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TWI780783B - Method for manufacturing printed circuit board and printed circuit board with protective layer - Google Patents

Method for manufacturing printed circuit board and printed circuit board with protective layer Download PDF

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Publication number
TWI780783B
TWI780783B TW110122462A TW110122462A TWI780783B TW I780783 B TWI780783 B TW I780783B TW 110122462 A TW110122462 A TW 110122462A TW 110122462 A TW110122462 A TW 110122462A TW I780783 B TWI780783 B TW I780783B
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layer
dielectric layer
circuit board
alkali
manufacturing
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TW110122462A
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TW202301925A (en
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吳家宏
謝坤翰
郭志榮
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大陸商律勝科技(蘇州)有限公司
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Priority to TW110122462A priority Critical patent/TWI780783B/en
Priority to KR1020210159884A priority patent/KR102588021B1/en
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Publication of TW202301925A publication Critical patent/TW202301925A/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0154Polyimide

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)

Abstract

The present invention provides a method for manufacturing a printed circuit board including the following steps: providing a first circuit board comprising a first dielectric layer and a metal wiring structure, wherein the metal wiring structure is formed on the first dielectric and comprises a first part and a second part; covering a protective layer on the first part; pressing a second dielectric layer on the second part; forming a covering layer on the surface of the first dielectric layer; forming an opening in the covering layer to expose the protective layer; removing the protective layer with an alkaline solution. The manufacturing cost of the printed circuit board can be reduced by the manufacturing method of the present invention.

Description

印刷電路板之製造方法及具保護層之印刷電路板Manufacturing method of printed circuit board and printed circuit board with protective layer

本發明係關於一種印刷線路板之製造方法,特別係關於一種於印刷線路板增層過程中使用耐高溫保護層保護金屬線路層之印刷線路板之製造方法。The present invention relates to a method for manufacturing a printed circuit board, in particular to a method for manufacturing a printed circuit board in which a high temperature resistant protective layer is used to protect the metal circuit layer during the layering process of the printed circuit board.

隨著電子設備用品微型化,使得電子元件及印刷線路板之設計變得越來越複雜,於印刷電路板增層之製程中,有許多金屬線路需要暫時性保護。現有保護金屬線路層之製造方式中,常使用之方法為使用一個暫時保護蓋覆蓋於需保護之區域,於後續疊層製程結束後,再利用機械或是雷射之方式切割外框將之去除;抑或是使用可光固化之保護膠做保護,後續疊層製程結束後,再利用物理剝除方式去除。這些方式皆有生產效率及耗費人力上之問題,導致加工成本高。With the miniaturization of electronic equipment and supplies, the design of electronic components and printed circuit boards has become more and more complicated. During the process of building up layers of printed circuit boards, many metal circuits need temporary protection. In the existing manufacturing method of protective metal circuit layer, the commonly used method is to use a temporary protective cover to cover the area to be protected, and then use mechanical or laser cutting to remove the outer frame after the subsequent lamination process is completed. ; Or use a photocurable protective adhesive for protection, and then remove it by physical stripping after the subsequent lamination process is completed. These methods all have the problems of production efficiency and manpower consumption, resulting in high processing costs.

有鑑於上述技術問題,本發明目的即係提供一種製造工藝簡單、操作方便及節約成本之印刷電路板之製造方法。In view of the above technical problems, the object of the present invention is to provide a method for manufacturing printed circuit boards with simple manufacturing process, convenient operation and cost saving.

為達上述目的,本發明係提供一種印刷電路板之製造方法,其包含以下步驟:提供一第一線路板,其包含:一第一介質層及一金屬線路結構,其中該金屬線路結構係形成於該第一介質層之一表面上,且該金屬線路結構係包含一第一部分及一第二部分;覆蓋一保護層於該第一部分上;壓合一第二介質層於該第二部分上,以使該第二介質層覆蓋於該第二部分;形成一覆蓋層於該第一介質層之該表面上,以覆蓋該保護層之表面及該第二介質層之表面;於該覆蓋層中形成一開口,以暴露出該保護層;以鹼性溶液移除該保護層,其中,該保護層為樹脂組成物所形成者,該樹脂組成物係包含:鹼可溶填充劑;鹼可溶樹脂;溶劑;及光起始劑。To achieve the above object, the present invention provides a method of manufacturing a printed circuit board, which includes the following steps: providing a first circuit board, which includes: a first dielectric layer and a metal circuit structure, wherein the metal circuit structure is formed On one surface of the first dielectric layer, and the metal wiring structure includes a first part and a second part; covering a protective layer on the first part; laminating a second dielectric layer on the second part so that the second dielectric layer covers the second part; a covering layer is formed on the surface of the first dielectric layer to cover the surface of the protective layer and the surface of the second dielectric layer; on the covering layer An opening is formed in the middle to expose the protective layer; the protective layer is removed with an alkaline solution, wherein the protective layer is formed by a resin composition, and the resin composition includes: an alkali-soluble filler; an alkali-soluble solvents; solvents; and photoinitiators.

較佳地,該鹼可溶填充劑包含氧化鋅、氫氧化鋁、二氧化鈦、三氧化二銻或氫氧化鈹。Preferably, the alkali-soluble filler includes zinc oxide, aluminum hydroxide, titanium dioxide, antimony trioxide or beryllium hydroxide.

較佳地,該鹼可溶填充劑之粒徑0.1微米~10微米。Preferably, the particle size of the alkali-soluble filler is 0.1 micron to 10 micron.

較佳地,該鹼可溶填充劑占該樹脂組成物總重之50~90重量%。Preferably, the alkali-soluble filler accounts for 50-90% by weight of the total weight of the resin composition.

較佳地,該鹼可溶樹脂包含聚醯亞胺、聚醯胺酸或酚醛樹脂。Preferably, the alkali-soluble resin comprises polyimide, polyamic acid or phenolic resin.

較佳地,該第一介質層包含未固化或半固化之熱固化樹脂材料。Preferably, the first dielectric layer includes uncured or semi-cured thermosetting resin material.

較佳地,該第二介質層包含未固化或半固化之固化性樹脂材料。Preferably, the second dielectric layer includes uncured or semi-cured curable resin material.

較佳地,該第二介質層覆蓋於該第二部分後,會於該第二介質層之側邊形成一樹脂擴散層。Preferably, after the second dielectric layer covers the second portion, a resin diffusion layer is formed on the side of the second dielectric layer.

較佳地,該覆蓋層包含線路板。Preferably, the covering layer includes a circuit board.

較佳地,該鹼性溶液為3~5%之鹼金屬氫氧化物水溶液。Preferably, the alkaline solution is a 3-5% aqueous alkali metal hydroxide solution.

本發明另提供一種具保護層之印刷電路板,其包含:第一電路板,其包含:一第一介質層及一金屬線路結構,其中該金屬線路結構係形成於該第一介質層之一表面上,且該金屬線路結構係包含一第一部分及一第二部分;一保護層,覆蓋於該第一部分上;一第二介質層,覆蓋於該第二部分上;其中,該保護層為鹼可溶者,且為樹脂組成物所形成者,該樹脂組成物係包含:鹼可溶填充劑;鹼可溶樹脂;溶劑;及光起始劑。The present invention also provides a printed circuit board with a protective layer, which includes: a first circuit board, which includes: a first dielectric layer and a metal wiring structure, wherein the metal wiring structure is formed on one of the first dielectric layers on the surface, and the metal wiring structure includes a first part and a second part; a protective layer covering the first part; a second dielectric layer covering the second part; wherein the protective layer is The alkali-soluble one is formed by a resin composition, and the resin composition system includes: an alkali-soluble filler; an alkali-soluble resin; a solvent; and a photoinitiator.

較佳地,該具保護層之印刷電路板進一步包含一覆蓋層,該覆蓋層係與該第二介質層接觸而形成於其上。更佳地,該覆蓋層與該第二介質層均將該保護層圍繞於其中。Preferably, the printed circuit board with protective layer further includes a covering layer, which is formed on the second dielectric layer in contact with it. More preferably, both the cover layer and the second dielectric layer surround the protection layer.

較佳地,該具保護層之印刷電路板進一步包含一樹脂擴散層,該樹脂擴散層係設置於該第二介質層之側邊。Preferably, the printed circuit board with protective layer further includes a resin diffusion layer, and the resin diffusion layer is arranged on the side of the second dielectric layer.

本發明利用一種鹼可溶樹脂組成物作為印刷電路板中之保護層,並相應搭配特定之製程,而可提供一種製造工藝簡單、操作方便及節約成本之印刷電路板之製造方法。The present invention uses an alkali-soluble resin composition as a protective layer in a printed circuit board, and correspondingly matches a specific manufacturing process, thereby providing a method for manufacturing a printed circuit board with simple manufacturing process, convenient operation and cost saving.

本發明中,若使用到「第一」、「第二」用語來描述元件,則該元件不受到該用語之限制,其主要係用於區分一元件與另一元件。In the present invention, if the terms "first" and "second" are used to describe a component, the component is not limited by the term, which is mainly used to distinguish one component from another component.

本發明所提供之印刷電路板之製造方法係包含以下步驟:提供一第一線路板,其包含:一第一介質層及一金屬線路結構,其中該金屬線路結構係形成於該第一介質層之一表面上,且該金屬線路結構係包含一第一部分及一第二部分;覆蓋一保護層於該第一部分上;覆蓋一保護層於該第一部分上;壓合一第二介質層於該第二部分上,以使該第二介質層覆蓋於該第二部分;形成一覆蓋層於該第一介質層之該表面上,以覆蓋該保護層之表面及該第二介質層之表面;於該覆蓋層中形成一開口,以暴露出該保護層;以鹼性溶液移除該保護層,其中,該保護層為樹脂組成物所形成者,該樹脂組成物係包含:鹼可溶填充劑;鹼可溶樹脂;溶劑;及光起始劑。The manufacturing method of the printed circuit board provided by the present invention includes the following steps: providing a first circuit board, which includes: a first dielectric layer and a metal circuit structure, wherein the metal circuit structure is formed on the first dielectric layer On one surface, and the metal circuit structure is composed of a first part and a second part; covering a protective layer on the first part; covering a protective layer on the first part; laminating a second dielectric layer on the On the second part, so that the second dielectric layer covers the second part; forming a covering layer on the surface of the first dielectric layer, so as to cover the surface of the protective layer and the surface of the second dielectric layer; An opening is formed in the cover layer to expose the protective layer; the protective layer is removed with an alkaline solution, wherein the protective layer is formed of a resin composition, and the resin composition system includes: an alkali-soluble filler agent; alkali-soluble resin; solvent; and photoinitiator.

於本發明中,壓合可使用熱壓合進行。該熱壓合可於180~250℃下進行。In the present invention, the press bonding can be performed using heat press bonding. This thermocompression bonding can be performed at 180-250°C.

下文將具體描述本發明之印刷電路板之製造方法,其僅係例示說明之用,而非用以限制本發明之範圍。The manufacturing method of the printed circuit board of the present invention will be described in detail below, which is only for illustrative purposes and not intended to limit the scope of the present invention.

第1A圖至第1F圖為本發明一實施例之印刷電路板之製造方法的流程示意圖。為更加清楚本實施例所製得之印刷電路板之結構,可一併參閱第二圖,其為本實施例所製得之印刷電路板之上視示意圖。請先參閱第1A圖,本實施例之印刷電路板10之製造方法係先提供第一線路板100。該第一線路板100係包含第一介質層110及金屬線路結構120。該第一介質層110係具有第一表面110a及與該第一表面相對之第二表面110b。於本實施例中,該金屬線路結構120係形成於該第一介質層110之第一表面110a上。金屬線路結構120可為多個彼此分離之金屬線路所組成。於本實施例中,該金屬線路之材質為銅。第1A圖中兩條虛線A之間界定之區域即為第一部分。兩條虛線B及兩條虛線C界定之區域均為第二部分,其係作為層疊第二介質層之底部。如第1A圖所示,於本實施例中,該金屬線路結構120係包含第一部分及第二部分,其中該第一部分即為金屬線路結構120需要保護之部分,第二部分為金屬線路無須保護之部分,其係環繞於該第一部分。於某些實施態樣中,該金屬電路結構120中第一部分與第二部分之間的最短距離d係介於0~0.5 mm之間。於某些實施態樣中,該金屬電路結構中第一部分以外之部分即為第二部分,亦即,該第一部分與該第二部份之間的最短距離為0。於本實施例中,第一部分與第二部分之間的最短距離係大於0 mm,且小於0.5 mm。於本發明中,該第一介質層110可為未固化或半固化之固化性樹脂材料(諸如:熱固化性樹脂材料)。1A to 1F are schematic flow charts of a method for manufacturing a printed circuit board according to an embodiment of the present invention. In order to be more clear about the structure of the printed circuit board produced in this embodiment, please also refer to the second figure, which is a schematic top view of the printed circuit board produced in this embodiment. Please refer to FIG. 1A first, the manufacturing method of the printed circuit board 10 of this embodiment is to firstly provide the first circuit board 100 . The first circuit board 100 includes a first dielectric layer 110 and a metal circuit structure 120 . The first dielectric layer 110 has a first surface 110a and a second surface 110b opposite to the first surface. In this embodiment, the metal circuit structure 120 is formed on the first surface 110 a of the first dielectric layer 110 . The metal circuit structure 120 can be composed of a plurality of metal circuits separated from each other. In this embodiment, the metal circuit is made of copper. The area defined between the two dotted lines A in Figure 1A is the first part. The area defined by the two dotted lines B and the two dotted lines C is the second part, which is used as the bottom of the stacked second dielectric layer. As shown in Figure 1A, in this embodiment, the metal circuit structure 120 includes a first part and a second part, wherein the first part is the part of the metal circuit structure 120 that needs to be protected, and the second part is the metal circuit that does not need to be protected. part that surrounds the first part. In some embodiments, the shortest distance d between the first part and the second part of the metal circuit structure 120 is between 0-0.5 mm. In some implementations, the part of the metal circuit structure other than the first part is the second part, that is, the shortest distance between the first part and the second part is zero. In this embodiment, the shortest distance between the first part and the second part is greater than 0 mm and less than 0.5 mm. In the present invention, the first dielectric layer 110 may be an uncured or semi-cured curable resin material (such as a thermosetting resin material).

於提供第一線路板100之後,如第1B圖所示,覆蓋一保護層111於該第一部分上。於本發明中,可利用網印、噴印或光刻法圖形化,將保護層111覆蓋於該第一線路板100上欲保護之金屬線路之位置,並於90℃下進行表面乾燥5分鐘,以形成具有耐高溫特性之保護層111。該保護層可至少耐160℃(諸如:160~300℃)之高溫,且該保護層於熱壓之前及之後的厚度變化率可為小於5%。本實施例中,該保護層111係由一樹脂組成物所形成,該樹脂組成物係包含:鹼可溶填充劑;鹼可溶樹脂;溶劑;及光起始劑。於本發明中,該樹脂組成物可為感光性樹脂組成物。After the first circuit board 100 is provided, as shown in FIG. 1B , a protective layer 111 is covered on the first part. In the present invention, screen printing, spray printing or photolithography can be used for patterning, the protective layer 111 is covered on the position of the metal circuit to be protected on the first circuit board 100, and the surface is dried at 90°C for 5 minutes , to form a protective layer 111 with high temperature resistance. The protective layer can withstand a high temperature of at least 160°C (such as: 160-300°C), and the thickness change rate of the protective layer before and after hot pressing can be less than 5%. In this embodiment, the protective layer 111 is formed by a resin composition, and the resin composition includes: an alkali-soluble filler; an alkali-soluble resin; a solvent; and a photoinitiator. In the present invention, the resin composition may be a photosensitive resin composition.

於本發明中,該該鹼可溶填充劑之實例包含但不限於:氧化鋅(ZnO)、氫氧化鋁(Al(OH) 3)、二氧化鈦(TiO 2)、三氧化二銻 (Sb 2O 3)、氫氧化鈹(Be(OH) 2)。該些鹼可溶填充劑可單獨使用或組合二種以上(諸如:三種、四種)使用。於較佳實施態樣中,該鹼可溶填充劑之粒徑為0.1微米~10微米,諸如:1微米~9微米、3微米~7微米。於較佳實施態樣中,該鹼可溶填充劑占該樹脂組成物總重之50~90重量%。 In the present invention, examples of the alkali-soluble filler include, but are not limited to: zinc oxide (ZnO), aluminum hydroxide (Al(OH) 3 ), titanium dioxide (TiO 2 ), antimony trioxide (Sb 2 O 3 ), beryllium hydroxide (Be(OH) 2 ). These alkali-soluble fillers can be used individually or in combination of 2 or more types (for example, 3 types, 4 types). In a preferred embodiment, the particle size of the alkali-soluble filler is 0.1 micron to 10 micron, such as: 1 micron to 9 micron, 3 micron to 7 micron. In a preferred embodiment, the alkali-soluble filler accounts for 50-90% by weight of the total weight of the resin composition.

於本發明中,該鹼可溶樹脂之功能之一乃係作為潤濕劑。該鹼可溶樹脂可為易溶於鹼性溶液之樹脂。考量鹼可溶樹脂對於鹼性溶液之溶解性,該鹼可溶樹脂係具有鹼可溶性之官能基(諸如:羧基)。該鹼可溶性樹脂所含之羧基之量以酸價計可為20~200mgKOH/g,較佳為45~120mgKOH/g。考量顯影性及剝離性,該鹼可溶樹脂必須具有羧基。進一步考量提高耐顯影性、解像性及密接性之觀點,該具有羧基之鹼可溶樹脂之酸價較佳為30mgKOH/g以上,更佳為50mgKOH/g以上。另一方面,考量提高顯影性及剝離性之觀點,該具有羧基之鹼可溶性樹脂之酸價較佳為200mgKOH/g以下,更佳為120mgKOH/g以下。鹼可溶性樹脂之實例包含但不限於:聚醯亞胺、聚醯胺酸、酚醛樹脂、其組合。亦即,該些鹼可溶性樹脂可單獨使用或組合二種以上使用。考量提高解像性及顯影性,該鹼可溶性樹脂之重量平均分子量較佳係5,000~300,000,更佳係重量平均分子量為5,000~100,000,特佳係5,000~50,000以下。In the present invention, one of the functions of the alkali-soluble resin is as a wetting agent. The alkali-soluble resin may be a resin that is easily soluble in alkaline solution. Considering the solubility of the alkali-soluble resin to the alkaline solution, the alkali-soluble resin has alkali-soluble functional groups (such as carboxyl groups). The amount of carboxyl groups contained in the alkali-soluble resin may be 20-200 mgKOH/g in terms of acid value, preferably 45-120 mgKOH/g. In consideration of developability and peelability, the alkali-soluble resin must have a carboxyl group. Further considering the viewpoints of improving development resistance, resolution and adhesion, the acid value of the alkali-soluble resin having a carboxyl group is preferably at least 30 mgKOH/g, more preferably at least 50 mgKOH/g. On the other hand, the acid value of the alkali-soluble resin having a carboxyl group is preferably 200 mgKOH/g or less, more preferably 120 mgKOH/g or less, from the viewpoint of improving developability and peelability. Examples of alkali soluble resins include, but are not limited to: polyimides, polyamic acid, phenolic resins, combinations thereof. That is, these alkali-soluble resins can be used individually or in combination of 2 or more types. In consideration of improving resolution and developability, the weight average molecular weight of the alkali-soluble resin is preferably 5,000-300,000, more preferably 5,000-100,000, and most preferably 5,000-50,000 or less.

該溶劑之實例包含但不限於:N-甲基-2-吡咯烷酮、N,N-二甲基乙醯胺、γ-丁內酯、二甲苯、甲苯、其組合。亦即,該些溶劑可單獨使用或組合二種以上(諸如:三種、四種)使用。Examples of the solvent include, but are not limited to: N-methyl-2-pyrrolidone, N,N-dimethylacetamide, γ-butyrolactone, xylene, toluene, combinations thereof. That is, these solvents may be used alone or in combination of two or more (such as three or four).

於本發明中,該光起始劑可為雙(2,4,6-三甲基苯甲醯基)苯基氧化磷、2,4,6-三甲基苯甲醯基-二苯基氧化磷或其組合,但不限於此。該些光起始劑可單獨使用或組合二種以上(諸如:三種、四種)使用。該些光起始劑可與交聯劑組合使用,以進行光刻法圖形化。In the present invention, the photoinitiator can be bis(2,4,6-trimethylbenzoyl)phenyl phosphorus oxide, 2,4,6-trimethylbenzoyl-diphenyl Phosphorus oxide or combinations thereof, but not limited thereto. These photoinitiators can be used alone or in combination of two or more (such as three or four). These photoinitiators can be used in combination with crosslinkers for photolithographic patterning.

於覆蓋保護層111之後,如第1C圖所示,壓合一第二介質層210於該第二部分上,以使該第二介質層210覆蓋該第二部分。於本發明中,該第二介質層210可為未固化或半固化之固化性樹脂材料(諸如:熱固化性樹脂材料)。於本實施例中,利用熱壓合使預先形成有一第一開口210A之第二介質層210壓合於該第一線路板之第二部分上,而該第一開口210A可使保護層111之表面於該第二介質層210壓合於該第二部分後完整暴露出。壓合期間,熱固化性樹脂材料(即第二介質層210)會外流一部分之熱固化性樹脂材料,而於第二介質層210之側邊形成樹脂擴散層211。於壓合後,該擴散層則因受熱而固化。於本發明中,發明人無預期發現,使用如上所述之樹脂組成物,可使該組成物所形成之樹脂擴散層211之寬度被抑制於一定範圍內,而可避免:(1)樹脂擴散層之寬度過大,而覆蓋到金屬線路,導致製程不良;及(2)樹脂擴散層211與該保護層111接觸,以致該保護層111於後端製程無法以鹼性溶液移除。因此,於本發明中,該樹脂擴散層211與該保護層111於第一介質層110上之間距係大於0 mm。較佳地,該間距係大於0mm,小於0.5mm。於本發明中,該保護層之高度H 1與該第二介質層之高度H 2之比例較佳為1.0:1.0~1.0:1.5。於本實施例係以H 1:H 2為1:1作為例示。於本發明中,該保護層邊緣角度較佳係大於70度。所謂邊緣角度係指保護層111邊緣切線與水平線之夾角。 After covering the protection layer 111 , as shown in FIG. 1C , a second dielectric layer 210 is pressed on the second portion so that the second dielectric layer 210 covers the second portion. In the present invention, the second dielectric layer 210 may be an uncured or semi-cured curable resin material (such as a thermosetting resin material). In this embodiment, the second dielectric layer 210 preformed with a first opening 210A is pressed on the second part of the first circuit board by thermocompression, and the first opening 210A can make the protection layer 111 The surface is completely exposed after the second dielectric layer 210 is pressed onto the second part. During the lamination process, part of the thermosetting resin material (that is, the second dielectric layer 210 ) will flow out to form a resin diffusion layer 211 on the side of the second dielectric layer 210 . After pressing, the diffusion layer is cured by heat. In the present invention, the inventors did not expect to find that using the above-mentioned resin composition, the width of the resin diffusion layer 211 formed by the composition can be suppressed within a certain range, and the following can be avoided: (1) resin diffusion The width of the layer is too large to cover the metal circuit, resulting in a poor process; and (2) the resin diffusion layer 211 is in contact with the protective layer 111, so that the protective layer 111 cannot be removed with an alkaline solution in the back-end process. Therefore, in the present invention, the distance between the resin diffusion layer 211 and the protection layer 111 on the first dielectric layer 110 is greater than 0 mm. Preferably, the distance is greater than 0mm and less than 0.5mm. In the present invention, the ratio of the height H 1 of the protection layer to the height H 2 of the second dielectric layer is preferably 1.0:1.0˜1.0:1.5. In this embodiment, the ratio of H 1 :H 2 is 1:1 as an example. In the present invention, the edge angle of the protection layer is preferably greater than 70 degrees. The so-called edge angle refers to the angle between the tangent line of the edge of the protective layer 111 and the horizontal line.

於壓合該第二介質層210後,如第1D圖所示,形成一覆蓋層310於該第一介質層之該第一表面110a上,以覆蓋該保護層111之表面及該第二介質層210之表面。於本實施例中,該覆蓋層310完整覆蓋該第二介質層210及其開口(即上文提及之預先形成之第一開口210A)。於本發明中,該覆蓋層可為有機物或無機物。於較佳實施態樣中,該覆蓋層310為線路板(第二線路板),如此即可獲致一 種多層線路板。After laminating the second dielectric layer 210, as shown in FIG. 1D, a cover layer 310 is formed on the first surface 110a of the first dielectric layer to cover the surface of the protective layer 111 and the second dielectric layer. The surface of layer 210. In this embodiment, the covering layer 310 completely covers the second dielectric layer 210 and its opening (ie, the pre-formed first opening 210A mentioned above). In the present invention, the covering layer can be organic or inorganic. In a preferred embodiment, the cover layer 310 is a circuit board (second circuit board), so that a multilayer circuit board can be obtained.

於形成覆蓋層310之後,如第1E圖所示,於該覆蓋層310中形成一第二開口310A,以暴露出該保護層111。於本發明中,該第二開口310A之尺寸與該第一開口之尺寸可為相同或不同。於較佳實施態樣中,該第二開口之尺寸與該第一開口之尺寸實質上相同。於本實施例中,利用雷射切割去除一部分之覆蓋層,而該部分之覆蓋層係位於保護層111之上方,以致使其被移除後,可使該保護層111部分或完整暴露出。該部分之覆蓋層移除後,即會形成一第二開口310A,而於本實施例中,該第二開口之尺寸與該第一開口之尺寸相同。After the covering layer 310 is formed, as shown in FIG. 1E , a second opening 310A is formed in the covering layer 310 to expose the protective layer 111 . In the present invention, the size of the second opening 310A and the size of the first opening may be the same or different. In a preferred embodiment, the size of the second opening is substantially the same as that of the first opening. In this embodiment, a portion of the covering layer is removed by laser cutting, and the portion of the covering layer is located above the protection layer 111 , so that after it is removed, the protection layer 111 can be partially or completely exposed. After the part of the covering layer is removed, a second opening 310A is formed, and in this embodiment, the size of the second opening is the same as that of the first opening.

如第1F圖所示,該保護層111完整暴露出後,再以鹼性溶液移除該保護層111。於本發明中,該鹼性溶液可為3~5%之鹼金屬氫氧化物水溶液。該移除步驟係於35~60℃下進行。依照上述製造方法製得之印刷電路板之上視圖如第二圖所示,其中虛線區域係用以呈現第1E圖中保護層111所覆蓋之區域。As shown in FIG. 1F , after the protective layer 111 is completely exposed, the protective layer 111 is removed with an alkaline solution. In the present invention, the alkaline solution can be a 3-5% aqueous alkali metal hydroxide solution. The removal step is carried out at 35-60°C. The top view of the printed circuit board manufactured according to the above-mentioned manufacturing method is shown in FIG. 2 , where the dotted line area is used to represent the area covered by the protective layer 111 in FIG. 1E .

基於上述製造方法,本發明另提供一種具保護層之印刷電路板。如第1E圖所示,該具保護層之印刷電路板10係包含:第一電路板100,其包含:一第一介質層110及一金屬線路結構120,其中該金屬線路結構120係形成於該第一介質層110之一表面上,且該金屬線路結構120係包含一第一部分及一第二部分;一保護層111,覆蓋於該第一部分上;一第二介質層210,覆蓋於該第二部分上;其中,該保護層111為鹼可溶者,且為樹脂組成物所形成者,該樹脂組成物係包含:鹼可溶填充劑;鹼可溶樹脂;溶劑;及光起始劑。Based on the above manufacturing method, the present invention further provides a printed circuit board with a protective layer. As shown in Figure 1E, the printed circuit board 10 with a protective layer includes: a first circuit board 100, which includes: a first dielectric layer 110 and a metal wiring structure 120, wherein the metal wiring structure 120 is formed on On one surface of the first dielectric layer 110, and the metal circuit structure 120 comprises a first part and a second part; a protective layer 111 covers the first part; a second dielectric layer 210 covers the On the second part; wherein, the protective layer 111 is alkali-soluble and is formed of a resin composition, and the resin composition system includes: an alkali-soluble filler; an alkali-soluble resin; a solvent; and a photoinitiator agent.

於本實施例中,該具保護層之印刷電路板尚包含一覆蓋層310,該覆蓋層310係與該第二介質層210接觸而形成於其上。請參閱第二圖,於本實施例中,該覆蓋層310與該第二介質層210均將該保護層111(未顯示,僅以虛線顯示第一部分之位置)圍繞於其中。In this embodiment, the printed circuit board with protective layer further includes a cover layer 310 , and the cover layer 310 is formed on the second dielectric layer 210 in contact with it. Please refer to the second figure, in this embodiment, the cover layer 310 and the second dielectric layer 210 both surround the protection layer 111 (not shown, only the position of the first part is shown by a dotted line).

自上可知,本發明之保護層僅須利用鹼性溶液即可移除,無須利用繁雜之雷射切割或物理剝除來移除保護層,相較於習知技術,可大幅簡化製程,可提供一種製造工藝簡單、操作方便及節約成本之印刷電路板之製造方法。It can be seen from the above that the protective layer of the present invention can be removed only by using an alkaline solution, without complicated laser cutting or physical stripping to remove the protective layer. Compared with the conventional technology, the manufacturing process can be greatly simplified, and the A method for manufacturing a printed circuit board with simple manufacturing process, convenient operation and cost saving is provided.

以上所述僅是本發明的優選實施方式,並不用於限制本發明,應當指出,對於本技術領域的普通技術人員來說,在不脫離本發明技術原理的前提下,還可以做出若干改進和變型,這些改進和變型也應視為本發明的保護範圍。The above is only a preferred embodiment of the present invention, and is not intended to limit the present invention. It should be pointed out that for those of ordinary skill in the art, some improvements can be made without departing from the technical principle of the present invention. and modifications, these improvements and modifications should also be considered as the protection scope of the present invention.

10:本發明之印刷電路板 110:第一介質層 110a:第一表面 110b:第二表面 120:金屬線路結構 d:第一部分與第二部分之間的最短距離 111:保護層 H 1:保護層之高度 210:第二介質層 210A:第一開口 211:樹脂擴散層 H 2:第二介質層之高度 310:覆蓋層 310A:第二開口10: Printed circuit board 110 of the present invention: first dielectric layer 110a: first surface 110b: second surface 120: metal circuit structure d: shortest distance between the first part and the second part 111: protective layer H 1 : protection Layer height 210: second dielectric layer 210A: first opening 211: resin diffusion layer H 2 : height 310 of second dielectric layer: cover layer 310A: second opening

第1A圖至第1F圖為本發明一實施例之印刷電路板之製造方法的流程示意圖。1A to 1F are schematic flow charts of a method for manufacturing a printed circuit board according to an embodiment of the present invention.

第二圖為依據本發明一實施例之製造方法製得之印刷電路板之上視示意圖。The second figure is a schematic top view of a printed circuit board manufactured by a manufacturing method according to an embodiment of the present invention.

none

120:金屬電路結構 120: Metal circuit structure

211:樹脂擴散層 211: resin diffusion layer

310:覆蓋層 310: Overlay

310A:第二開口 310A: second opening

Claims (14)

一種印刷電路板之製造方法,其包含以下步驟: 提供一第一線路板,其包含:一第一介質層及一金屬線路結構,其中該金屬線路結構係形成於該第一介質層之一表面上,且該金屬線路結構係包含一第一部分及一第二部分; 覆蓋一保護層於該第一部分上; 壓合一第二介質層於該第二部分上,以使該第二介質層覆蓋於該第二部分; 形成一覆蓋層於該第一介質層之該表面上,以覆蓋該保護層之表面及該第二介質層之表面; 於該覆蓋層中形成一開口,以暴露出該保護層; 以鹼性溶液移除該保護層, 其中,該保護層為樹脂組成物所形成者,該樹脂組成物係包含:鹼可溶填充劑;鹼可溶樹脂;溶劑;及光起始劑。 A method of manufacturing a printed circuit board, comprising the following steps: A first circuit board is provided, comprising: a first dielectric layer and a metal circuit structure, wherein the metal circuit structure is formed on one surface of the first dielectric layer, and the metal circuit structure comprises a first part and - the second part; covering a protective layer on the first part; pressing a second dielectric layer on the second part, so that the second dielectric layer covers the second part; forming a covering layer on the surface of the first dielectric layer to cover the surface of the protection layer and the surface of the second dielectric layer; forming an opening in the cover layer to expose the protection layer; This protective layer is removed with an alkaline solution, Wherein, the protective layer is formed by a resin composition, and the resin composition includes: an alkali-soluble filler; an alkali-soluble resin; a solvent; and a photoinitiator. 如請求項1所述之製造方法,其中該鹼可溶填充劑包含氧化鋅、氫氧化鋁、二氧化鈦、三氧化二銻或氫氧化鈹。The manufacturing method according to claim 1, wherein the alkali-soluble filler includes zinc oxide, aluminum hydroxide, titanium dioxide, antimony trioxide or beryllium hydroxide. 如請求項1所述之製造方法,其中該鹼可溶填充劑之粒徑0.1微米~10微米。The manufacturing method according to claim 1, wherein the particle size of the alkali-soluble filler is 0.1 micron to 10 micron. 如請求項1所述之製造方法,其中該鹼可溶填充劑占該樹脂組成物總重之50~90重量%。The manufacturing method according to claim 1, wherein the alkali-soluble filler accounts for 50-90% by weight of the total weight of the resin composition. 如請求項1所述之製造方法,其中該鹼可溶樹脂包含聚醯亞胺、聚醯胺酸或酚醛樹脂。The manufacturing method according to claim 1, wherein the alkali-soluble resin comprises polyimide, polyamic acid or phenolic resin. 如請求項1所述之製造方法,其中該第一介質層包含未固化或半固化之熱固化樹脂材料。The manufacturing method according to claim 1, wherein the first dielectric layer comprises an uncured or semi-cured thermosetting resin material. 如請求項1所述之製造方法,其中該第二介質層包含未固化或半固化之固化性樹脂材料。The manufacturing method according to claim 1, wherein the second dielectric layer comprises uncured or semi-cured curable resin material. 如請求項1所述之製造方法,其中該第二介質層覆蓋於該第二部分後,會於該第二介質層之側邊形成一樹脂擴散層。The manufacturing method according to claim 1, wherein after the second dielectric layer covers the second portion, a resin diffusion layer is formed on the side of the second dielectric layer. 如請求項1所述之製造方法,其中該覆蓋層包含線路板。The manufacturing method according to claim 1, wherein the covering layer includes a circuit board. 如請求項1所述之製造方法,其中該鹼性溶液為3~5%之鹼金屬氫氧化物水溶液。The manufacturing method as described in Claim 1, wherein the alkaline solution is a 3-5% aqueous alkali metal hydroxide solution. 一種具保護層之印刷電路板,其包含: 第一電路板,其包含:一第一介質層及一金屬線路結構,其中該金屬線路結構係形成於該第一介質層之一表面上,且該金屬線路結構係包含一第一部分及一第二部分; 一保護層,覆蓋於該第一部分上; 一第二介質層,覆蓋於該第二部分上; 其中,該保護層為鹼可溶者,且為樹脂組成物所形成者,該樹脂組成物係包含:鹼可溶填充劑;鹼可溶樹脂;溶劑;及光起始劑。 A printed circuit board with a protective layer, comprising: A first circuit board, which includes: a first dielectric layer and a metal wiring structure, wherein the metal wiring structure is formed on one surface of the first dielectric layer, and the metal wiring structure includes a first portion and a first wiring structure two parts; a protective layer covering the first part; a second dielectric layer covering the second portion; Wherein, the protective layer is alkali-soluble and formed by resin composition, and the resin composition system includes: alkali-soluble filler; alkali-soluble resin; solvent; and photoinitiator. 如請求項11所述之印刷電路板,其進一步包含一覆蓋層,該覆蓋層係與該第二介質層接觸而形成於其上。The printed circuit board as claimed in claim 11, further comprising a cover layer, the cover layer is formed on the second dielectric layer in contact with it. 如請求項12所述之印刷電路板,其中該覆蓋層與該第二介質層均將該保護層圍繞於其中。The printed circuit board as claimed in claim 12, wherein both the covering layer and the second dielectric layer surround the protective layer. 如請求項11所述之印刷電路板,其進一步包含一樹脂擴散層,該樹脂擴散層係設置於該第二介質層之側邊。The printed circuit board according to claim 11, further comprising a resin diffusion layer disposed on the side of the second dielectric layer.
TW110122462A 2021-06-18 2021-06-18 Method for manufacturing printed circuit board and printed circuit board with protective layer TWI780783B (en)

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TW201504760A (en) * 2013-06-17 2015-02-01 Lg Chemical Ltd Photo-curable and thermosetting resin composition, dry film solder resist manufactured therefrom, and circuit board including the solder resist
CN107846786A (en) * 2013-06-14 2018-03-27 三菱制纸株式会社 The manufacture method of circuit board
TW201934688A (en) * 2018-01-30 2019-09-01 臻鼎科技股份有限公司 Method for making printed circuit board, and photosensitive resin composition
TW202039660A (en) * 2019-01-28 2020-11-01 日商三菱製紙股份有限公司 Etching solution of resin composition and etching method

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JP3968236B2 (en) * 2001-11-30 2007-08-29 株式会社カネカ Photosensitive coverlay film
KR101462724B1 (en) * 2012-09-27 2014-11-17 삼성전기주식회사 Manufacturing method of rigid flexible printed circuit board
KR102457598B1 (en) * 2014-06-12 2022-10-21 다이요 잉키 세이조 가부시키가이샤 Curable resin composition, dry film, cured product, and printed wiring board

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CN107846786A (en) * 2013-06-14 2018-03-27 三菱制纸株式会社 The manufacture method of circuit board
TW201504760A (en) * 2013-06-17 2015-02-01 Lg Chemical Ltd Photo-curable and thermosetting resin composition, dry film solder resist manufactured therefrom, and circuit board including the solder resist
TW201934688A (en) * 2018-01-30 2019-09-01 臻鼎科技股份有限公司 Method for making printed circuit board, and photosensitive resin composition
TW202039660A (en) * 2019-01-28 2020-11-01 日商三菱製紙股份有限公司 Etching solution of resin composition and etching method

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