the context clearly dictates otherwise. It should also be understood that the term "comprises" and/or "comprises" as used herein specifies the presence of stated features, integers, steps, operations, units and/or components and does not exclude the presence or addition of one or more Other features, integers, steps, operations, units, components and/or combinations thereof.
以下將配合圖式詳細敘述例示實施例。然而,這些實施例可以包含於不同的形式中,且不應被解釋為用以限制本發明之申請專利範圍。這些實施例之提供使得本發明之揭露完整與明暸,熟知此技術之人將能經由該些實施例瞭解本發明之範疇。 Exemplary embodiments will be described in detail below with reference to the drawings. However, these embodiments may be included in different forms, and should not be construed as limiting the scope of the present invention. These embodiments are provided to make the disclosure of the present invention complete and clear, and those skilled in the art will be able to understand the scope of the present invention through these embodiments.
請參閱圖1,圖1是本發明一實施例之非接觸式半導體製程設備零配件量測裝置的結構示意圖。如圖1所示,非接觸式半導體製程設備零配件量測裝置100與人機介面101電性連接,人機介面101在本實施例如是桌上型電腦、筆記型電腦或是工業電腦等具備圖形運算及顯示能力的電子裝置,同時提供了使用者操作介面,使用者可以透過人機介面101對非接觸式半導體製程設備零配件量測裝置100進行校正以及量測等操作,同時亦可透過人機介面101觀察待測物的量測結果。量測方式則如後所述。
Please refer to FIG. 1 . FIG. 1 is a schematic structural diagram of a non-contact semiconductor process equipment component measuring device according to an embodiment of the present invention. As shown in FIG. 1, the non-contact semiconductor process equipment spare
請參閱圖2,圖2是本發明一實施例之非接觸式半導體製程設備零配件量測裝置的爆炸圖。如圖2所示,非接觸式半導體製程設備零配件量測裝置200包括殼體20、上蓋21、下蓋22、光學模組23以及控制單元(圖未示)。殼體20具有上開口201以及下開口202。上蓋21設置於上開口201,下蓋22設置於下開口202。下開口202具有量測視窗2021。殼體20、上蓋21及下蓋22形成容置空間。光
學模組23設置於容置空間內,以透過量測視窗2021量測待測物24。控制單元電性連接光學模組23,以控制光學模組23量測待測物24並獲得待測物24之量測資訊。
Please refer to FIG. 2 . FIG. 2 is an exploded view of a non-contact semiconductor process equipment component measuring device according to an embodiment of the present invention. As shown in FIG. 2 , the non-contact semiconductor process equipment
請繼續參照圖2,上蓋21設置有一可視螢幕211,以供使用者觀測待測物24之表面形貌。在本實施例中,可視螢幕211是LCD液晶螢幕,透過CCD鏡頭將光學模組23所觀測到的影像顯示在可視螢幕211上。透過可視螢幕211,使用者可觀察光學模組211所發出的光斑(spot)是否落在正確的量測區域內。
Please continue to refer to FIG. 2 , the
請繼續參照圖2,容置空間內更包括分釐卡平台25,用以對光學模組23進行光學對焦。在本實施例中,分釐卡平台25為商用標準元件,做動方式為透過旋轉分釐卡平台25上的旋鈕(類似光學顯微鏡的粗調或細調鈕)去微量控制分釐卡平台25的移動,且因光學模組23是鎖固在分釐卡平台25上,故可以藉由調整分釐卡平台25的旋鈕來做上下移動達到對焦的目的。其中因光學模組23自身重量會造成分釐卡平台25因自重而下垂部分,本實施例中透過彈簧之簧力(圖未示)使其能控制光學模組23的對焦平面,不因自重而下垂,提升對焦的精準度。
Please continue to refer to FIG. 2 , the accommodating space further includes a
請繼續參照圖2,下蓋22更包括內嵌式磁鐵2022。在本實施例中,內嵌式磁鐵2022的作用為吸附另外一個對鎖工件(counterpart,圖未示),這個對鎖工件為一精密塊規上面具有精密加工後的已知厚度溝槽,且此溝槽經過第三方校驗機構檢測後出據報告證明尺寸。機殼20可以藉由磁吸快速的與精密塊規結合或分開。
Please continue to refer to FIG. 2 , the
請繼續參照圖2,控制單元包括工業電腦人機介面。在本實施例中,控制單元可以是直接整合在非接觸式半導體製程設備零配件量測裝置200上,也可以是透過訊號線與光學模組23電性連接後與半導體製程設備零配件量測裝置200分開設置。
Please continue to refer to FIG. 2 , the control unit includes an industrial computer human-machine interface. In this embodiment, the control unit can be directly integrated on the non-contact semiconductor process equipment spare
圖3是本發明一實施例之非接觸式半導體製程設備零配件量測裝置的操作流程圖。如圖3所示,流程包括步驟301~305。步驟301:將光學模組對焦並量測標準元件。步驟302:獲得標準元件的表面形貌量測資訊。步驟303:將表面形貌量測資訊與標準元件的表面形貌預設資訊做比較,藉此獲得補償資訊。步驟304:根據補償資訊校正光學模組。步驟305:透過校正後的光學模組量測半導體製程設備零配件待測元件。在前述步驟中,標準元件以及半導體製程設備零配件待測元件皆為前述的待測物24。標準元件具有表面形貌預設資訊,也就是說此標準元件的表面形貌資訊(例如溝深、尺寸等物理特性)是已知的,因此透過光學模組對此標準元件進行量測之後會獲得此標準元件之表面形貌資訊的量測值以及預設值,將量測值與預測值進行比較之後便可以得知兩者之間的差異值,接著根據此差異值去對光學模組進行校正便可以增加光學模組量測的準確度,校正完畢之後的光學模組接著才能對待測元件進行正式的量測。
FIG. 3 is an operation flowchart of a non-contact measuring device for semiconductor process equipment parts according to an embodiment of the present invention. As shown in FIG. 3 , the process includes steps 301-305. Step 301: Focus the optical module and measure standard components. Step 302: Obtain surface topography measurement information of the standard component. Step 303 : Comparing the surface topography measurement information with the surface topography default information of the standard device, so as to obtain compensation information. Step 304: Calibrate the optical module according to the compensation information. Step 305: Measure the components under test of semiconductor process equipment components through the calibrated optical module. In the foregoing steps, the standard components and the components under test of semiconductor process equipment components are both the aforementioned objects under
圖4是本發明另一實施例之非接觸式半導體製程設備零配件量測裝置的操作流程圖。如圖4所示,流程包括步驟401~403。步驟401:獲得標準元件的縱深圖之後進行水平校正。步驟402:透過系統介面獲取標準元件的兩點溝平面值以及兩點溝底值,並分別取得兩點溝平面值以及該兩點溝底值的平均值。步驟403:計算溝平面之平均值以及溝底之平均值的差值。在前述步驟中,系統介面可以是先前所述的人機介面,在人機介面成功顯示光學模組對焦清楚的影像後,使用者可透過人接介面中安裝的操作軟體固定(fix)影像並準備擷取數值。影像理想狀態下為一條有高低起伏的水平線,但可能會因為光學模組或是待測元件擺放的方式而造成此水平線歪斜特定角度,此時可以藉由操作軟體將這條線調整回水平狀態,此過程稱為水平校正。具體內容是系統自動判斷此線段由左 至右的斜率,並根據這個斜率自動補償(offset)讓線段維持水平(斜率=0)的狀態。溝平面與溝底的算術平均數的差值,意義上即為此溝的溝深,本發明的目的即是協助使用者在不破壞樣品表面的情況下精密取得「溝深」或是「段差」的數據。 FIG. 4 is an operation flowchart of a non-contact measuring device for semiconductor process equipment parts according to another embodiment of the present invention. As shown in FIG. 4, the process includes steps 401-403. Step 401: Perform horizontal correction after obtaining the depth map of the standard component. Step 402: Obtain the two-point groove plane value and the two-point groove bottom value of the standard component through the system interface, and obtain the average value of the two-point groove plane value and the two-point groove bottom value respectively. Step 403: Calculate the difference between the average value of the groove plane and the average value of the groove bottom. In the preceding steps, the system interface may be the aforementioned man-machine interface. After the man-machine interface successfully displays the image in focus of the optical module, the user can fix (fix) the image through the operating software installed in the man-machine interface and Ready to fetch values. Ideally, the image is a horizontal line with ups and downs, but the horizontal line may be skewed at a specific angle due to the placement of the optical module or the device under test. At this time, the line can be adjusted back to the horizontal through the operating software state, this process is called leveling. The specific content is that the system automatically judges that the line segment is from the left To the right slope, and automatically compensate (offset) according to this slope to keep the line segment horizontal (slope=0). The difference between the arithmetic mean of the groove plane and the bottom of the groove means the depth of the groove in a sense. The purpose of this invention is to assist users to accurately obtain the "groove depth" or "level difference" without damaging the sample surface. "The data.
圖5是本發明另一實施例之非接觸式半導體製程設備零配件量測裝置的操作流程圖。如圖5示,流程包括步驟501。步驟501:以校正後的光學模組量測標準元件並進行重複校正,直到標準元件的標面形貌量測資訊符合標準元件的該表面形貌預設資訊。在此步驟中,使用者可透過重複量測標準元件的方式來提高校正的精準度。
FIG. 5 is an operation flowchart of a non-contact semiconductor process equipment component measuring device according to another embodiment of the present invention. As shown in FIG. 5 , the process includes
圖6是本發明另一實施例之非接觸式半導體製程設備零配件量測裝置的操作流程圖。如圖6示,流程包括步驟601及602。步驟601:獲得並儲存半導體製程設備零配件待測元件的溝深量測數據。步驟602:將半導體製程設備零配件待測元件的溝深量測數據與基準數據做比較,或作為依據調整設備端的零配件狀態。在此步驟中,使用者測得半導體製程設備零配件待測元件的表面形貌資訊之後會與標準值(或正常值)作比較,其中標準值可為使用者預設的特定範圍,當比較後發現半導體製程設備零配件待測元件的表面形貌超出此特定範圍值即判定為異常,因此使用者可以針對製程的機台參數進行調整,或是進行設備的維護或更換。在本實施例中,基準數據的定義為,符合此基準數據的半導體製程設備零配件,在晶圓製程與生產過程中符合此生產站點之所有規範,故此基準數據為一組針對不同科技節點不同機型不同道次的製程的最優化數據,而非一固定絕對單位的數據。根據此基準數據與其相對應的偏差,使用者可做出更換、微調、改善、或是進一步故障分析其對應的半導體製程設備零配件等執行作法。
FIG. 6 is an operation flowchart of a non-contact semiconductor process equipment component measuring device according to another embodiment of the present invention. As shown in FIG. 6 , the process includes
綜上所述,透過本發明提出的非接觸式半導體製程設備零配件量 測裝置以及操作方法,使用者可以針對待測元件進行非破壞式的量測,且透過校正可以提高量測的精準度,相較於現有的破壞式量測,本發明能夠提供更為便利、即時以及準確的方式,且因為是非破壞式量測,可以重複量測且輕易再現量測的結果,藉此提高量測過程當中的容錯率。 In summary, the amount of spare parts for non-contact semiconductor process equipment proposed by the present invention With the measuring device and operation method, the user can perform non-destructive measurement on the component to be tested, and the accuracy of the measurement can be improved through calibration. Compared with the existing destructive measurement, the present invention can provide more convenient, It is an instant and accurate method, and because it is a non-destructive measurement, the measurement can be repeated and the measurement results can be easily reproduced, thereby improving the error tolerance rate during the measurement process.
以上所述,乃僅記載本發明為呈現解決問題所採用的技術手段之較佳實施方式或實施例而已,並非用來限定本發明專利實施之範圍。即凡與本發明專利申請範圍文義相符,或依本發明專利範圍所做的均等變化與修飾,皆為本發明專利範圍所涵蓋。 The above description is only a description of the preferred implementation or examples of the technical means used to solve the problems in the present invention, and is not intended to limit the scope of the patent implementation of the present invention. That is, all equivalent changes and modifications that are consistent with the scope of the patent application of the present invention, or made according to the scope of the patent of the present invention, are covered by the scope of the patent of the present invention.
綜觀上述,可見本發明在突破先前之技術下,確實已達到所欲增進之功效,且也非熟悉該項技藝者所顯而易見,其所具之新穎性、進步性及實用性,顯已符合專利之申請要件,爰依法提出專利申請,懇請 貴局核准本件發明專利申請案,以勵發明,至感德便。 Looking at the above, it can be seen that the present invention has indeed achieved the desired effect after breaking through the previous technology, and it is not obvious to those who are familiar with the technology. The application requirements, please file a patent application in accordance with the law, I urge your bureau to approve this application for a patent for invention, so as to encourage invention, and thank you for your convenience.
200:非接觸式半導體製程設備零配件量測裝置 200: Non-contact semiconductor process equipment spare parts measuring device
20:殼體 20: shell
21:上蓋 21: Upper cover
22:下蓋 22: Lower cover
23:光學模組 23:Optical module
24:待測物 24: The object to be tested
25:分釐卡平台 25: Centric card platform
201:上開口 201: upper opening
202:下開口 202: Lower opening
211:可視螢幕 211: Visual screen
2021:量測視窗 2021: Measurement window
2022:內嵌式磁鐵 2022: Embedded magnets
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW473892B (en) * | 1999-11-05 | 2002-01-21 | Nippon Electric Co | Semiconductor device tester |
| TW200809903A (en) * | 2006-03-10 | 2008-02-16 | Hamamatsu Photonics Kk | Electron gun, energy beam generating device, electron beam generating device, and X-ray generating device |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW473892B (en) * | 1999-11-05 | 2002-01-21 | Nippon Electric Co | Semiconductor device tester |
| TW200809903A (en) * | 2006-03-10 | 2008-02-16 | Hamamatsu Photonics Kk | Electron gun, energy beam generating device, electron beam generating device, and X-ray generating device |
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