TWI786189B - Organic EL display device, and method for forming pixel division layer and planarization layer - Google Patents
Organic EL display device, and method for forming pixel division layer and planarization layer Download PDFInfo
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Abstract
本發明提供一種有機EL顯示裝置,其可抑制因為顏料凝集物所造成之顯影殘渣而產生的黑點,且發光可靠度優良。 The present invention provides an organic EL display device capable of suppressing black spots caused by development residues caused by pigment aggregates and having excellent luminescence reliability.
本發明之有機EL顯示裝置,其係具備第一電極、像素分割層、發光像素、第二電極、平坦化層及基材的有機EL顯示裝置,其中,該像素分割層及/或該平坦化層含有(a)具有含氮雜環結構的黑色材、(b)分散劑、及(c)樹脂,而該(b)分散劑含有以下述通式(1)表示之化合物及/或以下述通式(2)表示之化合物。 The organic EL display device of the present invention is an organic EL display device comprising a first electrode, a pixel dividing layer, a light-emitting pixel, a second electrode, a planarization layer, and a substrate, wherein the pixel dividing layer and/or the planarization layer The layer contains (a) a black material having a nitrogen-containing heterocyclic structure, (b) a dispersant, and (c) a resin, and the (b) dispersant contains a compound represented by the following general formula (1) and/or the following A compound represented by general formula (2).
Description
本發明係關於有機EL顯示裝置。 The present invention relates to an organic EL display device.
目前正在開發在智慧型手機、平板電腦PC及電視等具有薄型顯示器的顯示裝置中搭載有機電致發光(EL)顯示器的許多產品。有機EL顯示裝置係使用從陰極注入之電子與從陽極注入之電洞再結合所釋放之能量而進行發光的自發光型顯示裝置。作為其具體例,有人揭示一種具備具有作為絕緣膜之功能的像素分割層及平坦化層的有機EL顯示裝置(例如,專利文獻1)。 Many products that incorporate organic electroluminescent (EL) displays in display devices with thin displays such as smartphones, tablet PCs, and TVs are currently being developed. The organic EL display device is a self-luminous display device that uses the energy released by the recombination of electrons injected from the cathode and holes injected from the anode to emit light. As a specific example thereof, an organic EL display device including a pixel dividing layer and a planarization layer having a function as an insulating film is disclosed (for example, Patent Document 1).
又,近年來嘗試藉由賦予像素分割層及/或平坦化層遮光性,降低太陽光等的外部光反射,以提升有機EL顯示裝置的辨視性及對比。作為其具體例,有人揭示一種具備經黑色化之像素分割層的有機EL顯示裝置(例如,專利文獻2)。 In addition, in recent years, attempts have been made to improve the visibility and contrast of organic EL display devices by imparting light-shielding properties to the pixel division layer and/or the planarization layer to reduce reflection of external light such as sunlight. As a specific example thereof, an organic EL display device including a blackened pixel division layer is disclosed (for example, Patent Document 2).
作為用以形成經黑色化之像素分割層的組成物,可舉出含有多種不同色相之有機顏料並以減法混色進行仿黑色化的感光性組成物,作為其具體例,有人揭示了一種包含有機紅色顏料與有機藍色顏料的感光性組成物(例如參照專利文獻3)。 As a composition for forming a blackened pixel division layer, there may be mentioned a photosensitive composition containing organic pigments of various hues and performing blackening by subtractive color mixing. As a specific example, a composition containing organic A photosensitive composition of a red pigment and an organic blue pigment (for example, refer to Patent Document 3).
此外,若欲將有機顏料分散於樹脂溶液中,則因為在分散步驟的途中或分散步驟後發生再凝集,而大多有無法得到充分著色力的情況、或是引起在多種顏料共存的分散系中產生顏色分離等問題的情況。為了解決上述問題,使用有機色素衍生物(增效劑)作為分散劑而提升有機顏料表面的樹脂吸附性並且提高分散穩定性,此已為人所知。與有機EL顯示裝置的像素分割層相同,在必須具備降低外部光反射之功能的液晶顯示裝置之黑色矩陣的領域中,碳黑在電特性上具有缺乏絕緣性且介電係數高這樣的缺點,而作為代替該碳黑的技術,仿黑色化感光性組成物受到矚目,有人揭示了併用有機顏料與有機色素衍生物的技術。作為其具體例,有人揭示一種含有苝系有機顏料與具有磺酸基之銅酞青衍生物的仿黑色化感光性組成物(例如參照專利文獻4)。 In addition, when an organic pigment is to be dispersed in a resin solution, due to re-agglomeration occurring during or after the dispersion step, sufficient coloring power may not be obtained in many cases, or in a dispersion system in which a plurality of pigments coexist. Cases where problems such as color separation occur. In order to solve the above-mentioned problems, it is known to use organic pigment derivatives (synergists) as dispersants to enhance resin adsorption on the surface of organic pigments and improve dispersion stability. Like the pixel division layer of organic EL display devices, in the field of black matrix of liquid crystal display devices that must have the function of reducing external light reflection, carbon black has the disadvantages of lack of insulation and high dielectric coefficient in terms of electrical characteristics. As a technique to replace the carbon black, a black-like photosensitive composition has attracted attention, and a technique of using an organic pigment and an organic pigment derivative in combination has been disclosed. As a specific example thereof, a photosensitive composition for imitating blackening containing a perylene-based organic pigment and a copper phthalocyanine derivative having a sulfonic acid group has been disclosed (for example, refer to Patent Document 4).
專利文獻1 國際公開第2016/047483號
專利文獻2 日本特開2013-30293號公報
專利文獻3 日本特開2013-207124號公報
專利文獻4 國際公開第2015/015962號
然而,若使用專利文獻3及4中記載的仿黑色化感光性組成物形成有機EL顯示裝置的像素分割層 及/或平坦化層,則有機顏料在感光性組成物中的分散穩定性並不充分。再者,其分散狀態容易在顯影步驟中被破壞,而在圖案開口部的ITO電極上產生源自顏料凝集物的顯影殘渣,進而發生產生黑點這樣的問題。又,專利文獻4中記載一種感光性組成物,其藉由增加具有磺酸基之銅酞青衍生物的含量而在某種程度上改善了分散穩定性,但若使用這樣的感光性組成物來形成像素分割層及/或平坦化層,會產生有損發光可靠度這樣的問題,而具有無法兼具抑制黑點與高發光可靠度這樣的課題。 However, if the blackened photosensitive compositions described in
由於以上的背景,迫切期望一種抑制黑點的發生且具有高發光可靠度的有機EL顯示裝置。 Due to the above background, an organic EL display device that suppresses the occurrence of black spots and has high light emission reliability has been strongly desired.
本發明的有機EL顯示裝置,係具備第一電極、像素分割層、發光像素、第二電極、平坦化層及基材的有機EL顯示裝置,其特徵為該像素分割層及/或該平坦化層包含:(a)具有含氮雜環結構的黑色材、(b)分散劑及(c)樹脂;該(b)分散劑含有以下述通式(1)表示之化合物及/或以下述通式(2)表示之化合物。 The organic EL display device of the present invention is an organic EL display device provided with a first electrode, a pixel dividing layer, a light-emitting pixel, a second electrode, a planarization layer, and a substrate, and is characterized in that the pixel dividing layer and/or the planarization The layer includes: (a) a black material having a nitrogen-containing heterocyclic structure, (b) a dispersant, and (c) a resin; the (b) dispersant contains a compound represented by the following general formula (1) and/or is represented by the following general formula A compound represented by formula (2).
上述通式(1)中,X1係與苝環直接鍵結的取代基,其表示-SO3H、-SO3M、-SO2NHR1或-CONHR1。M表示Na、K或是NH4。R1表示末端具有N,N-二烷胺基的有機基。Z1表示與苝環直接鍵結的原子或是取代基,其表示氫原子、烷基或是烷氧基。n及m為整數,n表示1或2,並且滿足n+m=10。 In the above general formula (1), X 1 is a substituent directly bonded to the perylene ring and represents -SO 3 H, -SO 3 M, -SO 2 NHR 1 or -CONHR 1 . M represents Na, K or NH 4 . R 1 represents an organic group having an N,N-dialkylamino group at the terminal. Z 1 represents an atom directly bonded to the perylene ring or a substituent, which represents a hydrogen atom, an alkyl group or an alkoxy group. n and m are integers, n represents 1 or 2, and satisfies n+m=10.
上述通式(2)中,R2及R3彼此相同,其表示氫原子、具有取代基的芳基或甲基,X2係與苝環及/或苯環直接鍵結的取代基,其表示-SO3H、-SO3M、-SO2NHR4或是-CONHR4。M表示Na、K或是NH4。R4表示末端具有N,N-二烷胺基的有機基。Z2表示與苝環直接鍵結的原子或是取代基,其表示氫原子、烷基或是烷氧基。p及q為整數,p表示1或2,q表示6~8。 In the above general formula ( 2 ), R2 and R3 are identical to each other, which represent a hydrogen atom, an aryl group or a methyl group with a substituent, and X2 is a substituent directly bonded to the perylene ring and/or benzene ring, which Represents -SO 3 H, -SO 3 M, -SO 2 NHR 4 or -CONHR 4 . M represents Na, K or NH 4 . R 4 represents an organic group having a N,N-dialkylamino group at the end. Z 2 represents an atom directly bonded to the perylene ring or a substituent, which represents a hydrogen atom, an alkyl group or an alkoxy group. p and q are integers, p means 1 or 2, and q means 6~8.
根據本發明之有機EL顯示裝置,可抑制源自顏料凝集物所造成之顯影殘渣的黑點,且可得到優良的發光可靠度。 According to the organic EL display device of the present invention, black spots derived from development residue caused by pigment aggregates can be suppressed, and excellent light emission reliability can be obtained.
1‧‧‧TFT 1‧‧‧TFT
2‧‧‧配線 2‧‧‧Wiring
3‧‧‧TFT絕緣膜 3‧‧‧TFT insulating film
4‧‧‧平坦化層 4‧‧‧planarization layer
5‧‧‧第二電極(ITO電極) 5‧‧‧Second electrode (ITO electrode)
6‧‧‧基材 6‧‧‧Substrate
7‧‧‧接觸孔 7‧‧‧Contact hole
8‧‧‧像素分割層 8‧‧‧Pixel segmentation layer
9‧‧‧發光像素 9‧‧‧luminous pixels
10‧‧‧第一電極 10‧‧‧First electrode
11‧‧‧無鹼玻璃基板 11‧‧‧Alkali-free glass substrate
12‧‧‧金屬反射層 12‧‧‧Metal reflective layer
13‧‧‧第二電極(ITO電極) 13‧‧‧Second electrode (ITO electrode)
14‧‧‧輔助電極(ITO電極) 14‧‧‧Auxiliary electrode (ITO electrode)
15‧‧‧像素分割層 15‧‧‧Pixel segmentation layer
16‧‧‧發光像素(有機EL層) 16‧‧‧Light-emitting pixels (organic EL layer)
17‧‧‧第一電極 17‧‧‧First electrode
18‧‧‧無鹼玻璃基板 18‧‧‧Alkali-free glass substrate
19‧‧‧平坦化層 19‧‧‧planarization layer
20‧‧‧第二電極(ITO電極) 20‧‧‧Second electrode (ITO electrode)
21‧‧‧輔助電極(ITO電極) 21‧‧‧Auxiliary electrode (ITO electrode)
22‧‧‧像素分割層 22‧‧‧Pixel segmentation layer
23‧‧‧發光像素(有機EL層) 23‧‧‧Light-emitting pixels (organic EL layer)
24‧‧‧第一電極 24‧‧‧First electrode
圖1係顯示本發明之實施態樣的有機EL顯示裝置之TFT基板的剖面圖。 FIG. 1 is a cross-sectional view showing a TFT substrate of an organic EL display device according to an embodiment of the present invention.
圖2係顯示實施例中具備像素分割層的有機EL顯示裝置的製作方法的概略圖。 FIG. 2 is a schematic diagram showing a method of manufacturing an organic EL display device provided with a pixel dividing layer in an example.
圖3係顯示實施例中具備像素分割層及平坦化層的有機EL顯示裝置的製作方法的概略圖。 FIG. 3 is a schematic diagram showing a method of manufacturing an organic EL display device provided with a pixel dividing layer and a planarization layer in an embodiment.
以下詳細說明本發明。另外,本說明書中使用「~」表示之數值範圍,係指包含「~」前後記載的數值作為下限值及上限值的範圍。本說明書中,像素分割層係指有機EL顯示裝置用的像素分割層,平坦化層係指有機EL顯示裝置用的平坦化層。有機EL顯示裝置係指無法彎曲的剛性型有機EL顯示裝置與可彎曲的可撓型有機EL顯示裝置兩者。 The present invention will be described in detail below. In addition, the numerical range represented by "~" in this specification means the range which includes the numerical value described before and after "~" as a lower limit and an upper limit. In this specification, a pixel dividing layer refers to a pixel dividing layer for an organic EL display device, and a planarizing layer refers to a planarizing layer for an organic EL display device. The organic EL display device refers to both a rigid type organic EL display device that cannot be bent and a flexible type organic EL display device that can be bent.
又,遮光性係表示遮蔽可見光區域之波長380~780nm的光的程度,遮光性越高則表示光的穿透率越低。用以稱呼著色材的「C.I.」為Colour Index Generic Name的簡寫,其係根據The Society of Dyers and Colourists發行的顏色索引,關於已登錄在顏色索引之中的著色材,Colour Index Generic Name是表示顏料或染料的化學結構或結晶型態。有機色素衍生物,雖包括以有機顏料粉末作為原料而進行衍生化處理所得之顏料衍 生物,但在合成流程上,不一定要是經過有機顏料粉末之形態所得之化合物。 In addition, the light-shielding property refers to the degree of shielding light with a wavelength of 380 to 780 nm in the visible light region, and the higher the light-shielding property, the lower the light transmittance. "C.I." used to refer to coloring materials is an abbreviation of Color Index Generic Name, which is based on the color index issued by The Society of Dyers and Colourists. Regarding the coloring materials registered in the color index, Color Index Generic Name means pigments Or the chemical structure or crystalline form of the dye. Organic pigment derivatives include pigment derivatives obtained by derivatization treatment using organic pigment powders as raw materials, but in the synthesis process, they do not necessarily have to be compounds obtained in the form of organic pigment powders.
本說明書中,鹼顯影液這樣的記載,若無特別說明則係指有機系鹼水溶液。重量平均分子量(Mw)係以四氫呋喃作為載體的凝膠滲透層析法進行分析,並使用根據標準聚苯乙烯之檢量線所換算的值。 In this specification, the description of an alkali developing solution means an organic alkali aqueous solution unless otherwise specified. The weight average molecular weight (Mw) was analyzed by gel permeation chromatography using tetrahydrofuran as a carrier, and a value converted from a standard polystyrene calibration curve was used.
本發明是一種有機EL顯示裝置,其係具備第一電極、像素分割層、發光像素、第二電極、平坦化層及基材的有機EL顯示裝置,其中,該像素分割層及/或該平坦化層包含(a)具有含氮雜環結構的黑色材、(b)分散劑及(c)樹脂;該(b)分散劑含有以下述通式(1)表示之化合物及/或以下述通式(2)表示之化合物。藉由成為上述構成,發現可抑制黑點產生並且兼具優良的發光可靠度,進而完成本發明。此處所指的黑點係指有機EL顯示裝置驅動時在像素內排列不均勻之粒狀的局部非發光部位。源自顯影殘渣的黑點之長徑,係與顯影殘渣的長徑相同或因粗大化而大於顯影殘渣的長徑而會阻礙發光,因此黑點越明顯則導致輝度越低,進而導致作為顯示裝置的價值下降。此處所指的發光可靠度,係指連續使有機EL顯示裝置持續點燈時,以點燈初期作為基準,不容易發生發光元件中的發光面積隨著點燈時間的經過而縮小的現象(像素收縮)之程度,發光可靠度越高則作為顯示裝置的價值越高。 The present invention is an organic EL display device, which is an organic EL display device provided with a first electrode, a pixel dividing layer, a light-emitting pixel, a second electrode, a planarization layer, and a substrate, wherein the pixel dividing layer and/or the planar The chemical layer comprises (a) a black material having a nitrogen-containing heterocyclic structure, (b) a dispersant and (c) a resin; the (b) dispersant contains a compound represented by the following general formula (1) and/or is represented by the following general formula A compound represented by formula (2). By adopting the above configuration, it was found that generation of black spots can be suppressed and excellent light emission reliability can be obtained, and the present invention has been completed. The black spots referred to here refer to the granular local non-luminous parts arranged unevenly in the pixel when the organic EL display device is driven. The long diameter of the black spots originating from the developing residue is the same as the long diameter of the developing residue or larger than the long diameter of the developing residue due to coarsening, which hinders light emission. Therefore, the more obvious the black spots, the lower the luminance, which in turn leads to display The value of the device decreases. The luminescence reliability referred to here means that when the organic EL display device is continuously turned on, the light-emitting area of the light-emitting element is not likely to shrink with the lapse of the lighting time (pixel Shrinkage), the higher the luminous reliability, the higher the value as a display device.
上述通式(1)中,X1為與苝環直接鍵結的取代基,其表示-SO3H、-SO3M、-SO2NHR1或是-CONHR1。M表示Na、K或是NH4。R1表示末端具有N,N-二烷胺基的有機基。Z1表示與苝環直接鍵結的原子或是取代基,其表示氫原子、烷基或是烷氧基。n及m為整數,n表示1或2,並且滿足n+m=10。 In the above general formula (1), X 1 is a substituent directly bonded to the perylene ring, which represents -SO 3 H, -SO 3 M, -SO 2 NHR 1 or -CONHR 1 . M represents Na, K or NH 4 . R 1 represents an organic group having an N,N-dialkylamino group at the terminal. Z 1 represents an atom directly bonded to the perylene ring or a substituent, which represents a hydrogen atom, an alkyl group or an alkoxy group. n and m are integers, n represents 1 or 2, and satisfies n+m=10.
上述通式(2)中,R2及R3彼此相同,其表示氫原子、具有取代基的芳基或甲基,X2為與苝環及/或苯 環直接鍵結的取代基,其表示-SO3H、-SO3M、-SO2NHR4或是-CONHR4。M表示Na、K或是NH4。R4表示末端具有N,N-二烷胺基的有機基。Z2表示與苝環直接鍵結的原子或是取代基,其表示氫原子、烷基或是烷氧基。p及q為整數,p表示1或2,q表示6~8。 In the above-mentioned general formula ( 2 ), R2 and R3 are identical to each other, which represent a hydrogen atom, an aryl group or a methyl group with a substituent, and X2 is a substituent directly bonded to the perylene ring and/or benzene ring, which Represents -SO 3 H, -SO 3 M, -SO 2 NHR 4 or -CONHR 4 . M represents Na, K or NH 4 . R 4 represents an organic group having a N,N-dialkylamino group at the end. Z 2 represents an atom directly bonded to the perylene ring or a substituent, which represents a hydrogen atom, an alkyl group or an alkoxy group. p and q are integers, p means 1 or 2, and q means 6~8.
本發明之有機EL顯示裝置具備第一電極、像素分割層、發光像素、第二電極、平坦化層及基材。圖1顯示舉出作為本發明實施態樣之具體例的有機EL顯示裝置中的TFT基板的剖面圖。 The organic EL display device of the present invention comprises a first electrode, a pixel dividing layer, a light emitting pixel, a second electrode, a planarization layer and a base material. FIG. 1 shows a cross-sectional view of a TFT substrate in an organic EL display device as a specific example of an embodiment of the present invention.
基材6的表面上,行列狀地設有下閘極型或上閘極型的TFT1(薄膜電晶體),而TFT絕緣層3則以覆蓋TFT1及連接於TFT1之配線2的狀態形成。再者,TFT絕緣層3的表面上形成有平坦化層4,平坦化層4上設置有使配線2開口的接觸孔7。第二電極5係在平坦化層4的表面上形成圖案,其與配線2連接。以圍住第二電極5之圖案周緣的方式形成有像素分割層8。像素分割層8上設有開口部,開口部中形成有包含有機EL發光材料的發光像素9,而第一電極10則是以覆蓋像素分割層8與發光像素9的狀態成膜。在真空下將包含以上積層構成的TFT基板密封後,若直接對發光像素部施加電壓,則可使其發光而作為有機EL顯示裝置。 On the surface of the
發光像素9係由在光的3原色、即紅、藍、綠區域中分別具有發光峰值波長的不同種類之像素所排列而成,或是亦可在整個面上製作發出白色發射光的發光像素,再組合紅、藍、綠的彩色濾波器以作為另外的 積層構件。通常顯示的紅色區域的峰值波長為560~700nm,藍色區域的峰值波長為420~500nm,綠區域的峰值波長為500~550nm,但本發明之有機EL顯示裝置中,發光像素的種類並無特別限定,發射光可具有任何峰值波長。作為構成發光像素的有機EL發光材料,除了發光層以外,更佳係使用將電洞輸送層及/或電子輸送層組合的材料。 The light-emitting
作為將發光像素形成圖案的方法,可舉出遮罩蒸鍍法。遮罩蒸鍍法係使用蒸鍍遮罩將有機化合物予以蒸鍍而使其圖案化的方法,具體可舉出將以預期圖案作為開口部的蒸鍍遮罩配置於基板側而進行蒸鍍的方法。為了得到高精度的蒸鍍圖案,使高平坦性的蒸鍍遮罩與基板密合係為重要,一般可使用對蒸鍍遮罩施加張力的技術、或藉由配置於基板背面的磁石使蒸鍍遮罩與基板密合的技術等。作為蒸鍍遮罩的製造方法,雖可舉出蝕刻法或機械研磨、噴砂法、燒結法、雷射加工法、感光性樹脂的利用等,但在形成更微細之圖案的情況中,從使加工精度優良之觀點而言,較佳係使用蝕刻法或電鑄法。 As a method for patterning light-emitting pixels, a mask vapor deposition method is mentioned. The mask deposition method is a method in which an organic compound is vapor-deposited and patterned using a vapor-deposition mask. Specifically, a vapor-deposition mask having a desired pattern as an opening is placed on the substrate side and vapor-deposited. method. In order to obtain a high-precision vapor deposition pattern, it is important to make a high-planar vapor deposition mask and the substrate closely bonded. Generally, the technology of applying tension to the vapor deposition mask can be used, or the vapor deposition can be made by a magnet arranged on the back of the substrate. The technique of bonding the plating mask to the substrate, etc. As the method of manufacturing the vapor deposition mask, etching method or mechanical polishing, sand blasting method, sintering method, laser processing method, utilization of photosensitive resin, etc. can be mentioned, but in the case of forming a finer pattern, from using From the viewpoint of excellent machining accuracy, it is preferable to use an etching method or an electroforming method.
作為第二電極5,可使用例如氧化鋅、氧化錫、氧化銦、氧化銦錫(ITO)、氧化銦鋅(IZO)等的導電性金屬氧化物,其中從透明性與導電性優良之觀點而言,較佳可使用ITO。作為將ITO形成圖案的方法,可舉出以下方法:首先以濺鍍法使ITO全面成膜之後,藉由微影法使蝕刻用正型光阻材料形成圖案,而在ITO膜 上得到光阻圖案。接著,以液溫20~60℃的蝕刻液僅去除該光阻圖案非形成部的ITO膜,接著以液溫20~60℃的光阻剝離液去除光阻圖案,再因應需求進行熱處理以成為預期的結晶度。此處所指的ITO包括所謂的非晶質ITO。作為用於蝕刻的正型光阻材料,可使用含有鹼可溶性酚醛清漆系樹脂的正型感光性組成物。作為蝕刻液,可使用包含硝酸與鹽酸的水溶液或乙二酸水溶液,作為市售品,可舉出例如ITO-101N(關東化學(股)製)、「S-CLEAN」(註冊商標)IS-2、同系列的IS-3(以上皆為佐佐木化學藥品(股)製)。作為光阻剝離液,可使用有機胺系水溶液,作為市售品,可舉出例如「ANRASUTO」(註冊商標)M6、同系列的M6B、同系列的TN-1-5、同系列的M71-2(以上皆為三若純藥研究所)。 As the
作為第一電極10,較佳可使用例如銀合金膜,但只要具有作為電極之功能的層,則可包含任何的物質。作為第一電極10的具體例,在本發明之有機EL顯示裝置為後述底部發光型有機EL顯示裝置的情況下,從光反射性優良之觀點而言,較佳可使用包含鋁的層。在頂部發光型有機EL顯示裝置的情況下,從光穿透性優良之觀點而言,較佳可使用包含具有銀/鎂之銀合金的層。第一電極,可由濺鍍法進行全面成膜而得。 As the
本發明之有機EL顯示裝置的光萃取方向,可為隔著基材6將發光像素所放出之發射光萃取至基材側的底部發光型有機EL顯示裝置,亦可為隔著第一電極將發射光萃取至基材6之相反側的頂部發光型有機EL 顯示裝置,並未特別限定。頂部發光型有機EL顯示裝置的情況中,為了提高往1方向的光萃取效率,亦可在平坦化層4與第二電極5之間進一步設置圖案狀的金屬反射層等。作為金屬反射層,可舉出例如,包含具有銅、鎵、鎂等不同金屬元素之銀合金的導電膜。 The light extraction direction of the organic EL display device of the present invention can be a bottom emission type organic EL display device in which the emission light emitted by the light-emitting pixels is extracted to the substrate side through the
若使用以玻璃等為代表的硬質板狀基材作為基材6,則可作成無法彎曲的剛性有機EL顯示裝置。作為玻璃,較佳可使用鹼金屬元素的含量小於0.5%、以矽為主成分的無鹼玻璃。其中,熱膨脹係數小、在250℃以上的高溫製程中的尺寸穩定性優良者較佳,可舉出例如,OA-10G、OA-11(以上皆為日本電氣硝子(股)製)、AN-100(旭硝子(股)製),從物理性的耐久性之觀點而言其厚度通常為0.1~0.5mm。 When a hard plate-like substrate represented by glass or the like is used as the
另一方面,若使用可撓性基材作為基材6,則能夠作成可彎曲的可撓型有機EL顯示裝置。作為可撓基材,較佳係使用包含彎曲性高且機械強度優良之聚醯亞胺樹脂的基材,作為製作該基材的方法,可舉出將包含聚醯胺酸之溶液塗布於暫時支持體的表面,接著藉由加熱使聚醯胺酸進行醯亞胺化而轉變為聚醯亞胺樹脂後,以雷射等將暫時支持體剝離的方法。聚醯胺酸,可使四羧酸二酐與二胺化合物在N-甲基-2-吡咯啶酮等的醯胺系溶劑中反應而合成,其中,從熱線膨脹係數小而尺寸穩定性優良之觀點而言,較佳為具有芳香族四羧酸二酐之殘基與芳香族二胺化合物之殘基的聚醯胺酸。作為具體例,可舉出具有3,3’,4,4’-聯苯四羧酸二酐之殘基 與對苯二胺之殘基的聚醯胺酸。其厚度通常為10~40μm,相較於使用上述無鹼玻璃的情況,可使基材6變薄。 On the other hand, if a flexible base material is used as the
本發明的有機EL顯示裝置所具備的像素分割層及/或平坦化層,係含有(a)具有含氮雜環結構的黑色材。此處所指的具有含氮雜環結構的黑色材,係指含有下述(a-1)與(a-2)的顏料混合物或是指(a-3)具有含氮雜環結構的有機黑色顏料;該(a-1)係選自有機黃色顏料、有機紅色顏料及有機橙色顏料中至少一色的具有含氮雜環結構的有機顏料,該(a-2)係選自有機藍色顏料及有機紫色顏料中至少一色的具有含氮雜環結構的有機顏料。藉由含有(a)具有含氮雜環結構的黑色材,可使像素分割層及/或平坦化層黑色化而賦予其遮光性。 The pixel division layer and/or the planarization layer included in the organic EL display device of the present invention contains (a) a black material having a nitrogen-containing heterocyclic structure. The black material with nitrogen-containing heterocyclic structure referred to here refers to the pigment mixture containing the following (a-1) and (a-2) or refers to (a-3) organic black with nitrogen-containing heterocyclic structure Pigment; the (a-1) is selected from organic yellow pigments, organic red pigments and organic orange pigments with at least one organic pigment with a nitrogen-containing heterocyclic structure, and the (a-2) is selected from organic blue pigments and An organic pigment with nitrogen-containing heterocyclic ring structure of at least one color among organic purple pigments. By containing (a) a black material having a nitrogen-containing heterocyclic structure, the pixel dividing layer and/or the planarization layer can be blackened to impart light-shielding properties.
藉由在用以使本發明的有機EL顯示裝置所具備之像素分割層及/或平坦化層形成圖案的感光性組成物中含有屬於(a)具有含氮雜環結構的黑色材的成分,而能夠使該成分填充於最後所得之像素分割層及/或平坦化層的膜中。 By including a component belonging to (a) a black material having a nitrogen-containing heterocyclic structure in the photosensitive composition for patterning the pixel division layer and/or planarization layer included in the organic EL display device of the present invention, This component can be filled in the film of the finally obtained pixel dividing layer and/or planarization layer.
本發明的有機EL顯示裝置具備的像素分割層及/或平坦化層所含有的(a)具有含氮雜環結構的黑色材,為了提升發光可靠度,較佳係兼具對於有機鹼水溶液之高耐鹼性與對於加熱之高耐熱性的有機顏料。此處所指的耐鹼性,具體係指在大氣壓下、25℃的條件下對於2.38重量%的四甲基氫氧化銨水溶液的耐性,該2.38重量%的四甲基氫氧化銨水溶液在後述顯影步驟中使像 素分割層及平坦化層形成圖案時通常用作顯影液。有機顏料隔著黏結劑與顯影液接觸時,越能夠抑制顏料之溶解物及/或分解物的產生則越佳。此處所指的耐熱性,係指後述硬化步驟中使像素分割層及平坦化層熱硬化時,可抑制在大氣壓下/氮環境下/250℃下的加熱所產生之熱分解物及/或昇華物的程度。有機EL顯示裝置的像素分割層及平坦化層所要求的作為永久膜的耐熱溫度為250℃以上,在高溫條件下來自像素分割層及平坦化層的排出氣體產生量越少,則越可提高發光可靠度。 The (a) black material having a nitrogen-containing heterocyclic structure contained in the pixel division layer and/or planarization layer of the organic EL display device of the present invention is preferably compatible with an aqueous organic alkali solution in order to improve the reliability of light emission. An organic pigment with high alkali resistance and high heat resistance to heating. The alkali resistance referred to here specifically refers to the resistance to 2.38% by weight of tetramethylammonium hydroxide aqueous solution under the condition of atmospheric pressure and 25°C. The 2.38% by weight of tetramethylammonium hydroxide aqueous solution is developed later In the step of patterning the pixel dividing layer and the planarization layer, it is usually used as a developer. When the organic pigment is in contact with the developing solution through the binder, the more it can suppress the generation of dissolved and/or decomposed products of the pigment, the better. The heat resistance referred to here refers to the ability to suppress pyrolysis and/or sublimation generated by heating under atmospheric pressure/nitrogen atmosphere/250°C when the pixel division layer and planarization layer are thermally cured in the curing step described later. degree of things. The heat-resistant temperature of the permanent film required for the pixel division layer and the planarization layer of the organic EL display device is 250°C or higher. Luminous reliability.
作為(a)具有含氮雜環結構的黑色材所含有的有機顏料其分子內所具有的含氮雜環結構的具體例,除了可提升有機顏料本身的耐熱性及耐鹼性以外,從以上述通式(1)表示之化合物及/或以上述通式(2)表示之化合物的相互作用強而可得到更高的顯影殘渣抑制效果之觀點而言,特佳可舉出醯亞胺環、苯并咪唑酮環、苯并咪唑環。較佳係使其包含具有該等之中任1種含氮雜環結構的有機顏料。 As (a) a specific example of the nitrogen-containing heterocyclic structure in the molecule of the organic pigment contained in the black material having a nitrogen-containing heterocyclic structure, in addition to improving the heat resistance and alkali resistance of the organic pigment itself, from the following From the viewpoint that the compound represented by the above-mentioned general formula (1) and/or the compound represented by the above-mentioned general formula (2) have a strong interaction and can obtain a higher development residue suppression effect, particularly preferably, an imide ring , benzimidazolone ring, benzimidazole ring. It is preferable to make it contain the organic pigment which has any one of these nitrogen-containing heterocyclic structures.
為了提高像素分割層及/或平坦化層在可見光區域全域中的遮光性,較佳係含有(a-1)有機黃色顏料與有機紅色顏料、(a-2)有機藍色顏料之3色的組合,或是含有(a-1)有機黃色顏料、(a-2)有機藍色顏料與有機紫色顏料之3色的組合。含有(a-1)有機黃色顏料與有機紅色顏料、(a-2)有機藍色顏料之3色的組合的情況下,感光性組成物中的所有顏料成分中,3色的有機顏料的含量較佳係分別為20重量%以上。為了充分遮蔽波長 550~780nm的區域的光而提高後述光學濃度,有機藍色顏料的含量在所有顏料中更佳為30.0重量%以上,從後述曝光步驟中的曝光感度之觀點而言,更佳為50.0重量%以下。 In order to improve the light-shielding properties of the pixel division layer and/or planarization layer in the entire visible light region, it is preferable to contain three colors of (a-1) organic yellow pigment, organic red pigment, and (a-2) organic blue pigment. A combination or a combination of three colors including (a-1) an organic yellow pigment, (a-2) an organic blue pigment, and an organic violet pigment. In the case of a combination of (a-1) an organic yellow pigment, an organic red pigment, and (a-2) an organic blue pigment, the content of the organic pigments of the three colors in all pigment components in the photosensitive composition Preferably they are 20% by weight or more. In order to sufficiently shield light in the wavelength range of 550 to 780 nm and increase the optical density described later, the content of the organic blue pigment is more preferably 30.0% by weight or more in all pigments, and it is more preferable from the viewpoint of exposure sensitivity in the exposure step described later. 50.0% by weight or less.
另一方面,在含有(a-1)有機黃色顏料、(a-2)有機藍色顏料與有機紫色顏料之3色的組合的情況下,感光性組成物中的所有顏料成分中,3色的有機顏料的含量較佳係分別為20.0重量%以上。為了充分遮蔽波長450~650nm的區域的光而提高後述光學濃度,有機紫色顏料的含量在所有顏料中更佳為30.0重量%以上,更佳為50.0重量%以下。 On the other hand, in the case of a combination of three colors including (a-1) an organic yellow pigment, (a-2) an organic blue pigment, and an organic violet pigment, among all the pigment components in the photosensitive composition, the three colors The content of the organic pigments is preferably 20.0% by weight or more. In order to sufficiently shield light in a wavelength range of 450 to 650 nm and increase the optical density described later, the content of the organic violet pigment is more preferably 30.0% by weight or more, more preferably 50.0% by weight or less, in all the pigments.
作為具有含氮雜環結構的有機黃色顏料,可舉出例如,C.I.顏料黃120、138、139、151、175、180、185、181、192、194,單獨包含該等顏料或是包含多種該等顏料皆無妨。其中,從耐鹼性與耐熱性優良之觀點而言,較佳為具有苯并咪唑酮環結構且不含鹵素原子的有機黃色顏料,較佳為C.I.顏料黃120、151、175、180、181、192、194。再佳為C.I.顏料黃194及/或以下述結構式(3)表示之C.I.顏料黃192。 Examples of organic yellow pigments having a nitrogen-containing heterocyclic structure include C.I. Pigment Yellow 120, 138, 139, 151, 175, 180, 185, 181, 192, and 194, including these pigments alone or in combination. It doesn't matter if you wait for the paint. Among them, from the standpoint of excellent alkali resistance and heat resistance, organic yellow pigments having a benzimidazolone ring structure and not containing halogen atoms are preferred, and C.I. Pigment Yellow 120, 151, 175, 180, and 181 are preferred. , 192, 194. More preferably, it is C.I. Pigment Yellow 194 and/or C.I. Pigment Yellow 192 represented by the following structural formula (3).
作為具有含氮雜環結構的有機橙色顏料,可舉出例如,C.I.顏料橙13、36、43、61、64、71、72,單獨包含該等顏料或是包含多種該等顏料皆無妨。其中,從耐鹼性與耐熱性優良之觀點而言,較佳為具有紫環酮(perinone)結構的有機橙色顏料,更佳為以下述結構式(4)表示之C.I.顏料橙43。作為反式異構物的C.I.顏料橙43,從發光可靠度之觀點而言,較理想係使用高純度地進行異構物分離而得者,作為合成時之副產物的順式異構物(C.I.顏料紅194)的殘量,相對於C.I.顏料橙43,較佳為5.0重量%以下。 Examples of organic orange pigments having a nitrogen-containing heterocyclic structure include C.I.
作為具有含氮雜環結構的有機紅色顏料,可舉出C.I.顏料紅122、123、149、179、180、189、190、202、209、254、255、264,單獨包含該等顏料或是包含多種該等顏料皆無妨。其中,較佳為耐鹼性及耐熱性高、結構中不含對發光可靠度具有不良影響的鹵素原子、且具有苝環結構與醯亞胺環結構者。較佳為以下述結構式(5)表示之C.I.顏料紅123、以下述結構式(6)表示之C.I.顏料紅149、以下述結構式(7)表示之C.I.顏料紅179、以下述結構式(8)表示之C.I.顏料紅190。 Examples of organic red pigments having a nitrogen-containing heterocyclic structure include C.I. Pigment Red 122, 123, 149, 179, 180, 189, 190, 202, 209, 254, 255, and 264, including these pigments alone or including A plurality of such pigments is not harmful. Among them, those having high alkali resistance and heat resistance, containing no halogen atoms that adversely affect the reliability of light emission, and having a perylene ring structure and an imide ring structure are preferred. Preferred are C.I. Pigment Red 123 represented by the following structural formula (5), C.I. Pigment Red 149 represented by the following structural formula (6), C.I. Pigment Red 179 represented by the following structural formula (7), and C.I. Pigment Red 179 represented by the following structural formula ( 8) C.I. Pigment Red 190 represented.
作為具有含氮雜環結構的有機藍色顏料,可舉出例如,C.I.顏料藍15、15:1、15:2、15:3、15:6、16、60、64、75、79、80,可單獨含有該等顏料或是包含多種該等顏料。其中,較佳為耐鹼性及耐熱性高、結構中不含對發光可靠度具有不良影響的鹵素原子、且具有酞花青結構或是陰丹士林結構者。較佳為以下述結構式(9)表示的屬銅酞青之β型穩定結晶的C.I.顏料藍 15:3以及屬銅酞青之ε型穩定結晶的C.I.顏料藍15:6、以下述結構式(10)表示之具有陰丹士林結構的陰丹士林藍(indanthrone blue;indanthrene blue)的C.I.顏料藍60。 Examples of organic blue pigments having a nitrogen-containing heterocyclic structure include C.I.
另外,此處所指的C.I.顏料藍15:3、15:6等的銅酞青系有機藍色顏料皆為具有穩定型結晶結構的無取代酞花青系有機藍色顏料,其耐熱性及耐鹼性皆優於作為有機色素衍生物之一的專利文獻4中記載的具有磺酸基之銅酞青衍生物。其中,從發光可靠度之觀點而言,較佳係使用作為雜質之游離銅在500ppm以下者,更佳為100ppm以下。 In addition, the copper phthalocyanine organic blue pigments such as C.I. Pigment Blue 15:3, 15:6, etc. referred to here are all unsubstituted phthalocyanine organic blue pigments with stable crystal structure. Alkalinity is superior to copper phthalocyanine derivatives having a sulfonic acid group described in
作為具有含氮雜環結構的有機紫色顏料,可舉出例如,C.I.顏料紫19、23、29、32、37,單獨包含該等顏料或是包含多種該等顏料皆無妨。其中,較佳為耐鹼性及耐熱性高、結構中不含對發光可靠度具有不良影響的鹵素原子且具有苝環結構及/或二結構者。較佳為C.I.顏料紫29、37,從分散性之觀點而言,更佳為以下述結構式(11)表示之C.I.顏料紫29。 Examples of organic violet pigments having a nitrogen-containing heterocyclic structure include
(a)具有含氮雜環結構的黑色材包含具有(a-1)有機黃色顏料與有機紅色顏料、(a-2)有機藍色顏料之3色的組合的情況下,有機黃色顏料最佳係含有苯并咪唑酮系有機黃色顏料,有機藍色顏料最佳係含有酞花青系有機藍色顏料及/或陰丹士林系有機藍色顏料,有機紅色顏料最佳係含有苝系有機紅色顏料。藉由後述中使其吸附以上述通式(1)表示之化合物及/或以通式(2)表示之化合物,可較佳地使該等化學結構不同的多種顏料穩定分散。 (a) When the black material having a nitrogen-containing heterocyclic structure includes a combination of three colors (a-1) organic yellow pigment, organic red pigment, and (a-2) organic blue pigment, the organic yellow pigment is the best It contains benzimidazolone-based organic yellow pigments, organic blue pigments preferably contain phthalocyanine-based organic blue pigments and/or indanthrene-based organic blue pigments, and organic red pigments preferably contain perylene-based organic pigments. red paint. By adsorbing the compound represented by the above-mentioned general formula (1) and/or the compound represented by the general formula (2) as described later, it is preferable to stably disperse the various pigments having different chemical structures.
作為(a-3)具有含氮雜環結構的有機黑色顏料,可舉出例如,苝系有機黑色顏料、具有內醯胺環結構的苯并二呋喃酮系有機黑色顏料、甲亞胺偶氮(azomethine-azo)系有機黑色顏料。其中,從耐熱性與遮光性優良、且以上述通式(1)表示之化合物及/或以上述通式(2)表示之化合物的相互作用強而被吸附性高之觀點而言,較佳為分子內具有2個苯并咪唑環以作為含氮雜環的苝系有機黑色顏料。作為其具體例,可舉出以下述通式(12)表示之化合物與以下述通式(13)表示之化合物的混合物,藉由後述中使其吸附上述以通式(1)表示之化合物及/或以通式(2)表示之化合物,可較佳地使該等化學結構不同的多種顏料穩定分散。上述分子內具有2個苯并咪唑環的苝系有機黑色顏料,可藉由使鄰苯二胺或是其衍生物與苝四羧酸二酐反應,而得到作為順-反異構物混合物。 Examples of (a-3) organic black pigments having a nitrogen-containing heterocyclic structure include perylene-based organic black pigments, benzodifuranone-based organic black pigments having a lactamide ring structure, azomethine azo (Azomethine-azo) is an organic black pigment. Among them, the compound represented by the above-mentioned general formula (1) and/or the compound represented by the above-mentioned general formula (2) are preferable in terms of excellent heat resistance and light-shielding property due to their strong interaction and high adsorption properties. It is a perylene-based organic black pigment having two benzimidazole rings in the molecule as nitrogen-containing heterocycles. As its specific example, a mixture of a compound represented by the following general formula (12) and a compound represented by the following general formula (13) can be mentioned, and the compound represented by the above general formula (1) and /or the compound represented by the general formula (2) can preferably stably disperse the various pigments with different chemical structures. The above-mentioned perylene-based organic black pigment having two benzimidazole rings in the molecule can be obtained as a cis-trans isomer mixture by reacting o-phenylenediamine or its derivatives with perylenetetracarboxylic dianhydride.
通式(12)及(13)中,R7~R14各自獨立,表示氫原子、碳數1~12的烷基、碳數1~6的烷氧基或是羥基。 In the general formulas (12) and (13), R 7 to R 14 independently represent a hydrogen atom, an alkyl group having 1 to 12 carbons, an alkoxy group having 1 to 6 carbons, or a hydroxyl group.
本發明之有機EL顯示裝置所具備之像素分割層及平坦化層,為了微調光學特性,可含有屬於上述(a-1)、(a-2)或(a-3)成分的有機顏料以外的顏料,例如,除了C.I.顏料綠7、36、58、59、C.I.顏料褐25、26、28以外,可舉出氮化鈦、氮氧化鈦等。 The pixel dividing layer and planarization layer included in the organic EL display device of the present invention may contain other than the organic pigments belonging to the above-mentioned (a-1), (a-2) or (a-3) components in order to fine-tune the optical characteristics. Pigments include, for example, titanium nitride, titanium oxynitride, and the like in addition to C.I.
(a)具有含氮雜環結構的黑色材的含量,為了在可見光區域中得到充分的遮光性,在感光性組成物的所有固體成分中,較佳為5重量%以上,更佳為10重量%以上。又,為了確保感光性組成物的分散穩定性,而 得到對於曝光之充分的感度與顯影性,較佳為70重量%以下,更佳為50重量%以下。此處所指的所有固體成分,係指以感光性組成物中所含有之溶劑以外的所有成分之重量的和,除以感光性組成物的重量再乘以100所得到的值。 (a) The content of the black material having a nitrogen-containing heterocyclic structure is preferably at least 5% by weight, more preferably 10% by weight, of the total solid content of the photosensitive composition in order to obtain sufficient light-shielding properties in the visible light region. %above. Moreover, in order to ensure the dispersion stability of the photosensitive composition and obtain sufficient sensitivity and developability to exposure, it is preferably at most 70% by weight, more preferably at most 50% by weight. The total solid content referred to here refers to the value obtained by dividing the weight sum of all components except the solvent contained in the photosensitive composition by the weight of the photosensitive composition and multiplying by 100.
(a)具有含氮雜環結構的黑色材所含有之各種有機顏料各別的平均一次粒徑,從感光性組成物的分散穩定性、顯影步驟中的分散性之維持及發光可靠度之觀點而言,較佳為30nm以上,更佳為40nm以上。另一方面,從提升像素分割層及平坦化層之圖案的直線性之觀點而言,較佳為150nm以下,更佳為100nm以下。 (a) The average primary particle size of each of the various organic pigments contained in the black material having a nitrogen-containing heterocyclic structure, from the viewpoints of dispersion stability of the photosensitive composition, maintenance of dispersibility in the developing step, and luminescence reliability In terms of thickness, it is preferably at least 30 nm, more preferably at least 40 nm. On the other hand, it is preferably 150 nm or less, more preferably 100 nm or less, from the viewpoint of improving the linearity of the pattern of the pixel dividing layer and the planarization layer.
此處所指的平均一次粒徑,係指藉由使用影像解析式粒度分布測量裝置的粒度測量法算出的一次粒徑之數量平均值。影像的拍攝可使用穿透式電子顯微鏡(TEM),在倍率50000倍的條件下,從拍攝到100個以上之有機顏料的一次粒子的影像中,算出平均一次粒徑。有機顏料為非球狀的情況下,將其長徑與短徑的平均值作為一次粒徑。影像解析可使用MOUNTECH公司製影像解析式粒度分布軟體Mac-View。 The average primary particle size referred to here refers to the number average value of the primary particle size calculated by the particle size measurement method using an image analysis type particle size distribution measuring device. The image can be taken using a transmission electron microscope (TEM), and the average primary particle size can be calculated from the image of more than 100 primary particles of organic pigments captured at a magnification of 50,000 times. When the organic pigment is non-spherical, the average value of the major axis and the minor axis is defined as the primary particle diameter. For image analysis, Mac-View, an image analysis type particle size distribution software manufactured by MOUNTECH, can be used.
在進行後述濕式媒介分散處理前,必須預先使有機顏料的平均一次粒徑小徑化或將粗大部分解碎的情況下,藉由溶劑鹽磨法等的濕式粉碎處理,將平均一次粒徑調整至預期的範圍亦無妨。溶劑鹽磨法係指將有機顏料、水溶性無機鹽、水溶性有機溶劑的混合物在高黏度糊狀態下進行捏合及洗淨的方法。作為水溶性無機 鹽,只要是具有可作為磨碎材之功能的粒狀物即可,其中較佳係使用氯化鈉、氯化鉀或硫酸鉀。水溶性無機鹽的平均一次粒徑較佳為0.5~50μm左右。作為水溶性有機溶劑,可舉出二醇系溶劑、醚系溶劑或醇系溶劑等的有機溶劑。其中,較佳為二醇系溶劑,作為具體例,可舉出乙二醇、二乙二醇、二乙二醇單甲醚、二乙二醇單乙醚、三乙二醇、三乙二醇單甲醚、三乙二醇單乙醚、二丙二醇、二丙二醇單甲醚、二丙二醇單乙醚。捏合後,較佳係進行反覆水洗以去除水溶性無機鹽及水溶性溶劑。 When it is necessary to reduce the average primary particle size of the organic pigment or disintegrate the coarse part before carrying out the wet medium dispersion treatment described later, the average primary particle size is reduced by wet pulverization treatment such as solvent salt grinding method It doesn't hurt to adjust the diameter to the expected range. The solvent salt grinding method refers to the method of kneading and washing the mixture of organic pigments, water-soluble inorganic salts, and water-soluble organic solvents in a high-viscosity paste state. As the water-soluble inorganic salt, as long as it is a granular material that can be used as a grinding material, it is preferable to use sodium chloride, potassium chloride or potassium sulfate. The average primary particle size of the water-soluble inorganic salt is preferably about 0.5 to 50 μm. Examples of the water-soluble organic solvent include organic solvents such as glycol-based solvents, ether-based solvents, and alcohol-based solvents. Among them, glycol-based solvents are preferred, and specific examples include ethylene glycol, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, triethylene glycol, and triethylene glycol. Monomethyl ether, triethylene glycol monoethyl ether, dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether. After kneading, it is preferable to repeatedly wash with water to remove water-soluble inorganic salts and water-soluble solvents.
用以進行捏合的濕式粉碎機,可使用例如捏合機(井上製作所(股)製),一方面藉由機械動力調整有機顏料微細化進行之速度與因結晶成長而進行粗大化之速度的平衡,一方面為了成為預期的平均一次粒徑而適當設定捏合時的顏料濃度、磨碎材濃度、捏合速度、溫度及時間等的捏合條件即可。較佳係分別單獨對於(a)具有含氮雜環結構的黑色材所含有之各種有機顏料進行捏合處理。 The wet pulverizer used for kneading can use, for example, a kneader (manufactured by Inoue Manufacturing Co., Ltd.). On the one hand, the balance between the speed of micronization of organic pigments and the speed of coarsening due to crystal growth can be adjusted by mechanical power. On the one hand, kneading conditions such as pigment concentration, ground material concentration, kneading speed, temperature, and time during kneading may be appropriately set in order to obtain a desired average primary particle diameter. Preferably, each of the various organic pigments contained in the black material having a nitrogen-containing heterocyclic structure (a) is kneaded separately.
(a)具有含氮雜環結構的黑色材、上述以通式(1)表示之化合物及/或上述以通式(2)表示之化合物,藉由組合NMR、紅外吸收光譜、ICP質量分析、飛行時間質量分析計(TOF-MS)及以CuKα線所進行的粉末X光繞射,可鑑定其化學結構及其結晶型態。另外,可進一步組合液相層析來分析後述的上述以通式(1)表示之化合物及/或上述以通式(2)表示之化合物的取代基數n或p。 (a) The black material having a nitrogen-containing heterocyclic structure, the compound represented by the above-mentioned general formula (1) and/or the compound represented by the above-mentioned general formula (2), by combining NMR, infrared absorption spectrum, ICP mass analysis, Time-of-flight mass spectrometer (TOF-MS) and powder X-ray diffraction with CuKα line can identify its chemical structure and crystal form. In addition, the number of substituents n or p of the compound represented by the above-mentioned general formula (1) and/or the compound represented by the above-mentioned general formula (2) described later may be analyzed in combination with liquid chromatography.
本發明的有機EL顯示裝置所具備之像素分割層及/或平坦化層係含有(b)分散劑。作為屬於(b)分散劑的成分,可大致分為(b-1)非聚合物型分散劑與(b-2)聚合物型分散劑。 The pixel dividing layer and/or planarization layer included in the organic EL display device of the present invention contains (b) a dispersant. Components belonging to the (b) dispersant are roughly classified into (b-1) non-polymer dispersants and (b-2) polymer dispersants.
作為(b-1)非聚合物型分散劑,例如,除了有機顏料或染料等的在有機色素之分子內導入酸性官能基及/或鹼性官能基的有機色素衍生物以外,可舉出松香系分散劑。此處所指的酸性官能基包括處於鹽之形態的基團。 Examples of (b-1) non-polymer dispersants include organic pigment derivatives, such as organic pigments and dyes, in which acidic functional groups and/or basic functional groups are introduced into molecules of organic pigments, and rosin Department of dispersants. The acidic functional groups referred to herein include groups in the form of salts.
另一方面,作為(b-2)聚合物型分散劑,可舉出分子內具有酸性吸附基及/或鹼性吸附基的聚合物。 On the other hand, examples of the (b-2) polymer-type dispersant include polymers having an acidic adsorption group and/or a basic adsorption group in the molecule.
作為(b)分散劑的作用機構,除了酸-鹼相互作用、π-π電子相互作用以外,亦複合性地關係到氫鍵、凡德瓦(Van-der-Waals)力等,在製作後述顏料分散液時進行的濕式媒介分散處理中,藉由提高有機顏料表面對於分散媒的濕潤性,並且提升高分子鏈所造成之有機顏料彼此的立體排斥效果及/或靜電排斥效果,而能夠促進有機顏料之二次凝集體的解凝,且抑制再凝集,進而達到使其分散狀態穩定化的效果。 (b) The action mechanism of the dispersant is not only acid-base interaction and π-π electron interaction, but also complexly related to hydrogen bond, Van-der-Waals force, etc., which will be described later in the production. In the wet medium dispersion treatment of the pigment dispersion, by improving the wettability of the organic pigment surface to the dispersion medium, and improving the steric repulsion effect and/or electrostatic repulsion effect of the organic pigments caused by the polymer chain, it can be Accelerates the de-agglomeration of secondary aggregates of organic pigments, and inhibits re-aggregation, thereby achieving the effect of stabilizing its dispersed state.
藉由使屬於(b)分散劑的成分預先含有於用以使本發明的有機EL顯示裝置所具備之像素分割層及/或平坦化層形成圖案的感光性組成物中,可使其填充於最後所得之像素分割層及/或平坦化層的膜中。 The photosensitive composition for patterning the pixel dividing layer and/or planarizing layer included in the organic EL display device of the present invention can be filled with the component belonging to (b) dispersant in advance. In the film of the resulting pixel division layer and/or planarization layer.
本發明的有機EL顯示裝置所具備之像素分割層及/或平坦化層,含有以下述通式(1)表示之化合物及 /或以下述通式(2)表示之化合物(以下有時將以下述通式(1)表示之化合物及/或以下述通式(2)表示之化合物記載為「特定結構的苝系色素衍生物」)以作為(b-1)非聚合物型分散劑。 The pixel dividing layer and/or planarization layer of the organic EL display device of the present invention contains a compound represented by the following general formula (1) and/or a compound represented by the following general formula (2) (hereinafter sometimes referred to as The compound represented by the general formula (1) and/or the compound represented by the following general formula (2) are described as "perylene-based pigment derivatives with a specific structure") as (b-1) non-polymer dispersant.
上述通式(1)中,X1為與苝環直接鍵結的取代基,其表示-SO3H、-SO3M、-SO2NHR1或是-CONHR1。M表示Na、K或是NH4。R1表示末端具有N,N-二烷胺基的有機基。Z1表示與苝環直接鍵結的原子或是取代基,其表示氫原子、烷基或是烷氧基。n及m為整數,n表示1或2,並且滿足n+m=10。 In the above general formula (1), X 1 is a substituent directly bonded to the perylene ring, which represents -SO 3 H, -SO 3 M, -SO 2 NHR 1 or -CONHR 1 . M represents Na, K or NH 4 . R 1 represents an organic group having an N,N-dialkylamino group at the terminal. Z 1 represents an atom directly bonded to the perylene ring or a substituent, which represents a hydrogen atom, an alkyl group or an alkoxy group. n and m are integers, n represents 1 or 2, and satisfies n+m=10.
上述通式(2)中,R2及R3彼此相同,其表示氫原子、具有取代基的芳基或甲基,X2為與苝環及/或苯環直接鍵結的取代基,其表示-SO3H、-SO3M、-SO2NHR4或是-CONHR4。M表示Na、K或是NH4。R4表示末端具有N,N-二烷胺基的有機基。Z2表示與苝環直接鍵結的原子或是取代基,其表示氫原子、烷基或是烷氧基。p及q為整數,p表示1或2,q表示6~8。 In the above-mentioned general formula ( 2 ), R2 and R3 are identical to each other, which represent a hydrogen atom, an aryl group or a methyl group with a substituent, and X2 is a substituent directly bonded to the perylene ring and/or benzene ring, which Represents -SO 3 H, -SO 3 M, -SO 2 NHR 4 or -CONHR 4 . M represents Na, K or NH 4 . R 4 represents an organic group having a N,N-dialkylamino group at the end. Z 2 represents an atom directly bonded to the perylene ring or a substituent, which represents a hydrogen atom, an alkyl group or an alkoxy group. p and q are integers, p means 1 or 2, and q means 6~8.
依序說明上述特定結構的苝系色素衍生物的特徵。 The characteristics of the above-mentioned perylene-based dye derivatives with specific structures will be described in order.
本案發明人等經研討的結果發現,具有「特定的酸性官能基或是鹼性官能基在1分子中以特定的取代基數直接鍵結於構成苝環的碳原子及/或構成芳基所具有之苯環的碳原子的結構」之苝系色素衍生物,係呈現以下的3個特徵;並且發現將該苝系色素衍生物使用於有機EL顯示裝置的像素分割層及/或平坦化層,對於解決課題可發揮格外顯著的效果。 As a result of research by the inventors of the present case, it has been found that "a specific acidic functional group or a basic functional group is directly bonded to the carbon atom constituting the perylene ring and/or constituting the aryl group with a specific number of substituents in one molecule." The structure of the carbon atom of the benzene ring" perylene-based pigment derivatives exhibits the following three characteristics; and it is found that the perylene-based pigment derivatives are used in the pixel division layer and/or planarization layer of an organic EL display device, It is particularly effective in solving problems.
第一,上述特定結構的苝系色素衍生物,藉由與(a)具有含氮雜環結構的黑色材相互作用而吸附,具有提高顏料表面的極性、促進在後述濕式媒介分散處理中的微細化,且提升微細化後的分散穩定性的功能。結果,即使長期保存感光性組成物,也可以發揮抑制顏料凝集物的發生及顏色分離的效果。 First, the perylene-based pigment derivatives with the above-mentioned specific structure are adsorbed by interacting with (a) a black material having a nitrogen-containing heterocyclic structure, which has the ability to increase the polarity of the pigment surface and promote the dispersion process in wet media described later. Micronization, and the function of improving dispersion stability after miniaturization. As a result, even if the photosensitive composition is stored for a long period of time, the effect of suppressing the occurrence of pigment aggregates and color separation can be exhibited.
第二,上述特定結構的苝系色素衍生物,因為具有高耐鹼性,即使在後述顯影步驟中與高濃度的有機鹼水溶液接觸,也不會引起苝系色素衍生物本身的分子結構破壞,而不會喪失在顯影步驟中作為分散劑的功能,可維持良好的分散狀態。結果可發揮抑制因顏料凝集物導致ITO電極上產生顯影殘渣的效果。 Second, because the perylene-based pigment derivatives of the above-mentioned specific structure have high alkali resistance, even if they are in contact with a high-concentration organic alkali aqueous solution in the developing step described later, the molecular structure of the perylene-based pigment derivatives will not be destroyed. A good dispersion state can be maintained without losing the function as a dispersant in the developing step. As a result, the effect of suppressing the development residue on the ITO electrode due to pigment aggregates can be exerted.
此處所指的長期保存感光性組成物,係指在大氣壓下/遮光下/25℃±1℃的恆溫下、以密閉狀態靜置感光性組成物30天。 The long-term preservation of the photosensitive composition referred to here refers to leaving the photosensitive composition in an airtight state for 30 days under atmospheric pressure/under light shielding/at a constant temperature of 25°C±1°C.
第三,上述特定結構的苝系色素衍生物,具有剛性的苝環作為母骨架,且其結構中不含重金屬或鹵素原子而呈現高耐熱性,因此可抑制在250℃以上的嚴苛環境中熱分解,且可避免重金屬遷移所造成的電極腐蝕。 Third, the perylene pigment derivatives with the above specific structure have a rigid perylene ring as the mother skeleton, and their structure does not contain heavy metals or halogen atoms, so they exhibit high heat resistance, so they can be suppressed in harsh environments above 250°C. Thermal decomposition, and can avoid electrode corrosion caused by migration of heavy metals.
又,酸性官能基或鹼性官能基這樣的高極性官能基直接鍵結於構成苝環的碳或構成具有取代基之芳基所具有之苯環的碳上,藉此可抑制高極性基的脫離。又,因為每1分子的取代基數為1或2,因此可抑制有機色素衍生物本身的昇華。作為此處所指的脫離的具體例,可舉出例如脫磺化,其係藉由後述衍生化處理而導 入分子結構中的磺酸基因為高溫處理而從源自有機顏料的母骨架殘基離開。 In addition, a highly polar functional group such as an acidic functional group or a basic functional group is directly bonded to a carbon constituting a perylene ring or a carbon constituting a benzene ring of an aryl group having a substituent, thereby suppressing the formation of a highly polar group. break away. Also, since the number of substituents per molecule is 1 or 2, sublimation of the organic dye derivative itself can be suppressed. As a specific example of the desulphurization referred to here, for example, desulfonation can be mentioned, which means that the sulfonic acid gene introduced into the molecular structure by the derivatization treatment described later is detached from the parent skeleton residue derived from the organic pigment by high temperature treatment. .
因為具有這樣優良的特徵,可在後述硬化步驟中抑制特定結構的苝系色素衍生物本身的昇華及熱分解物的產生,結果一方面可得到抑制上述顯影殘渣的效果,一方面兼具高發光可靠度。 With such excellent characteristics, it is possible to suppress the sublimation of the perylene-based pigment derivative itself and the generation of thermal decomposition products of a specific structure in the hardening step described later. As a result, the above-mentioned development residue suppression effect can be obtained while high luminescence can be obtained. reliability.
上述特定結構的苝系色素衍生物所具有的官能基的較佳結構,在包含後述(b-2)聚合物型分散劑的情況中,較佳係由其結構中所具有之吸附基的酸或鹼性來決定。 The preferred structure of the functional group of the perylene-based pigment derivative with the above-mentioned specific structure, in the case of including the polymer-type dispersant (b-2) described later, is preferably the acid of the adsorption group contained in the structure. or alkaline to decide.
含有具有鹼性吸附基之聚合物型分散劑的情況,上述特定結構的苝系色素衍生物的結構,從抑制顯影殘渣的效果優良之觀點而言,在上述通式(1)及上述通式(2)中,X1及X2較佳為酸性官能基或是其鹽,亦即較佳為-SO3H或是-SO3M、更佳為-SO3H。為-SO3M的情況中,為了提升發光可靠度,M較佳為NH4。單獨含有該等的化合物或含有多種該等的化合物皆無妨。另外,本說明書中的-SO3H或是-SO3M之記載,亦包含在感光性組成物中,磺酸基中的氫原子、鈉離子、鉀離子或是銨離子脫離,X1及X2處於以-SO3 -表示之陰離子的狀態的情況,以及與後述(b-2)聚合物型分散劑形成離子鍵等而處於-SO3 -與其他構成成分鍵結之狀態的情況。上述通式(1)中,X1表示可直接鍵結於構成苝環之1、2、5、6、7、8、9、10、11、12號位的碳之中任一個碳。又,上述通式(2)中,X2表示可直接鍵結於構成苝環之1、2、5、6、 7、8、11、12號位的碳及構成具有取代基之芳基的苯環的碳中任一個碳。其中,為了得到更高的發光可靠度,X2較佳係直接鍵結於構成苝環之1、2、5、6、7、8、11、12號位的任一個碳。另外,通式(1)及(2)中使用[ ]的各結構式之記載方法,根據本領域業者的技術常識,係表示可為有機色素衍生物每1分子中導入的各官能基數量相同、且各官能基所鍵結之碳的位置不同之多種化合物的混合物。例如,上述通式(1)中X1為-SO3H、n為1、Z1皆為氫原子、m為9的化合物的情況,表示可為苝-3,4-二羧基醯亞胺的單磺化物、即苝-3,4-二羧基醯亞胺-9-磺酸與苝-3,4-二羧基醯亞胺-8-磺酸的混合物。另外,以構成上述特定結構之苝系色素衍生物之化學結構的骨架的一部份、即以下述結構式(14)表示之未取代的苝-3,4-二羧基醯亞胺為例,顯示構成苝環之各個碳的位置編號。 In the case of containing a polymer-type dispersant having a basic adsorption group, the structure of the perylene-based pigment derivative with the above-mentioned specific structure is superior to the above-mentioned general formula (1) and the above-mentioned general formula from the viewpoint of excellent effect of suppressing development residue. In (2), X 1 and X 2 are preferably acidic functional groups or their salts, that is, they are preferably -SO 3 H or -SO 3 M, more preferably -SO 3 H. In the case of -SO 3 M, M is preferably NH 4 in order to improve the reliability of light emission. It does not matter whether these compounds are contained alone or in plural. In addition, the description of -SO 3 H or -SO 3 M in this specification also includes in the photosensitive composition, the hydrogen atom, sodium ion, potassium ion or ammonium ion in the sulfonic acid group is detached, and X 1 and When X 2 is in the state of an anion represented by -SO 3 - , and in a state where -SO 3 - is bonded to other constituents by forming an ionic bond with the (b-2) polymer type dispersant described later. In the above general formula (1), X 1 represents any one of carbons that can be directly bonded to the carbons at
上述通式(2)中,從提升發光可靠度之觀點而言,R2及R3較佳為具有取代基的芳基或甲基。此處所指 的具有取代基的芳基或甲基,係具有取代基的芳基、或是甲基,其表示其中的任一基團。此處所指的取代基,係指鍵結於構成芳基所具有之苯環的碳上的X2以外的取代基。又,此處所指的芳基係指至少具有苯環的芳基,並不包括具有含氮雜環結構的吡啶基等的雜芳基。另外,不包括4-甲氧基苯基甲基等的、與具有取代基之芳香環鍵結的脂肪族基。亦即例如,具有C.I.顏料黑32之分子結構以作為衍生化處理後之殘基的有機色素衍生物並不包含於構成本發明之要素。 In the above-mentioned general formula ( 2 ), R2 and R3 are preferably aryl groups or methyl groups having substituents from the viewpoint of improving the reliability of light emission. The aryl group or methyl group having a substituent referred to herein refers to an aryl group having a substituent or a methyl group, which means any one of them. The substituent referred to here refers to a substituent other than X 2 bonded to the carbon constituting the benzene ring of the aryl group. In addition, the aryl group referred to here refers to an aryl group having at least a benzene ring, and does not include a heteroaryl group such as a pyridyl group having a nitrogen-containing heterocyclic structure. In addition, an aliphatic group bonded to an aromatic ring having a substituent, such as 4-methoxyphenylmethyl, is not included. That is, for example, an organic pigment derivative having the molecular structure of CI Pigment Black 32 as a residue after derivatization treatment is not included in the elements constituting the present invention.
作為具有取代基的芳基,可舉出例如,乙氧基苯基、二甲基苯基、甲氧基苯基、苯基偶氮苯基、二異丙基苯基,作為更具體的取代形態,從提升發光可靠度之觀點而言,較佳為4-乙氧基苯基、3,5-二甲基苯基、4-甲氧基苯基、4-(苯基偶氮)苯基。 The aryl group having a substituent includes, for example, ethoxyphenyl, dimethylphenyl, methoxyphenyl, phenylazophenyl, diisopropylphenyl, and more specific substituted Form, from the viewpoint of improving the reliability of luminescence, 4-ethoxyphenyl, 3,5-dimethylphenyl, 4-methoxyphenyl, 4-(phenylazo)benzene base.
又,上述通式(1)及上述通式(2)中,為了提高特定結構的苝系色素衍生物自身的耐熱性,Z1及Z2較佳係皆為氫原子。 In addition, in the above-mentioned general formula (1) and the above-mentioned general formula (2), in order to improve the heat resistance of the perylene-based pigment derivative itself with a specific structure, Z 1 and Z 2 are preferably both hydrogen atoms.
後述(b-2)聚合物型分散劑包含具有酸性吸附基以作為吸附基之聚合物型分散劑的情況中,從抑制顯影殘渣之效果優良的觀點而言,上述以通式(1)表示之化合物,較佳係在上述以通式(1)中X1為鹼性官能基。亦即為-SO2NHR1或是-CONHR1。從發光可靠度之觀點而言,更佳為-CONHR1。 In the case where the (b-2) polymer-type dispersant described later includes a polymer-type dispersant having an acidic adsorption group as an adsorption group, from the viewpoint of excellent effect of suppressing development residue, the above formula (1) represents The compound, preferably in the above general formula (1), X 1 is a basic functional group. That is -SO 2 NHR 1 or -CONHR 1 . From the viewpoint of light emission reliability, -CONHR 1 is more preferable.
另一方面,上述以通式(2)表示之化合物,較佳係在通式(2)中X2為鹼性官能基。亦即較佳為 -SO2NHR4或是-CONHR4。從發光可靠度之觀點而言,更佳為-CONHR4。作為末端具有N,N-二烷胺基的有機基R1及R4,可舉出例如,N,N-二甲胺基甲基、N,N-二甲胺基乙基、N,N-二甲胺基丙基、N,N-二甲胺基丁基、N,N-二乙胺基甲基、N,N-二乙胺基乙基、N,N-二乙胺基丙基、N,N-二乙胺基丁基、N,N-二丙胺基甲基、N,N-二丙胺基乙基、N,N-二丙胺基丙基、N,N-二丙胺基丁基、N,N-二丁胺基甲基、N,N-二丁胺基乙基、N,N-二丁胺基丙基、N,N-二丁胺基丁基。 On the other hand, the compound represented by the above-mentioned general formula (2) is preferably that X 2 in the general formula (2) is a basic functional group. That is, it is preferably -SO 2 NHR 4 or -CONHR 4 . From the viewpoint of light emission reliability, -CONHR 4 is more preferable. Examples of organic groups R 1 and R 4 having N,N-dialkylamino groups at their terminals include N,N-dimethylaminomethyl, N,N-dimethylaminoethyl, N,N -Dimethylaminopropyl, N,N-dimethylaminobutyl, N,N-diethylaminomethyl, N,N-diethylaminoethyl, N,N-diethylaminopropyl N,N-diethylaminobutyl, N,N-dipropylaminomethyl, N,N-dipropylaminoethyl, N,N-dipropylaminopropyl, N,N-dipropylaminopropyl Butyl, N,N-dibutylaminomethyl, N,N-dibutylaminoethyl, N,N-dibutylaminopropyl, N,N-dibutylaminobutyl.
其中,從與後述(b-2)聚合物型分散劑的吸附作用強且抑制顯影殘渣之效果優良的觀點而言,可為末端具有N,N-二甲胺基的有機基或是末端具有N,N-二乙胺基的有機基。較佳為N,N-二甲胺基甲基、N,N-二甲胺基乙基、N,N-二甲胺基丙基、N,N-二甲胺基丁基、N,N-二乙胺基甲基、N,N-二乙胺基乙基、N,N-二乙胺基丙基、N,N-二乙胺基丁基。 Among them, from the standpoint of strong adsorption with the polymer-type dispersant (b-2) described later and an excellent effect of suppressing development residue, it may be an organic group having an N,N-dimethylamino group at the end or an organic group having an N,N-dimethylamino group at the end. An organic group of N,N-diethylamino. Preferred are N,N-dimethylaminomethyl, N,N-dimethylaminoethyl, N,N-dimethylaminopropyl, N,N-dimethylaminobutyl, N,N - Diethylaminomethyl, N,N-diethylaminoethyl, N,N-diethylaminopropyl, N,N-diethylaminobutyl.
作為X1為鹼性官能基之化合物的具體例,較佳可舉出例如,以下述結構式(15)、(16)表示之化合物,作為X2為鹼性官能基之情況的化合物的具體例,較佳可舉出例如,以下述結構式(17)~(21)表示之化合物。 Specific examples of the compound in which X1 is a basic functional group include, for example, compounds represented by the following structural formulas (15) and (16), and specific examples of compounds in which X2 is a basic functional group. For example, preferably, compounds represented by the following structural formulas (17) to (21) are mentioned, for example.
上述特定結構的苝系色素衍生物,無論具有酸性官能基或鹼性官能基,皆可得到抑制源自(a)具有含氮雜環結構的黑色材之顯影殘渣的效果,但為了更使其與ITO表面的相互作用更小並且提高抑制黑點的效果,特定結構的苝系色素衍生物較佳係具有酸性官能基。其中,從提升分散穩定性且抑制顯影殘渣的效果優良之觀點而言,更佳係具有磺酸基(-SO3H)作為酸性官能基。作為具有磺酸基的特定結構的苝系色素衍生物,較佳係含有以下述通式(22)表示之化合物及/或以下述通式(23)表示之化合物。從分散穩定化效果及抑制顯影殘渣的效果優良之觀點而言,更佳係併用以下述通式(22)表示之化合物與以下述通式(23)表示之化合物與。另外,下述通式(22)中,磺酸基(-SO3H)亦可直接鍵結於構成苝環之1、2、5、6、7、8、9、10、11、12號位的碳之中任一個碳。下述通式(23)中,磺酸基亦可直接鍵結於構成苝環的1、2、5、6、7、8、11、12號位的碳以及構成具有取代基之芳基的苯環的碳之中任一個碳。 The perylene-based pigment derivatives with the above-mentioned specific structure, regardless of having an acidic functional group or a basic functional group, can obtain the effect of suppressing the development residue derived from (a) a black material having a nitrogen-containing heterocyclic structure, but in order to make it more The interaction with the ITO surface is smaller and the effect of suppressing black spots is improved. The perylene pigment derivatives with specific structures preferably have acidic functional groups. Among them, it is more preferable to have a sulfonic acid group (—SO 3 H) as the acidic functional group from the viewpoint of improving the dispersion stability and suppressing the development residue. As the perylene-based dye derivative having a specific structure of a sulfonic acid group, it is preferable to contain a compound represented by the following general formula (22) and/or a compound represented by the following general formula (23). It is more preferable to use a compound represented by the following general formula (22) and a compound represented by the following general formula (23) in combination from the viewpoint of excellent dispersion stabilization effect and development residue suppression effect. In addition, in the following general formula (22), the sulfonic acid group (-SO 3 H) can also be directly bonded to No. 1, 2, 5, 6, 7, 8, 9, 10, 11, and 12 of the perylene ring. Any one of the carbons in the position. In the following general formula (23), the sulfonic acid group can also be directly bonded to the carbons at
上述通式(22)中,X3表示與苝環直接鍵結的-SO3H。Z3表示與苝環直接鍵結的氫原子。n及m為整數,n表示1或2,並且滿足n+m=10。 In the above general formula (22), X 3 represents -SO 3 H directly bonded to the perylene ring. Z 3 represents a hydrogen atom directly bonded to the perylene ring. n and m are integers, n represents 1 or 2, and satisfies n+m=10.
上述通式(23)中,R5及R6彼此相同,其表示氫原子、具有取代基的芳基或甲基。X4表示與苝環及/或苯環直接鍵結的-SO3H,Z4表示與苝環直接鍵結的氫原子。p及q為整數,p表示1或2,q表示6~8。 In the above general formula (23), R 5 and R 6 are the same as each other and represent a hydrogen atom, a substituted aryl group or a methyl group. X 4 represents —SO 3 H directly bonded to the perylene ring and/or benzene ring, and Z 4 represents a hydrogen atom directly bonded to the perylene ring. p and q are integers, p means 1 or 2, and q means 6~8.
上述通式(23)中,從耐熱性之觀點而言,R5及R6較佳為具有取代基的芳基或甲基。此處所指的具有取代基之芳基或甲基,係具有取代基的芳基、或是甲基,其表示其中的任一基團。作為具有取代基的芳基,與在上述通式(2)中R2及R3的例示相同,可舉出例如,乙氧基苯基、二甲基苯基、甲氧基苯基、苯基偶氮苯基、二異丙基苯基。作為更具體的取代形態,從提升發光可靠度之觀點而言,較佳為4-乙氧基苯基、3,5-二甲基苯基、4-甲氧基苯基、4-(苯基偶氮)苯基。 In the above general formula (23), R 5 and R 6 are preferably substituted aryl or methyl groups from the viewpoint of heat resistance. The aryl group or methyl group having a substituent referred to herein refers to an aryl group having a substituent or a methyl group, which means any one of them. The aryl group having a substituent is the same as the examples of R2 and R3 in the above general formula ( 2 ), for example, ethoxyphenyl, dimethylphenyl, methoxyphenyl, benzene Azophenyl, diisopropylphenyl. As a more specific form of substitution, 4-ethoxyphenyl, 3,5-dimethylphenyl, 4-methoxyphenyl, 4-(benzene azo)phenyl.
作為上述以通式(22)表示之化合物,較佳可舉出例如以下述結構式(24)表示之化合物。又,作為上述以通式(23)表示之化合物,較佳可舉出例如以下述結構式(25)表示之化合物。可單獨含有該等化合物或亦可含有多種該等化合物。 Preferable examples of the compound represented by the general formula (22) include compounds represented by the following structural formula (24). Moreover, as a compound represented by the said General formula (23), Preferably, the compound represented by the following structural formula (25) is mentioned, for example. These compounds may be contained alone or a plurality of such compounds may be contained.
作為屬於(b)分散劑之成分的特定結構的苝系色素衍生物,係在上述通式(1)中X1的取代基數n為1或是2的化合物,但亦可進一步包含取代基數n為3以上的化合物。然而,使其含有取代基數n為3以上之化合物的情況,為了得到高發光可靠度,較佳係與在通式(1)中X1的取代基數n為1或2的化合物的平均取代基數在1.0~2.0的範圍內。例如,以等莫耳量使其含有取代基數n為1的化合物與取代基數n為3的化合物的情況,平均取代基數為2.0。併用通式(2)中X2的取代基數p為1或2之化合物與取代基數p為3以上之化合物而使其含有於其中的情況亦相同,較佳係該等的平均取代基數在1.0~2.0的範圍內。 A perylene-based pigment derivative of a specific structure as a component of the (b) dispersant is a compound in which the number of substituents n of X1 in the above general formula ( 1 ) is 1 or 2, but may further include a number of substituents n is a compound of 3 or more. However, in the case of making it contain a compound having a substituent number n of 3 or more, in order to obtain high luminescence reliability, it is preferably the same as the average substituent number of a compound in which the substituent n of X1 in the general formula ( 1 ) is 1 or 2 In the range of 1.0~2.0. For example, when a compound having a substituent n of 1 and a compound having a substituent n of 3 are contained in equimolar amounts, the average number of substituents is 2.0. It is also the same when the compound whose substituent p is 1 or 2 and the compound whose substituent p is 3 or more in the general formula (2) is used to make it contained therein. ~2.0 range.
作為合成本發明之有機EL顯示裝置所具備之像素分割層及/或平坦化層所含有之特定結構的苝系色素衍生物的方法,可舉出例如,以工業上可取得的苝-3,4-二羧基醯亞胺、苝-3,4-二羧基醯亞胺羧酸、C.I.顏 料紅123、C.I.顏料紅149、C.I.顏料紅178、C.I.顏料紅179、C.I.顏料紅190、C.I.顏料紫29、N,N’-雙(2,6-二異丙基苯基)-3,4,9,10-苝四羧酸二醯亞胺(以下有時記載為「苝橙」),或具有該等苝環結構之化合物等作為起始原料,進行後述各種的衍生化處理,而使其具有預期的化學結構。 As a method for synthesizing a perylene-based dye derivative of a specific structure contained in the pixel dividing layer and/or planarization layer of the organic EL display device of the present invention, for example, industrially available perylene-3, 4-Dicarboxyimide, perylene-3,4-dicarboxyimide carboxylic acid, C.I. Pigment Red 123, C.I. Pigment Red 149, C.I. Pigment Red 178, C.I. Pigment Red 179, C.I. Pigment Red 190, C.I. Pigment Violet 29. N,N'-bis(2,6-diisopropylphenyl)-3,4,9,10-perylenetetracarboxylic acid diimide (hereinafter sometimes referred to as "perylene orange"), or Compounds having such perylene ring structures are used as starting materials, and subjected to various derivatization treatments described later to obtain desired chemical structures.
作為上述通式(1)中具有上述酸性官能基或其鹽之化合物的合成方法,例如,可將苝-3,4-二羧基醯亞胺溶解於10~40%發煙硫酸、70~100%濃硫酸、氯磺酸或該等的混合液,在加熱至40~90℃的狀態下攪拌1~6小時。之後,投入重量相對於所使用之苝-3,4-二羧基醯亞胺為100倍以上的大量的水或是冰水中以進行析出而得到紅色固體,將該紅色固體進行水洗及過濾,再以丙酮洗淨後使其乾燥,接著進行乾式粉碎處理,藉此可得到上述通式(1)中X1為-SO3H的化合物。 As a synthesis method of the compound having the above-mentioned acidic functional group or its salt in the above-mentioned general formula (1), for example, perylene-3,4-dicarboxyimide can be dissolved in 10~40% oleum, 70~100 % Concentrated sulfuric acid, chlorosulfonic acid or a mixture thereof, and stir for 1-6 hours while heating to 40-90°C. After that, a large amount of water or ice water whose weight is more than 100 times that of the perylene-3,4-dicarboxyimide used is added to precipitate to obtain a red solid, which is washed with water and filtered, and then After washing with acetone and drying, followed by dry pulverization, a compound in which X 1 is -SO 3 H in the above general formula (1) can be obtained.
再者,藉由以既定量的氫氧化鈉水溶液、氫氧化鉀水溶液或是氨水溶液等的無機系鹼性藥液予以中和,可使分子內的至少一個-SO3H成為鈉鹽(-SO3Na)、鉀鹽(-SO3K)或是銨鹽(-SO3NH4),亦即可得到X1為-SO3M的化合物。又,藉由調整無機系鹼性藥液的量,可控制-SO3H與-SO3M的混合比例。 Furthermore, at least one -SO 3 H in the molecule can be made into a sodium salt (- SO 3 Na), potassium salt (-SO 3 K) or ammonium salt (-SO 3 NH 4 ), that is, the compound where X 1 is -SO 3 M can be obtained. Also, by adjusting the amount of the inorganic alkaline liquid, the mixing ratio of -SO 3 H and -SO 3 M can be controlled.
作為上述通式(1)中具有上述鹼性官能基之化合物的合成方法,可將苝-3,4-二羧基醯亞胺溶解於10~40%發煙硫酸、70~100%濃硫酸、氯磺酸或該等的混合液。接著,加熱至40~90℃的狀態下攪拌1~6小時後,再添加亞硫醯氯並攪拌,藉此得到苝-3,4-二羧基醯亞胺磺醯氯。之後,於觸媒的存在下,使其與既定量的N,N-二烷胺基烷胺類反應,藉此作為磺胺,再將其投入重量相對於所使用之苝-3,4-二羧基醯亞胺為100倍以上的大量的水或冰水中以進行析出而得到暗紅色固體,並將該暗紅色固體成分水洗及過濾。接著以丙酮洗淨,去除觸媒後使其乾燥,並進行乾式粉碎處理,藉此可得到上述通式(1)中X1為-SO2NHR1的化合物。 As a synthesis method of the compound having the above-mentioned basic functional group in the above-mentioned general formula (1), perylene-3,4-dicarboxyimide can be dissolved in 10~40% oleum, 70~100% concentrated sulfuric acid, Chlorosulfonic acid or mixtures thereof. Next, after stirring for 1 to 6 hours while heating to 40 to 90° C., thionyl chloride was added and stirred to obtain perylene-3,4-dicarboxyimidosulfonyl chloride. Afterwards, in the presence of a catalyst, it is reacted with a predetermined amount of N,N-dialkylaminoalkylamines, thereby serving as a sulfonamide, and then put into the weight relative to the used perylene-3,4-di Carboxylimide is precipitated in a large amount of water or ice water more than 100 times to obtain a dark red solid, which is washed with water and filtered. Then, it was washed with acetone to remove the catalyst, dried, and subjected to dry pulverization to obtain a compound in which X 1 is -SO 2 NHR 1 in the above general formula (1).
又,使苝-3,4-二羧基醯亞胺羧酸溶解於氯化亞甲基溶劑,添加亞硫醯氯並且攪拌,藉此作成苝-3,4-二羧基醯亞胺羰基氯化物後,減壓去除氯化亞甲基溶劑及未反應的亞硫醯氯。之後,在觸媒的存在下,使其與既定量的N,N-二烷胺基烷胺類反應,藉此作成羧醯胺,並將所得之暗紅色固體成分水洗及過濾。接著以丙酮洗淨,去除觸媒後使其乾燥,並進行乾式粉碎處理,可得到上述通式(1)中X1為-CONHR1的化合物。作為用以促進得到上述碸醯胺或羧醯胺之反應的觸媒,可舉出例如三甲胺或三乙胺等的胺系觸媒。 Also, perylene-3,4-dicarboxyimide carboxylic acid was dissolved in a methylene chloride solvent, and thionyl chloride was added and stirred to prepare perylene-3,4-dicarboxyimide carbonyl chloride Finally, the methylene chloride solvent and unreacted thionyl chloride were removed under reduced pressure. Afterwards, in the presence of a catalyst, it was reacted with a predetermined amount of N,N-dialkylaminoalkylamines to form a carboxamide, and the obtained dark red solid was washed with water and filtered. Then wash with acetone, remove the catalyst, dry it, and perform dry pulverization treatment to obtain the compound in which X 1 is -CONHR 1 in the above general formula (1). Examples of the catalyst for promoting the reaction to obtain the above-mentioned aramide or carboxamide include amine-based catalysts such as trimethylamine and triethylamine.
作為N,N-二烷胺基烷胺類,可舉出例如,N,N-二甲胺基甲胺、N,N-二甲胺基乙胺、N,N-二甲胺基丙胺、N,N-二甲胺基丁胺、N,N-二乙胺基甲胺、N,N-二乙胺基乙胺、N,N-二乙胺基丙胺、N,N-二乙胺基丁胺、N,N-二丙胺基甲胺、N,N-二丙胺基乙胺、N,N-二丙胺基丙胺、N,N-二丙胺基丁胺、N,N-二丁胺基甲胺、N,N-二丁胺基乙胺、N,N-二丁胺基丙胺、N,N-二丁胺基丁胺。 藉由單獨使用該等化合物或混合使用多種該等化合物,可合成具有預期之鹼性官能基的各種苝系色素衍生物。 Examples of N,N-dialkylaminoalkylamines include N,N-dimethylaminomethylamine, N,N-dimethylaminoethylamine, N,N-dimethylaminopropylamine, N,N-Dimethylaminobutylamine, N,N-Diethylaminomethylamine, N,N-Diethylaminoethylamine, N,N-Diethylaminopropylamine, N,N-Diethylamine butylamine, N,N-dipropylaminomethylamine, N,N-dipropylaminoethylamine, N,N-dipropylaminopropylamine, N,N-dipropylaminobutylamine, N,N-dibutylamine Methylamine, N,N-Dibutylaminoethylamine, N,N-Dibutylaminopropylamine, N,N-Dibutylaminobutylamine. Various perylene-based pigment derivatives having desired basic functional groups can be synthesized by using these compounds alone or in combination.
另一方面,作為上述苝-3,4-二羧基醯亞胺或苝-3,4-二羧基醯亞胺羧酸的替代,以C.I.顏料紅123、C.I.顏料紅149、C.I.顏料紅178、C.I.顏料紅179、C.I.顏料紅190、C.I.顏料紫29、苝橙或是具有該等苝環的化合物作為起始原料,藉由與前述的以上述通式(1)表示之化合物的合成方法相同的反應流程進行衍生化處理,可得到以上述通式(2)表示的具有各種官能基的化合物。 On the other hand, instead of the above-mentioned perylene-3,4-dicarboxyimide or perylene-3,4-dicarboxyimide carboxylic acid, C.I. Pigment Red 123, C.I. Pigment Red 149, C.I. Pigment Red 178, C.I. Pigment Red 179, C.I. Pigment Red 190, C.I. Pigment Violet 29, perylene orange or compounds having these perylene rings are used as starting materials, by the same synthesis method as the aforementioned compound represented by the above general formula (1) According to the reaction scheme of the derivatization treatment, compounds having various functional groups represented by the above general formula (2) can be obtained.
例如,藉由以上述結構式(5)表示之C.I.顏料紅123作為起始原料進行衍生化處理,可得到上述通式(2)中R2及R3為4-乙氧基苯基的化合物。藉由以上述結構式(6)表示之C.I.顏料紅149作為起始原料進行衍生化處理,可得到上述通式(2)中R2及R3為3,5-二甲基苯基的化合物。藉由以C.I.顏料紅178作為起始原料進行衍生化處理,可得到上述通式(2)中R2及R3為4-(苯基偶氮)苯基的化合物。 For example, by derivatizing CI Pigment Red 123 represented by the above structural formula (5) as a starting material, a compound in which R 2 and R 3 are 4-ethoxyphenyl in the above general formula (2) can be obtained . By derivatizing CI Pigment Red 149 represented by the above structural formula (6) as a starting material, a compound in which R 2 and R 3 are 3,5-dimethylphenyl in the above general formula (2) can be obtained . By derivatizing CI Pigment Red 178 as a starting material, a compound in which R 2 and R 3 are 4-(phenylazo)phenyl in the above general formula (2) can be obtained.
藉由以上述結構式(7)表示之C.I.顏料紅179作為起始原料進行衍生化處理,可得到上述通式(2)中R2及R3為甲基的化合物。藉由以上述結構式(8)表示之C.I.顏料紅190作為起始原料衍生化處理,可得到上述通式(2)中R2及R3為4-甲氧基苯基的化合物。藉由以上述結構式(11)表示之C.I.顏料紫29作為起始原料進行衍生化處理,可得到上述通式(2)中R2及R3為氫原子的化合物。藉由以苝橙作為起始原料進行衍生化處理,可得到上述通式(2)中R2及R3為2,6-二異丙基苯基的化合物。 By derivatizing CI Pigment Red 179 represented by the above structural formula (7) as a starting material, a compound in which R 2 and R 3 are methyl groups in the above general formula (2) can be obtained. The compound in which R 2 and R 3 are 4-methoxyphenyl in the above general formula (2) can be obtained by derivatizing CI Pigment Red 190 represented by the above structural formula (8) as a starting material. By derivatizing CI Pigment Violet 29 represented by the above structural formula (11) as a starting material, a compound in which R 2 and R 3 are hydrogen atoms in the above general formula (2) can be obtained. A compound in which R 2 and R 3 are 2,6-diisopropylphenyl in the above general formula (2) can be obtained by derivatizing perylene orange as a starting material.
藉由以上的方法所得之特定結構的苝系色素衍生物,為了得到高發光可靠度,較理想係使用將其單獨精製而預先去除雜質者。作為源自用於上述衍生化處理之藥液的離子性雜質的殘留量,較佳係硫酸根離子(SO4 2-)、亞硫酸根離子(SO3 -)、氯離子(Cl-)的含量分別為100ppm以下,更佳為50ppm以下。可由離子層析測量該等離子性雜質的殘存量,可使用濕式媒介分散機,使特定結構的苝系色素衍生物的粉末分散於去離子水中以進行漿液化而提高去除率,亦可藉由添加離子交換樹脂並且攪拌而進一步提升去除率。 In order to obtain high luminescence reliability, the perylene-based dye derivatives with a specific structure obtained by the above methods are preferably purified separately to remove impurities in advance. As the residual amount of ionic impurities derived from the chemical solution used for the above-mentioned derivatization treatment, sulfate ion (SO 4 2- ), sulfite ion (SO 3 - ), and chloride ion (Cl - ) are preferable. The contents are respectively 100 ppm or less, more preferably 50 ppm or less. The remaining amount of the ionic impurities can be measured by ion chromatography, and the powder of the perylene pigment derivative with a specific structure can be dispersed in deionized water to improve the removal rate by using a wet media disperser. Addition of ion exchange resin and agitation further enhances the removal rate.
特定結構的苝系色素衍生物,一方面為了避免其本身的粗大粒子殘存於顏料分散液中,一方面為了更高的分散穩定化效果,較理想係使用充分實施乾式粉碎處理而經乾式粉末化者,其平均一次粒徑較佳為150nm以下,更佳為100nm以下。特定結構的苝系色素衍生物的平均一次粒徑,可以與上述(a)具有含氮雜環結構的黑色材相同的方法進行評價。另外,在包含具有源自用於上述衍生化處理之藥液的含硫黃化合物與胺系觸媒之鹽的雜質的情況,從發光可靠度之觀點而言,較理想係藉由反覆進行水洗以將其極力去除之後進行乾式粉末化。 Perylene-based pigment derivatives with a specific structure, on the one hand, in order to avoid their own coarse particles remaining in the pigment dispersion, and on the other hand, for a higher dispersion stabilization effect, it is ideal to use a dry powder that is fully dry pulverized Or, the average primary particle size thereof is preferably not more than 150 nm, more preferably not more than 100 nm. The average primary particle size of the perylene-based dye derivative with a specific structure can be evaluated by the same method as the above (a) black material having a nitrogen-containing heterocyclic structure. In addition, in the case of containing impurities derived from salts of sulfur-containing compounds and amine-based catalysts in the chemical solution used for the above-mentioned derivatization treatment, from the viewpoint of luminescence reliability, it is preferable to wash with water repeatedly. After removing it as much as possible, perform dry powdering.
使感光性組成物中含有上述特定結構的苝系色素衍生物的方法並無特別限制,以下例示具體例以作為較佳的方法。 The method of making the photosensitive composition contain the perylene-based dye derivative of the above-mentioned specific structure is not particularly limited, and specific examples are given below as preferred methods.
在特定結構的苝系色素衍生物的存在下,藉由捏合屬於(a)具有含氮雜環結構之黑色材的有機顏料之中至少1色的有機顏料,使其預先吸附/載持於顏料表面之後進行乾燥及再粉碎,而先行製造乾式粉末狀的有機色素衍生物處理型的二次加工顏料。接著,可舉出下述方法:與其他有機顏料一起進行濕式媒介分散處理,使用所得之顏料分散液以製造感光性組成物。或是可舉出下述方法:在特定結構的苝系色素衍生物的存在下,將(a)具有含氮雜環結構的黑色材統一進行濕式媒介分散處理,使用所得之顏料分散液以製造感光性組成物。 In the presence of a perylene-based pigment derivative of a specific structure, by kneading at least one color of organic pigments among the organic pigments belonging to (a) black materials having a nitrogen-containing heterocyclic structure, it is pre-adsorbed/supported on the pigment The surface is then dried and then pulverized, and a dry powdered organic pigment derivative-treated secondary processed pigment is produced first. Next, a method of performing a wet medium dispersion treatment with other organic pigments and using the obtained pigment dispersion to produce a photosensitive composition can be mentioned. Alternatively, the following method can be mentioned: in the presence of a perylene-based pigment derivative of a specific structure, (a) the black material having a nitrogen-containing heterocyclic structure is uniformly subjected to a wet medium dispersion treatment, and the resulting pigment dispersion is used to Manufacture of photosensitive composition.
為了提高分散穩定性並且抑制顏料凝集物的發生,特定結構的苝系色素衍生物的含量,相對於(a)具有含氮雜環結構的黑色材,較佳為0.5重量%以上。另一方面,為了抑制與ITO電極表面的相互作用提高,並且抑制特定結構之苝系色素衍生物本身產生顯影殘渣,較佳為10.0重量%以下。 In order to improve the dispersion stability and suppress the occurrence of pigment aggregates, the content of the perylene-based pigment derivative with a specific structure is preferably 0.5% by weight or more relative to (a) the black material having a nitrogen-containing heterocyclic structure. On the other hand, it is preferably 10.0% by weight or less in order to suppress an increase in interaction with the surface of the ITO electrode and to suppress the development residue of the perylene-based pigment derivative itself of a specific structure.
又,在未對於發光可靠度有不良影響的範圍內,亦可進一步併用上述特定結構之苝系色素衍生物以外的有機色素衍生物或是可得到與其相同之作為增效劑的作用效果的化合物,以控制分散穩定性及顯影殘渣的抑制效果。例如,除了陰丹士林系色素衍生物、無金屬酞花青系色素衍生物、蒽醌系色素衍生物、皮蒽酮系色素衍生物、喹吖酮系色素衍生物、二系色素衍生物、紫環酮系色素衍生物以外,可列舉具有酸性官能基或鹼性官能基的1,3,5-三系化合物。(a)具有含氮雜環結構 的黑色材為含有(a-1)選自有機黃色顏料、有機紅色顏料及有機橙色顏料之至少1色的具有含氮雜環結構的有機顏料與(a-2)具有含氮雜環結構之有機藍色顏料的顏料混合物的情況中,較佳為併用蒽醌系色素衍生物,可舉出例如以下述結構式(56)表示之化合物。 Also, within the range that does not adversely affect the light emission reliability, organic dye derivatives other than the perylene dye derivatives of the above-mentioned specific structure or compounds that can obtain the same effect as a synergist can also be used in combination. , to control the dispersion stability and the inhibitory effect of developing residue. For example, in addition to indanthrene-based pigment derivatives, metal-free phthalocyanine-based pigment derivatives, anthraquinone-based pigment derivatives, pyranthrone-based pigment derivatives, quinacridone-based pigment derivatives, di In addition to pigment derivatives and perionone-based pigment derivatives, 1,3,5-tridiox having an acidic functional group or a basic functional group Department of compounds. (a) The black material having a nitrogen-containing heterocyclic structure is an organic pigment having a nitrogen-containing heterocyclic structure containing (a-1) at least one color selected from organic yellow pigments, organic red pigments, and organic orange pigments and (a- 2) In the case of a pigment mixture of an organic blue pigment having a nitrogen-containing heterocyclic structure, it is preferable to use an anthraquinone-based pigment derivative in combination, for example, a compound represented by the following structural formula (56).
作為屬於(b-1)非聚合物型分散劑的成分,含有松香系分散劑亦無妨。松香系分散劑發揮提升對於顏料表面之分散媒介的潤濕性的效果,其可作為助劑,而用以更加提高特定結構之苝系色素衍生物帶來的分散穩定化效果。作為松香系分散劑,可舉出例如,松香單體、松香二聚物(rosin dimer)、馬來酸改質松香、富馬酸改質松香或該等的混合物。其中,較佳為包含分子內含有1個以上之羧基的松香單體與松香二聚物且固體成分酸價在100~300(mgKOH/g)之範圍的松香系分散劑,作為市售品的具體例,可舉出「Poly-Pale Partially Dimerized Rosin」(註冊商標)、「Dymerex Polymerized Rosin」(註冊商標)(以上皆為EASTMAN CHEMICAL公司製)、ARDYME R-95、PINECRYSTAL KR140(以上皆為荒川化學工業(股)製)。 As the component belonging to the (b-1) non-polymer dispersant, it may contain a rosin-based dispersant. The rosin-based dispersant has the effect of improving the wettability of the dispersion medium on the surface of the pigment, and it can be used as an auxiliary agent to further enhance the dispersion stabilization effect of the perylene-based pigment derivative with a specific structure. Examples of rosin-based dispersants include rosin monomers, rosin dimers, maleic-acid-modified rosins, fumaric-acid-modified rosins, or mixtures thereof. Among them, a rosin-based dispersant containing a rosin monomer and a rosin dimer containing one or more carboxyl groups in the molecule and having an acid value in the solid content in the range of 100 to 300 (mgKOH/g) is preferred, as a commercially available Specific examples include "Poly-Pale Partially Dimerized Rosin" (registered trademark), "Dymerex Polymerized Rosin" (registered trademark) (all manufactured by EASTMAN CHEMICAL), ARDYME R-95, PINECRYSTAL KR140 (all manufactured by Arakawa Chemical Industry (stock) system).
用以形成本發明之有機EL顯示裝置所具備之像素分割層及/或平坦化層的感光性組成物,較佳係進一步含有(b-2)聚合物型分散劑。作為(b-2)聚合物型分散劑,可使用具有包含各種樹脂系之高分子鏈作為主鏈的分散劑。可舉出例如丙烯酸系分散劑、聚氧伸烷基系分散劑(聚醚系分散劑)、聚胺基甲酸酯系分散劑、聚酯系分散劑、聚胺系分散劑。其中,為了兼具與分散穩定性相關的親溶劑性以及與顯影性相關的適當親水性,較佳為丙烯酸系分散劑、聚氧基伸烷基系分散劑。除了上述主鏈以外,較佳係具有對於上述特定結構之苝系色素衍生物的吸附能高的鹼性吸附基及/或酸性吸附基的聚合物型分散劑。 The photosensitive composition for forming the pixel dividing layer and/or the planarization layer of the organic EL display device of the present invention preferably further contains (b-2) a polymeric dispersant. As the (b-2) polymer type dispersant, a dispersant having a polymer chain including various resins as a main chain can be used. Examples thereof include acrylic dispersants, polyoxyalkylene-based dispersants (polyether-based dispersants), polyurethane-based dispersants, polyester-based dispersants, and polyamine-based dispersants. Among them, acrylic dispersants and polyoxyalkylene-based dispersants are preferred in order to have both solvent affinity related to dispersion stability and appropriate hydrophilicity related to developability. In addition to the above-mentioned main chain, a polymer-type dispersant having a basic adsorption group and/or an acidic adsorption group having a high adsorption capacity for the perylene-based dye derivative of the above-mentioned specific structure is preferable.
(b-2)聚合物型分散劑的重量平均分子量(Mw),為了提高立體排斥效果而充分得到分散穩定化效果,較佳為1,000以上,更佳為2,000以上。又,為了抑制感光性組成物的觸變性上升,較佳為50,000以下,更佳為30,000以下。 (b-2) The weight average molecular weight (Mw) of the polymeric dispersant is preferably 1,000 or more, more preferably 2,000 or more in order to enhance the steric repulsion effect and sufficiently obtain the dispersion stabilization effect. Moreover, in order to suppress the thixotropic increase of a photosensitive composition, it is preferable that it is 50,000 or less, and it is more preferable that it is 30,000 or less.
作為(b-2)聚合物型分散劑所具有的鹼性吸附基,例如,除了3級胺基或其鹽、4級銨鹽基以外,更可舉出分子末端具有異三聚氰酸酯環等雜環的有機基。其中,從分散穩定化效果優良、抑制ITO上的顯影殘渣之效果佳的觀點而言,更佳為3級胺基。 (b-2) As the basic adsorption group possessed by the polymer type dispersant, for example, in addition to the tertiary amine group or its salt, and the quaternary ammonium salt group, there are also isocyanurate groups at the end of the molecule. An organic group of a heterocyclic ring such as a ring. Among them, a tertiary amino group is more preferable from the viewpoint of excellent dispersion stabilization effect and excellent effect of suppressing development residue on ITO.
作為具有3級胺基的聚合物型分散劑,例如,主鏈為丙烯酸系高分子鏈的情況,可舉出具有二烷胺基的乙烯屬不飽和單體與其以外的乙烯屬不飽和單體 的共聚物。作為具體例,較佳可使用具有以下述通式(26)表示之結構單元的分散劑。作為具有二烷胺基之乙烯屬不飽和單體,可舉出例如,(甲基)丙烯酸二甲胺基乙酯、(甲基)丙烯酸二甲胺基丙酯、(甲基)丙烯酸二乙胺基乙酯、(甲基)丙烯酸二乙胺基丙酯。 As a polymer type dispersant having a tertiary amino group, for example, when the main chain is an acrylic polymer chain, ethylenically unsaturated monomers having a dialkylamino group and other ethylenically unsaturated monomers are mentioned. of copolymers. As a specific example, a dispersant having a structural unit represented by the following general formula (26) can be preferably used. Examples of ethylenically unsaturated monomers having a dialkylamino group include dimethylaminoethyl (meth)acrylate, dimethylaminopropyl (meth)acrylate, diethyl (meth)acrylate, Aminoethyl ester, diethylaminopropyl (meth)acrylate.
通式(26)中,R15表示氫原子或是甲基、R16表示碳數1~4的二價的連結基,R17及R18分別獨立表示碳數1~4的烷基。 In the general formula (26), R 15 represents a hydrogen atom or a methyl group, R 16 represents a divalent linking group having 1 to 4 carbons, and R 17 and R 18 independently represent an alkyl group having 1 to 4 carbons.
另一方面,主鏈為聚氧基伸烷基系高分子鏈的情況,作為具體例,較佳可使用分子末端具有3級胺基且具有環氧乙烷/環氧丙烷鏈的分散劑。 On the other hand, when the main chain is a polyoxyalkylene-based polymer chain, as a specific example, it is preferable to use a dispersant having a tertiary amino group at a molecular end and an ethylene oxide/propylene oxide chain.
作為(b-2)聚合物型分散劑所具有的酸性吸附基,可舉出例如,磷酸基、磺酸基、羧酸基、酚性羥基,其中,從分散穩定化效果優良、抑制ITO上的顯影殘渣之效果優良的觀點而言,較佳為磷酸基,較佳係含有至少具有磷酸基的聚合物型分散劑。 (b-2) The acidic adsorption group possessed by the polymer-type dispersant includes, for example, a phosphoric acid group, a sulfonic acid group, a carboxylic acid group, and a phenolic hydroxyl group. From the viewpoint of excellent effect of developing residues, phosphoric acid groups are preferred, and polymer-type dispersants containing at least phosphoric acid groups are preferred.
作為具有磷酸基之聚合物型分散劑的具體例,例如,主鏈為丙烯酸系高分子鏈的情況,可舉出具有磷酸基之乙烯屬不飽和單體與其以外的乙烯屬不飽和單體的共聚物。作為具體例,較佳可使用具有以下述通式(27)表示之結構單元的分散劑。 As a specific example of a polymer type dispersant having a phosphoric acid group, for example, in the case where the main chain is an acrylic polymer chain, a combination of an ethylenically unsaturated monomer having a phosphoric acid group and other ethylenically unsaturated monomers can be mentioned. copolymer. As a specific example, a dispersant having a structural unit represented by the following general formula (27) can be preferably used.
通式(27)中,R19表示氫原子或是甲基,R20表示C2H4或是C3H6,k表示整數1~10。 In the general formula (27), R 19 represents a hydrogen atom or a methyl group, R 20 represents C 2 H 4 or C 3 H 6 , and k represents an integer of 1-10.
作為具有磷酸基之乙烯屬不飽和單體,可舉出例如,酸式磷酸2-甲基丙烯醯氧基乙酯、(甲基)丙烯酸酸式膦醯氧基乙酯、(甲基)丙烯酸酸式膦醯氧基丙酯、酸式膦醯氧基聚氧基丙二醇(甲基)丙烯酸酯。 Examples of ethylenically unsaturated monomers having a phosphoric acid group include 2-methacryloxyethyl acid phosphate, (meth)acrylic acid phosphonyloxyethyl, (meth)acrylic acid Acid phosphonyloxypropyl ester, acid phosphonyloxypolyoxypropylene glycol (meth)acrylate.
作為用於與上述具有二烷胺基的乙烯屬不飽和單體或具有磷酸基的乙烯屬不飽和單體共聚合的其他乙烯屬不飽和單體,可舉出例如,(甲基)丙烯酸苄酯、 苯乙烯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸聚乙二醇、(甲基)丙烯酸聚丙二醇、(甲基)丙烯酸聚乙烯/聚丙二醇。從與上述特定結構的苝系色素衍生物的親和性高且分散性優良、並可提升耐熱性之觀點而言,分散劑較佳係在側鏈上具有苄基,較佳係使用(甲基)丙烯酸苄酯。 As other ethylenically unsaturated monomers for copolymerization with the above-mentioned ethylenically unsaturated monomer having a dialkylamino group or ethylenically unsaturated monomer having a phosphoric acid group, for example, benzyl (meth)acrylate ester, styrene, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, n-butyl (meth)acrylate, polyethylene glycol (meth)acrylate, (meth)acrylate Base) Acrylic Polypropylene Glycol, (Meth) Acrylic Polyethylene/Polypropylene Glycol. From the standpoint of high affinity with the perylene-based pigment derivatives of the above-mentioned specific structure, excellent dispersibility, and improved heat resistance, the dispersant preferably has a benzyl group on the side chain, and is preferably used (methyl ) benzyl acrylate.
作為(b-2)聚合物型分散劑,可使用市售品,作為僅具有酸性吸附基的聚合物型分散劑,可舉出例如,「DISPERBYK」(註冊商標)-102、110、111、118、2096、BYK-P104、P105、「Solsperse」(註冊商標)3000、21000、36000、36600(以上皆為Lubrizol公司製)、AJISPER PA111(Ajinomoto Fine-Techno公司製)。該等分散劑可單獨或混合多種使用。 Commercially available products can be used as (b-2) polymer-type dispersants, and examples of polymer-type dispersants having only acidic adsorption groups include "DISPERBYK" (registered trademark)-102, 110, 111, 118, 2096, BYK-P104, P105, "Solsperse" (registered trademark) 3000, 21000, 36000, 36600 (all manufactured by Lubrizol Corporation), AJISPER PA111 (manufactured by Ajinomoto Fine-Techno Corporation). These dispersants can be used alone or in combination.
作為僅具有鹼性吸附基的聚合物型分散劑,可舉出例如,「DISPERBYK」(註冊商標)-161、162、2163、164、2164、167、168、2000、2050、2150、2155、9075、9077、BYK-LPN6919、BYK-LPN21116、BYK-LPN21234(以上皆為BYK公司製)、EFKA-4015、4020、4046、4047、4050、4055、4060、4080、4300、4330、4340、4400、4401、4402、4403、4800(以上皆為BASF公司製)、「Solsperse」(註冊商標)13240、13940、20000、24000、71000、76500(以上皆為Lubrizol公司製)。該等分散劑可單獨或混合多種使用。 Examples of polymer-type dispersants having only basic adsorption groups include "DISPERBYK" (registered trademark)-161, 162, 2163, 164, 2164, 167, 168, 2000, 2050, 2150, 2155, 9075 . . These dispersants can be used alone or in combination.
作為具有酸性吸附基與鹼性吸附基的聚合物型分散劑,可舉出例如,「DISPERBYK」(註冊商標)-142、 145、2001、2010、2020、2025(以上皆為BYK公司製)、「SOLSPERSE」(註冊商標)9000、11200、13650、24000SC、24000GR、32000、32500、32550、33000、34750、35100、35200、37500、39000、56000(Lubrizol公司製)、AJISPER PB821、PB822、PB824、PB881、PB883(以上皆為Ajinomoto Fine-Techno公司製)。 As a polymer type dispersant having an acidic adsorption group and a basic adsorption group, for example, "DISPERBYK" (registered trademark)-142, 145, 2001, 2010, 2020, 2025 (both are manufactured by BYK Corporation), "SOLSPERSE" (registered trademark) 9000, 11200, 13650, 24000SC, 24000GR, 32000, 32500, 32550, 33000, 34750, 35100, 35200, 37500, 39000, 56000 (manufactured by Lubrizol), AJISPER, B84, PB821, PB822 , PB883 (the above are all manufactured by Ajinomoto Fine-Techno).
本發明的有機EL顯示裝置所具備之像素分割層及/或平坦化層包含(c)樹脂。此處所指的(c)樹脂係像素分割層及/或平坦化層中的所謂的接著材(黏結劑),其係指將上述(a)具有含氮雜環結構的黑色材及(b)分散劑固定化,在常溫/大氣壓下的條件下具有成膜功能的成分。 The pixel dividing layer and/or the planarization layer included in the organic EL display device of the present invention contains (c) resin. The (c) so-called bonding material (adhesive) in the resin-based pixel division layer and/or planarization layer referred to here refers to the above-mentioned (a) black material having a nitrogen-containing heterocyclic structure and (b) The dispersant is immobilized and has a film-forming function under normal temperature/atmospheric pressure conditions.
屬於(c)樹脂的成分,藉由使其含有於用以使本發明的有機EL顯示裝置所具備之像素分割層及/或平坦化層形成圖案的感光性組成物中,可使其填充於最後所得之像素分割層及/或平坦化層的膜中。 The component belonging to (c) resin can be filled in the photosensitive composition for patterning the pixel dividing layer and/or planarizing layer included in the organic EL display device of the present invention by making it contained in the In the film of the resulting pixel division layer and/or planarization layer.
用以形成像素分割層及/或平坦化層的感光性組成物可為負型微影中所使用的負型感光性組成物,該負型微影係藉由隔著負型曝光遮罩的圖案曝光,使曝光部的膜的鹼溶解性降低,再以鹼顯影液去除未曝光部的膜而形成圖案。或是亦可為所謂正型微影中所使用的正型感光性組成物,該正型微影係藉由隔著正型曝光遮罩的圖案曝光,相較於未曝光部的膜的鹼溶解性,相對提高曝光部的膜的鹼溶解性,再以鹼顯影液去除曝光部的膜而形成圖案。從一方面維持良好的曝光感度與圖案 加工性、一方面得到高遮光性之觀點而言,較佳為負型感光性組成物。 The photosensitive composition used to form the pixel dividing layer and/or the planarization layer may be a negative photosensitive composition used in negative photolithography by using a negative photolithography through a negative exposure mask. Pattern exposure reduces the alkali solubility of the film in the exposed area, and then removes the film in the unexposed area with an alkali developing solution to form a pattern. Alternatively, it may be a positive-type photosensitive composition used in so-called positive-type lithography, which is exposed through a pattern through a positive-type exposure mask, compared with the base of the film in the unexposed portion Solubility, relatively improve the alkali solubility of the film in the exposed part, and then remove the film in the exposed part with an alkaline developer to form a pattern. From the viewpoint of maintaining good exposure sensitivity and pattern processability while obtaining high light-shielding properties, a negative photosensitive composition is preferred.
本發明的有機EL顯示裝置所具備之像素分割層及/或平坦化層含有(c)樹脂。又,為了將負型或是正型的任一種感光性賦予用於使後述像素分割層及/或平坦化層形成圖案的感光性組成物,較佳係使其含有鹼可溶性樹脂。鹼可溶性樹脂係指具有羥基、羧基及/或磺酸基作為鹼可溶性基,且酸價在10mgKOH/g以上,重量平均分子量(Mw)在1,000以上150,000以下的樹脂。另外,用以使像素分割層及/或平坦化層形成圖案的感光性組成物所含有之鹼可溶性樹脂的硬化物,係成為屬於構成最後所得之像素分割層及/或平坦化層的(c)樹脂的成分。 The pixel dividing layer and/or the planarization layer included in the organic EL display device of the present invention contains (c) resin. Also, in order to impart either negative or positive photosensitivity to the photosensitive composition for patterning the pixel dividing layer and/or planarization layer described later, it is preferable to contain an alkali-soluble resin. Alkali-soluble resin refers to a resin having hydroxyl, carboxyl and/or sulfonic acid groups as alkali-soluble groups, an acid value of 10 mgKOH/g or more, and a weight average molecular weight (Mw) of 1,000 to 150,000. In addition, the cured product of the alkali-soluble resin contained in the photosensitive composition for patterning the pixel dividing layer and/or the planarizing layer belongs to (c ) composition of the resin.
作為鹼可溶性樹脂,可舉出例如,鹼可溶性卡多(cardo)樹脂、鹼可溶性丙烯酸樹脂、鹼可溶性酚醛清漆樹脂、鹼可溶性聚醯亞胺樹脂、鹼可溶性聚醯亞胺前驅物、鹼可溶性聚苯并唑樹脂、鹼可溶性聚苯并唑前驅物、鹼可溶性聚醯胺樹脂、鹼可溶性矽氧烷樹脂。該等鹼可溶性樹脂,因為在最後成為構成上述(c)樹脂的成分之一,其中為了提高發光可靠度,較佳係可減少高溫下的排氣量(氣體產生量)者。 Examples of alkali-soluble resins include alkali-soluble cardo resins, alkali-soluble acrylic resins, alkali-soluble novolac resins, alkali-soluble polyimide resins, alkali-soluble polyimide precursors, alkali-soluble polyimide Benzo Azole resin, alkali soluble polybenzo Azole precursors, alkali-soluble polyamide resins, alkali-soluble silicone resins. These alkali-soluble resins become one of the components constituting the above (c) resin at the end, and among them, those that can reduce the outgassing amount (gas generation amount) at high temperature are preferable in order to improve the reliability of light emission.
用以使像素分割層及/或平坦化層形成圖案的感光性組成物具有負型感光性的情況中,作為鹼可溶性樹脂,從兼具圖案加工性與發光可靠度之觀點而言,較佳為含有鹼可溶性卡多樹脂及/或鹼可溶性聚醯亞胺樹脂。再者,為了提高發光可靠度,更佳係至少含有鹼 可溶性聚醯亞胺樹脂。併用鹼可溶性卡多樹脂與鹼可溶性聚醯亞胺樹脂的情況,從發光可靠度與分散穩定性之觀點而言,鹼可溶性聚醯亞胺樹脂的含量較佳係超過鹼可溶性卡多樹脂的含量。 In the case where the photosensitive composition for patterning the pixel dividing layer and/or the planarizing layer has negative photosensitivity, the alkali-soluble resin is preferable from the viewpoint of both pattern processability and light emission reliability. It contains alkali-soluble cardo resin and/or alkali-soluble polyimide resin. Furthermore, in order to improve the reliability of light emission, it is more preferable to contain at least an alkali-soluble polyimide resin. When alkali-soluble cardo resin and alkali-soluble polyimide resin are used together, the content of alkali-soluble polyimide resin is preferably higher than the content of alkali-soluble cardo resin from the viewpoint of luminescence reliability and dispersion stability .
另一方面,用於使像素分割層及/或平坦化層形成圖案的感光性組成物具有正型感光性之情況,從兼具圖案加工性與發光可靠度之觀點而言,較佳係含有選自鹼可溶性聚醯亞胺樹脂、鹼可溶性聚醯亞胺前驅物、鹼可溶性聚苯并唑樹脂、鹼可溶性聚苯并唑前驅物、鹼可溶性矽氧烷樹脂中的至少1種的鹼可溶性樹脂。再者,從提升後述曝光步驟中的曝光感度與發光可靠度之觀點而言,更佳為含有鹼可溶性聚醯亞胺樹脂及/或鹼可溶性聚醯亞胺前驅物。 On the other hand, when the photosensitive composition for patterning the pixel dividing layer and/or the planarizing layer has positive photosensitivity, it is preferable to contain Alkali-soluble polyimide resin, alkali-soluble polyimide precursor, alkali-soluble polybenzo Azole resin, alkali soluble polybenzo An alkali-soluble resin of at least one of an azole precursor and an alkali-soluble silicone resin. Furthermore, from the viewpoint of improving exposure sensitivity and light emission reliability in the exposure step described later, it is more preferable to contain an alkali-soluble polyimide resin and/or an alkali-soluble polyimide precursor.
鹼可溶性卡多樹脂係指具有卡多骨架的鹼可溶性樹脂,而卡多骨架則係指構成環狀結構之環碳原子的4級碳原子上以單鍵連接有2個芳香族基的骨架。 Alkali-soluble cardo resin refers to the alkali-soluble resin with a cardo skeleton, and the cardo skeleton refers to a skeleton with two aromatic groups connected by a single bond to the 4th carbon atom of the ring carbon atom constituting the ring structure.
作為鹼可溶性卡多樹脂的較佳具體例,可舉出具有茀骨架且具有以下述通式(28)表示之結構單元與自由基聚合性基的鹼可溶性卡多樹脂、具有1-苯基-2,3-二氫-1H-茚骨架且具有以下述通式(29)表示之結構單元與自由基聚合性基的鹼可溶性卡多樹脂、具有N-苯基酚酞骨架且具有以下述通式(30)表示之結構單元與自由基聚合性基的鹼可溶性卡多樹脂。 As a preferred specific example of alkali-soluble cardo resin, alkali-soluble cardo resin having a fennel skeleton and having a structural unit represented by the following general formula (28) and a free radical polymerizable group, having a 1-phenyl- Alkali-soluble cardo resin having a 2,3-dihydro-1H-indene skeleton and a structural unit represented by the following general formula (29) and a radically polymerizable group, having an N-phenylphenolphthalein skeleton and having the following general formula An alkali-soluble cardo resin having a structural unit represented by (30) and a radically polymerizable group.
上述通式(28)、(29)及(30)中,Q1~Q8分別可相同亦可不同,其表示與苯環直接鍵結的取代基,其係碳數1~6的烷基或是碳數1~6的烷氧基,a~h為整數,其為1或2。 In the above general formulas (28), (29) and (30), Q 1 ~ Q 8 can be the same or different respectively, which represent substituents directly bonded to the benzene ring, which are alkyl groups with 1 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms, a to h is an integer, which is 1 or 2.
為了提高顯影性,鹼可溶性卡多樹脂的酸價較佳為10mgKOH/g以上,更佳為50mgKOH/g以上。另一方面,為了抑制像素分割層及/或平坦化層的圖案邊緣剝離,較佳為300mgKOH/g以下,更佳為250mgKOH/g以下。 In order to improve developability, the acid value of the alkali-soluble cardo resin is preferably at least 10 mgKOH/g, more preferably at least 50 mgKOH/g. On the other hand, in order to suppress pattern edge peeling of the pixel dividing layer and/or the planarization layer, it is preferably 300 mgKOH/g or less, more preferably 250 mgKOH/g or less.
鹼可溶性卡多樹脂的重量平均分子量,從抑制圖案邊緣剝離之觀點而言,較佳為2,000以上,更佳為3,000以上。另一方面,從抑制鹼可溶性卡多樹脂在聚合時膠化之觀點而言,較佳為50,000以下,更佳為30,000以下。 The weight average molecular weight of the alkali-soluble cardo resin is preferably 2,000 or more, more preferably 3,000 or more, from the viewpoint of suppressing pattern edge peeling. On the other hand, it is preferably 50,000 or less, more preferably 30,000 or less, from the viewpoint of suppressing gelling of the alkali-soluble cardo resin during polymerization.
又,亦可使用市售品作為鹼可溶性卡多樹脂,其可舉出例如,「ADEKA ARKLS」(註冊商標)WR-301(ADEKA(股)製)、「OGSOL」(註冊商標)CR-TR1、CR-TR2、CR-TR3、CR-TR4、CR-TR5、CR-TR6(以上皆為Osaka Gas Chemicals(股)製)。 In addition, commercially available products can also be used as the alkali-soluble cardo resin, for example, "ADEKA ARKLS" (registered trademark) WR-301 (manufactured by ADEKA Co., Ltd.), "OGSOL" (registered trademark) CR-TR1 , CR-TR2, CR-TR3, CR-TR4, CR-TR5, CR-TR6 (the above are all manufactured by Osaka Gas Chemicals).
作為鹼可溶性聚醯亞胺樹脂,較佳係含有具有以下述通式(31)表示之結構單元的鹼可溶性聚醯亞胺樹脂。 As the alkali-soluble polyimide resin, an alkali-soluble polyimide resin containing a structural unit represented by the following general formula (31) is preferable.
上述通式(31)中,R21表示4~10價的有機基。R22表示2~8價的有機基。R23及R24各自獨立,表示酚性羥基、磺酸基或是硫醇基。i及j各自獨立,表示0~6的範圍。 In the above general formula (31), R 21 represents a 4-10 valent organic group. R 22 represents a 2-8 valent organic group. R 23 and R 24 each independently represent a phenolic hydroxyl group, a sulfonic acid group, or a thiol group. i and j are each independent, and represent the range of 0-6.
通式(31)中,R21-(R23)i表示酸二酐之殘基。R21較佳係具有芳香族環或是環狀脂肪族基的碳原子數5~40的有機基。 In the general formula (31), R 21 -(R 23 ) i represents a residue of an acid dianhydride. R 21 is preferably an organic group having 5 to 40 carbon atoms having an aromatic ring or a cycloaliphatic group.
作為酸二酐,可舉出例如,均苯四甲酸二酐、3,3’,4,4’-聯苯四羧酸二酐、3,3’,4,4’-二苯甲酮四羧酸二酐、雙(3,4-二羧基苯基)碸二酐、雙(3,4-二羧基苯基)醚二酐、2,2-雙(3,4-二羧基苯基)六氟丙烷二酐等的具有芳香族環的四羧酸二酐、丁烷四羧酸二酐等的具有脂肪族基的四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐、雙環[2.2.2]辛-7-烯-四羧酸二酐、雙環[2.2.2]辛烷四羧酸二酐等的具有環狀脂肪族基的四羧酸二酐。 Examples of the acid dianhydride include pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-benzophenone tetra Carboxylic acid dianhydride, bis(3,4-dicarboxyphenyl) anhydride, bis(3,4-dicarboxyphenyl) ether dianhydride, 2,2-bis(3,4-dicarboxyphenyl) Tetracarboxylic dianhydrides having an aromatic ring such as hexafluoropropane dianhydride, tetracarboxylic dianhydrides having an aliphatic group such as butane tetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetra Tetracarboxylic dianhydrides having cyclic aliphatic groups such as carboxylic dianhydride, bicyclo[2.2.2]oct-7-ene-tetracarboxylic dianhydride, bicyclo[2.2.2]octanetetracarboxylic dianhydride, etc. .
通式(31)中,R22-(R24)j表示二胺之殘基。R22較佳為具有芳香族環或是環狀脂肪族基的碳原子數5~40的有機基。 In the general formula (31), R 22 -(R 24 ) j represents a diamine residue. R22 is preferably an organic group having 5 to 40 carbon atoms having an aromatic ring or a cycloaliphatic group.
二胺,可舉出例如,間苯二胺、對苯二胺、1,4-雙(4-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、1,3-雙(3-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(4-胺基苯氧基)苯基]丙烷、雙[4-(4-胺基苯氧基)苯基]六氟丙烷、雙[4-(3-胺基苯氧基)苯基]碸、9,9-雙(4-胺基苯基)茀、二胺基二苯醚、二胺基二苯碸、二胺基二苯基甲烷、二胺基二苯基丙烷、二胺基二苯基六氟丙烷、二胺基二苯硫醚、聯苯胺、2,2-雙三氟聯苯胺等的具有芳香族環的二胺、2,5-雙(胺基甲基)雙環[2.2.1]庚烷、2,6-雙(胺基甲基)雙環[2.2.1]庚烷等的具有環狀脂肪族基的二胺。 Diamines include, for example, m-phenylenediamine, p-phenylenediamine, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, bis[4-(4-aminophenoxy)phenyl]pyridine, bis[4-(4-aminophenoxy)phenyl] Propane, bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, bis[4-(3-aminophenoxy)phenyl]pyridine, 9,9-bis(4-amino Phenyl) terpene, diaminodiphenyl ether, diaminodiphenylmethane, diaminodiphenylmethane, diaminodiphenylpropane, diaminodiphenylhexafluoropropane, diaminodiphenyl Diamines with aromatic rings such as sulfide, benzidine, 2,2-bistrifluorobenzidine, 2,5-bis(aminomethyl)bicyclo[2.2.1]heptane, 2,6-bis Diamines having a cyclic aliphatic group such as (aminomethyl)bicyclo[2.2.1]heptane.
具有以通式(31)表示之結構單元的鹼可溶性聚醯亞胺樹脂,較佳係在主鏈末端具有羧基、酚性羥基、磺酸基及/或硫醇基。藉由使用具有羧基、酚性羥基、磺酸基及/或硫醇基的封端劑將聚醯亞胺樹脂的末端封閉,可將該等基團導入主鏈末端。作為封端劑,可舉出例如,單胺、酸酐、單羧酸、單酸氯化物、或單活性酯化物。 The alkali-soluble polyimide resin having a structural unit represented by the general formula (31) preferably has a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and/or a thiol group at the end of the main chain. By blocking the end of the polyimide resin with an end-capping agent having a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group, and/or a thiol group, these groups can be introduced into the main chain end. Examples of the blocking agent include monoamines, acid anhydrides, monocarboxylic acids, monoacid chlorides, and monoactive esters.
鹼可溶性聚醯亞胺樹脂的酸價,從顯影性之觀點而言,較佳為10mgKOH/g以上,更佳為50mgKOH/g以上。另一方面,從抑制像素分割層及/或平坦化層的圖案邊緣剝離之觀點而言,酸價更佳為300mgKOH/g以下。The acid value of the alkali-soluble polyimide resin is preferably at least 10 mgKOH/g, more preferably at least 50 mgKOH/g, from the viewpoint of developability. On the other hand, the acid value is more preferably 300 mgKOH/g or less from the viewpoint of suppressing pattern edge peeling of the pixel dividing layer and/or the planarizing layer.
鹼可溶性聚醯亞胺樹脂的重量平均分子量,從像素分割層及/或平坦化層的硬度之觀點而言,較佳為5,000以上,更佳為10,000以上。另一方面,從對於鹼顯影液的溶解性之觀點而言,較佳為100,000以下,更佳為70,000以下。 The weight average molecular weight of the alkali-soluble polyimide resin is preferably 5,000 or more, more preferably 10,000 or more, from the viewpoint of the hardness of the pixel dividing layer and/or the planarization layer. On the other hand, it is preferably 100,000 or less, and more preferably 70,000 or less from the viewpoint of solubility with respect to an alkali developing solution.
上述特定結構的苝系色素衍生物為分子內具有芳香族環與醯亞胺環的有機色素衍生物,其與分子內具有芳香族環與醯亞胺環之樹脂的親和性高,藉由在分子內具有芳香族環與醯亞胺環的鹼可溶性聚醯亞胺樹脂的共存下進行後述濕式媒介分散處理,可提高特定結構之苝系色素衍生物對於(a)具有含氮雜環結構之黑色材的分散能。亦即,更具體而言,較佳係在後述顏料分散液的製造中使用上述通式(31)之中R21與R22中至少任一者為具有芳香族環之基團的鹼可溶性聚醯亞胺樹脂,即使特定結構的苝系色素衍生物的添加量少,亦可得到高分散穩定化的效果。又,特定結構的苝系色素衍生物,在最後所得之像素分割層及/或平坦化層的膜中,因為與包含分子內具有芳香族環與醯亞胺環之鹼可溶性聚醯亞胺樹脂硬化物(c)樹脂具有高親和性而以無偏移地均勻分散之狀態填充於其中,因此可進一步提升發光可靠度。 The perylene pigment derivatives with the above-mentioned specific structure are organic pigment derivatives having an aromatic ring and an imide ring in the molecule, and have high affinity with resins having an aromatic ring and an imide ring in the molecule. Coexistence of an alkali-soluble polyimide resin having an aromatic ring and an imide ring in the molecule and carrying out the wet medium dispersion treatment described later can improve the perylene-based pigment derivative with a specific structure for (a) having a nitrogen-containing heterocyclic structure The dispersion energy of the black material. That is, more specifically, it is preferable to use an alkali-soluble polymer in which at least one of R 21 and R 22 in the above general formula (31) is a group having an aromatic ring in the manufacture of the pigment dispersion described later. The imide resin can obtain a high dispersion stabilization effect even if the added amount of the perylene-based dye derivative with a specific structure is small. In addition, the perylene-based pigment derivatives with a specific structure are mixed with an alkali-soluble polyimide resin having an aromatic ring and an imide ring in the molecule in the finally obtained film of the pixel division layer and/or planarization layer. The cured product (c) resin has high affinity and is filled therein in a uniformly dispersed state without shifting, so that the reliability of light emission can be further improved.
用於使本發明之有機EL顯示裝置所具備之像素分割層及/或平坦化層形成圖案的感光性組成物中,為了賦予負型或是正型之任一種感光性,較佳係含有感光劑。 In the photosensitive composition for patterning the pixel dividing layer and/or planarizing layer included in the organic EL display device of the present invention, it is preferable to contain a photosensitizer in order to impart either negative or positive photosensitivity .
將負型感光性賦予感光性組成物的情況,可使用具有2個以上之自由基聚合性基的化合物與光聚合起始劑作為感光劑。 When imparting negative photosensitivity to a photosensitive composition, a compound having two or more radically polymerizable groups and a photopolymerization initiator can be used as a photosensitizer.
藉由含有具有2個以上之自由基聚合性基的化合物與後述光聚合起始劑,可藉由曝光引起自由基聚合反應,使曝光部的膜進行光硬化而使其不溶解化,再以鹼顯影液僅溶解去除未曝光部,而可形成圖案狀的像素分割層及/或平坦化層。 By containing a compound having two or more free radical polymerizable groups and a photopolymerization initiator described later, a radical polymerization reaction can be caused by exposure, and the film of the exposed part can be photohardened to insolubilize it, and then Alkaline developing solution only dissolves and removes the unexposed part, and can form a patterned pixel division layer and/or a planarization layer.
作為自由基聚合性基,從提升曝光時的感度及提升硬化膜的硬度之觀點而言,較佳為(甲基)丙烯酸基。作為具有2個以上之(甲基)丙烯酸基的化合物,可舉出例如,二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、乙氧基化三羥甲基丙烷二(甲基)丙烯酸酯、乙氧基化三羥甲基丙烷三(甲基)丙烯酸酯、二三羥甲基丙烷三(甲基)丙烯酸酯、二三羥甲基丙烷四(甲基)丙烯酸酯、1,3-丁二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、1,10-癸二醇二(甲基)丙烯酸酯、二羥甲基-三環癸烷二(甲基)丙烯酸酯、乙氧基化甘油三(甲基)丙烯酸酯,新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、乙氧基化新戊四醇三(甲基)丙烯酸酯、乙氧基化新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸 酯、二新戊四醇六(甲基)丙烯酸酯、三新戊四醇七(甲基)丙烯酸酯、三新戊四醇八(甲基)丙烯酸酯、四新戊四醇九(甲基)丙烯酸酯、四新戊四醇十(甲基)丙烯酸酯、二新戊四醇的ε-己內酯加成(甲基)丙烯酸酯、乙氧基化雙酚A二(甲基)丙烯酸酯、2,2-雙[4-(3-(甲基)丙烯醯氧基-2-羥基丙氧基)苯基]丙烷、1,3,5-參((甲基)丙烯醯氧基乙基)異三聚氰酸、1,3-雙((甲基)丙烯醯氧基乙基)異三聚氰酸、9,9-雙[4-(2-(甲基)丙烯醯氧基乙氧基)苯基]茀、9,9-雙[4-(3-(甲基)丙烯醯氧基丙氧基)苯基]茀、9,9-雙(4-(甲基)丙烯醯氧基苯基)茀或該等的酸改質體、乙烯氧化物改質體或丙烯氧化物改質體等。可單獨含有該等化合物或含有多種該等化合物。另外,具有2個以上之自由基聚合性基的化合物的硬化物,最後作為上述(c)樹脂所含有之丙烯酸樹脂成分而填充於像素分割層及/或平坦化層的膜中。 As the radical polymerizable group, a (meth)acrylic group is preferable from the viewpoint of improving the sensitivity at the time of exposure and improving the hardness of the cured film. As a compound having two or more (meth)acrylic acid groups, for example, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di( Meth)acrylate, Propylene Glycol Di(meth)acrylate, Trimethylolpropane Di(meth)acrylate, Trimethylolpropane Tri(meth)acrylate, Ethoxylated Trimethylolpropane Di(meth)acrylate, Ethoxylated trimethylolpropane tri(meth)acrylate, Ditrimethylolpropane tri(meth)acrylate, Ditrimethylolpropane tetra(meth)acrylate Acrylates, 1,3-Butanediol Di(meth)acrylate, Neopentyl Glycol Di(meth)acrylate, 1,4-Butanediol Di(meth)acrylate, 1,6-Hexane Diol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, 1,10-decanediol di(meth)acrylate, dimethylol-tricyclodecane di (Meth)acrylates, Ethoxylated Glyceryl Tri(meth)acrylate, Neopentylthritol Tri(meth)acrylate, Neopentylthritol Tetra(meth)acrylate, Ethoxylated Neopentyl Tetrol Tri(meth)acrylate, Ethoxylated Neopentylthritol Tetra(meth)acrylate, Dineopenylthritol Penta(meth)acrylate, Dineopenylthritol Hexa(meth)acrylate Ester, Tri-Neopentylthritol Hepta(Meth)acrylate, Tri-Neopentylthritol Octa(Meth)acrylate, Tetra-Neopentylthritol Nona(Meth)acrylate, Tetra-Neopentylthritol Deca(Meth)acrylate ) acrylate, ε-caprolactone addition (meth)acrylate of diperythritol, ethoxylated bisphenol A di(meth)acrylate, 2,2-bis[4-(3- (Meth)acryloxy-2-hydroxypropoxy)phenyl]propane, 1,3,5-paraffin((meth)acryloxyethyl)isocyanuric acid, 1,3- Bis((meth)acryloyloxyethyl)isocyanuric acid, 9,9-bis[4-(2-(meth)acryloyloxyethoxy)phenyl] fluorine, 9,9 - bis[4-(3-(meth)acryloxypropoxy)phenyl] fluorene, 9,9-bis(4-(meth)acryloxy phenyl) fluorine or their acids Modified body, ethylene oxide modified body or propylene oxide modified body, etc. These compounds may be contained alone or a plurality of such compounds may be contained. In addition, the cured product of the compound having two or more radically polymerizable groups is finally filled in the film of the pixel dividing layer and/or the planarizing layer as the acrylic resin component contained in the above-mentioned (c) resin.
光聚合起始劑係指藉由曝光進行斷鍵及/或反應而產生自由基活性種的化合物,藉由自由基活性種,使具有2個以上之自由基聚合性基的化合物進行光硬化,而可形成圖案狀的像素分割層及/或平坦化層。 The photopolymerization initiator refers to a compound that generates a free radical active species by breaking bonds and/or reacting with exposure, and photocures a compound having two or more free radical polymerizable groups through the free radical active species. Instead, a patterned pixel division layer and/or a planarization layer can be formed.
作為光聚合起始劑,可舉出例如,「ADEKA OPTOMER」(註冊商標)N-1818、N-1919、「ADEKA CRUISE」(註冊商標)NCI-831(以上皆為ADEKA(股)製)等的咔唑系光聚合起始劑、2,4,6-三甲基苯甲醯基-二苯基-膦氧化物(BASF公司製「Irgacure」(註冊商標)TPO)等的醯基膦氧化物系光聚合起始劑、1,2-辛烷二 酮,1-[4-(苯基硫基)-,2-(鄰苯甲醯基肟)](BASF公司製「Irgacure」(註冊商標)OXE01)、乙酮,1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-,1-(鄰乙醯基肟)(BASF公司製「Irgacure」(註冊商標)OXE02)等的肟酯系光聚合起始劑、2-甲基-1-(4-甲基苯硫基苯基)-2-啉基丙烷-1-酮(BASF公司製「Irgacure」(註冊商標)907)、2-苄基-2-二甲胺基-1-(4-啉基苯基)-丁酮-1(BASF公司製「Irgacure」(註冊商標)369)、2-(二甲胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-啉基)苯基]-1-丁酮(BASF公司製「Irgacure」(註冊商標)379EG)等的α-胺基烷基苯酮系光聚合起始劑等。其中,從對於包含j線(波長313nm)、i線(365nm)、h線(405nm)、g線(436nm)之混合射線的曝光感度高、膜之深度方向上的深部硬化性優良之觀點而言,較佳為咔唑系光聚合起始劑、肟酯系光聚合起始劑。 Examples of photopolymerization initiators include "ADEKA OPTOMER" (registered trademark) N-1818, N-1919, "ADEKA CRUISE" (registered trademark) NCI-831 (all of which are manufactured by ADEKA Co., Ltd.), etc. Acylphosphine oxides such as carbazole-based photopolymerization initiators, 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide ("Irgacure" (registered trademark) TPO manufactured by BASF Corporation) A photopolymerization initiator, 1,2-octanedione, 1-[4-(phenylthio)-,2-(o-phthalyl oxime)] ("Irgacure" (registered Trademark) OXE01), ethyl ketone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-,1-(o-acetyloxime)( Oxime ester-based photopolymerization initiators such as "Irgacure" (registered trademark) OXE02) manufactured by BASF Corporation, 2-methyl-1-(4-methylphenylthiophenyl)-2- Linylpropan-1-one ("Irgacure" (registered trademark) 907 manufactured by BASF Corporation), 2-benzyl-2-dimethylamino-1-(4- Linylphenyl)-butanone-1 ("Irgacure" (registered trademark) 369 manufactured by BASF Corporation), 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1- [4-(4- α-aminoalkylphenone-based photopolymerization initiators such as phenyl)phenyl]-1-butanone (“Irgacure” (registered trademark) 379EG manufactured by BASF Corporation), and the like. Among them, from the viewpoint of high exposure sensitivity to mixed rays including j-line (wavelength 313nm), i-line (365nm), h-line (405nm), and g-line (436nm), and excellent deep curability in the depth direction of the film In other words, carbazole-based photopolymerization initiators and oxime ester-based photopolymerization initiators are preferred.
對感光性組成物賦予正型感光性的情況,可使用光酸產生劑作為感光劑。藉由使其含有光酸產生劑,可藉由曝光相對性地提高曝光部相對於未曝光部的鹼溶解性,再以鹼顯影液溶解去除曝光部,藉此可形成圖案狀的像素分割層及/或平坦化層。 When imparting positive photosensitivity to the photosensitive composition, a photoacid generator can be used as a photosensitizer. By containing a photoacid generator, the alkali solubility of the exposed part relative to the unexposed part can be relatively increased by exposure, and then the exposed part can be dissolved and removed with an alkali developing solution, thereby forming a patterned pixel division layer and/or a planarization layer.
作為光酸產生劑,較佳為醌二疊氮化合物。作為醌二疊氮化合物,更佳為以醌二疊氮基磺酸氯化物將具有酚性羥基之化合物酯化而得的反應物。 The photoacid generator is preferably a quinone diazide compound. The quinonediazide compound is more preferably a reactant obtained by esterifying a compound having a phenolic hydroxyl group with quinonediazidesulfonic acid chloride.
作為具有酚性羥基的化合物,可舉出Bis-Z、BisP-EZ、TekP-4HBPA、TrisP-HAP、TrisP-PA、TrisP-PHBA、BisOCHP-Z、BisP-MZ、BisP-PZ、BisP-IPZ、 BisOCP-IPZ、BisP-CP、BisRS-2P、BisRS-3P、BisP-OCHP、亞甲基參-p-CR、亞甲基四-p-CR、BisRS-26X、Bis-PEP-PC(皆為本州化學工業(股)製)、BIR-OC、BIP-PC、BIR-PC、BIR-PTBP、BIR-PCHP、BIP-BIOC-F、4PC、BIR-BIPC-F、TEP-BIP-A(皆為旭有機材工業(股)製)。 Examples of compounds having a phenolic hydroxyl group include Bis-Z, BisP-EZ, TekP-4HBPA, TrisP-HAP, TrisP-PA, TrisP-PHBA, BisOCHP-Z, BisP-MZ, BisP-PZ, BisP-IPZ , BisOCP-IPZ, BisP-CP, BisRS-2P, BisRS-3P, BisP-OCHP, methylene-p-CR, methylene tetra-p-CR, BisRS-26X, Bis-PEP-PC (both Honshu Chemical Industry Co., Ltd.), BIR-OC, BIP-PC, BIR-PC, BIR-PTBP, BIR-PCHP, BIP-BIOC-F, 4PC, BIR-BIPC-F, TEP-BIP-A ( All are manufactured by Asahi Organic Materials Co., Ltd.).
作為醌二疊氮基磺酸氯化物,可舉出4-萘醌二疊氮基磺酸氯化物、5-萘醌二疊氮基磺酸氯化物。這樣的醌二疊氮化合物,在後述曝光步驟中,對於包含j線(波長313nm)、i線(365nm)、h線(405nm)、g線(436nm)之混合射線的曝光感度高,因而較佳。 Examples of quinonediazidosulfonic acid chlorides include 4-naphthoquinonediazidosulfonic acid chlorides and 5-naphthoquinonediazidosulfonic acid chlorides. Such a quinonediazide compound has high exposure sensitivity to mixed rays including j-line (wavelength 313nm), i-line (365nm), h-line (405nm), and g-line (436nm) in the exposure step described later, and is therefore relatively good.
用以形成本發明之有機EL顯示裝置所具備之像素分割層及/或平坦化層的感光性組成物中,為了更加提高最後所得之像素分割層及/或平坦化層的耐熱性,亦可含有熱交聯劑。作為熱交聯劑,可舉出具有2個以上的烷氧基甲基及/或羥甲基的化合物,具有2個以上的環氧基的化合物。 In the photosensitive composition used to form the pixel dividing layer and/or planarizing layer of the organic EL display device of the present invention, in order to further improve the heat resistance of the finally obtained pixel dividing layer and/or planarizing layer, it is also possible to Contains thermal crosslinkers. Examples of the thermal crosslinking agent include compounds having two or more alkoxymethyl groups and/or methylol groups, and compounds having two or more epoxy groups.
作為具有2個以上的烷氧基甲基及/或羥甲基的化合物,可舉出例如,NIKALAC(註冊商標)MW-100LM、MX-270、MX-280、MX-290(Sanwa Chemical(股)製)、DML-PC(本州化學工業(股)製)。 As a compound having two or more alkoxymethyl groups and/or hydroxymethyl groups, for example, NIKALAC (registered trademark) MW-100LM, MX-270, MX-280, MX-290 (Sanwa Chemical Co., Ltd. ) system), DML-PC (Honshu Chemical Industry Co., Ltd. system).
作為具有2個以上之環氧基的化合物,可舉出例如,「EPOLIGHT」(註冊商標)40E、100E、200E、400E、70P、200P、400P、4000、3002(N)(以上皆為共榮公司化學(股)製)、「jER」(註冊商標)828、1002、1750、1007、 YX8100-BH30、E1256、E4250、E4275(以上皆為三菱化學(股)製)、「TECHMORE」(註冊商標)VG-3101L(Printeq(股)製;以下稱為「VG-3101L」)、「TEPIC」(註冊商標)S、G、P、L(以上皆為日產化學工業(股)製)。 Examples of compounds having two or more epoxy groups include "EPOLIGHT" (registered trademark) 40E, 100E, 200E, 400E, 70P, 200P, 400P, 4000, 3002(N) Corporation Chemical Co., Ltd.), "jER" (registered trademark) 828, 1002, 1750, 1007, YX8100-BH30, E1256, E4250, E4275 (the above are all manufactured by Mitsubishi Chemical Co., Ltd.), "TECHMORE" (registered trademark ) VG-3101L (manufactured by Printeq Co., Ltd.; hereinafter referred to as "VG-3101L"), "TEPIC" (registered trademark) S, G, P, L (the above are all manufactured by Nissan Chemical Industry Co., Ltd.).
用以形成本發明之有機EL顯示裝置所具備之像素分割層及/或平坦化層的感光性組成物中含有溶劑亦無妨。藉由含有溶劑,可調整感光性組成物的黏度、塗布性。 A solvent may be contained in the photosensitive composition for forming the pixel dividing layer and/or the planarization layer included in the organic EL display device of the present invention. By containing a solvent, the viscosity and applicability of a photosensitive composition can be adjusted.
作為溶劑,可舉出例如,醚類、乙酸酯類、酯類、酮類、芳香族烴類、醇類等,該等可單獨使用或混合多種使用。其中,從分散穩定性優良、可提升膜厚均勻性的觀點而言,較佳為乙酸酯類、醚類。其中,較佳可舉出丙二醇單甲醚乙酸酯(以下稱為「PGMEA」)、3-甲氧基丁基乙酸酯(以下稱為「MBA」)、丙二醇單甲醚。 Examples of the solvent include ethers, acetates, esters, ketones, aromatic hydrocarbons, alcohols, and the like, and these may be used alone or in combination. Among these, acetates and ethers are preferable from the viewpoint of being excellent in dispersion stability and improving the uniformity of film thickness. Among them, propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), 3-methoxybutyl acetate (hereinafter referred to as "MBA"), and propylene glycol monomethyl ether are preferably mentioned.
作為調製用以形成本發明之有機EL顯示裝置所具備之像素分割層及/或平坦化層的感光性組成物的方法,例如,可透過將(a)具有含氮雜環結構的黑色材、(b-1)非聚合物型分散劑、(b-2)聚合物型分散劑與溶劑混合,藉由濕式媒介分散處理使(a)具有含氮雜環結構的黑色材微細化以製作顏料分散液,接著將感光劑及其他成分添加至該顏料分散液中並且攪拌,因應需求進行過濾而調製。 As a method of preparing the photosensitive composition for forming the pixel division layer and/or planarization layer of the organic EL display device of the present invention, for example, by (a) a black material having a nitrogen-containing heterocyclic structure, (b-1) non-polymer dispersant, (b-2) polymer dispersant and solvent are mixed, and the (a) black material with nitrogen-containing heterocyclic structure is miniaturized by wet medium dispersion treatment to produce The pigment dispersion liquid is prepared by adding photosensitizer and other components into the pigment dispersion liquid, stirring, and filtering as required.
另外,若單純僅對於以濕式媒介分散處理所得之顏料分散液,將上述特定結構的苝系色素衍生物予以後續添加並攪拌,並無法得到充分的作用效果,藉由以上述溶劑鹽磨法等所進行的濕式粉碎處理或是濕式媒介分散處理,而在與至少1色的具有含氮雜環結構之有機顏料的共存下,充分給予機械能量,藉此可呈現其作用效果。 In addition, if only for the pigment dispersion obtained by the wet medium dispersion treatment, the perylene pigment derivatives with the above-mentioned specific structure are subsequently added and stirred, and sufficient effects cannot be obtained. By using the above-mentioned solvent salt grinding method The wet pulverization treatment or wet medium dispersion treatment performed by etc., in the coexistence of at least one color of organic pigment with a nitrogen-containing heterocyclic structure, fully imparts mechanical energy, thereby showing its effect.
作為用以進行濕式媒介分散處理的分散機,可舉出橫型或縱型珠磨機、輥研磨機等。可舉出例如,「DYNO-MILL」(註冊商標)(Willy A.Bachofen公司製)、「SPIKE MILL」(註冊商標)(井上製作所(股)製)、「砂磨機」(註冊商標)(DUPONT公司製)。作為分散機用的媒介,可舉出二氧化鋯珠、鋯石珠或無鹼玻璃珠,為了避免媒介本身的破裂或磨損造成汙染而導致發光可靠度降低,較佳係使用不含金屬或金屬離子等成為雜質源之成分的珠子。又,珠子的直徑較佳為0.03~5mm,球度越高越好。作為較佳市售品的具體例,可舉出「TORAYCERAM」(註冊商標)(TORAY(股)製)。分散機的運轉條件,只要考量珠硬度、操作性、生產性等適當設定而使後述顏料的平均分散粒徑、黏度成為預期的範圍即可。 Examples of the dispersing machine for carrying out the wet medium dispersion treatment include horizontal or vertical bead mills, roll mills, and the like. Examples include "DYNO-MILL" (registered trademark) (manufactured by Willy A. Bachofen), "SPIKE MILL" (registered trademark) (manufactured by Inoue Seisakusho Co., Ltd.), "sand mill" (registered trademark) ( DUPONT Corporation). As the medium for the disperser, zirconia beads, zircon beads or non-alkali glass beads can be mentioned. In order to avoid the medium itself being broken or worn to cause pollution and reduce the reliability of light emission, it is better to use metal-free or metal-free beads. Beads of components such as ions that become sources of impurities. Also, the diameter of the beads is preferably 0.03-5 mm, and the higher the sphericity, the better. Specific examples of preferable commercially available products include "TORAY CERAM" (registered trademark) (manufactured by TORAY Co., Ltd.). The operating conditions of the disperser may be appropriately set in consideration of bead hardness, operability, productivity, etc. so that the average dispersed particle diameter and viscosity of the pigments described later fall within the expected ranges.
包含(a)具有含氮雜環結構之黑色材的所有顏料的平均分散粒徑,從感光性組成物的塗布性與保存時的分散穩定性之觀點而言,較佳為40nm以上。另一方面,為了提升像素分割層及/或平坦化層的圖案直線 性,較佳為200nm以下。此處所指的顏料的平均分散粒徑,係指顏料分散液所含有之所有顏料粒子的二次粒徑的數量平均值,可使用粒度分布裝置測量。作為粒度分布測量裝置,可使用動態光散射法粒度分布測量裝置「SZ-100(HORIBA製)」或雷射繞射‧散射法粒度分布測量裝置「MT-3000(Microtrac製)」。 The average dispersed particle size of all the pigments including (a) the black material having a nitrogen-containing heterocyclic structure is preferably 40 nm or more from the viewpoint of coating properties of the photosensitive composition and dispersion stability during storage. On the other hand, in order to improve the pattern linearity of the pixel dividing layer and/or the planarization layer, it is preferably 200nm or less. The average dispersed particle diameter of the pigment referred to here refers to the number average of the secondary particle diameters of all the pigment particles contained in the pigment dispersion liquid, which can be measured using a particle size distribution device. As a particle size distribution measuring device, a dynamic light scattering method particle size distribution measuring device "SZ-100 (manufactured by HORIBA)" or a laser diffraction and scattering method particle size distribution measuring device "MT-3000 (manufactured by Microtrac)" can be used.
接著說明本發明之有機EL顯示裝置所具備之像素分割層及平坦化層之形成方法。 Next, the method of forming the pixel dividing layer and the planarization layer included in the organic EL display device of the present invention will be described.
像素分割層及平坦化層,例如可藉由依序包含塗布步驟、預烘烤步驟、曝光步驟、顯影步驟、硬化步驟的方法而得。 The pixel division layer and the planarization layer can be obtained, for example, by a method sequentially including a coating step, a prebaking step, an exposure step, a developing step, and a curing step.
塗布步驟中,將感光性組成物塗布於基板,而得到塗布膜。在製造基板為例如頂部發光型的有機顯示裝置的情況中,用於塗布步驟的塗布裝置,可舉出例如狹縫塗布機、旋轉塗布機、凹版塗布機、浸漬式塗布機、淋幕式塗布機、輥塗布機、噴霧塗布機、網版印刷機、噴墨。像素分割層及平坦化層在構件構成上,通常形成0.5~3μm左右的厚度,從適用於薄膜塗布、不易發生塗布缺陷且膜厚均勻性與生產性優良的觀點而言,較佳為狹縫塗布機或是旋轉塗布機,從節省液體之觀點而言,更佳為狹縫塗布機。 In the coating step, the photosensitive composition is coated on the substrate to obtain a coating film. In the case where the substrate to be manufactured is, for example, a top-emission type organic display device, the coating device used in the coating step includes, for example, a slit coater, a spin coater, a gravure coater, a dip coater, and a curtain coater. machine, roll coater, spray coater, screen printing machine, inkjet. The pixel division layer and the planarization layer are generally formed with a thickness of about 0.5 to 3 μm in the component composition, and are preferably slits from the viewpoint of being suitable for thin film coating, less likely to cause coating defects, and excellent in film thickness uniformity and productivity. A coater or a spin coater is more preferably a slit coater from the viewpoint of saving liquid.
預烘烤步驟中,以加熱使塗布膜中的溶劑揮發,藉此得到預烘烤膜。加熱裝置,可舉出例如熱風烘箱、加熱板、遠紅外線烘箱(IR烘箱)等。進行微隙(pin gap)預烘烤或接觸式預烘烤亦無妨。預烘烤溫度,較佳為 50~150℃,預烘烤時間較佳為30秒~數小時。例如,可以在80℃下預烘烤2分鐘後,再於120℃下預烘烤2分鐘等,以二段或其以上的多段進行預烘烤。為了更提升膜厚均勻性,亦可在塗布步驟之後,藉由真空/減壓乾燥機使塗布膜所含之溶劑的一部份揮發後,再以加熱進行預烘烤步驟。 In the prebaking step, the solvent in the coating film is volatilized by heating to obtain a prebaked film. As a heating device, a hot-air oven, a hot plate, a far-infrared oven (IR oven), etc. are mentioned, for example. It does not hurt to perform a pin gap prebake or a contact prebake. The pre-baking temperature is preferably 50-150°C, and the pre-baking time is preferably 30 seconds to several hours. For example, after pre-baking at 80° C. for 2 minutes, then pre-baking at 120° C. for 2 minutes, etc., the pre-baking may be performed in two or more stages. In order to further improve the uniformity of the film thickness, after the coating step, a part of the solvent contained in the coating film can be volatilized by a vacuum/reduced pressure dryer, and then the pre-baking step can be performed by heating.
曝光步驟中,從預烘烤膜的膜面側隔著光罩照射活性化學線,而得到曝光膜。作為曝光步驟中所使用的曝光裝置,可舉出步進曝光機(stepper)、鏡像投影遮罩對準曝光機(MPA)、平行光遮罩對準曝光機(PLA)等。作為曝光時照射的活性化學射線,可舉出例如,紫外線、可見光、電子束、X光、KrF(波長248nm)雷射、ArF(波長193nm)雷射等。其中,較佳為水銀燈的j線(波長313nm)、i線(波長365nm)、h線(波長405nm)或g線(波長436nm),更佳為該等的混合射線。曝光量通常為10~4000mJ/cm2左右(i線換算值)。作為遮罩,可舉出例如於玻璃、石英或膜等的在曝光波長中具有透光性之基材的單側表面上以圖案狀形成有薄膜的遮罩,該薄膜係包含鉻等的金屬或黑色有機樹脂,且具有曝光光線遮蔽性。使用感光性組成物形成像素分割層及平坦化層的過程中,可使用負型或正型之任一型的曝光遮罩,使活性化學線僅穿透開口部而進行圖案曝光,藉此得到曝光膜。另外,欲形成像素分割層或平坦化層之部位,若相當於曝光遮罩中之開口部的圖案,則將這樣的遮罩稱為負型曝光遮罩;若相當於具有曝光光線遮蔽性的薄膜,則將這樣的遮罩稱為正型曝光遮罩。 In the exposure step, active chemical rays are irradiated from the film surface side of the prebaked film through a photomask to obtain an exposed film. As an exposure apparatus used in an exposure process, a stepper, a mirror projection mask alignment exposure machine (MPA), a parallel light mask alignment exposure machine (PLA), etc. are mentioned. Examples of active chemical rays to be irradiated during exposure include ultraviolet rays, visible light, electron beams, X-rays, KrF (wavelength: 248 nm) lasers, ArF (wavelength: 193 nm) lasers, and the like. Among them, the j-line (wavelength: 313nm), i-line (wavelength: 365nm), h-line (wavelength: 405nm) or g-line (wavelength: 436nm) of the mercury lamp is preferred, and their mixed rays are more preferred. The exposure amount is usually about 10~4000mJ/cm 2 (i-line conversion value). As a mask, for example, a mask in which a thin film is formed in a pattern on one surface of a base material such as glass, quartz, or film, which is light-transmitting in the exposure wavelength, the thin film is made of a metal such as chromium. Or black organic resin, and has exposure light shielding properties. In the process of forming the pixel division layer and the planarization layer using the photosensitive composition, any type of exposure mask, either negative or positive, can be used to allow the active chemical rays to only penetrate through the openings for pattern exposure, thereby obtaining exposure film. In addition, if the part where the pixel division layer or the planarization layer is to be formed corresponds to the pattern of the opening in the exposure mask, such a mask is called a negative exposure mask; film, such a mask is called a positive exposure mask.
又,作為兼具面板構件構成中的間隔器功能的像素分割層使用的情況下,像素分割層亦可在平面上具有膜厚不同的部位,亦即階差形狀。作為得到具有膜厚不同之階差之像素分割層的方法,可舉出在曝光步驟中,透過負型或正型的半色調曝光遮罩進行圖案曝光的方法,該半色調曝光遮罩中形成有曝光光線區域之光穿透率不同的多種開口部。 In addition, when used as a pixel dividing layer that also functions as a spacer in the configuration of a panel member, the pixel dividing layer may have a portion having a different film thickness on a plane, that is, a step shape. As a method of obtaining a pixel division layer having a step difference in film thickness, in the exposure step, a method of performing pattern exposure through a negative or positive halftone exposure mask in which the There are various types of openings with different light transmittance in the area exposed to light.
顯影步驟中,感光性組成物為負型感光性組成物的情況,藉由顯影去除未曝光部而得到圖案狀的顯影膜。另一方面,正型感光性組成物的情況,藉由顯影去除曝光部而得到圖案狀的顯影膜。此處,曝光部係指隔著遮罩開口部被照射曝光光線的部位,另一方面,未曝光部則是指未被曝光光線照射到的部位。作為顯影方法,可舉出例如,以沖淋、浸漬(dipping)、浸置(puddle)等的方法使曝光膜浸漬於作為顯影液的鹼水溶液10秒~10分鐘的方法。 In the image development step, when the photosensitive composition is a negative photosensitive composition, an unexposed portion is removed by image development to obtain a patterned developed film. On the other hand, in the case of a positive photosensitive composition, an exposed portion is removed by development to obtain a patterned developed film. Here, the exposed portion refers to a portion irradiated with exposure light through the opening of the mask, while the unexposed portion refers to a portion not irradiated with exposure light. As an image development method, the method of immersing an exposure film in the alkali aqueous solution which is a developing solution for 10 seconds - 10 minutes by methods, such as shower, dipping, and immersion (puddle), is mentioned, for example.
感光性組成物為負型感光性組成物的情況下未曝光部成為圖案開口部,正型的情況下則曝光部成為圖案開口部,而在任一情況中,成為開口部的部位皆露出基底層的ITO電極。含有上述特定結構之苝系色素衍生物的感光性組成物,在抑制該顯影步驟中ITO電極上的顯影殘渣方面可發揮顯著的效果。另外,開口部最後則成為有機EL顯示裝置中的發光像素部。 When the photosensitive composition is a negative photosensitive composition, the unexposed portion becomes the pattern opening, and in the case of the positive type, the exposed portion becomes the pattern opening, and in either case, the portion that becomes the opening is exposed to the base layer. The ITO electrode. The photosensitive composition containing the perylene dye derivative of the above-mentioned specific structure exhibits a remarkable effect in suppressing the development residue on the ITO electrode in the development step. In addition, the opening part finally becomes a light-emitting pixel part in the organic EL display device.
由於在顯影後的硬化步驟中容易使顯影膜之表層或是滲透而殘留於內部的顯影液揮發,有機EL顯示 裝置的像素分割層及/或平坦化層的形成中,較佳係使用1.0~3.0重量%TMAH,通常係使用2.38重量%TMAH。2.38重量%的TMAH亦可使用市售品,或亦可將高濃度品稀釋以使用,亦可在對於發光可靠度無不良影響的範圍內微量添加非離子系界面活性劑而將其用於顯影。又,在顯影後追加以去離子水沖淋而進行的洗淨處理及/或以空氣噴射進行的排水處理亦無妨。 Since it is easy to volatilize the surface layer of the developing film or the developer remaining in the inside after penetration in the hardening step after development, it is preferable to use 1.0~ 3.0 wt% TMAH, usually 2.38 wt% TMAH is used. 2. 38% by weight of TMAH can also be used as a commercially available product, or a high-concentration product can be diluted for use, or a nonionic surfactant can be added in a small amount within the range that does not adversely affect the luminescence reliability and used for development. . In addition, after the development, there is no problem in adding washing treatment by rinsing with deionized water and/or drainage treatment by air jet.
硬化步驟中,以加熱使顯影膜進行熱硬化,同時使水分、滲透而殘留的顯影液等的成分揮發,而得到像素分割層或平坦化層。加熱裝置,可舉出例如熱風烘箱、IR烘箱等。加熱溫度較佳為230~300℃,為了得到高發光可靠度,更佳為250~300℃。加熱環境較佳為空氣或氮氣環境,加熱時的壓力較佳為大氣壓力。 In the curing step, the developing film is thermally cured by heating, and components such as moisture and permeated and remaining developing solution are volatilized to obtain a pixel dividing layer or a planarization layer. As a heating device, a hot air oven, an IR oven, etc. are mentioned, for example. The heating temperature is preferably 230~300°C, more preferably 250~300°C in order to obtain high light emission reliability. The heating environment is preferably air or nitrogen environment, and the pressure during heating is preferably atmospheric pressure.
可經由以上的各步驟形成圖案的本發明之有機EL顯示裝置所具備之像素分割層及平坦化層,其膜厚每1.0μm的光學濃度,分別較佳為0.5以上,更佳為0.8以上,再佳為1.0以上。此處所指的光學濃度,係使用光學濃度計(X-Rite公司製;X-Rite 361T)對於形成於透光性基材上的膜厚1.0μm之像素分割層或平坦化層測量入射光強度與穿透光強度,並以下式算出的值。光學濃度越高表示遮光性越高。作為透光性基材,較佳係使用透光性玻璃基材的「TEMPAX(AGC TECHNO GLASS(股)製)」。 The pixel dividing layer and the planarizing layer of the organic EL display device of the present invention that can be patterned through the above steps have an optical density of 0.5 or more, more preferably 0.8 or more, per film thickness of 1.0 μm, respectively, More preferably, it is 1.0 or more. The optical density referred to here is the intensity of incident light measured with an optical densitometer (manufactured by X-Rite Corporation; X-Rite 361T) with respect to a pixel division layer or a planarization layer with a film thickness of 1.0 μm formed on a light-transmitting substrate and the transmitted light intensity, and the value calculated by the following formula. A higher optical density indicates higher light-shielding properties. As the light-transmitting substrate, "TEMPAX (manufactured by AGC TECHNO GLASS Co., Ltd.)" using a light-transmitting glass substrate is preferable.
光學濃度=log10(I0/I) Optical density = log 10 (I 0 /I)
I0:入射光強度 I 0 : incident light intensity
I:穿透光強度 I: penetrating light intensity
為了穩定地驅動發光元件,有機EL顯示裝置的像素分割層及平坦化層的頻率1kHz中的相對介電係數分別較佳為7以下,更佳為5以下,再佳為4以下。相對介電係數,可使用Agilent Technologies公司製LCR計等的介電係數測量裝置測量。 In order to stably drive the light-emitting element, the relative permittivity of the pixel division layer and the planarization layer of the organic EL display device at a frequency of 1 kHz is preferably 7 or less, more preferably 5 or less, and still more preferably 4 or less. The relative permittivity can be measured using a permittivity measuring device such as an LCR meter manufactured by Agilent Technologies.
從可使顯示區域高精細化、提高影像或映像的顯示品質且提高作為顯示裝置之價值的觀點而言,顯示區域中的像素分割層的開口率較佳為20%以下。此處所指的開口率,係指像素分割層的開口部相對於像素分割層之面積的面積率。開口率越低則顯示區域中形成像素分割層的面積越大,因而大幅影響與像素分割層之發光可靠度相關的性能。亦即,開口率越低且具有高精細之顯示區域的有機EL顯示裝置,對於本發明之效果的貢獻就越大。 The aperture ratio of the pixel dividing layer in the display area is preferably 20% or less from the viewpoint of making the display area more precise, improving the display quality of images or images, and increasing the value as a display device. The aperture ratio referred to here refers to the area ratio of the openings of the pixel dividing layer to the area of the pixel dividing layer. The lower the aperture ratio, the larger the area where the pixel dividing layer is formed in the display region, thus greatly affecting the performance related to the light emission reliability of the pixel dividing layer. That is, an organic EL display device having a lower aperture ratio and a high-definition display region contributes more to the effect of the present invention.
以下舉出其實施例及比較例詳細說明本發明,但本發明之態樣不限於此等。 The present invention will be described in detail below with examples and comparative examples, but the aspects of the present invention are not limited thereto.
首先說明各實施例及比較例中的評價方法。 First, the evaluation methods in the respective examples and comparative examples will be described.
以濺鍍法在100mm×100mm的無鹼玻璃基板的整個表面上形成厚度10nm的銀/銅合金的薄膜(體積比10:1),並且進行蝕刻而形成圖案狀的金屬反射層。接著藉由濺鍍法在整個面上形成厚度10nm的ITO透明導電膜,得到用於評價必要最低曝光量的基板。 A silver/copper alloy thin film (volume ratio 10:1) with a thickness of 10 nm was formed on the entire surface of an alkali-free glass substrate of 100 mm×100 mm by sputtering, and etched to form a patterned metal reflective layer. Next, an ITO transparent conductive film with a thickness of 10 nm was formed on the entire surface by a sputtering method to obtain a substrate with the minimum exposure dose required for evaluation.
藉由旋轉塗布機,以使最後所得之硬化膜的厚度為1.0μm的方式調整旋轉數,將感光性組成物塗布於所得之用於評價必要最低曝光量的基板表面上,而得到塗布膜,再使用加熱板(SCW-636;Dainippon Screen Mfg.(股)製),在大氣壓下、100℃下、將塗布膜預烘烤120秒,得到預烘烤膜。使用雙面對準單面曝光裝置(光罩對準曝光機PEM-6M;UNION光學(股)製),隔著用於感度測量的灰階光罩(MDRM MODEL 4000-5-FS;Opto-Line InterNatioNal公司製),以超高壓水銀燈的j線(波長313nm)、i線(波長365nm)、h線(波長405nm)及g線(波長436nm)的混合射線來進行圖案曝光。接著,使用微影用小型顯影裝置(AD-2000;瀧澤產業(股)製),以2.38重量%TMAH水溶液進行顯影,得到顯影膜。接著,使用FPD檢查顯微鏡(MX-61L;OLYMPUS(股)製)觀察所製作之顯影膜的解析圖案,以在線寬/間距圖案(line-and-space pattern)之中圖案線寬與間距寬度形成1比1的曝光量(mJ/cm2:i線照度計的值)作為感光性組成物的必要最低曝光量(感度)。此處所指的間距寬度,係指相同圖案彼此的間隔。另外,因為是以相同的灰階遮罩對於負型感光性組成物與正型感光性組成物進行評價,因此所形成之圖案的配置相反。 With a spin coater, the number of rotations was adjusted so that the thickness of the finally obtained cured film was 1.0 μm, and the photosensitive composition was coated on the surface of the obtained substrate for evaluating the minimum exposure dose necessary to obtain a coating film. Furthermore, using a hot plate (SCW-636; manufactured by Dainippon Screen Mfg. Co., Ltd.), the coating film was prebaked at 100° C. for 120 seconds under atmospheric pressure to obtain a prebaked film. Using a double-side alignment single-side exposure device (mask alignment exposure machine PEM-6M; manufactured by UNION Optical Co., Ltd.), through a gray scale mask for sensitivity measurement (MDRM MODEL 4000-5-FS; Opto- Line InterNatioNal Co., Ltd.), pattern exposure was performed with mixed rays of j-line (wavelength: 313 nm), i-line (wavelength: 365 nm), h-line (wavelength: 405 nm) and g-line (wavelength: 436 nm) of an ultra-high pressure mercury lamp. Next, development was performed with a 2.38% by weight TMAH aqueous solution using a small-sized developing device for lithography (AD-2000; manufactured by Takizawa Sangyo Co., Ltd.), to obtain a developed film. Next, observe the analytical pattern of the developed film produced using an FPD inspection microscope (MX-61L; manufactured by OLYMPUS Co., Ltd.), and form the line width and space width of the pattern in the line width/space pattern (line-and-space pattern) The exposure amount of 1:1 (mJ/cm 2 : the value of the i-ray illuminance meter) was used as the minimum exposure amount (sensitivity) necessary for the photosensitive composition. The pitch width referred to here refers to the interval between identical patterns. In addition, since the negative photosensitive composition and the positive photosensitive composition were evaluated with the same gradation mask, the arrangement of the formed patterns was reversed.
將實施例1~22及比較例1~33所得之感光性組成物在調製後1小時以內密封20.0g於玻璃瓶內,在大氣壓 下/遮光下/實際溫度25℃±1℃的恆溫箱內靜置24小時以進行保存。採取保存後的感光性組成物1.0g,將其滴於E型黏度計(錐板型黏度計)的實際溫度25℃的載台上,在旋轉數50rpm的條件下施予剪切力,將3分鐘後顯示的黏度作為初期黏度(mPa‧s)。在相同的保存環境下,繼續將感光性組成物在25℃±1℃下靜置29天以長期保存之後,以刮勺確認玻璃瓶底是否有沉澱物,在振盪機上攪拌1分鐘後,再以相同的方法測量其黏度,將其作為經時黏度(mPa‧s),以下式求得增黏率(%)。增黏率(%)的絕對值越小則穩定性越優良,根據以下的判定基準評價分散穩定性,將AA及A~C作為合格,將D~F作為不合格。其中,保存後產生沉澱物的情況下,無論增黏率為何,皆評價為E。又,感光性組成物的初期黏度或經時黏度的任一項超過100(mPa‧s)的情況,在相同黏度測量條件下皆難以進行比較評價,因此無論有無沉澱物或無論其增黏率,皆評價為F。 Seal 20.0 g of the photosensitive composition obtained in Examples 1-22 and Comparative Examples 1-33 within 1 hour after preparation in a glass bottle, and place it in an incubator under atmospheric pressure/light shielding/actual temperature 25°C±1°C Let stand for 24 hours to preserve. Take 1.0 g of the preserved photosensitive composition, drop it on the stage of an E-type viscometer (cone-plate viscometer) at an actual temperature of 25° C., and apply a shearing force under the condition of a rotation speed of 50 rpm. The viscosity displayed after 3 minutes was taken as the initial viscosity (mPa‧s). Under the same storage environment, continue to store the photosensitive composition at 25°C±1°C for 29 days for long-term storage, use a spatula to confirm whether there is any sediment at the bottom of the glass bottle, and stir it on the shaker for 1 minute. Then measure the viscosity in the same way, and use it as the time-lapse viscosity (mPa‧s), and obtain the viscosity increase rate (%) from the following formula. The smaller the absolute value of the viscosity increase rate (%), the better the stability. The dispersion stability was evaluated according to the following criteria, and AA and A to C were regarded as acceptable, and D to F were regarded as unacceptable. However, in the case where a precipitate was generated after storage, it was evaluated as E regardless of the viscosity increase rate. In addition, when either the initial viscosity or the time-lapse viscosity of the photosensitive composition exceeds 100 (mPa‧s), it is difficult to make a comparative evaluation under the same viscosity measurement conditions. , all evaluated as F.
增黏率(%)=(經時黏度-初期黏度)/初期黏度×100 Viscosity increase rate (%)=(time-lapse viscosity-initial viscosity)/initial viscosity×100
另外,增黏率為正值的情況表示高黏度化,負值的情況表示低黏度化,而在實施例1~22及比較例1~33中,關於評價為A~D者,增黏率皆未顯示負值。 In addition, when the viscosity increase ratio is positive, it indicates a high viscosity, and when it is negative, it indicates a low viscosity. However, in Examples 1 to 22 and Comparative Examples 1 to 33, for those evaluated as A to D, the viscosity increase rate None showed negative values.
AA:小於5% AA: less than 5%
A:5%以上、小於10% A: More than 5% and less than 10%
B:10%以上、小於25% B: More than 10% and less than 25%
C:25%以上、小於50% C: More than 25% and less than 50%
D:50%以上 D: more than 50%
E:產生沉澱物 E: produce sediment
F:黏度過高,在相同黏度測量條件下無法評價。 F: The viscosity is too high to be evaluated under the same viscosity measurement conditions.
針對實施例1~22及比較例1~33所得到的在TEMPAX的表面上具備硬化膜之遮光性評價用基板,使用光學濃度計(X-Rite公司製;X-Rite 361T),從膜面側於平面上3處測量光學濃度(OD值),將其平均值的小數點第二位四捨五入,求得小數點第一位為止的數值。將該數值除以硬化膜的厚度(μm),藉此算出硬化膜厚度每1.0μm的OD值(OD/μm),根據OD值越高則為遮光性越優良的硬化膜這樣的判定基準進行評價。另外測量未形成硬化膜之TEMPAX本身的基板既有的OD值,結果為0.00,因此將遮光性評價用基板的OD值視為硬化膜的OD值。另外,硬化膜的厚度,係使用觸針式膜厚測量裝置(東京精密(股);SURFCOM),在平面上測量3處,將其平均值的小數點第二位四捨五入,求得小數點第一位為止的數值。 For the light-shielding evaluation substrates having a cured film on the surface of TEMPAX obtained in Examples 1 to 22 and Comparative Examples 1 to 33, an optical densitometer (manufactured by X-Rite Corporation; X-Rite 361T) was used to measure from the film surface The optical density (OD value) was measured at 3 places on the side of the plane, and the second decimal place of the average value was rounded off to obtain the value up to the first decimal place. Divide this value by the thickness (μm) of the cured film to calculate the OD value (OD/μm) per 1.0 μm of the thickness of the cured film. The higher the OD value, the better the light-shielding cured film. Evaluation. In addition, the OD value of the substrate of TEMPAX itself without the formation of the cured film was measured, and the result was 0.00, so the OD value of the substrate for light-shielding property evaluation was regarded as the OD value of the cured film. In addition, the thickness of the cured film was measured at 3 places on a plane using a stylus-type film thickness measuring device (Tokyo Precision Co., Ltd.; SURFCOM), and the second decimal place of the average value was rounded to obtain the first decimal place. Numerical value up to one digit.
使用光學顯微鏡,以倍率50倍,將位於實施例1~22及比較例1~33所得之像素分割層形成基板之中央部的開口部放大10處以進行觀察,計算各開口部中,長徑0.1μm以上、小於3.0μm的顯影殘渣的個數。從開口部每1處中觀察到的顯影殘渣之平均個數,根據以下的判 定基準進行評價,將AA及A~C作為合格,將D~E作為不合格。然而,觀察到長徑超過3.0μm之殘渣的情況,則無論殘渣的平均個數為何,皆評價為E。 Using an optical microscope, with a magnification of 50 times, the openings located in the center of the pixel division layer forming substrates obtained in Examples 1 to 22 and Comparative Examples 1 to 33 were magnified at 10 places for observation, and the major diameter of each opening was calculated to be 0.1. The number of development residues of more than μm and less than 3.0 μm. The average number of development residues observed per opening was evaluated according to the following criteria, with AA and A to C as pass, and D to E as fail. However, when residues with a long diameter exceeding 3.0 μm were observed, the evaluation was E regardless of the average number of residues.
AA:完全未觀察到顯影殘渣 AA: Development residue is not observed at all
A:觀察到小於5個的顯影殘渣 A: Less than 5 development residues are observed
B:觀察到5個以上、小於10個的顯影殘渣 B: 5 or more and less than 10 development residues observed
C:觀察到10個以上、小於15個的顯影殘渣 C: 10 or more and less than 15 development residues are observed
D:觀察到15個以上的顯影殘渣 D: 15 or more development residues are observed
E:觀察到長徑超過3.0μm的顯影殘渣。 E: A development residue with a major diameter exceeding 3.0 μm is observed.
以發光面向上的方式將實施例1~22及比較例1~33所得之有機EL顯示裝置放置於加熱至80℃的加熱板上,以10mA/cm2直流驅動使其發光,在這樣的狀態下靜置,並於1小時後及500小時後測量發光部相對於發光像素之面積的面積率(像素發光面積率)。以1小時後的像素發光面積率作為基準,可維持越高的像素發光面積率,則越不易發生像素收縮,其發光可靠度越優良,根據以下的判定基準進行評價,將A~C作為合格,將D~F作為不合格。另外,在剛開始驅動的時間點,像素內黑點過多而難以正當評價像素發光面積率的情況,則評價為E。又,在剛開始驅動的時間點,具有1處以上未點燈之發光像素部的情況,則評價為F。 Place the organic EL display devices obtained in Examples 1 to 22 and Comparative Examples 1 to 33 on a heating plate heated to 80°C with the light-emitting surface upward, and drive them to emit light with a direct current of 10 mA/cm 2 . After standing still, the area ratio of the light-emitting portion to the area of the light-emitting pixel (pixel light-emitting area ratio) was measured after 1 hour and 500 hours. Taking the pixel luminous area ratio after 1 hour as a benchmark, the higher the pixel luminous area ratio can be maintained, the less prone to pixel shrinkage, and the better the luminous reliability. Evaluate according to the following criteria, and take A~C as pass , taking D~F as unqualified. Also, if there are too many black dots in the pixel and it is difficult to properly evaluate the light emitting area ratio of the pixel immediately after the driving is started, the evaluation is E. Also, when there is one or more unlit light-emitting pixel units immediately after the drive is started, the evaluation is F.
AA:95%以上 AA: more than 95%
A:90%以上、小於95% A: More than 90% and less than 95%
B:85%以上、小於90% B: More than 85% and less than 90%
C:80%以上、小於85% C: More than 80% and less than 85%
D:小於80% D: less than 80%
E:黑點過多,難以進行正當評價 E: There are too many black spots, it is difficult to make a proper evaluation
F:在剛驅動的時間點即有1處以上完全未點燈(像素發光面積率0%)的發光像素部,難以進行正當評價。 F: Immediately after driving, there is one or more light-emitting pixel portions that are not lit at all (the pixel light-emitting area ratio is 0%), and it is difficult to make a proper evaluation.
針對實施例1~22及比較例1~33所得到之像素開口率為18%的具備像素分割層及平坦化層的有機EL顯示裝置,以10mA/cm2的直流驅動使從開始驅動2小時後的時間點下的有機EL顯示裝置發光,以倍率50倍將形成於縱16mm/橫16mm之區域內的像素部之中位於中央部之10處像素部放大顯示,以進行觀察,計算在各開口部中的長徑0.1μm以上、小於15.0μm的局部未發光部位的個數。從開口部每1處觀察到的局部未發光部位之平均個數,根據以下的判定基準進行評價,將AA及A~C作為合格,將D~E作為不合格。然而,觀察到長徑超過15.0μm之黑點的情況,則無論黑點的平均個數為何,皆評價為E。 For the organic EL display device with a pixel dividing layer and a planarization layer having a pixel aperture ratio of 18% obtained in Examples 1 to 22 and Comparative Examples 1 to 33, drive it for 2 hours from the start with a DC drive of 10 mA/cm 2 The organic EL display device at a later point in time emits light, and magnifies and displays 10 pixel parts located in the center among the pixel parts formed in the area of 16 mm in length and 16 mm in width at a magnification of 50 times for observation, and calculates the The number of partially non-luminous parts with a major axis of 0.1 μm or more and less than 15.0 μm in the opening. The average number of local non-luminous parts observed per opening is evaluated according to the following criteria, AA and A~C are regarded as pass, and D~E are regarded as fail. However, when black spots with a major diameter exceeding 15.0 μm were observed, the evaluation was E regardless of the average number of black spots.
AA:完全未觀察到黑點 AA: Black spots are not observed at all
A:觀察到小於5個的黑點 A: Less than 5 black spots are observed
B:觀察到5個以上、小於10個的黑點 B: More than 5 and less than 10 black spots are observed
C:觀察到10個以上、小於15個的黑點 C: More than 10 and less than 15 black spots are observed
D:觀察到15個以上的黑點 D: 15 or more black spots are observed
E:觀察到長徑超過15.0μm的黑點 E: Black spots with a long diameter exceeding 15.0 μm are observed
F:有1處以上的完全未點燈(像素發光面積率0%)的發光像素部,難以正當評價 F: There is one or more light-emitting pixel parts that are not lit at all (the pixel light-emitting area ratio is 0%), and it is difficult to evaluate properly
在乾燥氮氣流下,將150.15g的2,2-雙(3-胺基-4-羥基苯基)六氟丙烷(0.41mol)、6.20g的1,3-雙(3-胺基丙基)四甲基二矽氧烷(0.02mol)、及作為封端劑的13.65g的3-胺基酚(0.13mol)溶解在作為溶劑的500.00g的N-甲基-2-吡咯啶酮(以下稱為「NMP」),並於其中加入155.10g的雙(3,4-二羧基苯基)醚二酐(0.50mol)及150.00g的NMP,於20℃下攪拌1小時,再一邊去除水一邊在180℃下攪拌4小時。反應結束後,將反應液投入10L的水,將產生之沉澱物過濾並收集,以水洗淨5次,以80℃的真空乾燥機乾燥20小時,合成具有以上述通式(31)表示之結構單元且分子內具有芳香族環與醯亞胺環、重量平均分子量(Mw)為25,000的鹼可溶性聚醯亞胺樹脂粉末,將其以固體成分成為30.00重量%的方式溶解於PGMEA,得到鹼可溶性聚醯亞胺樹脂溶液A。 Under dry nitrogen flow, 150.15g of 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane (0.41mol), 6.20g of 1,3-bis(3-aminopropyl) Tetramethyldisiloxane (0.02mol), and 13.65g of 3-aminophenol (0.13mol) as a blocking agent were dissolved in 500.00g of N-methyl-2-pyrrolidone (hereinafter called "NMP"), and 155.10 g of bis(3,4-dicarboxyphenyl) ether dianhydride (0.50 mol) and 150.00 g of NMP were added thereto, stirred at 20°C for 1 hour, and water was removed While stirring at 180° C. for 4 hours. After the reaction, the reaction solution was dropped into 10 L of water, the resulting precipitate was filtered and collected, washed 5 times with water, and dried in a vacuum dryer at 80°C for 20 hours to synthesize a compound having the formula (31) above. Alkali-soluble polyimide resin powder having an aromatic ring and an imide ring in the molecule as a structural unit and having a weight average molecular weight (Mw) of 25,000 is dissolved in PGMEA so that the solid content becomes 30.00% by weight to obtain an alkali Soluble polyimide resin solution A.
在乾燥氮氣流下,於液溫維持在100℃的185.44g的PGMEA中,花費30分鐘滴入12.91g的甲基丙烯酸(0.15mol)、55.07g的甲基丙烯酸甲酯(0.55mol)、作為具有磷酸基之乙烯屬不飽和單體的21.01g的甲基丙烯酸酸式膦醯氧基乙酯(0.10mol)、26.43g的甲基丙烯酸苄酯(0.15mol)、及8.21g的偶氮雙異丁腈的混合液,再於液溫維持在100℃的狀態下攪拌1小時,使其熱聚合反應進行後予以冷卻,合成重量平均分子量(Mw)為9500的(甲基)丙烯酸系共聚物。將其以PGMEA稀釋而使固體成分成為30.00重量%,得到聚合物型分散劑溶液B,其係具有磷酸基作為酸性吸附基的聚合物型分散劑。 Under a dry nitrogen stream, 12.91 g of methacrylic acid (0.15 mol) and 55.07 g of methyl methacrylate (0.55 mol) were added dropwise in 185.44 g of PGMEA at a liquid temperature of 100° C. over 30 minutes. 21.01 g of phosphonyloxyethyl methacrylate (0.10 mol), 26.43 g of benzyl methacrylate (0.15 mol), and 8.21 g of azobisiso The mixed solution of butyronitrile was stirred for 1 hour under the condition that the liquid temperature was maintained at 100° C. to allow the thermal polymerization to proceed and then cooled to synthesize a (meth)acrylic copolymer having a weight average molecular weight (Mw) of 9,500. This was diluted with PGMEA so that the solid content would be 30.00% by weight to obtain a polymer-type dispersant solution B which is a polymer-type dispersant having a phosphoric acid group as an acidic adsorption group.
在乾燥氮氣流下,使具有酚性羥基的化合物、即21.23g(0.05mol)的TrisP-PA(本州化學工業(股)製)、3.58g(0.125mol)的5-萘醌二疊氮基磺酸氯化物溶解於450.00g的1,4-二烷,並使其為室溫。此處,一邊使系統內維持在25~35℃,一邊滴下與50.00g的1,4-二烷混合的12.65g(0.125mol)的三乙胺。滴下後,於30℃下攪拌2小時。接著,過濾三乙胺鹽,將濾液投入水,過濾所析出之沉澱物並且回收。以真空乾燥機使該沉澱物乾燥,藉此得到以下述結構式(32)表示之、固體成分100.00重量%的醌二疊氮化合物a。 Under a stream of dry nitrogen, a compound having a phenolic hydroxyl group, namely 21.23 g (0.05 mol) of TrisP-PA (manufactured by Honshu Chemical Industry Co., Ltd.), 3.58 g (0.125 mol) of 5-naphthoquinonediazide sulfo Acid chloride dissolved in 450.00g of 1,4-bis alkanes, and allow to come to room temperature. Here, 50.00 g of 1,4-bis 12.65 g (0.125 mol) of triethylamine mixed with alkanes. After dripping, it stirred at 30 degreeC for 2 hours. Next, the triethylamine salt was filtered, the filtrate was poured into water, and the separated precipitate was filtered and recovered. The precipitate was dried with a vacuum dryer to obtain a quinonediazide compound a represented by the following structural formula (32) and having a solid content of 100.00% by weight.
以下顯示實施例及比較例中使用的各種有機色素衍生物及有機顏料的化學結構。 The chemical structures of various organic dye derivatives and organic pigments used in Examples and Comparative Examples are shown below.
「苝系色素衍生物1」:以下述結構式(33)表示之化合物(與以上述通式(1)表示之化合物相當的苝系色素衍生物) "
「苝系色素衍生物2」:以下述結構式(34)表示之化合物(與以上述通式(1)表示之化合物相當的苝系色素衍生物) "Perylene-based
「苝系色素衍生物3」:以下述結構式(35)表示之化合物(以上述通式(2)表示之化合物,R2及R3為具有取代基之芳基的苝系色素衍生物) "Perylene-based
「苝系色素衍生物4」:以下述結構式(36)表示之化合物(以上述通式(2)表示之化合物,R2及R3為甲基的苝系色素衍生物) "Perylene-based
「苝系色素衍生物5」:以下述結構式(37)表示之化合物(以上述通式(2)表示之化合物,R2及R3為具有取代基之芳基的苝系色素衍生物) "Perylene-based
「苝系色素衍生物6」:以下述結構式(38)表示之化合物(以上述通式(2)表示之化合物,R2及R3為具有取代基之芳基的苝系色素衍生物) "Perylene-based
「苝系色素衍生物7」:以下述結構式(39)表示之化合物(以上述通式(2)表示之化合物,R2及R3為甲基的苝系色素衍生物) "Perylene-based
「苝系色素衍生物8」:以下述結構式(40)表示之化合物(相當於上述通式(1)表示之化合物,其係含有末端具有N,N-二烷胺基之有機基的苝系色素衍生物) "Perylene-based
「苝系色素衍生物9」:以下述結構式(41)表示之化合物(相當於上述通式(1)表示之化合物,其係含有末端具有N,N-二烷胺基之有機基的苝系色素衍生物) "Perylene-based
「苝系色素衍生物10」:以下述結構式(42)表示之化合物(相當於以上述通式(2)表示之化合物,其係含有末端具有N,N-二烷胺基之有機基的苝系色素衍生物) "Perylene-based pigment derivative 10": a compound represented by the following structural formula (42) (corresponding to the compound represented by the above general formula (2), which contains an organic group having an N,N-dialkylamino group at the end perylene pigment derivatives)
「苝系色素衍生物11」:以下述結構式(43)表示之化合物(相當於以上述通式(2)表示之化合物,其係含有末端具有N,N-二烷胺基之有機基的苝系色素衍生物) "Perylene-based pigment derivative 11": a compound represented by the following structural formula (43) (corresponding to the compound represented by the above general formula (2), which contains an organic group with a N,N-dialkylamino group at the end perylene pigment derivatives)
「銅酞青系色素衍生物1」:以下述結構式(44)表示之化合物(分子內具有1個磺酸基的銅酞青衍生物) "Copper
「銅酞青系色素衍生物2」:以下述結構式(45)表示之化合物(分子內具有2個磺酸基的銅酞青衍生物) "Copper
「銅酞青系色素衍生物3」:以下述結構式(46)表示之化合物(分子內具有2個磺酸基的銅酞青衍生物的鋇鹽) "Copper
「銅酞青系色素衍生物4」:以下述結構式(47)表示之化合物(C.I.直接藍86) "Copper
「銅酞青系色素衍生物5」:以下述結構式(48)表示之化合物(C.I.酸性藍249) "Copper
「銅酞青系色素衍生物6」:以下述結構式(49)表示之化合物(分子內具有2個鹼性官能基的銅酞青衍生物) "Copper
「吡咯并吡咯二酮(diketopyrrolopyrrole)系色素衍生物1」:以下述結構式(50)表示之化合物 "Diketopyrrolopyrrole-based
「異吲哚啉系色素衍生物1」:以下述結構式(51)表示之化合物 "
「苝系色素衍生物12」:以下述結構式(52)表示之化合物(與以上述通式(1)或是上述通式(2)表示之化合物不相當的苝系色素衍生物) "Perylene-based dye derivative 12": a compound represented by the following structural formula (52) (a perylene-based dye derivative that does not correspond to the compound represented by the above-mentioned general formula (1) or the above-mentioned general formula (2))
「苝系色素衍生物13」:以下述結構式(53)表示之化合物(與以上述通式(1)或是上述通式(2)表示之化合物不相當的苝系色素衍生物) "Perylene-based dye derivative 13": a compound represented by the following structural formula (53) (a perylene-based dye derivative that does not correspond to the compound represented by the above-mentioned general formula (1) or the above-mentioned general formula (2))
「苝系色素衍生物14」:以下述結構式(54)表示之化合物(與以上述通式(1)或是上述通式(2)表示之化合物不相當的苝系色素衍生物) "Perylene-based dye derivative 14": a compound represented by the following structural formula (54) (a perylene-based dye derivative that does not correspond to the compound represented by the above-mentioned general formula (1) or the above-mentioned general formula (2))
「苝系色素衍生物15」:以下述結構式(55)表示之化合物(與以上述通式(1)或是上述通式(2)表示之化合物不相當的苝系色素衍生物) "Perylene-based dye derivative 15": a compound represented by the following structural formula (55) (a perylene-based dye derivative that does not correspond to the compound represented by the above-mentioned general formula (1) or the above-mentioned general formula (2))
「蒽醌系色素衍生物1」:以下述結構式(56)表示之化合物 "
「苝黑A」:3,4,9,10-苝四羧酸雙苯并咪唑;以下述結構式(57)表示之化合物與以下述結構式(58)表示之化合物的混合物(重量比例:順式異構物/反式異構物=30/70) "Perylene Black A": 3,4,9,10-perylenetetracarboxylic bisbenzimidazole; a mixture of a compound represented by the following structural formula (57) and a compound represented by the following structural formula (58) (weight ratio: cis isomer/trans isomer=30/70)
C.I.顏料黃83:分子內不具有含氮雜環結構的偶氮系有機黃色顏料 C.I. Pigment Yellow 83: Azo-based organic yellow pigment without nitrogen-containing heterocyclic structure in the molecule
C.I.顏料紫50:分子內不具有含氮雜環結構的偶氮系有機紫色顏料 C.I. Pigment Violet 50: Azo-based organic purple pigment without nitrogen-containing heterocyclic ring structure in the molecule
C.I.顏料紅224:以下述結構式(59)表示之分子內不具有含氮雜環結構的苝系有機紅色顏料 C.I. Pigment Red 224: a perylene-based organic red pigment that does not have a nitrogen-containing heterocyclic structure in the molecule represented by the following structural formula (59)
二系色素衍生物1:具有C.I.顏料紫23殘基的以下述結構式(60)表示之單磺酸衍生物與以下述結構式(61)表示之二磺酸衍生物的混合物(重量比例3:7) two Pigment derivative 1: a mixture of a monosulfonic acid derivative represented by the following structural formula (60) and a disulfonic acid derivative represented by the following structural formula (61) having a residue of CI Pigment Violet 23 (weight ratio 3: 7)
作為以上的有機色素衍生物及有機顏料分別包含的游離之離子性雜質的含量,以離子層析法確認到硫酸根離子(SO4 2-)、亞硫酸根離子(SO3 -)、氯離子(Cl-)各別的含量在50ppm以下。又,針對包含銅原子之有機色素衍生物及有機顏料,以離子層析法確認到游離銅在100ppm以下。 As the content of free ionic impurities contained in the above organic pigment derivatives and organic pigments, sulfate ion (SO 4 2- ), sulfite ion (SO 3 - ), chloride ion were confirmed by ion chromatography. The content of each (Cl − ) is 50 ppm or less. Also, for organic pigment derivatives and organic pigments containing copper atoms, it was confirmed by ion chromatography that free copper was 100 ppm or less.
將89.06g的鹼可溶性聚醯亞胺樹脂溶液A、28.13g的SOLSPERSE20000(主鏈具有聚環氧乙烷/環氧丙烷結構且主鏈末端具有3級胺基作為鹼性吸附基的直鏈狀聚醚系分散劑;固體成分100.00重量%)、作為乙酸酯系溶劑的787.66g的PGMEA以及1.41g的苝系色素衍生物1混合,並攪拌10分鐘。之後,作為(a)具有含氮雜環結構的黑色材,投入28.13g的C.I.顏料黃192(平均一次粒徑42nm)、28.13g的C.I.顏料紅179(平均一次粒徑48nm)、及37.50g的C.I.顏料藍60(平均一次粒徑61nm),攪拌30分鐘,使用填充有0.4mmφ之二氧化鋯珠(TORAY(股)製;「TORAYCERAM」(註冊商標))的珠磨機,以循環式進行濕式媒介分散處理30分鐘。接著,為了進一步促進微細化,使用填充有0.05mmφ之二氧化鋯珠(TORAY(股)製;「TORAYCERAM」(註冊商標))的珠磨機,以循環式進行濕式媒介分散處理,經過30分鐘以後,在分散處理時間每經過10分鐘就適量取樣至玻璃瓶中,並將取樣的顏料分散液設置於動態光散射法粒度分布測量裝置「SZ-100」中,測量平均分散粒徑,在取樣後30分鐘後的時間點,將在150nm±20nm之範圍內的顏料分散液作為顏料分散液1。另外,顏料分散液1的固體成分為15.00重量%。各原料的摻合量(g)顯示於表1。有機色素衍生物相對於所有顏料的含量為1.50重量%。 Alkali-soluble polyimide resin solution A of 89.06g, SOLSPERSE20000 of 28.13g (main chain has polyethylene oxide/propylene oxide structure and the end of the main chain has tertiary amine groups as basic adsorption group straight chain) A polyether-based dispersant; solid content 100.00% by weight), 787.66 g of PGMEA as an acetate-based solvent, and 1.41 g of perylene-based
分別使用苝系色素衍生物2~7代替苝系色素衍生物1,以與調製例1相同的順序調製顏料分散液2~7。各原料的摻合量(g)顯示於表1。
使用C.I.顏料紅123(平均一次粒徑57nm)代替C.I.顏料紅179,除此之外,以與調製例1相同的順序調製顏料分散液8。各原料的摻合量(g)顯示於表2。 Pigment Red 123 (average primary particle size: 57 nm) was used instead of C.I. Pigment Red 179, and
使用苝系色素衍生物4代替苝系色素衍生物1,除此之外,以與調製例8相同的順序調製顏料分散液9。各原料的摻合量(g)顯示於表2。
以使有機色素衍生物相對於所有顏料的含量增量至5.00重量%的方式使用苝系色素衍生物7代替苝系色素衍生物1,除此之外,以與調製例1相同的順序調製顏料分散液10。各原料的摻合量(g)顯示於表2。 Pigments were prepared in the same procedure as in Preparation Example 1, except that the perylene-based
使有機色素衍生物相對於顏料的含量增加為5.00重量%,並以苝系色素衍生物1/苝系色素衍生物7=重量比1/1的比例併用兩者,藉此代替苝系色素衍生物1,除此之外,以與調製例1相同的順序調製顏料分散液11。各原料的摻合量(g)顯示於表2。 Increase the content of organic pigment derivatives relative to the pigment to 5.00% by weight, and use both in combination at a ratio of perylene-based
混合78.13g的鹼可溶性聚醯亞胺樹脂溶液A、28.13g的SOLSPERSE20000、795.31g的PGMEA、及4.69g的苝系色素衍生物7,攪拌10分鐘。之後,作為(a)具有含氮雜環結構的黑色材,投入28.13g的C.I.顏料黃194(平均一次粒徑64nm)、28.13g的C.I.顏料紫29(平均 一次粒徑57nm)、37.50g的C.I.顏料藍60(平均一次粒徑61nm),攪拌30分鐘。後續的步驟,係以與調製例1相同的順序進行濕式媒介分散處理,以調製顏料分散液12。各原料的摻合量(g)顯示於表2。 78.13 g of alkali-soluble polyimide resin solution A, 28.13 g of SOLSPERSE 20000, 795.31 g of PGMEA, and 4.69 g of perylene-based
混合68.75g的鹼可溶性聚醯亞胺樹脂溶液A、28.13g的SOLSPERSE20000、801.88g的PGMEA、7.50g的苝系色素衍生物7,攪拌10分鐘。之後,作為(a)具有含氮雜環結構的黑色材,投入32.81g的C.I.顏料黃192(平均一次粒徑42nm)、46.88g的苝黑A(平均一次粒徑55nm)、14.06g的C.I.顏料藍60(平均一次粒徑61nm),攪拌30分鐘。後續的步驟,係以與調製例1相同的順序進行濕式媒介分散處理,以調製顏料分散液13。各原料的摻合量(g)顯示於表2。 68.75 g of alkali-soluble polyimide resin solution A, 28.13 g of SOLSPERSE 20000, 801.88 g of PGMEA, and 7.50 g of perylene-based
使用C.I.顏料藍15:6代替C.I.顏料藍60,除此之外,以與調製例13相同的順序調製顏料分散液14。各原料的摻合量(g)顯示於表2。
將200.00g的粗顏料A(C.I.顏料紅179;平均一次粒徑172nm)、13.50g的苝系色素衍生物1、作為含有具有 1個以上羧基之松香二聚物之松香混合物的10.00g的Dymerex Polymerized Rosin、作為水溶性無機鹽的2000.00g的氯化鈉、及作為水溶性溶劑的500.00g的二乙二醇混合,使液溫維持在100~110℃,以捏合機捏合2小時,得到紅色捏合物。接著,在紅色捏合物中加水,在維持於60℃的3L的溫水中使水溶性成分溶解,反覆水洗至紅色過濾物中的游離氯含量低於100ppm後進行過濾,於110℃的烘箱內使其乾燥12小時。接著,藉由使用噴射磨機的乾式粉碎處理進行粒子調整,得到紅色表面處理顏料A(平均一次粒徑44nm)。以上的步驟係以溶劑鹽磨法所進行的濕式粉碎處理。另外,因為上述的過濾步驟中,苝系色素衍生物1的一部份在過濾液中消失,所以最後得到的紅色表面處理顏料A之構成成分的比例為100重量份的C.I.顏料紅179、5重量份的苝系色素衍生物1以及5重量份的Dymerex Polymerized Rosin。接著,混合84.38g的鹼可溶性聚醯亞胺樹脂溶液A、28.13g的SOLSPERSE20000、790.94g的PGMEA,攪拌10分鐘。之後,作為(a)具有含氮雜環結構的黑色材,投入28.13g的C.I.顏料黃192、30.94g的紅色表面處理顏料A、及37.50g的C.I.顏料藍60,攪拌30分鐘。後續的步驟,係以與調製例1相同的順序進行濕式媒介分散處理,以調製顏料分散液15。各原料的摻合量(g)顯示於表2。 200.00 g of crude pigment A (C.I. Pigment Red 179; average primary particle size 172 nm), 13.50 g of perylene-based
混合89.06g的鹼可溶性聚醯亞胺樹脂溶液A、93.75g的聚合物型分散劑溶液B、722.03g的PGMEA、及1.41g的苝系色素衍生物8,攪拌10分鐘。之後,投入28.13g的C.I.顏料黃192(平均一次粒徑42nm)、28.13g的C.I.顏料紅179(平均一次粒徑48nm)、及37.50g的C.I.顏料藍60(平均一次粒徑61nm),攪拌30分鐘。後續的步驟,係以與調製例1相同的順序進行濕式媒介分散處理,以調製顏料分散液16。有機色素衍生物相對於所有顏料的含量為1.50重量%。 89.06 g of alkali-soluble polyimide resin solution A, 93.75 g of polymer-type dispersant solution B, 722.03 g of PGMEA, and 1.41 g of perylene-based
各原料的摻合量(g)顯示於表3。 Table 3 shows the compounding quantity (g) of each raw material.
使用苝系色素衍生物9~11代替苝系色素衍生物8,除此之外,以與調製例16相同的順序調製顏料分散液17~19。各原料的摻合量(g)顯示於表3。
使用苝系色素衍生物11代替苝系色素衍生物8,並且以苝系色素衍生物11/蒽醌系色素衍生物1=重量比2/1的比例併用蒽醌系色素衍生物1,除此之外,以與調製例17相同的順序調製顏料分散液20。各原料的摻合量(g)顯示於表3。 Use perylene-based
混合89.06g的鹼可溶性聚醯亞胺樹脂溶液A、28.13g的SOLSPERSE20000、787.66g的PGMEA、及1.41g的苝系色素衍生物1,攪拌10分鐘。之後,投入不具有含氮雜環結構之有機顏料的18.75g的C.I.顏料黃83(平均一次粒徑41nm)、不具有含氮雜環結構的56.25g的C.I.顏料紫50(平均一次粒徑56nm)、及具有含氮雜環結構的18.75g的C.I.顏料紅179(平均粒徑48nm),攪拌30分鐘。後續的步驟,係以與調製例1相同的順序進行濕式媒介分散處理,以調製顏料分散液21。各原料的摻合量(g)顯示於表4。有機色素衍生物相對於所有顏料的含量為1.50重量%。 89.06 g of alkali-soluble polyimide resin solution A, 28.13 g of SOLSPERSE 20000, 787.66 g of PGMEA, and 1.41 g of perylene-based
增加苝系色素衍生物1的摻合量,以表4所示的摻合量(g),以與調製例21相同的順序調製顏料分散液22。有機色素衍生物相對於所有顏料的含量為5.00重量%。 The blending amount of the perylene-based
使用苝系色素衍生物4代替苝系色素衍生物1,使用不具有含氮雜環結構的C.I.顏料紅224(平均一次粒徑62nm)代替C.I.顏料紅179,以表4所示的摻合量(g),以與調製例21相同的順序調製顏料分散液23。 Use perylene-based
混合200.00g的粗顏料B(C.I.顏料紫29;平均一次粒徑163nm)、2000.00g的氯化鈉、400.00g的二乙二醇,使液溫維持於90~100℃,以捏合機捏合7小時,得到紫色捏合物。接著,在紫色捏合物中加水,在維持於60℃的2L的溫水中使水溶性成分溶解,反覆水洗至紫色過濾物中的游離氯含量低於100ppm,之後進行過濾後,以水再次稀釋,得到固體成分30重量%的紫色顏料漿液。在紫色顏料漿液中加入包含銅酞青系色素衍生物1之氫氧化鈉水溶液,攪拌1小時後,添加鹽酸至pH7為止,藉此使銅酞青系色素衍生物1析出於顏料表面後,在110℃的烘箱內乾燥12小時。接著,藉由使用噴射磨機的乾式粉碎處理進行粒子調整,得到包含100重量份的C.I.顏 料紫29、及5重量份的銅酞青系色素衍生物1的紫色表面處理顏料A(平均一次粒徑25nm)。接著,混合28.13g的PB821(Ajinomoto Fine-Techno製;具有鹼性吸附基與酸性吸附基的聚酯系聚合物型分散劑;固體成分100.00重量%)、及788.01g的PGMEA,攪拌10分鐘。之後,作為有機顏料,投入27.33g的C.I.顏料黃139(平均一次粒徑65nm)、32.43g的紫色表面處理顏料A、及35.55g的C.I.顏料藍15:6(平均一次粒徑45nm),攪拌30分鐘。後續的步驟,係以與調製例1相同的順序進行濕式媒介分散處理。接著,添加鹼可溶性聚醯亞胺樹脂溶液A以使顏料分散液的固體成分為15.00重量%,藉此進行稀釋,以調製顏料分散液24。另外,鹼可溶性聚醯亞胺樹脂溶液A中的固體成分相對於顏料分散液24所含有之所有有機顏料的含量為28.33重量%,有機色素衍生物的含量為1.65重量%。各原料的摻合量(g)顯示於表4。 Mix 200.00g of crude pigment B (C.I. Pigment Violet 29; average primary particle size 163nm), 2000.00g of sodium chloride, and 400.00g of diethylene glycol, keep the liquid temperature at 90~100°C, knead with a kneader for 7 hours, a purple kneader was obtained. Next, add water to the purple kneader, dissolve the water-soluble components in 2L of warm water maintained at 60°C, wash repeatedly until the free chlorine content in the purple filtrate is less than 100ppm, then filter and dilute with water again, A purple pigment slurry having a solid content of 30% by weight was obtained. Add an aqueous sodium hydroxide solution containing copper
增加銅酞青系色素衍生物1的添加量,除此之外,以與調製例24相同的順序進行濕式粉碎處理,得到包含100重量份的C.I.顏料紫29、及12重量份的銅酞青系色素衍生物1的紫色表面處理顏料B(平均一次粒徑25nm),以表4所示的摻合量(g),以與調製例24相同的順序,調製固體成分15.00重量%的顏料分散液25。另外,鹼可溶性聚醯亞胺樹脂溶液A中的固體成分相對於顏料分散液25所含有之所有有機顏料的含量為26.03重 量%,有機色素衍生物的含量為3.95重量%。各原料的摻合量(g)顯示於表4。 Except for increasing the amount of copper
使用SOLSPERSE20000代替PB821,除此之外,以與調製例25相同的順序調製固體成分15.00重量%的顏料分散液26。各原料的摻合量(g)顯示於表4。 Pigment dispersion 26 having a solid content of 15.00% by weight was prepared in the same procedure as in Preparation Example 25 except that SOLSPERSE 20000 was used instead of PB821. Table 4 shows the compounding quantity (g) of each raw material.
使用銅酞青系色素衍生物2代替銅酞青系色素衍生物1,除此之外,以與調製例24相同的順序進行濕式粉碎處理,得到紫色表面處理顏料C(平均一次粒徑31nm)。後續的步驟,係以與調製例24相同的順序進行濕式媒介分散處理。接著,添加鹼可溶性聚醯亞胺樹脂溶液A以使顏料分散液的固體成分為15.00重量%,藉此進行稀釋,以調製顏料分散液27。另外,鹼可溶性聚醯亞胺樹脂溶液A中的固體成分相對於顏料分散液27所含有之所有有機顏料的含量為28.33重量%,有機色素衍生物的含量為1.65重量%。各原料的摻合量(g)顯示於表4。 Except that the copper
混合62.45g的鹼可溶性聚醯亞胺樹脂溶液A、28.13g的PB821、806.28g的PGMEA、及9.38g的銅酞青系色素衍生物1,攪拌10分鐘。之後,作為(a)具有含 氮雜環結構的黑色材,投入27.33g的C.I.顏料黃139(平均一次粒徑65nm)、30.88g的C.I.顏料紫29(平均一次粒徑57nm)、及35.55g的C.I.顏料藍15:6(平均一次粒徑45nm),攪拌30分鐘。後續的步驟,係以與調製例1相同的順序進行濕式媒介分散處理,以調製固體成分15.00重量%的顏料分散液28。另外,有機色素衍生物相對於顏料分散液28所含有之所有有機顏料的含量為10.00重量%。各原料的摻合量(g)顯示於表5。 62.45 g of alkali-soluble polyimide resin solution A, 28.13 g of PB821, 806.28 g of PGMEA, and 9.38 g of copper
分別使用銅酞青系色素衍生物1~5代替苝系色素衍生物1,除此之外,以與調製例1相同的順序調製固體成分15.00重量%的顏料分散液29~33。另外,有機色素衍生物相對於顏料分散液29~33所含有之所有有機顏料的含量為1.50重量%。各原料的摻合量(g)顯示於表5。 Pigment dispersions 29 to 33 having a solid content of 15.00% by weight were prepared in the same procedure as in Preparation Example 1 except that copper
分別使用銅酞青系色素衍生物6代替苝系色素衍生物8,除此之外,以與調製例16相同的順序,調製固體成分15.00重量%的顏料分散液34。另外,有機色素衍生物相對於顏料分散液34所含有之所有有機顏料的含量為1.50重量%。各原料的摻合量(g)顯示於表6。 Pigment dispersion 34 having a solid content of 15.00% by weight was prepared in the same procedure as in Preparation Example 16 except that copper phthalocyanine-based
使用銅酞青系色素衍生物6代替苝系色素衍生物8,以表6所示的摻合量(g),以與調製例1相同的順序,調製固體成分15.00重量%的顏料分散液35。另外,有機色素衍生物相對於顏料分散液35所含有之所有有機顏料的含量為5.00重量%。各原料的摻合量(g)顯示於表6。
Using the copper
分別使用吡咯并吡咯二酮系顏料衍生物1、異吲哚啉系色素衍生物1、苝系色素衍生物12~15代替苝系色素衍生物1,除此之外,以與調製例1相同的順序調製固體成分15.00重量%的顏料分散液36~41。各原料的摻合量(g)顯示於表6。
In place of the perylene-based
增加苝系色素衍生物14的摻合量,以表6所示的摻合量(g),以與調製例1相同的順序調製顏料分散液42。另外,有機色素衍生物相對於顏料分散液42所包含之所有顏料的含量為5.00重量%。 The blending amount of the perylene-based dye derivative 14 was increased, and the pigment dispersion liquid 42 was prepared in the same procedure as in Preparation Example 1 at the blending amount (g) shown in Table 6. In addition, the content of the organic pigment derivative relative to all the pigments contained in the pigment dispersion liquid 42 was 5.00% by weight.
不使用苝系色素衍生物1,以表7所示的摻合量(g),以與調製例1相同的順序調製固體成分15.00重量%的顏料分散液43。
Pigment dispersion 43 having a solid content of 15.00% by weight was prepared in the same procedure as in Preparation Example 1 without using the perylene-based
混合93.75g的鹼可溶性聚醯亞胺樹脂溶液A、28.13g的SOLSPERSE20000、及784.38g的PGMEA,攪拌10分鐘。之後,作為(a)具有含氮雜環結構的黑色材,投入46.88g的C.I.顏料紅254(平均一次粒徑40nm)、及46.88g的C.I.顏料藍15:6(平均一次粒徑45nm),攪拌30分鐘。後續的步驟,係以與調製例1相同的順序進行濕式媒介分散處理,以調製固體成分15.00重量%的顏料分散液44。各原料的摻合量(g)顯示於表7。 93.75 g of alkali-soluble polyimide resin solution A, 28.13 g of SOLSPERSE 20000, and 784.38 g of PGMEA were mixed and stirred for 10 minutes. Afterwards, as (a) a black material having a nitrogen-containing heterocyclic structure, 46.88 g of C.I. Pigment Red 254 (average primary particle size 40 nm) and 46.88 g of C.I. Pigment Blue 15:6 (average primary particle size 45 nm) were added, Stir for 30 minutes. In the subsequent steps, wet medium dispersion treatment was performed in the same procedure as Preparation Example 1 to prepare a pigment dispersion 44 with a solid content of 15.00% by weight. The compounding quantity (g) of each raw material is shown in Table 7.
使用聚合物型分散劑溶液B代替SOLSPERSE20000,除此之外,以與調製例43相同的順序調製固體成分15.00重量%的顏料分散液45。各原料的摻合量(g)顯示於表7。 Pigment dispersion 45 having a solid content of 15.00% by weight was prepared in the same procedure as in Preparation Example 43 except that polymer-type dispersant solution B was used instead of SOLSPERSE 20000. The compounding quantity (g) of each raw material is shown in Table 7.
混合84.33g的鹼可溶性聚醯亞胺樹脂溶液A、28.13g的SOLSPERSE20000、790.97g的PGMEA、及2.81g的銅酞青系色素衍生物1,攪拌10分鐘。之後,作為(a)具有含氮雜環結構的黑色材,投入27.33g的C.I.顏料黃139(平均一次粒徑65nm)、30.88g的C.I.顏料紫23(平均一次粒徑58nm)、及35.55g的C.I.顏料藍60(平均一次粒徑61nm),攪拌30分鐘。後續的步驟,係以與調製例1 相同的順序進行濕式媒介分散處理,以調製固體成分15.00重量%的顏料分散液46。各原料的摻合量(g)顯示於表7。另外,有機色素衍生物相對於顏料分散液46所含有之所有有機顏料的含量為3.00重量%。 84.33 g of alkali-soluble polyimide resin solution A, 28.13 g of SOLSPERSE 20000, 790.97 g of PGMEA, and 2.81 g of copper
增加銅酞青系色素衍生物1的量,除此之外,以與調製例46相同的順序,以表7所示之原料的摻合量,調製固體成分15.00重量%的顏料分散液47。另外,有機色素衍生物相對於顏料分散液47所含有之所有有機顏料的含量為10.00重量%。 Except for increasing the amount of the copper
使用二系色素衍生物1代替銅酞青系色素衍生物1,除此之外,以與調製例46相同的順序,以表7所示之原料的摻合量,調製固體成分15.00重量%的顏料分散液48。 use two Pigment-based
以銅酞青系色素衍生物1/二系色素衍生物1=重量比1/1的比例併用銅酞青系色素衍生物1與二系色素衍生物1,除此之外,以與調製例46相同的順序,以表7所示的原料的摻合量,調製固體成分15.00重量%的顏料分散液49。另外,有機色素衍生物相對於顏料分散液49所含有之所有有機顏料的含量為6.00重量%。 Copper
不使用苝系色素衍生物7,除此之外,以與調製例13相同的順序,以表8所示之原料的摻合量,調製固體成分15.00重量%的顏料分散液50。 Except that the perylene-based
使用銅酞青系色素衍生物1代替苝系色素衍生物7,除此之外,以與調製例13相同的順序,以表8所示的原料的摻合量,調製固體成分15.00重量%的顏料分散液51。另外,有機色素衍生物相對於顏料分散液51所含有之所有有機顏料的含量為8.00重量%。 In addition to using copper phthalocyanine-based
使用銅酞青系色素衍生物1代替苝系色素衍生物7,除此之外,以與調製例13相同的順序,以表8所示的原料的摻合量,調製固體成分15.00重量%的顏料分散液52。另外,有機色素衍生物相對於顏料分散液52所含有之所有有機顏料的含量為4.00重量%。 In addition to using copper phthalocyanine-based
將26.40g的顏料分散液1、5.30g的鹼可溶性聚醯亞胺樹脂溶液A、作為具有2個以上的自由基聚合性基之化合物的1.35g的二新戊四醇的ε-己內酯加成丙烯酸酯(KAYARAD DPCA-60;日本化藥(股)製;表中為「DPCA-60」)、作為光聚合起始劑的0.30g的「ADEKA CRUISE」(註冊商標)NCI-831(ADEKA(股)製)、作為熱交聯劑的分子內具有3個環氧基之化合物的0.30g的VG-3101L、作為溶劑的7.85g的PGMEA以及8.50g的MBA混合並且密封,在振盪機上攪拌30分鐘,調製有 機顏料的總含量相對於負型感光性組成物中的所有固體成分為33.00重量%、且固體成分為15.00重量%的負型感光性組成物1。接著,以上述的方法評價分散穩定性。另外,用於調製感光性組成物的顏料分散液,不以顏料分散液單者的形式長期保存,而是在由濕式媒介分散處理得到後2小時以內用於調製感光性組成物。各原料的摻合量(g)顯示於表9,分散穩定性的評價結果顯示於表14。 26.40 g of
以上述順序調製後,在大氣壓下/遮光下/實際溫度25℃±1℃的恆溫箱內靜置30天,將以此狀態長期保存後的負型感光性組成物1在振盪機上攪拌1分鐘,藉由旋轉塗布機,以最後所得之硬化膜的厚度成為1.0μm的方式調節旋轉數而將其塗布於TEMPAX(50mm×50mm的透光性玻璃基材)的表面上,得到塗布膜。再者,使用加熱板(SCW-636;Dainippon Screen Mfg.(股)製),於大氣壓下、以100℃將塗布膜預烘烤120秒,得到預烘烤膜。使用雙面對準單面曝光裝置(光罩對準曝光機PEM-6M;UNION光學(股)製),使用超高壓水銀燈的j線(波長313nm)、i線(波長365nm)、h線(波長405nm)及g線(波長436nm)的混合射線,以前述的方法所得之必要最低曝光量,對於預烘烤膜全面照射曝光光線,得到曝光膜。接著,使用微影用小型顯影裝置(AD-2000;瀧澤產業(股)製),以2.38重量%TMAH水溶液顯影60秒,以去離子水沖洗30秒,得到顯影膜,使用高溫惰性氣體烘箱(INH-9CD-S;Koyo Thermo Systems(股)製),在氮氣環境下,將顯影膜於250℃下加熱60分鐘,得到在TMEPAX上具備厚度1.0μm之硬化膜的遮光性評價用基板。以前述的方法評價硬化膜的遮光性,結果顯示於表14。
After preparing in the above order, let it stand for 30 days in an incubator under atmospheric pressure/under shading/actual temperature 25°C±1°C, and stir the negative
接著,以下述方法,製作用於評價發光可靠度的有機EL顯示裝置,其具備包含負型感光性組成物1之硬化物的硬化膜以作為像素分割層。圖2中顯示包含像素分割層之形成步驟的有機EL顯示裝置的製作步驟。
Next, an organic EL display device including a cured film made of a cured product of the negative
在38mm×46mm的無鹼玻璃基板11的整個表面上,以濺鍍法形成厚度10nm的銀/銅合金的薄膜(體積比10:1),進行蝕刻而形成圖案狀的金屬反射層12。接著,以濺鍍法在整個面上形成厚度10nm的ITO透明導電膜,進行蝕刻而形成相同圖案狀的第二電極13以及作為萃取電極的輔助電極14後,以「SEMICO CLEAN」(註冊商標)56(FURUUHCI CHEMICAL(股)製)超音波洗淨10分鐘,以超純水洗淨,得到電極形成基板。
On the entire surface of an alkali-
調製後,在大氣壓下/遮光下/實際溫度25℃±1℃的恆溫箱內靜置30天,並以此狀態長期保存後,於振盪機上攪拌1分鐘,將所得之該負型感光性組成物1,使用旋轉塗布機(MS-A100;MIKASA(股)製),以最後所得之像素分割層的厚度成為1.0μm的方式調節旋轉數而塗布於電極形成基板的表面,得到塗布膜。再者,使用加熱板(SCW-636;Dainippon Screen Mfg.(股)製),於大氣壓下、以100℃將塗布膜預烘烤120秒,得到預烘烤膜。
After preparation, let it stand for 30 days in an incubator under atmospheric pressure/shading/actual temperature of 25°C±1°C, and store it in this state for a long time, then stir it on a shaker for 1 minute, and the obtained negative
使用雙面對準單面曝光裝置(光罩對準曝光機PEM-6M;UNION光學(股)製),隔著負型曝光遮罩,使用超高壓水銀燈的j線(波長313nm)、i線(波長365nm)、h線(波長405nm)及g線(波長436nm)的混合射線,以必要最低曝光量,對於預烘烤膜照射曝光光線而形成圖案,得到曝光膜。接著,使用微影用小型顯影裝置(AD-2000;瀧澤產業(股)製),以2.38重量%TMAH水溶液顯影60秒,以去離子水沖洗30秒,得到顯影膜。再者,使用高溫惰性氣體烘箱(INH-9CD-S;Koyo Thermo Systems(股)製),於氮氣環境下,以250℃將顯影膜加熱60分鐘而作為硬化膜,形成在電極形成基板中央部的縱16mm/橫16mm的區域內排列有開口部(橫70μm/縱260μm)的厚度1.0μm之像素分割層15,得到開口率25%的像素分割層形成基板,以上述的方法,評價ITO電極上所產生的顯影殘渣,評價結果顯示於表14。另外,此處所指的開口部在經過後述的製程後,最後會成為有機EL顯示裝置之發光像素部的部分。
Use a double-side alignment single-side exposure device (mask alignment exposure machine PEM-6M; manufactured by UNION Optical Co., Ltd.), and use the j-line (wavelength 313nm) and i-line of an ultra-high pressure mercury lamp through a negative exposure mask. (wavelength 365nm), h-line (wavelength 405nm) and g-line (wavelength 436nm) mixed rays, with the necessary minimum exposure dose, irradiate the exposure light to the pre-baked film to form a pattern to obtain an exposed film. Next, using a small-sized developing device for lithography (AD-2000; manufactured by Takizawa Sangyo Co., Ltd.), it was developed with a 2.38% by weight TMAH aqueous solution for 60 seconds, and rinsed with deionized water for 30 seconds to obtain a developed film. Furthermore, using a high-temperature inert gas oven (INH-9CD-S; manufactured by Koyo Thermo Systems Co., Ltd.), the developed film was heated at 250° C. for 60 minutes in a nitrogen atmosphere to form a cured film on the center of the electrode formation substrate. The
接著,使用像素分割層形成基板,進行有機EL顯示裝置的製作。為了以真空蒸鍍法形成包含發光層的有機EL層16,在真空度1×10-3Pa以下的蒸鍍條件下,使像素分割層形成基板相對蒸鍍源旋轉,首先,以10nm的厚度使化合物(HT-1)成膜而作為電洞注入層,以50nm的厚度使化合物(HT-2)成膜而作為電洞輸送層。接著,在發光層上以40nm的厚度蒸鍍化合物(GH-1)以作為基質材料,並以40nm的厚度蒸鍍化合物(GD-1)以作為摻雜
物材料。之後,以體積比1:1、40nm的厚度積層化合物(ET-1)與化合物(LiQ),以作為電子輸送材料。
Next, an organic EL display device was fabricated using the pixel dividing layer forming substrate. In order to form the
接著,蒸鍍2nm的化合物(L iQ)之後,蒸鍍10nm的銀/鎂合金(體積比10:1),以作為第一電極17。之後,在低濕/氮氣環境下,使用環氧樹脂系黏著劑將帽狀玻璃板接著,藉此進行密封,得到第一有機EL顯示裝置。另外,此處所指的厚度係石英振盪式膜厚監測儀的顯示值。
Next, after vapor-depositing 2 nm of the compound (LiQ), 10 nm of silver/magnesium alloy (volume ratio 10:1) was vapor-deposited as the
用以形成有機EL層的化合物群組(HT-1、HT-2、GH-1、GD-1、ET-1、LiQ)的化學結構分別如下所示。 The chemical structures of the compound groups (HT-1, HT-2, GH-1, GD-1, ET-1, LiQ) used to form the organic EL layer are shown below.
接著,僅改變負型曝光遮罩的開口率,以相同的順序另外製作具備開口率18%之像素分割層的第二有機EL顯示裝置,針對第一及第二有機EL顯示裝置,藉由前述的方法評價發光可靠度,結果顯示於表14。 Next, only the aperture ratio of the negative exposure mask was changed, and a second organic EL display device with a pixel dividing layer having an aperture ratio of 18% was additionally produced in the same order. For the first and second organic EL display devices, the above-mentioned The method used to evaluate the reliability of luminescence, the results are shown in Table 14.
再者,藉由以下的方法,製作用以評價發光可靠度的有機EL顯示裝置,其分別具備包含負型感光性組成物1之硬化物的硬化膜以作為像素分割層及平坦化層。
Furthermore, an organic EL display device for evaluating the reliability of light emission was produced by the following method, each including a cured film including a cured product of the negative
圖3中顯示含有像素分割層及平坦化層之形成步驟的有機EL顯示裝置的製作步驟。 FIG. 3 shows the manufacturing steps of an organic EL display device including the steps of forming a pixel dividing layer and a planarization layer.
使用旋轉塗布機,以使最後所得之平坦化層的厚度成為1.5μm的方式調節旋轉數,將負型感光性組成物1塗布於38mm×46mm的無鹼玻璃基板18的表面,
而得到塗布膜。使用加熱板,在大氣壓下,以100℃將塗布膜預烘烤120秒,得到預烘烤膜。使用雙面對準單面曝光裝置,隔著負型曝光遮罩,使用超高壓水銀燈的j線(313nm)、i線(波長365nm)、h線(波長405nm)及g線(波長436nm)的混合射線,以必要最低曝光量對預烘烤膜照射曝光光線而形成圖案,得到曝光膜。接著,使用微影用小型顯影裝置,以2.38重量%TMAH水溶液顯影60秒,以去離子水沖洗30秒,得到顯影膜。再者,使用高溫惰性氣體烘箱,在氮氣環境下,於250℃下將顯影膜加熱60分鐘而作為硬化膜,在無鹼玻璃基板之中央得到平面上無開口部的平坦膜狀的平坦化層19。
Using a spin coater, the number of rotations was adjusted so that the thickness of the finally obtained planarized layer became 1.5 μm, and the negative
接著,分別以濺鍍法,在平坦化層19的整個表面上依序形成厚度10nm的銀/銅合金的薄膜(體積比10:1)、及厚度10nm的ITO透明導電膜。統一蝕刻銀/銅合金的薄膜與ITO透明導電膜的2層,而形成金屬反射層/第二電極20、及金屬反射層/輔助電極21的圖案後,以「SEMICO CLEAN」56進行超音波洗淨10分鐘,以超純水洗淨,得到電極形成基板。另外,以最後所得之有機EL顯示裝置的有效發光區域中的開口率成為70%的方式形成包含金屬反射層/第二電極之2層的積層圖案,藉此成為在平坦化層19的表面積之中,30%的膜表面被該積層圖案所被覆、70%的膜表面露出的狀態。後續的步驟,係以與製作上述第二有機EL顯示裝置時相同的方法,使用負型感光性組成物1形成像素分割層22,再依序形成發光像素23、第一電極24後進行密封,
製作具備膜厚1.0μm/開口率18%的像素分割層、及膜厚1.5μm/開口率0%之平坦化層的第三有機EL顯示裝置,以前述方法進行發光可靠度及黑點的評價。評價結果顯示於表14。
Next, a silver/copper alloy thin film (volume ratio 10:1) with a thickness of 10 nm and an ITO transparent conductive film with a thickness of 10 nm were sequentially formed on the entire surface of the
使用顏料分散液2~52代替顏料分散液1,除此之外,以與實施例1相同的順序,調製固體成分為15重量%的負型感光性組成物2~52,以上述的方法評價分散穩定性。各原料的摻合量(g)顯示於表9~13。Except for using
接著,分別使用負型感光性組成物2~52代替負型感光性組成物1,除此之外,以與實施例1相同的順序,製作遮光性評價基板、像素分割層評價基板及有機EL顯示裝置,以前述的方法進行遮光性、顯影殘渣、發光可靠度及黑點的評價。將所使用之負型感光性組成物與其評價結果整理並顯示於表14~18。另外,用於調製感光性組成物的顏料分散液,不以顏料分散液單者的形式長期保存,而是在由上述濕式媒介分散處理得到後2小時以內即用於感光性組成物的調製。又,使用的所有負型感光性組成物,在與實施例1相同地調製後,於大氣壓下/遮光下/實際溫度25℃±1℃的恆溫箱內,靜置30天以長期保存後,於振盪機上攪拌1分鐘再使用。 Next, except that negative
將12.50g的顏料分散液16、11.75g的鹼可溶性聚醯亞胺樹脂溶液A、作為感光劑的1.80g的醌二疊氮化合物a、作為熱交聯劑的0.30g的VG-3101L、15.15g的PGMEA及8.50g的MBA混合並進行密封,在振盪機上攪拌30分鐘,調製固體成分15.00重量%的正型感光性組成物1,以上述方法評價分散穩定性。另外,用於調製感光性組成物的顏料分散液,不以顏料分散液單者的形式長期保存,而是在由上述濕式媒介分散處理得到後2小時以內即用於調製感光性組成物。各原料的摻合量(g)顯示於表19,分散穩定性的評價結果顯示於表20。 12.50 g of
使用在調製後於大氣壓下/遮光下/實際溫度25℃±1℃的恆溫箱內靜置30天以長期保存後於振盪機上攪拌1分鐘的正型感光性組成物1,不進行曝光步驟及顯影步驟,除此之外,以與實施例1相同的順序得到遮光性評價用基板,並以前述方法評價硬化膜的遮光性,結果顯示於表20。接著,使用負型曝光遮罩的開口部與遮光部反轉的正型曝光遮罩,除此之外,以與實施例1相同的順序製作像素分割層評價基板及有機EL顯示裝置,以前述的方法進行顯影殘渣、發光可靠度及黑點的評價。評價結果顯示於表20。 After preparation, the positive-type
分別使用顏料分散液19、45代替顏料分散液16,除此之外,以與實施例21相同的順序,調製正型感光性組成物2~3,以上述方法評價分散穩定性。各原料的摻合量(g)顯示於表19,分散穩定性的評價結果顯示於表20。 Except for using the
使用在調製後於大氣壓下/遮光下/實際溫度25℃±1℃的恆溫箱內靜置30天以長期保存後於振盪機上攪拌1分鐘的正型感光性組成物2~3,以與實施例21相同的順序製作遮光性評價用基板、像素分割層評價基板及有機EL顯示裝置,以前述方法進行遮光性、顯影殘渣、發光可靠度及黑點的評價。所使用之正型感光性組成物與其評價結果顯示於表20。 After preparation, the positive
整體而言,可得知比較例1~33的有機EL顯示裝置,在黑點與發光可靠度之中,至少一項特性不足,但實施例1~22的有機EL顯示裝置,一方面可抑制黑點,一方面可得到高發光可靠度,可兼具兩種特性。 On the whole, it can be seen that the organic EL display devices of Comparative Examples 1 to 33 have at least one characteristic insufficient in black spots and luminous reliability, but the organic EL display devices of Examples 1 to 22, on the one hand, can suppress Black dots, on the one hand, can obtain high luminescence reliability, and can have both characteristics.
從上述可知本發明之有機EL顯示裝置係為有用。 From the above, it can be seen that the organic EL display device of the present invention is useful.
本發明之有機EL顯示裝置可應用於可抑制黑點且需要高發光可靠度的用途,例如,搭載有機EL面板的智慧型手機、電視、個人電腦等的電子設備。 The organic EL display device of the present invention can be applied to applications that can suppress dark spots and require high light emission reliability, for example, electronic equipment such as smart phones, TVs, and personal computers equipped with organic EL panels.
1‧‧‧TFT 1‧‧‧TFT
2‧‧‧配線 2‧‧‧Wiring
3‧‧‧TFT絕緣膜 3‧‧‧TFT insulating film
4‧‧‧平坦化層 4‧‧‧planarization layer
5‧‧‧第二電極(ITO電極) 5‧‧‧Second electrode (ITO electrode)
6‧‧‧基材 6‧‧‧Substrate
7‧‧‧接觸孔 7‧‧‧Contact hole
8‧‧‧像素分割層 8‧‧‧Pixel segmentation layer
9‧‧‧發光像素 9‧‧‧luminous pixels
10‧‧‧第一電極 10‧‧‧First electrode
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| JP6892002B2 (en) * | 2019-11-19 | 2021-06-18 | 大日本印刷株式会社 | Resin panel and infrared sensor |
| CN114830826A (en) * | 2019-12-20 | 2022-07-29 | 东丽株式会社 | Photosensitive resin composition, cured film, organic EL display, display device, and method for producing cured film |
| WO2021172084A1 (en) * | 2020-02-25 | 2021-09-02 | 東レ株式会社 | Black resin composition, near infrared ray-transmitting light-blocking membrane, decorative substrate, decorative film and colored partition wall for organic el display |
| KR20230015883A (en) * | 2020-05-25 | 2023-01-31 | 미쓰비시 엔지니어링-플라스틱스 코포레이션 | Light-transmissive resin composition for laser welding, kit, molded article, and manufacturing method of molded article |
| JP7406458B2 (en) * | 2020-06-05 | 2023-12-27 | 日本化薬株式会社 | Polarized light-emitting film, polarized light-emitting plate, and display device with polarization function using water-soluble perylene-based dichroic fluorescent dye or its salt |
| JP7592989B2 (en) * | 2020-06-26 | 2024-12-03 | 東レ株式会社 | Photosensitive composition, cured product, and organic electroluminescence display device |
| US20230101363A1 (en) * | 2020-08-13 | 2023-03-30 | Dic Corporation | Coloring composition, and color filter |
| JPWO2022070946A1 (en) * | 2020-09-29 | 2022-04-07 | ||
| KR20240024772A (en) | 2021-06-22 | 2024-02-26 | 도레이 카부시키가이샤 | Positive photosensitive pigment composition, cured film containing the cured product, and organic EL display device |
| KR20240170910A (en) * | 2022-03-30 | 2024-12-05 | 도레이 카부시키가이샤 | Display device and photosensitive composition |
| JPWO2023190317A1 (en) * | 2022-03-31 | 2023-10-05 | ||
| WO2023195319A1 (en) * | 2022-04-04 | 2023-10-12 | 東レ株式会社 | Positive photosensitive pigment composition, cured film containing cured product thereof, and organic el display device |
| WO2024204339A1 (en) | 2023-03-30 | 2024-10-03 | 東レ株式会社 | Positive photosensitive pigment composition, cured product, and organic el display device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5472494A (en) * | 1993-07-28 | 1995-12-05 | Basf Aktiengesellschaft | Pigment preparation with perylene derivatives as dispersants |
| JP2004285326A (en) * | 2003-01-31 | 2004-10-14 | Basf Ag | Perylene derivative, method for producing the perylene derivative, pigment preparation containing the perylene derivative, and method for producing the pigment preparation |
| CN101827897A (en) * | 2007-10-17 | 2010-09-08 | 科莱恩金融(Bvi)有限公司 | Diketopyrrolopyrrole pigment compositions for color filters |
| TW201730677A (en) * | 2015-09-30 | 2017-09-01 | Toray Industries | Negative photosensitive resin composition, cured film, device having cured film, display device, and manufacturing method thereof |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3926564A1 (en) * | 1989-08-11 | 1991-02-14 | Hoechst Ag | NEW PIGMENT PREPARATIONS BASED ON PERYLENE COMPOUNDS |
| JPH05117541A (en) * | 1991-10-24 | 1993-05-14 | Toyo Ink Mfg Co Ltd | Pigment composition and pigment dispersion |
| JPH09137075A (en) * | 1995-11-14 | 1997-05-27 | Nippon Kayaku Co Ltd | Pigment dispersant and pigment composition using the same |
| US6884563B2 (en) * | 2003-05-20 | 2005-04-26 | Eastman Kodak Company | Thermal imaging material containing combustible nitro-resin particles |
| JP5016831B2 (en) * | 2006-03-17 | 2012-09-05 | キヤノン株式会社 | LIGHT EMITTING ELEMENT USING OXIDE SEMICONDUCTOR THIN FILM TRANSISTOR AND IMAGE DISPLAY DEVICE USING THE SAME |
| US20070284687A1 (en) * | 2006-06-13 | 2007-12-13 | Rantala Juha T | Semiconductor optoelectronics devices |
| WO2007147701A1 (en) * | 2006-06-22 | 2007-12-27 | Basf Se | Azoline compounds for combating arthropod pests |
| WO2012101245A1 (en) * | 2011-01-28 | 2012-08-02 | Basf Se | Polymerizable composition comprising an oxime sulfonate as thermal curing agent |
| JP2012190951A (en) * | 2011-03-10 | 2012-10-04 | Sony Corp | Solid-state imaging device and camera |
| JP2013030293A (en) | 2011-07-27 | 2013-02-07 | Sony Corp | Display unit and substrate for display unit |
| CN102268215B (en) * | 2011-08-09 | 2013-04-24 | 东莞大宝化工制品有限公司 | Solvent-based primer special for 3C product magnesium aluminum alloy material and preparation method thereof |
| CN102645785B (en) * | 2012-02-24 | 2014-08-13 | 京东方科技集团股份有限公司 | Color film substrate and manufacturing method thereof |
| JP2013207124A (en) | 2012-03-29 | 2013-10-07 | Toyo Ink Sc Holdings Co Ltd | Photosensitive black composition, black matrix and organic el light-emitting display device |
| CN102881654B (en) * | 2012-09-29 | 2016-03-23 | 京东方科技集团股份有限公司 | Thin-film transistor array base-plate and preparation method thereof, active matrix display device |
| CN103996794A (en) * | 2013-02-18 | 2014-08-20 | 东丽先端材料研究开发(中国)有限公司 | Organic Light Emitting Components |
| JP6075763B2 (en) * | 2013-03-22 | 2017-02-08 | 日本化薬株式会社 | Active energy ray-curable resin composition, and colored spacer and / or black matrix for display element using the same |
| TW201510103A (en) | 2013-08-01 | 2015-03-16 | Dainippon Ink & Chemicals | Pigment composition for color filter and color filter |
| KR101844731B1 (en) * | 2013-09-25 | 2018-04-02 | 미쯔비시 케미컬 주식회사 | Photosensitive coloring composition, black matrix, coloring spacer, image display device, and pigment dispersion |
| JP6444099B2 (en) * | 2013-10-09 | 2018-12-26 | キヤノン株式会社 | Electrophotographic photosensitive member, method for manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus |
| US9413740B2 (en) | 2014-07-22 | 2016-08-09 | Microsoft Technology Licensing, Llc | Establishing secure computing devices for virtualization and administration |
| CN107079560B (en) | 2014-09-26 | 2018-09-25 | 东丽株式会社 | Organic el display device |
| KR102224141B1 (en) * | 2015-03-11 | 2021-03-08 | 도레이 카부시키가이샤 | Organic EL display device, and manufacturing method thereof |
-
2018
- 2018-09-18 JP JP2018549601A patent/JP7120022B2/en active Active
- 2018-09-18 WO PCT/JP2018/034409 patent/WO2019065359A1/en not_active Ceased
- 2018-09-18 CN CN201880056323.9A patent/CN111051982B/en active Active
- 2018-09-18 KR KR1020207004118A patent/KR102318084B1/en active Active
- 2018-09-25 TW TW107133563A patent/TWI786189B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5472494A (en) * | 1993-07-28 | 1995-12-05 | Basf Aktiengesellschaft | Pigment preparation with perylene derivatives as dispersants |
| JP2004285326A (en) * | 2003-01-31 | 2004-10-14 | Basf Ag | Perylene derivative, method for producing the perylene derivative, pigment preparation containing the perylene derivative, and method for producing the pigment preparation |
| CN101827897A (en) * | 2007-10-17 | 2010-09-08 | 科莱恩金融(Bvi)有限公司 | Diketopyrrolopyrrole pigment compositions for color filters |
| TW201730677A (en) * | 2015-09-30 | 2017-09-01 | Toray Industries | Negative photosensitive resin composition, cured film, device having cured film, display device, and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201920200A (en) | 2019-06-01 |
| CN111051982B (en) | 2023-04-25 |
| JP7120022B2 (en) | 2022-08-17 |
| WO2019065359A1 (en) | 2019-04-04 |
| KR20200051584A (en) | 2020-05-13 |
| JPWO2019065359A1 (en) | 2020-09-03 |
| KR102318084B1 (en) | 2021-10-28 |
| CN111051982A (en) | 2020-04-21 |
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