TWI776205B - Photosensitive colored composition - Google Patents
Photosensitive colored composition Download PDFInfo
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- TWI776205B TWI776205B TW109127386A TW109127386A TWI776205B TW I776205 B TWI776205 B TW I776205B TW 109127386 A TW109127386 A TW 109127386A TW 109127386 A TW109127386 A TW 109127386A TW I776205 B TWI776205 B TW I776205B
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- pigment
- mass
- ring
- acid
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- 239000000203 mixture Substances 0.000 title claims abstract description 163
- -1 oxime ester compound Chemical class 0.000 claims abstract description 213
- 125000006850 spacer group Chemical group 0.000 claims abstract description 91
- 150000001875 compounds Chemical class 0.000 claims abstract description 80
- 239000002270 dispersing agent Substances 0.000 claims abstract description 77
- 229920005989 resin Polymers 0.000 claims abstract description 71
- 239000011347 resin Substances 0.000 claims abstract description 71
- 239000003086 colorant Substances 0.000 claims abstract description 56
- 239000002904 solvent Substances 0.000 claims abstract description 49
- 239000003999 initiator Substances 0.000 claims abstract description 32
- 238000004040 coloring Methods 0.000 claims description 182
- 239000000049 pigment Substances 0.000 claims description 148
- 125000001424 substituent group Chemical group 0.000 claims description 71
- 239000006229 carbon black Substances 0.000 claims description 54
- 125000000217 alkyl group Chemical group 0.000 claims description 45
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 34
- 125000003118 aryl group Chemical group 0.000 claims description 33
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 33
- 125000001624 naphthyl group Chemical group 0.000 claims description 33
- 238000000576 coating method Methods 0.000 claims description 27
- 239000001055 blue pigment Substances 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 24
- 230000003287 optical effect Effects 0.000 claims description 21
- 239000001053 orange pigment Substances 0.000 claims description 20
- 239000001054 red pigment Substances 0.000 claims description 19
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 11
- 125000001188 haloalkyl group Chemical group 0.000 claims description 11
- 239000001057 purple pigment Substances 0.000 claims description 10
- 238000000206 photolithography Methods 0.000 claims description 7
- 150000001335 aliphatic alkanes Chemical group 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 abstract description 12
- 230000000694 effects Effects 0.000 abstract description 8
- 239000003513 alkali Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 80
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 53
- 235000019241 carbon black Nutrition 0.000 description 53
- 239000000178 monomer Substances 0.000 description 51
- 239000006185 dispersion Substances 0.000 description 42
- 125000004432 carbon atom Chemical group C* 0.000 description 39
- 239000010408 film Substances 0.000 description 39
- 239000000126 substance Substances 0.000 description 37
- 229920000642 polymer Polymers 0.000 description 36
- 239000000758 substrate Substances 0.000 description 36
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 35
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 35
- 239000002253 acid Substances 0.000 description 34
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 33
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 31
- 239000003822 epoxy resin Substances 0.000 description 28
- 229920000647 polyepoxide Polymers 0.000 description 28
- 239000000975 dye Substances 0.000 description 26
- 230000035945 sensitivity Effects 0.000 description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 24
- 239000007787 solid Substances 0.000 description 24
- 244000172533 Viola sororia Species 0.000 description 22
- 125000005843 halogen group Chemical group 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 21
- 125000000524 functional group Chemical group 0.000 description 21
- 239000004973 liquid crystal related substance Substances 0.000 description 21
- 238000006116 polymerization reaction Methods 0.000 description 19
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 239000012860 organic pigment Substances 0.000 description 18
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 17
- 238000011161 development Methods 0.000 description 17
- 150000002009 diols Chemical class 0.000 description 17
- 239000004593 Epoxy Substances 0.000 description 16
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 16
- 238000009835 boiling Methods 0.000 description 16
- 230000018109 developmental process Effects 0.000 description 16
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 16
- 239000003960 organic solvent Substances 0.000 description 16
- 239000002245 particle Substances 0.000 description 16
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 16
- 125000003545 alkoxy group Chemical group 0.000 description 15
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 15
- 239000004094 surface-active agent Substances 0.000 description 15
- 150000003512 tertiary amines Chemical class 0.000 description 15
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 14
- 150000004945 aromatic hydrocarbons Chemical group 0.000 description 14
- 239000002585 base Substances 0.000 description 14
- 229920001400 block copolymer Polymers 0.000 description 14
- 229920001577 copolymer Polymers 0.000 description 14
- 150000001412 amines Chemical class 0.000 description 13
- 229910052799 carbon Inorganic materials 0.000 description 13
- 239000007788 liquid Substances 0.000 description 13
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 13
- 230000035515 penetration Effects 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 12
- 239000004925 Acrylic resin Substances 0.000 description 12
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 12
- 229920000877 Melamine resin Polymers 0.000 description 12
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 12
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 150000008064 anhydrides Chemical class 0.000 description 12
- 125000003710 aryl alkyl group Chemical group 0.000 description 12
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 12
- 150000003839 salts Chemical class 0.000 description 12
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- 125000003277 amino group Chemical group 0.000 description 11
- 238000001035 drying Methods 0.000 description 11
- 150000002148 esters Chemical class 0.000 description 11
- 150000007519 polyprotic acids Polymers 0.000 description 11
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 11
- 150000008065 acid anhydrides Chemical class 0.000 description 10
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 10
- 229910052791 calcium Inorganic materials 0.000 description 10
- 230000002349 favourable effect Effects 0.000 description 10
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 10
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 239000011734 sodium Substances 0.000 description 10
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 9
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 9
- 239000004721 Polyphenylene oxide Substances 0.000 description 9
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 9
- 239000011324 bead Substances 0.000 description 9
- 239000003054 catalyst Substances 0.000 description 9
- 230000007423 decrease Effects 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 9
- 125000004433 nitrogen atom Chemical group N* 0.000 description 9
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 9
- 229920000570 polyether Polymers 0.000 description 9
- 239000005056 polyisocyanate Substances 0.000 description 9
- 229920001228 polyisocyanate Polymers 0.000 description 9
- 229910052708 sodium Inorganic materials 0.000 description 9
- 238000002834 transmittance Methods 0.000 description 9
- 239000006087 Silane Coupling Agent Substances 0.000 description 8
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 8
- 238000004132 cross linking Methods 0.000 description 8
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 8
- 125000000623 heterocyclic group Chemical group 0.000 description 8
- 239000011976 maleic acid Substances 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 7
- 239000003431 cross linking reagent Substances 0.000 description 7
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 238000010550 living polymerization reaction Methods 0.000 description 7
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 230000001235 sensitizing effect Effects 0.000 description 7
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 7
- 150000003458 sulfonic acid derivatives Chemical class 0.000 description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 150000001298 alcohols Chemical class 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 125000000129 anionic group Chemical group 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 125000002883 imidazolyl group Chemical group 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 125000000962 organic group Chemical group 0.000 description 6
- 229920000058 polyacrylate Polymers 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 238000001029 thermal curing Methods 0.000 description 6
- 238000004448 titration Methods 0.000 description 6
- 125000003944 tolyl group Chemical group 0.000 description 6
- 239000013638 trimer Substances 0.000 description 6
- 230000037303 wrinkles Effects 0.000 description 6
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical group NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 5
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 5
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 5
- 239000007983 Tris buffer Substances 0.000 description 5
- 125000002252 acyl group Chemical group 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 5
- 125000005605 benzo group Chemical group 0.000 description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 5
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 5
- 150000001735 carboxylic acids Chemical class 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 125000001309 chloro group Chemical group Cl* 0.000 description 5
- 238000007334 copolymerization reaction Methods 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
- 125000000392 cycloalkenyl group Chemical group 0.000 description 5
- 125000000753 cycloalkyl group Chemical group 0.000 description 5
- 238000005886 esterification reaction Methods 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 5
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 230000000149 penetrating effect Effects 0.000 description 5
- 125000001639 phenylmethylene group Chemical group [H]C(=*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 5
- 229920001451 polypropylene glycol Polymers 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- 125000003107 substituted aryl group Chemical group 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 4
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 4
- 150000004056 anthraquinones Chemical class 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 150000007514 bases Chemical class 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 238000012661 block copolymerization Methods 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 4
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 4
- 230000032050 esterification Effects 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- UHOKSCJSTAHBSO-UHFFFAOYSA-N indanthrone blue Chemical class C1=CC=C2C(=O)C3=CC=C4NC5=C6C(=O)C7=CC=CC=C7C(=O)C6=CC=C5NC4=C3C(=O)C2=C1 UHOKSCJSTAHBSO-UHFFFAOYSA-N 0.000 description 4
- 125000001041 indolyl group Chemical group 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- 125000005647 linker group Chemical group 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- BHIWKHZACMWKOJ-UHFFFAOYSA-N methyl isobutyrate Chemical compound COC(=O)C(C)C BHIWKHZACMWKOJ-UHFFFAOYSA-N 0.000 description 4
- 239000002736 nonionic surfactant Substances 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical group C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 4
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 4
- 229920001610 polycaprolactone Polymers 0.000 description 4
- 239000004632 polycaprolactone Substances 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 125000005581 pyrene group Chemical group 0.000 description 4
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 4
- 125000000547 substituted alkyl group Chemical group 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 4
- 150000003852 triazoles Chemical group 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 3
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 3
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 3
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 239000013543 active substance Substances 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- 239000002280 amphoteric surfactant Substances 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 125000006267 biphenyl group Chemical group 0.000 description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 3
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 3
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 238000002296 dynamic light scattering Methods 0.000 description 3
- 239000001530 fumaric acid Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 150000002440 hydroxy compounds Chemical class 0.000 description 3
- 239000001023 inorganic pigment Substances 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229920002521 macromolecule Polymers 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 150000003141 primary amines Chemical class 0.000 description 3
- 125000003226 pyrazolyl group Chemical group 0.000 description 3
- 125000000714 pyrimidinyl group Chemical group 0.000 description 3
- 125000001453 quaternary ammonium group Chemical group 0.000 description 3
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 3
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000542 sulfonic acid group Chemical group 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 description 3
- 238000005829 trimerization reaction Methods 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- CSNIZNHTOVFARY-UHFFFAOYSA-N 1,2-benzothiazole Chemical group C1=CC=C2C=NSC2=C1 CSNIZNHTOVFARY-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical group C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical group C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- LRMMVQKUKLVVFR-UHFFFAOYSA-N 1-methoxyhexan-3-one Chemical compound CCCC(=O)CCOC LRMMVQKUKLVVFR-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- AOPDRZXCEAKHHW-UHFFFAOYSA-N 1-pentoxypentane Chemical compound CCCCCOCCCCC AOPDRZXCEAKHHW-UHFFFAOYSA-N 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- DEPDDPLQZYCHOH-UHFFFAOYSA-N 1h-imidazol-2-amine Chemical compound NC1=NC=CN1 DEPDDPLQZYCHOH-UHFFFAOYSA-N 0.000 description 2
- AVRPFRMDMNDIDH-UHFFFAOYSA-N 1h-quinazolin-2-one Chemical group C1=CC=CC2=NC(O)=NC=C21 AVRPFRMDMNDIDH-UHFFFAOYSA-N 0.000 description 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 2
- FWLHAQYOFMQTHQ-UHFFFAOYSA-N 2-N-[8-[[8-(4-aminoanilino)-10-phenylphenazin-10-ium-2-yl]amino]-10-phenylphenazin-10-ium-2-yl]-8-N,10-diphenylphenazin-10-ium-2,8-diamine hydroxy-oxido-dioxochromium Chemical compound O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.Nc1ccc(Nc2ccc3nc4ccc(Nc5ccc6nc7ccc(Nc8ccc9nc%10ccc(Nc%11ccccc%11)cc%10[n+](-c%10ccccc%10)c9c8)cc7[n+](-c7ccccc7)c6c5)cc4[n+](-c4ccccc4)c3c2)cc1 FWLHAQYOFMQTHQ-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- NTYQWXQLHWROSQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2,2,2-tris(sulfanyl)acetic acid Chemical compound OC(=O)C(S)(S)S.CCC(CO)(CO)CO NTYQWXQLHWROSQ-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- MPAGVACEWQNVQO-UHFFFAOYSA-N 3-acetyloxybutyl acetate Chemical compound CC(=O)OC(C)CCOC(C)=O MPAGVACEWQNVQO-UHFFFAOYSA-N 0.000 description 2
- KDHWOCLBMVSZPG-UHFFFAOYSA-N 3-imidazol-1-ylpropan-1-amine Chemical compound NCCCN1C=CN=C1 KDHWOCLBMVSZPG-UHFFFAOYSA-N 0.000 description 2
- IRQWEODKXLDORP-UHFFFAOYSA-N 4-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1 IRQWEODKXLDORP-UHFFFAOYSA-N 0.000 description 2
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000004641 Diallyl-phthalate Substances 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 239000005058 Isophorone diisocyanate Substances 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 2
- 229920000265 Polyparaphenylene Polymers 0.000 description 2
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical class N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 2
- 241000872198 Serjania polyphylla Species 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 239000006230 acetylene black Substances 0.000 description 2
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 125000005577 anthracene group Chemical group 0.000 description 2
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 125000003828 azulenyl group Chemical group 0.000 description 2
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 2
- 210000000988 bone and bone Anatomy 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- 210000002858 crystal cell Anatomy 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 125000003914 fluoranthenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC=C4C1=C23)* 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- ZTYYDUBWJTUMHW-UHFFFAOYSA-N furo[3,2-b]furan Chemical group O1C=CC2=C1C=CO2 ZTYYDUBWJTUMHW-UHFFFAOYSA-N 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000001056 green pigment Substances 0.000 description 2
- 125000004438 haloalkoxy group Chemical group 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 description 2
- 238000010191 image analysis Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 235000019239 indanthrene blue RS Nutrition 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- RGFNRWTWDWVHDD-UHFFFAOYSA-N isobutyl butyrate Chemical compound CCCC(=O)OCC(C)C RGFNRWTWDWVHDD-UHFFFAOYSA-N 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- WDAXFOBOLVPGLV-UHFFFAOYSA-N isobutyric acid ethyl ester Natural products CCOC(=O)C(C)C WDAXFOBOLVPGLV-UHFFFAOYSA-N 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- PXZQEOJJUGGUIB-UHFFFAOYSA-N isoindolin-1-one Chemical class C1=CC=C2C(=O)NCC2=C1 PXZQEOJJUGGUIB-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- 239000006233 lamp black Substances 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- CKFGINPQOCXMAZ-UHFFFAOYSA-N methanediol Chemical compound OCO CKFGINPQOCXMAZ-UHFFFAOYSA-N 0.000 description 2
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 2
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 2
- 150000002763 monocarboxylic acids Chemical class 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 2
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000002574 poison Substances 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920000921 polyethylene adipate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- MHOZZUICEDXVGD-UHFFFAOYSA-N pyrrolo[2,3-d]imidazole Chemical group C1=NC2=CC=NC2=N1 MHOZZUICEDXVGD-UHFFFAOYSA-N 0.000 description 2
- RQGPLDBZHMVWCH-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole Chemical group C1=NC2=CC=NC2=C1 RQGPLDBZHMVWCH-UHFFFAOYSA-N 0.000 description 2
- FYNROBRQIVCIQF-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole-5,6-dione Chemical class C1=CN=C2C(=O)C(=O)N=C21 FYNROBRQIVCIQF-UHFFFAOYSA-N 0.000 description 2
- GZTPJDLYPMPRDF-UHFFFAOYSA-N pyrrolo[3,2-c]pyrazole Chemical group N1=NC2=CC=NC2=C1 GZTPJDLYPMPRDF-UHFFFAOYSA-N 0.000 description 2
- 125000000168 pyrrolyl group Chemical group 0.000 description 2
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000001384 succinic acid Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000001302 tertiary amino group Chemical group 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- ONCNIMLKGZSAJT-UHFFFAOYSA-N thieno[3,2-b]furan Chemical group S1C=CC2=C1C=CO2 ONCNIMLKGZSAJT-UHFFFAOYSA-N 0.000 description 2
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical group S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 description 2
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 125000002348 vinylic group Chemical group 0.000 description 2
- 239000001052 yellow pigment Substances 0.000 description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
- NIDNOXCRFUCAKQ-UMRXKNAASA-N (1s,2r,3s,4r)-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1[C@H]2C=C[C@@H]1[C@H](C(=O)O)[C@@H]2C(O)=O NIDNOXCRFUCAKQ-UMRXKNAASA-N 0.000 description 1
- MAOBFOXLCJIFLV-UHFFFAOYSA-N (2-aminophenyl)-phenylmethanone Chemical compound NC1=CC=CC=C1C(=O)C1=CC=CC=C1 MAOBFOXLCJIFLV-UHFFFAOYSA-N 0.000 description 1
- WJTCHBVEUFDSIK-NWDGAFQWSA-N (2r,5s)-1-benzyl-2,5-dimethylpiperazine Chemical compound C[C@@H]1CN[C@@H](C)CN1CC1=CC=CC=C1 WJTCHBVEUFDSIK-NWDGAFQWSA-N 0.000 description 1
- RXCOGDYOZQGGMK-UHFFFAOYSA-N (3,4-diaminophenyl)-phenylmethanone Chemical compound C1=C(N)C(N)=CC=C1C(=O)C1=CC=CC=C1 RXCOGDYOZQGGMK-UHFFFAOYSA-N 0.000 description 1
- YLCILCNDLBSOIO-UHFFFAOYSA-N (3-prop-2-enoyloxyphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC(OC(=O)C=C)=C1 YLCILCNDLBSOIO-UHFFFAOYSA-N 0.000 description 1
- NBHVQGPEUMHOFE-UHFFFAOYSA-N (4-amino-2,3-diphenylphenyl)-phenylmethanone Chemical class C=1C=CC=CC=1C1=C(C=2C=CC=CC=2)C(N)=CC=C1C(=O)C1=CC=CC=C1 NBHVQGPEUMHOFE-UHFFFAOYSA-N 0.000 description 1
- NIUHGYUFFPSEOW-UHFFFAOYSA-N (4-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC=C(OC(=O)C=C)C=C1 NIUHGYUFFPSEOW-UHFFFAOYSA-N 0.000 description 1
- VPQAFOWBKWKVQQ-UHFFFAOYSA-N (4-methoxyphenyl)methyl-phenyliodanium Chemical compound C1=CC(OC)=CC=C1C[I+]C1=CC=CC=C1 VPQAFOWBKWKVQQ-UHFFFAOYSA-N 0.000 description 1
- QKAIFCSOWIMRJG-UHFFFAOYSA-N (4-methylphenyl)-(4-propan-2-ylphenyl)iodanium Chemical compound C1=CC(C(C)C)=CC=C1[I+]C1=CC=C(C)C=C1 QKAIFCSOWIMRJG-UHFFFAOYSA-N 0.000 description 1
- CIZFAASMIWNDTR-UHFFFAOYSA-N (4-methylphenyl)-[4-(2-methylpropyl)phenyl]iodanium Chemical compound C1=CC(CC(C)C)=CC=C1[I+]C1=CC=C(C)C=C1 CIZFAASMIWNDTR-UHFFFAOYSA-N 0.000 description 1
- JMMVHMOAIMOMOF-UHFFFAOYSA-N (4-prop-2-enoyloxyphenyl) prop-2-enoate Chemical group C=CC(=O)OC1=CC=C(OC(=O)C=C)C=C1 JMMVHMOAIMOMOF-UHFFFAOYSA-N 0.000 description 1
- STGNLGBPLOVYMA-TZKOHIRVSA-N (z)-but-2-enedioic acid Chemical class OC(=O)\C=C/C(O)=O.OC(=O)\C=C/C(O)=O STGNLGBPLOVYMA-TZKOHIRVSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- FNQJDLTXOVEEFB-UHFFFAOYSA-N 1,2,3-benzothiadiazole Chemical group C1=CC=C2SN=NC2=C1 FNQJDLTXOVEEFB-UHFFFAOYSA-N 0.000 description 1
- JWTGRKUQJXIWCV-UHFFFAOYSA-N 1,2,3-trihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(O)C(O)CO JWTGRKUQJXIWCV-UHFFFAOYSA-N 0.000 description 1
- QMMJWQMCMRUYTG-UHFFFAOYSA-N 1,2,4,5-tetrachloro-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=C(Cl)C(Cl)=CC(Cl)=C1Cl QMMJWQMCMRUYTG-UHFFFAOYSA-N 0.000 description 1
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- CVZBYEKCIDMLRV-UHFFFAOYSA-N 1,4-bis(methylsulfanyl)benzene Chemical compound CSC1=CC=C(SC)C=C1 CVZBYEKCIDMLRV-UHFFFAOYSA-N 0.000 description 1
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 description 1
- QGLRLXLDMZCFBP-UHFFFAOYSA-N 1,6-diisocyanato-2,4,4-trimethylhexane Chemical compound O=C=NCC(C)CC(C)(C)CCN=C=O QGLRLXLDMZCFBP-UHFFFAOYSA-N 0.000 description 1
- RHNNQENFSNOGAM-UHFFFAOYSA-N 1,8-diisocyanato-4-(isocyanatomethyl)octane Chemical compound O=C=NCCCCC(CN=C=O)CCCN=C=O RHNNQENFSNOGAM-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- LAVARTIQQDZFNT-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-yl acetate Chemical compound COCC(C)OCC(C)OC(C)=O LAVARTIQQDZFNT-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- RQQLOWXQARLAAX-UHFFFAOYSA-N 1-(2-methyl-3-sulfanylpropanoyl)oxybutyl 2-methyl-3-sulfanylpropanoate Chemical compound SCC(C)C(=O)OC(CCC)OC(=O)C(C)CS RQQLOWXQARLAAX-UHFFFAOYSA-N 0.000 description 1
- RSZHBVPYGJXEGF-UHFFFAOYSA-N 1-(2-sulfanylacetyl)oxybutyl 2-sulfanylacetate Chemical compound SCC(=O)OC(CCC)OC(=O)CS RSZHBVPYGJXEGF-UHFFFAOYSA-N 0.000 description 1
- BOGFHOWTVGAYFK-UHFFFAOYSA-N 1-[2-(2-propoxyethoxy)ethoxy]propane Chemical compound CCCOCCOCCOCCC BOGFHOWTVGAYFK-UHFFFAOYSA-N 0.000 description 1
- MHXFWEJMQVIWDH-UHFFFAOYSA-N 1-amino-4-hydroxy-2-phenoxyanthracene-9,10-dione Chemical compound C1=C(O)C=2C(=O)C3=CC=CC=C3C(=O)C=2C(N)=C1OC1=CC=CC=C1 MHXFWEJMQVIWDH-UHFFFAOYSA-N 0.000 description 1
- MKRBAPNEJMFMHU-UHFFFAOYSA-N 1-benzylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CC1=CC=CC=C1 MKRBAPNEJMFMHU-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- SQCZQTSHSZLZIQ-UHFFFAOYSA-N 1-chloropentane Chemical compound CCCCCCl SQCZQTSHSZLZIQ-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- RQUBQBFVDOLUKC-UHFFFAOYSA-N 1-ethoxy-2-methylpropane Chemical compound CCOCC(C)C RQUBQBFVDOLUKC-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 1
- BUKBWCVEUBSXJP-UHFFFAOYSA-N 1-hydroxybutyl 2,2-bis(sulfanyl)propanoate Chemical compound CCCC(O)OC(=O)C(C)(S)S BUKBWCVEUBSXJP-UHFFFAOYSA-N 0.000 description 1
- ONDSSKDTLGWNOJ-UHFFFAOYSA-N 1-methoxyhexan-2-ol Chemical compound CCCCC(O)COC ONDSSKDTLGWNOJ-UHFFFAOYSA-N 0.000 description 1
- PMUPSYZVABJEKC-UHFFFAOYSA-N 1-methylcyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1(C)CCCCC1C(O)=O PMUPSYZVABJEKC-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- GQCZPFJGIXHZMB-UHFFFAOYSA-N 1-tert-Butoxy-2-propanol Chemical compound CC(O)COC(C)(C)C GQCZPFJGIXHZMB-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- JCTXKRPTIMZBJT-UHFFFAOYSA-N 2,2,4-trimethylpentane-1,3-diol Chemical compound CC(C)C(O)C(C)(C)CO JCTXKRPTIMZBJT-UHFFFAOYSA-N 0.000 description 1
- SNTWKPAKVQFCCF-UHFFFAOYSA-N 2,3-dihydro-1h-triazole Chemical compound N1NC=CN1 SNTWKPAKVQFCCF-UHFFFAOYSA-N 0.000 description 1
- OWPUOLBODXJOKH-UHFFFAOYSA-N 2,3-dihydroxypropyl prop-2-enoate Chemical compound OCC(O)COC(=O)C=C OWPUOLBODXJOKH-UHFFFAOYSA-N 0.000 description 1
- FXNDIJDIPNCZQJ-UHFFFAOYSA-N 2,4,4-trimethylpent-1-ene Chemical compound CC(=C)CC(C)(C)C FXNDIJDIPNCZQJ-UHFFFAOYSA-N 0.000 description 1
- ZWNMRZQYWRLGMM-UHFFFAOYSA-N 2,5-dimethylhexane-2,5-diol Chemical compound CC(C)(O)CCC(C)(C)O ZWNMRZQYWRLGMM-UHFFFAOYSA-N 0.000 description 1
- KUMMBDBTERQYCG-UHFFFAOYSA-N 2,6-bis(hydroxymethyl)-4-methylphenol Chemical compound CC1=CC(CO)=C(O)C(CO)=C1 KUMMBDBTERQYCG-UHFFFAOYSA-N 0.000 description 1
- PQHRHABVSWOYPG-UHFFFAOYSA-N 2,9-dioxatricyclo[8.2.2.24,7]hexadeca-1(13),4,6,10(14),11,15-hexaene-3,8-dione Chemical compound O1C(=O)C(C=C2)=CC=C2C(=O)OC2=CC=C1C=C2 PQHRHABVSWOYPG-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- JUKSUBINMNCBNL-UHFFFAOYSA-N 2-(2-methyl-3-sulfanylpropanoyl)oxyethyl 2-methyl-3-sulfanylpropanoate Chemical compound SCC(C)C(=O)OCCOC(=O)C(C)CS JUKSUBINMNCBNL-UHFFFAOYSA-N 0.000 description 1
- JFWBGEJOEQFGOK-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethyl)hexanedioic acid Chemical compound OC(=O)CCCC(C(O)=O)CCOC(=O)C=C JFWBGEJOEQFGOK-UHFFFAOYSA-N 0.000 description 1
- UHOPWFKONJYLCF-UHFFFAOYSA-N 2-(2-sulfanylethyl)isoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(CCS)C(=O)C2=C1 UHOPWFKONJYLCF-UHFFFAOYSA-N 0.000 description 1
- WWWCFOGVIWJJHN-UHFFFAOYSA-N 2-(3-prop-2-enoyloxypropyl)cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1(CCCOC(=O)C=C)C(O)=O WWWCFOGVIWJJHN-UHFFFAOYSA-N 0.000 description 1
- TXJZAWRTHMZECY-UHFFFAOYSA-N 2-(3-sulfanylbutanoyloxy)ethyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCOC(=O)CC(C)S TXJZAWRTHMZECY-UHFFFAOYSA-N 0.000 description 1
- DVBLPJWQXDCAKU-UHFFFAOYSA-N 2-(4-bromo-3-hydroxyquinolin-2-yl)indene-1,3-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C1C1=C(O)C(Br)=C2C=CC=CC2=N1 DVBLPJWQXDCAKU-UHFFFAOYSA-N 0.000 description 1
- QHVBLSNVXDSMEB-UHFFFAOYSA-N 2-(diethylamino)ethyl prop-2-enoate Chemical compound CCN(CC)CCOC(=O)C=C QHVBLSNVXDSMEB-UHFFFAOYSA-N 0.000 description 1
- KJSGODDTWRXQRH-UHFFFAOYSA-N 2-(dimethylamino)ethyl benzoate Chemical compound CN(C)CCOC(=O)C1=CC=CC=C1 KJSGODDTWRXQRH-UHFFFAOYSA-N 0.000 description 1
- RWLALWYNXFYRGW-UHFFFAOYSA-N 2-Ethyl-1,3-hexanediol Chemical compound CCCC(O)C(CC)CO RWLALWYNXFYRGW-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 description 1
- ALZWVPLMSWPDQR-UHFFFAOYSA-N 2-[(4-methoxyphenyl)methyl]phenol Chemical compound C1=CC(OC)=CC=C1CC1=CC=CC=C1O ALZWVPLMSWPDQR-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- NVSCAPMJFRYMFK-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethyl acetate Chemical compound CCOCCOCCOCCOC(C)=O NVSCAPMJFRYMFK-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- SDHQGBWMLCBNSM-UHFFFAOYSA-N 2-[2-(2-methoxyethoxy)ethoxy]ethyl acetate Chemical compound COCCOCCOCCOC(C)=O SDHQGBWMLCBNSM-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- IAXFZZHBFXRZMT-UHFFFAOYSA-N 2-[3-(2-hydroxyethoxy)phenoxy]ethanol Chemical compound OCCOC1=CC=CC(OCCO)=C1 IAXFZZHBFXRZMT-UHFFFAOYSA-N 0.000 description 1
- FCYLUNJKMPGKPK-UHFFFAOYSA-N 2-[3-(2-methylprop-2-enoyloxy)propyl]butanedioic acid Chemical compound CC(=C)C(=O)OCCCC(C(O)=O)CC(O)=O FCYLUNJKMPGKPK-UHFFFAOYSA-N 0.000 description 1
- MPIGKGDPQRWZLU-UHFFFAOYSA-N 2-[4-[(2,6-dichloro-4-nitrophenyl)diazenyl]-n-methylanilino]ethanol Chemical compound C1=CC(N(CCO)C)=CC=C1N=NC1=C(Cl)C=C([N+]([O-])=O)C=C1Cl MPIGKGDPQRWZLU-UHFFFAOYSA-N 0.000 description 1
- TZXATTMVGZDPHM-UHFFFAOYSA-N 2-[4-[(2-chloro-4-nitrophenyl)diazenyl]-n-ethylanilino]ethyl-trimethylazanium Chemical compound C1=CC(N(CC[N+](C)(C)C)CC)=CC=C1N=NC1=CC=C([N+]([O-])=O)C=C1Cl TZXATTMVGZDPHM-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- MHOFGBJTSNWTDT-UHFFFAOYSA-M 2-[n-ethyl-4-[(6-methoxy-3-methyl-1,3-benzothiazol-3-ium-2-yl)diazenyl]anilino]ethanol;methyl sulfate Chemical compound COS([O-])(=O)=O.C1=CC(N(CCO)CC)=CC=C1N=NC1=[N+](C)C2=CC=C(OC)C=C2S1 MHOFGBJTSNWTDT-UHFFFAOYSA-M 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- DSKYSDCYIODJPC-UHFFFAOYSA-N 2-butyl-2-ethylpropane-1,3-diol Chemical compound CCCCC(CC)(CO)CO DSKYSDCYIODJPC-UHFFFAOYSA-N 0.000 description 1
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 1
- LPUUPYOHXHWKAR-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol 3,3,3-tris(sulfanyl)propanoic acid Chemical compound SC(CC(=O)O)(S)S.C(O)C(CC)(CO)CO LPUUPYOHXHWKAR-UHFFFAOYSA-N 0.000 description 1
- IYGAVZICZNAMTF-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2-methyl-3-sulfanylpropanoic acid Chemical compound SCC(C)C(O)=O.SCC(C)C(O)=O.SCC(C)C(O)=O.CCC(CO)(CO)CO IYGAVZICZNAMTF-UHFFFAOYSA-N 0.000 description 1
- WBEKRAXYEBAHQF-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;3-sulfanylbutanoic acid Chemical compound CC(S)CC(O)=O.CC(S)CC(O)=O.CC(S)CC(O)=O.CCC(CO)(CO)CO WBEKRAXYEBAHQF-UHFFFAOYSA-N 0.000 description 1
- VSZSIEBALNXIFG-UHFFFAOYSA-N 2-hydroxyethyl 2,2-bis(sulfanyl)acetate Chemical compound OCCOC(=O)C(S)S VSZSIEBALNXIFG-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- YCIRHAGYEUJTFH-UHFFFAOYSA-N 2-imidazol-1-ylethanamine Chemical compound NCCN1C=CN=C1 YCIRHAGYEUJTFH-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- VGHCVSPDKSEROA-UHFFFAOYSA-N 2-methyl-1,4-dioxecane-5,10-dione Chemical compound CC1COC(=O)CCCCC(=O)O1 VGHCVSPDKSEROA-UHFFFAOYSA-N 0.000 description 1
- JVZZUPJFERSVRN-UHFFFAOYSA-N 2-methyl-2-propylpropane-1,3-diol Chemical compound CCCC(C)(CO)CO JVZZUPJFERSVRN-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- RCEJCSULJQNRQQ-UHFFFAOYSA-N 2-methylbutanenitrile Chemical compound CCC(C)C#N RCEJCSULJQNRQQ-UHFFFAOYSA-N 0.000 description 1
- ODGCZQFTJDEYNI-UHFFFAOYSA-N 2-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1(C)C=CCCC1C(O)=O ODGCZQFTJDEYNI-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- QWGRWMMWNDWRQN-UHFFFAOYSA-N 2-methylpropane-1,3-diol Chemical compound OCC(C)CO QWGRWMMWNDWRQN-UHFFFAOYSA-N 0.000 description 1
- BNCADMBVWNPPIZ-UHFFFAOYSA-N 2-n,2-n,4-n,4-n,6-n,6-n-hexakis(methoxymethyl)-1,3,5-triazine-2,4,6-triamine Chemical compound COCN(COC)C1=NC(N(COC)COC)=NC(N(COC)COC)=N1 BNCADMBVWNPPIZ-UHFFFAOYSA-N 0.000 description 1
- DLTLLZLEJKRETK-UHFFFAOYSA-N 2-n,2-n,4-n,4-n,6-n-pentamethoxy-6-n-methyl-1,3,5-triazine-2,4,6-triamine Chemical compound CON(C)C1=NC(N(OC)OC)=NC(N(OC)OC)=N1 DLTLLZLEJKRETK-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- XYXBMCIMPXOBLB-UHFFFAOYSA-N 3,4,5-tris(dimethylamino)-2-methylphenol Chemical compound CN(C)C1=CC(O)=C(C)C(N(C)C)=C1N(C)C XYXBMCIMPXOBLB-UHFFFAOYSA-N 0.000 description 1
- FUCABBOUCNJYAH-UHFFFAOYSA-N 3,5-diphenyltriazol-4-amine Chemical compound NC1=C(C=2C=CC=CC=2)N=NN1C1=CC=CC=C1 FUCABBOUCNJYAH-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 1
- XJLDYKIEURAVBW-UHFFFAOYSA-N 3-decanone Chemical compound CCCCCCCC(=O)CC XJLDYKIEURAVBW-UHFFFAOYSA-N 0.000 description 1
- UTVOVDXBOIGHTP-UHFFFAOYSA-N 3-ethoxybutan-1-ol Chemical compound CCOC(C)CCO UTVOVDXBOIGHTP-UHFFFAOYSA-N 0.000 description 1
- JRXXEXVXTFEBIY-UHFFFAOYSA-N 3-ethoxypropanoic acid Chemical compound CCOCCC(O)=O JRXXEXVXTFEBIY-UHFFFAOYSA-N 0.000 description 1
- HTNUUDFQRYBJPH-UHFFFAOYSA-N 3-methoxypropanehydrazide Chemical compound COCCC(=O)NN HTNUUDFQRYBJPH-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- SXFJDZNJHVPHPH-UHFFFAOYSA-N 3-methylpentane-1,5-diol Chemical compound OCCC(C)CCO SXFJDZNJHVPHPH-UHFFFAOYSA-N 0.000 description 1
- RHLVCLIPMVJYKS-UHFFFAOYSA-N 3-octanone Chemical compound CCCCCC(=O)CC RHLVCLIPMVJYKS-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- WBCXRDHKXHADQF-UHFFFAOYSA-N 4,11-diamino-2-(3-methoxypropyl)naphtho[2,3-f]isoindole-1,3,5,10-tetrone Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(N)=C(C(N(CCCOC)C1=O)=O)C1=C2N WBCXRDHKXHADQF-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- AIARLPIXVMHZLJ-UHFFFAOYSA-N 4,8-diamino-2-bromo-1,5-dihydroxyanthracene-9,10-dione Chemical compound O=C1C2=C(N)C=C(Br)C(O)=C2C(=O)C2=C1C(O)=CC=C2N AIARLPIXVMHZLJ-UHFFFAOYSA-N 0.000 description 1
- ADRCREMWPUFGDU-UHFFFAOYSA-N 4-(1,3-benzothiazol-2-yl)-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=NC2=CC=CC=C2S1 ADRCREMWPUFGDU-UHFFFAOYSA-N 0.000 description 1
- HYKGLCSXVAAXNC-UHFFFAOYSA-N 4-(1,3-benzothiazol-2-yl)-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=NC2=CC=CC=C2S1 HYKGLCSXVAAXNC-UHFFFAOYSA-N 0.000 description 1
- OSINZVBZKLYKGD-UHFFFAOYSA-N 4-(1H-benzo[g]indol-2-yl)-N,N-dimethylaniline Chemical compound CN(C1=CC=C(C=C1)C=1NC2=C(C1)C=CC1=C2C=CC=C1)C OSINZVBZKLYKGD-UHFFFAOYSA-N 0.000 description 1
- ZKBBGUJBGLTNEK-UHFFFAOYSA-N 4-(1h-benzimidazol-2-yl)-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=NC2=CC=CC=C2N1 ZKBBGUJBGLTNEK-UHFFFAOYSA-N 0.000 description 1
- UODQXIVWQOGGPI-UHFFFAOYSA-N 4-(1h-indol-2-yl)-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=CC2=CC=CC=C2N1 UODQXIVWQOGGPI-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- LABQKWYHWCYABU-UHFFFAOYSA-N 4-(3-sulfanylbutanoyloxy)butyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCCCOC(=O)CC(C)S LABQKWYHWCYABU-UHFFFAOYSA-N 0.000 description 1
- LGKCTTQKRNEUAL-UHFFFAOYSA-N 4-[5-[4-(diethylamino)phenyl]-1,3,4-thiadiazol-2-yl]-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=NN=C(C=2C=CC(=CC=2)N(CC)CC)S1 LGKCTTQKRNEUAL-UHFFFAOYSA-N 0.000 description 1
- BWFMTHGMFVQPSE-UHFFFAOYSA-N 4-amino-1,2,4-triazolidine-3,5-dione Chemical compound NN1C(=O)NNC1=O BWFMTHGMFVQPSE-UHFFFAOYSA-N 0.000 description 1
- BBFRYSKTTHYWQZ-UHFFFAOYSA-N 4-anilino-3-nitro-n-phenylbenzenesulfonamide Chemical compound [O-][N+](=O)C1=CC(S(=O)(=O)NC=2C=CC=CC=2)=CC=C1NC1=CC=CC=C1 BBFRYSKTTHYWQZ-UHFFFAOYSA-N 0.000 description 1
- HVDNECJRVKOPKV-UHFFFAOYSA-N 4-chloro-2-(3-phenyl-1h-1,2,4-triazol-5-yl)aniline Chemical compound NC1=CC=C(Cl)C=C1C1=NNC(C=2C=CC=CC=2)=N1 HVDNECJRVKOPKV-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- JAGRUUPXPPLSRX-UHFFFAOYSA-N 4-prop-1-en-2-ylphenol Chemical compound CC(=C)C1=CC=C(O)C=C1 JAGRUUPXPPLSRX-UHFFFAOYSA-N 0.000 description 1
- ADGOOVVFTLKVKH-UHFFFAOYSA-N 4-propanoyloxybutyl propanoate Chemical compound CCC(=O)OCCCCOC(=O)CC ADGOOVVFTLKVKH-UHFFFAOYSA-N 0.000 description 1
- SIBBGGADHQDMHI-UHFFFAOYSA-N 4-tert-butyl-2,6-bis(hydroxymethyl)phenol Chemical compound CC(C)(C)C1=CC(CO)=C(O)C(CO)=C1 SIBBGGADHQDMHI-UHFFFAOYSA-N 0.000 description 1
- CDSULTPOCMWJCM-UHFFFAOYSA-N 4h-chromene-2,3-dione Chemical class C1=CC=C2OC(=O)C(=O)CC2=C1 CDSULTPOCMWJCM-UHFFFAOYSA-N 0.000 description 1
- ZLHGTHCCYUEAIK-UHFFFAOYSA-N 5,7-dibromo-2-(5,7-dibromo-3-hydroxy-1H-indol-2-yl)indol-3-one Chemical compound [O-]c1c([nH]c2c(Br)cc(Br)cc12)C1=[NH+]c2c(cc(Br)cc2Br)C1=O ZLHGTHCCYUEAIK-UHFFFAOYSA-N 0.000 description 1
- AVERNFJXXRIVQN-XSDYUOFFSA-N 5-[(4-ethoxyphenyl)diazenyl]-2-[(e)-2-[4-[(4-ethoxyphenyl)diazenyl]-2-sulfophenyl]ethenyl]benzenesulfonic acid Chemical compound C1=CC(OCC)=CC=C1N=NC(C=C1S(O)(=O)=O)=CC=C1\C=C\C1=CC=C(N=NC=2C=CC(OCC)=CC=2)C=C1S(O)(=O)=O AVERNFJXXRIVQN-XSDYUOFFSA-N 0.000 description 1
- JPQXNTOALKRJMH-UHFFFAOYSA-N 5-methoxypentyl acetate Chemical compound COCCCCCOC(C)=O JPQXNTOALKRJMH-UHFFFAOYSA-N 0.000 description 1
- DUOWKZRABKXXBQ-UHFFFAOYSA-N 5-phenyl-1,3-dihydro-1,2,4-triazol-2-amine Chemical compound N1N(N)CN=C1C1=CC=CC=C1 DUOWKZRABKXXBQ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical group CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- SSFWPKPPLIMMHL-UHFFFAOYSA-N C(C)(=O)O.C(C)(=O)OCCC(C)(OC)C Chemical class C(C)(=O)O.C(C)(=O)OCCC(C)(OC)C SSFWPKPPLIMMHL-UHFFFAOYSA-N 0.000 description 1
- VALQLOYIQYKGDF-UHFFFAOYSA-N CC[Si](CC)(C(C)CCCN=C=O)N=C=O Chemical class CC[Si](CC)(C(C)CCCN=C=O)N=C=O VALQLOYIQYKGDF-UHFFFAOYSA-N 0.000 description 1
- KKBFCPLWFWQNFB-UHFFFAOYSA-M CI Acid Orange 3 Chemical compound [Na+].[O-][N+](=O)C1=CC([N+](=O)[O-])=CC=C1NC(C=C1S([O-])(=O)=O)=CC=C1NC1=CC=CC=C1 KKBFCPLWFWQNFB-UHFFFAOYSA-M 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- IQFVPQOLBLOTPF-UHFFFAOYSA-L Congo Red Chemical compound [Na+].[Na+].C1=CC=CC2=C(N)C(N=NC3=CC=C(C=C3)C3=CC=C(C=C3)N=NC3=C(C4=CC=CC=C4C(=C3)S([O-])(=O)=O)N)=CC(S([O-])(=O)=O)=C21 IQFVPQOLBLOTPF-UHFFFAOYSA-L 0.000 description 1
- 241000557626 Corvus corax Species 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 1
- 241000721047 Danaus plexippus Species 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical group C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229910016006 MoSi Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OLYPWXRMOFUVGH-LURJTMIESA-N N(2)-methyl-L-lysine Chemical compound CN[C@H](C(O)=O)CCCCN OLYPWXRMOFUVGH-LURJTMIESA-N 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- GCGBYTNWLPWUKO-UHFFFAOYSA-N N,N-diethyl-4-(1H-indol-2-yl)aniline Chemical compound C(C)N(C1=CC=C(C=C1)C=1NC2=CC=CC=C2C1)CC GCGBYTNWLPWUKO-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- CXIGRZVNVOZRDY-UHFFFAOYSA-N N1C=CC=C1.SC=1SC2=C(N1)C=CC=C2 Chemical compound N1C=CC=C1.SC=1SC2=C(N1)C=CC=C2 CXIGRZVNVOZRDY-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- CYBDTDPNHXHLII-UHFFFAOYSA-N SC(CC(=O)OCC(O)(O)O)(S)S Chemical compound SC(CC(=O)OCC(O)(O)O)(S)S CYBDTDPNHXHLII-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- FHNINJWBTRXEBC-UHFFFAOYSA-N Sudan III Chemical compound OC1=CC=C2C=CC=CC2=C1N=NC(C=C1)=CC=C1N=NC1=CC=CC=C1 FHNINJWBTRXEBC-UHFFFAOYSA-N 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- LEHOTFFKMJEONL-UHFFFAOYSA-N Uric Acid Chemical compound N1C(=O)NC(=O)C2=C1NC(=O)N2 LEHOTFFKMJEONL-UHFFFAOYSA-N 0.000 description 1
- 235000005811 Viola adunca Nutrition 0.000 description 1
- 240000009038 Viola odorata Species 0.000 description 1
- 235000013487 Viola odorata Nutrition 0.000 description 1
- 235000002254 Viola papilionacea Nutrition 0.000 description 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- HSZUHSXXAOWGQY-UHFFFAOYSA-N [2-methyl-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(C)(COC(=O)C=C)COC(=O)C=C HSZUHSXXAOWGQY-UHFFFAOYSA-N 0.000 description 1
- CKDJMJKKDIIJNA-UHFFFAOYSA-N [3-(2-methylprop-2-enoyloxy)phenyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC(OC(=O)C(C)=C)=C1 CKDJMJKKDIIJNA-UHFFFAOYSA-N 0.000 description 1
- VTLHIRNKQSFSJS-UHFFFAOYSA-N [3-(3-sulfanylbutanoyloxy)-2,2-bis(3-sulfanylbutanoyloxymethyl)propyl] 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCC(COC(=O)CC(C)S)(COC(=O)CC(C)S)COC(=O)CC(C)S VTLHIRNKQSFSJS-UHFFFAOYSA-N 0.000 description 1
- VLCCKNLIFIJYOQ-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] 2,2,3,3-tetrakis(sulfanyl)propanoate Chemical compound OCC(CO)(CO)COC(=O)C(S)(S)C(S)S VLCCKNLIFIJYOQ-UHFFFAOYSA-N 0.000 description 1
- MDMKOESKPAVFJF-UHFFFAOYSA-N [4-(2-methylprop-2-enoyloxy)phenyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(OC(=O)C(C)=C)C=C1 MDMKOESKPAVFJF-UHFFFAOYSA-N 0.000 description 1
- IURGIPVDZKDLIX-UHFFFAOYSA-M [7-(diethylamino)phenoxazin-3-ylidene]-diethylazanium;chloride Chemical compound [Cl-].C1=CC(=[N+](CC)CC)C=C2OC3=CC(N(CC)CC)=CC=C3N=C21 IURGIPVDZKDLIX-UHFFFAOYSA-M 0.000 description 1
- YGCOKJWKWLYHTG-UHFFFAOYSA-N [[4,6-bis[bis(hydroxymethyl)amino]-1,3,5-triazin-2-yl]-(hydroxymethyl)amino]methanol Chemical compound OCN(CO)C1=NC(N(CO)CO)=NC(N(CO)CO)=N1 YGCOKJWKWLYHTG-UHFFFAOYSA-N 0.000 description 1
- SYDYRFPJJJPJFE-UHFFFAOYSA-N [[4,6-bis[bis(hydroxymethyl)amino]-1,3,5-triazin-2-yl]amino]methanol Chemical compound OCNC1=NC(N(CO)CO)=NC(N(CO)CO)=N1 SYDYRFPJJJPJFE-UHFFFAOYSA-N 0.000 description 1
- WEAJVJTWVRAPED-UHFFFAOYSA-N [[4-amino-6-[bis(hydroxymethyl)amino]-1,3,5-triazin-2-yl]-(hydroxymethyl)amino]methanol Chemical compound NC1=NC(N(CO)CO)=NC(N(CO)CO)=N1 WEAJVJTWVRAPED-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- NBJODVYWAQLZOC-UHFFFAOYSA-L [dibutyl(octanoyloxy)stannyl] octanoate Chemical compound CCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCC NBJODVYWAQLZOC-UHFFFAOYSA-L 0.000 description 1
- XQBCVRSTVUHIGH-UHFFFAOYSA-L [dodecanoyloxy(dioctyl)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCCCCCC)(CCCCCCCC)OC(=O)CCCCCCCCCCC XQBCVRSTVUHIGH-UHFFFAOYSA-L 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- CQPFMGBJSMSXLP-UHFFFAOYSA-M acid orange 7 Chemical compound [Na+].OC1=CC=C2C=CC=CC2=C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 CQPFMGBJSMSXLP-UHFFFAOYSA-M 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 125000003670 adamantan-2-yl group Chemical group [H]C1([H])C(C2([H])[H])([H])C([H])([H])C3([H])C([*])([H])C1([H])C([H])([H])C2([H])C3([H])[H] 0.000 description 1
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000005418 aryl aryl group Chemical group 0.000 description 1
- 238000003556 assay Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 239000002199 base oil Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229960001716 benzalkonium Drugs 0.000 description 1
- MYONAGGJKCJOBT-UHFFFAOYSA-N benzimidazol-2-one Chemical compound C1=CC=CC2=NC(=O)N=C21 MYONAGGJKCJOBT-UHFFFAOYSA-N 0.000 description 1
- 150000008641 benzimidazolones Chemical class 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- MWPUSWNISCYUNR-UHFFFAOYSA-N bis(3-nitrophenyl)iodanium Chemical compound [O-][N+](=O)C1=CC=CC([I+]C=2C=C(C=CC=2)[N+]([O-])=O)=C1 MWPUSWNISCYUNR-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- DNFSNYQTQMVTOK-UHFFFAOYSA-N bis(4-tert-butylphenyl)iodanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 DNFSNYQTQMVTOK-UHFFFAOYSA-N 0.000 description 1
- PIPBVABVQJZSAB-UHFFFAOYSA-N bis(ethenyl) benzene-1,2-dicarboxylate Chemical compound C=COC(=O)C1=CC=CC=C1C(=O)OC=C PIPBVABVQJZSAB-UHFFFAOYSA-N 0.000 description 1
- QDVNNDYBCWZVTI-UHFFFAOYSA-N bis[4-(ethylamino)phenyl]methanone Chemical compound C1=CC(NCC)=CC=C1C(=O)C1=CC=C(NCC)C=C1 QDVNNDYBCWZVTI-UHFFFAOYSA-N 0.000 description 1
- HXTBYXIZCDULQI-UHFFFAOYSA-N bis[4-(methylamino)phenyl]methanone Chemical compound C1=CC(NC)=CC=C1C(=O)C1=CC=C(NC)C=C1 HXTBYXIZCDULQI-UHFFFAOYSA-N 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- BMRWNKZVCUKKSR-UHFFFAOYSA-N butane-1,2-diol Chemical compound CCC(O)CO BMRWNKZVCUKKSR-UHFFFAOYSA-N 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- OWBTYPJTUOEWEK-UHFFFAOYSA-N butane-2,3-diol Chemical compound CC(O)C(C)O OWBTYPJTUOEWEK-UHFFFAOYSA-N 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- DXRWYIKGBIPGAG-UHFFFAOYSA-M chembl2028375 Chemical compound [Na+].[O-][N+](=O)C1=CC=C2C(N=NC3=C4C=CC=CC4=CC=C3O)=C(O)C=C(S([O-])(=O)=O)C2=C1 DXRWYIKGBIPGAG-UHFFFAOYSA-M 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- WIIZWVCIJKGZOK-RKDXNWHRSA-N chloramphenicol Chemical compound ClC(Cl)C(=O)N[C@H](CO)[C@H](O)C1=CC=C([N+]([O-])=O)C=C1 WIIZWVCIJKGZOK-RKDXNWHRSA-N 0.000 description 1
- 229960005091 chloramphenicol Drugs 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 238000004939 coking Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- WVIIMZNLDWSIRH-UHFFFAOYSA-N cyclohexylcyclohexane Chemical compound C1CCCCC1C1CCCCC1 WVIIMZNLDWSIRH-UHFFFAOYSA-N 0.000 description 1
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical class [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000004186 cyclopropylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C1([H])[H] 0.000 description 1
- WXZKPELXXQHDNS-UHFFFAOYSA-N decane-1,1-dithiol Chemical compound CCCCCCCCCC(S)S WXZKPELXXQHDNS-UHFFFAOYSA-N 0.000 description 1
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- OZJPLYNZGCXSJM-UHFFFAOYSA-N delta-Valerolactone Natural products O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 1
- 125000004985 dialkyl amino alkyl group Chemical group 0.000 description 1
- 239000012955 diaryliodonium Substances 0.000 description 1
- 125000005520 diaryliodonium group Chemical group 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- 125000001142 dicarboxylic acid group Chemical group 0.000 description 1
- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 description 1
- DSXOZIYLXSNLQB-UHFFFAOYSA-N didodecyliodanium Chemical compound CCCCCCCCCCCC[I+]CCCCCCCCCCCC DSXOZIYLXSNLQB-UHFFFAOYSA-N 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 235000019797 dipotassium phosphate Nutrition 0.000 description 1
- 229910000396 dipotassium phosphate Inorganic materials 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- QCWPZYSLMIXIHM-UHFFFAOYSA-L disodium 4-amino-5-hydroxy-3-[(3-nitrophenyl)diazenyl]-6-phenyldiazenylnaphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].Nc1c(N=Nc2cccc(c2)[N+]([O-])=O)c(cc2cc(c(N=Nc3ccccc3)c(O)c12)S([O-])(=O)=O)S([O-])(=O)=O QCWPZYSLMIXIHM-UHFFFAOYSA-L 0.000 description 1
- DSARWKALPGYFTA-UHFFFAOYSA-L disodium 4-hydroxy-7-[(5-hydroxy-6-phenyldiazenyl-7-sulfonatonaphthalen-2-yl)carbamoylamino]-3-phenyldiazenylnaphthalene-2-sulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C1=CC2=CC(NC(=O)NC=3C=C4C=C(C(N=NC=5C=CC=CC=5)=C(O)C4=CC=3)S([O-])(=O)=O)=CC=C2C(O)=C1N=NC1=CC=CC=C1 DSARWKALPGYFTA-UHFFFAOYSA-L 0.000 description 1
- VLFKFKCRUCJVNE-UHFFFAOYSA-L disodium 8-amino-7-[(4-nitrophenyl)diazenyl]-2-[[4-[4-[(4-oxidophenyl)diazenyl]phenyl]phenyl]diazenyl]-3,6-disulfonaphthalen-1-olate Chemical compound [Na+].[Na+].NC1=C(C(=CC2=CC(=C(C(=C12)O)N=NC1=CC=C(C=C1)C1=CC=C(C=C1)N=NC1=CC=C(C=C1)O)S(=O)(=O)[O-])S(=O)(=O)[O-])N=NC1=CC=C(C=C1)[N+](=O)[O-] VLFKFKCRUCJVNE-UHFFFAOYSA-L 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 235000019800 disodium phosphate Nutrition 0.000 description 1
- VQHWSAGRWJWMCJ-UHFFFAOYSA-K disodium;4-chloro-2-methyl-6-[(3-methyl-5-oxo-1-phenylpyrazol-2-id-4-yl)diazenyl]phenolate;chromium(3+);hydron Chemical compound [H+].[Na+].[Na+].[Cr+3].O=C1C(N=NC=2C(=C(C)C=C(Cl)C=2)[O-])=C(C)[N-]N1C1=CC=CC=C1.O=C1C(N=NC=2C(=C(C)C=C(Cl)C=2)[O-])=C(C)[N-]N1C1=CC=CC=C1 VQHWSAGRWJWMCJ-UHFFFAOYSA-K 0.000 description 1
- FPAYXBWMYIMERV-UHFFFAOYSA-L disodium;5-methyl-2-[[4-(4-methyl-2-sulfonatoanilino)-9,10-dioxoanthracen-1-yl]amino]benzenesulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C1=CC(C)=CC=C1NC(C=1C(=O)C2=CC=CC=C2C(=O)C=11)=CC=C1NC1=CC=C(C)C=C1S([O-])(=O)=O FPAYXBWMYIMERV-UHFFFAOYSA-L 0.000 description 1
- TUXJTJITXCHUEL-UHFFFAOYSA-N disperse red 11 Chemical compound C1=CC=C2C(=O)C3=C(N)C(OC)=CC(N)=C3C(=O)C2=C1 TUXJTJITXCHUEL-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000005066 dodecenyl group Chemical group C(=CCCCCCCCCCC)* 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- IQIJRJNHZYUQSD-UHFFFAOYSA-N ethenyl(phenyl)diazene Chemical compound C=CN=NC1=CC=CC=C1 IQIJRJNHZYUQSD-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 235000019256 formaldehyde Nutrition 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 239000000295 fuel oil Substances 0.000 description 1
- 239000001087 glyceryl triacetate Substances 0.000 description 1
- 235000013773 glyceryl triacetate Nutrition 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- ALPIESLRVWNLAX-UHFFFAOYSA-N hexane-1,1-dithiol Chemical compound CCCCCC(S)S ALPIESLRVWNLAX-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- JSLCOZYBKYHZNL-UHFFFAOYSA-N isobutyric acid butyl ester Natural products CCCCOC(=O)C(C)C JSLCOZYBKYHZNL-UHFFFAOYSA-N 0.000 description 1
- UCRIXBMIQQJDBW-UHFFFAOYSA-N isocyanatobenzene trihydroxy(sulfanylidene)-lambda5-phosphane Chemical compound P(=S)(O)(O)O.C1(=CC=CC=C1)N=C=O UCRIXBMIQQJDBW-UHFFFAOYSA-N 0.000 description 1
- YDNLNVZZTACNJX-UHFFFAOYSA-N isocyanatomethylbenzene Chemical compound O=C=NCC1=CC=CC=C1 YDNLNVZZTACNJX-UHFFFAOYSA-N 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-M lysinate Chemical compound NCCCCC(N)C([O-])=O KDXKERNSBIXSRK-UHFFFAOYSA-M 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Natural products OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- HRDXJKGNWSUIBT-UHFFFAOYSA-N methoxybenzene Chemical group [CH2]OC1=CC=CC=C1 HRDXJKGNWSUIBT-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 125000006178 methyl benzyl group Chemical group 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- LDIPAUVCWRHLAM-UHFFFAOYSA-N n',n'-dibutylbutane-1,4-diamine Chemical compound CCCCN(CCCC)CCCCN LDIPAUVCWRHLAM-UHFFFAOYSA-N 0.000 description 1
- PWNDYKKNXVKQJO-UHFFFAOYSA-N n',n'-dibutylethane-1,2-diamine Chemical compound CCCCN(CCN)CCCC PWNDYKKNXVKQJO-UHFFFAOYSA-N 0.000 description 1
- KYCGURZGBKFEQB-UHFFFAOYSA-N n',n'-dibutylpropane-1,3-diamine Chemical compound CCCCN(CCCC)CCCN KYCGURZGBKFEQB-UHFFFAOYSA-N 0.000 description 1
- JILXUIANNUALRZ-UHFFFAOYSA-N n',n'-diethylbutane-1,4-diamine Chemical compound CCN(CC)CCCCN JILXUIANNUALRZ-UHFFFAOYSA-N 0.000 description 1
- UDGSVBYJWHOHNN-UHFFFAOYSA-N n',n'-diethylethane-1,2-diamine Chemical compound CCN(CC)CCN UDGSVBYJWHOHNN-UHFFFAOYSA-N 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- GCOWZPRIMFGIDQ-UHFFFAOYSA-N n',n'-dimethylbutane-1,4-diamine Chemical compound CN(C)CCCCN GCOWZPRIMFGIDQ-UHFFFAOYSA-N 0.000 description 1
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 description 1
- GLDVKMPSACNWFV-UHFFFAOYSA-N n',n'-dipropylbutane-1,4-diamine Chemical compound CCCN(CCC)CCCCN GLDVKMPSACNWFV-UHFFFAOYSA-N 0.000 description 1
- DMDXQHYISPCTGF-UHFFFAOYSA-N n',n'-dipropylethane-1,2-diamine Chemical compound CCCN(CCC)CCN DMDXQHYISPCTGF-UHFFFAOYSA-N 0.000 description 1
- GZUCMODGDIGMBI-UHFFFAOYSA-N n',n'-dipropylpropane-1,3-diamine Chemical compound CCCN(CCC)CCCN GZUCMODGDIGMBI-UHFFFAOYSA-N 0.000 description 1
- KVEFSERWIAYNPO-UHFFFAOYSA-N n,n-diethyl-4-quinolin-2-ylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=CC=C(C=CC=C2)C2=N1 KVEFSERWIAYNPO-UHFFFAOYSA-N 0.000 description 1
- QTBGSBRUWVUWCS-UHFFFAOYSA-N n,n-dimethyl-4-pyridin-2-ylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=CC=CC=N1 QTBGSBRUWVUWCS-UHFFFAOYSA-N 0.000 description 1
- RJJJWZAJSLSBKC-UHFFFAOYSA-N n,n-dimethyl-4-pyrimidin-2-ylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=NC=CC=N1 RJJJWZAJSLSBKC-UHFFFAOYSA-N 0.000 description 1
- KLNWLOCDPWWNDS-UHFFFAOYSA-N n,n-dimethyl-4-quinolin-2-ylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=CC=C(C=CC=C2)C2=N1 KLNWLOCDPWWNDS-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- ZWRDBWDXRLPESY-UHFFFAOYSA-N n-benzyl-n-ethylethanamine Chemical compound CCN(CC)CC1=CC=CC=C1 ZWRDBWDXRLPESY-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CTIQLGJVGNGFEW-UHFFFAOYSA-L naphthol yellow S Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C=C2C([O-])=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 CTIQLGJVGNGFEW-UHFFFAOYSA-L 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000005187 nonenyl group Chemical group C(=CCCCCCCC)* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005482 norpinyl group Chemical group 0.000 description 1
- YYZUSRORWSJGET-UHFFFAOYSA-N octanoic acid ethyl ester Natural products CCCCCCCC(=O)OCC YYZUSRORWSJGET-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- QQBDLJCYGRGAKP-UHFFFAOYSA-N olsalazine Chemical compound C1=C(O)C(C(=O)O)=CC(N=NC=2C=C(C(O)=CC=2)C(O)=O)=C1 QQBDLJCYGRGAKP-UHFFFAOYSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- QUBQYFYWUJJAAK-UHFFFAOYSA-N oxymethurea Chemical compound OCNC(=O)NCO QUBQYFYWUJJAAK-UHFFFAOYSA-N 0.000 description 1
- 229950005308 oxymethurea Drugs 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 229940110337 pigment blue 1 Drugs 0.000 description 1
- 229940099800 pigment red 48 Drugs 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 238000010094 polymer processing Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- JCMFJIHDWDKYIL-UHFFFAOYSA-N propyl 3-methoxypropanoate Chemical compound CCCOC(=O)CCOC JCMFJIHDWDKYIL-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 235000012752 quinoline yellow Nutrition 0.000 description 1
- FZUOVNMHEAPVBW-UHFFFAOYSA-L quinoline yellow ws Chemical compound [Na+].[Na+].O=C1C2=CC=CC=C2C(=O)C1C1=NC2=C(S([O-])(=O)=O)C=C(S(=O)(=O)[O-])C=C2C=C1 FZUOVNMHEAPVBW-UHFFFAOYSA-L 0.000 description 1
- 150000004060 quinone imines Chemical class 0.000 description 1
- 239000001008 quinone-imine dye Substances 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- WPPDXAHGCGPUPK-UHFFFAOYSA-N red 2 Chemical compound C1=CC=CC=C1C(C1=CC=CC=C11)=C(C=2C=3C4=CC=C5C6=CC=C7C8=C(C=9C=CC=CC=9)C9=CC=CC=C9C(C=9C=CC=CC=9)=C8C8=CC=C(C6=C87)C(C=35)=CC=2)C4=C1C1=CC=CC=C1 WPPDXAHGCGPUPK-UHFFFAOYSA-N 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- KUIXZSYWBHSYCN-UHFFFAOYSA-L remazol brilliant blue r Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C(N)=C2C(=O)C3=CC=CC=C3C(=O)C2=C1NC1=CC=CC(S(=O)(=O)CCOS([O-])(=O)=O)=C1 KUIXZSYWBHSYCN-UHFFFAOYSA-L 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000033764 rhythmic process Effects 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical class NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- FPSFKBGHBCHTOE-UHFFFAOYSA-M sodium 1-[(3-methyl-5-oxo-1-phenyl-4H-pyrazol-4-yl)diazenyl]-4-sulfonaphthalen-2-olate Chemical compound [Na+].O=C1C(N=NC=2C3=CC=CC=C3C(=CC=2O)S([O-])(=O)=O)C(C)=NN1C1=CC=CC=C1 FPSFKBGHBCHTOE-UHFFFAOYSA-M 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- UDTJJVCMRRCRDB-UHFFFAOYSA-M sodium;4-(3-methyl-5-oxo-4-phenyldiazenyl-4h-pyrazol-1-yl)benzenesulfonate Chemical compound [Na+].CC1=NN(C=2C=CC(=CC=2)S([O-])(=O)=O)C(=O)C1N=NC1=CC=CC=C1 UDTJJVCMRRCRDB-UHFFFAOYSA-M 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 150000003536 tetrazoles Chemical group 0.000 description 1
- KSBAEPSJVUENNK-UHFFFAOYSA-L tin(ii) 2-ethylhexanoate Chemical compound [Sn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O KSBAEPSJVUENNK-UHFFFAOYSA-L 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- 125000005208 trialkylammonium group Chemical group 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 125000001814 trioxo-lambda(7)-chloranyloxy group Chemical group *OCl(=O)(=O)=O 0.000 description 1
- MDCWDBMBZLORER-UHFFFAOYSA-N triphenyl borate Chemical compound C=1C=CC=CC=1OB(OC=1C=CC=CC=1)OC1=CC=CC=C1 MDCWDBMBZLORER-UHFFFAOYSA-N 0.000 description 1
- UCVWVXRLJHYZLF-UHFFFAOYSA-K trisodium 5-[[4-[[4-[4-[(4-amino-9,10-dioxo-3-sulfonatoanthracen-1-yl)amino]-2-sulfonatoanilino]-6-anilino-1,3,5-triazin-2-yl]amino]phenyl]diazenyl]-2-hydroxybenzoate Chemical compound C1=CC=C(C=C1)NC2=NC(=NC(=N2)NC3=C(C=C(C=C3)NC4=CC(=C(C5=C4C(=O)C6=CC=CC=C6C5=O)N)S(=O)(=O)O)S(=O)(=O)[O-])NC7=CC=C(C=C7)N=NC8=CC(=C(C=C8)[O-])C(=O)[O-].[Na+].[Na+].[Na+] UCVWVXRLJHYZLF-UHFFFAOYSA-K 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- ZUCXUTRTSQLRCV-UHFFFAOYSA-K trisodium;1-amino-4-[3-[[4-chloro-6-(3-sulfonatoanilino)-1,3,5-triazin-2-yl]amino]-2,4,6-trimethyl-5-sulfonatoanilino]-9,10-dioxoanthracene-2-sulfonate Chemical compound [Na+].[Na+].[Na+].CC1=C(S([O-])(=O)=O)C(C)=C(NC=2C=3C(=O)C4=CC=CC=C4C(=O)C=3C(N)=C(C=2)S([O-])(=O)=O)C(C)=C1NC(N=1)=NC(Cl)=NC=1NC1=CC=CC(S([O-])(=O)=O)=C1 ZUCXUTRTSQLRCV-UHFFFAOYSA-K 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/44—Carbon
- C09C1/48—Carbon black
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Optical Filters (AREA)
- Paints Or Removers (AREA)
- Indole Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Polymerisation Methods In General (AREA)
- Pyrane Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
本發明係關於一種感光性著色組成物等。詳細而言,例如係關於在液晶顯示器等之彩色濾光片中較佳地用於形成著色間隔件等之感光性著色組成物、將該感光性著色組成物硬化所獲得之著色間隔件、具備該著色間隔件之影像顯示裝置。 The present invention relates to a photosensitive coloring composition and the like. Specifically, for example, it relates to a photosensitive coloring composition preferably used for forming coloring spacers and the like in color filters such as liquid crystal displays, a coloring spacer obtained by curing the photosensitive coloring composition, and the The image display device of the coloring spacer.
液晶顯示器(LCD)係利用藉由對液晶接通、斷開電壓而切換液晶分子排列方式之性質。另一方面,構成LCD單元各構件中,藉由以光微影法為代表之利用感光性組成物之方法所形成者居多。該感光性組成物因易於形成微細之構造且亦易於進行對大畫面用基板之處理等原因,而有其應用範圍於今後進一步擴大之傾向。 A liquid crystal display (LCD) utilizes the property of switching the arrangement of liquid crystal molecules by switching on and off a voltage to the liquid crystal. On the other hand, most of the components constituting the LCD unit are formed by a method using a photosensitive composition represented by a photolithography method. Since this photosensitive composition is easy to form a fine structure, it is also easy to handle the substrate for large screens, and the like, the application range thereof tends to be further expanded in the future.
然而,使用感光性組成物所製造之LCD因感光性組成物本身之電特性、或感光性組成物中所包含之雜質之影響,而有無法保持施加至液晶之電壓,由此產生顯示器之顯示不均等問題之情形。尤其於彩色液晶顯示器中之更靠近液晶層之構件、例如液晶面板中為了保持2塊基板之間隔一定而使用之、所謂柱狀間隔件、光間隔件等中,其影響較大。 However, the LCD manufactured using the photosensitive composition cannot maintain the voltage applied to the liquid crystal due to the electrical properties of the photosensitive composition itself or the influence of impurities contained in the photosensitive composition, resulting in the display of the display. Cases of inequality problems. Especially in the color liquid crystal display, the components closer to the liquid crystal layer, such as the so-called column spacers and optical spacers, which are used to maintain a constant interval between two substrates in the liquid crystal panel, have a great influence.
先前,於將不具有遮光性之間隔件用於薄膜電晶體(TFT,thin-film transistor)型LCD之情形時,存在作為開關元件之 TFT因透過間隔件之光而產生誤動作之情況。為了防止該情況,例如,於專利文獻1中記載有使用具有遮光性之間隔件(著色間隔件)之方法。 In the past, when a spacer having no light-shielding property was used in a thin-film transistor (TFT) type LCD, there was a switching element. A case where the TFT malfunctions due to light passing through the spacer. In order to prevent this, for example, Patent Document 1 describes a method of using a spacer (colored spacer) having light-shielding properties.
另一方面,近年來,隨著面板構造之變化,提出有藉由光微影法一次形成高度不同之著色間隔件之方法。例如,於專利文獻2中揭示有如下內容:藉由組合數種光吸收特性不同之特定之顏料種類確保紫外線區域與可見光區域之光吸收之平衡,可維持遮光性及液晶之電壓保持率,並且實現形狀或階差之控制、及與基板之密接性。又,於專利文獻3中揭示有顏料中使用複數種有機著色顏料者,於專利文獻4中揭示有使用有機黑色顏料者。 On the other hand, in recent years, with the change of the panel structure, a method of forming coloring spacers having different heights at one time by a photolithography method has been proposed. For example, Patent Document 2 discloses that by combining several specific types of pigments with different light absorption properties, the balance of light absorption in the ultraviolet region and the visible light region can be ensured, the light-shielding property and the voltage holding ratio of the liquid crystal can be maintained, and Control of shape or level difference, and adhesion to the substrate are realized. In addition, Patent Document 3 discloses that a plurality of organic color pigments are used as pigments, and Patent Document 4 discloses that an organic black pigment is used.
另一方面,於專利文獻5中記載有於彩色濾光片光阻用途中,為了提高硬化性而使用特定之肟酯化合物作為高感度之光聚合起始劑。 On the other hand, in patent document 5, in order to improve curability, it is described that a specific oxime ester compound is used as a high-sensitivity photopolymerization initiator in the use of a color filter photoresist.
[先前技術文獻] [Prior Art Literature]
[專利文獻] [Patent Literature]
專利文獻1:日本專利特開平8-234212號公報 Patent Document 1: Japanese Patent Laid-Open No. 8-234212
專利文獻2:國際公開第2013/115268號 Patent Document 2: International Publication No. 2013/115268
專利文獻3:韓國登記專利第10-1266295號公報 Patent Document 3: Korean Registered Patent Publication No. 10-1266295
專利文獻4:日本專利特表2014-529652號公報 Patent Document 4: Japanese Patent Publication No. 2014-529652
專利文獻5:日本專利特表2014-500852號公報 Patent Document 5: Japanese Patent Publication No. 2014-500852
近年來,隨著面板構造之變化,要求進一步提高著色 間隔件之遮光性。作為提高遮光性之方法,可列舉使用遮光性較高之顏料之方法、或提高感光性著色組成物中之顏料含有比例之方法等。本發明者等人經研究發現,於專利文獻2~4所記載之感光性著色組成物中,併用遮光性較高之顏料等而進一步提高著色間隔件之遮光性後,於膜表面附近及膜底部附近,交聯密度差變大,因熱硬化過程之熱收縮而於塗膜表面產生皺褶,表面平滑性變得不充分。 In recent years, with the change of panel structure, further improvement of coloring is required. Shading properties of spacers. As a method of improving light-shielding property, the method of using the pigment with high light-shielding property, the method of increasing the pigment content ratio in a photosensitive coloring composition, etc. are mentioned. The inventors of the present invention have found that, in the photosensitive coloring compositions described in Patent Documents 2 to 4, after the light-shielding properties of the coloring spacers are further improved by using a pigment with high light-shielding properties in combination, the photosensitive coloring compositions in the vicinity of the film surface and in the film In the vicinity of the bottom, the difference in crosslinking density becomes large, and wrinkles are generated on the surface of the coating film due to thermal shrinkage during the thermal curing process, and the surface smoothness becomes insufficient.
另一方面,於專利文獻5中記載有使用特定之肟酯化合物作為彩色光阻之光聚合起始劑。然而,於專利文獻5中,並未記載或暗示將該肟酯化合物用作用以形成著色間隔件之感光性著色組成物之光聚合起始劑。因此,並不明白於該肟酯化合物用作著色間隔件形成用之感光性著色組成物之光聚合起始劑之情形時發揮何種作用。 On the other hand, Patent Document 5 describes the use of a specific oxime ester compound as a photopolymerization initiator for a color resist. However, in Patent Document 5, there is no description or suggestion that the oxime ester compound is used as a photopolymerization initiator of a photosensitive coloring composition for forming a coloring spacer. Therefore, it is not clear what effect this oxime ester compound exhibits when it is used as a photopolymerization initiator of a photosensitive coloring composition for forming a coloring spacer.
本發明係鑒於上述情況而完成者,本發明之目的在於提供一種能夠形成遮光性較高且表面平滑性優異之圖案之感光性著色組成物。 The present invention was made in view of the above-mentioned circumstances, and an object of the present invention is to provide a photosensitive coloring composition capable of forming a pattern having high light-shielding properties and excellent surface smoothness.
本發明者等人為解決上述課題而進行了努力研究,結果發現藉由在感光性著色組成物中使用特定之肟酯系化合物作為光聚合起始劑,可解決上述課題,從而完成了本發明。 As a result of diligent studies to solve the above-mentioned problems, the present inventors found that the above-mentioned problems can be solved by using a specific oxime ester-based compound as a photopolymerization initiator in a photosensitive coloring composition, and completed the present invention.
即,本發明具有以下[1]~[14]之構成。[1]一種著色間隔件形成用感光性著色組成物,其係含有(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(e)溶劑、及(f)分散劑者,其特徵在於: That is, the present invention has the following configurations of [1] to [14]. [1] A photosensitive coloring composition for forming a coloring spacer, comprising (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, ( e) solvent and (f) dispersant, characterized in that:
上述(c)光聚合起始劑包含下述式(I)所表示之肟酯系化合物。 The above-mentioned (c) photopolymerization initiator contains an oxime ester-based compound represented by the following formula (I).
[化1]
(上述通式(I)中, (In the above general formula (I),
R1表示可具有取代基之芳香族環基。 R 1 represents an aromatic ring group which may have a substituent.
R2表示可具有取代基之烷醯基、或可具有取代基之芳醯基。 R 2 represents an optionally substituted alkane group or an optionally substituted aryl group.
R3表示氫原子、或可具有取代基之烷基。 R 3 represents a hydrogen atom or an alkyl group which may have a substituent.
R4表示可具有取代基之芳香族環基。 R 4 represents an aromatic ring group which may have a substituent.
R5及R6分別獨立地表示可具有取代基之苯環、或可具有取代基之萘環。其中,R5及R6之至少任一者為可具有取代基之萘環。 R 5 and R 6 each independently represent a benzene ring which may have a substituent or a naphthalene ring which may have a substituent. Wherein, at least one of R 5 and R 6 is a naphthalene ring which may have a substituent.
R1及R4之至少任一者具有-OR7基作為取代基。其中,R7表示鹵烷基。 At least any one of R 1 and R 4 has a -OR 7 group as a substituent. wherein R 7 represents a haloalkyl group.
X表示直接鍵或羰基。 X represents a direct bond or a carbonyl group.
Z表示直接鍵或羰基。) Z represents a direct bond or a carbonyl group. )
[2]如[1]所記載之著色間隔件形成用感光性著色組成物,其中,上述(a)著色劑含有選自由紅色顏料及橙色顏料所組成群組中之至少1種、及選自由藍色顏料及紫色顏料所組成群組中之至少1種。 [2] The photosensitive coloring composition for forming a colored spacer according to [1], wherein the colorant (a) contains at least one selected from the group consisting of a red pigment and an orange pigment, and a At least one of the group consisting of blue pigment and purple pigment.
[3]如[2]所記載之著色間隔件形成用感光性著色組成物,其中,上述紅色顏料為以下之(1),上述橙色顏料為以下之(2),上述藍色顏料為以下之(3),上述紫色顏料為以下之(4)。 [3] The photosensitive coloring composition for forming a colored spacer according to [2], wherein the red pigment is the following (1), the orange pigment is the following (2), and the blue pigment is the following (3), the said purple pigment is the following (4).
(1)選自C.I.顏料紅177、254中之至少1種 (1) At least one selected from C.I. Pigment Red 177 and 254
(2)選自C.I.顏料橙43、64中之至少1種 (2) At least one selected from C.I. Pigment Orange 43 and 64
(3)選自C.I.顏料藍15:6、60中之至少1種 (3) At least one selected from C.I. Pigment Blue 15:6, 60
(4)選自C.I.顏料紫23、29中之至少1種 (4) At least one selected from C.I. Pigment Violet 23 and 29
[4]如[2]或[3]所記載之著色間隔件形成用感光性著色組成物,其中,選自由紅色顏料及橙色顏料所組成群組中之至少1種顏料相對於上述(a)著色劑100質量份之含有比例為1質量份以上且30質量份以下。 [4] The photosensitive coloring composition for forming a coloring spacer according to [2] or [3], wherein at least one pigment selected from the group consisting of a red pigment and an orange pigment is relative to the above (a) The content ratio of 100 parts by mass of the colorant is 1 part by mass or more and 30 parts by mass or less.
[5]如[2]至[4]中任一項所記載之著色間隔件形成用感光性著色組成物,其中,選自由藍色顏料及紫色顏料所組成群組中之至少1種顏料相對於上述(a)著色劑100質量份之含有比例為20質量份以上且90質量份以下。 [5] The photosensitive coloring composition for forming a coloring spacer according to any one of [2] to [4], wherein at least one pigment selected from the group consisting of a blue pigment and a violet pigment is relatively The content ratio with respect to 100 mass parts of said (a) coloring agents is 20 mass parts or more and 90 mass parts or less.
[6]如[1]至[5]中任一項所記載之著色間隔件形成用感光性著色組成物,其中,上述(a)著色劑含有有機黑色顏料。 [6] The photosensitive coloring composition for forming a colored spacer according to any one of [1] to [5], wherein the (a) colorant contains an organic black pigment.
[7]如[6]所記載之著色間隔件形成用感光性著色組成物,其中,上述有機黑色顏料含有下述式(1)所表示之化合物、其幾何異構物、其鹽、或其幾何異構物之鹽。 [7] The photosensitive coloring composition for forming a colored spacer according to [6], wherein the organic black pigment contains a compound represented by the following formula (1), a geometric isomer thereof, a salt thereof, or a compound thereof Salts of geometric isomers.
[化2]
(上述式(1)中,R11及R16相互獨立地為氫原子、CH3、CF3、氟原子或氯原子; (In the above formula (1), R 11 and R 16 are independently a hydrogen atom, CH 3 , CF 3 , a fluorine atom or a chlorine atom;
R12、R13、R14、R15、R17、R18、R19及R20係與其他所有基相互獨立地為氫原子、鹵素原子、R21、COOH、COOR21、COO-、CONH2、 CONHR21、CONR21R22、CN、OH、OR21、COCR21、OOCNH2、OOCNHR21、OOCNR21R22、NO2、NH2、NHR21、NR21R22、NHCOR22、NR21COR22、N=CH2、N=CHR21、N=CR21R22、SH、SR21、SOR21、SO2R21、SO3R21、SO3H、SO3 -、SO2NH2、SO2NHR21或SO2NR21R22; R 12 , R 13 , R 14 , R 15 , R 17 , R 18 , R 19 and R 20 independently of all other groups are hydrogen atom, halogen atom, R 21 , COOH, COOR 21 , COO − , CONH 2 , CONHR 21 , CONR 21 R 22 , CN, OH, OR 21 , COCR 21 , OOCNH 2 , OOCNHR 21 , OOCNR 21 R 22 , NO 2 , NH 2 , NHR 21 , NR 21 R 22 , NHCOR 22 , NR 21 COR 22 , N=CH 2 , N=CHR 21 , N=CR 21 R 22 , SH, SR 21 , SOR 21 , SO 2 R 21 , SO 3 R 21 , SO 3 H, SO 3 − , SO 2 NH 2 , SO 2 NHR 21 or SO 2 NR 21 R 22 ;
且選自由R12與R13、R13與R14、R14與R15、R17與R18、R18與R19、及R19與R20所組成群組中之至少1個組合可相互直接鍵結或者藉由氧原子、硫原子、NH或NR21橋接而相互鍵結; And at least one combination selected from the group consisting of R 12 and R 13 , R 13 and R 14 , R 14 and R 15 , R 17 and R 18 , R 18 and R 19 , and R 19 and R 20 may be bonded directly to each other or bonded to each other by bridging of oxygen atoms, sulfur atoms, NH or NR 21 ;
R21及R22相互獨立地為碳數1~12之烷基、碳數3~12之環烷基、碳數2~12之烯基、碳數3~12之環烯基或碳數2~12之炔基。) R 21 and R 22 are independently of each other an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or a cycloalkenyl group having 3 to 12 carbon atoms. Alkynyl of ~12. )
[8]如[1]至[7]中任一項所記載之著色間隔件形成用感光性著色組成物,其中,上述(a)著色劑含有碳黑。 [8] The photosensitive coloring composition for forming a colored spacer according to any one of [1] to [7], wherein the (a) colorant contains carbon black.
[9]如[1]所記載之著色間隔件形成用感光性著色組成物,其中,上述(a)著色劑含有有機顏料及碳黑。 [9] The photosensitive coloring composition for forming a colored spacer according to [1], wherein the (a) colorant contains an organic pigment and carbon black.
[10]如[9]所記載之著色間隔件形成用感光性著色組成物,其中,上述有機顏料含有選自由紅色顏料、橙色顏料、藍色顏料及紫色顏料所組成群組中之至少1種。 [10] The photosensitive coloring composition for forming a colored spacer according to [9], wherein the organic pigment contains at least one selected from the group consisting of a red pigment, an orange pigment, a blue pigment, and a violet pigment .
[11]如[9]或[10]所記載之著色間隔件形成用感光性著色組成物,其中,上述有機顏料含有選自由以下之(1)~(4)所組成群組中之至少1種。 [11] The photosensitive coloring composition for forming a coloring spacer according to [9] or [10], wherein the organic pigment contains at least one selected from the group consisting of (1) to (4) below kind.
(1)選自C.I.顏料紅177、254中之至少1種 (1) At least one selected from C.I. Pigment Red 177 and 254
(2)選自C.I.顏料橙43、64中之至少1種 (2) At least one selected from C.I. Pigment Orange 43 and 64
(3)選自C.I.顏料藍15:6、60中之至少1種 (3) At least one selected from C.I. Pigment Blue 15:6, 60
(4)選自C.I.顏料紫23、29中之至少1種 (4) At least one selected from C.I. Pigment Violet 23 and 29
[12]如[9]至[11]中任一項所記載之著色間隔件形成用感光性著 色組成物,其中,上述有機顏料含有藍色顏料及紫色顏料。 [12] The photosensitive adhesive for forming a colored spacer according to any one of [9] to [11] A color composition, wherein the organic pigment contains a blue pigment and a purple pigment.
[13]如[9]至[12]中任一項所記載之著色間隔件形成用感光性著色組成物,其中,碳黑相對於上述(a)著色劑100質量份之含有比例為5質量份以上且50質量份以下。 [13] The photosensitive coloring composition for forming a coloring spacer according to any one of [9] to [12], wherein the content ratio of carbon black to 100 parts by mass of the colorant (a) is 5 parts by mass part or more and 50 parts by mass or less.
[14]如[1]至[13]中任一項所記載之著色間隔件形成用感光性著色組成物,其中,硬化後之塗膜之膜厚每1μm之光學密度為1.0以上。 [14] The photosensitive coloring composition for forming a colored spacer according to any one of [1] to [13], wherein the optical density per 1 μm of the film thickness of the coating film after curing is 1.0 or more.
[15]如[1]至[14]中任一項所記載之著色間隔件形成用感光性著色組成物,其係用於藉由光微影法而一次形成高度不同之著色間隔件。 [15] The photosensitive coloring composition for forming a colored spacer according to any one of [1] to [14], which is used to form colored spacers having different heights at one time by photolithography.
[16]一種硬化物,其係將如[1]至[15]中任一項所記載之著色間隔件形成用感光性著色組成物硬化所獲得。 [16] A cured product obtained by curing the photosensitive coloring composition for forming a colored spacer according to any one of [1] to [15].
[17]一種著色間隔件,其係由[16]所記載之硬化物所形成。 [17] A colored spacer formed of the cured product described in [16].
[18]一種影像顯示裝置,其具備[17]所記載之著色間隔件。 [18] An image display device including the coloring spacer according to [17].
根據本發明,可提供能夠形成遮光性較高且表面平滑性優異之圖案之感光性著色組成物。又,可提供遮光性且表面平滑性優異之硬化物及著色間隔件,進而,可提供具備此種著色間隔件之影像顯示裝置。 ADVANTAGE OF THE INVENTION According to this invention, the photosensitive coloring composition which can form the pattern with high light-shielding property and excellent surface smoothness can be provided. Moreover, the hardened|cured material and the coloring spacer which are excellent in light-shielding property and surface smoothness can be provided, and further, the image display apparatus provided with such a coloring spacer can be provided.
以下,對本發明之實施形態進行具體說明,但本發明並不限定於以下實施形態,可於其主旨之範圍內進行各種變更而實 施。再者,於本發明中,所謂「(甲基)丙烯酸」意指「丙烯酸及/或甲基丙烯酸」,關於「(甲基)丙烯酸酯」、「(甲基)丙烯醯基」亦同樣。 Hereinafter, the embodiments of the present invention will be specifically described, but the present invention is not limited to the following embodiments, and various modifications can be made within the scope of the gist of the present invention. Shi. In addition, in this invention, "(meth)acrylic acid" means "acrylic acid and/or methacrylic acid", and the same applies to "(meth)acrylate" and "(meth)acryloyl group".
所謂「(共)聚合體」意指包含均聚合體(homopolymer)及共聚合體(copolymer)之兩者,所謂「......酸(酐)」意指包含酸及其酸酐之兩者。又,於本發明中,所謂「丙烯酸系樹脂」意指包含(甲基)丙烯酸之(共)聚合體、包含具有羧基之(甲基)丙烯酸酯之(共)聚合體。 The so-called "(co)polymer" means both a homopolymer and a copolymer, and the so-called "...acid (anhydride)" means both an acid and an acid anhydride thereof . Moreover, in this invention, "acrylic resin" means the (co)polymer containing (meth)acrylic acid, and the (co)polymer containing (meth)acrylate which has a carboxyl group.
又,於本發明中,所謂「單體」係相對於所謂之高分子物質(聚合物)之用語,意指除狹義之單體(monomer)以外,亦包含二聚物、三聚物、低聚物等。 In addition, in the present invention, the term "monomer" refers to the term of the so-called macromolecular substance (polymer), and means that, in addition to the narrowly defined monomer (monomer), it also includes dimer, trimer, low polymer polymer etc.
於本發明中,所謂「總固形份」意指感光性著色組成物中或下述油墨中所包含之除溶劑以外之總成分。 In the present invention, the term "total solid content" means the total components other than the solvent contained in the photosensitive coloring composition or the following ink.
於本發明中,所謂「重量平均分子量」係指利用GPC(凝膠滲透層析法)所得之聚苯乙烯換算之重量平均分子量(Mw)。 In the present invention, the "weight average molecular weight" refers to the weight average molecular weight (Mw) in terms of polystyrene obtained by GPC (gel permeation chromatography).
又,於本發明中,所謂「胺值」,只要未特別說明,則表示有效固形份換算之胺值,且為與分散劑之固形份每1g之鹼基當量之KOH之質量所表示之值。再者,關於測定方法見下文。另一方面,所謂「酸值」,只要未特別說明,則表示有效固形份換算之酸值,其藉由中和滴定而算出。 Moreover, in the present invention, the so-called "amine value" means the amine value in terms of effective solid content unless otherwise specified, and is the value represented by the mass of KOH per 1 g of base equivalent to the solid content of the dispersant. . Again, see below about the assay method. On the other hand, the so-called "acid value" means the acid value in terms of effective solid content, unless otherwise specified, and is calculated by neutralization titration.
又,於本說明書中,「質量」所表示之百分率或份與「重量」所表示之百分率或份含義相同。 In addition, in this specification, the percentage or part represented by "mass" and the percentage or part represented by "weight" have the same meaning.
[感光性著色組成物] [Photosensitive Coloring Composition]
本發明之感光性著色組成物含有 The photosensitive coloring composition of the present invention contains
(a)著色劑 (a) Colorants
(b)鹼可溶性樹脂 (b) Alkali-soluble resin
(c)光聚合起始劑 (c) Photopolymerization initiator
(d)乙烯性不飽和化合物 (d) ethylenically unsaturated compounds
(e)溶劑 (e) Solvent
(f)分散劑 (f) Dispersants
作為必需成分。又,本發明之感光性著色組成物視需要進而包含矽烷偶合劑等密接改善劑、塗佈性改善劑、顯影改良劑、紫外線吸收劑、抗氧化劑、界面活性劑、顏料衍生物等其他調配成分,通常,各調配成分係以溶解或分散於溶劑之狀態使用。 as an essential ingredient. In addition, the photosensitive coloring composition of the present invention may further contain other formulation components such as adhesion improvers such as silane coupling agents, coatability improvers, development improvers, ultraviolet absorbers, antioxidants, surfactants, and pigment derivatives, as necessary. , usually, each formulation component is used in a state of being dissolved or dispersed in a solvent.
本發明之感光性著色組成物能夠形成遮光性較高且表面平滑性優異之圖案,因此可較佳地用於著色間隔件之形成,即,可較佳地用作著色間隔件形成用感光性著色組成物。 The photosensitive coloring composition of the present invention can form a pattern with high light-shielding properties and excellent surface smoothness, so it can be preferably used for the formation of colored spacers, that is, it can be preferably used as a photosensitive material for forming colored spacers Coloring composition.
另一方面,遮光性或表面平滑性等特性係於例如有機電致發光(EL,Electroluminescence)顯示裝置之發光部之間隔壁、尤其是著色間隔壁(著色障壁(bank))等除著色間隔件以外之用途中亦要求之特性,因此可不限於著色間隔件而使用。以下對本發明之感光性著色組成物進行詳述,只要未特別說明,則一併說明著色間隔件用途與著色間隔件以外之用途之兩者。 On the other hand, properties such as light-shielding properties or surface smoothness are used in addition to coloring spacers such as spacers, especially coloring spacers (colored banks), between light-emitting portions of organic electroluminescence (EL) display devices. Since the properties are also required in other applications, it can be used not limited to the colored spacers. The photosensitive coloring composition of the present invention will be described in detail below, and unless otherwise specified, both the coloring spacer application and the application other than the coloring spacer will be described together.
本發明之第1態樣相關之感光性著色組成物中,(a)著色劑含有選自由紅色顏料及橙色顏料所組成群組中之至少1種、及選自由藍色顏料及紫色顏料所組成群組中之至少1種,且(c)光聚 合起始劑包含下述式(I)所表示之肟酯系化合物。 In the photosensitive coloring composition according to the first aspect of the present invention, (a) the colorant contains at least one selected from the group consisting of a red pigment and an orange pigment, and a blue pigment and a purple pigment. At least 1 of the group, and (c) photopolymerization The co-starter contains an oxime ester compound represented by the following formula (I).
又,本發明之第2態樣相關之感光性著色組成物中,(a)著色劑包含作為下述通式(1)所表示之化合物、其幾何異構物、其鹽、或其幾何異構物之鹽之有機黑色顏料(以下,有時簡寫為「通式(1)所表示之有機黑色顏料」)。 Moreover, in the photosensitive coloring composition according to the second aspect of the present invention, (a) the colorant contains a compound represented by the following general formula (1), its geometric isomer, its salt, or its geometric isomer. The organic black pigment of the salt of the structure (hereinafter, it may be abbreviated as "the organic black pigment represented by general formula (1)").
又,本發明之第3態樣相關之感光性著色組成物中,(a)著色劑含有有機顏料及碳黑,且(c)光聚合起始劑包含下述式(I)所表示之肟酯系化合物。 Furthermore, in the photosensitive coloring composition according to the third aspect of the present invention, (a) the colorant contains an organic pigment and carbon black, and (c) the photopolymerization initiator contains an oxime represented by the following formula (I) ester compound.
另一方面,本發明之第4態樣之感光性著色組成物係著色間隔件形成用感光性著色組成物,且(c)光聚合起始劑包含下述式(I)所表示之肟酯系化合物。 On the other hand, the photosensitive coloring composition of the 4th aspect of this invention is a photosensitive coloring composition for coloring spacer formation, and (c) the photopolymerization initiator contains the oxime ester represented by following formula (I) series compounds.
以下,只要未特別說明,則「本發明之感光性著色組成物」係指上述第1~4態樣之所有感光性著色組成物。 Hereinafter, unless otherwise specified, the "photosensitive coloring composition of the present invention" refers to all the photosensitive coloring compositions of the above-mentioned 1st to 4th aspects.
<(a)著色劑> <(a) Colorant>
本發明之第1態樣之感光性著色組成物中所使用之(a)著色劑含有選自由紅色顏料及橙色顏料所組成群組中之至少1種、及選自由藍色顏料及紫色顏料所組成群組中之至少1種。如此,本發明之第1態樣之感光性著色組成物藉由含有特定之有機著色顏料而可達成高遮光性。 The (a) colorant used in the photosensitive coloring composition of the first aspect of the present invention contains at least one selected from the group consisting of a red pigment and an orange pigment, and a blue pigment and a violet pigment. Form at least one of the groups. Thus, the photosensitive coloring composition of the 1st aspect of this invention can achieve high light-shielding property by containing a specific organic coloring pigment.
作為(a)著色劑較佳為使用顏料,作為顏料,可使用無機顏料亦可使用有機顏料。就容易抑制液晶電壓保持率之降低而且抑制紫外線之吸收而控制形狀或階差之觀點而言,較佳為使用有機顏料。 It is preferable to use a pigment as (a) a coloring agent, and an inorganic pigment may be used as a pigment, and an organic pigment may be used. It is preferable to use an organic pigment from a viewpoint of easily suppressing the fall of a liquid crystal voltage holding ratio, and suppressing the absorption of an ultraviolet-ray, and controlling a shape and a level|step difference.
該等顏料之化學構造並無特別限定。例如除偶氮系、酞菁系、喹吖酮系、苯并咪唑酮系、異吲哚啉酮系、二系、陰丹士林系、苝系等有機顏料以外,亦可利用各種無機顏料等。以下,以顏料編號表示可使用之顏料之具體例。以下所列舉之「C.I.顏料紅2」等用語意指顏色索引(C.I.)。 The chemical structure of these pigments is not particularly limited. For example, in addition to azo series, phthalocyanine series, quinacridone series, benzimidazolone series, isoindolinone series, In addition to organic pigments such as indanthrene series, indanthrene series, and perylene series, various inorganic pigments can also be used. Below, the specific example of the pigment which can be used is shown by the pigment number. The terms such as "CI Pigment Red 2" listed below mean the color index (CI).
作為紅色顏料,可列舉:C.I.顏料紅1、2、3、4、5、6、7、8、9、12、14、15、16、17、21、22、23、31、32、37、38、41、47、48、48:1、48:2、48:3、48:4、49、49:1、49:2、50:1、52:1、52:2、53、53:1、53:2、53:3、57、57:1、57:2、58:4、60、63、63:1、63:2、64、64:1、68、69、81、81:1、81:2、81:3、81:4、83、88、90:1、101、101:1、104、108、108:1、109、112、113、114、122、123、144、146、147、149、151、166、168、169、170、172、173、174、175、176、177、178、179、181、184、185、187、188、190、193、194、200、202、206、207、208、209、210、214、216、220、221、224、230、231、232、233、235、236、237、238、239、242、243、245、247、249、250、251、253、254、255、256、257、258、259、260、262、263、264、265、266、267、268、269、270、271、272、273、274、275、276。 Examples of red pigments include: C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53: 1, 53:2, 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81: 1, 81: 2, 81: 3, 81: 4, 83, 88, 90: 1, 101, 101: 1, 104, 108, 108: 1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276.
其中,可較佳地列舉C.I.顏料紅48:1、122、168、177、202、206、207、209、224、242、254,進而較佳為C.I.顏料紅177、209、224、254。 Among them, C.I. Pigment Red 48:1, 122, 168, 177, 202, 206, 207, 209, 224, 242, 254 can be preferably cited, and more preferably C.I. Pigment Red 177, 209, 224, 254.
再者,於分散性或遮光性之方面,較佳為使用C.I.顏料紅177、254、272。於利用紫外線使本發明之第1態樣之感光性著色組成物硬化之情形時,作為紅色顏料,較佳為使用紫外線吸收 率較低者。就該觀點而言,更佳為使用C.I.顏料紅254、272。 Furthermore, C.I. Pigment Red 177, 254, and 272 are preferably used in terms of dispersibility and light-shielding properties. In the case of curing the photosensitive coloring composition of the first aspect of the present invention with ultraviolet rays, it is preferable to use an ultraviolet absorber as the red pigment. lower rate. From this viewpoint, it is more preferable to use C.I. Pigment Red 254 and 272.
作為橙色(orange)顏料,可列舉:C.I.顏料橙1、2、5、13、16、17、19、20、21、22、23、24、34、36、38、39、43、46、48、49、61、62、64、65、67、68、69、70、71、72、73、74、75、77、78、79。 Examples of orange pigments include: C.I. Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48 , 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79.
其中,可較佳地列舉C.I.顏料橙38、71。再者,於分散性或遮光性之方面,較佳為使用C.I.顏料橙43、64、72。於利用紫外線使本發明之第1態樣之感光性著色組成物硬化之情形時,作為橙色顏料,較佳為使用紫外線吸收率較低者。就該觀點而言,更佳為使用C.I.顏料橙64、72。 Among them, C.I. Pigment Orange 38 and 71 are preferably mentioned. Furthermore, C.I. Pigment Orange 43, 64, and 72 are preferably used in terms of dispersibility and light-shielding properties. When hardening the photosensitive coloring composition of the 1st aspect of this invention with an ultraviolet-ray, it is preferable to use the thing with a low ultraviolet absorptivity as an orange pigment. From this viewpoint, it is more preferable to use C.I. Pigment Orange 64 and 72.
作為藍色顏料,可列舉:C.I.顏料藍1、1:2、9、14、15、15:1、15:2、15:3、15:4、15:6、16、17、19、25、27、28、29、33、35、36、56、56:1、60、61、61:1、62、63、66、67、68、71、72、73、74、75、76、78、79。 Examples of blue pigments include: C.I. Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25 , 27, 28, 29, 33, 35, 36, 56, 56: 1, 60, 61, 61: 1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78 , 79.
其中,可較佳地列舉C.I.顏料藍15、15:1、15:2、15:3、15:4、15:6,進而較佳為C.I.顏料藍15:6。 Among them, C.I. Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6 is preferably used, and C.I. Pigment Blue 15:6 is more preferred.
再者,於分散性或遮光性之方面,較佳為使用C.I.顏料藍15:6、16、60。於利用紫外線使本發明之第1態樣之感光性著色組成物硬化之情形時,作為藍色顏料,較佳為使用紫外線吸收率較低者。就該觀點而言,更佳為使用C.I.顏料藍60。 Furthermore, it is preferable to use C.I. Pigment Blue 15:6, 16, 60 from the viewpoint of dispersibility and light-shielding property. When hardening the photosensitive coloring composition of the 1st aspect of this invention with an ultraviolet-ray, it is preferable to use the thing with a low ultraviolet absorptivity as a blue pigment. From this viewpoint, it is more preferable to use C.I. Pigment Blue 60.
作為紫色顏料,可列舉:C.I.顏料紫1、1:1、2、2:2、3、3:1、3:3、5、5:1、14、15、16、19、23、25、27、29、31、32、37、39、42、44、47、49、50。 Examples of purple pigments include: C.I. Pigment Violet 1, 1: 1, 2, 2: 2, 3, 3: 1, 3: 3, 5, 5: 1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50.
其中,可較佳地列舉C.I.顏料紫19、23,進而較佳為 C.I.顏料紫23。 Among them, C.I. Pigment Violet 19 and 23 can be preferably cited, and more preferred are C.I. Pigment Violet 23.
再者,於分散性或遮光性之方面,較佳為使用C.I.顏料紫23、29。於利用紫外線使本發明之第1態樣之感光性著色組成物硬化之情形時,作為紫色顏料,較佳為使用紫外線吸收率較低者。就該觀點而言,更佳為使用C.I.顏料紫29。 Furthermore, it is preferable to use C.I. Pigment Violet 23 and 29 from the viewpoint of dispersibility and light-shielding property. When hardening the photosensitive coloring composition of the 1st aspect of this invention with an ultraviolet-ray, it is preferable to use the thing with a low ultraviolet absorptivity as a violet pigment. From this viewpoint, it is more preferable to use C.I. Pigment Violet 29.
作為除紅色顏料、橙色顏料、藍色顏料、紫色顏料以外可使用之有機著色顏料,例如可列舉綠色顏料、黃色顏料等。 Examples of organic coloring pigments that can be used other than red pigments, orange pigments, blue pigments, and violet pigments include green pigments, yellow pigments, and the like.
作為綠色顏料,可列舉:C.I.顏料綠1、2、4、7、8、10、13、14、15、17、18、19、26、36、45、48、50、51、54、55。其中,可較佳地列舉C.I.顏料綠7、36。 Examples of the green pigment include C.I. Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, and 55. Among them, C.I. Pigment Green 7 and 36 are preferably mentioned.
作為黃色顏料,可列舉:C.I.顏料黃1、1:1、2、3、4、5、6、9、10、12、13、14、16、17、24、31、32、34、35、35:1、36、36:1、37、37:1、40、41、42、43、48、53、55、61、62、62:1、63、65、73、74、75、81、83、87、93、94、95、97、100、101、104、105、108、109、110、111、116、117、119、120、126、127、127:1、128、129、133、134、136、138、139、142、147、148、150、151、153、154、155、157、158、159、160、161、162、163、164、165、166、167、168、169、170、172、173、174、175、176、180、181、182、183、184、185、188、189、190、191、191:1、192、193、194、195、196、197、198、199、200、202、203、204、205、206、207、208。 Examples of yellow pigments include: C.I. Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62:1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133, 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 189, 190, 191, 191: 1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 204, 205, 206, 207, 208.
其中,可較佳地列舉C.I.顏料黃83、117、129、138、139、150、154、155、180、185,進而較佳為C.I.顏料黃83、138、139、150、180。 Among them, C.I. Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185 are preferably cited, and C.I. Pigment Yellow 83, 138, 139, 150, 180 are more preferred.
該等之中,就遮光性或形狀及階差之控制之觀點而言,較佳為含有以下顏料中之至少1種以上者。 Among these, it is preferable to contain at least 1 type or more of the following pigments from the viewpoint of light-shielding property or control of shape and level difference.
紅色顏料:C.I.顏料紅177、254、272 Red Pigment: C.I. Pigment Red 177, 254, 272
橙色顏料:C.I.顏料橙43、64、72 Orange Pigment: C.I. Pigment Orange 43, 64, 72
藍色顏料:C.I.顏料藍15:6、60 Blue Pigment: C.I. Pigment Blue 15:6, 60
紫色顏料:C.I.顏料紫23、29 Purple Pigment: C.I. Pigment Violet 23, 29
又,就遮光性或形狀及階差之控制之觀點而言,紅色顏料較佳為以下之(1),橙色顏料較佳為以下之(2),藍色顏料較佳為以下之(3),紫色顏料較佳為以下之(4)。 Furthermore, from the viewpoint of light-shielding properties or control of shape and level difference, the red pigment is preferably the following (1), the orange pigment is preferably the following (2), and the blue pigment is preferably the following (3) , the purple pigment is preferably the following (4).
(1)選自C.I.顏料紅177、254中之至少1種 (1) At least one selected from C.I. Pigment Red 177 and 254
(2)選自C.I.顏料橙43、64中之至少1種 (2) At least one selected from C.I. Pigment Orange 43 and 64
(3)選自C.I.顏料藍15:6、60中之至少1種 (3) At least one selected from C.I. Pigment Blue 15:6, 60
(4)選自C.I.顏料紫23、29中之至少1種 (4) At least one selected from C.I. Pigment Violet 23 and 29
再者,關於顏色之組合並無特別限定,就遮光性之觀點而言,例如可列舉:紅色顏料與藍色顏料之組合、藍色顏料與橙色顏料之組合、藍色顏料、橙色顏料與紫色顏料之組合等。 In addition, the combination of colors is not particularly limited, and from the viewpoint of light-shielding properties, for example, a combination of a red pigment and a blue pigment, a combination of a blue pigment and an orange pigment, a blue pigment, an orange pigment and a violet can be mentioned. A combination of pigments, etc.
進而,除該等著色顏料外,可進而使用黑色色材。黑色色材之中,就容易抑制液晶之電壓保持率之降低而且抑制紫外線之吸收而控制形狀或階差之觀點而言,較佳為使用有機黑色顏料,尤其就遮光性之觀點而言,較佳為使用作為下述式(1)所表示之化合物、其幾何異構物、其鹽、或其幾何異構物之鹽之有機黑色顏料。 Furthermore, in addition to these coloring pigments, a black color material can be further used. Among the black color materials, it is preferable to use an organic black pigment, especially from the viewpoint of light-shielding properties, from the viewpoint of easily suppressing the decrease in the voltage holding ratio of the liquid crystal and controlling the shape and the level difference by suppressing the absorption of ultraviolet rays. It is preferable to use the organic black pigment which is the compound represented by following formula (1), its geometric isomer, its salt, or its salt of a geometric isomer.
[化3]
式(1)中,R11及R16相互獨立地為氫原子、CH3、CF3、氟原子或氯原子; In formula (1), R 11 and R 16 are independently a hydrogen atom, CH 3 , CF 3 , a fluorine atom or a chlorine atom;
R12、R13、R14、R15、R17、R18、R19及R20與其他所有基相互獨立地為氫原子、鹵素原子、R21、COOH、COOR21、COO-、CONH2、CONHR21、CONR21R22、CN、OH、OR21、COCR21、OOCNH2、OOCNHR21、OOCNR21R22、NO2、NH2、NHR21、NR21R22、NHCOR22、NR21COR22、N=CH2、N=CHR21、N=CR21R22、SH、SR21、SOR21、SO2R21、SO3R21、SO3H、SO3 -、SO2NH2、SO2NHR21或SO2NR21R22; R 12 , R 13 , R 14 , R 15 , R 17 , R 18 , R 19 and R 20 and all other groups are independently a hydrogen atom, a halogen atom, R 21 , COOH, COOR 21 , COO − , CONH 2 , CONHR 21 , CONR 21 R 22 , CN, OH, OR 21 , COCR 21 , OOCNH 2 , OOCNHR 21 , OOCNR 21 R 22 , NO 2 , NH 2 , NHR 21 , NR 21 R 22 , NHCOR 22 , NR 21 COR 22 , N=CH 2 , N=CHR 21 , N=CR 21 R 22 , SH, SR 21 , SOR 21 , SO 2 R 21 , SO 3 R 21 , SO 3 H, SO 3 − , SO 2 NH 2 , SO 2 NHR 21 or SO 2 NR 21 R 22 ;
且選自由R12與R13、R13與R14、R14與R15、R17與R18、R18與R19、及R19與R20所組成群組中之至少1個組合可相互直接鍵結或者藉由氧原子、硫原子、NH或NR21橋接而相互鍵結; And at least one combination selected from the group consisting of R 12 and R 13 , R 13 and R 14 , R 14 and R 15 , R 17 and R 18 , R 18 and R 19 , and R 19 and R 20 may be bonded directly to each other or bonded to each other by bridging of oxygen atoms, sulfur atoms, NH or NR 21 ;
R21及R22相互獨立地為碳數1~12之烷基、碳數3~12之環烷基、碳數2~12之烯基、碳數3~12之環烯基或碳數2~12之炔基。 R 21 and R 22 are independently of each other an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or a cycloalkenyl group having 3 to 12 carbon atoms. Alkynyl of ~12.
通式(1)所表示之化合物之幾何異構物具有以下之核心構造(其中,省略構造式中之取代基),推測反式-反式異構物最為穩定。 The geometric isomer of the compound represented by the general formula (1) has the following core structure (wherein, the substituent in the structural formula is omitted), and the trans-trans isomer is presumed to be the most stable.
[化4]
於通式(1)所表示之化合物為陰離子性之情形時,較佳為藉由任意公知之合適之陽離子、例如金屬、有機、無機或金屬有機陽離子、具體而言為鹼金屬、鹼土金屬、過渡金屬、一級銨、二級銨、三烷基銨等三級銨、四烷基銨等四級銨或有機金屬錯合物補償其電荷之鹽。又,於通式(1)所表示之化合物之幾何異構物為陰離子性之情形時,較佳為相同之鹽。 When the compound represented by the general formula (1) is anionic, it is preferably prepared by any known suitable cation, such as metal, organic, inorganic or metal-organic cations, specifically alkali metals, alkaline earth metals, Salts of transition metals, primary ammonium, secondary ammonium, tertiary ammonium such as trialkyl ammonium, quaternary ammonium such as tetraalkyl ammonium, or organometallic complexes to compensate for their charge. In addition, when the geometric isomer of the compound represented by the general formula (1) is anionic, it is preferably the same salt.
於通式(1)之取代基及其等之定義中,就存在遮蔽率變高之傾向而言,以下較佳。其原因在於認為以下之取代基不存在吸收,不會對顏料之色調造成影響。 In the definitions of the substituents of the general formula (1) and the like, since there is a tendency that the shielding ratio becomes high, the following are preferable. The reason is that the following substituents do not have absorption and do not affect the color tone of the pigment.
R12、R14、R15、R17、R19及R20相互獨立地較佳為氫原子、氟原子、或氯原子,進而較佳為氫原子。R13及R18相互獨立地較佳為氫原子、NO2、OCH3、OC2H5、溴原子、氯原子、CH3、C2H5、N(CH3)2、N(CH3)(C2H5)、N(C2H5)2、α-萘基、β-萘基、SO3H或SO3 -,進而較佳為氫原子或SO3H。 R 12 , R 14 , R 15 , R 17 , R 19 and R 20 are each independently preferably a hydrogen atom, a fluorine atom, or a chlorine atom, and more preferably a hydrogen atom. R 13 and R 18 independently of each other are preferably hydrogen atom, NO 2 , OCH 3 , OC 2 H 5 , bromine atom, chlorine atom, CH 3 , C 2 H 5 , N(CH 3 ) 2 , N(CH 3 )(C 2 H 5 ), N(C 2 H 5 ) 2 , α-naphthyl, β-naphthyl, SO 3 H or SO 3 − , more preferably a hydrogen atom or SO 3 H.
R11及R16相互獨立地較佳為氫原子、CH3或CF3,進而較佳為氫原子。 R 11 and R 16 independently of each other are preferably a hydrogen atom, CH 3 or CF 3 , and more preferably a hydrogen atom.
較佳為選自由R11與R16、R12與R17、R13與R18、R14與R19、及R15與R20所組成群組中之至少1個組合相同,更佳為R11與R16相同,R12與R17相同,R13與R18相同,R14與R19相同,且R15與R20相同。 Preferably, at least one combination selected from the group consisting of R 11 and R 16 , R 12 and R 17 , R 13 and R 18 , R 14 and R 19 , and R 15 and R 20 is the same, more preferably R 11 is the same as R 16 , R 12 is the same as R 17 , R 13 is the same as R 18 , R 14 is the same as R 19 , and R 15 is the same as R 20 .
碳數1~12之烷基例如為甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、2-甲基丁基、正戊基、2-戊基、3-戊基、2,2-二甲基丙基、正己基、庚基、正辛基、1,1,3,3-四甲基丁基、2-乙基己基、壬基、癸基、十一烷基或十二烷基。 Examples of alkyl groups having 1 to 12 carbon atoms are methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, 2-methylbutyl, n-butyl Pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, n-hexyl, heptyl, n-octyl, 1,1,3,3-tetramethylbutyl, 2-ethyl Hexyl, nonyl, decyl, undecyl or dodecyl.
碳數3~12之環烷基例如為環丙基、環丙基甲基、環丁基、環戊基、環己基、環己基甲基、三甲基環己基、苧基、降基、基、降蒈烷基、蒈烷基、薄荷基、降蒎基、蒎基、1-金剛烷基或2-金剛烷基。 Cycloalkyl with 3 to 12 carbon atoms is, for example, cyclopropyl, cyclopropylmethyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, trimethylcyclohexyl, limoneyl, normyl base, group, norcarenyl, carenyl, menthyl, norpinyl, pinenyl, 1-adamantyl or 2-adamantyl.
碳數2~12之烯基例如為乙烯基、烯丙基、2-丙烯-2-基、2-丁烯-1-基、3-丁烯-1-基、1,3-丁二烯-2-基、2-戊烯-1-基、3-戊烯-2-基、2-薄荷基-1-丁烯-3-基、2-甲基-3-丁烯-2-基、3-甲基-2-丁烯-1-基、1,4-戊二烯-3-基、己烯基、辛烯基、壬烯基、癸烯基或十二烯基。 Examples of alkenyl groups having 2 to 12 carbon atoms include vinyl, allyl, 2-propen-2-yl, 2-buten-1-yl, 3-buten-1-yl, and 1,3-butadiene. -2-yl, 2-penten-1-yl, 3-penten-2-yl, 2-menthyl-1-buten-3-yl, 2-methyl-3-buten-2-yl , 3-methyl-2-buten-1-yl, 1,4-pentadien-3-yl, hexenyl, octenyl, nonenyl, decenyl or dodecenyl.
碳數3~12之環烯基例如為2-環丁烯-1-基、2-環戊烯-1-基、2-環己烯-1-基、3-環己烯-1-基、2,4-環己二烯-1-基、1-對薄荷烯-8-基、4(10)-苧二烯-10-基、2-降烯-1-基、2,5-降二烯-1-基、7,7-二甲基-2,4-降蒈二烯-3-基或莰烯基。 Cycloalkenyl having 3 to 12 carbon atoms is, for example, 2-cyclobuten-1-yl, 2-cyclopenten-1-yl, 2-cyclohexen-1-yl, and 3-cyclohexen-1-yl , 2,4-cyclohexadien-1-yl, 1-p-menthen-8-yl, 4(10)-limone-10-yl, 2-nor Alken-1-yl, 2,5-nor Dien-1-yl, 7,7-dimethyl-2,4-norcaren-3-yl or camphenyl.
碳數2~12之炔基例如為1-丙炔-3-基、1-丁炔-4-基、1-戊炔-5-基、2-甲基-3-丁炔-2-基、1,4-戊二炔-3-基、1,3-戊二炔-5-基、1-己炔-6-基、順-3-甲基-2-戊烯-4-炔-1-基、反-3-甲基-2-戊烯-4-炔-1-基、1,3-己二炔-5-基、1-辛炔-8-基、1-壬炔-9-基、1-癸炔-10-基或1-十二炔-12-基。 Examples of alkynyl groups having 2 to 12 carbon atoms are 1-propyn-3-yl, 1-butyn-4-yl, 1-pentyn-5-yl, 2-methyl-3-butyn-2-yl , 1,4-pentadiyn-3-yl, 1,3-pentadiyn-5-yl, 1-hexyn-6-yl, cis-3-methyl-2-penten-4-yn- 1-yl, trans-3-methyl-2-penten-4-yn-1-yl, 1,3-hexadiyn-5-yl, 1-octyn-8-yl, 1-nonyn- 9-yl, 1-decyn-10-yl or 1-dodecyn-12-yl.
鹵素原子例如為氟原子、氯原子、溴原子或碘原子。 The halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
上述通式(1)所表示之有機黑色顏料較佳為下述通式(2)所表示之化合物。 The organic black pigment represented by the above general formula (1) is preferably a compound represented by the following general formula (2).
[化5]
作為此種有機黑色顏料之具體例,以商品名可列舉Irgaphor(註冊商標)Black S 0100 CF(BASF公司製造)。該有機黑色顏料較佳為藉由下述分散劑、溶劑、方法分散而使用。又,若於分散時存在上述通式(2)之磺酸衍生物,則有分散性或保存性提高之情形。 Specific examples of such organic black pigments include Irgaphor (registered trademark) Black S 0100 CF (manufactured by BASF) as a trade name. The organic black pigment is preferably used by dispersing with the following dispersant, solvent, and method. Moreover, when the sulfonic acid derivative of the said general formula (2) exists at the time of dispersion|distribution, the dispersibility and storage property may improve.
作為上述通式(1)所表示之有機黑色顏料以外之黑色色材,可列舉:碳黑、乙炔黑、燈黑、骨黑、石墨、鐵黑、苯胺黑、花青黑、鈦黑、苝黑等。該等之中,就遮光性、影像特性之觀點而言,可較佳地使用碳黑。作為碳黑之例,可列舉如下碳黑。 Examples of black color materials other than the organic black pigment represented by the general formula (1) include carbon black, acetylene black, lamp black, bone black, graphite, iron black, aniline black, cyanine black, titanium black, perylene black etc. Among these, carbon black can be preferably used from the viewpoint of light-shielding properties and image characteristics. Examples of carbon blacks include the following carbon blacks.
三菱化學公司製造:MA7、MA8、MA11、MA77、MA100、MA100R、MA100S、MA220、MA230、MA600、MCF88、#5、#10、#20、#25、#30、#32、#33、#40、#44、#45、#47、#50、#52、#55、#650、#750、#850、#900、#950、#960、#970、#980、#990、#1000、#2200、#2300、#2350、#2400、#2600、#2650、#3030、#3050、#3150、#3250、#3400、#3600、#3750、#3950、#4000、#4010、OIL7B、OIL9B、OIL11B、OIL30B、OIL31B Made by Mitsubishi Chemical Corporation: MA7, MA8, MA11, MA77, MA100, MA100R, MA100S, MA220, MA230, MA600, MCF88, #5, #10, #20, #25, #30, #32, #33, #40 , #44, #45, #47, #50, #52, #55, #650, #750, #850, #900, #950, #960, #970, #980, #990, #1000, # 2200, #2300, #2350, #2400, #2600, #2650, #3030, #3050, #3150, #3250, #3400, #3600, #3750, #3950, #4000, #4010, OIL7B, OIL9B , OIL11B, OIL30B, OIL31B
Degussa公司製造:Printex(註冊商標,下同)3、Printex30P、Printex30、Printex300P、Printex40、Printex45、Printex55、Printex60、Printex75、Printex80、Printex85、Printex90、Printex A、Printex L、Printex G、Printex P、Printex U、Printex V、 SpecialBlack550、SpecialBlack350、SpecialBlack250、SpecialBlack100、SpecialBlack6、SpecialBlack5、SpecialBlack4、Color Black FW1、Color Black FW2、Color Black FW2V、Color Black FW18、Color Black FW200、Color Black S160、Color Black S170 Manufactured by Degussa Corporation: Printex (registered trademark, the same below) 3, Printex30P, Printex30, Printex300P, Printex40, Printex45, Printex55, Printex60, Printex75, Printex80, Printex85, Printex90, Printex A, Printex L, Printex G, Printex P, Printex U , Printex V, SpecialBlack550, SpecialBlack350, SpecialBlack250, SpecialBlack100, SpecialBlack6, SpecialBlack5, SpecialBlack4, Color Black FW1, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW200, Color Black S160, Color Black S170
Cabot公司製造:Monarch(註冊商標,下同)120、Monarch280、Monarch460、Monarch800、Monarch880、Monarch900、Monarch1000、Monarch1100、Monarch1300、Monarch1400、Monarch4630、REGAL(註冊商標,下同)99、REGAL99R、REGAL415、REGAL415R、REGAL250、REGAL250R、REGAL330、REGAL400R、REGAL55R0、REGAL660R、BLACK PEARLS480、PEARLS130、VULCAN(註冊商標,下同)XC72R、ELFTEX(註冊商標)-8 Cabot manufactures: Monarch (registered trademark, the same below) 120, Monarch280, Monarch460, Monarch800, Monarch880, Monarch900, Monarch1000, Monarch1100, Monarch1300, Monarch1400, Monarch4630, REGAL (registered trademark, the same below) 99, REGAL99R, REGAL415, REGAL415R, REGAL250, REGAL250R, REGAL330, REGAL400R, REGAL55R0, REGAL660R, BLACK PEARLS480, PEARLS130, VULCAN (registered trademark, the same below) XC72R, ELFTEX (registered trademark)-8
Columbian Carbon公司製造:RAVEN(註冊商標,下同)11、RAVEN14、RAVEN15、RAVEN16、RAVEN22、RAVEN30、RAVEN35、RAVEN40、RAVEN410、RAVEN420、RAVEN450、RAVEN500、RAVEN780、RAVEN850、RAVEN890H、RAVEN1000、RAVEN1020、RAVEN1040、RAVEN1060U、RAVEN1080U、RAVEN1170、RAVEN1190U、RAVEN1250、RAVEN1500、RAVEN2000、RAVEN2500U、RAVEN3500、RAVEN5000、RAVEN5250、RAVEN5750、RAVEN7000 Manufactured by Columbian Carbon: RAVEN (registered trademark, the same below) 11, RAVEN14, RAVEN15, RAVEN16, RAVEN22, RAVEN30, RAVEN35, RAVEN40, RAVEN410, RAVEN420, RAVEN450, RAVEN500, RAVEN780, RAVEN850, RAVEN890H, RAVEN1000, RAVEN10004 , RAVEN1080U, RAVEN1170, RAVEN1190U, RAVEN1250, RAVEN1500, RAVEN2000, RAVEN2500U, RAVEN3500, RAVEN5000, RAVEN5250, RAVEN5750, RAVEN7000
碳黑亦可使用由樹脂所被覆者。若使用由樹脂所被覆之碳黑,則有使對玻璃基板之密接性或體積電阻值提高之效果。作為由樹脂所被覆之碳黑,例如可較佳地使用日本專利特開平09-71733號公報中所記載之碳黑等。於體積電阻或介電係數之方 面,較佳為使用樹脂被覆碳黑。 As carbon black, one covered with resin can also be used. When carbon black coated with resin is used, there is an effect of improving the adhesion to the glass substrate and the volume resistance value. As the carbon black covered with resin, for example, carbon black described in Japanese Patent Laid-Open No. 09-71733 can be preferably used. in terms of volume resistance or permittivity On the other hand, resin-coated carbon black is preferably used.
作為供於利用樹脂進行之被覆處理之碳黑,較佳為Na與Ca之合計含量為100ppm以下。碳黑通常以百分數等級含有以自製造時之原料油或燃燒油(或氣體)、反應停止水或造粒水、以及反應爐之爐材等混入之Na或Ca、K、Mg、Al、Fe等作為組成之灰分。其中,Na或Ca一般各含有數百ppm以上,藉由減少該等,有可抑制對透明電極(ITO)或其他電極之浸透而防止電性短路之傾向。 It is preferable that the total content of Na and Ca is 100 ppm or less as carbon black used for the coating treatment with resin. Carbon black usually contains Na or Ca, K, Mg, Al, Fe mixed with raw material oil or combustion oil (or gas) from the time of manufacture, reaction stop water or granulation water, and furnace materials of the reaction furnace, etc. and so on as the composition of ash. Among them, Na and Ca generally contain several hundred ppm or more, and by reducing these, penetration into transparent electrodes (ITO) or other electrodes tends to be suppressed and electrical short-circuiting tends to be prevented.
作為減少該等包含Na或Ca之灰分之含量之方法,能夠藉由如下方法實現,即,作為製造碳黑時之原料油或燃料油(或氣體)以及反應停止水,嚴選該等之含量儘量少者;及儘量減少調整結構之鹼性物質之添加量。作為其他方法,可列舉利用水或鹽酸等清洗自爐中製出之碳黑而將Na或Ca溶解並去除之方法。 As a method of reducing the content of the ash containing Na or Ca, it can be achieved by carefully selecting the content of the raw material oil or fuel oil (or gas) and the reaction stop water when producing carbon black As little as possible; and minimize the amount of alkaline substances added to adjust the structure. As another method, the method of dissolving and removing Na or Ca by washing|cleaning the carbon black produced from a furnace with water, hydrochloric acid, etc. is mentioned.
具體而言,使碳黑混合分散於水、鹽酸、或過氧化氫水之後,若向水中添加難溶之溶劑,則碳黑移動至溶劑側而與水完全地分離,並且存在於碳黑中之大部分Na或Ca溶解於水或酸並被去除。為了將Na與Ca之合計量減少至100ppm以下,有單獨利用嚴選原材料之碳黑製造過程或者單獨利用水或酸溶解之方式便能夠實現之情形,藉由併用該2種方式,可更容易地將Na與Ca之合計量設為100ppm以下。 Specifically, after mixing and dispersing carbon black in water, hydrochloric acid, or hydrogen peroxide water, if a poorly soluble solvent is added to the water, the carbon black moves to the solvent side and is completely separated from the water, and exists in the carbon black. Most of the Na or Ca are dissolved in water or acid and removed. In order to reduce the total amount of Na and Ca to 100 ppm or less, it may be possible to use the carbon black production process of carefully selected raw materials alone or the method of dissolving with water or acid alone. By using these two methods together, it is easier to The total amount of Na and Ca is made 100 ppm or less.
又,樹脂被覆碳黑較佳為pH6以下之所謂之酸性碳黑。由於在水中之分散直徑(聚結直徑)變小,故而較佳為能夠被覆至微細單元。進而,較佳為平均粒徑40nm以下,鄰苯二甲酸二丁酯(DBP)吸收量140ml/100g以下。藉由設為上述範圍內,有獲得 遮光性良好之塗膜之傾向。平均粒徑意指數量平均粒徑,且意指藉由粒子影像解析所求得之圓當量徑,粒子影像解析即於數個視野拍攝利用電子顯微鏡觀察以數萬倍放大所拍攝之照片,且利用影像處理裝置對該等照片之粒子計測2000~3000個左右。 In addition, the resin-coated carbon black is preferably a so-called acid carbon black having a pH of 6 or less. Since the dispersion diameter (coalescing diameter) in water becomes small, it is preferable to be able to coat fine cells. Further, the average particle diameter is preferably 40 nm or less, and the dibutyl phthalate (DBP) absorption amount is preferably 140 ml/100 g or less. By setting it within the above range, it is possible to obtain The tendency of a film with good light-shielding properties. The average particle size refers to the number-average particle size, and refers to the equivalent circle diameter obtained by particle image analysis. The particle image analysis is to take pictures taken at several fields of view and observe with an electron microscope at tens of thousands of times magnification, and About 2,000 to 3,000 particles were counted in these photos using an image processing device.
由樹脂所被覆之碳黑之製備方法並無特別限定,例如適當調整碳黑及樹脂之調配量之後,可採用以下方法等:1.將樹脂與環己酮、甲苯、二甲苯等溶劑混合並加熱溶解獲得樹脂溶液,將該樹脂溶液與將碳黑及水混合而成之懸濁液混合攪拌而使碳黑與水分離,其後將水去除並進行加熱混練而獲得組成物,將該組成物成形為片狀並粉碎之後使之乾燥;2.將與上述同樣地製備之樹脂溶液與懸濁液混合攪拌而將碳黑及樹脂粒狀化之後,將所獲得之粒狀物分離、加熱而將殘留之溶劑及水去除;3.使馬來酸、富馬酸等羧酸溶解於上述例示之溶劑,添加、混合碳黑並使其乾燥,將溶劑去除而獲得添加有羧酸之碳黑之後,向其添加樹脂並乾燥摻和;4.將構成所被覆之樹脂之含反應性基之單體成分與水高速攪拌而製備懸濁液,聚合後冷卻而自聚合體懸濁液獲得含反應性基之樹脂,其後向其添加碳黑而混練,使碳黑與反應性基反應(使碳黑接枝)並進行冷卻及粉碎。 The preparation method of carbon black covered by resin is not particularly limited. For example, after appropriately adjusting the amount of carbon black and resin, the following methods can be used: 1. Mix the resin with a solvent such as cyclohexanone, toluene, and xylene, and mix The resin solution is obtained by heating and dissolving, the resin solution is mixed and stirred with a suspension obtained by mixing carbon black and water to separate the carbon black and water, and then the water is removed and heated and kneaded to obtain a composition. 2. After the resin solution and suspension prepared in the same manner as above are mixed and stirred to granulate the carbon black and resin, the obtained granules are separated and heated And remove the residual solvent and water; 3. Dissolve carboxylic acids such as maleic acid and fumaric acid in the solvent exemplified above, add and mix carbon black and dry it, remove the solvent to obtain carbon added with carboxylic acid After blackening, add resin to it and dry and blend it; 4. Mix the reactive group-containing monomer components constituting the coated resin with water at high speed to prepare a suspension, and cool it after polymerization to obtain a suspension from the polymer The reactive group-containing resin is then kneaded by adding carbon black thereto, reacting the carbon black with the reactive group (grafting the carbon black), cooling and pulverizing.
進行被覆處理之樹脂之種類亦無特別限定,一般為合成樹脂,進而,由於構造中具有苯環之樹脂之兩性系界面活性劑作用更強,故而就分散性及分散穩定性之方面而言較佳。 The type of resin to be coated is also not particularly limited, and is generally a synthetic resin. Furthermore, since the amphoteric surfactant of the resin having a benzene ring in its structure has a stronger effect, it is more effective in terms of dispersibility and dispersion stability. good.
作為具體之合成樹脂,可使用:酚樹脂、三聚氰胺樹脂、二甲苯樹脂、鄰苯二甲酸二烯丙酯樹脂、甘酞樹脂、環氧樹脂、烷基苯樹脂等熱硬化性樹脂、或聚苯乙烯、聚碳酸酯、聚對苯二甲 酸乙二酯、聚對苯二甲酸丁二酯、改質聚苯醚、聚碸、聚對苯二甲醯對苯二胺、聚醯胺醯亞胺、聚醯亞胺、聚胺基雙馬來醯亞胺、聚醚碸聚苯碸、聚芳酯、聚醚醚酮等熱塑性樹脂。 As specific synthetic resins, thermosetting resins such as phenol resins, melamine resins, xylene resins, diallyl phthalate resins, glycerol resins, epoxy resins, alkyl benzene resins, etc., or polyphenylene resins can be used. vinyl, polycarbonate, parylene Polyethylene terephthalate, polybutylene terephthalate, modified polyphenylene ether, polysiloxane, poly-p-phenylene terephthalate, polyamide-imide, polyimide, polyamine-based double Maleimide, polyether polyphenylene, polyarylate, polyether ether ketone and other thermoplastic resins.
樹脂對碳黑之被覆量較佳為相對於碳黑與樹脂之合計量為1~30質量%,藉由設為上述下限值以上,有可充分地被覆之傾向。另一方面,藉由設為上述上限值以下,有可防止樹脂彼此之黏著,使分散性良好之傾向。 The coating amount of the resin with respect to the carbon black is preferably 1 to 30 mass % with respect to the total amount of the carbon black and the resin, and sufficient coating tends to be possible by making it more than the above lower limit value. On the other hand, by setting it below the said upper limit value, there exists a tendency for resin to be prevented from sticking and a dispersibility becomes favorable.
如此以樹脂進行被覆處理而成之碳黑可依據常規方法用作著色間隔件之遮光材,可藉由常規方法製作將該著色間隔件設為構成要素之彩色濾光片。若使用此種碳黑,則有能以低成本達成高遮光率且表面反射率較低之著色間隔件之傾向。又,亦推測藉由利用樹脂被覆碳黑表面,亦有將Ca或Na封入至碳黑中之作用。 The carbon black coated with resin in this way can be used as a light-shielding material for coloring spacers according to a conventional method, and a color filter in which the coloring spacer is a constituent element can be produced by a conventional method. When such carbon black is used, there is a tendency that a colored spacer with a high light-shielding rate and a low surface reflectance can be achieved at a low cost. Moreover, it is also presumed that by coating the surface of the carbon black with resin, there is also an effect of encapsulating Ca or Na in the carbon black.
又,上述有機著色顏料除黑色色材以外,亦可使用染料。作為可用作色材之染料,可列舉:偶氮系染料、蒽醌系染料、酞花青系染料、醌亞胺系染料、喹啉系染料、硝基系染料、羰基系染料、次甲基系染料等。 Moreover, dyes other than black color material can also be used for the said organic coloring pigment. Examples of dyes that can be used as color materials include azo-based dyes, anthraquinone-based dyes, phthalocyanine-based dyes, quinoneimine-based dyes, quinoline-based dyes, nitro-based dyes, carbonyl-based dyes, and methine Base dyes, etc.
作為偶氮系染料,例如可列舉:C.I.酸性黃11、C.I.酸性橙7、C.I.酸性紅37、C.I.酸性紅180、C.I.酸性藍29、C.I.直接紅28、C.I.直接紅83、C.I.直接黃12、C.I.直接橙26、C.I.直接綠28、C.I.直接綠59、C.I.反應黃2、C.I.反應紅17、C.I.反應紅120、C.I.反應黑5、C.I.分散橙5、C.I.分散紅58、C.I.分散藍165、C.I.鹼性藍41、C.I.鹼性紅18、C.I.媒染紅7、C.I.媒染黃5、C.I.媒染黑7等。 Examples of azo dyes include C.I. Acid Yellow 11, C.I. Acid Orange 7, C.I. Acid Red 37, C.I. Acid Red 180, C.I. Acid Blue 29, C.I. Direct Red 28, C.I. Direct Red 83, C.I. Direct Yellow 12, C.I. Direct Orange 26, C.I. Direct Green 28, C.I. Direct Green 59, C.I. Reaction Yellow 2, C.I. Reaction Red 17, C.I. Reaction Red 120, C.I. Reaction Black 5, C.I. Disperse Orange 5, C.I. Disperse Red 58, C.I. C.I. Basic Blue 41, C.I. Basic Red 18, C.I. Mordant Red 7, C.I. Mordant Yellow 5, C.I. Mordant Black 7, etc.
作為蒽醌系染料,例如列舉:C.I.還原藍4、C.I.酸性 藍40、C.I.酸性綠25、C.I.反應藍19、C.I.反應藍49、C.I.分散紅60、C.I.分散藍56、C.I.分散藍60等。此外,作為酞菁系染料,例如可列舉C.I.還原藍5等,作為醌亞胺系染料,例如可列舉C.I.鹼性藍3、C.I.鹼性藍9等,作為喹啉系染料,例如可列舉C.I.溶劑黃33、C.I.酸性黃3、C.I.分散黃64等,作為硝基系染料,例如可列舉C.I.酸性黃1、C.I.酸性橙3、C.I.分散黃42等。 Examples of anthraquinone-based dyes include C.I. Vat Blue 4, C.I. Acidic Blue 40, C.I. Acid Green 25, C.I. Reactive Blue 19, C.I. Reactive Blue 49, C.I. Disperse Red 60, C.I. Disperse Blue 56, C.I. Disperse Blue 60, etc. In addition, examples of phthalocyanine dyes include C.I. Vat Blue 5, etc., examples of quinoneimine dyes include C.I. Basic Blue 3, C.I. Basic Blue 9, and the like, and examples of quinoline dyes include C.I. Solvent Yellow 33, C.I. Acid Yellow 3, C.I. Disperse Yellow 64, and the like, and examples of the nitro-based dyes include C.I. Acid Yellow 1, C.I. Acid Orange 3, C.I. Disperse Yellow 42, and the like.
該等顏料較佳為以平均粒徑通常成為1μm以下、較佳為0.5μm以下、進而較佳為0.25μm以下之方式分散而使用。此處,平均粒徑之基準為顏料粒子之數量。 These pigments are preferably dispersed and used so that the average particle size is usually 1 μm or less, preferably 0.5 μm or less, and more preferably 0.25 μm or less. Here, the reference of the average particle size is the number of pigment particles.
再者,於本發明之第1態樣之感光性著色組成物中,顏料之平均粒徑係根據藉由動態光散射(DLS)所測定之顏料粒徑求出之值。粒徑測定係針對充分稀釋過之感光性著色組成物(通常稀釋而製備成顏料濃度0.005~0.2質量%左右,但若為測定機器所推薦之濃度,則依據該濃度)進行,且於25℃下測定。 In addition, in the photosensitive coloring composition of the 1st aspect of this invention, the average particle diameter of a pigment is the value calculated|required from the pigment particle diameter measured by dynamic light scattering (DLS). The particle size measurement is carried out on a sufficiently diluted photosensitive coloring composition (usually diluted to prepare a pigment concentration of about 0.005~0.2 mass %, but if it is the concentration recommended by the measuring machine, it is based on the concentration), and the temperature is 25 ℃. measurement below.
另一方面,本發明之第2態樣相關之感光性著色組成物中所使用之(a)著色劑包含作為上述通式(1)所表示之化合物、其幾何異構物、其鹽、或其幾何異構物之鹽之有機黑色顏料。如此,認為其藉由包含特定之有機黑色顏料,可實現低介電係數及高遮光率。 On the other hand, the (a) colorant used in the photosensitive coloring composition according to the second aspect of the present invention includes the compound represented by the above-mentioned general formula (1), its geometric isomer, its salt, or Organic black pigments of salts of its geometric isomers. In this way, it is considered that by including a specific organic black pigment, a low dielectric constant and a high light-shielding ratio can be achieved.
本發明之第2態樣中所使用之(a)著色劑除上述有機黑色顏料以外亦可含有其他著色劑。作為其他著色劑,較佳為使用顏料,顏料可為有機顏料亦可為無機顏料,就容易抑制液晶之電壓保持率降低且抑制紫外線之吸收而控制形狀或階差之觀點而言,更佳為使用有機顏料。作為有機顏料,可使用第1態樣中所列舉者。 The (a) colorant used in the second aspect of the present invention may contain other colorants in addition to the above-mentioned organic black pigment. As other colorants, it is preferable to use a pigment, and the pigment may be either an organic pigment or an inorganic pigment, and is more preferable from the viewpoint of easily suppressing the decrease in the voltage holding ratio of the liquid crystal and suppressing the absorption of ultraviolet rays to control the shape and the level difference. Use organic pigments. As the organic pigment, those listed in the first aspect can be used.
進而,除該等顏料以外,可進而使用其他黑色色材。於其他黑色色材中,就容易抑制液晶之電壓保持率之降低及抑制紫外線之吸收而控制形狀或階差之觀點而言,較佳為使用上述通式(1)所表示以外之其他有機黑色顏料。作為其他有機黑色顏料,可列舉苯胺黑、苝黑、花青黑等。 Furthermore, other black color materials can be used in addition to these pigments. Among other black color materials, it is preferable to use other organic blacks other than those represented by the above general formula (1) from the viewpoint of easily suppressing the reduction of the voltage holding ratio of the liquid crystal and suppressing the absorption of ultraviolet rays to control the shape or level difference. pigment. As other organic black pigments, aniline black, perylene black, cyanine black, etc. are mentioned.
又,於本發明之第2態樣中,可使用無機黑色顏料。作為無機黑色顏料,可列舉:碳黑、乙炔黑、燈黑、骨黑、石墨、鐵黑、鈦黑等。該等之中,就遮光性、影像特性之觀點而言,可較佳地使用碳黑。作為碳黑之例,可使用第1態樣中所列舉者。又,亦可使用第1態樣中所列舉之染料等其他色材。 Moreover, in the 2nd aspect of this invention, an inorganic black pigment can be used. As an inorganic black pigment, carbon black, acetylene black, lamp black, bone black, graphite, iron black, titanium black, etc. are mentioned. Among these, carbon black can be preferably used from the viewpoint of light-shielding properties and image characteristics. As an example of carbon black, those listed in the first aspect can be used. Moreover, other color materials, such as the dye mentioned in 1st aspect, can also be used.
又,本發明之第3態樣之感光性著色組成物中所使用之(a)著色劑含有有機顏料及碳黑。如此,藉由使用紫外線之吸收較少之有機顏料,容易控制形狀或階差;又,藉由除有機顏料以外使用碳黑,可達成高遮光性。 Moreover, the (a) coloring agent used for the photosensitive coloring composition of the 3rd aspect of this invention contains an organic pigment and carbon black. In this way, by using an organic pigment that absorbs less ultraviolet rays, it is easy to control the shape or level difference; and by using carbon black in addition to the organic pigment, high light-shielding properties can be achieved.
有機顏料之種類並無特別限定,就密接性之觀點而言,較佳為含有選自由紅色顏料、橙色顏料、藍色顏料及紫色顏料所組成群組中之至少1種。作為紅色顏料、橙色顏料、藍色顏料及紫色顏料,可使用第1態樣中所列舉者。 The type of the organic pigment is not particularly limited, but from the viewpoint of adhesiveness, it is preferable to contain at least one selected from the group consisting of a red pigment, an orange pigment, a blue pigment, and a violet pigment. As the red pigment, orange pigment, blue pigment, and purple pigment, those listed in the first aspect can be used.
該等之中,就遮光性、或形狀及階差之控制之觀點而言,較佳為含有以下(1)~(4)中之至少1種以上者。 Among these, it is preferable to contain at least 1 type or more of the following (1)-(4) from a light-shielding property, or the viewpoint of the control of a shape and a level|step difference.
(1)選自C.I.顏料紅177、254中之至少1種 (1) At least one selected from C.I. Pigment Red 177 and 254
(2)選自C.I.顏料橙43、64中之至少1種 (2) At least one selected from C.I. Pigment Orange 43 and 64
(3)選自C.I.顏料藍15:6、60中之至少1種 (3) At least one selected from C.I. Pigment Blue 15:6, 60
(4)選自C.I.顏料紫23、29中之至少1種 (4) At least one selected from C.I. Pigment Violet 23 and 29
該等之中,就可見光區域中、尤其是長波長區域中之遮光性之觀點而言,較佳為使用藍色顏料及/或紫色顏料。尤其,碳黑之吸收光譜中,吸光度自短波長起朝長波長向右下降,又,紫外線區域之吸光度亦高於有機顏料,因此就兼顧遮光性及製版性之觀點而言,較佳為併用藍色顏料及/或紫色顏料與碳黑,更佳為併用藍色顏料及紫色顏料與碳黑。 Among these, it is preferable to use a blue pigment and/or a violet pigment from the viewpoint of light-shielding properties in the visible light region, especially in the long wavelength region. In particular, in the absorption spectrum of carbon black, the absorbance decreases to the right from short wavelengths to long wavelengths, and the absorbance in the ultraviolet region is also higher than that of organic pigments. Therefore, from the viewpoint of both light-shielding properties and plate-making properties, it is preferable to use them together. Blue pigment and/or violet pigment and carbon black, more preferably blue pigment, violet pigment and carbon black are used together.
又,就遮光性之觀點而言,有機顏料較佳為含有有機黑色顏料。作為有機黑色顏料,可使用第1態樣中所列舉者。又,亦可使用第1態樣中所列舉之其他有機著色顏料、或其他黑色色材、染料等。 Moreover, it is preferable that an organic pigment contains an organic black pigment from a light-shielding viewpoint. As the organic black pigment, those listed in the first aspect can be used. Moreover, other organic coloring pigments listed in the 1st aspect, or other black color materials, dyes, etc. can also be used.
又,本發明之第4態樣之著色間隔件形成用感光性著色組成物中所使用之(a)著色劑只要可形成所需之著色間隔件則並無特別限定。例如,就容易抑制紫外線之吸收而控制形狀或階差之觀點而言,較佳為作為第1態樣而於上文敍述之、含有選自由紅色顏料及橙色顏料所組成群組中之至少1種、與選自由藍色顏料及紫色顏料所組成群組中之至少1種者。 Moreover, the (a) coloring agent used in the photosensitive coloring composition for coloring spacer formation of the 4th aspect of this invention will not be specifically limited if it can form a desired coloring spacer. For example, from the viewpoint of easily suppressing the absorption of ultraviolet rays and controlling the shape and the level difference, it is preferable to contain at least one selected from the group consisting of a red pigment and an orange pigment as the first aspect described above. species, and at least one selected from the group consisting of blue pigments and purple pigments.
如此,作為第4態樣之著色間隔件形成用感光性著色組成物中所使用之(a)著色劑,可應用作為第1態樣之感光性著色組成物中所使用之(a)著色劑而記載者,又,亦可應用作為第2或第3態樣之感光性著色組成物中所使用之(a)著色劑而記載者。 In this way, as the colorant (a) used in the photosensitive coloring composition for forming a colored spacer of the fourth aspect, the colorant (a) used in the photosensitive coloring composition of the first aspect can be applied In addition, what is described can also be applied and described as the (a) coloring agent used in the photosensitive coloring composition of the 2nd or 3rd aspect.
另一方面,於第4態樣之著色間隔件形成用感光性著色組成物中,就遮光性之觀點而言,較佳為至少含有黑色色材,更佳為至少含有碳黑。又,就容易抑制液晶之電壓保持率之降低且抑制紫外線之吸收而控制形狀或階差之觀點而言,更佳為至少包含上 述有機黑色顏料。就遮光性、及兼顧液晶之電壓保持率之降低之抑制與形狀或階差之控制性之觀點而言,亦可併用碳黑與有機黑色顏料。 On the other hand, in the photosensitive coloring composition for coloring spacer formation of the 4th aspect, it is preferable to contain at least a black color material from a light-shielding viewpoint, and it is more preferable to contain at least carbon black. In addition, from the viewpoint of easily suppressing the drop in the voltage holding ratio of the liquid crystal, suppressing the absorption of ultraviolet rays, and controlling the shape and the level difference, it is more preferable to include at least the above Described organic black pigment. From the viewpoint of light-shielding properties, and both the suppression of the reduction in the voltage holding ratio of the liquid crystal and the controllability of the shape or level difference, carbon black and an organic black pigment may be used in combination.
於第4態樣之著色間隔件形成用感光性著色組成物中,作為該等著色劑之調配量,可採用下述本發明之感光性著色組成物中之較佳值。又,亦可根據所要求之光學密度而適當調整,亦可採用國際公開第2013/062011號、國際公開第2013/115268號、日本專利特表2014-534460號公報、日本專利特表2014-529652號公報、日本專利特開2014-146029號公報、國際公開第2013/179237號、日本專利特開2011-107707號公報等所記載之值。 In the photosensitive coloring composition for coloring spacer formation of the 4th aspect, the preferable value in the photosensitive coloring composition of this invention mentioned below can be employ|adopted as a compounding quantity of these coloring agents. In addition, it may be appropriately adjusted according to the required optical density, and International Publication No. 2013/062011, International Publication No. 2013/115268, Japanese Patent Publication No. 2014-534460, and Japanese Patent Publication No. 2014-529652 may also be used. No., Japanese Patent Laid-Open No. 2014-146029, International Publication No. 2013/179237, Japanese Patent Laid-Open No. 2011-107707, and the like.
<(b)鹼可溶性樹脂>、 <(b) Alkali-soluble resin>,
作為本發明中所使用之(b)鹼可溶性樹脂,只要為包含羧基或羥基之樹脂則並無特別限定,例如可列舉:環氧(甲基)丙烯酸酯系樹脂、丙烯酸系樹脂、含羧基之環氧樹脂、含羧基之胺基甲酸酯樹脂、酚醛清漆系樹脂、聚乙烯酚系樹脂等,其中較佳為環氧(甲基)丙烯酸酯系樹脂、丙烯酸系樹脂。該等可單獨使用1種,或者將複數種混合而使用。 The (b) alkali-soluble resin used in the present invention is not particularly limited as long as it is a resin containing a carboxyl group or a hydroxyl group, and examples thereof include epoxy (meth)acrylate-based resins, acrylic-based resins, and carboxyl group-containing resins. Epoxy resins, carboxyl group-containing urethane resins, novolak-based resins, polyvinylphenol-based resins, etc., among which epoxy (meth)acrylate-based resins and acrylic-based resins are preferred. These can be used individually by 1 type, or can be used by mixing a plurality of types.
作為本發明中所使用之(b)鹼可溶性樹脂,就優異之製版性之觀點而言,尤其可較佳地使用下述鹼可溶性樹脂(b1)及/或鹼可溶性樹脂(b2)(以下,有時稱為「含羧基之環氧(甲基)丙烯酸酯樹脂」)。 As the (b) alkali-soluble resin used in the present invention, the following alkali-soluble resin (b1) and/or alkali-soluble resin (b2) can be preferably used in particular from the viewpoint of excellent plate-making properties (hereinafter, Sometimes referred to as "carboxy-containing epoxy (meth)acrylate resin").
<鹼可溶性樹脂(b1)> <Alkali-soluble resin (b1)>
藉由使環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯加成,進而與多元酸及/或其酸酐進行反應所獲得之鹼可溶性樹脂。 Alkali-soluble resin obtained by adding epoxy resin to α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having carboxyl group, and then reacting with polybasic acid and/or its acid anhydride .
<鹼可溶性樹脂(b2)> <Alkali-soluble resin (b2)>
藉由使環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯加成,進而與多元醇、及多元酸及/或其酸酐進行反應所獲得之鹼可溶性樹脂。 Obtained by adding epoxy resin to α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and then reacting with polyhydric alcohol, polybasic acid and/or anhydride thereof The alkali-soluble resin.
作為成為原料之環氧樹脂,例如可較佳地使用:雙酚A型環氧樹脂(例如,三菱化學公司製造之「Epikote(註冊商標,下同)828」、「Epikote1001」、「Epikote1002」、「Epikote1004」等)、藉由雙酚A型環氧樹脂之醇性羥基與表氯醇之反應所獲得之環氧樹脂(例如,日本化藥公司製造之「NER-1302」(環氧當量323,軟化點76℃))、雙酚F型樹脂(例如,三菱化學公司製造之「Epikote807」、「EP-4001」、「EP-4002」、「EP-4004」等)、藉由雙酚F型環氧樹脂之醇性羥基與表氯醇之反應所獲得之環氧樹脂(例如,日本化藥公司製造之「NER-7406」(環氧當量350,軟化點66℃))、雙酚S型環氧樹脂、聯苯環氧丙基醚(例如,三菱化學公司製造之「YX-4000」)、酚系酚醛清漆型環氧樹脂(例如,日本化藥公司製造之「EPPN-201」、三菱化學公司製造之「EP-152」、「EP-154」、Dow Chemical公司製造之「DEN-438」)、(鄰、間、對)甲酚酚醛清漆型環氧樹脂(例如,日本化藥公司製造之「EOCN(註冊商標,下同)-102S」、「EOCN-1020」、「EOCN-104S」)、三環氧丙基異氰尿酸酯(例如,日產化學公司製造之「TEPIC(註冊商標)」)、三苯酚甲烷型環氧樹脂(例如,日本化藥公司製造之「EPPN(註冊商標,下 同)-501」、「EPN-502」、「EPPN-503」)、脂環式環氧樹脂(Daicel化學工業公司製造之「Celloxide2021P」、「Celloxide(註冊商標,下同)EHPE」)、將由二環戊二烯與苯酚之反應所得之酚樹脂環氧丙基化所得之環氧樹脂(例如,DIC公司製造之「EXA-7200」、日本化藥公司製造之「NC-7300」)、下述通式(B1)~(B4)所表示之環氧樹脂等。 As the epoxy resin used as the raw material, for example, bisphenol A epoxy resin (for example, "Epikote (registered trademark, the same below) 828", "Epikote 1001", "Epikote 1002", "Epikote1004", etc.), epoxy resins obtained by the reaction of alcoholic hydroxyl groups of bisphenol A epoxy resins with epichlorohydrin (for example, "NER-1302" (epoxy equivalent 323) manufactured by Nippon Kayaku Co., Ltd. , softening point 76°C)), bisphenol F type resin (for example, "Epikote807", "EP-4001", "EP-4002", "EP-4004" manufactured by Mitsubishi Chemical Corporation), by bisphenol F The epoxy resin obtained by the reaction of the alcoholic hydroxyl group of the epoxy resin with epichlorohydrin (for example, "NER-7406" manufactured by Nippon Kayaku Co., Ltd. (epoxy equivalent weight 350, softening point 66°C)), bisphenol S type epoxy resin, biphenyl glycidyl ether (for example, "YX-4000" manufactured by Mitsubishi Chemical Corporation), phenolic novolak type epoxy resin (for example, "EPPN-201" manufactured by Nippon Kayaku Co., Ltd., "EP-152", "EP-154" manufactured by Mitsubishi Chemical Corporation, "DEN-438" manufactured by Dow Chemical Corporation), (ortho, meta, para) cresol novolak epoxy resins (for example, Nippon Kayaku) "EOCN (registered trademark, the same below)-102S", "EOCN-1020", "EOCN-104S"), triglycidyl isocyanurate (for example, "TEPIC ( registered trademark)”), trisphenolmethane type epoxy resin (for example, “EPPN (registered trademark, below) manufactured by Nippon Kayaku Co., Ltd. Same as)-501", "EPN-502", "EPPN-503"), alicyclic epoxy resin ("Celloxide2021P", "Celloxide (registered trademark, the same below) EHPE" manufactured by Daicel Chemical Industry Co., Ltd.), will be Epoxy resins obtained by glycidylation of a phenolic resin obtained by the reaction of dicyclopentadiene and phenol (for example, "EXA-7200" manufactured by DIC Corporation, "NC-7300" manufactured by Nippon Kayaku Corporation), the following Epoxy resins etc. represented by the general formulae (B1) to (B4).
具體而言,作為下述通式(B1)所表示之環氧樹脂,可列舉日本化藥公司製造之「XD-1000」,作為下述通式(B2)所表示之環氧樹脂,可列舉日本化藥公司製造之「NC-3000」,作為下述通式(B4)所表示之環氧樹脂,可列舉新日鐵住金化學公司製造之「ESF-300」等。 Specifically, as the epoxy resin represented by the following general formula (B1), "XD-1000" manufactured by Nippon Kayaku Co., Ltd. can be mentioned, and as the epoxy resin represented by the following general formula (B2), there can be mentioned "NC-3000" manufactured by Nippon Kayaku Co., Ltd., "ESF-300" manufactured by Nippon Steel & Sumitomo Metal Chemical Co., Ltd., etc., can be mentioned as the epoxy resin represented by the following general formula (B4).
[化6]
於上述通式(B1)中,a表示平均值,且表示0~10之數。R111表示氫原子、鹵素原子、碳數1~8之烷基、碳數3~10之環烷基、苯基、萘基、或聯苯基之任一者。再者,存在於1分子中之數個R111可分別相同亦可不同。 In the above general formula (B1), a represents an average value and represents a number of 0 to 10. R 111 represents any one of a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. In addition, several R 111 existing in 1 molecule may be the same or different, respectively.
[化7]
於上述通式(B2)中,b表示平均值,且表示0~10之數。R121表示氫原子、鹵素原子、碳數1~8之烷基、碳數3~10之環烷基、苯基、萘基、或聯苯基之任一者。再者,存在於1分子中之複數個R121可分別相同亦可不同。 In the above general formula (B2), b represents an average value and represents a number of 0 to 10. R 121 represents any one of a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. In addition, a plurality of R 121 present in one molecule may be the same or different, respectively.
[化8]
於上述通式(B3)中,X表示下述通式(B3-1)或(B3-2)所表示之連結基。其中,於分子構造中包含1個以上之金剛烷構造。c表示2或3之整數。 In the above general formula (B3), X represents a linking group represented by the following general formula (B3-1) or (B3-2). Among them, one or more adamantane structures are included in the molecular structure. c represents an integer of 2 or 3.
[化9]
[化10]
於上述通式(B3-1)及(B3-2)中,R131~R134及R135~ R137分別獨立地表示可具有取代基之金剛烷基、氫原子、可具有取代基之碳數1~12之烷基、或可具有取代基之苯基。*表示鍵結鍵。 In the above general formulas (B3-1) and (B3-2), R 131 to R 134 and R 135 to R 137 each independently represent an optionally substituted adamantyl group, a hydrogen atom, and an optionally substituted carbon An alkyl group of 1 to 12, or a phenyl group which may have a substituent. * Indicates a bond key.
[化11]
於上述通式(B4)中,p及q分別獨立地表示0~4之整數,R141及R142分別獨立地表示碳數1~4之烷基或鹵素原子。R143及R144分別獨立地表示碳數1~4之伸烷基。x及y分別獨立地表示0以上之整數。 In the above general formula (B4), p and q each independently represent an integer of 0 to 4, and R 141 and R 142 each independently represent an alkyl group having 1 to 4 carbon atoms or a halogen atom. R 143 and R 144 each independently represent an alkylene group having 1 to 4 carbon atoms. x and y each independently represent an integer of 0 or more.
於該等之中,較佳為使用通式(B1)~(B4)之任一者所表示之環氧樹脂。 Among these, it is preferable to use the epoxy resin represented by any one of general formula (B1)-(B4).
作為α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯,可列舉:(甲基)丙烯酸、丁烯酸、鄰、間或對乙烯基苯甲酸、(甲基)丙烯酸之α位鹵烷基、烷氧基、鹵素、硝基、氰基取代體等之單羧酸、2-(甲基)丙烯醯氧基乙基丁二酸、2-(甲基)丙烯醯氧基乙基己二酸、2-(甲基)丙烯醯氧基乙基鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基六氫鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基馬來酸、2-(甲基)丙烯醯氧基丙基丁二酸、2-(甲基)丙烯醯氧基丙基己二酸、2-(甲基)丙烯醯氧基丙基四氫鄰苯二甲酸、2-(甲基)丙烯醯氧基丙基鄰苯二甲酸、2-(甲基)丙烯醯氧基丙基馬來酸、2-(甲基)丙烯醯氧基丁基丁二酸、2-(甲基)丙烯醯氧基丁基己二酸、2-(甲基)丙烯醯氧基丁基氫鄰苯二甲酸、2-(甲基)丙烯醯氧基丁基鄰苯二甲酸、2-(甲基)丙烯醯 氧基丁基馬來酸、作為使(甲基)丙烯酸與ε-己內酯、β-丙內酯、γ-丁內酯、δ-戊內酯等內酯類加成而成者之單體、或者使(甲基)丙烯酸羥基烷基酯、季戊四醇三(甲基)丙烯酸酯與丁二酸(酐)、鄰苯二甲酸(酐)、馬來酸(酐)等酸(酐)加成而成之單體、(甲基)丙烯酸二聚物等。該等之中,就感度之方面而言,尤佳者為(甲基)丙烯酸。 Examples of the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group include (meth)acrylic acid, crotonic acid, ortho-, meta- or para-vinyl benzoic acid, (meth)acrylic acid, α-haloalkyl, alkoxy, halogen, nitro, cyano substituents of acrylic acid, monocarboxylic acid, 2-(meth)acryloyloxyethylsuccinic acid, 2-(methyl) ) Acryloyloxyethyl adipic acid, 2-(meth)acryloyloxyethyl phthalic acid, 2-(meth)acryloyloxyethyl hexahydrophthalic acid, 2-( Meth)acryloyloxyethylmaleic acid, 2-(meth)acryloyloxypropylsuccinic acid, 2-(meth)acryloyloxypropyladipic acid, 2-(methyl)acryloyloxypropylsuccinic acid ) acryloyloxypropyl tetrahydrophthalic acid, 2-(meth)acryloyloxypropyl phthalic acid, 2-(meth)acryloyloxypropyl maleic acid, 2-(meth)acryloyloxypropyl phthalic acid Meth)acryloyloxybutylsuccinic acid, 2-(meth)acryloyloxybutyladipic acid, 2-(meth)acryloyloxybutylhydrophthalic acid, 2-( Meth)acryloyloxybutylphthalic acid, 2-(meth)acryloyl Oxybutylmaleic acid, a single product obtained by adding (meth)acrylic acid to lactones such as ε-caprolactone, β-propiolactone, γ-butyrolactone, and δ-valerolactone (meth)acrylic acid hydroxyalkyl ester, pentaerythritol tri(meth)acrylate and acid (anhydride) such as succinic acid (anhydride), phthalic acid (anhydride), maleic acid (anhydride), etc. Monomers, (meth)acrylic acid dimers, etc. Among these, in terms of sensitivity, (meth)acrylic acid is particularly preferred.
作為使環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯加成之方法,可使用公知之手法。例如,可於酯化觸媒之存在下,以50~150℃之溫度使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯與環氧樹脂進行反應。 As a method of adding an epoxy resin to an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group, a known method can be used. For example, α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylate having a carboxyl group can be reacted with epoxy resin in the presence of an esterification catalyst at a temperature of 50-150°C.
作為此處所使用之酯化觸媒,可使用:三乙胺、三甲胺、苄基二甲胺、苄基二乙胺等三級胺、氯化四甲基銨、氯化四乙基銨、氯化十二烷基三甲基銨等四級銨鹽等。 As the esterification catalyst used here, tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine, benzyldiethylamine, tetramethylammonium chloride, tetraethylammonium chloride, Quaternary ammonium salts such as dodecyl trimethyl ammonium chloride, etc.
再者,環氧樹脂、α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯、及酯化觸媒可單獨使用任1種,亦可併用2種以上。 Furthermore, an epoxy resin, α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and an esterification catalyst may be used alone or in combination of two or more.
α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之使用量較佳為相對於環氧樹脂之環氧基1當量為0.5~1.2當量之範圍,進而較佳為0.7~1.1當量之範圍。 The use amount of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group is preferably in the range of 0.5 to 1.2 equivalents relative to 1 equivalent of epoxy groups of the epoxy resin, and more Preferably, it is in the range of 0.7 to 1.1 equivalents.
若α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之使用量較少,則不飽和基之導入量不足,後續之與多元酸及/或其酸酐之反應亦變得不充分。又,殘留大量環氧基亦不利。另一方面,若該使用量較多,則α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯以未反應物之形式殘留。於任一情形時均發現硬化特性變差之傾向。 If the amount of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester with carboxyl group is small, the amount of unsaturated group introduced is insufficient, and the subsequent interaction with polybasic acid and/or its anhydride The response also became insufficient. Moreover, it is also disadvantageous that a large amount of epoxy groups remain. On the other hand, when the amount used is large, the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group remains as an unreacted product. In either case, a tendency to deteriorate the hardening characteristics was found.
作為多元酸及/或其酸酐,可列舉選自馬來酸、丁二酸、衣康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、二苯甲酮四羧酸、甲基六氫鄰苯二甲酸、內亞甲基四氫鄰苯二甲酸、氯菌酸、甲基四氫鄰苯二甲酸、聯苯四羧酸、及該等之酸酐等中之1種或2種以上。 Examples of the polybasic acid and/or its acid anhydride include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, partial Benzenetricarboxylic acid, benzophenone tetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chloramphenicol, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid , and one or more of these acid anhydrides.
較佳為馬來酸、丁二酸、衣康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、聯苯四羧酸、或該等之酸酐。尤佳為四氫鄰苯二甲酸、聯苯四羧酸、四氫鄰苯二甲酸酐、或聯苯四羧酸二酸酐。 Preferably maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, or such anhydrides. Particularly preferred is tetrahydrophthalic acid, biphenyltetracarboxylic acid, tetrahydrophthalic anhydride, or biphenyltetracarboxylic dianhydride.
關於多元酸及/或其酸酐之加成反應亦可使用公知之手法,可於與環氧樹脂及α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之加成反應相同之條件下,繼續進行反應而獲得目標物。 For the addition reaction of the polybasic acid and/or its acid anhydride, a known method can also be used, and it can be used in the reaction with epoxy resin and α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group. Under the same conditions as the addition reaction, continue the reaction to obtain the target compound.
關於多元酸及/或其酸酐成分之加成量,所生成之含羧基之環氧(甲基)丙烯酸酯樹脂之酸值較佳為10mgKOH/g以上,更佳為20mgKOH/g以上,進而較佳為50mgKOH/g以上。又,較佳為成為150mgKOH/g以下,更佳為140mgKOH/g以下,進而較佳為120mgKOH/g之範圍之程度。藉由設為上述下限值以上,有鹼性顯影性變良好之傾向,又,藉由設為上述上限值以下,有硬化性能變良好之傾向。 Regarding the addition amount of the polybasic acid and/or its acid anhydride component, the acid value of the resulting carboxyl group-containing epoxy (meth)acrylate resin is preferably 10 mgKOH/g or more, more preferably 20 mgKOH/g or more, and more preferably Preferably, it is 50 mgKOH/g or more. Moreover, it is preferably 150 mgKOH/g or less, more preferably 140 mgKOH/g or less, and still more preferably 120 mgKOH/g. By setting it as the said lower limit or more, there exists a tendency for alkali developability to become favorable, and it exists in the tendency for hardenability to become favorable by setting it as the said upper limit or less.
再者,於該多元酸及/或其酸酐之加成反應時,亦可添加三羥甲基丙烷、季戊四醇、二季戊四醇等多官能基醇而導入多支鏈構造。 In addition, polyfunctional alcohols, such as trimethylolpropane, pentaerythritol, and dipentaerythritol, can also be added at the time of addition reaction of this polybasic acid and/or its acid anhydride, and a polybranched structure can also be introduce|transduced.
含羧基之環氧(甲基)丙烯酸酯樹脂通常係藉由在向環 氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物混合多元酸及/或其酸酐之後、或者在向環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物混合多元酸及/或其酸酐及多官能基醇之後加溫而獲得。 Carboxyl-containing epoxy (meth)acrylate resins are usually After mixing polybasic acid and/or its anhydride with the reactant of oxygen resin and α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester with carboxyl group, or after adding epoxy resin and α,β- The reactant of unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group is obtained by mixing a polybasic acid and/or its anhydride and a polyfunctional alcohol, and then heating.
於該情形時,多元酸及/或其酸酐與多官能基醇之混合順序並無特別限制。藉由加溫,多元酸及/或其酸酐對存在於環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物和多官能基醇之混合物中之任一羥基進行加成反應。 In this case, the mixing order of the polybasic acid and/or its acid anhydride and the polyfunctional alcohol is not particularly limited. By heating, polybasic acids and/or their anhydrides are used in the reaction of epoxy resins with α,β-unsaturated monocarboxylic acids or α,β-unsaturated monocarboxylic acid esters with carboxyl groups and polyfunctional alcohols Any hydroxyl group in the mixture undergoes an addition reaction.
含羧基之環氧(甲基)丙烯酸酯樹脂之由凝膠滲透層析法(GPC)所測定之聚苯乙烯換算之重量平均分子量(Mw)通常為1000以上,較佳為1500以上,更佳為2000以上,進而較佳為3000以上,尤佳為4000以上。又,通常為10000以下,較佳為8000以下,更佳為6000以下。若該重量平均分子量較小,則於顯影液中之溶解性較高,若過大,則於顯影液中之溶解性較低。 The weight average molecular weight (Mw) of the carboxyl group-containing epoxy (meth)acrylate resin in terms of polystyrene measured by gel permeation chromatography (GPC) is usually 1000 or more, preferably 1500 or more, more preferably It is 2000 or more, More preferably, it is 3000 or more, More preferably, it is 4000 or more. Moreover, it is 10000 or less normally, Preferably it is 8000 or less, More preferably, it is 6000 or less. If the weight average molecular weight is small, the solubility in the developing solution will be high, and if it is too large, the solubility in the developing solution will be low.
含羧基之環氧(甲基)丙烯酸酯樹脂可單獨使用1種,亦可將2種以上之樹脂混合而使用。 The carboxyl group-containing epoxy (meth)acrylate resin may be used alone, or two or more kinds of resins may be mixed and used.
又,亦可將上述含羧基之環氧(甲基)丙烯酸酯樹脂之一部分替換成其他黏合劑樹脂。即,亦可併用含羧基之環氧(甲基)丙烯酸酯樹脂與其他黏合劑樹脂。於該情形時,較佳為將(b)鹼可溶性樹脂中之含羧基之環氧(甲基)丙烯酸酯樹脂之比例設為50質量%以上、尤其是80質量%以上。 Moreover, a part of the said carboxyl group-containing epoxy (meth)acrylate resin can also be replaced with another binder resin. That is, a carboxyl group-containing epoxy (meth)acrylate resin and another binder resin may be used in combination. In this case, it is preferable to make the ratio of the epoxy (meth)acrylate resin containing a carboxyl group in (b) alkali-soluble resin 50 mass % or more, especially 80 mass % or more.
可與含羧基之環氧(甲基)丙烯酸酯樹脂併用之其他黏合劑樹脂並無限制,只要自感光性著色組成物通常所使用之樹脂中選擇即可。例如,可列舉日本專利特開2007-271727號公報、日本 專利特開2007-316620號公報、日本專利特開2007-334290號公報等所記載之黏合劑樹脂等。再者,其他黏合劑樹脂均可單獨使用1種,亦可將2種以上組合而使用。 The other binder resin that can be used together with the carboxyl group-containing epoxy (meth)acrylate resin is not limited, as long as it is selected from resins generally used for photosensitive coloring compositions. For example, Japanese Patent Laid-Open No. 2007-271727, Japan Binder resins and the like described in Japanese Patent Laid-Open No. 2007-316620, Japanese Patent Laid-Open No. 2007-334290, and the like. In addition, any other binder resin may be used individually by 1 type, and may be used in combination of 2 or more types.
又,作為(b)鹼可溶性樹脂,就與顏料或分散劑等之相溶性之觀點而言,較佳為使用丙烯酸系樹脂,可較佳地使用日本專利特開2014-137466號公報所記載者。 In addition, as the (b) alkali-soluble resin, an acrylic resin is preferably used from the viewpoint of compatibility with a pigment, a dispersant, etc., and the one described in Japanese Patent Laid-Open No. 2014-137466 can be preferably used .
作為丙烯酸系樹脂,例如可列舉具有1個以上之羧基之乙烯性不飽和單體(以下,稱為「不飽和單體(b1)」)與其他能夠共聚合之乙烯性不飽和單體(以下,稱為「不飽和單體(b2)」)的共聚合體。 Examples of the acrylic resin include an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter, referred to as "unsaturated monomer (b1)") and other copolymerizable ethylenically unsaturated monomers (hereinafter, referred to as "unsaturated monomer (b1)"). , referred to as "unsaturated monomer (b2)") copolymer.
作為不飽和單體(b1),例如可列舉:如(甲基)丙烯酸、丁烯酸、α-氯丙烯酸、肉桂酸之不飽和單羧酸;如馬來酸、馬來酸酐、富馬酸、衣康酸、衣康酸酐、檸康酸、檸康酸酐、中康酸之不飽和二羧酸或其酸酐;丁二酸單[2-(甲基)丙烯醯氧基乙基]酯、鄰苯二甲酸單[2-(甲基)丙烯醯氧基乙基]酯之2元以上之多元羧酸之單[(甲基)丙烯醯氧基烷基]酯;如ω-羧基聚己內酯單(甲基)丙烯酸酯之於兩末端具有羧基及羥基之聚合物之單(甲基)丙烯酸酯;對乙烯基苯甲酸等。該等不飽和單體(b1)可單獨使用或者將2種以上混合而使用。 Examples of the unsaturated monomer (b1) include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid; such as maleic acid, maleic anhydride, and fumaric acid. , itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, unsaturated dicarboxylic acids of mesaconic acid or their anhydrides; succinic acid mono[2-(meth)acryloyloxyethyl]ester, Mono[(meth)acryloyloxyalkyl]ester of polycarboxylic acid with more than 2 valences of mono[2-(meth)acryloyloxyethyl]phthalate; such as ω-carboxypolyhexamethylene Lactone mono(meth)acrylate is a mono(meth)acrylate of a polymer having carboxyl groups and hydroxyl groups at both ends; p-vinyl benzoic acid, etc. These unsaturated monomers (b1) can be used individually or in mixture of 2 or more types.
又,作為不飽和單體(b2),例如可列舉:如N-苯基馬來醯亞胺、N-環己基馬來醯亞胺之N-位取代馬來醯亞胺;如苯乙烯、α-甲基苯乙烯、對羥基苯乙烯、對羥基-α-甲基苯乙烯、對乙烯基苄基環氧丙基醚、乙烯合萘之芳香族乙烯基化合物; In addition, as the unsaturated monomer (b2), for example, N-substituted maleimide such as N-phenylmaleimide and N-cyclohexylmaleimide; such as styrene, Aromatic vinyl compounds of α-methylstyrene, p-hydroxystyrene, p-hydroxy-α-methylstyrene, p-vinylbenzylglycidyl ether, vinyl naphthalene;
如(甲基)丙烯酸甲酯、(甲基)丙烯酸正丁酯、(甲基) 丙烯酸2-乙基己酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸苄酯、聚乙二醇(聚合度2~10)甲醚(甲基)丙烯酸酯、聚丙二醇(聚合度2~10)甲醚(甲基)丙烯酸酯、聚乙二醇(聚合度2~10)單(甲基)丙烯酸酯、聚丙二醇(聚合度2~10)單(甲基)丙烯酸酯、環己基(甲基)丙烯酸酯、(甲基)丙烯酸異酯、(甲基)丙烯酸三環[5.2.1.02,6]癸烷-8-酯、(甲基)丙烯酸二環戊烯酯、丙三醇單(甲基)丙烯酸酯、(甲基)丙烯酸4-羥基苯酯、對茴香基酚之環氧乙烷改質(甲基)丙烯酸酯、(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸3,4-環氧環己基甲酯、3-[(甲基)丙烯醯氧基甲基]氧雜環丁烷、3-[(甲基)丙烯醯氧基甲基]-3-乙基氧雜環丁烷之(甲基)丙烯酸酯; Such as methyl (meth)acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, Benzyl (meth)acrylate, polyethylene glycol (polymerization degree 2~10) methyl ether (meth)acrylate, polypropylene glycol (polymerization degree 2~10) methyl ether (meth)acrylate, polyethylene glycol (Polymerization degree 2~10) Mono(meth)acrylate, Polypropylene glycol (Polymerization degree 2~10) Mono(meth)acrylate, Cyclohexyl(meth)acrylate, (meth)acrylate iso ester, (meth)acrylate tricyclo[5.2.1.0 2,6 ]decane-8-ester, (meth)acrylate dicyclopentenyl, glycerol mono(meth)acrylate, (meth) 4-Hydroxyphenyl acrylate, ethylene oxide modified (meth)acrylate of p-anisylphenol, glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate , 3-[(meth)acryloyloxymethyl]oxetane, (methyl) of 3-[(meth)acryloyloxymethyl]-3-ethyloxetane Acrylate;
如環己基乙烯醚、異基乙烯醚、三環[5.2.1.02,6]癸烷-8-基乙烯醚、五環十五烷基乙烯醚、3-(乙烯氧基甲基)-3-乙基氧雜環丁烷之乙烯醚;如聚苯乙烯、聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸正丁酯、聚矽氧烷之於聚合體分子鏈之末端具有單(甲基)丙烯醯基之巨單體等。該等不飽和單體(b2)可單獨使用或者將2種以上混合而使用。 such as cyclohexyl vinyl ether, iso vinyl ether, tricyclo[5.2.1.0 2,6 ]decane-8-yl vinyl ether, pentacyclopentadecyl vinyl ether, 3-(vinyloxymethyl)-3-ethyloxetane Vinyl ethers of alkanes; such as polystyrene, polymethyl (meth)acrylate, poly(n-butyl) (meth)acrylate, polysiloxane, which have a mono(meth)acryloyl group at the end of the polymer molecular chain The giant monomer, etc. These unsaturated monomers (b2) can be used individually or in mixture of 2 or more types.
於不飽和單體(b1)與不飽和單體(b2)之共聚合體中,該共聚合體中之不飽和單體(b1)之共聚合比例較佳為5~50質量%,進而較佳為10~40質量%。藉由於此種範圍內使不飽和單體(b1)共聚合,有可獲得鹼性顯影性及保存穩定性優異之感光性著色組成物之傾向。 In the copolymer of the unsaturated monomer (b1) and the unsaturated monomer (b2), the copolymerization ratio of the unsaturated monomer (b1) in the copolymer is preferably 5 to 50% by mass, and more preferably 10 to 40% by mass. By copolymerizing the unsaturated monomer (b1) within such a range, there is a tendency that a photosensitive coloring composition excellent in alkali developability and storage stability can be obtained.
作為不飽和單體(b1)與不飽和單體(b2)之共聚合體之具體例,例如可列舉日本專利特開平7-140654號公報、日本專利特開平8-259876號公報、日本專利特開平10-31308號公報、日本 專利特開平10-300922號公報、日本專利特開平11-174224號公報、日本專利特開平11-258415號公報、日本專利特開2000-56118號公報、日本專利特開2004-101728號公報等所揭示之共聚合體。 Specific examples of the copolymer of the unsaturated monomer (b1) and the unsaturated monomer (b2) include, for example, Japanese Patent Laid-Open No. 7-140654, Japanese Patent Laid-Open No. 8-259876, and Japanese Patent Laid-Open No. 8-259876. Gazette No. 10-31308, Japan Japanese Patent Laid-Open No. 10-300922, Japanese Patent Laid-Open No. 11-174224, Japanese Patent Laid-Open No. 11-258415, Japanese Patent Laid-Open No. 2000-56118, Japanese Patent Laid-Open No. 2004-101728, etc. revealed copolymers.
不飽和單體(b1)與不飽和單體(b2)之共聚合體可藉由公知之方法製造,例如亦可藉由日本專利特開2003-222717號公報、日本專利特開2006-259680號公報、國際公開第2007/029871號等所揭示之方法控制其構造或Mw、Mw/Mn。 The copolymer of the unsaturated monomer (b1) and the unsaturated monomer (b2) can be produced by a known method, for example, Japanese Patent Laid-Open No. 2003-222717 and Japanese Patent Laid-Open No. 2006-259680 , International Publication No. 2007/029871, etc. to control its structure or Mw, Mw/Mn.
<(c)光聚合起始劑> <(c) Photopolymerization Initiator>
(c)光聚合起始劑係具有直接吸收光並引起分解反應或脫氫反應而產生聚合活性自由基之功能之成分。亦可視需要添加聚合促進劑(鏈轉移劑)、增感色素等添加劑而使用。 (c) The photopolymerization initiator is a component having the function of directly absorbing light and causing a decomposition reaction or a dehydrogenation reaction to generate a polymerization active radical. Additives, such as a polymerization accelerator (chain transfer agent) and a sensitizing dye, can also be added and used as needed.
本發明之感光性著色組成物中之(c)光聚合起始劑包含下述式(I)所表示之肟酯系化合物。如此,認為藉由包含下述式(I)所表示之肟酯系化合物,對長波長光之吸光性因其咔唑骨架中所包含之萘環而變高,可提高塗膜內部之交聯密度;又,由於構造中具有鹵素原子,故而該化合物容易分佈於塗膜表面,可抑制膜表面之交聯密度因氧阻礙之影響而過度變高。 The (c) photopolymerization initiator in the photosensitive coloring composition of the present invention contains an oxime ester-based compound represented by the following formula (I). As described above, it is considered that by including the oxime ester compound represented by the following formula (I), the light absorption to long-wavelength light is increased due to the naphthalene ring contained in the carbazole skeleton, and the crosslinking inside the coating film can be improved. In addition, since the structure has halogen atoms, the compound is easily distributed on the surface of the coating film, and the crosslinking density on the surface of the film can be suppressed from being excessively high due to the influence of oxygen barrier.
[化12]
上述通式(I)中, In the above general formula (I),
R1表示可具有取代基之芳香族環基。 R 1 represents an aromatic ring group which may have a substituent.
R2表示可具有取代基之烷醯基、或可具有取代基之芳醯基。 R 2 represents an optionally substituted alkane group or an optionally substituted aryl group.
R3表示氫原子、或可具有取代基之烷基。 R 3 represents a hydrogen atom or an alkyl group which may have a substituent.
R4表示可具有取代基之芳香族環基。 R 4 represents an aromatic ring group which may have a substituent.
R5及R6分別獨立地表示可具有取代基之苯環、或可具有取代基之萘環。其中,R5及R6之至少任一者為可具有取代基之萘環。 R 5 and R 6 each independently represent a benzene ring which may have a substituent or a naphthalene ring which may have a substituent. Wherein, at least one of R 5 and R 6 is a naphthalene ring which may have a substituent.
R1及R4之至少任一者具有-OR7基作為取代基。其中,R7表示鹵烷基。 At least any one of R 1 and R 4 has a -OR 7 group as a substituent. wherein R 7 represents a haloalkyl group.
X表示直接鍵或羰基。 X represents a direct bond or a carbonyl group.
Z表示直接鍵或羰基。 Z represents a direct bond or a carbonyl group.
作為R1中之芳香族環基,可列舉芳香族烴環基及芳香族雜環基。其碳數較佳為30以下,更佳為12以下,進而較佳為8以下。又,通常為4以上,較佳為6以上。藉由設為上述上限值以下,有溶解性變得良好之傾向,藉由設為上述下限值以上,有容易兼顧感度與溶解性之傾向。 As an aromatic ring group in R< 1 >, an aromatic hydrocarbon ring group and an aromatic heterocyclic group are mentioned. The number of carbon atoms is preferably 30 or less, more preferably 12 or less, and still more preferably 8 or less. Moreover, it is 4 or more normally, Preferably it is 6 or more. By setting it as the said upper limit or less, there exists a tendency for solubility to become favorable, and by setting it as more than the said lower limit, it exists in the tendency for both sensitivity and solubility to be easily compatible.
芳香族烴環基意指具有1個自由價之芳香族烴環。作為芳香族烴環基之芳香族烴環,可為單環亦可為縮合環,例如可列舉:苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、環、聯三伸苯環、乙烷合萘環、熒蒽環、茀環等。 The aromatic hydrocarbon ring group means an aromatic hydrocarbon ring having one free valence. The aromatic hydrocarbon ring of the aromatic hydrocarbon ring group may be a single ring or a condensed ring, for example, a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a fused tetraphenyl ring, a pyrene ring, a benzene ring, and a benzene ring. and pyrene ring, ring, bi-triphenylene ring, ethanenaphthalene ring, fluoranthene ring, perylene ring, etc.
又,芳香族雜環基意指具有1個自由價之芳香族雜環。作為芳香族雜環基之芳香族雜環,可為單環亦可為縮合環,例如可列舉:呋喃環、苯并呋喃環、噻吩環、苯并噻吩環、吡咯環、吡唑環、咪唑環、二唑環、吲哚環、咔唑環、吡咯并咪唑環、吡咯并吡唑環、吡咯并吡咯環、噻吩并吡咯環、噻吩并噻吩環、呋喃并吡咯環、呋喃并呋喃環、噻吩并呋喃環、苯并異唑環、苯并異 噻唑環、苯并咪唑環、吡啶環、吡環、嗒環、嘧啶環、三環、喹啉環、異喹啉環、啉環、喹啉環、啡啶環、苯并咪唑環、呸啶環、喹唑啉環、喹唑啉酮環、薁環等。 In addition, the aromatic heterocyclic group means an aromatic heterocyclic ring having one free valence. The aromatic heterocyclic ring of the aromatic heterocyclic group may be a single ring or a condensed ring, and examples thereof include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, and an imidazole ring. ring, oxadiazole ring, indole ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furanofuran ring, thieno furan ring, benziso azole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, pyridine ring, click ring, pyrimidine ring, three ring, quinoline ring, isoquinoline ring, quinoline, quinoline Linen ring, phenanthrene ring, benzimidazole ring, pyridine ring, quinazoline ring, quinazolinone ring, azulene ring, etc.
作為芳香族環基可具有之取代基,可列舉:烷基、羥基、烷氧基、鹵素原子、鹵烷基(氫原子之一部分或全部被取代為鹵素原子之烷基)、鹵烷氧基(氫原子之一部分或全部被取代為鹵素原子之烷氧基)等,就表面硬化性之觀點而言,較佳為鹵素原子、鹵烷基或鹵烷氧基,又,就合成容易性之觀點而言,較佳為不經取代。 Examples of the substituent which the aromatic ring group may have include an alkyl group, a hydroxyl group, an alkoxy group, a halogen atom, a haloalkyl group (an alkyl group in which a part or all of a hydrogen atom is substituted with a halogen atom), a haloalkoxy group From the viewpoint of surface hardening properties, such as an alkoxy group in which a part or all of a hydrogen atom is substituted with a halogen atom, a halogen atom, a haloalkyl group, or a haloalkoxy group is preferable, and further, from the viewpoint of ease of synthesis From a viewpoint, it is preferable not to be substituted.
該等之中,就感度之觀點而言,較佳為可具有取代基之芳香族烴環基,進而較佳為可具有取代基之苯環基。 Among these, from the viewpoint of sensitivity, an aromatic hydrocarbon ring group which may have a substituent is preferable, and a phenyl ring group which may have a substituent is more preferable.
R2中之烷醯基之碳數並無特別限定,就感度之觀點而言,較佳為2以上。又,就感度之觀點而言,較佳為20以下,更佳為12以下,進而較佳為7以下,更進而較佳為5以下,尤佳為3以下。 The carbon number of the alkanoyl group in R 2 is not particularly limited, but from the viewpoint of sensitivity, it is preferably 2 or more. Moreover, from a viewpoint of sensitivity, 20 or less are preferable, 12 or less are more preferable, 7 or less are still more preferable, 5 or less are still more preferable, 3 or less are especially preferable.
作為烷醯基之具體例,可列舉乙醯基、丙醯基、丁醯基等,該等之中,就感度之觀點而言,較佳為乙醯基或丙醯基,更佳為乙醯基。作為烷醯基可具有之取代基,可列舉羥基、烷氧基、鹵素原子等,就感度之觀點而言,較佳為不經取代。 Specific examples of the alkanoyl group include an acetyl group, a propionyl group, a butyryl group, and the like. Among these, an acetyl group or a propionyl group is preferred, and an acetyl group is more preferred from the viewpoint of sensitivity. . As a substituent which an alkanoyl group may have, a hydroxyl group, an alkoxy group, a halogen atom, etc. are mentioned, and it is preferable that it is not substituted from the viewpoint of sensitivity.
R2中之芳醯基之碳數並無特別限定,就感度之觀點而言,較佳為7以上。又,就感度之觀點而言,較佳為20以下,更佳為12以下,進而較佳為10以下,尤佳為8以下。 The carbon number of the aryl group in R 2 is not particularly limited, but from the viewpoint of sensitivity, it is preferably 7 or more. Moreover, from a viewpoint of sensitivity, 20 or less are preferable, 12 or less are more preferable, 10 or less are still more preferable, and 8 or less are especially preferable.
作為芳醯基之具體例,可列舉苯甲醯基、甲基苯甲醯基、萘甲醯基等,該等之中,就感度之觀點而言,更佳為苯甲醯基。 Specific examples of the aryl group include a benzyl group, a methyl benzyl group, a naphthyl group, and the like, and among these, a benzyl group is more preferred from the viewpoint of sensitivity.
作為芳醯基可具有之取代基,可列舉羥基、烷氧基、鹵素原子等,就感度之觀點而言,較佳為不經取代。該等之中,就感度之觀點而言,較佳為將R2設為可具有取代基之烷醯基,更佳為設為不經取代之烷醯基,進而較佳為設為乙醯基。 Examples of the substituent which the aryl aryl group may have include a hydroxyl group, an alkoxy group, a halogen atom, and the like, and from the viewpoint of sensitivity, it is preferably unsubstituted. Among these, from the viewpoint of sensitivity, R 2 is preferably an alkanoyl group which may have a substituent, more preferably an unsubstituted alkanoyl group, and more preferably an acetyl group base.
R3中之烷基之碳數並無特別限定,就溶解性之觀點而言,較佳為1以上,更佳為2以上,進而較佳為5以上,尤佳為7以上。又,就相溶性之觀點而言,較佳為20以下,更佳為15以下,進而較佳為10以下。 The number of carbon atoms of the alkyl group in R 3 is not particularly limited, but from the viewpoint of solubility, preferably 1 or more, more preferably 2 or more, still more preferably 5 or more, particularly preferably 7 or more. Moreover, from the viewpoint of compatibility, 20 or less are preferable, 15 or less are more preferable, and 10 or less are still more preferable.
作為烷基之具體例,可列舉:甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、2-乙基己基等,該等之中,就溶解性之觀點而言,較佳為辛基或2-乙基己基,更佳為2-乙基己基。 Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a 2-ethylhexyl group, and the like, among these, from the viewpoint of solubility Specifically, an octyl group or a 2-ethylhexyl group is preferable, and a 2-ethylhexyl group is more preferable.
作為烷基可具有之取代基,可列舉:羥基、烷氧基、鹵素原子、磷酸基等,就合成容易性之觀點而言,進而較佳為不經取代。該等之中,就溶解性之觀點而言,較佳為將R3設為可具有取代基之烷基,更佳為設為不經取代之烷基,進而較佳為設為2-乙基己基。 Examples of the substituent which the alkyl group may have include a hydroxyl group, an alkoxy group, a halogen atom, a phosphoric acid group, and the like, and from the viewpoint of ease of synthesis, it is more preferably unsubstituted. Among these, from the viewpoint of solubility, R 3 is preferably an alkyl group which may have a substituent, more preferably an unsubstituted alkyl group, and still more preferably 2-ethyl base hex.
作為R4中之芳香族環基,可列舉芳香族烴環基及芳香族雜環基。其碳數較佳為30以下,更佳為12以下,進而較佳為8以下。又,通常為4以上,較佳為6以上。藉由設為上述上限值以下,有溶解性變得良好之傾向,藉由設為上述下限值以上,有容易兼顧感度與溶解性之傾向。 As an aromatic ring group in R< 4 >, an aromatic hydrocarbon ring group and an aromatic heterocyclic group are mentioned. The number of carbon atoms is preferably 30 or less, more preferably 12 or less, and still more preferably 8 or less. Moreover, it is 4 or more normally, Preferably it is 6 or more. By setting it as the said upper limit or less, there exists a tendency for solubility to become favorable, and by setting it as more than the said lower limit, it exists in the tendency for both sensitivity and solubility to be easily compatible.
芳香族烴環基意指具有1個自由價之芳香族烴環。作為芳香族烴環基之芳香族烴環,可為單環亦可為縮合環,例如可列舉:苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、 環、聯三伸苯環、乙烷合萘環、熒蒽環、茀環等。 The aromatic hydrocarbon ring group means an aromatic hydrocarbon ring having one free valence. The aromatic hydrocarbon ring of the aromatic hydrocarbon ring group may be a single ring or a condensed ring, for example, a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a fused tetraphenyl ring, a pyrene ring, a benzene ring, and a benzene ring. and pyrene ring, ring, bi-triphenylene ring, ethanenaphthalene ring, fluoranthene ring, perylene ring, etc.
又,芳香族雜環基意指具有1個自由價之芳香族雜環。作為芳香族雜環基之芳香族雜環,可為單環亦可為縮合環。例如可列舉:呋喃環、苯并呋喃環、噻吩環、苯并噻吩環、吡咯環、吡唑環、咪唑環、二唑環、吲哚環、咔唑環、吡咯并咪唑環、吡咯并吡唑環、吡咯并吡咯環、噻吩并吡咯環、噻吩并噻吩環、呋喃并吡咯環、呋喃并呋喃環、噻吩并呋喃環、苯并異唑環、苯并異噻唑環、苯并咪唑環、吡啶環、吡環、嗒環、嘧啶環、三環、喹啉環、異喹啉環、啉環、喹啉環、啡啶環、苯并咪唑環、呸啶環、喹唑啉環、喹唑啉酮環、薁環等。 In addition, the aromatic heterocyclic group means an aromatic heterocyclic ring having one free valence. The aromatic heterocyclic ring of the aromatic heterocyclic group may be a monocyclic ring or a condensed ring. For example, furan ring, benzofuran ring, thiophene ring, benzothiophene ring, pyrrole ring, pyrazole ring, imidazole ring, oxadiazole ring, indole ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furanofuran ring, thieno furan ring, benziso azole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, pyridine ring, click ring, pyrimidine ring, three ring, quinoline ring, isoquinoline ring, quinoline, quinoline Linen ring, phenanthrene ring, benzimidazole ring, pyridine ring, quinazoline ring, quinazolinone ring, azulene ring, etc.
作為芳香族環基可具有之取代基,可列舉:烷基、羥基、烷氧基、鹵素原子等,就溶解性之觀點而言,較佳為烷基或烷氧基,更佳為烷基,進而較佳為甲基。 Examples of the substituent which the aromatic ring group may have include an alkyl group, a hydroxyl group, an alkoxy group, a halogen atom, and the like. From the viewpoint of solubility, an alkyl group or an alkoxy group is preferred, and an alkyl group is more preferred. , and more preferably methyl.
取代基之數量並無特別限定,就溶解性之觀點而言,較佳為1以上,更佳為2以上,進而較佳為3以上。又,就相溶性之觀點而言,較佳為10以下,更佳為5以下,進而較佳為4以下。 The number of substituents is not particularly limited, but from the viewpoint of solubility, preferably 1 or more, more preferably 2 or more, and still more preferably 3 or more. Moreover, from the viewpoint of compatibility, 10 or less are preferable, 5 or less are more preferable, and 4 or less are still more preferable.
該等之中,就溶解性之觀點而言,較佳為將R4設為可具有取代基之芳香族烴環基,更佳為設為具有2個以上之甲基之芳香族烴環基,進而較佳為設為2,4,6-三甲苯基。 Among these, from the viewpoint of solubility, R 4 is preferably an aromatic hydrocarbon ring group which may have a substituent, more preferably an aromatic hydrocarbon ring group having two or more methyl groups , and more preferably 2,4,6-trimethylphenyl.
R5及R6分別獨立地表示可具有取代基之苯環或萘環。其中,R5及R6之至少任一者為可具有取代基之萘環。作為具體之組合,可列舉:R5為可具有取代基之苯環且R6為可具有取代基之萘環之組合、R5為可具有取代基之萘環且R6為可具有取代基之苯環之組合、R5為可具有取代基之萘環且R6為可具有取代基之 萘環之組合。 R 5 and R 6 each independently represent a benzene ring or a naphthalene ring which may have a substituent. Wherein, at least one of R 5 and R 6 is a naphthalene ring which may have a substituent. As a specific combination, it can be enumerated: R 5 is a combination of a benzene ring which may have a substituent and R 6 is a combination of a naphthalene ring which may have a substituent, R 5 is a naphthalene ring which may have a substituent, and R 6 is a naphthalene ring which may have a substituent A combination of benzene rings, R 5 is a naphthalene ring which may have a substituent, and R 6 is a combination of a naphthalene ring which may have a substituent.
該等之中,就吸光性之觀點而言,可列舉R5為可具有取代基之萘環且R6為可具有取代基之苯環之組合。 Among these, from the viewpoint of light absorption, R 5 is a combination of a naphthalene ring which may have a substituent and R 6 is a benzene ring which may have a substituent.
於R5為可具有取代基之苯環之情形時,可列舉於苯環之1位鍵結N原子、於2位鍵結R6且於4位鍵結X之態樣。同樣地,於R6為可具有取代基之苯環之情形時,可列舉於苯環之1位鍵結N原子、於2位鍵結R5且於4位鍵結Z之態樣。 When R 5 is a benzene ring which may have a substituent, an N atom is bonded to the 1-position of the benzene ring, R 6 is bonded to the 2-position, and an X is bonded to the 4-position. Similarly, when R 6 is a benzene ring which may have a substituent, an N atom is bonded to the 1-position of the benzene ring, R 5 is bonded to the 2-position, and Z is bonded to the 4-position.
另一方面,於R5為可具有取代基之萘環之情形時,式(I)中鍵結於R5之X、N原子、R6亦可鍵結於該萘環之任一位。例如可列舉於萘環之1位鍵結有N原子、於2位鍵結有R6且於4位鍵結有X之態樣,或於萘環之1位鍵結有R6、於2位鍵結有N原子且於6位鍵結有X之態樣等。 On the other hand, when R 5 is a naphthalene ring which may have a substituent, X, N atom and R 6 bonded to R 5 in formula (I) may also be bonded to any position of the naphthalene ring. For example, an N atom is bonded to the 1-position of the naphthalene ring, R 6 is bonded to the 2-position, and X is bonded to the 4-position, or R 6 is bonded to the 1-position of the naphthalene ring, and R 6 is bonded to the 2-position An aspect in which an N atom is bonded to the 6-position and an X is bonded to the 6-position, and the like.
同樣地,於R6為可具有取代基之萘環之情形時,式(I)中鍵結於R6之Z、N原子、R5亦可鍵結於該萘環之任一位。例如可列舉於萘環之1位鍵結有N原子、於2位鍵結有R5且於4位鍵結有Z之態樣、或於萘環之1位鍵結有R5、於2位鍵結有N原子且於6位鍵結有Z之態樣等。 Similarly, when R 6 is a naphthalene ring which may have a substituent, the Z, N atom and R 5 bonded to R 6 in formula (I) may also be bonded to any position of the naphthalene ring. For example, an N atom is bonded to the 1-position of the naphthalene ring, R 5 is bonded to the 2-position, and Z is bonded to the 4-position; or R 5 is bonded to the 1-position of the naphthalene ring; There is an N atom bonded to the 6-position, and Z is bonded to the 6-position.
作為R5及R6中之苯環或萘環可具有之取代基,可列舉羥基、烷氧基、鹵素原子等,就感度之觀點而言,進而較佳為不經取代。 Examples of substituents that the benzene ring or naphthalene ring in R 5 and R 6 may have include a hydroxyl group, an alkoxy group, a halogen atom, and the like, and from the viewpoint of sensitivity, it is more preferably unsubstituted.
R1及R4之至少任一者具有-OR7基作為取代基。可為R1具有-OR7基,可為R4具有-OR7基,亦可為R1及R4分別獨立地具有-OR7基。該等之中,就感度之觀點而言,較佳為R1具有-OR7基。 At least any one of R 1 and R 4 has a -OR 7 group as a substituent. R 1 may have -OR 7 group, R 4 may have -OR 7 group, and R 1 and R 4 may each independently have -OR 7 group. Among these, from the viewpoint of sensitivity, it is preferable that R 1 has a -OR 7 group.
R7表示鹵烷基,R7中之鹵烷基之碳數並無特別限定,就溶解性之觀點而言,較佳為1以上,更佳為2以上,進而較佳為3以上。又,就相溶性之觀點而言,較佳為10以下,更佳為7以下,進而較佳為5以下。鹵烷基中之碳鏈可為直鏈,可為支鏈,亦可為環狀,就製造容易性之觀點而言,較佳為直鏈。 R 7 represents a haloalkyl group, and the number of carbon atoms in the haloalkyl group in R 7 is not particularly limited, but from the viewpoint of solubility, preferably 1 or more, more preferably 2 or more, and still more preferably 3 or more. Moreover, from the viewpoint of compatibility, 10 or less are preferable, 7 or less are more preferable, and 5 or less are still more preferable. The carbon chain in the haloalkyl group may be straight chain, branched chain, or cyclic, but from the viewpoint of ease of production, straight chain is preferred.
鹵烷基所具有之鹵素原子之數量並無特別限定,就溶解性之觀點而言,較佳為1以上,更佳為2以上,進而較佳為3以上。又,就相溶性之觀點而言,較佳為7以下,更佳為6以下,進而較佳為5以下。 The number of halogen atoms in the haloalkyl group is not particularly limited, but from the viewpoint of solubility, preferably 1 or more, more preferably 2 or more, and still more preferably 3 or more. Moreover, from the viewpoint of compatibility, it is preferably 7 or less, more preferably 6 or less, and still more preferably 5 or less.
作為鹵烷基之具體例,可列舉:2,2,3,3-四氟丙基、2,2,2-三氟乙基、2,2,3,3,4,4,5,5-八氟戊基等,該等之中,就製造容易性之觀點而言,更佳為2,2,3,3-四氟丙基。作為鹵烷基可具有之取代基,可列舉羥基、烷氧基等,就製造容易性之觀點而言,較佳為不經取代。 Specific examples of the haloalkyl group include 2,2,3,3-tetrafluoropropyl, 2,2,2-trifluoroethyl, 2,2,3,3,4,4,5,5 -Octafluoropentyl and the like, among these, 2,2,3,3-tetrafluoropropyl is more preferred from the viewpoint of ease of production. As a substituent which a haloalkyl group may have, a hydroxyl group, an alkoxy group, etc. are mentioned, From a viewpoint of easiness of manufacture, unsubstituted is preferable.
X表示直接鍵或羰基,就密接性之觀點而言,較佳為直接鍵,就感度之觀點而言,較佳為羰基。又,Z表示直接鍵或羰基,就密接性之觀點而言,較佳為直接鍵,就感度之觀點而言,較佳為羰基。 X represents a direct bond or a carbonyl group, a direct bond is preferable from the viewpoint of adhesiveness, and a carbonyl group is preferable from the viewpoint of sensitivity. Moreover, Z represents a direct bond or a carbonyl group, and a direct bond is preferable from the viewpoint of adhesiveness, and a carbonyl group is preferable from the viewpoint of sensitivity.
作為上述通式(I)所表示之肟酯系化合物之具體例,可列舉以下者。 As a specific example of the oxime ester type compound represented by the said general formula (I), the following are mentioned.
[化13]
[化14]
[化15]
[化16]
[化17]
[化18]
[化19]
[化20]
本發明之感光性著色組成物中之(c)光聚合起始劑為包含上述通式(I)所表示之肟酯系化合物者,亦可為進而包含其他光聚合起始劑者。 The (c) photopolymerization initiator in the photosensitive coloring composition of the present invention includes the oxime ester compound represented by the above-mentioned general formula (I), and may further include another photopolymerization initiator.
作為其他光聚合起始劑,例如可列舉:日本專利特開 昭59-152396號公報、日本專利特開昭61-151197號公報所記載之包含二茂鈦化合物之二茂金屬化合物;日本專利特開2000-56118號公報所記載之六芳基聯咪唑衍生物;日本專利特開平10-39503號公報記載之鹵甲基化二唑衍生物、鹵甲基-對稱三衍生物、N-苯基甘胺酸等N-芳基-α-胺基酸類、N-芳基-α-胺基酸鹽類、N-芳基-α-胺基酸酯類等自由基活性劑、α-胺烷基苯酮衍生物;日本專利特開2000-80068號公報、日本專利特開2006-36750號公報、國際公開第2008/075564號、國際公開第2009/131189號等所記載之肟酯衍生物等。 As other photopolymerization initiators, for example, there may be mentioned: dimetallocene compounds containing titanocene compounds described in Japanese Patent Laid-Open No. 59-152396 and Japanese Patent Laid-Open No. 61-151197; Japanese Patent Laid-Open No. 61-151197 Hexaarylbiimidazole derivatives described in Kokai No. 2000-56118; Halomethylation described in Japanese Patent Laid-Open No. 10-39503 oxadiazole derivatives, halomethyl-symmetric three Derivatives, N-aryl-α-amino acids such as N-phenylglycine, N-aryl-α-amino acid salts, N-aryl-α-amino acid esters and other radicals Active agents, α-aminoalkylphenone derivatives; Japanese Patent Laid-Open No. 2000-80068, Japanese Patent Laid-Open No. 2006-36750, International Publication No. 2008/075564, International Publication No. 2009/131189, etc. The described oxime ester derivatives, etc.
光聚合起始劑可單獨使用1種,亦可將2種以上組合而使用。光聚合起始劑中,可視需要調配與影像曝光光源之波長對應之增感色素、聚合促進劑以提高感應感度。作為增感色素,可列舉:日本專利特開平4-221958號公報、日本專利特開平4-219756號公報所記載之二苯并吡喃色素、日本專利特開平3-239703號公報、日本專利特開平5-289335號公報所記載之具有雜環之香豆素色素、日本專利特開平3-239703號公報、日本專利特開平5-289335號公報所記載之3-酮香豆素化合物、日本專利特開平6-19240號公報所記載之吡咯亞甲基色素、以及日本專利特開昭47-2528號公報、日本專利特開昭54-155292號公報、日本專利特公昭45-37377號公報、日本專利特開昭48-84183號公報、日本專利特開昭52-112681號公報、日本專利特開昭58-15503號公報、日本專利特開昭60-88005號公報、日本專利特開昭59-56403號公報、日本專利特開平2-69號公報、日本專利特開昭57-168088號公報、日本專利特開平5-107761號公報、日本專利特開平5-210240號公報、日 本專利特開平4-288818號公報所記載之具有二烷基胺基苯骨架之色素等。 A photopolymerization initiator may be used individually by 1 type, and may be used in combination of 2 or more types. Among the photopolymerization initiators, sensitizing dyes and polymerization accelerators corresponding to the wavelength of the image exposure light source can be prepared as needed to improve the sensitivity. Examples of sensitizing dyes include: Japanese Patent Laid-Open No. Hei 4-221958, dibenzopyran dyes described in Japanese Patent Laid-Open No. Hei 4-219756, Japanese Patent Laid-Open No. Hei 3-239703, Japanese Patent Laid-Open No. 3-239703 Coumarin pigments with heterocycles described in Kokai Hei 5-289335, 3-ketocoumarin compounds described in Japanese Patent Laid-Open No. 3-239703, Japanese Patent Laid-Open No. 5-289335, Japanese Patent Pyrromethylene dyes described in Japanese Patent Laid-Open No. 6-19240, Japanese Patent Laid-Open No. 47-2528, Japanese Patent Laid-Open No. 54-155292, Japanese Patent Laid-Open No. 45-37377, Japanese Patent Laid-Open No. 47-2528 Japanese Patent Laid-Open No. 48-84183, Japanese Patent Laid-Open No. 52-112681, Japanese Patent Laid-Open No. 58-15503, Japanese Patent Laid-Open No. 60-88005, Japanese Patent Laid-Open No. 59-59- Japanese Patent Laid-Open No. 56403, Japanese Patent Laid-Open No. 2-69, Japanese Patent Laid-Open No. Sho 57-168088, Japanese Patent Laid-Open No. 5-107761, Japanese Patent Laid-Open No. 5-210240, Japanese Patent Laid-Open No. 5-107761 The dye etc. which have a dialkylaminobenzene skeleton are described in Unexamined-Japanese-Patent No. 4-288818.
該等增感色素中較佳者為含胺基之增感色素,進而較佳者為於同一分子內具有胺基及苯基之化合物。尤佳為例如:4,4'-二甲基胺基二苯甲酮、4,4'-二乙基胺基二苯甲酮、2-胺基二苯甲酮、4-胺基二苯甲酮、4,4'-二胺基二苯甲酮、3,3'-二胺基二苯甲酮、3,4-二胺基二苯甲酮等二苯甲酮系化合物;2-(對二甲胺基苯基)苯并唑、2-(對二乙胺基苯基)苯并唑、2-(對二甲胺基苯基)苯并[4,5]苯并唑、2-(對二甲胺基苯基)苯并[6,7]苯并唑、2,5-雙(對二乙胺基苯基)-1,3,4-唑、2-(對二甲胺基苯基)苯并噻唑、2-(對二乙胺基苯基)苯并噻唑、2-(對二甲胺基苯基)苯并咪唑、2-(對二乙胺基苯基)苯并咪唑、2,5-雙(對二乙胺基苯基)-1,3,4-噻二唑、(對二甲胺基苯基)吡啶、(對二乙胺基苯基)吡啶、(對二甲胺基苯基)喹啉、(對二乙胺基苯基)喹啉、(對二甲胺基苯基)嘧啶、(對二乙胺基苯基)嘧啶等含對二烷胺基苯基之化合物等。其中最佳者為4,4'-二烷胺基苯并苯酮。又,增感色素可單獨使用1種,亦可併用2種以上。 Preferred among these sensitizing dyes are amino group-containing sensitizing dyes, and more preferred are compounds having an amino group and a phenyl group in the same molecule. Particularly preferred are, for example: 4,4'-dimethylaminobenzophenone, 4,4'-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminodiphenyl Benzophenone compounds such as ketone, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, 3,4-diaminobenzophenone; 2- (p-dimethylaminophenyl)benzo azole, 2-(p-diethylaminophenyl)benzo azole, 2-(p-dimethylaminophenyl)benzo[4,5]benzo azole, 2-(p-dimethylaminophenyl)benzo[6,7]benzo azole, 2,5-bis(p-diethylaminophenyl)-1,3,4- azole, 2-(p-dimethylaminophenyl)benzothiazole, 2-(p-diethylaminophenyl)benzothiazole, 2-(p-dimethylaminophenyl)benzimidazole, 2-(p-dimethylaminophenyl)benzimidazole p-Diethylaminophenyl)benzimidazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-thiadiazole, (p-dimethylaminophenyl)pyridine, (p-Diethylaminophenyl) Diethylaminophenyl)pyridine, (p-dimethylaminophenyl)quinoline, (p-diethylaminophenyl)quinoline, (p-dimethylaminophenyl)pyrimidine, (p-diethylaminophenyl) Phenyl) pyrimidine and other compounds containing p-dialkylamino phenyl, etc. The best among them is 4,4'-dialkylaminobenzophenone. Moreover, a sensitizing dye may be used individually by 1 type, and may use 2 or more types together.
作為聚合促進劑,例如使用對二甲胺基苯甲酸乙酯、苯甲酸2-二甲胺基乙酯等芳香族胺、正丁胺、N-甲基二乙醇胺等脂肪族胺、下述巰基化合物等。聚合促進劑可單獨使用1種,亦可將2種以上組合而使用。 As the polymerization accelerator, for example, aromatic amines such as ethyl p-dimethylaminobenzoate and 2-dimethylaminoethyl benzoate, aliphatic amines such as n-butylamine and N-methyldiethanolamine, and the following mercapto groups are used. compounds, etc. A polymerization accelerator may be used individually by 1 type, and may be used in combination of 2 or more types.
<(d)乙烯性不飽和化合物> <(d) Ethylenically unsaturated compound>
本發明之感光性著色組成物包含(d)乙烯性不飽和化合物。藉由包含(d)乙烯性不飽和化合物而提高感度。本發明中所使用之乙烯性 不飽和化合物為於分子內具有至少1個乙烯性不飽和基之化合物。具體而言,例如可列舉:(甲基)丙烯酸、(甲基)丙烯酸烷基酯、丙烯腈、苯乙烯、及具有1個乙烯性不飽和鍵之羧酸與多元或1元醇之單酯等。 The photosensitive coloring composition of this invention contains (d) an ethylenically unsaturated compound. The sensitivity is improved by including (d) an ethylenically unsaturated compound. Vinyl used in the present invention An unsaturated compound is a compound which has at least 1 ethylenically unsaturated group in a molecule|numerator. Specifically, for example, (meth)acrylic acid, (meth)acrylic acid alkyl ester, acrylonitrile, styrene, and a monoester of a carboxylic acid having one ethylenically unsaturated bond and a polyvalent or monovalent alcohol can be mentioned. Wait.
於本發明中,尤佳為使用1分子中具有兩個以上之乙烯性不飽和基之多官能基乙烯性單體。多官能基乙烯性單體所具有之乙烯性不飽和基之數量並無特別限定,通常為2以上,較佳為4以上,更佳為5以上,又,較佳為8以下,更佳為7以下。藉由設為上述下限值以上,有成為高感度之傾向,藉由設為上述上限值以下,有對溶劑之溶解性提高之傾向。 In this invention, it is especially preferable to use the polyfunctional vinylic monomer which has two or more ethylenically unsaturated groups in 1 molecule. The number of ethylenically unsaturated groups contained in the polyfunctional ethylenic monomer is not particularly limited, but is usually 2 or more, preferably 4 or more, more preferably 5 or more, and preferably 8 or less, more preferably 7 or less. By making it more than the said lower limit value, there exists a tendency for high sensitivity, and there exists a tendency for the solubility to a solvent to improve by making it into the said upper limit value or less.
作為多官能基乙烯性單體之例,例如可列舉:脂肪族多羥基化合物與不飽和羧酸之酯;芳香族多羥基化合物與不飽和羧酸之酯;脂肪族多羥基化合物、芳香族多羥基化合物等多元羥基化合物、及藉由與不飽和羧酸及多元羧酸之酯化反應所獲得之酯等。 Examples of polyfunctional vinyl monomers include esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids; esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids; aliphatic polyhydroxy compounds, aromatic polyhydroxy compounds Polyvalent hydroxy compounds such as hydroxy compounds, and esters obtained by esterification with unsaturated carboxylic acids and polyvalent carboxylic acids, and the like.
作為上述脂肪族多羥基化合物與不飽和羧酸之酯,可列舉:乙二醇二丙烯酸酯、三乙二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基乙烷三丙烯酸酯、季戊四醇二丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、丙三醇丙烯酸酯等脂肪族多羥基化合物之丙烯酸酯、將該等例示化合物之丙烯酸酯替換為甲基丙烯酸酯之甲基丙烯酸酯、同樣地替換為衣康酸酯之衣康酸酯、替換為丁烯酸酯之丁烯酸酯或替換為馬來酸酯之馬來酸酯等。 Examples of esters of the aliphatic polyhydroxy compound and unsaturated carboxylic acid include ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, and trimethylolethane triacrylate. Acrylates of aliphatic polyhydroxy compounds such as pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, glycerol acrylate, etc. The acrylates of these exemplified compounds are replaced by methacrylates of methacrylates, itaconate by itaconates, crotonates by crotonates, or maleate by maleate Maleic acid esters, etc.
作為芳香族多羥基化合物與不飽和羧酸之酯,可列 舉:對苯二酚二丙烯酸酯、對苯二酚二甲基丙烯酸酯、間苯二酚二丙烯酸酯、間苯二酚二甲基丙烯酸酯、鄰苯三酚三丙烯酸酯等芳香族多羥基化合物之丙烯酸酯及甲基丙烯酸酯等。 As the ester of aromatic polyhydroxy compound and unsaturated carboxylic acid, it can be listed Examples: aromatic polyhydroxyl groups such as hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, resorcinol dimethacrylate, pyrogallol triacrylate, etc. Compounds of acrylate and methacrylate, etc.
作為藉由多元羧酸及不飽和羧酸與多元羥基化合物之酯化反應所獲得之酯未必為單一物,若列舉代表性之具體例,則可列舉:丙烯酸、鄰苯二甲酸與乙二醇之縮合物;丙烯酸、馬來酸與二乙二醇之縮合物;甲基丙烯酸、對苯二甲酸與季戊四醇之縮合物;丙烯酸、己二酸、丁二醇與甘油之縮合物等。 The ester obtained by the esterification reaction of a polyvalent carboxylic acid, an unsaturated carboxylic acid and a polyvalent hydroxy compound is not necessarily a single product, but representative specific examples include: acrylic acid, phthalic acid, and ethylene glycol The condensate of acrylic acid, maleic acid and diethylene glycol; the condensate of methacrylic acid, terephthalic acid and pentaerythritol; the condensate of acrylic acid, adipic acid, butanediol and glycerol, etc.
此外,作為本發明中所使用之多官能基乙烯性單體之例,如使聚異氰酸酯化合物與含羥基之(甲基)丙烯酸酯或使聚異氰酸酯化合物與多元醇及含羥基之(甲基)丙烯酸酯反應所獲得之(甲基)丙烯酸胺基甲酸乙酯類;如多元環氧化合物與羥基(甲基)丙烯酸酯或(甲基)丙烯酸之加成反應物之環氧丙烯酸酯類;伸乙雙丙烯醯胺等丙烯醯胺類;鄰苯二甲酸二烯丙酯等烯丙酯類;鄰苯二甲酸二乙烯酯等含乙烯基之化合物等較有用。 In addition, as an example of the polyfunctional vinylic monomer used in the present invention, for example, a polyisocyanate compound and a hydroxyl-containing (meth)acrylate, or a polyisocyanate compound and a polyol and a hydroxyl-containing (meth)acrylate are used. Urethane (meth)acrylate obtained by acrylate reaction; such as epoxy acrylates of addition reactants of polyvalent epoxy compounds and hydroxyl (meth)acrylate or (meth)acrylic acid; extension Acrylamides such as ethylenebisacrylamide; allyl esters such as diallyl phthalate; vinyl-containing compounds such as divinyl phthalate are useful.
作為上述(甲基)丙烯酸胺基甲酸乙酯類,例如可列舉:DPHA-40H、UX-5000、UX-5002D-P20、UX-5003D、UX-5005(日本化藥公司製造)、U-2PPA、U-6LPA、U-10PA、U-33H、UA-53H、UA-32P、UA-1100H(新中村化學工業公司製造)、UA-306H、UA-510H、UF-8001G(協榮社化學公司製造)、UV-1700B、UV-7600B、UV-7605B、UV-7630B、UV7640B(日本合成化學公司製造)等。 As said urethane (meth)acrylate, for example, DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA , U-6LPA, U-10PA, U-33H, UA-53H, UA-32P, UA-1100H (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), UA-306H, UA-510H, UF-8001G (Kyoeisha Chemical Co., Ltd. manufactured), UV-1700B, UV-7600B, UV-7605B, UV-7630B, UV7640B (manufactured by Nippon Synthetic Chemical Co., Ltd.), etc.
該等之中,就硬化性之觀點而言,作為(d)乙烯性不飽和化合物,較佳為使用(甲基)丙烯酸烷基酯,更佳為使用二季戊四 醇六丙烯酸酯。該等可單獨使用1種,亦可併用2種以上。 Among these, from the viewpoint of curability, as the (d) ethylenically unsaturated compound, it is preferable to use an alkyl (meth)acrylate, and it is more preferable to use dipentatetrakis. Alcohol hexaacrylate. These may be used individually by 1 type, and may use 2 or more types together.
<(e)溶劑> <(e) Solvent>
本發明之感光性著色組成物包含(e)溶劑。藉由包含(e)溶劑,可將顏料分散於溶劑中,又,變得容易塗佈。本發明之感光性著色組成物通常將(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(f)分散劑、及視需要使用之其他各種材料以溶解或分散於溶劑中之狀態使用。溶劑之中,就分散性或塗佈性之觀點而言,較佳為有機溶劑。 The photosensitive coloring composition of this invention contains (e) a solvent. By including the (e) solvent, the pigment can be dispersed in the solvent, and coating becomes easy. The photosensitive coloring composition of the present invention usually contains (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (f) a dispersant, and if necessary Various other materials used are used in a state of being dissolved or dispersed in a solvent. Among the solvents, from the viewpoint of dispersibility and coatability, organic solvents are preferred.
有機溶劑之中,就塗佈性之觀點而言,較佳為選擇沸點為100~300℃之範圍者,更佳為選擇沸點為120~280℃之範圍者。再者,此處所謂之沸點意指壓力1013.25hPa下之沸點。 Among the organic solvents, from the viewpoint of coatability, it is preferable to select a boiling point in a range of 100 to 300°C, and more preferably a boiling point in a range of 120 to 280°C. In addition, the so-called boiling point here means the boiling point under a pressure of 1013.25 hPa.
作為此種有機溶劑,例如可列舉如下者。如乙二醇單甲醚、乙二醇單乙醚、乙二醇單丙醚、乙二醇單丁醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單正丁醚、丙二醇第三丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單正丁醚、甲氧基甲基戊醇、二丙二醇單乙醚、二丙二醇單甲醚、3-甲基-3-乙氧基丁醇、三乙二醇單甲醚、三乙二醇單乙醚、三丙二醇甲醚之二醇單烷基醚類; As such an organic solvent, the following are mentioned, for example. Such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol tertiary butyl ether, two Ethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethyl amyl alcohol, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methyl-3-ethyl Glycol monoalkyl ethers of oxybutanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, and tripropylene glycol methyl ether;
如乙二醇二甲醚、乙二醇二乙醚、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇二丙醚、二乙二醇二丁醚、二丙二醇二甲醚之二醇二烷基醚類; Such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, dipropylene glycol dimethyl ether Glycol dialkyl ethers;
如乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單正丁醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚乙酸酯、丙二醇單丁醚乙酸酯、乙酸甲氧基丁酯、乙 酸3-甲氧基丁酯、乙酸甲氧基戊酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、二乙二醇單正丁醚乙酸酯、二丙二醇單甲醚乙酸酯、三乙二醇單甲醚乙酸酯、三乙二醇單乙醚乙酸酯、3-甲基-3-甲氧基丁基乙酸酯之二醇烷基醚乙酸酯類; Such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether Acetate, Propylene Glycol Monobutyl Ether Acetate, Methoxybutyl Acetate, Ethylene Glycol 3-methoxybutyl acid, methoxypentyl acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate Propylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, glycol alkyl ethers of 3-methyl-3-methoxybutyl acetate acetates;
乙二醇二乙酸酯、1,3-丁二醇二乙酸酯、1,6-己醇二乙酸酯等二醇二乙酸酯類;乙酸環己醇酯等乙酸烷基酯類;如戊醚、二乙醚、二丙醚、二異丙醚、二丁醚、二戊醚、乙基異丁醚、二己醚之醚類; Glycol diacetate such as ethylene glycol diacetate, 1,3-butanediol diacetate, 1,6-hexanol diacetate; alkyl acetates such as cyclohexanol acetate; Ethers such as amyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, dipentyl ether, ethyl isobutyl ether, and dihexyl ether;
如丙酮、甲基乙基酮、甲基戊酮、甲基異丙酮、甲基異戊酮、二異丙酮、二異丁酮、甲基異丁酮、環己酮、乙基戊酮、甲基丁酮、甲基己酮、甲基壬酮、甲氧基甲基戊酮之酮類; Such as acetone, methyl ethyl ketone, methyl amyl ketone, methyl isoacetone, methyl isoamyl ketone, diisoacetone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl amyl ketone, methyl Ketones of methylbutanone, methylhexanone, methylnonanone, methoxymethylpentanone;
如乙醇、丙醇、丁醇、己醇、環己醇、乙二醇、丙二醇、丁二醇、二乙二醇、二丙二醇、三乙二醇、甲氧基甲基戊醇、甘油、苄基醇之1元或多元醇類; Such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethyl pentanol, glycerol, benzyl Monohydric or polyhydric alcohols of base alcohols;
如正戊烷、正辛烷、二異丁烯、正己烷、己烯、異戊二烯、二戊烯、十二烷之脂肪族烴類;如環己烷、甲基環己烷、甲基環己烯、聯環己烷之脂環式烴類; Aliphatic hydrocarbons such as n-pentane, n-octane, diisobutene, n-hexane, hexene, isoprene, dipentene, dodecane; such as cyclohexane, methylcyclohexane, methylcyclohexane Alicyclic hydrocarbons of hexene and bicyclohexane;
如苯、甲苯、二甲苯、異丙苯之芳香族烴類;如甲酸戊酯、甲酸乙酯、乙酸乙酯、乙酸丁酯、乙酸丙酯、乙酸戊酯、異丁酸甲酯、乙二醇乙酸酯、丙酸乙酯、丙酸丙酯、丁酸丁酯、丁酸異丁酯、異丁酸甲酯、辛酸乙酯、硬脂酸丁酯、苯甲酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-甲氧基丙酸丙酯、3-甲氧基丙酸丁酯、γ-丁內酯之鏈狀或環狀酯類; Aromatic hydrocarbons such as benzene, toluene, xylene, and cumene; such as amyl formate, ethyl formate, ethyl acetate, butyl acetate, propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol Alcohol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl caprylate, butyl stearate, ethyl benzoate, 3-ethyl acetate Methyl oxypropionate, Ethyl 3-ethoxypropionate, Methyl 3-methoxypropionate, Ethyl 3-methoxypropionate, Propyl 3-methoxypropionate, 3-methylpropionate Chain or cyclic esters of butyl oxypropionate and γ-butyrolactone;
如3-甲氧基丙酸、3-乙氧基丙酸之烷氧基羧酸類;如氯丁烷、氯戊烷之鹵化烴類;如甲氧基甲基戊酮之醚酮類;如乙腈、苯甲腈之腈類等。 Such as alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid; halogenated hydrocarbons such as chlorobutane and chloropentane; ether ketones such as methoxymethylpentanone; such as Nitriles of acetonitrile, benzonitrile, etc.
作為符合上述之市售之有機溶劑,可列舉:礦油精、Varsol#2、Apco#18溶劑、Apco稀釋劑、Socal Solvent No.1及No.2、Solvesso#150、Shell TS28 Solvent、卡必醇、乙基卡必醇、丁基卡必醇、Methyl Cellosolve(「Cellosolve」為註冊商標,下同)、Ethyl Cellosolve、Ethyl Cellosolve Acetate、Methyl Cellosolve Acetate、Diglyme(均為商品名)等。該等有機溶劑可單獨使用,亦可併用2種以上。 Examples of commercially available organic solvents that meet the above include: mineral spirits, Varsol#2, Apco#18 solvent, Apco thinner, Socal Solvent No.1 and No.2, Solvesso#150, Shell TS28 Solvent, Carbide Alcohol, ethyl carbitol, butyl carbitol, Methyl Cellosolve ("Cellosolve" is a registered trademark, the same below), Ethyl Cellosolve, Ethyl Cellosolve Acetate, Methyl Cellosolve Acetate, Diglyme (all are trade names), etc. These organic solvents may be used alone or in combination of two or more.
於藉由光微影法形成著色間隔件之情形時,作為有機溶劑,較佳為選擇沸點為100~200℃(壓力1013.25hPa條件下。以下,關於沸點全部相同)之範圍者。更佳為具有120~170℃之沸點者。 In the case of forming the colored spacer by photolithography, as the organic solvent, it is preferable to select the one whose boiling point is in the range of 100 to 200° C. (under a pressure of 1013.25 hPa. Hereinafter, the boiling point is all the same). More preferably, it has a boiling point of 120-170 degreeC.
上述有機溶劑之中,就塗佈性、表面張力之平衡良好且組成物中之構成成分之溶解度相對較高之方面而言,較佳為二醇烷基醚乙酸酯類。又,二醇烷基醚乙酸酯類可單獨使用,亦可併用其他有機溶劑。作為併用之有機溶劑,尤佳為二醇單烷基醚類。 Among the above-mentioned organic solvents, glycol alkyl ether acetates are preferable in terms of good balance of coatability and surface tension, and relatively high solubility of constituent components in the composition. In addition, the glycol alkyl ether acetates may be used alone, or other organic solvents may be used in combination. As an organic solvent used together, glycol monoalkyl ethers are especially preferable.
其中,就組成物中之構成成分之溶解性而言,尤佳為丙二醇單甲醚。再者,二醇單烷基醚類之極性較高,若添加量過多,則有顏料容易凝集,其後所獲得之著色樹脂組成物之黏度提高等保存穩定性降低之傾向,故而溶劑中之二醇單烷基醚類之比例較佳為5質量%~30質量%,更佳為5質量%~20質量%。 Among them, propylene glycol monomethyl ether is particularly preferred in terms of solubility of the constituents in the composition. Furthermore, glycol monoalkyl ethers have high polarity, and if the amount added is too large, the pigment tends to agglomerate, and the viscosity of the coloring resin composition obtained thereafter tends to decrease in storage stability. The ratio of glycol monoalkyl ethers is preferably 5% by mass to 30% by mass, more preferably 5% by mass to 20% by mass.
又,併用具有150℃以上之沸點之有機溶劑(以下有時 稱為「高沸點溶劑」)之情況亦較佳。藉由併用此種高沸點溶劑,感光性著色組成物不易變乾,有防止組成物中之顏料之均勻之分散狀態因急遽之乾燥而遭到破壞之效果。 In addition, an organic solvent having a boiling point of 150°C or higher (the following may be used in combination) The case referred to as "high boiling point solvent") is also preferred. By using such a high boiling point solvent in combination, the photosensitive coloring composition is not easily dried, and the uniform dispersion state of the pigment in the composition is prevented from being destroyed by rapid drying.
即,例如有防止狹縫噴嘴前端之由色材等之析出、固化所導致之異物缺陷產生之效果。就此種效果較高之方面而言,上述各種溶劑中,尤佳為二乙二醇單正丁醚、二乙二醇單正丁醚乙酸酯、及二乙二醇單乙醚乙酸酯。 That is, for example, there is an effect of preventing foreign matter defects caused by precipitation and curing of color materials and the like at the tip of the slit nozzle. In terms of the high effect, among the above-mentioned various solvents, diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-butyl ether acetate, and diethylene glycol monoethyl ether acetate are particularly preferable.
有機溶劑中之高沸點溶劑之含有比例較佳為3質量%~50質量%,更佳為5質量%~40質量%,尤佳為5質量%~30質量%。藉由設為上述下限值以上,有例如可抑制色材等在狹縫噴嘴前端析出、固化而引起異物缺陷之傾向,又,藉由設為上述上限值以下,有可抑制組成物之乾燥溫度變慢,可抑制減壓乾燥步驟之節拍不良或預烘烤之氣孔痕跡等問題之傾向 The content ratio of the high boiling point solvent in the organic solvent is preferably 3% by mass to 50% by mass, more preferably 5% by mass to 40% by mass, and particularly preferably 5% by mass to 30% by mass. By setting the above lower limit value or more, for example, it is possible to suppress the tendency of color materials, etc. to precipitate and solidify at the front end of the slit nozzle to cause foreign matter defects, and by setting it to the above upper limit value or less, the composition can be suppressed. The drying temperature becomes slower, which can suppress the tendency of poor rhythm in the decompression drying step or the porosity of pre-baking.
再者,沸點150℃以上之高沸點溶劑可為二醇烷基醚乙酸酯類,又,亦可為二醇烷基醚類,於該情形時,亦可不另外含有沸點150℃以上之高沸點溶劑。 Furthermore, the high-boiling solvent with a boiling point of 150°C or higher may be glycol alkyl ether acetates, or may be glycol alkyl ethers, and in this case, it may not contain a high-boiling solvent with a boiling point of 150°C or higher. solvent.
作為較佳之高沸點溶劑,例如於上述各種溶劑中可列舉:二乙二醇單正丁醚乙酸酯、二乙二醇單乙醚乙酸酯、二丙二醇甲醚乙酸酯、1,3-丁二醇二乙酸酯、1,6-己醇二乙酸酯、甘油三乙酸酯等。 As a preferable high boiling point solvent, for example, among the above-mentioned various solvents, diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, 1,3- Butylene glycol diacetate, 1,6-hexanol diacetate, triacetin, etc.
<(f)分散劑> <(f) Dispersant>
於本發明之感光性著色組成物中,使(a)著色劑微細地分散且使其分散狀態穩定化對於確保品質之穩定性較為重要,因此包含(f) 分散劑。 In the photosensitive coloring composition of the present invention, finely dispersing the colorant (a) and stabilizing the dispersion state are important to ensure the stability of quality, so (f) is included. Dispersant.
作為(f)分散劑,較佳為具有官能基之高分子分散劑,進而,就分散穩定性之方面而言,較佳為具有羧基;磷酸基;磺酸基;或該等之鹽基;一級、二級或三級胺基;四級銨鹽基;吡啶、嘧啶、吡等來自含氮雜環之基等官能基的高分子分散劑。 The (f) dispersant is preferably a polymer dispersant having a functional group, and further, in terms of dispersion stability, preferably has a carboxyl group; a phosphoric acid group; a sulfonic acid group; or a salt group of these; Primary, secondary or tertiary amine group; quaternary ammonium base; pyridine, pyrimidine, pyridine It is a polymer dispersant derived from functional groups such as nitrogen-containing heterocyclic groups.
其中,尤其是具有一級、二級或三級胺基;四級銨鹽基;吡啶、嘧啶、吡等來自含氮雜環之基等鹼性官能基之高分子分散劑,就將顏料分散時能以少量分散劑進行分散之觀點而言尤佳。 Among them, especially with primary, secondary or tertiary amine group; quaternary ammonium salt group; pyridine, pyrimidine, pyridine A polymer dispersant derived from a basic functional group such as a nitrogen-containing heterocyclic group is particularly preferred from the viewpoint of dispersing the pigment with a small amount of the dispersant.
又,作為高分子分散劑,例如可列舉:胺基甲酸酯系分散劑、丙烯酸系分散劑、聚伸乙基亞胺系分散劑、聚烯丙胺系分散劑、包含具有胺基之單體及巨單體之分散劑、聚氧乙烯烷基醚系分散劑、聚氧乙烯二酯系分散劑、聚醚磷酸系分散劑、聚酯磷酸系分散劑、山梨醇酐脂肪族酯系分散劑、脂肪族改質聚酯系分散劑等。 Moreover, as a polymer dispersant, for example, a urethane-based dispersant, an acrylic-based dispersant, a polyethylenimine-based dispersant, a polyallylamine-based dispersant, and a monomer containing an amine group can be mentioned. And macromonomer dispersants, polyoxyethylene alkyl ether dispersants, polyoxyethylene diester dispersants, polyether phosphoric acid dispersants, polyester phosphoric acid dispersants, sorbitan aliphatic ester dispersants , Aliphatic modified polyester dispersant, etc.
作為此種分散劑之具體例,以商品名可列舉:EFKA(註冊商標,BASF公司製造)、DISPERBYK(註冊商標,BYK-Chemie公司製造)、Disparlon(註冊商標,楠本化成公司製造)、SOLSPERSE(註冊商標,Lubrizol公司製造)、KP(信越化學工業公司製造)、Polyflow(共榮社化學公司製造)、Ajisper(註冊商標,Ajinomoto公司製造)等。該等高分子分散劑可單獨使用1種,或者亦可併用2種以上。 Specific examples of such dispersants include EFKA (registered trademark, manufactured by BASF Corporation), DISPERBYK (registered trademark, manufactured by BYK-Chemie Corporation), Disparlon (registered trademark, manufactured by Kusumoto Chemical Co., Ltd.), SOLSPERSE ( registered trademark, manufactured by Lubrizol Corporation), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyeisha Chemical Co., Ltd.), Ajisper (registered trademark, manufactured by Ajinomoto Corporation), and the like. These polymer dispersants may be used alone or in combination of two or more.
高分子分散劑之重量平均分子量(Mw)通常為700以上,較佳為1000以上,又,通常為100,000以下,較佳為50,000以下。該等之中,就顏料之分散性之觀點而言,(f)分散劑較佳為包 含具有官能基之胺基甲酸酯系高分子分散劑及/或丙烯酸系高分子分散劑,尤佳為包含丙烯酸系高分子分散劑。又,就分散性、保存性之方面而言,較佳為具有鹼性官能基且具有聚酯鍵及/或聚醚鍵之高分子分散劑。 The weight average molecular weight (Mw) of the polymer dispersant is usually 700 or more, preferably 1,000 or more, and is usually 100,000 or less, preferably 50,000 or less. Among these, from the viewpoint of the dispersibility of the pigment, (f) the dispersant is preferably a package The urethane-based polymer dispersing agent and/or the acrylic polymer dispersing agent having a functional group preferably contains an acrylic polymer dispersing agent. Moreover, from the viewpoint of dispersibility and storage stability, a polymer dispersant having a basic functional group and having a polyester bond and/or a polyether bond is preferable.
作為胺基甲酸酯系及丙烯酸系高分子分散劑,例如可列舉DISPERBYK160~166、182系列(均為胺基甲酸酯系)、DISPERBYK2000、2001、LPN21116等(均為丙烯酸系)(以上均為BYK-Chemie公司製造)。 Examples of urethane-based and acrylic-based polymer dispersants include DISPERBYK160 to 166, 182 series (all of which are urethane-based), DISPERBYK2000, 2001, LPN21116, etc. (all of the above are acrylic-based) manufactured by BYK-Chemie).
作為胺基甲酸酯系高分子分散劑,若具體地例示較佳之化學構造,則例如可列舉藉由使聚異氰酸酯化合物、分子內具有1個或2個羥基之數量平均分子量300~10,000之化合物與同一分子內具有活性氫及三級胺基之化合物進行反應所獲得之、重量平均分子量1,000~200,000之分散樹脂等。藉由利用苄基氯化物等四級化劑對該等進行處理,可使三級胺基之全部或一部分成為4級銨鹽基。 As a urethane-based polymer dispersant, if a preferable chemical structure is specifically exemplified, for example, a polyisocyanate compound and a compound having a number average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the molecule can be mentioned. A dispersion resin with a weight average molecular weight of 1,000 to 200,000 obtained by reacting with a compound having active hydrogen and a tertiary amine group in the same molecule. By treating these with a quaternary agent such as benzyl chloride, all or a part of the tertiary amine groups can be turned into quaternary ammonium salt groups.
作為上述聚異氰酸酯化合物之例,可列舉:對苯二異氰酸酯、2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、4,4'-二苯甲烷二異氰酸酯、萘-1,5-二異氰酸酯、聯甲苯胺二異氰酸酯等芳香族二異氰酸酯、六亞甲基二異氰酸酯、離胺酸甲酯二異氰酸酯、2,4,4-三甲基六亞甲基二異氰酸酯、二聚物酸二異氰酸酯等脂肪族二異氰酸酯、異佛酮二異氰酸酯、4,4'-亞甲基雙(環己基異氰酸酯)、ω,ω'-二異氰酸酯基二甲基環己烷等脂環族二異氰酸酯、苯二甲基二異氰酸酯、α,α,α',α'-四甲基苯二甲基二異氰酸酯等具有芳香環之脂肪族二異氰酸酯、離胺酸酯三異氰酸酯、1,6,11-十一烷三異氰酸酯、1,8- 二異氰酸酯基-4-異氰酸酯基甲基辛烷、1,3,6-六亞甲基三異氰酸酯、二環庚烷三異氰酸酯、三(異氰酸酯基苯基甲烷)、硫代磷酸三(異氰酸酯基苯基)酯等三異氰酸酯、及該等之三聚物、水加成物、及該等之多元醇加成物等。 Examples of the above-mentioned polyisocyanate compound include p-phenylene diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, naphthalene-1,5-diisocyanate Aromatic diisocyanates such as isocyanates, toluidine diisocyanate, hexamethylene diisocyanate, methyl lysine diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, dimer acid diisocyanate Alicyclic diisocyanates such as isophorone diisocyanate, 4,4'-methylenebis(cyclohexylisocyanate), ω,ω'-diisocyanatodimethylcyclohexane and other alicyclic diisocyanates, benzene diisocyanate Aliphatic diisocyanates with aromatic rings such as methyl diisocyanate, α,α,α',α'-tetramethylxylylene diisocyanate, lysinate triisocyanate, 1,6,11-undecane Triisocyanate, 1,8- Diisocyanato-4-isocyanatomethyloctane, 1,3,6-hexamethylene triisocyanate, dicycloheptane triisocyanate, tris(isocyanatophenylmethane), tris(isocyanatobenzene thiophosphate) triisocyanates such as base) esters, and these trimers, water adducts, and these polyol adducts, etc.
作為聚異氰酸酯較佳者為有機二異氰酸酯之三聚物,最佳者為甲苯二異氰酸酯之三聚物及異佛酮二異氰酸酯之三聚物。該等可單獨使用1種,亦可併用2種以上。 The preferred polyisocyanates are trimers of organic diisocyanates, and the most preferred ones are trimers of toluene diisocyanate and trimers of isophorone diisocyanate. These may be used individually by 1 type, and may use 2 or more types together.
作為異氰酸酯之三聚物之製造方法,可列舉如下方法:對上述聚異氰酸酯類使用適當之三聚作用觸媒、例如三級胺類、膦類、烷氧化物類、金屬氧化物、羧酸鹽類等而進行異氰酸酯基之局部之三聚作用,藉由觸媒毒之添加使三聚作用停止之後,對未反應之聚異氰酸酯進行溶劑萃取,並藉由薄膜蒸餾去除而獲得目標之含異氰尿酸酯基之聚異氰酸酯。 As a method for producing a trimer of isocyanates, there may be mentioned a method in which an appropriate trimerization catalyst such as tertiary amines, phosphines, alkoxides, metal oxides, and carboxylates is used for the above-mentioned polyisocyanates The partial trimerization of isocyanate groups is carried out by the addition of catalyst poisons, and after the trimerization is stopped by the addition of catalyst poisons, the unreacted polyisocyanates are subjected to solvent extraction and removed by thin-film distillation to obtain the target isocyanide-containing Urate-based polyisocyanates.
作為於同一分子內具有1個或2個羥基之數量平均分子量300~10,000之化合物,可列舉聚醚二醇、聚酯二醇、聚碳酸酯二醇、聚烯烴二醇等、及該等化合物之單末端羥基為碳數1~25之烷基且經烷氧基化者及該等2種以上之混合物。 Examples of compounds having a number average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the same molecule include polyether diols, polyester diols, polycarbonate diols, polyolefin diols, and the like, and these compounds The single-terminal hydroxyl group is an alkyl group having 1 to 25 carbon atoms and is alkoxylated and a mixture of two or more of these.
作為聚醚二醇,可列舉聚醚二醇、聚醚酯二醇、及該等2種以上之混合物。作為聚醚二醇,可列舉使環氧烷均聚合或共聚合所獲得者、例如聚乙二醇、聚丙二醇、乙二醇-丙二醇共聚合體、聚氧四亞甲基二醇、聚氧六亞甲基二醇、聚氧八亞甲基二醇及其等之2種以上之混合物。 Examples of the polyether diol include polyether diol, polyether ester diol, and a mixture of two or more of these. As the polyether glycol, one obtained by homopolymerizing or copolymerizing an alkylene oxide, for example, polyethylene glycol, polypropylene glycol, ethylene glycol-propylene glycol copolymer, polyoxytetramethylene glycol, polyoxyhexamethylene glycol can be mentioned. Methylene glycol, polyoxyoctamethylene glycol, and a mixture of two or more of them.
作為聚醚酯二醇,可列舉藉由使含醚基之二醇或與其他二醇之混合物與二羧酸或其等之酸酐進行反應、或者使聚酯二醇 與環氧烷進行反應所獲得者、例如聚(聚氧四亞甲基)己二酸酯等。 Examples of the polyetheresterdiol include a dicarboxylic acid or an acid anhydride thereof by reacting an ether group-containing diol or a mixture with other diols, or a polyesterdiol What is obtained by reacting with an alkylene oxide, for example, poly (polyoxytetramethylene) adipate etc. are mentioned.
作為聚醚二醇最佳者為聚乙二醇、聚丙二醇、聚氧四亞甲基二醇或該等化合物之單末端羥基為碳數1~25之烷基且經烷氧基化之化合物。 The best polyether glycol is polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol, or a compound in which the single-terminal hydroxyl group of these compounds is an alkyl group with 1 to 25 carbon atoms and is alkoxylated .
作為聚酯二醇,可列舉使二羧酸(丁二酸、戊二酸、己二酸、癸二酸、富馬酸、馬來酸、鄰苯二甲酸等)或其等之酸酐與二醇(乙二醇、二乙二醇、三乙二醇、丙二醇、二丙二醇、三丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、2,3-丁二醇、3-甲基-1,5-戊二醇、新戊二醇、2-甲基-1,3-丙二醇、2-甲基-2-丙基-1,3-丙二醇、2-丁基-2-乙基-1,3-丙二醇、1,5-戊二醇、1,6-己二醇、2-甲基-2,4-戊二醇、2,2,4-三甲基-1,3-戊二醇、2-乙基-1,3-己二醇、2,5-二甲基-2,5-己二醇、1,8-八亞甲基二醇、2-甲基-1,8-八亞甲基二醇、1,9-壬二醇等脂肪族二醇、雙羥基甲基環己烷等脂環族二醇、苯二甲基二醇、雙羥基乙氧基苯等芳香族二醇、N-甲基二乙醇胺等N-烷基二烷醇胺等)進行縮聚所獲得者、例如聚己二酸乙二酯、聚己二酸丁二酯、聚己二酸己二酯、聚己二酸乙二/丙二酯等、或將上述二醇類或碳數1~25之一元醇用作起始劑所獲得之聚內酯二醇或聚內酯單醇、例如聚己內酯二醇、聚甲基戊內酯及該等之2種以上之混合物。作為聚酯二醇,最佳者為聚己內酯二醇或將碳數1~25之醇作為起始劑之聚己內酯。 Examples of polyester diols include dicarboxylic acids (succinic acid, glutaric acid, adipic acid, sebacic acid, fumaric acid, maleic acid, phthalic acid, etc.) or acid anhydrides thereof and the like Alcohols (ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2, 3-Butanediol, 3-Methyl-1,5-pentanediol, Neopentyl glycol, 2-Methyl-1,3-propanediol, 2-Methyl-2-propyl-1,3-propanediol , 2-butyl-2-ethyl-1,3-propanediol, 1,5-pentanediol, 1,6-hexanediol, 2-methyl-2,4-pentanediol, 2,2, 4-Trimethyl-1,3-pentanediol, 2-ethyl-1,3-hexanediol, 2,5-dimethyl-2,5-hexanediol, 1,8-octamethylene diols, 2-methyl-1,8-octamethylene glycol, aliphatic diols such as 1,9-nonanediol, alicyclic diols such as bishydroxymethylcyclohexane, phthalodiol Polyethylene glycol, aromatic diols such as bishydroxyethoxybenzene, N-alkyl dialkanolamines such as N-methyldiethanolamine, etc.) obtained by polycondensation, such as polyethylene adipate, polyethylene adipate, etc. Butylene diacid, polyhexamethylene adipate, polyethylene/propylene adipate, etc., or polymers obtained by using the above-mentioned diols or monohydric alcohols with 1 to 25 carbon atoms as initiators Lactone diol or polylactone monool, such as polycaprolactone diol, polymethylvalerolactone, and mixtures of two or more of these. As the polyester diol, polycaprolactone diol or polycaprolactone using an alcohol having 1 to 25 carbon atoms as an initiator is most preferable.
作為聚碳酸酯二醇,可列舉聚碳酸(1,6-伸己基)酯、聚碳酸(3-甲基-1,5-伸戊基)酯等,作為聚烯烴二醇,可列舉聚丁二烯二醇、氫化型聚丁二烯二醇、氫化型聚異戊二烯二醇等。該等可單獨使用1種,亦可併用2種以上。 As the polycarbonate diol, poly(1,6-hexylene) carbonate, poly(3-methyl-1,5-amylene) carbonate, etc. are mentioned, and as the polyolefin diol, polybutylene is mentioned. Diene diol, hydrogenated polybutadiene diol, hydrogenated polyisoprene diol, etc. These may be used individually by 1 type, and may use 2 or more types together.
同一分子內具有1個或2個羥基之化合物之數量平均分子量通常為300~10,000,較佳為500~6,000,進而較佳為1,000~4,000。 The number average molecular weight of the compound having one or two hydroxyl groups in the same molecule is usually 300 to 10,000, preferably 500 to 6,000, and more preferably 1,000 to 4,000.
對本發明中所使用之同一分子內具有活性氫及三級胺基之化合物進行說明。作為活性氫、即直接鍵結於氧原子、氮原子或硫原子之氫原子,可列舉羥基、胺基、硫醇基等官能基中之氫原子,其中較佳為胺基、尤其是一級胺基之氫原子。 A compound having active hydrogen and a tertiary amine group in the same molecule used in the present invention will be described. Examples of active hydrogen, that is, a hydrogen atom directly bonded to an oxygen atom, a nitrogen atom, or a sulfur atom, include hydrogen atoms in functional groups such as a hydroxyl group, an amine group, and a thiol group. Among them, an amine group, especially a primary amine, is preferred. base hydrogen atom.
三級胺基並無特別限定,例如可列舉具有碳數1~4之烷基之胺基、或雜環構造、更具體而言為咪唑環或三唑環等。 The tertiary amino group is not particularly limited, and examples thereof include an amino group having an alkyl group having 1 to 4 carbon atoms, or a heterocyclic structure, more specifically, an imidazole ring or a triazole ring.
若例示此種同一分子內具有活性氫及三級胺基之化合物,則可列舉:N,N-二甲基-1,3-丙二胺、N,N-二乙基-1,3-丙二胺、N,N-二丙基-1,3-丙二胺、N,N-二丁基-1,3-丙二胺、N,N-二甲基乙二胺、N,N-二乙基乙二胺、N,N-二丙基乙二胺、N,N-二丁基乙二胺、N,N-二甲基-1,4-丁二胺、N,N-二乙基-1,4-丁二胺、N,N-二丙基-1,4-丁二胺、N,N-二丁基-1,4-丁二胺等。 Examples of such compounds having active hydrogen and a tertiary amine group in the same molecule include N,N-dimethyl-1,3-propanediamine, N,N-diethyl-1,3- Propylene diamine, N,N-dipropyl-1,3-propanediamine, N,N-dibutyl-1,3-propanediamine, N,N-dimethylethylenediamine, N,N -Diethylethylenediamine, N,N-dipropylethylenediamine, N,N-dibutylethylenediamine, N,N-dimethyl-1,4-butanediamine, N,N- Diethyl-1,4-butanediamine, N,N-dipropyl-1,4-butanediamine, N,N-dibutyl-1,4-butanediamine, etc.
又,作為三級胺基為含氮雜環構造之情形時之該含氮雜環,可列舉:吡唑環、咪唑環、三唑環、四唑環、吲哚環、咔唑環、吲唑環、苯并咪唑環、苯并三唑環、苯并唑環、苯并噻唑環、苯并噻二唑環等含氮雜五元環、吡啶環、嗒環、嘧啶環、三環、喹啉環、吖啶環、異喹啉環等含氮雜六元環。該等含氮雜環中,較佳者為咪唑環或三唑環。 In addition, as the nitrogen-containing heterocyclic ring when the tertiary amino group is a nitrogen-containing heterocyclic ring structure, a pyrazole ring, an imidazole ring, a triazole ring, a tetrazole ring, an indole ring, a carbazole ring, an indole ring can be mentioned. azole ring, benzimidazole ring, benzotriazole ring, benzo azole ring, benzothiazole ring, benzothiadiazole ring and other nitrogen-containing hetero five-membered rings, pyridine ring, pyridine ring ring, pyrimidine ring, three Ring, quinoline ring, acridine ring, isoquinoline ring and other nitrogen-containing hetero six-membered rings. Among these nitrogen-containing heterocycles, an imidazole ring or a triazole ring is preferable.
若具體地例示具有該等咪唑環及胺基之化合物,則可列舉1-(3-胺基丙基)咪唑、組胺酸、2-胺基咪唑、1-(2-胺基乙基)咪唑等。 Specific examples of compounds having these imidazole rings and amino groups include 1-(3-aminopropyl)imidazole, histidine, 2-aminoimidazole, and 1-(2-aminoethyl) Imidazole etc.
又,若具體地例示具有三唑環及胺基之化合物,則可列舉:3-胺基-1,2,4-三唑、5-(2-胺基-5-氯苯基)-3-苯基-1H-1,2,4-三唑、4-胺基-4H-1,2,4-三唑-3,5-二醇、3-胺基-5-苯基-1H-1,3,4-三唑、5-胺基-1,4-二苯基-1,2,3-三唑、3-胺基-1-苄基-1H-2,4-三唑等。 Moreover, if the compound which has a triazole ring and an amino group is specifically illustrated, 3-amino-1,2,4-triazole, 5-(2-amino-5-chlorophenyl)-3 -Phenyl-1H-1,2,4-triazole, 4-amino-4H-1,2,4-triazole-3,5-diol, 3-amino-5-phenyl-1H- 1,3,4-triazole, 5-amino-1,4-diphenyl-1,2,3-triazole, 3-amino-1-benzyl-1H-2,4-triazole, etc. .
其中,較佳為N,N-二甲基-1,3-丙二胺、N,N-二乙基-1,3-丙二胺、1-(3-胺基丙基)咪唑、3-胺基-1,2,4-三唑。該等可單獨使用1種,亦可併用2種以上。 Among them, N,N-dimethyl-1,3-propanediamine, N,N-diethyl-1,3-propanediamine, 1-(3-aminopropyl)imidazole, 3 -amino-1,2,4-triazole. These may be used individually by 1 type, and may use 2 or more types together.
製造胺基甲酸酯系高分子分散劑時之原料之較佳調配比率為相對於聚異氰酸酯化合物100質量份,同一分子內具有1個或2個羥基之數量平均分子量300~10,000之化合物為10~200質量份,較佳為20~190質量份,進而較佳為30~180質量份,同一分子內具有活性氫及三級胺基之化合物為0.2~25質量份,較佳為0.3~24質量份。 The preferred mixing ratio of raw materials for the production of urethane-based polymer dispersants is 10 compounds with a number average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the same molecule relative to 100 parts by mass of the polyisocyanate compound. ~200 parts by mass, preferably 20-190 parts by mass, more preferably 30-180 parts by mass, the compound having active hydrogen and tertiary amine group in the same molecule is 0.2-25 parts by mass, preferably 0.3-24 parts by mass parts by mass.
胺基甲酸酯系高分子分散劑之製造係依據聚胺基甲酸酯樹脂製造之公知之方法進行。作為製造時之溶劑,通常使用丙酮、甲基乙基酮、甲基異丁酮、環戊酮、環己酮、異佛酮等酮類、乙酸乙酯、乙酸丁酯、乙酸賽路蘇等之酯類、苯、甲苯、二甲苯、己烷等烴類、二丙酮醇、異丙醇、第二丁醇、第三丁醇等部分醇類、二氯甲烷、氯仿等氯化物、四氫呋喃、二乙醚等醚類、二甲基甲醯胺、N-甲基吡咯啶酮、二甲基亞碸等非質子性極性溶劑等。該等可單獨使用1種,亦可併用2種以上。 The production of the urethane-based polymer dispersant is carried out in accordance with a known method for the production of polyurethane resins. As the solvent used in the production, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, and isophorone, ethyl acetate, butyl acetate, seleux acetate, etc. are generally used. esters, benzene, toluene, xylene, hexane and other hydrocarbons, diacetone alcohol, isopropanol, second butanol, third butanol and other alcohols, dichloromethane, chloroform and other chlorides, tetrahydrofuran, Ethers such as diethyl ether, aprotic polar solvents such as dimethylformamide, N-methylpyrrolidone, and dimethylsulfoxide. These may be used individually by 1 type, and may use 2 or more types together.
於上述製造時,通常使用胺基甲酸酯化反應觸媒。作為該觸媒,例如可列舉:二月桂酸二丁基錫、二月桂酸二辛基錫、二辛酸二丁基錫、辛酸亞錫等錫系、乙醯丙酮酸鐵、氯化鐵等鐵系、 三乙胺、三乙二胺等三級胺系等。該等可單獨使用1種,亦可併用2種以上。 In the above-mentioned production, a urethane reaction catalyst is usually used. Examples of the catalyst include tin-based catalysts such as dibutyltin dilaurate, dioctyltin dilaurate, dibutyltin dioctoate, and stannous octoate, and iron-based catalysts such as ferric acetonate and ferric chloride. Tertiary amines such as triethylamine and triethylenediamine, etc. These may be used individually by 1 type, and may use 2 or more types together.
同一分子內具有活性氫及三級胺基之化合物之導入量較佳為控制於以反應後之胺值計1~100mgKOH/g之範圍。更佳為5~95mgKOH/g之範圍。胺值係藉由酸對鹼性胺基進行中和滴定且與酸值對應地以KOH之mg數所表示之值。若胺值低於上述範圍,則有分散能力降低之傾向;又,若超過上述範圍,則顯影性容易降低。 The introduction amount of the compound with active hydrogen and tertiary amine group in the same molecule is preferably controlled in the range of 1-100 mgKOH/g in terms of the amine value after the reaction. More preferably, it is the range of 5-95 mgKOH/g. The amine value is a value expressed in mg of KOH corresponding to the acid value by neutralizing and titrating basic amine groups with an acid. When the amine value is less than the above range, the dispersibility tends to decrease, and when the amine value exceeds the above range, the developability tends to decrease.
再者,於在以上之反應中異氰酸酯基殘留於高分子分散劑之情形時,若進而以醇或胺化合物消除異氰酸酯基,則產物之經時穩定性變高,故而較佳。胺基甲酸乙酯系高分子分散劑之重量平均分子量(Mw)通常為1,000~200,000、較佳為2,000~100,000、更佳為3,000~50,000之範圍。若該分子量未滿1,000,則分散性及分散穩定性較差;若超過200,000,則溶解性降低,分散性較差,同時難以控制反應。 Furthermore, in the case where the isocyanate group remains in the polymer dispersant in the above reaction, if the isocyanate group is further eliminated by an alcohol or an amine compound, the temporal stability of the product becomes high, which is preferable. The weight average molecular weight (Mw) of the urethane-based polymer dispersant is usually in the range of 1,000 to 200,000, preferably 2,000 to 100,000, and more preferably 3,000 to 50,000. When the molecular weight is less than 1,000, the dispersibility and dispersion stability are poor, and when it exceeds 200,000, the solubility is lowered, the dispersibility is poor, and it is difficult to control the reaction.
作為丙烯酸系高分子分散劑,較佳為使用具有官能基(此處所謂之官能基係指作為高分子分散劑中所含有之官能基而於上文敍述之官能基)之含不飽和基單體與不具有官能基之含不飽和基單體之無規共聚合體、接枝共聚合體、嵌段共聚合體。該等共聚合體可利用公知之方法製造。 As the acrylic polymer dispersant, it is preferable to use an unsaturated group-containing monolayer having a functional group (the functional group here refers to the functional group described above as a functional group contained in the polymer dispersant). Random copolymers, graft copolymers, and block copolymers of monomers and unsaturated group-containing monomers without functional groups. These copolymers can be produced by known methods.
作為具有官能基之含不飽和基單體,可列舉(甲基)丙烯酸、2-(甲基)丙烯醯氧基乙基丁二酸、2-(甲基)丙烯醯氧基乙基鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基六氫鄰苯二甲酸、丙烯酸二聚物等具有羧基之不飽和單體、(甲基)丙烯酸二甲胺基乙酯、(甲基) 丙烯酸二乙胺基乙酯及該等之四級化物等具有三級胺基、四級銨鹽基之不飽和單體作為具體例。該等可單獨使用1種,亦可併用2種以上。 Examples of the unsaturated group-containing monomer having a functional group include (meth)acrylic acid, 2-(meth)acryloyloxyethylsuccinic acid, and 2-(meth)acryloyloxyethylphthalate. Unsaturated monomers with carboxyl groups such as dicarboxylic acid, 2-(meth)acryloyloxyethylhexahydrophthalic acid, acrylic dimer, dimethylaminoethyl (meth)acrylate, (methyl) ) An unsaturated monomer having a tertiary amine group and a quaternary ammonium salt group, such as diethylaminoethyl acrylate and these quaternary products, is given as a specific example. These may be used individually by 1 type, and may use 2 or more types together.
作為不具有官能基之含不飽和基單體,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸苯氧基甲酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異酯、三環癸烷(甲基)丙烯酸酯、(甲基)丙烯酸四氫糠酯、N-乙烯基吡咯啶酮、苯乙烯及其衍生物、α-甲基苯乙烯、N-環己基馬來醯亞胺、N-苯基馬來醯亞胺、N-苄基馬來醯亞胺等N-取代馬來醯亞胺、丙烯腈、乙酸乙烯酯及聚(甲基)丙烯酸甲酯巨單體、聚苯乙烯巨單體、聚(甲基)丙烯酸2-羥基乙酯巨單體、聚乙二醇巨單體、聚丙二醇巨單體、聚己內酯巨單體等巨單體等。該等可單獨使用1種,亦可併用2種以上。 Examples of the unsaturated group-containing monomer having no functional group include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, (meth)acrylate n-butyl meth)acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, benzyl (meth)acrylate, phenyl (meth)acrylate, cyclohexyl (meth)acrylate ester, phenoxyethyl (meth)acrylate, phenoxymethyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isopropyl (meth)acrylate Esters, tricyclodecane (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, N-vinylpyrrolidone, styrene and its derivatives, alpha-methylstyrene, N-cyclohexymethylene N-substituted maleimide such as lyimide, N-phenylmaleimide, N-benzylmaleimide, acrylonitrile, vinyl acetate and poly(meth)acrylate Monomer, polystyrene macromonomer, poly(meth)acrylate 2-hydroxyethyl ester macromonomer, polyethylene glycol macromonomer, polypropylene glycol macromonomer, polycaprolactone macromonomer and other macromonomers Wait. These may be used individually by 1 type, and may use 2 or more types together.
丙烯酸系高分子分散劑尤佳為包含具有官能基之A嵌段及不具有官能基之B嵌段之A-B或B-A-B嵌段共聚合體,於該情形時,A嵌段中除來自上述包含官能基之含不飽和基單體之部分構造以外,亦可包含來自上述不含官能基之含不飽和基單體之部分構造,該等亦可以無規共聚合或嵌段共聚合之任一態樣含有於該A嵌段中。又,不含官能基之部分構造於A嵌段中之含量通常為80質量%以下,較佳為50質量%以下,進而較佳為30質量%以下。 The acrylic polymer dispersant is particularly preferably an A-B or B-A-B block copolymer comprising an A block with a functional group and a B block without a functional group. In this case, the A block is derived from the above-mentioned functional group containing In addition to the partial structure of the unsaturated group-containing monomer, the partial structure of the above-mentioned non-functional group-containing unsaturated group-containing monomer can also be included, which can also be either random copolymerization or block copolymerization. contained in the A block. Moreover, content in the A block of the partial structure which does not contain a functional group is 80 mass % or less normally, Preferably it is 50 mass % or less, More preferably, it is 30 mass % or less.
B嵌段為包含來自不含上述官能基之含不飽和基單體之部分構造者,於1個B嵌段中亦可含有2種以上之來自單體之 部分構造,該等亦可以無規共聚合或嵌段共聚合之任一態樣含有於該B嵌段中。 The B block contains a partial structure derived from an unsaturated group-containing monomer that does not contain the above-mentioned functional group, and one B block may contain two or more types of monomer-derived monomers. Part of the structure, these can also be contained in the B block in either form of random copolymerization or block copolymerization.
該A-B或B-A-B嵌段共聚合體例如藉由以下所示之活性聚合法製備。活性聚合法有陰離子活性聚合法、陽離子活性聚合法、自由基活性聚合法,其中,陰離子活性聚合法之聚合活性物質為陰離子,該方法例如由下述流程表示。 The A-B or B-A-B block copolymer is prepared, for example, by the living polymerization method shown below. The living polymerization method includes an anionic living polymerization method, a cationic living polymerization method, and a radical living polymerization method. Among them, the polymerization active material of the anionic living polymerization method is an anion, and this method is represented by the following scheme, for example.
[化21]
上述流程中,Ar1為1價之有機基,Ar2為與Ar1不同之1價之有機基,M為金屬原子,s及t分別為1以上之整數。 In the above scheme, Ar 1 is a monovalent organic group, Ar 2 is a monovalent organic group different from Ar 1 , M is a metal atom, and s and t are each an integer of 1 or more.
自由基活性聚合法之聚合活性物質為自由基,該方法例如由下述流程表示。 The polymerization active substance of the radical living polymerization method is a radical, and this method is represented by the following scheme, for example.
[化22]
上述流程中,Ar1為1價之有機基,Ar2為與Ar1不同之1價之有機基,j及k分別為1以上之整數,Ra為氫原子或1價之有機基,Rb為與Ra不同之氫原子或1價之有機基。 In the above process, Ar 1 is a monovalent organic group, Ar 2 is a monovalent organic group different from Ar 1 , j and k are each an integer of 1 or more, R a is a hydrogen atom or a monovalent organic group, R b is a hydrogen atom different from Ra or a monovalent organic group.
合成該丙烯酸系高分子分散劑時,可採用日本專利特開平9-62002號公報、或P.Lutz,P.Masson et al,Polym.Bull.12, 79(1984),B.C.Anderson,G.D.Andrews et al,Macromolecules,14,1601(1981),K.Hatada,K.Ute,et al,Polym.J.17,977(1985),18,1037(1986),右手浩一、畑田耕一、高分子加工、36,366(1987),東村敏延、澤本光男、高分子論文集、46,189(1989),M.Kuroki,T.Aida,J.Am.Chem.Sic,109,4737(1987),相田卓三、井上祥平、有機合成化學、43,300(1985),D.Y.Sogoh,W.R.Hertler et al,Macromolecules,20,1473(1987)等所記載之公知之方法。 When synthesizing the acrylic polymer dispersant, Japanese Patent Laid-Open No. 9-62002, or P.Lutz, P.Masson et al, Polym.Bull.12, 79 (1984), B.C. Anderson, G.D. Andrews et al, Macromolecules, 14, 1601 (1981), K. Hatada, K. Ute, et al, Polym. J. 17, 977 (1985), 18, 1037 (1986), right hand Koichi, Hatada Koichi, Polymer Processing, 36, 366 (1987), Tominobu Higashimura, Mitsuo Sawamoto, Proceedings of Polymer, 46, 189 (1989), M.Kuroki, T.Aida, J.Am.Chem.Sic , 109, 4737 (1987), Takuzo Aida, Shohei Inoue, Synthetic Organic Chemistry, 43, 300 (1985), D.Y.Sogoh, W.R.Hertler et al, Macromolecules, 20, 1473 (1987), etc. The well-known method described.
可用於本發明之丙烯酸系高分子分散劑可為A-B嵌段共聚合體,亦可為B-A-B嵌段共聚合體,構成該共聚合體之A嵌段/B嵌段比較佳為1/99~80/20、尤其是5/95~60/40(質量比),藉由處於該範圍內,有可確保分散性與保存穩定性之平衡之傾向。又,可用於本發明之A-B嵌段共聚合體、B-A-B嵌段共聚合體1g中之四級銨鹽基之量通常較佳為0.1~10mmol,藉由處於該範圍內,有可確保良好之分散性之傾向。 The acrylic polymer dispersant that can be used in the present invention can be an A-B block copolymer or a B-A-B block copolymer, and the A block/B block constituting the copolymer is preferably 1/99~80/20 , In particular, 5/95 to 60/40 (mass ratio), by being within this range, tends to ensure a balance between dispersibility and storage stability. In addition, the amount of the quaternary ammonium base in 1 g of the A-B block copolymer and the B-A-B block copolymer that can be used in the present invention is generally preferably 0.1 to 10 mmol, and by being within this range, good dispersibility can be ensured tendency.
再者,此種嵌段共聚合體中通常有含有製造過程中所產生之胺基之情形,其胺值為1~100mgKOH/g左右,就分散性之觀點而言,較佳為10mgKOH/g以上,更佳為30mgKOH/g以上,進而較佳為50mgKOH/g以上,又,較佳為90mgKOH/g以下,更佳為80mgKOH/g以下,進而較佳為75mgKOH/g以下。 Furthermore, such block copolymers usually contain amine groups generated during the production process, and the amine value is about 1 to 100 mgKOH/g, and from the viewpoint of dispersibility, preferably 10 mgKOH/g or more. , more preferably 30 mgKOH/g or more, more preferably 50 mgKOH/g or more, and more preferably 90 mgKOH/g or less, more preferably 80 mgKOH/g or less, and still more preferably 75 mgKOH/g or less.
此處,該等嵌段共聚合體等分散劑之胺值係以與分散劑試樣中除溶劑外之固形份每1g中之鹼基當量之KOH之質量表示,且藉由如下方法測定。向100mL之燒杯中精確稱量分散劑試樣0.5~1.5g並以50mL之乙酸溶解。使用具備pH電極之自動滴定裝置,藉由0.1mol/L之HClO4乙酸溶液對該溶液進行中和滴定。 將滴定pH曲線之反曲點設為滴定終點且藉由下式求出胺值。 Here, the amine value of dispersing agents such as these block copolymers is expressed by the mass of KOH in base equivalent per 1 g of the solid content excluding the solvent in the dispersing agent sample, and is measured by the following method. Accurately weigh 0.5~1.5g of the dispersant sample into a 100mL beaker and dissolve it with 50mL of acetic acid. The solution was neutralized and titrated with a 0.1 mol/L HClO 4 acetic acid solution using an automatic titration device equipped with a pH electrode. The inverse inflection point of the titration pH curve was set as the titration end point, and the amine value was obtained by the following formula.
胺值[mgKOH/g]=(561×V)/(W×S) Amine value [mgKOH/g]=(561×V)/(W×S)
[其中,W表示分散劑試樣稱取量[g],V表示滴定終點處之滴定量[mL],S表示分散劑試樣之固形份濃度[質量%]]。 [Wherein, W represents the weighed amount of the dispersant sample [g], V represents the titration amount [mL] at the end point of the titration, and S represents the solid content concentration of the dispersant sample [mass %]].
又,該嵌段共聚合體之胺值亦視成為該酸值基礎之酸性基之有無及種類而不同,但一般較低者較佳,通常為10mgKOH/g以下,其重量平均分子量(Mw)較佳為1000~100,000之範圍。藉由設為上述範圍內,有可確保良好之分散性之傾向。 In addition, the amine value of the block copolymer also depends on the presence or absence and type of the acid group that is the basis of the acid value, but generally the lower one is better, usually below 10 mgKOH/g, and its weight average molecular weight (Mw) is higher than The range of 1000~100,000 is preferable. By setting it in the said range, there exists a tendency for favorable dispersibility to be ensured.
於具有四級銨鹽基作為官能基之情形時,對於高分子分散劑之具體構造並無特別限定,就分散性之觀點而言,較佳為具有下述式(i)所表示之重複單位(以下,有時稱為「重複單位(i)」)。 In the case of having a quaternary ammonium salt group as a functional group, the specific structure of the polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferable to have a repeating unit represented by the following formula (i) (Hereinafter, it may be referred to as "repeating unit (i)").
[化23]
上述式(i)中,R31~R33分別獨立地為氫原子、可具有取代基之烷基、可具有取代基之芳基、或可具有取代基之芳烷基,R31~R33中之2個以上亦可相互鍵結而形成環狀構造。R34為氫原子或甲基。X為2價之連結基,Y-為抗衡陰離子。 In the above formula (i), R 31 ~R 33 are each independently a hydrogen atom, an alkyl group that may have a substituent, an aryl group that may have a substituent, or an aralkyl group that may have a substituent, and R 31 ~R 33 Two or more of them may be bonded to each other to form a ring structure. R 34 is a hydrogen atom or a methyl group. X is a divalent linking group, and Y - is a counter anion.
上述式(i)之R31~R33中之可具有取代基之烷基之碳數並無特別限定,通常為1以上,又,較佳為10以下,更佳為6以下。 The carbon number of the optionally substituted alkyl group in R 31 to R 33 of the above formula (i) is not particularly limited, but is usually 1 or more, preferably 10 or less, more preferably 6 or less.
作為烷基之具體例,可列舉甲基、乙基、丙基、丁基、 戊基、己基、庚基、辛基等,該等之中,較佳為甲基、乙基、丙基、丁基、戊基、或己基,更佳為甲基、乙基、丙基、或丁基。又,可為直鏈狀、支鏈狀之任一者。又,亦可包含環己基、環己基甲基等環狀構造。 Specific examples of the alkyl group include methyl, ethyl, propyl, butyl, Pentyl, hexyl, heptyl, octyl, etc., among them, preferably methyl, ethyl, propyl, butyl, pentyl, or hexyl, more preferably methyl, ethyl, propyl, or butyl. Moreover, any of a linear form and a branched form may be sufficient. Moreover, cyclic structures, such as a cyclohexyl group and a cyclohexylmethyl group, may be included.
上述式(i)之R31~R33中之可具有取代基之芳基之碳數並無特別限定,通常為6以上,又,較佳為16以下,更佳為12以下。 The carbon number of the optionally substituted aryl group in R 31 to R 33 of the above formula (i) is not particularly limited, but is usually 6 or more, preferably 16 or less, more preferably 12 or less.
作為芳基之具體例,可列舉:苯基、甲基苯基、乙基苯基、二甲基苯基、二乙基苯基、萘基、蒽基等,該等之中,較佳為苯基、甲基苯基、乙基苯基、二甲基苯基、或二乙基苯基,更佳為苯基、甲基苯基、或乙基苯基。 Specific examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, an anthracenyl group, and the like, and among these, the preferred phenyl, methylphenyl, ethylphenyl, dimethylphenyl, or diethylphenyl, more preferably phenyl, methylphenyl, or ethylphenyl.
上述式(i)之R31~R33中之可具有取代基之芳烷基之碳數並無特別限定,通常為7以上,又,較佳為16以下,更佳為12以下。 The carbon number of the optionally substituted aralkyl group in R 31 to R 33 of the above formula (i) is not particularly limited, but is usually 7 or more, preferably 16 or less, more preferably 12 or less.
作為芳烷基之具體例,可列舉:苯基亞甲基、苯基伸乙基、苯基伸丙基、苯基伸丁基、苯基伸異丙基等,該等之中,較佳為苯基亞甲基、苯基伸乙基、苯基伸丙基、或苯基伸丁基,更佳為苯基亞甲基、或苯基伸乙基。 Specific examples of the aralkyl group include phenylmethylene, phenylethylidene, phenylpropylidene, phenylbutylene, phenylisopropylidene, and the like, and among them, phenylidene is preferred. Methylidene, phenylethylidene, phenylbutylene, or phenylbutylene, more preferably phenylmethylene, or phenylethylidene.
該等之中,就分散性之觀點而言,較佳為R31~R33分別獨立地為烷基、或芳烷基,具體而言,較佳為R31及R33分別獨立地為甲基或乙基,且R32為苯基亞甲基、或苯基伸乙基,進而較佳為R31及R33為甲基,且R32為苯基亞甲基。 Among these, from the viewpoint of dispersibility, it is preferable that R 31 to R 33 are each independently an alkyl group or an aralkyl group, and specifically, it is preferable that R 31 and R 33 are each independently methyl group or ethyl group, and R 32 is a phenylmethylene group or a phenylethylidene group, more preferably R 31 and R 33 are methyl groups, and R 32 is a phenylmethylene group.
又,於上述高分子分散劑具有三級胺作為官能基之情形時,就分散性之觀點而言,較佳為具有下述式(ii)所表示之重複單 位(以下,有時稱為「重複單位(ii)」)。 Moreover, in the case where the above-mentioned polymer dispersant has a tertiary amine as a functional group, it is preferable to have a repeating monomer represented by the following formula (ii) from the viewpoint of dispersibility bit (hereinafter, sometimes referred to as "repetition unit (ii)").
[化24]
上述式(ii)中,R35及R36分別獨立地為氫原子、可具有取代基之烷基、可具有取代基之芳基、或可具有取代基之芳烷基,R35及R36亦可相互鍵結而形成環狀構造。R37為氫原子或甲基。Z為2價之連結基。 In the above formula (ii), R 35 and R 36 are each independently a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent, R 35 and R 36 It is also possible to form a ring structure by bonding with each other. R 37 is a hydrogen atom or a methyl group. Z is a bivalent linking group.
又,作為上述式(ii)之R35及R36中之可具有取代基之烷基,可較佳地採用作為上述式(i)之R31~R33所例示者。同樣地,作為上述式(ii)之R35及R36中之可具有取代基之芳基,可較佳地採用作為上述式(i)之R31~R33所例示者。又,作為上述式(ii)之R35及R36中之可具有取代基之芳烷基,可較佳地採用作為上述式(i)之R31~R33所例示者。 Moreover, as the alkyl group which may have a substituent among R 35 and R 36 of the above formula (ii), those exemplified as R 31 to R 33 of the above formula (i) can be preferably used. Similarly, as the aryl group which may have a substituent in R 35 and R 36 of the above formula (ii), those exemplified as R 31 to R 33 of the above formula (i) can be preferably used. Further, as the optionally substituted aralkyl group in R 35 and R 36 of the above formula (ii), those exemplified as R 31 to R 33 of the above formula (i) can be preferably used.
該等之中,較佳為R35及R36分別獨立地為可具有取代基之烷基,更佳為甲基、或乙基。 Among these, it is preferable that R 35 and R 36 are each independently an alkyl group which may have a substituent, and a methyl group or an ethyl group is more preferable.
作為上述式(i)之R31~R33及上述式(ii)之R35及R36中之烷基、芳烷基或芳基可具有之取代基,可列舉:鹵素原子、烷氧基、苯并基、羥基等。 Examples of substituents that the alkyl group, aralkyl group, or aryl group in R 31 to R 33 of the above formula (i) and R 35 and R 36 of the above formula (ii) may have include: a halogen atom, an alkoxy group , benzoyl, hydroxyl, etc.
於上述式(i)及(ii)中,作為2價之連結基X及Z,例如可列舉:碳數1~10之伸烷基、碳數6~12之伸芳基、-CONH-R43-基、-COOR44-基[其中,R43及R44為單鍵、碳數1~10之伸烷基、 或碳數2~10之醚基(烷氧基烷基)]等,較佳為-COO-R44-基。又,於上述式(i)中,作為抗衡陰離子之Y-,可列舉Cl-、Br-、I-、ClO4 -、BF4 -、CH3COO-、PF6 -等。 In the above formulas (i) and (ii), the divalent linking groups X and Z include, for example, an alkylene group having 1 to 10 carbon atoms, an aryl group having 6 to 12 carbon atoms, -CONH-R 43 -base, -COOR 44 -base [wherein, R 43 and R 44 are single bonds, alkylene groups with 1 to 10 carbon atoms, or ether groups (alkoxyalkyl groups) with 2 to 10 carbon atoms], etc., Preferred is a -COO-R 44 - group. Moreover, in said formula (i), Cl- , Br- , I- , ClO4-, BF4- , CH3COO- , PF6- etc. are mentioned as Y- of a counter anion .
上述式(i)所表示之重複單位之含有比例並無特別限定。就分散性之觀點而言,相對於上述式(i)所表示之重複單位之含有比例與上述式(ii)所表示之重複單位之含有比例之合計較佳為60莫耳%以下,更佳為50莫耳%以下,進而較佳為40莫耳%以下,尤佳為35莫耳%以下。又,較佳為5莫耳%以上,更佳為10莫耳%以上,進而較佳為20莫耳%以上,尤佳為30莫耳%以上。 The content ratio of the repeating unit represented by the above formula (i) is not particularly limited. From the viewpoint of dispersibility, the total of the content ratio of the repeating unit represented by the above formula (i) and the content ratio of the repeating unit represented by the above formula (ii) is preferably 60 mol% or less, more preferably It is 50 mol% or less, more preferably 40 mol% or less, particularly preferably 35 mol% or less. Also, it is preferably 5 mol% or more, more preferably 10 mol% or more, still more preferably 20 mol% or more, particularly preferably 30 mol% or more.
又,上述式(i)所表示之重複單位於高分子分散劑之總重複單位中所占之含有比例並無特別限定,就分散性之觀點而言,較佳為1莫耳%以上,更佳為5莫耳%以上,進而較佳為10莫耳%以上。又,較佳為50莫耳%以下,更佳為30莫耳%以下,進而較佳為20莫耳%以下,尤佳為15莫耳%以下。 In addition, the content ratio of the repeating unit represented by the above formula (i) in the total repeating unit of the polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 1 mol% or more, more It is preferably 5 mol % or more, and more preferably 10 mol % or more. Moreover, 50 mol% or less is preferable, 30 mol% or less is more preferable, 20 mol% or less is further more preferable, 15 mol% or less is especially preferable.
又,上述式(ii)所表示之重複單位於高分子分散劑之總重複單位中所占之含有比例並無特別限定,就分散性之觀點而言,較佳為5莫耳%以上,更佳為10莫耳%以上,進而較佳為15莫耳%以上,尤佳為20莫耳%以上。又,較佳為60莫耳%以下,更佳為40莫耳%以下,進而較佳為30莫耳%以下,尤佳為25莫耳%以下。 In addition, the content ratio of the repeating unit represented by the above formula (ii) in the total repeating unit of the polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 5 mol% or more, more It is preferably 10 mol % or more, more preferably 15 mol % or more, and particularly preferably 20 mol % or more. Moreover, 60 mol% or less is preferable, 40 mol% or less is more preferable, 30 mol% or less is still more preferable, and 25 mol% or less is especially preferable.
又,關於高分子分散劑,就提高對溶劑等黏合劑成分之相溶性、提高分散穩定性之觀點而言,較佳為具有下述式(iii)所表示之重複單位(以下,有時稱為「重複單位(iii)」)。 In addition, the polymer dispersant preferably has a repeating unit represented by the following formula (iii) (hereinafter, sometimes referred to as a is "repeating unit (iii)").
[化25]
上述式(iii)中,R40為伸乙基或伸丙基,R41為可具有取代基之烷基,R42為氫原子或甲基。n為1~20之整數。 In the above formula (iii), R 40 is an ethylidene or propylidene group, R 41 is an alkyl group which may have a substituent, and R 42 is a hydrogen atom or a methyl group. n is an integer from 1 to 20.
上述式(iii)之R41中之可具有取代基之烷基之碳數並無特別限定,通常為1以上,較佳為2以上。又,較佳為10以下,更佳為6以下。 The carbon number of the optionally substituted alkyl group in R 41 of the above formula (iii) is not particularly limited, but is usually 1 or more, preferably 2 or more. Moreover, 10 or less are preferable, and 6 or less are more preferable.
作為烷基之具體例,可列舉:甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基等。該等之中,較佳為甲基、乙基、丙基、丁基、戊基、或己基,更佳為甲基、乙基、丙基、或丁基。又,可為直鏈狀、支鏈狀之任一者。又,亦可包含環己基、環己基甲基等環狀構造。 Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and the like. Among these, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, or a hexyl group is preferable, and a methyl group, an ethyl group, a propyl group, or a butyl group is more preferable. Moreover, any of a linear form and a branched form may be sufficient. Moreover, cyclic structures, such as a cyclohexyl group and a cyclohexylmethyl group, may be included.
又,關於上述式(iii)中之n,就對溶劑等黏合劑成分之相溶性及分散性之觀點而言,較佳為1以上,更佳為2以上。又,較佳為10以下,更佳為5以下。 Moreover, 1 or more is preferable, and 2 or more is more preferable from the viewpoint of compatibility and dispersibility with respect to binder components, such as a solvent, with respect to n in the said formula (iii). Moreover, 10 or less are preferable, and 5 or less are more preferable.
又,上述式(iii)所表示之重複單位於高分子分散劑之總重複單位中所占之含有比例並無特別限定,較佳為1莫耳%以上,更佳為2莫耳%以上,進而較佳為4莫耳%以上。又,較佳為30莫耳%以下,更佳為20莫耳%以下,進而較佳為10莫耳%以下。於上述範圍內之情形時,有能夠兼顧對溶劑等黏合劑成分之相溶性及分散穩定性之傾向。 In addition, the content ratio of the repeating unit represented by the above formula (iii) in the total repeating unit of the polymer dispersant is not particularly limited, but is preferably 1 mol% or more, more preferably 2 mol% or more, More preferably, it is 4 mol% or more. Moreover, 30 mol% or less is preferable, 20 mol% or less is more preferable, and 10 mol% or less is further more preferable. In the case of the above-mentioned range, there exists a tendency for compatibility with respect to adhesive components, such as a solvent, and dispersion stability to be compatible.
又,關於高分子分散劑,就提高分散劑對溶劑等黏合劑成分之相溶性、提高分散穩定性之觀點而言,較佳為具有下述式 (iv)所表示之重複單位(以下,有時稱為「重複單位(iv)」)。 In addition, the polymer dispersant preferably has the following formula from the viewpoint of improving the compatibility of the dispersant with a binder component such as a solvent and improving the dispersion stability The repeating unit represented by (iv) (hereinafter, sometimes referred to as "repeating unit (iv)").
[化26]
上述式(iv)中,R38為可具有取代基之烷基、可具有取代基之芳基、或可具有取代基之芳烷基。R39為氫原子或甲基。 In the above formula (iv), R 38 is an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group. R 39 is a hydrogen atom or a methyl group.
上述式(iv)之R38中之可具有取代基之烷基之碳數並無特別限定,通常為1以上,較佳為2以上,更佳為4以上。又,較佳為10以下,更佳為8以下。 The carbon number of the optionally substituted alkyl group in R 38 of the above formula (iv) is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 4 or more. Moreover, 10 or less are preferable, and 8 or less are more preferable.
作為烷基之具體例,可列舉:甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基等。該等之中,較佳為甲基、乙基、丙基、丁基、戊基、或己基,更佳為甲基、乙基、丙基、或丁基。又,可為直鏈狀、支鏈狀之任一者。又,亦可包含環己基、環己基甲基等環狀構造。 Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and the like. Among these, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, or a hexyl group is preferable, and a methyl group, an ethyl group, a propyl group, or a butyl group is more preferable. Moreover, any of a linear form and a branched form may be sufficient. Moreover, cyclic structures, such as a cyclohexyl group and a cyclohexylmethyl group, may be included.
上述式(iv)之R38中之可具有取代基之芳基之碳數並無特別限定,通常為6以上。又,較佳為16以下,更佳為12以下,進而較佳為8以下。 The carbon number of the optionally substituted aryl group in R 38 of the above formula (iv) is not particularly limited, but is usually 6 or more. Moreover, 16 or less are preferable, 12 or less are more preferable, and 8 or less are still more preferable.
作為芳基之具體例,可列舉:苯基、甲基苯基、乙基苯基、二甲基苯基、二乙基苯基、萘基、蒽基等,該等之中,較佳為苯基、甲基苯基、乙基苯基、二甲基苯基、或二乙基苯基,更佳為苯基、甲基苯基、或乙基苯基。 Specific examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, an anthracenyl group, and the like, and among these, the preferred phenyl, methylphenyl, ethylphenyl, dimethylphenyl, or diethylphenyl, more preferably phenyl, methylphenyl, or ethylphenyl.
上述式(iv)之R38中之可具有取代基之芳烷基之碳數並無特別限定,通常為7以上,又,較佳為16以下,更佳為12以 下,進而較佳為10以下。 The carbon number of the optionally substituted aralkyl group in R 38 of the above formula (iv) is not particularly limited, but is usually 7 or more, preferably 16 or less, more preferably 12 or less, and still more preferably 10 the following.
作為芳烷基之具體例,可列舉:苯基亞甲基、苯基伸乙基、苯基伸丙基、苯基伸丁基、苯基伸異丙基等,該等之中,較佳為苯基亞甲基、苯基伸乙基、苯基伸丙基、或苯基伸丁基,更佳為苯基亞甲基、或苯基伸乙基。 Specific examples of the aralkyl group include phenylmethylene, phenylethylidene, phenylpropylidene, phenylbutylene, phenylisopropylidene, and the like, and among them, phenylidene is preferred. Methylidene, phenylethylidene, phenylbutylene, or phenylbutylene, more preferably phenylmethylene, or phenylethylidene.
該等之中,就溶劑相溶性及分散穩定性之觀點而言,較佳為R38為烷基、或芳烷基,更佳為甲基、乙基、或苯基亞甲基。 Among these, from the viewpoint of solvent compatibility and dispersion stability, R 38 is preferably an alkyl group or an aralkyl group, and more preferably a methyl group, an ethyl group, or a phenylmethylene group.
作為R38中之烷基可具有之取代基,可列舉鹵素原子、烷氧基等。又,作為芳基或芳烷基可具有之取代基,可列舉鏈狀之烷基、鹵素原子、烷氧基等。又,於R38所表示之鏈狀之烷基中亦包含直鏈狀及支鏈狀之任一者。 As a substituent which the alkyl group in R38 may have, a halogen atom, an alkoxy group, etc. are mentioned. Moreover, as a substituent which an aryl group or an aralkyl group may have, a chain alkyl group, a halogen atom, an alkoxy group, etc. are mentioned. In addition, the linear alkyl group represented by R 38 also includes either a straight chain or a branched chain.
又,關於上述式(iv)所表示之重複單位於高分子分散劑之總重複單位中所占之含有比例,就分散性之觀點而言,較佳為30莫耳%以上,更佳為40莫耳%以上,進而較佳為50莫耳%以上。又,較佳為80莫耳%以下,更佳為70莫耳%以下。 In addition, the content ratio of the repeating unit represented by the above formula (iv) to the total repeating unit of the polymer dispersant is preferably 30 mol % or more, more preferably 40 mol %, from the viewpoint of dispersibility. mol% or more, more preferably 50 mol% or more. Moreover, 80 mol% or less is preferable, and 70 mol% or less is more preferable.
高分子分散劑亦可具有除重複單位(i)、重複單位(ii)、重複單位(iii)及重複單位(iv)以外之重複單位。作為此種重複單位之例,可列舉來自苯乙烯、α-甲基苯乙烯等苯乙烯系單體;(甲基)丙烯醯氯等(甲基)丙烯酸鹽系單體;(甲基)丙烯醯胺、N-羥甲基丙烯醯胺等(甲基)丙烯醯胺系單體;乙酸乙烯酯;丙烯腈;烯丙基環氧丙基醚、丁烯酸環氧丙基醚;N-甲基丙烯醯啉等單體之重複單位。 The polymer dispersant may also have repeating units other than repeating unit (i), repeating unit (ii), repeating unit (iii) and repeating unit (iv). Examples of such repeating units include styrene-based monomers such as styrene and α-methylstyrene; (meth)acrylate-based monomers such as (meth)acryloyl chloride; (meth)propylene (Meth) acrylamide monomers such as amide and N-methylol acrylamide; vinyl acetate; acrylonitrile; allyl glycidyl ether, crotonic acid glycidyl ether; N- methacrylate Repeating units of monomers such as phenoline.
關於高分子分散劑,就進一步提高分散性之觀點而言,較佳為包含具有重複單位(i)及重複單位(ii)之A嵌段、與不具 有重複單位(i)及重複單位(ii)之B嵌段的嵌段共聚合體。 From the viewpoint of further improving the dispersibility, the polymer dispersant preferably contains an A block having the repeating unit (i) and the repeating unit (ii), and a block having no repeating unit (ii). A block copolymer having repeating units (i) and B blocks of repeating units (ii).
該嵌段共聚合體較佳為A-B嵌段共聚合體或B-A-B嵌段共聚合體。藉由向A嵌段不僅導入四級銨鹽基而且導入三級胺基,意外地有分散劑之分散能力明顯提高之傾向。又,B嵌段較佳為具有重複單位(iii),進而,更佳為具有重複單位(iv)。 The block copolymer is preferably an A-B block copolymer or a B-A-B block copolymer. By introducing not only a quaternary ammonium salt group but also a tertiary amine group into the A block, the dispersing ability of the dispersant unexpectedly tends to be significantly improved. Moreover, it is preferable that the B block has a repeating unit (iii), and it is more preferable that it has a repeating unit (iv).
於A嵌段中,亦能以無規共聚合、嵌段共聚合之任一態樣含有重複單位(i)及重複單位(ii)。又,重複單位(i)及重複單位(ii)於1個A嵌段中亦可分別含有2種以上,於該情形時,於該A嵌段中亦能以無規共聚合、嵌段共聚合之任一態樣含有各重複單位。 In the A block, the repeating unit (i) and the repeating unit (ii) can also be contained in any aspect of random copolymerization and block copolymerization. In addition, the repeating unit (i) and the repeating unit (ii) may each contain two or more types in one A block, and in this case, random copolymerization or block copolymerization is also possible in the A block. Any aspect of the polymerization contains each repeating unit.
又,除重複單位(i)及重複單位(ii)以外之重複單位亦可含有於A嵌段中,作為此種重複單位之例,可列舉來自上述(甲基)丙烯酸酯系單體之重複單位等。除重複單位(i)及重複單位(ii)以外之重複單位於A嵌段中之含量較佳為0~50莫耳%,更佳為0~20莫耳%,最佳為A嵌段中不含該重複單位。 In addition, repeating units other than repeating unit (i) and repeating unit (ii) may be contained in the A block, and examples of such repeating units include repeating units derived from the above-mentioned (meth)acrylate-based monomers. units, etc. The content of repeating units other than repeating unit (i) and repeating unit (ii) in the A block is preferably 0-50 mol %, more preferably 0-20 mol %, and most preferably in the A block This repeating unit is not included.
重複單位(iii)及(iv)以外之重複單位亦可含有於B嵌段中,作為此種重複單位之例,可列舉來自苯乙烯、α-甲基苯乙烯等苯乙烯系單體;(甲基)丙烯醯氯等(甲基)丙烯酸鹽系單體;(甲基)丙烯醯胺、N-羥甲基丙烯醯胺等(甲基)丙烯醯胺系單體;乙酸乙烯酯;丙烯腈;烯丙基環氧丙基醚、丁烯酸環氧丙基醚;N-甲基丙烯醯啉等單體之重複單位。 Repeating units other than repeating units (iii) and (iv) may also be contained in the B block, and examples of such repeating units include styrene-based monomers such as styrene and α-methylstyrene; ( (Meth)acrylate-based monomers such as meth)acryloyl chloride; (meth)acrylamide-based monomers such as (meth)acrylamide and N-methylol acrylamide; vinyl acetate; propylene Nitrile; Allyl glycidyl ether, crotonic acid glycidyl ether; N-methacryloyl Repeating units of monomers such as phenoline.
除重複單位(iii)及重複單位(iv)以外之重複單位於B嵌段中之含量較佳為0~50莫耳%,更佳為0~20莫耳%,最佳為B嵌段中不含該等重複單位。 The content of repeating units other than repeating unit (iii) and repeating unit (iv) in the B block is preferably 0-50 mol %, more preferably 0-20 mol %, and most preferably in the B block Such repeating units are not included.
又,就提高分散穩定性之方面而言,(f)分散劑較佳為 與下述顏料衍生物併用。 In addition, from the viewpoint of improving dispersion stability, (f) the dispersant is preferably Used in combination with the following pigment derivatives.
<感光性著色組成物之其他調配成分> <Other preparation components of the photosensitive coloring composition>
於本發明之感光性著色組成物中,除上述成分以外,可適當調配矽烷偶合劑等密接改善劑、塗佈性改善劑、顯影改良劑、紫外線吸收劑、抗氧化劑、界面活性劑、顏料衍生物等。 In the photosensitive coloring composition of the present invention, in addition to the above-mentioned components, adhesion improvers such as silane coupling agents, coatability improvers, development improvers, ultraviolet absorbers, antioxidants, surfactants, and pigment derivatives can be appropriately formulated things etc.
(1)密接改善劑 (1) Adhesion improver
於本發明之感光性著色組成物中,為了改善與基板之密接性,亦可含有密接改善劑。作為密接改善劑,較佳為矽烷偶合劑、含磷酸基之化合物等。作為矽烷偶合劑之種類,可單獨使用1種環氧系、(甲基)丙烯酸系、胺系等各種矽烷偶合劑,或者將2種以上混合而使用。 In the photosensitive coloring composition of this invention, in order to improve the adhesiveness with a board|substrate, you may contain an adhesion improvement agent. As an adhesion improving agent, a silane coupling agent, a phosphoric acid group-containing compound, etc. are preferable. As a kind of a silane coupling agent, various silane coupling agents, such as an epoxy type, (meth)acrylic type, and an amine type, can be used individually by 1 type, or 2 or more types can be mixed and used.
作為較佳之矽烷偶合劑,例如可列舉:3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷等(甲基)丙烯醯氧基矽烷類、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷等環氧矽烷類、3-脲基丙基三乙氧基矽烷等脲基矽烷類、3-異氰酸酯基丙基三乙氧基矽烷等異氰酸酯基矽烷類,尤佳為環氧矽烷類之矽烷偶合劑。作為含磷酸基之化合物,較佳為含(甲基)丙烯醯基之磷酸酯類,較佳為下述通式(g1)、(g2)或(g3)所表示者。 As a preferable silane coupling agent, for example, (meth)acrylonitrile such as 3-methacryloyloxypropylmethyldimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, etc. can be mentioned. Oxysilanes, 2-(3,4-Epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldi Ethoxysilane, epoxysilanes such as 3-glycidoxypropyltriethoxysilane, ureidosilanes such as 3-ureidopropyltriethoxysilane, 3-isocyanatopropyltriethyl Isocyanatosilanes such as oxysilanes are particularly preferred as silane coupling agents such as epoxysilanes. The phosphoric acid group-containing compound is preferably a (meth)acryloyl group-containing phosphoric acid ester, and is preferably represented by the following general formula (g1), (g2) or (g3).
[化27]
於上述通式(g1)、(g2)及(g3)中,R51表示氫原子或甲基,I及I'為1~10之整數,m為1、2或3。該等含磷酸基之化合物亦為可單獨使用1種,亦可將2種以上組合而使用。 In the above general formulae (g1), (g2) and (g3), R 51 represents a hydrogen atom or a methyl group, I and I′ are integers of 1 to 10, and m is 1, 2 or 3. These phosphoric acid group-containing compounds may be used alone or in combination of two or more.
(2)界面活性劑 (2) Surfactant
於本發明之感光性著色組成物中,為了提高塗佈性,亦可含有界面活性劑。 In the photosensitive coloring composition of this invention, in order to improve coatability, you may contain a surfactant.
作為界面活性劑,例如可使用陰離子系、陽離子系、非離子系、兩性界面活性劑等各種界面活性劑。其中,於對各特性造成不良影響之可能性較低之方面,較佳為使用非離子系界面活性劑,其中,氟系或矽系之界面活性劑於塗佈性之方面較有效。 As the surfactant, for example, various surfactants such as anionic, cationic, nonionic, and amphoteric surfactants can be used. Among them, it is preferable to use a nonionic surfactant because the possibility of adversely affecting each characteristic is low, and among them, a fluorine-based or silicon-based surfactant is more effective in coating properties.
作為此種界面活性劑,例如可列舉:TSF4460(GE Toshiba Silicone公司製造)、DFX-18(NEOS公司製造)、BYK-300、BYK-325、BYK-330(BYK-Chemie公司製造)、KP340(Shin-Etsu Silicones公司製造)、F-470、F-475、F-478、F-559(DIC公司製造)、SH7PA(Toray Silicone公司製造)、DS-401(Daikin公司製造)、L-77(Nippon Unicar公司製造)、FC4430(住友3M公司製造)等。再者,界面活性劑可使用1種,亦可將2種以上以任意之組合及比率 併用。 Examples of such surfactants include TSF4460 (manufactured by GE Toshiba Silicone), DFX-18 (manufactured by NEOS), BYK-300, BYK-325, BYK-330 (manufactured by BYK-Chemie), KP340 ( Shin-Etsu Silicones Corporation), F-470, F-475, F-478, F-559 (DIC Corporation), SH7PA (Toray Silicone Corporation), DS-401 (Daikin Corporation), L-77 ( Nippon Unicar Co., Ltd.), FC4430 (Sumitomo 3M Co., Ltd.), etc. In addition, one type of surfactant may be used, or two or more types may be used in any combination and ratio. use together.
(3)顏料衍生物 (3) Pigment derivatives
於本發明之感光性著色組成物中,為了提高分散性、保存性,亦可含有顏料衍生物作為分散助劑。作為顏料衍生物,可列舉:偶氮系、酞菁系、喹吖酮系、苯并咪唑酮系、喹酞酮系、異吲哚啉酮系、二系、蒽醌系、陰丹士林系、苝系、紫環酮系、二酮基吡咯并吡咯系、二系等衍生物,其中,較佳為酞菁系、喹酞酮系。 In the photosensitive coloring composition of the present invention, a pigment derivative may be contained as a dispersing aid in order to improve dispersibility and storage stability. As pigment derivatives, azo-based, phthalocyanine-based, quinacridone-based, benzimidazolone-based, quinophthalone-based, isoindolinone-based, di series, anthraquinone series, indanthrene series, perylene series, perylene series, diketopyrrolopyrrole series, diketopyrrolopyrrole series Among them, phthalocyanine-based and quinophthalone-based derivatives are preferred.
作為顏料衍生物之取代基,可列舉磺酸基、磺醯胺基及其四級鹽、鄰苯二甲醯亞胺甲基、二烷基胺基烷基、羥基、羧基、醯胺基等直接或經由烷基、芳基、雜環基等鍵結於顏料骨架而成者,較佳為磺酸基。又,該等取代基亦可於一個顏料骨架中進行複數個取代。 The substituents of the pigment derivatives include sulfonic acid groups, sulfonamido groups and quaternary salts thereof, phthalimidomethyl groups, dialkylaminoalkyl groups, hydroxyl groups, carboxyl groups, amide groups, and the like. It is preferably a sulfonic acid group that is directly or bonded to the pigment skeleton through an alkyl group, an aryl group, a heterocyclic group, or the like. In addition, these substituents may be substituted in plural in one pigment skeleton.
作為顏料衍生物之具體例,可列舉:酞菁之磺酸衍生物、喹酞酮之磺酸衍生物、蒽醌之磺酸衍生物、喹吖酮之磺酸衍生物、二酮基吡咯并吡咯之磺酸衍生物、二之磺酸衍生物等。該等可單獨使用1種,亦可併用2種以上。 Specific examples of pigment derivatives include sulfonic acid derivatives of phthalocyanine, sulfonic acid derivatives of quinophthalone, sulfonic acid derivatives of anthraquinone, sulfonic acid derivatives of quinacridone, and diketopyrrolo Sulfonic acid derivatives of pyrrole, two sulfonic acid derivatives, etc. These may be used individually by 1 type, and may use 2 or more types together.
(4)光酸產生劑 (4) Photoacid generator
所謂光酸產生劑係指可藉由紫外線而產生酸之化合物,藉由進行曝光時所產生之酸之作用,例如藉由三聚氰胺化合物等交聯劑之存在而進行交聯反應。 The so-called photoacid generator refers to a compound that can generate an acid by ultraviolet rays, and the crosslinking reaction is carried out by the action of the acid generated during exposure, for example, in the presence of a crosslinking agent such as a melamine compound.
於該光酸產生劑中,較佳為於溶劑中之溶解性、尤其是於感光性著色組成物所使用之溶劑中之溶解性較大者。例如可列 舉:二苯基錪、二甲苯基錪、苯基(對茴香基)錪、雙(間硝基苯基)錪、雙(對第三丁基苯基)錪、雙(對氯苯基)錪、雙(正十二烷基)錪、對異丁基苯基(對甲苯基)錪、對異丙基苯基(對甲苯基)錪等二芳基錪、或三苯基鋶鎓等三芳基鋶鎓之氯化物、溴化物、或氟硼化鹽、六氟磷酸鹽、六氟砷酸鹽、芳香族磺酸鹽、四(五氟苯基)硼酸鹽等、或者二苯基苯甲醯甲基鋶鎓(正丁基)三苯基硼酸鹽等鋶鎓有機硼錯合物類、或2-甲基-4,6-雙三氯甲基三、2-(4-甲氧基苯基)-4,6-雙三氯甲基三等三化合物等,但並不限於此。 In this photoacid generator, the solubility to a solvent, especially the solubility to the solvent used for a photosensitive coloring composition, is preferable. For example, diphenyl iodonium, xylyl iodonium, phenyl(p-anisyl) iodonium, bis(m-nitrophenyl) iodonium, bis(p-tert-butylphenyl) iodonium, bis(p-chlorobenzene) base) iodonium, bis(n-dodecyl) iodonium, p-isobutylphenyl (p-tolyl) iodonium, p-isopropylphenyl (p-tolyl) iodonium and other diaryl iodonium, or triphenyl iodonium Chloride, bromide, fluoroboride, hexafluorophosphate, hexafluoroarsenate, aromatic sulfonate, tetrakis(pentafluorophenyl)borate, etc., or diphenyl Perinium organoboron complexes such as benzalkonium methyl pernium (n-butyl) triphenyl borate, or 2-methyl-4,6-bistrichloromethyltriphenyl , 2-(4-methoxyphenyl)-4,6-bistrichloromethyltris wait three compounds, etc., but not limited thereto.
(5)交聯劑 (5) Cross-linking agent
於本發明之感光性著色組成物中,可進而添加交聯劑,例如可使用三聚氰胺或三聚氰二胺系之化合物。作為該等交聯劑,例如可列舉下述通式(6)所表示之三聚氰胺或三聚氰二胺系之化合物。 In the photosensitive coloring composition of this invention, a crosslinking agent can be added further, for example, a melamine or a melamine-based compound can be used. As these crosslinking agents, for example, melamine or melodiamine-based compounds represented by the following general formula (6) can be mentioned.
[化28]
式(6)中,R61表示-NR66R67基或碳數6~12之芳基,於R61為-NR66R67基之情形時,R62、R63、R64、R65、R66及R67之一個、而且於R61為碳數6~12之芳基之情形時,R62、R63、R64及R65之一個表示-CH2OR68基,其餘之R62、R63、R64、R65、R66及R67 相互獨立地表示氫或-CH2OR68基,此處,R68表示氫原子或碳數1~4之烷基。 In formula (6), R 61 represents a -NR 66 R 67 group or an aryl group having 6 to 12 carbon atoms, and when R 61 is a -NR 66 R 67 group, R 62 , R 63 , R 64 , R 65 , one of R 66 and R 67 , and when R 61 is an aryl group having 6 to 12 carbon atoms, one of R 62 , R 63 , R 64 and R 65 represents -CH 2 OR 68 group, and the rest R 62 , R 63 , R 64 , R 65 , R 66 and R 67 independently represent hydrogen or a —CH 2 OR 68 group, where R 68 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
此處,碳數6~12之芳基典型而言為苯基、1-萘基或2-萘基,於該等苯基或萘基亦可鍵結有烷基、烷氧基、鹵素原子等取代基。烷基及烷氧基可分別為碳數1~6左右。R68所表示之烷基較佳為上述中之甲基或乙基、尤其是甲基。 Here, the aryl group having 6 to 12 carbon atoms is typically a phenyl group, a 1-naphthyl group, or a 2-naphthyl group, and an alkyl group, an alkoxy group, or a halogen atom may be bonded to the phenyl group or the naphthyl group. and other substituents. The alkyl group and the alkoxy group may each have about 1 to 6 carbon atoms. The alkyl group represented by R 68 is preferably a methyl group or an ethyl group among the above, especially a methyl group.
相當於通式(6)之三聚氰胺系化合物、即下述通式(6-1)之化合物包含六羥甲基三聚氰胺、五羥甲基三聚氰胺、四羥甲基三聚氰胺、六甲氧基甲基三聚氰胺、五甲氧基甲基三聚氰胺、四甲氧基甲基三聚氰胺、六乙氧基甲基三聚氰胺等。 The melamine-based compound corresponding to the general formula (6), that is, the compound of the following general formula (6-1) includes hexamethylol melamine, pentamethylol melamine, tetramethylol melamine, hexamethoxymethyl melamine, Pentamethoxymethyl melamine, tetramethoxymethyl melamine, hexaethoxymethyl melamine, etc.
[化29]
式(6-1)中,於R62、R63、R64、R65、R66及R67之一個為芳基之情形時,R62、R63、R64及R65之一個表示-CH2OR68基,其餘之R62、R63、R64、R65、R66及R67相互獨立地表示氫原子或-CH2OR68基,此處,R68表示氫原子或烷基。 In formula (6-1), when one of R 62 , R 63 , R 64 , R 65 , R 66 and R 67 is an aryl group, one of R 62 , R 63 , R 64 and R 65 represents - CH 2 OR 68 group, the rest R 62 , R 63 , R 64 , R 65 , R 66 and R 67 independently represent a hydrogen atom or -CH 2 OR 68 group, where R 68 represents a hydrogen atom or an alkyl group .
又,相當於通式(6)之三聚氰二胺系化合物、即通式(6)中之R61為芳基之化合物,包含四羥甲基苯并三聚氰二胺、四甲氧 基甲基苯并三聚氰二胺、三甲氧基甲基苯并三聚氰二胺、四乙氧基甲基苯并三聚氰二胺等。 In addition, the melamine-based compound corresponding to the general formula (6), that is, the compound in which R 61 in the general formula (6) is an aryl group, includes tetramethylolbenzomelamine, tetramethoxy methyl benzo melamine, trimethoxymethyl benzo melamine, tetraethoxy methyl benzo melamine, etc.
進而,亦可使用具有羥甲基或羥甲基烷基醚基之交聯劑。以下列舉其例。 Furthermore, the crosslinking agent which has a methylol group or a methylol alkyl ether group can also be used. Examples are listed below.
2,6-雙(羥基甲基)-4-甲基苯酚、4-第三丁基-2,6-雙(羥基甲基)苯酚、5-乙基-1,3-雙(羥基甲基)全氫-1,3,5-三-2-酮(通稱N-乙基二羥甲基三酮)或其二甲醚體、二羥甲基三亞甲基脲或其二甲醚體、3,5-雙(羥基甲基)全氫-1,3,5-二-4-酮(通稱二羥甲基脲)或其二甲醚體、四羥甲基乙二醛二烷基脲或其四甲醚體。 2,6-bis(hydroxymethyl)-4-methylphenol, 4-tert-butyl-2,6-bis(hydroxymethyl)phenol, 5-ethyl-1,3-bis(hydroxymethyl) ) perhydro-1,3,5-tri -2-keto (commonly known as N-ethyl dimethylol tris ketone) or its dimethyl ether form, dimethylol trimethylene urea or its dimethyl ether form, 3,5-bis(hydroxymethyl)perhydro-1,3,5- two -4-ketone (commonly known as dimethylol urea) or its dimethyl ether form, tetramethylolglyoxal dialkyl urea or its tetramethyl ether form.
再者,該等交聯劑可單獨使用1種,亦可將2種以上組合而使用。使用交聯劑時之量相對於感光性著色組成物之總固形份較佳為0.1~15質量%,尤佳為0.5~10質量%。 In addition, these crosslinking agents may be used individually by 1 type, and may be used in combination of 2 or more types. 0.1-15 mass % is preferable with respect to the total solid content of the photosensitive coloring composition, and, as for the quantity at the time of using a crosslinking agent, 0.5-10 mass % is especially preferable.
(6)巰基化合物 (6) Sulfhydryl compounds
作為聚合促進劑,又,為了提高對基板之密接性,亦可添加巰基化合物。 As a polymerization accelerator, a mercapto compound may also be added in order to improve the adhesion to the substrate.
作為巰基化合物之種類,可列舉:2-巰基苯并噻唑、2-巰基苯并唑、2-巰基苯并咪唑、己二硫醇、癸二硫醇、1,4-二甲基巰基苯、丁二醇雙巰基丙酸酯、丁二醇雙巰基乙酸酯、乙二醇雙巰基乙酸酯、三羥甲基丙烷三巰基乙酸酯、丁二醇雙統基丙酸酯、三羥甲基丙烷三巰基丙酸酯、三羥甲基丙烷三巰基乙酸酯、季戊四醇四巰基丙酸酯、季戊四醇四巰基乙酸酯、三羥基乙基三巰基丙酸酯、乙二醇雙(3-巰基丁酸酯)、丁二醇雙(3-巰基丁酸酯)、1,4-雙(3-統基丁醯氧基)丁烷、三羥甲基丙烷三(3-巰基丁酸酯)、季戊四 醇四(3-巰基丁酸酯)、季戊四醇三(3-巰基丁酸酯)、乙二醇雙(3-巰基異丁酸酯)、丁二醇雙(3-巰基異丁酸酯)、三羥甲基丙烷三(3-巰基異丁酸酯)、1,3,5-三(3-巰基丁氧基乙基)-1,3,5-三-2,4,6(1H,3H,5H)-三酮等具有雜環之巰基化合物或脂肪族多官能基巰基化合物等。該等可單獨使用1種各種巰基化合物,或者將2種以上混合而使用。 Examples of the type of mercapto compound include: 2-mercaptobenzothiazole, 2-mercaptobenzothiazole azole, 2-mercaptobenzimidazole, hexanedithiol, decanedithiol, 1,4-dimethylmercaptobenzene, butanediol bis-mercaptopropionate, butanediol bis-thioglycolate, ethylene glycol Bis-mercaptoacetate, Trimethylolpropane Trimercaptoacetate, Butylene Glycol Bis-Propionate, Trimethylolpropane Trimercaptopropionate, Trimethylolpropane Trimercaptoacetate, Pentaerythritol Tetramercaptopropionate, Pentaerythritol Tetramercaptoacetate, Trihydroxyethyl Trimercaptopropionate, Ethylene Glycol Bis(3-Mercaptobutyrate), Butylene Glycol Bis(3-Mercaptobutyrate), 1 ,4-bis(3-tributanoyloxy)butane, trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate) ester), ethylene glycol bis(3-mercaptoisobutyrate), butanediol bis(3-mercaptoisobutyrate), trimethylolpropane tris(3-mercaptoisobutyrate), 1, 3,5-Tris(3-mercaptobutoxyethyl)-1,3,5-tris -2,4,6(1H,3H,5H)-triketone and other mercapto compounds or aliphatic polyfunctional mercapto compounds having a heterocyclic ring. These various mercapto compounds can be used individually by 1 type, or can be used in mixture of 2 or more types.
<感光性著色組成物中之成分調配量> <The amount of ingredients in the photosensitive coloring composition>
於本發明之感光性著色組成物中,(a)著色劑之含量相對於感光性著色組成物中之總固形份量通常為10質量%以上,較佳為20質量%以上,進而較佳為30質量%以上。又,通常較佳為60質量%以下,進而較佳為50質量%以下。 In the photosensitive coloring composition of the present invention, the content of the (a) colorant is usually 10% by mass or more, preferably 20% by mass or more, and more preferably 30% by mass relative to the total solid content in the photosensitive coloring composition. mass % or more. Moreover, 60 mass % or less is normally preferable, and 50 mass % or less is more preferable.
藉由將(a)著色劑之含量設為上述下限值以上,有獲得充分之光學密度(OD)之傾向;又,藉由設為上述上限值以下,有容易獲得充分之製版特性之傾向。 By making the content of (a) the colorant more than the above-mentioned lower limit value, a sufficient optical density (OD) tends to be obtained; and by making the content of the colorant less than or equal to the above-mentioned upper limit value, it is easy to obtain sufficient plate-making characteristics. tendency.
又,於第1態樣及第4態樣中,相對於(a)著色劑100質量份,選自由紅色顏料及橙色顏料所組成群組中之至少1種顏料較佳為1質量份以上,更佳為2質量份以上,進而較佳為3質量份以上。又,較佳為30質量份以下,更佳為20質量份以下,進而較佳為15質量份以下,更進而較佳為10質量份以下,尤佳為7質量份以下。藉由設為上述下限值以上,有獲得充分之光學密度(OD)之傾向;藉由設為上述上限值以下,有可確保製版特性之傾向。 Furthermore, in the first aspect and the fourth aspect, at least one pigment selected from the group consisting of a red pigment and an orange pigment is preferably 1 part by mass or more relative to 100 parts by mass of the (a) colorant, More preferably, it is 2 parts by mass or more, and still more preferably 3 parts by mass or more. Moreover, 30 mass parts or less are preferable, 20 mass parts or less are more preferable, 15 mass parts or less are still more preferable, 10 mass parts or less are still more preferable, 7 mass parts or less are especially preferable. By setting it as the said lower limit or more, sufficient optical density (OD) tends to be obtained, and by setting it as below the said upper limit, there exists a tendency for a plate-making characteristic to be ensured.
又,於第1態樣及第4態樣中,相對於(a)著色劑100質量份,選自由藍色顏料及紫色顏料所組成群組中之至少1種顏料 較佳為20質量份以上,更佳為30質量份以上,進而較佳為40質量份以上,更進而較佳為50質量份以上,尤佳為60質量份以上,最佳為65質量份以上。又,較佳為90質量份以下,更佳為80質量份以下,進而較佳為75質量份以下,尤佳為70質量份以下。藉由設為上述下限值以上,有可確保遮光性之傾向;藉由設為上述上限值以下,有可確保製版特性之傾向。 Moreover, in the 1st aspect and the 4th aspect, with respect to (a) 100 parts by mass of the colorant, at least one pigment selected from the group consisting of a blue pigment and a violet pigment It is preferably 20 parts by mass or more, more preferably 30 parts by mass or more, more preferably 40 parts by mass or more, still more preferably 50 parts by mass or more, particularly preferably 60 parts by mass or more, and most preferably 65 parts by mass or more . Moreover, 90 mass parts or less are preferable, 80 mass parts or less are more preferable, 75 mass parts or less are still more preferable, and 70 mass parts or less are especially preferable. By making it more than the said lower limit value, there exists a tendency for the light-shielding property to be ensured, and there exists a tendency for the plate-making characteristic to be able to be ensured by setting it as below the said upper limit value.
又,於第2態樣中,上述通式(1)所表示之有機黑色顏料相對於(a)著色劑100質量份之含量較佳為5質量份以上,更佳為10質量份以上,進而較佳為20質量份以上,更進而較佳為40質量份以上,尤佳為60質量份以上,最佳為70質量份以上。又,較佳為95質量份以下,更佳為90質量份以下,進而較佳為85質量份以下,尤佳為80質量份以下。藉由設為上述下限值以上,有可提高遮光性之傾向;藉由設為上述上限值以下,有可抑制可靠性降低之傾向。 Moreover, in the second aspect, the content of the organic black pigment represented by the general formula (1) with respect to 100 parts by mass of the colorant (a) is preferably 5 parts by mass or more, more preferably 10 parts by mass or more, and further It is preferably 20 parts by mass or more, more preferably 40 parts by mass or more, particularly preferably 60 parts by mass or more, and most preferably 70 parts by mass or more. Moreover, 95 mass parts or less are preferable, 90 mass parts or less are more preferable, 85 mass parts or less are still more preferable, and 80 mass parts or less are especially preferable. By setting it as the said lower limit or more, there exists a tendency for the light-shielding property to be improved, and by setting it as below the said upper limit, it exists in the tendency which can suppress the fall of reliability.
又,於第3態樣中,相對於(a)著色劑100質量份,有機顏料較佳為30質量份以上,更佳為50質量份以上,進而較佳為60質量份以上,尤佳為70質量份以上。又,較佳為99質量份以下,更佳為95質量份以下,進而較佳為90質量份以下,尤佳為85質量份以下,最佳為80質量份以下。藉由設為上述下限值以上,有可確保製版特性之傾向;藉由設為上述上限值以下,有獲得充分之光學密度(OD)之傾向。 Moreover, in the third aspect, the organic pigment is preferably 30 parts by mass or more, more preferably 50 parts by mass or more, still more preferably 60 parts by mass or more, preferably 60 parts by mass or more, with respect to 100 parts by mass of the (a) colorant. 70 parts by mass or more. Moreover, it is preferably 99 parts by mass or less, more preferably 95 parts by mass or less, still more preferably 90 parts by mass or less, particularly preferably 85 parts by mass or less, and most preferably 80 parts by mass or less. By making it more than the said lower limit value, there exists a tendency for a plate-making characteristic to be able to be ensured, and there exists a tendency for sufficient optical density (OD) to be obtained by making it into the said upper limit value or less.
又,於第3態樣中,相對於(a)著色劑100質量份,選自由紅色顏料及橙色顏料所組成群組中之至少1種顏料較佳為0質量份以上,更佳為1質量份以上,進而較佳為2質量份以上。又, 較佳為30質量份以下,更佳為20質量份以下,進而較佳為15質量份以下,尤佳為10質量份以下,最佳為0質量份。藉由設為上述下限值以上,有獲得充分之光學密度(OD)之傾向;藉由設為上述上限值以下,有可確保製版特性之傾向。 Furthermore, in the third aspect, at least one pigment selected from the group consisting of a red pigment and an orange pigment is preferably 0 parts by mass or more, more preferably 1 mass part, relative to 100 parts by mass of the colorant (a). part or more, more preferably 2 parts by mass or more. again, It is preferably 30 parts by mass or less, more preferably 20 parts by mass or less, still more preferably 15 parts by mass or less, particularly preferably 10 parts by mass or less, and most preferably 0 parts by mass. By setting it as the said lower limit or more, sufficient optical density (OD) tends to be obtained, and by setting it as below the said upper limit, there exists a tendency for a plate-making characteristic to be ensured.
又,於第3態樣中,相對於(a)著色劑100質量份,選自由藍色顏料及紫色顏料所組成群組中之至少1種顏料較佳為20質量份以上,更佳為30質量份以上,進而較佳為40質量份以上,更進而較佳為50質量份以上,尤佳為60質量份以上,最佳為65質量份以上。又,較佳為90質量份以下,更佳為85質量份以下,進而較佳為80質量份以下。藉由設為上述下限值以上,有可確保遮光性之傾向;藉由設為上述上限值以下,有可確保製版特性之傾向。 Furthermore, in the third aspect, at least one pigment selected from the group consisting of blue pigments and violet pigments is preferably 20 parts by mass or more, more preferably 30 parts by mass relative to 100 parts by mass of the colorant (a). It is more preferably 40 parts by mass or more, more preferably 50 parts by mass or more, particularly preferably 60 parts by mass or more, and most preferably 65 parts by mass or more. Moreover, 90 mass parts or less are preferable, 85 mass parts or less are more preferable, and 80 mass parts or less are still more preferable. By making it more than the said lower limit value, there exists a tendency for the light-shielding property to be ensured, and there exists a tendency for the plate-making characteristic to be able to be ensured by setting it as below the said upper limit value.
於(a)著色劑含有有機黑色顏料之情形時,相對於(a)著色劑100質量份,有機黑色顏料較佳為5質量份以上,更佳為10質量份以上,進而較佳為20質量份以上。又,較佳為50質量份以下,更佳為40質量份以下,進而較佳為30質量份以下,尤佳為20質量份以下。藉由設為上述下限值以上,有獲得充分之光學密度(OD)之傾向;藉由設為上述上限值以下,有可確保製版特性之傾向。 When (a) the colorant contains an organic black pigment, the amount of the organic black pigment is preferably 5 parts by mass or more, more preferably 10 parts by mass or more, and more preferably 20 parts by mass relative to 100 parts by mass of the (a) colorant copies or more. Moreover, 50 mass parts or less are preferable, 40 mass parts or less are more preferable, 30 mass parts or less are further more preferable, and 20 mass parts or less are especially preferable. By setting it as the said lower limit or more, sufficient optical density (OD) tends to be obtained, and by setting it as below the said upper limit, there exists a tendency for a plate-making characteristic to be ensured.
於(a)著色劑含有碳黑之情形時,相對於(a)著色劑100質量份,碳黑較佳為5質量份以上,更佳為10質量份以上,進而較佳為15質量份以上,尤佳為20質量份以上。又,較佳為50質量份以下,更佳為40質量份以下,進而較佳為35質量份以下,更進而較佳為30質量份以下。藉由設為上述下限值以上,有獲得充分之光學密度(OD)之傾向;藉由設為上述上限值以下,有可確保製 版特性之傾向。 When (a) the colorant contains carbon black, the amount of carbon black is preferably 5 parts by mass or more, more preferably 10 parts by mass or more, and still more preferably 15 parts by mass or more relative to 100 parts by mass of the (a) colorant , particularly preferably 20 parts by mass or more. Moreover, 50 mass parts or less are preferable, 40 mass parts or less are more preferable, 35 mass parts or less are still more preferable, and 30 mass parts or less are still more preferable. By setting the above lower limit value or more, a sufficient optical density (OD) tends to be obtained, and by setting the above upper limit value or less, it is possible to ensure the The tendency of version characteristics.
(b)鹼可溶性樹脂之含有比例相對於本發明之感光性著色組成物之總固形份通常為5質量%以上,較佳為10質量%以上,更佳為20質量%以上,進而較佳為25質量%以上,尤佳為30質量%以上。通常為85質量%以下,較佳為80質量%以下,更佳為70質量%以下,進而較佳為60質量%以下,更進而較佳為50質量%以下,尤佳為40質量%以下。 (b) The content ratio of the alkali-soluble resin is usually 5% by mass or more, preferably 10% by mass or more, more preferably 20% by mass or more, more preferably 20% by mass or more, based on the total solid content of the photosensitive coloring composition of the present invention. 25 mass % or more, especially 30 mass % or more are preferable. Usually 85 mass % or less, preferably 80 mass % or less, more preferably 70 mass % or less, still more preferably 60 mass % or less, still more preferably 50 mass % or less, particularly preferably 40 mass % or less.
藉由將(b)鹼可溶性樹脂之含量設為上述下限值以上,有可抑制未曝光部分於顯影液中之溶解性之降低而抑制顯影不良之傾向。又,藉由設為上述上限值以下,有可抑制顯影液對曝光部之浸透性變高、抑制像素之鮮明性或密接性降低之傾向。 By making content of (b) alkali-soluble resin more than the said lower limit, the fall of the solubility in a developing solution of an unexposed part can be suppressed, and there exists a tendency for development failure to be suppressed. Moreover, by setting it below the said upper limit, it exists in the tendency which can suppress that the penetration of a developing solution with respect to an exposure part becomes high, and the sharpness or adhesiveness of a pixel can be suppressed from falling.
(c)光聚合起始劑之含有比例相對於本發明之感光性著色組成物之總固形份通常為0.1質量%以上,較佳為0.5質量%以上,更佳為1質量%以上,進而較佳為2質量%以上,更進而較佳為3質量%以上,尤佳為4質量%以上。通常為15質量%以下,較佳為10質量%以下,更佳為8質量%以下,進而較佳為7質量%以下。 (c) The content ratio of the photopolymerization initiator is usually 0.1% by mass or more, preferably 0.5% by mass or more, more preferably 1% by mass or more, more preferably 1% by mass or more, based on the total solid content of the photosensitive coloring composition of the present invention. Preferably it is 2 mass % or more, More preferably, it is 3 mass % or more, More preferably, it is 4 mass % or more. It is usually 15 mass % or less, preferably 10 mass % or less, more preferably 8 mass % or less, and still more preferably 7 mass % or less.
藉由將(c)光聚合起始劑之含有比例設為上述下限值以上,有可抑制感度降低之傾向;藉由設為上述上限值以下,有可抑制未曝光部分於顯影液中之溶解性之降低而抑制顯影不良之傾向。 By making the content ratio of the (c) photopolymerization initiator more than or equal to the above lower limit value, there is a tendency that the decrease in sensitivity can be suppressed; The solubility of the product is reduced and the tendency of poor development is suppressed.
(c)光聚合起始劑中所包含之上述通式(I)所表示之肟酯系化合物之含有比例並無特別限定,通常為10質量%以上,較佳為30質量%以上,更佳為50質量%以上,進而較佳為70質量%以 上,尤佳為90質量%以上,通常為100質量%以下。藉由設為上述下限值以上,有所獲得之硬化物之表面平滑性變良好之傾向。 (c) The content ratio of the oxime ester compound represented by the general formula (I) contained in the photopolymerization initiator is not particularly limited, but is usually 10% by mass or more, preferably 30% by mass or more, more preferably 50 mass % or more, more preferably 70 mass % or more 90 mass % or more is particularly preferable, and usually 100 mass % or less. By making it more than the said lower limit, the surface smoothness of the hardened|cured material obtained tends to become favorable.
於與(c)光聚合起始劑一併使用聚合促進劑之情形時,聚合促進劑之含有比例相對於本發明之感光性著色組成物之總固形份較佳為0.05質量%以上,通常為10質量%以下,較佳為5質量%以下,聚合促進劑相對於(c)光聚合起始劑100質量份通常較佳為以0.1~50質量份、尤其是以0.1~20質量份之比例使用。 When a polymerization accelerator is used together with the (c) photopolymerization initiator, the content ratio of the polymerization accelerator is preferably 0.05 mass % or more with respect to the total solid content of the photosensitive coloring composition of the present invention, and is usually 10 mass % or less, preferably 5 mass % or less, the ratio of the polymerization accelerator to 100 mass parts of the (c) photopolymerization initiator is usually preferably 0.1 to 50 mass parts, especially 0.1 to 20 mass parts use.
藉由將聚合促進劑之含有比例設為上述下限值以上,有可抑制對曝光光線之感度之降低之傾向;藉由設為上述上限值以下,有可抑制未曝光部分於顯影液中之溶解性之降低而抑制顯影不良之傾向。又,關於增感色素於本發明之感光性著色組成物中所占之調配比例,就感度之觀點而言,於感光性著色組成物中之總固形份中通常為20質量%以下,較佳為15質量%以下,進而較佳為10質量%以下。 By making the content ratio of the polymerization accelerator more than the above-mentioned lower limit value, the tendency to reduce the sensitivity to exposure light can be suppressed; by making the content ratio of the polymerization accelerator less than or equal to the above-mentioned upper limit value, the unexposed part in the developing solution can be suppressed. The solubility of the product is reduced and the tendency of poor development is suppressed. Moreover, about the compounding ratio which the sensitizing dye occupies in the photosensitive coloring composition of this invention, from the viewpoint of sensitivity, in the total solid content in the photosensitive coloring composition, it is preferable that it is usually 20 mass % or less. It is 15 mass % or less, More preferably, it is 10 mass % or less.
(d)乙烯性不飽和化合物之含有比例相對於本發明之感光性著色組成物之總固形份通常為30質量%以下,較佳為20質量%以下,更佳為15質量%以下。藉由將(d)乙烯性不飽和化合物之含有比例設為上述上限值以下,有可抑制顯影液對曝光部之浸透性變高而容易獲得良好之影像之傾向。再者,(d)乙烯性不飽和化合物之含有比例之下限值通常為1質量%以上,較佳為5質量%以上。 (d) The content rate of an ethylenically unsaturated compound is 30 mass % or less normally with respect to the total solid content of the photosensitive coloring composition of this invention, Preferably it is 20 mass % or less, More preferably, it is 15 mass % or less. By making the content ratio of (d) ethylenically unsaturated compound below the said upper limit value, it exists in the tendency which can suppress that the permeability|transmittance of a developer with respect to an exposure part becomes high, and becomes easy to obtain a favorable image. In addition, the lower limit value of the content ratio of the (d) ethylenically unsaturated compound is usually 1 mass % or more, preferably 5 mass % or more.
再者,本發明之感光性著色組成物藉由使用(e)溶劑,而以其固形份濃度通常成為5質量%以上、較佳為10質量%以上、而且通常成為50質量%以下、較佳為30質量%以下之方式製備液體。 Furthermore, by using the (e) solvent, the photosensitive coloring composition of the present invention has a solid content concentration of usually 5% by mass or more, preferably 10% by mass or more, and usually 50% by mass or less, preferably A liquid is prepared so that it may be 30 mass % or less.
(f)分散劑之含有比例於感光性著色組成物之固形份中通常為1質量%以上,較佳為3質量%以上,更佳為5質量%以上。又,通常為30質量%以下,較佳為20質量%以下,更佳為15質量%以下,進而較佳為10質量%以下。 (f) The content rate of a dispersing agent is 1 mass % or more normally in the solid content of a photosensitive coloring composition, Preferably it is 3 mass % or more, More preferably, it is 5 mass % or more. Moreover, it is usually 30 mass % or less, Preferably it is 20 mass % or less, More preferably, it is 15 mass % or less, More preferably, it is 10 mass % or less.
又,(f)分散劑相對於(a)著色劑100質量份之含有比例通常為5質量份以上,更佳為10質量份以上,進而較佳為15質量份以上,通常較佳為50質量份以下、尤其是30質量份以下。 In addition, the content ratio of the (f) dispersant to 100 parts by mass of the (a) colorant is usually 5 parts by mass or more, more preferably 10 parts by mass or more, still more preferably 15 parts by mass or more, and usually 50 parts by mass or more parts or less, especially 30 parts by mass or less.
藉由將(f)分散劑之含有比例設為上述下限值以上,有容易獲得充分之分散性之傾向;藉由設為上述上限值以下,有可藉由相對地減少其他成分之比例而抑制感度、製版性等之降低之傾向。 By setting the content ratio of the (f) dispersant to the above lower limit value or more, sufficient dispersibility tends to be easily obtained; by setting it to the above upper limit value or less, the ratio of other components can be relatively reduced. In addition, the tendency to decrease in sensitivity, plate-making properties, etc. is suppressed.
於使用密接改善劑之情形時,其含有比例相對於感光性著色組成物中之總固形份通常為0.1~5質量%,較佳為0.2~3質量%,進而較佳為0.4~2質量%。藉由將密接改善劑之含有比例設為上述下限值以上,有可充分獲得密接性之提昇效果之傾向;藉由設為上述上限值以下,有可抑制感度降低或者顯影後殘渣殘留而成為缺陷之情況之傾向。 In the case of using an adhesion improving agent, its content ratio is usually 0.1 to 5 mass %, preferably 0.2 to 3 mass %, and more preferably 0.4 to 2 mass % with respect to the total solid content in the photosensitive coloring composition. . By setting the content ratio of the adhesion improving agent to be more than the above lower limit value, the effect of improving the adhesion tends to be sufficiently obtained; Tendency to become a condition of defect.
又,於使用界面活性劑之情形時,其含有比例相對於感光性著色組成物中之總固形份通常為0.001~10質量%,較佳為0.005~1質量%,進而較佳為0.01~0.5質量%,最佳為0.03~0.3質量%。藉由將界面活性劑之含量設為上述下限值以上,有容易表現塗佈膜之平滑性、均勻性之傾向;藉由設為上述上限值以下,有容易表現塗佈膜之平滑性、均勻性,且亦抑制其他特性變差之傾向。 Moreover, when using a surfactant, its content rate is 0.001-10 mass % normally with respect to the total solid content in the photosensitive coloring composition, Preferably it is 0.005-1 mass %, More preferably, it is 0.01-0.5 % by mass, preferably 0.03 to 0.3% by mass. By making the content of the surfactant more than the above-mentioned lower limit value, the smoothness and uniformity of the coating film tend to be easily expressed; by making the content of the surfactant less than or equal to the above-mentioned upper limit value, the smoothness of the coating film is likely to be expressed. , uniformity, and also inhibit the tendency of other characteristics to deteriorate.
<感光性著色組成物之物性> <Physical properties of photosensitive coloring composition>
本發明之感光性著色組成物可較佳地使用於形成著色間隔件,就用作著色間隔件之觀點而言,較佳為呈黑色。又,其塗膜之膜厚每1μm之光學密度(OD)較佳為1.0以上,更佳為1.2以上,進而較佳為1.5以上,尤佳為1.8以上。通常為4.0以下,較佳為3.0以下,更佳為2.5以下。 The photosensitive coloring composition of this invention can be used suitably for forming a coloring spacer, and it is preferable to be black from a viewpoint of being used as a coloring spacer. Moreover, the optical density (OD) per 1 micrometer of the film thickness of the coating film is preferably 1.0 or more, more preferably 1.2 or more, still more preferably 1.5 or more, particularly preferably 1.8 or more. Usually, it is 4.0 or less, preferably 3.0 or less, more preferably 2.5 or less.
<感光性著色組成物之製造方法> <The manufacturing method of the photosensitive coloring composition>
本發明之感光性著色組成物(以下,有時稱為「光阻」)係依據常規方法製造。通常,(a)著色劑較佳為預先使用塗料調節器、砂磨機、球磨機、輥磨機、石磨機、噴射磨機、均質機等進行分散處理。藉由分散處理將(a)著色劑微粒子化,因此光阻之塗佈特性提高。 The photosensitive coloring composition of the present invention (hereinafter, sometimes referred to as "photoresist") is produced according to a conventional method. Usually, the (a) colorant is preferably dispersed in advance using a paint conditioner, a sand mill, a ball mill, a roll mill, a stone mill, a jet mill, a homogenizer, or the like. The (a) colorant is made into fine particles by the dispersion treatment, so that the coating properties of the photoresist are improved.
分散處理通常較佳為於併用(a)著色劑、(e)溶劑、及(f)分散劑、以及(b)鹼可溶性樹脂之一部分或全部併用之系統中進行(以下,有時將供於分散處理之混合物、及藉由該處理所獲得之組成物稱為「油墨」或「顏料分散液」)。尤其是若將高分子分散劑用作(f)分散劑,則所獲得之油墨及光阻之經時之增黏受到抑制(分散穩定性優異),故而較佳。 The dispersion treatment is usually preferably performed in a system in which a part or all of (a) a colorant, (e) a solvent, (f) a dispersant, and (b) an alkali-soluble resin are used together (hereinafter, it may be used for The mixture of dispersion treatment, and the composition obtained by this treatment are called "ink" or "pigment dispersion"). In particular, when a polymer dispersant is used as the (f) dispersant, the viscosity increase over time of the obtained ink and photoresist is suppressed (excellent dispersion stability), which is preferable.
如此,於製造光阻之步驟中,較佳為製造至少含有(a)著色劑、(e)溶劑、及(f)分散劑之顏料分散液。作為可用於顏料分散液之(a)著色劑、(e)有機溶劑、及(f)分散劑,可分別較佳地採用作為可用於感光性著色組成物所記載者。 In this way, in the step of producing a photoresist, it is preferable to produce a pigment dispersion liquid containing at least (a) a colorant, (e) a solvent, and (f) a dispersant. As the (a) colorant, (e) organic solvent, and (f) dispersant usable in the pigment dispersion liquid, those described as usable in the photosensitive coloring composition can be preferably used, respectively.
再者,於對含有調配感光性著色組成物之總成分之液體進行分散處理之情形時,由於分散處理時所產生之發熱,有高反 應性之成分進行改質之可能性。因此,較佳為於包含高分子分散劑之系統中進行分散處理。 Furthermore, in the case of dispersing the liquid containing the total components for preparing the photosensitive coloring composition, there is a high degree of reflection due to the heat generated during the dispersing process. Possibility of modification of reactive components. Therefore, it is preferable to carry out the dispersion treatment in a system containing a polymer dispersant.
於利用砂磨機使(a)著色劑分散之情形時,較佳為使用0.1~8mm左右之粒徑之玻璃珠或氧化鋯珠。關於分散處理條件,溫度通常為0℃至100℃,較佳為室溫至80℃之範圍。分散時間因液體之組成及分散處理裝置之尺寸等而有不同之適當時間,因此需適當調節。分散之標準在於以光阻之20度鏡面光澤度(JIS Z8741)成為50~300之範圍之方式控制油墨之光澤。 In the case of dispersing the (a) colorant with a sand mill, it is preferable to use glass beads or zirconia beads with a particle size of about 0.1 to 8 mm. Regarding the dispersion treatment conditions, the temperature is usually in the range of 0°C to 100°C, and preferably in the range of room temperature to 80°C. The dispersing time varies with the composition of the liquid and the size of the dispersing treatment device. Therefore, it needs to be adjusted appropriately. The standard of dispersion is to control the gloss of the ink so that the 20-degree specular gloss (JIS Z8741) of the photoresist is in the range of 50~300.
於光阻之光澤度較低之情形時,分散處理不充分,粗糙之顏料(色材)粒子殘留之情況較多,有顯影性、密接性、解像性等變得不充分之可能性。又,若進行分散處理直至光澤值超過上述範圍,則顏料破碎而產生大量超微粒子,因此反而有使分散穩定性受損之傾向。 When the glossiness of the photoresist is low, the dispersion treatment is not sufficient, and the coarse pigment (color material) particles remain in many cases, and the developability, adhesion, resolution, etc. may become insufficient. In addition, if the dispersion treatment is performed until the gloss value exceeds the above-mentioned range, the pigment will be crushed and a large number of ultrafine particles will be generated, so that the dispersion stability tends to be impaired on the contrary.
又,分散於油墨中之顏料之分散粒徑通常為0.03~0.3μm,其係藉由動態光散射法等進行測定。 In addition, the dispersed particle diameter of the pigment dispersed in the ink is usually 0.03 to 0.3 μm, which is measured by a dynamic light scattering method or the like.
其次,將藉由上述分散處理所獲得之油墨與光阻中所包含之上述其他成分混合而製成均勻之溶液。於光阻之製造步驟中,微細之污物混合至液體中之情況較多,因此較理想為藉由過濾器等對所獲得之光阻進行過濾處理。 Next, the ink obtained by the above-mentioned dispersion treatment is mixed with the above-mentioned other components contained in the photoresist to prepare a uniform solution. In the photoresist manufacturing step, fine dirt is often mixed into the liquid, so it is preferable to filter the obtained photoresist with a filter or the like.
[硬化物] [hardened product]
藉由使本發明之感光性著色組成物硬化,可獲得硬化物。將感光性著色組成物硬化而成之硬化物可較佳地用作著色間隔件。 A cured product can be obtained by curing the photosensitive coloring composition of the present invention. The hardened|cured material which hardened the photosensitive coloring composition can be used suitably as a coloring spacer.
[著色間隔件] [coloring spacer]
其次,對於使用本發明之感光性著色組成物之著色間隔件,依據其製造方法進行說明。 Next, the coloring spacer using the photosensitive coloring composition of this invention is demonstrated based on the manufacturing method.
(1)支持體 (1) Support body
作為用以形成著色間隔件之支持體,只要具有適度之強度,則其材質並無特別限定。主要使用透明基板,作為材質,例如可列舉:聚對苯二甲酸乙二酯等聚酯系樹脂、聚丙烯、聚乙烯等聚烯烴系樹脂、聚碳酸酯、聚甲基丙烯酸甲酯、聚碸等熱塑性樹脂製片材、環氧樹脂、不飽和聚酯樹脂、聚(甲基)丙烯酸系樹脂等熱硬化性樹脂片材、或各種玻璃等。 The material of the support for forming the colored spacer is not particularly limited as long as it has an appropriate strength. A transparent substrate is mainly used, and as a material, for example, polyester-based resins such as polyethylene terephthalate, polyolefin-based resins such as polypropylene and polyethylene, polycarbonate, polymethyl methacrylate, and polysilicon are exemplified. Thermoplastic resin sheets such as epoxy resins, unsaturated polyester resins, thermosetting resin sheets such as poly(meth)acrylic resins, and various glasses.
其中,就耐熱性之觀點而言,較佳為玻璃、耐熱性樹脂。又,亦有於基板之表面使氧化銦錫(ITO,Indium Tin Oxide)、氧化銦鋅(IZO,Indium Zinc Oxide)等透明電極成膜之情形。除透明基板以外,亦能形成於TFT陣列上。 Among them, from the viewpoint of heat resistance, glass and heat-resistant resin are preferred. In addition, there are cases in which transparent electrodes such as indium tin oxide (ITO, Indium Tin Oxide) and indium zinc oxide (IZO, Indium Zinc Oxide) are formed on the surface of the substrate. In addition to the transparent substrate, it can also be formed on the TFT array.
為了接著性等表面物性之改良,亦可視需要對支持體進行電暈放電處理、臭氧處理、矽烷偶合劑、或胺基甲酸酯系樹脂等各種樹脂之薄膜成形處理等。透明基板之厚度通常設為0.05~10mm,較佳為設為0.1~7mm之範圍。又,於進行各種樹脂之薄膜成形處理之情形時,其膜厚通常為0.01~10μm,較佳為0.05~5μm之範圍。 In order to improve surface physical properties such as adhesion, the support may be subjected to corona discharge treatment, ozone treatment, silane coupling agent, or film forming treatment of various resins such as urethane resins, etc., if necessary. The thickness of the transparent substrate is usually set to 0.05 to 10 mm, preferably within the range of 0.1 to 7 mm. Moreover, when performing the film forming process of various resin, the film thickness is normally 0.01-10 micrometers, Preferably it is the range of 0.05-5 micrometers.
(2)著色間隔件 (2) Colored spacers
本發明之感光性著色組成物係使用於與公知之彩色濾光片用 感光性著色組成物相同之用途。以下,對於用作著色間隔件(黑色感光性間隔件)之情形,依據使用本發明之感光性著色組成物之黑色感光性間隔件之形成方法之具體例進行說明。 The photosensitive coloring composition of the present invention is used with a known color filter The same application as the photosensitive coloring composition. Hereinafter, the case of using as a coloring spacer (black photosensitive spacer) is demonstrated based on the specific example of the formation method of the black photosensitive spacer using the photosensitive coloring composition of this invention.
通常,於應設置黑色感光性間隔件之基板上,藉由塗佈等方法呈膜狀或圖案狀地供給感光性著色組成物,並使溶劑乾燥。繼而,藉由進行曝光-顯影之光微影法等方法進行圖案形成。其後,視需要進行追加曝光或熱硬化處理,藉此於該基板上形成黑色感光性間隔件。 Usually, the photosensitive coloring composition is supplied in the form of a film or a pattern by a method such as coating on the substrate on which the black photosensitive spacer should be provided, and the solvent is dried. Then, pattern formation is performed by methods, such as the photolithography method which performs exposure-development. After that, additional exposure or thermosetting treatment is performed as necessary, whereby black photosensitive spacers are formed on the substrate.
(3)著色間隔件之形成 (3) Formation of coloring spacers
[1]對基板之供給方法 [1] Supply method to substrate
本發明之感光性著色組成物通常係以溶解或分散於溶劑之狀態供給至基板上。作為其供給方法,可藉由先前公知之方法、例如旋轉塗佈機法、線棒塗佈法、流塗法、模嘴塗佈法、輥式塗佈法、噴塗法等進行。又,亦可藉由噴墨法或印刷法等而呈圖案狀地供給。 The photosensitive coloring composition of this invention is normally supplied to a board|substrate in the state which melt|dissolved or disperse|distributed in a solvent. As the supply method, it can be performed by a conventionally known method, for example, a spin coater method, a wire bar coating method, a flow coating method, a die nozzle coating method, a roll coating method, a spray coating method, or the like. In addition, it can also be supplied in a pattern by an ink jet method, a printing method, or the like.
其中,若利用模嘴塗佈法,則就塗佈液之使用量大幅削減,且完全不存在利用旋轉塗佈法時所附著之薄霧等之影響、異物產生受到抑制等綜合性觀點而言較佳。 Among them, if the die coating method is used, the usage amount of the coating liquid is greatly reduced, the influence of mist and the like adhering in the spin coating method is completely eliminated, and the generation of foreign matter is suppressed from a comprehensive viewpoint. better.
塗佈量視用途而不同,例如於黑色感光性間隔件之情形時,作為乾燥膜厚,通常為0.5μm~10μm、較佳為1μm~9μm、尤佳為1μm~7μm之範圍。又,重要的是乾燥膜厚或最終形成之間隔件之高度遍及基板全域地均勻。於差異較大之情形時,會於液晶面板產生不均缺陷。 The coating amount varies depending on the application. For example, in the case of a black photosensitive spacer, the dry film thickness is usually in the range of 0.5 μm to 10 μm, preferably 1 μm to 9 μm, and particularly preferably 1 μm to 7 μm. In addition, it is important that the dry film thickness or the height of the spacer to be finally formed is uniform over the entire area of the substrate. When the difference is large, uneven defects will be generated in the liquid crystal panel.
但是,於使用本發明之感光性著色組成物,藉由光微 影法而一次形成高度不同之黑色感光性間隔件之情形時,最終形成之黑色感光性間隔件之高度不同。 However, when using the photosensitive coloring composition of the present invention, In the case of forming black photosensitive spacers with different heights at one time, the heights of the finally formed black photosensitive spacers are different.
再者,作為基板,可使用玻璃基板等公知之基板。又,基板表面較佳為平面。 In addition, as a board|substrate, a well-known board|substrate, such as a glass substrate, can be used. In addition, the surface of the substrate is preferably flat.
[2]乾燥方法 [2] Drying method
向基板上供給感光性著色組成物溶液後之乾燥較佳為藉由使用加熱板、IR烘箱、對流烘箱之乾燥方法進行。又,亦可組合不升高溫度而於減壓室內進行乾燥之減壓乾燥法。 The drying after supplying the photosensitive coloring composition solution on the substrate is preferably performed by a drying method using a hot plate, an IR oven, or a convection oven. Moreover, it is also possible to combine a drying method under reduced pressure in which drying is performed in a reduced pressure chamber without raising the temperature.
乾燥之條件可根據溶劑成分之種類、所使用之乾燥機之性能等而適當選擇。根據溶劑成分之種類、所使用之乾燥機之性能等,乾燥時間通常為於40℃~130℃之溫度下在15秒~5分鐘之範圍內選擇,較佳為於50℃~110℃之溫度下在30秒~3分鐘之範圍內選擇。 The drying conditions can be appropriately selected according to the type of solvent components, the performance of the dryer to be used, and the like. Depending on the type of solvent components and the performance of the dryer used, the drying time is usually selected within the range of 15 seconds to 5 minutes at a temperature of 40°C to 130°C, preferably at a temperature of 50°C to 110°C Select within the range of 30 seconds to 3 minutes.
[3]曝光方法 [3] Exposure method
曝光係於感光性著色組成物之塗佈膜上重疊負遮罩圖案,並介隔該遮罩圖案照射紫外線或可見光線之光源而進行。於使用曝光遮罩進行曝光之情形時,亦可利用使曝光遮罩接近感光性著色組成物之塗佈膜之方法、或將曝光遮罩配置於遠離感光性著色組成物之塗佈膜之位置並投影介隔該曝光遮罩之曝光之光之方法。又,亦可利用不使用遮罩圖案之利用雷射光之掃描曝光方式。 Exposure is performed by superimposing a negative mask pattern on the coating film of the photosensitive coloring composition, and irradiating a light source of ultraviolet light or visible light through the mask pattern. In the case of exposure using an exposure mask, a method of bringing the exposure mask close to the coating film of the photosensitive coloring composition, or disposing the exposure mask at a position away from the coating film of the photosensitive coloring composition can also be used. And a method of projecting the exposure light through the exposure mask. In addition, a scanning exposure method using laser light without using a mask pattern can also be used.
此時,為了視需要防止由氧導致之光聚合性層之感度之降低,亦可於脫氧環境下進行,或者在光聚合性層上形成聚乙烯 醇層等隔氧層之後進行曝光。 At this time, in order to prevent the reduction of the sensitivity of the photopolymerizable layer due to oxygen as necessary, it may be performed in a deoxidized environment, or polyethylene may be formed on the photopolymerizable layer. Exposure is performed after an oxygen barrier layer such as an alcohol layer.
作為本發明之較佳之態樣,於藉由光微影法同時形成高度不同之黑色感光性間隔件之情形時,例如,使用具有遮光部(透光率0%)、及作為複數個開口部之、相對於平均透光率最高之開口部(完全穿透開口部)平均透光率較小之開口部(中間穿透開口部)的曝光遮罩。藉由該方法,藉由中間穿透開口部與完全穿透開口部之平均透光率之差、即曝光量之差而產生殘膜率之差異。 As a preferred aspect of the present invention, in the case of simultaneously forming black photosensitive spacers with different heights by photolithography, for example, a light-shielding portion (light transmittance of 0%) and a plurality of openings are used. It is the exposure mask of the opening with the highest average light transmittance (completely penetrating opening) having the smaller average light transmittance (intermediate penetrating opening). With this method, the difference in residual film ratio is generated by the difference in average light transmittance between the intermediate penetration opening and the complete penetration opening, that is, the difference in exposure amount.
中間穿透開口部係已知有例如藉由具有微小之多角形之遮光單元之矩陣狀遮光圖案而作成之方法等。又,已知有藉由作為吸收體之鉻系、鉬系、鎢系、矽系等材料之膜控制透光率而作成之方法等。 For example, a method of forming the intermediate penetration opening by a matrix-like light-shielding pattern having minute polygonal light-shielding cells is known. In addition, a method of controlling light transmittance by a film of materials such as chromium-based, molybdenum-based, tungsten-based, and silicon-based materials as absorbers is known.
上述曝光所使用之光源並無特別限定。作為光源,例如可列舉:氙氣燈、鹵素燈、鎢燈、高壓水銀燈、超高壓水銀燈、金屬鹵化物、中壓水銀燈、低壓水銀燈、碳弧、螢光燈等燈光源、或氬離子雷射、YAG雷射、準分子雷射、氮雷射、氦-鎘雷射、青紫色半導體雷射、近紅外半導體雷射等雷射光源等。於照射特定波長之光而使用之情形時,亦可利用光學濾光器。 The light source used for the above exposure is not particularly limited. Examples of the light source include light sources such as xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, low-pressure mercury lamps, carbon arc lamps, fluorescent lamps, etc., or argon ion lasers, Laser light sources such as YAG laser, excimer laser, nitrogen laser, helium-cadmium laser, blue-violet semiconductor laser, near-infrared semiconductor laser, etc. In the case of irradiating light of a specific wavelength and using it, an optical filter can also be used.
作為光學濾光器,例如可以利用薄膜控制曝光波長之透光率之類型,作為該情形時之材質,例如可列舉:Cr化合物(Cr之氧化物、氮化物、氧氮化物、氟化物等)、MoSi、Si、W、Al等。 As an optical filter, for example, a thin film can be used to control the light transmittance of the exposure wavelength. As a material in this case, for example, Cr compounds (Cr oxides, nitrides, oxynitrides, fluorides, etc.) , MoSi, Si, W, Al, etc.
作為曝光量,通常為1mJ/cm2以上,較佳為5mJ/cm2以上,更佳為10mJ/cm2以上,通常為300mJ/cm2以下,較佳為200mJ/cm2以下,更佳為150mJ/cm2以下。又,於近接曝光方式之情形時,作為曝光對象與遮罩圖案之距離,通常為10μm以上,較佳 為50μm以上,更佳為75μm以上。又,通常為500μm以下,較佳為400μm以下,更佳為300μm以下。 The exposure amount is usually 1 mJ/cm 2 or more, preferably 5 mJ/cm 2 or more, more preferably 10 mJ/cm 2 or more, usually 300 mJ/cm 2 or less, preferably 200 mJ/cm 2 or less, more preferably 150mJ/ cm2 or less. In addition, in the case of the proximity exposure method, the distance between the exposure target and the mask pattern is usually 10 μm or more, preferably 50 μm or more, and more preferably 75 μm or more. Moreover, it is 500 micrometers or less normally, Preferably it is 400 micrometers or less, More preferably, it is 300 micrometers or less.
[4]顯影方法 [4] Development method
於進行上述曝光之後,可藉由使用鹼性化合物之水溶液或有機溶劑之顯影而於基板上形成影像圖案。亦可使該水溶液進而包含界面活性劑、有機溶劑、緩衝劑、錯合劑、染料或顏料。 After the above-mentioned exposure, an image pattern can be formed on the substrate by developing using an aqueous solution of an alkaline compound or an organic solvent. The aqueous solution may further contain surfactants, organic solvents, buffers, complexing agents, dyes or pigments.
作為鹼性化合物,可列舉:氫氧化鈉、氫氧化鉀、氫氧化鋰、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀、矽酸鈉、矽酸鉀、偏矽酸鈉、磷酸鈉、磷酸鉀、磷酸氫鈉、磷酸氫鉀、磷酸二氫鈉、磷酸二氫鉀、氫氧化銨等無機鹼性化合物、或者單.雙或三乙醇胺、單.雙或三甲胺、單.雙或三乙胺、單或雙異丙胺、正丁胺、單.雙或三異丙醇胺、伸乙亞胺、伸乙二亞胺、氫氧化四甲基銨(TMAH)、膽鹼等有機鹼性化合物。該等鹼性化合物亦可為2種以上之混合物。 Examples of the basic compound include sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, Potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium hydroxide and other inorganic basic compounds, or single. Double or triethanolamine, single. Double or trimethylamine, single. Double or triethylamine, single or double isopropylamine, n-butylamine, single. Di or triisopropanolamine, ethyleneimine, ethylenediimide, tetramethylammonium hydroxide (TMAH), choline and other organic basic compounds. These basic compounds may be a mixture of two or more kinds.
作為上述界面活性劑,例如可列舉:聚氧乙烯烷基醚類、聚氧乙烯烷基芳基醚類、聚氧乙烯烷基酯類、山梨醇酐烷基酯類、單甘油酯烷基酯類等非離子系界面活性劑;烷基苯磺酸鹽類、烷基萘磺酸鹽類、烷基硫酸鹽類、烷基磺酸鹽類、磺基丁二酸酯鹽類等陰離子性界面活性劑;烷基甜菜鹼類、胺基酸類等兩性界面活性劑。 Examples of the above-mentioned surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, and monoglyceride alkyl esters Nonionic surfactants such as alkanes; anionic interfaces such as alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyl sulfates, alkyl sulfonates, and sulfosuccinates Active agents; amphoteric surfactants such as alkyl betaines and amino acids.
作為有機溶劑,例如可列舉:異丙醇、苄基醇、乙基賽路蘇、丁基賽路蘇、苯基賽路蘇、丙二醇、二丙酮醇等。有機溶劑可單獨使用,亦可與水溶液併用而使用。 Examples of the organic solvent include isopropanol, benzyl alcohol, ethyl seluxet, butyl seluxet, phenyl seluxet, propylene glycol, diacetone alcohol, and the like. The organic solvent may be used alone or in combination with an aqueous solution.
顯影處理之條件並無特別限制,通常,顯影溫度為10~50℃之範圍,其中較佳為15~45℃,尤佳為20~40℃,顯影方法可使用浸漬顯影法、噴射顯影法、磁刷顯影法、超音波顯影法等任一種方法。 The conditions of the development treatment are not particularly limited. Usually, the development temperature is in the range of 10 to 50 ° C, preferably 15 to 45 ° C, and particularly preferably 20 to 40 ° C. The development method can be immersion development method, spray development method, Either a magnetic brush development method, an ultrasonic development method, or the like.
[5]追加曝光及熱硬化處理 [5] Additional exposure and thermal curing
對顯影後之基板,亦可視需要藉由與上述曝光方法相同之方法進行追加曝光,又,亦可進行熱硬化處理。關於此時之熱硬化處理條件,溫度係於100℃~280℃之範圍、較佳為150℃~250℃之範圍內選擇,時間係於5分鐘~60分鐘之範圍內選擇。 The substrate after the development may be additionally exposed by the same method as the above-mentioned exposure method if necessary, and a thermal curing treatment may also be performed. Regarding the thermal curing conditions at this time, the temperature is selected within the range of 100°C to 280°C, preferably 150°C to 250°C, and the time is selected within the range of 5 minutes to 60 minutes.
本發明之著色間隔件之大小或形狀等係根據應用該著色間隔件之彩色濾光片之規格等而適當調整,本發明之感光性著色組成物尤其對於藉由光微影法同時形成間隔件與子間隔件之高度不同之黑色感光性間隔件之情況較有用,於該情形時,間隔件之高度通常為2~7μm左右,子間隔件具有通常較間隔件低0.2~1.5μm左右之高度。 The size or shape of the coloring spacer of the present invention is appropriately adjusted according to the specifications of the color filter to which the coloring spacer is applied. It is more useful in the case of a black photosensitive spacer having a height different from that of the sub-spacer. In this case, the height of the spacer is usually about 2-7 μm, and the sub-spacer has a height that is usually about 0.2-1.5 μm lower than that of the spacer. .
又,關於本發明之著色間隔件之每1μm之光學密度(OD),就遮光性之觀點而言,較佳為1.2以上,更佳為1.5以上,進而較佳為1.8以上。又,通常為4.0以下,較佳為3.0以下。此處,光學密度(OD)為藉由下述方法所測定之值。 Moreover, about the optical density (OD) per 1 micrometer of the coloring spacer of this invention, from a light-shielding viewpoint, 1.2 or more are preferable, 1.5 or more are more preferable, 1.8 or more are more preferable. Moreover, it is 4.0 or less normally, Preferably it is 3.0 or less. Here, the optical density (OD) is a value measured by the following method.
[彩色濾光片] [color filter]
本發明之彩色濾光片為具有如上所述之本發明之著色間隔件者,例如於作為透明基板之玻璃基板上積層黑矩陣、紅色、綠色、 藍色之像素著色層、及保護層而形成著色間隔件後形成配向膜而製造。 The color filter of the present invention has the coloring spacer of the present invention as described above. For example, black matrix, red, green, A blue pixel coloring layer and a protective layer are formed into coloring spacers, and then an alignment film is formed and manufactured.
將此種具有本發明之著色間隔件之彩色濾光片與液晶驅動側基板貼合而形成液晶單元,並向所形成之液晶單元注入液晶,藉此可製造具備本發明之著色間隔件之液晶顯示裝置等影像顯示裝置。 A liquid crystal cell is formed by laminating the color filter with the coloring spacer of the present invention and the liquid crystal driving side substrate, and injecting liquid crystal into the formed liquid crystal cell, whereby a liquid crystal with the coloring spacer of the present invention can be produced Video display devices such as display devices.
實施例 Example
其次,列舉實施例及比較例而更具體地說明本發明,但本發明只要不超出其主旨則並不限定於以下實施例。以下實施例及比較例中所使用之感光性著色組成物之構成成分如下所述。 Next, although an Example and a comparative example are given and this invention is demonstrated more concretely, this invention is not limited to the following example unless the summary is exceeded. The components of the photosensitive coloring compositions used in the following Examples and Comparative Examples are as follows.
<有機黑色顏料> <Organic black pigment>
BASF公司製造之Irgaphor(註冊商標)Black S 0100 CF(具有下述式(2)所表示之化學構造) Irgaphor (registered trademark) Black S 0100 CF (with a chemical structure represented by the following formula (2)) manufactured by BASF Corporation
[化30]
<鹼可溶性樹脂-I> <Alkali-Soluble Resin-I>
對丙二醇單甲醚乙酸酯145質量份一面進行氮氣置換一面攪拌,並升溫至120℃。此時,滴加苯乙烯10質量份、環氧丙基甲基丙烯酸酯85.2質量份及具有三環癸烷骨架之單丙烯酸酯(日立化成公司製造之FA-513M)66質量份,且耗費3小時滴加2,2'-偶氮雙-2- 甲基丁腈8.47質量份,進而於90℃下持續攪拌2小時。其次,將反應容器內變更為空氣置換,向丙烯酸43.2質量份投入三-二甲胺基甲基苯酚0.7質量份及對苯二酚0.12質量份,並於100℃下持續反應12小時。其後,添加四氫鄰苯二甲酸酐(THPA)56.2質量份、三乙胺0.7質量份,並於100℃下反應3.5小時。以此方式所獲得之鹼可溶性樹脂-I之藉由GPC所測定之重量平均分子量Mw為約8400,酸值為80mgKOH/g。 It heated up to 120 degreeC, stirring 145 mass parts of propylene glycol monomethyl ether acetates with nitrogen substitution. At this time, 10 parts by mass of styrene, 85.2 parts by mass of glycidyl methacrylate, and 66 parts by mass of monoacrylate having a tricyclodecane skeleton (FA-513M manufactured by Hitachi Chemical Co., Ltd.) were added dropwise, and 3 parts by mass were added. 2,2'-azobis-2- 8.47 parts by mass of methyl butyronitrile, and further stirring was continued at 90° C. for 2 hours. Next, the inside of the reaction container was changed to air replacement, 0.7 parts by mass of tris-dimethylaminomethylphenol and 0.12 parts by mass of hydroquinone were charged into 43.2 parts by mass of acrylic acid, and the reaction was continued at 100° C. for 12 hours. Then, 56.2 mass parts of tetrahydrophthalic anhydride (THPA) and 0.7 mass parts of triethylamine were added, and it was made to react at 100 degreeC for 3.5 hours. The alkali-soluble resin-I obtained in this way had a weight-average molecular weight Mw determined by GPC of about 8400, and an acid value of 80 mgKOH/g.
<鹼可溶性樹脂-II> <Alkali-Soluble Resin-II>
日本化藥股份有限公司製造之「ZCR-1642H」(MW=6500、酸值=98mg-KOH/g) "ZCR-1642H" manufactured by Nippon Kayaku Co., Ltd. (MW=6500, acid value=98mg-KOH/g)
<分散劑-I> <Dispersant-I>
BYK-Chemie公司製造之「DISPERBYK-LPN21116」(包含側鏈具有四級銨鹽基及三級胺基之A嵌段及不具有四級銨鹽基及胺基之B嵌段的丙烯酸系A-B嵌段共聚合體。胺值為70mgKOH/g。酸值為1mgKOH/g以下。) "DISPERBYK-LPN21116" manufactured by BYK-Chemie (comprising A block with quaternary ammonium salt group and tertiary amine group in side chain and B block without quaternary ammonium salt group and amine group) Stage copolymer. Amine value is 70mgKOH/g. Acid value is less than 1mgKOH/g.)
分散劑-I之A嵌段中包含下述式(1a)及(2a)之重複單位,B嵌段中包含下述式(3a)之重複單位。下述式(1a)、(2a)、及(3a)之重複單位於分散劑-I之總重複單位中所占之含有比例分別為11.1莫耳%、22.2莫耳%、6.7莫耳%。 The A block of the dispersant-I contains repeating units of the following formulae (1a) and (2a), and the B block contains the repeating unit of the following formula (3a). The content ratios of the repeating units of the following formulae (1a), (2a), and (3a) to the total repeating units of Dispersant-I were 11.1 mol%, 22.2 mol%, and 6.7 mol%, respectively.
[化31]
<分散劑-II> <Dispersant-II>
BYK-Chemie公司製造之「DISPERBYK-167」(胺基甲酸酯系高分子分散劑) "DISPERBYK-167" (urethane polymer dispersant) manufactured by BYK-Chemie
<顏料衍生物> <Pigment Derivatives>
Lubrizol公司製造之「Solsperse12000」 "Solsperse 12000" manufactured by Lubrizol Corporation
<溶劑-I> <Solvent-I>
PGMEA:丙二醇單甲醚乙酸酯 PGMEA: Propylene Glycol Monomethyl Ether Acetate
<溶劑-II> <Solvent-II>
MB:3-乙氧基丁醇 MB: 3-ethoxybutanol
<光聚合起始劑-I> <Photopolymerization Initiator-I>
Irgacure OXE03(BASF公司製造) Irgacure OXE03 (manufactured by BASF)
[化32]
<光聚合起始劑-II> <Photopolymerization Initiator-II>
[化33]
<光聚合起始劑-III> <Photopolymerization Initiator-III>
[化34]
<光聚合性單體> <Photopolymerizable monomer>
DPHA:日本化藥股份有限公司製造之二季戊四醇六丙烯酸酯 DPHA: Dipentaerythritol hexaacrylate manufactured by Nippon Kayaku Co., Ltd.
<添加剤> <additional agent>
日本化藥股份有限公司製造之KAYAMER PM-21(含甲基丙烯 醯基之磷酸酯) KAYAMER PM-21 (containing methacrylic acid) manufactured by Nippon Kayaku Co., Ltd. Acyl phosphate)
<界面活性劑> <Surfactant>
DIC股份有限公司製造之MEGAFAC F-559 MEGAFAC F-559 manufactured by DIC Corporation
<光學密度(OD)之評價> <Evaluation of Optical Density (OD)>
藉由透過濃度計(GretagMacbeth公司製造「D200-II」)測定光學密度(OD)。進而亦對測定部位之膜厚進行測定,算出每單位膜厚(1μm)之光學密度(單位OD)。 Optical density (OD) was measured with a transmission densitometer ("D200-II" manufactured by GretagMacbeth). Furthermore, the film thickness at the measurement site was also measured, and the optical density (unit OD) per unit film thickness (1 μm) was calculated.
<基板密接性之評價> <Evaluation of substrate adhesion>
對於成為對象之圖案,將解像性良好且圖案殘留於基板上者中開口直徑最小者之開口直徑(μm)之值設為最小密接。該值越小則基板密接性越優異。 The value of the opening diameter (μm) of the smallest opening diameter among those whose resolution is good and the pattern remains on the substrate is set to be the smallest close contact. The smaller the value is, the more excellent the substrate adhesion is.
<表面平滑性之評價> <Evaluation of Surface Smoothness>
對於成為對象之圖案,藉由光學顯微鏡於70μm×70μm之視野內觀察加熱後之表面是否產生皺褶。再者,評價基準如下所述。 Regarding the pattern to be the subject, it was observed by an optical microscope in a field of view of 70 μm×70 μm whether or not a wrinkle occurred on the surface after heating. In addition, the evaluation criteria are as follows.
○:於圖案表面未觀察到微米級之皺褶 ○: No micron-level wrinkles are observed on the pattern surface
×:於圖案表面微米級之皺褶極為明顯 ×: The micron-level wrinkles on the pattern surface are very obvious
<表面粗度之評價> <Evaluation of surface roughness>
對於成為對象之圖案,藉由Ryoka Systems股份有限公司之立體非接觸表面形狀計測系統Micromap,使用50倍之光學透鏡,以聚焦模式於70μm×70μm之視野中測定表面粗度Sa(算術平均粗 度、nm)。 For the pattern to be the subject, the surface roughness Sa (arithmetic mean roughness Sa (arithmetic mean roughness) was measured in a focusing mode in a field of view of 70 μm × 70 μm by using Micromap, a three-dimensional non-contact surface shape measuring system of Ryoka Systems Co., Ltd., using an optical lens of 50 times magnification. degrees, nm).
<顏料分散液1之製備> <Preparation of Pigment Dispersion Liquid 1>
將表1所記載之顏料、分散劑、分散助劑、鹼可溶性樹脂、及溶劑以成為表1所記載之質量比之方式混合。藉由塗料振盪機對該溶液於25~45℃之範圍內進行3小時分散處理。使用0.5mm之氧化鋯珠作為珠粒,並添加分散液之2.5倍之質量。分散結束後,藉由過濾器將珠粒與分散液分離而製備顏料分散液1。 The pigments, dispersing agents, dispersing aids, alkali-soluble resins, and solvents described in Table 1 were mixed so as to have the mass ratios described in Table 1. The solution was dispersed in the range of 25 to 45°C for 3 hours by means of a paint shaker. Use 0.5mm The zirconia beads were used as beads, and 2.5 times the mass of the dispersion was added. After the dispersion was completed, the beads were separated from the dispersion by a filter to prepare Pigment Dispersion 1 .
[表1]
<顏料分散液2及3之製備> <Preparation of Pigment Dispersions 2 and 3>
除將表1所記載之顏料、分散劑、分散助劑、鹼可溶性樹脂、及溶劑以成為表1所記載之質量比之方式混合以外,以與顏料分散液1相同之方式製備顏料分散液2及3。 Pigment Dispersion Liquid 2 was prepared in the same manner as Pigment Dispersion Liquid 1, except that the pigments, dispersants, dispersing aids, alkali-soluble resins, and solvents described in Table 1 were mixed in the mass ratios described in Table 1. and 3.
<顏料分散液4(被覆碳黑分散液)> <Pigment Dispersion Liquid 4 (Coated Carbon Black Dispersion Liquid)>
碳黑係以通常之油爐法製造。其中,作為原料油,使用Na、 Ca、S分量較少之乙烯底油,燃燒用係使用焦煤爐氣。進而,作為反應停止水,使用經離子交換樹脂處理過之純水。使用均質攪拌機將所獲得之碳黑540g與純水14500g共同以5,000~6,000rpm攪拌30分鐘而獲得漿體。將該漿體轉移至附螺旋型攪拌機之容器並一面以約1,000rpm進行混合一面將溶解有環氧樹脂「Epikote 828」(三菱化學股份有限公司製造)60g之甲苯600g逐次少量地添加。於約15分鐘內,分散於水中之碳黑全部移動至甲苯側,成為約1mm之顆粒。 Carbon black is produced by the usual oil furnace method. Among them, as the raw material oil, Na, Coking coal furnace gas is used for ethylene base oil with less Ca and S content. Furthermore, as the reaction stop water, pure water treated with an ion exchange resin was used. Using a homogenizer, 540 g of the obtained carbon black and 14,500 g of pure water were stirred together at 5,000 to 6,000 rpm for 30 minutes to obtain a slurry. This slurry was transferred to a container with a screw mixer, and 600 g of toluene in which 60 g of epoxy resin "Epikote 828" (manufactured by Mitsubishi Chemical Co., Ltd.) was dissolved was added little by little while mixing at about 1,000 rpm. In about 15 minutes, the carbon black dispersed in water all moved to the toluene side and became particles of about 1 mm.
其次,利用60目之金屬網進行甩水之後,放入真空乾燥機於70℃下乾燥7小時而將甲苯及水完全去除。將所獲得之被覆碳黑、分散劑、顏料衍生物及溶劑以成為表2所記載之質量比之方式混合。 Next, after throwing off water with a 60-mesh metal mesh, it was put into a vacuum dryer and dried at 70° C. for 7 hours to completely remove toluene and water. The obtained coated carbon black, a dispersant, a pigment derivative, and a solvent were mixed so that the mass ratio described in Table 2 might be obtained.
藉由攪拌機將其充分攪拌而進行預混。其次,藉由塗料混合機於25~45℃之範圍內進行6小時之分散處理。使用0.5mm之氧化鋯珠作為珠粒,並添加與分散液相同之質量。分散結束後,藉由過濾器將珠粒與分散液分離而製備。 It is premixed by stirring it well with a mixer. Next, the dispersion treatment is carried out in the range of 25~45℃ for 6 hours by a paint mixer. Use 0.5mm The zirconia beads were used as beads, and the same mass as the dispersion was added. After the dispersion is completed, the beads are prepared by separating the beads from the dispersion by a filter.
[實施例1及2、比較例1~3] [Examples 1 and 2, Comparative Examples 1 to 3]
使用上述所製備之顏料分散液1~4,以成為表2之調配比例之方式添加各成分,進而以固形份成為22質量%之方式添加PGMEA並攪拌使其溶解,從而製備感光性著色組成物。使用所獲得之感光性著色組成物,以下述方法進行評價。再者,表2中之上段之值表示各成分之使用量。另一方面,下段之值係以相對於感光性著色組成物之總固形份量之含有比例表示各成分之固形份量。 Using the pigment dispersion liquids 1 to 4 prepared above, each component was added so that the proportions in Table 2 would be adjusted, and then PGMEA was added so that the solid content would be 22% by mass and stirred to dissolve to prepare a photosensitive coloring composition. . Using the obtained photosensitive coloring composition, it evaluated by the following method. In addition, the value of the upper row in Table 2 represents the usage-amount of each component. On the other hand, the value of the lower row shows the solid content of each component by the content ratio with respect to the total solid content of the photosensitive coloring composition.
[表2]
<高度不同之硬化物之一次形成方法> <One-time formation method of hardened objects with different heights>
使用旋轉塗佈機於玻璃基板(AGC公司製造之「AN100」)上塗佈各感光性著色組成物。繼而,於100℃下在加熱板上加熱乾燥70秒鐘而形成塗佈膜。對所獲得之塗佈膜,使用具有直徑5~50μm(5~20μm:每隔1μm;25μm~50μm:每隔5μm)之各種直徑之圓形圖案之完全穿透開口部及直徑5~50μm(5~20μm:每隔1μm;25μm~50μm:每隔5μm)之各種直徑之圓形圖案之中間穿透開口 部、以及使用具有寬度100μm之直線開口部(完全透過)之曝光遮罩實施曝光處理。中間穿透開口部為Cr氧化物之薄膜且將波長365nm下之透光率設為10±2%。曝光間隙(遮罩與塗佈面間之距離)為220μm。作為照射光,使用波長365nm下之強度為32mW/cm2之紫外線,曝光量係設為100mJ/cm2。又,紫外線照射係於空氣下進行。 Each photosensitive coloring composition was apply|coated on the glass substrate ("AN100" by AGC company) using a spin coater. Next, the coating film was formed by heating and drying on a hot plate at 100° C. for 70 seconds. For the obtained coating film, completely penetrating openings with circular patterns of various diameters of 5 to 50 μm in diameter (5 to 20 μm: every 1 μm; 25 μm to 50 μm: every 5 μm) and diameters of 5 to 50 μm ( 5~20μm: every 1μm; 25μm~50μm: every 5μm), the middle penetrating openings of circular patterns of various diameters, and the exposure treatment using the exposure mask with the straight openings (completely penetrating) with a width of 100 μm . The middle penetration opening is a thin film of Cr oxide, and the transmittance at a wavelength of 365 nm is set to 10±2%. The exposure gap (distance between the mask and the coated surface) was 220 μm. As irradiation light, ultraviolet rays with an intensity of 32 mW/cm 2 at a wavelength of 365 nm were used, and the exposure amount was set to 100 mJ/cm 2 . In addition, ultraviolet irradiation is performed in the air.
繼而,使用包含含有0.05質量%之氫氧化鉀及0.08質量%之非離子性界面活性劑(花王公司製造之「A-60」)之水溶液之顯影液,於25℃下實施水壓0.15MPa之噴淋顯影之後,藉由純水停止顯影並藉由水洗噴射而洗淨。噴淋顯影時間係於10~120秒鐘之間進行調整,且設為將未曝光之塗膜溶解去除之時間之1.5倍。藉由該等操作,獲得已將多餘部分去除之圖案。將形成有該圖案之基板於烘箱中以230℃加熱20分鐘而使圖案硬化,獲得大致圓柱狀之間隔件圖案。 Next, using a developer containing an aqueous solution containing 0.05 mass % of potassium hydroxide and 0.08 mass % of a nonionic surfactant (“A-60” manufactured by Kao Corporation), a water pressure of 0.15 MPa was carried out at 25° C. After the shower development, the development was stopped with pure water and washed with water jet. The spray developing time was adjusted between 10 and 120 seconds, and was set to 1.5 times the time for dissolving and removing the unexposed coating film. Through these operations, a pattern from which redundant portions have been removed is obtained. The substrate on which the pattern was formed was heated in an oven at 230° C. for 20 minutes to harden the pattern to obtain a substantially cylindrical spacer pattern.
利用上述方法對與上述直線開口部對應之圖案之每單位膜厚(1μm)之光學密度(OD)進行測定。又,於與5~50μm之圓形圖案之完全穿透開口部、及同樣與5~50μm之中間穿透開口部對應之圖案中,利用上述方法進行基板密接性之評價。進而,對於與上述直線開口部對應之圖案,利用上述方法進行表面平滑性之評價。又,對於與上述直線開口部對應之圖案,利用上述方法進行表面粗度之評價。將結果分別示於表2。 The optical density (OD) per unit film thickness (1 μm) of the pattern corresponding to the above-mentioned linear openings was measured by the above-mentioned method. Moreover, in the complete penetration opening part of the circular pattern of 5-50 micrometers, and the pattern corresponding to the intermediate penetration opening part of 5-50 micrometers, the evaluation of the board|substrate adhesiveness was performed by the said method. Furthermore, about the pattern corresponding to the said linear opening part, the surface smoothness evaluation was performed by the said method. Moreover, about the pattern corresponding to the said linear opening part, the surface roughness evaluation was performed by the said method. The results are shown in Table 2, respectively.
確認到使用實施例1及2之感光性著色組成物之塗佈基板之單位OD較高,遮光性優異且表面平滑性優異。又,中間穿透開口部之基板密接性亦良好。另一方面,確認到比較例1~3與 實施例1及2之單位OD之值相同,但表面平滑性較差,而且中間穿透開口部之基板密接性較差。 It was confirmed that the coated substrates using the photosensitive coloring compositions of Examples 1 and 2 had high unit OD, excellent light-shielding properties, and excellent surface smoothness. Moreover, the substrate adhesiveness of the intermediate penetration opening was also favorable. On the other hand, it was confirmed that Comparative Examples 1 to 3 and The values of the unit OD of Examples 1 and 2 are the same, but the surface smoothness is poor, and the adhesion between the substrates through the opening in the middle is poor.
一般,為了提高著色間隔件之遮光性,已知有提高顏料濃度之方法、或併用遮光性較高之顏料之方法。然而,認為若應用此種方法,則紫外穿透率降低,於膜厚方向產生交聯密度差,與膜之底部相比,膜表面之交聯密度變高,且因熱硬化過程之熱收縮而於膜表面產生皺褶,表面平滑性變差。 Generally, in order to improve the light-shielding property of a coloring spacer, the method of raising a pigment density|concentration, or the method of using together the pigment with high light-shielding property is known. However, it is considered that if such a method is applied, the UV transmittance decreases, a difference in crosslinking density occurs in the film thickness direction, the crosslinking density on the surface of the film becomes higher than that at the bottom of the film, and the thermal shrinkage due to the thermal curing process is considered. On the other hand, wrinkles are generated on the film surface, and the surface smoothness is deteriorated.
於本發明之感光性著色組成物中,認為由於使用上述式(I)所表示之肟酯系化合物作為光聚合起始劑,故而因該化合物之化學構造中之鹵素原子,該化合物容易於膜表面附近分佈起始劑,因受到氧阻礙之影響而抑制膜表面之交聯密度過度地變高,可減少熱硬化過程之熱收縮所致之膜表面之皺褶之產生。 In the photosensitive coloring composition of the present invention, since the oxime ester compound represented by the above-mentioned formula (I) is used as a photopolymerization initiator, it is considered that the compound is easily absorbed into the film due to the halogen atom in the chemical structure of the compound. Distributing the initiator near the surface prevents the crosslinking density of the film surface from becoming excessively high due to the influence of oxygen barrier, which can reduce the generation of wrinkles on the film surface caused by thermal shrinkage during the thermal curing process.
又,認為因該化合物之咔唑骨架中之萘環,而使長波長光之吸收性變高,亦可利用紫外線燈所含之長波長光來提高膜底部附近之交聯密度,因此即便為以如中間穿透開口部般穿透率較低之開口部所形成之圖案,基板密接性亦變得良好。 In addition, it is considered that the absorption of long-wavelength light increases due to the naphthalene ring in the carbazole skeleton of the compound, and the long-wavelength light contained in the ultraviolet lamp can also be used to increase the crosslinking density near the bottom of the film. The substrate adhesion also becomes good in the pattern formed by the opening part with a low penetration rate like the intermediate penetration opening part.
[實施例3及比較例4] [Example 3 and Comparative Example 4]
使用上述所製備之顏料分散液3及4,以固形份中之比率成為表3之調配比例之方式添加各成分,進而以固形份成為22質量%之方式添加PGMEA並攪拌使其溶解,從而製備感光性著色組成物。使用所獲得之感光性著色組成物,除將曝光處理中之曝光量設為40mJ/cm2以外,以與實施例1相同之順序進行評價。再者,表3中之上段之值表示各成分之使用量。另一方面,下段之值係以相 對於感光性著色組成物之總固形份量之含有比例表示各成分之固形份量。又,表面平滑性之評價之視野係設為5cm×5cm。 Using the above-prepared pigment dispersions 3 and 4, each component was added in such a way that the ratio in the solid content became the compounding ratio of Table 3, and then PGMEA was added in such a way that the solid content became 22% by mass and stirred to dissolve, thereby preparing Photosensitive coloring composition. Using the obtained photosensitive coloring composition, except that the exposure amount in the exposure process was made into 40 mJ/cm< 2 >, it evaluated by the same procedure as Example 1. In addition, the value of the upper row in Table 3 represents the usage-amount of each component. On the other hand, the value of the lower row shows the solid content of each component by the content ratio with respect to the total solid content of the photosensitive coloring composition. In addition, the visual field of the evaluation of surface smoothness was set to 5 cm x 5 cm.
[表3]
確認到使用實施例3之感光性著色組成物之塗佈基板其單位OD較高,遮光性優異且表面平滑性優異。又,中間穿透開口部之基板密接性亦良好。另一方面,確認到比較例4雖與實施例3之單位OD值相同,但表面平滑性較差,表面粗度之值亦較大,進而,中間穿透開口部之基板密接性較差。 It was confirmed that the coated substrate using the photosensitive coloring composition of Example 3 had a high unit OD, excellent light-shielding properties, and excellent surface smoothness. Moreover, the substrate adhesiveness of the intermediate penetration opening was also favorable. On the other hand, it was confirmed that Comparative Example 4 had the same unit OD value as Example 3, but the surface smoothness was poor, the surface roughness value was also large, and the substrate adhesion at the intermediate penetration opening was poor.
使用特定之態樣對本發明進行詳細說明,對從業者而言明白可在不脫離本發明之意圖及範圍而進行各種變更及變形。再者,本申請案係基於2015年3月11日提出申請之日本專利申請(日本專利特願2015-048577)、2015年3月11日提出申請之日本專利申請(日本專利特願2015-048578)、及2015年8月7日提出申請之 日本專利申請(日本專利特願2015-157456),且以引用之形式援引其全部內容。 The present invention will be described in detail using specific aspects, and it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the intent and scope of the present invention. Furthermore, this application is based on the Japanese patent application filed on March 11, 2015 (Japanese Patent Application No. 2015-048577) and the Japanese Patent Application filed on March 11, 2015 (Japanese Patent Application No. 2015-048578 ). ), and the date of application on August 7, 2015 Japanese Patent Application (Japanese Patent Application No. 2015-157456), the entire contents of which are incorporated by reference.
(產業上之可利用性) (Industrial Availability)
根據本發明之感光性著色組成物,可提供遮光性較高且表面平滑性優異之硬化物及著色間隔件,進而,可提供具備此種著色間隔件之影像顯示裝置。由此,本發明於感光性著色組成物、硬化物、著色間隔件及影像顯示裝置之各領域中,產業上之可利用性極高。 According to the photosensitive coloring composition of the present invention, a cured product and a coloring spacer having high light-shielding properties and excellent surface smoothness can be provided, and further, an image display device having such a coloring spacer can be provided. Accordingly, the present invention has extremely high industrial applicability in various fields of photosensitive coloring compositions, cured products, coloring spacers, and image display devices.
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|---|---|---|---|
| JP2015048577 | 2015-03-11 | ||
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| JP2015-048577 | 2015-03-11 | ||
| JP2015-048578 | 2015-03-11 | ||
| JP2015-157456 | 2015-08-07 | ||
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Also Published As
| Publication number | Publication date |
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| CN107407881A (en) | 2017-11-28 |
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| CN113608408A (en) | 2021-11-05 |
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| JP7131907B2 (en) | 2022-09-06 |
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| JP2023106388A (en) | 2023-08-01 |
| JP7485147B2 (en) | 2024-05-16 |
| TWI763625B (en) | 2022-05-11 |
| JP7268700B2 (en) | 2023-05-08 |
| JPWO2016143878A1 (en) | 2017-12-28 |
| KR20170126912A (en) | 2017-11-20 |
| JP2021182150A (en) | 2021-11-25 |
| TW202100665A (en) | 2021-01-01 |
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