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TWI785429B - semiconductor memory device - Google Patents

semiconductor memory device Download PDF

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TWI785429B
TWI785429B TW109142819A TW109142819A TWI785429B TW I785429 B TWI785429 B TW I785429B TW 109142819 A TW109142819 A TW 109142819A TW 109142819 A TW109142819 A TW 109142819A TW I785429 B TWI785429 B TW I785429B
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TW202132999A (en
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近藤敦志
米澤遼
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日商鎧俠股份有限公司
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    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F12/00Accessing, addressing or allocating within memory systems or architectures
    • G06F12/02Addressing or allocation; Relocation
    • G06F12/06Addressing a physical block of locations, e.g. base addressing, module addressing, memory dedication
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06KGRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/067Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
    • G06K19/07Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
    • G06K19/077Constructional details, e.g. mounting of circuits in the carrier
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/02Disposition of storage elements, e.g. in the form of a matrix array
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/02Disposition of storage elements, e.g. in the form of a matrix array
    • G11C5/04Supports for storage elements, e.g. memory modules; Mounting or fixing of storage elements on such supports

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  • Theoretical Computer Science (AREA)
  • Physics & Mathematics (AREA)
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  • General Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Memories (AREA)
  • Memory System (AREA)

Abstract

本發明提供一種可提高散熱效率之半導體記憶裝置。 半導體記憶裝置具備本體、記憶體、控制器及複數個端子。複數個端子包含用於傳送信號之複數個信號端子,且於本體之第1面露出。複數個端子至少形成第1行與第2行。第1行包含複數個端子,其等於較本體之第2端緣更靠近第1端緣之位置,彼此間隔排列於第1方向。第2行包含複數個端子,其等於較本體之第1端緣更靠近第2端緣之位置,彼此間隔排列於第1方向。本體之第1面之第1行與第2行間之區域,包含與熱傳導構件接觸之接觸區域,該熱傳導構件係與半導體記憶裝置電性連接,且配置於主機機器之基板上。The invention provides a semiconductor memory device capable of improving heat dissipation efficiency. The semiconductor memory device has a main body, a memory, a controller and a plurality of terminals. The plurality of terminals include a plurality of signal terminals for transmitting signals, and are exposed on the first surface of the body. A plurality of terminals form at least the first row and the second row. The first row includes a plurality of terminals, which are equal to the position closer to the first end edge than the second end edge of the body, and are arranged at intervals in the first direction. The second row includes a plurality of terminals, which are equal to the position closer to the second end edge than the first end edge of the body, and are arranged at intervals in the first direction. The area between the first row and the second row on the first surface of the main body includes a contact area with a heat conduction member electrically connected with a semiconductor memory device and configured on a substrate of a host machine.

Description

半導體記憶裝置semiconductor memory device

本發明之實施形態係關於一種半導體記憶裝置。Embodiments of the present invention relate to a semiconductor memory device.

近年,隨著如NAND(Not-AND:與非)型快閃記憶體般之非揮發性記憶體之技術改良,非揮發性記憶體之記憶容量增大。伴隨於此,如可卸除式記憶體器件般之半導體記憶裝置之開發不斷進展。In recent years, with the technical improvement of non-volatile memory such as NAND (Not-AND: NAND) flash memory, the memory capacity of non-volatile memory has increased. Accompanying this, the development of semiconductor memory devices such as removable memory devices has been progressing.

然而,如可卸除式記憶體器件般之半導體記憶裝置中,謀求實現用以提高散熱效率之構造。However, in a semiconductor memory device such as a removable memory device, a structure for improving heat dissipation efficiency is sought.

發明所欲解決之問題在於提供一種可提高散熱效率之半導體記憶裝置。The problem to be solved by the invention is to provide a semiconductor memory device that can improve heat dissipation efficiency.

根據實施形態,半導體記憶裝置具備本體、記憶體、控制器及複數個端子。上述本體具有:第1面;位於上述第1面之相反側之第2面;於第1方向延伸之第1端緣;位於上述第1端緣之相反側且於上述第1方向延伸之第2端緣;於與上述第1方向交叉之第2方向延伸之第1側緣;及位於上述第1側緣之相反側且於上述第2方向延伸之第2側緣。上述記憶體設置於上述本體之內部。上述控制器設置於上述本體之內部,控制上述記憶體。上述複數個端子包含用於傳送信號之複數個信號端子,且於上述第1面露出。上述複數個端子至少形成第1行與第2行。上述第1行包含複數個端子,其等於較上述第2端緣更靠近上述第1端緣之位置,彼此間隔排列於上述第1方向。上述第2行包含複數個端子,其等於較上述第1端緣更靠近上述第2端緣之位置,彼此間隔排列於上述第1方向。上述第1面之上述第1行與上述第2行間之區域包含與熱傳導構件接觸之接觸區域,該熱傳導構件與上述半導體記憶裝置電性連接,且配置於主機機器之基板上。According to an embodiment, a semiconductor memory device includes a main body, a memory, a controller, and a plurality of terminals. The above-mentioned body has: a first surface; a second surface located on the opposite side of the above-mentioned first surface; a first edge extending in the first direction; a first edge located on the opposite side of the above-mentioned first edge and extending in the above-mentioned first direction 2 end edges; a first side edge extending in a second direction intersecting the above-mentioned first direction; and a second side edge located on the opposite side of the above-mentioned first side edge and extending in the above-mentioned second direction. The above-mentioned memory is arranged inside the above-mentioned main body. The above-mentioned controller is arranged inside the above-mentioned main body to control the above-mentioned memory. The plurality of terminals include a plurality of signal terminals for transmitting signals, and are exposed on the first surface. The plurality of terminals described above form at least the first row and the second row. The first row includes a plurality of terminals, which are located closer to the first end edge than the second end edge, and are arranged at intervals in the first direction. The second row includes a plurality of terminals, which are equal to positions closer to the second end edge than the first end edge, and are arranged at intervals in the first direction. The area between the first row and the second row of the first surface includes a contact area with a heat conduction member electrically connected to the semiconductor memory device and disposed on the substrate of the host device.

以下,參照圖式說明實施形態。Hereinafter, embodiments will be described with reference to the drawings.

半導體記憶裝置包含非揮發性記憶體與控制該非揮發性記憶體之控制器。半導體記憶裝置係以對非揮發性記憶體寫入資料,且自非揮發性記憶體讀出資料之方式構成之儲存器件。半導體記憶裝置亦可例如作為固態驅動機(SSD:Solid State Drive)實現。該情形時,該SSD作為個人電腦、移動器件、錄影機、車載機器等作為主機機器發揮功能之各種資訊處理裝置之儲存裝置使用。A semiconductor memory device includes a non-volatile memory and a controller for controlling the non-volatile memory. A semiconductor memory device is a storage device that writes data into a non-volatile memory and reads data from the non-volatile memory. The semiconductor memory device can also be realized, for example, as a solid state drive (SSD: Solid State Drive). In this case, the SSD is used as a storage device for various information processing devices that function as host devices, such as personal computers, mobile devices, video recorders, and vehicle-mounted devices.

(第1實施形態) 第1實施形態之半導體記憶裝置具有卡形狀,能夠作為可安裝於主機機器內之連接器之可卸除式SSD發揮功能。供本實施形態之半導體記憶裝置安裝之連接器可為推壓型連接器,亦可為推拉型連接器,又可為鉸鏈型連接器。本實施形態中,設想供半導體記憶裝置安裝之連接器為鉸鏈型連接器之情形。(first embodiment) The semiconductor memory device of the first embodiment has a card shape and can function as a detachable SSD that can be mounted on a connector in a host device. The connector for mounting the semiconductor memory device of this embodiment may be a push-type connector, a push-pull type connector, or a hinge-type connector. In this embodiment, it is assumed that the connector on which the semiconductor memory device is mounted is a hinge-type connector.

根據半導體記憶裝置之可卸除式之特徵,可升級容量及容易維護。以下,半導體記憶裝置係作為記憶體器件(或可卸除式記憶體器件)參照。According to the detachable feature of the semiconductor memory device, the capacity can be upgraded and maintenance is easy. Hereinafter, the semiconductor memory device is referred to as a memory device (or a removable memory device).

圖1係顯示第1實施形態之記憶體器件10之外形形狀之例示圖。圖1(A)係顯示記憶體器件10之一表面之俯視圖。圖1(B)係顯示記憶體器件10之側面之側視圖。圖1(C)係顯示記憶體器件10之一表面之俯視圖,即顯示位於圖1(A)所示之一表面之相反側之另一表面之俯視圖。FIG. 1 is a diagram showing an example of the external shape of a memory device 10 according to the first embodiment. FIG. 1(A) is a top view showing a surface of a memory device 10 . FIG. 1(B) is a side view showing the side of the memory device 10 . FIG. 1(C) shows a top view of one surface of the memory device 10, that is, shows a top view of another surface on the opposite side of one surface shown in FIG. 1(A).

如圖1(A)~圖1(C)所示,本說明書中,定義X軸、Y軸及Z軸。X軸、Y軸及Z軸彼此正交。X軸沿記憶體器件10之寬度。Y軸沿記憶體器件10之長度(高度)。Z軸沿記憶體器件10之厚度。本說明書中,將自Z軸之負方向觀察記憶體器件10及供該記憶體器件10安裝之連接器稱為俯視。As shown in FIGS. 1(A) to 1(C), in this specification, an X axis, a Y axis, and a Z axis are defined. The X axis, the Y axis and the Z axis are orthogonal to each other. The X axis is along the width of the memory device 10 . The Y axis is along the length (height) of the memory device 10 . The Z axis is along the thickness of the memory device 10 . In this specification, viewing the memory device 10 and the connector for mounting the memory device 10 from the negative direction of the Z axis is referred to as a top view.

記憶體器件10係構成為以自外部供給之電源電壓動作之半導體記憶裝置。The memory device 10 is a semiconductor memory device configured to operate with a power supply voltage supplied from the outside.

如圖1所示,記憶體器件10具備具有薄板狀之半導體封裝形狀之本體(框體)11。記憶體器件10及本體11形成為例如於Y軸方向延伸之大致矩形板狀。Y軸方向係記憶體器件10及本體11之長邊方向。As shown in FIG. 1 , a memory device 10 includes a main body (frame) 11 having a thin-plate semiconductor package shape. The memory device 10 and the main body 11 are formed, for example, in a substantially rectangular plate shape extending in the Y-axis direction. The Y-axis direction is the long side direction of the memory device 10 and the main body 11 .

如圖1所示,本體11為板狀,具有第1面21、第2面22及外緣23。第1面21及第2面22形成為於Y軸方向延伸之大致四角形(矩形)狀。即,Y軸方向亦為第1面21及第2面22之長邊方向。As shown in FIG. 1 , the main body 11 is plate-shaped and has a first surface 21 , a second surface 22 and an outer edge 23 . The first surface 21 and the second surface 22 are formed in a substantially square (rectangular) shape extending in the Y-axis direction. That is, the Y-axis direction is also the longitudinal direction of the first surface 21 and the second surface 22 .

第1面21為朝向Z軸之正方向之大致平坦面。第2面22為位於第1面21之相反側,且朝向Z軸之負方向之大致平坦面。The first surface 21 is a substantially flat surface facing the positive direction of the Z-axis. The second surface 22 is a substantially flat surface located on the opposite side to the first surface 21 and facing the negative direction of the Z-axis.

外緣23設置於第1面21與第2面22間,且連接於第1面21之緣與第2面22之緣。如圖1所示,外緣23具有第1緣31、第2緣32、第3緣33、第4緣34、第1角部35、第2角部36、第3角部37及第4角部38。The outer edge 23 is disposed between the first surface 21 and the second surface 22 and connected to the edge of the first surface 21 and the edge of the second surface 22 . As shown in Figure 1, the outer edge 23 has a first edge 31, a second edge 32, a third edge 33, a fourth edge 34, a first corner 35, a second corner 36, a third corner 37 and a fourth corner. Corner 38.

第1緣31於X軸方向延伸,且朝向Y軸之正方向。X軸方向為本體11、第1面21及第2面22之短邊方向,包含X軸之正方向與X軸之負方向。The first edge 31 extends in the X-axis direction and faces the positive direction of the Y-axis. The X-axis direction is the short-side direction of the main body 11 , the first surface 21 and the second surface 22 , including the positive direction of the X-axis and the negative direction of the X-axis.

第2緣32於Y軸方向延伸,朝向X軸之負方向。第3緣33位於第2緣32之相反側,於Y軸方向延伸,朝向X軸之正方向。第4緣34位於第1緣31之相反側,於X軸方向延伸,朝向Y軸之負方向。The second edge 32 extends in the Y-axis direction and faces the negative direction of the X-axis. The third edge 33 is located on the opposite side of the second edge 32, extends in the Y-axis direction, and faces the positive direction of the X-axis. The fourth edge 34 is located on the opposite side of the first edge 31, extends in the X-axis direction, and faces the negative direction of the Y-axis.

第2緣32及第3緣33之各者之長度長於第1緣31及第4緣34之各者之長度。第1緣31及第4緣34形成大致矩形之記憶體器件10之短邊,第2緣32及第3緣33形成大致矩形之記憶體器件10之長邊(側邊)。The length of each of the second edge 32 and the third edge 33 is longer than the length of each of the first edge 31 and the fourth edge 34 . The first edge 31 and the fourth edge 34 form the short side of the substantially rectangular memory device 10 , and the second edge 32 and the third edge 33 form the long side (side) of the substantially rectangular memory device 10 .

第1角部35為第1緣31與第2緣32間之角部分,將第1緣31之X軸之負方向之端與第2緣32之Y軸之正方向之端連接。The first corner portion 35 is a corner portion between the first edge 31 and the second edge 32 , and connects the end of the first edge 31 in the negative direction of the X-axis and the end of the second edge 32 in the positive direction of the Y-axis.

第1角部35於第1緣31之X軸之負方向之端、與第2緣32之Y軸之正方向之端間直線狀延伸。第1緣31與第2緣32之角設定為所謂之C1.1之倒角(亦稱為C倒角),藉此設定第1角部35。換言之,第1角部35為形成於第1緣31與第2緣32間之倒角部C。The first corner portion 35 extends linearly between the end of the first edge 31 in the negative direction of the X-axis and the end of the second edge 32 in the positive direction of the Y-axis. The corner between the first edge 31 and the second edge 32 is set as a so-called C1.1 chamfer (also referred to as C chamfer), whereby the first corner portion 35 is set. In other words, the first corner portion 35 is a chamfered portion C formed between the first edge 31 and the second edge 32 .

第2角部36為第1緣31與第3緣33間之角部分,將第1緣31之X軸之正方向之端與第3緣33之Y軸之正方向之端連接。第2角部36於第1緣31之X軸之正方向之端、與第3緣33之Y軸之正方向之端間圓弧狀延伸。第1緣31與第3緣33之角設定為所謂之R0.2之圓倒角(亦稱為R倒角),藉此設定第2角部36。如此,第1角部35之形狀與第2角部36之形狀互不相同。The second corner portion 36 is a corner portion between the first edge 31 and the third edge 33 , and connects the end of the first edge 31 in the positive direction of the X-axis and the end of the third edge 33 in the positive direction of the Y-axis. The second corner portion 36 extends in an arc shape between the end of the first edge 31 in the positive direction of the X-axis and the end of the third edge 33 in the positive direction of the Y-axis. The corner between the first edge 31 and the third edge 33 is set to a so-called R0.2 round chamfer (also called R chamfer), thereby setting the second corner portion 36 . Thus, the shape of the first corner portion 35 and the shape of the second corner portion 36 are different from each other.

第3角部37將第2緣32之Y軸之負方向之端與第4緣34之X軸之負方向之端連接。第4角部38將第3緣33之Y軸之負方向之端與第4緣34之X軸之正方向之端連接。第3角部37及第4角部38分別與第2角部36同樣地圓弧狀延伸。The third corner portion 37 connects the end of the second edge 32 in the negative direction of the Y-axis and the end of the fourth edge 34 in the negative direction of the X-axis. The fourth corner portion 38 connects the end of the third edge 33 in the negative direction of the Y-axis and the end of the fourth edge 34 in the positive direction of the X-axis. The third corner portion 37 and the fourth corner portion 38 each extend in an arc shape similarly to the second corner portion 36 .

本體11、第1面21及第2面22之Y軸方向之長度設定為約18±0.10 mm,X軸方向之長度設定為約14±0.10 mm。即,Y軸方向之第1緣31與第4緣34間之距離設定為約18±0.1 mm,X軸方向之第2緣32與第3緣33間之距離設定為約14±0.10 mm。另,本體11、第1面21及第2面22之X軸方向及Y軸方向之長度不限於該例。The length of the main body 11, the first surface 21 and the second surface 22 in the Y-axis direction is set to be about 18±0.10 mm, and the length in the X-axis direction is set to be about 14±0.10 mm. That is, the distance between the first edge 31 and the fourth edge 34 in the Y-axis direction is set to about 18±0.1 mm, and the distance between the second edge 32 and the third edge 33 in the X-axis direction is set to about 14±0.10 mm. In addition, the lengths of the main body 11, the first surface 21, and the second surface 22 in the X-axis direction and the Y-axis direction are not limited to this example.

本體11及外緣23之Z軸方向之厚度設定為約1.4±0.10 mm。即,Z軸方向之第1面21與第2面22間之距離設定為約1.4±0.10 mm。另,由於有形成傾斜部39之情形或進行倒角之情形等,故外緣23之Z軸方向之長度不限於該例。為了確實與連接器嵌合,需要Z軸方向以平面公差規定,且整面之厚度在公差內。The thickness of the body 11 and the outer edge 23 in the Z-axis direction is set to be about 1.4±0.10 mm. That is, the distance between the first surface 21 and the second surface 22 in the Z-axis direction is set to be about 1.4±0.10 mm. In addition, the length of the outer edge 23 in the Z-axis direction is not limited to this example because the inclined portion 39 may be formed or chamfered. In order to securely fit the connector, the Z-axis direction must be specified with a plane tolerance, and the thickness of the entire surface must be within the tolerance.

如圖1(B)所示,本體11進而具有傾斜部39。傾斜部39為第1面21與第1緣31間之角部分,於第1面21之Y軸之正方向之端與第1緣31之Z軸之正方向之端間直線狀延伸。As shown in FIG. 1(B), the main body 11 further has an inclined portion 39 . The inclined portion 39 is a corner portion between the first surface 21 and the first edge 31 , and extends linearly between the end of the first surface 21 in the positive direction of the Y-axis and the end of the first edge 31 in the positive direction of the Z-axis.

如圖1(A)所示,亦可於記憶體器件10之第1面21,複數個端子配置為行R1、行R2、行R3之3行。於行R1配置有例如PCI Express(註冊商標)(PCIe)般之高速串列介面用之2信道量之信號端子。與一信道對應之信號端子包含接收差分信號對2端子與發送差分信號對2端子。又,差分2端子以接地端子包圍。雖未圖示,但亦可於行R1與行R2間追加PCIe信道。As shown in FIG. 1(A), on the first surface 21 of the memory device 10, a plurality of terminals may be arranged in three rows of row R1, row R2, and row R3. Signal terminals for 2 channels for a high-speed serial interface such as PCI Express (registered trademark) (PCIe) are arranged in row R1. The signal terminals corresponding to one channel include receiving differential signal pair 2 terminals and transmitting differential signal pair 2 terminals. Also, the two differential terminals are surrounded by ground terminals. Although not shown, a PCIe channel can also be added between the row R1 and the row R2.

可於行R2配置各產品不同之任意可選信號用之信號端子。作為可選信號用信號端子,列舉例如依據PCIe規格之邊帶信號(SMBus信號、WAKE#信號及PRSNT#信號用信號端子)、或接地端子等作為一例。於行R3配置產品共用之控制信號及電源用端子。作為依據PCIe規格之邊帶信號,列舉例如CLKREF信號對、CLKREQ#信號、PERST#信號等。於行R3配置有供給來自主機機器之電源電壓之複數個電源端子與接地端子。The signal terminal for any optional signal different from each product can be configured on row R2. As an optional signal terminal, for example, a sideband signal (signal terminal for SMBus signal, WAKE# signal, and PRSNT# signal) according to the PCIe standard, or a ground terminal are listed as examples. The control signal and power supply terminals shared by the product are arranged on row R3. As the sideband signal according to the PCIe specification, for example, a CLKREF signal pair, a CLKREQ# signal, a PERST# signal, and the like are listed. A plurality of power supply terminals and ground terminals for supplying the power supply voltage from the host machine are arranged in the row R3.

另,亦有行R1稱為第1行之情形。又,亦有行R3稱為第2行之情形。再者,亦有行R2稱為第3行之情形。In addition, there is a case where the row R1 is called the first row. Also, there is a case where the row R3 is called the second row. Furthermore, there is also a case where the row R2 is called the third row.

圖2係顯示記憶體器件10之構成例。FIG. 2 shows a configuration example of the memory device 10 .

如圖2所示,於記憶體器件10之本體11之內部,設置有印刷電路基板12、NAND型快閃記憶體13、及控制器14。印刷電路基板12、NAND型快閃記憶體13、及控制器14可收容於箱型之本體11,亦可嵌入本體11。NAND型快閃記憶13及控制器14安裝於印刷電路基板12之表面上。As shown in FIG. 2 , inside the body 11 of the memory device 10 , a printed circuit board 12 , a NAND flash memory 13 , and a controller 14 are arranged. The printed circuit board 12 , the NAND flash memory 13 , and the controller 14 can be housed in the box-shaped body 11 , or embedded in the body 11 . NAND type flash memory 13 and controller 14 are mounted on the surface of printed circuit board 12 .

另,亦可以印刷電路基板12之背面露出之方式,使印刷電路基板12構成本體11之一部。該情形時,印刷電路基板12之背面可作為第1面21發揮功能。In addition, the printed circuit board 12 may constitute a part of the main body 11 in such a manner that the back surface of the printed circuit board 12 is exposed. In this case, the back surface of the printed circuit board 12 can function as the first surface 21 .

NAND型快閃記憶體13亦可包含積層之複數個NAND型快閃記憶體晶片。通常,該等複數個NAND型快閃記憶體晶片交錯動作。控制器14為LSI。控制器14控制NAND型快閃記憶體13、及包含該NAND型快閃記憶體13之記憶體器件10全體。例如,控制器14可進行對NAND型快閃記憶體13之讀取/寫入控制及與外部之通信控制。又,記憶體器件10具有PCIe介面作為系統介面,於記憶體器件10中以依據PCIe規格之協定進行通信控制。The NAND flash memory 13 may also include a plurality of stacked NAND flash memory chips. Usually, the plurality of NAND flash memory chips are interleaved. The controller 14 is an LSI. The controller 14 controls the NAND flash memory 13 and the entire memory device 10 including the NAND flash memory 13 . For example, the controller 14 can control the reading/writing of the NAND flash memory 13 and control the communication with the outside. In addition, the memory device 10 has a PCIe interface as a system interface, and communication control is performed in the memory device 10 in accordance with the protocol of the PCIe specification.

記憶體器件10以具有卡形狀之封裝(記憶體封裝)實現,NAND型快閃記憶體13與控制器14由以形成記憶體器件10之主體(本體11)之方式成形之鑄模樹脂40覆蓋且密封。The memory device 10 is realized as a package (memory package) having a card shape, and the NAND type flash memory 13 and the controller 14 are covered with a molding resin 40 shaped so as to form the main body (body 11) of the memory device 10 and seal.

圖3係顯示記憶體器件10之外形形狀與複數個端子P之配置例之俯視圖。FIG. 3 is a top view showing the shape of the memory device 10 and an arrangement example of a plurality of terminals P. Referring to FIG.

如圖3所示,記憶體器件10具有複數個端子P。亦有端子P稱為銷或墊之情形。圖3中,例示有記憶體器件10具有32個端子P之情形,但端子P之數終究為一例,不限於該例。即,端子P之數可少於32個,亦可多於32個。複數個端子P設置於例如印刷電路基板12之背面。複數個端子P構成於印刷電路基板12上,於第1面21露出。本實施形態中,於第2面22未設置端子P,可於例如印刷面使用。As shown in FIG. 3 , the memory device 10 has a plurality of terminals P. As shown in FIG. There are also cases where the terminal P is called a pin or a pad. In FIG. 3 , a case where the memory device 10 has 32 terminals P is shown as an example, but the number of terminals P is an example and is not limited to this example. That is, the number of terminals P may be less than 32 or more than 32. A plurality of terminals P are provided, for example, on the back surface of the printed circuit board 12 . A plurality of terminals P are formed on the printed circuit board 12 and exposed on the first surface 21 . In this embodiment, the terminal P is not provided on the second surface 22, and it can be used, for example, on the printed surface.

複數個端子P並列3行,形成行R1、行R2及行R3。屬於行R1之端子群作為用以傳遞依據PCIe規格之2信道量之差分信號對之信號端子使用。可於屬於行R2之端子群,配置各產品不同之任意可選信號用之信號端子。由於該信號端子對於記憶體器件10而言非必須之信號端子(換言之,由於對於記憶體器件10而言為可選之信號端子),故屬於該行R2之端子數亦可少於屬於其他行之端子數。於屬於行R3之端子群,配置各產品共用之控制信號、及電源用端子。該端子主要作為差分時脈信號用信號端子、共用之PCIe邊帶信號用信號端子、電源端子及其他端子使用。A plurality of terminals P are arranged in three rows to form a row R1, a row R2, and a row R3. The terminal group belonging to the row R1 is used as a signal terminal for transmitting a differential signal pair corresponding to 2 channels of the PCIe specification. The terminal group belonging to row R2 can be configured with signal terminals for any optional signal different from each product. Since the signal terminal is an unnecessary signal terminal for the memory device 10 (in other words, it is an optional signal terminal for the memory device 10), the number of terminals belonging to this row R2 can also be less than those belonging to other rows. The number of terminals. In the terminal group belonging to row R3, the control signal and power supply terminals common to each product are arranged. This terminal is mainly used as a signal terminal for differential clock signals, a signal terminal for shared PCIe sideband signals, a power supply terminal and other terminals.

如圖3所示,行R1包含:13個端子P101~端子P113,其於較第4緣34更靠近第1緣31之位置,彼此間隔排列於X軸方向。端子P101~端子P113於第1緣31附近,沿該第1緣31於X軸方向並列。As shown in FIG. 3 , the row R1 includes: 13 terminals P101 to P113 , which are arranged at intervals in the X-axis direction at a position closer to the first edge 31 than the fourth edge 34 . The terminal P101 to the terminal P113 are located in the vicinity of the first edge 31 , and are aligned in the X-axis direction along the first edge 31 .

行R2包含:6個端子P114~端子P119,其於較第1緣31更靠近第4緣34之位置,彼此間隔排列於X軸方向。端子P114~端子P116於較第3緣33更靠近第2緣32之位置,沿第4緣34於X軸方向並列。端子P117~端子P119於較第2緣32更靠近第3緣33之位置,沿第4緣34於X軸方向並列。換言之,端子P114~端子P116配置於X軸方向之記憶體器件10及本體11之中心線(一點鏈線所示)與第2緣32間,端子P117~端子P119配置於X軸方向之記憶體器件10及本體11之中心線與第3緣33間。屬於行R2之端子P116與端子P117間之間隔較屬於行R2,且於X軸方向上相鄰之其他端子間之間隔(具體而言,端子P114與端子P115之間隔、端子P115與端子P116之間隔、端子P117與端子P118之間隔、端子P118與端子P119之間隔)更廣。Row R2 includes: six terminals P114 to P119 , which are arranged at intervals in the X-axis direction at a position closer to the fourth edge 34 than the first edge 31 . The terminals P114 to P116 are arranged in parallel in the X-axis direction along the fourth edge 34 at a position closer to the second edge 32 than the third edge 33 . Terminals P117 to P119 are arranged in parallel in the X-axis direction along the fourth edge 34 at a position closer to the third edge 33 than the second edge 32 . In other words, terminals P114 to P116 are arranged between the center line of the memory device 10 and the main body 11 in the X-axis direction (shown by a chain line) and the second edge 32, and terminals P117 to P119 are arranged in the memory device in the X-axis direction Between the center line of the device 10 and the body 11 and the third edge 33 . The distance between the terminal P116 and the terminal P117 belonging to the row R2 is greater than the distance between other terminals adjacent to the row R2 in the X-axis direction (specifically, the distance between the terminal P114 and the terminal P115, the distance between the terminal P115 and the terminal P116 interval, interval between terminal P117 and terminal P118, interval between terminal P118 and terminal P119) is wider.

行R3包含:13個端子P120~端子P132,其於較第1緣31更靠近第4緣34之位置,彼此間隔排列於X軸方向。屬於行R3之端子P120~端子P132於較屬於行R2之端子P114~端子P119更靠近第4緣34之位置並列。The row R3 includes: 13 terminals P120 - P132 , which are arranged at intervals in the X-axis direction at a position closer to the fourth edge 34 than the first edge 31 . The terminals P120 to P132 belonging to the row R3 are arranged in parallel at a position closer to the fourth edge 34 than the terminals P114 to P119 belonging to the row R2.

第2緣32與第3緣33間之長度特定之情形時,X軸方向上相鄰端子P間之距離根據例如端子P之數決定。再者,根據X軸方向上相鄰之端子P之寬度、與相鄰之端子P間之最小距離,決定於X軸方向並列之端子P之最大數。將與連接器接點之接觸部之偏差考慮在內,決定可確實接觸之墊寬與相鄰墊間距離。X軸方向之複數個端子P間之距離可均等,亦可不同。本實施形態中,由於屬於行R1及行R3之端子P之數相同,屬於行R2之端子P之數少於其他行,故行R2之端子間隔亦可與行R1及行R3之端子間隔不同。When the length between the second edge 32 and the third edge 33 is specified, the distance between adjacent terminals P in the X-axis direction is determined by, for example, the number of terminals P. Furthermore, the maximum number of terminals P paralleled in the X-axis direction is determined according to the width of the adjacent terminals P in the X-axis direction and the minimum distance between adjacent terminals P. Taking into account the deviation of the contact part with the connector contact, determine the pad width and the distance between adjacent pads that can be reliably contacted. The distances between the plurality of terminals P in the X-axis direction may be equal or different. In this embodiment, since the number of terminals P belonging to row R1 and row R3 is the same, and the number of terminals P belonging to row R2 is less than that of other rows, the terminal spacing of row R2 can also be different from that of row R1 and row R3 .

如圖3所示,Y軸方向之行R1與行R3間之距離D1長於Y軸方向之行R1與第1緣31間之距離D2、及Y軸方向之行R3與第4緣34間之距離D3。As shown in FIG. 3 , the distance D1 between the row R1 and the row R3 in the Y-axis direction is longer than the distance D2 between the row R1 and the first edge 31 in the Y-axis direction, and the distance between the row R3 and the fourth edge 34 in the Y-axis direction. Distance D3.

圖3之例中,行R1、行R2及行R3各者之端子P之Y軸方向之長度設定為相同。即,行R1、行R2及行R3各者之端子P以該端子P之Y軸之負方向及Y軸之正方向之端同時對齊之方式並列。In the example of FIG. 3, the length of the Y-axis direction of the terminal P of row R1, row R2, and row R3 is set to be the same. That is, the terminals P of each of the row R1, the row R2, and the row R3 are aligned so that the ends of the terminals P in the negative direction of the Y-axis and in the positive direction of the Y-axis are aligned at the same time.

圖4係顯示記憶體器件10之外形形狀、供該記憶體器件10安裝之主機機器內之連接器100之外形形狀、貼附有熱傳導構件(TIM:Thermal Interface Material:導熱介面材料)107之區域之配置例之俯視圖。圖4(A)係顯示記憶體器件10之外形形狀及與貼附TIM107之區域接觸之區域(以下稱為接觸區域)A1之俯視圖,圖4(B)係顯示連接器100之外形形狀與貼附有TIM107之區域(以下稱為貼附區域)A2之俯視圖。記憶體器件10將圖4(A)所示之端子面設為下,自圖4(B)所示之連接器100之上安裝。圖5係顯示記憶體器件10安裝於連接器100之狀態之側視圖。FIG. 4 shows the external shape of the memory device 10, the external shape of the connector 100 in the host machine where the memory device 10 is installed, and the area where a thermally conductive member (TIM: Thermal Interface Material: Thermal Interface Material) 107 is attached. The top view of the configuration example. Fig. 4 (A) is a top view showing the shape of the memory device 10 and the area (hereinafter referred to as the contact area) A1 that is in contact with the area where the TIM107 is attached. The top view of the area with TIM107 (hereinafter referred to as the attachment area) A2. The memory device 10 is mounted from above the connector 100 shown in FIG. 4(B) with the terminal surface shown in FIG. 4(A) set downward. FIG. 5 is a side view showing a state where the memory device 10 is mounted on the connector 100 .

於圖4(A)所示之供記憶體器件10安裝之連接器100,如圖4(B)所示,以對應於記憶體器件10之行R1、行R2及行R3之方式,複數個引線框架配置成行r1、行r2及行r3之3行。亦有將引線框架稱為彈簧引線之情形。於行r1配置有與排成記憶體器件10之行R1之13個端子P101~端子P113對應之13個引線框架101。同樣,於行r2配置與排成記憶體器件10之行R2之6個端子P114~端子P119對應之6個引線框架102,於行r3配置有與排成記憶體器件10之行R3之13個端子P120~端子P132對應之13個引線框架103。The connector 100 for mounting the memory device 10 shown in FIG. 4(A), as shown in FIG. The lead frames are arranged in three rows of row r1, row r2, and row r3. There are also cases where the lead frame is called a spring lead. Thirteen lead frames 101 corresponding to the thirteen terminals P101 to P113 arranged in the row R1 of the memory devices 10 are arranged in the row r1. Similarly, 6 lead frames 102 corresponding to the 6 terminals P114 to P119 of the row R2 of the memory device 10 are arranged on the row r2, and 13 lead frames 102 corresponding to the row R3 of the memory device 10 are arranged on the row r3. The 13 lead frames 103 correspond to the terminals P120 - P132 .

圖4(B)中,形成行r1、行r2及行r3之引線框架101~引線框架103之Y軸方向之長度相同。但,引線框架101~引線框架103之Y軸方向之長度不限於該例。例如,引線框架101~引線框架103之Y軸方向之長度亦可互不相同。In FIG. 4(B), the lengths in the Y-axis direction of the lead frames 101 to 103 forming the row r1 , the row r2 , and the row r3 are the same. However, the lengths in the Y-axis direction of the lead frames 101 to 103 are not limited to this example. For example, the lengths of the lead frames 101 to 103 in the Y-axis direction may also be different from each other.

如圖4(B)所示,引線框架101~引線框架103分別具有引線框架端子104與安裝部105。引線框架端子104為與形成記憶體器件10之行R1、行R2及行R3之複數個端子P之各者接觸(點接觸)之部分。安裝部105為引線框架101~引線框架103安裝於主機機器內之印刷電路基板上時,與該印刷電路基板相接之部分。換言之,安裝部105為引線框架101~引線框架103安裝於主機機器內之印刷電路基板上時,固定於該印刷電路基板上之部分。As shown in FIG. 4(B) , lead frames 101 to 103 each have lead frame terminals 104 and mounting portions 105 . The lead frame terminal 104 is a portion in contact (point contact) with each of the plurality of terminals P forming the row R1 , row R2 , and row R3 of the memory device 10 . The mounting portion 105 is a portion that is in contact with the printed circuit board in the host device when the lead frames 101 to 103 are mounted on the printed circuit board. In other words, the mounting part 105 is a part fixed on the printed circuit board of the host device when the lead frames 101 - 103 are mounted on the printed circuit board.

若記憶體器件10安裝於連接器100,則連接器100之引線框架101~引線框架103之引線框架端子104與形成行R1、行R2及行R3之複數個端子P之各者接觸。If the memory device 10 is mounted on the connector 100 , the lead frame terminals 104 of the lead frames 101 to 103 of the connector 100 are in contact with each of the plurality of terminals P forming the rows R1 , R2 and R3 .

若引線框架101~引線框架103之引線框架端子104與端子P接觸,則配置於主機機器之系統基板上之主機控制部、與記憶體器件10之控制器14電性連接。If the lead frame terminals 104 of the lead frames 101 to 103 are in contact with the terminal P, the host control unit disposed on the system substrate of the host machine is electrically connected to the controller 14 of the memory device 10 .

另,圖4(B)中,形成行r1之引線框架101之引線框架端子104朝向Y軸之負方向。形成行r2之引線框架102之引線框架端子104朝向Y軸之負方向。形成行r3之引線框架103之引線框架端子104朝向Y軸之正方向。又,形成行r1及行r2、行r3之引線框架端子104亦可朝向相反側。In addition, in FIG. 4(B), the lead frame terminal 104 of the lead frame 101 forming the row r1 faces the negative direction of the Y axis. The lead frame terminals 104 of the lead frames 102 forming the row r2 face the negative direction of the Y axis. The lead frame terminal 104 of the lead frame 103 forming the row r3 faces the positive direction of the Y axis. In addition, the lead frame terminals 104 forming the row r1, the row r2, and the row r3 may face the opposite side.

如圖4(B)所示,連接器100具備安裝有記憶體器件10時,支持該記憶體器件10之連接器框架106。換言之,連接器100具備安裝有記憶體器件10時,收容該記憶體器件10之連接器框架106。如圖4(B)所示,連接器框架106具有第1緣111、第2緣112、第3緣113、第4緣114、連接部115、及缺口116。As shown in FIG. 4(B), the connector 100 has a connector frame 106 that supports the memory device 10 when the memory device 10 is installed therein. In other words, the connector 100 has a connector frame 106 for accommodating the memory device 10 when the memory device 10 is installed. As shown in FIG. 4(B), the connector frame 106 has a first edge 111 , a second edge 112 , a third edge 113 , a fourth edge 114 , a connecting portion 115 , and a notch 116 .

第1緣111於X軸方向延伸,朝向Y軸之負方向。第1緣111於安裝有記憶體器件10時,與該記憶體器件10之第1緣31相接。第1緣111於俯視時與形成行r1之引線框架101之安裝部105重疊,且與該安裝部105連接(接著)。The first edge 111 extends in the X-axis direction and faces the negative direction of the Y-axis. The first edge 111 is in contact with the first edge 31 of the memory device 10 when the memory device 10 is mounted. The first edge 111 overlaps the mounting portion 105 of the lead frame 101 forming the row r1 in a plan view, and is connected to (bonded to) the mounting portion 105 .

第2緣112於Y軸方向延伸,朝向X軸之負方向。第2緣112於安裝有記憶體器件10時,與該記憶體器件10之第3緣33相接。第3緣113於Y軸方向延伸,朝向X軸之正方向。第3緣113於安裝有記憶體器件10時,與該記憶體器件10之第2緣32相接。The second edge 112 extends in the Y-axis direction and faces the negative direction of the X-axis. The second edge 112 is in contact with the third edge 33 of the memory device 10 when the memory device 10 is mounted. The third edge 113 extends in the Y-axis direction and faces the positive direction of the X-axis. The third edge 113 is in contact with the second edge 32 of the memory device 10 when the memory device 10 is mounted.

第4緣114於X軸方向延伸,朝向Y軸之正方向。第4緣114於安裝有記憶體器件10時,與該記憶體器件10之第4緣34相接。第4緣114於俯視時與形成行r3之引線框架103之安裝部105重疊,且與該安裝部105連接(接著)。The fourth edge 114 extends in the X-axis direction and faces the positive direction of the Y-axis. The fourth edge 114 is in contact with the fourth edge 34 of the memory device 10 when the memory device 10 is mounted. The fourth edge 114 overlaps the mounting portion 105 of the lead frame 103 forming the row r3 in a plan view, and is connected to (bonded to) the mounting portion 105 .

連接部115於X軸方向延伸,位於第1緣111與第4緣114間,將第2緣112與第3緣113連接。連接部115於俯視時與形成行r2之引線框架102之安裝部105重疊,且與該安裝部105連接(接著)。The connecting portion 115 extends in the X-axis direction, is located between the first edge 111 and the fourth edge 114 , and connects the second edge 112 and the third edge 113 . The connecting portion 115 overlaps the mounting portion 105 of the lead frame 102 forming the row r2 in plan view, and is connected to (adhered to) the mounting portion 105 .

缺口116分別形成於第2緣112及第3緣113。如圖5所示,於記憶體器件10安裝於連接器100時用以固定該記憶體器件10之罩120之爪係扣在缺口116。The notches 116 are respectively formed on the second edge 112 and the third edge 113 . As shown in FIG. 5 , when the memory device 10 is mounted on the connector 100 , the claws of the cover 120 for fixing the memory device 10 are fastened to the notches 116 .

於圖4(B)中斜線所示之貼附區域A2,貼附有TIM107。更具體而言,如圖4(B)所示,於連接器100中,於行r1與行r2間之區域、及形成行r2之引線框架102中、與記憶體器件10之端子P116對應之引線框架102、及與記憶體器件10之端子P117對應之引線框架102間之區域,貼附有TIM107。TIM107貼附於主機機器內之印刷電路基板上。TIM107 is attached to the attaching area A2 indicated by oblique lines in FIG. 4(B). More specifically, as shown in FIG. 4(B), in the connector 100, in the region between the row r1 and the row r2, and in the lead frame 102 forming the row r2, corresponding to the terminal P116 of the memory device 10 The TIM 107 is attached to the lead frame 102 and the area between the lead frame 102 corresponding to the terminal P117 of the memory device 10 . TIM107 is attached to the printed circuit board in the host machine.

圖4(A)中以虛線包圍之接觸區域A1、及圖4(B)中斜線所示之貼附有TIM107之貼附區域A2,於記憶體器件10被安裝於連接器100時,於俯視下重疊。換言之,當記憶體器件10被安裝於連接器100時,該記憶體器件10於接觸區域A1中,與貼附於該連接器100之貼附區域A2的TIM107對向且接觸。In Fig. 4 (A), the contact area A1 surrounded by dotted lines and the attaching area A2 shown by oblique lines in Fig. 4 (B) with TIM107 attached, when the memory device 10 is mounted on the connector 100, in a top view Lower overlap. In other words, when the memory device 10 is mounted on the connector 100 , the memory device 10 faces and contacts the TIM 107 attached to the attachment area A2 of the connector 100 in the contact area A1 .

藉由將記憶體器件10之端子P如圖4(A)所示般配置,而可於供該記憶體器件10安裝之連接器100,如圖4(B)所示設置貼附TIM107之貼附區域A2。一般而言,於可卸除式記憶體器件中,以往乃藉由將經配置之端子用作為散熱用端子,而確保通往主機機器內之印刷電路基板之散熱路徑並進行散熱。然而,由於配置於記憶體器件之端子、與引線框架之引線框架端子僅為點接觸,故散熱面積較小,散熱效率差。又,由於引線框架之引線框架端子非焊接於主機機器內之印刷電路基板,因此會受到自引線框架之引線框架端子至引線框架之安裝部之長度部分之熱阻之影響,散熱效率差。By arranging the terminal P of the memory device 10 as shown in FIG. Attached area A2. In general, in removable memory devices, conventionally, by using the arranged terminals as terminals for heat dissipation, a heat dissipation path to a printed circuit board in a host machine is ensured and heat dissipation is performed. However, since the terminals disposed on the memory device and the lead frame terminals of the lead frame are only in point contact, the heat dissipation area is small and the heat dissipation efficiency is poor. Also, since the lead frame terminals of the lead frame are not welded to the printed circuit board in the host machine, it will be affected by the thermal resistance of the length from the lead frame terminals of the lead frame to the mounting portion of the lead frame, resulting in poor heat dissipation efficiency.

相對於此,本實施形態之記憶體器件10由於將形成行R2之端子P之數減為少於形成行R1或R3之端子P之數,實現圖4(A)所示之設置接觸區域A1之端子配置,故可於連接器100設置貼附TIM107之貼附區域A2。藉此,如圖5所示,記憶體器件10被安裝於連接器100時,該記憶體器件10於接觸區域A1中與TIM107面接觸,故與上述點接觸之情形相比,可擴張散熱面積,從而可提高散熱效率。In contrast, in the memory device 10 of this embodiment, since the number of terminals P forming the row R2 is reduced to be less than the number of terminals P forming the row R1 or R3, the contact region A1 shown in FIG. 4(A) is realized. Therefore, the attachment area A2 for attaching the TIM107 can be set on the connector 100. Thereby, as shown in FIG. 5, when the memory device 10 is mounted on the connector 100, the memory device 10 is in surface contact with the TIM 107 in the contact area A1, so that the heat dissipation area can be expanded compared with the point contact above. , which can improve the cooling efficiency.

此處,參照圖6,針對將本實施形態之記憶體器件10之形成行R3之端子P之至少一者用作為SCS(Sideband signal Configuration Select:邊帶信號配置選擇)端子用之情形進行說明。Here, referring to FIG. 6 , a case where at least one of the terminals P forming the row R3 of the memory device 10 of this embodiment is used as an SCS (Sideband Signal Configuration Select) terminal will be described.

圖6係用以說明使用記憶體器件10之端子P作為SCS端子之情形之圖。圖6(A)中,設想有使用記憶體器件10之屬於行R3之端子P132作為SCS端子之情形。另,圖6(A)中,設想有使用記憶體器件10之屬於行R3之端子P132作為SCS端子之情形,但不限於該例,亦可使用與記憶體器件10之屬於行R3之端子P132不同之端子P(端子P120~端子P131)作為SCS端子。又,圖6(A)中,設想有SCS端子為1個之情形,但不限於該例,SCS端子亦可設置有複數個。FIG. 6 is a diagram illustrating the use of the terminal P of the memory device 10 as the SCS terminal. In FIG. 6(A), it is assumed that the terminal P132 belonging to the row R3 of the memory device 10 is used as the SCS terminal. In addition, in FIG. 6(A), it is assumed that the terminal P132 belonging to the row R3 of the memory device 10 is used as the SCS terminal, but it is not limited to this example, and the terminal P132 belonging to the row R3 of the memory device 10 can also be used. Different terminals P (terminal P120 to terminal P131) are used as SCS terminals. In addition, in FIG. 6(A), the case where there is one SCS terminal is assumed, but it is not limited to this example, and a plurality of SCS terminals may be provided.

又,圖6(A)中,設想有使用記憶體器件10之屬於行R2之6個端子P114~端子P119中之4個端子P115~端子P118作為PCIe規格之邊帶信號用信號端子,且使用2個端子P114及端子P119作為GND(Ground:接地)用信號端子(接地端子)之情形。但,記憶體器件10之屬於行R2之6個端子P114~端子P119之分配不限於該例,亦可使用記憶體器件10之屬於行R2之6個端子P114~端子P119中之任意端子P,作為邊帶信號用信號端子,且使用任意端子P作為GND用信號端子。Also, in FIG. 6(A), it is envisaged to use four terminals P115 to P118 among the six terminals P114 to P119 belonging to the row R2 of the memory device 10 as signal terminals for sideband signals of the PCIe standard, and use The two terminals P114 and P119 are used as signal terminals (ground terminals) for GND (Ground). However, the distribution of the six terminals P114 to P119 belonging to the row R2 of the memory device 10 is not limited to this example, and any terminal P among the six terminals P114 to P119 belonging to the row R2 of the memory device 10 can also be used. As a signal terminal for sideband signals, an arbitrary terminal P is used as a signal terminal for GND.

SCS端子係用以傳遞自主機機器變更(選擇)邊帶信號之構成用之信號(以下,稱為選擇信號)之信號端子。自主機機器對SCS端子輸入High(高)位準之選擇信號或Low(低)位準之選擇信號。The SCS terminal is a signal terminal for transmitting a signal (hereinafter referred to as a selection signal) for changing (selecting) a sideband signal from a host device. Input the selection signal of High (high) level or the selection signal of Low (low) level to the SCS terminal from the host machine.

如圖6(B)所示,對SCS端子輸入High(高)位準之選擇信號之情形時,使用記憶體器件10之屬於行R2之端子P115,作為用於傳遞第1邊帶信號SB1之信號端子,使用端子P116作為用於傳遞第2邊帶信號SB2之信號端子,使用端子P117作為用於傳遞第3邊帶信號SB3之信號端子,使用端子P118作為用於傳遞第4邊帶信號SB4之信號端子。換言之,於對SCS端子輸入High(高)位準之選擇信號之情形時,使用記憶體器件10之屬於行R2之端子P115~端子P118,作為用於傳遞第1構成之邊帶信號SB1~邊帶信號SB4之信號端子。As shown in FIG. 6(B), when the selection signal of High (high) level is input to the SCS terminal, the terminal P115 belonging to the row R2 of the memory device 10 is used as the terminal for transmitting the first sideband signal SB1. Signal terminals, use terminal P116 as the signal terminal for transmitting the second sideband signal SB2, use terminal P117 as the signal terminal for transmitting the third sideband signal SB3, and use terminal P118 as the signal terminal for transmitting the fourth sideband signal SB4 the signal terminal. In other words, when a selection signal of a High (high) level is input to the SCS terminal, the terminals P115 to P118 belonging to the row R2 of the memory device 10 are used as the sideband signals SB1 to SB1 for transmitting the first configuration. Signal terminal with signal SB4.

另一方面,如圖6(B)所示,對SCS端子輸入Low(低)位準之選擇信號之情形時,使用記憶體器件10之屬於行R2之端子P115,作為用於傳遞第5邊帶信號SB5之信號端子,使用端子P116作為用於傳遞第6邊帶信號SB6之信號端子,使用端子P117作為用於傳遞第7邊帶信號SB7之信號端子,使用端子P118作為用於傳遞第8邊帶信號SB8之信號端子。換言之,於對SCS端子輸入Low(低)位準之選擇信號之情形時,使用記憶體器件10之屬於行R2之端子P115~端子P118,作為用於傳遞第2構成之邊帶信號SB5~邊帶信號SB8之信號端子。On the other hand, as shown in FIG. 6(B), when the selection signal of Low (low) level is input to the SCS terminal, the terminal P115 belonging to the row R2 of the memory device 10 is used as the terminal P115 for transmitting the fifth side. For the signal terminal with signal SB5, use terminal P116 as the signal terminal for transmitting the sixth sideband signal SB6, use terminal P117 as the signal terminal for transmitting the seventh sideband signal SB7, and use terminal P118 as the signal terminal for transmitting the eighth sideband signal Signal terminal for sideband signal SB8. In other words, when a selection signal of a Low (low) level is input to the SCS terminal, the terminals P115 to P118 belonging to the row R2 of the memory device 10 are used as the sideband signals SB5 to SB5 for transmitting the second configuration. Signal terminal with signal SB8.

另,圖6中,例示有傳遞第1構成與第2構成中彼此不同之邊帶信號之情形,但不限於該例,亦可傳遞第1構成與第2構成中一部分共通之邊帶信號。例如,亦可為端子P115及端子P116係於無論是對SCS端子輸入High(高)位準之選擇信號之情形、或輸入Low(低)位準之選擇信號之情形,皆用於傳遞第1邊帶信號SB1及第2邊帶信號SB2,且端子P117及端子P118係於對SCS端子輸入High(高)位準之選擇信號之情形,用於傳遞第3邊帶信號SB3及第4邊帶信號SB4,於對SCS端子輸入Low(低)位準之選擇信號之情形,則用於傳遞第5邊帶信號SB5及第6邊帶信號SB6。In addition, in FIG. 6 , the case of transmitting different sideband signals in the first configuration and the second configuration is illustrated, but the present invention is not limited to this example, and sideband signals that are partly common to the first configuration and the second configuration may be transmitted. For example, the terminal P115 and the terminal P116 can also be used to transmit the first selection signal regardless of whether the selection signal of the High (high) level is input to the SCS terminal or the selection signal of the Low (low) level is input. The sideband signal SB1 and the second sideband signal SB2, and the terminal P117 and terminal P118 are used to transmit the third sideband signal SB3 and the fourth sideband when the selection signal of the High (high) level is input to the SCS terminal The signal SB4 is used to transmit the fifth sideband signal SB5 and the sixth sideband signal SB6 when the selection signal of Low level is input to the SCS terminal.

圖7係顯示配置於主機機器之基板上之主機控制部201與開關202。FIG. 7 shows the host control unit 201 and the switch 202 arranged on the substrate of the host machine.

主機機器之基板上之開關202經由上拉電阻202A連接於連接器100內之端子103,進而連接於記憶體器件10之SCS端子P132。藉由固定開關202之接通或斷開,而可選擇SCS端子之位準。The switch 202 on the substrate of the host machine is connected to the terminal 103 in the connector 100 through the pull-up resistor 202A, and further connected to the SCS terminal P132 of the memory device 10 . The level of the SCS terminal can be selected by turning on or off the fixed switch 202 .

作為未圖示之方法,亦可藉由將主機控制部201之GPIO(General-purpose input/output:通用輸入輸出)輸出直接連接於連接器100內之端子103,而由主機控制部201選擇SCS端子之位準。再者,未選擇SCS端子之位準之情形時,亦可以上拉電阻或下拉電阻來固定位準。As a method not shown, it is also possible to select the SCS by the host control unit 201 by directly connecting the GPIO (General-purpose input/output) output of the host control unit 201 to the terminal 103 in the connector 100 terminal level. Furthermore, when the level of the SCS terminal is not selected, the level can also be fixed by a pull-up resistor or a pull-down resistor.

如圖7所示,開關202之一端接地,另一端連接於上拉電阻202A及與SCS端子接觸之引線框架103。若斷開開關202,則經由引線框架103對記憶體器件10之SCS端子輸入High(高)位準之選擇信號。若對SCS端子輸入High(高)位準之選擇信號,則如圖6(B)所示,屬於行R2之端子P115~端子P118作為用以傳遞第1構成之第1邊帶信號SB1~第4邊帶信號SB4之信號端子發揮功能。另一方面,若接通開關202,則經由引線框架103對記憶體器件10之SCS端子輸入Low(低)位準之選擇信號。若對SCS端子輸入Low(低)位準之選擇信號,則如圖6(B)所示,屬於行R2之端子P115~端子P118作為用以傳遞第5邊帶信號SB5~第8邊帶信號SB8之信號端子發揮功能。As shown in FIG. 7 , one end of the switch 202 is grounded, and the other end is connected to the pull-up resistor 202A and the lead frame 103 in contact with the SCS terminal. When the switch 202 is turned off, a selection signal of High level is input to the SCS terminal of the memory device 10 through the lead frame 103 . If the selection signal of High (high) level is input to the SCS terminal, as shown in Figure 6(B), the terminals P115-P118 belonging to the row R2 are used to transmit the first sideband signals SB1-SB of the first configuration. The signal terminal of the 4 sideband signal SB4 functions. On the other hand, when the switch 202 is turned on, a selection signal of Low level is input to the SCS terminal of the memory device 10 through the lead frame 103 . If the selection signal of Low (low) level is input to the SCS terminal, as shown in Figure 6(B), terminals P115 to P118 belonging to row R2 are used to transmit the fifth sideband signal SB5 to the eighth sideband signal The signal terminal of SB8 functions.

接著,參照圖8,針對供給至本實施形態之記憶體器件10之電源電壓進行說明。Next, the power supply voltage supplied to the memory device 10 of this embodiment will be described with reference to FIG. 8 .

圖8係顯示第1代記憶體器件10a與第2代記憶體器件10b之外形形狀之俯視圖。第1代記憶體器件10a構成為以自外部供給之n種(其中,n≧2)電源電壓進行動作。另一方面,第2代記憶體器件10b構成為以自外部供給之m種(其中,n>m≧1,n及m為自然數)電源電壓進行動作。因此,第1代記憶體器件10a與第2代記憶體器件10b有混雜存在於市場上之可能性。以下,設想第1代記憶體器件10a為以2種電源電壓動作之方式構成之記憶裝置之情形,將該記憶體器件10a稱為2電源記憶體器件。另一方面,將記憶體器件10b稱為1電源記憶體器件。FIG. 8 is a top view showing the external shapes of the first-generation memory device 10a and the second-generation memory device 10b. The first-generation memory device 10a is configured to operate with n types (where n≧2) of power supply voltages supplied from the outside. On the other hand, the second-generation memory device 10b is configured to operate with m types of (where n>m≧1, n and m are natural numbers) power supply voltages supplied from the outside. Therefore, there is a possibility that the first-generation memory device 10a and the second-generation memory device 10b are mixed in the market. Hereinafter, assuming that the first-generation memory device 10a is a memory device configured to operate with two power supply voltages, the memory device 10a is referred to as a two-power supply memory device. On the other hand, the memory device 10b is referred to as a 1-power supply memory device.

如2電源記憶體器件10a般之第1代記憶體器件之製造及出貨開始後經過一段時間,如1電源記憶體器件10b般之第2代記憶體器件之製造及出貨開始之情形,如上所述,出現規格彼此不同之第1代記憶體器件與第2代記憶體器件混雜之環境。When a period of time has elapsed since the start of manufacturing and shipping of the first-generation memory device such as the 2-power supply memory device 10a, and the start of the manufacture and shipment of the second-generation memory device such as the 1-power supply memory device 10b, As described above, there is an environment where first-generation memory devices and second-generation memory devices having different specifications are mixed.

因此,例如製造如資訊處理裝置般之主機機器之產品製造線中,有進行以供給2種電源電壓之方式構成之第1型主機之製造及動作測試、及以供給1種電源電壓之方式構成之第2型主機之製造及動作測試之情形。Therefore, for example, in a product manufacturing line that manufactures a host device such as an information processing device, there are manufacturing and operation tests of a first-type host configured to supply two power supply voltages, and a configuration configured to supply a single power supply voltage. The manufacture and operation test of the Type 2 host.

第1型主機係以對安裝於主機機器內之連接器之2電源記憶體器件10a供給2種電源電壓之方式構成之資訊處理裝置。另一方面,第2型主機係以對安裝於主機機器內之連接器之1電源記憶體器件10b供給1種電源電壓之方式構成之資訊處理裝置。The first type host is an information processing device configured to supply two types of power supply voltages to a 2-power supply memory device 10a mounted on a connector in the host machine. On the other hand, the type 2 host is an information processing device configured to supply one power supply voltage to one power supply memory device 10b mounted on a connector in the host device.

2電源記憶體器件10a與1電源記憶體器件10b具有相同記憶體器件形狀之情形時,於產品製造線中,可能產生以1電源記憶體器件10b錯誤安裝於第1型主機之連接器之狀態,進行第1型主機之動作測試之實例、或以2電源記憶體器件10a錯誤安裝於第2型主機之連接器之狀態,進行第2型主機之動作測試之實例。When the 2-power supply memory device 10a and the 1-power supply memory device 10b have the same memory device shape, in the product manufacturing line, the state that the 1-power supply memory device 10b may be wrongly mounted on the connector of the first type host , the example of carrying out the action test of the first type host, or the example of carrying out the action test of the second type host with the state that the 2-power supply memory device 10a is wrongly installed in the connector of the second type host.

主機機器之動作測試中,將主機機器接通電源,藉此,主機機器將對應於該主機機器之類型之幾種電源電壓供給至記憶體器件。若以自主機機器供給之電源電壓不匹配記憶體器件之電源構成之狀態,執行主機機器之動作測試,則有產生對記憶體器件施加動作保證外之電壓而使之損壞之流通大電流並著火之所謂之不良之虞。In the operation test of the host machine, the host machine is powered on, whereby the host machine supplies several power supply voltages corresponding to the type of the host machine to the memory device. If the power supply voltage supplied from the host machine does not match the power supply configuration of the memory device, and the operation test of the host machine is performed, there will be a large current flowing through the memory device that is damaged by applying a voltage other than the operation guarantee and causing fire. The so-called risk of bad.

因此,為了抑制此種不良之產生,考慮將2電源記憶體器件10a與1電源記憶體器件10b之記憶體器件形狀設為不同形狀,藉此可區別2電源記憶體器件10a與1電源記憶體器件10b。例如,考慮如圖8(A)所示,於2電源記憶體器件10a中,如倒角部C般形成第1角部35,相對於此,於1電源記憶體器件10b中,如圖8(B)所示,如倒角部C般形成第2角部36。藉此,因無法於第1型主機之連接器安裝1電源記憶體器件10b、及無法於第2型主機之連接器安裝2電源記憶體器件10a,故可抑制上述不良之產生。Therefore, in order to suppress the occurrence of such defects, it is conceivable to make the memory device shapes of the 2-power supply memory device 10a and the 1-power supply memory device 10b different, so that the 2-power supply memory device 10a and the 1-power supply memory device can be distinguished. Device 10b. For example, consider that, as shown in FIG. 8(A), in the 2-power supply memory device 10a, the first corner 35 is formed like a chamfered portion C. On the other hand, in the 1-power supply memory device 10b, as shown in FIG. 8 As shown in (B), the second corner portion 36 is formed like the chamfered portion C. As shown in FIG. Thereby, since the 1-power supply memory device 10b cannot be mounted on the connector of the first-type mainframe, and the 2-power supply memory device 10a cannot be mounted on the connector of the second-type mainframe, the occurrence of the above-mentioned defects can be suppressed.

圖8中,對藉由將2電源記憶體器件10a與1電源記憶體器件10b之記憶體器件形狀設為彼此不同之形狀,而抑制1電源記憶體器件10b錯誤安裝於第1型主機之連接器、及2電源記憶體器件10a錯誤安裝於第2型主機之連接器之情形進行說明。另一方面,考慮使用記憶體器件10之形成行R3之端子P之至少一者,作為PCD(Power Configuration Detect:電源配置檢測)端子,藉此抑制上述問題之產生。以下,參照圖9,對使用本實施形態之記憶體器件10之形成行R3之端子P之至少一者作為PCD端子之情形進行說明。In FIG. 8 , by making the memory device shapes of the 2-power supply memory device 10a and the 1-power supply memory device 10b different from each other, it is possible to prevent the 1-power supply memory device 10b from being wrongly mounted on the first type host. The situation that the device and the memory device 10a of the 2 power supply are incorrectly installed in the connector of the second type host will be described. On the other hand, it is conceivable to use at least one of the terminals P forming the row R3 of the memory device 10 as a PCD (Power Configuration Detect: Power Configuration Detect) terminal, thereby suppressing the occurrence of the above-mentioned problems. Hereinafter, a case where at least one of the terminals P forming the row R3 of the memory device 10 of the present embodiment is used as a PCD terminal will be described with reference to FIG. 9 .

圖9係用以說明使用記憶體器件10之端子P作為PCD端子之情形之圖。圖9(A)中,設想有使用記憶體器件10之屬於行R3之端子P131作為PCD端子之情形。又,圖9(A)中,設想有與圖6(A)之情形同樣,使用記憶體器件10之屬於行R3之端子P132作為SCS端子之情形。另,圖9(A)中,設想有使用記憶體器件10之屬於行R3之端子P131作為PCD端子之情形,但不限於該例,亦可使用記憶體器件10之與屬於行R3之端子P131及端子P132不同之端子P(端子P120~端子P130)作為PCD端子。又,圖9(A)中,設想有PCD端子為1個之情形,但不限於該例,PCD端子亦可設置有複數個。FIG. 9 is a diagram illustrating the use of the terminal P of the memory device 10 as a PCD terminal. In FIG. 9(A), it is assumed that the terminal P131 belonging to the row R3 of the memory device 10 is used as a PCD terminal. In addition, in FIG. 9(A), it is assumed that the terminal P132 belonging to the row R3 of the memory device 10 is used as the SCS terminal, as in the case of FIG. 6(A). In addition, in FIG. 9(A), it is envisaged to use the terminal P131 belonging to the row R3 of the memory device 10 as the PCD terminal, but it is not limited to this example, and the terminal P131 belonging to the row R3 of the memory device 10 can also be used. Terminal P (terminal P120 to terminal P130 ) different from terminal P132 is used as a PCD terminal. Moreover, in FIG. 9(A), the case where there is one PCD terminal is assumed, but it is not limited to this example, and a plurality of PCD terminals may be provided.

PCD端子係用以傳遞檢測記憶體器件10之電源構成用之信號(以下,稱為檢測信號)之信號端子。自PCD端子對主機機器輸出High(高)位準之檢測信號或Low(低)位準之檢測信號。The PCD terminal is a signal terminal for transmitting a signal for detecting the power supply configuration of the memory device 10 (hereinafter referred to as a detection signal). Output a High (high) level detection signal or a Low (low) level detection signal to the host machine from the PCD terminal.

如圖9(B)所示,自PCD端子輸出High(高)位準之檢測信號之情形時,主機機器辨識記憶體器件10之電源構成為2電源。換言之,自PCD端子輸出High(高)位準之檢測信號之情形時,主機機器辨識安裝於連接器100之記憶體器件為2電源記憶體器件10a。另一方面,自PCD端子輸出Low(低)位準之檢測信號之情形時,主機機器辨識記憶體器件10之電源構成為1電源。換言之,自PCD端子輸出Low(低)位準之檢測信號之情形時,主機機器辨識出安裝於連接器100之記憶體器件為1電源記憶體器件10b。As shown in FIG. 9(B), when a detection signal of High level is output from the PCD terminal, the host device recognizes that the power supply of the memory device 10 is configured as two power supplies. In other words, when the detection signal of High level is output from the PCD terminal, the host device recognizes the memory device mounted on the connector 100 as the 2-power supply memory device 10a. On the other hand, when the detection signal of the Low level is output from the PCD terminal, the host device recognizes that the power supply configuration of the memory device 10 is 1 power supply. In other words, when the detection signal of Low level is output from the PCD terminal, the host machine recognizes that the memory device mounted on the connector 100 is the 1-power memory device 10b.

圖10係顯示連接於1電源記憶體器件10b之PCD端子之內部電路、與連接於2電源記憶體器件10a之內部電路。FIG. 10 shows the internal circuit connected to the PCD terminal of the 1-power memory device 10b and the internal circuit connected to the 2-power memory device 10a.

如圖10(A)所示,1電源記憶體器件10b之PCD端子於裝置10b內連接於GND。因此,於主機控制部201之控制下,若將第1電源電壓供給至1電源記憶體器件10b,則成為GND接地,且自該1電源記憶體器件10b之PCD端子輸出Low(低)位準之檢測信號。As shown in FIG. 10(A), the PCD terminal of the power supply memory device 10b is connected to GND in the device 10b. Therefore, under the control of the host control unit 201, when the first power supply voltage is supplied to the first power supply memory device 10b, GND is grounded, and a Low (low) level is output from the PCD terminal of the first power supply memory device 10b. the detection signal.

另一方面,如圖10(B)所示,2電源記憶體器件10a之PCD端子接通。因此,經由主機機器之基板上之上拉電阻對主機機器輸入High(高)。On the other hand, as shown in FIG. 10(B), the PCD terminal of the 2-power supply memory device 10a is turned on. Therefore, input High (high) to the host machine through the pull-up resistor on the substrate of the host machine.

根據圖10所示之構成,主機機器(主機控制部201)可根據能夠於供給第1電源電壓之時點輸出之檢測信號之位準,辨識記憶體器件10之電源構成,並可決定第2電源電壓有無供給,因而可抑制上述不良之產生。According to the structure shown in FIG. 10, the host device (host control unit 201) can identify the power supply configuration of the memory device 10 according to the level of the detection signal that can be output at the point when the first power supply voltage is supplied, and can determine the second power supply. Whether the voltage is supplied or not, so the occurrence of the above-mentioned defects can be suppressed.

此處,參照圖11,對使用本實施形態之記憶體器件10之一個端子P作為SCS端子或作為PCD端子之情形進行說明。圖11係用以說明使用記憶體器件10之一個端子P作為SCS端子或作為PCD端子之情形之圖。Here, referring to FIG. 11, a case where one terminal P of the memory device 10 of this embodiment is used as an SCS terminal or as a PCD terminal will be described. FIG. 11 is a diagram illustrating the use of one terminal P of the memory device 10 as an SCS terminal or as a PCD terminal.

如上所述,SCS端子為用以輸入選擇信號而使用之信號端子,PCD端子為用以輸出檢測信號而使用之信號端子。因此,只要輸入選擇信號之時序與輸出檢測信號之時序不覆蓋,即可使一個端子P具有SCS端子與PCD端子之兩者之功能。As described above, the SCS terminal is a signal terminal used to input a selection signal, and the PCD terminal is a signal terminal used to output a detection signal. Therefore, as long as the timing of the input selection signal and the timing of the output detection signal do not overlap, one terminal P can have the functions of both the SCS terminal and the PCD terminal.

為了使一個端子P具有SCS端子與PCD端子之兩者之功能,如圖11(A)所示,例如於主機機器之主機控制部201、與作為SCS端子及PCD端子發揮功能之一個端子P接觸之引線框架103間,設置三態緩衝器203。三態緩衝器203亦可內包於主機控制部201。In order to make one terminal P have the functions of both the SCS terminal and the PCD terminal, as shown in FIG. A tri-state buffer 203 is provided between the lead frames 103 . The tri-state buffer 203 can also be included in the host control unit 201 .

如圖11(B)所示,使一個端子P作為SCS端子發揮功能之情形時,自主機控制部201對三態緩衝器203輸入Low(低)位準之切換信號。該情形時,三態緩衝器203將自主機控制部201輸出之選擇信號向記憶體器件10直接輸出,因而可使一個端子P作為SCS端子發揮功能。As shown in FIG. 11(B), when making one terminal P function as an SCS terminal, a switching signal of a Low level is input to the tri-state buffer 203 from the host controller 201 . In this case, since the tri-state buffer 203 directly outputs the selection signal output from the host control unit 201 to the memory device 10, one terminal P can function as an SCS terminal.

另,於主機控制部201之控制下,若將第2電源電壓供給至2電源記憶體器件10a,則開關15斷開,用以供給第1電源電壓之配線與上拉電阻之連接亦可斷開。或者,若設有未圖示之斷開電路,將第2電源電壓供給至2電源記憶體器件10a,執行初始化序列,則可藉由該斷開電路,將用以供給第1電源電壓之配線與上拉電阻之連接斷開。藉此,可抑制自PCD端子輸出檢測信號後之上拉電阻引起之多餘之電力消耗。In addition, under the control of the host control unit 201, if the second power supply voltage is supplied to the two-power supply memory device 10a, the switch 15 is turned off, and the connection between the wiring for supplying the first power supply voltage and the pull-up resistor can also be disconnected. open. Alternatively, if an unshown disconnection circuit is provided to supply the second power supply voltage to the two-power supply memory device 10a and execute the initialization sequence, the wiring for supplying the first power supply voltage can be disconnected by the disconnection circuit. The connection to the pull-up resistor is disconnected. Thereby, unnecessary power consumption caused by the pull-up resistor after outputting the detection signal from the PCD terminal can be suppressed.

另一方面,使一個端子P作為PCD端子發揮功能之情形時,如圖11(B)所示,自主機控制部201對三態緩衝器203輸入High(高)位準之切換信號。若自主機控制部201輸入High(高)位準之切換信號,則三態緩衝器203成為高阻抗狀態,且成為電性斷開狀態,因而不自三態緩衝器203向記憶體器件10輸出信號,可使一個端子P作為PCD端子發揮功能。On the other hand, when making one terminal P function as a PCD terminal, as shown in FIG. If the switching signal of High (high) level is input from the host control unit 201, the tri-state buffer 203 will be in a high-impedance state and will be in an electrically disconnected state, so no output will be output from the tri-state buffer 203 to the memory device 10. signal, one terminal P can function as a PCD terminal.

圖12係顯示使用本實施形態之記憶體器件10之一個端子P作為SCS端子或作為PCD端子之情形之動作之一例之時序圖。FIG. 12 is a timing chart showing an example of the operation when one terminal P of the memory device 10 of this embodiment is used as the SCS terminal or as the PCD terminal.

如圖12所示,於第1時序T1下,主機控制部201開始High(高)位準切換信號對三態緩衝器203之輸出。藉此,記憶體器件10之特定端子P作為PCD端子發揮功能。接著,於第2時序T2下,於主機控制部201之控制下,開始將第1電源電壓供給至記憶體器件10。若開始將第1電源電壓供給至記憶體器件10,則於第3時序T3下,對主機控制部201輸入由記憶體器件10之PCD端子輸出之檢測信號。藉此,主機控制部201可辨識記憶體器件10之電源構成,決定第2電源電壓有無供給。As shown in FIG. 12 , at the first timing T1 , the host control unit 201 starts to output the High (high) level switching signal to the tri-state buffer 203 . Thereby, the specific terminal P of the memory device 10 functions as a PCD terminal. Next, at the second time sequence T2 , under the control of the host control unit 201 , the first power supply voltage starts to be supplied to the memory device 10 . When the supply of the first power supply voltage to the memory device 10 starts, at the third timing T3, the detection signal output from the PCD terminal of the memory device 10 is input to the host control unit 201 . Thereby, the host control unit 201 can identify the power supply configuration of the memory device 10 and determine whether the second power supply voltage is supplied or not.

於辨識記憶體器件10之電源構成後之第4時序T4下,主機控制部201將對三態緩衝器203輸出之切換信號之位準自High(高)位準切換為Low(低)位準。藉此,記憶體器件10之上述特定端子P作為SCS端子發揮功能。以下,將High(高)位準或Low(低)位準之選擇信號自主機控制部201輸出至記憶體器件10,配置於記憶體器件10之邊帶信號用端子作為用以傳遞對應於High(高)位準選擇信號之第1構成之邊帶信號之信號端子、或用以傳遞對應於Low(低)位準選擇信號之第2構成之邊帶信號之信號端子使用。At the fourth timing T4 after identifying the power supply configuration of the memory device 10, the host control unit 201 switches the level of the switching signal output to the tri-state buffer 203 from High (high) level to Low (low) level . Thereby, the above-mentioned specific terminal P of the memory device 10 functions as an SCS terminal. Hereinafter, the selection signal of High (high) level or Low (low) level is output from the host control unit 201 to the memory device 10, and the sideband signal terminal disposed on the memory device 10 serves as a terminal for transmitting the signal corresponding to the High level. The signal terminal of the sideband signal of the first configuration of the (high) level selection signal, or the signal terminal of the sideband signal of the second configuration corresponding to the Low (low) level selection signal.

以下,對設置於記憶體器件10之複數個端子P之配置之變化例進行說明。另,以下,基本僅提及與圖4所示之端子配置不同之部分,省略與圖4同樣部分之說明。另,任一端子配置之Y軸方向之行R1與行R3間之距離皆長於Y軸方向之行R1與第1緣31間之距離、及Y軸方向之行R3與第4緣34間之距離。Hereinafter, a modification example of the arrangement of the plurality of terminals P provided in the memory device 10 will be described. In addition, below, basically only the parts different from the terminal arrangement shown in FIG. 4 are mentioned, and the description of the same parts as in FIG. 4 is omitted. In addition, the distance between the row R1 and the row R3 in the Y-axis direction of any terminal arrangement is longer than the distance between the row R1 in the Y-axis direction and the first edge 31, and the distance between the row R3 in the Y-axis direction and the fourth edge 34. distance.

(第1變化例) 圖13係顯示第1變化例之記憶體器件10A之外形形狀、供該記憶體器件10A安裝之主機機器內之連接器100A之外形形狀、及貼附有TIM107之區域之配置例之俯視圖。圖13(A)係顯示記憶體器件10A之外形形狀及與TIM107接觸之接觸區域A11之俯視圖,圖13(B)係顯示連接器100A之外形形狀與貼附有TIM107之貼附區域A21之俯視圖。(1st modification example) 13 is a plan view showing the shape of the memory device 10A of the first variation, the shape of the connector 100A in the host machine on which the memory device 10A is mounted, and the arrangement of the area where the TIM 107 is attached. Fig. 13(A) is a top view showing the shape of the memory device 10A and the contact area A11 in contact with the TIM107, and Fig. 13(B) is a top view showing the shape of the connector 100A and the attachment area A21 attached with the TIM107 .

圖13(A)所示之端子配置於形成行R2之6個端子P114~P119之位置較第4緣34更靠近第1緣31之點上,與圖4(A)所示之端子配置不同。The terminals shown in FIG. 13(A) are arranged at the point where the positions of the six terminals P114-P119 forming the row R2 are closer to the first edge 31 than the fourth edge 34, which is different from the terminal arrangement shown in FIG. 4(A) .

因此,圖13(A)所示之供記憶體器件10A安裝之連接器100A中,如圖13(B)所示,形成行r1之引線框架101之引線框架端子104朝向Y軸之負方向,形成行r2之引線框架102之引線框架端子104朝向Y軸之正方向,形成行r3之引線框架103之引線框架端子104朝向Y軸之正方向。Therefore, in the connector 100A for mounting the memory device 10A shown in FIG. 13(A), as shown in FIG. 13(B), the lead frame terminal 104 of the lead frame 101 forming the row r1 faces the negative direction of the Y axis, The lead frame terminals 104 of the lead frames 102 forming the row r2 face the positive direction of the Y axis, and the lead frame terminals 104 of the lead frames 103 forming the row r3 face the positive direction of the Y axis.

如圖13(B)所示,連接器100A中,於行r1與行r2間之區域、及形成行r2之引線框架102中,對應於記憶體器件10A之端子P116之引線框架102與對應於記憶體器件10A之端子P117之引線框架102間之區域,貼附有TIM107。於圖13(B)中斜線所示之貼附區域A21,貼附有TIM107。As shown in FIG. 13(B), in the connector 100A, in the region between the row r1 and the row r2, and in the lead frame 102 forming the row r2, the lead frame 102 corresponding to the terminal P116 of the memory device 10A is connected to the lead frame 102 corresponding to the terminal P116 of the memory device 10A. The TIM 107 is attached to the area between the lead frames 102 of the terminal P117 of the memory device 10A. The TIM 107 is attached to the attached area A21 indicated by oblique lines in FIG. 13(B).

圖13(A)中以虛線包圍之接觸區域A11、及圖13(B)中斜線所示之貼附有TIM107之貼附區域A21於記憶體器件10A安裝於連接器100A時,於俯視時重疊。換言之,記憶體器件10A安裝於連接器100A時,該記憶體器件10A之接觸區域A11與貼附於該連接器100A之貼附區域A21之TIM107對向且接觸。The contact area A11 surrounded by dotted lines in FIG. 13(A) and the attaching area A21 shown by oblique lines in FIG. 13(B) with TIM107 are overlapped when the memory device 10A is mounted on the connector 100A when viewed from above. . In other words, when the memory device 10A is mounted on the connector 100A, the contact area A11 of the memory device 10A faces and contacts the TIM 107 attached to the attachment area A21 of the connector 100A.

如上說明,藉由將記憶體器件10A之端子P如圖13(A)所示般配置,而可於供該記憶體器件10A安裝之連接器100A,如圖13(B)所示,設置貼附TIM107之貼附區域A21。換言之,由於記憶體器件10A之形成行R2之端子P之數少於形成行R1或R3之端子P之數,實現圖13(A)所示之設置接觸區域A11之端子配置,故可於連接器100A設置供TIM107貼附之貼附區域A21。藉此,記憶體器件10A安裝於連接器100A時,該記憶體器件10A於接觸區域A11中與TIM107面接觸,故與圖4所示之端子配置之情形同樣,可提高散熱效率。As explained above, by arranging the terminal P of the memory device 10A as shown in FIG. Attached area A21 of TIM107. In other words, since the number of terminals P forming the row R2 of the memory device 10A is less than the number of terminals P forming the row R1 or R3, the terminal arrangement for setting the contact area A11 shown in FIG. The device 100A is provided with an attaching area A21 for attaching the TIM 107. Thereby, when the memory device 10A is mounted on the connector 100A, the memory device 10A is in surface contact with the TIM 107 in the contact area A11, so that heat dissipation efficiency can be improved as in the case of the terminal arrangement shown in FIG. 4 .

(第2變化例) 圖14係顯示第2變化例之記憶體器件10B之外形形狀、供該記憶體器件10B安裝之主機機器內之連接器100B之外形形狀、及貼附有TIM107之區域之配置例之俯視圖。圖14(A)係顯示記憶體器件10B之外形形狀及與TIM107接觸之接觸區域A12之俯視圖,圖14(B)係顯示連接器100B之外形形狀與貼附有TIM107之貼附區域A22之俯視圖。(the second modification example) 14 is a top view showing the shape of the memory device 10B of the second modification, the shape of the connector 100B in the host machine on which the memory device 10B is mounted, and the arrangement of the region where the TIM 107 is attached. Figure 14(A) is a top view showing the shape of the memory device 10B and the contact area A12 contacting with the TIM107, and Figure 14(B) is a top view showing the shape of the connector 100B and the attachment area A22 attached with the TIM107 .

圖14(A)所示之端子配置於形成行R2之端子P之數自6個減少為3個之點上,與圖4(A)所示之端子配置不同。具體而言,圖14(A)所示之端子配置於圖4所示之端子P114~端子P116不作為形成行R2之端子P配置之點上,與圖4(A)所示之端子配置不同。The terminal arrangement shown in FIG. 14(A) differs from the terminal arrangement shown in FIG. 4(A) at the point where the number of terminals P forming the row R2 is reduced from six to three. Specifically, the terminal arrangement shown in FIG. 14(A) is different from the terminal arrangement shown in FIG. 4(A) at a point where the terminal P114 to the terminal P116 shown in FIG.

圖14(A)所示之形成行R2之3個端子P117~端子P119中,2個端子P117及端子P118作為PCIe規格之邊帶信號用信號端子使用,1個端子P119作為GND用信號端子使用。但,記憶體器件10B之屬於行R2之3個端子P117~端子P119之分配不限於該例,亦可使用記憶體器件10B之屬於行R2之3個端子P117~端子P119中之任意端子P,作為邊帶信號用信號端子,且使用任意端子P作為GND用信號端子。Of the three terminals P117 to P119 forming row R2 shown in Fig. 14(A), two terminals P117 and P118 are used as signal terminals for sideband signals of the PCIe standard, and one terminal P119 is used as a signal terminal for GND. . However, the allocation of the three terminals P117 to P119 belonging to the row R2 of the memory device 10B is not limited to this example, and any terminal P among the three terminals P117 to P119 belonging to the row R2 of the memory device 10B can be used. As a signal terminal for sideband signals, an arbitrary terminal P is used as a signal terminal for GND.

如圖14(B)所示,連接器100B中,於行r1與行r2間之區域、及對應於記憶體器件10B之端子P117之引線框架102與連接器框架106之第3緣113間之區域,貼附有TIM107。於圖14(B)中,斜線所示之貼附區域A22,貼附有TIM107。As shown in FIG. 14(B), in the connector 100B, between the region between the row r1 and the row r2, and between the lead frame 102 corresponding to the terminal P117 of the memory device 10B and the third edge 113 of the connector frame 106 area, with TIM107 attached. In FIG. 14(B), the sticking area A22 indicated by oblique lines has the TIM 107 stuck thereto.

圖14(A)中以虛線包圍之接觸區域A12、及圖14(B)中斜線所示之貼附有TIM107之貼附區域A22於記憶體器件10B安裝於連接器100B時,於俯視時重疊。換言之,記憶體器件10B安裝於連接器100B時,該記憶體器件10B於接觸區域A12中,與貼附於該連接器100B之貼附區域A22之TIM107對向且接觸。The contact area A12 surrounded by dotted lines in FIG. 14(A) and the attaching area A22 shown by oblique lines in FIG. 14(B) with TIM107 attached thereto overlap when the memory device 10B is mounted on the connector 100B when viewed from above. . In other words, when the memory device 10B is mounted on the connector 100B, the memory device 10B is in the contact area A12, facing and in contact with the TIM 107 attached to the attachment area A22 of the connector 100B.

如上說明,藉由將記憶體器件10B之端子P如圖14(A)所示般配置,可於供該記憶體器件10B安裝之連接器100B,如圖14(B)所示,設置貼附TIM107之貼附區域A22。換言之,由於記憶體器件10B之形成行R2之端子P之數少於形成行R1或R3之端子P之數,且實現圖14(A)所示之設置接觸區域A12之端子配置,故可於連接器100B設置供TIM107貼附之貼附區域A22。另,根據圖14所示之端子配置而設置之接觸區域A12,相較於根據圖4及圖13所示之端子配置而設置之接觸區域A1及接觸區域A11變大相當於將形成行R2之端子數自6個減少為3個之部分。因此,圖14所示之端子配置與圖4及圖13所示之端子配置相比,可擴張與TIM107面接觸之面積,可進而提高散熱效率。As explained above, by arranging the terminal P of the memory device 10B as shown in FIG. Attachment area A22 of TIM107. In other words, since the number of terminals P forming the row R2 of the memory device 10B is less than the number of terminals P forming the row R1 or R3, and the terminal configuration of the contact area A12 shown in FIG. 14(A) is realized, it can be used in The connector 100B is provided with an attaching area A22 for attaching the TIM 107 . In addition, the contact area A12 provided according to the terminal configuration shown in FIG. 14 is larger than the contact area A1 and the contact area A11 provided according to the terminal configuration shown in FIG. 4 and FIG. The number of terminals is reduced from 6 to 3. Therefore, compared with the terminal configuration shown in FIG. 4 and FIG. 13 , the terminal configuration shown in FIG. 14 can expand the surface contact area with the TIM 107 and further improve the heat dissipation efficiency.

另,圖14中顯示非將圖4所示之端子P114~端子P116作為形成行R2之端子P配置,而將端子P117~端子P119作為形成行R2之端子P配置的端子配置,但端子之配置不限於此。例如,亦可為非將圖4所示之端子P117~端子P119作為形成行R2之端子P配置,而將端子P114~端子116作為形成行R2之端子P配置的端子配置。該端子配置亦可獲得與圖14所示之端子配置同樣之效果。In addition, Fig. 14 shows that the terminal P114 to the terminal P116 shown in Fig. 4 are not arranged as the terminals P that form the row R2, but the terminal P117 to the terminal P119 are arranged as the terminals P that form the row R2. However, the arrangement of the terminals Not limited to this. For example, instead of disposing the terminals P117 to P119 shown in FIG. 4 as the terminals P forming the row R2, terminals P114 to 116 may be arranged as the terminals P forming the row R2. Also in this terminal arrangement, the same effect as that of the terminal arrangement shown in FIG. 14 can be obtained.

又,圖14中,顯示有將形成行R2之端子P117~端子P119設置於較記憶體器件10B之第1緣31更靠近第4緣34之位置之情形,但不限於此,亦可為例如形成行R2之端子P117~端子P119設置於較記憶體器件10B之第4緣34更靠近第1緣31之位置之端子配置。該端子配置亦可獲得與圖14所示之端子配置同樣之效果。In addition, in FIG. 14 , it is shown that the terminal P117 to the terminal P119 forming the row R2 are arranged at a position closer to the fourth edge 34 than the first edge 31 of the memory device 10B, but it is not limited to this, and it may be, for example, The terminals P117 to P119 forming the row R2 are arranged in a terminal arrangement that is located closer to the first edge 31 than the fourth edge 34 of the memory device 10B. Also in this terminal arrangement, the same effect as that of the terminal arrangement shown in FIG. 14 can be obtained.

再者,亦可將圖4(A)之記憶體器件10安裝於圖14(B)之連接器100B。該情形時,行R2之端子P114~端子P116與TIM107接觸,但使用絕緣性之TIM以避免短路,或者將未連接之端子P114~端子P116在預設狀態下設為可接通,不會成為輸出模式,且輸入亦為貫通電流防止型之I/O胞元。Moreover, the memory device 10 of FIG. 4(A) can also be mounted on the connector 100B of FIG. 14(B). In this case, terminals P114 to P116 of row R2 are in contact with TIM107, but an insulating TIM is used to avoid a short circuit, or the unconnected terminals P114 to P116 are set to be connected in the default state, which will not become Output mode, and the input is also an I/O cell of the through-current prevention type.

(第3變化例) 圖15係顯示第3變化例之記憶體器件10C之外形形狀、供該記憶體器件10C安裝之主機機器內之連接器100C之外形形狀、及貼附有TIM107之區域之配置例之俯視圖。圖15(A)係顯示記憶體器件10C之外形形狀及與TIM107接觸之接觸區域A13之俯視圖,圖15(B)係顯示連接器100C之外形形狀與貼附有TIM107之貼附區域A23之俯視圖。(3rd modification example) 15 is a top view showing the external shape of the memory device 10C of the third modification, the external shape of the connector 100C in the host machine on which the memory device 10C is mounted, and the arrangement example of the region where the TIM 107 is attached. Fig. 15(A) is a top view showing the shape of the memory device 10C and the contact area A13 in contact with the TIM107, and Fig. 15(B) is a top view showing the shape of the connector 100C and the attachment area A23 attached with the TIM107 .

圖15(A)所示之端子配置於未設置形成行R2之端子P,此點與圖4(A)所示之端子配置不同。即,圖15(A)所示之端子配置為未設置PCIe規格之邊帶信號用信號端子之端子配置。The terminal arrangement shown in FIG. 15(A) is different from the terminal arrangement shown in FIG. 4(A) in that the terminal P not forming the row R2 is provided. That is, the terminal arrangement shown in FIG. 15(A) is a terminal arrangement in which signal terminals for sideband signals of the PCIe standard are not provided.

該情形時,如圖15(B)所示,連接器100C中,於行r1與行r3間之區域,貼附有TIM107。換言之,於圖14(B)中斜線所示之貼附區域A23,貼附有TIM107。In this case, as shown in FIG. 15(B), in the connector 100C, the TIM 107 is attached to the region between the row r1 and the row r3. In other words, the TIM 107 is attached to the attaching area A23 indicated by oblique lines in FIG. 14(B).

圖15(A)中以虛線包圍之接觸區域A13、及圖15(B)中斜線所示之貼附有TIM107之貼附區域A23,於記憶體器件10C安裝於連接器100C時,係於俯視時重疊。換言之,記憶體器件10C安裝於連接器100C時,該記憶體器件10C於接觸區域A13中,與貼附於該連接器100C之貼附區域A23之TIM107對向且接觸。In Fig. 15(A), the contact area A13 surrounded by dotted lines and the attaching area A23 shown by oblique lines in Fig. 15(B) with the TIM107 attached, when the memory device 10C is mounted on the connector 100C, it is viewed from above time overlap. In other words, when the memory device 10C is mounted on the connector 100C, the memory device 10C is in the contact area A13, facing and in contact with the TIM 107 attached to the attachment area A23 of the connector 100C.

如上說明,藉由將記憶體器件10C之端子P如圖15(A)所示般配置,而可於供該記憶體器件10C安裝之連接器100C,如圖15(B)所示,設置貼附TIM107之貼附區域A23。換言之,記憶體器件10C藉由未設置形成行R2之端子P,來實現圖15(A)所示之設置接觸區域A13之端子配置,因此可於連接器100C設置供TIM107貼附之貼附區域A23。另,利用圖15所示之端子配置而設置之接觸區域A13,係相較於圖4及圖13所示之接觸區域A1及接觸區域A11、及圖14所示之接觸區域A12,變大了相當於未形成行R2之端子P之部分。因此,圖15所示之端子配置與圖4、圖13及圖14所示之端子配置相比,可擴張與TIM107面接觸之面積,且可進而提高散熱效率。As explained above, by arranging the terminal P of the memory device 10C as shown in FIG. Attached area A23 of TIM107. In other words, the memory device 10C realizes the terminal configuration of setting the contact area A13 shown in FIG. 15(A) by not setting the terminal P forming the row R2, so the attachment area for the TIM107 can be set on the connector 100C A23. In addition, the contact area A13 provided by the terminal arrangement shown in FIG. 15 is larger than the contact area A1 and A11 shown in FIG. 4 and FIG. 13 , and the contact area A12 shown in FIG. 14 . Corresponds to the part where the terminal P of the row R2 is not formed. Therefore, compared with the terminal configurations shown in FIG. 4 , FIG. 13 and FIG. 14 , the terminal configuration shown in FIG. 15 can expand the surface contact area with the TIM 107 , and further improve heat dissipation efficiency.

再者,亦可將圖4(A)或圖13(A)之記憶體器件10及記憶體器件10A,安裝於圖15(B)之連接器100C。該情形時,行R2之端子P114~端子P116及端子P117~端子P119雖會與TIM107接觸,但使用絕緣性TIM來避免短路,或使未連接之端子P114~端子P116及端子P117~端子P119於預設狀態下成為可接通,而不成為輸出模式,且使輸入亦成為貫通電流防止型之I/O胞元。Furthermore, the memory device 10 and the memory device 10A shown in FIG. 4(A) or FIG. 13(A) can also be mounted on the connector 100C shown in FIG. 15(B). In this case, although the terminals P114~P116 and P117~P119 of the row R2 will be in contact with the TIM107, an insulating TIM is used to avoid short circuits, or the unconnected terminals P114~P116 and P117~P119 are in contact with the TIM107. In the default state, it can be turned on, but not in the output mode, and the input is also an I/O cell of the through-current prevention type.

(第4變化例) 圖16係顯示第4變化例之記憶體器件10D之外形形狀、供該記憶體器件10D安裝之主機機器內之連接器100D之外形形狀、及貼附有TIM107之區域之配置例之俯視圖。圖16(A)係顯示記憶體器件10D之外形形狀、及與TIM107接觸之接觸區域A14之俯視圖,圖16(B)係顯示連接器100D之外形形狀、與貼附有TIM107之貼附區域A24之俯視圖。(4th modification example) 16 is a top view showing the shape of the memory device 10D in the fourth variation, the shape of the connector 100D in the host machine on which the memory device 10D is mounted, and the arrangement of the region where the TIM 107 is attached. Figure 16(A) is a top view showing the shape of the memory device 10D and the contact area A14 in contact with the TIM107, and Figure 16(B) is a top view showing the shape of the connector 100D and the attachment area A24 where the TIM107 is attached The top view.

圖16(A)所示之端子配置就以下之點與圖4(A)所示之端子配置不同,即,由於圖16(B)所示之連接器100之引線框架103之Y軸方向之長度,長於圖4(B)所示之引線框架103之Y軸方向之長度,故行R3於Y軸方向上之位置變得較為靠近第1緣31。具體而言,圖16(A)所示之端子配置之情形下,行R3於Y軸方向上之位置與圖4(A)所示之端子配置相比,較為靠近第1緣31大致1行量(相當於端子P之Y軸方向之長度)。The terminal configuration shown in FIG. 16(A) is different from the terminal configuration shown in FIG. 4(A) in the following points, that is, due to the Y-axis direction of the lead frame 103 of the connector 100 shown in FIG. 16(B) The length is longer than the length in the Y-axis direction of the lead frame 103 shown in FIG. 4(B), so the position of R3 in the Y-axis direction becomes closer to the first edge 31. Specifically, in the case of the terminal arrangement shown in FIG. 16(A), the position of the row R3 in the Y-axis direction is closer to the first edge 31 by about one row compared with the terminal arrangement shown in FIG. 4(A). Quantity (equivalent to the length of terminal P in the Y-axis direction).

該情形時,如圖16(B)所示,連接器100D中,於行r1與行r3間之區域,貼附有TIM107。於圖16(B)中斜線所示之貼附區域A24,貼附有TIM107。In this case, as shown in FIG. 16(B), in the connector 100D, the TIM 107 is attached to the region between the row r1 and the row r3. TIM 107 is attached to the attaching area A24 indicated by oblique lines in FIG. 16(B).

圖16(A)中以虛線包圍之接觸區域A14、及圖16(B)中斜線所示之貼附有TIM107之貼附區域A24,於記憶體器件10D安裝於連接器100D時,於俯視下重疊。換言之,記憶體器件10D安裝於連接器100D時,該記憶體器件10D於接觸區域A14中,與貼附於該連接器100D之貼附區域A24之TIM107對向且接觸。The contact area A14 surrounded by dotted lines in FIG. 16(A) and the attaching area A24 shown by oblique lines in FIG. 16(B) are attached with TIM107, when the memory device 10D is mounted on the connector 100D, under the top view overlapping. In other words, when the memory device 10D is mounted on the connector 100D, the memory device 10D is in the contact area A14, facing and in contact with the TIM 107 attached to the attachment area A24 of the connector 100D.

如上說明,即使引線框架103之Y軸方向之長度較圖4(B)所示之情形更長,但若如圖16(A)所示般配置記憶體器件10D之端子P,仍可於供該記憶體器件10D安裝之連接器100D,如圖16(B)所示設置貼附TIM107之貼附區域A24。圖16所示之端子配置與上述點接觸之情形相比,亦可提高散熱效率。As explained above, even if the length of the lead frame 103 in the Y-axis direction is longer than that shown in FIG. 4(B), if the terminals P of the memory device 10D are arranged as shown in FIG. The connector 100D on which the memory device 10D is mounted is provided with an attaching area A24 for attaching the TIM 107 as shown in FIG. 16(B). The terminal arrangement shown in FIG. 16 can also improve the heat dissipation efficiency compared with the above point contact.

如第4變化例中一例所示,本實施形態之記憶體器件10不論連接器100之引線框架103之Y軸方向之長度,均設法進行複數個端子P之端子配置,藉此可設置與TIM107接觸之接觸區域A1,且可提高該記憶體器件10之散熱效率。As shown in an example of the fourth modification example, the memory device 10 of this embodiment tries to carry out the terminal arrangement of a plurality of terminals P regardless of the length of the lead frame 103 of the connector 100 in the Y-axis direction, so that it can be arranged with the TIM 107 The contact area A1 can improve the heat dissipation efficiency of the memory device 10 .

另,本實施形態中,未於設置於記憶體器件10之接觸區域A1配置端子P,但不限於該例,亦可於設置於記憶體器件10之接觸區域A1內配置端子P。但,因於記憶體器件10安裝於連接器100時,配置於接觸區域A1內之端子P與貼附於貼附區域A2之TIM107接觸,故無法使用該端子P作為邊帶信號用信號端子或GND用信號端子。然而,該情形時,記憶體器件10亦可與TIM107面接觸,因而可提高該記憶體器件10之散熱效率。In addition, in this embodiment, the terminal P is not arranged in the contact area A1 provided in the memory device 10 , but not limited to this example, the terminal P may be arranged in the contact area A1 provided in the memory device 10 . However, when the memory device 10 is mounted on the connector 100, the terminal P disposed in the contact area A1 is in contact with the TIM 107 attached to the attachment area A2, so the terminal P cannot be used as a signal terminal for sideband signals or Signal terminal for GND. However, in this case, the memory device 10 can also be in surface contact with the TIM 107, so that the heat dissipation efficiency of the memory device 10 can be improved.

又,本實施形態中之邊帶信號亦可稱為可選擇信號。Also, the sideband signal in this embodiment can also be referred to as a selectable signal.

根據以上說明之第1實施形態,記憶體器件10(10C)包含用於傳送信號之複數個信號端子,具備於本體11之第1面21露出之複數個端子P。複數個端子P至少形成行R1與行R3。行R1包含:複數個信號端子P,其於較本體11之第4緣34更靠近第1緣31之位置,彼此間隔排列於X軸方向。行R3包含:複數個信號端子P,其於較本體11之第1緣31更靠近第4緣34之位置,彼此間隔排列於X軸方向。本體11之第1面21之行R1與行R3間之區域包含與配置於電性連接之主機機器之印刷電路基板上之TIM107接觸之接觸區域A1(A13)。因此,記憶體器件10(10C)安裝於連接器100(100C)時,於接觸區域A1(A13)中可與TIM107面接觸,故可提高該記憶體器件10(10C)之散熱效率。According to the first embodiment described above, the memory device 10 ( 10C) includes a plurality of signal terminals for transmitting signals, and includes a plurality of terminals P exposed on the first surface 21 of the main body 11 . The plurality of terminals P at least form a row R1 and a row R3. The row R1 includes: a plurality of signal terminals P, which are arranged at intervals in the X-axis direction at positions closer to the first edge 31 than the fourth edge 34 of the main body 11 . The row R3 includes: a plurality of signal terminals P, which are arranged at intervals in the X-axis direction at a position closer to the fourth edge 34 than the first edge 31 of the main body 11 . The area between the row R1 and the row R3 of the first surface 21 of the body 11 includes a contact area A1 ( A13 ) that is in contact with the TIM 107 disposed on the printed circuit board of the electrically connected host machine. Therefore, when the memory device 10 ( 10C) is mounted on the connector 100 ( 100C), it can be in surface contact with the TIM 107 in the contact area A1 ( A13 ), so the heat dissipation efficiency of the memory device 10 ( 10C) can be improved.

(第2實施形態) 接著,針對第2實施形態進行說明。另,省略上述第1實施形態中已說明之事項之詳細說明,以下,主要針對與上述第1實施形態不同之事項進行說明。(Second Embodiment) Next, a second embodiment will be described. In addition, the detailed description of the matters already described in the above-mentioned first embodiment will be omitted, and the following will mainly describe the matters different from the above-mentioned first embodiment.

圖17係顯示屬於記憶體器件10之行R1之端子群P101~P113之針腳分配之一例之圖。屬於行R1之端子群P101~P113作為用以傳遞依據PCIe規格之2信道量之差分信號對之信號端子、及雜訊防護用接地端子使用。FIG. 17 is a diagram showing an example of the pin assignment of the terminal group P101 to P113 belonging to the row R1 of the memory device 10 . The terminal group P101 to P113 belonging to the row R1 are used as signal terminals for transmitting a differential signal pair corresponding to 2 channels of the PCIe specification, and as ground terminals for noise protection.

如圖17所示,屬於行R1之端子P101、P104、P107、P110、P113作為雜訊防護用接地端子(GND端子)使用,分配有接地電位。屬於行R1之端子P102及P103、P105及P106、P108及P109、P111及P112作為用以傳遞依據PCIe規格之差分信號對之信號端子使用。As shown in FIG. 17, the terminals P101, P104, P107, P110, and P113 belonging to the row R1 are used as ground terminals (GND terminals) for noise protection, and are assigned a ground potential. Terminals P102 and P103, P105 and P106, P108 and P109, P111 and P112 belonging to row R1 are used as signal terminals for transmitting differential signal pairs according to the PCIe specification.

對端子P102及P103,分配自主機機器輸出之接收差分信號Rx0。更詳細而言,對端子P102分配正側之接收差分信號Rx0+,對端子P103分配負側之接收差分信號Rx0-。對端子P105及P106,分配自主機機器輸出之接收差分信號Rx1。更詳細而言,對端子P105分配正側之接收差分信號Rx1+,對端子P106分配負側之接收差分信號Rx1-。To terminals P102 and P103, distribute the received differential signal Rx0 output from the host machine. More specifically, the reception differential signal Rx0+ on the positive side is allocated to the terminal P102, and the reception differential signal Rx0- on the negative side is allocated to the terminal P103. To terminals P105 and P106, distribute the receive differential signal Rx1 output from the host machine. More specifically, the reception differential signal Rx1+ on the positive side is allocated to the terminal P105, and the reception differential signal Rx1- on the negative side is allocated to the terminal P106.

如上所述,對作為用以傳遞依據PCIe規格之差分信號對之信號端子使用之端子,即配置於X軸方向之記憶體器件10及本體11之中心線與第2緣32間之端子P102、P103、P105、P106,分配接收側之差分信號對。As mentioned above, for the terminals used as the signal terminals for transmitting the differential signal pair according to the PCIe specification, that is, the terminals P102, the terminals P102, P103, P105, P106, allocate the differential signal pair on the receiving side.

對端子P108及P109,分配自記憶體器件10輸出之發送差分信號Tx0。更詳細而言,對端子P108分配正側之發送差分信號Tx0+,對端子P109分配負側之發送差分信號Tx0-。對端子P111及端子P112,分配自記憶體器件10輸出之發送差分信號Tx1。更詳細而言,對端子P111分配正側之發送差分信號Tx1+,對端子P112分配負側之發送差分信號Tx1-。The transmission differential signal Tx0 output from the memory device 10 is distributed to the terminals P108 and P109. More specifically, the positive-side transmission differential signal Tx0+ is allocated to the terminal P108, and the negative-side transmission differential signal Tx0- is allocated to the terminal P109. The transmission differential signal Tx1 output from the memory device 10 is allocated to the terminal P111 and the terminal P112. More specifically, the positive-side transmission differential signal Tx1+ is allocated to the terminal P111, and the negative-side transmission differential signal Tx1- is allocated to the terminal P112.

如上所述,對作為用以傳遞依據PCIe規格之差分信號對之信號端子使用之端子,即配置於X軸方向之記憶體器件10及本體11之中心線與第3緣33間之端子P108、P109、P111、P112,分配發送側之差分信號對。As mentioned above, for the terminals used as the signal terminals for transmitting the differential signal pair according to the PCIe specification, that is, the terminals P108, the terminals P108, P109, P111, P112, allocate the differential signal pair on the sending side.

於PCIe規格中,由接收側之差分信號對與發送側之差分信號對,構成1信道。圖17中,由接收差分信號對Rx0+及Rx0-、與發送差分信號對Tx0+及Tx0-,構成1信道,亦由接收差分信號對Rx1+及Rx1-與發送差分信號對Tx1+及Tx1-,構成1信道。藉此,如上所述,可傳遞依據PCIe規格之2信道量之差分信號對。In the PCIe specification, a differential signal pair on the receiving side and a differential signal pair on the transmitting side constitute one channel. In Fig. 17, one channel is formed by receiving differential signal pair Rx0+ and Rx0-, and transmitting differential signal pair Tx0+ and Tx0-, and one channel is also composed of receiving differential signal pair Rx1+ and Rx1- and transmitting differential signal pair Tx1+ and Tx1-. channel. Thereby, as described above, it is possible to transmit a differential signal pair corresponding to 2 channels of the PCIe standard.

如圖17所示,分配有接收差分信號對Rx0+及Rx0-之端子P102及P103位於作為接地端子使用之端子P101及P104間。又,如圖17所示,分配有接收差分信號對Rx1+及Rx1-之端子P105及P106位於作為接地端子使用之端子P104及P107間。再者,如圖17所示,分配有發送差分信號對Tx0+及Tx0-之端子P108及P109位於作為接地端子使用之端子P107及P110間。又,如圖17所示,分配有發送差分信號對Tx1+及Tx1-之端子P111及P112位於作為接地端子使用之端子P110及P113間。As shown in FIG. 17 , the terminals P102 and P103 assigned to receive differential signal pairs Rx0+ and Rx0 − are located between the terminals P101 and P104 used as ground terminals. Moreover, as shown in FIG. 17, the terminals P105 and P106 to which the reception differential signal pair Rx1+ and Rx1- are allocated are located between the terminals P104 and P107 used as ground terminals. Furthermore, as shown in FIG. 17, the terminals P108 and P109 to which the transmission differential signal pair Tx0+ and Tx0- are allocated are located between the terminals P107 and P110 used as ground terminals. Moreover, as shown in FIG. 17, the terminals P111 and P112 to which the transmission differential signal pair Tx1+ and Tx1- are assigned are located between the terminals P110 and P113 used as ground terminals.

根據圖17所示之針腳分配,可減少串擾之影響。串擾意指對相鄰之信號配線造成影響、或受來自相鄰之信號配線之影響,而導致該等信號配線之信號品質劣化之現象。本實施形態中,考慮了信號強度較強之發送差分信號對影響信號強度較弱之接收差分信號對而使接收差分信號對之信號品質劣化的影響。According to the pin assignment shown in Figure 17, the influence of crosstalk can be reduced. Crosstalk refers to a phenomenon that affects adjacent signal wirings or is affected by adjacent signal wirings, resulting in degradation of the signal quality of these signal wirings. In this embodiment, the influence of the transmitted differential signal pair with stronger signal strength on the received differential signal pair with weaker signal strength to degrade the signal quality of the received differential signal pair is considered.

以下,將圖18所示之針腳分配作為比較例,對本實施形態之針腳分配之效果更詳細地說明。另,比較例係用以說明本實施形態之針腳分配可發揮之部分效果者,即並非將比較例與本實施形態中共通之效果排除者。Hereinafter, the effect of the pin assignment of the present embodiment will be described in more detail by taking the stitch assignment shown in FIG. 18 as a comparative example. In addition, the comparative example is used to illustrate some of the effects that can be exerted by the pin allocation of the present embodiment, that is, it is not intended to exclude the common effects of the comparative example and the present embodiment.

圖18係顯示比較例之針腳分配之一例之圖。如圖18所示,比較例之針腳分配於對端子P105及P106分配發送差分信號對Tx0+及Tx0-,對端子P108及P109分配接收差分信號對Rx1+及Rx1-之點上,與本實施形態之針腳分配不同。Fig. 18 is a diagram showing an example of pin assignment in a comparative example. As shown in Figure 18, the pin allocation of the comparative example is at the point where the differential signal pair Tx0+ and Tx0- are allocated to the terminals P105 and P106, and the differential signal pair Rx1+ and Rx1- are allocated to the terminals P108 and P109. The pin assignments are different.

根據圖18所示之針腳分配,有分配於端子P102及P103之接收差分信號對Rx0+及Rx0-受分配於端子P105及P106之發送差分信號對Tx0+及Tx0-之影響,而使信號品質劣化之情形。又,有分配於端子P108及P109之接收差分信號對Rx1+及Rx1-受分配於端子P105及P106之發送差分信號對Tx0+及Tx0-、與分配於端子P111及P112之發送差分信號對Tx1+及Tx1-之影響,而使信號品質劣化之情形。According to the pin assignment shown in Figure 18, the received differential signal pair Rx0+ and Rx0- assigned to terminals P102 and P103 is affected by the transmitted differential signal pair Tx0+ and Tx0- assigned to terminals P105 and P106, which degrades the signal quality situation. In addition, there are receiving differential signal pairs Rx1+ and Rx1- allocated to terminals P108 and P109, receiving differential transmitting signal pairs Tx0+ and Tx0- allocated to terminals P105 and P106, and transmitting differential signal pairs Tx1+ and Tx1 allocated to terminals P111 and P112. - The impact of the signal degrades the quality of the signal.

相對於此,根據本實施形態之針腳分配,如圖17所示,因於分配有接收差分信號對Rx0+及Rx0-之端子P102及P103附近,無分配有發送差分信號對之端子,故接收差分信號對Rx0+及Rx0-幾乎不受串擾之影響,可抑制信號品質之劣化。又,如圖17所示,於分配有接收差分信號對Rx1+及Rx1-之端子P105及P106附近,存在分配有發送差分信號對Tx0+及Tx0-之端子P108及P109,作為分配有發送差分信號對之端子,但如比較例所示,由於接收差分信號對Rx1+及Rx1-並不受來自發送差分信號對Tx0+及Tx0-、與發送差分信號對Tx1+及Tx1-之兩者之影響,故可較比較例之情形更抑制信號品質之劣化。On the other hand, according to the pin assignment of this embodiment, as shown in FIG. 17, there are no terminals assigned to send differential signal pairs near the terminals P102 and P103 assigned to receive differential signal pairs Rx0+ and Rx0-, so the receive differential signal The signal pair Rx0+ and Rx0- are hardly affected by crosstalk, which can suppress the degradation of signal quality. Also, as shown in FIG. 17 , near the terminals P105 and P106 assigned to receive differential signal pairs Rx1+ and Rx1-, there are terminals P108 and P109 assigned to transmit differential signal pairs Tx0+ and Tx0-, as terminals P108 and P109 allocated to transmit differential signal pairs. However, as shown in the comparison example, since the receiving differential signal pair Rx1+ and Rx1- is not affected by both the transmitting differential signal pair Tx0+ and Tx0-, and the transmitting differential signal pair Tx1+ and Tx1-, it can be compared In the case of the comparative example, the deterioration of the signal quality was further suppressed.

另,圖17中,已對於端子P102及P103分配有接收差分信號對Rx0+及Rx0-、於端子P105及P106分配有接收差分信號對Rx1+及Rx1-、於端子P108及P109分配有發送差分信號對Tx0+及Tx0-、於端子P111及P112分配有發送差分信號對Tx1+及Tx1-之針腳分配進行說明,但可抑制因串擾所致之信號品質劣化之針腳分配不限定於此。例如,亦可對端子P102及P103分配發送差分信號對Tx1+及Tx1-,對端子P105及P106分配發送差分信號對Tx0+及Tx0-,對端子P108及P109分配接收差分信號對Rx1+及Rx1-,對端子P111及P112分配接收差分信號對Rx0+及Rx0-。該情形時,亦與圖17之情形同樣,可抑制因串擾所致之信號品質劣化。In addition, in FIG. 17, the receiving differential signal pair Rx0+ and Rx0- have been allocated to the terminals P102 and P103, the receiving differential signal pair Rx1+ and Rx1- have been allocated to the terminals P105 and P106, and the transmitting differential signal pair has been allocated to the terminals P108 and P109. Tx0+ and Tx0-, terminals P111 and P112 are assigned the pin assignments of Tx1+ and Tx1- to transmit differential signals, but the pin assignments that can suppress signal quality degradation due to crosstalk are not limited to this. For example, it is also possible to allocate the transmission differential signal pair Tx1+ and Tx1- to the terminals P102 and P103, the transmission differential signal pair Tx0+ and Tx0- to the terminals P105 and P106, and the reception differential signal pair Rx1+ and Rx1- to the terminals P108 and P109. The terminals P111 and P112 are assigned to receive the differential signal pair Rx0+ and Rx0−. Also in this case, as in the case of FIG. 17 , it is possible to suppress the degradation of signal quality due to crosstalk.

即,若為於左右一側之端子分配有接收側之差分信號對,於左右另一側之端子分配有發送側之差分信號對之針腳分配,則與圖17之情形同樣,可抑制因串擾所致之信號品質劣化。That is, if the terminals on the left and right sides are allocated with the differential signal pairs on the receiving side and the terminals on the other left and right sides are allocated with the differential signal pairs on the transmitting side, then similar to the situation in FIG. The resulting signal quality is degraded.

又,圖17中,已針對屬於行R1之端子數為13之情形進行說明,但屬於行R1之端子數不限定於此,亦可對行R1配置較13端子多之端子。屬於行R1之端子數為14端子以上之情形時,如圖19所示,藉由於分配有接收差分信號對Rx1+及Rx1-之端子P105及P106、與分配有發送差分信號對Tx0+及Tx0-之端子P109及P110間(換言之,於分配有接收差分信號對之端子、與分配有發送差分信號對之端子間之距離中,距離最近之端子間),配置二個以上之接地端子P107及P108,而可減少接收差分信號對Rx1+及Rx1-受發送差分信號對Tx0+及Tx0-之影響,且抑制信號品質之劣化。In addition, in FIG. 17 , the case where the number of terminals belonging to the row R1 is 13 has been described, but the number of terminals belonging to the row R1 is not limited to this, and more terminals than 13 terminals may be arranged in the row R1. When the number of terminals belonging to the row R1 is more than 14 terminals, as shown in FIG. Between the terminals P109 and P110 (in other words, between the terminals assigned to receive differential signal pairs and the terminals assigned to transmit differential signal pairs, the closest terminal), arrange more than two ground terminals P107 and P108, Therefore, the influence of the received differential signal pair Rx1+ and Rx1 − on the transmitted differential signal pair Tx0+ and Tx0 − can be reduced, and the degradation of signal quality can be suppressed.

圖20係顯示屬於記憶體器件10之行R2之端子群P114~P119、與屬於行R3之端子群P120~P132之針腳分配之一例之圖。屬於行R2之端子群P114~P119作為各產品不同之任意可選信號用之信號端子使用。屬於行R3之端子群P120~P132作為各產品共通之控制信號用信號端子及電源端子使用。FIG. 20 is a diagram showing an example of pin assignments of the terminal group P114 to P119 belonging to the row R2 of the memory device 10 and the terminal group P120 to P132 belonging to the row R3. The terminal group P114-P119 belonging to the row R2 is used as signal terminals for any optional signal different from each product. Terminal group P120 to P132 belonging to row R3 are used as signal terminals for control signals and power supply terminals common to each product.

如圖20所示,屬於行R2之端子P114、P115、P118、P119作為返回電流用之接地端子(GND端子)使用。換言之,屬於行R2之端子群P114~P119中,配置於X軸方向之記憶體器件10及本體11之中心線與第2緣32間之複數個端子P114及P115作為返回電流用接地端子使用,且配置於X軸方向之記憶體器件10及本體11之中心線與第3緣33間之複數個端子P118及P119作為返回電流用接地端子使用。As shown in FIG. 20, terminals P114, P115, P118, and P119 belonging to row R2 are used as ground terminals (GND terminals) for return current. In other words, among the terminal groups P114-P119 belonging to the row R2, a plurality of terminals P114 and P115 arranged between the center line of the memory device 10 and the main body 11 in the X-axis direction and the second edge 32 are used as ground terminals for return current, Furthermore, a plurality of terminals P118 and P119 disposed between the center line of the memory device 10 and the main body 11 in the X-axis direction and the third edge 33 are used as ground terminals for return current.

屬於行R2之端子P116及P117作為備用端子(RSVD端子)使用,例如分配邊帶信號。Terminals P116 and P117 belonging to row R2 are used as spare terminals (RSVD terminals), eg for distributing sideband signals.

又,如圖20所示,對屬於行R3之端子P121、P122、P125、P129,分配例如PCIe規格之信號。更詳細而言,對端子P121及P122,分配差分信號對REFCLK+及REFCLK-。對端子P125分配PERST#信號(重設信號)。對端子P129分配CLKREQ#信號。Moreover, as shown in FIG. 20, to the terminals P121, P122, P125, and P129 belonging to the row R3, for example, signals of the PCIe standard are assigned. More specifically, the differential signal pair REFCLK+ and REFCLK− are assigned to the terminals P121 and P122. The PERST# signal (reset signal) is assigned to the terminal P125. The CLKREQ# signal is assigned to the terminal P129.

再者,如圖20所示,屬於行R3之端子P120及P123作為雜訊防護用之接地端子使用。分配有差分信號對REFCLK+及REFCLK-之端子P121及P122位於作為雜訊防護用之接地端子使用之端子P120及P123間。Furthermore, as shown in FIG. 20, terminals P120 and P123 belonging to row R3 are used as ground terminals for noise protection. The terminals P121 and P122 to which the differential signal pair REFCLK+ and REFCLK- are assigned are located between the terminals P120 and P123 used as ground terminals for noise protection.

又,如圖20所示,屬於行R3之端子P124作為返回電流用之接地端子使用。屬於行R3之端子P126~P128作為用以供給第2電源電壓(例如1.2 V)之電源端子使用。屬於行R3之端子P130~P132作為用以供給第1電源電壓(例如2.5 V)之電源端子使用。Also, as shown in FIG. 20, the terminal P124 belonging to the row R3 is used as a ground terminal for return current. Terminals P126 to P128 belonging to row R3 are used as power supply terminals for supplying a second power supply voltage (for example, 1.2 V). The terminals P130 to P132 belonging to the row R3 are used as power supply terminals for supplying the first power supply voltage (for example, 2.5 V).

根據圖20所示之針腳分配,可應對電流量隨記憶體器件10之性能提高之增加。例如,將依據PCIe3.0之器件與依據PCIe4.0之器件比較之情形時,依據PCIe4.0之器件發揮依據PCIe3.0之器件之大致2倍左右之性能,另一方面,消耗電流增加。根據本實施形態之針腳分配,可應對此種消耗電流之增加。According to the pin assignment shown in FIG. 20, it is possible to cope with an increase in the amount of current as the performance of the memory device 10 improves. For example, when a PCIe 3.0-compliant device is compared with a PCIe 4.0-compliant device, the PCIe 4.0-compliant device exhibits approximately twice the performance of the PCIe 3.0-compliant device, but consumes more current. According to the pin allocation of this embodiment, it is possible to cope with such an increase in consumption current.

以下,將圖21所示之針腳分配作為比較例,對本實施形態之針腳分配之效果更詳細地說明。另,比較例係用以說明本實施形態之針腳分配可發揮之部分效果者,即並非將比較例與本實施形態中共通之效果排除者。Hereinafter, the effect of the pin assignment of the present embodiment will be described in more detail by taking the pin assignment shown in FIG. 21 as a comparative example. In addition, the comparative example is used to illustrate some of the effects that can be exerted by the pin allocation of the present embodiment, that is, it is not intended to exclude the common effects of the comparative example and the present embodiment.

圖21係顯示比較例之針腳分配之一例之圖。如圖21所示,比較例之針腳分配於行R2之端子P115及P118作為備用端子而非返回電流用之接地端子使用之點上,與本實施形態之針腳分配不同。又,比較例之針腳分配於行R3之端子P132作為NC端子使用,且返回電流用接地端子未配置於行R3之點上,與本實施形態之針腳分配不同。再者,比較例之針腳分配於行R3中與作為雜訊防護用之接地端子使用之端子P123相鄰之端子P124作為電源端子使用之點上,與本實施形態之針腳分配不同。Fig. 21 is a diagram showing an example of pin assignment in a comparative example. As shown in FIG. 21 , the pin allocation of the comparative example is different from the pin allocation of the present embodiment at the point where the terminals P115 and P118 of the row R2 are used as spare terminals instead of ground terminals for return current. In addition, in the comparative example, the terminal P132 assigned to the row R3 is used as an NC terminal, and the return current ground terminal is not arranged at the point of the row R3, which is different from the assignment of the pins of the present embodiment. Furthermore, the pin assignment of the comparative example is different from the pin assignment of the present embodiment at the point where the terminal P124 adjacent to the terminal P123 used as the ground terminal for noise protection is used as a power supply terminal in the row R3.

根據圖21所示之針腳分配,於消耗電流隨記憶體器件10之性能提高而增加之情形時,除端子P114及P119外,無返回電流用之接地端子,因而需要使增加部分之返回電流於作為雜訊防護用之接地端子使用之端子P120及P123流動,應對消耗電流之增加。若於作為雜訊防護用之接地端子使用之端子P120及P123流動返回電流,則有對位於該等端子間之端子P121及P122分配之差分信號對REFCLK+及REFCLK-之信號品質劣化之虞。According to the pin distribution shown in FIG. 21 , when the consumption current increases with the improvement of the performance of the memory device 10, there is no ground terminal for the return current except the terminals P114 and P119, so it is necessary to make the increased part of the return current in Terminals P120 and P123, which are used as ground terminals for noise protection, flow to cope with an increase in consumption current. If a return current flows through the terminals P120 and P123 used as ground terminals for noise protection, the signal quality of the differential signal pair REFCLK+ and REFCLK- allocated to the terminals P121 and P122 located between these terminals may deteriorate.

相對於此,根據本實施形態之針腳分配,如圖20所示,由於屬於行R2之端子P115及P118、與屬於行R3之端子P124作為返回電流用之接地端子使用,故可使增加部分之返回電流於該等端子P115、118、124流動,可應對消耗電流隨記憶體器件10之性能提高之增加。又,根據本實施形態之針腳分配,如上所述,由於可確保流動增加部分之返回電流之路徑,故可抑制差分信號對REFCLK+及REFCLK-之信號品質劣化。再者,根據本實施形態之針腳分配,如比較例所示,由於接地端子與電源端子未相鄰配置,故可抑制因例如振動等而使連接器100之接地端子所對應之引線框架錯誤地與電源端子接觸等。On the other hand, according to the pin distribution of this embodiment, as shown in FIG. 20, since the terminals P115 and P118 belonging to the row R2 and the terminal P124 belonging to the row R3 are used as ground terminals for the return current, it is possible to make the additional part The return current flows through the terminals P115 , 118 , and 124 to cope with the increase in consumption current as the performance of the memory device 10 improves. Also, according to the pin assignment of the present embodiment, as described above, since the path for the return current flowing in the increased part can be ensured, the signal quality degradation of the differential signal pair REFCLK+ and REFCLK- can be suppressed. Furthermore, according to the pin assignment of the present embodiment, as shown in the comparative example, since the ground terminal and the power terminal are not adjacently arranged, it is possible to prevent the lead frame corresponding to the ground terminal of the connector 100 from being misaligned due to, for example, vibration. contact with power terminals, etc.

圖22係顯示記憶體器件10之外層及內層之立體圖。如圖22所示,於記憶體器件10之外層,設置有:屬於行R1之端子群P101~P113;屬於行R2之端子群P114~P119;屬於行R3之端子群P120~P132;及通孔VA1~VA12,其等用以連接作為接地端子使用之端子P101、P104、P107、P110、P113、P114、P115、P118、P119、P120、P123、P124與內層。FIG. 22 is a perspective view showing the outer and inner layers of the memory device 10 . As shown in FIG. 22 , on the outer layer of the memory device 10, there are: terminal groups P101-P113 belonging to row R1; terminal groups P114-P119 belonging to row R2; terminal groups P120-P132 belonging to row R3; and through holes VA1~VA12 are used to connect terminals P101, P104, P107, P110, P113, P114, P115, P118, P119, P120, P123, P124 used as grounding terminals and the inner layer.

如圖22所示,於記憶體器件10之內層,設置有:接地面GP1,其與行R1中作為雜訊防護用之接地端子使用之端子P101、P104、P107、P110、P113電性且熱連接。於記憶體器件10之內層,設置有:接地面GP2,其與行R2中作為返回電流用之接地端子使用之端子P114、P115、P118、P119,及行R3中作為返回電流用之接地端子使用之端子P124電性且熱連接。於記憶體器件10之內層,設置有:接地面GP3,其與行R3中作為雜訊防護用之接地端子使用之端子P120及P123電性且熱連接。接地面GP1~GP3例如以銅箔形成。接地面GP1~GP3不互相電性連接。又,於記憶體器件10之內層,設置有與設置於外層之通孔VA1~VA12對應之通孔VB1~VB12。As shown in FIG. 22, on the inner layer of the memory device 10, a ground plane GP1 is provided, which is electrically connected to the terminals P101, P104, P107, P110, and P113 used as ground terminals for noise protection in the row R1. Hot connect. In the inner layer of the memory device 10, a ground plane GP2 is provided, which is connected with the terminals P114, P115, P118, and P119 used as the ground terminals for the return current in the row R2, and the ground terminals used as the return current in the row R3. The terminal P124 used is electrically and thermally connected. On the inner layer of the memory device 10, there is provided a ground plane GP3, which is electrically and thermally connected to the terminals P120 and P123 used as ground terminals for noise protection in the row R3. The ground planes GP1 to GP3 are formed of copper foil, for example. The ground planes GP1 - GP3 are not electrically connected to each other. In addition, in the inner layer of the memory device 10, through holes VB1-VB12 corresponding to the through holes VA1-VA12 arranged in the outer layer are provided.

設置於記憶體器件10之外層,作為接地端子使用之端子P101、P104、P107、P110、P113經由通孔VA1~VA5及VB1~VB5,與接地面GP1電性且熱連接。設置於記憶體器件10之外層,作為返回電流用之接地端子使用之端子P114、P115、P118、P119、P124經由通孔VA6~VA9及VA12與通孔VB6~VB9及VB12,與接地面GP2電性且熱連接。設置於記憶體器件10之外層,作為雜訊防護用之接地端子使用之端子P120及P123經由通孔VA10及VA11與通孔VB10及VB11,與接地面GP3電性且熱連接。The terminals P101 , P104 , P107 , P110 , and P113 provided on the outer layer of the memory device 10 and used as ground terminals are electrically and thermally connected to the ground plane GP1 through the via holes VA1 - VA5 and VB1 - VB5 . The terminals P114, P115, P118, P119, and P124, which are arranged on the outer layer of the memory device 10 and used as ground terminals for return current, are connected to the ground plane GP2 through the through holes VA6-VA9 and VA12 and the through holes VB6-VB9 and VB12. permanent and thermally connected. The terminals P120 and P123 provided on the outer layer of the memory device 10 and used as ground terminals for noise protection are electrically and thermally connected to the ground plane GP3 through the through holes VA10 and VA11 and the through holes VB10 and VB11 .

另,圖22中,例示了接地面GP1~GP3形成於同一層之情形,但不限定於此,接地面GP1~GP3之各者亦可形成於不同層。In addition, in FIG. 22, the case where the ground planes GP1-GP3 are formed in the same layer was illustrated, but it is not limited to this, Each of the ground planes GP1-GP3 may be formed in a different layer.

根據圖22所示之構成(換言之,圖20所示之針腳分配),與圖21所示之比較例之構成相比,可提高散熱效果。更詳細而言,圖22所示之構成與圖21所示之比較例之構成相比,作為接地端子使用之端子數較多,可將更多之端子電性且熱連接於接地面GP2,故可較比較例之構成更提高散熱效果。According to the configuration shown in FIG. 22 (in other words, the pin assignment shown in FIG. 20 ), compared with the configuration of the comparative example shown in FIG. 21 , the heat dissipation effect can be improved. More specifically, compared with the configuration of the comparative example shown in FIG. 21, the configuration shown in FIG. 22 has more terminals used as ground terminals, and more terminals can be electrically and thermally connected to the ground plane GP2. Therefore, the cooling effect can be improved more than that of the comparative example.

根據以上說明之第2實施形態,記憶體器件10包含複數組分配有接收差分信號對之一對端子(例如端子P102及P103、P105及P106)、及分配有發送差分信號對之一對端子(例如端子P108及P109、P111及P112),且於X軸方向之本體11之中心線與一側緣(第2緣32)間,定位複數組分配有接收差分信號對之一對端子,於X軸方向之本體11之中心線與另一側緣(第3緣33)間,定位複數組分配有發送差分信號對之一對端子。藉此,可抑制串擾,且抑制信號品質劣化。According to the second embodiment described above, the memory device 10 includes a pair of terminals (for example, terminals P102 and P103, P105 and P106) to which a differential signal pair for reception is allocated, and a pair of terminals (for example, terminals P102 and P103, P105 and P106) to which a differential signal pair for transmission is allocated For example, terminals P108 and P109, P111 and P112), and between the center line of the main body 11 in the X-axis direction and one side edge (the second edge 32), a pair of terminals assigned to receive a differential signal pair in a complex group is positioned, and in X Between the centerline of the main body 11 in the axial direction and the other side edge (the third edge 33 ), a pair of terminals allocated with a pair of sending differential signals is positioned in a complex group. Thereby, crosstalk can be suppressed, and degradation of signal quality can be suppressed.

又,根據以上說明之第2實施形態,記憶體器件10包含配置於X軸方向之本體11之中心線與第2緣32間之返回電流用之複數個接地端子(例如端子P114及P115),且包含配置於X軸方向之本體11之中心線與第3緣33間之返回電流用之複數個接地端子(例如端子P118及P119)。藉此,可將屬於行R2之端子中之較多者與接地面GP2電性且熱連接,故可提高散熱效果。Also, according to the second embodiment described above, the memory device 10 includes a plurality of ground terminals (such as terminals P114 and P115) for return currents arranged between the center line of the main body 11 in the X-axis direction and the second edge 32, It also includes a plurality of ground terminals (for example, terminals P118 and P119 ) for return current arranged between the center line of the main body 11 in the X-axis direction and the third edge 33 . Thereby, more of the terminals belonging to the row R2 can be electrically and thermally connected to the ground plane GP2, so the heat dissipation effect can be improved.

(第3實施形態) 接著,針對第3實施形態進行說明。另,省略上述第1實施形態及第2實施形態中已說明之事項之詳細說明,以下,主要針對與上述第1實施形態及第2實施形態不同之事項進行說明。(third embodiment) Next, a third embodiment will be described. In addition, the detailed description of the matters already described in the above-mentioned first embodiment and the second embodiment will be omitted, and the following will mainly describe the matters different from the above-mentioned first embodiment and the second embodiment.

圖23係用以對將屬於記憶體器件10之行R2之端子P116及P117,作為用以傳遞邊帶信號之信號端子使用,且亦將端子P116及P117,作為SCS端子及PCD端子使用之情形(即,將用以傳遞邊帶信號之信號端子、SCS端子及PCD端子共用化之情形)進行說明之圖。23 is used to use the terminals P116 and P117 belonging to the row R2 of the memory device 10 as signal terminals for transmitting sideband signals, and also use the terminals P116 and P117 as SCS terminals and PCD terminals. (That is, a diagram explaining the common use of signal terminals for transmitting sideband signals, SCS terminals, and PCD terminals).

如上所述,SCS端子為記憶體器件10啟動前用以輸入選擇信號所使用之信號端子,PCD端子為記憶體器件10啟動前用以輸出檢測信號所使用之信號端子。相對於此,由於邊帶信號為記憶體器件10啟動後輸入之信號,故用以傳遞邊帶信號之信號端子、SCS端子及PCD端子可共用化。另,記憶體器件10啟動前相當於重設信號作用之情形,且記憶體器件10啟動後相當於重設信號已解除之情形。As mentioned above, the SCS terminal is a signal terminal used to input a selection signal before the memory device 10 is activated, and the PCD terminal is a signal terminal used to output a detection signal before the memory device 10 is activated. In contrast, since the sideband signal is a signal input after the memory device 10 is activated, the signal terminal, SCS terminal, and PCD terminal for transmitting the sideband signal can be shared. In addition, before the memory device 10 is activated, it corresponds to the situation that the reset signal is activated, and after the memory device 10 is activated, it corresponds to the situation that the reset signal has been released.

於圖23(A)中,設想有屬於記憶體器件10之行R2之端子P116由用以傳遞邊帶信號之信號端子與SCS端子共用之情形。更詳細而言,設想有端子P116於記憶體器件10啟動前作為SCS端子使用,於記憶體器件10啟動後作為用以傳遞邊帶信號之信號端子使用之情形。又,於圖23(A)中,設想有屬於記憶體器件10之行R2之端子P117由用以傳遞邊帶信號之信號端子與PCD端子共用之情形。更詳細而言,設想有端子P117於記憶體器件10啟動前作為PCD端子使用,於記憶體器件10啟動後作為用以傳遞邊帶信號之信號端子使用之情形。In FIG. 23(A), it is assumed that the terminal P116 belonging to the row R2 of the memory device 10 is shared by the signal terminal for transmitting the sideband signal and the SCS terminal. More specifically, it is assumed that the terminal P116 is used as an SCS terminal before the memory device 10 is activated, and is used as a signal terminal for transmitting sideband signals after the memory device 10 is activated. In addition, in FIG. 23(A), it is assumed that the terminal P117 belonging to the row R2 of the memory device 10 is shared by the signal terminal for transmitting the sideband signal and the PCD terminal. More specifically, it is assumed that the terminal P117 is used as a PCD terminal before the memory device 10 is activated, and is used as a signal terminal for transmitting sideband signals after the memory device 10 is activated.

如圖23(B)所示,於器件啟動前,對作為SCS端子使用之端子P116輸入有高(High)位準之選擇信號之情形,於器件啟動後,端子P116作為用以傳遞第1邊帶信號SB1之信號端子使用,端子P117作為用以傳遞第2邊帶信號SB2之信號端子使用。換言之,於器件啟動前,對作為SCS端子使用之端子P116輸入有高(High)位準之選擇信號之情形,於器件啟動後,端子P116及P117作為用以傳遞第1構成之邊帶信號SB1及SB2之信號端子使用。As shown in Figure 23(B), before the device is started, the terminal P116 used as the SCS terminal is input with a high (High) level selection signal. After the device is started, the terminal P116 is used to transmit the first side The signal terminal with the signal SB1 is used, and the terminal P117 is used as the signal terminal for transmitting the second sideband signal SB2. In other words, before the device is started, if a high-level selection signal is input to the terminal P116 used as the SCS terminal, after the device is started, the terminals P116 and P117 are used to transmit the sideband signal SB1 of the first configuration And the signal terminal of SB2 is used.

另一方面,如圖23(B)所示,於器件啟動前,對作為SCS端子使用之端子P116輸入有低(Low)位準之選擇信號之情形,於器件啟動後,端子P116作為用以傳遞第3邊帶信號SB3之信號端子使用,端子P117作為用以傳遞第4邊帶信號SB4之信號端子使用。換言之,於器件啟動前,對作為SCS端子使用之端子P116輸入有低(Low)位準之選擇信號之情形,於器件啟動後,端子P116及P117作為用以傳遞第2構成之邊帶信號SB3及SB4之信號端子使用。On the other hand, as shown in Figure 23(B), before the device is started, if a low (Low) level selection signal is input to the terminal P116 used as the SCS terminal, after the device is started, the terminal P116 is used as the SCS terminal. The signal terminal for transmitting the third sideband signal SB3 is used, and the terminal P117 is used as a signal terminal for transmitting the fourth sideband signal SB4. In other words, before the device is started, if a low (Low) selection signal is input to the terminal P116 used as the SCS terminal, after the device is started, the terminals P116 and P117 are used to transmit the sideband signal SB3 of the second configuration And the signal terminal of SB4 is used.

如圖23(C)所示,於器件啟動前,自作為PCD端子使用之端子P117輸出高(High)位準之檢測信號之情形時,主機機器辨識記憶體器件10之電源構成為2電源。另一方面,如圖23(C)所示,於器件啟動前,自作為PCD端子使用之端子P117輸出低(Low)位準之檢測信號之情形,主機機器辨識記憶體器件10之電源構成為1電源。As shown in FIG. 23(C), when a detection signal of High level is output from the terminal P117 used as a PCD terminal before the device is started, the host machine recognizes that the power supply of the memory device 10 is composed of 2 power supplies. On the other hand, as shown in FIG. 23(C), before the device is started, when the detection signal of the low (Low) level is output from the terminal P117 used as the PCD terminal, the host machine recognizes the power supply of the memory device 10 as follows: 1 power supply.

此處,參照圖24之時序圖,說明圖23所示之構成之記憶體器件10之動作之一例,即用以傳遞邊帶信號之信號端子、SCS端子及PCD端子共用化時之動作之一例。Here, an example of the operation of the memory device 10 having the structure shown in FIG. 23 will be described with reference to the timing chart of FIG. .

如圖24所示,於第1時序T1中,於主機機器(之主機控制部201)之控制下,開始將第1電源電壓供給至記憶體器件10。若開始將第1電源電壓供給至記憶體器件10,則於第2時序T2中,自記憶體器件10之PCD端子(即,器件啟動前之端子P117)向主機機器輸出檢測信號。於第3時序T3中,主機機器讀取由記憶體器件10輸出之檢測信號,辨識記憶體器件10之電源構成,決定有無供給第2電源電壓。又,於第3時序T3中,主機機器確立作為SCS端子使用之端子P116,其後,向記憶體器件10輸出選擇信號。As shown in FIG. 24 , at the first timing T1 , under the control of the host device (the host control unit 201 ), supply of the first power supply voltage to the memory device 10 starts. When the first power supply voltage is started to be supplied to the memory device 10, a detection signal is output from the PCD terminal of the memory device 10 (ie, the terminal P117 before device startup) to the host machine in the second timing T2. In the third timing T3, the host device reads the detection signal output by the memory device 10, identifies the power supply configuration of the memory device 10, and determines whether to supply the second power supply voltage. Also, in the third timing T3, the host device establishes the terminal P116 used as the SCS terminal, and then outputs a selection signal to the memory device 10 .

於辨識記憶體器件10之電源構成後之第4時序T4中,低(low)電平之重設信號被解除確立。藉此,作為PCD端子使用之端子P117於之後的期間,作為用以傳遞與輸入至SCS端子之選擇信號之位準相應之構成之邊帶信號的信號端子使用。此後,於第5時序T5中,主機機器將作為SCS端子使用之端子P116解除確立,端子P116於之後的期間,作為用以傳遞與輸入至SCS端子之選擇信號之位準相應之構成之邊帶信號的信號端子使用。In the fourth timing T4 after identifying the power source configuration of the memory device 10 , the reset signal of low (low) level is deasserted. Thereby, the terminal P117 used as the PCD terminal is used as a signal terminal for transmitting a sideband signal having a configuration corresponding to the level of the selection signal input to the SCS terminal in a subsequent period. Thereafter, in the fifth timing T5, the host device deasserts the terminal P116 used as the SCS terminal, and the terminal P116 is used as a sideband for transmitting a configuration corresponding to the level of the selection signal input to the SCS terminal in the following period The signal terminal of the signal is used.

根據圖23及圖24所示之構成,由於可將用以傳遞邊帶信號之信號端子、SCS端子及PCD端子共用化,故可提高記憶體器件10之針腳分配之設計自由度。例如,如圖20及圖22所示,可增加作為返回電流用之接地端子使用之端子數等。According to the structure shown in FIG. 23 and FIG. 24, since the signal terminal for transmitting the sideband signal, the SCS terminal, and the PCD terminal can be shared, the design freedom of the pin assignment of the memory device 10 can be improved. For example, as shown in FIG. 20 and FIG. 22 , the number of terminals used as ground terminals for return current can be increased.

根據以上說明之第3實施形態,記憶體器件10包含分配有邊帶信號之至少二個信號端子(例如端子P116及P117),於記憶體器件10啟動前,對一信號端子(例如端子P116)輸入選擇信號,且自另一信號端子(例如端子P117)輸出檢測信號,於記憶體器件10啟動後,對該等二個信號端子輸入邊帶信號。藉此,可將用以傳遞邊帶信號之信號端子、SCS端子及PCD端子共用化,可提高記憶體器件10之針腳分配之設計自由度。According to the third embodiment described above, the memory device 10 includes at least two signal terminals (such as terminals P116 and P117) assigned sideband signals. A selection signal is input, and a detection signal is output from another signal terminal (for example, terminal P117 ). After the memory device 10 is activated, sideband signals are input to these two signal terminals. Thereby, the signal terminal for transmitting the sideband signal, the SCS terminal, and the PCD terminal can be shared, and the design freedom of the pin assignment of the memory device 10 can be improved.

根據以上說明之至少一個實施形態,可提供能夠提高散熱效率之記憶體器件10。According to at least one embodiment described above, a memory device 10 capable of improving heat dissipation efficiency can be provided.

另,本實施形態中,例示NAND型快閃記憶體作為非揮發性記憶體。但,本實施形態之功能亦可適用於例如MRAM(Magnetoresistive Random Access Memory:磁性隨機存取記憶體)、PRAM(Phase change Random Access Memory:相變隨機存取記憶體)、ReRAM(Resistive Random Access Memory:電阻式隨機存取記憶體)、或FeRAM(Ferroelectric Random Access Memory:鐵電式隨機存取記憶體)般之其他各種非揮發性記憶體。In addition, in this embodiment, a NAND type flash memory is exemplified as a nonvolatile memory. However, the functions of this embodiment can also be applied to, for example, MRAM (Magnetoresistive Random Access Memory: Magnetic Random Access Memory), PRAM (Phase change Random Access Memory: Phase Change Random Access Memory), ReRAM (Resistive Random Access Memory : Resistive Random Access Memory), or FeRAM (Ferroelectric Random Access Memory: Ferroelectric Random Access Memory) and various other non-volatile memories.

雖已說明本發明之數個實施形態,但該等實施形態係作為例子提示者,並未意欲限定發明之範圍。該等新穎之實施形態可以其他多種形態實施,於不脫離發明主旨之範圍內,可進行多種省略、置換、變更。該等實施形態或其變化包含於發明範圍或主旨,且包含於專利申請範圍所記載之發明及其均等之範圍內。Although several embodiments of the present invention have been described, these embodiments are presented as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, substitutions, and changes can be made without departing from the gist of the invention. These embodiments or variations thereof are included in the scope or gist of the invention, and are included in the inventions described in the scope of the patent application and their equivalents.

本申請案係以日本專利申請案第2020-033519(申請日:2/28/2020)號及日本專利申請案第2020-126444(申請日:7/27/2020)號為基礎,享受自該等申請案之優先利益。本申請案藉由參照該等申請案而包含相同申請案之全部內容。This application is based on Japanese Patent Application No. 2020-033519 (Filing Date: 2/28/2020) and Japanese Patent Application No. 2020-126444 (Filing Date: 7/27/2020). The priority interest of other applications. This application incorporates the entire contents of the same applications by reference to these applications.

10:記憶體器件 10a:第1代記憶體器件 10A:記憶體器件 10b:第2代記憶體器件 10B:記憶體器件 10C:記憶體器件 10D:記憶體器件 11:本體 12:印刷電路基板 13:NAND型快閃記憶體 14:控制器 15:開關 21:第1面 22:第2面 23:外緣 31:第1緣 32:第2緣 33:第3緣 34:第4緣 35:第1角部 36:第2角部 37:第3角部 38:第4角部 39:傾斜部 40:鑄模樹脂 100:連接器 100A:連接器 100B:連接器 100C:連接器 100D:連接器 101~103:引線框架 104:引線框架端子 105:安裝部 106:連接器框架 107:TIM 111:第1緣 112:第2緣 113:第3緣 114:第4緣 115:連接部 116:缺口 120:罩 201:主機控制部 202:開關 202A:上拉電阻 203:三態緩衝器 A1:接觸區域 A2:貼附區域 A11:接觸區域 A12:接觸區域 A13:接觸區域 A14:接觸區域 A21:貼附區域 A22:貼附區域 A23:貼附區域 A24:貼附區域 C:倒角部 CLKREQ#:信號 D1:距離 D2:距離 D3:距離 GP1:接地面 GP2:接地面 GP3:接地面 P:端子 P101~P132:端子 PCD:端子 PERST#:信號 r1:行 R1:行 r2:行 R2:行 r3:行 R3:行 REFCLK+:差分信號對 REFCLK-:差分信號對 RSVD:端子 Rx0+:接收差分信號 Rx0-:接收差分信號 Rx1+:接收差分信號 Rx1-:接收差分信號 SB1:第1邊帶信號 SB2:第2邊帶信號 SB3:第3邊帶信號 SB4:第4邊帶信號 SB5:第5邊帶信號 SB6:第6邊帶信號 SB7:第7邊帶信號 SB8:第8邊帶信號 SCS:端子 T1:第1時序 T2:第2時序 T3:第3時序 T4:第4時序 T5:第5時序 Tx0+:發送差分信號 Tx0-:發送差分信號 Tx1+:發送差分信號 Tx1-:發送差分信號 VA1~VA12:通孔 VB1~VB12:通孔10: Memory device 10a: 1st Generation Memory Devices 10A: memory device 10b: 2nd Generation Memory Devices 10B: memory device 10C: memory device 10D: memory device 11: Ontology 12: Printed circuit substrate 13: NAND flash memory 14: Controller 15: switch 21: Side 1 22: Side 2 23: outer edge 31: The first edge 32: The second edge 33: The third edge 34: The 4th Edge 35: 1st corner 36: the second corner 37: 3rd corner 38: 4th corner 39: Inclined part 40: Molding resin 100: Connector 100A: Connector 100B: connector 100C: connector 100D: connector 101~103: lead frame 104: Lead frame terminal 105: Installation department 106:Connector frame 107: TIM 111: The first edge 112: The second edge 113: The third edge 114: The fourth edge 115: connection part 116: Gap 120: cover 201: Host control department 202: switch 202A: pull-up resistor 203: Tri-state buffer A1: Contact area A2: Attachment area A11: Contact area A12: Contact area A13: Contact area A14: Contact area A21: Attachment area A22: Attachment area A23: Attachment area A24: Attachment area C: chamfer CLKREQ#: signal D1: distance D2: distance D3: Distance GP1: ground plane GP2: ground plane GP3: ground plane P: terminal P101~P132: terminals PCD: terminal PERST#: signal r1: row R1: row r2: row R2: Row r3: row R3: Row REFCLK+: differential signal pair REFCLK-: differential signal pair RSVD: terminal Rx0+: Receive differential signal Rx0-: Receive differential signal Rx1+: Receive differential signal Rx1-: Receive differential signal SB1: 1st sideband signal SB2: 2nd sideband signal SB3: 3rd sideband signal SB4: 4th sideband signal SB5: 5th sideband signal SB6: 6th sideband signal SB7: 7th sideband signal SB8: The 8th sideband signal SCS: terminal T1: the first timing T2: the second timing T3: The third timing T4: The 4th timing T5: The fifth timing Tx0+: send differential signal Tx0-: Send differential signal Tx1+: send differential signal Tx1-: send differential signal VA1~VA12: Through hole VB1~VB12: Through hole

圖1(A)~(C)係顯示第1實施形態之記憶體器件之外形形狀之例示圖。 圖2係顯示同實施形態之記憶體器件之構成例之圖。 圖3係顯示同實施形態之記憶體器件之外形形狀與複數個端子之配置例之俯視圖。 圖4(A)、(B)係顯示同實施形態之記憶體器件之外形形狀、供該記憶體器件安裝之連接器之外形形狀、及貼附有TIM之區域之配置例之俯視圖。 圖5係顯示同實施形態之記憶體器件安裝於連接器之狀態之側視圖。 圖6(A)、(B)係用以說明使用同實施形態之記憶體器件之端子作為SCS端子之情形之圖。 圖7係顯示配置於使用同實施形態之記憶體器件之主機機器之基板上之主機控制部與開關之圖。 圖8(A)、(B)係顯示同實施形態之記憶體器件,即2電源記憶體器件及1電源記憶體器件之外形形狀之俯視圖。 圖9(A)、(B)係用以說明使用同實施形態之記憶體器件之端子作為PCD端子之情形之圖。 圖10(A)、(B)係顯示同實施形態之記憶體器件,即2電源記憶體器件及1電源記憶體器件之內部電路之圖。 圖11(A)、(B)係用以說明使用同實施形態之記憶體器件之一個端子作為SCS端子或作為PCD端子之情形之圖。 圖12係顯示使用同實施形態之記憶體器件之一個端子作為SCS端子或作為PCD端子之情形之動作之一例之時序圖。 圖13(A)、(B)係顯示第1變化例之記憶體器件之外形形狀、供該記憶體器件安裝之連接器之外形形狀、及貼附有TIM之區域之配置例之俯視圖。 圖14(A)、(B)係顯示第2變化例之記憶體器件之外形形狀、供該記憶體器件安裝之連接器之外形形狀、及貼附有TIM之區域之配置例之俯視圖。 圖15(A)、(B)係顯示第3變化例之記憶體器件之外形形狀、供該記憶體器件安裝之連接器之外形形狀、及貼附有TIM之區域之配置例之俯視圖。 圖16(A)、(B)係顯示第4變化例之記憶體器件之外形形狀、供該記憶體器件安裝之連接器之外形形狀、及貼附有TIM之區域之配置例之俯視圖。 圖17係顯示第2實施形態之記憶體器件之針腳分配之一例之圖。 圖18係顯示相對於圖17之構成之比較例之針腳分配之圖。 圖19係顯示同實施形態之記憶體器件之針腳分配之其他例之圖。 圖20係顯示同實施形態之記憶體器件之針腳分配之一例之圖。 圖21係顯示相對於圖20之構成之比較例之針腳分配之圖。 圖22係顯示同實施形態之記憶體器件之外層及內層之立體圖。 圖23(A)~(C)係用以說明關於第3實施形態之記憶體器件之端子,共用用以傳遞邊帶信號之信號端子、SCS端子及PCD端子之情形之圖。 圖24係顯示關於同實施形態之記憶體器件之端子,共用用以傳遞邊帶信號之信號端子、SCS端子及PCD端子之情形之動作之一例之時序圖。1(A) to (C) are diagrams showing examples of the external shape of the memory device according to the first embodiment. Fig. 2 is a diagram showing a configuration example of a memory device of the same embodiment. Fig. 3 is a top view showing the outline shape and arrangement example of a plurality of terminals of the memory device of the same embodiment. Fig. 4 (A), (B) is the top view showing the outline shape of the memory device of the same embodiment, the outline shape of the connector for mounting the memory device, and the configuration example of the region where the TIM is attached. Fig. 5 is a side view showing a state in which a memory device of the same embodiment is installed in a connector. 6(A) and (B) are diagrams for explaining the case where the terminals of the memory device of the same embodiment are used as SCS terminals. FIG. 7 is a diagram showing a host control unit and switches arranged on a substrate of a host device using the memory device of the same embodiment. 8(A) and (B) are top views showing the external shapes of the memory devices of the same embodiment, that is, the memory devices with 2 power supplies and the memory devices with 1 power supply. 9(A) and (B) are diagrams for explaining the situation where the terminals of the memory device of the same embodiment are used as PCD terminals. 10(A) and (B) are diagrams showing internal circuits of memory devices of the same embodiment, that is, memory devices with 2 power supplies and memory devices with 1 power supply. 11(A) and (B) are diagrams for explaining the case where one terminal of the memory device of the same embodiment is used as an SCS terminal or as a PCD terminal. Fig. 12 is a timing chart showing an example of the operation when one terminal of the memory device of the same embodiment is used as the SCS terminal or as the PCD terminal. 13(A) and (B) are top views showing the shape of the memory device of the first modification, the shape of the connector for mounting the memory device, and the configuration example of the area where the TIM is attached. Fig. 14 (A), (B) is the top view showing the outline shape of the memory device of the second variation example, the outline shape of the connector for mounting the memory device, and the configuration example of the region where the TIM is attached. 15(A) and (B) are top views showing the external shape of the memory device of the third modification, the external shape of the connector for mounting the memory device, and the arrangement example of the region where the TIM is attached. 16(A) and (B) are top views showing the shape of the memory device of the fourth variation, the shape of the connector for mounting the memory device, and the configuration example of the area where the TIM is attached. Fig. 17 is a diagram showing an example of the pin assignment of the memory device according to the second embodiment. FIG. 18 is a diagram showing pin assignments of a comparative example with respect to the configuration of FIG. 17 . Fig. 19 is a diagram showing another example of pin allocation of the memory device of the same embodiment. Fig. 20 is a diagram showing an example of the pin assignment of the memory device of the same embodiment. FIG. 21 is a diagram showing pin assignments of a comparative example with respect to the configuration of FIG. 20 . Fig. 22 is a perspective view showing the outer layer and inner layer of the memory device of the same embodiment. 23(A) to (C) are diagrams for explaining how the terminals of the memory device according to the third embodiment share a signal terminal for transmitting sideband signals, an SCS terminal, and a PCD terminal. FIG. 24 is a timing chart showing an example of the operation in the case where the terminals of the memory device of the same embodiment share a signal terminal for transmitting sideband signals, an SCS terminal, and a PCD terminal.

10:記憶體器件 10: Memory device

11:本體 11: Ontology

21:第1面 21: Side 1

22:第2面 22: Side 2

23:外緣 23: outer edge

31:第1緣 31: The first edge

32:第2緣 32: The second edge

33:第3緣 33: The third edge

34:第4緣 34: The 4th Edge

35:第1角部 35: 1st corner

36:第2角部 36: the second corner

37:第3角部 37: 3rd corner

38:第4角部 38: 4th corner

39:傾斜部 39: Inclined part

C:倒角部 C: chamfer

R2:行 R2: Row

R3:行 R3: Row

Claims (20)

一種半導體記憶裝置,其包含:本體,其具有:第1面;位於上述第1面之相反側之第2面;於第1方向延伸之第1端緣;位於上述第1端緣之相反側且於上述第1方向延伸之第2端緣;於與上述第1方向交叉之第2方向延伸之第1側緣;及位於上述第1側緣之相反側且於上述第2方向延伸之第2側緣;記憶體,其設置於上述本體之內部;控制器,其設置於上述本體之內部,控制上述記憶體;及複數個端子,其包含用於傳送信號之複數個信號端子,且於上述第1面露出;且上述複數個端子至少形成第1行與第2行;上述第1行包含複數個端子,其等於較上述第2端緣更靠近上述第1端緣之位置,彼此間隔排列於上述第1方向;上述第2行包含複數個端子,其等於較上述第1端緣更靠近上述第2端緣之位置,彼此間隔排列於上述第1方向;上述第1面之上述第1行與上述第2行間之區域,包含與熱傳導構件接觸之接觸區域,該熱傳導構件係配置於可與上述半導體記憶裝置電性連接之主機機器之基板上。 A semiconductor memory device, comprising: a body, which has: a first surface; a second surface located on the opposite side of the first surface; a first edge extending in a first direction; located on the opposite side of the first edge And the second end edge extending in the above-mentioned first direction; the first side edge extending in the second direction intersecting the above-mentioned first direction; and the second edge located on the opposite side of the above-mentioned first side edge and extending in the above-mentioned second direction 2 side edges; a memory, which is arranged inside the above-mentioned body; a controller, which is arranged inside the above-mentioned body to control the above-mentioned memory; and a plurality of terminals, including a plurality of signal terminals for transmitting signals, and in The above-mentioned first surface is exposed; and the above-mentioned plurality of terminals form at least the first row and the second row; the above-mentioned first row contains a plurality of terminals, which are equal to the position closer to the above-mentioned first end edge than the above-mentioned second end edge, and are spaced apart from each other Arranged in the above-mentioned first direction; the above-mentioned second row contains a plurality of terminals, which are equal to the position closer to the above-mentioned second end edge than the above-mentioned first end edge, and are arranged at intervals in the above-mentioned first direction; the above-mentioned first side of the above-mentioned first surface The area between the first row and the second row includes a contact area that is in contact with a thermally conductive member that is disposed on a substrate of a host machine that can be electrically connected to the above-mentioned semiconductor memory device. 如請求項1之半導體記憶裝置,其中上述第2方向之上述第1行與上述第2行間之距離,長於上述第2方向之上述第1行與上述第1端緣間之距離,且長於上述第2方向之上述第2行 與上述第2端緣間之距離。 The semiconductor memory device according to claim 1, wherein the distance between the first row and the second row in the second direction is longer than the distance between the first row in the second direction and the first edge, and is longer than the The 2nd row above in the 2nd direction The distance from the above-mentioned second edge. 如請求項1或2之半導體記憶裝置,其中形成上述第1行之上述複數個端子,包含被分配到差分資料信號之至少一對差分資料信號端子;形成上述第2行之上述複數個端子,包含被分配為用於供給來自上述主機機器之電源電壓的電源端子。 The semiconductor memory device according to claim 1 or 2, wherein the plurality of terminals forming the first row include at least one pair of differential data signal terminals assigned to differential data signals; the plurality of terminals forming the second row, Contains a power supply terminal assigned to supply the power supply voltage from the above-mentioned host machine. 如請求項3之半導體記憶裝置,其中上述差分資料信號以PCIe規格基準;形成上述第1行之上述複數個端子,包含被分配至上述差分資料信號之複數個信道的複數對上述差分資料信號端子。 The semiconductor memory device according to claim 3, wherein the above-mentioned differential data signal is based on the PCIe standard; the above-mentioned plurality of terminals forming the above-mentioned first row includes a plurality of pairs of the above-mentioned differential data signal terminals that are allocated to a plurality of channels of the above-mentioned differential data signal . 如請求項1或2之半導體記憶裝置,其中上述複數個端子進而形成第3行;上述第3行包含:複數個端子,其等於上述第1行與上述第2行間之位置,間隔排列於上述第1方向;形成上述第3行之端子數,少於形成上述第1行或上述第2行之端子數;上述接觸區域包含空出相當於形成上述第3行之端子數較形成上述第1行之端子數為少之部分的區域。 The semiconductor memory device according to claim 1 or 2, wherein the plurality of terminals further form a third row; the third row includes: a plurality of terminals, which are equal to the position between the first row and the second row, and are arranged at intervals in the above The first direction: the number of terminals forming the above-mentioned third row is less than the number of terminals forming the above-mentioned first row or the above-mentioned second row; the above-mentioned contact area includes a space equivalent to the number of terminals forming the above-mentioned third row than the number of terminals forming the above-mentioned first row The area where the number of terminals is the smallest. 如請求項5之半導體記憶裝置,其中上述第3行位於較上述第1端緣更靠近上述第2端緣,且位於較上述第 2行更遠離上述第2端緣。 The semiconductor memory device according to claim 5, wherein the third row is located closer to the second edge than the first edge, and is located closer to the second edge than the first edge 2 rows are farther away from the above-mentioned 2nd end edge. 如請求項5之半導體記憶裝置,其中上述第3行位於較上述第2端緣更靠近上述第1端緣,且位於較上述第1行更遠離上述第1端緣。 The semiconductor memory device according to claim 5, wherein the third row is located closer to the first edge than the second edge, and is further away from the first edge than the first row. 如請求項6之半導體記憶裝置,其中上述第3行於上述第1方向之上述本體之中心線與上述第1側緣間、及上述中心線與上述第2側緣間,包含同數量之端子。 The semiconductor memory device according to claim 6, wherein the third row includes the same number of terminals between the center line of the body in the first direction and the first side edge, and between the center line and the second side edge . 如請求項6之半導體記憶裝置,其中上述第3行於上述第1方向之上述本體之中心線與上述第1側緣間、及上述中心線與上述第2側緣間,包含不同數量之端子。 The semiconductor memory device according to claim 6, wherein the third row includes different numbers of terminals between the center line of the body and the first side edge, and between the center line and the second side edge in the first direction. . 如請求項9之半導體記憶裝置,其中上述第3行於上述中心線與上述第1側緣間、及上述中心線與上述第2側緣間中之一者,包含上述複數個端子。 The semiconductor memory device according to claim 9, wherein the third row includes the plurality of terminals between the center line and the first side edge, and between the center line and the second side edge. 如請求項5之半導體記憶裝置,其中形成上述第3行之上述複數個端子包含被分配至地線之至少一個接地端子、及被分配至PCIe規格之邊帶信號之至少一個邊帶信號端子。 The semiconductor memory device according to claim 5, wherein the plurality of terminals forming the third row include at least one ground terminal assigned to a ground line, and at least one sideband signal terminal assigned to a sideband signal of the PCIe specification. 如請求項11之半導體記憶裝置,其中 形成上述第2行之上述複數個端子包含第1端子,該第1端子被分配到用於選擇上述邊帶信號之構成的選擇信號;當上述第1端子被輸入High(高)位準之上述選擇信號之情形時,對上述至少一個邊帶信號端子分配第1邊帶信號,當上述第1端子被輸入Low(低)位準之上述選擇信號之情形時,對上述至少一個邊帶信號端子分配與上述第1邊帶信號不同之第2邊帶信號。 The semiconductor memory device according to claim 11, wherein The above-mentioned plurality of terminals forming the above-mentioned second row include a first terminal, which is assigned to a selection signal for selecting the configuration of the above-mentioned sideband signal; when the above-mentioned first terminal is input with the above-mentioned When the signal is selected, the first sideband signal is assigned to the at least one sideband signal terminal. When the first terminal is input with the selection signal of Low (low) level, the at least one sideband signal terminal is A second sideband signal different from the above-mentioned first sideband signal is distributed. 如請求項11之半導體記憶裝置,其中形成上述第2行之上述複數個端子包含被分配到檢測信號之第2端子,該檢測信號係供上述主機機器用於檢測上述半導體記憶裝置之電源構成;於上述半導體記憶裝置之電源構成係以由複數種電源電壓進行動作之方式構成之情形時,上述控制器經由上述第2端子對上述主機機器輸出High(高)位準之上述檢測信號,於上述半導體記憶裝置之電源構成係以由1種電源電壓進行動作之方式構成之情形時,上述控制器經由上述第2端子對上述主機機器輸出Low(低)位準之上述檢測信號。 The semiconductor memory device according to claim 11, wherein the plurality of terminals forming the second row include a second terminal assigned to a detection signal, the detection signal being used by the host machine to detect the power supply of the semiconductor memory device; When the power supply configuration of the semiconductor memory device is configured to operate with multiple power supply voltages, the controller outputs the detection signal of High (high) level to the host device through the second terminal. When the power supply configuration of the semiconductor memory device is configured to operate with one power supply voltage, the controller outputs the detection signal of Low level to the host device through the second terminal. 如請求項1之半導體記憶裝置,其中形成上述第1行之上述複數個端子包含複數組被分配到接收差分資料信號之一對接收差分資料信號端子、及被分配到發送差分資料信號之一對發送差分資料信號端子;複數組上述一對接收差分資料信號端子位於上述第1方向之上述本體之中心線與一側緣之間,複數組上述一對發送差分資料信號端子位於上述 中心線與另一側緣之間。 The semiconductor memory device according to claim 1, wherein the plurality of terminals forming the first row include a pair of terminals assigned to receive differential data signals and a pair of terminals assigned to transmit differential data signals Sending differential data signal terminals; the above-mentioned pair of receiving differential data signal terminals in a complex group is located between the center line of the above-mentioned body in the first direction and one side edge, and the above-mentioned pair of sending differential data signal terminals in a complex group is located in the above-mentioned between the center line and the other side edge. 如請求項14之半導體記憶裝置,其中上述一對接收差分資料信號端子及上述一對發送差分資料信號端子配置於雜訊防護用之接地端子間。 The semiconductor memory device according to claim 14, wherein the pair of terminals for receiving differential data signals and the pair of terminals for transmitting differential data signals are arranged between ground terminals for noise protection. 如請求項14之半導體記憶裝置,其中上述複數個端子進而形成第3行;上述第3行包含:複數個端子,其等於上述第1行與上述第2行間之位置,彼此間隔排列於上述第1方向;形成上述第3行之上述複數個端子包含配置於上述中心線與上述第1側緣間之返回電流用之複數個接地端子,且包含配置於上述中心線與上述第2側緣間之上述返回電流用之複數個接地端子。 The semiconductor memory device according to claim 14, wherein the plurality of terminals further form a third row; the third row includes: a plurality of terminals, which are equal to the position between the first row and the second row, and are arranged at intervals in the first row 1 direction: the plurality of terminals forming the third row include a plurality of ground terminals for return current arranged between the center line and the first side edge, and include a plurality of ground terminals arranged between the center line and the second side edge A plurality of ground terminals for the above return current. 如請求項16之半導體記憶裝置,其中形成上述第2行之上述複數個端子包含至少一個上述返回電流用之接地端子。 The semiconductor memory device according to claim 16, wherein said plurality of terminals forming said second row includes at least one ground terminal for said return current. 如請求項17之半導體記憶裝置,其中於上述本體之內部進而具備:第1接地面,其與雜訊防護用之接地端子連接;及第2接地面,其與上述返回電流用之接地端子連接;且上述第1接地面與上述第2接地面未電性連接。 The semiconductor memory device according to claim 17, further comprising: a first ground plane connected to the ground terminal for noise protection; and a second ground plane connected to the ground terminal for return current in the above-mentioned main body ; and the first ground plane is not electrically connected to the second ground plane. 如請求項16之半導體記憶裝置,其中形成上述第3行之上述複數個端子包含被分配到邊帶信號之至少二個信號端子;於上述半導體記憶裝置啟動前,對上述一信號端子輸入用於選擇上述邊帶信號之構成的選擇信號,且自上述另一信號端子輸出供上述主機機器用於檢測上述半導體記憶裝置之電源構成的檢測信號;於上述半導體記憶裝置啟動後,對上述二個信號端子輸入上述邊帶信號。 The semiconductor memory device according to claim 16, wherein the plurality of terminals forming the third row include at least two signal terminals assigned to sideband signals; Select the selection signal for the composition of the above-mentioned sideband signal, and output a detection signal from the other signal terminal for the above-mentioned host machine to detect the power supply of the above-mentioned semiconductor memory device; after the above-mentioned semiconductor memory device is started, the above-mentioned two signals The terminal inputs the above-mentioned sideband signal. 如請求項19之半導體記憶裝置,其中形成上述第2行之上述複數個端子包含被分配到重設信號之信號端子;上述重設信號作用之情形時,對上述一信號端子輸入上述選擇信號,且自上述另一信號端子輸出上述檢測信號;上述重設信號經解除之情形時,對上述二個信號端子輸入上述邊帶信號。 The semiconductor memory device according to claim 19, wherein the plurality of terminals forming the second row include a signal terminal assigned to a reset signal; when the reset signal acts, the selection signal is input to the one signal terminal, And the detection signal is output from the other signal terminal; when the reset signal is released, the sideband signal is input to the two signal terminals.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150131242A1 (en) * 2013-11-12 2015-05-14 Samsung Electronics Co., Ltd. Semiconductor device
TWI574351B (en) * 2014-06-30 2017-03-11 東芝股份有限公司 Semiconductor device
US9668377B2 (en) * 2012-07-19 2017-05-30 Samsung Electronics Co., Ltd. Storage device
TW201724435A (en) * 2015-12-22 2017-07-01 愛思開海力士有限公司 Semiconductor package and method of manufacturing same
US20170228328A1 (en) * 2016-02-04 2017-08-10 CNEXLABS, Inc. Method and apparatus for providing small form-factor pluggable (“sfp”) non-volatile memory (“nvm”) storage devices

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9668377B2 (en) * 2012-07-19 2017-05-30 Samsung Electronics Co., Ltd. Storage device
US20150131242A1 (en) * 2013-11-12 2015-05-14 Samsung Electronics Co., Ltd. Semiconductor device
TWI574351B (en) * 2014-06-30 2017-03-11 東芝股份有限公司 Semiconductor device
TW201724435A (en) * 2015-12-22 2017-07-01 愛思開海力士有限公司 Semiconductor package and method of manufacturing same
US20170228328A1 (en) * 2016-02-04 2017-08-10 CNEXLABS, Inc. Method and apparatus for providing small form-factor pluggable (“sfp”) non-volatile memory (“nvm”) storage devices

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