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TWI781299B - Adhesive composition, adhesive sheet, and method for producing acrylic resin containing ethylenically unsaturated group - Google Patents

Adhesive composition, adhesive sheet, and method for producing acrylic resin containing ethylenically unsaturated group Download PDF

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TWI781299B
TWI781299B TW108108546A TW108108546A TWI781299B TW I781299 B TWI781299 B TW I781299B TW 108108546 A TW108108546 A TW 108108546A TW 108108546 A TW108108546 A TW 108108546A TW I781299 B TWI781299 B TW I781299B
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ethylenically unsaturated
acrylic resin
unsaturated group
group
hydroxyl
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TW108108546A
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TW201942300A (en
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布谷昌平
後藤晃宏
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日商三菱化學股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/14Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

本發明提供一種黏著劑組成物,係可獲得照射活性能量射線前之黏著力良好且耐熱性優異,即便於加熱後,照射活性能量射線後之剝離性(耐汙染性、微黏著性)仍優異之黏著劑的活性能量射線硬化性剝離型之黏著劑組成物,其含有含有乙烯性不飽和基之丙烯酸系樹脂,該含有乙烯性不飽和基之丙烯酸系樹脂於丙烯酸系樹脂之側鏈含有下列通式(1)表示之含有乙烯性不飽和基之結構部位,且乙烯性不飽和基之含量相對於含有乙烯性不飽和基之丙烯酸系樹脂為25~500mmol。

Figure 108108546-A0101-11-0001-1
R1 係含有乙烯性不飽和基之取代基;R2 係含有選自C、O、N及S中之至少一種之有機基,惟胺甲酸酯基除外;X係O或NH。The present invention provides an adhesive composition that can obtain good adhesive force before active energy ray irradiation and has excellent heat resistance, and has excellent peelability (pollution resistance, micro-adhesion) after active energy ray irradiation even after heating Active energy ray-curable peelable adhesive composition of the adhesive, which contains an acrylic resin containing an ethylenically unsaturated group, and the acrylic resin containing an ethylenically unsaturated group contains the following in the side chain of the acrylic resin The structure part containing ethylenically unsaturated group represented by general formula (1), and the content of ethylenically unsaturated group is 25-500 mmol relative to the acrylic resin containing ethylenically unsaturated group.
Figure 108108546-A0101-11-0001-1
R 1 is a substituent containing an ethylenically unsaturated group; R 2 is an organic group containing at least one selected from C, O, N and S, except for a carbamate group; X is O or NH.

Description

黏著劑組成物、黏著片以及含有乙烯性不飽和基之丙烯酸系樹脂之製造方法Adhesive composition, adhesive sheet and method for producing acrylic resin containing ethylenically unsaturated group

本發明係關於含有特定之含有乙烯性不飽和基之丙烯酸系樹脂之黏著劑組成物、黏著片及含有乙烯性不飽和基之丙烯酸系樹脂之製造方法,尤其,係關於對於金屬板、塑膠板等之暫時的表面保護、半導體晶圓等之切割步驟等之半導體固定用黏著片為有用之黏著劑組成物。The present invention relates to an adhesive composition containing a specific ethylenically unsaturated group-containing acrylic resin, an adhesive sheet, and a method for producing an ethylenically unsaturated group-containing acrylic resin, especially for metal plates and plastic plates Adhesive sheets for semiconductor fixing such as temporary surface protection, semiconductor wafer dicing steps, etc. are useful adhesive compositions.

已知有藉由照射紫外線、電子束等活性能量射線來硬化之活性能量射線硬化性樹脂組成物,使用於黏接劑、黏著劑、塗料、印墨、塗佈材、光造形材等用途。又,在電子元件之切削、開孔等加工步驟中,為了防止被加工構件之髒污、損傷,也有人將上述活性能量射線硬化性樹脂組成物使用作為用以暫時保護表面之表面保護用之黏著片之黏著劑層,近年來不限於電子元件,各種構件之加工時亦有人利用表面保護用之黏著片。Active energy ray-curable resin compositions are known that are cured by irradiating active energy rays such as ultraviolet rays and electron beams, and are used in adhesives, adhesives, paints, printing inks, coating materials, optical molding materials, and the like. In addition, in processing steps such as cutting and drilling of electronic components, in order to prevent contamination and damage of the processed member, the above-mentioned active energy ray curable resin composition is also used as a surface protection agent for temporarily protecting the surface. The adhesive layer of the adhesive sheet is not limited to electronic components in recent years, and some people also use the adhesive sheet for surface protection during the processing of various components.

上述黏著片,基於近年來加工之微細化、加工構件之薄膜化等理由,需具有對被加工構件的適度的黏著力,另一方面,表面保護之功用結束後有將表面保護用之黏著片剝離之必要,在進行剝離時需要能以輕的力道剝離而不殘膠。The above-mentioned adhesive sheet needs to have moderate adhesion to the processed member due to the miniaturization of processing and the thinning of the processed member in recent years. On the other hand, after the function of surface protection is over, there are adhesive sheets for surface protection. The necessity of peeling, when peeling, it needs to be peeled off with light force without residual glue.

該使用於黏著片之活性能量射線硬化性樹脂組成物,例如,藉由於丙烯酸系樹脂摻合具有乙烯性不飽和基之單體及寡聚物之至少一者,或使丙烯酸系樹脂本身含有乙烯性不飽和基,來展現活性能量射線硬化性。其中,使用於丙烯酸系樹脂本身中含有乙烯性不飽和基之含有乙烯性不飽和基之丙烯酸系樹脂的話,由於丙烯酸系樹脂本身經照射活性能量射線後會形成交聯結構,因此考量硬化後之彈性模量容易提升之觀點、未交聯成分不容易殘留在被黏體之觀點為有利。The active energy ray-curable resin composition used in the adhesive sheet, for example, is obtained by blending at least one of monomers and oligomers having ethylenically unsaturated groups into the acrylic resin, or by making the acrylic resin itself contain ethylene. Sexual unsaturated groups to exhibit active energy ray hardening properties. Among them, if the acrylic resin itself contains ethylenically unsaturated group-containing acrylic resin, since the acrylic resin itself will form a cross-linked structure after being irradiated with active energy rays, it is considered that the hardened The point of view that the modulus of elasticity is easy to increase and the point of view that non-crosslinked components are not easy to remain in the adherend are advantageous.

作為如此般使用於暫時表面保護用之黏著片的含有乙烯性不飽和基之丙烯酸系樹脂,例如專利文獻1中記載一種丙烯酸系樹脂,係藉由使將丙烯酸-2-羥乙酯共聚合而成之丙烯酸系聚合物與2-甲基丙烯醯氧乙基異氰酸酯進行胺甲酸酯化反應來含有乙烯性不飽和基。As an acrylic resin containing an ethylenically unsaturated group used in an adhesive sheet for temporary surface protection in this way, for example, Patent Document 1 describes an acrylic resin prepared by copolymerizing 2-hydroxyethyl acrylate. The resulting acrylic polymer is urethanized with 2-methacryloxyethyl isocyanate to contain ethylenically unsaturated groups.

此外,專利文獻2中記載一種電子元件加工用黏著膠帶,其使用了藉由使將甲基丙烯酸共聚合而成之丙烯酸系共聚合體與甲基丙烯酸2-羥基乙酯進行酯化反應而得之含有乙烯性不飽和基之丙烯酸系樹脂。In addition, Patent Document 2 describes an adhesive tape for processing electronic components, which uses an acrylic copolymer obtained by copolymerizing methacrylic acid and 2-hydroxyethyl methacrylate for an esterification reaction. Acrylic resin containing ethylenically unsaturated groups.

又,近年之電子元件之製造步驟中,貼附了黏著片之狀態的元件暴露於高溫中的情況亦不少,因此,使用於電子元件之製造步驟之黏著片亦需要可耐受高溫條件之耐熱性。 [先前技術文獻] [專利文獻]In addition, in the manufacturing process of electronic components in recent years, there are many cases where the components in the state where the adhesive sheet is attached are exposed to high temperature. Therefore, the adhesive sheet used in the manufacturing process of electronic components also needs to be able to withstand high temperature conditions. heat resistance. [Prior Art Literature] [Patent Document]

[專利文獻1]日本特開2010-53346號公報 [專利文獻2]日本特開2016-121231號公報[Patent Document 1] Japanese Unexamined Patent Publication No. 2010-53346 [Patent Document 2] Japanese Patent Laid-Open No. 2016-121231

[發明所欲解決之課題][Problem to be Solved by the Invention]

然而,上述專利文獻1之揭示技術中,常溫下之經照射活性能量射線後的剝離性良好,但暴露於150℃以上之高溫條件下後施加活性能量射線照射並進行剝離時,於高溫步驟中丙烯酸系樹脂中之為乙烯性不飽和基之鍵結部之胺甲酸酯鍵結容易因熱分解,因此即使施加活性能量射線照射,黏著力亦難以降低,剝離時容易於被黏體有殘膠。因此,需要更加改善耐熱性。However, in the technique disclosed in Patent Document 1 above, the exfoliation property after active energy ray irradiation at normal temperature is good, but when exfoliation is performed by applying active energy ray irradiation after exposing to a high temperature condition of 150° C. In acrylic resin, the urethane bond, which is the bonding part of the ethylenically unsaturated group, is easily decomposed by heat, so even if the active energy ray is applied, the adhesive force is difficult to decrease, and it is easy to leave residues on the adherend when peeling off. glue. Therefore, further improvement in heat resistance is required.

又,上述專利文獻2之開示技術中,雖藉由酯鍵導入乙烯性不飽和基,但由於導入不飽和基之主鏈部係來自甲基丙烯酸之結構,容易發生因熱導致之主鏈分解反應,耐熱性依然差,要求更加改善。Also, in the technique disclosed in the above-mentioned Patent Document 2, although an ethylenically unsaturated group is introduced through an ester bond, since the main chain part of the introduced unsaturated group is derived from the structure of methacrylic acid, the main chain is easily decomposed by heat. Reaction and heat resistance are still poor, and further improvement is required.

此處,本發明係在如此背景下,提供一種活性能量射線硬化性剝離型之黏著劑組成物,可獲得照射活性能量射線前之黏著力良好,且耐熱性優異,即使於加熱後,照射活性能量射線後之剝離性(耐汚染性、微黏著性)仍優異的黏著劑。 [解決課題之手段]Here, the present invention is based on such a background, and provides an active energy ray-curable peel-off adhesive composition, which can obtain good adhesive force before irradiating active energy ray, and has excellent heat resistance. Adhesive with excellent peelability (pollution resistance, micro-adhesion) even after energy rays. [Means to solve the problem]

因此,本案發明者們,發現藉由使用含有特定量之特定結構之乙烯性不飽和基之丙烯酸系樹脂,可獲得照射活性能量射線前之黏著力良好,且成為耐熱性優異之黏著劑,並於加熱後照射活性能量射線後之剝離性(耐汙染性、微黏著性)亦優異之黏著劑之黏著劑組成物。Therefore, the present inventors have found that by using an acrylic resin containing a specific amount of ethylenically unsaturated groups of a specific structure, it is possible to obtain an adhesive having good adhesion before active energy ray irradiation and excellent heat resistance, and Adhesive composition of an adhesive that is also excellent in peelability (pollution resistance, microadhesiveness) after active energy ray irradiation after heating.

又,本案發明者們,發現藉由在通式(2)表示之化合物(I)之存在下使含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)反應,便不會具有胺甲酸酯鍵結,且即便低溫亦能以高產率將乙烯性不飽和基附加於丙烯酸系樹脂。Also, the present inventors found that by reacting a hydroxyl-containing acrylic resin (α) with an ethylenically unsaturated group-containing carboxylic acid (β) in the presence of a compound (I) represented by the general formula (2), There is no urethane bond, and an ethylenically unsaturated group can be added to the acrylic resin with high yield even at low temperature.

亦即,本發明之第1主旨為一種黏著劑組成物,含有:含有乙烯性不飽和基之丙烯酸系樹脂;該含有乙烯性不飽和基之丙烯酸系樹脂於丙烯酸系樹脂之側鏈含有下列通式(1)表示之含有乙烯性不飽和基之結構部位,且乙烯性不飽和基之含量相對於含有乙烯性不飽和基之丙烯酸系樹脂為25~500mmol/100g。That is, the first gist of the present invention is an adhesive composition comprising: an acrylic resin containing an ethylenically unsaturated group; the acrylic resin containing an ethylenically unsaturated group contains the following general The structure part containing ethylenically unsaturated group represented by formula (1), and the content of ethylenically unsaturated group is 25-500mmol/100g relative to the acrylic resin containing ethylenically unsaturated group.

[化1]

Figure 02_image003
R1 係含有乙烯性不飽和基之取代基,R2 係含有選自C、O、N及S中至少一種之有機基(惟,胺甲酸酯基除外),X係O或NH。[chemical 1]
Figure 02_image003
R1 is a substituent containing an ethylenically unsaturated group, R2 is an organic group containing at least one of C, O, N and S ( except for a carbamate group), and X is O or NH.

又,本發明之第2主旨為一種黏著片,具有上述第1主旨之黏著劑組成物交聯而成之黏著劑層。Moreover, the 2nd aspect of this invention is an adhesive sheet which has the adhesive agent layer which crosslinked the adhesive agent composition of the said 1st aspect.

並且,本發明之第3主旨為一種含有乙烯性不飽和基之丙烯酸系樹脂之製造方法,其特徵在於:使含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)於下列通式(2)表示之化合物(I)之存在下進行反應。Furthermore, the third gist of the present invention is a method for producing an ethylenically unsaturated group-containing acrylic resin, which is characterized in that: a hydroxyl-containing acrylic resin (α) and an ethylenically unsaturated group-containing carboxylic acid (β ) react in the presence of the compound (I) represented by the following general formula (2).

[化2]

Figure 02_image004
此處,R3 及R4 係表示碳數1~20之烴基。 [發明之效果][Chem 2]
Figure 02_image004
Here, R 3 and R 4 represent a hydrocarbon group having 1 to 20 carbon atoms. [Effect of Invention]

本發明之黏著劑組成物含有含有乙烯性不飽和基之丙烯酸系樹脂,該含有乙烯性不飽和基之丙烯酸系樹脂於丙烯酸系樹脂之側鏈含有下列通式(1)表示之含有乙烯性不飽和基之結構部位,且乙烯性不飽和基之含量相對於含有乙烯性不飽和基之丙烯酸系樹脂為25~500mmol/100g。因此,具有該黏著劑組成物交聯而成之黏著劑層之黏著片,由於含有於側鏈含有預定量之特定的含有乙烯性不飽和基之結構部位之丙烯酸系樹脂,照射活性能量射線前之黏著力及照射活性能量射線後之剝離性優異。又,上述黏著劑組成物及黏著片,由於上述含有乙烯性不飽和基之結構部位不具有胺甲酸酯基,為耐熱性優異,即便於高溫加熱後,活性能量射線照射後之剝離性仍優異者。The adhesive composition of the present invention contains an acrylic resin containing an ethylenically unsaturated group, and the acrylic resin containing an ethylenically unsaturated group contains an ethylenically unsaturated group represented by the following general formula (1) in the side chain of the acrylic resin. The structural part of the saturated group, and the content of the ethylenically unsaturated group is 25-500mmol/100g relative to the acrylic resin containing the ethylenically unsaturated group. Therefore, since the adhesive sheet having the adhesive layer formed by crosslinking the adhesive composition contains an acrylic resin having a predetermined amount of a specific ethylenically unsaturated group-containing structural site in the side chain, before irradiating active energy rays Excellent adhesion and peelability after irradiation with active energy rays. In addition, the above-mentioned adhesive composition and adhesive sheet have excellent heat resistance because the above-mentioned structural part containing an ethylenically unsaturated group does not have a urethane group, and even after heating at a high temperature, the peelability after irradiation with active energy rays remains. Excellent.

[化3]

Figure 02_image006
R1 係含有乙烯性不飽和基之取代基,R2 係含有選自C、O、N及S中至少一種之有機基(惟,胺甲酸酯基除外),X係O或NH。[Chem 3]
Figure 02_image006
R1 is a substituent containing an ethylenically unsaturated group, R2 is an organic group containing at least one of C, O, N and S ( except for a carbamate group), and X is O or NH.

又,本發明之中,特別是上述含有乙烯性不飽和基之丙烯酸系樹脂含有羥基的話,則照射活性能量射線前之黏著力更優異。Moreover, in the present invention, especially when the above-mentioned ethylenically unsaturated group-containing acrylic resin contains a hydroxyl group, the adhesive force before irradiation with active energy rays is more excellent.

此外,本發明之黏著劑組成物若含有交聯劑,則照射活性能量射線前之黏著力更優異。In addition, if the adhesive composition of the present invention contains a crosslinking agent, the adhesive force before irradiation with active energy rays will be more excellent.

此外,本發明之黏著劑組成物若含有光聚合引發劑,則可更藉由活性能量射線之照射改善含有乙烯性不飽和基之丙烯酸系樹脂之硬化性,且照射活性能量射線後之剝離性更優異。In addition, if the adhesive composition of the present invention contains a photopolymerization initiator, the curability of the acrylic resin containing an ethylenically unsaturated group can be improved by irradiation of active energy rays, and the peelability after irradiation of active energy rays can be improved. more excellent.

又,本發明之中,特別是上述含有乙烯性不飽和基之丙烯酸系樹脂係使含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)於前述通式(2)表示之化合物(I)之存在下進行反應而成者的話,則能以高產率獲得含有乙烯性不飽和基之丙烯酸系樹脂。因此,照射活性能量射線前之黏著力及照射活性能量射線後之剝離性更優異,此外耐熱性優異,即使於高溫加熱後,活性能量射線照射後之剝離性亦優異。Also, in the present invention, especially the above-mentioned ethylenically unsaturated group-containing acrylic resin is a combination of the hydroxyl-containing acrylic resin (α) and the ethylenically unsaturated group-containing carboxylic acid (β) in the aforementioned general formula (2 ) in the presence of the compound (I) represented by the reaction, the ethylenically unsaturated group-containing acrylic resin can be obtained in high yield. Therefore, the adhesive force before active energy ray irradiation and the detachability after active energy ray irradiation are more excellent, and the heat resistance is excellent, and the detachability after active energy ray irradiation is also excellent even after heating at a high temperature.

並且,本發明之中,特別是上述含有乙烯性不飽和基之丙烯酸系樹脂係使含有羥基之丙烯酸系樹脂(α)與(甲基)丙烯酸酐(γ)進行酯化反應而成者的話,則能以高產率獲得含有乙烯性不飽和基之丙烯酸系樹脂。因此,照射活性能量射線前之黏著力及照射活性能量射線後之剝離性更加優異,此外耐熱性優異,即使於高溫加熱後,活性能量射線照射後之剝離性亦優異。In addition, in the present invention, especially if the above-mentioned ethylenically unsaturated group-containing acrylic resin is obtained by esterifying a hydroxyl-containing acrylic resin (α) and (meth)acrylic anhydride (γ), Then, the acrylic resin containing ethylenically unsaturated groups can be obtained in high yield. Therefore, the adhesive force before active energy ray irradiation and the releasability after active energy ray irradiation are more excellent, and the heat resistance is excellent, and the releasability after active energy ray irradiation is also excellent even after heating at a high temperature.

又,依據本發明之製造方法,係使含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)於前述通式(2)表示之化合物(I)之存在下進行反應,因此能以高產率獲得含有乙烯性不飽和基之丙烯酸系樹脂。又,該製造方法並不需要在反應後進行用以去除副產物的繁雜的操作,可獲得即使是暴露在高溫下之用途亦適用之含有乙烯性不飽和基之丙烯酸系樹脂。Also, according to the production method of the present invention, the acrylic resin (α) containing a hydroxyl group and the carboxylic acid (β) containing an ethylenically unsaturated group are carried out in the presence of the compound (I) represented by the aforementioned general formula (2). reaction, so acrylic resins containing ethylenically unsaturated groups can be obtained in high yield. In addition, this production method does not require complicated operations for removing by-products after the reaction, and an ethylenically unsaturated group-containing acrylic resin suitable for applications exposed to high temperatures can be obtained.

又,本發明之製造方法之中,特別是使上述含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)於前述通式(2)表示之化合物(I)之存在下進行反應時,更於1種以上之鎂化合物與1種以上之鹼金屬化合物之存在下進行反應的話,則能以更高產率獲得含有乙烯性不飽和基之丙烯酸系樹脂。In addition, in the production method of the present invention, the above-mentioned acrylic resin (α) containing a hydroxyl group and the carboxylic acid (β) containing an ethylenically unsaturated group are combined in the compound (I) represented by the above-mentioned general formula (2). When the reaction is performed in the presence of one or more magnesium compounds and one or more alkali metal compounds, the ethylenically unsaturated group-containing acrylic resin can be obtained in higher yield.

此外,本發明之製造方法之中,特別是構成上述鹼金屬化合物之鹼金屬為鋰的話,則能以更高產率獲得含有乙烯性不飽和基之丙烯酸系樹脂。In addition, in the production method of the present invention, especially when the alkali metal constituting the alkali metal compound is lithium, an ethylenically unsaturated group-containing acrylic resin can be obtained with a higher yield.

並且,本發明之製造方法之中,特別是前述通式(2)表示之化合物(I)為二碳酸二第三丁酯的話,則能以更高產率獲得含有乙烯性不飽和基之丙烯酸系樹脂。And, in the production method of the present invention, especially if the compound (I) represented by the aforementioned general formula (2) is di-tertiary butyl dicarbonate, the acrylic acid containing ethylenically unsaturated group can be obtained with a higher yield. resin.

又,本發明之製造方法之中,特別是在相對於上述含有乙烯性不飽和基之羧酸(β)為0.001~1000mol%之前述鎂化合物及0.001~1000mol%之前述鹼金屬化合物之存在下進行反應的話,則能以更高產率獲得含有乙烯性不飽和基之丙烯酸系樹脂。In addition, in the production method of the present invention, in particular, in the presence of 0.001 to 1000 mol% of the aforementioned magnesium compound and 0.001 to 1000 mol% of the aforementioned alkali metal compound relative to the aforementioned ethylenically unsaturated group-containing carboxylic acid (β) When the reaction is carried out, an ethylenically unsaturated group-containing acrylic resin can be obtained with a higher yield.

此外,本發明之製造方法之中,特別是構成上述含有羥基之丙烯酸系樹脂(α)之含有羥基之單體(a1)之含量相對於全體聚合成分為0.1~50質量%的話,則將獲得之含有乙烯性不飽和基之丙烯酸系樹脂使用作為黏著劑時,可藉由照射活性能量射線來使其硬化,能具有更良好之剝離性。In addition, in the production method of the present invention, when the content of the hydroxyl group-containing monomer (a1) constituting the above-mentioned hydroxyl group-containing acrylic resin (α) is 0.1 to 50% by mass relative to the entire polymerized components, the When the acrylic resin containing ethylenically unsaturated groups is used as an adhesive, it can be hardened by irradiating active energy rays, and can have better peelability.

又,本發明之製造方法之中,特別是含有乙烯性不飽和基之丙烯酸系樹脂之乙烯性不飽和基之含量,相對於含有乙烯性不飽和基之丙烯酸系樹脂為25~500mmol/100g的話,則將獲得之含有乙烯性不飽和基之丙烯酸系樹脂使用作為黏著劑時,可藉由照射活性能量射線來使其硬化,能具有更好的剝離性。In addition, in the production method of the present invention, especially if the ethylenically unsaturated group content of the ethylenically unsaturated group-containing acrylic resin is 25 to 500 mmol/100 g relative to the ethylenically unsaturated group-containing acrylic resin , when the obtained acrylic resin containing ethylenically unsaturated groups is used as an adhesive, it can be hardened by irradiating active energy rays, and can have better peelability.

並且,本發明之製造方法之中,特別是上述含有羥基之丙烯酸系樹脂(α)之酸價為10mgKOH/g以下的話,則反應中不會凝膠化,能以更高產率有效率地獲得含有乙烯性不飽和基之丙烯酸系樹脂。In addition, in the production method of the present invention, especially if the acid value of the above-mentioned hydroxyl group-containing acrylic resin (α) is 10 mgKOH/g or less, gelation will not occur during the reaction, and it can be obtained efficiently with a higher yield. Acrylic resin containing ethylenically unsaturated groups.

以下針對實施本發明所需的形態具體地進行說明,但本發明並不限定於該等。 本發明中,「(甲基)丙烯酸」係指丙烯酸或甲基丙烯酸,「(甲基)丙烯醯基」係指丙烯醯基或甲基丙烯醯基,「(甲基)丙烯酸酯」係指丙烯酸酯或甲基丙烯酸酯。 又,「丙烯酸系樹脂」係指將含有至少1種之(甲基)丙烯酸酯系單體聚合成分進行聚合而獲得之樹脂。 又,本發明中,所謂「片」,並無特別與「薄膜」、「帶」區別,係作為亦包含它們之涵義而記載。Hereinafter, although the form required for carrying out this invention is demonstrated concretely, this invention is not limited to these. In the present invention, "(meth)acrylic acid" refers to acrylic acid or methacrylic acid, "(meth)acryl" refers to acryl or methacryl, and "(meth)acrylate" refers to Acrylate or methacrylate. In addition, the "acrylic resin" refers to a resin obtained by polymerizing a (meth)acrylate-based monomer polymerization component containing at least one kind. In addition, in the present invention, the term "sheet" is not particularly different from "film" and "tape", and is described as including them.

本發明之黏著劑組成物,通常係以與金屬板、塑膠板、半導體晶圓等被加工構件於貼合後剝離為前提,主要使用於黏著片之黏著劑層。上述黏著片係將黏著劑組成物塗佈於基材片上形成黏著劑層,且與被加工構件貼合後,藉由照射活性能量射線使黏著劑層硬化且黏著力降低,可輕易地從被加工構件剝離。The adhesive composition of the present invention is usually based on the premise that it will be peeled off after bonding with metal plates, plastic plates, semiconductor wafers and other processed components, and is mainly used in the adhesive layer of the adhesive sheet. The above-mentioned adhesive sheet is formed by coating the adhesive composition on the substrate sheet to form an adhesive layer, and after bonding to the workpiece, the adhesive layer is hardened and the adhesive force is reduced by irradiating active energy rays, so that it can be easily removed from the workpiece. Processing member stripping.

本發明之黏著劑組成物,含有以預定量含有下列通式(1)表示之含有乙烯性不飽和基之結構部位之丙烯酸系樹脂。The adhesive composition of the present invention contains an acrylic resin containing an ethylenically unsaturated group-containing structural site represented by the following general formula (1) in a predetermined amount.

[化4]

Figure 02_image006
R1 係含有乙烯性不飽和基之取代基,R2 係含有選自C、O、N及S中至少一種之有機基(惟,胺甲酸酯基除外),X係O或NH。[chemical 4]
Figure 02_image006
R1 is a substituent containing an ethylenically unsaturated group, R2 is an organic group containing at least one of C, O, N and S ( except for a carbamate group), and X is O or NH.

含有上述通式(1)表示之含有乙烯性不飽和基結構部位之丙烯酸系樹脂,係使含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)於化合物(I)之存在下進行反應,或使含有羥基之丙烯酸系樹脂(α)與(甲基)丙烯酸酐(γ)進行反應而獲得。以下針對這些成分進行說明。The acrylic resin containing the ethylenically unsaturated group structure represented by the above-mentioned general formula (1) is obtained by combining the hydroxyl-containing acrylic resin (α) and the ethylenically unsaturated group-containing carboxylic acid (β) in the compound (I ) in the presence of the reaction, or a hydroxyl-containing acrylic resin (α) and (meth)acrylic anhydride (γ) are obtained by the reaction. These components will be described below.

[含有羥基之丙烯酸系樹脂(α)] 上述含有羥基之丙烯酸系樹脂(α)係使含有羥基之單體(a1)、(甲基)丙烯酸烷酯(a2)、宜使含有官能基之單體(a3)(惟不包括含有羥基之單體(a1))、更因應需要使其他共聚合性單體(a4)進行聚合而獲得。[Hydroxyl-containing acrylic resin (α)] The above-mentioned acrylic resin (α) containing a hydroxyl group is a monomer (a1) containing a hydroxyl group, an alkyl (meth)acrylate (a2), preferably a monomer (a3) containing a functional group (but not including a monomer containing a hydroxyl group) monomer (a1)) and, if necessary, other copolymerizable monomers (a4) can be obtained by polymerizing.

上述含有羥基之單體(a1)含有之羥基會在聚合後之含有羥基之丙烯酸系樹脂(α)中,成為與含有乙烯性不飽和基之羧酸(β)或(甲基)丙烯酸酐(γ)之反應點。 又,羥基亦會成為與後述交聯劑之反應點,並以含有與含有乙烯性不飽和基之羧酸(β)或(甲基)丙烯酸酐(γ)之反應中會消費的量以上之含量為佳。The hydroxyl group contained in the above-mentioned hydroxyl group-containing monomer (a1) will form an ethylenically unsaturated group-containing carboxylic acid (β) or (meth)acrylic anhydride (meth)acrylic anhydride ( γ) reaction point. In addition, the hydroxyl group also becomes a reaction point with the crosslinking agent described later, and contains more than the amount that will be consumed in the reaction with the ethylenically unsaturated group-containing carboxylic acid (β) or (meth)acrylic anhydride (γ). Content is better.

上述含有羥基之單體(a1)考量耐熱性之觀點不包括甲基丙烯酸酯系單體,可舉例如含有羥基丙烯酸酯系之單體、或含有羥基丙烯醯胺系之單體。就上述含有羥基丙烯酸酯系之單體、或含有羥基丙烯醯胺系之單體而言,具體而言可舉例如丙烯酸2-羥基乙酯、丙烯酸4-羥基丁酯、丙烯酸5-羥基戊酯、丙烯酸6-羥基己酯、丙烯酸8-羥基辛酯等丙烯酸羥烷酯、2-羥基乙基丙烯醯胺等羥烷基丙烯醯胺、己內酯改性2-羥基乙基丙烯酸酯等己內酯改性單體、二乙二醇丙烯酸酯、聚乙二醇丙烯酸酯等羥伸烷(oxyalkylene)改性單體、2-丙烯醯氧乙基-2-羥基乙基苯二甲酸等含有1級羥基之單體;2-羥基丙基丙烯酸酯、2-羥基丁基丙烯酸酯、3-氯-2-羥基丙基丙烯酸酯等含有2級羥基之單體;2,2-二甲基-2-羥基乙基丙烯酸酯等含有3級羥基之單體等。該等可單獨使用或併用2種以上。 上述含有羥基單體(a1)之中,考量與後述含有乙烯性不飽和基之羧酸(β)或(甲基)丙烯酸酐(γ)之反應性優異的觀點,宜為含有1級羥基之單體,尤宜為2-羥基乙基丙烯酸酯、4-羥基丁基丙烯酸酯。The aforementioned hydroxy group-containing monomer (a1) does not include methacrylate-based monomers in consideration of heat resistance, and examples include hydroxy-containing acrylate-based monomers or hydroxy-acrylamide-based monomers. As for the above-mentioned hydroxyacrylate-containing monomers or hydroxyacrylamide-containing monomers, specific examples include 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate, and 5-hydroxypentyl acrylate. , 6-hydroxyhexyl acrylate, 8-hydroxyoctyl acrylate, etc. Lactone-modified monomers, diethylene glycol acrylate, polyethylene glycol acrylate and other oxyalkylene-modified monomers, 2-acryloxyethyl-2-hydroxyethylphthalic acid, etc. contain Monomers with primary hydroxyl groups; 2-hydroxypropyl acrylate, 2-hydroxybutyl acrylate, 3-chloro-2-hydroxypropyl acrylate and other monomers containing secondary hydroxyl groups; 2,2-dimethyl - 2-Hydroxyethyl acrylate and other monomers containing tertiary hydroxyl groups. These can be used individually or in combination of 2 or more types. Among the above-mentioned hydroxyl group-containing monomers (a1), those containing a primary hydroxyl group are preferable from the viewpoint of excellent reactivity with ethylenically unsaturated group-containing carboxylic acid (β) or (meth)acrylic anhydride (γ) described later. The monomer is particularly preferably 2-hydroxyethyl acrylate and 4-hydroxybutyl acrylate.

上述含有羥基之單體(a1)之含量,相對於含有羥基之丙烯酸系樹脂(α)之全體聚合成分,通常為0.1~50重量%,宜為5~40重量%,更宜為10~35重量%。該含量若過多,則有交聯於乾燥步驟前進行且塗佈性容易發生問題之傾向,若過少則有無法與含量充足之含有乙烯性不飽和基之羧酸(β)或(甲基)丙烯酸酐(γ)進行反應,且照射活性能量射線後之剝離性降低之傾向。The content of the hydroxyl group-containing monomer (a1) is usually 0.1 to 50% by weight, preferably 5 to 40% by weight, more preferably 10 to 35% by weight, based on the total polymerized components of the hydroxyl group-containing acrylic resin (α). weight%. If the content is too large, crosslinking will proceed before the drying step, and problems with coating properties will tend to occur. If the content is too small, it will not be possible to combine with ethylenically unsaturated group-containing carboxylic acid (β) or (methyl) in sufficient content. Acrylic anhydride (γ) reacts and tends to lower the detachability after active energy ray irradiation.

上述(甲基)丙烯酸烷酯(a2),係獲得含有羥基之丙烯酸系樹脂(α)之聚合成分之主成分。又,上述(甲基)丙烯酸烷酯(a2),烷基之碳數通常為1~24,宜為1~20,尤宜為1~12,又更宜為1~8。碳數若過大,則聚合性會變低,有在含有羥基之丙烯酸系樹脂(α)中容易作為未反應單體而殘留,且容易產生對被加工構件之汙染、殘膠之傾向。The above-mentioned alkyl (meth)acrylate (a2) is the main component of the polymerization component to obtain the hydroxyl group-containing acrylic resin (α). In addition, in the above-mentioned alkyl (meth)acrylate (a2), the carbon number of the alkyl group is usually 1-24, preferably 1-20, especially preferably 1-12, and more preferably 1-8. If the carbon number is too large, the polymerizability will be low, and it will tend to remain as unreacted monomer in the hydroxyl group-containing acrylic resin (α), and tend to cause contamination and adhesive residue on workpieces.

就上述(甲基)丙烯酸烷酯(a2)而言,具體而言可舉例如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸鯨蠟酯、(甲基)丙烯酸硬脂基酯、(甲基)丙烯酸異硬脂基酯等脂肪族之(甲基)丙烯酸烷酯;(甲基)丙烯酸環己酯、(甲基)丙烯酸異莰酯等脂環族之(甲基)丙烯酸烷酯等。該等可單獨使用,亦可併用2種以上。 上述(甲基)丙烯酸烷酯(a2)之中,考量共聚合性、黏著物性、操作容易性及得到原料之容易性的觀點,宜為(甲基)丙烯酸甲酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸2-乙基己酯。Specific examples of the above-mentioned alkyl (meth)acrylate (a2) include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, (meth) Isobutyl acrylate, tertiary butyl (meth)acrylate, n-propyl (meth)acrylate, n-hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, n-(meth)acrylate Octyl, isooctyl (meth)acrylate, isodecyl (meth)acrylate, lauryl (meth)acrylate, cetyl (meth)acrylate, stearyl (meth)acrylate, (meth)acrylate aliphatic alkyl (meth)acrylates such as isostearyl acrylate; alicyclic alkyl (meth)acrylates such as cyclohexyl (meth)acrylate and isocamphoryl (meth)acrylate, etc. . These may be used alone or in combination of two or more. Among the above-mentioned alkyl (meth)acrylates (a2), methyl (meth)acrylate, n-(meth)acrylic acid, etc. Butyl ester, 2-ethylhexyl (meth)acrylate.

又,上述(甲基)丙烯酸烷酯(a2)之含量,相對於含有羥基之丙烯酸系樹脂(α)之全體聚合成分,通常為30~99重量%,宜為40~95重量%,尤宜為50~90重量%。該含量若過少,則有照射活性能量射線前之黏著力容易降低之傾向,若過多則有照射活性能量射線前之黏著力變得過高之傾向。Furthermore, the content of the above-mentioned alkyl (meth)acrylate (a2) is usually 30 to 99% by weight, preferably 40 to 95% by weight, and particularly preferably It is 50 to 90% by weight. When the content is too small, the adhesive force before active energy ray irradiation tends to decrease easily, and when too much, the adhesive force before active energy ray irradiation tends to become too high.

本發明中,考量與後述交聯劑之反應優異的觀點宜於丙烯酸系樹脂中含有羥基,除了含有羥基之單體(a1)以外亦宜含有與後述交聯劑反應之含有官能基之單體(a3)作為聚合成分。In the present invention, it is preferable to contain a hydroxyl group in the acrylic resin from the viewpoint of excellent reaction with the crosslinking agent described later, and it is preferable to contain a monomer containing a functional group that reacts with the crosslinking agent described below in addition to the monomer (a1) containing a hydroxyl group. (a3) as a polymerization component.

就上述含有官能基之單體(a3)而言,可舉例如含有羧基之單體、含有胺基之單體、含有醯胺基之單體、含有環氧丙基之單體、含有磺酸基之單體、含有乙醯乙醯基之單體等。又,這些含有官能基之單體,可單獨使用或併用2種以上。The above-mentioned functional group-containing monomer (a3) includes, for example, carboxyl group-containing monomers, amine group-containing monomers, amido group-containing monomers, glycidyl group-containing monomers, sulfonic acid-containing Monomers with acetyl groups, monomers with acetyl acetyl groups, etc. Moreover, these functional group containing monomers can be used individually or in combination of 2 or more types.

就上述含有羧基之單體而言,可舉例如(甲基)丙烯酸、(甲基)丙烯酸二聚體、巴豆酸、馬來酸、馬來酸酐、反丁烯二酸、檸康酸、戊烯二酸、亞甲基丁二酸、丙烯醯胺N-乙醇酸、桂皮酸等。其中考量共聚合性的觀點宜使用(甲基)丙烯酸。As for the above carboxyl group-containing monomers, for example, (meth)acrylic acid, (meth)acrylic acid dimer, crotonic acid, maleic acid, maleic anhydride, fumaric acid, citraconic acid, valeric acid, Acrylic acid, methylene succinic acid, acrylamide N-glycolic acid, cinnamic acid, etc. Among them, (meth)acrylic acid is preferably used from the viewpoint of copolymerizability.

上述含有羧基之單體之含量,相對於含有羥基之丙烯酸系樹脂(α)之全體聚合成分,通常為1重量%以下,宜為0.5重量%以下,更宜為0.3重量%以下。該含量若過多,則有容易使被加工構件變質之傾向、交聯於乾燥步驟前進行、塗佈性容易發生問題之傾向。The content of the carboxyl group-containing monomer is usually at most 1% by weight, preferably at most 0.5% by weight, more preferably at most 0.3% by weight, based on the total polymerized components of the hydroxyl group-containing acrylic resin (α). If the content is too large, the processed member tends to deteriorate easily, crosslinking proceeds before the drying step, and problems with coatability tend to occur easily.

上述含有胺基之單體,可舉例如N,N-二甲基胺基乙基(甲基)丙烯酸酯、N,N-二甲基胺基丙基(甲基)丙烯酸酯等。The monomers containing amino groups mentioned above include, for example, N,N-dimethylaminoethyl (meth)acrylate, N,N-dimethylaminopropyl (meth)acrylate, and the like.

上述含有胺基之單體之含量,相對於含有羥基之丙烯酸系樹脂(α)之全體聚合成分,通常為10重量%以下,宜為5重量%以下,更宜為2重量%以下。該含量若過多,則有交聯於乾燥步驟前進行、塗佈性容易發生問題之傾向。The content of the amino group-containing monomer is usually 10% by weight or less, preferably 5% by weight or less, more preferably 2% by weight or less, based on the total polymerized components of the hydroxyl group-containing acrylic resin (α). When this content is too large, crosslinking will progress before a drying process, and there exists a tendency for applicability to generate|occur|produce a problem easily.

就上述含有醯胺基之單體而言,可舉例如乙氧基甲基(甲基)丙烯醯胺、正丁氧基甲基(甲基)丙烯醯胺、(甲基)丙烯醯基

Figure 108108546-A0304-12-01
啉、二甲基(甲基)丙烯醯胺、二乙基(甲基)丙烯醯胺、二甲基胺基丙基丙烯醯胺、(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺等(甲基)丙烯醯胺系單體等。For the monomers containing amide groups mentioned above, for example, ethoxymethyl (meth)acrylamide, n-butoxymethyl (meth)acrylamide, (meth)acrylamide
Figure 108108546-A0304-12-01
phenoline, dimethyl(meth)acrylamide, diethyl(meth)acrylamide, dimethylaminopropylacrylamide, (meth)acrylamide, N-methylol(meth)acrylamide (meth)acrylamide-based monomers such as base) acrylamide and the like.

上述含有醯胺基之單體之含量,相對於含有羥基之丙烯酸系樹脂(α)之全體聚合成分,通常為30重量%以下,宜為25重量%以下,更宜為20重量%以下。該含量若過多,則有交聯於乾燥步驟前進行、塗佈性容易發生問題之傾向。The content of the amide group-containing monomer is usually 30% by weight or less, preferably 25% by weight or less, more preferably 20% by weight or less, based on the total polymerized components of the hydroxyl group-containing acrylic resin (α). When this content is too large, crosslinking will progress before a drying process, and there exists a tendency for applicability to generate|occur|produce a problem easily.

就上述含有環氧丙基之單體而言,可舉例如甲基丙烯酸環氧丙酯、甲基丙烯酸烯丙基環氧丙酯等。Examples of the glycidyl group-containing monomer include glycidyl methacrylate, allylglycidyl methacrylate, and the like.

上述含有環氧丙基之單體之含量,相對於含有羥基之丙烯酸系樹脂(α)之全體聚合成分,通常為20重量%以下,宜為15重量%以下,更宜為10重量%以下。該含量若過多,則有交聯於乾燥步驟前進行、塗佈性容易發生問題之傾向。The content of the glycidyl group-containing monomer is usually 20% by weight or less, preferably 15% by weight or less, more preferably 10% by weight or less, based on the entire polymerized components of the hydroxyl group-containing acrylic resin (α). When this content is too large, crosslinking will progress before a drying process, and there exists a tendency for applicability to generate|occur|produce a problem easily.

就上述含有磺酸基之單體而言,可舉例如乙烯基磺酸、烯丙基磺酸、甲基烯丙基磺酸等烯烴磺酸、2-丙烯醯胺-2-羥甲基丙烷磺酸、苯乙烯基磺酸或其鹽等。Examples of monomers containing sulfonic acid groups include olefin sulfonic acids such as vinylsulfonic acid, allylsulfonic acid, and methallylsulfonic acid; 2-acrylamide-2-methylolpropane Sulfonic acid, styrylsulfonic acid or its salt, etc.

上述含有磺酸基之單體之含量,相對於含有羥基之丙烯酸系樹脂(α)之全體聚合成分,通常為1重量%以下,宜為0.5重量%以下,更宜為0.3重量%以下。該含量若過多,則有交聯於乾燥步驟前進行、塗佈性容易發生問題之傾向。The content of the above-mentioned sulfonic acid group-containing monomer is usually at most 1% by weight, preferably at most 0.5% by weight, more preferably at most 0.3% by weight, based on the entire polymerized components of the hydroxyl group-containing acrylic resin (α). When this content is too large, crosslinking will progress before a drying process, and there exists a tendency for applicability to generate|occur|produce a problem easily.

就上述含有乙醯乙醯基之單體而言,可舉例如2-(乙醯乙醯氧基)乙基(甲基)丙烯酸酯、乙醯乙酸烯丙酯等。Examples of the acetoacetyl group-containing monomer include 2-(acetylacetyloxy)ethyl (meth)acrylate, allyl acetylacetate, and the like.

上述含有乙醯乙醯基之單體之含量,相對於含有羥基之丙烯酸系樹脂(α)之全體聚合成分,通常為10重量%以下,宜為5重量%以下,更宜為1重量%以下。該含量若過多,則有交聯於乾燥步驟前進行、塗佈性容易發生問題之傾向。The content of the acetoacetyl group-containing monomer is usually not more than 10% by weight, preferably not more than 5% by weight, more preferably not more than 1% by weight, based on the total polymerized components of the hydroxyl group-containing acrylic resin (α). . When this content is too large, crosslinking will progress before a drying process, and there exists a tendency for applicability to generate|occur|produce a problem easily.

就上述其他共聚合性單體(a4)而言,可舉例如、乙酸乙烯酯、丙酸乙烯酯、硬脂酸乙烯酯、苯甲酸乙烯酯等羧酸乙烯酯單體;(甲基)丙烯酸苯酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸苯基二伸乙二酯、(甲基)丙烯酸2-羥基-3-苯氧基丙酯、苯乙烯、α-甲苯乙烯等含有芳香環之單體;(甲基)丙烯酸聯苯氧基乙酯等含有聯苯氧基結構之(甲基)丙烯酸酯系單體;(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸2-乙氧基乙酯、甲氧基二乙二醇(甲基)丙烯酸酯、乙氧基二乙二醇(甲基)丙烯酸酯、甲氧基聚乙二醇(甲基)丙烯酸酯、聚丙烯乙二醇單(甲基)丙烯酸酯等含有烷氧基或氧烷基之單體;丙烯腈、甲基丙烯腈、氯乙烯、氯化亞乙烯、烷基乙烯基醚、乙烯基甲苯、乙烯基吡啶、乙烯基吡咯酮、伊康酸二烷基酯、反丁烯二酸二烷基酯、烯丙基醇、丙烯醯氯、甲基乙烯基酮、烯丙基三甲基氯化銨、二甲基烯丙基乙烯基酮等。該等可單獨使用,亦可併用2種以上。Examples of other copolymerizable monomers (a4) include vinyl carboxylate monomers such as vinyl acetate, vinyl propionate, vinyl stearate, and vinyl benzoate; (meth)acrylic acid Phenyl ester, benzyl (meth)acrylate, phenoxyethyl (meth)acrylate, phenylethylene glycol (meth)acrylate, 2-hydroxy-3-phenoxy (meth)acrylate Monomers containing aromatic rings such as propyl ester, styrene, α-toluene, etc.; (meth)acrylate monomers containing biphenoxy structure such as biphenoxyethyl (meth)acrylate; ) 2-methoxyethyl acrylate, 2-ethoxyethyl (meth)acrylate, methoxydiethylene glycol (meth)acrylate, ethoxydiethylene glycol (meth)acrylate , methoxypolyethylene glycol (meth)acrylate, polypropylene glycol mono(meth)acrylate and other monomers containing alkoxy or oxyalkyl groups; acrylonitrile, methacrylonitrile, vinyl chloride , Vinylene Chloride, Alkyl Vinyl Ether, Vinyl Toluene, Vinyl Pyridine, Vinyl Pyrrolone, Dialkyl Iconate, Dialkyl Fumarate, Allyl Alcohol, Acryl Chlorine, methyl vinyl ketone, allyl trimethyl ammonium chloride, dimethyl allyl vinyl ketone, etc. These may be used alone or in combination of two or more.

上述其他共聚合性單體(a4)之含量,相對於含有羥基之丙烯酸系樹脂(α)之全體聚合成分,通常為40重量%以下,宜為30重量%以下,更宜為25重量%以下。其他共聚合性單體(a4)若過多則有黏著特性容易降低之傾向。The content of the aforementioned other copolymerizable monomer (a4) is usually not more than 40% by weight, preferably not more than 30% by weight, more preferably not more than 25% by weight, based on the total polymerized components of the hydroxyl group-containing acrylic resin (α). . When there are too many other copolymerizable monomers (a4), the adhesive property tends to fall easily.

本發明中使用的含有羥基之丙烯酸系樹脂(α),係藉由將含有羥基之單體(a1)、(甲基)丙烯酸烷酯(a2)、宜將含有官能基之單體(a3)、因應需要將其他共聚合性單體(a4)作為聚合成分聚合來獲得。就該聚合法而言通常可利用溶液自由基聚合、懸浮聚合、塊狀聚合、乳化聚合等自以往公知的方法適當地進行。其中又以利用溶液自由基聚合進行製造,考量可安全、安定、並以任意之單體組成製造含有羥基之丙烯酸系樹脂(α)之觀點為理想。The hydroxyl-containing acrylic resin (α) used in the present invention is obtained by combining the hydroxyl-containing monomer (a1), (meth)acrylic acid alkyl ester (a2), preferably the functional group-containing monomer (a3) , It can be obtained by polymerizing other copolymerizable monomer (a4) as a polymerization component as needed. Usually, this polymerization method can be suitably performed by conventionally known methods, such as solution radical polymerization, suspension polymerization, block polymerization, and emulsion polymerization. Among them, production by solution radical polymerization is ideal in view of safety, stability, and the production of hydroxyl-containing acrylic resin (α) with an arbitrary monomer composition.

上述溶液自由基聚合,例如於有機溶劑中混合或滴加含有羥基之單體(a1)、(甲基)丙烯酸烷酯(a2)、含有官能基之單體(a3)、其他共聚合性單體(a4)等單體成分及聚合開始劑,並於回流狀態或通常50~98℃且0.1~20小時左右聚合即可。The radical polymerization of the above solution, for example, mixing or dropping hydroxyl-containing monomers (a1), (meth)acrylic acid alkyl esters (a2), functional group-containing monomers (a3), and other copolymerizable monomers in an organic solvent monomer components such as the body (a4) and a polymerization initiator, and polymerize in a reflux state or usually at 50 to 98° C. for 0.1 to 20 hours.

就上述聚合反應中使用的有機溶劑而言,可舉例如甲苯、二甲苯等芳香族烴類、己烷等脂肪族烴類、乙酸乙酯、乙酸丁酯等酯類、正丙醇、異丙醇等脂肪族醇類、丙酮、甲基乙基酮、甲基異丁基酮、環己酮等酮類等。Examples of organic solvents used in the above polymerization reaction include aromatic hydrocarbons such as toluene and xylene, aliphatic hydrocarbons such as hexane, esters such as ethyl acetate and butyl acetate, n-propanol, isopropyl alcohol, and the like. Aliphatic alcohols such as alcohol, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.

就上述聚合開始劑而言,可使用通常之自由基聚合開始劑,具體而言可舉例如偶氮雙異丁腈、偶氮雙二甲基戊腈等偶氮系聚合開始劑、過氧化苯甲醯、過氧化月桂醯、二第三丁基過氧化物、過氧化氫異丙苯等過氧化物系聚合開始劑等。As the above-mentioned polymerization initiator, a general radical polymerization initiator can be used, specifically, azo-based polymerization initiators such as azobisisobutyronitrile and azobisdimethylvaleronitrile, benzene peroxide, etc. Peroxide-based polymerization initiators such as formyl, lauryl peroxide, di-tert-butyl peroxide, cumene hydroperoxide, etc.

利用上述聚合法獲得之含有羥基之丙烯酸系樹脂(α),通常係以溶液之狀態獲得。上述含有羥基之丙烯酸系樹脂(α)溶液之於25℃之黏度,宜為5~50,000mPa・s,尤宜為10~20,000mPa・s。該黏度若在上述範圍外,會有使含有羥基之丙烯酸系樹脂(α)與乙烯性不飽和基羧酸化合物(β)或(甲基)丙烯酸酐(γ)進行反應時發生反應延遲、將獲得之含有乙烯性不飽和基之丙烯酸系樹脂使用作為黏著劑時塗佈性降低之傾向。又,黏度之測定法係利用E型黏度計。The hydroxyl-containing acrylic resin (α) obtained by the above-mentioned polymerization method is usually obtained in the state of a solution. The viscosity at 25°C of the above hydroxyl-containing acrylic resin (α) solution is preferably 5-50,000 mPa・s, more preferably 10-20,000 mPa・s. If the viscosity is out of the above range, the reaction will be delayed when the hydroxyl-containing acrylic resin (α) is reacted with the ethylenically unsaturated carboxylic acid compound (β) or (meth)acrylic anhydride (γ). When the obtained ethylenically unsaturated group-containing acrylic resin is used as an adhesive, the applicability tends to decrease. In addition, the measuring method of the viscosity uses an E-type viscometer.

上述含有羥基之丙烯酸系樹脂(α)之重量平均分子量,通常為10萬~200萬,宜為15萬~150萬,尤宜為20萬~120萬,又更宜為30萬~100萬。重量平均分子量若過小,則有對於被加工構件之汙染性變高之傾向,若過大則有塗佈性容易降低,或成本方面變不利之傾向。The weight average molecular weight of the hydroxyl group-containing acrylic resin (α) is usually 100,000 to 2 million, preferably 150,000 to 1.5 million, particularly preferably 200,000 to 1.2 million, and more preferably 300,000 to 1 million. If the weight average molecular weight is too small, the staining property on the workpiece tends to increase, and if it is too large, the coating property tends to decrease or become disadvantageous in terms of cost.

此外,含有羥基之丙烯酸系樹脂(α)之分散度(重量平均分子量/數量平均分子量)宜為20以下,尤宜為10以下,更宜為7以下,又更宜為5以下。該分散度若過高則有對於被加工構件之汙染性增高之傾向。又,分散度之下限,考量製造限制的觀點,通常宜為1.1。In addition, the degree of dispersion (weight average molecular weight/number average molecular weight) of the hydroxyl group-containing acrylic resin (α) is preferably 20 or less, more preferably 10 or less, more preferably 7 or less, still more preferably 5 or less. If the degree of dispersion is too high, there is a tendency for the contamination of the workpiece to be processed to increase. In addition, the lower limit of the degree of dispersion is usually preferably 1.1 in consideration of production constraints.

上述重量平均分子量,係利用標準聚苯乙烯分子量換算所得到的重量平均分子量,藉由於高速液相層析(日本Waters公司製,「Waters 2695(本體)」與 「Waters 2414(檢測器)」),將3根管柱:Shodex GPC KF-806L(排除極限分子量:2×107 、分離範圍:100~2×107 、理論板數:10,000層板/根、充填劑材質:苯乙烯-二乙烯基苯共聚物、充填劑粒徑:10μm)串聯使用來測定,數量平均分子量亦可使用相同的方法獲得。The above-mentioned weight average molecular weight is the weight average molecular weight obtained by converting the standard polystyrene molecular weight through high-speed liquid chromatography (manufactured by Japan Waters Corporation, "Waters 2695 (body)" and "Waters 2414 (detector)") , 3 columns: Shodex GPC KF-806L (exclusion limit molecular weight: 2×10 7 , separation range: 100~2×10 7 , number of theoretical plates: 10,000 laminates/root, filler material: styrene-two Vinylbenzene copolymer, filler particle size: 10 μm) are used in series to measure, and the number average molecular weight can also be obtained using the same method.

又,含有羥基之丙烯酸系樹脂(α)之玻璃轉移溫度(Tg),通常為40℃以下,宜為-70~20℃,尤宜為-65~0℃、更宜為-60~-10℃。玻璃轉移溫度若過高則有黏著降低之傾向,若過低則有對於被加工構件之汙染性增高之傾向。In addition, the glass transition temperature (Tg) of the hydroxyl-containing acrylic resin (α) is usually below 40°C, preferably -70 to 20°C, particularly preferably -65 to 0°C, and more preferably -60 to -10°C. ℃. If the glass transition temperature is too high, the adhesion tends to decrease, and if it is too low, the contamination to the processed components tends to increase.

又,上述玻璃轉移溫度(Tg)係將構成含有羥基之丙烯酸系樹脂(α)之各自的單體作為同元聚合物時之玻璃轉移溫度及重量分率,代入下列Fox之公式算出之值。The above-mentioned glass transition temperature (Tg) is a value calculated by substituting the glass transition temperature and weight fraction of the respective monomers constituting the hydroxyl group-containing acrylic resin (α) as homopolymers by substituting the following Fox's formula.

[數1]

Figure 02_image008
Tg:含有羥基之丙烯酸系樹脂(α)之玻璃轉移溫度(K) Tga:單體A之同元聚合物之玻璃轉移溫度(K) Wa:單體A之重量分率 Tgb:單體B之同元聚合物之玻璃轉移溫度(K) Wb:單體B之重量分率 Tgn:單體N之同元聚合物之玻璃轉移溫度(K) Wn:單體N之重量分率 (Wa+Wb+…+Wn=1)[number 1]
Figure 02_image008
Tg: glass transition temperature (K) of acrylic resin (α) containing hydroxyl group Tga: glass transition temperature (K) of homopolymer of monomer A Wa: weight fraction of monomer A Tgb: weight fraction of monomer B Glass transition temperature (K) of homopolymer Wb: weight fraction of monomer B Tgn: glass transition temperature (K) of homopolymer of monomer N Wn: weight fraction of monomer N (Wa+Wb+ …+Wn=1)

此處,將構成含有羥基之丙烯酸系樹脂(α)之單體製成同元聚合物時之玻璃轉移溫度,通常係利用差示掃描熱量計(DSC)進行測定,可依據JIS K 7121-1987、JIS K 6240之方法進行測定。Here, the glass transition temperature when the monomer constituting the hydroxyl-containing acrylic resin (α) is made into a homopolymer is usually measured by a differential scanning calorimeter (DSC), which can be based on JIS K 7121-1987 , JIS K 6240 method for determination.

又,含有羥基之丙烯酸系樹脂(α)之酸價宜為10mgKOH/g以下,尤宜為5mgKOH/g以下,更宜為2mgKOH/g以下,又更宜為1mgKOH/g以下。若超出上述範圍,有製造中發生凝膠化之傾向。Also, the acid value of the hydroxyl-containing acrylic resin (α) is preferably not more than 10 mgKOH/g, more preferably not more than 5 mgKOH/g, more preferably not more than 2 mgKOH/g, and more preferably not more than 1 mgKOH/g. If it exceeds the above range, gelation tends to occur during production.

上述含有羥基之丙烯酸系樹脂(α)之酸價可以下列方式求得。 亦即,取樣Yg之固體成分Z重量%之含有羥基之丙烯酸系樹脂(α)於燒杯,並溶解於甲苯:甲醇=7:3(重量比)之混合溶劑中。溶解後,加入適量酚酞,邊用攪拌子攪拌,邊以氫氧化鉀(KOH)溶液進行滴定,以溶液成為淡粉色時之KOH溶液量XmL設作終點,依據下式1計算酸價。又,通常係使用0.1mol/L之KOH溶液,在含有羥基之丙烯酸系樹脂(α)之酸價低之情況下,為了提升精度亦可使用0.01mol/L之KOH溶液。 [式1] 酸價(mgKOH/g)=X×(f×M×56.11)/(Y×Z/100) ・f:KOH溶液之因子 ・M:KOH溶液之莫耳濃度(mol/L) ・X:KOH溶液量(mL) ・Y:含有羥基之丙烯酸系樹脂之取樣量(g) ・Z:含有羥基之丙烯酸系樹脂之固體成分(重量%)The acid value of the above-mentioned hydroxyl group-containing acrylic resin (α) can be obtained in the following manner. That is, the hydroxyl-containing acrylic resin (α) of the solid content Z weight % of Yg was sampled in a beaker, and dissolved in a mixed solvent of toluene:methanol=7:3 (weight ratio). After dissolving, add an appropriate amount of phenolphthalein, stir with a stirrer, and titrate with potassium hydroxide (KOH) solution. The amount of KOH solution X mL when the solution becomes light pink is used as the end point, and the acid value is calculated according to the following formula 1. In addition, 0.1mol/L KOH solution is usually used. In the case of acrylic resin (α) containing hydroxyl groups with low acid value, 0.01mol/L KOH solution can also be used in order to improve the accuracy. [Formula 1] Acid value (mgKOH/g)=X×(f×M×56.11)/(Y×Z/100) ・f: factor of KOH solution ・M: Molar concentration of KOH solution (mol/L) ・X: Amount of KOH solution (mL) ・Y: Sampling amount of acrylic resin containing hydroxyl group (g) ・Z: Solid content of hydroxyl-containing acrylic resin (% by weight)

[含有乙烯性不飽和基之羧酸(β)] 本發明中,與上述含有羥基之丙烯酸系樹脂(α)一同使用之含有乙烯性不飽和基之羧酸(β),可表示為「R5 -COOH」,R5 係具有乙烯性不飽和基之取代基。就含有乙烯性不飽和基之羧酸(β)而言,具體而言可舉例如(甲基)丙烯酸、(甲基)丙烯酸β-羧基乙酯、(甲基)丙烯酸二聚體、巴豆酸、馬來酸、馬來酸酐、反丁烯二酸、檸康酸、戊烯二酸、亞甲基丁二酸、丙烯醯胺N-乙醇酸、桂皮酸等。其中考量反應性之觀點宜為(甲基)丙烯酸、(甲基)丙烯酸β-羧基乙酯。這些可單獨使用亦可併用2種以上。[Ethylenically unsaturated group-containing carboxylic acid (β)] In the present invention, the ethylenically unsaturated group-containing carboxylic acid (β) used together with the above-mentioned hydroxyl-containing acrylic resin (α) can be expressed as "R 5 -COOH", R 5 is a substituent having an ethylenically unsaturated group. Specific examples of ethylenically unsaturated group-containing carboxylic acid (β) include (meth)acrylic acid, β-carboxyethyl (meth)acrylate, (meth)acrylic acid dimer, crotonic acid , maleic acid, maleic anhydride, fumaric acid, citraconic acid, glutaconic acid, methylene succinic acid, acrylamide N-glycolic acid, cinnamic acid, etc. Among them, (meth)acrylic acid and β-carboxyethyl (meth)acrylate are preferable from the viewpoint of reactivity. These may be used individually or in combination of 2 or more types.

[化合物(I)] 本發明中,就與前述含有羥基之丙烯酸系樹脂(α)、上述含有乙烯性不飽和基之羧酸(β)一同使用之化合物(I)而言,可使用下列通式(2)表示之化合物。又,下列通式(2)表示之化合物(I),依據反應會生成含有來自該化合物之成分之中間體,但最終獲得之含有乙烯性不飽和基之丙烯酸系樹脂中,不含來自化合物(I)由來之成分。[Compound (I)] In the present invention, as the compound (I) used together with the aforementioned hydroxyl group-containing acrylic resin (α) and the aforementioned ethylenically unsaturated group-containing carboxylic acid (β), compounds represented by the following general formula (2) can be used: compound. Also, the compound (I) represented by the following general formula (2) will generate an intermediate containing components derived from the compound according to the reaction, but the finally obtained acrylic resin containing ethylenically unsaturated groups does not contain compounds derived from the compound ( I) The ingredients of origin.

[化5]

Figure 02_image004
此處,R3 及R4 係表示碳數1~20之烴基。[chemical 5]
Figure 02_image004
Here, R 3 and R 4 represent a hydrocarbon group having 1 to 20 carbon atoms.

上述通式(2)表示之化合物中,R3 及R4 各自表示烴基。又,上述烴基之碳數,考量取得容易性之觀點為1~20,宜為2~10,尤宜為3~7。In the compound represented by the above general formula (2), R 3 and R 4 each represent a hydrocarbon group. In addition, the carbon number of the above-mentioned hydrocarbon group is 1-20, preferably 2-10, particularly preferably 3-7, in view of the ease of acquisition.

上述通式(2)中,R3 及R4 只要係烴基,該種類及結構並無限定。就上述烴基而言,具體而言可舉例如烷基、烯基、炔基等。該等亦可為直鏈、分支、環狀之中任一種結構。又,就上述烴基而言,亦可列舉芳基。此外,這些烴基亦可於其結構中含有醚鍵,或亦可R3 與R4 鍵結形成環狀結構。In the above-mentioned general formula (2), R 3 and R 4 are not limited in type and structure as long as they are hydrocarbon groups. Specific examples of the above-mentioned hydrocarbon groups include alkyl groups, alkenyl groups, and alkynyl groups. These may also be any of linear, branched, and cyclic structures. Moreover, an aryl group is also mentioned as said hydrocarbon group. In addition, these hydrocarbon groups may also contain ether bonds in their structures, or R3 and R4 may be bonded to form a ring structure.

就上述通式(2)表示之化合物(I)而言,具體而言可舉例如二碳酸二烯丙酯、二碳酸二第三丁酯、二碳酸二第三戊酯、二碳酸二苄酯等。其中,由於可效率良好地製造含有乙烯性不飽和基之丙烯酸系樹脂,R3 及R4 宜為第三丁基之二碳酸二第三丁酯。For the compound (I) represented by the above-mentioned general formula (2), specific examples include diallyl dicarbonate, di-tertiary butyl dicarbonate, di-tertiary pentyl dicarbonate, and dibenzyl dicarbonate. Wait. Among them, since the acrylic resin containing ethylenically unsaturated groups can be produced efficiently, R3 and R4 are preferably di - tert-butyl dicarbonate of tert-butyl group.

就上述通式(2)表示之化合物(I)而言,可使用市售品,亦可使用利用公知的方法等製造而獲得者。又,化合物(I)可單獨使用,亦可併用2種以上。As the compound (I) represented by the above-mentioned general formula (2), a commercial item may be used, or a compound obtained by a known method or the like may be used. Moreover, compound (I) may be used individually, and may use 2 or more types together.

[(甲基)丙烯酸酐(γ)] 本發明中使用的(甲基)丙烯酸酐(γ),係下列通式(3)表示之化合物。[(Meth)acrylic anhydride (γ)] The (meth)acrylic anhydride (γ) used in the present invention is a compound represented by the following general formula (3).

[化6]

Figure 02_image010
R6 係氫或甲基。[chemical 6]
Figure 02_image010
R 6 is hydrogen or methyl.

[含有乙烯性不飽和基之丙烯酸系樹脂之製造方法] 本發明中使用的含有乙烯性不飽和基之丙烯酸系樹脂可利用下列方法製造: (i)使含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)於前述通式(2)表示之化合物(I)之存在下進行反應之方法; (ii)使含有羥基之丙烯酸系樹脂(α)與(甲基)丙烯酸酐(γ)進行酯化反應之方法。 其中,考量反應效率之觀點宜為上述(i)之製造方法。[Manufacturing method of acrylic resin containing ethylenically unsaturated group] The acrylic resins containing ethylenically unsaturated groups used in the present invention can be produced by the following methods: (i) A method of reacting a hydroxyl-containing acrylic resin (α) with an ethylenically unsaturated group-containing carboxylic acid (β) in the presence of the compound (I) represented by the aforementioned general formula (2); (ii) A method of esterifying a hydroxyl group-containing acrylic resin (α) and (meth)acrylic anhydride (γ). Among them, the viewpoint of considering the reaction efficiency is preferably the production method of (i) above.

又,上述各製造方法中,考量反應效率之觀點,宜於後述觸媒之存在下進行反應。 此處,所謂「觸媒之存在下」,只要觸媒在反應過程之至少一部份階段存在即可,不需要在反應過程之所有階段常時存在。上述各製造方法中,只要於反應系內加入觸媒,即滿足「觸媒之存在下」之要件。例如,將觸媒添加於反應系內後,即使反應過程中觸媒產生任何變化,亦滿足「觸媒之存在下」之要件。In addition, in each of the above-mentioned production methods, it is preferable to carry out the reaction in the presence of a catalyst described later from the viewpoint of reaction efficiency. Here, the so-called "in the presence of a catalyst" is sufficient as long as the catalyst exists in at least a part of the reaction process, and does not need to always exist in all the stages of the reaction process. In each of the above production methods, as long as a catalyst is added to the reaction system, the requirement of "the presence of a catalyst" is satisfied. For example, after the catalyst is added to the reaction system, even if there is any change in the catalyst during the reaction process, the requirement of "the presence of the catalyst" is satisfied.

使用於上述(i)及(ii)之各反應中之反應容器之形態並無特別限定。又,使用於反應之原料[上述(i)之情況係含有羥基之丙烯酸系樹脂(α)、含有乙烯性不飽和基之羧酸(β)及化合物(I),上述(ii)之情況係含有羥基之丙烯酸系樹脂(α)及(甲基)丙烯酸酐(γ)]、針對將觸媒等導入反應容器之方法亦無特別限定,例如可列舉將全部的原料及觸媒等一次導入至反應容器之方法、將一部份或全部的原料及觸媒等階段性地導入反應容器之方法、將一部份或全部的原料及觸媒等連續地導入反應容器之方法等。又,亦可組合這些方法。 以下針對各製造方法進行詳述。The form of the reaction container used for each reaction of said (i) and (ii) is not specifically limited. Also, the raw materials used in the reaction [the case of the above (i) is the acrylic resin (α) containing a hydroxyl group, the carboxylic acid (β) and the compound (I) containing an ethylenically unsaturated group, and the case of the above (ii) is Hydroxyl-containing acrylic resin (α) and (meth)acrylic anhydride (γ)], the method of introducing the catalyst, etc. into the reaction container is not particularly limited, for example, all the raw materials, catalyst, etc. are introduced into the reactor at once. The method of the reaction vessel, the method of introducing part or all of the raw materials and catalysts into the reaction vessel step by step, the method of continuously introducing part or all of the raw materials and catalysts into the reaction vessel, etc. Also, these methods may be combined. Each manufacturing method will be described in detail below.

[(i)之製造方法] 上述(i)之製造方法中之反應條件並無特別限定,亦可在反應過程中適當變更反應條件。[Manufacturing method of (i)] The reaction conditions in the production method of (i) above are not particularly limited, and the reaction conditions may be appropriately changed during the reaction.

上述(i)之製造方法中之含有乙烯性不飽和基之羧酸(β)之使用量,相對於含有羥基之丙烯酸系樹脂(α)中之合計100mol%之含有羥基之單體(a1),含有乙烯性不飽和基之羧酸(β)通常為10~100mol%,宜為15~95mol%,尤宜為20~90mol%。含有乙烯性不飽和基之羧酸(β)之使用量若過少,則有含有乙烯性不飽和基之丙烯酸系樹脂之產率變低之傾向,含有乙烯性不飽和基之羧酸(β)之使用量若過多,則有反應後之後處理步驟中之負載變高之傾向,不符經濟效益。The amount of the ethylenically unsaturated group-containing carboxylic acid (β) used in the production method of the above (i) is based on a total of 100 mol% of the hydroxyl-containing monomer (a1) in the hydroxyl-containing acrylic resin (α) , the ethylenically unsaturated group-containing carboxylic acid (β) is usually 10-100 mol%, preferably 15-95 mol%, especially preferably 20-90 mol%. If the amount of ethylenically unsaturated group-containing carboxylic acid (β) used is too small, the yield of ethylenically unsaturated group-containing acrylic resin tends to decrease, and ethylenically unsaturated group-containing carboxylic acid (β) If the amount used is too much, the load in the treatment steps after the reaction tends to increase, which is not economical.

又,上述含有乙烯性不飽和基之羧酸(β)之使用量,相對於100mol%之化合物(I),含有乙烯性不飽和基之羧酸(β)通常為10~1000mol%,宜為20~500mol%、尤宜為50~200mol%。含有乙烯性不飽和基之羧酸(β)之使用量若過少,則有含有乙烯性不飽和基之丙烯酸系樹脂之產率變低之傾向,含有乙烯性不飽和基之羧酸(β)之使用量若過多,則有反應後之後處理步驟中負荷變高之傾向,不符經濟效益。Also, the amount of the above-mentioned ethylenically unsaturated group-containing carboxylic acid (β) used is generally 10 to 1000 mol% relative to 100mol% of the compound (I), preferably 10 to 1000mol%. 20-500mol%, especially preferably 50-200mol%. If the amount of ethylenically unsaturated group-containing carboxylic acid (β) used is too small, the yield of ethylenically unsaturated group-containing acrylic resin tends to decrease, and ethylenically unsaturated group-containing carboxylic acid (β) If the amount used is too much, the load tends to increase in the subsequent treatment steps after the reaction, which is not in line with economic benefits.

反應溫度並無特別限定,(i)之製造方法可於比較低溫進行反應。就反應溫度而言,通常為0~180℃,宜為20~100℃,尤宜為40~70℃。反應溫度若過低則有反應效率降低之傾向,反應溫度若過高則有副產物變多之傾向,或有含有乙烯性不飽和基之丙烯酸系樹脂發生著色之傾向。The reaction temperature is not particularly limited, and the production method of (i) can perform the reaction at a relatively low temperature. The reaction temperature is usually 0 to 180°C, preferably 20 to 100°C, particularly preferably 40 to 70°C. If the reaction temperature is too low, the reaction efficiency tends to decrease, and if the reaction temperature is too high, the by-products tend to increase, or the acrylic resin containing ethylenically unsaturated groups tends to be colored.

又,反應時間亦無特別限定,通常為0.5~72小時,宜為2~48小時。反應時間若過短,則有反應變得無法充分進行之傾向,反應時間若過長,則有觀察不到產率改善之傾向,不符經濟效益。Also, the reaction time is not particularly limited, and is usually 0.5 to 72 hours, preferably 2 to 48 hours. If the reaction time is too short, the reaction tends not to proceed sufficiently, and if the reaction time is too long, the improvement in yield tends not to be observed, which is not economical.

此外,(i)之製造方法中,反應時之環境氣體及壓力亦無特別限定。In addition, in the production method of (i), the ambient gas and pressure during the reaction are not particularly limited.

又,(i)之製造方法中,使含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)於化合物(I)之存在下進行反應時,宜含有1種以上之鎂化合物及1種以上之鹼金屬化合物作為觸媒。若於上述觸媒之存在下進行反應,能以更高產率獲得含有乙烯性不飽和基之丙烯酸系樹脂。In addition, in the production method of (i), when reacting the hydroxyl-containing acrylic resin (α) and the ethylenically unsaturated group-containing carboxylic acid (β) in the presence of the compound (I), it is preferable to contain at least one Magnesium compound and more than one alkali metal compound are used as catalysts. If the reaction is carried out in the presence of the above-mentioned catalyst, the acrylic resin containing ethylenically unsaturated groups can be obtained with a higher yield.

[鎂化合物] 就鎂化合物而言,可舉例如鎂之:氧化物、氫氧化物鹽、碳酸鹽、碳酸氫鹽、矽酸鹽、硫酸鹽、硫酸銨鹽、硝酸鹽、磷酸鹽、磷酸氫鹽、磷酸銨鹽、硼酸鹽、鹵酸鹽、過氧鹵酸鹽、鹵化氫酸鹽等與無機酸之鹽;羧酸鹽、過氧羧酸鹽、磺酸鹽等與有機酸之鹽;乙醯丙酮鹽、六氟乙醯丙酮鹽、卟啉鹽、酞花青鹽、環戊二烯鹽等錯鹽等。這些鎂鹽可為水合物及酐之任一者。其中更宜為鎂之:氧化物、氫氧化物鹽、碳酸鹽、硫酸鹽、硫酸銨鹽、硝酸鹽、鹵化氫酸鹽、羧酸鹽、及錯鹽。[magnesium compound] As far as magnesium compounds are concerned, examples of magnesium are: oxides, hydroxide salts, carbonates, bicarbonates, silicates, sulfates, ammonium sulfates, nitrates, phosphates, hydrogen phosphates, ammonium phosphates Salts of salts, borates, halides, peroxohalides, hydrogen halides, etc., and inorganic acids; salts of carboxylates, peroxycarboxylates, sulfonates, etc., and organic acids; , hexafluoroacetylacetonate, porphyrin salt, phthalocyanine salt, cyclopentadiene salt, etc. These magnesium salts may be either hydrates or anhydrides. Among them, those of magnesium are more preferable: oxides, hydroxide salts, carbonates, sulfates, ammonium sulfates, nitrates, hydrogen halides, carboxylates, and zirconium salts.

就上述鎂化合物而言,更詳細而言,可舉例如氧化鎂、氫氧化鎂、碳酸氫氧化鎂(別名:鹼性碳酸鎂)、硫酸鎂、硫酸銨鎂、硝酸鎂、氯化鎂、溴化鎂、乙酸鎂、苯甲酸鎂、(甲基)丙烯酸酸鎂、乙醯丙酮鎂。其中宜為氫氧化鎂。The above-mentioned magnesium compounds include, in more detail, magnesium oxide, magnesium hydroxide, magnesium bicarbonate (alias: basic magnesium carbonate), magnesium sulfate, magnesium ammonium sulfate, magnesium nitrate, magnesium chloride, and magnesium bromide. , Magnesium acetate, Magnesium benzoate, Magnesium (meth)acrylate, Magnesium acetylacetonate. Among them, magnesium hydroxide is preferred.

這些鎂化合物,可使用市售者,亦可使用利用公知之方法等製造而得者。又,鎂化合物可單獨使用亦可併用2種以上。As these magnesium compounds, commercially available ones may be used, and those produced by known methods or the like may be used. Moreover, a magnesium compound may be used individually or in combination of 2 or more types.

上述鎂化合物之使用量,只要可製造含有乙烯性不飽和基之丙烯酸系樹脂,並無特別限定,相對於含有乙烯性不飽和基之羧酸(β)通常為0.001~1000mol%,宜為0.005~500mol%,尤宜為0.01~250mol%。鎂化合物之使用量若過少,則有難以獲得使含有乙烯性不飽和基之丙烯酸系樹脂之產率更加提升之效果之傾向,鎂化合物之使用量若過多,亦有產率無法更加改善之傾向,不符經濟效益。The amount of the magnesium compound used is not particularly limited as long as it can produce an ethylenically unsaturated group-containing acrylic resin, but it is usually 0.001 to 1000 mol% relative to the ethylenically unsaturated group-containing carboxylic acid (β), preferably 0.005% by mole. ~500mol%, especially preferably 0.01~250mol%. If the amount of the magnesium compound used is too small, it tends to be difficult to obtain the effect of further improving the yield of the acrylic resin containing an ethylenically unsaturated group. If the amount of the magnesium compound used is too large, the yield tends not to be further improved. , not in line with economic benefits.

[鹼金屬化合物] 就上述鹼金屬化合物而言,可舉例如鹼金屬之:氫化鹽、氧化物、氫氧化物鹽、碳酸鹽、碳酸氫鹽、硫酸鹽、硝酸鹽、磷酸鹽、硼酸鹽、鹵酸鹽、過氧鹵酸鹽、鹵化氫酸鹽、硫氰酸酸鹽等與無機酸之鹽;烷氧化物鹽、羧酸鹽、磺酸鹽等與有機酸之鹽;醯胺鹽、磺胺鹽等與有機鹽基之鹽;乙醯丙酮鹽、六氟乙醯丙酮鹽、卟啉鹽、酞花青鹽、環戊二烯鹽等錯鹽等。這些鹼金屬鹽可為水合物及酐之任一者。其中更宜為鹼金屬之:氧化物、氫氧化物鹽、碳酸鹽、碳酸氫鹽、鹵化氫酸鹽、羧酸鹽、醯胺鹽、及錯鹽。[alkali metal compound] As far as the above-mentioned alkali metal compounds are concerned, examples of alkali metals include: hydride salts, oxides, hydroxide salts, carbonates, bicarbonates, sulfates, nitrates, phosphates, borates, halides, peroxides, etc. Salts of oxyhalides, hydrogen halides, thiocyanates, etc. and inorganic acids; salts of alkoxides, carboxylates, sulfonates, etc., and organic acids; Base salts; acetylacetonate, hexafluoroacetylacetonate, porphyrin salts, phthalocyanine salts, cyclopentadiene salts, etc. These alkali metal salts may be either hydrates or anhydrides. Among them, alkali metals are more preferable: oxides, hydroxide salts, carbonates, bicarbonates, hydrogen halides, carboxylates, amide salts, and zirconium salts.

又,就構成上述鹼金屬化合物之鹼金屬而言,例如宜為鋰、鈉、鉀、銣、銫,考量觸媒活性高、能以高產率獲得含有乙烯性不飽和基之丙烯酸系樹脂之觀點,更宜為鋰。In addition, the alkali metal constituting the above-mentioned alkali metal compound is preferably lithium, sodium, potassium, rubidium, or cesium, in view of high catalytic activity and the ability to obtain an ethylenically unsaturated group-containing acrylic resin with a high yield. , more preferably lithium.

就上述鋰化合物而言,具體而言,可舉例如氧化鋰、氫氧化鋰、碳酸鋰、氟化鋰、氯化鋰、溴化鋰、乙酸鋰、苯甲酸鋰、(甲基)丙烯酸酸鋰、醯胺化鋰、雙(三氟甲基磺醯)亞胺化鋰、乙醯丙酮鋰等。其中宜為氫氧化鋰。As for the above-mentioned lithium compound, specifically, lithium oxide, lithium hydroxide, lithium carbonate, lithium fluoride, lithium chloride, lithium bromide, lithium acetate, lithium benzoate, lithium (meth)acrylate, acyl Lithium amide, lithium bis(trifluoromethylsulfonyl)imide, lithium acetylacetonate, and the like. Among them, lithium hydroxide is preferable.

上述鹼金屬化合物可使用市售者,亦可使用利用公知之方法等製造而得者。又,鹼金屬化合物可單獨使用,亦可併用2種以上。As the above-mentioned alkali metal compound, a commercially available one may be used, or one produced by a known method or the like may be used. Moreover, an alkali metal compound may be used individually, and may use 2 or more types together.

鹼金屬化合物之使用量,只要可製造含有乙烯性不飽和基之丙烯酸系樹脂,並無特別限定,相對於含有乙烯性不飽和基之羧酸(β),通常為0.001~1000mol%,宜為0.005~500mol%,尤宜為0.01~250mol%。鹼金屬化合物之使用量若過少,則有難以獲得使含有乙烯性不飽和基之丙烯酸系樹脂之產率更加提升之效果之傾向,鹼金屬化合物之使用量若過多,亦有產率無法更加改善之傾向,不符經濟效益。The amount of the alkali metal compound used is not particularly limited as long as the acrylic resin containing an ethylenically unsaturated group can be produced, but it is usually 0.001 to 1000 mol% relative to the carboxylic acid (β) containing an ethylenically unsaturated group. 0.005-500mol%, especially preferably 0.01-250mol%. If the amount of alkali metal compound used is too small, it tends to be difficult to obtain the effect of further improving the yield of acrylic resins containing ethylenically unsaturated groups. If the amount of alkali metal compound used is too large, the yield cannot be further improved. The tendency is not in line with economic benefits.

[其他任意成分] 此外,(i)之製造方法中,亦可使用溶劑作為其他任意成分。就上述溶劑而言,可使用與於前述含有羥基之丙烯酸系樹脂(α)之製造中列舉之有機溶劑相同者。溶劑可單獨使用1種,亦可為2種以上之混合溶劑。溶劑之使用量亦無特別限定,可適當選擇。針對將溶劑導入反應容器之方法並無特別限定,可將全部的溶劑於一次一同導入、亦可將一部份或全部的溶劑階段性地導入,亦可將一部份或全部的溶劑連續地導入。又,亦可為將這些方法組合之導入方法。[other optional ingredients] In addition, in the production method of (i), a solvent may be used as another optional component. As the solvent, the same ones as the organic solvents mentioned above for the production of the hydroxyl group-containing acrylic resin (α) can be used. The solvent may be used alone or as a mixed solvent of two or more. The usage-amount of a solvent is also not specifically limited, It can select suitably. There is no special limitation on the method of introducing the solvent into the reaction vessel. All the solvents can be introduced together at one time, a part or all of the solvents can be introduced in stages, or a part or all of the solvents can be introduced continuously import. In addition, an introduction method combining these methods may be used.

[(ii)之製造方法] 前述(ii)之製造方法中之酯化反應之條件並無特別限定,亦可適當變更反應過程中之反應條件。[Manufacturing method of (ii)] The conditions of the esterification reaction in the production method of (ii) above are not particularly limited, and the reaction conditions during the reaction process can also be appropriately changed.

上述含有羥基之丙烯酸系樹脂(α)與(甲基)丙烯酸酐(γ)之使用量,相對於100mol%之含有羥基之丙烯酸系樹脂(α)中之含有羥基之單體(a1),(甲基)丙烯酸酐(γ)通常為10~100mol%,宜為15~95mol%,尤宜為20~90mol%。The amount of the above-mentioned hydroxyl-containing acrylic resin (α) and (meth)acrylic anhydride (γ) used is relative to 100 mol% of the hydroxyl-containing monomer (a1) in the hydroxyl-containing acrylic resin (α), ( Meth)acrylic anhydride (γ) is usually 10 to 100 mol%, preferably 15 to 95 mol%, particularly preferably 20 to 90 mol%.

上述酯化反應之反應溫度通常為20~90℃,宜為30~80℃,反應時間通常為2~40小時,宜為5~30小時。 此外,(ii)之製造方法中,反應時之環境氣體、及壓力亦無特別限定。The reaction temperature of the above-mentioned esterification reaction is usually 20-90°C, preferably 30-80°C, and the reaction time is usually 2-40 hours, preferably 5-30 hours. In addition, in the production method of (ii), the ambient gas and pressure during the reaction are not particularly limited.

[鎂化合物] 又,(ii)之製造方法中,使含有羥基之丙烯酸系樹脂與(甲基)丙烯酸酐進行酯化反應時,宜使用鎂化合物作為觸媒。就上述鎂化合物而言,可使用與前述(i)之製造方法中列舉之鎂化合物相同者。又,鎂化合物可單獨使用或併用2種以上。其中,宜為鎂之:與無機酸之鹽、與有機酸之鹽、錯鹽,更宜為鎂之氫氧化物、羧酸鹽、乙醯丙酮鹽,尤宜為氫氧化鎂、(甲基)丙烯酸酸鎂、乙醯丙酮鎂。[magnesium compound] In addition, in the production method of (ii), when the acrylic resin containing a hydroxyl group and (meth)acrylic anhydride are subjected to an esterification reaction, it is preferable to use a magnesium compound as a catalyst. As the above-mentioned magnesium compound, the same ones as those listed in the production method of (i) above can be used. Moreover, a magnesium compound can be used individually or in combination of 2 or more types. Among them, it is suitable for magnesium: salts with inorganic acids, salts with organic acids, zirconium salts, more preferably magnesium hydroxides, carboxylates, acetylacetonate, especially magnesium hydroxide, (methyl ) magnesium acrylate, magnesium acetylacetonate.

又,上述鎂化合物之使用量,相對於含有羥基之丙烯酸系樹脂(α)中之100mol%之含有羥基之單體(a1),通常為0.01~10mol%,宜為0.05~5mol%,尤宜為0.1~1mol%。In addition, the amount of the magnesium compound used is usually 0.01 to 10 mol%, preferably 0.05 to 5 mol%, with respect to 100 mol% of the hydroxyl group-containing monomer (a1) in the hydroxyl group-containing acrylic resin (α), preferably It is 0.1~1mol%.

[其他之任意成分] 此外,(ii)之製造方法中,亦可使用溶劑作為其他之任意成分,可使用與於前述含有羥基之丙烯酸系樹脂(α)之聚合中記載相同者作為溶劑。溶劑可單獨使用1種,亦可為2種以上之混合溶劑。又,針對溶劑之使用量、導入至反應容器內之方法,與前述(i)之製造方法相同。[Any other ingredients] In addition, in the production method of (ii), a solvent can also be used as other optional components, and the same thing as described in the polymerization of the above-mentioned hydroxyl group-containing acrylic resin (α) can be used as a solvent. The solvent may be used alone or as a mixed solvent of two or more. Also, the amount of the solvent used and the method of introducing it into the reaction container are the same as the production method of (i) above.

[含有乙烯性不飽和基之丙烯酸系樹脂] 結果,依據上述(i)或(ii)之製造方法,例如可有效率地獲得含有下列通式(1)表示之含有乙烯性不飽和基之結構部位之丙烯酸系樹脂。又,下列通式之「R1 」係含有乙烯性不飽和基之取代基。[Ethylenically unsaturated group-containing acrylic resin] As a result, according to the production method of (i) or (ii) above, for example, an ethylenically unsaturated group-containing structure represented by the following general formula (1) can be efficiently obtained Part of the acrylic resin. Also, "R 1 " in the following general formula is a substituent containing an ethylenically unsaturated group.

[化7]

Figure 02_image006
R1 係含有乙烯性不飽和基之取代基,R2 係含有選自C、O、N及S中至少一種之有機基(惟,胺甲酸酯基除外),X係O或NH。[chemical 7]
Figure 02_image006
R1 is a substituent containing an ethylenically unsaturated group, R2 is an organic group containing at least one of C, O, N and S ( except for a carbamate group), and X is O or NH.

上述含有乙烯性不飽和基之丙烯酸系樹脂,於側鏈含有預定量之特定之乙烯性不飽和基部位,因此會藉由照射活性能量射線而硬化,具有剝離性。又,上述通式(1)表示之乙烯性不飽和基結構部位,只要係丙烯酸系樹脂之側鏈末端即可,例如可於丙烯酸系樹脂之主鏈直接鍵結上述含有乙烯性不飽和基之結構部位作為側鏈,亦可於具有側鏈之丙烯酸系樹脂之側鏈末端鍵結上述含有乙烯性不飽和基之結構部位。並且,該含有含有乙烯性不飽和基之丙烯酸系樹脂之本發明之黏著劑組成物,照射活性能量射線前之黏著力及照射活性能量射線後之剝離性優異。又,上述含有乙烯性不飽和基之丙烯酸系樹脂,由於含有乙烯性不飽和基之結構部位中不具有胺甲酸酯基,因此耐熱性優異,即使於高溫加熱後,照射活性能量射線後之剝離性亦優異。The above-mentioned ethylenically unsaturated group-containing acrylic resin contains a predetermined amount of specific ethylenically unsaturated group moieties in the side chain, so it is hardened by irradiation with active energy rays and has peelability. Also, the ethylenically unsaturated group structural site represented by the above-mentioned general formula (1) may be a side chain terminal of the acrylic resin, for example, the above-mentioned ethylenically unsaturated group-containing group may be directly bonded to the main chain of the acrylic resin. The structural site may be used as a side chain, and the above-mentioned ethylenically unsaturated group-containing structural site may be bonded to the end of the side chain of the acrylic resin having a side chain. Furthermore, the adhesive composition of the present invention containing the ethylenically unsaturated group-containing acrylic resin is excellent in adhesive force before active energy ray irradiation and peelability after active energy ray irradiation. In addition, the above-mentioned acrylic resin containing an ethylenically unsaturated group has excellent heat resistance because it does not have a urethane group in a structural part containing an ethylenically unsaturated group. It is also excellent in detachability.

上述含有乙烯性不飽和基之丙烯酸系樹脂之乙烯性不飽和基導入率(酯化率),通常係含有羥基之丙烯酸系樹脂(α)中之全體含有羥基之單體(a1)中之10%以上,宜為20%以上,尤宜為30%以上。又,上限値通常為100%,將來自含有羥基之單體(a1)之羥基使用於後述與交聯劑之反應的情況下,上限値宜定為95%。又,含有乙烯性不飽和基之羧酸(β)或(甲基)丙烯酸酐(γ)之反應率之上限,通常係100%。乙烯性不飽和基導入率若過低,則有照射活性能量射線後之剝離性降低之傾向。又,乙烯性不飽和基導入率,係由13 C-NMR測定所得之酯化反應前後之含有羥基之單體(a1)之積分值比,依據下式算出。The ethylenically unsaturated group introduction rate (esterification rate) of the above-mentioned ethylenically unsaturated group-containing acrylic resin is usually 10% of all hydroxyl-containing monomers (a1) in the hydroxyl-containing acrylic resin (α). % or more, preferably more than 20%, especially more than 30%. In addition, the upper limit value is usually 100%, and when the hydroxyl group derived from the hydroxyl group-containing monomer (a1) is used for the reaction with a crosslinking agent described later, the upper limit value is preferably 95%. Also, the upper limit of the reaction rate of ethylenically unsaturated group-containing carboxylic acid (β) or (meth)acrylic anhydride (γ) is usually 100%. When the ethylenically unsaturated group introduction ratio is too low, the peelability after active energy ray irradiation tends to decrease. In addition, the ethylenically unsaturated group introduction rate is calculated according to the following formula as the integral value ratio of the hydroxyl group-containing monomer (a1) before and after the esterification reaction obtained by 13 C-NMR measurement.

[數2]

Figure 02_image013
OH(α):含有羥基之丙烯酸系樹脂(α)中之來自含有羥基之單體(a1)之積分值 OH(A):含有乙烯性不飽和基之丙烯酸系樹脂中之來自含有羥基之單體(a1)之積分值[number 2]
Figure 02_image013
OH(α): Integral value derived from hydroxyl-containing monomer (a1) in hydroxyl-containing acrylic resin (α) OH(A): Integral value derived from hydroxyl-containing monomer (a1) in ethylenically unsaturated group-containing acrylic resin Integral value of body (a1)

上述含有乙烯性不飽和基之丙烯酸系樹脂,乙烯性不飽和基之含量相對於含有乙烯性不飽和基之丙烯酸系樹脂為25~500mmol/100g。宜為30~450mmol/100g,更宜為40~400mmol/100g,尤宜為50~300mmol/100g。乙烯性不飽和基之含量若過少,則照射活性能量射線之剝離性降低,乙烯性不飽和基之含量若過多,則剝離後之對於被加工構件之耐汙染性降低。In the above-mentioned ethylenically unsaturated group-containing acrylic resin, the content of the ethylenically unsaturated group is 25 to 500 mmol/100 g relative to the ethylenically unsaturated group-containing acrylic resin. It is preferably 30-450mmol/100g, more preferably 40-400mmol/100g, especially 50-300mmol/100g. If the content of the ethylenically unsaturated group is too small, the peelability of the active energy ray irradiation will decrease, and if the content of the ethylenically unsaturated group is too high, the stain resistance to the workpiece after peeling will decrease.

上述含有乙烯性不飽和基之丙烯酸系樹脂之乙烯性不飽和基之含量,可依據以下計算求得。The ethylenically unsaturated group content of the above-mentioned ethylenically unsaturated group-containing acrylic resin can be obtained by the following calculation.

[數3]

Figure 02_image015
E(a):經酯化之含有羥基之單體(a1)之mol數 Mw(γ):因酯化而附加之不飽和基之分子量 又,E(a)係將含有羥基之丙烯酸系樹脂(α)之聚合成分100重量%中之含有羥基之單體(a1)之重量%與乙烯性不飽和基導入率之乘積,除以含有羥基之單體(a1)之分子量。[number 3]
Figure 02_image015
E(a): The number of moles of the esterified hydroxyl-containing monomer (a1) Mw(γ): The molecular weight of the unsaturated group added due to esterification. E(a) is an acrylic resin containing hydroxyl The product of the weight % of the hydroxyl group-containing monomer (a1) in 100 weight % of the polymerized component of (α) and the ethylenically unsaturated group introduction ratio is divided by the molecular weight of the hydroxyl group-containing monomer (a1).

又,含有乙烯性不飽和基之丙烯酸系樹脂若含有羥基,則會藉由與後述交聯劑進行反應並形成交聯結構,而改善照射活性能量射線前之黏著力,故為佳。Also, if the acrylic resin containing an ethylenically unsaturated group contains a hydroxyl group, it is preferable to form a crosslinked structure by reacting with a crosslinking agent described later to improve the adhesive force before irradiation with active energy rays.

含有乙烯性不飽和基之丙烯酸系樹脂中之羥基之含量,通常為0.01~35重量%,宜為0.01~25重量%。羥基之含量若過少,則有黏著劑之凝聚力降低並成為殘膠之原因之傾向,羥基之含量若過多,則有黏著劑之柔軟性及黏著力降低,與被加工構件之間產生翻翹之傾向。又,上述所謂含有乙烯性不飽和基之丙烯酸系樹脂含有之羥基,係指含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)或(甲基)丙烯酸酐(γ)之酯化後之來自未反應之含有羥基之單體(a1)之羥基。The content of hydroxyl groups in the ethylenically unsaturated group-containing acrylic resin is usually 0.01 to 35% by weight, preferably 0.01 to 25% by weight. If the content of hydroxyl groups is too small, the cohesive force of the adhesive will decrease and cause residual glue. If the content of hydroxyl groups is too high, the flexibility and adhesion of the adhesive will decrease, and warping will occur between the adhesive and the workpiece. tendency. Also, the above-mentioned hydroxyl group contained in the acrylic resin containing an ethylenically unsaturated group refers to the acrylic resin (α) containing a hydroxyl group and the carboxylic acid (β) containing an ethylenically unsaturated group or (meth)acrylic anhydride ( Hydroxyl groups from unreacted hydroxyl-containing monomer (a1) after esterification of γ).

又,使用上述含有乙烯性不飽和基之丙烯酸系樹脂作為黏著劑時,宜為溶液之狀態。上述含有乙烯性不飽和基之丙烯酸系樹脂溶液之於25℃之黏度,宜為5~50,000mPa・s,尤宜為10~10,000mPa・s。該黏度若在上述範圍外,將含有乙烯性不飽和基之丙烯酸系樹脂使用作為黏著劑時有塗佈性降低之傾向。又,黏度之測定法係利用E型黏度計。Moreover, when using the above-mentioned acrylic resin containing an ethylenically unsaturated group as an adhesive, it is preferably in a solution state. The viscosity at 25°C of the acrylic resin solution containing ethylenically unsaturated groups is preferably 5-50,000 mPa・s, more preferably 10-10,000 mPa・s. When the viscosity is out of the above range, the applicability tends to decrease when an ethylenically unsaturated group-containing acrylic resin is used as an adhesive. In addition, the measuring method of the viscosity uses an E-type viscometer.

[交聯劑] 本發明之黏著劑組成物中,為了改善照射活性能量射線前之黏著力,宜更含有交聯劑。如上述之交聯劑,係與含有乙烯性不飽和基之丙烯酸系樹脂中之官能基進行反應並形成交聯結構者,可舉例如異氰酸酯系交聯劑、環氧系交聯劑、氮丙啶(aziridine)系交聯劑、三聚氰胺系交聯劑、醛系交聯劑、胺系交聯劑、金屬螯合劑系交聯劑。該等之中,考量與改善被黏體之黏接性之觀點、與含有乙烯性不飽和基之丙烯酸系樹脂之反應性之觀點,宜使用異氰酸酯系交聯劑。[Crosslinking agent] In the adhesive composition of the present invention, in order to improve the adhesive force before irradiation with active energy rays, it is preferable to further contain a crosslinking agent. The above-mentioned cross-linking agent reacts with the functional group in the acrylic resin containing ethylenically unsaturated groups to form a cross-linking structure, such as isocyanate-based cross-linking agent, epoxy-based cross-linking agent, aziridine Aziridine-based crosslinking agents, melamine-based crosslinking agents, aldehyde-based crosslinking agents, amine-based crosslinking agents, and metal chelating agent-based crosslinking agents. Among these, it is preferable to use an isocyanate-based crosslinking agent from the viewpoint of improving the adhesiveness of the adherend and the viewpoint of reactivity with an ethylenically unsaturated group-containing acrylic resin.

上述異氰酸酯系交聯劑係含有至少2個以之上異氰酸酯基者,可舉例如甲伸苯基二異氰酸酯、二苯基甲烷二異氰酸酯、亞二甲苯二異氰酸酯等芳香族聚異氰酸酯;六亞甲基二異氰酸酯等脂肪族聚異氰酸酯;異佛酮二異氰酸酯、氫化二苯基甲烷二異氰酸酯等脂環族聚異氰酸酯等;及該等之縮二脲體、異氰尿酸酯體、更為與乙二醇、丙二醇、新戊二醇、三羥甲基丙烷、蓖麻油等低分子活性含氫化合物之反應物之加合體等。該等之中,考量耐藥劑性、與官能基之反應性之觀點,宜為芳香族聚異氰酸酯、芳香族聚異氰酸酯與三羥甲基丙烷之加合體,尤宜為甲伸苯基二異氰酸酯與三羥甲基丙烷之加合體。The above-mentioned isocyanate-based cross-linking agents are those containing at least 2 or more isocyanate groups, such as aromatic polyisocyanates such as toluene diisocyanate, diphenylmethane diisocyanate, and xylylene diisocyanate; hexamethylene Aliphatic polyisocyanate such as diisocyanate; Alicyclic polyisocyanate such as isophorone diisocyanate and hydrogenated diphenylmethane diisocyanate; Adducts of reactants of low-molecular active hydrogen-containing compounds such as alcohol, propylene glycol, neopentyl glycol, trimethylolpropane, castor oil, etc. Among them, in view of chemical resistance and reactivity with functional groups, aromatic polyisocyanate, aromatic polyisocyanate and trimethylolpropane adducts are preferred, and cresyl diisocyanate and trimethylolpropane are particularly preferred. Adducts of trimethylolpropane.

就上述環氧系交聯劑而言,可舉例如、1,3-雙(N,N’-二環氧丙基胺基甲基)環己烷、N,N,N’,N’-四環氧丙基-m-亞二甲苯二胺、乙二醇二環氧丙醚、1,6-己二醇二環氧丙醚、三羥甲基丙烷二環氧丙醚、二環氧丙基苯胺、二環氧丙基胺等。Examples of the epoxy-based crosslinking agent include 1,3-bis(N,N'-diecidylaminomethyl)cyclohexane, N,N,N',N'- Tetraglycidyl-m-xylylenediamine, Ethylene Glycol Diglycidyl Ether, 1,6-Hexanediol Diglycidyl Ether, Trimethylolpropane Diglycidyl Ether, Diepoxide Propylaniline, Diglycidylamine, etc.

就上述氮丙啶系交聯劑而言,可舉例如二苯基甲烷-4,4’-雙(1-氮丙啶羧基醯胺)、三羥甲基丙烷三-β-氮丙啶基丙酸酯、四羥甲基甲烷三-β-氮丙啶基丙酸酯、甲苯-2,4-雙(1-氮丙啶羧基醯胺)、三亞乙基三聚氰胺、雙異酞醯基-1-(2-甲基氮丙啶)、參-1-(2-甲基氮丙啶)膦、三羥甲基丙烷三-β-(2-甲基氮丙啶)丙酸酯等。Examples of the aforementioned aziridine-based crosslinking agent include diphenylmethane-4,4'-bis(1-aziridine carboxamide), trimethylolpropane tris-β-aziridinyl Propionate, Tetramethylolmethane Tris-β-Aziridinylpropionate, Toluene-2,4-Bis(1-Aziridinecarboxamide), Triethylenemelamine, Bisisophthaloyl- 1-(2-methylaziridine), para-1-(2-methylaziridine)phosphine, trimethylolpropane tris-β-(2-methylaziridine)propionate, etc.

就上述三聚氰胺系交聯劑而言,可舉例如三聚氰胺、三聚氰胺與甲醛進行縮合而得之含有胺基之羥甲基三聚氰胺、含有亞胺基之羥甲基三聚氰胺、六羥甲基三聚氰胺等羥甲基三聚氰胺衍生物、甲醇、丁醇等低級醇於羥甲基三聚氰胺衍生物中進行反應而部分或完全醚化、部分或完全烷基化之羥甲基三聚氰胺、含有亞胺基之部分或完全烷基化羥甲基三聚氰胺等烷基化羥甲基三聚氰胺等。The above-mentioned melamine-based crosslinking agents include melamine, amine-containing methylol melamine obtained by condensation of melamine and formaldehyde, imine-containing methylol melamine, and hexamethylol melamine. methylol melamine derivatives, methanol, butanol and other lower alcohols reacted in methylol melamine derivatives and partially or completely etherified, partially or completely alkylated methylol melamine, partially or completely alkylated methylol melamine containing imine groups Alkylated methylol melamine, etc.

就上述醛系交聯劑而言,可舉例如甲醛、乙醛、丙醛、丁醛、乙二醛、戊二醛、二醛澱粉、六亞甲四胺、1,4-二

Figure 108108546-A0304-12-02
烷-2,3-二醇、1,3-雙(羥基甲基)-2-咪唑啶、二羥甲基脲、N-羥甲基丙烯醯胺、尿素甲醛樹脂、三聚氰胺甲醛樹脂等於水溶液中游離醛之醛系化合物、或苯甲醛、2-甲基苯甲醛、4-甲基苯甲醛、對羥基苯甲醛、間羥基苯甲醛等芳香族醛系化合物。As for the above-mentioned aldehyde-based crosslinking agent, for example, formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, glyoxal, glutaraldehyde, dialdehyde starch, hexamethylenetetramine, 1,4-bis
Figure 108108546-A0304-12-02
Alkane-2,3-diol, 1,3-bis(hydroxymethyl)-2-imidazolidine, dimethylolurea, N-methylolacrylamide, urea-formaldehyde resin, melamine-formaldehyde resin in aqueous solution Aldehyde compounds of free aldehydes, or aromatic aldehyde compounds such as benzaldehyde, 2-methylbenzaldehyde, 4-methylbenzaldehyde, p-hydroxybenzaldehyde, m-hydroxybenzaldehyde.

就上述胺系交聯劑而言,可舉例如4,4’-亞甲基-雙(2-氯苯胺)、改性4,4’-亞甲基-雙(2-氯苯胺)、二乙基甲苯二胺。For the above-mentioned amine-based crosslinking agent, for example, 4,4'-methylene-bis(2-chloroaniline), modified 4,4'-methylene-bis(2-chloroaniline), di Ethyltoluenediamine.

就上述金屬螯合物系交聯劑而言,可舉例如金屬原子為鋁、鋯、鈦、鋅、鐵、錫等之螯合物,考量性能之觀點宜為鋁螯合物。就鋁螯合物而言,可舉例如二異丙氧基鋁單油酸乙醯乙酸酯、單異丙氧基鋁雙油酸乙醯乙酸酯、單異丙氧基鋁單油酸酯單乙基乙醯乙酸酯、二異丙氧基鋁單月桂酸乙醯乙酸酯、二異丙氧基鋁單硬肢酸乙醯乙酸酯、二異丙氧基鋁單異硬脂酸乙醯乙酸酯等。The above-mentioned metal chelate-based crosslinking agents include, for example, chelate compounds in which the metal atoms are aluminum, zirconium, titanium, zinc, iron, tin, etc., and aluminum chelate compounds are preferred from the viewpoint of performance. In terms of aluminum chelates, for example, diisopropoxyaluminum monooleate acetyl acetate, monoisopropoxyaluminum dioleate acetylacetate, monoisopropoxyaluminum monooleate Ester Monoethyl Acetyl Acetate, Diisopropoxy Aluminum Monolaurate Acetyl Acetate, Diisopropoxy Aluminum Monostearate Acetyl Acetate, Diisopropoxy Aluminum Monoisohard Fatty acid acetyl acetate, etc.

上述交聯劑可單獨使用亦可併用2種以上。These crosslinking agents may be used alone or in combination of two or more.

上述交聯劑之含量,相對於100重量份之含有乙烯性不飽和基之丙烯酸系樹脂,通常宜為0.1~30重量份,尤宜為0.2~20重量份,更宜為0.2~15重量份。交聯劑若過少,則有黏著劑之凝聚力降低並成為殘膠之原因之傾向,若過多則有黏著劑之柔軟性及黏著力降低,與被加工構件之間產生翻翹之傾向。The content of the above-mentioned crosslinking agent is preferably 0.1-30 parts by weight, especially 0.2-20 parts by weight, and more preferably 0.2-15 parts by weight, relative to 100 parts by weight of the acrylic resin containing ethylenically unsaturated groups. . If the cross-linking agent is too small, the cohesion of the adhesive tends to decrease and cause residual glue. If the cross-linking agent is too large, the flexibility and adhesion of the adhesive decrease, and warping tends to occur between the cross-linking agent and the workpiece.

[光聚合引發劑] 本發明之黏著劑組成物,考量改善照射活性能量射線後之剝離性之觀點,宜摻合光聚合引發劑。就上述光聚合引發劑而言,只要係會因光之作用產生自由基者即可,可舉例如二乙氧基苯乙酮、2-羥基-2-甲基-1-苯丙烷-1-酮、苄基二甲基縮酮、4-(2-羥基乙氧基)苯基-(2-羥基-2-丙基)酮、1-羥基環己基苯基酮、1-[4-(2-羥基乙氧基)-苯基]-2-羥基-2-甲基-1-丙烷-1-酮、2-甲基-2-

Figure 108108546-A0304-12-01
啉基(4-硫基甲基苯基)丙烷-1-酮、2-苯甲基-2-二甲基胺基-1-(4-
Figure 108108546-A0304-12-01
啉基苯基)丁酮、2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-
Figure 108108546-A0304-12-01
啉基)苯基]-1-丁酮、2-羥基-2-甲基-1-[4-(1-甲基乙烯基)苯基]丙酮寡聚物等苯乙酮類; 苯偶因、苯偶因甲醚、苯偶因乙醚、苯偶因異丙醚、苯偶因異丁醚等苯偶因類; 二苯甲酮、鄰苯甲醯基苯甲酸甲酯、4-苯基二苯甲酮、4-苯甲醯基-4’-甲基-二苯基硫醚、3,3’,4,4’-四(第三丁基過氧羰基)二苯甲酮、2,4,6-三甲基二苯甲酮、4-苯甲醯基-N,N-二甲基-N-[2-(1-側氧基-2-丙烯氧基)乙基]苯四甲基溴化銨、(4-苯甲醯基苯甲基)三甲基氯化銨等二苯甲酮類; 2-異丙基噻噸酮、4-異丙基噻噸酮、2,4-二乙基噻噸酮、2,4-二氯噻噸酮、1-氯-4-丙氧基噻噸酮、2-(3-二甲基胺基-2-羥基)-3,4-二甲基-9H-噻噸酮-9-酮內氯化物等噻噸酮類; 2,4,6-三甲基苯甲醯基-二苯基氧化膦、雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基-戊基氧化膦、雙(2,4,6三甲基苯甲醯基)-苯基氧化膦等醯基氧化膦類等。其中宜為苯乙酮類,尤宜為1-羥基環己基苯基酮、噻噸酮類,尤宜為2,4,6-三甲基苯甲醯基-二苯基氧化膦。 又,這些光聚合引發劑可單獨使用或可併用2種以上。[Photopolymerization Initiator] The adhesive composition of the present invention is preferably blended with a photopolymerization initiator from the viewpoint of improving peelability after irradiation with active energy rays. As far as the above-mentioned photopolymerization initiator is concerned, as long as it can generate free radicals due to the action of light, for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1- Ketone, benzyl dimethyl ketal, 4-(2-hydroxyethoxy) phenyl-(2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexyl phenyl ketone, 1-[4-( 2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 2-methyl-2-
Figure 108108546-A0304-12-01
Linyl (4-thiomethylphenyl) propan-1-one, 2-benzyl-2-dimethylamino-1-(4-
Figure 108108546-A0304-12-01
Linylphenyl) butanone, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-
Figure 108108546-A0304-12-01
Phenyl) phenyl] -1-butanone, 2-hydroxy-2-methyl-1-[4-(1-methylvinyl) phenyl] acetone oligomers and other acetophenones; benzoin , benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether and other benzoins; benzophenone, methyl o-benzoyl benzoate, 4-phenyl Benzophenone, 4-benzoyl-4'-methyl-diphenylsulfide, 3,3',4,4'-tetrakis(tert-butylperoxycarbonyl)benzophenone, 2 ,4,6-trimethylbenzophenone, 4-benzoyl-N,N-dimethyl-N-[2-(1-oxo-2-propenyloxy)ethyl]benzene Benzophenones such as tetramethylammonium bromide, (4-benzoylbenzyl)trimethylammonium chloride; 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2 ,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone, 2-(3-dimethylamino-2-hydroxyl)-3 ,4-Dimethyl-9H-thioxanthone-9-one internal chloride and other thioxanthones; 2,4,6-trimethylbenzoyl-diphenylphosphine oxide, bis(2,6 Oxidation of acyl groups such as -dimethoxybenzoyl)-2,4,4-trimethyl-pentylphosphine oxide, bis(2,4,6trimethylbenzoyl)-phenylphosphine oxide Phosphines etc. Among them, acetophenones are preferred, 1-hydroxycyclohexyl phenyl ketone and thioxanthone are especially preferred, and 2,4,6-trimethylbenzoyl-diphenylphosphine oxide is especially preferred. Moreover, these photoinitiators may be used individually or in combination of 2 or more types.

就上述光聚合引發劑之含量而言,相對於100重量份之含有乙烯性不飽和基之丙烯酸系樹脂,宜為0.1~20重量份,尤宜為0.5~15重量份,又特別宜為0.5~10重量份。 光聚合引發劑之含量若過少,則在照射活性能量射線時,有含有乙烯性不飽和基之丙烯酸系樹脂之硬化性低且照射活性能量射線後之剝離性容易降低之傾向,若過多則有對於被加工構件之汙染性增大之傾向。As far as the content of the above-mentioned photopolymerization initiator is concerned, it is preferably 0.1-20 parts by weight, especially 0.5-15 parts by weight, and especially 0.5 parts by weight relative to 100 parts by weight of the acrylic resin containing ethylenically unsaturated groups. ~10 parts by weight. If the content of the photopolymerization initiator is too small, the curability of the acrylic resin containing an ethylenically unsaturated group tends to be low when irradiated with active energy rays, and the peelability after irradiation with active energy rays tends to decrease. The tendency to increase the contamination of the processed components.

又,就這些光聚合引發劑之助劑而言,亦可併用例如三乙醇胺、三異丙醇胺、4,4’-二甲基胺基二苯甲酮(米其勒酮)、4,4’二乙基胺基二苯甲酮、2-二甲基胺基乙基苯甲酸、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸(正丁氧基)乙酯、4-二甲基胺基苯甲酸異戊酯、4-二甲基胺基苯甲酸2-乙基己酯、2,4-二乙基噻噸酮、2,4-二異丙基噻噸酮等。這些助劑可單獨使用或亦可併用2種以上。Also, as auxiliary agents for these photopolymerization initiators, for example, triethanolamine, triisopropanolamine, 4,4'-dimethylaminobenzophenone (Michelerone), 4, 4'Diethylaminobenzophenone, 2-dimethylaminoethylbenzoic acid, ethyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid (n-butoxy ) ethyl ester, isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2,4-diethylthioxanthone, 2,4-diiso Propylthioxanthone, etc. These auxiliary agents may be used alone or in combination of two or more.

[其他成分] 本發明之黏著劑組成物,在不損及本發明之效果之範圍內,考量照射活性能量射線後之剝離性之觀點,亦宜更摻合例如乙烯性不飽和化合物,又,亦可更含有抗靜電劑、抗氧化劑、塑化劑、填充劑、顏料、稀釋劑、抗老化劑、紫外線吸收劑、紫外線安定劑、賦予黏著樹脂等添加劑。這些添加劑可單獨使用或可併用2種以上。尤以抗氧化劑對於保持黏著劑層之安定性為有效。摻合抗氧化劑時之含量,並無特別限制,宜為0.01~5重量%。又,除了添加劑之外,亦可含有少量之含於黏著劑組成物之構成成分之製造原料等中之雜質等。[other ingredients] In the adhesive composition of the present invention, in the range that does not impair the effect of the present invention, it is also preferable to further incorporate, for example, an ethylenically unsaturated compound from the viewpoint of peelability after irradiation with active energy rays, and may further contain Additives such as antistatic agents, antioxidants, plasticizers, fillers, pigments, thinners, antiaging agents, ultraviolet absorbers, ultraviolet stabilizers, and adhesive resins. These additives may be used alone or in combination of two or more. Antioxidants are especially effective for maintaining the stability of the adhesive layer. The content when the antioxidant is blended is not particularly limited, but is preferably 0.01 to 5% by weight. In addition, in addition to additives, a small amount of impurities contained in the manufacturing raw materials of the constituent components of the adhesive composition may be contained.

如此般,含有乙烯性不飽和基之丙烯酸系樹脂藉由混合理想為交聯劑、光聚合引發劑及因應需要之其他成分,可獲得本發明之黏著劑組成物。In this way, the adhesive composition of the present invention can be obtained by mixing an acrylic resin containing an ethylenically unsaturated group, preferably a crosslinking agent, a photopolymerization initiator, and other components as needed.

本發明之黏著劑組成物,利用上述交聯劑進行交聯並發揮作為黏著劑之性能,其後,藉由照射活性能量射線,含有乙烯性不飽和基之丙烯酸系樹脂含有的乙烯性不飽和基會進行聚合且黏著劑硬化,因黏著力發生降低情形而發揮剝離性。The adhesive composition of the present invention is cross-linked by the above-mentioned cross-linking agent to exert its performance as an adhesive, and then, by irradiating active energy rays, the ethylenically unsaturated group-containing acrylic resin contains The base will polymerize and the adhesive will harden, and the peelability will be exhibited due to the decrease of the adhesive force.

本發明之黏著劑組成物,通常係在將電子基板、半導體晶圓、玻璃加工品、金屬板、塑膠板等被加工構件進行加工時,理想地使用作為用以暫時保護表面之黏著片之黏著劑層。又,本發明之黏著片由於耐熱性優異,即便係貼附於被加工構件之表面後附加了100℃以上的加熱步驟之情況,藉由照射活性能量射線,亦可發揮優異的剝離性。 以下針對上述黏著片進行說明。The adhesive composition of the present invention is ideally used as an adhesive sheet for temporarily protecting the surface when processing electronic substrates, semiconductor wafers, glass processed products, metal plates, plastic plates, and other processed members. agent layer. Furthermore, since the adhesive sheet of the present invention is excellent in heat resistance, even if it is attached to the surface of the workpiece and then heated at 100°C or higher, it can exhibit excellent peelability by irradiating active energy rays. The above-mentioned adhesive sheet will be described below.

上述黏著片通常具有基材片、由本發明之黏著劑組成物構成之黏著劑層、脫模膜。就該黏著片之製作方法而言,首先直接使用本發明之黏著劑組成物,或利用適當的有機溶劑調整濃度後,直接塗佈於剝離膜上或基材片上。其後,例如利用80~105℃、0.5~10分鐘之加熱處理等進行乾燥,藉由將其貼附於基材片或脫模膜可獲得黏著片。又,為了取得黏著物性之平衡,亦可於乾燥後更進行老化。The above-mentioned adhesive sheet usually has a base sheet, an adhesive layer composed of the adhesive composition of the present invention, and a release film. In terms of the production method of the adhesive sheet, firstly, the adhesive composition of the present invention is directly used, or the concentration is adjusted with an appropriate organic solvent, and then directly coated on the release film or the substrate sheet. Thereafter, drying is performed by, for example, heat treatment at 80 to 105° C. for 0.5 to 10 minutes, and the adhesive sheet can be obtained by affixing it to a base material sheet or a release film. In addition, in order to obtain a balance of adhesive properties, it is also possible to perform aging after drying.

就上述基材片而言,可舉例如聚萘二甲酸乙二酯、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚對苯二甲酸乙二酯/間苯二甲酸共聚物等聚酯系樹脂;聚乙烯、聚丙烯、聚甲基戊烯等聚烯烴系樹脂;聚氟化乙烯、聚偏二氟乙烯、聚二氟化乙烯等聚氟化乙烯樹脂;尼龍6、尼龍6,6等聚醯胺;聚氯乙烯、聚氯乙烯/乙酸乙烯酯共聚物、乙烯-乙酸乙烯酯共聚物、乙烯-乙烯醇共聚物、聚乙烯醇、維尼綸等乙烯聚合物;三乙酸纖維素、賽璐玢等纖維素系樹脂;聚甲基丙烯酸甲酯、聚甲基丙烯酸乙酯、聚丙烯酸乙酯、聚丙烯酸丁酯等丙烯酸系樹脂;聚苯乙烯;聚碳酸酯;聚芳酯;聚醯亞胺等合成樹脂片、鋁、銅、鐵之金屬箔、上質紙、玻璃紙等紙、由玻璃纖維、天然纖維、合成纖維等構成之織物、不織布。這些基材片可作為單層體或疊層了2種以上之多層體而使用。該等之中,考量質輕化等之觀點,又宜為合成樹脂片。Examples of the aforementioned substrate sheet include polyethylene naphthalate, polyethylene terephthalate, polybutylene terephthalate, polyethylene terephthalate/isophthalic acid Polyester resins such as copolymers; polyolefin resins such as polyethylene, polypropylene, and polymethylpentene; polyvinyl fluoride resins such as polyvinyl fluoride, polyvinylidene fluoride, and polyvinyl difluoride; nylon 6 , nylon 6, 6 and other polyamides; polyvinyl chloride, polyvinyl chloride/vinyl acetate copolymer, ethylene-vinyl acetate copolymer, ethylene-vinyl alcohol copolymer, polyvinyl alcohol, vinylon and other ethylene polymers; Cellulose resins such as cellulose triacetate and cellophane; acrylic resins such as polymethyl methacrylate, polyethyl methacrylate, polyethyl acrylate, and polybutyl acrylate; polystyrene; polycarbonate; Polyarylate; polyimide and other synthetic resin sheets, aluminum, copper, iron metal foil, high-quality paper, cellophane and other papers, fabrics and non-woven fabrics made of glass fibers, natural fibers, synthetic fibers, etc. These base material sheets can be used as a single-layer body or a multi-layer body in which two or more types are laminated. Among them, a synthetic resin sheet is preferable in consideration of light weight and the like.

此外,就上述脫模膜而言,例如可使用上述基材片中例示之各種合成樹脂片、紙、織物、不織布等經脫模處理者。In addition, as the above-mentioned release film, for example, various synthetic resin sheets, paper, woven fabrics, non-woven fabrics, and the like that have been subjected to a release treatment can be used as examples for the above-mentioned base sheet.

又,就上述黏著劑組成物之塗佈方法而言,只要係一般的塗佈方法即可,並無特別限定,可舉例如輥塗佈、模具塗佈、凹版塗佈、缺角輪塗佈、網版印刷等方法。Also, the coating method of the above-mentioned adhesive composition is not particularly limited as long as it is a general coating method, and examples thereof include roll coating, die coating, gravure coating, and chipped wheel coating. , screen printing and other methods.

上述黏著片之黏著劑層之厚度通常宜為10~200μm,更宜為15~100μm。The thickness of the adhesive layer of the above-mentioned adhesive sheet is usually preferably 10-200 μm, more preferably 15-100 μm.

就上述老化之條件而言,溫度通常為常溫(23℃)~70℃,時間通常為1~30日,具體而言,例如可於23℃下1~20日、23℃下3~10日、40℃下1~7日等之條件下進行。In terms of the above aging conditions, the temperature is usually room temperature (23°C) to 70°C, and the time is usually 1 to 30 days. Specifically, for example, 1 to 20 days at 23°C, 3 to 10 days at 23°C , 40°C for 1 to 7 days, etc.

本發明之黏著片係藉由照射活性能量射線來降低黏著力,就上述活性能量射線而言,通常可利用遠紫外線、紫外線、近紫外線、赤外線等光線;X線、γ線等電磁波;除此以外還可利用電子束、質子束、中子束等。其中,考量硬化速度、照射裝置之取得容易性、價格等宜為紫外線。The adhesive sheet of the present invention reduces the adhesive force by irradiating active energy rays. For the above-mentioned active energy rays, light rays such as far ultraviolet rays, ultraviolet rays, near ultraviolet rays, and infrared rays can be used; electromagnetic waves such as X-rays and gamma rays; In addition, electron beams, proton beams, neutron beams, and the like can be used. Among them, ultraviolet rays are preferable in consideration of curing speed, availability of irradiation equipment, and price.

照射上述紫外線時之累計照射量,通常為50~3,000mJ/cm2 ,宜為100~1,000mJ/cm2 。又,照射時間依據光源之種類、光源與黏著劑層之距離、黏著劑層之厚度、其他條件有所不同,通常為數秒,依據情況亦可為數分之1秒。The cumulative exposure dose when irradiating the above-mentioned ultraviolet rays is usually 50 to 3,000 mJ/cm 2 , preferably 100 to 1,000 mJ/cm 2 . In addition, the irradiation time varies depending on the type of light source, the distance between the light source and the adhesive layer, the thickness of the adhesive layer, and other conditions. It is usually several seconds, and may be a fraction of a second depending on the situation.

上述黏著片之黏著力依據基材片之種類、被加工構件之種類等有所不同,照射活性能量射線前宜為0.1~30N/25mm,更宜為0.5~20N/25mm。又,照射活性能量射線後之黏著力宜為1N/25mm以下,更宜為0.5N/25mm以下。 上述照射活性能量射線後之黏著力宜為照射活性能量射線前之黏著力之1/10以下,更宜為1/20以下。The adhesive force of the above-mentioned adhesive sheet varies depending on the type of base sheet and the type of workpiece to be processed. Before irradiation with active energy rays, the adhesive force is preferably 0.1-30N/25mm, more preferably 0.5-20N/25mm. Also, the adhesive force after irradiation with active energy rays is preferably 1 N/25 mm or less, more preferably 0.5 N/25 mm or less. The adhesive force after the active energy ray irradiation is preferably 1/10 or less, more preferably 1/20 or less, of the adhesive force before the active energy ray irradiation.

又,本發明之黏著片經在150℃加熱1小時然後施以紫外線照射(累計照射量250mJ/cm2 )後的黏著力宜為1N/25mm以下,更宜為0.5N/25mm以下。 上述於150℃加熱1小時之情況,照射活性能量射線後之黏著力宜為照射活性能量射線前之黏著力之1/5以下,更宜為1/10以下。In addition, the adhesive force of the adhesive sheet of the present invention after heating at 150°C for 1 hour and then irradiating with ultraviolet light (accumulative irradiation dose: 250mJ/cm 2 ) is preferably less than 1N/25mm, more preferably less than 0.5N/25mm. In the case of heating at 150° C. for 1 hour, the adhesive strength after irradiation with active energy rays is preferably 1/5 or less, more preferably 1/10 or less, of the adhesive strength before irradiation with active energy rays.

此外,本發明之黏著片於200℃加熱1小時,其後施加紫外線照射(累計照射量250mJ/cm2 )時之黏著力宜為2N/25mm以下,更宜為1N/25mm以下。 上述於200℃加熱1小時之情況,照射活性能量射線後之黏著力宜為照射活性能量射線前之黏著力之1/2以下,更宜為1/3以下。In addition, the adhesive force of the adhesive sheet of the present invention when heated at 200°C for 1 hour and then irradiated with ultraviolet light (cumulative irradiation dose: 250mJ/cm 2 ) is preferably less than 2N/25mm, more preferably less than 1N/25mm. In the above-mentioned case of heating at 200°C for 1 hour, the adhesive force after the active energy ray irradiation is preferably 1/2 or less, more preferably 1/3 or less, of the adhesive force before the active energy ray irradiation.

本發明之黏著劑組成物,例如將其使用作為黏著劑層之黏著片與被加工構件貼合並暫時保護被加工構件之表面後,藉由因應需要照射活性能量射線,可使黏著劑層硬化且黏著力降低,並輕易地從被加工構件剝離。此外,本發明之黏著片,由於耐熱性優異,貼附於被加工構件之表面後,即便係附加了例如100℃以上,尤其係150℃以上之加熱步驟之情況,藉由其後照射活性能量射線,亦可發揮優異的剝離性。 [實施例]The adhesive composition of the present invention, for example, can harden the adhesive layer by irradiating active energy rays as needed after bonding the member to be processed with an adhesive sheet as the adhesive layer and temporarily protecting the surface of the member to be processed. The adhesive force is reduced, and it can be easily peeled off from the processed member. In addition, since the adhesive sheet of the present invention has excellent heat resistance, after being attached to the surface of the workpiece, even if a heating step of, for example, 100° C. or higher, especially 150° C. Rays can also exhibit excellent peelability. [Example]

以下列舉實施例更進一步具體地說明本發明,但本發明只要不超出其要旨,並不限定於以下實施例。又,以下所謂「份」,係意指重量基準。The following examples are given to illustrate the present invention more specifically, but the present invention is not limited to the following examples unless the gist thereof is exceeded. In addition, "part" below means a weight basis.

>含有羥基之丙烯酸系樹脂(α)、含有羧基之丙烯酸系樹脂(α’)之製備> 於實施例之前,先製備含有羥基之丙烯酸系樹脂(α)及含有羧基之丙烯酸系樹脂(α’)。>Preparation of hydroxyl-containing acrylic resin (α) and carboxyl-containing acrylic resin (α’)> Before the examples, the acrylic resin (α) containing a hydroxyl group and the acrylic resin (α’) containing a carboxyl group were prepared earlier.

[製備例1] 將乙酸乙酯與偶氮雙異丁腈(AIBN)進料於2L圓底四口燒瓶內,邊使其回流,邊花費2小時滴加丙烯酸丁酯(BA)、丙烯酸2-羥基乙酯(2HEA)後,適當追加乙酸乙酯與AIBN,並反應7.5小時,獲得含有羥基之丙烯酸系樹脂(α-1)溶液。 又,含有羥基之丙烯酸系樹脂(α-1)之單體組成係BA/2HEA=72/28(重量比),重量平均分子量係47萬,玻璃轉移溫度係-23.7℃,固體成分係45.7重量%、黏度係12,600mPa・s/25℃。又,含有羥基之丙烯酸系樹脂(α-1)之酸價係0.09mgKOH/g。[Preparation Example 1] Feed ethyl acetate and azobisisobutyronitrile (AIBN) into a 2L round-bottomed four-neck flask, and while making it reflux, spend 2 hours to drop butyl acrylate (BA), 2-hydroxyethyl acrylate ( 2HEA), add ethyl acetate and AIBN appropriately, and react for 7.5 hours to obtain a solution of acrylic resin (α-1) containing hydroxyl groups. Also, the monomer composition of hydroxyl-containing acrylic resin (α-1) is BA/2HEA=72/28 (weight ratio), the weight average molecular weight is 470,000, the glass transition temperature is -23.7°C, and the solid content is 45.7% by weight %, viscosity is 12,600mPa・s/25℃. Also, the acid value of the hydroxyl group-containing acrylic resin (α-1) was 0.09 mgKOH/g.

[製備例2] 將乙酸乙酯與偶氮雙異丁腈(AIBN)進料於2L圓底四口燒瓶內,邊進行回流,邊花費2小時滴加丙烯酸丁酯(BA)、甲基丙烯酸甲酯(MMA)、丙烯酸2-羥基乙酯(2HEA)後,適當追加乙酸乙酯與AIBN,並反應7.5小時,獲得含有羥基之丙烯酸系樹脂(α-2)溶液。 又,含有羥基之丙烯酸系樹脂(α-2)之單體組成係BA/MMA/2HEA=62/10/28(重量比),重量平均分子量係60萬,玻璃轉移溫度係-35.3℃,固體成分係40重量%,黏度係6,000mPa・s/25℃。又,含有羥基之丙烯酸系樹脂(α-2)之酸價係0.09mgKOH/g。[Preparation Example 2] Feed ethyl acetate and azobisisobutyronitrile (AIBN) into a 2L round-bottomed four-neck flask, and reflux while adding butyl acrylate (BA) and methyl methacrylate (MMA) dropwise for 2 hours , 2-hydroxyethyl acrylate (2HEA), add ethyl acetate and AIBN appropriately, and react for 7.5 hours to obtain a solution of acrylic resin (α-2) containing hydroxyl groups. In addition, the monomer composition of hydroxyl-containing acrylic resin (α-2) is BA/MMA/2HEA=62/10/28 (weight ratio), the weight average molecular weight is 600,000, the glass transition temperature is -35.3°C, solid The composition is 40% by weight, and the viscosity is 6,000mPa・s/25℃. Also, the acid value of the hydroxyl group-containing acrylic resin (α-2) was 0.09 mgKOH/g.

[製備例3] 將乙酸乙酯與偶氮雙異丁腈(AIBN)進料於2L圓底四口燒瓶內,邊進行回流,邊花費2小時滴加丙烯酸丁酯(BA)、丙烯酸(AAc)後,適當追加乙酸乙酯與AIBN,並反應5小時,獲得含有羧基之丙烯酸系樹脂(α’-1)溶液。 又,含有羧基之丙烯酸系樹脂(α’-1)之單體組成係BA/AAc=80/20(重量比),重量平均分子量係71萬,玻璃轉移溫度係-35.7℃,固體成分係35.0重量%,黏度係15,000mPa・s/25℃。又,含有羧基之丙烯酸系樹脂(α’-1)之酸價係156mgKOH/g。[Preparation Example 3] Feed ethyl acetate and azobisisobutyronitrile (AIBN) into a 2L round-bottomed four-neck flask, and while refluxing, add butyl acrylate (BA) and acrylic acid (AAc) dropwise for 2 hours, then add appropriately Ethyl acetate and AIBN were reacted for 5 hours to obtain a carboxyl-containing acrylic resin (α'-1) solution. Also, the monomer composition of the carboxyl group-containing acrylic resin (α'-1) is BA/AAc=80/20 (weight ratio), the weight average molecular weight is 710,000, the glass transition temperature is -35.7°C, and the solid content is 35.0 % by weight, viscosity is 15,000mPa・s/25℃. Also, the acid value of the carboxyl group-containing acrylic resin (α'-1) was 156 mgKOH/g.

使用上述獲得之含有羥基之丙烯酸系樹脂(α)及含有羧基之丙烯酸系樹脂(α’),進行含有乙烯性不飽和基之丙烯酸系樹脂之製造。Using the hydroxyl group-containing acrylic resin (α) and carboxyl group-containing acrylic resin (α') obtained above, an ethylenically unsaturated group-containing acrylic resin was produced.

>製造例1> 將上述製備之含有羥基之丙烯酸系樹脂(α-1)、與相對於含有羥基之丙烯酸系樹脂(α-1)中之含有羥基之單體100mol%為80mol%之丙烯酸(AAc)(β-1)、相對於丙烯酸為0.50mol%之氫氧化鎂及0.50mol%之氫氧化鋰各自進料於2L圓底四口燒瓶內,進行攪拌同時升溫至60℃。然後,花費6小時滴加與進料之丙烯酸同mol之二碳酸二第三丁酯(I-1)的50%甲苯溶液,再於60℃反應10小時,獲得含有乙烯性不飽和基之丙烯酸系樹脂(1)。反應中,並無看到明顯黏度上昇,反應良好地進行。 獲得之含有乙烯性不飽和基之丙烯酸系樹脂(1),固體成分係34.4重量%,黏度係2,300mPa・s/25℃,由13 C-NMR測定之結果算出之酯化率係76.9%(反應率係96.1%),乙烯性不飽和基之含量係165mmol/100g。>Manufacturing Example 1> The hydroxyl-containing acrylic resin (α-1) prepared above was mixed with 80 mol% of acrylic acid ( AAc)(β-1), 0.50 mol% magnesium hydroxide relative to acrylic acid, and 0.50 mol% lithium hydroxide were each fed into a 2L round-bottomed four-neck flask, and the temperature was raised to 60°C while stirring. Then, spend 6 hours dropwise adding a 50% toluene solution of di-tert-butyl dicarbonate (I-1) with the same mole as the acrylic acid fed, and then react at 60°C for 10 hours to obtain acrylic acid containing ethylenically unsaturated groups. Department of resin (1). During the reaction, no significant increase in viscosity was observed, and the reaction proceeded favorably. The obtained ethylenically unsaturated group-containing acrylic resin (1) had a solid content of 34.4% by weight, a viscosity of 2,300 mPa・s/25°C, and an esterification rate calculated from the results of 13 C-NMR measurements of 76.9% ( The reaction rate is 96.1%), and the ethylenically unsaturated group content is 165mmol/100g.

>製造例2> 將上述製備之含有羥基之丙烯酸系樹脂(α-2)、與相對於含有羥基之丙烯酸系樹脂(α-2)中之含有羥基之單體100mol%為80mol%之甲基丙烯酸酐(γ-1)與0.40mol%之作為酯化觸媒之氫氧化鎂進料於2L圓底四口燒瓶內,進行攪拌同時於50℃反應18小時,獲得含有乙烯性不飽和基之丙烯酸系樹脂(2)。 獲得之含有乙烯性不飽和基之丙烯酸系樹脂(2),固體成分係31.8重量%,黏度係800mPa・s/25℃,由13 C-NMR測定之結果算出之酯化率係64%(反應率係80%),乙烯性不飽和基之含量係140mmol/100g。>Manufacturing Example 2> The hydroxyl-containing acrylic resin (α-2) prepared above was mixed with 80 mol% of methyl Acrylic anhydride (γ-1) and 0.40 mol% magnesium hydroxide as an esterification catalyst were fed into a 2L round-bottomed four-neck flask, stirred and reacted at 50°C for 18 hours to obtain ethylenically unsaturated group-containing Acrylic resin (2). The obtained ethylenically unsaturated group-containing acrylic resin (2) had a solid content of 31.8% by weight, a viscosity of 800 mPa・s/25°C, and an esterification rate calculated from the results of 13 C-NMR measurements of 64% (reaction The rate is 80%), and the content of ethylenically unsaturated group is 140mmol/100g.

>製造例3> 製造例2中,相對於含有羥基之丙烯酸系樹脂(α-2)中之含有羥基之單體100mol%,將甲基丙烯酸酐(γ-1)變更為33mol%並將作為酯化觸媒之氫氧化鎂變更為0.16mol%,除此以外與製造例2相同而獲得含有乙烯性不飽和基之丙烯酸系樹脂(3)。獲得之含有乙烯性不飽和基之丙烯酸系S樹脂(3),固體成分係31.9重量%,黏度係1,000mPa・s/25℃,由13 C-NMR測定之結果算出之酯化率係33%(反應率係100%),乙烯性不飽和基之含量係72mmol/100g。> Production Example 3 > In Production Example 2, methacrylic anhydride (γ-1) was changed to 33 mol% with respect to 100 mol% of the hydroxyl group-containing monomer in the hydroxyl group-containing acrylic resin (α-2) and used as Except having changed the magnesium hydroxide of an esterification catalyst into 0.16 mol%, it carried out similarly to manufacture example 2, and obtained the ethylenically unsaturated group containing acrylic resin (3). The obtained ethylenically unsaturated group-containing acrylic S resin (3) had a solid content of 31.9% by weight, a viscosity of 1,000mPa・s/25°C, and an esterification rate calculated from the results of 13 C-NMR measurements of 33%. (Reaction rate is 100%), and the content of ethylenically unsaturated group is 72mmol/100g.

>製造例4> 相對於上述製備例2中獲得之含有羥基之丙烯酸系樹脂(α-2)中之含有羥基之單體100mol%,適當添加80mol%之丙烯酸2-甲基丙烯醯氧基乙酯(MOI)與作為胺甲酸酯化觸媒之二月桂酸二丁基錫,並於50℃反應18小時,獲得含有乙烯性不飽和基之丙烯酸系樹脂(1’)。 獲得之含有乙烯性不飽和基之丙烯酸系樹脂(1’),固體成分係35.0重量%,黏度係1,200mPa・s/25℃,由13 C-NMR測定之結果算出之胺甲酸酯化率係80%(反應率係100%),乙烯性不飽和基之含量係148mmol/100g。>Manufacturing Example 4> With respect to 100mol% of the hydroxyl-containing monomer in the hydroxyl-containing acrylic resin (α-2) obtained in the above-mentioned Preparation Example 2, 80mol% of 2-methacryloxyethyl acrylic acid was appropriately added The ester (MOI) was reacted with dibutyltin dilaurate as a urethanization catalyst at 50°C for 18 hours to obtain an acrylic resin (1') containing ethylenically unsaturated groups. The obtained ethylenically unsaturated group-containing acrylic resin (1') has a solid content of 35.0% by weight, a viscosity of 1,200mPa・s/25°C, and a urethane conversion rate calculated from the results of 13 C-NMR measurement It is 80% (the reaction rate is 100%), and the content of ethylenically unsaturated group is 148mmol/100g.

>製造例5> 製造例2中,相對於含有羥基之丙烯酸系樹脂(α-2)中之100mol%之含有羥基之單體,將甲基丙烯酸酐(γ-1)變更為8.4mol%及作為酯化觸媒之氫氧化鎂變更為0.04mol%,除此以外與製造例2相同而獲得含有乙烯性不飽和基之丙烯酸系樹脂(2’)。 獲得之含有乙烯性不飽和基之丙烯酸系樹脂(2’),固體成分係31.4重量%,黏度係1,500mPa・s/25℃,由13 C-NMR測定之結果算出之酯化率係8.4%(反應率係100%),乙烯性不飽和基之含量係20mmol/100g。> Production Example 5 > In Production Example 2, methacrylic anhydride (γ-1) was changed to 8.4 mol% and Except having changed the magnesium hydroxide which is an esterification catalyst into 0.04 mol%, it carried out similarly to manufacture example 2, and obtained the ethylenically unsaturated group containing acrylic resin (2'). The obtained ethylenically unsaturated group-containing acrylic resin (2') had a solid content of 31.4% by weight, a viscosity of 1,500 mPa・s/25°C, and an esterification rate calculated from the results of 13 C-NMR measurements of 8.4%. (Reaction rate is 100%), and the content of ethylenically unsaturated group is 20mmol/100g.

>製造例6> 將上述製備之含有羧基之丙烯酸系樹脂(α’-1)、與相對於含有羧基之丙烯酸系樹脂(α’-1)中之含有羧基之單體100mol%為80mol%之2HEA、與相對於2HEA為0.50mol%之氫氧化鎂及0.50mol%之氫氧化鋰各自進料於2L圓底四口燒瓶內,進行攪拌同時升溫至60℃。然後,花費6小時滴加與進料之2HEA同mol之二碳酸二第三丁酯(I-1)的50%甲苯溶液。從滴加開始後立刻看到黏度緩緩上昇,反應難以繼續因而在途中停止反應。>Manufacturing example 6> The carboxyl group-containing acrylic resin (α'-1) prepared above, 2HEA of 80 mol% relative to the carboxyl group-containing monomer 100 mol% in the carboxyl group-containing acrylic resin (α'-1), and the relative 2HEA: 0.50 mol% magnesium hydroxide and 0.50 mol% lithium hydroxide were each fed into a 2L round-bottomed four-neck flask, and the temperature was raised to 60°C while stirring. Then, a 50% toluene solution of di-tert-butyl dicarbonate (I-1) having the same mole as the feed 2HEA was added dropwise for 6 hours. Immediately after the dropwise addition was started, the viscosity gradually increased, and the reaction was difficult to continue, so the reaction was stopped on the way.

製造例1~6中獲得之含有乙烯性不飽和基之丙烯酸系樹脂之胺甲酸酯基之有無及乙烯性不飽和基之含量示於下表1。The presence or absence of urethane groups and the content of ethylenically unsaturated groups in the ethylenically unsaturated group-containing acrylic resins obtained in Production Examples 1 to 6 are shown in Table 1 below.

[表1]

Figure 108108546-A0304-0001
[Table 1]
Figure 108108546-A0304-0001

>實施例1> 相對於上述獲得之含有乙烯性不飽和基之丙烯酸系樹脂(1)之固體成分100份,混合1.0份之異氰酸酯系交聯劑(日本聚胺甲酸酯公司製「CORONATE L-55E」)與3.00份之光聚合引發劑(BASF公司製「Irgacure184」),製備活性能量射線硬化性之黏著劑組成物。又,實施例1之摻合示於後述表2。>Example 1> With respect to 100 parts of the solid content of the ethylenically unsaturated group-containing acrylic resin (1) obtained above, 1.0 part of an isocyanate-based crosslinking agent (manufactured by Nippon Polyurethane Co., Ltd. "CORONATE L-55E") and 3.00 parts of a photopolymerization initiator ("Irgacure 184" manufactured by BASF Corporation) was used to prepare an active energy ray-curable adhesive composition. Moreover, the compounding of Example 1 is shown in Table 2 mentioned later.

>實施例2、3及比較例1、2> 實施例1中,依據後述表2摻合含有乙烯性不飽和基之丙烯酸系樹脂之種類、異氰酸酯系交聯劑及光聚合引發劑並予以混合,藉此製備實施例2、3及比較例1、2之活性能量射線硬化性之黏著劑組成物。>Example 2, 3 and Comparative Example 1, 2> In Example 1, the type of acrylic resin containing an ethylenically unsaturated group, an isocyanate-based crosslinking agent, and a photopolymerization initiator were blended and mixed according to Table 2 below to prepare Examples 2 and 3 and Comparative Example 1 2. The active energy ray-curable adhesive composition.

藉由將上述實施例1~3及比較例1、2之黏著劑組成物以乾燥後之厚度成為25μm之方式塗佈於聚醯亞胺薄膜(膜厚50μm)(TORAY-DU PONT公司製「KAPTON 200H」)上,進行乾燥,並貼附於38μm之分離膜(三井化學tohcello公司製,「SP-PET 38 01-BU」),於40℃老化3日來製作黏著片。 針對獲得之黏著片,進行下列評估。評估結果示於後述表2。By applying the adhesive compositions of Examples 1 to 3 and Comparative Examples 1 and 2 above to a polyimide film (film thickness 50 μm) (manufactured by TORAY-DU PONT Co., Ltd. KAPTON 200H"), dried, attached to a 38 μm separation membrane (manufactured by Mitsui Chemicals Tohcello, "SP-PET 38 01-BU"), and aged at 40°C for 3 days to produce an adhesive sheet. With respect to the obtained adhesive sheet, the following evaluations were performed. The evaluation results are shown in Table 2 below.

>照射活性能量射線前黏著力> 由上述獲得之黏著片製作25mm×100mm之測試片,剝除分離膜後,於23℃、50%RH之環境下將重量2kg之橡膠滾筒來回2次來加壓貼附於康寧玻璃板,於同環境下靜置30分鐘後,以剝離速度300mm/min測定180度剝離強度(N/25mm)。評估基準如下列所示。 (評估基準) ◎・・・6.0N/25mm以上 ○・・・3.0N/25mm以上且未達6.0N/25mm ×・・・未達3.0N/25mm>Adhesive force before active energy ray irradiation> Make a test piece of 25mm x 100mm from the adhesive sheet obtained above, peel off the separation film, press and attach a rubber roller weighing 2kg back and forth twice to the Corning glass plate under the environment of 23°C and 50%RH. After standing in the same environment for 30 minutes, the 180-degree peel strength (N/25mm) was measured at a peeling speed of 300mm/min. The evaluation criteria are as follows. (Assessment basis) ◎・・・6.0N/25mm or more ○・・・More than 3.0N/25mm and less than 6.0N/25mm ×・・・Less than 3.0N/25mm

>照射活性能量射線後黏著力> 由上述獲得之黏著片製作25mm×100mm之測試片,剝除分離膜後,於23℃、50%RH之環境下將重量2kg之橡膠滾筒來回2次來加壓貼附於康寧玻璃板,於同環境下靜置30分鐘後,使用1盞80W之高壓水銀燈,自玻璃板側施加紫外線照射(累計照射量250mJ/cm2 ),立即以剝離速度300mm/min測定180度剝離強度(N/25mm)。評估基準如下列所示。 (評估基準) ◎・・・未達0.1N/25mm ○・・・0.1N/25mm以上且在1N/25mm以下 ×・・・大於1N/25mm>Adhesive force after active energy ray irradiation> Make a 25mm×100mm test piece from the above-mentioned adhesive sheet, peel off the separation film, and apply the rubber roller with a weight of 2kg back and forth twice under the environment of 23°C and 50%RH. Press and attach to the Corning glass plate, after standing in the same environment for 30 minutes, use an 80W high-pressure mercury lamp to apply ultraviolet radiation from the side of the glass plate (cumulative exposure 250mJ/cm 2 ), and immediately peel off at a speed of 300mm/min Measure the 180-degree peel strength (N/25mm). The evaluation criteria are as follows. (Evaluation criteria) ◎・・・less than 0.1N/25mm ○・・・more than 0.1N/25mm and less than 1N/25mm×・・・more than 1N/25mm

>加熱、照射活性能量射線後黏著力(150℃)> 由上述獲得之黏著片製作25mm×100mm之測試片,剝除分離膜後,於23℃、50%RH之環境下將重量2kg之橡膠滾筒來回2次來加壓貼附於康寧玻璃板,投入已加熱至150℃之oven jet乾燥機內1小時。從乾燥機中取出,於23℃、50%RH之環境下冷卻30分鐘後,再使用1盞80W之高壓水銀燈,自玻璃板側施加紫外線照射(累計照射量250mJ/cm2 ),立即以剝離速度300mm/min測定180度剝離強度(N/25mm)。又以目視確認剝離後之被黏體,評估耐汙染性。評估基準如下列所示。 (評估基準:黏著力) ◎・・・未達0.5N/25mm ○・・・0.5N/25mm以上且在1.0N/25mm以下 ×・・・大於1.0N/25mm (評估基準:耐汙染性) ◎・・・無殘膠 ○・・・略有殘膠 ×・・・全面有殘膠>Adhesive force after heating and irradiating active energy rays (150°C)> Make a test piece of 25mm×100mm from the above-mentioned adhesive sheet, peel off the separation film, and put 2kg of rubber under the environment of 23°C and 50%RH The roller goes back and forth twice to apply pressure to the Corning glass plate, and put it into an oven jet dryer heated to 150°C for 1 hour. Take it out of the dryer, cool it at 23°C and 50%RH for 30 minutes, then use an 80W high-pressure mercury lamp to irradiate the glass plate with ultraviolet light (accumulative exposure amount 250mJ/cm 2 ), and immediately peel off Measure the 180-degree peel strength (N/25mm) at a speed of 300mm/min. The adherend after peeling was visually confirmed, and the stain resistance was evaluated. The evaluation criteria are as follows. (Evaluation criteria: Adhesion) ◎・・・Less than 0.5N/25mm ○・・・0.5N/25mm or more and 1.0N/25mm or less ×・・・More than 1.0N/25mm (Evaluation criteria: Pollution resistance) ◎・・・No glue residue ○・・・Slight glue residue×・・・There is glue residue all over

>加熱、照射活性能量射線後黏著力(200℃)> 由上述獲得之黏著片製作25mm×100mm之測試片,剝除分離膜後,於23℃、50%RH之環境下將重量2kg之橡膠滾筒來回2次來加壓貼附於康寧玻璃板,投入已加熱至200℃之oven jet乾燥機內1小時。從乾燥機中取出,於23℃、50%RH之環境下冷卻30分鐘後,再使用1盞80W之高壓水銀燈,自玻璃板側施加紫外線照射(累計照射量250mJ/cm2 ),立即以剝離速度300mm/min測定180度剝離強度(N/25mm)。又以目視確認剝離後之被黏體,評估耐汙染性。評估基準如下列所示。 (評估基準:黏著力) ◎・・・未達0.5N/25mm ○・・・0.5N/25mm以上且在2.0N/25mm以下 ×・・・大於2.0N/25mm (評估基準:耐汙染性) ◎・・・無殘膠 ○・・・略有殘膠 ×・・・全面有殘膠>Adhesive force after heating and irradiating active energy rays (200°C)> Make a 25mm×100mm test piece from the above-mentioned adhesive sheet, peel off the separation film, and put 2kg of rubber in the environment of 23°C and 50%RH Roll back and forth twice to apply pressure to the Corning glass plate, and put it into an oven jet dryer heated to 200°C for 1 hour. Take it out of the dryer, cool it at 23°C and 50%RH for 30 minutes, then use an 80W high-pressure mercury lamp to irradiate the glass plate with ultraviolet light (accumulative exposure amount 250mJ/cm 2 ), and immediately peel off Measure the 180-degree peel strength (N/25mm) at a speed of 300mm/min. The adherend after peeling was visually confirmed, and the stain resistance was evaluated. The evaluation criteria are as follows. (Evaluation criteria: Adhesion) ◎・・・Less than 0.5N/25mm ○・・・0.5N/25mm or more and 2.0N/25mm or less ×・・・More than 2.0N/25mm (Evaluation criteria: Contamination resistance) ◎・・・No glue residue ○・・・Slight glue residue×・・・There is glue residue all over

[表2]

Figure 108108546-A0304-0002
※比較例1:加熱、照射活性能量射線後(150℃),基材界面剝離且被黏體有全面殘膠[Table 2]
Figure 108108546-A0304-0002
※Comparative example 1: After heating and irradiating active energy rays (150°C), the substrate interface peeled off and there was a full amount of adhesive residue on the adherend

由上述表2可知,含有含有乙烯性不飽和基之丙烯酸系樹脂且該丙烯酸系樹脂以預定量於側鏈具有特定之含有乙烯性不飽和基之結構部位之實施例1~3,照射活性能量射線前黏著力及照射活性能量射線後之剝離性優異。 此外,實施例1~3即使於150℃及200℃加熱後,經照射活性能量射線後,黏著力降低且耐汙染性優異。 另一方面,使用了不具有特定之含有乙烯性不飽和基之結構部位之丙烯酸系樹脂之比較例1,照射活性能量射線前之黏著力高,照射活性能量射線後之黏著力低,但加熱後之黏著力高且耐汙染性亦較差。此外,使用了不以預定量含有特定之含有乙烯性不飽和基之結構部位之丙烯酸系樹脂之比較例2,照射活性能量射線後之黏著力及加熱後之黏著力高且剝離性較差。As can be seen from the above Table 2, in Examples 1 to 3, which contain an acrylic resin containing an ethylenically unsaturated group and the acrylic resin has a specific structural site containing an ethylenically unsaturated group in a predetermined amount, the active energy is irradiated. Excellent adhesion before irradiation and peelability after irradiation with active energy rays. In addition, even after heating at 150° C. and 200° C., Examples 1 to 3 showed reduced adhesive force and excellent stain resistance after being irradiated with active energy rays. On the other hand, Comparative Example 1 using an acrylic resin that does not have a specific ethylenically unsaturated group-containing structural site had high adhesive force before active energy ray irradiation and low adhesive force after active energy ray irradiation. After that, the adhesion is high and the pollution resistance is also poor. In addition, Comparative Example 2 using an acrylic resin that does not contain a specific ethylenically unsaturated group-containing structural site in a predetermined amount has high adhesive force after active energy ray irradiation and adhesive force after heating, and poor peelability.

上述實施例中,呈現了本發明中之具體形態,但上述實施例僅為例示,不作限定的解釋。對於發明所屬技術領域中具有通常知識者而言顯而易見的各種變形,亦包含於本發明之範圍內。 [產業上利用性]In the above-mentioned embodiment, the specific forms in the present invention are shown, but the above-mentioned embodiment is only an illustration, and shall not be interpreted as a limitation. Various modifications that are obvious to those skilled in the art to which the invention pertains are also included in the scope of the present invention. [industrial availability]

本發明之黏著劑組成物,可理想地使用作為將電子基板、半導體晶圓、玻璃加工品、金屬板、塑膠板等進行加工時之暫時的表面保護用黏著膜用之黏著劑組成物。The adhesive composition of the present invention can be ideally used as an adhesive composition for temporary surface protection adhesive films when electronic substrates, semiconductor wafers, glass processed products, metal plates, plastic plates, etc. are processed.

Figure 108108546-A0101-11-0002-2
Figure 108108546-A0101-11-0002-2

Claims (15)

一種黏著劑組成物,含有:含有乙烯性不飽和基之丙烯酸系樹脂;該含有乙烯性不飽和基之丙烯酸系樹脂於丙烯酸系樹脂之側鏈含有下列通式(1)表示之含有乙烯性不飽和基之結構部位,且乙烯性不飽和基之含量相對於含有乙烯性不飽和基之丙烯酸系樹脂為25~500mmol/100g;
Figure 108108546-A0305-02-0050-1
R1係含有乙烯性不飽和基之取代基;R2係含有選自C、O、N及S中之至少一種之有機基,惟胺甲酸酯基除外;X係O或NH。
An adhesive composition, comprising: an acrylic resin containing an ethylenically unsaturated group; the acrylic resin containing an ethylenically unsaturated group contains an ethylenically unsaturated group represented by the following general formula (1) in the side chain of the acrylic resin The structural part of the saturated group, and the content of the ethylenically unsaturated group is 25~500mmol/100g relative to the acrylic resin containing the ethylenically unsaturated group;
Figure 108108546-A0305-02-0050-1
R 1 is a substituent containing an ethylenically unsaturated group; R 2 is an organic group containing at least one selected from C, O, N and S, except for a carbamate group; X is O or NH.
如申請專利範圍第1項之黏著劑組成物,其中,該含有乙烯性不飽和基之丙烯酸系樹脂含有羥基。 As for the adhesive composition of claim 1, wherein the acrylic resin containing an ethylenically unsaturated group contains a hydroxyl group. 如申請專利範圍第1或2項之黏著劑組成物,更含有交聯劑。 If the adhesive composition of claim 1 or 2 of the scope of patent application, it further contains a cross-linking agent. 如申請專利範圍第1或2項之黏著劑組成物,更含有光聚合引發劑。 Such as the adhesive composition of claim 1 or 2 of the scope of application, it further contains a photopolymerization initiator. 如申請專利範圍第1或2項之黏著劑組成物,其中,該含有乙烯性不飽和基之丙烯酸系樹脂係使含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)於下列通式(2)表示之化合物(I)之存在下進行反應而成;
Figure 108108546-A0305-02-0051-2
此處,R3及R4係表示碳數1~20之烴基。
Such as the adhesive composition of claim 1 or 2, wherein the ethylenically unsaturated group-containing acrylic resin is made of a hydroxyl-containing acrylic resin (α) and an ethylenically unsaturated group-containing carboxylic acid ( β) reacted in the presence of the compound (I) represented by the following general formula (2);
Figure 108108546-A0305-02-0051-2
Here, R 3 and R 4 represent a hydrocarbon group with 1 to 20 carbon atoms.
如申請專利範圍第1或2項之黏著劑組成物,其中,該含有乙烯性不飽和基之丙烯酸系樹脂係使含有羥基之丙烯酸系樹脂(α)與(甲基)丙烯酸酐(γ)進行酯化反應而成。 Such as the adhesive composition of claim 1 or 2, wherein the ethylenically unsaturated group-containing acrylic resin is made of hydroxyl-containing acrylic resin (α) and (meth)acrylic anhydride (γ) formed by esterification reaction. 一種黏著片,具有如申請專利範圍第1至6項中任一項之黏著劑組成物交聯而成之黏著劑層。 An adhesive sheet has an adhesive layer formed by cross-linking the adhesive composition according to any one of items 1 to 6 in the scope of the patent application. 如申請專利範圍第7項之黏著片,其中,將該黏著片貼附於被黏體表面後供給150℃以上之加熱步驟之情況下,藉由其後照射活性能量射線可使黏著劑層硬化並剝離。 An adhesive sheet according to claim 7 of the patent application, wherein, when the adhesive sheet is applied to the surface of the adherend and then subjected to a heating step of 150°C or higher, the adhesive layer can be hardened by subsequent irradiation of active energy rays and stripped. 一種含有乙烯性不飽和基之丙烯酸系樹脂之製造方法,其特徵在於:使含有羥基之丙烯酸系樹脂(α)與含有乙烯性不飽和基之羧酸(β)於下列通式(2)表示之化合物(I)之存在下進行反應;乙烯性不飽和基之含量相對於含有乙烯性不飽和基之丙烯酸系樹脂為25~500mmol/100g;
Figure 108108546-A0305-02-0052-3
此處,R3及R4係表示碳數1~20之烴基。
A method for producing an acrylic resin containing an ethylenically unsaturated group, characterized in that: the acrylic resin (α) containing a hydroxyl group and the carboxylic acid (β) containing an ethylenically unsaturated group are represented by the following general formula (2): The reaction is carried out in the presence of the compound (I); the content of the ethylenically unsaturated group is 25 ~ 500mmol/100g relative to the acrylic resin containing the ethylenically unsaturated group;
Figure 108108546-A0305-02-0052-3
Here, R 3 and R 4 represent a hydrocarbon group with 1 to 20 carbon atoms.
如申請專利範圍第9項之含有乙烯性不飽和基之丙烯酸系樹脂之製造方法,其中,使該含有羥基之丙烯酸系樹脂(α)與該含有乙烯性不飽和基之羧酸(β)於該通式(2)表示之化合物(I)之存在下進行反應時,更於1種以上之鎂化合物及1種以上之鹼金屬化合物之存在下進行反應。 Such as the production method of the ethylenically unsaturated group-containing acrylic resin of claim 9, wherein the hydroxyl-containing acrylic resin (α) and the ethylenically unsaturated-group-containing carboxylic acid (β) are mixed When the reaction is carried out in the presence of the compound (I) represented by the general formula (2), the reaction is further carried out in the presence of one or more magnesium compounds and one or more alkali metal compounds. 如申請專利範圍第10項之含有乙烯性不飽和基之丙烯酸系樹脂之製造方法,其中,構成該鹼金屬化合物之鹼金屬係鋰。 A method for producing an ethylenically unsaturated group-containing acrylic resin as claimed in claim 10, wherein the alkali metal compound constitutes the alkali metal lithium. 如申請專利範圍第9至11項中任一項之含有乙烯性不飽和基之丙烯酸系樹脂之製造方法,其中,該通式(2)表示之化合物(I)係二碳酸二第三丁酯。 A method for producing an acrylic resin containing an ethylenically unsaturated group according to any one of items 9 to 11 of the scope of the patent application, wherein the compound (I) represented by the general formula (2) is di-tertiary butyl dicarbonate . 如申請專利範圍第10或11項之含有乙烯性不飽和基之丙烯酸系樹脂之製造方法,其中,在相對於該含有乙烯性不飽和基之羧酸(β)為0.001~1000mol%之該鎂化合物及0.001~1000mol%之該鹼金屬化合物之存在下進行反應。 The method for producing an ethylenically unsaturated group-containing acrylic resin as claimed in claim 10 or 11, wherein the magnesium is present in an amount of 0.001 to 1000 mol% relative to the ethylenically unsaturated group-containing carboxylic acid (β). The reaction is carried out in the presence of the compound and 0.001 to 1000 mol% of the alkali metal compound. 如申請專利範圍第9至11項中任一項之含有乙烯性不飽和基之丙烯酸系樹脂之製造方法,其中,構成該含有羥基之丙烯酸系樹脂(α)之含有羥基之單體(a1)之含量,相對於全體聚合成分為0.1~50重量%。 The method for producing an ethylenically unsaturated group-containing acrylic resin according to any one of claims 9 to 11 of the patent claims, wherein the hydroxyl-containing monomer (a1) constituting the hydroxyl-containing acrylic resin (α) The content of the polymer is 0.1 to 50% by weight relative to the entire polymerization component. 如申請專利範圍第9至11項中任一項之含有乙烯性不飽和基之丙烯酸系樹脂之製造方法,其中,該含有羥基之丙烯酸系樹脂(α)之酸價為10mgKOH/g以下。 The method for producing an ethylenically unsaturated group-containing acrylic resin according to any one of claims 9 to 11, wherein the acid value of the hydroxyl-containing acrylic resin (α) is 10 mgKOH/g or less.
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