TWI788465B - Light-transmitting conductive film, manufacturing method thereof, light-adjusting film, and light-adjusting member - Google Patents

Abstract

The light-transmitting conductive film of the present invention extends in a first direction and a second direction perpendicular to the first direction, and includes a base film and a light-transmitting conductive layer. When the thermomechanical analysis step is performed on the light-transmitting conductive film from 20°C to 160°C and then cooled to 20°C, the in-plane dimensional change rate R represented by the following formula is 0.55% or less. R=(ΔL ₁ ² +ΔL ₂ ² ) ^1/2 Wherein, ΔL ₁ represents the dimensional change rate (%) in the above-mentioned first direction before and after the above-mentioned analysis step, and ΔL ₂ represents the dimensional change rate (%) in the above-mentioned second direction before and after the above-mentioned analysis step Dimensional change rate (%).

Description

Light-transmitting conductive film, manufacturing method thereof, light-adjusting film, and light-adjusting member

The present invention relates to a light-transmitting conductive film, a manufacturing method thereof, a light-adjusting film and a light-adjusting member provided with the light-transmitting conductive film.

In recent years, the demand for dimming devices such as smart windows has increased due to the reduction of air-conditioning loads and design features. Dimming devices are used in various applications such as window glass, partitions, and interior decoration of buildings and vehicles.

As a dimming film for a dimming device, for example, a film with two transparent conductive resin substrates and a dimming layer sandwiched by two transparent conductive resin substrates is proposed in Patent Document 1 (for example, Refer to Patent Document 1).

The dimming film of Patent Document 1 adjusts the absorption and scattering of light passing through the dimming layer by applying an electric field, thereby realizing dimming. As for the transparent conductive resin base material of such a dimming film, a film formed by laminating transparent electrodes including indium tin composite oxide (ITO) on a support base material such as a polyester film is used. Prior Art Documents Patent Documents

Patent Document 1: WO2008/075773

[Problem to be solved by the invention]

Light-adjusting films are sometimes attached to large glass (such as window glass of 1-10 m ² ) and used. Specifically, through a thermosetting or heat-melting adhesive, a light-adjusting film approximately the same size as the glass is placed on the glass and heat-hardened or heat-melted, thereby attaching the light-adjustable film to the glass.

However, the attached light-adjusting film will have the disadvantage of shrinking compared with the state before heating due to heating. As a result, a portion where the light-adjusting film is not attached is produced on the glass (especially the peripheral portion). The larger the area of the target glass, the more obvious the unattached part will be.

The present invention is to provide a light-transmitting conductive film capable of reducing the area not attached to an object, a manufacturing method thereof, a light-adjusting film, and a light-adjusting member. [Technical means to solve the problem]

The present invention [1] includes a light-transmitting conductive film extending in a first direction and a second direction perpendicular to the above-mentioned first direction, and comprising a base film and a light-transmitting conductive layer. When the thermomechanical analysis step of raising the temperature from 20°C to 160°C and then lowering the temperature to 20°C is performed on the above-mentioned light-transmitting conductive film, the in-plane dimensional change rate R represented by the following formula is 0.55% or less.

R=(ΔL ₁ ² +ΔL ₂ ² ) ^1/2 (wherein, ΔL ₁ represents the dimensional change rate (%) in the above-mentioned first direction before and after the above-mentioned analysis step, and ΔL ₂ represents the above-mentioned analysis step in the above-mentioned second direction Dimensional change rate (%)) The present invention [2] includes the translucent conductive film described in [1], wherein both the absolute value of ΔL ₁ and the absolute value of ΔL ₂ are 0.50 or less.

The present invention [3] includes the translucent conductive film described in [1] or [2], wherein at least one of ΔL ₁ and ΔL ₂ is a positive value.

The present invention [4] includes the translucent conductive film described in [3], wherein both ΔL ₁ and ΔL ₂ are positive values.

The present invention [5] includes the light-transmitting conductive film described in any one of [1] to [4], wherein the above-mentioned base film is a film subjected to heat treatment in an air environment.

The present invention [6] includes the translucent conductive film according to any one of [1] to [5], wherein the base film is a polyester film.

The present invention [7] includes a light-adjusting film comprising a first light-transmitting conductive film, a light-adjusting functional layer, and a second light-transmitting conductive film in sequence, and the above-mentioned first light-transmitting conductive film and/or the above-mentioned The second light-transmitting conductive film is the light-transmitting conductive film described in any one of [1] to [6].

The present invention [8] includes a dimming member comprising a protective member and the dimming film described in [7] attached to the protective member.

The present invention [9] includes a method of manufacturing a light-transmitting conductive film, which is a method of manufacturing a light-transmitting conductive film as described in any one of [1] to [6], and includes: A step of heating the base film, and then a step of forming a light-transmitting conductive layer on the base film in a state where the base film is kept below 40°C. [Effect of Invention]

The translucent conductive film of the present invention has an in-plane dimensional change rate R of 0.55% or less when subjected to a thermomechanical analysis step at 20°C-160°C-20°C.

Therefore, even if the light-transmitting conductive film of the present invention is attached to an object by heating, the light-transmitting conductive film can maintain a size close to the state before heating. Therefore, the area not attached to the object can be reduced, and a translucent conductive film of a desired size can be attached to the object.

Since the light-adjusting film and the light-adjusting member of the present invention are equipped with the light-transmitting conductive film of the present invention, the area where the light-transmitting conductive film is not attached to the object can be reduced.

The manufacturing method of the present invention can obtain a light-transmitting conductive film that can reduce the area not attached to the object.

In FIG. 1A , the paper thickness direction is the front-rear direction (first direction), the front side of the paper is the front side (one side in the first direction), and the back side of the paper is the rear side (the other side in the first direction). In Fig. 1A, the left-right direction of the paper is the left-right direction (the width direction, the second direction perpendicular to the first direction), the left side of the paper is the left side (one side of the second direction), and the right side of the paper is the right side (the other side of the second direction). ). In Fig. 1A, the up and down direction on the paper is the up and down direction (thickness direction, the third direction perpendicular to the first direction and the second direction), the upper side on the paper is the upper side (the side in the thickness direction, the third direction side), and the lower side on the paper is The side is the lower side (the other side in the thickness direction and the other side in the third direction). Specifically, according to the direction arrows in each figure.

<One Embodiment> 1. Light-transmitting conductive film The light-transmitting conductive film 1 which is one embodiment of the present invention is used for, for example, a light-adjusting film, a light-adjusting member, a light-adjusting device, etc. as an example of a light-adjusting element. film (that is, light-transmitting conductive film for dimming). As shown in FIG. 1 , the translucent conductive film 1 is formed into a film shape (including a sheet shape) with a specific thickness in a specific direction (front-back direction and left-right direction, that is, the surface direction) perpendicular to the up-down direction (thickness direction). Extended, and has a flat upper surface (one side in the thickness direction) and a flat lower surface (the other side in the thickness direction). The translucent conductive film 1 is, for example, a part of a light-adjusting film 4 (described below, referring to FIG. 3 ), a light-adjusting member 6 (described below, referring to FIG. 4D ) and a light-adjusting device (described below), that is, not Dimming film 4, etc. That is, the light-transmitting conductive film 1 is used to make the light-adjusting film 4 and other parts, and it does not include the light-adjusting functional layer 5 and the like, but is circulated in the form of a separate part, and is an industrially available device.

Specifically, the translucent conductive film 1 includes a base film 2 and a translucent conductive layer 3 in this order. That is, the translucent conductive film 1 includes the base film 2 and the translucent conductive layer 3 arranged on the upper side of the base film 2 . It is preferable that the translucent conductive film 1 consists only of the base film 2 and the translucent conductive layer 3 . Each layer will be described in detail below.

2. Substrate film The substrate film 2 is the lowermost layer of the light-transmitting conductive film 1 and is a supporting material to ensure the mechanical strength of the light-transmitting conductive film 1 . Moreover, the base film 2 is a support material which has translucency and flexibility. Base film 2 supports translucent conductive layer 3 .

The base film 2 has a film shape (including a sheet shape).

The base film 2 includes, for example, a polymer film. As the material of the polymer film, for example, polyester resins such as polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate, such as polymethacrylate and other (meth)acrylic resins (acrylic resins and/or methacrylic resins), olefin resins such as polyethylene, polypropylene, and cycloolefin polymers, such as polycarbonate resins, polyether resins, polyarylene Ester resin, melamine resin, polyamide resin, polyimide resin, cellulose resin, polystyrene resin, northylene resin, etc. These polymer films may be used alone or in combination of two or more. From the viewpoints of light transmittance, heat resistance, and mechanical strength, the base film 2 is preferably a polyester film made of polyester resin, more preferably a polyethylene terephthalate film.

From the viewpoint of further excellent heat resistance and mechanical strength, the base film 2 is preferably a stretched film, more preferably a biaxially stretched film.

The base film 2 is preferably a film heat-treated in the air environment as described below, more preferably a biaxially stretched film heat-treated in the air environment. If such a base film 2 is used, the stress existing inside the base film 2 is relaxed, so when the light-transmitting conductive film 1 is attached to an object by heating, the light-transmitting conductive film 1 can be suppressed. 1. Excessive contraction.

The total light transmittance (JIS K-7105) of the base film 2 is, for example, 80% or more, preferably 85% or more, and for example, 100% or less, preferably 95% or less.

The haze (JIS K-7105) of the base film 2 is, for example, 2.0% or less, preferably 1.8% or less, more preferably 1.5% or less, further preferably 1.2% or less, and for example, 0.1% or more.

The thickness of the base film 2 is, for example, 2 μm or more, preferably 50 μm or more, more preferably 100 μm or more, and for example, 300 μm or less, preferably 250 μm or less. If the thickness of the base film 2 is more than the above-mentioned lower limit, then when forming the light-transmitting conductive layer 3, more moisture contained in the polymer film can be given to the light-transmitting conductive layer 3, so the light transmission can be suppressed. Crystallization of the conductive layer 3. Therefore, the amorphous property of the translucent conductive layer 3 can be maintained. Moreover, the intensity|strength of the translucent conductive film 1 will be excellent in the thickness of the base film 2 being more than the said minimum.

The thickness of the base film 2 can be measured using a film thickness meter, for example.

A separator or the like may be provided on the lower surface of the base film 2 .

3. Light-transmitting conductive layer The light-transmitting conductive layer 3 is a transparent conductive layer that can be patterned by etching in subsequent steps if necessary.

The translucent conductive layer 3 has a film shape (including a sheet shape), and is arranged on the entire upper surface of the base film 2 so as to be in contact with the upper surface of the base film 2 .

As the material of the light-transmitting conductive layer 3, for example, a material selected from the group consisting of In, Sn, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, and W can be cited. Metal oxides of at least one metal. In the metal oxide, the metal atoms shown in the above-mentioned groups may be further doped as needed.

Examples of the translucent conductive layer 3 include indium-based conductive oxides such as indium-tin composite oxide (ITO), antimony-based conductive oxides such as antimony-tin composite oxide (ATO), and the like. From the viewpoint of securing excellent conductivity and light transmittance, the light-transmitting conductive layer 3 contains an indium-based conductive oxide, more preferably an indium-tin composite oxide (ITO). That is, the translucent conductive layer 3 is preferably an indium-based conductive oxide layer, more preferably an ITO layer.

When using ITO as the material of the light-transmitting conductive layer 3, the content of tin oxide (SnO ₂ ) relative to the total amount of tin oxide and indium oxide (In ₂ O ₃ ) is, for example, 0.5% by mass or more, preferably 3% by mass. Mass % or more, more preferably 8 mass % or more, further preferably more than 10 mass %, and for example, 25 mass % or less, preferably 15 mass % or less, more preferably 13 mass % or less. When content of tin oxide is more than the said minimum, the excellent electroconductivity of the translucent conductive layer 3 can be realizable, and crystallization can be suppressed more reliably. Moreover, when content of tin oxide is below the said upper limit, the stability of translucency or electroconductivity can be improved.

"ITO" in this specification should just be a composite oxide containing at least indium (In) and tin (Sn), and may contain additional components other than these. Examples of additional components include metal elements other than In and Sn, and specific examples include Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, W, Fe, and Pb. , Ni, Nb, Cr, Ga, etc.

The translucent conductive layer 3 may be either crystalline or amorphous (amorphous), preferably amorphous, and more specifically, an amorphous ITO layer. When the translucent conductive layer 3 is amorphous, it is excellent in crack resistance and scratch resistance, and therefore excellent in workability. That is, when attaching the translucent conductive film 1 to an object to be attached (for example, a protective member such as glass described below), cracks or damages generated on the translucent conductive film 1 can be suppressed. Therefore, the appearance and characteristics of the attached translucent conductive film 1 can be well maintained.

Regarding the case where the light-transmitting conductive layer 3 is amorphous or crystalline, for example, when the light-transmitting conductive layer 3 is an ITO layer, it can be judged by the following method, that is, hydrochloric acid (concentration 5 After immersing in water for 15 minutes, wash with water, dry, and measure the resistance between terminals at a distance of about 15 mm. In this specification, the inter-terminal resistance of the translucent conductive film 1 is 10 kΩ after immersing the translucent conductive film 1 in hydrochloric acid (20°C, concentration: 5% by mass), washing with water, and drying. In the above cases, the translucent conductive layer is amorphous.

The surface resistance value of the translucent conductive layer 3 is, for example, 1 Ω/□ or more, preferably 10 Ω/□ or more, and for example, 200 Ω/□ or less, preferably 100 Ω/□ or less, more preferably 85 Ω /□ below. If the surface resistance value of the light-transmitting conductive layer 3 is within the above-mentioned range, good electrical drive can be realized even when used as a large-scale dimming device.

The specific resistance value of the translucent conductive layer 3 is, for example, 6×10 ^-4 Ω·cm or less, preferably 5.5×10 ^-4 Ω·cm or less, more preferably 5×10 ^-4 Ω·cm or less, and furthermore Preferably not more than 4.8×10 ^-4 Ω·cm, and for example not less than 3×10 ^-4 Ω·cm, preferably not less than 3.5×10 ^-4 Ω·cm, more preferably not less than 4.0×10 ^-4 Ω·cm . If the specific resistance value of the translucent conductive layer 3 is not more than the above-mentioned upper limit, good electrical drive can be realized even when it is used as a large-scale dimming device. Moreover, the amorphous property of the translucent conductive layer 3 can be maintained more reliably as a specific resistance value is more than the said minimum.

The thickness of the translucent conductive layer 3 is, for example, 10 nm or more, preferably 30 nm or more, more preferably 50 nm or more, and for example, 200 nm or less, preferably 150 nm or less, more preferably 100 nm or less. The thickness of the translucent conductive layer 3 can be measured by cross-sectional observation using a transmission electron microscope, for example.

4. Method of Manufacturing Light-Transmitting Conductive Film Next, a method of manufacturing the light-transmitting conductive film 1 will be described.

The manufacturing method of the light-transmitting conductive film 1 includes, for example: a preheating step, which is to heat the base film 2 in the atmosphere; Conductive layer disposition step of disposing light-transmitting conductive layer 3 thereon. The manufacturing method of the translucent conductive film 1 is preferably carried out in a roll-to-roll manner as shown in FIG. 2 .

In the preheating step, first, the base film 2 is prepared. For example, in the case of the roll-to-roll system, the substrate film 2 that is long in the conveyance direction (for example, the first direction) and wound up in a roll shape is used.

From the viewpoint of mechanical strength, heat resistance, and light transmittance, it is preferable to prepare the biaxially stretched base film 2 .

Next, the base film 2 is heated in an air environment. That is, the base film 2 is heated before the translucent conductive layer 3 is provided. The heating of the base film 2 is preferably carried out in a roll-to-roll manner. For example, the roll-shaped base film 2 wound into a strip is rolled out in an atmospheric environment, and after being heated while being transported, the strip is wound again. roll shape.

By this heat treatment, the internal stress of the base material film 2 can be released, and the heat shrinkage at the time of sticking the translucent conductive film 1 can be suppressed. In particular, a biaxially stretched film is given a strong internal stress by stretching during its manufacture, so that thermal shrinkage of the biaxially stretched film serving as the base film 2 can be more reliably suppressed.

In addition, since heating is performed in an air environment, wrinkles or damages generated on the base film 2 can be suppressed and the appearance of the translucent conductive film 1 can be maintained favorably compared with heating in a vacuum. That is, when the roll-shaped base film 2 is unwound from a roll or taken up, since the atmosphere can be interposed between the laminated base films 2, the adhesion or friction of the base film 2 can be suppressed, thereby Inhibits creases or damage. Moreover, when conveying the base film 2, since air can also be made to intervene between the conveying roll (for example, a guide roll) and the base film 2, excessive close contact with the carrying roll can also be suppressed, thereby suppressing wrinkles or damage. Such suppression is particularly effective for the appearance of dimming devices that are mostly used in large areas.

The heating temperature is, for example, above 100°C, preferably above 130°C, more preferably above 150°C, and for example below 220°C, preferably below 200°C, more preferably below 180°C. The heating temperature is a set temperature of a heating device (such as an IR (infrared) heater or a heating roller) for heating the base film 2 .

The heating time is, for example, 0.3 minutes or more, preferably 0.5 minutes or more, more preferably 1 minute or more, and for example, 10 minutes or less, preferably 5 minutes or less. When heating time is below the said upper limit, generation|occurrence|production of excessive precipitates (oligomer etc.) from the base film 2 can be suppressed, and the transparency fall of the base film 2 or high haze can be suppressed. Moreover, when heating time is more than the said minimum, the residual stress of the base material film 2 can fully be released, and the thermal shrinkage at the time of sticking of the translucent conductive film 1 can be suppressed more reliably.

In the step of arranging the conductive layer, for example, a light-transmitting conductive layer 3 is formed on the upper surface of the base film 2 by dry processing.

As a dry method, a vacuum evaporation method, a sputtering method, an ion plating method, etc. are mentioned, for example. Preferably, a sputtering method is mentioned.

The sputtering method is to arrange the target and the adherend (substrate film 2) facing each other in the chamber (film-forming chamber) of the vacuum device, supply gas and apply voltage, thereby accelerating gas ions and irradiating them to the target. Thereby, the target material is ejected from the target surface, and the target material is deposited on the surface of the attached body.

As a sputtering method, a diode sputtering method, an ECR (electron cyclotron resonance, electron cyclotron resonance) sputtering method, a magnetron sputtering method, an ion beam sputtering method, etc. are mentioned, for example. Preferably, a magnetron sputtering method is mentioned.

The power source used for the sputtering method may be, for example, any one of a direct current (DC) power source, an alternating current medium frequency (AC/MF) power source, a high frequency (RF) power source, and a high frequency power source superimposed with a DC power source.

As a target, the said metal oxide which comprises the translucent conductive layer 3 is mentioned. For example, when using ITO as a material of the translucent conductive layer 3, the target containing ITO is used. The content of tin oxide (SnO ₂ ) in the target is, for example, 0.5 mass % or more, preferably 3 mass % or more, more preferably 8 mass % or more with respect to the total amount of tin oxide and indium oxide (In ₂ O ₃ ), and further It is preferably more than 10% by mass, and is, for example, 25% by mass or less, preferably 15% by mass or less, more preferably 13% by mass or less.

Sputtering is preferably carried out under vacuum, and the gas pressure is, for example, 1.0 Pa or less, preferably 0.5 Pa or less, more preferably 0.2 Pa or less, and for example, 0.01 Pa or more.

As an introduction gas at the time of sputtering, an inert gas, such as Ar, is mentioned, for example. In addition, reactive gases such as oxygen are used together in this method. The ratio of the flow rate of the reactive gas to the flow rate of the inert gas (flow rate of the reactive gas (sccm)/flow rate of the inert gas (sccm)) is, for example, 0.1/100 to 5/100.

The temperature of the substrate film 2 when forming the light-transmitting conductive layer 3 is less than 40°C, preferably less than 20°C, more preferably less than 10°C, further preferably less than 5°C, and most preferably less than 0°C. Most preferably, it is -3°C or lower, and for example, it is -40°C or higher, preferably -20°C or higher. If the temperature of the base film 2 exceeds the above-mentioned upper limit, the base film 2 will extend in the conveying direction due to the tension in the conveying direction, so that a large stress remains on the base film 2 of the translucent conductive film 1 obtained. . As a result, when the translucent conductive film 1 is attached to an object, there is a possibility of large thermal shrinkage.

In order to cool the base film 2, for example, the lower surface of the base film 2 is brought into contact with a cooling device (for example, a cooling roll).

In the roll-to-roll system, for example, a film-forming roll or a nip roll can be cooled to form a cooling roll. The temperature of the above-mentioned base film 2 is set as the setting temperature of the cooling device.

The atmosphere (in the chamber) during sputtering is preferably water-containing, and the ratio of the moisture gas to the sputtering gas pressure (full pressure) (partial pressure of the moisture gas (Pa)/sputtering gas pressure (Pa)) is, for example, 0.006 or more. It is preferably at least 0.008, more preferably at least 0.01, and for example, at most 0.3, preferably at most 0.1, more preferably at most 0.07, and still more preferably at most 0.05. When the water content is within the above range, a small amount of water can be contained in the light-transmitting conductive layer 3 , and crystallization of the light-transmitting conductive layer 3 can be suppressed.

Thereby, the translucent electroconductive film 1 provided with the base film 2 and the translucent electroconductive layer 3 was obtained. At this time, the translucent conductive layer 3 is amorphous.

In the obtained translucent conductive film 1 , the total thickness thereof is, for example, 2 μm or more, preferably 20 μm or more, and for example, 300 μm or less, preferably 200 μm or less.

The in-plane dimensional change rate R of the translucent conductive film 1 is 0.55% or less, preferably 0.30% or less.

The in-plane dimensional change rate R is the oblique direction ( The rate of dimensional change in the direction intersecting both the first direction and the second direction) is specifically expressed by the following formula.

R=(ΔL ₁ ² +ΔL ₂ ² ) ^1/2 In the formula, ΔL ₁ represents the dimensional change rate (%) before and after TMA in the front-back direction (first direction), and is specifically represented by the following formula.

ΔL ₁ ＝{(L ₁ '－L ₁ )/L ₁ }×100 (%) L ₁ represents the length in the front-to-back direction at 20°C before performing TMA, and L ₁ ' represents the length in the front-to-back direction at 20°C after performing TMA length.

In the formula, ΔL ₂ represents the dimensional change rate (%) before and after TMA in the left-right direction (second direction), and is specifically represented by the following formula.

ΔL ₂ ＝{(L ₂ '－L ₂ )/L ₂ }×100 (%) L ₂ represents the length in the left-right direction at 20°C before performing TMA, and L ₂ ' represents the length in the left-right direction at 20°C after performing TMA length.

The absolute value of the dimensional change rate ΔL ₁ is, for example, 0.50 or less, preferably 0.30 or less. Also, the dimensional change rate ΔL ₁ is, for example, not less than -0.50, preferably more than 0, and is, for example, not more than 0.50, preferably not more than 0.30.

The absolute value of the dimensional change rate ΔL ₂ is, for example, 0.50 or less, preferably 0.30 or less. Also, the dimensional change rate ΔL ₂ is, for example, more than 0, preferably not less than 0.10, and for example, not more than 0.50, preferably not more than 0.30.

If the absolute value of the dimensional change rate ΔL ₁ and the absolute value of the dimensional change rate ΔL ₂ are within the above-mentioned ranges, when the translucent conductive film 1 is attached to the object by heating, the translucency can be prevented. Excessive shrinkage of the conductive film 1 can maintain a size close to the state before heating. In particular, if both the absolute value of the dimensional change rate ΔL ₁ and the absolute value of the dimensional change rate ΔL ₂ are within the above-mentioned ranges, the attached translucent conductive film 1 can be more reliably maintained as it was before heating. The state is close to the size or made larger than the state before heating.

Also, the dimensional change rate ΔL ₁ and the dimensional change rate ΔL ₂ can be any one of positive or negative values, preferably at least one of the dimensional change rate ΔL ₁ and the dimensional change rate ΔL ₂ is a positive value, more preferably Both the dimensional change rate ΔL ₁ and the dimensional change rate ΔL ₂ are positive values. In addition, when the said dimensional change rate is a positive value, the dimensional change of the translucent conductive film 1 after TMA shows expansion.

If at least one of the dimensional change rates is a positive value, when the light-transmitting conductive film 1 is attached to an object by heating, the attached light-transmitting conductive film 1 can be more reliably maintained. It is a size close to the state before heating. In particular, if both of the dimensional change rates are positive, the attached translucent conductive film 1 expands due to heating and becomes larger than the size before heating. Therefore, the translucent conductive film 1 can be reliably attached to the whole surface of an object.

In TMA, the load applied to the translucent conductive film 1 was 19.6 mN, and the size of the translucent conductive film 1 (measurement sample) at the time of measurement was 20 mm on the long side (the direction in which the load was applied) and 3 mm on the short side. mm. Other conditions are according to the examples.

Furthermore, in the case of the roll-to-roll method, for example, the conveyance direction (MD direction) of the conveyance base film 2 is set as the front-back direction (first direction), and the orthogonal direction (TD direction) perpendicular to the conveyance direction is Let it be a left-right direction (2nd direction) (refer FIG. 2).

In addition, when the translucent conductive film 1 is heated from 20°C to 150°C and then lowered to 20°C in accordance with JIS C 2151 (hereinafter also referred to simply as "the above heating step"), the difference between before and after heating in the front-rear direction is The absolute value of the dimensional change rate ΔM ₁ is, for example, 0.50% or less, preferably less than 0.30%. Also, the dimensional change rate ΔM ₁ is, for example, not less than -0.50%, preferably not less than -0.30%, and for example, not more than 0.50%, preferably less than 0%.

The dimensional change rate ΔM ₁ is represented by the following formula, where M ₁ is the length in the front-back direction at 20°C before the heating step and M ₁ ′ is the length in the front-back direction at 20°C after the heating step. .

ΔM ₁ ={(M ₁ ′-M ₁ )/M ₁ }×100 (%) In addition, when the above-mentioned heating step is performed, the absolute value of the dimensional change rate ΔM ₂ in the left-right direction before and after heating is, for example, 0.50% or less , preferably less than 0.30%, more preferably less than 0.10%. Also, the dimensional change rate ΔM ₂ is, for example, -0.50% or more, preferably -0.30% or more, and is, for example, 0.50% or less, preferably less than 0%.

The dimensional change rate ΔM ₂ is represented by the following formula, where the length in the left-right direction at 20°C before the above-mentioned heating step is taken as M ₂ , and the length in the left-right direction at 20°C after the above-mentioned heating step is taken as M ₂ ' .

ΔM ₂ ={(M ₂ ′−M ₂ )/M ₂ }×100 (%) In addition, at least one of the absolute values of the dimensional change rate ΔM ₁ and the dimensional change rate ΔM ₂ is preferably less than 0.30%. More preferably, neither the absolute value of ΔM ₁ nor the absolute value of ΔM ₂ reaches 0.30%.

The method according to JIS C 2151 is a method of heating the translucent conductive film 1 in a state where no load such as a tensile load is applied to the translucent conductive film 1 .

Dimensional change rate ΔM ₁ and dimensional change rate ΔM ₂ can be either positive or negative, preferably at least one of dimensional change rate ΔM ₁ and dimensional change rate ΔM ₂ is negative, more preferably dimensional change Both the rate ΔM ₁ and the dimensional change rate ΔM ₂ are negative values. When the dimensional change rate is a negative value, the dimensional change of the light-transmitting conductive film 1 after the heating step shows shrinkage.

The haze (JIS K-7105) of the translucent conductive film 1 is, for example, 2.0% or less, preferably 1.8% or less, more preferably 1.5% or less, further preferably 1.2% or less, and for example, 0.1% or more. When the haze of the light-transmitting conductive film 1 is in the said range, it can be used preferably as a light-transmitting conductive film for light adjustment.

The light-transmitting conductive film 1 may be etched as needed to pattern the light-transmitting conductive layer 3 into a specific shape.

5. Manufacturing method of light-adjusting film Next, a method of manufacturing the light-adjusting film 4 using the light-transmitting conductive film 1 will be described with reference to FIG. 3 .

The manufacturing method of the light-adjusting film 4 includes, for example, a step of manufacturing two light-transmitting conductive films 1 , and a step of sandwiching the light-adjusting functional layer 5 with the two light-transmitting conductive films 1 .

First, two translucent conductive films 1 are produced. In addition, you may prepare the translucent electroconductive film 1 of 2 sheets by cutting the translucent electroconductive film 1 of 1 sheet.

The two translucent conductive films 1 are the first translucent conductive film 1A and the second translucent conductive film 1B.

Next, the light-adjusting function layer 5 is formed on the upper surface (surface) of the light-transmitting conductive layer 3 in the first light-transmitting conductive film 1A, for example, by wet method.

For example, a liquid crystal composition or a solution thereof is applied to the upper surface of the light-transmitting conductive layer 3 in the first light-transmitting conductive film 1A to form a coating film. The liquid crystal composition is not limited as long as it can be used for dimming purposes, and known ones can be mentioned, for example, liquid crystal dispersion resins described in Japanese Patent Application Laid-Open No. 8-194209.

Next, the second light-transmitting conductive film 1B is laminated on the upper surface of the coating film so that the light-transmitting conductive layer 3 of the second light-transmitting conductive film 1B is in contact with the coating film. Thereby, the coating film is sandwiched between the two translucent conductive films 1 , that is, the first translucent conductive film 1A and the second translucent conductive film 1B.

Thereafter, the coating film is subjected to appropriate treatment (such as thermal drying treatment, photohardening treatment) as needed to form the light-adjusting function layer 5 . The dimming function layer 5 is arranged between the light-transmitting conductive layer 3 of the first light-transmitting conductive film 1A and the light-transmitting conductive layer 3 of the second light-transmitting conductive film 1B.

Thereby, the light control film 4 provided with the 1st translucent conductive film 1A, the light control function layer 5, and the 2nd translucent conductive film 1B in this order is obtained.

6. Manufacturing method of the dimming member Next, a method of manufacturing the dimming member 6 using the dimming film 4 will be described with reference to FIGS. 4A-D .

The manufacturing method of the dimming member 6 includes, for example: the step of forming a thermosetting adhesive layer 8 on the protective member 7, the step of disposing the dimming film 4 on the thermosetting adhesive layer 8, and placing the thermosetting adhesive Layer 8 undergoes a heat hardening step.

First, as shown in FIG. 4A , the protective member 7 is prepared. The protective member 7 is an object to which the dimming film 4 is attached, and examples thereof include window glass, partitions, interior decoration, and the like. Specifically, the protective member 7 uses a rigid transparent plate having appropriate mechanical strength and thickness, for example, a glass plate, a reinforced plastic plate (for example, polycarbonate resin), and the like.

Next, as shown in FIG. 4B , a thermosetting adhesive layer 8 is formed on the protective member 7 . For example, a liquid thermosetting adhesive composition is applied to the entire upper surface (surface) of the protective member 7 .

As a thermosetting adhesive composition, an epoxy-type thermosetting adhesive composition, an acryl-type thermosetting adhesive composition, etc. are mentioned, for example. Furthermore, as long as the thermosetting adhesive composition can maintain the attachment of the light-adjusting film 4 and the protective member 7 after thermosetting, any resin can be used, and it is not limited to the above examples.

As a coating method, the method using an applicator, pouring, cast coating, spin coating, roll coating etc. are mentioned, for example.

Next, as shown in FIG. 4C , the light-adjusting film 4 is disposed on the thermosetting adhesive layer 8 . That is, the light-adjusting film 4 is disposed on the upper surface of the protection member 7 via the heat-insulating curable adhesive layer 8 .

At this time, the light-adjusting film 4 is arranged so as to have substantially the same size as the protective member 7 . Specifically, the dimming film 4 is cut so that it has substantially the same size as the protective member 7 (the same length in the front-back direction and the same length in the left-right direction), and then the peripheral edge of the protective member 7 is connected to the dimming film 4 The peripheral edges of the light-adjusting film 4 are arranged on the upper surface of the thermosetting adhesive layer 8 in such a way that they are consistent when projected to the up-down direction.

Next, as shown in FIG. 4D , the thermosetting adhesive layer 8 is cured by heating.

The heating temperature is, for example, 80°C or higher, preferably 100°C or higher, and for example, 180°C or lower, preferably 160°C or lower.

The heating time is, for example, 5 minutes or more, preferably 20 minutes or more, more preferably 30 minutes or more, and for example, 600 minutes or less, preferably 300 minutes or less.

Heat hardening can be performed in an atmospheric environment or a vacuum environment, and moderate pressure can also be applied.

Thereafter, the dimming film 4 attached to the protective member 7 is cooled to room temperature (5-35° C.).

Thereby, the thermosetting adhesive layer 8 is thermally hardened, and the adhesive layer 8a is formed. As a result, the light-adjusting film 4 is attached (fixed) to the protective member 7 via the adhesive layer 8 a.

At this time, the light-transmitting conductive film 1 and even the light-adjusting film 4 maintain a plan view size close to the state before heating or expand. Furthermore, when the light-adjusting film 4 expands, as shown by the imaginary line, the end portion (extending portion 9) of the light-adjusting film 4 protrudes laterally from the end edge of the protective member 7 in the plane direction. That is, the peripheral edge of the dimming film 4 is located further outside than the peripheral edge of the protective member 7 .

Thereby, as shown in FIG. 4D , a dimming member 6 including a protective member 7 , an adhesive layer 8 a disposed on its upper surface, and a dimming film 4 disposed on the upper surface of the adhesive layer 8 a is obtained.

Thereafter, when the light-adjusting film 4 expands, the light-adjusting film 4 is then cut off as shown by the imaginary line in FIG. 4D if necessary. That is, the end portion of the light-adjusting film 4 is cut in the vertical direction to remove the protruding portion 9 of the light-adjusting film 4 . In this way, the dimming member 6 in which the protective member 7 and the dimming film 4 are approximately the same size is obtained.

The dimming member 6 is used as, for example, an electrically driven dimming device (not shown) by installing wiring (not shown), a power supply (not shown), and a control device (not shown). Examples of the electrically driven type include an electric field driven type and a current driven type. As an example, in an electric field-driven dimming device, the light-transmitting conductive layer 3 in the first light-transmitting conductive film 1A and the light-transmitting conductive layer in the second light-transmitting conductive film 1B are connected by wiring and power supply. 3 Applying a voltage, whereby an electric field is generated between them. And, by controlling the above-mentioned electric field with the control device, the light-adjusting functional layer 5 located therebetween becomes an aligned state or an irregular state, thereby transmitting or blocking light (or scattering light).

When the light-transmitting conductive film 1 and the light-adjusting film 4 are subjected to a thermomechanical analysis procedure (TMA) at 20°C-160°C-20°C, the in-plane dimensional change rate R is 0.55% or less. Therefore, even if the light-transmitting conductive film 1 is attached to the protection member 7 (object) by heating, the light-transmitting conductive film 1 can maintain the size close to the state before heating. Therefore, the area not attached to the protective member 7 can be reduced, and the translucent conductive film 1 of a desired size can be attached to an object.

Although the mechanism is not clear, it is presumed that the reason is that when the light-transmitting conductive film 1 is attached to the protective member 7 via a thermosetting adhesive by heating, and when the light-transmitting conductive film 1 is pulled. In the case of stretched and heated TMA, the expansion and contraction of the translucent conductive film 1 show the same behavior.

Using the light-adjusting member 6 with the light-adjusting film 4 reduces the area on the upper surface (attachment surface) of the protective member 7 where the light-adjusting film 4 is not attached. Therefore, it is possible to have a dimming function with a large area of the protective member 7 (especially at the end).

7. Variation In the embodiment shown in FIG. 1 , the light-transmitting conductive layer 3 is directly disposed on the upper surface of the base film 2 , but for example, a function may be provided on the upper surface and/or the lower surface of the base film 2 . layer, but not shown.

That is, the translucent conductive film 1 can include, for example, a base film 2 , a functional layer disposed on the upper surface of the base film 2 , and a translucent conductive layer 3 disposed on the upper surface of the functional layer. In addition, the translucent conductive film 1 may include, for example, a base film 2 , a translucent conductive layer 3 disposed on the upper surface of the base film 2 , and a functional layer disposed on the lower surface of the base film 2 . Moreover, for example, the functional layer and the translucent conductive layer 3 may be provided in this order on the upper side and the lower side of the base film 2.

As a functional layer, an easy-adhesive layer, a primer layer, a hard coat layer, etc. are mentioned. The easy-adhesive layer is a layer provided in order to improve the adhesiveness of the base film 2 and the translucent conductive layer 3 . The primer layer is a layer provided to adjust the reflectance or optical hue of the translucent conductive film 1 . The hard coat layer is a layer provided in order to improve the scratch resistance of the translucent conductive film 1 . These functional layers may be used alone or in combination of two or more.

In the embodiment shown in FIG. 4D , the dimming member 6 is provided with the adhesive layer 8a and the dimming film 4 on the upper surface of the protective member 7, but for example, the upper surface of the dimming film 4 can also be provided with adhesive The agent layer 8a and the protective member 7 are not shown in the figure.

In addition, wiring may be arranged on the outer peripheral portion of the light-transmitting conductive layer 3 of the light-adjustable film 4 before the light-adjustable film 4 is attached to the protective member 7 .

In addition, in Fig. 4A-D, the manufacturing method of the dimming member 6 is to use the thermosetting adhesive layer 8 to attach the dimming film 4 to the protective member 7, but as the adhesive layer, as long as the adhesion can be achieved by heating That is, it is not limited to the thermosetting adhesive layer. For example, the dimming film 4 may be attached to the protective member 7 using a hot-melt adhesive, which is not shown in the figure. That is, the manufacturing method of the dimming member 6 may also include, for example, a step of forming a hot-melt adhesive layer on the protective member 7, a step of disposing the dimming film 4 on the hot-melt adhesive layer, and adding the hot-melt adhesive layer to the protective member 7. The step of heating and melting the adhesive layer is carried out.

As a method of forming the hot-melt adhesive layer, for example, a sheet containing a hot-melt adhesive composition is laminated on the entire upper surface of the protective member 7 .

Examples of hot-melt adhesive compositions include ethylene-vinyl acetate compositions, polyolefin compositions, polyamide compositions, polyester compositions, polypropylene compositions, polyurethane compositions, Thermoplastic resin compositions such as ester-based compositions, etc. These may be used alone or in combination of two or more. Such a hot-melt adhesive composition is used, for example, as a hot-melt adhesive.

The heating temperature of the heat-melting adhesive layer is, for example, the same as the heating temperature of the above-mentioned thermosetting adhesive layer 8 .

<Other Embodiments> In the above-mentioned one embodiment, the light-transmitting conductive film for light adjustment was exemplified as the light-transmitting conductive film 1 , but the light-transmitting conductive film can also be applied to uses other than light control, for example.

Specifically, the light-transmitting conductive film is included in optical devices such as image display devices (LCD (Liquid Crystal Display, liquid crystal display), organic EL (Electroluminescence, electroluminescence)). A light-transmitting conductive film is preferably used as a base material for a touch panel. As a form of a touch panel, various systems, such as an optical system, an ultrasonic system, a capacitive system, and a resistive film system, can be mentioned, Especially, it can be suitably used for the touch panel of a capacitive system. Example

Hereinafter, the present invention will be described in detail using examples, but the present invention is not limited to the examples unless the gist is exceeded, and various changes and modifications can be made based on the technical idea of the present invention. In addition, specific numerical values such as blending ratios (content ratios), physical property values, and parameters used in the following descriptions may be replaced by corresponding blending ratios (content ratios), physical property values, parameters, etc. described in the above "embodiments" The upper limit (defined as the value of "below" or "less than") or the lower limit (defined as the value of "above" or "exceeding") of the corresponding records.

Example 1 A long polyethylene terephthalate (PET) film (thickness 188 μm, biaxially stretched film) was prepared as a translucent base film.

The PET film was heated in the atmosphere at 170° C. for 1 minute in a roll-to-roll manner (preheating).

Next, the heated PET film was set in a roll-to-roll sputtering device, and a translucent conductive layer containing amorphous ITO with a thickness of 65 nm was formed by DC magnetron sputtering. In addition, as the condition of sputtering, the temperature of the PET film was set to -5 degreeC. The atmosphere during sputtering is set as a vacuum atmosphere with Ar and _O2 introduced at a pressure of 0.2 Pa (flow ratio is Ar: _O2 = 100:3.3), and its water content (moisture gas / total pressure) is set as 0.05. As a target, a sintered body of 12 mass % tin oxide and 88 mass % indium oxide was used.

Example 2 The thickness of the PET film was set to 50 μm, the temperature of the PET film during sputtering was set to 0°C, and the atmosphere during sputtering was set to a vacuum atmosphere with Ar and _O2 introduced at a pressure of 0.4 Pa. (The flow ratio is Ar:O ₂ =100:3.0). As a target, a sintered body of 10% by mass tin oxide and 90% by mass indium oxide is used, and the thickness of the light-transmitting conductive layer is set to 25 nm. Except that, the translucent conductive film was produced in the same manner as in Example 1.

Comparative example 1 Except having not given preheating to the PET film, it carried out similarly to Example 1, and manufactured the translucent electroconductive film.

Comparative Example 2 Set the temperature of the PET film in sputtering to 140°C, set the water content to 0.005, and then heat it under the conditions of 170°C for 2 minutes under the atmosphere after forming the light-transmitting conductive layer. Except that, the translucent conductive film was produced in the same manner as in Example 2.

(Evaluation) (1) Thickness The thickness of the PET film (substrate film) was measured using a film thickness gauge (manufactured by Ozaki Seisakusho Co., Ltd., device name "digital dial gauge DG-205"). The thickness of the ITO layer (translucent conductive layer) was measured by cross-sectional observation using a transmission electron microscope (manufactured by Hitachi, device name "HF-2000").

(2) Measurement of dimensional change by thermomechanical analysis (TMA) The light-transmitting conductive films of each example and each comparative example were cut into strips with a length of 20 mm and a length of 3 mm to prepare measurement samples. Furthermore, when measuring the dimensional change in the MD direction (the first direction), the MD direction becomes the long side and the TD direction (the direction perpendicular to the MD direction, the second direction) becomes the short side. Also, when measuring the dimensional change in the TD direction, cutting is performed so that the TD direction becomes the long side and the MD direction becomes the short side. In this way, measurement samples for measuring dimensional changes in various directions were produced.

Set the measurement sample in a thermomechanical analysis device (manufactured by SII Technology, "TMA/SS71000"), and measure the dimensional change when the temperature rises from 20°C to 160°C and then cools down to 20°C for each of the MD and TD directions Rate.

That is, let the length in the MD direction at 20°C before the temperature increase be L ₁ , and the length in the MD direction at 20°C after the temperature increase be L _{1 ′} , and use “{(L ₁ ′−L ₁ )/L ₁ } ×100(%)” to calculate the dimensional change rate ΔL ₁ (%) in the MD direction. Also, let the length in the TD direction at 20°C before the temperature increase be M ₂ , and the length in the TD direction at 20°C after the temperature increase be L _{2 ′} , and use “{(L ₂ ′−L ₂ )/L ₂ } ×100(%)” to calculate the dimensional change rate ΔL ₂ (%) in the TD direction. Furthermore, the in-plane dimensional change rate R of the entire measurement sample was calculated using the formula "{(ΔL ₁ ) ² +(ΔL ₂ ) ² } ^1/2 ".

In addition, the conditions of thermomechanical analysis were set as follows.

Measuring mode: Tensile method Load: 19.6 mN Heating rate: 10°C/min Measuring atmosphere: Atmosphere (flow rate: 200 ml/min) Clamping distance: 10 mm The translucent conductive films of Examples and Comparative Examples were cut to 10 cm in the MD direction (first direction) and 10 cm in the TD direction (the direction perpendicular to the MD direction, the second direction) to prepare samples. The temperature at this time was 20°C.

According to JIS C 2151, the sample was heated in a hot air oven at 150°C for 30 minutes, and then cooled to 20°C. The dimensional change rate after the high-temperature treatment was measured for each of the MD direction and the TD direction.

That is, the length in the MD direction at 20°C before the temperature rise is M ₁ , and the length in the MD direction at 20°C after the temperature rise is M _{1 ′} , using “{(M ₁ ′－M ₁ )/M ₁ }×100(%)” to calculate the dimensional change rate ΔM ₁ (%) in the MD direction. Also, let the length in the TD direction at 20°C before the temperature increase be M ₂ , and the length in the TD direction at 20°C after the temperature increase be M _{2 ′} , and use “{(M ₂ ′－M ₂ )/M ₂ } ×100(%)” to calculate the dimensional change rate ΔM ₂ (%) in the TD direction.

(4) Adhesion test to glass A thermosetting resin (acrylic adhesive) was coated on the entire surface of a commercially available glass plate (30 cm in the front-back direction x 25 cm in the left-right direction). Next, the translucent conductive films of Examples and Comparative Examples having the same size as the glass plate were prepared, and each translucent conductive film was placed on the thermosetting thermosetting film in such a way that the peripheral edge of the glass plate coincided with the peripheral edge of the translucent conductive film. The upper surface of the agent was bonded, and then heated at 150° C. for 60 minutes in the atmosphere. Thereby, the translucent conductive film was attached to the glass plate.

The case where the entire surface of the glass is completely covered with the translucent conductive film 1 and the protrusion of the end of the translucent conductive film is a level that is practically barrier-free is evaluated as ○, and the end of one surface of the glass is The edge was slightly exposed, but it was evaluated as △, and the edge of one side of the glass was exposed more, but it was evaluated as a grade that was practically hindered.

Furthermore, it can be seen that in Example 1, the light-transmitting conductive film attached is slightly expanded from the longitudinal direction and the lateral direction of the glass plate, so by cutting off the end of the expanded film, it can be attached to the glass plate as a whole. Attach a light-transmitting conductive film of the same size as the glass plate.

(5) Amorphous property The translucent conductive films of Examples and Comparative Examples were heated at 80° C. for 20 hours in an air environment. Thereafter, the heated translucent conductive film was immersed in hydrochloric acid (concentration: 5% by mass) for 15 minutes, washed with water, dried, and the resistance between the two terminals of each conductive layer at a distance of about 15 mm was measured. The case where the resistance between both terminals of 15 mm exceeds 10 kΩ was judged to be amorphous and evaluated as ◯. The case where it did not exceed 10 kΩ was judged to be crystalline and evaluated as x. The results are shown in Table 1.

(6) Appearance The surface of the translucent conductive film of each Example and each Comparative Example was observed with the naked eye. The case where no wrinkles or streaks are observed on the surface of the film is rated as ◎, the case where a few wrinkles or streaks are observed, but is rated as a level that does not cause trouble as a light control device is rated as ○, and slightly larger wrinkles are observed Or stripes, but the case of a level that does not cause major failure as a light adjustment device is evaluated as △, and the case where wrinkles or streaks of a level that cannot be used as a light adjustment device is observed is evaluated as ×. The results are shown in Table 1.

[Table 1]

In addition, the above-mentioned invention is provided as the illustrated embodiment of this invention, it is only an illustration, and it cannot interpret it restrictively. Variations of the present invention that are clear to those skilled in the art are included in the following patent claims. [Industrial availability]

The light-transmitting conductive film of the present invention can be applied to various industrial products, for example, it can be preferably applied to a light-adjusting film included in a light-adjusting member, or a base material for a touch panel included in an image display device.

1‧‧‧Light-transmitting conductive film 1A‧‧‧First light-transmitting conductive film 1B‧‧‧Second light-transmitting conductive film 2‧‧‧Substrate film 3‧‧‧Light-transmitting conductive layer 4‧‧ ‧Light adjustment film 5

1A to B show one embodiment of the light-transmitting conductive film of the present invention, FIG. 1A shows a cross-sectional view, and FIG. 1B shows a perspective view. FIG. 2 is a perspective view showing the steps of manufacturing the light-transmitting conductive film shown in FIG. 1A. FIG. 3 shows a cross-sectional view of a light-adjusting film provided with the light-transmitting conductive film shown in FIG. 1A . Figures 4A-D are step diagrams of manufacturing a dimming member using the dimming film shown in Figure 2, Figure 4A shows the steps of preparing a protective member, Figure 4B shows the steps of setting a thermosetting adhesive layer on the protective member, Figure 4C It shows the step of disposing the light-adjusting film on the thermosetting adhesive layer, and FIG. 4D shows the step of heating and hardening the thermosetting adhesive layer.

1‧‧‧Light-transmitting conductive film

2‧‧‧Substrate film

3‧‧‧Light-transmitting conductive layer

Claims (9)

A light-transmitting conductive film, characterized in that: it extends in a first direction and a second direction perpendicular to the above-mentioned first direction, and has a base film and a light-transmitting conductive layer. When the transparent conductive film is subjected to the thermomechanical analysis step of heating from 20°C to 160°C and then cooling to 20°C, the in-plane dimensional change rate R represented by the following formula is 0.55% or less, R=(ΔL ₁ ² +ΔL ₂ ² ) ^1/2 (wherein, ΔL ₁ represents the dimensional change rate (%) in the above-mentioned first direction before and after the above-mentioned analysis step, and ΔL ₂ represents the dimensional change rate (%) in the above-mentioned second direction before and after the above-mentioned analysis step) . The light-transmitting conductive film according to claim 1, wherein both the absolute value of ΔL ₁ and the absolute value of ΔL ₂ are 0.50 or less. The translucent conductive film according to claim 1 or 2, wherein at least one of ΔL ₁ and ΔL ₂ is a positive value. The light-transmitting conductive film according to claim 3, wherein both ΔL ₁ and ΔL ₂ are positive values. The light-transmitting conductive film according to claim 1 or 2, wherein the above-mentioned base film is a film that has been heat-treated in an atmospheric environment. The translucent conductive film according to claim 1 or 2, wherein the base film is a polyester film. A light-adjusting film, characterized in that: sequentially equipped with a first light-transmitting conductive film, a light-adjusting function layer, and a second light-transmitting conductive film, and the above-mentioned first light-transmitting conductive film and/or the above-mentioned second light-transmitting film The photoconductive film is the translucent conductive film according to any one of Claims 1 to 6. A dimming component, characterized in that it has a protective component, and the dimming film according to claim 7 attached to the protective component. A method of manufacturing a light-transmitting conductive film, characterized in that it is a method of manufacturing a light-transmitting conductive film according to any one of Claims 1 to 6, and includes the step of heating the base film in an atmospheric environment , and then, a step of providing a light-transmitting conductive layer on the above-mentioned base film in a state where the above-mentioned base film is kept below 40°C.

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